M366166 五、新型說明： 【新型所屬之技術領域】 本新型是有關於一種回收裝置’特別是指一種將使 用過後之光阻液’直接於生產線上進行回收處理，以供 5 再次利用之循環回收裝置。 【先前技術】 10 15 20 &產業界製作彩色濾光片、液晶面板元件時，其 主要係利用光阻液加上一溶劑稀釋成一濃度比例後，再 以旋轉塗佈的方式將光阻劑塗佈於玻璃基板上，而為了 使光阻液可以均勻地旋轉塗佈於該基板上，業者會先在 該基板上塗佈大置的藥液，以使旋轉後光阻液能夠均勻 批覆於整個基板上’ ‘然而此種塗佈方式之光阻液的利用 率-般約為10% ’而其餘高達鄉之光阻液皆旋轉塗佈 過程直接被排入廢液槽内，所以使用大量的光阻液來塗 佈基板將造成浪費，同時亦會衍生出生產成本高的缺失。 此外’為避免上述光阻液的浪費，故有部分業者於 旋轉塗佈的過程中，脾诧絲, .旋轉賤出的光阻液利用回收桶收 集回收，以便將該回收桶之φ 拥t光阻液送回原供應廠進行再 生處理’藉以再次重覆伟用 復使用，其方式雖可減少部分光阻 液之浪費’但送回原供庖麻 應墩之運輸、處理上皆會增加生 產成本，再者該光阻液容易 置敌時間過久、亦或溫度 變化因素而造成變質，導 L 導致無法再生使用，故成效不佳。 有鑒於此，另有辈:去4 . 、 ^為了減少成本的支出，進而 研發出另一種光阻液回收 队裝置1，如圖1所示，用來處 3 M366166 理自一作業機台11排出之待回收的光阻液2, 1包含有 -用於暫存自該作業機台u排出的待回收之光阻液2 的預備桶U，一連接該作業機台u、預備桶 預備桶12之光阻液2處 ^ 5 10 15 20 、 收2處理後再輪送至該作業機台u使 用之混合桶13, -設置於該混合桶13上並 阻液2之攪拌器14， 蝻址斗 規什尤 牛器14 一連接該混合桶並提供一溶劑 151至此σ桶13内混合 /合劑裝置15, 一連接該混合桶 並檢測存放於混合桶13中光阻液2之檢測裝置16, :及一連接該作業機台u且提供新光阻 機台⑴上之新液裝置i厂 該作業 操作時，藉由該新液裝置17提供—光阻液⑺ 作業機台11進行塗佑柞I 至該 11上待DIM 將錢於該作業機台 待时之光㈣2，先㈣㈣預備桶 至一定量後，再將該光阻液2輸送至該混合桶13 = 用該攪拌器14進行攪牲. 内並利 進仃攪拌，由於該光阻液2内 ⑸會有揮發之情形產生， ：劑 後，必須透過該檢„置一段時間 阻液2中溶劑151人θ a J，、黏度亦即檢测該光 阻液2黏声: 否因揮發而減少，而造成該光 液2黏度過尚，所以當黏度過 劑裝置15輸送溶劑151至該 、即利用該溶 動作，促使1m @ “ ' 口 内進行混合稀釋 …： 點度介於可使用範圍内，以便 再將該絲液2輸制該作t機台 錢 171進行使用。 ^替換新光阻液 然’實際使用後發現，該光阻液回收裝置ι易產生 M366166 下列缺失，兹詳述如下： 1.由於該光阻液2與該溶劑151之密度不同，因此置放 一段時間後，該光阻液2會與溶劑151產生分離之現 象，就如習知該預備桶12内進行集收時，若集收時間 過長，容易造成該光阻液2沉澱’除使後續處理製程 上需花較長時間授拌外，f交且接—& u ^ r更谷易積存於該預備桶12 之底部’而造成輸送上的不完全。 程 ” 1 ,令匁於視评的 ίο 15 20 中，該光阻液2容易與參雜混合桶13N之空氣， 而混合後之光阻液2有氣泡之產生，除造成後續使 Ϊ不便外’同時該光阻液2也易因攪拌而造成溫度 馬，導致光阻液2變質而影響其品質。 3.由於該混合桶13需要一 而要疋時間以進行攪拌處理，因 在攬拌過程該混合桶13是 是I法提供再“丄 進枓 '供料，故攪拌 : 再生之光阻液2給作業機台U使用，同 當該預備桶12之#陏饬0隹* Π 11 , 集滿時，對於該作業機 收之先阻液2則是必須丢棄 者，當該預備桶12 ^人4 &成浪費；， 同伸12或混合桶13其一 、主 會造成該絲液、進^先時，J 法H淮一 產線停擺，使得該光阻液2 i 【新型内容】 貝噶侍改善。 因此，本新型 回收裝置’除可於 率外，同時亦能使 之目的’疋在提供_種光阻液之循環 回收處理過財’有效提升其回收效 回收處理後之光阻液品質更加穩定。 5 5 10 15 M366166 於疋，本新型光阻液 驻罢焱焱 ^ 夜之循裱回收裝置，該循環回收 裝置係與一作業機台 德：^ m 、*工 互連尨，且該作業機台可將使用 後之光阻液予以排出， 該循％回收裝置包含有至少一連 接該作業機台且將^ ^ 出的光阻液加以集收之預備桶，複 數分別連結該預備桶果收之預備捅複 从^丄 將待回收之光阻液加以混合處理 後輸送到該作業機Λ夕、日a上 〇之此σ桶，複數各一設置於該預備 桶、等混合桶上之授摔裝 ^ Β Α Α 讦衷置，複數各一設於該預備桶、 專此合桶外圍且控制其 β /皿度之恆溫裝置，一設置該預 備桶昆合桶上將空氣抽出之抽真空裝置，複數各一 設置於該等混合桶之圍繞壁上並加以檢測其溫度、黏度 之細檢裝置’-將溶劑加人該等混合桶内稀釋該光阻液 之命劑裝置’ 一將清洗液分別送至該等混合桶、預備桶 予以清洗之清洗裝置，以及—將新光阻液分別送至該作 業機台、混合桶之之新液裝置；是以，藉由複數混合桶 之設計，其具有較充分之緩衝空間，不但可針對該預備 桶上之回收之光阻液進行有效之回收處理外，更可儲備 較多處理後之光阻液以供利用；再者，於處理過程中藉 由該抽真空裝置及怪溫裝置之設計，得以避免於授掉^ 程中產生氣泡及溫度提高而影響生產品質，俾使回收處 理過後之光阻液品質更加穩定。 【實施方式】 有關本新型之前述及其他技術内容、特點與功效， 在以下配合參考圖式之較佳實施例的詳細說明中，將可 清楚的明白。 20 5 10 15 20 M366166 在本新型被詳細描述前， W的疋，在以下的說 明中，類似的元件是以相同的編號來表示。 參閱圖2，本新型光阻液L收裝置3之第一 較佳實施例，該循環回收I署3在… 褒置3係與一作業機台31相 互連接，以便將該作業機台31多 少你排出之光阻液加以 承接回收，而鋪環时裝置3包含有至少—連接該作 業機台31且承接該作業機台3排出的光阻液加以集收 之預備桶32,複數分別連結該預備桶32且將待回收之 光阻液加以混合處理後輸送到該作f機台31之混合桶 33,複數各一設於該預備桶32、混合桶33上之攪拌裝 置34,複數各一設置於該預備桶32、等混合桶33外圍 且維持其内溫度之恒溫袭置35, 一可將該預備桶”與 該等混合桶33内之空氣抽出之抽真空裝置％，複數各 一設置於該等混合桶33之圍繞壁333且檢測其内光阻 液狀態之篩檢裝置37, 一將溶劑加入該等混合桶33内 並稀釋該光阻液之溶劑裝置38, 一將清洗液分別送至該 等混合桶33、預備桶32予以清洗之清洗裝置39，以及 一與該作業機台31、該等混合桶33連接且輸入新的光 阻液之新液裝置30。 