[go: up one dir, main page]

TWM644162U - Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box - Google Patents

Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box Download PDF

Info

Publication number
TWM644162U
TWM644162U TW112202938U TW112202938U TWM644162U TW M644162 U TWM644162 U TW M644162U TW 112202938 U TW112202938 U TW 112202938U TW 112202938 U TW112202938 U TW 112202938U TW M644162 U TWM644162 U TW M644162U
Authority
TW
Taiwan
Prior art keywords
photomask
space
inner box
positioning
driving member
Prior art date
Application number
TW112202938U
Other languages
Chinese (zh)
Inventor
詹印豐
杜林炘
羅銘模
Original Assignee
家碩科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 家碩科技股份有限公司 filed Critical 家碩科技股份有限公司
Priority to TW112202938U priority Critical patent/TWM644162U/en
Publication of TWM644162U publication Critical patent/TWM644162U/en

Links

Images

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

一種降低粉塵汙染的光罩內盒承載裝置,包含:隔離板、複數腳座、第一定位模組及第二定位模組,隔離板將空間劃分為內藏空間及承載空間,複數腳座設置於承載空間中,第一定位模組包括第一驅動構件及至少一第一定位構件,第一驅動構件設置於內藏空間中並被設置為可沿第一方向移動,第一定位構件的頂部凸伸至承載空間,第二定位模組包括第二驅動構件及至少一第二定位構件,第二驅動構件設置於內藏空間中並被設置為可沿第二方向移動,第二定位構件的頂部凸伸至承載空間。本創作還提供一種具有前述光罩內盒承載裝置的光罩內盒的光學檢查設備。本創作可避免光罩內盒在執行檢查的過程中受到不預期的汙染。A photomask inner box carrying device for reducing dust pollution, comprising: an isolation plate, a plurality of feet, a first positioning module and a second positioning module, the isolation plate divides the space into a built-in space and a carrying space, and the plurality of feet are set In the carrying space, the first positioning module includes a first driving member and at least one first positioning member. The first driving member is arranged in the built-in space and is configured to move along the first direction. The top of the first positioning member The second positioning module includes a second driving member and at least one second positioning member. The second driving member is arranged in the built-in space and is configured to move along the second direction. The second positioning member The top protrudes to the carrying space. The invention also provides an optical inspection device for a photomask inner box with the aforementioned photomask inner box carrying device. The invention prevents undesired contamination of the reticle inner pod during the inspection process.

Description

降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box

本創作係關於一種光罩載具,更特別的是關於一種降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備。This creation is about a photomask carrier, more particularly about a photomask inner box carrying device that reduces dust pollution and optical inspection equipment for the photomask inner box.

在半導體領域的先進微影製程中,特別是EUV(極紫外光)微影製程,對製程環境的潔淨度要求極高。若有塵粒(particle)汙染光罩,則會造成微影製程的缺陷。為達到潔淨度與保護光罩的需求,一般使用光罩盒以阻攔外界的塵粒。因此極紫外光微影製程的光罩盒,特別是直接接觸光罩的光罩內盒,其本身的潔淨度便變得非常重要。In the advanced lithography process in the semiconductor field, especially the EUV (extreme ultraviolet) lithography process, the cleanliness of the process environment is extremely high. If dust particles (particles) contaminate the photomask, it will cause defects in the lithography process. In order to meet the requirements of cleanliness and protection of the mask, a mask box is generally used to block external dust particles. Therefore, the cleanliness of the photomask pods in the EUV lithography process, especially the photomask inner boxes directly contacting the photomasks, becomes very important.

為了確保光罩內盒乾淨無虞,對光罩內盒執行檢查是必要的。然而,在對光罩內盒進行移動、定位等檢查必經過程中,檢查設備的移動也可能產生摩擦的粉塵,對光罩內盒造成進一步的危害。In order to ensure that the reticle inner box is clean and sound, it is necessary to perform an inspection of the reticle inner box. However, in the necessary process of inspection such as moving and positioning the inner box of the photomask, the movement of the inspection equipment may also generate frictional dust, causing further damage to the inner box of the photomask.

因此,為解決習知光罩內盒檢查的種種問題,本創作提出一種降低粉塵汙染的光罩內盒承載裝置。Therefore, in order to solve various problems of conventional photomask inner box inspection, this invention proposes a photomask inner box carrying device that reduces dust pollution.

