TWI894040B - Antenna - Google Patents
AntennaInfo
- Publication number
- TWI894040B TWI894040B TW113143748A TW113143748A TWI894040B TW I894040 B TWI894040 B TW I894040B TW 113143748 A TW113143748 A TW 113143748A TW 113143748 A TW113143748 A TW 113143748A TW I894040 B TWI894040 B TW I894040B
- Authority
- TW
- Taiwan
- Prior art keywords
- signal
- antenna
- redistribution
- antenna device
- layer
- Prior art date
Links
Landscapes
- Details Of Aerials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
Description
本發明是有關於一種天線裝置。The present invention relates to an antenna device.
現代生活中,無線通訊技術的應用已經無處不在。在重要城市或公共空間中,提供無線區域網路已經成為必要的設施,許多人甚至在家中也建立了自己的無線網絡。隨著無線通訊技術的進步,許多廠商致力於開發效能更好的天線裝置。目前,天線裝置內部具有複雜的電路設計,涉及各種不同的訊號。如果訊號線之間的距離過近,訊號之間容易互相干擾,進而影響天線裝置的效能。Wireless communication technology is ubiquitous in modern life. Providing wireless local area networks (LANs) has become a necessity in major cities and public spaces, and many people even set up their own wireless networks at home. With advancements in wireless communication technology, many manufacturers are committed to developing higher-performance antennas. Currently, antennas contain complex circuit designs, handling a wide variety of signals. If signal lines are too close together, signals can easily interfere with each other, impacting antenna performance.
本發明的至少一實施例提供一種天線裝置,包括透明基板、薄膜電路結構、重佈線結構、多個晶片以及多個天線電極。薄膜電路結構位於透明基板的第一面之上,且包括第一薄膜導電層。重佈線結構位於薄膜電路結構上,且包括第一重佈線層。第一薄膜導電層的厚度小於第一重佈線層的厚度。多個晶片接合至重佈線結構。多個天線電極位於透明基板相反於第一面的第二面之上。各天線電極分別重疊於晶片中的對應的一者。At least one embodiment of the present invention provides an antenna device comprising a transparent substrate, a thin-film circuit structure, a redistribution structure, a plurality of chips, and a plurality of antenna electrodes. The thin-film circuit structure is located on a first surface of the transparent substrate and includes a first thin-film conductive layer. The redistribution structure is located on the thin-film circuit structure and includes a first redistribution wiring layer. The thickness of the first thin-film conductive layer is less than the thickness of the first redistribution wiring layer. The plurality of chips are bonded to the redistribution wiring structure. The plurality of antenna electrodes are located on a second surface of the transparent substrate, opposite the first surface. Each antenna electrode overlaps a corresponding one of the chips.
圖1是依照本發明的一實施例的一種天線裝置1A的上視示意圖。請參考圖1,天線裝置1A包括透明基板100以及設置於透明基板100上的多個天線單元10A。天線單元10A例如排成陣列。在本實施例中,至少一印刷電路板510、520通過至少一軟性電路板610、620、630而電性連接至天線單元10A的陣列。每個天線單元10A包括天線電極110以及電性連接至天線電極110的晶片410A。Figure 1 is a schematic top view of an antenna device 1A according to an embodiment of the present invention. Referring to Figure 1 , antenna device 1A includes a transparent substrate 100 and a plurality of antenna units 10A disposed on transparent substrate 100. Antenna units 10A are arranged, for example, in an array. In this embodiment, at least one printed circuit board 510, 520 is electrically connected to the array of antenna units 10A via at least one flexible circuit board 610, 620, 630. Each antenna unit 10A includes an antenna electrode 110 and a chip 410A electrically connected to the antenna electrode 110.
在本實施例中,天線裝置1A包括印刷電路板510、520以及軟性電路板610、620、630。印刷電路板510、520通過軟性電路板610、620、630而電性連接至透明基板100之上的重佈線結構(圖1省略會示),並進一步電性連接至天線單元10A的陣列。在本實施例中,每個印刷電路板510、520上設有多個晶片。在一些實施例中,印刷電路板510、520上包括調製器/解調器(modulator/demodulator,MODEM)、現場可程式化邏輯閘陣列(Field-Programmable Gate Array,FPGA)、數位類比轉換器(Digital to analog converter,DAC)、類比數位轉換器(Analog to digital converter,ADC)、電源模組(Power Module)、全球定位系統(global positioning system,GPS)、重力計(G-sensor)等,上述元件可以設置於一個或多個晶片中。In this embodiment, antenna device 1A includes printed circuit boards 510, 520 and flexible circuit boards 610, 620, and 630. Printed circuit boards 510, 520 are electrically connected to a redistribution structure (not shown in FIG1 ) on transparent substrate 100 via flexible circuit boards 610, 620, and 630, and further electrically connected to the array of antenna units 10A. In this embodiment, each printed circuit board 510, 520 is provided with multiple chips. In some embodiments, printed circuit boards 510 and 520 include a modulator/demodulator (MODEM), a field-programmable gate array (FPGA), a digital-to-analog converter (DAC), an analog-to-digital converter (ADC), a power module, a global positioning system (GPS), a gravity sensor, and the like. These components may be integrated into one or more chips.
在一些實施例中,調製器/解調器為用於將數位訊號編碼(encoder)後進行調變(modulation)到類比訊號上進行傳輸,並解調(demodulation)收到的類比訊號再解碼(decoder)轉為數位訊號的裝置。In some embodiments, a modulator/demodulator is a device that encodes a digital signal (encoder) and modulates it onto an analog signal for transmission, and demodulates the received analog signal (decoder) and then decodes it back into a digital signal.
印刷電路板510、520通過軟性電路板610、620、630而電性連接至天線單元10A的陣列。The printed circuit boards 510 and 520 are electrically connected to the array of antenna units 10A through flexible circuit boards 610, 620, and 630.
晶片410A包括波束成形器積體電路(Beamformer Integrated Circuit,BFIC)或其他主動/被動元件。晶片410A可用進行發射波束成形處理(TX)及/或接收波束成形處理(RX)。Chip 410A includes a beamformer integrated circuit (BFIC) or other active/passive components. Chip 410A can perform transmit beamforming processing (TX) and/or receive beamforming processing (RX).
在本實施例中,天線裝置1A還包括上/下變頻器(Up/Down Converter,UDC)430。上/下變頻器430可以為連接至透明基板100之上的重佈線結構的晶片或是直接製作於透明基板100之上的電路。印刷電路板510通過軟性電路板620以及透明基板100之上的重佈線結構而電性連接至上/下變頻器430,且上/下變頻器430通過透明基板100之上的重佈線結構而電性連接至天線單元10A的晶片410A。舉例來說,印刷電路板510提供的頻率相對低的訊號(例如頻率低於10GHz(例如2GHz以下)的中頻(Intermediate Frequency,IF)或低頻訊號),訊號經過軟性電路板620傳輸至上/下變頻器430,再由上/下變頻器430將訊號頻率提升為高頻的射頻訊號(頻率例如為10~300GHz)。在本實施例中,由於上/下變頻器430是設置於透明基板100之上而非設置於印刷電路板510上,不需要在透明基板100之上設置用於傳輸射頻訊號的SMA高頻電纜接頭(SMA Connector)。In this embodiment, the antenna device 1A further includes an up/down converter (UDC) 430. The UDC 430 can be a chip connected to a redistribution structure on the transparent substrate 100 or a circuit fabricated directly on the transparent substrate 100. The printed circuit board 510 is electrically connected to the UDC 430 via a flexible circuit board 620 and the redistribution structure on the transparent substrate 100. The UDC 430 is also electrically connected to the chip 410A of the antenna unit 10A via the redistribution structure on the transparent substrate 100. For example, a relatively low-frequency signal (e.g., an intermediate frequency (IF) or low-frequency signal below 10 GHz (e.g., below 2 GHz)) provided by printed circuit board 510 is transmitted via flexible circuit board 620 to up/down converter 430, which then up/down converter 430 upconverts the signal to a high-frequency radio frequency (RF) signal (e.g., between 10 and 300 GHz). In this embodiment, because up/down converter 430 is disposed on transparent substrate 100 rather than printed circuit board 510, an SMA high-frequency cable connector (SMA connector) for transmitting RF signals is not required on transparent substrate 100.
天線裝置1A包括透明區TR以及非透明區NTR。在一些實施例中,印刷電路板510、520設置於非透明區NTR中,天線單元10A的天線電極110以及晶片410A設置於透明區TR中。在一些實施例中,上/下變頻器430也設置於透明區TR中。在一些實施例中,天線裝置1A例如可應用於運輸工具的窗戶(例如汽車的天窗)、建築物的窗戶等。Antenna device 1A includes a transparent region TR and a non-transparent region NTR. In some embodiments, printed circuit boards 510 and 520 are located in the non-transparent region NTR, while antenna electrode 110 and chip 410A of antenna unit 10A are located in the transparent region TR. In some embodiments, up/down converter 430 is also located in the transparent region TR. In some embodiments, antenna device 1A can be used in vehicle windows (e.g., car sunroofs) or building windows.
圖2是依照本發明的一實施例的一種天線裝置1A的剖面示意圖。透明基板100具有第一面S1以及相反於第一面S1的第二面S2。在一些實施例中,透明基板100的材料包括玻璃、石英、有機聚合物或是其他可適用的材料。在一些實施例中,透明基板100的厚度為0.15 mm至1.1 mm。舉例來說,透明基板100的厚度為0.5 mm、0.7 mm或1.1 mm。Figure 2 is a schematic cross-sectional view of an antenna device 1A according to an embodiment of the present invention. A transparent substrate 100 has a first surface S1 and a second surface S2 opposite to first surface S1. In some embodiments, the transparent substrate 100 is made of glass, quartz, an organic polymer, or other suitable materials. In some embodiments, the transparent substrate 100 has a thickness of 0.15 mm to 1.1 mm. For example, the transparent substrate 100 has a thickness of 0.5 mm, 0.7 mm, or 1.1 mm.
天線電極110設置於透明基板100的第一面S1上。The antenna electrode 110 is disposed on the first surface S1 of the transparent substrate 100 .
接地電極132設置於透明基板110的第二面S2上。在本實施例中,接地電極132具有至少一個開口132h,且每個開口132h中具有一個接合結構134。接合結構134通過基板導電通孔120而電性連接至天線電極110。因此,天線電極110的天線訊號可以通過接合結構134以及基板導電通孔120傳輸。在其他實施例中,可以省略基板導電通孔120,且天線電極110的天線訊號利用輻射的方式而在天線電極110與重疊於開口132h的驅動電極(未繪出)之間傳輸。A ground electrode 132 is disposed on the second surface S2 of the transparent substrate 110. In this embodiment, the ground electrode 132 has at least one opening 132h, and each opening 132h contains a bonding structure 134. The bonding structure 134 is electrically connected to the antenna electrode 110 via the substrate conductive via 120. Therefore, antenna signals from the antenna electrode 110 can be transmitted through the bonding structure 134 and the substrate conductive via 120. In other embodiments, the substrate conductive via 120 can be omitted, and the antenna signals from the antenna electrode 110 can be transmitted by radiation between the antenna electrode 110 and a driving electrode (not shown) overlapping the opening 132h.
在一些實施例中,接地電極132的寬度大於或等於天線電極110的寬度。In some embodiments, the width of the ground electrode 132 is greater than or equal to the width of the antenna electrode 110 .
在一些實施例中,天線電極110、接地電極132、接合結構134以及基板導電通孔120的材料包括銅(Cu)、鋁(Al)、金(Au)、銀(Ag)、鈦(Ti)、鎳(Ni)、鎢(W)、導電氧化物(例如銦錫氧化物、銦鋅氧化物等)或其他合適的材料或上述材料的組合。In some embodiments, the materials of the antenna electrode 110 , the ground electrode 132 , the bonding structure 134 , and the substrate conductive via 120 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), nickel (Ni), tungsten (W), conductive oxides (e.g., indium tin oxide, indium zinc oxide, etc.), or other suitable materials or combinations thereof.
在一些實施例中,形成基板導電通孔120的方式包括玻璃改質製程以及填充導電材料的製程。舉例來說,玻璃改質製程包括先以雷射在透明基板100上形成貫穿孔,接著利用濕蝕刻製程擴大前述貫穿孔,以形成從第一面S1延伸至第二面S2的通孔。最後,於通孔中填入導電材料以形成基板導電通孔120。In some embodiments, the substrate conductive via 120 is formed by a glass modification process and a conductive material filling process. For example, the glass modification process involves first forming a through-hole in the transparent substrate 100 using a laser. This through-hole is then enlarged using a wet etching process to form a via extending from the first surface S1 to the second surface S2. Finally, the conductive material is filled into the through-hole to form the substrate conductive via 120.
