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TWI890979B - Temperature sensor system in a chip and chip - Google Patents

Temperature sensor system in a chip and chip

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Publication number
TWI890979B
TWI890979B TW112102273A TW112102273A TWI890979B TW I890979 B TWI890979 B TW I890979B TW 112102273 A TW112102273 A TW 112102273A TW 112102273 A TW112102273 A TW 112102273A TW I890979 B TWI890979 B TW I890979B
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Taiwan
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die
temperature sensing
control unit
multiplexer
sensing unit
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TW112102273A
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Chinese (zh)
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TW202430851A (en
Inventor
周宇杰
董威鋒
胡茗崎
盧山
王劍
Original Assignee
大陸商北京有竹居網路技術有限公司
英屬開曼群島商臉萌有限公司
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Priority to TW112102273A priority Critical patent/TWI890979B/en
Publication of TW202430851A publication Critical patent/TW202430851A/en
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Publication of TWI890979B publication Critical patent/TWI890979B/en

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  • Semiconductor Integrated Circuits (AREA)

Abstract

A temperature sensor system in a chip and chip. The temperature sensor system in the chip includes a first temperature sensing unit and a control unit. The first temperature sensing unit senses the temperature by using the back metal structure formed in the back end process of the chip to output a temperature sensing electrical signal. The control unit is coupled with the first temperature sensing unit and processes the temperature sensing electric signal output by the first temperature sensing unit to output a measurement result. The temperature sensor system can improve the temperature measurement accuracy.

Description

晶片中的溫度感測器系統和晶片Temperature sensor system on chip and chip

本公開的實施例涉及一種晶片中的溫度感測器系統和晶片。 Embodiments of the present disclosure relate to a temperature sensor system in a chip and a chip.

晶片片內的溫度獲取一般通過片內的溫度感測器系統實現。目前,業界最常用的溫度感測器系統由雙極電晶體(bipolar junction transistor,BJT)構成的溫度感測器感溫單元組成。 Chip temperature is typically acquired through an on-chip temperature sensor system. Currently, the most commonly used temperature sensor system in the industry consists of a temperature sensing unit composed of a bipolar junction transistor (BJT).

本公開至少一個實施例提供一種晶片中的溫度感測器系統,該溫度感測器系統包括:第一感溫單元,使用在所述晶片的後道製程中形成的後道金屬結構感測溫度以輸出溫度感測電信號;以及控制單元,與所述第一感溫單元耦接,對所述第一感溫單元輸出的所述溫度感測電信號進行處理,以輸出測量結果。 At least one embodiment of the present disclosure provides a temperature sensor system in a chip. The temperature sensor system includes: a first temperature sensing unit that senses temperature using a back-end metal structure formed in a back-end process of the chip to output a temperature sensing electrical signal; and a control unit coupled to the first temperature sensing unit and processing the temperature sensing electrical signal output by the first temperature sensing unit to output a measurement result.

例如,在本公開一實施例提供的溫度感測器系統中,晶片包括至少一個晶粒,所述第一感溫單元和所述控制單元集成於 所述至少一個晶粒中的同一晶粒中;所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒。 For example, in a temperature sensor system provided in one embodiment of the present disclosure, a chip includes at least one die, and the first temperature sensing unit and the control unit are integrated into the same die of the at least one die; the first temperature sensing unit is integrated into one of the at least one die, and the control unit is independent of the at least one die.

例如,在本公開一實施例提供的溫度感測器系統中,所述晶片還包括封裝部分,所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒,包括:所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元設置於所述晶粒之外的所述封裝部分;或者在所述晶片包括通過鍵合結構堆疊設置的多個晶粒的情形中,所述第一感溫單元集成於所述至少一個晶粒之一且所述第一感溫單元設置於所述鍵合結構中。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, the chip further includes a packaging portion, the first temperature sensing unit is integrated into one of the at least one die, and the control unit is independent of the at least one die. This includes: the first temperature sensing unit is integrated into one of the at least one die, and the control unit is disposed in the packaging portion outside the die; or, in the case where the chip includes multiple dies stacked via a bonding structure, the first temperature sensing unit is integrated into one of the at least one die, and the first temperature sensing unit is disposed in the bonding structure.

例如,在本公開一實施例提供的溫度感測器系統中,所述溫度感測器系統包括多個感溫單元,所述多個感溫單元包括所述第一感溫單元;所述溫度感測器系統還包括:多工器,與所述控制單元和所述多個感溫單元耦接,且配置為從所述多個感溫單元中擇一。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, the temperature sensor system includes a plurality of temperature sensing units, including the first temperature sensing unit. The temperature sensor system further includes a multiplexer coupled to the control unit and the plurality of temperature sensing units and configured to select one of the plurality of temperature sensing units.

例如,在本公開一實施例提供的溫度感測器系統中,所述晶片包括多個晶粒,所述多工器與所述第一感溫單元位於同一晶粒或者不在同一晶粒中。 For example, in the temperature sensor system provided in one embodiment of the present disclosure, the chip includes multiple dies, and the multiplexer and the first temperature sensing unit are located in the same die or in different dies.

例如,在本公開一實施例提供的溫度感測器系統中,所述至少一個晶粒包括第一晶粒,所述多工器位於第一晶粒中,在所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒的情形中,所述多工器通過所述第一晶 粒的封裝電路結構與所述控制單元耦接。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, the at least one die includes a first die, the multiplexer is located in the first die, and when the first temperature sensing unit is integrated into one of the at least one die and the control unit is independent of the at least one die, the multiplexer is coupled to the control unit via the package circuit structure of the first die.

例如,在本公開一實施例提供的溫度感測器系統中,所述第一晶粒包括信號輸出口,所述多工器與所述信號輸出口耦接,所述信號輸出口與所述封裝電路結構耦接,以使所述多工器與所述控制單元耦接。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, the first die includes a signal output port, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure, so that the multiplexer is coupled to the control unit.

例如,在本公開一實施例提供的溫度感測器系統中,至少一個晶粒還包括第二晶粒,所述第一晶粒和所述第二晶粒通過鍵合結構堆疊設置並且由所述封裝電路結構封裝,所述第二晶粒包括信號輸出口,所述第一晶粒不包括信號輸出口,所述多工器通過所述鍵合結構耦接到所述信號輸出口,通過所述信號輸出口與所述封裝電路結構耦接至所述控制單元。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, at least one die further includes a second die. The first die and the second die are stacked via a bonding structure and packaged by the package circuit structure. The second die includes a signal output port, while the first die does not. The multiplexer is coupled to the signal output port via the bonding structure, and is coupled to the control unit via the signal output port and the package circuit structure.

例如,在本公開一實施例提供的溫度感測器系統中,至少一個晶粒包括第一晶粒和第二晶粒,在所述第一感溫單元和所述控制單元分別集成於所述至少一個晶粒中的不同晶粒中的情形中:所述第一感溫單元位於所述第一晶粒中,所述控制單元位於所述第二晶粒中,所述第一晶粒中的多工器通過互連結構與所述控制單元耦接,其中,所述互連結構用於耦接所述第一晶粒和所述第二晶粒;或者所述第一晶粒中的多工器通過鍵合結構與所述控制單元耦接,其中,所述鍵合結構用於使所述第一晶粒和所述第二晶粒堆疊設置。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, at least one die includes a first die and a second die. Where the first temperature sensing unit and the control unit are integrated into different dies of the at least one die, the first temperature sensing unit is located in the first die, the control unit is located in the second die, and the multiplexer in the first die is coupled to the control unit via an interconnect structure, wherein the interconnect structure is used to couple the first die and the second die; or the multiplexer in the first die is coupled to the control unit via a bonding structure, wherein the bonding structure is used to stack the first die and the second die.

例如,在本公開一實施例提供的溫度感測器系統中,晶片包括第一晶粒和第二晶粒,在所述第一感溫單元設置於所述鍵 合結構的情形中,所述控制單元設置於所述第一晶粒或者所述第二晶粒,所述多工器與所述控制單元設置於同一晶粒中;或者所述控制單元獨立於所述第一晶粒和所述第二晶粒,所述第二晶粒包括信號輸出口,所述多工器設置於所述第二晶粒中,所述信號輸出口與所述封裝電路結構耦接,所述多工器與所述信號輸出口耦接,所述信號輸出口與所述封裝電路結構耦接,以使所述多工器經由所述封裝電路結構與所述控制單元耦接。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, a chip includes a first die and a second die. In the case where the first temperature sensing unit is disposed in the bonding structure, the control unit is disposed in the first die or the second die, and the multiplexer and the control unit are disposed in the same die. Alternatively, the control unit is independent of the first die and the second die, the second die includes a signal output port, the multiplexer is disposed in the second die, the signal output port is coupled to the package circuit structure, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure, so that the multiplexer is coupled to the control unit via the package circuit structure.

例如,在本公開一實施例提供的溫度感測器系統中,後道金屬結構包括以下至少一種:後道金屬繞線、後道金屬過孔陣列和所述後道金屬繞線組成的金屬結構、所述後道金屬繞線和穿過矽基底的過孔陣列組成的金屬結構。 For example, in a temperature sensor system provided in an embodiment of the present disclosure, the back-end metal structure includes at least one of the following: a back-end metal wiring, a metal structure consisting of a back-end metal via array and the back-end metal wiring, or a metal structure consisting of the back-end metal wiring and an array of vias passing through a silicon substrate.

