TWI896626B - Mounting method, mounting device, and transfer device - Google Patents
Mounting method, mounting device, and transfer deviceInfo
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- TWI896626B TWI896626B TW110110355A TW110110355A TWI896626B TW I896626 B TWI896626 B TW I896626B TW 110110355 A TW110110355 A TW 110110355A TW 110110355 A TW110110355 A TW 110110355A TW I896626 B TWI896626 B TW I896626B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2607—Circuits therefor
- G01R31/2632—Circuits therefor for testing diodes
- G01R31/2635—Testing light-emitting diodes, laser diodes or photodiodes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
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- H10P72/0446—
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- H10P72/74—
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- H10P74/203—
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- H10W72/0198—
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- H10W72/071—
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- H10W72/0711—
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- H10W95/00—
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- H10P72/7434—
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- H10W90/724—
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- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Wire Bonding (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
本發明提供一種可生產性良好地將半導體晶片安裝於電路基板之安裝方法、安裝裝置及轉印裝置。具體而言,本發明之安裝方法具有:第1轉印步驟,其係將載體基板2上形成之複數個半導體晶片1轉印至第1轉印基板4a;檢查步驟,其係對轉印至第1轉印基板4a之半導體晶片1之狀態進行檢查;第2轉印步驟,其係僅將藉由檢查步驟被判斷為正常之半導體晶片1從第1轉印基板4a轉印至第2轉印基板4b;及安裝步驟,其係將轉印至第2轉印基板4b之半導體晶片1安裝於電路基板6。 The present invention provides a mounting method, mounting apparatus, and transfer apparatus for mounting semiconductor chips on a circuit substrate with high productivity. Specifically, the mounting method of the present invention comprises: a first transfer step of transferring a plurality of semiconductor chips 1 formed on a carrier substrate 2 to a first transfer substrate 4a; an inspection step of inspecting the condition of the semiconductor chips 1 transferred to the first transfer substrate 4a; a second transfer step of transferring only the semiconductor chips 1 determined to be normal in the inspection step from the first transfer substrate 4a to the second transfer substrate 4b; and a mounting step of mounting the semiconductor chips 1 transferred to the second transfer substrate 4b on a circuit substrate 6.
Description
本發明係關於一種用以將半導體晶片以高精度穩定地安裝之轉印裝置、安裝方法及安裝裝置。 The present invention relates to a transfer device, a mounting method, and a mounting device for stably mounting semiconductor chips with high precision.
對半導體晶片實施小型化以降低成本,並想辦法將小型化之半導體晶片以高精度安裝。尤其是對於顯示器中用到之LED(Light Emitting Diode,發光二極體),業界要求將被稱為微型LED之50um×50um以下之半導體晶片以數um之精度高速安裝。 Semiconductor chips are being miniaturized to reduce costs, and methods are being developed to mount these miniaturized chips with high precision. In particular, for LEDs (Light Emitting Diodes) used in displays, the industry requires semiconductor chips under 50um x 50um, known as micro-LEDs, to be mounted at high speeds with a precision of a few microns.
專利文獻1中記載有一種元件轉印方法,該方法係利用檢流計鏡使雷射光源產生之雷射光束反射,並選擇性地照射至在轉印源基板上排列有複數個之元件上,藉此將因照射而從轉印源基板剝離之元件轉印至轉印目標基板上。藉由該轉印方法,能夠將尺寸微小之元件高速地轉印至轉印目標基板上,利用該方法亦能夠將元件高速地安裝於電路基板。 Patent Document 1 describes a component transfer method that uses a galvanometer mirror to reflect a laser beam generated by a laser light source and selectively irradiate a plurality of components arranged on a transfer source substrate. The components, removed from the transfer source substrate by the irradiation, are then transferred to a transfer target substrate. This transfer method enables high-speed transfer of microscopic components onto the transfer target substrate, and also enables high-speed mounting of components on circuit boards.
專利文獻1:日本專利特開2006-41500號公報 Patent Document 1: Japanese Patent Publication No. 2006-41500
然而,僅藉由使用專利文獻1所記載之轉印方法而實施之安裝方法有安裝後需要花費大量時間來修復之虞。具體而言,必須在藉由 點亮檢查而檢查了半導體晶片是否已正常安裝於電路基板之後,將存在異常之半導體晶片去除,並重新安裝正常之半導體晶片(進行修復)。對此,例如於電路基板用於4K電視之情形時,要用到2488萬個半導體晶片,即便不良率為0.1%,亦需要進行約2.5萬個之修復。如此一來,僅修復這一項便需要花費數百小時進行計算,即便安裝步驟本身高速完成,亦存在因修復導致對生產性產生重大影響等問題。 However, the mounting method using only the transfer method described in Patent Document 1 carries the risk of requiring significant time for post-mount repairs. Specifically, after verifying the proper mounting of the semiconductor chip on the circuit board through a lighting inspection, any defective semiconductor chips must be removed and replaced with healthy ones (repair). For example, in the case of a circuit board used in a 4K TV, 24.88 million semiconductor chips are used. Even with a 0.1% defect rate, approximately 25,000 chips would require repairs. This repair alone could take hundreds of hours, and even if the mounting process itself were completed quickly, there is the risk that repairs could significantly impact productivity.
本發明之目的在於,鑒於上述問題,提供一種可生產性良好地將半導體晶片安裝於電路基板之安裝方法及安裝裝置。 In view of the above-mentioned problems, the object of the present invention is to provide a mounting method and mounting device for mounting a semiconductor chip on a circuit substrate with high productivity.
為了解決上述問題,本發明之安裝方法之特徵在於具有:第1轉印步驟,其係將載體基板上所形成之複數個半導體晶片轉印至第1轉印基板;檢查步驟,其係對轉印至上述第1轉印基板之半導體晶片之狀態進行檢查;第2轉印步驟,其係僅將藉由上述檢查步驟被判斷為正常之半導體晶片從上述第1轉印基板轉印至第2轉印基板;及安裝步驟,其係將轉印至上述第2轉印基板之半導體晶片安裝於電路基板。 To address the aforementioned issues, the mounting method of the present invention is characterized by comprising: a first transfer step of transferring a plurality of semiconductor chips formed on a carrier substrate to a first transfer substrate; an inspection step of inspecting the condition of the semiconductor chips transferred to the first transfer substrate; a second transfer step of transferring only the semiconductor chips determined to be normal in the inspection step from the first transfer substrate to a second transfer substrate; and a mounting step of mounting the semiconductor chips transferred to the second transfer substrate on a circuit board.
本發明之安裝方法中,於第2轉印步驟中僅將藉由檢查步驟被判斷為正常之半導體晶片從第1轉印基板轉印至第2轉印基板,藉此,可大幅度減少安裝後需要進行修復之半導體晶片之數量,從而可提高電路基板之生產性。 In the mounting method of the present invention, only semiconductor chips that have been determined to be normal in the inspection step are transferred from the first transfer substrate to the second transfer substrate in the second transfer step. This significantly reduces the number of semiconductor chips requiring repair after mounting, thereby improving circuit board productivity.
又,上述安裝步驟可具有將半導體晶片連同上述第2轉印基板一起壓接於電路基板之壓接步驟、以及將上述第2轉印基板與半導體晶片分離之分離步驟,以於將要面臨上述壓接步驟之上述第2轉印基板上,對應於半導體晶片於上述電路基板上應配置的位置來排列半導體晶片 之方式,於上述第2轉印步驟中選擇性地進行半導體晶片之轉印。 Furthermore, the mounting step may include a pressing step of pressing the semiconductor chip together with the second transfer substrate onto the circuit board, and a separation step of separating the second transfer substrate from the semiconductor chip. The semiconductor chip is selectively transferred during the second transfer step by arranging the semiconductor chip on the second transfer substrate, which is about to be subjected to the pressing step, at a position corresponding to the position at which the semiconductor chip is to be arranged on the circuit board.
藉此,能夠將複數個半導體晶片一併安裝於電路基板。 This allows multiple semiconductor chips to be mounted on a circuit board at the same time.
又,亦可為,藉由雷射舉離來進行上述第1轉印步驟及上述第2轉印步驟,藉由上述第1轉印步驟而轉印至上述第1轉印基板之半導體晶片彼此之間隔即第1元件間隔小於藉由上述第2轉印步驟而轉印至上述第2轉印基板之半導體晶片彼此之間隔即第2元件間隔,上述第1轉印步驟中之雷射光之振盪頻率高於上述第2轉印步驟中之雷射光之振盪頻率。 Alternatively, the first transfer step and the second transfer step may be performed by laser lift, wherein the spacing between semiconductor chips transferred to the first transfer substrate in the first transfer step, i.e., the first element spacing, is smaller than the spacing between semiconductor chips transferred to the second transfer substrate in the second transfer step, i.e., the second element spacing, and the oscillation frequency of the laser light in the first transfer step is higher than the oscillation frequency of the laser light in the second transfer step.
藉此,藉由在第2轉印步驟前之第1轉印步驟之前將基板上之半導體晶片彼此之間隔設定得相對較小,而能夠一面以相對較高之振盪頻率出射雷射光,一面進行元件之轉印,因此,可在短時間內完成半導體晶片向電路基板之轉印。 By setting the spacing between the semiconductor chips on the substrate relatively small during the first transfer step before the second transfer step, the laser beam can be emitted at a relatively high oscillation frequency while the components are transferred. This allows the transfer of the semiconductor chips to the circuit board to be completed in a short time.
又,雷射光之振盪頻率可藉由出射雷射光之雷射光源控制,雷射光之光路可藉由光路控制部控制,以相對於上述第1轉印基板上雷射光之照射點之移動速度成為上述光路控制部可控制之最高速度左右的方式使上述光路控制部進行動作之情形時,上述第2轉印步驟中之雷射光之振盪頻率可為從上述雷射光源出射之各雷射光能夠使半導體晶片以上述第2元件間隔轉印之振盪頻率。 Furthermore, the oscillation frequency of the laser light can be controlled by a laser light source that emits the laser light, and the optical path of the laser light can be controlled by an optical path control unit. When the optical path control unit is operated so that the movement speed of the laser light irradiation point on the first transfer substrate is approximately the maximum speed controllable by the optical path control unit, the oscillation frequency of the laser light in the second transfer step can be an oscillation frequency at which each laser light emitted from the laser light source can transfer the semiconductor chip at the second element interval.
藉此,於第2轉印步驟中亦能夠儘可能在短時間內進行半導體晶片之轉印。 This allows the semiconductor chip to be transferred in the shortest possible time during the second transfer step.
又,可藉由檢流計鏡來控制雷射光之光路。 In addition, the optical path of the laser light can be controlled by a galvanometer mirror.
藉此,能以簡單之構成形成光路。 This allows for a simple optical path.
又,本發明之安裝方法可具有:安裝後檢查步驟,其係對安裝於上述電路基板之半導體晶片之性能進行檢查;及修復步驟,其係將代替上述安裝後檢查步驟之結果為判斷有異常之半導體晶片發揮功能之修 復用半導體晶片追加或置換至上述電路基板中;上述修復步驟中,以對應於上述修復用半導體晶片於上述電路基板上應配置之位置來排列半導體晶片的方式,從上述第1轉印基板選擇性地將半導體晶片轉印至上述第2轉印基板,將半導體晶片連同上述第2轉印基板一起壓接於電路基板,並從半導體晶片分離上述第2轉印基板。 Furthermore, the mounting method of the present invention may include a post-mounting inspection step for inspecting the performance of the semiconductor chip mounted on the circuit substrate; and a repair step for adding or replacing a repair semiconductor chip, which replaces the semiconductor chip determined to be abnormal in the post-mounting inspection step, with the circuit substrate. In the repair step, the semiconductor chips are selectively transferred from the first transfer substrate to the second transfer substrate in such a manner that the semiconductor chips are arranged corresponding to the positions of the repair semiconductor chips on the circuit substrate. The semiconductor chips and the second transfer substrate are then press-bonded to the circuit substrate, and the second transfer substrate is separated from the semiconductor chips.
藉此,能夠縮短修復所需之時間。 This can shorten the time required for repair.
又,於上述檢查步驟中,可藉由基於圖像解析之外觀檢查來檢查上述第1轉印基板上之半導體晶片之狀態。 Furthermore, in the inspection step, the condition of the semiconductor chip on the first transfer substrate can be inspected by visual inspection based on image analysis.
藉此,可於短時間內完成檢查步驟。 This allows the inspection process to be completed in a short time.
又,於上述檢查步驟中,可藉由光致發光來檢查上述第1轉印基板上之半導體晶片之狀態。 Furthermore, in the inspection step, the state of the semiconductor chip on the first transfer substrate can be inspected by photoluminescence.
藉此,可於不將半導體晶片接線之情況下進行特定元件之檢查。 This allows for inspection of specific components without connecting the semiconductor chip to the wires.
又,可於上述檢查步驟與上述第2轉印步驟之間進而具有晶片去除步驟,該晶片去除步驟係從上述第1轉印基板去除被判斷為異常之半導體晶片。 Furthermore, a chip removal step may be included between the inspection step and the second transfer step, wherein the chip removal step is to remove the semiconductor chip determined to be abnormal from the first transfer substrate.
