TWI828569B - Light-emitting device and manufacturing method thereof - Google Patents
Light-emitting device and manufacturing method thereof Download PDFInfo
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- TWI828569B TWI828569B TW112111776A TW112111776A TWI828569B TW I828569 B TWI828569 B TW I828569B TW 112111776 A TW112111776 A TW 112111776A TW 112111776 A TW112111776 A TW 112111776A TW I828569 B TWI828569 B TW I828569B
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Abstract
Description
本發明係與發光裝置有關,特別是指一種量子點材料之封裝結構及其製作方法。 The present invention relates to a light-emitting device, and in particular, to a packaging structure of quantum dot material and a manufacturing method thereof.
發光二極體(Light-Emitting Diode;LED)具有低耗電量、低發熱量、操作壽命長、耐撞擊、體積小以及反應速度快等特性,因此廣泛應用於各種需要使用發光元件的領域,例如,車輛、家電、及照明燈具等。波長轉換材料,例如:螢光粉,是一種光致發光的物質,它可以吸收LED所發出的第一光線後發出不同頻譜之第二光線。波長轉換材料覆蓋發光二極體可作為發光裝置的一種結構。 Light-Emitting Diode (LED) has the characteristics of low power consumption, low heat generation, long operating life, impact resistance, small size, and fast response speed. Therefore, it is widely used in various fields that require the use of light-emitting elements. For example, vehicles, home appliances, and lighting fixtures, etc. Wavelength conversion material, such as phosphor, is a photoluminescent substance that can absorb the first light emitted by the LED and then emit a second light of a different spectrum. The wavelength conversion material covering the light emitting diode can be used as a structure of the light emitting device.
近年來,隨著大眾對於顯示器影像品質的要求不斷提高,使得廣色域(wide color gamut)的技術開發已成為顯示器目前最重要的技術發展之一,其中美國國家電視系統委員會(National Television System Committee,縮寫為NTSC)提供廣色域的判斷標準。一般而言,顯示器中,若使用螢光粉其NTSC約為70~80%,使用量子點(QD)材料的NTSC可至100%,更能符合廣色域的需求。 In recent years, as the public's requirements for display image quality continue to increase, the technology development of wide color gamut has become one of the most important technological developments in displays. Among them, the National Television System Committee of the United States , abbreviated as NTSC) provides a judgment standard for wide color gamut. Generally speaking, in displays, if phosphor is used, the NTSC is about 70~80%, and if quantum dot (QD) materials are used, the NTSC can be as high as 100%, which can better meet the needs of a wide color gamut.
如第1圖所示,為發光裝置的一種,晶片級封裝(Chip Scale Package;CSP)的結構。發光裝置包含發光元件1,例如:LED,發光元件1的底面設有電極
2,以及在發光元件1之表面覆蓋一層封裝膠3。封裝膠3一般則是混有螢光粉的矽樹脂。若為了達到更高的NTSC,將傳統的螢光粉用量子點材料取代。因為量子點材料的特性容易被水汽及氧氣所影響,而矽樹脂又容易被水汽及氧氣所滲透,因此,將產生晶片級封裝的發光效率下降的問題。為此,如何改善量子點材料的封裝以有效阻隔水汽及氧氣已成為業界迫切急待追求的目標。
As shown in Figure 1, it is a type of light-emitting device, the structure of a wafer scale package (CSP). The light-emitting device includes a light-emitting
本發明主要目的係提供一種發光裝置及其製作方法,將量子點材料(QD material)密封在由發光元件以及具有凹陷部之覆蓋層所構成封裝結構之中裝。藉由覆蓋層與發光元件將水氧與量子點材料阻隔,避免量子點材料受到水汽及氧氣的侵蝕而影響發光效率。 The main purpose of the present invention is to provide a light-emitting device and a manufacturing method thereof, which seal a quantum dot material (QD material) in a packaging structure composed of a light-emitting element and a covering layer with a recessed portion. The covering layer and the light-emitting element block water and oxygen from the quantum dot material, preventing the quantum dot material from being corroded by water vapor and oxygen and affecting the luminous efficiency.
