TWM670575U - Package structure - Google Patents
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Abstract
本創作提出了一種封裝結構,包括:基板;導電線,所述導電線設置於所述基板下方;包覆層,所述導電線的上方被所述包覆層包覆,所述導電線的下方突出於所述包覆層;焊球,所述焊球包裹突出於所述包覆層的導電線。這樣,透過設置突出的導電線,增加焊球和導電線的接觸面積,減少應力的產生,增加焊球和導電線的黏合力和結合強度,保證封裝結構的穩定性。This invention proposes a packaging structure, including: a substrate; a conductive wire, the conductive wire is arranged below the substrate; a coating layer, the upper part of the conductive wire is coated by the coating layer, and the lower part of the conductive wire protrudes from the coating layer; a solder ball, the solder ball wraps the conductive wire protruding from the coating layer. In this way, by providing the protruding conductive wire, the contact area between the solder ball and the conductive wire is increased, the generation of stress is reduced, the adhesion and bonding strength between the solder ball and the conductive wire are increased, and the stability of the packaging structure is guaranteed.
Description
本創作關於半導體封裝技術領域,具體關於一種封裝結構。 This work is about the field of semiconductor packaging technology, specifically about a packaging structure.
為了滿足對產品空間縮小的設計需求,產品的電氣接腳設計從原來的現有的球柵陣列封裝、銅柱演化到垂直導線結構,主要被應用於防護結構或I/O連接結構中。 In order to meet the design requirements for reducing product space, the product's electrical pin design has evolved from the original existing ball grid array package and copper pillar to a vertical wire structure, which is mainly used in protection structures or I/O connection structures.
參見圖1,圖1繪示了現有的垂直導線結構製作流程:步驟1,參見(a),在基板01上放置電子元件02,並形成種子層03;步驟2,參見(b),在種子層03上形成導電線04;步驟3,參見(c),利用包覆層05,封裝基板01下方的結構;步驟4,參見(d),研磨部分包覆層05,直至露出電子元件02的上表面和導電線04的上表面;步驟5,參見(e),在電子元件02的上表面和導電線04的上表面形成金屬連接球06;步驟6,參見(f),切割形成單顆的垂直導線結構;步驟7,參見(g),觀察最終的垂直導線結構是否符合要求。 See FIG. 1, which shows the existing vertical wire structure manufacturing process: Step 1, see (a), placing electronic components 02 on substrate 01 and forming a seed layer 03; Step 2, see (b), forming conductive wires 04 on seed layer 03; Step 3, see (c), using a coating layer 05 to encapsulate the structure below substrate 01; Step 4, see (d), grinding Part of the coating layer 05 is removed until the upper surface of the electronic component 02 and the upper surface of the conductive wire 04 are exposed; step 5, see (e), metal connecting balls 06 are formed on the upper surface of the electronic component 02 and the upper surface of the conductive wire 04; step 6, see (f), cutting to form a single vertical conductive wire structure; step 7, see (g), observe whether the final vertical conductive wire structure meets the requirements.
參見圖2,圖2展示了以上述製作流程製得的垂直導線結構,其以30至50微米寬度的垂直導線作為輸入/輸出(I/O)連接通道的結構。在未進行特別設計的情況下,這些導線在受到外力衝擊時,接觸面上會產生應力。經過跌落測試後,連接點P(如圖2中圓圈所示)容易發生斷裂,這引發了對結合強度的擔憂。 See Figure 2, which shows a vertical wire structure made by the above-mentioned manufacturing process, which uses vertical wires with a width of 30 to 50 microns as the input/output (I/O) connection channel structure. Without special design, these wires will generate stress on the contact surface when they are impacted by external forces. After the drop test, the connection point P (as shown by the circle in Figure 2) is prone to fracture, which raises concerns about the bonding strength.