在一些實施例中,形成天線電極110、接地電極132、接合結構134以及基板導電通孔120的方法包括先通過濺鍍、化學鍍或其他合適的製程在透明基板100的第一面S1上以及第二面S2上以及透明基板100的通孔中形成晶種層。接著,利用電鍍製程在晶種層上形成金屬層。可通過微影製程及蝕刻製程來圖案化所成的晶種層及金屬層,以獲得天線電極110、接地電極132以及接合結構134。在其他實施例中,晶種層可以被省略。In some embodiments, the method for forming the antenna electrode 110, the ground electrode 132, the bonding structure 134, and the substrate conductive via 120 includes first forming a seed layer on the first and second surfaces S1, S2, and in the vias of the transparent substrate 100 via sputtering, chemical plating, or other suitable processes. Subsequently, a metal layer is formed on the seed layer via electroplating. The resulting seed layer and metal layer can be patterned via lithography and etching processes to obtain the antenna electrode 110, the ground electrode 132, and the bonding structure 134. In other embodiments, the seed layer can be omitted.
緩衝層140位於透明基板100、接地電極132以及接合結構134上。在一些實施例中,緩衝層140包括透明材料,例如有機材料(例如聚醯亞胺、聚對苯二甲酸乙二酯、環氧樹脂等)或無機材料(例如氮化矽、氧化矽等)或上述材料的組合。在一些實施例中,由於天線電極110、接地電極132以及接合結構134的厚度為2微米至10微米。為了達到平坦化的功效,緩衝層140的厚度較佳為2微米至15微米,且緩衝層140的厚度不小於接地電極132的厚度。舉例來說,緩衝層140的厚度為接地電極132的厚度的1.3倍。為了達到此厚度以得到平坦化的功效,緩衝層140較佳選用有機材料。The buffer layer 140 is disposed on the transparent substrate 100, the ground electrode 132, and the bonding structure 134. In some embodiments, the buffer layer 140 comprises a transparent material, such as an organic material (e.g., polyimide, polyethylene terephthalate, epoxy resin, etc.), an inorganic material (e.g., silicon nitride, silicon oxide, etc.), or a combination thereof. In some embodiments, since the thickness of the antenna electrode 110, the ground electrode 132, and the bonding structure 134 is 2 to 10 microns, the thickness of the buffer layer 140 is preferably 2 to 15 microns to achieve a planarization effect, and the thickness of the buffer layer 140 is not less than the thickness of the ground electrode 132. For example, the thickness of the buffer layer 140 is 1.3 times the thickness of the ground electrode 132. In order to achieve this thickness and obtain a planarization effect, the buffer layer 140 is preferably made of an organic material.
薄膜電路結構200位於接地電極132以及接合結構134之上。在本實施例中,薄膜電路結構200位於緩衝層140上。在一些實施例中,薄膜電路結構200整體的厚度小於10微米。The thin film circuit structure 200 is located on the ground electrode 132 and the bonding structure 134. In this embodiment, the thin film circuit structure 200 is located on the buffer layer 140. In some embodiments, the entire thin film circuit structure 200 has a thickness of less than 10 microns.
薄膜電路結構200包括依序沉積的第一薄膜導電層210、第一介電層220、第二薄膜導電層230以及第二介電層240。在一些實施例中,第二薄膜導電層230的至少一個接觸部PH1穿過第一介電層220,並電性連接至第一薄膜導電層210。在一些實施例中,薄膜電路結構200中還可以包括更多的導電層與介電層,本發明並不限制薄膜電路結構200中的導電層與介電層的數量。The thin-film circuit structure 200 includes a first thin-film conductive layer 210, a first dielectric layer 220, a second thin-film conductive layer 230, and a second dielectric layer 240, which are deposited in sequence. In some embodiments, at least one contact portion PH1 of the second thin-film conductive layer 230 passes through the first dielectric layer 220 and is electrically connected to the first thin-film conductive layer 210. In some embodiments, the thin-film circuit structure 200 may include more conductive layers and dielectric layers, and the present invention is not limited to the number of conductive layers and dielectric layers in the thin-film circuit structure 200.
在一些實施例中,第一薄膜導電層210與第二薄膜導電層230的材料包括銅(Cu)、鋁(Al)、金(Au)、銀(Ag)、鈦(Ti)、鎳(Ni)、鎢(W)、導電氧化物(例如銦錫氧化物、銦鋅氧化物等)或其他合適的材料或上述材料的組合。第一薄膜導電層210與第二薄膜導電層230各自具有單層結構或多層結構。舉例來說,第一薄膜導電層210與第二薄膜導電層230各自具有鉬/鋁/鉬疊層結構、鈦/鋁/鈦疊層結構或其他導電材料構成的疊層結構。In some embodiments, the materials of the first thin-film conductive layer 210 and the second thin-film conductive layer 230 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), nickel (Ni), tungsten (W), conductive oxides (such as indium tin oxide, indium zinc oxide, etc.), or other suitable materials or combinations thereof. The first thin-film conductive layer 210 and the second thin-film conductive layer 230 each have a single-layer structure or a multi-layer structure. For example, the first thin-film conductive layer 210 and the second thin-film conductive layer 230 each have a molybdenum/aluminum/molybdenum stacked structure, a titanium/aluminum/titanium stacked structure, or a stacked structure composed of other conductive materials.
在一些實施例中,第一介電層220與第二介電層240的材料包括有機聚合物(例如聚醯亞胺、聚對苯二甲酸乙二酯等)或無機材料(例如氧化矽、氮化矽、氮氧化矽、氧化鋁、氧化鋯、氧化鉿或其他合適的材料或上述材料的組合)。In some embodiments, the material of the first dielectric layer 220 and the second dielectric layer 240 includes an organic polymer (such as polyimide, polyethylene terephthalate, etc.) or an inorganic material (such as silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, zirconium oxide, einsteinium oxide or other suitable materials or combinations thereof).
在一些實施例中,在形成第二薄膜導電層230之前,利用微影製程及蝕刻製程於第一介電層220中形成暴露出第一薄膜導電層210的開口,接著沉積第二薄膜導電層230於開口中,以形成第二薄膜導電層230的接觸部PH1,以使第二薄膜導電層230接觸第一薄膜導電層210。In some embodiments, before forming the second thin-film conductive layer 230, a lithography process and an etching process are used to form an opening in the first dielectric layer 220 to expose the first thin-film conductive layer 210. Then, the second thin-film conductive layer 230 is deposited in the opening to form a contact portion PH1 of the second thin-film conductive layer 230 so that the second thin-film conductive layer 230 contacts the first thin-film conductive layer 210.
重佈線結構300位於薄膜電路結構200上。在本實施例中,重佈線結構300位於第二介電層240上。在一些實施例中,重佈線結構300整體的厚度為14微米至150微米。The redistribution structure 300 is located on the thin film circuit structure 200. In this embodiment, the redistribution structure 300 is located on the second dielectric layer 240. In some embodiments, the overall thickness of the redistribution structure 300 is 14 microns to 150 microns.
重佈線結構300包括依序沉積的第一重佈線層310、絕緣層320以及第二重佈線層330。在一些實施例中,第一重佈線層310的至少一個接觸部PH2穿過第二介電層240,並電性連接至第二薄膜導電層230。在一些實施例中,第一重佈線層310及/或第二重佈線層330通過導電通孔LH1而電性連接至接地電極132以及接合結構134。導電通孔LH1穿過薄膜電路結構200以及緩衝層140,且可選地穿過絕緣層320。在一些實施例中,第二重佈線層330通過絕緣層320中的至少一個導電通孔LH2而電性連接至第一重佈線層310。重佈線結構300中還可以包括更多的導電層與絕緣層,本發明並不限制重佈線結構300中的導電層與絕緣層的數量。The redistribution structure 300 includes a first redistribution layer 310, an insulating layer 320, and a second redistribution layer 330, which are deposited in sequence. In some embodiments, at least one contact portion PH2 of the first redistribution layer 310 passes through the second dielectric layer 240 and is electrically connected to the second thin-film conductive layer 230. In some embodiments, the first redistribution layer 310 and/or the second redistribution layer 330 are electrically connected to the ground electrode 132 and the bonding structure 134 via a conductive via LH1. The conductive via LH1 passes through the thin-film circuit structure 200 and the buffer layer 140, and optionally through the insulating layer 320. In some embodiments, the second redistribution layer 330 is electrically connected to the first redistribution layer 310 through at least one conductive via LH2 in the insulating layer 320. The redistribution structure 300 may further include more conductive layers and insulating layers, and the present invention does not limit the number of conductive layers and insulating layers in the redistribution structure 300.
在一些實施例中,第一重佈線層310以及第二重佈線層330的材料包括銅(Cu)、鋁(Al)、金(Au)、銀(Ag)、鈦(Ti)、鎳(Ni)、鎢(W)、導電氧化物(例如銦錫氧化物、銦鋅氧化物等)或其他合適的材料或上述材料的組合。在一些實施例中,第一重佈線層310以及第二重佈線層330各自包括晶種層及形成於其上的金屬層。晶種層例如是由濺鍍、化學鍍或其他合適的方法形成,而金屬層則是由電鍍的方法形成。在一些實施例中,晶種層可以被省略。In some embodiments, the materials of the first and second redistribution wiring layers 310 and 330 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), nickel (Ni), tungsten (W), conductive oxides (e.g., indium tin oxide, indium zinc oxide, etc.), or other suitable materials or combinations thereof. In some embodiments, the first and second redistribution wiring layers 310 and 330 each include a seed layer and a metal layer formed thereon. The seed layer is formed, for example, by sputtering, chemical plating, or other suitable methods, while the metal layer is formed by electroplating. In some embodiments, the seed layer may be omitted.
在一些實施例中,絕緣層320的材料包括有機材料(例如聚醯亞胺、聚對苯二甲酸乙二酯、環氧樹脂等)或無機材料(例如氮化矽、氧化矽等)或上述材料的組合。在一些實施例中,形成絕緣層320的方法包括將乾膜貼在第一重佈線層310上或將液態的有機材料(例如液態聚醯亞胺(Polyimide,PI)材料)塗佈在第一重佈線層310上。In some embodiments, the insulating layer 320 is made of an organic material (e.g., polyimide, polyethylene terephthalate, epoxy resin, etc.), an inorganic material (e.g., silicon nitride, silicon oxide, etc.), or a combination thereof. In some embodiments, the insulating layer 320 is formed by applying a dry film to the first RDL 310 or applying a liquid organic material (e.g., liquid polyimide (PI)) to the first RDL 310.
在一些實施例中,絕緣層320具有高穿透率以及低介電損耗(dissipation factor,Df)。舉例來說,絕緣層320針對波長為400 nm至800nm的光線的穿透率大於或等於90%。在一些實施例中,絕緣層320的介電常數(dielectric constant,Dk)低於4,且介電損耗低於0.004。In some embodiments, the insulating layer 320 has high transmittance and low dissipation factor (Df). For example, the transmittance of the insulating layer 320 for light with a wavelength of 400 nm to 800 nm is greater than or equal to 90%. In some embodiments, the insulating layer 320 has a dielectric constant (Dk) less than 4 and a dissipation factor less than 0.004.
