TWI897133B - Power module structure - Google Patents
Power module structureInfo
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- TWI897133B TWI897133B TW112147354A TW112147354A TWI897133B TW I897133 B TWI897133 B TW I897133B TW 112147354 A TW112147354 A TW 112147354A TW 112147354 A TW112147354 A TW 112147354A TW I897133 B TWI897133 B TW I897133B
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Abstract
Description
本揭露係有關於一種功率模組結構,特別是有關於一種於晶片下方設置有金屬導熱材的功率模組結構。The present disclosure relates to a power module structure, and more particularly to a power module structure with a metal heat conducting material disposed below a chip.
目前,在功率模組中,經常使用陶瓷基板作為晶片載台。然而,在設置高功率晶片的情況下,下方的陶瓷基板容易產生局部熱點使熱不易散失。Currently, ceramic substrates are often used as chip carriers in power modules. However, when high-power chips are placed on the substrate, localized hot spots can form on the underlying ceramic substrate, making it difficult for heat to dissipate.
根據本揭露的一實施例,提供一種功率模組結構,包括:一基板;一銅層,設置於該基板上;一金屬層,設置於該銅層上,其中該金屬層的面積小於該銅層的面積;以及一晶片,設置於該金屬層上,其中該晶片的面積小於該金屬層的面積。According to one embodiment of the present disclosure, a power module structure is provided, comprising: a substrate; a copper layer disposed on the substrate; a metal layer disposed on the copper layer, wherein the area of the metal layer is smaller than the area of the copper layer; and a chip disposed on the metal layer, wherein the area of the chip is smaller than the area of the metal layer.
在部分實施例中,該基板的材料包括氧化鋁。在部分實施例中,該金屬層的材料包括銅、銀、或鋁。在部分實施例中,該金屬層的形狀包括矩形、圓形、多邊形、或梯形。在部分實施例中,該金屬層與該銅層接觸。在部分實施例中,該晶片包括功率元件。在部分實施例中,該晶片與該金屬層接觸。In some embodiments, the substrate comprises aluminum oxide. In some embodiments, the metal layer comprises copper, silver, or aluminum. In some embodiments, the metal layer has a rectangular, circular, polygonal, or trapezoidal shape. In some embodiments, the metal layer contacts the copper layer. In some embodiments, the chip comprises a power device. In some embodiments, the chip contacts the metal layer.
根據本揭露的一實施例,提供一種功率模組結構,包括:一基板;一銅層,設置於該基板上;一晶片,設置於該銅層上;以及一金屬層,設置於該銅層上,包圍該晶片,且該金屬層的面積小於該銅層的面積。According to one embodiment of the present disclosure, a power module structure is provided, comprising: a substrate; a copper layer disposed on the substrate; a chip disposed on the copper layer; and a metal layer disposed on the copper layer, surrounding the chip, wherein the area of the metal layer is smaller than the area of the copper layer.
在部分實施例中,該晶片與該金屬層的厚度不同。在部分實施例中,該晶片及該金屬層與該銅層接觸。在部分實施例中,該晶片與該金屬層接觸。In some embodiments, the chip and the metal layer have different thicknesses. In some embodiments, the chip and the metal layer are in contact with the copper layer. In some embodiments, the chip is in contact with the metal layer.
根據本揭露的一實施例,提供一種功率模組結構,包括:一基板;一銅層,設置於該基板上;一第一金屬層,設置於該銅層上,其中該第一金屬層的面積小於該銅層的面積;一第二金屬層,設置於該銅層上,其中該第二金屬層的面積小於該銅層的面積,且該第二金屬層與該第一金屬層分離設置;一第一晶片,設置於該第一金屬層上,其中該第一晶片的面積小於該第一金屬層的面積;以及一第二晶片,設置於該第二金屬層上,其中該第二晶片的面積小於該第二金屬層的面積。According to one embodiment of the present disclosure, a power module structure is provided, comprising: a substrate; a copper layer disposed on the substrate; a first metal layer disposed on the copper layer, wherein the area of the first metal layer is smaller than the area of the copper layer; a second metal layer disposed on the copper layer, wherein the area of the second metal layer is smaller than the area of the copper layer, and the second metal layer is disposed separately from the first metal layer; a first chip disposed on the first metal layer, wherein the area of the first chip is smaller than the area of the first metal layer; and a second chip disposed on the second metal layer, wherein the area of the second chip is smaller than the area of the second metal layer.
在部分實施例中,該第一金屬層與該第二金屬層的形狀包括矩形、圓形、多邊形、或梯形。在部分實施例中,該第一金屬層與該第二金屬層的形狀不同。在部分實施例中,該第一金屬層與該第二金屬層的厚度不同。在部分實施例中,該第一金屬層及該第二金屬層與該銅層接觸。在部分實施例中,該第一晶片與該第一金屬層接觸。在部分實施例中,該第二晶片與該第二金屬層接觸。In some embodiments, the first metal layer and the second metal layer have shapes including rectangles, circles, polygons, or trapezoids. In some embodiments, the first metal layer and the second metal layer have different shapes. In some embodiments, the first metal layer and the second metal layer have different thicknesses. In some embodiments, the first metal layer and the second metal layer are in contact with the copper layer. In some embodiments, the first chip is in contact with the first metal layer. In some embodiments, the second chip is in contact with the second metal layer.
一般來說,對於陶瓷基板的上銅層,需考量製程的蝕刻能力以及熱膨脹造成的翹曲問題,因此,在銅層厚度上需有所限制,然而,在設置高功率晶片的情況下,過薄的銅層會產生局部熱點,致熱不易散失。在本揭露功率模組結構中,於晶片下方(或周圍)額外設置具有高導熱性及導電性的金屬層,使基板上的銅層局部增厚,促使熱先均勻傳遞在金屬層上並擴大發熱面積後,再向下進行更有效率的熱傳遞。本揭露金屬層對於晶片來說屬於放大其熱源的附屬件,可達到均勻散熱及增加散熱面積的目的,並與基板上的銅層相接。Generally speaking, the copper layer on a ceramic substrate must consider the etching capability of the process and the warping caused by thermal expansion. Therefore, the thickness of the copper layer must be limited. However, when installing a high-power chip, an overly thin copper layer will generate local hot spots, making it difficult for heat to dissipate. In the power module structure disclosed herein, an additional metal layer with high thermal and electrical conductivity is provided below (or around) the chip, causing the copper layer on the substrate to be locally thickened. This allows heat to be evenly transferred to the metal layer and expand the heat dissipation area before being more efficiently transferred downward. The metal layer disclosed herein acts as an accessory for the chip, amplifying its heat source, achieving uniform heat dissipation and increasing the heat dissipation area, and is connected to the copper layer on the substrate.
