TWM544117U - Pixel structure and display panel - Google Patents
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- 239000000758 substrate Substances 0.000 claims description 44
- 239000011159 matrix material Substances 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000004973 liquid crystal related substance Substances 0.000 description 9
- 238000009413 insulation Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000005684 electric field Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
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- 238000002834 transmittance Methods 0.000 description 1
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Abstract
Description
本新型創作是有關於一種畫素結構以及顯示面板,且特別是有關於一種改善漏光的畫素結構以及顯示面板。 The novel creation relates to a pixel structure and a display panel, and in particular to a pixel structure and a display panel for improving light leakage.
近年來具有高畫質、空間利用效率佳、低消耗功率、無輻射等優越特性的薄膜電晶體液晶顯示面板(TFT-LCD panel)已逐漸成為市場主流,其中又以高解析度的薄膜電晶體液晶顯示面板備受關注。顯示面板的解析度越高,代表畫素結構的密度越高。在傳統薄膜電晶體的設計下,薄膜電晶體附近的電場會影響液晶分子轉動,而導致薄膜電晶體附近產生漏光,且漏光問題會隨著畫素結構的密度越高而越顯著。一般會藉由增加遮光層的遮蔽面積去屏蔽薄膜電晶體附近的漏光。然而,遮光層的遮蔽面積越大,畫素結構的開口率越小。因此,如何在不大幅影響開口率的情況下,改善漏光問題,便成為此領域研發人員欲解決的議題之一。 In recent years, thin film transistor liquid crystal display panels (TFT-LCD panels) with high image quality, good space utilization efficiency, low power consumption, and no radiation have gradually become the mainstream in the market, and high-resolution thin film transistors are also used. Liquid crystal display panels have received much attention. The higher the resolution of the display panel, the higher the density of the pixel structure. Under the design of the traditional thin film transistor, the electric field near the thin film transistor affects the rotation of the liquid crystal molecules, which causes light leakage near the thin film transistor, and the light leakage problem becomes more significant as the density of the pixel structure is higher. Light leakage near the thin film transistor is generally shielded by increasing the shielding area of the light shielding layer. However, the larger the shielding area of the light shielding layer, the smaller the aperture ratio of the pixel structure. Therefore, how to improve the light leakage problem without greatly affecting the aperture ratio has become one of the topics that researchers in this field want to solve.
本新型創作提供一種畫素結構,其可在不影響開口率的 情況下,改善漏光問題。 The novel creation provides a pixel structure that does not affect the aperture ratio. In case, the problem of light leakage is improved.
本新型創作還提供一種顯示面板,其具有良好的顯示品質。 The novel creation also provides a display panel with good display quality.
本新型創作的一種畫素結構配置於基板上。畫素結構包括第一訊號線、第二訊號線、主動元件、第一電極以及第二電極。第二訊號線與第一訊號線相交。主動元件電性連接於第一訊號線與第二訊號線,其中主動元件包括閘極、通道層、源極以及汲極。閘極電性連接於第一訊號線。通道層重疊於閘極。源極電性連接於第二訊號線。源極與汲極重疊於通道層且彼此相對,以於通道層定義出位於源極與汲極之間的通道區。第一電極電性連接於汲極。第二電極電性絕緣且重疊於第一電極,其中第二電極具有多個條狀開口以及開孔。條狀開口與第一電極重疊。開孔與主動元件重疊且具有第一邊以及第二邊。第一邊以及源極位於閘極的同一側。第二邊以及汲極位於閘極的同一側。開孔曝露出通道區。第一邊以及第二邊分別位於閘極上方。第一邊與第一訊號線遠離閘極的側邊之間的第一距離以及第二邊與閘極遠離第一訊號線的側邊之間的第二距離分別大於或等於3微米。 A pixel structure created by the present invention is disposed on a substrate. The pixel structure includes a first signal line, a second signal line, an active element, a first electrode, and a second electrode. The second signal line intersects the first signal line. The active component is electrically connected to the first signal line and the second signal line, wherein the active component includes a gate, a channel layer, a source, and a drain. The gate is electrically connected to the first signal line. The channel layer overlaps the gate. The source is electrically connected to the second signal line. The source and drain are overlapped with the channel layer and opposite each other such that the channel layer defines a channel region between the source and the drain. The first electrode is electrically connected to the drain. The second electrode is electrically insulated and overlaps the first electrode, wherein the second electrode has a plurality of strip openings and openings. The strip opening overlaps the first electrode. The aperture overlaps the active component and has a first side and a second side. The first side and the source are on the same side of the gate. The second side and the drain are on the same side of the gate. The opening exposes the passage area. The first side and the second side are respectively located above the gate. The first distance between the first side and the side of the first signal line away from the gate and the second distance between the second side and the side of the gate remote from the first signal line are respectively greater than or equal to 3 microns.