配合參閱圖3，該預備桶3 2及該每一混合桶3 3皆 由一底壁321(331)，一與該底壁321(331)呈相對設置之 頂壁322(332)，及一連結該底壁321 (331)與頂壁322(332) 間以圈圍形成有一容置空間324(334)之圍繞壁323(333) 所組成’同時於本實施例中，該等混合桶33係以設置 7 M366166 兩個為例加以說明；另，該每一攪拌裝置34具有—設 置於該頂壁322(332)上的動力源341，以及一由該頂壁 322(332)、伸入至該容置空間324(334)内並受該動力源 341驅動之攪拌件342 ;又，該恆溫裝置35具有分別包 5 覆於該預備桶32、等混合桶33外圍之外桶體351，以 使該預備桶32、等混合桶33與外桶體35丨間形成有一 冷卻環槽352，以便注入—冷卻劑353(如水、冷卻氣體 等）於該冷卻環槽352内進行循環，俾便控制將該預備 桶32、混合桶33之光阻液溫度得以維持一定範圍中， 10 避免該光阻液於攪拌中溫度提高而導致變質。 另，該抽真空裝置36，具有一設置於伸入該預備桶 32、等混合桶33之容置空間324(334)内的管路361，以 及連接該官路361且將該預備桶32、等混合桶33内 空氣加以抽出之抽氣動力源362，以使該預備桶32、混 15 合桶33内呈真空狀態；至於，該篩檢裝置37，於本實 施中則具有一檢測該光阻液溫度之溫度計371，以及檢 測該光阻液之黏度之黏度計372,設置於該混合桶33 之圍繞壁323上並深入其該容置空間334内。 再者’於本實施例中，該溶劑裝置38具有一存放 20 /谷劑之溶劑供應桶3 8 1，以及一分別連結該等混合桶 3 3、/谷劑供應桶3 81之溶劑管線3 8 2，以便將該溶劑從 該/谷劑供應桶3 8 1輸送至該等混合桶3 3内，並將該光 阻液濃度予以稀釋；另，該清洗裝置39，具有一裝有清 洗液之清洗液供應桶391，一分別連結該清洗液供應桶 M366166 391、預備桶32、等混合桶33之清洗液管線393，以及 一將該清洗液供應桶391内之清洗液打入該預備桶 • 32、等混合桶33内之清洗動力源392。 最後，該新液裝置30具有一用於新液裝置3〇具有 5 一供應新光阻液的新液供應桶301，以及一分別連結該 混合桶33、新液供應桶3〇1之新液管線3〇2，以便將該 •光阻液從該新液供應桶301輸送至該作業機台31，當然 φ 該新液管線302除可與該作業機台31連接外，更可與 該等混合桶33作-連結，並可適時選擇供應新的光阻 1〇液至該作業機台31或者該等混合桶33中；此外，於本 實施例中，在該預備桶32、混合桶33、溶劑供應桶38卜 新液供應桶301上，都增設有一重量器373，用以量測 其内液體變化並藉此定量。 、參閱圖2、圖3 ’操作時，首先將該作業機台31運 轉過程中多餘之光阻液輸送至該預備桶32内集收，同 • 時於純過程該㈣裝置％ -直處於動作的情況下’ 可避免長時間的集收下光阻液與溶劑產生分離沉殿甚 、 至積存之情況產生’促使後續處理更為快速，而後當該 2〇預備桶32收集之光阻液達-定的量後，即可輸入至該 =合桶33内進行檢測、混合作業，以利用該溫度計π 與黏度計372,分別檢測帶回收液之溫度與黏度，若黏 度過向的情況下’可透過該溶劑裝置％將溶劑輸送至 =二桶33内進行混合稀釋，以供該作業機台3丄能正 吊進仃使用，當然前述不管混合過程或混合後，該授摔 9 M366166 裝置34皆持續地進行轉動， 31上之光& 確保輪送至該作業機台 置有複數Γ人溶劑係屬均勻狀態下;至於，藉由設 直有複數混合桶33，能直—θ 光阻液時·十土 μ八此S桶33内還儲存有 5 10 15 20 可將光阻二混合桶33故障時，該預備桶32仍 3= 其他混合桶33進行處理，破保能回 效率。、^1進们更可提升該循環回收裝置3之回收 ^值得-提的是，該預備桶32、等混合桶㈣ 真空裝置36的設置’使該預備桶32、混合桶Μ 内音屬於真空之狀態下，因此於攪拌過程中，可避免該 光阻液產生氣泡，使得时後之光阻H更加穩定； 再者’授拌時所造成該光阻液之溫度提高，也可藉由該 ^皿裝置35的設置’亦即透過一冷卻劑353於該冷卻 環槽352内進行循環，藉以該容置空間324(334)之光阻 液概度進行一熱交換作用，使該光阻液溫度維持一定溫 度範圍内，除能避免攪拌過程因溫度提高而造成該光阻 液變質外，更可延長該光阻液的保存期限。 參閱圖4，本新型光阻液之循環回收裝置3之第二 較佳實施例，其仍包含有預備桶32、複數混合桶33、 攪拌裝置34、恆溫裝置35、抽真空裝置36、篩檢裝置 37、溶劑裝置38、清洗裝置39及新液裝置30等要件， 且其動作與欲達成之功效皆涵蓋第一實施例中所述；特 別是’在本實施例中該預備桶32設置有複數個（圖中以 兩個表示），藉此當其一預備桶32故障或清洗作業等而 10 M366166 5 10 15 20 無法使用_亦能夠使用其他預備桶32，更具較佳之緩 衝空間’確保該循環回收裝置3不中斷，當然，該預備 桶32與此口桶33之設計皆為相同，因此，當其—預備 桶32或'合桶33故障時，亦可互相置換使用。 歸納刖述’本新型光阻液之循環回收裝置，藉 備桶配合複數混合桶之設計，使光阻液之處理上 充分之緩衝空間，除右汾担必甘 、有較 J除有效提升其回收效率外，，同時於 處理過程中利❹真空裝置騎溫裝置，更可避免授掉 過程產生氣泡或溫度提高而料其品f，以使回 後之光阻液品皙争&趙^ 買更加穩疋且使用寿命更長，故確實 到本新型之目的。 雉貫靶達 a、上所述者，僅為說明本新型之較佳實施例而 已’當不能以此限定本新型實施之範圍’即大凡依 型申請專利範圍及新型說明容所作之簡單 變化與修飾，皆應仍屬本新型專利涵蓋之範圍内。， 【圖式簡單說明】 圖1是習知光阻液回收裝置之示意圖； 圖2是本新型第一較佳實施例光阻液之循環 置之示意圖； 圖3疋本新型第一較佳實施例該 圖；及 備桶之局部剖视 圖4是本新型第二較佳實施例光阻液之循 置之示意圖。 裝 11 M366166 【主要元件符號說明】 3 循環回收裝置 30 新液裝置 301 新液供應桶 302 新液營線 5 31 作業機台 32 預備桶 33 混合桶 321 、 331 底壁 322 > 332頂壁 323 、 333 圍繞壁 324、 334容置空間 34 攪拌裝置 341 動力源 10 342 攪拌件 35 恆溫裝置 351 外桶體 352 冷卻環槽 353 冷卻劑 36 抽真空裝置 361 管路 362 抽氣動力源 15 37 篩檢裝置 371 溫度計 372 黏度計 38 溶劑裝置 381 溶劑供應桶 382 溶劑管線 39 清洗裝置 391 清洗液供應桶 20 392 清洗動力源 393 清洗液管線 12M366166 V. New description: [New technical field] The new type is related to a recycling device, especially a kind of photoresist after use, which is directly recycled on the production line for recycling. Device. [Prior Art] 10 15 20 & When manufacturing color filters and liquid crystal panel elements, the industry mainly uses a photoresist