TWI891931B - Grinding method and grinding device for workpiece - Google Patents
Grinding method and grinding device for workpieceInfo
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Abstract
[課題]提供一種可抑制加工不良的發生的被加工物之磨削方法。 [解決手段]一種被加工物之磨削方法,是使用磨削裝置來磨削被加工物,前述磨削裝置具備有:保持工作台,以保持面保持被加工物;及磨削單元,以具有配置排列成環狀的複數個磨削磨石之磨削輪來磨削被保持工作台所保持之被加工物,前述被加工物之磨削方法具備以下步驟:溝形成步驟,在不使保持工作台旋轉,且已使磨削輪旋轉的狀態下,使磨削磨石接觸於被加工物來磨削被加工物,而在被加工物形成未到達成品厚度之深度的圓弧狀的溝;及磨削步驟,在已使保持工作台與磨削輪旋轉的狀態下,使磨削磨石接觸於被加工物的形成有溝之面側,並將被加工物磨削到被加工物的厚度成為成品厚度為止。 [Topic] To provide a workpiece grinding method that can suppress the occurrence of machining defects. [Solution] A method for grinding a workpiece comprises grinding the workpiece using a grinding device, the grinding device comprising: a holding table for holding the workpiece with a holding surface; and a grinding unit for grinding the workpiece held by the holding table with a grinding wheel having a plurality of grinding stones arranged in a ring, the method for grinding the workpiece comprising the following steps: a groove forming step, in which the grinding stones are brought into contact with the workpiece without rotating the holding table and the grinding wheel is rotated, thereby grinding the workpiece to form an arc-shaped groove in the workpiece having a depth that does not reach the thickness of the finished product; and a grinding step, in which the grinding stones are brought into contact with the surface of the workpiece on which the groove is formed, while the holding table and the grinding wheel are rotated, and the workpiece is ground until the thickness of the workpiece reaches the thickness of the finished product.
Description
本發明是有關於一種被加工物之磨削方法、及磨削被加工物之磨削裝置。 The present invention relates to a method for grinding a workpiece and a grinding device for grinding the workpiece.
在器件晶片的製造步驟中,可使用以下之晶圓:在被互相交叉之複數條分割預定線(切割道)所區劃出的區域中各自形成有IC(積體電路,Integrated Circuit)、LSI(大型積體電路,Large Scale Integration)等的器件。可藉由沿著分割預定線分割此晶圓,而製造各自具備器件的複數個器件晶片。器件晶片可搭載於行動電話、個人電腦等各種電子機器上。 The device chip manufacturing process uses a wafer with devices such as ICs (Integrated Circuits) and LSIs (Large Scale Integration) formed in areas defined by a plurality of intersecting predetermined dicing lines (slicing streets). By dicing this wafer along the predetermined dicing lines, multiple device chips, each containing a device, are produced. Device chips are used in various electronic devices, such as mobile phones and personal computers.
近年來,隨著電子機器的小型化,對器件晶片也越來越要求薄型化。於是,已使用有以下手法:對分割前的晶圓施行磨削加工來將晶圓薄化。在晶圓的磨削中可使用具備保持工作台與磨削單元之磨削裝置,前述保持工作台會保持晶圓,前述磨削單元會對晶圓進行磨削。 In recent years, with the miniaturization of electronic devices, there has been an increasing demand for thinner device chips. Therefore, a method has been used to thin wafers by grinding them before they are separated. Wafer grinding uses a grinding device equipped with a holding table and a grinding unit. The holding table holds the wafer, while the grinding unit grinds the wafer.
在磨削裝置的磨削單元裝設有磨削輪,前述磨削輪具有配置排列成環狀之複數個磨削磨石。磨削磨石是藉由以結合材(黏結材)來固定以鑽石等所構成之磨粒而形成。在已藉由保持工作台保持晶圓之狀態下,可藉由一面使保持工作台及磨削輪旋轉一面使磨削磨石接觸於晶圓來磨削晶圓(參照專利文獻1)。 The grinding unit of the grinding device is equipped with a grinding wheel having a plurality of grinding stones arranged in a ring. The grinding stones are formed by fixing abrasive grains such as diamonds with a binder. With the wafer held by a holding table, the holding table and grinding wheel are rotated while the grinding stones contact the wafer to grind the wafer (see Patent Document 1).
專利文獻1:日本特開2009-90389號公報 Patent Document 1: Japanese Patent Application Publication No. 2009-90389
在磨削加工中,可藉由使從磨削磨石的結合材突出之磨粒接觸於被加工物來加工被加工物。因此,在被加工物的磨削中,所期望的是維持磨粒適度地從結合材突出之狀態。 During grinding, the workpiece is machined by bringing abrasive grains protruding from the binder of the grinding stone into contact with the workpiece. Therefore, it is desirable to maintain a moderate protrusion of the abrasive grains from the binder during grinding.
當磨削磨石衝撞於被加工物時,磨粒會逐漸從結合材脫落。然而,若於磨粒的脫落後仍繼續進行磨削加工,會發生如下之稱為自發刃之現象:因結合材和被加工物接觸並磨耗而從結合材露出新的磨粒。藉由此自發刃,可維持磨粒從結合材突出之狀態,而可防止磨削磨石的磨削能力的降低。 When a grinding stone impacts the workpiece, abrasive grains gradually break away from the bond. However, if grinding continues even after the abrasive grains have fallen away, a phenomenon known as self-edging occurs: the bond and workpiece come into contact and wear away, exposing new abrasive grains from the bond. This self-edging maintains the abrasive grains protruding from the bond, preventing a reduction in the grinding performance of the grinding stone.
不過,有時會因被加工物的材質或被加工物的被磨削面的狀態,而使磨粒脫落的時間點提前。例如,若在被加工物的被磨削面形成有氧化膜等之薄膜時,磨粒會被薄膜捕獲,而變得容易產生磨粒的脫落。在這樣的情況下,從磨粒脫落後到自發刃完成為止之期間,亦即以磨削磨石的磨削能力變低的狀態磨削被加工物的期間會變長,而變得易於在被加工物產生加工不良。 However, the abrasive grains sometimes fall off earlier depending on the workpiece material or the condition of the surface being ground. For example, if a thin film, such as an oxide film, forms on the surface being ground, the abrasive grains become trapped in the film, making them more likely to fall off. In such cases, the period from abrasive grain falloff until the self-sharpening of the edge—in other words, the period during which the workpiece is ground with the grinding stone's reduced grinding performance—is prolonged, making it more likely that defects will occur in the workpiece.
本發明是有鑒於所述之問題而作成的發明,其目的在於提供一種可抑制加工不良的產生之被加工物之磨削方法及磨削裝置。 The present invention was made in view of the above-mentioned problems, and its object is to provide a method and a grinding device for grinding a workpiece that can suppress the occurrence of machining defects.
根據本發明的一個態樣,可提供一種被加工物之磨削方法,是使用磨削裝置來磨削被加工物,前述磨削裝置具備有:保持工作台,以保持面保持該被加工物;及磨削單元,以具有配置排列成環狀的複數個磨削磨石之磨削輪來磨削被該保持工作台所保持之該被加工物,前述被加工物之磨削方法具備以下步驟:溝形成步驟,在不使該保持工作台旋轉,且已使該磨削輪旋轉的狀態下,使該磨削磨石接觸於該被加工物來磨削該被加工物,而在該被加工物形成未到 達成品厚度之深度的圓弧狀的溝;及磨削步驟,在已使該保持工作台與該磨削輪旋轉的狀態下,使該磨削磨石接觸於該被加工物的形成有該溝之面側,並將該被加工物磨削到該被加工物的厚度成為該成品厚度為止。 According to one aspect of the present invention, a method for grinding a workpiece can be provided, wherein the method uses a grinding device to grind the workpiece, wherein the grinding device comprises: a holding table for holding the workpiece with a holding surface; and a grinding unit for grinding the workpiece held by the holding table with a grinding wheel having a plurality of grinding stones arranged in a ring shape. The method for grinding the workpiece comprises the following steps: a groove forming step, wherein the groove is formed without the holding table; The work table rotates, and while the grinding wheel is rotating, the grinding stone is brought into contact with the workpiece to grind the workpiece, thereby forming an arc-shaped groove in the workpiece that has a depth that does not reach the thickness of the finished product. Furthermore, the grinding step includes, while the holding table and the grinding wheel are rotating, bringing the grinding stone into contact with the surface of the workpiece where the groove is formed, and grinding the workpiece until the thickness of the workpiece reaches the thickness of the finished product.
