TWI818319B - Polishing device, method, auxiliary polishing device, system and method - Google Patents
Polishing device, method, auxiliary polishing device, system and method Download PDFInfo
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- TWI818319B TWI818319B TW110135706A TW110135706A TWI818319B TW I818319 B TWI818319 B TW I818319B TW 110135706 A TW110135706 A TW 110135706A TW 110135706 A TW110135706 A TW 110135706A TW I818319 B TWI818319 B TW I818319B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/20—Drives or gearings; Equipment therefor relating to feed movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
本申請涉及打磨技術領域,特別是一種打磨裝置、方法、輔助打磨的裝置、系統及方法。 The present application relates to the field of grinding technology, in particular to a grinding device, method, auxiliary grinding device, system and method.
隨著技術的進步,用戶對於工件的品質要求越來越高,特別是工件的觸感、光潔度等性能,其中,打磨工藝是改進該性能的重要環節。傳統的打磨工藝無法量化打磨過程的工件受力資訊,無法實現精確控制打磨頭的打磨軌跡與打磨位置,導致打磨後的工件出現發白,紋路不勻,深淺不一等特徵,並在打磨倒角(例如手機等3C工件的R角)時容易產生打磨裝置卡住或損傷工件的問題,進而影響工件的使用體驗。 With the advancement of technology, users have higher and higher requirements for the quality of workpieces, especially the feel, smoothness and other properties of the workpieces. Among them, the grinding process is an important part of improving this performance. The traditional grinding process cannot quantify the stress information of the workpiece during the grinding process, and cannot accurately control the grinding trajectory and position of the grinding head, resulting in the polished workpiece showing characteristics such as whitishness, uneven texture, and different depths, and the workpiece is inverted during grinding. When using corners (such as the R-angle of 3C workpieces such as mobile phones), it is easy for the grinding device to get stuck or damage the workpiece, thereby affecting the use experience of the workpiece.
鑒於上述狀況,有必要提供一種打磨裝置、方法、輔助打磨的裝置、系統及方法,以解決上述問題。 In view of the above situation, it is necessary to provide a grinding device, method, auxiliary grinding device, system and method to solve the above problems.
本申請第一方面提供一種打磨系統,用於打磨工件,包含:感測模組,用於感測該工件的受力情況,形成壓力序列;處理器,耦接該感測模組,用於:接收該壓力序列;形成指引資訊,該指引資訊用於指引打磨頭以預設軌跡打磨 該工件;根據該壓力序列與該指引資訊,形成該壓力序列的偏差序列;根據該偏差序列,形成調整指令,以調整該打磨頭的位置。 A first aspect of this application provides a polishing system for polishing workpieces, including: a sensing module for sensing the stress of the workpiece to form a pressure sequence; a processor coupled to the sensing module for : Receive the pressure sequence; form guidance information, which is used to guide the grinding head to grind in a preset trajectory The workpiece; based on the pressure sequence and the guidance information, a deviation sequence of the pressure sequence is formed; based on the deviation sequence, an adjustment instruction is formed to adjust the position of the grinding head.
進一步地,其中該指引資訊包含預設位置及轉換關係,該預設位置為該打磨頭打磨工件的計算位置,該轉換關係為該打磨頭的壓力與該打磨頭上打磨材料的形變資訊的換算式,該處理器,進一步用於:根據該打磨頭上打磨材料的剛性參數,確定該轉換關係;根據該壓力序列及該轉換關係,形成與該壓力序列對應的該形變資訊;根據該形變資訊與該預設位置,形成該偏差序列。 Further, the guidance information includes a preset position and a conversion relationship. The preset position is the calculated position of the grinding head for grinding the workpiece. The conversion relationship is a conversion formula between the pressure of the grinding head and the deformation information of the grinding material on the grinding head. , the processor is further configured to: determine the conversion relationship according to the rigid parameters of the grinding material on the grinding head; form the deformation information corresponding to the pressure sequence according to the pressure sequence and the conversion relationship; and according to the deformation information and the conversion relationship The preset position forms the deviation sequence.
進一步地,其中該處理器,進一步用於:根據該壓力序列,藉由濾波器形成調整後的壓力序列;根據該調整後的壓力序列與該指引資訊,確定該偏差序列。 Further, the processor is further configured to: form an adjusted pressure sequence through a filter based on the pressure sequence; and determine the deviation sequence based on the adjusted pressure sequence and the guidance information.
進一步地,其中該指引資訊包含第一運行軌跡,該處理器,進一步用於:形成該指引資訊,包含:確定打磨該工件的裝置組合包含機器元件與該打磨頭;基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成該第一運行軌跡,該第一運行軌跡為該打磨頭的運行軌跡;該處理器,進一步用於根據該壓力序列及該第一運行軌跡,形成該偏差序列。 Further, wherein the guidance information includes a first running trajectory, the processor is further configured to: form the guidance information, including: determining that the device combination for polishing the workpiece includes machine components and the polishing head; based on the device combination for polishing the workpiece The machine component and the grinding head are included to form the first operating trajectory, and the first operating trajectory is the operating trajectory of the grinding head; the processor is further configured to form the deviation according to the pressure sequence and the first operating trajectory. sequence.
進一步地,其中該處理器,進一步用於:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第一調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的、該打磨頭的運行軌跡,該第一調整量為在第二方向及該第三方向構成的平面上、載入在該基礎軌跡上的調整序列,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第一調整量,形成該第一運行軌跡。 Further, the processor is further configured to: form a basic trajectory and a first adjustment amount based on a device combination for polishing the workpiece including the machine element and the polishing head, the basic trajectory being composed in the first direction and the third direction. The operating trajectory of the grinding head is formed on a plane, the first adjustment amount is an adjustment sequence loaded on the basic trajectory on the plane formed by the second direction and the third direction, the first direction, the The second direction and the third direction are two perpendicular to each other, and the first direction is the direction of the grinding head toward the workpiece; the first operating trajectory is formed according to the basic trajectory and the first adjustment amount.
進一步地,其中該處理器,進一步用於:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第二調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第二調整量為在第二方向 上疊加在該基礎軌跡上的載波信號,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第二調整量,形成該第一運行軌跡。 Further, the processor is further configured to: form a basic trajectory and a second adjustment amount based on the device combination for polishing the workpiece including the machine element and the grinding head, the basic trajectory being composed in the first direction and the third direction. movement trajectory formed on the plane, the second adjustment amount is in the second direction On the carrier signal superimposed on the basic trajectory, the first direction, the second direction and the third direction are two perpendicular, and the first direction is the direction of the grinding head towards the workpiece; according to the basic trajectory and the third direction Two adjustment amounts form the first operating trajectory.
進一步地,其中該處理器,進一步用於:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第三調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第三調整量為在該第一方向上疊加在該基礎軌跡上的固定值,該第一方向與該第三方向垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第三調整量,形成該第一運行軌跡。 Further, the processor is further configured to: form a basic trajectory and a third adjustment amount based on the device combination for polishing the workpiece including the machine element and the grinding head, the basic trajectory is formed in the first direction and the third direction. The movement trajectory formed on the plane, the third adjustment amount is a fixed value superimposed on the basic trajectory in the first direction, the first direction is perpendicular to the third direction, and the first direction is the direction of the grinding head. The direction of the workpiece; the first operating trajectory is formed based on the basic trajectory and the third adjustment amount.
進一步地,其中該處理器,進一步用於:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第四調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第四調整量為在該第一方向上疊加在該基礎軌跡上的變化值,該第一方向與該第三方向垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第四調整量,形成該第一運行軌跡。 Further, the processor is further configured to: form a basic trajectory and a fourth adjustment amount based on the device combination for polishing the workpiece including the machine element and the polishing head, the basic trajectory is formed in the first direction and the third direction. The movement trajectory formed on the plane, the fourth adjustment amount is the change value superimposed on the basic trajectory in the first direction, the first direction is perpendicular to the third direction, and the first direction is the direction of the grinding head. The direction of the workpiece; the first operating trajectory is formed based on the basic trajectory and the fourth adjustment amount.
進一步地,其中該指引資訊還包含第二運行軌跡,該處理器,進一步用於:形成該指引資訊,進一步包含:確定該裝置組合還包含承載模組,該承載模組用於承載該工件且可轉動或可移動該工件;基於該裝置組合還包含承載模組,形成該第二運行軌跡,該第二運行軌跡為該工件的運行軌跡;該處理器,進一步用於根據該壓力序列、該第一運行軌跡及該第二運行軌跡,形成該偏差序列。 Further, the guidance information also includes a second running trajectory, and the processor is further configured to: form the guidance information, further including: determining that the device combination also includes a load-bearing module, and the load-bearing module is used to load the workpiece and The workpiece can be rotated or moved; the device combination also includes a load-bearing module to form the second running trajectory, and the second running trajectory is the running trajectory of the workpiece; the processor is further configured to according to the pressure sequence, the The first operating trajectory and the second operating trajectory form the deviation sequence.
進一步地,其中該指引資訊還包含倒角資訊,該處理器,進一步用於:基於該裝置組合還包含承載模組,確定該倒角資訊;根據該倒角資訊,計算該 第一運行軌跡與該倒角資訊對應的倒角軌跡;根據該倒角軌跡,形成該第二運行軌跡。 Further, the guidance information also includes chamfering information, and the processor is further configured to: determine the chamfering information based on the device combination also including a carrying module; and calculate the chamfering information based on the chamfering information. The first operating trajectory corresponds to the chamfering trajectory of the chamfering information; the second operating trajectory is formed based on the chamfering trajectory.
進一步地,其中該處理器,進一步用於:根據該第二運行軌跡及該倒角軌跡,調整該第一運行軌跡為第三運行軌跡;根據該壓力序列、該第三運行軌跡及該第二運行軌跡,形成該偏差序列。 Further, the processor is further configured to: adjust the first operating trajectory to a third operating trajectory according to the second operating trajectory and the chamfering trajectory; and adjust the first operating trajectory to a third operating trajectory according to the pressure sequence, the third operating trajectory and the second operating trajectory. Run the trajectory to form the deviation sequence.
本申請第二方面提供一種打磨方法,用於控制機器元件上的打磨頭打磨工件,包含:接收壓力序列,該壓力序列形成於感測模組感測該工件的受力情況;形成指引資訊,該指引資訊用於指引該打磨頭以預設軌跡打磨該工件;根據該壓力序列與該指引資訊,形成該壓力序列的偏差序列;根據該偏差序列,形成調整指令,以調整該打磨頭的位置。 The second aspect of this application provides a grinding method for controlling a grinding head on a machine component to grind a workpiece, including: receiving a pressure sequence formed when a sensing module senses the stress of the workpiece; forming guidance information, The guidance information is used to guide the grinding head to grind the workpiece in a preset trajectory; according to the pressure sequence and the guidance information, a deviation sequence of the pressure sequence is formed; according to the deviation sequence, an adjustment instruction is formed to adjust the position of the grinding head .
進一步地,其中該指引資訊包含預設位置及轉換關係,該預設位置為該打磨頭打磨工件的計算位置,該轉換關係為該打磨頭的壓力與該打磨頭上打磨材料的形變資訊的換算式,進一步包含:根據該打磨頭上打磨材料的剛性參數,確定該轉換關係;根據該壓力序列及該轉換關係,形成與該壓力序列對應的該形變資訊;根據該形變資訊與該預設位置,形成該偏差序列。 Further, the guidance information includes a preset position and a conversion relationship. The preset position is the calculated position of the grinding head for grinding the workpiece. The conversion relationship is a conversion formula between the pressure of the grinding head and the deformation information of the grinding material on the grinding head. , further comprising: determining the conversion relationship according to the rigid parameters of the grinding material on the grinding head; forming the deformation information corresponding to the pressure sequence according to the pressure sequence and the conversion relationship; forming the deformation information and the preset position according to the deformation information and the preset position This deviation sequence.
進一步地,其中該形成該壓力序列的偏差序列的步驟,包含:根據該壓力序列,藉由濾波器形成調整後的壓力序列;根據該調整後的壓力序列與該指引資訊,確定該偏差序列。 Further, the step of forming a deviation sequence of the pressure sequence includes: forming an adjusted pressure sequence through a filter based on the pressure sequence; and determining the deviation sequence based on the adjusted pressure sequence and the guidance information.
進一步地,其中該指引資訊包含第一運行軌跡,該形成指引資訊的步驟,包含:確定打磨該工件的裝置組合包含該機器元件與該打磨頭;基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成該第一運行軌跡,該第一運行軌跡為該打磨頭的運行軌跡;該形成該壓力序列的偏差序列的步驟,包含根據該第一運行軌跡及該壓力序列,形成該偏差序列。 Further, the guidance information includes a first operating trajectory, and the step of forming the guidance information includes: determining that the device combination for polishing the workpiece includes the machine component and the grinding head; and that the device combination for polishing the workpiece includes the machine component and the grinding head. The grinding head forms the first operating trajectory, and the first operating trajectory is the operating trajectory of the grinding head; the step of forming the deviation sequence of the pressure sequence includes forming the deviation according to the first operating trajectory and the pressure sequence. sequence.
