TWI901967B - Template generating apparatus, drawing system, template generating method and computer readable program - Google Patents
Template generating apparatus, drawing system, template generating method and computer readable programInfo
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- TWI901967B TWI901967B TW112121550A TW112121550A TWI901967B TW I901967 B TWI901967 B TW I901967B TW 112121550 A TW112121550 A TW 112121550A TW 112121550 A TW112121550 A TW 112121550A TW I901967 B TWI901967 B TW I901967B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/708—Mark formation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
本發明係有關於一種用以生成被使用於描繪裝置中的基板的對準(alignment)之模板(template)之技術。 [相關申請案的參照] 本申請案係主張2022年9月22日所申請的日本專利申請案JP2022-151168的優先權,將日本專利申請案JP2022-151168的全部的揭示內容援用於本申請案。 This invention relates to a technique for generating an alignment template for a substrate used in a drawing apparatus. [Reference to Related Applications] This application claims priority to Japanese Patent Application JP2022-151168, filed on September 22, 2022, and incorporates the entire disclosure of Japanese Patent Application JP2022-151168 into this application.
以往,對形成於半導體基板、印刷基板、有機EL(electroluminescence;電致發光)顯示裝置或者液晶顯示裝置用的玻璃基板等(以下稱為「基板」)之感光材料照射光線,藉此進行圖案(pattern)的描繪。在用以進行此種描繪之描繪裝置中進行對準處理,對準處理係檢測設置於基板上的對準標記的位置並自動地調節圖案的描繪位置。Conventionally, light is shone onto photosensitive materials formed on semiconductor substrates, printed circuit boards, glass substrates for organic EL (electroluminescence) display devices, or liquid crystal display devices (hereinafter referred to as "substrates") to draw patterns. In the drawing apparatus used for this drawing, an alignment process is performed, which detects the position of alignment marks set on the substrate and automatically adjusts the drawing position of the pattern.
近年來,在對於印刷基板的描繪中,為了使能從一片基板獲取的切片(piece)數量增加,謀求刪減用以配置對準標記之空間。因此,進行將基板上的圖案的一部分作為對準標記來利用之設計,而無須於基板設置對準專用的標記。In recent years, in the design of printed circuit boards, in order to increase the number of pieces that can be obtained from a single board, there has been a desire to reduce the space used for aligning marks. Therefore, designs have been developed that utilize a portion of the pattern on the board as aligning marks, eliminating the need for dedicated aligning marks on the board.
例如,在日本特開2013-171988號公報(文獻1)的曝光裝置中,在拍攝基板上的圖案所獲得的圖像內,該圖案的一部分係作為基準標記模式(亦即模板)來設定並預先登錄,該基準標記模式係被利用於對準處理。而且,當欲曝光的基板被搬入至曝光裝置時,藉由攝影機(camera)拍攝該基板上的圖案的一部分,進行所獲得的圖像與該基準標記模式之間的圖案匹配(pattern matching),並進行該基板的對準處理。For example, in the exposure apparatus disclosed in Japanese Patent Application Publication No. 2013-171988 (Document 1), a portion of the pattern on the substrate is set and pre-registered as a reference mark pattern (i.e., a template) in the image obtained by photographing the pattern on the substrate. This reference mark pattern is used for alignment processing. Furthermore, when the substrate to be exposed is moved into the exposure apparatus, a portion of the pattern on the substrate is photographed by a camera, and pattern matching is performed between the obtained image and the reference mark pattern to align the substrate.
另一方面,在日本特開2000-236007號公報(文獻2)中提出一種技術,在掃描電子顯微鏡中的圖案的自動測定長度中,從CAD(Computer Aided Design;電腦輔助設計)資料讀取任意的區域的圖案資料,並從該圖案資料擷取圖案輪廓邊緣資料且生成模板邊緣資料。On the other hand, Japanese Patent Application Publication No. 2000-236007 (Document 2) proposes a technique that, in the automatic length measurement of patterns in scanning electron microscopes, reads pattern data of an arbitrary area from CAD (Computer Aided Design) data, extracts pattern outline edge data from the pattern data, and generates template edge data.
然而,在於描繪裝置中針對基板之描繪資料的解析度與用以拍攝基板上的圖案之攝影機的解析度不同之情形中,當配合該攝影機的解析度從CAD資料生成二值的模板時,會有產生量化誤差(quantization error)之疑慮。具體而言,在CAD資料中的圖案的邊緣從攝影機的像素的邊界偏離之部位中,會不明瞭包含該邊緣之像素的值是二值(白色或者黑色)中的哪一個。因此,會有所生成的模板中的圖案的形狀以及重心位置與實際的圖案的形狀以及重心位置不同之可能性,從而難以提升對準精密度。However, in cases where the resolution of the drawing data for the substrate in the drawing device differs from the resolution of the camera used to capture the pattern on the substrate, there is a concern about quantization error when generating a binary template from the CAD data to match the camera's resolution. Specifically, in areas where the edges of the pattern in the CAD data deviate from the pixel boundaries of the camera, it becomes unclear whether the pixel containing that edge has a binary value (white or black). Therefore, there is a possibility that the shape and center of gravity of the pattern in the generated template will differ from the actual shape and center of gravity of the pattern, making it difficult to improve alignment accuracy.
本發明係著眼於一種用以生成被使用於描繪裝置中的基板的對準之模板之模板生成裝置,目的在於提升描繪裝置中的基板的對準精密度。The present invention relates to a template generating apparatus for generating an alignment template for a substrate used in a drawing apparatus, with the aim of improving the alignment accuracy of the substrate in the drawing apparatus.
本發明的態樣1為一種模板生成裝置,係用以生成模板,前述模板係被使用於描繪裝置中的基板的對準;前述模板生成裝置係具備:區域選擇部,係從圖案電腦輔助設計資料選擇包含圖案要素的至少一部分之預定大小的模板區域,前述圖案電腦輔助設計資料為設置於基板上之圖案的電腦輔助設計資料;以及模板生成部,係以與前述描繪裝置的描繪用解析度不同的前述描繪裝置的拍攝部的拍攝用解析度將前述圖案電腦輔助設計資料的前述模板區域予以網格化(rasterize),藉此生成灰階(gray scale)的模板。前述模板生成部係針對前述模板所含有的複數個像素,將與前述圖案要素對應的像素的像素值設定成第一像素值,將與背景區域對應的像素的像素值設定成第二像素值,將邊緣含有像素的像素值設定成前述第一像素值與前述第二像素值之間的第三像素值,前述邊緣含有像素為包含前述圖案要素的邊緣之像素。Specimen 1 of the present invention is a template generation apparatus for generating a template used for alignment of a substrate in a drawing apparatus. The template generation apparatus comprises: a region selection unit that selects a template region of a predetermined size containing at least a portion of the pattern elements from pattern computer-aided design data, wherein the pattern computer-aided design data is computer-aided design data of a pattern disposed on the substrate; and a template generation unit that rasterizes the template region of the pattern computer-aided design data at a resolution different from the drawing resolution of the drawing apparatus, using the imaging resolution of the imaging unit of the drawing apparatus, thereby generating a grayscale template. The aforementioned template generation unit sets the pixel value of the pixel corresponding to the aforementioned pattern element as the first pixel value, sets the pixel value of the pixel corresponding to the background area as the second pixel value, and sets the pixel value of the edge-containing pixel as the third pixel value between the aforementioned first pixel value and the aforementioned second pixel value for the plurality of pixels contained in the aforementioned template. The aforementioned edge-containing pixel is the pixel containing the edge of the aforementioned pattern element.
依據本發明,能提升描繪裝置中的基板的對準精密度。According to the present invention, the alignment precision of the substrate in the drawing device can be improved.
本發明的態樣2係如態樣1所記載之模板生成裝置,其中前述第三像素值係基於前述邊緣含有像素中的前述邊緣的位置來設定。The present invention, in its second state, is a template generation apparatus as described in the first state, wherein the aforementioned third pixel value is set based on the position of the aforementioned edge among the aforementioned edge-containing pixels.
本發明的態樣3係如態樣1所記載之模板生成裝置,其中前述第三像素值係基於前述邊緣含有像素中的前述圖案要素的佔有率來設定。The present invention, in its third state, is a template generation device as described in the first state, wherein the aforementioned third pixel value is set based on the occupancy rate of the aforementioned pattern element in the aforementioned edge-containing pixels.
本發明的態樣4係如態樣1(亦可為態樣1至態樣3中任一態樣)所記載之模板生成裝置,其中進一步地具備:模板修正部,係基於藉由前述拍攝部所取得的前述模板區域的拍攝圖像來修正前述模板的前述邊緣含有像素的像素值。The present invention's sample 4 is a template generation device as described in sample 1 (or any one of samples 1 to 3), further comprising: a template correction unit, which corrects the pixel values of the aforementioned edge containing pixels of the aforementioned template based on the captured image of the aforementioned template area obtained by the aforementioned capturing unit.
本發明亦著眼於一種描繪系統。本發明的態樣5為一種描繪系統,係具備:如態樣1至態樣4中任一態樣所記載之模板生成裝置;以及描繪裝置,係使用藉由前述模板生成裝置所生成的前述模板來進行基板的對準,對前述基板照射光線並進行描繪。前述描繪裝置係具備:台(stage),係保持於上表面上預先設置有前述圖案的前述基板;描繪頭,係對前述基板的前述上表面照射經過調變的光線;掃描機構,係使前述台相對於前述描繪頭於與前述基板的前述上表面平行的掃描方向相對性地移動;拍攝部,係拍攝前述圖案的一部分;位置檢測部,係對藉由前述拍攝部所取得的拍攝圖像進行使用了前述模板的圖案匹配,藉此檢測前述基板的位置;記憶部,係記憶其他的圖案電腦輔助設計資料,前述其他的圖案電腦輔助設計資料為描繪於前述圖案上之其他的圖案的電腦輔助設計資料;資料生成部,係將前述其他的圖案電腦輔助設計資料予以網格化並生成網格資料(raster data);以及描繪控制部,係基於前述網格資料以及藉由前述位置檢測部所檢測到的前述基板的位置來控制前述描繪頭以及前述掃描機構,藉此執行朝相對於前述描繪頭於前述掃描方向相對移動的前述基板描繪前述其他的圖案。This invention also focuses on a drawing system. Version 5 of this invention is a drawing system comprising: a template generation device as described in any of versions 1 to 4; and a drawing device that aligns a substrate using the template generated by the template generation device, illuminates the substrate with light, and performs drawing. The drawing device comprises: a stage for holding the substrate on which the aforementioned pattern is pre-set on its upper surface; a drawing head for illuminating the upper surface of the substrate with modulated light; a scanning mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate; an image capturing unit for capturing a portion of the aforementioned pattern; and a position detection unit for detecting the position of the template generated by the template generation device. The imaging unit performs pattern matching using the aforementioned template on the captured image to detect the position of the aforementioned substrate; the memory unit remembers other pattern computer-aided design data, which are computer-aided design data of other patterns drawn on the aforementioned pattern; the data generation unit meshes the aforementioned other pattern computer-aided design data and generates raster data; and the drawing control unit controls the aforementioned drawing head and the aforementioned scanning mechanism based on the aforementioned raster data and the position of the aforementioned substrate detected by the aforementioned position detection unit, thereby executing the drawing of the aforementioned other patterns on the aforementioned substrate that is moving relative to the aforementioned drawing head in the aforementioned scanning direction.