再者,較佳的是,在該溝形成步驟中,是將該保持工作台的旋轉方向上的角度設定為預定的角度。又,較佳的是,在該溝形成步驟中,是以該保持工作台的旋轉方向上的角度不同的狀態各自磨削該被加工物,而在該被加工物形成複數條該溝。 Furthermore, preferably, in the groove forming step, the angle of the holding table in the rotational direction is set to a predetermined angle. Furthermore, preferably, in the groove forming step, the workpiece is ground at different angles in the rotational direction of the holding table, thereby forming a plurality of grooves in the workpiece.
此外,根據本發明的其他的一個態樣,可提供一種磨削裝置,前述磨削裝置具備有:保持工作台,以保持面保持被加工物;磨削單元,以具有配置成環狀的複數個磨削磨石之磨削輪來磨削被該保持工作台所保持之該被加工物;磨削進給單元,使該保持工作台與該磨削單元沿著和該保持面垂直的方向相對地移動;及控制單元,控制該保持工作台、該磨削單元以及該磨削進給單元, 該控制單元可切換第1模式與第2模式,前述第1模式是在不使該保持工作台旋轉,且已使該磨削輪旋轉的狀態下,藉由該磨削進給單元使該磨削磨石接觸於該被加工物,藉此在該被加工物形成未到達成品厚度之深度的溝,前述第2模式是在已使該保持工作台與該磨削輪旋轉的狀態下,藉由該磨削進給單元使該磨削磨石接觸於該被加工物的形成有該溝之面側,藉此將該被加工物磨削到該被加工物的厚度成為該成品厚度為止。 According to another aspect of the present invention, a grinding device is provided, comprising: a holding table for holding a workpiece with a holding surface; a grinding unit for grinding the workpiece held by the holding table with a grinding wheel having a plurality of grinding stones arranged in a ring; a grinding feed unit for moving the holding table and the grinding unit relative to each other in a direction perpendicular to the holding surface; and a control unit for controlling the holding table, the grinding unit, and the grinding feed unit, wherein the control unit is capable of switching the first The first mode and the second mode are described. In the first mode, the grinding wheel is rotated while the holding table is not rotated, and the grinding stone is brought into contact with the workpiece by the grinding feed unit, thereby forming a groove in the workpiece that does not reach the thickness of the finished product. In the second mode, the grinding wheel is rotated while the holding table and the grinding wheel are rotated, and the grinding stone is brought into contact with the surface of the workpiece where the groove is formed, thereby grinding the workpiece until the thickness of the workpiece reaches the thickness of the finished product.
再者,較佳的是,該控制單元可控制該保持工作台的旋轉方向上的角度。 Furthermore, it is preferred that the control unit can control the angle of the holding table in the rotation direction.
在本發明的一個態樣的被加工物之磨削方法及磨削裝置中,在被 加工物形成未到達成品厚度之深度的圓弧狀的溝之後,使磨削磨石接觸於被加工物的形成有溝之面側,並將被加工物磨削到被加工物的厚度成為成品厚度為止。藉此,在將被加工物磨削並薄化時,磨削磨石會衝撞於溝而促進自發刃。其結果,可維持磨削磨石的磨削能力而抑制加工不良的產生。 In one aspect of the workpiece grinding method and apparatus of the present invention, after forming an arcuate groove in the workpiece that does not reach the finished product thickness, a grinding stone is brought into contact with the grooved surface of the workpiece and the workpiece is ground until its thickness reaches the finished product thickness. As the workpiece is ground and thinned, the grinding stone impacts the groove, promoting self-sharpening. As a result, the grinding stone's grinding performance is maintained, preventing defects from occurring.
2:磨削裝置 2: Grinding device
4,46:基台 4,46:Abutment
4a:開口 4a: Opening
6:搬送單元(搬送機構) 6: Transport unit (transport mechanism)
8a,8b:片匣設置區域 8a, 8b: Cassette mounting area
10a,10b:片匣 10a, 10b: Film cassette
11:被加工物 11: Workpiece
11a:正面(第1面) 11a: Front (Side 1)
11b:背面(第2面) 11b: Back (Side 2)
11c:溝 11c: Groove
11d:磨削痕跡(鋸痕) 11d: Grinding marks (saw marks)
12:對位機構(校準機構) 12: Alignment mechanism (calibration mechanism)
14:搬送單元(搬送機構、裝載臂) 14: Transport unit (transport mechanism, loading arm)
16:轉台 16: Turntable
18:保持工作台(工作夾台) 18: Maintaining the workbench (work clamp)
18a:保持面 18a: Maintaining the surface
20:旋轉驅動源 20: Rotational drive source
22a,22b:支撐構造 22a, 22b: Support structure
24a,24b:磨削進給單元(移動單元、移動機構) 24a, 24b: Grinding feed unit (moving unit, moving mechanism)
26:導軌 26: Guide Rail
28:移動板 28:Mobile board
30:滾珠螺桿 30: Ball screw
32:脈衝馬達 32: Pulse Motor
34a,34b:磨削單元 34a, 34b: Grinding unit
36:殼體 36: Shell
38:主軸 38: Main axis
40:旋轉驅動源 40: Rotational drive source
42:安裝座 42: Mounting seat
44a,44b:磨削輪 44a, 44b: Grinding wheel
48:磨削磨石 48: Grinding Stone
50:厚度測定器 50:Thickness gauge
52a,52b:高度測定器(高度規) 52a, 52b: Altimeter (altimeter)
54:搬送單元(搬送機構、卸載臂) 54: Transport unit (transport mechanism, unloading arm)
56:洗淨單元(洗淨機構) 56: Washing unit (washing mechanism)
58:控制單元(控制部) 58: Control unit (control part)
α:箭頭 α:arrow
A:搬送位置 A:Transportation location
B:第1磨削位置(粗磨削位置) B: 1st grinding position (rough grinding position)
C:第2磨削位置(精磨削位置) C: Second grinding position (finishing grinding position)
X,Y,Z:方向 X, Y, Z: Direction
圖1是顯示磨削裝置的立體圖。 Figure 1 is a perspective view of the grinding device.
圖2是顯示磨削裝置的正面圖。 Figure 2 is a front view of the grinding device.
圖3(A)是顯示溝形成步驟中的磨削裝置的正面圖,圖3(B)是顯示溝形成步驟中的保持工作台以及磨削輪的平面圖。 Figure 3(A) is a front view of the grinding device during the groove forming step, and Figure 3(B) is a plan view of the holding table and grinding wheel during the groove forming step.
圖4(A)是顯示形成有溝之被加工物的平面圖,圖4(B)是顯示形成有複數條溝之被加工物的平面圖。 Figure 4(A) is a plan view of a workpiece with a groove formed therein, and Figure 4(B) is a plan view of a workpiece with multiple grooves formed therein.
圖5(A)是顯示磨削步驟中的磨削裝置的正面圖,圖5(B)是顯示磨削步驟中的保持工作台以及磨削輪的平面圖。 Figure 5(A) is a front view of the grinding device during the grinding step, and Figure 5(B) is a plan view of the holding table and grinding wheel during the grinding step.
圖6是將被磨削磨石所磨削之被加工物的一部分放大而顯示的剖面圖。 Figure 6 is an enlarged cross-sectional view showing a portion of a workpiece being ground by a grinding stone.
圖7是顯示磨削後的被加工物的平面圖。 Figure 7 is a plan view of the workpiece after grinding.
