TWI892808B - Hydrogen purification devices and foil-microscreen assemblies - Google Patents
Hydrogen purification devices and foil-microscreen assembliesInfo
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相關申請案之交互參照:本申請案為在2021年8月31日申請且題為「Hydrogen Purification Devices」之美國專利申請案第16/904,872號的部分接續案,該美國專利申請案為在2018年1月4日申請且題為「Hydrogen Purification Devices」之美國專利申請案第15/862,474號的分案申請,該美國專利申請案為在2017年4月10日申請且現頒佈為美國專利第10,166,506號且題為「Hydrogen Generation Assemblies and Hydrogen Purification Devices」之美國專利申請案第15/483,265號的部分接續申請案,該美國專利申請案為在2015年11月3日申請且現頒佈為美國專利第9,616,389號且題為「Hydrogen Generation Assemblies and Hydrogen Purification Devices」之美國專利申請案第14/931,585號的接續案,該美國專利申請案為在2013年3月14日申請且現頒佈為美國專利第9,187,324號且題為「Hydrogen Generation Assemblies and Hydrogen Purification Devices」之美國專利申請案第13/829,766號的分案,該美國專利申請案為現已廢棄的在2012年8月30申請且題為「Hydrogen Generation Assemblies」之美國專利申請案第13/600,096號的部分接續案。上述申請案之全部揭示內容出於所有目的而特此以引用之方式併入。Cross-reference to related applications: This application is a continuation-in-part of U.S. patent application No. 16/904,872, filed on August 31, 2021, and entitled “Hydrogen Purification Devices,” which is a divisional application of U.S. patent application No. 15/862,474, filed on January 4, 2018, and entitled “Hydrogen Purification Devices,” which is a divisional application of U.S. patent application No. 10,166,506, filed on April 10, 2017, and entitled “Hydrogen Generation Assemblies and Hydrogen Purification Devices.” Devices”, which is a continuation-in-part of U.S. Patent Application No. 15/483,265, filed on November 3, 2015, and issued as U.S. Patent No. 9,616,389, entitled “Hydrogen Generation Assemblies and Hydrogen Purification Devices”, which is a continuation-in-part of U.S. Patent Application No. 14/931,585, filed on March 14, 2013, and issued as U.S. Patent No. 9,187,324, entitled “Hydrogen Generation Assemblies and Hydrogen Purification Devices” No. 13/829,766, entitled “Hydrogen Generation Assemblies,” which is a continuation-in-part of now-deceased U.S. patent application No. 13/600,096, filed on August 30, 2012, and entitled “Hydrogen Generation Assemblies.” The entire disclosure of the foregoing application is hereby incorporated by reference for all purposes.
氫氣產生總成為一種將一或多種原料轉化成含有氫氣作為主要組份之產物流的總成。原料可包括含碳原料且在一些具體實例中,亦可包括水。將原料自原料遞送系統遞送至氫氣產生總成之氫氣產生區,其中典型地原料係在壓力及高溫下遞送。氫氣產生區通常與諸如加熱總成或冷卻總成之溫度調變總成相關聯,該氫氣產生區消耗一或多個燃料流以維持氫氣產生區在合適的溫度範圍內以有效地產生氫氣。氫氣產生總成可經由諸如蒸汽重組、自發性熱重組、熱解及/或催化部分氧化之任何合適機制產生氫氣。A hydrogen generation assembly is an assembly that converts one or more feedstocks into a product stream containing hydrogen as a primary component. The feedstocks may include carbonaceous feedstocks and, in some embodiments, may also include water. The feedstocks are delivered from a feedstock delivery system to a hydrogen generation zone of the hydrogen generation assembly, wherein the feedstocks are typically delivered under pressure and at elevated temperatures. The hydrogen generation zone is typically associated with a temperature conditioning assembly, such as a heating assembly or a cooling assembly, which consumes one or more fuel streams to maintain the hydrogen generation zone within a suitable temperature range to efficiently generate hydrogen. The hydrogen generation assembly may generate hydrogen by any suitable mechanism, such as steam reforming, spontaneous thermal reforming, pyrolysis, and/or catalytic partial oxidation.
然而,所產出或產生之氫氣可具有雜質。彼氣體可被稱作含有氫氣及其他氣體之混合氣流。在使用混合氣流之前,必須對該混合氣流進行淨化以便移除其他氣體的至少一部分。氫氣產生總成因此可包括用於增加混合氣流之氫氣純度的氫氣淨化裝置。氫氣淨化裝置可包括至少一個氫氣選擇性膜以將混合氣流分離成產物流及副產物流。產物流含有較大濃度之氫氣及/或來自混合氣流的較小濃度之一或多種其他氣體。使用一或多個氫氣選擇性膜進行之氫氣淨化為壓力驅動之分離製程,在該製程中,一或多個氫氣選擇性膜係含有在壓力容器中。混合氣流接觸膜之混合氣體表面,且產物流由穿過膜滲透之混合氣流的至少一部分形成。壓力容器典型地經密封以防止氣體進入或離開壓力容器,除了經由所界定之入口通口及出口通口或管道外。However, the hydrogen produced or generated may have impurities. That gas may be referred to as a mixed gas stream containing hydrogen and other gases. Before the mixed gas stream is used, it must be purified to remove at least a portion of the other gases. The hydrogen production assembly may therefore include a hydrogen purification device for increasing the hydrogen purity of the mixed gas stream. The hydrogen purification device may include at least one hydrogen selective membrane to separate the mixed gas stream into a product stream and a by-product stream. The product stream contains a larger concentration of hydrogen and/or a smaller concentration of one or more other gases from the mixed gas stream. Hydrogen purification using one or more hydrogen-selective membranes is a pressure-driven separation process in which the membranes are contained within a pressure vessel. A mixed gas stream contacts the mixed gas surface of the membranes, and a product stream is formed from at least a portion of the mixed gas stream that permeates through the membranes. The pressure vessel is typically sealed to prevent gas from entering or leaving the pressure vessel except through defined inlet and outlet ports or conduits.
產物流可用於各種應用中。一種此類應用為能量產生,諸如在電化學燃料電池中。電化學燃料電池為將燃料及氧化劑轉化成電、反應產物及熱之裝置。舉例而言,燃料電池可將氫氣及氧轉換成水及電。在彼等燃料電池中,氫氣為燃料,氧為氧化劑,且水為反應產物。燃料電池堆疊包括複數個燃料電池且可與氫氣產生總成一起使用以提供能量產生總成。The product stream can be used in a variety of applications. One such application is energy generation, such as in electrochemical fuel cells. Electrochemical fuel cells are devices that convert fuel and oxidants into electricity, reaction products, and heat. For example, fuel cells can convert hydrogen and oxygen into water and electricity. In these fuel cells, hydrogen is the fuel, oxygen is the oxidant, and water is the reaction product. A fuel cell stack comprises multiple fuel cells and can be used with a hydrogen generation assembly to provide an energy generation assembly.
氫氣產生總成、氫氣處理總成及/或彼等總成之組件的實例描述於以下各者中:美國專利第5,861,137號;第6,319,306號;第6,494,937號;第6,562,111號;第7,063,047號;第7,306,868號;第7,470,293號;第7,601,302號;第7,632,322號;第8,961,627號;及美國專利申請案公開案第2006/0090397號;第2006/0272212號;第2007/0266631號;第2007/0274904號;第2008/0085434號;第2008/0138678號;第2008/0230039號;及第2010/0064887號。以上專利及專利申請公開案之全部揭示內容出於所有目的特此以引用之方式併入。Examples of hydrogen generation assemblies, hydrogen processing assemblies, and/or components thereof are described in U.S. Patents Nos. 5,861,137; 6,319,306; 6,494,937; 6,562,111; 7,063,047; 7,306,868; 7,470,293; 7,601,302; 7,632,322; No. 8,961,627; and U.S. Patent Application Publication Nos. 2006/0090397; 2006/0272212; 2007/0266631; 2007/0274904; 2008/0085434; 2008/0138678; 2008/0230039; and 2010/0064887. The entire disclosures of the above patents and patent application publications are hereby incorporated by reference for all purposes.
本發明有關一種氫氣淨化裝置,其包含: 第一端框架及第二端框架,其包括: 一輸入通口,其經組態以接收含有氫氣及其他氣體之一混合氣流; 一輸出通口,其經組態以接收一滲透物流,該滲透物流相較於該混合氣流含有一較大濃度之氫氣及一較低濃度之該等其他氣體中的至少一者;及 一副產物通口,其經組態以接收含有該等其他氣體之至少一相當大部分的一副產物流; 至少一個箔微孔篩網總成,其安置於該第一端框架與該第二端框架之間且緊固至該第一端框架及該第二端框架,該至少一個箔微孔篩網總成包括: 至少一個氫氣選擇性膜,其具有一進料側及一滲透側,該滲透物流之至少部分由該混合氣流的自該進料側傳遞至該滲透側之部分形成,其中該混合氣流之剩餘在該進料側上之剩餘部分形成該副產物流的至少部分,及 包括一無孔平面薄片之至少一個微孔篩網結構,該無孔平面薄片具有形成複數個流體通路之複數個孔隙,該複數個孔隙中之每一孔隙具有界定一縱向軸線之一長度,該複數個孔隙以複數個列定位於該無孔平面薄片上,使得該複數個列中之每一列中的該複數個孔隙中之該等孔隙的該等縱向軸線(1)彼此平行且(2)不平行於該複數個列中之一鄰近列的該複數個孔隙中之該等孔隙的該等縱向軸線,該無孔平面薄片包括經組態以對該滲透側提供支撐之大體上相對的平面表面,該複數個流體通路在該等相對表面之間延伸,其中該至少一個氫氣選擇性膜以冶金方式接合至該至少一個微孔篩網結構;及 複數個框架,其安置於該第一端框架及該第二端框架與該至少一個箔微孔篩網總成之間且緊固至該第一端框架及該第二端框架,該複數個框架中之每一框架包括界定一開放區之一周邊殼層。 The present invention relates to a hydrogen purification device comprising: a first end frame and a second end frame, comprising: an input port configured to receive a mixed gas stream containing hydrogen and other gases; an output port configured to receive a permeate stream containing a greater concentration of hydrogen and a lower concentration of at least one of the other gases than the mixed gas stream; and a byproduct port configured to receive a byproduct stream containing at least a substantial portion of the other gases; at least one foil microporous screen assembly disposed between and secured to the first and second end frames, the at least one foil microporous screen assembly comprising: At least one hydrogen selective membrane having a feed side and a permeate side, the permeate stream being formed at least in part by a portion of the mixed gas stream passing from the feed side to the permeate side, wherein the remaining portion of the mixed gas stream on the feed side forms at least in part the by-product stream, and at least one microporous screen structure comprising a non-porous planar sheet having a plurality of pores forming a plurality of fluid passages, each of the plurality of pores having a length defining a longitudinal axis, the plurality of pores being positioned in a plurality of rows on the non-porous planar sheet such that the longitudinal axes of the plurality of pores in each of the plurality of rows are (1) aligned with each other. This is parallel and (2) not parallel to the longitudinal axes of the pores in an adjacent row of the plurality of rows, the non-porous planar sheet includes substantially opposing planar surfaces configured to provide support for the permeate side, the plurality of fluid passages extending between the opposing surfaces, wherein the at least one hydrogen selective membrane is metallurgically bonded to the at least one microporous screen structure; and a plurality of frames disposed between the first end frame and the second end frame and the at least one foil microporous screen assembly and secured to the first end frame and the second end frame, each of the plurality of frames including a peripheral shell defining an open area.
圖1展示氫氣產生總成20之實例。除非特定地排除,否則氫氣產生總成20可包括本發明中所述之其他氫氣產生總成之一或多個組件。氫氣產生總成可包括經組態以產生產物氫氣流21之任何合適結構。舉例而言,氫氣產生總成可包括原料遞送系統22及燃料處理總成24。原料遞送系統可包括經組態以選擇性遞送至少一個進料流26至燃料處理總成之任何合適結構。FIG1 shows an example of a hydrogen generation assembly 20. Unless specifically excluded, the hydrogen generation assembly 20 may include one or more components of other hydrogen generation assemblies described herein. The hydrogen generation assembly may include any suitable structure configured to generate a product hydrogen stream 21. For example, the hydrogen generation assembly may include a feedstock delivery system 22 and a fuel processing assembly 24. The feedstock delivery system may include any suitable structure configured to selectively deliver at least one feed stream 26 to the fuel processing assembly.
在一些具體實例中,原料遞送系統22可另外包括經組態以選擇性遞送至少一個燃料流28至燃料處理總成24之燃燒器或其他加熱總成的任何合適結構。在一些具體實例中,進料流26及燃料流28可為遞送至燃料處理總成之不同部分的相同流。原料遞送系統可包括任何合適之遞送機構,諸如用於推進流體流之正排量或其他合適之泵或機構。在一些具體實例中,原料遞送系統可經組態以在不需要使用泵及/或其他電動流體遞送機構之情況下遞送進料流26及/或燃料流28。可與氫氣產生總成20一起使用之合適的原料遞送系統之實例包括美國專利第7,470,293號及第7,601,302號以及美國專利申請公開案第2006/0090397號中所述之原料遞送系統。以上專利及專利申請案之全部揭示內容出於所有目的特此以引用之方式併入。In some embodiments, the feedstock delivery system 22 may further include any suitable structure configured to selectively deliver at least one fuel stream 28 to a burner or other heating assembly of the fuel processing assembly 24. In some embodiments, the feedstock stream 26 and the fuel stream 28 may be the same stream delivered to different portions of the fuel processing assembly. The feedstock delivery system may include any suitable delivery mechanism, such as a positive displacement or other suitable pump or mechanism for propelling the fluid stream. In some embodiments, the feedstock delivery system may be configured to deliver the feedstock stream 26 and/or the fuel stream 28 without the use of a pump and/or other electric fluid delivery mechanism. Examples of suitable feedstock delivery systems that can be used with the hydrogen generation assembly 20 include those described in U.S. Patent Nos. 7,470,293 and 7,601,302, and U.S. Patent Application Publication No. 2006/0090397. The entire disclosures of the above patents and patent applications are hereby incorporated by reference for all purposes.
進料流26可包括至少一種氫氣產生流體30,其可包括可用作用以產生產物氫氣流21之反應物的一或多種流體。舉例而言,氫氣產生流體可包括含碳原料,諸如至少一種烴及/或醇。合適烴之實例包括甲烷、丙烷、天然氣、柴油、煤油、汽油等。合適醇之實例包括甲醇、醇、多元醇(諸如乙二醇及丙二醇)等。另外,氫氣產生流體30可包括水,諸如當燃料處理總成經由蒸汽重組及/或自發性熱重組產生產物氫氣流時。當燃料處理總成24經由熱解或催化部分氧化產生產物氫氣流時,進料流26不含水。The feed stream 26 may include at least one hydrogen-producing fluid 30, which may include one or more fluids that can act as reactants to produce the product hydrogen stream 21. For example, the hydrogen-producing fluid may include a carbonaceous feedstock, such as at least one alkane and/or alcohol. Examples of suitable alkane include methane, propane, natural gas, diesel, kerosene, gasoline, etc. Examples of suitable alcohols include methanol, alcohols, polyols (such as ethylene glycol and propylene glycol), etc. In addition, the hydrogen-producing fluid 30 may include water, such as when the fuel processing assembly produces the product hydrogen stream through steam reforming and/or spontaneous thermal reforming. When the fuel processing assembly 24 produces the product hydrogen stream through pyrolysis or catalytic partial oxidation, the feed stream 26 does not contain water.
在一些具體實例中,原料遞送系統22可經組態以遞送含有水及可與水混溶之含碳原料(諸如甲醇及/或另一水溶性醇)之混合物的氫氣產生流體30。此類流體流中水與含碳原料之比率可根據諸如以下各者之一或多個因素發生變化:正使用之特定含碳原料、使用者偏好、燃料處理總成之設計、由燃料處理總成使用以產生產物氫氣流的機構等。舉例而言,水與碳之莫耳比可為約1:1至3:1。另外,水與甲醇之混合物可以1:1或接近1:1之莫耳比(37重量%水,63重量%甲醇)遞送,而烴或其他醇之混合物可以大於1:1之水與碳之莫耳比遞送。In some embodiments, the feedstock delivery system 22 can be configured to deliver a hydrogen production fluid 30 comprising a mixture of water and a water-miscible carbonaceous feedstock (e.g., methanol and/or another water-soluble alcohol). The ratio of water to carbonaceous feedstock in such a fluid stream can vary depending on one or more of the following factors: the specific carbonaceous feedstock being used, user preferences, the design of the fuel processing assembly, the mechanisms used by the fuel processing assembly to generate the product hydrogen stream, etc. For example, the molar ratio of water to carbon can be approximately 1:1 to 3:1. Alternatively, a mixture of water and methanol can be delivered at a molar ratio of 1:1 or near 1:1 (37 wt. % water, 63 wt. % methanol), while mixtures of hydrocarbons or other alcohols can be delivered at a molar ratio of water to carbon greater than 1:1.