在一些實施例中,重佈線結構300的第一重佈線層310被設置為用於傳輸接地訊號,而第二重佈線層330被設置為用於傳輸晶片電源訊號以及射頻(radio frequency,RF)訊號(例如射頻輸入訊號(RF_in))。在一些實施例中,薄膜電路結構200的第一薄膜導電層210以及第二薄膜導電層230包含數位訊號線以及類比訊號線,數位訊號線以及類比訊號線分別被設置為用於傳輸用於控制晶片410A或薄膜電路結構200中的電路的數位訊號以及類比訊號。由於薄膜電路結構200中所傳輸的數位訊號以及類比訊號的操作頻率較低,因此即使薄膜電路結構200中的第一薄膜導電層210、第一介電層220、第二薄膜導電層230以及第二介電層240的膜厚較薄也不至於使訊號出現明顯的損耗。相較之下,由於重佈線結構300被用於傳輸高頻率的RF訊號,因此重佈線結構300中的絕緣層320需要有較厚的厚度。因此,絕緣層320的厚度大於第一介電層220以及第二介電層240各自的厚度。在一些實施例中,絕緣層320的厚度為10微米至60微米。在一些實施例中,第一介電層220以及第二介電層240各自的厚度為0.03微米至1微米,例如0.5微米至1微米或0.7微米至1微米。在一些實施例中,第一薄膜導電層210以及第二薄膜導電層230各自的厚度小於第一重佈線層310以及第二重佈線層330各自的厚度。在一些實施例中,第一薄膜導電層210以及第二薄膜導電層230各自的厚度為0.01微米至0.7微米,例如0.01微米至0.3微米或0.01微米至0.05微米。在一些實施例中,第一重佈線層310以及第二重佈線層330各自的厚度為2微米至10微米。In some embodiments, the first RRI layer 310 of the RRI structure 300 is configured to transmit a ground signal, while the second RRI layer 330 is configured to transmit chip power signals and radio frequency (RF) signals (e.g., RF input signal (RF_in)). In some embodiments, the first and second thin film conductive layers 210 and 230 of the thin film circuit structure 200 include digital signal lines and analog signal lines, respectively, configured to transmit digital signals and analog signals used to control the chip 410A or circuits within the thin film circuit structure 200. Because the operating frequency of the digital and analog signals transmitted in the thin-film circuit structure 200 is relatively low, even if the film thicknesses of the first thin-film conductive layer 210, the first dielectric layer 220, the second thin-film conductive layer 230, and the second dielectric layer 240 in the thin-film circuit structure 200 are relatively thin, there will be no significant signal loss. In contrast, because the redistribution structure 300 is used to transmit high-frequency RF signals, the insulating layer 320 in the redistribution structure 300 needs to be thicker. Therefore, the thickness of the insulating layer 320 is greater than the thickness of the first dielectric layer 220 and the second dielectric layer 240. In some embodiments, the thickness of the insulating layer 320 is 10 microns to 60 microns. In some embodiments, the thickness of each of the first dielectric layer 220 and the second dielectric layer 240 is 0.03 microns to 1 micron, for example, 0.5 microns to 1 micron or 0.7 microns to 1 micron. In some embodiments, the thickness of each of the first thin-film conductive layer 210 and the second thin-film conductive layer 230 is less than the thickness of each of the first redistribution wiring layer 310 and the second redistribution wiring layer 330. In some embodiments, the thickness of each of the first thin-film conductive layer 210 and the second thin-film conductive layer 230 is 0.01 microns to 0.7 microns, for example, 0.01 microns to 0.3 microns or 0.01 microns to 0.05 microns. In some embodiments, the thickness of each of the first redistribution wiring layer 310 and the second redistribution wiring layer 330 is 2 microns to 10 microns.
在一些實施例中,在形成第一重佈線層310之前,利用微影製程及蝕刻製程於第二介電層240中形成暴露出第二薄膜導電層230的開口,接著沉積第一重佈線層310於開口中,以形成第一重佈線層310的接觸部PH2,以使第一重佈線層310接觸第二薄膜導電層230。In some embodiments, before forming the first redistribution wiring layer 310, an opening exposing the second thin-film conductive layer 230 is formed in the second dielectric layer 240 using a lithography process and an etching process. Then, the first redistribution wiring layer 310 is deposited in the opening to form a contact portion PH2 of the first redistribution wiring layer 310 so that the first redistribution wiring layer 310 contacts the second thin-film conductive layer 230.
在一些實施例中,在形成第一重佈線層310之前及/或形成第二重佈線層330之前,進行雷射鑽孔製程。舉例來說,進行雷射鑽孔製程形成雷射孔,接著於雷射孔中填入第一重佈線層310或第二重佈線層330,以形成導電通孔LH1或導電通孔LH2。在本實施例中,導電通孔LH2穿過絕緣層320,且第二重佈線層330通過導電通孔LH2接觸第一重佈線層310。導電通孔LH1穿過絕緣層320、第二介電層240、第一介電層220以及緩衝層140,且第二重佈線層330通過導電通孔LH1接觸接地電極132以及接合結構134。在本實施例中,由於接觸部PH1、PH2的形成方式、導電通孔LH1、LH2的形成方式以及基板導電通孔120側壁的形成方式不同,因此三者具有不同的側壁傾斜角度。In some embodiments, a laser drilling process is performed before forming the first redistribution wiring layer 310 and/or before forming the second redistribution wiring layer 330. For example, a laser drilling process is performed to form a laser hole, which is then filled with the first redistribution wiring layer 310 or the second redistribution wiring layer 330 to form a conductive via LH1 or a conductive via LH2. In this embodiment, the conductive via LH2 passes through the insulating layer 320, and the second redistribution wiring layer 330 contacts the first redistribution wiring layer 310 through the conductive via LH2. Conductive via LH1 passes through the insulating layer 320, the second dielectric layer 240, the first dielectric layer 220, and the buffer layer 140. The second redistribution layer 330 contacts the ground electrode 132 and the bonding structure 134 through the conductive via LH1. In this embodiment, due to the different formation methods of the contacts PH1 and PH2, the conductive vias LH1 and LH2, and the sidewalls of the substrate conductive via 120, the three have different sidewall tilt angles.
晶片410A以及上/下變頻器430接合至第二重佈線層330。各天線電極110分別重疊於晶片410A中的對應的一者。在一些實施例中,天線電極110的寬度大於或等於晶片410A的寬度。Chip 410A and up/down converter 430 are bonded to second redistribution layer 330. Each antenna electrode 110 overlaps a corresponding one of the chips 410A. In some embodiments, the width of antenna electrode 110 is greater than or equal to the width of chip 410A.
在一些實施例中,晶片410A以及上/下變頻器430分別透過導電連接結構412以及432而接合至第二重佈線層330。導電連接結構412以及432例如為焊料、導電膠或其他合適的結構。在一些實施例中,可對第二重佈線層330的表面進行無電鍍鎳浸金(Electroless Nickel Immersion Gold,ENIG)、浸銀電鍍(Immersion silver plating)等處理,以提高晶片接合製程的良率。在一些實施例中,在晶片接合製程前,可以在第二重佈線層330上形成有機保焊膜(Organic Solderability Preservative,OSP)等有機材料,其可以保護金屬接墊不因與空氣接觸而生鏽(例如硫化或氧化),以提高晶片接合製程的良率。In some embodiments, the chip 410A and the up/down converter 430 are bonded to the second redistribution layer 330 via conductive connection structures 412 and 432, respectively. The conductive connection structures 412 and 432 may be, for example, solder, conductive adhesive, or other suitable structures. In some embodiments, the surface of the second redistribution layer 330 may be treated with processes such as electroless nickel immersion gold (ENIG) or immersion silver plating to improve the yield of the chip bonding process. In some embodiments, before the chip bonding process, an organic material such as an organic solderability preservative (OSP) can be formed on the second redistribution layer 330 to protect the metal pads from rusting (e.g., sulfurization or oxidation) due to contact with air, thereby improving the yield of the chip bonding process.
於晶片410A與第二重佈線層330之間以及上/下變頻器430與第二重佈線層330之間形成底部填充材420。在一些實施例中,底部填充材420可以包括熱介面材料(Thermal interface material,TIM),以利晶片410A以及上/下變頻器430散熱。舉例來說,底部填充材420的導熱係數大於0.3 W/m K。An underfill material 420 is formed between the chip 410A and the second redistribution layer 330, and between the up/down converter 430 and the second redistribution layer 330. In some embodiments, the underfill material 420 may include a thermal interface material (TIM) to facilitate heat dissipation from the chip 410A and the up/down converter 430. For example, the thermal conductivity of the underfill material 420 is greater than 0.3 W/mK.
在本實施例中,相較於單個晶片對應多個天線單元,每個晶片410A對應一個天線單元10A可以使熱源分散,藉此降低天線裝置1A的溫度。因此,可以不用額外於晶片410A上加裝散熱結構。在一些實施例中,在晶片410A的輸出功率為60 mW與70 mW時,晶片410A的表面溫度分別為低於攝氏82度以及低於攝氏85.5度。In this embodiment, compared to a single chip corresponding to multiple antenna units, each chip 410A corresponds to one antenna unit 10A, distributing heat and thereby reducing the temperature of the antenna device 1A. Therefore, there is no need to install a separate heat sink on the chip 410A. In some embodiments, when the output power of the chip 410A is 60 mW and 70 mW, the surface temperature of the chip 410A is below 82 degrees Celsius and below 85.5 degrees Celsius, respectively.
通過省略散熱結構,可以在維持透光性的同時,大幅減少天線裝置1A的重量與厚度。使天線裝置1A可以更輕易的與車載天窗結合。By omitting the heat dissipation structure, the weight and thickness of the antenna device 1A can be significantly reduced while maintaining light transmittance, making it easier for the antenna device 1A to be integrated into a vehicle sunroof.
在一些實施例中,晶片410A包括波束成形器積體電路(BFIC)或其他主動/被動元件。在一些實施例中,波束成形器積體電路中包含可變增益放大器(Variable Gain Amplifier,VGA)、相移器(Phase shifter,PS)、訊號控制及記憶體電路、功率放大器(Power Amplifier,PA)及/或低損耗放大器(Low Noise Amplifier,LNA)等。在一些實施例中,可以將包含主動元件的電路設置於薄膜電路結構200中,藉此減少晶片410A中所需設置的電路,因此,可以減小晶片410A的尺寸。舉例來說,波束成形器積體電路中的訊號控制及記憶體電路可設置於薄膜電路結構200中。在一些實施例中,通過使天線單元10A各自包含一個BFIC,可以減短BFIC與天線電極110之間的訊號路徑。若使一個BFIC提供訊號給多個天線電極110,將需要設置更長的訊號路徑,進而會減少天線裝置的光穿透區面積。換句話說,本實施例通過使天線單元10A各自包含一個晶片410A,可以提升天線裝置1A的光穿透區LT面積。In some embodiments, chip 410A includes a beamformer integrated circuit (BFIC) or other active/passive components. In some embodiments, the beamformer integrated circuit includes a variable gain amplifier (VGA), a phase shifter (PS), signal control and memory circuits, a power amplifier (PA), and/or a low noise amplifier (LNA). In some embodiments, the circuits containing the active components can be located within the thin-film circuit structure 200, thereby reducing the circuitry required within chip 410A and, therefore, the size of chip 410A. For example, the signal control and memory circuits within the beamformer integrated circuit can be located within the thin-film circuit structure 200. In some embodiments, by having each antenna unit 10A include a BFIC, the signal path between the BFIC and the antenna electrode 110 can be shortened. If a single BFIC provided signals to multiple antenna electrodes 110, a longer signal path would be required, which would reduce the light-transmitting area of the antenna device. In other words, by having each antenna unit 10A include a chip 410A, the light-transmitting area LT of the antenna device 1A can be increased.
印刷電路板510通過軟性電路板620而電性連接至重佈線結構300。舉例來說,軟性電路板620通過焊料、導電膠或其他合適的結構接合至第二重佈線層330的接墊P。上/下變頻器430電性連接至印刷電路板510以及晶片410A。上/下變頻器430可用於將來自印刷電路板510的頻率相對較低的訊號轉換成高頻的射頻訊號(RF signal),而高頻的射頻訊號進一步被傳輸至晶片410A進行處理。The printed circuit board 510 is electrically connected to the redistribution structure 300 via a flexible circuit board 620. For example, the flexible circuit board 620 is bonded to pads P of the second redistribution layer 330 using solder, conductive adhesive, or other suitable structures. The up/down converter 430 is electrically connected to the printed circuit board 510 and the chip 410A. The up/down converter 430 is used to convert the relatively low-frequency signal from the printed circuit board 510 into a high-frequency radio frequency (RF) signal. The high-frequency RF signal is then transmitted to the chip 410A for processing.
在一些實施例中,薄膜電路結構200以及重佈線結構300被配置成用於傳輸各種訊號。舉例來說,接地訊號(例如AGND、DGND、RF_GND等)、電源訊號(例如AVDD、DVDD等)、射頻訊號(RF signal)、射頻啟用訊號(RF_en)、參考電壓訊號(Vref)、偏壓調節訊號(Rbias)、電路控制訊號(例如CS、CLK、SDI、SDO、PDI等)、天線訊號(例如水平極化電場天線訊號(RF_out_H)、垂直極化電場天線訊號(RF_out_V)等)。在一些實施例中,電源訊號以及電路控制訊號中的至少一部分是由印刷電路板510所提供。In some embodiments, the thin-film circuit structure 200 and the redistribution structure 300 are configured to transmit various signals. For example, ground signals (e.g., AGND, DGND, RF_GND), power signals (e.g., AVDD, DVDD), radio frequency signals (RF), radio frequency enable signals (RF_en), reference voltage signals (Vref), bias adjustment signals (Rbias), circuit control signals (e.g., CS, CLK, SDI, SDO, PDI), and antenna signals (e.g., horizontal polarization electric field antenna signal (RF_out_H), vertical polarization electric field antenna signal (RF_out_V)). In some embodiments, at least a portion of the power and circuit control signals are provided by the printed circuit board 510.