以下,參照附加圖式來說明本發明的一個態樣的實施形態。首先,說明可在本實施形態之被加工物之加工方法中使用的磨削裝置的構成例。圖1是顯示磨削裝置2的立體圖。再者,在圖1中,X軸方向(左右方向、第1水平方向)與Y軸方向(前後方向、第2水平方向)是相互垂直之方向。又,Z軸方向(鉛直方向、上下方向、高度方向)是和X軸方向以及Y軸方向垂直之方向。 The following describes an embodiment of one aspect of the present invention with reference to the accompanying drawings. First, an example configuration of a grinding device that can be used in the workpiece processing method of this embodiment will be described. FIG1 is a perspective view of a grinding device 2. Furthermore, in FIG1 , the X-axis direction (left-right direction, first horizontal direction) and the Y-axis direction (front-back direction, second horizontal direction) are perpendicular to each other. Furthermore, the Z-axis direction (vertical direction, up-down direction, height direction) is perpendicular to the X-axis and Y-axis directions.
磨削裝置2具備基台4,前述基台4會支撐以及容置構成磨削裝置2之各構成要素。在基台4的前端部的上表面側設有矩形狀的開口4a,在開口4a的 內部設置有搬送單元(搬送機構)6,前述搬送單元(搬送機構)6會搬送可藉由磨削裝置2來加工之被加工物11。 The grinding device 2 includes a base 4 that supports and houses the various components that make up the grinding device 2. A rectangular opening 4a is provided on the top surface of the front end of the base 4. A transport unit (transport mechanism) 6 is located within the opening 4a. This transport unit (transport mechanism) 6 transports the workpiece 11 to be processed by the grinding device 2.
於搬送單元6的兩側設置有片匣設置區域8a、8b。在片匣設置區域8a、8b上分別供容置被加工物11之片匣10a、10b設置。可在片匣10a容置可藉由磨削裝置2來加工之預定的複數個被加工物11(加工前的被加工物11)。另一方面,可在片匣10b容置已藉由磨削裝置2加工之複數個被加工物11(加工後的被加工物11)。 Cassette mounting areas 8a and 8b are provided on both sides of the transport unit 6. Cassettes 10a and 10b for accommodating workpieces 11 are mounted on the cassette mounting areas 8a and 8b, respectively. Cassette 10a can accommodate a plurality of workpieces 11 predetermined for processing by the grinding device 2 (pre-processed workpieces 11). Cassette 10b, on the other hand, can accommodate a plurality of workpieces 11 already processed by the grinding device 2 (post-processed workpieces 11).
例如被加工物11是形成為圓盤狀之矽晶圓,且具備互相大致平行的正面(第1面)11a以及背面(第2面)11b。被加工物11被以互相交叉的方式配置排列成格子狀之複數條分割預定線(切割道)區劃成複數個矩形狀的區域。並且,在藉由分割預定線所區劃出之區域的正面11a側分別形成有IC、LSI等器件。 For example, the workpiece 11 is a disk-shaped silicon wafer having a front surface (first surface) 11a and a back surface (second surface) 11b that are substantially parallel to each other. The workpiece 11 is divided into a plurality of rectangular regions by a plurality of predetermined dividing lines (slicing streets) arranged in a grid pattern. Furthermore, devices such as ICs and LSIs are formed on the front surface 11a of the regions defined by the predetermined dividing lines.
可藉由沿著分割預定線分割被加工物11,而製造各自具備器件之複數個器件晶片。又,若在被加工物11的分割前藉由磨削裝置2來將被加工物11磨削並薄化,可得到已薄型化之器件晶片。 By dividing the workpiece 11 along predetermined dividing lines, multiple device wafers, each containing a device, can be produced. Furthermore, by grinding and thinning the workpiece 11 using the grinding device 2 before dividing, thinned device wafers can be obtained.
不過,對被加工物11的種類、材質、大小、形狀、構造等並無限制。例如被加工物11亦可為以矽以外之半導體(砷化鎵(GaAs)、磷化銦(InP)、氮化鎵(GaN)、碳化矽(SiC)等)、玻璃、陶瓷、樹脂、金屬等所構成之基板。又,對形成於被加工物11之器件的種類、數量、形狀、構造、大小、配置等也無限制,在被加工物11亦可未形成有器件。 However, there are no restrictions on the type, material, size, shape, or structure of the workpiece 11. For example, the workpiece 11 may be a substrate made of semiconductors other than silicon (such as gallium arsenide (GaAs), indium phosphide (InP), gallium nitride (GaN), or silicon carbide (SiC)), glass, ceramics, resin, or metal. Furthermore, there are no restrictions on the type, number, shape, structure, size, or placement of devices formed on the workpiece 11, and the workpiece 11 may not even have devices formed on it.
在開口4a的斜後方設有對位機構(校準機構)12。已容置於片匣10a之被加工物11可藉由搬送單元6來搬送到對位機構12。然後,對位機構12會將被加工物11對齊於預定的位置來配置。 An alignment mechanism (calibration mechanism) 12 is located diagonally behind the opening 4a. The workpiece 11 contained in the cassette 10a is transported to the alignment mechanism 12 by the transport unit 6. The alignment mechanism 12 then aligns the workpiece 11 at a predetermined position.
在相鄰於對位機構12的位置,設有搬送被加工物11之搬送單元(搬送機構、裝載臂)14。搬送單元14具備吸引並保持被加工物11的上表面側之 吸附墊。然後,搬送單元14藉由以吸附墊保持已藉由對位機構12進行對位之被加工物11,並使吸附墊旋繞,而將被加工物11朝後方搬送。 Adjacent to the alignment mechanism 12 is a transport unit (transport mechanism, loading arm) 14 that transports the workpiece 11. The transport unit 14 includes a suction pad that attracts and holds the top surface of the workpiece 11. The transport unit 14 then rotates the suction pad while holding the workpiece 11, aligned by the alignment mechanism 12, to transport the workpiece 11 rearward.
於搬送單元14的後方設置有圓盤狀的轉台16。於轉台16連結有伺服馬達等的旋轉驅動源(未圖示),且旋轉驅動源使轉台16以繞著大致平行於Z軸方向的旋轉軸的方式旋轉。 A disc-shaped turntable 16 is installed behind the conveyor unit 14. A rotational drive source (not shown), such as a servo motor, is connected to the turntable 16, and the rotational drive source rotates the turntable 16 about a rotation axis that is generally parallel to the Z-axis.
在轉台16上設有保持被加工物11之複數個保持工作台(工作夾台)18。在圖1中所顯示的是以下例子:已將3個保持工作台18沿著轉台16的圓周方向大致等間隔地配置。轉台16會朝在平面視角下逆時針方向(以箭頭α所示之方向)旋轉,而將各保持工作台18依搬送位置A、第1磨削位置(粗磨削位置)B、第2磨削位置(精磨削位置)C、搬送位置A的順序來定位。 A plurality of holding tables (work clamps) 18 are mounted on the turntable 16 to hold the workpiece 11. Figure 1 shows an example in which three holding tables 18 are arranged at approximately equal intervals along the circumference of the turntable 16. The turntable 16 rotates counterclockwise (indicated by arrow α) when viewed from above, positioning each holding table 18 in the order of transport position A, first grinding position (rough grinding position) B, second grinding position (finish grinding position) C, and transport position A.
在保持工作台18分別連結有使保持工作台18旋轉之旋轉驅動源20(參照圖2)。例如,旋轉驅動源20可為伺服馬達,並且使保持工作台18以繞著大致平行於Z軸方向之旋轉軸的方式旋轉。再者,旋轉驅動源20具備有檢測旋轉驅動源20的輸出軸的旋轉角度(保持工作台18的旋轉角度)之檢測器(編碼器)。 Each holding table 18 is connected to a rotational drive source 20 (see Figure 2) for rotating the holding table 18. For example, the rotational drive source 20 may be a servo motor, and rotates the holding table 18 about a rotation axis generally parallel to the Z-axis. Furthermore, the rotational drive source 20 includes a detector (encoder) for detecting the rotation angle of the output shaft of the rotational drive source 20 (the rotation angle of the holding table 18).