當燃料處理總成24經由重組產生產物氫氣流21時,進料流26可包括例如約25至75體積%甲醇或乙醇(或另一合適的水可混溶性含碳原料)及約25至75體積%水。對於至少實質上包括甲醇及水之進料流,彼等流可包括約50至75體積%甲醇及約25至50體積%水。含有乙醇或其他水可混溶性醇之流可含有約25至60體積%醇及約40至75體積%水。用於利用蒸汽重組或自發性熱重組之氫氣產生總成20的進料流之實例含有69體積%甲醇及31體積%水。When the fuel processing assembly 24 produces a product hydrogen stream 21 through reforming, the feed stream 26 may comprise, for example, approximately 25 to 75 volume percent methanol or ethanol (or another suitable water-miscible carbonaceous feedstock) and approximately 25 to 75 volume percent water. For feed streams comprising at least substantially methanol and water, such streams may comprise approximately 50 to 75 volume percent methanol and approximately 25 to 50 volume percent water. Streams containing ethanol or other water-miscible alcohols may contain approximately 25 to 60 volume percent alcohol and approximately 40 to 75 volume percent water. An example feed stream for a hydrogen generation assembly 20 utilizing steam reforming or spontaneous thermal reforming contains 69 volume percent methanol and 31 volume percent water.
雖然原料遞送系統22展示為經組態以遞送單一進料流26,但該原料遞送系統可經組態以遞送兩個或多於兩個進料流26。彼等流可含有相同或不同原料且可具有不同組成(至少一種常見組份、不常見組份)或相同組成。舉例而言,第一進料流可包括第一組份,諸如含碳原料;且第二進料流可包括第二組份,諸如水。另外,雖然原料遞送系統22在一些具體實例中可經組態以遞送單一燃料流28,但該原料遞送系統可經組態以遞送兩種或多於兩種燃料流。燃料流可具有不同組成(至少一種常見組份、不常見組份)或相同組成。另外,進料流及燃料流可在不同階段自原料遞送系統排出。舉例而言,該等流中之一者可為液流,而其他流為氣流。在一些具體實例中,兩個流均可為液流;而在其他具體實例中,兩個流均可為氣流。另外,雖然氫氣產生總成20展示為包括單一原料遞送系統22,但該氫氣產生總成可包括兩個或多於兩個原料遞送系統22。Although feedstock delivery system 22 is shown as being configured to deliver a single feed stream 26, the feedstock delivery system can be configured to deliver two or more feed streams 26. These streams can contain the same or different feedstocks and can have different compositions (at least one common component, an uncommon component) or the same composition. For example, a first feed stream can include a first component, such as a carbonaceous feedstock, and a second feed stream can include a second component, such as water. Additionally, although feedstock delivery system 22 can be configured to deliver a single fuel stream 28 in some embodiments, the feedstock delivery system can be configured to deliver two or more fuel streams. The fuel streams can have different compositions (at least one common component, an uncommon component) or the same composition. Additionally, the feed stream and fuel stream may be discharged from the feedstock delivery system at different stages. For example, one of these streams may be a liquid stream, while the other may be a gas stream. In some embodiments, both streams may be liquid streams, while in other embodiments, both streams may be gas streams. Furthermore, while the hydrogen generation assembly 20 is shown as including a single feedstock delivery system 22, the hydrogen generation assembly may include two or more feedstock delivery systems 22.
燃料處理總成24可包括氫氣產生區32,其經組態以經由任何合適之氫氣產生機制產生含有氫氣的輸出流34。輸出流可包括氫氣作為至少大部分組份且可包括額外的氣體組份。輸出流34因此可被稱作含有氫氣作為其大部分組份但包括其他氣體之「混合氣流(mixed gas stream)」。The fuel processing assembly 24 may include a hydrogen generation zone 32 configured to generate an output stream 34 containing hydrogen via any suitable hydrogen generation mechanism. The output stream may include hydrogen as at least a majority component and may include additional gaseous components. The output stream 34 may therefore be referred to as a "mixed gas stream" containing hydrogen as its majority component but including other gases.
氫氣產生區32可包括任何合適的含催化劑之床或區。當氫氣產生機制為蒸汽重組時,氫氣產生區可包括合適的蒸汽重組催化劑36以促進自含有含碳原料及水之進料流26產生輸出流34。在此類具體實例中,燃料處理總成24可被稱作「蒸汽重組器(steam reformer)」,氫氣產生區32可被稱作「重組區(reforming region)」,且輸出流34可被稱作「重組物流(reformate stream)」。可存在於重組物流中之其他氣體可包括一氧化碳、二氧化碳、甲烷、蒸汽及/或未反應的含碳原料。The hydrogen generation zone 32 may include any suitable catalyst-containing bed or zone. When the hydrogen generation mechanism is steam reforming, the hydrogen generation zone may include a suitable steam reforming catalyst 36 to facilitate the production of an output stream 34 from the feed stream 26 comprising the carbonaceous feedstock and water. In such embodiments, the fuel processing assembly 24 may be referred to as a "steam reformer," the hydrogen generation zone 32 may be referred to as a "reforming region," and the output stream 34 may be referred to as a "reformate stream." Other gases that may be present in the reformate stream may include carbon monoxide, carbon dioxide, methane, steam, and/or unreacted carbonaceous feedstock.
當氫氣產生機制為自發性熱重組時,氫氣產生區32可包括合適的自發性熱重組催化劑以促進在空氣存在下自含有水及含碳原料之進料流26產生輸出流34。另外,燃料處理總成24可包括空氣遞送總成38,其經組態以遞送空氣流至氫氣產生區。When the hydrogen generation mechanism is spontaneous thermal recombination, the hydrogen generation zone 32 may include a suitable spontaneous thermal recombination catalyst to promote the production of an output stream 34 from the feed stream 26 containing water and a carbonaceous feedstock in the presence of air. Additionally, the fuel processing assembly 24 may include an air delivery assembly 38 configured to deliver an air stream to the hydrogen generation zone.
在一些具體實例中,燃料處理總成24可包括淨化(或分離)區40,其可包括經組態以自輸出(或混合氣)流34產生至少一個富氫氣流42之任何合適的結構。富氫氣流42可包括相較於輸出流34較大的氫氣濃度及/或存在於彼輸出流中的較低濃度之一或多種其他氣體(或雜質)。產物氫氣流21包括富氫氣流42之至少一部分。因此,產物氫氣流21及富氫氣流42可為同一流且具有相同組成及流動速率。替代地,富氫氣流42中之經淨化之氫氣中的一些可儲存在諸如合適之氫氣儲存總成中以供隨後使用及/或由燃料處理總成消耗。淨化區40亦可被稱作「氫氣淨化裝置(hydrogen purification device)」或「氫氣處理總成(hydrogen processing assembly)」。In some embodiments, the fuel processing assembly 24 may include a purification (or separation) section 40, which may include any suitable structure configured to generate at least one hydrogen-enriched gas stream 42 from the output (or mixed gas) stream 34. The hydrogen-enriched gas stream 42 may include a greater hydrogen concentration than the output stream 34 and/or a lower concentration of one or more other gases (or impurities) present in the output stream. The product hydrogen stream 21 includes at least a portion of the hydrogen-enriched gas stream 42. Thus, the product hydrogen stream 21 and the hydrogen-enriched gas stream 42 may be the same stream and have the same composition and flow rate. Alternatively, some of the purified hydrogen in the hydrogen-rich gas stream 42 may be stored, for example, in a suitable hydrogen storage assembly for subsequent use and/or consumed by a fuel processing assembly. The purification section 40 may also be referred to as a "hydrogen purification device" or a "hydrogen processing assembly."
在一些具體實例中,淨化區40可產生至少一種副產物流44,其可不含氫氣或含有一些氫氣。副產物流可排出、傳送至燃燒器總成及/或其他燃燒源、用作經加熱之流體流、經儲存以供隨後使用,及/或以其他方式利用、儲存及/或安置。另外,淨化區40可以回應於輸出流34之遞送發射作為連續流的副產物流,或可間歇地發射該流,諸如在分批法中或當輸出流之副產物部分至少暫時保留在淨化區中時。In some embodiments, the purification zone 40 can produce at least one by-product stream 44, which can be free of hydrogen or contain some hydrogen. The by-product stream can be discharged, transferred to a burner assembly and/or other combustion source, used as a heated fluid stream, stored for subsequent use, and/or otherwise utilized, stored, and/or disposed of. In addition, the purification zone 40 can emit the by-product stream as a continuous stream in response to delivery of the output stream 34, or can emit the stream intermittently, such as in a batch process or when the by-product portion of the output stream is at least temporarily retained in the purification zone.
燃料處理總成24可包括一或多個淨化區,其經組態以產生含有足夠量氫氣之一或多個副產物流以適用作燃料處理總成之加熱總成的燃料流(或原料流)。在一些具體實例中,副產物流可具有足夠的燃燒值或氫氣含量以使得加熱總成能夠將氫氣產生區維持於所需操作溫度下或所選溫度範圍內。舉例而言,副產物流可包括氫氣,諸如10至30體積%氫氣、15至25體積%氫氣、20至30體積%氫氣、至少10或15體積%氫氣、至少20體積%氫氣等。The fuel processing assembly 24 may include one or more purification zones configured to produce one or more byproduct streams containing sufficient hydrogen to be suitable for use as a fuel stream (or feed stream) for a heating assembly of the fuel processing assembly. In some embodiments, the byproduct streams may have a sufficient flammability or hydrogen content to enable the heating assembly to maintain the hydrogen generation zone at a desired operating temperature or within a selected temperature range. For example, the byproduct streams may include hydrogen at 10 to 30% hydrogen by volume, 15 to 25% hydrogen by volume, 20 to 30% hydrogen by volume, at least 10 or 15% hydrogen by volume, at least 20% hydrogen by volume, etc.
淨化區40可包括任何合適結構,其經組態以使輸出流21之至少一個組份之濃度富集(及/或增大)。在大部分應用中,富氫氣流42將具有相較於輸出流(或混合氣流)34較大之氫氣濃度。富氫氣流亦可具有存在於輸出流34中之減小濃度的一或多種非氫氣組份,其中富氫氣流之氫氣濃度大於、相同或小於輸出流的氫氣濃度。舉例而言,在習知燃料電池系統中,若存在一氧化碳,即使以百萬分之幾存在,其仍可損壞燃料電池堆疊;而可存在於輸出流34中之諸如水之其他非氫氣組份將不會損壞該堆疊,即使以大得多之濃度存在亦不會。因此,在此類應用中,淨化區可不增加整體氫氣濃度,但將減小對產物氫氣流之所需應用有害或可能有害之一或多種非氫氣組份的濃度。The purification zone 40 may include any suitable structure configured to enrich (and/or increase) the concentration of at least one component of the output stream 21. In most applications, the hydrogen-enriched gas stream 42 will have a greater hydrogen concentration than the output stream (or mixed gas stream) 34. The hydrogen-enriched gas stream may also have a reduced concentration of one or more non-hydrogen components present in the output stream 34, wherein the hydrogen concentration of the hydrogen-enriched gas stream is greater than, the same as, or less than the hydrogen concentration of the output stream. For example, in conventional fuel cell systems, carbon monoxide, if present even at a few parts per million, can damage the fuel cell stack, whereas other non-hydrogen components such as water that may be present in the output stream 34 will not damage the stack, even at much greater concentrations. Thus, in such applications, the purification zone may not increase the overall hydrogen concentration, but will reduce the concentration of one or more non-hydrogen components that are harmful or potentially harmful to the desired application of the product hydrogen stream.
淨化區40之合適裝置之實例包括一或多種氫氣選擇性膜46、化學一氧化碳移除總成48及/或變壓吸附(pressure swing adsorption;PSA)系統50。淨化區40可包括多於一種類型之淨化裝置,且裝置可具有相同或不同結構及/或由相同或不同機構操作。燃料處理總成24可在淨化區下游包括至少一個約束性孔及/或其他流量限制器,諸如與一或多個產物氫氣流、富氫氣流及/或副產物流相關聯的約束性孔及/或其他流量限制器。Examples of suitable devices for the purification zone 40 include one or more hydrogen-selective membranes 46, a chemical carbon monoxide removal assembly 48, and/or a pressure swing adsorption (PSA) system 50. The purification zone 40 may include more than one type of purification device, and the devices may have the same or different structures and/or be operated by the same or different mechanisms. The fuel processing assembly 24 may include at least one restrictive orifice and/or other flow restrictor downstream of the purification zone, such as a restrictive orifice and/or other flow restrictor associated with one or more product hydrogen streams, a hydrogen-enriched gas stream, and/or a by-product stream.
氫氣選擇性膜46可對於氫氣可滲透,但對於輸出流34之其他組份至少實質上(若不完全)不可滲透。膜46可由適用於操作淨化區40之操作環境及參數之任何氫氣可滲透材料形成。用於膜46之合適材料的實例包括鈀及鈀合金,且尤其是此類金屬及金屬合金之薄膜。鈀合金已證實為特別有效,尤其是具有35重量%至45重量%銅的鈀。含有約40重量%銅之鈀-銅合金已證實為特別有效,但可使用其他相對濃度及組份。三種其他尤其有效之合金為具有2 wt%至20 wt%金之鈀,尤其是具有5 wt%金之鈀;具有3 wt%至10 wt%銦加上0 wt%至10 wt%釕之鈀,尤其是具有6 wt%銦加0.5 wt%釕之鈀;及具有20 wt%至30 wt%銀的鈀。當使用鈀及鈀合金時,氫氣選擇性膜46有時可被稱作「箔(foil)」。氫氣可滲透金屬箔之典型厚度小於25微米(micron、micormeter),較佳地小於或等於15微米,且最佳地介於5與12微米之間。箔可為任何合適大小,諸如110 mm乘以270 mm。The hydrogen-selective membrane 46 can be permeable to hydrogen but at least substantially, if not completely, impermeable to other components of the output stream 34. The membrane 46 can be formed of any hydrogen-permeable material suitable for the operating environment and parameters of the purification zone 40. Examples of suitable materials for the membrane 46 include palladium and palladium alloys, and in particular thin films of such metals and metal alloys. Palladium alloys have proven particularly effective, particularly palladium having 35% to 45% by weight copper. Palladium-copper alloys containing approximately 40% by weight copper have proven particularly effective, but other relative concentrations and compositions may be used. Three other particularly effective alloys are palladium with 2 to 20 wt% gold, particularly palladium with 5 wt% gold; palladium with 3 to 10 wt% indium plus 0 to 10 wt% ruthenium, particularly palladium with 6 wt% indium plus 0.5 wt% ruthenium; and palladium with 20 to 30 wt% silver. When palladium and palladium alloys are used, the hydrogen-selective membrane 46 is sometimes referred to as a "foil." Typical thicknesses of hydrogen-permeable metal foils are less than 25 micrometers, preferably less than or equal to 15 micrometers, and most preferably between 5 and 12 micrometers. The foil can be any suitable size, such as 110 mm by 270 mm.
化學一氧化碳移除總成48為使輸出流34之一氧化碳及/或其他不合需要之組份起化學反應以形成潛在無害之其他組成的裝置。化學一氧化碳移除總成之實例包括:經組態以自水及一氧化碳產生氫氣及二氧化碳的水煤氣轉化反應器;經組態以將一氧化碳及氧(通常來自空氣)轉化成二氧化碳的部分氧化反應器;及經組態以將一氧化碳及氫氣轉化成甲烷及水之甲烷化反應器。燃料處理總成24可包括多於一種類型及/或多於一個化學移除總成48。Chemical carbon monoxide removal assembly 48 is a device that chemically reacts carbon monoxide and/or other undesirable components in output stream 34 to form other potentially harmless components. Examples of chemical carbon monoxide removal assemblies include: a water-gas shift reactor configured to produce hydrogen and carbon dioxide from water and carbon monoxide; a partial oxidation reactor configured to convert carbon monoxide and oxygen (typically from air) into carbon dioxide; and a methanation reactor configured to convert carbon monoxide and hydrogen into methane and water. Fuel processing assembly 24 may include more than one type and/or more than one chemical removal assembly 48.
