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TWM674193U - Display panel - Google Patents

Display panel

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Publication number
TWM674193U
TWM674193U TW114202745U TW114202745U TWM674193U TW M674193 U TWM674193 U TW M674193U TW 114202745 U TW114202745 U TW 114202745U TW 114202745 U TW114202745 U TW 114202745U TW M674193 U TWM674193 U TW M674193U
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TW
Taiwan
Prior art keywords
layer
display panel
substrate
electrode
liquid crystal
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TW114202745U
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Chinese (zh)
Inventor
邱靖雅
羅祈恩
陳映蓉
張少謙
高翎誌
葉政諺
Original Assignee
瀚宇彩晶股份有限公司
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Application filed by 瀚宇彩晶股份有限公司 filed Critical 瀚宇彩晶股份有限公司
Priority to TW114202745U priority Critical patent/TWM674193U/en
Publication of TWM674193U publication Critical patent/TWM674193U/en

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Abstract

A display panel including a first substrate, a second substrate, a liquid crystal layer, a pixel structure and a filter pattern is provided. The first substrate and the second substrate are arranged opposite to each other. The pixel structure is disposed on the first substrate and is provided with a reflective area and a transmissive area. The pixel structure includes an active device, a pixel electrode and a reflective layer. The pixel electrode is disposed in the transmissive area and electrically connected to the active device. The reflective layer is disposed in the reflective area and overlaps the pixel electrode. The filter pattern is disposed on the second substrate and overlaps the pixel structure. The filter pattern includes a first filter portion and a second filter portion. The first filter portion is located in the reflective area and overlaps the reflective layer. The second filter portion is located in the transmissive area and overlaps the pixel electrode. A first thickness of the first filter portion is different from a second thickness of the second filter portion.

Description

顯示面板Display Panel

本新型創作是有關於一種顯示技術,且特別是有關於一種顯示面板。 This novel invention relates to a display technology, and in particular to a display panel.

由於半穿反式(或微穿反式)顯示面板在室內外都能保持良好的可讀性且具備節能特性,在市場上佔有一席之地。在現有的技術架構中,顯示畫素須具備反射區與穿透區來因應環境光不足或過多時的顯示需求。一般而言,反射區與穿透區都設有色阻層來達到彩色顯示的效果。然而,色阻層的厚度設計卻無法同時滿足反射區與穿透區的顯示需求。舉例來說,為了提升穿透區的光穿透率而減薄色阻層的厚度,但此舉會降低反射區的色飽和度。反之,為了提升反射區的色飽和度而增加色阻層的厚度,則會同時降低穿透區的光穿透率。 Semi-transflective (or micro-transflective) display panels have gained a significant market share due to their excellent readability both indoors and outdoors and their energy-saving properties. In existing technology architectures, display pixels must have both reflective and transmissive areas to accommodate display requirements in environments with insufficient or excessive ambient light. Typically, both the reflective and transmissive areas are coated with a color resist layer to achieve color display. However, the thickness of the color resist layer cannot meet the display requirements of both the reflective and transmissive areas simultaneously. For example, reducing the color resist layer thickness to increase light transmittance in the transmissive area will reduce the color saturation in the reflective area. Conversely, increasing the color resist layer thickness to increase color saturation in the reflective area will also reduce light transmittance in the transmissive area.

本新型創作提供一種顯示面板,其在反射區與穿透區內的光學特性可個別地調整,有助於提升整體光學表現的設計彈性。 This novel invention provides a display panel whose optical properties in the reflective and transmissive areas can be individually adjusted, helping to enhance the design flexibility of the overall optical performance.

本新型創作的顯示面板,包括第一基板、第二基板、液晶層、畫素結構與濾光圖案。第一基板與第二基板彼此相對設置。畫素結構設置在第一基板上,且設有反射區與穿透區。畫素結構包括主動元件、畫素電極與反射層。畫素電極設置在穿透區,且電性連接主動元件。反射層設置在反射區,且重疊於畫素電極。濾光圖案設置在第二基板上,且重疊於畫素結構。濾光圖案包括第一濾光部分與第二濾光部分。第一濾光部分位於反射區內且重疊於反射層。第二濾光部分位於穿透區內且重疊於畫素電極。第一濾光部分的一第一厚度不同於第二濾光部分的一第二厚度。 The display panel of the present invention includes a first substrate, a second substrate, a liquid crystal layer, a pixel structure and a filter pattern. The first substrate and the second substrate are arranged opposite to each other. The pixel structure is arranged on the first substrate and is provided with a reflective area and a transmissive area. The pixel structure includes an active element, a pixel electrode and a reflective layer. The pixel electrode is arranged in the transmissive area and is electrically connected to the active element. The reflective layer is arranged in the reflective area and overlaps with the pixel electrode. The filter pattern is arranged on the second substrate and overlaps with the pixel structure. The filter pattern includes a first filter portion and a second filter portion. The first filter portion is located in the reflective area and overlaps with the reflective layer. The second filter portion is located in the transmissive area and overlaps with the pixel electrode. A first thickness of the first filter portion is different from a second thickness of the second filter portion.

在本新型創作的一實施例中,上述的顯示面板的第一濾光部分的第一厚度大於第二濾光部分的第二厚度。 In one embodiment of the present invention, the first thickness of the first light filtering portion of the display panel is greater than the second thickness of the second light filtering portion.

在本新型創作的一實施例中,上述的顯示面板的液晶層具有位於反射區內的第一部分以及位於穿透區內的第二部分。第一部分與第二部分分別具有第一液晶厚度與第二液晶厚度。第一液晶厚度小於第二液晶厚度。 In one embodiment of the present invention, the liquid crystal layer of the display panel has a first portion located in the reflective region and a second portion located in the transmissive region. The first portion and the second portion have a first liquid crystal thickness and a second liquid crystal thickness, respectively. The first liquid crystal thickness is less than the second liquid crystal thickness.