在第1磨削位置B的後方配置有柱狀的支撐構造22a,在第2磨削位置C的後方配置有柱狀的支撐構造22b。在支撐構造22a的前表面側設置有磨削進給單元(移動單元、移動機構)24a,且在支撐構造22b的前表面側設置有磨削進給單元(移動單元、移動機構)24b。 A columnar support structure 22a is located behind the first grinding position B, and a columnar support structure 22b is located behind the second grinding position C. A grinding feed unit (moving unit, moving mechanism) 24a is located in front of the support structure 22a, and a grinding feed unit (moving unit, moving mechanism) 24b is located in front of the support structure 22b.
磨削進給單元24a、24b各自具備大致平行於Z軸方向地配置的一對導軌26。在一對導軌26上,以可沿著導軌26滑動的狀態裝設有板狀的移動板28。在移動板28的後表面側(背面側)設有螺帽部(未圖示),在此螺帽部螺合有和導軌26大致平行地配置之滾珠螺桿30。又,在滾珠螺桿30的端部連結有脈衝馬達32。當以脈衝馬達32使滾珠螺桿30旋轉時,移動板28即沿著Z軸方向移動。 Each grinding feed unit 24a, 24b includes a pair of guide rails 26 arranged roughly parallel to the Z-axis. A plate-shaped moving plate 28 is mounted on the guide rails 26 so as to slide along the guide rails 26. A nut (not shown) is provided on the rear surface (back side) of the moving plate 28. A ball screw 30 arranged roughly parallel to the guide rails 26 is screwed into the nut. A pulse motor 32 is connected to the end of the ball screw 30. When the pulse motor 32 rotates the ball screw 30, the moving plate 28 moves along the Z-axis.
在磨削進給單元24a所具備之移動板28的前表面側(正面側)固定有 進行被加工物11的粗磨削之磨削單元34a。另一方面,在磨削進給單元24b所具備之移動板28的前表面側(正面側)固定有進行被加工物11的精磨削之磨削單元34b。磨削進給單元24a、24b藉由使磨削單元34a、34b升降,而使保持工作台18與磨削單元34a、34b沿著和保持工作台18的保持面18a(參照圖2)垂直的方向相對地移動。 A grinding unit 34a, which performs rough grinding of the workpiece 11, is fixed to the front surface (front side) of the movable plate 28 of the grinding feed unit 24a. Meanwhile, a grinding unit 34b, which performs fine grinding of the workpiece 11, is fixed to the front surface (front side) of the movable plate 28 of the grinding feed unit 24b. The grinding feed units 24a and 24b raise and lower the grinding units 34a and 34b, thereby moving the holding table 18 relative to the grinding units 34a and 34b in a direction perpendicular to the holding surface 18a of the holding table 18 (see Figure 2).
磨削單元34a、34b分別具備中空的圓筒狀的殼體36。在殼體36的內部容置有沿著Z軸方向而配置之圓筒狀的主軸38(參照圖2)。主軸38的前端部(下端側)是從殼體36露出。又,在主軸38的基端部(上端側)連結有旋轉驅動源40。例如,旋轉驅動源40可為伺服馬達,並使主軸38以繞著大致平行於Z軸方向的旋轉軸的方式旋轉。 Grinding units 34a and 34b each have a hollow cylindrical housing 36. Housing 36 houses a cylindrical spindle 38 (see Figure 2) arranged along the Z-axis. The front end (lower end) of spindle 38 protrudes from housing 36. A rotational drive source 40 is connected to the base end (upper end) of spindle 38. For example, rotational drive source 40 can be a servo motor, which rotates spindle 38 about an axis generally parallel to the Z-axis.
圖2是顯示磨削裝置2的正面圖。在圖2中圖示有已配置於第1磨削位置B之保持工作台18、與磨削單元34a。 Figure 2 is a front view of the grinding device 2. Figure 2 shows the holding table 18 and the grinding unit 34a positioned at the first grinding position B.
保持工作台18的上表面會構成保持被加工物11之保持面18a。保持面18a是和X軸方向以及Y軸方向大致平行的平坦面,且例如和被加工物11的形狀對應而形成為圓形。又,保持面18a已透過形成於保持工作台18的內部之流路(未圖示)、閥(未圖示)等而連接到噴射器等之吸引源(未圖示)。若在已將被加工物11配置於保持面18a上的狀態下,使吸引源的負壓作用在保持面18a,即可藉由保持工作台18來吸引保持被加工物11。 The top surface of the holding table 18 forms a holding surface 18a for holding the workpiece 11. The holding surface 18a is a flat surface roughly parallel to the X- and Y-axes, and is formed, for example, into a circular shape corresponding to the shape of the workpiece 11. Furthermore, the holding surface 18a is connected to a suction source (not shown), such as an ejector, via a flow path (not shown) and a valve (not shown) formed within the holding table 18. With the workpiece 11 positioned on the holding surface 18a, negative pressure from the suction source is applied to the holding surface 18a, allowing the holding table 18 to suction and hold the workpiece 11.
磨削單元34a的主軸38的下端部固定有以金屬等所構成之圓盤狀的安裝座42。並且,於安裝座42的下表面側裝設有粗磨削用之磨削輪44a。磨削輪44a是藉由從旋轉驅動源40(參照圖1)透過主軸38以及安裝座42所傳達的動力,而繞著和Z軸方向大致平行的旋轉軸旋轉。 A disc-shaped mounting base 42, made of metal or the like, is fixed to the lower end of the main shaft 38 of the grinding unit 34a. A grinding wheel 44a for rough grinding is mounted on the lower surface of the mounting base 42. The grinding wheel 44a rotates about an axis generally parallel to the Z-axis direction, driven by power transmitted from a rotational drive source 40 (see Figure 1) through the main shaft 38 and the mounting base 42.
磨削輪44a具備環狀的基台46,前述環狀的基台46是以鋁、不鏽鋼等的金屬所構成且形成為和安裝座42大致相同直徑。於基台46的下表面側, 已沿著基台46的圓周方向將複數個長方體狀之磨削磨石48配置排列成環狀。例如磨削磨石48可藉由將鑽石、cBN(立方氮化硼,cubic Boron Nitride)等所構成之磨粒以金屬結合劑、樹脂結合劑、陶瓷結合劑(vitrified bond)等之結合材來固定而形成。不過,對磨削磨石48的材質、形狀、構造、大小等並無限制,也可以將磨削輪44a所具備之磨削磨石48的數量任意地設定。 The grinding wheel 44a includes an annular base 46 made of a metal such as aluminum or stainless steel and having a diameter approximately the same as that of the mounting base 42. On the underside of the base 46, a plurality of rectangular grinding stones 48 are arranged in a ring along the circumference of the base 46. For example, the grinding stones 48 can be formed by fixing abrasive grains such as diamond or cBN (cubic boron nitride) with a bonding material such as a metal bond, a resin bond, or a vitrified bond. However, there are no restrictions on the material, shape, structure, size, etc. of the grinding stones 48, and the number of grinding stones 48 included in the grinding wheel 44a can be arbitrarily set.
圖1所示之磨削單元34b為和磨削單元34a同樣地被構成。並且,於磨削單元34b的安裝座42的下表面側裝設有精磨削用的磨削輪44b。磨削輪44b的構成會和磨削輪44a同樣。不過,包含於磨削輪44b的磨削磨石48之磨粒的平均粒徑會比包含於磨削輪44a的磨削磨石48之磨粒的平均粒徑更小。 The grinding unit 34b shown in Figure 1 is constructed similarly to the grinding unit 34a. Furthermore, a grinding wheel 44b for fine grinding is mounted on the lower surface of the mounting base 42 of the grinding unit 34b. The construction of the grinding wheel 44b is similar to that of the grinding wheel 44a. However, the average particle size of the abrasive grains in the grinding stone 48 of the grinding wheel 44b is smaller than that of the grinding stone 48 of the grinding wheel 44a.