本揭露利用面積大於熱源的金屬層與熱源接觸,使溫度均勻傳遞。所謂均勻傳遞是指使熱在金屬層中心點至邊緣之間有較小的溫差,即,金屬層趨於等溫的現象(形成均溫片)。此外,可藉由金屬層與上銅層的接合增加基板的抗彎強度,降低基板的翹曲程度。This disclosure utilizes a metal layer larger than the heat source, placed in contact with the heat source, to achieve uniform temperature transfer. Uniform heat transfer means a minimal temperature difference between the center and edge of the metal layer, creating a phenomenon where the metal layer tends to be isothermal (forming a temperature-stabilizing plate). Furthermore, the bonding between the metal layer and the upper copper layer increases the substrate's bending strength, reducing substrate warping.
本揭露金屬層可根據電路布局進行局部增厚,可同時於銅層上設置多個金屬層,且各個金屬層可根據產品需求設計成不同形狀及厚度。The metal layer disclosed herein can be locally thickened according to the circuit layout. Multiple metal layers can be simultaneously disposed on the copper layer, and each metal layer can be designed to have different shapes and thicknesses according to product requirements.
本揭露主要藉由在晶片與基板之間加入金屬層,使得晶片的熱源在傳遞的過程中先均勻散播,除可避免局部高溫的問題,亦可有效增加散熱面積使晶片降溫。綜合本揭露優點包括增加晶片散熱效果、降低基板翹曲程度、彈性增厚局部銅層、以及節省銅材使用等。This disclosure primarily involves adding a metal layer between the chip and substrate, allowing the heat from the chip to be evenly distributed during the transfer process. This not only avoids localized high temperatures but also effectively increases the heat dissipation area, cooling the chip. The advantages of this disclosure include increased chip heat dissipation, reduced substrate warping, flexible thickening of the local copper layer, and reduced copper material usage.
以下的揭露內容提供許多不同的實施例以實施本案的不同特徵。以下的揭露內容敘述各個構件及其排列方式的特定範例,以簡化說明。當然,這些特定的範例並非用以限定。例如,若是本揭露實施例敘述了一第一特徵部件形成於一第二特徵部件之上或上方,即表示其可能包含上述第一特徵部件與上述第二特徵部件是直接接觸的實施例,亦可能包含了有附加特徵部件形成於上述第一特徵部件與上述第二特徵部件之間,而使上述第一特徵部件與第二特徵部件可能未直接接觸的實施例。The following disclosure provides many different embodiments for implementing different features of the present invention. The following disclosure describes specific examples of various components and their arrangements to simplify the description. Of course, these specific examples are not intended to be limiting. For example, if the disclosed embodiments describe a first feature component formed on or above a second feature component, it may include embodiments in which the first feature component and the second feature component are in direct contact, and may also include embodiments in which additional feature components are formed between the first feature component and the second feature component, so that the first feature component and the second feature component may not be in direct contact.
應理解的是,額外的操作步驟可實施於所述方法之前、之間或之後,且在所述方法的其他實施例中,部分的操作步驟可被取代或省略。It should be understood that additional steps may be implemented before, during, or after the method, and in other embodiments of the method, some steps may be replaced or omitted.
此外,其中可能用到與空間相關用詞,例如「在…下方」、「下方」、「較低的」、「在…上方」、「上方」、「較高的」及類似的用詞,這些空間相關用詞係為了便於描述圖示中一個(些)元件或特徵部件與另一個(些)元件或特徵部件之間的關係,這些空間相關用詞包括使用中或操作中的裝置之不同方位,以及圖式中所描述的方位。當裝置被轉向不同方位時(旋轉45度或其他方位),則其中所使用的空間相關形容詞也將依轉向後的方位來解釋。在本揭露一些實施例中,關於接合、連接之用語例如「連接」、「互連」等,除非特別定義,否則可指兩個結構係直接接觸,或者亦可指兩個結構並非直接接觸,其中有其它結構設於此兩個結構之間。且此關於接合、連接之用語亦可包括兩個結構都可移動,或者兩個結構都固定之情況。In addition, spatially relative terms such as "below," "beneath," "lower," "above," "above," "higher," and similar terms may be used. These spatially relative terms are used to facilitate description of the relationship between one component or features and another component or features in the diagrams. These spatially relative terms include different orientations of the device in use or operation, as well as the orientations depicted in the drawings. When the device is rotated 45 degrees or in other orientations, the spatially relative adjectives used therein will also be interpreted based on the rotated orientation. In some embodiments of the present disclosure, terms such as "connected," "interconnected," and the like, unless otherwise specified, may refer to two structures being in direct contact, or may refer to two structures not being in direct contact but having another structure disposed therebetween. Furthermore, such terms may include situations where both structures are movable or both structures are fixed.
在說明書中,「約」、「大約」、「大抵」、「大致」、「實質上」、「相同」、「相似」之用語通常表示一特徵值在一給定值的正負15%之內,或正負10%之內,或正負5%之內,或正負3%之內,或正負2%之內,或正負1%之內,或正負0.5%之內的範圍。在此給定的數量為大約的數量,亦即,在沒有特定說明「約」、「大約」、「大抵」、「大致」、「實質上」的情況下,仍可隱含「約」、「大約」、「大抵」、「大致」、「實質上」之含義。In the specification, the terms "about," "approximately," "mostly," "substantially," "same," and "similar" generally indicate that a characteristic value is within plus or minus 15%, plus or minus 10%, plus or minus 5%, plus or minus 3%, plus or minus 2%, plus or minus 1%, or plus or minus 0.5% of a given value. The quantities given herein are approximate quantities, that is, in the absence of specific descriptions of "about," "approximately," "mostly," "substantially," the meanings of "about," "approximately," "mostly," "substantially" are implied.