為達前述目的,本發明之實施例係提出一種發光裝置。發光裝置包含發光元件,覆蓋層,量子點材料以及黏著層。覆蓋層具有一凹陷部且包含透光無機材料。係將量子點材料填入覆蓋層之凹陷部內且設置在發光元件上,發光元件與覆蓋層以及該量子點材料透過黏著層結合。 In order to achieve the aforementioned object, an embodiment of the present invention provides a light-emitting device. The light-emitting device includes a light-emitting element, a covering layer, a quantum dot material and an adhesive layer. The covering layer has a recessed portion and contains light-transmitting inorganic material. The quantum dot material is filled into the recessed portion of the covering layer and placed on the light-emitting element. The light-emitting element is combined with the covering layer and the quantum dot material through the adhesive layer.
為達前述目的,本發明之另一實施例為一種發光裝置的製造方法。製造步驟包括:提供一透光無機塊材,具有一平面,在透光無機塊材之平面上形成一凹陷部以形成覆蓋層,覆蓋層具有環繞凹陷部的上表面;提供一量子點材料,填入覆蓋層之凹陷部內;提供一發光元件,具有一發光表面、一底面及一兩側表面;提供一黏著層,黏合凹陷部的上表面,量子點材料以及發光表面;提供一反射層,環繞覆蓋層及發光元件之兩側表面。 To achieve the aforementioned objects, another embodiment of the present invention is a method of manufacturing a light-emitting device. The manufacturing steps include: providing a light-transmissive inorganic block with a plane, forming a recessed portion on the plane of the light-transmissive inorganic block to form a covering layer, the covering layer having an upper surface surrounding the recessed portion; providing a quantum dot material, Fill the recessed part of the covering layer; provide a light-emitting element with a light-emitting surface, a bottom surface and a two side surface; provide an adhesive layer to bond the upper surface of the recessed part, the quantum dot material and the light-emitting surface; provide a reflective layer, Surround the cover layer and both sides of the light-emitting element.
300、500、700A、700B、800、900:發光裝置 300, 500, 700A, 700B, 800, 900: Light emitting device
110、510、810、910:覆蓋層 110, 510, 810, 910: Covering layer
110’:透光無機塊材 110’: Translucent inorganic block
111:上表面 111: Upper surface
112、912:凹陷部 112, 912: depression
113:下表面 113: Lower surface
114:外側面 114:Outer side
120、520、920:量子點材料 120, 520, 920: Quantum dot material
130、730:黏著層 130, 730: Adhesive layer
130’:黏著劑 130’: Adhesive
131’:頂表面 131’:Top surface
132’:底表面 132’: Bottom surface
1、140:發光元件 1. 140: Light-emitting element
141:發光表面 141: Luminous surface
142:底面 142: Bottom surface
144:第一電極及第二電極 144: First electrode and second electrode
150、550:光反射層 150, 550: light reflective layer
150’:光反射膠 150’:Light reflective glue
151’:部分光反射膠 151’: Partial light reflective glue
2:電極 2:Electrode
3:封裝膠 3: Packaging glue
731:不透光黏著層 731: Opaque adhesive layer
732:透光黏著層 732: Translucent adhesive layer
812a:第一凹陷部 812a: First depression
812b:第二凹陷部 812b: Second depression
S:空隙 S: gap
W1:凹陷部之寬度 W1: Width of the depression
W2:發光元件之寬度 W2: Width of light-emitting element
D、D1:間隙 D, D1: gap
第1圖係說明習知晶片級封裝結構示意圖。 Figure 1 is a schematic diagram illustrating a conventional wafer level packaging structure.
第2A至2G圖係說明本發明一實施例所揭露之發光裝置的製造方法示意圖。 Figures 2A to 2G are schematic diagrams illustrating the manufacturing method of the light-emitting device disclosed in one embodiment of the present invention.
第3圖係顯示根據本發明一實施例所揭露之發光裝置的剖面圖。 Figure 3 is a cross-sectional view of a light-emitting device disclosed according to an embodiment of the present invention.
第4圖係顯示根據本發明一實施例所揭露之發光裝置的局部放大示意圖。 FIG. 4 is a partially enlarged schematic diagram of a light-emitting device disclosed according to an embodiment of the present invention.
第5圖係顯示根據本發明一比較例所揭露之發光裝置的示意圖。 Figure 5 is a schematic diagram showing a light-emitting device disclosed according to a comparative example of the present invention.
第6圖顯示本發明一實施例之發光裝置及比較例之發光裝置在不同測試時間下的發光效率。 Figure 6 shows the luminous efficiency of the light-emitting device according to one embodiment of the present invention and the light-emitting device according to the comparative example under different test times.
第7A圖係顯示根據本發明另一實施例所揭露之發光裝置的示意圖。 Figure 7A is a schematic diagram showing a light-emitting device disclosed according to another embodiment of the present invention.