本發明亦著眼於一種用以生成被使用於描繪裝置中的基板的對準之模板之模板生成方法。本發明的態樣6為一種模板生成方法,係用以生成模板,前述模板係被使用於描繪裝置中的基板的對準;前述模板生成方法係具備:工序a,係從圖案電腦輔助設計資料選擇包含圖案要素的至少一部分之預定大小的模板區域,前述圖案電腦輔助設計資料為設置於基板上之圖案的電腦輔助設計資料;以及工序b,係以與前述描繪裝置的描繪用解析度不同的前述描繪裝置的拍攝部的拍攝用解析度將前述圖案電腦輔助設計資料的前述模板區域予以網格化,藉此生成灰階的模板。在前述工序b中,針對前述模板所含有的複數個像素,將與前述圖案要素對應的像素的像素值設定成第一像素值,將與背景區域對應的像素的像素值設定成第二像素值,將邊緣含有像素的像素值設定成前述第一像素值與前述第二像素值之間的第三像素值,前述邊緣含有像素為包含前述圖案要素的邊緣之像素。This invention also focuses on a template generation method for generating a template for alignment of a substrate used in a drawing apparatus. Embodiment 6 of this invention is a template generation method for generating a template used for alignment of a substrate in a drawing apparatus; the template generation method comprises: step a, selecting a template area of a predetermined size containing at least a portion of pattern elements from pattern computer-aided design data, wherein the pattern computer-aided design data is computer-aided design data of a pattern disposed on a substrate; and step b, meshing the template area of the pattern computer-aided design data at a resolution different from the drawing resolution of the drawing apparatus's imaging section, thereby generating a grayscale template. In the aforementioned step b, for the plurality of pixels contained in the aforementioned template, the pixel value of the pixel corresponding to the aforementioned pattern element is set to the first pixel value, the pixel value of the pixel corresponding to the background area is set to the second pixel value, and the pixel value of the edge-containing pixel is set to the third pixel value between the aforementioned first pixel value and the aforementioned second pixel value, wherein the aforementioned edge-containing pixel is the pixel containing the edge of the aforementioned pattern element.
本發明亦著眼於一種用以在生成被使用於描繪裝置中的基板的對準之模板時所使用之電腦可讀取的程式。本發明的態樣7為一種電腦可讀取的程式,係用以在生成被使用於描繪裝置中的基板的對準之模板時所使用;前述電腦可讀取的程式係被電腦執行,從而執行:工序a,係從圖案電腦輔助設計資料選擇包含圖案要素的至少一部分之預定大小的模板區域,前述圖案電腦輔助設計資料為設置於基板上之圖案的電腦輔助設計資料;以及工序b,係以與前述描繪裝置的描繪用解析度不同的前述描繪裝置的拍攝部的拍攝用解析度將前述圖案電腦輔助設計資料的前述模板區域予以網格化,藉此生成灰階的模板。在前述工序b中,針對前述模板所含有的複數個像素,將與前述圖案要素對應的像素的像素值設定成第一像素值,將與背景區域對應的像素的像素值設定成第二像素值,將邊緣含有像素的像素值設定成前述第一像素值與前述第二像素值之間的第三像素值,前述邊緣含有像素為包含前述圖案要素的邊緣之像素。This invention also focuses on a computer-readable program used to generate a template for alignment of a substrate used in a drawing device. The present invention, in form 7, is a computer-readable program used to generate a template for alignment of a substrate used in a drawing device. The computer-readable program is executed by a computer to perform: step a, selecting a template area of a predetermined size containing at least a portion of the pattern elements from pattern computer-aided design data, wherein the pattern computer-aided design data is computer-aided design data of a pattern disposed on the substrate; and step b, meshing the template area of the pattern computer-aided design data at a resolution different from the drawing resolution of the drawing device's imaging section, thereby generating a grayscale template. In the aforementioned step b, for the plurality of pixels contained in the aforementioned template, the pixel value of the pixel corresponding to the aforementioned pattern element is set to the first pixel value, the pixel value of the pixel corresponding to the background area is set to the second pixel value, and the pixel value of the edge-containing pixel is set to the third pixel value between the aforementioned first pixel value and the aforementioned second pixel value, wherein the aforementioned edge-containing pixel is the pixel containing the edge of the aforementioned pattern element.
參照隨附的圖式並藉由以下所進行的本發明的詳細的說明,更明瞭上述目的以及其他的目的、特徵、態樣以及優點。The above-mentioned objectives, as well as other objectives, features, forms, and advantages, will become clearer with reference to the accompanying diagrams and through the detailed description of the invention that follows.
圖1為顯示本發明的實施形態之一的描繪系統5之立體圖。描繪系統5係具備描繪裝置1以及電腦100。描繪裝置1為直接描繪裝置,用以將經過空間調變的略束狀的光線照射至基板9上的感光材料,於基板9上掃描該光線的照射區域,藉此進行圖案的描繪。在圖1中以箭頭顯示彼此正交的三個方向作為X方向、Y方向以及Z方向。在圖1所示的例子中,X方向以及Y方向為彼此垂直的水平方向,Z方向為鉛直方向。在其他的圖式中亦同樣。Figure 1 is a perspective view of a drawing system 5, one embodiment of the present invention. The drawing system 5 includes a drawing device 1 and a computer 100. The drawing device 1 is a direct drawing device used to irradiate a photosensitive material on a substrate 9 with a spatially modulated, slightly beam-shaped light, and to scan the irradiated area on the substrate 9 to draw a pattern. In Figure 1, the three mutually orthogonal directions are indicated by arrows as the X, Y, and Z directions. In the example shown in Figure 1, the X and Y directions are mutually perpendicular horizontal directions, and the Z direction is a vertical direction. The same applies in other figures.
基板9係例如俯視觀看時為略矩形狀的板狀構件。基板9係例如為多層印刷配線基板(以下簡稱為「印刷基板」)。在本實施形態中,於基板9的上表面91預先形成有藉由銅(Cu)等所形成的電路圖案,並於該電路圖案上設置有藉由感光材料所形成的阻劑(resist)膜。而且,在描繪裝置1中,於基板9的該阻劑膜描繪(亦即形成)有焊接圖案(solder pattern)。該焊接圖案係配合該電路圖案被描繪於該電路圖案上。此外,亦可於基板9設置有後述的位置檢測處理(亦即對準處理)專用的對準標記。The substrate 9 is, for example, a plate-shaped component that is slightly rectangular when viewed from above. The substrate 9 is, for example, a multilayer printed circuit board (hereinafter referred to as a "printed substrate"). In this embodiment, a circuit pattern formed of copper (Cu) or the like is pre-formed on the upper surface 91 of the substrate 9, and a resist film formed of a photosensitive material is disposed on the circuit pattern. Furthermore, in the drawing apparatus 1, a solder pattern is drawn (i.e., formed) on the resist film of the substrate 9. The solder pattern is drawn on the circuit pattern in conjunction with the circuit pattern. In addition, alignment marks for position detection processing (i.e., alignment processing) described later can also be provided on the substrate 9.
在以下的說明中,亦將預先形成於基板9的上表面91上之圖案(亦即電路圖案)稱為「第一圖案」。此外,亦將在描繪裝置1中被描繪於基板9的上表面91上之預定的圖案(亦即焊接圖案)稱為「第二圖案」或者「其他的圖案」。此外,基板9的種類以及形狀等亦可進行各種變更。此外,藉由描繪裝置1描繪於基板9之圖案亦未限定於焊接圖案,亦可進行各種變更。In the following description, the pattern (i.e., circuit pattern) pre-formed on the upper surface 91 of the substrate 9 will also be referred to as the "first pattern". Furthermore, the predetermined pattern (i.e., soldering pattern) drawn on the upper surface 91 of the substrate 9 in the drawing apparatus 1 will also be referred to as the "second pattern" or "other pattern". In addition, the type and shape of the substrate 9 can be varied. Furthermore, the pattern drawn on the substrate 9 by the drawing apparatus 1 is not limited to a soldering pattern and can be varied in various ways.
如圖1所示,描繪裝置1係具備台21、台移動機構22、拍攝部3以及描繪部4。台21為略平板狀的基板保持部,用以在拍攝部3以及描繪部4的下方(亦即-Z側)處從下側保持水平狀態的基板9。台21係例如為真空夾具(vacuum chuck),用以吸附並保持基板9的下表面。台21亦可具有真空夾具以外的構造,例如亦可為機械夾具(mechanical chuck)。載置於台21上的基板9的上表面91係與Z方向略垂直,且與X方向以及Y方向略平行。As shown in Figure 1, the drawing apparatus 1 includes a stage 21, a stage moving mechanism 22, a capturing unit 3, and a drawing unit 4. The stage 21 is a slightly flat substrate holding unit used to hold the substrate 9 horizontally from below (i.e., on the -Z side) below the capturing unit 3 and the drawing unit 4. The stage 21 is, for example, a vacuum chuck used to adsorb and hold the lower surface of the substrate 9. The stage 21 may also have a structure other than a vacuum chuck, for example, it may be a mechanical chuck. The upper surface 91 of the substrate 9 placed on the stage 21 is slightly perpendicular to the Z direction and slightly parallel to the X and Y directions.
台移動機構22為移動機構,用以將台21相對於拍攝部3以及描繪部4於水平方向(亦即與基板9的上表面91略平行的方向)相對性地移動。台移動機構22係具備第一移動機構23以及第二移動機構24。第二移動機構24係將台21沿著導軌(guide rail)於X方向直線移動。第一移動機構23係將台21與第二移動機構24沿著導軌於Y方向直線移動。第一移動機構23以及第二移動機構24的驅動源係例如為線性伺服馬達(linear servo motor)或者於滾珠螺桿(ball screw)安裝有馬達之構造。第一移動機構23以及第二移動機構24的構造亦可進行各種變更。The stage movement mechanism 22 is a movement mechanism used to move the stage 21 relative to the imaging unit 3 and the drawing unit 4 in the horizontal direction (that is, in a direction slightly parallel to the upper surface 91 of the substrate 9). The stage movement mechanism 22 includes a first movement mechanism 23 and a second movement mechanism 24. The second movement mechanism 24 moves the stage 21 along the guide rail in a straight line in the X direction. The first movement mechanism 23 moves the stage 21 and the second movement mechanism 24 along the guide rail in a straight line in the Y direction. The drive source for the first movement mechanism 23 and the second movement mechanism 24 is, for example, a linear servo motor or a structure with a motor mounted on a ball screw. The structures of the first movement mechanism 23 and the second movement mechanism 24 can also be modified in various ways.
亦可在描繪裝置1中設置有台旋轉機構,台旋轉機構係用以將於Z方向延伸的旋轉軸作為中心來旋轉台21。此外,亦可於描繪裝置1設置有台升降機構,台升降機構係用以將台21於Z方向移動。作為台旋轉機構,例如能夠利用伺服馬達。作為台升降機構,例如能夠利用線性伺服馬達。台旋轉機構以及台升降機構的構造亦可進行各種變更。Alternatively, a stage rotation mechanism can be provided in the drawing device 1. This stage rotation mechanism is used to rotate the stage 21 with a rotation axis extending in the Z direction as the center. Furthermore, a stage lifting mechanism can also be provided in the drawing device 1. This stage lifting mechanism is used to move the stage 21 in the Z direction. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage lifting mechanism can also be modified in various ways.
拍攝部3係具備排列於X方向的複數個(在圖1所示的例子中為兩個)拍攝頭31。各個拍攝頭31係被門形的頭支撐部30支撐於台21以及台移動機構22的上方,門形的頭支撐部30係跨越台21以及台移動機構22地設置。兩個拍攝頭31中,一個拍攝頭31係被固定於頭支撐部30,另一個拍攝頭31係能夠在頭支撐部30上於X方向移動。藉此,能夠變更兩個拍攝頭31之間的X方向中的距離。此外,拍攝部3的拍攝頭31的數量亦可為一個或者亦可為三個以上。The camera unit 3 has a plurality of camera heads 31 arranged in the X direction (two in the example shown in Figure 1). Each camera head 31 is supported above the stage 21 and the stage moving mechanism 22 by a gate-shaped head support 30, which spans across the stage 21 and the stage moving mechanism 22. Of the two camera heads 31, one camera head 31 is fixed to the head support 30, and the other camera head 31 can move in the X direction on the head support 30. This allows the distance between the two camera heads 31 in the X direction to be varied. Furthermore, the number of camera heads 31 in the camera unit 3 can be one or more.
各個拍攝頭31為具備有省略圖示的拍攝感測器以及光學系統之攝影機。各個拍攝頭31係例如為用以取得二維的圖像之區域攝影機(area camera)。拍攝感測器係具備排列成例如矩陣狀的複數個CCD(Charge Coupled Device;電荷耦合元件)等拍攝元件。在各個拍攝頭31中,從省略圖示的光源被導引至基板9的上表面91之照明光的反射光係經由光學系統被導引至拍攝感測器。拍攝感測器係接收來自基板9的上表面91的反射光,從而取得略矩形狀的拍攝區域的圖像。作為上述光源,能夠利用LED(Light Emitting Diode;發光二極體)等各種光源。此外,各個拍攝頭31亦可為線列式攝影機(line camera)等其他種類的攝影機。Each camera head 31 is a camera equipped with an image sensor (shown in a staggered diagram) and an optical system. Each camera head 31 is, for example, an area camera used to acquire two-dimensional images. The image sensor is an image capturing element such as a plurality of CCDs (Charge Coupled Devices) arranged in, for example, a matrix. In each camera head 31, reflected light from illumination light (shown in a staggered diagram) directed to the upper surface 91 of the substrate 9 is guided to the image sensor via the optical system. The image sensor receives the reflected light from the upper surface 91 of the substrate 9, thereby acquiring an image of a slightly rectangular image area. As the aforementioned light source, various light sources such as LEDs (Light Emitting Diodes) can be used. In addition, each camera 31 can also be other types of cameras such as line cameras.
