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TWI831741B - Fluorine-containing ether compositions, coating fluids and articles - Google Patents

Fluorine-containing ether compositions, coating fluids and articles Download PDF

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TWI831741B
TWI831741B TW107107431A TW107107431A TWI831741B TW I831741 B TWI831741 B TW I831741B TW 107107431 A TW107107431 A TW 107107431A TW 107107431 A TW107107431 A TW 107107431A TW I831741 B TWI831741 B TW I831741B
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星野泰輝
小林大介
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日商Agc股份有限公司
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • General Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Paints Or Removers (AREA)
  • Polyethers (AREA)
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  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

本發明提供一種可形成潤滑性及耐久性優異之表面層的含氟醚組成物及塗佈液,以及具有潤滑性及耐久性優異之表面層的物品。 一種含氟醚組成物,含有含氟醚化合物(A)與含氟醚化合物(B);前述含氟醚化合物(A)為具有含(CF2 O)單元之聚(氧全氟伸烷基)鏈及下式(I)所示基團的化合物,前述含氟醚化合物(B)為具有不含(CF2 O)單元之聚(氧全氟伸烷基)鏈及前述式(I)所示基團的化合物。-SiRn L3-n …(I);惟,L為羥基或水解性基,R為氫原子或1價烴基。The present invention provides a fluorine-containing ether composition and coating liquid that can form a surface layer excellent in lubricity and durability, and an article having a surface layer excellent in lubricity and durability. A fluorine-containing ether composition, containing a fluorine-containing ether compound (A) and a fluorine-containing ether compound (B); the aforementioned fluorine-containing ether compound (A) is a poly(oxyperfluoroalkylene) group containing (CF 2 O) units ) chain and a group represented by the following formula (I), the aforementioned fluoroether compound (B) is a poly(oxyperfluoroalkylene) chain that does not contain (CF 2 O) units and the aforementioned formula (I) Compounds of the groups shown. -SiR n L 3-n ...(I); however, L is a hydroxyl group or a hydrolyzable group, and R is a hydrogen atom or a monovalent hydrocarbon group.

Description

含氟醚組成物、塗佈液及物品Fluorine-containing ether compositions, coating fluids and articles

本發明涉及一種含氟醚組成物、塗佈液及物品。The invention relates to a fluorine-containing ether composition, coating liquid and articles.

發明背景 含氟化合物可展現高潤滑性、撥水撥油性等,所以可用於表面處理劑等。譬如,若利用表面處理劑於基材表面形成表面層,即可賦予潤滑性、撥水撥油性等,便容易拭去基材表面的污垢,提升污垢去除性。含氟化合物中又以含氟醚化合物具有優異的油脂等污垢去除性,該含氟醚化合物於全氟烷基鏈當中具有存在醚鍵(-O-)的聚(氧全氟伸烷基)鏈。Background of the Invention Fluorine-containing compounds can exhibit high lubricity, water and oil repellency, etc., and therefore can be used as surface treatment agents and the like. For example, if a surface treatment agent is used to form a surface layer on the surface of a substrate, it can impart lubricity, water and oil repellency, etc., making it easier to wipe off dirt on the surface of the substrate and improve dirt removal performance. Among fluorine-containing compounds, fluorine-containing ether compounds are excellent in removing grease and other dirt. These fluorine-containing ether compounds have a poly(oxyperfluoroalkyl) group with an ether bond (-O-) in the perfluoroalkyl chain. chain.

有文獻提議以具有水解性矽基者作為含氟醚化合物。這種含氟醚化合物可用在要求長期維持耐摩擦性及指紋污垢去除性之用途上,例如可用於觸控面板之構成手指觸摸面之構件的表面處理劑,耐摩擦性係指即使以手指反覆摩擦也不易降低撥水撥油性的性能,指紋污垢去除性係指藉由擦拭即可輕易去除附著於表面之指紋的性能。Some literature proposes using those with hydrolyzable silicon groups as fluorine-containing ether compounds. This fluorine-containing ether compound can be used in applications that require long-term maintenance of friction resistance and fingerprint dirt removal properties. For example, it can be used as a surface treatment agent for the components that constitute the finger touch surface of touch panels. The friction resistance refers to the friction resistance even if the finger is repeatedly used. The water- and oil-repellent properties are not easily reduced by friction. The fingerprint dirt repellency refers to the ability to easily remove fingerprints attached to the surface by wiping.

為了提高潤滑性,有文獻提出一種於具水解性矽基之含氟醚化合物摻合含氟油即不具水解性矽基之非反應性含氟醚化合物的含氟醚組成物(譬如專利文獻1)。In order to improve the lubricity, some documents propose a fluorine-containing ether composition in which a fluorine-containing ether compound with a hydrolyzable silicon group is blended with a fluorine-containing oil, that is, a non-reactive fluorine-containing ether compound without a hydrolyzable silicon group (for example, Patent Document 1 ).

先前技術文獻 專利文獻 專利文獻1:日本特開2014-65884號公報Prior Art Document Patent Document Patent Document 1: Japanese Patent Application Publication No. 2014-65884

發明概要 發明欲解決之課題 但,據本發明人研究可知,藉由上述含氟醚組成物形成之表面層在以手指等反覆摩擦後,潤滑性、撥水撥油性等性能很容易降低(耐久性低)。所以,潤滑性及耐久性兩特性很難同時維持高水平。Summary of the Invention Problems to be Solved by the Invention However, studies by the present inventors revealed that the surface layer formed of the above-mentioned fluorine-containing ether composition easily deteriorates in properties such as lubricity and water- and oil-repellency (durability) after repeated rubbing with fingers or the like. low sex). Therefore, it is difficult to maintain high levels of both lubricity and durability properties at the same time.

本發明目的在於提供一種可形成潤滑性及耐久性優異之表面層的含氟醚組成物及塗佈液,以及具有潤滑性及耐久性優異之表面層的物品。 用以解決課題之手段An object of the present invention is to provide a fluoroether composition and coating liquid that can form a surface layer excellent in lubricity and durability, and an article having a surface layer excellent in lubricity and durability. means to solve problems

本發明提供一種具有以下[1]~[15]之構成的含氟醚組成物、塗佈液及物品。 [1]一種含氟醚組成物,其特徵在於含有含氟醚化合物(A)與含氟醚化合物(B); 前述含氟醚化合物(A)為具有含(CF2 O)單元之聚(氧全氟伸烷基)鏈及下式(I)所示基團之化合物; 前述含氟醚化合物(B)為具有不含(CF2 O)單元之聚(氧全氟伸烷基)鏈及前述式(I)所示基團的化合物。 -SiRn L3-n …(I) 惟,L為羥基或水解性基; R為氫原子或1價烴基; n為0~2之整數; n為0或1時,(3-n)個L可相同亦可互異; n為2時,n個R可相同亦可互異; 其中,前述含氟醚化合物(A)及前述含氟醚化合物(B)各自所具有的前述式(I)所示基團可相同亦可互異。The present invention provides a fluorine-containing ether composition, coating liquid and article having the following compositions [1] to [15]. [1] A fluorine-containing ether composition, characterized in that it contains a fluorine-containing ether compound (A) and a fluorine-containing ether compound (B); the aforementioned fluorine-containing ether compound (A) is a poly((CF 2 O)-containing unit). A compound containing an oxyperfluoroalkylene) chain and a group represented by the following formula (I); The aforementioned fluoroether compound (B) is a poly(oxyperfluoroalkylene) chain that does not contain (CF 2 O) units And the compound of the group represented by the aforementioned formula (I). -SiR n L 3-n …(I) However, L is a hydroxyl group or a hydrolyzable group; R is a hydrogen atom or a monovalent hydrocarbon group; n is an integer from 0 to 2; when n is 0 or 1, (3-n) L may be the same or different from each other; when n is 2, n R may be the same or different from each other; wherein, the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B) each have the aforementioned formula ( The groups shown in I) may be the same or different from each other.

[2]如[1]之含氟醚組成物,其中前述含氟醚化合物(A)與前述含氟醚化合物(B)皆為下式(A/B)所示含氟醚化合物; 前述含氟醚化合物(A)中之Rf 為含(CF2 O)單元之聚(氧全氟伸烷基)鏈, 前述含氟醚化合物(B)中之Rf 則為不含(CF2 O)單元之聚(氧全氟伸烷基)鏈。 [Rf1 -O-Q-Rf -]r Z[-SiRn L3-n ]s …(A/B) 惟,Rf1 為全氟烷基; Q為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,且構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異; Rf 為聚(氧全氟伸烷基)鏈; Z為(r+s)價連結基; -SiRn L3-n 為前述式(I)所示基團; r為2以上時,r個[Rf1 -O-Q-Rf -]為相同基團; s為2以上時,s個式(I)所示基團為相同基團; r及s分別為1以上之整數且r+s為3~8。[2] The fluorine-containing ether composition of [1], wherein the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B) are both fluorine-containing ether compounds represented by the following formula (A/B); R f in the fluoroether compound (A) is a poly(oxyperfluoroalkylene) chain containing (CF 2 O) units, while R f in the aforementioned fluoroether compound (B) is a poly(oxyperfluoroalkylene) chain containing (CF 2 O) units. ) unit of a poly(oxyperfluoroalkylene) chain. [R f1 -OQR f -] r Z[-SiR n L 3-n ] s …(A/B) However, R f1 is a perfluoroalkyl group; Q is a single bond, oxygen fluorine containing more than 1 hydrogen atom An alkylene group or a polyoxyfluoroalkylene group formed by bonding 2 to 5 of the oxyfluoroalkylene groups, and the oxyfluoroalkylene groups constituting the polyoxyfluoroalkylene group may all be the same or different from each other; R f is a poly(oxyperfluoroalkylene) chain; Z is a (r+s) valent linking group; -SiR n L 3-n is a group represented by the aforementioned formula (I); when r is 2 or more, r [R f1 -OQR f -] are the same group; when s is 2 or more, s groups shown in formula (I) are the same group; r and s are respectively an integer of 1 or more and r+s is 3 ~8.

[3]如[1]或[2]之含氟醚組成物,其中前述含(CF2 O)單元之聚(氧全氟伸烷基)鏈係含有(CF2 O)單元與(CF2 CF2 O)單元的聚(氧全氟伸烷基)鏈。 [4]如[1]~[3]中任一項之含氟醚組成物,其中前述不含(CF2 O)單元之聚(氧全氟伸烷基)鏈係含有選自(CF2 CF2 O)單元、(CF2 CF2 CF2 O)單元及(CF2 CF2 CF2 CF2 O)單元中之至少1種單元的聚(氧全氟伸烷基)鏈。 [5]如[1]~[4]中任一項之含氟醚組成物,其中前述不含(CF2 O)單元之聚(氧全氟伸烷基)鏈係含(CF2 CF2 OCF2 CF2 CF2 CF2 O)單元的聚(氧全氟伸烷基)鏈。 [6]如[1]~[5]中任一項之含氟醚組成物,其中前述含氟醚化合物(A)及前述含氟醚化合物(B)至少一者具有3個以上前述式(I)所示基團。 [7]如[1]~[5]中任一項之含氟醚組成物,其中前述含氟醚化合物(A)及前述含氟醚化合物(B)兩者具有2個以上前述式(I)所示基團。 [8]如[1]~[5]中任一項之含氟醚組成物,其中前述含氟醚化合物(A)及前述含氟醚化合物(B)兩者具有3個以上前述式(I)所示基團。 [9]如[1]~[8]中任一項之含氟醚組成物,其中前述含氟醚化合物(A)之數量平均分子量為2,000~20,000。 [10]如[1]~[9]中任一項之含氟醚組成物,其中前述含氟醚化合物(B)之數量平均分子量為2,000~20,000。 [11]如[1]~[10]中任一項之含氟醚組成物,其含有相對於前述含氟醚化合物(A)與前述含氟醚化合物(B)之合計量為10~80質量%之前述含氟醚化合物(A)。[3] The fluorine-containing ether composition of [1] or [2], wherein the poly(oxyperfluoroalkylene) chain system containing (CF 2 O) units contains (CF 2 O) units and (CF 2 Poly(oxyperfluoroalkylene) chains of CF 2 O) units. [4] The fluorine-containing ether composition according to any one of [1] to [3], wherein the aforementioned poly(oxyperfluoroalkylene) chain system containing no (CF 2 O) unit contains a chain selected from (CF 2 A poly(oxyperfluoroalkylene) chain of at least one unit among a CF 2 O) unit, a (CF 2 CF 2 CF 2 O) unit and a (CF 2 CF 2 CF 2 CF 2 O) unit. [5] The fluorine-containing ether composition according to any one of [1] to [4], wherein the aforementioned poly(oxyperfluoroalkylene) chain system without (CF 2 O) units contains (CF 2 CF 2 Poly(oxyperfluoroalkylene) chain of OCF 2 CF 2 CF 2 CF 2 O) units. [6] The fluorine-containing ether composition according to any one of [1] to [5], wherein at least one of the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B) has three or more of the aforementioned formulas ( I) group shown. [7] The fluorine-containing ether composition according to any one of [1] to [5], wherein both the above-mentioned fluorine-containing ether compound (A) and the above-mentioned fluorine-containing ether compound (B) have two or more of the above-mentioned formulas (I) ) group shown. [8] The fluorine-containing ether composition according to any one of [1] to [5], wherein both the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B) have three or more of the aforementioned formula (I) ) group shown. [9] The fluorine-containing ether composition according to any one of [1] to [8], wherein the number average molecular weight of the aforementioned fluorine-containing ether compound (A) is 2,000 to 20,000. [10] The fluorine-containing ether composition according to any one of [1] to [9], wherein the number average molecular weight of the aforementioned fluorine-containing ether compound (B) is 2,000 to 20,000. [11] The fluorine-containing ether composition according to any one of [1] to [10], which contains 10 to 80% of the total amount of the fluorine-containing ether compound (A) and the fluorine-containing ether compound (B). Mass % of the aforementioned fluoroether compound (A).

[12]一種含氟醚組成物,其特徵在於含有下式(A1)所示含氟醚化合物(A1)與下式(B1)所示含氟醚化合物(B1)。 [Rf1a -O-Qa -Rfa -]ra Za [-SiRa na La 3-na ]sa …(A1) [Rf1b -O-Qb -Rfb -]rb Zb [-SiRb nb Lb 3-nb ]sb …(B1) 惟,Rf1a 及Rf1b 為全氟烷基; Qa 及Qb 為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,且構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異; Rfa 為含(CF2 O)單元之聚(氧全氟伸烷基)鏈; Rfb 為不含(CF2 O)單元之聚(氧全氟伸烷基)鏈; Za 為(ra+sa)價連結基; Zb 為(rb+sb)價連結基; La 及Lb 為羥基或水解性基; Ra 及Rb 為氫原子或1價烴基; na及nb為0~2之整數; na為0或1時之(3-na)個La 、nb為0或1時之(3-nb)個Lb 分別可相同亦可互異; na為2時之na個Ra 、nb為2時之nb個Rb 分別可相同亦可互異; ra及rb為1以上之整數,ra為2以上時ra個[Rf1a -O-Qa -Rfa -]可相同亦可互異,rb為2以上時rb個[Rf1b -O-Qb -Rfb -]可相同亦可互異; sa及sb為1以上之整數,sa為2以上時sa個[-SiRa na La 3-na ]可相同亦可互異,sb為2以上時sb個[-SiRb nb Lb 3-nb ]可相同亦可互異。 [13]如[12]之含氟醚組成物,其含有相對於前述含氟醚化合物(A1)與前述含氟醚化合物(B1)之合計量為10~80質量%之前述含氟醚化合物(A1)。 [14]一種塗佈液,其特徵在於含有如前述[1]~[13]中任一項之含氟醚組成物及液態介質。 [15]一種物品,其特徵在於具有由如前述[1]~[13]中任一項之含氟醚組成物形成的表面層。[12] A fluorine-containing ether composition characterized by containing a fluorine-containing ether compound (A1) represented by the following formula (A1) and a fluorine-containing ether compound (B1) represented by the following formula (B1). [R f1a -OQ a -R fa -] ra Z a [-SiR a na L a 3-na ] sa …(A1) [R f1b -OQ b -R fb -] rb Z b [-SiR b nb L b 3-nb ] sb ...(B1) However, R f1a and R f1b are perfluoroalkyl groups; Q a and Q b are single bonds, oxyfluoroalkyl alkylene groups containing more than 1 hydrogen atom or 2 to 5 The oxyfluoroalkylene group is a polyoxyfluoroalkylene group formed by bonding the oxyfluoroalkylene group, and the oxyfluoroalkylene groups constituting the polyoxyfluoroalkylene group can all be the same or different from each other; R fa is containing (CF 2 O) unit of poly(oxyperfluoroalkylene) chain; R fb is a poly(oxyperfluoroalkylene) chain that does not contain (CF 2 O) units; Z a is a (ra+sa) valence linking group; Z b is a (rb+sb) valent linking group; L a and L b are hydroxyl groups or hydrolyzable groups; R a and R b are hydrogen atoms or monovalent hydrocarbon groups; na and nb are integers from 0 to 2; na is 0 or 1 The (3-na) L a when nb is 0 or 1, the (3-nb) L b can be the same or different respectively; the na R a when na is 2, and the nb when nb is 2 R b can be the same or different from each other; ra and rb are integers above 1. When ra is 2 or above, ra [R f1a -OQ a -R fa -] can be the same or different. When rb is 2 or above The rb numbers [R f1b -OQ b -R fb -] can be the same or different; sa and sb are integers above 1, and when sa is 2 or more, the sa numbers [-SiR a na L a 3-na ] can be the same or different. Can be different from each other. When sb is 2 or more, the sb [-SiR b nb L b 3-nb ] can be the same or different from each other. [13] The fluorine-containing ether composition of [12], which contains the above-mentioned fluorine-containing ether compound in an amount of 10 to 80% by mass relative to the total amount of the above-mentioned fluorine-containing ether compound (A1) and the above-mentioned fluorine-containing ether compound (B1) (A1). [14] A coating liquid characterized by containing the fluorine-containing ether composition according to any one of the above [1] to [13] and a liquid medium. [15] An article characterized by having a surface layer formed of the fluorine-containing ether composition according to any one of the above [1] to [13].

發明效果 利用本發明之含氟醚組成物及塗佈液,可形成潤滑性及耐久性優異的表面層。 本發明之物品具有潤滑性及耐久性優異的表面層。Effects of the Invention Using the fluorine-containing ether composition and coating liquid of the present invention, a surface layer excellent in lubricity and durability can be formed. The article of the present invention has a surface layer excellent in lubricity and durability.

用以實施發明之形態 在本說明書中,式(1)所示化合物表記為化合物(1)。以其他式表示之化合物亦以同樣方式表記。 本說明書中之以下用語意義如下。 「水解性矽基」係指可藉由水解反應形成矽烷醇基(Si-OH)之基。譬如,式(I)中之L為水解性基之基。 氧全氟伸烷基之化學式係將其氧原子記載於全氟伸烷基之右側來表示。 「表面層」係指形成於基材表面之層。 塗佈塗佈液後予以「乾燥」意指將塗佈液塗佈於基材於該基材上形成塗佈液之塗膜後,使液態介質從該塗膜蒸發去除。Modes for Carrying Out the Invention In this specification, the compound represented by formula (1) is represented as compound (1). Compounds represented by other formulas are also represented in the same manner. The following terms in this manual have the following meanings. "Hydrolyzable silicon group" refers to a group that can form a silanol group (Si-OH) through a hydrolysis reaction. For example, L in formula (I) is a hydrolyzable group. The chemical formula of the oxygen perfluoroalkylene group is represented by describing the oxygen atom on the right side of the perfluoroalkylene group. "Surface layer" refers to the layer formed on the surface of the substrate. "Drying" after applying the coating liquid means that the coating liquid is applied to the base material to form a coating film of the coating liquid on the base material, and then the liquid medium is evaporated and removed from the coating film.

[含氟醚組成物] 本發明之含氟醚組成物(以下亦表記為本組成物)含有含氟醚化合物(A)(以下亦表記為化合物(A))及含氟醚化合物(B)(以下亦表記為化合物(B))。本組成物如後述不含液態介質。本組成物可由化合物(A)及化合物(B)構成,亦可如後述含有化合物(A)及化合物(B)以外之其他含氟醚化合物或化合物(A)、化合物(B)及其他含氟醚化合物以外的不純物。 化合物(A)具有含(CF2 O)單元之聚(氧全氟伸烷基)鏈(以下亦表記為A鏈)及基(I)。 化合物(B)具有不含(CF2 O)單元之聚(氧全氟伸烷基)鏈(以下亦表記為B鏈)及基(I)。化合物(B)不具有A鏈。 -SiRn L3-n …(I) 惟,L為羥基或水解性基; R為氫原子或1價烴基; n為0~2之整數; n為0或1時,(3-n)個L可相同亦可互異; n為2時,n個R可相同亦可互異; 化合物(A)及化合物(B)各自所具有之基(I)可相同亦可互異。[Fluorine-containing ether composition] The fluorine-containing ether composition (hereinafter also referred to as this composition) of the present invention contains a fluorine-containing ether compound (A) (hereinafter also referred to as compound (A)) and a fluorine-containing ether compound (B) (Hereinafter also referred to as compound (B)). This composition does not contain a liquid medium as mentioned later. The composition may be composed of Compound (A) and Compound (B), and may also contain other fluorine-containing ether compounds other than Compound (A) and Compound (B), or Compound (A), Compound (B) and other fluorine-containing ether compounds as described later. Impurities other than ether compounds. Compound (A) has a poly(oxyperfluoroalkylene) chain containing (CF 2 O) units (hereinafter also referred to as A chain) and a group (I). Compound (B) has a poly(oxyperfluoroalkylene) chain (hereinafter also referred to as B chain) containing no (CF 2 O) unit and a group (I). Compound (B) does not have an A chain. -SiR n L 3-n …(I) However, L is a hydroxyl group or a hydrolyzable group; R is a hydrogen atom or a monovalent hydrocarbon group; n is an integer from 0 to 2; when n is 0 or 1, (3-n) The L's may be the same or different; when n is 2, the n R's may be the same or different; the group (I) of the compound (A) and the compound (B) may be the same or different.

化合物(A)、化合物(B)更可各自具有基(II)。化合物(A)及化合物(B)兩者具有基(II)時,各自所具有之基(II)可相同亦可互異。 Rf1 -O-Q-…(II) 惟, Rf1 為全氟烷基; Q為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基。構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異。Compound (A) and compound (B) may each have a group (II). When both compound (A) and compound (B) have a group (II), the groups (II) they have may be the same or different from each other. R f1 -OQ-…(II) However, R f1 is a perfluoroalkyl group; Q is a single bond, an oxyfluoroalkylene group containing more than 1 hydrogen atom, or bonded by 2 to 5 of the oxyfluoroalkylene group. Made of polyoxyfluoroalkylene. The oxyfluoroalkylene groups constituting the polyoxyfluoroalkylene group may all be the same or different from each other.

(A鏈) A鏈可舉如下式(a1)所示含有(CF2 O)單元與(Rf2 O)單元之聚(氧全氟伸烷基)鏈。 {(CF2 O)m1 (Rf2 O)m2 }…(a1) 惟,Rf2 為碳數2以上之全氟伸烷基; m1為1以上之整數,m2為0以上之整數,且(m1+m2)為2~200之整數; m2為1以上時,m1個CF2 O及m2個Rf2 O之鍵結順序不限; m2為2以上時(Rf2 O)m2 亦可由碳數不同之2種以上Rf2 O構成。(A chain) Examples of the A chain include poly(oxyperfluoroalkylene) chains containing (CF 2 O) units and (R f 2 O) units as shown in the following formula (a1). {(CF 2 O) m1 (R f2 O) m2 }…(a1) However, R f2 is a perfluoroalkylene group with a carbon number of 2 or more; m1 is an integer of 1 or more, m2 is an integer of 0 or more, and ( m1+m2) is an integer from 2 to 200; when m2 is more than 1, the bonding order of m1 CF 2 O and m2 R f2 O is not limited; when m2 is more than 2 (R f2 O) m2 can also be composed of carbon numbers It is composed of two or more different types of R f2 O.

Rf2 可為分枝狀亦可為直鏈狀,若從表面層之潤滑性更佳的觀點來看,宜為直鏈狀。 若從表面層之耐久性及潤滑性更佳的觀點來看,Rf2 之碳數宜為2~6且2~4較佳;若從表面層之潤滑性更佳的觀點來看,則2尤佳。R f2 may be branched or linear. From the viewpoint of better lubricity of the surface layer, linear chain is preferred. From the perspective of better durability and lubricity of the surface layer, the carbon number of R f2 should be 2 to 6 and preferably 2 to 4; from the perspective of better lubricity of the surface layer, then 2 Excellent.

(m1+m2)為2~200之整數。因此,m1為1時m2之最小值為1,即至少存在1個(Rf2 O)。m1為2以上時m2之最小值為0,(Rf2 O)可存在亦可不存在。(m1+m2)宜為10~150之整數,且20~100之整數尤佳。(m1+m2)只要在前述範圍之下限值以上,表面層之潤滑性即佳。(m1+m2)只要在前述範圍之上限值以下,表面層之耐久性即佳。即,化合物(A)之數量平均分子量若太大,每單元分子量中存在之基(I)數便會減少而降低耐久性。(m1+m2) is an integer between 2 and 200. Therefore, when m1 is 1, the minimum value of m2 is 1, that is, there is at least 1 (R f2 O). When m1 is 2 or more, the minimum value of m2 is 0, and (R f2 O) may or may not exist. (m1+m2) is preferably an integer between 10 and 150, and an integer between 20 and 100 is particularly preferred. As long as (m1+m2) is above the lower limit of the aforementioned range, the lubricity of the surface layer is good. As long as (m1+m2) is below the upper limit of the aforementioned range, the durability of the surface layer will be good. That is, if the number average molecular weight of compound (A) is too large, the number of groups (I) present per unit molecular weight will decrease, thereby reducing durability.

m1與m2之比(m1/m2)宜為100/0~30/70,且90/10~40/60尤佳。在前述範圍內m1之比率愈高,表面層之潤滑性有愈佳之傾向。The ratio of m1 to m2 (m1/m2) should be 100/0~30/70, and 90/10~40/60 is especially good. The higher the ratio of m1 within the aforementioned range, the better the lubricity of the surface layer tends to be.

