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TWM471625U - Electrostatic capacity joining type touch panel - Google Patents

Electrostatic capacity joining type touch panel Download PDF

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Publication number
TWM471625U
TWM471625U TW102212292U TW102212292U TWM471625U TW M471625 U TWM471625 U TW M471625U TW 102212292 U TW102212292 U TW 102212292U TW 102212292 U TW102212292 U TW 102212292U TW M471625 U TWM471625 U TW M471625U
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Taiwan
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touch panel
transparent
conductive film
electrostatic capacitance
metal nanowire
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TW102212292U
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Chinese (zh)
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Jun Tanaka
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Hitachi Chemical Co Ltd
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Publication of TWM471625U publication Critical patent/TWM471625U/en

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Description

靜電容量結合方式觸控面板Electrostatic capacitance combined with touch panel

本新型係關於一種靜電容量結合方式之觸控面板,尤其,係關於對將含有金屬奈米線之導電膜用作透明電極之靜電容量結合方式觸控面板適用且有效之技術。The present invention relates to a touch panel of a combination of electrostatic capacitances, and more particularly to a technique applicable to an electrostatic capacitance combined touch panel using a conductive film containing a metal nanowire as a transparent electrode.

觸控面板係具有如下功能之機器,即,藉由利用手指或筆來觸控對應於顯示裝置之顯示區域之畫面而偵測位置並將位置座標等與顯示裝置組合而輸入至顯示裝置。該觸控面板根據其動作原理,存在電阻膜方式、靜電容量結合方式、紅外線方式、聲脈衝方式、超音波方式、電磁感應結合方式等各種方式。The touch panel is a device that detects a position by touching a screen corresponding to a display area of the display device with a finger or a pen, and combines the position coordinates and the like with the display device to input to the display device. According to the operation principle of the touch panel, there are various methods such as a resistive film method, an electrostatic capacitance combined method, an infrared method, an acoustic pulse method, an ultrasonic method, and an electromagnetic induction combined method.

靜電容量結合方式之觸控面板係於對應於顯示裝置之顯示區域之觸控面板基板上之觸控面板畫面,形成有檢測經觸控之位置且圖案化之透明電極。於該觸控面板畫面之周邊,形成有取出來自透明電極之位置檢測信號之配線,且具備用以將位置檢測信號輸出至外部之檢測電路之配線電路等。The touch panel of the electrostatic capacitance combining method is formed on a touch panel screen on the touch panel substrate corresponding to the display area of the display device, and is formed with a transparent electrode that detects the touched position and is patterned. A wiring circuit for taking out a position detecting signal from the transparent electrode and a wiring circuit for outputting the position detecting signal to the external detecting circuit is formed around the touch panel screen.

一般而言,靜電容量結合方式之觸控面板具有可高速地檢測經觸控之位置之優點,以手指觸控為基本,捕捉指尖與位置檢測電極之間之靜電容量之變化來檢測位置。例如,於檢測XY位置之情形時,具有XY位置檢測電極間經絕緣之構造。In general, the touch panel of the electrostatic capacity combination has the advantage of being capable of detecting the position of the touch at a high speed, and detecting the position by capturing the change in the electrostatic capacity between the fingertip and the position detecting electrode based on the finger touch. For example, in the case of detecting the XY position, there is a structure in which the XY position detecting electrodes are insulated.

如此之觸控面板中,自導電性與光透過性之觀點考慮,將銦錫氧化物等之金屬氧化物導電體標準地用於上述之透明電極。然而,金屬氧化物膜通常使用濺鍍法來真空成膜,因此存在需要形成成本之問 題。又,尤其存在如下問題:於銦錫氧化物中為形成導電性與光透過性優異之膜而需要接近200℃之高溫條件,所形成之膜之內部應力較大且對所成膜之基板施加應力負荷等。In such a touch panel, a metal oxide conductor such as indium tin oxide is used as it is for the above-mentioned transparent electrode from the viewpoint of conductivity and light transmittance. However, metal oxide films are usually formed by vacuum sputtering using a sputtering method, so there is a need to form a cost. question. Further, in particular, in the case of indium tin oxide, in order to form a film excellent in conductivity and light transmittance, a high temperature condition of approximately 200 ° C is required, and the internal stress of the formed film is large and is applied to the substrate to be formed. Stress load, etc.

代替存在如此之問題之金屬氧化物膜,近年來,眾所周知有含有金屬奈米線之導電膜。尤其,眾所周知有使塗膜溶液含有金屬奈米線,於基板上使用噴墨法或點膠法、絲網印刷法來塗佈,進行乾燥,形成透明導電膜。In place of the metal oxide film having such a problem, in recent years, a conductive film containing a metal nanowire has been known. In particular, it is known that a coating film solution contains a metal nanowire, which is applied onto a substrate by an inkjet method, a dispensing method, or a screen printing method, and dried to form a transparent conductive film.

例如,作為靜電容量結合方式觸控面板之例,眾所周知有專利文獻1、專利文獻2。進而,作為使用有含有金屬奈米線之透明導電體之觸控面板之例,眾所周知有專利文獻3。又,作為含有金屬奈米線之導電性組成物之例,眾所周知有專利文獻4。For example, Patent Document 1 and Patent Document 2 are known as examples of the electrostatic capacitance coupling type touch panel. Further, Patent Document 3 is known as an example of a touch panel using a transparent conductor including a metal nanowire. Further, Patent Document 4 is known as an example of a conductive composition containing a metal nanowire.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2008-32756號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-32756

[專利文獻2]日本專利特開2008-134522號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-134522

[專利文獻3]日本專利特開2011-149092號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2011-149092

[專利文獻4]日本專利特表2011-515510號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2011-515510

然而,關於包含上述專利文獻1~4之先前之靜電容量結合方式觸控面板,本發明者進行了研究,結果明確了以下情況。However, the inventors of the present invention conducted research on the conventional electrostatic capacitance-capable touch panel including the above-mentioned Patent Documents 1 to 4, and as a result, the following cases were clarified.

