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TWM627466U - Multi-chip stacked package structure - Google Patents

Multi-chip stacked package structure Download PDF

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Publication number
TWM627466U
TWM627466U TW111200980U TW111200980U TWM627466U TW M627466 U TWM627466 U TW M627466U TW 111200980 U TW111200980 U TW 111200980U TW 111200980 U TW111200980 U TW 111200980U TW M627466 U TWM627466 U TW M627466U
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Taiwan
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chip
substrate
wafer
dummy
metal wire
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TW111200980U
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Chinese (zh)
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張玲華
蔡駿宇
王鵬鈞
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福懋科技股份有限公司
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Priority to TW111200980U priority Critical patent/TWM627466U/en
Publication of TWM627466U publication Critical patent/TWM627466U/en

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Abstract

A multi-chip stack packaging structure includes a substrate, a first chip, a first wire, a dummy chip, an adhesive layer, a second chip, a second wire and a packaging structure. The substrate has an upper surface and a lower surface, the first wafer has an active surface and a back surface, and the back surface of the first wafer is disposed on the upper surface of the substrate facing down, and the first wire is electrically connected to the active surface of the first wafer and the upper surface of the substrate, the dummy chip has a front and a back side, the back side is arranged on the upper surface of the substrate, the adhesive layer is arranged on the active surface of the first chip and the front side of the dummy chip, and the second chip is arranged on the adhesive layer, through the adhesive layer The second chip is fixed on the active surface of the first chip and the front surface of the dummy chip, the second wire is electrically connected to the upper surface of the second chip and the substrate, and the package structure is arranged above the substrate to cover the part of the substrate a surface, a first wire, a second wire, and a second wafer.

Description

多晶片堆疊封裝結構Multi-die stacked package structure

本新型提供一種晶片封裝結構,特別的是一種多晶片堆疊封裝結構。The present invention provides a chip package structure, in particular a multi-chip stack package structure.

小尺寸之積體電路封裝單元一般是以成批方式建構於單一個矩陣式基底上;此矩陣式基底是預先定義出多個封裝區域,其中每一個封裝區域即用以建構一個封裝單元。於完成封裝膠體製程之後,接著即可進行一分割程序(singulation process),用以將矩陣式基底上所建構之封裝單元總合結構體分割成個別之封裝單元。以此種方式製造之封裝單元例如包括薄型球柵陣列式(Thin & Fine Ball Grid Array, TFBGA)封裝單元、四邊形平面無導腳式(Quad Flat No-lead, QFN)封裝單元等等。Small-sized IC packaging units are generally constructed on a single matrix substrate in a batch manner. The matrix substrate defines a plurality of packaging areas in advance, and each packaging area is used to construct a packaging unit. After the encapsulation glue process is completed, a singulation process can be performed to divide the package unit aggregate structure constructed on the matrix substrate into individual package units. Package units manufactured in this way include, for example, Thin & Fine Ball Grid Array (TFBGA) package units, Quad Flat No-lead (QFN) package units, and the like.

現行封裝於多晶片產品,除存儲功能欲增加容量需堆疊多晶片外,也會擴增加密晶片與無線通訊晶片等異質晶片,但固定的產品大小需堆疊多種尺寸晶片,目前的設計還需要符合為大晶片在下方,小晶片在上的限制,或者是交錯堆疊,但交錯式的結構或是尺寸不同的堆疊結構容易在打線時因上方的承載壓力而造成整個結構崩潰,以致於製程需要重工或是晶片損毀。Currently packaged in multi-chip products, in addition to stacking multi-chips to increase the capacity of the storage function, heterogeneous chips such as encryption chips and wireless communication chips will also be expanded. However, the fixed product size requires stacking of various sizes of chips. The current design also needs to meet the For the limitation of the large chip on the bottom and the small chip on the top, or staggered stacking, but the staggered structure or the stacked structure of different sizes is easy to cause the entire structure to collapse due to the bearing pressure above during wire bonding, so that the process needs to be reworked. or chip damage.

因此,如何提出一種多晶片堆疊封裝結構,能夠有效改善習知技術的缺點已成為一個重要的課題。Therefore, how to propose a multi-chip stacked package structure that can effectively improve the shortcomings of the prior art has become an important issue.

為了解決上述需求,本創作的目的是提供了一種多晶片堆疊封裝結構,藉由假晶片的支撐應用,可以增加整體封裝結構的穩固性。In order to solve the above-mentioned requirements, the purpose of the present invention is to provide a multi-chip stacked packaging structure, which can increase the stability of the overall packaging structure through the supporting application of the dummy chips.

根據上述目的,本創作主要提出一種多晶片堆疊封裝結構,包含:基板、第一晶片、第一金屬導線、假晶片、膠層、第二晶片、第二金屬導線及封裝體。其中,基板具有上表面和下表面,第一晶片具有主動面及背面,且第一晶片的背面朝下設置在基板的上表面上,第一金屬導線電性連接第一晶片的主動面及基板的上表面,假晶片具有正面及反面,且假晶片的反面朝下設置在基板的上表面上,膠層設置於第一晶片的主動面及假晶片的正面上,第二晶片設置在膠層上,藉由膠層使第二晶片固定在第一晶片的主動面及假晶片的正面上,第二金屬導線電性連接第二晶片及基板的上表面,封裝體設置在基板上方,用來包覆基板的部份上表面、第一金屬導線、第二金屬導線及第二晶片。According to the above purpose, the present invention mainly proposes a multi-chip stack packaging structure, including: a substrate, a first chip, a first metal wire, a dummy chip, an adhesive layer, a second chip, a second metal wire, and a package body. The substrate has an upper surface and a lower surface, the first wafer has an active surface and a back surface, the back surface of the first wafer is disposed on the upper surface of the substrate, and the first metal wire is electrically connected to the active surface of the first wafer and the substrate The upper surface of the dummy wafer has a front side and a back side, and the back side of the dummy wafer is arranged on the upper surface of the substrate, the adhesive layer is arranged on the active surface of the first wafer and the front side of the dummy wafer, and the second wafer is arranged on the adhesive layer , the second chip is fixed on the active surface of the first chip and the front surface of the dummy chip by the adhesive layer, the second metal wire is electrically connected to the second chip and the upper surface of the substrate, and the package body is arranged above the substrate for A part of the upper surface of the substrate, the first metal wire, the second metal wire and the second chip are covered.