第7B圖係顯示根據本發明另一實施例所揭露之發光裝置的示意圖。 Figure 7B is a schematic diagram showing a light-emitting device disclosed according to another embodiment of the present invention.
第8圖係顯示根據本發明另一實施例所揭露之發光裝置的示意圖。 FIG. 8 is a schematic diagram showing a light-emitting device disclosed according to another embodiment of the present invention.
第9圖係顯示根據本發明另一實施例所揭露之發光裝置的示意圖。 FIG. 9 is a schematic diagram showing a light-emitting device disclosed according to another embodiment of the present invention.
以下針對本發明量子點晶片封裝及其製作方法詳細說明。應了解的是,以下之敘述提供許多不同的實施例或例子,用以實施本發明之不同樣態。以下所述特定的元件及排列方式僅為簡單描述本發明並非用以限定本發明。 The quantum dot chip package and its manufacturing method of the present invention will be described in detail below. It should be understood that the following description provides many different embodiments or examples for implementing different aspects of the present invention. The specific components and arrangements described below are only used to briefly describe the present invention and are not intended to limit the present invention.
請參閱第2A至2G圖,係本發明一實施例之發光裝置的製造方法示意圖,如圖所示,本實施例之製造步驟包括: Please refer to Figures 2A to 2G, which are schematic diagrams of a manufacturing method of a light-emitting device according to an embodiment of the present invention. As shown in the figures, the manufacturing steps of this embodiment include:
步驟一、參閱第2A圖,提供一透光無機塊材110’,具有一平面111’,。於一實施例中,透光無機塊材110’的材料可選自玻璃。 Step 1: Referring to Figure 2A, a light-transmissive inorganic block 110' is provided with a flat surface 111'. In one embodiment, the material of the light-transmitting inorganic block 110' can be selected from glass.
步驟二、參閱第2B圖,從透光無機塊材110’之平面111’的適當位置,移除部分的透光無機塊材110’以形成一凹陷部112並形成覆蓋層110。覆蓋層110包含上表面111、下表面113以及位於上表面111及下表面113之間的外側面114。根據一實施例,形成凹陷部112的方式包含濕式蝕刻或乾式蝕刻,乾式蝕刻例如是雷射。在另一實施例中,覆蓋層110的形成方式可將透光無機材料透過模具成型。
Step 2: Refer to Figure 2B, remove part of the light-transmitting inorganic block 110' from an appropriate position on the plane 111' of the light-transmitting inorganic block 110' to form a
步驟三、參閱第2C圖,提供一量子點材料(QD material;Quantum Dot material)120,填入覆蓋層110之凹陷部112內,於本實施例中,凹陷部112的深度必需大於或約等於量子點材料120的厚度。在一實施例中,量子點材料120包含接合劑(圖未示)以及分散於接合劑中的量子點粒子(圖未示),並藉由噴塗(Spraying)或滴入(Dispensing)等方式並選擇性地使用遮罩(Mask)填入凹陷部112內。
步驟四、參閱第2D圖,提供一黏著劑130’並形成在覆蓋層110以及量子點材料120上。於一實施例中,黏著劑130’以點膠方式形成在覆蓋層110以及量子點材料120上。在一實施例中,黏著劑130’具有一頂表面131’及一底表面132’,黏著劑130’之底表面132’黏合於覆蓋層110之上表面111以及量子點材料120。黏著劑130’具有耐熱及高的光穿透度的性質為佳,於一實施例中,黏著劑130’的材料可以是熱固性樹脂或光固化樹脂,例如:矽樹脂(silicone resin)。
Step 4: Referring to Figure 2D, an adhesive 130' is provided and formed on the
步驟五、參閱第2E圖,提供一發光元件140,具有一發光表面141、一底面142及一兩側表面143。並將發光元件140之發光表面141貼合於黏著劑130’的頂表面131’,使發光元件140與覆蓋層110以及量子點材料120結合