藉此,可防止誤將異常晶片轉印至第2轉印基板。 This prevents abnormal chips from being mistakenly transferred to the second transfer substrate.
又,為了解決上述問題,本發明之安裝裝置之特徵在於具有:轉印部,其進行複數個半導體晶片從載體基板向第1轉印基板之轉印及半導體晶片從該第1轉印基板向第2轉印基板之轉印;檢查部,其對轉印至上述第1轉印基板之半導體晶片之狀態進行檢查;及安裝部,其將轉印至上述第2轉印基板之半導體晶片安裝於電路基板;僅將藉由上述檢查部之檢查被判斷為正常之半導體晶片從上述第1轉印基板轉印至上述第2轉印 基板。 To address the aforementioned issues, the mounting device of the present invention is characterized by comprising: a transfer unit that transfers a plurality of semiconductor chips from a carrier substrate to a first transfer substrate and then transfers the semiconductor chips from the first transfer substrate to a second transfer substrate; an inspection unit that inspects the condition of the semiconductor chips transferred to the first transfer substrate; and a mounting unit that mounts the semiconductor chips transferred to the second transfer substrate on a circuit board. Only semiconductor chips that have been determined to be normal by the inspection unit are transferred from the first transfer substrate to the second transfer substrate.
本發明之安裝裝置中,僅將藉由檢查部之檢查被判斷為正常之半導體晶片從第1轉印基板轉印至第2轉印基板,藉此,可大幅度減少安裝後需要進行修復之半導體晶片之數量,從而可提高電路基板之生產性。 In the mounting device of the present invention, only semiconductor chips that have been inspected by the inspection unit and are deemed normal are transferred from the first transfer substrate to the second transfer substrate. This significantly reduces the number of semiconductor chips requiring repair after mounting, thereby improving circuit board productivity.
又,為了解決上述問題,本發明之轉印裝置之特徵在於具備:雷射光源,其出射雷射光,且雷射光之振盪頻率可控;及光路控制部,其控制雷射光之光路;且該轉印裝置藉由上述光路控制部來控制轉印基板上雷射光之照射位置,藉由雷射舉離使該轉印基板所保持之複數個元件中之任意之該元件轉印至被轉印基板;且該轉印裝置具有:第1轉印模式,其係將第1基板作為上述被轉印基板,使上述元件轉印至該第1基板;及第2轉印模式,其係將上述第1基板作為上述轉印基板,將第2基板作為上述被轉印基板,使上述第1基板所保持之上述元件轉印至該第2基板;藉由上述第1轉印模式而轉印至上述第1基板之上述元件彼此之間隔即第1元件間隔小於藉由上述第2轉印模式而轉印至上述第2基板之上述元件彼此之間隔即第2元件間隔,上述第1轉印模式下雷射光之振盪頻率高於上述第2轉印模式下雷射光之振盪頻率。 Furthermore, in order to solve the above-mentioned problem, the transfer device of the present invention is characterized in that it comprises: a laser light source, which emits laser light, and the oscillation frequency of the laser light is controllable; and an optical path control unit, which controls the optical path of the laser light; and the transfer device controls the irradiation position of the laser light on the transfer substrate by the optical path control unit, and transfers any of the plurality of elements held by the transfer substrate to the transferred substrate by laser lifting; and the transfer device has: a first transfer mode, which uses the first substrate as the transferred substrate to transfer the element to the first substrate; substrate; and a second transfer mode, wherein the first substrate serves as the transfer substrate and the second substrate serves as the transferred substrate, and the components held by the first substrate are transferred to the second substrate; the spacing between the components transferred to the first substrate by the first transfer mode, i.e., a first component spacing, is smaller than the spacing between the components transferred to the second substrate by the second transfer mode, i.e., a second component spacing; and the oscillation frequency of the laser light in the first transfer mode is higher than the oscillation frequency of the laser light in the second transfer mode.
根據該轉印裝置,藉由在第2轉印模式前之第1轉印模式之前將基板上之元件彼此之間隔設定得相對較小,而能夠一面以相對較高之振盪頻率出射雷射光,一面進行元件之轉印,因此,可在短時間內完成元件向電路基板之轉印。 This transfer device sets the spacing between components on the substrate relatively small during the first transfer mode before the second transfer mode. This allows the transfer of components to the circuit board to be completed in a short time while emitting laser light at a relatively high oscillation frequency.
又,上述第2基板可為形成有配線電路之電路基板。 Furthermore, the second substrate may be a circuit substrate having a wiring circuit formed thereon.
藉此,由於在轉印至電路基板之前於基板上之元件間隔相 對較小之條件下進行轉印,故可於更短時間內完成元件向電路基板之轉印。 This allows components to be transferred to the circuit board in a shorter time because the components are transferred to the circuit board with relatively small spacing before being transferred to the circuit board.
又,以相對於上述第1基板上雷射光之照射位置之移動速度成為上述光路控制部可控制之最高速度左右的方式使上述光路控制部進行動作之情形時,上述第2轉印模式下雷射光之振盪頻率可為從上述雷射光源出射之各雷射光能夠使上述元件以上述第2元件間隔轉印之振盪頻率。 Furthermore, when the optical path control unit is operated so that the speed of movement of the laser beam irradiation position relative to the first substrate is approximately the maximum speed controllable by the optical path control unit, the oscillation frequency of the laser beam in the second transfer mode may be an oscillation frequency at which each laser beam emitted from the laser light source can cause the device to be transferred at intervals with the second device.
藉此,於第2轉印模式下亦能夠儘可能在短時間內進行元件之轉印。 This allows components to be transferred in the shortest possible time even in the second transfer mode.
又,上述光路控制部可為檢流計鏡。 Furthermore, the optical path control unit may be a galvanometer mirror.
藉此,能以簡單之構成形成光路控制部。 This allows the light path control unit to be formed with a simple structure.
又,上述第1元件間隔可與使上述元件生長之基板即生長基板上之上述元件彼此之間隔同等。 Furthermore, the first element spacing may be equal to the spacing between the elements on the substrate on which the elements are grown, i.e., the growth substrate.
藉此,第1轉印模式下元件彼此之間隔接近最小限度,可將第1轉印模式下雷射光之振盪頻率設定得更高。 This minimizes the spacing between components in the first transfer mode, allowing the laser light oscillation frequency in the first transfer mode to be set higher.
又,本發明之轉印裝置可進而具有判定各上述元件之動作性能之性能判定模式,於上述第1轉印模式下,僅使上述性能判定模式下被判定為正常之上述元件轉印至上述第1基板。 Furthermore, the transfer device of the present invention may further include a performance determination mode for determining the operating performance of each of the components. In the first transfer mode, only components determined to be normal in the performance determination mode are transferred to the first substrate.
藉此,相對於在第2轉印模式下僅區分出正常元件後進行轉印,可於更短時間內進行轉印。 This allows for faster transfer times compared to the second transfer mode, which only separates normal components before transferring them.
藉由本發明之安裝方法、安裝裝置及轉印裝置,可生產性良好地將半導體晶片安裝於電路基板。 The mounting method, mounting device, and transfer device of the present invention can be used to mount semiconductor chips on circuit boards with high productivity.
1:半導體晶片(元件) 1: Semiconductor chip (component)
2:載體基板 2: Carrier substrate
3a:黏著層 3a: Adhesive layer
3b:黏著層 3b: Adhesive layer
4a:第1轉印基板 4a: First transfer substrate
4b:第2轉印基板 4b: Second transfer substrate
5:接合材 5: Jointing materials
6:電路基板 6: Circuit board
10:轉印部 10: Transfer Section
11:雷射光 11: Laser Light
11a:雷射光 11a: Laser light
11b:雷射光 11b: Laser light
11c:雷射光 11c: Laser light
11d:雷射光 11d: Laser light
12:雷射照射部 12: Laser irradiation unit
13:轉印基板保持部 13: Transfer substrate holding portion
14:被轉印基板保持部 14: Transfer substrate holding portion
15:檢流計鏡 15: Galvanometer
16:fθ透鏡 16:fθ lens
20:檢查部(波長測定部) 20: Inspection Department (Wavelength Measurement Department)
21:攝影機 21: Camera
22:被檢查基板保持部 22: Inspected substrate holding unit
23:雷射光源 23: Laser Light Source
24:波長測定器 24: Wavelength Meter
30:安裝部 30: Installation Department
31:載置台 31: Loading platform
32:頭部 32: Head
33:雙視野光學系統 33: Dual-view optical system
34:加熱器 34: Heater
35:加熱器 35: Heater
40:機械手 40:Manipulator
41:點亮檢查裝置 41: Light up the inspection device
100:安裝裝置 100: Installation Device
d1:第1元件間隔 d1: 1st element spacing
d2:第2元件間隔 d2: 2nd element spacing
f1:振盪頻率 f1: Oscillation frequency
f2:振盪頻率 f2: Oscillation frequency
L1:雷射光 L1: Laser light
L2:雷射光 L2: Laser Light
L3:發射光 L3: Emitting light
v1:掃描速度 v1: Scanning speed
v2:掃描速度 v2: Scanning speed
w0:基板 w0: substrate
w1:第1基板 w1: 1st substrate
w2:第2基板 w2: 2nd substrate
圖1係說明本發明之安裝裝置之圖。 Figure 1 illustrates the installation of the present invention.
圖2係說明本發明之安裝裝置中之轉印部之圖。 Figure 2 illustrates the transfer section of the mounting device of the present invention.
圖3係說明本發明之安裝裝置中之檢查部之圖。 Figure 3 illustrates the inspection section of the mounting device of the present invention.
圖4係說明本發明之安裝裝置中之安裝部之圖。 Figure 4 illustrates the mounting portion of the mounting device of the present invention.
圖5(a)~(c)係說明本發明之安裝方法之第1轉印步驟之圖。 Figures 5(a) to (c) illustrate the first transfer step of the installation method of the present invention.
圖6(a)、(b)係說明本發明之安裝方法之檢查步驟及晶片去除步驟之圖。 Figures 6(a) and (b) illustrate the inspection step and chip removal step of the mounting method of the present invention.
圖7係說明本發明之另一實施方式之轉印裝置之圖。 Figure 7 is a diagram illustrating a transfer device according to another embodiment of the present invention.
圖8係表示藉由轉印裝置具有之波長測定部而獲得之轉印基板上之元件之發光波長分佈及控制裝置進行之分組之結果的圖。 Figure 8 shows the wavelength distribution of light emitted by the elements on the transfer substrate, obtained by the wavelength measuring unit of the transfer device, and the grouping results performed by the control device.
圖9(a)~(c)係說明本發明之安裝方法之第2轉印步驟之圖。 Figures 9(a) to (c) illustrate the second transfer step of the installation method of the present invention.
圖10(a)~(c)係說明本發明之安裝方法之安裝步驟之圖。 Figures 10(a) to (c) illustrate the installation steps of the installation method of the present invention.
圖11(a)~(d)係說明一般之點亮檢查步驟及修復步驟之圖。 Figures 11(a) to (d) illustrate the general lighting inspection and repair steps.
圖12係說明本發明中之修復步驟之圖。 Figure 12 illustrates the repair steps of the present invention.
圖13係表示本發明之另一實施方式中之第1轉印步驟之圖。 Figure 13 shows the first transfer step in another embodiment of the present invention.
圖14係表示本發明之另一實施方式中之第2轉印步驟之圖。 Figure 14 shows the second transfer step in another embodiment of the present invention.
圖15係表示光路控制部之掃描速度與雷射光之振盪頻率之關係的圖。 Figure 15 shows the relationship between the scanning speed of the optical path control unit and the oscillation frequency of the laser beam.
圖1中表示執行本發明之安裝方法之安裝裝置。 Figure 1 shows the installation device for implementing the installation method of the present invention.
安裝裝置100具有轉印部10、檢查部20及安裝部30,由轉 印部10進行第1轉印步驟及第2轉印步驟,由安裝部30進行安裝步驟。又,在第1轉印步驟與第2轉印步驟之間,由檢查部20對半導體晶片進行檢查。又,基板(載體基板2、第1轉印基板4a、第2轉印基板4b、電路基板6)於各裝置間之搬送由1種以上之機械手40實施。 The mounting device 100 includes a transfer unit 10, an inspection unit 20, and a mounting unit 30. The transfer unit 10 performs the first and second transfer steps, while the mounting unit 30 performs the mounting step. Furthermore, the inspection unit 20 inspects the semiconductor wafer between the first and second transfer steps. Furthermore, the substrates (carrier substrate 2, first transfer substrate 4a, second transfer substrate 4b, circuit board 6) are transported between the various devices by one or more robots 40.
圖2中表示轉印部10之詳情。 Figure 2 shows the details of the transfer unit 10.
