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TWI896753B - Polymer composition, varnish, and polyimide film - Google Patents

Polymer composition, varnish, and polyimide film

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TWI896753B
TWI896753B TW110133173A TW110133173A TWI896753B TW I896753 B TWI896753 B TW I896753B TW 110133173 A TW110133173 A TW 110133173A TW 110133173 A TW110133173 A TW 110133173A TW I896753 B TWI896753 B TW I896753B
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TW202219122A (en
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安孫子洋平
大東葵
石井健太郎
村谷孝博
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日商三菱瓦斯化學股份有限公司
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
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    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09J179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

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Abstract

A polymer composition containing a polymer (X) that contains at least one repeating unit selected from the group consisting of repeating units represented by general formula (1) shown below and repeating units represented by general formula (2) shown below, and a compound (Y) represented by general formula (3) below. (In formula (1), X 1represents a tetravalent group containing an alicyclic structure or an aromatic ring. In formula (2), X 2represents a tetravalent group containing an alicyclic structure or an aromatic ring, and R 1and R 2each independently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, or an alkylsilyl group of 3 to 9 carbon atoms. In formula (3), R 3is at least one group selected from the group consisting of alkyl groups of 1 to 30 carbon atoms, a phenyl group, alkoxy groups, an acryloyl group, a methacryloyl group, an acryloyloxyethyl group and a methacryloyloxyethyl group, and n is an integer of 0 to 2).

Description

聚合物組成物、清漆、以及聚醯亞胺薄膜Polymer composition, varnish, and polyimide film

本發明係關於聚合物組成物、清漆、以及聚醯亞胺薄膜。The present invention relates to a polymer composition, a varnish, and a polyimide film.

由於聚醯亞胺樹脂具有優良的機械特性及耐熱性,已有人研究在電氣、電子零件等領域中各種的利用。例如,期望以聚醯亞胺薄膜基板替代液晶顯示器及OLED顯示器等影像顯示裝置中使用的玻璃基板,正在進行著滿足作為光學材料之性能的聚醯亞胺樹脂之開發。 但是,近年來由於電子設備之高機能化,需要電子零件同時滿足各種的所需性能。因此,針對顯示器中使用的聚醯亞胺樹脂,亦有藉由摻合各種的添加劑以在樹脂原來的性質附加新的性質、及提高原來的性質之嘗試。 Due to their excellent mechanical properties and heat resistance, polyimide resins have been studied for various applications in electrical and electronic components. For example, polyimide film substrates are being developed to replace the glass substrates used in display devices such as liquid crystal displays and OLED displays, with the goal of replacing them with polyimide film substrates. However, the recent increase in the functionality of electronic devices has necessitated the simultaneous fulfillment of a variety of performance requirements for electronic components. Consequently, attempts are underway to enhance the inherent properties of polyimide resins used in displays by incorporating various additives to enhance them.

例如,專利文獻1,以除了耐熱性、機械性特性以外,防止結晶化及縮短層形成時間作為目的,揭示一種聚醯亞胺前驅體組成物,含有特定的聚醯胺酸、及特定的磷化合物;上述聚醯胺酸,藉由在最高加熱溫度設定為300~500℃之條件下進行加熱處理,可製造具有大的水蒸氣穿透係數之聚醯亞胺薄膜。 此外,專利文獻2,係以獲得具有透明性、耐熱性、低線熱膨張係數之聚醯亞胺為目的,揭示一種聚醯亞胺前驅體組成物,含有具有特定的重複單元之聚醯亞胺前驅體,及含有磷原子且在1大氣壓下的沸點低於分解溫度並且為350℃以下之磷化合物。 [先前技術文獻] [專利文獻] For example, Patent Document 1 discloses a polyimide precursor composition containing a specific polyamide and a specific phosphorus compound, with the goal of improving heat resistance and mechanical properties while preventing crystallization and shortening layer formation time. The composition comprises a polyimide precursor containing a specific polyamide and a specific phosphorus compound. By heating the polyamide at a maximum temperature of 300-500°C, a polyimide film with a high water vapor transmission coefficient can be produced. Furthermore, Patent Document 2 discloses a polyimide precursor composition containing a polyimide precursor having specific repeating units and a phosphorus compound containing phosphorus atoms and having a boiling point below its decomposition temperature at 1 atmosphere and 350°C or lower, with the goal of obtaining a polyimide with transparency, heat resistance, and a low linear thermal expansion coefficient. [Prior Art Literature] [Patent Literature]

專利文獻1:國際公開第2016/121817號 專利文獻2:國際公開第2015/080139號 Patent Document 1: International Publication No. 2016/121817 Patent Document 2: International Publication No. 2015/080139

[發明所欲解決之課題][The problem that the invention aims to solve]

如上述需要聚醯亞胺薄膜代替玻璃基板,不僅是機械特性及耐熱性,亦需要高無色透明性。但是,難以兼具此等之性能,即使藉由摻合添加劑來提高耐熱性,要防止變黃等也很困難。 此外,為了在聚醯亞胺本身表現出無色透明性,一般而言會使用脂肪族二胺、含氟二胺,用以抑制分子間或分子內形成電荷轉移複合物。然而,例如在製造顯示器時之製造TFT之步驟中,在350℃以上之嚴酷的條件下,由於脂肪族二胺相較於芳香族二胺缺少剛性,不容易表現出耐熱性,此外,在高溫下含氟二胺之無色透明性亦會受損。因此,特別地需要耐熱性優良,黃色度低之聚醯亞胺薄膜。 有鑒於如此之狀況而做出本發明,本發明之課題,係提供能夠得到耐熱性優良,黃色度低的聚醯亞胺薄膜之聚合物組成物、含有該組成物之清漆、及耐熱性優良,黃色度低之聚醯亞胺薄膜。 [解決課題之手段] As mentioned above, polyimide films are required to replace glass substrates, demanding not only mechanical properties and heat resistance but also high colorlessness and transparency. However, achieving both of these properties is difficult. Even with additives to improve heat resistance, preventing yellowing is challenging. In addition, to achieve colorlessness and transparency within the polyimide itself, aliphatic diamines and fluorinated diamines are generally used to inhibit the formation of charge transfer complexes within or between molecules. However, under the harsh conditions of TFT fabrication, such as those at temperatures above 350°C, aliphatic diamines lack the rigidity of aromatic diamines and are therefore less likely to exhibit heat resistance. Furthermore, the colorlessness and transparency of fluorinated diamines deteriorate at high temperatures. Therefore, there is a particular demand for polyimide films with excellent heat resistance and low yellowing. The present invention was made in light of this situation. The object of the present invention is to provide a polymer composition capable of producing a polyimide film having excellent heat resistance and low yellowness, a varnish containing the composition, and a polyimide film having excellent heat resistance and low yellowness. [Means for Solving the Problem]

本案發明人們,發現一種聚合物組成物,含有:含有來自於具有特定的含氟二胺及脂環結構或芳香族環的四羧酸之重複單元之聚合物、與特定的磷化合物,能夠解決上述課題,乃至於完成發明。The inventors of this case discovered that a polymer composition containing repeating units derived from a tetracarboxylic acid having a specific fluorinated diamine and an alicyclic or aromatic ring structure, and a specific phosphorus compound, can solve the above-mentioned problems and thus complete the invention.

即,本發明係關於下述[1]~[7]。 [1]一種聚合物組成物,含有: 含有選自於由下述通式(1)表示之重複單元及下述通式(2)表示之重複單元構成之群組中之至少一種之聚合物(X),及下述通式(3)表示之化合物(Y)。 [化1] (式(1)中,X 1為具有脂環結構或芳香族環之4價之基。 式(2)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基。 式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,n為0~2。) [2]如上述[1]之聚合物組成物,其中,相對於上述聚合物(X)之全部重複單元,上述式(1)表示之重複單元為10莫耳%以上。 [3]如上述[1]或[2]之聚合物組成物,其中,相對於上述聚合物(X)之全部重複單元,上述式(2)表示之重複單元為10莫耳%以上。 [4]如上述[1]~[3]中任一項之聚合物組成物,其中,相對於聚合物(X),化合物(Y)之含量為10ppm以上且10,000ppm以下。 [5]一種清漆,係藉由將如上述[1]至[4]中任一項之聚合物組成物溶解在有機溶劑中而形成的。 [6]一種聚醯亞胺薄膜,係在支持體上塗布如上述[5]之清漆並加熱而獲得。 [7]一種聚醯亞胺薄膜之製造方法,係在支持體上塗布如上述[5]之清漆。 [發明之效果] That is, the present invention relates to the following [1] to [7]. [1] A polymer composition comprising: a polymer (X) comprising at least one selected from the group consisting of a repeating unit represented by the following general formula (1) and a repeating unit represented by the following general formula (2), and a compound (Y) represented by the following general formula (3). [Chemistry 1] (In formula (1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring. In formula (2), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, and R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms. In formula (3), R3 is at least one selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, and n is 0 to 2.) [2] The polymer composition as described in [1] above, wherein the repeating units represented by the above formula (1) account for 10 mol% or more of the total repeating units of the above polymer (X). [3] A polymer composition as described in [1] or [2] above, wherein the content of the repeating units represented by the formula (2) is 10 mol% or more relative to the total repeating units of the polymer (X). [4] A polymer composition as described in any one of [1] to [3] above, wherein the content of the compound (Y) is 10 ppm or more and 10,000 ppm or less relative to the polymer (X). [5] A varnish formed by dissolving the polymer composition as described in any one of [1] to [4] above in an organic solvent. [6] A polyimide film obtained by coating the varnish as described in [5] above on a support and heating the coating. [7] A method for producing a polyimide film, comprising coating the varnish as described in [5] above on a support. [Effects of the invention]

根據本發明,可提供能夠得到耐熱性優良,黃色度低的聚醯亞胺薄膜之聚合物組成物、含有該組成物的清漆、及耐熱性優良,黃色度低之聚醯亞胺薄膜。According to the present invention, a polymer composition capable of obtaining a polyimide film having excellent heat resistance and low yellowness, a varnish containing the composition, and a polyimide film having excellent heat resistance and low yellowness can be provided.

[聚合物組成物] 本發明之聚合物組成物,含有選自於由下述通式(1)表示之重複單元及下述通式(2)表示之重複單元構成之群組中之至少一種之聚合物(X),及下述通式(3)表示之化合物(Y)。 [化2] (式(1)中,X 1為具有脂環結構或芳香族環之4價之基。 式(2)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基。 式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,n為0~2。) [Polymer composition] The polymer composition of the present invention comprises at least one polymer (X) selected from the group consisting of repeating units represented by the following general formula (1) and repeating units represented by the following general formula (2), and a compound (Y) represented by the following general formula (3). [Chemistry 2] (In formula (1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring. In formula (2), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, and R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms. In formula (3), R3 is at least one selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, and n is 0 to 2.)

本發明之聚合物組成物作為聚醯亞胺薄膜之原料為優良,得到的聚醯亞胺薄膜具有優良耐熱性、黃色度亦低之優良特性之理由雖然並不清楚,據認為如下述。 本發明之聚合物組成物含有特定的磷化合物,據認為藉由該磷化合物配位在將聚合物醯亞胺化而得到的聚醯亞胺之末端,或聚醯亞胺之末端與該磷化合物進行反應,能夠抑制特別是在高溫下的末端之副反應或分解劣化等,並且能夠抑制來自含氟二胺的氟之脫去,據認為因此可兼具耐熱性及低黃色度。 The polymer composition of the present invention is an excellent raw material for polyimide films. The reason why the resulting polyimide films exhibit excellent heat resistance and low yellowness is unclear, but is believed to be as follows. The polymer composition of the present invention contains a specific phosphorus compound. It is believed that by coordinating the phosphorus compound to the ends of the polyimide obtained by imidization of the polymer, or by reacting the ends of the polyimide with the phosphorus compound, side reactions and decomposition degradation at the ends, particularly at high temperatures, can be suppressed. Furthermore, the removal of fluorine from the fluorinated diamine can be suppressed, resulting in both heat resistance and low yellowness.