為達上述目的及其他目的,本創作提出一種降低粉塵汙染的光罩內盒承載裝置,其包含:一隔離板,將空間劃分為一內藏空間及一承載空間;複數腳座,設置於該承載空間中,該複數腳座各自的底部連接於該隔離板,該複數腳座各自的頂部的位置共平面;一第一定位模組,包括一第一驅動構件及至少一第一定位構件,該第一驅動構件設置於該內藏空間中並被設置為可沿一第一方向移動,該第一定位構件的底部連接該第一驅動構件,該第一定位構件的頂部凸伸至該承載空間;以及一第二定位模組,包括一第二驅動構件及至少一第二定位構件,該第二驅動構件設置於該內藏空間中並被設置為可沿一第二方向移動,該第二定位構件的底部連接該第二驅動構件,該第二定位構件的頂部凸伸至該承載空間,其中該第一方向及該第二方向的共平面平行於該複數腳座的頂部的共平面。In order to achieve the above purpose and other purposes, this creation proposes a photomask inner box carrying device that reduces dust pollution, which includes: a partition board that divides the space into a built-in space and a load space; In the carrying space, the respective bottoms of the plurality of feet are connected to the isolation plate, and the positions of the respective tops of the plurality of feet are coplanar; a first positioning module includes a first driving member and at least one first positioning member, The first driving member is disposed in the built-in space and configured to move along a first direction, the bottom of the first positioning member is connected to the first driving member, and the top of the first positioning member protrudes to the bearing space; and a second positioning module, including a second driving member and at least one second positioning member, the second driving member is arranged in the built-in space and is configured to move along a second direction, the first The bottoms of the two positioning members are connected to the second driving member, and the tops of the second positioning members protrude to the bearing space, wherein the co-plane of the first direction and the second direction is parallel to the co-plane of the tops of the plurality of feet .

於本創作之一實施例中,更包括一對準準心,設置於該承載空間。In one embodiment of the invention, an alignment center is further included in the bearing space.

於本創作之一實施例中,更包括一接觸感應器,設置於該承載空間。In one embodiment of the invention, a touch sensor is further included in the bearing space.

於本創作之一實施例中,更包括一光學感應器,設置於該承載空間。In one embodiment of the invention, an optical sensor is further included in the bearing space.

本創作又提出一種光罩內盒的光學檢查設備,其包含:如前述之降低粉塵汙染的光罩內盒承載裝置;一光學攝影裝置,朝向該承載空間;以及一控制裝置,訊號連接該光學攝影裝置、該第一驅動構件及該第二驅動構件。This creation also proposes an optical inspection device for a photomask inner box, which includes: the photomask inner box carrying device for reducing dust pollution as mentioned above; an optical photography device facing the carrying space; and a control device, which is signally connected to the optical A photographing device, the first driving component and the second driving component.

藉此,本創作的降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備,藉由隔離板將空間劃分為內藏空間及承載空間,待檢測的光罩內盒設置於承載空間中,而可能造成汙染的粉塵微粒的可動件,即第一驅動構件及第二驅動構件則埋藏於內藏空間中,減少對光罩內盒產生不必要的汙染,提升光罩內盒的清潔度以及檢察的可靠性。In this way, the photomask inner box carrying device and the optical inspection equipment for the photomask inner box that reduce dust pollution in this invention divide the space into a built-in space and a carrying space by means of the isolation plate, and the photomask inner box to be inspected is set in the In the carrying space, the movable parts of the dust particles that may cause pollution, that is, the first driving member and the second driving member are buried in the inner space to reduce unnecessary pollution to the inner box of the photomask and lift the inner box of the photomask Cleanliness and reliability of inspections.

為充分瞭解本創作,茲藉由下述具體之實施例,並配合所附之圖式,對本創作做一詳細說明。本領域技術人員可由本說明書所公開的內容瞭解本創作的目的、特徵及功效。須注意的是,本創作可透過其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本創作的精神下進行各種修飾與變更。以下的實施方式將進一步詳細說明本創作的相關技術內容,但所公開的內容並非用以限制本創作的申請專利範圍。說明如後:In order to fully understand this creation, this creation will be described in detail by the following specific examples and accompanying drawings. Those skilled in the art can understand the purpose, features and effects of this creation from the content disclosed in this specification. It should be noted that this creation can be implemented or applied through other different specific embodiments, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of this creation. The following embodiments will further describe the relevant technical content of this creation in detail, but the disclosed content is not intended to limit the patent scope of this creation. The instructions are as follows:

如圖1A及圖1B所示,本創作實施例之降低粉塵汙染的光罩內盒承載裝置100,其包含:一隔離板1、複數腳座2、一第一定位模組3及第二定位模組4。As shown in Fig. 1A and Fig. 1B, the photomask inner box carrying device 100 for reducing dust pollution in the embodiment of the invention includes: a separation plate 1, a plurality of feet 2, a first positioning module 3 and a second positioning module Mod 4.