轉印部10具備:雷射照射部12,其照射雷射光11;轉印基板保持部13,其保持轉印基板,至少可於X軸方向、Y軸方向上移動;被轉印基板保持部14,其位於轉印基板保持部13之下側,以隔開隙間與轉印基板對向之方式保持被轉印基板;及未圖示之控制部。 The transfer unit 10 includes a laser irradiation unit 12 that irradiates the laser beam 11; a transfer substrate holder 13 that holds the transfer substrate and is movable in at least the X-axis and Y-axis directions; a transferred substrate holder 14 located below the transfer substrate holder 13 and holding the transferred substrate opposite the transfer substrate with a gap therebetween; and a control unit (not shown).
雷射照射部12,即所謂雷射光源,係以特定之振盪頻率照射準分子雷射、YAG(Yttrium-Aluminum-Garnet,釔-鋁-石榴石)雷射、可見光雷射等雷射光11之裝置,固定設置於轉印部10。於本實施方式中,雷射照射部12照射點狀之雷射光11,雷射光11經由利用控制部調節角度之檢流計鏡15及fθ透鏡16而被控制X軸方向及Y軸方向之照射位置,選擇性地照射至半導體晶片1,上述半導體晶片1於轉印基板保持部13所保持之轉印基板上配置有複數個。藉由雷射光11入射至轉印基板之半導體晶片1,而產生雷射舉離,從而將半導體晶片1從轉印基板轉印至被轉印基板。 The laser irradiation unit 12, also known as a laser light source, is a device that emits laser light 11 at a specific oscillation frequency, such as an excimer laser, a YAG (Yttrium-Aluminum-Garnet) laser, or a visible light laser. It is fixed to the transfer unit 10. In this embodiment, the laser irradiation unit 12 emits a point-shaped laser beam 11. The laser beam 11 is controlled in its X-axis and Y-axis directions by a galvanometer mirror 15 and an fθ lens 16, whose angles are adjusted by a control unit. The laser beam 11 selectively irradiates the semiconductor chips 1, a plurality of which are arranged on a transfer substrate held by a transfer substrate holder 13. When the laser light 11 is incident on the semiconductor chip 1 on the transfer substrate, laser lift-off is generated, thereby transferring the semiconductor chip 1 from the transfer substrate to the transferred substrate.
此處,本說明中之振盪頻率係指特定之光輸出於1秒內反覆輸出之次數,例如於振盪頻率為1kHz之情形時,特定之光輸出於1秒內反覆輸出1000次。該振盪頻率越大,光輸出之時間間隔越短。 Here, the oscillation frequency in this description refers to the number of times a specific light output is repeated in one second. For example, at an oscillation frequency of 1 kHz, the specific light output is repeated 1000 times in one second. The higher the oscillation frequency, the shorter the interval between light outputs.
再者,本說明中由該轉印部10來實施下述第1轉印步驟及第2轉印步驟。於第1轉印步驟中,載體基板2相當於轉印基板,第1轉印基板4a相當於被轉印基板。另一方面,於第2轉印步驟中,第1轉印基板4a 相當於轉印基板,第2轉印基板4b相當於被轉印基板。 Furthermore, in this description, the transfer section 10 performs the following first and second transfer steps. In the first transfer step, the carrier substrate 2 serves as the transfer substrate, and the first transfer substrate 4a serves as the substrate to be transferred. Meanwhile, in the second transfer step, the first transfer substrate 4a serves as the transfer substrate, and the second transfer substrate 4b serves as the substrate to be transferred.
轉印基板保持部13具有開口,吸附保持轉印基板之外周部附近。可經由該開口將從雷射照射部12發出之雷射光11照射至轉印基板保持部13所保持之轉印基板。 The transfer substrate holder 13 has an opening that holds the transfer substrate near its outer periphery by suction. Laser light 11 emitted from the laser irradiation unit 12 is directed through the opening onto the transfer substrate held by the transfer substrate holder 13.
又,轉印基板保持部13藉由未圖示之移動機構,至少於X軸方向、Y軸方向上相對於被轉印基板保持部14相對移動。控制部控制該移動機構,調節轉印基板保持部13之位置,藉此可調節轉印基板上所保持之半導體晶片1相對於被轉印基板之相對位置。 The transfer substrate holder 13 is movable relative to the target substrate holder 14 in at least the X-axis and Y-axis directions by a moving mechanism (not shown). A control unit controls the moving mechanism to adjust the position of the transfer substrate holder 13, thereby adjusting the relative position of the semiconductor wafer 1 held on the transfer substrate relative to the target substrate.
被轉印基板保持部14於上表面具有平坦面,在半導體晶片1之轉印步驟中保持被轉印基板。於該被轉印基板保持部14之上表面設置有複數個抽吸孔,藉由抽吸力來保持被轉印基板之背面(不被轉印半導體晶片1一側之面)。 The substrate holder 14 has a flat top surface and holds the substrate during the transfer process. Multiple suction holes are provided on the top surface of the substrate holder 14 to maintain the back surface of the substrate (the side not receiving the semiconductor wafer 1) through suction.
再者,於本實施方式中,僅轉印基板保持部13於X軸方向及Y軸方向上移動,從而取得轉印基板保持部13與被轉印基板保持部14相對移動之形態,但於被轉印基板之尺寸較大,被轉印基板之整個面無法位於雷射光11之照射範圍正下方之情形時,亦可於被轉印基板保持部14亦設置X軸方向及Y軸方向之移動機構。 Furthermore, in this embodiment, only the transfer substrate holder 13 moves in the X- and Y-axis directions, resulting in relative movement between the transfer substrate holder 13 and the target substrate holder 14. However, if the target substrate is large and its entire surface cannot be positioned directly below the irradiation range of the laser beam 11, the target substrate holder 14 may also be provided with a mechanism for movement in the X- and Y-axis directions.
其次,於圖3中表示檢查部20之詳情。 Next, Figure 3 shows the details of the inspection unit 20.
檢查部20具有攝影機21、被檢查基板保持部22、及未圖示之控制部,利用攝影機21拍攝被檢查基板保持部22所保持之檢查對象,並藉由圖像解析進行半導體晶片1之外觀檢查。於本實施方式中,檢查對象係轉印至第1轉印基板4a之複數個半導體晶片1。 The inspection unit 20 includes a camera 21, an inspected substrate holder 22, and a control unit (not shown). The camera 21 captures an inspection target held by the inspected substrate holder 22 and visually inspects the semiconductor wafer 1 through image analysis. In this embodiment, the inspection target is a plurality of semiconductor wafers 1 transferred to a first transfer substrate 4a.
第1轉印基板4a上之半導體晶片1存在半導體晶片1於下述 載體基板2上形成過程中性能未達到要求者、向第1轉印基板4a轉印時產生裂紋等者。可藉由確認半導體晶片1之顏色或形狀而準確度較高地辨別半導體晶片1之性能是否正常。 Some semiconductor chips 1 on the first transfer substrate 4a may have substandard performance during formation on the carrier substrate 2 or may have cracks during transfer to the first transfer substrate 4a. By checking the color or shape of the semiconductor chip 1, it is possible to more accurately determine whether the performance of the semiconductor chip 1 is normal.
攝影機21於本實施方式中例如為CMOS(complementary metal oxide semiconductor,互補金氧半導體)攝影機,具有攝像元件,以從外部接收之信號為觸發,將於該攝像元件上成像之光線轉換成電信號,製作數位圖像。該攝影機21之拍攝方向為鉛直下方向,從上方拍攝半導體晶片1。又,攝影機21安裝於未圖示之移動裝置,藉由控制部之控制使移動裝置驅動,從而攝影機21於X軸方向及Y軸方向上移動。 In this embodiment, the camera 21 is, for example, a complementary metal oxide semiconductor (CMOS) camera. It has an imaging element and, triggered by external signals, converts light formed on the imaging element into electrical signals to produce digital images. The camera 21 is oriented directly downward, capturing the semiconductor chip 1 from above. Furthermore, the camera 21 is mounted on a moving device (not shown) and is driven by a control unit, thereby moving the camera 21 in the X-axis and Y-axis directions.
又,檢查部20具有未圖示之照明部。於本實施方式中,照明部為LED照明,與藉由移動裝置實現的攝影機21之移動同步地發光,藉由在照明部發光時攝影機21進行攝像,從而連續拍攝於X軸方向及Y軸方向上排列有複數個之半導體晶片1之外觀。 The inspection unit 20 also includes an illumination unit (not shown). In this embodiment, the illumination unit is an LED that emits light in synchronization with the movement of the camera 21, which is achieved by a moving device. The camera 21 captures images while the illumination unit is emitting light, continuously capturing the appearance of a plurality of semiconductor chips 1 arranged in the X-axis and Y-axis directions.
其次,於圖4中表示安裝部30之詳情。 Next, Figure 4 shows the details of the mounting portion 30.
安裝部30具備載置台31、頭部32及雙視野光學系統33,又,具備未圖示之控制部。 The mounting unit 30 includes a mounting platform 31, a head 32, a dual-view optical system 33, and a control unit (not shown).
載置台31可載置電路基板6並加以保持以使其不因真空吸附而移動,且構成為可藉由XY平台使電路基板6於X、Y軸方向上移動。 The mounting table 31 can mount the circuit board 6 and hold it so that it does not move due to vacuum suction. It is also configured to move the circuit board 6 in the X and Y axis directions via an XY stage.
又,於本實施方式中,載置台31具有加熱器34,能夠藉由控制部控制載置台31表面之溫度(≒載置於載置台31上之電路基板6之溫度)。又,於載置台31設置有未圖示之溫度計,可反饋由該溫度計測得之載置台31之溫度而進行溫度控制。 In this embodiment, the mounting table 31 includes a heater 34, which allows the control unit to control the surface temperature of the mounting table 31 (i.e., the temperature of the circuit board 6 mounted on the mounting table 31). Furthermore, a thermometer (not shown) is provided on the mounting table 31, which uses the temperature of the mounting table 31 measured by the thermometer as feedback for temperature control.
頭部32係前端部大致為平坦面,具有1個以上吸附孔,於 安裝步驟時吸附保持第2轉印基板4b之未被轉印半導體晶片1一側之面。又,頭部32能夠於Z軸方向上移動,使保持於載置台31上之電路基板6與轉印至頭部32所保持之第2轉印基板4b的半導體晶片1之凸塊接觸並加壓。又,頭部32具有加熱器35,能夠藉由控制部控制頭部32、尤其是前端部之溫度。又,於頭部32設置有未圖示之溫度計,可反饋由該溫度計測得之頭部32之溫度而進行溫度控制。 The head 32 has a generally flat front end with one or more suction holes. During the mounting process, it suction-holds the side of the second transfer substrate 4b to which the semiconductor chip 1 is not transferred. Furthermore, the head 32 is movable in the Z-axis direction, bringing the circuit board 6 held on the mounting table 31 into contact with and applying pressure to the bumps of the semiconductor chip 1 transferred to the second transfer substrate 4b held by the head 32. The head 32 also includes a heater 35, which allows the temperature of the head 32, particularly the front end, to be controlled by the control unit. Furthermore, a thermometer (not shown) is provided on the head 32 to provide feedback on the temperature of the head 32 for temperature control.
又,頭部32構成為能夠於θ方向(以Z軸方向為旋轉中心之中心方向)上移動,藉由使載置台31於X、Y軸方向之移動與頭部32於Z軸、θ方向之移動連動,可將半導體晶片1熱壓接並安裝於電路基板6上之特定位置。 Furthermore, the head 32 is configured to move in the θ direction (the direction of rotation about the Z axis). By linking the movement of the mounting table 31 in the X and Y axes with the movement of the head 32 in the Z and θ directions, the semiconductor chip 1 can be thermally pressed and mounted at a specific position on the circuit board 6.
此處,於本實施方式中,同時控制加熱器34及加熱器35,使得安裝步驟中載置台31表面之溫度與頭部32前端部之溫度(≒第2轉印基板4b之溫度)始終相等。藉此,如上所述,即便安裝步驟中電路基板6與第2轉印基板4b發生熱膨脹,第2轉印基板4b之與半導體晶片1接觸之部位和電路基板6上接合有半導體晶片1之凸塊之部位之相對位置亦不易發生變化,從而可穩定地進行高精度之安裝。 In this embodiment, heaters 34 and 35 are controlled simultaneously to ensure that the surface temperature of mounting table 31 and the temperature of the tip of head 32 (≒the temperature of second transfer substrate 4b) are always equal during the mounting step. As described above, even if thermal expansion occurs between circuit board 6 and second transfer substrate 4b during the mounting step, the relative position of the portion of second transfer substrate 4b contacting semiconductor chip 1 and the portion of circuit board 6 where bumps of semiconductor chip 1 are bonded is unlikely to change, enabling stable and high-precision mounting.
