TWM648179U - Filtering device for use in clean room - Google Patents
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Abstract
一種用於無塵室之過濾裝置,係設置在用於半導體製程的無塵室或該無塵室的通風管道,其包括至少一過濾除汙板、一抽風裝置與一供電裝置,該過濾除汙板包括一除汙層,該除汙層外圍具有一外框,該外框具有二導電接腳,以及在該外框內設置有一通電網格,在該通電網格的表面塗佈有一有機物吸附層或一無機物吸附層,該有機物吸附層或該無機物吸附層用以吸附該無塵室空氣中的有機汙染物或無機汙染物,避免該無塵室中在生產、儲存或使用該半導體時,該有機汙染物或該無機汙染物對該半導體或該無塵室內環境造成汙染。 A filtering device for a clean room is provided in a clean room used for semiconductor manufacturing processes or a ventilation duct of the clean room. It includes at least one filtering and decontamination plate, an exhaust device and a power supply device. The filtering device The dirt board includes a dirt removal layer. The dirt removal layer has an outer frame on the periphery. The outer frame has two conductive pins, and a energized grid is provided in the outer frame. An organic substance is coated on the surface of the energized grid. An adsorption layer or an inorganic adsorption layer. The organic adsorption layer or the inorganic adsorption layer is used to adsorb organic pollutants or inorganic pollutants in the air of the clean room to prevent the semiconductor from being produced, stored or used in the clean room. , the organic pollutant or the inorganic pollutant causes pollution to the semiconductor or the clean room environment.
Description
本創作是有關一種用於無塵室之過濾裝置,係設置在用於半導體製程的無塵室或該無塵室的通風管道,以用於吸附該無塵室空氣中的有機汙染物或無機汙染物。尤其該無塵室中用以生產、儲存或使用半導體時,可避免有機汙染物或無機汙染物對半導體或無塵室內環境造成汙染。 This invention relates to a filtering device for clean rooms, which is installed in a clean room used for semiconductor manufacturing processes or the ventilation duct of the clean room to absorb organic pollutants or inorganic pollutants in the air of the clean room. contaminants. Especially when the clean room is used to produce, store or use semiconductors, it can prevent organic pollutants or inorganic pollutants from contaminating the semiconductor or the clean room environment.
依據目前的半導體元件製造技術,半導體元件的電路圖案是透過微影(lithography)製程將電路圖案轉印至矽晶圓的表面,具體而言,是利用特定波長的光源投射通過光罩(photomask)的方式,將電路圖案轉印至矽晶圓的表面。在半導體元件的製造過程中,以光罩為例,光罩的缺陷會造成矽晶圓表面之電路圖案的扭曲或變形,尤其半導體元件的微小化,即使只有奈米尺寸(例如20nm~200nm)的缺陷都會導致半導體電路圖案的損害。 According to the current semiconductor device manufacturing technology, the circuit pattern of the semiconductor device is transferred to the surface of the silicon wafer through a lithography process. Specifically, a light source of a specific wavelength is used to project through a photomask. way to transfer the circuit pattern to the surface of the silicon wafer. In the manufacturing process of semiconductor components, taking the photomask as an example, defects in the photomask will cause distortion or deformation of the circuit pattern on the surface of the silicon wafer, especially the miniaturization of semiconductor components, even if they are only nanometer-sized (for example, 20nm~200nm) Defects will cause damage to semiconductor circuit patterns.
已知造成光罩缺陷的原因之一,係在於光罩的表面受到微塵或汙染微粒(contamination particles)的汙染;為了維持光罩在使用期間的品質,習知之一種方法係在光罩的表面設置一種光罩保護薄膜(pellicle),用以防止汙染物質掉落在光罩表面進而形成汙染微粒。然而,即使具有上述的光罩保護薄膜,實務上仍然無法完全避免汙染物質對光罩表面所造成的汙染,光罩之汙染物質的來源或產生原因包括來自無塵室(clean room)、光罩的儲存環境和微影 製程中的設備及化學品的環境中和光罩內腔中產生的汙染物質,這些化學物或汙染物仍可能經由光罩保護膜的通氣孔或薄膜而進入光罩的內腔中。 It is known that one of the causes of photomask defects is that the surface of the photomask is contaminated by dust or contamination particles. In order to maintain the quality of the photomask during use, a conventional method is to set a mask on the surface of the photomask. A photomask protective film (pellicle) used to prevent contaminants from falling on the photomask surface and forming pollution particles. However, even with the above-mentioned photomask protective film, it is still impossible to completely avoid contamination of the photomask surface by pollutants in practice. The sources or causes of photomask pollutants include clean rooms, photomasks, etc. storage environment and lithography Pollutants generated in the environment of equipment and chemicals during the manufacturing process and in the inner cavity of the photomask may still enter the inner cavity of the photomask through the vent holes or thin films of the photomask protective film.