例如,在本公開一實施例提供的溫度感測器系統中,控制單元和所述第一感測單元形成基於4線開爾文電路,以對所述溫度感測電信號進行處理,以輸出測量結果。 For example, in the temperature sensor system provided in one embodiment of the present disclosure, the control unit and the first sensing unit form a 4-wire Kelvin circuit to process the temperature sensing electrical signal and output a measurement result.

本公開至少一個實施例提供一種晶片,該晶片包括本公開任一實施例提供的溫度感測器系統。 At least one embodiment of the present disclosure provides a chip, which includes the temperature sensor system provided by any embodiment of the present disclosure.

為讓本揭示的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 To make the above features and advantages of the present disclosure more clearly understood, the following examples are given with reference to the accompanying drawings for detailed description.

100、210、220、230、300:晶片 100, 210, 220, 230, 300: Chips

101、102、103、104、105、120、130:金屬繞線 101, 102, 103, 104, 105, 120, 130: Metal windings

110:溫度感測器系統 110: Temperature sensor system

111、2111、2211、2311、301、302、303、402、412、502、512:感溫單元 111, 2111, 2211, 2311, 301, 302, 303, 402, 412, 502, 512: Temperature sensing units

112:控制單元 112: Control unit

140:柱狀金屬 140: Columnar Metal

150、160、170、180:穿過矽片通道 150, 160, 170, 180: Passing through the silicon wafer channel

211、221、231、232、601、602:晶粒 211, 221, 231, 232, 601, 602: Grains

2112、2221、2341、305、403、413、42、43、503、513、52、53:ADC模組 2112, 2221, 2341, 305, 403, 413, 42, 43, 503, 513, 52, 53: ADC module

222、233:封裝部分 222, 233: Packaging

234、604:鍵合結構 234, 604: Keying structure

304、401、411、501、511:多工器 304, 401, 411, 501, 511: Multiplexers

603:矽中介層、基板或者基底 603: Silicon interposer, substrate, or base

611:電晶體層 611: Transistor layer

612:後道金屬結構 612: Back-end metal structure

6121:後道金屬繞線 6121: Back-end metal winding

6122:後道金屬過孔陣列和後道金屬繞線形成的金屬結構 6122: Metal structure formed by back-end metal via array and back-end metal routing

6123:後道金屬繞線和穿過矽基底的過孔陣列組成的金屬結構 6123: A metal structure consisting of back-end metal routing and an array of vias passing through the silicon substrate.

613:矽基底層 613: Silicon substrate

VDD_MH、VDD_FH、VSS_ML、VSS_FL:連接端 VDD_MH, VDD_FH, VSS_ML, VSS_FL: Connectors

為了更清楚地說明本公開實施例的技術方案,下面將對實施例的附圖作簡單地介紹,顯而易見地,下面描述中的附圖僅 僅涉及本公開的一些實施例,而非對本公開的限制。 To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly introduced below. It should be understood that the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.

圖1A示出了本公開至少一實施例提供的一種晶片中的溫度感測器系統的示意圖。 FIG1A shows a schematic diagram of a temperature sensor system in a chip provided by at least one embodiment of the present disclosure.

圖1B示出了本公開至少一個實施例提供的一種後道金屬結構的示意圖。 Figure 1B shows a schematic diagram of a back-end metal structure provided by at least one embodiment of the present disclosure.

圖1C示出了本公開至少一個實施例提供的另一種後道金屬結構的示意圖。 Figure 1C shows a schematic diagram of another back-end metal structure provided by at least one embodiment of the present disclosure.

圖1D示出了本公開至少一個實施例提供的另一種後道金屬結構的示意圖。 Figure 1D shows a schematic diagram of another back-end metal structure provided by at least one embodiment of the present disclosure.

圖2A示出了後道金屬結構的阻值和溫度之間的關係示意圖。 Figure 2A shows a schematic diagram of the relationship between the resistance and temperature of the back-end metal structure.

圖2B示出了本公開至少一個實施例提供的一種晶片的示意性框圖。 Figure 2B shows a schematic block diagram of a chip provided by at least one embodiment of the present disclosure.

圖2C示出了本公開至少一個實施例提供的另一種晶片的示意性框圖。 Figure 2C shows a schematic block diagram of another chip provided by at least one embodiment of the present disclosure.

圖2D示出了本公開至少一個實施例提供的另一種晶片的示意性框圖。 Figure 2D shows a schematic block diagram of another chip provided by at least one embodiment of the present disclosure.

圖3示出了本公開至少一個實施例提供的多工器與感溫單元的耦接關係的示意圖。 Figure 3 shows a schematic diagram of the coupling relationship between the multiplexer and the temperature sensing unit provided in at least one embodiment of the present disclosure.

圖4示出了本公開至少一個實施例提供的溫度感測器系統的示意圖。 Figure 4 shows a schematic diagram of a temperature sensor system provided by at least one embodiment of the present disclosure.

圖5示出了本公開至少一個實施例提供的溫度感測器系統的示意圖。以及 FIG5 shows a schematic diagram of a temperature sensor system provided by at least one embodiment of the present disclosure.

圖6示出了本公開至少一個實施例提供的一種晶片的結構示意圖。 Figure 6 shows a schematic structural diagram of a chip provided in at least one embodiment of the present disclosure.

為使本公開實施例的目的、技術方案和優點更加清楚, 下面將結合本公開實施例的附圖,對本公開實施例的技術方案進行清楚、完整地描述。顯然,所描述的實施例是本公開的一部分實施例,而不是全部的實施例。基於所描述的本公開的實施例,本領域普通技術人員在無需創造性勞動的前提下所獲得的所有其他實施例,都屬於本公開保護的範圍。 To further clarify the purpose, technical solutions, and advantages of the disclosed embodiments, the following clearly and completely describes the technical solutions of the disclosed embodiments, in conjunction with the accompanying figures. Obviously, the described embodiments are only a portion of the disclosed embodiments, not all of them. All other embodiments derived by persons of ordinary skill in the art based on the described embodiments without requiring any creative effort are also within the scope of protection of this disclosure.

除非另外定義,本公開使用的技術術語或者科學術語應當為本公開所屬領域內具有一般技能的人士所理解的通常意義。本公開中使用的“第一”、“第二”以及類似的詞語並不表示任何順序、數量或者重要性,而只是用來區分不同的組成部分。同樣,“一個”、“一”或者“該”等類似詞語也不表示數量限制,而是表示存在至少一個。“包括”或者“包含”等類似的詞語意指出現該詞前面的元件或者物件涵蓋出現在該詞後面列舉的元件或者物件及其等同,而不排除其他元件或者物件。“耦接”或者“相連”等類似的詞語並非限定於物理的或者機械的耦接,而是可以包括電性的耦接,不管是直接的還是間接的。“上”、“下”、“左”、“右”等僅用於表示相對位置關係,當被描述物件的絕對位置改變後,則該相對位置關係也可能相應地改變。 Unless otherwise defined, the technical or scientific terms used in this disclosure should have the usual meanings understood by people with ordinary skills in the field to which this disclosure belongs. "First", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, "one", "an" or "the" and other similar terms do not indicate quantity limitations, but rather indicate the presence of at least one. "Include" or "comprising" and other similar terms mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Coupled" or "connected" and other similar terms are not limited to physical or mechanical coupling, but may include electrical coupling, whether direct or indirect. "Up," "down," "left," "right," etc. are only used to express relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

溫度感測器系統使用溫度感測器感溫單元實現對該溫度感測器感溫單元所在位置的溫度測量。因此,高精度的溫度感測器系統的溫度測量精度與溫度感測器感溫單元的測量精度有著極大的關係。由BJT組成的溫度感測器感溫單元,受到晶片製造製程的影響,尤其在先進製程下(例如,FinFet 14nm製程及更先進的製程節點),其精度呈逐漸降低的趨勢,使晶片內溫度感測器系統的整體精度受到制約。 A temperature sensor system uses a temperature sensing element to measure the temperature at its location. Therefore, the temperature measurement accuracy of a high-precision temperature sensor system is closely related to the measurement accuracy of the temperature sensing element. Temperature sensing elements composed of BJTs are affected by the chip manufacturing process. Their accuracy decreases, especially at advanced process nodes (e.g., FinFet 14nm and beyond), limiting the overall accuracy of the on-chip temperature sensor system.

本公開至少一個實施例提供一種晶片中的溫度感測器系統和晶片。該晶片中的溫度感測器系統包括第一感溫單元和控制單元。第一感溫單元使用在晶片的後道製程中形成的後道金屬結構感測溫度以輸出溫度感測電信號。控制單元與第一感溫單元耦接,對第一感溫單元輸出的溫度感測電信號進行處理,以輸出測量結果。該溫度感測器系統利用後道製程中形成的後道金屬結構作為感溫單元,規避了前道製程中BJT製造製程的波動,從而提高了溫度感測器系統的溫度測量精度,並實現對晶片內後道結構溫度測量。 At least one embodiment of the present disclosure provides a temperature sensor system within a chip and a chip. The temperature sensor system includes a first temperature sensing unit and a control unit. The first temperature sensing unit senses temperature using a back-end metal structure formed during the back-end process of the chip to output a temperature sensing electrical signal. The control unit is coupled to the first temperature sensing unit and processes the temperature sensing electrical signal output by the first temperature sensing unit to output a measurement result. By utilizing a back-end metal structure formed during the back-end process as the temperature sensing unit, the temperature sensor system avoids fluctuations in the BJT manufacturing process during the front-end process, thereby improving the temperature measurement accuracy of the temperature sensor system and enabling temperature measurement of back-end structures within the chip.