根據上述目的,本創作另外提出一種多晶片堆疊封裝結構,包含:基板、第一晶片、第一金屬導線、第二晶片、第二金屬導線、假晶片、膠層、第三晶片、第三金屬導線及封裝體。其中,基板具有上表面和下表面,第一晶片具有主動面及背面,且第一晶片的背面朝下設置在基板的上表面上,第一金屬導線電性連接第一晶片的主動面及基板的上表面,第三晶片具有頂面及底面,且第三晶片的底面朝下設置在基板的上表面上,第三金屬導線電性連接第三晶片的頂面及基板的上表面上,假晶片具有正面及反面,且假晶片的反面朝下設置在基板的上表面上,膠層設置於第一晶片的主動面、第三晶片的頂面及假晶片的正面上,第二晶片設置在膠層上,藉由膠層使第二晶片固定在第一晶片的主動面、第三晶片的頂面及假晶片的正面上,第二金屬導線電性連接第二晶片及基板的上表面,封裝體設置在基板上方,用來包覆基板的部份上表面、第一金屬導線、第二金屬導線、第三金屬導線及第二晶片。According to the above purpose, the present invention further proposes a multi-chip stack package structure, comprising: a substrate, a first chip, a first metal wire, a second chip, a second metal wire, a dummy chip, an adhesive layer, a third chip, and a third metal Wires and packages. The substrate has an upper surface and a lower surface, the first wafer has an active surface and a back surface, the back surface of the first wafer is disposed on the upper surface of the substrate, and the first metal wire is electrically connected to the active surface of the first wafer and the substrate The upper surface of the third wafer has a top surface and a bottom surface, and the bottom surface of the third wafer is disposed on the upper surface of the substrate, and the third metal wire is electrically connected to the top surface of the third wafer and the upper surface of the substrate. The wafer has a front side and a back side, and the back side of the dummy wafer is arranged on the upper surface of the substrate, the adhesive layer is arranged on the active surface of the first wafer, the top surface of the third wafer and the front side of the dummy wafer, and the second wafer is arranged on the front side of the dummy wafer. On the adhesive layer, the second chip is fixed on the active surface of the first chip, the top surface of the third chip and the front surface of the dummy chip by the adhesive layer, and the second metal wire is electrically connected to the upper surface of the second chip and the substrate, The package body is arranged above the substrate and is used for covering a part of the upper surface of the substrate, the first metal wire, the second metal wire, the third metal wire and the second chip.

根據上述目的,本創作又再提出一種多晶片堆疊封裝結構,包含:基板、第一晶片、第一金屬導線、假晶片、膠層、第二晶片、第二金屬導線及封裝體。其中,基板具有上表面和下表面,第一晶片具有主動面及背面,且第一晶片的背面朝下設置在基板的上表面上,第一金屬導線電性連接第一晶片的主動面及基板的上表面,膠層設置於第一晶片的主動面上,第二晶片設置在膠層上,藉由膠層使第二晶片固定在第一晶片的主動面上,第二金屬導線電性連接第二晶片及基板的上表面,假晶片分別設置在第一晶片的兩側及基板的上表面上,封裝體設置在基板上方,用來包覆基板的部份上表面、假晶片、第一金屬導線、第二金屬導線及第二晶片。According to the above purpose, the present invention further proposes a multi-chip stack packaging structure, which includes: a substrate, a first chip, a first metal wire, a dummy chip, an adhesive layer, a second chip, a second metal wire, and a package body. The substrate has an upper surface and a lower surface, the first wafer has an active surface and a back surface, the back surface of the first wafer is disposed on the upper surface of the substrate, and the first metal wire is electrically connected to the active surface of the first wafer and the substrate The adhesive layer is arranged on the active surface of the first chip, the second chip is arranged on the adhesive layer, the second chip is fixed on the active surface of the first chip by the adhesive layer, and the second metal wire is electrically connected The second chip and the upper surface of the substrate, the dummy chips are respectively arranged on both sides of the first chip and the upper surface of the substrate, the package body is arranged above the substrate, and is used to cover part of the upper surface of the substrate, the dummy chip, the first A metal wire, a second metal wire and a second chip.

本創作之優點及特徵以及達到其方法將參照例示性實施例及附圖進行更詳細的描述而更容易理解。然而,本創作可以不同形式來實現且不應被理解僅限於此處所陳述的實施例。相反地,對所屬技術領域具有通常知識者而言,所提供的此些實施例將使本揭露更加透徹與全面且完整地傳達本創作的範疇。特別要說明的是,本創作的圖式中,是以剖面圖來顯示晶片間的堆疊結構,故圖式中的晶片主動面201上的多個電性連接端、金屬導線及電性連接元件,都只顯示剖面一側,並非只有單一電性連接端、金屬導線及電性連接元件,先予以說明。The advantages and features of the present invention and the methods for achieving the same will be more readily understood with reference to the more detailed description of the exemplary embodiments and the accompanying drawings. However, the present creations may be implemented in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the scope of the invention to those of ordinary skill in the art. It should be noted that, in the drawings of the present invention, a cross-sectional view is used to show the stacked structure between the chips, so the plurality of electrical connection terminals, metal wires and electrical connection elements on the active surface 201 of the chip in the drawings , all only show one side of the cross-section, not only a single electrical connection terminal, metal wires and electrical connection elements, which will be explained first.