另一方面,用於將光罩保護薄膜黏著於光罩表面的黏著劑以及光罩本身的框架黏膠之中所含的成分,也會在微影製程中因為氣體逸出(outgassing)或其他原因而生成汙染物質,一般而言有機(organic)的汙染物質、無機(inorganic)的汙染物質例如氨氣與硫氧化合物或其他汙染物質會沈積或附著於光罩的表面逐漸形成一種薄霧(haze),當汙染物質(例如硫酸銨)累積至某一程度將會形成較大的結晶(crystal)或是微粒(particle),進而在微影製程中與光罩的電路圖案一起聚焦並轉印至矽晶圓的表面,造成電路圖案的扭曲或變形。因此,如何在光罩的使用期間更為有效的吸收汙染物質以預防薄霧的產生,已成為業界致力解決的問題之一。 On the other hand, the adhesive used to adhere the photomask protective film to the photomask surface and the components contained in the frame adhesive of the photomask itself may also be damaged due to gas outgassing or other factors during the lithography process. Pollutants are generated due to various reasons. Generally speaking, organic pollutants, inorganic pollutants such as ammonia and sulfur oxide compounds or other pollutants will deposit or adhere to the surface of the photomask and gradually form a mist ( haze), when contaminants (such as ammonium sulfate) accumulate to a certain extent, larger crystals or particles will be formed, which will then be focused and transferred together with the circuit pattern of the photomask during the lithography process. to the surface of the silicon wafer, causing distortion or deformation of the circuit pattern. Therefore, how to absorb pollutants more effectively during the use of the photomask to prevent the generation of mist has become one of the problems that the industry is trying to solve.
而為了解決上述問題,本創作在一可通電加熱的網格上塗佈一用於吸附汙染物的吸附層,並做為過濾空氣之裝置。 In order to solve the above problems, this invention coats an electrically heated grid with an adsorption layer for adsorbing pollutants and serves as an air filtering device.
因此,本創作提出有關一種用於無塵室之過濾裝置,包含至少一過濾除汙板、一抽風裝置與一供電裝置。該過濾除汙板則包括一除汙層,該除汙層外圍具有一外框,該外框具有二導電接腳,以及在該外框內設置有一通電網格,該外框、該導電接腳與該通電網格皆是由導電材質所製成,在該通電網格的表面塗佈有一有機物吸附層,該過濾層係結合於該除汙層的一側或兩側。該抽風裝置係設置於該過濾除汙板一旁側。該供電裝置係電性連接該導電接腳與該抽風裝置,以提供該除汙層與該抽風裝置所需電能。 Therefore, this invention proposes a filtering device for a clean room, which includes at least one filtering and decontamination plate, an exhaust device and a power supply device. The filtering and decontamination plate includes a decontamination layer. The decontamination layer has an outer frame on its periphery. The outer frame has two conductive pins, and an electrified grid is provided in the outer frame. The outer frame and the conductive contact The feet and the electrified grid are both made of conductive material. An organic adsorption layer is coated on the surface of the electrified grid, and the filter layer is combined with one or both sides of the decontamination layer. The exhaust device is arranged on one side of the filter and decontamination plate. The power supply device is electrically connected to the conductive pin and the exhaust device to provide the electrical energy required by the decontamination layer and the exhaust device.
