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TWI894056B - Display apparatus - Google Patents

Display apparatus

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Publication number
TWI894056B
TWI894056B TW113145335A TW113145335A TWI894056B TW I894056 B TWI894056 B TW I894056B TW 113145335 A TW113145335 A TW 113145335A TW 113145335 A TW113145335 A TW 113145335A TW I894056 B TWI894056 B TW I894056B
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Taiwan
Prior art keywords
light
emitting element
edge
baffle
display device
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TW113145335A
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Chinese (zh)
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TW202606542A (en
Inventor
陳明倫
許家毫
田堃正
Original Assignee
友達光電股份有限公司
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Application filed by 友達光電股份有限公司 filed Critical 友達光電股份有限公司
Priority to US18/974,828 priority Critical patent/US20260020412A1/en
Priority to CN202510382197.8A priority patent/CN120239399A/en
Application granted granted Critical
Publication of TWI894056B publication Critical patent/TWI894056B/en
Publication of TW202606542A publication Critical patent/TW202606542A/en

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Abstract

A display apparatus including a substrate, a light emitting device and a bank structure is provided. The light emitting device is bonded on the substrate, and has a light emitting surface facing away from the substrate and a first edge and a second edge intersecting each other. A length of the first edge along a first direction is greater than a length of the second edge along a second direction. The bank structure is disposed on the substrate, and surrounds the light emitting device. The bank structure has a first portion and a second portion. The first portion is disposed facing the first edge of the light emitting device along the second direction. The second portion is disposed facing the second edge of the light emitting device along the first direction. The first portion and the second portion of the bank structure respectively have a first top surface and a second top surface facing away from the substrate. In a normal direction of the light emitting surface, the first top surface is lower than the light emitting surface, and the second top surface is higher than the light emitting surface.

Description

顯示裝置Display device

本發明是有關於一種顯示裝置,且特別是有關於一種設有發光元件的顯示裝置。The present invention relates to a display device, and in particular to a display device provided with a light-emitting element.

在自發光型顯示裝置中,發光元件除了正向出光外,還有側向出光的可能。為了增加顯示裝置的正視亮度,除了提升發光元件自身的出光效率外,一種將發光元件發出的側向光導引至正向出光面出射的概念被提出。In self-luminous display devices, the light-emitting element can emit light in both a forward and sideways direction. To increase the frontal brightness of the display, in addition to improving the light-emitting efficiency of the light-emitting element itself, a concept has been proposed to guide the sidelight emitted by the light-emitting element to the forward light-emitting surface.

舉例來說,可在發光元件的側向出光面覆蓋具有高反射率的擋牆結構以反射側向光並增加其從正向出光面出射的機率。一般來說,將擋牆結構的高度設計為高於發光元件的出光面,能讓側向光的再利用率最大化。然而,擋牆結構上各膜層的光學效果卻也容易因為發光元件與基板的接合過程中產生的位置偏移而變差。For example, a high-reflectivity baffle structure can be placed on the side light-emitting surface of a light-emitting device to reflect side light and increase its probability of exiting from the front light-emitting surface. Generally, designing the baffle structure higher than the light-emitting surface of the light-emitting device maximizes the reuse of side light. However, the optical performance of the various film layers on the baffle structure can be easily degraded due to positional offset caused during the bonding process between the light-emitting device and the substrate.

本發明提供一種顯示裝置,能兼顧出光效率與色彩表現。The present invention provides a display device that can take both light extraction efficiency and color performance into consideration.

本發明的顯示裝置,包括基板、發光元件與擋牆結構。發光元件接合在基板上,且具有背對基板的出光面以及定義出光面的第一邊緣與第二邊緣。第一邊緣與第二邊緣分別在第一方向與第二方向上延伸。第一邊緣沿著第一方向的長度大於第二邊緣沿著第二方向的長度。第一方向與第二方向平行於基板的基板表面且彼此相交。擋牆結構設置在基板上,且圍繞發光元件設置。擋牆結構具有第一部分與第二部分。第一部分沿著第二方向正對發光元件的第一邊緣設置。第二部分沿著第一方向正對發光元件的第二邊緣設置。擋牆結構的第一部分與第二部分分別具有背對基板的第一頂面與第二頂面。在基板表面的法線方向上,第一頂面低於發光元件的出光面,且第二頂面高於發光元件的出光面。The display device of the present invention includes a substrate, a light-emitting element and a baffle structure. The light-emitting element is bonded to the substrate and has a light-emitting surface facing away from the substrate and a first edge and a second edge defining the light-emitting surface. The first edge and the second edge extend in a first direction and a second direction, respectively. The length of the first edge along the first direction is greater than the length of the second edge along the second direction. The first direction and the second direction are parallel to the substrate surface of the substrate and intersect with each other. The baffle structure is arranged on the substrate and is arranged around the light-emitting element. The baffle structure has a first part and a second part. The first part is arranged along the second direction facing the first edge of the light-emitting element. The second part is arranged along the first direction facing the second edge of the light-emitting element. The first part and the second part of the baffle structure have a first top surface and a second top surface facing away from the substrate, respectively. In the normal direction of the substrate surface, the first top surface is lower than the light-emitting surface of the light-emitting element, and the second top surface is higher than the light-emitting surface of the light-emitting element.

基於上述,在本發明的一實施例的顯示裝置中,設置在基板表面上的發光元件具有定義出光面且延伸方向彼此相交的第一邊緣與第二邊緣,且第一邊緣的長度大於第二邊緣的長度。圍繞發光元件設置的擋牆結構具有分別正對發光元件的第一邊緣與第二邊緣設置的第一部分與第二部分。由於擋牆結構的第二部分的第二頂面高於發光元件的出光面,發光元件的出光效率能獲得有效地提升。另一方面,藉由讓擋牆結構的第一部分的第一頂面低於發光元件的出光面,可顯著改善顯示裝置因發光元件接合至基板時的位置偏移所造成的大視角色偏。Based on the above, in a display device according to one embodiment of the present invention, a light-emitting element disposed on a surface of a substrate has a first edge and a second edge defining a light-emitting surface and extending in directions intersecting with each other, and the length of the first edge is greater than the length of the second edge. A baffle structure disposed around the light-emitting element has a first portion and a second portion disposed opposite the first edge and the second edge of the light-emitting element, respectively. Because the second top surface of the second portion of the baffle structure is higher than the light-emitting surface of the light-emitting element, the light-emitting efficiency of the light-emitting element can be effectively improved. On the other hand, by making the first top surface of the first portion of the baffle structure lower than the light-emitting surface of the light-emitting element, the large viewing angle deviation of the display device caused by the positional offset when the light-emitting element is bonded to the substrate can be significantly improved.

本文使用的「約」、「近似」、「本質上」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或例如±30%、±20%、±15%、±10%、±5%內。再者,本文使用的「約」、「近似」、「本質上」、或「實質上」可依量測性質、切割性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about," "approximately," "substantially," or "substantially" include the stated value and the average within an acceptable range of deviation for the particular value as determined by one of ordinary skill in the art, taking into account the measurement in question and the particular amount of error associated with the measurement (i.e., the limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or, for example, within ±30%, ±20%, ±15%, ±10%, ±5%. Furthermore, as used herein, "about," "approximately," "substantially," or "substantially" can be used to select an acceptable range of deviation or standard deviation depending on the measured property, cutting property, or other property, and may not apply to all properties without using a single standard deviation.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」可為二元件間存在其它元件。In the accompanying drawings, the thickness of layers, films, panels, regions, etc., is exaggerated for clarity. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or intervening elements may also exist. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connections. Furthermore, "electrically connected" can mean the presence of other elements between two elements.