隔離板1將空間劃分為一內藏空間S1及一承載空間S2。較佳地,內藏空間S1位於隔離板1的重力方向的下方,承載空間S2位於隔離板1的重力方向的上方,然而本創作不限於此。在本實施例中,隔離板1為平面的板狀,然而本創作不限於此,在其他實施例中,隔離板1可為表面有其他起伏,或可為一盒體以罩覆位於其下的第一定位模組3、第二定位模組4。The isolation board 1 divides the space into a built-in space S1 and a carrying space S2. Preferably, the storage space S1 is located below the gravity direction of the isolation board 1 , and the bearing space S2 is located above the gravity direction of the isolation board 1 , but the present invention is not limited thereto. In this embodiment, the isolation board 1 is a planar plate, but the invention is not limited thereto. In other embodiments, the isolation board 1 may have other undulations on the surface, or may be a box to cover the The first positioning module 3 and the second positioning module 4.

複數腳座2設置於承載空間S2中。複數腳座2各自的底部21連接於隔離板1,複數腳座2各自的頂部22的位置共平面。如圖1B所示,頂部22是用來接觸光罩內盒P的主要位置,光罩內盒P位於該共平面上以被複數腳座2支撐。複數腳座2的數量最少要有三以上,在本實施例中的數量為四,以分別支撐光罩內盒P的四個角落。然而本創作不限於此,在其他實施例中,複數腳座2的數量、設置位置可根據需要加以改變。A plurality of feet 2 are disposed in the bearing space S2. The respective bottoms 21 of the plurality of feet 2 are connected to the isolation board 1 , and the positions of the respective tops 22 of the plurality of feet 2 are coplanar. As shown in FIG. 1B , the top 22 is the main location for contacting the pod P, which is located on the same plane to be supported by the feet 2 . The plurality of feet 2 must be at least three, and in this embodiment, the number is four, so as to support the four corners of the inner box P of the photomask respectively. However, the present invention is not limited thereto, and in other embodiments, the number and arrangement positions of the plurality of feet 2 can be changed as required.

第一定位模組3包括一第一驅動構件31及至少一第一定位構件32。第一驅動構件31設置於內藏空間S1中並被設置為可沿一第一方向d1向移動,第一驅動構件31例如是伺服馬達、汽缸,或具有傳輸直線動力的機構。第一定位構件32呈長條狀,第一定位構件32的底部連接第一驅動構件31,第一定位構件32的頂部凸伸至承載空間S2。第一定位構件32的用途是協助光罩內盒P在第一方向d1上的定位,透過第一驅動構件31調整在第一方向d1上的位置,使第一定位構件32定位出光罩內盒P的位置。在本實施例中,第一定位模組3包括二第一定位構件32,二第一定位構件32的底部皆連接第一驅動構件31並受第一驅動構件31的帶動。二第一定位構件32彼此平行地設置,以增加對光罩內盒P的有效限位。然而本創作不限於此,在其他實施例中,第一定位構件32的型態、數量可加以改變。在本實施例中,隔離板1的一側設置第一定位模組3,但在其他實施例中,可在隔離板1的二側分別設置第一定位模組3。The first positioning module 3 includes a first driving component 31 and at least one first positioning component 32 . The first driving member 31 is disposed in the storage space S1 and configured to move along a first direction d1. The first driving member 31 is, for example, a servo motor, a cylinder, or a mechanism for transmitting linear power. The first positioning member 32 is elongated, the bottom of the first positioning member 32 is connected to the first driving member 31 , and the top of the first positioning member 32 protrudes to the bearing space S2. The purpose of the first positioning member 32 is to assist the positioning of the photomask inner box P in the first direction d1, through the first driving member 31 to adjust the position in the first direction d1, so that the first positioning member 32 is positioned out of the photomask inner box P's position. In this embodiment, the first positioning module 3 includes two first positioning members 32 , the bottoms of the two first positioning members 32 are connected to the first driving member 31 and driven by the first driving member 31 . The two first positioning members 32 are arranged parallel to each other, so as to effectively limit the inner box P of the photomask. However, the invention is not limited thereto, and in other embodiments, the type and quantity of the first positioning members 32 can be changed. In this embodiment, the first positioning module 3 is provided on one side of the isolation plate 1 , but in other embodiments, the first positioning modules 3 may be respectively provided on both sides of the isolation plate 1 .

