M343240 八、新型說明： 【新型所屬之技術領域】 本創作係、有關於-種光罩盒，特別是有關於—種具有限制件之光罩盒。 【先前技術】 近代半導體科紐展迅速，其t光學鄉技術(Qptieal Lithography)扮演重要 的角色，只要是關於圖形(pattem)定義，皆需仰賴光學微影技術。光學微影技術 _在半導體的應用上’是將設計好的線路製作成具有特定形狀可透光之光罩(沖〇仿 籲mask)。利用曝光原理，則光源通過光罩投影至石夕晶圓(ion可曝光顯示 特疋圖案。由於任何附著於光罩上的塵埃顆粒(如微粒、粉塵或有機物)都會造成 投影成像的品質劣化，用於產生圖形的光罩必須保持絕對潔淨，其中8娜系統 之目的係為減少半導體製程之儲存及運送過程+所受之微粒過量。 #如第A圖及第-B圖所示’為—習知的—般之光罩傳送盒卜其係由上 下蓋體11及12組合而成，其中在下蓋體12内的兩側邊上設置兩相對的固持裝 置121 ’此固持裝置121還包括一些限位片1211及支撐件1212配置其上。此外， j兩相對的ϋ持裝置121的其卜相_邊，則更配置—限繼置⑵，使得下 盍體12由兩個固持裝£ 121及一個相鄰的限制裝置122形成一個近似，，门，，字型 • $結構。因此當-片鮮放人下蓋體12時，可藉由此”π，，字型的結構來形成固 定及支撐光罩。當光罩傳送盒！之上下蓋體u及U蓋合一光罩時，配置在固 持裝置上的限位片1211及支樓件1212會支撐光罩之邊緣，但由於上下蓋體Μ、 12蓋合時會有_產生，使得光罩在運賴過程巾會在未設有_裝置之1 (亦即Π ϋ結構的開口)方向上產生位移。如此，不僅使得光罩接觸到固持詈 與限制褒置丨22的地方產生磨損，因而降低光罩的使用壽命，並且還^ 磨擦2形成塵粒而影響良率，同時此光罩盒亦會因部分的損壞或磨損，:必須 丟棄正個光罩盒，無法繼續使用，而產生浪費並導致使用成本提高。’、、 5 M343240 【新型内容】 為解決先前技術之問題，本創作提供一種具有限制件之光罩盒。此光罩盒 係由上蓋體與下蓋體組合而成，形成一内部空間可容納光罩，並具有一支架與 一限制件，支架健設於下蓋社具有_第_卡設部(engagingpGrti〇n),此第^ 卡設部包含有至少-第-頂持面，而此限制件則包括有一座體以及一限位片， 其中此座體係以組裝方式裝設於光罩盒之支架内，並具有至少一第二卡設部， 此第二卡設部包括至少-第二頂持面，而限位片則設置於座體上，用以固定並 抵持光罩，當_件之第二卡設部與支架之第—卡設部相互卡持時，第一頂持 面與第二麟_互抵制，㈣免關件上下齡，並減少光罩與光罩盒之摩 擦，進而減少塵粒形成而影響良率，使得光罩壽命得以提高。 、此外’光罩盒上下蓋體具有一相互對應之側邊，至少一鎖扣件設於上蓋體 或下蓋體之側邊上’而另一蓋體的側邊則具有一鎖扣槽設於對應鎖扣件的位 置，並有i扣座固設於鎖扣槽中。其中，此鎖扣座的材質之耐磨度高於其所 屬之上下蓋體的材質，因此當料盒之上下蓋體蓋合並鎖扣時，可避免因摩擦 而導致鎖扣座_，而使得上下蓋體蓋合後仍有鬆_現象產生。 τ 由於本創作光罩盒之限制件係以組裝方式裝設於光罩盒下蓋體，鎖扣座則 Τ卡設方朗定於上下蓋體，因此#限制件產生部分或全部損壞絲損時， Η字便於拆解並直接更換關件_扣座，以使鮮盒得賴續仙，避免產生 •浪費並軸制縣提高，料由敎撐件亦可設置於可拆解之關件上，因 此當支撐件產生損壞或磨損時，亦可一併進行更換。 免限制件上下鬆動。 夏鱼2ΓΓ目的在於提供一種光罩盒’其限制件係之組裝方式可減少光 罩Ί罩i之摩擦，進而減少塵粒形成而影響良率，使得光罩壽命得以提高。 解與更換練供—賊罩盒，其關件叙組裝方式將便於拆 M343240 以上所述之光罩盒2，可為光罩傳送盒或光罩保存盒。 本創作乃針對先前技術加以改良者，本創作光罩盒之限制件係以組裝方式 裝設於光罩盒下蓋體，鎖扣剌細卡設方式@定於上下蓋體，因此當限制件 產生部分或全壞或磨損時，將便於拆解並直接更換關件朗扣座，以使 光罩盒得以_朗，避免產生浪f並導致個成本提高，此外由於支撐件亦 可設置於可拆解之關件上，因此#支撐件產生娜或賴時，亦可—併進行 更換。 以上所述僅為本創作之較佳實施例而已，並非用以限定本創作之申請專利 權和同夸以上的描述，對於熟知本技術領域之專門人士應可明瞭及實施，因 此其他未麟糊作賴不之精神下所完成的等效改變或修飾，均應包含在下 述之申請專利範圍中。 【圖式簡單說明】 第- A圖與第-B圖係光罩傳送盒之示細(習知技術）。 第二圖係本創作光罩盒之—實施例示意圖。 卜5至第—c®係本創作光罩盒下蓋體與限制件之—實施例示意圖。 第四A圖至圖係本創作光罩盒下蓋體與限制件組裝之一實施例示意 圖0 第五Affi|與第圖係本創作光罩盒下蓋體與鎖扣座之—實施例示意圖。 【主要元件符號說明】 I 光罩傳送盒 II 上蓋體 12 下蓋體 121 固持裝置 1211限位片M343240 VIII. New description: [New technical field] This creation department has a variety of reticle boxes, especially related to a kind of reticle box with restrictions. [Prior Art] The modern semiconductor science exhibition is rapid, and its Qptieal Lithography plays an important role. As long as it is about the definition of graphic, it depends on optical lithography. Optical lithography technology _ in semiconductor applications is to make the designed circuit into a light ray with a specific shape to illuminate the mask. Using the exposure principle, the light source is projected through the reticle to the Shixi wafer (ion can be exposed to display the special pattern. Since any dust particles (such as particles, dust or organic matter) attached to the reticle will cause degradation of the quality of the projection image, The mask used to create the pattern must be absolutely clean, and the purpose of the 8 Na system is to reduce the excess of particles in the storage and transportation process of the semiconductor process. # As shown in Figure A and Figure