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TWM457288U - Wafer film pasting device and pulled film cutting mechanism thereof - Google Patents

Wafer film pasting device and pulled film cutting mechanism thereof Download PDF

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Publication number
TWM457288U
TWM457288U TW102202432U TW102202432U TWM457288U TW M457288 U TWM457288 U TW M457288U TW 102202432 U TW102202432 U TW 102202432U TW 102202432 U TW102202432 U TW 102202432U TW M457288 U TWM457288 U TW M457288U
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Taiwan
Prior art keywords
adsorption zone
moving
film
film cutting
mucosa
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TW102202432U
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Chinese (zh)
Inventor
Hong-You Liao
Zhi-Xi Xu
wei-tang Li
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Shi Qi Technology Co Ltd
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Priority to TW102202432U priority Critical patent/TWM457288U/en
Publication of TWM457288U publication Critical patent/TWM457288U/en

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Description

晶圓貼膜設備及其拉膜裁切機構 Wafer filming device and film cutting mechanism thereof

本創作係有關於一種貼膜設備,尤指一種晶圓貼膜設備及其拉膜裁切機構。 This creation is about a filming device, especially a wafer filming device and a film cutting mechanism.

目前市面上裁切膠膜的機台,都會利用一或複數刀具將放置載板上的膠膜,裁切呈多個分離膠膜,而供後續框架黏接。 At present, the machine for cutting the film on the market will use one or more tools to cut the film on the carrier board and cut it into a plurality of separate adhesive films for subsequent frame bonding.

然而,放置載板上的膠膜若不平整,則後續與框架黏接時,黏在框架上的膠膜也會產生不平整,而影響後續晶圓的黏貼狀況,嚴重者,導致晶圓之製程或檢測發生問題。 However, if the film placed on the carrier is not flat, the film adhered to the frame may be uneven when it is subsequently bonded to the frame, which may affect the adhesion of the subsequent wafer, and the wafer may be caused by the wafer. There is a problem with the process or the test.

有鑑於此,本創作人遂針對上述現有技術,特潛心研究並配合學理的運用,盡力解決上述之問題點,即成為本創作人改良之目標。 In view of this, the creator has made great efforts to solve the above problems by focusing on the above-mentioned prior art, and has devoted himself to the application of the theory, that is, the goal of the creator's improvement.

本創作之一目的,在於提供一種晶圓貼膜設備及其拉膜裁切機構,其係利用移動吸附區會朝遠離固定吸附區的方向移動,以給予黏膜一拉力,使黏膜平整,而便利後續晶圓黏貼於黏膜,讓晶圓之製程或檢測更佳穩定。 One of the aims of the present invention is to provide a wafer filming device and a film cutting mechanism thereof, which use a moving adsorption zone to move away from a fixed adsorption zone to give a mucous membrane a pulling force to smooth the mucosa and facilitate subsequent The wafer is adhered to the mucosa to make the wafer process or inspection more stable.

為了達成上述之目的,本創作係提供一種晶圓貼膜設備,用 於一黏膜,該貼膜設備包括:一裁切傳動裝置,包含一連續循環帶動機構及至少二拉膜裁切機構,該連續循環帶動機構連接並帶動該等拉膜裁切機構沿一路徑循環移動,各該拉膜裁切機構包含一吸附區及對應該吸附區配置的一移動刀具,該吸附區包含一固定吸附區及對應該固定吸附區一側往復移動的一移動吸附區;一捲膜裝置,對應該等拉膜裁切機構配置,該捲膜裝置包含供所述黏膜套設的一固定軸,所述黏膜自該固定軸朝該等吸附區方向的拉伸;以及一框架;其中,所述黏膜被吸附在任二該拉膜裁切機構的該吸附區時,該移動吸附區會朝遠離該固定吸附區的方向移動,其一該拉膜裁切機構的移動刀具能夠切割並分離所述黏膜,從而令分離的所述黏膜吸附在該吸附區,該框架對應分離的所述黏膜黏接。 In order to achieve the above objectives, the present invention provides a wafer filming device for use. In a mucous membrane, the filming apparatus comprises: a cutting transmission device comprising a continuous circulation driving mechanism and at least two film cutting mechanisms, the continuous circulation driving mechanism connecting and driving the film cutting mechanism to circulate along a path Each of the film cutting mechanisms includes an adsorption zone and a moving cutter disposed corresponding to the adsorption zone, the adsorption zone comprising a fixed adsorption zone and a moving adsorption zone corresponding to the reciprocating movement of the fixed adsorption zone; a device, corresponding to a configuration of a film cutting mechanism, the film winding device comprising a fixed shaft for the mucosa sleeve, the mucosa stretching from the fixing shaft toward the adsorption regions; and a frame; When the mucus is adsorbed in the adsorption zone of any of the film cutting mechanisms, the moving adsorption zone moves away from the fixed adsorption zone, and the moving tool of the film cutting mechanism can be cut and separated. The mucosa is such that the separated mucosa is adsorbed in the adsorption zone, and the frame is bonded to the separated mucosa.

為了達成上述之目的,本創作係提供一種晶圓貼膜設備的拉膜裁切機構,用於一黏膜,該拉膜裁切機構包括:一吸附區,包含一固定吸附區及對應該固定吸附區一側往復移動的一移動吸附區;以及一移動刀具,對應該吸附區配置;其中,所述黏膜被吸附在該吸附區時,該移動吸附區會朝遠 離該固定吸附區的方向移動,該移動刀具能夠切割並分離所述黏膜,從而令分離的所述黏膜吸附在該吸附區。 In order to achieve the above purpose, the present invention provides a film cutting mechanism for a wafer filming device for a mucous membrane, the film cutting mechanism comprising: an adsorption zone comprising a fixed adsorption zone and a corresponding adsorption zone a moving adsorption zone reciprocating on one side; and a moving cutter corresponding to the adsorption zone configuration; wherein when the mucus is adsorbed in the adsorption zone, the moving adsorption zone will face far Moving away from the direction of the fixed adsorption zone, the moving cutter is capable of cutting and separating the mucosa such that the separated mucosa is adsorbed in the adsorption zone.

