TWI910643B - Method of forming adhesive thinning of miniature filter array - Google Patents
Method of forming adhesive thinning of miniature filter arrayInfo
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- TWI910643B TWI910643B TW113118741A TW113118741A TWI910643B TW I910643 B TWI910643 B TW I910643B TW 113118741 A TW113118741 A TW 113118741A TW 113118741 A TW113118741 A TW 113118741A TW I910643 B TWI910643 B TW I910643B
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Abstract
Description
本發明係關於一種微型陣列的光學元件,特別係關於一種微型濾光片陣列黏合薄化之成型方法。This invention relates to a micro-array of optical elements, and more particularly to a method for bonding and thinning a micro-filter array.
微型濾光片陣列係由複數微小尺度的透鏡均勻分布並列形成的陣列,主要可用於光學顯微鏡、光場量測相機、3D影像顯示器、LiDAR系統等,習知微型光學元件陣列的製作方法係直接在基板鍍上多層透射膜,再以蝕刻或酸洗的方式控制陣列中特定位置,使不同位置的膜層數量及厚薄不同,以形成複數微小透鏡,各該微小透鏡可穿透不同波段的光束。A micro-filter array is an array formed by uniformly distributing and arranging a plurality of tiny lenses. It is mainly used in optical microscopes, light field measurement cameras, 3D image displays, LiDAR systems, etc. The conventional method for fabricating micro-optical element arrays is to directly deposit multiple layers of transmission film on a substrate, and then control specific positions in the array by etching or acid washing to make the number and thickness of film layers at different positions different, so as to form a plurality of micro-lenses, each of which can transmit light beams of different wavelengths.
然而,習知微型光學元件陣列的製作方法係需經過複雜的蝕刻或酸洗程序,且上述程序對於位置的精準度要求非常的高,實際操作較為困難,亦影響產品的良率,為此,需要一種位置精準、穩定性高的微型濾光片陣列製作方法。However, conventional methods for fabricating micro-optical element arrays involve complex etching or acid etching processes, which require extremely high positional accuracy. These processes are difficult to implement and affect product yield. Therefore, a method for fabricating micro-filter arrays with high positional accuracy and stability is needed.
本發明提供一種微型濾光片陣列黏合薄化之成型方法,其主要目的在於使微型陣列中各微小透鏡的位置精準。This invention provides a method for bonding and thinning a micro-filter array, the main purpose of which is to make the position of each micro-lens in the micro-array precise.
本發明之另一目的在於提供一種穩定性高的製作方法。Another objective of this invention is to provide a highly stable manufacturing method.
為達成前述目的,本發明微型濾光片陣列黏合薄化之成型方法,包括:To achieve the aforementioned objective, the present invention provides a method for thinning and bonding a micro-filter array, comprising:
一濾光片製作步驟,製作至少二種不同類型的濾光片,各該濾光片分別包括相互堆疊之一基板層及一鍍膜層;A filter manufacturing process involves manufacturing at least two different types of filters, each filter comprising a substrate layer and a coating layer stacked on top of each other;
一切割步驟,切割該等濾光片,形成不同種類之微型濾光片,該等微型濾光片包含相互堆疊之該基板層及該鍍膜層;A cutting step cuts the filters to form different types of micro filters, the micro filters comprising the substrate layer and the coating layer stacked on top of each other;
一黏合組成步驟,排列並黏合該等微型濾光片,該等微型濾光片之該基板層並排,形成一微型濾光片陣列,該等微型濾光片之間藉由不透光黏膠黏合;An adhesive assembly step involves arranging and bonding the microfilters, the substrate layers of the microfilters being arranged side by side to form a microfilter array, the microfilters being bonded together by an opaque adhesive;
一薄化步驟,研磨該等微型濾光片之該基板層,以薄化該微型濾光片陣列;以及A thinning step involves grinding the substrate layer of the microfilters to thin the microfilter array; and
一透明基板貼覆步驟,將一透明基板貼附於薄化後之該微型濾光片陣列,該透明基板位於該等微型濾光片之基板層。A transparent substrate bonding step involves attaching a transparent substrate to the thinned micro-filter array, wherein the transparent substrate is located on the substrate layer of the micro-filters.
藉由前述可知,本發明主要係藉由切割不同類型的濾光片,以取得不同種類之微型濾光片,再將該等不同種類之微型濾光片拼接黏合形成該微型濾光片陣列,並於該微型濾光片陣列的其中一側貼附透明基板,以達成使微型陣列中各微小透鏡的位置精準、製作穩定性高之目的。As can be seen from the foregoing, the present invention mainly obtains different types of micro-filters by cutting different types of filters, splicing and bonding these different types of micro-filters to form a micro-filter array, and attaching a transparent substrate to one side of the micro-filter array to achieve the purpose of making the position of each micro lens in the micro array accurate and the manufacturing stability high.
