TWI902569B - Mask cleaning method - Google Patents
Mask cleaning methodInfo
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- TWI902569B TWI902569B TW113149224A TW113149224A TWI902569B TW I902569 B TWI902569 B TW I902569B TW 113149224 A TW113149224 A TW 113149224A TW 113149224 A TW113149224 A TW 113149224A TW I902569 B TWI902569 B TW I902569B
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Abstract
本發明係一種光罩清洗方法，其包含一準備步驟，提供一水刀、一無塵布及待清洗的一光罩，無塵布設置於水刀上，光罩位於無塵布的第一橫向側邊且與無塵布保持距離；一第一清洗步驟，光罩縱向移動，使得光罩的一側面與無塵布的表面位於同一平面上；一第二清洗步驟，光罩橫向移動至無塵布的第二橫向側邊；一第三清洗步驟，光罩縱向移動，使得光罩遠離無塵布；一第四清洗步驟，光罩橫向移動至無塵布的第一橫向側邊，重複第一清洗步驟至第四清洗步驟數次；第五清洗步驟，光罩橫向移動至無塵布的第一橫向側邊，使得無塵布完成對光罩的側面的最後一次擦拭動作；藉此可使無塵布上所沾附之髒污平均分配於左右二端以提高清潔的能力且增進無塵布的使用壽命，而光罩藉由縱向之移動後再橫向移動可避免髒污回沾於光罩。This invention relates to a photomask cleaning method, comprising a preparation step, providing a water jet, a cleanroom cloth, and a photomask to be cleaned, the cleanroom cloth being disposed on the water jet, and the photomask being located on a first transverse side of the cleanroom cloth and maintaining a distance from the cleanroom cloth; a first cleaning step, wherein the photomask is moved longitudinally such that one side of the photomask is on the same plane as the surface of the cleanroom cloth; a second cleaning step, wherein the photomask is moved laterally to a second transverse side of the cleanroom cloth; and a third cleaning step, wherein the photomask is moved longitudinally such that the photomask is moved away from the cleanroom cloth. The fourth cleaning step involves moving the photomask laterally to the first horizontal side of the cleanroom cloth, repeating the first to fourth cleaning steps several times. The fifth cleaning step involves moving the photomask laterally to the first horizontal side of the cleanroom cloth, allowing the cleanroom cloth to complete the final wiping action on the side of the photomask. This allows the dirt adhering to the cleanroom cloth to be evenly distributed on both the left and right sides, improving cleaning ability and extending the service life of the cleanroom cloth. The longitudinal and then lateral movement of the photomask prevents dirt from sticking back onto the photomask.
Description
本發明係涉及一種清洗方法，尤指一種光罩清洗方法。This invention relates to a cleaning method, and more particularly to a photomask cleaning method.
現今在積體電路的製程中，會利用光蝕刻技術在半導體產品上形成圖形，而為了將特定圖形形成於晶圓上，需透過光罩技術執行，光罩上蓋著不透明、透明和相偏移區域所組成的圖案，並且投影到晶圓上以定義單層積體電路的佈局，故光罩表面的潔淨度非常重要，現有技術對於光罩的清潔方式，請參閱圖11及圖12所示，一光罩90透過夾頭(圖式中未示)可左右移動的設置於上方位置，下方位置設置有一無塵布91，欲擦拭光罩90時，如圖11所示，夾頭夾持光罩90且位於無塵布91的一側，光罩90的一側面與無塵布91的表面齊平，請參閱圖12所示，橫向移動光罩90至無塵布91的另一側，使得無塵布91對光罩90表面完成一次擦拭動作，再將光罩90反向移動至原來的一側，以持續來回擦拭的方式對光罩90進行清潔動作。In current integrated circuit manufacturing processes, photolithography is used to create patterns on semiconductor products. To transfer these specific patterns onto the wafer, a photomask technique is employed. The photomask contains patterns composed of opaque, transparent, and phase-shifted regions, which are projected onto the wafer to define the layout of the single-layer integrated circuit. Therefore, the cleanliness of the photomask surface is crucial. For current photomask cleaning methods, please refer to Figures 11 and 12. A photomask 90 can be moved left and right via a chuck (not shown in the figures). The upper position is provided, and a cleanroom cloth 91 is provided at the lower position. When wiping the photomask 90, as shown in Figure 11, the clamp holds the photomask 90 and is located on one side of the cleanroom cloth 91. One side of the photomask 90 is flush with the surface of the cleanroom cloth 91. Please refer to Figure 12. Move the photomask 90 horizontally to the other side of the cleanroom cloth 91 so that the cleanroom cloth 91 completes one wiping action on the surface of the photomask 90. Then move the photomask 90 in the opposite direction to the original side and clean the photomask 90 by wiping it back and forth continuously.
