圖1A是依照本發明的一實施例的一種穿透式顯示面板的上視示意圖。圖1B是圖1A的穿透式顯示面板的顯示單元的上視示意圖。圖2是圖1B的顯示單元的局部剖面示意圖,圖2對應了圖1B中線A-A’與線B-B’的位置。請參考圖1A、1B與圖2,穿透式顯示面板1具有顯示區DA,且穿透式顯示面板1可選擇地具有非顯示區NDA。非顯示區NDA位於顯示區DA的外側。1A is a schematic top view of a transmissive display panel according to an embodiment of the present invention. FIG. 1B is a schematic top view of the display unit of the transmissive display panel of FIG. 1A . Figure 2 is a partial cross-sectional schematic view of the display unit of Figure 1B. Figure 2 corresponds to the positions of line A-A' and line B-B' in Figure 1B. Please refer to FIG. 1A, 1B and FIG. 2. The transmissive display panel 1 has a display area DA, and the transmissive display panel 1 optionally has a non-display area NDA. The non-display area NDA is located outside the display area DA.
顯示區DA中具有多個顯示單元10。具體地說,穿透式顯示面板1包括基板SB以及位於基板SB上的多個顯示單元10,其中顯示單元10位於顯示區DA中。There are a plurality of display units 10 in the display area DA. Specifically, the transmissive display panel 1 includes a substrate SB and a plurality of display units 10 located on the substrate SB, where the display units 10 are located in the display area DA.
穿透式顯示面板1包括位於基板SB之上的多層導電層以及多層絕緣層。舉例來說,穿透式顯示面板1包括第一導電層M1、第二導電層M2、第三導電層M3、第四導電層M4、第一絕緣層I1、第二絕緣層I2、第三絕緣層I3、第四絕緣層I4以及第五絕緣層I5,但本發明不以此為限。在其他實施例中,穿透式顯示面板1還包括更多的導電層與更多的絕緣層。在本實施例中,第一絕緣層I1、第二絕緣層I2、第一導電層M1、第三絕緣層I3、第二導電層M2、第四絕緣層I4、第三導電層M3、第五絕緣層I5以及第四導電層M4依序位於基板SB之上,但本發明不以此為限。在其他實施例中,導電層與絕緣層的堆疊順序可以依照實際需求而進行調整。The transmissive display panel 1 includes multiple conductive layers and multiple insulating layers located on the substrate SB. For example, the transmissive display panel 1 includes a first conductive layer M1, a second conductive layer M2, a third conductive layer M3, a fourth conductive layer M4, a first insulating layer I1, a second insulating layer I2, and a third insulating layer. layer I3, the fourth insulating layer I4 and the fifth insulating layer I5, but the invention is not limited thereto. In other embodiments, the transmissive display panel 1 further includes more conductive layers and more insulating layers. In this embodiment, the first insulating layer I1, the second insulating layer I2, the first conductive layer M1, the third insulating layer I3, the second conductive layer M2, the fourth insulating layer I4, the third conductive layer M3, the fifth The insulating layer I5 and the fourth conductive layer M4 are sequentially located on the substrate SB, but the invention is not limited thereto. In other embodiments, the stacking sequence of the conductive layer and the insulating layer can be adjusted according to actual needs.
請參考圖1B,每個顯示單元10包括多個周邊畫素結構100P以及至少一個中央畫素結構100C。Referring to FIG. 1B , each display unit 10 includes a plurality of peripheral pixel structures 100P and at least one central pixel structure 100C.
周邊畫素結構100P與中央畫素結構100C排成陣列,且周邊畫素結構100P排在中央畫素結構100C的外圍。在本實施例中,每個顯示單元10中的周邊畫素結構100P的數量為八個,且中央畫素結構100C的數量為一個。八個周邊畫素結構100P圍繞一個中央畫素結構100C。The peripheral pixel structures 100P and the central pixel structure 100C are arranged in an array, and the peripheral pixel structures 100P are arranged on the periphery of the central pixel structure 100C. In this embodiment, the number of peripheral pixel structures 100P in each display unit 10 is eight, and the number of central pixel structures 100C is one. Eight peripheral pixel structures 100P surround a central pixel structure 100C.
請參考圖1B與圖2,在本實施例中,中央畫素結構100C與周邊畫素結構100P包括相同的結構與相同的形狀。舉例來說,中央畫素結構100C與周邊畫素結構100P各自包括多個發光元件110以及電性連接至發光元件110的畫素電路120,其中發光元件110例如為微型發光二極體、迷你發光二極體、有機發光二極體等。畫素電路120可選擇地包括多個薄膜電晶體,其中前述薄膜電晶體可以為任意類型的薄膜電晶體,例如頂部閘極型薄膜電晶體、底部閘極型薄膜電晶體、雙閘極型薄膜電晶體等。在一些實施例中,中央畫素結構100C與周邊畫素結構100P中的每一者包括不同顏色的發光元件110,例如紅色發光元件、綠色發光元件以及藍色發光元件,使穿透式顯示面板1得以顯示彩色畫面。Please refer to FIG. 1B and FIG. 2 . In this embodiment, the central pixel structure 100C and the peripheral pixel structure 100P include the same structure and the same shape. For example, the central pixel structure 100C and the peripheral pixel structure 100P each include a plurality of light-emitting elements 110 and a pixel circuit 120 electrically connected to the light-emitting elements 110. The light-emitting elements 110 are, for example, micro light-emitting diodes, mini-LEDs, etc. Diodes, organic light-emitting diodes, etc. The pixel circuit 120 may optionally include a plurality of thin film transistors, where the thin film transistors may be any type of thin film transistor, such as a top gate thin film transistor, a bottom gate thin film transistor, or a double gate thin film transistor. Transistors, etc. In some embodiments, each of the central pixel structure 100C and the peripheral pixel structure 100P includes light-emitting elements 110 of different colors, such as red light-emitting elements, green light-emitting elements and blue light-emitting elements, so that the transmissive display panel 1 can display a color screen.
在本實施例中,畫素電路120中的薄膜電晶體包括半導體通道121、閘極122、第一源極/汲極123以及第二源極/汲極124。第一絕緣層I1位於基板SB上。半導體通道121位於第一絕緣層I1上。第二絕緣層I2位於半導體通道121上。閘極122位於第二絕緣層I2上,且重疊於半導體通道121。第三絕緣層I3以及第四絕緣層I4位於閘極122上。第一源極/汲極123以及第二源極/汲極124位於第四絕緣層I4上,且電性連接至半導體通道121。第五絕緣層I5位於第一源極/汲極123以及第二源極/汲極124上。In this embodiment, the thin film transistor in the pixel circuit 120 includes a semiconductor channel 121, a gate 122, a first source/drain 123 and a second source/drain 124. The first insulating layer I1 is located on the substrate SB. The semiconductor channel 121 is located on the first insulating layer I1. The second insulating layer I2 is located on the semiconductor channel 121 . The gate 122 is located on the second insulating layer I2 and overlaps the semiconductor channel 121 . The third insulating layer I3 and the fourth insulating layer I4 are located on the gate 122 . The first source/drain 123 and the second source/drain 124 are located on the fourth insulating layer I4 and are electrically connected to the semiconductor channel 121. The fifth insulating layer I5 is located on the first source/drain 123 and the second source/drain 124 .
在本實施例中,畫素電路120還包括第一電極126與第二電極127。第一電極126與第二電極127位於第五絕緣層I5上。第一電極126電性連接至發光二極體110與第二源極/汲極124,且第二電極127電性連接至發光二極體110。在一些實施例中,第一電極126與第二電極127中的一者電性連接至發光二極體110陽極,且另一者電性連接至發光二極體110陰極。In this embodiment, the pixel circuit 120 further includes a first electrode 126 and a second electrode 127 . The first electrode 126 and the second electrode 127 are located on the fifth insulating layer I5. The first electrode 126 is electrically connected to the light-emitting diode 110 and the second source/drain 124 , and the second electrode 127 is electrically connected to the light-emitting diode 110 . In some embodiments, one of the first electrode 126 and the second electrode 127 is electrically connected to the anode of the light-emitting diode 110 , and the other is electrically connected to the cathode of the light-emitting diode 110 .