再者,於本實施方式中,構成為頭部32於Z軸、θ方向上移動,載置台31於X、Y軸方向上移動,但未必限定於此,可根據裝置情況適當變更。例如,亦可設為如下構成,即,頭部32於X軸、Y軸、θ方向上移動,載置台31於Z軸方向上移動。又,θ方向之移動機構在非必要情況下可省略。例如,半導體晶片1及電路基板6之位置不存在旋轉偏差時可省略θ方向之移動機構。 Furthermore, in this embodiment, the head 32 moves in the Z-axis and θ directions, while the stage 31 moves in the X-axis and Y-axis directions. However, this is not necessarily limited to this configuration and can be modified appropriately depending on the device. For example, a configuration can be employed in which the head 32 moves in the X-axis, Y-axis, and θ directions, while the stage 31 moves in the Z-axis direction. Furthermore, the θ-direction movement mechanism can be omitted if not required. For example, if there is no rotational deviation between the positions of the semiconductor chip 1 and the circuit board 6, the θ-direction movement mechanism can be omitted.
雙視野光學系統33可於載置台31上載置有電路基板6時進 入頭部32與電路基板6之間拍攝兩者之圖像。所拍攝之各圖像於控制部中經圖像處理後識別各者之位置偏差。然後,控制部考慮該位置偏差,以使各半導體晶片1接觸電路基板6上之特定位置而接合之方式進行控制,藉此,於X、Y軸方向上高精度地安裝半導體晶片1。 When a circuit board 6 is placed on the mounting table 31, the dual-view optical system 33 enters the space between the head unit 32 and the circuit board 6 to capture images of both. Each captured image undergoes image processing in the control unit to identify positional deviations. The control unit then controls the placement of each semiconductor chip 1, taking these deviations into account, so that each semiconductor chip 1 contacts and bonds with a specific location on the circuit board 6. This allows for high-precision mounting of the semiconductor chips 1 in the X and Y directions.
其次,參照圖5至圖10對本發明之安裝方法進行說明。圖5係說明本發明之安裝方法之第1轉印步驟之圖。圖6係說明本發明之安裝方法之檢查步驟及晶片去除步驟之圖。圖9係說明本發明之安裝方法之第2轉印步驟之圖。圖10係說明另一實施方式中之安裝步驟之圖。 Next, the mounting method of the present invention will be described with reference to Figures 5 to 10. Figure 5 illustrates the first transfer step of the mounting method of the present invention. Figure 6 illustrates the inspection step and the chip removal step of the mounting method of the present invention. Figure 9 illustrates the second transfer step of the mounting method of the present invention. Figure 10 illustrates the mounting steps in another embodiment.
再者,本發明中,半導體晶片所具有之2個主面中,將保持於載體基板之面設為第1面,將第1面相反側之面定義為第2面,於第2面形成有凸塊,上述凸塊接合於電路基板。 Furthermore, in the present invention, of the two main surfaces of the semiconductor chip, the surface held by the carrier substrate is defined as the first surface, and the surface opposite the first surface is defined as the second surface. Bumps are formed on the second surface, and the bumps are bonded to the circuit board.
首先,參照圖5對圖2所示之轉印部10中實施之本發明之安裝方法中的第1轉印步驟進行說明。再者,於本說明中,將轉印部10實施第1轉印步驟亦稱為第1轉印模式,將轉印部10實施下述第2轉印步驟亦稱為第2轉印模式。 First, referring to FIG5 , the first transfer step of the installation method of the present invention, performed in the transfer unit 10 shown in FIG2 , will be described. Furthermore, in this description, the transfer unit 10 performing the first transfer step will be referred to as the first transfer mode, and the transfer unit 10 performing the second transfer step described below will be referred to as the second transfer mode.
圖5(a)示出了第1面保持於載體基板2之切晶後之複數個半導體晶片1。載體基板2亦向圖5之深度方向擴展而具有圓形或四邊形,包含矽、砷化鎵、藍寶石等。又,半導體晶片1亦順著載體基板2之擴展二維地排列有複數個(數百個~數萬個)。被稱為微型LED之小型半導體晶片1之尺寸為50um×50um以下,此類小型半導體晶片1係以該尺寸加上切晶寬度所得之間距排列。要求此種小型半導體晶片1以高精度(例如,1um以下之精度)安裝於電路基板6。又,於半導體晶片1之第2面形成有凸塊。 Figure 5(a) shows a plurality of semiconductor chips 1, whose first surface is held on a carrier substrate 2 after slicing. The carrier substrate 2 also expands in the depth direction of Figure 5 and has a circular or rectangular shape. It is made of silicon, gallium arsenide, sapphire, etc. Furthermore, a plurality of semiconductor chips 1 (hundreds to tens of thousands) are arranged two-dimensionally along the expansion of the carrier substrate 2. Small semiconductor chips 1, known as micro-LEDs, have a size of 50 μm x 50 μm or less. These small semiconductor chips 1 are arranged at a pitch obtained by adding the slicing width to this size. These small semiconductor chips 1 are required to be mounted on the circuit substrate 6 with high precision (for example, an accuracy of less than 1 μm). Bumps are also formed on the second surface of the semiconductor chip 1.
圖5(b)示出了將半導體晶片1之與保持於載體基板2之面即 第1面為相反側之面即第2面貼附於第1轉印基板4a之第1轉印基板貼附步驟。第1轉印基板4a首先藉由真空吸附而保持於被轉印基板部14,於供貼附半導體晶片1之面上形成有黏著層3a。於該第1轉印基板貼附步驟中,利用機械手40吸附保持有半導體晶片1之載體基板2進行操作,將半導體晶片1之第2面貼附於圖2所示之被轉印基板部14所保持之第1轉印基板4a之黏著層3a上。 Figure 5(b) shows the first transfer substrate attaching step, in which the second surface of the semiconductor chip 1, which is opposite to the first surface held by the carrier substrate 2, is attached to the first transfer substrate 4a. The first transfer substrate 4a is first held by the transfer substrate unit 14 using vacuum suction, and an adhesive layer 3a is formed on the surface to which the semiconductor chip 1 is attached. In this first transfer substrate attaching step, a robot 40 suctions the carrier substrate 2 holding the semiconductor chip 1, attaching the second surface of the semiconductor chip 1 to the adhesive layer 3a of the first transfer substrate 4a held by the transfer substrate unit 14, as shown in Figure 2.
其次,對如上所述貼附有半導體晶片1及載體基板2之第1轉印基板4a執行載體基板去除步驟。於載體基板去除步驟中,藉由雷射舉離從半導體晶片1剝離、去除載體基板2。具體而言,使從圖2所示之雷射照射部12發出之雷射光11a透過載體基板2照射至半導體晶片1之第1面。藉此,作為半導體晶片1之微型LED之GaN層之一部分被分解為Ga及N,從而半導體晶片1從包含藍寶石之載體基板2剝離。所有半導體晶片1被照射了雷射光11a之載體基板2藉由真空吸附載體基板2之機械手40從第1轉印基板4a離開而被去除。 Next, the carrier substrate removal step is performed on the first transfer substrate 4a to which the semiconductor chip 1 and carrier substrate 2 are attached as described above. In this carrier substrate removal step, the carrier substrate 2 is separated and removed from the semiconductor chip 1 by laser lift. Specifically, laser light 11a emitted from the laser irradiation unit 12 shown in Figure 2 is transmitted through the carrier substrate 2 and irradiated onto the first surface of the semiconductor chip 1. This decomposes a portion of the GaN layer of the micro-LEDs on the semiconductor chip 1 into Ga and N, thereby separating the semiconductor chip 1 from the carrier substrate 2 comprising sapphire. The carrier substrate 2, with all semiconductor chips 1 irradiated by the laser light 11a, is then separated from the first transfer substrate 4a by the robot 40, which vacuum-holds the carrier substrate 2 and removes it.
如此般經過第1轉印基板貼附步驟與載體基板去除步驟後,如圖5(c)所示,半導體晶片1從載體基板2被轉印至第1轉印基板4a。本說明中,將半導體晶片1從載體基板2轉印至第1轉印基板4a之步驟稱為第1轉印步驟。 After the first transfer substrate attaching step and the carrier substrate removing step, as shown in Figure 5(c), the semiconductor chip 1 is transferred from the carrier substrate 2 to the first transfer substrate 4a. In this description, the step of transferring the semiconductor chip 1 from the carrier substrate 2 to the first transfer substrate 4a is referred to as the first transfer step.
再者,上述說明中,於第1轉印步驟中將半導體晶片1之第2面貼附於第1轉印基板4a後去除載體基板2,但並不限定於此,亦可於第1轉印基板4a在離開半導體晶片1之第2面少許距離之位置做準備之狀態下,藉由對載體基板2照射雷射時因微型LED之GaN層之一部分分解為Ga及N而產生之推進力對半導體晶片1賦能,使其從載體基板2向第1轉印基 板4a飛行而貼附於第1轉印基板4a。 Furthermore, in the above description, the carrier substrate 2 is removed after the second surface of the semiconductor chip 1 is attached to the first transfer substrate 4a in the first transfer step. However, this is not limiting. Alternatively, with the first transfer substrate 4a positioned slightly away from the second surface of the semiconductor chip 1, the propulsion force generated by the partial decomposition of the GaN layer of the micro-LED into Ga and N when the carrier substrate 2 is irradiated with laser light can energize the semiconductor chip 1, causing it to fly from the carrier substrate 2 toward the first transfer substrate 4a and adhere to the first transfer substrate 4a.
又,於本實施方式中,藉由雷射舉離使載體基板2從半導體晶片1剝離,藉此將半導體晶片1從載體基板2轉印至第1轉印基板4a,但未必限定於此,能夠適當進行變更。例如,亦可將載體基板2從設置有半導體晶片1之側之相反側削掉而去除。此種方法被稱為背面研磨,尤其是於紅色LED之情形時無法應用雷射舉離,故可使用該背面研磨方法。 Furthermore, in this embodiment, the carrier substrate 2 is peeled from the semiconductor chip 1 by laser lift, thereby transferring the semiconductor chip 1 from the carrier substrate 2 to the first transfer substrate 4a. However, this is not necessarily limited to this method and can be modified as appropriate. For example, the carrier substrate 2 can also be removed by scraping away from the side opposite to the side on which the semiconductor chip 1 is provided. This method is called back grinding, and is particularly useful for red LEDs, where laser lift cannot be applied.
繼而,於圖3所示之檢查部20中執行圖6(a)所示之檢查步驟。於檢查步驟中,在吸附保持於被檢查基板保持部之第1轉印基板4a上沿X軸方向及Y軸方向排列的數百個~數萬個半導體晶片1之上方,攝影機21一面移動一面拍攝。檢查部20之控制部對藉由該拍攝所獲得之圖像進行圖像解析,針對各個半導體晶片1進行顏色、形狀等外觀檢查。於第1轉印基板4a為6英吋晶圓之情形時,針對該1個第1轉印基板4a之檢查步驟所需之時間約為30分鐘。 Next, the inspection step shown in Figure 6(a) is performed in the inspection unit 20 shown in Figure 3. During this inspection step, a camera 21 moves and captures images of hundreds to tens of thousands of semiconductor chips 1 arranged along the X and Y axes on the first transfer substrate 4a held by suction on the substrate holder to be inspected. The control unit of the inspection unit 20 analyzes the images obtained by this capture and inspects each semiconductor chip 1 for appearances such as color and shape. If the first transfer substrate 4a is a 6-inch wafer, the inspection step for each first transfer substrate 4a takes approximately 30 minutes.
此處,使用圖7對本發明之另一實施方式中之轉印裝置、尤其是檢查部進行說明。 Here, Figure 7 is used to illustrate the transfer device, particularly the inspection unit, in another embodiment of the present invention.
如圖7所示,該實施方式中之轉印裝置1具備波長測定部20作為檢查部20,該波長測定部20測定作為發光元件之各元件1之發光特性(例如發光波長),並將該測定結果反映至轉印部10中之元件1之轉印。 As shown in FIG7 , the transfer device 1 in this embodiment includes a wavelength measuring unit 20 as an inspection unit 20 . The wavelength measuring unit 20 measures the light emission characteristics (e.g., light emission wavelength) of each element 1 as a light-emitting element and reflects the measurement results on the transfer of the element 1 in the transfer unit 10 .
波長測定部20於本實施方式中係利用光致發光來測定第1轉印基板4a上之各元件1之發光波長,具備雷射光源23、波長測定器24及被檢查基板保持部22。 In this embodiment, the wavelength measuring unit 20 uses photoluminescence to measure the wavelength of light emitted by each component 1 on the first transfer substrate 4a. It includes a laser light source 23, a wavelength measuring device 24, and an inspected substrate holding unit 22.
於該波長測定部20內,作為被檢查基板之第1轉印基板4a係以保持有元件1之面(正面)水平且朝上之方式,由被檢查基板保持部22 吸附固持背面。 Within the wavelength measurement unit 20, the first transfer substrate 4a, serving as the substrate to be inspected, is held horizontally and facing upward by the substrate holder 22 by suction, with the back surface thereof held.
雷射光源23係出射1束雷射光L2之裝置,於本實施方式中出射YAG雷射、可見光雷射等雷射光。 The laser light source 23 is a device that emits a beam of laser light L2. In this embodiment, it emits laser light such as YAG laser or visible light laser.
波長測定器24係測定入射至自身之光之波長者,應用公知之光波長計。 The wavelength measuring device 24 measures the wavelength of the light incident on the device and can be a conventional optical wavelength meter.
