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TWI808307B - Electronic substrate and photocurable composition - Google Patents

Electronic substrate and photocurable composition Download PDF

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TWI808307B
TWI808307B TW109104961A TW109104961A TWI808307B TW I808307 B TWI808307 B TW I808307B TW 109104961 A TW109104961 A TW 109104961A TW 109104961 A TW109104961 A TW 109104961A TW I808307 B TWI808307 B TW I808307B
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substrate
flexible substrate
photocurable composition
meth
peeling force
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TW202106133A (en
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愛澤眸
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日商積水保力馬科技股份有限公司
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52Amides or imides
    • C08F220/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/56Acrylamide; Methacrylamide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits

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Abstract

[課題] 提供具有柔軟性優良的可撓性部位之電子基板。 [解決手段]在具備剛性基板12、及從剛性基板12的末端延伸、可導通連接的可撓性基板14之電子基板,從可撓性基板14的末端、在可撓性基板14的彎曲部位的至少一表面,設置彈性保護元件,可撓性基板14從上述剛性基板的末端突出、向剛性基板12的一表面側彎曲之時,從剛性基板12末端突出的可撓性基板14的彎曲部位的突出寬度為100~400μm之電子基板。[Problem] Provide an electronic substrate having a flexible portion with excellent flexibility. [Solution] In an electronic substrate having a rigid substrate 12 and a flexible substrate 14 extending from the end of the rigid substrate 12 and capable of conductive connection, an elastic protection element is provided on at least one surface of the curved portion of the flexible substrate 14 from the end of the flexible substrate 14. 0~400μm electronic substrate.

Description

電子基板及光硬化性組合物Electronic substrate and photocurable composition

本發明關於具有柔軟性優良的可撓性部位的電子基板,以及柔軟性及附著性優良的光硬化性組合物。The present invention relates to an electronic substrate having a flexible portion excellent in flexibility, and a photocurable composition excellent in flexibility and adhesion.

具有柔軟性的可撓性部位的電子基板,通常使用可撓性基板(包含可撓性印刷電路板(Flexible Printed Circuits,以下也稱為「可撓性基板」))作為其可撓性部位。已知可撓性基板作為,通常在聚醯亞胺樹脂或聚酯樹脂等的薄膜形成銅箔等的金屬導體電路,在這些以聚亞胺樹脂或聚酯樹脂等的覆蓋膜作為保護層所設置的可彎曲基板。例如在日本特開平7-106728號公報(專利文獻1),在具有剛性部位及可撓性部位的基板中,作為剛性部位及可撓性部位的連接部分的保護元件使用樹脂組合物。Electronic substrates having flexible parts generally use flexible substrates (including flexible printed circuits (Flexible Printed Circuits, hereinafter also referred to as “flexible substrates”)) as their flexible parts. A flexible substrate is known as a flexible substrate in which a metal conductor circuit such as copper foil is usually formed on a thin film of polyimide resin or polyester resin, and a cover film such as polyimide resin or polyester resin is used as a protective layer. For example, in Japanese Unexamined Patent Publication No. 7-106728 (Patent Document 1), a resin composition is used as a protective element for a connecting portion of a rigid portion and a flexible portion in a substrate having a rigid portion and a flexible portion.

又,具有剛性基板及設置在前述剛性基板末端的可撓性基板之電子基板,也使用在例如液晶顯示裝置或電漿顯示裝置、有機EL顯示裝置、RGB無機LED安裝型的顯示裝置等的影像顯示裝置。此影像顯示裝置,使用為影像顯示部位的面板作為剛性基板,為了施加電壓或訊號於面板,在面板的末端設置電性連接的可撓性基板。在此,面板和可撓性基板的連接通常使用異方性導電膜,此連接部位塗佈絕緣保護或連接補強用的保護元件。於是,上述可撓性基板的另一末端部位,和電路基板(主機板等)電性連接。通常,電路基板配置在面板內面,所以從面板延伸的可撓性基板被彎曲而和電路基板連接。又近年來,影像顯示裝置的小型化及窄邊框化的需求逐漸增加,為了非影像顯示部位的節省空間化,驅動IC不設在習知的面板上,而採用安裝在可撓性基板上的覆晶薄膜(chip on film)結構等。In addition, electronic substrates having a rigid substrate and a flexible substrate disposed at the end of the rigid substrate are also used in image display devices such as liquid crystal display devices or plasma display devices, organic EL display devices, RGB inorganic LED mounted display devices, and the like. In this image display device, a panel as an image display part is used as a rigid substrate, and an electrically connected flexible substrate is provided at the end of the panel to apply voltage or signal to the panel. Here, an anisotropic conductive film is usually used for the connection between the panel and the flexible substrate, and a protective element for insulation protection or connection reinforcement is applied to the connection portion. Then, the other end portion of the flexible substrate is electrically connected to the circuit substrate (main board, etc.). Usually, since the circuit board is arranged on the inner surface of the panel, the flexible board extending from the panel is bent and connected to the circuit board. In recent years, the demand for miniaturization and narrower borders of image display devices has gradually increased. In order to save space in non-image display parts, the driver IC is not installed on the conventional panel, but a chip on film (chip on film) structure mounted on a flexible substrate.

在此,為了控制可撓性基板的彎曲性,日本特開2008-26528號(專利文獻2)揭示,在具有有電極引出部位的面板、及連接上述電極引出部位的可撓性基板、及覆蓋上述可撓性基板和上述電極引出部位的連接部分的保護層之影像顯示裝置中,使對於上述可撓性基板上的樹脂材料的潤濕性改變。經由上述的組成,在將樹脂材料塗佈於上述可撓性基板時,產生樹脂材料穩定而形成保護層的區域、和以樹脂材料為首之保護層穩定不形成的區域,結果,以形成保護層的上述可撓性基板中的保護層的前端為起點,彎曲可撓性基板,因而可控制形成保護層的區域在設定的寬度。因此,從面板的末端在外側突出的可撓性基板的彎曲部位的突出寬度可控制為小者。 〔先前技術文獻〕 〔專利文獻〕Here, in order to control the bendability of the flexible substrate, Japanese Patent Application Laid-Open No. 2008-26528 (Patent Document 2) discloses that, in an image display device having a panel having an electrode lead-out portion, a flexible substrate connected to the electrode lead-out portion, and a protective layer covering the connection between the flexible substrate and the electrode lead-out portion, the wettability of the resin material on the flexible substrate is changed. With the above-mentioned composition, when the resin material is applied to the above-mentioned flexible substrate, there are regions where the resin material is stable and the protective layer is formed, and regions where the protective layer is not formed stably including the resin material. As a result, the flexible substrate is bent starting from the front end of the protective layer in the above-mentioned flexible substrate where the protective layer is formed, so that the region where the protective layer is formed can be controlled to a predetermined width. Therefore, the protrusion width of the bent portion of the flexible substrate protruding outward from the end of the panel can be controlled to be small. [Prior Technical Literature] 〔Patent Document〕

〔專利文獻1〕日本特開平7-106728號公報 〔專利文獻2〕日本特開2008-26528號[Patent Document 1] Japanese Patent Application Laid-Open No. 7-106728 [Patent Document 2] Japanese Patent Laid-Open No. 2008-26528

〔發明所欲解決之課題〕[Problem to be solved by the invention]

因此,對於影像顯示裝置,希望達到更進一步的小型化及窄邊框化。具體地說,對於在構成影像顯示裝置等的剛性基板的末端部位彎曲的可撓性基板,強烈要求上述的彎曲部位的突出寬度更進一步地減少。對於這樣的要求,上述技術雖然以控制保護層的外形使外形最小化,但在達到窄邊框化上則變得損害保護層本身。又假設勉強使曲率半徑變小,則保護層會破損或剝離,難以使上述彎曲部位的突出寬度變小。Therefore, for image display devices, it is desired to achieve further miniaturization and narrower borders. Specifically, for a flexible substrate that is bent at an end portion of a rigid substrate constituting an image display device or the like, it is strongly required to further reduce the protrusion width of the above-mentioned bent portion. In response to such a requirement, although the above-mentioned technology minimizes the outer shape by controlling the outer shape of the protective layer, it becomes detrimental to the protective layer itself when narrowing the frame. Also, if the radius of curvature is forcibly reduced, the protective layer will be damaged or peeled off, making it difficult to reduce the protruding width of the above-mentioned bent portion.

本發明係為了解決上述課題所完成。亦即,以提供具有柔軟性及耐久性優良的可撓性部位的電子基板、以及用於可撓性部位的柔軟性及附著性優良的光硬化性組合物為目的。 〔為解決課題之手段〕The present invention was made in order to solve the above-mentioned problems. That is, the object is to provide an electronic substrate having a flexible portion excellent in flexibility and durability, and a photocurable composition used for the flexible portion excellent in flexibility and adhesion. 〔A means to solve a problem〕

達成上述目的之本發明之一態樣的電子基板、以及光硬化性組合物,如下所述。An electronic substrate and a photocurable composition according to an aspect of the present invention that achieve the above object are as follows.

本發明之一態樣之電子基板為,具有剛性基板、及從上述剛性基板的末端延伸、可導通連接的可撓性基板之電子基板,其特徵在於,從上述可撓性基板末端、在上述可撓性基板的彎曲部位的至少一表面,設置彈性保護元件,在上述可撓性基板從上述剛性基板的末端突出、向上述剛性基板的一表面側彎曲之時,從上述剛性基板末端突出的上述可撓性基板的彎曲部位的突出寬度為,100~400μm。由於從上述剛性基板末端突出的上述可撓性基板的彎曲部位的突出寬度在100~400μm的範圍,所以從上述剛性基板的末端、即使以較小的曲率半徑彎曲可撓性基板,由於具有所設定的彈性保護元件,因此難以在上述彎曲部位發生問題。結果,和習知的相比,可撓性基板的彎曲部位從上述剛性基板末端的突出量變小且可成為耐久性優良者。An electronic substrate according to an aspect of the present invention is an electronic substrate having a rigid substrate and a flexible substrate extending from the end of the rigid substrate and capable of conductive connection, wherein an elastic protection member is provided on at least one surface of the curved portion of the flexible substrate from the end of the flexible substrate. 400 μm. Since the protruding width of the bent portion of the flexible substrate protruding from the end of the rigid substrate is in the range of 100 to 400 μm, even if the flexible substrate is bent with a small radius of curvature from the end of the rigid substrate, since there is a set elastic protection element, it is difficult to cause a problem at the bent portion. As a result, compared with conventional ones, the protruding amount of the bent portion of the flexible substrate from the end of the rigid substrate is reduced and excellent in durability.

上述彈性保護元件以奈米壓痕(nanoindentation )試驗測量的馬氏硬度(Martens hardness)為0.1~0.5N/mm2 。由於上述彈性保護元件的馬氏硬度在0.1~0.5N/mm2 的範圍,從剛性基板的末端延伸到可撓性基板的上述彈性保護元件具有優良的可撓性,和習知者相比,可撓性基板彎曲時的曲率半徑變小。因此,和習知者相比,從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度(亦即,可撓性基板從剛性基板末端的突出量) 變小且可成為耐久性優良者。The Martens hardness (Martens hardness) of the elastic protection element measured by a nanoindentation (nanoindentation) test is 0.1-0.5 N/mm 2 . Since the Martens hardness of the above-mentioned elastic protection element is in the range of 0.1-0.5N/ mm2 , the above-mentioned elastic protection element extending from the end of the rigid substrate to the flexible substrate has excellent flexibility. Compared with conventional ones, the radius of curvature of the flexible substrate becomes smaller when it is bent. Therefore, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate (that is, the amount of protrusion of the flexible substrate from the end of the rigid substrate) is smaller than conventional ones, and excellent in durability.

上述彈性保護元件的楊氏模數(Young's modulus)以0.1~3.0MPa為佳。由於使用具有上述範圍的楊氏模數的彈性保護元件,具有適度的硬度,因此,和習知者相比,可縮小可撓性基板的曲率半徑。結果,和習知者相比,從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小且可成為耐久性優良者。The Young's modulus of the elastic protection element is preferably 0.1-3.0 MPa. Since the elastic protective element having the Young's modulus in the above-mentioned range has moderate hardness, the radius of curvature of the flexible substrate can be reduced compared with conventional ones. As a result, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate can be reduced compared to conventional ones, and can be excellent in durability.

上述彈性保護元件的剝離力F顯示下列(1)式的關係。 F>100×ln(E)+250・・・(1) 式中,F:剝離力(N/m),E:楊氏模數(MPa) 上述彈性保護元件的剝離力F因為具有上列(1)式關係,從剛性基板的末端彎曲可撓性基板之時,和習知者相比,保護元件不會從剛性基板及可撓性基板剝落,可縮小可撓性基板的曲率半徑。結果,和習知者相比,從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小,且可成為耐久性優良者。The peeling force F of the above-mentioned elastic protective member shows the relationship of the following formula (1). F>100×ln(E)+250・・・(1) In the formula, F: peeling force (N/m), E: Young's modulus (MPa) Since the peeling force F of the above-mentioned elastic protection element has the relationship of the above formula (1), when the flexible substrate is bent from the end of the rigid substrate, the protection element will not peel off from the rigid substrate and the flexible substrate compared with conventional ones, and the radius of curvature of the flexible substrate can be reduced. As a result, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate becomes smaller than that of conventional ones, and can be excellent in durability.

上述可撓性基板為具有15~200μm厚度的樹脂膜,在彎曲上述可撓性基板之時,在上述可撓性基板的彎曲內面或外面的至少一者,設置配線體。上述樹脂膜例如聚醯亞胺膜、聚酯膜。即使上述可撓性基板為上述厚度的樹脂膜,也可使上述可撓性基板的彎曲部位的突出寬度較習知者小。又由於在可撓性基板的彎曲內面設置彈性保護元件,可抑制在如縮小曲率半徑而彎曲時配線體的損害。The flexible substrate is a resin film having a thickness of 15 to 200 μm, and when the flexible substrate is bent, a wiring body is provided on at least one of the curved inner surface or the outer surface of the flexible substrate. The aforementioned resin film is, for example, a polyimide film or a polyester film. Even if the flexible substrate is a resin film having the above thickness, the protruding width of the bent portion of the flexible substrate can be made smaller than conventional ones. Furthermore, since the elastic protection element is provided on the curved inner surface of the flexible substrate, it is possible to suppress damage to the wiring body when the flexible substrate is bent with a reduced radius of curvature.