例如,含有金屬奈米線之導電膜中,藉由金屬奈米線彼此接觸而電性連接導通,體現導電特性。此時,使塗膜溶液含有金屬奈米線,形成塗佈膜,進行加熱乾燥,形成透明導電膜之情形時,自塗佈時至乾燥膜之形成時膜會乾燥收縮。此時,所形成之每個膜中金屬奈米線之形狀或相對位置關係相同之情況全無,因此產生個體差。因 此,膜中之金屬奈米線彼此之相對位置關係變動,接觸接合狀態會因膜而變動。因此,認為產生隨著膜形成而導電特性亦變動之問題。For example, in the conductive film containing the metal nanowire, the metal nanowires are in contact with each other and electrically connected to each other to exhibit electrical conductivity. In this case, when the coating film solution contains a metal nanowire, a coating film is formed, and heat drying is performed to form a transparent conductive film, the film shrinks and shrinks from the time of coating to the formation of the dried film. At this time, the shape or the relative positional relationship of the metal nanowires in each of the formed films was the same, and thus the individual difference was generated. because As a result, the relative positional relationship between the metal nanowires in the film fluctuates, and the contact bonding state changes due to the film. Therefore, it is considered that there is a problem that the conductivity characteristics also fluctuate as the film is formed.

因此,本新型係鑒於如上所述之問題而開發者,其代表性的目的在於提供使用含有抑制導電特性之變動之金屬奈米線之導電膜,實現高品質之靜電容量結合之檢測之靜電容量結合方式觸控面板及其製造方法。Therefore, the present invention has been made in view of the above problems, and a representative object thereof is to provide an electrostatic capacitance which realizes detection of high-quality electrostatic capacitance by using a conductive film containing a metal nanowire which suppresses variations in conductive characteristics. Combined touch panel and method of manufacturing the same.

本新型之上述以及其他目的與新穎之特徵可根據本說明書之記述及隨附圖式而明瞭。The above and other objects and novel features of the present invention will be apparent from the description and appended claims.

若簡單說明本案中所揭示之新型中代表性的內容之概要,則如下。A brief description of the outline of the representative contents disclosed in the present invention will be briefly described below.

即,代表性的靜電容量結合方式觸控面板係於透明基板上設置檢測XY位置座標之透明電極,藉由靜電容量結合而檢測對上述透明電極觸控之位置之靜電容量結合方式觸控面板,且具有以下之特徵。上述透明電極係包含透明樹脂中含有金屬奈米線之導電膜。而且,其特徵在於具有引出電極,該引出電極積層於上述導電膜之一部分表面,與自上述透明樹脂之表面層露出之上述金屬奈米線接合,且用以與上述觸控面板之外部電路連接。That is, the representative electrostatic capacitance combined touch panel is provided with a transparent electrode for detecting the XY position coordinate on the transparent substrate, and the electrostatic capacitance combined touch panel for detecting the position of the transparent electrode is touched by the electrostatic capacitance. And has the following characteristics. The transparent electrode includes a conductive film containing a metal nanowire in a transparent resin. Further, the present invention is characterized in that it has a lead-out electrode laminated on a surface of a portion of the conductive film, bonded to the metal nanowire exposed from a surface layer of the transparent resin, and connected to an external circuit of the touch panel. .

又,代表性的靜電容量結合方式觸控面板之製造方法係於透明基板上設置檢測XY位置座標之透明電極,藉由靜電容量結合而檢測對上述透明電極觸控之位置之靜電容量結合方式觸控面板之製造方法,且具有以下之特徵。其特徵在於包括如下步驟:自具備透明樹脂中含有金屬奈米線之感光性樹脂組成物膜之支持體膜,藉由轉印而將上述感光性樹脂組成物膜貼合於上述透明基板;將上述感光性樹脂組成物膜經由遮光遮罩而曝光為所期望之形狀,使用鹼性顯影液將上述曝光中之未曝光部分顯影而去除,由此形成包含在上述透明基板上以 所期望之形狀而形成之透明樹脂中含有金屬奈米線之導電膜之上述透明電極;以及形成引出電極,該引出電極積層於上述導電膜之一部分表面,與自上述透明樹脂之表面層露出之上述金屬奈米線接合,且用以與上述觸控面板之外部電路連接。The method for manufacturing a touch panel of the present invention is to provide a transparent electrode for detecting the coordinates of the XY position on the transparent substrate, and to detect the electrostatic capacitance of the position of the transparent electrode by the combination of electrostatic capacitance. The manufacturing method of the control panel has the following features. And a step of bonding the photosensitive resin composition film to the transparent substrate by transfer from a support film having a photosensitive resin composition film containing a metal nanowire in a transparent resin; The photosensitive resin composition film is exposed to a desired shape via a light-shielding mask, and the unexposed portion in the exposure is developed and removed using an alkaline developing solution, thereby being formed on the transparent substrate. a transparent electrode comprising a conductive film of a metal nanowire in a transparent resin formed in a desired shape; and a lead electrode formed on the surface of a portion of the conductive film and exposed from a surface layer of the transparent resin The metal nanowires are bonded and connected to an external circuit of the touch panel.

若簡單說明藉由本案中所揭示之新型中代表性的內容而得之效果,則如以下。The effect obtained by the representative contents of the novel disclosed in the present invention will be briefly described as follows.

即,代表性的效果可實現使用含有抑制導電特性之變動之金屬奈米線之導電膜,實現高品質之靜電容量結合之檢測之靜電容量結合方式觸控面板及其製造方法。In other words, the representative effect can realize a capacitance-capable touch panel and a method of manufacturing the same using a conductive film containing a metal nanowire that suppresses variations in conductive characteristics and achieving high-quality electrostatic capacitance bonding.

101‧‧‧透明基板101‧‧‧Transparent substrate

102‧‧‧觸控畫面102‧‧‧ touch screen

103‧‧‧透明電極(X位置座標)103‧‧‧Transparent Electrode (X Position Coordinate)

103a‧‧‧透明樹脂層103a‧‧‧Transparent resin layer

103b‧‧‧金屬奈米線含有層103b‧‧‧Metal nanowire containing layer

104‧‧‧透明電極(Y位置座標)104‧‧‧Transparent Electrode (Y Position Coordinate)

104a‧‧‧透明樹脂層104a‧‧‧Transparent resin layer

104b‧‧‧金屬奈米線含有層104b‧‧‧Metal nanowire containing layer

105‧‧‧引出配線105‧‧‧Leading wiring

106‧‧‧連接電極106‧‧‧Connecting electrode

107‧‧‧連接端子107‧‧‧Connecting terminal

201‧‧‧感光性樹脂組成物膜201‧‧‧Photosensitive resin composition film

202‧‧‧支持體膜202‧‧‧Support body membrane

203‧‧‧感光性樹脂組成物膜203‧‧‧Photosensitive resin composition film

圖1係用以說明作為本新型之一實施形態之靜電容量結合方式觸控面板之一例之基板平面圖。Fig. 1 is a plan view showing a substrate as an example of a capacitive touch panel of an embodiment of the present invention.

