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TWM636093U - Rework apparatus - Google Patents

Rework apparatus Download PDF

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Publication number
TWM636093U
TWM636093U TW111209432U TW111209432U TWM636093U TW M636093 U TWM636093 U TW M636093U TW 111209432 U TW111209432 U TW 111209432U TW 111209432 U TW111209432 U TW 111209432U TW M636093 U TWM636093 U TW M636093U
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Taiwan
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film
bottom wall
base
repaired
pinhole
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TW111209432U
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Chinese (zh)
Inventor
盧彥豪
賴美臣
陳俊瑋
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梭特科技股份有限公司
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Priority to TW111209432U priority Critical patent/TWM636093U/en
Priority to CN202222674034.1U priority patent/CN218388138U/en
Publication of TWM636093U publication Critical patent/TWM636093U/en

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  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

一種返修裝置,適用於設置在用以承載一待修物件的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面設有黏膠層,以移除該待修物件上的不良晶粒或錫球,或是重置晶粒於該待修物件,該返修裝置包含用以將該薄膜固定並能呈微繃緊狀態的一固持模組,及可真空吸附該薄膜且具有一針體以頂推該薄膜的一頂推模組。返修裝置可應用於移除晶粒、錫球以及補晶的工序,不僅具有多樣用途,且能因應晶粒及錫球尺寸調整頂推模組的針體尺寸,而能小範圍移除單一晶粒或錫球,不會影響附近不需移除的晶粒及錫球,同時返修裝置本身也不會被汙染。A repairing device, which is suitable for being installed above a workbench for carrying an object to be repaired and for installing a ductile film, and a surface of the film is provided with an adhesive layer to remove the object on the object to be repaired Bad crystal grains or solder balls, or reset crystal grains on the object to be repaired, the rework device includes a holding module for fixing the film and can be in a slightly tensioned state, and can vacuum absorb the film and has A needle is used to push a pushing module for pushing the film. The rework device can be applied to the process of removing dies, solder balls, and refilling dies. It not only has multiple uses, but also can adjust the needle size of the push module according to the size of dies and solder balls, and can remove a single die in a small area. No chips or solder balls will affect nearby chips and solder balls that do not need to be removed, and the rework device itself will not be polluted.

Description

返修裝置Rework device

本新型是有關於一種返修裝置,特別是指一種用於修補電路板的返修裝置。The present invention relates to a rework device, in particular to a rework device for repairing circuit boards.

一般焊接多個LED晶粒的電路板,若是其中幾個晶粒為不良品,需要將不良品的晶粒及焊接晶粒的錫球移除後,再重新焊接替補的晶粒,藉此避免整個電路板報廢,以降低損失。Generally, if a circuit board with multiple LED chips is soldered, if some of the chips are defective, it is necessary to remove the defective chips and the solder balls of the soldered chips, and then re-solder the replacement chips to avoid The entire circuit board is scrapped to reduce losses.

目前移除電路板上晶粒及錫球的方式,大多是利用吸嘴吸除。但是,此移除方式,不僅容易造成吸嘴汙染,而需要常更換吸嘴,且移除的範圍受限於吸嘴的大小。由於晶粒尺寸越來越小,而吸嘴尺寸較大無法與單一晶粒的尺寸配合,容易一併吸取在不良晶粒附近的良好晶粒。At present, most of the ways to remove the die and solder balls on the circuit board are to use suction nozzles to remove them. However, this removal method not only easily causes contamination of the suction nozzle, but also requires frequent replacement of the suction nozzle, and the removal range is limited by the size of the suction nozzle. Since the grain size is getting smaller and smaller, and the size of the suction nozzle is larger and cannot match the size of a single grain, it is easy to pick up good grains near the bad grains.

因此,本新型之一目的,即在提供一種可以解決前述問題的返修裝置。Therefore, one purpose of the present invention is to provide a rework device that can solve the aforementioned problems.