圖1A示出了本公開至少一實施例提供的一種晶片中的溫度感測器系統的示意圖。 FIG1A shows a schematic diagram of a temperature sensor system in a chip provided by at least one embodiment of the present disclosure.

如圖1A所示,晶片100包括溫度感測器系統110。溫度感測器系統110包括感溫單元111和控制單元112。感溫單元111為第一感溫單元的示例。 As shown in FIG1A , a chip 100 includes a temperature sensor system 110. The temperature sensor system 110 includes a temperature sensing unit 111 and a control unit 112. The temperature sensing unit 111 is an example of a first temperature sensing unit.

感溫單元111使用在晶片的後道製程中形成的後道金屬結構感測溫度以輸出溫度感測電信號。 The temperature sensing unit 111 uses a back-end metal structure formed during the back-end process of the chip to sense temperature and output a temperature sensing electrical signal.

例如,晶片的製造製程可以分為前道(Front End)製程和後道(Back End)製程。例如在矽基底上實現N型和P型場效應電晶體(FET)的製程稱為前道製程(front end of line,FEOL)。例如,前道製程可以包括光刻、刻蝕機、清洗機、離子注入、化學機械平坦等。與之相對應的是後道(back end of line,BEOL)製程,後道製程例如建立若干層的導電金屬線,不同層金屬線之間由柱狀金屬相連。後道製程例如用於封裝,包括佈線、打孔等。 後道金屬結構例如包括在後道製程過程中形成的後道金屬。例如,後道金屬結構包括後道金屬繞線、用於耦接不同層的金屬線的柱狀金屬(Via)和穿過矽片通道(Through-Silicon-Via,TSV)等。穿過矽片通道是在晶片和晶片之間、晶圓和晶圓之間製作垂直導通;通過銅、鎢、多晶矽等導電物質的填充,實現矽通孔的垂直電氣互連,實現晶片之間互連。 For example, the chip manufacturing process can be divided into front-end and back-end processes. For example, the process of implementing N-type and P-type field-effect transistors (FETs) on a silicon substrate is called the front-end of line (FEOL). For example, FEOL processes may include photolithography, etching machines, cleaning machines, ion implantation, and chemical mechanical planarization. The corresponding back-end of line (BEOL) processes, for example, create several layers of conductive metal wires, with metal pillars connecting different layers. BEOL processes, for example, are used for packaging and include wiring and via drilling. BEOL metal structures, for example, include BEOL metal formed during BEOL processes. For example, back-end metal structures include back-end metal routing, metal pillars (vias) used to couple metal lines between different layers, and through-silicon vias (TSVs). Through-silicon vias (TSVs) create vertical connections between chips or wafers. By filling the vias with conductive materials such as copper, tungsten, and polysilicon, vertical electrical connections are achieved, enabling interconnection between chips.

例如,感溫單元111包括在後道製程中形成的後道金屬繞線,以利用導電金屬線感測溫度。又例如,第一感溫單元111包括在後道製程中形成的後道金屬繞線和用於耦接不同層金屬線的柱狀金屬形成的後道金屬過孔陣列。又例如,第一感溫單元111包括在後道製程中形成的後道金屬繞線和穿過矽片通道的過孔陣列。 For example, the temperature sensing unit 111 may include a back-end metal wire formed in a back-end process to sense temperature using a conductive metal wire. For another example, the first temperature sensing unit 111 may include a back-end metal wire formed in a back-end process and an array of back-end metal vias formed of pillar metal for coupling metal wires on different layers. For another example, the first temperature sensing unit 111 may include a back-end metal wire formed in a back-end process and an array of vias that pass through silicon wafer channels.

本公開的實施例基於金屬型溫度感測器感溫單元可由任意層後道金屬繞線或者金屬過孔陣列構成,實現對晶片內多實體層位置的溫度測量,以及對3D晶片堆疊結構中溫度測量。 The disclosed embodiments utilize a metal-based temperature sensor whose sensing unit can be constructed from any layer of back-end metal routing or metal via arrays, enabling temperature measurement at multiple physical layers within a chip, as well as temperature measurement within 3D chip stacking structures.

本公開的實施例利用後道中金屬繞線和耦接過孔的金屬通道(例如,柱狀金屬)本身的金屬特性進行溫度的精確測量。 The disclosed embodiments utilize the metal properties of the metal routing and metal channels (e.g., pillar metal) coupled to the vias in the back-end process to accurately measure temperature.

圖1B示出了本公開至少一個實施例提供的一種後道金屬結構的示意圖。圖1C示出了本公開至少一個實施例提供的另一種後道金屬結構的示意圖。圖1D示出了本公開至少一個實施例提供的另一種後道金屬結構的示意圖。 Figure 1B shows a schematic diagram of a back-end metal structure provided in at least one embodiment of the present disclosure. Figure 1C shows a schematic diagram of another back-end metal structure provided in at least one embodiment of the present disclosure. Figure 1D shows a schematic diagram of another back-end metal structure provided in at least one embodiment of the present disclosure.

如圖1B所示,在該示例中,後道金屬結構是位於晶片中的金屬繞線。 As shown in Figure 1B, in this example, the back-end metal structure is a metal routing within the wafer.

如圖1C所示,該示例中,後道金屬結構包括位於多層 的金屬繞線和後道金屬過孔陣列。例如,金屬繞線120和金屬繞線130為不同層的金屬繞線,在圖1C中以平行四邊形表示位於一層中的金屬繞線。柱狀金屬140用於耦接金屬繞線130和金屬繞線120,多個類似於柱狀金屬140的用於耦接不同層的金屬繞線的柱狀金屬形成後道金屬過孔陣列。 As shown in Figure 1C, in this example, the back-end metal structure includes metal routing wires and a back-end metal via array located on multiple layers. For example, metal routing wires 120 and 130 are located on different layers. Figure 1C shows the metal routing wires located on one layer as a parallelogram. A metal pillar 140 couples metal routing wires 130 and 120. Multiple metal pillars similar to metal pillar 140, used to couple metal routing wires on different layers, form a back-end metal via array.

如圖1D所示,後道金屬結構包括多個穿過矽片通道(例如,穿過矽片通道150、穿過矽片通道160、穿過矽片通道170和穿過矽片通道180)形成的穿過矽片通道的過孔陣列和耦接兩個穿過矽片通道的金屬繞線(例如,金屬繞線101、金屬繞線102、金屬繞線103、金屬繞線104和金屬繞線105)。 As shown in FIG1D , the back-end metal structure includes a through-wafer via array formed by a plurality of through-wafer vias (e.g., through-wafer via 150 , through-wafer via 160 , through-wafer via 170 , and through-wafer via 180 ) and metal wires (e.g., metal wire 101 , metal wire 102 , metal wire 103 , metal wire 104 , and metal wire 105 ) coupling two through-wafer vias.

控制單元112與感溫單元111耦接,對感溫單元111輸出的溫度感測電信號進行處理,以輸出測量結果。 The control unit 112 is coupled to the temperature sensing unit 111 and processes the temperature sensing electrical signal output by the temperature sensing unit 111 to output the measurement result.

控制單元112例如可以是片上集成的類比數位轉換(Analog-to-digital converter,ADC)模組。ADC模組實現對資料的類比數位轉換,以實現對溫度感測器感溫單元的阻值測量。 The control unit 112 may be, for example, an on-chip analog-to-digital converter (ADC) module. The ADC module performs analog-to-digital conversion of data to measure the resistance of the temperature sensor's sensing element.

例如,ADC模組接收溫度感測電信號,根據溫度感測電信號輸出溫度測量結果。例如,溫度感測電信號包括電流和電壓,ADC模組接收電流和電壓,根據電流和電壓計算電阻值,並且根據圖2A所示的溫度和電阻值的關係得到溫度測量結果。 For example, the ADC module receives a temperature sensing signal and outputs a temperature measurement result based on the temperature sensing signal. For example, the temperature sensing signal includes current and voltage. The ADC module receives the current and voltage, calculates the resistance value based on the current and voltage, and obtains the temperature measurement result based on the relationship between temperature and resistance shown in Figure 2A.

圖2A示出了後道金屬結構的阻值和溫度之間的關係示意圖。 Figure 2A shows a schematic diagram of the relationship between the resistance and temperature of the back-end metal structure.

例如,圖2A示出了晶片中位於不同薄膜層或者基底層的後道金屬繞線的阻值隨溫度變化的變化情況。例如,後道金屬結構可以採用單層結構或多層(複合)結構,採用多層結構可以 滿足後道佈線對金屬溫度感測器結構位置的制約。下面以後道金屬結構採用多層結構為例進行說明。 For example, Figure 2A shows how the resistance of back-end metal traces located at different thin film layers or substrate layers within a chip changes with temperature. For example, the back-end metal structure can be single-layer or multi-layer (composite). Using a multi-layer structure can satisfy the constraints imposed by back-end routing on the location of the metal temperature sensor. The following example illustrates a multi-layer back-end metal structure.

如圖2A所示,ITO/Ag/PET層的後道金屬繞線的阻值隨溫度變化呈接近線性,ITO/Cu/PET層的後道金屬繞線的阻值隨溫度變化接近線性,ITO/ZnO/PET層的後道金屬繞線的阻值隨溫度變化接近線性,ITO/PET層的後道金屬繞線阻值隨溫度變化接近線性,ITO/Al/PET層的後道金屬繞線的阻值隨溫度變化接近線性, As shown in Figure 2A, the resistance of the back-end metal wiring on the ITO/Ag/PET layer varies nearly linearly with temperature. The resistance of the back-end metal wiring on the ITO/Cu/PET layer varies nearly linearly with temperature. The resistance of the back-end metal wiring on the ITO/ZnO/PET layer varies nearly linearly with temperature. The resistance of the back-end metal wiring on the ITO/PET layer varies nearly linearly with temperature. The resistance of the back-end metal wiring on the ITO/Al/PET layer varies nearly linearly with temperature.