進一步地,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第一調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的、該打磨頭的運行軌跡,該第一調整量為在第二方向及該第三方向構成的平面上、載入在該基礎軌跡上的調整序列,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第一調整量,形成該第一運行軌跡。 Further, the step of forming the first running trajectory includes: forming a basic trajectory and a first adjustment amount based on a device combination for polishing the workpiece including the machine element and the grinding head, and the basic trajectory is in the first direction and The running trajectory of the grinding head is formed on the plane formed in the third direction. The first adjustment amount is the adjustment sequence loaded on the basic trajectory on the plane formed in the second direction and the third direction. The third One direction, the second direction and the third direction are two perpendicular to each other, and the first direction is the direction of the grinding head toward the workpiece; the first operating trajectory is formed according to the basic trajectory and the first adjustment amount.
進一步地,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第二調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第二調整量為在第二方向上疊加在該基礎軌跡上的載波信號,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第二調整量,形成該第一運行軌跡。 Further, the step of forming the first running trajectory includes: forming a basic trajectory and a second adjustment amount based on a device combination for polishing the workpiece including the machine element and the grinding head, the basic trajectory is in the first direction and A moving trajectory formed on a plane constituted by a third direction. The second adjustment amount is the carrier signal superimposed on the basic trajectory in the second direction. The first direction, the second direction and the third direction are two perpendicular to each other. , the first direction is the direction of the grinding head toward the workpiece; the first operating trajectory is formed according to the basic trajectory and the second adjustment amount.
進一步地,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第三調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第三調整量為在該第一方向上疊加在該基礎軌跡上的固定值,該第一方向與該第三方向垂直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第三調整量,形成該第一運行軌跡。 Further, the step of forming the first running trajectory includes: forming a basic trajectory and a third adjustment amount based on a device combination for polishing the workpiece including the machine element and the grinding head, the basic trajectory is in the first direction and A movement trajectory formed on a plane constituted by a third direction. The third adjustment amount is a fixed value superimposed on the basic trajectory in the first direction. The first direction is perpendicular to the third direction. The first direction is The grinding head faces the direction of the workpiece; the first operating trajectory is formed according to the basic trajectory and the third adjustment amount.
進一步地,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件的裝置組合包含該機器元件與該打磨頭,形成基礎軌跡及第四調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第四調整量為在該第一方向上疊加在該基礎軌跡上的變化值,該第一方向與該第三方向垂 直,該第一方向為該打磨頭朝向該工件的方向;根據該基礎軌跡及該第四調整量,形成該第一運行軌跡。 Further, the step of forming the first running trajectory includes: forming a basic trajectory and a fourth adjustment amount based on a device combination for grinding the workpiece including the machine element and the grinding head, the basic trajectory is in the first direction and A movement trajectory formed on a plane formed in a third direction. The fourth adjustment amount is the change value superimposed on the basic trajectory in the first direction. The first direction is perpendicular to the third direction. Straight, the first direction is the direction of the grinding head toward the workpiece; the first operating trajectory is formed according to the basic trajectory and the fourth adjustment amount.
進一步地,其中該指引資訊還包含第二運行軌跡,該第二運行軌跡為該工件的運行軌跡,該形成該偏差序列的步驟,進一步包含:確定該裝置組合還包含承載模組,該承載模組用於承載該工件且可轉動或可移動該工件;基於該裝置組合還包含承載模組,形成該第二運行軌跡;根據該壓力序列、該第一運行軌跡及該第二運行軌跡,形成該偏差序列。 Further, the guidance information also includes a second operating trajectory, and the second operating trajectory is the operating trajectory of the workpiece. The step of forming the deviation sequence further includes: determining that the device combination also includes a load-bearing module, and the load-bearing module The set is used to carry the workpiece and can rotate or move the workpiece; based on the device combination, it also includes a carrying module to form the second operating trajectory; according to the pressure sequence, the first operating trajectory and the second operating trajectory, a This deviation sequence.
進一步地,其中該指引資訊還包含倒角資訊,該形成該第二運行軌跡的步驟,包含:基於該裝置組合還包含承載模組,確定該倒角資訊;根據該倒角資訊,計算該第一運行軌跡與該倒角資訊對應的倒角軌跡;根據該倒角軌跡,形成該第二運行軌跡。 Further, the guidance information also includes chamfering information, and the step of forming the second running trajectory includes: determining the chamfering information based on the device combination also including a bearing module; and calculating the third chamfering information based on the chamfering information. A running track is a chamfering track corresponding to the chamfering information; the second running track is formed based on the chamfering track.
進一步地,其中該形成該偏差序列的步驟,進一步包含:根據該第二運行軌跡及該倒角軌跡,調整該第一運行軌跡為第三運行軌跡;根據該壓力序列、該第三運行軌跡及該第二運行軌跡,形成該偏差序列。 Further, the step of forming the deviation sequence further includes: adjusting the first operating trajectory to a third operating trajectory according to the second operating trajectory and the chamfering trajectory; according to the pressure sequence, the third operating trajectory and The second operating trajectory forms the deviation sequence.
本申請第三方面提供一種輔助打磨的裝置,用於承載及感測被打磨的工件,包含:承載部,用於承載工件,並承受來自該工件的力及力矩的至少一個;感測模組,連接該承載部;連接部,設於該承載部及該感測模組之間;底座,連接該安裝部,包含第一中空部,該第一中空部與該第一通道導通;安裝部,設於該感測模組及該底座之間,該安裝部為中空結構,中空部分被設置為第一通道;感測模組還連接線纜,該線纜用於藉由該第一中空部及該第一通道,與該感測模組耦接;該感測模組,用於感測該力及力矩的至少一個,形成壓力值,並藉由該線纜傳輸該壓力值至該打磨裝置。 A third aspect of the present application provides an auxiliary grinding device for carrying and sensing the workpiece being polished, including: a carrying portion for carrying the workpiece and withstanding at least one of force and torque from the workpiece; and a sensing module , connected to the bearing part; the connecting part is provided between the bearing part and the sensing module; the base is connected to the mounting part and includes a first hollow part, the first hollow part is in conduction with the first channel; the mounting part , located between the sensing module and the base, the mounting part is a hollow structure, and the hollow part is set as the first channel; the sensing module is also connected to a cable, and the cable is used to pass through the first hollow and the first channel, coupled with the sensing module; the sensing module is used to sense at least one of the force and torque, form a pressure value, and transmit the pressure value to the cable through the cable. Grinding device.
進一步地,其中該承載部,包含第一孔;該感測模組,包含第二中空部;該連接部為中空結構,中空部分被設置為第二通道;抽氣模組,包含氣管, 該氣管耦接該第一孔,用於貫穿該第一中空部、該第一通道、該第二中空部及該第二通道的至少一個,以藉由該第一孔,形成置於該承載部上的該工件與該承載部的結合力。 Further, the bearing part includes a first hole; the sensing module includes a second hollow part; the connecting part is a hollow structure, and the hollow part is configured as a second channel; the air extraction module includes a trachea, The air pipe is coupled to the first hole and used to penetrate at least one of the first hollow part, the first channel, the second hollow part and the second channel, so as to form a position on the bearing through the first hole. The bonding force between the workpiece on the part and the bearing part.
進一步地,其中該底座包含:密封蓋,連接該安裝部,包含第二孔;內腔,包含該第一中空部;該第二孔設於該第一中空部與該第一通道之間;移動部,連接該內腔;該內腔,進一步包含密封部,該密封部設於該移動部與該第一中空部之間。 Further, the base includes: a sealing cover connected to the mounting part and including a second hole; an inner cavity including the first hollow part; the second hole is provided between the first hollow part and the first channel; The moving part is connected to the inner cavity; the inner cavity further includes a sealing part, and the sealing part is provided between the moving part and the first hollow part.
本申請第四方面提供一種輔助打磨的系統,用於輔助打磨裝置打磨工件,包含:通訊器,用於獲取第一軌跡及第二軌跡;處理器,耦接該通訊器,用於:控制承載模組沿該第一軌跡執行暫停、移動及轉動的至少一個,該承載模組用於承載該工件;獲取觸發信號,確定該觸發信號達到觸發條件;基於該觸發信號達到觸發條件,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 A fourth aspect of this application provides an auxiliary grinding system for assisting a grinding device in grinding workpieces, including: a communicator, used to obtain the first trajectory and the second trajectory; a processor, coupled to the communicator, used to: control the bearing The module performs at least one of pausing, moving and rotating along the first trajectory, and the carrying module is used to carry the workpiece; obtain a trigger signal and determine that the trigger signal reaches the trigger condition; based on the trigger signal reaching the trigger condition, control the load The module changes to perform at least one of pausing, moving and rotating along the second trajectory.
進一步地,其中該觸發信號為沿該第一軌跡已打磨該工件的時間,該系統進一步包含:計時器,耦接該處理器,用於獲取該時間;該處理器,進一步用於:確定該時間等於預設時間;基於該時間等於預設時間,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 Further, where the trigger signal is the time when the workpiece has been polished along the first trajectory, the system further includes: a timer, coupled to the processor, for obtaining the time; the processor, further for: determining the The time is equal to the preset time; based on the time being equal to the preset time, the carrying module is controlled to change to perform at least one of pausing, moving and rotating along the second trajectory.
進一步地,其中該觸發信號為沿該第一軌跡打磨該工件的速度,該系統進一步包含:探測器,耦接該處理器,用於探測該速度;該處理器,進一步用於:確定該速度小於或等於預設速度;基於該速度小於或等於預設速度,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 Further, wherein the trigger signal is the speed of polishing the workpiece along the first trajectory, the system further includes: a detector coupled to the processor, used to detect the speed; the processor, further used to: determine the speed Less than or equal to the preset speed; based on the speed being less than or equal to the preset speed, the carrying module is controlled to change to at least one of pausing, moving and rotating along the second trajectory.
本申請第五方面提供一種輔助打磨的方法,用於控制輔助打磨系統以配合打磨裝置打磨工件,包含:獲取第一軌跡及第二軌跡;控制承載模組沿該第一軌跡執行暫停、移動及轉動的至少一個,該承載模組用於承載該工件;獲 取觸發信號,確定該觸發信號達到觸發條件;基於該觸發信號達到觸發條件,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 The fifth aspect of this application provides an auxiliary grinding method for controlling the auxiliary grinding system to cooperate with the grinding device to grind the workpiece, including: obtaining the first trajectory and the second trajectory; controlling the load-bearing module to perform pause, move and At least one of the rotating parts is used to carry the workpiece; Get the trigger signal and determine that the trigger signal reaches the trigger condition; based on the trigger signal reaching the trigger condition, control the carrying module to change to at least one of pause, move and rotate along the second trajectory.
進一步地,其中該觸發信號為沿該第一軌跡已打磨該工件的時間,該獲取觸發信號,確定該觸發信號達到觸發條件的步驟,包含:獲取該時間;確定該時間等於預設時間;基於該時間等於預設時間,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 Further, where the trigger signal is the time when the workpiece has been polished along the first trajectory, the step of obtaining the trigger signal and determining that the trigger signal reaches the trigger condition includes: obtaining the time; determining that the time is equal to a preset time; based on The time is equal to a preset time, and the carrying module is controlled to change to perform at least one of pausing, moving and rotating along the second trajectory.
進一步地,其中該觸發信號為沿該第一軌跡打磨該工件的速度,該獲取觸發信號,確定該觸發信號達到觸發條件的步驟,包含:探測該速度;確定該速度小於或等於預設速度;基於該速度小於或等於預設速度,控制該承載模組變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。 Further, wherein the trigger signal is the speed of polishing the workpiece along the first trajectory, the steps of obtaining the trigger signal and determining that the trigger signal reaches the trigger condition include: detecting the speed; determining that the speed is less than or equal to a preset speed; Based on the speed being less than or equal to the preset speed, the carrying module is controlled to change to perform at least one of pausing, moving and rotating along the second trajectory.
本申請提供的打磨系統及打磨方法藉由感測工件的受力資訊,並基於該受力資訊調整打磨頭的運行軌跡,藉由控制打磨頭的運行軌跡以實現量化控制打磨過程工件的各個打磨點的受力情況,以提升打磨工件的品質。 The grinding system and grinding method provided by this application sense the force information of the workpiece and adjust the operating trajectory of the grinding head based on the force information. By controlling the operating trajectory of the grinding head, quantitative control of each grinding process of the workpiece is achieved. The stress situation of the points to improve the quality of the polished workpiece.
700:打磨系統 700:Grinding system
12:工件 12:Workpiece
30:感測模組 30: Sensing module
720:第一處理器 720: First processor
80:承載模組 80: Carrying module
10:打磨頭 10:Grinding head
800:輔助打磨的裝置 800: Auxiliary grinding device
810:承載部 810: Bearing Department
830:底座 830:Base
840:安裝部 840:Installation Department
850:線纜 850:Cable
831:第一中空部 831:First hollow part
841:第一通道 841: First channel
820:連接部 820:Connection Department
860:抽氣模組 860: Air extraction module
821:第二通道 821: Second channel
31:第二中空部 31:Second hollow part
831:封蓋 831:Block
832:內腔 832:Inner cavity
833:移動部 833:Mobile Department
8311:第二孔 8311:Second hole
8322:密封部 8322:Sealing part
870:電機 870:Motor
880:同步帶 880: Timing belt
890:減速機 890:Reducer
90:防護裝置 90: Protective device
900:助打磨的系統 900: Sanding-assisted system
910:通訊器 910:Communicator
920:第二處理器 920: Second processor
940:探測器 940:Detector
930:計時器 930: timer
圖1示出根據本申請的一個或多個實施方式的打磨系統的示意圖。 Figure 1 shows a schematic diagram of a sanding system according to one or more embodiments of the present application.