(bonding)在一起。之後,固化黏著劑130’以形成黏著層130。發光元件140之底面142設有第一電極及第二電極144與基板(圖未式)電性連接。
Step 5: Referring to Figure 2E, a light-emitting element 140 is provided, which has a light-emitting surface 141, a bottom surface 142 and a two-side surface 143. And the light-emitting surface 141 of the light-emitting element 140 is attached to the top surface 131' of the adhesive 130', so that the light-emitting element 140 is combined with the
步驟六、參閱第2F圖,提供一光反射膠150’,並將光反射膠150’覆蓋覆蓋層110、黏著層130以及發光元件140。在一實施例中,光反射膠150’覆蓋覆蓋層110的外側面114及發光元件之兩側表面143。之後,固化光反射膠150’並將部分光反射膠151’移除後形成光反射層。在一實施例中,移除部分的光反射膠151’的方式可以透過研磨或去膠法(deflash)。光反射層環繞覆蓋層110、黏著層130、發光元件140以及發光元件140的第一電極及第二電極144之側面並露出電極144的上表面。
Step 6: Refer to Figure 2F, provide a light reflective glue 150', and cover the
於另一實施例,參閱第2G圖,光反射膠被精確地覆蓋在覆蓋層110、黏著層130以及發光元件140之側壁並固化光反射膠以形成光反射層150及形成發光裝置。於本實施例中,發光元件140之底面142並未被光反射層150所覆蓋。
In another embodiment, referring to Figure 2G, the light-reflective glue is accurately covered on the
第3圖係顯示根據本發明第2A至2G圖所揭露之發光裝置300的剖面圖。第4圖係顯示發光裝置300的局部放大示意圖。發光裝置300包含覆蓋層110、量子點材料120、黏著層130、發光元件140以及光反射層150。在一實施例中,覆蓋層110具有一凹陷部112、以及位於上表面111以及下表面之間的外側面114,且量子點材料120填入凹陷部112內。於一實施例中,覆蓋層110之凹陷部112具有一寬度W1,發光元件140具有一寬度W2,且發光元件140之寬度W2大於凹陷部112之寬度W1。如此,可增加外部水汽及氧氣接觸到量子點材料120的路徑或減少外部水汽及氧氣接觸量子點的機會,以提高量子點
材料120的可靠度。黏著層130的一面(第一面)接合至覆蓋層110之表面以及量子點材料120之表面,黏著層130的另一面(第二面)則接合至發光元件140。換言之,黏著層130直接接觸覆蓋層110、量子點材料120以及發光元件140。在一實施例中,黏著層130的另一面還黏合光反射層150之表面。由於本發明的量子點材料120及覆蓋層110係透過黏著層130設置發光元件140上,因此,量子點材料120與發光元件140之間以及覆蓋層110與發光元件140之間會產生間隙。於一實施例中,量子點材料120與發光元件140之間的間隙D,以及覆蓋層110與發光元件140之間的間隙D1都必需愈小愈好,避免外部水汽及氧氣透過間隙D、D1滲透而造成量子點材料120的發光效率下降,於一實施例中,間隙D、D1係小於20微米,換言之,黏著層130的厚度小於20微米。
Figure 3 is a cross-sectional view of the light emitting device 300 disclosed in Figures 2A to 2G of the present invention. FIG. 4 is a partially enlarged schematic diagram of the light emitting device 300 . The light-emitting device 300 includes a
於一實施例中,覆蓋層110的材料為透光無機材料所組成,例如:玻璃、陶瓷。量子點材料120包含接合劑(圖未示)以及分散於接合劑中的量子點粒子(圖未示)。接合劑的材料可以是熱固性樹脂或光固化樹脂,例如:環氧樹脂或矽樹脂。量子點粒子的材料可由半導體材料所構成,且其粒徑小於100奈米(nm)。半導體材料包含II-VI族半導體化合物、III-V族半導體化合物、IV-VI族半導體化合物、或上述材料的組合。量子點粒子的結構可包含主要發光的核心區(core)以及包覆核心區的殼(shell)。核心區的材料可選自於由硫化鋅(ZnS)、硒化鋅(ZnSe)、碲化鋅(ZnTe)、氧化鋅(ZnO)、氯化銫鉛(CsPbCl3)、溴化銫鉛(CsPbBr3)、碘化銫鉛(CsPbI3)、硫化鎘(CdS)、硒化鎘(CdSe)、碲化鎘(CdTe)、氮化鎵(GaN)、磷化鎵(GaP)、硒化鎵(GaSe)、銻化鎵(GaSb)、砷化鎵(GaAs)、氮化鋁(AlN)、磷化鋁(AlP)、砷化鋁(AlAs)、磷化銦(InP)、砷化銦(InAs)、碲(Te)、硫化鉛(PbS)、銻化銦(InSb)、
碲化鉛(PbTe)、硒化鉛(PbSe)、碲化銻(SbTe)、硒化鋅鎘(ZnCdSe)、硫化鋅鎘硒(ZnCdSeS)、及硫化銅銦(CuInS)所組成之群組。殼的材料與核心區的材料必須相互搭配(例如核心區與殼的材料的晶格常數需要匹配)。具體而言,殼的材料組成之選擇,除了與核心區的材料的晶格常數需匹配外,尚能在核心區的外圍形成一個高能障區域,以提升量子產率(quantum yield)。殼的結構可以是單層、多層或者材料組成漸變的結構。在一實施例中,核心區為硒化鎘,殼為單層的硫化鋅。在另一實施例中,核心區為硒化鎘,殼包含內層的(鎘,鋅)(硫,硒)及外層的硫化鋅。在另一實施例中,核心區為硒化鎘,殼包含內層的硫化鎘,中間漸變層的Zn0.25Cd0.75S/Zn0.5Cd0.5S/Zn0.75Cd0.25S,外層的硫化鋅。