本創作提出了一種封裝結構,包括: 基板;導電線,所述導電線設置於所述基板下方;包覆層,所述導電線的上方被所述包覆層包覆,所述導電線的下方突出於所述包覆層;焊球,所述焊球包裹突出於所述包覆層的導電線。 This invention proposes a packaging structure, including: a substrate; a conductive wire, the conductive wire is arranged below the substrate; a coating layer, the upper part of the conductive wire is coated by the coating layer, and the lower part of the conductive wire protrudes from the coating layer; a solder ball, the solder ball wraps the conductive wire protruding from the coating layer.
作為一種可能的實施態樣,所述導電線垂直設置於所述基板下方。 As a possible implementation, the conductive line is vertically arranged below the substrate.
作為一種可能的實施態樣,所述導電線為曲線。 As a possible implementation, the conductive line is a curve.
作為一種可能的實施態樣,突出於所述包覆層的導電線包括突出頂面和突出側面。 As a possible implementation, the conductive wire protruding from the cladding layer includes a protruding top surface and a protruding side surface.
作為一種可能的實施態樣,至少兩條所述導電線不平行。 As a possible implementation, at least two of the conductive lines are not parallel.
作為一種可能的實施態樣,所述導電線的高度不一致。 As a possible implementation, the heights of the conductive wires are not uniform.
作為一種可能的實施態樣,所述包覆層的頂面為不規則形狀。 As a possible implementation, the top surface of the coating layer is an irregular shape.
作為一種可能的實施態樣,所述包覆層頂面的最高點與最低點之間的高度差不大於30μm。 As a possible implementation, the height difference between the highest point and the lowest point of the top surface of the coating layer is no more than 30μm.
作為一種可能的實施態樣,突出於所述包覆層的導電線為不規則形狀。 As a possible implementation, the conductive wire protruding from the coating layer is of irregular shape.
作為一種可能的實施態樣,所述包覆層包括複數個填充顆粒。 As a possible implementation, the coating layer includes a plurality of filler particles.
作為一種可能的實施態樣,所述包覆層頂面的填充顆粒沒有切面。 As a possible implementation, the filling particles on the top surface of the coating layer have no cut surface.
作為一種可能的實施態樣,所述包覆層側面的填充顆粒具有切面。 As a possible implementation, the filling particles on the side of the coating layer have cut surfaces.
作為一種可能的實施態樣,所述焊球設置於所述包覆層下方。 As a possible implementation, the solder ball is disposed below the encapsulation layer.
作為一種可能的實施態樣,所述導電線的高度差不大於30μm。 As a possible implementation, the height difference of the conductive line is no more than 30μm.
作為一種可能的實施態樣,所述填充顆粒的直徑不小於5μm且 不大於20μm。 As a possible implementation, the diameter of the filler particles is not less than 5 μm and not more than 20 μm.
作為一種可能的實施態樣,更包括:電子元件,所述電子元件設置於所述基板下方。 As a possible implementation, it further includes: an electronic component, wherein the electronic component is disposed below the substrate.
作為一種可能的實施態樣,更包括:電路板,所述電路板設置於所述導電線下方。 As a possible implementation, it further includes: a circuit board, wherein the circuit board is disposed below the conductive wire.
作為一種可能的實施態樣,更包括:種子層,所述種子層設置於所述基板和所述導電線之間。 As a possible implementation, it further includes: a seed layer, wherein the seed layer is disposed between the substrate and the conductive wire.
作為一種可能的實施態樣,所述填充顆粒的材質為氧化矽、氧化鋁、氮化鋁、氮化硼、氮化矽、氧化鎂、氧化鋅、碳化矽中的一種或多種。 As a possible implementation, the material of the filling particles is one or more of silicon oxide, aluminum oxide, aluminum nitride, boron nitride, silicon nitride, magnesium oxide, zinc oxide, and silicon carbide.