應當理解的是,雖然本文使用術語「第一」、「第二」、「第三」等來描述不同的元件、部件、區域、層及/或區段,這些元件、部件、區域、層及/或區段不應當被這些術語所限制。這些術語可以僅被用於將一個元件、部件、區域、層或區段與另一元件、部件、區域、層或區段區分開來。因此,在不脫離本揭露的技術的前提下,以下討論的第一元件、部件、區域、層或區段可以被稱為第二元件、部件、區域、層或區段。It should be understood that although the terms "first," "second," "third," etc. are used herein to describe different elements, components, regions, layers, and/or sections, these elements, components, regions, layers, and/or sections should not be limited by these terms. These terms may only be used to distinguish one element, component, region, layer, or section from another element, component, region, layer, or section. Thus, a first element, component, region, layer, or section discussed below could be referred to as a second element, component, region, layer, or section without departing from the technology of the present disclosure.
除非另外定義,在此使用的全部用語(包括技術及科學用語)具有與此篇揭露所屬之一般技藝者所通常理解的相同涵義。能理解的是,這些用語,例如在通常使用的字典中定義的用語,應被解讀成具有與相關技術及本揭露的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本揭露實施例有特別定義。Unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It is understood that these terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with the background or context of the relevant technology and this disclosure, and should not be interpreted in an idealized or overly formal manner unless specifically defined in the present disclosure.
請參閱第1圖,根據本揭露的一實施例,提供一種功率模組結構10。第1圖為功率模組結構10的剖面示意圖。Referring to FIG. 1 , according to one embodiment of the present disclosure, a power module structure 10 is provided. FIG. 1 is a schematic cross-sectional view of the power module structure 10 .
如第1圖所示,功率模組結構10包括基板12、第一銅層14、第二銅層16、金屬層18、以及晶片20。第一銅層14設置於基板12的第一表面12a。第二銅層16設置於基板12的第二表面12b,第二表面12b相對於第一表面12a。金屬層18設置於第一銅層14上。晶片20設置於金屬層18上。值得注意的是,金屬層18的面積A1小於第一銅層14的面積A2,晶片20的面積A3小於金屬層18的面積A1。As shown in Figure 1, power module structure 10 includes a substrate 12, a first copper layer 14, a second copper layer 16, a metal layer 18, and a chip 20. First copper layer 14 is disposed on first surface 12a of substrate 12. Second copper layer 16 is disposed on second surface 12b of substrate 12, which is opposite first surface 12a. Metal layer 18 is disposed on first copper layer 14. Chip 20 is disposed on metal layer 18. It is noteworthy that area A1 of metal layer 18 is smaller than area A2 of first copper layer 14, and area A3 of chip 20 is smaller than area A1 of metal layer 18.
在部分實施例中,基板12的材料包括氧化鋁,但本揭露不限於此,其他適合的基板材料亦適用於本揭露。在部分實施例中,當基板12的材料為氧化鋁(陶瓷材料)時,由基板12、第一銅層14、以及第二銅層16組成的複合板材稱為陶瓷基板,作為晶片20的載台,具有高導熱及電絕緣的特性。In some embodiments, the material of substrate 12 includes aluminum oxide, but the present disclosure is not limited thereto; other suitable substrate materials are also applicable to the present disclosure. In some embodiments, when substrate 12 is made of aluminum oxide (a ceramic material), the composite material composed of substrate 12, first copper layer 14, and second copper layer 16 is called a ceramic substrate. This substrate serves as a carrier for chip 20 and has high thermal conductivity and electrical insulation properties.
在部分實施例中,金屬層18的材料包括具有高導熱性及導電性的金屬材料,例如,銅、銀、或鋁,但本揭露不限於此,其他適合的金屬材料亦適用於本揭露。在部分實施例中,金屬層18的形狀包括矩形、圓形、多邊形、或梯形,但本揭露不限於此,其他適合的金屬層形狀亦適用於本揭露。以下將配合圖式(第2A-2C圖),進一步說明金屬層18的形狀樣態。In some embodiments, the metal layer 18 is made of a metal material with high thermal and electrical conductivity, such as copper, silver, or aluminum, but the present disclosure is not limited thereto. Other suitable metal materials are also applicable to the present disclosure. In some embodiments, the metal layer 18 is shaped like a rectangle, a circle, a polygon, or a trapezoid, but the present disclosure is not limited thereto. Other suitable metal layer shapes are also applicable to the present disclosure. The shapes of the metal layer 18 are further described below with reference to the figures (Figures 2A-2C).
在部分實施例中,金屬層18與第一銅層14接觸(接合)。在部分實施例中,金屬層18與第一銅層14藉由錫焊接(soldering)或擴散焊接(diffusion bonding)等方式接合。在部分實施例中,在錫焊接的接合方式中,金屬層18與第一銅層14藉由錫膏22接合。In some embodiments, the metal layer 18 contacts (bonds) the first copper layer 14. In some embodiments, the metal layer 18 and the first copper layer 14 are bonded by soldering or diffusion bonding. In some embodiments, in the soldering bonding method, the metal layer 18 and the first copper layer 14 are bonded by solder paste 22.
在部分實施例中,晶片20包括功率元件,例如,高功率元件。In some embodiments, the chip 20 includes power devices, such as high-power devices.
在部分實施例中,晶片20與金屬層18接觸(接合)。在部分實施例中,晶片20與金屬層18藉由銀膏24接合,例如,晶片20與金屬層18藉由無壓燒結銀膏(non-pressure sintering silver)接合。In some embodiments, the chip 20 is in contact with (bonded to) the metal layer 18. In some embodiments, the chip 20 is bonded to the metal layer 18 via a silver paste 24, for example, the chip 20 is bonded to the metal layer 18 via a non-pressure sintering silver paste.
請參閱第2A圖,根據本揭露的一實施例,提供一種功率模組結構110。第2A圖為功率模組結構110的立體圖,主要說明功率模組結構110中金屬層的形狀樣態。Referring to FIG. 2A , according to one embodiment of the present disclosure, a power module structure 110 is provided. FIG. 2A is a perspective view of the power module structure 110 , primarily illustrating the shape of the metal layer in the power module structure 110 .
如第2A圖所示,功率模組結構110包括基板112、第一銅層114、第二銅層116、金屬層118、以及晶片120。第一銅層114與第二銅層116設置於基板112的相對兩表面。金屬層118設置於第一銅層114上。晶片120設置於金屬層118上。由第2A圖可看出,金屬層118的面積小於第一銅層114的面積,晶片120的面積小於金屬層118的面積。As shown in FIG2A , power module structure 110 includes substrate 112, first copper layer 114, second copper layer 116, metal layer 118, and chip 120. First copper layer 114 and second copper layer 116 are disposed on opposite surfaces of substrate 112. Metal layer 118 is disposed on first copper layer 114. Chip 120 is disposed on metal layer 118. As shown in FIG2A , the area of metal layer 118 is smaller than that of first copper layer 114, and the area of chip 120 is smaller than that of metal layer 118.