在(CF2 O)m1 (Rf2 O)m2 中,m2為1以上時亦即存在碳數不同之2種以上氧全氟伸烷基時,各氧全氟伸烷基(m1個CF2 O及m2個Rf2 O)之鍵結順序不限。譬如,各氧全氟伸烷基可為無規、交錯、嵌段中之任一種配置。尤其,(CF2 O)單元與(Rf2 O)單元宜為無規配置。 m2為2以上時,(Rf2 O)m2 亦可由碳數不同之2種以上Rf2 O構成。又,m2個Rf2 O之鍵結順序不限。In (CF 2 O) m1 (R f2 O) m2 , when m2 is 1 or more, that is, when there are two or more oxygen perfluoroalkylene groups with different carbon numbers, each oxygen perfluoroalkylene group (m1 CF 2 The bonding order of O and m2 R f2 O) is not limited. For example, each oxygen perfluoroalkylene group can be arranged in any of random, staggered, and block configurations. In particular, the (CF 2 O) unit and the (R f 2 O) unit are preferably randomly arranged. When m2 is 2 or more, (R f2 O) m2 may be composed of two or more types of R f2 O with different carbon numbers. In addition, the bonding order of m2 R f2 O is not limited.

A鏈的具體態樣可列舉以下(a2)~(a6)等。 (CF2 O)m01 …(a2) {(CF2 O)m11 (CF2 CF2 O)m12 }…(a3) {(CF2 O)m11 (CF2 CF2 CF2 O)m12 }…(a4) {(CF2 O)m11 (CF2 CF2 CF2 CF2 O)m12 }…(a5) {(CF2 O)m11 (CF(CF3 )CF2 O)m12 }…(a6) 惟,m01為2~200之整數,m11為1以上之整數,m12為1以上之整數,(m11+m12)為2~200之整數。 m01、(m11+m12)各自的理想範圍與(m1+m2)相同。 m11與m12之比(m11/m12)宜為99/1~30/70,且90/10~40/60尤佳。 上述中,(a3)~(a5)為宜,(a3)尤佳。 A鏈宜為含有(CF2 O)單元與(CF2 CF2 O)單元之上述(a3),且以(CF2 O)單元與(CF2 CF2 O)單元無規配置之上述(a3)尤佳。Specific forms of the A chain include the following (a2) to (a6). (CF 2 O) m01 …(a2) {(CF 2 O) m11 (CF 2 CF 2 O) m12 }…(a3) {(CF 2 O) m11 (CF 2 CF 2 CF 2 O) m12 }…( a4) {(CF 2 O) m11 (CF 2 CF 2 CF 2 CF 2 O) m12 }…(a5) {(CF 2 O) m11 (CF(CF 3 )CF 2 O) m12 }…(a6) Only , m01 is an integer from 2 to 200, m11 is an integer above 1, m12 is an integer above 1, (m11+m12) is an integer from 2 to 200. The ideal ranges of m01 and (m11+m12) are the same as (m1+m2). The ratio of m11 to m12 (m11/m12) should be 99/1~30/70, and 90/10~40/60 is especially good. Among the above, (a3) to (a5) are suitable, and (a3) is particularly preferred. Chain A is preferably the above-mentioned (a3) containing (CF 2 O) units and (CF 2 CF 2 O) units, and the (CF 2 O) units and (CF 2 CF 2 O) units are randomly arranged in the above-mentioned (a3) ) is especially good.

(B鏈) B鏈可舉如下式(b1)所示含有至少1種(Rf3 O)單元之(氧全氟伸烷基)鏈。 (Rf3 O)m3 …(b1) 惟,Rf3 為碳數2以上之全氟伸烷基; m3為2~200之整數; (Rf3 O)m3 可由碳數不同之2種以上Rf2 O構成; (Rf3 O)m3 由碳數不同之2種以上Rf2 O構成時,各Rf2 O之鍵結順序不限。(B chain) Examples of the B chain include an (oxyperfluoroalkylene) chain containing at least one (R f3 O) unit as represented by the following formula (b1). (R f3 O) m3 ...(b1) However, R f3 is a perfluoroalkylene group with a carbon number of 2 or more; m3 is an integer from 2 to 200; (R f3 O) m3 can be composed of two or more R f2 with different carbon numbers. O; (R f3 O) When m3 is composed of two or more R f2 O with different carbon numbers, the bonding order of each R f2 O is not limited.

Rf3 可為分枝狀亦可為直鏈狀,若從表面層之潤滑性更佳的觀點來看,宜為直鏈狀。 若從表面層之耐久性及潤滑性更佳的觀點來看,Rf3 之碳數宜為2~6。R f3 may be branched or linear. From the viewpoint of better lubricity of the surface layer, linear chain is preferred. From the perspective of better durability and lubricity of the surface layer, the carbon number of R f3 is preferably 2 to 6.

m3為2~200之整數,宜為10~150之整數,且以15~100之整數尤佳。m3只要在前述範圍之下限值以上,表面層之潤滑性即佳。m3只要在前述範圍之上限值以下,表面層之耐久性即佳。即,化合物(B)之數量平均分子量若太大,每單元分子量中存在之基(I)數便會減少而降低耐久性。m3 is an integer from 2 to 200, preferably an integer from 10 to 150, and especially an integer from 15 to 100. As long as m3 is above the lower limit of the aforementioned range, the lubricity of the surface layer will be good. As long as m3 is below the upper limit of the aforementioned range, the durability of the surface layer will be good. That is, if the number average molecular weight of compound (B) is too large, the number of groups (I) present per unit molecular weight will decrease, thereby reducing durability.

(Rf3 O)m3 由碳數不同之2種以上Rf2 O構成時,各Rf3 O之鍵結順序不限。譬如,各Rf3 O可為無規、交錯、嵌段中之任一種配置。When (R f3 O) m3 is composed of two or more R f2 O with different carbon numbers, the bonding order of each R f3 O is not limited. For example, each R f3 O can be in any of random, staggered, and block configurations.

(Rf3 O)m3 由碳數不同之2種以上Rf2 O構成時,B鏈宜為下式(b2)所示之物。 {(CF2 CF2 O)m4 (Rf4 O)m5 }…(b2) 惟,Rf4 為碳數3~6之全氟伸烷基, m4為1以上之整數, m5為1以上之整數, (m4+m5)為2~200之整數, 且m4個CF2 CF2 O及m5個Rf4 O之鍵結順序不限。(R f3 O) When m3 is composed of two or more types of R f2 O with different carbon numbers, the B chain is preferably represented by the following formula (b2). {(CF 2 CF 2 O) m4 (R f4 O) m5 }…(b2) However, R f4 is a perfluoroalkylene group with a carbon number of 3 to 6, m4 is an integer of 1 or more, and m5 is an integer of 1 or more. , (m4+m5) is an integer from 2 to 200, and the bonding order of m4 CF 2 CF 2 O and m5 R f4 O is not limited.

Rf4 宜為CF2 CF2 CF2 CF2 。 (m4+m5)的理想範圍與m3相同。 m4與m5之比(m4/m5)宜為90/10~10/90,且70/30~30/70尤佳。在前述範圍內m4之比率愈高,潤滑性有愈佳之傾向。在前述範圍內m5之比率愈高,耐久性有愈佳之傾向。R f4 is preferably CF 2 CF 2 CF 2 CF 2 . The ideal range of (m4+m5) is the same as m3. The ratio of m4 to m5 (m4/m5) should be 90/10~10/90, and 70/30~30/70 is especially good. The higher the ratio of m4 within the aforementioned range, the better the lubricity tends to be. The higher the ratio of m5 within the aforementioned range, the better the durability tends to be.

{(CF2 CF2 O)m4 (Rf4 O)m5 }的理想態樣之一可舉如{(CF2 CF2 O)m41 -(Rf4 O)m51 }m6 。惟,m41為1~3之整數,m51為1~3之整數,m6為1以上之整數,且(m41+m51)×m6為2~200之整數。該聚(氧全氟伸烷基)鏈係由1個以上由1~3個(CF2 CF2 O)構成之單元與由1~3個(Rf3 O)構成之單元直列連結而成的單元所構成。(m41+m51)×m6的理想範圍與(m4+m5)相同。m41及m51宜各自為1。 另,{(CF2 CF2 O)m41 -(Rf4 O)m51 }m6 亦可視為以{(CF2 CF2 O)m41 -(Rf4 O)m51 }為單元之聚(氧全氟伸烷基)鏈,或可視為(CF2 CF2 O)m41 單元與(Rf4 O)m51 單元交錯配列而成的聚(氧全氟伸烷基)鏈。One of the ideal forms of {(CF 2 CF 2 O) m4 (R f4 O) m5 } is {(CF 2 CF 2 O) m41 -(R f4 O) m51 } m6 . However, m41 is an integer from 1 to 3, m51 is an integer from 1 to 3, m6 is an integer above 1, and (m41+m51)×m6 is an integer from 2 to 200. The poly(oxyperfluoroalkylene) chain is composed of one or more units composed of 1 to 3 (CF 2 CF 2 O) and units composed of 1 to 3 (R f3 O) connected in series composed of units. The ideal range of (m41+m51)×m6 is the same as (m4+m5). m41 and m51 should each be 1. In addition, {(CF 2 CF 2 O) m41 -(R f4 O) m51 } m6 can also be regarded as a poly(oxyperfluoroethylene) with {(CF 2 CF 2 O) m41 -(R f4 O) m51 } as the unit. alkyl) chain, or can be regarded as a poly(oxyperfluoroalkyl) chain composed of (CF 2 CF 2 O) m41 units and (R f4 O) m51 units staggered.

B鏈宜為含有選自(CF2 CF2 O)單元、(CF2 CF2 CF2 O)單元及(CF2 CF2 CF2 CF2 O)單元中之至少1種單元的聚(氧全氟伸烷基)鏈。尤宜為含有(CF2 CF2 OCF2 CF2 CF2 CF2 O)單元的聚(氧全氟伸烷基)鏈。 B鏈的理想具體態樣可列舉以下(b3)~(b5)等。 (CF2 CF2 O)m13 …(b3) (CF2 CF2 CF2 O)m14 …(b4) (CF2 CF2 O-CF2 CF2 CF2 CF2 O)m15 …(b5) 惟,m13及m14分別為2~200之整數,m15為1~100之整數。 (b5)係含有(CF2 CF2 OCF2 CF2 CF2 CF2 O)單元之聚(氧全氟伸烷基)鏈,又該聚(氧全氟伸烷基)鏈亦可視為(CF2 CF2 O)單元與(CF2 CF2 CF2 CF2 O)單元交錯鍵結而成之聚(氧全氟伸烷基)鏈。The B chain is preferably a poly(oxyfluoride) unit containing at least one unit selected from the group consisting of (CF 2 CF 2 O) unit, (CF 2 CF 2 CF 2 O) unit and (CF 2 CF 2 CF 2 CF 2 O) unit. Fluoroalkylene) chain. Particularly preferred are poly(oxyperfluoroalkylene) chains containing (CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) units. Ideal specific forms of the B chain include the following (b3) to (b5). (CF 2 CF 2 O) m13 …(b3) (CF 2 CF 2 CF 2 O) m14 …(b4) (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) m15 …(b5) Only, m13 and m14 are integers from 2 to 200 respectively, and m15 is an integer from 1 to 100. (b5) is a poly(oxyperfluoroalkylene) chain containing (CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) units, and the poly(oxyperfluoroalkylene) chain can also be regarded as (CF A poly(oxyperfluoroalkylene) chain formed by staggered bonding of 2 CF 2 O) units and (CF 2 CF 2 CF 2 CF 2 O) units.

(基(I)) 在基(I)中,L為羥基或水解性基。 水解性基係會藉由水解反應變成羥基之基。即,L為水解性基時,基(I)之Si-L會藉由水解反應變成矽烷醇基(Si-OH)。 水解性基可列舉烷氧基、鹵素原子、醯基、異氰酸酯基(-NCO)等。烷氧基之碳數宜為1~4。醯基之碳數宜為2~5。(Group (I)) In the group (I), L is a hydroxyl group or a hydrolyzable group. The hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, when L is a hydrolyzable group, Si-L of the group (I) becomes a silanol group (Si-OH) through a hydrolysis reaction. Examples of the hydrolyzable group include an alkoxy group, a halogen atom, a acyl group, an isocyanate group (-NCO), and the like. The carbon number of the alkoxy group is preferably 1 to 4. The carbon number of the hydroxyl group is preferably 2 to 5.

從化合物(A)之易製性觀點來看,L宜為碳數1~4之烷氧基或鹵素原子。鹵素原子以氯原子尤佳。從塗佈時之逸氣少且化合物(A)之保存穩定性優異的觀點來看,L以碳數1~4之烷氧基為佳;而需要化合物(A)具長期保存穩定性時以乙氧基尤佳,欲縮短塗佈後之反應時間時則以甲氧基尤佳。From the viewpoint of ease of preparation of compound (A), L is preferably an alkoxy group or a halogen atom having 1 to 4 carbon atoms. The halogen atom is particularly preferably a chlorine atom. From the viewpoint of less outgassing during coating and excellent storage stability of Compound (A), L is preferably an alkoxy group having 1 to 4 carbon atoms. However, when long-term storage stability of Compound (A) is required, L The ethoxy group is particularly preferred, and the methoxy group is particularly preferred when the reaction time after coating is to be shortened.

R為氫原子或1價烴基。 1價烴基可舉如烷基、環烷基等飽和烴基、烯基、烯丙基等,且以飽和烴基為宜。 在化合物(A)易製的觀點下,1價烴基之碳數宜為1~6,且1~3較佳,1~2尤佳。R is a hydrogen atom or a monovalent hydrocarbon group. Examples of the monovalent hydrocarbon group include saturated hydrocarbon groups such as alkyl groups and cycloalkyl groups, alkenyl groups, allyl groups, etc., and saturated hydrocarbon groups are preferred. From the viewpoint of easy preparation of compound (A), the carbon number of the monovalent hydrocarbon group is preferably 1 to 6, and 1 to 3 is more preferred, and 1 to 2 is particularly preferred.

n宜為0或1,且以0尤佳。藉由1個基(I)中存在多個L,可更加牢固與基材之接著性,表面層之耐久性更佳。 n為0或1時,(3-n)個L可相同亦可互異。譬如,亦可部分L為水解性基且剩餘的L為羥基。n should be 0 or 1, and 0 is particularly preferred. By having multiple L's in one base (I), the adhesion to the base material can be strengthened and the durability of the surface layer can be improved. When n is 0 or 1, (3-n) L can be the same or different from each other. For example, part of L may be a hydrolyzable group and the remaining L may be a hydroxyl group.

基(I)宜為Si(OCH3 )3 、SiCH3 (OCH3 )2 、Si(OCH2 CH3 )3 、SiCl3 、Si(OCOCH3 )3 及Si(NCO)3 。從工業製造之易處置性觀點來看,以Si(OCH3 )3 尤佳。The group (I) is preferably Si(OCH 3 ) 3 , SiCH 3 (OCH 3 ) 2 , Si(OCH 2 CH 3 ) 3 , SiCl 3 , Si(OCOCH 3 ) 3 and Si(NCO) 3 . From the viewpoint of easy disposal in industrial manufacturing, Si(OCH 3 ) 3 is particularly preferred.

(基(II)) 在基(II)中,Rf1 為全氟烷基。 若從表面層之潤滑性及耐久性更為優異的觀點來看,Rf1 中之全氟烷基碳數宜為1~20,且1~10較佳,1~6更佳,1~3尤佳。 全氟烷基可為分枝狀亦可為直鏈狀,且以直鏈狀為佳。直鏈狀全氟烷基可舉如CF3 -、CF3 CF2 -、CF3 CF2 CF2 -等。(Group (II)) In the group (II), R f1 is a perfluoroalkyl group. From the viewpoint of superior lubricity and durability of the surface layer, the carbon number of the perfluoroalkyl group in R f1 is preferably 1 to 20, with 1 to 10 being preferred, 1 to 6 being more preferred, and 1 to 3 being preferred. Excellent. The perfluoroalkyl group may be branched or linear, and linear is preferred. Examples of linear perfluoroalkyl groups include CF 3 -, CF 3 CF 2 -, CF 3 CF 2 CF 2 -, and the like.

Q為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個(宜2~4個)該氧基氟伸烷基鍵結而成之聚氧基氟伸烷基。在聚氧氟伸烷基中,多個氧氟伸烷基通常呈直列鍵結。 Q若為含氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,即可提高化合物(A)及化合物(B)對液態介質的溶解性。所以,化合物(A)及化合物(B)不易在塗佈液中凝聚,而且將之塗佈於基材表面後,在其乾燥期間化合物(A)及化合物(B)也不易凝聚,所以表面層之外觀更為優異。 氧氟伸烷基之碳數宜為1~6,且2~6較佳,2~4更佳,2或3尤佳。 從表面層外觀優異的觀點來看,氧氟伸烷基中之氫原子數為1個以上,且宜為2個以上,3個以上尤佳。若從表面層之撥水撥油性更佳的觀點來看,氧氟伸烷基中之氫原子數宜為(Q之碳數)×2個以下,且(Q之碳數)個以下尤佳。 氧氟伸烷基可為分枝狀亦可為直鏈狀,若從表面層之潤滑性更佳的觀點來看,宜為直鏈狀。 在聚氧氟伸烷基中,2~5個氧氟伸烷基可全部相同亦可互異。 從化合物(A)及化合物(B)之易製性觀點來看,Q宜為單鍵或選自於由-CHFCF2 OCH2 CF2 O-、-CF2 CHFCF2 OCH2 CF2 O-、-CF2 CF2 CHFCF2 OCH2 CF2 O-、-CF2 CF2 OCHFCF2 OCH2 CF2 O-、-CF2 CF2 OCF2 CF2 OCHFCF2 OCH2 CF2 O-、-CF2 CH2 OCH2 CF2 O-及-CF2 CF2 OCF2 CH2 OCH2 CF2 O-所構成群組中之基團(惟,左側與Rf1 -O鍵結)。Q is a single bond, an oxyfluoroalkylene group containing more than 1 hydrogen atom, or a polyoxyfluoroalkylene group bonded by 2 to 5 (preferably 2 to 4) oxyfluoroalkylene groups. In polyoxyfluoroalkylene groups, multiple oxyfluoroalkylene groups are usually linked in series. If Q is an oxyfluoroalkylene group containing hydrogen atoms or a polyoxyfluoroalkylene group bonded by 2 to 5 of the oxyfluoroalkylene groups, the liquid resistance of compound (A) and compound (B) can be improved. Solubility of the medium. Therefore, compound (A) and compound (B) are not easy to aggregate in the coating liquid, and after coating on the surface of the substrate, compound (A) and compound (B) are not easy to aggregate during the drying period, so the surface layer The appearance is more excellent. The carbon number of the oxyfluoroalkylene group is preferably 1 to 6, preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3. From the viewpoint of excellent appearance of the surface layer, the number of hydrogen atoms in the oxyfluoroalkylene group is 1 or more, preferably 2 or more, and particularly preferably 3 or more. From the viewpoint of better water- and oil-repellent properties of the surface layer, the number of hydrogen atoms in the oxyfluoroalkylene group is preferably (number of carbon atoms in Q) × 2 or less, and particularly preferably (number of carbon atoms in Q) or less. . The oxyfluoroalkylene group may be branched or linear. From the viewpoint of better lubricity of the surface layer, the linear group is preferred. In the polyoxyfluoroalkylene group, 2 to 5 oxyfluoroalkylene groups may all be the same or different from each other. From the viewpoint of ease of preparation of compound (A) and compound (B), Q is preferably a single bond or selected from the group consisting of -CHFCF 2 OCH 2 CF 2 O-, -CF 2 CHFCF 2 OCH 2 CF 2 O-, -CF 2 CF 2 CHFCF 2 OCH 2 CF 2 O-, -CF 2 CF 2 OCHFCF 2 OCH 2 CF 2 O-, -CF 2 CF 2 OCF 2 CF 2 OCHFCF 2 OCH 2 CF 2 O-, -CF 2 CH 2 OCH 2 CF 2 O- and -CF 2 CF 2 OCF 2 CH 2 OCH 2 CF 2 O- groups in the group (but the left side is bonded to R f1 -O).

化合物(A)所具之A鏈、化合物(B)所具之B鏈分別可為1個亦可為2個以上。從易製性及易處置性的觀點來看,宜1~3個。 化合物(A)具有2個以上A鏈時,各A鏈可相同亦可互異。化合物(B)具有2個以上B鏈時,各B鏈可相同亦可互異。The A chain of compound (A) and the B chain of compound (B) may each be one or two or more. From the viewpoint of ease of preparation and ease of disposal, 1 to 3 are appropriate. When compound (A) has two or more A chains, each A chain may be the same or different. When compound (B) has two or more B chains, each B chain may be the same or different from each other.

化合物(A)、化合物(B)各自所具有之基(I)可為1個亦可為2個以上。若從藉由增加與基材之鍵結而有較佳的表面層耐久性的觀點來看,宜為2個以上,且3個以上尤佳。若從藉由提高與基材鍵結之分子密度而有較佳的表面層耐久性的觀點來看,宜為10個以下,且5個以下較佳,4個以下尤佳。 因此,化合物(A)、化合物(B)各自所具有之基(I)宜為1~10個,且2~5個較佳,3~4個尤佳。 化合物(A)、化合物(B)具有2個以上基(I)時,各基(I)可相同亦可互異。在化合物(A)、化合物(B)之易製性的觀點下,宜全為相同基團。The number of groups (I) each of compound (A) and compound (B) has may be one or two or more. From the viewpoint of better durability of the surface layer by increasing the bonding with the base material, the number is preferably 2 or more, and more preferably 3 or more. From the viewpoint of better durability of the surface layer by increasing the density of molecules bonded to the base material, the number is preferably 10 or less, more preferably 5 or less, and particularly preferably 4 or less. Therefore, the number of groups (I) each of compound (A) and compound (B) has is preferably 1 to 10, preferably 2 to 5, and particularly preferably 3 to 4. When compound (A) or compound (B) has two or more groups (I), each group (I) may be the same or different from each other. From the viewpoint of easy production of compound (A) and compound (B), it is preferable that they all have the same group.

宜於A鏈、B鏈之一末端鍵結有基(II)。即,化合物(A)宜進一步具有鍵結於A鏈之一末端的基(II)。化合物(B)宜進一步具有鍵結於B鏈之一末端的基(II)。藉此,可使表面層之潤滑性更為優異。It is preferable that one of the terminal ends of the A chain and the B chain is bonded with the group (II). That is, the compound (A) preferably further has a group (II) bonded to one terminal of the A chain. Compound (B) preferably further has a group (II) bonded to one end of the B chain. Thereby, the lubricity of the surface layer can be made more excellent.

化合物(A)、化合物(B)之數量平均分子量(Mn)分別宜為2,000~20,000,且3,000~15,000較佳,4,000~12,000尤佳。化合物(A)、化合物(B)之數量平均分子量只要在前述範圍之下限值以上,表面層之潤滑性便更為優異。化合物(A)、化合物(B)之數量平均分子量只要在前述範圍之下限值以上,表面層之耐久性便更為優異。 數量平均分子量(Mn)可藉由後述實施例中所述測定方法測定。The number average molecular weight (Mn) of compound (A) and compound (B) is preferably 2,000 to 20,000, preferably 3,000 to 15,000, and particularly preferably 4,000 to 12,000. As long as the number average molecular weight of the compound (A) and the compound (B) is more than the lower limit of the aforementioned range, the lubricity of the surface layer will be more excellent. As long as the number average molecular weight of the compound (A) and the compound (B) is more than the lower limit of the aforementioned range, the durability of the surface layer will be more excellent. The number average molecular weight (Mn) can be measured by the measurement method described in the Examples mentioned later.

化合物(A)、化合物(B)只要分別具有A鏈或B鏈與具有基(I)即無特別限定。譬如,可從下列文獻中所述公知的含氟醚化合物中適當選擇。 日本特開2013-91047號公報、日本特開2014-80473號公報、國際公開第2013/042732號、國際公開第2013/042733號、國際公開第2013/121984號、國際公開第2013/121985號、國際公開第2013/121986號、國際公開第2014/163004號、國際公開第2014/175124號、國際公開第2015/087902號、日本特開2013-227279號公報、日本特開2013-241569號公報、日本特開2013-256643號公報、日本特開2014-15609號公報、日本特開2014-37548號公報、日本特開2014-65884號公報、日本特開2014-210258號公報、日本特開2014-218639號公報、日本特開2015-200884號公報、日本特開2015-221888號公報、國際公開第2013/146112號、國際公開第2013/187432號、國際公開第2014/069592號、國際公開第2015/099085號、國際公開第2015/166760號、日本特開2013-144726號公報、日本特開2014-77836號公報、日本特開2013-117012號公報、日本特開2014-214194號公報、日本特開2014-198822號公報、日本特開2015-129230號公報、日本特開2015-196723號公報、日本特開2015-13983號公報、日本特開2015-199915號公報、日本特開2015-199906號公報等。Compound (A) and compound (B) are not particularly limited as long as they have an A chain or a B chain and a group (I) respectively. For example, it can be appropriately selected from known fluorine-containing ether compounds described in the following documents. Japanese Patent Publication No. 2013-91047, Japanese Patent Publication No. 2014-80473, International Publication No. 2013/042732, International Publication No. 2013/042733, International Publication No. 2013/121984, International Publication No. 2013/121985, International Publication No. 2013/121986, International Publication No. 2014/163004, International Publication No. 2014/175124, International Publication No. 2015/087902, Japanese Patent Application Publication No. 2013-227279, Japanese Patent Application Publication No. 2013-241569, Japanese Patent Application Publication No. 2013-256643, Japanese Patent Application Publication No. 2014-15609, Japanese Patent Application Publication No. 2014-37548, Japanese Patent Application Publication No. 2014-65884, Japanese Patent Application Publication No. 2014-210258, Japanese Patent Application Publication No. 2014- Publication No. 218639, Japanese Patent Application Publication No. 2015-200884, Japanese Patent Application Publication No. 2015-221888, International Publication No. 2013/146112, International Publication No. 2013/187432, International Publication No. 2014/069592, International Publication No. 2015 /099085, International Publication No. 2015/166760, Japanese Patent Publication No. 2013-144726, Japanese Patent Publication No. 2014-77836, Japanese Patent Publication No. 2013-117012, Japanese Patent Publication No. 2014-214194, Japanese Patent Publication No. Japanese Patent Application Publication No. 2014-198822, Japanese Patent Application Publication No. 2015-129230, Japanese Patent Application Publication No. 2015-196723, Japanese Patent Application Publication No. 2015-13983, Japanese Patent Application Publication No. 2015-199915, Japanese Patent Application Publication No. 2015-199906 Gazette etc.