本創作還具有以下功效: This creation also has the following effects:

第一、黏膜被吸附吸附區時,移動吸附區會朝遠離固定吸附區的方向移動,以給予黏膜一拉力,進而將黏膜拉整平整,以讓後續框架及晶圓黏膜之黏貼更平整緊密,並使晶圓之製程或檢測更佳穩定。 First, when the mucous membrane is adsorbed to the adsorption zone, the moving adsorption zone will move away from the fixed adsorption zone to give a tensile force to the mucosa, and then the mucosa is flattened to make the adhesion of the subsequent frame and the wafer mucosa more flat and tight. And make the wafer process or inspection more stable.

第二、各固定吸附區具有相互垂直的第一側邊及第二側邊,第一側邊和黏膜的拉伸方向呈垂直配設,移動吸附區對應第二側邊配置,使各拉膜裁切機構沿一路徑循環移動時,固定吸附區給予黏膜一直向拉力,同時移動吸附區朝遠離固定吸附區的方向移動,又給予黏膜一橫向拉力,讓黏膜受垂直兩向的拉力整平,進而加強吸附區上的黏膜之平整性。 Second, each of the fixed adsorption zones has a first side and a second side perpendicular to each other, and the first side and the stretching direction of the mucous membrane are vertically arranged, and the moving adsorption zone is disposed corresponding to the second side, so that each of the film is stretched When the cutting mechanism moves along a path, the fixed adsorption zone gives the mucosa a constant pulling force, and the moving adsorption zone moves away from the fixed adsorption zone, and gives the mucosa a transverse pulling force, so that the mucosa is leveled by the vertical two-direction pulling force. Thereby, the flatness of the mucous membrane on the adsorption zone is enhanced.

第三、各承載板相對凹槽的兩側形成邊條,各邊條自承載板的內部朝外逐漸增加厚度,進而提升邊條的結構強度,使搬移機構壓制框架和分離的黏膜相互黏接時,邊條不易受力變形,達到拉膜裁切機構具有良好地結構穩定度。 Thirdly, each of the carrying plates forms side strips on opposite sides of the groove, and each side strip gradually increases in thickness from the inside of the carrying board, thereby enhancing the structural strength of the side strips, so that the moving mechanism pressing frame and the separated mucous membranes are bonded to each other. When the edge strip is not easily deformed by force, the film cutting mechanism has good structural stability.

第四、各承載板自側邊朝內設有凹口,從而供相鄰的拉膜裁切機構之移動刀具能夠穿設過凹口,以減小各拉膜裁切機構之間的間距,進而讓晶圓貼膜設備之體積縮小。 Fourth, each of the carrier plates is provided with a notch from the side to the inside, so that the moving cutter of the adjacent film cutting mechanism can be passed through the notch to reduce the spacing between the cutting mechanisms of the respective film. This further reduces the size of the wafer filming equipment.

第五、拉膜裁切機構更包含活動壓膜組件,活動壓膜組件包含壓膜件及連接並帶動壓膜件活動於固定吸附區的壓膜活動 器,使黏膜被吸附吸附區時,壓膜件會壓制黏膜,避免黏膜因受移動刀具牽動而翹起,讓後續框架及晶圓黏膜之黏貼更平整緊密。 Fifth, the film cutting mechanism further comprises an active laminating assembly, and the movable laminating assembly comprises a laminating member and a laminating activity for connecting and driving the laminating member to move in a fixed adsorption zone. When the mucous membrane is adsorbed to the adsorption zone, the membrane member will press the mucosa to prevent the mucosa from being lifted by the moving tool, so that the subsequent frame and the wafer mucus are more evenly packed.

第六、移動刀具沿著一方向往復移動,且移動刀具的移動距離大於黏膜的寬度,使移動刀具直接一刀切斷黏膜,此一刀切斷之方向,不以本實施例為限,可視實際情況予以調整,讓分離的黏膜配合本身的外型呈矩形狀或方形狀,而非經由移動刀具後續加工形成,故沒有廢料之產生,以達到有效利用資源及節省成本之特點。 Sixth, the moving tool reciprocates along a direction, and the moving distance of the moving tool is greater than the width of the mucosa, so that the moving tool directly cuts the mucosa by one knife, and the direction of the cutting of the knife is not limited to the embodiment, and can be adjusted according to actual conditions. The separation of the mucosa is made into a rectangular shape or a square shape instead of being formed by subsequent processing of the moving tool, so that no waste is generated, so as to achieve efficient use of resources and cost saving.