本發明之一態樣之光硬化性組合物為,經由塗佈於電子基板後照射光而使硬化,形成彈性保護層之光硬化性組合物,其特徵在於,包含單官能基脂環式(甲基)丙烯酸酯單體、單官能基脂肪族(甲基)丙烯酸酯單體、單官能基高極性單體、熱塑性彈性體、及自由基聚合起始劑,未硬化時的黏度為10~5000mPa・s的範圍,硬化後的硬化體以奈米壓痕試驗測量的馬氏硬度為0.1~0.5N/mm2 的範圍。本發明之一態樣之光硬化性組合物,由於包含上述各成份、具有上述範圍之未硬化時的黏度,容易精密地控制在電子基板的塗佈量,塗佈的作業性優良。又結果,除了降低過剩塗佈於電子基板的疑慮外,由於硬化後的硬化體具有上述範圍的馬式硬度,沒有硬化體妨礙彎曲的疑慮,可以較小的曲率半徑彎曲可撓性基板。A photocurable composition according to an aspect of the present invention is a photocurable composition that is coated on an electronic substrate and cured by irradiation with light to form an elastic protective layer. It is characterized in that it contains a monofunctional alicyclic (meth)acrylate monomer, a monofunctional aliphatic (meth)acrylate monomer, a monofunctional highly polar monomer, a thermoplastic elastomer, and a radical polymerization initiator. The measured Martens hardness is in the range of 0.1 to 0.5 N/mm 2 . The photocurable composition according to one aspect of the present invention contains the above-mentioned components and has an uncured viscosity within the above-mentioned range, so it is easy to precisely control the coating amount on the electronic substrate, and the coating workability is excellent. As a result, in addition to reducing the possibility of excessive coating on the electronic substrate, since the cured body has a Marker hardness in the above-mentioned range, there is no possibility that the hardened body hinders bending, and the flexible substrate can be bent with a small radius of curvature.

上述光硬化性組合物的硬化後的硬化體的剝離力F顯示下列(1)式的關係。 F>100×ln(E)+250・・・(1) 式中,F:剝離力(N/m),E:楊氏模數(MPa) 上述光硬化性組合物的硬化後的硬化體的剝離力F,由於具有上列(1)式的關係,上述光硬化性組合物硬化所得的硬化體,對剛性基板及可撓性基板的附著性及柔軟性優良,即使以小的曲率半徑彎曲可撓性基板也難以剝落,可提高電子基板的耐久性。The peeling force F of the cured body after curing of the above-mentioned photocurable composition shows the relationship of the following formula (1). F>100×ln(E)+250・・・(1) In the formula, F: peeling force (N/m), E: Young's modulus (MPa) The peeling force F of the cured body of the photocurable composition after curing has the relationship of the above formula (1), and the cured body obtained by curing the photocurable composition has excellent adhesion and flexibility to rigid substrates and flexible substrates. Even if the flexible substrate is bent with a small radius of curvature, it is difficult to peel off, and the durability of the electronic substrate can be improved.

上述光硬化性組合物的硬化後的硬化體的剝離力F顯示下列(2)式的關係。 F<100×ln(E)+760 ・・・(2) F:剝離力(N/m) E:楊氏模數(MPa) 上述光硬化性組合物的硬化後的硬化體的剝離力F,由於具有上列(2)式的關係,上述光硬化性組合物硬化所得的硬化體,對剛性基板及可撓性基板沒有超過必要以上的強附著,因此提高電子基板對可撓性基板變形的耐久性,且可從基板撕下,修補性優良。The peeling force F of the hardened body after hardening of the said photocurable composition shows the relationship of following (2) formula. F<100×ln(E)+760・・・(2) F: peel force (N/m) E: Young's modulus (MPa) The peeling force F of the cured body of the photocurable composition after curing has the relationship of the above formula (2), and the cured body obtained by curing the photocurable composition does not have more than necessary strong adhesion to the rigid substrate and the flexible substrate. Therefore, the durability of the electronic substrate against the deformation of the flexible substrate is improved, and it can be torn off from the substrate and has excellent repairability.

本發明之一態樣之電子基板係,在上述剛性基板及上述可撓性基板的跨界區域塗佈上述任一記載之光硬化性組合物而成。由於在硬化之時,在上述跨界區域塗佈表現適度柔軟性的光硬化性組合物,即使和習知者相比,可撓性基板的彎曲部位從剛性基板末端的突出量變小,保護元件也難以從剛性基板及可撓性基板剝落。結果,和習知者相比,從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小,且可成為耐久性優良者。又由於光硬化性組合物使剛性基板及可撓性基板雙方附著而硬化,因此可防止剛性基板及可撓性基板的剝離,同時可防止濕氣或異物從剛性基板及可撓性基板的邊界侵入。 〔發明效果〕An electronic substrate according to an aspect of the present invention is formed by coating the photocurable composition described above on the boundary region between the rigid substrate and the flexible substrate. When hardening, a photocurable composition exhibiting moderate flexibility is applied to the above-mentioned cross-border region. Even compared with conventional ones, the protruding amount of the flexible substrate from the end of the rigid substrate becomes smaller, and the protective element is difficult to peel off from the rigid substrate and the flexible substrate. As a result, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate becomes smaller than that of conventional ones, and can be excellent in durability. In addition, since the photocurable composition hardens both the rigid substrate and the flexible substrate by attaching them, peeling of the rigid substrate and the flexible substrate can be prevented, and moisture or foreign matter can be prevented from entering from the boundary between the rigid substrate and the flexible substrate. [Effect of the invention]

本發明之一態樣之電子基板,即使從上述剛性基板末端突出的上述可撓性基板的彎曲部位的突出寬度變小,保護元件也不會破損或剝落。又,本發明之一態樣之光硬化性組合物,由於未硬化時的黏度低,因此容易塗佈,作業性優良,又硬化後的硬化體可表現所欲的硬度及耐久性和適度的柔軟性。In the electronic substrate according to an aspect of the present invention, even if the protruding width of the bent portion of the flexible substrate protruding from the end of the rigid substrate is reduced, the protective element is not damaged or peeled off. Moreover, the photocurable composition of one aspect of the present invention has low viscosity when uncured, so it is easy to apply and has excellent workability, and the cured product after curing can exhibit desired hardness and durability and moderate flexibility.

〔為實施發明之形態〕[Form for implementing the invention]

〔電子基板〕 基於實施形態,詳細說明本發明之一態樣。使用圖1~圖3,說明本發明之一實施形態之電子基板10。本發明之一實施形態之電子基板10,如圖1所示,具有剛性基板12,和從剛性基板12的末端延伸、可導通連接的可撓性基板14。而且,電子基板10,如圖2所示,從可撓性基板14的末端、在可撓性基板14的彎曲部位16的至少一表面,設置彈性保護元件。接著,如圖3所示,可撓性基板14從剛性基板12末端突出,向剛性基板12的一表面側彎曲之時,從剛性基板12末端突出的可撓性基板14的彎曲部位的突出寬度40為100~400μm。從使用電子基板的裝置小型化的觀點,可撓性基板14從剛性基板12末端突出,向剛性基板12的一表面側彎曲時,從剛性基板12末端突出的可撓性基板14的彎曲部位的突出寬度,較佳為100~350μm,更佳為150~350μm。〔Electronic substrate〕 One aspect of the present invention will be described in detail based on the embodiment. An electronic substrate 10 according to an embodiment of the present invention will be described using FIGS. 1 to 3 . An electronic substrate 10 according to an embodiment of the present invention, as shown in FIG. 1 , has a rigid substrate 12 and a flexible substrate 14 extending from the end of the rigid substrate 12 and capable of conductive connection. Moreover, the electronic substrate 10, as shown in FIG. Next, as shown in FIG. 3, when the flexible substrate 14 protrudes from the end of the rigid substrate 12 and bends toward one surface side of the rigid substrate 12, the protruding width 40 of the bent portion of the flexible substrate 14 protruding from the end of the rigid substrate 12 is 100 to 400 μm. From the viewpoint of miniaturization of devices using electronic substrates, when the flexible substrate 14 protrudes from the end of the rigid substrate 12 and bends toward one surface side of the rigid substrate 12, the protruding width of the bent portion of the flexible substrate 14 protruding from the end of the rigid substrate 12 is preferably 100 to 350 μm, more preferably 150 to 350 μm.

由於從剛性基板12末端突出的可撓性基板14的彎曲部位16的突出寬度40為100~400μm的範圍,和習知者相比,可以維持對剛性基板12和可撓性基板14的連接部位的變形之耐久性,同時可以使基板省空間化。因此,將本發明之一實施形態之電子基板10例如用於影像顯示裝置的情形,可更減少面板的非顯示部位,因此可達到影像顯示裝置的小型化或窄邊框化。Since the protruding width 40 of the bending portion 16 of the flexible substrate 14 protruding from the end of the rigid substrate 12 is in the range of 100 to 400 μm, compared with conventional ones, the durability against deformation of the connecting portion of the rigid substrate 12 and the flexible substrate 14 can be maintained, and the space of the substrate can be saved. Therefore, when the electronic substrate 10 according to one embodiment of the present invention is used in an image display device, for example, the non-display portion of the panel can be further reduced, thereby achieving miniaturization or narrower frame of the image display device.

以下用圖2及圖3,以用於影像顯示裝置的電子基板10為例,進行說明。因此,本發明之一實施形態之電子基板10不限於圖1~圖3所記載之電子基板。如圖2及圖3所示,例如在玻璃基板層積各種功能層的液晶顯示面板或LED安裝面板之剛性基板12的電極,經異方性導電膜15電性連接可撓性基板14。更詳細地說明,在液晶顯示面板的情形時,剛性基板12由偏光板12a、帶有第1透明電極的玻璃基板12b、帶有第2透明電極的玻璃基板12d、夾於上述第1玻璃基板12b和第2玻璃基板12d之間的液晶層12c、封裝液晶的封裝材料13、設置在第2玻璃基板12d側的背面之偏光板12e、以及背光元件12f,依序層積而成。本發明之電子基板10中,在帶有第2透明電極的玻璃基板12d的末端,經由異方性導電膜15設置可撓性基板14。而且,為了防止異方性導電膜15的短路或剝離,設置彈性保護元件20a、20b以被覆異方性導電膜15。又,電子基板10的結構不限於上述結構,只要是剛性基板12和可撓性基板14相比為硬質的基板,則任何構成皆可。列舉一例,例如,玻璃環氧樹脂基板、酚樹脂基板、矽基板、陶瓷基板等也可。又在TFT液晶顯示的情形時,帶有第1透明電極的玻璃基板12b成為第1透明電極及帶有彩色濾鏡的玻璃基板,帶有第2透明電極的玻璃基板12d成為第2透明電極及帶有TFT的玻璃基板。 The electronic substrate 10 used in an image display device is taken as an example for description below with reference to FIGS. 2 and 3 . Therefore, the electronic substrate 10 according to an embodiment of the present invention is not limited to the electronic substrate described in FIGS. 1 to 3 . As shown in FIG. 2 and FIG. 3 , for example, electrodes of a rigid substrate 12 of a liquid crystal display panel or an LED mounting panel with various functional layers laminated on a glass substrate are electrically connected to a flexible substrate 14 through an anisotropic conductive film 15 . In more detail, in the case of a liquid crystal display panel, the rigid substrate 12 is formed by sequentially laminating a polarizer 12a, a glass substrate 12b with a first transparent electrode, a glass substrate 12d with a second transparent electrode, a liquid crystal layer 12c sandwiched between the first glass substrate 12b and second glass substrate 12d, a sealing material 13 for encapsulating liquid crystal, a polarizer 12e provided on the back side of the second glass substrate 12d, and a backlight element 12f. In the electronic substrate 10 of the present invention, the flexible substrate 14 is provided via the anisotropic conductive film 15 at the end of the glass substrate 12d with the second transparent electrode. Furthermore, in order to prevent short circuit or peeling of the anisotropic conductive film 15 , elastic protection members 20 a , 20 b are provided so as to cover the anisotropic conductive film 15 . Also, the structure of the electronic substrate 10 is not limited to the above-mentioned structure, and any structure may be used as long as the rigid substrate 12 is harder than the flexible substrate 14 . As an example, for example, glass epoxy resin substrates, phenol resin substrates, silicon substrates, ceramic substrates, etc. may be used. In the case of a TFT liquid crystal display, the glass substrate 12b with the first transparent electrode becomes the first transparent electrode and the glass substrate with the color filter, and the glass substrate 12d with the second transparent electrode becomes the second transparent electrode and the glass substrate with the TFT.

圖2為顯示彎曲可撓性基板14前的狀態之部份放大剖面圖。後述的光硬化性組合物,在剛性基板12和可撓性基板14的連接部位,塗佈於彎曲部位16的內側或外側之至少一者,例如經由紫外線等使硬化,形成彈性保護元件20a、20b。帶有第1透明電極的玻璃基板12b側,設置彈性保護元件20a,以被覆包含帶有第1透明電極的玻璃基板12b等的前端、和異方性導電膜15、和一部份的可撓性基板14之跨界區域30a。對此,帶有第2透明電極的玻璃基板12d側,設置彈性保護元件20b,以被覆包含帶有第2透明電極的玻璃基板12d等的前端、和異方性導電膜15、和一部份的可撓性基板14之跨界區域30b。因此,導通連接剛 性基板12和可撓性基板14的異方性導電膜15,經由彈性保護元件20a、20b而被封裝。 FIG. 2 is a partially enlarged cross-sectional view showing a state before bending the flexible substrate 14 . The photocurable composition to be described later is applied to at least one of the inner side or the outer side of the bending part 16 at the connecting part of the rigid substrate 12 and the flexible substrate 14, and is cured by, for example, ultraviolet rays to form the elastic protection elements 20a, 20b. On the side of the glass substrate 12b with the first transparent electrode, an elastic protective element 20a is provided to cover the front end of the glass substrate 12b with the first transparent electrode, the anisotropic conductive film 15, and a part of the cross-border region 30a of the flexible substrate 14. In this regard, on the side of the glass substrate 12d with the second transparent electrode, an elastic protective element 20b is provided to cover the front end of the glass substrate 12d with the second transparent electrode, the anisotropic conductive film 15, and a part of the cross-border region 30b of the flexible substrate 14. Therefore, the conduction connection just The flexible substrate 12 and the anisotropic conductive film 15 of the flexible substrate 14 are encapsulated via the elastic protection elements 20a, 20b.