本發明提供一種微型濾光片陣列黏合薄化之成型方法,請參照圖1~9所示,包括:This invention provides a method for thinning and bonding a micro-filter array, as shown in Figures 1-9, including:
一濾光片製作步驟S1,請參照圖5,製作至少二種不同類型的濾光片10,該等不同類型之濾光片10包含但不限於帶通濾光片(BPF)、雙波帶通濾光片(DBPF)、窄帶通濾光片(NBPF),各該不同類型之濾光片10可通過的光譜波段涵蓋不可見光、可見光、近紅外光、遠紅外光等,各該不同類型之濾光片10分別包括相互堆疊之一基板層11及一鍍膜層12,該等濾光片10之邊長例如但不限於10mm~20mm,上述邊長可為長邊或寬邊,於本實施例中,具有三種不同類型的濾光片10,定義該等濾光片10為一第一濾光片10A、一第二濾光片10B及一第三濾光片10C;In filter fabrication step S1, please refer to Figure 5 to fabricate at least two different types of filters 10. These different types of filters 10 include, but are not limited to, bandpass filters (BPF), dual-bandpass filters (DBPF), and narrowband filters (NBPF). Each of these different types of filters 10 can pass through spectral bands covering invisible light, visible light, near-infrared light, and far-infrared light. The different types of filters 10 each include a substrate layer 11 and a coating layer 12 stacked on each other. The side length of the filters 10 is, for example, but not limited to, 10mm to 20mm. The side length can be the long side or the wide side. In this embodiment, there are three different types of filters 10, which are defined as a first filter 10A, a second filter 10B and a third filter 10C.
一切割步驟S2,請參照圖5,切割該等不同類型之濾光片10,形成不同種類之微型濾光片20,該等微型濾光片20皆包含相互堆疊之該基板層21及該鍍膜層22,該等微型濾光片20之尺寸係小於該等濾光片10之尺寸,該等微型濾光片20之邊長例如但不限於500µm~1mm,上述邊長可為長邊或寬邊,於本實施例中,該第一濾光片10A經切割後形成複數第一微型濾光片20A、該第二濾光片10B經切割後形成複數第二微型濾光片20B、該第三濾光片10C經切割後形成複數第三微型濾光片20C;In step S2, referring to Figure 5, the different types of filters 10 are cut to form different types of micro filters 20. Each micro filter 20 includes a substrate layer 21 and a coating layer 22 stacked on top of each other. The size of the micro filters 20 is smaller than the size of the filters 10. The side length of the micro filters 20 is, for example, but not limited to, 500µm to 1mm. The side length can be the long side or the wide side. In this embodiment, the first filter 10A is cut to form a plurality of first micro filters 20A, the second filter 10B is cut to form a plurality of second micro filters 20B, and the third filter 10C is cut to form a plurality of third micro filters 20C.
一黏合組成步驟S3,請參照圖6,依據實際需求排列並黏合該等微型濾光片20,該等微型濾光片20之基板層21並排、該等微型濾光片20之鍍膜層22並排,進而形成一微型濾光片陣列30,該微型濾光片陣列30可呈矩形、三角形、六角形、八角形、圓形等,當該微型濾光片陣列30呈矩形時,該微型濾光片陣列30例如但不限於長寬皆為0.55mm之陣列,該等微型濾光片20係藉由不透光黏膠40黏合,以避免光線穿透該等微型濾光片20時相互干擾,舉例而言,該不透光黏膠40可為3M™ Scotchcal™ 不透光膠膜50系列產品,但不限於此,於本實施例中該等第一微型濾光片20A、該等第二微型濾光片20B、該等第三微型濾光片20C可依實際需求間隔排列,該等第一微型濾光片20A、該等第二微型濾光片20B及該等第三微型濾光片20C之間係塗覆該不透光黏膠40。In the bonding assembly step S3, referring to Figure 6, the micro-filters 20 are arranged and bonded according to actual needs. The substrate layers 21 of the micro-filters 20 are arranged side by side, and the coating layers 22 of the micro-filters 20 are arranged side by side, thereby forming a micro-filter array 30. The micro-filter array 30 can be rectangular, triangular, hexagonal, or octagonal. Shaped like a circle, etc., when the microfilter array 30 is rectangular, the microfilter array 30 is, for example, but not limited to, an array with both length and width of 0.55mm. These microfilters 20 are bonded together by an opaque adhesive 40 to prevent light from interfering with each other when passing through them. For example, the opaque adhesive 40 can be 3M™... Scotchcal™ Opaque Adhesive Film 50 Series products, but not limited thereto, in this embodiment, the first microfilters 20A, the second microfilters 20B, and the third microfilters 20C can be arranged at intervals according to actual needs, and the first microfilters 20A, the second microfilters 20B, and the third microfilters 20C are coated with the opaque adhesive 40.
