TWI901389B - Double-side packaging chip carrier and double-side packaging structure using the same - Google Patents
Double-side packaging chip carrier and double-side packaging structure using the sameInfo
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Abstract
Description
本發明涉及晶片封裝領域,尤其是一種雙面封裝晶片載板及應用其之雙面晶片封裝結構。The present invention relates to the field of chip packaging, and in particular to a double-sided package chip carrier and a double-sided chip packaging structure using the same.
隨著晶片尺寸的縮減,對於產品尺寸的輕薄化、以及產品性能的提升。現行晶片封裝的技術,通常採用雙面封裝的技術,並透過球柵陣列(Ball Grid Array,BGA)的方式,以陣列方式佈設訊號輸入/輸出(Input/output)的位置。然而,隨著近期晶片因為新的封裝技術,使得晶片尺寸變厚,也造成了BGA的瓶頸。As chip sizes shrink, products become thinner and lighter, while performance improves. Current chip packaging technology typically utilizes double-sided packaging, using a ball grid array (BGA) to arrange signal input/output locations in an array. However, recent chip packaging technologies have resulted in thicker chips, creating a bottleneck for BGAs.
由於球柵陣列以錫球進行銲接,在封裝高度增加的狀況下,通常在銲接處需要墊高。由於錫的表面特性,以灌入錫來墊高錫球,在整體的尺寸增加下,錫的圓球狀會增大,從而需要加大錫球間的間距(pitch),進而使得I/O的數量無法提升,整體的晶片密度也難以在提升。雖然現有方式有另外採用銅柱(Cu Pillar),但需要額外增加高解析度的厚感光乾膜型阻劑、剝膜等,大幅增加了製造的成本與工時。Because ball grid arrays are soldered with solder balls, increasing package height often requires padding at the solder joints. Due to the surface properties of solder, padding the solder balls by pouring solder increases the overall size, increasing the spherical shape of the solder, necessitating a larger pitch between the solder balls. This, in turn, hinders increasing the number of I/Os and overall chip density. While existing methods employ copper pillars, these require the addition of high-resolution, thick photosensitive dry film resists and peeling films, significantly increasing manufacturing costs and labor.
對於前述的問題,在此提供了一種雙面封裝晶片載板。雙面封裝晶片載板包含基底層、第一線路層、複數個第一保護層及複數個第二線路層、第二保護層、第三線路層、第三保護層、第四線路層、第一防銲層及第二防銲層。To address the aforementioned problem, a double-sided package chip carrier is provided. The double-sided package chip carrier includes a base layer, a first circuit layer, a plurality of first protection layers, a plurality of second circuit layers, a second protection layer, a third circuit layer, a third protection layer, a fourth circuit layer, a first solder barrier layer, and a second solder barrier layer.
第一線路層位於基底層的第一表面,包含複數個第一晶片接點。複數個第一保護層及複數個第二線路層依序地堆疊於第一線路層上,各第一保護層上具有第一連通開口,第二線路層的兩層之間以及第二線路層中的最下層與第一線路層之間透過第一連通開口彼此連接。第二保護層位於最上端的第二線路層上,具有第二連通開口。第三線路層透過第二連通開口連接最上端的第二線路層,其中第三線路層包含複數個第二晶片接點。A first circuit layer is located on the first surface of the base layer and includes a plurality of first chip contacts. A plurality of first protective layers and a plurality of second circuit layers are sequentially stacked on the first circuit layer. Each first protective layer has a first connection opening. The first connection openings connect the two second circuit layers, as well as the bottommost second circuit layer and the first circuit layer. A second protective layer is located on the topmost second circuit layer and includes a second connection opening. A third circuit layer is connected to the topmost second circuit layer through the second connection opening, wherein the third circuit layer includes a plurality of second chip contacts.
