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UA80860C2 - Annular shim member, method for preparation of annular preforms for process of chemical infiltration in vapor phase and method for manufacturing one-piece annular shim member - Google Patents

Annular shim member, method for preparation of annular preforms for process of chemical infiltration in vapor phase and method for manufacturing one-piece annular shim member

Info

Publication number
UA80860C2
UA80860C2 UA2005008477A UA2005008477A UA80860C2 UA 80860 C2 UA80860 C2 UA 80860C2 UA 2005008477 A UA2005008477 A UA 2005008477A UA 2005008477 A UA2005008477 A UA 2005008477A UA 80860 C2 UA80860 C2 UA 80860C2
Authority
UA
Ukraine
Prior art keywords
annular
preforms
shim member
piece
annular shim
Prior art date
Application number
UA2005008477A
Other languages
English (en)
Original Assignee
Messier Bugatti
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Messier Bugatti filed Critical Messier Bugatti
Publication of UA80860C2 publication Critical patent/UA80860C2/xx

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
    • F16D69/00—Friction linings; Attachment thereof; Selection of coacting friction substances or surfaces
    • F16D69/02—Composition of linings ; Methods of manufacturing
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
    • C04B35/522—Graphite
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/71—Ceramic products containing macroscopic reinforcing agents
    • C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
    • C04B35/80—Fibres, filaments, whiskers, platelets, or the like
    • C04B35/83—Carbon fibres in a carbon matrix
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5053—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials non-oxide ceramics
    • C04B41/5057—Carbides
    • C04B41/5059—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
    • F16D69/00—Friction linings; Attachment thereof; Selection of coacting friction substances or surfaces
    • F16D69/02—Composition of linings ; Methods of manufacturing
    • F16D69/023—Composite materials containing carbon and carbon fibres or fibres made of carbonizable material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/14—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9607—Thermal properties, e.g. thermal expansion coefficient
    • C04B2235/9623—Ceramic setters properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank
    • Y10T428/218—Aperture containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2913—Rod, strand, filament or fiber
    • Y10T428/2933—Coated or with bond, impregnation or core
    • Y10T428/2962—Silane, silicone or siloxane in coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/10—Scrim [e.g., open net or mesh, gauze, loose or open weave or knit, etc.]
    • Y10T442/102—Woven scrim
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/10—Scrim [e.g., open net or mesh, gauze, loose or open weave or knit, etc.]
    • Y10T442/102—Woven scrim
    • Y10T442/109—Metal or metal-coated fiber-containing scrim
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/30—Woven fabric [i.e., woven strand or strip material]
    • Y10T442/3382—Including a free metal or alloy constituent
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/30—Woven fabric [i.e., woven strand or strip material]
    • Y10T442/3382—Including a free metal or alloy constituent
    • Y10T442/339—Metal or metal-coated strand

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Braking Arrangements (AREA)
  • Ceramic Products (AREA)
  • Turbine Rotor Nozzle Sealing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Gasket Seals (AREA)
  • Finger-Pressure Massage (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Mechanical Operated Clutches (AREA)
  • Paper (AREA)
  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)
  • Fuses (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Fuel Cell (AREA)
  • Cell Separators (AREA)
UA2005008477A 2003-03-03 2004-03-02 Annular shim member, method for preparation of annular preforms for process of chemical infiltration in vapor phase and method for manufacturing one-piece annular shim member UA80860C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45067803P 2003-03-03 2003-03-03
PCT/EP2004/002147 WO2004077912A2 (en) 2003-03-03 2004-03-02 One piece shim

Publications (1)

Publication Number Publication Date
UA80860C2 true UA80860C2 (en) 2007-11-12

Family

ID=32962511

Family Applications (2)

Application Number Title Priority Date Filing Date
UA2005008476A UA84862C2 (xx) 2003-03-03 2004-02-03 Прокладка$подложка
UA2005008477A UA80860C2 (en) 2003-03-03 2004-03-02 Annular shim member, method for preparation of annular preforms for process of chemical infiltration in vapor phase and method for manufacturing one-piece annular shim member

Family Applications Before (1)

Application Number Title Priority Date Filing Date
UA2005008476A UA84862C2 (xx) 2003-03-03 2004-02-03 Прокладка$подложка

Country Status (16)