<聚合物(X)> 本發明之聚合物組成物中含有的聚合物(X),含有選自於由下述通式(1)表示之重複單元及下述通式(2)表示之重複單元構成之群組中之至少一種。 [化3] (式(1)中,X 1為具有脂環結構或芳香族環之4價之基。 式(2)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基。) <Polymer (X)> The polymer (X) contained in the polymer composition of the present invention contains at least one selected from the group consisting of repeating units represented by the following general formula (1) and repeating units represented by the following general formula (2). [Chemistry 3] (In formula (1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring. In formula (2), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, and R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms.)

聚合物(X)含有的上述通式(1)表示之重複單元,宜為下述通式(1-1)表示之重複單元。 [化4] (式(1-1)中,X 1為具有脂環結構或芳香族環之4價之基。) The repeating units represented by the above general formula (1) contained in the polymer (X) are preferably repeating units represented by the following general formula (1-1). [Chemical 4] (In formula (1-1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring.)

聚合物(X)含有的上述通式(2)表示之重複單元,宜為下述通式(2-1)表示之重複單元。 [化5] (式(2-1)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基。) The repeating units represented by the above general formula (2) contained in the polymer (X) are preferably repeating units represented by the following general formula (2-1). [Chemistry 5] (In formula (2-1), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, and R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms.)

聚合物(X),含有選自於由上述通式(1)表示之重複單元及上述通式(2)表示之重複單元構成之群組中之至少一種,亦可僅含有上述通式(1)表示之重複單元、或上述通式(2)表示之重複單元之任一個,亦可含有兩者。 即,本發明之聚合物組成物可以係一種聚醯胺酸組成物,含有:含有下述通式(1)表示之重複單元的聚醯亞胺、及下述通式(3)表示之化合物(Y), [化6] (式(1)中,X 1為具有脂環結構或芳香族環之4價之基。式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,n為0~2。) 亦可以係一種聚醯胺酸組成物,含有:含有下述通式(2)表示之重複單元的聚醯胺酸、及下述通式(3)表示之化合物(Y)。 [化7] (式(2)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基。式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,n為0~2。) The polymer (X) contains at least one selected from the group consisting of the repeating units represented by the above-mentioned general formula (1) and the repeating units represented by the above-mentioned general formula (2). It may contain only one of the repeating units represented by the above-mentioned general formula (1) or the repeating units represented by the above-mentioned general formula (2), or it may contain both. That is, the polymer composition of the present invention may be a polyamic acid composition containing: a polyimide containing the repeating units represented by the following general formula (1) and a compound (Y) represented by the following general formula (3), [Chemistry 6] (In formula (1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring. In formula (3), R3 is at least one selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, and n is 0 to 2.) It may also be a polyamide composition comprising: a polyamide containing a repeating unit represented by the following general formula (2), and a compound (Y) represented by the following general formula (3). [Chemistry 7] (In formula (2), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms. In formula (3), R3 is at least one selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, and n is 0 to 2.)

聚合物(X)中宜含有上述通式(1)表示之重複單元,較宜含有上述通式(1)表示之重複單元及上述通式(2)表示之重複單元之兩者。The polymer (X) preferably contains the repeating unit represented by the above general formula (1), and more preferably contains both the repeating unit represented by the above general formula (1) and the repeating unit represented by the above general formula (2).

上述式(1)中,X 1為具有脂環結構或芳香族環之4價之基。X 1,宜為從成為後述之來自四羧酸二酐之結構單元A之原料之四羧酸二酐中去除2個二酸酐部分(4個羧基部分)者。 上述式(2)中,X 2為具有脂環結構或芳香族環之4價之基。X 2,宜為從成為後述之來自四羧酸二酐之結構單元A之原料之四羧酸二酐中去除2個二酸酐部分(4個羧基部分)者。 上述式(2)中,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基,宜為氫。 In the above formula (1), X 1 is a tetravalent group having an alicyclic structure or an aromatic ring. X 1 is preferably a group obtained by removing two dianhydride moieties (four carboxyl groups) from tetracarboxylic dianhydride, which is a raw material for the structural unit A from tetracarboxylic dianhydride described below. In the above formula (2), X 2 is a tetravalent group having an alicyclic structure or an aromatic ring. X 2 is preferably a group obtained by removing two dianhydride moieties (four carboxyl groups) from tetracarboxylic dianhydride, which is a raw material for the structural unit A from tetracarboxylic dianhydride described below. In the above formula (2), R 1 and R 2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms, and are preferably hydrogen.

(聚合物(X)之結構) 如同上述,聚合物(X)中,含有選自於由上述通式(1)表示之重複單元及上述通式(2)表示之重複單元構成之群組中之至少一種,可僅含有上述通式(1)表示之重複單元、或上述通式(2)表示之重複單元中之任一種,亦可含有兩者,特別是就減低黃色度、改善透明性之觀點來看,相對於上述聚合物(X)之全部重複單元,上述式(1)表示之重複單元以10莫耳%以上為佳,以30莫耳%以上為較佳,以50莫耳%以上為更佳,以70莫耳%以上為再更佳,以90莫耳%以上為再更佳,為100莫耳%以下。 此外,就維持低黃色度的同時,亦改善耐熱性之觀點來看,相對於上述聚合物(X)之全部重複單元,上述式(2)表示之重複單元以10莫耳%以上為佳,以30莫耳%以上為較佳,以50莫耳%以上為更佳,以70莫耳%以上為再更佳,以90莫耳%以上為再更佳,為100莫耳%以下。 此外,當含有上述通式(1)表示之重複單元及上述通式(2)表示之重複單元之兩者時,上述通式(1)表示之重複單元與上述通式(2)表示之重複單元之莫耳比[(1)/(2)],以10/90~70/30為佳,以20/80~60/40為較佳,以25/75~55/45為更佳。 (Structure of Polymer (X)) As described above, polymer (X) contains at least one member selected from the group consisting of repeating units represented by the above-mentioned general formula (1) and repeating units represented by the above-mentioned general formula (2). It may contain only the repeating units represented by the above-mentioned general formula (1) or the repeating units represented by the above-mentioned general formula (2), or both. In particular, from the viewpoint of reducing yellowness and improving transparency, the repeating units represented by the above-mentioned formula (1) are preferably present in an amount of 10 mol% or more, more preferably 30 mol% or more, more preferably 50 mol% or more, even more preferably 70 mol% or more, even more preferably 90 mol% or more, and not more than 100 mol%. Furthermore, from the perspective of maintaining low yellowness while also improving heat resistance, the content of the repeating units represented by the above formula (2) relative to the total repeating units of the above polymer (X) is preferably 10 mol% or more, more preferably 30 mol% or more, more preferably 50 mol% or more, even more preferably 70 mol% or more, even more preferably 90 mol% or more, and not more than 100 mol%. In addition, when both the repeating units represented by the above general formula (1) and the repeating units represented by the above general formula (2) are contained, the molar ratio [(1)/(2)] of the repeating units represented by the above general formula (1) to the repeating units represented by the above general formula (2) is preferably 10/90 to 70/30, more preferably 20/80 to 60/40, and even more preferably 25/75 to 55/45.

<聚合物(X)之各結構單元> 聚合物(X),含有選自於由上述通式(1)表示之重複單元及上述通式(2)表示之重複單元構成之群組中之至少一種,以下說明構成該聚合物的結構單元。 <Structural Units of Polymer (X)> Polymer (X) contains at least one type selected from the group consisting of the repeating units represented by the above-mentioned general formula (1) and the repeating units represented by the above-mentioned general formula (2). The structural units constituting the polymer are described below.

聚合物(X),具有來自四羧酸二酐之結構單元A及來自二胺之結構單元B。 另外,雖然在上述通式(1)表示之重複單元中,結構單元A及結構單元B會形成醯亞胺結構,在上述通式(2)表示之重複單元中結構單元A及結構單元B會形成醯胺酸結構,兩者皆是將來自四羧酸二酐之結構單元總稱為結構單元A,將來自二胺之結構單元總稱為結構單元B。 The polymer (X) has a structural unit A derived from tetracarboxylic dianhydride and a structural unit B derived from a diamine. Furthermore, although in the repeating unit represented by the general formula (1), the structural units A and B form an imide structure, and in the repeating unit represented by the general formula (2), the structural units A and B form an amide structure, in both cases, the structural units derived from tetracarboxylic dianhydride are collectively referred to as structural units A, and the structural units derived from diamine are collectively referred to as structural units B.

(結構單元A) 結構單元A係來自四羧酸二酐之結構單元,係選自於由來自脂環族四羧酸二酐之結構單元及來自芳香族四羧酸二酐之結構單元構成之群組中之至少一種,就低黃色度及透明性之觀點來看,宜為來自脂環族四羧酸二酐之結構單元,就耐熱性之觀點來看,宜為來自芳香族四羧酸二酐之結構單元。 (Structural Unit A) Structural Unit A is a tetracarboxylic dianhydride-derived structural unit, and is at least one selected from the group consisting of structural units derived from alicyclic tetracarboxylic dianhydrides and structural units derived from aromatic tetracarboxylic dianhydrides. From the perspective of low yellowness and transparency, structural units derived from alicyclic tetracarboxylic dianhydrides are preferred, while from the perspective of heat resistance, structural units derived from aromatic tetracarboxylic dianhydrides are preferred.

作為提供來自脂環族四羧酸二酐之結構單元的脂環族四羧酸二酐,可舉例1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸二酐、雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、二環己基四羧酸二酐、5,5'-(1,4-伸苯基)-雙[六氫-4,7-甲異苯并呋喃-1,3-二酮]、5,5’-雙-2-降莰烯-5,5’,6,6’-四羧酸-5,5’,6,6’-二酸酐、或此等之位置異構物等。 此等之中,就低黃色度及透明性之觀點來看,宜為下式(a1)表示之化合物,結構單元A宜含有來自式(a1)表示之化合物之結構單元(A1)。 [化8] 式(a1)表示之化合物,為降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸二酐。 Examples of the alicyclic tetracarboxylic dianhydride providing a structural unit derived from an alicyclic tetracarboxylic dianhydride include 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, bicyclo[2.2.2] Oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyltetracarboxylic dianhydride, 5,5'-(1,4-phenylene)-bis[hexahydro-4,7-methylisobenzofuran-1,3-dione], 5,5'-bis-2-norbornene-5,5',6,6'-tetracarboxylic dianhydride, or positional isomers thereof. Among these, compounds represented by the following formula (a1) are preferred from the viewpoint of low yellowness and transparency, and structural unit A preferably contains structural unit (A1) derived from the compound represented by formula (a1). [Chemistry 8] The compound represented by formula (a1) is norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride.

提供來自芳香族四羧酸二酐之結構單元之芳香族四羧酸二酐,可舉例聯苯四羧酸二酐(BPDA)、9,9-雙(3,4-二羧基苯基)茀二酸酐(BPAF)、焦蜜石酸二酐、3,3’,4,4’-(六氟異亞丙基)二鄰苯二甲酸酐、3,3’,4,4’-二苯碸四羧酸二酐、3,3’,4,4’-二苯基酮四羧酸二酐、2,2’,3,3’-二苯基酮四羧酸二酐等。 此等之中,就兼具耐熱性及低黃色度之觀點來看,宜為選自於由下式(a2)表示之化合物及下式(a3)表示之化合物構成之群組中之至少一種,較宜為下式(a2)表示之化合物。 即,結構單元A宜含有選自於由來自下式(a2)表示之化合物之結構單元(A2)及來自下式(a3)表示之化合物之結構單元(A3)構成之群組中之至少一種,較宜含有來自下式(a2)表示之化合物之結構單元(A2)。 [化9] Aromatic tetracarboxylic dianhydrides having structural units derived from aromatic tetracarboxylic dianhydrides include, for example, biphenyltetracarboxylic dianhydride (BPDA), 9,9-bis(3,4-dicarboxyphenyl)fluoran anhydride (BPAF), pyromelitic dianhydride, 3,3',4,4'-(hexafluoroisopropylidene)diphthalic anhydride, 3,3',4,4'-diphenylsulfonate tetracarboxylic dianhydride, 3,3',4,4'-diphenylketone tetracarboxylic dianhydride, and 2,2',3,3'-diphenylketone tetracarboxylic dianhydride. Among these, from the perspective of achieving both heat resistance and low yellowness, at least one compound selected from the group consisting of compounds represented by the following formula (a2) and compounds represented by the following formula (a3) is preferred, and the compound represented by the following formula (a2) is more preferred. That is, the structural unit A preferably contains at least one selected from the group consisting of the structural unit (A2) derived from the compound represented by the following formula (a2) and the structural unit (A3) derived from the compound represented by the following formula (a3), and more preferably contains the structural unit (A2) derived from the compound represented by the following formula (a2). [Chemistry 9]

式(a2)表示之化合物為聯苯四羧酸二酐(BPDA),其具體例可舉例下式(a2s)表示之3,3’,4,4’-聯苯四羧酸二酐(s-BPDA)、下式(a2a)表示之2,3,3’,4’-聯苯四羧酸二酐(a-BPDA)、下式(a2i)表示之2,2’,3,3’-聯苯四羧酸二酐(i-BPDA)。其中宜為下式(a2s)表示之3,3’,4,4’-聯苯四羧酸二酐(s-BPDA)。 [化10] The compound represented by formula (a2) is biphenyltetracarboxylic dianhydride (BPDA). Specific examples thereof include 3,3',4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) represented by formula (a2s), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA) represented by formula (a2a), and 2,2',3,3'-biphenyltetracarboxylic dianhydride (i-BPDA) represented by formula (a2i). Among them, 3,3',4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) represented by formula (a2s) is preferred. [Chemical 10]

式(a3)表示之化合物為9,9’-雙(3,4-二羧基苯基)茀二酸酐(BPAF)。The compound represented by formula (a3) is 9,9'-bis(3,4-dicarboxyphenyl)fluoranic anhydride (BPAF).