如圖2A所示,後道金屬結構的阻值隨溫度變化接近線性。 As shown in Figure 2A, the resistance of the back-end metal structure changes nearly linearly with temperature.

利用後道金屬結構的阻值隨溫度變化接近線性的特點,利用後道金屬結構測量晶片的片內溫度。例如,向後道金屬結構供電,並且測量後道金屬的電流和電壓,從而根據後道金屬的電流和電壓,計算後道金屬結構的阻值。 This technique leverages the fact that the resistance of back-end metal structures changes nearly linearly with temperature to measure the chip's internal temperature. For example, by supplying power to the back-end metal structure and measuring the current and voltage across it, the resistance of the back-end metal structure can be calculated based on the current and voltage across the back-end metal.

在該實施例中,溫度感測電信號例如可以包括電流和電壓。 In this embodiment, the temperature sensing electrical signal may include, for example, current and voltage.

在本公開的一些實施例中,控制單元和第一感測單元形成基於4線開爾文電路,以多溫度感測電信號進行處理,以輸出測量結果。 In some embodiments of the present disclosure, the control unit and the first sensing unit form a 4-wire Kelvin circuit, processing multiple temperature sensing electrical signals to output measurement results.

4線開爾文電路包括4條信號線,分別稱為高電位施加線、低電位施加線、高電位檢測線和低電位檢測線。 A 4-wire Kelvin circuit consists of four signal lines: a high-voltage application line, a low-voltage application line, a high-voltage detection line, and a low-voltage detection line.

例如,對於圖1B、圖1C和圖1D所示的後道金屬結構,後道金屬繞線包括4個連接端,分別為連接端VDD_MH、連接端VDD_FH、連接端VSS_ML、連接端VSS_FL。例如,連接端VDD_MH用於耦接高電位檢測線以測量高電壓,連接端VDD_FH 用於耦接高電位施加線以提供高電位低電流,連接端VSS_FL用於耦接低電位施加線低電位低電流,連接端VSS_ML用於耦接低電位檢測線以測量低電壓。具體地4線開爾文電路的工作原理請參考相關資料,本公開實施例不再贅述。 For example, for the back-end metal structure shown in Figures 1B, 1C, and 1D, the back-end metal routing includes four terminals: VDD_MH, VDD_FH, VSS_ML, and VSS_FL. For example, VDD_MH is used to couple to a high-voltage detection line to measure high voltages, VDD_FH is used to couple to a high-voltage application line to provide high voltage and low current, VSS_FL is used to couple to a low-voltage application line to provide low voltage and low current, and VSS_ML is used to couple to a low-voltage detection line to measure low voltages. The detailed operating principles of the 4-wire Kelvin circuit are described in relevant literature and will not be further elaborated in this disclosed embodiment.

如圖1B、圖1C和圖1D所示,連接端VDD_FL和連接端VDD_FH之間的距離大於等於連接端VSS_ML和連接端VSS_MH的距離以實現4線開爾文測量。例如,連接端VSS_FL和連接端VDD_FH分別位於後道金屬結構相距最遠的兩端,以準確地測量後道金屬結構的電阻值。後道金屬結構相距最遠的兩端是指後道金屬結構形成的金屬連接結構的首端和尾端,從而將全部走線或者柱狀結構的電阻都容納於金屬連接結構中,避免部分金屬結構的電阻未忽略而導致電阻測量不準確。如圖1D所示,金屬繞線101、穿過矽片通道150、金屬繞線102、穿過矽片通道160、金屬繞線103、穿過矽片通道170、金屬繞線104和穿過矽片通道180以及金屬繞線105形成一條完整的金屬連接結構,該金屬連接結構的首端位於金屬繞線101,尾端位於金屬繞線105,因此,連接端VDD_FH、連接端VDD_MH位於金屬繞線105,連接端VSS_ML、連接端VSS_FL位於金屬繞線101。 As shown in Figures 1B, 1C, and 1D, the distance between terminals VDD_FL and VDD_FH is greater than or equal to the distance between terminals VSS_ML and VSS_MH to implement 4-wire Kelvin measurements. For example, terminals VSS_FL and VDD_FH are located at the farthest ends of the back-end metal structure to accurately measure the resistance of the back-end metal structure. The farthest ends of the back-end metal structure refer to the beginning and end of the metal connection formed by the back-end metal structure. This allows the resistance of all traces or pillars to be included in the metal connection structure, avoiding inaccurate resistance measurements caused by ignoring the resistance of some metal structures. As shown in Figure 1D, metal wire 101, through-wafer via 150, metal wire 102, through-wafer via 160, metal wire 103, through-wafer via 170, metal wire 104, through-wafer via 180, and metal wire 105 form a complete metal connection structure. The starting point of this metal connection structure is located at metal wire 101, and the tail end is located at metal wire 105. Therefore, connection terminals VDD_FH and VDD_MH are located on metal wire 105, and connection terminals VSS_ML and VSS_FL are located on metal wire 101.

本公開的實施例使用金屬型溫度感測器感溫單元替代BJT型溫度感測器感溫單元,用後道製程中BEOL中金屬電阻隨溫度偏移穩定的特性,規避前道中BJT製造製程波動,提高溫度感測器感溫單元固有精度。 The disclosed embodiments use a metal-type temperature sensor sensing unit to replace the BJT-type temperature sensor sensing unit. This utilizes the stable temperature offset characteristics of metal resistors in the back-end (BEOL) process to mitigate fluctuations in the BJT manufacturing process in the front-end (FoF) and improve the inherent accuracy of the temperature sensor sensing unit.

在本公開的一些實施例中,晶片包括至少一個晶粒(DIE,或者管芯、裸晶),第一感溫單元和控制單元集成於至少 一個晶粒中的同一個晶粒中;或者第一感溫單元集成於至少一個晶粒之一且控制單元獨立於至少一個晶粒。 In some embodiments of the present disclosure, a wafer includes at least one die (DIE, or die, bare die), and the first temperature sensing unit and the control unit are integrated into the same die in the at least one die; or the first temperature sensing unit is integrated into one of the at least one die, and the control unit is independent of the at least one die.

圖2B示出了本公開至少一個實施例提供的一種晶片的示意性框圖。 Figure 2B shows a schematic block diagram of a chip provided by at least one embodiment of the present disclosure.

如圖2B所示,晶片210包括晶粒(DIE)211。晶片210包括溫度感測器系統,該溫度感測器系統包括感溫單元2111和ADC模組2112集成於晶粒(DIE)211中。感溫單元2111為第一感溫單元的示例,ADC模組2112為控制單元的示例。 As shown in FIG2B , chip 210 includes a die (DIE) 211. Chip 210 includes a temperature sensor system, which includes a temperature sensing unit 2111 and an ADC module 2112 integrated into die (DIE) 211. Temperature sensing unit 2111 is an example of a first temperature sensing unit, and ADC module 2112 is an example of a control unit.

在本公開的一些實施例中,晶片還包括封裝部分,第一感溫單元集成於至少一個晶粒之一且控制單元獨立於至少一個晶粒,包括:第一感溫單元集成於至少一個晶粒之一且控制單元設置於晶粒之外的封裝部分。 In some embodiments of the present disclosure, the chip further includes a packaging portion, wherein the first temperature sensing unit is integrated into at least one of the dies and the control unit is independent of the at least one of the dies, including: the packaging portion in which the first temperature sensing unit is integrated into at least one of the dies and the control unit is disposed outside the dies.

圖2C示出了本公開至少一個實施例提供的另一種晶片的示意性框圖。 Figure 2C shows a schematic block diagram of another chip provided by at least one embodiment of the present disclosure.

如圖2C所示,晶片220包括晶粒221和封裝部分222。封裝部分用於對晶片220進行封裝(package)。感溫單元2211集成於晶粒221中,ADC模組2221設置于封裝部分222中,以獨立於晶粒221。感溫單元2211為第一感溫單元的示例,ADC模組2221為控制單元的示例。 As shown in Figure 2C, chip 220 includes a die 221 and a packaging portion 222. The packaging portion is used to package chip 220. A temperature sensing unit 2211 is integrated into die 221, and an ADC module 2221 is disposed within packaging portion 222 to be independent of die 221. Temperature sensing unit 2211 is an example of a first temperature sensing unit, and ADC module 2221 is an example of a control unit.

在本公開的一些實施例中,在晶片包括通過鍵合結構堆疊設置的多個晶粒的情形中,第一感溫單元集成於至少一個晶粒之一且第一感溫單元設置於所述鍵合結構中。 In some embodiments of the present disclosure, when a chip includes multiple dies stacked together via a bonding structure, a first temperature sensing unit is integrated into at least one of the dies and the first temperature sensing unit is disposed in the bonding structure.

圖2D示出了本公開至少一個實施例提供的另一種晶片的示意性框圖。 Figure 2D shows a schematic block diagram of another chip provided by at least one embodiment of the present disclosure.