第三保護層位於基底層的第二表面,第三保護層及基底層具有連通的第三連通開口及開槽,開槽暴露出第一晶片接點。第四線路層,位於第三保護層上,透過第三連通開口連接第一線路層,且第四線路層具有複數個銲接接點。第一防銲層位於第四線路層上,具有複數個第一防銲開口,第一防銲開口分別暴露出銲接接點。第二防銲層位於第三線路層上,具有第二防銲開槽,第二防銲開槽暴露出第二晶片接點。雙面封裝晶片載板的厚度大於250μm,且開槽的深度大於100μm。The third protective layer is located on the second surface of the base layer. The third protective layer and the base layer have a third connecting opening and a groove that are connected. The groove exposes the first chip contact. The fourth circuit layer is located on the third protective layer and is connected to the first circuit layer through the third connecting opening. The fourth circuit layer has a plurality of solder joints. The first solder barrier layer is located on the fourth circuit layer and has a plurality of first solder barrier openings. The first solder barrier openings expose the solder joints. The second solder barrier layer is located on the third circuit layer and has a second solder barrier groove. The second solder barrier groove exposes the second chip contact. The thickness of the double-sided package chip carrier is greater than 250μm, and the depth of the groove is greater than 100μm.
在一些實施例中,第一晶片接點之間的第一間距小於銲接接點之間的第二間距。更詳細地,在一些實施例中,第一間距為90至180μm。進一步地,在一些實施例中,第一間距為100至160μm。In some embodiments, a first spacing between the first chip contacts is smaller than a second spacing between the solder contacts. More specifically, in some embodiments, the first spacing is 90 to 180 μm. Further, in some embodiments, the first spacing is 100 to 160 μm.
在一些實施例中,第一線路層、該等第二線路層、第三線路層及第四線路層的總數量大於九。In some embodiments, the total number of the first wiring layer, the second wiring layers, the third wiring layer, and the fourth wiring layer is greater than nine.
在一些實施例中,第三線路層更包含複數個連接接點,第二防銲層還包含第三防銲開槽,第三防銲開槽暴露出連接接點的一部分。In some embodiments, the third circuit layer further includes a plurality of connection contacts, and the second solder-proof layer further includes a third solder-proof slot, wherein the third solder-proof slot exposes a portion of the connection contacts.
在此提供了一種雙面晶片封裝結構。雙面晶片封裝結構包含雙面封裝晶片載板、第一晶片及第二晶片。雙面封裝晶片載板包含基底層、第一線路層、複數個第一保護層及複數個第二線路層、第二保護層、第三線路層、第三保護層、第四線路層、第一防銲層及第二防銲層。A double-sided chip package structure is provided. The double-sided chip package structure includes a double-sided chip carrier, a first chip, and a second chip. The double-sided chip carrier includes a base layer, a first circuit layer, a plurality of first protective layers, a plurality of second circuit layers, a second protective layer, a third circuit layer, a third protective layer, a fourth circuit layer, a first solder barrier layer, and a second solder barrier layer.
第一線路層位於基底層的第一表面,包含複數個第一晶片接點。複數個第一保護層及複數個第二線路層依序地堆疊於第一線路層上,各第一保護層上具有第一連通開口,第二線路層的兩層之間以及第二線路層中的最下層與第一線路層之間透過第一連通開口彼此連接。第二保護層位於最上端的第二線路層上,具有第二連通開口。第三線路層透過第二連通開口連接最上端的第二線路層,其中第三線路層包含複數個第二晶片接點。A first circuit layer is located on the first surface of the base layer and includes a plurality of first chip contacts. A plurality of first protective layers and a plurality of second circuit layers are sequentially stacked on the first circuit layer. Each first protective layer has a first connection opening. The first connection openings connect the two second circuit layers, as well as the bottommost second circuit layer and the first circuit layer. A second protective layer is located on the topmost second circuit layer and includes a second connection opening. A third circuit layer is connected to the topmost second circuit layer through the second connection opening, wherein the third circuit layer includes a plurality of second chip contacts.