100‧‧‧黏膜 100‧‧‧mucos

10‧‧‧貼膜設備 10‧‧‧ filming equipment

1‧‧‧裁切傳動裝置 1‧‧‧ cutting drive

11‧‧‧連續循環帶動機構 11‧‧‧Continuous cycle driving mechanism

12‧‧‧拉膜裁切機構 12‧‧‧Draw film cutting mechanism

13‧‧‧吸附區 13‧‧‧Adsorption zone

131‧‧‧固定吸附區 131‧‧‧Fixed adsorption zone

1311‧‧‧第一側邊 1311‧‧‧First side

1312‧‧‧第二側邊 1312‧‧‧Second side

132‧‧‧移動吸附區 132‧‧‧Mobile adsorption zone

14‧‧‧移動刀具 14‧‧‧Mobile knives

141‧‧‧滑動器 141‧‧‧ slider

142‧‧‧刀具組 142‧‧‧Tool set

15‧‧‧承載板 15‧‧‧Loading board

151‧‧‧凹槽 151‧‧‧ Groove

152‧‧‧邊條 152‧‧‧Side strips

153‧‧‧凹口 153‧‧‧ notch

154‧‧‧滑軌 154‧‧‧rails

16‧‧‧拉板 16‧‧‧ pull board

17‧‧‧拉板驅動器 17‧‧‧ Pulling plate drive

18‧‧‧活動壓膜組件 18‧‧‧Active laminating module

181‧‧‧壓膜件 181‧‧‧filming parts

182‧‧‧壓膜活動器 182‧‧‧Laminating device

2‧‧‧捲膜裝置 2‧‧‧film coating device

21‧‧‧固定軸 21‧‧‧Fixed shaft

3‧‧‧框架 3‧‧‧Frame

4‧‧‧下框區域 4‧‧‧Bottom area

5‧‧‧搬移機構 5‧‧‧Transfer organization

51‧‧‧移動器 51‧‧‧Mobile

52‧‧‧吸附件 52‧‧‧Adsorbed parts

第一圖係本創作貼膜設備之立體示意圖。 The first picture is a three-dimensional schematic diagram of the original filming device.

第二圖係本創作貼膜設備之俯視圖。 The second picture is a top view of the original filming device.

第三圖係本創作裁切傳動裝置之立體示意圖。 The third figure is a three-dimensional schematic diagram of the cutting drive device of the present invention.

第四圖係本創作裁切傳動裝置之俯視圖。 The fourth figure is a top view of the cutting drive of the present creation.

第五圖係本創作貼膜設備之第一使用狀態示意圖圖。 The fifth figure is a schematic diagram of the first use state of the original filming device.

第六圖係本創作貼膜設備之第二使用狀態示意圖圖。 The sixth figure is a schematic diagram of the second state of use of the inventive filming device.

第七圖係本創作貼膜設備之第三使用狀態示意圖圖。 The seventh figure is a schematic diagram of the third use state of the original filming device.

第八圖係本創作裁切傳動裝置之第一使用狀態示意圖。 The eighth figure is a schematic diagram of the first use state of the cutting drive device of the present invention.

第九圖係本創作裁切傳動裝置之第二使用狀態示意圖。 The ninth drawing is a schematic view of the second use state of the cutting drive device of the present invention.

第十圖係本創作裁切傳動裝置之第三使用狀態示意圖。 The tenth figure is a schematic diagram of the third use state of the cutting drive device of the present invention.

第十一圖係本創作裁切傳動裝置之第四使用狀態示意圖。 The eleventh figure is a fourth state of use of the cutting drive device of the present invention.

第十二圖係本創作貼膜設備之第四使用狀態示意圖。 The twelfth figure is a schematic diagram of the fourth state of use of the inventive filming device.

有關本創作之詳細說明及技術內容,將配合圖式說明如下,然而所附圖式僅作為說明用途,並非用於侷限本創作。 The detailed description and technical content of the present invention will be described below in conjunction with the drawings, but the drawings are for illustrative purposes only and are not intended to limit the present invention.

請參考第一至十二圖所示,本創作係提供一種晶圓貼膜設備及其拉膜裁切機構,用於一黏膜100,此晶圓貼膜設備10主要包括一裁切傳動裝置1、一捲膜裝置2及一框架3;拉膜裁切機構12包括一吸附區13及一移動刀具14。 Please refer to the first to twelfth drawings. The present invention provides a wafer filming device and a film cutting mechanism thereof for a film 100. The wafer filming device 10 mainly includes a cutting and dismounting device. The film winding device 2 and a frame 3; the film cutting mechanism 12 includes an adsorption zone 13 and a moving cutter 14.

裁切傳動裝置1包含一連續循環帶動機構11及至少二拉膜裁切機構12,連續循環帶動機構11連接並帶動各拉膜裁切機構12沿一路徑循環移動,各拉膜裁切機構12包含一吸附區13及對應吸附區13配置的一移動刀具14,吸附區13包含一固定吸附區131及對應固定吸附區131一側往復移動的一移動吸附區132。 The cutting transmission device 1 includes a continuous circulation driving mechanism 11 and at least two film cutting mechanism 12, and the continuous circulation driving mechanism 11 is connected to drive the respective film cutting mechanism 12 to circulate along a path, and each of the film cutting mechanisms 12 A moving cutter 14 including an adsorption zone 13 and a corresponding adsorption zone 13 is disposed. The adsorption zone 13 includes a fixed adsorption zone 131 and a moving adsorption zone 132 that reciprocates along the side of the fixed adsorption zone 131.

進一步說明如下,各固定吸附區131具有相互垂直的一第一側邊1311及一第二側邊1312,第一側邊1311和黏膜100的拉伸方向呈垂直配設,各移動刀具15對應各第一側邊1311配置並沿著一方向往復移動,移動吸附區132對應第二側邊1312配置;其中,此吸附區13亦可為陶瓷材質所構成,並於陶瓷材質上設有供氣體流通的複數孔隙,使吸附區13可透過孔隙抽吸氣體,以達到吸附區13之吸附功能。 Further, each fixed adsorption zone 131 has a first side 1311 and a second side 1312 which are perpendicular to each other. The first side 1311 and the stretching direction of the mucous membrane 100 are vertically arranged, and each moving cutter 15 corresponds to each. The first side 1311 is disposed and reciprocated along a direction, and the moving adsorption area 132 is disposed corresponding to the second side 1312; wherein the adsorption area 13 is also formed of a ceramic material, and is provided with a gas circulation on the ceramic material. The plurality of pores allow the adsorption zone 13 to draw gas through the pores to achieve the adsorption function of the adsorption zone 13.