圖2示出根據本申請的一個或多個實施方式的打磨系統的狀態示意圖。 Figure 2 shows a state schematic diagram of a grinding system according to one or more embodiments of the present application.
圖3示出根據本申請的一個或多個實施方式的運行軌跡的示意圖。 Figure 3 shows a schematic diagram of a running trajectory according to one or more embodiments of the present application.
圖4示出根據本申請的一個或多個實施方式的打磨方法的示意圖。 Figure 4 shows a schematic diagram of a grinding method according to one or more embodiments of the present application.
圖5示出根據本申請的一個或多個實施方式的打磨方法的示意圖。 Figure 5 shows a schematic diagram of a grinding method according to one or more embodiments of the present application.
圖6示出根據本申請的一個或多個實施方式的打磨方法的示意圖。 Figure 6 shows a schematic diagram of a grinding method according to one or more embodiments of the present application.
圖7示出根據本申請的一個或多個實施方式的輔助打磨的裝置的立體示意圖。 Figure 7 shows a perspective view of a device for assisting grinding according to one or more embodiments of the present application.
圖8示出根據本申請的一個或多個實施方式的輔助打磨的裝置的剖視圖。 Figure 8 shows a cross-sectional view of a device for assisting grinding according to one or more embodiments of the present application.
圖9示出根據本申請的一個或多個實施方式的輔助打磨的系統的示意圖。 Figure 9 shows a schematic diagram of a system for assisting grinding according to one or more embodiments of the present application.
圖10示出根據本申請的一個或多個實施方式的輔助打磨的方法的示意圖。 Figure 10 shows a schematic diagram of a method of assisted grinding according to one or more embodiments of the present application.
下面將結合本申請實施例中的附圖,對本申請實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例僅是本申請一部分實施例,而不是全部的實施例。基於本申請中的實施例,本領域普通技術人員在沒有做出創造性勞動前提下所獲得的所有其他實施例,都屬於本申請保護的範圍。 The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of this application.
需要說明的是,當一個元件或元件被認為是“連接”另一個元件或元件,它可以是直接連接到另一個元件或元件或者可能同時存在居中設置的元件或元件。當一個元件或元件被認為是“設置在”另一個元件或元件,它可以是直接設置在另一個元件或元件上或者可能同時存在居中設置的元件或元件。 It should be noted that when an element or element is referred to as being "connected to" another element or element, it can be directly connected to the other element or elements or intervening elements or elements may be present at the same time. When an element or element is referred to as being "disposed on" another element or element, it can be directly on the other element or element or intervening elements or elements may be present at the same time.
除非另有定義,本申請所使用的所有的技術及科學術語與屬於本申請的技術領域的技術人員通常理解的含義相同。本申請中在本申請的說明書中所使用的術語只是為了描述具體的實施例的目的,不是旨在於限制本申請。本申請所使用的術語“及/或”包含一個或多個相關的所列專案的任意的及所有的組合。 Unless otherwise defined, all technical and scientific terms used in this application have the same meanings as commonly understood by those skilled in the technical field of this application. The terms used in the description of the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
本申請的各種實施方式可採取完全或部分硬體實施方式、完全或部分軟體實施方式、或軟體與硬體的組合(例如,固件實施方式)的形式。此外,如這裡所描述的,本申請的各種實施方式(例如,系統與方法)可以採取電腦程式產品的形式,該電腦程式產品包含具有比如電腦軟體的電腦可訪問指令(例如,電 腦可讀與/或電腦可執行指令)的電腦可讀非暫時性存儲介質,該電腦可訪問指令被編碼或被實施在這種存儲介質中。 Various implementations of the present application may take the form of fully or partially hardware implementations, fully or partially software implementations, or a combination of software and hardware (eg, firmware implementations). Additionally, as described herein, various embodiments of the present application (e.g., systems and methods) may take the form of a computer program product containing computer-accessible instructions (e.g., electronic software) having, for example, computer software. A computer-readable non-transitory storage medium containing brain-readable and/or computer-executable instructions) in which the computer-accessible instructions are encoded or implemented.
這些指令可由一個或多個處理器讀取或存取與執行以執行或允許執行本申請描述的操作。指令可以以任何合適的形式提供,例如,原始程式碼、編譯代碼、解釋代碼、可執行代碼、靜態代碼、動態代碼、匯編碼、前述的組合等。可以使用任何合適的電腦可讀非暫時性存儲介質來形成電腦程式產品。例如,電腦可讀介質可以包含任何有形的非暫時性介質,用於以可由與其功能性耦接的一個或多個電腦或處理器讀取或以其他方式可訪問的形式存儲資訊。非暫時性存儲介質可以被實施為或可以包含ROM;RAM;磁片存儲介質;光學存儲介質;快閃記憶體等。 These instructions may be read or accessed and executed by one or more processors to perform or allow performance of the operations described herein. Instructions may be provided in any suitable form, such as original code, compiled code, interpreted code, executable code, static code, dynamic code, assembly code, combinations of the foregoing, etc. The computer program product may be formed using any suitable computer-readable non-transitory storage medium. For example, computer-readable media may include any tangible, non-transitory medium for storing information in a form that can be read or otherwise accessed by one or more computers or processors to which it is functionally coupled. Non-transitory storage media may be implemented as or may include ROM; RAM; magnetic disk storage media; optical storage media; flash memory, etc.
這裡參考方法、系統、設備與電腦程式產品的框圖與流程圖來描述操作環境與技術的至少一些實施方式。可以理解,框圖與流程圖中的每個框以及框圖與流程圖中的框的組合可以分別由電腦可訪問指令來實現。在某些實現方式中,可以將電腦可訪問指令載入或併入通用電腦、專用電腦或其他可程式設計資訊處理設備中以產生特定機器,使得可以回應於在電腦或處理設備處的執行來實現在一個或多個流程圖塊中指定的操作或功能。 At least some implementations of operating environments and techniques are described herein with reference to block diagrams and flowcharts of methods, systems, devices and computer program products. It will be understood that each block of the block diagrams and flowchart illustrations, and combinations of blocks in the block diagrams and flowchart illustrations, respectively, can be implemented by computer-accessible instructions. In some implementations, computer-accessible instructions may be loaded or incorporated into a general-purpose computer, special-purpose computer, or other programmable information processing device to produce a particular machine that may respond to execution at the computer or processing device. Implements the operations or functions specified in one or more flowchart blocks.
除非另有明確示出,否則本申請提出的任何方案、程式、過程或技術絕不應解釋為要求以特定循序執行其動作或步驟。因此,當過程或方法請求項實際上沒有記載其動作或步驟遵循的順序時,或者在本主題公開的請求項或描述中沒有另外具體記載步驟將被限於特定順序時,絕不意味著在任何方面推斷順序。這適用於解釋的任何可能的非明確基礎,包含:關於步驟或操作流程的佈置的邏輯事項;源於語法組織或標點符號的平常意義;在說明書或附圖等中描述的實施方式的數量或類型。 Unless expressly stated otherwise, any scheme, procedure, process or technique set forth in this application shall in no way be construed as requiring that its actions or steps be performed in a specific order. Therefore, when a process or method claim does not actually recite the order in which its actions or steps are to be followed, or when there is no other specific recitation in the claim or description of the subject disclosure that the steps will be limited to a particular order, it in no way means that in any Aspect inference order. This applies to any possible non-explicit basis for the explanation, including: logical matters regarding the arrangement of steps or operating procedures; ordinary meanings arising from grammatical organization or punctuation; the number of embodiments described in the description or drawings, etc., or type.
如本申請中所使用,術語“環境”、“系統”、“引擎”、“模組”、“構件”、“架構”、“介面”、“單元”等指代電腦相關實體或與具有一個或多個限定功能性的操作設備相關的實體。術語“環境”、“系統”、“引擎”、“模組”、“構件”、“架構”、“介面”與“單元”可以互換使用,並且一 般可以指功能元件。這樣的實體可以是硬體、硬體與軟體的組合、軟體或執行中的軟體。例如,模組可以被實施為處理器上運行的進程、處理器、物件、軟體的可執行部分、執行執行緒、程式與/或計算裝置。又例如,在計算裝置上執行的軟體應用程式與計算裝置都可以實施為模組。又例如,一個或多個模組可駐留在進程與/或執行執行緒內。模組可以位於一個計算裝置上或分佈在兩個或多個計算裝置之間。如本申請所公開,模組可從其上存儲有各種資料結構的各種電腦可讀非暫時性存儲媒體執行。模組可以經由本地與/或遠端進程根據例如,具有一個或多個資料包(例如,來自與本地系統、分散式系統中的另一構件交互的構件的資料,與/或來自與在例如具有其它系統的廣域網路上的另一構件經由信號交互的構件的資料)的信號(類比的或數位的)進行通訊。 As used in this application, the terms "environment", "system", "engine", "module", "component", "architecture", "interface", "unit" and the like refer to a computer-related entity or entity having a Or multiple operating device-related entities with limited functionality. The terms "environment", "system", "engine", "module", "component", "architecture", "interface" and "unit" are used interchangeably and always Generally can refer to functional components. Such an entity may be hardware, a combination of hardware and software, software, or software in execution. For example, a module may be implemented as a process running on a processor, a processor, an object, an executable portion of software, an execution thread, a program, and/or a computing device. As another example, both a software application executing on a computing device and the computing device may be implemented as a module. As another example, one or more modules may reside within a process and/or thread of execution. A module can be localized on one computing device or distributed between two or more computing devices. As disclosed herein, modules may execute from a variety of computer-readable non-transitory storage media having various data structures stored thereon. Modules may have one or more packages of data (e.g., data from a component that interacts with another component in a local system, a distributed system, and/or from a component that interacts with another component in a local system, a distributed system, and/or via local and/or remote processes, for example). Another component on a wide area network with other systems communicates via signals (analog or digital) of the component's data) that the signal interacts with.
又例如,模組可以被實施為或可以包含具有由機械部件提供的限定功能的設備,機械部件由電路或電子電路操作,電路或電子電路由軟體應用或由處理器執行的固件應用控制。這種處理器可以在設備內部或外部,並且可以執行軟體或固件應用的至少一部分。又例如,模組可以被實施為或者可以包含藉由沒有機械部件的電子部件提供限定功能的設備。電子部件可包含處理器以執行軟體或固件,軟體或固件允許或至少部分地促進電子部件的功能性。 As another example, a module may be implemented as or may contain a device with defined functionality provided by mechanical components operated by electrical or electronic circuits controlled by software applications or firmware applications executed by a processor. Such a processor may be internal or external to the device and may execute at least part of a software or firmware application. As another example, a module may be implemented as, or may include, a device that provides defined functionality through electronic components without mechanical components. The electronic component may include a processor to execute software or firmware that allows or at least partially facilitates the functionality of the electronic component.
在一些實施方式中,模組可以經由本地與/或遠端進程根據例如,具有一個或多個資料包(例如,來自與本地系統、分散式系統中的另一構件交互的構件的資料,與/或來自與在例如具有其它系統的廣域網路上的另一構件經由信號交互的構件的資料)的信號(類比或數位)進行通訊。另外,或在其他實施方式中,模組可藉由熱、機械、電與/或機電耦接機構(例如,導管、連接器、其組合等)通訊或以其他方式耦接。介面可包含輸入/輸出(Input/Output,I/O)構件以及相關聯的處理器、應用程式與/或其他程式設計構件。 In some embodiments, a module may have one or more data packages (e.g., data from a component that interacts with another component in a local system, a distributed system, and /or communicate via signals (analog or digital) from a component that interacts via signals with another component on, for example, a wide area network with other systems. Additionally, or in other embodiments, modules may communicate or otherwise be coupled via thermal, mechanical, electrical and/or electromechanical coupling mechanisms (eg, conduits, connectors, combinations thereof, etc.). The interface may include input/output (I/O) components and associated processors, applications, and/or other programming components.
如本申請中所使用的,術語“通訊器”可以指任何類型的通訊電路或設備。通訊器可以被實施為幾種類型的網路元件或者可以包含幾種類型的網路元件,包含基站;路由器設備;開關設備;伺服器設備;聚合器設備;匯流排架構;前述的組合;或類似物。一個或多個匯流排架構可以包含工業匯流排架 構,比如基於乙太網的工業匯流排、控制器局域網(CAN)匯流排、Modbus、其他類型的現場匯流排架構等。 As used in this application, the term "communicator" may refer to any type of communications circuit or device. A communicator may be implemented as or may contain several types of network elements, including base stations; router equipment; switching equipment; server equipment; aggregator equipment; bus architecture; combinations of the foregoing; or Analogues. One or more bus architectures may contain industrial bus racks structures, such as Ethernet-based industrial buses, Controller Area Network (CAN) buses, Modbus, other types of field bus architectures, etc.
