TWI911845B - Method for temperature regulation of components for making a soldered or sintered joint, and soldering or sintering device - Google Patents
Method for temperature regulation of components for making a soldered or sintered joint, and soldering or sintering deviceInfo
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本發明係關於一種用於構件之溫度調節之方法,其用於在這些構件之間製造焊接或燒結結點,其中提供至少一個可控制熱源用於供應待轉移至構件之熱能。The present invention relates to a method for temperature regulation of components for creating welded or sintered joints between such components, wherein at least one controllable heat source is provided for supplying heat energy to be transferred to the components.
此外,本發明係關於一種用於在構件之間製造焊接或燒結結點之焊接或燒結裝置,其中該焊接或燒結裝置具有至少一個經配置用於供應待轉移至構件之熱能的可控制熱源。Furthermore, the present invention relates to a welding or sintering apparatus for manufacturing welded or sintered joints between components, wherein the welding or sintering apparatus has at least one controllable heat source configured to supply heat energy to be transferred to the components.
當燒結及焊接兩個或更多個構件,尤其係電子構件及基板時,有可能藉助於接合材料將其以導電及/或導熱方式彼此連接,其中連接接合材料經燒結或熔融。此處,待連接之構件可在上部工具與下部工具之間壓縮,其中按一般規則,按壓力在燒結期間比在焊接期間實質上更高。在習知燒結或焊接裝置之狀況下,燒結或焊接所需之熱能可經由上部工具及下部工具轉移至構件。When sintering and welding two or more components, especially electronic components and substrates, it is possible to connect them to each other electrically and/or thermally by means of a bonding material, wherein the bonding material is sintered or melted. Here, the components to be joined can be compressed between an upper tool and a lower tool, wherein, generally speaking, the pressure is substantially higher during sintering than during welding. In the case of known sintering or welding apparatus, the heat energy required for sintering or welding can be transferred to the components via the upper and lower tools.
習知燒結或焊接裝置之實例及對應方法描述於例如DE 10 2006 034 600 B4、DE 203 00 375 U1、DE 10 2004 047 359 B3、DE 10 2012 206 403 B3及WO 2014/135151 A2中。Examples of familiar sintering or welding apparatus and corresponding methods are described in, for example, DE 10 2006 034 600 B4, DE 203 00 375 U1, DE 10 2004 047 359 B3, DE 10 2012 206 403 B3 and WO 2014/135151 A2.
用於製造焊接或燒結結點之裝置或設施可具有一或多個處理腔室,在該一或多個處理腔室中,可設定用於執行焊接或燒結方法所需之處理大氣,且尤其亦在製程期間更改該處理大氣。可藉由合適的輸送構件將先前組合成組件且可在必要時以合適方式且藉由合適手段相對於彼此固定來維持所需位置的待連接之構件輸送至不同處理腔室、自不同處理腔室輸送且在不同處理腔室之間輸送。各別處理腔室中之處理大氣可例如相對於其材料組成、其壓力及/或其溫度來設定及/或更改。舉例而言,可使用不同處理氣體混合物來設定1 hPa與1200 hPa之間的壓力。An apparatus or facility for manufacturing welded or sintered joints may have one or more processing chambers in which a processing atmosphere required for performing the welding or sintering method may be set, and especially changed during the process. Components to be joined, previously assembled and which can be appropriately fixed relative to each other to maintain their desired position as needed, can be transported to, from, and between different processing chambers by suitable transport components. The processing atmosphere in each processing chamber may be set and/or changed, for example, relative to its material composition, its pressure, and/or its temperature. For example, different mixtures of processing gases may be used to set pressures between 1 hPa and 1200 hPa.
在習知的焊接或燒結裝置中,熱能可經由上部工具及/或下部工具輸入。作為一般原理,不定地隔開之加熱板或紅外線輻射器亦可用作熱源。用於加熱構件之另外可能性為藉由感應將熱能輸入至構件中或輸入至合適的載體板中。為此,一或多個感應裝置可佈置於待連接之構件上方及/或下方的處理腔室中。此產生對應感應區,這些感應區經設計使得由感應裝置產生之電磁能輸入至構件中,且在此處產生加熱構件之渦電流。為了冷卻感應裝置,可將這些感應裝置直接連接至流體流經之冷卻劑電路,其中亦可能藉由與處理腔室之壁的熱接觸來進行冷卻。藉由對流進行之冷卻亦為可能的。In conventional welding or sintering apparatus, heat energy can be input via upper and/or lower tools. As a general principle, indefinitely spaced heating plates or infrared radiators can also be used as heat sources. Another possibility for heating components is to input heat energy into the component or into a suitable carrier plate via induction. For this purpose, one or more induction devices can be arranged in processing chambers above and/or below the components to be connected. This creates corresponding induction zones designed so that electromagnetic energy generated by the induction devices is input into the component, and eddy currents are generated in the heated component at these locations. To cool the sensing devices, these devices can be directly connected to the coolant circuit through which the fluid flows, where cooling may also be achieved through thermal contact with the walls of the processing chamber. Cooling via convection is also possible.
作為一般原理,在構件之品質不同的狀況下,可更改感應裝置與構件或與載體板之距離,以最佳化熱輸入或能量輸入。為此,可聯合地或單獨地提昇或降低現有感應裝置。此外,存在可能性使感應裝置之形狀適應構件或載體板之形狀以用於最佳化能量輸入。As a general principle, given differences in component quality, the distance between the sensing device and the component or carrier plate can be varied to optimize heat or energy input. To this end, existing sensing devices can be upgraded or downsized, either jointly or individually. Furthermore, it is possible to adapt the shape of the sensing device to the shape of the component or carrier plate for optimal energy input.
相比於藉助於熱輻射或熱接觸進行之構件加熱,藉由感應進行之能量輸入可極易於控制。利用感應裝置,可在幾分之一秒內在零功率與最大功率之間均勻地控制熱輸入。Compared to component heating via thermal radiation or thermal contact, energy input via sensing is much easier to control. Using sensing devices, heat input can be uniformly controlled between zero power and maximum power in fractions of a second.
為了充分使用其中熱能之輸入可以高度動態方式調適的熱源,尤其可能使用前述感應裝置,以便在時間及空間兩者方面進行精確且有差別的溫度控制,有必要提供對熱源的經調適控制,其中亦將考慮構件內部之熱傳輸期間的延遲。對構件溫度之精確量測在此處極為重要。In order to fully utilize the heat source, whose thermal input can be adjusted in a highly dynamic manner, especially by using the aforementioned sensing devices to achieve precise and differentiated temperature control in both time and space, it is necessary to provide adaptive control of the heat source, taking into account the delays in heat transfer within the component. Accurate measurement of the component temperature is extremely important here.
習知地,構件溫度係由與構件熱接觸之一或多個溫度感測器量測,亦即,溫度感測器抵靠待量測或整合於其中之構件。若將熱能輸入至構件中所處之地點與量測溫度之地點相隔一定距離,則由於構件之熱導率有限,能量輸入與溫度量測之間可接著發生時滯,此可能會引起對構件溫度的控制不精確,且由於「過衝」而引起構件之熱過載。As is known, component temperature is measured by one or more temperature sensors that are in thermal contact with the component; that is, the temperature sensors are in contact with the component being measured or integrated therein. If the location where heat energy is input into the component is a certain distance from the location where the temperature is measured, a time lag may occur between the energy input and the temperature measurement due to the limited thermal conductivity of the component. This may lead to inaccurate control of the component temperature and cause thermal overload of the component due to "overshoot".
為了減少此類型之不精確性,可選擇溫度量測之地點,使得其儘可能接近能量輸入之地點。對熱源之控制接著可快速對溫度改變作出反應,然而,構件之實際溫度無法非常精確地量測,此係因為其不直接經受熱能,而是經由熱耦合間接地經受熱能且因此具有時滯。To reduce the inaccuracy of this type, the temperature measurement location can be chosen to be as close as possible to the energy input location. Control of the heat source can then respond quickly to temperature changes; however, the actual temperature of the component cannot be measured very accurately because it does not experience heat energy directly, but rather indirectly through thermal coupling, and therefore has a time lag.
DE 10 2004 047 359 B3提議將非接觸式光學量測系統(例如高溫計)用於溫度量測。然而,此類型之光學量測系統具有缺點即經量測溫度並非絕對的,而是取決於構件之材料屬性及表面屬性。DE 10 2004 047 359 B3 proposes the use of non-contact optical measurement systems (such as thermometers) for temperature measurement. However, this type of optical measurement system has the disadvantage that the measured temperature is not absolute, but depends on the material properties and surface properties of the components.