變壓吸附(PSA)為氣態雜質基於如下原理自輸出流34移除的化學製程:某些氣體在恰當的溫度及壓力條件下相較於其他氣體將被更強地吸附於吸附材料上。典型地,非氫氣雜質經吸附且自輸出流34移除。雜質氣體之吸附發生於高壓下。當壓力經減小時,雜質自吸附材料解除吸附,因此使吸附材料再生。典型地,PSA為循環製程且需要至少兩個床用於連續(相對於分批)操作。可用於吸附床中之合適的吸附材料之實例為活性碳及沸石。PSA系統50亦提供用於淨化區40中之裝置的實例,在該淨化區中,副產物或經移除組份並不作為氣流與輸出流之淨化並行地自區排出。實情為,此等副產物組份在吸附材料經再生或以其他方式自淨化區移除時被移除。Pressure swing adsorption (PSA) is a chemical process that removes gaseous impurities from the output stream 34 based on the principle that certain gases, under appropriate temperature and pressure conditions, are more strongly adsorbed onto an adsorbent material than others. Typically, non-hydrogen impurities are adsorbed and removed from the output stream 34. Adsorption of the impurity gas occurs under high pressure. As the pressure is reduced, the impurities are desorbed from the adsorbent material, thereby regenerating the adsorbent material. PSA is typically a cyclic process and requires at least two beds for continuous (as opposed to batch) operation. Examples of suitable adsorbent materials that can be used in the adsorption beds are activated carbon and zeolites. The PSA system 50 also provides an example of an apparatus for use in the purification zone 40 in which byproducts or removed components are not discharged from the zone as a gas stream concurrently with the purification of the output stream. Rather, these byproduct components are removed when the adsorbent material is regenerated or otherwise removed from the purification zone.
在圖1中,淨化區40展示為在燃料處理總成24內。淨化區可替代性地分離地定位在燃料處理總成下游,如圖1中之點劃線示意性地圖示。淨化區40亦可包括在燃料處理總成內部及外部之部分。In Figure 1, the purge zone 40 is shown within the fuel processing assembly 24. The purge zone may alternatively be located separately downstream of the fuel processing assembly, as schematically illustrated by the dotted lines in Figure 1. The purge zone 40 may also include portions both internal and external to the fuel processing assembly.
燃料處理總成24亦可包括呈加熱總成52形式之溫度調變總成。加熱總成可經組態以自至少一個加熱燃料流28產生至少一個經加熱之排出流(或燃燒流)54,典型地在空氣存在下燃燒時。經加熱之排出流54在圖1中示意性地圖示為加熱氫氣產生區32。加熱總成52可包括經組態以產生經加熱之排出流之任何合適結構,諸如與空氣一起燃燒燃料以產生經加熱之排出流的燃燒器或燃燒催化劑。加熱總成可包括點火器或點火源58,其經組態以起始燃料燃燒。合適點火源之實例包括一或多個火花塞、預熱塞、燃燒催化劑、指示燈、壓電點火器、火花點火器、熱表面點火器等。The fuel processing assembly 24 may also include a temperature conditioning assembly in the form of a heating assembly 52. The heating assembly may be configured to generate at least one heated exhaust stream (or combustion stream) 54 from at least one heated fuel stream 28, typically when combusted in the presence of air. The heated exhaust stream 54 is schematically illustrated in FIG1 as a heated hydrogen generation zone 32. The heating assembly 52 may include any suitable structure configured to generate a heated exhaust stream, such as a burner or combustion catalyst that combusts a fuel with air to generate the heated exhaust stream. The heating assembly may include an igniter or ignition source 58 configured to initiate combustion of the fuel. Examples of suitable ignition sources include one or more spark plugs, glow plugs, combustion catalysts, indicator lights, piezoelectric igniters, spark igniters, hot surface igniters, and the like.
在一些具體實例中,加熱總成52可包括燃燒器總成60且可被稱作基於燃燒或燃燒驅動之加熱總成。在基於燃燒之加熱總成中,加熱總成52可經組態以接收至少一個燃料流28且在空氣存在下燃燒燃料流以提供熱的燃燒流54,該熱的燃燒流可用於加熱至少燃料處理總成之氫氣產生區。可經由各種機構將空氣遞送至加熱總成。舉例而言,空氣流62可作為分離流遞送至加熱總成,如圖1所示。替代地或另外,空氣流62可與加熱總成52之燃料流28中之至少一者一起遞送至加熱總成及/或自利用加熱總成之環境抽取。In some embodiments, the heating assembly 52 may include a burner assembly 60 and may be referred to as a combustion-based or combustion-driven heating assembly. In a combustion-based heating assembly, the heating assembly 52 may be configured to receive at least one fuel stream 28 and combust the fuel stream in the presence of air to provide a hot combustion stream 54 that can be used to heat at least a hydrogen generation zone of the fuel processing assembly. Air can be delivered to the heating assembly via various mechanisms. For example, the air stream 62 can be delivered to the heating assembly as a separate stream, as shown in FIG1 . Alternatively or in addition, the air stream 62 can be delivered to the heating assembly along with at least one of the fuel streams 28 of the heating assembly 52 and/or drawn from the environment in which the heating assembly is utilized.
另外或替代地,可使用燃燒流54來加熱使用加熱總成之燃料處理總成及/或燃料電池系統之其他部分。另外,可使用加熱總成52之其他組態及類型。舉例而言,加熱總成52可為電動加熱總成,其經組態以藉由使用至少一個諸如電阻加熱元件之加熱元件產生熱來加熱至少燃料處理總成24之氫氣產生區32。在彼等具體實例中,加熱總成52可不接收且不燃燒可燃燃料流來將氫氣產生區加熱至合適的氫氣產生溫度。加熱總成之實例揭示於美國專利第7,632,322號中,其全部揭示內容出於所有目的特此以引用之方式併入本文中。Additionally or alternatively, the combustion stream 54 may be used to heat other portions of the fuel processing assembly and/or fuel cell system that utilize the heating assembly. Additionally, other configurations and types of heating assemblies 52 may be used. For example, the heating assembly 52 may be an electric heating assembly that is configured to heat at least the hydrogen generation region 32 of the fuel processing assembly 24 by generating heat using at least one heating element, such as a resistive heating element. In such specific examples, the heating assembly 52 may not receive and combust a combustible fuel stream to heat the hydrogen generation region to a suitable hydrogen generation temperature. Examples of heating assemblies are disclosed in U.S. Patent No. 7,632,322, the entire disclosure of which is hereby incorporated herein by reference for all purposes.
加熱總成52可容納在具有氫氣產生區及/或分離區(如下文進一步論述)之常見殼層或外殼中。加熱總成可相對於氫氣產生區32分離地定位但與彼區熱及/或流體連通以提供至少氫氣產生區之所需加熱。加熱總成52可部分或完全位於常見殼層內,及/或至少一部分(或所有)加熱總成可位於彼殼層外。當加熱總成位於殼層外部時,來自燃燒器總成60之熱燃燒氣體可經由合適之熱傳遞管道遞送至該殼層內之一或多個組件。The heating assembly 52 can be housed within a conventional housing or enclosure having a hydrogen generation zone and/or a separate zone (as discussed further below). The heating assembly can be positioned separately from the hydrogen generation zone 32 but in thermal and/or fluid communication therewith to provide the necessary heating of at least the hydrogen generation zone. The heating assembly 52 can be partially or completely within the conventional housing, and/or at least a portion (or all) of the heating assembly can be located outside the housing. When the heating assembly is located outside the housing, hot combustion gases from the burner assembly 60 can be delivered to one or more components within the housing via appropriate heat transfer conduits.
加熱總成亦可經組態以加熱原料遞送系統22、原料供應流、氫氣產生區32、淨化(或分離)區40或彼等系統、流及區之任何合適之組合。原料供應流之加熱可包括蒸發用於在氫氣產生區中產生氫氣之氫氣產生流體的液體反應物流或組份。在彼具體實例中,燃料處理總成24可描述為包括汽化區64。加熱總成可另外經組態以加熱氫氣產生總成之其他組件。舉例而言,經加熱之排出流可經組態以加熱壓力容器及/或其他罐,該壓力容器及/或其他罐含有形成進料流26及燃料流28之至少數個部分的加熱燃料及/或氫氣產生流體。The heating assembly may also be configured to heat the feedstock delivery system 22, the feedstock supply stream, the hydrogen generation zone 32, the purification (or separation) zone 40, or any suitable combination of such systems, streams, and zones. Heating of the feedstock supply stream may include evaporating a liquid reactant stream or component of a hydrogen generation fluid used to generate hydrogen in the hydrogen generation zone. In that specific example, the fuel processing assembly 24 may be described as including a vaporization zone 64. The heating assembly may additionally be configured to heat other components of the hydrogen generation assembly. For example, the heated exhaust stream may be configured to heat a pressure vessel and/or other tank containing heated fuel and/or hydrogen generation fluid that forms at least some portion of the feed stream 26 and the fuel stream 28.
加熱總成52可在氫氣產生區32中達成及/或維持任何合適溫度。蒸汽重組器典型地在200℃與900℃範圍內之溫度下操作。然而,超出此範圍之溫度在本發明之範疇內。當含碳原料為甲醇時,蒸汽重組反應將典型地在約200℃至500℃之溫度範圍內操作。該範圍之實例子集包括350至450℃、375至425℃及375至400℃。當含碳原料為烴、乙醇或另一醇時,約400至900℃之溫度範圍將典型地用於蒸汽重組反應。該範圍之例示性子集包括750至850℃、725至825℃、650至750℃、700至800℃、700至900℃、500至800℃、400至600℃及600至800℃。氫氣產生區32可包括兩個或多於兩個區域或部分,該等區域或區各自可在相同或不同溫度下操作。舉例而言,當氫氣產生流體包括烴時,氫氣產生區32可包括兩個不同的氫氣產生部分或區,其中一個氫氣產生部分或區在比另一個氫氣產生部分或區低之溫度下操作以提供預重組區。在彼等具體實例中,燃料處理總成亦可被稱作包括兩個或多於兩個氫氣產生區。The heating assembly 52 can achieve and/or maintain any suitable temperature in the hydrogen production zone 32. Steam reformers typically operate at temperatures in the range of 200°C and 900°C. However, temperatures outside this range are within the scope of the present invention. When the carbon-containing feedstock is methanol, the steam reforming reaction will typically operate in a temperature range of about 200°C to 500°C. Examples of such ranges include 350 to 450°C, 375 to 425°C, and 375 to 400°C. When the carbon-containing feedstock is hydrocarbons, ethanol, or another alcohol, a temperature range of about 400 to 900°C will typically be used for the steam reforming reaction. Exemplary subsets of this range include 750-850°C, 725-825°C, 650-750°C, 700-800°C, 700-900°C, 500-800°C, 400-600°C, and 600-800°C. The hydrogen production zone 32 may include two or more regions or sections, each of which may operate at the same or different temperatures. For example, when the hydrogen producing fluid includes hydrocarbons, the hydrogen production zone 32 may include two different hydrogen production sections or zones, one of which operates at a lower temperature than the other to provide a pre-reforming zone. In these specific examples, the fuel processing assembly may also be referred to as including two or more hydrogen production zones.
燃料流28可包括適用於藉由加熱總成52消耗以提供所需熱輸出之任何可燃液體及/或氣體。一些燃料流在遞送且藉由加熱總成52燃燒時可為氣體,而其他燃料流可以液流形式遞送至加熱總成。燃料流28之合適加熱燃料的實例包括含碳原料,諸如甲醇、甲烷、乙烷、乙醇、乙烯、丙烷、丙烯、丁烷等。額外實例包括低分子量可冷凝燃料,諸如液化石油氣、氨、輕質胺、二甲醚及低分子量烴。又其他實例包括氫氣及一氧化碳。在包括呈冷卻總成而非加熱總成之形式的溫度調變總成(諸如在發熱氫氣產生製程例如部分氧化經利用而非諸如蒸汽重組之吸熱製程經利用時可使用)之氫氣產生總成20的具體實例中,原料遞送系統可經組態以供應燃料或冷卻劑流至總成。可使用任何合適的燃料或冷卻劑流體。Fuel stream 28 can include any flammable liquid and/or gas suitable for consumption by heating assembly 52 to provide the desired heat output. Some fuel streams can be gases when delivered and combusted by heating assembly 52, while other fuel streams can be delivered to the heating assembly as liquid streams. Examples of suitable heating fuels for fuel stream 28 include carbonaceous feedstocks such as methanol, methane, ethane, ethanol, ethylene, propane, propylene, butane, and the like. Additional examples include low molecular weight condensable fuels such as liquefied petroleum gas, ammonia, light amines, dimethyl ether, and low molecular weight hydrocarbons. Still other examples include hydrogen and carbon monoxide. In embodiments of the hydrogen generation assembly 20 that include a temperature-modulating assembly in the form of a cooling assembly rather than a heating assembly (such as may be used when an exothermic hydrogen generation process, such as partial oxidation, is utilized rather than an endothermic process, such as steam reforming), the feedstock delivery system may be configured to supply a fuel or coolant stream to the assembly. Any suitable fuel or coolant fluid may be used.
燃料處理總成24可另外包括殼層或外殼66,在該殼層或外殼中含有至少氫氣產生區32,如圖1所示。在一些具體實例中,汽化區64及/或淨化區40可另外含有於該殼層內。殼層66可使蒸汽重組器或其他燃料處理機構之組件能夠作為一單元移動。殼層亦可藉由提供保護性封裝來保護燃料處理總成之組件免遭損壞及/或可降低燃料處理總成之加熱需求,此係因為組件可作為一單元加熱。殼層66可包括絕緣材料68,諸如固態絕緣材料、毯覆式絕緣材料及/或空氣填充腔。絕緣材料可在殼層內部、在殼層外部或既在殼層內部亦在殼層外部。當絕緣材料在殼層外部時,燃料處理總成24可在絕緣材料外部進一步包括外部封皮或護套70,如圖1中示意性地圖示。燃料處理總成可包括不同殼層,該殼層包括燃料處理總成之額外組件,諸如原料遞送系統22及/或其他組件。The fuel processing assembly 24 may further include a shell or housing 66 containing at least the hydrogen generation zone 32, as shown in FIG1 . In some embodiments, the vaporization zone 64 and/or the purge zone 40 may also be contained within the shell. The shell 66 may enable the components of the steam reformer or other fuel processing mechanism to be moved as a unit. The shell may also protect the components of the fuel processing assembly from damage by providing a protective enclosure and/or may reduce the heating requirements of the fuel processing assembly because the components can be heated as a unit. The shell 66 may include an insulating material 68, such as a solid insulating material, a blanket insulating material, and/or an air-filled cavity. The insulating material may be inside the shell, outside the shell, or both. When the insulating material is outside the shell, the fuel processing assembly 24 may further include an outer cover or jacket 70 outside the insulating material, as schematically illustrated in FIG1 . The fuel processing assembly may include different shells that include additional components of the fuel processing assembly, such as the feedstock delivery system 22 and/or other components.
燃料處理總成24之一或多個組件可延伸超出殼層或位於殼體外部。舉例而言,可使淨化區40位於在殼層66外部,諸如與殼層間隔開但藉由合適流體傳遞管道流體連通。作為另一實例,氫氣產生區32之一部分(諸如一或多個重組催化劑床之部分)可延伸超出殼層,諸如在圖1中用表示替代性殼層組態之虛線示意性地指示。合適氫氣產生總成及其組件之實例揭示於美國專利第5,861,137號、第5,997,594號及第6,221,117號中,此等專利之全部揭示內容出於所有目的特此以引用之方式併入。One or more components of the fuel processing assembly 24 may extend beyond the housing or be located externally of the housing. For example, the purge zone 40 may be located externally of the housing 66, e.g., spaced apart from the housing but in fluid communication with it via suitable fluid transfer conduits. As another example, a portion of the hydrogen generation zone 32 (e.g., a portion of one or more reforming catalyst beds) may extend beyond the housing, as schematically indicated in FIG1 by the dashed lines representing an alternative housing configuration. Examples of suitable hydrogen generation assemblies and components thereof are disclosed in U.S. Patent Nos. 5,861,137, 5,997,594, and 6,221,117, the entire disclosures of which are hereby incorporated by reference for all purposes.
氫氣產生總成20之另一實例展示於圖2中,且通常以72表示。除非特定地排除,否則氫氣產生總成72可包括氫氣產生總成20之一或多個組件。氫氣產生總成72可包括原料遞送系統74、汽化區76、氫氣產生區78及加熱總成80,如圖2中所示。在一些具體實例中,氫氣產生總成20亦可包括淨化區82。Another example of a hydrogen generation assembly 20 is shown in FIG2 and generally designated 72. Unless specifically excluded, the hydrogen generation assembly 72 may include one or more components of the hydrogen generation assembly 20. The hydrogen generation assembly 72 may include a feedstock delivery system 74, a vaporization region 76, a hydrogen generation region 78, and a heating assembly 80, as shown in FIG2 . In some embodiments, the hydrogen generation assembly 20 may also include a purification region 82.