在本組成物中,化合物(A)可為由1種化合物(A)構成之單一化合物,亦可為由2種以上化合物(A)構成之混合物。 在本說明書中,除了聚(氧全氟伸烷基)鏈中之氧全氟伸烷基之重複數的數值具有分布以外其餘皆同的化合物群之含氟醚化合物係視為單一化合物。譬如,聚(氧全氟伸烷基)鏈為(CF2 O)m1 (Rf2 O)m2 之化合物(A)時,除了m1及m2具有分布以外其餘皆同的化合物群係視作單一化合物之含氟醚化合物。In the present composition, compound (A) may be a single compound consisting of one compound (A), or a mixture consisting of two or more compounds (A). In this specification, fluorine-containing ether compounds that are the same compound group are regarded as a single compound except that the numerical value of the repeating number of oxygen perfluoroalkylene groups in the poly(oxyperfluoroalkylene) chain has a distribution. For example, when the poly(oxyperfluoroalkylene) chain is compound (A) with (CF 2 O) m1 (R f2 O) m2 , the group of compounds that are the same except that m1 and m2 have distributions is regarded as a single compound. Fluorine-containing ether compounds.

(化合物(A)及化合物(B)的理想組合) 本組成物之理想態樣之一係化合物(A)及化合物(B)至少一者具有3個以上基(I),且較宜具有3~5個。若至少一者具有3個以上基(I),表面層之耐久性便較為優異。 僅其中一者具有3個以上基(I)時,另一者所具之基(I)數為1或2個,從耐久性觀點來看則宜為2個。(Ideal combination of compound (A) and compound (B)) One of the ideal aspects of the present composition is that at least one of compound (A) and compound (B) has 3 or more groups (I), and preferably has 3 groups (I). ~5. If at least one of them has three or more groups (I), the durability of the surface layer will be excellent. When only one of them has three or more groups (I), the number of groups (I) that the other one has is 1 or 2, and preferably 2 from the viewpoint of durability.

本組成物之另一理想態樣係化合物(A)及化合物(B)兩者具有2個以上基(I),且較宜具有3個以上,更宜具有3~5個。兩者若皆具有2個以上基(I),表面層之耐久性便較為優異。Another ideal form of the present composition is that both compound (A) and compound (B) have two or more groups (I), preferably three or more, and more preferably three to five. If both have two or more groups (I), the durability of the surface layer will be excellent.

藉由乾式塗佈法形成表面層時,化合物(A)之數量平均分子量(Mn)與化合物(B)之數量平均分子量(Mn)之差宜少。在乾式塗佈法的情況下,有分子量小者先蒸發而蒸鍍至基材上之傾向。數量平均分子量(Mn)之差愈少,愈不易於形成之表面層產生化合物(A)及化合物(B)的分布不均。 化合物(A)之數量平均分子量(Mn)與化合物(B)之數量平均分子量(Mn)之差宜為3,000以下,且2,000以下尤佳。 藉由濕式塗佈法形成表面層時,化合物(A)之數量平均分子量(Mn)與化合物(B)之數量平均分子量(Mn)之間即使有差,也不易於形成之表面層產生化合物(A)及化合物(B)的分布不均,故該等之差無特別限定。When the surface layer is formed by a dry coating method, the difference between the number average molecular weight (Mn) of the compound (A) and the number average molecular weight (Mn) of the compound (B) is preferably small. In the case of the dry coating method, those with small molecular weights tend to evaporate first and be deposited on the substrate. The smaller the difference in number average molecular weight (Mn), the less likely it is to form a surface layer that causes uneven distribution of compound (A) and compound (B). The difference between the number average molecular weight (Mn) of compound (A) and the number average molecular weight (Mn) of compound (B) is preferably 3,000 or less, and particularly preferably 2,000 or less. When forming a surface layer by a wet coating method, even if there is a difference between the number average molecular weight (Mn) of compound (A) and the number average molecular weight (Mn) of compound (B), it is difficult to form a surface layer that produces compounds The distribution of (A) and compound (B) is uneven, so the difference is not particularly limited.

本組成物中之化合物(A)與化合物(B)的理想組合例可舉如下列組合。 組合例1:具1個A鏈且具3個基(I)之化合物(A)與具1個B鏈且具3個基(I)之化合物(B)的組合。 組合例2:具2個A鏈且具4個基(I)之化合物(A)與具2個B鏈且具4個基(I)之化合物(B)的組合。 組合例3:具1個A鏈且具5個基(I)之化合物(A)與具1個B鏈且具5個基(I)之化合物(B)的組合。 在該等各組合中,化合物(A)宜具有鍵結於A鏈之一末端的基(II)。又,化合物(B)宜具有鍵結於B鏈之一末端的基(II)。Examples of ideal combinations of compound (A) and compound (B) in the present composition include the following combinations. Combination Example 1: Combination of compound (A) having one A chain and three groups (I) and compound (B) having one B chain and three groups (I). Combination Example 2: Combination of compound (A) having 2 A chains and 4 groups (I) and compound (B) having 2 B chains and 4 groups (I). Combination Example 3: Combination of compound (A) having one A chain and five groups (I) and compound (B) having one B chain and five groups (I). In each of these combinations, compound (A) preferably has a group (II) bonded to one end of the A chain. Furthermore, compound (B) preferably has a group (II) bonded to one terminal of the chain B.

化合物(A)與化合物(B)宜皆為下式(A/B)所示含氟醚化合物。在下式(A/B)中,化合物(A)之Rf 為含(CF2 O)單元之聚(氧全氟伸烷基)鏈,化合物(B)之Rf 為不含(CF2 O)單元之聚(氧全氟伸烷基)鏈。 [Rf1 -O-Q-Rf -]r Z[-SiRn L3-n ]s …(A/B) 在上述式(A/B)中,Rf1 為前述Rf1 ,Q為前述Q,且-SiRn L3-n 為前述式(I)所示基團。Z為(r+s)價連結基。r為1以上之整數且係相當於前述化合物(A)及化合物(B)中之聚(氧全氟伸烷基)鏈數之數。s為1以上之整數且係相當於前述化合物(A)及化合物(B)中之基(I)數之數。 根據前述聚(氧全氟伸烷基)鏈數及基(I)數,r+s宜為2~13,且3~8較佳,4~7尤佳。(r+s)價連結基之Z可列舉後述Za 、Zb 所示基團。 此外,r為2以上時,r個[Rf1 -O-Q-Rf -]宜為相同基團;s為2以上時,s個式(I)所示基團宜為相同基團。It is preferable that both compound (A) and compound (B) are fluorine-containing ether compounds represented by the following formula (A/B). In the following formula (A/B), R f of compound (A) is a poly(oxyperfluoroalkylene) chain containing (CF 2 O) units, and R f of compound (B) is not containing (CF 2 O). ) unit of a poly(oxyperfluoroalkylene) chain. [R f1 -OQR f -] r Z[-SiR n L 3-n ] s ...(A/B) In the above formula (A/B), R f1 is the aforementioned R f1 , Q is the aforementioned Q, and - SiR n L 3-n is a group represented by the aforementioned formula (I). Z is the (r+s) valence linking base. r is an integer of 1 or more and is a number corresponding to the number of poly(oxyperfluoroalkylene) chains in the aforementioned compound (A) and compound (B). s is an integer of 1 or more and is a number corresponding to the number of groups (I) in the aforementioned compound (A) and compound (B). According to the aforementioned poly(oxyperfluoroalkylene) chain number and group (I) number, r+s is preferably 2 to 13, and 3 to 8 is preferred, and 4 to 7 is particularly preferred. Examples of Z of the (r+s) valence linking group include groups represented by Z a and Z b described later. In addition, when r is 2 or more, the r [R f1 -OQR f -] are preferably the same group; when s is 2 or more, the s groups represented by formula (I) are preferably the same group.

(理想態樣) 本組成物之理想態樣之一可列舉化合物(A)為下式(A1)所示含氟醚化合物(A1)(以下亦表記為化合物(A1))且化合物(B)為式(B1)所示含氟醚化合物(B1)(以下亦表記為化合物(B1))的態樣。即,本態樣之組成物含有化合物(A1)與化合物(B1)。 [Rf1a -O-Qa -Rfa -]ra Za [-SiRa na La 3-na ]sa …(A1) [Rf1b -O-Qb -Rfb -]rb Zb [-SiRb nb Lb 3-nb ]sb …(B1) 惟,Rf1a 及Rf1b 為全氟烷基; Qa 及Qb 為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,且構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異; Rfa 為A鏈; Rfb 為B鏈; Za 為(ra+sa)價連結基; Zb 為(rb+sb)價連結基; La 及Lb 為羥基或水解性基; Ra 及Rb 為氫原子或1價烴基; na及nb為0~2之整數; na為0或1時之(3-na)個La 、nb為0或1時之(3-nb)個Lb 分別可相同亦可互異; na為2時之na個Ra 、nb為2時之nb個Rb 分別可相同亦可互異; ra及rb為1以上之整數,ra為2以上時ra個[Rf1a -O-Qa -Rfa -]可相同亦可互異,rb為2以上時rb個[Rf1b -O-Qb -Rfb -]可相同亦可互異; sa及sb為1以上之整數,sa為2以上時sa個[-SiRa na La 3-na ]可相同亦可互異,sb為2以上時sb個[-SiRb nb Lb 3-nb ]可相同亦可互異。(Ideal Aspect) One of the ideal aspects of this composition is that the compound (A) is a fluoroether compound (A1) represented by the following formula (A1) (hereinafter also referred to as the compound (A1)) and the compound (B) It is an aspect of the fluorine-containing ether compound (B1) represented by formula (B1) (hereinafter also referred to as compound (B1)). That is, the composition of this aspect contains compound (A1) and compound (B1). [R f1a -OQ a -R fa -] ra Z a [-SiR a na L a 3-na ] sa …(A1) [R f1b -OQ b -R fb -] rb Z b [-SiR b nb L b 3-nb ] sb ...(B1) However, R f1a and R f1b are perfluoroalkyl groups; Q a and Q b are single bonds, oxyfluoroalkyl alkylene groups containing more than 1 hydrogen atom or 2 to 5 The oxyfluoroalkylene group is a polyoxyfluoroalkylene group formed by bonding the oxyfluoroalkylene group, and the oxyfluoroalkylene groups constituting the polyoxyfluoroalkylene group can all be the same or different from each other; R fa is the A chain; R fb is B chain; Z a is a (ra+sa) valence linking group; Z b is a (rb+sb) valence linking group; L a and L b are hydroxyl groups or hydrolyzable groups; R a and R b are hydrogen atoms or monovalent Hydrocarbon group; na and nb are integers from 0 to 2; when na is 0 or 1, the (3-na) L a and when nb is 0 or 1, the (3-nb) L b can be the same or different respectively. ; when na is 2, na R a and when nb is 2, nb R b can be the same or different; ra and rb are integers above 1, and when ra is 2 or above, ra [R f1a -OQ a -R fa -] can be the same or different. When rb is 2 or more, rb numbers [R f1b -OQ b -R fb -] can be the same or different; sa and sb are integers of 1 or more, and sa is 2 or more. When sa [-SiR a na L a 3-na ] can be the same or different, when sb is 2 or more, sb [-SiR b nb L b 3-nb ] can be the same or different.

Rf1a 及Rf1b 分別與前述基(II)中之Rf1 相同,理想態樣亦同。 ra為2以上時,ra個Rf1a 宜碳數相同,若從易製性觀點來看,宜為相同基團即碳數相同且化學結構相同的基團。碳數相同且化學結構相同的基團意指,譬如當ra為2時,為2個Rf1a 為CF3 CF2 CF2 -(非為2個Rfa 之碳數相同但化學結構不同之CF3 CF2 CF2 -、CF3 CF(CF3 )-之組合)。 rb為2以上時,rb個Rf1b 宜碳數相同,從易製性觀點來看,宜為相同基團即碳數相同且化學結構相同的基團。R f1a and R f1b are respectively the same as R f1 in the aforementioned base (II), and the ideal form is also the same. When ra is 2 or more, ra and R f1a should preferably have the same carbon number. From the viewpoint of ease of production, they should be the same group, that is, a group with the same carbon number and the same chemical structure. Groups with the same carbon number and the same chemical structure mean that, for example, when ra is 2, it is 2 R f1a is CF 3 CF 2 CF 2 - (not 2 R fa with the same carbon number but different CF 3 CF 2 CF 2 -, CF 3 CF (combination of CF 3 )-). When rb is 2 or more, it is preferable that rb R f1b have the same carbon number. From the viewpoint of ease of production, they are preferably the same group, that is, a group with the same carbon number and the same chemical structure.

Qa 及Qb 與前述基(II)中之Q相同,理想態樣亦同。 Rfa 之A鏈、Rfb 之B鏈分別同前述,理想態樣亦同。 La 及Lb 與前述基(I)中之L相同,理想態樣亦同。 Ra 及Rb 與前述基(I)中之R相同,理想態樣亦同。 na及nb與前述基(I)中之n相同,理想態樣亦同。 ra及rb的理想值分別與化合物(A)所具之A鏈、化合物(B)所具之B鏈各自的理想數相同。即,ra及rb分別宜為1~3之整數。 s1及s2的理想值與化合物(A)、化合物(B)各自所具有之基(I)的理想數相同。即,s1及s2分別宜為1~10之整數,且2~5之整數較佳,3~4之整數尤佳。Q a and Q b are the same as Q in the aforementioned base (II), and the ideal state is also the same. The A chain of R fa and the B chain of R fb are the same as above, and the ideal state is also the same. L a and L b are the same as L in the aforementioned base (I), and the ideal form is also the same. R a and R b are the same as R in the aforementioned group (I), and the ideal form is also the same. na and nb are the same as n in the aforementioned base (I), and the ideal state is also the same. The ideal values of ra and rb are the same as the respective ideal numbers of the A chain of compound (A) and the B chain of compound (B). That is, ra and rb are preferably integers between 1 and 3 respectively. The ideal values of s1 and s2 are the same as the ideal numbers of the group (I) possessed by each of compound (A) and compound (B). That is, s1 and s2 are each preferably an integer from 1 to 10, and an integer from 2 to 5 is more preferred, and an integer from 3 to 4 is particularly preferred.

Za 可舉如(ra+sa)價取代或無取代之烴基、於取代或無取代之烴基之碳-碳原子間或/及末端具有烴基以外之基或具有原子之(ra+sa)價基、(ra+sa)價有機聚矽氧基等。 Zb 可舉如除了價數為(rb+sb)價以外其餘與Za 相同之物。Z a can include a substituted or unsubstituted hydrocarbon group with a (ra+sa) valence, a substituted or unsubstituted hydrocarbon group with a group other than a hydrocarbon group between the carbon atoms or/and the end of the substituted or unsubstituted hydrocarbon group, or a (ra+sa) valence atom. base, (ra+sa)-valent organic polysiloxy base, etc. Z b can be exemplified by things that are the same as Z a except that the valence is (rb+sb).

無取代之烴基可舉如直鏈狀或分枝狀飽和烴基、芳香族烴環式基(譬如從苯環、萘環等芳香族烴環去除(ra+sa)個或(rb+sb)個氫原子之基)、由直鏈狀或分枝狀飽和烴基與芳香族烴環式基之組合所構成之基(譬如於前述芳香族烴環式基鍵結有烷基作為取代基之基、於前述飽和烴基之碳原子間或/及末端具有伸苯基等伸芳基之基等)、由2個以上芳香族烴環式基之組合所構成之基等。該等中又以直鏈狀或分枝狀飽和烴基為宜。無取代之烴基之碳數宜為20以下。 取代之烴基係烴基之氫原子的一部分或全部被取代基取代之基。取代基可舉如羥基、氟原子、氯原子、溴原子、碘原子等鹵素原子、胺基、硝基、氰基、胺基羰基等。Examples of unsubstituted hydrocarbon groups include linear or branched saturated hydrocarbon groups and aromatic hydrocarbon cyclic groups (for example, removing (ra+sa) or (rb+sb) from aromatic hydrocarbon rings such as benzene rings and naphthalene rings. a hydrogen atom), a group composed of a combination of a linear or branched saturated hydrocarbon group and an aromatic hydrocarbon cyclic group (for example, a group in which an alkyl group is bonded to the aforementioned aromatic hydrocarbon cyclic group as a substituent, A group having an aryl group such as a phenylene group between carbon atoms of the aforementioned saturated hydrocarbon group or/and at the terminal end, etc.), a group composed of a combination of two or more aromatic hydrocarbon cyclic groups, etc. Among these, linear or branched saturated hydrocarbon groups are preferred. The carbon number of the unsubstituted hydrocarbon group is preferably 20 or less. A substituted hydrocarbon group is a group in which part or all of the hydrogen atoms of the hydrocarbon group are substituted by substituents. Examples of the substituent include halogen atoms such as a hydroxyl group, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, an amino group, a nitro group, a cyano group, an aminocarbonyl group, and the like.

於烴基之碳-碳原子間或/及末端具有烴基以外之基或原子可舉如醚性氧原子(-O-)、硫醚性硫原子(-S-)、氮原子(-N<)、矽原子(>Si<)、碳原子(>C<)、-N(R15 )-、-C(O)N(R15 )-、-OC(O)N(R15 )-、-Si(R16 )(R17 )-、有機聚矽氧基、-C(O)-、-C(O)-O-、-C(O)-S-等。惟,R15 為氫原子、烷基或苯基,R16 ~R17 分別獨立為烷基或苯基。烷基碳數宜為1~6。 有機聚矽氧基可為直鏈狀,可為分枝鏈狀,亦可為環狀。Examples of groups or atoms other than the hydrocarbon group between the carbon-carbon atoms of the hydrocarbon group or/and at the terminal include etheric oxygen atom (-O-), thioetheric sulfur atom (-S-), and nitrogen atom (-N<) , silicon atom (>Si<), carbon atom (>C<), -N(R 15 )-, -C(O)N(R 15 )-, -OC(O)N(R 15 )-, - Si(R 16 )(R 17 )-, organic polysiloxy, -C(O)-, -C(O)-O-, -C(O)-S-, etc. However, R 15 is a hydrogen atom, an alkyl group or a phenyl group, and R 16 to R 17 are each independently an alkyl group or a phenyl group. The number of carbon atoms in the alkyl group is preferably 1 to 6. The organic polysiloxy group can be linear, branched, or cyclic.

<化合物(A1)的理想形態> 從表面層之耐摩擦性及指紋污垢去除性更為優異的觀點來看,化合物(A1)宜選自於由以下化合物(A11)、化合物(A12)及化合物(A13)所構成群組中之至少1種化合物。<Ideal form of compound (A1)> From the viewpoint of more excellent friction resistance and fingerprint stain removal properties of the surface layer, compound (A1) is preferably selected from the group consisting of the following compound (A11), compound (A12) and compound (A13) At least one compound in the group.

「化合物(A11)」 化合物(A11)以下式(A11)表示。 Rf1a -O-Qa -Rfa -Q32a -[C(O)N(R33a )]pa -R34a -C[-R35a -SiRa na La 3-na ]3 …(A11) 惟,Rf1a 、Qa 、Rfa 、Ra 、La 及na分別與前述同義, Q32a 為碳數1~20之氟伸烷基或於碳數2~20之氟伸烷基的碳-碳原子間具有醚性氧原子之基(惟,一端與醚性氧原子鍵結且另一端與Rfa 鍵結之氟伸烷基為全氟伸烷基的情況除外), R33a 為氫原子或碳數1~6之烷基, pa為0或1, R34a 為單鍵、碳數1~6之伸烷基、於該伸烷基末端(惟,與C[-R34a -SiRna L3-na ]3 鍵結側之末端)具有醚性氧原子之基、於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子之基、或於碳數2~6之伸烷基末端(惟,與C[-R34a -SiRna L3-na ]3 鍵結側之末端)及碳-碳原子間具有醚性氧原子之基, R35a 為碳數1~6之伸烷基、於該伸烷基末端(惟,與Si鍵結側之末端除外)具有醚性氧原子之基、或於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子之基, 3個[-R34a -SiRna L3-na ]可相同亦可互異。"Compound (A11)" Compound (A11) is represented by the following formula (A11). R f1a -OQ a -R fa -Q 32a -[C(O)N(R 33a )] pa -R 34a -C[-R 35a -SiR a na L a 3-na ] 3 …(A11) Only, R f1a , Q a , R fa , R a , L a and na are respectively synonymous with the above. Q 32a is a fluoroalkylene group with 1 to 20 carbon atoms or the carbon-carbon of a fluoroalkylene group with 2 to 20 carbon atoms. A group with etheric oxygen atoms between atoms (except when the fluoroalkylene group bonded to an etheric oxygen atom at one end and the other end bonded to R fa is a perfluoroalkylene group), R 33a is a hydrogen atom or Alkyl group with 1 to 6 carbon atoms, pa is 0 or 1, R 34a is a single bond, an alkylene group with 1 to 6 carbon atoms, at the end of the alkylene group (but, with C[-R 34a -SiR na L 3-na ] 3 bonding side end) a group having an etheric oxygen atom, a group having an etheric oxygen atom between the carbon-carbon atoms of the alkylene group having 2 to 6 carbon atoms, or a group having an etheric oxygen atom between the carbon atoms of the alkylene group having 2 to 6 carbon atoms The alkylene end (only the end of the bonding side with C[-R 34a -SiR na L 3-na ] 3 ) and the group with an etheric oxygen atom between carbon and carbon atoms, R 35a is a carbon number of 1~ The alkylene group of 6 has an etheric oxygen atom at the end of the alkylene group (excluding the end bonded to Si), or between the carbon-carbon atoms of the alkylene group with 2 to 6 carbon atoms. As a base of etheric oxygen atoms, the three [-R 34a -SiR na L 3-na ] may be the same or different from each other.

化合物(A11)係上述式(A1)中,ra為1、sa為3且Za 為-Q32a -[C(O)N(R33a )]pa -R34a -C[-R35a -]3 之化合物。 惟,以Rfa 中之(CF2 O)數為4個以上,且Q32a 中之(CF2 O)數為0~3個為佳。Compound (A11) is in the above formula (A1), ra is 1, sa is 3, and Z a is -Q 32a -[C(O)N(R 33a )] pa -R 34a -C[-R 35a -] 3 compounds. However, it is preferable that the number of (CF 2 O) in R fa is 4 or more, and the number of (CF 2 O) in Q 32a is 0 to 3.

在Q32a 中,碳數1~20之氟伸烷基宜為全氟伸烷基及含1個以上氫原子之氟伸烷基。從表面層之耐摩擦性及潤滑性的觀點來看,氟伸烷基宜為直鏈狀。 於碳數2~20之氟伸烷基的碳-碳原子間具有醚性氧原子之基可舉如後述(ii)之基。 Q32a 宜為碳數1~20之全氟伸烷基、含1個以上氫原子之碳數1~20之氟伸烷基及於含1個以上氫原子之碳數2~20之氟伸烷基的碳-碳原子間具有醚性氧原子之基。In Q 32a , the fluoroalkylene group having 1 to 20 carbon atoms is preferably a perfluoroalkylene group and a fluoroalkylene group containing one or more hydrogen atoms. From the viewpoint of friction resistance and lubricity of the surface layer, the fluoroalkylene group is preferably linear. Examples of the group having an etheric oxygen atom between the carbon atoms of the fluoroalkylene group having 2 to 20 carbon atoms include the group (ii) described below. Q 32a is preferably a perfluoroalkylene group with 1 to 20 carbon atoms, a fluoroalkylene group with 1 to 20 carbon atoms containing more than 1 hydrogen atom, and a fluorine alkylene group with 2 to 20 carbon atoms containing more than 1 hydrogen atom. An alkyl group has an etheric oxygen atom between its carbon atoms.

pa為0且Rfa 為{(CF2 O)m11 (CF2 CF2 O)m12 }時,Q32a 典型上為碳數1之全氟伸烷基。 pa為1時,Q32a 可列舉下述基。 (i)全氟伸烷基。 (ii)於與Rfa 鍵結側具有RF CH2 O(惟,RF 為碳數1~6之全氟伸烷基)且於與C(O)N(R33a )鍵結側具有含1個以上氫原子之氟伸烷基(亦可於碳-碳原子間具有醚性氧原子)之基。When pa is 0 and R fa is {(CF 2 O) m11 (CF 2 CF 2 O) m12 }, Q 32a is typically a perfluoroalkylene group having 1 carbon atoms. When pa is 1, examples of Q 32a include the following groups. (i) Perfluoroalkylene group. (ii) It has R F CH 2 O on the bonding side with R fa (but, R F is a perfluoroalkylene group with a carbon number of 1 to 6) and has R F CH 2 O on the bonding side with C(O)N (R 33a ) A fluoroalkylene group containing more than one hydrogen atom (which may also have an etheric oxygen atom between carbon and carbon atoms).

(ii)之Q32a 若從表面層之耐久性及潤滑性、化合物(A11)之易製性的觀點來看,宜為下述基。 -RF CH2 O-CF2 CHFOCF2 CF2 CF2 -、-RF CH2 O-CF2 CHFCF2 OCF2 CF2 -、-RF CH2 O-CF2 CHFCF2 OCF2 CF2 CF2 -、-RF CH2 O-CF2 CHFOCF2 CF2 CF2 OCF2 CF2 -。Q 32a in (ii) is preferably the following group from the viewpoint of the durability and lubricity of the surface layer and the ease of preparation of the compound (A11). -R F CH 2 O-CF 2 CHFOCF 2 CF 2 CF 2 -, -R F CH 2 O-CF 2 CHFCF 2 OCF 2 CF 2 -, -R F CH 2 O-CF 2 CHFCF 2 OCF 2 CF 2 CF 2 -, -R F CH 2 O-CF 2 CHFOCF 2 CF 2 CF 2 OCF 2 CF 2 -.

