TWI889599B - Electromagnetic wave shielding sheet, printed wiring board with electromagnetic wave shielding sheet, and electronic equipment - Google Patents
Electromagnetic wave shielding sheet, printed wiring board with electromagnetic wave shielding sheet, and electronic equipment Download PDFInfo
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- TWI889599B TWI889599B TW113143877A TW113143877A TWI889599B TW I889599 B TWI889599 B TW I889599B TW 113143877 A TW113143877 A TW 113143877A TW 113143877 A TW113143877 A TW 113143877A TW I889599 B TWI889599 B TW I889599B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/29—Laminated material
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/212—Electromagnetic interference shielding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Structure Of Printed Boards (AREA)
- Adhesive Tapes (AREA)
- Laminated Bodies (AREA)
Abstract
本發明提供一種在衝壓加工時不產生剝離、且傳輸特性、屏蔽性、脫氣性優異的電磁波屏蔽片、及具有電磁波屏蔽片的印刷電路板。一種電磁波屏蔽片,依次層疊有保護層、導電層以及接著劑層,所述電磁波屏蔽片中,所述導電層包含金屬填料以及黏合劑,在所述保護層與所述接著劑層之間的剝離角度180°、剝離速度:300 mm/min下進行剝離試驗,所述導電層發生內聚破壞時的剝離力為50[gf/25 mm]~2500[gf/25 mm],在所述剝離試驗中,所述導電層的內聚破壞率為10%以上。The present invention provides an electromagnetic wave shielding sheet which does not peel off during punching and has excellent transmission characteristics, shielding properties and degassing properties, and a printed circuit board having the electromagnetic wave shielding sheet. An electromagnetic wave shielding sheet is provided, wherein a protective layer, a conductive layer and an adhesive layer are sequentially stacked, wherein the conductive layer contains a metal filler and an adhesive, and a peeling test is performed at a peeling angle of 180° between the protective layer and the adhesive layer and a peeling speed of 300 mm/min. When the conductive layer undergoes cohesive failure, the peeling force is 50 [gf/25 mm] to 2500 [gf/25 mm]. In the peeling test, the cohesive failure rate of the conductive layer is greater than 10%.
Description
本發明是有關於一種電磁波屏蔽片及具有電磁波屏蔽片的印刷電路板、以及電子設備。The present invention relates to an electromagnetic wave shielding sheet, a printed circuit board having the electromagnetic wave shielding sheet, and an electronic device.
以移動終端、個人電腦(personal computer,PC)、伺服器(server)等為代表的各種電子設備中內置有印刷電路板等基板。為了防止由來自外部的磁場或電波引起的誤動作,另外為了減少來自電氣信號的無用輻射,而在這些基板上設置有電磁波屏蔽結構。Various electronic devices such as mobile terminals, personal computers (PCs), and servers have built-in substrates such as printed circuit boards. In order to prevent malfunctions caused by external magnetic fields or radio waves, and to reduce unnecessary radiation from electrical signals, electromagnetic wave shielding structures are provided on these substrates.
隨著傳輸信號的高速傳輸化,對具有電磁波屏蔽片的印刷電路板要求具有應對高頻雜訊的電磁波屏蔽性(以下,為高頻屏蔽性)及減少高頻區域中的傳輸損耗(以下,有時稱為傳輸特性)。在國際公開第2013/077108號中,公開了以層疊狀態包括層厚為0.5 μm~12 μm的金屬層、與各向異性導電接著劑層的屏蔽膜。而且記載了,藉由此結構,會良好地遮蔽從電磁波屏蔽片的其中一面側向另一面側行進的電場波、磁場波及電磁波,並且減少傳輸損耗。With the high-speed transmission of transmission signals, printed circuit boards with electromagnetic wave shielding sheets are required to have electromagnetic wave shielding properties against high-frequency noise (hereinafter referred to as high-frequency shielding properties) and reduce transmission losses in high-frequency regions (hereinafter sometimes referred to as transmission characteristics). International Publication No. 2013/077108 discloses a shielding film including a metal layer with a thickness of 0.5 μm to 12 μm and an anisotropic conductive adhesive layer in a laminated state. It is also described that, with this structure, electric field waves, magnetic field waves, and electromagnetic waves traveling from one side of the electromagnetic wave shielding sheet to the other side can be well shielded, and transmission losses can be reduced.