原料遞送系統可包括經組態以遞送一或多個進料及/或燃料流至氫氣產生總成之一或多個其他組件的任何合適結構。舉例而言,原料遞送系統可包括原料槽(或容器)84及泵86。原料槽可含有任何合適的氫氣產生流體88,諸如水及含碳原料(例如甲醇/水混合物)。泵86可具有經組態以遞送氫氣產生流體至汽化區76及/或氫氣產生區78之任何合適的結構,該氫氣產生流體可呈包括水及含碳原料之含有至少一種液體之進料流90的形式。The feedstock delivery system may include any suitable structure configured to deliver one or more feed and/or fuel streams to one or more other components of the hydrogen generation assembly. For example, the feedstock delivery system may include a feedstock tank (or container) 84 and a pump 86. The feedstock tank may contain any suitable hydrogen generation fluid 88, such as water and a carbonaceous feedstock (e.g., a methanol/water mixture). The pump 86 may have any suitable structure configured to deliver the hydrogen generation fluid, which may be in the form of a feed stream 90 containing at least one liquid, including water and a carbonaceous feedstock, to the vaporization zone 76 and/or the hydrogen generation zone 78.
汽化區76可包括經組態以接收且汽化含液體進料流(諸如含液體進料流90)之至少一部分的任何合適結構。舉例而言,汽化區76可包括汽化器92,其經組態以將含液體進料流90至少部分轉換成一或多個氣相進料流94。氣相進料流在一些具體實例中可包括液體。合適汽化器之實例為盤管汽化器,諸如不鏽鋼盤管。The vaporization region 76 can include any suitable structure configured to receive and vaporize at least a portion of a liquid-containing feed stream, such as liquid-containing feed stream 90. For example, the vaporization region 76 can include a vaporizer 92 configured to convert at least a portion of the liquid-containing feed stream 90 into one or more vapor-phase feed streams 94. In some embodiments, the vapor-phase feed stream can include a liquid. An example of a suitable vaporizer is a coil vaporizer, such as a stainless steel coil.
氫氣產生區78可包括經組態以接收一或多個進料流(諸如來自汽化區之氣相進料流94)從而產生一或多個輸出流96的任何合適結構,該一或多個輸出流含有作為大部分組份之氫氣以及其他氣體。氫氣產生區可經由任何合適機構產生輸出流。舉例而言,氫氣產生區78可經由蒸汽重組反應產生輸出流96。在彼例中,氫氣產生區78可包括具有重組催化劑98之蒸汽重組區97,該重組催化劑經組態以促進及/或促成蒸汽重組反應。當氫氣產生區78經由蒸汽重組反應產生輸出流96時,氫氣產生總成72可被稱作「蒸汽重組氫氣產生總成(steam reforming hydrogen generation assembly)」且輸出流96可被稱作「重組物流(reformate stream)」。The hydrogen generation zone 78 may include any suitable structure configured to receive one or more feed streams (such as a gaseous feed stream 94 from a vaporization zone) to produce one or more output streams 96 containing hydrogen as a major component and other gases. The hydrogen generation zone may generate the output streams via any suitable mechanism. For example, the hydrogen generation zone 78 may generate the output stream 96 via a steam reforming reaction. In such an example, the hydrogen generation zone 78 may include a steam reforming zone 97 having a reforming catalyst 98 configured to promote and/or facilitate the steam reforming reaction. When the hydrogen generation zone 78 generates the output stream 96 via a steam reforming reaction, the hydrogen generation assembly 72 may be referred to as a "steam reforming hydrogen generation assembly" and the output stream 96 may be referred to as a "reformate stream."
加熱總成80可包括經組態以產生至少一個經加熱之排出流99用於加熱氫氣產生總成72之一或多個其他組件的任何合適結構。舉例而言,加熱總成可將汽化區加熱至任何合適溫度,諸如至少最低汽化溫度或汽化至少一部分含液體進料流以形成氣相進料流之溫度。另外或替代地,加熱總成80可加熱氫氣產生區至任何合適溫度,諸如至少最低氫氣產生溫度或氣相進料流之至少一部分反應以產生氫氣以形成輸出流的溫度。加熱總成可與氫氣產生總成之一或多個組件諸如汽化區及/或氫氣產生區熱連通。The heating assembly 80 can include any suitable structure configured to generate at least one heated exhaust stream 99 for heating one or more other components of the hydrogen generation assembly 72. For example, the heating assembly can heat the vaporization zone to any suitable temperature, such as at least a minimum vaporization temperature or a temperature at which at least a portion of a liquid-containing feed stream is vaporized to form a vapor-phase feed stream. Additionally or alternatively, the heating assembly 80 can heat the hydrogen generation zone to any suitable temperature, such as at least a minimum hydrogen generation temperature or a temperature at which at least a portion of the vapor-phase feed stream is reacted to produce hydrogen to form an output stream. The heating assembly can be in thermal communication with one or more components of the hydrogen generation assembly, such as the vaporization zone and/or the hydrogen generation zone.
加熱總成可包括燃燒器總成100、至少一個鼓風機102及點火器總成104,如圖2所示。燃燒器總成可包括經組態以接收至少一個空氣流106及至少一個燃料流108且在燃燒區110內燃燒至少一個燃料流以產生經加熱之排出流99的任何合適結構。燃料流可由原料遞送系統74及/或淨化區82提供。燃燒區可含有在氫氣產生總成之殼體內。鼓風機102可包括經組態以產生空氣流106之任何合適結構。點火器總成104可包括經組態以點燃燃料流108之任何合適結構。The heating assembly may include a burner assembly 100, at least one blower 102, and an igniter assembly 104, as shown in FIG2 . The burner assembly may include any suitable structure configured to receive at least one air stream 106 and at least one fuel stream 108 and combust the at least one fuel stream in a combustion zone 110 to produce a heated exhaust stream 99. The fuel stream may be provided by the feedstock delivery system 74 and/or the purification zone 82. The combustion zone may be contained within the housing of the hydrogen generation assembly. The blower 102 may include any suitable structure configured to generate the air stream 106. The igniter assembly 104 may include any suitable structure configured to ignite the fuel stream 108.
淨化區82可包括經組態以產生至少一個富氫氣流112之任何合適結構,該富氫氣流112可包括比輸出流96大的氫氣濃度及/或存在於彼輸出流中之降低濃度之一或多種其他氣體(或雜質)。淨化區可產生至少一個副產物流或燃料流108,可將該副產物流或燃料流發送至燃燒器總成100且將其用作彼總成之燃料流,如圖2所示。淨化區82可包括流量限制孔口111、過濾器總成114、膜總成116及甲烷化反應器總成118。過濾器總成(諸如一或多個熱氣體過濾器)可經組態以在氫氣淨化膜總成之前移除來自輸出流96之雜質。The purification section 82 may include any suitable structure configured to produce at least one hydrogen-enriched gas stream 112, which may include a greater hydrogen concentration than the output stream 96 and/or a reduced concentration of one or more other gases (or impurities) present in the output stream. The purification section may produce at least one byproduct stream or fuel stream 108, which may be sent to the combustor assembly 100 and used as the fuel stream for the combustor assembly, as shown in FIG2 . The purification section 82 may include a flow restriction orifice 111, a filter assembly 114, a membrane assembly 116, and a methanation reactor assembly 118. A filter assembly, such as one or more hot gas filters, may be configured to remove impurities from the output stream 96 prior to the hydrogen purification membrane assembly.
膜總成116可包括任何合適結構,其經組態以接收含有氫氣及其他氣體之輸出或混合氣流96且產生相較於混合氣流含有較大濃度之氫氣及/或較低濃度之其他氣體的滲透物或富氫氣流112。膜總成116可併有平面或管狀的氫氣可滲透(或氫氣選擇性)膜,且可將多於一種氫氣可滲透膜併入膜總成116中。滲透物流可用於任何合適應用,諸如用於一或多個燃料電池。在一些具體實例中,膜總成可產生包括其他氣體之至少相當大部分的副產物或燃料流108。甲烷化反應器總成118可包括經組態以將一氧化碳及氫氣轉化成甲烷及水之任何合適結構。雖然淨化區82展示為包括流量限制孔口111、過濾器總成114、膜總成116及甲烷化反應器總成118,但淨化區相較於所有彼等總成可具有較少組件,及/或可替代地或另外包括經組態以淨化輸出流96之一或多個其他組件。舉例而言,淨化區82可僅包括膜總成116。The membrane assembly 116 can include any suitable structure configured to receive the output or mixed gas stream 96 containing hydrogen and other gases and produce a permeate or hydrogen-enriched gas stream 112 containing a greater concentration of hydrogen and/or a lower concentration of other gases than the mixed gas stream. The membrane assembly 116 can incorporate planar or tubular hydrogen-permeable (or hydrogen-selective) membranes, and more than one type of hydrogen-permeable membrane can be incorporated into the membrane assembly 116. The permeate stream can be used for any suitable application, such as in one or more fuel cells. In some embodiments, the membrane assembly can produce a byproduct or fuel stream 108 that includes at least a substantial portion of the other gases. Methanation reactor assembly 118 may include any suitable structure configured to convert carbon monoxide and hydrogen into methane and water. Although purification zone 82 is shown as including flow restriction orifice 111, filter assembly 114, membrane assembly 116, and methanation reactor assembly 118, the purification zone may have fewer components than all of these assemblies and/or may alternatively or additionally include one or more other components configured to purify output stream 96. For example, purification zone 82 may include only membrane assembly 116.
在一些具體實例中,氫氣產生總成72可包括殼層或外殼120,其可至少部分含有彼總成之一或多個其他組件。舉例而言,殼層120可至少部分含有汽化區76、氫氣產生區78、加熱總成80及/或淨化區82,如圖2所示。殼層120可包括經組態以放出由加熱總成80產生之至少一個燃燒排出流124的一或多個排出通口122。In some embodiments, the hydrogen generation assembly 72 can include a shell or housing 120 that can at least partially contain one or more other components of the assembly. For example, the shell 120 can at least partially contain the vaporization region 76, the hydrogen generation region 78, the heating assembly 80, and/or the purge region 82, as shown in FIG2 . The shell 120 can include one or more exhaust vents 122 configured to discharge at least one combustion exhaust stream 124 generated by the heating assembly 80.
氫氣產生總成72在一些具體實例中可包括控制系統126,其可包括經組態以控制氫氣產生總成72之操作的任何合適結構。舉例而言,控制總成126可包括控制總成128、至少一個閥130、至少一個泄壓閥132及一或多個溫度量測裝置134。控制總成128可經由溫度量測裝置134偵測氫氣產生區及/或淨化區中之溫度,該溫度量測裝置可包括一或多個熱電偶及/或其他合適裝置。基於所偵測之溫度,控制總成及/或控制系統之操作者可經由閥130及泵86調整進料流90至汽化區76及/或氫氣產生區78的遞送。閥130可包括螺線管閥及/或任何合適閥。泄壓閥132可經組態以確保減輕系統中之過量壓力。The hydrogen generation assembly 72 may, in some embodiments, include a control system 126, which may include any suitable structure configured to control the operation of the hydrogen generation assembly 72. For example, the control assembly 126 may include a control assembly 128, at least one valve 130, at least one pressure relief valve 132, and one or more temperature measuring devices 134. The control assembly 128 may detect the temperature in the hydrogen generation zone and/or the purification zone via the temperature measuring device 134, which may include one or more thermocouples and/or other suitable devices. Based on the detected temperature, an operator of the control assembly and/or the control system may adjust the delivery of the feed stream 90 to the vaporization zone 76 and/or the hydrogen generation zone 78 via the valve 130 and the pump 86. Valve 130 may include a solenoid valve and/or any suitable valve. Pressure relief valve 132 may be configured to ensure that excess pressure in the system is relieved.
在一些具體實例中,氫氣產生總成72可包括熱交換總成136,其可包括經組態以將熱自一部分氫氣產生總成傳遞至另一部分之一或多個熱交換器138。舉例而言,熱交換總成136可將熱自富氫氣流112傳遞至進料流90,從而在進入汽化區76之前提昇進料流之溫度,以及冷卻富氫氣流112。In some embodiments, the hydrogen generation assembly 72 may include a heat exchange assembly 136, which may include one or more heat exchangers 138 configured to transfer heat from one portion of the hydrogen generation assembly to another portion. For example, the heat exchange assembly 136 may transfer heat from the hydrogen-enriched gas stream 112 to the feed stream 90, thereby raising the temperature of the feed stream before entering the vaporization zone 76, and cooling the hydrogen-enriched gas stream 112.
圖1之氫氣產生總成20之淨化區40(或氫氣淨化裝置)的實例在圖3中通常以144指示。An example of the purification zone 40 (or hydrogen purification device) of the hydrogen generation assembly 20 of FIG. 1 is generally indicated at 144 in FIG. 3 .
除非特定地排除,否則氫氣淨化裝置可包括本發明中描述之其他淨化區的一或多個組件。氫氣淨化裝置40可包括氫氣分離區146及殼體148。殼體可界定具有內部周邊152之內部容積150。殼體148可包括至少一第一部分154及第二部分156,其耦接在一起以形成呈可包括所界定之輸入通口及輸出通口之密封壓力容器之形式的主體149。彼等通口可界定氣體及其他流體遞送至殼體之內部容積且自該內部容積移除藉由的流徑。Unless specifically excluded, the hydrogen purification device may include one or more components of the other purification zones described herein. The hydrogen purification device 40 may include a hydrogen separation zone 146 and a housing 148. The housing may define an interior volume 150 having an interior perimeter 152. The housing 148 may include at least a first portion 154 and a second portion 156 coupled together to form a body 149 in the form of a sealed pressure vessel that may include defined input and output ports. The ports may define flow paths through which gases and other fluids are delivered to and removed from the interior volume of the housing.
第一部分154及第二部分156可使用任何合適保持機構或結構158耦接在一起。合適保持結構之實例包括焊縫及/或螺釘。可用以在第一部分與第二部分之間提供流體密封界面之密封件的實例可包括密封墊及/或焊縫。另外或替代地,第一部分154及第二部分156可緊固在一起,使得至少一預定量之壓縮施加至各種組件,該等組件界定可併入至氫氣產生總成之殼體及/或其他組件內的氫氣分離區。所施加壓縮可確保,各種組件於殼體內保持於適當位置。另外或替代地,施加至界定氫氣分離區之各種組件及/或其他組件之壓縮可在界定氫氣分離區之各種組件、各種其他組件之間及/或界定氫氣分離區之組件與其他組件之間提供流體密封界面。The first portion 154 and the second portion 156 can be coupled together using any suitable retaining mechanism or structure 158. Examples of suitable retaining structures include welds and/or screws. Examples of seals that can be used to provide a fluid-tight interface between the first and second portions include gaskets and/or welds. Additionally or alternatively, the first portion 154 and the second portion 156 can be secured together such that at least a predetermined amount of compression is applied to various components defining a hydrogen separation zone that can be incorporated into a housing and/or other components of the hydrogen generation assembly. The applied compression ensures that the various components remain properly positioned within the housing. Additionally or alternatively, compression applied to the various components defining the hydrogen separation region and/or other components may provide a fluid-tight interface between the various components defining the hydrogen separation region, between the various other components, and/or between the components defining the hydrogen separation region and the other components.
殼體148可包括混合氣體區160及滲透物區162,如圖3中所展示。混合氣體區及滲透物區可藉由氫氣分離區146分離。可提供至少一個輸入通口164,流體流166經由該至少一個輸入通口遞送至殼體。流體流166可為混合氣流168,其含有遞送至混合氣體區160之氫氣170及其他氣體172。氫氣可為混合氣流之大部分組份。氫氣分離區146可在混合氣體區160與滲透物區162之間延伸,使得混合氣體區中之氣體必須通過氫氣分離區以便進入滲透物區。舉例而言,可要求氣體通過如文以下進一步論述的至少一個氫氣選擇性膜。滲透物區及混合氣體區可在殼體內具有任何合適相對大小。The housing 148 may include a mixed gas zone 160 and a permeate zone 162, as shown in FIG3 . The mixed gas zone and the permeate zone may be separated by a hydrogen separation zone 146 . At least one input port 164 may be provided through which a fluid stream 166 is delivered to the housing. The fluid stream 166 may be a mixed gas stream 168 containing hydrogen 170 and other gases 172 delivered to the mixed gas zone 160 . Hydrogen may be a majority component of the mixed gas stream. The hydrogen separation zone 146 may extend between the mixed gas zone 160 and the permeate zone 162 such that gas in the mixed gas zone must pass through the hydrogen separation zone in order to enter the permeate zone. For example, the gas may be required to pass through at least one hydrogen selective membrane as discussed further below. The permeate zone and the mixed gas zone may have any suitable relative sizes within the housing.