接著,以圖2所示白色空心箭頭方向彎曲可撓性基板14的狀態,如圖3所示。如圖3所示,在可撓性基板14、形成彈性保護元件20a、20b的部分,可撓性基板14和彈性保護元件20a、20b具有所設定的厚度及可撓性,從剛性基板12的末端突出而彎曲,形成彎曲部位16。在此彎曲之時,從剛性基板12末端突出的可撓性基板14的彎曲部位16到突出端的距離,稱為突出寬度40。於是,如上述,此突出寬度40為100~400μm,較佳為100~350μm,更佳為150~350μm。又,剛性基板12的末端是指,從剛性基板12表面的正面(即俯視)看時,在可撓性基板14和剛性基板12重疊的區域,在彎曲方向最突出的末端。另一方面,可撓性基板14的彎曲部位16的突出端是指,以上述相同之俯視,離剛性基板12末端最遠的可撓性基板14的突出端,顯示形成彎曲的外側的可撓性基板14的基材(樹脂膜)的表面。在此雖以俯視觀察為例,但觀察上述末端部位及突出端的方向,不限於在表面側,例如也可以從側面觀察。 Next, bend the flexible substrate 14 in the direction of the white hollow arrow shown in FIG. 2 , as shown in FIG. 3 . As shown in FIG. 3 , in the part where the flexible substrate 14 and the elastic protection elements 20a, 20b are formed, the flexible substrate 14 and the elastic protection elements 20a, 20b have a set thickness and flexibility, protrude from the end of the rigid substrate 12 and bend to form a bending part 16. During this bending, the distance from the bent portion 16 of the flexible substrate 14 protruding from the end of the rigid substrate 12 to the protruding end is referred to as the protruding width 40 . Therefore, as mentioned above, the protrusion width 40 is 100-400 μm, preferably 100-350 μm, more preferably 150-350 μm. Also, the end of rigid board 12 refers to the end that protrudes most in the bending direction in the area where flexible board 14 and rigid board 12 overlap when viewed from the front of rigid board 12 (that is, in plan view). On the other hand, the protruding end of the bent part 16 of the flexible substrate 14 refers to the protruding end of the flexible substrate 14 farthest from the end of the rigid substrate 12 in the same plan view as above, and shows the surface of the base material (resin film) of the outer flexible substrate 14 forming the bend. Here, the plan view is taken as an example, but the direction of observing the above-mentioned terminal portion and the protruding end is not limited to the surface side, and may be observed from the side, for example.

〈可撓性基板〉 〈Flexible substrate〉

本發明之一實施形態之可撓性基板14為,聚醯亞胺膜或聚酯膜等的樹脂膜所形成的基板,通常在樹脂膜上至少形成配線體。本發明之一實施形態之可撓性基板14,以在聚醯亞胺膜上設置配線體為佳。又,可撓性基板14的厚度為15~200μm較佳。由於形成所設定的彈性保護元件,可撓性基板14即使為上述厚度的聚醯亞胺膜,和習知者相比,也可以使可撓性基板14的彎曲部位16的突出寬度40變小。 The flexible substrate 14 according to one embodiment of the present invention is a substrate formed of a resin film such as a polyimide film or a polyester film, and usually at least wiring is formed on the resin film. In the flexible substrate 14 according to one embodiment of the present invention, it is preferable to provide a wiring body on a polyimide film. In addition, the thickness of the flexible substrate 14 is preferably 15-200 μm. Due to the formation of the set elastic protection element, even if the flexible substrate 14 is a polyimide film with the above-mentioned thickness, the protruding width 40 of the bending portion 16 of the flexible substrate 14 can be reduced compared with conventional ones.

又,上述可撓性基板14可為在上述配線體外具有光阻層者。又也可以進一步安裝電子元件,成為所謂的覆晶薄膜(chip on film)。在此情形,上述電子元件宜避開彎曲部位的最彎曲部分而配置。In addition, the flexible substrate 14 may have a photoresist layer outside the wiring. It is also possible to further mount electronic components to form a so-called chip on film. In this case, the above-mentioned electronic components are preferably arranged avoiding the most curved portion of the curved portion.

〈彈性保護元件〉 本發明之一實施形態之彈性保護元件,以奈米壓痕(nanoindentation )試驗測量的馬氏硬度(Martens hardness)為0.1~0.5N/mm2 者為佳。藉由上述彈性保護元件的馬氏硬度在0.1~0.5N/mm2 的範圍,從剛性基板末端延伸到可撓性基板,上述彈性保護元件除了優良的可撓性外,也具有伸長性及壓縮性,和習知相比,可縮小彎曲可撓性基板時的曲率半徑。更具體地說,在上述彈性保護元件配置在可撓性基板的內側的情形,以彎曲時壓縮彈性保護元件,可縮小曲率半徑。另一方面,在上述彈性保護元件配置在可撓性基板的外側的情形,以彎曲時彈性保護元件以弱應力伸長,可縮小曲率半徑。因此,和習知相比,可使從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度40(即,可撓性基板從剛性基板末端的突出量)變小。<Elastic Protective Element> The elastic protective element according to an embodiment of the present invention preferably has a Martens hardness of 0.1-0.5 N/mm 2 as measured by a nanoindentation test. Since the Martens hardness of the above-mentioned elastic protection element is in the range of 0.1-0.5N/ mm2 , extending from the end of the rigid substrate to the flexible substrate, the above-mentioned elastic protection element not only has excellent flexibility, but also has elongation and compressibility, and can reduce the radius of curvature when bending the flexible substrate compared with conventional ones. More specifically, when the above-mentioned elastic protection element is disposed inside the flexible substrate, the elastic protection element can be compressed during bending to reduce the radius of curvature. On the other hand, when the above-mentioned elastic protection element is arranged outside the flexible substrate, the elastic protection element can be stretched with weak stress during bending, so that the radius of curvature can be reduced. Therefore, the protrusion width 40 (that is, the amount of protrusion of the flexible substrate from the end of the rigid substrate) of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate can be reduced compared to conventional ones.

上述馬氏硬度為0.1~0.3N/mm2 較佳。使用具有上述硬度的彈性保護層材料,可以弱應力縮小曲率半徑。因此,對可撓性基板或剛性基板的負荷小,例如較佳適合用於容易破損的玻璃基板或薄型基板之時。又,在上述馬氏硬度為0.3~0.5N/mm2 的範圍的情形,由於縮小曲率半徑,應力變大,但耐高強度摩擦,適合大型的基板、或施加振動等的衝擊之用途。The aforementioned Martens hardness is preferably 0.1 to 0.3 N/mm 2 . Using the elastic protective layer material having the above hardness, the radius of curvature can be reduced with weak stress. Therefore, the load on a flexible substrate or a rigid substrate is small, and it is suitable for a glass substrate or a thin substrate that is easily broken, for example. Also, when the above-mentioned Martens hardness is in the range of 0.3 to 0.5 N/mm 2 , since the radius of curvature is reduced, the stress becomes larger, but it is resistant to high-strength friction, and is suitable for large-scale substrates or applications where shocks such as vibration are applied.

本發明之一實施形態之彈性保護元件的楊氏模數(Young's modulus)為0.1~3.0MPa,較佳為0.1~1.0 MPa的範圍,更佳為0.1~0.3 MPa的範圍。又,關於楊氏模數的測量方法如後述。由於使用具有上述範圍的楊氏模數之彈性保護元件,具有適當硬度,因此,和習知相比,可縮小可撓性基板的曲率半徑。結果,和習知相比,可使從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小。The Young's modulus of the elastic protective element according to an embodiment of the present invention is 0.1-3.0 MPa, preferably 0.1-1.0 MPa, more preferably 0.1-0.3 MPa. In addition, the measuring method of Young's modulus is mentioned later. Due to the use of the elastic protection element with the Young's modulus in the above range, it has proper hardness, so compared with the conventional one, the radius of curvature of the flexible substrate can be reduced. As a result, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate can be made smaller than conventionally.

於是,為了保護可撓性基板,上述彈性保護層具有所設定的強度。此時,一旦過度提高彈性保護層的強度,可理解在彎曲可撓性基板以形成所設定的突出寬度之時,彈性保護層容易從可撓性基板剝離。本發明人等致力研究得出,一旦彈性保護層的強度(楊氏模數)、及彈性保護層和可撓性基板的剝離力之關係在所設定的範圍時,彎曲可撓性基板以成為所設定的突出寬度之時,也不會發生剝離。亦即,上述彈性保護元件對可撓性基板的剝離力F可如下列(1)式所示。 F>100×ln(E)+250・・・(1) 式中,F:剝離力(N/m),E:楊氏模數(MPa) 上述彈性保護元件的剝離力F,由於具有上列(1)式關係,從剛性基板的末端彎曲可撓性基板之時,和習知者相比,保護元件不會自剛性基板及可撓性基板剝落,可縮小可撓性基板的曲率半徑。結果,可維持對變形的耐久性,同時,和習知者相比,可使從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小。又剝離力的測量方法如後述。Therefore, in order to protect the flexible substrate, the elastic protective layer has a predetermined strength. At this time, if the strength of the elastic protective layer is excessively increased, it is understood that the elastic protective layer is easily peeled off from the flexible substrate when the flexible substrate is bent to form a predetermined protrusion width. The inventors of the present invention have worked hard to find that once the relationship between the strength (Young's modulus) of the elastic protective layer and the peeling force between the elastic protective layer and the flexible substrate is within the set range, even when the flexible substrate is bent to the set protrusion width, peeling will not occur. That is, the peeling force F of the above-mentioned elastic protection element to the flexible substrate can be expressed as the following formula (1). F>100×ln(E)+250・・・(1) In the formula, F: peeling force (N/m), E: Young's modulus (MPa) The above-mentioned peeling force F of the elastic protective element has the relationship of the above formula (1), when the flexible substrate is bent from the end of the rigid substrate, the protective element will not peel off from the rigid substrate and the flexible substrate compared with conventional ones, and the radius of curvature of the flexible substrate can be reduced. As a result, durability against deformation can be maintained, and at the same time, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate can be made smaller than in the prior art. The method of measuring the peeling force will be described later.

後述的楊氏模數和剝離力的關係圖如圖8所示。此圖為根據本說明書之實施例的樣本所作的圖。如圖8所示,作為決定對變形的耐久性的優劣之回歸直線,得到F=100×ln(E)+250。由於彈性保護元件的剝離力F滿足上列(1)式的條件,在從剛性基板末端彎曲可撓性基板之時,保護元件不會剝落,和習知相比,可縮小可撓性基板的曲率半徑。再者,作為決定修補性的優劣之回歸直線,得到F=100×ln(E)+760。由於彈性保護元件的剝離力F滿足上列(2)式的條件,可具有所欲硬度和附著性,同時可從基材撕下,可工序修正(修補)。在具有超過此回歸直線的剝離力的情形,彈性保護元件對可撓性基板的附著力過強,在嘗試剝離時彈性保護元件碎裂,因此難以修補。The relationship between Young's modulus and peeling force described later is shown in FIG. 8 . This figure is a figure made according to a sample of an embodiment of the present specification. As shown in FIG. 8 , F=100×ln(E)+250 was obtained as a regression line for determining the durability against deformation. Since the peeling force F of the elastic protective element satisfies the condition of the above formula (1), when the flexible substrate is bent from the end of the rigid substrate, the protective element will not peel off, and the radius of curvature of the flexible substrate can be reduced compared with conventional ones. Furthermore, F=100×ln(E)+760 was obtained as a regression line for determining the pros and cons of repairability. Since the peeling force F of the elastic protection element satisfies the conditions of the above formula (2), it can have the desired hardness and adhesion, and can be torn off from the base material at the same time, and the process can be corrected (repaired). In the case of a peeling force exceeding this regression line, the adhesion of the elastic protection element to the flexible substrate is too strong, and the elastic protection element is broken when peeling is attempted, thus making it difficult to repair.

再者,本發明之一實施形態之彈性保護元件,如圖9所示,大區分有3個較佳範圍。亦即,本發明之彈性保護元件,楊氏模數E(MPa)為1.0≦E≦3.0、剝離力F(N/m)為250≦F≦800的範圍C特佳,楊氏模數E(MPa)為0.3≦E≦1.0、剝離力F(N/m)為140≦F≦740的範圍B更佳,楊氏模數E(MPa)為0.1≦E≦0.3、剝離力F(N/m)為80≦F≦550的範圍A更佳。使用具有上述範圍C性質的彈性保護元件,由於曲率半徑縮小而應力變大,但耐高強度摩擦,適合大型的基板、或施加振動等的衝擊之用途。另一方面,使用具有上述範圍A性質的彈性保護元件,可以弱應力縮小曲率半徑。因此,對可撓性基板或剛性基板的負荷小,例如較佳適合用於容易破損的玻璃基板或薄型基板之時。因此,特別是高水平、小型化、共邊框化的情形,以具有範圍A的性質者為佳。另一方面,範圍B為具有中間性質的彈性保護元件,以容易用於廣泛用途的觀點為佳。Furthermore, the elastic protection element of an embodiment of the present invention, as shown in FIG. 9 , has three preferred ranges. That is to say, for the elastic protection element of the present invention, Young's modulus E (MPa) is 1.0≦E≦3.0, peeling force F (N/m) is 250≦F≦800 range C is particularly preferred, Young's modulus E (MPa) is 0.3≦E≦1.0, peeling force F (N/m) is 140≦F≦740 range B, Young's modulus E (MPa) is 0.1≦E≦0.3, peeling force F (N/m) is more preferably in the range A of 80≦F≦550. Using an elastic protection element with the properties of the above-mentioned range C, the stress becomes larger due to the reduction of the radius of curvature, but it is resistant to high-strength friction, and is suitable for large-scale substrates or applications where shocks such as vibration are applied. On the other hand, using the elastic protective member having the properties of the above-mentioned range A, the radius of curvature can be reduced with weak stress. Therefore, the load on a flexible substrate or a rigid substrate is small, and it is suitable for a glass substrate or a thin substrate that is easily broken, for example. Therefore, especially in the case of high level, miniaturization, and common frame, it is better to have the properties of the range A. On the other hand, range B is an elastic protection element having intermediate properties, and is preferable from the viewpoint of being easy to use in a wide range of applications.

〔光硬化性組合物〕 本發明之一實施形態之光硬化性組合物為,經由塗佈於電子基板後照射光而使硬化,形成保護層的光硬化性組合物,包含單官能基脂環式(甲基)丙烯酸酯單體、單官能基脂肪族(甲基)丙烯酸酯單體、單官能基高極性單體、熱塑性彈性體、及自由基聚合起始劑,未硬化時的黏度為10~5000mPa・s的範圍,硬化後的硬化體的楊氏模數為0.1~3.0MPa的範圍。〔Photocurable composition〕 A photocurable composition according to an embodiment of the present invention is a photocurable composition that is coated on an electronic substrate and cured by irradiation with light to form a protective layer. It includes a monofunctional alicyclic (meth)acrylate monomer, a monofunctional aliphatic (meth)acrylate monomer, a monofunctional highly polar monomer, a thermoplastic elastomer, and a radical polymerization initiator. .0MPa range.