圖2係於圖1中,用以說明透明電極與引出配線之連接部之觸控面板剖面圖(圖1之c部切斷面)。Fig. 2 is a cross-sectional view of the touch panel for explaining the connection portion between the transparent electrode and the lead wiring in Fig. 1 (the c-section cut surface of Fig. 1).

圖3係於圖1中,用以說明XY位置座標之透明電極之交叉部之觸控面板剖面圖(圖1之a-a'切斷面)。3 is a cross-sectional view of the touch panel (a-a' cut surface of FIG. 1) for explaining the intersection of the transparent electrodes of the XY position coordinates in FIG.

圖4係於圖1中,用以說明XY位置座標之透明電極之交叉部之觸控面板剖面圖(圖1之b-b'切斷面)。4 is a cross-sectional view of the touch panel (b-b' cut surface of FIG. 1) for explaining the intersection of the transparent electrodes of the XY position coordinates in FIG.

圖5(1)~(4)係用以說明圖1所示之靜電容量結合方式觸控面板之製造方法之一例之步驟剖面圖。5(1) to (4) are cross-sectional views showing a step of an example of a method of manufacturing the electrostatic capacitance coupling type touch panel shown in Fig. 1.

圖6(5)、(6)係接著圖5之用以說明圖1所示之靜電容量結合方式觸控面板之製造方法之一例之步驟剖面圖。6(5) and 6(6) are cross-sectional views showing a step of an example of a method of manufacturing the electrostatic capacitance coupling type touch panel shown in Fig. 1, which is continued from Fig. 5;

於以下之實施形態中,為方便起見於有其必要時,分割為複數個實施形態或文段進行說明,但除特別明示之情形外,其等並非相互 無關係者,存在一者為另一者之一部分或全部之變化例、詳細、補充說明等之關係。又,於以下之實施形態中,於言及要素之數等(包含個數、數值、量、範圍等)之情形時,除特別明示之情形及原理上明確限定為特定之數之情形等外,並非限定為其特定之數,為特定之數以上或以下均可。In the following embodiments, for the sake of convenience, a plurality of embodiments or segments will be described as necessary, but the present invention is not mutually exclusive except for the case where it is specifically stated. For those who have no relationship, there is a relationship between one or all of the changes, details, supplementary explanations, etc. of one of the other. In addition, in the following embodiments, when the number of elements, such as the number, the numerical value, the quantity, the range, and the like, is specifically limited, the case is clearly limited to a specific number, and the like. It is not limited to a specific number, and may be a specific number or more or less.

進而,於以下之實施形態中,其構成要素(亦包含要素步驟等)除特別明示之情形及原理上明確認為為必須之情形等外,當然未必為必須者。同樣地,於以下之實施形態中,於言及構成要素等之形狀、位置關係等時,除特別明示之情形及原理上明確認為並非如此之情形等外,包含實質上近似或類似於其形狀等者。該情況對於上述數值及範圍亦相同。Further, in the following embodiments, the constituent elements (including the element steps and the like) are of course not necessarily necessary unless otherwise specified and the principle is clearly considered to be necessary. Similarly, in the following embodiments, when the shape, the positional relationship, and the like of the constituent elements and the like are included, the present invention is substantially similar or similar to the shape, except for the case where it is not explicitly stated, and the like. By. This case is also the same for the above values and ranges.

[本新型之實施形態之概要][Summary of Embodiments of the Present Invention]

本新型之實施形態之靜電容量結合方式觸控面板具有以下之特徵(作為一例,於()內附記所對應之構成要素、符號、圖式等)。代表性的靜電容量結合方式觸控面板係於透明基板(101)上設置檢測XY位置座標之透明電極(103、104),並藉由靜電容量結合而檢測對上述透明電極觸控之位置之靜電容量結合方式觸控面板。上述透明電極包含透明樹脂中含有金屬奈米線之導電膜。而且,其特徵在於具有引出電極(引出配線105、連接電極106),該引出電極積層於上述導電膜之一部分表面,與自上述透明樹脂之表面層露出之上述金屬奈米線接合,用以與上述觸控面板之外部電路連接。The electrostatic capacitance coupling type touch panel according to the embodiment of the present invention has the following features (as an example, constituent elements, symbols, patterns, and the like corresponding to () are attached. The representative electrostatic capacitance combined touch panel is provided on the transparent substrate (101), and the transparent electrodes (103, 104) for detecting the coordinates of the XY position are disposed, and the static electricity is combined to detect the static electricity of the position touched by the transparent electrodes. Capacity combined with touch panel. The transparent electrode includes a conductive film containing a metal nanowire in a transparent resin. Further, it is characterized in that it has a lead electrode (the lead line 105 and the connection electrode 106) which is laminated on the surface of one portion of the conductive film and bonded to the metal nanowire exposed from the surface layer of the transparent resin for use with The external circuit of the touch panel is connected.

本新型之實施形態之靜電容量結合方式觸控面板之製造方法具有以下之特徵(作為一例,於()內附記所對應之構成要素、符號、圖式等)。代表性的靜電容量結合方式觸控面板之製造方法係於透明基板上設置檢測XY位置座標之透明電極,且藉由靜電容量結合而檢測對上述透明電極觸控之位置之靜電容量結合方式觸控面板之製造方法。 其特徵在於包括如下步驟:自具備透明樹脂中含有金屬奈米線之感光性樹脂組成物膜(201、203)之支持體膜(202),藉由轉印而將上述感光性樹脂組成物膜貼合於上述透明基板(圖5-(2)、圖5-(4));將上述感光性樹脂組成物膜經由遮光遮罩而曝光為所期望之形狀,使用鹼性顯影液將上述曝光中之未曝光部分藉由顯影而去除,由此形成由在上述透明基板上以所期望之形狀而形成之透明樹脂中含有金屬奈米線之導電膜構成之上述透明電極(圖5-(3),圖6-(5));以及形成引出電極,該引出電極積層於上述導電膜之一部分表面,與自上述透明樹脂之表面層露出之上述金屬奈米線接合,用以與上述觸控面板之外部電路連接(圖6-(6))。The method for manufacturing a capacitive touch panel according to the embodiment of the present invention has the following features (as an example, constituent elements, symbols, patterns, and the like corresponding to () are attached. A method for manufacturing a touch panel is to form a transparent electrode for detecting an XY position coordinate on a transparent substrate, and to detect a position of the touch of the transparent electrode by a combination of electrostatic capacitances. The manufacturing method of the panel. It is characterized in that it comprises a support film (202) having a photosensitive resin composition film (201, 203) containing a metal nanowire in a transparent resin, and the photosensitive resin composition film is transferred by transfer Bonding to the transparent substrate (FIG. 5 - (2), FIG. 5 - (4)); exposing the photosensitive resin composition film to a desired shape via a light-shielding mask, and exposing the exposure using an alkaline developer The unexposed portion is removed by development, thereby forming the transparent electrode composed of a conductive film containing a metal nanowire in a transparent resin formed in a desired shape on the transparent substrate (FIG. 5-(3) And (6)); and forming an extraction electrode, the extraction electrode is laminated on a surface of a portion of the conductive film, and is bonded to the metal nanowire exposed from a surface layer of the transparent resin for use with the touch External circuit connection of the panel (Figure 6-(6)).