在本實施例中,閘極122屬於第一導電層M1,第一源極/汲極123以及第二源極/汲極124屬於第三導電層M3,第一電極126與第二電極127屬於第四導電層M4,但本發明不以此為限。在其他實施例中,閘極122、第一源極/汲極123以及第二源極/汲極124的位置可以依據實際需求而進行調整,進而使得閘極122屬於第一導電層M1以外的其他導電層,且第一源極/汲極123以及第二源極/汲極124屬於第三導電層M3以外的其他導電層。In this embodiment, the gate 122 belongs to the first conductive layer M1, the first source/drain 123 and the second source/drain 124 belong to the third conductive layer M3, and the first electrode 126 and the second electrode 127 belong to The fourth conductive layer M4, but the present invention is not limited thereto. In other embodiments, the positions of the gate 122 , the first source/drain 123 and the second source/drain 124 can be adjusted according to actual needs, so that the gate 122 is outside the first conductive layer M1 Other conductive layers, and the first source/drain 123 and the second source/drain 124 belong to other conductive layers other than the third conductive layer M3.
在圖1B中,第一線路結構200A, 200B、第二線路結構300A, 300B以及延伸線路結構400中位於不同導電層的導線以不同的填充圖樣表示,不同的填充圖樣所表示的導線可以分別屬於第一導電層M1、第二導電層M2、第三導電層M3、第四導電層M4或其他導電層。屬於不同導電層的導線可以透過導電孔而彼此電性連接,其中導電孔穿過導電層之間的一層或多層絕緣層。In FIG. 1B , the conductors located at different conductive layers in the first circuit structures 200A, 200B, the second circuit structures 300A, 300B and the extended circuit structure 400 are represented by different filling patterns. The conductors represented by different filling patterns can respectively belong to The first conductive layer M1, the second conductive layer M2, the third conductive layer M3, the fourth conductive layer M4 or other conductive layers. Wires belonging to different conductive layers can be electrically connected to each other through conductive holes, wherein the conductive holes pass through one or more insulating layers between the conductive layers.
請參考圖1B,每個顯示單元10還包括兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及至少一個延伸線路結構400。Please refer to FIG. 1B , each display unit 10 further includes two first circuit structures 200A, 200B, two second circuit structures 300A, 300B and at least one extended circuit structure 400 .
兩個第一線路結構200A, 200B沿著第一方向D1延伸。第一線路結構200A, 200B各自包括多條第一掃描線210以及多條第二掃描線220。在本實施例中,部分的周邊畫素結構100P沿著第一方向D1排成兩排,且兩個第一線路結構200A, 200B分別電性連接至沿著第一方向D1排成兩排的部分的周邊畫素結構100P中對應的一排。舉例來說,第一線路結構200A中的第一掃描線210電性連接至沿著第一方向D1排列且位於最下排的周邊畫素結構100P的畫素電路120,而第一線路結構200B中的第一掃描線210電性連接至沿著第一方向D1排列且位於最上排的周邊畫素結構100P的畫素電路120。在本實施例中,第一線路結構200A的第二掃描線220繞過沿著第一方向D1排列且位於最下排的周邊畫素結構100P的畫素電路120,且第一線路結構200B的第二掃描線220繞過沿著第一方向D1排列且位於最上排的周邊畫素結構100P的畫素電路120。The two first line structures 200A, 200B extend along the first direction D1. Each of the first line structures 200A and 200B includes a plurality of first scan lines 210 and a plurality of second scan lines 220 . In this embodiment, some of the peripheral pixel structures 100P are arranged in two rows along the first direction D1, and the two first line structures 200A and 200B are respectively electrically connected to the two rows arranged along the first direction D1. Part of the surrounding pixel structure corresponding to a row in 100P. For example, the first scan line 210 in the first circuit structure 200A is electrically connected to the pixel circuit 120 of the peripheral pixel structure 100P arranged along the first direction D1 and located in the bottom row, and the first circuit structure 200B The first scan line 210 in is electrically connected to the pixel circuit 120 arranged along the first direction D1 and located in the uppermost row of the peripheral pixel structure 100P. In this embodiment, the second scan line 220 of the first circuit structure 200A bypasses the pixel circuit 120 of the peripheral pixel structure 100P arranged along the first direction D1 and located in the bottom row, and the first circuit structure 200B The second scan line 220 bypasses the pixel circuits 120 of the peripheral pixel structure 100P arranged along the first direction D1 and located in the uppermost row.
兩個第二線路結構300A, 300B沿著第二方向D2延伸。第二線路結構300A, 300B各自包括多條第一資料線310以及多條第二資料線320。在本實施例中,部分的周邊畫素結構100P沿著第二方向D2排成兩排,且兩個第二線路結構300A, 300B分別電性連接至沿著第二方向D2排成兩排的部分的周邊畫素結構100P中對應的一排。舉例來說,第二線路結構300A中的第一資料線310電性連接至沿著第二方向D2排列且位於最左排的周邊畫素結構100P的畫素電路120,而第二線路結構300B中的第一資料線310電性連接至沿著第二方向D2排列且位於最右排的周邊畫素結構100P的畫素電路120。在本實施例中,第二線路結構300A中的第二資料線320繞過沿著第二方向D2排列且位於最左排的周邊畫素結構100P的畫素電路120,而第二線路結構300B中的第二資料線320繞過沿著第二方向D2排列且位於最右排的周邊畫素結構100P的畫素電路120。The two second circuit structures 300A, 300B extend along the second direction D2. The second line structures 300A and 300B each include a plurality of first data lines 310 and a plurality of second data lines 320 . In this embodiment, some of the peripheral pixel structures 100P are arranged in two rows along the second direction D2, and the two second line structures 300A and 300B are respectively electrically connected to the two rows arranged along the second direction D2. Part of the surrounding pixel structure corresponding to a row in 100P. For example, the first data line 310 in the second circuit structure 300A is electrically connected to the pixel circuit 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the leftmost row, and the second circuit structure 300B The first data line 310 in is electrically connected to the pixel circuit 120 arranged along the second direction D2 and located in the rightmost row of the peripheral pixel structure 100P. In this embodiment, the second data line 320 in the second circuit structure 300A bypasses the pixel circuit 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the leftmost row, while the second circuit structure 300B The second data line 320 bypasses the pixel circuits 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the rightmost row.
第一線路結構200A, 200B與第二線路結構300A, 300B圍繞出一個連續的穿透區TR。更具體地說,在第一線路結構200A, 200B與第二線路結構300A, 300B所圍繞的區域中,沒有任何不透光的構件會將穿透區TR區分成多個小塊。The first line structures 200A, 200B and the second line structures 300A, 300B surround a continuous penetration area TR. More specifically, in the area surrounded by the first circuit structures 200A, 200B and the second circuit structures 300A, 300B, there is no light-transmitting component that will divide the penetration region TR into a plurality of small blocks.
延伸線路結構400電性連接中央畫素結構100C,且從中央畫素結構100C的位置往外延伸,並電性連接至第一線路結構200A, 200B中對應的一者以及第二線路結構300A, 300B中對應的一者。在本實施例中,延伸線路結構400從其所對應的中央畫素結構100C的其中一側往外延伸。在本實施例中,延伸線路結構400將中央畫素結構100C電性連接至第一線路結構200A以及第二線路結構300A。舉例來說,延伸線路結構400包括多條第一延伸線路410以及多條第二延伸線路420,其中第一延伸線路410分別電性連接至第一線路結構200A中的第二掃描線220,且第二延伸線路420分別電性連接至第二線路結構300A中的第二資料線320。The extended circuit structure 400 is electrically connected to the central pixel structure 100C, extends outward from the position of the central pixel structure 100C, and is electrically connected to a corresponding one of the first circuit structures 200A, 200B and the second circuit structures 300A, 300B. The corresponding one. In this embodiment, the extension line structure 400 extends outward from one side of its corresponding central pixel structure 100C. In this embodiment, the extended circuit structure 400 electrically connects the central pixel structure 100C to the first circuit structure 200A and the second circuit structure 300A. For example, the extension line structure 400 includes a plurality of first extension lines 410 and a plurality of second extension lines 420, wherein the first extension lines 410 are electrically connected to the second scan lines 220 in the first line structure 200A, and The second extension lines 420 are respectively electrically connected to the second data lines 320 in the second line structure 300A.
在一些實施例中,延伸線路結構400與第一線路結構200A之間及/或延伸線路結構400與第二線路結構300A之間透過多個導通孔而電性連接。舉例來說,第一延伸線路410與第二掃描線220屬於不同導電層,因此第一延伸線路410與第二掃描線220透過導通孔412而電性連接。舉例來說,第二延伸線路420與第二資料線320屬於不同導電層,因此第二延伸線路420與第二資料線320透過導通孔422而電性連接。在一些實施例中,導通孔412, 422與中央畫素結構100C的距離大於導通孔412, 422與周邊畫素結構100P的距離。藉由導通孔412, 422集中在顯示單元10的外圍,可以提升穿透區TR的面積。In some embodiments, the extended circuit structure 400 and the first circuit structure 200A and/or the extended circuit structure 400 and the second circuit structure 300A are electrically connected through a plurality of via holes. For example, the first extension line 410 and the second scan line 220 belong to different conductive layers, so the first extension line 410 and the second scan line 220 are electrically connected through the via hole 412 . For example, the second extension line 420 and the second data line 320 belong to different conductive layers, so the second extension line 420 and the second data line 320 are electrically connected through the via hole 422 . In some embodiments, the distance between the via holes 412 and 422 and the central pixel structure 100C is greater than the distance between the via holes 412 and 422 and the peripheral pixel structure 100P. By concentrating the via holes 412 and 422 on the periphery of the display unit 10, the area of the penetration region TR can be increased.