此處,「單官能基脂環式(甲基)丙烯酸酯單體」表示包含單官能基脂環式丙烯酸酯單體及單官能基脂環式甲基丙烯酸酯單體。「單官能基脂肪族(甲基)丙烯酸酯單體」表示包含單官能基脂肪族丙烯酸酯單體及單官能基脂肪族甲基丙烯酸酯單體。相同地,「單官能基高極性單體」表示包含單官能基高極性丙烯酸酯單體及單官能基高極性甲基丙烯酸酯單體、丙烯醯胺類單體。Here, "a monofunctional alicyclic (meth)acrylate monomer" means that a monofunctional alicyclic acrylate monomer and a monofunctional alicyclic methacrylate monomer are included. "Monofunctional aliphatic (meth)acrylate monomer" means a monofunctional aliphatic acrylate monomer and a monofunctional aliphatic methacrylate monomer. Similarly, "monofunctional highly polar monomers" means monofunctional highly polar acrylate monomers, monofunctional highly polar methacrylate monomers, and acrylamide monomers.

本發明之一實施形態之光硬化性組合物,由於包含上述各成份、具有上述範圍之未硬化時的黏度,容易塗佈、操作性優良,由於硬化後的硬化體具有上述範圍的楊氏模數,硬化體具有所欲的柔軟性。又本發明之光硬化性組合物之硬化體也可作為上述電子基板10的彈性保護元件使用。The photocurable composition according to one embodiment of the present invention contains the above-mentioned components and has an uncured viscosity in the above-mentioned range, which is easy to apply and has excellent workability. Since the cured body after curing has a Young's modulus in the above-mentioned range, the hardened body has desired flexibility. Furthermore, the cured body of the photocurable composition of the present invention can also be used as an elastic protection member for the above-mentioned electronic substrate 10 .

本發明之一實施形態之光硬化性組合物,從塗佈性的觀點,上述光硬化性組合物的未硬化時的黏度為10~5000 mPa․s的範圍,較佳為50~2000 mPa․s的範圍,更佳為90~1000 mPa․s的範圍。特別是在有凹凸的塗佈對象的所設定區域,使用噴射分配機等的非接觸型的塗佈裝置,塗佈光硬化性組合物形成所設定的厚度的情形,為了高精密度控制塗佈量,黏度為90~1000 mPa․s為佳。The photocurable composition according to one embodiment of the present invention has an uncured viscosity of 10 to 5000 mPa․ from the viewpoint of coatability s range, preferably 50-2000 mPa․ s range, more preferably 90~1000 mPa․ range of s. Especially in the case where a non-contact coating device such as a jet dispenser is used to apply a photocurable composition to a predetermined thickness on a predetermined area of a coating object with unevenness, the viscosity is 90 to 1000 mPa in order to control the coating amount with high precision․ s is preferred.

又從提供硬化體所欲的柔軟性的觀點,上述光硬化性組合物的硬化後的硬化體的楊氏模數為0.1~3.0 MPa的範圍,較佳為0.1~1.0 MPa的範圍,更佳為0.1~0.3 MPa的範圍。From the viewpoint of providing the desired flexibility of the cured body, the Young's modulus of the cured body of the photocurable composition after curing is in the range of 0.1 to 3.0 MPa, preferably in the range of 0.1 to 1.0 MPa, more preferably in the range of 0.1 to 0.3 MPa.

上述光硬化性組合物的硬化後的硬化體的剝離力F,如下列(1)式所示。 F>100×ln(E)+250・・・(1) 式中,F:剝離力(N/m),E:楊氏模數(MPa) 上述光硬化性組合物的硬化後的硬化體的剝離力F,由於具有上述(1)式的關係,使上述光硬化性組合物硬化所得到的硬化體具有所欲的硬度且耐久性優良。The peeling force F of the cured body of the photocurable composition after curing is expressed by the following formula (1). F>100×ln(E)+250・・・(1) In the formula, F: peeling force (N/m), E: Young's modulus (MPa) The peeling force F of the cured body of the photocurable composition after curing has the relationship of the above formula (1), and the cured body obtained by curing the photocurable composition has desired hardness and is excellent in durability.

上述光硬化性組合物的硬化後的硬化體的剝離力F,如下列(2)式所示。 F<100×ln(E)+760 ・・・(2) F:剝離力(N/m) E:楊氏模數(MPa) 上述光硬化性組合物的硬化後的硬化體的剝離力F,由於具有上列(2)式的關係,使上述光硬化性組合物硬化所得的硬化體,具有所欲的硬度及附著性,且可從基板的撕下,工序修正性(修補性)優良。The peeling force F of the cured body of the photocurable composition after curing is expressed by the following formula (2). F<100×ln(E)+760・・・(2) F: peel force (N/m) E: Young's modulus (MPa) The peeling force F of the hardened body of the above-mentioned photocurable composition after curing has the relationship of the above formula (2), and the hardened body obtained by curing the above-mentioned photocurable composition has desired hardness and adhesion, and can be peeled off from the substrate, and has excellent process correctability (repairability).

再者,本發明之一實施形態之光硬化性組合物的硬化後的硬化體,如圖9所示,大區分有3個較佳範圍。亦即,本發明之上述硬化體,楊氏模數E(MPa)為1.0≦E≦3.0、剝離力F(N/m)為250≦F≦800的範圍C特佳,楊氏模數E(MPa)為0.3≦E≦1.0、剝離力F(N/m)為140≦F≦740的範圍B更佳,楊氏模數E(MPa)為0.1≦E≦0.3、剝離力F(N/m)為80≦F≦550的範圍A更佳。如果形成具有上述範圍C性質的硬化體之彈性保護元件,曲率半徑縮小而應力變大,但耐高強度摩擦,適合大型的基板、或施加振動等的衝擊之用途。另一方面,如果形成具有上述範圍A性質的硬化體之彈性保護元件,可以弱應力縮小曲率半徑。因此,對可撓性基板或剛性基板的負荷小,例如較佳適合用於容易破損的玻璃基板或薄型基板之時。因此,特別是高水平、小型化、共邊框化的情形,以具有範圍A的性質者為佳。另一方面,範圍B為具有中間性質的硬化體,以容易用於廣泛用途的觀點為佳。Furthermore, as shown in FIG. 9, the hardened body of the photocurable composition according to an embodiment of the present invention can be largely divided into three preferable ranges. That is, the above-mentioned hardened body of the present invention preferably has a Young's modulus E (MPa) of 1.0≦E≦3.0, a peeling force F (N/m) of 250≦F≦800 in the range C, a Young's modulus E (MPa) of 0.3≦E≦1.0, and a peeling force F (N/m) of 140≦F≦740. (N/m) is more preferably in the range A of 80≦F≦550. If an elastic protective element having a hardened body in the above-mentioned range C is formed, the radius of curvature decreases and the stress increases, but it is resistant to high-strength friction and is suitable for large-scale substrates or applications where shocks such as vibrations are applied. On the other hand, if an elastic protection member having a hardened body having properties in the above-mentioned range A is formed, the radius of curvature can be reduced with weak stress. Therefore, the load on a flexible substrate or a rigid substrate is small, and it is suitable for a glass substrate or a thin substrate that is easily broken, for example. Therefore, especially in the case of high level, miniaturization, and shared frame, it is better to have the properties of the range A. On the other hand, range B is a hardened body having intermediate properties, and is preferable from the viewpoint of being easy to use in a wide range of applications.

以下對於光硬化性組合物的含量成份,進行說明。The content and components of the photocurable composition will be described below.

單官能基脂環式(甲基)丙烯酸酯單體: 單官能基脂環式(甲基)丙烯酸酯單體為液狀組合物,為溶解熱塑性彈性體的成份。由於調配單官能基脂環式(甲基)丙烯酸酯單體,可使光硬化性組合物在硬化後的硬化體的接著力提高,且對於被接著物剝離硬化體時殘膠減少。又,使硬化體強韌,有提高楊氏模數的效果。而且,增加此成份的比例,可提高防濕性。Monofunctional cycloaliphatic (meth)acrylate monomers: The monofunctional alicyclic (meth)acrylate monomer is a liquid composition and is a component for dissolving thermoplastic elastomers. Due to the preparation of the monofunctional alicyclic (meth)acrylate monomer, the adhesive force of the hardened body of the photocurable composition after curing can be improved, and the adhesive residue can be reduced when peeling off the hardened body from the adhered object. Also, it has the effect of making the hardened body tough and increasing the Young's modulus. Moreover, increasing the proportion of this component can improve moisture resistance.

單官能基脂環式(甲基)丙烯酸酯單體,具體例如丙烯酸異莰酯、丙烯酸環己酯、丙烯酸二環戊烯酯、丙烯酸3,3,5-三甲基環己酯、丙烯酸4-三級丁基環己酯等。Monofunctional alicyclic (meth)acrylate monomers, such as isobornyl acrylate, cyclohexyl acrylate, dicyclopentenyl acrylate, 3,3,5-trimethylcyclohexyl acrylate, 4-tertiary butylcyclohexyl acrylate, etc.

單官能基脂肪族(甲基)丙烯酸酯單體: 單官能基脂肪族(甲基)丙烯酸酯單體為液狀組合物,為用於溶解上述單官能基脂環式(甲基)丙烯酸酯單體和熱塑性彈性體之成份。透過調配單官能基脂肪族(甲基)丙烯酸酯單體,可使光硬化性組合物在硬化後所得的硬化體的柔軟性提高,楊氏模數下降。Monofunctional aliphatic (meth)acrylate monomers: The monofunctional aliphatic (meth)acrylate monomer is a liquid composition, which is a component for dissolving the above-mentioned monofunctional aliphatic (meth)acrylate monomer and thermoplastic elastomer. By blending the monofunctional aliphatic (meth)acrylate monomer, the flexibility of the hardened body obtained after curing the photocurable composition can be improved, and the Young's modulus can be reduced.

單官能基脂肪族(甲基)丙烯酸酯單體,具體例如,乙氧基二乙二醇丙烯酸酯、2-乙基己基二乙二醇丙烯酸酯、丙烯酸丁氧基乙酯等的脂肪族醚類(甲基)丙烯酸酯單體,或丙烯酸十二烷酯、丙烯酸十八烷酯、丙烯酸異十八烷酯、丙烯酸癸酯、丙烯酸異癸酯、丙烯酸異壬酯、丙烯酸正辛酯等的脂肪族烴類(甲基)丙烯酸酯單體。透過使用脂肪族烴類(甲基)丙烯酸酯單體,可提高和熱塑性彈性體的軟段(soft segment)的相溶性,降低光硬化性組合物的黏度。Monofunctional aliphatic (meth)acrylate monomers, for example, aliphatic ether (meth)acrylate monomers such as ethoxydiethylene glycol acrylate, 2-ethylhexyldiethylene glycol acrylate, and butoxyethyl acrylate, or aliphatic hydrocarbon (meth)acrylate monomers such as dodecyl acrylate, octadecyl acrylate, isostearyl acrylate, decyl acrylate, isodecyl acrylate, isononyl acrylate, and n-octyl acrylate. By using the aliphatic hydrocarbon (meth)acrylate monomer, the compatibility with the soft segment of the thermoplastic elastomer can be improved, and the viscosity of the photocurable composition can be reduced.

單官能基高極性單體: 單官能基高極性單體為液狀組合物,透過調配單官能基高極性單體,可使光硬化性組合物在硬化後所得的硬化體的附著性提高。Monofunctional highly polar monomers: The monofunctional high polarity monomer is a liquid composition, and the adhesiveness of the hardened body obtained after the photocurable composition is cured can be improved by blending the monofunctional high polarity monomer.

單官能基高極性單體,具體例如,含有羥基的丙烯酸酯單體、含有環氧丙基(glycidyl)的丙烯酸酯單體、丙烯醯胺類單體、含有三級胺的(甲基)丙烯酸酯單體、醯亞胺類(甲基)丙烯酸酯單體。光硬化性組合物中,從保存安定性及提高附著性的觀點,以丙烯醯胺類單體、含有三級胺基的(甲基)丙烯酸酯單體、醯亞胺類(甲基)丙烯酸酯單體等的含有氮的單體為佳。例如丙烯醯基嗎福林(acryloyl morpholine)、(甲基)丙烯酸二甲基胺基乙酯、N-丙烯醯氧基乙基環己烷二甲醯亞胺(N-acryloyloxy ethyl hexahydrophthalimide)。Monofunctional highly polar monomers, for example, hydroxyl-containing acrylate monomers, glycidyl-containing acrylate monomers, acrylamide-based monomers, tertiary amine-containing (meth)acrylate monomers, and imide-based (meth)acrylate monomers. In the photocurable composition, nitrogen-containing monomers such as acrylamide-based monomers, tertiary amino group-containing (meth)acrylate monomers, and imide-based (meth)acrylate monomers are preferred from the viewpoint of storage stability and adhesion improvement. Examples include acryloyl morpholine, dimethylaminoethyl (meth)acrylate, and N-acryloyloxy ethyl hexahydrophthalimide.

單官能基高極性單體,從接著性的觀點,在光硬化性組合物中為0.5質量%~12.75質量%為佳,以2~8.5質量%較佳。在小於0.5質量%的情形,由於剝離力降低、變形大,在剛性基板和可撓性基板的連接部位容易剝落,在大於12.75質量%的情形,和熱塑性彈性體的相溶性降低,因此有黏度容易經時增加等的保存安定性的觀點的擔憂,以及由於極性高的段(segment)增加,而使硬化體的防濕性下降的擔憂。如果是在2~8.5質量%的情形,由於低黏度、黏度變化也小,可獲得附著性高的光硬化性組合物。The monofunctional highly polar monomer is preferably 0.5% by mass to 12.75% by mass, more preferably 2 to 8.5% by mass, in the photocurable composition from the viewpoint of adhesiveness. When it is less than 0.5% by mass, the peeling force is reduced and the deformation is large, and it is easy to peel off at the joint between the rigid substrate and the flexible substrate. When it is greater than 12.75% by mass, the compatibility with thermoplastic elastomers is reduced. Therefore, there are concerns from the viewpoint of storage stability such as easy increase in viscosity over time, and concerns that the moisture resistance of the hardened body will decrease due to the increase in highly polar segments. In the case of 2 to 8.5% by mass, since the viscosity is low and the change in viscosity is small, a photocurable composition with high adhesion can be obtained.