進而較佳為,於上述靜電容量結合方式觸控面板及其製造方法中,具有以下之特徵。上述金屬奈米線之剖面直徑為10~100nm之範圍,且,長度為1~100μm之範圍。上述金屬奈米線為銀奈米線。對上述透明基板之表面接合上述導電膜之透明樹脂,於上述導電膜之表面層之10~200nm之範圍之厚度中含有上述金屬奈米線。上述導電膜之透明樹脂包含感光性樹脂絕緣物。上述導電膜於可見光區域中光透過率為80%以上。Furthermore, it is preferable that the electrostatic capacitance combined type touch panel and the method of manufacturing the same have the following features. The metal nanowire has a cross-sectional diameter of 10 to 100 nm and a length of 1 to 100 μm. The above metal nanowire is a silver nanowire. The transparent resin in which the conductive film is bonded to the surface of the transparent substrate contains the metal nanowire in a thickness of 10 to 200 nm in the surface layer of the conductive film. The transparent resin of the above conductive film contains a photosensitive resin insulator. The light transmittance of the conductive film in the visible light region is 80% or more.

以下,基於圖式對以上所說明之基於本新型之實施形態之概要之一實施形態進行詳細說明。再者,於用以說明實施形態之所有圖中,原則上對同一構件附加同一符號,並省略其重複之說明。Hereinafter, an embodiment based on the outline of the embodiment of the present invention described above will be described in detail based on the drawings. In the drawings, the same reference numerals will be given to the same members in the drawings, and the description thereof will be omitted.

[一實施形態][One embodiment]

使用圖1~圖6說明本實施形態之靜電容量結合方式觸控面板及其製造方法。The electrostatic capacitance bonding type touch panel of the present embodiment and a method of manufacturing the same will be described with reference to Figs. 1 to 6 .

<靜電容量結合方式觸控面板><Electrostatic capacity combined mode touch panel>

使用圖1,對本實施形態之靜電容量結合方式觸控面板進行說明。圖1係用以說明該靜電容量結合方式觸控面板之一例之基板平面 圖。A capacitive touch panel touch panel of this embodiment will be described with reference to Fig. 1 . FIG. 1 is a diagram showing a substrate plane of an example of the electrostatic capacitance combined touch panel; Figure.

本實施形態之靜電容量結合方式觸控面板係於透明基板101之單面具有用以檢測觸控位置座標之觸控畫面102,於該區域檢測靜電容量變化,且具備設為X位置座標之透明電極103與設為Y位置座標之透明電極104。再者,於圖1中,為了區別而易於明白,設為X位置座標之透明電極103以橫線圖示,設為Y位置座標之透明電極104以豎線圖示。The capacitive touch panel of the present embodiment has a touch screen 102 for detecting a touch position coordinate on one side of the transparent substrate 101, detecting a change in electrostatic capacitance in the area, and having a transparent position set as an X position coordinate. The electrode 103 and the transparent electrode 104 which are set to the Y position coordinates. Further, in FIG. 1, for the sake of distinction, it is easy to understand that the transparent electrode 103 having the X position coordinate is shown by a horizontal line, and the transparent electrode 104 having the Y position coordinate is shown by a vertical line.

於該等之設為X、Y位置座標之各透明電極103、104,配置有用以與控制作為觸控面板之電信號之驅動元件電路連接之引出配線105,及將該引出配線105與透明電極103、104連接之連接電極106。進而,於引出配線105之與連接電極106相反側之端部,配置有與驅動元件電路連接之連接端子107。Each of the transparent electrodes 103 and 104 having the X and Y position coordinates is provided with a lead wiring 105 connected to a driving element circuit for controlling an electrical signal as a touch panel, and the lead wiring 105 and the transparent electrode are disposed. 103, 104 connected to the connection electrode 106. Further, a connection terminal 107 connected to the drive element circuit is disposed at an end portion of the lead wiring 105 opposite to the connection electrode 106.

作為透明基板101,適用有鈉玻璃、硼矽酸玻璃等之鹼玻璃、無鹼玻璃、化學強化玻璃等之玻璃基板。又,亦眾所周知有具有透明性之聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等之聚酯膜、耐熱性與透明性較高之聚醯亞胺膜,亦可使用具有透明性之如此之樹脂系基板。As the transparent substrate 101, a glass substrate such as alkali glass such as soda glass or borosilicate glass, alkali-free glass, or chemically strengthened glass is used. Further, it is also known that a polyester film such as polyethylene terephthalate or polyethylene naphthalate having transparency, a polyimide film having high heat resistance and transparency, and transparent use can also be used. A resin-based substrate.

透明電極103、104包含透明樹脂中含有金屬奈米線之導電膜。金屬奈米線之剖面直徑為10~100nm,長度為1~100μm之範圍。該金屬奈米線係自透明樹脂之表面層露出,且該露出之金屬奈米線與引出配線105連接之連接電極106接合之構造。The transparent electrodes 103 and 104 include a conductive film containing a metal nanowire in a transparent resin. The metal nanowire has a cross-sectional diameter of 10 to 100 nm and a length of 1 to 100 μm. The metal nanowire is exposed from the surface layer of the transparent resin, and the exposed metal nanowire is joined to the connection electrode 106 to which the lead wiring 105 is connected.

作為金屬奈米線,可使用Au、Ag、Pt、Cu、Co、C、Pd等之奈米線。其中,自作為導電膜之導電性與光透過性之觀點而言係最適用有Ag奈米線之構成材料,本實施形態中對使用有Ag奈米線之例進行說明。As the metal nanowire, a nanowire of Au, Ag, Pt, Cu, Co, C, Pd or the like can be used. In particular, the constituent material of the Ag nanowire is most suitable from the viewpoint of conductivity and light permeability of the conductive film, and an example in which the Ag nanowire is used in the present embodiment will be described.