solution and a solvent to dilute to a concentration ratio, and then spin-coats the photoresist. It is coated on a glass substrate, and in order to uniformly apply the photoresist liquid to the substrate, the manufacturer will first apply a large liquid medicine on the substrate to enable the photoresist after the rotation to be uniformly distributed. On the entire substrate, 'the utilization rate of the photoresist solution of this coating method is about 10%', and the rest of the high-resistance photoresist solution is directly discharged into the waste liquid tank by the spin coating process, so the use of a large amount The use of photoresist to coat the substrate will result in waste, and at the same time it will lead to a lack of high production costs. In addition, in order to avoid the waste of the above-mentioned photoresist liquid, some manufacturers in the process of spin coating, the spleen silk, the rotating photoresist liquid is collected and recycled by the recycling drum, so that the recycling barrel The photoresist is sent back to the original supply plant for recycling treatment, so that it can be reused again and again, although the method can reduce the waste of some photoresist liquids, but the transportation and processing of the original ramie should be increased. The production cost, in addition, the photoresist liquid is easy to be entrapped for too long, or the temperature change factor causes deterioration, and the lead L can not be regenerated, so the effect is not good. In view of this, another generation: go to 4. , in order to reduce the cost of expenditure, and then developed another photoresist liquid recycling team device 1, as shown in Figure 1, used to 3 M366166 from a work machine 11 The discharged photoresist liquid 2, 1 contains a preliminary barrel U for temporarily storing the photoresist liquid 2 to be recovered discharged from the working machine u, and is connected to the working machine u and the preliminary barrel preparation barrel 12 photo-resistance liquid 2 ^ 5 10 15 20, after receiving 2 treatment, and then transferred to the mixing machine 13 used by the working machine u, - agitator 14 disposed on the mixing barrel 13 and blocking liquid 2, 蝻A bucket unit, a special cow 14 is connected to the mixing tank and provides a solvent 151 to the mixing/mixing device 15 in the σ barrel 13, a detecting device 16 that connects the mixing barrel and detects the photoresist 2 stored in the mixing tank 13. , and a new liquid device i connected to the work machine u and provided on the new photoresist machine (1), when the operation is performed, the new liquid device 17 provides the photoresist liquid (7) working machine 11 for coating I to the 11th to wait for the DIM to spend money on the work machine (4) 2, first (four) (four) prepare the barrel to a certain amount, then the photoresist 2 Sent to the mixing tank 13 = stir with the agitator 14. Internally, the stirring is carried out, because the inside of the photoresist 2 (5) will be