TWI902358B - Adhesive composition and adhesive film structure for mass transfer - Google Patents
Adhesive composition and adhesive film structure for mass transferInfo
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Abstract
Description
本發明是關於一種黏著劑組成物及膠膜結構,特別是關於一種用於巨量轉移的黏著劑組成物及膠膜結構。This invention relates to an adhesive composition and a film structure, and more particularly to an adhesive composition and a film structure for mass transfer.
巨量轉移(mass transfer)係小型發光二極體(mini LED)及微型發光二極體(micro LED)量產的關鍵技術,也是影響製程良率的重要因素。巨量轉移係將LED晶片移轉到目標基板上的製程。巨量轉移的步驟包含先將巨量轉移膠膜(巨轉膠)貼合在玻璃上,並將LED晶片黏在巨轉膠上,接著依序進行清潔、壓合及迴焊(reflow)後,再移除巨轉膠。Mass transfer is a key technology for the mass production of mini LEDs and micro LEDs, and it is also a significant factor affecting process yield. Mass transfer is the process of transferring LED chips onto a target substrate. The steps of mass transfer include first attaching a mass transfer film (mass transfer adhesive) to glass, then attaching the LED chip to the mass transfer adhesive, followed by cleaning, lamination, and reflow, and finally removing the mass transfer adhesive.
習知巨轉膠的離型力太大(大於約2 g/cm),故容易發生搶膠的問題。再者,習知巨轉膠的耐熱溫度偏低,容易在移除巨轉膠的過程中,在LED晶片表面發生殘膠。此外,在將LED晶片黏在巨轉膠的過程中一般須利用波長248 nm的雷射光進行對位,然而習知巨轉膠對於240 nm至250 nm (例如248 nm) 之對位光線的穿透度較小(小於約90%),故較不利於對位。Conventional giant transfer adhesives have excessively high release forces (greater than approximately 2 g/cm), which easily leads to adhesive snatching problems. Furthermore, conventional giant transfer adhesives have relatively low heat resistance temperatures, making it easy for adhesive residue to form on the LED chip surface during removal. Additionally, the process of bonding LED chips to the giant transfer adhesive typically requires alignment using 248 nm laser light; however, conventional giant transfer adhesives have low transmittance (less than approximately 90%) for alignment light in the 240 nm to 250 nm (e.g., 248 nm) range, making alignment less favorable.
有鑑於此,亟須提供一種用於巨量轉移的黏著劑組成物及膠膜結構,以使黏著層的離型力下降,並提高其耐熱溫度及對於240 nm至250 nm的對位光線之穿透度。In view of this, there is an urgent need to provide an adhesive composition and film structure for mass transfer to reduce the release force of the adhesive layer and improve its heat resistance temperature and transmittance to para light in the range of 240 nm to 250 nm.
本發明之一態樣是提供一種用於巨量轉移的黏著劑組成物,其藉由特定重量比的交聯劑、錨固劑及催化劑,以降低黏著層的離型力,並提高黏著層的耐熱溫度及對特定波長之對位光線的穿透度。One aspect of this invention is to provide an adhesive composition for mass transfer, which, through a specific weight ratio of crosslinking agent, anchoring agent and catalyst, reduces the release force of the adhesive layer and increases the heat resistance temperature of the adhesive layer and the transmittance of the adhesive layer to parallax of a specific wavelength.
本發明之另一態樣是提供一種用於巨量轉移的膠膜結構,其包含以上述態樣之用於巨量轉移的黏著劑組成物做為黏著層。Another aspect of the invention is to provide a film structure for mass transfer, comprising an adhesive composition for mass transfer as described above as an adhesive layer.
根據本發明之一態樣,提供一種用於巨量轉移的黏著劑組成物,其係包含矽膠樹脂、交聯劑、錨固劑及催化劑。基於用於巨量轉移的黏著劑組成物為100 wt%,矽膠樹脂為95 wt%至99 wt%。交聯劑、錨固劑及催化劑的重量比為1:2:4。According to one aspect of the present invention, an adhesive composition for mass transfer is provided, comprising silicone resin, a crosslinking agent, an anchoring agent, and a catalyst. The adhesive composition for mass transfer comprises 100 wt%, and the silicone resin comprises 95 wt% to 99 wt%. The weight ratio of the crosslinking agent, anchoring agent, and catalyst is 1:2:4.