請參考圖1,圖1為多晶片堆疊封裝結構的第一實施例示意圖。如圖1所示,本創作之多晶片堆疊封裝結構包含基板10、第一晶片20、第一金屬導線21、假晶片50、膠層60、第二晶片30、第二金屬導線31及封裝體70。其中,基板10具有上表面101和下表面102,此基板10的上表面101配置有電性連接線路(未顯示於圖中),以及基板10的下表面102配置有電性連接的端點(未顯示於圖中),而上表面101的線路與下表面102的端點形成電性連接。第一晶片20具有主動面201及背面202,且第一晶片20的背面202朝下設置在基板10的上表面101上,而第一晶片20的主動面201上配置有多個焊墊90。接下來,使用打線製程,將複數條第一金屬導線21的一端電性連接第一晶片20的主動面201上的焊墊90,並將第一金屬導線21的另一端電性連接至基板10的上表面101上的電性連接線路(未顯示於圖中)。然後,提供一個假晶片50,具有正面501及反面502,且假晶片50的反面502朝下設置在基板10的上表面101上,其中,假晶片50的高度與第一晶片20的高度相當,而此假晶片50可以是一種矽晶片,然而,本創作對此假晶片50的材質,並不加以限制。再接著,提供一膠層60,特別是一種可埋入金屬元件的FOW(Film Over Wire)膠,將形成膠態的膠層60覆蓋並設置於第一晶片20的主動面201及假晶片50的正面501上,且讓形成膠態的膠層60包覆第一金屬導線21。然後,等待膠層60固化後,再將第二晶片30設置在膠層60上。接著,再使用打線製程,將複數條第二金屬導線31的一端電性連接第二晶片30上的焊墊90,而將第二金屬導線31的另一端電性連接至基板10的上表面101的電性連接線路(未顯示於圖中)。最後,使用封膠劑來形成封裝體70,其中,封裝體70設置在基板10上方,包覆了基板10的部份上表面101、第一金屬導線21、第二金屬導線31及第二晶片30。要說明的是,當完成封膠製程後,在基板10的下表面102上的複數個電性連接端點上,形成多個電性連接元件80,其中,這些電性連接元件80可以是一種錫球,而錫球可以是一種C4標準的的錫球,由於形成方式和電性連接元件80的功能與現有技術相同,也並非本創作的主要技術特徵,故不多加陳述。Please refer to FIG. 1 . FIG. 1 is a schematic diagram of a first embodiment of a multi-chip stacked package structure. As shown in FIG. 1 , the multi-chip stack package structure of the present invention includes a substrate 10 , a first chip 20 , a first metal wire 21 , a dummy chip 50 , an adhesive layer 60 , a second chip 30 , a second metal wire 31 and a package body 70. The substrate 10 has an upper surface 101 and a lower surface 102, the upper surface 101 of the substrate 10 is configured with electrical connection lines (not shown in the figure), and the lower surface 102 of the substrate 10 is configured with electrical connection terminals ( (not shown in the figure), and the lines of the upper surface 101 are electrically connected to the terminals of the lower surface 102 . The first wafer 20 has an active surface 201 and a back surface 202 , the back surface 202 of the first wafer 20 is disposed on the upper surface 101 of the substrate 10 downward, and a plurality of bonding pads 90 are disposed on the active surface 201 of the first wafer 20 . Next, using a wire bonding process, one end of the plurality of first metal wires 21 is electrically connected to the pads 90 on the active surface 201 of the first chip 20 , and the other end of the first metal wires 21 is electrically connected to the substrate 10 Electrical connection lines (not shown in the figure) on the upper surface 101 of the . Then, a dummy wafer 50 is provided, which has a front side 501 and a back side 502, and the back side 502 of the dummy wafer 50 is disposed on the upper surface 101 of the substrate 10 facing downward, wherein the height of the dummy wafer 50 is equivalent to the height of the first wafer 20, The dummy chip 50 can be a silicon chip, however, the material of the dummy chip 50 is not limited in the present invention. Next, an adhesive layer 60 is provided, especially a FOW (Film Over Wire) adhesive that can embed metal components, and the adhesive layer 60 in a colloidal state is covered and disposed on the active surface 201 of the first chip 20 and the dummy chip 50 On the front side 501 of the first metal wire 21 , the adhesive layer 60 in a colloidal state is formed to cover the first metal wire 21 . Then, after the adhesive layer 60 is cured, the second wafer 30 is disposed on the adhesive layer 60 . Next, using a wire bonding process, one end of the plurality of second metal wires 31 is electrically connected to the pads 90 on the second chip 30 , and the other end of the second metal wires 31 is electrically connected to the upper surface 101 of the substrate 10 . the electrical connection circuit (not shown in the figure). Finally, an encapsulant is used to form a package body 70 , wherein the package body 70 is disposed above the substrate 10 and covers part of the upper surface 101 of the substrate 10 , the first metal wires 21 , the second metal wires 31 and the second chip 30. It should be noted that, after the encapsulation process is completed, a plurality of electrical connection elements 80 are formed on the plurality of electrical connection terminals on the lower surface 102 of the substrate 10 , wherein the electrical connection elements 80 may be a kind of The solder ball can be a C4 standard solder ball. Since the formation method and the function of the electrical connection element 80 are the same as those in the prior art, they are not the main technical features of this creation, so they will not be described further.