於是,本新型返修裝置在一些實施態樣中,適用於設置在用以承載一待修物件的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面設有黏膠層,以移除該待修物件上的不良晶粒或錫球,或是重置晶粒於該待修物件,該返修裝置包含:一固持模組及一頂推模組。該固持模組包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態。該頂推模組設置在該固持模組上方,並包括一基座及一頂針機構。該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜。該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以頂推該薄膜。Therefore, in some embodiments, the new rework device is suitable for being installed above a workbench for carrying an object to be repaired and for installing a ductile film, and a surface of the film is provided with an adhesive layer. To remove bad chips or solder balls on the object to be repaired, or to reset chips on the object to be repaired, the rework device includes: a holding module and a pushing module. The holding module includes a bearing frame and a pressing frame to fix the film and be in a slightly tensioned state. The pushing module is arranged above the holding module, and includes a base and an ejector mechanism. The base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and a plurality of air holes distributed around the pinhole, the gas channel communicates with the air holes and is connected to a gas pump The device is used to vacuum absorb the film on the bottom wall. The thimble mechanism is arranged on the base along the up-down direction and is partly located in the gas passage, and has a needle body, which can be operated to pass through the pinhole and pass through the bottom wall to push the film.

在一些實施態樣中,該基座具有一座體、連接該座體且具有該底壁的一帽蓋、設於該座體與該帽蓋之間的一第一密封環,及設於該座體與該頂針機構之間的一第二密封環,該第一密封環與該第二密封環用以阻斷該氣體通道與外界環境連通。In some embodiments, the base has a base, a cap connected to the base and having the bottom wall, a first sealing ring disposed between the base and the cap, and a first sealing ring disposed between the base and the cap. A second sealing ring between the base body and the thimble mechanism, the first sealing ring and the second sealing ring are used to block the gas channel from communicating with the external environment.

在一些實施態樣中,該承載框供該薄膜藉由該黏膠層黏附固定且使該黏膠層朝下,該加壓框具有水平設置的一環板部及自該環板部內緣垂直延伸的一環推部,該環板部靠抵於該承載框並使該薄膜夾置於該環板部與該承載框之間,且該環推部往下頂推該薄膜以將該薄膜撐張。In some embodiments, the supporting frame is used for the film to be adhered and fixed by the adhesive layer and the adhesive layer faces downward, and the pressure frame has a horizontally arranged ring plate portion and vertically extends from the inner edge of the ring plate portion. a ring pushing part, the ring plate part leans against the carrying frame and sandwiches the film between the ring plate part and the carrying frame, and the ring pushing part pushes down the film to stretch the film .

在一些實施態樣中,該承載框及該加壓框為內外相配合的子母環。In some implementation aspects, the bearing frame and the pressurizing frame are sub-mother rings matched inside and outside.

本新型返修裝置在一些實施態樣中,適用於設置在用以承載一待修電路板的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面設有黏膠層,以移除該待修電路板上的不良晶粒或錫球,該返修裝置包含:一固持模組及一頂推模組。該固持模組包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態。該頂推模組設置在該固持模組上方,並包括一基座及一頂針機構。該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜。該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以於對應待移除的晶粒或錫球的位置頂推該薄膜,使該薄膜黏附待移除的晶粒或錫球。In some embodiments, the new rework device is suitable for being installed above a workbench for carrying a circuit board to be repaired and for installing a ductile film, and a surface of the film is provided with an adhesive layer, so as to To remove bad grains or solder balls on the circuit board to be repaired, the rework device includes: a holding module and a pushing module. The holding module includes a bearing frame and a pressing frame to fix the film and be in a slightly tensioned state. The pushing module is arranged above the holding module, and includes a base and an ejector mechanism. The base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and a plurality of air holes distributed around the pinhole, the gas channel communicates with the air holes and is connected to a gas pump The device is used to vacuum absorb the film on the bottom wall. The thimble mechanism is arranged on the base along the up and down direction and is partly located in the gas channel, and has a needle body, which can be operated to pass through the pinhole to pass through the bottom wall to correspond to the crystal grain or tin to be removed. The position of the ball pushes against the film, causing the film to adhere to the die or solder ball to be removed.