然而，前述橫向來回之擦拭方式會使得光罩90上的髒污容易集中於無塵布91的同一側，即首次擦拭的該側，使得無塵布91因為快速累積一定厚度之髒污而減少其使用壽命，此外，集中的髒污還會有回沾的問題，導致無法清潔乾淨；因此，現有技術的光罩清洗方法，其存在有如前述的問題及缺點，實有待加以改良。However, the aforementioned horizontal back-and-forth wiping method makes it easy for dirt on the photomask 90 to concentrate on the same side of the cleanroom cloth 91, i.e. the side wiped for the first time. This causes the cleanroom cloth 91 to accumulate a certain thickness of dirt quickly, reducing its service life. In addition, the concentrated dirt can also cause back-sticking, making it impossible to clean thoroughly. Therefore, the existing photomask cleaning method has the aforementioned problems and shortcomings, and needs to be improved.
有鑒於現有技術的不足，本發明提供一種光罩清洗方法，其藉由橫向及縱向之光罩移動方式，達到可均勻使用無塵布之目的。In view of the shortcomings of the existing technology, the present invention provides a photomask cleaning method, which achieves the purpose of uniform use of the cleanroom cloth by moving the photomask in both horizontal and vertical directions.
為達上述之發明目的，本發明所採用的技術手段為設計一種光罩清洗方法，其包含： 一準備步驟：提供一水刀、一無塵布及待清洗的一光罩，該無塵布設置於該水刀上且該水刀對該無塵布噴灑清洗液，該無塵布具有相對的一第一橫向側邊及一第二橫向側邊，該光罩位於該無塵布的該第一橫向側邊且與該無塵布保持距離； 一第一清洗步驟，該光罩縱向移動，使得該光罩的一側面與該無塵布的表面位於同一平面上； 一第二清洗步驟，該光罩橫向移動至該無塵布的該第二橫向側邊，使得該無塵布完成對該光罩的該側面的第一次擦拭動作； 一第三清洗步驟，該光罩縱向移動，使得該光罩遠離該無塵布； 一第四清洗步驟，該光罩橫向移動至該無塵布的該第一橫向側邊，重複該第一清洗步驟至該第四清洗步驟數次； 一第五清洗步驟，該光罩位於該無塵布的該第二橫向側邊且該光罩的該側面與該無塵布的該表面位於同一平面上，該光罩橫向移動至該無塵布的該第一橫向側邊，使得該無塵布完成對該光罩的該側面的最後一次擦拭動作。 To achieve the aforementioned objective, the present invention employs a photomask cleaning method, comprising: A preparation step: providing a water jet, a cleanroom cloth, and a photomask to be cleaned. The cleanroom cloth is disposed on the water jet, and the water jet sprays cleaning fluid onto the cleanroom cloth. The cleanroom cloth has a first transverse side and a second transverse side facing each other. The photomask is located on the first transverse side of the cleanroom cloth and maintains a distance from the cleanroom cloth; A first cleaning step: the photomask is moved longitudinally such that one side of the photomask is on the same plane as the surface of the cleanroom cloth; A second cleaning step involves moving the photomask laterally to the second lateral side of the cleanroom cloth, allowing the cleanroom cloth to complete the first wiping action on that side of the photomask; A third cleaning step involves moving the photomask longitudinally, moving it away from the cleanroom cloth; A fourth cleaning step involves moving the photomask laterally to the first lateral side of the cleanroom cloth, repeating the first to fourth cleaning steps several times; In the fifth cleaning step, the photomask is positioned on the second lateral side of the cleanroom cloth, and the side surface of the photomask is on the same plane as the surface of the cleanroom cloth. The photomask is then moved laterally to the first lateral side of the cleanroom cloth, allowing the cleanroom cloth to complete a final wiping action on that side surface of the photomask.