volatilized, after the agent, it must be passed through the test for a period of time. In the liquid-repellent solution 2, the solvent is 151 people θ a J, and the viscosity is the viscosity of the photoresist 2; whether it is reduced by volatilization, and the viscosity of the photo-liquid 2 is too high, so when the viscosity agent device 15 delivers the solvent 151 to this, that is, using the dissolution action, prompting 1m @" 'mixing and dilution in the mouth...: The point is within the usable range, so that the silk liquid 2 can be further used for the use of the machine 171. ^Replace the new photoresist solution. After the actual use, it is found that the photoresist liquid recovery device ι easily produces the following defects of M366166, which are detailed as follows: 1. Since the density of the photoresist liquid 2 and the solvent 151 are different, a section is placed. After the time, the photoresist 2 will be separated from the solvent 151. As is conventionally known, when the collection barrel 12 is collected, if the collection time is too long, the photoresist 2 is likely to precipitate. It takes a long time to process the mixing process, and the f-crossing and connecting-&u^r are more easily accumulated in the bottom of the preparation tank 12, resulting in incomplete transportation. Cheng 1 , in the ίο 15 20 of the review, the photoresist 2 is easy to mix with the air of the mixing tank 13N, and the mixed photoresist 2 has bubbles, which causes the subsequent inconvenience. 'At the same time, the photoresist 2 is also liable to cause temperature due to agitation, which causes the photoresist 2 to deteriorate and affect its quality. 3. Since the mixing tank 13 needs one time to be stirred for the mixing process, The mixing barrel 13 is supplied by the I method and then supplied with the material, so the stirring: the recycled photo-resisting liquid 2 is used by the working machine U, and the same as the #桶0隹* Π 11 of the preparation barrel 12. When the set is full, the first blocking liquid 2 for the working machine must be discarded, when the preparation barrel 12 ^ people 4 & waste, the same extension 12 or the mixing barrel 13 one, the main will cause the silk When the liquid is in the first place, the J method H Huaiyi production line is stopped, so that the photoresist liquid 2 i [new content] Therefore, the new recycling device can be used in addition to the rate, and at the same time, it can make the purpose of the recycling process of the photoresist solution to improve the recycling efficiency of the photoresist. . 5 5 10 15 M366166 Yu Wei, this new type of photoresist liquid station 焱焱 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜 夜The unit can discharge the used photoresist liquid, and the recycling device comprises at least one preparation barrel connected to the working machine and collecting the photoresist liquid, and the plurality of separate barrels are respectively connected to the preparation barrel. The preparation of the refractory liquid from