結構單元A可含有芳香族四羧酸二酐及脂環族四羧酸二酐以外之結構單元。提供如此之結構單元之四羧酸二酐,並無特別限制,可舉例1,2,3,4-丁烷四羧酸二酐等脂肪族四羧酸二酐。 結構單元A中任意含有的結構單元,可為1種,亦可為2種以上。 另外,在本說明書中,芳香族四羧酸二酐意為含有1個以上之芳香環的四羧酸二酐;脂環族四羧酸二酐意為含有1個以上之脂環,且不含有芳香環的四羧酸二酐;脂肪族四羧酸二酐意為不含有芳香環也不含有脂環之四羧酸二酐。 Structural unit A may contain structural units other than aromatic tetracarboxylic dianhydrides and alicyclic tetracarboxylic dianhydrides. The tetracarboxylic dianhydrides providing such structural units are not particularly limited, and examples include aliphatic tetracarboxylic dianhydrides such as 1,2,3,4-butanetetracarboxylic dianhydride. The structural units optionally contained in structural unit A may be one or two or more. In this specification, aromatic tetracarboxylic dianhydrides refer to tetracarboxylic dianhydrides containing one or more aromatic rings; alicyclic tetracarboxylic dianhydrides refer to tetracarboxylic dianhydrides containing one or more alicyclic rings and no aromatic rings; and aliphatic tetracarboxylic dianhydrides refer to tetracarboxylic dianhydrides containing neither aromatic nor alicyclic rings.

(結構單元B) 結構單元B係來自二胺之結構單元,含有來自式(b1)表示之化合物之結構單元(B1)。 藉由結構單元B中含有結構單元(B1)而耐熱性優良,特別是與化合物(Y)組合時,減低黃色度之效果優良。 結構單元B中之結構單元(B1)之比率,以45莫耳%以上為佳,以70莫耳%以上為較佳,以90莫耳%以上為更佳,以99莫耳%以上為特佳。該比率之上限值並無特別限定,為100莫耳%以下。 [化11] (Structural unit B) Structural unit B is a structural unit derived from a diamine and contains a structural unit (B1) derived from a compound represented by formula (b1). Due to the inclusion of structural unit (B1) in structural unit B, heat resistance is excellent, and in particular, when combined with compound (Y), the effect of reducing yellowness is excellent. The ratio of structural unit (B1) in structural unit B is preferably 45 mol% or more, more preferably 70 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of this ratio is not particularly limited and is 100 mol% or less. [Chemical 11]

結構單元(B1),宜含有來自下式(b11)表示之化合物之結構單元(B11)。結構單元(B1),較宜為來自下式(b11)表示之化合物之結構單元(B11)。 [化12] The structural unit (B1) preferably contains a structural unit (B11) derived from a compound represented by the following formula (b11). The structural unit (B1) preferably contains a structural unit (B11) derived from a compound represented by the following formula (b11). [Chemical 12]

式(b11)表示之化合物,為2,2’-雙(三氟甲基)-4,4’-二胺二苯基醚(6FODA)。 藉由結構單元B中含有結構單元(B11),特別是與化合物(Y)組合時,減低黃色度之效果優良。 The compound represented by formula (b11) is 2,2'-bis(trifluoromethyl)-4,4'-diaminediphenyl ether (6FODA). By including structural unit (B11) in structural unit B, particularly when combined with compound (Y), the yellowness is significantly reduced.

結構單元B可含有結構單元(B1)以外之結構單元。作為提供如此之結構單元的二胺,並無特別限制,可舉例4-胺苯基-4-胺基苯甲酸(4-BAAB)、3,5-二胺基苯甲酸(3,5-DABA)、9,9-雙(4-胺苯基)茀、1,4-伸苯基二胺、p-亞二甲苯二胺、1,5-二胺萘、2,2’-二甲基聯苯-4,4’-二胺、2,2’-二甲基聯苯-4,4’-二胺、4,4’-二胺二苯甲烷、1,4-雙[2-(4-胺苯基)-2-丙基]苯、2,2-雙(4-胺苯基)六氟丙烷、4,4’-二胺基苯甲醯胺苯、1-(4-胺苯基)-2,3-二氫-1,3,3-三甲基-1H-茚-5-胺、α,α’-雙(4-胺苯基)-1,4-二異丙基苯、N,N’-雙(4-胺苯基)對苯醯胺、2,2-雙(3-胺-4-羥苯)六氟丙烷、及1,4-雙(4-胺苯氧基)苯等芳香族二胺;1,3-雙(胺甲基)環己烷、及1,4-雙(胺甲基)環己烷等脂環族二胺;以及乙二胺及己二胺等脂肪族二胺。Structural unit B may contain structural units other than structural unit (B1). There are no particular restrictions on the diamines that provide such structural units, and examples thereof include 4-aminophenyl-4-aminobenzoic acid (4-BAAB), 3,5-diaminobenzoic acid (3,5-DABA), 9,9-bis(4-aminophenyl)fluorene, 1,4-phenylenediamine, p-xylylenediamine, 1,5-naphthalenediamine, 2,2'-dimethylbiphenyl-4,4'-diamine, 2,2'-dimethylbiphenyl-4,4'-diamine, 4,4'-diaminodiphenylmethane, 1,4-bis[2-(4-aminophenyl)-2-propyl]benzene, 2,2-bis(4-aminophenyl)- Aromatic diamines such as bis(4-aminophenyl)hexafluoropropane, 4,4'-diaminobenzamide, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-inden-5-amine, α,α'-bis(4-aminophenyl)-1,4-diisopropylbenzene, N,N'-bis(4-aminophenyl)-p-phenylamide, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, and 1,4-bis(4-aminophenoxy)benzene; aliphatic diamines such as 1,3-bis(aminomethyl)cyclohexane and 1,4-bis(aminomethyl)cyclohexane; and aliphatic diamines such as ethylenediamine and hexamethylenediamine.

此等之中,宜為下式(b2)表示之化合物,結構單元B宜含有來自式(b2)表示之化合物的結構單元(B2)。 [化13] 式(b2)表示之化合物,為4-胺苯基-4-胺基苯甲酸(4-BAAB)。 Among these, the compound represented by the following formula (b2) is preferred, and the structural unit B preferably contains a structural unit (B2) derived from the compound represented by formula (b2). [Chemistry 13] The compound represented by formula (b2) is 4-aminophenyl-4-aminobenzoic acid (4-BAAB).

另外,在本說明書中,芳香族二胺意為含有1個以上之芳香環的二胺;脂環族二胺意為含有1個以上之脂環,且不含有芳香環的二胺;脂肪族二胺意為不含有芳香環也不含有脂環的二胺。 結構單元B中任意含有的結構單元,可為1種,亦可為2種以上。 In this specification, an aromatic diamine refers to a diamine containing one or more aromatic rings; an alicyclic diamine refers to a diamine containing one or more alicyclic rings and no aromatic rings; and an aliphatic diamine refers to a diamine containing neither aromatic nor alicyclic rings. The structural units optionally contained in structural unit B may be one or more.

(聚合物(X)之製造方法) 聚合物(X)可透過任何方法來製造,宜為以下的方法。 如同上述,聚合物(X)含有上述通式(1)表示之重複單元(即,醯亞胺部分)、及上述通式(2)表示之重複單元(即,醯胺酸部分)中之任一種,或含有兩者,可藉由變換製造方法來調節此等。 具體來說,在當含有式(1)表示之重複單元及式(2)表示之重複單元之兩者時之製造方法(醯亞胺-醯胺酸共聚物之製造方法)中,藉由僅使用製造含有以式(1)表示之重複單元為主之部分(聚醯亞胺部分)之步驟,可得到實質上由式(1)表示之重複單元構成的聚合物(X)(聚醯亞胺);藉由僅使用製造含有以式(2)表示之重複單元為主之部分(聚醯胺酸部分)之步驟,可得到實質上由式(2)表示之重複單元構成的聚合物(X)(聚醯胺酸)。 (Production Method of Polymer (X)) Polymer (X) can be produced by any method, but the following method is preferred. As described above, polymer (X) contains either or both of the repeating units represented by general formula (1) (i.e., the imide moiety) and the repeating units represented by general formula (2) (i.e., the amide moiety). This can be adjusted by varying the production method. Specifically, in the production method (production method of an imide-amide copolymer) when both the repeating unit represented by formula (1) and the repeating unit represented by formula (2) are contained, by using only the step of producing the portion (polyimide portion) containing the repeating unit represented by formula (1) as the main component, a polymer (X) (polyamide) substantially composed of the repeating unit represented by formula (1) can be obtained; by using only the step of producing the portion (polyamide portion) containing the repeating unit represented by formula (2) as the main component, a polymer (X) (polyamide) substantially composed of the repeating unit represented by formula (2) can be obtained.

含有式(1)表示之重複單元及式(2)表示之重複單元之兩者的聚合物(X)(以下亦稱為醯亞胺-醯胺酸共聚物),宜使用以下具有下述步驟1及步驟2的方法。 步驟1:使構成醯亞胺部分的四羧酸成分與二胺成分進行反應,得到醯亞胺寡聚物之步驟 步驟2:使在步驟1中得到的醯亞胺寡聚物,與構成醯胺酸部分的四羧酸成分及二胺成分進行反應,得到醯亞胺-醯胺酸共聚物之步驟 A polymer (X) containing both the repeating unit represented by formula (1) and the repeating unit represented by formula (2) (hereinafter also referred to as an imide-amide copolymer) is preferably prepared by a method comprising the following steps 1 and 2. Step 1: A step of reacting a tetracarboxylic acid component constituting the imide portion with a diamine component to obtain an imide oligomer. Step 2: A step of reacting the imide oligomer obtained in step 1 with a tetracarboxylic acid component and a diamine component constituting the amide portion to obtain an imide-amide copolymer.

另外,藉由在步驟1使全部的四羧酸成分與二胺成分反應,可得到實質上由式(1)表示之重複單元構成之聚合物(X)(聚醯亞胺)。具體來說,實質上由式(1)表示之重複單元構成之聚合物(X)(聚醯亞胺)之製造方法,係將上述步驟1解讀為「使構成聚醯亞胺之四羧酸成分與二胺成分進行反應,得到聚醯亞胺之步驟」。 此外,不進行步驟1,藉由在步驟2使全部的四羧酸成分與二胺成分反應,可得到實質上由式(2)表示之重複單元構成之聚合物(X)(聚醯胺酸)。具體來說,實質上由式(2)表示之重複單元構成之聚合物(X)(聚醯胺酸)之製造方法,係將上述步驟2解讀為「使構成聚醯胺酸之四羧酸成分與二胺成分進行反應,得到聚醯胺酸之步驟」。 Alternatively, by reacting the entire tetracarboxylic acid component with the diamine component in step 1, a polymer (X) (polyimide) consisting essentially of repeating units represented by formula (1) can be obtained. Specifically, the method for producing a polymer (X) (polyimide) consisting essentially of repeating units represented by formula (1) is to interpret step 1 as "a step of reacting the tetracarboxylic acid component constituting the polyimide with the diamine component to obtain the polyimide." Alternatively, by reacting the entire tetracarboxylic acid component with the diamine component in step 2 without performing step 1, a polymer (X) (polyamide) consisting essentially of repeating units represented by formula (2) can be obtained. Specifically, the method for producing a polymer (X) (polyamide) substantially composed of repeating units represented by formula (2) is to interpret the above-mentioned step 2 as "a step of reacting a tetracarboxylic acid component constituting polyamide with a diamine component to obtain polyamide."