[C(O)N(R33a )]pa 基中之pa為0與1時,含氟醚化合物之特性幾乎不變。pa為1時具有醯胺鍵,由於Q32a 之與[C(O)N(R33a )]鍵結側之末端的碳原子上至少鍵結有1個氟原子,所以醯胺鍵之極性變小,表面層之撥水撥油性不易降低。pa為0或為1可從易製性觀點來抉擇。 從化合物(A11)之易製性觀點來看,[C(O)N(R33a )]pa 基中之R33a 宜為氫原子。 R33a 為烷基時,烷基宜為碳數1~4之烷基。[C(O)N(R 33a )] When pa in the pa group is 0 or 1, the characteristics of the fluorine-containing ether compound are almost unchanged. When pa is 1, it has a amide bond. Since the carbon atom at the end of Q 32a 's bonding side with [C(O)N(R 33a )] is bonded with at least one fluorine atom, the polarity of the amide bond changes. Small, the water and oil repellency of the surface layer is not easily reduced. Whether pa is 0 or 1 can be selected from the perspective of ease of manufacturing. From the viewpoint of ease of preparation of compound (A11), R 33a in the [C(O)N(R 33a )] pa group is preferably a hydrogen atom. When R 33a is an alkyl group, the alkyl group is preferably an alkyl group having 1 to 4 carbon atoms.

pa為0時,從化合物(A11)之易製性觀點來看,R34a 宜為單鍵或選自於由-CH2 O-、-CH2 OCH2 -、-CH2 OCH2 CH2 O-及-CH2 OCH2 CH2 OCH2 -所構成群組中之基團(惟,左側與Q32 鍵結)。 pa為1時,從化合物(A11)之易製性觀點來看,R34a 宜為單鍵或選自於由-CH2 -及-CH2 CH2 -所構成群組中之基團。When pa is 0, from the viewpoint of ease of preparation of compound (A11), R 34a is preferably a single bond or selected from the group consisting of -CH 2 O-, -CH 2 OCH 2 -, -CH 2 OCH 2 CH 2 O - and -CH 2 OCH 2 CH 2 OCH 2 - groups in the group (but the left side is bonded to Q 32 ). When pa is 1, from the viewpoint of ease of preparation of compound (A11), R 34a is preferably a single bond or a group selected from the group consisting of -CH 2 - and -CH 2 CH 2 -.

從化合物(A11)之易製性觀點來看,R35a 宜為選自於由-CH2 CH2 -、-CH2 CH2 CH2 -、-CH2 OCH2 CH2 CH2 -、-OCH2 CH2 CH2 -所構成群組中之基團(惟,右側與Si鍵結)。 從表面層之耐光性優異的觀點來看,R35a 尤宜為不具醚性氧原子之物。就屋外使用之觸控面板(自動販賣機、導覽板等數位標示)、車載觸控面板等而言,對撥水撥油層講究耐光性。 化合物(A11)中之3個R35a 可相同亦可互異。From the viewpoint of ease of preparation of compound (A11), R 35a is preferably selected from -CH 2 CH 2 -, -CH 2 CH 2 CH 2 -, -CH 2 OCH 2 CH 2 CH 2 -, -OCH 2 CH 2 CH 2 -groups in the group (but the right side is bonded to Si). From the viewpoint of excellent light resistance of the surface layer, it is particularly preferable that R 35a does not have an etheric oxygen atom. For touch panels used outdoors (digital signs such as vending machines and guide boards) and automotive touch panels, the water- and oil-repellent layer must be light-resistant. The three R 35a in compound (A11) may be the same or different from each other.

化合物(A11)可舉如下式化合物。由工業上容易製造、好處置、且表面層之撥水撥油性、耐摩擦性、指紋污垢去除性、潤滑性、外觀更為優異的觀點來看,該化合物甚是理想。Examples of the compound (A11) include compounds of the following formula. This compound is ideal from the viewpoint of being easy to manufacture and easy to handle industrially, and the surface layer has excellent water and oil repellency, friction resistance, fingerprint dirt removal ability, lubricity, and appearance.

[化學式1] [Chemical formula 1]

惟,該等式中之W為Rf1a -O-Qa -Rfa -。W的理想形態係將上述理想的Rf1a 、Qa 及Rfa 予以組合而成者。Q32a 的理想範圍如同上述。However, W in this equation is R f1a -OQ a -R fa -. The ideal form of W is a combination of the above ideal R f1a , Q a and R fa . The ideal range of Q 32a is as described above.

「化合物(A12)」 化合物(A12)以下式(A12)表示。 Rf1a -O-Qa -Rfa -R42a -R43a -N[-R44a -SiRa na La 3-na ]2 …(A12) 惟,Rf1a 、Qa 、Rfa 、Ra 、La 及na分別與前述同義, R42a 為碳數1~6之全氟伸烷基, R43a 為單鍵、碳數1~6之伸烷基、於該伸烷基末端(惟,與N鍵結側之末端除外)具有醚性氧原子或-NH-之基、於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子或-NH-之基、或於碳數2~6之伸烷基末端(惟,與N鍵結側之末端除外)及碳-碳原子間具有醚性氧原子或-NH-之基, R44a 為碳數1~6之伸烷基、或於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子或-NH-之基, 2個[-R44a -SiRna L3-na ]可相同亦可互異。"Compound (A12)" Compound (A12) is represented by the following formula (A12). R f1a -OQ a -R fa -R 42a -R 43a -N[-R 44a -SiR a na L a 3-na ] 2 ...(A12) Only, R f1a , Q a , R fa , R a , L a and na are synonymous with the above respectively, R 42a is a perfluoroalkylene group with 1 to 6 carbon atoms, R 43a is a single bond, an alkylene group with 1 to 6 carbon atoms, and is at the end of the alkylene group (but, with N (Excluding the end of the bonding side) has an etheric oxygen atom or -NH- group, has an etheric oxygen atom or -NH- group between the carbon-carbon atoms of the alkylene group with 2 to 6 carbon atoms, or has an etheric oxygen atom or -NH- group between carbon atoms. Alkylene terminals with numbers 2 to 6 (excluding the end bonded to N) and groups with etheric oxygen atoms or -NH- between carbon-carbon atoms. R 44a is an alkylene group with 1 to 6 carbon atoms. group, or a group with an etheric oxygen atom or -NH- between the carbon atoms of an alkylene group with 2 to 6 carbon atoms. The two [-R 44a -SiR na L 3-na ] can be the same or each other. Different.

化合物(A12)係上述式(A1)中ra為1、sa為2且Za 為-R42a -R43a -N[-R44a -]2 之化合物。Compound (A12) is a compound in which ra is 1, sa is 2, and Z a is -R 42a -R 43a -N[-R 44a -] 2 in the above formula (A1).

R42a 宜為直鏈狀全氟伸烷基。R42 若為直鏈狀全氟伸烷基,表面層之耐摩擦性及潤滑性便更為優異。 當Rfa 為{(CF2 O)m11 (CF2 CF2 O)m12 }時,R42a 典型上為碳數1之全氟伸烷基。R 42a is preferably a linear perfluoroalkylene group. If R 42 is a linear perfluoroalkylene group, the friction resistance and lubricity of the surface layer will be even better. When R fa is {(CF 2 O) m11 (CF 2 CF 2 O) m12 }, R 42a is typically a perfluoroalkylene group having 1 carbon atoms.

從化合物(A12)之易製性觀點來看,R43a 宜為選自於由-CH2 -、-CH2 CH2 -、-CH2 CH2 CH2 -、-CH2 OCH2 CH2 -及-CH2 NHCH2 CH2 -所構成群組中之基團(惟,左側與R42a 鍵結)。 R43a 不具極性高且耐藥性及耐光性不足的酯鍵,所以表面層之初始撥水性、耐藥性及耐光性佳。From the viewpoint of ease of preparation of compound (A12), R 43a is preferably selected from -CH 2 -, -CH 2 CH 2 -, -CH 2 CH 2 CH 2 -, -CH 2 OCH 2 CH 2 -. and -CH 2 NHCH 2 CH 2 - groups in the group (but the left side is bonded to R 42a ). R 43a does not have an ester bond that is highly polar and lacks chemical resistance and light resistance, so the surface layer has good initial water repellency, chemical resistance and light resistance.

從化合物(A12)之易製性觀點來看,R44a 宜為-CH2 CH2 CH2 -及-CH2 CH2 OCH2 CH2 CH2 -(惟,右側與Si鍵結)。 R44a 不具極性高且耐藥性及耐光性不足的酯鍵,所以表面層之初始撥水性、耐藥性及耐光性佳。 從表面層之耐光性優異的觀點來看,R44a 尤宜為不具醚性氧原子之物。 化合物(A12)中之2個R44a 可相同亦可互異。From the viewpoint of ease of preparation of compound (A12), R 44a is preferably -CH 2 CH 2 CH 2 - and -CH 2 CH 2 OCH 2 CH 2 CH 2 - (however, the right side is bonded to Si). R 44a does not have an ester bond that is highly polar and lacks chemical resistance and light resistance, so the surface layer has good initial water repellency, chemical resistance and light resistance. From the viewpoint of excellent light resistance of the surface layer, R 44a is particularly preferably one that does not have etheric oxygen atoms. The two R 44a's in compound (A12) may be the same or different from each other.

化合物(A12)可舉如下式化合物。由工業上容易製造、好處置、撥水撥油性、耐摩擦性、指紋污垢去除性、潤滑性、耐藥性及耐光性更為優異的觀點來看,以該化合物為宜。Examples of the compound (A12) include compounds of the following formula. This compound is suitable from the viewpoint of being industrially easy to produce, easy to handle, and has excellent water and oil repellency, friction resistance, fingerprint stain removal ability, lubricity, chemical resistance, and light resistance.

[化學式2] [Chemical formula 2]

惟,該等式中之W為Rf1a -O-Qa -Rfa -。W的理想形態係將上述理想的Rf1a 、Qa 及Rfa 予以組合而成者。R42a 的理想範圍如同上述。However, W in this equation is R f1a -OQ a -R fa -. The ideal form of W is a combination of the above ideal R f1a , Q a and R fa . The ideal range of R 42a is as described above.

「化合物(A13)」 化合物(A13)以下式(A13)表示。 [Rf1a -O-Qa -Rfa -R51a -R52a -O-]ea Z3a [-O-R53a -SiRa na L3-na ]fa …(A13) 惟,Rf1a 、Qa 、Rfa 、Ra 、La 及na分別與前述同義, R51a 為碳數1~6之全氟伸烷基, R52a 為碳數1~6之伸烷基, Z3a 為(ea+fa)價烴基、或於烴基之碳原子-碳原子間具有1個以上醚性氧原子且碳數2以上的(ea+fa)價基團, R53a 為碳數1~20之伸烷基, ea為1以上之整數, fa為1以上之整數, (ea+fa)為3以上, 並且,ea為2以上時,ea個[Rf1a -O-Qa -Rfa -R51a -R52a -O-]可相同亦可互異, fa為2以上時,fa個[-O-R53a -SiRa na La 3-na ]可相同亦可互異。"Compound (A13)" Compound (A13) is represented by the following formula (A13). [R f1a -OQ a -R fa -R 51a -R 52a -O-] ea Z 3a [-OR 53a -SiR a na L 3-na ] fa … (A13) Only, R f1a , Q a , R fa , R a , L a and na are respectively synonymous with the above, R 51a is a perfluoroalkylene group with 1 to 6 carbon atoms, R 52a is an alkylene group with 1 to 6 carbon atoms, and Z 3a is (ea+fa) valence Hydrocarbon group, or a (ea+fa) valent group with more than one etheric oxygen atom and more than 2 carbon atoms between the carbon atoms of the hydrocarbon group, R 53a is an alkylene group with 1 to 20 carbon atoms, ea is an integer of 1 or more, fa is an integer of 1 or more, (ea+fa) is 3 or more, and ea is 2 or more, ea [R f1a -OQ a -R fa -R 51a -R 52a -O-] They may be the same or different. When fa is 2 or more, fa [-OR 53a -SiR a na L a 3-na ] may be the same or different.

化合物(A13)係上述式(A1)中ra為ea、sa為fa且Za 為-R51a -R52a -O-]ea Z3a [-O-R53a -]fa 之化合物。Compound (A13) is a compound in which ra is ea, sa is fa, and Z a is -R 51a -R 52a -O-] ea Z 3a [-OR 53a -] fa in the above formula (A1).

ea宜為1~3之整數。fa宜為1~10之整數,且2~5之整數較佳,3~4之整數尤佳。ea should be an integer between 1 and 3. fa should be an integer from 1 to 10, and an integer from 2 to 5 is preferred, and an integer from 3 to 4 is particularly preferred.

譬如當Rfa 為{(CF2 O)m11 (CF2 CF2 O)m12 }時,R51a 為-CF2 -。 R51a 宜為直鏈狀。R51a 為直鏈狀之化合物(A13)可形成耐摩擦性及潤滑性較為優異的表面層。For example, when R fa is {(CF 2 O) m11 (CF 2 CF 2 O) m12 }, R 51a is -CF 2 -. R 51a is preferably linear. R 51a is a linear compound (A13) that can form a surface layer with excellent friction resistance and lubricity.

從化合物(A13)之易製性觀點來看,R52a 宜為碳數1~4之伸烷基,且-CH2 -尤佳。From the viewpoint of ease of preparation of compound (A13), R 52a is preferably an alkylene group having 1 to 4 carbon atoms, and -CH 2 - is particularly preferred.

從表面層之撥水撥油性、耐久性、指紋污垢去除性、潤滑性且外觀也更為優異的觀點及化合物(A13)之易製性的觀點來看,Rf1a -O-Qa -Rfa -R51a -基宜為基(Rf -1)及基(Rf -2)。 Rf11 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -…(Rf -1) Rf11 OCHFCF2 OCH2 CF2 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -…(Rf -2) 惟,Rf11 為碳數1~20的直鏈狀全氟烷基;m21及m22分別為1以上之整數,m21+m22為2~200之整數,並且m21個CF2 O及m22個CF2 CF2 O之鍵結順序不限。R f1a -OQ a -R fa - from the viewpoint of the water and oil repellency of the surface layer, durability, fingerprint dirt repellency, lubricity, and superior appearance, as well as the ease of preparation of the compound (A13). R 51a -group is preferably group (R f -1) and group (R f -2). R f11 O{(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 2 -…(R f -1) R f11 OCHFCF 2 OCH 2 CF 2 O{(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 2 -…(R f -2) However, R f11 is a linear perfluoroalkyl group with 1 to 20 carbon atoms; m21 and m22 are integers above 1 respectively, and m21+m22 is 2 to 200 is an integer, and the bonding order of m21 CF 2 O and m22 CF 2 CF 2 O is not limited.

Z3a 可舉如從具有(ea+fa)個羥基之多元醇去除羥基後的殘基。 Z3a 之具體例可舉如下式基團。從羥基之反應性優異的觀點來看,Z3a 宜為從具有1級羥基之多元醇去除羥基後的殘基;從原料之易入手性觀點來看,則以基(Z-1)、基(Z-2)及基(Z-3)尤佳。惟,R4 為烷基,且宜為甲基或乙基。Examples of Z 3a include the residue obtained by removing hydroxyl groups from a polyol having (ea+fa) hydroxyl groups. Specific examples of Z 3a include groups of the following formulas. From the viewpoint of excellent reactivity of the hydroxyl group, Z 3a is preferably the residue obtained by removing the hydroxyl group from a polyol having a primary hydroxyl group; from the viewpoint of easy availability of raw materials, the group (Z-1), group (Z-2) and group (Z-3) are particularly preferred. However, R 4 is an alkyl group, and is preferably methyl or ethyl.

[化學式3] [Chemical formula 3]

從化合物(A13)之易製性觀點來看,R53a 宜為碳數3~14之伸烷基。此外,從後述之化合物(A13)於製造中矽氫化時不易生成一部分或全部的烯丙基(-CH2 CH=CH2 )異構化成內烯烴(-CH=CHCH3 )之副產物的觀點來看,以碳數4~10之伸烷基尤佳。From the viewpoint of ease of preparation of compound (A13), R 53a is preferably an alkylene group having 3 to 14 carbon atoms. In addition, from the viewpoint that by-products in which part or all of the allyl group (-CH 2 CH=CH 2 ) is isomerized into the internal olefin (-CH=CHCH 3 ) are less likely to be produced during hydrosilylation in the production of the compound (A13) described later. In view of this, an alkylene group having 4 to 10 carbon atoms is particularly preferred.

化合物(A13)可舉如下式化合物(A13-1)~化合物(A13-6)。由工業上容易製造、好處置、且表面層之撥水撥油性、耐摩擦性、指紋污垢去除性、潤滑性、外觀更為優異的觀點來看,該化合物甚是理想。Examples of the compound (A13) include compounds (A13-1) to (A13-6) of the following formulas. This compound is ideal from the viewpoint of being easy to manufacture and easy to handle industrially, and the surface layer has excellent water and oil repellency, friction resistance, fingerprint dirt removal ability, lubricity, and appearance.

[化學式4] [Chemical formula 4]

惟,該等式中之W為Rf1a -O-Qa -Rfa -。W的理想形態係將上述理想的Rf1a 、Qa 及Rfa 予以組合而成者。R51a 的理想形態如同上述。However, W in this equation is R f1a -OQ a -R fa -. The ideal form of W is a combination of the above ideal R f1a , Q a and R fa . The ideal form of R 51a is as described above.

<化合物(B1)的理想形態> 從表面層之耐摩擦性及指紋污垢去除性更為優異的觀點來看,化合物(B1)宜為以下化合物(B11)、化合物(B12)及化合物(B13)。<Ideal form of compound (B1)> From the viewpoint of more excellent friction resistance and fingerprint stain removal properties of the surface layer, compound (B1) is preferably the following compound (B11), compound (B12) and compound (B13) .

「化合物(B11)」 化合物(B11)以下式(B11)表示。 Rf1b -O-Qb -Rfb -Q32b -[C(O)N(R33b )]pb -R34b -C[-R35b -SiRnb L3-nb ]3 …(B11) 惟,Rf1b 、Qb 、Rfb 、Rb 、Lb 及nb分別與前述同義, Q32b 為碳數1~20之氟伸烷基或於碳數2~20之氟伸烷基的碳-碳原子間具有醚性氧原子之基(惟,一端與醚性氧原子鍵結且另一端與Rfb 鍵結之氟伸烷基為全氟伸烷基的情況除外), R33b 為氫原子或碳數1~6之烷基, pb為0或1, R34b 為單鍵、碳數1~6之伸烷基、於該伸烷基末端(惟,與C[-R34b -SiRnb L3-nb ]3 鍵結側之末端)具有醚性氧原子之基、於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子之基、或於碳數2~6之伸烷基末端(惟,與C[-R34b -SiRnb L3-nb ]3 鍵結側之末端)及碳-碳原子間具有醚性氧原子之基, R35b 為碳數1~6之伸烷基、於該伸烷基末端(惟,與Si鍵結側之末端除外)具有醚性氧原子之基、或於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子之基, 3個[-R34b -SiRnb L3-nb ]可相同亦可互異。"Compound (B11)" Compound (B11) is represented by the following formula (B11). R f1b -OQ b -R fb -Q 32b -[C(O)N(R 33b )] pb -R 34b -C[-R 35b -SiR nb L 3-nb ] 3 …(B11) Only, R f1b , Q b , R fb , R b , L b and nb are synonymous with the above respectively. Q 32b is a fluoroalkylene group with 1 to 20 carbon atoms or between the carbon-carbon atoms of a fluoroalkylene group with 2 to 20 carbon atoms. A group having an etheric oxygen atom (except when the fluoroalkylene group bonded to an etheric oxygen atom at one end and the other end bonded to R fb is a perfluoroalkylene group), R 33b is a hydrogen atom or a carbon number Alkyl group of 1 to 6, pb is 0 or 1, R 34b is a single bond, an alkylene group with 1 to 6 carbon atoms, at the end of the alkylene group (but, with C[-R 34b -SiR nb L 3- nb ] 3 The end of the bonding side) has a group with an etheric oxygen atom, a group with an etheric oxygen atom between the carbon-carbon atoms of the alkylene group with 2 to 6 carbon atoms, or a group with an etheric oxygen atom in the alkylene group with 2 to 6 carbon atoms. The end of the alkyl group (only the end of the bonding side with C[-R 34b -SiR nb L 3-nb ] 3 ) and the group with etheric oxygen atoms between carbon and carbon atoms, R 35b is a carbon number of 1 to 6 Alkylene group, a group having an etheric oxygen atom at the end of the alkylene group (excluding the end bonded to Si), or a group having etheric properties between the carbon-carbon atoms of the alkylene group having 2 to 6 carbon atoms The three bases of oxygen atoms [-R 34b -SiR nb L 3-nb ] may be the same or different from each other.

化合物(B11)係上述式(B1)中rb為1、sb為3且Zb 為-Q32b -[C(O)N(R33b )]pb -R34b -C[-R35b -]3 之化合物。Compound (B11) is a compound in the above formula (B1) in which rb is 1, sb is 3, and Z b is -Q 32b -[C(O)N(R 33b )] pb -R 34b -C[-R 35b -] 3 of compounds.

Q32b 中之氟伸烷基、於氟伸烷基之碳-碳原子間具有醚性氧原子之基分別同於前述式(A11)中之Q32a 的氟伸烷基、於氟伸烷基之碳-碳原子間具有醚性氧原子之基。 Q32b 中之(CF2 O)數宜為0~3個。 當p1為0且Rfb 為(CF2 CF2 O)m13 時,Q32b 典型上為碳數1之全氟伸烷基。p1為0且Rfb 為(CF2 CF2 CF2 O)m14 時,Q32b 典型上為碳數2之全氟伸烷基。p1為0且Rfb 為(CF2 CF2 O-CF2 CF2 CF2 CF2 O)m15 時,Q32b 則典型上為碳數3之直鏈全氟伸烷基。 R33b 、pb、R34b 、R35b 分別同於前述式(A11)中之R33a 、pa、R34a 、R35a ,理想態樣亦同。The fluoroalkylene group in Q 32b and the group having an etheric oxygen atom between the carbon atoms of the fluoroalkylene group are respectively the same as the fluoroalkylene group and the fluoroalkylene group of Q 32a in the aforementioned formula (A11). A carbon-carbon base with etheric oxygen atoms between carbon atoms. The number of (CF 2 O) in Q 32b is preferably 0 to 3. When p1 is 0 and R fb is (CF 2 CF 2 O) m13 , Q 32b is typically a perfluoroalkylene group with 1 carbon atoms. When p1 is 0 and R fb is (CF 2 CF 2 CF 2 O) m14 , Q 32b is typically a perfluoroalkylene group having 2 carbon atoms. When p1 is 0 and R fb is (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) m15 , Q 32b is typically a linear perfluoroalkylene group with 3 carbon atoms. R 33b , pb, R 34b , and R 35b are respectively the same as R 33a , pa, R 34a , and R 35a in the aforementioned formula (A11), and the ideal form is also the same.

「化合物(B12)」 化合物(B12)以下式(B12)表示。 Rf1b -O-Qb -Rfb -R42b -R43b -N[-R44b -SiRnb L3-nb ]2 …(B12) 惟,Rf1b 、Qb 、Rfb 、Rb 、Lb 及nb分別與前述同義, R42a 為碳數1~6之全氟伸烷基, R43a 為單鍵、碳數1~6之伸烷基、於該伸烷基末端(惟,與N鍵結側之末端除外)具有醚性氧原子或-NH-之基、於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子或-NH-之基、或於碳數2~6之伸烷基末端(惟,與N鍵結側之末端除外)及碳-碳原子間具有醚性氧原子或-NH-之基, R44a 為碳數1~6之伸烷基、或於碳數2~6之伸烷基的碳-碳原子間具有醚性氧原子或-NH-之基, 2個[-R44 -SiRn L3-n ]可相同亦可互異。"Compound (B12)" Compound (B12) is represented by the following formula (B12). R f1b -OQ b -R fb -R 42b -R 43b -N[-R 44b -SiR nb L 3-nb ] 2 ...(B12) Only, R f1b , Q b , R fb , R b , L b and nb are synonymous with the above respectively, R 42a is a perfluoroalkylene group with 1 to 6 carbon atoms, R 43a is a single bond, an alkylene group with 1 to 6 carbon atoms, and is bonded to N at the end of the alkylene group (but, (Excluding the end of the side) has an etheric oxygen atom or -NH- group, has an etheric oxygen atom or -NH- group between the carbon atoms of the alkylene group with 2 to 6 carbon atoms, or has an etheric oxygen atom or -NH- group between the carbon atoms of the alkylene group with 2 carbon atoms. The alkylene group end of ~6 (excluding the end bonded to N) and the group with etheric oxygen atom or -NH- between carbon-carbon atoms, R 44a is an alkylene group with carbon number of 1 to 6, Or there is an etheric oxygen atom or -NH- group between the carbon atoms of the alkylene group having 2 to 6 carbon atoms, and the two [-R 44 -SiR n L 3-n ] may be the same or different from each other.

化合物(B12)係上述式(B1)中rb為1、sb為2且Zb 為-R42b -R43b -N[-R44b -]2 之化合物。Compound (B12) is a compound in which rb is 1, sb is 2, and Z b is -R 42b -R 43b -N[-R 44b -] 2 in the above formula (B1).