DE 11 2008 000 853 T1描述熱處理腔室中的溫度量測,該熱處理腔室具有加熱元件、構件、接觸式溫度感測器及非接觸式溫度感測器。非接觸式溫度感測器佈置於熱處理腔室外部,且用於偵測接觸式溫度感測器及非接觸式溫度感測器之溫度的溫度方位幾乎相同,使得非接觸式溫度感測器之量測值差可由接觸式溫度感測器之量測值消除。尺寸穩定性及感測器質量極低,其具有缺點即產生量測間隙,由此分子數目之變化會快速影響溫度變化。DE 11 2008 000 853 T1 describes temperature measurement in a heat treatment chamber having heating elements, components, contact temperature sensors, and non-contact temperature sensors. The non-contact temperature sensors are located outside the heat treatment chamber, and the temperature orientations used to detect the temperatures of the contact and non-contact temperature sensors are nearly identical, such that the measurement difference of the non-contact temperature sensor can be eliminated by the measurement value of the contact temperature sensor. However, the dimensional stability and sensor mass are extremely low, resulting in measurement gaps where changes in the number of molecules can rapidly affect temperature changes.
本發明之目標為指示一種用於構件之溫度調節之方法,其用於在構件之間製造焊接或燒結結點,該方法准許構件溫度之精確設定及溫度感測器之靈活佈置。The objective of this invention is to provide a method for temperature regulation of components for creating welded or sintered joints between components, which allows for precise setting of component temperature and flexible placement of temperature sensors.
本發明亦旨在補償由非接觸式感測器引起的壓力/氣體波動之干擾效應。This invention also aims to compensate for the interference effects of pressure/gas fluctuations caused by non-contact sensors.
該目標係藉由一種具有技術方案1之特徵的方法來達成。該方法之有利發展指示於附屬請求項中。The objective is achieved by a method having the features of technical solution 1. Advantageous developments of the method are indicated in the appendix.
提議一種用於構件之溫度調節之方法,其用於在構件之間製造焊接或燒結結點,其中提供至少一個可控制熱源以供應待轉移至構件之熱能。藉助於至少一個第一溫度感測器在第一熱位置處量測構件或焊接或燒結裝置之與構件熱接觸之構件部分的第一溫度,該至少一個第一溫度感測器與該構件或與該構件部分熱接觸,且藉助於至少一個第二溫度感測器在第二熱位置處非接觸式地量測構件或焊接或燒結裝置之與構件熱接觸之構件部分的第二溫度。第一熱位置與第二熱位置具有空間距離,使得在溫度變化期間,第一溫度與第二溫度之間的溫度梯度係可預期的。經量測第二溫度係基於經量測第一溫度而校準,以便判定經校準第二溫度,其中熱源係至少基於該經校準第二溫度而控制。對第一溫度及第二溫度之量測較佳地在不同地點處執行。焊接或燒結裝置之與構件熱接觸且在下文中簡稱為裝置構件的構件部分可為例如在製造製程期間承載待連接之構件的載體板、載體框架或構件載體。第一溫度亦可另外由溫度感測器判定,該溫度感測器整合於構件中且可連接至經設計用於執行該方法之控制單元,以便將構件之第一溫度傳輸至該控制單元。因此,若構件或裝置構件之第一溫度係由若干第一溫度感測器量測,則可以合適方式判定第一溫度,例如藉由對由若干第一溫度感測器量測之溫度進行求平均,或藉由其他方法。相同情況亦適用於第二溫度。A method for temperature regulation of a component is proposed for creating a welded or sintered joint between components, wherein at least one controllable heat source is provided to supply heat energy to be transferred to the component. A first temperature of the component or a portion of the component in thermal contact with the component, or the welding or sintering apparatus, is measured at a first hot location by means of at least one first temperature sensor in thermal contact with the component or the portion of the component, and a second temperature of the component or a portion of the component in thermal contact with the component, or the welding or sintering apparatus, is measured non-contactly at a second hot location by means of at least one second temperature sensor. The first and second hot locations are spatially separated such that the temperature gradient between the first and second temperatures is predictable during temperature changes. The second temperature is calibrated based on the first temperature measurement to determine the calibrated second temperature, wherein the heat source is controlled at least based on the calibrated second temperature. Measurements of the first and second temperatures are preferably performed at different locations. The component portion of the welding or sintering apparatus that is in thermal contact with the component and is referred to below simply as the apparatus component can be, for example, a carrier plate, carrier frame, or component carrier that supports the components to be connected during the manufacturing process. The first temperature can also be separately determined by a temperature sensor integrated into the component and connectable to a control unit designed to perform the method, so as to transmit the first temperature of the component to the control unit. Therefore, if the first temperature of a component or device is measured by a plurality of first temperature sensors, the first temperature can be determined in an appropriate manner, such as by averaging the temperatures measured by the plurality of first temperature sensors, or by other methods. The same applies to the second temperature.
第一溫度位置及第二溫度位置之空間間距意謂其在任何狀況下空間地分佈,亦即,佈置於構件之一側上,彼此相隔一空間距離,或佈置於構件之相對側上。舉例而言,第一溫度感測器及第二溫度感測器可以構件直徑之至少5%、尤其係10%之距離佈置於構件之同一側上。在任何狀況下,在加熱或冷卻階段中,可預期,在不同方位處進行量測之第一溫度感測器及第二溫度感測器將記錄展示溫度梯度之量測值。在熱平衡(equilibrium)下,亦即,在恆定溫度條件下停留時間較長之情況下,溫度梯度可變得較小或完全消失。然而,若來自熱源之熱輸入至少在諸如在加熱或冷卻階段期間改變,則可預期,由於第一溫度感測器與第二溫度感測器之間的空間距離不同,這些溫度感測器將記錄不同的量測值。在任何狀況下,無法假定第一溫度感測器記錄與第二溫度感測器相同的量測值,此意謂第二溫度感測器可在溫度改變時,特別係在動態溫度條件之狀況下由第一溫度感測器校準,作為溫度梯度之部分。有利地,可藉由溫度感測器之隔開佈置來達成佈置之較高靈活性,因此較佳地,在構件或構件載體之面向熱源之一側上的第二溫度感測器,作為與該構件熱接觸的構件,可偵測第二溫度以用於控制熱源,而第一溫度感測器可佈置於構件或構件載體之機械上可容易接近的點處,以便偵測第一溫度。因此,利用隔開之佈置,即使在受限空間或難以接近之溫度方位中,藉由第一溫度感測器之第一溫度對第二溫度感測器之第二溫度的精確校準亦係可能的,且已整合於構件中之溫度感測器亦可用作例如第一溫度感測器。The spatial distance between the first and second temperature sensors means their spatial distribution under any circumstances, that is, they can be placed on one side of the component, separated by a spatial distance, or placed on opposite sides of the component. For example, the first and second temperature sensors can be placed on the same side of the component with a distance of at least 5%, especially 10%, of the component's diameter. In any case, during the heating or cooling phase, it is expected that the first and second temperature sensors, which measure at different locations, will record measurements showing the temperature gradient. Under thermal equilibrium, that is, when the residence time at constant temperature conditions is longer, the temperature gradient may become smaller or disappear completely. However, if the heat input from the heat source changes at least during the heating or cooling phase, it is expected that the temperature sensors will record different measurements due to the different spatial distances between the first and second temperature sensors. Under no circumstances can it be assumed that the first temperature sensor records the same measurement as the second temperature sensor; this means that the second temperature sensor can be calibrated by the first temperature sensor as part of the temperature gradient, especially under dynamic temperature conditions. Advantageously, the spatial arrangement of temperature sensors allows for greater flexibility in placement. Therefore, preferably, a second temperature sensor on the heat-source-facing side of the component or component carrier, as a component in thermal contact with the component, can detect a second temperature for controlling the heat source. The first temperature sensor can be placed at an easily accessible point on the machinery of the component or component carrier to detect the first temperature. Thus, with this spatial arrangement, accurate calibration of the first temperature of the first temperature sensor to the second temperature of the second temperature sensor is possible even in confined spaces or inaccessible temperature locations. Furthermore, a temperature sensor already integrated into the component can also be used, for example, as the first temperature sensor.
在根據本發明之方法中,第一溫度及第二溫度因此以合適方式組合,以便在構件處達成最佳溫度控制。較佳地,量測第一溫度及第二溫度,其方式為使得溫度在已界定時段內未實質上改變,從而使得可大大地減少在構件內部或在構件與與其接觸的裝置構件之間的熱均衡期間的時滯之影響。第一溫度及第二溫度可在同一構件處或在同一裝置構件處量測,或在不同構件或裝置構件處量測,且在任何狀況下在兩個空間上遠離的熱位置(亦即,熱方位)處量測。In the method according to the invention, the first temperature and the second temperature are thus combined in a suitable manner to achieve optimal temperature control at the component. Preferably, the first temperature and the second temperature are measured in such a way that the temperature does not substantially change within a defined time period, thereby greatly reducing the effects of time lag during thermal equilibrium within the component or between the component and the device component it contacts. The first temperature and the second temperature may be measured at the same component or at the same device component, or at different components or device components, and in any case at two spatially distant thermal locations (i.e., thermal orientations).
