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TWI909020B - Substrate processing apparatus and substrate positioning method - Google Patents

Substrate processing apparatus and substrate positioning method

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Publication number
TWI909020B
TWI909020B TW111109575A TW111109575A TWI909020B TW I909020 B TWI909020 B TW I909020B TW 111109575 A TW111109575 A TW 111109575A TW 111109575 A TW111109575 A TW 111109575A TW I909020 B TWI909020 B TW I909020B
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TW
Taiwan
Prior art keywords
substrate
positioning
processing apparatus
stage
positioning stage
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Application number
TW111109575A
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Chinese (zh)
Other versions
TW202301538A (en
Inventor
帶金正
加賀美史
荒井香織
Original Assignee
日商東京威力科創股份有限公司
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Priority claimed from JP2021050980A external-priority patent/JP7687792B2/en
Application filed by 日商東京威力科創股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW202301538A publication Critical patent/TW202301538A/en
Application granted granted Critical
Publication of TWI909020B publication Critical patent/TWI909020B/en

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Abstract

提供一種能夠定位矩形基板的技術。本揭露一態樣之處理裝置,係具有:搬送機構,係搬送矩形的基板;定位台,係載置該基板以進行該基板的定位;以及旋轉台,係使被定位後的該基板旋轉;該搬送機構係包含會按壓該定位台所載置之該基板的端部以進行該基板的定位之塊體部。A technique for positioning a rectangular substrate is provided. This disclosure provides a processing apparatus comprising: a conveying mechanism for conveying a rectangular substrate; a positioning stage for placing the substrate and positioning it; and a rotating stage for rotating the positioned substrate; the conveying mechanism includes a block portion that presses the end of the substrate placed on the positioning stage to position the substrate.

Description

基板處理裝置及基板定位方法Substrate processing apparatus and substrate positioning method

本揭露係關於一種處理裝置及定位方法。This disclosure relates to a processing device and a positioning method.

已知有一種技術,係將基板可移動地支撐在支撐構件上,藉由按壓構件與定位構件來將該基板夾入以定位該基板(例如,參照專利文獻1)。A known technique involves movably supporting a substrate on a support member and clamping the substrate in place by pressing and positioning members (e.g., see Patent 1).

專利文獻1:日本特開2005-116878號公報Patent Document 1: Japanese Patent Application Publication No. 2005-116878

本揭露係提供一種能夠定位矩形基板的技術。This disclosure provides a technique for positioning rectangular substrates.

本揭露一態樣之處理裝置,係具有:搬送機構,係搬送矩形的基板;定位台,係載置該基板以進行該基板的定位;以及旋轉台,係使被定位後的該基板旋轉;該搬送機構係包含會按壓該定位台所載置之該基板的端部以進行該基板的定位之塊體部。This disclosure discloses a processing apparatus comprising: a conveying mechanism for conveying a rectangular substrate; a positioning stage for placing the substrate and positioning it; and a rotating stage for rotating the positioned substrate; the conveying mechanism includes a block portion that presses the end of the substrate placed on the positioning stage to position the substrate.

根據本揭露,便能夠定位矩形基板。According to this disclosure, a rectangular substrate can be positioned.

以下,一邊參照圖式一邊說明本揭露之非用以限定的範例之實施形態。所有圖式中,會針對相同或對應之構件或零件賦予相同或對應之參照符號以省略重複說明。The following describes, with reference to the drawings, embodiments of the non-limiting examples disclosed herein. In all the drawings, the same or corresponding reference symbols will be assigned to the same or corresponding components or parts to avoid redundant descriptions.

[檢查裝置]參照圖1~圖3來說明實施形態之檢查裝置的一例。圖1係顯示實施形態之檢查裝置的一例之前視圖。圖2係顯示實施形態之檢查裝置的一例之俯視圖。圖3係顯示裝載部的一例之圖。[Inspection Device] An example of an inspection device in the embodiment will be described with reference to Figures 1 to 3. Figure 1 is a front view showing an example of the inspection device in the embodiment. Figure 2 is a top view showing an example of the inspection device in the embodiment. Figure 3 is a diagram showing an example of the mounting section.

檢查裝置1係具有裝載部10、檢查部20、及裝置控制器30等。檢查裝置1係會在裝置控制器30的控制下,將檢查對象之基板W從裝載部10往檢查部20搬送,並對形成在基板W之被檢查元件(DUT:Device Under Test)施予電性訊號來檢查各種電性特性。基板W可為例如矩形基板。作為矩形基板,可舉出例如PLP(Panel Level Package)。The inspection device 1 includes a loading unit 10, an inspection unit 20, and a device controller 30. Under the control of the device controller 30, the inspection device 1 transports the substrate W to be inspected from the loading unit 10 to the inspection unit 20, and applies electrical signals to the device under test (DUT) formed on the substrate W to inspect various electrical characteristics. The substrate W can be, for example, a rectangular substrate. An example of a rectangular substrate is a PLP (Panel Level Package).

裝載部10係具有裝載埠11、定位台12、旋轉台13、背面台14、基板搬送機構15、位置檢測感應器16等。The loading unit 10 includes a loading port 11, a positioning stage 12, a rotating stage 13, a back stage 14, a substrate conveying mechanism 15, and a position detection sensor 16.

裝載埠11係設在檢查裝置1的正面(-Y方向)一側。裝載埠11係載置會收納有基板W的匣盒C。The loading port 11 is located on the front (-Y direction) side of the inspection device 1. The loading port 11 holds the box C that houses the substrate W.

定位台12係設在檢查裝置1的背面(+Y方向)一側。定位台12係載置基板W以進行該基板W的定位之台。關於定位台12的細節將於之後加以說明。The positioning stage 12 is located on the back (+Y direction) side of the inspection device 1. The positioning stage 12 is a platform for placing the substrate W and positioning the substrate W. Details about the positioning stage 12 will be explained later.

旋轉台13係設在檢查裝置1的背面一側且在定位台12下方(-Z方向)。然而,旋轉台13也可以設在定位台12上方(+Z方向)。旋轉台13係吸附保持基板W以使該基板W旋轉之台。關於旋轉台13的細節將於之後加以說明。The rotary table 13 is located on the back side of the inspection device 1 and below the positioning stage 12 (in the -Z direction). However, the rotary table 13 may also be located above the positioning stage 12 (in the +Z direction). The rotary table 13 is a stage for adsorbing and holding the substrate W so that the substrate W rotates. Details regarding the rotary table 13 will be explained later.

背面台14係設在檢查裝置1的背面一側且在定位台12上方。然而,背面台14也可以設在定位台12下方。背面台14係用以設置會載置基板W的托盤(未圖示)之台。該托盤係能夠從檢查裝置1的背面一側加以取出。The back stage 14 is located on the back side of the inspection device 1 and above the positioning stage 12. However, the back stage 14 may also be located below the positioning stage 12. The back stage 14 is a platform for mounting a tray (not shown) that will hold the substrate W. The tray can be removed from the back side of the inspection device 1.

基板搬送機構15會在裝載埠11所載置之匣盒C、定位台12、旋轉台13、背面台14之托盤、及後述載置台21之間搬送基板W。基板搬送機構15係包含拾取件151,152、旋轉驅動機構153、上下驅動機構154等。The substrate transport mechanism 15 transports the substrate W between the cassette C placed on the loading port 11, the positioning stage 12, the rotating stage 13, the tray of the back stage 14, and the loading stage 21 described later. The substrate transport mechanism 15 includes pick-up parts 151 and 152, a rotary drive mechanism 153, and an up-down drive mechanism 154.