為了提升封裝結構的結合強度,本創作提出了一種封裝結構,包括:基板;導電線,所述導電線垂直設置於所述基板下方;包覆層,所述導電線的上方被所述包覆層包覆,所述導電線的下方突出於所述包覆層;焊球,所述焊球包裹突出於所述包覆層的導電線。這樣,透過設置突出的導電線,增加焊球和導電線的接觸面積,減少應力的產生,增加焊球和導電線的黏合力和結合強度,保證封裝結構的穩定性。 In order to improve the bonding strength of the packaging structure, this invention proposes a packaging structure, including: a substrate; a conductive wire, the conductive wire is vertically arranged below the substrate; a coating layer, the upper part of the conductive wire is coated by the coating layer, and the lower part of the conductive wire protrudes from the coating layer; a solder ball, the solder ball wraps the conductive wire protruding from the coating layer. In this way, by setting the protruding conductive wire, the contact area between the solder ball and the conductive wire is increased, the generation of stress is reduced, the adhesion and bonding strength of the solder ball and the conductive wire are increased, and the stability of the packaging structure is guaranteed.
01:基板 01:Substrate
02:電子元件 02: Electronic components
03:種子層 03:Seed layer
04:導電線 04: Conductive thread
05:包覆層 05: Coating layer
06:金屬連接球 06:Metal connecting ball
100:封裝結構 100:Packaging structure
101:基板 101:Substrate
102:電子元件 102: Electronic components
103:種子層 103: Seed layer
104:導電線 104: Conductive thread
1041:突出頂面 1041: protruding top surface
1042:突出側面 1042: Protruding side
105:包覆層 105: Coating layer
106:焊球 106: Solder ball
107:電路板 107: Circuit board
108:膠帶 108: Tape
P:連接點 P: Connection point
透過閱讀參照以下圖式所作的對非限制性實施例所作的詳細描述,本創作的其它特徵、目的和優點將會變得更明顯:圖1是現有封裝結構的製作流程圖;圖2是現有封裝結構的實物結構放大圖;圖3是根據本創作的一個實施例的封裝結構的結構示意圖;圖4是根據本創作的一個實施例的焊球的結構示意圖;圖5是根據本創作的一個實施例的封裝結構的製作流程圖;圖6是根據本創作的一個實施例的導電線的結構示意圖;圖7是根據本創作的一個實施例的包覆層的結構示意圖; 圖8是根據本創作的一個實施例的導電線的結構示意圖;圖9是根據本創作的一個實施例的多顆封裝結構的部分結構示意圖;圖10是根據本創作的一個實施例的封裝結構的部分結構及其側視圖;圖11是根據本創作的一個實施例的封裝結構的效果對比圖。 By reading the detailed description of the non-limiting embodiments with reference to the following figures, other features, purposes and advantages of the present invention will become more apparent: FIG. 1 is a flow chart of the manufacture of a conventional packaging structure; FIG. 2 is an enlarged view of the physical structure of the conventional packaging structure; FIG. 3 is a schematic diagram of the structure of a packaging structure according to an embodiment of the present invention; FIG. 4 is a schematic diagram of the structure of a solder ball according to an embodiment of the present invention; FIG. 5 is a flow chart of the manufacture of a packaging structure according to an embodiment of the present invention; FIG. 6 is a schematic diagram of the structure of a conductive wire according to an embodiment of the present invention; FIG. 7 is a schematic diagram of the structure of a coating layer according to an embodiment of the present invention; FIG. 8 is a schematic diagram of the structure of a conductive wire according to an embodiment of the present invention; FIG. 9 is a schematic diagram of a partial structure of a plurality of packaging structures according to an embodiment of the present invention; FIG. 10 is a partial structure of a packaging structure according to an embodiment of the present invention and its side view; FIG. 11 is a comparison diagram of the effects of a packaging structure according to an embodiment of the present invention.