根據本發明之一實施例,上述矽膠樹脂包含第一矽膠樹脂,其中基於矽膠樹脂為100 wt%,第一矽膠樹脂為67 wt%至80 wt%;以及第二矽膠樹脂,其中基於矽膠樹脂為100 wt%,第二矽膠樹脂為20 wt%至33 wt%,且第一矽膠樹脂的黏性大於第二矽膠樹脂的黏性。According to one embodiment of the present invention, the aforementioned silicone resin comprises a first silicone resin, wherein the silicone-based resin is 100 wt% and the first silicone resin is 67 wt% to 80 wt%; and a second silicone resin, wherein the silicone-based resin is 100 wt% and the second silicone resin is 20 wt% to 33 wt%, and the viscosity of the first silicone resin is greater than that of the second silicone resin.
根據本發明之一實施例,上述矽膠樹脂包含聚甲基矽氧烷、聚二甲基矽氧烷及苯基聚三甲基矽氧烷之至少一者。According to one embodiment of the present invention, the aforementioned silicone resin comprises at least one of polymethylsiloxane, polydimethylsiloxane, and phenyl polytrimethylsiloxane.
根據本發明之一實施例,上述交聯劑包含甲基氫矽氧烷及/或三乙氧基聚乙基氫矽氧烷。According to one embodiment of the present invention, the crosslinking agent comprises methylhydrosiloxane and/or triethoxypolyethylhydrosiloxane.
根據本發明之一實施例,上述錨固劑包含2,3-環氧丙基丙基三甲氧基矽烷、十四甲基六矽氧烷及苯基丙基矽氧烷之至少一者。According to one embodiment of the present invention, the anchoring agent comprises at least one of 2,3-epoxypropylpropyltrimethoxysilane, tetradecyl hexasiloxane and phenylpropylsiloxane.
根據本發明之一實施例,上述催化劑包含有機鉑化合物、有機鉍化合物及有機鈦化合物之至少一者。According to one embodiment of the present invention, the catalyst comprises at least one of an organic platinum compound, an organic bismuth compound, and an organic titanium compound.
根據本發明之另一態樣,提供一種用於巨量轉移的膠膜結構,其係包含第一離型層、設置在第一離型層之下的第二離型層以及設置在第一離型層及第二離型層之間的黏著層,其中黏著層包含上述態樣之用於巨量轉移的黏著劑組成物。According to another aspect of the present invention, a film structure for mass transfer is provided, comprising a first release layer, a second release layer disposed below the first release layer, and an adhesive layer disposed between the first release layer and the second release layer, wherein the adhesive layer comprises the adhesive composition for mass transfer of the above aspect.
根據本發明之一實施例,上述黏著層的厚度為1 μm至50 μm。According to one embodiment of the present invention, the thickness of the adhesive layer is from 1 μm to 50 μm.
根據本發明之一實施例,上述黏著層與第一離型層或第二離型層的離型力為0.1 g/cm至0.5 g/cm。According to one embodiment of the present invention, the release force between the adhesive layer and the first release layer or the second release layer is 0.1 g/cm to 0.5 g/cm.
根據本發明之一實施例,上述黏著層的耐熱溫度為大於350℃。According to one embodiment of the present invention, the heat resistance temperature of the adhesive layer is greater than 350°C.
應用本發明之用於巨量轉移的黏著劑組成物及膠膜結構,藉由特定重量比的交聯劑、錨固劑及催化劑,以使黏著層的離型力下降,並提高其耐熱溫度及對於特定波長之對位光線的穿透度。By applying the adhesive composition and film structure of the present invention for mass transfer, crosslinking agent, anchoring agent and catalyst in a specific weight ratio can reduce the release force of the adhesive layer and improve its heat resistance temperature and transmittance to parallax of a specific wavelength.
以下揭露提供許多不同實施例或例示,以實施發明的不同特徵。以下敘述之組件和配置方式的特定例示是為了簡化本揭露。這些當然僅是做為例示,其目的不在構成限制。舉例而言,第一特徵形成在第二特徵之上或上方的描述包含第一特徵和第二特徵有直接接觸的實施例,也包含有其他特徵形成在第一特徵和第二特徵之間,以致第一特徵和第二特徵沒有直接接觸的實施例。The following disclosure provides numerous different embodiments or illustrations to implement various features of the invention. The specific examples of components and configurations described below are for the purpose of simplifying this disclosure. These are, of course, merely illustrative and are not intended to be limiting. For example, the description of a first feature being formed on or above a second feature includes embodiments where the first and second features are in direct contact, as well as embodiments where other features are formed between the first and second features such that the first and second features are not in direct contact.