各拉膜裁切機構12更包含一承載板15、一拉板16及連接並帶動拉板16相對承載板15往復移動的一拉板驅動器17,承載板15上形成有固定吸附區131,拉板16上形成有移動吸附區132;另外,各承載板15自側邊朝內設有一凹槽151,拉板16容置於凹槽151;再者,各承載板15相對凹槽151的兩側形成二邊條152,各邊條152自承載板15的內部朝外逐漸增加厚度。又,各承載板15自側邊朝內設有一凹口153,從而供相鄰的拉膜裁切機構12之移動刀具14能夠穿設過凹口153。其中,各承載板15具有一滑軌154;拉板驅動器17之最佳實施例為一氣缸,但不以此為限。 Each of the film cutting mechanism 12 further includes a carrier plate 15, a pull plate 16 and a pull plate driver 17 that connects and drives the pull plate 16 to reciprocate relative to the carrier plate 15. The carrier plate 15 is formed with a fixed adsorption area 131. A moving absorbing area 132 is formed on the board 16; in addition, each of the carrying boards 15 is provided with a recess 151 from the side, and the pull board 16 is received in the recess 151; further, each of the carrying boards 15 is opposite to the recess 151 The sides form two side strips 152, and each side strip 152 gradually increases in thickness from the inside of the carrier sheet 15 toward the outside. Further, each of the carrier plates 15 is provided with a notch 153 from the side edges so that the moving cutters 14 of the adjacent film cutting mechanism 12 can pass through the notches 153. Each of the carrier plates 15 has a slide rail 154. The preferred embodiment of the pull plate driver 17 is a cylinder, but is not limited thereto.

此外,拉膜裁切機構12更包含一活動壓膜組件18,活動壓膜組件18包含一壓膜件181及連接並帶動壓膜件181活動於固定吸附區131的一壓膜活動器182,壓膜活動器182之最佳實施例為一氣缸,但不以此為限。 In addition, the film cutting mechanism 12 further includes a movable film assembly 18 including a pressing member 181 and a laminating activator 182 that connects and drives the pressing member 181 to move to the fixed adsorption region 131. The preferred embodiment of the laminator 182 is a cylinder, but is not limited thereto.

各移動刀具14包含一滑動器141及固定在滑動器141的一刀具組142,滑動器141滑接於滑軌154,從而令刀具組141對應承載板15的一側往復位移。 Each moving tool 14 includes a slider 141 and a cutter set 142 fixed to the slider 141. The slider 141 is slidably coupled to the slide rail 154, so that the cutter set 141 is reciprocally displaced corresponding to one side of the carrier plate 15.

捲膜裝置2對應各拉膜裁切機構12配置,捲膜裝置2包含供黏膜100套設的一固定軸21,黏膜100自固定軸21朝各吸附區13的方向拉伸。 The film winding device 2 is disposed corresponding to each of the stretched film cutting mechanisms 12, and the film winding device 2 includes a fixed shaft 21 for the adhesive film 100 to be stretched, and the adhesive film 100 is stretched from the fixed shaft 21 toward the respective adsorption regions 13.

框架3內部設有一鏤空部,且框架3為一矩形框體,框架3的寬度實質上等於(實質上等於即等於或大略等於)黏膜100 的寬度,進而讓框架3的外型去配合被切割黏膜100的形狀,以避免黏膜100有廢料之產生,而有效地完全利用到黏膜100的每一分材料,達到節省成本之功效。 The frame 3 is internally provided with a hollow portion, and the frame 3 is a rectangular frame. The width of the frame 3 is substantially equal to (substantially equal to or equal to or slightly equal to) the mucosa 100. The width, in turn, allows the shape of the frame 3 to match the shape of the cut mucosa 100 to avoid the generation of waste material of the mucosa 100, and effectively utilizes each of the materials of the mucosa 100 to achieve cost-saving effects.

其中,黏膜100被吸附在任二拉膜裁切機構12的吸附區13時,移動吸附區132會朝遠離固定吸附區131方向移動,其一拉膜裁切機構12的移動刀具14能夠切割並分離黏膜100,從而令分離的黏膜100吸附在吸附區13,框架3對應分離的黏膜100黏接。 Wherein, when the mucous membrane 100 is adsorbed on the adsorption zone 13 of the two-drawing film cutting mechanism 12, the moving adsorption zone 132 moves away from the fixed adsorption zone 131, and the moving cutter 14 of the film cutting mechanism 12 can be cut and separated. The mucosa 100 is such that the separated mucosa 100 is adsorbed in the adsorption zone 13, and the frame 3 is bonded to the separated mucosa 100.

本創作晶圓貼膜設備10更包括一下框區域4及一搬移機構5,吸附有分離黏膜100的吸附區13位置在下框區域3中,搬移機構5配置在下框區域4的上方。搬移機構5移動於下框區域4中,搬移機構5包含一移動器51及連接移動器51的一吸附件52,吸附件52能夠吸附框架3並壓制框架3和分離的黏膜100相互黏接。 The wafer faburing apparatus 10 of the present invention further includes a lower frame region 4 and a transfer mechanism 5, and the adsorption region 13 to which the separation mucous membrane 100 is adsorbed is positioned in the lower frame region 3, and the transfer mechanism 5 is disposed above the lower frame region 4. The transport mechanism 5 moves in the lower frame region 4, and the transport mechanism 5 includes a mover 51 and a suction member 52 that connects the mover 51. The adsorbing member 52 can adsorb the frame 3 and the press frame 3 and the separated mucous membrane 100 are bonded to each other.