在一些實施例中,各種訊號的用途描述以及主要傳輸層如表1所示。
表1
在一些實施例中,第一重佈線層310與第二重佈線層330中的至少一者包括一條或多條射頻訊號線334,射頻訊號線334被配置為將射頻訊號傳輸給晶片410A。舉例來說,每條射頻訊號線334被配置為通過串列饋入方式傳輸射頻訊號給排成一列的多個晶片410A(如圖4所示);或者,射頻訊號線334被配置為通過菊花鏈方式遞傳輸射頻訊號給排成一列的多個晶片410A(如圖5所示)。In some embodiments, at least one of the first and second RRL layers 310 and 330 includes one or more RF signal lines 334 configured to transmit RF signals to the chips 410A. For example, each RF signal line 334 is configured to transmit RF signals to the plurality of chips 410A arranged in a row via serial feed (as shown in FIG. 4 ); alternatively, the RF signal lines 334 are configured to transmit RF signals to the plurality of chips 410A arranged in a row via daisy chaining (as shown in FIG. 5 ).
在一些實施例中,第一薄膜導電層210與第二薄膜導電層230中的至少一者包括一條或多條用於傳輸低頻訊號的訊號線211、221。低頻訊號可以為類比訊號或數位訊號,且包括電源訊號(例如DVDD等)、射頻啟用訊號(RF_en)、參考電壓訊號(Vref)、偏壓調節訊號(Rbias)以及電路控制訊號(例如CS、CLK、SDI、SDO、PDI等)等。在一些實施例中,訊號線211、221也可以稱為類比訊號線及/或數位訊號線。射頻訊號線334的厚度大於訊號線211、221的厚度。In some embodiments, at least one of the first thin-film conductive layer 210 and the second thin-film conductive layer 230 includes one or more signal lines 211, 221 for transmitting low-frequency signals. Low-frequency signals can be analog or digital, and include power signals (e.g., DVDD), RF enable signals (RF_en), reference voltage signals (Vref), bias adjustment signals (Rbias), and circuit control signals (e.g., CS, CLK, SDI, SDO, PDI, etc.). In some embodiments, signal lines 211, 221 can also be referred to as analog signal lines and/or digital signal lines. The thickness of the RF signal line 334 is greater than that of the signal lines 211, 221.
在本文中,低頻訊號指的是操作頻率低於500MHz的訊號,而高頻訊號指的是操作頻率高於500MHz的訊號(例如10GHz至300GHz或10GHz至500GHz)。高頻訊號例如包括射頻訊號(RF signal)以及天線訊號(RF_out)。Herein, low-frequency signals refer to signals operating at frequencies below 500 MHz, while high-frequency signals refer to signals operating at frequencies above 500 MHz (e.g., 10 GHz to 300 GHz or 10 GHz to 500 GHz). High-frequency signals include, for example, radio frequency (RF) signals and antenna signals (RF_out).
圖3是依照本發明的一實施例的一種天線裝置1B的上視示意圖。在本實施例中,天線裝置1B包含陣列於透明基板100上的多個天線單元10A。圖3示出了天線單元10A中的晶片410A,並省略天線單元10A中的其他結構。須注意的是,在圖3中,一條線段可用於表示單一條訊號線或多條靠在一起的訊號線。Figure 3 is a top view schematically illustrating an antenna device 1B according to an embodiment of the present invention. In this embodiment, antenna device 1B includes multiple antenna units 10A arrayed on a transparent substrate 100. Figure 3 illustrates chip 410A within antenna unit 10A, omitting other structures within antenna unit 10A. Note that in Figure 3, a line segment can represent a single signal line or multiple closely spaced signal lines.
在一些實施例中,波長λ 0為天線單元10A所欲接收或發送之無線訊號在空氣中的波長。各天線單元10A的間距(Pitch)d約為λ 0的二分之一。天線單元10A的陣列的範圍可由兩條平行的線V1、V2以及另外兩條平行的線H1、H2所界定。平線H1、H2垂直於線V1、V2。 In some embodiments, wavelength λ 0 is the wavelength of the wireless signal in air that antenna unit 10A intends to receive or transmit. The pitch d between antenna units 10A is approximately half of λ 0. The range of the array of antenna units 10A can be defined by two parallel lines V1 and V2 and two other parallel lines H1 and H2. Lines H1 and H2 are perpendicular to lines V1 and V2.
請參考圖3,軟性電路板610、620、630分別接合至對應的接墊P,並用於將一個或多個印刷電路板(未繪出)提供的訊號傳輸至位於透明基板100之上的薄膜電路結構及/或重佈線結構中。在本實施例中,軟性電路板610、620位於透明基板100的一側,而軟性電路板630位於透明基板100的另一側,但本發明不以此為限。在其他實施例中,軟性電路板610、620、630位於透明基板100的同一側。Referring to Figure 3 , flexible circuit boards 610, 620, and 630 are each bonded to corresponding pads P and are used to transmit signals from one or more printed circuit boards (not shown) to thin-film circuit structures and/or redistribution structures located on transparent substrate 100. In this embodiment, flexible circuit boards 610 and 620 are located on one side of transparent substrate 100, while flexible circuit board 630 is located on the other side of transparent substrate 100, but the present invention is not limited to this. In other embodiments, flexible circuit boards 610, 620, and 630 are located on the same side of transparent substrate 100.
在一些實施例中,軟性電路板610用於將印刷電路板提供的數位訊號及/或電源訊號傳輸至天線單元10A的晶片410A。前述數位訊號及/或電源訊號例如藉由薄膜電路結構200傳輸(例如薄膜電路結構200中的數位訊號線及/或電源訊號線)。In some embodiments, flexible circuit board 610 is used to transmit digital signals and/or power signals provided by the printed circuit board to chip 410A of antenna unit 10A. The digital signals and/or power signals are transmitted, for example, via thin film circuit structure 200 (e.g., digital signal lines and/or power signal lines within thin film circuit structure 200).
軟性電路板620用於將印刷電路板提供的中頻(Intermediate Frequency,IF)或低頻訊號傳輸至重佈線結構以及上/下變頻器430,訊號經上/下變頻器430處理後轉換為射頻訊號(RF signal),並通過重佈線結構傳輸至天線單元10A的晶片410A。前述射頻訊號例如藉由重佈線結構300的第二重佈線層330傳輸(例如第二重佈線層330中的射頻訊號線)。The flexible circuit board 620 is used to transmit intermediate frequency (IF) or low frequency (LF) signals provided by the printed circuit board to the redistribution structure and up/down converter 430. After being processed by the up/down converter 430, the signals are converted into RF signals and transmitted through the redistribution structure to the chip 410A of the antenna unit 10A. The RF signals are transmitted, for example, via the second redistribution layer 330 of the redistribution structure 300 (e.g., the RF signal lines within the second redistribution layer 330).
在一些實施例中,軟性電路板610、620設置於線V1、V2之間,且線H1定義出天線單元10A的陣列靠近軟性電路板610、620的一側。在一些實施例中,射頻訊號線從上/下變頻器430至線H1做等阻抗設計(即從上/下變頻器430到線H1上的每一點都是等阻抗)。在一些實施例中,射頻訊號線從上/下變頻器430可選地經一個或多個功率分配器(未繪示)分配給不同的天線單元10A。In some embodiments, flexible circuit boards 610 and 620 are positioned between lines V1 and V2, and line H1 defines the side of the antenna element 10A array proximal to the flexible circuit boards 610 and 620. In some embodiments, the RF signal line from the up/down converter 430 to line H1 is designed with equal impedance (i.e., the impedance from the up/down converter 430 to every point on line H1 is equal). In some embodiments, the RF signal line from the up/down converter 430 is optionally distributed to different antenna elements 10A via one or more power dividers (not shown).
軟性電路板630用於將印刷電路板提供的電源訊號(例如AVDD)以及接地訊號(例如AGND)傳輸至天線單元10A的晶片410A。舉例來說,電源訊號AVDD藉由重佈線結構300的第二重佈線層330(例如第二重佈線層330中的電源訊號線)傳輸。接地訊號AGND藉由重佈線結構300的第一重佈線層310傳輸(例如第二重佈線層330中的接地訊號線)。The flexible circuit board 630 is used to transmit power signals (e.g., AVDD) and ground signals (e.g., AGND) provided by the printed circuit board to the chip 410A of the antenna unit 10A. For example, the power signal AVDD is transmitted via the second redistribution layer 330 of the redistribution structure 300 (e.g., the power signal lines within the second redistribution layer 330). The ground signal AGND is transmitted via the first redistribution layer 310 of the redistribution structure 300 (e.g., the ground signal lines within the second redistribution layer 330).
在一些實施例中,在天線單元10A的陣列中(即線H1與線H2之間的範圍內),上述電源訊號線、數位訊號線、射頻訊號線沿著水平方向延伸。In some embodiments, within the array of antenna units 10A (i.e., within the range between line H1 and line H2), the power signal lines, digital signal lines, and RF signal lines extend horizontally.
圖4是依照本發明的一些實施例的天線裝置的射頻訊號傳輸方式。圖5是依照本發明的一些實施例的另一些天線裝置的射頻訊號傳輸方式。在圖4的實施例中,每條射頻訊號線334被配置為通過串列饋入方式傳輸射頻訊號給排成一列的多個晶片410A。在圖5的實施例中,每條射頻訊號線334被配置為通過菊花鏈方式遞傳輸射頻訊號給排成一列的多個晶片410A。Figure 4 illustrates an RF signal transmission method for an antenna device according to some embodiments of the present invention. Figure 5 illustrates another RF signal transmission method for an antenna device according to some embodiments of the present invention. In the embodiment of Figure 4 , each RF signal line 334 is configured to transmit an RF signal to multiple chips 410A arranged in a row via serial feed. In the embodiment of Figure 5 , each RF signal line 334 is configured to transmit an RF signal to multiple chips 410A arranged in a row via daisy chaining.
請參考圖4與圖5,晶片410A例如為採用時分雙工(time division duplex,TDD)技術或頻分雙工(frequency division duplex,FDD)技術。4 and 5 , the chip 410A adopts, for example, time division duplex (TDD) technology or frequency division duplex (FDD) technology.
在晶片410A採用FDD技術時,發射波束成形處理TX與接收波束成形處理RX例如是通過不同的天線單元陣列來執行,其中一個天線單元陣列中的晶片410A執行射頻訊號的發射波束成形處理TX,另一個天線單元陣列中的晶片410A執行接收波束成形處理RX。When chip 410A employs FDD technology, transmit beamforming processing (TX) and receive beamforming processing (RX) are performed, for example, by different antenna arrays. Chip 410A in one antenna array performs transmit beamforming processing (TX) for radio frequency signals, while chip 410A in another antenna array performs receive beamforming processing (RX).
在晶片410A採用TDD技術時,在執行發射波束成形處理TX時,射頻訊號線334提供射頻訊號至晶片410A。在執行接收波束成形處理RX時,晶片410A提供射頻訊號至射頻訊號線334。在TDD技術中,同個天線單元陣列中的晶片410A在不同時間下執行發射波束成形處理TX與接收波束成形處理RX。When chip 410A utilizes TDD technology, when performing transmit beamforming (TX), RF signal line 334 provides an RF signal to chip 410A. When performing receive beamforming (RX), chip 410A provides an RF signal to RF signal line 334. In TDD technology, chips 410A in the same antenna element array perform transmit beamforming (TX) and receive beamforming (RX) at different times.
圖6是依照本發明的一些實施例的一種天線裝置1A的資料寫入/選擇示意圖。天線單元10A排列成N列以及M行構成的陣列。6 is a schematic diagram illustrating data writing/selection of an antenna device 1A according to some embodiments of the present invention. The antenna units 10A are arranged in an array consisting of N columns and M rows.
訊號線Data_1至訊號線Data_N分別電性連接至第一列天線單元10A至第N列天線單元10A(例如天線單元10A的晶片410A)。訊號線CLK_1至訊號線CLK_N分別電性連接至第一列天線單元10A至第N列天線單元10A(例如天線單元10A的晶片410A)。訊號線CS_1至訊號線CS_N分別電性連接至第一列天線單元10A至第N列天線單元10A(例如天線單元10A的晶片410A)。Signal lines Data_1 through Data_N are electrically connected to antenna units 10A in the first through Nth columns, respectively (e.g., chip 410A in antenna units 10A). Signal lines CLK_1 through CLK_N are electrically connected to antenna units 10A in the first through Nth columns, respectively (e.g., chip 410A in antenna units 10A). Signal lines CS_1 through CS_N are electrically connected to antenna units 10A in the first through Nth columns, respectively (e.g., chip 410A in antenna units 10A).
在一些實施例中,訊號線Data_1至訊號線Data_N用於傳輸電路控制訊號SDI以及SDO中的至少一者。訊號線CLK_1至訊號線CLK_N用於傳輸電路控制訊號CLK。訊號線CS_1至訊號線CS_N用於傳輸電路控制訊號CS。In some embodiments, signal lines Data_1 to Data_N are used to transmit at least one of circuit control signals SDI and SDO, signal lines CLK_1 to CLK_N are used to transmit circuit control signal CLK, and signal lines CS_1 to CS_N are used to transmit circuit control signal CS.