本新型創作的一種顯示面板包括多個上述的畫素結構、對向基板以及顯示介質。畫素結構配置於基板上。對向基板與基板相對,且畫素結構位於基板與對向基板之間。顯示介質配置於畫素結構與對向基板之間。 A display panel created by the present invention includes a plurality of the above pixel structures, a counter substrate, and a display medium. The pixel structure is disposed on the substrate. The opposite substrate is opposite to the substrate, and the pixel structure is located between the substrate and the opposite substrate. The display medium is disposed between the pixel structure and the opposite substrate.
在本新型創作的畫素結構以及顯示面板的一實施例中, 第一距離以及第二距離分別小於或等於10微米。 In an embodiment of the novel pixel structure and display panel of the present invention, The first distance and the second distance are less than or equal to 10 microns, respectively.
在本新型創作的畫素結構以及顯示面板的一實施例中,源極與汲極之間具有溝渠,且開孔曝露出溝渠。 In an embodiment of the novel pixel structure and the display panel, there is a trench between the source and the drain, and the opening exposes the trench.
在本新型創作的畫素結構以及顯示面板的一實施例中,第一訊號線沿第一方向延伸。第二訊號線沿第二方向延伸。第二方向與第一方向相交,且各條狀開口的延伸方向不垂直且不平行於第一方向以及第二方向。 In an embodiment of the novel pixel structure and display panel of the present invention, the first signal line extends in the first direction. The second signal line extends in the second direction. The second direction intersects the first direction, and the extending direction of each strip opening is not perpendicular and is not parallel to the first direction and the second direction.
在本新型創作的顯示面板的一實施例中,顯示面板更包括黑矩陣層。黑矩陣層配置於對向基板上且位於顯示介質與對向基板之間,其中黑矩陣層遮蔽各畫素結構的第一訊號線、第二訊號線以及主動元件,且黑矩陣層具有多個透光孔。透光孔分別曝露出其中一第一電極。 In an embodiment of the display panel of the present invention, the display panel further includes a black matrix layer. The black matrix layer is disposed on the opposite substrate and located between the display medium and the opposite substrate, wherein the black matrix layer shields the first signal line, the second signal line, and the active component of each pixel structure, and the black matrix layer has multiple Light transmission hole. The light transmission holes respectively expose one of the first electrodes.
在本新型創作的顯示面板的一實施例中,顯示面板更包括多個彩色濾光圖案。彩色濾光圖案配置於對向基板上且位於顯示介質與對向基板之間,其中彩色濾光圖案分別配置在其中一透光孔中。 In an embodiment of the display panel of the present invention, the display panel further includes a plurality of color filter patterns. The color filter pattern is disposed on the opposite substrate and between the display medium and the opposite substrate, wherein the color filter patterns are respectively disposed in one of the light transmission holes.
基於上述,在本新型創作的畫素結構的實施例中,可在不改變閘極的面積下,使第二電極延伸至閘極以及第一訊號線的上方。藉由控制第一距離以及第二距離的大小,以降低主動元件附近的電場大小。主動元件附近的電場越小,液晶分子的旋轉角度越小,也就是漏光程度越低。因此,本新型創作的畫素結構可在不大幅影響開口率的情況下,改善漏光問題,且應用上述的畫素結構的 顯示面板可具有良好的顯示品質(如高開口率及高對比度等)。 Based on the above, in the embodiment of the novel pixel structure of the present invention, the second electrode can be extended to the gate and the first signal line without changing the area of the gate. The magnitude of the electric field in the vicinity of the active device is reduced by controlling the magnitude of the first distance and the second distance. The smaller the electric field near the active element, the smaller the angle of rotation of the liquid crystal molecules, that is, the lower the degree of light leakage. Therefore, the pixel structure of the novel creation can improve the light leakage problem without greatly affecting the aperture ratio, and the above pixel structure is applied. The display panel can have good display quality (such as high aperture ratio and high contrast).