接下來請繼續參考圖1,在另一實施例中,本創作之多晶片堆疊封裝結構包含基板10、第一晶片20、第一金屬導線21、假晶片50、膠層60、第二晶片30、第二金屬導線31及封裝體70。其中,基板10具有上表面101和下表面102,此基板10的上表面101配置有電性連接線路(未顯示於圖中),以及基板10的下表面102配置有電性連接的端點(未顯示於圖中),而上表面101的線路與下表面102的端點形成電性連接。另外,基板10的下表面102上還具有多個電性連接元件80,其中基板10的下表面102上的電性連接元件80為一種錫球(solder ball)。第一晶片20是一種功能晶片,其具有主動面201及背面202,且第一晶片20的背面202朝下設置在基板10的上表面101上,而第一晶片20的主動面201上配置有多個焊墊90。接下來,使用打線製程,將複數條第一金屬導線21的一端電性連接第一晶片20的主動面201上的焊墊90,並將第一金屬導線21的另一端電性連接至基板10的上表面101上的電性連接線路(未顯示於圖中)。然後,提供一個假晶片50,具有正面501及反面502,且假晶片50的反面502朝下設置在基板10的上表面101上,其中,假晶片50的高度與第一晶片20的高度相當,而此假晶片50可以是一種矽晶片,然而,本創作對此假晶片50的材質,並不加以限制。再接著,設置膠層60,特別是一種可埋入金屬元件的FOW(Film Over Wire)膠,將形成膠態的膠層60覆蓋並設置於第一晶片20的主動面201及假晶片50的正面501上,且讓形成膠態的膠層60包覆第一金屬導線21。然後,等待膠層60固化後,再將第二晶片30設置在膠層60上,其中,第二晶片30是一種半導體裸片。接著,再使用打線製程,將複數條第二金屬導線31的一端電性連接第二晶片30上的焊墊90,而將第二金屬導線31的另一端電性連接至基板10的上表面101的電性連接線路(未顯示於圖中)。最後,使用封膠劑來形成封裝體70,其中,封裝體70設置在基板10上方,包覆了基板10的部份上表面101、第一金屬導線21、第二金屬導線31及第二晶片30。要說明的是,當完成封膠製程後,在基板10的下表面102上的複數個電性連接端點上,形成多個電性連接元件80,其中,這些電性連接元件80可以是一種錫球,而錫球可以是一種C4標準的的錫球,由於形成方式和電性連接元件80的功能與現有技術相同,也並非本創作的主要技術特徵,故不多加陳述。在本創作中利用假晶片50作為支撐應用,同時可以任意排列,以排除大尺寸晶片在下方,小尺寸晶片在上方的限制, 增加整體多晶片堆疊封裝結構的穩固性。Next, please continue to refer to FIG. 1 . In another embodiment, the multi-chip stacked package structure of the present invention includes a substrate 10 , a first chip 20 , a first metal wire 21 , a dummy chip 50 , an adhesive layer 60 , and a second chip 30 , the second metal wire 31 and the package body 70 . The substrate 10 has an upper surface 101 and a lower surface 102, the upper surface 101 of the substrate 10 is configured with electrical connection lines (not shown in the figure), and the lower surface 102 of the substrate 10 is configured with electrical connection terminals ( (not shown in the figure), and the lines of the upper surface 101 are electrically connected to the terminals of the lower surface 102 . In addition, the lower surface 102 of the substrate 10 also has a plurality of electrical connection elements 80 , wherein the electrical connection elements 80 on the lower surface 102 of the substrate 10 are solder balls. The first wafer 20 is a functional wafer, which has an active surface 201 and a back surface 202 , and the back surface 202 of the first wafer 20 is disposed on the upper surface 101 of the substrate 10 facing downward, and the active surface 201 of the first wafer 20 is configured with a A plurality of solder pads 90 . Next, using a wire bonding process, one end of the plurality of first metal wires 21 is electrically connected to the pads 90 on the active surface 201 of the first chip 20 , and the other end of the first metal wires 21 is electrically connected to the substrate 10 Electrical connection lines (not shown in the figure) on the upper surface 101 of the . Then, a dummy wafer 50 is provided, which has a front side 501 and a back side 502, and the back side 502 of the dummy wafer 50 is disposed on the upper surface 101 of the substrate 10 facing downward, wherein the height of the dummy wafer 50 is equivalent to the height of the first wafer 20, The dummy chip 50 can be a silicon chip, however, the material of the dummy chip 50 is not limited in the present invention. Next, an adhesive layer 60 is provided, especially a FOW (Film Over Wire) adhesive that can embed metal components, and the adhesive layer 60 formed in a colloidal state is covered and disposed on the active surface 201 of the first wafer 20 and the dummy wafer 50 . On the front side 501 , the first metal wire 21 is covered by the adhesive layer 60 formed in a colloidal state. Then, after the adhesive layer 60 is cured, the second wafer 30 is disposed on the adhesive layer 60 , wherein the second wafer 30 is a semiconductor die. Next, using a wire bonding process, one end of the plurality of second metal wires 31 is electrically connected to the pads 90 on the second chip 30 , and the other end of the second metal wires 31 is electrically connected to the upper surface 101 of the substrate 10 . the electrical connection circuit (not shown in the figure). Finally, an encapsulant is used to form a package body 70 , wherein the package body 70 is disposed above the substrate 10 and covers part of the upper surface 101 of the substrate 10 , the first metal wires 21 , the second metal wires 31 and the second chip 30. It should be noted that, after the encapsulation process is completed, a plurality of electrical connection elements 80 are formed on the plurality of electrical connection terminals on the lower surface 102 of the substrate 10 , wherein the electrical connection elements 80 may be a kind of The solder ball can be a C4 standard solder ball. Since the formation method and the function of the electrical connection element 80 are the same as those in the prior art, they are not the main technical features of this creation, so they will not be described further. In the present invention, the dummy chips 50 are used as supporting applications, and can be arranged arbitrarily to eliminate the restriction of large-sized chips below and small-sized chips above, and increase the stability of the overall multi-chip stacked package structure.