在本實施例中,依照步驟1、步驟2、步驟3……至步驟M,依序對M行天線單元10A進行資料寫入/選擇,這可以通過訊號線CLK_1至訊號線CLK_N所傳輸的電路控制訊號CLK(即時脈訊號)而達成。舉例來說,利用訊號線CLK_1至訊號線CLK_N同時開啟第一行天線單元10A使訊號線Data_1至訊號線Data_N傳輸訊號至第一行天線單元10A後,訊號線CLK_1至訊號線CLK_N接著傳遞訊號至第二行天線單元10A,並開啟第二行天線單元10A使訊號線Data_1至訊號線Data_N傳輸訊號至第二行天線單元10A。In this embodiment, data is sequentially written/selected to M rows of antenna units 10A, following steps 1, 2, 3, ..., through M. This is achieved via the circuit control signal CLK (a real-time clock signal) transmitted via signal lines CLK_1 through CLK_N. For example, signal lines CLK_1 through CLK_N simultaneously activate the first row of antenna units 10A, causing signal lines Data_1 through Data_N to transmit signals to the first row of antenna units 10A. Signal lines CLK_1 through CLK_N then transmit signals to the second row of antenna units 10A, activating the second row of antenna units 10A so that signal lines Data_1 through Data_N transmit signals to the second row of antenna units 10A.
在執行步驟M之後,利用另一條訊號線CLK_M+1(未繪出)提供的時脈訊號以及射頻啟用訊號線(未繪出)提供的射頻啟用訊號RF_en來啟動天線陣列,並產生輻射。After executing step M, the antenna array is activated using a clock signal provided by another signal line CLK_M+1 (not shown) and an RF enable signal RF_en provided by an RF enable signal line (not shown) to generate radiation.
在一些實施例中,電路控制訊號以串列饋入的方式傳給所有晶片410A。傳給晶片410A的電路控制訊號例如包含SDI、SDO、CLK、CS等。In some embodiments, circuit control signals are transmitted to all chips 410A in a serial feed manner. The circuit control signals transmitted to chip 410A include, for example, SDI, SDO, CLK, CS, etc.
在一些實施例中,電路控制訊號PDI、射頻輸入訊號RF_in、射頻啟用訊號RF_en、電源訊號AVDD、電源訊號DVDD、接地訊號AGND以及接地訊號RF_GND則利用並列的方式輸入給所有晶片410A。In some embodiments, the circuit control signal PDI, the RF input signal RF_in, the RF enable signal RF_en, the power signal AVDD, the power signal DVDD, the ground signal AGND, and the ground signal RF_GND are input to all chips 410A in parallel.
圖7是依照本發明的一實施例的一種天線裝置1A的功能區塊圖。在本實施例中,每個天線單元10A包含一個晶片410A,晶片410A中包含BFIC。Figure 7 is a functional block diagram of an antenna device 1A according to an embodiment of the present invention. In this embodiment, each antenna unit 10A includes a chip 410A, which includes a BFIC.
在本實施例中,接地訊號(例如AGND、RF_GND等)、電源訊號(例如AVDD、DVDD等)、射頻訊號(RF signal)、射頻啟用訊號(RF_en)、參考電壓訊號(Vref)以及多種電路控制訊號(例如CS、CLK、SDI、SDO、PDI等)連接至晶片410A。In this embodiment, ground signals (e.g., AGND, RF_GND, etc.), power signals (e.g., AVDD, DVDD, etc.), RF signals (RF signal), RF enable signal (RF_en), reference voltage signal (Vref), and various circuit control signals (e.g., CS, CLK, SDI, SDO, PDI, etc.) are connected to chip 410A.
在本實施例中,電路控制訊號提供至晶片410A中的訊號控制電路模組SCC及記憶體電路模組MC。訊號控制電路模組SCC提供訊號給可變增益放大器與相移器模組VGPS。In this embodiment, circuit control signals are provided to the signal control circuit module SCC and the memory circuit module MC in the chip 410A. The signal control circuit module SCC provides signals to the variable gain amplifier and phase shifter module VGPS.
在本實施例中,射頻訊號RF signal經功率分配器(Power Divider)處理後提供給可變增益放大器與相移器模組VGPS。可變增益放大器與相移器模組VGPS提供訊號給功率放大器及/或低損耗放大器模組PALNA。In this embodiment, the RF signal is processed by a power divider and then provided to a variable gain amplifier and phase shifter module VGPS. The variable gain amplifier and phase shifter module VGPS provides a signal to a power amplifier and/or a low loss amplifier module PALNA.
功率放大器及/或低損耗放大器模組PALNA提供第一天線訊號(例如水平極化電場天線訊號(RF_out_H))以及第二天線訊號(例如垂直極化電場天線訊號(RF_out_V))給天線電極110。The power amplifier and/or low-loss amplifier module PALNA provides a first antenna signal (eg, a horizontally polarized electric field antenna signal (RF_out_H)) and a second antenna signal (eg, a vertically polarized electric field antenna signal (RF_out_V)) to the antenna electrode 110 .
在一些實施例中,可額外於天線單元10A中設置其他被動元件PD,例如電感、電容及/或電阻。被動元件PD連接至晶片410A的功率放大器及/或低損耗放大器模組PALNA。In some embodiments, other passive devices PD, such as inductors, capacitors, and/or resistors, may be additionally provided in the antenna unit 10A. The passive device PD is connected to the power amplifier and/or the low-loss amplifier module PALNA of the chip 410A.
圖8是依照本發明的一實施例的一種天線裝置1C的上視示意圖。在此必須說明的是,圖8的實施例沿用圖1的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。Figure 8 is a top view schematic diagram of an antenna device 1C according to an embodiment of the present invention. It should be noted that the embodiment of Figure 8 retains the same component numbers and some details as the embodiment of Figure 1 , with identical or similar components being designated by the same or similar reference numbers, and descriptions of identical technical details being omitted. For descriptions of omitted sections, please refer to the aforementioned embodiments and will not be repeated here.
請參考圖8,天線裝置1C包括透明基板100以及設置於透明基板100上的多個天線單元10C。天線單元10C例如排成陣列。在本實施例中,至少一印刷電路板510、520通過至少一軟性電路板610、620、630而電性連接至天線單元10C的陣列。每個天線單元10C包括天線電極110以及電性連接至天線電極110的晶片410C。在本實施例中,閘極驅動電路DR串聯多個天線單元10C。舉例來說,閘極驅動電路DR提供閘極訊號至天線單元10C中的訊號控制及記憶體電路,而訊號控制及記憶體電路提供訊號給晶片410C。Referring to FIG. 8 , an antenna device 1C includes a transparent substrate 100 and a plurality of antenna units 10C disposed on the transparent substrate 100. The antenna units 10C are arranged, for example, in an array. In this embodiment, at least one printed circuit board 510, 520 is electrically connected to the array of antenna units 10C via at least one flexible circuit board 610, 620, 630. Each antenna unit 10C includes an antenna electrode 110 and a chip 410C electrically connected to the antenna electrode 110. In this embodiment, a gate drive circuit DR connects the plurality of antenna units 10C in series. For example, the gate drive circuit DR provides a gate signal to the signal control and memory circuit in the antenna unit 10C, and the signal control and memory circuit provides a signal to the chip 410C.
圖9是依照本發明的一實施例的一種天線裝置1C的上視示意圖。請參考圖9,天線裝置1C包括透明基板100以及設置於透明基板100上的多個天線單元10C。天線單元10C例如排成陣列,且天線單元10C之間具有光穿透區LT。FIG9 is a top view of an antenna device 1C according to an embodiment of the present invention. Referring to FIG9 , the antenna device 1C includes a transparent substrate 100 and a plurality of antenna units 10C disposed on the transparent substrate 100. The antenna units 10C are arranged in an array, for example, with light-transmitting regions LT defined between the antenna units 10C.
薄膜電路結構200C中包含多個薄膜電晶體T。舉例來說,在本實施例中,第一介電層220與緩衝層140之間還包括閘介電層250。閘介電層250與緩衝層140之間還包括多個半導體層SM。The thin film circuit structure 200C includes a plurality of thin film transistors T. For example, in this embodiment, a gate dielectric layer 250 is further included between the first dielectric layer 220 and the buffer layer 140. A plurality of semiconductor layers SM are further included between the gate dielectric layer 250 and the buffer layer 140.
第一薄膜導電層210位於閘介電層250上,且包括重疊於半導體層SM的閘極G。第一介電層220覆蓋閘極G。第二薄膜導電層230位於第一介電層220上,且包括多個源極/汲極SD。在本實施例中,每個薄膜電晶體T包括對應的半導體層SM、對應的閘極G以及對應的源極/汲極SD。在本實施例中,薄膜電晶體T為頂閘極型薄膜電晶體,但本發明不以此為限。在其他實施例中,薄膜電晶體T為底閘極型薄膜電晶體、雙閘極型薄膜電晶體或其他類型的薄膜電晶體。The first thin-film conductive layer 210 is located on the gate dielectric layer 250 and includes a gate G overlapping the semiconductor layer SM. The first dielectric layer 220 covers the gate G. The second thin-film conductive layer 230 is located on the first dielectric layer 220 and includes a plurality of source/drain electrodes SD. In this embodiment, each thin-film transistor T includes a corresponding semiconductor layer SM, a corresponding gate G, and a corresponding source/drain electrode SD. In this embodiment, the thin-film transistor T is a top-gate thin-film transistor, but the present invention is not limited thereto. In other embodiments, the thin-film transistor T is a bottom-gate thin-film transistor, a double-gate thin-film transistor, or another type of thin-film transistor.
薄膜電晶體T電性連接至晶片410C以及薄膜電路結構200C中的訊號線221(例如為數位訊號線)。訊號線221的厚度小於射頻訊號線334的厚度。訊號線221例如用於傳輸前面實施例所描述的任一種數位訊號。The thin film transistor T is electrically connected to the chip 410C and the signal line 221 (e.g., a digital signal line) in the thin film circuit structure 200C. The thickness of the signal line 221 is less than the thickness of the RF signal line 334. The signal line 221 is used to transmit any of the digital signals described in the previous embodiments.
圖10是依照本發明的一實施例的一種天線裝置1D的上視示意圖。在此必須說明的是,圖10的實施例沿用圖3的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。Figure 10 is a top view schematic diagram of an antenna device 1D according to an embodiment of the present invention. It should be noted that the embodiment of Figure 10 uses the same component numbers and some details as the embodiment of Figure 3 , with identical or similar reference numbers used to represent identical or similar components, and descriptions of identical technical details omitted. For descriptions of omitted parts, please refer to the aforementioned embodiments and will not be repeated here.
在本實施例中,天線裝置1D包含陣列於透明基板100上的多個天線單元10C。圖10示出了天線單元10C中的晶片410C,並省略天線單元10C中的其他結構。須注意的是,在圖10中,一條線段可用於表示單一條訊號線或多條靠在一起的訊號線。In this embodiment, antenna device 1D includes a plurality of antenna units 10C arrayed on a transparent substrate 100. FIG10 illustrates chip 410C within antenna unit 10C, while omitting other structures within antenna unit 10C. Note that in FIG10 , a line segment can represent a single signal line or multiple closely spaced signal lines.
在一些實施例中,軟性電路板610用於將印刷電路板提供的數位訊號及/或電源訊號傳輸至天線單元10C的晶片410C。前述數位訊號及/或電源訊號例如藉由薄膜電路結構200傳輸(例如薄膜電路結構200中的數位訊號線及/或電源訊號線)。除此之外,軟性電路板610還電性連接至閘極驅動電路DR,並通過閘極驅動電路DR以及多條訊號線CLK’(或稱時脈訊號線或閘極訊號線)提供時脈訊號(或稱閘極訊號)至天線單元10C。In some embodiments, the flexible circuit board 610 is used to transmit digital signals and/or power signals provided by the printed circuit board to the chip 410C of the antenna unit 10C. These digital signals and/or power signals are transmitted, for example, via the thin-film circuit structure 200 (e.g., digital signal lines and/or power signal lines within the thin-film circuit structure 200). Furthermore, the flexible circuit board 610 is electrically connected to the gate driver circuit DR and provides a clock signal (or gate signal) to the antenna unit 10C via the gate driver circuit DR and a plurality of signal lines CLK' (or clock signal lines or gate signal lines).
在一些實施例中,射頻訊號線從上/下變頻器430可選地經一個或多個功率分配器SW分配給不同列天線單元10C。射頻訊號線從功率分配器SW至線H1做等阻抗設計(即從功率分配器SW到線H1上的每一點都是等阻抗)。In some embodiments, the RF signal line is optionally distributed to different columns of antenna units 10C via one or more power dividers SW from the up/down converter 430. The RF signal line is designed to have equal impedance from the power divider SW to line H1 (i.e., the impedance from the power divider SW to each point on line H1 is equal).