再者,空間相對性用語,例如「下方(beneath)」、「在…之下(below)」、「低於(lower)」、「在…之上(above)」、「高於(upper)」等,是為了易於描述圖式中所繪示的零件或特徵和其他零件或特徵的關係。空間相對性用語除了圖式中所描繪的方向外,還包含元件在使用或操作時的不同方向。裝置可以其他方式定向(旋轉90度或在其他方向),而本揭露所用的空間相對性描述也可以如此解讀。Furthermore, spatial relative terms, such as "beneath," "below," "lower," "above," and "upper," are used to easily describe the relationship between parts or features depicted in the drawings and other parts or features. In addition to the directions depicted in the drawings, spatial relative terms also include different orientations of the components during use or operation. The device may be oriented in other ways (rotated 90 degrees or in other directions), and the spatial relative descriptions used in this disclosure can also be interpreted in this way.
如本發明所使用的「大約(around)」、「約(about)」、「近乎 (approximately)」或「實質上(substantially)」一般係代表在所述之數值或範圍的百分之20以內、或百分之10以內、或百分之5以內。本文所述之數量值係近似值,表示即使未明確指出,仍可推斷用語「大約(around)」、「約(about)」、「近乎 (approximately)」或「實質上(substantially)」。As used herein, “around,” “about,” “approximately,” or “substantially” generally mean within 20 percent, 10 percent, or 5 percent of the stated value or range. The numerical values described herein are approximate, meaning that the terms “around,” “about,” “approximately,” or “substantially” can be inferred even if not explicitly stated.
承上所述,本發明提供一種用於巨量轉移的黏著劑組成物及膠膜結構,藉由特定重量比的交聯劑、錨固劑及催化劑,以使黏著層的離型力下降,並提高其耐熱溫度及對於特定波長之對位光線的穿透度。As stated above, the present invention provides an adhesive composition and film structure for mass transfer, which reduces the release force of the adhesive layer and improves its heat resistance temperature and transmittance to parallax of a specific wavelength by using crosslinking agent, anchoring agent and catalyst in a specific weight ratio.
本發明之用於巨量轉移的黏著劑組成物包含矽膠樹脂、交聯劑、錨固劑及催化劑。在一些實施例中,基於用於巨量轉移的黏著劑組成物為100 wt%,矽膠樹脂為約95 wt%至約99 wt%,且交聯劑、錨固劑及催化劑的總和為約1 wt%至約5 wt%。若矽膠樹脂的含量太少(例如小於95 wt%),則黏著劑組成物的黏性太低,無法在巨量轉移過程中有效黏著晶片;反之,若矽膠樹脂的含量太多(例如大於99 wt%),則其餘成分的含量太少,無法使黏著劑組成物所形成的黏著層具有足夠的光線穿透度,且離型力太大,進而造成搶膠的問題。The adhesive composition for mass transfer of the present invention comprises silicone resin, crosslinking agent, anchoring agent, and catalyst. In some embodiments, the adhesive composition for mass transfer is 100 wt%, the silicone resin is about 95 wt% to about 99 wt%, and the total amount of crosslinking agent, anchoring agent, and catalyst is about 1 wt% to about 5 wt%. If the silicone resin content is too low (e.g., less than 95 wt%), the adhesive composition will have too low tack and will not be able to effectively adhere the wafer during mass transfer. Conversely, if the silicone resin content is too high (e.g., greater than 99 wt%), the content of the remaining components will be too low, and the adhesive layer formed by the adhesive composition will not have sufficient light transmittance, and the release force will be too high, thus causing adhesive snatching problems.
