TWM623034U - Protection element of plasma device - Google Patents

Abstract

A protection element of a plasma device is provided. The protection element is mounted into a groove of an electrostatic chuck of the plasma device. The protection element having a ring shape comprises a primary sealing portion; wherein a side of the primary sealing portion toward the groove comprises a first edge, and the first edge is a chamfered edge. In addition, the primary sealing portion has a maximum width in radial direction and a thickness in axial direction; wherein the thickness in axial direction is larger than the vertical height of the groove; a ratio between the maximum width in radial direction and the thickness in axial direction ranges between 1:0.5 and 1:10.

Description

Protection element for plasma device

This creation is about a protective element of a plasma device, especially a replaceable sealing ring applied to the edge of the electrostatic adsorption plate in the plasma device.

In the current semiconductor manufacturing process, in order to form circuit patterns on the semiconductor, the wafer is often etched, and plasma etching is a fairly common etching process. The surface of the wafer is etched to form circuit patterns. Plasma devices generally include a plasma chamber and an electrostatic chuck (ESC) for carrying wafers in the plasma chamber. In a wafer etching process, the electrostatic adsorption plate is a device that uses electricity to generate electrostatic force. The electrostatic adsorption plate keeps the wafer in a fixed position in the plasma chamber, which can avoid physical properties of the wafer. The problem of wafer deformation caused by clamping. The electrostatic adsorption plate usually includes an upper element of a ceramic dielectric material, a connecting layer composed of a soft material, and a lower element. The upper element is connected by the connecting layer to the lower element as an electrode. The plasma device further includes an electrostatic The peripheral edge of the suction plate is used as an extension element for extending and carrying the wafer. Since the process plasma gas is etched from top to bottom, when the etching process is performed, the process plasma gas may erode the connection layer or the surface of the components near it through gaps, trenches, etc. By-products entering the plasma chamber contaminate the plasma chamber. In addition, the plasma gas may also damage the electrostatic adsorption plate, such damage usually includes (Micro-Arcing), leakage, electrode damage, abnormal voltage and gas leakage (such as helium) and other conditions , When the aforementioned situation occurs, it is often necessary to replace the entire set of electrostatic adsorption pads, which will not only affect the yield of the etching process and the loss of production capacity, but also cause huge cost losses.

In order to solve the aforementioned problems, the prior art usually fills the trenches with permanent fillers such as epoxy resin and silicon glue; however, the aforementioned permanent fillers will still be etched and worn by plasma gas; after long-term use, the aforementioned permanent fillers Not only does the permanent filler lose its protection to the trenches, but even debris from etching can contaminate the process. Furthermore, the effective period of the permanent filler is difficult to estimate, and it is difficult to remove after being corroded, so that the industry cannot regularly reinforce or replace it, which has a negative impact on the overall wafer process yield.

In view of the shortcomings and deficiencies of the prior art, the purpose of this creation is to provide a protective element that is easy to replace regularly, so that engineers can replace the protective element in time before the protective element is damaged and air leaks occur, so that the plasma device containing it can be replaced in time. The plasma etching process can be more stable and safe.

In order to achieve the above-mentioned purpose of creation, the technical means used in this creation is to provide a protection element for a plasma device, which is arranged in a plasma device; wherein, the plasma device includes an electrostatic adsorption support plate and the replaceable protection components. The electrostatic adsorption holding plate includes an upper element, a lower element and a connecting layer, the connecting layer connects the upper element and the lower element, and a side edge of the connecting layer and a part of the lower edge of the upper element and the lower part A part of the upper edge of the element together forms a groove. The protection element has an annular structure, which is arranged in the groove of the electrostatic adsorption support plate; the protection element includes: a main sealing part, the side of the main sealing part facing the groove has a first corner, The first corner is a chamfer; the main sealing portion has a radial maximum width and an axial thickness, the axial thickness is greater than the vertical height of the groove, and the radial maximum width and the The ratio of axial thickness is from 1:0.5 to 1:10. In the present invention, the axial thickness refers to the vertical thickness of the main sealing portion at the center point of the radial maximum width.