進一步而言，所述之光罩清洗方法，其中於該第五清洗步驟後，進行以下步驟： 一更換步驟，將擦拭完成的該光罩替換成一個待清洗的新光罩，該新光罩位於該無塵布的該第二橫向側邊且與該無塵布保持距離； 一第六清洗步驟，該新光罩縱向移動，使得該新光罩的一側面與該無塵布的表面位於同一平面上； 一第七清洗步驟，該新光罩橫向移動至該無塵布的該第一橫向側邊，使得該無塵布完成對該新光罩的該側面的第一次擦拭動作； 一第八清洗步驟，該新光罩縱向移動，使得該新光罩遠離該無塵布； 一第九清洗步驟，該新光罩橫向移動至該無塵布的該第二橫向側邊；重複該第六清洗步驟至該第九清洗步驟數次； 一第十清洗步驟，該新光罩位於該無塵布的該第一橫向側邊且該新光罩的該側面與該無塵布的該表面位於同一平面上，該新光罩橫向移動至該無塵布的該第二橫向側邊，使得該無塵布完成對該新光罩的該側面的最後一次擦拭動作。 Furthermore, in the aforementioned photomask cleaning method, after the fifth cleaning step, the following steps are performed: A replacement step, replacing the wiped photomask with a new photomask to be cleaned, the new photomask being located on the second lateral side of the cleanroom cloth and maintaining a distance from the cleanroom cloth; A sixth cleaning step, the new photomask is moved longitudinally such that one side of the new photomask is on the same plane as the surface of the cleanroom cloth; A seventh cleaning step, the new photomask is moved laterally to the first lateral side of the cleanroom cloth, allowing the cleanroom cloth to complete the first wiping action on that side of the new photomask; Eighth cleaning step: The new photomask is moved longitudinally away from the cleanroom cloth; Ninth cleaning step: The new photomask is moved laterally to the second lateral side of the cleanroom cloth; repeats the sixth to ninth cleaning steps several times; Tenth cleaning step: The new photomask is positioned on the first lateral side of the cleanroom cloth, with its side surface and the surface of the cleanroom cloth on the same plane; the new photomask is moved laterally to the second lateral side of the cleanroom cloth, allowing the cleanroom cloth to complete a final wiping action on that side surface of the new photomask.
進一步而言，所述之光罩清洗方法，其中該清洗液為純水。Furthermore, in the aforementioned photomask cleaning method, the cleaning solution is pure water.
進一步而言，所述之光罩清洗方法，其中該清洗液為臭氧水。Furthermore, in the aforementioned photomask cleaning method, the cleaning solution is ozone water.
進一步而言，所述之光罩清洗方法，其中該清洗液為化學清洗藥劑。Furthermore, in the aforementioned photomask cleaning method, the cleaning solution is a chemical cleaning agent.
本發明的優點在於，針對不同的光罩可選擇不同方向之擦拭模式，藉此可使無塵布上所沾附之髒污平均分配於左右二端以提高清潔的能力且增進無塵布的使用壽命，而光罩藉由縱向之移動後再橫向移動可避免髒污回沾於光罩的問題；本發明因為光罩有縱向移動的機制，因此無塵布與光罩之間的間隙大小具有可調的功能，進而可調整清潔的力道，達到可加強清潔與增加使用壽命的效果。The advantages of this invention are that different wiping modes can be selected for different photomasks, thereby distributing the dirt on the cleanroom cloth evenly to both ends, improving cleaning power and extending the service life of the cleanroom cloth. The photomask can avoid the problem of dirt sticking back to the photomask by moving longitudinally and then laterally. Because the photomask has a longitudinal movement mechanism, the gap between the cleanroom cloth and the photomask is adjustable, thereby adjusting the cleaning force to achieve the effect of enhanced cleaning and increased service life.
以下配合圖式以及本發明之較佳實施例，進一步闡述本發明為達成預定發明目的所採取的技術手段。The following, with the aid of drawings and preferred embodiments of the invention, further illustrates the technical means employed by the invention to achieve its intended purpose.
請參閱圖1所示，本發明之光罩清洗方法，其包含一準備步驟P1、一第一清洗步驟S1、一第二清洗步驟S2、一第三清洗步驟S3及一第四清洗步驟S4。Please refer to Figure 1. The photomask cleaning method of the present invention includes a preparation step P1, a first cleaning step S1, a second cleaning step S2, a third cleaning step S3 and a fourth cleaning step S4.