此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其它元件的「下」側的元件將被定向在其它元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「上面」或「下面」可以包括上方和下方的取向。Furthermore, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another element, as illustrated in the figures. It will be understood that relative terms are intended to encompass different orientations of a device in addition to the orientations illustrated in the figures. For example, if a device in one of the figures were flipped over, an element described as being on the "lower" side of the other elements would be oriented on the "upper" side of the other elements. Thus, the exemplary term "lower" can encompass both "lower" and "upper" orientations, depending on the particular orientation of the figure. Similarly, if a device in one of the figures were flipped over, an element described as being "below" or "beneath" other elements would be oriented "above" the other elements. Thus, the exemplary terms "above" or "below" can encompass both "above" and "below" orientations.

本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或(and/or)公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制申請專利範圍。Exemplary embodiments are described herein with reference to cross-sectional illustrations that are schematic representations of idealized embodiments. Therefore, variations in the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, the embodiments described herein should not be construed as limited to the specific shapes of regions as illustrated herein, but rather include deviations in shape that result, for example, from manufacturing. For example, regions illustrated or described as flat may typically have rough and/or nonlinear features. Furthermore, sharp corners that are illustrated may be rounded. Therefore, the regions illustrated in the figures are schematic in nature, and their shapes are not intended to illustrate the precise shape of the regions and are not intended to limit the scope of the claims.

現將詳細地參考本發明的示範性實施方式,示範性實施方式的實例說明於所附圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals are used in the drawings and the description to refer to the same or like parts.

圖1是依照本發明的第一實施例的顯示裝置的正視示意圖。圖2A及圖2B是圖1的顯示裝置的局部區域的放大示意圖。圖3A及圖3B是圖2A的顯示裝置的剖視示意圖。圖4是圖2A的顯示裝置的局部區域的放大示意圖。圖5A至圖5J及圖6A至圖6J是圖3A及圖3B的顯示裝置的製造流程的剖視示意圖。圖3A對應於圖2A及圖2B的剖線A-A’。圖3B對應於圖2A及圖2B的剖線B-B’。為了清楚呈現,圖2B省略了圖2A中遮光結構170的繪示。FIG1 is a schematic front view of a display device according to a first embodiment of the present invention. FIG2A and FIG2B are enlarged schematic views of a local area of the display device of FIG1. FIG3A and FIG3B are schematic cross-sectional views of the display device of FIG2A. FIG4 is an enlarged schematic view of a local area of the display device of FIG2A. FIG5A to FIG5J and FIG6A to FIG6J are schematic cross-sectional views of the manufacturing process of the display device of FIG3A and FIG3B. FIG3A corresponds to the section line A-A’ of FIG2A and FIG2B. FIG3B corresponds to the section line B-B’ of FIG2A and FIG2B. For clarity of presentation, FIG2B omits the illustration of the light-shielding structure 170 in FIG2A.

請參照圖1及圖2A,顯示裝置10包括基板100與多個發光元件120。在本實施例中,基板100例如是設有畫素電路層(未繪示)與多個接合墊105的電路板,且發光元件120適於接合至接合墊105以電性連接基板100。多個發光元件120可分別接合在基板100上的多個畫素區PA內,並構成顯示裝置10的多個顯示畫素。在本實施例中,每個顯示區PA內可接合有不同發光顏色(例如紅色、綠色與藍色,但不限於此)的三個發光元件120,例如是發光元件121、發光元件122與發光元件123。Referring to Figures 1 and 2A , the display device 10 includes a substrate 100 and a plurality of light-emitting elements 120. In this embodiment, the substrate 100 is, for example, a circuit board having a pixel circuit layer (not shown) and a plurality of bonding pads 105. The light-emitting elements 120 are adapted to be bonded to the bonding pads 105 to electrically connect to the substrate 100. The plurality of light-emitting elements 120 may be bonded to a plurality of pixel areas PA on the substrate 100, respectively, to form a plurality of display pixels of the display device 10. In this embodiment, each display area PA may be bonded with three light-emitting elements 120 of different luminous colors (e.g., red, green, and blue, but not limited thereto), such as light-emitting element 121, light-emitting element 122, and light-emitting element 123.

在本實施例中,顯示裝置10還設有多個透光區TA。這些透光區TA例如是沿著方向X與方向Y排成多行與多列,且彼此間隔開來,其中方向X相交於(例如垂直於)方向Y。亦即,這些透光區TA可陣列排列於基板100上。特別注意的是,多個畫素區PA是設置在這些透光區TA之間的間隔區域中。在本實施例中,前述的間隔區域是由顯示裝置10的遮光結構170所定義的。遮光結構170在各個畫素區PA內設有多個開口OP2,且這些開口OP2沿著方向Z分別重疊於發光元件121、發光元件122與發光元件123。In this embodiment, the display device 10 further includes a plurality of light-transmitting areas TA. These light-transmitting areas TA are, for example, arranged in multiple rows and columns along directions X and Y, and are spaced apart from one another, where direction X intersects with (e.g., is perpendicular to) direction Y. In other words, these light-transmitting areas TA may be arranged in an array on the substrate 100. Of particular note is that a plurality of pixel areas PA are disposed in the spacing regions between these light-transmitting areas TA. In this embodiment, the aforementioned spacing regions are defined by the light-shielding structure 170 of the display device 10. The light-shielding structure 170 includes a plurality of openings OP2 within each pixel area PA, and these openings OP2 overlap with the light-emitting element 121, the light-emitting element 122, and the light-emitting element 123 along direction Z, respectively.

請參照圖2A、圖3A及圖3B,在本實施例中,發光元件120可以是微型發光二極體(micro light emitting diode,micro-LED),且包括第一電極E1、第二電極E2與磊晶結構層。磊晶結構層可包括第一型半導體層SCL1、第二型半導體層SCL2與發光層LEL,其中發光層LEL設置在第一型半導體層SCL1與第二型半導體層SCL2之間。第一電極E1與第二電極E2分別電性連接第一型半導體層SCL1與第二型半導體層SCL2。發光元件120的第一電極E1與第二電極E2可分別與兩個接合墊105相接合以實現發光元件120與基板100的電性連接關係。Referring to Figures 2A, 3A, and 3B, in this embodiment, the light-emitting element 120 may be a micro light-emitting diode (micro-LED) and include a first electrode E1, a second electrode E2, and an epitaxial structure layer. The epitaxial structure layer may include a first-type semiconductor layer SCL1, a second-type semiconductor layer SCL2, and a light-emitting layer LEL, wherein the light-emitting layer LEL is disposed between the first-type semiconductor layer SCL1 and the second-type semiconductor layer SCL2. The first electrode E1 and the second electrode E2 are electrically connected to the first-type semiconductor layer SCL1 and the second-type semiconductor layer SCL2, respectively. The first electrode E1 and the second electrode E2 of the light-emitting element 120 may be bonded to the two bonding pads 105 respectively to achieve electrical connection between the light-emitting element 120 and the substrate 100 .

