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TWM636483U - Rotary transfer type vertical coating equipment - Google Patents

Rotary transfer type vertical coating equipment Download PDF

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Publication number
TWM636483U
TWM636483U TW111209804U TW111209804U TWM636483U TW M636483 U TWM636483 U TW M636483U TW 111209804 U TW111209804 U TW 111209804U TW 111209804 U TW111209804 U TW 111209804U TW M636483 U TWM636483 U TW M636483U
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chamber
axis
rotary
opening
plated
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TW111209804U
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Chinese (zh)
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黃一原
劉鎰誠
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凌嘉科技股份有限公司
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Priority to TW111209804U priority Critical patent/TWM636483U/en
Publication of TWM636483U publication Critical patent/TWM636483U/en

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Abstract

一種旋轉移載式立式鍍膜設備,包含複數真空製程腔、一第一旋轉腔,及一第二旋轉腔。該等真空製程腔分別設置於一第一軸線及一第二軸線上,且能容置及輸送該待鍍物。該第一旋轉腔設置於該第一軸線上,並連接其中一真空製程腔且可驅動該待鍍物旋轉,並可供該待鍍物移入及移出,該第二旋轉腔設置於該第二軸線上,並連接其中另一真空製程腔且可驅動該待鍍物旋轉,並可供該待鍍物移入及移出。藉此可減少設置腔的數量而減少佔用空間且易於利用空間,並達到雙面鍍膜的功效。A rotary transfer type vertical coating equipment includes a plurality of vacuum process chambers, a first rotary chamber, and a second rotary chamber. The vacuum process chambers are respectively arranged on a first axis and a second axis, and can accommodate and transport the object to be plated. The first rotating chamber is arranged on the first axis, and is connected to one of the vacuum process chambers, and can drive the object to be plated to rotate, and can allow the object to be plated to move in and out. The second rotating chamber is arranged on the second On the axis, it is connected to another vacuum process chamber and can drive the object to be plated to rotate and allow the object to be plated to move in and out. Thereby, the number of cavities can be reduced to reduce the space occupied and the space can be easily utilized, and the effect of double-sided coating can be achieved.

Description

旋轉移載式立式鍍膜設備Rotary transfer type vertical coating equipment

本新型是有關於一種鍍膜設備,特別是指一種旋轉移載式立式鍍膜設備。 The present invention relates to a coating equipment, in particular to a rotary transfer type vertical coating equipment.

參閱圖1、圖2,該鍍膜設備適用於對一待鍍物(圖未示)進行兩種不同鍍膜材質的雙面鍍膜,並包括相反設置的一入料腔11及一出料腔12、一真空除氣腔13、二真空清潔腔14、四真空鍍膜腔15、一回流通道16、複數在設備中循環移動的承載裝置17、四個分別設置於該等真空鍍膜腔15用來供鍍膜使用的靶材18,及二設置於該等真空清潔腔14且分別可對該待鍍物其中一面進行清潔的清潔模組19。該真空除氣腔13、該等真空清潔腔14、該等真空鍍膜腔15依序設置於該入料腔11與該出料腔12間,該回流通道16連接於該入料腔11及該出料腔12間並位於上方。 Referring to Fig. 1, Fig. 2, this film coating equipment is suitable for carrying out double-sided film coating of two kinds of different coating film materials to an object to be plated (not shown in the figure), and comprises a feeding chamber 11 and a feeding chamber 12 that are oppositely arranged, One vacuum degassing chamber 13, two vacuum cleaning chambers 14, four vacuum coating chambers 15, one return channel 16, a plurality of carrying devices 17 that move cyclically in the equipment, and four are respectively arranged in these vacuum coating chambers 15 for coating The target material 18 used, and two cleaning modules 19 which are arranged in the vacuum cleaning chambers 14 and can respectively clean one side of the object to be plated. The vacuum degassing chamber 13, the vacuum cleaning chambers 14, and the vacuum coating chambers 15 are sequentially arranged between the feeding chamber 11 and the discharging chamber 12, and the return channel 16 is connected to the feeding chamber 11 and the There are 12 discharge chambers and are located above.

運作時,每一承載裝置17移動到該入料腔11後,將該待鍍物設置於該承載裝置17上,該承載裝置17再依序經過該真空除氣腔13、該等真空清潔腔14,及於不同的該等真空鍍膜腔15以該等 靶材18對該待鍍物的相反兩面進行鍍膜,最後,該承載裝置17移動到該出料腔12後,卸下該待鍍物以完成雙面鍍膜的製程,該承載裝置17再經由該回流通道16回到該入料腔11,以便進行下一次鍍膜製程。 During operation, after each carrying device 17 moves to the feeding chamber 11, the object to be plated is placed on the carrying device 17, and the carrying device 17 passes through the vacuum degassing chamber 13, the vacuum cleaning chambers in sequence. 14, and in the different vacuum coating chambers 15 with the The target material 18 coats the opposite sides of the object to be plated, and finally, after the carrying device 17 moves to the discharge chamber 12, the object to be plated is removed to complete the double-sided coating process, and the carrying device 17 passes through the The return channel 16 returns to the feeding chamber 11 for the next coating process.

然而,由於該等真空清潔腔14只能朝單一方向進行處理,因此必須設置兩個真空清潔腔14,並朝相反的兩個方向對該待鍍物的相反兩面進行清潔。當要進行兩種不同鍍膜材質的雙面鍍膜時,由於鍍膜的方向決定了該等靶材18的設置位置,因而需要配置四個真空鍍膜腔15而形成一狹長條形的格局,進而導致設備的佔用面積較大,及產生狹長型設備的周邊剩餘空間難以利用的問題。而真空腔的數量增加,也導致需消耗更多的能源以維持真空腔內的真空度。 However, since the vacuum cleaning chambers 14 can only be processed in one direction, two vacuum cleaning chambers 14 must be provided to clean the opposite sides of the object to be plated in two opposite directions. When double-sided coating of two different coating materials is to be carried out, since the direction of the coating determines the setting positions of the targets 18, four vacuum coating chambers 15 need to be configured to form a long and narrow pattern, which in turn leads to The occupied area is large, and the remaining space around the long and narrow equipment is difficult to use. The increase in the number of vacuum chambers also results in the consumption of more energy to maintain the vacuum in the vacuum chambers.

此外,由於該回流通道16的長度較長,該等承載裝置17經由該回流通道16回到該入料腔11所需的時間較長,因此需額外準備更多的承載裝置17以利於不間斷的生產,導致其建構成本及後期維護成本較高。 In addition, due to the longer length of the return passage 16, it takes longer for the carrying devices 17 to return to the feeding chamber 11 via the return passage 16, so it is necessary to prepare more carrying devices 17 to facilitate uninterrupted production, resulting in higher construction costs and later maintenance costs.

因此,本新型之目的,即在提供一種可減少佔地面積、提高生產靈活度與生產效率、降低維護成本,及降低能源消耗的旋轉 移載式立式鍍膜設備及雙面多層膜的鍍膜方法。 Therefore, the purpose of this new model is to provide a rotary that can reduce floor space, improve production flexibility and production efficiency, reduce maintenance costs, and reduce energy consumption. Transfer-type vertical coating equipment and a coating method for double-sided multilayer films.

於是,本新型旋轉移載式立式鍍膜設備,適用以對至少一待鍍物進行鍍膜,該旋轉移載式立式鍍膜設備包含複數真空製程腔,及一旋轉裝置。 Therefore, the rotary transfer type vertical coating equipment of the present invention is suitable for coating at least one object to be plated. The rotary transfer type vertical coating equipment includes a plurality of vacuum process chambers and a rotating device.

該等真空製程腔分別設置於該第一軸線及該第二軸線上,且能容置及沿該第一軸線及該第二軸線輸送該待鍍物。 The vacuum process chambers are respectively arranged on the first axis and the second axis, and can accommodate and transport the object to be plated along the first axis and the second axis.

該旋轉裝置,包括一第一旋轉腔及一第二旋轉腔。 The rotating device includes a first rotating chamber and a second rotating chamber.

該第一旋轉腔設置於該第一軸線上,並包括一位於該第一軸線且連接其中一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間的側開口,及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組,該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口,及以該頭端及該尾端的其中之一朝向該側開口,該待鍍物能自該旋轉模組的頭端或尾端移入及移出。 The first rotating chamber is arranged on the first axis, and includes a rear opening located on the first axis and connected to one of the vacuum process chambers, a side opening located between the first axis and the second axis, and A rotary module capable of accommodating and driving the object to be plated to rotate and having a head end and a tail end, the head end facing the rear opening, the tail end facing the rear opening, and the One of the head end and the tail end is open towards the side, and the object to be plated can move in and out from the head end or the tail end of the rotary module.

該第二旋轉腔設置於該第二軸線上,並包括一位於該第二軸線且連接其中另一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間且對應該第一旋轉腔的側開口,及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組,該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口,及以該頭端及該尾端的其中之一朝向該側開口,該待鍍物能自該旋轉模組的頭端或尾端移入及移出。 The second rotating chamber is arranged on the second axis, and includes a rear opening located on the second axis and connected to another vacuum process chamber, and a rear opening located between the first axis and the second axis and corresponding to the second axis. A side opening of a rotating cavity, and a rotating module capable of accommodating and driving the object to be plated to rotate and having a head end and a tail end. Towards the rear opening, and one of the head end and the tail end faces to the side opening, the object to be plated can move in and out from the head end or the tail end of the rotary module.