在本實施例中,在第二方向D2上排列的三個周邊畫素結構100P中,位於中間的周邊畫素結構100P透過多條第一訊號線510以及導通孔512而電性連接至多條第一延伸線路410,進而透過多條第一延伸線路410而電性連接至第一線路結構200A中的多條第二掃描線220。在圖1B的實施例中,在顯示單元10中位於左邊中間的周邊畫素結構100P透過顯示單元10本身的第一延伸線路410而電性連接至第二掃描線220,而位於右邊中間的周邊畫素結構100P則透過位於右邊的其他顯示單元的第一延伸線路而電性連接至第二掃描線220。In this embodiment, among the three peripheral pixel structures 100P arranged in the second direction D2, the middle peripheral pixel structure 100P is electrically connected to a plurality of first signal lines 510 and via holes 512. An extension line 410 is electrically connected to the plurality of second scan lines 220 in the first line structure 200A through the plurality of first extension lines 410. In the embodiment of FIG. 1B , the peripheral pixel structure 100P located in the middle of the left side of the display unit 10 is electrically connected to the second scan line 220 through the first extension line 410 of the display unit 10 itself, and the peripheral pixel structure 100P located in the middle of the right side The pixel structure 100P is electrically connected to the second scan line 220 through the first extension lines of other display units on the right.
在本實施例中,在第一方向D1上排列的三個周邊畫素結構100P中,位於中間的周邊畫素結構100P透過多條第二訊號線520以及導通孔522而電性連接至第二線路結構300A中的第二資料線320。在圖1B的實施例中,第二訊號線520沿著第一方向D1延伸,且靠近第一線路結構200A或第一線路結構200B設置。In this embodiment, among the three peripheral pixel structures 100P arranged in the first direction D1, the middle peripheral pixel structure 100P is electrically connected to the second peripheral pixel structure 100P through a plurality of second signal lines 520 and via holes 522. The second data line 320 in the line structure 300A. In the embodiment of FIG. 1B , the second signal line 520 extends along the first direction D1 and is disposed close to the first circuit structure 200A or the first circuit structure 200B.
在一些實施例中,每個顯示單元10還包括黑矩陣(未繪出),黑矩陣遮蔽兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及延伸線路結構400,且黑矩陣遮蔽部分中央畫素結構100C與部分周邊畫素結構100P,並暴露出中央畫素結構100C的發光元件110、周邊畫素結構100P的發光元件110以及穿透區TR。在本實施例中,穿透區TR為C字型(將圖1B左右顛倒來看)。在本實施例中,延伸線路結構400自中央畫素結構100C的單一角落或單一側向外延伸,使中央畫素結構100C的至少三個側(圖1B中為上側、下側以及右側)被穿透區TR所包圍。在一些實施例中,穿透區TR沿著最內側的導線的形狀設置,使部分的穿透區TR水平地位於最內側的導線的彎折區域之間。舉例來說,第二掃描線220及/或第二資料線320具有多個彎折區域,而穿透區TR延伸至最內側的一條第二掃描線220及/或第二資料線320的相鄰的彎折區域之間,使部分的穿透區TR水平地位於最內側的一條第二掃描線220及/或第二資料線320的兩個彎折區域之間。In some embodiments, each display unit 10 further includes a black matrix (not shown), which shields the two first circuit structures 200A, 200B, the two second circuit structures 300A, 300B and the extended circuit structure 400, and The black matrix shields part of the central pixel structure 100C and part of the peripheral pixel structure 100P, and exposes the light-emitting element 110 of the central pixel structure 100C, the light-emitting element 110 of the peripheral pixel structure 100P and the penetration region TR. In this embodiment, the penetration region TR is C-shaped (view FIG. 1B upside down). In this embodiment, the extension line structure 400 extends outward from a single corner or a single side of the central pixel structure 100C, so that at least three sides (the upper side, the lower side, and the right side in FIG. 1B ) of the central pixel structure 100C are covered. Surrounded by penetration zone TR. In some embodiments, the penetration region TR is arranged along the shape of the innermost conductor such that a portion of the penetration region TR is located horizontally between the bending regions of the innermost conductor. For example, the second scan line 220 and/or the second data line 320 have multiple bending areas, and the penetration area TR extends to the innermost second scan line 220 and/or the phase of the second data line 320 . Between adjacent bending areas, the partial penetration area TR is horizontally located between the two bending areas of the innermost second scan line 220 and/or the second data line 320 .
基於上述,藉由延伸線路結構400的設置,使穿透區TR可以具有更大的面積,藉此改善了光線在穿過穿透式顯示面板1後出現繞射的問題。Based on the above, through the arrangement of the extended line structure 400, the transmission region TR can have a larger area, thereby improving the problem of diffraction of light after passing through the transmission display panel 1.
圖3是依照本發明的一實施例的一種穿透式顯示面板的顯示單元的上視示意圖。在此必須說明的是,圖3的實施例沿用圖1至圖2的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 3 is a schematic top view of a display unit of a transmissive display panel according to an embodiment of the present invention. It must be noted here that the embodiment of Figure 3 follows the component numbers and part of the content of the embodiment of Figures 1 to 2, where the same or similar numbers are used to represent the same or similar elements, and references to the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.
圖3的顯示單元20與圖1B的顯示單元10的主要差異在於:在顯示單元20中,中央畫素結構100C的畫素電路120與周邊畫素結構100P的畫素電路120包括不同的形狀。The main difference between the display unit 20 of FIG. 3 and the display unit 10 of FIG. 1B is that in the display unit 20, the pixel circuit 120 of the central pixel structure 100C and the pixel circuit 120 of the peripheral pixel structure 100P include different shapes.
請參考圖3,在顯示單元20中,將中央畫素結構100C的畫素電路120盡量往延伸線路結構400的位置靠近,藉此進一步增加穿透區TR的面積。Please refer to FIG. 3 . In the display unit 20 , the pixel circuit 120 of the central pixel structure 100C is moved as close as possible to the position of the extended circuit structure 400 , thereby further increasing the area of the penetration region TR.
圖4是依照本發明的一實施例的一種穿透式顯示面板的顯示單元的上視示意圖。在此必須說明的是,圖4的實施例沿用圖1至圖2的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 4 is a schematic top view of a display unit of a transmissive display panel according to an embodiment of the present invention. It must be noted here that the embodiment of Figure 4 follows the component numbers and part of the content of the embodiment of Figures 1 to 2, where the same or similar numbers are used to represent the same or similar elements, and references to the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.
圖4的顯示單元30與圖1B的顯示單元10的主要差異在於:在顯示單元30中,各顯示單元中30的周邊畫素結構100P的數量為十二個,且中央畫素結構100C的數量為四個。The main difference between the display unit 30 of FIG. 4 and the display unit 10 of FIG. 1B is that in the display unit 30, the number of peripheral pixel structures 100P of 30 in each display unit is twelve, and the number of central pixel structures 100C is for four.
請參考圖4,周邊畫素結構100P與中央畫素結構100C排成陣列,且周邊畫素結構100P排在中央畫素結構100C的外圍。在本實施例中,中央畫素結構100C與周邊畫素結構100P包括相同的結構與相同的形狀。舉例來說,中央畫素結構100C與周邊畫素結構100P各自包括多個發光元件110以及電性連接至發光元件110的畫素電路120。Referring to FIG. 4 , the peripheral pixel structures 100P and the central pixel structure 100C are arranged in an array, and the peripheral pixel structures 100P are arranged on the periphery of the central pixel structure 100C. In this embodiment, the central pixel structure 100C and the peripheral pixel structure 100P include the same structure and the same shape. For example, the central pixel structure 100C and the peripheral pixel structure 100P each include a plurality of light-emitting elements 110 and a pixel circuit 120 electrically connected to the light-emitting elements 110 .