又,透明電極103、104係對透明基板101之表面接合導電膜之透明樹脂之構造,導電膜之表面層之10~200nm之範圍之厚度含有金屬 奈米線。該導電膜之透明樹脂為感光性樹脂絕緣物,導電膜之光透過率於可見光區域中為80%以上。Further, the transparent electrodes 103 and 104 are structures for bonding a transparent resin of a conductive film to the surface of the transparent substrate 101, and the thickness of the surface layer of the conductive film in the range of 10 to 200 nm contains metal. Nano line. The transparent resin of the conductive film is a photosensitive resin insulator, and the light transmittance of the conductive film is 80% or more in the visible light region.

引出配線105適用有以濺鍍法或蒸鍍法而成膜之金屬電極。具體而言,可列舉Ag-Pd-Cu、Al-Cu、Ni-Cu、Al、Cu、Ni等之合金、積層、單獨構成之電極。又,亦可使用Ag導電膏而形成。The lead wiring 105 is applied to a metal electrode formed by a sputtering method or a vapor deposition method. Specifically, an alloy of Ag-Pd-Cu, Al-Cu, Ni-Cu, Al, Cu, Ni, or the like, a laminated layer, and an electrode separately formed may be mentioned. Further, it can also be formed using an Ag conductive paste.

<透明電極與引出配線之連接部><Connection portion of transparent electrode and lead wiring>

使用圖2,對圖1所示之靜電容量結合方式觸控面板中,透明電極與引出配線之連接部之剖面構造進行說明。圖2係用以說明該透明電極與引出配線之連接部之觸控面板剖面圖,且表示圖1之c部切斷面。於圖2中,對於Y位置座標之透明電極104與引出配線105之連接部進行表示,關於X位置座標之透明電極103與引出配線105之連接部亦相同。The cross-sectional structure of the connection portion between the transparent electrode and the lead wiring in the electrostatic capacitance coupling type touch panel shown in Fig. 1 will be described with reference to Fig. 2 . 2 is a cross-sectional view of the touch panel for explaining a connection portion between the transparent electrode and the lead wiring, and shows a cut surface of the portion c of FIG. 1. In FIG. 2, the connection portion between the transparent electrode 104 and the lead wiring 105 at the Y position coordinate is shown, and the connection portion between the transparent electrode 103 and the lead wiring 105 at the X position coordinate is also the same.

將透明電極104與引出配線105連接之連接電極106係以於形成引出配線105時,積層於透明電極104之端部之構造而形成者,並非特別需要與引出配線105個別之步驟。The connection electrode 106 that connects the transparent electrode 104 and the lead wiring 105 is formed by laminating the structure of the end portion of the transparent electrode 104 when the lead wiring 105 is formed, and the step of being separate from the lead wiring 105 is not particularly required.

透明電極104包含透明樹脂中含有金屬奈米線之導電膜,且包括積層於透明基板101之表面之透明樹脂層104a,及積層於該透明樹脂層104a之表面之金屬奈米線含有層104b。金屬奈米線含有層104b之金屬奈米線自表面層露出,且接合有該露出之金屬奈米線與引出配線105連接之連接電極106。例如,金屬奈米線含有層104b成為金屬奈米線之端部等自表面突出,而局部露出之構造。The transparent electrode 104 includes a conductive film containing a metal nanowire in a transparent resin, and includes a transparent resin layer 104a laminated on the surface of the transparent substrate 101, and a metal nanowire containing layer 104b laminated on the surface of the transparent resin layer 104a. The metal nanowire of the metal nanowire containing layer 104b is exposed from the surface layer, and the connection electrode 106 to which the exposed metal nanowire is connected to the lead wiring 105 is bonded. For example, the metal nanowire-containing layer 104b has a structure in which the end portion of the metal nanowire protrudes from the surface and is partially exposed.

藉由如此之構造,而成為Y位置座標之透明電極104與連接電極106與引出配線105電性連接之構造。同樣地,成為X位置座標之透明電極103與連接電極106與引出配線105電性連接之構造。作為透明電極,具備設為X、Y位置座標之各透明電極103、104。With such a configuration, the transparent electrode 104 which becomes the Y position coordinate and the connection electrode 106 and the lead wiring 105 are electrically connected. Similarly, the transparent electrode 103 which becomes the X position coordinate and the connection electrode 106 and the lead wiring 105 are electrically connected. As the transparent electrode, each of the transparent electrodes 103 and 104 having coordinates of X and Y positions is provided.

<XY位置座標之透明電極之交叉部><Intersection of transparent electrodes of XY position coordinates>

使用圖3及圖4,對圖1所示之靜電容量結合方式觸控面板中,XY位置座標之透明電極之交叉部之剖面構造進行說明。圖3及圖4係用以說明該XY位置座標之透明電極之交叉部之觸控面板剖面圖,圖3表示圖1之a-a'切斷面,圖4表示圖1之b-b'切斷面。The cross-sectional structure of the intersection of the transparent electrodes of the XY position coordinates in the capacitance-capacity touch panel shown in FIG. 1 will be described with reference to FIGS. 3 and 4. 3 and FIG. 4 are cross-sectional views of the touch panel for explaining the intersection of the transparent electrodes of the XY position coordinates, FIG. 3 shows the a-a' cut surface of FIG. 1, and FIG. 4 shows the b-b' of FIG. Cut the face.

X位置座標之透明電極103包含透明樹脂中含有金屬奈米線之導電膜,且包括包含絕緣樹脂之透明樹脂層103a,及積層於該透明樹脂層103a之金屬奈米線含有層103b。又,Y位置座標之透明電極104亦同樣地,包含透明樹脂中含有金屬奈米線之導電膜,且包括包含絕緣樹脂之透明樹脂層104a,及積層於該透明樹脂層104a之金屬奈米線含有層104b。The transparent electrode 103 of the X position coordinate includes a conductive film containing a metal nanowire in a transparent resin, and includes a transparent resin layer 103a containing an insulating resin, and a metal nanowire containing layer 103b laminated on the transparent resin layer 103a. Further, the transparent electrode 104 of the Y position coordinate similarly includes a conductive film containing a metal nanowire in a transparent resin, and includes a transparent resin layer 104a containing an insulating resin, and a metal nanowire laminated on the transparent resin layer 104a. Contains layer 104b.