本新型之功效在於:藉由該等真空製程腔、該第一旋轉腔及該第二旋轉腔的設置,使得可用單一個僅能朝單方向進行加工的真空製程腔對該待鍍物的相反兩面進行加工,能提高生產靈活度與生產效率,亦能減少該真空製程腔的數量,進一步降低維持真空所需的能源消耗及維護成本,此外,藉由沿該第一軸線及該第二軸線排列,減少整體在該第一軸線上的長度,達到減少佔地面積且易於利用空間的功效。 The effect of the present invention is that: through the arrangement of the vacuum process chambers, the first rotating chamber and the second rotating chamber, a single vacuum process chamber that can only process in one direction can be used to reverse the opposite direction of the object to be plated. Processing on both sides can improve production flexibility and production efficiency, and can also reduce the number of vacuum process chambers, further reducing energy consumption and maintenance costs required to maintain vacuum. In addition, by processing along the first axis and the second axis Arranged to reduce the length of the whole on the first axis, so as to achieve the effect of reducing the occupied area and making it easy to use the space.

2:承載裝置 2: Carrying device

21:載具 21: Vehicle

3:真空製程腔 3: Vacuum process chamber

31:裝載腔體 31: Loading cavity

32:除氣腔體 32: Degassing cavity

33:清潔腔體 33: Clean the chamber

34:第一鍍膜腔體 34: The first coating cavity

35:第二鍍膜腔體 35: Second coating cavity

36:緩衝腔體 36: Buffer cavity

37:卸載腔體 37: Unloading cavity

4:旋轉裝置 4: Rotating device

41:第一旋轉腔 41: The first rotating cavity

411:後開口 411: rear opening

412:前開口 412: front opening

413:側開口 413: side opening

414:旋轉模組 414: Rotation module

415:頭端 415: head end

416:尾端 416: end

417:外開口 417: Outer opening

42:第二旋轉腔 42: the second rotating cavity

421:後開口 421: rear opening

422:前開口 422: front opening

423:側開口 423: side opening

424:旋轉模組 424: Rotation module

425:頭端 425: head end

426:尾端 426: end

427:外開口 427: Outer opening

43:中繼腔 43: relay cavity

5:回流裝置 5: Backflow device

81~86:步驟 81~86: Steps

91~95:步驟 91~95: steps

9:待鍍物 9: Items to be plated

L1:第一軸線 L1: first axis

L2:第二軸線 L2: second axis

L3:第三軸線 L3: third axis

L4:第四軸線 L4: Fourth axis

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是一側視示意圖,說明一習知的鍍膜設備;圖2是該習知的鍍膜設備的一俯視示意圖;圖3是一立體圖,說明本新型旋轉移載式立式鍍膜設備的一個實施例的一承載裝置及一待鍍物;圖4是該實施例的一俯視圖;圖5是該實施例的另一俯視圖,說明二旋轉模組各自的頭端分別朝向二旋轉裝置的前開口;圖6是該實施例的另一俯視圖,說明該等頭端分別朝向該等旋轉裝置各自的側開口; 圖7是一俯視圖,說明該實施例的該旋轉裝置的另一種配置;圖8是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第一變化例;圖9是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第二變化例;圖10是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第三變化例;圖11是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第四變化例;圖12是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第五變化例;圖13是一俯視圖,說明本新型旋轉移載式立式鍍膜設備的一個第六變化例;圖14是該實施例的一流程圖;及圖15該實施例的一流程圖。 Other features and effects of the present invention will be clearly presented in the implementation manner with reference to the drawings, wherein: Fig. 1 is a schematic side view illustrating a known coating equipment; Fig. 2 is a diagram of the known coating equipment A schematic diagram of a top view; Fig. 3 is a perspective view illustrating a carrying device and an object to be plated of an embodiment of the novel rotary transfer type vertical coating equipment; Fig. 4 is a top view of the embodiment; Fig. 5 is the implementation Another top view of the example, illustrating that the respective head ends of the two rotating modules are respectively facing the front openings of the two rotating devices; Fig. 6 is another top view of the embodiment, illustrating that the head ends are respectively facing the respective side openings of the rotating devices ; Fig. 7 is a top view, illustrating another configuration of the rotating device of this embodiment; Fig. 8 is a top view, illustrating a first modification example of the new rotary transfer type vertical coating equipment; Fig. 9 is a top view, illustrating A second variation example of the new rotary transfer type vertical coating equipment; Fig. 10 is a top view illustrating a third variation example of the new rotary transfer type vertical coating equipment; Fig. 11 is a top view illustrating the new type A fourth variation example of the rotary transfer type vertical coating equipment; Fig. 12 is a top view illustrating a fifth variation example of the rotary transfer type vertical coating equipment of the present invention; Fig. 13 is a top view illustrating the new rotary transfer type vertical coating equipment A sixth variation example of the load-type vertical coating equipment; FIG. 14 is a flow chart of this embodiment; and FIG. 15 is a flow chart of this embodiment.

參閱圖3、圖4,本新型旋轉移載式立式鍍膜設備的實施例適用於複數直立設置的待鍍物9,該等待鍍物9可以是機殼、面板級扇出型封裝(FOPLP)、晶圓級扇出型封裝(FOWLP)、埋入 式基板、無核心基板、玻璃基板、封裝基板、PCB基板、晶圓或晶圓級封裝等金屬及非金屬物。定義一第一軸線L1及一第二軸線L2。該旋轉移載式立式鍍膜設備包含一承載裝置2、複數真空製程腔3、一旋轉裝置4,及一回流裝置5。 Referring to Fig. 3 and Fig. 4, the embodiment of the novel rotary transfer type vertical coating equipment is applicable to a plurality of upright objects to be coated 9, and the objects to be coated 9 may be casings, panel-level fan-out packages (FOPLP) , Wafer-Level Fan-Out Packaging (FOWLP), Embedded Type substrates, coreless substrates, glass substrates, packaging substrates, PCB substrates, wafers or wafer-level packaging and other metal and non-metallic objects. A first axis L1 and a second axis L2 are defined. The rotary transfer type vertical coating equipment includes a carrying device 2 , a plurality of vacuum process chambers 3 , a rotating device 4 , and a reflow device 5 .

於本實施例中,該第一軸線L1與該第二軸線L2是平行。惟於其他實施態樣中,也能因廠房的空間配置而略成一角度,並不以此為限。 In this embodiment, the first axis L1 and the second axis L2 are parallel. However, in other implementation forms, it can also be slightly angled due to the space configuration of the factory building, and it is not limited thereto.

該承載裝置2包括複數直立設置且適用以承載該等待鍍物9的載具21,於本實施例中,每一載具21呈矩形框狀,於其他實施態樣中,若該待鍍物9的結構強度較高(例如自身帶框的玻璃基板時),亦能不設置該承載裝置2。應說明的是,固定於每一載具21的待鍍物9數量也可以是數個,並不以此為限。 The carrying device 2 includes a plurality of vertically arranged carriers 21 suitable for carrying the object to be plated 9. In this embodiment, each carrier 21 is in the shape of a rectangular frame. In other embodiments, if the object to be plated The structural strength of 9 is relatively high (for example, when the glass substrate itself has a frame), and the carrying device 2 can also be omitted. It should be noted that the number of objects to be plated 9 fixed on each carrier 21 may also be several, and it is not limited thereto.

為了利於後續的說明,以下將以一個載具21及一個待鍍物9為例,此時,該待鍍物9是固定於該載具21的中間部位,藉此保護該待鍍物9不於加工或運輸時受損,並給予該待鍍物9一定張力,使其抵抗因重力而產生之變形,藉此達到均勻的加工品質。該待鍍物9在該載具21的水平方向上開放以接受鍍膜製程中的各種處置。 For the convenience of follow-up explanation, below will be an example with a carrier 21 and an object to be plated 9, and this moment, this object to be plated 9 is fixed on the middle part of this carrier 21, protects this object to be plated 9 by this It is damaged during processing or transportation, and a certain tension is given to the object to be plated 9 to make it resist deformation due to gravity, thereby achieving uniform processing quality. The object to be plated 9 is open in the horizontal direction of the carrier 21 to accept various treatments in the coating process.

該等真空製程腔3分別設置於該第一軸線L1及該第二軸線L2上,且能容置及分別沿該第一軸線L1及該第二軸線L2輸送該載具21及該待鍍物9。 The vacuum process chambers 3 are respectively arranged on the first axis L1 and the second axis L2, and can accommodate and transport the carrier 21 and the object to be plated along the first axis L1 and the second axis L2 respectively. 9.