在圖4中,第一線路結構200A, 200B、第二線路結構300A, 300B以及延伸線路結構400中位於不同導電層的導線以不同的填充圖樣表示,不同的填充圖樣所表示的導線可以分別屬於第一導電層、第二導電層、第三導電層、第四導電層或其他導電層。屬於不同導電層的導線可以透過導電孔而彼此電性連接,其中導電孔穿過導電層之間的一層或多層絕緣層。In FIG. 4 , the conductors located at different conductive layers in the first circuit structures 200A, 200B, the second circuit structures 300A, 300B and the extended circuit structure 400 are represented by different filling patterns. The conductors represented by different filling patterns can respectively belong to The first conductive layer, the second conductive layer, the third conductive layer, the fourth conductive layer or other conductive layers. Wires belonging to different conductive layers can be electrically connected to each other through conductive holes, wherein the conductive holes pass through one or more insulating layers between the conductive layers.
請參考圖4,每個顯示單元30包括兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及四個延伸線路結構400A, 400B, 400C, 400D。Please refer to FIG. 4 , each display unit 30 includes two first circuit structures 200A, 200B, two second circuit structures 300A, 300B and four extended circuit structures 400A, 400B, 400C, 400D.
兩個第一線路結構200A, 200B沿著第一方向D1延伸。第一線路結構200A, 200B各自包括多條第一掃描線210以及多條第二掃描線220。在本實施例中,部分的周邊畫素結構100P沿著第一方向D1排成兩排,且兩個第一線路結構200A, 200B分別電性連接至沿著第一方向D1排成兩排的部分的周邊畫素結構100P中對應的一排。舉例來說,第一線路結構200A中的第一掃描線210電性連接至沿著第一方向D1排列且位於最下排的周邊畫素結構100P的畫素電路120,而第一線路結構200B中的第一掃描線210電性連接至沿著第一方向D1排列且位於最上排的周邊畫素結構100P的畫素電路120。第一線路結構200A中的第二掃描線220繞過沿著第一方向D1排列且位於最下排的周邊畫素結構100P的畫素電路120,而第一線路結構200B中的第二掃描線220繞過沿著第一方向D1排列且位於最上排的周邊畫素結構100P的畫素電路120。The two first line structures 200A, 200B extend along the first direction D1. Each of the first line structures 200A and 200B includes a plurality of first scan lines 210 and a plurality of second scan lines 220 . In this embodiment, some of the peripheral pixel structures 100P are arranged in two rows along the first direction D1, and the two first line structures 200A and 200B are respectively electrically connected to the two rows arranged along the first direction D1. Part of the surrounding pixel structure corresponding to a row in 100P. For example, the first scan line 210 in the first circuit structure 200A is electrically connected to the pixel circuit 120 of the peripheral pixel structure 100P arranged along the first direction D1 and located in the bottom row, and the first circuit structure 200B The first scan line 210 in is electrically connected to the pixel circuit 120 arranged along the first direction D1 and located in the uppermost row of the peripheral pixel structure 100P. The second scan line 220 in the first circuit structure 200A bypasses the pixel circuit 120 of the peripheral pixel structure 100P arranged along the first direction D1 and located in the bottom row, while the second scan line 220 in the first circuit structure 200B 220 bypasses the pixel circuits 120 of the peripheral pixel structures 100P arranged along the first direction D1 and located in the uppermost row.
兩個第二線路結構300A, 300B沿著第二方向D2延伸。第二線路結構300A, 300B各自包括多條第一資料線310以及多條第二資料線320。在本實施例中,部分的周邊畫素結構100P沿著第二方向D2排成兩排,且兩個第二線路結構300A, 300B分別電性連接至沿著第二方向D2排成兩排的部分的周邊畫素結構100P中對應的一排。舉例來說,第二線路結構300A中的第一資料線310電性連接至沿著第二方向D2排列且位於最左排的周邊畫素結構100P的畫素電路120,而第二線路結構300B中的第一資料線310電性連接至沿著第二方向D2排列且位於最右排的周邊畫素結構100P的畫素電路120。第二線路結構300A中的第二資料線320繞過沿著第二方向D2排列且位於最左排的周邊畫素結構100P的畫素電路120,而第二線路結構300B中的第二資料線320繞過沿著第二方向D2排列且位於最右排的周邊畫素結構100P的畫素電路120。The two second circuit structures 300A, 300B extend along the second direction D2. The second line structures 300A and 300B each include a plurality of first data lines 310 and a plurality of second data lines 320 . In this embodiment, some of the peripheral pixel structures 100P are arranged in two rows along the second direction D2, and the two second line structures 300A and 300B are respectively electrically connected to the two rows arranged along the second direction D2. Part of the surrounding pixel structure corresponding to a row in 100P. For example, the first data line 310 in the second circuit structure 300A is electrically connected to the pixel circuit 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the leftmost row, and the second circuit structure 300B The first data line 310 in is electrically connected to the pixel circuit 120 arranged along the second direction D2 and located in the rightmost row of the peripheral pixel structure 100P. The second data line 320 in the second circuit structure 300A bypasses the pixel circuit 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the leftmost row, while the second data line 320 in the second circuit structure 300B 320 bypasses the pixel circuits 120 of the peripheral pixel structure 100P arranged along the second direction D2 and located in the rightmost row.
第一線路結構200A, 200B與第二線路結構300A, 300B圍繞出一個連續的穿透區TR。更具體地說,在第一線路結構200A, 200B與第二線路結構300A, 300B所圍繞的區域中,沒有任何不透光的構件會將穿透區TR區分成多個小塊。The first line structures 200A, 200B and the second line structures 300A, 300B surround a continuous penetration area TR. More specifically, in the area surrounded by the first circuit structures 200A, 200B and the second circuit structures 300A, 300B, there is no light-transmitting component that will divide the penetration region TR into a plurality of small blocks.
四個延伸線路結構400A, 400B, 400C, 400D分別電性連接四個中央畫素結構100C,且分別從四個中央畫素結構100C的位置往外延伸,並各自電性連接至第一線路結構200A, 200B中對應的一者以及第二線路結構300A, 300B中對應的一者。在本實施例中,延伸線路結構400A, 400B, 400C, 400D中的每一者從其所對應的中央畫素結構100C的其中一側往外延伸。在本實施例中,延伸線路結構400A, 400C分別自對應的一個中央畫素結構100C往第二線路結構300A延伸,而延伸線路結構400B, 400D則分別自對應的一個中央畫素結構100C往第二線路結構300B延伸。在本實施例中,延伸線路結構400A將其中一個中央畫素結構100C(位於左下角的中央畫素結構100C)電性連接至第一線路結構200A以及第二線路結構300A。延伸線路結構400B將其中一個中央畫素結構100C(位於右下角的中央畫素結構100C)電性連接至第一線路結構200A以及第二線路結構300B。延伸線路結構400C將其中一個中央畫素結構100C(位於左上角的中央畫素結構100C)電性連接至第一線路結構200B以及第二線路結構300A。延伸線路結構400D將其中一個中央畫素結構100C(位於右上角的中央畫素結構100C)電性連接至第一線路結構200B以及第二線路結構300B。舉例來說,延伸線路結構400A, 400B, 400C, 400D各自包括多條第一延伸線路410以及多條第二延伸線路420,其中第一延伸線路410分別電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者的第二掃描線220,且第二延伸線路420分別電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。The four extended circuit structures 400A, 400B, 400C, and 400D are respectively electrically connected to the four central pixel structures 100C, and respectively extend outward from the positions of the four central pixel structures 100C, and are each electrically connected to the first circuit structure 200A. , the corresponding one of 200B and the corresponding one of the second line structure 300A, 300B. In this embodiment, each of the extension line structures 400A, 400B, 400C, and 400D extends outward from one side of its corresponding central pixel structure 100C. In this embodiment, the extended circuit structures 400A and 400C respectively extend from the corresponding central pixel structure 100C to the second circuit structure 300A, and the extended circuit structures 400B and 400D respectively extend from the corresponding central pixel structure 100C to the second circuit structure 300A. Two line structure 300B extends. In this embodiment, the extended circuit structure 400A electrically connects one of the central pixel structures 100C (the central pixel structure 100C located in the lower left corner) to the first circuit structure 200A and the second circuit structure 300A. The extended circuit structure 400B electrically connects one of the central pixel structures 100C (the central pixel structure 100C located in the lower right corner) to the first circuit structure 200A and the second circuit structure 300B. The extended circuit structure 400C electrically connects one of the central pixel structures 100C (the central pixel structure 100C located in the upper left corner) to the first circuit structure 200B and the second circuit structure 300A. The extended circuit structure 400D electrically connects one of the central pixel structures 100C (the central pixel structure 100C located in the upper right corner) to the first circuit structure 200B and the second circuit structure 300B. For example, the extension line structures 400A, 400B, 400C, and 400D each include a plurality of first extension lines 410 and a plurality of second extension lines 420, wherein the first extension lines 410 are electrically connected to the first line structure 200A and the second extension line 420 respectively. A second scan line 220 of a corresponding one of the circuit structures 200B, and the second extension circuit 420 is electrically connected to the second data of the corresponding one of the second circuit structure 300A and the second circuit structure 300B respectively. Line 320.
