TWM633974U - A jetting valve with two stage calibrating structures - Google Patents
A jetting valve with two stage calibrating structures Download PDFInfo
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- TWM633974U TWM633974U TW111204654U TW111204654U TWM633974U TW M633974 U TWM633974 U TW M633974U TW 111204654 U TW111204654 U TW 111204654U TW 111204654 U TW111204654 U TW 111204654U TW M633974 U TWM633974 U TW M633974U
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- 238000006073 displacement reaction Methods 0.000 claims abstract description 47
- 238000012937 correction Methods 0.000 claims abstract description 24
- 238000005507 spraying Methods 0.000 claims abstract description 24
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 238000002347 injection Methods 0.000 claims description 25
- 239000007924 injection Substances 0.000 claims description 25
- 239000003292 glue Substances 0.000 claims description 21
- 230000007246 mechanism Effects 0.000 claims description 20
- 230000003321 amplification Effects 0.000 claims description 9
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000013461 design Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 5
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000012530 fluid Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 230000004308 accommodation Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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Abstract
Description
本新型係關於一種流體塗佈校正的技術範疇,特別是有關應用在塗布裝置設備壓電噴射閥的二段式自動校正機構。The present invention relates to a technical category of fluid coating correction, in particular to a two-stage automatic correction mechanism applied to a piezoelectric injection valve of a coating device.
點膠裝置由傳統習用的氣壓機械式點膠閥,演進到目前最新的壓電噴射閥成為主流的點膠設備,並逐漸取代傳統的氣壓機械式點膠閥。習知氣壓機械式點膠閥的閥體是藉由空氣壓力與彈簧的彈力反覆做動以將膠材擠壓出,其缺點在於除了氣體壓力變化以外,彈簧老化等因素都會影響出膠量的準確性,因此,較難以根據液體的特性設置參數。The dispensing device has evolved from the traditional pneumatic mechanical dispensing valve to the latest piezoelectric injection valve, which has become the mainstream dispensing equipment and gradually replaced the traditional pneumatic mechanical dispensing valve. The conventional pneumatic mechanical dispensing valve uses air pressure and spring force to repeatedly move the valve body to extrude the glue. The disadvantage is that in addition to changes in gas pressure, factors such as spring aging will affect the amount of glue produced. Accuracy, therefore, is more difficult to set parameters according to the properties of the liquid.
為改善氣壓機械式點膠閥的缺失,使用壓電元件的壓電噴射閥裝置乃因應而生,相較於傳統的氣壓機械式噴射設備,壓電噴射閥具有較佳的速度,穩定性,操作性與耐久度的優勢,即使在長時間高速運轉,也能保持穩定的性能。In order to improve the lack of pneumatic mechanical dispensing valves, piezoelectric injection valve devices using piezoelectric elements are developed accordingly. Compared with traditional pneumatic mechanical injection equipment, piezoelectric injection valves have better speed and stability. The advantages of operability and durability can maintain stable performance even during high-speed operation for a long time.
使用壓電元件的噴射閥的原理為施加電壓使壓電元件驅動連桿上下移動,連桿的底部連接噴嘴,當連桿向上抬起時,流體就會往噴嘴流動,而連桿向下作動時,將流體噴出。The principle of the injection valve using the piezoelectric element is to apply voltage to make the piezoelectric element drive the connecting rod to move up and down. The bottom of the connecting rod is connected to the nozzle. When the connecting rod is lifted up, the fluid will flow to the nozzle, and the connecting rod will move downward. , eject the fluid.
雖然壓電材料具有響應速度快、頻率高的特性,但是壓電噴射閥壓電塊的位移量通常不大,因此需要藉由位移放大機構將壓電塊微小的位移量加以放大。然而壓電噴射閥係由殼體、針頭、噴嘴和供料元件等組合而成,因為各元件皆有公差且安裝也會產生誤差,因此,需要能夠提供大範圍位移量的補正,才能確保良好的性能,但現有的壓電噴射閥並無法滿足此需求。Although the piezoelectric material has the characteristics of fast response and high frequency, the displacement of the piezoelectric block of the piezoelectric injection valve is usually not large, so the tiny displacement of the piezoelectric block needs to be amplified by a displacement amplification mechanism. However, the piezoelectric injection valve is composed of a housing, a needle, a nozzle, and a feeding element. Because each element has tolerances and installation errors will occur, therefore, it is necessary to provide a correction of a wide range of displacement in order to ensure good performance. performance, but the existing piezoelectric injection valves cannot meet this demand.
再者,因為材料膨脹係數影響壓電元件末端放大機構的行程,往往使在高低溫不同製程所導致末端位移變化超過能夠補正的範圍。Furthermore, because the coefficient of material expansion affects the travel of the end amplification mechanism of the piezoelectric element, the change in end displacement caused by different processes at high and low temperatures often exceeds the range that can be corrected.