於本實施例中,該等真空製程腔3的數量是8個,且分別是設置於該第一軸線L1上的一裝載腔體31、二除氣腔體32,及一清潔腔體33,及設置於該第二軸線L2上的一第一鍍膜腔體34、一第二鍍膜腔體35、一緩衝腔體36,及一卸載腔體37。該等真空製程腔3之間可以設置閥門(圖未示),藉此維持腔內真空度的穩定。 In this embodiment, the number of the vacuum process chambers 3 is eight, and they are respectively a loading chamber 31, two degassing chambers 32, and a cleaning chamber 33 arranged on the first axis L1, And a first coating cavity 34 , a second coating cavity 35 , a buffer cavity 36 , and an unloading cavity 37 are arranged on the second axis L2. Valves (not shown) may be arranged between the vacuum process chambers 3 to maintain a stable vacuum degree in the chambers.

該裝載腔體31用於進料。 The loading chamber 31 is used for feeding.

該等除氣腔體32彼此相連接且可對進入內部的該載具21及該待鍍物9進行真空除氣(Degas),去除因與外界空氣接觸而吸附於該載具21及該待鍍物9的水分子與氣體。藉由設置該等除氣腔體32能提高生產效率,例如將該載具21及該待鍍物9分別於其中一除氣腔體32內置放3分鐘並將其抽至一低真空度,並於其中另一除氣腔體32內置放3分鐘並將其抽至一高真空度,藉此共能累積6分鐘的除氣時間且分散建立真空度所需的時間,進一步達到更佳的製程效率。 The degassing cavities 32 are connected to each other and can carry out vacuum degassing (Degas) to the carrier 21 and the object to be plated 9 entering the inside, and remove the carrier 21 and the object to be plated due to contact with the outside air. Water molecules and gas of plating 9. Production efficiency can be improved by arranging these degassing chambers 32, for example, the carrier 21 and the object to be plated 9 are respectively placed in one of the degassing chambers 32 for 3 minutes and then evacuated to a low vacuum degree, And put it in another degassing cavity 32 for 3 minutes and evacuate it to a high vacuum, so that a total of 6 minutes of degassing time can be accumulated and the time required to establish a vacuum can be dispersed to further achieve a better Process efficiency.

除氣腔體32的數量不以二個為限。除了可增加除氣腔體32的數量以分散降低每一次停留所需的時間之外,於其他實施態樣中,為了進一步提高製程的良率,亦能於該裝載腔體31之前設置至少一烤箱(圖未示),由於該待鍍物9自其他製程工序移送至本新型的實施例時,可能因暴露於大氣的時間較長而吸附較多的水氣。藉由將該待鍍物9於該至少一烤箱內烘烤一時間,實務上約為烘烤 30分鐘至1小時之間,能有效減少該待鍍物9於該等除氣腔體32內所需的除氣時間,進一步能減少該等除氣腔體32的數量或不裝設該除氣腔體32。此外,另於其他實施態樣中,亦能使該裝載腔體31具有真空除氣的功能,藉此能減少該等除氣腔體32的數量或不裝設該除氣腔體32。 The number of degassing chambers 32 is not limited to two. In addition to increasing the number of degassing chambers 32 to disperse and reduce the time required for each residence, in other implementations, in order to further improve the yield of the process, at least one can also be set before the loading chamber 31 The oven (not shown in the figure), since the object to be plated 9 is transferred from other manufacturing processes to the embodiment of the present invention, may absorb more water vapor due to the longer exposure time to the atmosphere. By baking the object to be plated 9 in the at least one oven for a period of time, it is practically approximately Between 30 minutes and 1 hour, the degassing time required for the object to be plated 9 in the degassing chambers 32 can be effectively reduced, and the number of these degassing chambers 32 can be further reduced or the degassing chambers 32 can not be installed. Air cavity body 32 . In addition, in other implementations, the loading chamber 31 can also be provided with a vacuum degassing function, thereby reducing the number of the degassing chambers 32 or not installing the degassing chamber 32 .

該清潔腔體33與該等除氣腔體32間隔設置,且用來對進入內部的該待鍍物9進行清潔。於本實施例中,是以電漿清洗(Plasma)的製程方法。 The cleaning chamber 33 is spaced apart from the degassing chambers 32 and is used to clean the object to be plated 9 entering inside. In this embodiment, the process method of plasma cleaning (Plasma) is used.

該第一鍍膜腔體34及該第二鍍膜腔體35間隔設置,且用來對該待鍍物9進行鍍膜。該第一鍍膜腔體34與該第二鍍膜腔體35用來鍍膜的材質相異。於本實施例中,該第一鍍膜腔體34是用來對該待鍍物9進行鍍鈦(Ti),該第二鍍膜腔體35是用來對該待鍍物9的進行鍍銅(Cu),於其他實施態樣中,也可依需求選用其他鍍膜材料。 The first coating cavity 34 and the second coating cavity 35 are spaced apart and used for coating the object 9 to be coated. The first coating cavity 34 and the second coating cavity 35 are made of different materials for coating. In the present embodiment, the first coating chamber 34 is used to plate titanium (Ti) on the object 9 to be plated, and the second coating chamber 35 is used to plate copper on the object 9 to be plated ( Cu), in other implementations, other coating materials can also be selected according to requirements.

此外,也可依鍍膜層數需求增減鍍膜腔體的數量,例如當需要鍍上較厚的銅層時,可以設置二個以上的第二鍍膜腔體35。 In addition, the number of coating chambers can also be increased or decreased according to the number of coating layers. For example, when a thicker copper layer needs to be plated, more than two second coating chambers 35 can be provided.

能理解的是,該第一鍍膜腔體34除了鍍鈦以外,在一些實施態樣中,也可以鍍TiW、Cr、NiCr、Ni、Ta、CuN、Ti/TiN、Ta/TaN、SUS。而該第二鍍膜腔體35除了鍍銅以外,在一些實施態樣中,也可以鍍銅合金。此外,在不同的實施態樣中,該第一鍍 膜腔體34與該第二鍍膜腔體35的鍍膜種類也能互換。鍍膜種類及層數並非本新型的一限制,使用者可依實際鍍膜需求來選用鍍膜材質及配置鍍膜腔體的數量。 It can be understood that, in addition to titanium coating, the first coating chamber 34 can also be coated with TiW, Cr, NiCr, Ni, Ta, CuN, Ti/TiN, Ta/TaN, SUS in some implementations. In addition to copper plating, the second coating cavity 35 may also be plated with copper alloy in some implementations. In addition, in different implementations, the first plating The coating types of the film cavity 34 and the second coating cavity 35 can also be interchanged. The type of coating and the number of layers are not a limitation of this model. Users can choose the coating material and configure the number of coating chambers according to the actual coating needs.

要特別再說明的是,在上述實施例中的該等真空製程腔3內都能設置高效率的冷卻模組,例如冷卻管路或在腔內通入冷卻氣體,以有效控制該待鍍物9的溫度,及減少該待鍍物9的變形,提升產品良率。 It should be further explained that high-efficiency cooling modules can be arranged in the vacuum process chambers 3 in the above-mentioned embodiments, such as cooling pipelines or passing cooling gas into the chamber, so as to effectively control the coating. 9 temperature, and reduce the deformation of the object 9 to be plated, improve product yield.

該緩衝腔體36連接於該第二鍍膜腔體35且用來輸送及容置該承載裝置2。於本實施例中,由於該第一鍍膜腔體34及該第二鍍膜腔體35於製程時所需的本底真空度(Base pressure)較高(壓力值約介於10-5~10-8Torr,通常為10-6Torr,較佳的為10-7Torr),藉由設置該緩衝腔體36能達到至少以下的功效: The buffer chamber 36 is connected to the second coating chamber 35 and is used for transporting and accommodating the carrying device 2 . In this embodiment, since the first coating chamber 34 and the second coating chamber 35 require a higher base vacuum (Base pressure) during the process (the pressure value is about 10 −5 ~10 − 8 Torr, usually 10 -6 Torr, preferably 10 -7 Torr), by setting the buffer cavity 36 can achieve at least the following effects:

一、利於逐步將該待鍍物9所處的真空度緩降至相同於外界的大氣壓力,能讓該第二鍍膜腔體35將該待鍍物9輸送至該緩衝腔體36時,不會因真空度的落差太大而增加後續重新建立真空度時所需的時間。 1. It is beneficial to gradually reduce the vacuum degree of the object to be plated 9 to the same atmospheric pressure as the outside world, so that when the second coating chamber 35 transports the object to be plated 9 to the buffer chamber 36, no The time required for subsequent re-establishment of the vacuum will be increased due to a large drop in the vacuum.

二、達到水氣隔絕的目的。由於外界的大氣溼度約介於40%至70%之間,藉由設置該緩衝腔體36能避免外界的水氣擴散至該第一鍍膜腔體34及該第二鍍膜腔體35,進一步避免造成腔內的真空度變差、避免靶材表面氧化、及避免因水氣混雜而造成鍍膜的 品質變差。 Second, to achieve the purpose of water vapor isolation. Since the atmospheric humidity of the outside world is about between 40% and 70%, the moisture in the outside world can be prevented from diffusing to the first coating chamber 34 and the second coating chamber 35 by setting the buffer chamber 36, further avoiding It will cause the vacuum degree in the cavity to become poor, avoid the oxidation of the target surface, and avoid the coating caused by the mixing of water and air. The quality deteriorates.

