UA93261C2 - Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма - Google Patents
Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная формаInfo
- Publication number
- UA93261C2 UA93261C2 UAA200901183A UAA200901183A UA93261C2 UA 93261 C2 UA93261 C2 UA 93261C2 UA A200901183 A UAA200901183 A UA A200901183A UA A200901183 A UAA200901183 A UA A200901183A UA 93261 C2 UA93261 C2 UA 93261C2
- Authority
- UA
- Ukraine
- Prior art keywords
- near infrared
- negative
- manufacture
- coating composition
- printing plate
- Prior art date
Links
- 239000002245 particle Substances 0.000 title abstract 6
- 239000008199 coating composition Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 230000002209 hydrophobic effect Effects 0.000 abstract 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 abstract 1
- 238000007645 offset printing Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
- C08F220/286—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polyethylene oxide in the alcohol moiety, e.g. methoxy polyethylene glycol (meth)acrylate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
- C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
- C08F220/44—Acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
- C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
- C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/32—Radiation-absorbing paints
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Изобретение касается полимерных частичек с размером частичек приблизительно от 60 нм приблизительно до 1000 нм, которые содержат полимер, где полимер содержит гидрофобный каркас, сегмент, который поглощает в ближнем инфракрасном диапазоне, к которому присоединены хромофор, который поглощает в ближнем инфракрасном диапазоне, имеет пик поглощения приблизительно от 70 нм приблизительно до 1100 нм; и сегмент, прозрачный в ближнем инфракрасном диапазоне. Также описаны способы получения этих частичек. Также обеспечена композиция для покрытия, которая содержит вышеупомянутые полимерные частички, и реакционноспособный олигомер йодония. Изобретение также касается негативной офсетной печатной формы, которая содержит субстрат; гидрофильный нижний слой и в�
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82341506P | 2006-08-24 | 2006-08-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA93261C2 true UA93261C2 (ru) | 2011-01-25 |
Family
ID=39106425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UAA200901183A UA93261C2 (ru) | 2006-08-24 | 2007-08-10 | Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US7723010B2 (ru) |
| EP (1) | EP2054454B1 (ru) |
| JP (1) | JP5593068B2 (ru) |
| KR (1) | KR101312760B1 (ru) |
| CN (1) | CN101484484B (ru) |
| BR (1) | BRPI0716670B1 (ru) |
| CA (1) | CA2661147C (ru) |
| RU (1) | RU2434024C2 (ru) |
| TW (1) | TWI385184B (ru) |
| UA (1) | UA93261C2 (ru) |
| WO (1) | WO2008022431A1 (ru) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI409280B (zh) * | 2007-07-31 | 2013-09-21 | American Dye Source Inc | 聚合物染料、塗覆層組合物及熱微影印刷板 |
| RU2571098C2 (ru) | 2009-09-15 | 2015-12-20 | Майлан Груп | Сополимеры, полимерные частицы, содержащие упомянутые сополимеры, и сополимерные связующие для композиций радиационно-чувствительных покрытий для негативных копировальных радиационно-чувствительных литографических печатных форм |
| BRPI1010588A2 (pt) | 2009-10-29 | 2015-08-25 | Mylan Group | Compostos galotânicos para composições de revestimentos de placa de impressão litográfica |
| EP2560821B1 (en) | 2010-04-20 | 2016-03-30 | Mylan Group | Substrate for lithographic printing plate |
| JP5740234B2 (ja) * | 2010-07-30 | 2015-06-24 | 富士フイルム株式会社 | 平版印刷版原版及びそれに用いる新規なベタイン含有ポリマー |
| JP5578994B2 (ja) * | 2010-08-27 | 2014-08-27 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いたレジスト膜及びパターン形成方法 |
| BR112012030319A2 (pt) | 2010-09-14 | 2016-08-09 | Mylan Group | copolímeros para composições de revestimentos sensíveis à radiação infravermelha próxima para placas de impressão litográfica térmicas de funcionamento positivo |
| WO2014167390A1 (en) | 2013-04-10 | 2014-10-16 | Mylan Group | Lithographic printing plate comprising a laminated substrate |
| WO2016182367A1 (ko) * | 2015-05-12 | 2016-11-17 | 코오롱인더스트리 주식회사 | 폴리머 비드, 폴리머 비드의 제조방법 및 이를 이용한 광학용 필름 |
| CN106699930A (zh) * | 2016-12-01 | 2017-05-24 | 沈阳化工研究院有限公司 | 一种油品标记聚合物及制备方法和应用 |
| EP3632696B1 (en) * | 2017-05-31 | 2023-04-26 | FUJIFILM Corporation | Lithographic printing plate precursor, production method for lithographic printing plate, polymer particles, and composition |
| CN108610461B (zh) * | 2018-04-12 | 2020-10-20 | 南京邮电大学 | 一种近红外二区成像造影剂及其制备方法和用途 |
| JP7357070B2 (ja) * | 2019-04-24 | 2023-10-05 | イー インク コーポレイション | 電気泳動粒子、媒体、およびディスプレイならびにそれらの生成のためのプロセス |
| US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| CN111925469B (zh) * | 2020-08-19 | 2021-04-06 | 上海金成高分子材料有限公司 | 一种高纯水制备专用树脂的方法 |