the 丄 丄 混合 加以 加以 加以 加以 加以 加以 加以 加以 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光摔 ^ Β Α 讦 讦 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , 恒温 恒温 恒温 恒温 恒温 恒温 恒温 恒温 恒温a device, a plurality of fine inspection devices disposed on the surrounding walls of the mixing barrels and detecting the temperature and viscosity thereof - adding a solvent to the mixing tanks of the photoresists in the mixing tanks The liquid is sent to the mixing tanks and the preparation tanks for cleaning. The device, and the new liquid device for sending the new photoresist liquid to the working machine and the mixing barrel respectively; that is, by the design of the plurality of mixing barrels, the buffering space is sufficient, not only for the preparation barrel The recovered photoresist solution can be effectively recycled, and more processed photoresist liquid can be stored for use; in addition, the design of the vacuuming device and the strange temperature device can be avoided during the processing. The bubbles are generated during the process and the temperature is increased to affect the production quality, so that the quality of the photoresist after the recovery process is more stable. The above and other technical contents, features, and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments of the invention. 20 5 10 15 20 M366166 Before the present invention is described in detail, the following elements are denoted by the same reference numerals in the following description. Referring to FIG. 2, in the first preferred embodiment of the novel photoresist liquid retracting device 3, the recycling unit 3 is connected to a working machine 31 in order to connect the working machine 31. The photoresist solution that you discharge is taken up and recovered, and the device 3 includes at least a preparation bucket 32 that is connected to the work machine table 31 and receives the photoresist liquid discharged from the work machine table 3, and the plurality is separately connected. The barrel 32 is prepared and the photoresist liquid to be recovered is mixed and sent to the mixing tank 33 of the f-stage 31, and a plurality of stirring devices 34 respectively disposed on the preparation tank 32 and the mixing tank 33 are provided. a thermostatic setting 35 disposed on the periphery of the mixing tank 32, the mixing barrel 33, and maintaining the internal temperature thereof, and a vacuuming device for extracting the air in the mixing barrel 33 and the mixing barrel 33, respectively In the screening device 37 of the mixing barrel 33 surrounding the wall 333 and detecting the photo-resistance state thereof, a solvent is added into the mixing tank 33 and the solvent device 38 of the photoresist is diluted, and the cleaning liquid is separately a cleaning device 39 that is sent to the mixing tank 33 and the preparation tank 32 for cleaning, And a new liquid device 30 connected to the working machine table 31 and the mixing barrels 33 and inputting a new photoresist liquid. Referring to FIG. 