惟於其他實施態樣中,若外界的大氣濕度已被精確的控制,亦可不設置該緩衝腔體36,不以此為限。 However, in other implementations, if the outside atmospheric humidity has been accurately controlled, the buffer cavity 36 may not be provided, and the present invention is not limited thereto.

該卸載腔體37連接該緩衝腔體36且用於出料。 The unloading chamber 37 is connected to the buffer chamber 36 and used for discharging.

該旋轉裝置4包括一設置於該第一軸線L1上的第一旋轉腔41、一設置於該第二軸線L2上的第二旋轉腔42,及一位於該第一旋轉腔41及該第二旋轉腔42之間的中繼腔43。該第一旋轉腔41連接於其中一該除氣腔體32與該清潔腔體33間。該第二旋轉腔42連接於該第一鍍膜腔體34與該第二鍍膜腔體35間。該旋轉裝置4內亦為真空狀態。 The rotating device 4 includes a first rotating chamber 41 arranged on the first axis L1, a second rotating chamber 42 arranged on the second axis L2, and a rotating chamber located between the first rotating chamber 41 and the second rotating chamber. Relay chamber 43 between rotating chambers 42 . The first rotating chamber 41 is connected between one of the degassing chambers 32 and the cleaning chamber 33 . The second rotating chamber 42 is connected between the first coating chamber 34 and the second coating chamber 35 . The inside of the rotating device 4 is also in a vacuum state.

參閱圖4、圖5、圖6,該第一旋轉腔41包括沿該第一軸線L1相反設置且分別連接其中一該除氣腔體32與該清潔腔體33的一後開口411及一前開口412、一位於該第一軸線L1與該第二軸線L2之間的側開口413,及一旋轉模組414。該旋轉模組414能容置且可驅動該載具21及該待鍍物9以沿一鉛直方向延伸的旋轉軸(圖未示)旋轉,並具有一頭端415及一尾端416。該旋轉模組414能以該頭端415朝向該後開口411(如圖4所示,此時,該尾端416朝向該前開口412)、以該頭端415朝向該前開口412(如圖5所示,此時,該尾端416朝向該後開口411),及以該頭端415朝向該側開口413(如圖6所示)。該載具21及該待鍍物9能自該旋轉模組414的該頭端415 或該尾端416移入及移出。 Referring to Fig. 4, Fig. 5 and Fig. 6, the first rotating chamber 41 includes a rear opening 411 and a front opening 411 which are arranged oppositely along the first axis L1 and respectively connect one of the degassing chambers 32 and the cleaning chamber 33. The opening 412 , a side opening 413 located between the first axis L1 and the second axis L2 , and a rotating module 414 . The rotating module 414 can accommodate and drive the carrier 21 and the object to be plated 9 to rotate on a vertically extending rotating shaft (not shown), and has a head end 415 and a tail end 416 . The rotary module 414 can face the rear opening 411 with the head end 415 (as shown in FIG. 5, at this moment, the tail end 416 faces the rear opening 411), and the head end 415 faces the side opening 413 (as shown in FIG. 6 ). The carrier 21 and the object to be plated 9 can be obtained from the head end 415 of the rotary module 414 Or the tail end 416 moves in and out.

該第二旋轉腔42包括沿該第二軸線L2相反設置且分別連接該第二鍍膜腔體35與該第一鍍膜腔體34的一後開口421及一前開口422、一位於該第一軸線L1與該第二軸線L2之間且對應該第一旋轉腔41的側開口423,及一旋轉模組424。該旋轉模組424能容置且可驅動該載具21及該待鍍物9以沿該鉛直方向延伸的旋轉軸(圖未示)旋轉,並具有一頭端425及一尾端426。該旋轉模組424能以該頭端425朝向該後開口421(如圖4所示,此時,該尾端426朝向該前開口422)、以該頭端425朝向該前開口422(如圖5所示,此時,該尾端426朝向該後開口421),及以該頭端425朝向該側開口423(如圖6所示)。該載具21及該待鍍物9能自該旋轉模組424的該頭端425或該尾端426移入及移出。 The second rotating chamber 42 includes a rear opening 421 and a front opening 422 which are oppositely disposed along the second axis L2 and respectively connect the second coating chamber 35 and the first coating chamber 34, and a front opening 422 located on the first axis L2. Between L1 and the second axis L2 corresponds to the side opening 423 of the first rotating cavity 41 and a rotating module 424 . The rotating module 424 can accommodate and drive the carrier 21 and the object to be plated 9 to rotate on a rotating shaft (not shown) extending along the vertical direction, and has a head end 425 and a tail end 426 . The rotary module 424 can face the rear opening 421 with the head end 425 (as shown in FIG. 5, at this moment, the tail end 426 faces the rear opening 421), and the head end 425 faces the side opening 423 (as shown in FIG. 6 ). The carrier 21 and the object to be plated 9 can move in and out from the head end 425 or the tail end 426 of the rotary module 424 .

較佳的,於本實施例中,當該第一旋轉腔41的旋轉模組414的該頭端415朝向該後開口411或當該尾端416朝向該後開口411時,該待鍍物9皆位於該第一軸線L1上。當該第二旋轉腔42的旋轉模組424的該頭端425朝向該後開口421或當該尾端426朝向該後開口421時,該待鍍物9皆位於該第二軸線L2上。 Preferably, in this embodiment, when the head end 415 of the rotary module 414 of the first rotary cavity 41 faces the rear opening 411 or when the tail end 416 faces the rear opening 411, the object to be plated 9 All are located on the first axis L1. When the head end 425 of the rotating module 424 of the second rotating cavity 42 faces the rear opening 421 or when the tail end 426 faces the rear opening 421 , the object to be plated 9 is located on the second axis L2.

該中繼腔43連接於該等側開口413,423間。於本實施例中,該中繼腔43用於容置及輸送該載具21及該待鍍物9。於其他實施態樣中,該中繼腔43也能是較短的長度而僅具輸送的功能。再於 其他實施態樣中,也能不設置該中繼腔43,不以此為限。 The relay cavity 43 is connected between the side openings 413 , 423 . In this embodiment, the relay cavity 43 is used for accommodating and transporting the carrier 21 and the object 9 to be plated. In other implementations, the relay chamber 43 can also be of relatively short length and only have the function of conveying. then In other implementation aspects, the relay cavity 43 can also be omitted, and it is not limited thereto.

於本實施例中,該第一旋轉腔41及該第二旋轉腔42的外部均設置有馬達(圖未示),內部均設置有減速齒輪組(圖未示),馬達與減速齒輪組之間藉由密封的傳動元件(圖未示)傳輸動力,藉此以驅動該旋轉模組414、424轉動,於其他實施態樣中,也可以選用其他可提供動力以轉動該載具21的等效組件,不以此為限。 In this embodiment, the first rotating chamber 41 and the second rotating chamber 42 are provided with a motor (not shown) on the outside, and a reduction gear set (not shown) inside, and the motor and the reduction gear set Transmission power is transmitted between them through sealed transmission elements (not shown in the figure), so as to drive the rotary modules 414, 424 to rotate. In other implementations, other devices that can provide power to rotate the carrier 21 can also be selected. Effective components, not limited to this.

較詳細地說,於本實施例中,是沿該第一軸線L1依序排列該裝載腔體31、該等除氣腔體32、該第一旋轉腔41及該清潔腔體33;沿該第二軸線L2反向依序排列該第一鍍膜腔體34、該第二旋轉腔42、該第二鍍膜腔體35、該緩衝腔體36及該卸載腔體37。該裝載腔體31與該卸載腔體37相鄰。 More specifically, in this embodiment, the loading chamber 31, the degassing chambers 32, the first rotating chamber 41 and the cleaning chamber 33 are arranged in sequence along the first axis L1; The second axis L2 reversely arranges the first coating chamber 34 , the second rotating chamber 42 , the second coating chamber 35 , the buffer chamber 36 and the unloading chamber 37 in sequence. The loading cavity 31 is adjacent to the unloading cavity 37 .

值得一提的是,於本實施例中,該第一軸線L1及該第二軸線L2上的該等真空製程腔3數量相同,於其他實施態樣中,也可依需求調整該第一軸線L1及該第二軸線L2上的真空製程腔數量,此時,該第一、第二旋轉腔41、42的配置如圖7所示。其中,該第一旋轉腔41的側開口413及該第二旋轉腔42的側開口423沿一第三軸線L3間隔設置,該第三軸線L3與該第一軸線L1及該第二軸線L2呈一夾角。 It is worth mentioning that, in this embodiment, the number of the vacuum process chambers 3 on the first axis L1 and the second axis L2 is the same, and in other implementations, the first axis can also be adjusted as required The number of vacuum process chambers on L1 and the second axis L2. At this time, the configuration of the first and second rotating chambers 41 and 42 is shown in FIG. 7 . Wherein, the side opening 413 of the first rotating cavity 41 and the side opening 423 of the second rotating cavity 42 are arranged at intervals along a third axis L3, and the third axis L3 is in the same shape as the first axis L1 and the second axis L2. an angle.