R42b 、R43b 、R44b 分別同於前述式(A12)中之R42a 、R43a 、R44a 。 惟,Rfb 為(CF2 CF2 O)m13 時,R42b 典型上為碳數1之全氟伸烷基。Rfb 為(CF2 CF2 CF2 O)m14 時,R42b 典型上為碳數2之全氟伸烷基。Rfb 為(CF2 CF2 O-CF2 CF2 CF2 CF2 O)m15 時,R42b 則典型上為碳數3之直鏈全氟伸烷基。R 42b , R 43b , and R 44b are respectively the same as R 42a , R 43a , and R 44a in the aforementioned formula (A12). However, when R fb is (CF 2 CF 2 O) m13 , R 42b is typically a perfluoroalkylene group having 1 carbon atoms. When R fb is (CF 2 CF 2 CF 2 O) m14 , R 42b is typically a perfluoroalkylene group having 2 carbon atoms. When R fb is (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) m15 , R 42b is typically a linear perfluoroalkylene group with 3 carbon atoms.

「化合物(B13)」 化合物(B13)以下式(B13)表示。 [Rf1b -O-Qb -Rfb -R51b -R52b -O-]eb Z3b [-O-R53b -SiRb nb Lb 3-nb ]f …(B13) 惟,Rf1b 、Qb 、Rfb 、Rb 、Lb 及nb分別與前述同義, R51b 為碳數1~6之全氟伸烷基, R52b 為碳數1~6之伸烷基, Z3b 為(eb+fb)價烴基、或於烴基之碳原子-碳原子間具有1個以上醚性氧原子且碳數2以上的(eb+fb)價基團, R53b 為碳數1~20之伸烷基, eb為1以上之整數, fb為1以上之整數, (eb+fb)為3以上, eb為2以上時,eb個[Rf1b -O-Q-Rfb -R51b -R52b -O-]可相同亦可互異, fb為2以上時,fb個[-O-R53b -SiRb nb Lb 3-nb ]可相同亦可互異。"Compound (B13)" Compound (B13) is represented by the following formula (B13). [R f1b -OQ b -R fb -R 51b -R 52b -O-] eb Z 3b [-OR 53b -SiR b nb L b 3-nb ] f ...(B13) Only, R f1b , Q b , R fb , R b , L b and nb are synonymous with the above respectively, R 51b is a perfluoroalkylene group with 1 to 6 carbon atoms, R 52b is an alkylene group with 1 to 6 carbon atoms, and Z 3b is (eb+fb) A valent hydrocarbon group, or a (eb+fb) valence group with more than one etheric oxygen atom and more than 2 carbon atoms between the carbon atoms of the hydrocarbon group, R 53b is an alkylene group with 1 to 20 carbon atoms, eb is an integer greater than 1, fb is an integer greater than 1, (eb+fb) is greater than 3, and eb is greater than 2, eb [R f1b -OQR fb -R 51b -R 52b -O-] may be the same or the same mutually different, when fb is 2 or more, fb [-OR 53b -SiR b nb L b 3-nb ] may be the same or different.

化合物(B13)係上述式(B1)中rb為eb、sb為fb且Zb 為[-R51b -R52b -O-]eb Z3b [-O-R53b -]fb 之化合物。Compound (B13) is a compound in the above formula (B1) in which rb is eb, sb is fb, and Z b is [-R 51b -R 52b -O-] eb Z 3b [-OR 53b -] fb .

R51b 、R52b 、Z3b 、R53b 、eb、fb分別同於前述式(A13)中之R51a 、R52a 、Z3a 、R53a 、ea、fa。 從表面層之撥水撥油性、耐久性、指紋污垢去除性、潤滑性且外觀也更優異的觀點及化合物(B13)之易製性觀點來看,Rf1b -O-Qb -Rfb -R51b -R52b -基宜為基(Rf -3)。 Rf11 O(CF2 CF2 OCF2 CF2 CF2 CF2 O)m25 CF2 CF2 OCF2 CF2 CF2 -…(Rf -3) 惟,Rf11 為碳數1~20的直鏈狀全氟烷基;m25為1~100之整數。R 51b , R 52b , Z 3b , R 53b , eb and fb are respectively the same as R 51a , R 52a , Z 3a , R 53a , ea and fa in the aforementioned formula (A13). R f1b -OQ b -R fb -R 51b from the viewpoint of superior water and oil repellency of the surface layer, durability, fingerprint dirt removal ability, lubricity and appearance, and the ease of preparation of the compound (B13) The group -R 52b - is preferably the group (R f -3). R f11 O(CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) m25 CF 2 CF 2 OCF 2 CF 2 CF 2 -…(R f -3) However, R f11 is a straight chain with 1 to 20 carbon atoms. Like perfluoroalkyl; m25 is an integer from 1 to 100.

(其他含氟醚化合物) 本組成物可由化合物(A)及化合物(B)構成,亦可更含有化合物(A)及化合物(B)以外的其他含氟醚化合物。 其他含氟醚化合物可舉如具有聚(氧全氟伸烷基)鏈且不具基(I)之含氟醚化合物(以下亦表記為化合物(C))。該聚(氧全氟伸烷基)鏈可為A鏈亦可為B鏈。(Other fluorine-containing ether compounds) The present composition may be composed of compound (A) and compound (B), and may further contain other fluorine-containing ether compounds other than compound (A) and compound (B). Examples of other fluorine-containing ether compounds include fluorine-containing ether compounds having a poly(oxyperfluoroalkylene) chain and not having a group (I) (hereinafter also referred to as compound (C)). The poly(oxyperfluoroalkylene) chain can be either an A chain or a B chain.

化合物(C)可舉如化合物(C1)。 A31 -O-Q51 -(RF3 O)m30 -[Q52 -O]p3 -A32 …(C1) 惟,A31 及A32 分別獨立為碳數1~20之全氟烷基;Q51 為單鍵、含1個以上氫原子且不具分枝結構之碳數1~6之氟伸烷基、於含1個以上氫原子且不具分枝結構之碳數1~6之氟伸烷基末端(惟,與A31 -O鍵結側之末端除外)具有醚性氧原子之基、於含1個以上氫原子且不具分枝結構之碳數2~6之氟伸烷基的碳-碳原子間具有醚性氧原子之基、或於含1個以上氫原子且不具分枝結構之碳數2~6之氟伸烷基末端(惟,與A31 -O鍵結側之末端除外)及碳-碳原子間具有醚性氧原子之基(惟,氧數為10以下);Q52 為含1個以上氫原子且不具分枝結構之碳數1~20之氟伸烷基、或於含1個以上氫原子且不具分枝結構之碳數2~6之氟伸烷基的碳-碳原子間具有醚性氧原子之基(惟,氧數為10以下);RF3 為不具分枝結構之碳數1~6之全氟伸烷基;m30為2~200之整數;(RF3 O)m30 亦可由碳數不同之2種以上RF3 O構成;Q51 為單鍵時p3為0,Q51 為單鍵以外時p3則為1。Examples of compound (C) include compound (C1). A 31 -OQ 51 -(R F3 O) m30 -[Q 52 -O] p3 -A 32 …(C1) However, A 31 and A 32 are independently perfluoroalkyl groups with 1 to 20 carbon atoms; Q 51 It is a single bond, a fluoroalkylene group with 1 to 6 carbon atoms containing one or more hydrogen atoms and having no branched structure, and a fluoroalkylene group with 1 to 6 carbon atoms containing more than 1 hydrogen atom and having no branched structure. A group with an etheric oxygen atom at the end (excluding the end on the bonding side with A 31 -O), a carbon-carbon group of a fluoroalkylene group with 2 to 6 carbon atoms containing one or more hydrogen atoms and not having a branched structure. A group with etheric oxygen atoms between carbon atoms, or a fluoroalkylene group with 2 to 6 carbon atoms at the end containing one or more hydrogen atoms and not having a branched structure (excluding the end on the bonding side with A 31 -O ) and a group with an etheric oxygen atom between carbon-carbon atoms (but the oxygen number is less than 10); Q 52 is a fluoroalkyl group with 1 to 20 carbon atoms containing more than 1 hydrogen atom and without a branched structure, Or a group with an etheric oxygen atom between the carbon atoms of a fluoroalkylene group with 2 to 6 carbon atoms containing more than 1 hydrogen atom and without a branched structure (but the oxygen number is less than 10); R F3 is Perfluoroalkylene group with 1 to 6 carbon atoms without branched structure; m30 is an integer from 2 to 200; ( RF3 O) m30 can also be composed of two or more RF3 O with different carbon numbers; Q 51 is a single bond When p3 is 0, p3 is 1 when Q 51 is other than a single bond.

化合物(C1)可使用利用公知製造方法製得之物,亦可使用市售物。譬如,Q51 為單鍵且p3為0之化合物(C1)的市售物可列舉FOMBLIN(註冊商標)M、FOMBLIN(註冊商標)Y、FOMBLIN(註冊商標)Z(以上Solvay Solexis公司製)、Krytox(註冊商標)(杜邦公司製)、DEMNUM(註冊商標)(大金工業公司製)等。Compound (C1) may be one produced by a known production method, or a commercially available compound may be used. For example, commercially available products of the compound (C1) in which Q 51 is a single bond and p3 is 0 include FOMBLIN (registered trademark) M, FOMBLIN (registered trademark) Y, FOMBLIN (registered trademark) Z (the above manufactured by Solvay Solexis), Krytox (registered trademark) (manufactured by DuPont), DEMNUM (registered trademark) (manufactured by Daikin Industries, Ltd.), etc.

本組成物亦可含有化合物(A)、化合物(B)及其他含氟醚化合物以外的不純物。化合物(A)、化合物(B)及其他含氟醚化合物以外的不純物可列舉化合物(A)、化合物(B)及其他含氟醚化合物於製造上無法避免之化合物等。The present composition may also contain impurities other than compound (A), compound (B) and other fluorine-containing ether compounds. Impurities other than compound (A), compound (B) and other fluorine-containing ether compounds include compounds that are unavoidable in the production of compound (A), compound (B) and other fluorine-containing ether compounds.

(本組成物之組成) 在本組成物中,化合物(A)相對於化合物(A)與化合物(B)之合計量的含量(化合物(A)/[化合物(A)+化合物(B)]的質量比率)宜為10~80質量%,且20~50質量%尤佳。化合物(A)的含量在前述範圍內值愈高,表面層之潤滑性即較佳。化合物(A)的含量在前述範圍內值愈低(即化合物(B)相對於化合物(A)與化合物(B)之合計量的含量愈高),表面層之耐久性即較佳。(Composition of this composition) In this composition, the content of compound (A) relative to the total amount of compound (A) and compound (B) (compound (A)/[compound (A) + compound (B)] The mass ratio) is preferably 10 to 80 mass %, and 20 to 50 mass % is particularly preferred. The higher the content of compound (A) is within the aforementioned range, the better the lubricity of the surface layer is. The lower the content of compound (A) is within the aforementioned range (that is, the higher the content of compound (B) relative to the total amount of compound (A) and compound (B)), the better the durability of the surface layer.

在本組成物中,化合物(A)及化合物(B)之合計量相對於本組成物之總質量宜為50質量%以上,且80質量%以上尤佳。上限無特別限定,亦可為100質量%。In the present composition, the total amount of compound (A) and compound (B) is preferably 50 mass% or more, and particularly preferably 80 mass% or more, based on the total mass of the composition. The upper limit is not particularly limited, and may be 100% by mass.

[塗佈液] 本發明之塗佈液(以下亦表記為本塗佈液)含有本組成物與液態介質。本塗佈液只要為液態即可,可為溶液或可為分散液。 本塗佈液含有本組成物即可,亦可含有化合物(A)、化合物(B)等在製造步驟中所生成之副產物等不純物。 本組成物之濃度在本塗佈液中宜為0.001~50質量%,且0.05~30較佳,0.05~10質量%更佳,0.1~1質量%尤佳。[Coating Liquid] The coating liquid of the present invention (hereinafter also referred to as the present coating liquid) contains the present composition and a liquid medium. This coating liquid only needs to be in a liquid state, and may be a solution or a dispersion liquid. The coating liquid only needs to contain the present composition, and may also contain impurities such as by-products such as Compound (A) and Compound (B) generated during the production process. The concentration of this composition in this coating liquid is preferably 0.001~50% by mass, preferably 0.05~30% by mass, more preferably 0.05~10% by mass, and especially preferably 0.1~1% by mass.

液態介質以有機溶劑為宜。有機溶劑可為氟系有機溶劑亦可為非氟系有機溶劑,或可含有兩溶劑。The liquid medium is preferably an organic solvent. The organic solvent may be a fluorine-based organic solvent or a non-fluorine-based organic solvent, or may contain both solvents.

氟系有機溶劑可舉如氟化烷烴、氟化芳香族化合物、氟烷基醚、氟化烷基胺、氟醇等。 氟化烷烴以碳數4~8之化合物為宜。市售物可舉如C6 F13 H(旭硝子公司製、ASAHIKLIN(註冊商標)AC-2000)、C6 F13 C2 H5 (旭硝子公司製、ASAHIKLIN(註冊商標)AC-6000)、C2 F5 CHFCHFCF3 (Chemours公司製、Vertrel(註冊商標)XF)等。 氟化芳香族化合物可舉例如六氟苯、三氟甲基苯、全氟甲苯、雙(三氟甲基)苯等。 氟烷基醚宜為碳數4~12之化合物。市售物可舉如CF3 CH2 OCF2 CF2 H(旭硝子公司製、ASAHIKLIN(註冊商標)AE-3000)、C4 F9 OCH3 (3M公司製、Novec(註冊商標)7100)、C4 F9 OC2 H5 (3M公司製、Novec(註冊商標)7200)、C2 F5 CF(OCH3 )C3 F7 (3M公司製、Novec(註冊商標)7300)等。 氟化烷基胺可舉例如全氟三丙胺、全氟三丁胺等。 氟醇則可舉例如2,2,3,3-四氟丙醇、2,2,2-三氟乙醇、六氟異丙醇等。 非氟系有機溶劑以僅由氫原子及碳原子構成之化合物和僅由氫原子、碳原子及氧原子構成之化合物為宜,可列舉烴系有機溶劑、醇系有機溶劑、酮系有機溶劑、醚系有機溶劑、酯系有機溶劑。 本塗佈液宜含有50~99.999質量%之液態介質,且含70~99.5質量%較佳,含90~99.5質量%更佳,含99~99.9質量%尤佳。Examples of fluorine-based organic solvents include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, and fluoroalcohols. Fluorinated alkanes are preferably compounds with 4 to 8 carbon atoms. Examples of commercially available products include C 6 F 13 H (manufactured by Asahi Glass Co., Ltd., ASAHIKLIN (registered trademark) AC-2000), C 6 F 13 C 2 H 5 (manufactured by Asahi Glass Co., Ltd., ASAHIKLIN (registered trademark) AC-6000), C 2 F 5 CHFCHFCF 3 (manufactured by Chemours, Vertrel (registered trademark) XF), etc. Examples of the fluorinated aromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, bis(trifluoromethyl)benzene, and the like. The fluoroalkyl ether is preferably a compound with 4 to 12 carbon atoms. Examples of commercially available products include CF 3 CH 2 OCF 2 CF 2 H (manufactured by Asahi Glass Co., Ltd., ASAHIKLIN (registered trademark) AE-3000), C 4 F 9 OCH 3 (manufactured by 3M Company, Novec (registered trademark) 7100), C 4 F 9 OC 2 H 5 (manufactured by 3M Company, Novec (registered trademark) 7200), C 2 F 5 CF (OCH 3 ) C 3 F 7 (manufactured by 3M Company, Novec (registered trademark) 7300), etc. Examples of the fluorinated alkylamine include perfluorotripropylamine, perfluorotributylamine, and the like. Examples of fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol. Non-fluorine-based organic solvents are preferably compounds composed only of hydrogen atoms and carbon atoms and compounds composed only of hydrogen atoms, carbon atoms and oxygen atoms. Examples of the non-fluorine-based organic solvents include hydrocarbon-based organic solvents, alcohol-based organic solvents, ketone-based organic solvents, Ether-based organic solvents and ester-based organic solvents. The coating liquid should contain 50 to 99.999 mass% of the liquid medium, preferably 70 to 99.5 mass%, more preferably 90 to 99.5 mass%, and even more preferably 99 to 99.9 mass%.

本塗佈液除了含有本組成物及介質以外,亦可在不損及本發明效果之範圍內含有其他成分。 其他成分可舉如可促進水解性矽基之水解與縮合反應之酸觸媒或鹼性觸媒等公知添加劑。 在本塗佈液中,其他成分含量宜為10質量%以下,1質量%以下尤佳。In addition to the present composition and medium, the coating liquid may also contain other components within the scope that does not impair the effects of the present invention. Other ingredients include known additives such as acid catalysts or alkaline catalysts that can promote the hydrolysis and condensation reaction of the hydrolyzable silicon group. In this coating liquid, the content of other components is preferably 10% by mass or less, particularly preferably 1% by mass or less.

本塗佈液之固體成分濃度宜為0.001~50質量%,且0.05~30較佳,0.05~10質量%更佳,0.01~1質量%尤佳。 塗佈液之固體成分濃度係從加熱前之塗佈液質量與以120℃之對流式乾燥機加熱4小時後之質量算出之值。 本組成物之濃度可從固體成分濃度與本組成物及溶劑等之饋入量算出。The solid content concentration of the coating liquid is preferably 0.001 to 50 mass%, preferably 0.05 to 30 mass%, more preferably 0.05 to 10 mass%, and especially 0.01 to 1 mass%. The solid content concentration of the coating liquid is a value calculated from the mass of the coating liquid before heating and the mass after heating with a convection dryer at 120° C. for 4 hours. The concentration of this composition can be calculated from the solid content concentration and the feed amounts of this composition, solvent, etc.

[物品] 本發明之物品於基材表面具有由本組成物形成之表面層。[Article] The article of the present invention has a surface layer formed of the present composition on the surface of the base material.

(表面層) 在本組成物中,化合物(A)及化合物(B)中之基(I)的L為水解性基時,係藉由基(I)行水解反應形成矽烷醇基(Si-OH),然後該矽烷醇基在分子間反應形成Si-O-Si鍵,或該矽烷醇基與基材表面之羥基(基材-OH)行脫水縮合反應而形成化學鍵(基材-O-Si)。因此,表面層係在化合物(A)及化合物(B)各自之基(I)的一部分或全部經水解反應後之狀態下含有化合物(A)及化合物(B)。而基(I)中之L為羥基時,則係未經水解反應即進行上述反應。(Surface layer) In this composition, when L in the group (I) in the compound (A) and the compound (B) is a hydrolyzable group, the group (I) undergoes a hydrolysis reaction to form a silanol group (Si- OH), and then the silanol group reacts intermolecularly to form a Si-O-Si bond, or the silanol group undergoes a dehydration condensation reaction with the hydroxyl group on the surface of the substrate (substrate-OH) to form a chemical bond (substrate-O- Si). Therefore, the surface layer contains compound (A) and compound (B) in a state in which part or all of the group (I) of compound (A) and compound (B) has undergone a hydrolysis reaction. When L in group (I) is a hydroxyl group, the above reaction proceeds without hydrolysis reaction.

表面層厚度宜為1~100nm,1~50nm尤佳。表面層厚度只要在前述範圍之下限值以上,便能輕易地充分獲得表面處理之效果。表面層厚度只要在前述範圍之上限值以下,利用效率即高。表面層厚度可使用薄膜解析用X射線繞射計(RIGAKU公司製、ATX-G),利用X射線反射率法取得反射X射線之干涉圖案後,從該干涉圖案之振動周期算出。The thickness of the surface layer should be 1~100nm, especially 1~50nm. As long as the thickness of the surface layer is above the lower limit of the aforementioned range, the effect of surface treatment can be easily obtained. As long as the thickness of the surface layer is below the upper limit of the aforementioned range, the utilization efficiency will be high. The thickness of the surface layer can be calculated from the vibration period of the interference pattern after obtaining an interference pattern of reflected X-rays using the X-ray reflectivity method using an X-ray diffractometer for thin film analysis (ATX-G manufactured by RIGAKU Corporation).

(基材) 本發明之基材只要是有講求賦予潤滑性及撥水撥油性之基材即無特別限定。基材材料可列舉金屬、樹脂、玻璃、藍寶石、陶瓷、石材及該等之複合材料。玻璃可業經化學強化。亦可於基材表面形成有SiO2 膜等基底膜。 基材以觸控面板用基材、顯示器用基材及眼用鏡片(ophthalmic lens)為宜,且以觸控面板用基材尤佳。觸控面板用基材具有透光性。「具有透光性」意指JIS R3106:1998(ISO 9050:1990)中所規定之垂直入射型可見光透射率為25%以上。觸控面板用基材之材料宜為玻璃及透明樹脂。(Substrate) The base material of the present invention is not particularly limited as long as it is required to provide lubricity and water- and oil-repellency. Substrate materials include metal, resin, glass, sapphire, ceramics, stone and composite materials thereof. Glass can be chemically strengthened. A base film such as an SiO 2 film may also be formed on the surface of the base material. As the base material, a touch panel base material, a display base material and an ophthalmic lens are suitable, and a touch panel base material is particularly preferred. The base material for touch panels is light-transmissive. "Light-transmitting" means that the normal incidence visible light transmittance specified in JIS R3106:1998 (ISO 9050:1990) is 25% or more. The material of the base material for the touch panel is preferably glass and transparent resin.

(物品之製造方法) 本發明之物品例如可以下述方法製造。 ・藉由使用本組成物的乾式塗佈法來處理基材表面而獲得本發明物品的方法。 ・藉由濕式塗佈法將本塗佈液塗佈於基材表面後使其乾燥而獲得本發明物品的方法。(Method for manufacturing article) The article of the present invention can be produced, for example, by the following method.・A method of obtaining the article of the present invention by treating the surface of a substrate using a dry coating method using the present composition.・A method of obtaining the article of the present invention by applying the coating liquid on the surface of a base material by a wet coating method and then drying it.

<乾式塗佈法> 本組成物可直接用於乾式塗佈法。本組成物很適合用來以乾式塗佈法形成密著性優異的表面層。 乾式塗佈法可列舉真空蒸鍍法、CVD法、濺鍍法等。從抑制化合物(A)及化合物(B)分解的觀點及裝置簡便性的觀點來看,以真空蒸鍍法尤佳。真空蒸鍍時,亦可使用鐵或鋼等金屬多孔體中浸潤有本組成物或本塗佈液的顆粒狀物質。<Dry coating method> This composition can be used directly in the dry coating method. This composition is very suitable for forming a surface layer with excellent adhesion by dry coating method. Examples of the dry coating method include vacuum evaporation method, CVD method, sputtering method, and the like. From the viewpoint of suppressing the decomposition of the compound (A) and the compound (B) and the simplicity of the apparatus, the vacuum evaporation method is particularly preferred. During vacuum evaporation, a granular substance in which the present composition or the present coating liquid is impregnated into a metal porous body such as iron or steel can also be used.

真空蒸鍍時的溫度宜為20~300℃,且30~200℃尤佳。 真空蒸鍍時的壓力宜為1×10-1 Pa以下,且1×10-2 Pa以下尤佳。The temperature during vacuum evaporation should be 20~300℃, and 30~200℃ is especially suitable. The pressure during vacuum evaporation is preferably 1×10 -1 Pa or less, and particularly preferably 1×10 -2 Pa or less.

<濕式塗佈法> 濕式塗佈法可舉如旋塗法、擦塗法、噴塗法、刮塗法、浸塗法、模塗法、噴墨法、流動施膜法、輥塗法、澆鑄法、朗謬-布洛傑法及凹版塗佈法等。<Wet coating method> Examples of wet coating methods include spin coating, wipe coating, spray coating, blade coating, dip coating, die coating, inkjet, flow coating, and roller coating. , casting method, Langmuir-Blodgett method and gravure coating method, etc.

<後處理> 為了提升表面層之耐摩擦性,可因應需求施行用以促進化合物(A)及化合物(B)與基材之反應的操作。該操作可列舉加熱、加濕、光照射等。 譬如,在具有水分之大氣中將形成有表面層之基材加熱,可促進水解性矽基水解成矽烷醇基之水解反應、基材表面之羥基等與矽烷醇基之反應、藉由矽烷醇基之縮合反應而生成矽氧烷鍵等反應。 表面處理後,可視需求去除既為表面層中之化合物且未與其他化合物或基材行化學鍵結的化合物。具體方法可列舉如對表面層沖洗溶劑之方法、以浸潤過溶劑之布擦拭之方法等。<Post-treatment> In order to improve the friction resistance of the surface layer, operations to promote the reaction between compound (A) and compound (B) and the base material can be performed as needed. This operation includes heating, humidification, light irradiation, etc. For example, heating a substrate with a surface layer formed in an atmosphere containing moisture can promote the hydrolysis reaction of hydrolyzable silicon groups into silanol groups, and the reaction of hydroxyl groups on the surface of the substrate with silanol groups. The condensation reaction of radicals produces siloxane bonds and other reactions. After surface treatment, compounds that are compounds in the surface layer and are not chemically bonded with other compounds or the substrate can be removed if necessary. Specific methods include rinsing the surface layer with solvent, wiping with a cloth soaked in solvent, etc.

[作用效果] 本組成物及本塗佈液含有化合物(A)及化合物(B),因此可形成潤滑性及耐久性優異的表面層。即,藉由使用本組成物或本塗佈液於基材表面形成表面層,可賦予優異的初始潤滑性、撥水撥油性等特性,同時可獲得即使該表面經反覆摩擦該等特性也不易降低之優異的耐久性。又,即使表面經反覆摩擦,撥水撥油性也不易降低,因此可獲得可輕易去除基材表面之指紋污垢的性能(指紋污垢去除性)。 化合物(A)於A鏈含有(CF2 O)單元,故潤滑性佳。另一方面,比起不含(CF2 O)單元之情況,耐久性較差。化合物(B)於B鏈不含(CF2 O)單元,故耐久性佳。另一方面,比起含有(CF2 O)單元之情況,潤滑性較差。故將該等組合時,可充分維持各自的優異特性,兼具良好的潤滑性及耐久性。關於該理由,吾等認為是因為潤滑性高的成分(化合物(A))分散了磨耗之力,從而提高耐久性高之成分(化合物(B))的耐久性。[Function and effect] This composition and this coating liquid contain compound (A) and compound (B), and therefore can form a surface layer excellent in lubricity and durability. That is, by using the present composition or the present coating liquid to form a surface layer on the surface of a substrate, it is possible to impart excellent initial lubricity, water and oil repellency and other properties, and at the same time, it is possible to obtain such properties that are not easy to maintain even if the surface is repeatedly rubbed. Reduced excellent durability. In addition, even if the surface is repeatedly rubbed, the water- and oil-repellent properties are not easily reduced, so the performance of easily removing fingerprint stains on the surface of the base material (fingerprint stain removal performance) can be obtained. Compound (A) contains a (CF 2 O) unit in the A chain, so it has good lubricity. On the other hand, the durability is worse than the case without (CF 2 O) unit. Compound (B) does not contain (CF 2 O) units in the B chain, so it has good durability. On the other hand, compared with the case containing (CF 2 O) unit, the lubricity is poorer. Therefore, when these are combined, the excellent characteristics of each can be fully maintained, and both good lubricity and durability can be achieved. The reason for this is believed to be that the component with high lubricity (compound (A)) disperses the force of wear, thereby improving the durability of the component with high durability (compound (B)).