B - The conventional illuminating transfer box is composed of a combination of upper and lower covers 11 and 12, wherein two opposite holding devices 121 are disposed on both sides of the lower cover 12. The holding device 121 further includes some The limiting piece 1211 and the supporting member 1212 are disposed thereon. Further, the opposite sides of the two opposing holding devices 121 are more configured to be relayed (2), so that the lower body 12 is supported by two holdings 121. And an adjacent limiting device 122 forms an approximation, a door, a font, and a structure. Therefore, when the lower cover 12 is placed, the structure can be fixed by the "π," font structure. And support the hood. When the reticle transfer box! When the cover u and the U cover a reticle, the limiting piece 1211 and the branch member 1212 disposed on the holding device support the edge of the reticle, but when the upper and lower covers Μ, 12 are closed, there will be _, Therefore, the reticle is displaced in the direction of the unloading process 1 (that is, the opening of the Π structure), so that not only the reticle is brought into contact with the holding 詈 and the restriction 丨 22 Wear, thus reducing the life of the reticle, and also rubbing 2 to form dust particles to affect the yield, and the hood is also partially damaged or worn: the reticle box must be discarded and cannot be used any more. Waste is generated and the cost of use is increased. ',, 5 M343240 [New content] In order to solve the problems of the prior art, the present invention provides a mask case with a restriction member. The mask case is composed of an upper cover and a lower cover. Forming an internal space for accommodating the reticle, and having a bracket and a limiting member, the bracket is affixed to the lower cover body and has a _ _ 卡 设 设 (engagepGrti〇n), the second card portion includes at least - the first top holding surface, and the limiter includes a body and a limiting piece, wherein the seat system is assembled in the bracket of the reticle box and has at least one second clamping portion, the second clamping portion comprising at least a second holding surface, The limiting piece is disposed on the base body for fixing and resisting the reticle. When the second clamping portion of the _ piece and the first clamping portion of the bracket are mutually engaged, the first receiving surface and the second receiving surface Lin_mutually resists, (4) the age of the parts is reduced, and the friction between the mask and the mask box is reduced, thereby reducing the formation of dust particles and affecting the yield, so that the life of the mask can be improved. In addition, the upper and lower covers of the mask box have a mutually corresponding side, at least one locking member is disposed on a side of the upper cover body or the lower cover body, and a side of the other cover body has a locking groove disposed at a position corresponding to the locking member, and has The i-seat is fixed in the locking groove. Wherein, the material of the lock seat has a higher wear resistance than the material of the