在部分實施例中,基板112的材料包括氧化鋁,但本揭露不限於此,其他適合的基板材料亦適用於本揭露。在部分實施例中,當基板112的材料為氧化鋁(陶瓷材料)時,由基板112、第一銅層114、以及第二銅層116組成的複合板材稱為陶瓷基板,作為晶片120的載台,具有高導熱及電絕緣的特性。In some embodiments, the material of substrate 112 includes aluminum oxide, but the present disclosure is not limited thereto; other suitable substrate materials are also applicable to the present disclosure. In some embodiments, when substrate 112 is aluminum oxide (a ceramic material), the composite material composed of substrate 112, first copper layer 114, and second copper layer 116 is called a ceramic substrate. This serves as a carrier for chip 120 and has high thermal conductivity and electrical insulation properties.
在部分實施例中,金屬層118的材料包括具有高導熱性及導電性的金屬材料,例如,銅、銀、或鋁,但本揭露不限於此,其他適合的金屬材料亦適用於本揭露。In some embodiments, the material of the metal layer 118 includes a metal material with high thermal conductivity and electrical conductivity, such as copper, silver, or aluminum, but the present disclosure is not limited thereto, and other suitable metal materials are also applicable to the present disclosure.
值得注意的是,在第2A圖中,位於晶片120下方的金屬層118的形狀為矩形,但本揭露不限於此,其他適合的金屬層形狀,例如,圓形、多邊形、或梯形,亦適用於本揭露。It is worth noting that in FIG. 2A , the shape of the metal layer 118 located below the chip 120 is rectangular, but the present disclosure is not limited thereto. Other suitable metal layer shapes, such as circular, polygonal, or trapezoidal, are also applicable to the present disclosure.
在部分實施例中,金屬層118與第一銅層114接觸(接合)。在部分實施例中,金屬層118與第一銅層114藉由錫焊接(soldering)或擴散焊接(diffusion bonding)等方式接合。在部分實施例中,在錫焊接的接合方式中,金屬層118與第一銅層114藉由錫膏122接合。In some embodiments, the metal layer 118 contacts (bonds) the first copper layer 114. In some embodiments, the metal layer 118 and the first copper layer 114 are bonded by soldering or diffusion bonding. In some embodiments, in the soldering bonding method, the metal layer 118 and the first copper layer 114 are bonded by solder paste 122.
在部分實施例中,晶片120包括功率元件,例如,高功率元件。In some embodiments, the chip 120 includes power devices, such as high-power devices.
在部分實施例中,晶片120與金屬層118接觸(接合)。在部分實施例中,晶片120與金屬層118藉由銀膏124接合,例如,晶片120與金屬層118藉由無壓燒結銀膏(non-pressure sintering silver)接合。In some embodiments, the chip 120 is in contact with (bonded to) the metal layer 118. In some embodiments, the chip 120 is bonded to the metal layer 118 via a silver paste 124, for example, the chip 120 is bonded to the metal layer 118 via a non-pressure sintering silver paste.
請參閱第2B圖,根據本揭露的一實施例,提供一種功率模組結構210。第2B圖為功率模組結構210的立體圖,主要說明功率模組結構210中金屬層的形狀樣態。Referring to FIG. 2B , according to one embodiment of the present disclosure, a power module structure 210 is provided. FIG. 2B is a perspective view of the power module structure 210 , primarily illustrating the shape of the metal layer in the power module structure 210 .
如第2B圖所示,功率模組結構210包括基板212、第一銅層214、第二銅層216、金屬層218、晶片220、錫膏222、以及銀膏224。第2B圖所示功率模組結構210中各元件的配置、材料、元件間的尺寸關係及元件間的接合方式類似於第2A圖所示的功率模組結構110,此處不再贅述。第2B圖所示實施例與第2A圖所示實施例的主要差異在於金屬層的形狀樣態。在第2B圖中,位於晶片220下方的金屬層218的形狀為圓形,但本揭露不限於此,其他適合的金屬層形狀亦適用於本揭露。As shown in FIG2B , the power module structure 210 includes a substrate 212, a first copper layer 214, a second copper layer 216, a metal layer 218, a chip 220, a solder paste 222, and a silver paste 224. The configuration, materials, dimensional relationships between the components, and the bonding method between the components in the power module structure 210 shown in FIG2B are similar to those of the power module structure 110 shown in FIG2A and will not be repeated here. The main difference between the embodiment shown in FIG2B and the embodiment shown in FIG2A is the shape of the metal layer. In FIG2B , the shape of the metal layer 218 located below the chip 220 is circular, but the present disclosure is not limited to this, and other suitable metal layer shapes are also applicable to the present disclosure.
請參閱第2C圖,根據本揭露的一實施例,提供一種功率模組結構310。第2C圖為功率模組結構310的立體圖,主要說明功率模組結構310中金屬層的形狀樣態。Please refer to FIG. 2C , which shows a power module structure 310 according to an embodiment of the present disclosure. FIG. 2C is a perspective view of the power module structure 310 , mainly illustrating the shape of the metal layer in the power module structure 310 .
如第2C圖所示,功率模組結構310包括基板312、第一銅層314、第二銅層316、金屬層318、晶片320、錫膏322、以及銀膏324。第2C圖所示功率模組結構310中各元件的配置、材料、元件間的尺寸關係及元件間的接合方式類似於第2A圖所示的功率模組結構110,此處不再贅述。第2C圖所示實施例與第2A圖所示實施例的主要差異在於金屬層的形狀樣態。在第2C圖中,位於晶片320下方的金屬層318的形狀為梯形,但本揭露不限於此,其他適合的金屬層形狀亦適用於本揭露。As shown in FIG2C , the power module structure 310 includes a substrate 312, a first copper layer 314, a second copper layer 316, a metal layer 318, a chip 320, a solder paste 322, and a silver paste 324. The configuration, materials, dimensional relationships between the components, and the bonding method between the components in the power module structure 310 shown in FIG2C are similar to those of the power module structure 110 shown in FIG2A and will not be repeated here. The main difference between the embodiment shown in FIG2C and the embodiment shown in FIG2A is the shape of the metal layer. In FIG2C , the shape of the metal layer 318 located below the chip 320 is a trapezoid, but the present disclosure is not limited to this, and other suitable metal layer shapes are also applicable to the present disclosure.
