TWI907311B - Laser package structure - Google Patents
Laser package structureInfo
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- TWI907311B TWI907311B TW114117761A TW114117761A TWI907311B TW I907311 B TWI907311 B TW I907311B TW 114117761 A TW114117761 A TW 114117761A TW 114117761 A TW114117761 A TW 114117761A TW I907311 B TWI907311 B TW I907311B
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Abstract
Description
本發明是關於一種雷射封裝結構,特別是關於一種具有整合光型之垂直共振腔面射雷射(Vertical Cavity Surface Emitting Laser,VCSEL)元件封裝結構。 This invention relates to a laser packaging structure, and more particularly to a packaging structure for a vertical cavity surface-emitting laser (VCSEL) element with an integrated beam pattern.
請參閱第1圖,習知雷射晶片110(例如垂直共振腔面射雷射(Vertical Cavity Surface Emitting Laser,VCSEL)元件)在封裝時係先將雷射晶片110固晶於陶瓷基板100上,進行打線形成線路120後,於雷射晶片110周圍設置間隔件(Spacer)130供形成區隔空間140,此區隔空間140係做空氣層(Air Layer)用。接著覆以光學元件150而完成單顆晶片的封裝製程,形成雷射晶片封裝結構10,供後續連接於外部電路板(圖中未示)。 Please refer to Figure 1. During the packaging process, the familiar laser chip 110 (e.g., a Vertical Cavity Surface Emitting Laser, VCSEL) is first die-bonded onto a ceramic substrate 100. After wire bonding to form wires 120, spacers 130 are placed around the laser chip 110 to form a separation space 140, which serves as an air layer. Then, optical components 150 are applied to complete the single-chip packaging process, forming the laser chip package structure 10, for subsequent connection to an external circuit board (not shown in the figure).
根據本發明之一實施例,一種雷射封裝結構包括:透明基板,其具有第一表面與第二表面;導電層,係設置於第一表面上;複數個雷射晶片,其係並列配置且其各出光面係面向第一表面,所述複數個雷射晶片係藉由膠層而接合於導電層;複數個光學元件,其與所述複數個雷射晶片相對應,係位於導電層與膠層之間、或位於透明基板之第二表面上;複數個電極組,係對 應地位於所述複數個雷射晶片的下表面上,所述複數個電極組係各包含第一電極與第二電極;以及第一導電柱與第二導電柱,其連接於導電層,係供該雷射封裝結構電性連接於外部電路板。 According to one embodiment of the present invention, a laser packaging structure includes: a transparent substrate having a first surface and a second surface; a conductive layer disposed on the first surface; a plurality of laser chips arranged side-by-side, each with its light-emitting surface facing the first surface, the plurality of laser chips being bonded to the conductive layer by an adhesive layer; a plurality of optical elements corresponding to the plurality of laser chips, located between the conductive layer and the adhesive layer, or located on the second surface of the transparent substrate; a plurality of electrode groups correspondingly disposed on the lower surfaces of the plurality of laser chips, each of the plurality of electrode groups including a first electrode and a second electrode; and a first conductive post and a second conductive post connected to the conductive layer, providing electrical connection of the laser packaging structure to an external circuit board.
10、20、20’、20”、20'''、30、30’、40、40’、50、50’、60、60’:雷射封裝結構 10, 20, 20’, 20”, 20’’’, 30, 30’, 40, 40’, 50, 50’, 60, 60’: Laser Packaging Structure
12、22、32、42、52、62:外部電路板 12, 22, 32, 42, 52, 62: External circuit boards
64:第一雷射元件 64: First Laser Element
66:第二雷射元件 66: Second laser element
100:陶瓷基板 100: Ceramic substrate
110:雷射晶片 110: Laser Chip
120:線路 120: Route
130:間隔件 130: Spacer
140:區隔空間 140: Separating Spaces
150:光學元件 150: Optical Components
202、302、402、502、602:第一雷射晶片 202, 302, 402, 502, 602: First laser chip
204、304、404、504、604:第二雷射晶片 204, 304, 404, 504, 604: Second laser chip
212、312、412、512、612、212’、312’、412’、512’、612’:第一電極 212, 312, 412, 512, 612, 212', 312', 412', 512', 612': First electrode
214、314、414、514、614、214’、314’、414’、514’、614’:第二電極 214, 314, 414, 514, 614, 214', 314', 414', 514', 614': Second electrode
216、316、416、516:共用電極 216, 316, 416, 516: Common electrode
210、220、320、420、520、620、675:膠層 210, 220, 320, 420, 520, 620, 675: Adhesive layer
230、330、430、632、634:透明基板 230, 330, 430, 632, 634: Transparent substrate
230A、330A、430A、530A、632A、634A:表面 230A, 330A, 430A, 530A, 632A, 634A: Surface
230B、330B、430B、530B、632B、634B:表面 230B, 330B, 430B, 530B, 632B, 634B: Surface
240、340、440、540、640:導電層 240, 340, 440, 540, 640: conductive layer
252、352、452、552、652:第一光學元件 252, 352, 452, 552, 652: First optical element
254、354、454、554、654:第二光學元件 254, 354, 454, 554, 654: Second optical element
262、362:第一導電柱 262, 362: first conductive pillar
264、364:第二導電柱 264, 364: Second conductive pillar
270、370、470、570:保護層 270, 370, 470, 570: Protective layer
380、480、580、680:間隔件 380, 480, 580, 680: Spacers
380A、480A、580A、680A:上表面 380A, 480A, 580A, 680A: Top surface
482、582、682:第一導電柱 482, 582, 682: first conductive pillar
484、584、684:第二導電柱 484, 584, 684: Second conductive pillar
385、485、585、685:區隔空間 385, 485, 585, 685: Spatial divisions
390、490、590、690:透明基板 390, 490, 590, 690: Transparent substrate
390A、490A、590A、690A:表面 390A, 490A, 590A, 690A: Surface
390B、490B、590B、690B:表面 390B, 490B, 590B, 690B: Surface
600:光學元件組合 600: Optical Component Assembly
5542、6542:基板 5542, 6542: Substrate
5544、6544:圖形部 5544, 6544: Graphics section
A:出光面方向/出光方向 A: Light emission surface direction/light emission direction
D1:第一距離 D1: First distance
D2:第二距離 D2: Second distance
為能更進一步瞭解本發明之特徵與技術內容,請參閱下述有關本發明實施例之詳細說明及如附圖式。惟所揭詳細說明及如附圖式係僅提供參考與說明之用,並非用以對本發明加以限制;其中:第1圖係習知雷射元件封裝結構的剖面示意圖。 To further understand the features and technical content of this invention, please refer to the following detailed description of embodiments of this invention and the accompanying drawings. However, the detailed description and accompanying drawings are provided for reference and illustration only and are not intended to limit the invention; wherein: Figure 1 is a schematic cross-sectional view of a conventional laser element package structure.
第2A圖與第2B圖係根據本發明第一實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 2A and 2B are schematic cross-sectional views of the laser packaging structure according to the first embodiment and variations of the present invention.
第2C圖與第2D圖係根據本發明第六實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 2C and 2D are schematic cross-sectional views of a laser packaging structure according to the sixth embodiment and variations of the present invention.
第3A圖與第3B圖係根據本發明第二實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 3A and 3B are schematic cross-sectional views of the laser packaging structure according to the second embodiment and variations of the present invention.
第4A圖與第4B圖係根據本發明第三實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 4A and 4B are schematic cross-sectional views of the laser packaging structure according to the third embodiment and variations of the present invention.
第5A圖與第5B圖係根據本發明第四實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 5A and 5B are schematic cross-sectional views of a laser packaging structure according to the fourth embodiment and variations of the present invention.
第6A圖與第6B圖係根據本發明第五實施例及其變化例之雷射封裝結構的剖面示意圖。 Figures 6A and 6B are schematic cross-sectional views of a laser packaging structure according to the fifth embodiment and variations of the present invention.