上述提高附著性的效果,對於楊氏模數0.3MPa以下的光硬化性組合物變得顯著。這是因為0.3MPa以下的光硬化性組合物對抗剪斷力容易變弱,所以只有單官能基(甲基)丙烯酸酯單體有附著性容易降低的傾向。The effect of improving the above-mentioned adhesion becomes remarkable for a photocurable composition having a Young's modulus of 0.3 MPa or less. This is because the shearing force of the photocurable composition of 0.3 MPa or less tends to be weak, and only the monofunctional (meth)acrylate monomer tends to lower the adhesion.

本發明之一實施形態之光硬化性組合物也可進一步適當含有多官能基脂肪族(甲基)丙烯酸酯單體、多官能基環狀(甲基)丙烯酸酯單體、雙馬來醯亞胺等的多官能基單體。從上述光硬化性組合物的硬化後的硬化體的強度及上述光硬化性組合物的反應性的觀點,多官能基脂肪族(甲基)丙烯酸酯單體、多官能基環狀(甲基)丙烯酸酯單體、雙馬來醯亞胺之1種以上,在光硬化性組合物中,單獨或總計為0質量%~4.25質量%者為佳。在大於4.25質量%的情形,硬化體的殘存黏性少,另一方面,有硬化體的硬化收縮(翹曲)或硬度上升的疑慮。The photocurable composition according to one embodiment of the present invention may further appropriately contain polyfunctional monomers such as polyfunctional aliphatic (meth)acrylate monomers, polyfunctional cyclic (meth)acrylate monomers, and bismaleimide. From the viewpoint of the strength of the hardened body of the photocurable composition after curing and the reactivity of the photocurable composition, one or more of polyfunctional aliphatic (meth)acrylate monomers, polyfunctional cyclic (meth)acrylate monomers, and bismaleimide are preferably present in the photocurable composition in an amount of 0% by mass to 4.25% by mass alone or in total. When it exceeds 4.25% by mass, the residual viscosity of the hardened body is small, but on the other hand, there is a possibility that the hardened body shrinks during hardening (warping) or increases in hardness.

上述多官能基脂肪族(甲基)丙烯酸酯單體,具體例如,二官能基脂肪族(甲基)丙烯酸酯單體。上述二官能基脂肪族(甲基)丙烯酸酯單體例如,乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、丙三醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、3-甲基-1,5-戊二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二(甲基)丙烯酸酯等。從和熱塑性彈性體的軟段的相溶性較高的觀點,以兩端具有反應性基的二官能基脂肪族烴類二(甲基)丙烯酸酯單體為佳。The aforementioned polyfunctional aliphatic (meth)acrylate monomers are, for example, difunctional aliphatic (meth)acrylate monomers. Examples of the difunctional aliphatic (meth)acrylate monomers include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, glycerol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 3-methyl-1,5-pentanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, etc. From the viewpoint of high compatibility with the soft segment of the thermoplastic elastomer, a difunctional aliphatic hydrocarbon di(meth)acrylate monomer having reactive groups at both ends is preferable.

上述多官能基環狀(甲基)丙烯酸酯單體具體例如,乙氧基化雙酚A二(甲基)丙烯酸酯、丙氧基化雙酚A二(甲基)丙烯酸酯、丙氧基化乙氧基化雙酚A二(甲基)丙烯酸酯、乙氧基化異氰脲酸二/三(甲基)丙烯酸酯、ε-己內酯改性參-(2-丙烯醯氧基乙基)異氰脲酸酯等。上述多官能基環狀(甲基)丙烯酸酯單體,從提高附著性的觀點,以參-(2-羥基乙基)異氰脲酸酯類(甲基)丙烯酸酯單體為佳。Specific examples of the above multifunctional cyclic (meth)acrylate monomers include ethoxylated bisphenol A di(meth)acrylate, propoxylated bisphenol A di(meth)acrylate, propoxylated ethoxylated bisphenol A di(meth)acrylate, ethoxylated isocyanurate di/tri(meth)acrylate, ε-caprolactone modified ginseng-(2-acryloxyethyl)isocyanurate, and the like. The polyfunctional cyclic (meth)acrylate monomer is preferably a ginseng-(2-hydroxyethyl)isocyanurate-based (meth)acrylate monomer from the viewpoint of improving adhesion.

上述雙馬來醯亞胺,例如4, 4’-二苯基甲烷雙馬來醯亞胺、4-甲基-1,3-伸苯基雙馬來醯亞胺、2, 2-雙[4-(4-馬來醯亞胺基酚基)苯基]丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺基苯基)甲烷、1, 6-雙(馬來醯亞胺基)己烷、1, 6’-雙馬來醯亞胺基-(2, 2, 4-三甲基)己烷。從難以損害光硬化性組合物的相溶性及光硬化性的觀點,以1, 6-雙(馬來醯亞胺基)己烷、1, 6’-雙馬來醯亞胺基-(2, 2, 4-三甲基)己烷等的脂肪族雙馬來醯亞胺為佳。The aforementioned bismaleimides, such as 4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, 2,2-bis[4-(4-maleiminophenol)phenyl]propane, bis(3-ethyl-5-methyl-4-maleiminophenyl)methane, 1,6-bis(maleimino)hexane , 1,6'-bismaleimido-(2,2,4-trimethyl)hexane. Aliphatic bismaleimides such as 1,6-bis(maleimido)hexane, 1,6'-bismaleimido-(2,2,4-trimethyl)hexane are preferable from the viewpoint of hardly impairing the compatibility and photocurability of the photocurable composition.

熱塑性彈性體: 上述熱塑性彈性體例如,苯乙烯類熱塑性彈性體、烯烴類熱塑性彈性體、酯類熱塑性彈性體、胺甲酸乙酯類熱塑性彈性體、醯胺類熱塑性彈性體、氯化乙烯熱塑性彈性體、氟樹脂類熱塑性彈性體、離子交聯類熱塑性彈性體等。本發明之熱塑性彈性體以苯乙烯類熱塑性彈性體為佳。Thermoplastic Elastomers: Examples of the above-mentioned thermoplastic elastomer include styrene-based thermoplastic elastomers, olefin-based thermoplastic elastomers, ester-based thermoplastic elastomers, urethane-based thermoplastic elastomers, amide-based thermoplastic elastomers, vinyl chloride thermoplastic elastomers, fluororesin-based thermoplastic elastomers, ionomer-based thermoplastic elastomers, and the like. The thermoplastic elastomer of the present invention is preferably a styrene-based thermoplastic elastomer.

苯乙烯類熱塑性彈性體,溶解於在光硬化性組合物中的上述單官能基脂環式(甲基)丙烯酸酯單體、及上述單官能基脂肪族(甲基)丙烯酸酯單體、及上述單官能基高極性單體任一者。於是,苯乙烯類熱塑性彈性體可提高上述單官能基脂環式(甲基)丙烯酸酯單體、及上述單官能基脂肪族(甲基)丙烯酸酯單體、及上述單官能基高極性單體硬化後的硬化體的修補性,且降低透濕度。又苯乙烯類熱塑性彈性體為,溶解於上述單官能基脂環式(甲基)丙烯酸酯單體、及上述單官能基脂肪族(甲基)丙烯酸酯單體、及上述單官能基高極性單體任一者,且提供硬化體橡膠彈性(柔軟性及伸長性)之成份。本發明之一實施形態中,溶解的狀態可為全部呈均勻液狀的狀態,除了無色透明的情形外,也可以是白色混濁或其他顏色混濁。The styrene-based thermoplastic elastomer, any one of the above-mentioned monofunctional alicyclic (meth)acrylate monomer, the above-mentioned monofunctional aliphatic (meth)acrylate monomer, and the above-mentioned monofunctional high-polarity monomer dissolved in the photocurable composition. Therefore, the styrene-based thermoplastic elastomer can improve the repairability of the cured body after curing of the monofunctional alicyclic (meth)acrylate monomer, the monofunctional aliphatic (meth)acrylate monomer, and the monofunctional highly polar monomer, and reduce moisture permeability. In addition, the styrene-based thermoplastic elastomer is a component that dissolves in any of the above-mentioned monofunctional alicyclic (meth)acrylate monomer, the above-mentioned monofunctional aliphatic (meth)acrylate monomer, and the above-mentioned monofunctional high-polarity monomer, and provides the rubber elasticity (softness and elongation) of the hardened body. In one embodiment of the present invention, the dissolved state may be in a uniform liquid state, and may be white turbid or cloudy in other colors in addition to being colorless and transparent.

苯乙烯類熱塑性彈性體由於單獨時為固體,常溫下沒有接著性,但是透過溶解於上述單官能基脂環式(甲基)丙烯酸酯單體、及上述單官能基脂肪族(甲基)丙烯酸酯單體、及上述單官能基高極性單體,則可均勻分散於光硬化性組合物及其硬化體中,可作為具有附著性的光硬化性組合物之一成份而含有。Styrene-based thermoplastic elastomers are solid when they are alone, and have no adhesiveness at room temperature. However, they can be uniformly dispersed in the photocurable composition and its hardened body by dissolving in the above-mentioned monofunctional alicyclic (meth)acrylate monomer, the above-mentioned monofunctional aliphatic (meth)acrylate monomer, and the above-mentioned monofunctional highly polar monomer, and can be included as a component of an adhesive photocurable composition.

苯乙烯類熱塑性彈性體的添加量,在光硬化性組合物中為10~35質量%者為佳,為10~20質量%者較佳,為10~15質量%者更佳。在苯乙烯類熱塑性彈性體的調配小於10質量%的情形,有修補性變低的疑慮。另一方面,超過35質量%時,則光硬化性組合物的黏度增加,塗佈恐變得困難。如果在20質量%以下,則流動性適宜、容易塗佈。The amount of the styrene-based thermoplastic elastomer added is preferably 10 to 35% by mass, more preferably 10 to 20% by mass, and more preferably 10 to 15% by mass in the photocurable composition. When the blending of the styrene-based thermoplastic elastomer is less than 10% by mass, the repairability may be lowered. On the other hand, when it exceeds 35 mass %, the viscosity of a photocurable composition may increase, and coating may become difficult. If it is 20 mass % or less, fluidity|fluidity will be suitable and coating will be easy.

苯乙烯類熱塑性彈性體的具體例,如苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS)、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS)、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS)、苯乙烯-異丁烯-苯乙烯嵌段共聚物(SIBS)、苯乙烯-乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEEPS)、及這些的改性體。Specific examples of styrene-based thermoplastic elastomers include styrene-butadiene-styrene block copolymer (SBS), styrene-isoprene-styrene block copolymer (SIS), styrene-ethylene-butylene-styrene block copolymer (SEBS), styrene-ethylene-propylene-styrene block copolymer (SEPS), styrene-isobutylene-styrene block copolymer (SIBS), styrene-ethylene-ethylene-propylene-styrene block copolymer (SEEPS), and these of the modified body.

這些之中,使用軟段不具有不飽和鍵的SEBS、SEPS、SIBS,則光硬化性組合物的硬化體成為耐受性優良者,故而為佳。又SEBS及SEPS中,使用軟段的比例高者,可提高硬化體的透明性。具體地說,相對於熱塑性彈性體的總質量,軟段的質量比例為80~95質量%者為佳。如此,例如可提高厚度0.5mm的彈性保護元件的平行光線透過率(波長550nm)在90%以上。Among these, it is preferable to use SEBS, SEPS, and SIBS in which the soft segment does not have an unsaturated bond, because the cured product of the photocurable composition has excellent tolerance. In addition, among SEBS and SEPS, the one with a higher proportion of soft segment can improve the transparency of the hardened body. Specifically, it is preferable that the mass ratio of the soft segment is 80 to 95% by mass relative to the total mass of the thermoplastic elastomer. In this way, for example, the parallel light transmittance (wavelength 550 nm) of the elastic protection element with a thickness of 0.5 mm can be increased to more than 90%.

本說明書中,苯乙烯類熱可塑性彈性體的重量平均分子量使用GPC法(Gel Permeation Chromatography;凝膠滲透層析法),且根據標準聚苯乙烯所測量的校正曲線(檢量線)所測量。本發明之一實施形態,使用重量平均分子量小於20萬的苯乙烯類熱塑性彈性體,以容易調整為適合塗佈的黏度的觀點為佳。In this specification, the weight-average molecular weight of the styrene-based thermoplastic elastomer is measured using the GPC method (Gel Permeation Chromatography; gel permeation chromatography) based on a calibration curve (calibration curve) measured with standard polystyrene. In one embodiment of the present invention, it is preferable to use a styrene-based thermoplastic elastomer having a weight average molecular weight of less than 200,000 from the viewpoint of easy adjustment to a viscosity suitable for coating.

自由基聚合起始劑: 自由基聚合起始劑,具體為,使單官能基脂肪族(甲基)丙烯酸酯單體、及單官能基脂環式(甲基)丙烯酸酯單體、及單官能基高極性單體,例如經由光線進行光反應而使硬化之光自由基聚合起始劑為佳。藉由光硬化性組合物包含光自由基聚合起始劑,透過對光硬化性組合物照射光線,例如可使塗佈在塗膜形成對象物上的光硬化性組合物光硬化,形成塗膜。光自由基聚合起始劑可例如二苯基酮(benzophenone)類、噻吨(thioxanthene)類、苯乙酮(acetophenone)類、醯基膦(acylphosphine)類、肟酯(oxime ester)類、烷基酚(alkylphenol)類等的光聚合起始劑。光自由基聚合起始劑的添加量為,相對於包含單官能基及多官能基的所有單體的總含量100質量份,為0.1~10質量份為佳,為0.5~5質量份較佳。Free radical polymerization initiator: The radical polymerization initiator, specifically, is preferably a photoradical polymerization initiator that hardens a monofunctional aliphatic (meth)acrylate monomer, a monofunctional alicyclic (meth)acrylate monomer, and a monofunctional highly polar monomer, for example, by photoreaction with light. When the photocurable composition contains a photoradical polymerization initiator, by irradiating the photocurable composition with light, for example, the photocurable composition coated on the object to be coated can be photocured to form a coating film. The photoradical polymerization initiator may be, for example, photopolymerization initiators such as benzophenones, thioxanthenes, acetophenones, acylphosphines, oxime esters, and alkylphenols. The amount of the photoradical polymerization initiator added is preferably 0.1 to 10 parts by mass, more preferably 0.5 to 5 parts by mass, based on 100 parts by mass of the total content of all monomers including monofunctional groups and polyfunctional groups.

其他成份: 本發明之一實施形態之光硬化性組合物可在不脫離本發明之一實施形態之旨趣的範圍,進一步適當調配多種添加劑等的其他成份。例如二氧化矽、氧化鋁等的觸變劑、烯烴類油、石蠟類油等的可塑劑、矽烷耦合劑或聚合抑制劑、消泡劑、光安定劑、抗氧化劑、抗靜電劑、填充劑等。Other ingredients: In the photocurable composition of one embodiment of the present invention, other components such as various additives may be further appropriately formulated within a range not departing from the gist of one embodiment of the present invention. For example, thixotropic agents such as silica and alumina, plasticizers such as olefin oils and paraffin oils, silane coupling agents or polymerization inhibitors, defoamers, light stabilizers, antioxidants, antistatic agents, fillers, etc.