[用途] 因此,依上述製得之具有表面層的基材適合作為構成觸控面板的構件。 惟,本組成物、本塗佈液及物品之用途不限於觸控面板。譬如,可用於觸控面板以外之顯示輸入裝置;透明的玻璃製或透明塑膠製(丙烯酸、聚碳酸酯等)構件的表面保護塗料、廚房用防污塗料;電子機器、熱交換器、電池等撥水防濕塗料或防污塗料、浴廁用防污塗料;用於需要傳導並同時撥液之構件上的塗料;熱交換機之撥水、防水、滑水塗料;振動篩或氣缸內部等之表面低摩擦塗料等。 較具體的使用例可舉如顯示器之前面保護板、抗反射板、偏光板、防眩板或於該等表面施行有抗反射膜處理之物、行動電話、攜帶式資訊端末等機器之觸控面板板件或觸控面板顯示器等具有可以人的手指或手掌在畫面上進行操作之顯示輸入裝置的各種機器、廁所、浴室、洗手台、廚房等水槽的裝飾建材、配線板用防水塗佈熱交換機之撥水防水塗料、太陽電池之撥水塗料、印刷配線板之防水撥水塗料、電子機器殼體或電子零件用之防水撥水塗料、輸電線之絕緣性提升塗料、各種濾器之防水撥水塗料、電波吸收材或吸音材之防水性塗料、浴室、廚房機器、浴廁用防污塗料、熱交換機之撥水、防水、滑水塗料、振動篩或氣缸內部等之表面低摩擦塗料、機械零件、真空機器零件、軸承零件、汽車零件、工具等之表面保護塗料等。 實施例[Application] Therefore, the base material having a surface layer prepared as described above is suitable as a member constituting a touch panel. However, the uses of this composition, this coating liquid and articles are not limited to touch panels. For example, it can be used for display input devices other than touch panels; surface protective coatings for transparent glass or transparent plastic (acrylic, polycarbonate, etc.) components, kitchen antifouling coatings; electronic equipment, heat exchangers, batteries, etc. Water-repellent and moisture-repellent coatings or anti-fouling coatings, anti-fouling coatings for bathrooms and toilets; coatings used on components that need to be conductive and liquid-repellent at the same time; water-repellent, waterproof, and hydrophobic coatings for heat exchangers; surfaces of vibrating screens or inside cylinders, etc. Low friction coatings, etc. More specific examples of use include display front protection panels, anti-reflective panels, polarizing panels, anti-glare panels, or items with anti-reflective coatings on these surfaces, as well as touch controls on mobile phones, portable information terminals, etc. Waterproof coating thermal insulation for various machines such as panel panels or touch panel monitors that have display input devices that can be operated on the screen with human fingers or palms, decorative building materials for toilets, bathrooms, sinks, kitchens and other sinks, and wiring boards Water-repellent and waterproof coatings for switches, water-repellent coatings for solar cells, waterproof and water-repellent coatings for printed wiring boards, waterproof and water-repellent coatings for electronic machine casings or electronic parts, insulation-improving coatings for transmission lines, waterproof and water-repellent coatings for various filters Water coatings, waterproof coatings for radio wave absorbing materials or sound-absorbing materials, antifouling coatings for bathrooms, kitchen machines, bathrooms and toilets, water-repellent, waterproof, hydrophobic coatings for heat exchangers, low-friction coatings for surfaces such as vibrating screens or cylinder interiors, Surface protective coatings for mechanical parts, vacuum machine parts, bearing parts, automobile parts, tools, etc. Example

以下,以實施例詳細說明本發明,惟本發明不受該等限定。以下,符號「%」在未特別說明之前提下,表示「質量%」。 例1~5、7~11、13~17、19~23、25~29、42~49、52~59、61~65為實施例,例6、12、18、24、30~41、50~51、60、66~67為比較例。Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited thereto. Hereinafter, the symbol "%" means "mass %" unless otherwise specified. Examples 1~5, 7~11, 13~17, 19~23, 25~29, 42~49, 52~59, 61~65 are examples, Examples 6, 12, 18, 24, 30~41, 50 ~51, 60, 66~67 are comparative examples.

[物性及評估] (數量平均分子量) 含氟醚化合物之數量平均分子量係藉由1 H-NMR及19 F-NMR,以末端基為基準求出氧全氟伸烷基數(平均值)來算出。末端基譬如為基(I)或基(II)。[Physical Properties and Evaluation] (Number Average Molecular Weight) The number average molecular weight of the fluorine-containing ether compound is calculated by using 1 H-NMR and 19 F-NMR to determine the number (average) of oxygen perfluoroalkyl groups based on the terminal group. . Terminal groups are, for example, radical (I) or radical (II).

(水接觸角) 使用接觸角測定裝置(協和界面科學公司製、DM-701),在20℃下測定停留在表面層表面之約2μL之蒸餾水的接觸角(水接觸角)。在表面層表面上不同的5處進行測定並算出其平均值。接觸角之算出採用2θ法。水接觸角愈大,撥水性愈佳。(Water Contact Angle) The contact angle (water contact angle) of approximately 2 μL of distilled water remaining on the surface of the surface layer was measured at 20° C. using a contact angle measuring device (DM-701 manufactured by Kyowa Interface Science Co., Ltd.). Measurements were made at 5 different locations on the surface of the surface layer and the average value was calculated. The contact angle is calculated using the 2θ method. The larger the water contact angle, the better the water repellency.

(潤滑性) 使用負載變動型摩擦磨耗試驗系統(新東科學公司製、HHS2000),在接觸面積:3cm×3cm且負載:0.98N之條件下測定表面層對人工皮膚(出光精密科技公司製、PBZ13001)的動摩擦係數。動摩擦係數愈小,則潤滑性愈佳。(Lubricity) Using a load-fluctuating friction and wear test system (HHS2000 manufactured by Shinto Scientific Co., Ltd.), the surface layer's resistance to artificial skin (manufactured by Idemitsu Precision Technology Co., Ltd.) was measured under the conditions of contact area: 3cm×3cm and load: 0.98N. PBZ13001) dynamic friction coefficient. The smaller the dynamic friction coefficient, the better the lubricity.

(耐久性1(接觸角100°以上的維持次數)) 針對表面層,依據JIS L0849:2013(ISO 105-X12:2001)使用往復式移動摩擦試驗機(KNT公司製)在壓力98.07kPa、速度320cm/分鐘下使Bonstar鋼絲絨(#0000)往復。每往復千次即測定水接觸角,求出可維持水接觸角100°以上的上限次數(接觸角100°以上的維持次數)。該次數愈多,表面層愈不易因摩擦而受損,耐久性愈佳。(Durability 1 (number of times the contact angle is maintained at 100° or more)) For the surface layer, a reciprocating friction testing machine (manufactured by KNT Corporation) was used in accordance with JIS L0849:2013 (ISO 105-X12:2001) at a pressure of 98.07kPa and a speed of Reciprocate Bonstar steel wool (#0000) at 320cm/min. The water contact angle is measured every thousand times of reciprocation, and the upper limit of the number of times the water contact angle can be maintained at 100° or above is determined (the number of times the contact angle is maintained at 100° or above). The greater the number of times, the less likely the surface layer is to be damaged by friction and the better the durability.

(耐久性2(動摩擦係數的降低難度)) 在前述<耐久性1>之條件下使Bonstar鋼絲絨往復3千次後,在與前述<潤滑性>相同條件下測定動摩擦係數。動摩擦係數變化愈小,最表面愈不易因摩擦而受損,耐久性愈佳。(Durability 2 (difficulty in reducing the dynamic friction coefficient)) After reciprocating Bonstar steel wool 3,000 times under the above-mentioned <Durability 1> conditions, the dynamic friction coefficient was measured under the same conditions as the above-mentioned <Lubricity>. The smaller the change in the dynamic friction coefficient, the less likely the outermost surface is to be damaged by friction and the better the durability.

[原料] (A-1):後述製造例A-1中所得組成物(A-1)。 (A-2):後述製造例A-2中所得組成物(A-2)。 (A-3):後述製造例A-3中所得化合物(A-3)。 (A-4):後述製造例A-4中所得化合物(A-4)。 (A-5):後述製造例A-5中所得化合物(A-5)。[Raw materials] (A-1): Composition (A-1) obtained in Production Example A-1 described below. (A-2): Composition (A-2) obtained in Production Example A-2 described below. (A-3): Compound (A-3) obtained in Production Example A-3 described below. (A-4): Compound (A-4) obtained in Production Example A-4 described below. (A-5): Compound (A-5) obtained in Production Example A-5 described below.

(B-1):後述製造例B-1中所得化合物(B-1)。 (B-2):後述製造例B-2中所得組成物(B-2)。 (B-3):後述製造例B-3中所得化合物(B-3)。 (B-4):後述製造例B-4中所得化合物(B-4)。 (B-5):後述製造例B-5中所得化合物(B-5)。 (B-6):餾去Dow Corning Toray Co. Ltd.製「2634 Coating」之溶劑後再行使用。CF3 CF2 CF2 O(CF2 CF2 CF2 O)21 CF2 CF2 CH2 OCH2 CH2 CH2 Si(OCH3 )3(B-1): Compound (B-1) obtained in Production Example B-1 described below. (B-2): Composition (B-2) obtained in Production Example B-2 described below. (B-3): Compound (B-3) obtained in Production Example B-3 described below. (B-4): Compound (B-4) obtained in Production Example B-4 described below. (B-5): Compound (B-5) obtained in Production Example B-5 described below. (B-6): Distill off the solvent of "2634 Coating" manufactured by Dow Corning Toray Co. Ltd. before use. CF 3 CF 2 CF 2 O(CF 2 CF 2 CF 2 O) 21 CF 2 CF 2 CH 2 OCH 2 CH 2 CH 2 Si(OCH 3 ) 3 .

(C-1):CF3 O{(CF2 O)r1 (CF2 CF2 O)r2 }CF3 所示含氟醚化合物(r1/r2=20/21)(Solvay Solexis公司製「FOMBLIN M03」)。(C-1): Fluorine-containing ether compound represented by CF 3 O {(CF 2 O) r1 (CF 2 CF 2 O) r2 }CF 3 (r1/r2=20/21) (manufactured by Solvay Solexis Co., Ltd. "FOMBLIN M03 ”).

前述(A-1)~(A-5)、(B-1)~(B-5)、(C-1)具有之聚(氧全氟伸烷基)鏈的重複單元、聚(氧全氟伸烷基)鏈數量(以下亦表記為PEPE數量)、基(I)數及數量平均分子量(Mn)列於表1。 另,(A-1)~(A-5)及(C-1)中之重複單元「(CF2 O)(CF2 CF2 O)」表示(CF2 O)單元與(CF2 CF2 O)單元無規配置而成的聚(氧全氟伸烷基)鏈。The aforementioned (A-1)~(A-5), (B-1)~(B-5), and (C-1) have a repeating unit of a poly(oxyperfluoroalkylene) chain, a poly(oxyperfluoroalkylene) chain, The number of fluoroalkylene) chains (hereinafter also expressed as the number of PEPE), the number of groups (I) and the number average molecular weight (Mn) are listed in Table 1. In addition, the repeating unit "(CF 2 O)(CF 2 CF 2 O)" in (A-1) ~ (A-5) and (C-1) means the (CF 2 O) unit and (CF 2 CF 2 A poly(oxyperfluoroalkylene) chain composed of randomly arranged O) units.

[表1] [Table 1]

[製造例A-1] 於300mL之3口燒瓶放入24%KOH水溶液24.4g、三級丁醇33g、化合物(1)(Solvay Solexis公司製、FLUOROLINK(註冊商標)D4000)220g,並添加CF3 CF2 CF2 -O-CF=CF2 (東京化成工業公司製)19.4g。在氮氣環境下,於60℃下攪拌8小時。以稀釋鹽酸水溶液洗淨1次後回收有機相,再以蒸發器進行濃縮而獲得粗產物233g。將粗產物展開於矽膠管柱層析儀,進行分餾。展開溶劑係依序使用了C6 F13 CH2 CH3 (旭硝子公司製、AC-6000)、AC-6000/CF3 CH2 OCF2 CF2 H(旭硝子公司製、AE-3000)=1/2(質量比)、AE-3000/乙酸乙酯=9/1(質量比)。針對各分液,從1 H-NMR及19 F-NMR之積分值求出末端基之結構及構成單元之單元數(x1、x2)的平均值。可知,粗產物中分別含有42莫耳%之化合物(2)、49莫耳%之化合物(3)及9莫耳%之化合物(1)。而獲得化合物(2)98.6g(產率:44.8%)及化合物(3)51.9g(產率:23.6%)。 HO-CH2 -(CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 -OH…(1) CF3 CF2 CF2 -O-CHFCF2 OCH2 -(CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 -OH…(2) CF3 CF2 CF2 -O-CHFCF2 OCH2 -(CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 OCF2 CHF-O-CF2 CF2 CF3 …(3) 化合物(2):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,150。 化合物(3):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,420。[Production Example A-1] In a 300 mL 3-neck flask, 24.4 g of 24% KOH aqueous solution, 33 g of tertiary butanol, and 220 g of compound (1) (FLUOROLINK (registered trademark) D4000, manufactured by Solvay Solexis) were placed, and CF was added 3 CF 2 CF 2 -O-CF=CF 2 (manufactured by Tokyo Chemical Industry Co., Ltd.) 19.4 g. Stir at 60°C for 8 hours under nitrogen atmosphere. After washing once with dilute hydrochloric acid aqueous solution, the organic phase was recovered, and then concentrated with an evaporator to obtain 233 g of crude product. The crude product was developed on a silica column chromatograph and fractionated. The developing solvent system used C 6 F 13 CH 2 CH 3 (AC-6000, manufactured by Asahi Glass Co., Ltd.), AC-6000/CF 3 CH 2 OCF 2 CF 2 H (AE-3000, manufactured by Asahi Glass Co., Ltd.) = 1/ 2 (mass ratio), AE-3000/ethyl acetate = 9/1 (mass ratio). For each liquid separation, the average value of the structure of the terminal group and the number of units (x1, x2) of the structural units was determined from the integrated values of 1 H-NMR and 19 F-NMR. It can be seen that the crude product contains 42 mol% of compound (2), 49 mol% of compound (3) and 9 mol% of compound (1) respectively. And 98.6 g of compound (2) (yield: 44.8%) and 51.9 g of compound (3) (yield: 23.6%) were obtained. HO-CH 2 -(CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 -OH…(1) CF 3 CF 2 CF 2 -O-CHFCF 2 OCH 2 -(CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 -OH…(2) CF 3 CF 2 CF 2 -O-CHFCF 2 OCH 2 -( CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 OCF 2 CHF-O-CF 2 CF 2 CF 3 …(3) Compound (2): Number of units x1 The average value is 21, the average number of units x2 is 20, and the number average molecular weight is 4,150. Compound (3): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,420.

於100mL茄形燒瓶放入化合物(2)30.0g、氟化鈉粉末0.9g、二氯五氟丙烷(旭硝子公司製、AK-225)30g,並添加CF3 CF2 CF2 OCF(CF3 )COF 3.5g。在氮氣環境下,於50℃下攪拌24小時。以加壓過濾器去除氟化鈉粉末後,減壓餾去過剩的CF3 CF2 CF2 OCF(CF3 )COF及AK-225。以C6 F13 H(旭硝子公司製、AC-2000)稀釋所得粗產物並使其通過矽膠管柱,以蒸餾器將回收之溶液濃縮後獲得化合物(4)31.8g(產率98.8%)。 CF3 CF2 CF2 -O-CHFCF2 OCH2 -(CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 -OCOCF(CF3 )OCF2 CF2 CF3 …(4) 化合物(4):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,460。In a 100 mL eggplant-shaped flask, 30.0 g of compound (2), 0.9 g of sodium fluoride powder, and 30 g of dichloropentafluoropropane (AK-225 manufactured by Asahi Glass Co., Ltd.) were placed, and CF 3 CF 2 CF 2 OCF (CF 3 ) was added. COF 3.5g. Stir at 50°C for 24 hours under nitrogen atmosphere. After removing the sodium fluoride powder with a pressure filter, the excess CF 3 CF 2 CF 2 OCF (CF 3 ) COF and AK-225 were distilled off under reduced pressure. The obtained crude product was diluted with C 6 F 13 H (AC-2000 manufactured by Asahi Glass Co., Ltd.) and passed through a silica column. The recovered solution was concentrated with a distiller to obtain 31.8 g of compound (4) (yield 98.8%). CF 3 CF 2 CF 2 -O-CHFCF 2 OCH 2 -(CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 -OCOCF(CF 3 )OCF 2 CF 2 CF 3 ...(4) Compound (4): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,460.

於1L鎳製高壓釜的氣體出口直列設置經保持在20℃之冷卻器、NaF粒充填層及經保持在0℃之冷卻器。並設置液體回送管路,該液體回送管路可使來自經保持在0℃之冷卻器的已凝聚液返回高壓釜。 於高壓釜中投入ClCF2 CFClCF2 OCF2 CF2 Cl(以下亦表記為CFE-419)750g,保持在25℃並同時進行攪拌。於高壓釜中在25℃下噴入1小時的氮氣後,在25℃、流速2.0L/小時下噴入1小時的20%氟氣。在相同流速下噴吹20%氟氣,同時耗4.3小時於高壓釜注入124g之CFE-419中溶解有化合物(4)31.0g的溶液。在相同流速下噴吹20%氟氣,同時將高壓釜內壓加壓至0.15MPa(錶壓)。於高壓釜內一邊從25℃加熱至40℃並一邊注入CFE-419中含有苯0.05g/mL之苯溶液4mL後,關閉高壓釜之苯溶液注入口。攪拌15分鐘後,於保持40℃下再次注入苯溶液4mL,然後關閉注入口。同樣的操作進一步重複3次。苯之注入總量為0.17g。在相同流速下噴吹20%氟氣並持續攪拌1小時。使高壓釜內之壓力成為大氣壓,並噴吹氮氣1小時。以蒸餾器濃縮高壓釜之內容物而獲得化合物(5)31.1g(產率98.5%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }(CF2 CF2 O)-COCF(CF3 )OCF2 CF2 CF3 …(5) 化合物(5):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,550。A cooler maintained at 20°C, a NaF particle filling layer, and a cooler maintained at 0°C were installed inline at the gas outlet of the 1L nickel autoclave. And a liquid return pipeline is provided, which can return the condensed liquid from the cooler maintained at 0°C to the autoclave. 750 g of ClCF 2 CFClCF 2 OCF 2 CF 2 Cl (hereinafter also referred to as CFE-419) was put into the autoclave and stirred while maintaining the temperature at 25°C. After nitrogen gas was sprayed into the autoclave at 25°C for 1 hour, 20% fluorine gas was sprayed into the autoclave at 25°C and a flow rate of 2.0 L/hour for 1 hour. 20% fluorine gas was sprayed at the same flow rate, and a solution containing 31.0 g of compound (4) dissolved in 124 g of CFE-419 was injected into the autoclave over 4.3 hours. Inject 20% fluorine gas at the same flow rate, and at the same time pressurize the internal pressure of the autoclave to 0.15MPa (gauge pressure). While heating from 25°C to 40°C in the autoclave, 4 mL of a benzene solution containing 0.05g/mL benzene in CFE-419 was injected, and then the benzene solution injection port of the autoclave was closed. After stirring for 15 minutes, another 4 mL of benzene solution was injected while maintaining 40°C, and then the injection port was closed. The same operation is further repeated 3 times. The total amount of benzene injected was 0.17g. Spray 20% fluorine gas at the same flow rate and continue stirring for 1 hour. The pressure in the autoclave was brought to atmospheric pressure, and nitrogen was blown for 1 hour. The contents of the autoclave were concentrated using a distiller to obtain 31.1 g of compound (5) (yield 98.5%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }(CF 2 CF 2 O)-COCF(CF 3 )OCF 2 CF 2 CF 3 …(5) Compound (5): The average value of the number of units x1 is 21, the average value of the number of units x2 is 20, and the number average molecular weight is 4,550.

於四氟乙烯-全氟(烷氧基乙烯基醚)共聚物(以下亦表記為PFA)製圓底燒瓶中放入化合物(5)30.0g及AK-225 60g。以冰浴冷卻並同時攪拌,並在氮氣環境下從滴下漏斗徐緩地滴下甲醇2.0g。一邊以氮起泡一邊攪拌12小時。以蒸發器將反應混合物濃縮而獲得化合物(6)27.6g(產率98.8%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -COOCH3 …(6) 化合物(6):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,230。30.0 g of compound (5) and 60 g of AK-225 were placed in a round-bottomed flask made of tetrafluoroethylene-perfluoro(alkoxyvinyl ether) copolymer (hereinafter also referred to as PFA). Cool in an ice bath while stirring, and slowly drop 2.0 g of methanol from a dropping funnel under a nitrogen atmosphere. The mixture was stirred for 12 hours while bubbling with nitrogen. The reaction mixture was concentrated with an evaporator to obtain 27.6 g of compound (6) (yield 98.8%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -COOCH 3 …(6) Compounds (6): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,230.

在100mL之3口茄形燒瓶內使氯化鋰0.18g溶解於乙醇18.3g中。於其中加入化合物(6)25.0g,以冰浴冷卻並同時徐緩地滴下乙醇22.5g中溶解有硼氫化鈉0.75g之溶液。解除冰浴,徐緩地升溫至室溫同時持續攪拌。在室溫下攪拌12小時後,滴下鹽酸水溶液直到液性成為酸性為止。添加AC-2000 20mL,以水洗淨1次並以飽和食鹽水洗淨1次後回收有機相。以蒸餾器將回收之有機相濃縮而獲得化合物(7)24.6g(產率99.0%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 OH…(7) 化合物(7):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,200。In a 100 mL 3-neck eggplant-shaped flask, 0.18 g of lithium chloride was dissolved in 18.3 g of ethanol. 25.0 g of compound (6) was added thereto, and a solution of 0.75 g of sodium borohydride dissolved in 22.5 g of ethanol was slowly dropped while cooling in an ice bath. Remove the ice bath and slowly bring the temperature to room temperature while continuing to stir. After stirring at room temperature for 12 hours, the hydrochloric acid aqueous solution was dropped until the liquid became acidic. 20 mL of AC-2000 was added, washed once with water and once with saturated brine, and the organic phase was recovered. The recovered organic phase was concentrated with a distiller to obtain 24.6 g of compound (7) (yield 99.0%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 OH…(7) Compound (7): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,200.

於100mL之2口茄形燒瓶加入化合物(7)20.0g、硫酸氫四丁銨0.21g、BrCH2 CH=CH2 1.76g及30%氫氧化鈉水溶液2.6g,在60℃下攪拌8小時。反應結束後添加20g之AC-2000,並以稀釋鹽酸水溶液洗淨1次後回收有機相。使回收之有機相通過矽膠管柱並以蒸餾器將所回收之溶液濃縮而獲得化合物(8)19.8g(產率98.2%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 OCH2 CH=CH2 …(8) 化合物(8):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,250。Add 20.0 g of compound (7), 0.21 g of tetrabutylammonium hydrogen sulfate, 1.76 g of BrCH 2 CH=CH 2 and 2.6 g of 30% sodium hydroxide aqueous solution into a 100 mL 2-neck eggplant-shaped flask, and stir at 60°C for 8 hours. After the reaction, 20 g of AC-2000 was added, washed once with dilute hydrochloric acid aqueous solution, and then the organic phase was recovered. The recovered organic phase was passed through a silica gel column and the recovered solution was concentrated with a distiller to obtain 19.8 g of compound (8) (yield 98.2%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 OCH 2 CH=CH 2 ...(8) Compound (8): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,250.

於100mL之PFA製茄形燒瓶放入化合物(8)5.0g、鉑/1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物的二甲苯溶液(鉑含量:2%)0.005g、HSi(OCH3 )3 0.25g、二甲亞碸0.005g及1,3-雙(三氟甲基)苯(東京化成工業公司製)0.20g,在40℃下攪拌4小時。反應結束後減壓餾去溶劑等,以孔徑0.2μm之膜濾器過濾而獲得組成物(A-1)4.9g(產率95%),該組成物(A-1)係由化合物(8)之1個烯丙基被矽氫化的化合物(9)、及化合物(8)之1個烯丙基異構化成內烯烴(-CH=CHCH3 )的副產物構成。矽氫化之轉化率為100%,無化合物(8)殘留。矽氫化之選擇率為95%。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 OCH2 CH2 CH2 -Si(OCH3 )3 …(9)In a 100 mL eggplant-shaped flask made of PFA, 5.0 g of compound (8) and a xylene solution of platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex ( Platinum content: 2%) 0.005g, HSi(OCH 3 ) 3 0.25g, dimethyl sulfoxide 0.005g and 1,3-bis(trifluoromethyl)benzene (Tokyo Chemical Industry Co., Ltd.) 0.20g, at 40°C Stir for 4 hours. After the reaction, the solvent and the like were distilled off under reduced pressure, and filtered through a membrane filter with a pore size of 0.2 μm to obtain 4.9 g of composition (A-1) (yield 95%). This composition (A-1) is composed of compound (8) It consists of compound (9) in which one allyl group is hydrosilylated, and a by-product of compound (8) in which one allyl group is isomerized into an internal olefin (-CH=CHCH 3 ). The conversion rate of hydrosilation is 100%, and no compound (8) remains. The selectivity of hydrogenation is 95%. CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 OCH 2 CH 2 CH 2 -Si(OCH 3 ) 3 …(9)

化合物(9)之NMR譜;1 H-NMR(300.4MHz、溶劑:CDCl3 、基準:TMS)δ(ppm):0.7(6H)、1.7(6H)、3.6(11H)、3.8(2H)。19 F-NMR(282.7MHz、溶劑:CDCl3 、基準:C6 F6 ) δ(ppm):-52.4~-55.8(42F)、-78.2(1F)、-80.2(1F)、-82.2(3F)、-89.4~-91.1(90F)、-130.5(2F)。 單元數x1之平均值:21,單元數x2之平均值:20,化合物(9)之數量平均分子量:4,370。NMR spectrum of compound (9); 1 H-NMR (300.4MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (6H), 1.7 (6H), 3.6 (11H), 3.8 (2H). 19 F-NMR (282.7MHz, solvent: CDCl 3 , standard: C 6 F 6 ) δ (ppm): -52.4~-55.8(42F), -78.2(1F), -80.2(1F), -82.2(3F ), -89.4~-91.1(90F), -130.5(2F). The average value of the number of units x1: 21, the average value of the number of units x2: 20, and the number average molecular weight of compound (9): 4,370.