拾取件151,152係設成上下二段。各拾取件151,152會保持基板W。拾取件151,152也會被稱為叉件、末端效應器。關於拾取件151,152的細節將於之後加以說明。Pick-up members 151 and 152 are configured as two segments, upper and lower. Each pick-up member 151 and 152 will hold the substrate W. Pick-up members 151 and 152 are also referred to as forks or end effectors. Details about pick-up members 151 and 152 will be explained later.

旋轉驅動機構153係設在拾取件151,152下部,會驅動拾取件151,152以使其旋轉。旋轉驅動機構153係包含例如步進馬達。A rotary drive mechanism 153 is located below the pickups 151 and 152 and drives the pickups 151 and 152 to rotate. The rotary drive mechanism 153 includes, for example, a stepper motor.

上下驅動機構154係設在旋轉驅動機構153的下部,會驅動拾取件151,152及旋轉驅動機構153以使其上下移動。上下驅動機構154係包含例如步進馬達。此外,基板搬送機構15並不限於圖3所示之形態,也可以為例如具有多關節臂及上下驅動機構的形態。The up-and-down drive mechanism 154 is located below the rotary drive mechanism 153 and drives the pickups 151 and 152 and the rotary drive mechanism 153 to move them up and down. The up-and-down drive mechanism 154 includes, for example, a stepper motor. Furthermore, the substrate conveying mechanism 15 is not limited to the form shown in FIG3, and may also be, for example, a form with multiple articulated arms and an up-and-down drive mechanism.

位置檢測感應器16係設在以拾取件151,152來將基板W收納在匣盒C之搬送路徑上,會檢測拾取件151,152所保持之基板W的位置。位置檢測感應器16係包含投光部161及受光部162。投光部161係在裝載埠11所載置之匣盒C的入口附近之上部,於左右方向(X方向)相隔既定間隔而設有2個。受光部162係在該匣盒C的入口附近之下部,於左右方向相隔既定間隔而設有2個。既定間隔係會較基板W的一邊長度為寬且會較匣盒C之內寸為窄的間隔。例如,基板W的一邊長度為300mm,匣盒C之內寸為305mm之情形,既定間隔可為301~304mm,較佳地係303mm。投光部161係將光L朝向受光部162照射。受光部162係檢測有無接受到從投光部161所照射之光L。此外,投光部161與受光部162之位置關係可為相反。亦即,投光部161也可以設在匣盒C的入口附近之下部,而受光部162也可以設在匣盒C的入口附近之上部。A position detection sensor 16 is installed on the transport path where the substrate W is housed in the cassette C by the pickups 151 and 152, and detects the position of the substrate W held by the pickups 151 and 152. The position detection sensor 16 includes a light-emitting section 161 and a light-receiving section 162. Two light-emitting sections 161 are provided at predetermined intervals in the left-right direction (X direction) above the entrance of the cassette C held in the loading port 11. Two light-receiving sections 162 are provided at predetermined intervals in the left-right direction below the entrance of the cassette C. The predetermined intervals are wider than one side of the substrate W and narrower than the inner dimensions of the cassette C. For example, if one side of the substrate W is 300mm long and the inner dimension of the box C is 305mm, the predetermined interval can be 301~304mm, preferably 303mm. The light-projecting part 161 illuminates the light L towards the light-receiving part 162. The light-receiving part 162 detects whether it receives the light L illuminating from the light-projecting part 161. Furthermore, the positional relationship between the light-projecting part 161 and the light-receiving part 162 can be reversed. That is, the light-projecting part 161 can also be provided at the lower part near the entrance of the box C, and the light-receiving part 162 can also be provided at the upper part near the entrance of the box C.

位置檢測感應器16中,在保持有基板W之拾取件151,152進入匣盒C時基板W位於拾取件151,152的既定範圍內之情形,受光部162便會接受到從投光部161所照射之光L。另一方面,基板W位於拾取件151,152的既定範圍外之情形,由於從投光部161所照射之光L會被基板W所遮蔽,因此受光部162便不會接受到從投光部161所照射之光L。因此,在受光部162沒有接受到從投光部161所照射之光L的情形,藉由使拾取件151,152不會將基板W收納在匣盒C,便可避免基板W與匣盒C接觸到的情形。此外,位置檢測感應器16並不限於圖示的範例,也可以為其他形態。In the position detection sensor 16, when the pickup members 151 and 152, which hold the substrate W, enter the cassette C, and the substrate W is within the predetermined range of the pickup members 151 and 152, the light-receiving part 162 will receive the light L emitted from the light-emitting part 161. On the other hand, when the substrate W is outside the predetermined range of the pickup members 151 and 152, the light L emitted from the light-emitting part 161 will be blocked by the substrate W, and therefore the light-receiving part 162 will not receive the light L emitted from the light-emitting part 161. Therefore, when the light-receiving part 162 does not receive the light L emitted from the light-emitting part 161, by preventing the pickup members 151 and 152 from storing the substrate W in the cassette C, the contact between the substrate W and the cassette C can be avoided. Furthermore, the position detection sensor 16 is not limited to the example shown in the figure, and may also be of other forms.

檢查部20係相鄰配置在裝載部10。檢查部20係具有載置台21、昇降機構22、XY台座23、探針卡24、及對準機構25等。The inspection unit 20 is arranged adjacent to the loading unit 10. The inspection unit 20 includes a loading platform 21, a lifting mechanism 22, an XY platform 23, a probe holder 24, and an alignment mechanism 25.

載置台21係載置保持基板W。載置台21係包含例如真空吸盤。The mounting table 21 mounts and holds the substrate W. The mounting table 21 includes, for example, a vacuum suction cup.

昇降機構22係設在載置台21的下部,會使載置台21相對於XY台座23昇降。昇降機構22係包含例如步進馬達。The lifting mechanism 22 is located below the platform 21 and causes the platform 21 to rise or fall relative to the XY platform 23. The lifting mechanism 22 includes, for example, a stepper motor.

XY台座23係設在昇降機構22的下部,會使載置台21及昇降機構22移動於雙軸方向(圖中之X方向及Y方向)。XY台座23係固定在檢查部20的底部。XY台座23係包含例如步進馬達。The XY platform 23 is located below the lifting mechanism 22, allowing the platform 21 and the lifting mechanism 22 to move in a dual-axis direction (X and Y directions in the figure). The XY platform 23 is fixed to the bottom of the inspection unit 20. The XY platform 23 includes, for example, a stepper motor.

探針卡24係配置在載置台21上方。探針卡24的載置台21一側係形成有多個探針24a。探針卡24係拆裝自如地被安裝在頂板24b。探針卡24係透過測試頭T而連接有測試器(未圖示)。The probe holder 24 is positioned above the mounting stage 21. Multiple probes 24a are formed on one side of the mounting stage 21 of the probe holder 24. The probe holder 24 is easily mounted on the top plate 24b. The probe holder 24 is connected to a tester (not shown) via a test head T.