藉之,該抽風裝置可啟動抽風,使空氣通過每該過濾除汙板,而空氣中可能含有微塵與氣態有機物,空氣通過過濾除汙板之時,微塵係被該過濾層捕捉,該氣態有機物係被該有機物吸附層所吸附。於消除該氣態有機物時,將該除汙層在通電後,可使得該外框與該通電網格被加熱,以降低該有機物吸附層對於該氣態有機物的吸附力。如此一來,便可透過一乾淨空氣或一惰性氣體帶離該氣態有機物,因此,該有機物吸附層不會持續累積、附著該氣態有機物,而可持續使用且不會降低使用效能。 By this, the exhaust device can start the exhaust to make the air pass through each filter and decontamination plate, and the air may contain fine dust and gaseous organic matter. When the air passes through the filter and decontamination plate, the dust is captured by the filter layer, and the gaseous organic matter is captured by the filter layer. It is adsorbed by the organic adsorption layer. When the gaseous organic matter is eliminated, after the decontamination layer is energized, the outer frame and the electrified grid can be heated to reduce the adsorption force of the organic matter adsorption layer to the gaseous organic matter. In this way, the gaseous organic matter can be taken away through a clean air or an inert gas. Therefore, the organic matter adsorption layer will not continue to accumulate and adhere to the gaseous organic matter, and can be used continuously without reducing the use efficiency.
於一較佳實施例中,該有機物吸附層為矽高分子材料、聚乙二醇、角鯊烷或超高真空油脂之其中之一或其組合。 In a preferred embodiment, the organic matter adsorption layer is one or a combination of silicon polymer material, polyethylene glycol, squalane or ultra-high vacuum grease.
於一較佳實施例中,該矽高分子材料為矽膠、聚二甲基矽氧烷、苯甲基聚矽氧烷、三氟丙基甲基聚矽氧烷或氰丙基苯基甲基聚矽氧烷之其中之一或其組合。 In a preferred embodiment, the silicone polymer material is silicone, polydimethylsiloxane, benzylpolysiloxane, trifluoropropylmethylpolysiloxane or cyanopropylphenylmethyl One or a combination of polysiloxanes.
於一較佳實施例中,該過濾除汙板設有至少二個,該等過濾除汙板的該通電網格的表面分別塗佈該有機物吸附層或一無機物吸附層。 In a preferred embodiment, the filter and decontamination plates are provided with at least two, and the surfaces of the electrified grids of the filter and decontamination plates are respectively coated with the organic adsorption layer or an inorganic adsorption layer.
於一較佳實施例中,該無機物吸附層的材料係包含1~10重量百分比的高分子有機酸以及90~99重量百分比水性壓克力壓敏膠。其中,該高分子有機酸可替換為陰離子型高分子材料。 In a preferred embodiment, the material of the inorganic adsorption layer includes 1 to 10 weight percent of polymer organic acid and 90 to 99 weight percent of water-based acrylic pressure-sensitive adhesive. Among them, the polymer organic acid can be replaced by an anionic polymer material.
於一較佳實施例中,該過濾除汙板更包含至少一過濾層,該過濾層係結合於該除汙層的一側或兩側。 In a preferred embodiment, the filter and decontamination plate further includes at least one filter layer, and the filter layer is combined on one side or both sides of the decontamination layer.
於一較佳實施例中,該過濾除汙板設置在連通至一無塵室的一通風管道之中,該抽風裝置係設置在該通風管道中靠近該無塵室的位置。該供電裝置包含一電源、一開關與一電路電路保護元件,該電源電性連接該開關與該電路電路保護元件。 In a preferred embodiment, the filter and decontamination plate is disposed in a ventilation duct connected to a clean room, and the exhaust device is disposed in the ventilation duct close to the clean room. The power supply device includes a power supply, a switch and a circuit protection component. The power supply is electrically connected to the switch and the circuit protection component.
於一較佳實施例中,更包括一承載架,該承載架的兩內側面上具 有複數組相對應的插槽,每組該插槽用於組裝一個該過濾除汙板,在該承載架的前端具有一通風入口,後端具有一通風出口,該通風出口係朝向該無塵室,該抽風裝置則係組裝在該通風出口。 In a preferred embodiment, it further includes a bearing frame with two inner surfaces of the bearing frame There are a plurality of corresponding sets of slots, and each set of slots is used to assemble a filter and decontamination plate. There is a ventilation inlet at the front end of the carrier frame, and a ventilation outlet at the rear end. The ventilation outlet faces the dust-free room, the exhaust device is assembled at the ventilation outlet.