本創作晶圓貼膜設備10之組合,其係利用裁切傳動裝置1包含連續循環帶動機構11及各拉膜裁切機構12,連續循環帶動機構11連接並帶動各拉膜裁切機構12沿一路徑循環移動,各拉膜裁切機構12包含吸附區13及對應吸附區13配置的移動刀具14,吸附區13包含固定吸附區131及對應固定吸附區131一側往復移動的移動吸附區132;捲膜裝置2對應各拉膜裁切機構12配置,捲膜裝置2包含供黏膜100套設的固定軸21,黏膜100自固定軸21朝各吸附區13的方向拉伸;其中,黏膜100被吸附在任二拉膜裁切機構12的吸附區13時,移動吸附區132 會朝遠離固定吸附區131方向移動,其一拉膜裁切機構12的移動刀具14能夠切割並分離黏膜100,從而令分離的黏膜100吸附在吸附區13,框架3對應分離的黏膜100黏接。 The combination of the present wafer laminating apparatus 10 includes a continuous circulation driving mechanism 11 and a respective film cutting mechanism 12 by using the cutting transmission device 1, and the continuous circulation driving mechanism 11 is connected and drives each of the film cutting mechanisms 12 along a The path is circulated, and each of the film cutting mechanism 12 includes an adsorption zone 13 and a moving cutter 14 corresponding to the adsorption zone 13, and the adsorption zone 13 includes a fixed adsorption zone 131 and a moving adsorption zone 132 corresponding to the side of the fixed adsorption zone 131; The film winding device 2 is disposed corresponding to each of the film cutting mechanisms 12, and the film winding device 2 includes a fixing shaft 21 for the mucosa 100 to be stretched, and the mucosa 100 is stretched from the fixing shaft 21 toward the respective adsorption regions 13; wherein the mucosa 100 is When adsorbing on the adsorption zone 13 of any two of the film cutting mechanisms 12, the adsorption zone 132 is moved. Moving away from the fixed adsorption zone 131, the moving cutter 14 of the film cutting mechanism 12 can cut and separate the mucosa 100, so that the separated mucous membrane 100 is adsorbed in the adsorption zone 13, and the frame 3 is bonded to the separated mucous membrane 100. .

本創作拉膜裁切機構12之組合,其係利用吸附區13包含固定吸附區131及對應固定吸附區131一側往復移動的移動吸附區132;移動刀具14對應吸附區13配置;其中,黏膜100被吸附在吸附區13時,移動吸附區132會朝遠離固定吸附區131方向移動,移動刀具14能夠切割並分離黏膜100,從而令分離的黏膜100吸附在吸附區13。 The combination of the original film cutting mechanism 12 is configured to utilize a moving adsorption zone 132 in which the adsorption zone 13 includes a fixed adsorption zone 131 and a side corresponding to the fixed adsorption zone 131; the moving cutter 14 is disposed corresponding to the adsorption zone 13; When the 100 is adsorbed in the adsorption zone 13, the moving adsorption zone 132 moves away from the fixed adsorption zone 131, and the moving cutter 14 can cut and separate the mucosa 100, thereby adsorbing the separated mucous membrane 100 in the adsorption zone 13.

本創作晶圓貼膜設備10及其拉膜裁切機構12之使用,如第五至十二圖所示,各拉膜裁切機構12沿一路徑循環移動,使黏膜100持續被吸附在任兩切膜機構12的吸附區13,各移動吸附區132會朝遠離固定吸附區131方向移動,進而將吸附區13上的黏膜100拉平整,之後其一拉膜裁切機構12的移動刀具14能夠切割並分離黏膜100,從而令分離的黏膜100吸附在吸附區13,並透過搬移機構5將框架3對應分離的黏膜100黏接。 The use of the wafer bonding apparatus 10 and the film cutting mechanism 12 thereof, as shown in the fifth to twelfth drawings, each of the film cutting mechanisms 12 is cyclically moved along a path, so that the mucosa 100 is continuously adsorbed in any two cuts. In the adsorption zone 13 of the membrane mechanism 12, each of the moving adsorption zones 132 moves away from the fixed adsorption zone 131, thereby flattening the mucosa 100 on the adsorption zone 13, and then the moving cutter 14 of the film cutting mechanism 12 can cut The mucosa 100 is separated, so that the separated mucous membrane 100 is adsorbed on the adsorption zone 13, and the frame 3 is bonded to the separated mucous membrane 100 through the transfer mechanism 5.

藉此,黏膜100被吸附吸附區13時,移動吸附區132會朝遠離固定吸附區131的方向移動,以給予黏膜100一拉力,進而將黏膜100拉整平整,以讓後續框架3及晶圓黏膜100之黏貼更平整緊密,並使晶圓之製程或檢測更佳穩定。 Thereby, when the mucosa 100 is adsorbed to the adsorption zone 13, the moving adsorption zone 132 moves away from the fixed adsorption zone 131 to give the mucosa 100 a pulling force, thereby pulling the mucosa 100 flattened, so that the subsequent frame 3 and the wafer are allowed. The adhesion of the mucosa 100 is more even and tight, and the process or detection of the wafer is more stable.