為了使壓電噴射閥的應用能夠實現更高速、精確的塗膠補正目的,本新型創作研發團隊經由不斷的研究實驗後,乃孕育而生完成本新型具二段式校正機構的噴射閥。In order to enable the application of piezoelectric injection valves to achieve faster and more accurate gluing and correction purposes, after continuous research and experimentation by the new creation and development team, the new injection valve with a two-stage correction mechanism was conceived and completed.
本新型所設計的二段式校正機構噴射閥,其連續作動的噴膠頻率可以大於500Hz,時間解析度達1μs,搭配各式模組化的噴嘴設計,即可快速組裝與拆卸,方便更換清洗及保養的功效。另本新型可依據製程上的需求以及流體的特性,對閥體點膠機構進行調節控制,精準達到出膠時的膠點數量、大小及線寬。The injection valve with two-stage correction mechanism designed by this new model can spray glue continuously at a frequency greater than 500 Hz, and the time resolution can reach 1 μs. With various modular nozzle designs, it can be quickly assembled and disassembled, and is convenient for replacement and cleaning. and maintenance effects. In addition, this new model can adjust and control the dispensing mechanism of the valve body according to the requirements of the process and the characteristics of the fluid, so as to accurately achieve the number, size and line width of the glue points when the glue is released.
如前所述,本新型為了改良先前技術的不足,達到精確且快速地校正噴射閥流體材料的出膠量,提供了一種具二段式校正機構的噴射閥。As mentioned above, the present invention provides a jet valve with a two-stage correction mechanism in order to improve the deficiencies of the prior art and to accurately and quickly correct the glue output of the fluid material of the jet valve.
本新型的具二段式校正機構的噴射閥,係於一噴射閥的殼體內設置可容納元件的一容置空間,殼體開設有一上開口和一下開口。其中,容置空間內設置一壓電驅動單元,壓電驅動單元係沿著前述殼體內的上開口方向設置。容置空間內另設置一噴塗單元,噴塗單元係連接於下開口處;容置空間的底部設有一位移放大元件,位移放大元件抵靠於噴塗單元上,且壓電驅動單元的底端與位移放大元件接觸貼合。The injection valve with a two-stage correction mechanism of the present invention is provided with an accommodating space for components in a housing of the injection valve, and the housing is provided with an upper opening and a lower opening. Wherein, a piezoelectric driving unit is arranged in the accommodating space, and the piezoelectric driving unit is arranged along the direction of the upper opening in the housing. Another spraying unit is set in the accommodation space, and the spraying unit is connected to the lower opening; a displacement amplification element is provided at the bottom of the accommodation space, and the displacement amplification element is against the spraying unit, and the bottom end of the piezoelectric drive unit is in contact with the displacement Enlarged component contact fit.
於前述位移放大元件的周緣,設置一感測單元用以感測位移放大元件的位移;感測單元連接一控制單元,藉由控制單元根據感測單元感測得到的數據以調整提供給壓電驅動單元的電壓。On the periphery of the aforementioned displacement amplifying element, a sensing unit is arranged to sense the displacement of the displacement amplifying element; the sensing unit is connected to a control unit, and the control unit adjusts the sensor provided to the piezoelectric device according to the data sensed by the sensing unit. drive unit voltage.
再者,本新型的供液單元具有一接合孔和接合螺帽,噴塗單元通過接合孔藉由接合螺帽將供液單元連接於噴塗單元。Furthermore, the liquid supply unit of the present invention has an engaging hole and an engaging nut, and the spraying unit connects the liquid supply unit to the spraying unit through the engaging hole and the engaging nut.
感測單元可視應用場合使用光學感測器、電容感測器或光學尺感測器。The sensing unit may use an optical sensor, a capacitive sensor or an optical scale sensor depending on the application.
本新型的控制單元能夠經由電壓操作精確地控制壓電元件,可透過控制單元的參數設定改變噴嘴或閥門打開和關閉的速度,進而達到校準所需的出膠狀態。另根據不同膠材黏度特點設置噴嘴或閥門開啟、關閉的行程與時間長短的組合,亦可解決或改善氣泡的產生與噴濺等問題。The new control unit can precisely control the piezoelectric element through voltage operation, and the speed of opening and closing of the nozzle or valve can be changed through the parameter setting of the control unit, so as to achieve the glue output state required for calibration. In addition, according to the viscosity characteristics of different adhesive materials, the combination of opening and closing strokes and time of nozzles or valves can be set, which can also solve or improve the problems of bubble generation and splashing.