相似地,第二定位模組4包括一第二驅動構件41及至少一第二定位構件42。第二驅動構件41設置於內藏空間S1中並被設置為可沿一第二方向d2向移動,第二驅動構件41例如是伺服馬達、汽缸,或具有傳輸直線動力的機構。第二定位構件42呈長條狀,第二定位構件42的底部連接第二驅動構件41,第二定位構件42的頂部凸伸至承載空間S2。第二定位構件42的用途是協助光罩內盒P在第二方向d2上的定位,透過第二驅動構件41調整在第二方向d2上的位置,使第二定位構件42定位出光罩內盒P的位置。在本實施例中,第二定位模組4包括二第二定位構件42,二第二定位構件42的底部皆連接第二驅動構件41並受第二驅動構件41的帶動。二第二定位構件42彼此平行地設置,以增加對光罩內盒P的有效限位。然而本創作不限於此,在其他實施例中,第二定位構件42的型態、數量可加以改變。在本實施例中,隔離板1的一側設置第二定位模組4,但在其他實施例中,可在隔離板1的二側分別設置第二定位模組4。Similarly, the second positioning module 4 includes a second driving component 41 and at least one second positioning component 42 . The second driving member 41 is disposed in the storage space S1 and configured to move along a second direction d2. The second driving member 41 is, for example, a servo motor, a cylinder, or a mechanism for transmitting linear power. The second positioning member 42 is elongated, the bottom of the second positioning member 42 is connected to the second driving member 41 , and the top of the second positioning member 42 protrudes to the bearing space S2. The purpose of the second positioning member 42 is to assist the positioning of the photomask inner box P in the second direction d2, through the second driving member 41 to adjust the position in the second direction d2, so that the second positioning member 42 is positioned out of the photomask inner box P's position. In this embodiment, the second positioning module 4 includes two second positioning members 42 , the bottoms of the two second positioning members 42 are connected to the second driving member 41 and driven by the second driving member 41 . The two second positioning members 42 are arranged parallel to each other, so as to effectively limit the inner box P of the photomask. However, the invention is not limited thereto, and in other embodiments, the type and quantity of the second positioning members 42 can be changed. In this embodiment, the second positioning module 4 is provided on one side of the isolation plate 1 , but in other embodiments, the second positioning modules 4 may be respectively provided on both sides of the isolation plate 1 .

前述的第一方向d1及第二方向d2的共平面平行於複數腳座2的頂部22的共平面,也就是說,第一定位模組3和第二定位模組4的移動/定位方向皆是在光罩內盒P所在的平面上,第一定位模組3和第二定位模組4協同在平面的兩個方向上提供對光罩內盒P的限位。在本實施例中,第一方向d1及第二方向d2為彼此垂直,可分別為X軸與Y軸,而Z軸是前述的重力方向。然而本創作不限於此,在其他實施例中,第一方向d1及第二方向d2未必垂直,而第一方向d1及第二方向d2也未必垂直於重力方向。The aforementioned co-planes of the first direction d1 and the second direction d2 are parallel to the co-planes of the tops 22 of the plurality of bases 2, that is to say, the moving/positioning directions of the first positioning module 3 and the second positioning module 4 are both It is on the plane where the inner box P of the photomask is located, and the first positioning module 3 and the second positioning module 4 cooperate to limit the inner box P of the photomask in two directions of the plane. In this embodiment, the first direction d1 and the second direction d2 are perpendicular to each other, which may be the X axis and the Y axis respectively, and the Z axis is the aforementioned gravity direction. However, the invention is not limited thereto. In other embodiments, the first direction d1 and the second direction d2 are not necessarily perpendicular, and the first direction d1 and the second direction d2 are not necessarily perpendicular to the gravity direction.