描繪部4係具備排列於X方向以及Y方向的複數個描繪頭41。在圖1所示的例子中,六個描繪頭41係略直線狀地排列於X方向。各個描繪頭41係被門形的頭支撐部40支撐於台21以及台移動機構22的上方,門形的頭支撐部40係跨越台21以及台移動機構22地設置。頭支撐部40係配置於比拍攝部3的頭支撐部30還要+Y側。此外,亦可適當地變更描繪部4的描繪頭41的數量。例如,描繪頭41的數量係可為一個,亦可為兩個以上。The drawing unit 4 has a plurality of drawing heads 41 arranged in the X and Y directions. In the example shown in FIG1, the six drawing heads 41 are arranged in a slightly straight line in the X direction. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by a gate-shaped head support 40, which is provided across the stage 21 and the stage moving mechanism 22. The head support 40 is positioned on the +Y side of the head support 30 of the imaging unit 3. Furthermore, the number of drawing heads 41 of the drawing unit 4 can be appropriately varied. For example, the number of drawing heads 41 can be one or more.
各個描繪頭41係具備省略圖示的光源、光學系統以及空間光線調變元件。作為空間光線調變元件係能夠利用DMD(Digital Micro Mirror Device;數位微鏡元件)或者GLV(Grating Light Valve;柵光閥)(Silicon Light Machines公司(森尼韋爾(Sunnyvale)、加利福尼亞(California))的註冊商標)等各種元件。作為光源,能夠利用LD(Laser Diode;雷射二極體)等各種光源。複數個描繪頭41係具有略相同的構造。Each drawing head 41 is equipped with a light source, an optical system, and a spatial light modulation element (not shown). The spatial light modulation element can be a DMD (Digital Micro Mirror Device) or a GLV (Grating Light Valve) (a registered trademark of Silicon Light Machines, Inc., California). The light source can be a LD (Laser Diode) or other similar light source. The plurality of drawing heads 41 have a slightly identical structure.
在描繪裝置1中,一邊從描繪部4的複數個描繪頭41對基板9的上表面91上照射經過調變(亦即經過空間光線調變)的光線,一邊藉由台移動機構22將基板9於Y方向移動。藉此,來自複數個描繪頭41的光線的照射區域在基板9上於Y方向掃描,對基板9進行圖案的描繪。在以下的說明中,亦將Y方向稱為「掃描方向」,且亦將X方向稱為「寬度方向」。台移動機構22為掃描機構,用以將來自各個描繪頭41的光線的照射區域在基板9上於掃描方向移動。In the drawing apparatus 1, modulated (i.e., spatially modulated) light is irradiated onto the upper surface 91 of the substrate 9 from a plurality of drawing heads 41 of the drawing unit 4, while the substrate 9 is moved in the Y direction by a stage movement mechanism 22. In this way, the irradiated areas of the light from the plurality of drawing heads 41 are scanned on the substrate 9 in the Y direction, and a pattern is drawn on the substrate 9. In the following description, the Y direction is also referred to as the "scanning direction," and the X direction is also referred to as the "width direction." The stage movement mechanism 22 is a scanning mechanism used to move the irradiated areas of the light from each drawing head 41 on the substrate 9 in the scanning direction.
在描繪裝置1中,對於基板9的描繪亦可以所謂的單程(single pass)(單向(one pass))方式進行。具體而言,藉由台移動機構22,台21係相對於複數個描繪頭41於Y方向相對移動,來自複數個描繪頭41之光線的照射區域係在基板9的上表面91上於Y方向(亦即掃描方向)僅掃描一次。藉此,結束對於基板9的描繪。此外,在描繪裝置1中,亦可藉由重複地進行台21朝向Y方向的移動以及朝向X方向的步階移動(step shift)之多程(multi pass)方式對基板9進行描繪。在描繪裝置1中進行多程方式的描繪之情形中,Y方向為主掃描方向,X方向為副掃描方向。此外,台移動機構22的第一移動機構23為主掃描機構,用以使台21於主掃描方向移動;第二移動機構24為副掃描機構,用以使台21於副掃描方向移動。In the drawing apparatus 1, the drawing of the substrate 9 can also be performed in a single-pass (one-pass) manner. Specifically, using the stage movement mechanism 22, the stage 21 moves relative to the plurality of drawing heads 41 in the Y direction, and the illumination area of the light from the plurality of drawing heads 41 is scanned only once in the Y direction (i.e., the scanning direction) on the upper surface 91 of the substrate 9. This completes the drawing of the substrate 9. Alternatively, in the drawing apparatus 1, the substrate 9 can also be drawn in a multi-pass manner by repeatedly moving the stage 21 in the Y direction and making step shifts in the X direction. In the case of multi-pass drawing in the drawing apparatus 1, the Y direction is the main scanning direction, and the X direction is the secondary scanning direction. In addition, the first moving mechanism 23 of the station moving mechanism 22 is the main scanning mechanism, which is used to move the station 21 in the main scanning direction; the second moving mechanism 24 is the secondary scanning mechanism, which is used to move the station 21 in the secondary scanning direction.
圖2為顯示電腦100的構成之圖。電腦100為具備有處理器(processor)101、記憶體102、輸入輸出部103以及匯流排(bus)104之一般的電腦。匯流排104為用以連接處理器101、記憶體102以及輸入輸出部103之訊號電路。記憶體102係記憶各種資訊。記憶體102係例如讀出並記憶程式109a以及程式109b,程式109a以及程式109b為預先記憶於記憶媒體81之程式產品(program product)。記憶媒體81係例如為USB(Universal Serial Bus;通用序列匯流排)記憶體或者CD-ROM(Compact Disc Read Only Memory;唯讀光碟)。Figure 2 is a diagram showing the configuration of computer 100. Computer 100 is a typical computer equipped with a processor 101, memory 102, input/output unit 103, and bus 104. Bus 104 is a signal circuit used to connect processor 101, memory 102, and input/output unit 103. Memory 102 stores various information. Memory 102, for example, reads and stores programs 109a and 109b, which are program products pre-memorized in memory medium 81. The 81 series of memory media includes, for example, USB (Universal Serial Bus) memory or CD-ROM (Compact Disc Read Only Memory).
處理器101係依循記憶於記憶體102的電腦可讀取的程式109a、109b等,一邊利用記憶體102等一邊執行各種處理(例如數值計算、圖像處理)。輸入輸出部103係具備:鍵盤105以及滑鼠106,係接受來自操作者的輸入;以及顯示器107,係顯示來自處理器101的輸出等。The processor 101 follows computer-readable programs 109a, 109b, etc., stored in the memory 102, and performs various processing operations (such as numerical calculations and image processing) while utilizing the memory 102. The input/output unit 103 includes: a keyboard 105 and a mouse 106, which accept input from the operator; and a display 107, which displays the output from the processor 101.
在描繪系統5中,藉由電腦100執行程式109a,藉此實現圖3所示的控制部10的各個功能。控制部10為描繪裝置1的一部分。此外,在描繪系統5中,藉由電腦100執行程式109b,藉此實現圖4所示的模板生成裝置6的各個功能。圖3為顯示控制部10的功能之方塊圖,圖4為顯示模板生成裝置6的功能之方塊圖。在圖3中亦一併顯示控制部10以外的構成,在圖4中亦一併顯示模板生成裝置6以外的構成。In the drawing system 5, the computer 100 executes program 109a, thereby implementing the various functions of the control unit 10 shown in FIG3. The control unit 10 is part of the drawing device 1. Furthermore, in the drawing system 5, the computer 100 executes program 109b, thereby implementing the various functions of the template generation device 6 shown in FIG4. FIG3 is a block diagram showing the functions of the control unit 10, and FIG4 is a block diagram showing the functions of the template generation device 6. FIG3 also shows components other than the control unit 10, and FIG4 also shows components other than the template generation device 6.
圖3所示的控制部10係控制台移動機構22、拍攝部3以及描繪部4等。控制部10係具備記憶部111、拍攝控制部112、位置檢測部113、資料生成部114以及描繪控制部115。記憶部111係主要藉由記憶體102來實現,並預先記憶與描繪裝置1中的圖案的描繪相關的各種資訊。於記憶於記憶部111的資訊包含有例如:圖案CAD資料,為描繪於基板9之預定的第二圖案的CAD資料(以下亦稱為「第二CAD資料」);以及從模板生成裝置6傳送至描繪裝置1之資訊。從模板生成裝置6對描繪裝置1傳送例如被使用於後述的對準之模板等。The control unit 10 shown in Figure 3 includes a console moving mechanism 22, a camera unit 3, and a drawing unit 4. The control unit 10 includes a memory unit 111, a camera control unit 112, a position detection unit 113, a data generation unit 114, and a drawing control unit 115. The memory unit 111 is primarily implemented using memory 102 and pre-memorizes various information related to the drawing of patterns in the drawing device 1. The information memorized in the memory unit 111 includes, for example, pattern CAD data, CAD data of a predetermined second pattern drawn on the substrate 9 (hereinafter also referred to as "second CAD data"); and information transmitted from the template generation device 6 to the drawing device 1. The template generation device 6 transmits, for example, a template used for alignment as described later, to the drawing device 1.
拍攝控制部112、位置檢測部113、資料生成部114以及描繪控制部115係主要藉由處理器101來實現。拍攝控制部112係控制拍攝部3以及台移動機構22,藉此使拍攝部3拍攝基板9的上表面91的一部分並取得上文所說明的第一圖案的一部分的圖像(以下亦稱為「拍攝圖像」)。該拍攝圖像係例如為灰階的圖像。該拍攝圖像係朝記憶部111傳送並被儲存於記憶部111。The imaging control unit 112, position detection unit 113, data generation unit 114, and drawing control unit 115 are mainly implemented by the processor 101. The imaging control unit 112 controls the imaging unit 3 and the stage movement mechanism 22, thereby enabling the imaging unit 3 to photograph a portion of the upper surface 91 of the substrate 9 and obtain an image (hereinafter also referred to as "image") of a portion of the first pattern described above. The image is, for example, a grayscale image. The image is transmitted to and stored in the memory unit 111.
位置檢測部113係對上文所說明的第一圖案的拍攝圖像進行使用了預先記憶於記憶部111的模板之圖案匹配,藉此檢測台21上的基板9的位置(亦即基板9相對於描繪部4之相對位置)。資料生成部114係將上文所說明的第二CAD資料予以網格化並生成屬於網格資料的描繪資料(以下亦稱為「第二描繪資料」)。第二描繪資料係例如為運行長度資料(run length data)。The position detection unit 113 performs pattern matching on the captured image of the first pattern described above using a template pre-memorized in the memory unit 111, thereby detecting the position of the substrate 9 on the stage 21 (that is, the relative position of the substrate 9 to the drawing unit 4). The data generation unit 114 meshes the second CAD data described above and generates drawing data belonging to the mesh data (hereinafter also referred to as "second drawing data"). The second drawing data is, for example, run length data.
描繪控制部115係基於藉由資料生成部114所生成的第二描繪資料以及藉由位置檢測部113所檢測到的基板9的位置等來控制描繪部4以及台移動機構22,藉此一邊調節基板9上的描繪位置,一邊使描繪部4對基板9執行第二圖案的描繪。The drawing control unit 115 controls the drawing unit 4 and the stage movement mechanism 22 based on the second drawing data generated by the data generation unit 114 and the position of the substrate 9 detected by the position detection unit 113. In this way, the drawing unit 4 performs the drawing of the second pattern on the substrate 9 while adjusting the drawing position on the substrate 9.
此外,控制部10係可藉由可程式邏輯控制器(PLC;Programmable Logic Controller)或者電路基板等來實現,亦可藉由這些構件與一個以上的電腦的組合來實現。In addition, the control unit 10 can be implemented by a programmable logic controller (PLC) or a circuit board, or by combining these components with one or more computers.