對準機構25係包含攝影機25a、導軌25b、及對準橋25c等。攝影機25a係朝向下方而被安裝在對準橋25c中央,會拍攝載置台21、基板W等。攝影機25a係例如CCD攝影機或CMOS攝影機。導軌25b會將對準橋25c支撐成能夠移動於水平方向(圖中之Y方向)。對準橋25c係藉由左右一對的導軌25b來加以支撐,會沿著導軌25b而移動於水平方向(圖中之Y方向)。藉此,攝影機25a便會透過對準橋25c而在待機位置與探針卡24中心的正下方(以下稱為「探針中心」)之間移動。位於探針中心之攝影機25a係在對準時會在載置台21移動於XY方向之期間從上方拍攝載置台21上的基板W之電極墊,進行影像處理以將拍攝影像顯示在顯示裝置40。The alignment mechanism 25 includes a camera 25a, guide rails 25b, and alignment bridge 25c. The camera 25a is mounted downwards in the center of the alignment bridge 25c and captures images of the stage 21, substrate W, etc. The camera 25a is, for example, a CCD camera or a CMOS camera. The guide rails 25b support the alignment bridge 25c so that it can move horizontally (in the Y direction in the diagram). The alignment bridge 25c is supported by a pair of guide rails 25b on its left and right sides and moves horizontally (in the Y direction in the diagram) along the guide rails 25b. In this way, the camera 25a moves between the standby position and directly below the center of the probe card 24 (hereinafter referred to as the "probe center") via the alignment bridge 25c. The camera 25a located at the probe center will capture images of the electrode pads of the substrate W on the mounting stage 21 from above while the stage 21 moves in the XY direction during alignment, and perform image processing to display the captured images on the display device 40.

裝置控制器30係設在載置台21的下方,會控制檢查裝置1整體的動作。設在裝置控制器30之CPU會依據ROM、RAM等記憶體所儲存的品種參數來執行所欲檢查。此外,品種參數也可以儲存在硬碟或ROM、RAM以外的半導體記憶體。另外,品種參數也可以是在記錄於電腦可讀取之CD-ROM、DVD等記錄媒體的狀態下而被插入至既定位置後被加以讀取。The device controller 30 is located below the stage 21 and controls the overall operation of the inspection device 1. The CPU in the device controller 30 performs the desired inspection based on the product parameters stored in memory such as ROM and RAM. In addition, the product parameters can also be stored on a hard drive or semiconductor memory other than ROM and RAM. Furthermore, the product parameters can also be read after being inserted into a predetermined location while recorded on a computer-readable recording medium such as a CD-ROM or DVD.

[拾取件]參照圖4來說明裝載部10所具有之基板搬送機構15的拾取件151之一例。圖4係顯示拾取件151的一例之圖,顯示拾取件151保持有基板W的狀態。圖4(a)係從上方觀看拾取件151的圖,圖4(b)係從側面觀看拾取件151的圖。此外,關於拾取件152可以為與拾取件151相同的構成。[Pick-up Component] An example of the pick-up component 151 of the substrate conveying mechanism 15 of the loading section 10 will be described with reference to FIG. 4. FIG. 4 is a diagram showing an example of the pick-up component 151, showing the pick-up component 151 holding the substrate W. FIG. 4(a) is a view of the pick-up component 151 from above, and FIG. 4(b) is a view of the pick-up component 151 from the side. Furthermore, the pick-up component 152 may have the same configuration as the pick-up component 151.

拾取件151係包含基台151a、墊片151b、及塊體部151c等。Pick-up component 151 includes base 151a, pad 151b, and block part 151c, etc.

基台151a係藉由板狀構件來加以形成。基台151a在俯視時係具有大致U字狀。The base 151a is formed by plate-shaped components. When viewed from above, the base 151a has a roughly U-shaped form.

墊片151b係在基台151a上面設有多個(例如8個)。多個墊片151b係包含能夠獨立吸引的至少2個吸附墊。各吸附墊會真空吸附來保持基板W。另外,多個墊片151b也可以包含不需真空吸附即可以保持基板W的保持墊。Multiple pads 151b are provided on the base 151a (e.g., eight). Each pad 151b includes at least two adsorption pads capable of independent attraction. Each adsorption pad holds the substrate W by vacuum adsorption. Alternatively, the multiple pads 151b may also include holding pads that can hold the substrate W without vacuum adsorption.

塊體部151c係設在拾取件151的基端上。塊體部151c係具有按壓面151d。按壓面151d係與拾取件151的進退方向呈正交。按壓面151d係從拾取件151上面延伸至會較該拾取件151所保持之基板W的上面要高的位置。塊體部151c會以按壓面151d來按壓定位台12所載置之基板W的端部,以進行基板W對於拾取件151的定位。Block portion 151c is provided on the base end of pickup member 151. Block portion 151c has a pressing surface 151d. The pressing surface 151d is orthogonal to the forward and backward direction of pickup member 151. The pressing surface 151d extends from the top of pickup member 151 to a position higher than the top of substrate W held by pickup member 151. Block portion 151c presses the end of substrate W placed on positioning stage 12 with pressing surface 151d to position substrate W on pickup member 151.

[定位台]參照圖5來說明裝載部10所具有的定位台12之一例。圖5係顯示定位台12的一例之圖,顯示拾取件151進入至定位台12上方的狀態。圖5(a)係從上方觀看定位台12的圖,圖5(b)係從側面觀看定位台12的圖。[Positioning Stage] An example of the positioning stage 12 of the loading unit 10 will be described with reference to FIG. 5. FIG. 5 is a diagram showing an example of the positioning stage 12, showing the state in which the pickup 151 enters above the positioning stage 12. FIG. 5(a) is a view of the positioning stage 12 from above, and FIG. 5(b) is a view of the positioning stage 12 from the side.

定位台12係包含基座121、保持銷122等。The positioning platform 12 includes a base 121, a retaining pin 122, etc.

基座121係固定在裝載部10。基座121係藉由板狀構件來加以形成。基座121在俯視時係具有矩形狀。The base 121 is fixed to the loading section 10. The base 121 is formed by a plate-shaped component. The base 121 has a rectangular shape when viewed from above.

保持銷122係在基座121上設有多個(例如6個)。各保持銷122係設在拾取件151之進入路徑以外的位置。各保持銷122係從基座121往上方突出而以上端來將基板W下面保持成滑動自如。各保持銷122係藉由例如摩擦阻力較小的材料來加以形成。保持銷122的數量較佳地係6個以上。藉此,便能夠正確地保持翹曲的基板W。Multiple (e.g., six) retaining pins 122 are provided on the base 121. Each retaining pin 122 is located outside the entry path of the pickup member 151. Each retaining pin 122 protrudes upward from the base 121 and holds the substrate W in place so that it can slide freely. Each retaining pin 122 is formed of, for example, a material with low frictional resistance. Preferably, there are six or more retaining pins 122. In this way, the warped substrate W can be held in place correctly.

[旋轉台]參照圖6來說明裝載部10所具有的旋轉台13之一例。圖6係顯示旋轉台13的一例之圖,顯示拾取件151進入至旋轉台13上方的狀態。圖6(a)係從上方觀看旋轉台13的圖,圖6(b)係從側面觀看旋轉台13的圖。[Rotating Table] An example of the rotating table 13 of the loading unit 10 will be described with reference to FIG. 6. FIG. 6 is a diagram showing an example of the rotating table 13, showing the state in which the pickup 151 enters above the rotating table 13. FIG. 6(a) is a view of the rotating table 13 from above, and FIG. 6(b) is a view of the rotating table 13 from the side.