綜上所述,藉由隔離板1將空間劃分為內藏空間S1及承載空間S2,待檢測的光罩內盒P設置於承載空間S2中,而可能造成汙染的粉塵微粒的可動件,即第一驅動構件31及第二驅動構件41則埋藏於內藏空間S1中,減少對光罩內盒P產生不必要的汙染,提升光罩內盒的清潔度以及檢察的可靠性。To sum up, the space is divided into the built-in space S1 and the carrying space S2 by the isolation plate 1, and the photomask inner box P to be tested is set in the carrying space S2, and the movable parts of dust particles that may cause pollution, namely The first driving member 31 and the second driving member 41 are buried in the inner space S1 to reduce unnecessary pollution to the photomask inner box P and improve the cleanliness of the photomask inner box and the reliability of inspection.

進一步地,在本實施例中,降低粉塵汙染的光罩內盒承載裝置100更包括一對準準心5,設置於承載空間S2。對準準心5用以供外部裝置讀取,以判斷是否對準光罩內盒承載裝置100,或是否尚需移動降低粉塵汙染的光罩內盒承載裝置100的位置。在本實施例中,對準準心5為十字準心,十字的延伸方向分別匹配第一方向d1及第二方向d2,然而本創作不限於此。Further, in this embodiment, the photomask-in-box carrying device 100 for reducing dust pollution further includes an alignment center 5 disposed in the carrying space S2. The alignment center 5 is used for reading by an external device to determine whether to align the reticle-in-box carrying device 100 or whether to move the position of the reticle-in-box carrying device 100 to reduce dust pollution. In this embodiment, the alignment center 5 is a cross, and the extension directions of the cross match the first direction d1 and the second direction d2 respectively, but the present invention is not limited thereto.

進一步地,在本實施例中,降低粉塵汙染的光罩內盒承載裝置100更包括一接觸感應器6,設置於承載空間S2。接觸感應器6用以接觸光罩內盒P的底部,判斷光罩內盒P是否已放置。接觸感應器6可為力學式的感應器或電磁式、壓電式的感應器,且本創作不限於此。Further, in this embodiment, the photomask-in-box carrying device 100 for reducing dust pollution further includes a contact sensor 6 disposed in the carrying space S2. The contact sensor 6 is used for contacting the bottom of the photomask inner box P to determine whether the photomask inner box P has been placed. The touch sensor 6 can be a mechanical sensor or an electromagnetic or piezoelectric sensor, and the present invention is not limited thereto.

進一步地,在本實施例中,降低粉塵汙染的光罩內盒承載裝置100更包括一光學感應器7,設置於承載空間S2。光學感應器7以光學的方式判斷光罩內盒P是否已放置。光學感應器7可利用例如紅外線偵測器等元件的反射光或入射光以判定光罩內盒P是否存在於承載空間S2中。Further, in this embodiment, the photomask-in-box carrying device 100 for reducing dust pollution further includes an optical sensor 7 disposed in the carrying space S2. The optical sensor 7 optically judges whether the box P has been placed. The optical sensor 7 can use the reflected light or incident light of components such as infrared detectors to determine whether the pod P exists in the carrying space S2.

進一步地,如圖2所示,本創作還提出一種光罩內盒的光學檢查設備,其包含前述的降低粉塵汙染的光罩內盒承載裝置100、一光學攝影裝置8及一控制裝置9。Further, as shown in FIG. 2 , the present invention also proposes an optical inspection device for a photomask inner box, which includes the aforementioned photomask inner box carrying device 100 for reducing dust pollution, an optical photography device 8 and a control device 9 .

光學攝影裝置8的鏡頭朝向承載空間S2以拍攝光罩內盒P的影像。The lens of the optical photography device 8 is directed towards the carrying space S2 to capture the image of the box P in the mask.

控制裝置9訊號連接光學攝影裝置8、第一驅動構件31及第二驅動構件41。控制裝置9例如是具有判斷邏輯電路的控制晶片或控制電路。控制裝置9控制光學攝影裝置8對準承載空間S2上的光罩內盒P以拍攝影像並執行光學檢查,控制裝置9還可控制第一驅動構件31及第二驅動構件41分別在第一方向d1、第二方向d2的移動,以調整光罩內盒P的定位。The control device 9 is signal-connected to the optical photography device 8 , the first driving component 31 and the second driving component 41 . The control device 9 is, for example, a control chip or a control circuit with a judgment logic circuit. The control device 9 controls the optical photography device 8 to align with the photomask inner box P on the loading space S2 to take images and perform optical inspection. d1, movement in the second direction d2, to adjust the positioning of the inner box P of the photomask.