圖4所示的模板生成裝置6為下述裝置:用以生成模板(亦即基準圖像),該模板係被使用於描繪裝置1中的基板9的對準。模板生成裝置6係具備記憶部61、區域選擇部62、模板生成部63以及模板修正部64。記憶部61係主要藉由記憶體102來實現,並預先記憶與模板的生成相關的各種資訊。於記憶於記憶部61的資訊包含有例如屬於上文所說明的第一圖案的CAD資料之圖案CAD資料(以下亦稱為「第一CAD資料」)。第一CAD資料係包含用以構成第一圖案之複數個圖案要素。The template generation apparatus 6 shown in Figure 4 is an apparatus for generating a template (i.e., a reference image) which is used for alignment of the substrate 9 in the drawing apparatus 1. The template generation apparatus 6 includes a memory unit 61, a region selection unit 62, a template generation unit 63, and a template correction unit 64. The memory unit 61 is mainly implemented by a memory 102 and pre-memorizes various information related to template generation. The information memorized in the memory unit 61 includes, for example, pattern CAD data belonging to the first pattern described above (hereinafter also referred to as "first CAD data"). The first CAD data includes a plurality of pattern elements constituting the first pattern.
區域選擇部62係從第一CAD資料選擇包含上文所說明的複數個圖案要素中的一個以上的圖案要素的至少一部分之預定大小的區域作為模板區域。模板生成部63係以拍攝部3的拍攝用解析度(亦即拍攝頭31的拍攝感測器的解析度)將第一CAD資料的模板區域予以網格化,藉此生成灰階的模板。該拍攝部3的拍攝用解析度係與描繪裝置1中的描繪部4的描繪用解析度不同。模板修正部64係因應需要修正藉由模板生成部63所生成的模板。藉由模板生成部63所生成的模板以及/或者藉由模板修正部64所修正的模板係被傳送至控制部10。The area selection unit 62 selects a predetermined-sized area from the first CAD data that includes at least a portion of one or more of the pattern elements described above as a template area. The template generation unit 63 generates a grayscale template by meshing the template area of the first CAD data using the imaging resolution of the imaging unit 3 (i.e., the resolution of the imaging sensor of the imaging head 31). The imaging resolution of the imaging unit 3 is different from the drawing resolution of the drawing unit 4 in the drawing device 1. The template correction unit 64 corrects the template generated by the template generation unit 63 as needed. The template generated by the template generation unit 63 and/or the template corrected by the template correction unit 64 are transmitted to the control unit 10.
此外,模板生成裝置6係可藉由可程式邏輯控制器(PLC)或者電路基板等來實現,亦可藉由這些構件與一個以上的電腦的組合來實現。Furthermore, the template generation device 6 can be implemented by a programmable logic controller (PLC) or a circuit board, or by combining these components with one or more computers.
圖5為顯示模板區域92的一例之圖。模板區域92為第一CAD資料所顯示之屬於第一圖案的一部分之較小的區域。模板區域92係比拍攝部3的各個拍攝頭31(參照圖1)的視野還要小。在圖5所示的例子中,於模板區域92包含有略矩形的一個圖案要素93。在圖5中,對圖案要素93賦予平行斜線,並以粗線條來顯示圖案要素93的邊緣(亦即圖案要素93與背景區域96之間的邊界)。在圖6中亦同樣。在實際的模板區域92中包含有一個以上的圖案要素的至少一部分,該一個以上的圖案要素係具有比圖5所例示的圖案要素93還要複雜的形狀。Figure 5 shows an example of a template area 92. The template area 92 is a small area that is part of the first pattern as shown in the first CAD data. The template area 92 is smaller than the field of view of each of the cameras 31 of the camera unit 3 (see Figure 1). In the example shown in Figure 5, the template area 92 contains a slightly rectangular pattern element 93. In Figure 5, the pattern element 93 is given parallel diagonal lines, and the edge of the pattern element 93 (i.e., the boundary between the pattern element 93 and the background area 96) is shown with thick lines. The same is true in Figure 6. The actual template area 92 contains at least a portion of more than one pattern element, which has a more complex shape than the pattern element 93 illustrated in Figure 5.
在圖5中以虛線顯示與上文所說明的描繪用解析度對應的像素94(以下亦稱為「描繪用像素94」)。複數個描繪用像素94係矩陣狀地配置於X方向以及Y方向。各個描繪用像素94係例如為一邊為1μm的略正方形。描繪用解析度為藉由描繪部4對基板9描繪圖案時之預定的解析度。In Figure 5, the pixels 94 corresponding to the drawing resolution described above (hereinafter also referred to as "drawing pixels 94") are shown in dashed lines. A plurality of drawing pixels 94 are arranged in a matrix along the X and Y directions. Each drawing pixel 94 is, for example, a slightly square with one side of 1 μm. The drawing resolution is the predetermined resolution used when drawing a pattern on the substrate 9 by the drawing unit 4.
圖6為下述圖:取代圖5所示的描繪用像素94,將與上文所說明的拍攝用解析度對應的像素95(以下亦稱為「拍攝用像素95」)配置於模板區域92。以虛線所示的複數個拍攝用像素95係矩陣狀地配置於X方向以及Y方向。各個拍攝用像素95係例如為一邊為4μm的略正方形。在圖5以及圖6所示的例子中,拍攝用像素95係比描繪用像素94還要大,拍攝用解析度係比描繪用解析度還要低。Figure 6 illustrates the following: Instead of the drawing pixel 94 shown in Figure 5, a pixel 95 (hereinafter also referred to as "shooting pixel 95") corresponding to the shooting resolution described above is arranged in the stencil area 92. The plurality of shooting pixels 95, shown by dashed lines, are arranged in a matrix along the X and Y directions. Each shooting pixel 95 is, for example, a slightly square shape with one side of 4 μm. In the examples shown in Figures 5 and 6, the shooting pixel 95 is larger than the drawing pixel 94, and the shooting resolution is lower than the drawing resolution.
如圖5所示,圖案要素93的-X側的邊緣931、+Y側的邊緣932、+X側的邊緣933以及-Y側的邊緣934係位於描繪用像素94的邊界上。此外,如圖6所示,圖案要素93的-X側的邊緣931以及圖案要素93的+Y側的邊緣932係位於拍攝用像素95的邊界上。另一方面,圖案要素93的+X側的邊緣933係從拍攝用像素95的邊界朝X方向偏離,且縱貫於Y方向排列的複數個拍攝用像素95。此外,圖案要素93的-Y側的邊緣934係從拍攝用像素95的邊界朝Y方向偏離,且橫貫於X方向排列的複數個拍攝用像素95。As shown in Figure 5, the edges 931, 932, 933, and 934 on the -X side of the pattern element 93 are located on the boundaries of the drawing pixel 94. Furthermore, as shown in Figure 6, the edges 931 and 932 on the -X side of the pattern element 93 are located on the boundaries of the shooting pixel 95. On the other hand, the edge 933 on the +X side of the pattern element 93 is a plurality of shooting pixels 95 arranged longitudinally along the Y direction, offset from the boundary of the shooting pixel 95 in the X direction. Furthermore, the edge 934 on the Y side of the pattern element 93 is a plurality of shooting pixels 95 that are offset from the boundary of the shooting pixel 95 in the Y direction and are arranged horizontally in the X direction.
圖7A以及圖7B為分別顯示比較例的模板70a、70b之圖。比較例的模板70a、70b為二值的模板,該二值的模板係藉由比較例的模板生成裝置以拍攝用解析度將模板區域92予以網格化而生成。在比較例的模板70a、70b中,與模板區域92的圖案要素93對應的模板要素707中的拍攝用像素95的像素值係被設定成「0(黑色)」,與背景區域96對應的模板背景區域708中的拍攝用像素95的像素值係被設定成「255(白色)」。Figures 7A and 7B show comparative templates 70a and 70b, respectively. The comparative templates 70a and 70b are binary templates, generated by the comparative template generation device by meshing the template area 92 at a photographic resolution. In the comparative templates 70a and 70b, the pixel value of the photographic pixel 95 in the template element 707 corresponding to the pattern element 93 of the template area 92 is set to "0 (black)," and the pixel value of the photographic pixel 95 in the template background area 708 corresponding to the background area 96 is set to "255 (white)."
如上所述,在圖6所示的模板區域92中,圖案要素93的邊緣931、932係位於拍攝用像素95的邊界上。因此,比較例的模板70a、70b中的模板要素707的-X側以及+Y側的邊緣701、702的位置係與模板區域92中的圖案要素93的邊緣931、932的位置略相同。在圖7A以及圖7B中以二點鏈線顯示圖案要素93。As described above, in the template area 92 shown in FIG. 6, the edges 931 and 932 of the pattern element 93 are located on the boundary of the shooting pixel 95. Therefore, the positions of the edges 701 and 702 on the -X and +Y sides of the template element 707 in the comparative templates 70a and 70b are slightly the same as the positions of the edges 931 and 932 of the pattern element 93 in the template area 92. The pattern element 93 is shown as a two-point chain in FIG. 7A and FIG. 7B.
另一方面,在圖6所示的模板區域92中,圖案要素93的邊緣933、934係從拍攝用像素95的邊界上偏離。因此,比較例的模板70a、70b中的模板要素707的+X側以及-Y側的邊緣703、704的位置係與模板區域92中的圖案要素93的邊緣933、934的位置不同。亦即,在比較例的模板70a、70b中,產生描繪用解析度與拍攝用解析度之間的差異所導致的量化誤差,且模板要素707的邊緣係偏離。On the other hand, in the template area 92 shown in FIG. 6, the edges 933 and 934 of the pattern element 93 are offset from the boundary of the shooting pixel 95. Therefore, the positions of the +X and -Y sides of the edges 703 and 704 of the template element 707 in the comparative templates 70a and 70b are different from the positions of the edges 933 and 934 of the pattern element 93 in the template area 92. That is, in the comparative templates 70a and 70b, quantization errors are generated due to the difference between the drawing resolution and the shooting resolution, and the edges of the template element 707 are offset.
具體而言,在比較例的模板70a中,模板要素707的邊緣703係從以二點鏈線所示的圖案要素93的邊緣933朝+X側偏離,模板要素707的邊緣704係從以二點鏈線所示的圖案要素93的邊緣934朝-Y側偏離。因此,在比較例的模板70a中,模板要素707係膨脹至比實際的圖案要素93還要+X側以及-Y側。Specifically, in the comparative template 70a, the edge 703 of template element 707 is offset towards the +X side from the edge 933 of pattern element 93 shown by the two-point chain, and the edge 704 of template element 707 is offset towards the -Y side from the edge 934 of pattern element 93 shown by the two-point chain. Therefore, in the comparative template 70a, template element 707 is expanded to be both +X and -Y sides larger than the actual pattern element 93.
此外,在比較例的模板70b中,模板要素707的邊緣703係從以二點鏈線所示的圖案要素93的邊緣933朝-X側偏離,模板要素707的邊緣704係從以二點鏈線所示的圖案要素93的邊緣934朝+Y側偏離。因此,在比較例的模板70a中,模板要素707係縮小至比實際的圖案要素93還要-X側以及+Y側。Furthermore, in the comparative template 70b, the edge 703 of template element 707 is offset towards the -X side from the edge 933 of pattern element 93 shown by the two-point chain, and the edge 704 of template element 707 is offset towards the +Y side from the edge 934 of pattern element 93 shown by the two-point chain. Therefore, in the comparative template 70a, template element 707 is reduced to be further offset towards the -X and +Y sides than the actual pattern element 93.
如上所述,在比較例的模板70a、70b中,模板要素707的形狀以及重心位置係與模板區域92中的圖案要素93的形狀以及重心位置不同。因此,在使用比較例的模板70a、70b來進行基板9的對準之情形中,會有基板9的對準精密度(亦即基板9的對位的精密度)降低之疑慮。此外,在比較例的模板生成裝置中,不明瞭從圖6所示的模板區域92生成模板70a以及模板70b的哪一個。因此,亦難以修正上文所說明的量化誤差並提升對準精密度。As described above, in the comparative templates 70a and 70b, the shape and center of gravity of template element 707 differ from those of pattern element 93 in template area 92. Therefore, when using the comparative templates 70a and 70b for substrate 9 alignment, there is a concern that the alignment precision of substrate 9 (i.e., the precise positioning of substrate 9) may be reduced. Furthermore, in the comparative template generation apparatus, it is unclear which of templates 70a and 70b is generated from the template area 92 shown in FIG. 6. Therefore, it is difficult to correct the quantization error described above and improve the alignment precision.