如本申請中所使用的,術語“處理器”可以指任何類型的處理電路或設備。處理器可被實現為處理電路或計算處理單元(例如,(Central Processing Unit,CPU)、(Graphics Processing Unit,GPU)或兩者的組合)的組合。因此,為了描述目的,處理器可以指單核處理器;具有軟體多執行緒執行能力的單一處理器;多核處理器;具有軟體多執行緒執行能力的多核處理器;具有硬體多執行緒技術的多核處理器;並行處理(或計算)平臺;以及具有分散式共用記憶體的平行計算平臺。另外,或又例如,處理器可指積體電路(Integrated Circuit,IC)、專用積體電路(Application Specific Integrated Circuit,ASIC)、數位訊號處理器(Digital Signal Processor,DSP)、現場可程式設計閘陣列(Field Programmable Gate Array,FPGA)、可程式設計邏輯控制器(Programmable Logic Controller,PLC)、複雜可程式設計邏輯裝置(Complex Programmable Logic Device,CPLD)、離散門電路或電晶體邏輯、離散硬體構件、或其被設計或配置(例如,製造)以執行在此描述的功能的任何組合。在一些實施方式中,處理器可以使用納米級架構,為了優化空間使用或增強根據本申請的系統、設備或其他電子設備的性能。例如,處理器可以包含分子電晶體與/或基於量子點的電晶體、開關與門電路。 As used in this application, the term "processor" may refer to any type of processing circuit or device. A processor may be implemented as a combination of processing circuitry or computational processing units (eg, a Central Processing Unit (CPU), a Graphics Processing Unit (GPU), or a combination of both). Therefore, for descriptive purposes, a processor may refer to a single-core processor; a single processor with software multi-thread execution capability; a multi-core processor; a multi-core processor with software multi-thread execution capability; a hardware multi-thread technology Multi-core processors; parallel processing (or computing) platforms; and parallel computing platforms with distributed shared memory. In addition, or for another example, the processor may refer to an integrated circuit (IC), an application specific integrated circuit (ASIC), a digital signal processor (Digital Signal Processor, DSP), or a field programmable gate. Array (Field Programmable Gate Array, FPGA), Programmable Logic Controller (PLC), Complex Programmable Logic Device (CPLD), discrete gate circuit or transistor logic, discrete hardware Components, or any combination thereof designed or configured (eg, manufactured) to perform the functions described herein. In some embodiments, the processor may use nanoscale architecture in order to optimize space usage or enhance performance of systems, devices, or other electronic devices in accordance with the present application. For example, a processor may include molecular transistors and/or quantum dot-based transistors, switches, and gates.
此外,在本說明書與附圖中,比如“存儲”、“記憶體”、“資料存儲”、“資料記憶體”、“記憶體”、“存儲庫”等術語以及與本申請的部件的操作與功能相關的基本上任何其他資訊存儲構件是指記憶體構件、實施在一個或多個記憶體設備中的實體,或形成記憶體設備的構件。應注意,本申請所描述的記憶體構件或記憶體設備實施或包含可由計算裝置讀取或存取的非暫時性電腦存儲媒體。這樣的介質可以以用於存儲資訊的任何方法或技術來實現,比如機器可訪問指令(例如,電腦可讀指令)、資訊結構、程式模組或其他資訊物件。 In addition, in this specification and the drawings, terms such as "storage", "memory", "data storage", "data memory", "memory", "repository" and the operation of components of the present application Basically any other information storage component with respect to functionality refers to a memory component, an entity implemented in one or more memory devices, or a component forming a memory device. It should be noted that the memory components or memory devices described herein implement or include non-transitory computer storage media that can be read or accessed by a computing device. Such media may be implemented in any method or technology for storage of information, such as machine-accessible instructions (e.g., computer-readable instructions), information structures, program modules, or other information objects.
此外,在本說明書與附圖中,比如“存儲”、“記憶體”、“資料存儲”、“資料記憶體”、“記憶體”、“存儲庫”等術語以及與本申請的部件 的操作與功能相關的基本上任何其他資訊存儲構件是指記憶體構件、實施在一個或多個記憶體設備中的實體,或形成記憶體設備的構件。記憶體構件或記憶體設備可被實施為易失性記憶體或非易失性記憶體,或可包含易失性與非易失性記憶體兩者。此外,記憶體部件或記憶體設備可以是可移動的或不可移動的,與/或在計算裝置或部件的內部或外部。各種類型的非暫時性存儲介質的實例可以包含硬碟驅動器、zip驅動器、CD-ROM、數位多用盤(Digital Video Disc,DVD)或其他光存儲、磁帶盒、磁帶、磁片存儲或其他磁存放裝置、快閃記憶體卡或其他類型的存儲卡、盒式磁帶或適於保留所需資訊並可由計算裝置訪問的任何其他非暫時性介質。例如,非易失性記憶體可包含唯讀記憶體(Read-Only Memory,ROM)、可程式設計ROM(Programmable Read-Only Memory,PROM)、電可程式設計ROM(Erasable Programmable Read-Only Memory,EPROM)、電可擦除可程式設計ROM(Electrically Erasable Programmable Read-Only Memory,EEPROM)或快閃記憶體。易失性記憶體可以包含用作外部緩衝記憶體的隨機存取記憶體(Random Access Memory,RAM)。作為說明而非限制,RAM具有多種形式,例如,同步RAM(Static Random Access Memory,SRAM)、動態RAM(Dynamic Random Access Memory,DRAM)、同步DRAM(Synchronous Dynamic Random Access Memory,SDRAM)、雙數據速率SDRAM(Double Data Rate Synchronous Dynamic Random Access Memory,DDR SDRAM)、增強型SDRAM(Enhanced Synchronous DRAM,ESDRAM)、同步鏈路DRAM(Sync Link DRAM,SLDRAM)與直接Rambus RAM(Direct Rambus RAM,DRRAM)。在此描述的操作或計算環境的所公開的記憶體設備或記憶體旨在包含這些與/或任何其他合適類型的記憶體之一或多個。 In addition, in this specification and the drawings, terms such as "storage", "memory", "data storage", "data memory", "memory", "repository" and other terms related to the components of this application The operation and functionality of essentially any other information storage component is a memory component, an entity implemented in one or more memory devices, or a component forming a memory device. A memory component or memory device may be implemented as volatile memory or non-volatile memory, or may include both volatile and non-volatile memory. Furthermore, a memory component or memory device may be removable or non-removable, and/or be internal or external to the computing device or component. Examples of various types of non-transitory storage media may include hard drives, zip drives, CD-ROMs, Digital Video Discs (DVDs) or other optical storage, tape cassettes, tapes, disk storage or other magnetic storage device, flash memory card or other type of memory card, tape cartridge, or any other non-transitory medium suitable for retaining the required information and accessible by the computing device. For example, non-volatile memory may include read-only memory (ROM), programmable ROM (Programmable Read-Only Memory, PROM), electrically programmable ROM (Erasable Programmable Read-Only Memory, EPROM), electrically erasable programmable ROM (Electrically Erasable Programmable Read-Only Memory, EEPROM) or flash memory. Volatile memory may include random access memory (Random Access Memory, RAM) used as external buffer memory. By way of illustration and not limitation, RAM has many forms, such as synchronous RAM (Static Random Access Memory, SRAM), dynamic RAM (Dynamic Random Access Memory, DRAM), synchronous DRAM (Synchronous Dynamic Random Access Memory, SDRAM), double data rate SDRAM (Double Data Rate Synchronous Dynamic Random Access Memory, DDR SDRAM), enhanced SDRAM (Enhanced Synchronous DRAM, ESDRAM), synchronous link DRAM (Sync Link DRAM, SLDRAM) and direct Rambus RAM (Direct Rambus RAM, DRRAM). The disclosed memory devices or memories of the operating or computing environments described herein are intended to include one or more of these and/or any other suitable types of memory.
除非另外具體說明或在所使用的背景中另外理解,比如“可以”、“能夠”、“可能”或“可”等條件語言通常旨在傳達某些實現可以包含某些特徵、元件與/或操作,而其他實現方式不包含。因此,這種條件語言通常不旨在暗示特徵、元件與/或操作以任何方式對於一個或多個實現方式是必需的,或者一個 或多個實現方式必須包含用於在有或沒有使用者輸入或提示的情況下決定這些特徵、元件與/或操作是否被包含或將在任何特定實現方式中執行的邏輯。 Unless specifically stated otherwise or understood otherwise in the context in which it is used, conditional language such as "may," "could," "might," or "could" is generally intended to convey that certain implementations may include certain features, elements, and/or operations that other implementations do not. Accordingly, such conditional language is generally not intended to imply that features, elements, and/or operations are in any way required for one or more implementations, or that a The implementation or implementations must include logic for determining whether these features, components, and/or operations are included or will be performed in any particular implementation, with or without user input or prompts.
本申請的電腦可讀程式指令可經由網路(例如,網際網路、局域網、廣域網路與/或無線網路)從電腦可讀存儲介質或外部電腦或外部存放裝置下載到相應的計算/處理設備。網路可以包含銅傳輸電纜、光傳輸光纖、無線傳輸、路由器、防火牆、交換機、閘道電腦與/或邊緣伺服器。每個計算/處理設備中的網路介面卡卡或網路介面從網路接收電腦可讀程式指令,並轉發該電腦可讀程式指令以存儲在相應計算/處理設備內的電腦可讀非暫時性存儲介質中。在本說明書與附圖中已經描述的內容包含系統、設備、技術與電腦程式產品的實例,系統、設備、技術與電腦程式產品單獨地與組合地允許追蹤與跟蹤在工業設備中製造的產品的部件。當然,不可能出於描述本申請的各種元件的目的而描述部件與/或方法的每一可能組合,但是所公開元件的許多其它組合與排列是可能的。因此,很明顯,在不脫離本申請的範圍或精神的情況下,可以對本申請進行各種修改。此外,或者作為替代,藉由考慮說明書與附圖以及如本申請所呈現的本申請的實踐,本申請的其他實施方式可以是顯而易見的。 The computer-readable program instructions of the present application can be downloaded from a computer-readable storage medium or an external computer or external storage device to the corresponding calculation/processing via a network (such as the Internet, a local area network, a wide area network and/or a wireless network) equipment. The network may include copper transmission cables, optical fiber transmission, wireless transmission, routers, firewalls, switches, gateway computers and/or edge servers. A network interface card or network interface in each computing/processing device receives computer-readable program instructions from the network and forwards the computer-readable program instructions for storage in a computer-readable non-transitory file within the corresponding computing/processing device. storage medium. What has been described in this specification and in the drawings includes examples of systems, devices, techniques, and computer program products that individually and in combination allow the tracking and tracing of products manufactured in industrial equipment. part. Of course, it is not possible to describe every possible combination of components and/or methods for the purpose of describing the various elements of the present application, but many other combinations and permutations of the disclosed elements are possible. Therefore, it will be apparent that various modifications can be made without departing from the scope or spirit of the application. Additionally, or alternatively, other embodiments of the present application may be apparent from consideration of the specification and drawings, and practice of the application as presented herein.
在說明書與附圖中提出的實例在所有方面都被認為是說明性的而非限制性的。儘管這裡採用了限定的術語,但是它們僅用於一般的與描述性的意義,而不是用於限制的目的。 The examples set forth in the specification and drawings are to be considered in all respects as illustrative and not restrictive. Although qualified terms are employed herein, they are used in a general and descriptive sense only and not for purposes of limitation.