[發明所欲解決之課題][The problem that the invention wants to solve]
然而,在印刷電路板貼附有使用了金屬層的電磁波屏蔽片的電磁波屏蔽性印刷電路板存在如下問題:當進行回流焊等加熱處理時,因從印刷電路板的內部產生的揮發成分而在層間產生浮起,因發泡等而導致外觀不良及連接不良。 其原因在於:從印刷電路板產生的水蒸氣等逸氣因電磁波屏蔽片的緻密的金屬層而滯留,從而對電磁波屏蔽片要求逸氣的透過性(以下,為脫氣性)。 However, an electromagnetic shielding printed circuit board having an electromagnetic shielding sheet using a metal layer attached to the printed circuit board has the following problem: when performing a heat treatment such as reflow soldering, volatile components generated from the inside of the printed circuit board float between the layers, resulting in poor appearance and poor connection due to foaming. The reason is that outgassing such as water vapor generated from the printed circuit board is retained by the dense metal layer of the electromagnetic shielding sheet, so the electromagnetic shielding sheet is required to have permeability of the outgassing (hereinafter referred to as degassing property).
另一方面,電磁波屏蔽片在使用時,有時會衝壓加工成所需的尺寸及形狀。此時,有如下衝壓方式:將電磁波屏蔽片貼合在帶式載體而進行衝壓加工,並在貼附在印刷電路板等後將帶式載體剝離。在本方式的情況下,當對帶式載體進行剝離時,有時不產生帶式載體與電磁波屏蔽片的接著介面的剝離,而是在電磁波屏蔽片內產生剝離(以下,為載體衝壓適應性)。On the other hand, when using the electromagnetic wave shielding sheet, it is sometimes stamped into a desired size and shape. In this case, there is a stamping method that is as follows: the electromagnetic wave shielding sheet is bonded to a tape carrier and stamped, and the tape carrier is peeled off after being attached to a printed circuit board, etc. In the case of this method, when the tape carrier is peeled off, sometimes the electromagnetic wave shielding sheet is not peeled off at the interface between the tape carrier and the electromagnetic wave shielding sheet, but peeling occurs inside the electromagnetic wave shielding sheet (hereinafter referred to as carrier stamping adaptability).
本發明的目的在於提供一種抑制衝壓加工時的電磁波屏蔽片內的剝離、且傳輸特性、屏蔽性及脫氣性優異的電磁波屏蔽片、具有電磁波屏蔽片的印刷電路板、以及電子設備。 [解決課題之手段] The purpose of the present invention is to provide an electromagnetic shielding sheet that suppresses peeling in the electromagnetic shielding sheet during punching and has excellent transmission characteristics, shielding properties and degassing properties, a printed circuit board having the electromagnetic shielding sheet, and an electronic device. [Means for solving the problem]
本案發明人重複努力研究,結果發現在以下的形態中可解決本發明的課題,從而完成了本發明。 [1]:一種電磁波屏蔽片,依次層疊有保護層、導電層以及接著劑層,所述電磁波屏蔽片中,所述導電層包含金屬填料以及黏合劑,在所述保護層與所述接著劑層之間的剝離角度180°、剝離速度:300 mm/min下進行剝離試驗,所述導電層發生內聚破壞時的剝離力為50[gf/25 mm]~2500[gf/25 mm],在所述剝離試驗中,所述導電層的內聚破壞率為10%以上。 [2]:如[1]所述的電磁波屏蔽片,其中,所述導電層的導電率為2.4×10 6[S/m]~3.0×10 7[S/m]。 [3]:如[1]或[2]所述的電磁波屏蔽片,其中,所述導電層的表面電阻率為4.0×10 -3[Ω/□]~2.0×10 -1[Ω/□]。 [4]:如[1]至[3]中任一項所述的電磁波屏蔽片,其中,對所述電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的切斷面中的、將所述導電層的剖面積設為100時所述金屬填料所占的面積為23~95。 [5]:如[1]至[4]中任一項所述的電磁波屏蔽片,其中,對所述電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的切斷面中的所述導電層的厚度為1 μm~12 μm。 [6]:如[1]至[5]中任一項所述的電磁波屏蔽片,其中,所述金屬填料包含薄片狀金屬填料,對所述電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的所述導電層的切斷面中的、所述薄片狀金屬填料的平均縱橫比為10~70。 [7]:如[1]至[6]中任一項所述的電磁波屏蔽片,其中,所述金屬填料包含銀塗層銅粉,在對所述電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的所述導電層的切斷面中,利用能量分散型X射線分析而得的將銅及銀元素的總質量設為100%時的銀元素的質量的比例為3%以上且25%以下。 [8]:一種具有電磁波屏蔽片的印刷電路板,包括如[1]至[7]中任一項所述的電磁波屏蔽片。 [9]:一種電子設備,包括如[8]所述的具有電磁波屏蔽片的印刷電路板。 [發明的效果] The inventors of this case have repeatedly made efforts to study and found that the problem of the present invention can be solved in the following form, thereby completing the present invention. [1]: An electromagnetic wave shielding sheet, which is stacked with a protective layer, a conductive layer and an adhesive layer in sequence, wherein the conductive layer of the electromagnetic wave shielding sheet contains a metal filler and an adhesive, and a peeling test is carried out at a peeling angle of 180° between the protective layer and the adhesive layer and a peeling