另外,各固定吸附區131具有相互垂直的第一側邊1311及第 二側邊1312,第一側邊1311和黏膜100的拉伸方向呈垂直配設,移動吸附區132對應第二側邊1312配置,使各拉膜裁切機構12沿一路徑循環移動時,固定吸附區131給予黏膜100一直向拉力,同時移動吸附區132朝遠離固定吸附區131的方向移動,又給予黏膜100一橫向拉力,讓黏膜100受垂直兩向的拉力整平,進而加強吸附區13上的黏膜100之平整性。 In addition, each of the fixed adsorption regions 131 has a first side 1311 and a first side perpendicular to each other The two sides 1312, the first side 1311 and the mucosa 100 are vertically arranged, and the moving adsorption area 132 is disposed corresponding to the second side 1312, so that each of the film cutting mechanisms 12 is cyclically moved along a path. The adsorption zone 131 gives the mucosa 100 a constant pulling force, and simultaneously moves the adsorption zone 132 to move away from the fixed adsorption zone 131, and gives the mucosa 100 a lateral pulling force, so that the mucosa 100 is leveled by the vertical two directions, thereby strengthening the adsorption zone 13 The flatness of the upper mucosa 100.

並且,各承載板15相對凹槽151的兩側形成邊條152,各邊條152自承載板15的內部朝外逐漸增加厚度,進而提升邊條152的結構強度,使搬移機構5壓制框架3和分離的黏膜100相互黏接時,邊條152不易受力變形,達到拉膜裁切機構12具有良好地結構穩定度。 Moreover, each of the carrying plates 15 forms side strips 152 on opposite sides of the recess 151, and the side strips 152 gradually increase in thickness from the inside of the carrying board 15 outward, thereby enhancing the structural strength of the side strips 152, so that the moving mechanism 5 presses the frame 3 When the separated mucosa 100 is adhered to each other, the side strip 152 is not easily deformed by force, and the film cutting mechanism 12 has good structural stability.

又,各承載板15自側邊朝內設有凹口153,從而供相鄰的拉膜裁切機構12之移動刀具14能夠穿設過凹口153,以減小各拉膜裁切機構12之間的間距,進而讓晶圓貼膜設備10之體積縮小。 Moreover, each of the carrier plates 15 is provided with a notch 153 from the side edges so that the moving cutters 14 of the adjacent film cutting mechanism 12 can pass through the notches 153 to reduce the respective film cutting mechanisms 12 The spacing between them further reduces the size of the wafer filming apparatus 10.

再者,拉膜裁切機構12更包含活動壓膜組件18,活動壓膜組件18包含壓膜件181及連接並帶動壓膜件181活動於固定吸附區131的壓膜活動器182,使黏膜100被吸附吸附區13時,壓膜件181會壓制黏膜100,避免黏膜100因受移動刀具14牽動而翹起,讓後續框架3及晶圓黏膜100之黏貼更平整緊密。 Furthermore, the film cutting mechanism 12 further includes a movable laminating assembly 18 including a laminating member 181 and a laminating activator 182 that connects and drives the laminating member 181 to move in the fixed adsorption zone 131 to make the mucosa When the adsorption zone 13 is adsorbed, the film pressing member 181 presses the mucous membrane 100 to prevent the mucosa 100 from being lifted by the moving tool 14 to make the adhesion of the subsequent frame 3 and the wafer film 100 smoother and tighter.

此外,移動刀具14沿著一方向往復移動,且移動刀具14的移動距離大於黏膜100的寬度,使移動刀具14直接一刀切斷黏 膜100,此一刀切斷之方向,不以本實施例為限,可視實際情況予以調整,讓分離的黏膜100配合本身的外型呈矩形狀或方形狀,而非經由移動刀具14後續加工形成,故沒有廢料之產生,以達到有效利用資源及節省成本之特點。 In addition, the moving tool 14 reciprocates in a direction, and the moving distance of the moving tool 14 is greater than the width of the mucous membrane 100, so that the moving tool 14 is directly cut by the knife. The film 100, the direction in which the knife is cut, is not limited to the embodiment, and can be adjusted according to the actual situation, so that the separated mucous membrane 100 is shaped into a rectangular shape or a square shape in accordance with its own shape, instead of being formed by subsequent processing by moving the cutter 14. Therefore, there is no waste generated to achieve efficient use of resources and cost savings.

綜上所述,本創作之晶圓貼膜設備及其拉膜裁切機構,確可達到預期之使用目的,而解決習知之缺失,並具有產業利用性、新穎性與進步性,完全符合新型專利申請要件,爰依專利法提出申請,敬請詳查並賜准本案專利,以保障創作人之權利。 In summary, the wafer filming equipment and the film cutting mechanism of the present invention can achieve the intended purpose of use, and solve the lack of conventional knowledge, and have industrial utilization, novelty and progress, and fully comply with the new patent. Apply for the requirements and apply for the patent law. Please check and grant the patent in this case to protect the rights of the creator.

1‧‧‧裁切傳動裝置 1‧‧‧ cutting drive

11‧‧‧連續循環帶動機構 11‧‧‧Continuous cycle driving mechanism

12‧‧‧拉膜裁切機構 12‧‧‧Draw film cutting mechanism

13‧‧‧吸附區 13‧‧‧Adsorption zone

131‧‧‧固定吸附區 131‧‧‧Fixed adsorption zone

1311‧‧‧第一側邊 1311‧‧‧First side

1312‧‧‧第二側邊 1312‧‧‧Second side

132‧‧‧移動吸附區 132‧‧‧Mobile adsorption zone

14‧‧‧移動刀具 14‧‧‧Mobile knives

141‧‧‧滑動器 141‧‧‧ slider

142‧‧‧刀具組 142‧‧‧Tool set

15‧‧‧承載板 15‧‧‧Loading board

151‧‧‧凹槽 151‧‧‧ Groove

152‧‧‧邊條 152‧‧‧Side strips

153‧‧‧凹口 153‧‧‧ notch

16‧‧‧拉板 16‧‧‧ pull board

17‧‧‧拉板驅動器 17‧‧‧ Pulling plate drive

18‧‧‧活動壓膜組件 18‧‧‧Active laminating module

181‧‧‧壓膜件 181‧‧‧filming parts

182‧‧‧壓膜活動器 182‧‧‧Laminating device

Claims (18)