本新型返修裝置在一些實施態樣中,適用於設置在用以承載一待修電路板的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面黏附多個用於替補的晶粒,該待修電路板設有待補晶的錫球,該返修裝置包含:一固持模組及一頂推模組。該固持模組包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態。該頂推模組設置在該固持模組上方,並包括一基座及一頂針機構。該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜。該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以於對應待替補的晶粒的位置頂推該薄膜,使該待替補的晶粒轉移至待補晶的錫球上。In some embodiments, the new rework device is suitable for being installed above a workbench for carrying a circuit board to be repaired and for installing a ductile film, and a surface of the film is adhered to a plurality of replacement parts. Die, the circuit board to be repaired is provided with solder balls to be repaired, and the rework device includes: a holding module and a pushing module. The holding module includes a bearing frame and a pressing frame to fix the film and be in a slightly tensioned state. The pushing module is arranged above the holding module, and includes a base and an ejector mechanism. The base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and a plurality of air holes distributed around the pinhole, the gas channel communicates with the air holes and is connected to a gas pump The device is used to vacuum absorb the film on the bottom wall. The thimble mechanism is arranged on the base along the up-down direction and partly located in the gas channel, and has a needle body, which can be operated to pass through the bottom wall through the pinhole to push against the position corresponding to the crystal grain to be replaced. Pushing the film, so that the crystal grain to be replaced is transferred to the solder ball to be replaced.

本新型具有以下功效:本新型返修裝置可應用於移除晶粒、錫球以及補晶的工序,不僅具有多樣用途,且能因應晶粒及錫球尺寸調整頂推模組的針體尺寸,而能小範圍移除單一晶粒或錫球,不會影響附近不需移除的晶粒及錫球,同時返修裝置本身也不會被汙染。This new model has the following effects: This new rework device can be applied to the process of removing dies, solder balls, and repairing dies. It not only has multiple uses, but also can adjust the needle body size of the push module according to the size of dies and solder balls. It can remove a single die or solder ball in a small area without affecting nearby die and solder balls that do not need to be removed, and the rework device itself will not be polluted.

參閱圖1與圖9,本新型返修裝置100之一實施例,適用於設置在用以承載一待修物件A的工作台(未圖示)上方並供安裝一具有延展性的薄膜B,以移除該待修物件A上的不良晶粒A1或錫球A2,或是重置晶粒於該待修物件A。例如,該待修物件A是一待修電路板A’,如圖1所示,所安裝的薄膜B用以移除該待修電路板A’上的不良晶粒A1或錫球A2,如圖9所示,所安裝的薄膜B’的一表面黏附多個用於替補的晶粒B1,該待修電路板A’設有待補晶的錫球A2以供設置替補的晶粒B1。Referring to Fig. 1 and Fig. 9, one embodiment of the novel rework device 100 is suitable for being arranged above a workbench (not shown) for carrying an object A to be repaired and for installing a stretchable film B to Remove the defective die A1 or solder ball A2 on the object A to be repaired, or replace the die on the object A to be repaired. For example, the object A to be repaired is a circuit board to be repaired A', as shown in FIG. As shown in FIG. 9 , a plurality of substituting dies B1 are adhered to one surface of the installed film B′, and the circuit board A′ to be repaired is provided with solder balls A2 for substituting the substituting dies B1.