下面結合圖式和實施例對說明本創作的具體實施態樣,透過本說明書記載的內容本領域具有通常知識者可以輕易瞭解本創作所解決的技術問題以及所產生的技術效果。可以理解的是,此處所描述的具體實施例僅僅用於解釋相關創作,而非對該創作的限定。另外,為了便於描述,圖式中僅繪示了與有關創作相關的部分。 The following is a combination of diagrams and examples to illustrate the specific implementation of this creation. Through the contents recorded in this manual, people with ordinary knowledge in this field can easily understand the technical problems solved by this creation and the technical effects produced. It can be understood that the specific examples described here are only used to explain the relevant creation, rather than to limit the creation. In addition, for the convenience of description, only the parts related to the relevant creation are shown in the diagram.
應容易理解,本創作中的“在...上”、“在...之上”和“在...上面”的含義應該以最廣義的方式解釋,使得“在...上”不僅意味著“直接在某物上”,而且還意味著包括存在兩者之間的中間部件或層的“在某物上”。 It should be readily understood that the meanings of "on", "over" and "above" in this work should be interpreted in the broadest manner, such that "on" means not only "directly on something", but also "on something" including intermediate components or layers existing between the two.
此外,為了便於描述,本文中可能使用諸如“在...下面”、“在...之下”、“下部”、“在...之上”、“上部”等空間相對術語來描述一個元件或部件與圖式中所示的另一元件或部件的關係。除了在圖中描述的方位之外,空間相對術語還意圖涵蓋裝置在使用或操作中的不同方位。設備可以以其他方式定向(旋轉90°或以其他定向),並且在本文中使用的空間相對描述語可以被同樣地相應地解釋。 In addition, for ease of description, spatially relative terms such as "below", "under", "lower", "above", "upper", etc. may be used herein to describe the relationship of one element or component to another element or component shown in the drawings. In addition to the orientation described in the drawings, spatially relative terms are also intended to cover different orientations of the device in use or operation. The device can be oriented in other ways (rotated 90° or in other orientations), and the spatially relative descriptors used in this article can be interpreted accordingly.
本文中所使用的術語“層”是指包括具有一定厚度的區域的材料部分。層可以在整個下層或上層結構上延伸,或者可以具有小於下層或上層結構的範圍的程度。此外,層可以是均質或不均質連續結構的區域,其厚度小於連續結構的厚度。例如,層可以位於連續結構的頂表面和底表面之間或在其之間的任何一對水平方向平面之間。層可以水平方向地、垂直地及/或沿著錐形表面延伸。基板(substrate)可以是一層,可以在其中包括一個或複 數個層,及/或可以在其上、之上及/或之下具有一個或複數個層。一層可以包括多層。例如,半導體層可以包括一個或複數個摻雜或未摻雜的半導體層,並且可以具有相同或不同的材料。 As used herein, the term "layer" refers to a portion of a material including an area having a certain thickness. A layer may extend over the entire underlying or upper structure, or may have an extent less than the extent of the underlying or upper structure. In addition, a layer may be an area of a homogeneous or inhomogeneous continuous structure, whose thickness is less than the thickness of the continuous structure. For example, a layer may be located between the top and bottom surfaces of the continuous structure or between any pair of horizontal planes therebetween. A layer may extend horizontally, vertically and/or along a conical surface. A substrate may be a layer, may include one or more layers therein, and/or may have one or more layers thereon, above and/or below. A layer may include multiple layers. For example, the semiconductor layer may include one or more doped or undoped semiconductor layers and may have the same or different materials.
本文中使用的術語“基板(substrate)”是指在其上添加後續材料層的材料。基板本身可以被圖樣化。添加到基板頂部的材料可以被圖樣化或可以保持未圖樣化。此外,基板可以包括各種各樣的半導體材料,諸如矽、碳化矽、氮化鎵、鍺、砷化鎵、磷化銦等。可選地,基板可以由非導電材料製成,諸如玻璃、塑膠或藍寶石晶片等。進一步可選地,基板可以具有在其中形成的半導體裝置或電路。 The term "substrate" as used herein refers to the material on which subsequent layers of material are added. The substrate itself may be patterned. The material added on top of the substrate may be patterned or may remain unpatterned. In addition, the substrate may include a wide variety of semiconductor materials such as silicon, silicon carbide, gallium nitride, germanium, gallium arsenide, indium phosphide, etc. Alternatively, the substrate may be made of non-conductive materials such as glass, plastic, or sapphire wafers, etc. Further optionally, the substrate may have semiconductor devices or circuits formed therein.