在一些實施例中,矽膠樹脂包含聚甲基矽氧烷(CAS NO.:9004-73-3)、聚二甲基矽氧烷(CAS NO.: 63148-62-9)及苯基聚三甲基矽氧烷(CAS NO.: 2116-84-9)之至少一者。在一些實施例中,用於巨量轉移的黏著劑組成物的矽膠樹脂包含第一矽膠樹脂及第二矽膠樹脂,其中第一矽膠樹脂與第二矽膠樹脂之材料可為相同或不同,第一矽膠樹脂為具有較高黏度(例如黏度為約900 g/cm至約1000 g/cm)的矽膠樹脂,而第二矽膠樹脂為具有較低黏度(例如黏度為約0 g/cm至約1 g/cm)的矽膠樹脂。在前述實施例中,基於矽膠樹脂為100 wt%,第一矽膠樹脂為約67 wt%至約80 wt%,而第二矽膠樹脂為約20 wt%至約33 wt%。藉由控制第一矽膠樹脂與第二矽膠樹脂之間的含量為前述範圍,可使黏著劑組成物具有適當的黏性。In some embodiments, the silicone resin comprises at least one of polymethylsiloxane (CAS NO.: 9004-73-3), polydimethylsiloxane (CAS NO.: 63148-62-9), and phenyl polytrimethylsiloxane (CAS NO.: 2116-84-9). In some embodiments, the silicone resin of the adhesive composition used for mass transfer comprises a first silicone resin and a second silicone resin, wherein the materials of the first silicone resin and the second silicone resin may be the same or different, the first silicone resin being a silicone resin having a higher viscosity (e.g., a viscosity of about 900 g/cm to about 1000 g/cm) and the second silicone resin being a silicone resin having a lower viscosity (e.g., a viscosity of about 0 g/cm to about 1 g/cm). In the aforementioned embodiment, the silicone resin is 100 wt%, the first silicone resin is about 67 wt% to about 80 wt%, and the second silicone resin is about 20 wt% to about 33 wt%. By controlling the content of the first silicone resin and the second silicone resin within the aforementioned range, the adhesive composition can have suitable tackiness.
在一些實施例中,交聯劑、錨固劑及催化劑的重量比為1:2:4。由於交聯劑、錨固劑及催化劑的總含量為固定,故三者的含量會互相影響,須維持其含量比例在前述範圍,才可使黏著劑組成物所形成的黏著層具有較小的離型力、較佳的光線穿透度及較高的耐熱溫度。若錨固劑及/或催化劑的含量太多或交聯劑的含量太少,則黏著層對特定波長(例如240 nm至250 nm)之對位光線的穿透度不佳,不利於巨量轉移時的對位步驟;反之若錨固劑及/或催化劑的含量太少或交聯劑的含量太多,則黏著層的離型力太大且耐熱溫度較低,易發生搶膠及殘膠的狀況。In some embodiments, the weight ratio of crosslinking agent, anchoring agent, and catalyst is 1:2:4. Since the total content of crosslinking agent, anchoring agent, and catalyst is fixed, the content of the three will affect each other. Their content ratio must be maintained within the aforementioned range in order to ensure that the adhesive layer formed by the adhesive composition has lower release force, better light transmittance, and higher heat resistance temperature. If the anchoring agent and/or catalyst content is too high or the crosslinking agent content is too low, the adhesive layer will have poor penetration of alignment light at a specific wavelength (e.g., 240 nm to 250 nm), which is not conducive to the alignment step during mass transfer. Conversely, if the anchoring agent and/or catalyst content is too low or the crosslinking agent content is too high, the release force of the adhesive layer will be too high and the heat resistance temperature will be low, making it easy for adhesive to be squeezed and for adhesive residue to occur.
在一些具體例中,交聯劑可包含甲基氫矽氧烷(CAS NO.: 63148-57-2)及/或三乙氧基聚乙基氫矽氧烷(CAS NO.: 24979-95-1),錨固劑包含2,3-環氧丙基丙基三甲氧基矽烷(CAS NO.: 2530-83-8)、十四甲基六矽氧烷(CAS NO.: 107-52-8)及苯基丙基矽氧烷(CAS NO.: 68037-90-1)之至少一者,而催化劑包含有機鉑化合物(例如1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷鉑化合物(CAS NO.: 68478-92-2))、有機鉍化合物及有機鈦化合物之至少一者。In some specific examples, the crosslinking agent may comprise methylhydrosiloxane (CAS NO.: 63148-57-2) and/or triethoxypolyethylhydrosiloxane (CAS NO.: 24979-95-1), the anchoring agent may comprise at least one of 2,3-epoxypropylpropyltrimethoxysilane (CAS NO.: 2530-83-8), tetradecyl hexasiloxane (CAS NO.: 107-52-8), and phenylpropylsiloxane (CAS NO.: 68037-90-1), and the catalyst may comprise an organoplasmium compound (e.g., 1,3-divinyl-1,1,3,3-tetramethyldisiloxane platinum compound (CAS NO.: 24979-95-1)). 68478-92-2), at least one of an organic bismuth compound and an organic titanium compound.