〔步驟1〕 步驟1,係使構成醯亞胺部分之四羧酸成分與二胺成分進行反應,得到醯亞胺寡聚物之步驟。 步驟1中使用的四羧酸成分宜含有提供結構單元(A1)之化合物,宜在步驟1中使用其全部量,亦可含有提供結構單元(A1)之化合物以外之四羧酸成分。提供結構單元(A1)之化合物以外之四羧酸成分,宜為提供結構單元(A2)之化合物或提供結構單元(A3)之化合物。 步驟1中使用的二胺成分宜含有提供結構單元(B1)之化合物,在不損及本發明之效果之範圍內,亦可含有提供結構單元(B1)之化合物以外之二胺成分。提供結構單元(B1)之化合物以外之四羧酸成分,宜為提供結構單元(B2)之化合物。 在步驟1中,二胺成分相對於四羧酸成分,以1.01~2莫耳為佳,以1.05~1.9莫耳為較佳,以1.1~1.7莫耳為更佳。 另外,在得到實質上由式(1)表示之重複單元構成之聚合物(X)(聚醯亞胺)之情形,二胺成分相對於四羧酸成分,以0.9~1.1莫耳為佳。 [Step 1] Step 1 is a step of reacting a tetracarboxylic acid component constituting the imide moiety with a diamine component to obtain an imide oligomer. The tetracarboxylic acid component used in Step 1 preferably contains a compound that provides structural unit (A1), and is preferably used in its entirety in Step 1. It may also contain a tetracarboxylic acid component other than the compound that provides structural unit (A1). The tetracarboxylic acid component other than the compound that provides structural unit (A1) is preferably a compound that provides structural unit (A2) or a compound that provides structural unit (A3). The diamine component used in Step 1 preferably contains a compound that provides structural unit (B1). It may also contain a diamine component other than the compound that provides structural unit (B1) as long as it does not impair the effects of the present invention. The tetracarboxylic acid component other than the compound providing structural unit (B1) is preferably a compound providing structural unit (B2). In step 1, the diamine component is preferably present in an amount of 1.01 to 2 mol, more preferably 1.05 to 1.9 mol, and even more preferably 1.1 to 1.7 mol relative to the tetracarboxylic acid component. In addition, when obtaining a polymer (X) (polyimide) substantially composed of repeating units represented by formula (1), the diamine component is preferably present in an amount of 0.9 to 1.1 mol relative to the tetracarboxylic acid component.

為了在步驟1得到醯亞胺寡聚物之使四羧酸成分與二胺成分進行反應之方法並無特別限制,可使用公知之方法。 具體的反應方法可舉例:(1)在反應器中裝入四羧酸成分、二胺成分及反應溶劑,在10~110℃下攪拌0.5~30小時,然後昇溫並進行醯亞胺化反應之方法、(2)在反應器中裝入二胺成分及反應溶劑並溶解後,裝入四羧酸成分,因應需要在10~110℃下攪拌0.5~30小時,然後昇溫並進行醯亞胺化反應之方法、(3)在反應器中裝入四羧酸成分、二胺成分及反應溶劑,直接昇溫並進行醯亞胺化反應之方法等。 The method for reacting the tetracarboxylic acid component and the diamine component to obtain the imide oligomer in step 1 is not particularly limited, and a known method can be used. Specific reaction methods include: (1) a method in which the tetracarboxylic acid component, the diamine component, and the reaction solvent are charged into a reactor, stirred at 10 to 110°C for 0.5 to 30 hours, and then the temperature is raised to carry out the imidization reaction; (2) a method in which the diamine component and the reaction solvent are charged into a reactor and dissolved, and then the tetracarboxylic acid component is charged, stirred at 10 to 110°C for 0.5 to 30 hours as needed, and then the temperature is raised to carry out the imidization reaction; (3) a method in which the tetracarboxylic acid component, the diamine component, and the reaction solvent are charged into a reactor, and the temperature is directly raised to carry out the imidization reaction.

醯亞胺化反應,宜為使用迪安-斯塔克(Dean-Stark)裝置等,去除在製造時產生的水的同時進行反應。藉由進行如此之操作,能夠更加地提升聚合度及醯亞胺化率。The imidization reaction is preferably carried out using a Dean-Stark apparatus or the like, while removing the water generated during the production. This operation can further increase the degree of polymerization and the imidization rate.

在上述之醯亞胺化反應中可使用公知的醯亞胺化觸媒。醯亞胺化觸媒,可舉例鹼觸媒或酸觸媒。 鹼觸媒,可舉例吡啶、喹啉、異喹啉、α-甲吡啶、β-甲吡啶、2,4-二甲吡啶、2,6-二甲吡啶、三甲胺、三乙胺、三丙胺、三丁胺、三乙二胺、咪唑、N,N-二甲基苯胺、N,N-二乙基苯胺等有機鹼觸媒、氫氧化鉀及氫氧化鈉、碳酸鉀、碳酸鈉、碳酸氫鉀、碳酸氫鈉等無機鹼觸媒。 此外,酸觸媒,可舉例巴豆酸、丙烯酸、反式-3-己烯酸、桂皮酸、苯甲酸、甲基苯甲酸、氧基苯甲酸、對苯二甲酸、苯磺酸、對甲苯磺酸、萘磺酸等。上述之醯亞胺化觸媒可單獨使用或組合2種以上使用。 上述之中,就操作性之觀點來看,宜為鹼觸媒,較宜為有機鹼觸媒,更宜為選自於三乙胺及三乙二胺中1種以上,再更宜為三乙胺。 In the above-mentioned imidization reaction, a known imidization catalyst can be used. Examples of the imidization catalyst include alkaline catalysts and acid catalysts. Examples of alkaline catalysts include organic alkaline catalysts such as pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, triethylenediamine, imidazole, N,N-dimethylaniline, and N,N-diethylaniline; and inorganic alkaline catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium bicarbonate, and sodium bicarbonate. Examples of acid catalysts include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid, and naphthalenesulfonic acid. These imidization catalysts may be used alone or in combination of two or more. Among these, from the perspective of operability, base catalysts are preferred, more preferably organic base catalysts, more preferably at least one selected from triethylamine and triethylenediamine, and even more preferably triethylamine.

醯亞胺化反應之溫度,就反應率及抑制膠凝等之觀點來看,以120~250℃為佳,以160~200℃為較佳。此外,反應時間,從產生水的餾出開始後,宜為0.5~10小時。The temperature of the imidization reaction is preferably 120-250°C, more preferably 160-200°C, from the viewpoint of reaction rate and suppression of gelation. Furthermore, the reaction time is preferably 0.5-10 hours from the start of distillation of the generated water.

步驟1得到的醯亞胺寡聚物宜具有由提供結構單元(A1)之化合物及提供結構單元(B1)之化合物所形成的醯亞胺重複結構單元。 藉由上述方法,可得到含有已溶解在溶劑中的醯亞胺寡聚物之溶液。含有步驟1得到的醯亞胺寡聚物之溶液中,在不損及本發明之效果之範圍內,亦可含有在步驟1中作為四羧酸成分及二胺成分使用的成分中之至少一部分作為未反應單體。 The imide oligomer obtained in step 1 preferably has an imide repeating structural unit formed from a compound providing structural unit (A1) and a compound providing structural unit (B1). The above method can produce a solution containing the imide oligomer dissolved in a solvent. The solution containing the imide oligomer obtained in step 1 may contain at least a portion of the components used as the tetracarboxylic acid component and the diamine component in step 1 as unreacted monomers, as long as the effects of the present invention are not impaired.

〔步驟2〕 本發明之製造方法中的步驟2,係使在步驟1中得到的醯亞胺寡聚物與構成醯胺酸部分的四羧酸成分及二胺成分進行反應,得到醯亞胺-醯胺酸共聚物之步驟。 [Step 2] Step 2 of the production method of the present invention involves reacting the imide oligomer obtained in Step 1 with a tetracarboxylic acid component and a diamine component constituting the amide portion to produce an imide-amide copolymer.

步驟2中使用的四羧酸成分,宜含有提供結構單元(A1)之化合物,宜將其全部量使用於步驟1,亦可含有提供結構單元(A1)之化合物以外之四羧酸成分。提供結構單元(A1)之化合物以外之四羧酸成分,宜為提供結構單元(A2)之化合物或提供結構單元(A3)之化合物。 步驟2中使用的二胺成分,宜含有提供結構單元(B1)之化合物,在不損及本發明之效果之範圍內,亦可含有提供結構單元(B1)之化合物以外之二胺成分。提供結構單元(B1)之化合物以外之四羧酸成分,宜為提供結構單元(B2)之化合物。 另外,當藉由只進行步驟2,而得到實質上由式(2)表示之重複單元構成之聚合物(X)(聚醯胺酸)時,宜將相對於四羧酸成分的二胺成分設為0.9~1.1莫耳。 The tetracarboxylic acid component used in Step 2 preferably contains a compound that provides structural unit (A1), and the entire amount thereof is preferably used in Step 1. It may also contain a tetracarboxylic acid component other than the compound that provides structural unit (A1). The tetracarboxylic acid component other than the compound that provides structural unit (A1) is preferably a compound that provides structural unit (A2) or a compound that provides structural unit (A3). The diamine component used in Step 2 preferably contains a compound that provides structural unit (B1). It may also contain a diamine component other than the compound that provides structural unit (B1) as long as the effects of the present invention are not impaired. The tetracarboxylic acid component other than the compound that provides structural unit (B1) is preferably a compound that provides structural unit (B2). In addition, when a polymer (X) (polyamide) substantially composed of repeating units represented by formula (2) is obtained by performing only step 2, the diamine component is preferably set to 0.9 to 1.1 mol relative to the tetracarboxylic acid component.

步驟2中,使四羧酸成分及二胺成分與步驟1中得到的醯亞胺寡聚物進行反應之方法並無特別限制,可使用公知之方法。 具體的反應方法,可舉例(1)在反應器中裝入步驟1中得到的醯亞胺寡聚物、四羧酸成分、二胺成分及溶劑,在0~120℃,宜為在5~80℃之範圍攪拌1~72小時之方法、(2)在反應器中裝入步驟1中得到的醯亞胺寡聚物及溶劑並溶解後,裝入四羧酸成分、二胺成分,在0~120℃,宜為在5~80℃之範圍攪拌1~72小時之方法等。 當在80℃以下進行反應時,由於步驟2中得到的共聚物之分子量並不會取決於聚合時之溫度經歷而變動,此外亦可抑制熱醯亞胺化之進行,能夠穩定地製造該共聚物。 In step 2, the method for reacting the tetracarboxylic acid component and the diamine component with the imide oligomer obtained in step 1 is not particularly limited, and a known method can be used. Specific reaction methods include (1) a method in which the imide oligomer obtained in step 1, the tetracarboxylic acid component, the diamine component, and the solvent are charged into a reactor and stirred at a temperature in the range of 0 to 120°C, preferably 5 to 80°C, for 1 to 72 hours; (2) a method in which the imide oligomer obtained in step 1 and the solvent are charged into a reactor and dissolved, and then the tetracarboxylic acid component and the diamine component are charged and stirred at a temperature in the range of 0 to 120°C, preferably 5 to 80°C, for 1 to 72 hours. When the reaction is carried out below 80°C, the molecular weight of the copolymer obtained in step 2 does not vary depending on the temperature history during polymerization. Furthermore, the progress of thermal imidization is suppressed, enabling stable production of the copolymer.