In the present invention, the thickness of the main sealing part in the axial direction (defined by the center point of the protection element, that is, the vertical direction) is greater than the vertical height of the groove, so that the main sealing part can closely adhere to the groove together to achieve the effect of sealing. At the same time, in the present invention, at least one corner (ie, the first corner) of the side of the main sealing portion facing the groove is designed to be chamfered, which is helpful for the protection element to be smoothly inserted into the groove when installing. In addition, the present invention considers the tightness of the protective element installed in the groove, and by limiting the ratio of the maximum radial width of the protective element to the axial thickness, the sealing performance between the protective element and the groove can be improved after the protective element is filled into the groove. tightness, and more suitable for grooves of various sizes. Accordingly, the protection element of the plasma device of the present invention can make the plasma etching process more stable and safe, thereby improving the product yield of the final product including the wafer.

In the present invention, the side of the main sealing portion facing the groove further has a second corner, and the second corner may be a right corner, a rounded corner or a chamfered corner, but not limited thereto. Preferably, the second corner is a chamfered corner. When the two corners (ie, the first corner and the second corner) of the side of the main sealing portion facing the groove are both chamfered, the protection element can be inserted into the groove more smoothly.

In some embodiments, the cross section of the main sealing portion is a trapezoid, and the trapezoid has an upper bottom edge and a lower bottom edge that are parallel to each other, and two opposite waistlines connecting the upper bottom edge and the lower bottom edge. . Wherein, the upper bottom edge is formed by the side (inside) of the main sealing portion facing the groove, and the lower bottom edge is formed by the side (outside) of the main sealing portion facing away from the groove . In some embodiments, the length of the upper base is greater than the length of the lower base, the length of the upper base is greater than the vertical height of the groove, and the length of the lower base is greater than or equal to the vertical height of the groove Height; preferably, the ratio of the length of the upper base to the length of the lower base is 1:0.85 to 1:0.95. Or, in other embodiments, the length of the upper base is less than the length of the lower base, the length of the upper base is greater than or equal to the vertical height of the groove, and the length of the lower base is greater than the groove. The vertical height of the groove; preferably, the ratio of the length of the upper base to the length of the lower base is 1:1.05 to 1:1.15.

Wherein, when the cross section of the main sealing part is a trapezoid, the bottom of the main sealing part can be on the horizontal plane of the same vertical height, or the top of the main sealing part can be on the horizontal plane of the same vertical height, or It is that the top and bottom of the main seal are not on the same vertical level. Preferably, the trapezoid of the cross section of the main sealing portion is an isosceles trapezoid, but not limited to this.

Preferably, the protection element may further include at least one convex portion protruding from the surface of the main sealing portion. Specifically, the protection element may further include a first outer convex portion protruding from the main sealing portion in the axial direction, and the first outer convex portion is connected with the upper side of the main sealing portion. In other embodiments, the protection element may further include a second outer convex portion protruding downward from the main sealing portion in the axial direction, and the second outer convex portion is connected to the lower side of the main sealing portion. In other embodiments, the protection element may have the first convex portion and the second convex portion at the same time, and in this case, the second convex portion and the first convex portion are located on opposite sides.

Preferably, the first outer convex portion and the second outer convex portion can be independently of a single wave crest type or a multiple wave crest type, but not limited thereto. Since the axial thickness of the main sealing portion is already greater than the vertical height of the groove, when the protective element has the first convex portion and/or the second convex portion, the height of the protective element in the vertical direction will be It will be larger than the height of the groove, although it will increase the frictional resistance between the protective element and the wall surface of the upper element and/or the lower element when the protective element is inserted into the groove, but the peak area of the convex part of the wave crest shape is not enough. Large, so it can still be installed smoothly, and based on the cusp sealing principle, the protective element can be more closely connected with the wall surface of the upper element and/or the lower element after installation, so the protective element can provide better protection effect .

In the present invention, the plasma device further includes an extension element, the extension element surrounds the upper element and the lower element of the electrostatic adsorption tray, and the inner side of the extension element and the outer side of the lower element maintain a distance. In some embodiments, the protection element may further include an extension part, the extension part is protruded from the main sealing part toward the side away from the groove direction (ie the side facing the extension element) and in the space; the extension has a maximum length in the radial direction that is less than or equal to the length of the space. The extension portion can make the total length of the protection element in the radial direction necessarily greater than the length of the groove in the radial direction. Therefore, the extension portion can provide better positioning effect of the protection element, and when the technician needs to replace it When used as a protective element in a plasma device, the protective element can also be easily removed.