相對於此,在本實施形態的模板生成裝置6中,如圖8所示生成有灰階的模板71。在圖8中,以虛線顯示矩陣狀地排列於X方向以及Y方向的複數個拍攝用像素95的邊界,以二點鏈線顯示圖案要素93的邊緣931至934。In contrast, in the template generation apparatus 6 of this embodiment, a template 71 with grayscale is generated as shown in FIG8. In FIG8, the boundaries of a plurality of shooting pixels 95 arranged in a matrix in the X and Y directions are shown by dashed lines, and the edges 931 to 934 of the pattern elements 93 are shown by two-dot linked lines.
在模板71中,於複數個拍攝用像素95中之被圖案要素93的邊緣931至934圍繞的略矩形的區域中包含有整體的拍攝用像素95(亦即與圖案要素93對應的拍攝用像素95)的像素值係被設定成預定的第一像素值(例如0(黑色))。此外,於複數個拍攝用像素95中之被圖案要素93的邊緣931至934圍繞的略矩形的區域以外的區域中包含有整體的拍攝用像素95(亦即與圖5所示的背景區域96對應的拍攝用像素95)的像素值係被設定成預定的第二像素值(例如255(白色))。In template 71, the pixel value of the entire shooting pixel 95 (i.e., the shooting pixel 95 corresponding to the pattern element 93) contained within the roughly rectangular area surrounded by the edges 931 to 934 of the pattern element 93 among the plurality of shooting pixels 95 is set to a predetermined first pixel value (e.g., 0 (black)). Furthermore, the pixel value of the entire shooting pixel 95 contained within the area outside the roughly rectangular area surrounded by the edges 931 to 934 of the pattern element 93 among the plurality of shooting pixels 95 (i.e., the shooting pixel 95 corresponding to the background area 96 shown in FIG. 5) is set to a predetermined second pixel value (e.g., 255 (white)).
在模板71中,邊緣含有像素95a的像素值係被設定成第三像素值,邊緣含有像素95a為包含圖案要素93的邊緣之拍攝用像素95,第三像素值為第一像素值與第二像素值之間的像素值。第三像素值係例如為128(灰色),128(灰色)為第一像素值與第二像素值之間的中央的值。此外,所謂包含圖案要素93的邊緣之邊緣含有像素95a為該圖案要素93的邊緣通過邊界以外的部位之拍攝用像素95。在邊緣含有像素95a中,該圖案要素93的邊緣係與邊緣含有像素95a的邊界交叉,並從比邊緣含有像素95a的邊界還要外側的區域朝向被邊緣含有像素95a的邊界圍繞的內側的區域延伸。In template 71, the pixel value of edge containing pixel 95a is set to the third pixel value. Edge containing pixel 95a is the pixel 95 used for capturing the edge of the pattern element 93, and the third pixel value is the pixel value between the first pixel value and the second pixel value. The third pixel value is, for example, 128 (gray), which is the midpoint between the first pixel value and the second pixel value. Furthermore, the so-called edge containing pixel 95a of the edge containing pattern element 93 is the pixel 95 used for capturing the part of the edge of the pattern element 93 that extends beyond the boundary. In the edge containing pixel 95a, the edge of the pattern element 93 intersects with the boundary of the edge containing pixel 95a and extends from the area outside the boundary of the edge containing pixel 95a toward the area inside the boundary of the edge containing pixel 95a.
在圖8所示的例子中,在圖案要素93的+X側的端部中,分別包含有邊緣933的一部分之四個邊緣含有像素95a的像素值係被設定成第三像素值。此外,在圖案要素93的-Y側的端部中,分別包含有邊緣934的一部分之五個邊緣含有像素95a的像素值係被設定成第三像素值。此外,在圖案要素93的+X側且-Y側的角部中,一個邊緣含有像素95a係包含邊緣933的端部、邊緣934的端部以及邊緣933與邊緣934之間的交點。該一個邊緣含有像素95a的像素值亦如上所述般被設定成第三像素值。In the example shown in Figure 8, at the +X side end of pattern element 93, the pixel values of four edges containing pixels 95a, each comprising a portion of edge 933, are set to the third pixel value. Furthermore, at the -Y side end of pattern element 93, the pixel values of five edges containing pixels 95a, each comprising a portion of edge 934, are set to the third pixel value. Additionally, at the corners of both the +X and -Y sides of pattern element 93, one edge containing pixel 95a comprises the end of edge 933, the end of edge 934, and the intersection of edges 933 and 934. The pixel value of this edge containing pixel 95a is also set to the third pixel value as described above.
在圖8中,於被設定成第一像素值的拍攝用像素95附上平行斜線,且未於被設定成第二像素值的拍攝用像素95附上平行斜線。此外,於被設定成第三像素值的拍攝用像素95(亦即邊緣含有像素95a)附上間隔比被設定成第一像素值的拍攝用像素95還寬的平行斜線。在以下的說明中,亦將在圖8中附上了平行斜線的拍攝用像素95(亦即被設定成第一像素值的拍攝用像素95以及被設定成第三像素值的拍攝用像素95)的集合統稱為「模板要素713」。In Figure 8, parallel diagonal lines are attached to the shooting pixel 95 set to the first pixel value, but no parallel diagonal lines are attached to the shooting pixel 95 set to the second pixel value. Furthermore, parallel diagonal lines with a wider spacing than those on the shooting pixel 95 set to the first pixel value are attached to the shooting pixel 95 set to the third pixel value (i.e., the edge containing pixel 95a). In the following description, the set of shooting pixels 95 with parallel diagonal lines attached in Figure 8 (i.e., the shooting pixels 95 set to the first pixel value and the shooting pixels 95 set to the third pixel value) is collectively referred to as "template element 713".
如此,在灰階的模板71中,將包含圖案要素93的邊緣之拍攝用像素95(亦即邊緣含有像素95a)的像素值設定成第三像素值,藉此與比較例的模板70a、70b相比,能將模板71中的模板要素713的重心位置(亦即考慮到用以構成模板要素713之複數個拍攝用像素95的濃度之重心位置)接近至模板區域92中的圖案要素93的重心位置。換言之,在模板71中,在包含圖案要素95的邊緣之拍攝用像素95(亦即邊緣含有像素95a)中有意地將模板要素713的邊緣的位置設定成模糊,藉此與比較例的模板70a、70b相比,能將模板要素713的邊緣的位置接近至圖案要素93的邊緣的位置。因此,使用模板71進行基板9的對準,藉此能提升基板9的對準精密度。Thus, in the grayscale template 71, the pixel value of the shooting pixel 95 (that is, the edge contains pixel 95a) of the edge containing pattern element 93 is set to the third pixel value. In this way, compared with the comparative templates 70a and 70b, the center position of the template element 713 in the template 71 (that is, the center position considering the density of the plurality of shooting pixels 95 used to constitute the template element 713) can be close to the center position of the pattern element 93 in the template area 92. In other words, in template 71, the edge position of template element 713 is intentionally blurred in the image-capturing pixel 95 (i.e., the edge contains pixel 95a) containing pattern element 95. This allows the edge position of template element 713 to be closer to the edge position of pattern element 93 compared to comparative templates 70a and 70b. Therefore, using template 71 for substrate 9 alignment improves the alignment accuracy of substrate 9.
此外,上文所說明的第一像素值以及第二像素值亦可進行各種變更,無須分別為「0(黑色)」及「255(白色)」。第三像素值亦不一定需要為「128」,只要為在第一像素值與第二像素值之間所決定的一個像素值即可。Furthermore, the first and second pixel values mentioned above can be varied and do not need to be "0 (black)" and "255 (white)" respectively. The third pixel value does not necessarily need to be "128" either; it can be any pixel value determined between the first and second pixel values.
接著,參照圖9A以及圖9B說明描繪裝置1朝基板9描繪圖案的流程。對基板9進行描繪時,首先,在模板生成裝置6中生成有被使用於基板9的對準之模板71(參照圖8)並記憶於控制部10的記憶部111(步驟S11)。Next, the process of drawing a pattern on the substrate 9 by the drawing device 1 will be described with reference to FIG. 9A and FIG. 9B. When drawing on the substrate 9, firstly, a template 71 (refer to FIG. 8) that is used for alignment on the substrate 9 is generated in the template generation device 6 and remembered in the memory unit 111 of the control unit 10 (step S11).
具體而言,在步驟S11中,讀出記憶於模板生成裝置6的記憶部61的第一CAD資料,藉由區域選擇部62從第一CAD資料選擇模板區域92(步驟S111)。接著,藉由模板生成部63以上文所說明的拍攝用解析度將模板區域92予以網格化,藉此生成灰階的模板71(步驟S112)。在圖1所例示的描繪系統5中,在步驟S111中選擇位置彼此不同的複數個模板區域92,在步驟S112中生成分別與複數個模板區域92對應的複數個模板71。Specifically, in step S11, the first CAD data stored in the memory unit 61 of the template generation device 6 is read, and the template region 92 is selected from the first CAD data by the region selection unit 62 (step S111). Next, the template region 92 is meshed by the template generation unit 63 at the shooting resolution described above, thereby generating a grayscale template 71 (step S112). In the drawing system 5 illustrated in FIG1, a plurality of template regions 92 with different positions are selected in step S111, and a plurality of templates 71 corresponding to the plurality of template regions 92 are generated in step S112.
接著,將基板9搬入至圖1所示的描繪裝置1並被保持於台21(步驟S12)。台21係位於比拍攝部3以及描繪部4還要-Y側的搬入搬出位置。於被保持於台21上的基板9的上表面91上預先設置有上文所說明的第一圖案。此外,上文所說明的步驟S11(亦即模板71的生成)係只要在後述的步驟S14之前進行,則亦可與步驟S12並行地進行,亦可在步驟S12之後進行。Next, the substrate 9 is moved into the drawing device 1 shown in FIG. 1 and held on the stage 21 (step S12). The stage 21 is located at the loading and unloading position, which is Y-side further than the photographing unit 3 and the drawing unit 4. The first pattern described above is pre-set on the upper surface 91 of the substrate 9 held on the stage 21. Furthermore, the step S11 described above (i.e., the generation of the template 71) can be performed in parallel with step S12, or it can be performed after step S12, as long as it is performed before step S14 described later.
當步驟S12結束時,藉由台移動機構22將基板9與台21一起朝+Y方向移動,並朝拍攝部3的下方移動。接著,藉由拍攝控制部112(參照圖3)控制拍攝部3以及台移動機構22,藉此在基板9上拍攝分別與複數個模板區域92對應的複數個拍攝區域,並分別取得包含第一圖案的一部分之複數個拍攝圖像(步驟S13)。When step S12 is completed, the stage moving mechanism 22 moves the substrate 9 and the stage 21 together in the +Y direction and moves them downwards towards the imaging unit 3. Then, the imaging control unit 112 (refer to FIG3) controls the imaging unit 3 and the stage moving mechanism 22 to capture multiple imaging areas on the substrate 9 that correspond to multiple template areas 92 respectively, and obtain multiple images containing a portion of the first pattern (step S13).
上文所說明的複數個拍攝區域係分別為略矩形狀的區域,該略矩形狀的區域為在基板9正確地被保持於台21上的設計位置的狀態下將對應的模板區域92作為略中心之區域。上文所說明的複數個拍攝區域的形狀以及大小係彼此相同。該拍攝區域係具有分別與X方向以及Y方向平行的一對邊,且在X方向以及Y方向雙方中比對應的模板區域92還大。因此,即使台21上的基板9的位置從設計位置些微偏離,模板區域92所含有的圖案要素93亦被包含於拍攝圖像內。在步驟S13中所取得的拍攝圖像係被儲存於記憶部111。此外,步驟S13亦可在步驟S11之前進行,亦可與步驟S11並行地進行。The plurality of imaging areas described above are each a slightly rectangular area, which is the area roughly centered on the corresponding template area 92 when the substrate 9 is correctly held in the designed position on the stage 21. The shape and size of the plurality of imaging areas described above are the same. Each imaging area has a pair of sides parallel to the X and Y directions, and is larger than the corresponding template area 92 in both the X and Y directions. Therefore, even if the position of the substrate 9 on the stage 21 deviates slightly from the designed position, the pattern elements 93 contained in the template area 92 are included in the image. The image obtained in step S13 is stored in the memory unit 111. In addition, step S13 can be performed before step S11 or in parallel with step S11.