In one embodiment, the material of the
參閱第3圖,發光裝置300中,發光元件140具有一發光表面141、一底面142及一側表面143。發光元件140之底面142設有第一電極144及第二電極144。光反射層150覆蓋覆蓋層110之外側面114以及發光元件140之側表面143。在一實施例中,光反射層150環繞覆蓋層110以及發光元件140。
Referring to FIG. 3 , in the light-emitting device 300 , the light-emitting element 140 has a light-emitting surface 141 , a bottom surface 142 and a side surface 143 . The bottom surface 142 of the light-emitting element 140 is provided with a first electrode 144 and a second electrode 144 . The light reflective layer 150 covers the
在一實施例中,發光元件140包括承載基板(圖未示)、發光疊層(圖未示)、第一電極及第二電極144。在一實施例中,承載基板為成長基板(growth substrate),例如可以是藍寶石(sapphire)基板,作為發光疊層磊晶成長時之基板。在另一實施例中,承載基板並非成長基板,在製造第一發光元件之製程中成長基板被移除併置換為其他基板(例如,不同材料、不同結構、或不同形狀的基板)。在一實施例中,為了減少發光元件140的熱傳到量子點材料120,因此承載基板為較低的熱導係數的材料所組成,例如:玻璃或較低熱導係數的陶瓷。較低熱導係數的陶瓷材料可以是氧化鋯。在另一實施例中,為了將量子點材料120的熱更有效地透過發光元件140將熱導出,因此承載基板為較高的熱導
係數的材料所組成,例如:較高熱導係數的陶瓷。較高熱導係數的陶瓷材料可以是氧化鋁或氮化鋁。雖然圖未繪示,然發光疊層包括數層半導體層。例如,發光疊層依序包含第一型半導體層、發光層及第二型半導體層,其中發光層設於第一型半導體層與第二型半導體層之間。第一型半導體層例如是N型半導體層,而第二型半導體層則為P型半導體層。或是,第一型半導體層是P型半導體層,而第二型半導體層則為N型半導體層。在一實施例中,第一電極及第二電極144位在發光元件140之同一側,作為發光元件140與外界電性連結之介面。光反射層150的組成中包含樹脂以及分散於樹脂內的反射粒子,例如:氧化鈦(titanium oxide)、氧化鋅、氧化鋁、硫酸鋇或碳酸鈣。於一實施例中,樹脂為矽樹脂且反射粒子為氧化鈦。
In one embodiment, the light-emitting element 140 includes a carrier substrate (not shown), a light-emitting stack (not shown), a first electrode and a second electrode 144. In one embodiment, the carrier substrate is a growth substrate, such as a sapphire substrate, used as a substrate for epitaxial growth of the light-emitting stacked layer. In another embodiment, the carrier substrate is not the growth substrate, and the growth substrate is removed and replaced with other substrates (eg, substrates of different materials, different structures, or different shapes) during the process of manufacturing the first light-emitting element. In one embodiment, in order to reduce the heat transfer from the light-emitting element 140 to the
本發明之發光裝置300,其主要技術手段係將量子點材料120填入至覆蓋層110之凹陷部112,藉由凹陷部112包覆量子點材料120,並且覆蓋層110直接和發光元件140結合(bonding)在一起,其中覆蓋層110以及量子點材料120與發光元件140之發光表面141間不存在有覆蓋層110之材料,而量子點材料120則被覆蓋層110與發光元件140包圍。據此,藉由覆蓋層110與發光元件140將水汽及氧氣進行阻隔。當外部水汽及氧氣欲接觸到量子點材料120前,必需先通過覆蓋層110與發光元件140,而由於發光元件140的寬度係大於覆蓋層110之凹陷部112的寬度而將凹陷部112完全擋住,因此可避免外部水汽及氧氣未經過發光元件140的阻隔直接侵蝕到量子點材料120。換言之,本發明之發光裝置具有高阻水汽及阻氧氣特性,可改善量子點材料120發光效率下降。
The main technical means of the light-emitting device 300 of the present invention is to fill the recessed
第5圖係顯示根據比較例所揭露之發光裝置500的剖面圖。發光裝置500包含覆蓋層510、量子點材料520、黏著層130、發光元件140以及光反射層550。與第2A至2G圖所揭露之發光裝置300最大不同之處在於發光元件140之寬度小於凹陷部112之寬度。