為了使所屬技術領域中具有通常知識者能夠充分瞭解本新型之技術特徵、內容與優點及其所能達到之功效,茲將本新型配合附圖,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本新型實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本新型於實際實施上的權利範圍,合先敘明。In order to enable those with ordinary knowledge in the technical field to fully understand the technical features, content and advantages of the present invention and the effects it can achieve, the present invention is hereby combined with the accompanying drawings and described in detail as follows in the form of embodiments, and The purpose of the diagrams used in it is only for illustration and auxiliary instructions, and may not be the true proportion and precise configuration of the new model after implementation. Therefore, the ratio and configuration relationship of the attached diagrams should not be interpreted or limited to the new model. The scope of rights in practical implementation shall be described first.
請參閱圖1,為本新型具二段式校正機構的噴射閥1的一實施例外觀側視圖和剖面圖,包含:一殼體11,具有一容置空間111,殼體11開設有一上開口112和一下開口113。一壓電驅動單元10,包括一壓電致動件12沿著前述殼體11內的容置空間111的上開口112方向設置;一噴塗單元20,連接於下開口113處;一位移放大元件30,設置在容置空間111底部,底面以一圓弧部301抵靠於噴塗單元20上,位移放大元件30底面另一側以一凹部302與壓電致動件12的底端抵靠,位移放大元件30利用槓桿放大作用將壓電驅動單元10的微小位移,轉換成倍數的位移;一感測單元40,設置在位移放大元件30頂面的突出部303,感測位移放大元件30的位移;一控制單元50,連接於感測單元40和壓電驅動單元10,根據感測單元40針對位移放大元件30感測所得的位移數據,調整供給壓電驅動單元10的電壓;以及一供液單元60,具有一接合孔601和接合螺帽602,噴塗單元20通過接合孔601藉由接合螺帽602將供液單元60與噴塗單元20連接。Please refer to Fig. 1, which is a side view and a cross-sectional view of an embodiment of the
圖2為有關噴塗單元20的細部放大圖,如圖所示,噴塗單元20包含:一彈簧201、一頂針202、一噴嘴203和一調整螺帽204。其中,頂針202藉由彈簧201的彈力使頂針202抵靠於位移放大元件30一側的下方,噴嘴203具有一出膠口205,調整螺帽204係大範圍調整噴嘴203的出膠起始點位置。FIG. 2 is a detailed enlarged view of the
圖3所示為壓電電壓對應時間的校正示意圖,其中,實線表示原始施加電壓大小的狀態,虛線代表校正電壓的狀態。當施加電壓於壓電致動件器12時,壓電致動件12向下伸展產生微小的位移,透過位移放大元件30將所產生微小的位移放大。FIG. 3 is a schematic diagram of the correction of piezoelectric voltage corresponding to time, wherein the solid line represents the state of the original applied voltage, and the dotted line represents the state of the corrected voltage. When a voltage is applied to the
藉由感測單元40感測位移放大元件30的位移,若需調整位移量時,可經由增加或減少供給電壓達到補償的效果。如圖3所示,上方虛線為增加電壓的供應,將使得壓電致動件12伸展量增加,下方虛線表示減少電壓的供應,壓電致動件12伸展量減少。The displacement of the
在一般情況下,由於低黏度膠材較容易產生擴散或噴濺的問題,因此電壓調降時,出膠時的力道即可被抑制防止擴散現象的產生。相反地,使用高黏度膠材時,則需在噴塗出膠時提高出膠的壓力以將膠材射出。In general, since low-viscosity adhesives are more likely to cause diffusion or splashing, when the voltage is lowered, the force of the adhesive can be suppressed to prevent the occurrence of diffusion. On the contrary, when using high-viscosity adhesive materials, it is necessary to increase the pressure of the adhesive when spraying the adhesive to eject the adhesive.
於一實施例中,上述的調整螺帽204為可分離模組構件。In one embodiment, the above-mentioned
感測單元40可視應用場合使用適合的感測元件,於本實施例中,使用一組光學感測器,如圖1所示,係設置在位移放大元件30的頂面以光發射單元41配合光接收單元42進行感測。
控制單元50根據感測單元40針對位移放大元件30感測所得的位移調整供給壓電驅動單元10的電壓,製程中循環地補償調整噴塗的出膠量,使得噴塗出來的膠點大小均勻。The
前述感測單元40除了感測所得的位移放大元件30的位移,也可以感測速度或其他可供調整補正的參數。In addition to sensing the resulting displacement of the
於一實施例中,本新型可藉由自動或手動轉動調整螺帽204大範圍調整噴嘴203出膠的起始點。In one embodiment, the present invention can adjust the starting point of glue output from the
於一實施例中,本新型可藉由自動或手動調整壓電驅動單元10大範圍調整噴嘴203出膠的起始點。In one embodiment, the present invention can adjust the starting point of the
如上所述,由於點膠設備安裝時以及各元件間產生的誤差合計可達20﹪,因此,藉由本新型的二段式補正機構先進行靜態的大範圍校正,例如更換或清洗噴塗元件時;於進行加工程序時,再利用位移放大元件30和感測單元40做小範圍動態精細的校正。As mentioned above, since the total error between the installation of the dispensing equipment and the various components can reach 20%, the new two-stage correction mechanism is used to perform static large-scale correction first, such as when replacing or cleaning the spraying components; When performing the processing procedure, the
於一實施例中,本新型的噴嘴為模組化設計,可根據膠點的數量、大小、線寬不同和膠材的種類彈性更換。In one embodiment, the nozzle of the present invention is a modular design, which can be flexibly replaced according to the number, size, and line width of glue points and the type of glue material.