如第2C圖所示,當功率模組結構310中的金屬層318的形狀為梯形時,熱擴散面積將由晶片320與金屬層318的接觸面逐漸向第一銅層314擴大。As shown in FIG. 2C , when the metal layer 318 in the power module structure 310 is trapezoidal in shape, the heat diffusion area will gradually expand from the contact surface between the chip 320 and the metal layer 318 toward the first copper layer 314 .
請參閱第3圖,根據本揭露的一實施例,提供一種功率模組結構410。第3圖為功率模組結構410的立體圖。Referring to FIG. 3 , according to one embodiment of the present disclosure, a power module structure 410 is provided. FIG. 3 is a perspective view of the power module structure 410 .
如第3圖所示,功率模組結構410包括基板412、第一銅層414、第二銅層416、金屬層418、以及晶片420。第一銅層414與第二銅層416設置於基板412的相對兩表面。晶片420設置於第一銅層414上。金屬層418設置於第一銅層414上,並包圍晶片420。此外,由第3圖可看出,金屬層418的面積小於第一銅層414的面積。As shown in FIG3 , power module structure 410 includes a substrate 412, a first copper layer 414, a second copper layer 416, a metal layer 418, and a chip 420. First copper layer 414 and second copper layer 416 are disposed on opposite surfaces of substrate 412. Chip 420 is disposed on first copper layer 414. Metal layer 418 is disposed on first copper layer 414 and surrounds chip 420. Furthermore, as shown in FIG3 , the area of metal layer 418 is smaller than that of first copper layer 414.
在部分實施例中,基板412的材料包括氧化鋁,但本揭露不限於此,其他適合的基板材料亦適用於本揭露。在部分實施例中,當基板412的材料為氧化鋁(陶瓷材料)時,由基板412、第一銅層414、以及第二銅層416組成的複合板材稱為陶瓷基板,作為晶片420的載台,具有高導熱及電絕緣的特性。In some embodiments, the material of substrate 412 includes aluminum oxide, but the present disclosure is not limited thereto; other suitable substrate materials are also applicable to the present disclosure. In some embodiments, when substrate 412 is made of aluminum oxide (a ceramic material), the composite material composed of substrate 412, first copper layer 414, and second copper layer 416 is called a ceramic substrate. This serves as a carrier for chip 420 and has high thermal conductivity and electrical insulation properties.
在部分實施例中,晶片420包括功率元件,例如,高功率元件。In some embodiments, chip 420 includes power devices, such as high-power devices.
在部分實施例中,晶片420與第一銅層414接觸(接合)。在部分實施例中,晶片420與第一銅層414藉由銀膏(未圖示)接合,例如,晶片420與第一銅層414藉由無壓燒結銀膏(non-pressure sintering silver)接合。In some embodiments, the chip 420 is in contact with (bonded to) the first copper layer 414. In some embodiments, the chip 420 is bonded to the first copper layer 414 via a silver paste (not shown), for example, the chip 420 is bonded to the first copper layer 414 via non-pressure sintering silver paste.
在部分實施例中,金屬層418的材料包括具有高導熱性及導電性的金屬材料,例如,銅、銀、或鋁,但本揭露不限於此,其他適合的金屬材料亦適用於本揭露。此外,如第3圖所示,功率模組結構410中包圍晶片420的金屬層418的形狀為多邊形,但本揭露不限於此,其他適合的金屬層形狀,例如,矩形、圓形、或梯形,亦適用於本揭露。In some embodiments, the material of metal layer 418 includes a metal material with high thermal and electrical conductivity, such as copper, silver, or aluminum, but the present disclosure is not limited thereto. Other suitable metal materials are also applicable to the present disclosure. In addition, as shown in FIG. 3 , the shape of metal layer 418 surrounding chip 420 in power module structure 410 is polygonal, but the present disclosure is not limited thereto. Other suitable metal layer shapes, such as rectangular, circular, or trapezoidal, are also applicable to the present disclosure.
在部分實施例中,金屬層418與第一銅層414接觸(接合)。在部分實施例中,金屬層418與第一銅層414藉由錫焊接(soldering)或擴散焊接(diffusion bonding)等方式接合。在部分實施例中,在錫焊接的接合方式中,金屬層418與第一銅層414藉由錫膏(未圖示)接合。In some embodiments, the metal layer 418 contacts (bonds) the first copper layer 414. In some embodiments, the metal layer 418 and the first copper layer 414 are bonded by soldering or diffusion bonding. In some embodiments, in the soldering bonding method, the metal layer 418 and the first copper layer 414 are bonded by solder paste (not shown).
在部分實施例中,晶片420的厚度T1與金屬層418的厚度T2相同。在部分實施例中,晶片420的厚度T1與金屬層418的厚度T2不同,例如,晶片420的厚度T1小於金屬層418的厚度T2,如第3圖所示,或是,晶片420的厚度T1大於金屬層418的厚度T2 (未圖示)。In some embodiments, the thickness T1 of the chip 420 is the same as the thickness T2 of the metal layer 418. In some other embodiments, the thickness T1 of the chip 420 is different from the thickness T2 of the metal layer 418. For example, the thickness T1 of the chip 420 is less than the thickness T2 of the metal layer 418, as shown in FIG. 3 , or the thickness T1 of the chip 420 is greater than the thickness T2 of the metal layer 418 (not shown).
在部分實施例中,晶片420與金屬層418接觸,如第3圖所示。In some embodiments, chip 420 is in contact with metal layer 418, as shown in FIG. 3 .
請參閱第4圖,根據本揭露的一實施例,提供一種功率模組結構510。第4圖為功率模組結構510的立體圖。Referring to FIG. 4 , according to one embodiment of the present disclosure, a power module structure 510 is provided. FIG. 4 is a perspective view of the power module structure 510 .