如圖2D所示,晶片230包括晶粒231、晶粒232和封裝部分233。晶粒231和晶粒232通過鍵合(Bonding)結構234堆疊設置。鍵合結構234用於將晶粒231和晶粒232鍵合為一體。 As shown in FIG2D , chip 230 includes die 231, die 232, and a packaging portion 233. Die 231 and die 232 are stacked together via a bonding structure 234. Bonding structure 234 is used to bond die 231 and die 232 together.

感溫單元2311集成於晶粒231中,ADC模組2341設置於鍵合結構234中,獨立於晶粒231和晶粒232。 The temperature sensing unit 2311 is integrated into the die 231, and the ADC module 2341 is located in the bonding structure 234, independent of the die 231 and the die 232.

在本公開的一些實施例中,溫度感測器系統包括多個感溫單元,多個感溫單元包括第一感溫單元。溫度感測器系統還包括多工器,多工器與控制單元和多個感溫單元耦接,且配置為從多個感溫單元中擇一。 In some embodiments of the present disclosure, a temperature sensor system includes a plurality of temperature sensing units, including a first temperature sensing unit. The temperature sensor system further includes a multiplexer coupled to the control unit and the plurality of temperature sensing units and configured to select one of the plurality of temperature sensing units.

例如,溫度感測器系統包括在設置在多個位置的後道金屬繞線,這些多個位置的後道金屬繞線作為多個感溫單元。 For example, a temperature sensor system includes back-end metal windings arranged at multiple locations, and these back-end metal windings at multiple locations serve as multiple temperature sensing units.

多工器耦接多個感溫單元,實現對多個感溫單元的供電和切換。 The multiplexer couples multiple temperature sensing units to realize power supply and switching for multiple temperature sensing units.

圖3示出了本公開至少一個實施例提供的多工器與感溫單元的耦接關係的示意圖。 Figure 3 shows a schematic diagram of the coupling relationship between the multiplexer and the temperature sensing unit provided in at least one embodiment of the present disclosure.

如圖3所示,晶片300包括感溫單元301、感溫單元302和感溫單元303。感溫單元301、感溫單元302和感溫單元303均與多工器304耦接。多工器與ADC模組305耦接。 As shown in Figure 3, chip 300 includes temperature sensing unit 301, temperature sensing unit 302, and temperature sensing unit 303. Temperature sensing unit 301, temperature sensing unit 302, and temperature sensing unit 303 are all coupled to multiplexer 304. The multiplexer is coupled to ADC module 305.

多工器304用於從感溫單元301、感溫單元302和感溫單元303中擇一與ADC模組305導通。如圖3所示,例如,多工器304選擇感溫單元303與ADC模組305導通。如圖3所示,ADC模組305通過多工器304與感溫單元303形成4線開爾文電路,從而ADC模組305通過高電位施加線、低電位施加線向感溫單元303分別施加高電位低電流和低電位低電流,並且通過高電位檢測 線和低電位檢測線檢測感溫單元的電壓。 Multiplexer 304 is used to select one of temperature sensing units 301, 302, and 303 to connect to ADC module 305. As shown in Figure 3, for example, multiplexer 304 selects temperature sensing unit 303 to connect to ADC module 305. As shown in Figure 3, ADC module 305 forms a four-wire Kelvin circuit with temperature sensing unit 303 through multiplexer 304. ADC module 305 applies a high voltage and low current to temperature sensing unit 303 via a high voltage application line and a low voltage and low current via a low voltage application line, respectively. ADC module 305 then detects the voltage across the temperature sensing unit via a high voltage detection line and a low voltage detection line.

通過4線開爾文電路使得電阻的測量更加準確,從而提高了溫度的測量精度。 The 4-wire Kelvin circuit enables more accurate resistance measurements, thereby improving temperature measurement accuracy.

在本公開的一些實施例中,晶片包括多個晶粒,多工器與第一感溫單元位於同一晶粒或者不在同一晶粒中。 In some embodiments of the present disclosure, the chip includes multiple dies, and the multiplexer and the first temperature sensing unit are located in the same die or in different dies.

例如,在圖2D的示例中,感溫單元2311位於晶粒231中,多工器可以位於晶粒231中,或者多工器可以位於鍵合結構234中。 For example, in the example of FIG2D , the temperature sensing unit 2311 is located in the die 231 , the multiplexer can be located in the die 231 , or the multiplexer can be located in the bonding structure 234 .

在本公開的一些實施例中,例如每個晶粒可以包括多個感溫單元,則每個晶粒可以包括多工器,以從多個感溫單元中擇一與ADC模組導通。 In some embodiments of the present disclosure, for example, each die may include multiple temperature sensing units. Each die may then include a multiplexer to select one of the multiple temperature sensing units to connect to the ADC module.

圖4示出了本公開至少一個實施例提供的溫度感測器系統的示意圖。 Figure 4 shows a schematic diagram of a temperature sensor system provided by at least one embodiment of the present disclosure.

在圖4的示例中,晶片包括多個以2.5D封裝形式封裝的晶粒。在本公開的實施例中,將多個晶粒並列排在矽中介層(Silicon Interposer)、基底或者基板的封裝形式稱為2.5D封裝。例如,在圖4的多個實施例中,晶粒A和晶粒B並列排在矽中介層、基板或者基底上。圖4示出了本公開提供的4個溫度感測器系統的實施例。以晶片包括晶粒A和晶粒B為例說明這4個溫度感測器系統的實施例。 In the example of Figure 4, a chip includes multiple dies packaged in a 2.5D package. In embodiments of this disclosure, a package in which multiple dies are arranged side by side on a silicon interposer, substrate, or base is referred to as a 2.5D package. For example, in the embodiments of Figure 4, die A and die B are arranged side by side on a silicon interposer, substrate, or base. Figure 4 illustrates four embodiments of temperature sensor systems provided by this disclosure. These four temperature sensor systems are described using a chip including die A and die B as an example.

如圖4的(a)的示例所示,在本公開的一些實施例中,晶粒A和晶粒B分別內置多路感測器和ADC模組。晶粒A的多工器401耦接到晶粒A中的至少一個感溫單元402,即至少一個後道金屬結構,並且還與晶粒A中內置的ADC模組403耦接。類 似地,晶粒B的多工器411耦接到晶粒B中的至少一個感溫單元412,即至少一個後道金屬結構,並且還與B中內置的ADC模組413耦接。 As shown in the example of Figure 4(a), in some embodiments of the present disclosure, die A and die B each have built-in multiplexed sensors and ADC modules. Die A's multiplexer 401 is coupled to at least one temperature-sensing unit 402, or at least one back-end metal structure, in die A, and is also coupled to an ADC module 403 built into die A. Similarly, die B's multiplexer 411 is coupled to at least one temperature-sensing unit 412, or at least one back-end metal structure, in die B, and is also coupled to an ADC module 413 built into die B.

在本公開的一些實施例中,在第一感溫單元和控制單元分別集成於少一個晶粒中的不同晶粒中的情形中:第一感溫單元位於第一晶粒中,控制單元位於第二晶粒中。第一晶粒中的多工器通過互連結構與控制單元耦接,互連結構用於耦接第一晶粒和第二晶粒。 In some embodiments of the present disclosure, when the first temperature sensing unit and the control unit are integrated into different dies within at least one die, the first temperature sensing unit is located in the first die, and the control unit is located in the second die. The multiplexer in the first die is coupled to the control unit via an interconnect structure that couples the first die and the second die.

例如,在圖4的(b)的示例中,第一感溫單元例如為晶粒A中的感溫單元,即晶粒A為第一晶粒的示例,控制單元位於晶粒B中,即晶粒B為第二晶粒的示例。 For example, in the example of FIG4(b), the first temperature sensing unit is the temperature sensing unit in die A, i.e., die A is an example of the first die, and the control unit is located in die B, i.e., die B is an example of the second die.

晶粒A內置多工器401,但是未內置ADC模組;晶粒B內置多路感測器411和ADC模組413。晶粒A的多工器401耦接到晶粒A中的至少一個感溫單元402,並且還與B中的ADC模組413耦接。例如,晶粒內的多工器401通過互聯結構耦接到B的ADC模組413。例如,晶粒A和晶粒B通過片間互連電路結構耦接。本領域技術人員可以採用本領域中的電路結構將晶粒A和晶粒B耦接使得晶粒A和晶粒B相互通信。 Die A has a built-in multiplexer 401 but no built-in ADC module; Die B has a built-in multiplexer 411 and an ADC module 413. Die A's multiplexer 401 is coupled to at least one temperature sensing unit 402 in Die A and is also coupled to ADC module 413 in Die B. For example, Die A and Die B are coupled via an inter-chip interconnect circuit structure. Those skilled in the art can employ circuit structures known in the art to couple Die A and Die B to enable communication between them.

晶粒B的多工器411耦接到晶粒B中的至少一個感溫單元412,並且還與B中內置的ADC模組413耦接。 The multiplexer 411 of die B is coupled to at least one temperature sensing unit 412 in die B and is also coupled to the built-in ADC module 413 in die B.

在本公開的一些實施例中,在感溫單元(例如,第一感溫單元)集成於至少一個晶粒之一且控制單元獨立於至少一個晶粒的情形中,多工器通過第一晶粒的封裝電路結構與控制單元耦接。 In some embodiments of the present disclosure, when a temperature sensing unit (e.g., a first temperature sensing unit) is integrated into at least one die and a control unit is independent of the at least one die, the multiplexer is coupled to the control unit via the package circuit structure of the first die.