Figure 5 is a cross-sectional view of the light-emitting device 500 disclosed according to the comparative example. The light-emitting device 500 includes a covering layer 510, a quantum dot material 520, an adhesive layer 130, a light-emitting element 140 and a light reflective layer 550. The biggest difference from the light-emitting device 300 disclosed in FIGS. 2A to 2G is that the width of the light-emitting element 140 is smaller than the width of the recessed
第6圖顯示本發明第2A至2G圖(以下簡稱為實驗例)之發光裝置300(曲線1)及比較例之發光裝置500(曲線2)在不同測試時間下的相對發光效率。發光裝置一開始發光時(0小時)的效率定為相對發光效率100%。實驗例與比較例中,量子點材料與發光元件之間的間隙D,以及覆蓋層與發光元件之間的間隙D1皆小於20微米。操作條件為室溫(25℃)下,操作電流是20毫安培(mA)。 Figure 6 shows the relative luminous efficiency of the light-emitting device 300 (curve 1) of Figures 2A to 2G of the present invention (hereinafter referred to as the experimental example) and the light-emitting device 500 (curve 2) of the comparative example under different test times. The efficiency when the light-emitting device first starts emitting light (0 hours) is set as the relative luminous efficiency of 100%. In the experimental examples and comparative examples, the gap D between the quantum dot material and the light-emitting element, and the gap D1 between the covering layer and the light-emitting element are both less than 20 microns. The operating conditions are room temperature (25°C) and the operating current is 20 milliamps (mA).
由第6圖顯示出實驗例中之發光裝置300,經過480小時(HRS)的時間測試後其相對發光效率仍可達125%,由此數據顯示出本發明之發光裝置300,通過將量子點材料120填入覆蓋層110的凹陷部112內並直接與發光元件140結合(bonding)在一起,藉由覆蓋層110與發光元件140將水汽及氧氣阻隔的結構,具有延緩量子點材料120發光效率下降的功效。
Figure 6 shows that the relative luminous efficiency of the light-emitting device 300 in the experimental example can still reach 125% after a 480-hour (HRS) time test. The data shows that the light-emitting device 300 of the present invention uses quantum dots. The
再參閱第6圖,反觀比較例之發光裝置500的數據,其發光效率在經400小時後下降的幅度極大,發光表現由相對發光效率100%下降至相對發光效率50%左右。證實本發明之發光裝置300在發光元件140之寬度大於凹陷部112之寬度的結構下,對於延緩量子點材料120的發光效率下降具有明顯的功效。
Referring again to Figure 6, looking back at the data of the light-emitting device 500 of the comparative example, the luminous efficiency dropped greatly after 400 hours, and the luminous performance dropped from a relative luminous efficiency of 100% to a relative luminous efficiency of about 50%. It is confirmed that the light-emitting device 300 of the present invention has a significant effect in delaying the decrease in the luminous efficiency of the