下文係參照圖式、並且以示例實施例說明本發明之概念,在圖式或說明中,相似或相同的部分係使用相同的元件符號;再者,圖式係為利於理解而繪製,圖式中各層之厚度與形狀並非元件之實際尺寸或成比例關係。需特別注意的是,圖式中未繪示、或說明書中未描述之元件,可為熟習發明所屬領域技藝之人士所知之形式。 The following description, with reference to the drawings and illustrative examples, illustrates the concepts of this invention. Similar or identical parts in the drawings and description use the same component symbols. Furthermore, the drawings are for ease of understanding; the thickness and shape of each layer in the drawings do not represent the actual dimensions or proportions of the components. It should be particularly noted that components not shown in the drawings or described in the specification are in a form familiar to those skilled in the art to which this invention pertains.
請參閱第2A圖與第2B圖,係根據本發明之第一實施例的雷射封裝結構之剖面示意圖。本實施例之雷射封裝結構20係以晶圓級封裝(WLP)製程所實現之具有整合光型的雷射封裝結構,亦即於單一封裝結構中將至少兩種光學元件整合至晶片上,這兩種光學元件可用以修飾通過的光線的光型,且這兩種光學元件對應於不同的光型。 Please refer to Figures 2A and 2B, which are schematic cross-sectional views of the laser package structure according to the first embodiment of the present invention. The laser package structure 20 of this embodiment is a laser package structure with integrated optical patterns implemented using a wafer-level packaging (WLP) process. That is, at least two optical elements are integrated onto a chip in a single package structure. These two optical elements can be used to modify the optical pattern of the transmitted light, and these two optical elements correspond to different optical patterns.
本實施例之雷射封裝結構20包括:一第一雷射晶片202與一第二雷射晶片204以發出雷射光,第一雷射晶片202與第二雷射晶片204具有一出光面(出光方向係如圖中箭頭A所示)與背向出光面的一下表面。第一雷射晶片202在其下表面上係各具有由第一電極212與第二電極214所構成之電極組,以形成對外的電性連接(即電連接於一外部電路板22),第二雷射晶片204在其下表面上係各具有由第一電極212’與第二電極214’所構成之電極組,以形成對外的電性連接。在此實施例中,第一電極212與第二電極214分別為n電極與p電極,但於其他實施例中,第一電極212與第二電極214也可分別為p電極與n電極,端視第一電極212與第二電極214對應於第一雷射晶片202的p半導體層或是n半導體層。在此實施例中,第一電極212’與第二電極214’分別為p電極與n電 極,但於其他實施例中,第一電極212’與第二電極214’也可分別為例如n電極與p電極。各第一電極與第二電極所對應的極性端視於封裝結構的實際設計而定,而不以所舉之例為限。 The laser package structure 20 of this embodiment includes a first laser chip 202 and a second laser chip 204 for emitting laser light. The first laser chip 202 and the second laser chip 204 have a light-emitting surface (the light emission direction is shown by arrow A in the figure) and a lower surface opposite to the light-emitting surface. The first laser chip 202 has an electrode group composed of a first electrode 212 and a second electrode 214 on its lower surface to form an external electrical connection (i.e., an electrical connection to an external circuit board 22). The second laser chip 204 has an electrode group composed of a first electrode 212' and a second electrode 214' on its lower surface to form an external electrical connection. In this embodiment, the first electrode 212 and the second electrode 214 are n-electrodes and p-electrodes, respectively. However, in other embodiments, the first electrode 212 and the second electrode 214 may also be p-electrodes and n-electrodes, depending on whether the first electrode 212 and the second electrode 214 correspond to the p-semiconductor layer or the n-semiconductor layer of the first laser chip 202. In this embodiment, the first electrode 212' and the second electrode 214' are p-electrodes and n-electrodes, respectively. However, in other embodiments, the first electrode 212' and the second electrode 214' may also be, for example, n-electrodes and p-electrodes. The polarity of each first and second electrode depends on the actual design of the package structure and is not limited to the examples given.
另一方面,以第一雷射晶片202來說,雖然在圖式上僅繪示出第一雷射晶片202具有一個第一電極212與一個第二電極214,但是第一雷射晶片202也可以具有多個第一電極212或多個第二電極214;另外第一電極212的大小與第二電極214的大小與形狀可以是相同或是不同,而不以圖式為限。 On the other hand, regarding the first laser chip 202, although the diagram only shows the first laser chip 202 having one first electrode 212 and one second electrode 214, the first laser chip 202 may also have multiple first electrodes 212 or multiple second electrodes 214; furthermore, the size and shape of the first electrode 212 and the second electrode 214 may be the same or different, and are not limited to the diagram.
更具體地以第一雷射晶片202為例,第一雷射晶片202包括有一半導體疊層,半導體疊層包括由下而上依序排列的n型半導體層、活性層與p型半導體層。如前述地,第一電極212與第二電極214例如分別為n電極與p電極。第一電極212電性連接n型半導體層,第二電極214經由半導體疊層中的貫孔電性連接p型半導體層。在另一實施例中,第一雷射晶片202更包括至少二金屬層,分別設置於n型半導體層下與p型半導體層上,且分別電性連接n型半導體層與p型半導體層。前述的貫孔例如貫穿半導體疊層,第二電極214經由貫孔中設置的導電結構電性連接於p型半導體層上的金屬層,從而電性連接於p型半導體層;或者,前述的貫孔例如貫穿半導體疊層外側的保護層(未繪示),貫孔中的導電結構係從半導體疊層外側延伸而上,以電性連接p型半導體層。第二電極214對應的貫孔中例如設置有絕緣層,以避免第二電極214或對應的導電材料誤短路於第一雷射晶片202的p型半導體層與活性層。第二雷射晶片204的結構係相仿於第一雷射晶片202,在此不與重複贅述。 More specifically, taking a first laser chip 202 as an example, the first laser chip 202 includes a semiconductor stack, which includes an n-type semiconductor layer, an active layer, and a p-type semiconductor layer arranged sequentially from bottom to top. As mentioned above, the first electrode 212 and the second electrode 214 are, for example, an n-type electrode and a p-type electrode, respectively. The first electrode 212 is electrically connected to the n-type semiconductor layer, and the second electrode 214 is electrically connected to the p-type semiconductor layer through a via in the semiconductor stack. In another embodiment, the first laser chip 202 further includes at least two metal layers, respectively disposed below the n-type semiconductor layer and above the p-type semiconductor layer, and respectively electrically connected to the n-type semiconductor layer and the p-type semiconductor layer. The aforementioned vias, for example, penetrate the semiconductor stack, and the second electrode 214 is electrically connected to the metal layer on the p-type semiconductor layer via a conductive structure disposed in the via, thereby being electrically connected to the p-type semiconductor layer; or, the aforementioned vias, for example, penetrate the protective layer (not shown) outside the semiconductor stack, and the conductive structure in the via extends upward from the outside of the semiconductor stack to electrically connect to the p-type semiconductor layer. For example, an insulating layer is disposed in the via corresponding to the second electrode 214 to prevent the second electrode 214 or the corresponding conductive material from accidentally short-circuiting between the p-type semiconductor layer and the active layer of the first laser chip 202. The structure of the second laser chip 204 is similar to that of the first laser chip 202, and will not be repeated here.