藉由上述方法,可得到含有已溶解在溶劑中的醯亞胺-醯胺酸共聚物之共聚物溶液。此外,藉由只進行步驟1可得到含有聚醯亞胺之聚醯亞胺溶液,藉由只進行步驟2可得到含有聚醯胺酸之聚醯胺酸溶液。 得到的溶液中之共聚物之濃度,一般為1~50質量%,以3~35質量%為佳,以5~30質量%之範圍為較佳。 此外,得到的溶液中之聚醯亞胺脂濃度,一般為1~50質量%,以3~35質量%為佳,以5~30質量%之範圍為較佳。 並且,得到的溶液中之聚醯胺酸之濃度,一般為1~50質量%,以3~35質量%為佳,以5~30質量%之範圍為較佳。 The above method can produce a copolymer solution containing an imide-amidite copolymer dissolved in a solvent. Alternatively, by performing only step 1, a polyimide solution containing polyimide can be obtained, and by performing only step 2, a polyamidite solution containing polyamidite can be obtained. The copolymer concentration in the resulting solution is generally 1-50% by mass, preferably 3-35% by mass, and more preferably 5-30% by mass. The polyimide resin concentration in the resulting solution is generally 1-50% by mass, preferably 3-35% by mass, and more preferably 5-30% by mass. Furthermore, the concentration of polyamine in the resulting solution is generally 1-50% by mass, preferably 3-35% by mass, and more preferably 5-30% by mass.

以上述製造方法得到的醯亞胺-醯胺酸共聚物之數目平均分子量,就得到的聚醯亞胺薄膜之機械強度之觀點來看,以5,000~500,000為佳。此外,重量平均分子量(Mw),就相同之觀點來看,以10,000~800,000為佳,以100,000~300,000為較佳。另外,該共聚物之數目平均分子量及重量平均分子量,例如,可藉由由膠濾層析法測定所得之標準聚甲基甲基丙烯酸酯(PMMA)換算值來求得。 以上述製造方法得到的聚醯亞胺之數目平均分子量,就得到的聚醯亞胺薄膜之機械的強度之觀點來看,以5,000~500,000為佳。此外,重量平均分子量(Mw),就相同之觀點來看,以10,000~800,000為佳,以100,000~300,000為較佳。 以上述製造方法得到的聚醯胺酸之數目平均分子量,就得到的聚醯亞胺薄膜之機械強度之觀點來看,以5,000~500,000為佳。此外,重量平均分子量(Mw),就相同之觀點來看,以10,000~800,000為佳,以100,000~300,000為較佳。 接著說明用於本製造方法中的原料等。 The number average molecular weight of the imide-amidite copolymer obtained by the above production method is preferably 5,000 to 500,000 from the perspective of the mechanical strength of the resulting polyimide film. Furthermore, the weight average molecular weight (Mw) is preferably 10,000 to 800,000, and more preferably 100,000 to 300,000. The number average molecular weight and weight average molecular weight of the copolymer can be determined, for example, by converting the values to standard polymethyl methacrylate (PMMA) measured by gel filtration chromatography. The number average molecular weight of the polyimide obtained by the above production method is preferably 5,000 to 500,000 from the perspective of the mechanical strength of the resulting polyimide film. Furthermore, from the same perspective, the weight-average molecular weight (Mw) is preferably 10,000 to 800,000, more preferably 100,000 to 300,000. The number-average molecular weight of the polyamide obtained by the above production method is preferably 5,000 to 500,000 from the perspective of the mechanical strength of the resulting polyimide film. Furthermore, from the same perspective, the weight-average molecular weight (Mw) is preferably 10,000 to 800,000, more preferably 100,000 to 300,000. Next, the raw materials used in this production method are described.

〔四羧酸成分〕 本製造方法中作為原料使用的四羧酸成分,就提供結構單元(A1)之化合物而言,可舉例式(a1)表示之化合物,但並不受限於此,在提供相同的結構單元之範圍內亦可為其衍生物。該衍生物,可舉例對應於式(a1)表示之化合物的四羧酸及該四羧酸之烷基酯。提供結構單元(A1)之化合物,宜為式(a1)表示之化合物。 同樣地,提供結構單元(A2)之化合物,可舉例式(a2)表示之化合物,但並不受限於此,在提供相同的結構單元之範圍內亦可為其衍生物。該衍生物,可舉例對應於式(a2)表示之化合物的四羧酸及該四羧酸之烷基酯。提供結構單元(A2)之化合物,宜為式(a2)表示之化合物。 並且,提供結構單元(A3)之化合物可舉例式(a3)表示之化合物,但並不受限於此,在提供相同的結構單元之範圍內亦可為其衍生物。該衍生物,可舉例對應於式(a3)表示之化合物的四羧酸及該四羧酸之烷基酯。提供結構單元(A3)之化合物,宜為式(a3)表示之化合物。 [Tetracarboxylic Acid Component] The tetracarboxylic acid component used as a raw material in this production method can be, for example, a compound represented by formula (a1), but is not limited thereto. A derivative thereof can also be used within the scope of providing the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the compound represented by formula (a1) and alkyl esters of such tetracarboxylic acids. The compound providing the structural unit (A1) is preferably a compound represented by formula (a1). Similarly, the compound providing the structural unit (A2) can be, for example, a compound represented by formula (a2), but is not limited thereto. A derivative thereof can also be used within the scope of providing the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the compound represented by formula (a2) and alkyl esters of such tetracarboxylic acids. The compound providing the structural unit (A2) is preferably a compound represented by formula (a2). Furthermore, the compound providing the structural unit (A3) may be, for example, a compound represented by formula (a3), but is not limited thereto and may also be a derivative thereof within the scope of providing the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the compound represented by formula (a3) and alkyl esters of such tetracarboxylic acids. The compound providing the structural unit (A3) is preferably a compound represented by formula (a3).

〔二胺成分〕 本製造方法中作為原料使用的二胺成分,就提供結構單元(B1)之化合物而言,可舉例二胺,但並不受限於此,在提供相同的結構單元之範圍內亦可為其衍生物。該衍生物,可舉例對應於二胺的二異氰酸酯。提供結構單元(B1)之化合物,宜為二胺。 同樣地,提供結構單元(B2)之化合物可舉例二胺,但並不受限於此,在提供相同的結構單元之範圍內亦可為其衍生物。該衍生物,可舉例對應於二胺的二異氰酸酯。提供結構單元(B2)之化合物,宜為二胺。 [Diamine Component] The diamine component used as a raw material in this production method can be, for example, a diamine, but is not limited to this, and can also be a derivative thereof within the scope of providing the same structural unit. Examples of such derivatives include diisocyanates corresponding to diamines. The compound providing structural unit (B1) is preferably a diamine. Similarly, the compound providing structural unit (B2) can be, for example, a diamine, but is not limited to this, and can also be a derivative thereof within the scope of providing the same structural unit. Examples of such derivatives include diisocyanates corresponding to diamines. The compound providing structural unit (B2) is preferably a diamine.

本發明中,在包含了步驟1及步驟2的共聚物之製造之全部步驟中使用的四羧酸成分及二胺成分之進料量比,宜為相對於四羧酸成分1莫耳,二胺成分為0.9~1.1莫耳。In the present invention, the feed ratio of the tetracarboxylic acid component and the diamine component used in all steps of the copolymer production including step 1 and step 2 is preferably 0.9 to 1.1 mol of the diamine component per 1 mol of the tetracarboxylic acid component.

〔封端劑〕 此外,在聚合物(X)之製造中,除了上述之四羧酸成分及二胺成分之外,亦可使用封端劑。當進行步驟1及2之兩者時,封端劑宜用於步驟2。 封端劑,宜為單胺類或是二羧酸類。導入的封端劑之進料量,相對於四羧酸成分1莫耳,宜為0.0001~0.1莫耳,特宜為0.001~0.06莫耳。單胺類封端劑,推薦為例如,甲胺、乙胺、丙胺、丁胺、苄胺、4-甲基苄胺、4-乙基苄胺、4-十二烷基苄胺、3-甲基苄胺、3-乙基苄胺、苯胺、3-甲基苯胺、4-甲基苯胺等。此等之中,可適宜使用苄胺、苯胺。二羧酸類封端劑,宜為二羧酸類,其一部分亦可閉環。推薦例如鄰苯二甲酸、鄰苯二甲酸酐、4-氯鄰苯二甲酸、四氟鄰苯二甲酸、2,3-二苯基酮二羧酸、3,4-二苯基酮二羧酸、環戊烷-1,2-二羧酸、4-環己烯-1,2-二羧酸等。此等之中,可適宜使用鄰苯二甲酸、鄰苯二甲酸酐。 [End-capping agent] In addition to the aforementioned tetracarboxylic acid component and diamine component, an end-capping agent may also be used in the production of polymer (X). When both steps 1 and 2 are performed, the end-capping agent is preferably used in step 2. The end-capping agent is preferably a monoamine or a dicarboxylic acid. The amount of the end-capping agent introduced is preferably 0.0001 to 0.1 mol, particularly preferably 0.001 to 0.06 mol, per 1 mol of the tetracarboxylic acid component. Recommended monoamine end-capping agents include, for example, methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-ethylbenzylamine, aniline, 3-methylaniline, and 4-methylaniline. Among these, benzylamine and aniline are preferably used. The dicarboxylic acid end-capping agent is preferably a dicarboxylic acid, some of which may be ring-closed. Recommended examples include phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-diphenyl ketone dicarboxylic acid, 3,4-diphenyl ketone dicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, and 4-cyclohexene-1,2-dicarboxylic acid. Among these, phthalic acid and phthalic anhydride are particularly suitable.

〔溶劑〕 用於聚合物(X)之製造方法中之溶劑,只要是能夠溶解所產生的醯亞胺-醯胺酸共聚物者即可。例如可舉例非質子性溶劑、酚系溶劑、醚系溶劑、碳酸酯系溶劑等。 [Solvent] The solvent used in the production method of polymer (X) can be any solvent capable of dissolving the resulting imide-amide copolymer. Examples include aprotic solvents, phenolic solvents, ether solvents, and carbonate solvents.

非質子性溶劑之具體例,可舉例N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮、N-甲基己內醯胺、1,3-二甲基咪唑啶酮、四甲基脲等醯胺系溶劑、γ-丁內酯、γ-戊內酯等內酯系溶劑、六甲基磷酸醯胺、六甲基膦三醯胺等含磷系醯胺系溶劑、二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑、丙酮、丁酮、環己酮、甲基環己酮等酮系溶劑、乙酸(2-甲氧基-1-甲乙基)等酯系溶劑等。Specific examples of aprotic solvents include amide solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, and tetramethylurea; lactone solvents such as γ-butyrolactone and γ-valerolactone; phosphorus-containing amide solvents such as hexamethylphosphamide and hexamethylphosphinotriamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and cyclobutane sulfone; ketone solvents such as acetone, butanone, cyclohexanone, and methylcyclohexanone; and ester solvents such as 2-methoxy-1-methylethyl acetic acid.

酚系溶劑之具體例,可舉例酚、鄰甲酚、間甲酚、對甲酚、2,3-二甲酚、2,4-二甲酚、2,5-二甲酚、2,6-二甲酚、3,4-二甲酚、3,5-二甲酚等。 醚系溶劑之具體例,可舉例1,2-二甲氧基乙烷、雙(2-甲氧基乙基)醚、1,2-雙(2-甲氧基乙氧基)乙烷、雙〔2-(2-甲氧基乙氧基)乙基〕醚、四氫呋喃、1,4-二㗁烷等。 碳酸酯系溶劑之具體例,可舉例碳酸乙酯、甲乙基碳酸酯、碳酸伸乙酯、碳酸伸丙酯等。 上述反應溶劑之中,宜為醯胺系溶劑或內酯系溶劑,較宜為醯胺系溶劑,更宜為N-甲基-2-吡咯啶酮。上述之反應溶劑可單獨或混合2種以上使用。 Specific examples of phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, and 3,5-xylenol. Specific examples of etheric solvents include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, bis[2-(2-methoxyethoxy)ethyl]ether, tetrahydrofuran, and 1,4-dioxane. Specific examples of carbonate-based solvents include ethyl carbonate, methyl ethyl carbonate, ethyl carbonate, and propyl carbonate. Among the above-mentioned reaction solvents, amide solvents or lactone solvents are preferred, amide solvents are more preferred, and N-methyl-2-pyrrolidone is even more preferred. The above-mentioned reaction solvents may be used alone or in combination of two or more.