圖11是依照本發明的一些實施例的一種天線裝置1C的資料寫入/選擇示意圖。天線單元10C排列成N列以及M行構成的陣列。FIG11 is a schematic diagram of data writing/selection of an antenna device 10C according to some embodiments of the present invention. The antenna units 10C are arranged in an array consisting of N columns and M rows.
訊號線Data_1至訊號線Data_N分別電性連接至第一列天線單元10C至第N列天線單元10C(例如天線單元10C的訊號控制及記憶體電路)。The signal lines Data_1 to Data_N are electrically connected to the first to Nth row antenna units 10C, respectively (eg, signal control and memory circuits of the antenna unit 10C).
在一些實施例中,訊號線Data_1至訊號線Data_N用於傳輸電路控制訊號SDI以及SDO中的至少一者。In some embodiments, the signal lines Data_1 to Data_N are used to transmit at least one of the circuit control signals SDI and SDO.
訊號線CLK_1至訊號線CLK_M分別電性連接至第一行天線單元10C至第M行天線單元10C(例如天線單元10C的訊號控制及記憶體電路)。The signal lines CLK_1 to CLK_M are electrically connected to the first to Mth rows of antenna units 10C, respectively (eg, signal control and memory circuits of the antenna unit 10C).
在本實施例中,依照步驟1、步驟2、步驟3……至步驟M,依序對M行天線單元10C進行資料寫入/選擇,這可以通過訊號線CLK_1至訊號線CLK_M所傳輸的時脈訊號(在一些實施例中,可以是用於控制電晶體的閘極訊號)而達成。訊號線CLK_1至訊號線CLK_M電性連接至閘極驅動電路DR(請參考圖10)。In this embodiment, data is written/selected sequentially to M rows of antenna units 10C in accordance with steps 1, 2, 3, ..., through M. This is achieved via clock signals (which, in some embodiments, can be gate signals used to control transistors) transmitted via signal lines CLK_1 through CLK_M. Signal lines CLK_1 through CLK_M are electrically connected to a gate driver circuit DR (see FIG. 10 ).
在執行步驟M之後,利用另一條訊號線CLK_M+1(未繪出)提供的時脈訊號以及射頻啟用訊號線(未繪出)提供的射頻啟用訊號RF_en來啟動天線陣列,並產生輻射。After executing step M, the antenna array is activated using a clock signal provided by another signal line CLK_M+1 (not shown) and an RF enable signal RF_en provided by an RF enable signal line (not shown) to generate radiation.
在一些實施例中,電路控制訊號沿著水平方向傳輸至同一列的天線單元10C。前述電路控制訊號例如包含SDI、SDO、CLK、CS等。In some embodiments, circuit control signals are transmitted horizontally to antenna units 10C in the same row. The aforementioned circuit control signals include, for example, SDI, SDO, CLK, and CS.
時脈訊號(在一些實施例中可稱為閘極訊號)沿著垂直方向輸入給同一行的天線單元10C(例如天線單元10C的訊號控制及記憶體電路或晶片410C)。The clock signal (which may be referred to as a gate signal in some embodiments) is input vertically to the antenna units 10C in the same row (eg, the signal control and memory circuit or chip 410C of the antenna unit 10C).
在一些實施例中,電路控制訊號PDI、射頻啟用訊號RF_en、射頻輸入訊號RF_in、電源訊號AVDD、電源訊號DVDD、接地訊號AGND以及接地訊號RF_GND則利用並列的方式輸入給所有晶片410C。In some embodiments, the circuit control signal PDI, the RF enable signal RF_en, the RF input signal RF_in, the power signal AVDD, the power signal DVDD, the ground signal AGND, and the ground signal RF_GND are input to all chips 410C in parallel.
圖12是依照本發明的一實施例的一種天線裝置1C的功能區塊圖。在本實施例中,每個天線單元10C包含一個晶片410C以及相位控制模組PC(其中例如包含訊號控制及記憶體電路)。晶片410C中包含BFIC。相位控制模組PC設置於薄膜電路結構200C(請參考圖9)中,且包含多個薄膜電晶體T(或稱為開關元件)。Figure 12 is a functional block diagram of an antenna device 1C according to an embodiment of the present invention. In this embodiment, each antenna unit 10C includes a chip 410C and a phase control module PC (which, for example, includes signal control and memory circuits). Chip 410C includes a BFIC. Phase control module PC is implemented within a thin-film circuit structure 200C (see Figure 9) and includes multiple thin-film transistors T (or switching elements).
在本實施例中,接地訊號(例如AGND、RF_GND等)、電源訊號(例如AVDD等)、射頻訊號(RF signal)以及參考電壓訊號(Vref)連接至晶片410C,而多種電路控制訊號(例如SDI、SDO、PDI等)、射頻啟用訊號(RF_en)以及電源訊號(例如DVDD等)連接至相位控制模組PC。訊號線CLK’分別連接至不同行的天線單元10C的相位控制模組PC。In this embodiment, ground signals (e.g., AGND, RF_GND), power signals (e.g., AVDD), RF signals (e.g., AVDD), and a reference voltage signal (Vref) are connected to chip 410C. Various circuit control signals (e.g., SDI, SDO, PDI), an RF enable signal (RF_en), and power signals (e.g., DVDD) are connected to the phase control module PC. Signal line CLK' is connected to the phase control modules PC of antenna units 10C in different rows.
在本實施例中,電路控制訊號提供至相位控制模組PC。相位控制模組PC提供訊號給晶片410C,例如晶片410C中的可變增益放大器與相移器模組VGPS。In this embodiment, the circuit control signal is provided to the phase control module PC. The phase control module PC provides a signal to the chip 410C, such as the variable gain amplifier and phase shifter module VGPS in the chip 410C.
在本實施例中,射頻訊號RF signal經除法器(divider)處理後提供給可變增益放大器與相移器模組VGPS。可變增益放大器與相移器模組VGPS提供訊號給功率放大器及/或低損耗放大器模組PALNA。In this embodiment, the RF signal is processed by a divider and then provided to a variable gain amplifier and phase shifter module VGPS. The variable gain amplifier and phase shifter module VGPS provides a signal to a power amplifier and/or a low loss amplifier module PALNA.
功率放大器及/或低損耗放大器模組PALNA提供第一天線訊號(例如水平極化電場天線訊號(RF_out_H))以及第二天線訊號(例如垂直極化電場天線訊號(RF_out_V))給天線電極110。The power amplifier and/or low-loss amplifier module PALNA provides a first antenna signal (eg, a horizontally polarized electric field antenna signal (RF_out_H)) and a second antenna signal (eg, a vertically polarized electric field antenna signal (RF_out_V)) to the antenna electrode 110 .
在一些實施例中,可額外於天線單元10C中設置其他被動元件PD,例如電感、電容及/或電阻。被動元件連接至晶片410C的功率放大器及/或低損耗放大器模組PALNA。In some embodiments, other passive components PD, such as inductors, capacitors, and/or resistors, may be additionally provided in the antenna unit 10C. The passive components are connected to the power amplifier and/or low-loss amplifier module PALNA of the chip 410C.
圖13是依照本發明的一實施例的一種天線單元的電路示意圖。在此必須說明的是,圖13的實施例沿用圖12的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。Figure 13 is a schematic circuit diagram of an antenna unit according to an embodiment of the present invention. It should be noted that the embodiment of Figure 13 uses the same component numbers and some content as the embodiment of Figure 12 , with identical or similar components being designated by the same or similar reference numbers, and descriptions of identical technical content being omitted. For explanations of omitted portions, please refer to the aforementioned embodiments and will not be repeated here.
請參考圖13,在本實施例中,訊號控制及記憶體電路TC(即圖12中的相位控制模組PC)包括多個第一開關元件T1、多個第一記憶體電路MC1、多個第二開關元件T2以及多個第二記憶體電路MC2。第一開關元件T1分別電性連接至第一記憶體電路MC1。各第二開關元件T2電性連接至第一記憶體電路MC1中的對應的一者以及第二記憶體電路MC2中的對應的一者。訊號控制及記憶體電路TC的第二記憶體電路MC2電性連接至晶片410C。Referring to Figure 13 , in this embodiment, the signal control and memory circuit TC (i.e., the phase control module PC in Figure 12 ) includes multiple first switching elements T1, multiple first memory circuits MC1, multiple second switching elements T2, and multiple second memory circuits MC2. The first switching elements T1 are each electrically connected to the first memory circuits MC1. Each second switching element T2 is electrically connected to a corresponding one of the first memory circuits MC1 and a corresponding one of the second memory circuits MC2. The second memory circuits MC2 of the signal control and memory circuit TC are electrically connected to chip 410C.
訊號線D1至D5連接至多個第一開關元件T1。在一些實施例中,訊號線D1至D5中的每一者連接至對應的兩個第一開關元件T1。水平極化/垂直極化選擇線HVS電性連接至第一開關元件T1的閘極,並提供閘極訊號至第一開關元件T1的閘極,以控制第一開關元件T1的開關。在一些實施例中,在圖13所示的10個第一開關元件T1中,其中上面5個第一開關元件T1對應於與水平極化電場天線訊號(RF_out_H)相關的第一記憶體電路MC1,而下面5個第一開關元件T1對應於與垂直極化電場天線訊號(RF_out_V)相關的第一記憶體電路MC1,通過使上面5個第一開關元件T1與下面5個第一開關元件T1包括不同型式的電晶體,例如上面5個第一開關元件T1為n型電晶體與p型電晶體中的一種,而下面5個第一開關元件T1為n型電晶體與p型電晶體中的另一種。通過這樣的設計,使上面5個第一開關元件T1與下面5個第一開關元件T1具有不同的導通(on)電壓。在一些實施例中,第一開關元件T1的數量可以依據需求而進行調整。Signal lines D1 to D5 are connected to a plurality of first switching elements T1. In some embodiments, each signal line D1 to D5 is connected to two corresponding first switching elements T1. A horizontal polarization/vertical polarization select line HVS is electrically connected to the gates of the first switching elements T1 and provides a gate signal to the gates of the first switching elements T1 to control the switching of the first switching elements T1. In some embodiments, among the ten first switching elements T1 shown in FIG13 , the top five first switching elements T1 correspond to the first memory circuit MC1 associated with the horizontally polarized electric field antenna signal (RF_out_H), while the bottom five first switching elements T1 correspond to the first memory circuit MC1 associated with the vertically polarized electric field antenna signal (RF_out_V). By making the top five first switching elements T1 and the bottom five first switching elements T1 include different types of transistors, for example, the top five first switching elements T1 may be one of an n-type transistor and a p-type transistor, while the bottom five first switching elements T1 may be the other of an n-type transistor and a p-type transistor, such that the top five first switching elements T1 and the bottom five first switching elements T1 have different on-voltages. In some embodiments, the number of first switching elements T1 can be adjusted according to needs.
射頻啟用訊號線電性連接至第二開關元件T2的閘極,並提供射頻啟用訊號RF_en至第二開關元件T2的閘極,以控制第二開關元件T2的開關。The RF enable signal line is electrically connected to the gate of the second switching element T2 and provides an RF enable signal RF_en to the gate of the second switching element T2 to control the switching of the second switching element T2.
在一些實施例中,水平極化/垂直極化選擇線HVS、射頻啟用訊號線、訊號線D1至D5、第一開關元件T1、第一記憶體電路MC1、第二開關元件T2以及第二記憶體電路M1設置於薄膜電路結構200C(請參考圖9)中。舉例來說,第一薄膜導電層210以及第二薄膜導電層220中的至少一者包括水平極化/垂直極化選擇線HVS以及射頻啟用訊號線。In some embodiments, the horizontal/vertical polarization select line HVS, the RF enable signal line, the signal lines D1 to D5, the first switching device T1, the first memory circuit MC1, the second switching device T2, and the second memory circuit M1 are disposed in a thin-film circuit structure 200C (see FIG. 9 ). For example, at least one of the first thin-film conductive layer 210 and the second thin-film conductive layer 220 includes the horizontal/vertical polarization select line HVS and the RF enable signal line.
在一些實施例中,訊號線CLK’提供的電路控制訊號CLK(即時脈訊號)用於控制第一記憶體電路MC1的存入,且第一記憶體電路MC1可用來使接下來要寫入的資料能夠預載。射頻啟用訊號RF_en用於控制第二記憶體電路MC2,且第二記憶體電路用於維持當下要輻射的狀態。圖13的訊號線CLK’例如對應於圖11的訊號線CLK_1至訊號線CLK_M。閘極驅動電路通過訊號線CLK’電性連接至第一記憶體電路MC1以及第二記憶體電路MC2。In some embodiments, the circuit control signal CLK (a real-time pulse signal) provided by signal line CLK' is used to control the writing of data to the first memory circuit MC1, and the first memory circuit MC1 can be used to preload the data to be written next. The radio frequency enable signal RF_en is used to control the second memory circuit MC2, and the second memory circuit is used to maintain the current radiation state. For example, signal line CLK' in Figure 13 corresponds to signal lines CLK_1 to CLK_M in Figure 11. The gate driver circuit is electrically connected to the first memory circuit MC1 and the second memory circuit MC2 via signal line CLK'.