該回流裝置5跨設在該第一軸線L1及該第二軸線L2上,且與該旋轉裝置4位於該第一軸線L1及該第二軸線L2的兩相反側, 並銜接該卸載腔體37及該裝載腔體31,用於將該待鍍物9自該承載裝置2的載具21卸離,再將該載具21回流並裝載下一個新的待鍍物(圖未示)。較佳的,該回流裝置5能整合設備前段模組(Equipment Front End Module;EFEM),達到自動化入出料的目的。 The return device 5 straddles the first axis L1 and the second axis L2, and is located on opposite sides of the first axis L1 and the second axis L2 from the rotating device 4 , And connect the unloading cavity 37 and the loading cavity 31, for the object to be plated 9 is unloaded from the carrier 21 of the carrier device 2, and then the carrier 21 is reflowed and loaded with a new object to be plated (not shown). Preferably, the reflow device 5 can be integrated with an Equipment Front End Module (EFEM) to achieve the purpose of automatic feeding and discharging.

應說明的是,該等真空製程腔3能依據不同的製程需求而彈性配置為不同的功能腔體,例如依序連接該第一旋轉腔41的後開口411、該第一旋轉腔41的前開口412、該第二旋轉腔42的前開口422,及該第二旋轉腔42的後開口421的該等真空製程腔3分別為以下幾種腔體的配置方式: It should be noted that the vacuum process chambers 3 can be flexibly configured as different functional chambers according to different process requirements, for example, connecting the rear opening 411 of the first rotating chamber 41 and the front opening of the first rotating chamber 41 in sequence. The opening 412, the front opening 422 of the second rotating chamber 42, and the vacuum process chambers 3 of the rear opening 421 of the second rotating chamber 42 are arranged in the following chambers:

一、該除氣腔體32、該清潔腔體33、該第一鍍膜腔體34,及該第二鍍膜腔體35(同本實施例的配置)。 1. The degassing chamber 32 , the cleaning chamber 33 , the first coating chamber 34 , and the second coating chamber 35 (same configuration as in this embodiment).

二、該清潔腔體33、該清潔腔體33、該第一鍍膜腔體34,及該第二鍍膜腔體35。其目的在於可於不同的真空製程腔3內對於該待鍍物9的兩相反側進行清潔。 2. The cleaning cavity 33 , the cleaning cavity 33 , the first coating cavity 34 , and the second coating cavity 35 . The purpose is to clean the two opposite sides of the object to be plated 9 in different vacuum process chambers 3 .

三、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35,及該第二鍍膜腔體35。其目的在於藉由設置兩個第二鍍膜腔體35能增加鍍膜的膜厚。 3. The cleaning cavity 33 , the first coating cavity 34 , the second coating cavity 35 , and the second coating cavity 35 . The purpose is to increase the film thickness of the coating film by providing two second film coating chambers 35 .

四、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35,及該第一鍍膜腔體34。舉例來說,該第一鍍膜腔體34可以是鍍不鏽鋼(SUS),該第二鍍膜腔體35則可以是鍍銅(Cu),藉此 能達到SUS-Cu-SUS的鍍膜層,應用於例如EMI鍍膜。 4. The cleaning cavity 33 , the first coating cavity 34 , the second coating cavity 35 , and the first coating cavity 34 . For example, the first coating cavity 34 can be plated stainless steel (SUS), and the second coating cavity 35 can be copper (Cu), thereby The coating layer that can reach SUS-Cu-SUS is applied to, for example, EMI coating.

五、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35,及一第三鍍膜腔體(圖未示)。舉例來說,該第一鍍膜腔體34是鍍鈦(Ti)、該第二鍍膜腔體35是鍍鎳釩合金(NiV),及該第三鍍膜腔體是鍍金(Au)、銀(Ag),及銅(Cu)的其中之一,藉此能應用於晶背金屬化製程(Back Side Metal)或圖形化正面金屬製程(Front Side Metallization,FSM)。 5. The cleaning cavity 33, the first coating cavity 34, the second coating cavity 35, and a third coating cavity (not shown). For example, the first coating cavity 34 is titanium (Ti), the second coating cavity 35 is nickel vanadium alloy (NiV), and the third coating cavity is gold (Au), silver (Ag ), and one of copper (Cu), which can be applied to crystal back metallization (Back Side Metal) or patterned front side metallization (Front Side Metallization, FSM).

其變化態樣並不以上述的配置為限。例如,於其他實施態樣中,也能將該旋轉裝置4的中繼腔43置換成該第一鍍膜腔體34,該並用於鍍鈦,該第二鍍膜腔體35與該第二旋轉腔42的該前開口422相連接,且用於鍍鎳釩合金(NiV),該第三鍍膜腔體(圖未示)與該第二旋轉腔42的該後開口421相連接,且用於鍍金(Au)、銀(Ag),及銅(Cu)的其中之一。並不以此為限。 Its variation is not limited to the above-mentioned configurations. For example, in other embodiments, the relay chamber 43 of the rotating device 4 can also be replaced with the first coating chamber 34, which is also used for titanium plating, and the second coating chamber 35 is connected with the second rotating chamber. The front opening 422 of 42 is connected, and is used for nickel-vanadium alloy (NiV) plating, and the third coating chamber (not shown) is connected with the rear opening 421 of the second rotating chamber 42, and is used for gold plating One of (Au), silver (Ag), and copper (Cu). It is not limited to this.

若將該待鍍物9分為A面(圖未示)及B面(圖未示)兩個待加工區域,則該待鍍物9藉由本實施例將依序:一、裝設於該承載裝置的載具21內。二、進入該等除氣腔體32進行除氣。三、進入該清潔腔體33內並對A面進行清潔。四、進入該第一旋轉腔41內旋轉180°後,再使其回到該清潔腔體33內並對B面進行清潔。五、進入該第一旋轉腔41內,再使其進入該第二旋轉腔42內,接著進入該第一鍍膜腔體34內對A面進行鍍膜。六、進入該第二旋轉腔42內 旋轉180°,再使其回到該第一鍍膜腔體34內對B面進行鍍膜。七、進入該第二旋轉腔42內,接著再進入該第二鍍膜腔體35內對B面進行鍍膜。八、進入該第二旋轉腔42內旋轉180°,再使其回到該第二鍍膜腔體35內對A面進行鍍膜。九、進入該緩衝腔體36,接著移出該承載裝置的載具21。 If this object to be plated 9 is divided into two areas to be processed, the A side (not shown) and the B side (not shown in the figure), then the object to be plated 9 will be sequentially by this embodiment: one, installed in the Inside the carrier 21 of the carrying device. 2. Enter the degassing cavities 32 for degassing. 3. Enter the cleaning cavity 33 and clean the surface A. 4. After entering the first rotating cavity 41 and rotating 180°, it returns to the cleaning cavity 33 and cleans the surface B. 5. Enter the first rotating chamber 41 , then enter the second rotating chamber 42 , and then enter the first coating chamber 34 to coat the A surface. 6. Enter the second rotating cavity 42 Rotate 180°, and then make it return to the first coating chamber 34 to coat the B surface. Seventh, enter the second rotating chamber 42, and then enter the second coating chamber 35 to coat the surface B. Eighth, enter the second rotating chamber 42 and rotate 180°, and then make it return to the second coating chamber 35 to coat the A surface. 9. Enter the buffer cavity 36, and then move out the carrier 21 of the carrier device.

應說明的是,雖然藉由該第一旋轉腔41的旋轉模組414及該第二旋轉腔42的旋轉模組424能達到雙面鍍膜的功效。惟本實施例仍可單純用於單面鍍膜,此時該第一旋轉腔41的旋轉模組414及該第二旋轉腔42的旋轉模組424是用於將該載具21及該待鍍物9自第一軸線L1移動至該第二軸線L2,不以此為限。 It should be noted that although the effect of double-sided coating can be achieved by the rotating module 414 of the first rotating chamber 41 and the rotating module 424 of the second rotating chamber 42 . But this embodiment can still be used simply for single-sided coating. At this time, the rotary module 414 of the first rotary chamber 41 and the rotary module 424 of the second rotary chamber 42 are used for the carrier 21 and the substrate to be plated. The object 9 moves from the first axis L1 to the second axis L2, but not limited thereto.

參閱圖8,是本新型旋轉移載式立式鍍膜設備的一第一變化例,差異處在於:該第一旋轉腔41於該第一軸線L1上僅具有該後開口411(不具有該前開口412),該第二旋轉腔42於該第二軸線L2上僅具有該後開口421(不具有該前開口422),該等真空製程腔3的其中之二分別沿該第一、第二軸線L1、L2銜接在該第一、第二旋轉腔41、42的該後開口411、421。於本變化例中,該等真空製程腔3可以分別是該清潔腔體33及該第一鍍膜腔體34,也可以分別是該第一鍍膜腔體34及該第二鍍膜腔體35,不以此為限。 Referring to FIG. 8 , it is a first modification example of the new rotary transfer type vertical coating equipment. The difference lies in that: the first rotary chamber 41 only has the rear opening 411 (does not have the front opening 411 ) on the first axis L1. opening 412), the second rotary chamber 42 has only the rear opening 421 (without the front opening 422) on the second axis L2, two of the vacuum process chambers 3 are respectively along the first and second The axes L1 , L2 connect to the rear openings 411 , 421 of the first and second rotating chambers 41 , 42 . In this modification example, the vacuum process chambers 3 can be the cleaning chamber 33 and the first coating chamber 34 respectively, or the first coating chamber 34 and the second coating chamber 35 respectively. This is the limit.