在本實施例中,發光元件120的第一電極E1與第二電極E2可設置在磊晶結構層朝向基板100的同一側。更具體地,發光元件120可以是覆晶式(flip-chip type)微型發光二極體。在本實施例中,發光元件120具有背對基板100的正向出光面120es1、連接正向出光面120es1的側向出光面120es2以及定義正向出光面120es1的第一邊緣120e1、第二邊緣120e2、第三邊緣120e3與第四邊緣120e4。側向出光面120es2可環繞正向出光面120es1。第一邊緣120e1與第三邊緣120e3在方向X上延伸。第二邊緣120e2與第四邊緣120e4在方向Y上延伸。在本實施例中,第一邊緣120e1與第三邊緣120e3各自沿著方向X的長度L1大於第二邊緣120e2與第四邊緣120e4各自沿著方向Y的長度L2(如圖4所示)。In this embodiment, the first electrode E1 and second electrode E2 of the light-emitting element 120 may be disposed on the same side of the epitaxial structure layer facing the substrate 100. More specifically, the light-emitting element 120 may be a flip-chip type micro-light-emitting diode. In this embodiment, the light-emitting element 120 has a front light-emitting surface 120es1 facing away from the substrate 100, a side light-emitting surface 120es2 connected to the front light-emitting surface 120es1, and a first edge 120e1, a second edge 120e2, a third edge 120e3, and a fourth edge 120e4 defining the front light-emitting surface 120es1. The side light-emitting surface 120es2 may surround the front light-emitting surface 120es1. The first edge 120e1 and the third edge 120e3 extend in direction X. The second edge 120e2 and the fourth edge 120e4 extend in direction Y. In this embodiment, the length L1 of each of the first edge 120e1 and the third edge 120e3 along direction X is greater than the length L2 of each of the second edge 120e2 and the fourth edge 120e4 along direction Y (as shown in FIG. 4 ).

舉例來說,顯示裝置10在基板100的基板表面100s上還可設有畫素定義層110。畫素定義層110具有定義出多個畫素區PA的多個開口,且這些開口顯露出基板100上的多個接合墊105。For example, the display device 10 may further include a pixel definition layer 110 on the substrate surface 100s of the substrate 100. The pixel definition layer 110 has a plurality of openings defining a plurality of pixel areas PA, and these openings expose a plurality of bonding pads 105 on the substrate 100.

為了增加發光元件120在正向出光面120es1的出光強度,顯示裝置10在基板100上還設有擋牆結構140,且擋牆結構140覆蓋發光元件120的側向出光面120es2。擋牆結構140適於將發光元件120的發光層LEL朝向側向出光面120es2發出的光線反射回磊晶結構層,以增加光線從正向出光面120es1出射的機會。擋牆結構140的材料例如包括白色或高反射材。To increase the intensity of light emitted from the light-emitting element 120 at the front light-emitting surface 120es1, the display device 10 further includes a baffle structure 140 on the substrate 100. Baffle structure 140 covers the side light-emitting surface 120es2 of the light-emitting element 120. Baffle structure 140 is adapted to reflect light emitted from the light-emitting layer (LEL) of the light-emitting element 120 toward the side light-emitting surface 120es2 back toward the epitaxial structure layer, thereby increasing the chance of light being emitted from the front light-emitting surface 120es1. Baffle structure 140 is made of, for example, white or highly reflective material.

請參照圖2B、圖3A及圖3B,擋牆結構140具有沿著方向Z重疊於發光元件120的開口OP1。舉例來說,在本實施例中,擋牆結構140在每個畫素區PA內僅具有一個開口OP1。此開口OP1在方向Y上延伸,並且同時重疊畫素區PA內的三個發光元件121~123。然而,本發明不限於此。在一未繪示的實施例中,擋牆結構在每個畫素區PA內可具有分別重疊於三個發光元件120的三個開口,且這三個開口彼此間隔開來。Referring to Figures 2B, 3A, and 3B, the barrier structure 140 has an opening OP1 that overlaps the light-emitting element 120 along direction Z. For example, in this embodiment, the barrier structure 140 has only one opening OP1 in each pixel area PA. This opening OP1 extends in direction Y and overlaps three light-emitting elements 121-123 in the pixel area PA. However, the present invention is not limited to this. In an embodiment (not shown), the barrier structure may have three openings in each pixel area PA, overlapping three light-emitting elements 120, respectively, and these three openings are spaced apart from each other.

詳細而言,擋牆結構140包括第一擋牆141與第二擋牆142。第一擋牆141設置在畫素定義層110上,且兩者之間還可設有鈍化層115。第一擋牆141圍繞發光元件120設置,並且覆蓋發光元件120的側向出光面120es2。第二擋牆142設置在第一擋牆141上,且沿著方向Z不重疊於多個發光元件120。更具體地,第二擋牆142設置在發光元件120沿著方向X(即第一方向)的相對兩側,但未設置在發光元件120沿著方向Y(即第二方向)的相對兩側。Specifically, the baffle structure 140 includes a first baffle 141 and a second baffle 142. The first baffle 141 is disposed on the pixel definition layer 110, with a passivation layer 115 optionally disposed therebetween. The first baffle 141 surrounds the light-emitting element 120 and covers the lateral light-emitting surface 120es2 of the light-emitting element 120. The second baffle 142 is disposed on the first baffle 141 and does not overlap with the plurality of light-emitting elements 120 along the direction Z. More specifically, the second baffles 142 are disposed on opposite sides of the light emitting element 120 along direction X (ie, the first direction), but are not disposed on opposite sides of the light emitting element 120 along direction Y (ie, the second direction).

在本實施例中,第一擋牆141與第二擋牆142之間設有透光層160,且透光層160的材料例如包括透明光阻材料,但不以此為限。另一方面,第二擋牆142設有擋牆結構140的開口OP1,且開口OP1內可設有散射層165,散射層165例如是以透明光阻材料作為基質並摻雜散射粒子而成。先說明的是,散射層165的設置可進一步改善顯示裝置10在大視角下因發光元件120接合至基板100時的位置偏移所造成的色偏問題。然而,本發明不限於此。在其他實施例中,散射層165可以另一透光層來取代,且該另一透光層與透光層160的材料可選擇性地相同。In this embodiment, a light-transmitting layer 160 is disposed between the first baffle 141 and the second baffle 142. The material of the light-transmitting layer 160 may include, but is not limited to, a transparent photoresist material. Furthermore, the second baffle 142 defines an opening OP1 of the baffle structure 140. A scattering layer 165 may be disposed within the opening OP1. The scattering layer 165 may be, for example, made of a transparent photoresist material doped with scattering particles. It should be noted that the provision of the scattering layer 165 can further improve color shift caused by positional misalignment when the light-emitting element 120 is bonded to the substrate 100 at wide viewing angles in the display device 10. However, the present invention is not limited to this embodiment. In other embodiments, the scattering layer 165 may be replaced by another light-transmitting layer, and the material of the other light-transmitting layer and the light-transmitting layer 160 may be selectively the same.

從另一觀點來說,在本實施例中,擋牆結構140具有第一部分140p1與第二部分140p2。第一部分140p1沿著方向Y正對發光元件120的第一邊緣120e1與第三邊緣120e3設置。第二部分140p2沿著方向X正對發光元件120的第二邊緣120e2與第四邊緣120e4設置。或者是說,擋牆結構140的第一部分140p1是位在發光元件120沿著方向Y的相對兩側,且沿著方向X不重疊於發光元件120。擋牆結構140的第二部分140p2是位在發光元件120沿著方向X的相對兩側,且沿著方向Y不重疊於發光元件120。From another perspective, in this embodiment, the barrier structure 140 includes a first portion 140p1 and a second portion 140p2. The first portion 140p1 is disposed opposite the first edge 120e1 and the third edge 120e3 of the light-emitting element 120 along the direction Y. The second portion 140p2 is disposed opposite the second edge 120e2 and the fourth edge 120e4 of the light-emitting element 120 along the direction X. In other words, the first portion 140p1 of the barrier structure 140 is located on opposite sides of the light-emitting element 120 along the direction Y and does not overlap with the light-emitting element 120 along the direction X. The second portion 140p2 of the blocking structure 140 is located on two opposite sides of the light emitting element 120 along the direction X and does not overlap with the light emitting element 120 along the direction Y.