在此上下文中,校準意謂在指定條件下,用以判定由第二溫度感測器輸出的溫度變數(具有相關聯量測不確定度的溫度變數)之量測值與第一感測器(作為具有相關聯量測不確定度的參考溫度感測器)之量測值之間的關係之活動總和。此相關性可用以考慮第一溫度方位與第二溫度方位之間的空間距離之影響以及由量測技術引起之其他差異。In this context, calibration means, under specified conditions, the sum of activities used to determine the relationship between the measured value of the temperature variable (a temperature variable with correlated measurement uncertainty) output by the second temperature sensor and the measured value of the first sensor (as a reference temperature sensor with correlated measurement uncertainty). This correlation can be used to take into account the influence of the spatial distance between the first and second temperature orientations, as well as other differences caused by measurement techniques.
判定經校準第二溫度尤其解決以下事實:利用非接觸式操作溫度感測器,經量測第二溫度按一般規則會與此量測點處之實際溫度相異,此係歸於事實即非接觸式地量測溫度可能由於正在量測溫度的構件或裝置構件之材料屬性及/或表面屬性而發生變化。The determination of the calibrated second temperature specifically addresses the following fact: when using a non-contact operating temperature sensor, the measured second temperature will, under normal circumstances, differ from the actual temperature at the measurement point. This is due to the fact that non-contact temperature measurement may vary due to the material properties and/or surface properties of the component or device being measured.
根據一較佳具體實例,該方法在可設定的處理大氣中執行,其中設定處理大氣至少包含設定處理大氣之材料組成、壓力及/或溫度。舉例而言,取決於製程之各別階段,處理大氣可含有反應性或非反應性處理氣體。若處理大氣之溫度改變,則此溫度改變亦可併入至對熱源之控制中。According to a preferred embodiment, the method is performed in a settable treatment atmosphere, wherein setting the treatment atmosphere includes at least setting the material composition, pressure, and/or temperature of the treatment atmosphere. For example, depending on the specific stage of the process, the treatment atmosphere may contain reactive or non-reactive treatment gases. If the temperature of the treatment atmosphere changes, this temperature change can also be incorporated into the control of the heat source.
根據另外較佳具體實例,第一溫度感測器係選自包含至少以下各者之群組:NTC電阻器、PTC電阻器、半導體溫度感測器、熱電偶及基於諧振電路之溫度感測器。替代地或另外,第二溫度感測器為經配置用於偵測熱輻射之感測器,且較佳地選自包含至少以下各者之群組:高溫計、輻射熱計及熱電堆。作為實例,針對第一溫度感測器所提及的感測器類型表示基於接觸的溫度感測器之典型實例。因此,作為實例,針對第二溫度感測器所提及的感測器類型為典型的非接觸式操作溫度感測器。According to another preferred embodiment, the first temperature sensor is selected from the group comprising at least the following: NTC resistors, PTC resistors, semiconductor temperature sensors, thermocouples, and temperature sensors based on resonant circuits. Alternatively or additionally, the second temperature sensor is a sensor configured to detect thermal radiation, and is preferably selected from the group comprising at least the following: pyrometers, calorimeters, and thermopile. As an example, the sensor type mentioned for the first temperature sensor represents a typical example of a contact-based temperature sensor. Therefore, as an example, the sensor type mentioned for the second temperature sensor is a typical non-contact operating temperature sensor.
根據另外較佳具體實例,至少一個熱源經配置以向構件或向所提及構件部分中之一或多者進行基於接觸之熱轉移或非接觸式熱轉移。熱源較佳地選自包含以下各者之群組:電場、磁場或電磁場產生器,較佳地為加熱板、感應加熱元件或紅外線輻射器,其可至少以熱方式、以電感方式或以電容方式耦合至構件或耦合至所提及構件部分。可能的熱源之清單並非結論性的。然而,變得顯而易見的係,可以電感方式耦合至構件或耦合至所提及構件部分的磁場產生器(其亦可稱作感應裝置或電感器)係尤其合適的。利用此類型之感應裝置,可以多種方式來控制熱輸出,例如藉由對操作電壓、對操作電流或對頻率之改變。According to another preferred embodiment, at least one heat source is configured to perform contact-based or non-contact heat transfer to the component or to one or more of the mentioned component portions. The heat source is preferably selected from a group including electric, magnetic, or electromagnetic field generators, more preferably heating plates, inductive heating elements, or infrared radiators, which can be coupled to the component or to the mentioned component portions at least thermally, inductively, or capacitively. The list of possible heat sources is not conclusive. However, it becomes apparent that magnetic field generators (which may also be referred to as inductive devices or inductors) that can be inductively coupled to the component or to the mentioned component portions are particularly suitable. This type of sensing device can be used to control heat output in various ways, such as by changing the operating voltage, operating current, or frequency.
根據另外較佳具體實例,在包含製造焊接或燒結結點之製程步驟中控制熱源,且在製程步驟之前的至少一個校準步驟中判定經校準溫度,其中校準步驟包含產生及儲存各別校準函數,基於該各別校準函數可自經量測第二溫度判定經校準第二溫度。舉例而言,校準步驟可如此執行:在兩種不同的構件溫度或構件部分溫度之狀況下,在各狀況下量測第一溫度及第二溫度,以便接著自量測值判定校準函數。亦有可能執行若干校準步驟,在這些校準步驟中之各者中判定若干校準函數。舉例而言,此可如此達成:針對各構件或針對各構件部分專門產生及儲存校準函數。According to another preferred embodiment, the heat source is controlled in a process step involving the fabrication of welded or sintered joints, and a calibrated temperature is determined in at least one calibration step prior to the process step. This calibration step includes generating and storing individual calibration functions, based on which a calibrated second temperature is determined from a measured second temperature. For example, the calibration step may be performed by measuring a first temperature and a second temperature under two different component temperatures or component portion temperatures, so that a calibration function is then determined from the measured values. It is also possible to perform several calibration steps, in which several calibration functions are determined. For example, this can be achieved by generating and storing calibration functions specifically for each component or for a portion of a component.
根據一較佳具體實例,在製程步驟之各次執行之前執行校準步驟,其中對熱源之控制係在製程步驟中基於先前判定之校準函數而執行。為了選擇合適的校準函數,此處不必知道量測第二溫度的構件或裝置構件之屬性。在執行製程步驟之前先執行校準步驟確保了溫度控制不會由於選擇校準函數的錯誤而導致構件損壞。According to a preferred embodiment, a calibration step is performed before each execution of a process step, where heat source control is performed in the process step based on a previously determined calibration function. To select a suitable calibration function, it is not necessary to know the properties of the component or device measuring the second temperature. Performing a calibration step before executing the process step ensures that temperature control will not damage components due to incorrect selection of the calibration function.
替代地或另外,校準步驟可在製程步驟期間另外執行一或多次,較佳地在已界定時間點或在構件或裝置構件之溫度不實質上改變的時間點執行。前述在構件或裝置構件之溫度不實質上改變的時間點執行校準步驟涉及在構件或裝置構件之溫度曲線在各狀況下在不同溫度之情況下具有平穩段時執行校準。此用以等待已界定的均衡時間,以便消除因溫度量測原理不同及因量測點之空間位置而產生的潛時。Alternatively or additionally, the calibration step may be performed one or more times during the process steps, preferably at a defined time point or at a time point where the temperature of the component or device component does not substantially change. The aforementioned calibration step at a time point where the temperature of the component or device component does not substantially change involves performing calibration when the temperature profile of the component or device component has a stable period at different temperatures under various conditions. This is to allow a defined equilibrium time to be reached in order to eliminate latency caused by differences in temperature measurement principles and the spatial location of the measurement points.
與此相關,已證明有利的係,在執行製程步驟之前,與待處理構件匹配的校準函數係選自以構件特定或構件部分特定方式儲存之複數個校準函數,其中基於所選擇校準函數而執行在製程步驟中對熱源之控制。作為一般原理,最初亦可選擇一個校準函數,接著可在執行製程步驟期間對其進行檢查及/或調適。Relatedly, it has proven advantageous that, prior to the execution of a process step, the calibration function matched to the component to be processed is selected from a plurality of calibration functions stored in a component-specific or component-part-specific manner, wherein heat source control in the process step is performed based on the selected calibration function. As a general principle, a calibration function may also be selected initially, and then checked and/or adjusted during the execution of the process step.
根據另外有利具體實例,校準函數為線性函數或多項式函數,較佳地為四次函數。使用線性函數已證明為易於計算,其中可容許此處可能出現之任何不準確度。多項式函數,尤其係四次多項式函數,特別適合於校準高溫計之量測特性。According to another advantageous specific example, the calibration function is a linear function or a polynomial function, preferably a quartic function. The use of a linear function has proven to be easy to calculate, which allows for any inaccuracies that may occur here. Polynomial functions, especially quartic polynomial functions, are particularly suitable for calibrating the measurement characteristics of thermometers.