10:過濾除汙板 10:Filter and decontamination plate
1:除汙層 1: Decontamination layer
11:外框 11:Outer frame
12:導電接腳 12: Conductive pins
13:通電網格 13: energized grid
131:有機物吸附層 131: Organic matter adsorption layer
132:無機物吸附層 132: Inorganic adsorption layer
14:第一側面 14:First side
15:第二側面 15:Second side
2:過濾層 2:Filter layer
3:抽風裝置 3:Exhaust device
4:供電裝置 4: Power supply device
41:電源 41:Power supply
42:開關 42: switch
43:電路保護元件 43:Circuit protection components
5:承載架 5: Bearing frame
51:插槽 51:Slot
511:槽壁 511:Trough wall
52:通風入口 52:Ventilation entrance
53:通風出口 53:Ventilation outlet
6:吹風裝置 6: Blowing device
A:通風管道 A: Ventilation duct
B:無塵室 B: Clean room
C:空氣 C:Air
C1:微塵 C1: fine dust
C2:第一汙染物 C2: The first pollutant
C3:第二汙染物 C3: Second pollutant
[第1圖]係本創作用於無塵室之過濾裝置之各部結構立體分解示意圖。 [Picture 1] is a three-dimensional exploded view of the various parts of the filter device used in clean rooms.
[第2圖]係本創作用於無塵室之過濾裝置之除汙層與過濾層於其他實施例的結構立體分解示意圖。 [Figure 2] is a three-dimensional exploded schematic diagram of the structure of the decontamination layer and filter layer of the filter device used in clean rooms in other embodiments of this invention.
[第3圖]係本創作用於無塵室之過濾裝置之除汙層與過濾層結合成一過濾除汙板的剖面示意圖。 [Figure 3] is a schematic cross-sectional view of the decontamination layer and filter layer of the filter device used in clean rooms of this invention combined into a filter decontamination plate.
[第4圖]係本創作用於無塵室之過濾裝置之複數過濾除汙板設置在通風管道的側面示意圖。 [Picture 4] is a schematic side view of the plurality of filtering and decontamination plates installed in the ventilation duct of the filtration device used in the clean room of this invention.
[第5圖]係本創作用於無塵室之過濾裝置之供電裝置的配置簡易線路圖。 [Figure 5] is a simple circuit diagram of the configuration of the power supply device of the filtration device used in the clean room.
[第6圖]係本創作用於無塵室之過濾裝置之複數過濾除汙板與抽風裝置裝設在一承載架上的立體示意圖。 [Figure 6] is a three-dimensional schematic diagram of the plurality of filtering and decontamination plates and the exhaust device of the filtration device used in the clean room installed on a bearing frame.
[第7圖]係本創作用於無塵室之過濾裝置之抽風裝置實施抽風的剖面作動示意圖。 [Figure 7] is a schematic diagram of the cross-sectional operation of the exhaust device used in the filter device of the clean room to implement exhaust.
[第8圖]係本創作用於無塵室之過濾裝置之複過濾除汙板實施過濾的剖面作動示意圖。 [Figure 8] is a cross-sectional schematic diagram of the filtering operation of the multi-filter decontamination plate of the filtration device used in a clean room.
[第9圖]係本創作用於無塵室之過濾裝置透過吹風裝置實施消除微塵或汙染物之剖面作動示意圖。 [Figure 9] is a schematic cross-sectional view of the filter device used in clean rooms of this invention to eliminate dust or pollutants through the blower device.
有關於本創作其他技術內容、特點與功效,在以下配合參考圖式之較佳實施例的詳細說明中,將可清楚的呈現。 Other technical contents, features and functions of this invention will be clearly presented in the following detailed description of the preferred embodiment with reference to the drawings.
除非另有定義,本文使用的所有技術和科學術語具有與本創作所屬領域中的技術人員所通常理解相同的含義。 Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this creation belongs.
如本文所用,在不特別指出具體數量的情況下,冠詞「一」、「一個」以及「任何」是指一個或多於一個(即至少一個)物品的文法。例如,「一元件」意指一個元件或多於一個元件。 As used herein, the articles "a," "an," and "any" refer grammatically to one or more than one (i.e., at least one) item unless a specific number is specified. For example, "an element" means one element or more than one element.