需要說明的是,說明書圖式中所繪示的結構、比例、大小等,僅用於配合說明書所記載的內容,以供本領域具有通常知識者的瞭解與閱讀,並非用以限定本創作可實施的限定條件,故不具技術上的實質意義,任何結構的修飾、比例關係的改變或大小的調整,在不影響本創作所能產生的功效及所能達成的目的下,均應仍落在本創作所揭示的技術內容得能涵蓋的範圍內。同時,本說明書中所引用的如“上”、“第一”、“第二”及“一”等用語,也僅為便於敘述的明瞭,而非用以限定本創作可實施的範圍,其相對關係的改變或調整,在無實質變更技術內容下,當也視為本創作可實施的範疇。 It should be noted that the structures, proportions, sizes, etc. depicted in the drawings of the specification are only used to match the contents described in the specification so as to facilitate understanding and reading by people with ordinary knowledge in the field. They are not used to limit the restrictive conditions for the implementation of this creation, and therefore have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed by this creation without affecting the effects and purposes that can be achieved by this creation. At the same time, the terms such as "on", "first", "second" and "one" used in this manual are only for the convenience of description and are not used to limit the scope of implementation of this creation. Changes or adjustments in their relative relationships, without substantial changes in the technical content, should also be regarded as the scope of implementation of this creation.
還需要說明的是,本創作的實施例對應的縱向截面可以為對應前視圖方向截面,橫向截面可以為對應右視圖方向截面,水平方向截面可以為對應俯視圖方向截面。 It should also be noted that the longitudinal section corresponding to the embodiment of the present invention can be the section corresponding to the front view, the transverse section can be the section corresponding to the right view, and the horizontal section can be the section corresponding to the top view.
另外,在不衝突的情況下,本創作中的實施例及實施例中的特徵可以相互組合。下面將參考圖式並結合實施例來詳細說明本創作。 In addition, the embodiments and features of the present invention can be combined with each other without conflict. The present invention will be described in detail below with reference to the drawings and in combination with the embodiments.
參見圖3,圖3是根據本創作的一個實施例封裝結構100的結構示意圖。該封裝結構100,包括: 基板101;導電線104,該導電線104設置於基板101下方;包覆層105,其中,導電線104的上方被包覆層105包覆,導電線104的下方突出於包覆層105;焊球106,該焊球106包裹突出於包覆層105的導電線104。需要說明的是,該焊球106設置於包覆層105下方。 See FIG. 3, which is a schematic diagram of a package structure 100 according to an embodiment of the present invention. The package structure 100 includes: a substrate 101; a conductive wire 104, which is disposed below the substrate 101; a coating layer 105, wherein the upper part of the conductive wire 104 is coated by the coating layer 105, and the lower part of the conductive wire 104 protrudes from the coating layer 105; a solder ball 106, which wraps the conductive wire 104 protruding from the coating layer 105. It should be noted that the solder ball 106 is disposed below the coating layer 105.
透過這種方式,焊球106能夠與突出於包覆層105的導電線104實現充分接觸,從而增大焊球106與導電線104的接觸面積,減少應力的產生,增強焊球106與導電線104之間的黏合力和結合強度,確保封裝結構100的穩定性。 In this way, the solder ball 106 can achieve full contact with the conductive wire 104 protruding from the cladding layer 105, thereby increasing the contact area between the solder ball 106 and the conductive wire 104, reducing the generation of stress, and enhancing the adhesion and bonding strength between the solder ball 106 and the conductive wire 104, thereby ensuring the stability of the package structure 100.