參閱圖1至圖3,該返修裝置100包含一固持模組1及一頂推模組2。該固持模組1包括一承載框11及一加壓框12,以將該薄膜B固定並能呈微繃緊狀態。在本實施例中,該薄膜B的一表面設有黏膠層B2,該承載框11為晶圓框架(wafer frame),供該薄膜B藉由該黏膠層B2黏附固定且使該黏膠層B2朝下。該加壓框12為擴張環,具有水平設置的一環板部121及自該環板部121內緣垂直延伸的一環推部122。該承載框11與該加壓框12設於一夾持機構13,該夾持機構13包括一基板131、一遮蓋132,及分別設於該遮蓋132相對兩側的一對夾指133,該基板131與該對夾指133由多個連接組件134連接且可相對開合。該加壓框12的環板部121固定於該基板131,該承載框11可分離地由該對夾指133固持。欲安裝該承載框11時,需將該夾持機構13打開,使該基板131與該對夾指133分開,待置入該承載框11後,再將該夾持機構13關閉,使該基板131與該對夾指133靠合,如圖3的剖視示意圖所示,此時該加壓框12的環板部121靠抵於該承載框11並使該薄膜B夾置於該環板部121與該承載框11之間,且該環推部122往下頂推該薄膜B以將該薄膜B撐張,而使該薄膜B呈微繃緊狀態。在變化的實施例,該承載框11及該加壓框12也可以採用現有的內外相配合的子母環(未圖示),同樣能使薄膜呈微繃緊狀態。Referring to FIGS. 1 to 3 , the rework device 100 includes a holding module 1 and a pushing module 2 . The holding module 1 includes a supporting frame 11 and a pressing frame 12 for fixing the film B in a slightly tensioned state. In this embodiment, an adhesive layer B2 is provided on one surface of the film B, and the carrier frame 11 is a wafer frame for the film B to be adhered and fixed by the adhesive layer B2 and the adhesive Layer B2 faces down. The pressurizing frame 12 is an expansion ring, and has a ring plate portion 121 disposed horizontally and a ring pushing portion 122 vertically extending from the inner edge of the ring plate portion 121 . The supporting frame 11 and the pressurizing frame 12 are arranged in a clamping mechanism 13, and the clamping mechanism 13 includes a base plate 131, a cover 132, and a pair of clamping fingers 133 respectively arranged on opposite sides of the cover 132. The substrate 131 and the pair of fingers 133 are connected by a plurality of connection components 134 and can be opened and closed relative to each other. The ring plate portion 121 of the pressure frame 12 is fixed on the base plate 131 , and the bearing frame 11 is detachably held by the pair of clamping fingers 133 . When the carrier frame 11 is to be installed, the clamping mechanism 13 needs to be opened to separate the substrate 131 from the pair of fingers 133, and after the carrier frame 11 is placed, the clamping mechanism 13 is closed to make the substrate 131 abuts against the pair of clamping fingers 133, as shown in the schematic cross-sectional view of FIG. Between the part 121 and the supporting frame 11, and the ring pushing part 122 pushes down the film B to stretch the film B, so that the film B is in a slightly taut state. In a variant embodiment, the supporting frame 11 and the pressurizing frame 12 can also adopt the existing internal and external matching rings (not shown), which can also make the film in a slightly tensioned state.

參閱圖1、圖4至圖6,該頂推模組2設置在該固持模組1上方,並包括一基座21及一頂針機構22。在本實施例中,該基座21界定一氣體通道211並具有一座體212、連接該座體212的一帽蓋213、設於該座體212與該帽蓋213之間的一第一密封環214,及設於該座體212與該頂針機構22之間的一第二密封環215。該第一密封環214與該第二密封環215用以阻斷該氣體通道211與外界環境連通。該帽蓋213具有面向該薄膜B的一底壁213a。該底壁213a具有一針孔213b及多個分布於該針孔213b周圍的氣孔213c,該氣體通道211與該等氣孔213c相連通。在該座體212設有連通該氣體通道211的一氣壓接頭216以連接一抽氣裝置(未圖示),藉以對該氣體通道211抽氣,用以於該底壁213a真空吸附該薄膜B。該頂針機構22沿上下方向設於該基座21且部分位於該氣體通道211內並具有一針座221及一針體222,該針體222可受操作通過該針孔213b穿出該底壁213a以頂推該薄膜B。Referring to FIG. 1 , FIG. 4 to FIG. 6 , the pushing module 2 is arranged above the holding module 1 and includes a base 21 and an ejector mechanism 22 . In this embodiment, the base 21 defines a gas passage 211 and has a base 212, a cap 213 connected to the base 212, and a first seal between the base 212 and the cap 213. The ring 214, and a second sealing ring 215 disposed between the seat body 212 and the ejector mechanism 22. The first sealing ring 214 and the second sealing ring 215 are used to block the communication between the gas channel 211 and the external environment. The cap 213 has a bottom wall 213a facing the film B. As shown in FIG. The bottom wall 213a has a pinhole 213b and a plurality of air holes 213c distributed around the pinhole 213b, and the gas channel 211 communicates with the air holes 213c. A pneumatic connector 216 connected to the gas passage 211 is provided on the base 212 to connect to a suction device (not shown), so as to pump air to the gas passage 211 and vacuum absorb the film B on the bottom wall 213a. . The thimble mechanism 22 is arranged on the base 21 along the up-down direction and partly located in the gas passage 211, and has a needle seat 221 and a needle body 222, and the needle body 222 can be operated to pass through the bottom wall through the needle hole 213b 213a to push the film B.