上述實施形態為本發明之一實施形態之例,在不脫離本發明旨趣的範圍,可對實施形態進行變更、或加上或組合公知技術等,這些技術也包含於本發明之範圍。 〔實施例〕The above-mentioned embodiment is an example of one embodiment of the present invention, and within the range not departing from the gist of the present invention, the embodiment can be changed, or known techniques can be added or combined, and these techniques are also included in the scope of the present invention. [Example]

以下基於實施例(比較例),進一步詳細說明本發明之一實施形態。製作以下樣本1~樣本29之光硬化性組合物及其硬化體,以下列評估方法進行評估。One embodiment of the present invention will be described in more detail below based on examples (comparative examples). The following photocurable compositions of Samples 1 to 29 and their hardened bodies were produced, and evaluated by the following evaluation methods.

〈樣本的製作〉 如下所示,製作樣本。〈Sample making〉 Make a sample as shown below.

樣本1: 準備丙烯酸酯類單體之丙烯酸十二烷酯、丙烯酸異莰酯、N-丙烯醯氧基乙基環己烷二甲醯亞胺、以及1,9-壬二醇二丙烯酸酯。接著,在上述單體添加熱塑性彈性體之SIBS(苯乙烯-異丁烯-苯乙烯嵌段共聚物)(商品名「SIBSTAR102T」,股份有限公司KANEKA製),攪拌24小時,使熱塑性彈性體溶解於上述單體。此時的調配比例如表1所示。接著,以上述單體和熱塑性彈性體所構成的「樹脂成分」為100質量份,於上述樹脂成分添加光自由基聚合起始劑之苯基雙(2,4,6-三甲基苯甲醯基)膦氧化物、和2-羥基-2-甲基苯丙酮分別為0.40質量份、3.60質量份的質量,獲得樣本1的光硬化性組合物。Sample 1: Lauryl acrylate, isocamphoryl acrylate, N-acryloxyethylcyclohexanedimethylimide, and 1,9-nonanediol diacrylate were prepared as acrylate-based monomers. Next, thermoplastic elastomer SIBS (styrene-isobutylene-styrene block copolymer) (trade name "SIBSTAR102T", manufactured by Kaneka Co., Ltd.) was added to the above-mentioned monomer, and stirred for 24 hours to dissolve the thermoplastic elastomer in the above-mentioned monomer. The deployment ratio at this time is shown in Table 1. Next, with 100 parts by mass of the "resin component" composed of the above-mentioned monomer and thermoplastic elastomer, 0.40 parts by mass and 3.60 parts by mass of phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide as a photoradical polymerization initiator and 2-hydroxy-2-methylpropiophenone were added to the resin component to obtain the photocurable composition of Sample 1.

將所得的樣本1之光硬化性組合物以後述條件照射紫外線,形成樣本1的硬化體之彈性保護元件。The obtained photocurable composition of Sample 1 was irradiated with ultraviolet rays under the following conditions to form an elastic protective member of a cured body of Sample 1.

樣本2~28: 除了將樣本1之熱塑性彈性體和各單體等,變更為表2~4所記載之種類及調配(質量份)以外,其餘同樣本1,製作樣本2~28的光硬化性組合物。對於樣本2~28的光硬化性組合物也同樣本1照射紫外線,在聚醯亞胺膜上形成樣本2~28的彈性保護元件。Samples 2 to 28: The photocurable compositions of samples 2 to 28 were prepared in the same manner as sample 1 except that the thermoplastic elastomer and monomers of sample 1 were changed to the types and formulations (parts by mass) listed in Tables 2 to 4. The photocurable compositions of samples 2 to 28 were similarly irradiated with ultraviolet rays to sample 1 to form elastic protective members of samples 2 to 28 on the polyimide film.

樣本29使用不含熱塑性彈性體、以聚氨酯甲基丙烯酸酯樹脂和(甲基)丙烯酸酯單體為主體之光硬化性組合物之Henkel Japan股份有限公司製的商品名「Loctite3523」。For sample 29, the product name "Loctite 3523" manufactured by Henkel Japan Co., Ltd., which is a photocurable composition mainly composed of a urethane methacrylate resin and a (meth)acrylate monomer, which does not contain a thermoplastic elastomer, was used.

以下於表1~4顯示樣本1~29之組成和評估結果。評估方法如後所述。The compositions and evaluation results of samples 1-29 are shown in Tables 1-4 below. The evaluation method will be described later.

[表1] [Table 1]

[表2] [Table 2]

[表3] [table 3]

[表4] [Table 4]

以下顯示表1~4所使用之原料。 〈熱塑性彈性體〉 SIBSTAR102T:商品名「SIBSTAR102T」,苯乙烯含量15質量%,重量平均分子量9萬,苯乙烯-異丁烯-苯乙烯嵌段共聚物,股份有限公司KANEKA製。 SIBSTAR103T:商品名「SIBSTAR103T」,苯乙烯含量30質量%,重量平均分子量9萬,苯乙烯-異丁烯-苯乙烯嵌段共聚物,股份有限公司KANEKA製。 SIBSTAR073T:商品名「SIBSTAR073T」,苯乙烯含量30質量%,重量平均分子量7萬,苯乙烯-異丁烯-苯乙烯嵌段共聚物,股份有限公司KANEKA製。 SEPTON2063:商品名「SEPTON2063」,苯乙烯含量13質量%,重量平均分子量12萬,苯乙烯-乙烯-戊烯-苯乙烯嵌段共聚物,股份有限公司KURARAY製。 EPFD AT501:商品名「EPFD AT501」,苯乙烯含量40質量%,重量平均分子量9萬,環氧基改性的苯乙烯-丁二烯-苯乙烯共聚物,股份有限公司DIACEL製。 多官能基聚合物〉 TE-2000:商品名「TE-2000」,末端導入甲基丙烯酸基的聚丁二烯(丙烯酸基當量2000),日本曹達股份有限公司製。The raw materials used in Tables 1-4 are shown below. 〈Thermoplastic elastomer〉 SIBSTAR102T: trade name "SIBSTAR102T", styrene content 15% by mass, weight average molecular weight 90,000, styrene-isobutylene-styrene block copolymer, manufactured by Kaneka Co., Ltd. SIBSTAR103T: trade name "SIBSTAR103T", styrene content 30% by mass, weight average molecular weight 90,000, styrene-isobutylene-styrene block copolymer, manufactured by Kaneka Co., Ltd. SIBSTAR073T: Trade name "SIBSTAR073T", styrene content 30% by mass, weight average molecular weight 70,000, styrene-isobutylene-styrene block copolymer, manufactured by Kaneka Co., Ltd. SEPTON2063: trade name "SEPTON2063", styrene content 13% by mass, weight average molecular weight 120,000, styrene-ethylene-pentene-styrene block copolymer, manufactured by KURARAY Co., Ltd. EPFD AT501: trade name "EPFD AT501", styrene content 40% by mass, weight average molecular weight 90,000, epoxy-modified styrene-butadiene-styrene copolymer, manufactured by DIACEL Co., Ltd. Multifunctional Polymers> TE-2000: trade name "TE-2000", polybutadiene (acrylic group equivalent weight 2000) with methacrylic group introduced at the terminal, manufactured by Nippon Soda Co., Ltd.

〈各種試驗和評估〉<Various tests and evaluations>

黏度(mPa・s): 使用旋轉式黏度計(Bohlin Instruments社製、Bohlin V88 Viscometer,Cone Plate「CP5°/30」),在23℃、107rpm測量未硬化時的光硬化性組合物的黏度。Viscosity (mPa・s): The viscosity of the uncured photocurable composition was measured at 23° C. and 107 rpm using a rotational viscometer (Bohlin Instruments, Bohlin V88 Viscometer, Cone Plate “CP5°/30”).

保存安定性: 將光硬化性組合物在25℃的環境下靜置2週,無法目視確認沉澱或分離者評估為「A」,可目視確認沉澱或分離者評估為「B」。Preserve stability: The photocurable composition was left to stand in an environment of 25° C. for 2 weeks, and the case where precipitation or separation could not be visually confirmed was rated as “A”, and the case where precipitation or separation was visually confirmed was rated as “B”.

拉伸斷裂伸長度 (%)、拉伸強度 (MPa)、100%拉伸伸長應力 (MPa)及楊氏模數(MPa): 硬化體的機械強度根據部分改變的JIS K 6251:2010進行測量。在矽離型處理過的聚酯膜上以厚度1mm塗佈光硬化性組合物,使用波長365nm的LED以200mW/cm2 紫外線照射15秒,使光硬化性組合物硬化,所得的硬化體以啞鈴狀8號型沖孔,在啞鈴狀的樣本的棒狀部位以間隔16mm的間隔標上標線,製作樣片。以速度200mm/min進行拉伸試驗,測量拉伸斷裂伸長度 (切斷時的伸長量)、拉伸強度 (最大拉伸應力)、100%拉伸伸長應力、楊氏模數 (彈性率)。分別適用下式(1)、式(2)、式(3),計算出拉伸斷裂伸長度、拉伸強度、100%拉伸伸長應力。楊氏模數以拉伸比例限度內的拉伸應力除以應變而求得。 TS=Fm/S ・・・式(1) Eb=(L1-L0)/L0×100 ・・・式(2) TS100=F100/S ・・・式(3) TS:拉伸強度(MPa) Fm:最大拉伸力(N) S:樣片的初期截面積(mm2 ) Eb:拉伸斷裂伸長度(%) L0:初期的標線間距(mm) L1:斷裂時的標線間距(mm) TS100:100%伸長拉伸應力(MPa) F100:100%伸長張力(N)Tensile elongation at break (%), tensile strength (MPa), 100% tensile elongation stress (MPa), and Young's modulus (MPa): The mechanical strength of the hardened body was measured in accordance with partially modified JIS K 6251:2010. Coat the photocurable composition with a thickness of 1mm on the polyester film treated with silicon release type, and use an LED with a wavelength of 365nm to irradiate with 200mW/ cm2 ultraviolet rays for 15 seconds to harden the photocurable composition. Tensile test was carried out at a speed of 200mm/min, and the tensile elongation at break (elongation at break), tensile strength (maximum tensile stress), 100% tensile elongation stress, and Young's modulus (elasticity) were measured. Apply the following formula (1), formula (2) and formula (3) respectively to calculate the tensile elongation at break, tensile strength, and 100% tensile elongation stress. The Young's modulus is obtained by dividing the tensile stress by the strain within the stretching ratio limit. TS=Fm/S ・・・Formula (1) Eb=(L1-L0)/L0×100 ・・・Formula (2) TS100=F100/S ・・・Formula (3) TS: Tensile strength (MPa) Fm: Maximum tensile force (N) S: Initial cross-sectional area of the sample (mm 2 ) Eb: Tensile elongation at break (%) L0: Initial distance between marking lines (mm) L1: Distance between marking lines at break (mm) TS100: 100% elongation tensile stress (MPa) F100: 100% elongation tension (N)

馬氏硬度(N/mm2 ): 使用奈米壓痕機(ELIONIX製,ENT-2100),進行硬化體的奈米壓痕試驗。樣片使用以下製作之硬化體:在厚度50μm的聚醯亞胺膜上塗佈光硬化性組合物成為厚度100μm,使用波長365nm的LED以照度200mW/cm2 紫外線照射15秒使硬化所得的硬化體。接著,使用上述奈米壓痕機,以壓入的最大負重0.1mN、壓入速度0.01 mN╱秒的條件,測量硬化體的馬氏硬度。結果,以5點測量的馬氏硬度的平均值為0.1 N/mm2 以上、0.3 N/mm2 以下的情形,記為「A」,大於0.3 N/mm2 、0.5 N/mm2 以下的情形,記為「B」,大於0.5 N/mm2 以上、1.0 N/mm2 以下的情形,記為「C」,超過1.0 N/mm2 的情形,記為「D」。Martens Hardness (N/mm 2 ): A nanoindentation test of the hardened body was performed using a nanoindenter (ENT-2100, manufactured by Elionix). The sample used was a hardened body prepared as follows: a photocurable composition was coated on a polyimide film with a thickness of 50 μm to a thickness of 100 μm, and the cured body was cured by irradiating ultraviolet rays with an illuminance of 200 mW/cm 2 for 15 seconds using an LED with a wavelength of 365 nm. Next, using the aforementioned nanoindenter, the Martens hardness of the hardened body was measured under the conditions of a maximum indentation load of 0.1 mN and an indentation speed of 0.01 mN/sec. As a result, when the average value of the Martens hardness measured at 5 points is between 0.1 N/mm 2 and 0.3 N/mm 2 , it is rated as "A", when it is more than 0.3 N/mm 2 and less than 0.5 N/mm 2 , it is rated as "B", when it is more than 0.5 N/mm 2 and 1.0 N/mm 2 , it is rated as "C", and when it exceeds 1.0 N/ mm 2 , it is rated as "D".

透濕度(g/m2 ・24hr): 根據JIS Z0208:1976,在矽離型處理過的聚酯膜上以厚度1mm塗佈樹脂組合物,使用波長365nm的LED,以200mW/cm2 紫外線照射15秒使硬化的硬化體的透濕度(水蒸氣透過率),在溫度40℃、相對濕度90%RH測量。透濕度的測量中,有樣本重量減少的情形時校正減少量。Moisture permeability (g/ m2・24hr): According to JIS Z0208: 1976, the resin composition is coated on a silicon release-treated polyester film with a thickness of 1mm, and the moisture permeability (water vapor transmission rate) of the hardened body is measured at a temperature of 40°C and a relative humidity of 90%RH using an LED with a wavelength of 365nm and irradiating with 200mW/ cm2 ultraviolet rays for 15 seconds to harden. In the measurement of water vapor transmission rate, if there is a case where the sample weight decreases, correct the decrease amount.

體積電阻率(Ω・m): 使用ADVANTEST製的數位萬用表R6871E測量體積電阻率。在矽離型處理過的聚酯膜上以厚度100μm塗佈光硬化性組合物,使用波長365nm的LED,以200mW/cm2 紫外線照射15秒使硬化的硬化體,進行測量,在測量的上限以上的電阻值的情形,評估為「A」,在測量範圍內的體積電阻率的情形,將其值記載於表中。Volume resistivity (Ω・m): Volume resistivity was measured using a digital multimeter R6871E manufactured by ADVANTEST. A photocurable composition was coated on a silicon release-treated polyester film with a thickness of 100 μm, and the cured body was cured by irradiating with 200 mW/ cm2 ultraviolet rays for 15 seconds using an LED with a wavelength of 365 nm. The resistance value above the upper limit of the measurement was evaluated as "A", and the volume resistivity within the measurement range was recorded in the table.