請參見圖1,本申請一個或多個實施例提供的打磨系統700,打磨系統700用於打磨工件12,打磨系統700包含感測模組30及第一處理器720。
Referring to FIG. 1 , one or more embodiments of the present application provide a grinding
感測模組30用於感測工件12的受力情況,形成壓力序列。
The
第一處理器720與感測模組30耦接,第一處理器720用於接收壓力序列,並形成指引資訊,其中指引資訊用於指引打磨頭10以預設軌跡打磨工件12。根據壓力序列與指引資訊,形成該壓力序列的偏差序列;根據該偏差序列,形成調整指令,以調整打磨頭10的位置。
The
可以理解,在其他實施例中,感測模組30可包含6軸力感應器,也可包含單軸力感應器,只要可直接感測工件12的受力情況即可。感測模組30還可為防護等級為IP65等級以上的力感應器,以滿足工件12打磨的安全需求。
It can be understood that in other embodiments, the
如此,請參見圖2,感測模組30可設於承載工件12的承載模組80上,以感測工件12的受力情況,其中受力情況包含工件12的打磨部410的多個點的受力情況,多個點受力情況形成壓力序列。
In this way, please refer to FIG. 2 , the
感測模組30將該壓力序列發送至第一處理器720,第一處理器720接收壓力序列,並形成指引資訊,其中指引資訊用於指引打磨工件12的打磨頭10的運行軌跡,例如運行軌跡與工件12的待打磨部分的形狀一致,例如圓形、方形或環形,或運行軌跡為打磨頭10沿圓形或方形、環形運動過程同時沿垂直於環形運動方向運動的複合運動軌跡。
The
第一處理器720基於運動軌跡及運動軌跡中工件12的受力情況,即接收到的壓力序列,及時調整或預配置打磨頭10在運行過程中對工件12的施加力的情況,即形成偏差序列。
The
第一處理器720依據偏差序列,形成調整指令,以調整打磨頭10打磨工件12時,使打磨頭10在工件12的不同的待打磨部分對應不同的位置,以使工件12的打磨部的各個點的受力情況符合預設的壓力序列,以實現量化控制打磨頭10打磨工件12的不同部位的施力情況。
The
示例性的,可藉由偏差序列形成運行軌跡的調整量,將該調整量疊加或以其他方式調整預設的運行軌跡,形成調整後的運行軌跡,該調整後的運行軌跡藉由轉換關係,轉換為打磨工件12時的施力控制序列,該施力控制序列即為該調整指令,根據該調整指令,即能夠實現符合打磨精度要求的、適應當前場景與工況的打磨頭10打磨工件12過程,得到符合打磨精度要求的工件12。
For example, the adjustment amount of the operating trajectory can be formed through the deviation sequence, and the adjustment amount is superimposed or otherwise adjusted to the preset operating trajectory to form an adjusted operating trajectory. The adjusted operating trajectory is based on the conversion relationship. Converting to the force application control sequence when grinding the
進一步地,其中指引資訊包含預設位置及轉換關係,該預設位置為打磨頭10打磨工件12的計算位置,即打磨頭10在打磨工件12的不同打磨點時處於的位置資訊。該轉換關係為打磨頭10的壓力與打磨頭10上打磨材料的形變資訊的換算式,第一處理器720進一步用於:根據打磨頭10上打磨材料的剛性參
數,確定轉換關係;根據壓力序列及轉換關係,形成與壓力序列對應的形變資訊;根據形變資訊與該預設位置,形成偏差序列。
Furthermore, the guidance information includes a preset position and a conversion relationship. The preset position is the calculated position of the grinding
如此,第一處理器720基於打磨頭10上打磨材料的剛性參數確定轉換關係,其中剛性參數主要決定壓入對象材質(如砂紙)的軟硬程度(類似於彈性係數的概念),以提供控制計算中力/位置的轉換關係。第一處理器720依據轉換關係與壓力序列,形成與壓力序列對應的形變資訊,其中形變資訊是靠力控參數裡面一個材質係數s(決定受力材質的軟硬程度/剛性,類似彈性係數,單位為mm/N)來設定。
In this way, the
例如打磨頭10貼上砂紙,往工件12裡面壓入0.1mm,然後看受力上升了多少N,就能得出該砂紙的材質係數s。因此,形變資訊為力*s。第一處理器720依據形變資訊與打磨頭10的預設位置,形成偏差序列,其中偏差序列即為打磨頭10基於形變資訊與預設位置的調整資訊,例如,打磨頭10由於施加預設壓力10N,產生形變量為0.2mm,則打磨頭10需要基於預設位置與形變方向移動0.2mm。
For example, attach sandpaper to the grinding
進一步地,第一處理器720進一步用於:根據該壓力序列,藉由濾波器形成調整後的壓力序列;根據該調整後的壓力序列與該指引資訊,確定該偏差序列。
Further, the
如此,藉由濾波器調整壓力序列,以消除高頻干擾,例如風磨機振動帶來的干擾,其中濾波器可為虛擬濾波器,也可以為實物濾波器。例如,基於LabVIEW Express程式設計實現的去除雜訊的虛擬濾波器。 In this way, the pressure sequence is adjusted through the filter to eliminate high-frequency interference, such as interference caused by vibration of a wind mill. The filter can be a virtual filter or a physical filter. For example, a virtual filter that removes noise is designed and implemented based on LabVIEW Express programming.
進一步地,其中指引資訊包含第一運行軌跡,第一處理器720進一步用於:形成該指引資訊,包含:確定打磨該工件12的裝置組合包含機器元件與該打磨頭10;基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成該第一運行軌跡,該第一運行軌跡為該打磨頭10的運行軌跡;
第一處理器720進一步用於根據該壓力序列及該第一運行軌跡,形成該偏差序列。
Further, where the guidance information includes the first operating trajectory, the
示例性地,形成指引資訊時,包含:首先確定打磨工件12的裝置組合包含機器元件與打磨頭10,其中機器元件可為機械臂,與打磨頭10相連接,用於依據控制指令控制打磨頭10運動,當然機器元件還可替換為其他驅動元件,只要可驅動打磨頭10運動即可。
For example, when forming the guidance information, it includes: first determining that the device combination for grinding the
其中機器組件驅動打磨頭10運動的軌跡為第一運行軌跡,該第一運行軌跡示例性為根據工件12成品需求預設的打磨軌跡,以藉由該第一運行軌跡打磨工件12後,獲得滿足精度要求的工件12。
The trajectory along which the machine component drives the grinding
第一處理器720依據壓力序列及該第一運行軌跡,形成該偏差序列,例如在打磨頭10打磨框架型的工件12的直邊時,工件12被承載模組80固定,機器組件驅動打磨頭10運動以打磨工件12。
The
具體地,如圖2所示,包含兩個坐標系,work坐標系與tool坐標系,其中work坐標系為基於感測模組30或基於承載模組80上的工件12建立的三維坐標系,其中tool坐標系是基於打磨頭10建立的三維坐標系。
Specifically, as shown in Figure 2, it includes two coordinate systems, the work coordinate system and the tool coordinate system, where the work coordinate system is a three-dimensional coordinate system established based on the
第一方向示意性為work坐標系的X軸方向,第二方向為work坐標系的Z軸方向,第三方向為work坐標系的Y軸方向(圖2為二維視圖,未示出,但Y軸方向可理解為垂直紙面方向)。 The first direction is schematically the X-axis direction of the work coordinate system, the second direction is the Z-axis direction of the work coordinate system, and the third direction is the Y-axis direction of the work coordinate system (Figure 2 is a two-dimensional view, not shown, but The Y-axis direction can be understood as the vertical direction of the paper).
基礎軌跡示意性為在work坐標系的XY平面形成打磨頭10的運行軌跡(示例性為平移軌跡),為描述方便,將打磨頭10在tool坐標系下的複合運動,分解為XY平面、ZY平面、XZ平面搓動工件12的運動。如圖2所示,tool坐標系跟隨打磨頭10運動,圖示中示出在不同打磨頭10不同運動位置時(例如第一狀態與第二狀態),tool坐標系的會轉換為匹配該第一狀態或該第二狀態,變成tool 1坐標系或tool 2坐標系。
The basic trajectory is schematically formed as the running trajectory of the grinding
進一步地,第一處理器720進一步用於:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第一調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的、該打磨頭10的運行軌跡,該第一調整量為在第二方向及該第三方向構成的平面上、載入在該基礎軌跡上的調整序列,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨
頭10朝向該工件12的方向;根據該基礎軌跡及該第一調整量,形成該第一運行軌跡。
Further, the
其中,打磨頭10根據tool坐標系下的XY平面的第一調整量,可為直線、圓形、橢圓、菱形中的至少一種,或其他根據打磨頭10的打磨面需求設置的其他平面搓動的運行軌跡,如此,可以依據第一調整量調整打磨頭10的運行軌跡,以將工件12打磨成不同的形狀。
Among them, the first adjustment amount of the grinding
進一步地,其中第一處理器720還用於:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第二調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第二調整量為在第二方向上疊加在該基礎軌跡上的載波信號,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第二調整量,形成該第一運行軌跡。
Further, the
具體地,請再次參見圖2,第二調整量為沿tool坐標系的Y軸方向施加一個帶頻率與振幅的載波信號,可以是正弦波、方波等,或其他根據打磨頭10的打磨面需求設置的其他軸向擺動的運行軌跡,以使打磨頭10實現軸向擺動。如此,藉由調整第二調整量,以使打磨頭10可定製化打磨工件12,例如,可控制打磨後工件12的形狀、光潔度等,以增強工件12的泛化性。
Specifically, please refer to Figure 2 again. The second adjustment amount is to apply a carrier signal with frequency and amplitude along the Y-axis direction of the tool coordinate system, which can be a sine wave, a square wave, etc., or other grinding surfaces according to the grinding
進一步地,其中第一處理器720還用於:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第三調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第三調整量為在該第一方向上疊加在該基礎軌跡上的固定值,該第一方向與該第三方向垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第三調整量,形成該第一運行軌跡。具體地,請再次參見圖2,第三調整量為沿tool坐標系的Z軸方向施加一打磨頭10壓入工件12的增量,如此,藉由第三增量使打磨頭10沿打磨方向,即tool坐標系的Z軸方向貼近工件12,以控制打磨頭10打磨工件12的品質。
Further, the
進一步地,第一處理器720進一步用於:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第四調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第四調整量為在該第一方向上疊加在該基礎軌跡上的變化值,該第一方向與該第三方向垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第四調整量,形成該第一運行軌跡。
Further, the
具體地,請再次參見圖2,第四調整量為沿tool坐標系的Z軸方向施加一變化值,可以理解,實際打磨過程中,有兩種打磨方式,一是打磨頭10過壓工件12的過壓量為固定值(如第三調整量),例如,打磨頭10的打磨面覆蓋有砂紙,用砂紙打磨工件12時,砂紙分為兩個區域,一個是沒有打磨過的區域,另一個是打磨過的區域,過壓量為固定值是指這兩個區域的打磨的過壓量均為固定的值,例如0.1mm,便於控制打磨關係;另一種打磨方式是過壓量為變化值(如第四調整量),從砂紙的打磨過的區域偏移到未打磨過的區域時,過壓量逐漸變大,例如從0.05mm到0.1mm,以使得砂紙打磨損耗更加均勻,增加砂紙的使用壽命,更好的控制砂紙打磨的精度。可以理解,也可藉由打磨頭10的打磨面直接打磨工件12。
Specifically, please refer to Figure 2 again. The fourth adjustment amount is to apply a change value along the Z-axis direction of the tool coordinate system. It can be understood that in the actual grinding process, there are two grinding methods. One is that the grinding
進一步地,其中該指引資訊還包含第二運行軌跡,第一處理器720進一步用於:形成該指引資訊,進一步包含:確定該裝置組合還包含承載模組80,該承載模組80用於承載該工件12且可轉動或可移動該工件12;基於該裝置組合還包含承載模組80,形成該第二運行軌跡,該第二運行軌跡為該工件12的運行軌跡;該第一處理器720進一步用於根據該壓力序列、該第一運行軌跡及該第二運行軌跡,形成該偏差序列。
Further, the guidance information also includes a second running trajectory, and the
具體地,請再次參見圖2,承載模組80為一可旋轉的治具,該治具可承載工件12並帶動工件12轉動,當然,承載模組80還可為其他機構,只要可轉動或可移動工件12即可。
Specifically, please refer to FIG. 2 again. The load-bearing
進一步地,其中指引資訊還包含倒角資訊,第一處理器720進一步用於:基於該裝置組合還包含承載模組80,確定該倒角資訊;根據該倒角資訊,
計算該第一運行軌跡與該倒角資訊對應的倒角軌跡;根據該倒角軌跡,形成該第二運行軌跡。
Further, the guidance information also includes chamfering information, and the
進一步地,該第一處理器720進一步用於:根據該第二運行軌跡及該倒角軌跡,調整該第一運行軌跡為第三運行軌跡;根據該壓力序列、該第三運行軌跡及該第二運行軌跡,形成該偏差序列。
Further, the
示例性的,打磨頭10打磨工件12的轉角時,打磨頭10與承載工件12的承載模組80均移動,且承載模組80承載工件12移動,藉由打磨頭10與承載模組80配合,以使打磨頭10保持基於tool坐標系的Z向保持不變,以使工件12的打磨品質可控。
For example, when the grinding
具體地,打磨頭10打磨工件12的轉角時,打磨頭10沿第一運行軌跡運行時,承載模組80帶動工件12沿第二運行軌跡運行,為了使打磨頭10基於tool坐標系的Z向保持不變,再次調整該第一運動軌跡,運行過程中調整量的集合即為偏差序列,藉由偏差序列調整該第一運行軌跡(如圖3中的A軌跡)為第三運行軌跡(如圖3中的B軌跡),以使打磨頭10基於tool坐標系的Z向保持不變,以使打磨的工件12的打磨品質可控。
Specifically, when the grinding
示例性的,請參見圖3,圖3為一個實施例或多個實施例中運行軌跡示意圖,其中軌跡A為第一軌跡,軌跡B為第三軌跡,軌跡A與軌跡B均為打磨頭10的運行軌跡且運動方向相同,第二運行軌跡為承載模組80帶動工件12移動的軌跡,第二運行軌跡與軌跡A、軌跡B的運動方向相反,依據承載模組80帶動工件12移動的軌跡與工件12的倒角軌跡,調整打磨頭10的運行軌跡,以使打磨頭10打磨工件12的倒角時,打磨頭10沿tool坐標系的Z軸方向相對承載模組80不變,以保證打磨頭10打磨的工件12的倒角的品質。
For example, please refer to Figure 3. Figure 3 is a schematic diagram of the operating trajectory in one embodiment or multiple embodiments, in which trajectory A is the first trajectory, trajectory B is the third trajectory, and both trajectory A and trajectory B are the grinding
具體地,其中倒角(如手機等3C產品的R角)為框架型的工件12的四角任一個,倒角資訊為R角的弧長。將R角分成5個弧長的組合,計算以獲取機器組件沿該5個等弧移動時沿tool坐標系的Z軸旋轉的角度,可為等分的或不等分的弧長組合,例如0-10-30-55-80-90度,然後把這些角度的負值,例如0、-10、-30、-55、-80、-90當作承載模組80的軌跡插值點,來控制承載模組
80沿work坐標系的Z軸的轉動,如此,承載模組80配合打磨頭10,承載模組80與打磨頭10分別沿不同的軌跡運動,以使打磨時打磨頭10在tool坐標系的Z軸保持不動,只在tool坐標系的XY軸平面平移,從而有效防止打磨頭10打磨工件12時死角的出現,防止機器元件的卡死,也能讓控制過程簡化。
Specifically, the chamfering (such as the R-angle of 3C products such as mobile phones) is any one of the four corners of the frame-shaped
請參見圖4,為本申請一個或多個實施例中提供的打磨方法,該打磨方法用於控制機器元件上的打磨頭10打磨工件12,可用於上述打磨系統,並以該打磨系統為例。該打磨方法包含以下步驟:
Please refer to Figure 4, which is a grinding method provided in one or more embodiments of the present application. This grinding method is used to control the grinding
步驟1002、接收壓力序列。 Step 1002: Receive a pressure sequence.