本創作在上文中已以實施例揭露,然熟習本項技術者應理解的是,該實施例僅用於描繪本創作,而不應解讀為限制本創作之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本創作之範疇內。因此,本創作之保護範圍當以申請專利範圍所界定者為準。The invention has been disclosed in the above embodiments, but those skilled in the art should understand that the embodiments are only used to describe the invention, and should not be construed as limiting the scope of the invention. It should be noted that all changes and replacements equivalent to the embodiments should be included in the scope of this creation. Therefore, the scope of protection of this creation should be defined by the scope of the patent application.

100:降低粉塵汙染的光罩內盒承載裝置 1:隔離板 2:腳座 21:底部 22:頂部 3:第一定位模組 31:第一驅動構件 32:第一定位構件 4:第二定位模組 41:第二驅動構件 42:第二定位構件 5:對準準心 6:接觸感應器 7:光學感應器 8:光學攝影裝置 9:控制裝置 d1:第一方向 d2:第二方向 P:光罩內盒 S1:內藏空間 S2:承載空間 100: Photomask Inner Box Carrying Device for Reducing Dust Pollution 1: Isolation board 2: foot seat 21: Bottom 22: top 3: The first positioning module 31: the first driving member 32: The first positioning member 4: The second positioning module 41: second driving member 42: Second positioning member 5: Align the center 6: Contact sensor 7: Optical sensor 8: Optical photography device 9: Control device d1: the first direction d2: second direction P: Reticle inner box S1: Built-in space S2: carrying space

圖1A係為根據本創作實施例之降低粉塵汙染的光罩內盒承載裝置之立體示意圖。 圖1B係為根據本創作實施例之承載光罩內盒之示意圖。 圖2係為根據本創作實施例之光罩內盒的光學檢查設備之立體示意圖。 FIG. 1A is a three-dimensional schematic diagram of a photomask-in-box carrying device for reducing dust pollution according to an embodiment of the present invention. FIG. 1B is a schematic diagram of an inner box carrying a photomask according to an embodiment of the present invention. FIG. 2 is a three-dimensional schematic diagram of an optical inspection device for a photomask inner box according to an embodiment of the present invention.

100:降低粉塵汙染的光罩內盒承載裝置 100: Photomask Inner Box Carrying Device for Reducing Dust Pollution

1:隔離板 1: Isolation board

2:腳座 2: foot seat

21:底部 21: Bottom

22:頂部 22: top

3:第一定位模組 3: The first positioning module

31:第一驅動構件 31: the first driving member

32:第一定位構件 32: The first positioning member

4:第二定位模組 4: The second positioning module

41:第二驅動構件 41: second driving member

42:第二定位構件 42: Second positioning member

5:對準準心 5: Align the center

6:接觸感應器 6: Contact sensor

7:光學感應器 7: Optical sensor

d1:第一方向 d1: the first direction

d2:第二方向 d2: second direction

S1:內藏空間 S1: Built-in space

S2:承載空間 S2: carrying space

Claims (5)