一種晶圓貼膜設備,用於一黏膜,該貼膜設備包括:一裁切傳動裝置,包含一連續循環帶動機構及至少二拉膜裁切機構,該連續循環帶動機構連接並帶動該等拉膜裁切機構沿一路徑循環移動,各該拉膜裁切機構包含一吸附區及對應該吸附區配置的一移動刀具,該吸附區包含一固定吸附區及對應該固定吸附區一側往復移動的一移動吸附區;一捲膜裝置,對應該等拉膜裁切機構配置,該捲膜裝置包含供所述黏膜套設的一固定軸,所述黏膜自該固定軸朝該等吸附區的方向拉伸;以及一框架;其中,所述黏膜被吸附在任二該拉膜裁切機構的該吸附區時,該移動吸附區會朝遠離該固定吸附區方向移動,其一該拉膜裁切機構的移動刀具能夠切割並分離所述黏膜,從而令分離的所述黏膜吸附在該吸附區,該框架對應分離的所述黏膜黏接。 A wafer filming device for a film, the filming device comprising: a cutting transmission device comprising a continuous circulation driving mechanism and at least two film cutting mechanism, the continuous cycle driving mechanism connecting and driving the film cutting The cutting mechanism is cyclically moved along a path, and each of the pulling film cutting mechanisms comprises an adsorption zone and a moving cutter disposed corresponding to the adsorption zone, the adsorption zone comprising a fixed adsorption zone and a reciprocating movement corresponding to one side of the fixed adsorption zone Moving the adsorption zone; a film winding device corresponding to the configuration of the film cutting mechanism, the film winding device comprising a fixed shaft for the mucosa sleeve, the mucous membrane pulling from the fixing axis toward the adsorption zone And a frame; wherein, when the mucus is adsorbed in the adsorption zone of any of the film cutting mechanisms, the moving adsorption zone moves away from the fixed adsorption zone, and the film cutting mechanism The moving cutter is capable of cutting and separating the mucosa such that the separated mucosa is adsorbed in the adsorption zone, and the frame is bonded to the separated mucosa. 如請求項1所述之晶圓貼膜設備,其中各該固定吸附區具有相互垂直的一第一側邊及一第二側邊,該第一側邊和所述黏膜的拉伸方向呈垂直配設,各該移動刀具對應各該第一側邊配置並沿著一方向往復移動,該移動吸附區對應該第二側邊配置。 The wafer filming apparatus of claim 1, wherein each of the fixed adsorption zones has a first side and a second side perpendicular to each other, and the first side and the mucosa are vertically aligned. It is assumed that each of the moving cutters is disposed corresponding to each of the first side edges and reciprocates along a direction, and the moving adsorption zone is disposed corresponding to the second side. 如請求項2所述之晶圓貼膜設備,其中各該拉膜裁切機構更 包含一承載板、一拉板及連接並帶動該拉板相對該承載板往復移動的一拉板驅動器,該承載板上形成有該固定吸附區,該拉板上形成有該移動吸附區。 The wafer filming device of claim 2, wherein each of the film cutting mechanisms is further The utility model comprises a carrier plate, a pulling plate and a pull plate driver connecting and driving the pulling plate to reciprocate relative to the carrying plate. The supporting plate is formed with the fixed adsorption zone, and the moving adsorption zone is formed on the pulling plate. 如請求項3所述之晶圓貼膜設備,其中各該承載板自側邊朝內設有一凹槽,該拉板容置於該凹槽。 The wafer filming device of claim 3, wherein each of the carrier plates is provided with a recess from a side edge, and the pull plate is received in the groove. 如請求項4所述之晶圓貼膜設備,其中各該承載板相對該凹槽的兩側形成二邊條,各該邊條自該承載板的內部朝外逐漸增加厚度。 The wafer filming apparatus of claim 4, wherein each of the carrier plates forms a two-sided strip with respect to two sides of the groove, and each of the side strips gradually increases in thickness from the inside of the carrier sheet. 如請求項3所述之晶圓貼膜設備,其中各該承載板自側邊朝內設有一凹口,從而供相鄰的該拉膜裁切機構之移動刀具能夠穿設過該凹口。 The wafer filming apparatus of claim 3, wherein each of the carrier plates is provided with a notch from the side inward so that a moving tool of the adjacent film cutting mechanism can pass through the notch. 如請求項1所述之晶圓貼膜設備,其中該拉膜裁切機構更包含一活動壓膜組件,該活動壓膜組件包含一壓膜件及連接並帶動該壓膜件活動於該固定吸附區的一壓膜活動器。 The wafer filming apparatus of claim 1, wherein the film cutting mechanism further comprises a movable film assembly, the movable film assembly comprises a filming member and is connected to drive the film member to move to the fixed adsorption. A laminating activator in the area. 如請求項3所述之晶圓貼膜設備,其中各該承載板具有一滑軌,各該移動刀具包含一滑動器及固定在該滑動器的一刀具組,該滑動器滑接於該滑軌,從而令該刀具組對應該承載板的一側往復位移。 The wafer filming apparatus of claim 3, wherein each of the carrier plates has a slide rail, each of the movable cutters includes a slider and a cutter set fixed to the slider, the slider being slidably coupled to the slide rail So that the tool set is reciprocally displaced corresponding to one side of the carrier plate. 如請求項1所述之晶圓貼膜設備,其更包括一下框區域及一搬移機構,吸附有分離所述黏膜的該吸附區位置在該下框區域中,該搬移機構配置在該下框區域的上方。 The wafer filming device of claim 1, further comprising a lower frame region and a moving mechanism, wherein the adsorption region where the mucosa is separated is located in the lower frame region, and the moving mechanism is disposed in the lower frame region Above. 