在第2A圖的實施例中,第一雷射晶片202與第二雷射晶片204相鄰的兩側面之間為空氣間隙,並沒有填入其他材料。在另一實施例中,第一雷 射晶片202與第二雷射晶片204的兩側面之間設置有絕緣材料,以隔離第一雷射晶片202與第二雷射晶片204,絕緣材料亦可作為支撐。更具體地來說,絕緣材料可以只覆蓋第一雷射晶片202與第二雷射晶片204的側壁而具有間隙;或者,絕緣材料也可以填滿第一雷射晶片202與第二雷射晶片204之間的空隙。第一雷射晶片202與第二雷射晶片204的出光面側藉由膠層220接合於一透明基板230,此透明基板230具有面向雷射晶片出光面的一表面230A、以及與表面230A相對的一表面230B。在本實施例中,透明基板230的表面230A上設有一導電層240,第一雷射晶片202與第二雷射晶片204係藉由膠層220而接合於透明基板230上的導電層240。導電層240可以包括一直線、一蜿蜒曲線、一經圖形化的導電線路或是一未經圖形化的導電層,在此不對導電線路的結構多做限制。 In the embodiment shown in Figure 2A, the space between the adjacent sides of the first laser chip 202 and the second laser chip 204 is an air gap, without any other material filling it. In another embodiment, an insulating material is provided between the two sides of the first laser chip 202 and the second laser chip 204 to isolate them; the insulating material can also serve as a support. More specifically, the insulating material may only cover the sidewalls of the first laser chip 202 and the second laser chip 204, leaving a gap; or, the insulating material may fill the gap between the first laser chip 202 and the second laser chip 204. The light-emitting surfaces of the first laser chip 202 and the second laser chip 204 are bonded to a transparent substrate 230 via an adhesive layer 220. This transparent substrate 230 has a surface 230A facing the light-emitting surface of the laser chips and a surface 230B opposite to surface 230A. In this embodiment, a conductive layer 240 is provided on surface 230A of the transparent substrate 230. The first laser chip 202 and the second laser chip 204 are bonded to the conductive layer 240 on the transparent substrate 230 via the adhesive layer 220. The conductive layer 240 may include a straight line, a curved line, a patterned conductive line, or an unpatterned conductive layer; the structure of the conductive line is not limited herein.
於圖2A所述的實施例中,雷射封裝結構20還包括第一光學元件252及第二光學元件254,如第2A圖所示,第一光學元件252及第二光學元件254係覆設於透明基板230的表面230B上,且係分別與第一雷射晶片202及第二雷射晶片204相對應。第一導電柱262與第二導電柱264連接於透明基板230之導電層240,形成雷射封裝結構20對外之電性連接。例如,第一導電柱262與第二導電柱264分別經由電極217、219電連接於一外部電路板22。 In the embodiment described in Figure 2A, the laser package structure 20 further includes a first optical element 252 and a second optical element 254. As shown in Figure 2A, the first optical element 252 and the second optical element 254 are disposed on the surface 230B of the transparent substrate 230 and correspond to the first laser chip 202 and the second laser chip 204, respectively. The first conductive post 262 and the second conductive post 264 are connected to the conductive layer 240 of the transparent substrate 230, forming an electrical connection between the laser package structure 20 and the outside world. For example, the first conductive post 262 and the second conductive post 264 are electrically connected to an external circuit board 22 via electrodes 217 and 219, respectively.
透明基板230係一透明絕緣材料,例如Glass、Sapphire、SiC、Si、GaAs。在一實施例中,導電層240之材料係包含透明導電材料,例如氧化銦錫(Indium Tin Oxide,ITO)、氧化鎵鋅(Gallium Zinc Oxide,GZO)、氧化銦鋅(Indium Zinc Oxide,IZO)、氧化銦鎵鋅(Indium Gallium Zinc Oxide,IGZO)等,以避免阻擋第一雷射晶片202及第二雷射晶片204射出的光束。在此實施例中,導電層240覆蓋表面230A的面積不小於表面230A的面積的百分之十 且不大於表面230A的面積的百分之七十。在另一實施例中,導電層240的材料包含金屬,並沿表面的外周緣環繞第一表面的部分區域,以避免阻礙元件出光。在此實施例中,導電層240覆蓋表面230A的面積不大於表面230A的面積的百分之二十。 The transparent substrate 230 is a transparent insulating material, such as glass, sapphire, SiC, Si, or GaAs. In one embodiment, the conductive layer 240 is made of a transparent conductive material, such as indium tin oxide (ITO), gallium zinc oxide (GZO), indium zinc oxide (IZO), or indium gallium zinc oxide (IGZO), to avoid blocking the light beams emitted from the first laser chip 202 and the second laser chip 204. In this embodiment, the conductive layer 240 covers an area of surface 230A that is not less than 10% and not more than 70% of the area of surface 230A. In another embodiment, the conductive layer 240 is made of a metal and surrounds a portion of the first surface along its outer periphery to avoid obstructing light emission from the element. In this embodiment, the conductive layer 240 covers an area of surface 230A that is no more than twenty percent of the area of surface 230A.
在本實施例中,第一光學元件252及第二光學元件254可為相同或不同的光學元件,且係選自於繞射式光學元件(Diffraction Optical Element,DOE)、微透鏡陣列(Micro Lens Array)、超透鏡(Metalens)、以及前述光學元件之組合,可將第一雷射晶片202與第二雷射晶片204各自射出的光束分別轉換為均勻的面光源、陣列點光源或不規則散佈的點光源。 In this embodiment, the first optical element 252 and the second optical element 254 can be the same or different optical elements, and are selected from diffraction optical elements (DOE), microlens arrays, metalens, and combinations of the aforementioned optical elements. This allows the light beams emitted from the first laser chip 202 and the second laser chip 204 to be converted into uniform surface light sources, arrayed point light sources, or irregularly distributed point light sources, respectively.
根據本發明實施例,第一光學元件252及第二光學元件254可為獨立於透明基板230與導電層240之元件,亦可直接由透明基板230經適當的製程而形成。舉例而言,可利用透明基板230以塗佈方式進行壓印(Nanoimprint),於基板表面(例如表面230B)上直接壓印出第一光學元件252及第二光學元件254之圖樣(Pattern);或者是,直接對透明基板230進行圖案化製程(例如蝕刻),直接以透明基板的表面(例如表面230B)本身形成第一光學元件252及第二光學元件254;或是在透明基板的表面(例如表面230B)形成表面鍍層,形成第一光學元件252及第二光學元件254,表面鍍層包括SiO2,SiNx,Al2O3,TiO2等光學薄膜適用之材料的至少其中之一。此外,在本實施例中,第一光學元件252與第二光學元件254係形成於或位於透明基板230的表面230B上;然而在其他實施例中,本發明之雷射封裝結構的光學元件亦可位於透明基板的表面230A側且位於導電層240上,亦即導電層240位於透明基板230與光學元件之間。 According to the embodiments of the present invention, the first optical element 252 and the second optical element 254 can be elements independent of the transparent substrate 230 and the conductive layer 240, or they can be formed directly from the transparent substrate 230 through an appropriate process. For example, the patterns of the first optical element 252 and the second optical element 254 can be directly imprinted on the surface of the transparent substrate 230 (e.g., surface 230B) by nanoimprinting; or, the transparent substrate 230 can be directly patterned (e.g., etched) to form the first optical element 252 and the second optical element 254 directly on the surface of the transparent substrate (e.g., surface 230B); or a surface plating layer can be formed on the surface of the transparent substrate (e.g., surface 230B) to form the first optical element 252 and the second optical element 254, and the surface plating layer includes at least one of the materials suitable for optical thin films such as SiO2, SiNx, Al2O3, and TiO2. Furthermore, in this embodiment, the first optical element 252 and the second optical element 254 are formed on or located on the surface 230B of the transparent substrate 230; however, in other embodiments, the optical elements of the laser package structure of the present invention may also be located on the surface 230A side of the transparent substrate and on the conductive layer 240, that is, the conductive layer 240 is located between the transparent substrate 230 and the optical element.
第一雷射晶片202與第二雷射晶片204可為獨立的雷射晶片,或由同一晶片依一預設間距(Pitch)切割而形成。藉由控制雷射晶片的排列,使得本發明之雷射封裝結構具有一整合光型,所述的整合光型係由一或多個光型所合成。藉此架構,設計者可以安排雷射封裝結構中的元件以調整出所欲的光型,克服過往雷射封裝結構的光型被單一晶片或單一光學元件決定的問題。在第2A圖所示實施例中,第一雷射晶片202與第二雷射晶片204係由一晶片依一定間距(Pitch)切割而形成。 The first laser chip 202 and the second laser chip 204 can be independent laser chips, or they can be formed by cutting a single chip at a predetermined pitch. By controlling the arrangement of the laser chips, the laser package structure of the present invention has an integrated optical pattern, which is a composite of one or more optical patterns. With this architecture, designers can arrange the components in the laser package structure to adjust the desired optical pattern, overcoming the problem that the optical pattern of previous laser package structures was determined by a single chip or a single optical element. In the embodiment shown in Figure 2A, the first laser chip 202 and the second laser chip 204 are formed by cutting a single chip at a predetermined pitch.