磨削單元34a以磨削輪44a磨削已定位在第1磨削位置B之保持工作台18所保持之被加工物11。藉此,可對被加工物11施行粗磨削。又,磨削單元34b以磨削輪44b磨削已定位在第2磨削位置C之保持工作台18所保持之被加工物11。藉此,可對被加工物11施行精磨削。 The grinding unit 34a uses a grinding wheel 44a to grind the workpiece 11 held by the holding table 18 positioned at the first grinding position B. This rough grinding is performed on the workpiece 11. The grinding unit 34b uses a grinding wheel 44b to grind the workpiece 11 held by the holding table 18 positioned at the second grinding position C. This fine grinding is performed on the workpiece 11.
再者,在磨削單元34a、34b的內部或附近分別設有用於供給純水等之液體(磨削液)之磨削液供給路(未圖示)。可在對被加工物11施行磨削加工時,將磨削液供給到被加工物11以及磨削磨石48。 Furthermore, grinding fluid supply passages (not shown) for supplying a liquid (grinding fluid) such as pure water are provided inside or near each of the grinding units 34a and 34b. During the grinding process, the grinding fluid is supplied to the workpiece 11 and the grinding stone 48.
在已定位於第1磨削位置B之保持工作台18的附近、與已定位於第2磨削位置C之保持工作台18的附近各自設置有測定被保持工作台18所保持之被加工物11的厚度之厚度測定器50。厚度測定器50具備測定被保持工作台18所保持之被加工物11的上表面的高度之高度測定器(高度規)52a、與測定保持工作台18的上表面(保持面18a)的高度之高度測定器(高度規)52b。並且,厚度測定器50依據藉由高度測定器52a、52b所測定出之值的差分來計算被加工物11的厚度。 Thickness measuring devices 50 are installed near the holding table 18 positioned at the first grinding position B and near the holding table 18 positioned at the second grinding position C. Each thickness measuring device 50 measures the thickness of the workpiece 11 held by the holding table 18. The thickness measuring device 50 includes a height measuring device (height gauge) 52a for measuring the height of the top surface of the workpiece 11 held by the holding table 18, and a height measuring device (height gauge) 52b for measuring the height of the top surface (holding surface 18a) of the holding table 18. The thickness measuring device 50 calculates the thickness of the workpiece 11 based on the difference between the values measured by the height measuring devices 52a and 52b.
在X軸方向上相鄰於搬送單元14之位置,設置有搬送被加工物11 之搬送單元(搬送機構、卸載臂)54。搬送單元54具備吸引並保持被加工物11的上表面側之吸附墊。並且,搬送單元54藉由以吸附墊保持已被配置在搬送位置A之保持工作台18所保持之被加工物11,並使吸附墊旋繞,而將被加工物11朝前方搬送。 Adjacent to the transport unit 14 in the X-axis direction is a transport unit (transport mechanism, unloading arm) 54 for transporting the workpiece 11. The transport unit 54 includes a suction pad that attracts and holds the top surface of the workpiece 11. The transport unit 54 uses the suction pad to hold the workpiece 11 held by the holding table 18 at transport position A and rotates the suction pad to transport the workpiece 11 forward.
在搬送單元54的前方側配置有洗淨單元(洗淨機構)56,前述洗淨單元56會將已藉由搬送單元54所搬送來之被加工物11洗淨。可將已被洗淨單元56洗淨之被加工物11藉由搬送單元6來搬送並容置到片匣10b。 A cleaning unit (cleaning mechanism) 56 is located in front of the transport unit 54. The cleaning unit 56 cleans the workpiece 11 transported by the transport unit 54. The workpiece 11 cleaned by the cleaning unit 56 is then transported by the transport unit 6 and placed in the cassette 10b.
又,磨削裝置2具備已連接於構成磨削裝置2之各構成要素(搬送單元6、對位機構12、搬送單元14、轉台16、保持工作台18、旋轉驅動源20、磨削進給單元24a、24b、磨削單元34a、34b、厚度測定器50、搬送單元54、洗淨單元56等)之控制單元(控制部)58。可藉由控制單元58來控制磨削裝置2的構成要素的動作。 The grinding apparatus 2 also includes a control unit (control section) 58 connected to each component of the grinding apparatus 2 (such as the conveying unit 6, the positioning mechanism 12, the conveying unit 14, the turntable 16, the holding table 18, the rotary drive source 20, the grinding feed units 24a and 24b, the grinding units 34a and 34b, the thickness gauge 50, the conveying unit 54, and the cleaning unit 56). The control unit 58 controls the operation of the components of the grinding apparatus 2.
例如控制單元58可由電腦來構成,且包含處理部與記憶部,前述處理部會進行在磨削裝置2的運轉上所需要的運算等處理,前述記憶部會記憶使用於由處理部所進行之處理的各種資訊(資料、程式等)。處理部包含CPU(中央處理單元,Central Processing Unit)等的處理器而構成。又,記憶部包含作為主記憶裝置、輔助記憶裝置等而發揮功能之各種記憶體而構成。控制單元58藉由執行已記憶於記憶部之程式,而生成用於控制磨削裝置2的構成要素之訊號(控制訊號)。 For example, the control unit 58 can be configured as a computer and include a processing unit and a memory unit. The processing unit performs the calculations and other processing required for the operation of the grinding device 2, while the memory unit stores various information (data, programs, etc.) used in the processing performed by the processing unit. The processing unit includes a processor such as a CPU (Central Processing Unit). The memory unit includes various memories that function as main memory devices, auxiliary memory devices, etc. The control unit 58 generates signals (control signals) for controlling the components of the grinding device 2 by executing the programs stored in the memory unit.
接著,說明使用磨削裝置2來對被加工物11進行磨削的被加工物之磨削方法的具體例。在以下作為一例,針對如下之情況來說明:磨削被加工物11的背面11b側,並將被加工物11薄化至被加工物11的厚度成為預定的厚度(成品厚度)為止。 Next, a specific example of a workpiece grinding method using the grinding device 2 to grind the workpiece 11 will be described. As an example, the following description focuses on a case where the back surface 11b of the workpiece 11 is ground to thin the workpiece 11 until the thickness reaches a predetermined thickness (finished product thickness).
首先,將成為由磨削裝置2所進行之磨削的對象之被加工物11容 置於片匣10a,並將片匣10a設置到片匣設置區域8a上。然後,藉由搬送單元6將被加工物11從片匣10a取出並搬送到對位機構12,而藉由對位機構12來進行被加工物11的對位。之後,藉由搬送單元14將被加工物11從對位機構12搬送到已配置在搬送位置A之保持工作台18。 First, the workpiece 11 to be ground by the grinding device 2 is placed in the magazine 10a and set on the magazine setting area 8a. The transport unit 6 then removes the workpiece 11 from the magazine 10a and transports it to the alignment mechanism 12, where the alignment mechanism 12 aligns the workpiece 11. The transport unit 14 then transports the workpiece 11 from the alignment mechanism 12 to the holding table 18, which is positioned at the transport position A.
例如將被加工物11如圖2所示地在保持工作台18上配置成正面11a側和保持面18a相面對且背面11b側朝上方露出。在此狀態下,若使吸引源的負壓作用於保持面18a,被加工物11即可被保持工作台18吸引保持。再者,在被加工物11的正面11a側形成有器件的情況下,亦可事先在被加工物11的正面11a側貼附保護器件之保護膠帶。在此情況下,被加工物11會隔著保護膠帶被保持工作台18所吸引保持。 For example, as shown in Figure 2, the workpiece 11 is placed on the holding table 18 with its front side 11a facing the holding surface 18a and its back side 11b exposed upward. In this position, applying negative pressure from a suction source to the holding surface 18a allows the workpiece 11 to be held by the holding table 18. Furthermore, if a device is formed on the front side 11a of the workpiece 11, protective tape can be attached to the front side 11a of the workpiece 11 to protect the device. In this case, the workpiece 11 is held by the holding table 18 through the protective tape.
其次,使轉台16旋轉,而將保持有被加工物11之保持工作台18配置到第1磨削位置B。然後,藉由磨削單元34a磨削已被保持工作台18所保持之被加工物11。 Next, the turntable 16 is rotated to position the holding table 18 holding the workpiece 11 at the first grinding position B. The grinding unit 34a then grinds the workpiece 11 held by the holding table 18.