Country Link
US (3) US20060188687A1 (xx)
EP (2) EP1601887B1 (xx)
JP (2) JP4662922B2 (xx)
KR (2) KR101068712B1 (xx)
CN (2) CN100424376C (xx)
AT (2) ATE449271T1 (xx)
AU (2) AU2004216839B2 (xx)
BR (2) BRPI0407977A (xx)
CA (2) CA2518023C (xx)
DE (2) DE602004024173D1 (xx)
ES (2) ES2312973T3 (xx)
IL (2) IL170547A (xx)
MX (2) MXPA05009374A (xx)
RU (2) RU2341701C2 (xx)
UA (2) UA84862C2 (xx)
WO (2) WO2004078406A2 (xx)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2882064B1 (fr) 2005-02-17 2007-05-11 Snecma Propulsion Solide Sa Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats
US20060193365A1 (en) * 2005-02-25 2006-08-31 Honeywell International Spacer for spacing preforms in a furnace and method for spacing preforms in a furnace using same
US20060194059A1 (en) * 2005-02-25 2006-08-31 Honeywell International Inc. Annular furnace spacers and method of using same
US20060194060A1 (en) * 2005-02-25 2006-08-31 Honeywell International Furnace spacers for spacing preforms in a furnace
US20070014990A1 (en) * 2005-07-14 2007-01-18 Honeywell International Inc. Support structure for radiative heat transfer
UA93580C2 (ru) * 2006-10-29 2011-02-25 Мессье-Бугатти Способ уплотнения пористых субстратов
FR2919309B1 (fr) * 2007-07-25 2011-07-22 Commissariat Energie Atomique Procede et dispositif d'infiltration d'une structure en materiau poreux par depot chimique en phase vapeur.
US8208024B2 (en) 2007-11-30 2012-06-26 Target Brands, Inc. Communication and surveillance system
US8215835B2 (en) 2007-12-11 2012-07-10 Tokitae Llc Temperature-stabilized medicinal storage systems
US8211516B2 (en) 2008-05-13 2012-07-03 Tokitae Llc Multi-layer insulation composite material including bandgap material, storage container using same, and related methods
US8485387B2 (en) 2008-05-13 2013-07-16 Tokitae Llc Storage container including multi-layer insulation composite material having bandgap material
US9174791B2 (en) 2007-12-11 2015-11-03 Tokitae Llc Temperature-stabilized storage systems
US9205969B2 (en) 2007-12-11 2015-12-08 Tokitae Llc Temperature-stabilized storage systems
US8377030B2 (en) 2007-12-11 2013-02-19 Tokitae Llc Temperature-stabilized storage containers for medicinals
US9140476B2 (en) 2007-12-11 2015-09-22 Tokitae Llc Temperature-controlled storage systems
US9139351B2 (en) 2007-12-11 2015-09-22 Tokitae Llc Temperature-stabilized storage systems with flexible connectors
US8887944B2 (en) 2007-12-11 2014-11-18 Tokitae Llc Temperature-stabilized storage systems configured for storage and stabilization of modular units
US8603598B2 (en) 2008-07-23 2013-12-10 Tokitae Llc Multi-layer insulation composite material having at least one thermally-reflective layer with through openings, storage container using the same, and related methods
FR2933973B1 (fr) * 2008-07-16 2011-09-09 Messier Bugatti Procede de fabrication d'une piece de friction en materiau composite carbone/carbone
US9372016B2 (en) 2013-05-31 2016-06-21 Tokitae Llc Temperature-stabilized storage systems with regulated cooling
US9447995B2 (en) 2010-02-08 2016-09-20 Tokitac LLC Temperature-stabilized storage systems with integral regulated cooling
US10648106B2 (en) * 2012-03-05 2020-05-12 Goodrich Corporation Systems and methods for reduced crimp carbon fiber helical fabric
US9960021B2 (en) * 2013-12-18 2018-05-01 Applied Materials, Inc. Physical vapor deposition (PVD) target having low friction pads
US9834842B2 (en) 2015-05-15 2017-12-05 Goodrich Corporation Slotted seal plates and slotted preforms for chemical vapor deposition densification
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
WO2017033053A1 (en) 2015-08-21 2017-03-02 Flisom Ag Homogeneous linear evaporation source
CN107288988A (zh) * 2016-04-13 2017-10-24 昱程科技股份有限公司 碳纤维垫片及其结合方法
CN114929757B (zh) * 2019-12-13 2024-02-20 科巨希化学股份有限公司 光聚合起始剂
CN111120549B (zh) * 2020-01-12 2021-06-11 安徽飞鹰汽车零部件股份有限公司 一种改性树脂基有机复合材料刹车片
US11788186B2 (en) 2020-03-16 2023-10-17 Goodrich Corporation Seal plates for chemical vapor infiltration and deposition chambers
FR3114107B1 (fr) * 2020-09-15 2023-02-24 Safran Ceram Cales pour substrats densifiés par infiltration chimique en phase vapeur
CN112279563B (zh) * 2020-10-20 2022-06-21 南方科技大学 可控压缩形变法取向碳纤维制备纵向高导热垫片的制备方法
CN113511802B (zh) * 2021-04-20 2022-12-20 成都光明光电股份有限公司 玻璃制品生产用软化垫片及其制作方法
FR3145562B1 (fr) * 2023-02-03 2025-09-05 Safran Ceram Préforme pour densification CVI à flux dirigé