更具體地說,擋牆結構140的第一擋牆141沿著方向Y重疊於發光元件120的部分構成擋牆結構140的第一部分140p1(如圖3B所示),而擋牆結構140的第一擋牆141與第二擋牆142沿著方向X重疊於發光元件120的部分構成擋牆結構140的第二部分140p2(如圖3A所示)。More specifically, the portion of the first baffle 141 of the baffle structure 140 that overlaps with the light-emitting element 120 along the direction Y constitutes a first portion 140p1 of the baffle structure 140 (as shown in FIG3B ), and the portions of the first baffle 141 and the second baffle 142 of the baffle structure 140 that overlap with the light-emitting element 120 along the direction X constitute a second portion 140p2 of the baffle structure 140 (as shown in FIG3A ).

在本實施例中,擋牆結構140的第一部分140p1與第二部分140p2分別具有背對基板100的第一頂面140ts1與第二頂面140ts2。前述各部分的頂面例如是擋牆結構140的各部分中最遠離基板表面100s的表面。也就是說,第一擋牆141中構成擋牆結構140的第一部分140p1的部分在背對基板100的一側表面定義為第一頂面140ts1,而第二擋牆142中構成擋牆結構140的第二部分140p2的部分在背對基板100的一側表面定義為第二頂面140ts2。In this embodiment, the first portion 140p1 and the second portion 140p2 of the baffle structure 140 respectively have a first top surface 140ts1 and a second top surface 140ts2 facing away from the substrate 100. The top surfaces of these portions are, for example, the surfaces of the baffle structure 140 farthest from the substrate surface 100s. In other words, the portion of the first baffle 141 that constitutes the first portion 140p1 of the baffle structure 140 is defined as the first top surface 140ts1 on the side facing away from the substrate 100, while the portion of the second baffle 142 that constitutes the second portion 140p2 of the baffle structure 140 is defined as the second top surface 140ts2 on the side facing away from the substrate 100.

特別注意的是,在基板表面100s的法線方向(例如方向Z)上,擋牆結構140的第一頂面140ts1低於發光元件120的正向出光面120es1,但高於發光元件120的發光層LEL。擋牆結構140的第二頂面140ts2高於發光元件120的正向出光面120es1。也就是說,擋牆結構140中正對發光元件120的第二邊緣120e2與第四邊緣120e4的第二部分140p2相對於基板表面100s的高度高於發光元件120的正向出光面120es1(如圖3A所示),而擋牆結構140中正對發光元件120的第一邊緣120e1與第三邊緣120e3且直接覆蓋側向出光面120es2的第一部分140p1相對於基板表面100s的高度低於發光元件120的正向出光面120es1(如圖3B所示)。Of particular note, in the normal direction (e.g., direction Z) of the substrate surface 100s, the first top surface 140ts1 of the barrier structure 140 is lower than the front light-emitting surface 120es1 of the light-emitting element 120, but higher than the light-emitting layer (LEL) of the light-emitting element 120. The second top surface 140ts2 of the barrier structure 140 is higher than the front light-emitting surface 120es1 of the light-emitting element 120. That is, the height of the second portion 140p2 of the second edge 120e2 and the fourth edge 120e4 of the blocking structure 140 facing the light-emitting element 120 relative to the substrate surface 100s is higher than the front light-emitting surface 120es1 of the light-emitting element 120 (as shown in FIG3A ), while the height of the first portion 140p1 of the first edge 120e1 and the third edge 120e3 of the blocking structure 140 facing the light-emitting element 120 and directly covering the lateral light-emitting surface 120es2 relative to the substrate surface 100s is lower than the front light-emitting surface 120es1 of the light-emitting element 120 (as shown in FIG3B ).

請參照圖3A、圖3B及圖4,進一步而言,遮光結構170設置在擋牆結構140上,且包括第一遮光層171與第二遮光層172。第一遮光層171設置在第一擋牆141上,且沿著方向Z重疊於擋牆結構140的第一部分140p1。第二遮光層172設置在第二擋牆142上,且沿著方向Z重疊於擋牆結構140的第二部分140p2。3A, 3B, and 4, the light-shielding structure 170 is further described as being disposed on the baffle structure 140 and including a first light-shielding layer 171 and a second light-shielding layer 172. The first light-shielding layer 171 is disposed on the first baffle 141 and overlaps the first portion 140p1 of the baffle structure 140 along the direction Z. The second light-shielding layer 172 is disposed on the second baffle 142 and overlaps the second portion 140p2 of the baffle structure 140 along the direction Z.

在本實施例中,第一遮光層171與第二遮光層172分別具有相對於基板表面100s的高度H1與高度H2,且高度H2大於高度H1。亦即,設置在擋牆結構140的第一部分140p1上的第一遮光層171的高度H1是低於設置在擋牆結構140的第二部分140p2上的第二遮光層172的高度H2。或者是說,遮光結構170沿著方向Y正對發光元件120的第一邊緣120e1與第三邊緣120e3的部分的高度H1是低於遮光結構170沿著方向X正對發光元件120的第二邊緣120e2與第四邊緣120e4的另一部分的高度H2。In this embodiment, the first light-shielding layer 171 and the second light-shielding layer 172 have heights H1 and H2, respectively, relative to the substrate surface 100s, with height H2 being greater than height H1. Specifically, the height H1 of the first light-shielding layer 171 disposed on the first portion 140p1 of the baffle structure 140 is lower than the height H2 of the second light-shielding layer 172 disposed on the second portion 140p2 of the baffle structure 140. In other words, the height H1 of the portion of the light-shielding structure 170 facing the first edge 120e1 and the third edge 120e3 of the light-emitting element 120 along the direction Y is lower than the height H2 of the other portion of the light-shielding structure 170 facing the second edge 120e2 and the fourth edge 120e4 of the light-emitting element 120 along the direction X.

由於顯示裝置在大視角下容易因發光元件120接合至基板100時的位置偏移而造成色偏的問題,且本實施例的發光元件120沿著方向X的長度L1大於其沿著方向Y的長度L2,發光元件120在方向Y上的位置偏移所產生的大視角色偏量會大於發光元件120在方向X上的位置偏移所產生的大視角色偏量。Since the display device is susceptible to color shift at wide viewing angles due to positional shift of the light-emitting element 120 when bonded to the substrate 100, and since the length L1 of the light-emitting element 120 along the X direction is greater than its length L2 along the Y direction, the color shift at wide viewing angles caused by the positional shift of the light-emitting element 120 in the Y direction is greater than the color shift at wide viewing angles caused by the positional shift of the light-emitting element 120 in the X direction.

因此,讓擋牆結構140的第二部分140p2的第二頂面140ts2高於發光元件120的正向出光面120es1,並且讓擋牆結構140的第一部分140p1的第一頂面140ts1低於發光元件120的正向出光面120es1,除了可顯著提升發光元件120的出光效率外,還能抑制顯示裝置10在大視角下因發光元件120接合至基板100時的位置偏移所造成的色偏現象。亦即,能兼顧顯示裝置10的出光效率與色彩表現。Therefore, by positioning the second top surface 140ts2 of the second portion 140p2 of the baffle structure 140 higher than the front light-emitting surface 120es1 of the light-emitting element 120, and positioning the first top surface 140ts1 of the first portion 140p1 of the baffle structure 140 lower than the front light-emitting surface 120es1 of the light-emitting element 120, this significantly improves the light-extraction efficiency of the light-emitting element 120 and also suppresses color shift caused by positional misalignment when the light-emitting element 120 is bonded to the substrate 100 at wide viewing angles. In other words, both light-extraction efficiency and color performance of the display device 10 are maintained.