其中,該壓力序列形成於感測模組感測該工件12的受力情況。
The pressure sequence is formed when the sensing module senses the stress of the
步驟1004、形成指引資訊。 Step 1004: Form guidance information.
其中,該指引資訊用於指引該打磨頭10以預設軌跡打磨該工件12。
The guidance information is used to guide the grinding
步驟1006、根據該壓力序列與該指引資訊,形成該壓力序列的偏差序列。 Step 1006: Form a deviation sequence of the pressure sequence based on the pressure sequence and the guidance information.
步驟1008、根據該偏差序列,形成調整指令,以調整該打磨頭10的位置。
Step 1008: According to the deviation sequence, an adjustment instruction is formed to adjust the position of the grinding
請再次參見圖4,感測模組30感測工件12的受力情況,其中受力情況包含工件12待打磨部分的多個點的受力情況,多個點受力情況形成壓力序列。依據接收的壓力序列,並形成指引資訊,其中指引資訊用於指引打磨工件12的打磨頭10的運行軌跡,例如運行軌跡與工件12的打磨部的形狀一致,圓形或方形,或打磨頭10沿圓形或方形、環形運動過程同時沿垂直於環形運動方向運動的複合運動軌跡。
Please refer to FIG. 4 again. The
基於運動軌跡及運動軌跡中工件12的受力情況,即壓力序列,及時調整或預配置打磨頭10的運行過程的對工件12的施加力的情況,即形成偏差序列。
Based on the motion trajectory and the force on the
依據偏差序列,形成調整指令,以調整打磨頭10打磨工件12時,使打磨頭10在工件12的不同的待打磨部分對應不同的位置,以使工件12的打磨部
的各個點的受力情況符合預設的壓力序列,以實現量化控制打磨頭10打磨工件12的不同部位的施力情況。
According to the deviation sequence, an adjustment instruction is formed to adjust the grinding
示例性的,可藉由偏差序列形成運行軌跡的調整量,將該調整量疊加或以其他方式調整預設的運行軌跡,形成調整後的運行軌跡,該調整後的運行軌跡藉由轉換關係,轉換為打磨工件12時的施力控制序列,該施力控制序列即為該調整指令,根據該調整指令,即能夠實現符合打磨精度要求的、適應當前場景與工況的打磨頭10打磨工件12過程,得到符合打磨精度要求的工件12。
For example, the adjustment amount of the operating trajectory can be formed through the deviation sequence, and the adjustment amount is superimposed or otherwise adjusted to the preset operating trajectory to form an adjusted operating trajectory. The adjusted operating trajectory is based on the conversion relationship. Converting to the force application control sequence when grinding the
進一步地,其中指引資訊包含預設位置及轉換關係,該預設位置為打磨頭10打磨工件12的計算位置,即打磨頭10在打磨工件12的不同打磨點時處於的位置資訊。該轉換關係為打磨頭10的壓力與打磨頭10上打磨材料的形變資訊的換算式。請參見圖5,該打磨方法進一步包含以下步驟。
Furthermore, the guidance information includes a preset position and a conversion relationship. The preset position is the calculated position of the grinding
步驟1010、根據該打磨頭10上打磨材料的剛性參數,確定該轉換關係;步驟1012、根據該壓力序列及該轉換關係,形成與該壓力序列對應的該形變資訊;步驟1014、根據該形變資訊與該預設位置,形成該偏差序列。
Step 1010: Determine the conversion relationship based on the rigid parameters of the grinding material on the grinding
如此,基於打磨頭10上打磨材料的剛性參數確定轉換關係,其中剛性參數主要決定壓入對象材質(如砂紙)的軟硬程度(類似於彈性係數的概念),以提供控制計算中力/位置的轉換關係。依據轉換關係與壓力序列,形成與壓力序列對應的形變資訊,其中形變資訊是靠力控參數裡面一個材質係數s(決定受力材質的軟硬程度/剛性,類似彈性係數,單位為mm/N)來設定。
In this way, the conversion relationship is determined based on the rigidity parameters of the grinding material on the grinding
例如打磨頭10貼上砂紙,往工件12裡面壓入0.1mm,然後看受力上升了多少N,就能得出該砂紙的材質係數s。因此,形變資訊為力*s。第一處理器720依據形變資訊與打磨頭10的預設位置,形成偏差序列,其中偏差序列即為打磨頭10基於形變資訊與預設位置的調整資訊,例如,打磨頭10由於施加預設壓力10N,產生形變量為0.2mm,則打磨頭10需要基於預設位置與形變方向移動0.2mm。
For example, attach sandpaper to the grinding
進一步地,其中步驟1006中形成該壓力序列的偏差序列的步驟,具體包含:根據該壓力序列,藉由濾波器形成調整後的壓力序列;根據該調整後的壓力序列與該指引資訊,確定該偏差序列。 Further, the step of forming the deviation sequence of the pressure sequence in step 1006 specifically includes: forming an adjusted pressure sequence through a filter according to the pressure sequence; determining the adjusted pressure sequence according to the adjusted pressure sequence and the guidance information. Deviation sequence.
如此,藉由濾波器調整壓力序列,以消除高頻干擾,例如風磨機振動帶來的干擾,其中濾波器可為虛擬濾波器,也可以為實物濾波器。例如,基於LabVIEW Express程式設計實現的去除雜訊的虛擬濾波器。 In this way, the pressure sequence is adjusted through the filter to eliminate high-frequency interference, such as interference caused by vibration of a wind mill. The filter can be a virtual filter or a physical filter. For example, a virtual filter that removes noise is designed and implemented based on LabVIEW Express programming.
進一步地,其中該指引資訊包含第一運行軌跡,該形成指引資訊的步驟,如圖6所示,具體包含:步驟1020、確定打磨該工件12的裝置組合包含該機器元件與該打磨頭10;步驟1022、基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成該第一運行軌跡,該第一運行軌跡為該打磨頭10的運行軌跡;步驟1024、該形成該壓力序列的偏差序列的步驟,包含根據該第一運行軌跡及該壓力序列,形成該偏差序列。
Further, where the guidance information includes the first operating trajectory, the step of forming the guidance information, as shown in Figure 6, specifically includes: step 1020, determining that the device combination for grinding the
示例性的,確定打磨工件12的裝置組合包含機器元件與打磨頭10,其中機器元件可為機械臂,與打磨頭10相連接,用於依據控制指令控制打磨頭10運動,當然機器組件還可為其他驅動元件,只要可驅動打磨頭10運動即可。其中機器組件驅動打磨頭10運動的軌跡為第一運行軌跡,該第一運行軌跡示例性為根據工件12成品需求預設的打磨軌跡,以藉由該第一運行軌跡打磨工件12後,獲得滿足精度要求的工件12。依據壓力序列及該第一運行軌跡,形成該偏差序列,例如在打磨頭10打磨框架型的工件12的直邊時,工件12被承載模組80固定,機器組件驅動打磨頭10運動以打磨工件12。
For example, the device combination for determining the grinding
請再次參見圖2,包含兩個坐標系,work坐標系與tool坐標系,其中work坐標系為基於感測模組30或基於承載模組80上的工件12建立的三維坐標系,其中tool坐標系是基於打磨頭10建立的三維坐標系。
Please refer to Figure 2 again, which includes two coordinate systems, the work coordinate system and the tool coordinate system. The work coordinate system is a three-dimensional coordinate system established based on the
第一方向示意性為work坐標系的X軸方向,第二方向為work坐標系的Z軸方向,第三方向為work坐標系的Y軸方向(圖2為二維視圖,未示出,但Y軸方向可理解為垂直紙面方向)。 The first direction is schematically the X-axis direction of the work coordinate system, the second direction is the Z-axis direction of the work coordinate system, and the third direction is the Y-axis direction of the work coordinate system (Figure 2 is a two-dimensional view, not shown, but The Y-axis direction can be understood as the vertical direction of the paper).