再來請參考圖2,圖2為本創作之多晶片堆疊封裝結構的第二實施例示意圖。如圖2所示,本創作之多晶片堆疊封裝結構包含基板10、第一晶片20、第一金屬導線21、第二晶片30、第二金屬導線31、假晶片50、膠層60、第三晶片40、第三金屬導線41及封裝體70。其中,基板10具有上表面101和下表面102,此基板10的上表面101配置有電性連接線路(未顯示於圖中),以及基板10的下表面102配置有電性連接的端點(未顯示於圖中),而上表面101的線路與下表面102的端點形成電性連接。第一晶片20具有主動面201及背面202,且第一晶片20的背面202朝下設置在基板10的上表面101上,而第一晶片20的主動面201上配置有多個焊墊90。而第三晶片40具有頂面401及底面402,且第三晶片40的底面402朝下設置在基板10的上表面101上,同時第三晶片40的頂面401上配置有多個焊墊90。接下來,使用打線製程,將複數條第一金屬導線21的一端電性連接第一晶片20的主動面201上的焊墊90,以及將複數條第三金屬導線41的一端電性連接第三晶片40的頂面401上的焊墊90,並將第一金屬導線21的另一端以及第三金屬導線41的另一端電性連接至基板10的上表面101上的電性連接線路(未顯示於圖中)。然後,提供一個假晶片50,具有正面501及反面502,且假晶片50的反面502朝下設置在基板10的上表面101上,其中,假晶片50的高度與第一晶片20的高度相當,而此假晶片50可以是一種矽晶片,然而,本創作對此假晶片50的材質,並不加以限制。再接著,設置膠層60,特別是一種可埋入金屬元件的FOW(Film Over Wire)膠,將形成膠態的膠層60覆蓋並設置於第一晶片20的主動面201、第三晶片40的頂面401及假晶片50的正面501上,且讓形成膠態的膠層60包覆第一金屬導線21及第三金屬導線41。然後,等待膠層60固化後,再將第二晶片30設置在膠層60上,其中,第二晶片30是一種半導體裸片。接著,再使用打線製程,將複數條第二金屬導線31的一端電性連接第二晶片30上的焊墊90,並將第二金屬導線31的另一端電性連接至基板10的上表面101的電性連接線路(未顯示於圖中)。最後,使用封膠劑來形成封裝體70,其中,封裝體70設置在基板10上方,包覆了基板10的部份上表面101、第一金屬導線21、第二金屬導線31、第三導金屬線41及第二晶片30。要說明的是,當完成封膠製程後,在基板10的下表面102上的複數個電性連接端點上,形成多個電性連接元件80,其中,這些電性連接元件80可以是一種錫球,而錫球可以是一種C4標準的的錫球,由於形成方式和電性連接元件80的功能與現有技術相同,也並非本創作的主要技術特徵,故不多加陳述。Please refer to FIG. 2 again. FIG. 2 is a schematic diagram of a second embodiment of the multi-chip stacked package structure of the present invention. As shown in FIG. 2 , the multi-chip stack package structure of the present invention includes a substrate 10 , a first chip 20 , a first metal wire 21 , a second chip 30 , a second metal wire 31 , a dummy chip 50 , an adhesive layer 60 , and a third The chip 40 , the third metal wires 41 and the package body 70 . The substrate 10 has an upper surface 101 and a lower surface 102, the upper surface 101 of the substrate 10 is configured with electrical connection lines (not shown in the figure), and the lower surface 102 of the substrate 10 is configured with electrical connection terminals ( (not shown in the figure), and the lines of the upper surface 101 are electrically connected to the terminals of the lower surface 102 . The first wafer 20 has an active surface 201 and a back surface 202 , the back surface 202 of the first wafer 20 is disposed on the upper surface 101 of the substrate 10 downward, and a plurality of bonding pads 90 are disposed on the active surface 201 of the first wafer 20 . The third wafer 40 has a top surface 401 and a bottom surface 402 , and the bottom surface 402 of the third wafer 40 is disposed on the upper surface 101 of the substrate 10 with the bottom surface 402 facing downward, and a plurality of bonding pads 90 are disposed on the top surface 401 of the third wafer 40 . . Next, using a wire bonding process, one end of the plurality of first metal wires 21 is electrically connected to the pads 90 on the active surface 201 of the first chip 20, and one end of the plurality of third metal wires 41 is electrically connected to the third The bonding pads 90 on the top surface 401 of the chip 40 electrically connect the other ends of the first metal wires 21 and the other ends of the third metal wires 41 to electrical connection lines (not shown) on the upper surface 101 of the substrate 10 in the picture). Then, a dummy wafer 50 is provided, which has a front side 501 and a back side 502, and the back side 502 of the dummy wafer 50 is disposed on the upper surface 101 of the substrate 10 facing downward, wherein the height of the dummy wafer 50 is equivalent to the height of the first wafer 20, The dummy chip 50 can be a silicon chip, however, the material of the dummy chip 50 is not limited in the present invention. Next, an adhesive layer 60 is provided, especially a FOW (Film Over Wire) adhesive that can embed metal components, and the adhesive layer 60 formed in a colloidal state is covered and disposed on the active surface 201 of the first wafer 20 and the third wafer 40 On the top surface 401 of the dummy wafer 50 and the front surface 501 of the dummy chip 50 , the first metal wire 21 and the third metal wire 41 are covered by the glue layer 60 in a colloidal state. Then, after the adhesive layer 60 is cured, the second wafer 30 is disposed on the adhesive layer 60 , wherein the second wafer 30 is a semiconductor die. Next, using a wire bonding process, one end of the plurality of second metal wires 31 is electrically connected to the pads 90 on the second chip 30 , and the other end of the second metal wires 31 is electrically connected to the upper surface 101 of the substrate 10 . the electrical connection circuit (not shown in the figure). Finally, an encapsulant is used to form a package body 70 , wherein the package body 70 is disposed above the substrate 10 and covers part of the upper surface 101 of the substrate 10 , the first metal wires 21 , the second metal wires 31 , and the third conductors The metal wires 41 and the second wafer 30 . It should be noted that, after the encapsulation process is completed, a plurality of electrical connection elements 80 are formed on the plurality of electrical connection terminals on the lower surface 102 of the substrate 10 , wherein the electrical connection elements 80 may be a kind of The solder ball can be a C4 standard solder ball. Since the formation method and the function of the electrical connection element 80 are the same as those in the prior art, they are not the main technical features of this creation, so they will not be described further.