在本實施例中,第一遮光層171具有定義開口OP2且在方向X上延伸的遮光邊緣171e1與遮光邊緣171e2,而第二遮光層172具有定義開口OP2且在方向Y上延伸的遮光邊緣172e1與遮光邊緣172e2。特別注意的是,遮光邊緣171e1與第一邊緣120e1沿著方向Y的距離d1以及遮光邊緣171e2與第三邊緣120e3沿著方向Y的距離d3大於遮光邊緣172e1與第二邊緣120e2沿著方向X的距離d2以及遮光邊緣172e2與第四邊緣120e4沿著方向X的距離d4。從另一觀點來說,遮光結構170的開口OP2沿著方向Y的長度L4與發光元件120沿著方向Y的長度L2的差值會大於遮光結構170的開口OP2沿著方向X的長度L3與發光元件120沿著方向X的長度L1的差值。據此,能進一步降低顯示裝置10因發光元件120接合至基板100時的位置偏移所產生的大視角色偏。In this embodiment, the first light-shielding layer 171 has a light-shielding edge 171e1 and a light-shielding edge 171e2 that define an opening OP2 and extend in the direction X, while the second light-shielding layer 172 has a light-shielding edge 172e1 and a light-shielding edge 172e2 that define an opening OP2 and extend in the direction Y. It is particularly noteworthy that the distance d1 between the light-shielding edge 171e1 and the first edge 120e1 along the direction Y, and the distance d3 between the light-shielding edge 171e2 and the third edge 120e3 along the direction Y, are greater than the distance d2 between the light-shielding edge 172e1 and the second edge 120e2 along the direction X, and the distance d4 between the light-shielding edge 172e2 and the fourth edge 120e4 along the direction X. From another perspective, the difference between the length L4 of the opening OP2 of the light-shielding structure 170 along the direction Y and the length L2 of the light-emitting element 120 along the direction Y is greater than the difference between the length L3 of the opening OP2 of the light-shielding structure 170 along the direction X and the length L1 of the light-emitting element 120 along the direction X. Consequently, the large chromatic aberration in the viewing angle of the display device 10 caused by positional misalignment when the light-emitting element 120 is bonded to the substrate 100 can be further reduced.

在本實施例中,顯示裝置10還可包括封裝層180,覆蓋遮光結構170與散射層165。封裝層180的材料例如包括聚二甲基矽氧烷(polydimethylsiloxane,PDMS)。In this embodiment, the display device 10 may further include an encapsulation layer 180 covering the light shielding structure 170 and the scattering layer 165. The material of the encapsulation layer 180 may include polydimethylsiloxane (PDMS), for example.

以下將針對顯示裝置10的製造方法進行示範性地說明。The following is an exemplary description of a method for manufacturing the display device 10.

請參照圖5A及圖5B,首先,進行多個發光元件120與基板100的接合製程。在完成這些發光元件120與基板100的接合後,於基板100上形成第一擋牆材料層141M。第一擋牆材料層141M覆蓋發光元件120的正向出光面120es1與側向出光面120es2、接合墊105與畫素定義層110。Referring to Figures 5A and 5B , a bonding process is first performed to bond multiple light-emitting elements 120 to substrate 100. After bonding these light-emitting elements 120 to substrate 100, a first barrier material layer 141M is formed on substrate 100. This first barrier material layer 141M covers the front light-emitting surface 120es1 and the side light-emitting surface 120es2 of the light-emitting element 120, the bonding pad 105, and the pixel definition layer 110.

接著,對第一擋牆材料層141M進行曝光顯影製程,以形成擋牆結構140的第一擋牆141,如圖5B及圖6B所示。特別說明的是,第一擋牆材料層141M的曝光製程例如是採用弱曝的方式。因此,在顯影製程後,第一擋牆材料層141M在發光元件120的正向出光面120es1上方的部分會被移除,僅留下覆蓋側向出光面120es2的部分。Next, the first baffle material layer 141M undergoes an exposure and development process to form the first baffle 141 of the baffle structure 140, as shown in Figures 5B and 6B. It should be noted that the exposure process for the first baffle material layer 141M employs, for example, a weak exposure method. Therefore, after the development process, the portion of the first baffle material layer 141M above the front light-emitting surface 120es1 of the light-emitting element 120 is removed, leaving only the portion covering the lateral light-emitting surface 120es2.

請參照圖5C及圖6C,在第一擋牆141完成後,形成透光材料層160M,以覆蓋第一擋牆141與發光元件120的正向出光面120es1。對透光材料層160M進行曝光顯影製程,以形成透光層160,如圖5D及圖6D所示。接著,在透光層160上形成第一遮光材料層171M,以覆蓋透光層160與第一擋牆141,如圖5E及圖6E所示。Referring to Figures 5C and 6C , after the first baffle 141 is completed, a light-transmitting material layer 160M is formed to cover the first baffle 141 and the front light-emitting surface 120es1 of the light-emitting element 120. An exposure and development process is performed on the light-transmitting material layer 160M to form the light-transmitting layer 160, as shown in Figures 5D and 6D . Next, a first light-shielding material layer 171M is formed on the light-transmitting layer 160 to cover the light-transmitting layer 160 and the first baffle 141, as shown in Figures 5E and 6E .

對第一遮光材料層171M進行曝光顯影製程,以形成第一遮光層171,如圖5F及圖6F所示。在顯影製程後,第一遮光層171具有開口OP2a,且透光層160位在開口OP2a內。請參照圖5G及圖6G,在第一遮光層171上形成第二擋牆材料層142M。對第二擋牆材料層142M進行曝光顯影製程,以形成擋牆結構140的第二擋牆142,如圖5H及圖6H所示,其中第二擋牆142具有沿著方向Z重疊於發光元件120的正向出光面120es1的開口OP1。An exposure and development process is performed on the first light-shielding material layer 171M to form the first light-shielding layer 171, as shown in Figures 5F and 6F. After the development process, the first light-shielding layer 171 has an opening OP2a, and the light-transmitting layer 160 is positioned within the opening OP2a. Referring to Figures 5G and 6G, a second barrier material layer 142M is formed on the first light-shielding layer 171. An exposure and development process is performed on the second barrier material layer 142M to form the second barrier 142 of the barrier structure 140, as shown in Figures 5H and 6H. The second barrier 142 has an opening OP1 that overlaps with the front light-emitting surface 120es1 of the light-emitting element 120 along the direction Z.

請參照圖5I及圖6I,在第二擋牆142完成後,形成散射層165,以填滿第二擋牆142的開口OP1。接著,在散射層165上形成第二遮光材料層172M,並且對第二遮光材料層172M進行曝光顯影製程,以形成第二遮光層172,如圖5J及圖6J所示。在顯影製程後,第二遮光層172具有開口OP2b。Referring to Figures 5I and 6I , after the second barrier 142 is completed, a scattering layer 165 is formed to fill the opening OP1 of the second barrier 142. Next, a second light-shielding material layer 172M is formed on the scattering layer 165 and subjected to an exposure and development process to form a second light-shielding layer 172, as shown in Figures 5J and 6J . After the development process, the second light-shielding layer 172 has an opening OP2b.