[製造例A-2] 於100mL之2口茄形燒瓶放入製造例A-1中所得化合物(7)20.0g、1,3-雙(三氟甲基)苯(東京化成工業公司製)20.0g、CF3 SO2 Cl(和光純藥工業公司製)1.01g及三乙胺1.00g,於氮氣環境下在室溫下攪拌4小時。反應結束後添加15g之AK-225,並以水及飽和食鹽水各洗淨1次後回收有機相。以蒸餾器將回收之有機相濃縮而獲得化合物(10)20.3g(產率99%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 OSO2 CF3 …(10) 化合物(10):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,340。[Production Example A-2] In a 100 mL 2-neck eggplant-shaped flask, 20.0 g of the compound (7) obtained in Production Example A-1 and 1,3-bis(trifluoromethyl)benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) were placed 20.0g, 1.01g of CF 3 SO 2 Cl (manufactured by Wako Pure Chemical Industries, Ltd.) and 1.00g of triethylamine were stirred at room temperature under a nitrogen atmosphere for 4 hours. After the reaction, 15 g of AK-225 was added, and the mixture was washed once with water and saturated brine, and then the organic phase was recovered. The recovered organic phase was concentrated using a distiller to obtain 20.3 g of compound (10) (yield 99%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 OSO 2 CF 3 … (10) Compound (10): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,340.

於50mL茄形燒瓶內放入化合物(10)15.0g、1,3-雙(三氟甲基)苯(東京化成工業公司製)15.0g、HN(CH2 CH=CH2 )2 (東京化成工業公司製)2.27g及三乙胺0.68g,於氮氣環境下在90℃下攪拌24小時。反應結束後添加15g之AK-225,並以水及飽和食鹽水各洗淨1次且回收有機相後,與矽膠1.5g混合再以濾器過濾並回收有機相。以蒸餾器將回收之有機相濃縮而獲得化合物(11)14.4g(產率98%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 -N(CH2 CH=CH2 )2 …(11) 化合物(11):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,280。15.0 g of compound (10), 15.0 g of 1,3-bis(trifluoromethyl)benzene (manufactured by Tokyo Chemical Industry Co., Ltd.), and HN (CH 2 CH=CH 2 ) 2 (Tokyo Chemical Industry Co., Ltd.) were placed in a 50 mL eggplant-shaped flask. Industrial Co., Ltd.) 2.27g and triethylamine 0.68g, stirred at 90°C for 24 hours in a nitrogen atmosphere. After the reaction, add 15g of AK-225, wash once with water and saturated brine once and recover the organic phase, mix with 1.5g of silica gel, filter with a filter and recover the organic phase. The recovered organic phase was concentrated using a distiller to obtain 14.4 g of compound (11) (yield 98%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 -N(CH 2 CH=CH 2 ) 2 ...(11) Compound (11): The average number of units x1 is 21, the average number of units x2 is 20, and the number average molecular weight is 4,280.

於100mL之PFA製茄形燒瓶放入化合物(11)12.0g、鉑/1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物的二甲苯溶液(鉑含量:2%)0.03g、HSi(OCH3 )3 1.3g、二甲亞碸0.01g及1,3-雙(三氟甲基)苯(東京化成工業公司製)0.5g,在40℃下攪拌10小時。反應結束後減壓餾去溶劑等,以孔徑0.2μm之膜濾器過濾而獲得組成物(A-2)11.9g(產率92%),該組成物(A-2)係由化合物(11)之2個烯丙基被矽氫化的化合物(12)、及化合物(11)之2個烯丙基在分子內環化而生成的副產物構成。矽氫化之轉化率為100%,無化合物(11)殘留。矽氫化之選擇率為81%。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -CH2 -N[CH2 CH2 CH2 -Si(OCH3 )32 …(12)In a 100 mL eggplant-shaped flask made of PFA, 12.0 g of compound (11) and a xylene solution of platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex ( Platinum content: 2%) 0.03g, HSi(OCH 3 ) 3 1.3g, dimethyl sulfoxide 0.01g and 1,3-bis(trifluoromethyl)benzene (Tokyo Chemical Industry Co., Ltd.) 0.5g, at 40°C Stir for 10 hours. After the reaction, the solvent and the like were distilled off under reduced pressure, and filtered through a membrane filter with a pore size of 0.2 μm to obtain 11.9 g of composition (A-2) (yield 92%). This composition (A-2) is composed of compound (11) It consists of compound (12) in which two allyl groups are hydrosilylated, and a by-product produced by intramolecular cyclization of two allyl groups in compound (11). The conversion rate of hydrosilation is 100%, and no compound (11) remains. The selectivity of hydrosilation is 81%. CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -CH 2 -N[CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 ] 2 …(12)

化合物(12)之NMR譜;1 H-NMR(300.4MHz、溶劑:CDCl3 、基準:TMS)δ(ppm):0.7(4H)、1.6(4H)、2.6(4H)、3.1(2H)、3.6(18H)。19 F-NMR(282.7MHz、溶劑:CDCl3 、基準:CFCl3 )δ(ppm):-52.4~-55.7(42F)、-74.4(1F)、-76.6(1F)、-82.2(3F)、-89.4~-91.1(90F)、-130.5(2F)。 單元數x1之平均值:21,單元數x2之平均值:20,化合物(12)之數量平均分子量:4,530。NMR spectrum of compound (12); 1 H-NMR (300.4MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (4H), 1.6 (4H), 2.6 (4H), 3.1 (2H), 3.6(18H). 19 F-NMR (282.7MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -52.4~-55.7(42F), -74.4(1F), -76.6(1F), -82.2(3F), -89.4~-91.1(90F), -130.5(2F). The average value of the number of units x1: 21, the average value of the number of units x2: 20, and the number average molecular weight of compound (12): 4,530.

[製造例A-3] 於50mL茄形燒瓶放入製造例A-1中所得化合物(6)5.0g及H2 N-CH2 -C(CH2 CH=CH2 )3 0.2g並攪拌12小時。從NMR確認化合物(6)全部轉換成化合物(13)。且,有生成出副產物之甲醇。以9.0g之AE-3000將所得溶液稀釋後以矽膠管柱層析儀(展開溶劑:AE-3000)純化而獲得化合物(13)4.4g(產率85%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -C(O)NH-CH2 -C(CH2 CH=CH2 )3 …(13) 化合物(13):單元數x1之平均值21,單元數x2之平均值20,數量平均分子量4,360。[Production Example A-3] 5.0 g of the compound (6) obtained in Production Example A-1 and 0.2 g of H 2 N-CH 2 -C (CH 2 CH=CH 2 ) 3 were placed in a 50 mL eggplant-shaped flask and stirred for 12 hours. It was confirmed from NMR that all of compound (6) was converted into compound (13). Furthermore, methanol is produced as a by-product. The resulting solution was diluted with 9.0 g of AE-3000 and purified with a silica gel column chromatograph (developing solvent: AE-3000) to obtain 4.4 g of compound (13) (yield 85%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -C(O)NH-CH 2 -C(CH 2 CH=CH 2 ) 3 ...(13) Compound (13): The average value of the number of units x1 is 21, the average value of the number of units x2 is 20, and the number average molecular weight is 4,360.

於10mL之PFA製試樣管放入化合物(13)4g、鉑/1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物的二甲苯溶液(鉑含量:2%)0.4mg、HSi(OCH3 )3 0.33g、二甲亞碸0.01g、1,3-雙(三氟甲基)苯(東京化成工業公司製)0.2g並在40℃下攪拌10小時。反應結束後減壓餾去溶劑等並以1.0μm孔徑之膜濾器過濾而獲得化合物(A-3)4.3g(產率100%)。 CF3 CF2 CF2 -O-(CF2 CF2 O)(CF2 CF2 O){(CF2 O)x1 (CF2 CF2 O)x2 }-CF2 -C(O)NH-CH2 -C[CH2 CH2 CH2 -Si(OCH3 )3 ]3 …(A-3)Put 4 g of compound (13) and a xylene solution of platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum) into a 10 mL PFA sample tube. Content: 2%) 0.4 mg, HSi(OCH 3 ) 3 0.33 g, dimethyl sulfoxide 0.01 g, 1,3-bis(trifluoromethyl)benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.2 g and at 40°C Stir for 10 hours. After the reaction, the solvent and the like were distilled off under reduced pressure and filtered through a membrane filter with a pore size of 1.0 μm to obtain 4.3 g of compound (A-3) (yield 100%). CF 3 CF 2 CF 2 -O-(CF 2 CF 2 O)(CF 2 CF 2 O){(CF 2 O) x1 (CF 2 CF 2 O) x2 }-CF 2 -C(O)NH-CH 2 -C[CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 ] 3 …(A-3)

化合物(A-3)之NMR譜:1 H-NMR(300.4MHz、溶劑:CDCl3 、基準:TMS)δ(ppm):0.75(6H)、1.3~1.6(12H)、3.4(2H)、3.7(27H)。19 F-NMR(282.7MHz、溶劑:CDCl3 、基準:CFCl3 )δ(ppm):-52.4~-55.8(42F)、-82.2(3F)、-89.4~-91.1(92F)、-130.8(2F)。 單元數x1之平均值:21,單元數x2之平均值:20,化合物(A-3)之數量平均分子量:4,720。NMR spectrum of compound (A-3): 1 H-NMR (300.4MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.75 (6H), 1.3~1.6 (12H), 3.4 (2H), 3.7 (27H). 19 F-NMR (282.7MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -52.4~-55.8(42F), -82.2(3F), -89.4~-91.1(92F), -130.8( 2F). The average value of the number of units x1: 21, the average value of the number of units x2: 20, and the number average molecular weight of the compound (A-3): 4,720.

[製造例A-4] 於300mL之3口燒瓶內放入二新戊四醇(ACROS公司製)15.0g、48%NaOH水溶液29.5g、二甲亞碸150g。加熱至40℃並添加5-溴-1-戊烯(東京化成工業公司製)39.5g後,攪拌4小時。以稀鹽酸水溶液洗淨1次後,添加環戊基甲基醚200g,回收有機相。以蒸餾器將回收之溶液濃縮而獲得粗產物29.4g。將粗產物展開於矽膠管柱層析儀,分餾出化合物(14)5.3g及化合物(15)6.0g。[Production Example A-4] In a 300 mL 3-necked flask, 15.0 g of dipenterythritol (manufactured by ACROS), 29.5 g of a 48% NaOH aqueous solution, and 150 g of dimethylsulfoxide were placed. It was heated to 40°C, and 39.5 g of 5-bromo-1-pentene (manufactured by Tokyo Chemical Industry Co., Ltd.) was added, followed by stirring for 4 hours. After washing once with dilute hydrochloric acid aqueous solution, 200 g of cyclopentyl methyl ether was added, and the organic phase was recovered. The recovered solution was concentrated with a distiller to obtain 29.4 g of crude product. The crude product was developed on a silica column chromatograph, and 5.3 g of compound (14) and 6.0 g of compound (15) were fractionated.

[化學式5] [Chemical formula 5]

於50mL之2口茄形燒瓶內放入化合物(14)1.0g、2,6二甲吡啶0.4g、AE-3000 5g。以冰浴冷卻並同時攪拌,在氮氣環境下徐緩地滴下三氟甲磺酸酐0.5g。進一步攪拌1小時後,以稀鹽酸水溶液洗淨1次,回收有機相。以蒸餾器將回收之溶液濃縮而獲得粗產物。將粗產物展開於矽膠管柱層析儀,分餾出化合物(14)之HO-轉換成CF3 SO3 -的化合物(16)1.2g。Put 1.0g of compound (14), 0.4g of 2,6-lutidine, and 5g of AE-3000 into a 50 mL 2-neck eggplant-shaped flask. Cool in an ice bath while stirring, and slowly drop 0.5 g of trifluoromethanesulfonic anhydride in a nitrogen atmosphere. After further stirring for 1 hour, the mixture was washed once with a dilute hydrochloric acid aqueous solution, and the organic phase was recovered. The recovered solution was concentrated using a distiller to obtain a crude product. The crude product was developed in a silica column chromatograph, and 1.2 g of compound (16) in which HO- of compound (14) was converted into CF 3 SO 3 - was fractionated.

於50mL茄形燒瓶放入化合物(16)1.0g、以國際公開第2015/087902號之製造例6中所述方法取得的化合物(17)6.6g、碳酸銫2.7g、1,3-雙(三氟甲基)苯6.6g,並在80℃回流條件下攪拌4小時。加入10g之AE-3000後,以稀鹽酸水溶液洗淨1次,回收有機相。以蒸餾器將回收之溶液濃縮而獲得粗產物。將粗產物展開於矽膠管柱層析儀,分餾出化合物(16)之CF3 SO3 -轉換成CF3 CF2 CF2 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -CH2 -O-的化合物(18)6.6g。 CF3 CF2 CF2 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -CH2 -OH…(17)In a 50 mL eggplant-shaped flask, 1.0 g of compound (16), 6.6 g of compound (17) obtained by the method described in Production Example 6 of International Publication No. 2015/087902, 2.7 g of cesium carbonate, and 1,3-bis( Trifluoromethyl)benzene 6.6g, and stirred under reflux conditions at 80°C for 4 hours. After adding 10g of AE-3000, wash once with dilute hydrochloric acid aqueous solution and recover the organic phase. The recovered solution was concentrated using a distiller to obtain a crude product. The crude product was developed in a silica column chromatograph, and CF 3 SO 3 of compound (16) was fractionated and converted into CF 3 CF 2 CF 2 O{(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 6.6 g of compound (18) of 2 -CH 2 -O-. CF 3 CF 2 CF 2 O{(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 2 -CH 2 -OH…(17)

於100mL之PFA製茄形燒瓶放入化合物(18)6.0g、鉑/1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物的二甲苯溶液(鉑含量:2%)0.03g、三甲氧矽烷(東京化成工業公司製)1.2g、二甲亞碸0.01g及1,3-雙(三氟甲基)苯0.9g,在40℃下攪拌4小時。將溶劑等減壓餾去後以孔徑0.2μm之膜濾器過濾而獲得化合物(18)之5個烯丙基被矽氫化的化合物(A-4)6.4g。矽氫化之轉化率為100%,無化合物(18)殘留。矽氫化之選擇率為100%。 在此,化合物(A-4)係前述化合物(A13-3)之W-R51a -為式(Rf -1)所示基團的化合物。In a 100 mL eggplant-shaped flask made of PFA, 6.0 g of compound (18) and a xylene solution of platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex ( Platinum content: 2%) 0.03g, trimethoxysilane (made by Tokyo Chemical Industry Co., Ltd.) 1.2g, dimethylsulfoxide 0.01g and 1,3-bis(trifluoromethyl)benzene 0.9g, stir at 40°C for 4 hours. The solvent and the like were evaporated under reduced pressure, and then filtered through a membrane filter with a pore size of 0.2 μm to obtain 6.4 g of compound (A-4) in which five allyl groups of compound (18) were hydrosilylated. The conversion rate of hydrosilation is 100%, and no compound (18) remains. The selectivity of hydrogenation is 100%. Here, compound (A-4) is a compound in which WR 51a - of the aforementioned compound (A13-3) is a group represented by formula (R f -1).

[製造例A-5] 除了使用製造例A-4中所得化合物(15)替代化合物(14)以外,以與製造例A-4同樣方式獲得化合物(15)之2個HO-全部轉換成CF3 SO3 -的化合物(19)。接著,除了使用化合物(19)替代化合物(16)以外,以與製造例A-4(3)同樣方式獲得化合物(19)之2個CF3 SO3 -全部轉換成CF3 CF2 CF2 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -CH2 -O-的化合物(20)。接下來除了使用化合物(20)替代化合物(18)以外,以與製造例A-4同樣方式獲得化合物(20)之4個烯丙基被矽氫化的化合物(A-5)6.4g。 在此,化合物(A-5)係前述化合物(A13-4)之W-R51a -為式(Rf -1)所示基團的化合物。[Production Example A-5] Compound (15) was obtained in the same manner as in Production Example A-4, except that the compound (15) obtained in Production Example A-4 was used instead of the compound (14). 3SO 3 - compound (19). Next, except that compound (19) is used instead of compound (16), two CF 3 SO 3 of compound (19) are obtained in the same manner as in Production Example A-4 (3) - all of which are converted into CF 3 CF 2 CF 2 O Compound (20) of {(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 2 -CH 2 -O-. Next, except that compound (20) was used instead of compound (18), 6.4 g of compound (A-5) in which four allyl groups of compound (20) were hydrosilylated was obtained in the same manner as in Production Example A-4. Here, compound (A-5) is a compound in which WR 51a - of the aforementioned compound (A13-4) is a group represented by formula (R f -1).

[製造例B-1] 按照國際公開第2013/121984號之實施例6中記載之方法獲得化合物(B-1)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -CONHCH2 CH2 CH2 -Si(OCH3 )3 …(B-1) 化合物(B-1):單元數x3之平均值13,數量平均分子量4,870。[Production Example B-1] Compound (B-1) was obtained according to the method described in Example 6 of International Publication No. 2013/121984. CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -CONHCH 2 CH 2 CH 2 -Si(OCH 3 ) 3 ...(B-1) Compound (B-1): The average number of units x3 is 13, and the number average molecular weight is 4,870.

[製造例B-2] 按照國際公開第2013/121984號之實施例7中記載之方法獲得化合物(21)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -CH2 OH…(21) 化合物(21):單元數x3之平均值13,數量平均分子量4,700。[Production Example B-2] Compound (21) was obtained according to the method described in Example 7 of International Publication No. 2013/121984. CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -CH 2 OH…(21) Compound (21): The average number of units x3 is 13, and the number average molecular weight is 4,700.

將化合物(7)改成化合物(21)、CF3 SO2 Cl(和光純藥工業公司製)之量改成0.86g、三乙胺之量改成1.02g,除此以外以與製造例A-2同樣方式獲得化合物(22)30.6g(產率99%)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -CH2 OSO2 CF3 …(22) 化合物(22):單元數x3之平均值13,數量平均分子量4,830。Except that compound (7) was changed to compound (21), the amount of CF 3 SO 2 Cl (manufactured by Wako Pure Chemical Industries, Ltd.) was changed to 0.86 g, and the amount of triethylamine was changed to 1.02 g, it was the same as in Production Example A. -2 Obtained 30.6 g of compound (22) in the same manner (yield 99%). CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -CH 2 OSO 2 CF 3 …(22) Compound ( 22): The average number of units x3 is 13, and the number average molecular weight is 4,830.

將化合物(10)改成化合物(22)、HN(CH2 CH=CH2 )2 之量改成2.08g、三乙胺之量改成0.63g,除此以外以與製造例A-2同樣方式獲得化合物(23)14.6g(產率98%)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -CH2 -N(CH2 CH=CH2 )2 …(23) 化合物(23):單元數x3之平均值13,數量平均分子量4,780。It is the same as Production Example A-2 except that compound (10) is changed to compound (22), the amount of HN(CH 2 CH=CH 2 ) 2 is changed to 2.08 g, and the amount of triethylamine is changed to 0.63 g. 14.6 g of compound (23) was obtained in this way (yield 98%). CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -CH 2 -N(CH 2 CH=CH 2 ) 2 ...(23) Compound (23): The average number of units x3 is 13, and the number average molecular weight is 4,780.

將化合物(11)改成化合物(23)、鉑錯合物溶液之量改成0.029g、HSi(OCH3 )3 之量改成1.2g,除此以外以與製造例A-2同樣方式獲得組成物(B-2)11.8g(產率94%),該組成物(B-2)係由化合物(23)之2個烯丙基被矽氫化的化合物(24)、及化合物(23)之2個烯丙基在分子內環化而生成的副產物構成。矽氫化之轉化率為100%,無化合物(23)殘留。矽氫化之選擇率為80%。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -CH2 -N[CH2 CH2 CH2 -Si(OCH3 )3 ]2 …(24)It was obtained in the same manner as in Production Example A-2 except that compound (11) was changed to compound (23), the amount of platinum complex solution was changed to 0.029g, and the amount of HSi(OCH 3 ) 3 was changed to 1.2g. 11.8 g of composition (B-2) (yield 94%), which is composed of compound (24) in which two allyl groups of compound (23) are hydrosilylated, and compound (23) It consists of by-products generated by the intramolecular cyclization of two allyl groups. The conversion rate of hydrosilylation was 100%, and no compound (23) remained. The selectivity of hydrogenation is 80%. CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -CH 2 -N[CH 2 CH 2 CH 2 - Si(OCH 3 ) 3 ] 2 …(24)

化合物(24)之NMR譜;1 H-NMR(300.4MHz、溶劑:CDCl3 、基準:TMS)δ(ppm):0.7(4H)、1.6(4H)、2.6(4H)、3.2(2H)、3.6(18H)。19 F-NMR(282.7MHz、溶劑:CDCl3 、基準:C6 F6 )δ(ppm):-56.3(3F)、-84.0(54F)、-89.2(54F)、-91.4(2F)-120.9(2F)、-126.6(54F)。 單元數x3之平均值:13,化合物(24)之數量平均分子量:5,020。NMR spectrum of compound (24); 1 H-NMR (300.4MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.7 (4H), 1.6 (4H), 2.6 (4H), 3.2 (2H), 3.6(18H). 19 F-NMR (282.7MHz, solvent: CDCl 3 , standard: C 6 F 6 ) δ (ppm): -56.3 (3F), -84.0 (54F), -89.2 (54F), -91.4 (2F) -120.9 (2F), -126.6(54F). The average number of units x3: 13, the number average molecular weight of compound (24): 5,020.

[製造例B-3] 按照國際公開第2013/121984號之實施例6中記載之方法獲得化合物(25)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -C(O)OCH3 …(25) 化合物(25):單元數x3之平均值13,數量平均分子量4,700。[Production Example B-3] Compound (25) was obtained according to the method described in Example 6 of International Publication No. 2013/121984. CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -C(O)OCH 3 …(25) Compound ( 25): The average number of units x3 is 13, and the number average molecular weight is 4,700.

將化合物(6)改成化合物(25)9.0g、H2 N-CH2 -C(CH2 CH=CH2 )3 之量改成0.45g,除此以外以與製造例A-3同樣方式獲得化合物(26)7.6g(產率84%)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -C(O)NH-CH2 -C(CH2 CH=CH2 )3 …(25) 化合物(26):單元數x3之平均值13,數量平均分子量4,800。The same procedure as in Production Example A-3 was performed except that the compound (6) was replaced by 9.0 g of the compound (25) and the amount of H 2 N-CH 2 -C (CH 2 CH=CH 2 ) 3 was changed to 0.45 g. 7.6 g of compound (26) was obtained (yield 84%). CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -C(O)NH-CH 2 -C(CH 2 CH=CH 2 ) 3 ...(25) Compound (26): The average number of units x3 is 13, and the number average molecular weight is 4,800.

將化合物(13)改成化合物(26)6.0g、鉑錯合物溶液之量改成0.07g、HSi(OCH3 )3 之量改成0.78g、二甲亞碸之量改成0.02g、1,3-雙(三氟甲基)苯(東京化成工業公司製)之量改成0.49g,除此以外以與製造例A-3同樣方式獲得化合物(B-3)6.7g(產率100%)。 CF3 -O-(CF2 CF2 O-CF2 CF2 CF2 CF2 O)x3 (CF2 CF2 O)-CF2 CF2 CF2 -C(O)NH-CH2 -C[CH2 CH2 CH2 -Si(OCH3 )3 ]3 …(B-3)Change compound (13) to 6.0g of compound (26), change the amount of platinum complex solution to 0.07g, change the amount of HSi(OCH 3 ) 3 to 0.78g, change the amount of dimethyl sulfoxide to 0.02g, Except that the amount of 1,3-bis(trifluoromethyl)benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) was changed to 0.49 g, 6.7 g of compound (B-3) was obtained in the same manner as in Production Example A-3 (yield 100%). CF 3 -O-(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 CF 2 O)-CF 2 CF 2 CF 2 -C(O)NH-CH 2 -C[CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 ] 3 …(B-3)

化合物(B-3)之NMR譜:1 H-NMR(300.4MHz、溶劑:CDCl3 、基準:TMS)δ(ppm):0.75(6H)、1.3~1.6(12H)、3.4(2H)、3.7(27H)。19 F-NMR(282.7MHz、溶劑:CDCl3 、基準:CFCl3 )δ(ppm):-55.2(3F)、-82.1(54F)、-88.1(54F)、-90.2(2F)、-119.6(2F)、-125.4(52F)、-126.2(2F)。 單元數x3之平均值:13,化合物(B-3)之數量平均分子量:5,400。NMR spectrum of compound (B-3): 1 H-NMR (300.4MHz, solvent: CDCl 3 , standard: TMS) δ (ppm): 0.75 (6H), 1.3~1.6 (12H), 3.4 (2H), 3.7 (27H). 19 F-NMR (282.7MHz, solvent: CDCl 3 , standard: CFCl 3 ) δ (ppm): -55.2 (3F), -82.1 (54F), -88.1 (54F), -90.2 (2F), -119.6 ( 2F), -125.4(52F), -126.2(2F). The average number of units x3: 13, the number average molecular weight of compound (B-3): 5,400.