在本新型創作的一實施例中,上述的顯示面板的第二液晶厚度對第一液晶厚度的比值大於或等於1.1且小於或等於2.2。 In one embodiment of the present invention, the ratio of the second liquid crystal thickness to the first liquid crystal thickness of the display panel is greater than or equal to 1.1 and less than or equal to 2.2.

在本新型創作的一實施例中,上述的顯示面板還包括披覆層與共電極層。披覆層設置在第二基板上,且位於液晶層與濾光圖案之間。披覆層具有位於穿透區內的開口。共電極層設置在披覆層上,且位於披覆層與液晶層之間。共電極層延伸至披覆層的開口內。 In one embodiment of the present invention, the display panel further includes a cover layer and a common electrode layer. The cover layer is disposed on the second substrate and is located between the liquid crystal layer and the light filter pattern. The cover layer has an opening within the transmissive region. The common electrode layer is disposed on the cover layer and is located between the cover layer and the liquid crystal layer. The common electrode layer extends into the opening of the cover layer.

在本新型創作的一實施例中,上述的顯示面板的開口貫穿披覆層。 In one embodiment of this novel invention, the opening of the display panel passes through the cover layer.

在本新型創作的一實施例中,上述的顯示面板的畫素電極還設置在反射區內,並且電性連接反射層。 In one embodiment of this novel invention, the pixel electrodes of the display panel are further disposed within the reflective region and are electrically connected to the reflective layer.

在本新型創作的一實施例中,上述的顯示面板的畫素結構還包括電容電極與共電極。電容電極位於反射區內,且電性連接主動元件與畫素電極。共電極位於反射區內。共電極重疊於電容電極,且位在第一基板與電容電極之間。電容電極與共電極電性耦合並形成儲存電容。 In one embodiment of the present invention, the pixel structure of the display panel further includes a capacitor electrode and a common electrode. The capacitor electrode is located within the reflective region and electrically connects the active element and the pixel electrode. The common electrode is also located within the reflective region. The common electrode overlaps the capacitor electrode and is located between the first substrate and the capacitor electrode. The capacitor electrode and the common electrode are electrically coupled to form a storage capacitor.

在本新型創作的一實施例中,上述的顯示面板還包括披覆層,設置在畫素電極與第一基板之間,且覆蓋主動元件與電容電極。披覆層具有位於反射區內的開口。畫素電極經由披覆層的開口電性連接電容電極。 In one embodiment of the present invention, the display panel further includes a cover layer disposed between the pixel electrode and the first substrate, covering the active element and the capacitor electrode. The cover layer has an opening within the reflective region. The pixel electrode is electrically connected to the capacitor electrode via the opening in the cover layer.

在本新型創作的一實施例中,上述的顯示面板還包括第一鈍化層與第二鈍化層。第一鈍化層設置在披覆層與主動元件之間。第二鈍化層設置在披覆層與畫素電極之間。第一鈍化層與第二鈍化層具有重疊於披覆層的開口的接觸孔。畫素電極還經由第一鈍化層與第二鈍化層的接觸孔電性連接電容電極。 In one embodiment of the present invention, the display panel further includes a first passivation layer and a second passivation layer. The first passivation layer is disposed between the cover layer and the active element. The second passivation layer is disposed between the cover layer and the pixel electrode. The first and second passivation layers have contact holes that overlap with the openings in the cover layer. The pixel electrode is also electrically connected to the capacitor electrode through the contact holes in the first and second passivation layers.

基於上述,在本新型創作的一實施例的顯示面板中,畫素結構的反射區與穿透區設有濾光圖案。透過濾光圖案在反射區內的第一濾光部分的厚度不同於其在穿透區內的第二濾光部分的厚度,可增加顯示面板的光學特性在穿透區與反射區內個別調整的 彈性。 Based on the above, in one embodiment of the display panel of this novel invention, light-filtering patterns are provided in both the reflective and transmissive regions of the pixel structure. The thickness of the first light-filtering portion of the light-filtering pattern in the reflective region is different from the thickness of the second light-filtering portion in the transmissive region. This increases the flexibility of adjusting the optical properties of the display panel independently in the transmissive and reflective regions.

10:顯示面板 10: Display Panel

100:第一基板 100: First substrate

110:絕緣層 110: Insulating layer

121:第一鈍化層 121: First passivation layer

122:第二鈍化層 122: Second passivation layer

130、220:披覆層 130, 220: Covering layer

130op、220op:開口 130op, 220op: Opening

200:第二基板 200: Second substrate

210:濾光圖案 210: Light filter pattern

210p1:第一濾光部分 210p1: First filter section

210p2:第二濾光部分 210p2: Second filter section

210t1、210t2:厚度 210t1, 210t2: Thickness

AL:環境光 AL: Ambient Light

CE:共電極 CE: Common Electrode

CEL:共電極層 CEL: Common Electrode Layer

CL:共電極連接線 CL: Common electrode connection line

CPE:電容電極 CPE: Capacitor Electrode

Cst:儲存電容 Cst: Storage capacitor

DE:汲極 DE: Drain

DL:資料線 DL: Data Line

GE:閘極 GE: Gate

LCL、LCL-A:液晶層 LCL, LCL-A: Liquid Crystal Layer

LCLp1:第一部分 LCLp1: Part 1

LCLp2:第二部分 LCLp2: Part 2

LCt1、LCt2:液晶厚度 LCt1, LCt2: Liquid crystal thickness

PE:畫素電極 PE: Pixel electrode

PX:畫素結構 PX: Pixel structure

RA:反射區 RA: Reflex area

RL:反射層 RL: Reflective layer

REL:反射光 REL: Reflected Light

SC:半導體圖案 SC: semiconductor pattern

SE:源極 SE: source

SL:掃描線 SL: Scan Line

T:主動元件 T: Active element

TA:穿透區 TA: Penetration Zone

TH:接觸孔 TH: Contact hole

TL:穿透光 TL: Penetrating Light

X、Y、Z:方向 X, Y, Z: Direction

A-A’:剖線 A-A’: section line

圖1是依照本新型創作的第一實施例的顯示面板的正視示意圖。 Figure 1 is a schematic front view of a display panel according to the first embodiment of this novel invention.