特別說明的是,在基板表面100s的法線方向(例如方向Z)上,第一遮光層171的開口OP2a與第二遮光層172的開口OP2b的重疊部分可定義出圖2A中遮光結構170的開口OP2。接著,在第二遮光層172上形成封裝層180,以覆蓋散射層165與第二遮光層172,如圖3A及圖3B所示。至此便完成本實施例的顯示裝置10的製作。Specifically, in the normal direction (e.g., direction Z) of the substrate surface 100s, the overlapping portion of the opening OP2a of the first light-shielding layer 171 and the opening OP2b of the second light-shielding layer 172 defines the opening OP2 of the light-shielding structure 170 in FIG2A . Subsequently, an encapsulation layer 180 is formed on the second light-shielding layer 172 to cover the scattering layer 165 and the second light-shielding layer 172, as shown in FIG3A and FIG3B . This completes the fabrication of the display device 10 of this embodiment.

以下將列舉另一些實施例以詳細說明本發明,其中相同的構件將標示相同的符號,並且省略相同技術內容的說明,省略部分請參考前述實施例,以下不再贅述。The following will list some other embodiments to illustrate the present invention in detail, wherein the same components will be marked with the same symbols, and the description of the same technical content will be omitted. For the omitted parts, please refer to the above embodiments and will not be repeated below.

圖7是依照本發明的第二實施例的顯示裝置的剖視示意圖。請參照圖7,相較於圖3A的顯示裝置10,本實施例的顯示裝置10A還進一步設有色轉換層168。舉例來說,在本實施例中,色轉換層168可設置在擋牆結構140的開口OP1內,且位在散射層165與透光層160之間,但不以此為限。在一變形實施例中,散射層165可位在色轉換層168與透光層160之間。透過色轉換層168的設置,可增加發光元件120的選用彈性,並且提升顯示裝置10A的色彩表現。FIG7 is a schematic cross-sectional view of a display device according to a second embodiment of the present invention. Referring to FIG7 , compared to the display device 10 of FIG3A , the display device 10A of this embodiment further includes a color conversion layer 168. For example, in this embodiment, the color conversion layer 168 may be disposed within the opening OP1 of the baffle structure 140 and between the scattering layer 165 and the light-transmitting layer 160, but this is not limiting. In a variant embodiment, the scattering layer 165 may be disposed between the color conversion layer 168 and the light-transmitting layer 160. The provision of the color conversion layer 168 increases the flexibility of selecting the light-emitting element 120 and enhances the color performance of the display device 10A.

圖8是依照本發明的第三實施例的顯示裝置的剖視示意圖。請參照圖8,相較於圖3A的顯示裝置10,本實施例的顯示裝置10B還進一步設有濾光層190。在本實施例中,濾光層190可設置在遮光結構170的開口OP2內。透過濾光層190的設置,可進一步提升顯示裝置10B的色彩表現。Figure 8 is a schematic cross-sectional view of a display device according to a third embodiment of the present invention. Referring to Figure 8 , compared to the display device 10 shown in Figure 3A , the display device 10B of this embodiment further includes a light filter layer 190. In this embodiment, light filter layer 190 can be disposed within opening OP2 of the light-shielding structure 170. The provision of light filter layer 190 further enhances the color rendering of the display device 10B.

圖9是依照本發明的第四實施例的顯示裝置的剖視示意圖。請參照圖9,相較於圖3A的顯示裝置10,本實施例的顯示裝置10C還進一步設有色轉換層168與濾光層190。在本實施例中,濾光層190可設置在遮光結構170的開口OP2內,色轉換層168可設置在擋牆結構140的開口OP1內,且位在散射層165與透光層160之間,但不以此為限。透過濾光層190與色轉換層168的設置,可進一步提升顯示裝置10C的色彩表現。另外,色轉換層168的設置還可增加發光元件120的選用彈性。Figure 9 is a schematic cross-sectional view of a display device according to a fourth embodiment of the present invention. Referring to Figure 9 , compared to the display device 10 shown in Figure 3A , the display device 10C of this embodiment further includes a color conversion layer 168 and a light filter layer 190. In this embodiment, the light filter layer 190 can be disposed within the opening OP2 of the light shielding structure 170, and the color conversion layer 168 can be disposed within the opening OP1 of the baffle structure 140, and between the scattering layer 165 and the light-transmitting layer 160, but this is not limiting. The provision of the light filter layer 190 and the color conversion layer 168 further enhances the color performance of the display device 10C. In addition, the provision of the color conversion layer 168 can also increase the flexibility of the light-emitting element 120.

圖10是依照本發明的第五實施例的顯示裝置的剖視示意圖。圖11是依照本發明的第六實施例的顯示裝置的剖視示意圖。圖12是依照本發明的第七實施例的顯示裝置的剖視示意圖。Fig. 10 is a schematic cross-sectional view of a display device according to a fifth embodiment of the present invention. Fig. 11 is a schematic cross-sectional view of a display device according to a sixth embodiment of the present invention. Fig. 12 is a schematic cross-sectional view of a display device according to a seventh embodiment of the present invention.

請參照圖10,相較於圖3A的顯示裝置10,本實施例的顯示裝置10D還進一步設有透鏡結構195。透鏡結構195可設置在遮光結構170的開口OP2內,且為封裝層180所覆蓋。舉例來說,在本實施例中,透鏡結構195可以是具有準直、集光以及正視角輝度高增益等特性的菲涅爾透鏡(Fresnel lens)。Referring to FIG. 10 , compared to the display device 10 in FIG. 3A , the display device 10D of this embodiment further includes a lens structure 195. Lens structure 195 can be disposed within opening OP2 of the light-shielding structure 170 and covered by the encapsulation layer 180. For example, in this embodiment, lens structure 195 can be a Fresnel lens with collimating, light-collecting, and high gain at normal viewing angles.

然而,本發明不限於此。在圖11的顯示裝置10E中,透鏡結構195A可以是透鏡陣列。舉例來說,透鏡陣列包括多個微透鏡,且這些微透鏡可沿著方向X與方向Y排成多列與多行,但不以此為限。在圖11的另一變形實施例中,透鏡結構可包括多個微柱狀透鏡,且這些微柱狀透鏡沿著方向X排列並延伸在方向Y上。在圖12的顯示裝置10F中,透鏡結構195B可以是具有平頂的單一透鏡。However, the present invention is not limited thereto. In the display device 10E of FIG11 , the lens structure 195A may be a lens array. For example, the lens array includes a plurality of microlenses, and these microlenses may be arranged in multiple rows and columns along directions X and Y, but the present invention is not limited thereto. In another modified embodiment of FIG11 , the lens structure may include a plurality of micro-columnar lenses, and these micro-columnar lenses may be arranged along direction X and extend in direction Y. In the display device 10F of FIG12 , the lens structure 195B may be a single lens with a flat top.

需說明的是,圖10至圖12中的透鏡結構僅為示範性地說明之用,本發明並不以圖式揭示內容為限制。在其他實施例中,透鏡結構的構型與分布當可根據顯示裝置的實際出光需求而調整。It should be noted that the lens structures in Figures 10 to 12 are for exemplary purposes only, and the present invention is not limited to the contents disclosed in the figures. In other embodiments, the configuration and distribution of the lens structure can be adjusted according to the actual light output requirements of the display device.