為讓本新型創作的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will become more apparent and understood from the following description.
10‧‧‧顯示面板 10‧‧‧ display panel
100‧‧‧畫素結構 100‧‧‧ pixel structure
110‧‧‧第一訊號線 110‧‧‧First signal line
120‧‧‧第二訊號線 120‧‧‧second signal line
130‧‧‧主動元件 130‧‧‧Active components
140‧‧‧第一電極 140‧‧‧First electrode
150‧‧‧第二電極 150‧‧‧second electrode
160‧‧‧第一絕緣層 160‧‧‧First insulation
170‧‧‧第二絕緣層 170‧‧‧Second insulation
200‧‧‧對向基板 200‧‧‧ opposite substrate
300‧‧‧顯示介質 300‧‧‧Display media
A‧‧‧通道區 A‧‧‧ passage area
BM‧‧‧黑矩陣層 BM‧‧‧ black matrix layer
CF‧‧‧彩色濾光圖案 CF‧‧‧ color filter pattern
CH‧‧‧通道層 CH‧‧‧ channel layer
D1‧‧‧第一距離 D1‧‧‧First distance
D2‧‧‧第二距離 D2‧‧‧Second distance
DE‧‧‧汲極 DE‧‧‧汲
GE‧‧‧閘極 GE‧‧‧ gate
GI‧‧‧閘絕緣層 GI‧‧‧ brake insulation
O1‧‧‧條狀開口 O1‧‧‧ strip opening
O2‧‧‧開孔 O2‧‧‧ opening
O3‧‧‧透光孔 O3‧‧‧Light hole
S1‧‧‧第一邊 S1‧‧‧ first side
S2‧‧‧第二邊 S2‧‧‧ second side
S110、SGE‧‧‧側邊 S110, SGE‧‧‧ side
SE‧‧‧源極 SE‧‧‧ source
SUB‧‧‧基板 SUB‧‧‧ substrate
TH‧‧‧貫孔 TH‧‧‧Tongkong
X1‧‧‧第一方向 X1‧‧‧ first direction
X2‧‧‧第二方向 X2‧‧‧ second direction
I-I’‧‧‧剖線 I-I’‧‧‧ cut line
圖1是依照本新型創作的一實施例的一種顯示面板的剖面示意圖。 1 is a cross-sectional view of a display panel in accordance with an embodiment of the present invention.
圖2及圖3分別是圖1中畫素結構的上視示意圖。 2 and 3 are top plan views of the pixel structure of Fig. 1, respectively.
圖4是圖1中顯示面板的上視示意圖。 4 is a top plan view of the display panel of FIG. 1.
圖1是依照本新型創作的一實施例的一種顯示面板的剖面示意圖。圖2及圖3分別是圖1中畫素結構的上視示意圖,其中圖2省略圖1中位於第一電極之上的膜層,以清楚表示主動元件與第一電極的相對配置關係。圖4是圖1中顯示面板的上視示意圖,其中圖1所示的剖面對應圖4中剖線I-I’的剖面,惟圖4省略圖1中對向基板以及彩色濾光圖案,以清楚表示黑矩陣層、第一電極以及第二電極的相對配置關係。 1 is a cross-sectional view of a display panel in accordance with an embodiment of the present invention. 2 and 3 are top views of the pixel structure of FIG. 1, respectively, wherein FIG. 2 omits the film layer on the first electrode of FIG. 1 to clearly show the relative arrangement relationship between the active device and the first electrode. 4 is a top plan view of the display panel of FIG. 1, wherein the cross-section shown in FIG. 1 corresponds to the cross-sectional line I-I' of FIG. 4, but FIG. 4 omits the opposite substrate and the color filter pattern of FIG. The relative arrangement relationship of the black matrix layer, the first electrode, and the second electrode is clearly indicated.