第7A圖係顯示根據本發明另一實施例所揭露之發光裝置700A的示意圖。如圖所示,發光裝置700包括覆蓋層110、量子點材料120、黏著層730、發光元件140以及光反射層150。相較於發光裝置300不同之處,黏著層730包含一不透光黏著層731以及一透光黏著層732。不透光黏著層731黏合於覆蓋層110與發光元件140之接合面,但未黏合到量子點材料120。不透光黏著層731將覆蓋層110的表面與發光元件140的表面進行結合,另量子點材料120被覆蓋層110與發光元件140包覆其中。於本實施例中,不透光黏著層731之材料可以是金屬或合金,金屬例如是金(Au),合金例如是錫銀銅合金(SAC alloy)或金錫合金(Au-Sn alloy)。本實施例係將至少一不透光黏著層731設於覆蓋層110與發光元件140之接合面。在一實施例中,發光元件140為藍光發光二極體,發光元件140發出的藍光因為被不透光黏著層731阻擋而不會側向穿透覆蓋層110,進而導致發光裝置700的上方與側向光色不均現象。除此之外,由於不透光黏著層731屬於金屬材料,因此將覆蓋層110結合於發光元件140上時可以產生更高的氣密性,可提昇覆蓋層110與發光元件140對外部水汽及氧氣阻隔的效果。透光黏著層732被不透光黏著層731所環繞。透光黏著層732可黏合量子點材料120以及發光元件140且可被發光元件140發出的光所穿透。透光黏著層732的材料可相同或相似於黏著層130的材料。第7B圖係顯示根據本發明另一實施例所揭露之發光裝置700B的示意圖。與發光裝置700A不同之處在於,量子點材料120與發光元件140不存在透光黏著層732。換言之,量子點材料120與發光元件140可直接接觸。因為少了透光黏著層732所造成的吸光,因此可提高發光裝置700B的亮度。
Figure 7A is a schematic diagram showing a light emitting device 700A disclosed according to another embodiment of the present invention. As shown in the figure, the light-emitting device 700 includes a
第8圖係顯示根據本發明另一實施例所揭露之發光裝置800的示意圖。如圖所示,發光裝置800包括覆蓋層810、量子點材料120、黏著層130、發光元件140以及光反射層150。相較於發光裝置300不同之處,覆蓋層810具有第一凹陷部812a及第二凹陷部812b,且第一凹陷部812a的寬度係小於第二凹陷部812b的寬度。在一實施例中,第一凹陷部812a與第二凹陷部相互連通且呈階梯狀。在一實施例中,將量子點材料120與發光元件140分別填入第一凹陷部812a與第二凹陷部812b內,再將覆蓋層810與發光元件140進行結合,令量子點材料120被密封在覆蓋層810與發光元件140之間。由第8圖中顯示,量子點材料120與發光元件140係完全填設於覆蓋層810之第一凹陷部812a及第二凹陷部812b內,且發光元件140的底面142與覆蓋層810的下表面813大致切齊,因此當發光元件140與覆蓋層810進行結合時,量子點材料120係與發光元件140貼合。此外,在此實施例中,覆蓋層810的最下表面並非在發光元件140的上方,因此量子點材料120與發光元件140之間以及覆蓋層810與發光元件140之間不會產生間隙的問題。藉此,於本實施例中,當外部的水汽及氧氣欲接觸到量子點材料120前,必需先通過覆蓋層810與發光元件140,並且因為發光元件140的寬度係大於覆蓋層810之第一凹陷部812a之寬度而將第一凹陷部812a完全擋住,再加上量子點材料120與發光元件140之間不存在間隙,可達到更好的阻隔外部水汽及氧氣滲透,因此可延緩量子點材料120發光效率下降的效果。覆蓋層810的材料及製造方式與覆蓋層110相同或相似,可參閱描述覆蓋層110的相關段落。
FIG. 8 is a schematic diagram of a light-emitting device 800 disclosed according to another embodiment of the present invention. As shown in the figure, the light-emitting device 800 includes a covering layer 810, a
第9圖係顯示根據本發明另一實施例所揭露之發光裝置900的示意圖。如圖所示,發光裝置900包括覆蓋層910、量子點材料920、發光元件140
以及光反射層150。覆蓋層910具有凹陷部912,凹陷部912的內表面具有斜度且深度必需大於或約等於量子點材料120的厚度加上發光元件140的全部或部分高度,使量子點材料120與發光元件140可同時安置於凹陷部912內。當覆蓋層910與發光元件140進行結合時,量子點材料920可被覆蓋層910與發光元件140包覆。由第9圖中顯示,當量子點材料920與發光元件140裝設於覆蓋層910之凹陷部912內時,發光元件140的底面142係凸出於覆蓋層910的下表面911,且凹陷部912因為兩側形成斜度的關係而與發光元件140側邊產生空隙S。光反射層150覆蓋覆蓋層910以及發光元件140的兩側時同時填塞於空隙S內可以更進一步阻擋水氣與氧氣滲入發光裝置900中導致量子點材料920劣化。在本實施例中,當發光元件140與覆蓋層910進行結合時,量子點材料920係與發光元件140形成緊密貼合,並且因為覆蓋層910的最下表面並非位於發光元件140的上方,因此可避免量子點材料120與發光元件140之間產生間隙,導致外部水汽及氧氣滲入的問題。發光裝置900於覆蓋層910之凹陷部912的寬度與發光元件140的寬度之關係可較有彈性的調整。兩者可以相等或不相等。
FIG. 9 is a schematic diagram showing a light emitting device 900 disclosed according to another embodiment of the present invention. As shown in the figure, the light-emitting device 900 includes a covering layer 910, a quantum dot material 920, and a light-emitting element 140.