以上所述僅為舉例性,用以說明本新型之技術內容的可行具體實施例,而非用於限制本新型。本新型所屬技領域具有通常知識者基於說明書中所揭示內容之教示所為的等效置換、修改或變更,均包含於本新型之申請專利範圍中,未脫離本新型的權利範疇。The above description is only for example, and is used to describe feasible specific embodiments of the technical content of the present invention, and is not intended to limit the present invention. Equivalent replacements, modifications or changes made by persons with ordinary knowledge in the technical field of the present invention based on the teachings disclosed in the specification are included in the scope of the patent application of the present invention and do not depart from the scope of rights of the present invention.
1:具二段式校正機構的噴射閥 10:壓電驅動單元 11:殼體 111:容置空間 112:上開口 113:下開口 12:壓電致動件 20:噴塗單元 201:彈簧 202:頂針 203:噴嘴 204:調整螺帽 205:出膠口 30:位移放大元件 301:圓弧部 302:凹部 303:突出部 40:感測單元 41:光發射單元 42:光接收單元 50:控制單元 60:供液單元 601:接合孔 602:接合螺帽 1: Injection valve with two-stage correction mechanism 10: Piezoelectric drive unit 11: shell 111:Accommodating space 112: Upper opening 113: Lower opening 12: Piezoelectric actuator 20: Spraying unit 201: spring 202: Thimble 203: Nozzle 204: Adjusting nut 205: Glue outlet 30: Displacement amplification element 301: arc part 302: concave part 303: protrusion 40: Sensing unit 41: Light emitting unit 42: Light receiving unit 50: Control unit 60: Liquid supply unit 601: joint hole 602: joint nut
圖1為本新型之外觀側視圖和剖面圖。 圖2為圖1的局部放大圖。 圖3為本新型的壓電電壓對應時間的校正示意圖。 Fig. 1 is the appearance side view and the sectional view of the new model. FIG. 2 is a partially enlarged view of FIG. 1 . FIG. 3 is a schematic diagram of the correction of the piezoelectric voltage corresponding to the time of the present invention.
12:壓電致動件 12: Piezoelectric actuator
20:噴塗單元 20: Spraying unit
201:彈簧 201: spring
202:頂針 202: Thimble
203:噴嘴 203: Nozzle
204:調整螺帽 204: Adjusting nut
205:出膠口 205: Glue outlet
30:位移放大元件 30: Displacement amplification element
301:圓弧部 301: arc part
302:凹部 302: concave part
303:突出部 303: protrusion
41:光發射單元 41: Light emitting unit
42:光接收單元 42: Light receiving unit
601:接合孔 601: joint hole
602:接合螺帽 602: joint nut
Claims (9)
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| TW111204654U TWM633974U (en) | 2022-05-06 | 2022-05-06 | A jetting valve with two stage calibrating structures |
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| TW111204654U TWM633974U (en) | 2022-05-06 | 2022-05-06 | A jetting valve with two stage calibrating structures |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117046680A (en) * | 2022-05-06 | 2023-11-14 | 库力索法高科股份有限公司 | Injection valve with two-stage correction structure |
| TWI837657B (en) * | 2022-05-06 | 2024-04-01 | 庫力索法高科股份有限公司 | A jetting valve with two stage calibrating structures |
-
2022
- 2022-05-06 TW TW111204654U patent/TWM633974U/en unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117046680A (en) * | 2022-05-06 | 2023-11-14 | 库力索法高科股份有限公司 | Injection valve with two-stage correction structure |
| TWI837657B (en) * | 2022-05-06 | 2024-04-01 | 庫力索法高科股份有限公司 | A jetting valve with two stage calibrating structures |
| US12318791B2 (en) | 2022-05-06 | 2025-06-03 | Kulicke and Soffa Hi-Tech Co., Ltd. | Jetting valve with two stage calibrating structures |
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