當雷射光L2入射至第1轉印基板4a上之特定位置之元件1時,元件1內之電子被激發。該電子恢復為基底狀態時放出發射光L3(所謂之光致發光)。由波長測定器24擷取該發射光L3,測定該發射光L3之波長,藉此,可於不將元件1接線之情況下測定特定元件1之發光波長。 When laser light L2 strikes a device 1 at a specific location on the first transfer substrate 4a, electrons within the device 1 are excited. When these electrons return to their base state, they emit light L3 (so-called photoluminescence). This light L3 is captured by a wavelength detector 24, which measures its wavelength. This allows the wavelength of light emitted by a specific device 1 to be measured without wiring the device 1.
又,被檢查基板保持部22藉由移動平台而能夠於X軸方向及Y軸方向上移動,使第1轉印基板4a相對於雷射光源23及波長測定器24於X軸方向及Y軸方向上相對移動。藉由利用該移動平台控制第1轉印基板4a之位置,能夠測定第1轉印基板4a所保持之任意位置之元件1之發光波長。藉由該波長測定部20測定第1轉印基板4a所保持之所有元件1之發光波長。 Furthermore, the inspected substrate holder 22 is movable in the X- and Y-axis directions via a movable stage, allowing the first transfer substrate 4a to move relative to the laser light source 23 and wavelength measurement device 24 in the X- and Y-axis directions. By controlling the position of the first transfer substrate 4a using the movable stage, the emission wavelength of the component 1 held at any position on the first transfer substrate 4a can be measured. The wavelength measurement unit 20 measures the emission wavelength of all components 1 held on the first transfer substrate 4a.
圖8係表示藉由波長測定部20而獲得之第1轉印基板4a上之元件1之發光波長之分佈的曲線圖。橫軸係發光波長,縱軸係以各發光波長發光之元件1之個數(元件數)。 Figure 8 is a graph showing the distribution of the emission wavelengths of the elements 1 on the first transfer substrate 4a, obtained by the wavelength measuring unit 20. The horizontal axis represents the emission wavelength, and the vertical axis represents the number of elements 1 emitting at each wavelength (number of elements).
即便從同一生長基板磊晶生長之同一種顏色之元件1,各元件1之發光波長亦略微存在差異,形成類似於圖8所示之正態分佈之分佈。 Even when epitaxially grown on the same growth substrate, components 1 of the same color will have slightly different emission wavelengths, resulting in a distribution similar to the normal distribution shown in Figure 8.
此處,於本實施方式中,控制裝置將該分佈分成以下2個組,即,包含取眾數(模式值)之發光波長之特定波長範圍之組A與較組A 靠外側之組(發光波長與模式值存在較大差異之組)即組B。 In this embodiment, the control device divides the distribution into two groups: Group A, which includes a specific wavelength range of the majority (mode value) emission wavelength, and Group B, which is located outside Group A (a group with a significant difference between the emission wavelength and the mode value).
具體而言,於本實施方式中,關於成為圖8中之組A與組B之邊界之發光波長,例如,紅色LED中將600nm~780nm之發光波長範圍設為組A,綠色LED中將505nm~530nm之發光波長範圍設為組A,藍色LED中將470~485nm之發光波長範圍設為組A,將上述範圍外側之範圍設定為組B。 Specifically, in this embodiment, regarding the emission wavelengths that form the boundary between Group A and Group B in Figure 8 , for example, the emission wavelength range of 600nm to 780nm for red LEDs is designated as Group A, the emission wavelength range of 505nm to 530nm for green LEDs is designated as Group A, and the emission wavelength range of 470nm to 485nm for blue LEDs is designated as Group A. The range outside these ranges is designated as Group B.
基於此種各元件1之發光波長之測定結果,控制裝置將發光波長偏離了模式值之組B範圍內之元件1判斷為性能未達到要求。而且,以於轉印部10中向第2轉印基板4b轉印時不使用組B之元件1之方式,僅將性能正常之元件1即屬於組A之元件1從第1轉印基板4a轉印至第2轉印基板4b。 Based on the measurement results of the emission wavelength of each component 1, the control device determines that components 1 in the Group B range whose emission wavelength deviates from the model value do not meet performance requirements. Furthermore, in the transfer section 10, only components 1 with normal performance, i.e., components 1 from Group A, are transferred from the first transfer substrate 4a to the second transfer substrate 4b, without using components 1 from Group B during transfer to the second transfer substrate 4b.
此處,於本說明中,將如上所述般波長測定部20測定各元件1之發光波長稱為波長測定模式,又,將以各元件1中動作性能是進入組A之類的正常範疇還是進入組B之類的未達到要求之範疇這樣的方式由控制裝置判定各元件1之動作性能稱為性能判定模式。 In this description, the wavelength measurement unit 20 measuring the emission wavelength of each element 1 as described above is referred to as the wavelength measurement mode. Furthermore, the control device determining whether the operating performance of each element 1 falls within the normal range, such as group A, or falls within the substandard range, such as group B, is referred to as the performance determination mode.
藉由將該等性能判定模式及波長測定模式組入元件1之轉印步驟中,完成後之顯示器不會存在發光不均現象。 By incorporating these performance evaluation and wavelength measurement modes into the transfer process of component 1, the finished display will exhibit no uneven luminescence.
而且,於本實施方式中性能判定模式係先於第1轉印模式實施,於第1轉印模式中僅使性能判定模式中被判定為正常之元件1轉印至第2轉印基板4b。 Furthermore, in this embodiment, the performance determination mode is executed before the first transfer mode. In the first transfer mode, only components 1 that were determined to be normal in the performance determination mode are transferred to the second transfer substrate 4b.
返回至圖6之說明,於本實施方式中,在檢查步驟之後實施圖6(b)所示之晶片去除步驟。於該晶片去除步驟中,藉由對檢查步驟中被判斷為異常之半導體晶片1(圖6(b)中以點表示之2個半導體晶片1)照射 雷射光11b,而使半導體晶片1燒除,從第1轉印基板4a去除。 Returning to the description of Figure 6 , in this embodiment, the wafer removal step shown in Figure 6(b) is performed after the inspection step. In this wafer removal step, semiconductor wafers 1 determined to be abnormal in the inspection step (the two semiconductor wafers 1 indicated by dots in Figure 6(b)) are irradiated with laser light 11b, thereby ablating the semiconductor wafers 1 and removing them from the first transfer substrate 4a.
該晶片去除步驟亦可由轉印部10實施。此時之雷射光11b因需要使半導體晶片1燒除,故而以較上述第1轉印步驟中之雷射光11a更強功率從雷射照射部12照射。 This chip removal step can also be performed by the transfer unit 10. At this time, the laser light 11b is emitted from the laser irradiation unit 12 at a higher power than the laser light 11a in the first transfer step because it is necessary to burn the semiconductor chip 1.
如此,藉由在晶片去除步驟中去除異常之半導體晶片1,可防止以後之步驟中誤將異常之半導體晶片1轉印。 In this way, by removing the abnormal semiconductor chip 1 during the chip removal step, it is possible to prevent the abnormal semiconductor chip 1 from being mistakenly transferred in subsequent steps.
其次,於圖2所示之轉印部10中執行圖9(a)至(c)所示之第2轉印步驟。於第2轉印步驟中,如圖9(a)所示以黏著層3a及半導體晶片1朝下之方式由轉印基板保持部13(未圖示)保持第1轉印基板4a,又,以具有黏著層3b之第2轉印基板4b位於第1轉印基板4a下方之方式由被轉印基板保持部14保持第2轉印基板4b。 Next, the second transfer step shown in Figures 9(a) to (c) is performed in the transfer section 10 shown in Figure 2. In the second transfer step, as shown in Figure 9(a), the first transfer substrate 4a is held by the transfer substrate holder 13 (not shown) with the adhesive layer 3a and the semiconductor chip 1 facing downward. Furthermore, the second transfer substrate 4b having the adhesive layer 3b is held by the transferred substrate holder 14 with the second transfer substrate 4b positioned below the first transfer substrate 4a.
而且,藉由轉印部10之控制部調節檢流計鏡15之角度而使雷射光11c透過第1轉印基板4a到達黏著層3a與特定半導體晶片1之第2面之界面,藉此使半導體晶片1雷射舉離。具體而言,藉由照射雷射光11而從黏著層3a產生氣體,藉由該氣體之產生而對半導體晶片1賦能,使其從第1轉印基板4a向下方飛行,噴附至第2轉印基板4b。再者,以此方式轉印至第2轉印基板4b之半導體晶片1係第1面與第2轉印基板4b對向,凸塊成為露出至表面之狀態。 The controller of the transfer unit 10 then adjusts the angle of the galvanometer mirror 15, allowing laser light 11c to pass through the first transfer substrate 4a and reach the interface between the adhesive layer 3a and the second surface of a specific semiconductor chip 1, thereby laser-lifting the semiconductor chip 1. Specifically, the laser light 11 generates gas from the adhesive layer 3a by irradiation. This gas energizes the semiconductor chip 1, causing it to fly downward from the first transfer substrate 4a and adhere to the second transfer substrate 4b. The semiconductor chip 1 transferred to the second transfer substrate 4b in this manner faces its first surface, with its bumps exposed.
又,於該第2轉印步驟中,並非將位於第1轉印基板4a之半導體晶片1全部連續地轉印,而是如圖9(b)所示選擇性地轉印半導體晶片1。剛進行過第1轉印步驟之後之第1轉印基板4a上之半導體晶片1之排列與第1轉印步驟前之載體基板2上之半導體晶片1之排列同等,但藉由如此般於第2轉印步驟中選擇性地轉印半導體晶片1,可將半導體晶片1以任意 之排列轉印至第2轉印基板4b。 Furthermore, in this second transfer step, rather than transferring all semiconductor chips 1 on the first transfer substrate 4a continuously, semiconductor chips 1 are selectively transferred, as shown in Figure 9(b). The arrangement of semiconductor chips 1 on the first transfer substrate 4a immediately after the first transfer step is identical to the arrangement of semiconductor chips 1 on the carrier substrate 2 before the first transfer step. However, by selectively transferring semiconductor chips 1 in this second transfer step, semiconductor chips 1 can be transferred to the second transfer substrate 4b in any desired arrangement.
此處,於本實施方式中,為下述安裝步驟做準備,第2轉印基板4b上之半導體晶片1之排列成為對應於半導體晶片1於電路基板6上應配置之位置的排列。更具體而言,以如下佈局將半導體晶片1排列於第2轉印基板4b,上述佈局與藉由一次安裝步驟於電路基板6上可安裝半導體晶片1之區域內之半導體晶片1之佈局成為鏡像關係。 Here, in this embodiment, in preparation for the following mounting step, the arrangement of the semiconductor chips 1 on the second transfer substrate 4b corresponds to the positions where the semiconductor chips 1 should be placed on the circuit board 6. More specifically, the semiconductor chips 1 are arranged on the second transfer substrate 4b in the following layout. This layout mirrors the layout of the semiconductor chips 1 within the area on the circuit board 6 where the semiconductor chips 1 can be mounted in a single mounting step.
另一方面,存在如下情形:如圖9(b)中第2轉印基板4b上以虛線所示,能夠轉印至第2轉印基板4b上所應轉印之位置的半導體晶片1不存在於第1轉印基板4a。於該情形時,如圖9(c)所示使第1轉印基板4a與第2轉印基板4b相對移動,其後實施雷射舉離即可。再者,至於如何使第1轉印基板4a與第2轉印基板4b相對移動才能以最小限度之移動次數於第2轉印基板4b上形成特定之佈局,亦可利用AI(Artificial intelligence,人工智慧)來判斷。 On the other hand, there are cases where, as indicated by the dashed line on the second transfer substrate 4b in Figure 9(b), the semiconductor chip 1 that can be transferred to the intended position on the second transfer substrate 4b is not present on the first transfer substrate 4a. In this case, the first transfer substrate 4a and the second transfer substrate 4b can be moved relative to each other, as shown in Figure 9(c), followed by laser lift. Furthermore, AI (artificial intelligence) can be used to determine how to move the first transfer substrate 4a and the second transfer substrate 4b relative to each other in order to form a specific layout on the second transfer substrate 4b with the minimum number of moves.
又,從第1轉印基板4a雷射舉離時之雷射光11c之功率為分解黏著層3a之程度的功率足矣,較第1轉印步驟中用以分解GaN層之雷射光11a之功率低。因此,第2轉印步驟中因照射雷射光11c而導致半導體晶片1被破壞的可能性較該第1轉印步驟中因照射雷射光11a而導致半導體晶片1被破壞的可能性低,亦能夠忽視。 Furthermore, the power of laser light 11c during laser lift-off from the first transfer substrate 4a is sufficient to decompose the adhesive layer 3a, and is lower than the power of laser light 11a used to decompose the GaN layer in the first transfer step. Therefore, the possibility of damage to the semiconductor chip 1 due to irradiation with laser light 11c in the second transfer step is lower than the possibility of damage to the semiconductor chip 1 due to irradiation with laser light 11a in the first transfer step and can be ignored.