<化合物(Y)> 本發明之聚合物組成物中含有的化合物(Y),係由下述通式(3)表示。 [化14] (式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,n為0~2。) 藉由含有化合物(Y),能夠得到具有耐熱性並且低黃色度之薄膜,並且可改善薄膜之透明性。 <Compound (Y)> The compound (Y) contained in the polymer composition of the present invention is represented by the following general formula (3). (In formula (3), R 3 is at least one selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, and n is 0 to 2.) By containing compound (Y), a film having heat resistance and low yellowness can be obtained, and the transparency of the film can be improved.

式(3)中,R 3為選自於由碳數1~30之烷基、苯基、烷氧基、丙烯醯基、甲基丙烯醯基、丙烯醯氧乙基、及甲基丙烯醯氧乙基構成之群組中之至少一種,宜為碳數1~30之烷基。 多數之R 3,可為相同或不同,宜為相同。 n為0~2,宜為1~2。 In formula (3), R 3 is at least one member selected from the group consisting of an alkyl group having 1 to 30 carbon atoms, a phenyl group, an alkoxy group, an acryl group, a methacryl group, an acryloxyethyl group, and a methacryloxyethyl group, preferably an alkyl group having 1 to 30 carbon atoms. A plurality of R 3 s may be the same or different, preferably the same. n is 0 to 2, preferably 1 to 2.

化合物(Y)為磷化合物,化合物(Y)之具體例,可舉例選自於由酸性磷酸酯及磷酸構成之群組中至少1個,宜為酸性磷酸酯。 酸性磷酸酯,可舉例酸式磷酸異十三酯、磷酸二丁酯等,宜為酸式磷酸異十三酯。 Compound (Y) is a phosphorus compound. Specific examples of compound (Y) include at least one selected from the group consisting of acidic phosphates and phosphoric acid, preferably an acidic phosphate. Examples of acidic phosphates include isotridecyl acid phosphate and dibutyl phosphate, preferably isotridecyl acid phosphate.

相對於聚合物(X),化合物(Y)之含量宜為10ppm以上10,000ppm以下,較宜為100ppm以上5,000ppm以下,更宜為500ppm以上2,000ppm以下。藉由化合物(Y)之量在此範圍內,能夠得到具有耐熱性並且低黃色度之薄膜,並且可改善薄膜之透明性。另外,本說明書中,「ppm」係表示質量百萬分率。The content of compound (Y) relative to polymer (X) is preferably from 10 ppm to 10,000 ppm, more preferably from 100 ppm to 5,000 ppm, and even more preferably from 500 ppm to 2,000 ppm. When the amount of compound (Y) is within this range, a heat-resistant film with low yellowing can be obtained, and the transparency of the film can be improved. In this specification, "ppm" means parts per million by mass.

[清漆] 本發明之清漆,係上述聚合物組成物溶解在有機溶劑中而形成者。即,本發明之清漆,係聚合物(X)及化合物(Y)溶解在有機溶劑中而形成者,本發明之清漆含有聚合物(X)、化合物(Y)及有機溶劑,且聚合物(X)及化合物(Y)溶解在該有機溶劑中。 有機溶劑只要是會溶解聚合物(X)及化合物(Y)者即可,並無特別限制,聚合物(X)之製造中使用的溶劑,宜單獨地使用或混合使用2種以上的上述化合物。 本發明之清漆,可以是將化合物(Y)混合、溶解在上述之聚合物(X)溶液中者,亦可以是進一步添加了稀釋溶劑者。 [Varnish] The varnish of the present invention is formed by dissolving the aforementioned polymer composition in an organic solvent. Specifically, the varnish of the present invention is formed by dissolving polymer (X) and compound (Y) in an organic solvent. The varnish of the present invention contains polymer (X), compound (Y), and an organic solvent, with polymer (X) and compound (Y) dissolved in the organic solvent. The organic solvent is not particularly limited as long as it dissolves polymer (X) and compound (Y). The solvent used in the production of polymer (X) is preferably a single solvent or a mixture of two or more of the aforementioned compounds. The varnish of the present invention may be obtained by mixing and dissolving compound (Y) in the aforementioned polymer (X) solution, or by further adding a diluting solvent.

當本發明之清漆中含有的聚合物(X)中,含有式(2)表示之重複單元(醯胺酸部分)時,就有效率地進行醯胺酸部分之醯亞胺化之觀點來看,可更含有醯亞胺化觸媒及脫水觸媒。醯亞胺化觸媒,只要是沸點為40℃以上180℃以下的醯亞胺化觸媒即可,適宜者可舉例沸點為180℃以下之胺化合物。若是沸點為180℃以下之醯亞胺化觸媒,則無在薄膜形成後、高溫下乾燥時該薄膜染色、外觀損壞之虞。此外,若是沸點為40℃以上之醯亞胺化觸媒,則能夠避免在充分地進行醯亞胺化前便揮發之可能性。 適合作為醯亞胺化觸媒使用的胺化合物,可舉例吡啶或甲吡啶。上述醯亞胺化觸媒亦可單獨地使用或組合2種以上使用。 脫水觸媒,可舉例乙酸酐、丙酸酐、正丁酸酐、苯甲酸酐、三氟乙酸酐等酸酐;二環己基碳二亞胺等碳二亞胺化合物等。此等亦可單獨地或組合2種以上使用。 When the polymer (X) contained in the varnish of the present invention contains a repeating unit (amidine moiety) represented by formula (2), from the perspective of efficiently progressing the imidization of the imidization moiety, an imidization catalyst and a dehydration catalyst may be further contained. The imidization catalyst can be any one having a boiling point of 40°C to 180°C, and an amine compound having a boiling point of 180°C or less is suitable. If the imidization catalyst has a boiling point of 180°C or less, there is no risk of the film being stained or deteriorating in appearance during high-temperature drying after film formation. In addition, if the imidization catalyst has a boiling point of 40°C or more, the possibility of volatilization before sufficient imidization can be avoided. Examples of amine compounds suitable for use as imidization catalysts include pyridine and picoline. These imidization catalysts may be used alone or in combination of two or more. Examples of dehydration catalysts include acid anhydrides such as acetic anhydride, propionic anhydride, n-butyric anhydride, benzoic anhydride, and trifluoroacetic anhydride; and carbodiimide compounds such as dicyclohexylcarbodiimide. These may also be used alone or in combination of two or more.

本發明之清漆中含有的聚合物(X)由於具有溶劑溶解性,可成為高濃度之清漆。本發明之清漆,宜含有聚合物(X)3~40質量%,較宜含有5~40質量%,更宜含有10~30質量%。清漆之黏度宜為0.1~100Pa・s,較宜為0.1~20Pa・s。清漆之黏度係使用E型黏度計於25℃測定之值。 此外,本發明之清漆,在不損及聚醯亞胺薄膜之要求特性之範圍內,亦可含有無機填料、黏接促進劑、剝離劑、阻燃劑、紫外線安定劑、介面活性劑、調平劑、消泡劑、螢光增白劑、交聯劑、聚合起始劑、感光劑等各種添加劑。 本發明之清漆之製造方法並無特別限制,可適用公知之方法。 The polymer (X) contained in the varnish of the present invention is solvent-soluble, allowing it to be formed into a high-concentration varnish. The varnish of the present invention preferably contains 3-40% by mass of polymer (X), more preferably 5-40% by mass, and even more preferably 10-30% by mass. The viscosity of the varnish is preferably 0.1-100 Pa·s, more preferably 0.1-20 Pa·s. The viscosity of the varnish is measured at 25°C using an E-type viscometer. Furthermore, the varnish of the present invention may contain various additives, such as inorganic fillers, adhesion promoters, release agents, flame retardants, UV stabilizers, surfactants, leveling agents, defoaming agents, fluorescent brighteners, crosslinking agents, polymerization initiators, and photosensitizers, as long as the required properties of the polyimide film are not compromised. The production method of the varnish of the present invention is not particularly limited, and known methods may be used.

[聚醯亞胺薄膜及聚醯亞胺薄膜之製造方法] 本發明之聚醯亞胺薄膜,在聚合物(X)中含有式(2)表示之重複單元(醯胺酸部分)時,會含有使聚合物(X)之醯胺酸部分醯亞胺化而形成之聚醯亞胺樹脂、及化合物(Y)。此外,當聚合物(X)為聚醯亞胺時,會含有該聚醯亞胺、或是藉由進一步加熱來調整分子量的聚醯亞胺樹脂、及化合物(Y)。因此,本發明之聚醯亞胺薄膜耐熱性優良、黃色度低。 本發明之聚醯亞胺薄膜,可使用上述清漆來製造。 [Polyimide Film and Method for Producing Polyimide Film] When polymer (X) contains a repeating unit (amidite moiety) represented by formula (2), the polyimide film of the present invention contains a polyimide resin formed by imidizing the amino acid moiety of polymer (X) and compound (Y). Furthermore, when polymer (X) is a polyimide, the film contains the polyimide, or a polyimide resin whose molecular weight is adjusted by further heating, and compound (Y). Therefore, the polyimide film of the present invention has excellent heat resistance and low yellowness. The polyimide film of the present invention can be produced using the above-mentioned varnish.

使用本發明之清漆製造聚醯亞胺薄膜之方法並無特別限制,宜藉由以下方法。 即,宜為在支持體上塗布上述之清漆並加熱之方法,具體來說,宜為將聚合物(X)及化合物(Y)溶解在有機溶劑中而形成之清漆塗布在支持體上並加熱之方法。 此外,本發明之聚醯亞胺薄膜,宜為在支持體上塗布上述之清漆並加熱而得到之聚醯亞胺薄膜,具體來說,宜為將聚合物(X)及化合物(Y)溶解在有機溶劑中而形成之清漆塗布在支持體上並加熱而得到之聚醯亞胺薄膜。 The method for producing a polyimide film using the varnish of the present invention is not particularly limited, but the following method is preferably used. That is, preferably, the varnish is applied to a support and then heated. Specifically, a varnish formed by dissolving the polymer (X) and the compound (Y) in an organic solvent is applied to the support and then heated. Furthermore, the polyimide film of the present invention is preferably a polyimide film obtained by applying the varnish described above to a support and then heating. Specifically, a varnish formed by dissolving the polymer (X) and the compound (Y) in an organic solvent is applied to the support and then heated.

支持體,可舉例如平滑的玻璃板、金屬板、塑膠等。 將清漆塗布在支持體上,或成形為薄膜狀後,藉由加熱去除該清漆中含有的反應溶劑及稀釋溶劑等有機溶劑,得到聚合物薄膜,當在該聚合物薄膜中含有的聚合物中具有醯胺酸部分時,藉由將其加熱而醯亞胺化(脫水閉環),然後從支持體剝離,藉此可製造聚醯亞胺薄膜。 本發明之聚醯亞胺薄膜中含有的聚醯亞胺樹脂之重量平均分子量(Mw),就薄膜之機械強度之觀點來看,以10,000~800,000為佳,以30,000~500,000為較佳,以50,000~400,000為更佳,以100,000~300,000為再更佳。另外,該共聚物之重量平均分子量,例如,可藉由由膠濾層析法測定所得之標準聚甲基甲基丙烯酸酯(PMMA)換算值來求得。 The support may be a smooth glass plate, metal plate, or plastic. After applying a varnish onto the support or forming it into a film, the varnish is heated to remove organic solvents such as the reaction solvent and diluent solvent, thereby forming a polymer film. If the polymer contained in the polymer film contains an amide moiety, the amide moiety undergoes imidization (dehydration and ring closure) by heating and is then peeled off from the support, thereby producing a polyimide film. The weight-average molecular weight (Mw) of the polyimide resin contained in the polyimide film of the present invention is preferably 10,000 to 800,000, more preferably 30,000 to 500,000, more preferably 50,000 to 400,000, and even more preferably 100,000 to 300,000, from the perspective of the mechanical strength of the film. The weight-average molecular weight of the copolymer can be determined, for example, by converting the value to standard polymethyl methacrylate (PMMA) measured by gel filtration chromatography.