當結束步驟S13時,藉由控制部10的位置檢測部113(參照圖3)對各個拍攝圖像進行使用了與各個拍攝圖像對應的模板71之圖案匹配。該圖案匹配係藉由公知的圖案匹配法(例如幾何學形狀圖案匹配或者正規化相關檢索等)來進行。接著,基於與各個拍攝圖像中的模板71相同的圖案要素的位置以及取得各個拍攝圖像時的基板9與拍攝部3之間的相對位置等,藉由位置檢測部113檢測台21上的基板9的位置(步驟S14)。When step S13 is completed, the position detection unit 113 of the control unit 10 (refer to FIG. 3) performs pattern matching on each captured image using the template 71 corresponding to each captured image. This pattern matching is performed using a known pattern matching method (e.g., geometric shape pattern matching or normalized correlation retrieval). Next, based on the positions of the pattern elements identical to the template 71 in each captured image and the relative positions between the substrate 9 and the imaging unit 3 when each captured image is obtained, the position detection unit 113 detects the position of the substrate 9 on the stage 21 (step S14).
在步驟S14中藉由位置檢測部113所檢測到的基板9的位置係包含台21上的基板9的X方向以及Y方向中的座標、基板9的朝向、以及用以顯示基板9的失真等所致使的變形之資訊。此外,用以顯示基板9的變形之資訊為已經變形的基板9的形狀等之資訊。In step S14, the position of the substrate 9 detected by the position detection unit 113 includes the coordinates of the substrate 9 in the X and Y directions on the stage 21, the orientation of the substrate 9, and information on the deformation caused by distortion of the substrate 9. In addition, the information on the deformation of the substrate 9 includes information such as the shape of the deformed substrate 9.
如上所述,在描繪系統5中能將圖8所示的模板71中的模板要素713的重心位置接近至圖6所示的模板區域92中的圖案要素93的重心位置。因此,在步驟S14中使用模板71進行基板9的對準,藉此能精密度佳地檢測台21上的基板9的位置。As described above, in the drawing system 5, the center of gravity of the template element 713 in the template 71 shown in FIG8 can be approximated to the center of gravity of the pattern element 93 in the template area 92 shown in FIG6. Therefore, in step S14, the template 71 is used to align the substrate 9, thereby enabling precise detection of the position of the substrate 9 on the stage 21.
接著,藉由資料生成部114(參照圖3)從記憶部111讀出第二CAD資料,進行第二CAD資料的網格化並生成第二描繪資料(步驟S15)。此外,步驟S15亦可與步驟S14並行地進行,亦可在步驟S14之前進行。在步驟S14之前進行步驟S15之情形中,例如步驟S15亦可與步驟S11至步驟S13的任一個步驟並行地進行,亦可在步驟S11至步驟S14中的任兩個步驟之間進行,亦可在步驟S11之前進行。Next, the data generation unit 114 (refer to FIG. 3) reads the second CAD data from the memory unit 111, performs meshing on the second CAD data, and generates the second drawing data (step S15). Furthermore, step S15 can be performed concurrently with step S14, or it can be performed before step S14. In the case where step S15 is performed before step S14, for example, step S15 can be performed concurrently with any one of steps S11 to S13, between any two steps from S11 to S14, or before step S11.
當生成第二描繪資料時,描繪控制部115(參照圖3)係基於第二描繪資料以及在步驟S14中所檢測到的基板9的位置來控制描繪部4以及台移動機構22。藉此,朝向相對於描繪部4的描繪頭41於Y方向相對移動的基板9照射上文所說明的經過調變的光線,並在基板9的上表面91上描繪第二圖案(步驟S16)。在步驟S16中,基於在步驟S14中所檢測到的基板9的位置,在描繪部4以及台移動機構22中以已知的修正方法機械性地自動修正從描繪部4朝基板9照射的光束的調變間隔與調變時序以及基板9上的光束的掃描位置等。藉此,能位置精密度佳地將第二圖案描繪至第一圖案上。When generating the second drawing data, the drawing control unit 115 (refer to FIG. 3) controls the drawing unit 4 and the stage movement mechanism 22 based on the second drawing data and the position of the substrate 9 detected in step S14. Thereby, the modulated light described above is irradiated toward the substrate 9, which is moving relative to the drawing head 41 of the drawing unit 4 in the Y direction, and a second pattern is drawn on the upper surface 91 of the substrate 9 (step S16). In step S16, based on the position of the substrate 9 detected in step S14, the drawing unit 4 and the stage movement mechanism 22 mechanically and automatically correct the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 toward the substrate 9, as well as the scanning position of the light beam on the substrate 9, using known correction methods. This allows the second pattern to be drawn onto the first pattern with excellent positional precision.
在模板生成裝置6中,在上文所說明的步驟S112中被設定於邊緣含有像素95a之第三像素值並不一定需要固定成一個像素值,例如亦可基於邊緣含有像素95a中的邊緣的位置進行變更。In the template generation device 6, the third pixel value set in step S112 described above for the edge containing pixel 95a does not necessarily need to be fixed to a single pixel value. For example, it can be changed based on the position of the edge in the edge containing pixel 95a.
圖10係放大地顯示於Y方向排列有兩個邊緣含有像素95a以及兩個邊緣含有像素95a附近的拍攝用像素95。在圖10中,與兩個邊緣含有像素95a的-X側鄰接的兩個拍攝用像素95為與以二點鏈線所示的圖案要素93對應的拍攝用像素95,該兩個拍攝用像素95的像素值係被設定成第一像素值。此外,將兩個邊緣含有像素95a以及與圖案要素93對應的上文所說明的兩個拍攝用像素95排除之其他的拍攝用像素95為與背景區域96對應的拍攝用像素95,該其他的拍攝用像素95的像素值係被設定成第二像素值。在圖10所示的例子中,第一像素值以及第二像素值分別為「0(黑色)」及「255(白色)」。Figure 10 is an enlarged view of two edge-containing pixels 95a and two shooting pixels 95 near the edge-containing pixels 95a arranged in the Y direction. In Figure 10, the two shooting pixels 95 adjacent to the -X side of the two edge-containing pixels 95a are shooting pixels 95 corresponding to the pattern element 93 shown by the two-dot chain, and the pixel values of these two shooting pixels 95 are set to a first pixel value. In addition, excluding the two edge-containing pixels 95a and the two shooting pixels 95 described above corresponding to the pattern element 93, the other shooting pixels 95 are shooting pixels 95 corresponding to the background area 96, and the pixel values of these other shooting pixels 95 are set to a second pixel value. In the example shown in Figure 10, the first pixel value and the second pixel value are "0 (black)" and "255 (white)" respectively.
兩個邊緣含有像素95a中的+Y側的邊緣含有像素95a係包含於圖案要素93的Y方向延伸的邊緣933a。邊緣933a係位於該邊緣含有像素95a的X方向(亦即拍攝用像素95的排列方向中之與邊緣933a交叉之方向)中之比中央還要+X側。換言之,該邊緣含有像素95a中之與圖案要素93重疊之區域的面積係比邊緣含有像素95a的面積的一半還大。進一步地換言之,該邊緣含有像素95a中之與圖案要素93重疊之區域的比例(亦即該邊緣含有像素95a中的圖案要素93的佔有率)係比50%還大。The edge containing pixels 95a on the +Y side of the two edges containing pixels 95a is the edge 933a extending in the Y direction of the pattern element 93. Edge 933a is located on the +X side of the edge containing pixels 95a in the X direction (that is, the direction in which the arrangement of the shooting pixels 95 intersects with the edge 933a) beyond the center. In other words, the area of the edge containing pixels 95a that overlaps with the pattern element 93 is larger than half the area of the edge containing pixels 95a. In other words, the proportion of the area of the edge containing pixels 95a that overlaps with the pattern element 93 (that is, the occupancy rate of the pattern element 93 in the edge containing pixels 95a) is greater than 50%.
該+Y側的邊緣含有像素95a的像素值(亦即第三像素值)係例如被設定成「第一像素值+(第二像素值-第一像素值) ×D1/D0」。D1為邊緣933a與邊緣含有像素95a的+X側的邊界(亦即與背景區域96對應的拍攝用像素95之間的邊界)之間的X方向中的距離。D0為邊緣含有像素95a的X方向的全寬度。在圖10所示的例子中,距離D1為距離D0的約1/4,被設定於+Y側的邊緣含有像素95a之第三像素值為「64(較濃的灰色)」。The pixel value (i.e., the third pixel value) of the edge containing pixel 95a on the +Y side is set, for example, as "first pixel value + (second pixel value - first pixel value) × D1 / D0". D1 is the distance in the X direction between edge 933a and the boundary of the edge containing pixel 95a on the +X side (i.e., the boundary between the shooting pixel 95 corresponding to the background area 96). D0 is the full width in the X direction of the edge containing pixel 95a. In the example shown in Figure 10, the distance D1 is approximately 1/4 of the distance D0, and the third pixel value of the edge containing pixel 95a on the +Y side is set to "64 (a darker gray)".
兩個邊緣含有像素95a中的-Y側的邊緣含有像素95a係包含於Y方向延伸的邊緣933b。邊緣933b係位於該邊緣含有像素95a的X方向中之比中央還要-X側。換言之,該邊緣含有像素95a中之與圖案要素93重疊之區域的面積係比邊緣含有像素95a的面積的一半還小。進一步地換言之,該邊緣含有像素95a中的圖案要素93的佔有率係比50%還小。The edge containing pixel 95a on the Y side of the two edges is contained within an edge 933b extending in the Y direction. Edge 933b is located on the X side of the edge containing pixel 95a, further X-sided than the center. In other words, the area of the region in the edge containing pixel 95a that overlaps with the pattern element 93 is smaller than half the area of the edge containing pixel 95a. In other words, the occupancy of the pattern element 93 in the edge containing pixel 95a is less than 50%.
該-Y側的邊緣含有像素95a的像素值(亦即第三像素值)係例如被設定成「第一像素值+(第二像素值-第一像素值) ×D2/D0」。D2為邊緣933b與邊緣含有像素95a的+X側的邊界(亦即與背景區域96對應的拍攝用像素95之間的邊界)之間的X方向中的距離。在圖10所示的例子中,距離D2為距離D0的約3/4,被設定於-Y側的邊緣含有像素95a之第三像素值為「192(較薄的灰色)」。The pixel value (i.e., the third pixel value) of the edge containing pixel 95a on the -Y side is set, for example, as "first pixel value + (second pixel value - first pixel value) × D2 / D0". D2 is the distance in the X direction between edge 933b and the boundary of the +X side containing pixel 95a (i.e., the boundary between the shooting pixel 95 corresponding to the background area 96). In the example shown in Figure 10, the distance D2 is about 3/4 of the distance D0, and the third pixel value of the edge containing pixel 95a on the -Y side is set to "192 (thinner gray)".
如此,能夠基於邊緣含有像素95a中的邊緣的位置來改變在模板71中被設定於邊緣含有像素95a之第三像素值,藉此能將模板71中的模板要素713的重心位置進一步地接近至模板區域92中的圖案要素93的重心位置。因此,使用該模板71進行基板9的對準,藉此能進一步地提升基板9的對準精密度。In this way, the value of the third pixel set in the template 71 for the edge containing pixel 95a can be changed based on the position of the edge in the edge containing pixel 95a, thereby bringing the center of gravity of the template element 713 in the template 71 closer to the center of gravity of the pattern element 93 in the template area 92. Therefore, using the template 71 for alignment of the substrate 9 can further improve the alignment accuracy of the substrate 9.
此外,在模板71中被設定於邊緣含有像素95a之第三像素值亦能夠基於該邊緣含有像素95a中之與圖案要素93重疊之區域的比例(亦即邊緣含有像素95a中的圖案要素93的佔有率)來改變。例如,被設定於邊緣含有像素95a之第三像素值亦可設定成「第一像素值+(第二像素值-第一像素值) ×(1-S1/S0)」。S1為邊緣含有像素95a中之與圖案要素93重疊之區域的面積。S0為該邊緣含有像素95a整體的面積。在此種情形中,S1/S0為邊緣含有像素95a中的圖案要素93的佔有率。Furthermore, the third pixel value set in template 71 for the edge containing pixel 95a can also be changed based on the proportion of the area in the edge containing pixel 95a that overlaps with the pattern element 93 (i.e., the occupancy rate of the pattern element 93 in the edge containing pixel 95a). For example, the third pixel value set for the edge containing pixel 95a can also be set as "first pixel value + (second pixel value - first pixel value) × (1 - S1/S0)". S1 is the area of the area in the edge containing pixel 95a that overlaps with the pattern element 93. S0 is the total area of the edge containing pixel 95a. In this case, S1/S0 is the occupancy rate of the pattern element 93 in the edge containing pixel 95a.