基礎軌跡示意性為在work坐標系的XY平面形成打磨頭10的運行軌跡(示例性為平移軌跡),為描述方便,將打磨頭10在tool坐標系下的複合運動,分解為XY平面、ZY平面、XZ平面搓動工件12的運動。如圖2所示,tool坐標系跟隨打磨頭10運動,圖示中示出在不同打磨頭10不同運動位置時(例如第一狀態與第二狀態),tool坐標系的會轉換為匹配該第一狀態或該第二狀態,變成tool 1坐標系或tool 2坐標系。
The basic trajectory is schematically formed as the running trajectory of the grinding
進一步地,在步驟1022中,該形成該第一運行軌跡的步驟,包含:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第一調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的、該打磨頭10的運行軌跡,該第一調整量為在第二方向及該第三方向構成的平面上、載入在該基礎軌跡上的調整序列,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第一調整量,形成該第一運行軌跡。其中,打磨頭10根據tool坐標系下的XY平面的第一調整量,可為直線、圓形、橢圓、菱形中的至少一種,或其他根據打磨頭10的打磨面需求設置的其他平面搓動的運行軌跡,如此,可以依據第一調整量調整打磨頭10的運行軌跡,以將工件12打磨成不同的形狀。
Further, in step 1022, the step of forming the first operating trajectory includes: forming a basic trajectory and a first adjustment amount based on a device combination for polishing the
進一步地,在步驟1022中,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第二調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第二調整量為在第二方向上疊加在該基礎軌跡上的載波信號,該第一方向、該第二方向及該第三方向兩兩垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第二調整量,形成該第一運行軌跡。
Further, in step 1022, the step of forming the first operating trajectory includes: forming a basic trajectory and a second adjustment amount based on the device combination for polishing the
具體地,請再次參見圖2,第二調整量為沿tool坐標系的Y軸方向施加一個帶頻率與振幅的載波信號,可以是正弦波、方波等,或其他根據打磨頭10的打磨面需求設置的其他軸向擺動的運行軌跡,以使打磨頭10實現軸向擺動。如此,藉由調整第二調整量,以使打磨頭10可定製化打磨工件12,例如,可控制打磨後工件12的形狀、光潔度等,以增強工件12的泛化性。
Specifically, please refer to Figure 2 again. The second adjustment amount is to apply a carrier signal with frequency and amplitude along the Y-axis direction of the tool coordinate system, which can be a sine wave, a square wave, etc., or other grinding surfaces according to the grinding
進一步地,在步驟1022中,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第三調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第三調整量為在該第一方向上疊加在該基礎軌跡上的固定值,該第一方向與該第三方向垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第三調整量,形成該第一運行軌跡。
Further, in step 1022, the step of forming the first operating trajectory includes: forming a basic trajectory and a third adjustment amount based on the device combination for polishing the
具體地,請再次參見圖2,在tool坐標系的Z軸與Y軸的YZ平面形成打磨頭10的運行軌跡,打磨頭10在YZ平面搓動工件12,第三調整量為沿tool坐標系的Z軸方向施加一打磨頭10壓入工件12的增量,如此,藉由第三增量使打磨頭10沿打磨方向,即tool坐標系的Z軸方向貼近工件12,以控制打磨頭10打磨工件12的品質。
Specifically, please refer to Figure 2 again. The YZ plane of the Z axis and the Y axis of the tool coordinate system forms the running trajectory of the grinding
進一步地,在步驟1022中,其中該形成該第一運行軌跡的步驟,包含:基於打磨該工件12的裝置組合包含該機器元件與該打磨頭10,形成基礎軌跡及第四調整量,該基礎軌跡為在第一方向及第三方向構成的平面上形成的移動軌跡,該第四調整量為在該第一方向上疊加在該基礎軌跡上的變化值,該第一方向與該第三方向垂直,該第一方向為該打磨頭10朝向該工件12的方向;根據該基礎軌跡及該第四調整量,形成該第一運行軌跡。
Further, in step 1022, the step of forming the first operating trajectory includes: forming a basic trajectory and a fourth adjustment amount based on the device combination for polishing the
具體地,請再次參見圖2,第四調整量為沿tool坐標系的Z軸方向施加一變化值,可以理解,實際打磨過程中,有兩種打磨方式,一是打磨頭10過壓工件12的過壓量為固定值(如第三調整量),例如,打磨頭10的打磨面覆蓋有砂紙,用砂紙打磨工件12時,砂紙分為兩個區域,一個是沒有打磨過的區域,另一個是打磨過的區域,過壓量為固定值是指這兩個區域的打磨的過壓量均為
固定的值,例如0.1mm,便於控制打磨關係;另一種打磨方式是過壓量為變化值(如第四調整量),從砂紙的打磨過的區域偏移到未打磨過的區域時,過壓量逐漸變大,例如從0.05mm到0.1mm,以使得砂紙打磨損耗更加均勻,增加砂紙的使用壽命,更好的控制砂紙打磨的精度。可以理解,也可藉由打磨頭10的打磨面直接打磨工件12。
Specifically, please refer to Figure 2 again. The fourth adjustment amount is to apply a change value along the Z-axis direction of the tool coordinate system. It can be understood that in the actual grinding process, there are two grinding methods. One is that the grinding
進一步地,其中該指引資訊還包含第二運行軌跡,該第二運行軌跡為該工件12的運行軌跡,該形成該偏差序列的步驟,進一步包含:確定該裝置組合還包含承載模組80,該承載模組80用於承載該工件12且可轉動或可移動該工件12;基於該裝置組合還包含承載模組80,形成該第二運行軌跡;根據該壓力序列、該第一運行軌跡及該第二運行軌跡,形成該偏差序列。
Further, the guidance information also includes a second operating trajectory, and the second operating trajectory is the operating trajectory of the
具體地,請再次參見圖2,承載模組80為一可旋轉的治具,該治具可承載工件12並帶動工件12轉動,當然,承載模組80還可為其他機構,只要可轉動或可移動工件12即可。
Specifically, please refer to FIG. 2 again. The load-bearing
進一步地,其中該指引資訊還包含倒角資訊,該形成該第二運行軌跡的步驟,包含:基於該裝置組合還包含承載模組80,確定該倒角資訊;根據該倒角資訊,計算該第一運行軌跡與該倒角資訊對應的倒角軌跡;根據該倒角軌跡,形成該第二運行軌跡。
Further, the guidance information also includes chamfering information, and the step of forming the second running trajectory includes: determining the chamfering information based on the device combination also including the carrying
打磨頭10打磨工件12的轉角時,打磨頭10沿第一運行軌跡運行時,承載模組80帶動工件12沿第二運行軌跡運行,為了使打磨頭10基於tool坐標系的Z向保持不變,調整打磨頭10的第一運動軌跡,運行過程中調整量的集合即為偏差序列,藉由偏差序列使以使打磨頭10基於tool坐標系的Z向保持不變,以使打磨的工件12的打磨品質可控。
When the grinding
進一步地,其中該形成該偏差序列的步驟,進一步包含:根據該第二運行軌跡及該倒角軌跡,調整該第一運行軌跡為第三運行軌跡;根據該壓力序列、該第三運行軌跡及該第二運行軌跡,形成該偏差序列。 Further, the step of forming the deviation sequence further includes: adjusting the first operating trajectory to a third operating trajectory according to the second operating trajectory and the chamfering trajectory; according to the pressure sequence, the third operating trajectory and The second operating trajectory forms the deviation sequence.
示例性的,打磨頭10打磨工件12的轉角時,打磨頭10與承載工件12的承載模組80均移動,且承載模組80承載工件12移動,藉由打磨頭10與承載
模組80配合,以使打磨頭10保持基於tool坐標系的Z向保持不變,以使工件12的打磨品質可控。
For example, when the grinding
具體地,打磨頭10打磨工件12的轉角時,打磨頭10沿第一運行軌跡運行時,承載模組80帶動工件12沿第二運行軌跡運行,為了使打磨頭10基於tool坐標系的Z向保持不變,再次調整該第一運動軌跡,運行過程中調整量的集合即為偏差序列,藉由偏差序列調整該第一運行軌跡(如圖3中的A軌跡)為第三運行軌跡(如圖3中的B軌跡),以使打磨頭10基於tool坐標系的Z向保持不變,以使打磨的工件12的打磨品質可控。
Specifically, when the grinding
示例性的,請參見圖3,圖3為一個實施例或多個實施例中運行軌跡示意圖,其中軌跡A為第一軌跡,軌跡B為第三軌跡,軌跡A與軌跡B均為打磨頭10的運行軌跡且運動方向相同,第二運行軌跡為承載模組80帶動工件12移動的軌跡,第二運行軌跡與軌跡A、軌跡B的運動方向相反,依據承載模組80帶動工件12移動的軌跡與工件12的倒角軌跡,調整打磨頭10的運行軌跡,以使打磨頭10打磨工件12的倒角時,打磨頭10沿tool坐標系的Z軸方向相對承載模組80不變,以保證打磨頭10打磨的工件12的倒角的品質。
For example, please refer to Figure 3. Figure 3 is a schematic diagram of the operating trajectory in one embodiment or multiple embodiments, in which trajectory A is the first trajectory, trajectory B is the third trajectory, and both trajectory A and trajectory B are the grinding
具體地,其中倒角(如手機等3C產品的R角)為框架型的工件12的四角任一個,倒角資訊為R角的弧長。將R角分成5個弧長的組合,計算以獲取機器組件沿該5個等弧移動時沿tool坐標系的Z軸旋轉的角度,可為等分的或不等分的弧長組合,例如0-10-30-55-80-90度,然後把這些角度的負值,例如0、-10、-30、-55、-80、-90當作承載模組80的軌跡插值點,來控制承載模組80沿work坐標系的Z軸的轉動,如此,承載模組80配合打磨頭10,承載模組80與打磨頭10分別沿不同的軌跡運動,以使打磨時打磨頭10在tool坐標系的Z軸保持不動,只在tool坐標系的XY軸平面平移,從而有效防止打磨頭10打磨工件12時死角的出現,防止機器元件的卡死,也能讓控制過程簡化。
Specifically, the chamfering (such as the R-angle of 3C products such as mobile phones) is any one of the four corners of the frame-shaped
請參見圖7,為本申請一個或多個實施方式提供的輔助打磨的裝置,用於承載及感測被打磨的工件12。該輔助打磨的裝置示例性為上述承載模組80。
具體地,輔助打磨的裝置800包含承載部810、感測模組30及底座830,其中承載部810用於承載工件12,並承受來自工件12的力及力矩的至少一個;感測模組30連接承載部810,感測模組30與一打磨裝置耦接,感測模組30用於感測力及力矩,形成壓力值並輸出該壓力值至打磨裝置。底座830連接感測模組30,底座830用於固定感測模組30。
Please refer to FIG. 7 , which is an auxiliary grinding device provided by one or more embodiments of the present application, and is used for carrying and sensing the
如此,藉由承載部810承載工件12,感測模組30感測承載部810所受的力及力矩的至少一個,其中該力為打磨裝置打磨工件12時工件12與打磨裝置之間的作用力,該作用力經由工件12傳遞至承載部810,並由感測模組30感測,感測模組30將該壓力值發送至打磨裝置,以便打磨裝置依據工件12所受力及力矩調整打磨力度及角度,以實現輔助打磨裝置打磨工件12。
In this way, by carrying the
可以理解,感測模組30可藉由有線或無線方式將壓力值傳遞至打磨裝置,例如藍牙傳輸,無線通訊傳送或在藉由線纜傳輸等。但這樣的傳輸需要解決感測模組、連接部金屬外表對信號的遮罩,採用更高穿透能力的無線傳輸方式能夠避免信號傳輸的缺陷,此處不再贅述。
It can be understood that the
進一步地,其中感測模組30包含力感應器與扭力計的至少一個,只要可感測力及力矩即可。力感應器與扭力計可分別感測來自承載部的力與力矩,根據力資訊形成了的力曲線能夠判斷打磨時是否按預設軌跡進行打磨,根據力矩資訊形成的扭矩情況能夠判斷打磨時在某個方向上是否發生了不適當的偏轉,在打磨精度要求較低的場景僅需要力感應器即可,但在打磨精度要求較高的場景時,就需要對力及力矩進行精確感測,因此需要力感應器與扭力計的組合完成感測過程,以回饋至機械臂以即時回饋或事後調整的方式控制當前或下一次的打磨精度,形成良性反覆運算的正迴圈。
Further, the
替換的,其中感測模組30包含6軸力感應器。6軸力感應器能夠感測所受到的力在work坐標系下的X軸、Y軸及Z軸的分量,以及感測所受到的力矩分別繞work坐標系下的X軸、Y軸及Z軸的偏轉角,相較於力感應器與扭力計的組合的方式,安裝更為簡單,精度也更高,本申請以6軸力感應器說明技術方案,但不限於此。
Alternatively, the
進一步地,感測模組30為防護等級為IP65等級以上的力感應器。選用這一等級的力感應器,能夠有效防止切削液或磨屑侵入感測模組,造成感測不準或損壞感測模組的問題。
Further, the
進一步地,承載部810的受力範圍為0至100N間。經過測算,校準過程中承載部810的受力為1kg對應的力,即約為9.8N,但在實際打磨過程中,最高峰值能夠達到10kg對應的力,即約為98N,再增加一些安全餘量,則承載部810的受力範圍能夠確定,約為0至100N之間,但也可以根據實際情況進行調整。該受力範圍用於限定打磨頭10與承載部810之間的作用力,避免作用力過大損傷打磨頭10或承載部810,或者在打磨過程中損傷工件12。
Further, the force range of the bearing part 810 is between 0 and 100N. After calculation, the force on the bearing part 810 during the calibration process is the force corresponding to 1kg, which is about 9.8N. However, during the actual polishing process, the highest peak value can reach the force corresponding to 10kg, which is about 98N, and some safety margin is added. The force range of the bearing part 810 can be determined, which is approximately between 0 and 100N, but it can also be adjusted according to the actual situation. This force range is used to limit the force between the grinding
請參見圖8,為本申請一個或多個實施方式提供的輔助打磨的裝置800的剖視圖,輔助打磨的裝置800進一步包含安裝部840與線纜850,安裝部840設於感測模組30及底座830之間,安裝部840為中空結構,中空部分被設置為第一通道841;底座830包含第一中空部831,第一中空部831與第一通道841連通。線纜850連接感測模組30,用於藉由第一中空部831及第一通道841,傳輸來自感測模組30的壓力值。
Please refer to FIG. 8 , which is a cross-sectional view of an auxiliary polishing device 800 provided by one or more embodiments of the present application. The auxiliary polishing device 800 further includes a mounting part 840 and a cable 850 . The mounting part 840 is provided on the
如此,藉由第一中空部831及第一通道841收容線纜850,並藉由線纜850將感測模組30感測的壓力值傳遞至打磨裝置,以增強輔助打磨的裝置800的整體結構的緊湊性,同時線纜850密封性設置,以提升線纜850的使用壽命,並減少線纜850傳遞壓力值受到的外接影響。
In this way, the first hollow portion 831 and the first channel 841 accommodate the cable 850, and the pressure value sensed by the
進一步地,輔助打磨的裝置800進一步包含連接部820與抽氣模組860,連接部820設於承載部810及感測模組30之間,連接部820為中空結構,連接部820的中空部分被設置為第二通道821。
Furthermore, the auxiliary grinding device 800 further includes a connecting part 820 and an air extraction module 860. The connecting part 820 is provided between the bearing part 810 and the
承載部810包含第一孔811,感測模組30包含第二中空部31;抽氣模組860包含氣管861,氣管861耦接第一孔811,用於貫穿第一中空部831、第一通道841、第二中空部31及第二通道821的至少一個,以藉由第一孔811,形成置於承載部810上的工件12與承載部810的結合力。如此,
抽氣模組860藉由氣管861抽取工件12與承載部810之間的空氣,以提升承載部810與承載部810上工件12之間的結合力,即承載部810藉由真空吸附方式輔助或直接固定承載部810上的工件12。
The bearing part 810 includes a first hole 811, and the
進一步地,其中底座830包含密封蓋831、內腔832及移動部833。密封蓋831連接安裝部840,密封蓋831包含第二孔8311(圖未示)。內腔832包含第一中空部831。第二孔8311設於第一中空部831與第一通道841之間。移動部833連接內腔832。內腔832進一步包含密封部8322,密封部8322設於移動部833與第一中空部831之間。如此,密封蓋831及移動部833配合,以防止外部揚塵或滲漏的拋光液從移動部833自下而上進入第一中空部831。 Further, the base 830 includes a sealing cover 831, an inner cavity 832 and a moving part 833. The sealing cover 831 is connected to the mounting part 840, and the sealing cover 831 includes a second hole 8311 (not shown). The inner cavity 832 includes a first hollow portion 831 . The second hole 8311 is provided between the first hollow portion 831 and the first channel 841 . The moving part 833 is connected to the inner cavity 832. The inner cavity 832 further includes a sealing portion 8322 provided between the moving portion 833 and the first hollow portion 831 . In this way, the sealing cover 831 and the moving part 833 cooperate to prevent external dust or leaking polishing fluid from entering the first hollow part 831 from the bottom up of the moving part 833 .