upper cover body, so that when the lower cover cover of the box is combined with the lock, the lock seat _ can be avoided due to friction There is still a loose phenomenon after the upper and lower covers are closed. τ Since the restriction piece of the created reticle case is assembled in the lower cover of the reticle box, the lock seat is slanted to the upper and lower cover bodies, so that the #limit piece generates partial or complete damage to the wire loss. When the Η word is easy to disassemble and directly replace the _ buckle seat, so that the fresh box depends on the sequel, avoiding the generation of waste and the improvement of the shaft county, the gusset can also be placed on the detachable door. Therefore, when the support member is damaged or worn, it can be replaced together. Unrestricted parts are loosened up and down. The purpose of the summer fish 2 is to provide a reticle housing. The assembly of the restraining member can reduce the friction of the hood hood i, thereby reducing the formation of dust particles and affecting the yield, so that the life of the reticle can be improved. Solution and replacement of the training - thief cover box, the closed part of the assembly method will be easy to remove M343240 The above described mask box 2, can be a reticle transfer box or reticle storage box. This creation is aimed at improving the prior art. The limiting piece of the created reticle box is assembled in the lower cover of the reticle box in an assembled manner, and the locking 剌 卡 卡 定 定 定 定 定 定 定 定 定 定 定 定 定 定 定 定When partial or total failure or wear occurs, it will be easy to disassemble and directly replace the closing buckle seat, so that the mask box can be swayed, avoiding the generation of waves and causing an increase in cost, and the support member can also be disposed at the same time. On the dismantling of the closing parts, therefore, when the #support member produces Na or Lai, it can also be replaced. The above description is only the preferred embodiment of the present invention, and is not intended to limit the patent application and the above description of the present invention. It should be understood and implemented by those skilled in the art, and therefore other Equivalent changes or modifications made in the spirit of the above shall be included in the scope of the following patent application. [Simple description of the drawings] The first-A and the -B-pictures are detailed descriptions of the reticle transfer case (known technique). The second figure is a schematic view of an embodiment of the present photomask case.卜5至第-c® is a schematic view of an embodiment of a lower cover body and a restraining member of the present photomask case. The fourth A to the figure is a schematic diagram of one embodiment of the assembly of the lower cover body and the limiting member of the present photomask box. The fifth Affi| and the first drawing are the bottom cover body and the locking seat of the photomask case. . [Main component symbol description] I Photomask transfer box II Upper cover 12 Lower cover 121 Holding device 1211 Limiting piece