根據另外有利具體實例,以雙階段方法達成對熱源之控制,其中基於經量測第一溫度及預設設定點溫度在第一階段中判定經修改設定點溫度,且其中基於經量測或經校準第二溫度及經修改設定點溫度在第二階段中控制來自熱源之輸出。此類雙階段控制亦稱作串級控制。預設設定點溫度未必必須為固定設定點溫度,實情為設定點溫度之曲線或斜坡可用作基礎。特定而言,表述「基於經量測第一溫度、預設設定點溫度、經量測或經校準第二溫度及經修改設定點溫度」不僅限於這些變數之絕對值,而是明確包括這些變數隨時間推移之各別曲線,亦即,尤其係這些變數相對於時間之數學推導。此外,基於經量測第一溫度及預設設定溫度而判定經修改設定點溫度並不排除可在必要時併入至對經修改設定點溫度之判定中的另外參數或量測值。因此,控制熱源之輸出無法僅僅基於經量測或經校準第二溫度及經修改設定點溫度。實情為,亦可在此處併入另外參數或量測值。特定而言,在雙階段方法之每個階段中,亦可將回饋提供至各別控制迴路中。According to another advantageous specific example, a two-stage method is used to control a heat source. In the first stage, a modified setpoint temperature is determined based on a measured first temperature and a preset setpoint temperature. In the second stage, the output from the heat source is controlled based on a measured or calibrated second temperature and the modified setpoint temperature. This type of two-stage control is also called cascade control. The preset setpoint temperature does not necessarily have to be a fixed setpoint temperature; in practice, a curve or slope of the setpoint temperature can be used as a basis. Specifically, the statement "based on the measured first temperature, the preset setpoint temperature, the measured or calibrated second temperature, and the modified setpoint temperature" is not limited to the absolute values of these variables, but explicitly includes the individual curves of these variables over time, that is, especially the mathematical derivation of these variables relative to time. Furthermore, determining the modified setpoint temperature based on the measured first temperature and the preset setpoint temperature does not preclude the inclusion of other parameters or measured values in the determination of the modified setpoint temperature when necessary. Therefore, controlling the output of the heat source cannot be based solely on the measured or calibrated second temperature and the modified setpoint temperature. In fact, other parameters or measured values can also be included here. Specifically, in each stage of the two-stage approach, feedback can also be provided to the individual control loops.
根據該方法之另外較佳具體實例,待連接之構件佈置於主範圍平面中,其中第一溫度感測器佈置於主範圍平面之一側上,且熱源及第二溫度感測器佈置於主範圍平面之另一側上。儘管第二溫度感測器及熱源在此處佈置於構件佈置之同一側上,且因此可在極短時滯內記錄構件溫度之改變,但由第一溫度感測器判定之第一溫度由於其空間佈置而經受一定潛時,其係基於構件或裝置構件內部之熱傳導。According to another preferred embodiment of the method, the components to be connected are arranged in a main plane, wherein a first temperature sensor is arranged on one side of the main plane, and a heat source and a second temperature sensor are arranged on the other side of the main plane. Although the second temperature sensor and the heat source are arranged on the same side of the component arrangement, and therefore the temperature change of the component can be recorded in a very short time lag, the first temperature determined by the first temperature sensor is subject to a certain latency due to its spatial arrangement, and it is based on the heat conduction inside the component or device component.
替代地,第一溫度感測器及第二溫度感測器可佈置於主範圍平面之一側上,且熱源佈置於主範圍平面之另一側上。另外,第一溫度感測器及第二溫度感測器以及熱源可佈置於主範圍平面之同一側上。Alternatively, the first and second temperature sensors may be arranged on one side of the main plane, and the heat source may be arranged on the other side of the main plane. Alternatively, the first and second temperature sensors and the heat source may be arranged on the same side of the main plane.
在另外態樣中,本發明係關於用於在構件之間製造焊接或燒結結點之焊接或燒結裝置,其包含:至少一個可控制熱源,其經配置以供應待轉移至構件之熱能;在第一熱位置處之至少一個第一溫度感測器,其可與構件或與焊接或燒結裝置之可與構件熱接觸之構件部分熱接觸,且經配置以量測該構件或該構件部分的第一溫度;在第二熱位置處之第二溫度感測器,其經配置以非接觸式地量測構件或焊接或燒結裝置之可與構件熱接觸之構件部分的第二溫度;及控制單元,其連接至熱源並連接至第一溫度感測器及第二溫度感測器且經配置以執行如前述技術方案中任一項之方法。因此,第一熱位置與第二熱位置具有一空間距離,使得在溫度變化期間,第一溫度與第二溫度之間的溫度梯度係可預期的。如上文已提及,第一溫度感測器或另外第一溫度感測器可為整合於構件中且可連接至控制單元之溫度感測器,以便將該構件之第一溫度傳輸至控制單元。In another embodiment, the present invention relates to a welding or sintering apparatus for manufacturing welded or sintered joints between components, comprising: at least one controllable heat source configured to supply heat energy to be transferred to the components; at least one first temperature sensor at a first hot position, which is in thermal contact with the component or a component portion of the welding or sintering apparatus that is in thermal contact with the component, and configured to measure a first temperature of the component or the component portion; a second temperature sensor at a second hot position, configured to non-contactly measure a second temperature of the component or the component portion of the welding or sintering apparatus that is in thermal contact with the component; and a control unit connected to the heat source and to the first and second temperature sensors and configured to perform the method as described in any of the foregoing technical solutions. Therefore, the first and second heating locations are spatially separated, making the temperature gradient between the first and second temperatures predictable during temperature changes. As mentioned above, the first temperature sensor or another first temperature sensor can be a temperature sensor integrated into the component and connected to the control unit to transmit the first temperature of the component to the control unit.
根據一較佳具體實例,熱源具有量測窗,該量測窗允許由構件或由焊接或燒結裝置之所提及構件部分發射的紅外線輻射在第二溫度感測器之方向上傳遞。According to a preferred embodiment, the heat source has a measurement window that allows infrared radiation emitted by the component or the aforementioned component portion of the welding or sintering apparatus to be transmitted in the direction of the second temperature sensor.
根據另外較佳具體實例,至少面向第二溫度感測器之方向的管佈置於量測窗中且經配置以將由構件或由焊接或燒結裝置之所提及構件部分發射的紅外線輻射在第二溫度感測器之方向上導引,且較佳地屏蔽第二溫度感測器免受並非由構件或由所提及構件部分發射的紅外線輻射之影響。According to another preferred embodiment, at least a tube facing the direction of the second temperature sensor is arranged in the measurement window and configured to guide infrared radiation emitted by the component or by the aforementioned component portion of the welding or sintering apparatus in the direction of the second temperature sensor, and preferably shield the second temperature sensor from infrared radiation not emitted by the component or the aforementioned component portion.
根據焊接或燒結裝置之另外較佳具體實例,構件、至少一個熱源、至少第一溫度感測器及至少第二溫度感測器佈置於不透氣處理腔室中或上,該不透氣處理腔室具有可調整處理大氣尤其係真空,較佳地第二溫度感測器佈置於熱源之背對構件之一側上。換言之,焊接或燒結裝置可包含至少一個不透氣處理腔室,其中可設定處理大氣,例如,低氧或無氧大氣,尤其係真空,使得構件可經熱處理,尤其係焊接或燒結,而無需氧化。第一溫度感測器及第二溫度感測器兩者均佈置於處理腔室中或上,使得來自溫度感測器之量測值訊號作為第一溫度及第二溫度傳輸至處理腔室外部。第二溫度感測器可佈置於處理腔室內部或外部;在後一狀況下,第二溫度感測器可透過處理腔室壁之光學窗觀測第二溫度方位。較佳地位於處理腔室外部之控制單元基於第一溫度而校準第二溫度,且基於經校準第二溫度而控制熱源。以此方式,可達成精確的熱源控制,亦可使用該熱源控制,例如以在第一溫度方位與第二溫度方位之間維持可定義的溫度梯度。According to another preferred embodiment of the welding or sintering apparatus, a component, at least one heat source, at least a first temperature sensor, and at least a second temperature sensor are disposed in or on an airtight processing chamber having an adjustable processing atmosphere, particularly a vacuum. Preferably, the second temperature sensor is disposed on the side of the heat source opposite to the component. In other words, the welding or sintering apparatus may include at least one airtight processing chamber in which a processing atmosphere, such as a low-oxygen or oxygen-free atmosphere, particularly a vacuum, can be provided, allowing the component to be heat-treated, particularly welded or sintered, without oxidation. Both the first and second temperature sensors are disposed in or on the processing chamber such that measurement signals from the temperature sensors are transmitted to the outside of the processing chamber as the first and second temperatures. The second temperature sensor can be placed inside or outside the processing chamber; in the latter case, the second temperature sensor can observe the second temperature orientation through an optical window in the processing chamber wall. A control unit preferably located outside the processing chamber calibrates the second temperature based on the first temperature and controls the heat source based on the calibrated second temperature. In this way, precise heat source control can be achieved, and this heat source control can also be used, for example, to maintain a definable temperature gradient between the first and second temperature orientations.