請參閱圖1所示，為本發明光罩30清洗方法的流程圖，請參閱圖1及圖2所示，於準備步驟P1中提供一水刀10、一無塵布20及待清洗的一光罩30，無塵布20設置於水刀10上且水刀10對無塵布20噴灑清洗液，為便於說明本實施例之無塵布20具有一橫向方向X及一縱向方向Y，橫向方向X及縱向方向Y相互垂直，且無塵布20橫向方向X的相對二邊分別為一第一橫向側邊X1及一第二橫向側邊X2，縱向方向Y即為上下方向，光罩30藉由可移動之一夾頭(圖式中未示)夾取並位於無塵布20的第一橫向側邊X1且與無塵布20保持距離，以圖1為例，即光罩30位於無塵布20的右上方初始位置，而光罩30朝向無塵布20的一側面為一待清洗面31，其表面髒汙以黑色顆粒表示，本實施例之清洗液為純水，但不以此為限，在其他實施例中，可採用臭氧水或化學清洗藥劑，當髒污較為嚴重時，可藉由化學清洗藥劑先行進行清洗動作，化學清洗藥劑為現有技術之產品，故詳細成分不再贅述。Please refer to Figure 1, which is a flowchart of the photomask 30 cleaning method of this invention. Referring to Figures 1 and 2, in preparation step P1, a water jet 10, a cleanroom cloth 20, and a photomask 30 to be cleaned are provided. The cleanroom cloth 20 is placed on the water jet 10, and the water jet 10 sprays cleaning fluid onto the cleanroom cloth 20. For clarity, the cleanroom cloth 20 of this embodiment has a horizontal direction X and a vertical direction Y, which are perpendicular to each other. The opposite sides of the cleanroom cloth 20 in the horizontal direction X are a first horizontal side X1 and a second horizontal side X2, respectively. The vertical direction Y is the up-down direction. The photomask 30 is cleaned by... A movable clamp (not shown in the figure) clamps and positions the cleanroom cloth 20 on its first horizontal side X1 and maintains a distance from the cleanroom cloth 20. Taking Figure 1 as an example, the photomask 30 is initially positioned at the upper right of the cleanroom cloth 20, and the side of the photomask 30 facing the cleanroom cloth 20 is a surface 31 to be cleaned. The dirt on its surface is represented by black particles. The cleaning solution in this embodiment is pure water, but it is not limited to this. In other embodiments, ozone water or chemical cleaning agents can be used. When the dirt is more serious, the cleaning action can be carried out first by using chemical cleaning agents. Chemical cleaning agents are existing products, so the detailed composition will not be described in detail.
請參閱圖1及圖3所示，第一清洗步驟S1中，光罩30縱向移動，使得光罩30的一側面與無塵布20的表面位於同一平面上，具體而言，光罩30為向下移動直至光罩30的待清洗面31與無塵布20的表面齊平。Please refer to Figures 1 and 3. In the first cleaning step S1, the photomask 30 moves longitudinally so that one side of the photomask 30 is on the same plane as the surface of the cleanroom cloth 20. Specifically, the photomask 30 moves downward until the surface 31 of the photomask 30 to be cleaned is flush with the surface of the cleanroom cloth 20.
請參閱圖1及圖4所示，第二清洗步驟S2中，光罩30橫向移動至無塵布20的第二橫向側邊X2，使得無塵布20完成對光罩30的第一次擦拭動作，具體而言，光罩30由第一橫向側邊X1朝向第二橫向側邊X2移動，並透過無塵布20接觸光罩30的待清洗面31以摩擦的方式對光罩30進行清潔動作。Please refer to Figures 1 and 4. In the second cleaning step S2, the photomask 30 moves laterally to the second lateral side X2 of the cleanroom cloth 20, so that the cleanroom cloth 20 completes the first wiping action on the photomask 30. Specifically, the photomask 30 moves from the first lateral side X1 to the second lateral side X2, and the cleanroom cloth 20 contacts the surface 31 of the photomask 30 to be cleaned to perform a cleaning action on the photomask 30 by friction.