翹曲: 在厚度50μm的聚醯亞胺膜上塗佈光硬化性組合物成為厚度100μm,使用波長365nm的LED,以200mW/cm2 紫外線照射15秒使硬化。將此硬化體切成20mm×60mm,壓住長邊的一邊末端時,另一端沒有浮起者,評估為「A」,浮起者評估為「B」。Warpage: The photocurable composition was coated on a polyimide film with a thickness of 50 μm to a thickness of 100 μm, and cured by irradiating with 200 mW/cm 2 ultraviolet rays for 15 seconds using an LED with a wavelength of 365 nm. Cut this hardened body into 20mm×60mm, and when one end of the long side is pressed, if the other end does not float, the evaluation is "A", and the evaluation is "B" if the other end is floating.

剝離力(N/m): 以部份改變JIS K 6852-2:1999的180度剝離試驗方法進行測量。在厚度50μm的聚醯亞胺膜上以厚度1mm塗佈光硬化性組合物,使用波長365nm的LED,以200mW/cm2 紫外線照射15秒使硬化後,切成寬度26mm,以剝離速度300mm/min、剝離角度180度進行拉伸剝離,測量剝離力(接著強度)。Peel force (N/m): Measured by partially modifying the 180-degree peel test method of JIS K 6852-2:1999. A photocurable composition was coated on a polyimide film with a thickness of 50 μm in a thickness of 1 mm. Using an LED with a wavelength of 365 nm, it was irradiated with 200 mW/cm 2 ultraviolet rays for 15 seconds to harden, then cut into widths of 26 mm, and peeled off at a peeling speed of 300 mm/min and a peeling angle of 180 degrees to measure the peeling force (adhesion strength).

耐高溫高濕試驗:在厚度50μm的聚醯亞胺膜上以厚度1mm塗佈樹脂組合物,使用波長365nm的LED,以200mW/cm2紫外線照射15秒使硬化後,切成寬度26mm。將這些放在85℃、85%RH的高溫高濕下1000小時後,沒有浮起或剝落者,評估為「A」,可見浮起或剝落者,評估為「B」。 High temperature and high humidity resistance test: Coat the resin composition with a thickness of 1 mm on a polyimide film with a thickness of 50 μm, use an LED with a wavelength of 365 nm, irradiate it with 200 mW/cm 2 ultraviolet rays for 15 seconds to harden, and cut into a width of 26 mm. When these were left under high temperature and high humidity at 85° C. and 85% RH for 1,000 hours, those without floating or peeling were evaluated as “A”, and those with visible floating or peeling were evaluated as “B”.

修補試驗:在厚度50μm的聚醯亞胺膜上,塗佈樹脂組合物,形成厚度500μm、寬2mm,使用波長365nm的LED,以200mW/cm2紫外線照射15秒使硬化。將此硬化體從聚醯亞胺膜剝下之時,目視沒有碎裂而剝下者,評估為「A」,不能剝下者,評估為「B」。 Repair test: On a polyimide film with a thickness of 50 μm, a resin composition was coated to form a thickness of 500 μm and a width of 2 mm, and was cured by irradiating with 200 mW/cm 2 ultraviolet rays for 15 seconds using an LED with a wavelength of 365 nm. When the hardened body was peeled off from the polyimide film, the evaluation was "A" when it was peeled off without being cracked visually, and the evaluation was "B" when it could not be peeled off.

彎曲試驗(內側):圖4為彎曲試驗(內側)的測量方法的說明圖。在厚度50μm的聚醯亞胺膜50上塗佈光硬化性組合物成為厚度100μm,使用波長365nm的LED,以200mW/cm2紫外線照射15秒使硬化,獲得硬化體56。將此硬化體56切成26mm×40mm,在硬化體56的末端、26mm×5mm的範圍貼上厚度50μm的雙面膠帶54,貼在厚度1mm的玻璃基板52的末端,製作樣片(S100)。在樣片中,以硬化體56為內側,以負重50g向玻璃基板52的非黏著膠帶側彎曲時(S102),測量從玻璃基板52的末端突出的突出寬度40(亦即,從玻璃基板52的末端伸出的「伸出長度」)(S104)。突出寬度(伸出長度)小於400μm者,評估為「A」,400μm以上、小於500μm者,評估為「B」,500μm以上者,評估為「C」。 Bending test (inner side): FIG. 4 is an explanatory diagram of a measurement method of the bending test (inner side). The photocurable composition was coated on the polyimide film 50 with a thickness of 50 μm to a thickness of 100 μm, and cured by irradiating with 200 mW/cm 2 ultraviolet rays for 15 seconds using an LED with a wavelength of 365 nm to obtain a cured body 56 . This cured body 56 is cut into 26 mm x 40 mm, and a double-sided adhesive tape 54 with a thickness of 50 μm is pasted on the end of the hardened body 56 in the range of 26 mm x 5 mm, and then attached to the end of the glass substrate 52 with a thickness of 1 mm to make a sample (S100). When the sample piece is bent toward the non-adhesive tape side of the glass substrate 52 with the hardened body 56 as the inner side with a load of 50 g (S102), the protrusion width 40 protruding from the end of the glass substrate 52 (that is, the "protrusion length" protruding from the end of the glass substrate 52) is measured (S104). If the protrusion width (protrusion length) is less than 400 μm, the evaluation is “A”, if it is more than 400 μm but less than 500 μm, it is evaluated as “B”, and if it is more than 500 μm, it is evaluated as “C”.

彎曲試驗(外側):圖5為彎曲試驗(外側)的測量方法的說明圖。在厚度50μm的聚醯亞胺膜50上塗佈光硬化性組合物成為厚度100μm,使用波長365nm的LED,以200mW/cm2紫外線照射15秒使硬化,獲得硬化體56。將此硬化體56切成26mm×40mm,在聚 醯亞胺膜50的末端、26mm×5mm的範圍,貼上厚度50μm的雙面膠帶54,貼在厚度1mm的玻璃基板52的末端,製作樣片(S200)。在樣片中,以聚醯亞胺膜50為內側,以負重50g向玻璃基板52的非黏著膠帶側彎曲時(S202),測量從玻璃基板52的末端伸出的「伸出長度」(S204)。突出寬度40(伸出長度)小於400μm者,評估為「A」,400μm以上、小於500μm者,評估為「B」,500μm以上者,評估為「C」。 Bending test (outer side): FIG. 5 is an explanatory diagram of a measurement method of the bending test (outer side). The photocurable composition was coated on the polyimide film 50 with a thickness of 50 μm to a thickness of 100 μm, and cured by irradiating with 200 mW/cm 2 ultraviolet rays for 15 seconds using an LED with a wavelength of 365 nm to obtain a cured body 56 . This cured body 56 is cut into 26 mm x 40 mm, and a double-sided adhesive tape 54 with a thickness of 50 μm is pasted on the end of the polyimide film 50 within a range of 26 mm x 5 mm, and attached to the end of the glass substrate 52 with a thickness of 1 mm to make a sample (S200). In the sample piece, when the polyimide film 50 is inside and the glass substrate 52 is bent toward the non-adhesive tape side with a load of 50 g (S202), the "protrusion length" protruding from the end of the glass substrate 52 is measured (S204). If the protrusion width 40 (extrusion length) is less than 400 μm, the evaluation is “A”, if it is more than 400 μm but less than 500 μm, it is evaluated as “B”, and if it is more than 500 μm, it is evaluated as “C”.

耐彎曲試驗:使用圖6及圖7,說明耐彎曲試驗。如圖6所示,在厚度50μm的聚醯亞胺膜50上塗佈光硬化性組合物成為厚度1mm,使用波長365nm的LED,以200mW/cm2紫外線照射15秒使硬化,獲得硬化體56。之後,如圖7所示,將此硬化體56切成20mm×100mm,在切出的樣片的一末端附上1kg的錘。從錘的相反側的一端,捏住20mm,進行180。來回彎曲試驗。亦即,以彎曲角180。、曲率半徑10mm以下,以硬化體56為內側彎曲後(圖7的左側圖),再以硬化體56為外側彎曲的狀態(圖7的右側圖),為1次循環,進行100次循環後目視觀察彎曲部分。評估基準如下所示。 Bending resistance test: The bending resistance test will be described using FIGS. 6 and 7 . As shown in FIG. 6 , a photocurable composition was coated on a polyimide film 50 with a thickness of 50 μm to a thickness of 1 mm, and cured by irradiating ultraviolet light at 200 mW/cm 2 for 15 seconds using an LED with a wavelength of 365 nm to obtain a cured body 56 . Thereafter, as shown in FIG. 7 , this hardened body 56 was cut into 20 mm×100 mm, and a 1 kg hammer was attached to one end of the cut sample. From one end on the opposite side of the hammer, pinch 20mm and do 180. Back and forth bending test. That is, at a bend angle of 180°. , The radius of curvature is less than 10 mm. After the hardening body 56 is bent inside (the left side figure of FIG. 7 ), the state of the hardening body 56 being bent outside (the right side figure of FIG. 7 ) is 1 cycle, and the curved part is visually observed after 100 cycles. The evaluation benchmarks are as follows.

A:沒有裂紋,也沒有剝離。 A: There is no crack and no peeling.

B:沒有裂紋,有剝離。 B: No cracks, but peeling.

C:有裂紋,沒有剝離。 C: There are cracks and no peeling.

D:有裂紋,也有剝離。 D: There are cracks and peeling.

光透過率(%):對於各樣本,準備一對玻璃板,一個玻璃板塗佈光硬化性組合物,以另一個玻璃板夾住,硬化形成厚度0.5mm,製作由一對玻璃板夾住硬化體的樣片。在此,樣片為以玻璃板夾住的結構是因為當硬化體表面有漫反射時會影響透過率的緣故。接著,對於各樣片,使用紫外可見光分光光度計(股份有限公司島津製作所製「UV-1600」),測量在波長550nm的平行光透過率(光透過率)。Light transmittance (%): For each sample, a pair of glass plates was prepared, one glass plate was coated with a photocurable composition, sandwiched by another glass plate, and hardened to a thickness of 0.5mm, and a sample piece was prepared in which the hardened body was sandwiched by a pair of glass plates. Here, the reason why the sample is sandwiched by glass plates is that the transmittance will be affected when the surface of the hardened body has diffuse reflection. Next, the parallel light transmittance (light transmittance) at a wavelength of 550 nm was measured for each sample sheet using an ultraviolet-visible spectrophotometer (“UV-1600” manufactured by Shimadzu Corporation).

絕緣信賴性試驗: 在玻璃環氧樹脂基板具有配線間隔0.318mm的銅配線之JIS2型梳形基板,以厚度100μm塗佈樹脂組合物,使用波長365nm的LED,以200mW/cm2 紫外線照射15秒使硬化,製作樣片。在85℃、85%RH的環境下,對基板施加50V電壓120小時。Insulation reliability test: A JIS2-type comb-shaped substrate with copper wiring at a wiring interval of 0.318 mm is applied to a glass epoxy resin substrate with a resin composition at a thickness of 100 μm. Using an LED with a wavelength of 365 nm, irradiate with 200 mW/cm 2 ultraviolet rays for 15 seconds to harden and make a sample. In an environment of 85° C. and 85% RH, a voltage of 50 V was applied to the substrate for 120 hours.

又上述所有試驗中,光硬化性組合物的「厚度」為硬化後的厚度。In all the above tests, the "thickness" of the photocurable composition is the thickness after hardening.

〈試驗結果之分析〉<Analysis of test results>

對於樣本1~29,取楊氏模數於橫座標,剝離力於縱座標,將楊氏模數和剝離力的關係作圖,如圖8所示。考量彎曲試驗(內側)、彎曲試驗(外側)、及耐彎曲試驗的結果,從圖8的圖可知,光硬化性組合物的硬化體或彈性保護元件的剝離力F具有下列(1)式的關係。 F>100×ln(E)+250・・・(1) 式中,F:剝離力(N/m),E:楊氏模數(MPa)For samples 1-29, take Young's modulus on the abscissa and peel force on the ordinate, and plot the relationship between Young's modulus and peel force, as shown in Figure 8. Considering the results of the bending test (inner side), the bending test (outer side), and the bending resistance test, it can be seen from the graph in FIG. 8 that the peeling force F of the hardened body of the photocurable composition or the elastic protection member has the following relationship of (1). F>100×ln(E)+250・・・(1) In the formula, F: peeling force (N/m), E: Young's modulus (MPa)

上述彈性保護元件的剝離力F因為具有上列(1)式關係,從剛性基板的末端彎曲可撓性基板時,和習知者相比,保護元件不會從剛性基板及可撓性基板剝落,可縮小可撓性基板的曲率半徑。結果,和習知者相比,從上述剛性基板末端在外側突出的上述可撓性基板的彎曲部位的突出寬度變小,且可成為耐久性優良者。Since the peeling force F of the above-mentioned elastic protection element has the relationship of the above formula (1), when the flexible substrate is bent from the end of the rigid substrate, the protection element will not peel off from the rigid substrate and the flexible substrate compared with conventional ones, and the radius of curvature of the flexible substrate can be reduced. As a result, the protruding width of the bent portion of the flexible substrate protruding outward from the end of the rigid substrate becomes smaller than that of conventional ones, and can be excellent in durability.

又,對於樣本1~29,取楊氏模數於橫座標,剝離力於縱座標,將楊氏模數和剝離力的關係作圖,如圖8所示。考量修補試驗的結果,從圖8的圖可知,光硬化性組合物的硬化體的剝離力F具有下列(2)式的關係。 F<100×ln(E)+760 ・・・(2) F:剝離力(N/m),E:楊氏模數(MPa)Also, for samples 1-29, take Young's modulus on the abscissa and peel force on the ordinate, and plot the relationship between Young's modulus and peel force, as shown in FIG. 8 . Considering the results of the repair test, it can be seen from the graph of FIG. 8 that the peeling force F of the hardened body of the photocurable composition has the relationship of the following formula (2). F<100×ln(E)+760・・・(2) F: peel force (N/m), E: Young's modulus (MPa)

上述光硬化性組合物的硬化後的硬化體的剝離力F,由於具有上列(2)式的關係,使上述光硬化性組合物硬化所得的硬化體,對剛性基板及可撓性基板沒有超過必要以上的強附著,因此提高電子基板對可撓性基板變形的耐久性,且可從基板撕下,修補性優良。The peeling force F of the cured body of the photocurable composition after curing has the relationship of the above formula (2), and the cured body obtained by curing the photocurable composition does not have more than necessary strong adhesion to the rigid substrate and the flexible substrate. Therefore, the durability of the electronic substrate against the deformation of the flexible substrate is improved, and it can be torn from the substrate and has excellent repairability.