在一些實施例中,延伸線路結構400A, 400B, 400C, 400D與第一線路結構200A, 200B之間及/或延伸線路結構400A, 400B, 400C, 400D與第二線路結構300A, 300B之間透過多個導通孔而電性連接。舉例來說,第一延伸線路410與第二掃描線220屬於不同導電層,因此第一延伸線路410與第二掃描線220透過導通孔412而電性連接。舉例來說,第二延伸線路420與第二資料線320屬於不同導電層,因此第二延伸線路420與第二資料線320透過導通孔422而電性連接。在一些實施例中,導通孔412, 422與中央畫素結構100C的距離大於導通孔412, 422與周邊畫素結構100P的距離。藉由導通孔412, 422集中在顯示單元30的外圍,可以提升穿透區TR的面積。In some embodiments, between the extended circuit structures 400A, 400B, 400C, 400D and the first circuit structures 200A, 200B and/or between the extended circuit structures 400A, 400B, 400C, 400D and the second circuit structures 300A, 300B. A plurality of via holes are electrically connected. For example, the first extension line 410 and the second scan line 220 belong to different conductive layers, so the first extension line 410 and the second scan line 220 are electrically connected through the via hole 412 . For example, the second extension line 420 and the second data line 320 belong to different conductive layers, so the second extension line 420 and the second data line 320 are electrically connected through the via hole 422 . In some embodiments, the distance between the via holes 412 and 422 and the central pixel structure 100C is greater than the distance between the via holes 412 and 422 and the peripheral pixel structure 100P. By concentrating the via holes 412 and 422 on the periphery of the display unit 30, the area of the penetration region TR can be increased.
在本實施例中,在第二方向D2上排列的四個周邊畫素結構100P中,位於中間的兩個周邊畫素結構100P透過多條第一訊號線510以及導通孔512而電性連接至多條第一延伸線路410,進而透過多條第一延伸線路410而電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者中的多條第二掃描線220。In this embodiment, among the four peripheral pixel structures 100P arranged in the second direction D2, the two peripheral pixel structures 100P in the middle are electrically connected through a plurality of first signal lines 510 and via holes 512. The first extension lines 410 are in turn electrically connected to the plurality of second scan lines 220 in the corresponding one of the first line structure 200A and the first line structure 200B through the plurality of first extension lines 410 .
在本實施例中,在第一方向D1上排列的四個周邊畫素結構100P中,位於中間的周邊畫素結構100P透過多條第二訊號線520以及導通孔522而電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。在圖4的實施例中,第二訊號線520沿著第一方向D1延伸,且靠近第一線路結構200A或第一線路結構200B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the first direction D1, the central peripheral pixel structure 100P is electrically connected to the second peripheral pixel structure 100P through a plurality of second signal lines 520 and via holes 522. The second data line 320 in the corresponding one of the line structure 300A and the second line structure 300B. In the embodiment of FIG. 4 , the second signal line 520 extends along the first direction D1 and is disposed close to the first circuit structure 200A or the first circuit structure 200B.
在一些實施例中,每個顯示單元30還包括黑矩陣(未繪出),黑矩陣遮蔽兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及至少一個延伸線路結構400A, 400B, 400C, 400D,且黑矩陣遮蔽部分中央畫素結構100C與部分周邊畫素結構100P,並暴露出中央畫素結構100C的發光元件110、周邊畫素結構100P的發光元件110以及穿透區TR。在本實施例中,穿透區TR為王字型。在本實施例中,延伸線路結構400A, 400B, 400C, 400D分別自對應的中央畫素結構100C的單一角落或單一側向外延伸,使每個中央畫素結構100C的至少三個側被穿透區TR所包圍。In some embodiments, each display unit 30 further includes a black matrix (not shown), which shields two first circuit structures 200A, 200B, two second circuit structures 300A, 300B and at least one extension circuit structure 400A. , 400B, 400C, 400D, and the black matrix covers part of the central pixel structure 100C and part of the peripheral pixel structure 100P, and exposes the light-emitting element 110 of the central pixel structure 100C, the light-emitting element 110 of the peripheral pixel structure 100P, and the penetration District TR. In this embodiment, the penetration area TR is king-shaped. In this embodiment, the extended line structures 400A, 400B, 400C, and 400D respectively extend outward from a single corner or a single side of the corresponding central pixel structure 100C, so that at least three sides of each central pixel structure 100C are penetrated. surrounded by transparent zone TR.
基於上述,藉由延伸線路結構400A, 400B, 400C, 400D的設置,使穿透區TR可以具有更大的面積,藉此改善了光線在穿過穿透式顯示面板後出現繞射的問題。Based on the above, through the arrangement of the extended line structures 400A, 400B, 400C, and 400D, the transmission region TR can have a larger area, thereby improving the problem of diffraction of light after passing through the transmission display panel.
圖5是依照本發明的一實施例的一種穿透式顯示面板的顯示單元的上視示意圖。在此必須說明的是,圖5的實施例沿用圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 5 is a schematic top view of a display unit of a transmissive display panel according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 5 follows the component numbers and part of the content of the embodiment of FIG. 4 , where the same or similar numbers are used to represent the same or similar elements, and descriptions of the same technical content are omitted. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.
圖5的顯示單元40與圖4的顯示單元30的主要差異在於:在顯示單元30中,延伸線路結構400A, 400B, 400C, 400D分別從對應的中央畫素結構100C往對應的第二線路結構300A, 300B延伸,而在顯示單元40中,延伸線路結構400A, 400B, 400C, 400D分別從對應的中央畫素結構100C往對應的第一線路結構200A, 200B延伸。The main difference between the display unit 40 of FIG. 5 and the display unit 30 of FIG. 4 is that in the display unit 30, the extended line structures 400A, 400B, 400C, and 400D respectively extend from the corresponding central pixel structure 100C to the corresponding second line structure. 300A, 300B extend, and in the display unit 40, the extended line structures 400A, 400B, 400C, and 400D respectively extend from the corresponding central pixel structure 100C to the corresponding first line structures 200A, 200B.
請參考圖5,四個延伸線路結構400A, 400B, 400C, 400D分別從四個中央畫素結構100C的位置往外延伸,且各自電性連接至第一線路結構200A, 200B中對應的一者以及第二線路結構300A, 300B中對應的一者。在本實施例中,延伸線路結構400A, 400B, 400C, 400D中的每一者從其所對應的中央畫素結構100C的其中一側往外延伸。在本實施例中,延伸線路結構400A, 400B分別自對應的一個中央畫素結構100C往第一線路結構200A延伸,而延伸線路結構400C, 400D則分別自對應的一個中央畫素結構100C往第一線路結構200B延伸。舉例來說,延伸線路結構400A, 400B, 400C, 400D各自包括多條第一延伸線路410以及多條第二延伸線路420,其中第一延伸線路410分別電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者的第二掃描線220,且第二延伸線路420分別電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。舉例來說,第二資料線320透過導通孔522而電性連接至第二訊號線520,且第二訊號線520透過導通孔524而電性連接至第二延伸線路420。Please refer to Figure 5. The four extended circuit structures 400A, 400B, 400C, and 400D respectively extend outward from the positions of the four central pixel structures 100C, and are each electrically connected to a corresponding one of the first circuit structures 200A, 200B and Corresponding one of the second line structures 300A, 300B. In this embodiment, each of the extension line structures 400A, 400B, 400C, and 400D extends outward from one side of its corresponding central pixel structure 100C. In this embodiment, the extended circuit structures 400A and 400B respectively extend from the corresponding central pixel structure 100C to the first circuit structure 200A, and the extended circuit structures 400C and 400D respectively extend from the corresponding central pixel structure 100C to the first circuit structure 200A. A line structure 200B extends. For example, the extension line structures 400A, 400B, 400C, and 400D each include a plurality of first extension lines 410 and a plurality of second extension lines 420, wherein the first extension lines 410 are electrically connected to the first line structure 200A and the second extension line 420 respectively. A second scan line 220 of a corresponding one of the circuit structures 200B, and the second extension circuit 420 is electrically connected to the second data of the corresponding one of the second circuit structure 300A and the second circuit structure 300B respectively. Line 320. For example, the second data line 320 is electrically connected to the second signal line 520 through the via hole 522 , and the second signal line 520 is electrically connected to the second extension line 420 through the via hole 524 .