此外,如第2B圖所示之雷射封裝結構20’,第一雷射晶片202與第二雷射晶片204並未被完全分開。在此實施例中,第一雷射晶片202與第二雷射晶片204都經由共用電極216電性連接外部電子裝置。更具體地來說,共用電極216對應於前述p電極,而第一雷射晶片202與第二雷射晶片204分別具有第一電極212、212’以作為前述的n電極。在一實施例中,第一雷射晶片202與第二雷射晶片204分別具有金屬導電層,且兩金屬導電層彼此相連。此二金屬導電層可以是同一金屬導電層。金屬導電層電性連接第一雷射晶片202的p型半導體層與第二雷射晶片204的p型半導體層,且部分的金屬導電層係暴露於第一雷射晶片202與第二雷射晶片204之間的間隙。間隙中設置有導電結構,導電結構電性連接於共用電極216與金屬導電層之間。導電結構與共用電極可以是由同一道製程所形成或是不同製程所形成,在此並不加以限制。藉此,共用電極經由金屬導電層分別電性連接第一雷射晶片202與第二雷射晶片204的p型半導體層。在第2B圖中,為了避免圖式紊亂,並不對第一雷射晶片202與第二雷射晶片204的具體結構多做贅述,係簡要地以示意圖表示第一雷射晶片202與第二雷射晶片204之間有相連的部分,相連的部分可以是如前述的金屬導電層。 Furthermore, as shown in Figure 2B, in the laser package structure 20', the first laser chip 202 and the second laser chip 204 are not completely separated. In this embodiment, both the first laser chip 202 and the second laser chip 204 are electrically connected to an external electronic device via a common electrode 216. More specifically, the common electrode 216 corresponds to the aforementioned p electrode, and the first laser chip 202 and the second laser chip 204 each have first electrodes 212 and 212' as the aforementioned n electrode. In one embodiment, the first laser chip 202 and the second laser chip 204 each have a metal conductive layer, and the two metal conductive layers are interconnected. These two metal conductive layers may be the same metal conductive layer. A metal conductive layer is electrically connected to the p-type semiconductor layer of the first laser chip 202 and the p-type semiconductor layer of the second laser chip 204, and a portion of the metal conductive layer is exposed in the gap between the first laser chip 202 and the second laser chip 204. A conductive structure is disposed in the gap, and the conductive structure is electrically connected between the common electrode 216 and the metal conductive layer. The conductive structure and the common electrode can be formed by the same process or by different processes, which is not limited here. In this way, the common electrode is electrically connected to the p-type semiconductor layers of the first laser chip 202 and the second laser chip 204 respectively through the metal conductive layer. In Figure 2B, to avoid visual confusion, the specific structures of the first laser chip 202 and the second laser chip 204 are not described in detail. Instead, a simplified schematic diagram is used to show the interconnected portion between the first laser chip 202 and the second laser chip 204. This interconnected portion can be a metal conductive layer as described above.
請參照第2C圖與第2D圖,第2C圖與第2D圖係根據本發明第六實施例及其變化例之雷射封裝結構的剖面示意圖。第2C圖與第2D圖分別揭示了雷射封裝結構20”與雷射封裝結構20'''。雷射封裝結構20”與雷射封裝結構20'''的結構大致上相仿於前述的與雷射封裝結構20或與雷射封裝結構20’。相較於雷射封裝結構20,在雷射封裝結構20”中,膠層220係位於導電層240上。相較於雷射封裝結構20’,在雷射封裝結構20'''中,膠層220係位於導電層240上。 Please refer to Figures 2C and 2D, which are schematic cross-sectional views of the laser package structure according to the sixth embodiment and variations of the present invention. Figures 2C and 2D respectively illustrate laser package structure 20” and laser package structure 20'''. The structures of laser package structure 20” and laser package structure 20''' are generally similar to those of the aforementioned laser package structure 20 or laser package structure 20'. Compared to laser package structure 20, in laser package structure 20”, the adhesive layer 220 is located on the conductive layer 240. Compared to laser package structure 20', in laser package structure 20''', the adhesive layer 220 is located on the conductive layer 240.
與複數個雷射晶片(例如第一雷射晶片與第二雷射晶片)相對應的複數個光學元件可位於雷射封裝結構的透明基板的上或下表面,或由透明基板直接形成,從而形成整合光型的輸出。此外,考量製程的穩定性與效率,光學元件可位於雷射晶片的透明基板上,亦可利用晶片級封裝(Chip Scale Package,CSP)製程設於封裝結構上,如下述說明。 A plurality of optical elements corresponding to a plurality of laser chips (e.g., a first laser chip and a second laser chip) can be located on the upper or lower surface of the transparent substrate of the laser package structure, or formed directly from the transparent substrate, thereby forming an integrated light pattern output. Furthermore, considering process stability and efficiency, the optical elements can be located on the transparent substrate of the laser chips, or they can be placed on the package structure using a chip-scale package (CSP) process, as explained below.
請參閱第3A圖與第3B圖,係根據本發明之第二實施例的雷射封裝結構之剖面示意圖。本實施例之雷射封裝結構30包括並列配置的第一雷射晶片302與第二雷射晶片304以發出雷射光,第一雷射晶片302與第二雷射晶片304具有一出光面(出光方向係如圖中箭頭A所示)及背向出光面的一下表面,第一雷射晶片302與第二雷射晶片304在其下表面上係各具有由第一電極312、312’與第二電極314、314’所構成之電極組,以形成對外的電性連接(即電連接於一外部電路板32)。電極312、314、312’、314’的配置係相仿於電極212、214、212’、214’,相關細節於此不再重複贅述。在第3A圖的實施例中,第一雷射晶片202與第二雷射晶片204相鄰的兩側面之間為空氣間隙,並沒有填入其他材料。在另一實施例中,第一雷射晶片302與第二雷射晶片304的兩側面之間設置有絕緣材料,以隔離第一雷射晶片302與第二雷射晶片304,絕緣材料亦可作為 支撐。更具體地來說,絕緣材料可以只覆蓋第一雷射晶片302與第二雷射晶片304的側壁而具有間隙;或者,絕緣材料也可以填滿第一雷射晶片302與第二雷射晶片304之間的空隙。此透明基板330具有面向雷射晶片出光面的一表面330A、以及與表面330A相對且面向外的一表面330B。 Please refer to Figures 3A and 3B, which are schematic cross-sectional views of a laser package structure according to a second embodiment of the present invention. The laser package structure 30 of this embodiment includes a first laser chip 302 and a second laser chip 304 arranged side by side to emit laser light. The first laser chip 302 and the second laser chip 304 have a light-emitting surface (the light emission direction is shown by arrow A in the figure) and a lower surface opposite to the light-emitting surface. The first laser chip 302 and the second laser chip 304 each have an electrode group composed of first electrodes 312, 312' and second electrodes 314, 314' on their lower surfaces to form an external electrical connection (i.e., an electrical connection to an external circuit board 32). The configuration of electrodes 312, 314, 312', and 314' is similar to that of electrodes 212, 214, 212', and 214', and related details will not be repeated here. In the embodiment shown in Figure 3A, there is an air gap between the adjacent sides of the first laser chip 202 and the second laser chip 204, without any other material filling it. In another embodiment, an insulating material is provided between the two sides of the first laser chip 302 and the second laser chip 304 to isolate the first laser chip 302 and the second laser chip 304; the insulating material can also serve as a support. More specifically, the insulating material may only cover the sidewalls of the first laser wafer 302 and the second laser wafer 304, leaving a gap; or, the insulating material may fill the gap between the first laser wafer 302 and the second laser wafer 304. This transparent substrate 330 has a surface 330A facing the light-emitting surface of the laser wafer, and a surface 330B opposite to surface 330A and facing outwards.