進一步地,輔助打磨的裝置800進一步包含電機870、同步帶880及減速機890,同步帶880連接電機870。移動部833包含帶輪8311(圖未示),帶輪8311與同步帶880連接。減速機890連接帶輪8311,減速機890用於傳導來自電機870的力矩,以控制底座830旋轉。如此,藉由電機870驅動同步帶880運動,同步帶880帶動帶輪8311轉動,帶輪8311帶動減速機890旋轉,進而實現控制底座830旋轉。 Further, the auxiliary grinding device 800 further includes a motor 870, a synchronous belt 880 and a reducer 890. The synchronous belt 880 is connected to the motor 870. The moving part 833 includes a pulley 8311 (not shown), and the pulley 8311 is connected to the synchronous belt 880 . The reducer 890 is connected to the pulley 8311, and the reducer 890 is used to transmit the torque from the motor 870 to control the rotation of the base 830. In this way, the motor 870 drives the synchronous belt 880 to move, the synchronous belt 880 drives the pulley 8311 to rotate, and the pulley 8311 drives the reducer 890 to rotate, thereby realizing the rotation of the control base 830.
進一步地,輔助打磨的裝置800進一步包含防護裝置90,防護裝置90設於連接部820並包圍感測模組30。如此,藉由防護裝置90防止切削液或磨屑侵入感測模組30。
Furthermore, the auxiliary grinding device 800 further includes a protective device 90 , which is disposed on the connecting portion 820 and surrounds the
請參見圖9,為本申請一個或多個實施例提供的輔助打磨的系統900,輔助打磨的系統900用於輔助打磨裝置打磨工件12,輔助打磨的系統900包含通訊器910與第二處理器920。其中當輔助打磨的系統900用於配合打磨系統700使用時,所述第二處理器920也可以與第一處理器720為同一個處理器,共同實現第一處理器720與第二處理器920的功能。
Please refer to FIG. 9 . An
其中,通訊器910用於獲取第一軌跡及第二軌跡。第二處理器920耦接通訊器,第二處理器920用於:控制承載模組80沿該第一軌跡執行暫停、移動及轉動的至少一個,該承載模組80用於承載該工件12;獲取觸發信號,確定
該觸發信號達到觸發條件;基於該觸發信號達到觸發條件,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
Among them, the
請再次參見圖7,承載模組80承載工件12,第二處理器920控制承載模組80沿該第一軌跡執行暫停、移動及轉動的至少一個,即第二處理器920用於控制承載模組80運動,第二處理器920接收觸發信號,觸發信號是指打磨頭10將要從打磨工件12的直邊轉換到打磨倒角(或從打磨倒角轉換到打磨直邊)觸發的信號,打磨頭10將要從打磨工件12的直邊轉換到打磨倒角(或從打磨倒角轉換到打磨直邊)打磨頭10的時間、速度或位置均發生變化,例如打磨頭10在沿第一軌跡打磨直邊時,速度是20mm/s,當機器組件快要從打磨直邊轉換到打磨倒角時,例如距離實際開始打磨倒角還有20mm的位置時觸發觸發信號,由於打磨倒角的速度與打磨直邊的速度不同,例如打磨倒角的速度是15mm/s,則距離實際開始打磨倒角還有20mm的位置時,藉由自動調整速度,即從20mm/s逐漸下降到15mm/s,並切換打磨軌跡從沿第一軌跡打磨直邊到沿第二軌跡打磨倒角,達到平滑過渡打磨的目的,降低調整速度的時間,使打磨效果更好。在一種實施方式中,該觸發信號為沿該第一軌跡已打磨該工件12的時間,輔助打磨的系統900進一步包含計時器930。
Please refer to FIG. 7 again. The carrying
計時器930耦接第二處理器920,計時器930用於獲取該時間。
The
第二處理器920進一步用於:確定該時間等於預設時間;基於該時間等於預設時間,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
The
例如,該時間打磨頭10打磨工件12的直邊且將要從打磨直邊轉換到打磨倒角的時間,當該時間與預設時間相等,例如15秒為預設時間,承載模組80變更打磨軌跡,由於打磨倒角的速度與打磨直邊的速度不同,例如打磨倒角的速度是15mm/s,打磨直邊的速度為20mm/s,則距離實際開始打磨倒角還有15s時,或者已經打磨直邊的時間為15s時,但不限於此,藉由自動調整速度,即從20mm/s逐漸下降到15mm/s,並切換打磨軌跡從打磨直邊到打磨倒角,達到平滑過渡打磨過程,降低調整速度的時間,使打磨效果更好的目的。
For example, at this time, the grinding
另一實施方式中,其中該觸發信號為沿該第一軌跡打磨該工件12的速度,該系統進一步包含探測器940。
In another embodiment, where the trigger signal is the speed of polishing the
探測器940耦接第二處理器920,用於探測該速度。
The
該第二處理器920進一步用於:確定該速度小於或等於預設速度;基於該速度小於或等於預設速度,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
The
其中,打磨頭10打磨工件12的直邊與打磨倒角時,打磨頭10的速度、位置均發生變化,例如打磨頭10在沿第一軌跡打磨直邊時,沿打磨軌跡運動(示例性為tool坐標系下的Y方向)速度逐漸從0提速到20mm/s,當機器組件快要從打磨直邊轉換到打磨倒角時,藉由自動調整速度,即從20mm/s逐漸下降到15mm/s,觸發信號為打磨頭10的移動速度當打磨頭10的速度小於或等於預設速度,切換打磨軌跡從沿第一軌跡打磨直邊到沿第二軌跡打磨倒角,達到平滑過渡打磨過程,降低調整速度的時間,使打磨效果更好。
When the grinding
請參見圖10,本申請同時提供一種輔助打磨的方法,用於控制輔助打磨系統700以配合打磨裝置打磨工件12,輔助打磨的方法包含以下步驟。
Referring to Figure 10, the present application also provides an auxiliary grinding method for controlling the
步驟1030、獲取第一軌跡及第二軌跡。 Step 1030: Obtain the first trajectory and the second trajectory.
步驟1032、控制承載模組80沿該第一軌跡執行暫停、移動及轉動的至少一個。
Step 1032: Control the carrying
該承載模組80用於承載該工件12;步驟1034、獲取觸發信號,確定該觸發信號達到觸發條件;步驟1036、基於該觸發信號達到觸發條件,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
The carrying
如此,藉由設定機器元件在打磨直邊與打磨倒角轉換時的觸發條件,藉由觸發條件切換打磨速度與打磨軌跡,從第一軌跡變更至第二軌跡,達到平滑過渡打磨過程,降低調整速度的時間,使打磨效果更好。 In this way, by setting the trigger conditions for the machine components to switch between grinding straight edges and grinding chamfers, and switching the grinding speed and grinding trajectory through the trigger conditions, changing from the first trajectory to the second trajectory, a smooth transition of the grinding process can be achieved, and adjustments can be reduced. The speed of time makes the sanding effect better.
進一步地,其中該觸發信號為沿該第一軌跡已打磨該工件12的時間,該獲取觸發信號,確定該觸發信號達到觸發條件的步驟,包含:獲取該時間;
確定該時間等於預設時間;基於該時間等於預設時間,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
Further, where the trigger signal is the time during which the
例如,該時間打磨頭10打磨工件12的直邊且將要從打磨直邊轉換到打磨倒角的時間,當該時間與預設時間相等,例如15秒為預設時間,承載模組80變更打磨軌跡,由於打磨倒角的速度與打磨直邊的速度不同,例如打磨倒角的速度是15mm/s,打磨直邊的速度為20mm/s,則距離實際開始打磨倒角還有15s時,或者已經打磨直邊的時間為15s時,但不限於此,藉由自動調整速度,即從20mm/s逐漸下降到15mm/s,並切換打磨軌跡從打磨直邊到打磨倒角,達到平滑過渡打磨過程,降低調整速度的時間,使打磨效果更好的目的。
For example, at this time, the grinding
進一步地,其中該觸發信號為沿該第一軌跡打磨該工件12的速度,該獲取觸發信號,確定該觸發信號達到觸發條件的步驟,包含:探測該速度;確定該速度小於或等於預設速度;基於該速度小於或等於預設速度,控制該承載模組80變更至沿該第二軌跡執行暫停、移動及轉動的至少一個。
Further, where the trigger signal is the speed of polishing the
示意性的,打磨頭10打磨工件12的直邊與打磨倒角時,打磨頭10的速度、位置均發生變化,例如打磨頭10在沿第一軌跡打磨直邊時,沿打磨軌跡運動(示例性為tool坐標系下的Y方向)速度逐漸從0提速到20mm/s,當機器組件快要從打磨直邊轉換到打磨倒角時,藉由自動調整速度,即從20mm/s逐漸下降到15mm/s,觸發信號為打磨頭10的移動速度當打磨頭10的速度小於或等於預設速度,切換打磨軌跡從沿第一軌跡打磨直邊到沿第二軌跡打磨倒角,達到平滑過渡打磨過程,降低調整速度的時間,使打磨效果更好。
Schematically, when the grinding
另外,本領域技術人員還可在本申請精神內做其它變化,當然,這些依據本申請精神所做的變化,都應包含在本申請所要求保護的範圍。出於解釋的目的,前面的描述為參考具體實施方案來描述的。然而,上面的示例性討論並非旨在是窮盡的或將本申請限制為所公開的精確形式。根據以上教導內容,很多修改形式與變型形式均為可能的,例如流程圖的順序結構可缺省或調整。選擇與描述實施例是為了闡明本申請的原理及其實際應用,以便由此使得本領 域的其他技術人員能夠最佳地使用具有適合於所構想的特定用途的各種修改的本申請以及各種所描述的實施例。 In addition, those skilled in the art can also make other changes within the spirit of this application. Of course, these changes made based on the spirit of this application should be included in the scope of protection claimed by this application. For purposes of explanation, the foregoing description has been described with reference to specific embodiments. However, the above illustrative discussion is not intended to be exhaustive or to limit the application to the precise forms disclosed. Based on the above teachings, many modifications and variations are possible, for example, the sequence structure of the flow chart can be defaulted or adjusted. The embodiment was chosen and described in order to explain the principles of the application and its practical application and thereby enable the technical Others skilled in the art will be able to best utilize this application and the various described embodiments with various modifications as are suited to the particular use contemplated.
綜上所述,本發明符合發明專利要件,爰依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,舉凡熟悉本案技藝之人士,在爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之如申請專利範圍內。 To sum up, this invention meets the requirements for an invention patent and a patent application should be filed in accordance with the law. However, the above are only preferred embodiments of the present invention. For those familiar with the art of this case, equivalent modifications or changes made in accordance with the spirit of the present invention should be covered by the following patent applications.
700:打磨系統 700:Grinding system
720:第一處理器 720: First processor
30:感測模組 30: Sensing module
Claims (20)
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| CN202011027679.5A CN112247740B (en) | 2020-09-25 | 2020-09-25 | Polishing device, polishing method, polishing auxiliary device, polishing auxiliary system and polishing auxiliary method |
| CN202011027679.5 | 2020-09-25 |
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| TW202206221A TW202206221A (en) | 2022-02-16 |
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| CN117102973B (en) * | 2023-08-31 | 2026-01-09 | 富联裕展科技(深圳)有限公司 | Grinding control methods, devices and grinding systems |
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| JP4175648B2 (en) * | 2004-07-20 | 2008-11-05 | 国立大学法人広島大学 | Processing equipment |
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| CN107876904B (en) * | 2017-12-18 | 2023-10-27 | 唐山师范学院 | Robotic arm for chamfering and grinding gear end faces and grinding method thereof |
| CN109483556B (en) * | 2018-10-30 | 2021-04-16 | 武汉大学 | Robot polishing system and method based on teaching learning |
| US11633832B2 (en) * | 2018-11-30 | 2023-04-25 | The Boeing Company | Systems and methods for sanding a surface of a structure |
| CN214110044U (en) * | 2020-09-25 | 2021-09-03 | 深圳市裕展精密科技有限公司 | Auxiliary polishing device |
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2020
- 2020-09-25 CN CN202011027679.5A patent/CN112247740B/en active Active
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| TW200833467A (en) * | 2006-11-22 | 2008-08-16 | Applied Materials Inc | Friction sensor for polishing system |
| TW201101385A (en) * | 2009-04-30 | 2011-01-01 | Applied Materials Inc | Temperature control of chemical mechanical polishing |
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| CN112247740A (en) | 2021-01-22 |
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| TW202206221A (en) | 2022-02-16 |
| CN112247740B (en) | 2025-12-09 |
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