例如,在圖4的(c)的示例中,ADC模組42獨立于晶片中的任一晶粒(晶粒A和晶粒B),晶粒A集成有感溫單元402和多工器401,晶粒B集成有感溫單元412和多工器411。晶粒A的多工器401和晶粒A內的多個感溫單元402耦接,晶粒B內的多工器411與晶粒B內的多個感溫單元412耦接。晶粒A內的多工器401和晶粒B內的多工器411分別通過封裝電路結構耦接到合封的ADC模組42。合封的ADC模組42是指與晶粒A和晶粒B合封到同一晶片中的ADC模組。在該示例中,晶粒A和晶粒B均為第一晶粒的示例。第一晶粒通過封裝電路結構封裝,例如,第一晶粒包括信號輸出口,多工器與信號輸出口耦接,信號輸出口與封裝電路結構耦接,以使多工器與控制單元耦接。 For example, in the example of FIG4(c), the ADC module 42 is independent of any die (die A and die B) in the chip. Die A integrates a temperature sensing unit 402 and a multiplexer 401, and die B integrates a temperature sensing unit 412 and a multiplexer 411. The multiplexer 401 of die A is coupled to the multiple temperature sensing units 402 in die A, and the multiplexer 411 in die B is coupled to the multiple temperature sensing units 412 in die B. The multiplexer 401 in die A and the multiplexer 411 in die B are respectively coupled to the packaged ADC module 42 via a packaged circuit structure. The packaged ADC module 42 refers to an ADC module that is packaged into the same chip as die A and die B. In this example, die A and die B are both examples of the first die. The first die is packaged by a package circuit structure. For example, the first die includes a signal output port, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure so that the multiplexer is coupled to the control unit.

例如,在圖4的(d)的示例中,晶片包括一個獨立于晶片中的任一晶粒的ADC模組43。晶片除包括ADC模組43之外,還包括集成於晶粒A中的另一ADC模組403。即,晶粒A內置ADC模組403及多工器401,多工器401耦接到多個感溫單元402。晶粒B內置有多工器411,但是未內置ADC模組,因此,晶粒B中的多工器411可以通過封裝電路結構耦接到合封的ADC模組43。 For example, in the example shown in Figure 4(d), the chip includes an ADC module 43 independent of any die in the chip. In addition to ADC module 43, the chip also includes another ADC module 403 integrated into die A. Specifically, die A has built-in ADC module 403 and multiplexer 401, which is coupled to multiple temperature sensing units 402. Die B has built-in multiplexer 411 but no built-in ADC module. Therefore, multiplexer 411 in die B can be coupled to the encapsulated ADC module 43 via the packaged circuit structure.

在圖4的(c)和(d)的示例中,ADC模組集成在晶片的封裝部分並通過多工器與晶粒內的感溫單元相連,能夠減小晶粒內的ADC模組面積佔用,改善晶片的性能、功耗和面積(Performance-Power-Area,PPA)。並且,ADC模組集成在晶片的封裝部分並通過多工器與晶粒內的感溫單元相連,使得ADC模組的測量精度不受限於晶粒內ADC模組的面積限制,有利於提高溫 度測量解析度。 In the examples shown in Figure 4 (c) and (d), the ADC module is integrated into the chip package and connected to the on-die temperature sensing unit via a multiplexer. This reduces the ADC module's footprint within the die, improving the chip's performance, power consumption, and area (PPA). Furthermore, since the ADC module is integrated into the chip package and connected to the on-die temperature sensing unit via a multiplexer, the ADC module's measurement accuracy is not limited by the die's ADC module area, thus improving temperature measurement resolution.

圖5示出了本公開至少一個實施例提供的溫度感測器系統的示意圖。 Figure 5 shows a schematic diagram of a temperature sensor system provided by at least one embodiment of the present disclosure.

在圖5的示例中,晶片包括多個晶粒,多個晶粒通過鍵合結構鍵合為一體,圖5所示的多個晶粒堆疊設置的結構在本公開中稱為3D晶片。圖5示出了本公開提供的包括通過鍵合結構鍵合於一體的多個晶粒的晶片中溫度感測器系統的4個實施例。如圖5所示,晶粒A和晶粒B通過鍵合結構鍵合為一體。 In the example of Figure 5 , a wafer includes multiple dies bonded together via a bonding structure. The stacked structure of multiple dies shown in Figure 5 is referred to as a 3D wafer in this disclosure. Figure 5 illustrates four embodiments of a temperature sensor system in a wafer provided in this disclosure that includes multiple dies bonded together via a bonding structure. As shown in Figure 5 , die A and die B are bonded together via a bonding structure.

如圖5的(a)的示例所示,在本公開的一些實施例中,晶粒A和晶粒B分別內置多路感測器和ADC模組。晶粒A的多工器501耦接到晶粒A中的至少一個感溫單元502,並且還與A中內置的ADC模組503耦接。類似地,晶粒B的多工器511耦接到晶粒B中的至少一個感溫單元512,並且還與B中內置的ADC模組513耦接。 As shown in the example of Figure 5(a), in some embodiments of the present disclosure, die A and die B each have built-in multiplexed sensors and ADC modules. Die A's multiplexer 501 is coupled to at least one temperature-sensing unit 502 in die A and also to an ADC module 503 built into die A. Similarly, die B's multiplexer 511 is coupled to at least one temperature-sensing unit 512 in die B and also to an ADC module 513 built into die B.

在本公開的一些實施例中,在第一感溫單元和控制單元分別集成於少一個晶粒中的不同晶粒中的情形中:第一感溫單元位於第一晶粒中,控制單元位於第二晶粒中。第一晶粒中的多工器通過鍵合結構與控制單元耦接。 In some embodiments of the present disclosure, when the first temperature sensing unit and the control unit are integrated into different dies within at least one die, the first temperature sensing unit is located in the first die, and the control unit is located in the second die. The multiplexer in the first die is coupled to the control unit via a bonding structure.

例如,在圖的5(b)的示例中,例如第二晶粒是緊鄰底層基底的晶粒A,第一晶粒為堆疊在第二晶粒遠離底層基底的一側的晶粒B。第一感溫單元例如為晶粒A中的感溫單元502,即晶粒A為第二晶粒的示例,控制單元位於晶粒B中,即晶粒B為第一晶粒的示例。 For example, in the example of Figure 5(b), the second die is die A, which is adjacent to the underlying substrate, and the first die is die B, which is stacked on the side of the second die away from the underlying substrate. The first temperature sensing unit is, for example, temperature sensing unit 502 in die A, meaning die A is an example of the second die, and the control unit is located in die B, meaning die B is an example of the first die.

晶粒A內置多工器501,但是未內置ADC模組;晶粒B 內置多路感測器511和ADC模組513。晶粒A的多工器501耦接到晶粒A中的至少一個感溫單元502,並且還與B中的ADC模組513耦接。例如,晶粒A內的多工器501通過鍵合結構耦接到B的ADC模組513。例如,晶粒A內的多工器501和晶粒B的ADC模組513通過鍵合結構中的電路結構耦接。本公開對鍵合結構中的電路結構不做限定,本領域技術人員可以自行設計鍵合結構中的電路結構使得晶粒A內的多工器501和晶粒B的ADC模組513耦接。 Die A has a built-in multiplexer 501 but no built-in ADC module; Die B has a built-in multiplexer 511 and an ADC module 513. Die A's multiplexer 501 is coupled to at least one temperature sensing unit 502 in Die A and is also coupled to the ADC module 513 in Die B. For example, the multiplexer 501 in Die A is coupled to the ADC module 513 in Die B via a bonding structure. For example, the multiplexer 501 in Die A and the ADC module 513 in Die B are coupled via a circuit structure in the bonding structure. This disclosure does not limit the circuit structure in the bonding structure; those skilled in the art can design the circuit structure in the bonding structure to couple the multiplexer 501 in Die A to the ADC module 513 in Die B.

晶粒B的多工器耦接到晶粒B中的至少一個感溫單元,並且還與B中內置的ADC模組耦接。 The multiplexer in die B is coupled to at least one temperature sensing unit in die B and is also coupled to the ADC module built into die B.

在本公開的一些實施例中,第一晶粒和第二晶粒通過鍵合結構堆疊設置並且由封裝電路結構封裝,第二晶粒包括信號輸出口,第一晶粒不包括信號輸出口,多工器通過鍵合結構耦接到信號輸出口,通過信號輸出口與封裝電路結構耦接至控制單元。 In some embodiments of the present disclosure, a first die and a second die are stacked via a bonding structure and packaged by a packaging circuit structure. The second die includes a signal output port, while the first die does not. The multiplexer is coupled to the signal output port via the bonding structure and is coupled to a control unit via the signal output port and the packaging circuit structure.

在圖5的(b)的示例中,通過在3D晶片內的晶粒B集成ADC模組,並與晶粒A內的感溫單元相連,能夠減小晶粒A內ADC模組的面積佔用,改善晶粒A的PPA性能、功耗和面積。並且,晶粒A可提供更大面積設計更高精度的ADC模組,提高溫度測量解析度。 In the example shown in Figure 5(b), by integrating the ADC module in die B within the 3D chip and connecting it to the temperature sensing unit in die A, the ADC module's footprint in die A can be reduced, improving die A's PPA performance, power consumption, and footprint. Furthermore, die A can provide a larger area for designing a higher-precision ADC module, thereby improving temperature measurement resolution.