使本發明之清漆乾燥而得到聚合物薄膜時之加熱溫度,宜為50~150℃。藉由加熱使聚合物予以醯亞胺化時之加熱溫度,以200~500℃為佳,以250~450℃為較佳,以300~400℃為更佳。此外,加熱時間,一般為1分鐘~6小時,以5分鐘~2小時為佳,以15分鐘~1小時為較佳。 加熱氣體環境,可舉例空氣、氮氣、氧氣、氫氣、氮氣/氫氣混合氣體等,為了抑制得到的聚醯亞胺樹脂之染色,宜為氧濃度為100ppm以下之氮氣、氫濃度為0.5%以下之氮氣/氫氣混合氣體。 另外,醯亞胺化之方法並非受限於熱醯亞胺化,亦可採用化學醯亞胺化。 The heating temperature for drying the varnish of the present invention to obtain a polymer film is preferably 50-150°C. The heating temperature for imidization of the polymer is preferably 200-500°C, more preferably 250-450°C, and even more preferably 300-400°C. Furthermore, the heating time is generally 1 minute to 6 hours, preferably 5 minutes to 2 hours, and even more preferably 15 minutes to 1 hour. The heating gas environment may include air, nitrogen, oxygen, hydrogen, or a nitrogen/hydrogen mixture. To prevent coloration of the resulting polyimide resin, nitrogen with an oxygen concentration of 100 ppm or less and nitrogen/hydrogen mixtures with a hydrogen concentration of 0.5% or less are preferred. In addition, the imidization method is not limited to thermal imidization; chemical imidization can also be used.

本發明之聚醯亞胺薄膜之厚度可因應用途等適當選擇,以1~250μm為佳,以5~100μm為較佳,以5~50μm為更佳。藉由厚度為1~250μm,變得能夠作為自立膜實際使用。 藉由調整清漆之固體成分濃度及黏度,可輕易地調控聚醯亞胺薄膜之厚度。 The thickness of the polyimide film of the present invention can be appropriately selected based on the intended application, preferably ranging from 1 to 250 μm, more preferably from 5 to 100 μm, and even more preferably from 5 to 50 μm. A thickness of 1 to 250 μm allows practical use as a self-supporting film. The thickness of the polyimide film can be easily controlled by adjusting the solids concentration and viscosity of the varnish.

藉由使用本發明之聚合物組成物,可得到耐熱性優良、黃色度低的聚醯亞胺薄膜,所得到的本發明之聚醯亞胺薄膜係耐熱性優良、黃色度亦低。該薄膜具有的適宜的物性值如下述。 針對全光線透射率,在製成厚度10μm之薄膜時,以85%以上為佳,以87%以上為較佳,以89%以上為更佳。 黃色度(YI),在製成厚度10μm之薄膜時,以12以下為佳,以11以下為較佳,就無色性優良之觀點來看,以9以下為佳,以8以下為較佳。 此外,1%重量減少溫度,以430℃以上為佳,以480℃以上為較佳,以500℃以上為更佳,以510℃以上為再更佳。此處,1%重量減少溫度,係以昇溫速度10℃/min將聚醯亞胺薄膜昇溫至40~550℃,相較於在300℃之重量,重量減少1%時之溫度。 另外,本發明中的上述之物性值,具體來說,能夠以實施例中記載之方法進行測定。 The polymer composition of the present invention can produce a polyimide film with excellent heat resistance and low yellowness. The resulting polyimide film has excellent heat resistance and low yellowness. Suitable physical properties of the film are as follows: For a film with a thickness of 10 μm, the total light transmittance is preferably 85% or higher, more preferably 87% or higher, and even more preferably 89% or higher. For a film with a thickness of 10 μm, the yellowness index (YI) is preferably 12 or lower, more preferably 11 or lower. For excellent colorlessness, the YI is preferably 9 or lower, more preferably 8 or lower. Furthermore, the 1% weight loss temperature is preferably 430°C or higher, more preferably 480°C or higher, even more preferably 500°C or higher, and even more preferably 510°C or higher. Here, the 1% weight loss temperature refers to the temperature at which the polyimide film is heated to 40-550°C at a rate of 10°C/min, resulting in a 1% weight loss relative to the film's weight at 300°C. Specifically, the aforementioned physical properties of the present invention can be measured using the methods described in the Examples.

本發明之聚醯亞胺薄膜,適合用來作為彩色濾光片、可撓式顯示器、半導體零件、光學構件等各種構件用之薄膜。本發明之聚醯亞胺薄膜,特別適合用來作為液晶顯示器及OLED顯示器等影像顯示裝置之基板。 [實施例] The polyimide film of the present invention is suitable for use as a film for various components, such as color filters, flexible displays, semiconductor components, and optical components. The polyimide film of the present invention is particularly suitable for use as a substrate for image display devices such as liquid crystal displays and OLED displays. [Examples]

以下藉由實施例具體地說明本發明。但是,本發明並非受限於這些實施例。 實施例及比較例得到的薄膜之各物性,係依以下所示之方法來測定。 The present invention is described in detail below using examples. However, the present invention is not limited to these examples. The physical properties of the films obtained in the examples and comparative examples were measured using the methods described below.

(1)薄膜厚度 薄膜厚度,係使用三豐股份有限公司製之測微器來測定。 另外,實施例5及比較例6之薄膜厚度,係使用膜厚測定器Filmetrics F20(Filmetrics股份有限公司製)來測定。 (1) Film Thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Co., Ltd. The film thickness of Example 5 and Comparative Example 6 was measured using a film thickness meter Filmetrics F20 (manufactured by Filmetrics Co., Ltd.).

(2)全光線透射率、黃色度(YI) 全光線透射率係依循JIS K7105:1981、YI係依循ASTMD1925(C光源、2°),使用日本電色工業股份有限公司製之色彩濁度同時測定器「COH7700」來測定。 (2) Total light transmittance and yellowness (YI) Total light transmittance was measured in accordance with JIS K7105:1981, and YI was measured in accordance with ASTM D1925 (illuminant C, 2°) using the COH7700 color and turbidity simultaneous tester manufactured by Nippon Denshoku Industries Co., Ltd.

(3)1%重量減少溫度(Td1%) 使用Hitachi High-Tech Science股份有限公司製之差示熱熱重量同時測定裝置「NEXTA STA200RV」。以昇溫速度10℃/min將試料昇溫至40~150℃,維持在150℃下30分鐘,去除了水分後昇溫至550℃。將和維持在150℃下30分鐘後之重量相較,重量減少1%時之溫度作為1%重量減少溫度。重量減少溫度數值越大則越優良。 (3) 1% weight loss temperature (Td1%) A differential thermal and thermogravimetric simultaneous measurement device "NEXTA STA200RV" manufactured by Hitachi High-Tech Science Co., Ltd. was used. The sample was heated to 40-150°C at a heating rate of 10°C/min, maintained at 150°C for 30 minutes, and then heated to 550°C after removing moisture. The temperature at which the weight decreased by 1% was compared with the weight after maintaining at 150°C for 30 minutes. The 1% weight loss temperature was defined as the temperature at which the weight decreased by 1%. The larger the weight loss temperature value, the better.

實施例及比較例中使用的四羧酸成分及二胺成分,以及其縮寫等如下述。 <四羧酸成分> CpODA:降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸二酐(式(a1)表示之化合物) s-BPDA:3,3’,4,4’-聯苯四羧酸二酐(Mitsubishi Chemical股份有限公司製、式(a2s)表示之化合物) BPAF:9,9-雙(3,4-二羧基苯基)茀二酸酐(JFE Chemical股份有限公司製;式(a3)表示之化合物) <二胺成分> 6FODA:2,2’-雙(三氟甲基)-4,4’-二胺二苯基醚(式(b11)表示之化合物) 4-BAAB:4-胺苯基-4-胺基苯甲酸(日本純良藥品股份有限公司製;式(b2)表示之化合物) <磷化合物> JP-513:酸式磷酸異十三酯(城北化學工業股份有限公司製,在式(3)中,R 3為異十三烷基、n為1的化合物,與R 3為異十三烷基、n為2的化合物之1:1混合物) DBP:磷酸二丁酯(城北化學工業股份有限公司製,在式(3)中,R 3為丁基、n為2的化合物) 磷酸:在式(3)中,n為0的化合物 磷酸三甲基:在式(3)中,R 3為甲基、n為3的化合物 三苯基膦:在式(3)中,R 3為苯基、n為3的化合物 <其他的化合物> Irganox 1010(抗氧化劑):新戊四醇肆[3-(3,5-二第三丁基-4-羥苯)丙酸酯](BASF JAPAN股份有限公司製) <表面調整劑> BYK-378:矽氧樹脂系表面調整劑(BYK-Chemie Japan股份有限公司製) The tetracarboxylic acid components and diamine components used in Examples and Comparative Examples, and their abbreviations are as follows. <Tetracarboxylic acid component> CpODA: Norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride (Compound represented by Formula (a1)) s-BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride (Mitsubishi Chemical Co., Ltd., Compound represented by Formula (a2s)) BPAF: 9,9-bis(3,4-dicarboxyphenyl)fluoranic anhydride (JFE Chemical Co., Ltd., Compound represented by Formula (a3)) <Diamine component> 6FODA: 2,2'-bis(trifluoromethyl)-4,4'-diaminediphenyl ether (Compound represented by Formula (b11)) 4-BAAB: 4-aminophenyl-4-aminobenzoic acid (Nippon Junryo Pharmaceutical Co., Ltd., Compound represented by Formula (b2)) <Phosphorus compound> JP-513: Isotridecyl acid phosphate (manufactured by Johoku Chemical Industry Co., Ltd., a 1:1 mixture of a compound wherein R3 is isotridecyl and n is 1 in formula (3), and a compound wherein R3 is isotridecyl and n is 2) DBP: Dibutyl phosphate (manufactured by Johoku Chemical Industry Co., Ltd., a compound wherein R3 is butyl and n is 2 in formula (3)) Phosphoric acid: a compound wherein n is 0 in formula (3) Trimethyl phosphate: a compound wherein R3 is methyl and n is 3 in formula (3) Triphenylphosphine: a compound wherein R3 is phenyl and n is 3 in formula (3) <Other compounds> Irganox 1010 (antioxidant): Pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] (manufactured by BASF JAPAN Co., Ltd.) <Surface conditioner> BYK-378: Silicone resin surface conditioner (manufactured by BYK-Chemie Japan Co., Ltd.)

在實施例及比較例中使用的溶劑及觸媒之縮寫等如下述。 NMP:N-甲基-2-吡咯啶酮(東京純藥工業股份有限公司製) TEA:三乙胺(關東化學股份有限公司製) The abbreviations for solvents and catalysts used in the Examples and Comparative Examples are as follows. NMP: N-methyl-2-pyrrolidone (manufactured by Tokyo Junyaku Industries, Ltd.) TEA: triethylamine (manufactured by Kanto Chemical Co., Ltd.)