其次,於圖4所示之安裝部30中實施圖10(a)至(c)所示之安裝步驟。於安裝步驟中,如圖10(a)所示,由圖4所示之頭部32保持第2轉印基板4b之未被轉印半導體晶片1一側之面,使載置於下述載置台31上之電路基板6與第2轉印基板4b所保持之半導體晶片1對向。 Next, the mounting steps shown in Figures 10(a) to (c) are performed in the mounting section 30 shown in Figure 4. During the mounting steps, as shown in Figure 10(a), the head section 32 shown in Figure 4 holds the side of the second transfer substrate 4b on which the semiconductor chip 1 has not been transferred, so that the circuit board 6, which is placed on the mounting table 31 described below, faces the semiconductor chip 1 held by the second transfer substrate 4b.
然後,頭部32向電路基板6接近,如圖10(b)所示,使半導 體晶片1之第2面上設置之凸塊與電路基板6抵接,進而加壓。 Then, the head 32 approaches the circuit board 6, as shown in Figure 10(b), causing the bumps provided on the second surface of the semiconductor chip 1 to abut against the circuit board 6, and then applying pressure.
再者,於本實施方式中,於電路基板6之供半導體晶片1抵接之面上設置有ACF(各向異性導電膜)等接合材5,半導體晶片1抵接於接合材5上之後,由接合材5來保持半導體晶片1。 Furthermore, in this embodiment, a bonding material 5 such as an ACF (anisotropic conductive film) is provided on the surface of the circuit board 6 with which the semiconductor chip 1 contacts. After the semiconductor chip 1 contacts the bonding material 5, the bonding material 5 holds the semiconductor chip 1.
又,頭部32中設置有加熱器35,於半導體晶片1之加壓時加熱器35作動將半導體晶片1加熱至50℃以下之相對較低之溫度,藉此,通過半導體晶片1使接合材5之溫度上升,從而半導體晶片1之凸塊周邊之接合材5之黏著力增大。其結果為,半導體晶片1被熱壓接至不會相對於電路基板6之配線產生位置偏差之程度。即,半導體晶片1被暫時壓接於電路基板6。再者,若僅將半導體晶片1之凸塊嵌入接合材5中便可將半導體晶片1以不會相對於電路基板6之配線產生位置偏差之程度固定,則暫時壓接時亦可不必同時加熱半導體晶片1。再者,於本說明中,將如此般半導體晶片1連同第2轉印基板4b一起壓接於電路基板6之步驟稱為壓接步驟。 Furthermore, a heater 35 is provided in the head portion 32. When the semiconductor chip 1 is pressurized, the heater 35 is activated to heat the semiconductor chip 1 to a relatively low temperature of below 50°C. This raises the temperature of the bonding material 5 through the semiconductor chip 1, thereby increasing the adhesion of the bonding material 5 around the bumps of the semiconductor chip 1. As a result, the semiconductor chip 1 is thermally pressed to a degree where it does not deviate from the position relative to the wiring of the circuit board 6. In other words, the semiconductor chip 1 is temporarily pressed to the circuit board 6. Furthermore, if the semiconductor chip 1 can be fixed to a degree where it does not deviate from the position relative to the wiring of the circuit board 6 by simply embedding the bumps of the semiconductor chip 1 in the bonding material 5, then it is not necessary to heat the semiconductor chip 1 during the temporary pressing. Furthermore, in this description, the step of press-bonding the semiconductor chip 1 together with the second transfer substrate 4b to the circuit board 6 is referred to as the press-bonding step.
然後,頭部32於保持第2轉印基板4b之狀態下從電路基板6離開,藉此使第2轉印基板4b與半導體晶片1分離。於本說明中,將如此般使第2轉印基板4b與半導體晶片1分離之步驟稱為分離步驟。該分離步驟中,若黏著層3b相對於半導體晶片1之黏著力較半導體晶片1與電路基板6之結合力弱,則僅使第2轉印基板4b從電路基板6離開便能夠將第2轉印基板4b與半導體晶片1分離。於該分離步驟之後,雖未圖示,但要進行半導體晶片1向電路基板6之壓接即所謂之正式壓接,該壓接之同時將半導體晶片1加熱至較上述暫時壓接時之溫度高之溫度(150℃左右),藉此,半導體晶片1之凸塊熔融,冷卻後以較強之接合力將半導體晶片1安裝於電路基板6之特定位置。藉由實施該正式壓接,而完成本發明之一連串安裝方 法。 Then, while retaining the second transfer substrate 4b, the head 32 moves away from the circuit board 6, thereby separating the second transfer substrate 4b from the semiconductor chip 1. In this description, this step of separating the second transfer substrate 4b from the semiconductor chip 1 is referred to as the separation step. In this separation step, if the adhesive layer 3b's adhesion to the semiconductor chip 1 is weaker than the bonding between the semiconductor chip 1 and the circuit board 6, the second transfer substrate 4b can be separated from the semiconductor chip 1 simply by moving the second transfer substrate 4b away from the circuit board 6. After this separation step, although not shown, semiconductor chip 1 is pressed and bonded to circuit board 6, a process known as final pressing. Simultaneously, semiconductor chip 1 is heated to a temperature higher than the temperature used during the temporary pressing (approximately 150°C). This melts the bumps on semiconductor chip 1. After cooling, semiconductor chip 1 is mounted to a specific position on circuit board 6 with a strong bonding force. This final pressing completes the sequential mounting method of the present invention.
又,於本實施方式中,如圖10(b)般藉由1次安裝步驟同時進行複數個半導體晶片1之壓接。尤其是於半導體晶片1係微型LED之情形時,安裝於1個電路基板6之半導體晶片1多達數萬個。於該情形時,例如4K電視用面板中3840×2160×3個半導體晶片1排列於1個面板上,藉由使複數個半導體晶片1集中轉印至1個第2轉印基板4b,由頭部32保持該第2轉印基板4b且一併進行壓接,可大幅度減少安裝所花費之時間。再者,關於一次轉印至第2轉印基板4b之半導體晶片1之數量,具體而言,考慮80×80個、120×120個等。 Furthermore, in this embodiment, as shown in Figure 10(b), multiple semiconductor chips 1 are simultaneously pressed and bonded in a single mounting step. Especially when the semiconductor chips 1 are micro-LEDs, tens of thousands of semiconductor chips 1 can be mounted on a single circuit board 6. In this case, for example, in a 4K TV panel, 3840×2160×3 semiconductor chips 1 are arranged on a single panel. By collectively transferring multiple semiconductor chips 1 to a single second transfer substrate 4b and performing simultaneous press bonding while holding the second transfer substrate 4b with the head 32, mounting time can be significantly reduced. Specifically, the number of semiconductor chips 1 transferred to the second transfer substrate 4b at a time can be 80×80, 120×120, or the like.
此處,於本實施方式中,如上所述於分離步驟前之壓接步驟中僅限於進行至將半導體晶片1暫時壓接於電路基板6,另外再實施正式壓接,但亦可代替此,於壓接步驟中進行半導體晶片1向電路基板6之正式壓接。於該情形時,於完成分離步驟之時點即完成本發明之一連串安裝方法。此時,使頭部32之至少與第2轉印基板4b接觸之面(頭部32之前端)之熱膨脹係數、第2轉印基板4b之熱膨脹係數、及電路基板6之供安裝半導體晶片1之面之熱膨脹係數同等為宜。又,進而較佳為頭部32之前端、第2轉印基板4b、電路基板6之供安裝半導體晶片1之面之材料相同。具體而言,於電路基板6之材料為玻璃之情形時,頭部32之前端之材料及第2轉印基板4b之材料與電路基板6同樣地使用玻璃。又,於電路基板6之材料為銅之情形時,頭部32之前端之材料及第2轉印基板4b之材料使用SUS304。於該情形時,銅之熱膨脹係數為16.8ppm,相對於此,SUS304之熱膨脹係數為17.3ppm,其等之差為3%左右。 Here, in this embodiment, as described above, the pressing step prior to the separation step is limited to temporarily pressing the semiconductor chip 1 to the circuit substrate 6, and then performing the formal pressing. However, instead of this, the semiconductor chip 1 can be formally pressed to the circuit substrate 6 during the pressing step. In this case, the sequential mounting method of the present invention is completed at the time the separation step is completed. In this case, the thermal expansion coefficient of at least the surface of the head 32 that contacts the second transfer substrate 4b (the front end of the head 32), the thermal expansion coefficient of the second transfer substrate 4b, and the thermal expansion coefficient of the surface of the circuit substrate 6 on which the semiconductor chip 1 is mounted are preferably equal. Furthermore, it is further preferred that the front end of the head 32, the second transfer substrate 4b, and the surface of the circuit board 6 on which the semiconductor chip 1 is mounted be made of the same material. Specifically, if the circuit board 6 is made of glass, the front end of the head 32 and the second transfer substrate 4b should be made of the same glass. Furthermore, if the circuit board 6 is made of copper, the front end of the head 32 and the second transfer substrate 4b should be made of SUS304. In this case, the thermal expansion coefficient of copper is 16.8 ppm, while the thermal expansion coefficient of SUS304 is 17.3 ppm, a difference of approximately 3%.
而且,不僅頭部32中設置有加熱器,載置台31中亦設置有 加熱器34,於實施熱壓接步驟期間,以使頭部32及第2轉印基板4b之溫度與電路基板6之供安裝半導體晶片1之面之溫度始終相等之方式控制加熱器34及加熱器35。藉此,即便於安裝步驟中電路基板6與頭部32及第2轉印基板4b發生熱膨脹,第2轉印基板4b之與半導體晶片1接觸之部位和電路基板6上接合有半導體晶片1之凸塊之部位的相對位置亦不易發生變化,從而可穩定地進行高精度之安裝。 Furthermore, a heater is installed not only in the head 32 but also in the mounting table 31. During the thermal pressing step, heaters 34 and 35 are controlled to maintain the temperature of the head 32 and second transfer substrate 4b at the same level as the surface of the circuit board 6 on which the semiconductor chip 1 is mounted. This ensures that even if thermal expansion of the circuit board 6, head 32, and second transfer substrate 4b occurs during the mounting step, the relative position of the portion of the second transfer substrate 4b in contact with the semiconductor chip 1 and the portion of the circuit board 6 where the bumps of the semiconductor chip 1 are bonded are unlikely to change, enabling stable and high-precision mounting.
圖11係說明點亮檢查步驟及修復步驟之圖。 Figure 11 illustrates the lighting inspection and repair steps.
於半導體晶片1為微型LED之情形時,為了確認已完成向電路基板6之安裝之半導體晶片1之發光性能,如圖11(a)所示,將電路基板6載置於點亮檢查裝置41,使所有半導體晶片1點亮,檢查發光性能。再者,於本發明中,將如此般對安裝於電路基板6之半導體晶片1之性能進行檢查之步驟稱為安裝後檢查步驟。 In the case where the semiconductor chips 1 are micro-LEDs, to confirm the luminous performance of the semiconductor chips 1 mounted on the circuit board 6, as shown in Figure 11(a), the circuit board 6 is placed on a lighting inspection device 41, and all semiconductor chips 1 are illuminated to inspect their luminous performance. In the present invention, this step of inspecting the performance of the semiconductor chips 1 mounted on the circuit board 6 is referred to as a post-mounting inspection step.
若安裝後檢查步驟(點亮檢查)之結果為如圖11(a)中從右數第2個半導體晶片1般未點亮,或存在亮度較低之半導體晶片1,則如圖11(b)所示對該半導體晶片1照射雷射光11d,使其燒除。該雷射光11d之功率可與圖6(b)所示之晶片去除步驟中之雷射光11b之功率同等,該步驟亦可由轉印部10來實施。再者,即便存在性能異常之半導體晶片1,若可於該半導體晶片1附近配置新的半導體晶片1,則亦可使該半導體晶片1保留而不使其燒除。 If the post-installation inspection step (lighting inspection) shows that the semiconductor chip 1 is not lit, as in the second semiconductor chip 1 from the right in Figure 11(a), or if a semiconductor chip 1 exhibits low brightness, the semiconductor chip 1 is irradiated with laser light 11d to be ablated, as shown in Figure 11(b). The power of this laser light 11d can be equivalent to the power of laser light 11b used in the chip removal step shown in Figure 6(b), and this step can also be performed by the transfer unit 10. Furthermore, even if a semiconductor chip 1 exhibits abnormal performance, it can be retained without ablation if a new semiconductor chip 1 is positioned near it.
如此使半導體晶片1燒除時,有時會燒除至接合材5,於該情形時,如圖11(c)所示塗佈接合材5。然後,如圖11(d)所示,於半導體晶片1已燒除之部位,安裝代替性能異常之半導體晶片1發揮功能之新的半導體晶片1即修復用半導體晶片。 When the semiconductor chip 1 is burned off in this manner, the bonding material 5 may sometimes be burned off. In this case, bonding material 5 is applied as shown in Figure 11(c). Then, as shown in Figure 11(d), a new semiconductor chip 1, or a repair semiconductor chip, is installed in the area where the semiconductor chip 1 was burned off to replace the semiconductor chip 1 with abnormal performance.