旋轉台13係包含台座131、減速機132、及馬達133等。The rotary table 13 includes a base 131, a reducer 132, and a motor 133.

台座131係會以在其上面所設置之多個(例如3個)吸附墊131a來真空吸附而保持基板W。台座131係透過減速機132來連接於馬達133,藉由馬達133的動力來使該基板W旋轉。The base 131 holds the substrate W by vacuum adsorption using multiple (e.g., three) adsorption pads 131a disposed on it. The base 131 is connected to the motor 133 via a reducer 132, and the substrate W is rotated by the power of the motor 133.

減速機132係會以齒輪等來降低馬達133一側之動力的旋轉速度並輸出至台座131。The reducer 132 uses gears and the like to reduce the rotational speed of the power on one side of the motor 133 and output it to the base 131.

馬達133係藉由將動力透過減速機132而輸出至台座131來使台座131旋轉。Motor 133 outputs power to base 131 through reducer 132 to make base 131 rotate.

[檢查裝置的動作]參照圖7~圖9來說明在前述檢查裝置1中檢查基板W之情形的檢查裝置1之動作的一例。圖7係顯示實施形態之檢查裝置的動作之一例的流程圖。[Operation of the Inspection Device] Referring to Figures 7 to 9, an example of the operation of the inspection device 1 in the case of inspecting the substrate W in the aforementioned inspection device 1 will be explained. Figure 7 is a flowchart showing an example of the operation of the inspection device in the embodiment.

步驟S1中,裝載部10會進行檢查前之基板W的定位。圖8係顯示定位基板W之動作的一例之圖,為從側面觀看定位台12的圖。圖9係顯示使基板W旋轉之動作的一例之圖,為從側面觀看旋轉台13的圖。In step S1, the loading unit 10 positions the substrate W before inspection. Figure 8 shows an example of the operation of positioning the substrate W, and is a side view of the positioning stage 12. Figure 9 shows an example of the operation of rotating the substrate W, and is a side view of the rotating stage 13.

本實施形態中,如圖8(a)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151進入至定位台12上方來將匣盒C所收納之基板W搬送至定位台12上方。In this embodiment, as shown in FIG8(a), the device controller 30 controls the substrate conveying mechanism 15 to move the substrate W stored in the box C to the positioning stage 12 by bringing the pick-up member 151 above the positioning stage 12.

接著,如圖8(b)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151下降至修正位置來將基板W載置在保持銷122上。修正位置係墊片151b從基板W下面離開的位置,且為塊體部151c上面會較基板W上面要高的位置。Next, as shown in Figure 8(b), the device controller 30 controls the substrate conveying mechanism 15 to place the substrate W on the retaining pin 122 by lowering the pick-up member 151 to the correction position. The correction position is the position where the pad 151b leaves the substrate W from below, and the position where the block portion 151c is higher than the substrate W.

接著,如圖8(c)所示,裝置控制器30會控制基板搬送機構15,藉由使位於修正位置之拾取件151往進入方向移動第1距離來將塊體部151c的按壓面151d抵接按壓於基板W端部。藉此,基板W便會在保持銷122上滑動,基板W之塊體部151c一側之邊會與按壓面151d成為平行。第1距離可為例如30mm。Next, as shown in Figure 8(c), the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151, which is in the corrected position, in the infeed direction by a first distance, so that the pressing surface 151d of the block portion 151c abuts against the end of the substrate W. Thereby, the substrate W slides on the retaining pin 122, and one side of the block portion 151c of the substrate W becomes parallel to the pressing surface 151d. The first distance can be, for example, 30 mm.

接著,如圖8(d)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151往後退方向移動第2距離來使塊體部151c的按壓面151d從基板W端部離開。藉此,基板W對於拾取件151在第1方向的定位便會結束。第1方向係拾取件151的進退方向。第2距離可為例如20mm。Next, as shown in Figure 8(d), the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151 backward by a second distance, causing the pressing surface 151d of the block portion 151c to separate from the end of the substrate W. This completes the positioning of the substrate W relative to the pickup 151 in the first direction. The first direction is the forward and backward direction of the pickup 151. The second distance can be, for example, 20 mm.

接著,如圖8(e)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151上昇至UP位置而以墊片151b來保持保持銷122上所載置的基板W。UP位置係基板W下面從保持銷122離開的位置。Next, as shown in Figure 8(e), the device controller 30 controls the substrate transport mechanism 15 to hold the substrate W placed on the holding pin 122 by raising the pick-up member 151 to the UP position and using the pad 151b. The UP position is the position where the substrate W is below the holding pin 122.

接著,如圖9(a)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151進入至旋轉台13上方來將已進行第1方向之定位的基板W搬送至旋轉台13上方。Next, as shown in Figure 9(a), the device controller 30 controls the substrate conveying mechanism 15 to move the substrate W, which has been positioned in the first direction, to the top of the rotary table 13 by bringing the pick-up member 151 above the rotary table 13.

接著,如圖9(b)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151下降至DOWN位置來將基板W載置於台座131上。DOWN位置係墊片151b從基板W下面離開的位置。Next, as shown in Figure 9(b), the device controller 30 controls the substrate conveying mechanism 15 to place the substrate W on the platform 131 by lowering the pick-up piece 151 to the DOWN position. The DOWN position is the position where the pad 151b moves away from under the substrate W.

接著,如圖9(c)所示,裝置控制器30會控制旋轉台13,藉由在以吸附墊131a來吸附保持有基板W之狀態下使台座131旋轉90°,以使該基板W旋轉90°。另外,裝置控制器30係在使該基板W旋轉90°後會控制旋轉台13來停止吸附墊131a所致之吸附。Next, as shown in Figure 9(c), the device controller 30 controls the rotary table 13 to rotate the stage 131 by 90° while the substrate W is held in place by the adsorption pad 131a, thereby rotating the substrate W by 90°. Furthermore, after rotating the substrate W by 90°, the device controller 30 controls the rotary table 13 to stop the adsorption caused by the adsorption pad 131a.

接著,如圖9(d)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151上昇至UP位置而以墊片151b來保持台座131上所載置的基板W。UP位置係基板W下面從台座131離開的位置。Next, as shown in Figure 9(d), the device controller 30 controls the substrate conveying mechanism 15 to hold the substrate W placed on the platform 131 by raising the pick-up member 151 to the UP position and using the pad 151b. The UP position is the position where the substrate W is below the platform 131.

接著,裝置控制器30會控制基板搬送機構15,將旋轉90°後之基板W再次搬送至定位台12。接著,如圖8(a)~圖8(e)所示,裝置控制器30係會以與基板W對於拾取件151在第1方向的定位相同之方法來進行基板W對於拾取件151在與第1方向正交之第2方向的定位。Next, the device controller 30 controls the substrate conveying mechanism 15 to transport the substrate W, which has been rotated 90°, back to the positioning stage 12. Then, as shown in Figures 8(a) to 8(e), the device controller 30 positions the substrate W relative to the pickup 151 in the second direction, which is orthogonal to the first direction, in the same way as the positioning of the substrate W relative to the pickup 151 in the first direction.