請參閱第1圖,第1圖為本創作用於無塵室之過濾裝置的各部結構立體分解示意圖。如圖中所示,包含有二除汙層1、二過濾層2、一抽風裝置3與一供電裝置4。所述無塵室,可以是生產或使用半導體的無塵室,也可以是半導體的儲存環境,亦或是任何生產、儲存或使用無論一個或複數個半導體的環境。所述半導體例如但不限於光罩。
Please refer to Figure 1. Figure 1 is a three-dimensional exploded view of each component structure of the filter device used in clean rooms. As shown in the figure, it includes two
於本實施例中,除汙層1外圍具有一平板狀外框11,外框11具有二導電接腳12,以及在外框11內設置有一通電網格13。所述外框11、導電接腳12與通電網格13皆是由導電材質所製成的網格狀平面,例如但不限為銅。於一實際的例子中,二導電接腳12分別為正極與負極,其係電性連接供電裝置4,而複數除汙層1之中,每個除汙層1的導電接腳12係以串聯的方式電性連接供電裝置4,在其他實施例中,每個除汙層1的導電接腳12也可以是並聯的方式電性連接供電裝置4。由於電熱(electric heating)原理,在通電後,可使得外框11與通電網格13被加熱,加熱係作為除汙之用途。在通電網格13的表面塗佈有用於吸
附汙染物質的吸附層,而二除汙層1的通電網格13係分別塗佈不同的吸附層。
In this embodiment, the
其中,所述吸附汙染物質的吸附層包含有一有機物吸附層131與一無機物吸附層132,有機物吸附層131與無機物吸附層132係分別塗佈在二不同除汙層1的通電網格13表面。於一實際的例子中,所述有機物吸附層131係用於吸附氣態有機物,有機物吸附層131為矽高分子材料(silicone polymers),所述矽高分子材料例如但不限為矽膠、聚二甲基矽氧烷(Polydimethylsiloxane,PDMS)、苯甲基聚矽氧烷(phenylmethyl polysiloxane;包含50%苯基phenyl與50%甲基methyl)、三氟丙基甲基聚矽氧烷(trifluoropropylmethyl polysiloxane;包含50%三氟丙基trifluoropropyl與50%甲基methyl)、氰丙基苯基甲基聚矽氧烷(cyanopropylphenylmethyl polysiloxane;包含50%氰丙基cyanopropyl與50%苯甲基phenylmethyl)。除矽高分子材料之外,有機物吸附層131也可以是聚乙二醇(polyethylene glycol,PEG)、角鯊烷(squalane)或超高真空油脂(Apiezon L);所述無機物吸附層132係用於吸附氣態無機物。於一實際的例子中,無機物吸附層132如本申請人所請之中華民國專利:一種用於吸收光罩保護膜黏膠中汙染物質的組合物(公告號I789737),具體包含1~10重量百分比(wt%)的高分子有機酸以及90~99重量百分比(wt%)水性壓克力壓敏膠。所述高分子有機酸係為聚丙烯酸(polyacrylic acid,PAA)或聚甲基丙烯酸(poly(methacrylic acid),PMMA)。高分子有機酸也可替換為陰離子型高分子材料,所述陰離子型高分子材料係為聚(4-乙烯基苯甲酸)(Poly(4-vinylbenzoic acid))或聚苯乙烯磺酸(polystyrene sulphonic acid resin)。
The adsorption layer for adsorbing pollutants includes an
實務上,有機物吸附層131或無機物吸附層132可以是透過工具塗刷、噴塗或是浸泡等任一方式塗佈於通電網格13的表面上,本實施例在此不限
制,只要有機物吸附層131或無機物吸附層132附著在通電網格13的表面上,不會輕易的分離或掉落,即屬於本實施例有機物吸附層131塗佈於通電網格13的表面,以及無機物吸附層132塗佈於通電網格13的表面的範疇。
In practice, the organic
於本實施例中,過濾層2係為纖維網布,例如但不限為不織布。
In this embodiment, the
針對於除汙層1與過濾層2的結合說明如下。過濾層2係結合在除汙層1的外側,在第1圖的實施例中,過濾層2係結合在除汙層1的第一側面14。在其他實施例中,請參閱第2圖,第2圖為除汙層1與過濾層2於其他實施例的結構立體分解示意圖。如圖中所示,在除汙層1的第一側面14與第二側面15皆結合過濾層2。實務上,過濾層2可以是透過螺絲、快拆件、扣具、釘子或黏著劑等任一方式結合於除汙層1上,本實施例在此不限制,只要過濾層2結合在除汙層1上,不會輕易的分離或掉落,即屬於本實施例過濾層2係結合在除汙層1的外側的範疇。所述第一側面14或第二側面15是指微塵或汙染物(氣態有機物或氣態無機物)通過除汙層1的側面,換句話說,除汙層1的第一側面14或第二側面15係供微塵或汙染物通過的側面。而第一側面14與第二側面15係為兩相對的面。在其他實施例中,除汙層1的有機物吸附層131或無機物吸附層132也可吸附微塵,因此,除汙層1也可不須結合過濾層2。