請參閱圖1,其係繪示根據本發明一些實施例之用於巨量轉移的膠膜結構100的剖面視圖。膠膜結構100包含第一離型層110A、第二離型層110B及黏著層120,其中黏著層120設置在第一離型層110A與第二離型層110B之間。在一些實施例中,黏著層120的厚度為約1 μm至約50 μm,而第一離型層110A及第二離型層110B的厚度為約1 μm至約1000 μm。Please refer to Figure 1, which is a cross-sectional view of a film structure 100 for mass transfer according to some embodiments of the present invention. The film structure 100 includes a first release layer 110A, a second release layer 110B, and an adhesive layer 120, wherein the adhesive layer 120 is disposed between the first release layer 110A and the second release layer 110B. In some embodiments, the thickness of the adhesive layer 120 is from about 1 μm to about 50 μm, while the thicknesses of the first release layer 110A and the second release layer 110B are from about 1 μm to about 1000 μm.
在一些實施例中,黏著層120與第一離型層110A(或第二離型層110B)接觸的表面中心的線平均粗糙度(Ra)為約0.01 μm至約10 μm。在一些實施例中,第一離型層110A及第二離型層110B的霧度為約0.1%至100%。In some embodiments, the line-average roughness (Ra) of the surface center where the adhesive layer 120 contacts the first release layer 110A (or the second release layer 110B) is from about 0.01 μm to about 10 μm. In some embodiments, the haze of the first release layer 110A and the second release layer 110B is from about 0.1% to 100%.
黏著層120包含上述之用於巨量轉移的黏著劑組成物。在一些實施例中,黏著層120與第一離型層110A(或第二離型層110B)間的離型力為約0.1 g/cm至約0.5 g/cm。在一些實施例中,黏著層120的初黏性黏著力為約0.5 g/cm至約3 g/cm。補充說明的是,離型力係經ASTM D3330規範的拉力測試在25℃的溫度下所測得,而初黏性黏著力係利用初黏力測試儀依ASTM D3330拉力測試所測得。相較於習知黏著層所具有之大於2 g/cm的離型力,本發明之黏著層的離型力較小,故可避免搶膠的情形發生。Adhesive layer 120 comprises the aforementioned adhesive composition for mass transfer. In some embodiments, the release force between adhesive layer 120 and the first release layer 110A (or the second release layer 110B) is approximately 0.1 g/cm to approximately 0.5 g/cm. In some embodiments, the initial tack of adhesive layer 120 is approximately 0.5 g/cm to approximately 3 g/cm. It should be noted that the release force is measured by a tensile test according to ASTM D3330 at a temperature of 25°C, while the initial tack is measured using an initial tack tester according to the ASTM D3330 tensile test. Compared to the release force of conventional adhesive layers, which is greater than 2 g/cm, the release force of the adhesive layer of this invention is smaller, thus avoiding the occurrence of adhesive snatching.
在一些實施例中,黏著層120的耐熱溫度為大於約350℃。補充說明的是,前述之「耐熱溫度」為「T d(5%)」(decomposition temperature at 5% weight loss),表示黏著層加熱裂解至起始重量損失5%時的溫度,其係利用熱重分析儀來評估。相較於習知黏著層小於320℃的耐熱溫度,本發明的黏著層120可具有較高的耐熱溫度,藉以可避免在後續移除巨量轉移膠膜時在LED晶片表面發生殘膠的情形。 In some embodiments, the heat resistance temperature of the adhesive layer 120 is greater than approximately 350°C. It should be noted that the aforementioned "heat resistance temperature" refers to "T d (5%)" (decomposition temperature at 5% weight loss), representing the temperature at which the adhesive layer decomposes upon heating to a point of 5% initial weight loss, which is evaluated using a thermogravimetric analyzer. Compared to conventional adhesive layers with heat resistance temperatures below 320°C, the adhesive layer 120 of this invention can have a higher heat resistance temperature, thereby preventing adhesive residue from forming on the LED chip surface during subsequent removal of the large amount of transfer film.