speed of 300 mm/min. The peeling force when the conductive layer undergoes cohesive failure is 50 [gf/25 mm] to 2500 [gf/25 mm], and in the peeling test, the cohesive failure rate of the conductive layer is more than 10%. [2]: The electromagnetic shielding sheet according to [1], wherein the conductivity of the conductive layer is 2.4×10 6 [S/m] to 3.0×10 7 [S/m]. [3]: The electromagnetic shielding sheet according to [1] or [2], wherein the surface resistivity of the conductive layer is 4.0×10 -3 [Ω/□] to 2.0×10 -1 [Ω/□]. [4]: The electromagnetic shielding sheet according to any one of [1] to [3], wherein the area of the metal filler in a cross-section after the electromagnetic shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes, when the cross-sectional area of the conductive layer is 100, is 23 to 95. [5]: The electromagnetic shielding sheet as described in any one of [1] to [4], wherein the thickness of the conductive layer in the cross section after the electromagnetic shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes is 1 μm to 12 μm. [6]: The electromagnetic shielding sheet as described in any one of [1] to [5], wherein the metal filler includes a flaky metal filler, and the average aspect ratio of the flaky metal filler in the cross section of the conductive layer after the electromagnetic shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes is 10 to 70. [7]: An electromagnetic shielding sheet as described in any one of [1] to [6], wherein the metal filler comprises silver-coated copper powder, and in the cross-section of the conductive layer after the electromagnetic shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes, the mass ratio of the silver element when the total mass of copper and silver elements is set to 100% obtained by energy dispersive X-ray analysis is greater than 3% and less than 25%. [8]: A printed circuit board having an electromagnetic shielding sheet, comprising the electromagnetic shielding sheet as described in any one of [1] to [7]. [9]: An electronic device comprising the printed circuit board having the electromagnetic shielding sheet as described in [8]. [Effect of the invention]
藉由本發明,可提供一種抑制衝壓加工時的電磁波屏蔽片內的剝離、且傳輸特性、屏蔽性及脫氣性優異的電磁波屏蔽片、具有電磁波屏蔽片的印刷電路板、以及電子設備。According to the present invention, it is possible to provide an electromagnetic shielding sheet which suppresses peeling in the electromagnetic shielding sheet during punching and has excellent transmission characteristics, shielding properties and degassing properties, a printed circuit board having the electromagnetic shielding sheet, and an electronic device.
<電磁波屏蔽片> 本發明的電磁波屏蔽片(以下,也稱為本片)依次具有保護層、導電層以及接著劑層。電磁波屏蔽片藉由加熱壓制而經由接著劑層貼附在被黏接體,由此形成電磁波屏蔽層,並對所貼附的面的電磁波進行遮蔽反射。 所述電磁波屏蔽片的特徵在於:電磁波屏蔽片的保護層與接著劑層之間的剝離角度180°、剝離速度:300 mm/min下的剝離試驗的剝離力(以下,有時稱為剝離力)為50[gf/25 mm]~2500[gf/25 mm]。剝離力優選為100[gf/25 mm]~2500[gf/25 mm],更優選為180[gf/25 mm]~2500[gf/25 mm]。 <Electromagnetic wave shielding sheet> The electromagnetic wave shielding sheet of the present invention (hereinafter, also referred to as the sheet) has a protective layer, a conductive layer and an adhesive layer in sequence. The electromagnetic wave shielding sheet is attached to the adherend through the adhesive layer by heat pressing, thereby forming an electromagnetic wave shielding layer, and shielding and reflecting electromagnetic waves on the attached surface. The electromagnetic wave shielding sheet is characterized in that the peeling angle between the protective layer and the adhesive layer of the electromagnetic wave shielding sheet is 180°, and the peeling force (hereinafter, sometimes referred to as the peeling force) in the peeling test at a peeling speed of 300 mm/min is 50 [gf/25 mm] to 2500 [gf/25 mm]. The peeling force is preferably 100 [gf/25 mm] to 2500 [gf/25 mm], more preferably 180 [gf/25 mm] to 2500 [gf/25 mm].