請參閱圖1及圖5所示，第三清洗步驟S3中，光罩30縱向移動，使得光罩30遠離無塵布20，並重複第一清洗步驟S1至第三清洗步驟S3數次，具體而言，光罩30為向上移動遠離無塵布20並位於無塵布20的左上方位置，欲重複第一清洗步驟S1至第三清洗步驟S3時，則光罩30自無塵布20的左上方位置再移動至無塵布20的右上方初始位置，並接著從執行第一清洗步驟S1開始動作。Please refer to Figures 1 and 5. In the third cleaning step S3, the photomask 30 moves longitudinally, moving away from the cleanroom cloth 20. The first cleaning step S1 to the third cleaning step S3 are repeated several times. Specifically, the photomask 30 moves upward away from the cleanroom cloth 20 and is positioned at the upper left of the cleanroom cloth 20. To repeat the first cleaning step S1 to the third cleaning step S3, the photomask 30 moves from the upper left position of the cleanroom cloth 20 to the initial position at the upper right of the cleanroom cloth 20, and then the operation starts from the execution of the first cleaning step S1.
第四清洗步驟S4，光罩30橫向移動至無塵布20的第一橫向側邊X1；重複第一清洗步驟S1至第四清洗步驟S4數次。In the fourth cleaning step S4, the photomask 30 is moved laterally to the first lateral side X1 of the cleanroom cloth 20; the first cleaning step S1 to the fourth cleaning step S4 are repeated several times.
第五清洗步驟S5，光罩30位於無塵布20的第二橫向側邊X2且光罩30的待清洗面31與無塵布20的表面位於同一平面上，光罩30橫向移動至無塵布20的該第一橫向側邊X1，使得無塵布20完成對光罩30的最後一次擦拭動作，具體而言，光罩30自無塵布20的左上方位置向下移動至光罩30的待清洗面31與無塵布20的表面位於同一平面，光罩30再由無塵布20的第二橫向側邊X2朝向第一橫向側邊X1移動，並透過無塵布20接觸光罩30的待清洗面31以摩擦的方式對光罩30進行清潔動作。In the fifth cleaning step S5, the photomask 30 is positioned on the second horizontal side X2 of the cleanroom cloth 20, and the surface 31 of the photomask 30 to be cleaned is on the same plane as the surface of the cleanroom cloth 20. The photomask 30 is moved horizontally to the first horizontal side X1 of the cleanroom cloth 20, so that the cleanroom cloth 20 completes the final wiping action on the photomask 30. Specifically, the photomask 30 moves downward from the upper left position of the cleanroom cloth 20 until the surface 31 of the photomask 30 to be cleaned is on the same plane as the surface of the cleanroom cloth 20. The photomask 30 then moves from the second horizontal side X2 of the cleanroom cloth 20 toward the first horizontal side X1, and cleans the photomask 30 by rubbing the surface 31 of the photomask 30 through the cleanroom cloth 20.
簡言之，本實施例之光罩30是先執行數次的右擦動作後，最後一次再執行左擦動作，但不以前述為限，亦可先執行數次的左擦動作後，最後一次再執行右擦動作。In short, in this embodiment, the photomask 30 performs several right-wiping actions first, and then performs a left-wiping action on the last time. However, it is not limited to the above; it may also perform several left-wiping actions first, and then perform a right-wiping action on the last time.
請參閱圖6所示，而當前述的光罩30清潔完畢後欲更換一新光罩30A進行清潔時，可於前述第五清洗步驟S5後，進行以下步驟：Please refer to Figure 6. When you want to replace the photomask 30 with a new photomask 30A after the aforementioned photomask 30 has been cleaned, you can perform the following steps after the fifth cleaning step S5:
請參閱圖6及圖7所示，更換步驟C1，將擦拭完成的光罩30替換成一個待清洗的新光罩30A，新光罩30A位於無塵布20的第二橫向側邊X2且與無塵布20保持距離。Please refer to Figures 6 and 7. In replacement step C1, replace the wiped photomask 30 with a new photomask 30A to be cleaned. The new photomask 30A is located on the second horizontal side X2 of the cleanroom cloth 20 and is kept at a distance from the cleanroom cloth 20.
請參閱圖8所示，第六清洗步驟S6，新光罩30A縱向移動，使得新光罩30A的待清洗面31A與無塵布20的表面位於同一平面上。Please refer to Figure 8. In the sixth cleaning step S6, the new photomask 30A is moved longitudinally so that the surface 31A to be cleaned of the new photomask 30A is on the same plane as the surface of the cleanroom cloth 20.