於包含如此之構成之XY位置座標之透明電極103、104之交叉部中,相對於X位置座標之透明電極103,Y位置座標之透明電極104之交叉部如圖3所示,成為藉由包含絕緣樹脂之透明樹脂層104a而絕緣之交叉構造。又,相對於Y位置座標之透明電極104,X位置座標之透明電極103之交叉部如圖4所示,成為藉由包含絕緣樹脂之透明樹脂層104a而絕緣之交叉構造。藉此,X位置座標之透明電極103與Y位置座標之透明電極104由絕緣之構造構成。In the intersection of the transparent electrodes 103 and 104 including the XY position coordinates thus constituted, the intersection of the transparent electrodes 103 of the Y position coordinates with respect to the transparent electrode 103 of the X position coordinates is as shown in FIG. The transparent resin layer 104a of the insulating resin is insulated and has an intersecting structure. Moreover, as shown in FIG. 4, the intersection of the transparent electrode 103 of the X position coordinate with respect to the transparent electrode 104 of the Y position coordinate is an insulated structure which is insulated by the transparent resin layer 104a containing an insulating resin. Thereby, the transparent electrode 103 of the X position coordinate and the transparent electrode 104 of the Y position coordinate are constituted by an insulating structure.

對於該等XY位置座標之透明電極103、104,如上所述,在Au、Ag、Pt、Cu、Co、C、Pd等之金屬奈米線之中,自作為導電膜之導電性與光透過性之觀點而言,又以Ag奈米線最為合適。As described above, the transparent electrodes 103 and 104 of the XY position coordinates are electrically conductive and light-transmitting as a conductive film among metal nanowires such as Au, Ag, Pt, Cu, Co, C, and Pd. From the point of view of sex, it is most suitable for the Ag nanowire.

又,透明電極103、104中,對透明基板101之表面接合有透明樹脂層103a、104a,且金屬奈米線含有層103b、104b之表面層之10~200nm之厚度中含有金屬奈米線。該導電膜之透明樹脂包含感光性樹脂絕緣物,且導電膜之光透過率於可見光區域中為80%以上。Further, in the transparent electrodes 103 and 104, the transparent resin layers 103a and 104a are bonded to the surface of the transparent substrate 101, and the surface layer of the metal nanowire-containing layers 103b and 104b has a metal nanowire in a thickness of 10 to 200 nm. The transparent resin of the conductive film contains a photosensitive resin insulator, and the light transmittance of the conductive film is 80% or more in the visible light region.

<靜電容量結合方式觸控面板之製造方法><Method of Manufacturing Electrostatic Capacitor Bonding Touch Panel>

使用圖5及圖6,對圖1所示之靜電容量結合方式觸控面板之製造 方法進行說明。圖5及圖6係用以說明該靜電容量結合方式觸控面板之製造方法之一例之步驟剖面圖,為於圖5之後接著圖6之剖面圖。圖5及圖6中,(1)~(3)表示與圖3相同之切斷面之剖面圖,(4)~(5)表示與圖4相同之切斷面之剖面圖,(6)表示與圖2相同之切斷面之剖面圖。The manufacturing of the electrostatic capacitance combined touch panel shown in FIG. 1 is performed using FIG. 5 and FIG. The method is explained. 5 and FIG. 6 are cross-sectional views showing a step of an example of a method of manufacturing the electrostatic capacitance coupling type touch panel, which is a cross-sectional view subsequent to FIG. In Figs. 5 and 6, (1) to (3) are cross-sectional views of the same cut surface as in Fig. 3, and (4) to (5) are cross-sectional views of the cut surface similar to Fig. 4, (6) A cross-sectional view of the cut surface similar to that of Fig. 2 is shown.

利用以下之條件製作圖1所示之觸控面板。The touch panel shown in FIG. 1 was fabricated using the following conditions.

首先,如(1)所示,準備具備透明樹脂中含有金屬奈米線之感光性樹脂組成物膜201之支持體膜202。其係於用以支持感光性樹脂組成物膜201之支持體膜202上,積層有感光性樹脂組成物膜201之膜構造之構件。於該感光性樹脂組成物膜201中,金屬奈米線固定於透明樹脂之固體物中。作為該膜構造之構件,亦可使用於感光性樹脂組成物膜201之與支持體膜202相反側積層有基礎膜之構造之構件。First, as shown in (1), a support film 202 having a photosensitive resin composition film 201 containing a metal nanowire in a transparent resin is prepared. It is a member of a film structure in which a photosensitive resin composition film 201 is laminated on a support film 202 for supporting the photosensitive resin composition film 201. In the photosensitive resin composition film 201, the metal nanowire is fixed to the solid of the transparent resin. As a member of the film structure, a member having a structure in which a base film is laminated on the side opposite to the support film 202 of the photosensitive resin composition film 201 can be used.

其次,如(2)所示,自具備感光性樹脂組成物膜201之支持體膜202,藉由膜轉印而將感光性樹脂組成物膜201貼合於透明基板101。藉由該膜轉印,而成為於透明基板101上貼合有自支持體膜202剝離之感光性樹脂組成物膜201之部分之構造。Then, as shown in (2), the photosensitive resin composition film 201 is bonded to the transparent substrate 101 by film transfer from the support film 202 including the photosensitive resin composition film 201. By the film transfer, a structure in which a portion of the photosensitive resin composition film 201 peeled off from the support film 202 is bonded to the transparent substrate 101 is attached.

然後,如(3)所示,將感光性樹脂組成物膜201經由遮光遮罩而曝光為所期望之形狀,使用鹼性顯影液將曝光步驟中之未曝光部分去除,形成包含在透明基板101上以所期望之形狀而形成之透明樹脂中含有金屬奈米線之導電膜之成為X位置座標之透明電極103。Then, as shown in (3), the photosensitive resin composition film 201 is exposed to a desired shape via a light-shielding mask, and the unexposed portion in the exposure step is removed using an alkaline developer to form a transparent substrate 101. The transparent resin formed of the desired shape has a transparent electrode 103 having a X-position coordinate of the conductive film of the metal nanowire.

其次,成為X位置座標之透明電極103之形成後,為了形成成為Y位置座標之透明電極104,如(4)所示,與上述(2)同樣地,再次藉由膜轉印而將感光性樹脂組成物膜203貼合於透明基板101。Next, after forming the transparent electrode 103 which is the coordinate of the X position, in order to form the transparent electrode 104 which becomes the coordinate of the Y position, as shown in (4), the photosensitive property is again transferred by film transfer as in the above (2). The resin composition film 203 is bonded to the transparent substrate 101.