殼體148亦可包括至少一個產物輸出通口174,滲透物流176可經由該至少一個產物輸出通口自滲透物區162接收並移除。滲透物流可含有相較於混合氣流一較大濃度之氫氣及一較低濃度之其他氣體中的至少一者。在一些具體實例中,滲透物流176可至少初始地包括載體氣體組份或殘氣氣體組份,諸如可經由與滲透物區流體連通之殘氣通口180作為殘氣流178遞送。殼體亦可包括至少一個副產物輸出通口182,含有其他氣體172之一相當大部分之及一減小濃度之氫氣170(相對於混合氣流)中之至少一者的副產物流184經由該至少一個副產物輸出通口自混合氣體區移除。The housing 148 may also include at least one product outlet 174 through which a permeate stream 176 may be received and removed from the permeate zone 162. The permeate stream may contain a greater concentration of hydrogen and a lower concentration of at least one of the other gases than the mixed gas stream. In some embodiments, the permeate stream 176 may at least initially include a carrier gas component or a residual gas component, such as may be delivered as a residual gas stream 178 via a residual gas vent 180 in fluid communication with the permeate zone. The housing may also include at least one byproduct outlet 182 through which a byproduct stream 184 containing at least one of a substantial portion of the other gas 172 and a reduced concentration of hydrogen 170 (relative to the mixed gas stream) is removed from the mixed gas region.
氫氣分離區146可包括:具有第一或混合氣體表面188之至少一個氫氣選擇性膜186,該第一或混合氣體表面經定向以與混合氣流168接觸;及第二或滲透物表面190,其與表面188大體相對。混合氣流168可經遞送至殼體之混合氣體區,使得該混合氣流與一或多個氫氣選擇性膜之混合氣體表面接觸。滲透物流176可由混合氣流的通過氫氣分離區至滲透物區162之至少一部分形成。副產物流184可由混合氣流的並不通過氫氣分離區之至少一部分形成。在一些具體實例中,副產物流184可含有存在於混合氣流中之氫氣的一部分。氫氣分離區亦可經組態以截獲或以其他方式保留其他氣體的至少一部分,該等其他氣體之至少一部分可接著隨著分離區經替換、再生或以其他方式再裝載而作為副產物流被移除。The hydrogen separation zone 146 can include at least one hydrogen-selective membrane 186 having a first or mixed-gas surface 188 oriented to contact the mixed gas stream 168 and a second or permeate surface 190 generally opposite surface 188. The mixed gas stream 168 can be delivered to the mixed gas zone of the housing so that the mixed gas stream contacts the mixed-gas surfaces of the one or more hydrogen-selective membranes. A permeate stream 176 can be formed from at least a portion of the mixed gas stream that passes through the hydrogen separation zone to the permeate zone 162. A byproduct stream 184 can be formed from at least a portion of the mixed gas stream that does not pass through the hydrogen separation zone. In some embodiments, the byproduct stream 184 can contain a portion of the hydrogen present in the mixed gas stream. The hydrogen separation zone may also be configured to intercept or otherwise retain at least a portion of the other gases, which may then be removed as a by-product stream as the separation zone is replaced, regenerated, or otherwise recharged.
在圖3中,流166、176、178及/或184可包括流入或流出氫氣淨化裝置144之多於一個實際流。舉例而言,氫氣淨化裝置可接收複數個混合氣流168、在接觸氫氣分離區146之前劃分成兩個或多於兩個流之單一混合氣流168、經遞送至內部容積150中之單一流等。因此,殼體148可包括多於一個輸入通口164、產物輸出通口174、殘氣通口180及/或副產物輸出通口182。In Figure 3, streams 166, 176, 178, and/or 184 may include more than one actual stream flowing into or out of the hydrogen purification device 144. For example, the hydrogen purification device may receive a plurality of mixed gas streams 168, a single mixed gas stream 168 that is split into two or more streams before contacting the hydrogen separation zone 146, a single stream that is delivered to the internal volume 150, etc. Thus, the housing 148 may include more than one input port 164, product output port 174, residual gas port 180, and/or by-product output port 182.
氫氣選擇性膜可由適用於操作環境及操作氫氣淨化裝置所用之參數的任何氫氣可滲透材料形成。氫氣淨化裝置之實例揭示於美國專利第5,997,594號及第6,537,352號中,該等專利之全部揭示內容出於所有目的特此以引用之方式併入。在一些具體實例中,氫氣選擇性膜可由鈀及鈀合金中之至少一者形成。鈀合金之實例包括鈀與銅、銀及/或金之合金。各種膜、膜組態及用於製備膜及膜組態之方法的實例揭示於美國專利第6,152,995號、第6,221,117號、第6,319,306號及第6,537,352號中,該等專利之全部揭示內容出於所有目的特此以引用之方式併入。The hydrogen-selective membrane can be formed from any hydrogen-permeable material suitable for the operating environment and parameters used in operating the hydrogen purification device. Examples of hydrogen purification devices are disclosed in U.S. Patent Nos. 5,997,594 and 6,537,352, the entire disclosures of which are hereby incorporated by reference for all purposes. In some embodiments, the hydrogen-selective membrane can be formed from at least one of palladium and a palladium alloy. Examples of palladium alloys include alloys of palladium with copper, silver, and/or gold. Examples of various membranes, membrane configurations, and methods for preparing membranes and membrane configurations are disclosed in U.S. Patent Nos. 6,152,995, 6,221,117, 6,319,306, and 6,537,352, the entire disclosures of which are hereby incorporated by reference for all purposes.
在一些具體實例中,複數個隔開之氫氣選擇性膜186可用於氫氣分離區中以形成氫氣分離總成192的至少一部分。在存在時,複數個膜可共同地界定一或多個膜總成194。在此等具體實例中,氫氣分離總成可通常自第一部分154延伸至第二部分156。因此,第一部分及第二部分可有效地壓縮氫氣分離總成。在一些具體實例中,殼體148可另外或替代地包括耦接至主體部分之相對側的端板(或端框架)。在此等具體實例中,端板可有效地壓縮該對相對端板之間的氫氣分離總成(及可容納於殼體內之其他組件)。In some embodiments, a plurality of spaced-apart hydrogen-selective membranes 186 may be used in the hydrogen separation region to form at least a portion of a hydrogen separation assembly 192. When present, the plurality of membranes may collectively define one or more membrane assemblies 194. In such embodiments, the hydrogen separation assembly may generally extend from the first portion 154 to the second portion 156. Thus, the first and second portions may effectively compress the hydrogen separation assembly. In some embodiments, the housing 148 may additionally or alternatively include end plates (or end frames) coupled to opposing sides of the main body portion. In such embodiments, the end plates may effectively compress the hydrogen separation assembly (and other components that may be housed within the housing) between the pair of opposing end plates.
使用一或多個氫氣選擇性膜之氫氣淨化典型地為壓力驅動分離製程,在該製程中,混合氣流在高於氫氣分離區之滲透區中之氣體的壓力下經遞送而與膜之混合氣體表面接觸。在一些具體實例中,當氫氣分離區用以將混合氣流分離成滲透物流及副產物流時,氫氣分離區可經由任何合適機構加熱至高溫。用於使用鈀及鈀合金膜之氫氣淨化的合適操作溫度之實例包括至少275℃之溫度、至少325℃之溫度、至少350℃的溫度、在275至500℃之範圍內的溫度、在275至375℃之範圍內的溫度、在300至450℃之範圍內的溫度、在350至450℃之範圍內的溫度等。Hydrogen purification using one or more hydrogen-selective membranes is typically a pressure-driven separation process in which a mixed gas stream is passed into contact with the mixed gas surface of the membrane at a pressure higher than the gas in the permeate zone of the hydrogen separation zone. In some embodiments, when the hydrogen separation zone is used to separate the mixed gas stream into a permeate stream and a by-product stream, the hydrogen separation zone can be heated to a high temperature by any suitable mechanism. Examples of suitable operating temperatures for hydrogen purification using palladium and palladium alloy membranes include temperatures of at least 275°C, temperatures of at least 325°C, temperatures of at least 350°C, temperatures in the range of 275 to 500°C, temperatures in the range of 275 to 375°C, temperatures in the range of 300 to 450°C, temperatures in the range of 350 to 450°C, etc.
氫氣淨化裝置144之實例在圖4中通常以196指示。除非具體地排除,否則氫氣淨化裝置196可包括本發明中描述之其他氫氣淨化裝置之一或多個組件及/或淨化區。氫氣淨化裝置196可包括殼層或殼體198,其可包括第一端板或端框架200及第二端板或端框架202。第一端板及第二端板可經組態以緊固及/或壓縮在一起以界定具有一內部隔室204之密封壓力容器,在該內部隔室中支援氫氣分離區。類似於氫氣淨化裝置144,第一端板及第二端板可包括輸入通口、輸出通口、殘氣通口及副產物通口(圖中未示)。An example of a hydrogen purification device 144 is generally indicated at 196 in FIG. 4 . Unless specifically excluded, the hydrogen purification device 196 may include one or more components and/or purification zones of other hydrogen purification devices described herein. The hydrogen purification device 196 may include a shell or housing 198, which may include a first end plate or end frame 200 and a second end plate or end frame 202. The first and second end plates may be configured to be fastened and/or compressed together to define a sealed pressure vessel having an interior compartment 204 in which a hydrogen separation zone is supported. Similar to the hydrogen purification device 144 , the first end plate and the second end plate may include an input port, an output port, a residual gas port, and a by-product port (not shown).
氫氣淨化裝置196亦可包括至少一個箔微孔篩網總成205,其可安置於第一端板與第二端板之間及/或緊固至該第一端板及該第二端板。箔微孔篩網總成可包括至少一個氫氣選擇性膜206及至少一個微孔篩網結構208,如圖5中所示。氫氣選擇性膜可經組態以自輸入通口接收混合氣流之至少部分且將混合氣流分離成滲透物流之至少部分及副產物流的至少部分。氫氣選擇性膜206可包括一進料側210及一滲透側212。滲透物流之至少部分由混合氣流之自進料側傳遞至滲透側之部分形成,其中混合氣流之剩餘在進料側上之剩餘部分形成副產物流的至少部分。The hydrogen purification device 196 may also include at least one foil microporous screen assembly 205, which may be positioned between and/or secured to the first and second end plates. The foil microporous screen assembly may include at least one hydrogen selective membrane 206 and at least one microporous screen structure 208, as shown in FIG5 . The hydrogen selective membrane may be configured to receive at least a portion of a mixed gas stream from an input port and separate the mixed gas stream into at least a portion of a permeate stream and at least a portion of a byproduct stream. The hydrogen selective membrane 206 may include a feed side 210 and a permeate side 212. At least a portion of the permeate stream is formed by the portion of the mixed gas stream passing from the feed side to the permeate side, wherein the remaining portion of the mixed gas stream on the feed side forms at least a portion of the by-product stream.
氫氣選擇性膜中之一或多者可以冶金方式接合至微孔篩網結構208。舉例而言,氫氣選擇性膜之滲透側可以冶金方式接合至微孔篩網結構。在一些具體實例中,氫氣選擇性膜206(及/或彼等膜之滲透側)中之一或多者可擴散接合至微孔篩網結構以在膜與微孔篩網結構之間形成固態擴散接合。舉例而言,膜之滲透側及微孔篩網結構可彼此接觸且暴露至高溫及/或高壓以允許膜及微孔篩網結構之表面隨時間自身穿插。One or more of the hydrogen-selective membranes can be metallurgically bonded to the microporous screen structure 208. For example, the permeate side of the hydrogen-selective membrane can be metallurgically bonded to the microporous screen structure. In some embodiments, one or more of the hydrogen-selective membranes 206 (and/or the permeate sides of such membranes) can be diffusion bonded to the microporous screen structure to form a solid diffusion bond between the membrane and the microporous screen structure. For example, the permeate side of the membrane and the microporous screen structure can be in contact with each other and exposed to high temperature and/or high pressure to allow the surfaces of the membrane and the microporous screen structure to interpenetrate each other over time.
在一些具體實例中,微孔篩網結構可塗佈有薄金屬層或輔助擴散接合的中間接合層。舉例而言,鎳、銅、銀、金或其他金屬之薄塗層經受固態擴散接合,但並不(1)在低於或等於700℃下熔融並進入液相及(2)在擴散至氫氣選擇性膜之後便在低於或等於700℃下形成低熔融合金。薄金屬層可經由中間接合層於將與氫氣選擇性膜接觸之微孔篩網結構之表面上的薄塗佈的合適沈積製程(例如,電化學鍍敷、氣相沈積、濺鍍等)來塗覆至微孔篩網結構。在一些具體實例中,箔微孔篩網總成205僅包括氫氣選擇性膜及微孔篩網結構(上方具有或不具有塗層),且不具有附接、接合及/或以冶金方式接合至氫氣選擇性膜及/或微孔篩網結構中之任一者或兩者的任何其他框架、密封墊、組件及/或結構。在其他具體實例中,氫氣選擇性膜可緊固至至少一個膜框架(圖中未示),其可接著緊固至第一端框架及第二端框架。In some embodiments, the microporous mesh structure may be coated with a thin metal layer or intermediate bonding layer to assist diffusion bonding. For example, a thin coating of nickel, copper, silver, gold, or other metal undergoes solid state diffusion bonding but does not (1) melt at or below 700°C and enter the liquid phase and (2) form a low melting alloy at or below 700°C after diffusion into the hydrogen selective membrane. The thin metal layer can be applied to the microporous screen structure by a suitable deposition process (e.g., electrochemical plating, vapor deposition, sputtering, etc.) through a thin coating of an intermediate bonding layer on the surface of the microporous screen structure that will contact the hydrogen-selective membrane. In some embodiments, the foil microporous screen assembly 205 includes only the hydrogen-selective membrane and the microporous screen structure (with or without a coating thereon) and does not have any other frame, gasket, component, and/or structure attached, bonded, and/or metallurgically bonded to either or both of the hydrogen-selective membrane and/or the microporous screen structure. In other embodiments, the hydrogen-selective membrane may be secured to at least one membrane frame (not shown), which may in turn be secured to the first end frame and the second end frame.
微孔篩網結構208可包括經組態以支撐至少一個氫氣選擇性膜之任何合適結構。舉例而言,微孔篩網結構可包括:具有大體相對表面214及215的無孔平面薄片213,該等表面經組態以提供對滲透側212之支撐;及複數個孔隙216,其形成在相對表面之間延伸的複數個流體通路217,該等流體通路允許滲透物流流過微孔篩網結構,如圖6中所示。孔隙可經由電化學蝕刻、雷射鑽孔及諸如衝壓或刀模切割之其他機械成型製程而形成於無孔平面薄片上。換言之,平面薄片由不包括任何開口或孔隙之一或多種材料製成,且彼薄片上僅有的孔隙或開口係經由上述方法中之一或多者添加。在一些具體實例中,孔隙中之一或多者(或孔隙之全部)可形成於無孔平面薄片上,使得其縱向軸線或流體通路之縱向軸線垂直於無孔平面薄片的平面,如圖6中所示。無孔平面薄片可為任何合適厚度,諸如介於100微米與約200微米之間的厚度。The microporous screen structure 208 may comprise any suitable structure configured to support at least one hydrogen-selective membrane. For example, the microporous screen structure may comprise a non-porous planar sheet 213 having generally opposing surfaces 214 and 215 configured to provide support for a permeate side 212, and a plurality of pores 216 forming a plurality of fluid passages 217 extending between the opposing surfaces, the fluid passages allowing permeate to flow through the microporous screen structure, as shown in FIG6 . The pores may be formed in the non-porous planar sheet by electrochemical etching, laser drilling, and other mechanical forming processes such as stamping or die cutting. In other words, the planar sheet is made of one or more materials that do not include any openings or pores, and the only pores or openings in the sheet are added via one or more of the above methods. In some embodiments, one or more of the pores (or all of the pores) can be formed in the non-porous planar sheet such that their longitudinal axes, or the longitudinal axes of the fluid passageways, are perpendicular to the plane of the non-porous planar sheet, as shown in FIG6 . The non-porous planar sheet can be of any suitable thickness, such as a thickness between 100 microns and approximately 200 microns.