在本實施例中,雷射封裝結構30進一步包括支撐件(Housing/Spacer)380圍繞前揭晶片結構而形成一區隔空間385,此區隔空間385係做雷射封裝結構30之空氣層(Air Layer)用,支撐件380具有位於雷射晶片出光面側之一上表面380A;支撐件380的上表面380A上覆有另一透明基板390。在一實施例中,支撐件380的材料包括至少一種的膠材。在另一實施例中,支撐件380的材料係選自由陶瓷、玻璃與塑料所組成的群組。上述的材料選擇僅為舉例說明,但實際上並不以此為限。透明基板390具有面向雷射晶片出光面(出光方向係如圖中箭頭A所示)的表面390A、以及與表面390A相對且面向外的表面390B。在本實施例中,第一光學元件352及第二光學元件354係設於透明基板390的表面390A上,且係分別與第一雷射晶片302及第二雷射晶片304相對應。藉由調整支撐件380的高度,第一光學元件352與第一雷射晶片302之間的距離D1、以及第二光學元件354與第二雷射晶片304之間的距離D2被相應調整。 In this embodiment, the laser package structure 30 further includes a housing/spacer 380 forming a partition space 385 around the front-disclosure wafer structure. This partition space 385 serves as an air layer for the laser package structure 30. The housing/spacer 380 has an upper surface 380A located on the light-emitting surface side of the laser wafer. Another transparent substrate 390 is coated on the upper surface 380A of the housing/spacer 380. In one embodiment, the material of the housing/spacer 380 includes at least one type of adhesive. In another embodiment, the material of the housing/spacer 380 is selected from the group consisting of ceramics, glass, and plastics. The above material selection is merely illustrative and is not limited thereto. The transparent substrate 390 has a surface 390A facing the light-emitting surface of the laser wafer (the light emission direction is shown by arrow A in the figure), and a surface 390B facing outwards from surface 390A. In this embodiment, a first optical element 352 and a second optical element 354 are disposed on surface 390A of the transparent substrate 390, and correspond to the first laser wafer 302 and the second laser wafer 304, respectively. By adjusting the height of the support member 380, the distance D1 between the first optical element 352 and the first laser wafer 302, and the distance D2 between the second optical element 354 and the second laser wafer 304, are adjusted accordingly.
類似地,在本實施例中,第一雷射晶片302與第二雷射晶片304可為獨立的雷射晶片,或由同一晶片依一定間距(Pitch)切割而形成。藉由控制雷射晶片的排列,使得本發明之雷射封裝結構可具有整合光型。在第3A圖所示實施例中,第一雷射晶片302與第二雷射晶片304係經其並列配置且兩者側壁之間係由一晶片依一定間距(Pitch)切割而形成。在另一實施例中,第一雷射晶片302與第二雷射晶片304之間也可設置有保護層。此外,第一雷射晶片302 與第二雷射晶片304亦可透過電極的配置而使得兩雷射晶片共用其中一個共用電極316,形成如第3B圖所示之雷射封裝結構30’。共用電極316的相關細節係相仿於共用電極216,於此不再贅述。 Similarly, in this embodiment, the first laser chip 302 and the second laser chip 304 can be independent laser chips, or they can be formed by cutting the same chip at a certain pitch. By controlling the arrangement of the laser chips, the laser package structure of the present invention can have an integrated optical pattern. In the embodiment shown in Figure 3A, the first laser chip 302 and the second laser chip 304 are arranged side by side, and the sidewalls of the two are formed by cutting a single chip at a certain pitch. In another embodiment, a protective layer can also be provided between the first laser chip 302 and the second laser chip 304. In addition, the first laser chip 302 and the second laser chip 304 can also share a common electrode 316 through the arrangement of their electrodes, forming a laser package structure 30' as shown in Figure 3B. The details of the common electrode 316 are similar to those of the common electrode 216, and will not be repeated here.
請參閱第4A圖與第4B圖,係根據本發明之第三實施例的雷射封裝結構之剖面示意圖。整體觀之,根據本實施例之雷射封裝元件40包括第一雷射晶片402與第二雷射晶片404,其下表面分別設有包含第一電極412(例如p電極)與第二電極414(例如n電極)之電極組供第一雷射晶片402與第二雷射晶片404對外部之電性連接(即連接於一外部電路板42),且係藉由膠層420接合於一透明基板430。電極412、414、412’、414’的配置係相仿於電極212、214、212’、214’,相關細節於此不再重複贅述。透明基板430具有相對的表面430A及表面430B,其中表面430A面向第一雷射晶片402與第二雷射晶片404的出光面。 Please refer to Figures 4A and 4B, which are schematic cross-sectional views of the laser package structure according to the third embodiment of the present invention. Overall, the laser package element 40 according to the present embodiment includes a first laser chip 402 and a second laser chip 404. The lower surfaces of the two laser chips are respectively provided with electrode groups including a first electrode 412 (e.g., a p electrode) and a second electrode 414 (e.g., an n electrode) for electrical connection of the first laser chip 402 and the second laser chip 404 to the outside (i.e., connection to an external circuit board 42), and are bonded to a transparent substrate 430 by an adhesive layer 420. The configuration of electrodes 412, 414, 412', and 414' is similar to that of electrodes 212, 214, 212', and 214'; related details will not be repeated here. The transparent substrate 430 has opposing surfaces 430A and 430B, wherein surface 430A faces the light-emitting surfaces of the first laser chip 402 and the second laser chip 404.
類似地,在本實施例中,雷射封裝結構40進一步包括支撐件(Housing/Spacer)480圍繞前揭晶片結構而形成一區隔空間485,此區隔空間485係做雷射封裝結構40之空氣層(Air Layer)用,支撐件480具有位於雷射晶片出光面側之一上表面480A;支撐件480的上表面480A上覆有另一透明基板490。透明基板490具有面向雷射晶片出光面的表面490A、以及與表面490A相對且面向外的表面490B。在本實施例中,第一光學元件452及第二光學元件454係設於透明基板490的表面490A上,且係分別與第一雷射晶片402及第二雷射晶片404相對應。在一實施例中,支撐件480的材料包括至少一種的膠材。在另一實施例中,支撐件480的材料係選自由陶瓷、玻璃與塑料所組成的群組。上述的材料選擇僅為舉例說明,但實際上並不以此為限。 Similarly, in this embodiment, the laser package structure 40 further includes a housing/spacer 480 forming a partition space 485 around the front-disclosure wafer structure. This partition space 485 serves as an air layer for the laser package structure 40. The housing/spacer 480 has an upper surface 480A located on the side of the laser wafer's light-emitting surface. Another transparent substrate 490 is covered on the upper surface 480A of the housing/spacer 480. The transparent substrate 490 has a surface 490A facing the light-emitting surface of the laser wafer and an outward-facing surface 490B opposite to surface 490A. In this embodiment, the first optical element 452 and the second optical element 454 are disposed on the surface 490A of the transparent substrate 490 and correspond to the first laser wafer 402 and the second laser wafer 404, respectively. In one embodiment, the material of the support member 480 includes at least one type of adhesive. In another embodiment, the material of the support member 480 is selected from the group consisting of ceramics, glass, and plastics. The above material selection is merely illustrative and is not limited thereto.