第三保護層位於基底層的第二表面,第三保護層及基底層具有連通的第三連通開口及開槽,開槽暴露出第一晶片接點。第四線路層,位於第三保護層上,透過第三連通開口連接第一線路層,且第四線路層具有複數個銲接接點。第一防銲層位於第四線路層上,具有複數個第一防銲開口,第一防銲開口分別暴露出銲接接點。第二防銲層位於第三線路層上,具有第二防銲開槽,第二防銲開槽暴露出第二晶片接點。雙面封裝晶片載板的厚度大於250μm,且開槽的深度大於100μm。第一晶片銲接於第一晶片接點。第二晶片銲接於第二晶片接點。The third protective layer is located on the second surface of the base layer. The third protective layer and the base layer have a third connecting opening and a groove that are connected. The groove exposes the first chip connection. The fourth circuit layer is located on the third protective layer and is connected to the first circuit layer through the third connecting opening. The fourth circuit layer has a plurality of solder joints. The first solder prevention layer is located on the fourth circuit layer and has a plurality of first solder prevention openings. The first solder prevention openings respectively expose the solder joints. The second solder prevention layer is located on the third circuit layer and has a second solder prevention groove. The second solder prevention groove exposes the second chip connection. The thickness of the double-sided package chip carrier is greater than 250μm, and the depth of the groove is greater than 100μm. The first chip is soldered to the first chip connection. The second chip is soldered to the second chip contact.
在一些實施例中,第一晶片接點之間的第一間距小於銲接接點之間的第二間距。更詳細地,在一些實施例中,第一間距為90至180μm。進一步地,在一些實施例中,第一間距為100至160μm。In some embodiments, a first spacing between the first chip contacts is smaller than a second spacing between the solder contacts. More specifically, in some embodiments, the first spacing is 90 to 180 μm. Further, in some embodiments, the first spacing is 100 to 160 μm.
在一些實施例中,雙面晶片封裝結構更包含第一封裝層及第二封裝層。第一封裝層覆蓋第一晶片、第一晶片接點及基底層的第二表面。第二封裝層覆蓋第二晶片、第二晶片接點及第二防銲層。In some embodiments, the double-sided chip package structure further includes a first packaging layer and a second packaging layer. The first packaging layer covers the first chip, the first chip contact, and the second surface of the base layer. The second packaging layer covers the second chip, the second chip contact, and the second solder barrier layer.
更詳細地,在一些實施例中,第三線路層更包含複數個連接接點,第二防銲層還包含第三防銲開槽,第三防銲開槽暴露出連接接點的一部分。More specifically, in some embodiments, the third circuit layer further includes a plurality of connection contacts, and the second solder-proof layer further includes a third solder-proof slot, wherein the third solder-proof slot exposes a portion of the connection contacts.
進一步地,在一些實施例中,雙面晶片封裝結構更包含被動元件,被動元件與連接接點連接,且第二封裝層更覆蓋被動元件。Furthermore, in some embodiments, the double-sided chip package structure further includes a passive component connected to the connection pad, and the second packaging layer further covers the passive component.
如同前述各實施例所示,利用在第一線路層中佈設第一晶片接點,並以背向開槽的方式形成容置晶片的位置,可以達到維持晶片載板厚度、維持銲接接點的間隙的功效,同時在增加在單位面積的銲接接點,即輸入/輸出(I/O)的數量,能應用於高晶片密度的精密封裝。As shown in the aforementioned embodiments, by disposing the first chip contacts in the first circuit layer and forming a location for accommodating the chip by means of back-grooving, the thickness of the chip carrier and the spacing between the solder contacts can be maintained. At the same time, the number of solder contacts per unit area, i.e., the number of input/output (I/O), can be increased, which can be applied to high-chip density precision packaging.
應當理解的是,元件被稱為「設置」或「連接」於另一元件時,可以表示元件是直接位另一元件上,或者也可以存在中間元件,透過中間元件連接元件與另一元件。相反地,當元件被稱為「直接設置/連接在另一元件上」或「直接設置/連接到另一元件」時,可以理解的是,此時明確定義了不存在中間元件。It should be understood that when an element is referred to as being "disposed on" or "connected to" another element, this may mean that the element is directly located on the other element, or that an intervening element is present, connecting the element to the other element. Conversely, when an element is referred to as being "directly disposed on/connected to" or "directly disposed/connected to" another element, it should be understood that this clearly defines the absence of intervening elements.