例如,在圖5的(c)的示例中,ADC模組52獨立于晶片中的任一晶粒(晶粒A和晶粒B),晶粒A集成有感溫單元502和多工器501,晶粒B集成有感溫單元512和多工器511。晶粒A的多工器501和晶粒A內的多個感溫單元502耦接,晶粒B內的多工器511與晶粒B內的多個感溫單元512耦接。 For example, in the example shown in Figure 5(c), ADC module 52 is independent of either die (die A or die B) in the chip. Die A integrates a temperature sensing unit 502 and a multiplexer 501, while die B integrates a temperature sensing unit 512 and a multiplexer 511. Multiplexer 501 in die A is coupled to multiple temperature sensing units 502 in die A, while multiplexer 511 in die B is coupled to multiple temperature sensing units 512 in die B.

例如,晶粒A包括信號輸出口,晶粒B不包括信號輸出口,即在該示例中晶粒B為第一晶粒的示例,晶粒A為第二晶粒的示例。晶粒B中的多工器511通過鍵合結構耦接到晶粒A的信號輸出口,通過晶粒A的信號輸出口耦接到封裝電路結構,再通過封裝電路結構耦接到合封的ADC模組52。晶粒A的多工器501通過自身的信號輸出口耦接到封裝電路結構,再通過封裝電路結構耦接到合封的ADC模組52。 For example, die A includes a signal output port, while die B does not. In this example, die B is an example of the first die, and die A is an example of the second die. The multiplexer 511 in die B is coupled to the signal output port of die A via a bonding structure, then to the packaged circuit structure via die A's signal output port, and then to the packaged ADC module 52 via the packaged circuit structure. The multiplexer 501 in die A is coupled to the packaged circuit structure via its own signal output port, and then to the packaged ADC module 52 via the packaged circuit structure.

在該示例中,第一晶粒(即,晶粒B)和第二晶粒(即,晶粒A)通過封裝電路結構封裝,ADC模組52和封裝後的第一晶粒和第二晶粒合封。 In this example, the first die (i.e., die B) and the second die (i.e., die A) are packaged by a packaged circuit structure, and the ADC module 52 is sealed with the packaged first and second dies.

在圖5的(c)的示例中,ADC模組52獨立於晶粒A和晶粒B,減小晶粒A和晶粒B內ADC面積佔用,改善晶粒A和晶粒B的性能、功耗和面積。並且晶粒A和晶粒B可提供更大面積設計更高精度的ADC模組,提高溫度測量解析度。 In the example of Figure 5(c), ADC module 52 is independent of die A and die B, reducing the ADC area occupied by die A and die B, improving the performance, power consumption, and area of die A and die B. Furthermore, die A and die B can provide a larger area for designing higher-precision ADC modules, thereby improving temperature measurement resolution.

例如,在圖5的(d)的示例中,晶片包括一個獨立于晶片中的任一晶粒的ADC模組53。晶片除包括ADC模組53之外,還包括集成於晶粒A中的另一ADC模組503。即,晶粒A內置ADC模組503及多工器501,多工器501耦接到多個感溫單元502。晶粒B內置有多工器511,但是未內置ADC模組,因此,晶粒B中的多工器511可以通過鍵合電路結構耦接到晶粒A的信號輸出口,通過信號輸出口與封裝電路結構耦接至控制單元。ADC模組503用於處理晶粒A中感溫單元502輸出的溫度感測信號得到測量結果。ADC模組53用於處理晶粒B中感溫單元512輸出的溫度感測信號得到測量結果。 For example, in the example of (d) in Figure 5 , the chip includes an ADC module 53 that is independent of any die in the chip. In addition to the ADC module 53, the chip also includes another ADC module 503 integrated in die A. That is, die A has a built-in ADC module 503 and a multiplexer 501, and the multiplexer 501 is coupled to multiple temperature sensing units 502. Die B has a built-in multiplexer 511, but no built-in ADC module. Therefore, the multiplexer 511 in die B can be coupled to the signal output port of die A through a bonding circuit structure, and coupled to the control unit through the signal output port and the packaging circuit structure. The ADC module 503 is used to process the temperature sensing signal output by the temperature sensing unit 502 in die A to obtain a measurement result. The ADC module 53 is used to process the temperature sensing signal output by the temperature sensing unit 512 in die B to obtain a measurement result.

在圖5的(d)的示例中,通過在3D晶片內晶粒A集成ADC,並與晶粒B內的感溫單元相連,減小晶粒B內ADC面積佔用,改善晶粒B的性能、功耗和面積。並且,晶粒B可提供更大面積設計更高精度的ADC模組,提高溫度測量解析度。 In the example shown in Figure 5(d), by integrating the ADC in die A within the 3D chip and connecting it to the temperature-sensing unit in die B, the ADC area within die B is reduced, improving the performance, power consumption, and area of die B. Furthermore, die B provides a larger area for designing a higher-precision ADC module, thereby enhancing temperature measurement resolution.

在本公開的一些實施例中,感溫單元設置於鍵合結構中。在感溫單元設置於鍵合結構中的情形下,控制單元(例如,ADC模組)可以設置於第一晶粒(例如,晶粒A)或者第二晶粒(例如,晶粒B)中,多工器與控制單元設置於同一晶粒中。例如,ADC模組以設置於第一晶粒中,多工器也設置於第一晶粒中。 In some embodiments of the present disclosure, a temperature sensing unit is disposed within a keying structure. When the temperature sensing unit is disposed within the keying structure, the control unit (e.g., ADC module) can be disposed within a first die (e.g., die A) or a second die (e.g., die B), with the multiplexer and the control unit disposed within the same die. For example, the ADC module can be disposed within the first die, and the multiplexer can also be disposed within the first die.

在本公開的另一些實施例中,控制單元獨立於第一晶粒和第二晶粒,第二晶粒包括信號輸出口,多工器設置於第二晶粒中,信號輸出口與封裝電路結構耦接,多工器與信號輸出口耦接,信號輸出口與封裝電路結構耦接,以使多工器經由封裝電路結構與控制單元耦接。 In some other embodiments of the present disclosure, the control unit is independent of the first die and the second die. The second die includes a signal output port. The multiplexer is disposed in the second die. The signal output port is coupled to the package circuit structure. The multiplexer is coupled to the signal output port. The signal output port is coupled to the package circuit structure, so that the multiplexer is coupled to the control unit via the package circuit structure.

例如,在圖5的(d)所示的結構中,鍵合結構中包括感溫單元。第二晶粒是緊鄰底層基底的晶粒A,第一晶粒為堆疊在第二晶粒遠離底層基底的一側的晶粒B。晶粒A包括信號輸出口,多工器設置於晶粒A中,多工器與鍵合結構中的感溫單元耦接。信號輸出口與封裝電路結構耦接,多工器與信號輸出口耦接,信號輸出口與封裝電路結構耦接,以使多工器經由封裝電路結構與控制單元耦接。 For example, in the structure shown in Figure 5(d), the bonding structure includes a temperature-sensing unit. The second die is die A, which is adjacent to the underlying substrate, and the first die is die B, which is stacked on the side of the second die away from the underlying substrate. Die A includes a signal output port, and a multiplexer is disposed within die A. The multiplexer is coupled to the temperature-sensing unit in the bonding structure. The signal output port is coupled to the package circuit structure, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure, so that the multiplexer is coupled to the control unit via the package circuit structure.

該實施例,在鍵合結構中設置感溫單元,從而可以監控鍵合結構中的溫度。 In this embodiment, a temperature sensing unit is provided in the key structure, thereby being able to monitor the temperature in the key structure.

本公開的另一方面提供了一種晶片,包括上述任一實施 例提供的溫度感測器系統。該晶片的溫度測量精度高。 Another aspect of the present disclosure provides a chip including the temperature sensor system provided by any of the aforementioned embodiments. This chip has high temperature measurement accuracy.

圖6示出了本公開至少一個實施例提供的一種晶片的結構示意圖。 Figure 6 shows a schematic structural diagram of a chip provided in at least one embodiment of the present disclosure.

如圖6所示,晶片包括通過鍵合結構604堆疊的晶粒601和602。晶粒601形成于矽中介層、基板或者基底603上。晶粒602位於晶粒601遠離矽中介層或者基底的一側。 As shown in Figure 6, the chip includes die 601 and 602 stacked by a bonding structure 604. Die 601 is formed on a silicon interposer, substrate, or base 603. Die 602 is located on a side of die 601 that is away from the silicon interposer or base.

如圖6所示,晶粒601包括通過前道製程形成的電晶體層611(又稱為“低層”)、通過後道製程形成的後道金屬結構612(又稱為“高層”)和矽基底層613。矽基底層為晶片的非電路層。圖6為晶片的倒置放置。 As shown in Figure 6, die 601 includes a transistor layer 611 (also called the "lower layer") formed through front-end processes, a back-end metal structure 612 (also called the "upper layer") formed through back-end processes, and a silicon substrate layer 613. The silicon substrate layer is the non-circuit layer of the chip. Figure 6 shows the chip in an inverted position.

如圖6所示,晶粒601中的後道金屬結構612包括後道金屬繞線6121、後道金屬過孔陣列和後道金屬繞線形成的金屬結構6122以及後道金屬繞線和穿過矽基底的過孔陣列組成的金屬結構6123。 As shown in FIG6 , the back-end metal structure 612 in die 601 includes a back-end metal routing 6121, a metal structure 6122 formed by a back-end metal via array and the back-end metal routing, and a metal structure 6123 consisting of a back-end metal routing and an array of vias passing through the silicon substrate.