圖2是圖1的顯示面板的剖視示意圖。 Figure 2 is a schematic cross-sectional view of the display panel of Figure 1.

圖3是依照本新型創作的第二實施例的顯示面板的剖視示意圖。 Figure 3 is a schematic cross-sectional view of a display panel according to a second embodiment of the present invention.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」可為二元件間存在其它元件。 In the accompanying drawings, the thickness of layers, films, panels, regions, etc., is exaggerated for clarity. It should be understood that when an element, such as a layer, film, region, or substrate, is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or intervening elements may be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" can refer to physical and/or electrical connections. Furthermore, "electrically connected" can mean the presence of other elements between two elements.

現將詳細地參考本新型創作的示範性實施例,示範性實施例的實例說明於所附圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。 Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals are used in the drawings and the description to refer to the same or like parts.

圖1是依照本新型創作的第一實施例的顯示面板的正視 示意圖。圖2是圖1的顯示面板的剖視示意圖。圖2對應於圖1的剖線A-A’處。為清楚呈現起見,圖1僅繪示出圖2中的部分膜層。 Figure 1 is a schematic front view of a display panel according to the first embodiment of this novel invention. Figure 2 is a schematic cross-sectional view of the display panel in Figure 1 . Figure 2 corresponds to section line A-A' in Figure 1 . For clarity, Figure 1 only illustrates a portion of the film layers in Figure 2 .

請參照圖1及圖2,顯示面板10包括第一基板100、第二基板200和液晶層LCL。液晶層LCL設置在第一基板100與第二基板200之間。亦即,本實施例的顯示面板10為液晶顯示面板。 Referring to Figures 1 and 2 , the display panel 10 includes a first substrate 100, a second substrate 200, and a liquid crystal layer (LCL). The liquid crystal layer (LCL) is disposed between the first substrate 100 and the second substrate 200. In other words, the display panel 10 of this embodiment is a liquid crystal display panel.

進一步地,第一基板100上可設有多條掃描線SL、多條資料線DL和多個畫素結構PX。畫素結構PX電性連接至一條掃描線SL和一條資料線DL。需說明的是,雖然圖1僅繪示出顯示面板10的一個顯示單元(包含一個畫素結構PX),但顯示面板10可由多個所述顯示單元排列而成。舉例來說,多條資料線DL可沿著方向X排列並且各自在方向Y上延伸,多條掃描線SL可沿著方向Y排列並且各自在方向X上延伸,其中方向X不平行於方向Y。方向X可選擇性地垂直於方向Y,但不以此為限。多個畫素結構PX可分別沿著方向X和方向Y排成多行與多列。 Furthermore, the first substrate 100 may be provided with a plurality of scan lines SL, a plurality of data lines DL, and a plurality of pixel structures PX. The pixel structure PX is electrically connected to one scan line SL and one data line DL. It should be noted that although FIG1 only illustrates one display unit (including one pixel structure PX) of the display panel 10, the display panel 10 may be composed of a plurality of such display units. For example, the plurality of data lines DL may be arranged along direction X and each extend in direction Y, and the plurality of scan lines SL may be arranged along direction Y and each extend in direction X, wherein direction X is not parallel to direction Y. Direction X may optionally be perpendicular to direction Y, but is not limited thereto. The plurality of pixel structures PX may be arranged in a plurality of rows and a plurality of columns along directions X and Y, respectively.

畫素結構PX包括主動元件T、共電極CE、電容電極CPE和畫素電極PE。主動元件T具有源極SE、汲極DE、閘極GE和半導體圖案SC。半導體圖案SC的材料可包括非晶矽半導體、單晶矽半導體、多晶矽半導體、或金屬氧化物半導體。源極SE和汲極DE分別電性連接半導體圖案SC的不同兩區。在一些實施例中,源極SE與半導體圖案SC之間以及汲極DE與半導體圖案SC之間還可具有歐姆接觸層(未繪示),且歐姆接觸層的材料例如包括 摻雜的半導體層,但不以此為限。 The pixel structure PX includes an active device T, a common electrode CE, a capacitor electrode CPE, and a pixel electrode PE. The active device T has a source electrode SE, a drain electrode DE, a gate electrode GE, and a semiconductor pattern SC. The semiconductor pattern SC may be made of amorphous silicon, single-crystal silicon, polycrystalline silicon, or a metal oxide semiconductor. The source electrode SE and the drain electrode DE electrically connect two different regions of the semiconductor pattern SC. In some embodiments, ohmic contact layers (not shown) may be provided between the source electrode SE and the semiconductor pattern SC, and between the drain electrode DE and the semiconductor pattern SC. The material of the ohmic contact layers may include, but is not limited to, a doped semiconductor layer.