根據以上說明,裝載部10便會結束檢查前的基板W對於拾取件151在第1方向及第2方向的定位。Based on the above description, the loading unit 10 will complete the positioning of the pickup 151 by the substrate W in the first and second directions before inspection.

步驟S2中,係會將在步驟S1中被定位後之檢查前的基板W搬送至檢查部20。本實施形態中,裝置控制器30會控制基板搬送機構15,將已進行第1方向及第2方向的定位之基板W搬送至旋轉台13。接著,裝置控制器30會控制旋轉台13,使基板W旋轉以使基板W成為預先指定的方向。換句話說,能夠藉由旋轉台13來使搬送至檢查部20之基板W轉動(旋轉)任意的指定角度。接著,裝置控制器30會控制基板搬送機構15,將基板W從旋轉台13搬送至檢查部20後載置在載置台21上。此外,在基板W成為預先指定的方向之情形,裝置控制器30也可以控制基板搬送機構15,不會將該基板W搬送至旋轉台13而是搬送至檢查部20後載置在載置台21上。In step S2, the substrate W, positioned in step S1 and before inspection, is transported to the inspection unit 20. In this embodiment, the device controller 30 controls the substrate transport mechanism 15 to transport the substrate W, which has been positioned in the first and second directions, to the rotary table 13. Then, the device controller 30 controls the rotary table 13 to rotate the substrate W to a pre-specified orientation. In other words, the rotary table 13 can be used to rotate the substrate W to any specified angle. Next, the device controller 30 controls the substrate transport mechanism 15 to transport the substrate W from the rotary table 13 to the inspection unit 20 and place it on the mounting table 21. Furthermore, when the substrate W is in the pre-specified orientation, the device controller 30 can also control the substrate conveying mechanism 15 to not convey the substrate W to the rotary table 13, but to the inspection unit 20 and then place it on the placement table 21.

步驟S3中,檢查部20會檢查基板W。本實施形態中,裝置控制器30會控制對準機構25,使載置台21上的基板W上所形成之被檢查元件的電極墊與探針卡24之多個探針24a的位置一致。接著,裝置控制器30會控制昇降機構22,使載置台21上昇以使探針卡24之多個探針24a接觸於相對應的電極墊。接著,裝置控制器30會將來自測試器的檢查用訊號透過測試頭T及探針卡24之多個探針24a來施加至基板W上所形成之被檢查元件,以檢查被檢查元件的電性特性。在被檢查元件的電性特性之檢查結束後,裝置控制器30會控制昇降機構22,使載置台21下降以使探針24a從電極墊離開。In step S3, the inspection unit 20 inspects the substrate W. In this embodiment, the device controller 30 controls the alignment mechanism 25 to align the electrode pads of the component under test formed on the substrate W on the stage 21 with the positions of the multiple probes 24a of the probe card 24. Next, the device controller 30 controls the lifting mechanism 22 to raise the stage 21 so that the multiple probes 24a of the probe card 24 contact the corresponding electrode pads. Then, the device controller 30 applies the inspection signal from the tester to the component under test formed on the substrate W through the test head T and the multiple probes 24a of the probe card 24 to inspect the electrical characteristics of the component under test. After the electrical characteristics of the component under inspection are checked, the device controller 30 controls the lifting mechanism 22 to lower the stage 21 so that the probe 24a leaves the electrode pad.

步驟S4中,裝載部10會進行檢查後之基板W的定位。檢查後之基板W的定位係能夠以與步驟S1中檢查前之基板W的定位相同之方法來加以實施。In step S4, the loading unit 10 will position the substrate W after inspection. The positioning of the substrate W after inspection can be performed in the same way as the positioning of the substrate W before inspection in step S1.

步驟S5中,係會將檢查後之基板W收納在匣盒C。本實施形態中,裝置控制器30會控制基板搬送機構15,將在裝載部10中被定位後的檢查後之基板W搬送至匣盒C來加以收納。此時,裝置控制器30會根據位置檢測感應器16的檢測值來判斷檢查後之基板W是否位於拾取件151的既定範圍內。接著,裝置控制器30在判斷檢查後之基板W是位於拾取件151的既定範圍內之情形,會將檢查後之基板W搬送至匣盒C來加以收納。另一方面,裝置控制器30在判斷檢查後之基板W是位於拾取件151的既定範圍外之情形,則不會將檢查後之基板W收納至匣盒C。例如,裝置控制器30會控制基板搬送機構15,使拾取件151的動作停止。另外,例如,裝置控制器30會控制基板搬送機構15,將檢查後之基板W搬送至背面台14後載置在背面台14上所設置的托盤上。另外,例如,裝置控制器30也可以使顯示裝置40顯示無法將檢查後之基板W收納至匣盒C。另外,例如,裝置控制器30也可以裝載部10的各部位,以再次在該裝載部10中進行檢查後之基板W的定位。如此般,步驟S5中,裝置控制器30在判斷檢查後之基板W是位於拾取件151的既定範圍外之情形,則不會將檢查後之基板W收納至匣盒C。藉此,便能夠避免拾取件151所保持之基板W與匣盒C接觸。In step S5, the inspected substrate W is stored in the cassette C. In this embodiment, the device controller 30 controls the substrate conveying mechanism 15 to transport the inspected substrate W, which has been positioned in the loading section 10, to the cassette C for storage. At this time, the device controller 30 determines whether the inspected substrate W is within the predetermined range of the pickup 151 based on the detection value of the position detection sensor 16. Then, if the device controller 30 determines that the inspected substrate W is within the predetermined range of the pickup 151, it will transport the inspected substrate W to the cassette C for storage. On the other hand, if the device controller 30 determines that the inspected substrate W is outside the predetermined range of the pickup 151, it will not store the inspected substrate W in the cassette C. For example, the device controller 30 controls the substrate conveying mechanism 15 to stop the operation of the pickup 151. Alternatively, the device controller 30 controls the substrate conveying mechanism 15 to transport the inspected substrate W to the back stage 14 and place it on a tray provided on the back stage 14. Alternatively, the device controller 30 can also cause the display device 40 to indicate that the inspected substrate W cannot be stored in the case C. Alternatively, the device controller 30 can also reposition the inspected substrate W in the loading section 10 at various locations. Thus, in step S5, if the device controller 30 determines that the inspected substrate W is outside the predetermined range of the pickup 151, it will not store the inspected substrate W in the case C. This prevents the substrate W held by the pickup 151 from coming into contact with the box C.

此外,前述實施形態之檢查裝置1的動作中,雖然說明了會進行對於檢查前之基板W的定位(步驟S1)及對於檢查後之基板W的定位(步驟S4)之情形,但並不限於此。例如,也可以省略對於檢查前之基板W的定位(步驟S1)及對於檢查後之基板W的定位(步驟S4)之任一者。另外,例如,也可以只有在步驟S5中裝置控制器30判斷檢查後之基板W是位於拾取件151的既定範圍外之情形,才進行對於檢查後之基板W的定位(步驟S4)。Furthermore, while the operation of the inspection device 1 in the aforementioned embodiment describes the presence of positioning the substrate W before inspection (step S1) and positioning the substrate W after inspection (step S4), it is not limited to this. For example, either positioning the substrate W before inspection (step S1) or positioning the substrate W after inspection (step S4) may be omitted. Additionally, for example, positioning the substrate W after inspection (step S4) may only be performed if, in step S5, the device controller 30 determines that the substrate W after inspection is outside the predetermined range of the pickup member 151.