再者,對於樣本1~29,取楊氏模數於橫座標,剝離力於縱座標,將楊氏模數和剝離力的關係作圖,如圖9所示。考量彎曲試驗(內側)、彎曲試驗(外側)、及耐彎曲試驗的結果,從圖9的圖可知,光硬化性組合物的硬化體,楊氏模數E(MPa)為1.0≦E≦3.0、剝離力F(N/m)為250≦F≦800的範圍C特佳,楊氏模數E(MPa)為0.3≦E≦1.0、剝離力F(N/m)為140≦F≦740的範圍B更佳,楊氏模數E(MPa)為0.1≦E≦0.3、剝離力F(N/m)為80≦F≦550的範圍A更佳。使用具有上述範圍C性質的彈性保護元件,由於曲率半徑縮小而應力變大,但耐高強度摩擦,適合大型的基板、或施加振動等的衝擊之用途。另一方面,使用具有上述範圍A性質的彈性保護元件,可以弱應力縮小曲率半徑。因此,對可撓性基板或剛性基板的負荷小,例如較佳適合用於容易破損的玻璃基板或薄型基板之時。因此,特別是高水平、小型化、共邊框化的情形,以具有範圍A的性質者為佳。另一方面,範圍B為具有中間性質的彈性保護元件,以容易用於廣泛用途的觀點為佳。又,樣本25的樣片硬脆,無法測量楊氏模數。樣本23、27的樣片在剝離中硬化體碎裂,無法測量剝離力。Furthermore, for samples 1-29, take Young's modulus on the abscissa and peel force on the ordinate, and plot the relationship between Young's modulus and peel force, as shown in FIG. 9 . Considering the results of the bending test (inner side), bending test (outer side), and bending resistance test, it can be seen from the graph in Fig. 9 that the cured body of the photocurable composition has a Young's modulus E (MPa) of 1.0≦E≦3.0 and a peeling force F (N/m) of 250≦F≦800. The Young's modulus E (MPa) of 0.3≦E≦1.0 and the peeling force F (N/m) of 140≦F≦740 The range B is more preferable, and the range A in which the Young's modulus E (MPa) is 0.1≦E≦0.3 and the peeling force F (N/m) is 80≦F≦550 is more preferable. Using an elastic protection element with the properties of the above-mentioned range C, the stress becomes larger due to the reduction of the radius of curvature, but it is resistant to high-strength friction, and is suitable for large-scale substrates or applications where shocks such as vibration are applied. On the other hand, using the elastic protective member having the properties of the above-mentioned range A, the radius of curvature can be reduced with weak stress. Therefore, the load on a flexible substrate or a rigid substrate is small, and it is suitable for a glass substrate or a thin substrate that is easily broken, for example. Therefore, especially in the case of high level, miniaturization, and common frame, it is better to have the properties of the range A. On the other hand, range B is an elastic protection element having intermediate properties, and is preferable from the viewpoint of being easy to use in a wide range of applications. Also, the sample piece of sample 25 was hard and brittle, and the Young's modulus could not be measured. The specimens of samples 23 and 27 were cracked during peeling, and the peeling force could not be measured.

黏度: 看到熱塑性彈性體的濃度15質量%以下的樣本,單官能基高極性單體和多官能基單體的總和為12.75質量%以上的樣本13、18、20、26,黏度稍稍變高。另一方面,可知其餘的樣本黏性低、受到抑制。Viscosity: It was observed that the viscosity of samples 13, 18, 20, and 26 in which the concentration of the thermoplastic elastomer was 15% by mass or less and the sum of the monofunctional highly polar monomer and the polyfunctional monomer was 12.75% by mass or more was slightly higher. On the other hand, it can be seen that the remaining samples have low viscosity and are suppressed.

馬氏硬度(N/mm2 ): 對於樣本1~29,看到馬氏硬度和剝離力的關係,考量彎曲試驗(內側)、彎曲試驗(外側)、及耐彎曲試驗的結果可知,光硬化性組合物的硬化後的硬化體,馬氏硬度為「A」的樣本,除了柔軟性外,100%拉伸伸長應力的值也小,伸長性優良,因此即使設置在彎曲的內側或者外側,也可以小的應力彎曲,而且彎曲後回復力(斥力)也小,從這些點來看為佳。Martens hardness (N/mm 2 ): For samples 1 to 29, the relationship between the Martens hardness and the peeling force can be seen. Considering the results of the bending test (inside), bending test (outside), and bending resistance test, it can be seen that the cured product of the light-curable composition has a Martens hardness of "A". In addition to flexibility, the value of the 100% tensile elongation stress is also small, and the elongation is excellent. ) are also small, which is better from these points of view.

又,馬氏硬度為0.1 N/mm2 以上、0.3 N/mm2 以下時,剝離力F(N/m)為80<F<556的範圍。馬氏硬度大於0.3 N/mm2 以上、0.5 N/mm2 以下時,剝離力F(N/m)為200<F<896的範圍。In addition, when the Martens hardness is not less than 0.1 N/mm 2 and not more than 0.3 N/mm 2 , the peeling force F (N/m) is in the range of 80<F<556. When the Martens hardness is more than 0.3 N/mm 2 and less than 0.5 N/mm 2 , the peeling force F (N/m) is in the range of 200<F<896.

翹曲: 樣本26、28觀察到翹曲。和其他樣本相比,可知樣本26、28的多官能基單體或多官能基聚合物的含量多,而且楊氏模數為3MPa以上的大者。warping: Warpage was observed for samples 26, 28. Compared with other samples, it can be seen that samples 26 and 28 contain more polyfunctional monomers or polyfunctional polymers, and the Young's modulus is larger than 3 MPa.

光透過率(%): 軟段的質量比例為87質量%的SEPS之樣本7的光透過率為95%。另一方面,其餘的樣本的透過率為86%以下,硬化體可見到白色混濁,光透過性差。Light transmittance (%): The light transmittance of sample 7 in which the mass ratio of the soft segment was 87% by mass of SEPS was 95%. On the other hand, the transmittance of the other samples was 86% or less, and the cured body was cloudy white, showing poor light transmittance.

絕緣信賴性試驗: 所有的本發明之一實施形態之光硬化性組合物,皆未看到銅配線的短路。另一方面,樣本29的銅配線的表面變色呈褐色。Insulation reliability test: In all the photocurable compositions according to one embodiment of the present invention, no short circuit of copper wiring was observed. On the other hand, the surface of the copper wiring of sample 29 was discolored and turned brown.

10:電子基板 12:剛性基板 12a:偏光板 12b:帶有第1透明電極的玻璃基板 12c:液晶層 12d:帶有第2透明電極的玻璃基板 12e:偏光板 12f:背光元件 13:封裝材料 14:可撓性基板 15:異方性導電膜 16:彎曲部位 20a,20b:彈性保護元件 30a,30b:跨界區域 40:突出寬度10: Electronic substrate 12: Rigid substrate 12a: polarizer 12b: a glass substrate with a first transparent electrode 12c: liquid crystal layer 12d: a glass substrate with a second transparent electrode 12e: polarizer 12f: Backlight component 13: Encapsulation material 14: Flexible substrate 15: Anisotropic conductive film 16: Bending part 20a, 20b: Elastic protection elements 30a, 30b: Transboundary area 40: protruding width

〔圖1〕為本發明之一實施態樣之電子基板之斜視圖。 〔圖2〕為沿著圖1的I-I線的剖面,為說明可撓性基板和硬化體的結構之部份放大剖面圖。 〔圖3〕為沿著圖1的I-I線的剖面,為說明彎曲可撓性基板的狀態之部份放大剖面圖。 〔圖4〕為本說明書中的實施例之評估方法之一,為說明彎曲使形成作為彈性保護元件而作用的硬化體的表面成為內側之彎曲試驗方法的說明圖。 〔圖5〕為本說明書中的實施例之評估方法之一,為說明彎曲使形成作為彈性保護元件而作用的硬化體的表面成為外側之彎曲試驗方法的說明圖。 〔圖6〕為說明提供於本說明書中的實施例之評估方法之一的耐彎曲試驗的樣片的結構之概略結構圖。 〔圖7〕為說明耐彎曲試驗的概略之說明圖。 〔圖8〕為顯示彈性保護元件之楊氏模數和剝離力的關係圖。 〔圖9〕為分類區分彈性保護元件之楊氏模數和剝離力的關係、規定範圍之圖。[FIG. 1] is a perspective view of an electronic substrate according to an embodiment of the present invention. [FIG. 2] is a section along line II of FIG. 1, and is a partially enlarged sectional view illustrating the structure of the flexible substrate and the hardened body. [FIG. 3] is a partially enlarged sectional view taken along line II of FIG. 1 and illustrating a state in which the flexible substrate is bent. [ Fig. 4 ] is an explanatory diagram illustrating a bending test method in which the surface forming the hardened body functioning as an elastic protective member is turned inside, which is one of the evaluation methods of the examples in this specification. [ Fig. 5 ] is an explanatory diagram for explaining a bending test method in which the surface of the hardened body serving as an elastic protective element is turned outward by bending, which is one of the evaluation methods of the examples in this specification. [ FIG. 6 ] is a schematic structural diagram illustrating the structure of a sample piece in a bending resistance test, which is one of the evaluation methods of the examples provided in this specification. [ Fig. 7 ] is an explanatory diagram illustrating an outline of a bending resistance test. [FIG. 8] is a graph showing the relationship between the Young's modulus and the peeling force of the elastic protective member. [Fig. 9] is a graph showing the relationship between the Young's modulus and the peeling force of the elastic protection elements and the specified range.

10:電子基板 10: Electronic substrate

12:剛性基板 12: Rigid substrate

14:可撓性基板 14: Flexible substrate

16:彎曲部位 16: Bending part

Claims (7)

一種電子基板,具有剛性基板、及從上述剛性基板的末端延伸、可導通連接的可撓性基板之電子基板,其特徵在於,從上述可撓性基板末端、在上述可撓性基板的彎曲部位的至少一表面,設置彈性保護元件,在上述可撓性基板從上述剛性基板的末端突出、向上述剛性基板的一表面側彎曲之時,從上述剛性基板末端突出的上述可撓性基板的彎曲部位的突出寬度為100~400μm,上述彈性保護元件以奈米壓痕試驗測量的馬氏硬度為0.1~0.5N/mm2An electronic substrate having a rigid substrate and an electronic substrate extending from the end of the rigid substrate and a flexible substrate that can be conductively connected, characterized in that an elastic protection element is provided from the end of the flexible substrate on at least one surface of the bending portion of the flexible substrate, and when the flexible substrate protrudes from the end of the rigid substrate and bends toward one surface side of the rigid substrate, the protrusion width of the bending portion of the flexible substrate protruding from the end of the rigid substrate is 100 to 400 μm, The above elastic protection element has a Martens hardness of 0.1-0.5 N/mm 2 measured by a nano-indentation test. 如請求項1之電子基板,其中,上述彈性保護元件的剝離力F顯示下列(1)式的關係,F>100×ln(E)+250‧‧‧(1)式中,F:剝離力(N/m),E:楊氏模數(MPa)。 Such as the electronic substrate of claim 1, wherein the peeling force F of the above-mentioned elastic protection element shows the relationship of the following formula (1), F>100×ln(E)+250‧‧‧(1) In the formula, F: peeling force (N/m), E: Young’s modulus (MPa). 如請求項1之電子基板,其中,上述可撓性基板為具有15~200μm厚度的樹脂膜,在彎曲上述可撓性基板時,在上述可撓性基板的彎曲內面,設置配線體。 The electronic substrate according to claim 1, wherein the flexible substrate is a resin film having a thickness of 15-200 μm, and when the flexible substrate is bent, a wiring body is provided on the curved inner surface of the flexible substrate. 一種光硬化性組合物,其為經由塗佈於電子基板後照射光而使硬化,形成彈性保護層之光硬化性組合物,其特徵在於,包含單官能基脂環式(甲基)丙烯酸酯單體、單官能基脂肪族(甲基)丙烯酸酯單體、單官能基高極性單體、熱塑性彈性體、及自由基聚合起始劑,未硬化時的黏度為10~5000mPa‧s的範圍,硬化後的硬化體以奈米壓痕試驗測量的馬氏硬度為0.1~0.5N/mm2的範圍。 A photocurable composition, which is hardened by being coated on an electronic substrate and then irradiated with light to form an elastic protective layer, is characterized in that it contains a monofunctional alicyclic (meth)acrylate monomer, a monofunctional aliphatic (meth)acrylate monomer, a monofunctional highly polar monomer, a thermoplastic elastomer, and a radical polymerization initiator. The hardness is in the range of 0.1~0.5N/mm 2 . 如請求項4之光硬化性組合物,其中,上述光硬化性組合物的 硬化後的硬化體的剝離力F顯示下列(1)式的關係,F>100×ln(E)+250‧‧‧(1)式中,F:剝離力(N/m),E:楊氏模數(MPa)。 As the photocurable composition of claim 4, wherein, the above photocurable composition The peeling force F of the hardened body after hardening shows the relationship of the following formula (1), F>100×ln(E)+250‧‧‧(1) In the formula, F: peeling force (N/m), E: Young’s modulus (MPa). 如請求項4之光硬化性組合物,其中,上述光硬化性組合物的硬化後的硬化體的剝離力F顯示下列(2)式的關係,F<100×ln(E)+760‧‧‧(2)F:剝離力(N/m)E:楊氏模數(MPa)。 Such as the photocurable composition of claim 4, wherein the peeling force F of the hardened body of the above photocurable composition shows the relationship of the following formula (2), F<100×ln(E)+760‧‧‧(2) F: peeling force (N/m) E: Young's modulus (MPa). 如請求項1~3中任一項之電子基板,其係在上述剛性基板和上述可撓性基板的跨界區域塗佈請求項4~6任一項之光硬化性組合物而成。 The electronic substrate according to any one of claims 1 to 3, which is formed by coating the photocurable composition according to any one of claims 4 to 6 on the cross-border region between the above-mentioned rigid substrate and the above-mentioned flexible substrate.
TW109104961A 2019-02-28 2020-02-17 Electronic substrate and photocurable composition TWI808307B (en)

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TW201800507A (en) * 2016-03-04 2018-01-01 東友精細化工有限公司 Hard coating film

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