本實施例之雷射封裝結構40與前述雷射封裝結構30具有類似的構成,惟其與雷射封裝結構30之差異在於,在本實施例中,導電層440係位於設有第一光學元件452及第二光學元件454的透明基板490上,且圍繞雷射晶片周圍而形成區隔空間485的支撐件480係包括有貫穿其間的導電結構,例如第一導電柱482與第二導電柱484,亦即形成一導電性支撐件。藉由導電層440連接第一導電柱482及第二導電柱484,使得雷射封裝結構40可經由此導電性支撐件而與外部電性連接,即電連接於一外部電路板42。第一導電柱482的周圍或第二導電柱484的周圍可以設置有絕緣層,以避免第一導電柱482或第二導電柱484電性連接錯誤的地方。 The laser package structure 40 of this embodiment has a similar configuration to the aforementioned laser package structure 30. However, the difference lies in the fact that, in this embodiment, the conductive layer 440 is located on the transparent substrate 490 on which the first optical element 452 and the second optical element 454 are disposed. The support member 480 that forms the partition space 485 around the laser chip includes a conductive structure passing through it, such as the first conductive post 482 and the second conductive post 484, that is, it forms a conductive support member. By connecting the first conductive post 482 and the second conductive post 484 through the conductive layer 440, the laser package structure 40 can be electrically connected to the outside through this conductive support member, that is, electrically connected to an external circuit board 42. An insulating layer may be provided around the first conductive post 482 or the second conductive post 484 to prevent electrical connection errors in either post.
類似地,在第4A圖所示實施例中,第一雷射晶片402與第二雷射晶片404係經其並列配置且兩者側壁之間係由一晶片依一定間距(Pitch)切割而形成。在此實施例中,第一雷射晶片402與第二雷射晶片404之間以空氣相間隔。在另一實施例中,且於切割道中可設置有保護層,保護層可以填滿或不填滿切割道。此外,第一雷射晶片402與第二雷射晶片404亦可透過電極的配置而使得兩雷射晶片共用其中一個共用電極416。共用電極416的相關細節係相仿於共用電極216,於此不再贅述。 Similarly, in the embodiment shown in Figure 4A, the first laser chip 402 and the second laser chip 404 are arranged side-by-side, and their sidewalls are formed by cutting a single chip at a certain pitch. In this embodiment, the first laser chip 402 and the second laser chip 404 are separated by air. In another embodiment, a protective layer may be provided in the dicing channel, which may or may not completely fill the channel. Furthermore, the first laser chip 402 and the second laser chip 404 can also share a common electrode 416 through the arrangement of their electrodes. The relevant details of the common electrode 416 are similar to those of the common electrode 216 and will not be described again here.
請參閱第5A圖與第5B圖,係根據本發明之第四實施例的雷射封裝結構之剖面示意圖。整體觀之,根據本實施例之雷射封裝元件50包括第一雷射晶片502與第二雷射晶片504,其下表面分別設有包含第一電極512(例如p電極)與第二電極514(例如n電極)之電極組供雷射晶片502、504對外部之電性連接(即連接於一外部電路板52),且係藉由膠層520接合於一透明基板530。電極512、514、512’、514’的配置係相仿於電極212、214、212’、214’,相關細 節於此不再重複贅述。透明基板530具有相對的表面530A及表面530B,其中表面530A面向第一雷射晶片502與第二雷射晶片504的出光面。 Please refer to Figures 5A and 5B, which are schematic cross-sectional views of the laser package structure according to the fourth embodiment of the present invention. Overall, the laser package element 50 according to this embodiment includes a first laser chip 502 and a second laser chip 504. The lower surfaces of these chips are respectively provided with electrode groups including a first electrode 512 (e.g., a p-electrode) and a second electrode 514 (e.g., an n-electrode) for electrical connection of the laser chips 502 and 504 to the outside (i.e., connection to an external circuit board 52), and are bonded to a transparent substrate 530 by an adhesive layer 520. The arrangement of electrodes 512, 514, 512', and 514' is similar to that of electrodes 212, 214, 212', and 214'; related details will not be repeated here. The transparent substrate 530 has opposing surfaces 530A and 530B, wherein surface 530A faces the light-emitting surfaces of the first laser wafer 502 and the second laser wafer 504.
類似地,在本實施例中,雷射封裝結構50進一步包括支撐件(Housing/Spacer)580圍繞前揭晶片結構而形成一區隔空間585,此區隔空間542係做雷射封裝結構50之空氣層(Air Layer)用,支撐件580具有位於雷射晶片出光面側之一上表面580A;支撐件580的上表面580A上覆有另一透明基板590。透明基板590具有面向雷射晶片出光面的表面590A、以及與表面590A相對且面向外的表面590B。第一光學元件552及第二光學元件554係設於透明基板590的表面590A上,且係分別與第一雷射晶片502及第二雷射晶片504相對應。在本實施例中,導電層540係位於設有第一光學元件552及第二光學元件554的透明基板590上,且圍繞雷射晶片周圍而形成區隔空間585的支撐件580係包括有貫穿其間的導電結構,例如第一導電柱582與第二導電柱584,亦即形成一導電性支撐件。藉由導電層540連接第一導電柱582及第二導電柱584,使得雷射封裝結構50可經由此導電性支撐件而與外部電性連接,即電連接於一外部電路板52。第一導電柱582的周圍或第二導電柱584的周圍可以設置有絕緣層,以避免第一導電柱582或第二導電柱584電性連接錯誤的結構。在一實施例中,支撐件580的材料包括至少一種的膠材。在另一實施例中,支撐件580的材料係選自由陶瓷、玻璃與塑料所組成的群組。上述的材料選擇僅為舉例說明,但實際上並不以此為限。 Similarly, in this embodiment, the laser package structure 50 further includes a housing/spacer 580 forming a partition space 585 around the front-disclosure wafer structure. This partition space 542 serves as an air layer for the laser package structure 50. The housing/spacer 580 has an upper surface 580A located on the side of the laser wafer's light-emitting surface. Another transparent substrate 590 is covered on the upper surface 580A of the housing/spacer 580. The transparent substrate 590 has a surface 590A facing the light-emitting surface of the laser wafer and an outward-facing surface 590B opposite to surface 590A. A first optical element 552 and a second optical element 554 are disposed on surface 590A of the transparent substrate 590 and correspond to the first laser wafer 502 and the second laser wafer 504, respectively. In this embodiment, the conductive layer 540 is located on the transparent substrate 590 on which the first optical element 552 and the second optical element 554 are disposed, and the support member 580 that forms the partition space 585 around the laser chip includes a conductive structure passing through it, such as the first conductive post 582 and the second conductive post 584, that is, forming a conductive support member. By connecting the first conductive post 582 and the second conductive post 584 through the conductive layer 540, the laser package structure 50 can be electrically connected to the outside through this conductive support member, that is, electrically connected to an external circuit board 52. An insulating layer may be provided around the first conductive post 582 or the second conductive post 584 to prevent incorrect electrical connection of the first conductive post 582 or the second conductive post 584. In one embodiment, the material of the support member 580 includes at least one type of adhesive. In another embodiment, the material of the support member 580 is selected from the group consisting of ceramics, glass, and plastics. The above material selection is merely illustrative and is not limited thereto.
本實施例之雷射封裝結構50具有與前述雷射封裝結構40類似的構成,惟其與雷射封裝結構40之差異在於,在本實施例中,第二光學元件554係由一透明基板5542以及形成於透明基板5542上的光學元件圖形部5544所構 成。藉由調整透明基板5542的厚度,即可相應地調整第二光學元件554與第二雷射晶片504之間的距離D2,使其不同於第一光學元件552與第一雷射晶片502之間的距離D1;其中,距離D1和距離D2的選擇,係依第一光學元件552與第二光學元件554的作用而定。 The laser package structure 50 of this embodiment has a similar structure to the aforementioned laser package structure 40, except that in this embodiment, the second optical element 554 is composed of a transparent substrate 5542 and an optical element pattern portion 5544 formed on the transparent substrate 5542. By adjusting the thickness of the transparent substrate 5542, the distance D2 between the second optical element 554 and the second laser chip 504 can be adjusted accordingly, making it different from the distance D1 between the first optical element 552 and the first laser chip 502; wherein the selection of distances D1 and D2 depends on the function of the first optical element 552 and the second optical element 554.