後道金屬繞線6121、後道金屬過孔陣列和後道金屬繞線形成的金屬結構6122以及後道金屬繞線和穿過矽基底的過孔陣列組成的金屬結構6123分別用於感測晶粒601中不同位置處的溫度。 The back-end metal routing 6121, the metal structure 6122 formed by the back-end metal via array and the back-end metal routing, and the metal structure 6123 composed of the back-end metal routing and the via array passing through the silicon substrate are used to sense the temperature at different locations in the die 601.

晶粒602的結構與晶粒601類似,不再贅述。 The structure of die 602 is similar to that of die 601 and will not be further described.

有以下幾點需要說明: There are a few points that need clarification:

(1)本公開實施例附圖只涉及到本公開實施例涉及到的結構,其他結構可參考通常設計。 (1) The figures in the embodiments of this disclosure only relate to the structures involved in the embodiments of this disclosure. Other structures can refer to the general design.

(2)在不衝突的情況下,本公開的實施例及實施例中的特徵可以相互組合以得到新的實施例。 (2) In the absence of conflict, the embodiments of this disclosure and the features of the embodiments can be combined with each other to obtain new embodiments.

以上所述,僅為本公開的具體實施方式,但本公開的保護範圍並不局限於此,本公開的保護範圍應以所述權利要求的保護範圍為准。 The above description is only a specific implementation of this disclosure, but the scope of protection of this disclosure is not limited thereto. The scope of protection of this disclosure shall be based on the scope of protection of the aforementioned claims.

100:晶片 100: Chip

110:溫度感測器系統 110: Temperature sensor system

111:感溫單元 111: Temperature sensing unit

112:控制單元 112: Control unit

Claims (11)

一種晶片中的溫度感測器系統,包括: 第一感溫單元,使用在所述晶片的後道製程中形成的後道金屬結構感測溫度以輸出溫度感測電信號,其中所述第一感溫單元使用所述後道製程中形成的任意層後道金屬繞線或金屬過孔陣列中的至少一種來感測溫度;以及 控制單元,與所述第一感溫單元耦接,對所述第一感溫單元輸出的所述溫度感測電信號進行處理,以輸出測量結果, 其中,所述晶片包括至少一個晶粒, 所述第一感溫單元和所述控制單元集成於所述至少一個晶粒中的同一晶粒中,或者所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒; 其中,所述晶片還包括封裝部分,所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒,包括: 所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元設置於所述晶粒之外的所述封裝部分;或者 在所述晶片包括通過鍵合結構堆疊設置的多個晶粒的情形中,所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元設置於所述鍵合結構中。 A temperature sensor system in a chip comprises: a first temperature sensing unit that senses temperature using a back-end metal structure formed in a back-end process of the chip to output a temperature sensing electrical signal, wherein the first temperature sensing unit senses temperature using at least one of a back-end metal routing or a metal via array formed in any layer of the back-end process; and a control unit coupled to the first temperature sensing unit that processes the temperature sensing electrical signal output by the first temperature sensing unit to output a measurement result. The chip comprises at least one die; the first temperature sensing unit and the control unit are integrated into the same die of the at least one die, or the first temperature sensing unit is integrated into one of the at least one die and the control unit is independent of the at least one die. The chip further includes a packaging portion, the first temperature sensing unit is integrated into one of the at least one die, and the control unit is independent of the at least one die, including: The first temperature sensing unit is integrated into one of the at least one die, and the control unit is disposed in the packaging portion outside the die; or When the chip includes multiple dies stacked via a bonding structure, the first temperature sensing unit is integrated into one of the at least one die, and the control unit is disposed within the bonding structure. 如請求項1所述的溫度感測器系統,其中,所述溫度感測器系統包括多個感溫單元,所述多個感溫單元包括所述第一感溫單元; 所述溫度感測器系統還包括: 多工器,與所述控制單元和所述多個感溫單元耦接,且配置為從所述多個感溫單元中擇一。 The temperature sensor system of claim 1, wherein the temperature sensor system includes a plurality of temperature sensing units, the plurality of temperature sensing units including the first temperature sensing unit; The temperature sensor system further includes: A multiplexer coupled to the control unit and the plurality of temperature sensing units and configured to select one of the plurality of temperature sensing units. 如請求項2所述的溫度感測器系統,其中,所述晶片包括多個晶粒, 所述多工器與所述第一感溫單元位於同一晶粒或者不在同一晶粒中。 The temperature sensor system of claim 2, wherein the chip includes multiple dies, and the multiplexer and the first temperature sensing unit are located in the same die or in different dies. 如請求項2所述的溫度感測器系統,其中,所述至少一個晶粒包括第一晶粒,所述多工器位於第一晶粒中, 在所述第一感溫單元集成於所述至少一個晶粒之一且所述控制單元獨立於所述至少一個晶粒的情形中,所述多工器通過所述第一晶粒的封裝電路結構與所述控制單元耦接。 The temperature sensor system of claim 2, wherein the at least one die includes a first die, the multiplexer is located in the first die, wherein the first temperature sensing unit is integrated into one of the at least one die and the control unit is independent of the at least one die, the multiplexer is coupled to the control unit via a package circuit structure of the first die. 如請求項4所述的溫度感測器系統,其中,所述第一晶粒包括信號輸出口,所述多工器與所述信號輸出口耦接,所述信號輸出口與所述封裝電路結構耦接,以使所述多工器與所述控制單元耦接。A temperature sensor system as described in claim 4, wherein the first die includes a signal output port, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure so that the multiplexer is coupled to the control unit. 如請求項4所述的溫度感測器系統,其中,所述至少一個晶粒還包括第二晶粒,所述第一晶粒和所述第二晶粒通過鍵合結構堆疊設置並且由所述封裝電路結構封裝, 所述第二晶粒包括信號輸出口,所述第一晶粒不包括信號輸出口,所述多工器通過所述鍵合結構耦接到所述信號輸出口,通過所述信號輸出口與所述封裝電路結構耦接至所述控制單元。 The temperature sensor system of claim 4, wherein the at least one die further includes a second die, the first die and the second die are stacked via a bonding structure and packaged by the package circuit structure, the second die includes a signal output port, while the first die does not, the multiplexer is coupled to the signal output port via the bonding structure, and is coupled to the control unit via the signal output port and the package circuit structure. 如請求項2所述的溫度感測器系統,其中,所述至少一個晶粒包括第一晶粒和第二晶粒, 在所述第一感溫單元和所述控制單元分別集成於所述至少一個晶粒中的不同晶粒中的情形中: 所述第一感溫單元位於所述第一晶粒中,所述控制單元位於所述第二晶粒中, 所述第一晶粒中的多工器通過互連結構與所述控制單元耦接,其中,所述互連結構用於耦接所述第一晶粒和所述第二晶粒;或者 所述第一晶粒中的多工器通過鍵合結構與所述控制單元耦接,其中,所述鍵合結構用於使所述第一晶粒和所述第二晶粒堆疊設置。 The temperature sensor system of claim 2, wherein the at least one die includes a first die and a second die, and in a case where the first temperature sensing unit and the control unit are integrated into different dies of the at least one die: the first temperature sensing unit is located in the first die, and the control unit is located in the second die; the multiplexer in the first die is coupled to the control unit via an interconnect structure, wherein the interconnect structure is used to couple the first die and the second die; or the multiplexer in the first die is coupled to the control unit via a bonding structure, wherein the bonding structure is used to stack the first die and the second die. 如請求項2所述的溫度感測器系統,其中,所述晶片包括第一晶粒和第二晶粒,在所述第一感溫單元設置於所述鍵合結構的情形中, 所述控制單元設置於所述第一晶粒或者所述第二晶粒,所述多工器與所述控制單元設置於同一晶粒中;或者 所述控制單元獨立於所述第一晶粒和所述第二晶粒,所述第二晶粒包括信號輸出口,所述多工器設置於所述第二晶粒中,所述信號輸出口與封裝電路結構耦接,所述多工器與所述信號輸出口耦接,所述信號輸出口與所述封裝電路結構耦接,以使所述多工器經由所述封裝電路結構與所述控制單元耦接。 The temperature sensor system of claim 2, wherein the chip includes a first die and a second die, and in the case where the first temperature sensing unit is disposed in the bonding structure, the control unit is disposed in the first die or the second die, and the multiplexer and the control unit are disposed in the same die; or the control unit is independent of the first die and the second die, the second die includes a signal output port, the multiplexer is disposed in the second die, the signal output port is coupled to a package circuit structure, the multiplexer is coupled to the signal output port, and the signal output port is coupled to the package circuit structure, such that the multiplexer is coupled to the control unit via the package circuit structure. 如請求項1-8中任一所述的溫度感測器系統,其中,所述後道金屬結構包括以下至少一種: 後道金屬繞線、後道金屬過孔陣列和所述後道金屬繞線組成的金屬結構、所述後道金屬繞線和穿過矽基底的過孔陣列組成的金屬結構。 The temperature sensor system of any one of claims 1-8, wherein the back-end metal structure comprises at least one of the following: A back-end metal routing wire, a metal structure consisting of a back-end metal via array and the back-end metal routing wire, or a metal structure consisting of the back-end metal routing wire and an array of vias passing through a silicon substrate. 如請求項1-8中任一所述的溫度感測器系統,其中,所述控制單元和第一感測單元形成基於4線開爾文電路,以對所述溫度感測電信號進行處理,以輸出測量結果。A temperature sensor system as described in any one of claims 1-8, wherein the control unit and the first sensing unit form a 4-wire Kelvin circuit to process the temperature sensing electrical signal to output a measurement result. 一種晶片,包括:如請求項1-10中任一項所述的溫度感測器系統。A chip comprising: a temperature sensor system as described in any one of claims 1-10.
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