如以上說明,根據實施形態,係以拾取件151的塊體部151c來按壓會滑動自如地保持在定位台12之保持銷122的基板W之端部,以進行基板W對於拾取件151的定位。藉此,不用從側面來夾住基板W便能夠進行該基板W的定位。因此,即使是定位樹脂基板、玻璃基板等般容易受損之基板W的情形,仍能夠抑制該基板W受損的情形。另外,不用取決於基板W的尺寸便能夠進行該基板W的定位。因此,即使是基板W有翹曲的情形,仍能夠進行該基板W的定位。另外,由於是藉由拾取件151的移動來進行基板W的定位,因此能夠易於微調基板W的中心位置。As explained above, according to the embodiment, the substrate W is positioned relative to the pickup 151 by pressing the end of the substrate W, which is slidably held in place by the holding pin 122 of the positioning stage 12, with the block portion 151c of the pickup member 151. This allows the substrate W to be positioned without clamping it from the side. Therefore, even when positioning easily damaged substrates such as resin substrates or glass substrates, damage to the substrate W can be prevented. Furthermore, the substrate W can be positioned regardless of its size. Therefore, even if the substrate W is warped, it can still be positioned. Additionally, since the substrate W is positioned by moving the pickup member 151, the center position of the substrate W can be easily fine-tuned.

[變形例]參照圖10來說明裝載部10所具有之定位台及旋轉台的變形例。圖10係顯示定位台及旋轉台的其他範例之圖,顯示拾取件151進入至定位台及旋轉台上方的狀態。圖10(a)係從上方觀看定位台及旋轉台的圖,圖10(b)係從側面觀看定位台及旋轉台的圖。[Variations] A variation of the positioning table and rotating table in the loading unit 10 will be described with reference to FIG10. FIG10 shows another example of the positioning table and rotating table, showing the state in which the pickup 151 enters above the positioning table and rotating table. FIG10(a) is a view of the positioning table and rotating table from above, and FIG10(b) is a view of the positioning table and rotating table from the side.

變形例相關之定位台17及旋轉台18係在兩者為一體設置這一點與前述定位台12及旋轉台13有所不同。The difference between the modified example and the aforementioned positioning stage 12 and rotating stage 13 is that the positioning stage 17 and rotating stage 18 are integrated into one unit.

定位台17係包含基座171、保持銷172、支撐板173、致動器174等。The positioning stage 17 includes a base 171, a retaining pin 172, a support plate 173, an actuator 174, etc.

基座171係透過致動器174來固定在支撐板173。基座171係藉由板狀構件來加以形成。基座171在俯視時係具有矩形狀。The base 171 is fixed to the support plate 173 by means of the actuator 174. The base 171 is formed by means of a plate-shaped component. The base 171 has a rectangular shape when viewed from above.

保持銷172可為與前述保持銷122相同的構成。The retaining pin 172 may have the same configuration as the aforementioned retaining pin 122.

支撐板173係透過致動器174來將基座171支撐成昇降自如。支撐板173係固定在裝載部10。The support plate 173 supports the base 171 so that it can be raised and lowered freely through the actuator 174. The support plate 173 is fixed to the loading part 10.

致動器174係在支撐板173上設有多個(例如2個)。致動器174會使基座171相對於支撐板173而昇降。作為致動器174,能夠利用例如DC馬達、步進馬達、線性馬達等馬達、汽缸等空氣驅動機構、或壓電致動器。Multiple actuators 174 (e.g., two) are provided on the support plate 173. The actuators 174 cause the base 171 to rise or fall relative to the support plate 173. As actuators 174, motors such as DC motors, stepper motors, linear motors, air-driven mechanisms such as cylinders, or piezoelectric actuators can be used.

旋轉台18可為與前述旋轉台13相同的構成。亦即,旋轉台18係包含台座181、減速機182、及馬達183等。旋轉台18係會在以在台座181上面所設置之多個(例如3個)吸附墊181a來真空吸附而保持基板W的狀態下,將馬達183的動力透過減速機182而輸出至台座181來使基板W旋轉。The rotary table 18 may have the same configuration as the aforementioned rotary table 13. That is, the rotary table 18 includes a base 181, a reducer 182, and a motor 183. The rotary table 18 holds the substrate W in a state of vacuum adsorption by multiple (e.g., three) adsorption pads 181a provided on the base 181, and outputs the power of the motor 183 to the base 181 through the reducer 182 to make the substrate W rotate.

參照圖11~圖13來說明在具有變形例之定位台17及旋轉台18的檢查裝置1之裝載部10中進行檢查前之基板W的定位之方法的一例。此外,關於檢查後之基板W的定位也能夠以與檢查前之基板W的定位相同之方法來加以實施。圖11~圖13係顯示定位基板W之動作的一例之圖,為從側面觀看定位台17及旋轉台18的圖。Referring to Figures 11-13, an example of a method for positioning the substrate W before inspection in the loading section 10 of the inspection device 1 with a modified positioning stage 17 and a rotating stage 18 will be described. Furthermore, the positioning of the substrate W after inspection can also be performed using the same method as the positioning of the substrate W before inspection. Figures 11-13 are diagrams showing an example of the operation of positioning the substrate W, and are side views of the positioning stage 17 and the rotating stage 18.

本實施形態中,如圖11(a)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151進入至定位台17上方來將匣盒C所收納之基板W搬送至定位台17上方。In this embodiment, as shown in FIG11(a), the device controller 30 controls the substrate conveying mechanism 15 to move the substrate W stored in the box C to the positioning stage 17 by bringing the pick-up member 151 above the positioning stage 17.

接著,如圖11(b)所示,裝置控制器30會控制致動器174,使基座171上昇至UP位置。UP位置係保持銷172上端會較台座181上面要高的位置。Next, as shown in Figure 11(b), the device controller 30 controls the actuator 174 to raise the base 171 to the UP position. The UP position is where the upper end of the holding pin 172 is higher than the top of the base 181.

接著,如圖11(c)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151下降至修正位置來將基板W載置在保持銷172上。修正位置係墊片151b從基板W下面離開的位置,且為塊體部151c上面會較基板W上面要高的位置。Next, as shown in Figure 11(c), the device controller 30 controls the substrate conveying mechanism 15 to place the substrate W on the retaining pin 172 by lowering the pick-up member 151 to the corrected position. The corrected position is the position where the pad 151b leaves the substrate W from below, and the position where the block portion 151c is higher than the substrate W.

接著,如圖11(d)所示,裝置控制器30會控制基板搬送機構15,藉由使位於修正位置之拾取件151往進入方向移動第1距離來將塊體部151c的按壓面151d抵接按壓於基板W端部。藉此,基板W便會在保持銷172上滑動,基板W之塊體部151c一側之邊會與按壓面151d成為平行。第1距離可為例如30mm。Next, as shown in Figure 11(d), the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151, which is in the corrected position, in the infeed direction by a first distance, so that the pressing surface 151d of the block portion 151c abuts against the end of the substrate W. Thereby, the substrate W slides on the retaining pin 172, and one side of the block portion 151c of the substrate W becomes parallel to the pressing surface 151d. The first distance can be, for example, 30 mm.