如第4圖所示,功率模組結構510包括基板512、第一銅層514、第二銅層516、複數個金屬層(例如,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e)、以及複數個晶片(例如,第一晶片520a、第二晶片520b、第三晶片520c、第四晶片520d、以及第五晶片520e)。第一銅層514與第二銅層516設置於基板512的相對兩表面。第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e分別設置於第一銅層514上,且彼此分離。第一晶片520a設置於第一金屬層518a上,第二晶片520b設置於第二金屬層518b上,第三晶片520c設置於第三金屬層518c上,第四晶片520d設置於第四金屬層518d上,以及第五晶片520e設置於第五金屬層518e上。由第4圖可看出,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的面積分別小於第一銅層514的面積,第一晶片520a的面積小於第一金屬層518a的面積,第二晶片520b的面積小於第二金屬層518b的面積,第三晶片520c的面積小於第三金屬層518c的面積,第四晶片520d的面積小於第四金屬層518d的面積,以及第五晶片520e的面積小於第五金屬層518e的面積。As shown in FIG4 , power module structure 510 includes a substrate 512, a first copper layer 514, a second copper layer 516, a plurality of metal layers (e.g., a first metal layer 518a, a second metal layer 518b, a third metal layer 518c, a fourth metal layer 518d, and a fifth metal layer 518e), and a plurality of chips (e.g., a first chip 520a, a second chip 520b, a third chip 520c, a fourth chip 520d, and a fifth chip 520e). The first copper layer 514 and the second copper layer 516 are disposed on opposite surfaces of the substrate 512. A first metal layer 518a, a second metal layer 518b, a third metal layer 518c, a fourth metal layer 518d, and a fifth metal layer 518e are each disposed on the first copper layer 514 and separated from one another. A first chip 520a is disposed on the first metal layer 518a, a second chip 520b is disposed on the second metal layer 518b, a third chip 520c is disposed on the third metal layer 518c, a fourth chip 520d is disposed on the fourth metal layer 518d, and a fifth chip 520e is disposed on the fifth metal layer 518e. As can be seen from Figure 4, the areas of the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are respectively smaller than the area of the first copper layer 514, the area of the first chip 520a is smaller than the area of the first metal layer 518a, the area of the second chip 520b is smaller than the area of the second metal layer 518b, the area of the third chip 520c is smaller than the area of the third metal layer 518c, the area of the fourth chip 520d is smaller than the area of the fourth metal layer 518d, and the area of the fifth chip 520e is smaller than the area of the fifth metal layer 518e.
在部分實施例中,基板512的材料包括氧化鋁,但本揭露不限於此,其他適合的基板材料亦適用於本揭露。在部分實施例中,當基板512的材料為氧化鋁(陶瓷材料)時,由基板512、第一銅層514、以及第二銅層516組成的複合板材稱為陶瓷基板,作為第一晶片520a、第二晶片520b、第三晶片520c、第四晶片520d、以及第五晶片520e的載台,具有高導熱及電絕緣的特性。In some embodiments, the material of substrate 512 includes aluminum oxide, but the present disclosure is not limited thereto; other suitable substrate materials are also applicable to the present disclosure. In some embodiments, when the material of substrate 512 is aluminum oxide (a ceramic material), the composite plate composed of substrate 512, first copper layer 514, and second copper layer 516 is called a ceramic substrate. It serves as a carrier for first chip 520a, second chip 520b, third chip 520c, fourth chip 520d, and fifth chip 520e, and has high thermal conductivity and electrical insulation properties.
在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的材料包括具有高導熱性及導電性的金屬材料,例如,銅、銀、或鋁,但本揭露不限於此,其他適合的金屬材料亦適用於本揭露。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的形狀包括矩形、圓形、多邊形、或梯形,但本揭露不限於此,其他適合的金屬層形狀亦適用於本揭露。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的形狀相同。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的形狀不同。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的形狀部分相同,部分不同,例如,第一金屬層518a的形狀為圓形,第二金屬層518b的形狀為矩形,第三金屬層518c的形狀為矩形,第四金屬層518d的形狀為多邊形,以及第五金屬層518e的形狀為矩形,如第4圖所示。In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e include metal materials with high thermal and electrical conductivity, such as copper, silver, or aluminum, but the present disclosure is not limited thereto, and other suitable metal materials are also applicable to the present disclosure. In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e include rectangular, circular, polygonal, or trapezoidal shapes, but the present disclosure is not limited thereto, and other suitable metal layer shapes are also applicable to the present disclosure. In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e have the same shape. In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e have different shapes. In some embodiments, the shapes of the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are partially the same and partially different. For example, the shape of the first metal layer 518a is circular, the shape of the second metal layer 518b is rectangular, the shape of the third metal layer 518c is rectangular, the shape of the fourth metal layer 518d is polygonal, and the shape of the fifth metal layer 518e is rectangular, as shown in Figure 4.
在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e分別與第一銅層514接觸(接合)。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e分別與第一銅層514藉由錫焊接(soldering)或擴散焊接(diffusion bonding)等方式接合。在部分實施例中,在錫焊接的接合方式中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e分別與第一銅層514藉由錫膏(未圖示)接合。In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are respectively in contact with (bonded to) the first copper layer 514. In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are respectively bonded to the first copper layer 514 by soldering or diffusion bonding. In some embodiments, in a soldering bonding method, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are respectively bonded to the first copper layer 514 via solder paste (not shown).
在部分實施例中,第一晶片520a、第二晶片520b、第三晶片520c、第四晶片520d、以及第五晶片520e包括功率元件,例如,高功率元件。In some embodiments, the first chip 520a, the second chip 520b, the third chip 520c, the fourth chip 520d, and the fifth chip 520e include power devices, such as high-power devices.
在部分實施例中,第一晶片520a與第一金屬層518a接觸(接合),第二晶片520b與第二金屬層518b接觸(接合),第三晶片520c與於第三金屬層518c接觸(接合),第四晶片520d與第四金屬層518d接觸(接合),以及第五晶片520e與第五金屬層518e接觸(接合)。在部分實施例中,晶片與金屬層藉由銀膏(未圖示)接合,例如,晶片與金屬層藉由無壓燒結銀膏(non-pressure sintering silver)接合。In some embodiments, first chip 520a is in contact with (bonded to) first metal layer 518a, second chip 520b is in contact with (bonded to) second metal layer 518b, third chip 520c is in contact with (bonded to) third metal layer 518c, fourth chip 520d is in contact with (bonded to) fourth metal layer 518d, and fifth chip 520e is in contact with (bonded to) fifth metal layer 518e. In some embodiments, the chips and metal layers are bonded using silver paste (not shown), for example, non-pressure sintering silver paste.