When the maximum length of the extension portion in the radial direction is equal to the length of the spacing, the extension portion is in contact with the inner side of the extension element of the electrostatic adsorption holding plate. Since the extension part is located in the space, it also partially fills the gap between the electrostatic adsorption plate and the extension element to extend the protection range of the protection element, so that the protection element can better limit the drift of the extension element in the process, so that the extension The distance between the element and the electrostatic adsorption pad is kept the same, which further prevents the plasma gas from entering the trench through the side of the large gap caused by the drift of the extending element and causing damage to the connection layer.

In some embodiments, the extension portion may be formed by extending from the upper side and the lower side of the main sealing portion toward the middle; in other embodiments, the extension portion may be formed by extending outward from the upper side and the lower side of the main sealing portion. The protrusions are formed, but not limited thereto. In some embodiments, the cross-sectional shape of the extension part along the axial direction of the main sealing part may be triangular, circular arc, wavy (that is, composed of a plurality of circular arcs) or zigzag (that is, composed of a plurality of triangular shapes) consisting of), but not limited thereto.

Preferably, the ratio of the maximum radial width of the main sealing portion to the maximum length of the extension portion in the radial direction is 1:0.05 to 1:3, but not limited thereto.

In the present invention, the side of the main sealing portion facing away from the groove may be parallel or non-parallel to the axial direction of the protection element. For example, when the side of the main sealing portion facing away from the groove is parallel to the axial direction of the protection element, the cross-section of the main sealing portion may be approximately rectangular, but not limited thereto. When the side of the main sealing part facing away from the groove is not parallel to the axial direction of the protection element, it may extend obliquely from the upper side of the main sealing part to the direction close to the extension element to the direction close to the main sealing part. The lower side of the sealing part is connected, and it can also extend obliquely from the upper side of the main sealing part to the direction close to the groove to be connected with the lower side of the main sealing part. In addition, the side of the main sealing portion away from the groove can also be recessed inward (that is, in the direction of the groove), that is, from the cross-section of the main sealing portion, the side of the main sealing portion away from the groove It can be an arc, but not limited to this. Therefore, the radial minimum width of the main seal portion is smaller than the radial length of the groove.

In order to match the size of the groove to improve the tightness between the protection element and the groove, the ratio of the maximum radial width to the axial thickness of the main sealing portion can be adjusted according to the needs; for example, when the cross section of the groove is close to When the shape is square, preferably, the ratio of the radial maximum width to the axial thickness of the main sealing portion is 0.8:1 to 1:2; or, when the cross section of the groove is close to an elongated rectangle, preferably, the The ratio of the radial maximum width to the axial thickness of the primary seal is 1:2.5 to 1:7.5.

Preferably, the ratio of the maximum radial width of the main sealing portion to the length of the groove in the radial direction is 1:1.05 to 1:1.2, but not limited thereto.

Preferably, the ratio of the axial thickness of the main sealing portion to the vertical height of the groove is 1.02:1 to 1.15:1, but not limited thereto.

According to the present invention, all the components of the protection element may be integrally formed, or some components may be integrally formed with each other and then joined with other partial components. Preferably, the protection element is composed of the main sealing part, the first convex part and the second convex part, and the main sealing part, the first convex part and the second convex part are in the shape of the main sealing part, the first convex part and the second convex part. One-piece molding, this state belongs to all the components are one-piece molding. Alternatively, the protection element is composed of the main sealing part and the extension part, and the main sealing part and the extension part are integrally formed.

Preferably, the material of the protection element includes Fluoro-elastomer (FKM), Perfluoro-elastomer (FFKM) or Fluorosilicone Rubber (FVMQ), etc., but not limited thereto .

According to the present invention, the material of the upper element generally includes a ceramic dielectric material, but is not limited thereto. In addition, an electrode may be provided inside the upper element, and the material of the electrode is usually copper or tungsten, but not limited thereto.

According to the present invention, in addition to a fluid supply unit, a temperature control system can be arranged inside the lower element to stabilize the temperature of the electrostatic adsorption carrier, thereby preventing the temperature change of the electrostatic adsorption carrier from affecting the etching rate of the wafer. In addition, the working fluid supplied by the fluid supply unit is usually helium gas, but not limited thereto; the working fluid can transfer the thermal energy of the wafer, thereby adjusting the temperature of the wafer and controlling the etching rate.