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB419949A (en) * 1933-05-19 1934-11-19 G N Haden & Sons Ltd Improvements in or relating to burners for liquid fuel
US2900182A (en) * 1955-04-27 1959-08-18 William L Hinks Static load bearings
US3429622A (en) * 1967-03-06 1969-02-25 Thiokol Chemical Corp Flexible bearings and process for their manufacture
BE757208A (fr) * 1969-10-08 1971-04-07 Monsanto Co Structure composite entierement en carbone
US3932568A (en) * 1973-06-26 1976-01-13 Friction Products Inc. High-energy brake and brake components
JPS5415628Y2 (xx) * 1973-06-28 1979-06-22
SE7414359L (sv) * 1974-11-15 1976-05-17 Bofors Ab Sett att kyla en vat lamellkoppling jemte herfor avsedd kopplingslamell
US3958840A (en) * 1975-05-05 1976-05-25 Thiokol Corporation Flexible bearing having reinforcements
JPS5361591U (xx) * 1976-10-25 1978-05-25
FR2370900A1 (fr) * 1976-11-10 1978-06-09 Europ Propulsion Piece de butee flexible
DE7912427U1 (de) * 1979-04-28 1979-08-02 Lenser Kunststoff-Presswerk Gmbh + Co Kg, 7913 Senden Vorrichtung zur abstuetzung einer heiz- und/oder kuehlbaren pressenplatte an einer jeweils als plattentraeger dienenden druckplatte einer presse
FR2649974B1 (fr) * 1989-07-21 1991-09-27 Aerospatiale Materiau carbone protege contre l'oxydation par du carbonitrure de bore
US5184704A (en) * 1991-08-12 1993-02-09 Hays Bill J Clutch design and manufacture
US5348774A (en) * 1993-08-11 1994-09-20 Alliedsignal Inc. Method of rapidly densifying a porous structure
FR2711645B1 (fr) 1993-10-27 1996-01-26 Europ Propulsion Procédé d'infiltration chimique en phase vapeur d'un matériau au sein d'un substrat fibreux avec établissement d'un gradient de température dans celui-ci.
US5480678A (en) * 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
ATE172753T1 (de) 1994-11-16 1998-11-15 Goodrich Co B F Vorrichtung zur druckfeld cvd/cvi, verfahren und produkt
FR2733254B1 (fr) * 1995-04-18 1997-07-18 Europ Propulsion Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires
FR2741063B1 (fr) * 1995-11-14 1998-02-13 Europ Propulsion Procede pour l'introduction dans des substrats poreux d'une composition en fusion a base de silicium
US5851609A (en) * 1996-02-27 1998-12-22 Truseal Technologies, Inc. Preformed flexible laminate
EP0823491B1 (en) * 1996-08-07 2002-02-27 Concept Systems Design Inc. Gas injection system for CVD reactors
FR2754813B1 (fr) * 1996-10-18 1999-01-15 Europ Propulsion Densification de substrats poreux disposes en piles annulaires par infiltration chimique en phase vapeur a gradient de temperature
US6284969B1 (en) * 1997-05-15 2001-09-04 Jx Crystals Inc. Hydrocarbon fired thermophotovoltaic furnace
DE10013409C1 (de) * 2000-03-17 2000-11-23 Daimler Chrysler Ag Verfahren und Vorrichtung zur Herstellung von faserverstärkten Bauteilen mittels eines Injektionsverfahrens
US6364958B1 (en) * 2000-05-24 2002-04-02 Applied Materials, Inc. Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges
FR2810552B1 (fr) * 2000-06-26 2004-11-19 Univ Paris Curie Polymere biocompatible a structure tridimensionnelle a cellules communicantes, procede de preparation et application en medecine et en chirurgie
WO2002016844A1 (en) * 2000-08-23 2002-02-28 University Of Virginia Patent Foundation Automated storage and retrieval apparatus for freezers and related method thereof
CN2444878Y (zh) * 2000-08-25 2001-08-29 西安兰空航空设备公司 飞机用炭刹车盘的气相沉积炉
WO2002051771A1 (en) * 2000-12-22 2002-07-04 Freni Brembo S.P.A. Process for the production of a braking band with venting passages and braking band obtained with said process
FR2821859B1 (fr) * 2001-03-06 2004-05-14 Snecma Moteurs Procede pour la densification par infiltration chimique en phase vapeur de substrats poreux ayant un passage central
JP4564208B2 (ja) * 2001-06-27 2010-10-20 三井造船株式会社 ディーゼルエンジン排ガス浄化装置

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