在一些實施例中,第一記憶體電路MC1以及第二記憶體電路MC2中的每一者的電路布局如圖14所示。每個記憶體電路包括薄膜電晶體M1、M2、M3、M4、M5、M6。薄膜電晶體M1、M2、M3、M4、M5、M6設置於薄膜電路結構200C(請參考圖9)中。在一些實施例中,提供電源訊號DVDD至記憶體電路的薄膜電晶體M2、M4,提供電路控制訊號CLK(即時脈訊號)至記憶體電路的薄膜電晶體M5、M6。在一些實施例中,薄膜電晶體M1、M3連接至接地訊號。In some embodiments, the circuit layout of each of the first memory circuit MC1 and the second memory circuit MC2 is shown in FIG14 . Each memory circuit includes thin-film transistors M1, M2, M3, M4, M5, and M6. Thin-film transistors M1, M2, M3, M4, M5, and M6 are disposed in a thin-film circuit structure 200C (see FIG9 ). In some embodiments, a power signal DVDD is provided to thin-film transistors M2 and M4 in the memory circuits, and a circuit control signal CLK (a clock signal) is provided to thin-film transistors M5 and M6 in the memory circuits. In some embodiments, thin-film transistors M1 and M3 are connected to a ground signal.
圖15是依照本發明的一實施例的一種天線裝置的功能區塊圖。天線裝置的非透明區NTR中包含全球定位系統/重力計模組710、現場可程式化邏輯閘陣列模組720、調製器/解調器模組730、數位類比轉換器740、類比數位轉換器750以及電源模組760。全球定位系統/重力計模組710、現場可程式化邏輯閘陣列模組720、調製器/解調器模組730、數位類比轉換器740、類比數位轉換器750以及電源模組760例如設置於印刷電路板(如圖1所示的印刷電路板510、520)上。FIG15 is a functional block diagram of an antenna device according to an embodiment of the present invention. The non-transparent region (NTR) of the antenna device includes a GPS/gravimeter module 710, a field-programmable logic gate array (FPGA) module 720, a modulator/demodulator module 730, a digital-to-analog converter (DAC) 740, an analog-to-digital converter (ADC) 750, and a power supply module 760. The GPS/gravimeter module 710, the FPGA module 720, the modulator/demodulator module 730, the DAC 740, the ADC 750, and the power supply module 760 are, for example, mounted on a printed circuit board (such as the PCBs 510 and 520 shown in FIG1 ).
在本實施例中,由於天線裝置是裝設於車輛上,車輛電腦系統可提供訊號至調製器/解調器模組730,且車輛電源系統可提供直流電源至電源模組760。In this embodiment, since the antenna device is installed on a vehicle, the vehicle computer system can provide a signal to the modulator/demodulator module 730, and the vehicle power system can provide a DC power to the power module 760.
數據資料/電路控制訊號在全球定位系統/重力計模組710與現場可程式化邏輯閘陣列模組720之間、全球定位系統/重力計模組710與調製器/解調器模組730之間、現場可程式化邏輯閘陣列模組720與數位類比轉換器740之間以及現場可程式化邏輯閘陣列模組720與類比數位轉換器750之間傳遞。Data/circuit control signals are transmitted between the GPS/gravimeter module 710 and the field-programmable logic gate array module 720, between the GPS/gravimeter module 710 and the modulator/demodulator module 730, between the field-programmable logic gate array module 720 and the digital-to-analog converter 740, and between the field-programmable logic gate array module 720 and the analog-to-digital converter 750.
在一些實施例中,現場可程式化邏輯閘陣列模組720可進行數位訊號處理以及時序管理。現場可程式化邏輯閘陣列模組720可將數據資料以數位訊號的方式傳輸至數位類比轉換器740,或從類比數位轉換器750以數位訊號的方式接收數據資料。In some embodiments, the FPLGAM module 720 can perform digital signal processing and timing management. The FPLGAM module 720 can transmit data as digital signals to the DAC 740 or receive data as digital signals from the ADC 750.
電源模組760提供直流電訊號至現場可程式化邏輯閘陣列模組720、調製器/解調器模組730、數位類比轉換器740以及類比數位轉換器750。此外,電源模組760還提供直流電訊號至設置於透明區TR中的上/下變頻器430以及天線單元10C。直流電訊號例如包括接地訊號(例如AGND、DGND、RF_GND等)、電源訊號(例如AVDD、DVDD等)、參考電壓訊號(Vref)或其他類似的訊號。The power module 760 provides DC signals to the field-programmable logic gate array module 720, the modulator/demodulator module 730, the digital-to-analog converter 740, and the analog-to-digital converter 750. Furthermore, the power module 760 provides DC signals to the up/down converter 430 and the antenna unit 10C disposed in the transparent region TR. Examples of DC signals include ground signals (e.g., AGND, DGND, RF_GND), power signals (e.g., AVDD, DVDD), reference voltage signals (Vref), and similar signals.
天線裝置的透明區TR中包含閘極驅動電路DR、上/下變頻器430、功率分配器SW1以及天線單元10C。在本實施例中,天線單元10C包含晶片410C、相位控制模組PC(例如包含圖13所示的訊號控制及記憶體電路TC)、功率分配器SW2以及天線電極110。The transparent region TR of the antenna device includes a gate driver circuit DR, an up/down converter 430, a power splitter SW1, and an antenna unit 10C. In this embodiment, the antenna unit 10C includes a chip 410C, a phase control module PC (e.g., including the signal control and memory circuit TC shown in FIG. 13 ), a power splitter SW2, and an antenna electrode 110.
上/下變頻器430接收來自數位類比轉換器740的中頻訊號,或傳輸中頻訊號至類比數位轉換器750。在一些實施例中,中頻訊號的頻率小於10GHz。上/下變頻器430可將中頻訊號變頻為高頻率的射頻訊號,或將高頻率的射頻訊號變頻為中頻訊號。在一些實施例中,射頻訊號的頻率大於或等於10GHz。Up/down converter 430 receives an intermediate frequency (IF) signal from digital-to-analog converter 740 or transmits an IF signal to analog-to-digital converter 750. In some embodiments, the IF signal has a frequency less than 10 GHz. Up/down converter 430 can convert the IF signal into a high-frequency RF signal, or vice versa. In some embodiments, the RF signal has a frequency greater than or equal to 10 GHz.
射頻訊號經功率分配器SW1傳遞至晶片410C,並在晶片410C中進行處理。在此必須說明的是,圖15中的晶片410C採用TDD技術,可進行發射波束成形處理TX以及接收波束成形處理RX。The RF signal is transmitted via power divider SW1 to chip 410C, where it is processed. It should be noted that chip 410C in Figure 15 utilizes TDD technology, enabling both transmit beamforming (TX) and receive beamforming (RX).
閘極驅動電路DR提供電路控制訊號(例如閘極訊號或時脈訊號)至相位控制模組PC,現場可程式化邏輯閘陣列模組720提供電路控制訊號(例如時脈訊號)至相位控制模組PC。相位控制模組PC輸出電路控制訊號至晶片410C,並進行發射波束成形處理TX以及接收波束成形處理RX。在一些實施例中,閘極驅動電路DR以及相位控制模組PC可設置於薄膜電路結構200C(請參考圖9)中。在一些實施例中,相位控制模組PC可整合製晶片410C中。在一些實施例中,閘極驅動電路DR可設置於其他晶片中,並接合至重佈線結構300(請參考圖9)。The gate driver circuit DR provides a circuit control signal (e.g., a gate signal or a clock signal) to the phase control module PC. The field-programmable logic gate array module 720 provides a circuit control signal (e.g., a clock signal) to the phase control module PC. The phase control module PC outputs the circuit control signal to the chip 410C to perform transmit beamforming processing (TX) and receive beamforming processing (RX). In some embodiments, the gate driver circuit DR and the phase control module PC may be incorporated into a thin-film circuit structure 200C (see FIG. 9 ). In some embodiments, the phase control module PC may be integrated into the chip 410C. In some embodiments, the gate driver circuit DR may be disposed in another chip and bonded to the redistribution structure 300 (see FIG. 9 ).
功率分配器SW2在晶片410C與天線電極110之間進行射頻訊號的分配。在一些實施例中,功率分配器SW2可整合至晶片410C中或設置於薄膜電路結構200C(請參考圖9)中。The power divider SW2 distributes the radio frequency signal between the chip 410C and the antenna electrode 110. In some embodiments, the power divider SW2 can be integrated into the chip 410C or disposed in the thin film circuit structure 200C (see FIG. 9 ).
在本實施例中,全球定位系統/重力計模組710、現場可程式化邏輯閘陣列模組720、調製器/解調器模組730、數位類比轉換器740、類比數位轉換器750以及電源模組760設置於非透明區NTR中,但本發明不以此為限。在其他實施例中,全球定位系統/重力計模組710、現場可程式化邏輯閘陣列模組720、調製器/解調器模組730、數位類比轉換器740、類比數位轉換器750以及電源模組760中的一者或多者設置於透明區TR中,也就是設置於透明基板100之上,如圖16所示。In this embodiment, the GPS/gravimeter module 710, the FPLG module 720, the modulator/demodulator module 730, the DAC 740, the ADC 750, and the power module 760 are disposed in the non-transparent region NTR, but the present invention is not limited thereto. In other embodiments, one or more of the GPS/gravimeter module 710, the FPLG module 720, the modulator/demodulator module 730, the DAC 740, the ADC 750, and the power module 760 are disposed in the transparent region TR, that is, disposed on the transparent substrate 100, as shown in FIG16 .
圖17是依照本發明的一實施例的又另一種天線裝置的功能區塊圖。在此必須說明的是,圖17的實施例沿用圖15的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。Figure 17 is a functional block diagram of yet another antenna device according to an embodiment of the present invention. It should be noted that the embodiment of Figure 17 retains the same component numbers and some details as the embodiment of Figure 15 , with identical or similar reference numbers used to represent identical or similar components, and descriptions of identical technical details omitted. For explanations of omitted sections, please refer to the aforementioned embodiments and will not be repeated here.
圖17的天線裝置與圖15的天線裝置的差異在於:圖17的天線裝置中的晶片採用FDD技術,分別利用不同的天線單元陣列進行發射波束成形處理TX以及接收波束成形處理RX。The difference between the antenna device in Figure 17 and the antenna device in Figure 15 is that the chip in the antenna device in Figure 17 adopts FDD technology and uses different antenna unit arrays for transmit beamforming processing (TX) and receive beamforming processing (RX).
在天線單元10C-1所構成的陣列中,上/下變頻器430-1提供射頻訊號至晶片410C-1,並進行發射波束成形處理TX。天線110-1輸出相對應的輻射訊號。在一些實施例中,閘極驅動電路DR1提供電路控制訊號(例如閘極訊號或時脈訊號)至相位控制模組PC1,現場可程式化邏輯閘陣列模組720提供電路控制訊號(例如時脈訊號)至相位控制模組PC1。相位控制模組PC1輸出電路控制訊號至晶片410C-1,並進行發射波束成形處理TX。In the array formed by antenna unit 10C-1, up/down converter 430-1 provides an RF signal to chip 410C-1, which performs transmit beamforming processing (TX). Antenna 110-1 outputs a corresponding radiated signal. In some embodiments, gate driver circuit DR1 provides a circuit control signal (e.g., a gate signal or a clock signal) to phase control module PC1, and field programmable logic gate array module 720 provides a circuit control signal (e.g., a clock signal) to phase control module PC1. Phase control module PC1 outputs the circuit control signal to chip 410C-1, which performs transmit beamforming processing (TX).
在天線單元10C-2所構成的陣列中,天線110-2接收相對應的輻射訊號。晶片410C-2進行接收波束成形處理RX。上/下變頻器430-2接收來自晶片410C-2的射頻訊號。在一些實施例中,閘極驅動電路DR2提供電路控制訊號(例如閘極訊號或時脈訊號)至相位控制模組PC2,現場可程式化邏輯閘陣列模組720提供電路控制訊號(例如時脈訊號)至相位控制模組PC2。相位控制模組PC2輸出電路控制訊號至晶片410C-2,並進行接收波束成形處理RX。In the array formed by antenna units 10C-2, antenna 110-2 receives the corresponding radiated signal. Chip 410C-2 performs receive beamforming (RX). Up/down converter 430-2 receives the RF signal from chip 410C-2. In some embodiments, gate driver circuit DR2 provides a circuit control signal (e.g., a gate signal or a clock signal) to phase control module PC2, and field programmable logic gate array module 720 provides a circuit control signal (e.g., a clock signal) to phase control module PC2. Phase control module PC2 outputs the circuit control signal to chip 410C-2, which performs receive beamforming (RX).