在一些具體實例中,微孔篩網結構208可包括:包括複數個孔隙之一或多個穿孔區域(或部分)218,及不包括(或排除)複數個孔隙之一或多個非穿孔區域(或部分)219。儘管僅少許孔隙216說明於圖6中,孔隙216越過僅穿孔部分之整個長度及寬度分佈。穿孔區域可為離散的或與一或多個其他穿孔區域分隔。非穿孔區域219可包括:在穿孔區域中之一或多者周圍形成框架之周邊區域(或部分)220;及/或分離或界定穿孔區域之多於兩個離散部分的一或多個邊界區域(或部分)221。換言之,每一穿孔部分可藉由不含複數個孔隙之至少一個邊界部分與其他鄰接離散穿孔部分分隔。In some embodiments, the microporous screen structure 208 can include one or more perforated regions (or portions) 218 that include a plurality of apertures, and one or more non-perforated regions (or portions) 219 that do not include (or exclude) a plurality of apertures. Although only a few apertures 216 are illustrated in FIG. 6 , the apertures 216 are distributed across the entire length and width of the perforated portion. The perforated regions can be discrete or separated from one or more other perforated regions. The non-perforated regions 219 can include a peripheral region (or portion) 220 that frames one or more of the perforated regions and/or one or more boundary regions (or portions) 221 that separate or define more than two discrete portions of the perforated region. In other words, each perforated portion may be separated from other adjacent discrete perforated portions by at least one boundary portion that does not contain a plurality of pores.
孔隙216可包括任何合適圖案、形狀及/或大小。在一些具體實例中,孔隙可形成有一或多個圖案,該一或多個圖案使組合式孔隙區域最大化同時維持微孔篩網結構之足夠高的硬度以防止在壓力負載下過度偏轉。孔隙216如圖6中所示可為圓形(環形),如圖7至圖10中所示為狹長圓形、跑道形或體育場形,為卵形、橢圓形、六邊形、三角形、正方形、矩形、八邊形及/或其他合適形狀。在一些具體實例中,穿孔區域中之孔隙216可為單一不變形狀。在其他具體實例中,穿孔區域中之孔隙216可為兩個或多於兩個不同形狀之任何合適組合,諸如上述形狀中之兩者或多於兩者。The apertures 216 can include any suitable pattern, shape, and/or size. In some embodiments, the apertures can be formed with one or more patterns that maximize the combined aperture area while maintaining sufficient stiffness in the microporous screen structure to prevent excessive deflection under compressive loads. The apertures 216 can be circular (ring-shaped), as shown in FIG6 , or oblong, as shown in FIG7 through FIG10 , or racetrack or stadium-shaped, or oval, elliptical, hexagonal, triangular, square, rectangular, octagonal, and/or other suitable shapes. In some embodiments, the apertures 216 in the perforated area can be a single, fixed shape. In other embodiments, the apertures 216 in the perforated region can be any suitable combination of two or more different shapes, such as two or more of the above shapes.
孔隙216可具有任何合適的定向及/或呈任何合適的圖案。舉例而言,圖7展示縱向地(或沿著穿孔區域或平面薄片之長度)定向且以平行列串聯的孔隙216。換言之,每一孔隙216具有界定縱向軸線223之長度,且圖7中之所有孔隙的縱向軸線與平面薄片213之縱向軸線225 (展示於圖6中)平行及/或同軸。替代地,圖9至圖10展示側向地(或沿著穿孔區域或平面薄片之寬度)定向的孔隙。換言之,圖9至圖10之實例中的所有孔隙之縱向軸線223垂直於平面薄片213之縱向軸線225。The pores 216 can have any suitable orientation and/or be arranged in any suitable pattern. For example, FIG. 7 shows pores 216 oriented longitudinally (or along the length of the perforated region or planar sheet) and connected in parallel rows. In other words, each pore 216 has a length that defines a longitudinal axis 223, and the longitudinal axes of all pores in FIG. 7 are parallel and/or coaxial with the longitudinal axis 225 of the planar sheet 213 (shown in FIG. 6). Alternatively, FIG. 9-10 shows pores oriented laterally (or along the width of the perforated region or planar sheet). In other words, the longitudinal axes 223 of all pores in the examples of FIG. 9-10 are perpendicular to the longitudinal axis 225 of the planar sheet 213.
儘管孔隙216在圖7及圖9至圖10中處於相同方向或定向上,但平面薄片213之其他具體實例可包括具有兩個或多於兩個方向及/或定向之孔隙216。舉例而言,孔隙216可以交錯圖案配置,使得每一列或行中之孔隙與每一鄰近列或行中之孔隙不同地定向(例如,成30、45、60、90、120度)。換言之,每一列或行中之孔隙216的縱向軸線223彼此平行及/或不平行於平面薄片213上之一或多個鄰近列或行中的孔隙之縱向軸線223。在一個實例中,孔隙216亦在對角線上定向且以平行列串聯,使得孔隙之每一列與孔隙之鄰近列成大約九十度而定向,如圖8中所示。替代地或另外,一或多個列及/或行中之一或多個孔隙216可與相同列及/或行中之一或多個其他孔隙不同地定向。Although the pores 216 are arranged in the same direction or orientation in Figures 7 and 9-10, other embodiments of the planar sheet 213 may include pores 216 having two or more directions and/or orientations. For example, the pores 216 may be arranged in a staggered pattern such that the pores in each column or row are oriented differently (e.g., at 30, 45, 60, 90, or 120 degrees) than the pores in each adjacent column or row. In other words, the longitudinal axes 223 of the pores 216 in each column or row are parallel to each other and/or non-parallel to the longitudinal axes 223 of the pores in one or more adjacent columns or rows on the planar sheet 213. In one example, the apertures 216 are also oriented diagonally and connected in parallel rows such that each row of apertures is oriented approximately ninety degrees from an adjacent row of apertures, as shown in Figure 8. Alternatively or in addition, one or more apertures 216 in one or more rows and/or columns may be oriented differently than one or more other apertures in the same row and/or column.
孔隙可具有任何合適的大小。舉例而言,當孔隙為圓形時,直徑之範圍可為約0.003吋至約0.020吋。另外,當孔隙為卵形或橢圓形時,卵形或橢圓形之修圓末端的半徑之範圍可為0.001吋至約0.010吋,且卵形或橢圓形之長度可高達半徑的十倍。此外,當孔隙為狹長圓形或體育場形時,寬度或直徑之範圍可為0.005吋至0.02吋,且長度可為0.05吋至超過十倍直徑,諸如0.8吋。圖8中之孔隙的尺寸之實例為:修圓末端之直徑為0.10吋,且長度為0.028吋(亦即,縱橫比約為3),其中孔隙之間的間隔為0.006吋或鄰近孔隙之中心之間的間隔為0.011吋。圖8中所示之圖案及實例尺寸在微孔篩網結構中提供約50%的總開放面積。The apertures can be of any suitable size. For example, when the apertures are circular, the diameter can range from about 0.003 inches to about 0.020 inches. Alternatively, when the apertures are oval or elliptical, the radius of the rounded end of the oval or elliptical can range from 0.001 inches to about 0.010 inches, and the length of the oval or elliptical can be up to ten times the radius. Furthermore, when the apertures are oblong or stadium-shaped, the width or diameter can range from 0.005 inches to 0.02 inches, and the length can range from 0.05 inches to more than ten times the diameter, such as 0.8 inches. Example pore sizes in FIG8 are: a diameter of 0.10 inches at the rounded end and a length of 0.028 inches (i.e., an aspect ratio of approximately 3), with a spacing of 0.006 inches between pores or 0.011 inches between the centers of adjacent pores. The pattern and example dimensions shown in FIG8 provide a total open area of approximately 50% in the microporous screen structure.
在一些實例中,一或多個孔隙216可經大小設定以橫跨穿孔區域之整個或大體上整個寬度或長度。在圖9中所示之實例中,體育場形孔隙橫向地定向且為穿孔區域或部分之整個寬度或大體上整個寬度,使得縱橫比(長度/寬度)遠大於10。圖9中之孔隙的尺寸之實例為0.005吋至0.02吋的寬度及高達8吋的長度。孔隙可彼此隔開約0.006吋(亦即,鄰近孔隙之間的非穿孔部分或實心凸台之寬度),以提供多達約62.5%之總開放面積。In some examples, one or more apertures 216 can be sized to span the entire or substantially the entire width or length of the perforated area. In the example shown in FIG9 , the stadium-shaped apertures are oriented transversely and span the entire or substantially the entire width of the perforated area or portion, such that the aspect ratio (length/width) is much greater than 10. Examples of aperture sizes in FIG9 are 0.005 to 0.02 inches in width and up to 8 inches in length. The apertures can be spaced about 0.006 inches apart (i.e., the width of the non-perforated portion or solid boss between adjacent apertures) to provide a total open area of up to about 62.5%.
在一些實例中,孔隙216可具有大小組合。舉例而言,孔隙216可經大小設定使得平面薄片213包括孔隙之列及/或行,其具有:(1)具有一或多個較長長度之較小數目個孔隙;及(2)具有一或多個較短長度之較大數目個孔隙。在一些實例中,具有長度較長之較小數目個孔隙的列及/或行與具有長度較短之較大數目個孔隙的列及/或行交替,諸如以交錯圖案。在圖10中所示之實例中,孔隙216橫向地(或垂直於平面薄片213之縱向軸線225)定向,且每一列及/或行在具有較長長度之兩個孔隙與具有較短長度之三個孔隙之間交替。每一列及/或行之孔隙的長度可相同或不同。圖10中之孔隙的尺寸之實例為0.005吋至0.02吋的寬度及0.05吋至8吋的長度。孔隙可彼此隔開約0.006吋(亦即,鄰近孔隙之間的非穿孔部分或實心凸台之寬度)。孔隙216之圖案、大小、定向及/或形狀的其他組合為可能的且包括於本發明中。In some examples, the pores 216 can have a combination of sizes. For example, the pores 216 can be sized so that the planar sheet 213 includes columns and/or rows of pores having: (1) a smaller number of pores having one or more longer lengths; and (2) a larger number of pores having one or more shorter lengths. In some examples, the columns and/or rows of smaller number of pores having longer lengths alternate with columns and/or rows of larger number of pores having shorter lengths, such as in a staggered pattern. In the example shown in FIG10 , the apertures 216 are oriented transversely (or perpendicular to the longitudinal axis 225 of the planar sheet 213), and each column and/or row alternates between two apertures having a longer length and three apertures having a shorter length. The lengths of the apertures in each column and/or row can be the same or different. Examples of the dimensions of the apertures in FIG10 are 0.005 to 0.02 inches in width and 0.05 to 8 inches in length. The apertures can be spaced about 0.006 inches apart (i.e., the width of the non-perforated portion or solid boss between adjacent apertures). Other combinations of patterns, sizes, orientations, and/or shapes of the apertures 216 are possible and encompassed by the present invention.
無孔平面薄片可包括任何合適材料。舉例而言,無孔平面薄片可包括不鏽鋼。不鏽鋼可包括300系列不鏽鋼(例如,不鏽鋼303(經鋁改質)、不鏽鋼304等)、400系列不鏽鋼、17-7PH、14-8 PH及/或15-7 PH。在一些具體實例中,不鏽鋼可包括大約0.6 wt%至約3.0 wt%的鋁。在一些具體實例中,無孔平面薄片可包括碳鋼、銅或銅合金、鋁或鋁合金、鎳、鎳-銅合金及/或電鍍有銀、鎳及/或銅的基材金屬。基材金屬可包括上文所述之碳鋼或者不鏽鋼中的一或多者。The non-porous planar sheet may comprise any suitable material. For example, the non-porous planar sheet may comprise stainless steel. The stainless steel may include 300 series stainless steel (e.g., 303 stainless steel (aluminum modified), 304 stainless steel, etc.), 400 series stainless steel, 17-7 PH, 14-8 PH, and/or 15-7 PH. In some embodiments, the stainless steel may include approximately 0.6 wt% to approximately 3.0 wt% aluminum. In some embodiments, the non-porous planar sheet may comprise carbon steel, copper or a copper alloy, aluminum or an aluminum alloy, nickel, a nickel-copper alloy, and/or a base metal electroplated with silver, nickel, and/or copper. The substrate metal may include one or more of the carbon steel or stainless steel mentioned above.
氫氣選擇性膜206可經設定為大於微孔篩網結構之穿孔區域或場地(field),使得當氫氣選擇性膜以冶金方式接合至微孔篩網結構時,氫氣選擇性膜之周邊部分222接觸微孔篩網結構之一或多個非穿孔區域219。在一些具體實例中,單一氫氣選擇性膜可以冶金方式接合至單一微孔篩網結構,如圖5中所示。在其他具體實例中,兩個或多於兩個氫氣選擇性膜206可以冶金方式接合至單一微孔篩網結構208。舉例而言,兩個、三個、四個、五個、六個、七個、八個、九個、十個或多於十個之氫氣選擇性膜206可以冶金方式接合至單一微孔篩網結構208。圖11至圖12展示實例箔微孔篩網總成205,其具有以冶金方式接合至單一微孔篩網結構208的六個氫氣選擇性膜206。圖13展示具有以冶金方式接合至單一微孔篩網結構208之兩個氫氣選擇性膜206的實例箔微孔篩網總成205,而圖14展示具有以冶金方式接合至單一微孔篩網結構208之四個氫氣選擇性膜206的實例箔微孔篩網總成205。The hydrogen-selective membrane 206 can be configured to be larger than the perforated area or field of the microporous screen structure so that when the hydrogen-selective membrane is metallurgically bonded to the microporous screen structure, a peripheral portion 222 of the hydrogen-selective membrane contacts one or more non-perforated areas 219 of the microporous screen structure. In some embodiments, a single hydrogen-selective membrane can be metallurgically bonded to a single microporous screen structure, as shown in FIG5 . In other embodiments, two or more hydrogen-selective membranes 206 can be metallurgically bonded to a single microporous screen structure 208. For example, two, three, four, five, six, seven, eight, nine, ten, or more hydrogen-selective membranes 206 can be metallurgically bonded to a single microporous screen structure 208. Figures 11-12 show example foil microporous screen assemblies 205 having six hydrogen-selective membranes 206 metallurgically bonded to a single microporous screen structure 208. Figure 13 shows an example foil microporous screen assembly 205 having two hydrogen-selective membranes 206 metallurgically bonded to a single microporous screen structure 208, and Figure 14 shows an example foil microporous screen assembly 205 having four hydrogen-selective membranes 206 metallurgically bonded to a single microporous screen structure 208.
當兩個或多於兩個氫氣選擇性膜206以冶金方式接合至微孔篩網結構時,微孔篩網結構可包括藉由一或多個非穿孔區域219分離的兩個或多於兩個離散穿孔區域218。在一些具體實例中,穿孔區域218可大小設定為與其他穿孔區域218相同。舉例而言,圖12展示大小大約相同之六個離散穿孔區域218。在其他具體實例中,一或多個穿孔區域218可設定大小為小於及/或大於其他穿孔區域218。氫氣選擇性膜206可以冶金方式接合至穿孔區域中之每一者,如圖11中所示。替代地或另外,氫氣選擇性膜可以冶金方式接合至兩個或多於兩個離散穿孔區域218。氫氣選擇性膜206可經設定大小,使得當膜以冶金方式接合至一或多個穿孔區域218時,膜之周邊部分222接觸一或多個非穿孔區域219。When two or more hydrogen-selective membranes 206 are metallurgically bonded to the microporous screen structure, the microporous screen structure can include two or more discrete perforated regions 218 separated by one or more non-perforated regions 219. In some embodiments, the perforated regions 218 can be sized the same as the other perforated regions 218. For example, FIG12 shows six discrete perforated regions 218 of approximately the same size. In other embodiments, one or more perforated regions 218 can be sized smaller and/or larger than the other perforated regions 218. The hydrogen-selective membrane 206 can be metallurgically bonded to each of the perforated regions, as shown in FIG11. Alternatively or additionally, the hydrogen-selective membrane can be metallurgically bonded to two or more discrete perforated regions 218. The hydrogen-selective membrane 206 can be sized such that when the membrane is metallurgically bonded to one or more perforated regions 218, a peripheral portion 222 of the membrane contacts one or more non-perforated regions 219.
微孔篩網結構208可經設定大小為含有於(諸如完全含有於)滲透物框架之開放區內及/或藉由開放區內之膜支撐結構支撐,如圖5中所示。換言之,微孔篩網結構可經設定大小以在微孔篩網結構及滲透物框架緊固或壓縮至第一端框架及第二端框架時並不接觸滲透物框架的周邊殼層。替代地,微孔篩網結構可藉由無孔周邊壁部分或框架(圖中未示)支撐及/或緊固至該無孔周邊壁部分或框架,諸如緊固至滲透物框架之周邊殼層。當微孔篩網結構緊固至無孔周邊壁部分時,微孔篩網結構可被稱作「多孔中心區域部分」。其他微孔篩網結構之實例揭示於美國專利申請公開案第2010/0064887號中,該公開案之全部揭示內容出於所有目的特此以引用之方式併入。The microporous screen structure 208 can be sized to be contained within (e.g., completely contained within) the open area of the permeate frame and/or supported by a membrane support structure within the open area, as shown in FIG5 . In other words, the microporous screen structure can be sized so that it does not contact the peripheral shell of the permeate frame when the microporous screen structure and the permeate frame are secured or compressed to the first and second end frames. Alternatively, the microporous screen structure can be supported by and/or secured to a non-porous peripheral wall portion or frame (not shown), such as the peripheral shell of the permeate frame. When the microporous screen structure is secured to the non-porous peripheral wall portion, the microporous screen structure may be referred to as a "porous central region portion." Other examples of microporous screen structures are disclosed in U.S. Patent Application Publication No. 2010/0064887, the entire disclosure of which is hereby incorporated by reference for all purposes.