於本發明中,將如此般安裝修復用半導體晶片之步驟稱為修復步驟,1次修復所需之時間為30秒左右。 In this invention, the step of installing the repair semiconductor chip is referred to as the repair step. The time required for one repair is approximately 30 seconds.
此處,於電路基板6例如用於4K電視之情形時,要使用2488萬個半導體晶片1。於該半導體晶片1之不良率為0.1%之情形時,需要進行約2.5萬個份額之修復。如此一來,假如對修復用半導體晶片逐個進行修復,則僅修復便成為需要花費約200小時之計算,即便利用雷射舉離使安裝步驟本身得以高速完成,亦會因修復而對生產性產生重大影響。 Here, when the circuit board 6 is used in a 4K TV, for example, 24.88 million semiconductor chips 1 are used. If the defect rate of these semiconductor chips 1 is 0.1%, approximately 25,000 of them need to be repaired. If each repair semiconductor chip is repaired individually, the repair alone would take approximately 200 hours. Even if laser lifting is used to speed up the assembly process, the repair process would still significantly impact productivity.
相對於此,於本發明之安裝方法中具有檢查步驟。而且,僅將藉由該檢查步驟被判斷為正常之半導體晶片1、即檢查步驟中之良品率為100%之半導體晶片1配置於第2轉印基板4b,並將上述半導體晶片1安裝於電路基板6。其結果為,與不進行檢查步驟便進行安裝之情形相比,點亮檢查中之點亮不良晶片明顯變少,可大幅度減少安裝後需要進行修復之半導體晶片1之數量,從而能夠提高電路基板6之生產性。 In contrast, the mounting method of the present invention includes an inspection step. Furthermore, only semiconductor chips 1 determined to be normal by this inspection step, i.e., semiconductor chips 1 with a 100% yield during the inspection step, are placed on the second transfer substrate 4b and mounted on the circuit board 6. As a result, compared to mounting without the inspection step, the number of chips with lighting failures during the lighting inspection is significantly reduced, significantly reducing the number of semiconductor chips 1 requiring repair after mounting, thereby improving the productivity of the circuit board 6.
假如於上述4K電視之事例中藉由設置檢查步驟使點亮不良率變為百分之一,則修復所需之時間為約2小時,能夠縮短將近200小時。與先前之安裝方法相比,本發明之安裝方法中雖然追加了檢查步驟,但如上所述檢查步驟所需之時間為30分鐘左右,因此,藉由使用本發明之安裝方法,可大幅度縮短時間,能夠提供正常點亮率為100%之電路基板6。 If, in the aforementioned 4K TV example, the defective lighting rate is reduced to 1% by implementing an inspection step, the repair time is reduced to approximately 2 hours, a reduction of nearly 200 hours. While the present invention's installation method includes an additional inspection step compared to previous installation methods, the time required for this inspection step is approximately 30 minutes. Therefore, using the present invention's installation method significantly reduces this time, enabling the production of a circuit board 6 with a 100% normal lighting rate.
又,於進一步修復時進而利用本發明之安裝方法,如圖12所示對應於電路基板6上之複數個修復位置而選擇性地使半導體晶片1從第1轉印基板4a轉印至第2轉印基板4b,使用該第2轉印基板4b同時實施複數點之修復,藉此可進一步縮短修復所需之時間。 Furthermore, during further repair, the mounting method of the present invention is further utilized. As shown in FIG12 , the semiconductor chip 1 is selectively transferred from the first transfer substrate 4a to the second transfer substrate 4b corresponding to multiple repair locations on the circuit board 6. The second transfer substrate 4b is then used to simultaneously perform repairs at multiple locations, thereby further shortening the time required for repairs.
其次,使用圖13及圖14對本發明之另一實施方式中之轉印步驟進行說明。 Next, the transfer step in another embodiment of the present invention will be described using Figures 13 and 14.
圖13係表示第1轉印模式之概略圖。 Figure 13 is a schematic diagram showing the first transfer mode.
於第1轉印模式下,將被轉印基板設為第1基板w1,轉印部10使保持於基板w0之元件1轉印至第1基板w1。基板w0可為使元件1磊晶生長之生長基板,亦可為供進行1次或複數次元件1從基板向基板之轉印的中間基板。 In the first transfer mode, the substrate to be transferred is set as the first substrate w1, and the transfer unit 10 transfers the device 1 held on substrate w0 to the first substrate w1. Substrate w0 can be a growth substrate for epitaxial growth of device 1, or an intermediate substrate for transferring device 1 from substrate to substrate once or multiple times.
此處,轉印至第1基板w1之元件1之間距即第1元件間隔d1小於藉由下述第2轉印模式而轉印至第2基板w2之元件1之間距即第2元件間隔d2。進而,第1元件間隔d1係於切晶之收尾階段生長基板上所形成之元件1之間距,較佳為以從生長基板至第1基板w1維持該間距之方式進行元件1之轉印。例如,若尺寸為20um×40um之元件1於短邊方向上以30um之間距、於長邊方向上以50um之間距形成於生長基板上,則較佳為一面維持該間距一面從生長基板至第1基板w1進行轉印。 Here, the pitch of the components 1 transferred to the first substrate w1, i.e., the first component spacing d1, is smaller than the pitch of the components 1 transferred to the second substrate w2 using the second transfer mode described below, i.e., the second component spacing d2. Furthermore, the first component spacing d1 represents the pitch of the components 1 formed on the growth substrate at the end of wafer dicing. It is preferred that the components 1 be transferred from the growth substrate to the first substrate w1 while maintaining this spacing. For example, if a 20 μm × 40 μm component 1 is formed on the growth substrate with a spacing of 30 μm along its short side and 50 μm along its long side, it is preferred that this spacing be maintained while transferring the components 1 from the growth substrate to the first substrate w1.
該第1轉印模式下,從雷射光源12以特定之振盪頻率f1出射雷射光L1。該振盪頻率f1(Hz)及檢流計鏡15之掃描速度v1(m/s)係以出射之各雷射光L1能夠使特定之元件1雷射舉離之方式設定。例如,使如圖13般以間距d1排列之元件1依序雷射舉離之情形時,以滿足式子v1/f1=d1之方式設定振盪頻率f1及掃描速度v1。具體而言,於第1元件間隔d1=30um(=0.03mm)之情形時,例如設定為振盪頻率f1=166kHz、掃描速度v1=5m/s時,轉印部10可使元件1依序轉印。另一方面,設定為振盪頻率f1=10kHz、掃描速度v1=300mm/s時,轉印部10亦能夠使元件1依序轉印,但振盪頻率f1即成為特定時間內可轉印之元件1之數量,因此,較佳 為儘可能於振盪頻率f1較高之條件下進行轉印。 In the first transfer mode, laser light source 12 emits laser light L1 at a specific oscillation frequency f1. The oscillation frequency f1 (Hz) and the scanning speed v1 (m/s) of galvanometer mirror 15 are set so that each emitted laser light L1 can laser-lift a specific component 1. For example, when laser-lifting components 1 arranged at a spacing d1 as shown in Figure 13, the oscillation frequency f1 and scanning speed v1 are set to satisfy the equation v1/f1=d1. Specifically, when the first component spacing d1 is 30 μm (0.03 mm), for example, if the oscillation frequency f1 is set to 166 kHz and the scanning speed v1 is set to 5 m/s, the transfer unit 10 can sequentially transfer components 1. On the other hand, if the oscillation frequency f1 is set to 10 kHz and the scanning speed v1 is set to 300 mm/s, the transfer unit 10 can also sequentially transfer components 1. However, the oscillation frequency f1 determines the number of components 1 that can be transferred within a given time period. Therefore, it is best to perform transfer at a higher oscillation frequency f1 as possible.
圖14係表示第2轉印模式之概略圖。 Figure 14 is a schematic diagram showing the second transfer mode.
於第2轉印模式下,將藉由上述第1轉印模式而被轉印了元件1之第1基板w1作為轉印基板,將第2基板w2作為被轉印基板,轉印部10使保持於第1基板w1之元件1轉印至第2基板w2。 In the second transfer mode, the first substrate w1, to which the component 1 has been transferred in the first transfer mode, serves as the transfer substrate, and the second substrate w2 serves as the transferred substrate. The transfer unit 10 transfers the component 1 held on the first substrate w1 to the second substrate w2.
第2基板w2於本實施方式中係表面形成有配線電路之用於電視顯示器之電路基板,藉由在配線電路上轉印元件1,從而作為LED發光元件之元件1能夠點亮。 In this embodiment, the second substrate w2 is a circuit substrate for a television display with a wiring circuit formed on its surface. By transferring the element 1 onto the wiring circuit, the element 1, which is an LED light-emitting element, can be illuminated.
於該第2轉印模式下,轉印部10使保持於第1基板w1之元件1每隔數個進行轉印,藉此,第2基板w2上之元件1之間距被調節為在電路基板上為了使元件1發揮功能而應配置之間距、即作為電路基板上之配線電路之間距的第2元件間隔d2。例如,轉印部10使於第1基板w1上以第1元件間隔d1=30um排列之元件1每隔20個從第1基板w1轉印至第2基板w2,藉此,第2基板w2上元件1之間距即第2元件間隔d2成為600um。 In the second transfer mode, the transfer unit 10 transfers every few components 1 held on the first substrate w1. This adjusts the pitch of components 1 on the second substrate w2 to the second component spacing d2, the spacing required for components 1 to function on the circuit board, i.e., the spacing between wiring circuits on the circuit board. For example, the transfer unit 10 transfers every 20 components 1 arranged at the first component spacing d1 = 30 μm on the first substrate w1 to the second substrate w2. This adjusts the pitch of components 1 on the second substrate w2, i.e., the second component spacing d2, to 600 μm.
另一方面,如該第2轉印模式般以擴大元件1之間距之方式實施轉印之情形時,雷射光源12出射之雷射光L1之振盪頻率可能會受到制約。 On the other hand, when transferring by increasing the pitch of the components 1 as in the second transfer mode, the oscillation frequency of the laser light L1 emitted by the laser light source 12 may be restricted.
圖15係表示光路控制部(檢流計鏡15)之掃描速度與雷射光L1之振盪頻率之關係的圖。圖上,實線表示雷射舉離對象(元件1)之間距為0.03mm之情形,單點鏈線表示間距為0.60mm之情形。 Figure 15 shows the relationship between the scanning speed of the optical path control unit (galvanometer mirror 15) and the oscillation frequency of laser light L1. The solid line represents the case where the distance between the laser and the target (element 1) is 0.03 mm, and the dotted line represents the case where the distance is 0.60 mm.
轉印部10中,檢流計鏡15(光路控制部)之掃描速度有限,假如掃描速度之最高值為5m/s之情形時,於該最高速之掃描速度之條件下呈脈衝狀出射之各雷射光L1能夠使以0.03mm之間距排列之元件1轉印 的雷射光L1之振盪頻率約為166kHz。 In the transfer unit 10, the scanning speed of the galvanometer mirror 15 (optical path control unit) is limited. Assuming the maximum scanning speed is 5 m/s, the oscillation frequency of each pulsed laser beam L1 that can transfer components 1 arranged at a 0.03 mm pitch is approximately 166 kHz.
相對於此,於元件1之間距為0.60mm之情形時,即便掃描速度為最高值時,呈脈衝狀出射之各雷射光L1能夠使元件1轉印的雷射光L1之振盪頻率亦侷限於約8.3kHz,即便雷射光源12能以200kHz之振盪頻率出射雷射光L1,仍未充分發揮其性能,特定時間內能夠轉印之元件1之數量變得相對較少。 In contrast, when the pitch between components 1 is 0.60 mm, even at the highest scanning speed, the oscillation frequency of each pulsed laser beam L1 capable of transferring the laser beam L1 to the component 1 is limited to approximately 8.3 kHz. Even if the laser light source 12 can emit laser beam L1 at an oscillation frequency of 200 kHz, its performance is still not fully utilized, and the number of components 1 that can be transferred in a given period of time becomes relatively small.
因此,於本發明中,以如下方式進行控制:在第1轉印模式與第2轉印模式之間使雷射光源12之振盪頻率不同,使第1轉印模式中之第1元件間隔d1小於第2轉印模式中之第2元件間隔d2,且使第1轉印模式中之振盪頻率f1高於第2轉印模式中之振盪頻率f2。 Therefore, in the present invention, control is performed as follows: the oscillation frequency of the laser light source 12 is varied between the first transfer mode and the second transfer mode, so that the first element spacing d1 in the first transfer mode is smaller than the second element spacing d2 in the second transfer mode, and the oscillation frequency f1 in the first transfer mode is higher than the oscillation frequency f2 in the second transfer mode.