在一些實施例中,天線單元10C-1所構成的陣列與天線單元10C-2所構成的陣列可設置在同一塊透明基板100上的不同區域中,或分別設置在兩塊透明基板100上。In some embodiments, the array formed by the antenna units 10C- 1 and the array formed by the antenna units 10C- 2 may be disposed in different regions on the same transparent substrate 100 , or may be disposed on two transparent substrates 100 , respectively.
綜上所述,本發明的天線裝置包括薄膜電路結構,薄膜電路結構中的薄膜導電層可用於傳輸電路控制訊號。由於薄膜導電層的厚度較薄,可以減少天線裝置的整體厚度。此外,由於每個天線單元各自包含晶片,可以使天線裝置的熱源分散。In summary, the antenna device of the present invention includes a thin-film circuit structure, wherein a thin-film conductive layer is used to transmit circuit control signals. Due to the thinness of the thin-film conductive layer, the overall thickness of the antenna device can be reduced. Furthermore, since each antenna unit contains its own chip, heat sources within the antenna device can be dispersed.
1A,1B,1C,1D:天線裝置 10A,10C,10C-1,10C-2:天線單元 100:透明基板 110,110-1,110-2:天線電極 120:基板導電通孔 132:接地電極 132h:開口 134:接合結構 140:緩衝層 200,200C:薄膜電路結構 210:第一薄膜導電層 211,221,D1,D2,D3,D4,D5,CLK’,CLK_1,CLK_N,CLK_M,CS_1,CS_N,Data_1,Data_N:訊號線 220:第一介電層 230:第二薄膜導電層 240:第二介電層 250:閘介電層 300:重佈線結構 310:第一重佈線層 320:絕緣層 330:第二重佈線層 334:射頻訊號線 410A,410C,410C-1,410C-2:晶片 412,432:導電連接結構 420:底部填充材 430,430-1,430-2:上/下變頻器 510,520:印刷電路板 610,620,630:軟性電路板 710:全球定位系統/重力計模組 720:現場可程式化邏輯閘陣列模組 730:調製器/解調器模組 740:數位類比轉換器 750:類比數位轉換器 760:電源模組 DR,DR1,DR2:閘極驅動電路 G:閘極 HVS:水平極化/垂直極化選擇線 H1,H2,V1,V2:線 LH1,LH2:導電通孔 LT:光穿透區 M1,M2,M3,M4,M5,M6,T:薄膜電晶體 MC:記憶體電路模組 MC1:第一記憶體電路 MC2:第二記憶體電路 NTR:非透明區 P:接墊 PALNA:功率放大器及/或低損耗放大器模組 PC,PC1,PC2:相位控制模組 PD:被動元件 PH1,PH2:接觸部 RX:接收波束成形處理 S1:第一面 S2:第二面 SCC:訊號控制電路模組 SD:源極/汲極 SM:半導體層 SW,SW1,SW2:功率分配器 T1:第一開關元件 T2:第二開關元件 TC:訊號控制及記憶體電路 TR:透明區 TX:發射波束成形處理 VGPS:可變增益放大器與相移器模組 1A, 1B, 1C, 1D: Antenna device 10A, 10C, 10C-1, 10C-2: Antenna unit 100: Transparent substrate 110, 110-1, 110-2: Antenna electrodes 120: Substrate conductive via 132: Ground electrode 132h: Opening 134: Bonding structure 140: Buffer layer 200, 200C: Thin-film circuit structure 210: First thin-film conductive layer 211, 221, D1, D2, D3, D4, D5, CLK’, CLK_1, CLK_N, CLK_M, CS_1, CS_N, Data_1, Data_N: Signal lines 220: First dielectric layer 230: Second thin-film conductive layer 240: Second dielectric layer 250: Gate dielectric layer 300: Redistribution structure 310: First redistribution layer 320: Insulation layer 330: Second redistribution layer 334: RF signal line 410A, 410C, 410C-1, 410C-2: Chip 412, 432: Conductive connection structure 420: Underfill material 430, 430-1, 430-2: Up/down converter 510, 520: Printed circuit board 610, 620, 630: Flexible circuit board 710: GPS/gravity meter module 720: Field-programmable logic gate array module 730: Modulator/demodulator module 740: Digital-to-analog converter 750: Analog-to-digital converter 760: Power supply module DR, DR1, DR2: Gate driver circuit G: Gate HVS: Horizontal polarization/vertical polarization select line H1, H2, V1, V2: Lines LH1, LH2: Conductive vias LT: Light-transmitting region M1, M2, M3, M4, M5, M6, T: Thin-film transistors MC: Memory circuit module MC1: First memory circuit MC2: Second memory circuit NTR: Non-transparent region P: Pad PALNA: Power amplifier and/or low-loss amplifier module PC, PC1, PC2: Phase control module PD: Passive device PH1, PH2: Contacts RX: Receive beamforming processing S1: Side 1 S2: Side 2 SCC: Signal control circuit module SD: Source/Drain SM: Semiconductor layer SW, SW1, SW2: Power divider T1: First switching element T2: Second switching element TC: Signal control and memory circuit TR: Transparent region TX: Transmit beamforming processing VGPS: Variable gain amplifier and phase shifter module
圖1是依照本發明的一實施例的一種天線裝置的上視示意圖。 圖2是依照本發明的一實施例的一種天線裝置的剖面示意圖。 圖3是依照本發明的一實施例的一種天線裝置的上視示意圖。 圖4是依照本發明的一些實施例的一些天線裝置的射頻訊號傳輸方式。 圖5是依照本發明的一些實施例的另一些天線裝置的射頻訊號傳輸方式。 圖6是依照本發明的一些實施例的一種天線裝置的資料寫入/選擇示意圖。 圖7是依照本發明的一實施例的一種天線裝置的功能區塊圖。 圖8是依照本發明的一實施例的一種天線裝置的上視示意圖。 圖9是依照本發明的一實施例的一種天線裝置的剖面示意圖。 圖10是依照本發明的一實施例的一種天線裝置的上視示意圖。 圖11是依照本發明的一些實施例的一種天線裝置的資料寫入/選擇示意圖。 圖12是依照本發明的一實施例的一種天線裝置的功能區塊圖。 圖13是依照本發明的一實施例的一種天線單元的電路示意圖。 圖14是依照本發明的一實施例的一種天線單元的記憶體電路的電路示意圖。 圖15是依照本發明的一實施例的一種天線裝置的功能區塊圖。 圖16是依照本發明的一實施例的另一種天線裝置的功能區塊圖。 圖17是依照本發明的一實施例的又另一種天線裝置的功能區塊圖。 Figure 1 is a schematic top view of an antenna device according to an embodiment of the present invention. Figure 2 is a schematic cross-sectional view of an antenna device according to an embodiment of the present invention. Figure 3 is a schematic top view of an antenna device according to an embodiment of the present invention. Figure 4 illustrates radio frequency signal transmission methods of some antenna devices according to some embodiments of the present invention. Figure 5 illustrates radio frequency signal transmission methods of other antenna devices according to some embodiments of the present invention. Figure 6 is a schematic diagram of data writing/selection of an antenna device according to some embodiments of the present invention. Figure 7 is a functional block diagram of an antenna device according to an embodiment of the present invention. Figure 8 is a schematic top view of an antenna device according to an embodiment of the present invention. Figure 9 is a schematic cross-sectional view of an antenna device according to an embodiment of the present invention. Figure 10 is a schematic top view of an antenna device according to an embodiment of the present invention. Figure 11 is a schematic diagram of data writing/selection in an antenna device according to some embodiments of the present invention. Figure 12 is a functional block diagram of an antenna device according to an embodiment of the present invention. Figure 13 is a schematic circuit diagram of an antenna unit according to an embodiment of the present invention. Figure 14 is a schematic circuit diagram of a memory circuit of an antenna unit according to an embodiment of the present invention. Figure 15 is a functional block diagram of an antenna device according to an embodiment of the present invention. Figure 16 is a functional block diagram of another antenna device according to an embodiment of the present invention. Figure 17 is a functional block diagram of yet another antenna device according to an embodiment of the present invention.
1A:天線裝置 1A: Antenna device
10A:天線單元 10A: Antenna unit
100:透明基板 100:Transparent substrate
110:天線電極 110: Antenna Electrode
410A:晶片 410A: Chip
430:上/下變頻器 430: Up/Down Converter
510,520:印刷電路板 510,520: Printed circuit board
610,620,630:軟性電路板 610, 620, 630: Flexible circuit boards
NTR:非透明區 NTR: Non-transparent region
TR:透明區 TR: Transparent Zone
Claims (14)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411690900.3A CN119627416A (en) | 2023-12-06 | 2024-11-25 | Antenna device |
| US18/970,902 US20250192079A1 (en) | 2023-12-06 | 2024-12-06 | Antenna device |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202363606806P | 2023-12-06 | 2023-12-06 | |
| US63/606,806 | 2023-12-06 | ||
| TW113126978 | 2024-07-18 | ||
| TW113126978 | 2024-07-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202524760A TW202524760A (en) | 2025-06-16 |
| TWI894040B true TWI894040B (en) | 2025-08-11 |
Family
ID=97224163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113143748A TWI894040B (en) | 2023-12-06 | 2024-11-14 | Antenna |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI894040B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190131224A1 (en) * | 2017-10-26 | 2019-05-02 | Samsung Electro-Mechanics Co., Ltd. | Fan-out semiconductor package |
| TW202036792A (en) * | 2019-03-15 | 2020-10-01 | 台灣積體電路製造股份有限公司 | Semiconductor device and method of making patch antenna in semiconductor device |
| US10854585B2 (en) * | 2018-07-20 | 2020-12-01 | Samsung Electronics Co., Ltd. | Semiconductor package with improved power integrity |
| US20230253300A1 (en) * | 2021-03-18 | 2023-08-10 | Taiwan Semiconductor Manufacturing Company Limited | Chip package structure including a silicon substrate interposer and methods for forming the same |
-
2024
- 2024-11-14 TW TW113143748A patent/TWI894040B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190131224A1 (en) * | 2017-10-26 | 2019-05-02 | Samsung Electro-Mechanics Co., Ltd. | Fan-out semiconductor package |
| US10854585B2 (en) * | 2018-07-20 | 2020-12-01 | Samsung Electronics Co., Ltd. | Semiconductor package with improved power integrity |
| TW202036792A (en) * | 2019-03-15 | 2020-10-01 | 台灣積體電路製造股份有限公司 | Semiconductor device and method of making patch antenna in semiconductor device |
| US20230253300A1 (en) * | 2021-03-18 | 2023-08-10 | Taiwan Semiconductor Manufacturing Company Limited | Chip package structure including a silicon substrate interposer and methods for forming the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202524760A (en) | 2025-06-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI699106B (en) | Patch on interposer package with wireless communication interface | |
| US9419339B2 (en) | Package structures including discrete antennas assembled on a device | |
| CN1523668B (en) | Semiconductor device | |
| US10147997B2 (en) | Integration of millimeter wave antennas on microelectronic substrates | |
| TW201733043A (en) | Microelectronic device designed with a high frequency communication device including a composite semiconductor device integrated on an intermediate grain structure on a package | |
| US10903547B2 (en) | Electronic package | |
| TW201729387A (en) | Microelectronic device designed with a high frequency communication device including a composite semiconductor device integrated on a die structure on a package | |
| CN109166845B (en) | Packaged antenna and method of manufacturing the same | |
| KR20100010276A (en) | Multilayer package and a transmitter-receiver module package of active phase array radar using the same | |
| CN110010490A (en) | A kind of manufacture craft of the radio frequency cube structure longitudinally interconnected | |
| TW202213698A (en) | Package comprising passive device configured as electromagnetic interference shield | |
| TWI894040B (en) | Antenna | |
| US20230290700A1 (en) | Antenna package | |
| CN116742316A (en) | An antenna package | |
| US20250192079A1 (en) | Antenna device | |
| TWI891689B (en) | Integrated circuit (ic) packages employing a thermal conductive package substrate with die region split, and related fabrication methods | |
| US20250201485A1 (en) | Vertically embedded pre-formed deep trench capacitor modules | |
| US20250192428A1 (en) | Antenna device | |
| CN110739227A (en) | manufacturing method of three-dimensional heterogeneous radio frequency module based on three-dimensional heat dissipation structure | |
| WO2024030718A1 (en) | Package with a substrate comprising embedded stacked trench capacitor devices | |
| CN117293566A (en) | Antenna device | |
| TWI888227B (en) | Antenna device | |
| TW202240713A (en) | Manufacturing method of electronic device | |
| KR20220070531A (en) | System-on-foil devices | |
| TWI911460B (en) | Antenna device |