另外,術語「第一」、「第二」、「第三」這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開,而非表示其必然的先後順序。此外,諸如「下」和「上」的相對術語可在本文中用於描述一個元件與另一元件的關係,應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」 側。此僅表示相對的方位關係,而非絕對的方位關係。In addition, the terms "first," "second," and "third" are used only to distinguish one element, component, region, layer, or part from another element, component, region, layer, or part, and do not necessarily indicate a sequence of precedence or sequence. Furthermore, relative terms such as "lower" and "upper" may be used herein to describe the relationship of one element to another, and it should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if a device in an accompanying figure is turned over, an element described as being on the "lower" side of other elements would be oriented on the "upper" side of the other elements. This only indicates a relative orientation relationship, not an absolute orientation relationship.
圖1為雙面封裝晶片載板一實施例的剖面示意圖。如圖1所示,雙面封裝晶片載板1包含基底層11、第一線路層21、複數個第一保護層13及複數個第二線路層23、第二保護層15、第三線路層25、第三保護層31、第四線路層33、第一防銲層41及第二防銲層43。Figure 1 is a schematic cross-sectional view of an embodiment of a double-sided package chip carrier. As shown in Figure 1 , the double-sided package chip carrier 1 includes a base layer 11, a first circuit layer 21, a plurality of first protection layers 13, a plurality of second circuit layers 23, a second protection layer 15, a third circuit layer 25, a third protection layer 31, a fourth circuit layer 33, a first solder barrier layer 41, and a second solder barrier layer 43.
第一線路層21位於基底層11的第一表面11A,包含複數個第一晶片接點211。複數個第一保護層13及複數個第二線路層23依序地堆疊於第一線路層21上,各第一保護層13上具有第一連通開口131,第二線路層23的兩層之間以及第二線路層23中的最下層與第一線路層21之間透過第一連通開口131彼此連接。在此,第二線路層23可以是為重分配層(Redistribution Layer,RDL),每個第二線路層23可以具有不同的線路佈局。第二保護層15位於最上端的第二線路層23上,具有第二連通開口151。第三線路層25透過第二連通開口151連接最上端的第二線路層23,其中第三線路層25包含複數個第二晶片接點251。The first wiring layer 21 is located on the first surface 11A of the substrate layer 11 and includes a plurality of first chip contacts 211. A plurality of first protection layers 13 and a plurality of second wiring layers 23 are sequentially stacked on the first wiring layer 21. Each first protection layer 13 has a first connection opening 131. The first connection openings 131 connect the two layers of the second wiring layer 23 and the bottommost layer of the second wiring layer 23 to the first wiring layer 21. The second wiring layer 23 can be a redistribution layer (RDL), and each second wiring layer 23 can have a different wiring layout. The second protection layer 15 is located on the topmost second wiring layer 23 and has a second connection opening 151. The third circuit layer 25 is connected to the uppermost second circuit layer 23 through the second connecting opening 151 , wherein the third circuit layer 25 includes a plurality of second chip contacts 251 .
第三保護層31位於基底層11的第二表面11B,第三保護層31及基底層11共同開設有連通的第三連通開口311及開槽313,開槽313暴露出第一晶片接點211。第四線路層33位於第三保護層31上,透過第三連通開口311連接第一線路層21,且第四線路層33具有複數個銲接接點331。在此,第四線路層33也可以是多層、基底層11上也可以單獨具有連通開口,第四線路層33形成於基底層11上後,透過開口連接第一線路層21,另外在設置第三保護層31、第四線路層33,第四線路層33再與底下的第四線路層33透過連通開口連接。以上僅為示例,而非用以限制,實際需依據規格及佈線而決定。The third protective layer 31 is located on the second surface 11B of the base layer 11. The third protective layer 31 and the base layer 11 are interconnected by a third connecting opening 311 and a groove 313. The groove 313 exposes the first chip contact 211. The fourth circuit layer 33 is located on the third protective layer 31 and is connected to the first circuit layer 21 through the third connecting opening 311. The fourth circuit layer 33 has a plurality of solder contacts 331. Here, the fourth wiring layer 33 can also be multiple layers, and the base layer 11 can also have a single connecting opening. After the fourth wiring layer 33 is formed on the base layer 11, it is connected to the first wiring layer 21 through the opening. Furthermore, after the third protection layer 31 and the fourth wiring layer 33 are provided, the fourth wiring layer 33 is further connected to the underlying fourth wiring layer 33 through the connecting opening. The above is merely an example and is not intended to be limiting. The actual configuration will depend on the specifications and layout.