參閱圖1、圖7與圖8,使用該返修裝置100移除不良晶粒A1的動作流程說明如下。先將該頂推模組2移動至工作位置,使該針體222的位置與待移除的不良晶粒A1的位置上下相對應。然後將該頂推模組2下降至工作高度再對該氣體通道211抽氣使該薄膜B真空吸附於該底壁213a,而後使該針體222通過該針孔213b穿出該底壁213a,以於對應待移除的不良晶粒A1的位置頂推該薄膜B,使該薄膜B黏附待移除的不良晶粒A1。藉由使該薄膜B真空吸附於該底壁213a,能使該針體222伸出該底壁213a時,使該薄膜B貼附於該針體222以減少該薄膜B凸伸出的面積,即可縮小該薄膜B可黏附晶粒的範圍,而能精確的黏附單一晶粒。當該薄膜B黏取不良晶粒A1後,使該針體222退回至該底壁213a內,再將抽氣關閉,而後使該頂推模組2上升回到原本高度,如此即完成移除一個不良晶粒A1的動作流程。有多個不良晶粒A1即重複多次前述動作流程,而移除不良錫球A2的動作流程與移除不良晶粒A1的動作流程相同。該針體222的尺寸以及該薄膜B的黏膠層B2的黏性大小,可以依據待移除晶粒A1及錫球A2的尺寸而調整。藉此移除晶粒A1及錫球A2的方式,不僅能夠小範圍單點移除單一晶粒A1或單一錫球A2,而且該針體222不會直接接觸晶粒A1及錫球A2,並可更換薄膜B,使該返修裝置100不會受到汙染。Referring to FIG. 1 , FIG. 7 and FIG. 8 , the operation flow of removing the defective die A1 using the rework apparatus 100 is described as follows. Firstly, the pushing module 2 is moved to the working position, so that the position of the needle body 222 corresponds up and down to the position of the defective die A1 to be removed. Then the pushing module 2 is lowered to the working height, and then the gas channel 211 is pumped to make the film B vacuum adsorbed on the bottom wall 213a, and then the needle body 222 is passed through the bottom wall 213a through the pinhole 213b, Pushing the film B at a position corresponding to the bad die A1 to be removed, so that the film B adheres to the bad die A1 to be removed. By making the film B vacuum adsorbed on the bottom wall 213a, when the needle body 222 protrudes from the bottom wall 213a, the film B is attached to the needle body 222 to reduce the protruding area of the film B, That is to say, the range in which the film B can adhere to the crystal grains can be narrowed, and a single crystal grain can be precisely adhered. After the film B has picked up the defective die A1, the needle body 222 is retracted into the bottom wall 213a, and then the suction is turned off, and then the pushing module 2 is raised back to the original height, thus completing the removal. Action flow of a bad die A1. If there are multiple bad dies A1 , the above-mentioned action flow is repeated several times, and the action flow of removing the bad solder ball A2 is the same as the action flow of removing the bad die A1 . The size of the needle body 222 and the viscosity of the adhesive layer B2 of the film B can be adjusted according to the size of the chip A1 and the solder ball A2 to be removed. With this method of removing the crystal grain A1 and the solder ball A2, not only can a single crystal grain A1 or a single solder ball A2 be removed in a small area, but also the needle body 222 will not directly contact the crystal grain A1 and the solder ball A2, and The film B can be replaced, so that the rework device 100 will not be polluted.