在圖11所示的例子中,在包含圖案要素93的+X側以及-Y側的角部之一個邊緣含有像素95a中,上文所說明的圖案要素93的佔有率為25%。因此,被設定於該邊緣含有像素95a之第三像素值為「192」。此外,在位於該邊緣含有像素95a的+Y側之三個邊緣含有像素95a以及位於該邊緣含有像素95a的-X側之四個邊緣含有像素95a中,上文所說明的圖案要素93的佔有率為50%。因此,被設定於這七個邊緣含有像素95a之第三像素值為「128」。In the example shown in Figure 11, in one of the corner edges containing pixel 95a on the +X and -Y sides containing pattern element 93, the occupancy of pattern element 93 described above is 25%. Therefore, the third pixel value of the edge containing pixel 95a is set to "192". Furthermore, in the three edge containing pixel 95a on the +Y side and the four edge containing pixel 95a on the -X side, the occupancy of pattern element 93 described above is 50%. Therefore, the third pixel value of these seven edge containing pixel 95a is set to "128".
如此,能夠基於邊緣含有像素95a中的圖案要素93的佔有率來改變在模板71中被設定於邊緣含有像素95a之第三像素值,藉此亦能將模板71中的模板要素713的重心位置進一步地接近至模板區域92中的圖案要素93的重心位置。因此,使用該模板71進行基板9的對準,藉此能進一步地提升基板9的對準精密度。In this way, the value of the third pixel set in the template 71 for the edge containing pixel 95a can be changed based on the occupancy of the pattern element 93 in the edge containing pixel 95a. This also allows the center of gravity of the template element 713 in the template 71 to be further closer to the center of gravity of the pattern element 93 in the template area 92. Therefore, using the template 71 for alignment of the substrate 9 can further improve the alignment accuracy of the substrate 9.
如以上所說明般,模板生成裝置6係生成模板,該模板係被使用於描繪裝置1中的基板9的對準。模板生成裝置6係具備區域選擇部62以及模板生成部63。區域選擇部62係從圖案CAD資料(亦即第一CAD資料)選擇包含圖案要素93的至少一部分之預定大小的模板區域92,該圖案CAD資料(亦即第一CAD資料)為設置於基板9上之圖案的CAD資料。模板生成部63係以描繪裝置1的拍攝部3的拍攝用解析度將第一CAD資料的模板區域92予以網格化,藉此生成灰階的模板71。該拍攝用解析度係與描繪裝置1的描繪用解析度不同。As explained above, the template generation device 6 generates a template that is used for alignment of the substrate 9 in the drawing device 1. The template generation device 6 includes a region selection unit 62 and a template generation unit 63. The region selection unit 62 selects a template region 92 of a predetermined size containing at least a portion of the pattern elements 93 from the pattern CAD data (i.e., the first CAD data), which is the CAD data of the pattern disposed on the substrate 9. The template generation unit 63 meshes the template region 92 of the first CAD data using the imaging resolution of the imaging unit 3 of the drawing device 1, thereby generating a grayscale template 71. This imaging resolution is different from the drawing resolution of the drawing device 1.
模板生成部63係針對模板71所含有的複數個像素(在上文所說明的例子中為拍攝用像素95),將與圖案要素93對應的像素的像素值設定成第一像素值,將與背景區域96對應的像素的像素值設定成第二像素值,將包含圖案要素93的邊緣之屬於像素的邊緣含有像素95a的像素值設定成第一像素值與第二像素值之間的第三像素值。藉此,如上所述,能抑制在模板71的生成時因為量化誤差所導致的圖案匹配的精密度降低。結果,能提升描繪裝置1中的基板9的對準精密度。The template generation unit 63, for the plurality of pixels contained in the template 71 (in the example described above, the imaging pixel 95), sets the pixel value of the pixel corresponding to the pattern element 93 to a first pixel value, sets the pixel value of the pixel corresponding to the background area 96 to a second pixel value, and sets the pixel value of the pixel containing the edge of the edge of the pattern element 93, which contains pixel 95a, to a third pixel value between the first and second pixel values. In this way, as described above, the reduction in pattern matching precision caused by quantization errors during template 71 generation can be suppressed. As a result, the alignment precision of the substrate 9 in the drawing device 1 can be improved.
如上所述,第三像素值係較佳為基於邊緣含有像素95a中的邊緣的位置來設定。藉此,能進一步地抑制模板71的生成時的量化誤差所導致的圖案匹配的精密度降低。結果,能進一步地提升描繪裝置1中的基板9的對準精密度。As described above, the third pixel value is preferably set based on the position of the edge in pixel 95a. This further suppresses the reduction in pattern matching precision caused by quantization errors during template 71 generation. As a result, the alignment precision of the substrate 9 in the drawing apparatus 1 can be further improved.
如上所述,第三像素值亦較佳為基於邊緣含有像素95a中的圖案要素93的佔有率來設定。藉此,能進一步地抑制模板71的生成時的量化誤差所導致的圖案匹配的精密度降低。結果,能進一步地提升描繪裝置1中的基板9的對準精密度。As described above, the third pixel value is preferably set based on the occupancy rate of the pattern element 93 in the edge containing pixel 95a. This further suppresses the reduction in pattern matching precision caused by quantization errors during template 71 generation. As a result, the alignment precision of the substrate 9 in the drawing device 1 can be further improved.
描繪系統5係具備上文所說明的模板生成裝置6以及描繪裝置1。描繪裝置1係使用藉由模板生成裝置6所生成的模板71來進行基板9的對準,對基板9照射光線並進行描繪。描繪裝置1係具備台21、描繪頭41、掃描機構(在上文所說明的例子中為台移動機構22)、拍攝部3、位置檢測部113、記憶部111、資料生成部114以及描繪控制部115。The drawing system 5 includes the template generation device 6 and the drawing device 1 described above. The drawing device 1 uses the template 71 generated by the template generation device 6 to align the substrate 9, irradiate the substrate 9 with light, and perform drawing. The drawing device 1 includes a stage 21, a drawing head 41, a scanning mechanism (in the example described above, a stage moving mechanism 22), an imaging unit 3, a position detection unit 113, a memory unit 111, a data generation unit 114, and a drawing control unit 115.
台21係保持於上表面91上預先設置有圖案(亦即第一圖案)的基板9。描繪頭41係對基板9的上表面91照射經過調變的光線。掃描機構係使台21相對於描繪頭41於與基板9的上表面91平行的掃描方向(在上文所說明的例子中為Y方向)相對性地移動。拍攝部3係拍攝第一圖案的一部分。Stage 21 holds the substrate 9 on which a pattern (i.e., the first pattern) is pre-set on its upper surface 91. The drawing head 41 illuminates the upper surface 91 of the substrate 9 with modulated light. The scanning mechanism moves stage 21 relative to the drawing head 41 in a scanning direction parallel to the upper surface 91 of the substrate 9 (the Y direction in the example described above). The imaging unit 3 captures a portion of the first pattern.
位置檢測部113係對藉由拍攝部3所取得的拍攝圖像進行使用了模板71的圖案匹配,藉此檢測基板9的位置。記憶部111係記憶其他的圖案CAD資料(亦即第二CAD資料),該其他的圖案CAD資料(亦即第二CAD資料)為描繪於第一圖案上之其他的圖案(亦即第二圖案)的CAD資料。資料生成部114係將第二CAD資料予以網格化並生成網格資料(亦即第二描繪資料)。在描繪控制部115中,基於第二描繪資料以及藉由位置檢測部113所檢測到的基板9的位置來控制描繪頭41以及上文所說明的掃描機構,藉此執行朝相對於掃描頭41於掃描方向相對移動的基板9描繪第二圖案。The position detection unit 113 performs pattern matching using template 71 on the image captured by the imaging unit 3 to detect the position of the substrate 9. The memory unit 111 remembers other pattern CAD data (i.e., second CAD data), which are CAD data of other patterns (i.e., second patterns) drawn on the first pattern. The data generation unit 114 meshes the second CAD data and generates mesh data (i.e., second drawing data). In the drawing control unit 115, based on the second drawing data and the position of the substrate 9 detected by the position detection unit 113, the drawing head 41 and the scanning mechanism described above are controlled to draw the second pattern on the substrate 9, which moves relative to the scanning head 41 in the scanning direction.
如上所述,在描繪系統5中能提升描繪裝置1中的基板9的對準精密度。因此,在對預先描繪於基板9上的第一圖案上描繪第二圖案時,能提升第二圖案相對於第一圖案的相對位置精密度。As described above, the alignment accuracy of the substrate 9 in the drawing apparatus 1 can be improved in the drawing system 5. Therefore, when drawing a second pattern on a first pattern pre-drawn on the substrate 9, the relative positional accuracy of the second pattern relative to the first pattern can be improved.
上文所說明的模板生成方法係具備下述工序:從圖案CAD資料(亦即第一CAD資料)選擇包含圖案要素93的至少一部分之預定大小的模板區域92,該圖案CAD資料(亦即第一CAD資料)為設置於基板9上之圖案的CAD資料(步驟S111);以及以描繪裝置1的拍攝部3的拍攝用解析度將第一CAD資料的模板區域92予以網格化,藉此生成灰階的模板71(步驟S112)。該拍攝用解析度係與描繪裝置1的描繪用解析度不同。The template generation method described above includes the following steps: selecting a template area 92 of a predetermined size containing at least a portion of the pattern element 93 from pattern CAD data (i.e., first CAD data), wherein the pattern CAD data (i.e., first CAD data) is CAD data of a pattern disposed on the substrate 9 (step S111); and meshing the template area 92 of the first CAD data at the imaging resolution of the imaging unit 3 of the drawing device 1, thereby generating a grayscale template 71 (step S112). The imaging resolution is different from the drawing resolution of the drawing device 1.
在步驟S112中,針對模板71所含有的複數個像素(在上文所說明的例子中為拍攝用像素95),將與圖案要素93對應的像素的像素值設定成第一像素值,將與背景區域96對應的像素的像素值設定成第二像素值,將邊緣含有像素95a的像素值設定成第一像素值與第二像素值之間的第三像素值,該邊緣含有像素95a為包含圖案要素93的邊緣之像素。藉此,如上所述,能抑制在模板71的生成時因為量化誤差所導致的圖案匹配的精密度降低。結果,能提升描繪裝置1中的基板9的對準精密度。In step S112, for the plurality of pixels contained in the template 71 (pixels for shooting in the example described above), the pixel value of the pixel corresponding to the pattern element 93 is set to a first pixel value, the pixel value of the pixel corresponding to the background area 96 is set to a second pixel value, and the pixel value of the edge-containing pixel 95a is set to a third pixel value between the first and second pixel values. The edge-containing pixel 95a is the pixel containing the edge of the pattern element 93. In this way, as described above, the reduction in pattern matching precision caused by quantization errors during the generation of the template 71 can be suppressed. As a result, the alignment precision of the substrate 9 in the drawing device 1 can be improved.
上文所說明的電腦可讀取的程式109b係用以在生成被使用於描繪裝置1中的基板9的對準之模板71時所使用。程式109b係被電腦100執行,從而執行下述工序:從圖案CAD資料(亦即第一CAD資料)選擇包含圖案要素93的至少一部分之預定大小的模板區域92,該圖案CAD資料(亦即第一CAD資料)為設置於基板9上之圖案的CAD資料(步驟S111);以及以描繪裝置1的拍攝部3的拍攝用解析度將第一CAD資料的模板區域92予以網格化,藉此生成灰階的模板71(步驟S112)。該拍攝用解析度係與描繪裝置1的描繪用解析度不同。The computer-readable program 109b described above is used to generate a template 71 for alignment with the substrate 9 used in the drawing device 1. Program 109b is executed by the computer 100, thereby performing the following steps: selecting a template area 92 of a predetermined size containing at least a portion of the pattern elements 93 from pattern CAD data (i.e., first CAD data), the pattern CAD data (i.e., first CAD data) being the CAD data of the pattern disposed on the substrate 9 (step S111); and meshing the template area 92 of the first CAD data at the imaging resolution of the imaging unit 3 of the drawing device 1, thereby generating a grayscale template 71 (step S112). This imaging resolution is different from the drawing resolution of the drawing device 1.