綜上所述,在本發明的一實施例的顯示裝置中,設置在基板表面上的發光元件具有定義出光面且延伸方向彼此相交的第一邊緣與第二邊緣,且第一邊緣的長度大於第二邊緣的長度。圍繞發光元件設置的擋牆結構具有分別正對發光元件的第一邊緣與第二邊緣設置的第一部分與第二部分。由於擋牆結構的第二部分的第二頂面高於發光元件的出光面,發光元件的出光效率能獲得有效地提升。另一方面,藉由讓擋牆結構的第一部分的第一頂面低於發光元件的出光面,可顯著改善顯示裝置因發光元件接合至基板時的位置偏移所造成的大視角色偏。In summary, in a display device according to one embodiment of the present invention, a light-emitting element disposed on a surface of a substrate has a first edge and a second edge defining a light-emitting surface and extending in directions intersecting with each other, and the length of the first edge is greater than the length of the second edge. A baffle structure disposed around the light-emitting element has a first portion and a second portion disposed opposite the first edge and the second edge of the light-emitting element, respectively. Because the second top surface of the second portion of the baffle structure is higher than the light-emitting surface of the light-emitting element, the light-emitting efficiency of the light-emitting element can be effectively improved. On the other hand, by making the first top surface of the first portion of the baffle structure lower than the light-emitting surface of the light-emitting element, the large viewing angle deviation of the display device caused by the positional offset when the light-emitting element is bonded to the substrate can be significantly improved.

10、10A、10B、10C、10D、10E、10F:顯示裝置 100:基板 100s:基板表面 105:接合墊 110:畫素定義層 115:鈍化層 120、121、122、123:發光元件 120e1:第一邊緣 120e2:第二邊緣 120e3:第三邊緣 120e4:第四邊緣 120es1:正向出光面 120es2:側向出光面 140:擋牆結構 140p1:第一部分 140p2:第二部分 140ts1:第一頂面 140ts2:第二頂面 141:第一擋牆 141M:第一擋牆材料層 142:第二擋牆 142M:第二擋牆材料層 160:透光層 160M:透光材料層 165:散射層 168:色轉換層 170:遮光結構 171:第一遮光層 171M:第一遮光材料層 172:第二遮光層 172M:第二遮光材料層 171e1、171e2、172e1、172e2:遮光邊緣 180:封裝層 190:濾光層 195、195A、195B:透鏡結構 d1~d4:距離 E1:第一電極 E2:第二電極 H1、H2:高度 L1~L4:長度 LEL:發光層 OP1、OP2、OP2a、OP2b:開口 PA:畫素區 SCL1:第一型半導體層 SCL2:第二型半導體層 TA:透光區 X、Y、Z:方向 A-A’、B-B’:剖線10, 10A, 10B, 10C, 10D, 10E, 10F: Display device 100: Substrate 100s: Substrate surface 105: Bonding pad 110: Pixel definition layer 115: Passivation layer 120, 121, 122, 123: Light-emitting element 120e1: First edge 120e2: Second edge 120e3: Third edge 120e4: Fourth edge 120es1: Front light-emitting surface 120es2: Side light-emitting surface 140: Baffle structure 140p1: First portion 140p2: Second portion 140ts1: First top surface 140ts2: Second top surface 141: First baffle 141M: First baffle material layer 142: Second baffle 142M: Second baffle material layer 160: Transparent layer 160M: Transparent material layer 165: Scattering layer 168: Color conversion layer 170: Light-shielding structure 171: First light-shielding layer 171M: First light-shielding material layer 172: Second light-shielding layer 172M: Second light-shielding material layer 171e1, 171e2, 172e1, 172e2: Light-shielding edges 180: Encapsulation layer 190: Filter layer 195, 195A, 195B: Lens structure d1-d4: Distance E1: First electrode E2: Second electrode H1, H2: Height L1-L4: Length LEL: Light-emitting layer OP1, OP2, OP2a, OP2b: Openings PA: Pixel area SCL1: First type semiconductor layer SCL2: Second type semiconductor layer TA: Transparent area X, Y, Z: Directions A-A', B-B': Section lines

圖1是依照本發明的第一實施例的顯示裝置的正視示意圖。 圖2A及圖2B是圖1的顯示裝置的局部區域的放大示意圖。 圖3A及圖3B是圖2A的顯示裝置的剖視示意圖。 圖4是圖2A的顯示裝置的局部區域的放大示意圖。 圖5A至圖5J及圖6A至圖6J是圖3A及圖3B的顯示裝置的製造流程的剖視示意圖。 圖7是依照本發明的第二實施例的顯示裝置的剖視示意圖。 圖8是依照本發明的第三實施例的顯示裝置的剖視示意圖。 圖9是依照本發明的第四實施例的顯示裝置的剖視示意圖。 圖10是依照本發明的第五實施例的顯示裝置的剖視示意圖。 圖11是依照本發明的第六實施例的顯示裝置的剖視示意圖。 圖12是依照本發明的第七實施例的顯示裝置的剖視示意圖。 Figure 1 is a schematic front view of a display device according to a first embodiment of the present invention. Figures 2A and 2B are enlarged schematic views of a portion of the display device of Figure 1. Figures 3A and 3B are schematic cross-sectional views of the display device of Figure 2A. Figure 4 is an enlarged schematic view of a portion of the display device of Figure 2A. Figures 5A to 5J and 6A to 6J are schematic cross-sectional views illustrating the manufacturing process of the display device of Figures 3A and 3B. Figure 7 is a schematic cross-sectional view of a display device according to a second embodiment of the present invention. Figure 8 is a schematic cross-sectional view of a display device according to a third embodiment of the present invention. Figure 9 is a schematic cross-sectional view of a display device according to a fourth embodiment of the present invention. Figure 10 is a schematic cross-sectional view of a display device according to a fifth embodiment of the present invention. Figure 11 is a schematic cross-sectional view of a display device according to a sixth embodiment of the present invention. Figure 12 is a schematic cross-sectional view of a display device according to a seventh embodiment of the present invention.

10:顯示裝置 10: Display device

100:基板 100:Substrate

100s:基板表面 100s:Substrate surface

105:接合墊 105:Joint pad

110:畫素定義層 110: Pixel Definition Layer

115:鈍化層 115: Passivation layer

120:發光元件 120: Light-emitting element

120e2:第二邊緣 120e2: Second Edge

120e4:第四邊緣 120e4: The Fourth Edge

120es1:正向出光面 120es1: Forward light-emitting surface

120es2:側向出光面 120es2: Side light-emitting surface

140:擋牆結構 140: retaining wall structure

140p2:第二部分 140p2: Part 2

140ts2:第二頂面 140ts2: Second top

141:第一擋牆 141: The First Barrier

142:第二擋牆 142: Second barrier

160:透光層 160: Translucent layer

165:散射層 165: Scattering layer

170:遮光結構 170: Shading structure

172:第二遮光層 172: Second light-shielding layer

172e1、172e2:遮光邊緣 172e1, 172e2: Shading edge

180:封裝層 180: Packaging layer

E1:第一電極 E1: First electrode

E2:第二電極 E2: Second electrode

H2:高度 H2: Height

LEL:發光層 LEL: Luminescent layer

OP1:開口 OP1: Opening

SCL1:第一型半導體層 SCL1: Type I semiconductor layer

SCL2:第二型半導體層 SCL2: Type II semiconductor layer

X、Y、Z:方向 X, Y, Z: Direction

A-A’:剖線 A-A’: section line

Claims (12)