請參照圖1至圖4,顯示面板10包括多個畫素結構100(圖1至圖4示意性繪示出一個畫素結構100)、對向基板200以及顯示介質300。畫素結構100配置於基板SUB上且可排列成二 維陣列。各畫素結構100包括第一訊號線110、第二訊號線120、主動元件130、第一電極140以及第二電極150。 Referring to FIGS. 1 through 4 , the display panel 10 includes a plurality of pixel structures 100 ( FIGS. 1 to 4 schematically illustrate one pixel structure 100 ), a counter substrate 200 , and a display medium 300 . The pixel structure 100 is disposed on the substrate SUB and can be arranged in two Dimension array. Each pixel structure 100 includes a first signal line 110, a second signal line 120, an active device 130, a first electrode 140, and a second electrode 150.
第二訊號線120與第一訊號線110相交。具體地,第一訊號線110沿第一方向X1延伸,且第二訊號線120沿與第一方向X1相交的第二方向X2延伸。第二方向X2與第一方向X1可相互垂直,但不以此為限。第一訊號線110可為掃描線,且第二訊號線120可為資料線,但不以此為限。 The second signal line 120 intersects the first signal line 110. Specifically, the first signal line 110 extends along the first direction X1, and the second signal line 120 extends along the second direction X2 that intersects the first direction X1. The second direction X2 and the first direction X1 may be perpendicular to each other, but are not limited thereto. The first signal line 110 can be a scan line, and the second signal line 120 can be a data line, but is not limited thereto.
主動元件130電性連接於第一訊號線110與第二訊號線120,其中主動元件130包括閘極GE、通道層CH、源極SE以及汲極DE。此外,主動元件130可進一步包括閘絕緣層GI。 The active component 130 is electrically connected to the first signal line 110 and the second signal line 120. The active component 130 includes a gate GE, a channel layer CH, a source SE, and a drain DE. Further, the active device 130 may further include a gate insulating layer GI.
閘極GE電性連接於第一訊號線110。舉例而言,閘極GE連接於第一訊號線110面向第一電極140的一側。閘絕緣層GI配置於閘極GE、第一訊號線110以及被閘極GE與第一訊號線110暴露出來的基板SUB上。通道層CH配置於閘絕緣層GI上且重疊於閘極GE。源極SE電性連接於第二訊號線120。舉例而言,源極SE可連接於第二訊號線120面向第一電極140的一側。 The gate GE is electrically connected to the first signal line 110. For example, the gate GE is connected to a side of the first signal line 110 facing the first electrode 140. The gate insulating layer GI is disposed on the gate GE, the first signal line 110, and the substrate SUB exposed by the gate GE and the first signal line 110. The channel layer CH is disposed on the gate insulating layer GI and overlaps the gate GE. The source SE is electrically connected to the second signal line 120. For example, the source SE can be connected to a side of the second signal line 120 facing the first electrode 140.
源極SE與汲極DE重疊於通道層CH且彼此相對,以於通道層CH定義出位於源極SE與汲極DE之間的通道區A。舉例而言,源極SE與汲極DE可分別為梳狀電極,且源極SE與汲極DE之間的曲折溝渠(zigzag trench)於通道層CH定義出曲折的通道區A。然而,源極SE、汲極DE以及通道區A的形狀可依需求改變,而不限於圖2所繪示者。在一實施例中,源極SE與汲極DE 可分別為條狀電極,且源極SE與汲極DE之間可具有直條狀的溝渠,而定義出直條狀的通道區A。 The source SE and the drain DE overlap the channel layer CH and oppose each other such that the channel layer CH defines a channel region A between the source SE and the drain DE. For example, the source SE and the drain DE can be comb electrodes, respectively, and the zigzag trench between the source SE and the drain DE defines a tortuous channel region A in the channel layer CH. However, the shape of the source SE, the drain DE, and the channel region A may be changed as needed, and is not limited to those illustrated in FIG. 2. In an embodiment, the source SE and the drain DE They may be strip electrodes respectively, and there may be a straight strip-shaped trench between the source SE and the drain DE, and a straight strip-shaped channel region A is defined.