在本實施例中,在第二方向D2上排列的四個周邊畫素結構100P中,位於中間的兩個周邊畫素結構100P透過多條第一訊號線510以及導通孔512而電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者中的多條第二掃描線220。在圖5的實施例中,第一訊號線510沿著第二方向D2延伸,且靠近第二線路結構300A或第二線路結構300B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the second direction D2, the two peripheral pixel structures 100P in the middle are electrically connected to A plurality of second scan lines 220 in a corresponding one of the first line structure 200A and the first line structure 200B. In the embodiment of FIG. 5 , the first signal line 510 extends along the second direction D2 and is disposed close to the second circuit structure 300A or the second circuit structure 300B.
在本實施例中,在第一方向D1上排列的四個周邊畫素結構100P中,位於中間的周邊畫素結構100P透過多條第二延伸線路420以及多條第二訊號線520而電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。在圖5的實施例中,第二訊號線520沿著第一方向D1延伸,且靠近第一線路結構200A或第一線路結構200B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the first direction D1, the peripheral pixel structure 100P located in the middle is electrically connected through a plurality of second extension lines 420 and a plurality of second signal lines 520. Connected to the second data line 320 in the corresponding one of the second circuit structure 300A and the second circuit structure 300B. In the embodiment of FIG. 5 , the second signal line 520 extends along the first direction D1 and is disposed close to the first circuit structure 200A or the first circuit structure 200B.
在一些實施例中,每個顯示單元40還包括黑矩陣(未繪出),黑矩陣遮蔽兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及延伸線路結構400A, 400B, 400C, 400D,且黑矩陣遮蔽部分中央畫素結構100C與部分周邊畫素結構100P,並暴露出中央畫素結構100C的發光元件110、周邊畫素結構100P的發光元件110以及穿透區TR。在本實施例中,穿透區TR為卅字形。在本實施例中,延伸線路結構400A, 400B, 400C, 400D分別自對應的中央畫素結構100C的單一角落或單一側向外延伸,使每個中央畫素結構100C的至少三個側被穿透區TR所包圍。In some embodiments, each display unit 40 further includes a black matrix (not shown), which shields the two first circuit structures 200A, 200B, the two second circuit structures 300A, 300B and the extended circuit structures 400A, 400B. , 400C, 400D, and the black matrix covers part of the central pixel structure 100C and part of the peripheral pixel structure 100P, and exposes the light-emitting element 110 of the central pixel structure 100C, the light-emitting element 110 of the peripheral pixel structure 100P and the penetration area TR . In this embodiment, the penetration region TR is in a swastika shape. In this embodiment, the extended line structures 400A, 400B, 400C, and 400D respectively extend outward from a single corner or a single side of the corresponding central pixel structure 100C, so that at least three sides of each central pixel structure 100C are penetrated. surrounded by transparent zone TR.
基於上述,藉由延伸線路結構400A, 400B, 400C, 400D的設置,使穿透區TR可以具有更大的面積,藉此改善了光線在穿過穿透式顯示面板後出現繞射的問題。Based on the above, through the arrangement of the extended line structures 400A, 400B, 400C, and 400D, the transmission region TR can have a larger area, thereby improving the problem of diffraction of light after passing through the transmission display panel.
圖6A與圖6B是依照本發明的一實施例的一種穿透式顯示面板的顯示單元的上視示意圖。在此必須說明的是,圖6A與圖6B的實施例沿用圖5的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。6A and 6B are schematic top views of a display unit of a transmissive display panel according to an embodiment of the present invention. It must be noted here that the embodiments of FIGS. 6A and 6B follow the component numbers and part of the content of the embodiment of FIG. 5 , where the same or similar numbers are used to represent the same or similar elements, and references with the same technical content are omitted. instruction. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.
在圖6A與圖6B的實施例中,每個穿透式顯示面板包括多個顯示單元50A與多個顯示單元50B,顯示單元50A與顯示單元50B結構相似,且彼此對稱。為了省略篇幅,以下以圖6A的顯示單元50A為主進行說明。In the embodiment of FIG. 6A and FIG. 6B , each transmissive display panel includes a plurality of display units 50A and a plurality of display units 50B. The display units 50A and the display units 50B have similar structures and are symmetrical to each other. In order to omit space, the following description will mainly focus on the display unit 50A in FIG. 6A .
圖6A的顯示單元50A與圖4的顯示單元30的主要差異在於:在顯示單元50A中,延伸線路結構400A, 400B, 400C, 400D分別自中央畫素結構100C的朝向不同方向的角落或朝向不同方向的一側往外延伸。The main difference between the display unit 50A of FIG. 6A and the display unit 30 of FIG. 4 is that in the display unit 50A, the extended line structures 400A, 400B, 400C, and 400D are respectively oriented from corners or in different directions of the central pixel structure 100C. One side of the direction extends outward.
四個延伸線路結構400A, 400B, 400C, 400D分別從四個中央畫素結構100C的位置往外延伸,且各自電性連接至第一線路結構200A, 200B中對應的一者以及第二線路結構300A, 300B中對應的一者。舉例來說,在顯示單元50A中,延伸線路結構400A, 400B, 400C, 400D分別自中央畫素結構100C中對應的一者往不同的方向延伸,延伸線路結構400A自對應的一個中央畫素結構100C的朝向下方的一側往外延伸,延伸線路結構400B自對應的一個中央畫素結構100C的朝向右方的一側往外延伸,延伸線路結構400C自對應的一個中央畫素結構100C的朝向左方的一側往外延伸,延伸線路結構400D自對應的一個中央畫素結構100C的朝向上方的一側往外延伸。在本實施例中,延伸線路結構400A自對應的一個中央畫素結構100C往第一線路結構200A延伸,而延伸線路結構400B自對應的一個中央畫素結構100C往第二線路結構300B延伸,延伸線路結構400C自對應的一個中央畫素結構100C往第二線路結構300A延伸,而延伸線路結構400D自對應的一個中央畫素結構100C往第一線路結構200B延伸。The four extended circuit structures 400A, 400B, 400C, and 400D respectively extend outward from the positions of the four central pixel structures 100C, and are each electrically connected to the corresponding one of the first circuit structures 200A, 200B and the second circuit structure 300A. , the corresponding one in 300B. For example, in the display unit 50A, the extended line structures 400A, 400B, 400C, and 400D respectively extend in different directions from the corresponding one of the central pixel structures 100C, and the extended line structure 400A extends from the corresponding one of the central pixel structures 100C. The downward-facing side of 100C extends outward, the extended line structure 400B extends outward from the right-facing side of the corresponding central pixel structure 100C, and the extended line structure 400C extends from the left-facing side of the corresponding central pixel structure 100C. The extension line structure 400D extends outward from the upward side of the corresponding central pixel structure 100C. In this embodiment, the extended circuit structure 400A extends from a corresponding central pixel structure 100C to the first circuit structure 200A, and the extended circuit structure 400B extends from a corresponding central pixel structure 100C to the second circuit structure 300B. The circuit structure 400C extends from the corresponding central pixel structure 100C to the second circuit structure 300A, and the extended circuit structure 400D extends from the corresponding central pixel structure 100C to the first circuit structure 200B.
舉例來說,延伸線路結構400A, 400B, 400C, 400D各自包括多條第一延伸線路410以及多條第二延伸線路420,其中第一延伸線路410分別電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者的第二掃描線220,且第二延伸線路420分別電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。For example, the extension line structures 400A, 400B, 400C, and 400D each include a plurality of first extension lines 410 and a plurality of second extension lines 420, wherein the first extension lines 410 are electrically connected to the first line structure 200A and the second extension line 420 respectively. A second scan line 220 of a corresponding one of the circuit structures 200B, and the second extension circuit 420 is electrically connected to the second data of the corresponding one of the second circuit structure 300A and the second circuit structure 300B respectively. Line 320.
在本實施例中,第二掃描線220透過導通孔412而電性連接至延伸線路結構400A以及延伸線路結構400D的第一延伸線路410,且第二資料線320透過第二訊號線520而電性連接至延伸線路結構400A以及延伸線路結構400D的第二延伸線路420。第二資料線320透過導通孔522而電性連接至第二訊號線520,且第二訊號線520透過導通孔524而電性連接至延伸線路結構400A以及延伸線路結構400D的第二延伸線路420。In this embodiment, the second scan line 220 is electrically connected to the extension line structure 400A and the first extension line 410 of the extension line structure 400D through the via hole 412, and the second data line 320 is electrically connected to the second signal line 520 through the second signal line 520. The second extension line 420 is electrically connected to the extension line structure 400A and the extension line structure 400D. The second data line 320 is electrically connected to the second signal line 520 through the via hole 522 , and the second signal line 520 is electrically connected to the extension line structure 400A and the second extension line 420 of the extension line structure 400D through the via hole 524 .