源極SE電性連接至對應的一條資料線DL。汲極DE電性連接至電容電極CPE。閘極GE電性連接至對應的一條掃描線SL。更具體地,在本實施例中,掃描線SL對應畫素結構PX延伸出的部分可作為主動元件T的閘極GE,而資料線DL對應畫素結構PX延伸出的部分可作為主動元件T的源極SE。電容電極CPE自汲極DE延伸出,並且電性連接畫素電極PE。 The source electrode SE is electrically connected to a corresponding data line DL. The drain electrode DE is electrically connected to the capacitor electrode CPE. The gate electrode GE is electrically connected to a corresponding scan line SL. More specifically, in this embodiment, the portion of the scan line SL extending from the pixel structure PX serves as the gate electrode GE of the active device T, while the portion of the data line DL extending from the pixel structure PX serves as the source electrode SE of the active device T. The capacitor electrode CPE extends from the drain electrode DE and is electrically connected to the pixel electrode PE.

主動元件T例如是非晶矽薄膜電晶體(amorphous silicon thin film transistor,a-Si TFT)、多晶矽薄膜電晶體(polycrystalline silicon TFT,poly-Si TFT)或金屬氧化物半導體薄膜電晶體(metal oxide semiconductor TFT)。在本實施例中,閘極GE可選擇性地設置在半導體圖案SC的下方,以形成底部閘極型薄膜電晶體(bottom-gate thin-film-transistor),但不以此為限。在其他實施例中,閘極GE也可設置在半導體圖案SC的上方,以形成頂部閘極型薄膜電晶體(top-gate thin-film-transistor)。 The active element T is, for example, an amorphous silicon thin film transistor (a-Si TFT), a polycrystalline silicon thin film transistor (poly-Si TFT), or a metal oxide semiconductor thin film transistor (MTT). In this embodiment, the gate electrode GE may be selectively disposed below the semiconductor pattern SC to form a bottom-gate thin film transistor, but the present invention is not limited thereto. In other embodiments, the gate electrode GE may also be disposed above the semiconductor pattern SC to form a top-gate thin film transistor.

在本實施例中,畫素電極PE為光穿透式電極,而光穿透式電極的材料例如包括金屬氧化物,例如:銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、或其它合適的氧化物、或者是上述至少兩者之堆疊層。基於導電性的考量,掃描線SL、資料線DL、電容電極CPE、共電極CE以及主動元件T的源極SE、汲極DE與閘極GE一般是選用金屬材料製作而成,但不以此為限。 In this embodiment, the pixel electrode PE is a light-transmitting electrode. The material of the light-transmitting electrode includes, for example, a metal oxide, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, or other suitable oxides, or a stack of at least two of the above. Based on conductivity considerations, the scan lines SL, data lines DL, capacitor electrodes CPE, common electrodes CE, and the source SE, drain DE, and gate GE of the active device T are generally made of metal materials, but are not limited to such materials.

共電極CE設置在電容電極CPE與第一基板100之間, 並且沿著方向Z重疊於電容電極CPE。以下若未特別提及,則兩構件之間的重疊關係都是以方向Z來界定,便不再贅述其重疊方向。先說明的是,共電極CE可電性耦合至電容電極CPE並形成儲存電容Cst。更具體地,儲存電容Cst是由共電極CE、電容電極CPE以及位於共電極CE與電容電極CPE之間的絕緣層110形成。在本實施例中,沿著方向X排列的相鄰兩個畫素結構PX的共電極CE可經由共電極連接線CL彼此電性連接,但不以此為限。 The common electrode CE is disposed between the capacitor electrode CPE and the first substrate 100, overlapping the capacitor electrode CPE along direction Z. Unless otherwise specified, the overlapping relationship between the two components is defined along direction Z, and the overlapping direction will not be further discussed. Initially, the common electrode CE can be electrically coupled to the capacitor electrode CPE to form a storage capacitor Cst. More specifically, the storage capacitor Cst is formed by the common electrode CE, the capacitor electrode CPE, and the insulating layer 110 located between the common electrode CE and the capacitor electrode CPE. In this embodiment, the common electrodes CE of two adjacent pixel structures PX arranged along direction X can be electrically connected to each other via a common electrode connection line CL, but this is not limited to this embodiment.

先說明的是,在本實施例中,畫素結構PX可具有反射區RA和穿透區TA。畫素結構PX還可包括位於反射區RA內的反射層RL,且反射層RL重疊並且電性連接畫素電極PE。圖2是以畫素電極PE的一部分位於反射層RL與第一基板100之間為例示,但不以此為限。在其他實施例中,反射層RL可位於畫素電極PE的一部分與第一基板100之間,且反射層RL與畫素電極PE彼此電性連接。畫素電極PE的一部分在反射區RA中與反射層RL相重疊,而另一部分位於穿透區TA內。 First, it should be noted that in this embodiment, the pixel structure PX may have a reflective area RA and a transmissive area TA. The pixel structure PX may also include a reflective layer RL located within the reflective area RA, overlapping and electrically connected to the pixel electrode PE. Figure 2 illustrates a case where a portion of the pixel electrode PE is located between the reflective layer RL and the first substrate 100, but this is not limiting. In other embodiments, the reflective layer RL may be located between a portion of the pixel electrode PE and the first substrate 100, with the reflective layer RL and the pixel electrode PE being electrically connected to each other. A portion of the pixel electrode PE may overlap with the reflective layer RL in the reflective area RA, while another portion may be located within the transmissive area TA.

從另一觀點來說,畫素結構PX的反射區RA可由反射層RL的分布範圍來界定,而畫素電極PE未重疊於反射層RL、資料線DL與掃描線SL的部分可定義出畫素結構PX的穿透區TA(如圖1所示)。在顯示面板10顯示畫面時,位於反射區RA中的反射層RL可將環境光AL反射形成反射光REL以顯示對應的畫面,而在環境光不足的情況下,可開啟背光模組(圖2未示)做為輔助光源,且背光模組的光線可穿透畫素電極PE位於穿透區TA內的 部分形成穿透光TL以顯示對應的畫面。也就是說,本實施例的顯示面板10可以是半穿反(transflective)式顯示面板。 From another perspective, the reflective area RA of the pixel structure PX can be defined by the distribution range of the reflective layer RL, while the portion of the pixel electrode PE that does not overlap the reflective layer RL, data lines DL, and scan lines SL defines the transmissive area TA of the pixel structure PX (as shown in Figure 1). When the display panel 10 displays an image, the reflective layer RL located in the reflective area RA reflects ambient light AL to form reflected light REL, thereby displaying the corresponding image. In the event of insufficient ambient light, a backlight module (not shown in Figure 2) can be activated as an auxiliary light source. Light from the backlight module can then pass through the portion of the pixel electrode PE located within the transmissive area TA to form transmitted light TL, thereby displaying the corresponding image. In other words, the display panel 10 of this embodiment can be a semi-transflective display panel.