第一防銲層41位於第四線路層33上,具有複數個第一防銲開口411,第一防銲開口411分別暴露出銲接接點331。第二防銲層43位於第三線路層25上,具有第二防銲開槽431,第二防銲開槽431暴露出第二晶片接點251。The first solder barrier layer 41 is located on the fourth circuit layer 33 and has a plurality of first solder barrier openings 411 that expose the soldering contacts 331. The second solder barrier layer 43 is located on the third circuit layer 25 and has second solder barrier grooves 431 that expose the second chip contacts 251.
在此,雙面封裝晶片載板1的厚度大於250μm,且開槽313的深度大於100μm。透過較深的開槽313能夠容置較夠的晶片,使得整體的厚度影響有限,且不影響到銲接接點331的佈設,藉此能提供單位面積更多個I/O佈局,以利於晶片密度的提升。Here, the thickness of the double-sided package chip carrier 1 is greater than 250μm, and the depth of the groove 313 is greater than 100μm. The deeper groove 313 can accommodate more chips, limiting the impact of the overall thickness and not affecting the layout of the solder contacts 331. This can provide more I/O layouts per unit area, thereby facilitating increased chip density.
在一些實施例中,第一晶片接點211之間的第一間距P1小於銲接接點331之間的第二間距P2。更詳細地,在一些實施例中,第一間距P1為90至180μm。進一步地,在一些實施例中,第一間距P1為100至160μm。In some embodiments, the first spacing P1 between the first chip contacts 211 is smaller than the second spacing P2 between the solder contacts 331. More specifically, in some embodiments, the first spacing P1 is 90 to 180 μm. Furthermore, in some embodiments, the first spacing P1 is 100 to 160 μm.
在一些實施例中,第一線路層21、該等第二線路層23、第三線路層25及第四線路層33的總數量大於九。例如,11層,若考量晶片的高度,還可以增加第三保護層31及第四線路層33的數量,在最小影響厚度的狀況下,還可以增加線路密度。In some embodiments, the total number of first wiring layer 21, second wiring layers 23, third wiring layer 25, and fourth wiring layer 33 is greater than nine, for example, 11 layers. Considering the chip height, the number of third protection layer 31 and fourth wiring layer 33 can be increased to increase circuit density while minimizing the impact on chip thickness.
在一些實施例中,第三線路層25更包含複數個連接接點253,第二防銲層43還包含第三防銲開槽433,第三防銲開槽433暴露出連接接點253的一部分,同時提供足夠的寬度。In some embodiments, the third circuit layer 25 further includes a plurality of connection contacts 253, and the second solder-proof layer 43 further includes a third solder-proof slot 433. The third solder-proof slot 433 exposes a portion of the connection contacts 253 while providing sufficient width.
圖2為雙面晶片封裝結構一實施例的剖面示意圖。如圖2所示,同時參考圖1,雙面晶片封裝結構100是應用圖1的雙面封裝晶片載板1進行封裝的結構,在重複的部分不再贅述。如圖2所示,雙面晶片封裝結構100包含雙面封裝晶片載板1、第一晶片51及第二晶片53。第一晶片51銲接於第一晶片接點211。第二晶片53銲接於第二晶片接點251。在此,透過第一線路層21中佈設第一晶片接點211,以背向開槽313的方式形成容置第一晶片51,可以達到維持雙面封裝晶片載板1的厚度、維持銲接接點331的間隙(pitch)的功效,同時在增加在單位面積的銲接接點331,即輸入/輸出(I/O)的數量,能應用於高晶片密度的精密封裝。Figure 2 is a schematic cross-sectional view of an embodiment of a double-sided chip package structure. As shown in Figure 2 , and with reference to Figure 1 , double-sided chip package structure 100 utilizes the double-sided chip carrier 1 of Figure 1 for packaging. Repeated descriptions are omitted. As shown in Figure 2 , double-sided chip package structure 100 includes double-sided chip carrier 1, a first chip 51, and a second chip 53. The first chip 51 is soldered to the first chip contact 211. The second chip 53 is soldered to the second chip contact 251. Here, by disposing the first chip contacts 211 in the first circuit layer 21 and forming a back-facing groove 313 to accommodate the first chip 51, the thickness of the double-sided package chip carrier 1 and the pitch of the soldering contacts 331 can be maintained. At the same time, the number of soldering contacts 331 per unit area, i.e., the number of input/output (I/O) points, can be increased, which can be applied to high-chip density precision packaging.