接下來請繼續參考圖2,在另一實施例中,本創作之多晶片堆疊封裝結構包含基板10、第一晶片20、第一金屬導線21、第二晶片30、第二金屬導線31、假晶片50、膠層60、第三晶片40、第三金屬導線41及封裝體70。其中,基板10具有上表面101和下表面102,此基板10的上表面101配置有電性連接線路(未顯示於圖中),以及基板10的下表面102配置有電性連接的端點(未顯示於圖中),而上表面101的線路與下表面102的端點形成電性連接。另外,基板10的下表面102上還具有多個電性連接元件80,其中基板10的下表面102上的電性連接元件80為錫球,而錫球可以是一種C4標準的的錫球,由於形成方式和電性連接元件80的功能與現有技術相同,也並非本創作的主要技術特徵,故不多加陳述。第一晶片20是一種功能晶片,其具有主動面201及背面202,且第一晶片20的背面202朝下設置在基板10的上表面101上,而第一晶片20的主動面201上配置有多個焊墊90,而第三晶片40具有頂面401及底面402,且第三晶片40的底面402朝下設置在基板10的上表面101上,同時第三晶片40的頂面401上配置有多個焊墊90,值得一提的是,第三晶片40可能是功能晶片、半導體裸片或是假晶片50。接下來,使用打線製程,將複數條第一金屬導線21的一端電性連接第一晶片20的主動面201上的焊墊90,以及將複數條第三金屬導線41的一端電性連接第三晶片40的頂面401上的焊墊90,並將第一金屬導線21的另一端以及第三金屬導線41的另一端電性連接至基板10的上表面101上的電性連接線路(未顯示於圖中)。然後,提供一個假晶片50,具有正面501及反面502,且假晶片50的反面502朝下設置在基板10的上表面101上,其中,假晶片50的高度與第一晶片20的高度相當,而此假晶片50可以是一種矽晶片,然而,本創作對此假晶片50的材質,並不加以限制。再接著,設置膠層60,特別是一種可埋入金屬元件的FOW(Film Over Wire)膠,將形成膠態的膠層60覆蓋並設置於第一晶片20的主動面201、第三晶片40的頂面401及假晶片50的正面501上,且讓形成膠態的膠層60包覆第一金屬導線21及第三金屬導線41。然後,等待膠層60固化後,再將第二晶片30設置在膠層60上,其中,第二晶片30是一種半導體裸片。接著,再使用打線製程,將複數條第二金屬導線31的一端電性連接第二晶片30上的焊墊90,並將第二金屬導線31的另一端電性連接至基板10的上表面101的電性連接線路(未顯示於圖中)。最後,使用封膠劑來形成封裝體70,其中,封裝體70設置在基板10上方,包覆了基板10的部份上表面101、第一金屬導線21、第二金屬導線31、第三導金屬線41及第二晶片30。另外,在本創作中假晶片50可以放置一顆或是多顆,當第三晶片40為假晶片50時,可利用第三晶片40及假晶片50在基板10的上表面101上方兩側作為支撐應用,增加整體多晶片堆疊封裝結構的穩固性,同時也避免騰空處因需打線造成晶片斷裂。Next, please continue to refer to FIG. 2 . In another embodiment, the multi-chip stacked package structure of the present invention includes a substrate 10 , a first chip 20 , a first metal wire 21 , a second chip 30 , a second metal wire 31 , a dummy The chip 50 , the adhesive layer 60 , the third chip 40 , the third metal wire 41 and the package body 70 . The substrate 10 has an upper surface 101 and a lower surface 102, the upper surface 101 of the substrate 10 is configured with electrical connection lines (not shown in the figure), and the lower surface 102 of the substrate 10 is configured with electrical connection terminals ( (not shown in the figure), and the lines of the upper surface 101 are electrically connected to the terminals of the lower surface 102 . In addition, the lower surface 102 of the substrate 10 also has a plurality of electrical connection elements 80, wherein the electrical connection elements 80 on the lower surface 102 of the substrate 10 are solder balls, and the solder balls can be a C4 standard solder ball, Since the formation method and the function of the electrical connection element 80 are the same as those in the prior art, they are not the main technical features of the present invention, so they will not be described further. The first wafer 20 is a functional wafer, which has an active surface 201 and a back surface 202 , and the back surface 202 of the first wafer 20 is disposed on the upper surface 101 of the substrate 10 facing downward, and the active surface 201 of the first wafer 20 is configured with a A plurality of bonding pads 90 , and the third chip 40 has a top surface 401 and a bottom surface 402 , and the bottom surface 402 of the third chip 40 is disposed on the upper surface 101 of the substrate 10 facing downward, while the third chip 40 is disposed on the top surface 401 There are a plurality of bonding pads 90 . It is worth mentioning that the third wafer 40 may be a functional wafer, a semiconductor die or a dummy wafer 50 . Next, using a wire bonding process, one end of the plurality of first metal wires 21 is electrically connected to the pads 90 on the active surface 201 of the first chip 20, and one end of the plurality of third metal wires 41 is electrically connected to the third The bonding pads 90 on the top surface 401 of the chip 40 electrically connect the other ends of the first metal wires 21 and the other ends of the third metal wires 41 to electrical connection lines (not shown) on the upper surface 101 of the substrate 10 in the picture). Then, a dummy wafer 50 is provided, which has a front side 501 and a back side 502, and the back side 502 of the dummy wafer 50 is disposed on the upper surface 101 of the substrate 10 facing downward, wherein the height of the dummy wafer 50 is equivalent to the height of the first wafer 20, The dummy chip 50 can be a silicon chip, however, the material of the dummy chip 50 is not limited in the present invention. Next, an adhesive layer 60 is provided, especially a FOW (Film Over Wire) adhesive that can embed metal components, and the adhesive layer 60 formed in a colloidal state is covered and disposed on the active surface 201 of the first wafer 20 and the third wafer 40 On the top surface 401 of the dummy wafer 50 and the front surface 501 of the dummy chip 50 , the first metal wire 21 and the third metal wire 41 are covered by the glue layer 60 in a colloidal state. Then, after the adhesive layer 60 is cured, the second wafer 30 is disposed on the adhesive layer 60 , wherein the second wafer 30 is a semiconductor die. Next, using a wire bonding process, one end of the plurality of second metal wires 31 is electrically connected to the pads 90 on the second chip 30 , and the other end of the second metal wires 31 is electrically connected to the upper surface 101 of the substrate 10 . the electrical connection circuit (not shown in the figure). Finally, an encapsulant is used to form a package body 70 , wherein the package body 70 is disposed above the substrate 10 and covers part of the upper surface 101 of the substrate 10 , the first metal wires 21 , the second metal wires 31 , and the third conductors The metal wires 41 and the second wafer 30 . In addition, in the present invention, one or more dummy chips 50 can be placed. When the third chip 40 is the dummy chip 50 , the third chip 40 and the dummy chip 50 can be used on both sides above the upper surface 101 of the substrate 10 as Support applications, increase the stability of the overall multi-chip stack package structure, and also avoid chip breakage due to wire bonding in the air.