and light reflective layer 150. The covering layer 910 has a recessed portion 912. The inner surface of the recessed portion 912 has a slope and the depth must be greater than or approximately equal to the thickness of the
綜合上述,本發明發光裝置係使用量子點在晶片上(QD on chip)的技術。將量子點材料填入覆蓋層的凹陷部內並設置在發光元件上,發光元件與覆蓋層直接結合,並且發光元件的寬度係大於封裝玻璃之凹陷部孔徑而將凹陷部完全擋住,避免外部水氧或氧氣未經過發光元件的阻隔而直接侵蝕到量子點材料。換言之,本發明發光裝置利用具有高阻水及阻氧特性的覆蓋層與發光元件阻隔量子點材料遭受水汽及氧氣的傷害,達到延緩量子點材料發光效率下降的功效。 In summary, the light-emitting device of the present invention uses quantum dot on chip (QD on chip) technology. The quantum dot material is filled into the recessed part of the covering layer and placed on the light-emitting element. The light-emitting element is directly combined with the covering layer, and the width of the light-emitting element is larger than the aperture of the recessed part of the packaging glass to completely block the recessed part to avoid external water and oxygen. Or the oxygen directly erodes the quantum dot material without being blocked by the light-emitting element. In other words, the light-emitting device of the present invention uses a covering layer and a light-emitting element with high water and oxygen barrier properties to block the quantum dot material from being damaged by water vapor and oxygen, thereby delaying the decline in the luminous efficiency of the quantum dot material.
本發明雖以各種實施例揭露如上,然而僅其為範例參考而非用以限定本發明的範圍,任何熟習此項技藝者,在不脫離以本發明之精神和範圍內,當可做些許的更動與潤飾。因此上述實施例並非用以限定本發明之範圍,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention is disclosed above in various embodiments, these are only examples and are not used to limit the scope of the present invention. Anyone skilled in the art can make some modifications without departing from the spirit and scope of the present invention. Changes and embellishments. Therefore, the above embodiments are not intended to limit the scope of the present invention. The protection scope of the present invention shall be determined by the appended patent application scope.
300:發光裝置 300:Lighting device
110:覆蓋層 110: Covering layer
120:量子點材料 120:Quantum dot materials
130:黏著層 130:Adhesive layer
140:發光元件 140:Light-emitting component
150:光反射層 150:Light reflective layer
111:上表面 111: Upper surface
112:凹陷部 112: depression
113:下表面 113: Lower surface
114:外側面 114:Outer side
141:發光表面 141: Luminous surface
142:底面 142: Bottom surface
143:側表面 143:Side surface
144:第一電極及第二電極 144: First electrode and second electrode
W1:凹陷部之寬度 W1: Width of the depression
W2:發光元件之寬度 W2: Width of light-emitting element
D:間隙 D: Gap
D1:間隙 D1: Gap
Claims (10)
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| US20140117396A1 (en) * | 2011-05-18 | 2014-05-01 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor chip, optoelectronic semiconductor component, and a method for producing an optoelectronic semiconductor component |
| US20150364639A1 (en) * | 2014-06-16 | 2015-12-17 | Samsung Electronics Co., Ltd. | Method of manufacturing semiconductor light emitting device package |
| TW201810722A (en) * | 2013-11-18 | 2018-03-16 | 晶元光電股份有限公司 | Light emitting apparatus and manufacturing method thereof |
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| US20140117396A1 (en) * | 2011-05-18 | 2014-05-01 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor chip, optoelectronic semiconductor component, and a method for producing an optoelectronic semiconductor component |
| TW201810722A (en) * | 2013-11-18 | 2018-03-16 | 晶元光電股份有限公司 | Light emitting apparatus and manufacturing method thereof |
| US20150364639A1 (en) * | 2014-06-16 | 2015-12-17 | Samsung Electronics Co., Ltd. | Method of manufacturing semiconductor light emitting device package |
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