在本實施例中,第二掃描線220透過第三訊號線530而電性連接至延伸線路結構400B以及延伸線路結構400C的第一延伸線路410。第二掃描線220透過導通孔532而電性連接至第三訊號線530,且第三訊號線530透過導通孔534而電性連接至延伸線路結構400B以及延伸線路結構400C的第一延伸線路410。第二資料線320透過導通孔422而電性連接至延伸線路結構400B以及延伸線路結構400C的第二延伸線路420。In this embodiment, the second scan line 220 is electrically connected to the extension line structure 400B and the first extension line 410 of the extension line structure 400C through the third signal line 530 . The second scan line 220 is electrically connected to the third signal line 530 through the via hole 532, and the third signal line 530 is electrically connected to the extension line structure 400B and the first extension line 410 of the extension line structure 400C through the via hole 534. . The second data line 320 is electrically connected to the extension line structure 400B and the second extension line 420 of the extension line structure 400C through the via hole 422 .
在本實施例中,在第二方向D2上排列的四個周邊畫素結構100P中,位於中間的兩個周邊畫素結構100P中的其中一者透過多條第一訊號線510以及導通孔512而電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者中的多條第二掃描線220。在第二方向D2上排列的四個周邊畫素結構100P中,位於中間的兩個周邊畫素結構100P中的其中另一者透過多條第一延伸線路410以及多條第三訊號線530而電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者中的多條第二掃描線220。在圖6A的實施例中,第一訊號線510以及第三訊號線530沿著第二方向D2延伸,且靠近第二線路結構300A或第二線路結構300B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the second direction D2, one of the two peripheral pixel structures 100P located in the middle passes through the plurality of first signal lines 510 and the via holes 512 And are electrically connected to the plurality of second scan lines 220 in the corresponding one of the first circuit structure 200A and the first circuit structure 200B. Among the four peripheral pixel structures 100P arranged in the second direction D2, the other one of the two peripheral pixel structures 100P located in the middle is connected through the plurality of first extension lines 410 and the plurality of third signal lines 530. Electrically connected to the plurality of second scan lines 220 in the corresponding one of the first circuit structure 200A and the first circuit structure 200B. In the embodiment of FIG. 6A , the first signal line 510 and the third signal line 530 extend along the second direction D2 and are disposed close to the second circuit structure 300A or the second circuit structure 300B.
在本實施例中,在第一方向D1上排列的四個周邊畫素結構100P中位於中間的兩個周邊畫素結構100P的其中一者透過多條第二延伸線路420以及多條第二訊號線520而電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。在第一方向D1上排列的四個周邊畫素結構100P中位於中間的兩個周邊畫素結構100P的其中另一者透過多條第四訊號線540以及導通孔542而電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。在圖6A的實施例中,第二訊號線520與第四訊號線540沿著第一方向D1延伸,且靠近第一線路結構200A或第一線路結構200B設置。In this embodiment, one of the two peripheral pixel structures 100P located in the middle among the four peripheral pixel structures 100P arranged in the first direction D1 passes through the plurality of second extension lines 420 and the plurality of second signals. The line 520 is electrically connected to the second data line 320 in the corresponding one of the second circuit structure 300A and the second circuit structure 300B. The other of the two peripheral pixel structures 100P located in the middle among the four peripheral pixel structures 100P arranged in the first direction D1 is electrically connected to the second peripheral pixel structure 100P through a plurality of fourth signal lines 540 and via holes 542 . The second data line 320 in the corresponding one of the line structure 300A and the second line structure 300B. In the embodiment of FIG. 6A , the second signal line 520 and the fourth signal line 540 extend along the first direction D1 and are disposed close to the first circuit structure 200A or the first circuit structure 200B.
在一些實施例中,每個顯示單元50A還包括黑矩陣(未繪出),黑矩陣遮蔽兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及延伸線路結構400A, 400B, 400C, 400D,且黑矩陣遮蔽部分中央畫素結構100C與部分周邊畫素結構100P,並暴露出中央畫素結構100C的發光元件110、周邊畫素結構100P的發光元件110以及穿透區TR。在本實施例中,穿透區TR為卍字形。在本實施例中,延伸線路結構400A, 400B, 400C, 400D分別自對應的中央畫素結構100C的單一角落或單一側向外延伸,使每個中央畫素結構100C的至少三個側被穿透區TR所包圍。In some embodiments, each display unit 50A further includes a black matrix (not shown), which shields the two first circuit structures 200A, 200B, the two second circuit structures 300A, 300B and the extended circuit structures 400A, 400B. , 400C, 400D, and the black matrix covers part of the central pixel structure 100C and part of the peripheral pixel structure 100P, and exposes the light-emitting element 110 of the central pixel structure 100C, the light-emitting element 110 of the peripheral pixel structure 100P and the penetration area TR . In this embodiment, the penetration region TR is in the shape of a swastika. In this embodiment, the extended line structures 400A, 400B, 400C, and 400D respectively extend outward from a single corner or a single side of the corresponding central pixel structure 100C, so that at least three sides of each central pixel structure 100C are penetrated. surrounded by transparent zone TR.
基於上述,藉由延伸線路結構400A, 400B, 400C, 400D的設置,使穿透區TR可以具有更大的面積,藉此改善了光線在穿過穿透式顯示面板後出現繞射的問題。Based on the above, through the arrangement of the extended line structures 400A, 400B, 400C, and 400D, the transmission region TR can have a larger area, thereby improving the problem of diffraction of light after passing through the transmission display panel.
圖7是依照本發明的一實施例的一種穿透式顯示面板的顯示單元的上視示意圖。在此必須說明的是,圖7的實施例沿用圖6A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 7 is a schematic top view of a display unit of a transmissive display panel according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 7 follows the component numbers and part of the content of the embodiment of FIG. 6A , where the same or similar numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For descriptions of omitted parts, reference may be made to the foregoing embodiments and will not be described again here.
圖7的顯示單元60與圖6A的顯示單元50A的主要差異在於:在顯示單元60中,延伸線路結構400A自對應的一個中央畫素結構100C的朝向左下方的角落往外延伸,延伸線路結構400B自對應的一個中央畫素結構100C的朝向右下方的角落往外延伸,延伸線路結構400C自對應的一個中央畫素結構100C的朝向左上方的角落往外延伸,延伸線路結構400D自對應的一個中央畫素結構100C的朝向右上方的角落往外延伸。The main difference between the display unit 60 of FIG. 7 and the display unit 50A of FIG. 6A is that in the display unit 60, the extension line structure 400A extends outward from the corresponding lower left corner of a central pixel structure 100C, and the extension line structure 400B Extending outward from the lower-right corner of the corresponding central pixel structure 100C, the extended line structure 400C extends outward from the upper-left corner of the corresponding central pixel structure 100C, and the extended line structure 400D extends from the corresponding central pixel structure 100C. The corner of the element structure 100C extends outward toward the upper right corner.
四個延伸線路結構400A, 400B, 400C, 400D分別從四個中央畫素結構100C的位置往外延伸,且各自電性連接至第一線路結構200A, 200B中對應的一者以及第二線路結構300A, 300B中對應的一者。在本實施例中,延伸線路結構400A, 400B, 400C, 400D中的每一者從其所對應的中央畫素結構100C的其中一角落往外延伸。在本實施例中,延伸線路結構400A自對應的一個中央畫素結構100C往第一線路結構200A與第二線路結構300A的交叉處延伸,而延伸線路結構400B自對應的一個中央畫素結構100C往第一線路結構200A與第二線路結構300B的交叉處延伸,延伸線路結構400C自對應的一個中央畫素結構100C往第一線路結構200B與第二線路結構300A的交叉處延伸,而延伸線路結構400D自對應的一個中央畫素結構100C往第一線路結構200B與第二線路結構300B的交叉處延伸。The four extended circuit structures 400A, 400B, 400C, and 400D respectively extend outward from the positions of the four central pixel structures 100C, and are each electrically connected to the corresponding one of the first circuit structures 200A, 200B and the second circuit structure 300A. , the corresponding one in 300B. In this embodiment, each of the extension line structures 400A, 400B, 400C, and 400D extends outward from one corner of its corresponding central pixel structure 100C. In this embodiment, the extended circuit structure 400A extends from a corresponding central pixel structure 100C to the intersection of the first circuit structure 200A and the second circuit structure 300A, and the extended circuit structure 400B extends from a corresponding central pixel structure 100C. Extending toward the intersection of the first circuit structure 200A and the second circuit structure 300B, the extended circuit structure 400C extends from a corresponding central pixel structure 100C to the intersection of the first circuit structure 200B and the second circuit structure 300A, and the extended circuit The structure 400D extends from a corresponding central pixel structure 100C to the intersection of the first line structure 200B and the second line structure 300B.