一種顯示裝置,包括: 一基板; 一發光元件,接合在該基板上,該發光元件具有背對該基板的一正向出光面以及定義該正向出光面的一第一邊緣與一第二邊緣,該第一邊緣與該第二邊緣分別在一第一方向與一第二方向上延伸,該第一邊緣沿著該第一方向的長度大於該第二邊緣沿著該第二方向的長度,該第一方向與該第二方向平行於該基板的一基板表面且彼此相交;以及 一擋牆結構,設置在該基板上,且圍繞該發光元件設置,該擋牆結構具有一第一部分與一第二部分,該第一部分沿著該第二方向正對該發光元件的該第一邊緣設置,該第二部分沿著該第一方向正對該發光元件的該第二邊緣設置,其中該擋牆結構的該第一部分與該第二部分分別具有背對該基板的一第一頂面與一第二頂面,在該基板表面的法線方向上,該第一頂面低於該發光元件的該正向出光面,且該第二頂面高於該發光元件的該正向出光面。 A display device comprises: a substrate; a light-emitting element bonded to the substrate, the light-emitting element having a front light-emitting surface facing away from the substrate and a first edge and a second edge defining the front light-emitting surface, the first edge and the second edge extending in a first direction and a second direction, respectively, the length of the first edge along the first direction being greater than the length of the second edge along the second direction, the first direction and the second direction being parallel to a substrate surface of the substrate and intersecting with each other; and A baffle structure is disposed on the substrate and surrounds the light-emitting element. The baffle structure has a first portion and a second portion. The first portion is disposed opposite the first edge of the light-emitting element along the second direction, and the second portion is disposed opposite the second edge of the light-emitting element along the first direction. The first portion and the second portion of the baffle structure respectively have a first top surface and a second top surface facing away from the substrate. In a direction normal to the substrate surface, the first top surface is lower than the front light-emitting surface of the light-emitting element, and the second top surface is higher than the front light-emitting surface of the light-emitting element. 如請求項1所述的顯示裝置,還包括: 一遮光結構,設置在該擋牆結構上,其中該擋牆結構還具有重疊於該發光元件的一第一開口,該遮光結構具有重疊於該第一開口的一第二開口。 The display device of claim 1 further comprises: A light-shielding structure disposed on the baffle structure, wherein the baffle structure further comprises a first opening overlapping the light-emitting element, and the light-shielding structure further comprises a second opening overlapping the first opening. 如請求項2所述的顯示裝置,其中該遮光結構包括: 一第一遮光層,設置在該擋牆結構的該第一部分上,且重疊於該第一部分;以及 一第二遮光層,設置在該擋牆結構的該第二部分上,且重疊於該第二部分,其中該第一遮光層與該第二遮光層分別具有相對於該基板表面的一第一高度與一第二高度,且該第二高度大於該第一高度。 The display device of claim 2, wherein the light-shielding structure comprises: a first light-shielding layer disposed on and overlapping the first portion of the baffle structure; and a second light-shielding layer disposed on and overlapping the second portion of the baffle structure, wherein the first light-shielding layer and the second light-shielding layer respectively have a first height and a second height relative to the substrate surface, and the second height is greater than the first height. 如請求項2所述的顯示裝置,其中該遮光結構還具有定義該第二開口的一第一遮光邊緣與一第二遮光邊緣,該第一遮光邊緣與該第二遮光邊緣分別在該第一方向與該第二方向上延伸,該第一遮光邊緣與該第一邊緣沿著該第二方向的距離大於該第二遮光邊緣與該第二邊緣沿著該第一方向的距離。A display device as described in claim 2, wherein the shading structure further has a first shading edge and a second shading edge defining the second opening, the first shading edge and the second shading edge extend in the first direction and the second direction respectively, and the distance between the first shading edge and the first edge along the second direction is greater than the distance between the second shading edge and the second edge along the first direction. 如請求項2所述的顯示裝置,其中該發光元件沿著該第一方向與該第二方向分別具有一第一長度與一第二長度,該遮光結構的該第二開口沿著該第一方向與該第二方向分別具有一第三長度與一第四長度,該第一長度大於該第二長度,該第三長度大於該第一長度,該第四長度大於該第二長度,該第四長度與該第二長度的差值大於該第三長度與該第一長度的差值。A display device as described in claim 2, wherein the light-emitting element has a first length and a second length along the first direction and the second direction, respectively, and the second opening of the shading structure has a third length and a fourth length along the first direction and the second direction, respectively, the first length is greater than the second length, the third length is greater than the first length, the fourth length is greater than the second length, and the difference between the fourth length and the second length is greater than the difference between the third length and the first length. 如請求項1所述的顯示裝置,其中該擋牆結構包括: 一第一擋牆,圍繞該發光元件設置,且覆蓋該發光元件的一側向出光面;以及 一第二擋牆,設置在該第一擋牆上,且位在該發光元件沿著該第一方向的相對兩側,其中該第一擋牆設有該第一頂面,該第二擋牆設有該第二頂面,且在該基板表面的法線方向上,該第二擋牆不重疊於該第一頂面與該正向出光面。 The display device of claim 1, wherein the baffle structure comprises: a first baffle disposed around the light-emitting element and covering a lateral light-emitting surface of the light-emitting element; and a second baffle disposed on the first baffle and located on opposite sides of the light-emitting element along the first direction, wherein the first baffle has the first top surface, the second baffle has the second top surface, and in a direction normal to the substrate surface, the second baffle does not overlap with the first top surface and the forward light-emitting surface. 如請求項6所述的顯示裝置,還包括: 一透光層,設置在該第一擋牆與該第二擋牆之間。 The display device of claim 6 further comprises: A light-transmitting layer disposed between the first baffle and the second baffle. 如請求項1所述的顯示裝置,其中該發光元件包括依序堆疊在該基板表面上的一第一型半導體層、一發光層與一第二型半導體層,該第二型半導體層背對該基板的一側設有該正向出光面,且在該基板表面的法線方向上,該擋牆結構的該第一部分的該第一頂面高於該發光層。A display device as described in claim 1, wherein the light-emitting element includes a first type semiconductor layer, a light-emitting layer and a second type semiconductor layer stacked in sequence on the surface of the substrate, the second type semiconductor layer is provided with the forward light-emitting surface on the side opposite to the substrate, and in the normal direction of the substrate surface, the first top surface of the first part of the baffle structure is higher than the light-emitting layer. 如請求項1所述的顯示裝置,其中該擋牆結構還具有重疊於該發光元件的一第一開口,該第一開口重疊於該發光元件的該正向出光面,且該第一開口內設有一散射層。The display device as described in claim 1, wherein the baffle structure further has a first opening overlapping the light-emitting element, the first opening overlaps the forward light-emitting surface of the light-emitting element, and a scattering layer is disposed in the first opening. 如請求項9所述的顯示裝置,其中該第一開口內還設有一色轉換層。The display device as described in claim 9, wherein a color conversion layer is further provided in the first opening. 如請求項9所述的顯示裝置,還包括: 一遮光結構,設置在該擋牆結構上,且具有重疊於該第一開口的一第二開口,其中該第二開口內設有一濾光層。 The display device of claim 9 further comprises: A light-shielding structure disposed on the baffle structure and having a second opening overlapping the first opening, wherein a light filter layer is disposed within the second opening. 如請求項9所述的顯示裝置,還包括: 一遮光結構,設置在該擋牆結構上,且具有重疊於該第一開口的一第二開口,其中該第二開口內設有一透鏡結構。 The display device of claim 9 further comprises: A light-shielding structure disposed on the baffle structure and having a second opening overlapping the first opening, wherein a lens structure is disposed within the second opening.
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TWI733350B (en) * 2020-02-27 2021-07-11 友達光電股份有限公司 Array reflection structure of direct-type backlight module
TWI834091B (en) * 2020-12-17 2024-03-01 南韓商樂金顯示科技股份有限公司 Light emitting display apparatus and multi-screen display apparatus including the same
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