進一步地,在一些實施例中,雙面晶片封裝結構100更包含第一封裝層61及第二封裝層63。第一封裝層61覆蓋第一晶片51、第一晶片接點211、基底層11的第二表面11B以及第一防銲層41。第二封裝層63覆蓋第二晶片53、第二晶片接點251及第二防銲層43。第一封裝層61及第二封裝層63在完成封裝後,避免第一晶片51/第二晶片53及第一晶片接點211/第二晶片接點251的露出,以減少外部環境造成的氧化而影響電性。再完成第一封裝層61及第二封裝層63後,整體的厚度增加小於120μm。另外,第一封裝層61及第二封裝層63均可以為防銲的材料,也就是,在覆蓋於第一防銲層41及第二防銲層43上,不影響防銲的保護。Furthermore, in some embodiments, the double-sided chip package structure 100 further includes a first packaging layer 61 and a second packaging layer 63. The first packaging layer 61 covers the first chip 51, the first chip contact 211, the second surface 11B of the base layer 11, and the first solder barrier layer 41. The second packaging layer 63 covers the second chip 53, the second chip contact 251, and the second solder barrier layer 43. After packaging, the first and second packaging layers 61 and 63 prevent exposure of the first and second chips 51 and 53 and the first and second chip contacts 211 and 251, thereby reducing oxidation caused by the external environment and affecting electrical properties. After the first and second packaging layers 61 and 63 are completed, the overall thickness increases by less than 120 μm. In addition, the first packaging layer 61 and the second packaging layer 63 can both be made of anti-soldering materials, that is, they cover the first anti-soldering layer 41 and the second anti-soldering layer 43 without affecting the anti-soldering protection.
更詳細地,在一些實施例中,在具有連接接點253及第三防銲開槽433的實施例中,雙面晶片封裝結構100更包含被動元件70,被動元件70與連接接點253連接,例如,以跨接的方式連接於兩個連接接點253的一部分上。另外,第二封裝層63更覆蓋被動元件70。進一步地,連接接點253可以利用錫球(圖中未示出)直接銲接,無須再透過其他的方式達到墊高的作用。此外,第一防銲開口411中也可以錫球80來輔助整體的電性連接。More specifically, in some embodiments, in embodiments having connection contacts 253 and third anti-welding slots 433, the double-sided chip package structure 100 further includes a passive component 70, which is connected to the connection contacts 253, for example, by being connected to a portion of the two connection contacts 253 in a bridging manner. Furthermore, the second packaging layer 63 further covers the passive component 70. Furthermore, the connection contacts 253 can be directly soldered using solder balls (not shown), eliminating the need for other methods to achieve a raised surface. Furthermore, solder balls 80 can also be placed in the first anti-welding slots 411 to assist in overall electrical connection.
綜上所述,利用在第一線路層21中佈設第一晶片接點211,並以背向開槽的方式形成容置第一晶片51的位置,可以達到維持雙面封裝晶片載板1、維持連接接點253的間隙的功效,同時在增加在單位面積的連接接點253,即輸入/輸出(I/O)的數量,能應用於高晶片密度的精密封裝,且具節省成本及工時的功效。In summary, by disposing the first chip contacts 211 in the first circuit layer 21 and forming a position for accommodating the first chip 51 by means of a back-grooved pattern, it is possible to maintain the double-sided packaging of the chip carrier 1 and the gap between the connection contacts 253. At the same time, the number of connection contacts 253 per unit area, i.e., the number of input/output (I/O), can be increased. This can be applied to high-chip density precision packaging and saves costs and labor hours.
雖然本發明的技術內容已經以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神所作些許之更動與潤飾,皆應涵蓋於本發明的範疇內,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the technical contents of the present invention have been disclosed above with reference to the preferred embodiments, they are not intended to limit the present invention. Any slight changes and modifications made by anyone skilled in the art without departing from the spirit of the present invention should be included within the scope of the present invention. Therefore, the scope of protection of the present invention shall be determined by the scope of the attached patent application.