第一電極140電性連接於汲極DE。第二電極150電性絕緣且重疊於第一電極140。具體地,畫素結構100可進一步包括第一絕緣層160以及第二絕緣層170。第一絕緣層160覆蓋主動元件130且具有貫孔TH。貫孔TH暴露出汲極DE的部分區域,且第一電極140透過貫孔TH而與汲極DE電性連接。第二絕緣層170配置在第一電極140以及被第一電極140暴露出來的第一絕緣層160上,且第二電極150配置在第二絕緣層170上,以透過第二絕緣層170而電性絕緣於第一電極140。 The first electrode 140 is electrically connected to the drain DE. The second electrode 150 is electrically insulated and overlaps the first electrode 140. Specifically, the pixel structure 100 may further include a first insulating layer 160 and a second insulating layer 170. The first insulating layer 160 covers the active device 130 and has a through hole TH. The through hole TH exposes a partial region of the drain DE, and the first electrode 140 is electrically connected to the drain DE through the through hole TH. The second insulating layer 170 is disposed on the first electrode 140 and the first insulating layer 160 exposed by the first electrode 140, and the second electrode 150 is disposed on the second insulating layer 170 to transmit electricity through the second insulating layer 170. The first electrode 140 is insulated.
第一電極140與第二電極150可皆為透光電極,如金屬氧化物製作而成的電極,以具有理想的光穿透率。然而,第一電極140與第二電極150的材質不以此為限。 The first electrode 140 and the second electrode 150 may both be transparent electrodes, such as electrodes made of metal oxide, to have a desired light transmittance. However, the materials of the first electrode 140 and the second electrode 150 are not limited thereto.
第二電極150具有多個條狀開口O1以及開孔O2。條狀開口O1與第一電極140重疊。在本實施例中,各條狀開口O1的延伸方向不垂直且不平行於第一方向X1以及第二方向X2。然而,各條狀開口O1的延伸方向可依需求改變,而不限於圖3所繪示者。在一實施例中,條狀開口O1的延伸方向可分別平行或垂直於第一方向X1或第二方向X2。 The second electrode 150 has a plurality of strip openings O1 and openings O2. The strip opening O1 overlaps with the first electrode 140. In the present embodiment, the extending direction of each strip opening O1 is not perpendicular and is not parallel to the first direction X1 and the second direction X2. However, the extending direction of each strip opening O1 may be changed as needed, and is not limited to those illustrated in FIG. In an embodiment, the extending direction of the strip openings O1 may be parallel or perpendicular to the first direction X1 or the second direction X2, respectively.
開孔O2與主動元件130重疊。此外,開孔O2暴露出由源極SE與汲極DE之間的溝渠所定義出的通道區A,亦即通道區A未被第二電極150遮蔽,以讓主動元件130正常運作。 The opening O2 overlaps the active element 130. In addition, the opening O2 exposes the channel region A defined by the trench between the source SE and the drain DE, that is, the channel region A is not shielded by the second electrode 150 to allow the active device 130 to operate normally.
開孔O2具有第一邊S1以及第二邊S2。第一邊S1以及源極SE位於閘極GE的同一側。第二邊S2以及汲極DE位於閘極GE的同一側。此外,第一邊S1以及第二邊S2分別延伸至閘極GE以及第一訊號線110上方。第一邊S1與第一訊號線110遠離閘極GE的側邊S110之間的第一距離D1以及第二邊S2與閘極GE遠離第一訊號線110的側邊SGE之間的第二距離D2分別大於或等於3微米。第一距離D1為第一邊S1於基板SUB上的正投影與側邊S110於基板SUB上的正投影之間的最短距離。此外,第二距離D2為第二邊S2於基板SUB上的正投影與側邊SGE於基板SUB上的正投影之間的最短距離。在本實施例中,第一距離D1以及第二距離D2分別小於或等於10微米,以使開孔O2暴露出通道區A。然而,第一距離D1以及第二距離D2的上限值可依據通道區A的形狀及面積而有所不同。 The opening O2 has a first side S1 and a second side S2. The first side S1 and the source SE are located on the same side of the gate GE. The second side S2 and the drain DE are located on the same side of the gate GE. In addition, the first side S1 and the second side S2 extend above the gate GE and the first signal line 110, respectively. a first distance D1 between the first side S1 and the first signal line 110 away from the side S110 of the gate GE and a second distance between the second side S2 and the side SGE of the gate GE away from the first signal line 110 D2 is greater than or equal to 3 microns, respectively. The first distance D1 is the shortest distance between the orthographic projection of the first side S1 on the substrate SUB and the orthographic projection of the side S110 on the substrate SUB. Further, the second distance D2 is the shortest distance between the orthographic projection of the second side S2 on the substrate SUB and the orthographic projection of the side edge SGE on the substrate SUB. In the present embodiment, the first distance D1 and the second distance D2 are respectively less than or equal to 10 microns, so that the opening O2 is exposed to the channel area A. However, the upper limit values of the first distance D1 and the second distance D2 may differ depending on the shape and area of the passage area A.