參閱圖9至圖11,該待修電路板A’移除不良晶粒A1及錫球A2後,可利用點錫設備在移除錫球A2的位置再設置錫球A2,而後使用該返修裝置100補晶。使用該返修裝置100補晶時,需安裝表面黏附多個用於替補的晶粒B1的薄膜B’,例如藍膜或UV膜,補晶動作流程說明如下。先將該頂推模組2移動至工作位置,使該針體222的位置與待補晶粒的錫球A2位置上下相對應。然後將該頂推模組2下降至工作高度,再使該針體222通過該針孔213b穿出該底壁213a,以於對應待替補的晶粒B1的位置頂推該薄膜B’並使待替補的晶粒B1接觸錫球A2,而後對該氣體通道211抽氣使該薄膜B’真空吸附於該底壁213a,使該待替補的晶粒B1轉移至待補晶的錫球A2上。藉由使該薄膜B’真空吸附於該底壁213a,能使該薄膜B’貼附於該針體222,以減少該薄膜B’黏附該待替補的晶粒B1的面積,使該待替補的晶粒B1容易脫離該薄膜B’而轉移至錫球A2上。而後使該針體222退回至該底壁213a內,再將抽氣關閉,接著使該頂推模組2上升回到原本高度,如此即完成補充一個晶粒的動作流程。有多個位置需要補充晶粒即重複多次前述動作流程。Referring to Fig. 9 to Fig. 11, after the defective grain A1 and solder ball A2 are removed from the circuit board A' to be repaired, the solder ball A2 can be installed at the position where the solder ball A2 was removed by using the solder spotting equipment, and then the rework device can be used 100 refill crystals. When using the rework device 100 for chip repair, it is necessary to install thin films B', such as blue film or UV film, on which a plurality of replacement dies B1 are attached to the surface. The process of chip repair is described as follows. First move the pushing module 2 to the working position, so that the position of the needle body 222 corresponds up and down to the position of the solder ball A2 of the grain to be repaired. Then the pushing module 2 is lowered to the working height, and then the needle body 222 is passed through the pinhole 213b to pass through the bottom wall 213a, so as to push the film B' at the position corresponding to the die B1 to be replaced and make the The grain B1 to be replaced contacts the solder ball A2, and then the gas channel 211 is pumped to make the film B' vacuum adsorbed on the bottom wall 213a, so that the grain B1 to be replaced is transferred to the solder ball A2 to be replaced . By making the film B' vacuum-adsorbed on the bottom wall 213a, the film B' can be attached to the needle body 222, so as to reduce the area where the film B' adheres to the die B1 to be replaced, so that the to-be-replaced The crystal grains B1 are easily detached from the film B' and transferred to the solder balls A2. Then the needle body 222 is retracted into the bottom wall 213a, and then the suction is turned off, and then the pushing module 2 is raised back to the original height, thus completing the operation process of replenishing a die. There are multiple positions that need to replenish crystal grains, that is, repeat the aforementioned action flow for many times.

在一機台可以設置至少兩個返修裝置100,其中一個返修裝置100用於移除晶粒及錫球,另一個返修裝置100用於補晶,而能提升生產效率。At least two rework devices 100 can be installed on one machine, one of which is used to remove dies and solder balls, and the other rework device 100 is used to replenish crystals, thereby improving production efficiency.

綜上所述,本新型返修裝置100可應用於移除晶粒、錫球以及補晶的工序,不僅具有多樣用途,且能因應晶粒及錫球尺寸調整頂推模組2的針體222尺寸,而能小範圍移除單一晶粒或錫球,不會影響附近不需移除的晶粒及錫球,同時返修裝置100本身也不會被汙染。To sum up, the new rework device 100 can be applied to the process of removing dies, solder balls, and repairing dies. It not only has multiple uses, but also can adjust the needle body 222 of the pushing module 2 according to the size of dies and solder balls. size, and can remove a single grain or solder ball in a small area without affecting nearby grains and solder balls that do not need to be removed, and at the same time, the rework device 100 itself will not be polluted.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。But the above-mentioned ones are only embodiments of the present invention, and should not limit the scope of implementation of the present invention with this. All simple equivalent changes and modifications made according to the patent scope of the present application and the content of the patent specification are still within the scope of the present invention. Within the scope covered by this patent.

100:返修裝置 1:固持模組 11:承載框 12:加壓框 121:環板部 122:環推部 13:夾持機構 131:基板 132:遮蓋 133:夾指 134:連接組件 2:頂推模組 21:基座 211:氣體通道 212:座體 213:帽蓋 213a:底壁 213b:針孔 213c:氣孔 214:第一密封環 215:第二密封環 216:氣壓接頭 22:頂針機構 221:針座 222:針體 A:待修物件 A’:待修電路板 A1:不良晶粒 A2:錫球 B:薄膜 B’:薄膜 B1:替補的晶粒 B2:黏膠層100: Rework device 1: Holding module 11: Bearing frame 12: Pressurized frame 121: ring plate part 122: ring push department 13: Clamping mechanism 131: Substrate 132: cover 133: pinch finger 134: Connection components 2: push module 21: base 211: gas channel 212: seat body 213: cap 213a: bottom wall 213b: pinhole 213c: stomata 214: the first sealing ring 215: the second sealing ring 216: Pneumatic connector 22: Ejector mechanism 221: Needle seat 222: needle body A: Items to be repaired A’: circuit board to be repaired A1: Bad grain A2: solder ball B: film B': film B1: Substitute grains B2: Adhesive layer