In the following, please refer to the drawings and the exemplary embodiments of the present creation to further describe the technical means adopted by the present creation to achieve the predetermined purpose.

The protection element of the plasma device of the present invention can be applied to the plasma device 1 in the prior art as shown in FIG. 1A and FIG. 1B . The plasma device 1 includes an electrostatic adsorption tray 10 . The electrostatic suction tray 10 includes an upper element 11 , a lower element 12 , a bonding layer 13 and a fluid supply unit 14 . Wherein, the connection layer 13 connects the upper element 11 and the lower element 12 , and a groove 15 is formed on a side edge 131 of the connection layer 13 , a part of the lower edge 111 of the upper element and a part of the upper edge 121 of the lower element. , and the groove 15 is located between the upper element 11 and the lower element 12 . The upper element 11 can be used to carry a wafer W. The fluid supply unit 14 is disposed inside the lower element 12 and supplies the wafer W with a working fluid 141 (eg, helium) through the upper element 11 . In addition, the plasma device 1 further includes an extension element 20 , the extension element 20 surrounds the upper element 11 and the lower element 12 of the electrostatic adsorption holding plate 10 , and maintains a distance R between the inner side of the extension element 20 and the outer side of the lower element 12 , the distance R forms an annular gap, and the gap is connected with the channel (not shown) in the extension element 20 and can lead to the periphery of the extension element 20 . The process plasma gas 120 is etched from top to bottom. When a plasma etching process is performed, the process plasma gas 120 may erode the surface of the connecting layer 13 or its vicinity through the gaps and trenches 15 . Therefore, the plasma device 1 needs to dispose the protection element with the annular structure in the annular groove 15 of the electrostatic adsorption plate 10 to improve the stability and safety of the plasma etching process.

first embodiment

Please refer to FIG. 2 , FIG. 3A and FIG. 3B . FIG. 2 is a schematic top view of the protection element 30A according to the first embodiment of the present invention. As can be seen from FIG. 2 , the protection element 30A has an annular structure. The protection element 30A in FIG. 3A is a schematic diagram according to the cross-sectional structure shown by “BB section line” in FIG. 2 , and the protection element 30A is not inserted into the groove 15 of the electrostatic adsorption plate, and FIG. 3B shows It is a schematic diagram showing that the protection element 30A is completely inserted into the groove 15 of the electrostatic adsorption holding plate.

The protection element 30A includes a main sealing portion 31 , and the side of the main sealing portion 31 facing the groove 15 has a first corner 311 and a second corner 312 , the first corner 311 and the second corner 312 312 are all chamfers. In addition, the side of the main sealing portion 31 facing away from the groove 15 is parallel to the axial direction of the protection element 30A. Therefore, the cross-section of the main sealing portion 31 is approximately a rectangle.

Defined by the center point of the protective element 30A, in the radial direction of the protective element 30A, the main sealing portion 31 has a radial maximum width L ₁ ; and, in the axial direction of the protective element 30A, the The main seal portion 31 has an axial thickness H ₁ , and the axial thickness H ₁ refers to the vertical thickness of the main seal portion 31 at the center point (center) of the radial maximum width L ₁ . The axial thickness H ₁ is greater than the vertical height H _g of the groove 15 , and the ratio of the radial maximum width L ₁ of the main sealing portion 31 to the axial thickness H ₁ is 1:1.25. In addition, the ratio of the radial maximum width L ₁ of the main seal portion 31 to the length L _g of the groove 15 in the radial direction is 1:1.05.

Second Embodiment

Please refer to FIG. 4 . FIG. 4 is a schematic diagram illustrating that the protection element 30B of the second embodiment of the present invention is completely inserted into the groove 15 of the electrostatic adsorption support plate in FIG. 1B . The protection element 30B of the second embodiment may include the same parts as the protection element 30A of the first embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30B of the second embodiment and the protection element 30A of the first embodiment is: (1) the first corner 311 and Among the second corners 312 , only the first corner 311 is chamfered, and the second corner 312 is a right angle; wherein, the first corner 311 is the side of the protection element 30B facing the groove 15 and the protection element and (2) when not plugged into the groove 15 of the electrostatic adsorption plate, the ratio of the radial maximum width to the axial thickness of the main seal portion 31 is 1:4.5.