再來請參考圖3,圖3為本創作之多晶片堆疊封裝結構的第三實施例示意圖。如圖3所示,本創作之多晶片堆疊封裝結構包含基板10、第一晶片20、第一金屬導線21、假晶片50、膠層60、第二晶片30、第二金屬導線31及封裝體70。其中,基板10具有上表面101和下表面102,此基板10的上表面101配置有電性連接線路(未顯示於圖中),以及基板10的下表面102配置有電性連接的端點(未顯示於圖中),而上表面101的線路與下表面102的端點形成電性連接。另外,基板10的下表面102上還具有多個電性連接元件80,其中基板10的下表面102上的電性連接元件80為錫球,而錫球可以是一種C4標準的的錫球,由於形成方式和電性連接元件80的功能與現有技術相同,也並非本創作的主要技術特徵,故不多加陳述。第一晶片20是一種功能晶片,其具有主動面201及背面202,且第一晶片20的背面202朝下設置在基板10的上表面101上,而第一晶片20的主動面201上配置有多個焊墊90。接下來,使用打線製程,將複數條第一金屬導線21的一端電性連接第一晶片20的主動面201上的焊墊90,並將第一金屬導線21的另一端電性連接至基板10的上表面101上的電性連接線路(未顯示於圖中)。接著,設置膠層60,特別是一種可埋入金屬元件的FOW(Film Over Wire)膠,將形成膠態的膠層60覆蓋並設置於第一晶片20的主動面201上,且讓形成膠態的膠層60包覆第一金屬導線21。然後,等待膠層60固化後,再將第二晶片30設置在膠層60上,其中,第二晶片30是一種半導體裸片。接著,再使用打線製程,將複數條第二金屬導線31的一端電性連接第二晶片30上的焊墊90,而將第二金屬導線31的另一端電性連接至基板10的上表面101的電性連接線路(未顯示於圖中)。特別的是,在本創作中將假晶片50分別設置在第一晶片20的兩側及基板10的上表面101上,當第一晶片20及第二晶片30的最大長度小於或等於封裝長度的二分之一時,將假晶片50設置在第一晶片20的兩側可以平衡模壓時的模流以及減少封裝體翹區的可能。同時,假晶片50的高度與第一晶片20、膠層60及第二晶片30所堆疊的高度相當,而此假晶片50可以是一種矽晶片,然而,本創作對此假晶片50的材質,並不加以限制。最後,使用封膠劑來形成封裝體70,其中,封裝體70設置在基板10上方,包覆了基板10的部份上表面101、假晶片50、第一金屬導線21、第二金屬導線31及第二晶片30,增加整體多晶片堆疊封裝結構的穩固性。Please refer to FIG. 3 again. FIG. 3 is a schematic diagram of a third embodiment of the multi-chip stacked package structure of the invention. As shown in FIG. 3 , the multi-chip stack package structure of the present invention includes a substrate 10 , a first chip 20 , a first metal wire 21 , a dummy chip 50 , an adhesive layer 60 , a second chip 30 , a second metal wire 31 and a package body 70. The substrate 10 has an upper surface 101 and a lower surface 102, the upper surface 101 of the substrate 10 is configured with electrical connection lines (not shown in the figure), and the lower surface 102 of the substrate 10 is configured with electrical connection terminals ( (not shown in the figure), and the lines of the upper surface 101 are electrically connected to the terminals of the lower surface 102 . In addition, the lower surface 102 of the substrate 10 also has a plurality of electrical connection elements 80, wherein the electrical connection elements 80 on the lower surface 102 of the substrate 10 are solder balls, and the solder balls can be a C4 standard solder ball, Since the formation method and the function of the electrical connection element 80 are the same as those in the prior art, they are not the main technical features of the present invention, so they will not be described further. The first wafer 20 is a functional wafer, which has an active surface 201 and a back surface 202 , and the back surface 202 of the first wafer 20 is disposed on the upper surface 101 of the substrate 10 facing downward, and the active surface 201 of the first wafer 20 is configured with a A plurality of solder pads 90 . Next, using a wire bonding process, one end of the plurality of first metal wires 21 is electrically connected to the pads 90 on the active surface 201 of the first chip 20 , and the other end of the first metal wires 21 is electrically connected to the substrate 10 Electrical connection lines (not shown in the figure) on the upper surface 101 of the . Next, an adhesive layer 60 is provided, especially a FOW (Film Over Wire) adhesive that can embed metal components, and the adhesive layer 60 to form a colloidal state is covered and disposed on the active surface 201 of the first wafer 20, and the adhesive is allowed to form. The adhesive layer 60 in the state of the state coats the first metal wire 21 . Then, after the adhesive layer 60 is cured, the second wafer 30 is disposed on the adhesive layer 60 , wherein the second wafer 30 is a semiconductor die. Next, using a wire bonding process, one end of the plurality of second metal wires 31 is electrically connected to the pads 90 on the second chip 30 , and the other end of the second metal wires 31 is electrically connected to the upper surface 101 of the substrate 10 . the electrical connection circuit (not shown in the figure). In particular, in the present invention, the dummy chips 50 are respectively arranged on both sides of the first chip 20 and on the upper surface 101 of the substrate 10, when the maximum length of the first chip 20 and the second chip 30 is less than or equal to the package length When half of the time, the dummy wafers 50 are arranged on both sides of the first wafer 20 to balance the mold flow during molding and reduce the possibility of the warped area of the package body. Meanwhile, the height of the dummy chip 50 is equal to the height of the stacking of the first chip 20 , the adhesive layer 60 and the second chip 30 , and the dummy chip 50 may be a silicon chip. However, the material of the dummy chip 50 in the present invention is: is not restricted. Finally, the encapsulant is used to form the package body 70 , wherein the package body 70 is disposed above the substrate 10 and covers part of the upper surface 101 of the substrate 10 , the dummy chip 50 , the first metal wires 21 , and the second metal wires 31 and the second chip 30 to increase the stability of the overall multi-chip stack package structure.

上述所述者僅為本創作之較佳實施例,舉凡依本創作精神所作之等效修飾或變化,依照相同概念所提出之多晶片堆疊封裝結構的系統架構,皆應仍屬本創作涵蓋之範圍內。The above descriptions are only the preferred embodiments of the present invention. Any equivalent modifications or changes made in accordance with the spirit of the present invention, the system architecture of the multi-chip stacking package structure proposed in accordance with the same concept should still be covered by the present invention. within the range.

10:基板 20:第一晶片 21:第一金屬導線 30:第二晶片 31:第二金屬導線 40:第三晶片 41:第三金屬導線 50:假晶片 60:膠層 70:封裝體 80:電性連接元件 90:焊墊 101:上表面 102:下表面 201:主動面 202:背面 401:頂面 402:底面 501:正面 502:反面 10: Substrate 20: The first wafer 21: The first metal wire 30: Second wafer 31: Second metal wire 40: Third chip 41: The third metal wire 50: Fake Chip 60: Adhesive layer 70: Package body 80: Electrical connection components 90: Solder pad 101: Upper surface 102: Lower surface 201: Active side 202: Back 401: Top surface 402: Underside 501: Front 502: reverse

圖1 為根據本創作所揭露的技術,表示多晶片堆疊封裝結構的第一實施例示意圖。 圖2 為根據本創作所揭露的技術,表示多晶片堆疊封裝結構的第二實施例示意圖。 圖3 為根據本創作所揭露的技術,表示多晶片堆疊封裝結構的第三實施例示意圖。 FIG. 1 is a schematic diagram illustrating a first embodiment of a multi-chip stacked package structure according to the technology disclosed in the present invention. FIG. 2 is a schematic diagram illustrating a second embodiment of a multi-chip stacked package structure according to the technology disclosed in the present invention. FIG. 3 is a schematic diagram illustrating a third embodiment of a multi-chip stacked package structure according to the technology disclosed in the present invention.