〈實施例1〉 在具有不鏽鋼製半月型攪拌葉片、氮氣導入管、安裝有冷卻管之迪安-斯塔克裝置、溫度計、玻璃製端蓋之500mL之5口圓底燒瓶中,投入26.899g(0.0800莫耳)之6FODA及94.146g之NMP,在系統內溫度50℃、在氮氣環境下,以轉速200rpm攪拌得到溶液。 在該溶液中,一次性投入23.536g(0.0800莫耳)之s-BPDA、及23.536g之NMP,以加熱包(mantle heater)維持在50℃直接攪拌5小時。 然後,添加84.059g之NMP使其均一化後,回到室溫得到固體成分濃度20質量%之聚醯胺酸清漆。 在得到的清漆100g中投入0.02g之JP-513(相對於聚醯胺酸為1000ppm)、0.02g之BYK-378(相對於聚醯胺酸為1000ppm),攪拌30分鐘使其均一化,得到聚醯胺酸組成物清漆。 然後,藉由旋塗在玻璃板上塗布得到的聚醯胺酸組成物清漆,以加熱板維持在80℃、20分鐘,然後,移動至熱風乾燥機,在氮氣環境下,以昇溫速度5℃/min昇溫至420℃,在氮氣環境下,在熱風乾燥機中以420℃加熱60分鐘,使溶劑蒸發、醯亞胺化,得到聚醯亞胺薄膜。結果表示在表1。 Example 1 Into a 500 mL, five-necked round-bottom flask equipped with a stainless steel half-moon stirring blade, a nitrogen inlet, a Dean-Stark apparatus with a cooling tube, a thermometer, and glass end caps, 26.899 g (0.0800 mol) of 6FODA and 94.146 g of NMP were added. The mixture was stirred at 200 rpm at a temperature of 50°C under a nitrogen atmosphere to obtain a solution. To this solution, 23.536 g (0.0800 mol) of s-BPDA and 23.536 g of NMP were added at once and stirred for 5 hours at 50°C using a mantle heater. Next, 84.059 g of NMP was added for homogenization, and the mixture was returned to room temperature to obtain a polyamine varnish with a solids concentration of 20% by mass. To 100 g of the resulting varnish were added 0.02 g of JP-513 (1000 ppm relative to polyamine) and 0.02 g of BYK-378 (1000 ppm relative to polyamine), and the mixture was stirred for 30 minutes for homogenization to obtain a polyamine composition varnish. The resulting polyimide composition varnish was then spin-coated onto a glass plate and maintained at 80°C on a hot plate for 20 minutes. The varnish was then transferred to a hot air dryer and heated at a rate of 5°C/min to 420°C under a nitrogen atmosphere. The varnish was then heated in a hot air dryer at 420°C for 60 minutes under a nitrogen atmosphere to evaporate the solvent and achieve imidization, yielding a polyimide film. The results are shown in Table 1.

〈實施例2、3及比較例2~4〉 個別使用0.02g之表1表示之磷化合物或其他的化合物(相對於聚醯胺酸為1000ppm)代替0.02g之JP-513(相對於聚醯胺酸為1000ppm),除此之外,係以與實施例1相同之方法,得到聚醯亞胺薄膜。結果表示在表1。 Examples 2, 3, and Comparative Examples 2-4 Polyimide films were obtained by the same method as in Example 1, except that 0.02 g of each of the phosphorus compounds or other compounds listed in Table 1 (1000 ppm relative to the polyamide) was used in place of 0.02 g of JP-513 (1000 ppm relative to the polyamide). The results are shown in Table 1.

〈比較例1〉 不使用JP-513,除此之外,係以與實施例1相同之方法,得到聚醯亞胺薄膜。結果表示在表1。 Comparative Example 1 A polyimide film was obtained using the same method as in Example 1, except that JP-513 was not used. The results are shown in Table 1.

〈實施例4〉 使用0.0800莫耳之CpODA代替23.536g(0.0800莫耳)之s-BPDA,一次性投入原料後之維持溫度設定為10℃、攪拌5小時,除此之外,係以與實施例1相同之方法,得到聚醯胺酸組成物清漆。 接著藉由旋塗在玻璃板上塗布得到的聚醯亞胺組成物清漆,以加熱板維持在80℃、20分鐘,然後,移動至熱風乾燥機,在氮氣環境下,以昇溫速度5℃/min昇溫至420℃,在氮氣環境下,在熱風乾燥機中以420℃加熱60分鐘,使溶劑蒸發,得到聚醯亞胺薄膜。結果表示在表1。 Example 4 A polyamide composition varnish was obtained by the same method as in Example 1, except that 0.0800 mol of CpODA was used in place of 23.536 g (0.0800 mol) of s-BPDA. After adding all the raw materials at once, the temperature was maintained at 10°C and stirring was continued for 5 hours. The resulting polyimide composition varnish was then applied to a glass plate by spin coating and maintained at 80°C on a hot plate for 20 minutes. The varnish was then transferred to a hot air dryer and heated at a rate of 5°C/min to 420°C under a nitrogen atmosphere. The film was then heated in the hot air dryer at 420°C for 60 minutes under a nitrogen atmosphere to evaporate the solvent, yielding a polyimide film. The results are shown in Table 1.

〈比較例5〉 不使用JP-513,除此之外,係以與實施例4相同之方法,得到聚醯亞胺薄膜。結果表示在表1。 Comparative Example 5 A polyimide film was obtained using the same method as in Example 4, except that JP-513 was not used. The results are shown in Table 1.

〈實施例5〉 在具有不鏽鋼製半月型攪拌葉片、氮氣導入管、安裝有冷卻管之迪安-斯塔克裝置、溫度計、玻璃製端蓋之500mL之5口圓底燒瓶中,投入10.087g(0.030莫耳)之6FODA、及47.017g之NMP,在系統內溫度70℃、氮氣環境下,以轉速200rpm攪拌得到溶液。 在該溶液中,一次性投入9.169g(0.020莫耳)之BPAF、及11.754g之NMP後,投入0.101g之TEA作為醯亞胺化觸媒,以加熱包加熱,耗時約20分鐘間使反應系內溫度昇溫至190℃。收集被餾去的成分,將轉速配合黏度上昇調整的同時,使反應系內溫度維持在190℃進行1小時回流。然後,添加147.043g之NMP,使反應系內溫度冷卻至50℃,得到含有具有醯亞胺重複結構單元的寡聚物之溶液。 在得到的溶液中,一次性添加23.538g(0.080莫耳)之s-BPDA、15.978g(0.070莫耳)之4-BAAB及26.386g之NMP,在50℃攪拌5小時。然後,藉由以固體成分濃度成為約15質量%之方式添加NMP使其均一化,得到含有具有醯亞胺重複結構單元及醯胺酸構造單元的共聚物之清漆(醯亞胺-醯胺酸共聚物清漆)。 在得到的清漆100g中,投入0.015g(相對於醯亞胺-醯胺酸共聚物為1000ppm)之JP-513、0.015g(相對於醯亞胺-醯胺酸共聚物為1000ppm)之BYK-378,攪拌30分鐘使其均一化,得到醯亞胺-醯胺酸共聚物組成物清漆。 接著藉由旋塗在玻璃板上塗布得到的醯亞胺-醯胺酸共聚物組成物清漆,以加熱板維持在80℃、20分鐘,之後,移動至熱風乾燥機,在氮氣環境下,以昇溫速度5℃/min昇溫至430℃,在氮氣環境下,在熱風乾燥機中430℃加熱60分鐘使溶劑蒸發、熱醯亞胺化,得到聚醯亞胺薄膜。結果表示在表1。 Example 5 Into a 500 mL, five-necked round-bottom flask equipped with a stainless steel half-moon stirring blade, a nitrogen inlet, a Dean-Stark apparatus equipped with a cooling tube, a thermometer, and glass end caps, 10.087 g (0.030 mol) of 6FODA and 47.017 g of NMP were added. The mixture was stirred at 200 rpm under a nitrogen atmosphere at an internal temperature of 70°C to obtain a solution. To this solution, 9.169 g (0.020 mol) of BPAF and 11.754 g of NMP were added at once. Then, 0.101 g of TEA was added as an imidization catalyst. The reaction system was heated using a heating pack, raising the temperature to 190°C over approximately 20 minutes. The distilled components were collected, and the reaction system was maintained at 190°C under reflux for 1 hour while adjusting the rotational speed according to the viscosity increase. Then, 147.043 g of NMP was added, and the reaction system was cooled to 50°C, yielding a solution containing an oligomer with repeating imide units. To this solution, 23.538 g (0.080 mol) of s-BPDA, 15.978 g (0.070 mol) of 4-BAAB, and 26.386 g of NMP were added all at once, and the mixture was stirred at 50°C for 5 hours. NMP was then added to homogenize the mixture to a solids concentration of approximately 15% by mass, yielding a varnish containing a copolymer having imide repeating structural units and amide structural units (imide-amide copolymer varnish). To 100 g of the resulting varnish were added 0.015 g (1000 ppm relative to the imide-amide copolymer) of JP-513 and 0.015 g (1000 ppm relative to the imide-amide copolymer) of BYK-378. The mixture was stirred for 30 minutes to homogenize the mixture, yielding an imide-amide copolymer composition varnish. The resulting imide-amidite copolymer varnish was then applied to a glass plate by spin coating and maintained at 80°C on a hot plate for 20 minutes. The varnish was then transferred to a hot air dryer and heated at a rate of 5°C/min to 430°C in a nitrogen atmosphere. The varnish was then heated in a hot air dryer at 430°C for 60 minutes in a nitrogen atmosphere to evaporate the solvent and thermally imidize the film, yielding a polyimide film. The results are shown in Table 1.

〈比較例6〉 不使用JP-513,除此之外,係藉由與實施例5相同之方法,得到聚醯亞胺薄膜。結果表示在表1。 另外,由於在比較例6得到的聚醯亞胺薄膜無法從玻璃板剝離,實施例5及比較例6之全光線透射率及黃色度(YI),係將玻璃板包含在內來測定。此外,針對在比較例6得到的聚醯亞胺薄膜,沒有測定1%重量減少溫度(Td1%)。 Comparative Example 6 A polyimide film was obtained by the same method as in Example 5, except that JP-513 was not used. The results are shown in Table 1. Because the polyimide film obtained in Comparative Example 6 could not be peeled off from the glass plate, the total light transmittance and yellowness (YI) of Example 5 and Comparative Example 6 were measured with the glass plate included. Furthermore, the 1% weight loss temperature (Td1%) was not measured for the polyimide film obtained in Comparative Example 6.

[表1] [Table 1]

如表1所示,可知由本發明之聚合物組成物得到的聚醯亞胺薄膜,耐熱性優良、黃色度亦低。並且由本發明之聚合物組成物得到的聚醯亞胺薄膜,透明性亦優良。As shown in Table 1, the polyimide film obtained from the polymer composition of the present invention has excellent heat resistance and low yellowness. In addition, the polyimide film obtained from the polymer composition of the present invention also has excellent transparency.

Claims (6)

一種聚合物組成物,含有: 含有選自於由下述通式(1)表示之重複單元及下述通式(2)表示之重複單元構成之群組中之至少一種之聚合物(X),及 下述通式(3)表示之化合物(Y); 式(1)中,X 1為具有脂環結構或芳香族環之4價之基; 式(2)中,X 2為具有脂環結構或芳香族環之4價之基,R 1及R 2各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基; 式(3)中,R 3為碳數1~30之烷基,n為0~2; 相對於聚合物(X),化合物(Y)之含量為10ppm以上且10,000ppm以下。 A polymer composition comprising: a polymer (X) comprising at least one selected from the group consisting of a repeating unit represented by the following general formula (1) and a repeating unit represented by the following general formula (2), and a compound (Y) represented by the following general formula (3); In formula (1), X1 is a tetravalent group having an alicyclic structure or an aromatic ring; in formula (2), X2 is a tetravalent group having an alicyclic structure or an aromatic ring, R1 and R2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms; in formula (3), R3 is an alkyl group having 1 to 30 carbon atoms, and n is 0 to 2; the content of compound (Y) is greater than 10 ppm and less than 10,000 ppm relative to polymer (X). 如請求項1之聚合物組成物,其中,相對於該聚合物(X)之全部重複單元,該式(1)表示之重複單元為10莫耳%以上。The polymer composition of claim 1, wherein the repeating unit represented by formula (1) accounts for 10 mol% or more relative to all repeating units of the polymer (X). 如請求項1或2之聚合物組成物,其中,相對於該聚合物(X)之全部重複單元,該式(2)表示之重複單元為10莫耳%以上。The polymer composition of claim 1 or 2, wherein the repeating unit represented by formula (2) accounts for 10 mol% or more relative to all repeating units of the polymer (X). 一種清漆,係藉由將如請求項1至3中任一項之聚合物組成物溶解在有機溶劑中而形成的。A varnish is formed by dissolving the polymer composition according to any one of claims 1 to 3 in an organic solvent. 一種聚醯亞胺薄膜,係在支持體上塗布如請求項4之清漆並加熱而獲得。A polyimide film is obtained by coating the varnish of claim 4 on a support and heating the support. 一種聚醯亞胺薄膜之製造方法,係在支持體上塗布如請求項4之清漆,並進行加熱。A method for manufacturing a polyimide film comprises coating the varnish of claim 4 on a support and heating the support.
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