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是本新型返修裝置的一實施例裝載薄膜以移除待修物件的晶粒及錫球的一側視示意圖; 圖2是該實施例的固持模組與夾持機構的一立體分解圖; 圖3是該實施例的固持模組在固持薄膜狀態之一截面示意圖; 圖4是該實施例的頂推模組的一立體圖; 圖5是該頂推模組的一剖視圖; 圖6是該頂推模組的一不完整的立體圖; 圖7與圖8為類似圖1的側視示意圖,並與圖1相配合說明該實施例移除晶粒的動作流程;及 圖9至圖11為類似圖1的側視示意圖,說明該實施例用於補晶的動作流程。 Other features and functions of the present invention will be clearly presented in the implementation manner with reference to the drawings, wherein: Fig. 1 is a side view schematic diagram of an embodiment of the new rework device loaded with film to remove crystal grains and solder balls of the object to be repaired; Fig. 2 is a three-dimensional exploded view of the holding module and the clamping mechanism of the embodiment; Fig. 3 is a schematic cross-sectional view of the holding module of this embodiment in a holding film state; Fig. 4 is a perspective view of the pushing module of this embodiment; Fig. 5 is a sectional view of the pushing module; Fig. 6 is an incomplete perspective view of the pushing module; 7 and FIG. 8 are schematic side views similar to FIG. 1, and cooperate with FIG. 1 to illustrate the operation process of removing the die in this embodiment; and FIG. 9 to FIG. 11 are schematic side views similar to FIG. 1 , illustrating the operation flow of this embodiment for crystal replenishment.

100:返修裝置 100: Rework device

1:固持模組 1: Holding module

11:承載框 11: Bearing frame

12:加壓框 12: Pressurized frame

2:頂推模組 2: push module

21:基座 21: base

22:頂針機構 22: Ejector mechanism

222:針體 222: needle body

A:待修物件 A: Items to be repaired

A’:待修電路板 A’: circuit board to be repaired

A1:不良晶粒 A1: Bad grain

A2:錫球 A2: solder ball

B:薄膜 B: film

B2:黏膠層 B2: Adhesive layer

Claims (6)