Third Embodiment

Please refer to FIGS. 5A and 5B . FIG. 5A is a schematic cross-sectional view of the protection element 30C of the third embodiment without being inserted into the trench 15 , and FIG. 5B is a broken view of the protection element 30C of the third embodiment completely inserted into the trench 15 . face diagram.

The protection element 30C of the third embodiment may include the same parts as the protection element 30B of the second embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30C of the third embodiment and the protection element 30B of the second embodiment is that the upper and lower sides of the main sealing portion 31 are respectively formed by upper and lower inclined surfaces, that is, the upper and lower sides are not parallel. That is to say, the cross-section of the main sealing portion 31 is about a trapezoid, and the trapezoid has an upper bottom edge (that is, the main sealing portion 31 is formed toward the inner side of the groove 15 ) and a lower bottom edge (that is, the main sealing portion 31 is formed toward the inner side of the groove 15 ) that are parallel to each other. The main sealing portion 31 is formed toward the outer side in the direction away from the groove 15 ), and two opposite waistlines connecting the upper and lower bottom edges. The length H ₂ of the upper base is greater than the length H ₃ of the lower base, the length H ₂ of the upper base is greater than the vertical height H _g of the groove 15 , and the length H ₃ of the lower base is equal to the vertical height of the groove 15 H _g , in addition, the ratio of the length H ₂ of the upper base and the length H ₃ of the lower base is 1.12:1.

Fourth Embodiment

Please refer to FIG. 6 . FIG. 6 is a schematic diagram of the protection element 30D according to the fourth embodiment of the present invention not being inserted into the groove 15 of the electrostatic adsorption support plate shown in FIG. 1B . The protection element 30D of the fourth embodiment may include the same parts as the protection element 30C of the third embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30D of the fourth embodiment and the protection element 30C of the third embodiment is that in the trapezoidal cross-section of the main sealing portion 31 , the trapezoid has an upper base and a lower base that are parallel to each other. The relative length relationship of the sides is different. In the protection element 30D of the fourth embodiment, the length H ₂ of the upper base is smaller than the length H ₃ of the lower base, and at the same time, the length H ₂ of the upper base is slightly larger than the vertical height H _g of the groove 15 , therefore, the lower The length H ₃ of the base must also be greater than the vertical height H _g of the groove 15 , and the ratio of the length H ₂ of the upper base to the length H ₃ of the lower base is 1:1.1.

Fifth Embodiment

Please refer to FIGS. 7A and 7B , FIG. 7A is a schematic cross-sectional view of the protection element 30E of the fifth embodiment not inserted into the groove 15 , and FIG. 7B is a broken view of the protection element 30E of the fifth embodiment completely inserted into the trench 15 . face diagram.

The protection element 30E of the fifth embodiment includes: a main sealing part 31 , a first convex part 32 and a second convex part 33 , the main sealing part 31 , the first convex part 32 and the second convex part 33 The system is integrally formed. The side of the main sealing portion 31 facing away from the groove 15 is parallel to the axial direction of the protection element 30E. Therefore, the cross-section of the main sealing portion 31 is approximately a rectangle; Among the first corners 311 and the second corners 312 on one side, only the first corner 311 is chamfered, and the second corner 312 is a right angle. The first convex portion 32 is connected to the upper side of the main sealing portion 31 , the second convex portion 33 is connected to the lower side of the main sealing portion 31 , and the first convex portion 32 is connected to the second convex portion 33 is located on the opposite side of the main seal portion 31 . Wherein, the first convex portion 32 and the second convex portion 33 are both in the form of single peaks.

In addition, the ratio of the maximum radial width L ₁ of the main seal portion 31 to the length L _g of the groove 15 in the radial direction is about 1:1.05, and the axial thickness H ₁ of the main seal portion 31 is larger than the groove 15 The vertical height H _g of 15 , the axial thickness H ₁ refers to the vertical thickness of the main seal portion 31 at the center point (center) of the radial maximum width L ₁ . In addition, the ratio of the radial maximum width L ₁ to the axial thickness H ₁ of the main seal portion 31 is 1:5.

Sixth Embodiment

Please refer to FIGS. 8A and 8B . FIG. 8A is a schematic cross-sectional view of the protection element 30F of the sixth embodiment that is not inserted into the groove 15 , and FIG. 8B is a broken view of the protection element 30F of the sixth embodiment completely inserted into the trench 15 . face diagram.