參閱圖9,是本新型旋轉移載式立式鍍膜設備的一第二變化例,其類似於該第一變化例,差異處在於:該第一旋轉腔41及該 第二旋轉腔42間省略不設置該中繼腔43,而直接相連接。 Referring to Fig. 9, it is a second modification example of the new rotary transfer type vertical coating equipment, which is similar to the first variation example, the difference lies in: the first rotary chamber 41 and the The relay chamber 43 is omitted between the second rotating chambers 42 , but are directly connected.

參閱圖10,是本新型旋轉移載式立式鍍膜設備的一第三變化例,差異處在於:該第一旋轉腔41的前開口412不位於該第一軸線L1上,及該第二旋轉腔42的該前開口422不位於該第二軸線L2上。較佳的,該第一旋轉腔41的前開口412、該第一旋轉腔41的側開口413、該第二旋轉腔42的前開口422,及該第二旋轉腔42的側開口423是沿一第四軸線L4共線。藉此能達到彈性配置的優點。 Referring to FIG. 10 , it is a third modification example of the new rotary transfer type vertical coating equipment, the difference is that: the front opening 412 of the first rotary chamber 41 is not located on the first axis L1, and the second rotary The front opening 422 of the cavity 42 is not located on the second axis L2. Preferably, the front opening 412 of the first rotating chamber 41, the side opening 413 of the first rotating chamber 41, the front opening 422 of the second rotating chamber 42, and the side opening 423 of the second rotating chamber 42 are along the A fourth axis L4 is collinear. In this way, the advantage of flexible configuration can be achieved.

參閱圖11,是本新型旋轉移載式立式鍍膜設備的一第四變化例,其類似於該第三變化例,差異處在於:將兩個該第三變化例結合,並共用一個位於其中間的真空製程腔3。 Referring to Fig. 11, it is a fourth variation of the new rotary transfer type vertical coating equipment, which is similar to the third variation, the difference is that two of the third variations are combined, and one of them is shared Between the vacuum process chamber 3.

參閱圖12,是本新型旋轉移載式立式鍍膜設備的一第五變化例,其類似於該第三變化例,差異處在於:該第一旋轉腔41還具有一位於該第一軸線L1上的外開口417,該第二旋轉腔42還具有一位於該第二軸線L2上的外開口427。該第一旋轉腔41的旋轉模組414還能以該頭端415朝向該外開口417,及以該尾端416朝向該外開口417。該第二旋轉腔42的旋轉模組424還能以該頭端425朝向該外開口427,及以該尾端426朝向該外開口427。 Referring to FIG. 12 , it is a fifth modification example of the new rotary transfer type vertical coating equipment, which is similar to the third modification example, the difference is that the first rotary chamber 41 also has a The second rotating cavity 42 also has an outer opening 427 located on the second axis L2. The rotation module 414 of the first rotation cavity 41 can also have the head end 415 facing the outer opening 417 and the tail end 416 facing the outer opening 417 . The rotation module 424 of the second rotation cavity 42 can also have the head end 425 facing the outer opening 427 and the tail end 426 facing the outer opening 427 .

參閱圖13,是本新型旋轉移載式立式鍍膜設備的一第六變化例,差異處在於: Referring to Fig. 13, it is a sixth variation example of the new rotary transfer type vertical coating equipment, the difference lies in:

待鍍物9的數量至少為二,該承載裝置2包括至少二個直 立設置且適用以承載個別待鍍物9的載具21。 The quantity of objects to be plated 9 is at least two, and the carrying device 2 includes at least two straight The carrier 21 is vertically arranged and suitable for carrying individual objects 9 to be plated.

該第一旋轉腔41的旋轉模組414能同時容置及驅動該等載具21及該待鍍物9。該第一旋轉腔41的該後開口411及該前開口412分別連接二個真空製程腔3,每一真空製程腔3容置個別的載具21及待鍍物9。 The rotary module 414 of the first rotary chamber 41 can accommodate and drive the carriers 21 and the object to be plated 9 at the same time. The rear opening 411 and the front opening 412 of the first rotating chamber 41 are respectively connected to two vacuum process chambers 3 , and each vacuum process chamber 3 accommodates individual carriers 21 and objects to be plated 9 .

該第二旋轉腔42的旋轉模組424能同時容置及驅動該等載具21及該待鍍物9。該第二旋轉腔42的該後開口421及該前開口422分別連接二個真空製程腔3,每一真空製程腔3容置個別的載具21及待鍍物9。 The rotary module 424 of the second rotary chamber 42 can accommodate and drive the carriers 21 and the object to be plated 9 at the same time. The rear opening 421 and the front opening 422 of the second rotating chamber 42 are respectively connected to two vacuum process chambers 3 , and each vacuum process chamber 3 accommodates individual carriers 21 and objects to be plated 9 .

舉例說明:連接於該第一旋轉腔41的後開口411的二個真空製程腔3為除氣腔體32,連接於該前開口412的二個真空製程腔3為清潔腔體33。連接於該第二旋轉腔42的後開口421的二個真空製程腔3為第二鍍膜腔體35,連接於該前開口422的二個真空製程腔3為第一鍍膜腔體34,藉此能同時針對二個載具21及待鍍物9進行容置、輸送、除氣、清潔,及鍍膜加工,達到倍增產能的功效。惟配置方式不以此為限。 For example: the two vacuum processing chambers 3 connected to the rear opening 411 of the first rotating chamber 41 are degassing chambers 32 , and the two vacuum processing chambers 3 connected to the front opening 412 are cleaning chambers 33 . The two vacuum process chambers 3 connected to the rear opening 421 of the second rotating chamber 42 are the second coating chamber 35, and the two vacuum process chambers 3 connected to the front opening 422 are the first coating chamber 34, thereby It can accommodate, convey, degas, clean, and coat the two carriers 21 and the object to be plated 9 at the same time, thereby achieving the effect of doubling production capacity. However, the configuration method is not limited to this.

於本變化例的其他實施態樣中(圖未示),該第一旋轉腔41的該後開口411及該前開口412也能僅分別連接一個真空製程腔3,該第二旋轉腔42的該後開口421及該前開口422也能僅分別連接一個真空製程腔3,此時,每一真空製程腔3能同時容置二個載具21 及待鍍物9,不以此為限。 In other implementations of this variation (not shown in the figure), the rear opening 411 and the front opening 412 of the first rotating chamber 41 can also be connected to only one vacuum process chamber 3 respectively, and the second rotating chamber 42 The rear opening 421 and the front opening 422 can also be connected to only one vacuum process chamber 3 respectively, at this time, each vacuum process chamber 3 can accommodate two carriers 21 at the same time And the object to be plated 9 is not limited to this.

參閱圖4、圖14,及圖15,本新型用於雙面多層膜的鍍膜,流程包含下列步驟: Referring to Fig. 4, Fig. 14, and Fig. 15, the present invention is used for the coating of double-sided multilayer film, and the flow process includes the following steps:

步驟81:輸送該待鍍物至其中一該真空製程腔3,該其中一真空製程腔3連接該第一旋轉腔41。 Step 81 : Transport the object to be plated to one of the vacuum process chambers 3 , and the one of the vacuum process chambers 3 is connected to the first rotating chamber 41 .

步驟82:於該其中一真空製程腔3內對該待鍍物9的其中一面進行除氣、清潔及濺鍍鍍膜的其中一種加工。 Step 82: Perform one of degassing, cleaning and sputtering coating on one side of the object 9 in one of the vacuum process chambers 3 .

步驟83:將該待鍍物9輸送至該第一旋轉腔41,並旋轉180度後輸送回該其中一真空製程腔3。 Step 83 : transporting the object to be plated 9 to the first rotating chamber 41 , and transporting it back to one of the vacuum process chambers 3 after rotating 180 degrees.

步驟84:對該待鍍物9的其中另一面進行相同於步驟82的加工。 Step 84: Perform the same processing as step 82 on the other side of the object 9 to be plated.

步驟85:將該待鍍物9輸送至該第一旋轉腔41,且旋轉該待鍍物9後,將該待鍍物9自該側開口413移出該第一旋轉腔41。 Step 85 : Transport the object to be plated 9 to the first rotating chamber 41 , and after rotating the object to be plated 9 , move the object to be plated 9 out of the first rotating chamber 41 through the side opening 413 .

步驟91:將該待鍍物9自該第二旋轉腔42的側開口423輸送進入該第二旋轉腔42。 Step 91 : Transport the object to be plated 9 into the second rotating chamber 42 from the side opening 423 of the second rotating chamber 42 .