3, the preparation barrel 3 2 and each of the mixing barrels 3 3 are each provided with a bottom. a wall 321 (331), a top wall 322 (332) opposite to the bottom wall 321 (331), and a connecting space between the bottom wall 321 (331) and the top wall 322 (332) The space 324 (334) is formed by the surrounding wall 323 (333). In the present embodiment, the mixing barrels 33 are exemplified by the arrangement of 7 M366166; in addition, each of the stirring devices 34 has - a power source 341 disposed on the top wall 322 (332), and a stirring member 342 extending from the top wall 322 (332) into the accommodating space 324 (334) and driven by the power source 341; Moreover, the thermostat device 35 has a barrel 351 which is respectively wrapped around the periphery of the mixing tub 32 and the mixing tub 33, so that a cooling ring is formed between the mixing tub 32, the mixing tub 33 and the outer tub 35. a groove 352 for circulating an injection-coolant 353 (such as water, cooling gas, etc.) in the cooling ring groove 352, and controlling the light of the preparation tank 32 and the mixing barrel 33 The temperature of the liquid-repellent solution is maintained within a certain range, and 10 is prevented from being deteriorated due to an increase in temperature during stirring. Further, the vacuuming device 36 has a housing disposed in the mixing barrel 32 and the mixing barrel 33. a pipeline 361 in the space 324 (334), and an exhaust power source 362 that connects the official road 361 and extracts the air in the mixing tank 32, the mixing tank 33, etc., so that the preparation bucket 32, the mixing 15 barrel 33 is in a vacuum state; as for the screening device 37, in the present embodiment, there is a thermometer 371 for detecting the temperature of the photoresist, and a viscosity meter 372 for detecting the viscosity of the photoresist, which is disposed in the mixing tank 33. It surrounds the wall 323 and penetrates into the accommodating space 334. Furthermore, in the present embodiment, the solvent device 38 has a solvent supply tank 381 for storing 20/trol and a solvent line 3 for connecting the mixing tanks 3 3 and the grain supply tanks 381, respectively. 8 2, in order to transport the solvent from the/supply supply tank 381 to the mixing tanks 3 3 and dilute the concentration of the photoresist; in addition, the cleaning device 39 has a cleaning liquid a cleaning liquid supply tank 391, a cleaning liquid line 393 respectively connecting the cleaning liquid supply tank M366166 391, the preparation tank 32, the mixing tank 33, and a cleaning liquid in the cleaning liquid supply tank 391 into the preparation barrel • 32, a cleaning power source 392 in the mixing tank 33. Finally, the new liquid device 30 has a new liquid supply tank 301 for supplying a new photoresist liquid for the new liquid device 3, and a new liquid supply line for connecting the mixing tank 33 and the new liquid supply tank 3〇1, respectively. 