在步驟S112中,針對模板71所含有的複數個像素(在上文所說明的例子中為拍攝用像素95),將與圖案要素93對應的像素的像素值設定成第一像素值,將與背景區域96對應的像素的像素值設定成第二像素值,將邊緣含有像素95a的像素值設定成第一像素值與第二像素值之間的第三像素值,該邊緣含有像素95a為包含圖案要素93的邊緣之像素。藉此,如上所述,能抑制在模板71的生成時因為量化誤差所導致的圖案匹配的精密度降低。結果,能提升描繪裝置1中的基板9的對準精密度。In step S112, for the plurality of pixels contained in the template 71 (pixels for shooting in the example described above), the pixel value of the pixel corresponding to the pattern element 93 is set to a first pixel value, the pixel value of the pixel corresponding to the background area 96 is set to a second pixel value, and the pixel value of the edge-containing pixel 95a is set to a third pixel value between the first and second pixel values. The edge-containing pixel 95a is the pixel containing the edge of the pattern element 93. In this way, as described above, the reduction in pattern matching precision caused by quantization errors during the generation of the template 71 can be suppressed. As a result, the alignment precision of the substrate 9 in the drawing device 1 can be improved.
在步驟S11中,如圖12所示除了進行上文所說明的步驟S111至步驟S112之外,還進行模板71的修正(步驟S113)。在步驟S113中,藉由模板修正部64(參照圖4)修正在步驟S112中所生成的模板71的邊緣含有像素95a的像素值(亦即第三像素值)。在模板修正部64中,基於藉由拍攝部3預先取得的模板區域92的拍攝圖像來修正邊緣含有像素95a的像素值。In step S11, as shown in FIG12, in addition to performing steps S111 to S112 as described above, the template 71 is also corrected (step S113). In step S113, the template correction unit 64 (refer to FIG4) corrects the pixel value (i.e., the third pixel value) of the edge containing pixel 95a of the template 71 generated in step S112. In the template correction unit 64, the pixel value of the edge containing pixel 95a is corrected based on the image of the template area 92 previously obtained by the imaging unit 3.
藉此,即使拍攝圖像中的圖案與阻劑之間的對比(亦即圖案要素93與背景區域96之間的對比)等因為基板9上的阻劑的顏色(例如白色、黑色、綠色或者紅色等)以及拍攝圖像的取得時的照明光線的狀態等而變化,亦能因應該對比等的變化將邊緣含有像素95a的像素值設定成適當的值。In this way, even if the contrast between the pattern and the resist in the captured image (that is, the contrast between the pattern element 93 and the background area 96) changes due to the color of the resist on the substrate 9 (e.g., white, black, green, or red) and the state of the lighting when the image is captured, the pixel value of the edge containing pixel 95a can be set to an appropriate value in response to the change in contrast.
具體而言,例如在上文所說明的拍攝圖像中圖案的整體或者邊緣映照成比第一基準值還暗之情形中,將模板71的邊緣含有像素95a的像素值從128修正成64。此外,在上文所說明的拍攝圖像中圖案的整體或者邊緣映照成比第二基準值還亮且該第二基準值係比第一基準值還亮之情形中,將模板71的邊緣含有像素95a的像素值從128修正成192。Specifically, for example, in the case where the pattern as a whole or its edges in the captured image described above are darker than the first reference value, the pixel value of the edge of template 71 containing pixel 95a is corrected from 128 to 64. Furthermore, in the case where the pattern as a whole or its edges in the captured image described above are brighter than the second reference value, and the second reference value is brighter than the first reference value, the pixel value of the edge of template 71 containing pixel 95a is corrected from 128 to 192.
如此,模板生成裝置6係較佳為進一步地具備:模板修正部64,係基於藉由拍攝部3所取得的模板區域92的拍攝圖像來修正模板71的邊緣含有像素95a的像素值。藉此,能進一步地抑制模板71的生成時的量化誤差所導致的圖案匹配的精密度降低。結果,能進一步地提升描繪裝置1中的基板9的對準精密度。Therefore, the template generation apparatus 6 preferably further includes a template correction unit 64, which corrects the pixel values of pixels 95a at the edge of the template 71 based on the image of the template area 92 obtained by the imaging unit 3. This further suppresses the reduction in pattern matching precision caused by quantization errors during template 71 generation. As a result, the alignment precision of the substrate 9 in the drawing apparatus 1 can be further improved.
在上文所說明的模板生成裝置6、描繪系統5、模板生成方法以及程式109b中能夠進行各種變更。Various changes can be made to the template generation device 6, drawing system 5, template generation method, and program 109b described above.
例如,第一像素值、第二像素值以及第三像素值的大小並未限定於上文所說明的例子,亦可進行各種變更。For example, the sizes of the first pixel value, the second pixel value, and the third pixel value are not limited to the example described above, and can be changed in various ways.
在上文所說明的步驟S11中,步驟S113中的模板71的修正並不一定需要進行。此外,在不進行模板71的修正之情形中,亦可從模板生成裝置6省略模板修正部64。In step S11 described above, the modification of template 71 in step S113 is not necessarily required. Furthermore, if the modification of template 71 is not performed, the template modification unit 64 can be omitted from the template generation device 6.
描繪裝置1中的拍攝用解析度係只要與描繪用解析度不同即可,例如亦可比描繪用解析度還高。亦即,拍攝用像素95亦可比描繪用像素94還小。即使是在此種情形中,在描繪用像素94的一邊的長度不是拍攝用像素95的一邊的長度的整數倍之情形中,亦有可能產生上文所說明的量化誤差。因此,藉由上文所說明的模板生成裝置6來生成灰階的模板,藉此能提升描繪裝置1中的基板9的對準精密度。The resolution used for imaging in the drawing apparatus 1 only needs to be different from the resolution used for drawing; for example, it can be higher than the resolution used for drawing. That is, the imaging pixel 95 can be smaller than the drawing pixel 94. Even in this case, if the length of one side of the drawing pixel 94 is not an integer multiple of the length of one side of the imaging pixel 95, the quantization error described above may still occur. Therefore, by generating a grayscale stencil using the stencil generation apparatus 6 described above, the alignment accuracy of the substrate 9 in the drawing apparatus 1 can be improved.
在上述例子中,雖然說明了對基板9的一方的主表面進行描繪,然而在描繪裝置1中亦可對基板9的雙方的主表面進行圖案的描繪。在此種情形中,在對基板9的另一方的主表面進行描繪時亦與上文所說明同樣地,在模板生成裝置6中從預先形成於該另一方的主表面之圖案的CAD資料作成被利用於圖案匹配之模板。In the above example, although it is explained that the main surface of one side of the substrate 9 is drawn, the drawing device 1 can also draw patterns on both main surfaces of the substrate 9. In this case, when drawing the other main surface of the substrate 9, as described above, the template generation device 6 creates a template for pattern matching from the CAD data of the pattern pre-formed on the other main surface.
模板生成裝置6亦可藉由與用以實現控制部10之電腦不同的電腦來實現。此外,模板生成裝置6並不一定需要設置於描繪系統5,亦可作為與描繪裝置1獨立之單獨的裝置來使用。The template generation device 6 can also be implemented using a computer different from the computer used to implement the control unit 10. Furthermore, the template generation device 6 does not necessarily need to be installed in the drawing system 5, and can also be used as a separate device independent of the drawing device 1.
上文所說明的基板9並未限定於印刷基板,亦可為例如半導體基板、液晶顯示裝置或者有機EL顯示裝置等之平板顯示裝置用的玻璃基板、光罩用的玻璃基板或者太陽電池面板用的基板等。The substrate 9 described above is not limited to a printed circuit board, but can also be a glass substrate for a flat panel display device such as a semiconductor substrate, a glass substrate for a photomask, or a substrate for a solar panel, such as a liquid crystal display device or an organic EL display device.
上文所說明的實施形態以及各個變化例中的構成只要未相互矛盾即能適當地組合。The embodiments described above and the components in each variation can be appropriately combined as long as they do not contradict each other.
雖然已經詳細地描述並說明本發明,然而上述說明僅為例示性而非示限定性。因此,只要不脫離本發明的範圍,則能視為能夠有各種變化以及各種態樣。Although the invention has been described and explained in detail, the above description is illustrative rather than limiting. Therefore, it can be considered that various variations and forms are possible without departing from the scope of the invention.
1:描繪裝置 3:拍攝部 4:描繪部 5:描繪系統 6:模板生成裝置 9:基板 10:控制部 21:台 22:台移動機構 23:第一移動機構 24:第二移動機構 30,40:頭支撐部 31:拍攝頭 41:描繪頭 61:記憶部 62:區域選擇部 63:模板生成部 64:模板修正部 70a,70b,71:模板 81:記憶媒體 91:上表面 92:模板區域 93:圖案要素 94:描繪用像素(像素) 95:拍攝用像素(像素) 95a:邊緣含有像素 96:背景區域 100:電腦 101:處理器 102:記憶體 103:輸入輸出部 104:匯流排 105:鍵盤 106:滑鼠 107:顯示器 109a,109b:程式 111:記憶部 112:拍攝控制部 113:位置檢測部 114:資料生成部 115:描繪控制部 701,702,703,704,931至934,933a,933b:邊緣 707,713:模板要素 708:模板背景區域 D0,D1,D2:距離 S11至S16,S111至S113:步驟 1: Drawing device 3: Imaging unit 4: Drawing unit 5: Drawing system 6: Template generation device 9: Substrate 10: Control unit 21: Stage 22: Stage moving mechanism 23: First moving mechanism 24: Second moving mechanism 30, 40: Head support unit 31: Imaging head 41: Drawing head 61: Memory unit 62: Area selection unit 63: Template generation unit 64: Template correction unit 70a, 70b, 71: Template 81: Memory medium 91: Upper surface 92: Template area 93: Pattern element 94: Drawing pixel (pixel) 95: Imaging pixel (pixel) 95a: Edge contains pixels 96: Background Area 100: Computer 101: Processor 102: Memory 103: Input/Output Unit 104: Bus 105: Keyboard 106: Mouse 107: Display 109a, 109b: Program 111: Memory Unit 112: Camera Control Unit 113: Position Detection Unit 114: Data Generation Unit 115: Drawing Control Unit 701, 702, 703, 704, 931 to 934, 933a, 933b: Edges 707, 713: Template Elements 708: Template Background Area D0, D1, D2: Distance S11 to S16, S111 to S113: Steps
[圖1]為顯示實施形態之一的描繪系統之立體圖。 [圖2]為顯示電腦的構成之圖。 [圖3]為顯示控制部的功能之方塊圖。 [圖4]為顯示模板生成裝置的功能之方塊圖。 [圖5]為顯示模板區域之圖。 [圖6]為顯示模板區域之圖。 [圖7A]為比較例的模板之圖。 [圖7B]為比較例的模板之圖。 [圖8]為顯示模板之圖。 [圖9A]為顯示圖案的描繪的流程之圖。 [圖9B]為顯示模板的生成的流程之圖。 [圖10]為放大地顯示模板的一部分之圖。 [圖11]為顯示模板之圖。 [圖12]為顯示模板的生成的流程之圖。 [Figure 1] is a perspective view showing one implementation of the drawing system. [Figure 2] is a diagram showing the structure of the computer. [Figure 3] is a block diagram showing the functions of the control unit. [Figure 4] is a block diagram showing the functions of the template generation device. [Figure 5] is a diagram showing the template area. [Figure 6] is a diagram showing the template area. [Figure 7A] is a diagram of a comparative template. [Figure 7B] is a diagram of a comparative template. [Figure 8] is a diagram showing the template. [Figure 9A] is a flowchart showing the drawing process. [Figure 9B] is a flowchart showing the template generation process. [Figure 10] is a diagram showing a portion of the template in enlarged view. [Figure 11] is a diagram showing the template. [Figure 12] is a flowchart showing the template generation process.
71:模板 71: Template
93:圖案要素 93: Pattern Elements
95:拍攝用像素(像素) 95: Shooting pixels (pixels)
95a:邊緣含有像素 95a: Edges contain pixels
96:背景區域 96: Background Area
931至934:邊緣 931 to 934: The Edge
713:模板要素 713: Template Elements
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