步驟92:該第二旋轉腔42旋轉該待鍍物9,並使其自該後開口421輸送至該其中另一真空製程腔3,並於該其中另一真空製程腔3內對該待鍍物9的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工。 Step 92: The second rotating chamber 42 rotates the object to be plated 9, and transports it from the rear opening 421 to the other vacuum process chamber 3, and the object to be plated is placed in the other vacuum process chamber 3 One of the surfaces of the object 9 is subjected to one of the processes of degassing, cleaning and sputter coating.

步驟93:將該待鍍物9自該其中另一真空製程腔3輸送至 該第二旋轉腔42,並於該第二旋轉腔42將該待鍍物9旋轉180度後,將該待鍍物9自該第二旋轉腔42輸送回該其中另一真空製程腔3。 Step 93: transporting the object to be plated 9 from the other vacuum process chamber 3 to The second rotating chamber 42 transports the object to be plated 9 from the second rotating chamber 42 back to the other vacuum process chamber 3 after the second rotating chamber 42 rotates the object to be plated 9 by 180 degrees.

步驟94:於該其中一真空製程腔3內對該待鍍物9的其中另一面進行相同於步驟92的加工。 Step 94 : Perform the same processing as step 92 on the other side of the object to be plated 9 in one of the vacuum process chambers 3 .

步驟95(步驟86):將該待鍍物9移入又另一真空製程腔3。 Step 95 (Step 86 ): Move the object 9 to be plated into yet another vacuum process chamber 3 .

其中,步驟95(步驟86)對於步驟81至步驟85而言,該又另一真空製程腔3可以是該清潔腔體33、該第一鍍膜腔體34、該第二旋轉腔42、該第二鍍膜腔體35、該緩衝腔體36,及該卸載腔體37的其中之一;對於步驟91至步驟94而言,該又另一真空製程腔3可以是該第一鍍膜腔體34、該第二鍍膜腔體35、該緩衝腔體36,及該卸載腔體37的其中之一,但不以此為限。 Wherein, step 95 (step 86) is for step 81 to step 85, the yet another vacuum process chamber 3 may be the cleaning chamber 33, the first coating chamber 34, the second rotating chamber 42, the second One of the two coating chambers 35, the buffer chamber 36, and the unloading chamber 37; for steps 91 to 94, this yet another vacuum process chamber 3 can be the first coating chamber 34, One of the second coating cavity 35 , the buffer cavity 36 , and the unloading cavity 37 , but not limited thereto.

經由以上的說明,可將前述實施例的優點歸納如下: Through the above description, the advantages of the aforementioned embodiments can be summarized as follows:

一、本新型藉由設置該旋轉裝置4,使得該清潔腔體33能對該待鍍物9的相反兩面進行清潔,及該第一鍍膜腔體34及該第二鍍膜腔體35能對該待鍍物9的相反兩面進行鍍膜,可以減少真空製程腔3的數量,而由於真空製程腔3須消耗大量的能源來維持真空度,藉由減少真空製程腔3的數量能同時降低能源消耗,而達到節能減碳及降低營運成本的功效。此外,相較於習知鍍膜設備必須倍數設置真空鍍膜腔以達到雙面鍍膜的目的,一旦僅需單面鍍膜時, 另一側(無須被鍍膜的一側)的真空鍍膜腔將無效用。而當本實施例適用於單面鍍膜時,將不會產生無效的第一鍍膜腔體34或第二鍍膜腔體35,達到提高生產靈活性的優點。 One, this novel by setting this rotating device 4, makes this cleaning chamber 33 can clean the opposite two sides of this to-be-plated object 9, and this first coating chamber 34 and this second coating chamber 35 can be to the Coating films on the opposite sides of the object to be plated 9 can reduce the number of vacuum process chambers 3, and since the vacuum process chamber 3 must consume a large amount of energy to maintain the vacuum degree, by reducing the number of vacuum process chambers 3, energy consumption can be reduced at the same time, To achieve the effect of energy saving, carbon reduction and operation cost reduction. In addition, compared with the conventional coating equipment, multiple vacuum coating chambers must be set up to achieve the purpose of double-sided coating. Once only one-sided coating is required, The vacuum coating chamber on the other side (the side not to be coated) will be useless. However, when this embodiment is applicable to single-sided coating, there will be no useless first coating cavity 34 or second coating cavity 35 , so as to achieve the advantage of improving production flexibility.

二、該旋轉裝置4連接的該等真空製程腔3皆可共用該第一旋轉腔41及該第二旋轉腔42,故可減少設置真空腔的數量,進一步減少佔地面積,藉此能提高無塵室的使用坪效。 Two, the vacuum process chambers 3 connected to the rotating device 4 can share the first rotating chamber 41 and the second rotating chamber 42, so the number of vacuum chambers can be reduced, and the floor space can be further reduced, thereby improving The use of clean rooms is effective.

三、藉由沿該第一軸線L1及該第二軸線L2排列的該真空製程腔3、該旋轉裝置4,及該回流裝置5,可避免設備在該第一軸線L1及該第二軸線L2的延伸方向上的長度過長,達到更易於彈性裝設的優點。 3. With the vacuum process chamber 3, the rotating device 4, and the reflow device 5 arranged along the first axis L1 and the second axis L2, it is possible to prevent the equipment from moving between the first axis L1 and the second axis L2. The length in the extending direction is too long to achieve the advantage of being easier to install elastically.

四、藉由該承載裝置2的載具21的移動路徑在一水平面上,使得設備的高度得以下降,避免設備受到廠房高度限制,及避免因設備高度較高而導致維護困難,達到易於設置及維修保養的功效。 4. The moving path of the carrier 21 of the carrying device 2 is on a horizontal plane, so that the height of the equipment can be lowered, avoiding the equipment being limited by the height of the factory building, and avoiding maintenance difficulties caused by the high equipment height, so as to achieve easy installation and The effect of maintenance.

五、藉由該裝載腔體31及該卸載腔體37相鄰,使得該承載裝置2回流的路程縮短,除了能減少本新型於實際運轉時所需的承載裝置2的載具21的數量,減少設備的建置成本之外,也能減少因回流而產生的能源消耗,及零配件因耗損或保養而產生的維護成本。此外,回流路程縮短也能有效避免承載裝置2的載具21因長時間暴露在大氣環境下而吸附過多的水分子,藉此降低除氣所需的時 間及能源消耗,達到節能減碳的優點。 5. Due to the adjacent loading cavity 31 and the unloading cavity 37, the return path of the carrying device 2 is shortened. In addition to reducing the number of carriers 21 of the carrying device 2 required for the actual operation of the present invention, In addition to reducing the construction cost of the equipment, it can also reduce the energy consumption caused by backflow, and the maintenance cost caused by the loss or maintenance of spare parts. In addition, the shortened return path can also effectively prevent the carrier 21 of the carrying device 2 from absorbing too much water molecules due to long-term exposure to the atmospheric environment, thereby reducing the time required for degassing. Time and energy consumption, to achieve the advantages of energy saving and carbon reduction.

綜上所述,本新型旋轉移載式立式鍍膜設備確實能達成本新型之目的。 To sum up, the new rotary transfer type vertical coating equipment can indeed achieve the purpose of the new model.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。 But the above-mentioned ones are only embodiments of the present invention, and should not limit the scope of implementation of the present invention with this. All simple equivalent changes and modifications made according to the patent scope of the present application and the content of the patent specification are still within the scope of the present invention. Within the scope covered by this patent.

2:承載裝置 2: Carrying device

21:載具 21: Vehicle

3:真空製程腔 3: Vacuum process chamber

31:裝載腔體 31: Loading cavity

32:除氣腔體 32: Degassing cavity

33:清潔腔體 33: Clean the chamber

34:第一鍍膜腔體 34: The first coating cavity

35:第二鍍膜腔體 35: Second coating cavity

36:緩衝腔體 36: Buffer cavity

37:卸載腔體 37: Unloading cavity

4:旋轉裝置 4: Rotating device

41:第一旋轉腔 41: The first rotating cavity

411:後開口 411: rear opening

412:前開口 412: front opening

413:側開口 413: side opening

414:旋轉模組 414: Rotation module

415:頭端 415: head end

416:尾端 416: end

42:第二旋轉腔 42: the second rotating cavity

421:後開口 421: rear opening

422:前開口 422: front opening

423:側開口 423: side opening

424:旋轉模組 424: Rotation module

425:頭端 425: head end

426:尾端 426: end

43:中繼腔 43: relay cavity

5:回流裝置 5: Backflow device

9:待鍍物 9: Items to be plated

L1:第一軸線 L1: first axis

L2:第二軸線 L2: second axis

Claims (16)