舉例來說,延伸線路結構400A, 400B, 400C, 400D各自包括多條第一延伸線路410以及多條第二延伸線路420,其中第一延伸線路410分別電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者的第二掃描線220,且第二延伸線路420分別電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。For example, the extension line structures 400A, 400B, 400C, and 400D each include a plurality of first extension lines 410 and a plurality of second extension lines 420, wherein the first extension lines 410 are electrically connected to the first line structure 200A and the second extension line 420 respectively. A second scan line 220 of a corresponding one of the circuit structures 200B, and the second extension circuit 420 is electrically connected to the second data of the corresponding one of the second circuit structure 300A and the second circuit structure 300B respectively. Line 320.
在本實施例中,第二掃描線220電性連接至延伸線路結構400A, 400B, 400C, 400D的第一延伸線路410,且第二資料線320電性連接至延伸線路結構400A, 400B, 400C, 400D的第二延伸線路420。In this embodiment, the second scan line 220 is electrically connected to the first extension line 410 of the extension line structures 400A, 400B, 400C, and 400D, and the second data line 320 is electrically connected to the extension line structures 400A, 400B, and 400C. , the second extension line 420 of 400D.
在一些實施例中,延伸線路結構400A, 400B, 400C, 400D與第一線路結構200A, 200B之間及/或延伸線路結構400A, 400B, 400C, 400D與第二線路結構300A, 300B之間透過多個導通孔而電性連接。舉例來說,第一延伸線路410與第二掃描線220屬於不同導電層,因此第一延伸線路410與第二掃描線220透過導通孔412而電性連接。舉例來說,第二延伸線路420與第二資料線320屬於不同導電層,因此第二延伸線路420與第二資料線320透過導通孔422而電性連接。在一些實施例中,導通孔412, 422與中央畫素結構100C的距離大於導通孔412, 422與周邊畫素結構100P的距離。藉由導通孔412, 422集中在顯示單元60的外圍,可以提升穿透區TR的面積。In some embodiments, between the extended circuit structures 400A, 400B, 400C, 400D and the first circuit structures 200A, 200B and/or between the extended circuit structures 400A, 400B, 400C, 400D and the second circuit structures 300A, 300B. A plurality of via holes are electrically connected. For example, the first extension line 410 and the second scan line 220 belong to different conductive layers, so the first extension line 410 and the second scan line 220 are electrically connected through the via hole 412 . For example, the second extension line 420 and the second data line 320 belong to different conductive layers, so the second extension line 420 and the second data line 320 are electrically connected through the via hole 422 . In some embodiments, the distance between the via holes 412 and 422 and the central pixel structure 100C is greater than the distance between the via holes 412 and 422 and the peripheral pixel structure 100P. By concentrating the via holes 412 and 422 on the periphery of the display unit 60, the area of the penetration region TR can be increased.
在本實施例中,在第二方向D2上排列的四個周邊畫素結構100P中,位於中間的兩個周邊畫素結構100P透過多條第一訊號線510以及導通孔512而電性連接至第一線路結構200A以及第一線路結構200B中的對應的一者中的多條第二掃描線220。在圖7的實施例中,第一訊號線510沿著第二方向D2延伸,且靠近第二線路結構300A或第二線路結構300B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the second direction D2, the two peripheral pixel structures 100P in the middle are electrically connected to A plurality of second scan lines 220 in a corresponding one of the first line structure 200A and the first line structure 200B. In the embodiment of FIG. 7 , the first signal line 510 extends along the second direction D2 and is disposed close to the second circuit structure 300A or the second circuit structure 300B.
在本實施例中,在第一方向D1上排列的四個周邊畫素結構100P中,位於中間的周邊畫素結構100P透過多條第二訊號線520以及導通孔522而電性連接至第二線路結構300A以及第二線路結構300B中的對應的一者中的第二資料線320。在圖7的實施例中,第二訊號線520沿著第一方向D1延伸,且靠近第一線路結構200A或第一線路結構200B設置。In this embodiment, among the four peripheral pixel structures 100P arranged in the first direction D1, the central peripheral pixel structure 100P is electrically connected to the second peripheral pixel structure 100P through a plurality of second signal lines 520 and via holes 522. The second data line 320 in the corresponding one of the line structure 300A and the second line structure 300B. In the embodiment of FIG. 7 , the second signal line 520 extends along the first direction D1 and is disposed close to the first circuit structure 200A or the first circuit structure 200B.
在一些實施例中,每個顯示單元60還包括黑矩陣(未繪出),黑矩陣遮蔽兩個第一線路結構200A, 200B、兩個第二線路結構300A, 300B以及延伸線路結構400A, 400B, 400C, 400D,且黑矩陣遮蔽部分中央畫素結構100C與部分周邊畫素結構100P,並暴露出中央畫素結構100C的發光元件110、周邊畫素結構100P的發光元件110以及穿透區TR。在本實施例中,穿透區TR為米字型。在本實施例中,延伸線路結構400A, 400B, 400C, 400D分別自對應的中央畫素結構100C的單一角落或單一側向外延伸,使每個中央畫素結構100C的至少三個側被穿透區TR所包圍。In some embodiments, each display unit 60 further includes a black matrix (not shown), which shields the two first circuit structures 200A, 200B, the two second circuit structures 300A, 300B and the extended circuit structures 400A, 400B. , 400C, 400D, and the black matrix covers part of the central pixel structure 100C and part of the peripheral pixel structure 100P, and exposes the light-emitting element 110 of the central pixel structure 100C, the light-emitting element 110 of the peripheral pixel structure 100P and the penetration area TR . In this embodiment, the penetration area TR is in the shape of a rice. In this embodiment, the extended line structures 400A, 400B, 400C, and 400D respectively extend outward from a single corner or a single side of the corresponding central pixel structure 100C, so that at least three sides of each central pixel structure 100C are penetrated. surrounded by transparent zone TR.
基於上述,藉由延伸線路結構400A, 400B, 400C, 400D的設置,使穿透區TR可以具有更大的面積,藉此改善了光線在穿過穿透式顯示面板後出現繞射的問題。Based on the above, through the arrangement of the extended line structures 400A, 400B, 400C, and 400D, the transmission region TR can have a larger area, thereby improving the problem of diffraction of light after passing through the transmission display panel.
圖8A是依照本發明的一比較例的一種穿透式顯示面板的顯示單元的穿透區與非穿透區的示意圖。圖8B至圖8D是依照本發明的一些實施例的一種穿透式顯示面板的顯示單元的穿透區與非穿透區的示意圖。在圖8A至圖8D中,黑色的區域為非穿透區,而白色的區域為穿透區。在圖8A中,多個橫向延伸的黑色長條與多個縱向延伸的黑色長條構成非穿透區,線路結構與畫素結構設置於非穿透區中,其中畫素結構設置於橫向延伸的黑色長條與縱向延伸的黑色長條的交錯位置。在圖8A中,每四個畫素結構就對應了一個穿透區。圖8B為圖7的顯示單元60的穿透區與非穿透區的示意圖。圖8C為圖4的顯示單元30的穿透區與非穿透區的示意圖。圖8D為圖6B的顯示單元50B的穿透區與非穿透區的示意圖。8A is a schematic diagram of the transmissive area and the non-transmissive area of a display unit of a transmissive display panel according to a comparative example of the present invention. 8B to 8D are schematic diagrams of the transmissive area and the non-transmissive area of a display unit of a transmissive display panel according to some embodiments of the present invention. In FIGS. 8A to 8D , the black area is the non-penetrating area, and the white area is the penetrating area. In FIG. 8A , a plurality of transversely extending black strips and a plurality of longitudinally extending black strips constitute a non-penetrating area. The circuit structure and the pixel structure are arranged in the non-penetrating area, and the pixel structure is arranged in a transversely extending area. The staggered position of the long black strips and the long black strips extending vertically. In Figure 8A, every four pixel structures correspond to a penetration area. FIG. 8B is a schematic diagram of the transmissive area and the non-transmissive area of the display unit 60 of FIG. 7 . FIG. 8C is a schematic diagram of the transmissive area and the non-transmissive area of the display unit 30 of FIG. 4 . FIG. 8D is a schematic diagram of the transmissive area and the non-transmissive area of the display unit 50B in FIG. 6B.
在模擬各種顯示單元的繞射情形後,可以得知在穿透區比例差不多的情況下,圖8D所對應的顯示單元能較佳的改善繞射問題,其次為圖8C所對應的顯示單元,再來為圖8B所對應的顯示單元。圖8A所對應的顯示單元的繞射問題最為嚴重。After simulating the diffraction situation of various display units, it can be seen that when the ratio of the penetration area is similar, the display unit corresponding to Figure 8D can better improve the diffraction problem, followed by the display unit corresponding to Figure 8C. Next is the display unit corresponding to Figure 8B. The diffraction problem of the display unit corresponding to Figure 8A is the most serious.