The protection element 30F of the sixth embodiment may include the same parts as the protection element 30E of the fifth embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30F of the sixth embodiment and the protection element 30E of the fifth embodiment is that the main sealing portion 31 of the protection element 30F of the sixth embodiment has a first corner on the side facing the groove 15 . 311 and a second corner 312 are both chamfered.

Seventh Embodiment

Please refer to FIG. 9 . FIG. 9 is a schematic cross-sectional view of the protection element 30G of the seventh embodiment that is not inserted into the groove 15 . The protection element 30G of the seventh embodiment may include the same parts as the protection element 30E of the fifth embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30G of the seventh embodiment and the protection element 30E of the fifth embodiment is that: (1) the first protruding portion 32 and the second protruding portion 33 of the protection element 30G are both in the form of multiple peaks, and more Specifically, the multiple peak patterns of the first convex portion 32 and the second convex portion 33 each have four peaks; and (2) the radial maximum width L ₁ and the axial thickness H ₁ of the main sealing portion 31 The ratio is 1:6.

Eighth Embodiment

Please refer to FIGS. 10A and 10B , FIG. 10A is a schematic cross-sectional view of the protection element 30H of the eighth embodiment without being inserted into the groove 15 , and FIG. 10B is a schematic diagram of the protection element 30H of the eighth embodiment disposed in the groove 15 . The protection element 30H of the eighth embodiment may include the same parts as the protection element 30B of the second embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30H of the eighth embodiment and the protection element 30B of the second embodiment is that the protection element 30H further includes an extension portion 34 .

Specifically, the protection element 30H of the eighth embodiment includes: a main sealing part 31 and an extension part 34 , and the extension part 34 is directed away from the groove 15 by the main sealing part 31 (that is, facing the extension element). 20), and is formed to protrude outward from the position between the upper and lower sides of the main sealing part 31 and is located in the distance R, and the cross-sectional shape of the extension part 34 along the axial direction of the main sealing part 31 is a triangle. Wherein, the main sealing part 31 and the extension part 34 are integrally formed. The side of the main sealing portion 31 facing away from the groove 15 is parallel to the axial direction of the protection element 30H. Therefore, the cross-section of the main sealing portion 31 is approximately a rectangle.

The maximum length L ₂ of the extension portion 34 in the radial direction is smaller than the length of the distance R; the ratio of the maximum radial width L ₁ of the main sealing portion 31 to the maximum length L ₂ of the extension portion 34 in the radial direction is 1:0.1.

Since the protection element 30H has the extension portion 34, the protection element 30H can better withstand the impact and erosion of the plasma gas, and can effectively prevent the plasma gas from entering the trench 15 through the distance R and causing damage to the connection layer 13; , since the maximum length L ₂ of the extending portion 34 in the radial direction is slightly smaller than the length of the distance R, it is advantageous to install the protection element 30H in the groove 15 .

Ninth Embodiment

Please refer to FIGS. 11A and 11B . FIG. 11A is a schematic cross-sectional view of the protection element 30I of the ninth embodiment that is not inserted into the groove 15 , and FIG. face diagram. The protection element 30I of the ninth embodiment may include the same parts as the protection element 30E of the fifth embodiment, and the same parts will be denoted by the same reference numerals and will not be described in detail. The main difference between the protection element 30I of the ninth embodiment and the protection element 30E of the fifth embodiment is that: (1) the side of the main sealing portion 31 of the protection element 30I facing away from the groove 15 is not parallel to the side of the protection element 30I. The axial direction; and (2) the ratio of the radial maximum width L ₁ to the axial thickness H ₁ of the main seal portion 31 is 1:4.3. More specifically, the side of the main sealing portion 31 away from the groove 15 is recessed inward (ie, in the direction of the groove 15 ), that is, from the cross-section of the main sealing portion 31 , the main sealing portion 31 is far away from the groove. One side of the groove 15 is a concave arc. Therefore, in the radial direction of the protection element 30I, the radial minimum width L ₃ of the main seal portion 31 is smaller than the radial length L _g of the groove 15 .

Although the present invention is disclosed above with the aforementioned preferred embodiments, it is not intended to limit the present invention. It should be understood that any person with ordinary knowledge in the technical field can make some changes, substitutions and modifications without departing from the spirit and scope of the present creation.