氫氣淨化裝置196亦可包括複數個板或框架224,其安置於第一端框架及/或第二框架之間且緊固至第一端框架及/或第二框架。框架可包括任何合適結構及/或可為任何合適形狀,諸如正方形、矩形或圓形。舉例而言,框架224可包括周邊殼層226及至少一第一支撐部件228,如圖4中所示,周邊殼層可界定開放區230及框架平面232。另外,周邊殼層226可包括第一相對側234及第二相對側236以及第三相對側238及第四相對側240,如圖4中所示。The hydrogen purification device 196 may also include a plurality of plates or frames 224, which are disposed between and secured to the first end frame and/or the second frame. The frame may include any suitable structure and/or may be any suitable shape, such as square, rectangular, or circular. For example, the frame 224 may include a peripheral shell 226 and at least one first support member 228, as shown in FIG4 , and the peripheral shell may define an open area 230 and a frame plane 232. In addition, the peripheral shell 226 may include a first opposing side 234 and a second opposing side 236, as well as a third opposing side 238 and a fourth opposing side 240, as shown in FIG4 .
第一支撐部件228可包括經組態以支撐箔微孔篩網總成205之第一部分242的任何合適結構,如圖4中所示。舉例而言,複數個框架之第一支撐部件可在第一支撐平面244內彼此共面(或與複數個框架中之其他框架的其他第一支撐部件共面)以支撐氫氣選擇性膜的第一部分242,如圖4中所示。換言之,複數個框架中之每一框架的第一支撐部件可鏡像複數個框架之其他框架的第一支撐部件。第一支撐部件相對於框架平面232可具有任何合適定向。舉例而言,第一支撐平面244可垂直於框架平面,如圖4中所示。替代地,第一膜支撐平面可與框架平面232相交,但不垂直於該框架平面。The first support member 228 can comprise any suitable structure configured to support the first portion 242 of the foil microporous screen assembly 205, as shown in FIG4 . For example, the first support members of the plurality of frames can be coplanar with each other (or coplanar with other first support members of other frames in the plurality of frames) within a first support plane 244 to support the first portion 242 of the hydrogen-selective membrane, as shown in FIG4 . In other words, the first support members of each frame in the plurality of frames can mirror the first support members of other frames in the plurality of frames. The first support members can have any suitable orientation relative to the frame plane 232. For example, the first support plane 244 can be perpendicular to the frame plane, as shown in FIG4 . Alternatively, the first membrane-supporting plane can intersect the frame plane 232 but not be perpendicular thereto.
在一些具體實例中,框架224可包括第二支撐部件246及/或第三支撐部件248,其可包括經組態以支撐箔微孔篩網總成205之第二部分250及/或第三部分252的任何合適結構,如圖4中所示。舉例而言,複數個框架之第二支撐部件可在第二支撐平面254內彼此共面(或與複數個框架之其他第二支撐部件共面)以支撐箔微孔篩網總成的第二部分250。另外,複數個框架之第三支撐部件可在第三支撐平面256內彼此共面(或與複數個框架之其他第三支撐部件共面)以支撐箔微孔篩網總成的第三部分252。換言之,複數個框架中之每一框架的第二支撐部件可鏡像複數個框架中之其他框架的第二支撐部件,而複數個框架中之每一框架的第三支撐部件可鏡像複數個框架中之其他框架的第三支撐部件。第二支撐平面及/或第三支撐平面相對於框架平面232可具有任何合適定向。舉例而言,第二支撐平面254及/或第三支撐平面256可垂直於框架平面,如圖4中所示。替代地,第二支撐平面及/或第三支撐平面可與框架平面232相交,但不垂直於該框架平面。In some embodiments, the frame 224 may include a second support member 246 and/or a third support member 248, which may include any suitable structure configured to support the second portion 250 and/or the third portion 252 of the foil microporous screen assembly 205, as shown in FIG4 . For example, the second support members of a plurality of frames may be coplanar with each other (or coplanar with other second support members of a plurality of frames) in a second support plane 254 to support the second portion 250 of the foil microporous screen assembly. Additionally, the third support members of a plurality of frames may be coplanar with each other (or coplanar with other third support members of a plurality of frames) in a third support plane 256 to support the third portion 252 of the foil microporous screen assembly. In other words, the second support member of each frame in the plurality of frames can mirror the second support member of the other frames in the plurality of frames, and the third support member of each frame in the plurality of frames can mirror the third support member of the other frames in the plurality of frames. The second support plane and/or the third support plane can have any suitable orientation relative to the frame plane 232. For example, the second support plane 254 and/or the third support plane 256 can be perpendicular to the frame plane, as shown in FIG4. Alternatively, the second support plane and/or the third support plane can intersect the frame plane 232 but not be perpendicular to the frame plane.
第二支撐部件246及/或第三支撐部件248相對於第一支撐部件228可具有任何合適定向。舉例而言,第一支撐部件228可自周邊殼層226之第三側238延伸至開放區230中;第二支撐部件246可自周邊殼層之第四側240(其與第三側相對)延伸至開放區中;且第三支撐部件248可自第三側延伸至開放區中。替代地,第一支撐部件、第二支撐部件及/或第三支撐部件可自周邊殼層之同一側諸如自第一側、第二側、第三側或第四側延伸至開放區中。在一些具體實例中,第一支撐部件、第二支撐部件及/或第三支撐部件可自周邊殼層之第一側及/或第二側(其與第一側相對)延伸至開放區中。The second support member 246 and/or the third support member 248 can have any suitable orientation relative to the first support member 228. For example, the first support member 228 can extend from the third side 238 of the peripheral shell 226 into the open area 230; the second support member 246 can extend from the fourth side 240 of the peripheral shell (opposite the third side) into the open area; and the third support member 248 can extend from the third side into the open area. Alternatively, the first, second, and/or third support members can extend from the same side of the peripheral shell, such as from the first, second, third, or fourth side, into the open area. In some embodiments, the first supporting member, the second supporting member, and/or the third supporting member may extend from a first side and/or a second side (opposite to the first side) of the peripheral shell into the open area.
第一支撐部件、第二支撐部件及/或第三支撐部件可例如呈附接至周邊殼層及/或形成有周邊殼層的一或多個突出部或指258的形式。突出部可在任何合適方向上自周邊殼層延伸。突出部可為具有周邊殼層之完整厚度,或可小於該殼層之完整厚度。框架224中之每一框架的突出部可與箔微孔篩網總成相抵地壓縮,藉此將該總成鎖定於適當位置。換言之,框架224之突出部可藉由係第一膜支撐平面及/或第二膜支撐平面內之端框架的堆疊式延伸部支撐箔微孔篩網總成。在一些具體實例中,突出部258可包括一或多個插孔或孔隙(圖中未示),其經組態以收納至少一個扣件(圖中未示)以將框架224緊固至第一端框架及/或第二端框架。The first, second and/or third support members may, for example, be in the form of one or more protrusions or fingers 258 attached to and/or formed with the peripheral shell. The protrusions may extend from the peripheral shell in any suitable direction. The protrusions may be the full thickness of the peripheral shell, or may be less than the full thickness of the shell. The protrusions of each of the frames 224 may be compressed against the foil microporous screen assembly, thereby locking the assembly in place. In other words, the protrusions of the frames 224 may support the foil microporous screen assembly by being stacked extensions of the end frames within the first membrane support plane and/or the second membrane support plane. In some embodiments, the protrusion 258 can include one or more receptacles or apertures (not shown) configured to receive at least one fastener (not shown) to secure the frame 224 to the first end frame and/or the second end frame.
框架224可包括至少一個進料框架260、至少一個滲透物框架262及複數個密封墊或密封墊框架264,如圖4中所示。進料框架260可安置於第一端框架及第二端框架中之一者與至少一個箔微孔篩網總成205之間,或兩個箔微孔篩網總成205之間。進料框架可包括進料框架周邊殼層266、進料框架輸入管道268、進料框架輸出管道270、進料框架開放區272、至少一第一進料框架支撐部件274,如圖4中所示。在一些具體實例中,進料框架可包括第二進料框架支撐部件276及/或第三進料框架支撐部件278。在一些具體實例中,端板、箔微孔篩網總成及框架224緊固或壓縮在一起,諸如經由螺釘及/或其他扣件以機械方式緊固及/或以機械方式壓縮,而在氫氣淨化裝置之兩個或多於兩個組件之間無任何冶金接合及/或其他類型之化學接合(除箔微孔篩網總成內的氫氣選擇性膜與經塗佈或未塗佈微孔篩網結構之間的上文所描述之冶金接合以外)。舉例而言,不存在以冶金方式或以其他方式化學接合至箔微孔篩網總成之氫氣選擇性膜及/或微孔篩網結構以及氫氣淨化裝置之所有其他組件的密封墊及/或框架。The frame 224 may include at least one feed frame 260, at least one permeate frame 262, and a plurality of sealing pads or sealing pad frames 264, as shown in FIG4 . The feed frame 260 may be positioned between one of the first end frame and the second end frame and at least one foil microporous screen assembly 205, or between two foil microporous screen assemblies 205. The feed frame may include a feed frame peripheral shell 266, a feed frame input conduit 268, a feed frame output conduit 270, a feed frame open area 272, and at least one first feed frame support member 274, as shown in FIG4 . In some embodiments, the feed frame may include a second feed frame support member 276 and/or a third feed frame support member 278. In some embodiments, the end plate, the foil microporous screen assembly, and the frame 224 are fastened or compressed together, such as mechanically fastened and/or mechanically compressed by screws and/or other fasteners, without any metallurgical bonds and/or other types of chemical bonds between two or more components of the hydrogen purification device (except for the metallurgical bonds described above between the hydrogen-selective membrane and the coated or uncoated microporous screen structure within the foil microporous screen assembly). For example, there are no sealing gaskets and/or frames metallurgically or otherwise chemically bonded to the hydrogen-selective membrane and/or microporous screen structure of the foil microporous screen assembly and all other components of the hydrogen purification device.
氫氣淨化裝置144之另一實例在圖15中通常以396指示。除非具體地排除,否則氫氣淨化裝置396可包括本發明中描述之其他氫氣淨化裝置之一或多個組件及/或淨化區。Another example of a hydrogen purification device 144 is generally indicated in Figure 15 at 396. Unless specifically excluded, the hydrogen purification device 396 may include one or more components and/or purification zones of other hydrogen purification devices described herein.
氫氣淨化裝置396在許多方面類似於氫氣淨化裝置196但具有不同形狀的框架、無支撐部件、不同大小之箔微孔篩網總成及較少密封墊框架,如下文進一步描述。氫氣淨化裝置396之組件或部分對應於氫氣淨化裝置196之組件或部分,且圖15中藉由具有通用形式「3XX」而非「1XX」及「4XX」並非「2XX」的類似附圖標號來標記。因此,特徵398、400、402、404、405、406、408、424、426、434、436、438、440、460、462、464等可與氫氣淨化裝置196中之其各別對應物即特徵198、200、202、204、205、206、208、224、226、234、236、238、240、260、262、264等相同或大體上相同。Hydrogen purification device 396 is similar in many respects to hydrogen purification device 196 but has a differently shaped frame, unsupported components, a differently sized foil microporous screen assembly, and fewer sealing gasket frames, as further described below. Components or portions of hydrogen purification device 396 correspond to components or portions of hydrogen purification device 196 and are labeled in FIG15 by similar figure numbers having the general form "3XX" instead of "1XX" and "4XX" instead of "2XX." Therefore, features 398, 400, 402, 404, 405, 406, 408, 424, 426, 434, 436, 438, 440, 460, 462, 464, etc. may be the same or substantially the same as their respective counterparts in hydrogen purification device 196, namely features 198, 200, 202, 204, 205, 206, 208, 224, 226, 234, 236, 238, 240, 260, 262, 264, etc.
氫氣淨化裝置396可包括殼層或殼體398,其可包括第一端板或端框架400及第二端板或端框架402。第一端板及第二端板可經組態以緊固及/或壓縮在一起以界定具有一內部隔室404之密封壓力容器,氫氣分離區於該內部隔室中被支援。The hydrogen purification device 396 may include a shell or housing 398, which may include a first end plate or end frame 400 and a second end plate or end frame 402. The first end plate and the second end plate may be configured to be fastened and/or compressed together to define a sealed pressure vessel having an interior compartment 404 in which the hydrogen separation zone is supported.
氫氣淨化裝置396亦可包括至少一個箔微孔篩網總成405,其可安置於第一端板與第二端板之間及/或緊固至該第一端板及該第二端板。箔微孔篩網總成可包括至少一個氫氣選擇性膜406及至少一個微孔篩網結構408。氫氣選擇性膜中之一或多者可以冶金方式接合至微孔篩網結構408。舉例而言,氫氣選擇性膜406中之一或多者可擴散接合至微孔篩網結構以在膜與微孔篩網結構之間形成固態擴散接合件。箔微孔篩網總成405經設定大小以適配於滲透物框架之開放區,且因此相較於或相對於箔微孔篩網總成205而言長度及寬度較小。The hydrogen purification device 396 may also include at least one foil microporous screen assembly 405, which may be positioned between and/or secured to the first and second end plates. The foil microporous screen assembly may include at least one hydrogen-selective membrane 406 and at least one microporous screen structure 408. One or more of the hydrogen-selective membranes may be metallurgically bonded to the microporous screen structure 408. For example, one or more of the hydrogen-selective membranes 406 may be diffusion bonded to the microporous screen structure to form a solid diffusion bond between the membrane and the microporous screen structure. The foil microporous screen assembly 405 is sized to fit within the open area of the permeate frame and is therefore smaller in length and width than or relative to the foil microporous screen assembly 205 .
氫氣淨化裝置396亦可包括複數個板或框架424,其安置於第一端框架及/或第二框架之間且緊固至第一端框架及/或第二端框架。框架424可包括周邊殼層426。周邊殼層可界定開放區430。另外,周邊殼層426可包括第一相對側434及第二相對側436,以及第三相對側438及第四相對側440。不同於氫氣淨化裝置196之框架224,框架424不包括任何支撐部件。The hydrogen purification device 396 may also include a plurality of panels or frames 424 disposed between and secured to the first end frame and/or the second end frame. The frame 424 may include a peripheral shell 426. The peripheral shell may define an open area 430. Additionally, the peripheral shell 426 may include a first opposing side 434 and a second opposing side 436, as well as a third opposing side 438 and a fourth opposing side 440. Unlike the frame 224 of the hydrogen purification device 196, the frame 424 does not include any supporting components.
框架424可包括至少一個進料框架460、至少一個滲透物框架462及複數個密封墊或密封墊框架464。進料框架460可安置於第一端框架及第二端框架中之一者與至少一個箔微孔篩網總成405之間,或兩個箔微孔篩網總成405之間。進料框架可包括與進料框架260至少實質上類似的組件,諸如進料框架周邊殼層、進料框架輸入管道、進料框架輸出管道及/或進料框架開放區。The frame 424 may include at least one feed frame 460, at least one permeate frame 462, and a plurality of seals or seal frames 464. The feed frame 460 may be positioned between one of the first end frame and the second end frame and at least one foil microporous screen assembly 405, or between two foil microporous screen assemblies 405. The feed frame may include components at least substantially similar to those of the feed frame 260, such as a feed frame peripheral shell, a feed frame input conduit, a feed frame output conduit, and/or a feed frame open area.
滲透物框架462可經定位,使得至少一個箔微孔篩網總成安置於第一端框架及第二端框架中之一者與滲透物框架之間或兩個箔微孔篩網總成之間。滲透物框架可包括與滲透物框架262至少實質上類似的組件,諸如滲透物框架周邊殼層、滲透物框架輸出管道、滲透物框架開放區及/或膜支撐結構。The permeate frame 462 can be positioned such that at least one foil microporous screen assembly is disposed between one of the first end frame and the second end frame and the permeate frame, or between two foil microporous screen assemblies. The permeate frame can include components at least substantially similar to those of the permeate frame 262, such as a permeate frame perimeter shell, a permeate frame output conduit, a permeate frame open area, and/or a membrane support structure.