| US12436459B2 (en) | 2021-04-01 | 2025-10-07 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US12222645B2 (en) | 2022-03-03 | 2025-02-11 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1807644A1 (de) * | 1967-11-21 | 1969-08-28 | Eastman Kodak Co | Verwendung von lichtempfindlichen,filmbildenden Polymerisaten aus Aminostyrolen zur Herstellung von lichtempfindlichen Schichten lichtempfindlicher Aufzeichnungsmaterialien |
| KR0138486B1 (ko) * | 1993-04-20 | 1998-04-27 | 유미꾸라 레이이찌 | 평판인쇄원판 및 그의 제판방법 |
| DE19536805A1 (de) * | 1995-10-02 | 1997-04-03 | Basf Lacke & Farben | Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement |
| EP0770495B1 (en) | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
| US6261740B1 (en) * | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
| US6340722B1 (en) * | 1998-09-04 | 2002-01-22 | The University Of Akron | Polymerization, compatibilized blending, and particle size control of powder coatings in a supercritical fluid |
| US6124425A (en) * | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
| US6132933A (en) * | 1999-07-30 | 2000-10-17 | American Dye Source, Inc. | Thermal waterless lithographic printing plates |
| JP2001270919A (ja) | 2000-01-17 | 2001-10-02 | Toyo Gosei Kogyo Kk | 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法 |
| US6506533B1 (en) * | 2000-06-07 | 2003-01-14 | Kodak Polychrome Graphics Llc | Polymers and their use in imagable products and image-forming methods |
| US6558872B1 (en) * | 2000-09-09 | 2003-05-06 | Kodak Polychrome Graphics Llc | Relation to the manufacture of masks and electronic parts |
| JP2002097384A (ja) * | 2000-09-21 | 2002-04-02 | Fuji Photo Film Co Ltd | 高分子色素及びその製造方法 |
| US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| CN1281660C (zh) * | 2001-01-24 | 2006-10-25 | 富士胶片株式会社 | 含有硅烷偶合端基的亲水聚合物和平版印刷版底材 |
| JP2002251008A (ja) | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
| US6582882B2 (en) * | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| EP1344644B1 (en) * | 2002-03-13 | 2007-07-25 | FUJIFILM Corporation | Lithographic printing plate precursor |
| US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
| EP1356926B1 (en) * | 2002-04-26 | 2008-01-16 | Agfa Graphics N.V. | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support. |
| US6983694B2 (en) * | 2002-04-26 | 2006-01-10 | Agfa Gevaert | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support |
| JP2004012706A (ja) * | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6969575B2 (en) * | 2002-08-29 | 2005-11-29 | Fuji Photo Film Co., Ltd. | On-press developable lithographic printing plate precursor |
| US6953652B2 (en) * | 2003-01-27 | 2005-10-11 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
| US7001704B2 (en) * | 2003-01-29 | 2006-02-21 | Fuji Photo Film Co., Ltd. | Presensitized lithographic plate comprising microcapsules |
| US7368215B2 (en) * | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
| US6889994B1 (en) * | 2003-06-30 | 2005-05-10 | Jason Birkenbaugh | Trailer pulling apparatus |
| US7070902B2 (en) * | 2003-08-26 | 2006-07-04 | Eastman Kodak Company | Imageable elements containing cyanoacrylate polymer particles |
| KR101174949B1 (ko) * | 2006-05-17 | 2012-08-17 | 아메리칸 다이 소스, 인코포레이티드 | 석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 |
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2007
- 2007-08-10 UA UAA200901183A patent/UA93261C2/ru unknown
- 2007-08-10 US US11/836,914 patent/US7723010B2/en not_active Expired - Fee Related
- 2007-08-10 JP JP2009524851A patent/JP5593068B2/ja not_active Expired - Fee Related
- 2007-08-10 KR KR1020097004832A patent/KR101312760B1/ko not_active Expired - Fee Related
- 2007-08-10 EP EP07785047.7A patent/EP2054454B1/en active Active
- 2007-08-10 CN CN2007800254769A patent/CN101484484B/zh not_active Expired - Fee Related
- 2007-08-10 BR BRPI0716670A patent/BRPI0716670B1/pt not_active IP Right Cessation
- 2007-08-10 RU RU2009110493/04A patent/RU2434024C2/ru not_active IP Right Cessation
- 2007-08-10 CA CA2661147A patent/CA2661147C/en not_active Expired - Fee Related
- 2007-08-10 WO PCT/CA2007/001397 patent/WO2008022431A1/en not_active Ceased
- 2007-11-05 TW TW096141681A patent/TWI385184B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010501650A (ja) | 2010-01-21 |
| TWI385184B (zh) | 2013-02-11 |
| CA2661147C (en) | 2013-02-05 |
| EP2054454B1 (en) | 2017-11-08 |
| WO2008022431A1 (en) | 2008-02-28 |
| BRPI0716670A2 (pt) | 2013-10-15 |
| KR101312760B1 (ko) | 2013-09-30 |
| EP2054454A4 (en) | 2012-02-08 |
| US20080171286A1 (en) | 2008-07-17 |
| JP5593068B2 (ja) | 2014-09-17 |
| CN101484484B (zh) | 2012-10-10 |
| RU2009110493A (ru) | 2010-09-27 |
| EP2054454A1 (en) | 2009-05-06 |
| RU2434024C2 (ru) | 2011-11-20 |
| KR20090055568A (ko) | 2009-06-02 |
| US7723010B2 (en) | 2010-05-25 |
| BRPI0716670B1 (pt) | 2019-09-10 |
| HK1131630A1 (en) | 2010-01-29 |
| CA2661147A1 (en) | 2008-02-28 |
| TW200906868A (en) | 2009-02-16 |
| CN101484484A (zh) | 2009-07-15 |
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