1: Plasma device 10: Electrostatic suction plate 11: Upper element 111: Lower edge of upper element 12: Lower element 121: Upper edge of lower element 13: Connection layer 131: Side edge 14: Fluid supply unit 141: Working fluid 15: Trench 20: Extension element 120: Process plasma gas 30A, 30B, 30C, 30D, 30E, 30F, 30G, 30H, 30I: Protection element 31: Main seal 311: First corner 312: Second corner 32 : first outer convex portion 33 : second outer convex portion 34 : extension portion A: enlarged portion H ₁ : axial thickness H ₂ : length H ₃ : length H _g : vertical height L ₁ : radial maximum width L ₂ : Maximum length L ₃ : radial minimum width L _g : length R: pitch W: wafer

1A is a schematic diagram of a plasma device; FIG. 1B is a schematic cross-sectional view of the enlarged portion A in FIG. 1A; FIG. 2 is a top view of the protection element of the plasma device according to the first embodiment; 3A is a schematic diagram of a cross-section of the protection element of the plasma device according to the first embodiment according to the section line B-B in FIG. 2, and is not inserted into the groove in FIG. 1B; 3B is a schematic cross-sectional view of the protection element of the plasma device according to the first embodiment completely inserted into the groove; FIG. 4 is a schematic cross-sectional view of the groove in FIG. 1B provided with the protection element of the plasma device according to the second embodiment; 5A is a schematic cross-sectional view of the plasma device according to the third embodiment when the protection element is not inserted into the groove; 5B is a schematic cross-sectional view of the protection element of the plasma device according to the third embodiment completely inserted into the groove; FIG. 6 is a schematic cross-sectional view of the fourth embodiment of the plasma device where the protection element is not inserted into the groove; 7A is a schematic cross-sectional view of the plasma device according to the fifth embodiment when the protection element is not inserted into the groove; 7B is a schematic cross-sectional view of the protective element of the plasma device according to the fifth embodiment completely inserted into the groove; 8A is a schematic cross-sectional view of the plasma device according to the sixth embodiment when the protection element is not inserted into the groove; 8B is a schematic cross-sectional view of the protection element of the plasma device according to the sixth embodiment completely inserted into the groove; FIG. 9 is a schematic cross-sectional view of the plasma device of the seventh embodiment when the protection element is not inserted into the groove; FIG. 10A is a schematic cross-sectional view of the plasma device of the eighth embodiment when the protection element is not inserted into the groove; FIG. 10B is a schematic diagram illustrating that the protection element of the plasma device according to the eighth embodiment is disposed in the trench; 11A is a schematic cross-sectional view of the plasma device according to the ninth embodiment when the protection element is not inserted into the groove; 11B is a schematic cross-sectional view of the protection element of the plasma device according to the ninth embodiment completely inserted into the groove.

11: Upper element

12: Lower element

13: Link Layer

15: Groove

30A: Protection element

31: Main seal

311: First corner

312: Second corner

H ₁ : Axial thickness

H _g : vertical height

L ₁ : radial maximum width

L _g : length

Claims (23)