對向基板200與基板SUB相對,且畫素結構100位於基板SUB與對向基板200之間。顯示介質300配置於畫素結構100與對向基板200之間。舉例而言,顯示介質300為液晶層且包括多個液晶分子。 The opposite substrate 200 is opposed to the substrate SUB, and the pixel structure 100 is located between the substrate SUB and the opposite substrate 200. The display medium 300 is disposed between the pixel structure 100 and the opposite substrate 200. For example, display medium 300 is a liquid crystal layer and includes a plurality of liquid crystal molecules.
依據不同的需求,顯示面板10還可包括其他膜層。舉例而言,顯示面板10可進一步包括黑矩陣層(Black Matrix)BM,以遮蔽顯示面板10中不欲被看到的元件。黑矩陣層BM配置於對向基板200上且位於顯示介質300與對向基板200之間。黑矩陣層BM例如遮蔽各畫素結構100的第一訊號線110、第二訊號線 120以及主動元件130,且黑矩陣層BM具有多個透光孔O3(圖4示意性繪示出一個透光孔O3)。透光孔O3分別曝露出其中一第一電極140。 The display panel 10 may also include other film layers depending on different needs. For example, the display panel 10 may further include a Black Matrix BM to shield elements in the display panel 10 that are not to be seen. The black matrix layer BM is disposed on the opposite substrate 200 and between the display medium 300 and the opposite substrate 200. The black matrix layer BM shields, for example, the first signal line 110 and the second signal line of each pixel structure 100. 120 and the active component 130, and the black matrix layer BM has a plurality of light transmission holes O3 (FIG. 4 schematically illustrates a light transmission hole O3). The light-transmitting holes O3 expose one of the first electrodes 140, respectively.
此外,顯示面板10還可包括多個彩色濾光圖案CF(圖1示意性繪示出一個彩色濾光圖案CF),以提供彩色的顯示畫面。彩色濾光圖案CF配置於對向基板200上且位於顯示介質300與對向基板200之間,其中彩色濾光圖案CF分別配置在其中一透光孔O3中。 In addition, the display panel 10 may further include a plurality of color filter patterns CF (one color filter pattern CF is schematically illustrated in FIG. 1) to provide a color display screen. The color filter pattern CF is disposed on the opposite substrate 200 and between the display medium 300 and the opposite substrate 200. The color filter patterns CF are respectively disposed in one of the light transmission holes O3.