,在本實施例中,第一光學元件552係一繞射式光學元件(Diffractive Optical Element,DOE),第二光學元件554係一微透鏡陣列(Microlens Array,MLA),其表面係形成有各別的圖形部,且彼此獨立不受影響而分別與第一雷射晶片502及第二雷射晶片504相對應。在本實施例中,第一光學元件552與其對應的第一雷射晶片502係相距一第一距離D1,第二光學元件554與其對應的第二雷射晶片504係相距一第二距離D2;其中第一距離D1與第一光學元件552的焦距有關,第二距離D2則因第二光學元件554之透明基板5542的厚度而小於第一距離D1。舉例而言,在一實施例中,第一距離D1係DOE之焦距長且需達2.2mm以上;第二距離D2則可視情況藉由透明基板5542的厚度作調整,惟其係小於第一距離D1且達0.5mm以上。 In this embodiment, the first optical element 552 is a diffractive optical element (DOE), and the second optical element 554 is a microlens array (MLA). Each MLA has a separate pattern formed on its surface, and these patterns are independent and unaffected by each other, corresponding to the first laser chip 502 and the second laser chip 504, respectively. In this embodiment, the first optical element 552 and its corresponding first laser chip 502 are separated by a first distance D1, and the second optical element 554 and its corresponding second laser chip 504 are separated by a second distance D2. The first distance D1 is related to the focal length of the first optical element 552, while the second distance D2 is smaller than the first distance D1 due to the thickness of the transparent substrate 5542 of the second optical element 554. For example, in one embodiment, the first distance D1 is the focal length of the DOE and must be at least 2.2 mm; the second distance D2 can be adjusted by the thickness of the transparent substrate 5542, but it must be less than the first distance D1 and at least 0.5 mm.
類似地,在第5A圖所示實施例中,第一雷射晶片502與第二雷射晶片504係經其並列配置且兩者側壁之間係由一晶片依一定間距(Pitch)切割而形成。在此實施例中,第一雷射晶片502與第二雷射晶片504之間以空氣相間隔。在另一實施例中,切割道中可設置有保護層,保護層可以填滿或不填滿切割道。此外,第一雷射晶片502與第二雷射晶片504亦可透過電極的配置而使得兩雷射晶片共用其中一個共用電極516。共用電極516的相關細節係相仿於共用電極216,於此不再贅述。 Similarly, in the embodiment shown in Figure 5A, the first laser wafer 502 and the second laser wafer 504 are arranged side-by-side, and their sidewalls are formed by cutting a wafer at a certain pitch. In this embodiment, the first laser wafer 502 and the second laser wafer 504 are separated by air. In another embodiment, a protective layer may be provided in the dicing channel, which may or may not fill the dicing channel. Furthermore, the first laser wafer 502 and the second laser wafer 504 can also share a common electrode 516 through the arrangement of their electrodes. The relevant details of the common electrode 516 are similar to those of the common electrode 216 and will not be described again here.
請參閱第6A圖與第6B圖,係根據本發明之五實施例的雷射封裝結構之剖面示意圖。本實施例之雷射封裝結構60與前述實施例之雷射封裝結構的差異在於,在本實施例中,以膠層675分隔第一雷射元件64與第二雷射元件66。如圖所示,第一雷射元件64及第二雷射元件66係各包括:透明封裝基板632、634,透明封裝基板632具有相對的表面632A與表面632B,透明封裝基板634具有相對的表面634A與表面634B。雷射晶片602、604用以發射雷射光,其藉由膠層620而接合於對應的透明封裝基板632、634,且其出光面係面向該表面632A、634A;雷射晶片602、604的下表面上設有包括第一電極612與第二電極614之電極組,供第一雷射元件64及第二雷射元件66對外部之電性連接(即電連接於一外部電路板62)。電極612、614、612’、614’的配置係相仿於電極212、214、212’、214’,相關細節於此不再重複贅述。雷射封裝結構60包括支撐件680,其圍繞第一雷射元件64及第二雷射元件66;支撐件680包括貫穿其間的導電結構,例如第一導電柱682及第二導電柱684。第一導電柱682及第二導電柱684連接於導電層640,以供雷射封裝結構60對外部之電性連接,例如電連接於外部電路板62。在一實施例中,支撐件680的材料包括至少一種的膠材。在另一實施例中,支撐件680的材料係選自由陶瓷、玻璃與塑料所組成的群組。上述的材料選擇僅為舉例說明,但實際上並不以此為限。在本實施中,光學元件組合600還包括透明基板690,其具有相對的一表面690A與一表面690B,其中表面690A係面向第一雷射元件64與第二雷射元件66之出光面(出光方向係如箭頭A所示);第一光學元件652及第二光學元件654,係分別對應於第一雷射元件64與第二雷射元件66,且係位於表面690A上;前述導電層640係位於第一光學元件652與第二光學元件654上,且係經由第一導電柱682與第二導電柱 684連接於外部電路板62。第一導電柱682的周圍或第二導電柱684的周圍可以設置有絕緣層,以避免第一導電柱682或第二導電柱684電性連接錯誤的地方。 Please refer to Figures 6A and 6B, which are schematic cross-sectional views of laser packaging structures according to five embodiments of the present invention. The difference between the laser packaging structure 60 of this embodiment and the laser packaging structures of the aforementioned embodiments is that, in this embodiment, an adhesive layer 675 separates the first laser element 64 and the second laser element 66. As shown in the figures, the first laser element 64 and the second laser element 66 each include: transparent packaging substrates 632 and 634, respectively. The transparent packaging substrate 632 has opposing surfaces 632A and 632B, and the transparent packaging substrate 634 has opposing surfaces 634A and 634B. Laser chips 602 and 604 are used to emit laser light. They are bonded to corresponding transparent packaging substrates 632 and 634 by adhesive layer 620, and their light-emitting surfaces face the surfaces 632A and 634A. The lower surfaces of laser chips 602 and 604 are provided with an electrode assembly including a first electrode 612 and a second electrode 614, which allows the first laser element 64 and the second laser element 66 to be electrically connected to the outside (i.e., electrically connected to an external circuit board 62). The configuration of electrodes 612, 614, 612', and 614' is similar to that of electrodes 212, 214, 212', and 214', and the relevant details will not be repeated here. The laser package structure 60 includes a support member 680 surrounding a first laser element 64 and a second laser element 66. The support member 680 includes conductive structures, such as a first conductive post 682 and a second conductive post 684, extending through it. The first conductive post 682 and the second conductive post 684 are connected to a conductive layer 640 for electrical connection of the laser package structure 60 to an external environment, such as an external circuit board 62. In one embodiment, the material of the support member 680 includes at least one type of adhesive. In another embodiment, the material of the support member 680 is selected from the group consisting of ceramics, glass, and plastics. The above material selection is illustrative only and is not limited thereto. In this embodiment, the optical element assembly 600 further includes a transparent substrate 690, which has a surface 690A and a surface 690B facing each other. Surface 690A faces the light-emitting surfaces of the first laser element 64 and the second laser element 66 (the light emission direction is shown by arrow A). The first optical element 652 and the second optical element 654 correspond to the first laser element 64 and the second laser element 66, respectively, and are located on surface 690A. The aforementioned conductive layer 640 is located on the first optical element 652 and the second optical element 654, and is connected to the external circuit board 62 via the first conductive post 682 and the second conductive post 684. An insulating layer may be provided around the first conductive post 682 or the second conductive post 684 to prevent electrical connection errors in the first conductive post 682 or the second conductive post 684.