一種降低粉塵汙染的光罩內盒承載裝置,其包含: 一隔離板,將空間劃分為一內藏空間及一承載空間; 複數腳座,設置於該承載空間中,該複數腳座各自的底部連接於該隔離板,該複數腳座各自的頂部的位置共平面; 一第一定位模組,包括一第一驅動構件及至少一第一定位構件,該第一驅動構件設置於該內藏空間中並被設置為可沿一第一方向移動,該第一定位構件的底部連接該第一驅動構件,該第一定位構件的頂部凸伸至該承載空間;以及 一第二定位模組,包括一第二驅動構件及至少一第二定位構件,該第二驅動構件設置於該內藏空間中並被設置為可沿一第二方向移動,該第二定位構件的底部連接該第二驅動構件,該第二定位構件的頂部凸伸至該承載空間, 其中該第一方向及該第二方向的共平面平行於該複數腳座的頂部的共平面。 A photomask inner box carrying device for reducing dust pollution, comprising: A separation board divides the space into a built-in space and a load-bearing space; A plurality of feet are arranged in the load-bearing space, the respective bottoms of the plurality of feet are connected to the isolation plate, and the positions of the respective tops of the plurality of feet are in the same plane; A first positioning module, including a first driving member and at least one first positioning member, the first driving member is arranged in the built-in space and configured to move along a first direction, the first positioning member The bottom of the first driving member is connected to the first driving member, and the top of the first positioning member protrudes to the carrying space; and A second positioning module, including a second driving member and at least one second positioning member, the second driving member is arranged in the built-in space and configured to move along a second direction, the second positioning member The bottom of the second driving member is connected to the second driving member, and the top of the second positioning member protrudes to the carrying space, Wherein the co-plane of the first direction and the second direction is parallel to the co-plane of the tops of the plurality of feet. 如請求項1所述之降低粉塵汙染的光罩內盒承載裝置,更包括一對準準心,設置於該承載空間。The photomask inner box carrying device for reducing dust pollution as described in Claim 1 further includes an alignment center disposed in the carrying space. 如請求項1所述之降低粉塵汙染的光罩內盒承載裝置,更包括一接觸感應器,設置於該承載空間。The photomask inner box carrying device for reducing dust pollution as described in claim 1 further includes a contact sensor disposed in the carrying space. 如請求項1所述之降低粉塵汙染的光罩內盒承載裝置,更包括一光學感應器,設置於該承載空間。The photomask-in-box carrying device for reducing dust pollution as described in Claim 1 further includes an optical sensor disposed in the carrying space. 一種光罩內盒的光學檢查設備,其包含: 如請求項1至4任一項所述之降低粉塵汙染的光罩內盒承載裝置; 一光學攝影裝置,朝向該承載空間;以及 一控制裝置,訊號連接該光學攝影裝置、該第一驅動構件及該第二驅動構件。 An optical inspection device for a photomask inner box, comprising: The photomask inner box carrying device for reducing dust pollution as described in any one of claims 1 to 4; an optical photographing device facing the carrying space; and A control device, signally connected to the optical photography device, the first driving component and the second driving component.
TW112202938U 2023-03-30 2023-03-30 Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box TWM644162U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW112202938U TWM644162U (en) 2023-03-30 2023-03-30 Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW112202938U TWM644162U (en) 2023-03-30 2023-03-30 Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box

Publications (1)

Publication Number Publication Date
TWM644162U true TWM644162U (en) 2023-07-21

Family

ID=88149005

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112202938U TWM644162U (en) 2023-03-30 2023-03-30 Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box

Country Status (1)

Country Link
TW (1) TWM644162U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI892681B (en) * 2024-06-06 2025-08-01 家碩科技股份有限公司 Photomask box carrying device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI892681B (en) * 2024-06-06 2025-08-01 家碩科技股份有限公司 Photomask box carrying device

Similar Documents

Publication Publication Date Title
JP7379314B2 (en) Measurement system, substrate processing system, and device manufacturing method
TWI789362B (en) Measurement system and substrate processing system, and device manufacturing method
JP5146507B2 (en) Exposure apparatus, exposure method, and device manufacturing method
TWI506378B (en) An exposure apparatus, an exposure method, an element manufacturing method, and a transport method
JP6708222B2 (en) Exposure apparatus, flat panel display manufacturing method, and device manufacturing method
JP2020095041A (en) Measurement device, lithography system, and device manufacturing method
JP5348628B2 (en) Exposure apparatus, exposure method, and device manufacturing method
CN110869855B (en) Metrology equipment and substrate platform conveyor system
JPWO2011016254A1 (en) MOBILE DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
TW201734672A (en) Exposure apparatus
JP2015228519A (en) Exposure device, exposure method, and device manufacturing method
TWM644162U (en) Photomask inner box carrier device for reducing dust pollution and optical inspection equipment for photomask inner box
CN103091999A (en) Lithographic apparatus and device manufacturing method
JP2012028530A (en) Exposure device and method of manufacturing device
TWI868646B (en) Reticle inner box carrier for reducing dust pollution and optical inspection equipment for the mask inner box
WO2024195190A1 (en) Wafer bonding device and wafer bonding method
JP2004273666A (en) Exposure equipment
JP2012028528A (en) Exposure device and method of manufacturing device
JP2002168796A (en) Appearance inspection device
WO2024195192A1 (en) Substrate bonding apparatus and substrate bonding method
WO2024195191A1 (en) Substrate bonding apparatus and method for bonding substrate
TW202437002A (en) Optical inspection device for photomask box surface and optical inspection method for photomask box surface
JP2024136299A (en) Substrate bonding apparatus and substrate bonding method
JP2024136294A (en) Substrate bonding apparatus and substrate bonding method
JP2012089768A (en) Exposure device and device manufacturing method