The combination of the
接著,請一併參閱第3圖,第3圖為除汙層1與過濾層2結合成過濾除汙板10的剖面示意圖。如圖中所示,除汙層1在與過濾層2結合後成為一過濾除汙板10,因此,本實施例中,二除汙層1分別與二過濾層2結合,具有二過濾除汙板10。
Next, please refer to Figure 3. Figure 3 is a schematic cross-sectional view of the
請參閱第4圖,第4圖為二過濾除汙板10設置在一通風管道A的側面示意圖。如圖中所示,於本實施例中,複數過濾除汙板10係設置在一通風管
道A之中,所述通風管道A係連通至一無塵室B,在通風管道A中靠近無塵室B的位置則設置抽風裝置3,抽風裝置3電性連接供電裝置4。
Please refer to Figure 4. Figure 4 is a schematic side view of two filter and
供電裝置4的設計可見第5圖。第5圖為供電裝置4的配置簡易線路圖,如圖中所示,供電裝置4係電性連接每個除汙層1的導電接腳12以及抽風裝置3,以提供除汙層1與抽風裝置3所需電能。所述供電裝置4包含一電源41、一開關42與一電路保護元件43所連接的電路配置,電源41可以是市電或電池,本實施例在此不限制,開關42則用於開啟或關閉電源41,而電路保護元件43係用於保護電路的安全,例如但不限於漏電斷路器、無熔絲開關、閘刀開關、電磁開關或微型斷路器。
The design of the
於一例子中,請參閱第6圖,第6圖係為二過濾除汙板10與抽風裝置3被裝設在一承載架5上的立體示意圖。如圖中所示,所述承載架5係為中空的殼體,且設置在連通至無塵室B的通風管道A內。承載架5的兩內側面上具有複數組相對應的插槽51,每一組相對應的插槽51用於組裝一個過濾除汙板10。在第6圖的例子中,於承載架5的內側面凸起兩道槽壁511,而插槽51則係形成於兩道槽壁511之間,在其他例子中,插槽51也可以是於承載架5的內側面凹入而形成(圖未示)。於一實際的例子中,每一組相對應的插槽51係指分別位在承載架5的左側與右側的內側面上,一過濾除汙板10的左右兩側邊可分別插入左側插槽51與右側插槽51,以完成插槽51與過濾除汙板10的組裝,以此類推,將複數個過濾除汙板10各別組裝於每組相對應的插槽51中。接著,在承載架5的前端具有一通風入口52,而後端具有一通風出口53,通風出口53係朝向無塵室B,抽風裝置3則係組裝在通風出口53。實務上,抽風裝置3可以是透過螺紋、卡榫、快拆件、扣具、釘子、黏著劑或電銲任一方式組裝在通風出口53,本實施例在此不
限制,只要抽風裝置3組裝在通風出口53,不會輕易的分離或掉落,即屬於本實施例抽風裝置3係組裝在通風出口53的範疇。此外,供電裝置4可以是組裝在承載架5的內側或外側,也可以牽線組裝在通風管道A或無塵室B(本實施例圖示僅揭示組裝在無塵室B),本實施例在此不限制。
In an example, please refer to Figure 6. Figure 6 is a schematic three-dimensional view of two filtering and
藉此,以實際的作動來說,請參閱第7圖,第7圖係為本創作之抽風裝置3實施抽風的剖面作動示意圖。如圖中所示,在啟動開關42後,電源41可供應電能給除汙層1與抽風裝置3。抽風裝置3在通電後,可啟動抽風,而抽風裝置3係組裝在通風出口53,因此在啟動抽風後,將外部空氣經由經通風入口52抽向通風出口53,並往通風出口53外排進無塵室B。在空氣經由經通風入口52抽向通風出口53的過程中,空氣會依序的通過每一個過濾除汙板10。實務上,無塵室B內的空氣可再循環回通風管道A。
In terms of actual operation, please refer to Figure 7. Figure 7 is a schematic diagram of the cross-sectional operation of the