詳細地,顯示面板10還可包括第一鈍化層121、第二鈍化層122與披覆層130。第一鈍化層121設置在電容電極CPE與畫素電極PE之間,且覆蓋電容電極CPE以及主動元件T的源極SE與汲極DE。披覆層130設置在第一鈍化層121與第二鈍化層122之間。披覆層130可做為平坦層,以降低設置於披覆層130與第一基板100之間的膜層的不平整度,也就是披覆層130的上表面(即披覆層130的背對第一基板100的表面)的不平整度小於第一鈍化層121的上表面(即第一鈍化層121的背對第一基板100的表面)的不平整度。 Specifically, the display panel 10 may further include a first passivation layer 121, a second passivation layer 122, and a capping layer 130. The first passivation layer 121 is disposed between the capacitor electrode CPE and the pixel electrode PE, and covers the capacitor electrode CPE as well as the source SE and drain DE of the active device T. The capping layer 130 is disposed between the first passivation layer 121 and the second passivation layer 122. The cover layer 130 can serve as a planarizing layer to reduce the unevenness of the film layers disposed between the cover layer 130 and the first substrate 100. Specifically, the unevenness of the top surface of the cover layer 130 (i.e., the surface of the cover layer 130 facing away from the first substrate 100) is less than the unevenness of the top surface of the first passivation layer 121 (i.e., the surface of the first passivation layer 121 facing away from the first substrate 100).

第一鈍化層121與第二鈍化層122的材料例如包括氮化矽、氧化矽或氧化鋁,但不以此為限。披覆層130例如是有機絕緣層,其材料可包括聚酯類、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、或其它合適的材料、或上述的組合。 The materials of the first passivation layer 121 and the second passivation layer 122 include, but are not limited to, silicon nitride, silicon oxide, or aluminum oxide. The coating layer 130 is, for example, an organic insulating layer, and its material may include polyester, polyolefin, polyacrylic, polycarbonate, polyalkylene oxide, polystyrene, polyether, polyketone, polyol, polyaldehyde, or other suitable materials, or combinations thereof.

在本實施例中,由於披覆層130的材料為有機絕緣材料,在披覆層130與金屬材料製作的資料線DL、電容電極CPE以及主動元件T的源極SE與汲極DE之間設置無機絕緣材料製作成的第一鈍化層121,可避免披覆層130與其下方的金屬膜層產生剝離。畫素電極PE設置在披覆層130上,且第二鈍化層122位在披覆層130與畫素電極PE之間。披覆層130具有重疊於穿透區TA 的開口130op。特別一提的是,在披覆層130與透明導電材料製作的畫素電極PE之間設置無機絕緣材料製作成的第二鈍化層122,可進一步提升披覆層130與畫素電極PE之間的接著關係。然而,本新型創作不限於此。在其他實施例中,顯示面板可不設置第二鈍化層122。 In this embodiment, since the cladding layer 130 is made of an organic insulating material, a first passivation layer 121, made of an inorganic insulating material, is placed between the cladding layer 130 and the metal data line DL, capacitor electrode CPE, and source SE and drain DE of the active device T. This prevents separation between the cladding layer 130 and the underlying metal film layer. The pixel electrode PE is disposed on the cladding layer 130, with a second passivation layer 122 positioned between the cladding layer 130 and the pixel electrode PE. The cladding layer 130 has an opening 130op that overlaps the through-area TA. Of particular note, the second passivation layer 122, made of an inorganic insulating material, is positioned between the overcoat layer 130 and the pixel electrode PE, which is made of a transparent conductive material. This further enhances the bonding between the overcoat layer 130 and the pixel electrode PE. However, the present invention is not limited to this. In other embodiments, the display panel may not include the second passivation layer 122.

在本實施例中,第一鈍化層121與第二鈍化層122具有位於反射區RA內的接觸孔TH。接觸孔TH重疊於開口130op且貫穿第一鈍化層121與第二鈍化層122以顯露電容電極CPE的一部分。畫素電極PE延伸至披覆層130的開口130op內並經由第一鈍化層121與第二鈍化層122的接觸孔TH電性連接電容電極CPE。 In this embodiment, the first and second passivation layers 121 and 122 have contact holes TH located within the reflective area RA. The contact holes TH overlap the opening 130op and penetrate the first and second passivation layers 121 and 122 to expose a portion of the capacitor electrode CPE. The pixel electrode PE extends into the opening 130op in the cover layer 130 and is electrically connected to the capacitor electrode CPE through the contact holes TH in the first and second passivation layers 121 and 122.