一種旋轉移載式立式鍍膜設備,適用於一直立設置的待鍍物,定義一第一軸線及一第二軸線,該旋轉移載式立式鍍膜設備包含: 複數真空製程腔,分別設置於該第一軸線及該第二軸線上,且能容置及沿該第一軸線及該第二軸線輸送該待鍍物;及 一旋轉裝置,包括: 一第一旋轉腔,設置於該第一軸線上,並具有一位於該第一軸線且連接其中一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間的側開口,及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組,該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口,及以該頭端及該尾端的其中之一朝向該側開口,該待鍍物能自該旋轉模組的頭端或尾端移入及移出,及 一第二旋轉腔,設置於該第二軸線上,並具有一位於該第二軸線且連接其中另一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間且對應該第一旋轉腔的側開口,及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組,該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口,及以該頭端及該尾端的其中之一朝向該側開口,該待鍍物能自該旋轉模組的頭端或尾端移入及移出。 A rotary transfer type vertical coating equipment is suitable for a vertically arranged object to be plated, defining a first axis and a second axis. The rotary transfer type vertical coating equipment includes: A plurality of vacuum process chambers are respectively arranged on the first axis and the second axis, and are capable of accommodating and transporting the object to be plated along the first axis and the second axis; and A rotating device, comprising: A first rotating chamber is arranged on the first axis, and has a rear opening located on the first axis and connected to one of the vacuum process chambers, a side opening located between the first axis and the second axis, and a rotary module capable of accommodating and driving the object to be plated to rotate and having a head end and a tail end, the rotation module can turn the head end toward the rear opening and the tail end toward the rear opening, and One of the head end and the tail end is open towards the side, and the object to be plated can be moved in and out from the head end or the tail end of the rotary module, and A second rotating chamber is arranged on the second axis, and has a rear opening located on the second axis and connected to another vacuum process chamber, and a rear opening located between the first axis and the second axis and corresponding to the The side opening of the first rotating cavity, and a rotating module that can accommodate and drive the object to be plated to rotate and has a head end and a tail end, and the rotation module can use the head end toward the rear opening, and use the tail end The end faces the rear opening, and one of the head end and the tail end faces the side opening, and the object to be plated can move in and out from the head end or the tail end of the rotary module. 如請求項1所述的旋轉移載式立式鍍膜設備,其中,該第一旋轉腔還具有一前開口,該等真空製程腔的其中之二分別連接於該第一旋轉腔的該前開口及該後開口,該旋轉模組還能以該頭端朝向該前開口,及以該尾端朝向該前開口。The rotary transfer type vertical coating equipment as claimed in claim 1, wherein the first rotary chamber also has a front opening, and two of the vacuum process chambers are respectively connected to the front opening of the first rotary chamber And the rear opening, the head end of the rotary module can also face the front opening, and the tail end can face the front opening. 如請求項2所述的旋轉移載式立式鍍膜設備,其中,該第一軸線與該第二軸線平行,該第一旋轉腔的該前開口及該後開口皆位於該第一軸線上,且相反設置於該旋轉模組的兩相反側。The rotary transfer type vertical coating equipment as claimed in claim 2, wherein the first axis is parallel to the second axis, and the front opening and the rear opening of the first rotary chamber are located on the first axis, And oppositely arranged on two opposite sides of the rotary module. 如請求項1、請求項2或請求項3所述的旋轉移載式立式鍍膜設備,其中,連接該第一旋轉腔的其中一真空製程腔用於清潔。The rotary transfer type vertical coating equipment according to claim 1, claim 2 or claim 3, wherein one of the vacuum process chambers connected to the first rotary chamber is used for cleaning. 如請求項2或請求項3所述的旋轉移載式立式鍍膜設備,其中,連接該第一旋轉腔的其中二真空製程腔分別用於除氣及清潔。The rotary transfer type vertical coating equipment according to claim 2 or claim 3, wherein the two vacuum process chambers connected to the first rotary chamber are used for degassing and cleaning respectively. 如請求項1所述的旋轉移載式立式鍍膜設備,其中,該第二旋轉腔還具有一前開口,該等真空製程腔的其中之二分別連接於該第二旋轉腔的該前開口及該後開口,該旋轉模組還能以該頭端朝向該前開口,及以該尾端朝向該前開口。The rotary transfer type vertical coating equipment as claimed in claim 1, wherein the second rotary chamber also has a front opening, and two of the vacuum process chambers are respectively connected to the front opening of the second rotary chamber And the rear opening, the head end of the rotary module can also face the front opening, and the tail end can face the front opening. 如請求項6所述的旋轉移載式立式鍍膜設備,其中,該第一軸線與該第二軸線平行,該第二旋轉腔的該前開口及該後開口皆位於該第二軸線上,且相反設置於該旋轉模組的兩相反側。The rotary transfer type vertical coating equipment as claimed in claim 6, wherein the first axis is parallel to the second axis, and the front opening and the rear opening of the second rotary chamber are located on the second axis, And oppositely arranged on two opposite sides of the rotary module. 如請求項1、請求項6或請求項7所述的旋轉移載式立式鍍膜設備,其中,連接該第二旋轉腔的其中一真空製程腔用於鍍膜。The rotary transfer type vertical film coating equipment as claimed in claim 1, claim 6 or claim 7, wherein one of the vacuum process chambers connected to the second rotary chamber is used for film coating. 如請求項6或請求項7所述的旋轉移載式立式鍍膜設備,其中,連接該第二旋轉腔的其中二真空製程腔分別用於鍍鈦及鍍銅。The rotary transfer type vertical film coating equipment as claimed in claim 6 or claim 7, wherein the two vacuum process chambers connected to the second rotary chamber are respectively used for titanium plating and copper plating. 如請求項1所述的旋轉移載式立式鍍膜設備,其中,該第一旋轉腔還具有一前開口及一外開口,該等真空製程腔的其中三者分別連接於該第一旋轉腔的該前開口、該後開口及該外開口,該旋轉模組還能以該頭端朝向該前開口、以該尾端朝向該前開口、以該頭端朝向該外開口,及以該尾端朝向該外開口。The rotary transfer type vertical coating equipment according to claim 1, wherein the first rotary chamber also has a front opening and an outer opening, and three of the vacuum process chambers are respectively connected to the first rotary chamber The front opening, the rear opening and the outer opening, the rotary module can also use the head end towards the front opening, the tail end towards the front opening, the head end towards the outer opening, and the tail end end towards the outer opening. 如請求項1所述的旋轉移載式立式鍍膜設備,其中,該第二旋轉腔還具有一前開口及一外開口,該等真空製程腔的其中三者分別連接於該第二旋轉腔的該前開口、該後開口及該外開口,該旋轉模組還能以該頭端朝向該前開口、以該尾端朝向該前開口、以該頭端朝向該外開口,及以該尾端朝向該外開口。The rotary transfer type vertical coating equipment as described in claim 1, wherein the second rotary chamber also has a front opening and an outer opening, and three of the vacuum process chambers are respectively connected to the second rotary chamber The front opening, the rear opening and the outer opening, the rotary module can also use the head end towards the front opening, the tail end towards the front opening, the head end towards the outer opening, and the tail end end towards the outer opening. 如請求項1所述的旋轉移載式立式鍍膜設備,該旋轉裝置還包括一位於該第一旋轉腔及該第二旋轉腔之間的中繼腔,該中繼腔連通於該第一旋轉腔的側開口及該第二旋轉腔的側開口。According to the rotary transfer type vertical coating equipment described in claim 1, the rotating device further includes a relay chamber located between the first rotating chamber and the second rotating chamber, and the relay chamber communicates with the first rotating chamber. The side opening of the rotating chamber and the side opening of the second rotating chamber. 如請求項1所述的旋轉移載式立式鍍膜設備,其中,當該第二旋轉腔的旋轉模組的該頭端朝向該後開口或當該尾端朝向該後開口時,該待鍍物皆位於該第二軸線上。The rotary transfer type vertical coating equipment according to claim 1, wherein when the head end of the rotary module of the second rotary chamber faces the rear opening or when the tail end faces the rear opening, the to-be-coated Everything lies on this second axis. 如請求項1所述的旋轉移載式立式鍍膜設備,適用於二直立設置的待鍍物,其中,該旋轉裝置的該第二旋轉腔能同時容置該等待鍍物。The rotary transfer type vertical coating equipment as described in claim 1 is suitable for two vertically arranged objects to be plated, wherein the second rotating chamber of the rotating device can accommodate the objects to be plated at the same time. 如請求項14所述的旋轉移載式立式鍍膜設備,其中,該等真空製程腔的其中之二連接於該第二旋轉腔的後開口,每一真空製程腔容置個別的待鍍物。Rotary transfer type vertical coating equipment as described in claim 14, wherein two of the vacuum process chambers are connected to the rear opening of the second rotary chamber, and each vacuum process chamber accommodates individual objects to be plated . 如請求項1所述的旋轉移載式立式鍍膜設備,還包含一回流裝置,該回流裝置跨設在該第一軸線及該第二軸線上,且與該旋轉裝置位於該第一軸線及該第二軸線的兩相反側。The rotary transfer type vertical coating equipment as described in claim 1, further comprising a backflow device, the backflow device straddles the first axis and the second axis, and is located between the first axis and the second axis with the rotation device opposite sides of the second axis.
TW111209804U 2022-09-08 2022-09-08 Rotary transfer type vertical coating equipment TWM636483U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI843196B (en) * 2022-09-08 2024-05-21 凌嘉科技股份有限公司 Rotary transfer vertical coating equipment and double-sided multi-layer coating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI843196B (en) * 2022-09-08 2024-05-21 凌嘉科技股份有限公司 Rotary transfer vertical coating equipment and double-sided multi-layer coating method

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