A protection element of a plasma device, which is arranged in a plasma device; wherein, the plasma device comprises an electrostatic adsorption support plate and the replaceable protection element; The electrostatic adsorption holding plate includes an upper element, a lower element and a connecting layer, the connecting layer connects the upper element and the lower element, and a side edge of the connecting layer and a part of the lower edge of the upper element and the lower part A part of the upper edge of the element together forms a groove; The protection element has an annular structure, which is arranged in the groove of the electrostatic adsorption support plate; the protection element includes: a main sealing part, the side of the main sealing part facing the groove has a first corner, the first corner is a chamfer; the main sealing part has a radial maximum width and an axial thickness, the The axial thickness is greater than the vertical height of the groove, and the ratio of the radial maximum width to the axial thickness is between 1:0.5 and 1:10. The protection element of the plasma device according to claim 1, wherein the side of the main sealing portion facing the groove further has a second corner, and the second corner is a chamfered corner. The protection element for a plasma device according to claim 1, wherein the cross section of the main sealing portion is a trapezoid, and the trapezoid has an upper bottom edge and a lower bottom edge that are parallel to each other and connect the upper bottom edge and the The opposite waistlines of the lower bottom edge; wherein, the upper bottom edge is formed by the side of the main sealing portion facing the groove, the length of the upper bottom edge is greater than the length of the lower bottom edge, and the length of the upper bottom edge is greater than the vertical height of the groove, and the length of the lower base is greater than or equal to the vertical height of the groove. The protection element for a plasma device according to claim 1, wherein the cross section of the main sealing portion is a trapezoid, and the trapezoid has an upper bottom edge and a lower bottom edge that are parallel to each other and connect the upper bottom edge and the The two opposite waistlines of the lower bottom edge; wherein, the upper bottom edge is formed by the side of the main sealing portion facing the groove, the length of the upper bottom edge is less than the length of the lower bottom edge, and the length of the upper bottom edge is greater than or equal to the vertical height of the groove, and the length of the lower base is greater than the vertical height of the groove. The protection element for a plasma device as claimed in claim 1, wherein the protection element further comprises a first protruding portion, and the first protruding portion is connected to the upper side of the main sealing portion. The protection element of a plasma device as claimed in claim 5, wherein the protection element further comprises a second outer convex portion, the second outer convex portion is connected to the lower side of the main sealing portion, and is connected to the first outer convex portion. The convex portion is on the opposite side. The protection element of a plasma device as claimed in claim 2, wherein the protection element further comprises a first convex portion; the first convex portion is connected to the upper side of the main sealing portion. The protection element of a plasma device according to claim 7, wherein the protection element further comprises a second outer convex portion; the second outer convex portion is connected to the lower side of the main sealing portion, and is connected to the first outer convex portion. The convex portion is on the opposite side. The protection element for a plasma device according to any one of claims 5 to 8, wherein the first convex portion is of a single wave peak type. The protection element of a plasma device according to any one of claims 5 to 8, wherein the first convex portion is in the form of multiple peaks. The protection element for a plasma device as claimed in claim 6 or 8, wherein the second convex portion is a single wave peak type. The protection element for a plasma device according to claim 6 or 8, wherein the second convex portion is in the form of multiple peaks. The protection element for a plasma device as claimed in claim 11, wherein the first convex portion is a single wave peak type. The protection element for a plasma device according to claim 11, wherein the first convex portion is in the form of multiple peaks. The protection element for a plasma device as claimed in claim 12, wherein the first convex portion is a single wave peak type. The protection element for a plasma device as claimed in claim 12, wherein the first convex portion is in the form of multiple peaks. The protection element for a plasma device as claimed in claim 1, wherein the plasma device further comprises an extension element, the extension element surrounds the upper element and the lower element of the electrostatic adsorption tray, and the inner side of the extension element maintaining a distance with the outer side of the lower element; wherein, the protection element further has an extension part, the extension part is protruded from the main sealing part toward the side away from the groove direction and located in the distance; the The maximum length of the extension in the radial direction is less than or equal to the length of the spacing. The protection element for a plasma device as claimed in claim 17, wherein the protection element further comprises a first convex portion, the first convex portion is connected to the upper side of the main sealing portion; the first convex portion is Single peak pattern or multiple peak pattern. The protection element for a plasma device as claimed in claim 18, wherein the protection element further comprises a second outer convex portion, the second outer convex portion is connected to the lower side of the main sealing portion, and is connected to the first outer convex portion. The convex portion is located on the opposite side; the second outer convex portion is in the form of a single crest or a form of multiple crests. The protection element for a plasma device according to any one of claims 1 to 8, wherein the ratio of the radial maximum width of the main sealing portion to the length of the groove in the radial direction is 1:1.05 to 1: 1.2. The protection element for a plasma device as claimed in claim 1, wherein a side of the main sealing portion away from the groove is inwardly recessed; the main sealing portion has a radial minimum width that is smaller than that of the groove The length of the groove in the radial direction. The protection element for a plasma device as claimed in claim 21, wherein the protection element further comprises a first protruding portion, the first protruding portion is connected to the upper side of the main sealing portion; the first protruding portion is Single peak pattern or multiple peak pattern. The protection element for a plasma device as claimed in claim 22, wherein the protection element further comprises a second outer convex portion, the second outer convex portion is connected to the lower side of the main sealing portion, and is connected to the first outer convex portion. The convex portion is located on the opposite side; the second outer convex portion is in the form of a single crest or a form of multiple crests.

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