在本實施形態中,首先是藉由以磨削單元34a磨削被加工物11,而在被加工物11上形成圓弧狀的溝(溝形成步驟)。圖3(A)是顯示溝形成步驟中的磨削裝置2的正面圖。 In this embodiment, the workpiece 11 is first ground by the grinding unit 34a to form an arc-shaped groove in the workpiece 11 (groove forming step). Figure 3(A) is a front view of the grinding device 2 showing the groove forming step.
在溝形成步驟中,首先是藉由旋轉驅動源20將保持工作台18的旋轉方向上的角度設定為預定的角度(例如初始角度(0°))。然後,在不旋轉保持工作台18的情形下,藉由旋轉驅動源40(參照圖1)使磨削輪44a以預定的旋轉數來旋轉。此時,磨削輪44a的磨削磨石48會旋轉成通過和被加工物11的中心重疊之位置。然後,藉由磨削進給單元24a使磨削輪44a以預定的速度下降(磨削進給),並使旋轉之磨削磨石48接觸於被加工物11的背面11b(被磨削面)側。 In the groove forming step, the rotational angle of the holding table 18 is first set to a predetermined angle (e.g., an initial angle of 0°) by the rotational drive source 20. Then, without rotating the holding table 18, the rotational drive source 40 (see Figure 1) rotates the grinding wheel 44a at a predetermined number of revolutions. At this point, the grinding stone 48 of the grinding wheel 44a rotates until it overlaps the center of the workpiece 11. The grinding feed unit 24a then lowers the grinding wheel 44a at a predetermined speed (grinding feed), bringing the rotating grinding stone 48 into contact with the back surface 11b (grinded surface) of the workpiece 11.
若一面使磨削磨石48接觸於被加工物11的背面11b側一面使磨削輪44a下降,被加工物11的背面11b側會被磨削磨石48磨削。再者,磨削輪44a的 下降速度是調整成以適當的力來將磨削磨石48壓附於被加工物11的背面11b側。 As the grinding wheel 44a is lowered while the grinding stone 48 contacts the back surface 11b of the workpiece 11, the back surface 11b of the workpiece 11 is ground by the grinding stone 48. Furthermore, the lowering speed of the grinding wheel 44a is adjusted to press the grinding stone 48 against the back surface 11b of the workpiece 11 with an appropriate force.
圖3(B)是顯示溝形成步驟中的保持工作台18以及磨削輪44a的平面圖。若在不使保持工作台18旋轉的情形下使磨削輪44a旋轉來磨削被加工物11,會沿著旋轉之磨削磨石48的軌道來磨削被加工物11。其結果,在被加工物11的背面11b側會形成具有和磨削磨石48的寬度相同寬度之圓弧狀的溝11c。 Figure 3(B) is a plan view of the holding table 18 and grinding wheel 44a during the groove forming step. If the grinding wheel 44a is rotated to grind the workpiece 11 without rotating the holding table 18, the workpiece 11 is ground along the path of the rotating grinding stone 48. As a result, an arc-shaped groove 11c having the same width as the grinding stone 48 is formed on the back surface 11b of the workpiece 11.
圖4(A)是顯示形成有溝11c之被加工物11的平面圖。溝11c形成為從被加工物11的一端通過中心而到達另一端之圓弧狀。然後,當被加工物11的磨削量(溝11c的深度)到達預定之值時,即停止由磨削輪44a所進行之被加工物11的磨削。再者,溝11c是形成為未到達在後述之磨削步驟中被磨削後之被加工物11的最終的厚度(成品厚度)之深度。例如可將溝11c的深度設定為:被加工物11的成品厚度與溝11c的厚度之差為20μm以上。 Figure 4(A) shows a plan view of a workpiece 11 having a groove 11c formed therein. The groove 11c is formed in an arc shape, extending from one end of the workpiece 11 through the center to the other end. When the amount of workpiece 11 removed (the depth of the groove 11c) reaches a predetermined value, grinding of the workpiece 11 by the grinding wheel 44a is stopped. Furthermore, the groove 11c is formed to a depth that does not reach the final thickness (finished product thickness) of the workpiece 11 after grinding in the grinding step described below. For example, the depth of the groove 11c can be set so that the difference between the final thickness of the workpiece 11 and the thickness of the groove 11c is at least 20 μm.
在溝形成步驟中,亦可在被加工物11形成複數條溝11c。在此情況下,是在形成第1條溝11c之後,藉由旋轉驅動源20使保持工作台18旋轉預定的角度量,而變更保持工作台18的旋轉方向上的角度。然後,藉由磨削磨石48磨削被加工物11,而在被加工物11的背面11b側形成第2條圓弧狀的溝11c。之後,以同樣的順序來形成第3條以後的溝11c。 During the groove forming step, multiple grooves 11c may be formed in the workpiece 11. In this case, after forming the first groove 11c, the rotary drive source 20 rotates the holding table 18 by a predetermined angle, thereby changing the angle of rotation of the holding table 18. The workpiece 11 is then ground with the grinding stone 48 to form a second arc-shaped groove 11c on the back surface 11b of the workpiece 11. The third and subsequent grooves 11c are then formed in the same manner.
圖4(B)是顯示形成有複數條溝11c之被加工物11的平面圖。例如,在形成第1條溝11c之後,若重複進行3次使保持工作台18旋轉90°並以磨削磨石48磨削被加工物11之步驟後,會如圖4(B)所示地在被加工物11的背面11b側形成4條圓弧狀的溝11c。如此,可藉由以保持工作台18的旋轉方向上的角度不同的狀態來各自磨削被加工物11,而在被加工物11上形成複數條溝11c。 Figure 4(B) is a plan view of a workpiece 11 having multiple grooves 11c formed thereon. For example, after forming the first groove 11c, if the step of rotating the holding table 18 90° and grinding the workpiece 11 with the grinding stone 48 is repeated three times, four arc-shaped grooves 11c will be formed on the back surface 11b of the workpiece 11, as shown in Figure 4(B). In this way, by grinding the workpiece 11 at different angles in the rotational direction of the holding table 18, multiple grooves 11c can be formed on the workpiece 11.
接著,磨削被加工物11直到被加工物11的厚度成為成品厚度為止(磨削步驟)。圖5(A)是顯示磨削步驟中的磨削裝置2的正面圖。 Next, the workpiece 11 is ground until the thickness of the workpiece 11 reaches the finished product thickness (grinding step). Figure 5(A) is a front view of the grinding device 2 showing the grinding step.
在磨削步驟中,是藉由旋轉驅動源20(參照圖2)使保持工作台18以預定的旋轉數來旋轉,並且藉由旋轉驅動源40(參照圖1)使磨削輪44a以預定的旋轉數來旋轉。此時,磨削輪44a的磨削磨石48會旋轉成通過和被加工物11的中心重疊之位置。然後,藉由磨削進給單元24a使磨削輪44a以預定的速度下降(磨削進給),並使旋轉之磨削磨石48接觸於被加工物11的形成有溝11c之面側(背面11b側)。 During the grinding step, the holding table 18 is rotated at a predetermined rotational speed by the rotary drive source 20 (see Figure 2 ), and the grinding wheel 44a is rotated at a predetermined rotational speed by the rotary drive source 40 (see Figure 1 ). The grinding stone 48 of the grinding wheel 44a rotates until it overlaps the center of the workpiece 11 . The grinding feed unit 24a then lowers the grinding wheel 44a at a predetermined speed (grinding feed), bringing the rotating grinding stone 48 into contact with the surface of the workpiece 11 where the groove 11c is formed (the back surface 11b).
若一面使磨削磨石48接觸於被加工物11的背面11b側一面使磨削輪44a下降,被加工物11的背面11b側會被磨削磨石48磨削。再者,磨削輪44a的下降速度是調整成以適當的力來將磨削磨石48壓附於被加工物11的背面11b側。 As the grinding wheel 44a is lowered while the grinding stone 48 contacts the back side 11b of the workpiece 11, the back side 11b of the workpiece 11 is ground by the grinding stone 48. Furthermore, the lowering speed of the grinding wheel 44a is adjusted so that the grinding stone 48 is pressed against the back side 11b of the workpiece 11 with an appropriate force.