一薄化步驟S4,請參照圖8,研磨該等微型濾光片20之基板層21,以薄化該微型濾光片陣列30,具體而言,該基板層21具有相反之一頂側211及一底側212,該頂側211為該基板層21與該鍍膜層22相互接觸之一側,於本步驟中係透過研磨機M研磨該基板層21之該底側212;In a thinning step S4, referring to Figure 8, the substrate layer 21 of the micro-filters 20 is polished to thin the micro-filter array 30. Specifically, the substrate layer 21 has a top side 211 and a bottom side 212 that are opposite to each other. The top side 211 is the side of the substrate layer 21 that is in contact with the coating layer 22. In this step, the bottom side 212 of the substrate layer 21 is polished by a polishing machine M.
一透明基板貼覆步驟S5,請參照圖9,將一透明基板50貼附於薄化後之該微型濾光片陣列30,該透明基板50位於該等微型濾光片20之基板層21的底側212,該透明基板50可為石英透明基板,以增加整體結構強度,於其他實施例中,亦可採用AR抗反射膜取代該透明基板50;In step S5, referring to Figure 9, a transparent substrate 50 is attached to the thinned micro-filter array 30. The transparent substrate 50 is located on the bottom side 212 of the substrate layer 21 of the micro-filters 20. The transparent substrate 50 can be a quartz transparent substrate to increase the overall structural strength. In other embodiments, an AR anti-reflective film can also be used to replace the transparent substrate 50.
於較佳實施例中,請參照圖3,於該黏合組成步驟S3及該薄化步驟S4之間另具有一翻轉步驟S6,上下翻轉該微型濾光片陣列30,使該等微型濾光片20之鍍膜層22靠抵於一平台,該等微型濾光片20之基板層21的底側212朝上,俾利於在該薄化步驟S4時研磨機M可自上而下的研磨該基板層21;In a preferred embodiment, referring to Figure 3, a flipping step S6 is provided between the bonding assembly step S3 and the thinning step S4, in which the micro-filter array 30 is flipped up and down so that the coating layer 22 of the micro-filters 20 abuts against a platform, and the bottom side 212 of the substrate layer 21 of the micro-filters 20 faces upward, so that the polishing machine M can polish the substrate layer 21 from top to bottom during the thinning step S4;
於較佳實施例中,請參照圖4,於該黏合組成步驟S3及該翻轉步驟S6之間另具有一傳輸膜貼覆步驟S7,請參照圖7,於該微型濾光片陣列30貼附一傳輸膜60,該傳輸膜60位於鍍膜層22,而在透明基板貼覆步驟S5前,使用者再將該傳輸膜60取下,藉此,於執行翻轉步驟S6時,該傳輸膜60會靠抵於該平面,而可避免該等微型濾光片20之鍍膜層22直接靠抵於該平面,以達成保護該鍍膜層22之效果。In a preferred embodiment, referring to Figure 4, a transmission film application step S7 is provided between the bonding assembly step S3 and the flipping step S6. Referring to Figure 7, a transmission film 60 is attached to the micro-filter array 30. The transmission film 60 is located on the coating layer 22. Before the transparent substrate application step S5, the user removes the transmission film 60. Thus, when performing the flipping step S6, the transmission film 60 will rest against the plane, thereby preventing the coating layer 22 of the micro-filters 20 from directly resting against the plane, thus achieving the effect of protecting the coating layer 22.
於較佳實施例中,請參照圖9,於該透明基板貼覆步驟S5中,將另一個該透明基板50貼附於薄化後之該微型濾光片陣列30的該鍍膜層22,使該薄化後之微型濾光片陣列30的相對二側皆具有透明基板50,以保護該微型濾光片陣列30。In a preferred embodiment, referring to FIG9, in the transparent substrate bonding step S5, another transparent substrate 50 is attached to the coating layer 22 of the thinned micro filter array 30, so that both opposite sides of the thinned micro filter array 30 have transparent substrates 50 to protect the micro filter array 30.