圖1以示意性且簡化之截面圖展示根據一個實例之焊接裝置10。焊接裝置10包含底部開放之類碟型輸送框架14,構件載體12置放於該輸送框架之在底側上的開口中,其表示焊接裝置10之構件部分。待連接之構件16、18置放於構件載體12上。構件18可為例如各自藉由焊接操作連接至若干構件16(例如功率半導體)之基板。聯接材料(未展示)可分別設置於構件16與構件18之間。在其中佈置有構件載體12之輸送框架14下方,佈置有經配置以產生強磁場之感應裝置20,該強磁場可至少在構件載體12中誘發渦電流。此等渦電流影響構件載體12之加熱。不言而喻,亦可提供其他熱源而非感應裝置20。在一側上之構件載體12或輸送框架14與感應裝置20之間的距離係可變的。Figure 1 shows a schematic and simplified cross-sectional view of a welding apparatus 10 according to an example. The welding apparatus 10 includes a dish-like transport frame 14 with an open bottom. A component carrier 12 is placed in an opening on the bottom side of the transport frame, representing a component portion of the welding apparatus 10. Components 16 and 18 to be connected are placed on the component carrier 12. Components 18 may be, for example, substrates that are each connected to several components 16 (e.g., power semiconductors) by welding operations. Connecting materials (not shown) may be disposed between components 16 and 18 respectively. Below the transport frame 14 in which the component carrier 12 is disposed, a sensing device 20 configured to generate a strong magnetic field that can induce eddy currents at least in the component carrier 12 is disposed. These eddy currents affect the heating of the component carrier 12. Needless to say, other heat sources other than the sensing device 20 can also be provided. The distance between the component carrier 12 or the conveyor frame 14 on one side and the sensing device 20 is variable.
焊接裝置10進一步具有在第一溫度方位處之第一溫度感測器24,在此狀況下係在作為構件18之基板之上側上,該第一溫度感測器穿過輸送框架14並與構件18中之一者彈簧負載式接觸且經配置以量測第一溫度。The welding apparatus 10 further includes a first temperature sensor 24 at a first temperature position, which is located on the upper side of the substrate that serves as component 18. The first temperature sensor passes through the conveyor frame 14 and is in spring-loaded contact with one of the components 18 and is configured to measure the first temperature.
感應裝置20具有量測窗22,該量測窗允許由構件載體12之底側(作為第二熱位置)發射的紅外線輻射在佈置於量測窗22下方之第二溫度感測器26的方向上傳遞,從而允許藉助於第二溫度感測器26量測第二溫度。在此具體實例實例中,第一溫度方位及第二溫度方位佈置於構件載體12之相對側上。The sensing device 20 has a measurement window 22 that allows infrared radiation emitted from the bottom side of the component carrier 12 (as a second hot position) to be transmitted in the direction of a second temperature sensor 26 disposed below the measurement window 22, thereby allowing the measurement of a second temperature by means of the second temperature sensor 26. In this specific embodiment, the first temperature orientation and the second temperature orientation are disposed on opposite sides of the component carrier 12.
較佳地,第一溫度方位可為構件18之表面。較佳地,第二溫度方位可為構件18或構件載體12之下側上的熱源20之直接或間接熱輸入(例如,IR輻射熱)的表面。Preferably, the first temperature orientation may be the surface of component 18. Preferably, the second temperature orientation may be the surface of component 18 or the surface of heat source 20 on the underside of component 18 or component carrier 12, where direct or indirect heat input (e.g., IR radiant heat) occurs.
第一溫度感測器24經設計為接觸式溫度感測器且可為NTC電阻器、PTC電阻器、半導體溫度感測器、熱電偶、基於諧振電路之溫度感測器或其類似者。第二溫度感測器26為非接觸式量測溫度感測器,例如高溫計、電射計或熱電堆,其藉由偵測由所量測物件發射的紅外線輻射來量測溫度。The first temperature sensor 24 is designed as a contact temperature sensor and may be an NTC resistor, a PTC resistor, a semiconductor temperature sensor, a thermocouple, a temperature sensor based on a resonant circuit, or the like. The second temperature sensor 26 is a non-contact temperature sensor, such as a pyrometer, radiometer, or thermopile, which measures temperature by detecting infrared radiation emitted by the object being measured.
根據修改(未展示),管可佈置於量測窗22之某區域中,該區域亦環繞第二溫度感測器26,且一方面集中或導引由構件載體12發射且待偵測之紅外線輻射,而同時保持可能會篡改溫度量測之外部輻射遠離第二溫度感測器26。According to the modification (not shown), the tube can be placed in a certain area of the measurement window 22, which also surrounds the second temperature sensor 26, and on the one hand, concentrates or guides the infrared radiation emitted by the component carrier 12 and to be detected, while keeping external radiation that may tamper with the temperature measurement away from the second temperature sensor 26.
圖2展示根據另外實例之焊接裝置110,其經設計類似於來自圖1之焊接裝置10。焊接裝置110包含若干構件載體12,在本實例中為三個,其中單獨可控制之感應裝置20係與各構件載體12相關聯。感應裝置20與構件載體12之距離係可單獨調整的。所有三個構件載體12佈置於共同輸送框架14上。相關聯溫度感測器24、26經佈置為類似於來自圖1之實例。Figure 2 illustrates a welding apparatus 110 according to another embodiment, which is designed similarly to the welding apparatus 10 from Figure 1. The welding apparatus 110 includes several component carriers 12, three in this embodiment, each with an individually controllable sensing device 20 associated with a component carrier 12. The distance between the sensing device 20 and the component carrier 12 is individually adjustable. All three component carriers 12 are arranged on a common conveyor frame 14. Associated temperature sensors 24 and 26 are arranged similarly to the example from Figure 1.
焊接裝置110之構件位於處理腔室28中,該處理腔室提供用於焊接製程之較佳可設定的處理大氣。處理腔室28可經溫度調節、抽真空及/或經受壓力或亦充滿不同處理氣體。此處理大氣之壓力及/或溫度可設定成預設值,且尤其亦更改。第一溫度感測器24及第二溫度感測器26佈置於處理腔室28中或上。特定而言,第二溫度感測器28佈置於處理腔室外部且透過處理腔室壁之光學通窗觀測第二溫度點。The components of the welding apparatus 110 are located in a processing chamber 28, which provides a preferably settable processing atmosphere for the welding process. The processing chamber 28 can be temperature-regulated, evacuated, and/or pressurized, or filled with different processing gases. The pressure and/or temperature of this processing atmosphere can be set to preset values and, in particular, can be changed. A first temperature sensor 24 and a second temperature sensor 26 are disposed in or above the processing chamber 28. Specifically, the second temperature sensor 28 is disposed outside the processing chamber and measures a second temperature point through an optical window in the processing chamber wall.
圖3展示根據另外實例之焊接裝置210,其原則上表示來自圖2之焊接裝置110在橫軸上的反轉。不同於在圖1及圖2中之實例,第一溫度感測器24不與構件18熱接觸,而是與作為第一熱位置的構件載體12之底側熱接觸。第二溫度感測器26進而並不量測構件載體12之溫度,而是可直接記錄佈置於構件載體12上方之構件16及/或18在第二熱位置上的溫度。Figure 3 illustrates a welding apparatus 210 according to another embodiment, which in principle represents the reverse of the welding apparatus 110 of Figure 2 on the horizontal axis. Unlike the embodiments in Figures 1 and 2, the first temperature sensor 24 does not have thermal contact with component 18, but rather with the bottom side of component carrier 12, which serves as the first hot position. The second temperature sensor 26, instead of measuring the temperature of component carrier 12, can directly record the temperature of components 16 and/or 18 disposed above component carrier 12 at the second hot position.
所有三個實例展示經配置用於執行根據本發明之方法的裝置,作為焊接裝置10、110、210。不言而喻,此處所描述之溫度感測器24、26的佈置亦可作為實例提供,可替代地用於對應經設計之燒結裝置。利用此類型之燒結裝置,按一般規則提供額外工具,這些額外工具可將按壓力施加至待連接之構件上,以便製造燒結裝置。此等工具可在必要時具有合適的量測開口,透過這些量測開口提供用於在構件或燒結裝置之構件部分處進行溫度量測所需的非接觸式溫度量測或基於接觸之溫度量測的入口。All three examples demonstrate apparatuses configured to perform the method according to the invention, as welding apparatuses 10, 110, and 210. It goes without saying that the arrangement of temperature sensors 24 and 26 described herein can also be provided as examples, alternatively for corresponding sintering apparatuses. Using this type of sintering apparatus, additional tools are provided as is customary to apply pressure to the components to be joined in order to manufacture the sintering apparatus. These tools may have suitable measuring openings, through which access is provided for non-contact or contact-based temperature measurement required for temperature measurement at the components or component portions of the sintering apparatus.