然後,如(5)所示,與上述(3)同樣地,經由遮光遮罩而曝光為所期望之形狀,使用鹼性顯影液將曝光步驟中之未曝光部分去除,形成包含在透明基板101上以所期望之形狀而形成之透明樹脂中含有金屬奈米線之導電膜之成為Y位置座標之透明電極104。Then, as shown in (5), in the same manner as in the above (3), the light is exposed to a desired shape via a light-shielding mask, and the unexposed portion in the exposure step is removed using an alkaline developer to form a transparent substrate 101. The transparent resin formed of the desired shape has a transparent electrode 104 which is a Y-position coordinate of the conductive film of the metal nanowire.

其次,如(6)所示,於透明基板101之表面,形成用以與外部電路連接之引出配線105,及將該引出配線105與透明電極104(103)連接之連接電極106。此處,使用含有薄片形狀之Ag之導電膏材料利用絲網印刷法,同時形成引出配線105、連接電極106。Next, as shown in (6), a lead wiring 105 for connecting to an external circuit and a connection electrode 106 for connecting the lead wiring 105 to the transparent electrode 104 (103) are formed on the surface of the transparent substrate 101. Here, the lead wiring 105 and the connection electrode 106 are simultaneously formed by a screen printing method using a conductive paste material containing a sheet-shaped Ag.

藉由上述之(1)~(6)之步驟,使用金屬奈米線固定於透明樹脂之固體物中之感光性樹脂組成物膜201、203,而金屬奈米線彼此之相對位置關係於藉由膜轉印、曝光、顯影而形成導電膜之後亦未變動,因此可製作高品質之具有XY位置座標之透明電極103、104之靜電容量結合方式觸控面板。By the steps (1) to (6) above, the photosensitive resin composition films 201 and 203 are fixed to the solid of the transparent resin using a metal nanowire, and the relative positions of the metal nanowires are related to each other. Since the conductive film is not changed by film transfer, exposure, and development, a high-capacity electrostatic capacitance-capable touch panel having transparent electrodes 103 and 104 having XY position coordinates can be produced.

<本實施形態之效果><Effects of the embodiment>

根據以上所說明之本實施形態之靜電容量結合方式觸控面板及其製造方法,可獲得以下之效果。According to the electrostatic capacitance coupling type touch panel of the present embodiment described above and the method of manufacturing the same, the following effects can be obtained.

(1)於靜電容量結合方式觸控面板中,透明電極103、104包含透明樹脂中含有金屬奈米線之導電膜,且具有與自透明樹脂之表面層露出之金屬奈米線接合且與引出配線105連接之連接電極106,由此使用含有抑制導電特性之變動之金屬奈米線之導電膜,可實現高品質之靜電容量結合之檢測。(1) In the electrostatic capacitance coupling type touch panel, the transparent electrodes 103 and 104 include a conductive film containing a metal nanowire in a transparent resin, and have a metal nanowire exposed from a surface layer of the transparent resin and are taken out The connection electrode 106 to which the wiring 105 is connected is used to detect a high-quality electrostatic capacitance bond by using a conductive film containing a metal nanowire that suppresses variations in conductivity.

(2)於靜電容量結合方式觸控面板之製造方法中,使用具備透明樹脂中含有金屬奈米線之感光性樹脂組成物膜201之支持體膜202,藉由膜轉印、曝光、顯影而形成包含透明樹脂中含有金屬奈米線之導電膜之透明電極103、104,藉由具有如此之步驟等,而與上述(1)同樣地,使用含有抑制導電特性之變動之金屬奈米線之導電膜,可實現高品質之靜電容量結合之檢測。(2) In the method of manufacturing a capacitive touch panel, a support film 202 having a photosensitive resin composition film 201 containing a metal nanowire in a transparent resin is used for film transfer, exposure, and development. The transparent electrodes 103 and 104 including the conductive film containing the metal nanowires in the transparent resin are formed, and the metal nanowires containing the fluctuations in suppressing the conductive properties are used in the same manner as in the above (1). The conductive film enables high-quality detection of electrostatic capacitance.

即,於上述(1)、(2)中,用以形成透明電極103、104之構件以包含感光性樹脂組成物膜201之膜狀,而將金屬奈米線固定於固體物中,金屬奈米線彼此之相對位置關係於藉由膜轉印、曝光、顯影而形 成導電膜之後亦未變動。因此,膜初期設計之導電特性於形成導電膜之後亦未變動,因此,藉由將其用作導電膜,可實現實現高品質之靜電容量結合之檢測之靜電容量結合方式觸控面板及其製造方法。In other words, in the above (1) and (2), the member for forming the transparent electrodes 103 and 104 is formed into a film shape of the photosensitive resin composition film 201, and the metal nanowire is fixed to the solid material, and the metal naphthalene is fixed. The relative position of the rice noodles is related to the shape of the film by transfer, exposure, and development. It did not change after the conductive film. Therefore, the conductive characteristics of the initial design of the film are not changed after the formation of the conductive film. Therefore, by using the conductive film as a conductive film, the electrostatic capacitance combined touch panel capable of realizing the detection of high-quality electrostatic capacitance can be realized and the manufacturing thereof method.

(3)於上述(1)、(2)中,尤其,藉由以下之條件,作為透明電極103、104之導電膜,自導電性與光透過性之觀點而言使之最佳。(2-1)金屬奈米線含有層103b、104b之金屬奈米線之剖面直徑為10~100nm之範圍,且,長度為1~100μm之範圍。(2-2)金屬奈米線含有層103b、104b之金屬奈米線為銀奈米線。(2-3)相對於透明基板101之表面而接合之透明電極103、104之導電膜係於導電膜之表面層之10~200nm之範圍之厚度,具有含有金屬奈米線之金屬奈米線含有層103b、104b。(2-4)透明電極103、104之導電膜之透明樹脂層103a、104a及金屬奈米線含有層103b、104b中之透明樹脂包含感光性樹脂絕緣物。(2-5)透明電極103、104之導電膜之透明樹脂層103a、104a及金屬奈米線含有層103b、104b中之透明樹脂於可見光區域中光透過率為80%以上。上述(2-1)、(2-2)之條件係自導電性之觀點而言適合,上述(2-3)、(2-4)、(2-5)之條件係自光透過性之觀點而言適合。(3) In the above (1) and (2), in particular, the conductive films of the transparent electrodes 103 and 104 are optimized from the viewpoints of conductivity and light transmittance by the following conditions. (2-1) Metal nanowires The metal nanowires of the layers 103b and 104b have a cross-sectional diameter of 10 to 100 nm and a length of 1 to 100 μm. (2-2) The metal nanowire of the metal nanowire containing layers 103b and 104b is a silver nanowire. (2-3) The conductive film of the transparent electrodes 103 and 104 bonded to the surface of the transparent substrate 101 is a thickness of 10 to 200 nm in the surface layer of the conductive film, and has a metal nanowire containing a metal nanowire. Layers 103b, 104b are included. (2-4) The transparent resin layers 103a and 104a of the conductive films of the transparent electrodes 103 and 104 and the transparent resin in the metal nanowire-containing layers 103b and 104b contain a photosensitive resin insulator. (2-5) The transparent resin layers 103a and 104a of the conductive films of the transparent electrodes 103 and 104 and the transparent resin of the metal nanowire-containing layers 103b and 104b have a light transmittance of 80% or more in the visible light region. The conditions of the above (2-1) and (2-2) are suitable from the viewpoint of conductivity, and the conditions of the above (2-3), (2-4), and (2-5) are from light transmittance. Suitable from the point of view.