另一方面,顯示面板10還可包括設置在第二基板200上的濾光圖案210、披覆層220與共電極層CEL。濾光圖案210位於第二基板200與液晶層LCL之間,且重疊於畫素結構PX。披覆層220位於液晶層LCL與濾光圖案210之間,且覆蓋濾光圖案210。共電極層CEL位於第二基板200與液晶層LCL之間,且設置在披覆層220上。然而,本新型創作不限於此。在其他未繪示的實施例中,共電極層CEL可設置在第一基板100上且位於第一基板100和液晶層LCL之間。 The display panel 10 further includes a light filter pattern 210, a cover layer 220, and a common electrode layer (CEL) disposed on the second substrate 200. The light filter pattern 210 is located between the second substrate 200 and the liquid crystal layer (LCL), overlapping the pixel structure PX. The cover layer 220 is located between the liquid crystal layer (LCL) and the light filter pattern 210, covering the light filter pattern 210. The common electrode layer (CEL) is located between the second substrate 200 and the liquid crystal layer (LCL), and disposed on the cover layer 220. However, the present invention is not limited to this. In other embodiments not shown, the common electrode layer (CEL) may be disposed on the first substrate 100, between the first substrate 100 and the liquid crystal layer (LCL).

在本實施例中,共電極層CEL位於反射區RA與穿透區TA內,且其材料可包括透明導電材料。透明導電材料例如包括金屬氧化物(例如:銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、或其它合適的氧化物、或者是上述至少兩者的堆疊層),但 不以此為限。披覆層220的材料例如包括聚酯類、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、或其它合適的材料、或上述的組合。 In this embodiment, the common electrode layer (CEL) is located within the reflective area RA and the transmissive area TA, and its material may include a transparent conductive material. Examples of such transparent conductive materials include, but are not limited to, metal oxides (e.g., indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, or other suitable oxides, or a stack of at least two of these). The material of the cover layer 220 includes, for example, polyesters, polyolefins, polyacrylates, polycarbonates, polyalkylene oxides, polystyrenes, polyethers, polyketones, polyols, polyaldehydes, or other suitable materials, or combinations thereof.

舉例來說,畫素電極PE與共電極層CEL之間形成的電場可控制液晶層LCL中的液晶分子的方向,以顯示對應的畫面。在本實施例中,共電極層CEL與共電極CE可接收共通電位(Common Voltage),但不以此為限。 For example, the electric field formed between the pixel electrode PE and the common electrode layer CEL can control the orientation of the liquid crystal molecules in the liquid crystal layer LCL to display the corresponding image. In this embodiment, the common electrode layer CEL and the common electrode CE can receive a common voltage, but this is not limited to this.

進一步地,濾光圖案210包括第一濾光部分210p1與第二濾光部分210p2。第一濾光部分210p1位於反射區RA內且重疊於反射層RL。第二濾光部分210p2位於穿透區TA內且重疊於畫素電極PE。特別注意的是,濾光圖案210的第一濾光部分210p1沿著方向Z的厚度210t1可不同於第二濾光部分210p2沿著方向Z的厚度210t2。 Furthermore, the light filtering pattern 210 includes a first light filtering portion 210p1 and a second light filtering portion 210p2. The first light filtering portion 210p1 is located within the reflective area RA and overlaps the reflective layer RL. The second light filtering portion 210p2 is located within the transmissive area TA and overlaps the pixel electrode PE. Of particular note, the thickness 210t1 of the first light filtering portion 210p1 of the light filtering pattern 210 along the direction Z may be different from the thickness 210t2 of the second light filtering portion 210p2 along the direction Z.

舉例來說,在本實施例中,第一濾光部分210p1的厚度210t1可大於第二濾光部分210p2的厚度210t2。透過增加濾光圖案210的第一濾光部分210p1的厚度210t1,可增加顯示面板10在反射區RA內的色飽和度。同時,藉由減少濾光圖案210的第二濾光部分210p2的厚度210t2,可提升顯示面板10在穿透區TA內的光穿透率。 For example, in this embodiment, the thickness 210t1 of the first filter portion 210p1 can be greater than the thickness 210t2 of the second filter portion 210p2. By increasing the thickness 210t1 of the first filter portion 210p1 of the filter pattern 210, the color saturation of the display panel 10 in the reflective area RA can be increased. Simultaneously, by reducing the thickness 210t2 of the second filter portion 210p2 of the filter pattern 210, the light transmittance of the display panel 10 in the transmissive area TA can be improved.

也就是說,濾光圖案210在反射區RA與穿透區TA內的厚度可根據不同的光學需求進行個別地調整,有助於提升整體光學表現的設計彈性。 In other words, the thickness of the filter pattern 210 in the reflective area RA and the transmissive area TA can be individually adjusted according to different optical requirements, helping to enhance the design flexibility of the overall optical performance.

特別說明的是,上述濾光圖案210在反射區RA與穿透區TA內具有不同厚度的設計可只應用在顯示面板的一部分顯示單元中,而其他的顯示單元的濾光圖案在反射區RA與穿透區TA內仍可具有相同的厚度設計。舉例來說,在一實施例中,適於讓藍光通過的濾光圖案在反射區RA與穿透區TA內可具有不同的厚度以增加反射區RA的藍色飽和度以及穿透區TA的藍光穿透率,其他適於讓紅光或綠光通過的濾光圖案在反射區RA與穿透區TA內可具有相同的厚度。如此,可改善顯示面板整體視效偏黃的問題。 It should be noted that the aforementioned design of the filter pattern 210 having different thicknesses in the reflective area RA and the transmissive area TA can be applied only to a portion of the display units in the display panel. The filter patterns in the remaining display units can still have the same thickness in both the reflective and transmissive areas TA. For example, in one embodiment, the filter pattern adapted to allow blue light to pass can have different thicknesses in the reflective and transmissive areas TA to increase blue saturation in the reflective area RA and blue light transmittance in the transmissive area TA. Other filter patterns adapted to allow red or green light to pass can have the same thickness in both the reflective and transmissive areas TA. This can improve the overall yellowish visual effect of the display panel.