作為一種可能的實施態樣,導電線104可以垂直設置於基板101下方,可以是垂直導線(Vertical wire),透過垂直連接基板101和其他元件的導線來最小化空間並降低功耗。由於導電線104直徑較小,所以在打線過程中可能呈現為曲線,亦即,若導電線104為多條,可以部分為直線,部分為曲線。 As a possible implementation, the conductive wire 104 can be vertically arranged below the substrate 101, and can be a vertical wire, which can minimize space and reduce power consumption by vertically connecting the substrate 101 and other components. Since the conductive wire 104 has a small diameter, it may appear as a curve during the wiring process, that is, if there are multiple conductive wires 104, some of them can be straight lines and some can be curved lines.
同樣的,由於導電線104尺寸和製程的問題,在打線過程中還可能會導致至少兩條導電線104不平行,導電線104的高度不一致等情況。需要說明的是,導電線104的高度差不大於30μm。 Similarly, due to the size and process of the conductive wire 104, at least two conductive wires 104 may not be parallel during the bonding process, and the height of the conductive wires 104 may be inconsistent. It should be noted that the height difference of the conductive wires 104 is no more than 30μm.
此外,突出於包覆層105的導電線104可以包括突出頂面1041和突出側面1042。 In addition, the conductive wire 104 protruding from the cladding layer 105 may include a protruding top surface 1041 and a protruding side surface 1042.
作為一種可能的實施態樣,更包括:電子元件102,該電子元件102設置於基板101下方,可以是實現各種功能的晶片或元件。 As a possible implementation, it further includes: an electronic component 102, which is disposed below the substrate 101 and can be a chip or component that realizes various functions.
作為一種可能的實施態樣,更包括:電路板107,該電路板107設置於導電線104下方,基板101透過導電線104和電路板107電性連接。可選地,電子元件102也可以與電路板107、基板101電性連接。 As a possible implementation, it further includes: a circuit board 107, which is arranged below the conductive wire 104, and the substrate 101 is electrically connected to the circuit board 107 through the conductive wire 104. Optionally, the electronic component 102 can also be electrically connected to the circuit board 107 and the substrate 101.
作為一種可能的實施態樣,更包括:種子層103,該種子層103設置於基板101和導電線104之間。此外,焊球106與電路板107之間、電子元件102與電路板107、基板101之間也可以有種子層103。 As a possible implementation, it further includes: a seed layer 103, which is disposed between the substrate 101 and the conductive wire 104. In addition, there may also be a seed layer 103 between the solder ball 106 and the circuit board 107, between the electronic component 102 and the circuit board 107, and between the substrate 101.
作為一種可能的實施態樣,包覆層105可以包括複數個填充顆粒,填充顆粒的材質為氧化矽、氧化鋁、氮化鋁、氮化硼、氮化矽、氧化鎂、氧化鋅、碳化矽中的一種或多種,其直徑不小於5μm且不大於20μm。 As a possible implementation, the coating layer 105 may include a plurality of filling particles, the material of the filling particles is one or more of silicon oxide, aluminum oxide, aluminum nitride, boron nitride, silicon nitride, magnesium oxide, zinc oxide, and silicon carbide, and the diameter thereof is not less than 5 μm and not more than 20 μm.
作為一種可能的實施態樣,參見圖4,一個焊球106可以同時包覆兩個突出於包覆層105的導電線104。 As a possible implementation, referring to FIG. 4 , a solder ball 106 can simultaneously cover two conductive wires 104 protruding from the covering layer 105.
下面參見圖5,介紹本創作的一個實施例封裝結構100的製造步驟:步驟1,參見(a),將電子元件102和種子層103形成於基板101上;步驟2,參見(b),在種子層103上方形成導電線104;需要說明的是,導電線104的高度可能不一致(參見圖6),但高度差不大於30μm。 See Figure 5 below to introduce the manufacturing steps of a packaging structure 100 of an embodiment of the present invention: Step 1, see (a), forming an electronic component 102 and a seed layer 103 on a substrate 101; Step 2, see (b), forming a conductive wire 104 above the seed layer 103; It should be noted that the height of the conductive wire 104 may be inconsistent (see Figure 6), but the height difference is no more than 30μm.