在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的厚度相同。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的厚度不同。在部分實施例中,第一金屬層518a、第二金屬層518b、第三金屬層518c、第四金屬層518d、以及第五金屬層518e的厚度部分相同,部分不同,舉例來說,第一金屬層518a的厚度H1與第四金屬層518d的厚度H4相同,第二金屬層518b的厚度H2與第三金屬層518c的厚度H3及第五金屬層518e的厚度H5相同,而第一金屬層518a的厚度H1與第二金屬層518b的厚度H2、第三金屬層518c的厚度H3以及第五金屬層518e的厚度H5不同,如第4圖所示。In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e have the same thickness. In some embodiments, the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e have different thicknesses. In some embodiments, the thicknesses of the first metal layer 518a, the second metal layer 518b, the third metal layer 518c, the fourth metal layer 518d, and the fifth metal layer 518e are partially the same and partially different. For example, the thickness H1 of the first metal layer 518a is the same as the thickness H4 of the fourth metal layer 518d, the thickness H2 of the second metal layer 518b is the same as the thickness H3 of the third metal layer 518c and the thickness H5 of the fifth metal layer 518e, and the thickness H1 of the first metal layer 518a is different from the thickness H2 of the second metal layer 518b, the thickness H3 of the third metal layer 518c, and the thickness H5 of the fifth metal layer 518e, as shown in Figure 4.
一般來說,對於陶瓷基板的上銅層,需考量製程的蝕刻能力以及熱膨脹造成的翹曲問題,因此,在銅層厚度上需有所限制,然而,在設置高功率晶片的情況下,過薄的銅層會產生局部熱點,致熱不易散失。在本揭露功率模組結構中,於晶片下方(或周圍)額外設置具有高導熱性及導電性的金屬層,使基板上的銅層局部增厚,促使熱先均勻傳遞在金屬層上並擴大發熱面積後,再向下進行更有效率的熱傳遞。本揭露金屬層對於晶片來說屬於放大其熱源的附屬件,可達到均勻散熱及增加散熱面積的目的,並與基板上的銅層相接。Generally speaking, the copper layer on a ceramic substrate must consider the etching capability of the process and the warping caused by thermal expansion. Therefore, the thickness of the copper layer must be limited. However, when installing a high-power chip, an overly thin copper layer will generate local hot spots, making it difficult for heat to dissipate. In the power module structure disclosed herein, an additional metal layer with high thermal and electrical conductivity is provided below (or around) the chip, causing the copper layer on the substrate to be locally thickened. This allows heat to be evenly transferred to the metal layer and expand the heat dissipation area before being more efficiently transferred downward. The metal layer disclosed herein acts as an accessory for the chip, amplifying its heat source, achieving uniform heat dissipation and increasing the heat dissipation area, and is connected to the copper layer on the substrate.
本揭露利用面積大於熱源的金屬層與熱源接觸,使溫度均勻傳遞。所謂均勻傳遞是指使熱在金屬層中心點至邊緣之間有較小的溫差,即,金屬層趨於等溫的現象(形成均溫片)。此外,可藉由金屬層與上銅層的接合增加基板的抗彎強度,降低基板的翹曲程度。This disclosure utilizes a metal layer larger than the heat source, placed in contact with the heat source, to achieve uniform temperature transfer. Uniform heat transfer means a minimal temperature difference between the center and edge of the metal layer, creating a phenomenon where the metal layer tends to be isothermal (forming a temperature-stabilizing plate). Furthermore, the bonding between the metal layer and the upper copper layer increases the substrate's bending strength, reducing substrate warping.
本揭露金屬層可根據電路布局進行局部增厚,可同時於銅層上設置多個金屬層,且各個金屬層可根據產品需求設計成不同形狀及厚度。The metal layer disclosed herein can be locally thickened according to the circuit layout. Multiple metal layers can be simultaneously disposed on the copper layer, and each metal layer can be designed to have different shapes and thicknesses according to product requirements.
本揭露主要藉由在晶片與基板之間加入金屬層,使得晶片的熱源在傳遞的過程中先均勻散播,除可避免局部高溫的問題,亦可有效增加散熱面積使晶片降溫。綜合本揭露優點包括增加晶片散熱效果、降低基板翹曲程度、彈性增厚局部銅層、以及節省銅材使用等。This disclosure primarily involves adding a metal layer between the chip and substrate, allowing the heat from the chip to be evenly distributed during the transfer process. This not only avoids localized high temperatures but also effectively increases the heat dissipation area, cooling the chip. The advantages of this disclosure include increased chip heat dissipation, reduced substrate warping, flexible thickening of the local copper layer, and reduced copper material usage.
上述一些實施例的部件,以便在本揭露所屬技術領域中具有通常知識者可以更理解本揭露實施例的觀點。在本揭露所屬技術領域中具有通常知識者應該理解,他們能以本揭露實施例為基礎,設計或修改其他製程和結構以達到與在此介紹的實施例相同之目的及/或優勢。在本揭露所屬技術領域中具有通常知識者也應該理解到,此類等效的結構並無悖離本揭露的精神與範圍,且他們能在不違背本揭露之精神和範圍之下,做各式各樣的改變、取代和替換。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。另外,雖然本揭露已以數個較佳實施例揭露如上,然其並非用以限定本揭露。The components of some of the above-mentioned embodiments are provided so that those with ordinary skill in the art to which this disclosure belongs can better understand the perspectives of the embodiments of this disclosure. Those with ordinary skill in the art to which this disclosure belongs should understand that they can use the embodiments of this disclosure as a basis to design or modify other processes and structures to achieve the same purposes and/or advantages as the embodiments introduced herein. Those with ordinary skill in the art to which this disclosure belongs should also understand that such equivalent structures do not deviate from the spirit and scope of this disclosure, and they can make various changes, substitutions and replacements without violating the spirit and scope of this disclosure. Therefore, the scope of protection of this disclosure shall be determined as defined by the scope of the patent application attached hereto. In addition, although this disclosure has been disclosed above with several preferred embodiments, they are not intended to limit this disclosure.
整份說明書對特徵、優點或類似語言的引用,並非意味可以利用本揭露實現的所有特徵和優點應該或者可以在本揭露的任何單個實施例中實現。相對地,涉及特徵和優點的語言被理解為其意味著結合實施例描述的特定特徵、優點或特性包括在本揭露的至少一個實施例中。因而,在整份說明書中對特徵和優點以及類似語言的討論可以但不一定代表相同的實施例。Reference throughout this specification to features, advantages, or similar language does not imply that all features and advantages that may be achieved with the present disclosure should or may be achieved in any single embodiment of the present disclosure. Rather, language referring to features and advantages is to be understood as meaning that a specific feature, advantage, or characteristic described in connection with an embodiment is included in at least one embodiment of the present disclosure. Thus, discussion of features and advantages, and similar language, throughout this specification may, but do not necessarily, refer to the same embodiment.