接著,如圖12(a)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151往後退方向移動第2距離來使塊體部151c的按壓面151d從基板W端部離開。藉此,基板W對於拾取件151在第1方向的定位便會結束。第1方向係拾取件151的進退方向。第2距離可為例如20mm。Next, as shown in Figure 12(a), the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151 backward by a second distance, causing the pressing surface 151d of the block portion 151c to separate from the end of the substrate W. This completes the positioning of the substrate W relative to the pickup 151 in the first direction. The first direction is the forward and backward direction of the pickup 151. The second distance can be, for example, 20 mm.

接著,如圖12(b)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151上昇至UP位置而以墊片151b來保持保持銷172上所載置的基板W。UP位置係基板W下面從保持銷172離開的位置。Next, as shown in Figure 12(b), the device controller 30 controls the substrate transport mechanism 15 to hold the substrate W placed on the holding pin 172 by raising the pick-up member 151 to the UP position and using the pad 151b. The UP position is the position where the substrate W is below the holding pin 172.

接著,如圖12(c)所示,裝置控制器30會控制致動器174,使基座171下降至DOWN位置。DOWN位置係保持銷172上端會較台座181上面要低的位置。Next, as shown in Figure 12(c), the device controller 30 controls the actuator 174 to lower the base 171 to the DOWN position. The DOWN position is such that the upper end of the holding pin 172 is lower than the upper end of the base 181.

接著,如圖12(d)所示,裝置控制器30會控制基板搬送機構15,使拾取件151移動以使拾取件151(基板W)之中心會在拾取件151的進退方向上與旋轉台18的中心一致。Next, as shown in Figure 12(d), the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151 so that the center of the pickup 151 (substrate W) is aligned with the center of the rotary table 18 in the forward and backward direction of the pickup 151.

接著,如圖13(a)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151下降至DOWN位置來將基板W載置於台座181上。DOWN位置係墊片151b從基板W下面離開的位置。Next, as shown in Figure 13(a), the device controller 30 controls the substrate conveying mechanism 15 to place the substrate W on the platform 181 by lowering the pick-up member 151 to the DOWN position. The DOWN position is the position where the pad 151b moves away from under the substrate W.

接著,如圖13(a)所示,裝置控制器30會控制旋轉台18,藉由在以吸附墊181a來吸附保持有基板W之狀態下使台座181旋轉90°,以使該基板W旋轉90°。另外,裝置控制器30係在使該基板W旋轉90°後會控制旋轉台18來停止吸附墊181a所致之吸附。Next, as shown in Figure 13(a), the device controller 30 controls the rotary table 18 to rotate the table 181 by 90° while the substrate W is held in place by the adsorption pad 181a, thereby rotating the substrate W by 90°. Furthermore, after rotating the substrate W by 90°, the device controller 30 controls the rotary table 18 to stop the adsorption caused by the adsorption pad 181a.

接著,如圖13(c)所示,裝置控制器30會控制基板搬送機構15,藉由使拾取件151上昇至UP位置而以墊片151b來保持台座181上所載置的基板W。UP位置係基板W下面從台座181離開的位置。Next, as shown in Figure 13(c), the device controller 30 controls the substrate conveying mechanism 15 to hold the substrate W placed on the platform 181 by raising the pick-up member 151 to the UP position and using the pad 151b. The UP position is the position where the substrate W is below the platform 181.

接著,裝置控制器30會控制基板搬送機構15,使拾取件151移動以使旋轉90°後的基板W之中心會在拾取件151的進退方向上與定位台17的中心一致。接著,如圖11(a)~圖11(d)及圖12(a)~圖12(c)所示,裝置控制器30係會以與基板W對於拾取件151在第1方向的定位相同之方法來進行基板W對於拾取件151在與第1方向正交之第2方向的定位。Next, the device controller 30 controls the substrate conveying mechanism 15 to move the pickup 151 so that the center of the substrate W after rotating 90° is aligned with the center of the positioning stage 17 in the forward and backward direction of the pickup 151. Then, as shown in Figures 11(a) to 11(d) and Figures 12(a) to 12(c), the device controller 30 positions the substrate W relative to the pickup 151 in a second direction orthogonal to the first direction in the same way as it positions the substrate W relative to the pickup 151 in the first direction.

根據以上說明,裝載部10便會結束檢查前的基板W對於拾取件151在第1方向及第2方向的定位。Based on the above description, the loading unit 10 will complete the positioning of the pickup 151 by the substrate W in the first and second directions before inspection.

此外,上述變形例中,雖然說明了定位台17之保持銷172相對於旋轉台18之台座181係昇降自如的情形,但本揭露並不限於此。例如,也可以是旋轉台18之台座181相對於定位台17之保持銷172係昇降自如。另外,也可以是定位台17之保持銷172與旋轉台18之台座181的兩者係昇降自如。Furthermore, although the above-described variation illustrates that the retaining pin 172 of the positioning stage 17 can be freely raised and lowered relative to the base 181 of the rotary stage 18, this disclosure is not limited to this. For example, the base 181 of the rotary stage 18 could also be freely raised and lowered relative to the retaining pin 172 of the positioning stage 17. Alternatively, both the retaining pin 172 of the positioning stage 17 and the base 181 of the rotary stage 18 could be freely raised and lowered.

此外,上述實施形態中,裝置控制器30係控制部的一例。Furthermore, in the above embodiment, the device controller 30 is an example of a control unit.

應認為本次所揭露之實施形態在所有方面皆為範例而非用來加以限制。上述實施形態在不脫離申請專利範圍及其要旨的範圍內也能以各種形態來加以省略、置換、或變更。The embodiments disclosed herein should be considered as exemplars in all respects rather than limitations. The aforementioned embodiments can be omitted, substituted, or modified in various forms without departing from the scope and intent of the patent application.

上述實施形態中,雖然以檢查裝置1為範例來加以說明,但本揭露並不限於此。亦可取代檢查裝置1而應用在會在基板W形成膜的成膜裝置、會蝕刻基板W上所形成之膜的蝕刻裝置等其他的處理裝置。Although the above embodiments are illustrated using inspection device 1 as an example, this disclosure is not limited thereto. It can also be used in other processing devices such as film forming devices that form films on substrate W, etching devices that etch films formed on substrate W, etc., instead of inspection device 1.

1:檢查裝置 12,17:定位台 13,18:旋轉台 15:基板搬送機構 151,152:拾取件 151c:塊體部 W:基板1: Inspection device 12, 17: Positioning stage 13, 18: Rotary table 15: Substrate conveying mechanism 151, 152: Pick-up parts 151c: Block section W: Substrate

圖1係顯示實施形態之檢查裝置的一例之前視圖。圖2係顯示實施形態之檢查裝置的一例之俯視圖。圖3係顯示裝載部的一例之圖。圖4係顯示拾取件的一例之圖。圖5係顯示定位台的一例之圖。圖6係顯示旋轉台的一例之圖。圖7係顯示實施形態之檢查方法的一例之流程圖。圖8係顯示定位基板之動作的一例之圖。圖9係顯示使基板旋轉之動作的一例之圖。圖10係顯示定位台及旋轉台的其他範例之圖。圖11係顯示定位基板之動作的其他範例之圖(1)。圖12係顯示定位基板之動作的其他範例之圖(2)。圖13係顯示定位基板之動作的其他範例之圖(3)。Figure 1 is a front view showing an example of an inspection apparatus in an embodiment. Figure 2 is a top view showing an example of an inspection apparatus in an embodiment. Figure 3 is a diagram showing an example of a loading unit. Figure 4 is a diagram showing an example of a pickup unit. Figure 5 is a diagram showing an example of a positioning stage. Figure 6 is a diagram showing an example of a rotary stage. Figure 7 is a flowchart showing an example of an inspection method in an embodiment. Figure 8 is a diagram showing an example of the operation of a positioning substrate. Figure 9 is a diagram showing an example of the operation of rotating the substrate. Figure 10 is a diagram showing other examples of a positioning stage and a rotary stage. Figure 11 is a diagram showing another example of the operation of a positioning substrate (1). Figure 12 is a diagram showing another example of the operation of a positioning substrate (2). Figure 13 is a diagram showing another example of the operation of a positioning substrate (3).