框架424亦可包括密封墊或密封墊框架464。密封墊框架可包括經組態以在其他框架之間,諸如在第一端板400及第二端板402與進料框架460之間及/或進料框架460與箔微孔篩網總成405之間提供流體密封界面的任何合適結構。不同於氫氣淨化裝置196,氫氣淨化裝置396不包括箔微孔篩網總成與滲透物框架462之間的密封墊框架464。類似於氫氣淨化裝置196,進料框架及密封墊框架之寬度大於滲透物框架之寬度(或進料框架及密封墊框架之開放區小於滲透物框架之開放區),使得額外寬度覆蓋箔微孔篩網總成之邊緣以使自進料側至滲透側或自滲透側至進料側之洩漏消除或最小化(例如,進料框架及密封墊框架之額外寬度覆蓋箔微孔篩網總成之邊緣)。在一些具體實例中,額外寬度對應於箔微孔篩網總成之微孔篩網結構之周邊(非穿孔)部分的寬度。 產業適用性 Frame 424 may also include a sealing gasket or sealing gasket frame 464. The sealing gasket frame may include any suitable structure configured to provide a fluid-tight interface between other frames, such as between the first and second end plates 400, 402 and the feed frame 460, and/or between the feed frame 460 and the foil microporous screen assembly 405. Unlike hydrogen purification device 196, hydrogen purification device 396 does not include a sealing gasket frame 464 between the foil microporous screen assembly and the permeate frame 462. Similar to hydrogen purification device 196, the width of the feed frame and the sealing gasket frame is greater than the width of the permeate frame (or the open area of the feed frame and the sealing gasket frame is smaller than the open area of the permeate frame), so that the excess width covers the edge of the foil microporous screen assembly to eliminate or minimize leakage from the feed side to the permeate side or from the permeate side to the feed side (for example, the excess width of the feed frame and the sealing gasket frame covers the edge of the foil microporous screen assembly). In some embodiments, the excess width corresponds to the width of the peripheral (non-perforated) portion of the microporous screen structure of the foil microporous screen assembly. Industry Applicability
包括氫氣淨化裝置及彼等裝置之組件的本發明揭示內容適用於氫氣經淨化、產生及/或利用的燃料處理及其他產業。The present disclosure, including hydrogen purification devices and components thereof, is applicable to fuel processing and other industries where hydrogen is purified, produced, and/or utilized.
以上闡明之揭示內容涵蓋具有獨立效用之多個獨特發明。雖然此等發明中之每一者已以較佳形式揭示,但其如本文中所揭示並說明的特定具體實例並不在限制性含義上考慮,此係由於大量變化為可能的。本發明之標的包括本文揭示之各種元件、特徵、功能及/或特性之所有新穎及不明顯的組合及子組合。類似地,當任何技術方案敍述「一(a)」或「一第一(a first)」元件或其等效物時,該技術方案應理解為包括併入一或多個該等元件,既不要求亦不排除兩個或多於兩個該等元件。The disclosures set forth above encompass a variety of unique inventions with independent utility. While each of these inventions has been disclosed in its preferred form, the specific embodiments thereof as disclosed and described herein are not to be considered in a limiting sense, as numerous variations are possible. The subject matter of the present invention includes all novel and non-obvious combinations and sub-combinations of the various elements, features, functions, and/or characteristics disclosed herein. Similarly, when any technical solution recites "a" or "a first" element or its equivalent, the technical solution should be understood to include the incorporation of one or more such elements, neither requiring nor excluding two or more such elements.
可經由在相關申請案中呈現新的申請專利範圍來主張在特徵、功能、元件及/或特性之各種組合及子組合中體現的發明。該等新申請專利範圍皆亦視為包括在本發明之發明標的之內,無論其係關於不同發明或關於相同發明,無論不同於、大於、小於或相同於原始申請專利範圍之範疇。Inventions embodied in various combinations and subcombinations of features, functions, elements, and/or properties may be claimed by presenting new patent claims in related applications. Such new patent claims are also deemed to be included within the subject matter of the present invention, regardless of whether they relate to different inventions or to the same invention, and regardless of whether they are different from, larger than, smaller than, or the same in scope as the original patent claims.
20:氫氣產生總成 21:產物氫氣流 22:原料遞送系統 24:燃料處理總成 26:進料流 28:燃料流 30:氫氣產生流體 32:氫氣產生區 34:輸出流 36:蒸汽重組催化劑 38:空氣遞送總成 40:淨化(或分離)區 42:富氫氣流 44:副產物流 46:氫氣選擇性膜 48:化學一氧化碳移除總成 50:變壓吸附(PSA)系統 52:加熱總成 54:排出流(或燃燒流) 58:點火器或點火源 60:燃燒器總成 62:空氣流 64:汽化區 66:殼層或外殼 68:絕緣材料 70:外部封皮或護套 72:氫氣產生總成 74:原料遞送系統 76:汽化區 78:氫氣產生區 80:加熱總成 82:淨化區 84:原料槽(或容器) 86:泵 88:氫氣產生流體 90:進料流 92:汽化器 94:氣相進料流 96:輸出流 97:蒸汽重組區 98:重組催化劑 99:排出流 100:燃燒器總成 102:鼓風機 106:空氣流 108:燃料流 110:燃燒區 111:流量限制孔口 112:滲透物或富氫氣流 114:過濾器總成 116:膜總成 118:甲烷化反應器總成 120:殼層或外殼 122:排出通口 124:燃燒排出流 126:控制系統 128:控制總成 130:閥 132:泄壓閥 134:溫度量測裝置 136:熱交換總成 138:熱交換器 144:氫氣淨化裝置 146:氫氣分離區 148:殼體 149:主體 150:內部容積 152:內部周邊 154:第一部分 156:第二部分 158:保持機構或結構 160:混合氣體區 162:滲透物區 164:輸入通口 166:流體流 168:混合氣體流 170:氫氣 172:其他氣體 174:產物輸出通口 176:滲透物流 178:殘氣流 180:殘氣通口 182:副產物輸出通口 184:副產物流 186:氫氣選擇性膜 188:第一或混合氣體表面 190:第二或滲透物表面 192:氫氣分離總成 194:膜總成 196:氫氣淨化裝置 198:殼層或殼體 200:第一端板或端框架 202:第二端板或端框架 204:內部隔室 205:箔微孔篩網總成 206:氫氣選擇性膜 208:微孔篩網結構 210:進料側 212:滲透側 213:無孔平面薄片 214:表面 215:表面 216:孔隙 217:流體通路 218:穿孔區域(或部分) 219:非穿孔區域(或部分) 220:周邊區域(或部分) 221:邊界區域(或部分) 222:周邊部分 223:縱向軸線 224:板或框架 225:縱向軸線 226:周邊殼層 228:第一支撐部件 230:開放區 232:框架平面 234:第一相對側 236:第二相對側 238:第三相對側 240:第四相對側 242:第一部分 244:第一支撐平面 246:第二支撐部件 248:第三支撐部件 250:第二部分 252:第三部分 254:第二支撐平面 256:第三支撐平面 258:突出部或指 260:進料框架 262:滲透物框架 264:密封墊或密封墊框架 266:進料框架周邊殼層 268:進料框架輸入管道 270:進料框架輸出管道 272:進料框架開放區 274:第一進料框架支撐部件 276:第二進料框架支撐部件 278:第三進料框架支撐部件 302:進料框架突出部或指狀物 340:第一膜支撐板 396:氫氣淨化裝置 398:殼層或殼體 400:第一端板或端框架 402:第二端板或端框架 404:內部隔室 405:箔微孔篩網總成 406:氫氣選擇性膜 424:板或框架 430:開放區 434:第一相對側 436:第二相對側 438:第三相對側 440:第四相對側 460:進料框架 462:滲透物框架 464:密封墊或密封墊框架 20: Hydrogen Generation Assembly 21: Product Hydrogen Stream 22: Feedstock Delivery System 24: Fuel Handling Assembly 26: Feed Stream 28: Fuel Stream 30: Hydrogen Generation Fluid 32: Hydrogen Generation Zone 34: Output Stream 36: Steam Reforming Catalyst 38: Air Delivery Assembly 40: Purification (or Separation) Zone 42: Hydrogen-Enriched Gas Stream 44: Byproduct Stream 46: Hydrogen Selective Membrane 48: Chemical Carbon Monoxide Removal Assembly 50: Pressure Swing Adsorption (PSA) System 52: Heating Assembly 54: Exhaust Stream (or Combustion Stream) 58: Ignitor or Ignition Source 60: Burner Assembly 62: Air Flow 64: Vaporization Zone 66: Shell or Housing 68: Insulation Material 70: External Cover or Jacket 72: Hydrogen Generation Assembly 74: Feedstock Delivery System 76: Vaporization Zone 78: Hydrogen Generation Zone 80: Heating Assembly 82: Purification Zone 84: Feedstock Tank (or Container) 86: Pump 88: Hydrogen Generation Fluid 90: Feed Flow 92: Vaporizer 94: Gas-Phase Feed Flow 96: Output Flow 97: Steam Reforming Zone 98: Reforming Catalyst 99: Exhaust Flow 100: Burner Assembly 102: Blower 106: Air Flow 108: Fuel Flow 110: Combustion Zone 111: Flow Restriction Orifice 112: Permeate or Hydrogen-Enriched Gas Flow 114: Filter Assembly 116: Membrane Assembly 118: Methanation Reactor Assembly 120: Shell or Housing 122: Exhaust Port 124: Combustion Exhaust Flow 126: Control System 128: Control Assembly 130: Valve 132: Pressure Relief Valve 134: Temperature Measuring Device 136: Heat Exchange Assembly 138: Heat Exchanger 144: Hydrogen Purification Unit 146: Hydrogen Separation Zone 148: Housing 149: Main Body 150: Internal volume 152: Internal perimeter 154: First section 156: Second section 158: Retention mechanism or structure 160: Mixed gas zone 162: Permeate zone 164: Inlet port 166: Fluid flow 168: Mixed gas flow 170: Hydrogen 172: Other gases 174: Product outlet port 176: Permeate flow 178: Residual gas flow 180: Residual gas port 182: Byproduct outlet port 184: Byproduct flow 186: Hydrogen-selective membrane 188: First or mixed gas surface 190: Second or permeate surface 192: Hydrogen separation assembly 194: Membrane assembly 196: Hydrogen purification device 198: Shell or housing 200: First end plate or end frame 202: Second end plate or end frame 204: Internal compartment 205: Microporous foil screen assembly 206: Hydrogen-selective membrane 208: Microporous screen structure 210: Feed side 212: Permeate side 213: Non-porous planar sheet 214: Surface 215: Surface 216: Pores 217: Fluid passage 218: Perforated region (or portion) 219: Non-perforated region (or portion) 220: Peripheral region (or portion) 221: Boundary region (or portion) 222: Peripheral portion 223: Longitudinal axis 224: Plate or frame 225: Longitudinal axis 226: Peripheral shell 228: First support member 230: Open area 232: Frame plane 234: First opposing side 236: Second opposing side 238: Third opposing side 240: Fourth opposing side 242: First portion 244: First support plane 246: Second support member 248: Third support member 250: Second portion 252: Third portion 254: Second support plane 256: Third support plane 258: Protrusion or finger 260: Feed frame 262: Permeate frame 264: Sealing pad or sealing pad frame 266: Feed frame peripheral shell 268: Feed frame inlet conduit 270: Feed frame outlet conduit 272: Feed frame open area 274: First feed frame support member 276: Second feed frame support member 278: Third feed frame support member 302: Feed frame protrusion or finger 340: First membrane support plate 396: Hydrogen purification device 398: Shell or housing 400: First end plate or end frame 402: Second end plate or end frame 404: Internal compartment 405: Foil microporous screen assembly 406: Hydrogen-selective membrane 424: Plate or frame 430: Open area 434: First opposing side 436: Second opposing side 438: Third opposing side 440: Fourth opposing side 460: Feed frame 462: Permeate frame 464: Sealing pad or sealing pad frame
[圖1]為氫氣產生總成之實例的示意圖。 [圖2]為圖1之氫氣產生總成之實例的示意圖。 [圖3]為圖1之氫氣產生總成之氫氣淨化裝置的示意圖。 [圖4]為圖3之氫氣淨化裝置之實例的分解立體圖。 [圖5]為圖3之氫氣淨化裝置的箔微孔篩網總成之實例的俯視圖。 [圖6]為圖5之箔微孔篩網總成的微孔篩網結構之實例的俯視圖。 [圖7]為具有孔隙之另一實例的圖6之微孔篩網結構的局部視圖。 [圖8]為具有孔隙之額外實例的圖6之微孔篩網結構的局部視圖。 [圖9]為具有孔隙之另一實例的圖6之微孔篩網結構的局部視圖。 [圖10]為具有孔隙之又一實例的圖6之微孔篩網結構的局部視圖。 [圖11]為圖3之氫氣淨化裝置的箔微孔篩網總成之額外實例的俯視圖。 [圖12]為圖11之箔微孔篩網總成的微孔篩網結構之實例的俯視圖。 [圖13]為圖3之氫氣淨化裝置的箔微孔篩網總成之另一實例的俯視圖。 [圖14]為圖3之氫氣淨化裝置的箔微孔篩網總成之另一實例的俯視圖。 [圖15]為圖3之氫氣淨化裝置之另一實例的分解立體圖。 [Figure 1] is a schematic diagram of an example of a hydrogen generation assembly. [Figure 2] is a schematic diagram of an example of the hydrogen generation assembly of Figure 1. [Figure 3] is a schematic diagram of a hydrogen purification device of the hydrogen generation assembly of Figure 1. [Figure 4] is an exploded perspective view of an example of the hydrogen purification device of Figure 3. [Figure 5] is a top view of an example of a foil microporous screen assembly of the hydrogen purification device of Figure 3. [Figure 6] is a top view of an example of a microporous screen structure of the foil microporous screen assembly of Figure 5. [Figure 7] is a partial view of the microporous screen structure of Figure 6, showing another example of pores. [Figure 8] is a partial view of the microporous screen structure of Figure 6, showing an additional example of pores. [Figure 9] is a partial view of the microporous screen structure of Figure 6, showing another example of pores. [Figure 10] is a partial view of the microporous screen structure of Figure 6, showing yet another example of pores. [Figure 11] is a top view of an additional example of the foil microporous screen assembly of the hydrogen purification device of Figure 3. [Figure 12] is a top view of an example of the microporous screen structure of the foil microporous screen assembly of Figure 11. [Figure 13] is a top view of another example of the foil microporous screen assembly of the hydrogen purification device of Figure 3. [Figure 14] is a top view of another example of the foil microporous screen assembly of the hydrogen purification device of Figure 3. Figure 15 is an exploded perspective view of another example of the hydrogen purification device in Figure 3.
196:氫氣淨化裝置 196: Hydrogen Purification Device
198:殼層或殼體 198: Shell or shell
200:第一端板或端框架 200: First end plate or end frame
202:第二端板或端框架 202: Second end plate or end frame
204:內部隔室 204: Internal compartment
205:箔微孔篩網總成 205: Foil Microporous Screen Assembly
210:進料側 210: Feed side
212:滲透側 212: Penetration side
224:板或框架 224: Board or frame
226:周邊殼層 226: Peripheral shell
228:第一支撐部件 228: First support component
230:開放區 230: Open Area
232:框架平面 232: Frame plane
234:第一相對側 234: First opposite side
236:第二相對側 236: Second opposite side
238:第三相對側 238: Third opposite side
240:第四相對側 240: Fourth opposite side
242:第一部分 242: Part 1
244:第一支撐平面 244: First support plane
246:第二支撐部件 246: Second support component
248:第三支撐部件 248: Third support component
250:第二部分 250: Part 2
252:第三部分 252: Part 3
254:第二支撐平面 254: Second support plane
256:第三支撐平面 256: Third support plane
258:突出部或指 258: protrusion or finger
260:進料框架 260: Feeding frame
262:滲透物框架 262: Permeate Framework
264:密封墊或密封墊框架 264: Sealing gasket or sealing gasket frame
266:進料框架周邊殼層 266: Feed frame peripheral shell
268:進料框架輸入管道 268: Feed frame input pipeline
270:進料框架輸出管道 270: Feed frame output pipeline
272:進料框架開放區 272: Open area of feed frame
274:第一進料框架支撐部件 274: First feed frame support component
276:第二進料框架支撐部件 276: Second feed frame support component
278:第三進料框架支撐部件 278: Third feed frame support component
302:進料框架突出部或指狀物 302: Feed frame protrusions or fingers
340:第一膜支撐板 340: First membrane support plate
Claims (23)
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