圖5(B)是顯示磨削步驟中的保持工作台18以及磨削輪44a的平面圖。當使保持工作台18以及磨削輪44a旋轉來磨削被加工物11時,會磨削被加工物11的背面11b側的整體,而將被加工物11薄化。 Figure 5(B) is a plan view of the holding table 18 and grinding wheel 44a during the grinding step. When the holding table 18 and grinding wheel 44a rotate to grind the workpiece 11, the entire back surface 11b of the workpiece 11 is ground, thinning the workpiece 11.
圖6是將被磨削磨石48所磨削之被加工物11的一部分放大而顯示的剖面圖。在被加工物11的磨削中,複數個磨削磨石48會各自從被加工物11的外周緣朝向中心來接觸。並且,在旋轉之磨削磨石48通過溝11c時,磨削磨石48的下表面側會衝撞於溝11c的內壁,而變得容易產生磨削磨石48的結合材的磨耗。其結果,可促進已埋入結合材的內部之狀態的磨粒從結合材露出之自發刃,而抑制磨削磨石48的磨削能力的降低。 Figure 6 is an enlarged cross-sectional view of a portion of the workpiece 11 being ground by the grinding stones 48. During grinding of the workpiece 11, the multiple grinding stones 48 contact the workpiece 11 from its outer periphery toward its center. Furthermore, as the rotating grinding stones 48 pass through the grooves 11c, the lower surfaces of the grinding stones 48 collide with the inner walls of the grooves 11c, facilitating wear of the bonding material of the grinding stones 48. This promotes the spontaneous generation of abrasive grains embedded within the bonding material, thereby suppressing any degradation of the grinding performance of the grinding stones 48.
特別是,在被加工物11的背面11b側形成有氧化膜等薄膜的情況下,磨削磨石48會被薄膜捕獲而易於從結合材脫落。然而,因為可如上述地藉由溝11c來促進磨削磨石48的自發刃,所以可以使磨削磨石48的磨削能力迅速地回復。 In particular, if a thin film, such as an oxide film, forms on the back surface 11b of the workpiece 11, the grinding stone 48 can be caught in the film and easily fall off the bonding material. However, as described above, the groove 11c promotes the self-sharpening of the grinding stone 48, allowing the grinding performance of the grinding stone 48 to be quickly restored.
當將被加工物11磨削至被加工物11的厚度到達預定的厚度(成品 厚度)時,即停止由磨削輪44a所進行之被加工物11的磨削。藉此,被加工物11的粗磨削即完成。圖7是顯示磨削後的被加工物11的平面圖。於磨削後的被加工物11的背面11b側會殘存從被加工物11的中央朝向外周緣呈放射狀地形成之磨削痕跡(鋸痕)11d。此磨削痕跡11d沿著旋轉之磨削磨石48的軌跡而形成為曲線狀。 When the workpiece 11 reaches a predetermined thickness (the finished product thickness), the grinding wheel 44a stops grinding the workpiece 11. This completes the rough grinding of the workpiece 11. Figure 7 is a plan view of the workpiece 11 after grinding. Grinding marks (saw marks) 11d remain on the back surface 11b of the workpiece 11 after grinding, extending radially from the center toward the periphery. These grinding marks 11d are formed in a curved pattern along the trajectory of the rotating grinding stone 48.
再者,在由磨削輪44a所進行之被加工物11的磨削中,可藉由厚度測定器50(參照圖1)來測定被加工物11的厚度。然後,可依據藉由厚度測定器50所測定出之被加工物11的厚度,來控制讓由磨削單元34a所進行之被加工物11的磨削停止之時間點。 Furthermore, while the grinding wheel 44a is grinding the workpiece 11, the thickness of the workpiece 11 can be measured using a thickness gauge 50 (see FIG. 1 ). The timing for stopping the grinding of the workpiece 11 by the grinding unit 34a can then be controlled based on the thickness of the workpiece 11 measured by the thickness gauge 50.
其次,使轉台16旋轉,而將保持有被加工物11之保持工作台18配置到第2磨削位置C。然後,可藉由磨削單元34b磨削已定位在第2磨削位置C之保持工作台18所保持之被加工物11。藉此,可進行被加工物11的精磨削,並將形成於被加工物11的背面11b側之磨削痕跡11d(參照圖7)去除。 Next, the turntable 16 is rotated to position the holding table 18 holding the workpiece 11 at the second grinding position C. The grinding unit 34b then grinds the workpiece 11 held by the holding table 18 at the second grinding position C. This allows for finish grinding of the workpiece 11 and removes the grinding marks 11d (see Figure 7) formed on the back surface 11b of the workpiece 11.
精磨削時的保持工作台18以及磨削單元34b的動作,會和粗磨削時的保持工作台18以及磨削單元34a的動作同樣。又,在由磨削輪44b所進行之被加工物11的磨削中,可藉由厚度測定器50測定被加工物11的厚度。 The movements of the holding table 18 and grinding unit 34b during fine grinding are the same as those during rough grinding. Furthermore, while the workpiece 11 is being ground by the grinding wheel 44b, the thickness of the workpiece 11 can be measured using the thickness gauge 50.
再者,在精磨削時,亦可實施前述之溝形成步驟以及磨削步驟。具體而言,首先是以不使保持工作台18旋轉而使磨削輪44b旋轉之狀態來讓磨削磨石48接觸於被加工物11,並在被加工物11的背面11b側形成溝11c(參照圖3(A)以及圖3(B))。之後,以已使保持工作台18以及磨削輪44b旋轉的狀態來讓磨削磨石48接觸於被加工物11,並磨削被加工物11的背面11b側的整體(參照圖5(A)以及圖5(B))。藉此,在對被加工物11施行精磨削時,也可促進磨削磨石48的自發刃。 Furthermore, the aforementioned groove forming and grinding steps can also be performed during finish grinding. Specifically, with the holding table 18 not rotating and the grinding wheel 44b rotating, the grinding stone 48 is first brought into contact with the workpiece 11, forming a groove 11c on the back surface 11b of the workpiece 11 (see Figures 3(A) and 3(B)). Subsequently, with the holding table 18 and grinding wheel 44b rotating, the grinding stone 48 is brought into contact with the workpiece 11, grinding the entire back surface 11b of the workpiece 11 (see Figures 5(A) and 5(B)). This facilitates the self-sharpening of the grinding stone 48 during finish grinding of the workpiece 11.
其次,使轉台16旋轉,而將保持有被加工物11之保持工作台18配 置到搬送位置A。然後,從已定位在搬送位置A之保持工作台18上搬送加工後的被加工物11。 Next, the turntable 16 is rotated to position the holding table 18 holding the workpiece 11 at the transfer position A. The processed workpiece 11 is then transferred from the holding table 18 positioned at the transfer position A.
已定位在搬送位置A之保持工作台18所保持之被加工物11,可被搬送單元54從保持工作台18上搬送到洗淨單元56,並被洗淨。然後,在由洗淨單元56所進行之洗淨之後,被加工物11會被搬送單元6搬送到片匣10b。 The workpiece 11 held by the holding table 18 at the transfer position A is transferred from the holding table 18 to the cleaning unit 56 by the transfer unit 54 for cleaning. After cleaning by the cleaning unit 56, the workpiece 11 is then transferred by the transfer unit 6 to the cassette 10b.
如以上所述,本實施形態之被加工物的磨削方法具備:溝形成步驟,在被加工物11上形成未到達成品厚度之深度的圓弧狀的溝11c;及磨削步驟,使磨削磨石48接觸於被加工物11的形成有溝11c之面側,並將被加工物11磨削到被加工物11的厚度成為成品厚度為止。藉此,在將被加工物11磨削並薄化時,磨削磨石48會衝撞於溝11c而促進自發刃。其結果,可維持磨削磨石48的磨削能力而抑制加工不良的產生。 As described above, the workpiece grinding method of this embodiment includes: a groove forming step of forming an arcuate groove 11c in the workpiece 11, the groove 11c not reaching the finished thickness; and a grinding step of bringing the grinding stone 48 into contact with the surface of the workpiece 11 where the groove 11c is formed, and grinding the workpiece 11 until the thickness of the workpiece 11 reaches the finished thickness. As the workpiece 11 is ground and thinned, the grinding stone 48 impacts the groove 11c, promoting self-sharpening. As a result, the grinding performance of the grinding stone 48 is maintained, suppressing the occurrence of machining defects.