當閘極GE採用遮光的導電材質(如金屬)時,增加閘極GE面積會降低開口率。因此,在本實施例中,調整第一距離D1以及第二距離D2的大小的方法例如是:在不改變閘極GE的面積下,使第二電極150延伸至閘極GE以及第一訊號線110的上方。如此,便可在不影響開口率的情況下,控制第一距離D1以及第二距離D2的大小,以降低主動元件130附近的電場大小。由於主動元件130附近的電場越小,液晶分子的旋轉角度越小,也就是漏光程度越低。因此,畫素結構100可在不影響開口率的情況下,改善漏光問題。一般而言,液晶分子的旋轉角度大於45度時,會有顯著的漏光。在一實驗例中,當第一距離D1以及第二距離D2分別為4微米時,液晶分子的旋轉角度可在5度以下。也就是說,控制第一距離D1以及第二距離D2的大小確實可有效地改善漏光。由於改善漏光問題有助於提升顯示畫面的對比度,因此顯示面板10可具有良好的顯示品質(如高開口率及高對比度等)。在一實施 例中,搭配黑矩陣層BM的設置,甚至能夠根除漏光問題。 When the gate GE is made of a light-shielding conductive material (such as metal), increasing the gate GE area reduces the aperture ratio. Therefore, in the embodiment, the method of adjusting the sizes of the first distance D1 and the second distance D2 is, for example, extending the second electrode 150 to the gate GE and the first signal line without changing the area of the gate GE. Above the 110. In this way, the magnitudes of the first distance D1 and the second distance D2 can be controlled without affecting the aperture ratio to reduce the magnitude of the electric field in the vicinity of the active device 130. Since the electric field near the active element 130 is smaller, the smaller the rotation angle of the liquid crystal molecules, that is, the lower the degree of light leakage. Therefore, the pixel structure 100 can improve the light leakage problem without affecting the aperture ratio. In general, when the rotation angle of the liquid crystal molecules is greater than 45 degrees, there is significant light leakage. In an experimental example, when the first distance D1 and the second distance D2 are respectively 4 μm, the rotation angle of the liquid crystal molecules may be 5 degrees or less. That is to say, controlling the sizes of the first distance D1 and the second distance D2 can effectively improve light leakage. Since the problem of improving the light leakage helps to improve the contrast of the display screen, the display panel 10 can have good display quality (such as high aperture ratio and high contrast). In one implementation In the example, the setting of the black matrix layer BM can even eliminate the light leakage problem.
雖然本新型創作已以實施例揭露如上,然其並非用以限定本新型創作,任何所屬技術領域中具有通常知識者,在不脫離本新型創作的精神和範圍內,當可作些許的更動與潤飾,故本新型創作的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the novel creation, and any person skilled in the art can make some changes without departing from the spirit and scope of the novel creation. Retouching, the scope of protection of this new creation is subject to the definition of the scope of the patent application attached.
10‧‧‧顯示面板 10‧‧‧ display panel
100‧‧‧畫素結構 100‧‧‧ pixel structure
110‧‧‧第一訊號線 110‧‧‧First signal line
130‧‧‧主動元件 130‧‧‧Active components
140‧‧‧第一電極 140‧‧‧First electrode
150‧‧‧第二電極 150‧‧‧second electrode
160‧‧‧第一絕緣層 160‧‧‧First insulation
170‧‧‧第二絕緣層 170‧‧‧Second insulation
200‧‧‧對向基板 200‧‧‧ opposite substrate
300‧‧‧顯示介質 300‧‧‧Display media
A‧‧‧通道區 A‧‧‧ passage area
BM‧‧‧黑矩陣層 BM‧‧‧ black matrix layer
CF‧‧‧彩色濾光圖案 CF‧‧‧ color filter pattern
CH‧‧‧通道層 CH‧‧‧ channel layer
D1‧‧‧第一距離 D1‧‧‧First distance
D2‧‧‧第二距離 D2‧‧‧Second distance
DE‧‧‧汲極 DE‧‧‧汲
GE‧‧‧閘極 GE‧‧‧ gate
GI‧‧‧閘絕緣層 GI‧‧‧ brake insulation
O1‧‧‧條狀開口 O1‧‧‧ strip opening
O2‧‧‧開孔 O2‧‧‧ opening
O3‧‧‧透光孔 O3‧‧‧Light hole
S1‧‧‧第一邊 S1‧‧‧ first side
S2‧‧‧第二邊 S2‧‧‧ second side
S110、SGE‧‧‧側邊 S110, SGE‧‧‧ side
SE‧‧‧源極 SE‧‧‧ source
SUB‧‧‧基板 SUB‧‧‧ substrate
TH‧‧‧貫孔 TH‧‧‧Tongkong
X1‧‧‧第一方向 X1‧‧‧ first direction
X2‧‧‧第二方向 X2‧‧‧ second direction
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