亦不言而喻,焊接裝置10、110、210亦可具有對構件16、18施加按壓力可能需要的所需工具。出於清晰之原因,其在本發明實例中未展示。It goes without saying that welding devices 10, 110, and 210 may also have the necessary tools that might be required to apply pressure to components 16 and 18. For clarity, these are not shown in this embodiment of the invention.
現在下文以簡化方式描述一種根據本發明之用於對構件進行溫度調節的方法,以便在構件16、18之間製造焊接或燒結結點。此方法可藉助於根據圖1至圖3之焊接裝置10、110、210執行,例如在控制單元(未展示)中執行,該控制單元可連接至溫度感測器24、26並連接至作為熱源之感應裝置20。憑藉此類型之控制單元,尤其有可能控制由熱源20產生之熱輸出,以便將構件16、18加熱至所需溫度,且亦藉由減少或切斷熱輸出再次使其冷卻。A method for temperature regulation of components according to the present invention is now described in a simplified manner to create a welded or sintered joint between components 16 and 18. This method can be performed using welding devices 10, 110, and 210 according to Figures 1 to 3, for example, in a control unit (not shown) connected to temperature sensors 24 and 26 and to sensing device 20, which serves as a heat source. With this type of control unit, it is particularly possible to control the heat output generated by heat source 20 to heat components 16 and 18 to the desired temperature and to cool them again by reducing or cutting off the heat output.
雖然第一溫度感測器24可由於其基於接觸之操作模式而極精確地判定第一熱位置上之構件溫度或構件部分溫度,但由第二無接觸式操作溫度感測器26判定的第二熱位置上之構件溫度或構件部分溫度經受系統性量測誤差的影響。此類型之非接觸式操作溫度感測器之一個實例係高溫計。此判定由經量測主體發射之輻射功率P,該經量測主體之溫度待被判定。出於技術原因,此處按一般規則僅考慮紅外線範圍內之已界定波長範圍。根據斯特藩-玻耳茲曼定律,以下適用於真實主體之總輻射功率P: P = ε · σ · A · T4, (1) 其中ε係發射率,σ係斯蒂芬-波次曼常數(σ = 5.6704 · 10 -8Wm -2K -4),A係面積(單位m²)且T係溫度(單位K)。發射率ε因此表示經量測物件之熱輻射容量且取決於經量測物件之材料及表面品質兩者。第二溫度較佳地利用小波長來判定。高溫計之量測波長較佳不超過5 µm,尤其較佳不超過2 µm,以便限制未經精確判定之發射率ε對量測準確度之影響。 While the first temperature sensor 24 can determine the component temperature or component portion temperature at the first hot location with high accuracy due to its contact-based operating mode, the component temperature or component portion temperature at the second hot location determined by the second non-contact operating temperature sensor 26 is subject to systematic measurement errors. An example of this type of non-contact operating temperature sensor is a thermometer. This determination is based on the radiant power P emitted by the measuring body, the temperature of which is to be determined. For technical reasons, only the defined wavelength range within the infrared range is considered here as a general rule. According to the Stefan-Boltzmann law, the following applies to the total radiant power P of a real subject: P = ε · σ · A · T4, (1) where ε is the emissivity, σ is the Stefan-Boltzmann constant (σ = 5.6704 · 10 -8 Wm -2 K -4 ), A is the area (in m²) and T is the temperature (in K). The emissivity ε thus represents the thermal radiation capacity of the measured object and depends on both the material and surface quality of the measured object. The second temperature is preferably determined using a small wavelength. The measurement wavelength of the pyrometer is preferably no more than 5 µm, and especially preferably no more than 2 µm, in order to limit the influence of the undetermined emissivity ε on the measurement accuracy.
由於經量測物件(亦即,構件或焊接或燒結裝置之構件部分)的發射率ε通常並不精確地已知,或亦經受局部變化,因此經量測第二溫度可具有系統性量測誤差。出於彼原因,基於經量測第二溫度而判定經校準第二溫度,其中經量測第一溫度用作校準變數。此處為了排除在量測第一溫度之第一熱位置的地點處之實際溫度不同於在量測第二溫度之第二熱位置的地點處之實際溫度,構件16、18或焊接裝置10、110、210之與構件熱接觸之構件部分的溫度應儘可能處於平衡,亦即,第一熱位置與第二熱位置之量測的不同地點之間不應再有任何溫度梯度。舉例而言,此可如此達成:使熱源之熱輸出在一定均衡時間內保持恆定,或將其調節至恆定溫度,且只有這樣才接著判定對應經量測溫度值。Since the emissivity ε of the measured object (i.e., the component or the component portion of the welding or sintering apparatus) is usually not precisely known or is subject to local variations, the measured second temperature may have systematic measurement errors. For this reason, a calibrated second temperature is determined based on the measured second temperature, wherein the measured first temperature is used as a calibration variable. Here, in order to exclude the difference between the actual temperature at the first hot position where the first temperature is measured and the actual temperature at the second hot position where the second temperature is measured, the temperatures of the components 16, 18 or the component portions of the welding apparatus 10, 110, 210 that are in thermal contact with the components should be as balanced as possible, that is, there should be no further temperature gradient between the different locations where the first hot position and the second hot position are measured. For example, this can be achieved by keeping the heat output of the heat source constant for a certain equilibrium time, or by adjusting it to a constant temperature, and only then can the corresponding measured temperature value be determined.
經校準第二溫度可例如基於校準函數而判定,該校準函數係作為校準步驟之部分而判定。在下文中更詳細地描述對此類校準函數之判定。The second temperature can be determined, for example, based on a calibration function that is determined as part of the calibration process. The determination of such a calibration function is described in more detail below.
根據本發明之方法的一個優點在於,在第一熱位置處使用與構件或裝置構件熱接觸的溫度感測器來實施的對第一溫度之量測(且因此速度較慢但遞送極精確的量測值)以適當的方式與在第二熱位置處由非接觸式操作溫度感測器來實施的對第二溫度之量測相結合(且因此速度較快但由於其對材料之依賴性而僅遞送不精確的量測值)。在構件處之最佳溫度控制係藉由第一溫度及第二溫度之量測值之此組合來達成。另外,第一溫度感測器及第二溫度感測器的靈活且隔開之佈置係可能的。An advantage of the method according to the present invention is that the measurement of the first temperature at the first hot location using a temperature sensor in thermal contact with the component or device component (and therefore slower but delivering highly accurate measurements) is appropriately combined with the measurement of the second temperature at the second hot location using a non-contact operating temperature sensor (and therefore faster but delivering less accurate measurements due to its material dependence). Optimal temperature control at the component is achieved through this combination of the first and second temperature measurements. Furthermore, flexible and spaced arrangement of the first and second temperature sensors is possible.
圖4展示第一溫度(T1)及第二溫度(T2)隨時間推移之例示性曲線,其中時標之絕對值為任意的。溫度T1、T2係在由銅組成且厚度為5 mm之構件的相對側上進行量測。熱源20在此處與記錄第二溫度T2之溫度感測器26佈置於同一側上,而記錄第一溫度T1之溫度感測器24佈置於構件之背對熱源20之側上(參見圖1及圖2中之佈置)。Figure 4 shows illustrative curves of the first temperature (T1) and the second temperature (T2) over time, where the absolute values of the time scales are arbitrary. Temperatures T1 and T2 are measured on opposite sides of a component made of copper with a thickness of 5 mm. The heat source 20 is located on the same side as the temperature sensor 26 that records the second temperature T2, while the temperature sensor 24 that records the first temperature T1 is located on the side of the component opposite to the heat source 20 (see the arrangement in Figures 1 and 2).
雖然第二溫度T2之最大值為t=48秒左右,但第一溫度T1在t=55秒左右時達到平穩段,亦即,第一溫度T1在此後保持大致恆定。介於第二溫度T2達到最大值與第一溫度T1達到平穩段之間的7秒之時差係基於歸因於構件之兩側之間的熱傳輸之潛伏時間。Although the second temperature T2 reaches its maximum value at approximately t=48 seconds, the first temperature T1 reaches a plateau at approximately t=55 seconds, meaning that the first temperature T1 remains roughly constant thereafter. The 7-second time difference between the second temperature T2 reaching its maximum value and the first temperature T1 reaching its plateau is based on the latency of heat transfer between the two sides of the component.