一種返修裝置,適用於設置在用以承載一待修物件的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面設有黏膠層,以移除該待修物件上的不良晶粒或錫球,或是重置晶粒於該待修物件,該返修裝置包含: 一固持模組,包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態;及 一頂推模組,設置在該固持模組上方,並包括一基座及一頂針機構,該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜,該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以頂推該薄膜。 A repairing device, which is suitable for being installed above a workbench for carrying an object to be repaired and for installing a ductile film, and a surface of the film is provided with an adhesive layer to remove the object on the object to be repaired Defective chips or solder balls, or reset chips on the object to be repaired, the rework device includes: A holding module, including a load frame and a pressure frame, to fix the film and be in a slightly taut state; and A pushing module is arranged above the holding module, and includes a base and a thimble mechanism, the base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and multiple A gas hole distributed around the pinhole, the gas passage communicates with the gas holes and connects with an air pumping device for vacuum adsorption of the film on the bottom wall, the thimble mechanism is arranged on the base along the up and down direction and partially It is located in the gas channel and has a needle body, which can be operated to pass through the pinhole and pass through the bottom wall to push the film. 如請求項1所述返修裝置,其中,該基座具有一座體、連接該座體且具有該底壁的一帽蓋、設於該座體與該帽蓋之間的一第一密封環,及設於該座體與該頂針機構之間的一第二密封環,該第一密封環與該第二密封環用以阻斷該氣體通道與外界環境連通。The rework device according to claim 1, wherein the base has a base, a cap connected to the base and having the bottom wall, and a first sealing ring arranged between the base and the cap, And a second sealing ring arranged between the seat body and the thimble mechanism, the first sealing ring and the second sealing ring are used to block the communication between the gas channel and the external environment. 如請求項1所述返修裝置,其中,該承載框供該薄膜藉由該黏膠層黏附固定且使該黏膠層朝下,該加壓框具有水平設置的一環板部及自該環板部內緣垂直延伸的一環推部,該環板部靠抵於該承載框並使該薄膜夾置於該環板部與該承載框之間,且該環推部往下頂推該薄膜以將該薄膜撐張。The rework device as described in claim 1, wherein, the carrying frame is used for the film to be adhered and fixed by the adhesive layer and the adhesive layer faces downward, and the pressure frame has a horizontally arranged ring plate portion and a ring plate from the ring plate A ring push portion vertically extending from the inner edge of the ring plate portion, the ring plate portion leans against the carrier frame and sandwiches the film between the ring plate portion and the carrier frame, and the ring push portion pushes the film downward to The film is stretched. 如請求項1所述返修裝置,其中,該承載框及該加壓框為內外相配合的子母環。The rework device as described in Claim 1, wherein the bearing frame and the pressurizing frame are rings with inner and outer fit. 一種返修裝置,適用於設置在用以承載一待修電路板的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面設有黏膠層,以移除該待修電路板上的不良晶粒或錫球,該返修裝置包含: 一固持模組,包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態;及 一頂推模組,設置在該固持模組上方,並包括一基座及一頂針機構,該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜,該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以於對應待移除的晶粒或錫球的位置頂推該薄膜,使該薄膜黏附待移除的晶粒或錫球。 A repairing device, which is suitable for being installed above a workbench for carrying a circuit board to be repaired and for installing a ductile film, and a surface of the film is provided with an adhesive layer to remove the circuit board to be repaired Bad die or solder balls on the surface, the rework device includes: A holding module, including a load frame and a pressure frame, to fix the film and be in a slightly taut state; and A pushing module is arranged above the holding module, and includes a base and a thimble mechanism, the base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and multiple A gas hole distributed around the pinhole, the gas passage communicates with the gas holes and connects with an air pumping device for vacuum adsorption of the film on the bottom wall, the thimble mechanism is arranged on the base along the up and down direction and partially Located in the gas channel and having a needle body, the needle body can be operated to penetrate the bottom wall through the pinhole to push the film at the position corresponding to the chip or solder ball to be removed, so that the film adheres to be Removed die or solder balls. 一種返修裝置,適用於設置在用以承載一待修電路板的工作台上方並供安裝一具有延展性的薄膜,且該薄膜的一表面黏附多個用於替補的晶粒,該待修電路板設有待補晶的錫球,該返修裝置包含: 一固持模組,包括一承載框及一加壓框,以將該薄膜固定並能呈微繃緊狀態;及 一頂推模組,設置在該固持模組上方,並包括一基座及一頂針機構,該基座具有面向該薄膜的一底壁並界定一氣體通道,該底壁具有一針孔及多個分布於該針孔周圍的氣孔,該氣體通道與該等氣孔相連通且連接一抽氣裝置,用以於該底壁真空吸附該薄膜,該頂針機構沿上下方向設於該基座且部分位於該氣體通道內並具有一針體,該針體可受操作通過該針孔穿出該底壁以於對應待替補的晶粒的位置頂推該薄膜,使該待替補的晶粒轉移至待補晶的錫球上。 A rework device is suitable for being installed above a workbench for carrying a circuit board to be repaired and for installing a ductile film, and a surface of the film is adhered to a plurality of crystal grains for replacement, the circuit to be repaired The board is equipped with solder balls to be repaired. The rework device includes: A holding module, including a load frame and a pressure frame, to fix the film and be in a slightly taut state; and A pushing module is arranged above the holding module, and includes a base and a thimble mechanism, the base has a bottom wall facing the film and defines a gas channel, the bottom wall has a pinhole and multiple A gas hole distributed around the pinhole, the gas passage communicates with the gas holes and connects with an air pumping device for vacuum adsorption of the film on the bottom wall, the thimble mechanism is arranged on the base along the up and down direction and partially It is located in the gas channel and has a needle body, which can be operated to pass through the pinhole to pass through the bottom wall to push the film at the position corresponding to the grain to be replaced, so that the grain to be replaced is transferred to On the solder ball to be refilled.
TW111209432U 2022-08-31 2022-08-31 Rework apparatus TWM636093U (en)

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CN116598236B (en) * 2023-07-19 2023-10-13 昆山鸿义精微科技有限公司 Grain sorting method and sorting system
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