在一些實施例中,黏著層120對於波長240 nm至250 nm的光線具有大於約95%的穿透度。補充說明的是,穿透度係在將第一離型層110A及第二離型層110B撕除後,再利用分光光度計量測。相較於習知黏著層對波長240 nm至250 nm的光線之穿透度為小於90%,本發明之黏著層120具有較高的穿透度,則在巨量轉移製程時,較易進行LED晶片的對位。In some embodiments, the adhesive layer 120 has a transmittance of greater than approximately 95% for light with wavelengths of 240 nm to 250 nm. It should be noted that the transmittance is measured using a spectrophotometer after the first release layer 110A and the second release layer 110B have been removed. Compared to conventional adhesive layers with transmittance of less than 90% for light with wavelengths of 240 nm to 250 nm, the adhesive layer 120 of this invention has higher transmittance, making LED chip alignment easier during mass transfer processes.
以下利用數個實施例以說明本發明之應用,然其並非用以限定本發明,本發明技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。 實施例1與比較例1至5 The following examples illustrate the application of the present invention, but they are not intended to limit the invention. Those skilled in the art can make various modifications and refinements without departing from the spirit and scope of the invention. Example 1 and Comparative Examples 1 to 5
實施例1與比較例1至5之用於巨量轉移的黏著劑組成物包含99 wt%的聚甲基矽氧烷做為矽膠樹脂,其中矽膠樹脂包含80 wt%的高黏性矽膠樹脂(黏度為1000 g/cm)及20 wt%的低黏性矽膠樹脂(黏度為0 g/cm)。黏著劑組成物還包含做為交聯劑的甲基氫矽氧烷、做為錨固劑的2,3-環氧丙基丙基三甲氧基矽烷及做為催化劑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷鉑化合物。交聯劑、錨固劑及催化劑三者的總含量為1 wt%。實施例1與比較例1至5的差異僅在於交聯劑、錨固劑及催化劑的重量比,其比例分別如表一所示。 實施例2及比較例6至10 The adhesive composition for mass transfer in Examples 1 and Comparative Examples 1 to 5 comprises 99 wt% polymethylsiloxane as a silicone resin, wherein the silicone resin comprises 80 wt% high-viscosity silicone resin (viscosity of 1000 g/cm) and 20 wt% low-viscosity silicone resin (viscosity of 0 g/cm). The adhesive composition also comprises methylhydrosiloxane as a crosslinking agent, 2,3-epoxypropylpropyltrimethoxysilane as an anchoring agent, and 1,3-divinyl-1,1,3,3-tetramethyldisiloxane platinum compound as a catalyst. The total content of the crosslinking agent, anchoring agent, and catalyst is 1 wt%. The only difference between Example 1 and Comparative Examples 1 to 5 is the weight ratio of the crosslinking agent, anchoring agent, and catalyst, as shown in Table 1. Examples 2 and Comparative Examples 6 to 10
實施例2及比較例6至10分別為與實施例1與比較例1至5具有相似組成的黏著劑組成物,其差異僅在於實施例2及比較例6至10之用於巨量轉移的黏著劑組成物包含97.5 wt%的聚甲基矽氧烷做為矽膠樹脂,其中矽膠樹脂包含75 wt%的高黏性矽膠樹脂及25 wt%的低黏性矽膠樹脂。交聯劑、錨固劑及催化劑三者的總含量為2.5 wt%。實施例2與比較例6至10的差異僅在於交聯劑、錨固劑及催化劑的重量比,其比例分別如表二所示。 實施例3及比較例11至15 Examples 2 and Comparative Examples 6 to 10 are adhesive compositions with similar compositions to Examples 1 and Comparative Examples 1 to 5, respectively. The only difference is that the adhesive compositions of Examples 2 and Comparative Examples 6 to 10 for mass transfer contain 97.5 wt% polymethylsiloxane as the silicone resin, wherein the silicone resin contains 75 wt% high-viscosity silicone resin and 25 wt% low-viscosity silicone resin. The total content of the crosslinker, anchoring agent, and catalyst is 2.5 wt%. The only difference between Example 2 and Comparative Examples 6 to 10 is the weight ratio of the crosslinking agent, anchoring agent, and catalyst, as shown in Table 2. Examples 3 and Comparative Examples 11 to 15