10:基板 10: Substrate

20:第一晶片 20: The first wafer

21:第一金屬導線 21: The first metal wire

30:第二晶片 30: Second wafer

31:第二金屬導線 31: Second metal wire

50:假晶片 50: Fake Chip

60:膠層 60: Adhesive layer

70:封裝體 70: Package body

80:電性連接元件 80: Electrical connection components

90:焊墊 90: Solder pad

101:上表面 101: Upper surface

102:下表面 102: Lower surface

201:主動面 201: Active side

202:背面 202: Back

501:正面 501: Front

502:反面 502: reverse

Claims (7)

一種多晶片堆疊封裝結構,包含: 一基板,具有一上表面和一下表面; 一第一晶片,具有一主動面及一背面,該第一晶片的該背面朝下設置在該基板的該上表面上; 一第一金屬導線,分別電性連接該第一晶片的該主動面及該基板的該上表面上; 一假晶片,具有一正面及一反面,該假晶片的該反面朝下設置在該基板的該上表面上; 一膠層,設置於該第一晶片的該主動面及該假晶片的該正面上; 一第二晶片,設置在該膠層上,藉由該膠層使該第二晶片固定在該第一晶片的該主動面及該假晶片的該正面上; 一第二金屬導線,分別電性連接該第二晶片及該基板的該上表面上;以及 一封裝體,用以包覆該基板的部份該上表面、該第一金屬導線、該第二金屬導線及該第二晶片。 A multi-chip stacked package structure, comprising: a substrate having an upper surface and a lower surface; a first chip, having an active surface and a back surface, the back surface of the first chip is disposed on the upper surface of the substrate; a first metal wire electrically connected to the active surface of the first chip and the upper surface of the substrate respectively; a dummy chip with a front side and a back side, the back side of the dummy chip is disposed on the upper surface of the substrate; an adhesive layer disposed on the active surface of the first chip and the front surface of the dummy chip; a second chip, disposed on the adhesive layer, the second chip is fixed on the active surface of the first chip and the front surface of the dummy chip by the adhesive layer; a second metal wire electrically connected to the second chip and the upper surface of the substrate, respectively; and A package body is used for covering part of the upper surface of the substrate, the first metal wire, the second metal wire and the second chip. 一種多晶片堆疊封裝結構,包括: 一基板,具有一上表面和一下表面; 一第一晶片,具有一主動面及一背面,該第一晶片的該背面朝下設置在該基板的該上表面上; 一第一金屬導線,分別電性連接該第一晶片的該主動面及該基板的該上表面上; 一第三晶片,具有一頂面及一底面,該第三晶片的該底面朝下設置在該基板的該上表面上; 一第三金屬導線,分別電性連接該第三晶片的該頂面及該基板的該上表面上; 一假晶片,具有一正面及一反面,該假晶片的該反面朝下設置在該基板的該上表面上; 一膠層,設置於該第一晶片的該主動面、該第三晶片的該頂面及該假晶片的該正面上; 一第二晶片,設置在該膠層上,藉由該膠層使該第二晶片固定在該第一晶片的該主動面、該第三晶片的該頂面及該假晶片的該正面上; 一第二金屬導線,分別電性連接該第二晶片及該基板的該上表面上;以及 一封裝體,用以包覆該基板的部份該上表面、該第一金屬導線、該第二金屬導線、該第三金屬導線及該第二晶片。 A multi-die stacked package structure, comprising: a substrate having an upper surface and a lower surface; a first chip, having an active surface and a back surface, the back surface of the first chip is disposed on the upper surface of the substrate; a first metal wire electrically connected to the active surface of the first chip and the upper surface of the substrate respectively; a third wafer having a top surface and a bottom surface, the bottom surface of the third wafer is disposed on the upper surface of the substrate; a third metal wire electrically connected to the top surface of the third chip and the upper surface of the substrate respectively; a dummy chip with a front side and a back side, the back side of the dummy chip is disposed on the upper surface of the substrate; an adhesive layer disposed on the active surface of the first chip, the top surface of the third chip and the front surface of the dummy chip; a second chip, disposed on the adhesive layer, the second chip is fixed on the active surface of the first chip, the top surface of the third chip and the front surface of the dummy chip by the adhesive layer; a second metal wire electrically connected to the second chip and the upper surface of the substrate, respectively; and A package body is used for covering part of the upper surface of the substrate, the first metal wire, the second metal wire, the third metal wire and the second chip. 一種多晶片堆疊封裝結構,包括: 一基板,具有一上表面和一下表面; 一第一晶片,具有一主動面及一背面,該第一晶片的該背面朝下設置在該基板的該上表面上; 一第一金屬導線,分別電性連接該第一晶片的該主動面及該基板的該上表面上; 一膠層,設置於該第一晶片的該主動面上; 一第二晶片,設置在該膠層上,藉由該膠層使該第二晶片固定在該第一晶片的該主動面上; 一第二金屬導線,分別電性連接該第二晶片及該基板的該上表面上; 一假晶片,分別設置在該第一晶片的兩側及該基板的該上表面上;以及 一封裝體,用以包覆該基板的部份該上表面、該假晶片、該第一金屬導線、該第二金屬導線及該第二晶片。 A multi-die stacked package structure, comprising: a substrate having an upper surface and a lower surface; a first chip, having an active surface and a back surface, the back surface of the first chip is disposed on the upper surface of the substrate; a first metal wire electrically connected to the active surface of the first chip and the upper surface of the substrate respectively; an adhesive layer disposed on the active surface of the first chip; a second chip, disposed on the adhesive layer, the second chip is fixed on the active surface of the first chip by the adhesive layer; a second metal wire electrically connected to the second chip and the upper surface of the substrate respectively; a dummy wafer, respectively disposed on both sides of the first wafer and on the upper surface of the substrate; and A package body is used for covering part of the upper surface of the substrate, the dummy chip, the first metal wire, the second metal wire and the second chip. 如請求項1至3中之任一項所述的多晶片堆疊封裝結構,其中該第一晶片為一功能晶片以及該第二晶片為一半導體裸片。The multi-chip stack package structure of any one of claims 1 to 3, wherein the first chip is a functional chip and the second chip is a semiconductor die. 如請求項2所述的多晶片堆疊封裝結構,其中該第三晶片可為一功能晶片、一半導體裸片或是一假晶片。The multi-chip stack package structure of claim 2, wherein the third chip can be a functional chip, a semiconductor bare chip or a dummy chip. 如請求項1至3中之任一項所述的多晶片堆疊封裝結構,其中在該基板的該下表面上還具有多個電性連接元件。The multi-die stacked package structure according to any one of claims 1 to 3, wherein a plurality of electrical connection elements are further provided on the lower surface of the substrate. 如請求項6所述的多晶片堆疊封裝結構,其中該電性連接元件為錫球(solder ball)。The multi-chip stacked package structure of claim 6, wherein the electrical connection element is a solder ball.
TW111200980U 2022-01-25 2022-01-25 Multi-chip stacked package structure TWM627466U (en)

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