步驟3,參見(c),在導電線104和電子元件102上方貼膠帶108;需要說明的是,膠帶108用於包覆部分導電線104,以便包覆層105的形成避開被膠帶108包覆的導電線104部分。膠帶108可以是耐熱膠帶、具有黏性的模具等,也可以是可以實現以上功能的其他絕緣材料,在此不做限定。 Step 3, see (c), apply tape 108 on the conductive wire 104 and the electronic component 102; it should be noted that the tape 108 is used to cover part of the conductive wire 104, so that the formation of the coating layer 105 avoids the part of the conductive wire 104 covered by the tape 108. The tape 108 can be a heat-resistant tape, a sticky mold, etc., or other insulating materials that can achieve the above functions, which is not limited here.
步驟4,參見(d),在膠帶108和基板101之間形成包覆層105。 Step 4, see (d), forming a coating layer 105 between the tape 108 and the substrate 101.
步驟5,參見(e),去除膠帶108,露出被膠帶108包覆的導電線104;需要說明的是,去除膠帶108時可能會導致膠帶108包裹的材料出現不規則形狀,包括包覆層105的頂面(參見圖7)、突出於包覆層105的導電線104(參見圖8)。但是,包覆層105頂面的最高點與最低點之間的高度差不大於30μm。 Step 5, see (e), remove the tape 108 to expose the conductive wire 104 wrapped by the tape 108; it should be noted that when removing the tape 108, the material wrapped by the tape 108 may appear irregularly shaped, including the top surface of the coating layer 105 (see Figure 7) and the conductive wire 104 protruding from the coating layer 105 (see Figure 8). However, the height difference between the highest point and the lowest point of the top surface of the coating layer 105 is no more than 30μm.
步驟6,參見(f),在電子元件102和導電線104上方形成焊球106。 Step 6, see (f), forms solder balls 106 above the electronic components 102 and the conductive lines 104.
步驟7,參見(g),切割形成單顆結構;需要說明的是,在實際製作過程中,封裝結構100可能是多顆同時執行上述步驟1至步驟6,例如參見圖9所示的步驟(c)、(d),在此基礎上,需要在步驟7執行切割操作,形成參見圖5中的(g)所示的單顆結構。 Step 7, see (g), cutting to form a single structure; it should be noted that in the actual manufacturing process, the package structure 100 may be multiple and perform the above steps 1 to 6 at the same time, for example, see steps (c) and (d) shown in Figure 9. On this basis, it is necessary to perform a cutting operation in step 7 to form a single structure as shown in (g) in Figure 5.
在此情況下,由於包覆層105包括複數個填充粒子,若是切割的話,切面可能會呈現填充粒子的切面(參見圖10)。因此,對於封裝結構100來說,其包覆層105側面的填充顆粒具有切面。由於包覆層105的頂面是去除膠帶108形成的,此過程不會破壞填充粒子的完整度,亦即,包覆層105頂面的填充顆粒沒有切面。 In this case, since the coating layer 105 includes a plurality of filling particles, if cut, the cut surface may show the cut surface of the filling particles (see FIG. 10 ). Therefore, for the package structure 100, the filling particles on the side of the coating layer 105 have a cut surface. Since the top surface of the coating layer 105 is formed by removing the tape 108, this process will not destroy the integrity of the filling particles, that is, the filling particles on the top surface of the coating layer 105 have no cut surface.
步驟8,參見(h),觀察步驟7形成的結構是否符合要求。 Step 8, see (h), observe whether the structure formed in step 7 meets the requirements.
步驟9,參見(i),翻轉步驟7形成的結構,並將其形成於電路板107上。 Step 9, see (i), flip the structure formed in step 7 and form it on the circuit board 107.