實施例3及比較例11至15分別為與實施例1與比較例1至5具有相似組成的黏著劑組成物,其差異僅在於實施例3及比較例11至15之用於巨量轉移的黏著劑組成物包含95 wt%的聚甲基矽氧烷做為矽膠樹脂,其中矽膠樹脂包含67 wt%的高黏性矽膠樹脂及33 wt%的低黏性矽膠樹脂。交聯劑、錨固劑及催化劑三者的總含量為5 wt%。實施例3及比較例11至15的差異僅在於交聯劑、錨固劑及催化劑的重量比,其比例分別如表三所示。 評價方式 黏著層的黏著力 Examples 3 and Comparative Examples 11 to 15 are adhesive compositions with similar compositions to Examples 1 and Comparative Examples 1 to 5, respectively. The only difference is that the adhesive compositions of Examples 3 and Comparative Examples 11 to 15 for mass transfer contain 95 wt% polymethylsiloxane as the silicone resin, wherein the silicone resin contains 67 wt% high-viscosity silicone resin and 33 wt% low-viscosity silicone resin. The total content of the crosslinker, anchoring agent, and catalyst is 5 wt%. The only difference between Example 3 and Comparative Examples 11 to 15 is the weight ratio of the crosslinking agent, anchoring agent, and catalyst, as shown in Table 3. Evaluation Method Adhesive Strength of the Adhesive Layer
黏著層的黏著力係利用初黏力測試儀依ASTM D3330拉力測試所測得,實施例1至3及比較例1至15的檢測結果係如表一至表三所示。 黏著層與離型層的離型力(g/cm) The adhesive force of the adhesive layer was measured using an initial tack tester according to ASTM D3330 tensile test. The test results for Examples 1 to 3 and Comparative Examples 1 to 15 are shown in Tables 1 to 3. Release Force of Adhesive Layer and Release Layer (g/cm)
黏著層與離型層的離型力(g/cm) 係經ASTM D3330規範的拉力測試在25℃的溫度下所測得,實施例1至3及比較例1至15的檢測結果係如表一至表三所示。 耐熱溫度 The release force (g/cm) of the adhesive layer and release layer was measured at 25°C using the tensile test specified in ASTM D3330. The test results for Examples 1 to 3 and Comparative Examples 1 to 15 are shown in Tables 1 to 3. Heat Resistance Temperature
耐熱溫度係利用熱重分析儀(TGA,廠牌:TA,型號:Q-500)分析黏著劑組成物於氮氣(N 2)氣氛下由室溫25℃升溫至500℃,以每分鐘20℃的升溫速率進行檢測。當重量損失度達5%時,定義此時的熱裂解溫度為該暫時接著劑組成物之耐熱溫度。實施例1至3及比較例1至15的檢測結果係如表一至表三所示。 穿透度 The heat resistance temperature was determined using a thermogravimetric analyzer (TGA, brand: TA, model: Q-500) by analyzing the adhesive composition under nitrogen ( N2 ) atmosphere as it was heated from room temperature (25°C) to 500°C at a heating rate of 20°C per minute. The thermal decomposition temperature at which a weight loss of 5% was reached was defined as the heat resistance temperature of the temporary adhesive composition. The test results for Examples 1 to 3 and Comparative Examples 1 to 15 are shown in Tables 1 to 3. Penetration
利用分光光度計(UV/Vis Spectrophotometer;廠牌:HITACHI,型號:U-4100) 以每分鐘600nm的掃描速率量測黏著劑組成物對波長240 nm至250 nm的光線之穿透度。實施例1至3及比較例1至15的檢測結果係如表一至表三所示。The transmittance of the adhesive composition to light with wavelengths from 240 nm to 250 nm was measured using a spectrophotometer (UV/Vis Spectrophotometer; manufacturer: HITACHI, model: U-4100) at a scanning rate of 600 nm per minute. The detection results of Examples 1 to 3 and Comparative Examples 1 to 15 are shown in Tables 1 to 3.