第6B圖說明了第6A圖所示實施例的變化例。類似地,在第6B圖所示實施例中,同樣是以利用封裝過程中的排片公差而並列配置且以膠層675分隔的第一雷射元件64與第二雷射元件66為基礎;惟與第6A圖所示實施例之差異再於,在此例中,第二光學元件654係由一透明基板6542以及形成於透明基板6542上的光學元件圖形部6544所構成。藉由調整透明基板6542的厚度,即可相應地調整第二光學元件654與第二雷射晶片604之間的距離D2,使其不同於第一光學元件652與第一雷射晶片602之間的距離D1;其中,距離D1和距離D2的選擇,係依第一光學元件652與第二光學元件654的作用而定。 Figure 6B illustrates a variation of the embodiment shown in Figure 6A. Similarly, in the embodiment shown in Figure 6B, the first laser element 64 and the second laser element 66 are also arranged side by side and separated by an adhesive layer 675, utilizing the stacking tolerances during the packaging process; however, the difference from the embodiment shown in Figure 6A is that, in this example, the second optical element 654 is composed of a transparent substrate 6542 and an optical element pattern portion 6544 formed on the transparent substrate 6542. By adjusting the thickness of the transparent substrate 6542, the distance D2 between the second optical element 654 and the second laser chip 604 can be adjusted accordingly, making it different from the distance D1 between the first optical element 652 and the first laser chip 602; wherein the selection of distances D1 and D2 depends on the function of the first optical element 652 and the second optical element 654.
在此實施例中,當由於封裝使得第一雷射晶片602第二雷射晶片604之間的距離較遠時,可藉由外部電路板62上的佈線,相鄰的第二電極614與第一電極612共用同一個連接墊p3,達成共用電極的效果。 In this embodiment, when the distance between the first laser chip 602 and the second laser chip 604 is relatively large due to packaging, the adjacent second electrode 614 and the first electrode 612 can share the same connecting pad p3 through wiring on the external circuit board 62, achieving the effect of a shared electrode.
綜上所述,本發明提供一種雷射封裝結構,於封裝過程中將傳統的雷射封裝結構結合至晶片,從而於單一封裝結構中整合至少兩種不同功能的光學元件,以簡易可行的方式實現具有整合光型的雷射封裝結構。 In summary, this invention provides a laser packaging structure that integrates a traditional laser packaging structure onto a chip during the packaging process, thereby integrating at least two different optical elements within a single packaging structure. This provides a simple and feasible way to achieve a laser packaging structure with integrated optical patterns.
此外,本發明所提供之雷射封裝結構係一種減小封裝尺寸的具有整合光型的雷射封裝結構,其於雷射晶片的覆晶基板上方或下方加入例如繞射式光學元件(Diffraction Optical Element,DOE)、微透鏡陣列(Micro Lens Array)、超透鏡(Metalens)、以及前述光學元件之組合等多個光學元件,配合各雷射元件的獨立控制,即可於單一封裝結構中實現繞射片(Diffusor)、點狀投射光源(Dot Projector)或面狀光源等不同光學功能。 Furthermore, the laser packaging structure provided by this invention is a laser packaging structure with integrated optical patterns that reduces packaging size. It incorporates multiple optical elements, such as diffraction optical elements (DOEs), microlens arrays, metalens, and combinations of the aforementioned optical elements, above or below the flip-chip substrate of the laser chip. With independent control of each laser element, different optical functions, such as diffractors, dot projectors, or area light sources, can be realized within a single packaging structure.
在一實施例中,前述光學元件為超透鏡時,光學元件的下表面與雷射晶片的出光面間的距離(例如為前述的距離D1或距離D2)不小於5微米(μm)且不大於200微米。較佳地,光學元件的下表面與雷射晶片的出光面間的距離(例如為前述的距離D1或距離D2)不小於10微米且不大於100微米。如前述各實施例所述,可以調整支撐件的高度以對應調整光學元件與雷射晶片之間的距離;或者,可以依據實際所需,選擇性地將光學元件設置在透明基板的上表面(此時,透明基板位於雷射晶片與光學元件之間)或是下表面(此時,光學元件位於雷射晶片與透明基板之間),以在不增加其他元件的情況下,將光學元件設置在合適的位置。 In one embodiment, when the aforementioned optical element is an ultra-transparent lens, the distance between the lower surface of the optical element and the light-emitting surface of the laser chip (e.g., the aforementioned distance D1 or distance D2) is not less than 5 micrometers (μm) and not more than 200 micrometers. Preferably, the distance between the lower surface of the optical element and the light-emitting surface of the laser chip (e.g., the aforementioned distance D1 or distance D2) is not less than 10 micrometers and not more than 100 micrometers. As described in the foregoing embodiments, the height of the support can be adjusted to correspondingly adjust the distance between the optical element and the laser chip; alternatively, the optical element can be selectively positioned on the upper surface (where the transparent substrate is located between the laser chip and the optical element) or the lower surface (where the optical element is located between the laser chip and the transparent substrate) of the transparent substrate, as needed, to place the optical element in a suitable position without adding other components.
須說明的是,超透鏡係由基材及形成於基材上的鰭陣列建構而成(基材可為SiOx,TiO2,SiNx,Al2O3),透過鰭陣列可控制及調整超透鏡的折射率狀態,故當光通過超透鏡的不同鰭陣列時,即可產生相同或是不同的相位差。在整合光型的設計中,可以確保所有光都能夠同時抵達焦點,提高雷射晶片的成像效果。相較於習知方式中需使用多數個透鏡來消弭誤差而導致雷射封裝結構的整體厚度增加,使用超透鏡係可有效減少雷射封裝結構的整體厚度,同時實現體積小型化與精準成像的效果。 It should be noted that a superlens is constructed from a substrate and a fin array formed on the substrate (the substrate can be SiOx, TiO2, SiNx, or Al2O3). The refractive index of the superlens can be controlled and adjusted through the fin array, thus producing the same or different phase differences when light passes through different fin arrays. In integrated beam pattern designs, this ensures that all light reaches the focal point simultaneously, improving the imaging effect of the laser chip. Compared to conventional methods that require multiple lenses to eliminate errors, leading to an increase in the overall thickness of the laser package structure, using a superlens effectively reduces the overall thickness of the laser package structure, while simultaneously achieving miniaturization and precise imaging.
在本發明中,利用晶片切割間距的調整提供例如二合一的雷射元件,並可輔以共用電極的設計,搭配對應的光學元件控制,可於整合多個光型功能的同時,減小封裝結構的體積,並提高製程可靠性。 In this invention, by adjusting the wafer dicing pitch, a dual-function laser element is provided, which can be supplemented with a common electrode design and corresponding optical element control. This allows for the integration of multiple optical functions while reducing the package size and improving process reliability.
需注意的是,本發明所提之前述實施例係僅用於例示說明本發明,而非用於限制本發明之範圍。熟習本發明所屬領域技藝之人對本發明所進行之諸般修飾和變化皆不脫離本發明之精神與範疇。不同實施例中相同或相似 的構件、或不同實施例中以相同元件符號表示的構件係具有相同的物理或化學特性。此外,在適當的情況下,本發明之上述實施例係可互相組合或替換,而非僅限於上文所描述的特定實施例。在一實施例中所描述的特定構件與其他構件的連接關係亦可應用於其他實施例中,其皆落於本發明如附申請專利範圍之範疇。 It should be noted that the aforementioned embodiments of this invention are merely illustrative and not intended to limit the scope of the invention. Various modifications and variations made to this invention by those skilled in the art to which it pertains do not depart from the spirit and scope of this invention. Identical or similar components in different embodiments, or components represented by the same element symbols in different embodiments, possess the same physical or chemical properties. Furthermore, where appropriate, the aforementioned embodiments of this invention can be combined or substituted with each other, and are not limited to the specific embodiments described above. The connection relationships between a specific component described in one embodiment and other components can also be applied to other embodiments, all of which fall within the scope of the appended patent application.
20 雷射封裝結構22 外部電路板202 第一雷射晶片204 第二雷射晶片212 第一電極214 第二電極220 膠層230 透明基板230A 表面230B 表面240 導電層252 第一光學元件254 第二光學元件262 第一導電柱264 第二導電柱270 保護層20 Laser Packaging Structure 22 External Circuit Board 202 First Laser Chip 204 Second Laser Chip 212 First Electrode 214 Second Electrode 220 Adhesive Layer 230 Transparent Substrate 230A Surface 230B Surface 240 Conductive Layer 252 First Optical Component 254 Second Optical Component 262 First Conductive Pillar 264 Second Conductive Pillar 270 Protective Layer
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