此外,在圖4中可辨別,第一溫度T1相較於第二溫度T2具有實質上更慢的曲線,因此具有減小之波動。另外,由於尚未執行校準,在兩個溫度T1、T2之間存在大約20℃至25℃之溫度差(圖4展示經量測第二溫度T2)。Furthermore, as can be seen in Figure 4, the curve for the first temperature T1 is substantially slower than that for the second temperature T2, thus exhibiting reduced fluctuations. Additionally, since calibration has not yet been performed, there is a temperature difference of approximately 20°C to 25°C between the two temperatures T1 and T2 (Figure 4 shows the measured second temperature T2).
參看圖5,現在作為實例在下文中解釋校準步驟之執行。為此,在第一時間點t1,在其溫度不斷地或間歇地提高之例示性構件處,接觸式地量測第一溫度T1.1且非接觸式地量測第二溫度T2.1。在第二時間點t2,現在量測第一溫度T1.2及第二溫度T2.2。Referring to Figure 5, the calibration procedure will now be explained below as an example. For this purpose, at a first time point t1, at an exemplary component where the temperature continuously or intermittently increases, a first temperature T1.1 is measured in contact and a second temperature T2.1 is measured non-contactly. At a second time point t2, the first temperature T1.2 and the second temperature T2.2 are now measured.
在經量測第二溫度T2與經校準第二溫度T2'之間有線性相關性的簡化假設下,該經校準第二溫度T2'可根據以下方程式判定 T2' = k*T2 + T offset, (2) 其中k係校準因子且T offset係時間點t1處之溫差。因子k可根據以下方程式自在時間點t1及t2處所量測的溫度而判定: k = 。 (3) Under the simplified assumption of a linear correlation between the measured second temperature T2 and the calibrated second temperature T2', the calibrated second temperature T2' can be determined according to the following equation: T2' = k*T2 + T offset , (2) where k is the calibration factor and T offset is the temperature difference at time point t1. The factor k can be determined according to the following equation based on the temperatures measured at time points t1 and t2: k = (3)
溫差T offset可根據以下方程式自經量測溫度值而判定: T offset= T1.1 - (T2.1*k)。 (4) The temperature difference T offset can be determined by measuring the temperature value according to the following equation: T offset = T1.1 - (T2.1*k). (4)
用於判定校準函數之溫度量測有利地在構件不具有溫度梯度時的時間點處執行,亦即,構件溫度在各狀況下保持恆定持續一合適的持續時間,例如在平穩段持續5秒,其中構件溫度當然必須在兩個時間點t1與t2之間更改。按一般原理亦有可能例如以10秒之間隔在各預設時間點再次執行校準。The temperature measurements used to determine the calibration function are advantageously performed at time points when the component does not have a temperature gradient; that is, the component temperature remains constant for an appropriate duration under all conditions, such as 5 seconds in a stable phase, during which the component temperature must, of course, change between two time points t1 and t2. It is also possible, according to general principles, to perform calibration again at preset time points, for example, at 10-second intervals.
替代地,校準步驟亦可作為樣本校準步驟之部分執行,該樣本校準步驟係針對樣本構件執行,該樣本構件的發射屬性與稍後處理之構件或與構件接觸之裝置構件的發射屬性匹配,以便保存校準函數。在實際製程步驟執行期間,亦即,實際焊接或燒結操作執行期間,可稍後依靠此校準函數,而無需在製程步驟執行期間執行新的校準。Alternatively, the calibration step can also be performed as part of a sample calibration step, which is performed on a sample component whose emission attributes are matched with the emission attributes of components processed later or device components in contact with the sample component, in order to preserve the calibration function. During the actual process steps, that is, during the actual welding or sintering operations, this calibration function can be relied upon later without the need to perform new calibrations during the process steps.
代替參看圖5所解釋之校準,亦可直接判定發射率ε。此可例如藉由首先在例如20°之環境溫度下接觸式地判定第一溫度T1.1且非接觸式地判定第二溫度T2.1來達成,此類似於參考圖5所描述。接著將用作測試物件之構件加熱至較高溫度,例如加熱至150℃與250℃之間,且再次判定第一溫度T1.2及第二溫度T2.2。Instead of the calibration explained in Figure 5, the emissivity ε can also be determined directly. This can be achieved, for example, by first determining the first temperature T1.1 in contact and the second temperature T2.1 in non-contact at an ambient temperature of, for example, 20°C, similar to the description in Figure 5. The component used as the test object is then heated to a higher temperature, for example, between 150°C and 250°C, and the first temperature T1.2 and the second temperature T2.2 are determined again.
接著可根據以下方程式計算發射率ε: ε = 。 (5) The emission rate ε can then be calculated using the following equation: ε = (5)
此處假定 小於 。否則,將必須改變這些值,使得發射率ε ≤ 1。 This place assumes Xiaoyu Otherwise, these values must be changed so that the emission rate ε ≤ 1.
參看圖6,現在描述對熱源之雙階段控制或串級控制,其中針對此熱源之控制變數係由函數u2(t)描述。兩個溫度感測器佈置於經量測物件上,其中與經量測物件接觸的第一溫度感測器產生第一溫度T1,且非接觸式量測溫度感測器產生第二溫度T2。第一溫度T1之曲線係由函數yM1(t)描述,且第二溫度T2之曲線係由函數yM2(t)描述。設定點溫度函數w1(t)充當用於控制之輸入變數。Referring to Figure 6, a two-stage or cascade control of a heat source is now described, where the control variable for this heat source is described by a function u2(t). Two temperature sensors are placed on the object being measured, where the first temperature sensor in contact with the object generates a first temperature T1, and the non-contact temperature sensor generates a second temperature T2. The curve of the first temperature T1 is described by a function yM1(t), and the curve of the second temperature T2 is described by a function yM2(t). The setpoint temperature function w1(t) serves as the input variable for control.
自訊號w1(t)及yM1(1),藉由根據以下方程式獲得差來產生差函數e1(1) (6) 且將其傳遞至主控控制器R1。主控控制器R1可例如經設計為PI(比例積分)控制器,其根據以下方程式產生控制函數u1(t) (7) 其中kp、ki係各別擴增因子。藉由與設定點溫度函數w1(t)正耦合,根據以下方程式自u1(t)判定經修改設定點溫度函數w2(t) (8) From the signals w1(t) and yM1(1), the difference function e1(1) is generated by obtaining the difference according to the following equation. (6) And it is transmitted to the main controller R1. The main controller R1 can be designed, for example, as a PI (proportional-integral) controller, which generates the control function u1(t) according to the following equation. (7) Where kp and ki are expansion factors respectively. By positive coupling with the setpoint temperature function w1(t), the modified setpoint temperature function w2(t) is determined from u1(t) according to the following equation. (8)
在第二控制階段中,經修改設定點溫度函數w2(t)與函數yM2(t)之差係根據以下方程式形成: (9) 以便針對從屬控制器R2產生輸入函數e2(t)。從屬控制器R2根據以下方程式自此產生針對熱源之控制變數或控制函數u2(t) , (10) 其中kp、ki係各別擴增因子。 In the second control stage, the difference between the modified setpoint temperature function w2(t) and the function yM2(t) is formed according to the following equation: (9) This is to generate the input function e2(t) for the slave controller R2. The slave controller R2 then generates the control variable or control function u2(t) for the heat source according to the following equation. , (10) where kp and ki are expansion factors respectively.
不言而喻,串級控制之特定具體實例在此處純粹作為實例且在必要時亦可以適合方式進行修改。It goes without saying that the specific implementation of cascading control is presented here purely as an example and can be modified in a suitable manner if necessary.
以合適方式設定來自熱源之輸出。因此,例如在使用根據圖1至圖3之感應裝置20作為熱源時,有可能藉由感應裝置20之控制單元且藉助於對頻率、電流及/或電壓之調整來進行控制。另外,亦可將感應裝置20之距離併入至控制中。The output from the heat source is set in an appropriate manner. Therefore, for example, when using the sensing device 20 according to Figures 1 to 3 as a heat source, it is possible to control it by means of the control unit of the sensing device 20 and by adjusting the frequency, current and/or voltage. In addition, the distance of the sensing device 20 can also be incorporated into the control.
當使用紅外線加熱器或歐姆加熱裝置時,可調節加熱電流。When using an infrared heater or an ohmic heating device, the heating current can be adjusted.
由於熱源或構件16、18或構件載體12之面向感應裝置20之側反應快速,面向感應裝置20之構件側的溫度曲線可根據廣譜函數(例如斜坡、S曲線、二次函數、e函數、保持相位或高次多項式)而進行控制。Because the heat source or components 16, 18 or component carrier 12 react quickly to the side facing the sensing device 20, the temperature curve on the component side facing the sensing device 20 can be controlled according to a generalized function (e.g., ramp, S-curve, quadratic function, e-function, phase-holding or higher-order polynomial).
