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TWI800855B - 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法 - Google Patents

具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法 Download PDF

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Publication number
TWI800855B
TWI800855B TW110123295A TW110123295A TWI800855B TW I800855 B TWI800855 B TW I800855B TW 110123295 A TW110123295 A TW 110123295A TW 110123295 A TW110123295 A TW 110123295A TW I800855 B TWI800855 B TW I800855B
Authority
TW
Taiwan
Prior art keywords
extreme ultraviolet
pattern onto
lithography system
ultraviolet lithography
dense line
Prior art date
Application number
TW110123295A
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English (en)
Other versions
TW202141208A (zh
Inventor
麥可 Ｂ 賓納德
Original Assignee
日商尼康股份有限公司
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Publication of TW202141208A publication Critical patent/TW202141208A/zh
Application granted granted Critical
Publication of TWI800855B publication Critical patent/TWI800855B/zh

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TW110123295A 2016-06-20 2017-06-20 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法 TWI800855B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662352545P 2016-06-20 2016-06-20
US62/352,545 2016-06-20

Publications (2)

Publication Number Publication Date
TW202141208A TW202141208A (zh) 2021-11-01
TWI800855B true TWI800855B (zh) 2023-05-01

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TW110123295A TWI800855B (zh) 2016-06-20 2017-06-20 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法
TW106120526A TWI734799B (zh) 2016-06-20 2017-06-20 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法

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TW106120526A TWI734799B (zh) 2016-06-20 2017-06-20 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法

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TW (2) TWI800855B (zh)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI301565B (en) * 2005-05-24 2008-10-01 Asml Netherlands Bv Lithographic apparatus and lithographic product produced thereby
CN102043348A (zh) * 2009-10-21 2011-05-04 Asml荷兰有限公司 光刻设备、器件制造方法及施加图案至衬底的方法
US8133661B2 (en) * 2009-10-21 2012-03-13 Taiwan Semiconductor Manufacturing Company, Ltd. Superimpose photomask and method of patterning
CN102645849A (zh) * 2011-02-22 2012-08-22 Asml荷兰有限公司 光刻设备和光刻投影方法
CN102681167A (zh) * 2011-02-18 2012-09-19 Asml荷兰有限公司 光学设备、扫描方法、光刻设备和器件制造方法
TWI417679B (zh) * 2009-10-28 2013-12-01 Ａｓｍｌ荷蘭公司 微影裝置及圖案化元件
US8717536B2 (en) * 2010-02-19 2014-05-06 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
US9140996B2 (en) * 2005-11-16 2015-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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Publication number Priority date Publication date Assignee Title
US5739899A (en) * 1995-05-19 1998-04-14 Nikon Corporation Projection exposure apparatus correcting tilt of telecentricity
JP2004072076A (ja) * 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
JP2012133280A (ja) * 2010-12-24 2012-07-12 Mejiro Precision:Kk 基板パターンの製造方法及び露光装置
JP5886979B2 (ja) * 2011-11-29 2016-03-16 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の所望のデバイスパターンのベクタ形式表現を変換する装置および方法、プログラマブルパターニングデバイスにデータを供給する装置および方法、リソグラフィ装置、デバイス製造方法
DE102013219986A1 (de) * 2013-10-02 2015-04-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
US9645496B2 (en) * 2014-08-08 2017-05-09 David A. Markle Maskless digital lithography systems and methods with image motion compensation

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI301565B (en) * 2005-05-24 2008-10-01 Asml Netherlands Bv Lithographic apparatus and lithographic product produced thereby
US9140996B2 (en) * 2005-11-16 2015-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102043348A (zh) * 2009-10-21 2011-05-04 Asml荷兰有限公司 光刻设备、器件制造方法及施加图案至衬底的方法
US8133661B2 (en) * 2009-10-21 2012-03-13 Taiwan Semiconductor Manufacturing Company, Ltd. Superimpose photomask and method of patterning
TWI417679B (zh) * 2009-10-28 2013-12-01 Ａｓｍｌ荷蘭公司 微影裝置及圖案化元件
US8717536B2 (en) * 2010-02-19 2014-05-06 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
CN102681167A (zh) * 2011-02-18 2012-09-19 Asml荷兰有限公司 光学设备、扫描方法、光刻设备和器件制造方法
CN102645849A (zh) * 2011-02-22 2012-08-22 Asml荷兰有限公司 光刻设备和光刻投影方法
JP5638550B2 (ja) * 2011-02-22 2014-12-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ投影方法

Also Published As

Publication number Publication date
TW201809922A (zh) 2018-03-16
TW202141208A (zh) 2021-11-01
TWI734799B (zh) 2021-08-01

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