表一
表二
表三
根據以上表一至表三,當催化劑與交聯劑兩者間的含量差異不顯著時(例如比較例1至3、比較例6至8及比較例11至13),因在交聯劑、錨固劑及催化劑的總含量為固定的情況下,催化劑的相對含量太少,而不足以提高矽膠樹脂與交聯劑之間的反應速率時,會令矽膠樹脂與交聯劑之間的交聯程度不足,致使所形成之黏著層的柔軟性偏高,與離型層的接著力會相對應提高,則所得之膠膜結構的黏著層與離型層的離型力太大,且耐熱溫度較低;反之,當催化劑的相對含量太多時,因催化劑的金屬粒子會影響光線的穿透性,則所得之黏著層對波長為240 nm至250 nm之光線的穿透度較低。惟有當交聯劑、錨固劑及催化劑的重量比為1:2:4時,所得之黏著層才能兼具較小的離型力、較高的耐熱溫度及對波長為240 nm至250 nm之光線的較高穿透度,且可具有適當的黏著層黏著力。According to Tables 1 to 3 above, when the difference in content between the catalyst and the crosslinker is not significant (e.g., Comparative Examples 1 to 3, Comparative Examples 6 to 8, and Comparative Examples 11 to 13), because the total content of crosslinker, anchoring agent, and catalyst is fixed, the relative content of the catalyst is too low to increase the reaction rate between the silicone resin and the crosslinker. This will lead to a decrease in the reaction rate between the silicone resin and the crosslinker. Insufficient crosslinking between crosslinkers results in a high degree of flexibility in the formed adhesive layer, which in turn increases the adhesion to the release layer. Consequently, the release force between the adhesive layer and the release layer in the resulting film structure is too large, and the heat resistance temperature is low. Conversely, when the relative content of catalyst is too high, the metal particles of the catalyst will affect the light transmittance, resulting in a lower transmittance of the adhesive layer to light with wavelengths of 240 nm to 250 nm. Only when the weight ratio of crosslinker, anchoring agent and catalyst is 1:2:4 can the resulting adhesive layer have both low release force, high heat resistance temperature and high transmittance to light with wavelengths of 240 nm to 250 nm, and also have appropriate adhesive layer adhesion.
根據上述實施例,本發明之用於巨量轉移的黏著劑組成物及巨量轉移的膠膜結構,用於巨量轉移的黏著劑組成物藉由特定重量比的交聯劑、錨固劑及催化劑,可使所得之黏著層與離型層的離型力下降,並提高黏著層的耐熱溫度及對於特定波長之對位光線的穿透度。According to the above embodiments, the adhesive composition for mass transfer and the adhesive film structure for mass transfer of the present invention, the adhesive composition for mass transfer, by means of a specific weight ratio of crosslinking agent, anchoring agent and catalyst, can reduce the release force of the resulting adhesive layer and release layer, and improve the heat resistance temperature of the adhesive layer and the transmittance of the alignment light to a specific wavelength.
雖然本發明已以數個實施例揭露如上,然其並非用以限定本發明,在本發明所屬技術領域中任何具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed above with several embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the art to which the present invention pertains may make various modifications and alterations without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be determined by the appended patent application.
100:膠膜結構 110A:第一離型層 110B:第二離型層 120:黏著層 100: Adhesive film structure 110A: First release layer 110B: Second release layer 120: Adhesive layer
根據以下詳細說明並配合附圖閱讀,使本揭露的態樣獲致較佳的理解。需注意的是,如同業界的標準作法,許多特徵並不是按照比例繪示的。事實上,為了進行清楚討論,許多特徵的尺寸可以經過任意縮放。 [圖1]係繪示根據本發明一些實施例之巨量轉移的膠膜結構的剖面視圖。 A better understanding of the features disclosed herein will be achieved by referring to the following detailed description and accompanying figures. It should be noted that, as is standard practice in the industry, many features are not drawn to scale. In fact, the dimensions of many features can be arbitrarily scaled for clarity of discussion. [Figure 1] is a cross-sectional view illustrating a mass transfer film structure according to some embodiments of the present invention.
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100:膠膜結構 100: Film Structure
110A:第一離型層 110A: First release layer
110B:第二離型層 110B: Second release layer
120:黏著層 120: Adhesive layer
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| TW202104439A (en) * | 2019-03-29 | 2021-02-01 | 日商陶氏東麗股份有限公司 | Room-temperature curable organopolysiloxane composition and protective or adhesive composition for electric/electronic articles |
| TW202206506A (en) * | 2019-04-22 | 2022-02-16 | 南韓商三星Sdi股份有限公司 | Silicone-based adhesive protective film and optical member comprising the same |
| TW202219185A (en) * | 2020-08-21 | 2022-05-16 | 日商陶氏東麗股份有限公司 | Curable organopolysiloxane composition, thermally conductive member and heat dissipation structure |
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| TW202206506A (en) * | 2019-04-22 | 2022-02-16 | 南韓商三星Sdi股份有限公司 | Silicone-based adhesive protective film and optical member comprising the same |
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