以下將列舉另一實施例以詳細說明本揭露,其中相同的構件將標示相同的符號,並且省略相同技術內容的說明,省略部分請參考前述實施例,以下不再贅述。 Another embodiment will be cited below to illustrate the present disclosure in detail. Identical components will be designated by the same symbols, and descriptions of identical technical contents will be omitted. For omitted parts, please refer to the previous embodiment and will not be repeated here.

圖3是依照本新型創作的第二實施例的顯示面板的剖視示意圖。請參照圖3,本實施例的顯示面板10A與圖2的顯示面板10的差異在於:液晶層的厚度設計不同。具體而言,在本實施例的顯示面板10A中,第二基板200上的披覆層220A具有位於穿透區TA內的開口220op,且開口220op貫穿披覆層220A。共電極層CEL延伸至披覆層220A的開口220op內,並且覆蓋濾光圖案210位於穿透區TA內的第二濾光部分210p2。然而,在另一變形實施例中,披覆層可以不被開口貫穿。 Figure 3 is a schematic cross-sectional view of a display panel according to a second embodiment of the present invention. Referring to Figure 3 , the display panel 10A of this embodiment differs from the display panel 10 of Figure 2 in the thickness design of the liquid crystal layer. Specifically, in the display panel 10A of this embodiment, the cover layer 220A on the second substrate 200 has an opening 220op located within the transmissive area TA, and the opening 220op penetrates the cover layer 220A. The common electrode layer CEL extends into the opening 220op of the cover layer 220A and covers the second filter portion 210p2 of the filter pattern 210 located within the transmissive area TA. However, in another alternative embodiment, the cover layer may not be penetrated by the opening.

在本實施例中,液晶層LCL-A具有位於反射區RA內的第一部分LCLp1以及位於穿透區TA內的第二部分LCLp2,其中液晶層LCL-A的第二部分LCLp2重疊於披覆層220A的開口220op。 更具體地說,液晶層LCL-A的第一部分LCLp1沿著方向Z的液晶厚度LCt1小於其第二部分LCLp2沿著方向Z的液晶厚度LCt2。 In this embodiment, the liquid crystal layer LCL-A has a first portion LCLp1 located within the reflective area RA and a second portion LCLp2 located within the transmissive area TA. The second portion LCLp2 of the liquid crystal layer LCL-A overlaps the opening 220op of the cover layer 220A. More specifically, the liquid crystal thickness LCt1 of the first portion LCLp1 of the liquid crystal layer LCL-A along the Z direction is smaller than the liquid crystal thickness LCt2 of the second portion LCLp2 along the Z direction.

披覆層220A在穿透區TA的開口設計能增加液晶層LCL-A在穿透區TA內的液晶厚度LCt2,進而縮減光線在反射區RA與穿透區TA的液晶層LCL-A內的光程差,以進一步提升顯示面板10A在反射區RA與穿透區TA的視效一致性。較佳地,液晶層LCL-A的第二部分LCLp2的液晶厚度LCt2對第一部分LCLp1的液晶厚度LCt1的比值可大於或等於1.1且小於或等於2.2。 The opening design of the overcoat layer 220A in the transmissive area TA increases the liquid crystal thickness LCt2 of the liquid crystal layer LCL-A in the transmissive area TA, thereby reducing the optical path difference between the reflective area RA and the liquid crystal layer LCL-A in the transmissive area TA, further improving the visual consistency of the display panel 10A in the reflective area RA and the transmissive area TA. Preferably, the ratio of the liquid crystal thickness LCt2 of the second portion LCLp2 of the liquid crystal layer LCL-A to the liquid crystal thickness LCt1 of the first portion LCLp1 is greater than or equal to 1.1 and less than or equal to 2.2.

綜上所述,在本新型創作的一實施例的顯示面板中,畫素結構的反射區與穿透區設有濾光圖案。透過濾光圖案在反射區內的第一濾光部分的厚度不同於其在穿透區內的第二濾光部分的厚度,可增加顯示面板的光學特性在穿透區與反射區內個別調整的彈性。 In summary, in a display panel according to one embodiment of the present invention, light-filtering patterns are provided in both the reflective and transmissive regions of the pixel structure. The thickness of the first light-filtering portion of the light-filtering pattern in the reflective region is different from the thickness of the second light-filtering portion in the transmissive region. This increases the flexibility of adjusting the optical properties of the display panel independently in the transmissive and reflective regions.

10:顯示面板 10: Display Panel

100:第一基板 100: First substrate

110:絕緣層 110: Insulating layer

121:第一鈍化層 121: First passivation layer

122:第二鈍化層 122: Second passivation layer

130、220:披覆層 130, 220: Covering layer

130op:開口 130op: Opening

200:第二基板 200: Second substrate

210:濾光圖案 210: Light filter pattern

210p1:第一濾光部分 210p1: First filter section

210p2:第二濾光部分 210p2: Second filter section

210t1、210t2:厚度 210t1, 210t2: Thickness

AL:環境光 AL: Ambient Light

CE:共電極 CE: Common Electrode

CEL:共電極層 CEL: Common Electrode Layer

CPE:電容電極 CPE: Capacitor Electrode

Cst:儲存電容 Cst: Storage capacitor

DE:汲極 DE: Drain

GE:閘極 GE: Gate

LCL:液晶層 LCL: Liquid Crystal Layer

PE:畫素電極 PE: Pixel electrode

PX:畫素結構 PX: Pixel structure

RA:反射區 RA: Reflex area

RL:反射層 RL: Reflective layer

REL:反射光 REL: Reflected Light

SC:半導體圖案 SC: semiconductor pattern

SE:源極 SE: Source

T:主動元件 T: Active element

TA:穿透區 TA: Penetration Zone

TH:接觸孔 TH: Contact hole

TL:穿透光 TL: Penetrating Light

Z:方向 Z: Direction

A-A’:剖線 A-A’: section line

Claims (10)