步驟10,參見(j),形成完整的封裝結構100。 Step 10, see (j), forms a complete package structure 100.
綜上,參見圖11,圖11左側為先前技術的封裝結構,右側為本創作的封裝結構100,由圖可知,導電線104和焊球106的接觸面積更大,從而提高了封裝結構100的穩定性和可靠性,能夠有效保護導電線104免受外部衝擊和壓力的影響。 In summary, see FIG11. The left side of FIG11 is a package structure of the prior art, and the right side is a package structure 100 of the present invention. As can be seen from the figure, the contact area between the conductive wire 104 and the solder ball 106 is larger, thereby improving the stability and reliability of the package structure 100, and being able to effectively protect the conductive wire 104 from external impact and pressure.
如本文中所使用,術語“實質上”、“實質的”、“大約”及“約”用於指示和解釋較小變化。舉例而言,當結合數值使用時,上述術語可指小於或等於相應數值±10%的變化範圍,例如小於或等於±5%、小於或等於±4%、小於或等於±3%、小於或等於±2%、小於或等於±1%、小於或等於±0.5%、小於或等於±0.1%或小於或等於±0.05%的變化範圍。作為另一實施例,膜或層的厚度“實質上均一”可指膜或層的平均厚度小於或等於±10%的標準 差,比如小於或等於±5%、小於或等於±4%、小於或等於±3%、小於或等於±2%、小於或等於±1%、小於或等於±0.5%、小於或等於±0.1%或小於或等於±0.05%的標準差。術語“實質上共面”可指沿同一平面處於50μm內(諸如沿同一平面處於40μm內、30μm內、20μm內、10μm內或1μm內)的兩個表面。若例如兩個元件重疊或在200μm內、150μm內、100μm內、50μm內、40μm內、30μm內、20μm內、10μm內或1μm內重疊,則兩個組件可認為為“實質上對準”。若兩個表面或元件之間的角度為例如90°±10°(諸如±5°、±4°、±3°、±2°、±1°、±0.5°、±0.1°或±0.05°),則兩個表面或元件可視為“實質上垂直”。當結合事件或情形使用時,術語“實質上”、“實質的”、“大約”及“約”可指事件或情形精確發生的情況以及事件或情形極近似發生的情況。 As used herein, the terms "substantially," "substantial," "approximately," and "about" are used to indicate and explain minor variations. For example, when used in conjunction with numerical values, the above terms may refer to a variation range of less than or equal to ±10% of the corresponding numerical value, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%. As another example, the thickness of a film or layer is "substantially uniform" may refer to an average thickness of the film or layer that is less than or equal to ±10% standard deviation, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%. The term "substantially coplanar" may refer to two surfaces that are within 50 μm along the same plane (e.g., within 40 μm, within 30 μm, within 20 μm, within 10 μm, or within 1 μm along the same plane). Two components may be considered to be "substantially aligned" if, for example, they overlap or overlap within 200μm, 150μm, 100μm, 50μm, 40μm, 30μm, 20μm, 10μm, or 1μm. Two surfaces or components may be considered to be "substantially perpendicular" if the angle between them is, for example, 90°±10° (e.g., ±5°, ±4°, ±3°, ±2°, ±1°, ±0.5°, ±0.1°, or ±0.05°). When used in conjunction with an event or situation, the terms "substantially", "substantial", "approximately", and "about" may refer to situations where the event or situation occurs exactly as well as situations where the event or situation occurs very approximately.
100:封裝結構 100:Packaging structure
101:基板 101:Substrate
102:電子元件 102: Electronic components
103:種子層 103: Seed layer
104:導電線 104: Conductive thread
105:包覆層 105: Coating layer
106:焊球 106: Solder ball
107:電路板 107: Circuit board
1041:突出頂面 1041: protruding top surface
1042:突出側面 1042: protruding side
Claims (10)
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| TW113214054U TWM670575U (en) | 2024-12-20 | 2024-12-20 | Package structure |
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