接著,請參閱第8圖,第8圖係為本創作之過濾除汙板10實施過濾的剖面作動示意圖。如圖中所示,實務上,無塵室B的空氣C中可能含有微塵C1、第一汙染物C2與第二汙染物C3,所述第一汙染物C2為氣態有機物,第二汙染物C3為氨氣(氣態無機物),空氣C通過過濾除汙板10之時,微塵C1係被過濾層2捕捉,第一汙染物C2係被有機物吸附層131所吸附,第二汙染物C3係被無機物吸附層132所吸附,而部分未被過濾層2捕捉的微塵C1也可被有機物吸附層131或無機物吸附層132所吸附,達到將第一汙染物C2與第二汙染物C3吸附過濾之目的。如此一來,可同時過濾出微塵C1以及氣態有機物與氨氣。值得一提的是,過濾除汙板10可以選擇與替換,例如場所中氣態有機物較多,可以使用較多塗佈有有機物吸附層131的過濾除汙板10。換句話說,場所中氨氣較多,可以使用較多塗佈有無機物吸附層132的過濾除汙板10。
Next, please refer to Figure 8. Figure 8 is a schematic cross-sectional view of the filtration and
接著,除汙層1在通電後,可使得外框11與通電網格13被加熱,當加熱溫度達到40℃以上時(例如但不限為40℃~60℃,其包含40℃、41℃、42°C、43℃、44℃、45℃、46℃、47℃、48℃、49℃、50℃、51℃、52℃、53℃、54℃、55℃、56℃、57℃、58℃、59℃、60℃),可降低有機物吸附層131與無機物吸附層132對於微塵C1、第一汙染物C2或第二汙染物C3的吸附力。屆時,請一併參閱第9圖,第9圖係為本創作透過一吹風裝置6實施消除微塵C1、第一汙染物C2與第二汙染物C3的剖面作動示意圖。如圖中所示,透過一吹風裝置6將乾淨空氣吹向外框11與通電網格13。使得微塵C1、第一汙染物C2與第二汙染物C3可輕易的由吸附力降低的無機物吸附層132上被帶離,以達到消除微塵C1、第一汙染物C2與第二汙染物C3之目的。所述乾淨空氣,可以是經過過濾無汙染物的空氣,也可以是惰性氣體(例如但不限於氮氣)。
Next, after the
本創作已透過上述之實施例揭露如上,僅是本創作部分較佳的實施例選擇,然其並非用以限定本創作,任何熟悉此一技術領域具有通常知識者,在瞭解本創作前述的技術特徵及實施例,並在不脫離本創作之精神和範圍內所做的均等變化或潤飾,仍屬本創作涵蓋之範圍,而本創作之專利保護範圍須視本說明書所附之請求項所界定者為準。 The present invention has been disclosed through the above-mentioned embodiments, which are only some of the better embodiments of the present invention. However, they are not used to limit the present invention. Anyone who is familiar with this technical field and has ordinary knowledge can understand the foregoing technology of the present invention. features and embodiments, and any equivalent changes or modifications made without departing from the spirit and scope of the present invention are still within the scope of the present invention, and the patent protection scope of the present invention must be defined by the claims attached to this specification. Whichever prevails.
1:除汙層 1: Decontamination layer
11:外框 11:Outer frame
12:導電接腳 12: Conductive pins
13:通電網格 13: energized grid
131:有機物吸附層 131: Organic matter adsorption layer
132:無機物吸附層 132: Inorganic adsorption layer
2:過濾層 2:Filter layer
3:抽風裝置 3:Exhaust device
4:供電裝置 4: Power supply device
Claims (10)
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| TWI875030B (en) * | 2023-06-12 | 2025-03-01 | 美商微相科技股份有限公司 | Filter device for clean rooms |
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