可利用此行為以便加速對構件16、18之加熱。為此,可短暫提高面向感應裝置20之構件側的溫度,以便增加構件16、18之兩個相對側之間的溫度差。This behavior can be used to accelerate the heating of components 16 and 18. To this end, the temperature of the component side facing the sensing device 20 can be temporarily increased to increase the temperature difference between the two opposite sides of components 16 and 18.
由於尤其係面向感應裝置20之構件側的構件品質之變化,利用非接觸式量測第二溫度感測器26可無法記錄絕對精確溫度。藉助於第一溫度感測器24來量測背對感應裝置20之構件側補償了此缺點,此係因為溫度位準藉由此值不斷調整,使得所需溫度可始終設定在構件16、18處。Because of variations in component quality, particularly on the side facing the sensing device 20, the second temperature sensor 26, which measures the temperature non-contactly, cannot record absolutely accurate temperatures. This deficiency is compensated for by measuring the side of the component facing away from the sensing device 20 using the first temperature sensor 24, as the temperature level is continuously adjusted from this value, ensuring that the desired temperature can always be set at components 16 and 18.
在某些情形下,對接觸第一溫度感測器24的影響可起因於外部影響,例如流入處理腔室28中的氣體,藉此減弱控制操作。此可藉由修改結合圖6所描述之串級控制來解決。此處,由主控控制器R1產生之控制變數u1(t)可在給定時間點,例如既定氣體輸入之時間以合適的值u1 freeze「凍結」,藉此准許達成改良之溫度控制。因此,經修改設定點溫度w2(t)並不基於u1(t)及設定點溫度w1(t),而是基於u1 freeze及w1(t)產生。 In some cases, the influence on contact with the first temperature sensor 24 may be caused by external influences, such as gas flowing into the processing chamber 28, thereby weakening control operation. This can be addressed by modifying the cascade control described in conjunction with Figure 6. Here, the control variable u1(t) generated by the master controller R1 can be "frozen" at a given time point, such as the time of a given gas input, with an appropriate value u1freeze , thereby allowing for improved temperature control. Therefore, the modified setpoint temperature w2(t) is not based on u1(t) and the setpoint temperature w1(t), but rather on u1freeze and w1(t).
現在參看圖7及圖8描述函數w1(t)、yM1(t)、yM2(t)及u2(t)隨時間推移之典型曲線,其中在圖式中使用編號標識了特徵事件點。Now refer to Figures 7 and 8 to describe typical curves of functions w1(t), yM1(t), yM2(t), and u2(t) over time, where characteristic event points are identified by numbers in the graphs.
如可在圖7中辨別,在事件點1及3處會發生例如藉由使氣體流入處理腔室中而引起的第一溫度T1之下降。在串級控制沒有前述「凍結函數」的狀況下,此等溫度下降會引起串級控制過度的反作用,此自在事件點2及4處第二溫度T2之曲線的溫度峰值可明顯看出。As can be seen in Figure 7, at event points 1 and 3, a drop in the first temperature T1 occurs, for example, by allowing gas to flow into the processing chamber. In the absence of the aforementioned "freeze function" in the cascade control, such a temperature drop will cause an overreaction of the cascade control, which can be clearly seen in the temperature peaks of the curves for the second temperature T2 at event points 2 and 4.
藉由在可引起構件溫度短時間變化的事件開始之前將由主控控制器產生之控制變數u1(t)「凍結」至值u1 freeze,可達成對構件溫度之改良的溫度控制。 Improved temperature control of the component temperature can be achieved by "freezing" the control variable u1(t) generated by the main controller to the value u1freeze before an event that could cause a short-term change in component temperature begins.
參看圖8,現在解釋憑藉前述串級控制在執行根據本發明之方法期間的特徵事件及操作(同樣用編號標識)。編號為1的第二溫度T2曲線(yM2(t))之區段界定高溫計的量測範圍下限之特徵。在此時段期間,控制變數u2(t)具有恆定曲線,如由編號2指示。Referring to Figure 8, the characteristic events and operations (also identified by numbers) during the execution of the method according to the present invention by means of the aforementioned cascade control will now be explained. The segment of the second temperature T2 curve (yM2(t)) numbered 1 defines the characteristic of the lower limit of the measurement range of the thermometer. During this period, the control variable u2(t) has a constant curve, as indicated by number 2.
控制在事件點3處開始。在事件點4處,第二溫度T2存在強過衝,然而,此並不引起溫度T1曲線(yM1(t))之過衝,參見編號7。Control begins at event point 3. At event point 4, there is a strong overshoot at the second temperature T2; however, this does not cause an overshoot in the temperature curve (yM1(t)), see number 7.
編號5界定未經校準第二溫度T2之間的差之特徵,由於經量測物件或構件之表面屬性不同,該未經校準第二溫度高於由函數w1(t)標識之設定點溫度。Number 5 defines the characteristics of the difference between uncalibrated second temperatures T2, which are higher than the setpoint temperature identified by the function w1(t) due to the different surface properties of the measured object or component.
在事件點6處,第一溫度T1精確地到達預定設定點溫度,其中非接觸式量測第二溫度感測器28的量測誤差藉由上文所描述之校準得以補償。At event point 6, the first temperature T1 accurately reaches the predetermined setpoint temperature, wherein the measurement error of the non-contact measurement second temperature sensor 28 is compensated by the calibration described above.
1:編號 2:編號 3:事件點 4:事件點 5:編號 6:事件點 7:編號 10:焊接裝置 12:構件載體/構件部分 14:輸送框架 16:構件 18:構件 20:感應裝置/熱源 22:量測窗 24:第一溫度感測器 26:第二溫度感測器 28:處理腔室 110:焊接裝置 210:焊接裝置 k:校準因子 t1:第一時間點 t2:第二時間點 T1:第一溫度 T1.1:第一溫度 T1.2:第一溫度 T2:第二溫度 T2.1:第二溫度 T2.2:第二溫度 T offset:溫差 R1:主控控制器 R2:從屬控制器 1: Number 2: Number 3: Event Point 4: Event Point 5: Number 6: Event Point 7: Number 10: Welding Device 12: Component Carrier/Component Part 14: Conveyor Frame 16: Component 18: Component 20: Sensing Device/Heat Source 22: Measurement Window 24: First Temperature Sensor 26: Second Temperature Sensor 28: Processing Chamber 110: Welding Device 210: Welding Device k: Calibration Factor t1: First Time Point t2: Second Time Point T1: First Temperature T1.1: First Temperature T1.2: First Temperature T2: Second Temperature T2.1: Second Temperature T2.2: Second Temperature T offset : Temperature Difference R1: Master Controller R2: Slave Controller
另外優點自以下圖式描述顯現。圖式展示本發明之實例。圖式、描述及申請專利範圍以組合方式含有眾多特徵。所屬領域中具有通常知識者亦將方便地單獨考慮這些特徵且將這些特徵組合成有意義的另外組合。 在諸圖中: [圖1] 展示根據一個實例之焊接或燒結裝置的示意性截面圖, [圖2]及[圖3] 展示根據另外實例之焊接或燒結設施的示意性截面圖, [圖4] 展示具有第一溫度及第二溫度之兩個例示性溫度曲線的圖式, [圖5] 展示解釋針對第二溫度判定校準函數的示意圖; [圖6] 展示雙階段溫度控制之示意性方塊圖; [圖7] 展示具有各種例示性溫度曲線及相對熱輸出之曲線的圖式;及 [圖8] 展示具有另外例示性溫度曲線及相對加熱輸出之曲線的圖式。 Further advantages are evident from the following diagrammatic description. The diagrams illustrate examples of the invention. The diagrams, description, and scope of the patent application contain numerous features in combination. Those skilled in the art will also readily consider these features individually and combine them into other meaningful combinations. In the figures: [Figure 1] shows a schematic cross-sectional view of a welding or sintering apparatus according to one example; [Figure 2] and [Figure 3] show schematic cross-sectional views of welding or sintering facilities according to another example; [Figure 4] shows a diagram of two illustrative temperature curves with a first temperature and a second temperature; [Figure 5] shows a schematic diagram explaining the calibration function for the second temperature; [Figure 6] shows a schematic block diagram of two-stage temperature control; [Figure 7] shows a diagram with various illustrative temperature curves and curves with relative heat output; and [Figure 8] shows a diagram with other illustrative temperature curves and curves with relative heating output.
相同元件符號已在下文中用於相同或類似元件。The same element symbol is used below for the same or similar elements.
10:焊接裝置 10: Welding Equipment
12:構件載體/構件部分 12: Component carrier/component part
14:輸送框架 14: Conveyor Frame
16:構件 16: Components
18:構件 18: Components
20:感應裝置/熱源 20: Sensing Device/Heat Source
22:量測窗 22: Measurement Window
24:第一溫度感測器 24: First Temperature Sensor
26:第二溫度感測器 26: Second Temperature Sensor
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