[製造例B-4] 除了使用以國際公開第2013/121984號之實施例7所述方法製得之化合物(27)(m25之平均值:13,數量平均分子量:4,700)替代化合物(17)以外,以與製造例A-4同樣方式獲得化合物(16)之CF3 SO3 -轉換成CF3 O(CF2 CF2 OCF2 CF2 CF2 CF2 O)m25 CF2 CF2 OCF2 CF2 CF2 -CH2 -O-的化合物(28)。接下來除了使用化合物(28)替代化合物(18)以外,以與製造例A-4同樣方式獲得化合物(28)之5個烯丙基被矽氫化的化合物(B-4)6.3g。 CF3 O(CF2 CF2 OCF2 CF2 CF2 CF2 O)m25 CF2 CF2 OCF2 CF2 CF2 -CH2 -OH…(27) 在此,化合物(B-4)係前述化合物(A13-3)之W-R51a -為式(Rf -3)所示基團的化合物。[Production Example B-4] Instead of compound (17), compound (27) (average value of m25: 13, number average molecular weight: 4,700) prepared by the method described in Example 7 of International Publication No. 2013/121984 was used. Except for this, the CF 3 SO 3 of compound (16) was obtained in the same manner as in Production Example A-4 - converted to CF 3 O (CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) m25 CF 2 CF 2 OCF 2 CF 2CF 2 -CH 2 -O- compound (28). Next, except that compound (28) was used instead of compound (18), 6.3 g of compound (B-4) in which five allyl groups of compound (28) were hydrosilylated was obtained in the same manner as in Production Example A-4. CF 3 O(CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) m25 CF 2 CF 2 OCF 2 CF 2 CF 2 -CH 2 -OH…(27) Here, compound (B-4) is the aforementioned compound WR 51a - of (A13-3) is a compound having a group represented by formula (R f -3).

[製造例B-5] 除了使用化合物(27)替代化合物(17)以外,以與製造例A-5同樣方式獲得化合物(19)之2個CF3 SO3 -全部轉換成CF3 CF2 CF2 O{(CF2 O)m21 (CF2 CF2 O)m22 }CF2 -CH2 -O-的化合物(29)。接下來除了使用化合物(29)替代化合物(18)以外,以與製造例A-4同樣方式獲得化合物(29)之4個烯丙基被矽氫化的化合物(B-5)6.1g。 在此,化合物(B-5)係前述化合物(A13-4)之W-R51a -為式(Rf -3)所示基團的化合物。[Production Example B-5] Except using compound (27) instead of compound (17), two CF 3 SO 3 units of compound (19) were obtained in the same manner as in Production Example A-5 - all of which were converted into CF 3 CF 2 CF 2 O{(CF 2 O) m21 (CF 2 CF 2 O) m22 }CF 2 -CH 2 -O- compound (29). Next, except that compound (29) was used instead of compound (18), 6.1 g of compound (B-5) in which four allyl groups of compound (29) were hydrosilylated was obtained in the same manner as in Production Example A-4. Here, compound (B-5) is a compound in which WR 51a - of the aforementioned compound (A13-4) is a group represented by formula (R f -3).

[例1] 將50質量份(A-1)與50質量份(B-1)混合調製出組成物。使用該組成物,利用下述乾式塗佈法進行基材表面處理而製得例1之物品。基材係使用化學強化玻璃。針對所得物品評估耐久性1(接觸角100°以上的維持次數)、潤滑性及耐久性2(動摩擦係數的降低難度)。結果列於表3~5。[Example 1] 50 parts by mass (A-1) and 50 parts by mass (B-1) were mixed to prepare a composition. Using this composition, the substrate surface was treated by the following dry coating method to prepare the article of Example 1. The base material is chemically strengthened glass. The obtained article was evaluated for durability 1 (the number of times the contact angle is maintained at 100° or more), lubricity, and durability 2 (difficulty in reducing the dynamic friction coefficient). The results are listed in Tables 3~5.

(乾式塗佈法) 乾式塗佈係利用真空蒸鍍裝置(昭和真空公司製、SGC-22WA)進行(真空蒸鍍法)。將組成物35mg充填於真空蒸鍍裝置內之鉬製舟皿後,將真空蒸鍍裝置內排氣至5×10-3 Pa以下。將配置有組成物之舟皿加熱使組成物堆積於基材表面,藉以於基材表面形成蒸鍍膜。將形成有蒸鍍膜之基材在溫度:25℃、濕度:40%之條件下放置一晩而製得基材表面具有表面層之物品。(Dry coating method) Dry coating is performed using a vacuum evaporation device (SGC-22WA manufactured by Showa Vacuum Co., Ltd.) (vacuum evaporation method). After filling 35 mg of the composition into a molybdenum boat in a vacuum evaporation device, the vacuum evaporation device was exhausted to 5×10 -3 Pa or less. The boat disposed with the composition is heated to deposit the composition on the surface of the substrate, thereby forming an evaporated film on the surface of the substrate. The substrate on which the evaporated film is formed is placed overnight under the conditions of temperature: 25°C and humidity: 40% to prepare an article with a surface layer on the surface of the substrate.

[例2~40] 除了將所用化合物之種類及組合變更成表2所示外,以與例1同樣方式調製組成物、形成表面層而製得物品並評估所得物品。在組合2種化合物之例中,各化合物之質量比全部為50:50。結果列於表3~5。[Examples 2 to 40] In the same manner as in Example 1, except that the types and combinations of the compounds used were changed to those shown in Table 2, a composition was prepared, a surface layer was formed, and an article was produced, and the obtained article was evaluated. In the example of combining two compounds, the mass ratio of each compound is 50:50. The results are listed in Tables 3~5.

[表2] [Table 2]

耐久性1(接觸角100°以上的維持次數) [表3] Durability 1 (number of times the contact angle is maintained above 100°) [Table 3]

潤滑性(動摩擦係數) [表4] Lubricity (dynamic friction coefficient) [Table 4]

耐久性2(動摩擦係數的降低難度) [表5] Durability 2 (Difficulty in reducing dynamic friction coefficient) [Table 5]

比起化合物(B)與不具基(I)之化合物(C-1)組合的例36~40之組成物,化合物(A)與化合物(B)組合之例1~5、7~11、13~17、19~23、25~29的組成物之耐久性及潤滑性較佳。又,比起單單使用化合物(B)的例31~35,潤滑性較佳。另,隨著化合物(A)及化合物(B)各自所具有之基(I)數增多,可見耐久性提升之傾向。Compared with the compositions of Examples 36 to 40 in which compound (B) is combined with compound (C-1) without group (I), Examples 1 to 5, 7 to 11, and 13 in which compound (A) is combined with compound (B) The compositions of ~17, 19~23, and 25~29 have better durability and lubricity. In addition, compared with Examples 31 to 35 in which compound (B) was used alone, the lubricity was better. In addition, as the number of groups (I) each of compound (A) and compound (B) has increases, the durability tends to improve.

(例41~50) 除了將(A-3)與(B-3)之混合比(質量比)改成如表6所示以外,以與例15同樣方式調製組成物並利用前述乾式塗佈法形成基材之表面層而製得物品,並評估所得物品。結果列於表6。 又,使用各組成物,利用下述濕式塗佈法進行基材之表面處理而製得物品。基材則使用化學強化玻璃。針對所得物品評估耐久性1及潤滑性。結果列於表7。(Examples 41 to 50) Except that the mixing ratio (mass ratio) of (A-3) and (B-3) was changed to that shown in Table 6, the composition was prepared in the same manner as in Example 15 and used the aforementioned dry coating. An article is produced by forming a surface layer on a substrate, and the obtained article is evaluated. The results are listed in Table 6. Furthermore, using each composition, the surface of the base material was treated by the following wet coating method to prepare an article. The base material uses chemically strengthened glass. The resulting articles were evaluated for durability1 and lubricity. The results are listed in Table 7.

(濕式塗佈法) 將例41~50中所得各組成物與作為液態介質之C4 F9 OC2 H5 (3M公司製、Novec(註冊商標)7200)混合,調製出固體成分濃度0.05%之塗佈液。將基材浸漬於塗佈液中放置30分鐘後取出基材(浸塗法)。使塗膜在120℃下乾燥30分鐘後,以AK-225洗淨而獲得在基材表面具有表面處理層之物品。(Wet coating method) Each composition obtained in Examples 41 to 50 was mixed with C 4 F 9 OC 2 H 5 (Novec (registered trademark) 7200, manufactured by 3M Company) as a liquid medium to prepare a solid content concentration of 0.05 % coating liquid. The base material is immersed in the coating liquid and left for 30 minutes, and then the base material is taken out (dip coating method). The coating film was dried at 120° C. for 30 minutes, and then washed with AK-225 to obtain an article having a surface treatment layer on the surface of the base material.

[表6] [Table 6]

[表7] [Table 7]

(例51~60) 除了將(A-4)與(B-4)之混合比(質量比)改成表8所示以外,以與例22同樣方式調製組成物並利用前述乾式塗佈法形成基材之表面層而製得物品,並評估所得物品。結果列於表8。(Examples 51 to 60) Except that the mixing ratio (mass ratio) of (A-4) and (B-4) was changed to that shown in Table 8, the composition was prepared in the same manner as in Example 22 and the aforementioned dry coating method was used. An article was produced by forming a surface layer on the substrate, and the obtained article was evaluated. The results are listed in Table 8.

[表8] [Table 8]

比起各化合物單獨使用之情況,藉由併用化合物(A)與化合物(B)更能在較高水平下兼具潤滑性及耐久性兩特性。化合物(A)/化合物(B)之質量比為20/80~50/50之範圍內時,耐久性及潤滑性尤佳。 產業上之可利用性By using compound (A) and compound (B) in combination, it is possible to achieve both lubricity and durability at a higher level than when each compound is used alone. When the mass ratio of compound (A)/compound (B) is in the range of 20/80~50/50, the durability and lubricity are particularly good. industrial availability

本組成物及本塗佈液可用於要求賦予潤滑性及撥水撥油性的各種用途上。譬如,可用於觸控面板等顯示輸入裝置;透明玻璃製或透明塑膠製構件的表面保護塗料、廚房用防污塗料;電子機器、熱交換器、電池等之撥水防濕塗料或防污塗料、浴廁用防污塗料;用於需要傳導並同時撥液之構件上的塗料;熱交換機之撥水、防水、滑水塗料;振動篩或氣缸內部等之表面低摩擦塗料等。 另,在此係援引已於2017年03月15日提申之日本專利申請案2017-050558號之說明書、申請專利範圍及摘要之全部內容並納入作為本發明說明書之揭示。This composition and this coating liquid can be used in various applications requiring lubricity and water- and oil-repellency. For example, it can be used for display input devices such as touch panels; surface protective coatings for transparent glass or transparent plastic components, and antifouling coatings for kitchens; water-repellent and moisture-proof coatings or antifouling coatings for electronic equipment, heat exchangers, batteries, etc. Antifouling coatings for bathrooms and toilets; coatings for components that need to be conductive and liquid-repellent at the same time; water-repellent, waterproof, and hydrophobic coatings for heat exchangers; surface low-friction coatings for vibrating screens or inside cylinders, etc. In addition, the entire contents of the specification, patent scope and abstract of Japanese Patent Application No. 2017-050558 filed on March 15, 2017 are quoted and incorporated into the disclosure of the specification of the present invention.

Claims (12)

一種含氟醚組成物,其特徵在於含有含氟醚化合物(A)與含氟醚化合物(B);前述含氟醚化合物(A)為具有含(CF2O)單元之聚(氧全氟伸烷基)鏈及3個以上之下式(I)所示基團的化合物;前述含氟醚化合物(B)為具有不含(CF2O)單元之聚(氧全氟伸烷基)鏈及3個以上之前述式(I)所示基團的化合物;-SiRnL3-n...(I)惟,L為羥基或水解性基;R為氫原子或1價烴基;n為0~2之整數;n為0或1時,(3-n)個L可相同亦可互異;n為2時,n個R可相同亦可互異;其中,前述含氟醚化合物(A)及前述含氟醚化合物(B)各自所具有的前述式(I)所示基團可相同亦可互異。 A fluorine-containing ether composition, characterized in that it contains a fluorine-containing ether compound (A) and a fluorine-containing ether compound (B); the aforementioned fluorine-containing ether compound (A) is a poly(oxyperfluorofluoroethylene) containing (CF 2 O) unit Alkylene) chain and three or more groups represented by the following formula (I); the aforementioned fluorine-containing ether compound (B) is a poly(oxyperfluoroalkylene) containing no (CF 2 O) unit A compound with a chain and more than 3 groups represented by the aforementioned formula (I); -SiR n L 3-n ... (I) However, L is a hydroxyl group or a hydrolyzable group; R is a hydrogen atom or a monovalent hydrocarbon group; n is an integer from 0 to 2; when n is 0 or 1, the (3-n) L's can be the same or different; when n is 2, the n R's can be the same or different; among them, the aforementioned fluorine-containing ether The groups represented by the aforementioned formula (I) that the compound (A) and the aforementioned fluorine-containing ether compound (B) each have may be the same or different from each other. 如請求項1之含氟醚組成物,其中前述含氟醚化合物(A)與前述含氟醚化合物(B)皆為下式(A/B)所示含氟醚化合物;前述含氟醚化合物(A)中之Rf為含(CF2O)單元之聚(氧全氟伸烷基)鏈,前述含氟醚化合物(B)中之Rf為不含(CF2O)單元之聚(氧全氟伸烷基)鏈;[Rf1-O-Q-Rf-]rZ[-SiRnL3-n]s...(A/B) 惟,Rf1為全氟烷基;Q為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,且構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異;Rf為聚(氧全氟伸烷基)鏈;Z為(r+s)價連結基;-SiRnL3-n為前述式(I)所示基團;r為2以上時,r個[Rf1-O-Q-Rf-]為相同基團;s個式(I)所示基團為相同基團;r為1以上之整數,s為3以上之整數,且r+s為4~8。 The fluorine-containing ether composition of claim 1, wherein the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B) are both fluorine-containing ether compounds represented by the following formula (A/B); the aforementioned fluorine-containing ether compound R f in (A) is a poly(oxyperfluoroalkylene) chain containing (CF 2 O) units, and R f in the aforementioned fluoroether compound (B) is a poly(oxyperfluoroalkylene) chain containing no (CF 2 O) units. (oxyperfluoroalkyl) chain; [R f1 -OQR f -] r Z[-SiR n L 3-n ] s ...(A/B) However, R f1 is perfluoroalkyl; Q is A single bond, an oxyfluoroalkylene group containing more than 1 hydrogen atom, or a polyoxyfluoroalkylene group composed of 2 to 5 oxyfluoroalkylene groups, and the oxygen constituting the polyoxyfluoroalkylene group The fluoroalkylene groups can all be the same or different; R f is a poly(oxyperfluoroalkylene) chain; Z is a (r+s) valent linking group; -SiR n L 3-n is the aforementioned formula (I) The groups shown; when r is 2 or more, r [R f1 -OQR f -] are the same group; s groups shown in formula (I) are the same group; r is an integer more than 1, s is An integer above 3, and r+s is 4~8. 如請求項1或2之含氟醚組成物,其中前述含(CF2O)單元之聚(氧全氟伸烷基)鏈係含有(CF2O)單元與(CF2CF2O)單元的聚(氧全氟伸烷基)鏈。 The fluorine-containing ether composition of claim 1 or 2, wherein the poly(oxyperfluoroalkylene) chain system containing (CF 2 O) units contains (CF 2 O) units and (CF 2 CF 2 O) units. of poly(oxyperfluoroalkylene) chains. 如請求項1或2之含氟醚組成物,其中前述不含(CF2O)單元之聚(氧全氟伸烷基)鏈係含有選自(CF2CF2O)單元、(CF2CF2CF2O)單元及(CF2CF2CF2CF2O)單元中之至少1種單元的聚(氧全氟伸烷基)鏈。 The fluorine-containing ether composition of claim 1 or 2, wherein the poly(oxyperfluoroalkylene) chain system without (CF 2 O) units contains units selected from (CF 2 CF 2 O), (CF 2 A poly(oxyperfluoroalkylene) chain of at least one unit among a CF 2 CF 2 O) unit and a (CF 2 CF 2 CF 2 CF 2 O) unit. 如請求項1或2之含氟醚組成物,其中前述不含(CF2O)單元之聚(氧全氟伸烷基)鏈係含(CF2CF2OCF2CF2CF2CF2O)單元的聚(氧全氟伸烷基)鏈。 The fluorine-containing ether composition of claim 1 or 2, wherein the poly(oxyperfluoroalkylene) chain system without (CF 2 O) units contains (CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O ) unit of the poly(oxyperfluoroalkylene) chain. 如請求項1或2之含氟醚組成物,其中前述含氟醚化合物(A)之數量平均分子量為2,000~20,000。 The fluorine-containing ether composition of claim 1 or 2, wherein the number average molecular weight of the aforementioned fluorine-containing ether compound (A) is 2,000~20,000. 如請求項1或2之含氟醚組成物,其中前述含氟醚化合物(B)之數量平均分子量為2,000~20,000。 For example, the fluorine-containing ether composition of claim 1 or 2, wherein the number average molecular weight of the aforementioned fluorine-containing ether compound (B) is 2,000~20,000. 如請求項1或2之含氟醚組成物,其含有相對於前述含氟醚化合物(A)與前述含氟醚化合物(B)之合計量為10~80質量%之前述含氟醚化合物(A)。 The fluorine-containing ether composition of claim 1 or 2, which contains the aforementioned fluorine-containing ether compound (B) in an amount of 10 to 80% by mass relative to the total amount of the aforementioned fluorine-containing ether compound (A) and the aforementioned fluorine-containing ether compound (B). A). 一種含氟醚組成物,其特徵在於含有下式(A1)所示含氟醚化合物(A1)與下式(B1)所示含氟醚化合物(B1);[Rf1a-O-Qa-Rfa-]raZa[-SiRa naLa 3-na]sa...(A1) [Rf1b-O-Qb-Rfb-]rbZb[-SiRb nbLb 3-nb]sb...(B1)惟,Rf1a及Rf1b為全氟烷基;Qa及Qb為單鍵、含1個以上氫原子之氧氟伸烷基或由2~5個該氧氟伸烷基鍵結而成之聚氧氟伸烷基,且構成該聚氧氟伸烷基之氧氟伸烷基可全部相同亦可互異;Rfa為含(CF2O)單元之聚(氧全氟伸烷基)鏈;Rfb為不含(CF2O)單元之聚(氧全氟伸烷基)鏈;Za為(ra+sa)價連結基;Zb為(rb+sb)價連結基;La及Lb為羥基或水解性基;Ra及Rb為氫原子或1價烴基;na及nb為0~2之整數;na為0或1時之(3-na)個La、nb為0或1時之(3-nb)個Lb分別可相同亦可互異;na為2時之na個Ra、nb為2時之nb個Rb分別可相同亦 可互異;ra及rb為1以上之整數,ra為2以上時ra個[Rf1a-O-Qa-Rfa-]可相同亦可互異,rb為2以上時rb個[Rf1b-O-Qb-Rfb-]可相同亦可互異;sa及sb為3以上之整數,sa個[-SiRa naLa 3-na]可相同亦可互異,sb個[-SiRb nbLb 3-nb]可相同亦可互異。 A fluorine-containing ether composition, characterized by containing a fluorine-containing ether compound (A1) represented by the following formula (A1) and a fluorine-containing ether compound (B1) represented by the following formula (B1); [R f1a -OQ a -R fa -] ra Z a [-SiR a na L a 3-na ] sa ...(A1) [R f1b -OQ b -R fb -] rb Z b [-SiR b nb L b 3-nb ] sb . ..(B1) However, R f1a and R f1b are perfluoroalkyl groups; Q a and Q b are single bond oxyfluoroalkyl groups containing more than 1 hydrogen atom or composed of 2 to 5 oxyfluoroalkyl groups. A polyoxyfluoroalkylene group formed by bonding with bases, and the oxyfluoroalkylene groups constituting the polyoxyfluoroalkylene group can all be the same or different from each other; R fa is a poly(oxyfluoroalkylene) group containing (CF 2 O) units. perfluoroalkylene) chain; R fb is a poly(oxyperfluoroalkylene) chain without (CF 2 O) units; Z a is a (ra+sa) valence linking group; Z b is (rb+sb ) valent linking group; L a and L b are hydroxyl groups or hydrolyzable groups; R a and R b are hydrogen atoms or monovalent hydrocarbon groups; na and nb are integers from 0 to 2; when na is 0 or 1, (3- When na) L a and nb are 0 or 1, (3-nb) L b can be the same or different respectively; when na is 2, na R a can be, and when nb is 2, nb R b can be They can be the same or different; ra and rb are integers above 1. When ra is 2 or above, ra numbers [R f1a -OQ a -R fa -] can be the same or different; when rb is 2 or above, rb numbers [R f1b -OQ b -R fb -] can be the same or different; sa and sb are integers above 3, sa [-SiR a na L a 3-na ] can be the same or different, sb [-SiR b nb L b 3-nb ] can be the same or different. 如請求項9之含氟醚組成物,其含有相對於前述含氟醚化合物(A1)與前述含氟醚化合物(B1)之合計量為10~80質量%之前述含氟醚化合物(A1)。 The fluorine-containing ether composition of claim 9, which contains the aforementioned fluorine-containing ether compound (A1) in an amount of 10 to 80% by mass relative to the total amount of the aforementioned fluorine-containing ether compound (A1) and the aforementioned fluorine-containing ether compound (B1). . 一種塗佈液,其特徵在於含有如請求項1或9之含氟醚組成物及液態介質。 A coating liquid, characterized by containing the fluorine-containing ether composition of claim 1 or 9 and a liquid medium. 一種附表面層之物品,其特徵在於:具有由如請求項1或9之含氟醚組成物形成的表面層。 An article with a surface layer, characterized by having a surface layer formed of the fluorine-containing ether composition of claim 1 or 9.
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WO2018151055A1 (en) * 2017-02-14 2018-08-23 Agc株式会社 Fluorine-containing ether composition, coating liquid, and article
WO2018168497A1 (en) * 2017-03-15 2018-09-20 Agc株式会社 Fluorinated ether composition, coating liquid, and article
KR102316853B1 (en) * 2017-10-31 2021-10-25 다이킨 고교 가부시키가이샤 curable composition
EP3705528B1 (en) * 2017-10-31 2025-01-15 Daikin Industries, Ltd. Curable composition
JP7007600B2 (en) * 2017-10-31 2022-01-24 ダイキン工業株式会社 Curable composition
JP7257268B2 (en) * 2019-06-11 2023-04-13 日本ペイント・サーフケミカルズ株式会社 Hydrophilic treatment agent and method for forming hydrophilic film
JP6791430B1 (en) 2019-08-02 2020-11-25 ダイキン工業株式会社 Surface treatment agent
WO2021182166A1 (en) * 2020-03-09 2021-09-16 Agc株式会社 Fluorine-containing ether compound and production method therefor, compound and production method therefor, fluorine-containing ether composition, coating liquid, and article and production methods therefor
KR20240042469A (en) 2021-08-05 2024-04-02 신에쓰 가가꾸 고교 가부시끼가이샤 Articles having a water- and oil-repellent surface layer
JP7750291B2 (en) 2021-08-05 2025-10-07 信越化学工業株式会社 Articles with water- and oil-repellent surface layers
KR20240095305A (en) * 2021-11-12 2024-06-25 에이지씨 가부시키가이샤 Compositions, surface treatments, coating solutions, articles, and methods of making articles
CN118510847A (en) * 2022-01-05 2024-08-16 Agc株式会社 Composition, method for producing composition, coating liquid, article, and method for producing article
JPWO2023204026A1 (en) 2022-04-19 2023-10-26
WO2024111491A1 (en) * 2022-11-21 2024-05-30 Agc株式会社 Production method for fluorine-containing compound and fluorine-containing compound
WO2024210068A1 (en) * 2023-04-06 2024-10-10 Agc株式会社 Article and method for manufacturing article

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016017176A (en) * 2014-07-11 2016-02-01 ダイキン工業株式会社 Surface treatment agent
TW201706331A (en) * 2015-04-20 2017-02-16 信越化學工業股份有限公司 Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000144121A (en) * 1998-11-09 2000-05-26 Ikuo Narisawa Surface treatment agent, water-drop sliding base material using the same, and method for producing the same
JP2006206765A (en) * 2005-01-28 2006-08-10 Asahi Glass Co Ltd Water-repellent composition, substrate having water-repellent layer, method for producing the same, and article for transport equipment
JPWO2009008380A1 (en) * 2007-07-06 2010-09-09 旭硝子株式会社 Surface treatment agent, article, and novel fluorine-containing ether compound
JP5956367B2 (en) 2012-03-29 2016-07-27 ダイキン工業株式会社 Surface treatment composition and article obtained using the same
CN104769009B (en) * 2012-11-05 2017-08-11 大金工业株式会社 Containing perfluor (poly-) ether silane compound
JP6378203B2 (en) * 2013-12-13 2018-08-22 Agc株式会社 Fluorine-containing ether composition, method for producing the same, coating liquid, substrate having surface treatment layer, and method for producing the same
CN106232675B (en) * 2014-04-30 2019-05-14 大金工业株式会社 Silane compound containing perfluoro(poly)ether group
CN107922445B (en) * 2015-09-01 2020-07-28 Agc株式会社 Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, and article
KR102269698B1 (en) * 2016-10-31 2021-06-25 에이지씨 가부시키가이샤 Fluorine-containing ether compositions, coating solutions and articles
WO2018168497A1 (en) * 2017-03-15 2018-09-20 Agc株式会社 Fluorinated ether composition, coating liquid, and article

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016017176A (en) * 2014-07-11 2016-02-01 ダイキン工業株式会社 Surface treatment agent
TW201706331A (en) * 2015-04-20 2017-02-16 信越化學工業股份有限公司 Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article

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