如請求項8所述之晶圓貼膜設備,其中該搬移機構移動於該下框區域中,該搬移機構包含一移動器及連接該移動器的一吸附件,該吸附件能夠吸附該框架並壓制該框架和分離的所 述黏膜相互黏接。 The wafer filming apparatus of claim 8, wherein the moving mechanism moves in the lower frame region, the moving mechanism includes a mover and an adsorbing member connected to the movable device, and the adsorbing member can adsorb the frame and suppress The frame and the separated The mucosa adheres to each other. 一種晶圓貼膜設備的拉膜裁切機構,用於一黏膜,該拉膜裁切機構包括:一吸附區,包含一固定吸附區及對應該固定吸附區一側往復移動的一移動吸附區;以及一移動刀具,對應該吸附區配置;其中,所述黏膜被吸附在該吸附區時,該移動吸附區會朝遠離該固定吸附區方向移動,該移動刀具能夠切割並分離所述黏膜,從而令分離的所述黏膜吸附在該吸附區。 A film cutting device for a wafer filming device for a mucous membrane, the film cutting mechanism comprising: an adsorption zone comprising a fixed adsorption zone and a moving adsorption zone corresponding to a reciprocating movement of the fixed adsorption zone; And a moving cutter corresponding to the adsorption zone configuration; wherein, when the mucous membrane is adsorbed in the adsorption zone, the moving adsorption zone moves away from the fixed adsorption zone, and the moving cutter can cut and separate the mucous membrane, thereby The separated mucosa is adsorbed in the adsorption zone. 如請求項11所述之晶圓貼膜設備的拉膜裁切機構,其中各該固定吸附區具有相互垂直的一第一側邊及一第二側邊,該第一側邊和所述黏膜的拉伸方向呈垂直配設,各該移動刀具對應各該第一側邊配置並沿著一方向往復移動,該移動吸附區對應該第二側邊配置。 The film cutting device of the wafer filming device of claim 11, wherein each of the fixed adsorption regions has a first side and a second side perpendicular to each other, the first side and the mucosa The stretching direction is vertically disposed, and each of the moving cutters is disposed corresponding to each of the first side edges and reciprocates along a direction, and the moving adsorption zone is disposed corresponding to the second side. 如請求項12所述之晶圓貼膜設備的拉膜裁切機構,其中該拉膜裁切機構更包含一承載板、一拉板及連接並帶動該拉板相對該承載板往復移動的一拉板驅動器,該承載板上形成有該固定吸附區,該拉板上形成有該移動吸附區。 The film cutting device of the wafer filming device of claim 12, wherein the film cutting mechanism further comprises a carrier plate, a pull plate and a pull connecting and pulling the pull plate relative to the carrier plate The plate driver is formed with the fixed adsorption zone, and the movable adsorption zone is formed on the plate. 如請求項13所述之晶圓貼膜設備的拉膜裁切機構,其中該承載板自側邊朝內設有一凹槽,該拉板容置於該凹槽。 The film cutting device of the wafer filming device of claim 13, wherein the carrier plate is provided with a recess from the side edge, and the pull plate is received in the groove. 如請求項14所述之晶圓貼膜設備的拉膜裁切機構,其中該承載板相對該凹槽的兩側形成二邊條,各該邊條自該承載板的內部朝外逐漸增加厚度。 The film cutting device of the wafer filming device of claim 14, wherein the carrier plate forms two side strips on opposite sides of the groove, and each of the side strips gradually increases in thickness from the inside of the carrier sheet. 如請求項13所述之晶圓貼膜設備的拉膜裁切機構,其中該承 載板自側邊朝內設有一凹口。 The film cutting device of the wafer filming device according to claim 13, wherein the bearing The carrier plate is provided with a notch from the side to the inside. 如請求項11所述之晶圓貼膜設備的拉膜裁切機構,其中該拉膜裁切機構更包含一活動壓膜組件,該活動壓膜組件包含一壓膜件及連接並帶動該壓膜件活動於該固定吸附區的一壓膜活動器。 The film cutting device of the wafer filming device of claim 11, wherein the film cutting mechanism further comprises a movable film assembly comprising a film member and connecting and driving the film A pressure film mover that moves in the fixed adsorption zone. 如請求項13所述之晶圓貼膜設備的拉膜裁切機構,其中各該承載板具有一滑軌,各該移動刀具包含一滑動器及固定在該滑動器的一刀具組,該滑動器滑接於該滑軌,從而令該刀具組對應該承載板的一側往復位移。 The film cutting device of the wafer filming device of claim 13, wherein each of the carrier plates has a slide rail, each of the moving cutters comprising a slider and a cutter group fixed to the slider, the slider Sliding to the slide rail, so that the cutter set is reciprocally displaced corresponding to one side of the load plate.
TW102202432U 2013-02-05 2013-02-05 Wafer film pasting device and pulled film cutting mechanism thereof TWM457288U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737941B (en) * 2018-11-07 2021-09-01 志聖工業股份有限公司 Wafer laminator, film stretching device and wafer laminating method
CN114408650A (en) * 2022-01-28 2022-04-29 河南通用智能装备有限公司 Film releasing and moving mechanism for wafer cracking

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737941B (en) * 2018-11-07 2021-09-01 志聖工業股份有限公司 Wafer laminator, film stretching device and wafer laminating method
CN114408650A (en) * 2022-01-28 2022-04-29 河南通用智能装备有限公司 Film releasing and moving mechanism for wafer cracking
CN114408650B (en) * 2022-01-28 2024-03-01 河南通用智能装备有限公司 Film releasing and transferring mechanism for wafer splinter

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