藉由前述可知,本發明主要係藉由切割不同類型的濾光片10,以取得不同種類之微型濾光片20,再將該等不同種類之微型濾光片20拼接黏合形成該微型濾光片陣列30,並於該微型濾光片陣列30的其中一側貼附透明基板50,以達成使微型陣列中各微小透鏡的位置精準、製作穩定性高之目的。As can be seen from the foregoing, the present invention mainly obtains different types of micro-filters 20 by cutting different types of filters 10, splicing and bonding these different types of micro-filters 20 to form the micro-filter array 30, and attaching a transparent substrate 50 to one side of the micro-filter array 30, so as to achieve the purpose of making the position of each micro lens in the micro array accurate and the manufacturing stability high.
步驟S1:濾光片製作 步驟S2:切割 步驟S3:黏合組成 步驟S4:薄化 步驟S5:透明基板貼覆 步驟S6:翻轉 步驟S7:傳輸膜貼覆 10:濾光片 10A:第一濾光片 10B:第二濾光片 10C:第三濾光片 11,21:基板層 12,22:鍍膜層 20:微型濾光片 20A:第一微型濾光片 20B:第二微型濾光片 20C:第三微型濾光片 211:頂側 212:底側 30:微型濾光片陣列 40:不透光黏膠 50:透明基板 60:傳輸膜 M:研磨機 Step S1: Filter Fabrication Step S2: Cutting Step S3: Bonding and Assembly Step S4: Thinning Step S5: Transparent Substrate Lamination Step S6: Flipping Step S7: Transport Membrane Lamination 10: Filter 10A: First Filter 10B: Second Filter 10C: Third Filter 11, 21: Substrate Layer 12, 22: Coating Layer 20: Microfilter 20A: First Microfilter 20B: Second Microfilter 20C: Third Microfilter 211: Top Side 212: Bottom Side 30: Miniature filter array 40: Opaque adhesive 50: Transparent substrate 60: Transport membrane M: Polishing machine
圖1 為微型濾光片陣列之示意圖。 圖2 為本發明微型濾光片陣列黏合薄化之成型方法之流程示意圖。 圖3 為本發明微型濾光片陣列黏合薄化之成型方法較佳實施例之流程示意圖。 圖4 為本發明微型濾光片陣列黏合薄化之成型方法較佳實施例之流程示意圖。 圖5 為本發明微型濾光片陣列黏合薄化之成型方法製作流程之示意圖。 圖6 為本發明微型濾光片陣列黏合薄化之成型方法製作流程之示意圖。 圖7 為本發明微型濾光片陣列黏合薄化之成型方法製作流程之示意圖。 圖8 為本發明微型濾光片陣列黏合薄化之成型方法製作流程之示意圖。 圖9 為本發明微型濾光片陣列黏合薄化之成型方法製作流程之示意圖。 Figure 1 is a schematic diagram of a micro-filter array. Figure 2 is a flowchart illustrating the molding method for bonding and thinning the micro-filter array of the present invention. Figure 3 is a flowchart illustrating a preferred embodiment of the molding method for bonding and thinning the micro-filter array of the present invention. Figure 4 is a flowchart illustrating a preferred embodiment of the molding method for bonding and thinning the micro-filter array of the present invention. Figure 5 is a schematic diagram illustrating the fabrication process of the molding method for bonding and thinning the micro-filter array of the present invention. Figure 6 is a schematic diagram illustrating the fabrication process of the molding method for bonding and thinning the micro-filter array of the present invention. Figure 7 is a schematic diagram illustrating the fabrication process of the molding method for bonding and thinning the micro-filter array of the present invention. Figure 8 is a schematic diagram illustrating the fabrication process of the micro-filter array bonding and thinning method of the present invention. Figure 9 is a schematic diagram illustrating the fabrication process of the micro-filter array bonding and thinning method of the present invention.
S1:濾光片製作步驟 S1: Filter Making Steps
S2:切割步驟 S2: Cutting Steps
S3:黏合組成步驟 S3: Adhesive assembly steps
S4:薄化步驟 S4: Thinning step
S5:透明基板貼覆步驟 S5: Transparent substrate lamination step
Claims (10)
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| TWI910643B true TWI910643B (en) | 2026-01-01 |
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| WO2014200008A1 (en) | 2013-06-11 | 2014-12-18 | コニカミノルタ株式会社 | Imaging device |
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| WO2014200008A1 (en) | 2013-06-11 | 2014-12-18 | コニカミノルタ株式会社 | Imaging device |
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