以上,基於實施形態對由本發明者而開發之新型進行了具體說明,但是當然本新型並非限定於上述實施形態,於不脫離其主旨之範圍內可進行各種變更。例如,上述之實施形態係為了將本新型易於理解說明而進行了詳細說明,並未限定於具備所說明之所有構成。又,可將某實施形態之構成之一部分置換為其他實施形態之構成,又,亦可對某實施形態之構成添加其他實施形態之構成。又,可對各實施形態之構成之一部分進行其他構成之追加、刪除、置換。The present invention has been described in detail with reference to the embodiments. However, the present invention is not limited to the embodiments described above, and various modifications can be made without departing from the spirit and scope of the invention. For example, the above-described embodiments have been described in detail in order to facilitate understanding of the present invention, and are not limited to having all of the configurations described. Further, a part of the configuration of a certain embodiment may be replaced with a configuration of another embodiment, and a configuration of another embodiment may be added to the configuration of a certain embodiment. Further, addition, deletion, and replacement of other components may be made to one of the configurations of the respective embodiments.

101‧‧‧透明基板101‧‧‧Transparent substrate

102‧‧‧觸控畫面102‧‧‧ touch screen

103‧‧‧透明電極(X位置座標)103‧‧‧Transparent Electrode (X Position Coordinate)

104‧‧‧透明電極(Y位置座標)104‧‧‧Transparent Electrode (Y Position Coordinate)

105‧‧‧引出配線105‧‧‧Leading wiring

106‧‧‧連接電極106‧‧‧Connecting electrode

107‧‧‧連接端子107‧‧‧Connecting terminal

Claims (11)

一種靜電容量結合方式觸控面板,其特徵在於:其係於透明基板上設置檢測XY位置座標之透明電極,且藉由靜電容量結合而檢測對上述透明電極觸控之位置者,上述透明電極包含透明樹脂中含有金屬奈米線之導電膜,該靜電容量結合方式觸控面板具有引出電極,該引出電極積層於上述導電膜之一部分表面,與自上述透明樹脂之表面層露出之上述金屬奈米線接合,用以與上述觸控面板之外部電路連接。 A touch panel of an electrostatic capacitance type is characterized in that: a transparent electrode for detecting an XY position coordinate is disposed on a transparent substrate, and a position for touching the transparent electrode is detected by a combination of electrostatic capacitance, wherein the transparent electrode includes The transparent resin contains a conductive film of a metal nanowire, and the capacitive touch panel has a lead electrode laminated on a surface of a portion of the conductive film and the metal nanoparticle exposed from a surface layer of the transparent resin Wire bonding for connecting to an external circuit of the touch panel. 如請求項1之靜電容量結合方式觸控面板,其中上述金屬奈米線之剖面直徑為10~100nm之範圍。 The touch panel of claim 1, wherein the metal nanowire has a cross-sectional diameter of 10 to 100 nm. 如請求項1之靜電容量結合方式觸控面板,其中上述金屬奈米線為銀奈米線。 The electrostatic capacitance combined with the touch panel of claim 1, wherein the metal nanowire is a silver nanowire. 如請求項1之靜電容量結合方式觸控面板,其中相對於上述透明基板之表面接合有上述導電膜之透明樹脂,於上述導電膜之表面層之10~200nm之範圍之厚度中含有上述金屬奈米線。 The touch panel of claim 1, wherein the transparent resin of the conductive film is bonded to the surface of the transparent substrate, and the metal naphthalene is contained in a thickness of 10 to 200 nm of the surface layer of the conductive film. Rice noodles. 如請求項1之靜電容量結合方式觸控面板,其中上述導電膜之透明樹脂包含感光性樹脂絕緣物。 The electrostatic capacitance combined touch panel of claim 1, wherein the transparent resin of the conductive film comprises a photosensitive resin insulator. 如請求項1之靜電容量結合方式觸控面板,其中上述導電膜於可見光區域中光透過率為80%以上。 The touch panel of claim 1, wherein the conductive film has a light transmittance of 80% or more in a visible light region. 如請求項1之靜電容量結合方式觸控面板,其中上述金屬奈米線之長度為1~100μm之範圍。 The touch panel of claim 1, wherein the length of the metal nanowire is in the range of 1 to 100 μm. 如請求項1之靜電容量結合方式觸控面板,其中上述透明基板為玻璃基板。 The electrostatic capacitance combined touch panel of claim 1, wherein the transparent substrate is a glass substrate. 如請求項1之靜電容量結合方式觸控面板,其中上述透明基板為聚酯膜。 The electrostatic capacitance combined touch panel of claim 1, wherein the transparent substrate is a polyester film. 如請求項1之靜電容量結合方式觸控面板,其中上述引出電極包含引出配線,該引出配線為Ag-Pd-Cu、Al-Cu、Ni-Cu、Al、Cu、或Ni。 The touch panel of claim 1, wherein the extraction electrode comprises a lead wire, and the lead wire is Ag-Pd-Cu, Al-Cu, Ni-Cu, Al, Cu, or Ni. 如請求項1之靜電容量結合方式觸控面板,其中上述引出電極包含引出配線,該引出配線係以Ag使用導電膏而形成。The electrostatic capacitance coupling type touch panel of claim 1, wherein the extraction electrode comprises a lead wiring formed by using a conductive paste with Ag.
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