1:雙面封裝晶片載板 11:基底層 11A:第一表面 11B:第二表面 13:第一保護層 131:第一連通開口 15:第二保護層 151:第二連通開口 21:第一線路層 211:第一晶片接點 23:第二線路層 25:第三線路層 251:第二晶片接點 253:連接接點 31:第三保護層 311:第三連通開口 313:開槽 33:第四線路層 331:銲接接點 41:第一防銲層 411:第一防銲開口 43:第二防銲層 431:第二防銲開槽 433:第三防銲開槽 51:第一晶片 53:第二晶片 61:第一封裝層 63:第二封裝層 70:被動元件 80:錫球 100:雙面晶片封裝結構 P1:第一間距 P2:第二間距 1: Double-Sided Chip Carrier 11: Base Layer 11A: First Surface 11B: Second Surface 13: First Protective Layer 131: First Connection Opening 15: Second Protective Layer 151: Second Connection Opening 21: First Circuit Layer 211: First Chip Contact 23: Second Circuit Layer 25: Third Circuit Layer 251: Second Chip Contact 253: Connecting Contact 31: Third Protective Layer 311: Third Connection Opening 313: Slot 33: Fourth Circuit Layer 331: Solder Contact 41: First Anti-Welding Layer 411: First Anti-Welding Opening 43: Second Anti-Welding Layer 431: Second soldering groove 433: Third soldering groove 51: First chip 53: Second chip 61: First packaging layer 63: Second packaging layer 70: Passive component 80: Solder ball 100: Double-sided chip package structure P1: First pitch P2: Second pitch
圖1為雙面封裝晶片載板一實施例的剖面示意圖。 圖2為雙面晶片封裝結構一實施例的剖面示意圖。 Figure 1 is a schematic cross-sectional view of an embodiment of a double-sided package chip carrier. Figure 2 is a schematic cross-sectional view of an embodiment of a double-sided chip package structure.
1:雙面封裝晶片載板 1: Double-sided package chip carrier
11:基底層 11: Basal layer
11A:第一表面 11A: First Surface
11B:第二表面 11B: Second surface
13:第一保護層 13: First protective layer
131:第一連通開口 131: First connection opening
15:第二保護層 15: Second protective layer
151:第二連通開口 151: Second connection opening
21:第一線路層 21: First Line Layer
211:第一晶片接點 211: First chip contact
23:第二線路層 23: Second circuit layer
25:第三線路層 25: Third Line Layer
251:第二晶片接點 251: Second chip contact
253:連接接點 253: Connection point
31:第三保護層 31: Third protection layer
311:第三連通開口 311: Third connection opening
313:開槽 313: Slotting
33:第四線路層 33: Fourth circuit layer
331:銲接接點 331: Soldering contacts
41:第一防銲層 41: First solder barrier layer
411:第一防銲開口 411: First solder-proof opening
43:第二防銲層 43: Second solder barrier layer
431:第二防銲開槽 431: Second anti-weld slot
433:第三防銲開槽 433: Third anti-weld slot
P1:第一間距 P1: First Pitch
P2:第二間距 P2: Second spacing
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| US20220238351A1 (en) * | 2021-01-26 | 2022-07-28 | Yangtze Memory Technologies Co., Ltd. | Substrate structure, and fabrication and packaging methods thereof |
| TW202336876A (en) * | 2022-03-04 | 2023-09-16 | 大陸商芯愛科技(南京)有限公司 | Substrate structure |
| TW202435400A (en) * | 2023-02-20 | 2024-09-01 | 大陸商芯愛科技(南京)有限公司 | Electronic package and manufacturing method thereof |
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| US20220238351A1 (en) * | 2021-01-26 | 2022-07-28 | Yangtze Memory Technologies Co., Ltd. | Substrate structure, and fabrication and packaging methods thereof |
| TW202336876A (en) * | 2022-03-04 | 2023-09-16 | 大陸商芯愛科技(南京)有限公司 | Substrate structure |
| TW202435400A (en) * | 2023-02-20 | 2024-09-01 | 大陸商芯愛科技(南京)有限公司 | Electronic package and manufacturing method thereof |
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