再者,上述之溝形成步驟以及磨削步驟中的磨削裝置2的動作,可藉由控制單元58來控制。具體而言,在溝形成步驟中,控制單元58藉由將控制訊號輸出至旋轉驅動源20(參照圖2等),而將保持工作台18的旋轉方向上的角度設定為預定的角度後,讓保持工作台18維持為已停止之狀態(未旋轉之狀態)。又,控制單元58藉由將控制訊號輸出至磨削單元34a的旋轉驅動源40,而使磨削輪44a以預定的旋轉數來旋轉。 Furthermore, the operation of the grinding device 2 during the aforementioned groove forming and grinding steps can be controlled by the control unit 58. Specifically, during the groove forming step, the control unit 58 outputs a control signal to the rotation drive source 20 (see FIG. 2 , etc.) to set the rotation angle of the holding table 18 to a predetermined angle, and then maintains the holding table 18 in a stopped state (non-rotating state). Furthermore, the control unit 58 outputs a control signal to the rotation drive source 40 of the grinding unit 34a to rotate the grinding wheel 44a at a predetermined number of revolutions.
然後,控制單元58將控制訊號輸出至磨削進給單元24a的脈衝馬達32,使滾珠螺桿30以預定的速度旋轉。藉此,磨削單元34a會以預定的速度下降而使磨削磨石48接觸於被加工物11,並在被加工物11形成溝11c。亦即,控制單元58藉由將控制訊號輸出至磨削裝置2的構成要素,而使磨削裝置2以用於實施溝形成步驟的模式(第1模式)來動作。 The control unit 58 then outputs a control signal to the pulse motor 32 of the grinding feed unit 24a, rotating the ball screw 30 at a predetermined speed. This causes the grinding unit 34a to descend at a predetermined speed, bringing the grinding stone 48 into contact with the workpiece 11 and forming a groove 11c in the workpiece 11. In other words, the control unit 58 outputs a control signal to the components of the grinding device 2, causing the grinding device 2 to operate in the mode (first mode) for performing the groove forming step.
另一方面,在磨削步驟中,控制單元58藉由將控制訊號輸出至旋轉驅動源20(參照圖2等),而使保持工作台18以預定的旋轉數來旋轉。又,控制 單元58藉由將控制訊號輸出至磨削單元34a的旋轉驅動源40,而使磨削輪44a以預定的旋轉數來旋轉。 Meanwhile, during the grinding step, the control unit 58 outputs a control signal to the rotation drive source 20 (see FIG. 2 , etc.), causing the holding table 18 to rotate at a predetermined rotational speed. Furthermore, the control unit 58 outputs a control signal to the rotation drive source 40 of the grinding unit 34a, causing the grinding wheel 44a to rotate at a predetermined rotational speed.
然後,控制單元58將控制訊號輸出至磨削進給單元24a的脈衝馬達32,使滾珠螺桿30以預定的速度旋轉。藉此,磨削單元34a會以預定的速度下降而使磨削磨石48接觸於被加工物11,並磨削被加工物11的背面11b側的整體。亦即,控制單元58藉由將控制訊號輸出至磨削裝置2的構成要素,而使磨削裝置2以用於實施磨削步驟的模式(第2模式)來動作。 The control unit 58 then outputs a control signal to the pulse motor 32 of the grinding feed unit 24a, rotating the ball screw 30 at a predetermined speed. This causes the grinding unit 34a to descend at a predetermined speed, bringing the grinding stone 48 into contact with the workpiece 11 and grinding the entire back surface 11b of the workpiece 11. In other words, the control unit 58 outputs control signals to the components of the grinding device 2, causing the grinding device 2 to operate in the mode (second mode) for performing the grinding step.
如上述,可藉由於將保持有被加工物11之保持工作台18定位到第1磨削位置B後,藉由控制單元58來適當切換第1模式與第2模式,而實施溝形成步驟與磨削步驟。再者,使用磨削單元34b來實施溝形成步驟與磨削步驟之情況下的控制單元58的動作也是同樣。 As described above, after positioning the holding table 18 holding the workpiece 11 at the first grinding position B, the control unit 58 can appropriately switch between the first mode and the second mode to perform the groove forming step and the grinding step. Furthermore, the operation of the control unit 58 is similar when the grinding unit 34b is used to perform the groove forming step and the grinding step.
在溝形成步驟中形成複數條溝11c之情況下(參照圖4(B)),控制單元58藉由將控制訊號輸出至旋轉驅動源20(參照圖2),而使保持工作台18在預定的間隔的角度(例如間隔90°)停止。然後,以保持工作台18的角度不同的狀態各自藉由磨削單元34a磨削被加工物11,而形成溝11c。 When forming multiple grooves 11c during the groove forming step (see Figure 4(B)), the control unit 58 outputs a control signal to the rotary drive source 20 (see Figure 2), causing the holding table 18 to stop at predetermined angle intervals (e.g., 90° intervals). The grinding unit 34a then grinds the workpiece 11 while the holding table 18 is held at different angles, forming the grooves 11c.
再者,由控制單元58所進行之保持工作台18的角度之控制,可依據從旋轉驅動源20所具備之編碼器所輸入的訊號來實施。具體而言,編碼器會檢測旋轉驅動源20的輸出軸的旋轉角度並輸出至控制單元58。並且,控制單元58會依據編碼器的檢測結果來計算為了使保持工作台18在所期望的角度停止而必要之旋轉驅動源20的輸出軸的旋轉量,並使旋轉驅動源20的輸出軸旋轉該旋轉量之份量。 Furthermore, the control unit 58 controls the angle at which the table 18 is held based on signals input from an encoder included in the rotary drive source 20. Specifically, the encoder detects the rotation angle of the output shaft of the rotary drive source 20 and outputs this information to the control unit 58. Based on the encoder's detection results, the control unit 58 calculates the amount of rotation of the output shaft of the rotary drive source 20 required to stop the table 18 at the desired angle and rotates the output shaft of the rotary drive source 20 by that amount.
另外,上述實施形態之構造、方法等,只要在不脫離本發明之目的之範圍內,均可適當變更而實施。 In addition, the structures and methods of the above-mentioned embodiments may be appropriately modified and implemented without departing from the purpose of the present invention.
2:磨削裝置 2: Grinding device
11:被加工物 11: Workpiece
11a:正面(第1面) 11a: Front (Side 1)
11b:背面(第2面) 11b: Back (Side 2)
11c:溝 11c: Groove
18:保持工作台(工作夾台) 18: Maintaining the workbench (work clamp)
18a:保持面 18a: Maintaining the surface
20:旋轉驅動源 20: Rotational drive source
34a:磨削單元 34a: Grinding unit
38:主軸 38: Main axis
42:安裝座 42: Mounting seat
44a:磨削輪 44a: Grinding wheel
46:基台 46:Abutment
48:磨削磨石 48: Grinding Stone
Claims (5)
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| JP2020131398A (en) * | 2019-02-22 | 2020-08-31 | 株式会社ディスコ | How to check the condition of the grinding wheel |
| TWI728188B (en) * | 2016-09-29 | 2021-05-21 | 美商羅門哈斯電子材料Cmp控股公司 | Method to shape the surface of chemical mechanical polishing pads |
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| TWI728188B (en) * | 2016-09-29 | 2021-05-21 | 美商羅門哈斯電子材料Cmp控股公司 | Method to shape the surface of chemical mechanical polishing pads |
| JP2020131398A (en) * | 2019-02-22 | 2020-08-31 | 株式会社ディスコ | How to check the condition of the grinding wheel |
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