一種顯示面板,包括:一第一基板與一第二基板,彼此相對設置;一液晶層,設置在該第一基板與該第二基板之間;一畫素結構,設置在該第一基板上,且設有一反射區與一穿透區,該畫素結構包括:一主動元件;一畫素電極,設置在該穿透區,且電性連接該主動元件;以及一反射層,設置在該反射區,且重疊於該畫素電極;以及一濾光圖案,設置在該第二基板上,且重疊於該畫素結構,該濾光圖案包括一第一濾光部分與一第二濾光部分,其中該第一濾光部分位於該反射區內且重疊於該反射層,該第二濾光部分位於該穿透區內且重疊於該畫素電極,且該第一濾光部分的一第一厚度不同於該第二濾光部分的一第二厚度。A display panel includes: a first substrate and a second substrate disposed opposite to each other; a liquid crystal layer disposed between the first substrate and the second substrate; a pixel structure disposed on the first substrate and having a reflective region and a transmissive region, the pixel structure including: an active element; a pixel electrode disposed in the transmissive region and electrically connected to the active element; and a reflective layer disposed in the reflective region and overlapping the reflective region. on the pixel electrode; and a light filtering pattern disposed on the second substrate and overlapping the pixel structure, the light filtering pattern comprising a first light filtering portion and a second light filtering portion, wherein the first light filtering portion is located in the reflective region and overlaps the reflective layer, and the second light filtering portion is located in the transmissive region and overlaps the pixel electrode, and a first thickness of the first light filtering portion is different from a second thickness of the second light filtering portion. 如請求項1所述的顯示面板,其中該第一濾光部分的該第一厚度大於該第二濾光部分的該第二厚度。A display panel as described in claim 1, wherein the first thickness of the first filter portion is greater than the second thickness of the second filter portion. 如請求項1所述的顯示面板,其中該液晶層具有位於該反射區內的一第一部分以及位於該穿透區內的一第二部分,該第一部分與該第二部分分別具有一第一液晶厚度與一第二液晶厚度,該第一液晶厚度小於該第二液晶厚度。A display panel as described in claim 1, wherein the liquid crystal layer has a first portion located in the reflective area and a second portion located in the transmissive area, the first portion and the second portion respectively have a first liquid crystal thickness and a second liquid crystal thickness, and the first liquid crystal thickness is less than the second liquid crystal thickness. 如請求項3所述的顯示面板,其中該第二液晶厚度對該第一液晶厚度的比值大於或等於1.1且小於或等於2.2。A display panel as described in claim 3, wherein a ratio of the second liquid crystal thickness to the first liquid crystal thickness is greater than or equal to 1.1 and less than or equal to 2.2. 如請求項3所述的顯示面板,還包括:一披覆層,設置在該第二基板上,且位於該液晶層與該濾光圖案之間,其中該披覆層具有位於該穿透區內的一開口;以及一共電極層,設置在該披覆層上,且位於該披覆層與該液晶層之間,該共電極層延伸至該披覆層的該開口內。The display panel as described in claim 3 further includes: a covering layer disposed on the second substrate and located between the liquid crystal layer and the filter pattern, wherein the covering layer has an opening located in the transmission area; and a common electrode layer disposed on the covering layer and located between the covering layer and the liquid crystal layer, wherein the common electrode layer extends into the opening of the covering layer. 如請求項5所述的顯示面板,其中該開口貫穿該披覆層。A display panel as described in claim 5, wherein the opening penetrates the cover layer. 如請求項1所述的顯示面板,其中該畫素電極還設置在該反射區內,並且電性連接該反射層。The display panel as described in claim 1, wherein the pixel electrode is further disposed in the reflective region and electrically connected to the reflective layer. 如請求項1所述的顯示面板,其中該畫素結構還包括:一電容電極,位於該反射區內,且電性連接該主動元件與該畫素電極;以及一共電極,位於該反射區內,該共電極重疊於該電容電極,且位在該第一基板與該電容電極之間,其中該電容電極與該共電極電性耦合並形成一儲存電容。The display panel as described in claim 1, wherein the pixel structure further includes: a capacitor electrode located in the reflective region and electrically connected to the active element and the pixel electrode; and a common electrode located in the reflective region, the common electrode overlapping the capacitor electrode and located between the first substrate and the capacitor electrode, wherein the capacitor electrode and the common electrode are electrically coupled to form a storage capacitor. 如請求項8所述的顯示面板,還包括:一披覆層,設置在該畫素電極與該第一基板之間,且覆蓋該主動元件與該電容電極,該披覆層具有位於該反射區內的一開口,該畫素電極經由該披覆層的該開口電性連接該電容電極。The display panel as described in claim 8 further includes: a covering layer disposed between the pixel electrode and the first substrate and covering the active element and the capacitor electrode, the covering layer having an opening located in the reflective region, and the pixel electrode being electrically connected to the capacitor electrode through the opening of the covering layer. 如請求項9所述的顯示面板,還包括:一第一鈍化層,設置在該披覆層與該主動元件之間;以及一第二鈍化層,設置在該披覆層與該畫素電極之間,其中該第一鈍化層與該第二鈍化層具有重疊於該披覆層的該開口的一接觸孔,且該畫素電極還經由該第一鈍化層與該第二鈍化層的該接觸孔電性連接該電容電極。The display panel as described in claim 9 further includes: a first passivation layer disposed between the cover layer and the active element; and a second passivation layer disposed between the cover layer and the pixel electrode, wherein the first passivation layer and the second passivation layer have a contact hole overlapping the opening of the cover layer, and the pixel electrode is also electrically connected to the capacitor electrode through the contact hole of the first passivation layer and the second passivation layer.
TW114202745U 2025-03-20 2025-03-20 Display panel TWM674193U (en)

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