請參閱圖9所示，第七清洗步驟S7，新光罩30A橫向移動至無塵布20的第一橫向側邊X1，使得無塵布20完成對新光罩30A的待清洗面31A的第一次擦拭動作。Please refer to Figure 9. In the seventh cleaning step S7, the new photomask 30A is moved laterally to the first lateral side X1 of the cleanroom cloth 20, so that the cleanroom cloth 20 completes the first wiping action on the surface 31A of the new photomask 30A to be cleaned.
請參閱圖10所示，第八清洗步驟S8，新光罩30A縱向移動，使得新光罩30A遠離無塵布20。Please refer to Figure 10. In the eighth cleaning step S8, the new photomask 30A is moved longitudinally so that it is away from the cleanroom cloth 20.
第九清洗步驟S9，新光罩30A橫向移動至無塵布20的第二橫向側邊X2；重複第六清洗步驟S6至第九清洗步驟S9數次。In the ninth cleaning step S9, the new photomask 30A is moved laterally to the second lateral side X2 of the cleanroom cloth 20; repeat the sixth cleaning step S6 to the ninth cleaning step S9 several times.
第十清洗步驟S10，新光罩30A位於無塵布20的第一橫向側邊X1且新光罩30A的待清洗面31A與無塵布20的表面位於同一平面上，新光罩30A橫向移動至無塵布20的第二橫向側邊X2，使得無塵布20完成對新光罩30A的側面的最後一次擦拭動作。In the tenth cleaning step S10, the new photomask 30A is located on the first transverse side X1 of the cleanroom cloth 20, and the surface 31A of the new photomask 30A to be cleaned is on the same plane as the surface of the cleanroom cloth 20. The new photomask 30A is moved laterally to the second transverse side X2 of the cleanroom cloth 20, so that the cleanroom cloth 20 completes the final wiping action on the side of the new photomask 30A.
前述過程中，由於針對不同的光罩30可選擇不同方向之擦拭模式，例如第一片光罩30是執行數次右擦後再執行左擦，而第二片光罩30是執行數次左擦後再執行右擦，藉此可使無塵布20上所沾附之髒污平均分配於左右二端以提高清潔的能力且增進無塵布20的使用壽命，而光罩30藉由縱向之移動後再橫向移動可避免髒污回沾於光罩30的問題，使用摩擦的方式清潔光罩30，相較於使用化學藥劑浸泡光罩30亦可增進光罩30的使用壽命。In the aforementioned process, different wiping modes can be selected for different photomasks 30. For example, the first photomask 30 is wiped several times to the right and then to the left, while the second photomask 30 is wiped several times to the left and then to the right. This allows the dirt adhering to the cleanroom cloth 20 to be evenly distributed to the left and right ends, thereby improving the cleaning ability and extending the service life of the cleanroom cloth 20. The photomask 30 can avoid the problem of dirt sticking back to the photomask 30 by moving it longitudinally and then laterally. Cleaning the photomask 30 by friction can also extend the service life of the photomask 30 compared to soaking the photomask 30 in chemical agents.
前述過程中，由於主要是採用純水或臭氧水作為清洗液，故可減少有毒氣體危害之產生，且增進環保之效益。In the aforementioned process, since pure water or ozone water is mainly used as the cleaning fluid, the generation of toxic gases can be reduced and the environmental benefits can be increased.
前述過程中，本發明因為光罩30有縱向移動的機制，因此無塵布20與光罩30之間的間隙大小具有可調的功能，進而可調整清潔的力道，達到可加強清潔與增加使用壽命的效果。In the aforementioned process, because the photomask 30 has a longitudinal movement mechanism, the gap between the cleanroom cloth 20 and the photomask 30 is adjustable, thereby adjusting the cleaning force to achieve the effect of enhanced cleaning and increased service life.
以上所述僅是本發明之較佳實施例而已，並非對本發明做任何形式上的限制，雖然本發明已以較佳實施例揭露如上，然而並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明技術方案的範圍內，當可利用上述揭示的技術內容作出些許更動或修飾作為等同變化的等效實施例，但凡是未脫離本發明技術方案的內容，依據本發明的技術實質對以上實施例所做的任何簡單修改、等同變化與修飾，均仍屬於本發明技術方案的範圍內。The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Anyone skilled in the art can make some modifications or alterations to the above-disclosed technical content as equivalent embodiments without departing from the scope of the present invention. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present invention without departing from the scope of the present invention shall still fall within the scope of the present invention.