具體而言,於本實施方式中,在第2轉印模式下,檢流計鏡15之掃描速度v2設為最高速(5m/s)左右,振盪頻率f2設為此時各雷射光L1可使元件1以相當於配線電路之間距的第2元件間隔d2(0.60mm)轉印之頻率(約8.3kHz)。 Specifically, in this embodiment, in the second transfer mode, the scanning speed v2 of the galvanometer mirror 15 is set to the maximum speed (approximately 5 m/s), and the oscillation frequency f2 is set to a frequency (approximately 8.3 kHz) that allows each laser beam L1 to transfer the component 1 at the second component spacing d2 (0.60 mm), which is equivalent to the pitch of the wiring circuit.
相對於此,於第1轉印模式下,檢流計鏡15之掃描速度v1與掃描速度v2相等,設為最高速(5m/s)左右,振盪頻率f1設為此時各雷射光L1可使元件1以第1元件間隔d1(0.03mm)轉印之頻率(約166kHz)。 In contrast, in the first transfer mode, the scanning speed v1 of the galvanometer mirror 15 is equal to the scanning speed v2, set to the maximum speed (approximately 5 m/s). The oscillation frequency f1 is set to the frequency (approximately 166 kHz) that allows each laser beam L1 to transfer the component 1 at the first component spacing d1 (0.03 mm).
藉此,考慮配線電路之間距,於第2轉印模式下第2元件間隔d2變得相對較大,由此導致轉印速度變慢,另一方面,藉由在第2轉印模式前之第1轉印模式之前將基板上之元件彼此之間隔設定得相對較小,可設定為相對較高之振盪頻率,一面出射雷射光一面進行元件之轉印,因此,可在短時間內完成元件向電路基板之轉印。 Therefore, considering the spacing of the wiring circuits, the second component spacing d2 becomes relatively large in the second transfer mode, resulting in a slower transfer speed. On the other hand, by setting the spacing between components on the substrate to be relatively small before the first transfer mode, a relatively high oscillation frequency can be set. Laser light is emitted while components are transferred, thus completing the transfer of components to the circuit board in a shorter time.
又,以成為作為光路控制部之檢流計鏡15可控制之最高速 度左右之方式使檢流計鏡15進行動作之情形時,第2轉印模式下雷射光L1之振盪頻率f2為雷射光源12所出射之各雷射光L1可使元件1以第2元件間隔d2轉印之頻率,藉此,於第2轉印模式下亦能夠儘可能於短時間內進行元件1之轉印。 Furthermore, when the galvanometer mirror 15, serving as the optical path control unit, is operated at approximately the maximum speed controllable by the galvanometer mirror 15, the oscillation frequency f2 of the laser light L1 in the second transfer mode is the frequency at which each laser light L1 emitted by the laser light source 12 can transfer the component 1 at the second component interval d2. Consequently, even in the second transfer mode, the component 1 can be transferred in the shortest possible time.
又,藉由上述第1元件間隔d1與生長基板上之元件1彼此之間隔同等,可使第1轉印模式下元件1彼此之間隔接近最小限度,能夠將第1轉印模式下雷射光L1之振盪頻率f1設定得更高。 Furthermore, by making the first element spacing d1 equal to the spacing between elements 1 on the growth substrate, the spacing between elements 1 in the first transfer mode can be minimized, allowing the oscillation frequency f1 of the laser light L1 in the first transfer mode to be set higher.
藉由以上之安裝方法、安裝裝置及轉印裝置,可生產性良好地將半導體晶片安裝於電路基板。 By using the above-described mounting method, mounting device, and transfer device, semiconductor chips can be mounted on circuit boards with high productivity.
此處,本發明之安裝方法、安裝裝置及轉印裝置並不限定於以上所說明之形態,於本發明之範圍內亦可為其他形態者。例如,於上述說明中,第1轉印步驟及第2轉印步驟係於大氣壓下實施,但藉由使轉印部10具備未圖示之減壓部,亦可於減壓環境下實施。 The mounting method, mounting apparatus, and transfer apparatus of the present invention are not limited to the configurations described above and may also have other configurations within the scope of the present invention. For example, in the above description, the first and second transfer steps are performed under atmospheric pressure. However, by providing the transfer unit 10 with a pressure reducing portion (not shown), they can also be performed under a reduced pressure environment.
又,上述說明中係於轉印部中藉由雷射進行半導體晶片之轉印,但亦可使用其他方法。例如,亦可藉由將半導體晶片貼附於黏著片材而進行半導體晶片之轉印。 Furthermore, while the semiconductor chip is transferred using a laser in the transfer unit in the above description, other methods can also be used. For example, the semiconductor chip can be transferred by attaching it to an adhesive sheet.
又,上述說明中係於轉印部中利用檢流計鏡來控制雷射之照射位置,但並不限定於此,亦可利用例如多面鏡等其他公知技術進行控制。又,亦可不利用鏡面反射而僅藉由轉印基板與被轉印基板之相對移動來控制雷射之照射位置。 Furthermore, while the above description uses a galvanometer mirror in the transfer unit to control the laser irradiation position, this is not limited to this method and other known technologies, such as a polygonal mirror, can also be used for control. Furthermore, the laser irradiation position can be controlled solely by the relative movement of the transfer substrate and the substrate being transferred, rather than by mirror reflection.
又,上述說明中係藉由同一轉印部來實施第1轉印步驟與第2轉印步驟,但亦可分別設置不同之轉印部,藉由各自之轉印部來實施。 Furthermore, in the above description, the first transfer step and the second transfer step are performed by the same transfer unit. However, separate transfer units may be provided to perform the steps.
又,藉由檢查部進行之半導體晶片之檢查並不限定於基於圖像解析之外觀檢查、光致發光,亦可為例如利用X射線之檢查。 Furthermore, the inspection of semiconductor chips performed by the inspection unit is not limited to visual inspection based on image analysis or photoluminescence, and may also be inspection using, for example, X-rays.
又,上述說明中係將第2基板作為最終搭載於顯示器等製品之電路基板,但並不限定於此,亦可將例如較電路基板更靠前之階段中被實施轉印之基板設為第2基板。但是,於該情形時,以第2元件間隔被實施轉印之基板包括電路基板而成為複數個,相應地需要耗費轉印時間,因此,最理想的是如上述說明般將電路基板設為第2基板,在向該第2基板轉印元件之前於元件間隔較小之狀態下進行元件從基板向基板之轉印。 Furthermore, while the above description describes the second substrate as the circuit substrate ultimately mounted on a product such as a display, this is not limiting. For example, a substrate to which transfer is performed at a stage prior to the circuit substrate can also serve as the second substrate. However, in this case, the substrates to which transfer is performed at the second component pitch include the circuit substrate, which increases the transfer time. Therefore, it is ideal to use the circuit substrate as the second substrate as described above, and to transfer components from substrate to substrate while the component pitch is small before transferring the components to the second substrate.
又,於上述說明中,第1元件間隔係於切晶之收尾階段生長基板上所形成之元件之間距,且以從生長基板至第1基板維持該間距之方式進行元件之轉印,但並不限定於此,亦可於中途之階段變更間距,只要最終將元件以特定間隔配置於電路基板即可。 Furthermore, in the above description, the first device spacing refers to the spacing of devices formed on the growth substrate at the final stage of wafer dicing, and the devices are transferred from the growth substrate to the first substrate in a manner that maintains this spacing. However, this is not limiting; the spacing can also be changed at an intermediate stage, as long as the devices are ultimately arranged on the circuit board at a specific spacing.
又,於上述說明中,在第1轉印模式及第2轉印模式下掃描速度同為檢流計鏡可控制之最高速,但並不限定於此,例如亦可使第1轉印模式下之掃描速度慢於第2轉印模式下之掃描速度。 Furthermore, in the above description, the scanning speed in both the first transfer mode and the second transfer mode is the same as the maximum speed controllable by the galvanometer mirror. However, this is not limiting. For example, the scanning speed in the first transfer mode may be slower than the scanning speed in the second transfer mode.
1:半導體晶片(元件) 1: Semiconductor chip (component)
3a:黏著層 3a: Adhesive layer
4a:第1轉印基板 4a: First transfer substrate
11b:雷射光 11b: Laser light
14:被轉印基板保持部 14: Transfer substrate holding portion
21:攝影機 21: Camera
22:被檢查基板保持部 22: Inspected substrate holding unit
Claims (15)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020051720A JP7463153B2 (en) | 2020-03-23 | 2020-03-23 | Mounting method and mounting device |
| JP2020-051720 | 2020-03-23 | ||
| JP2021012397A JP2022115687A (en) | 2021-01-28 | 2021-01-28 | Transfer device |
| JP2021-012397 | 2021-01-28 |
Publications (2)
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| TW202201580A TW202201580A (en) | 2022-01-01 |
| TWI896626B true TWI896626B (en) | 2025-09-11 |
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| TW110110355A TWI896626B (en) | 2020-03-23 | 2021-03-23 | Mounting method, mounting device, and transfer device |
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| KR (1) | KR20220158219A (en) |
| CN (1) | CN115335974A (en) |
| TW (1) | TWI896626B (en) |
| WO (1) | WO2021193135A1 (en) |
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| KR20250128973A (en) * | 2022-12-27 | 2025-08-28 | 신에츠 엔지니어링 가부시키가이샤 | Transport device and transport method |
| WO2024157426A1 (en) * | 2023-01-26 | 2024-08-02 | 信越エンジニアリング株式会社 | Transport method |
| JP2025151308A (en) * | 2024-03-28 | 2025-10-09 | 東レエンジニアリング株式会社 | Mounting Equipment |
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| US20060007297A1 (en) * | 2004-06-23 | 2006-01-12 | Masato Doi | Device transfer method |
| US20170278734A1 (en) * | 2015-08-18 | 2017-09-28 | Goertek.Inc | Pre-screening method, manufacturing method, device and electronic apparatus of micro-led |
| US20190304854A1 (en) * | 2018-03-29 | 2019-10-03 | Point Engineering Co., Ltd. | Inspection and replacement method for micro led |
| US20190319165A1 (en) * | 2016-11-07 | 2019-10-17 | Goertek. Inc | Micro-led transfer method and manufacturing method |
| TW202004933A (en) * | 2018-03-28 | 2020-01-16 | 日商東麗工程股份有限公司 | Transfer substrate, mounting method using the same, and method of manufacturing image display device |
| TW202006987A (en) * | 2018-06-22 | 2020-02-01 | 美商維高儀器股份有限公司 | Micro-LED transfer methods using light-based debonding |
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| TW201422056A (en) * | 2012-07-20 | 2014-06-01 | Hitachi High Tech Corp | Laser transfer method and apparatus therefor |
| JP2017098354A (en) * | 2015-11-20 | 2017-06-01 | 日東電工株式会社 | Method for manufacturing sealed semiconductor element and method for manufacturing semiconductor device |
| JP2018060993A (en) * | 2016-09-29 | 2018-04-12 | 東レエンジニアリング株式会社 | Transfer method, mounting method, transfer device, and mounting device |
| TW201917811A (en) * | 2017-06-26 | 2019-05-01 | 美商特索羅科學有限公司 | Light emitting diode (LED) mass-transfer apparatus and method of manufacture |
| TW201911457A (en) * | 2017-07-26 | 2019-03-16 | 優顯科技股份有限公司 | Method of batch transferring micro semiconductor structures |
| JP6916104B2 (en) * | 2017-12-22 | 2021-08-11 | 東レエンジニアリング株式会社 | Mounting method and mounting device |
| JP6916525B2 (en) * | 2018-02-06 | 2021-08-11 | 株式会社ブイ・テクノロジー | LED display manufacturing method |
| JP7429094B2 (en) * | 2018-09-10 | 2024-02-07 | 東レエンジニアリング株式会社 | Mounting board manufacturing method and mounting board |
-
2021
- 2021-03-12 CN CN202180022696.6A patent/CN115335974A/en active Pending
- 2021-03-12 WO PCT/JP2021/010010 patent/WO2021193135A1/en not_active Ceased
- 2021-03-12 KR KR1020227025264A patent/KR20220158219A/en active Pending
- 2021-03-23 TW TW110110355A patent/TWI896626B/en active
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|---|---|---|---|---|
| US20060007297A1 (en) * | 2004-06-23 | 2006-01-12 | Masato Doi | Device transfer method |
| US20170278734A1 (en) * | 2015-08-18 | 2017-09-28 | Goertek.Inc | Pre-screening method, manufacturing method, device and electronic apparatus of micro-led |
| US20190319165A1 (en) * | 2016-11-07 | 2019-10-17 | Goertek. Inc | Micro-led transfer method and manufacturing method |
| TW202004933A (en) * | 2018-03-28 | 2020-01-16 | 日商東麗工程股份有限公司 | Transfer substrate, mounting method using the same, and method of manufacturing image display device |
| US20190304854A1 (en) * | 2018-03-29 | 2019-10-03 | Point Engineering Co., Ltd. | Inspection and replacement method for micro led |
| TW202006987A (en) * | 2018-06-22 | 2020-02-01 | 美商維高儀器股份有限公司 | Micro-LED transfer methods using light-based debonding |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20220158219A (en) | 2022-11-30 |
| WO2021193135A1 (en) | 2021-09-30 |
| CN115335974A (en) | 2022-11-11 |
| TW202201580A (en) | 2022-01-01 |
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