3〇2, in order to transport the photoresist liquid from the new liquid supply tank 301 to the working machine table 31, of course, φ the new liquid line 302 can be mixed with the working machine table 31, and can be mixed with the same The barrel 33 is connected-connected, and a new photoresist 1 sputum can be selected to be supplied to the working machine table 31 or the mixing drums 33 in a timely manner; further, in the present embodiment, the preparation tank 32, the mixing tank 33, A solvent 375 is added to the solvent supply tank 38 and the new liquid supply tank 301 for measuring the liquid change therein and thereby quantifying. Referring to FIG. 2 and FIG. 3 'operation, firstly, the excess photoresist liquid during the operation of the working machine 31 is sent to the collection bucket 32 for collection, and the same time in the pure process (4) device % - straight action In the case of 'can avoid long-term collection of photoresist and solvent, the separation of the temple, even to the accumulation of the situation, which will make the subsequent processing faster, and then when the 2 〇 preparation barrel 32 collects the photoresist After a predetermined amount, it can be input into the = barrel 33 for detection and mixing operation, and the temperature and viscosity of the recovered liquid are respectively detected by the thermometer π and the viscosity meter 372, and if the viscosity is excessive, The solvent can be transported to the = two barrels 33 through the solvent device for mixing and dilution, so that the working machine 3 can be hoisted into the raft. Of course, regardless of the mixing process or mixing, the smashing 9 M366166 device 34 Rotating continuously, the light on the 31 & ensuring that the wheel is sent to the working machine with a plurality of solvents in a uniform state; as a result, by providing a plurality of mixing tanks 33, the direct-θ photoresist can be Liquid time · ten soil μ eight this S barrel 33 also 5,101,520 there may be two mixing tank 33 when the resist failure, the preliminary tub 32 = 3 still other mixing processing tub 33, to return to break the protection efficiency. Moreover, the recovery of the recycling device 3 can be improved. It is worth mentioning that the setting of the preparation tank 32, the mixing tank (four) vacuum device 36 is such that the internal volume of the preparation tank 32 and the mixing barrel is a vacuum. In the state of the stirring, the photoresist is prevented from being generated in the stirring process, so that the photoresist H is more stable afterwards; in addition, the temperature of the photoresist is increased when the mixing is performed, and the The arrangement of the dish device 35 is circulated through the cooling ring groove 352 through a coolant 353, whereby a heat exchange effect is performed by the photoresist liquidity of the accommodating space 324 (334), so that the photoresist liquid The temperature is maintained within a certain temperature range, in addition to avoiding deterioration of the photoresist due to temperature increase during