P1:準備步驟 S1:第一清洗步驟 S2:第二清洗步驟 S3:第三清洗步驟 S4:第四清洗步驟 S5:第五清洗步驟 C1:更換步驟 S6:第六清洗步驟 S7:第七清洗步驟 S8:第八清洗步驟 S9:第九清洗步驟 S10:第十清洗步驟 10:水刀 20:無塵布 30:光罩 30A:新光罩 31:待清洗面 31A:待清洗面 90:光罩 91:無塵布 X:橫向方向 X1:第一橫向側邊 X2:第二橫向側邊 Y:縱向方向 P1: Preparation Steps S1: First Cleaning Step S2: Second Cleaning Step S3: Third Cleaning Step S4: Fourth Cleaning Step S5: Fifth Cleaning Step C1: Replacement Steps S6: Sixth Cleaning Step S7: Seventh Cleaning Step S8: Eighth Cleaning Step S9: Ninth Cleaning Step S10: Tenth Cleaning Step 10: Water Jet 20: Cleanroom Wipe 30: Photomask 30A: New Photomask 31: Surface to be Cleaned 31A: Surface to be Cleaned 90: Photomask 91: Cleanroom Wipe X: Horizontal Direction X1: First Horizontal Side X2: Second Horizontal Side Y: Vertical Direction
圖1係本發明之流程圖。 圖2係本發明之準備步驟示意圖。 圖3係本發明之第一清洗步驟示意圖。 圖4係本發明之第二清洗步驟示意圖。 圖5係本發明之第三清洗步驟示意圖。 圖6係本發明之另一流程圖。 圖7至圖10係本發明之左擦連續動作示意圖。 圖11係現有技術示意圖。 圖12係現有技術另一示意圖。 Figure 1 is a flowchart of the present invention. Figure 2 is a schematic diagram of the preparation steps of the present invention. Figure 3 is a schematic diagram of the first cleaning step of the present invention. Figure 4 is a schematic diagram of the second cleaning step of the present invention. Figure 5 is a schematic diagram of the third cleaning step of the present invention. Figure 6 is another flowchart of the present invention. Figures 7 to 10 are schematic diagrams of the continuous left-wiping action of the present invention. Figure 11 is a schematic diagram of prior art. Figure 12 is another schematic diagram of prior art.
P1:準備步驟 P1: Preparation Steps
S1:第一清洗步驟 S1: First cleaning step
S2:第二清洗步驟 S2: Second cleaning step
S3:第三清洗步驟 S3: Third cleaning step
S4:第四清洗步驟 S4: Fourth cleaning step
S5:第五清洗步驟 S5: Fifth cleaning step
Claims (4)
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| Application Number | Priority Date | Filing Date | Title |
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| TW113149224A TWI902569B (en) | 2024-12-17 | 2024-12-17 | Mask cleaning method |
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| TW113149224A TWI902569B (en) | 2024-12-17 | 2024-12-17 | Mask cleaning method |
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| Publication Number | Publication Date |
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| TWI902569B true TWI902569B (en) | 2025-10-21 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM424516U (en) * | 2011-08-02 | 2012-03-11 | Gudeng Prec Ind Co Ltd | Mask washing machine structure |
| TWM457962U (en) * | 2012-11-21 | 2013-07-21 | Gudeng Prec Ind Co Ltd | Photomask washing and cleaning mechanism |
| US8545637B2 (en) * | 2008-02-27 | 2013-10-01 | Ricoh Company, Ltd. | Cleaning device and cleaning method |
| CN214812860U (en) * | 2021-04-20 | 2021-11-23 | 艾斯尔光电(南通)有限公司 | Special sponge brushing device for cleaning photomask |
-
2024
- 2024-12-17 TW TW113149224A patent/TWI902569B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8545637B2 (en) * | 2008-02-27 | 2013-10-01 | Ricoh Company, Ltd. | Cleaning device and cleaning method |
| TWM424516U (en) * | 2011-08-02 | 2012-03-11 | Gudeng Prec Ind Co Ltd | Mask washing machine structure |
| TWM457962U (en) * | 2012-11-21 | 2013-07-21 | Gudeng Prec Ind Co Ltd | Photomask washing and cleaning mechanism |
| CN214812860U (en) * | 2021-04-20 | 2021-11-23 | 艾斯尔光电(南通)有限公司 | Special sponge brushing device for cleaning photomask |
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