再者,在一個或多個實施例中,可以任何合適的方式組合本揭露的所描述的特徵、優點和特性。根據本文的描述,相關領域的技術人員將意識到,可在沒有特定實施例的一個或多個特定特徵或優點的情況下實現本揭露。在其他情況下,在某些實施例中可辨識附加的特徵和優點,這些特徵和優點可能不存在於本揭露的所有實施例中。Furthermore, the described features, advantages, and characteristics of the present disclosure may be combined in any suitable manner in one or more embodiments. Based on the description herein, one skilled in the relevant art will recognize that the present disclosure may be practiced without one or more of the specific features or advantages of a particular embodiment. In other cases, additional features and advantages may be identified in some embodiments that may not be present in all embodiments of the present disclosure.
10,110,210,310,410,510:功率模組結構 12,112,212,312,412,512:基板 12a:基板的第一表面 12b:基板的第二表面 14,114,214,314,414,514:第一銅層 16,116,216,316,416,516:第二銅層 18,118,218,318,418:金屬層 20,120,220,320,420:晶片 22,122,222,322:錫膏 24,124,224,324:銀膏 518a:第一金屬層 518b:第二金屬層 518c:第三金屬層 518d:第四金屬層 518e:第五金屬層 520a:第一晶片 520b:第二晶片 520c:第三晶片 520d:第四晶片 520e:第五晶片 A1:金屬層的面積 A2:第一銅層的面積 A3:晶片的面積 H1:第一金屬層的厚度 H2:第二金屬層的厚度 H3:第三金屬層的厚度 H4:第四金屬層的厚度 H5:第五金屬層的厚度 T1:晶片的厚度 T2:金屬層的厚度 10,110,210,310,410,510: Power module structure 12,112,212,312,412,512: Substrate 12a: First surface of substrate 12b: Second surface of substrate 14,114,214,314,414,514: First copper layer 16,116,216,316,416,516: Second copper layer 18,118,218,318,418: Metal layer 20,120,220,320,420: Chip 22,122,222,322: Solder paste 24,124,224,324: Silver paste 518a: First metal layer 518b: Second metal layer 518c: Third metal layer 518d: Fourth metal layer 518e: Fifth metal layer 520a: First chip 520b: Second chip 520c: Third chip 520d: Fourth chip 520e: Fifth chip A1: Area of metal layer A2: Area of first copper layer A3: Area of chip H1: Thickness of first metal layer H2: Thickness of second metal layer H3: Thickness of third metal layer H4: Thickness of fourth metal layer H5: Thickness of fifth metal layer T1: Thickness of chip T2: Thickness of metal layer
以下將配合所附圖式詳述本揭露實施例。應注意的是,各種特徵部件並未按照比例繪製且僅用以說明例示。事實上,元件的尺寸可能經放大或縮小,以清楚地表現出本揭露實施例的技術特徵。 第1圖係根據本揭露的一實施例,一種功率模組結構的剖面示意圖; 第2A圖係根據本揭露的一實施例,一種功率模組結構的立體圖; 第2B圖係根據本揭露的一實施例,一種功率模組結構的立體圖; 第2C圖係根據本揭露的一實施例,一種功率模組結構的立體圖; 第3圖係根據本揭露的一實施例,一種功率模組結構的立體圖;以及 第4圖係根據本揭露的一實施例,一種功率模組結構的立體圖。 The following describes the disclosed embodiments in detail with reference to the accompanying figures. It should be noted that the various features are not drawn to scale and are for illustrative purposes only. In fact, the dimensions of components may be exaggerated or reduced to clearly illustrate the technical features of the disclosed embodiments. Figure 1 is a schematic cross-sectional view of a power module structure according to an embodiment of the disclosed embodiment; Figure 2A is a perspective view of a power module structure according to an embodiment of the disclosed embodiment; Figure 2B is a perspective view of a power module structure according to an embodiment of the disclosed embodiment; Figure 2C is a perspective view of a power module structure according to an embodiment of the disclosed embodiment; Figure 3 is a perspective view of a power module structure according to an embodiment of the disclosed embodiment; and Figure 4 is a perspective view of a power module structure according to an embodiment of the disclosed embodiment.
10:功率模組結構 12:基板 12a:基板的第一表面 12b:基板的第二表面 14:第一銅層 16:第二銅層 18:金屬層 20:晶片 22:錫膏 24:銀膏 A1:金屬層的面積 A2:第一銅層的面積 A3:晶片的面積 10: Power module structure 12: Substrate 12a: First surface of substrate 12b: Second surface of substrate 14: First copper layer 16: Second copper layer 18: Metal layer 20: Chip 22: Solder paste 24: Silver paste A1: Metal layer area A2: First copper layer area A3: Chip area
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| TW561799B (en) * | 1999-08-11 | 2003-11-11 | Fujikura Ltd | Chip assembly module of bump connection type using a multi-layer printed circuit substrate |
| TW201543979A (en) * | 2014-05-01 | 2015-11-16 | 同欣電子工業股份有限公司 | Method for manufacturing multilayer ceramic heat dissipation circuit substrate and product thereof |
| TWI555125B (en) * | 2014-09-12 | 2016-10-21 | 樂金股份有限公司 | Method for manufacturing package of power module |
| CN112786532A (en) * | 2021-01-12 | 2021-05-11 | 杰群电子科技(东莞)有限公司 | Power module manufacturing method and power module packaging structure |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW561799B (en) * | 1999-08-11 | 2003-11-11 | Fujikura Ltd | Chip assembly module of bump connection type using a multi-layer printed circuit substrate |
| TW201543979A (en) * | 2014-05-01 | 2015-11-16 | 同欣電子工業股份有限公司 | Method for manufacturing multilayer ceramic heat dissipation circuit substrate and product thereof |
| TWI555125B (en) * | 2014-09-12 | 2016-10-21 | 樂金股份有限公司 | Method for manufacturing package of power module |
| CN112786532A (en) * | 2021-01-12 | 2021-05-11 | 杰群电子科技(东莞)有限公司 | Power module manufacturing method and power module packaging structure |
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