the stirring process, and prolonging the shelf life of the photoresist. Referring to FIG. 4, a second preferred embodiment of the novel photoresist liquid recycling device 3 further includes a preliminary barrel 32, a plurality of mixing barrels 33, a stirring device 34, a thermostat 35, a vacuuming device 36, and a screening test. The device 37, the solvent device 38, the cleaning device 39, and the new liquid device 30, etc., and the actions and effects to be achieved thereof are all described in the first embodiment; in particular, in the present embodiment, the preparation bucket 32 is provided with A plurality of (indicated by two in the figure), so that when one of the preparation buckets 32 fails or the cleaning operation, etc., 10 M366166 5 10 15 20 cannot be used _ can also use other preparation buckets 32, and a better buffer space is ensured The recycling device 3 is not interrupted. Of course, the design of the preparation bucket 32 and the bucket 33 are the same. Therefore, when the preparation bucket 32 or the bucket 33 is faulty, it can be replaced with each other. In summary, the recycling of the new type of photoresist liquid, the design of the barrel and the complex mixing barrel, to make the processing of the photoresist liquid sufficient buffer space, in addition to the right 汾 will be willing, there are more effective than J In addition to the recycling efficiency, at the same time, during the processing, the vacuum device is used to ride the temperature device, and it is possible to avoid the occurrence of bubbles or temperature increase during the process of the transfer, so as to make the product of the hindrance of the liquid retardant product & Zhao ^ Buying is more stable and has a longer service life, so it is indeed the purpose of this new type. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Modifications shall remain within the scope of this new patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a conventional photoresist liquid recovery apparatus; FIG. 2 is a schematic view showing a circulating arrangement of a photoresist liquid according to a first preferred embodiment of the present invention; FIG. 1 is a partial cross-sectional view of the preparation tank. FIG. 4 is a schematic view of the photoresist of the second preferred embodiment of the present invention. 11 M366166 [Description of main components] 3 Recycling device 30 New liquid device 301 New liquid supply tank 302 New liquid camping line 5 31 Working machine 32 Preparing bucket 33 Mixing bucket 321, 331 Bottom wall 322 > 332 Top wall 323 333 accommodating space around walls 324, 334 34 stirring device 341 power source 10 342 stirring member 35 thermostat 351 outer barrel 352 cooling ring groove 353 coolant 36 vacuuming device 361 pipe 362 pumping power source 15 37 screening Device 371 Thermometer 372 Viscometer 38 Solvent device 381 Solvent supply tank 382 Solvent line 39 Cleaning device 391 Cleaning liquid supply tank 20 392 Cleaning power source 393 Cleaning liquid line 12