151:拾取件 151a:基台 151b:墊片 151c:塊體部 151d:按壓面 W:基板151: Pick-up component 151a: Base 151b: Pad 151c: Block part 151d: Pressing surface W: Substrate

Claims (14)

一種基板處理裝置,係具有:搬送機構,係搬送矩形的基板;定位台,係載置由該搬送機構所搬送之該基板以進行該基板的定位;以及旋轉台,係使在該定位台上已進行第1方向的定位後的該基板旋轉以進行與該第1方向正交的第2方向之定位;該定位台係包含以上端來將該基板保持成滑動自如的多個保持銷;該搬送機構係包含會按壓該定位台的該多個保持銷上所載置之該基板的端部以進行該基板的定位之塊體部。A substrate processing apparatus includes: a conveying mechanism for conveying a rectangular substrate; a positioning stage for positioning the substrate conveyed by the conveying mechanism; and a rotating stage for rotating the substrate, which has been positioned in a first direction on the positioning stage, to position it in a second direction orthogonal to the first direction; the positioning stage includes a plurality of retaining pins at its upper end to hold the substrate in a freely sliding manner; the conveying mechanism includes a block portion that presses the end of the substrate placed on the plurality of retaining pins of the positioning stage to position the substrate. 如申請專利範圍第1項之基板處理裝置,其係具有構成為會執行下述步驟的控制部;將該基板載置於該定位台,藉由以該塊體部來按壓該基板的端部以進行該基板在該第1方向之定位的步驟;將已進行該第1方向的定位之該基板載置於該旋轉台並使其旋轉90°的步驟;以及將已旋轉90°的該基板載置於該定位台,藉由以該塊體部來按壓該基板的端部以進行該基板在該第2方向之定位的步驟。The substrate processing apparatus of claim 1 includes a control unit configured to perform the following steps: placing the substrate on the positioning stage and positioning the substrate in the first direction by pressing the end of the substrate with the block portion; placing the substrate positioned in the first direction on the rotary table and rotating it by 90°; and placing the substrate rotated by 90° on the positioning stage and positioning the substrate in the second direction by pressing the end of the substrate with the block portion. 如申請專利範圍第1或2項之基板處理裝置,其中該塊體部係設在該搬送機構之拾取件的基端。For example, in the substrate processing apparatus of claim 1 or 2, the block portion is disposed at the base of the pick-up component of the conveying mechanism. 如申請專利範圍第3項之基板處理裝置,其中該塊體部係具有會與該拾取件的進退方向正交並按壓該基板的端部之按壓面。For example, in the substrate processing apparatus of claim 3, the block portion has a pressing surface that is orthogonal to the forward and backward direction of the pickup and presses the end of the substrate. 如申請專利範圍第3項之基板處理裝置,其中該拾取件係包含會保持該基板的多個墊片。For example, in the substrate processing apparatus of claim 3, the pickup includes multiple pads that hold the substrate. 如申請專利範圍第5項之基板處理裝置,其中該多個墊片係包含能夠獨立吸引的至少2個吸附墊。For example, in the substrate processing apparatus of claim 5, the plurality of pads includes at least two adsorption pads that can attract independently. 如申請專利範圍第3項之基板處理裝置,其係具有:匣盒,係收納該基板;以及位置檢測感應器,係設在會使該拾取件將該基板收納至該匣盒的搬送路徑上,並檢測該拾取件所保持之該基板的位置。The substrate processing apparatus of claim 3 includes: a cassette for storing the substrate; and a position detection sensor disposed on a transport path that causes the pickup to store the substrate in the cassette and detects the position of the substrate held by the pickup. 如申請專利範圍第1或2項之基板處理裝置,其中該定位台係包含形成為板狀的底座;該多個保持銷係從該底座往上方突出。For example, in the substrate processing apparatus of claim 1 or 2, the positioning stage includes a base formed in the shape of a plate; the plurality of retaining pins protrude upward from the base. 如申請專利範圍第8項之基板處理裝置,其中該定位台係包含會使該底座昇降的昇降機構。For example, in the substrate processing apparatus of claim 8, the positioning stage includes a lifting mechanism that raises the base. 如申請專利範圍第1或2項之基板處理裝置,其中該定位台係設在該旋轉台的上方或下方。For example, in the substrate processing apparatus of claim 1 or 2, the positioning stage is located above or below the rotary table. 如申請專利範圍第1或2項之基板處理裝置,其中該定位台係會與該旋轉台作為一體來加以設置。For example, in the substrate processing apparatus of claim 1 or 2, the positioning stage is integrated with the rotary table. 如申請專利範圍第1或2項之基板處理裝置,其中該基板係在該處理裝置中被施予處理前之基板及在該處理裝置中被施予處理後之基板的至少任一者。The substrate processing apparatus of claim 1 or 2, wherein the substrate is at least one of the substrate before being processed in the processing apparatus and the substrate after being processed in the processing apparatus. 如申請專利範圍第12項之基板處理裝置,其中該處理係檢查該基板的處理。Such as the substrate processing apparatus in claim 12, wherein the processing is the processing of inspecting the substrate. 一種基板定位方法,係具有:使搬送機構搬送矩形的基板並將該基板載置在定位台的多個保持銷上的步驟;藉由以設在該搬送機構的塊體部來按壓該定位台的該多個保持銷上所載置的該基板的端部以使該基板在該多個保持銷上滑動來進行該基板在第1方向之定位的步驟;將已進行該第1方向的定位之該基板載置於旋轉台並使其旋轉90°的步驟;以及由該搬送機構來搬送已旋轉90°的該基板並載置於該定位台的該多個保持銷上,藉由以該塊體部來按壓該基板的端部以使該基板在該多個保持銷上滑動來進行該基板在與該第1方向正交的第2方向之定位的步驟。A substrate positioning method comprises: a step of conveying a rectangular substrate by a conveying mechanism and placing the substrate on a plurality of retaining pins on a positioning stage; a step of positioning the substrate in a first direction by pressing the end of the substrate placed on the plurality of retaining pins on the positioning stage with a block portion provided on the conveying mechanism to make the substrate slide on the plurality of retaining pins; a step of placing the substrate, which has been positioned in the first direction, on a rotary table and rotating it by 90°; and a step of conveying the substrate, which has been rotated by 90°, by the conveying mechanism and placing it on the plurality of retaining pins on the positioning stage, and positioning the substrate in a second direction orthogonal to the first direction by pressing the end of the substrate with the block portion to make the substrate slide on the plurality of retaining pins.
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* Cited by examiner, † Cited by third party
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