另外,本發明的電磁波屏蔽片的特徵在於:內聚破壞率為10%以上。所謂內聚破壞率,是指在測定所述剝離力的剝離試驗中,導電層的內聚破壞部分的面積占剝離面的整體面積的比率。內聚破壞率優選為10%以上,更優選為40%以上,進而優選為70%以上。In addition, the electromagnetic wave shielding sheet of the present invention is characterized in that the cohesive failure rate is 10% or more. The so-called cohesive failure rate refers to the ratio of the area of the cohesive failure portion of the conductive layer to the total area of the peeling surface in the peeling test for measuring the peeling force. The cohesive failure rate is preferably 10% or more, more preferably 40% or more, and further preferably 70% or more.
藉由將剝離力與內聚破壞率設為上述範圍,保護層/導電層及導電層/接著劑層各自的介面進行強力接著,且導電層的內聚力也可維持高的狀態,因此可使載體衝壓適應性成為優選的水準。By setting the peeling force and the cohesive failure rate to the above ranges, the interfaces of the protective layer/conductive layer and the conductive layer/adhesive layer are strongly bonded, and the cohesive force of the conductive layer can also be maintained at a high state, thereby achieving an optimal level of carrier impact adaptability.
作為使剝離力成為所需的範圍的方法,例如可列舉適宜地選擇導電層、保護層、接著劑層中所含的樹脂的種類、或者對導電層中所含的金屬填料的量進行調整的方法。詳細情況將在之後敘述。As a method for making the peeling force fall within a desired range, for example, there can be cited a method of appropriately selecting the types of resins contained in the conductive layer, protective layer, and adhesive layer, or adjusting the amount of metal filler contained in the conductive layer. The details will be described later.
作為提高內聚破壞率的方法,對導電層的黏合劑的種類及金屬填料的形狀、含量進行調整。可列舉提高保護層及接著劑層的剝離力的方法。各方法的詳細情況將在之後敘述。As a method to increase the cohesive failure rate, the type of adhesive of the conductive layer and the shape and content of the metal filler are adjusted. There are also methods to increase the peeling force of the protective layer and adhesive layer. The details of each method will be described later.
<導電層> 接下來,對本發明中使用的導電層進行說明。本發明中使用的導電層包含金屬填料以及黏合劑,黏合劑優選為至少包含樹脂。藉由在導電層中含有金屬填料與樹脂,可使脫氣性良好。 <Conductive layer> Next, the conductive layer used in the present invention is described. The conductive layer used in the present invention contains a metal filler and an adhesive, and the adhesive preferably contains at least a resin. By including a metal filler and a resin in the conductive layer, the degassing property can be improved.
作為樹脂的優選例,可例示熱塑性樹脂或硬化性樹脂。硬化性樹脂優選為熱硬化性樹脂或光硬化性樹脂,更優選為熱硬化性樹脂。熱塑性樹脂是指藉由加熱到玻璃化轉變溫度或熔點以上而變軟的樹脂,熱硬化性樹脂是指當加熱時進行交聯而形成高分子的網眼結構,進行硬化而無法恢復原狀的樹脂。有熱硬化性樹脂單獨硬化的類型、及並用熱硬化性樹脂與硬化劑進行硬化的類型。Preferred examples of resins include thermoplastic resins and hardening resins. The hardening resin is preferably a thermosetting resin or a photocurable resin, and more preferably a thermosetting resin. A thermoplastic resin is a resin that becomes soft when heated to a glass transition temperature or a melting point, and a thermosetting resin is a resin that forms a macromolecular mesh structure by crosslinking when heated, and hardens and cannot be restored to its original state. There are types in which a thermosetting resin is hardened alone, and types in which a thermosetting resin and a hardener are used together.
在黏合劑的樹脂中使用熱塑性樹脂的情況下,所包含的熱塑性樹脂以固體狀態存在,與柔性印刷電路(flexible printed circuit,FPC)等被黏接體熱壓時熱塑性樹脂發生熔融,在冷卻後再次固體化,由此可獲得所需的接著強度。另外,在黏合劑的樹脂中使用熱硬化性樹脂的情況下,所包含的熱硬化性樹脂與硬化劑以未硬化或半硬化狀態存在(B階段(stage)),藉由與FPC等被黏接體熱壓等進行硬化(C階段),由此可獲得所需的接著強度。 它們中,作為黏合劑成分,優選為使用熱硬化性樹脂與硬化劑,更優選為在使用了熱硬化性樹脂與硬化劑後使它們半硬化的狀態。半硬化的方法並無特別限定,可列舉:以硬化劑不完全反應的程度施加熱的方法、使用反應溫度不同的多個硬化劑的方法、使用反應時間不同的多個硬化劑的方法。其中,優選為使用反應溫度不同的多個硬化劑的方法。即,優選為除了包含在達到C階段時推進硬化反應的第一硬化劑之外,還包含在達到B階段時推進硬化反應的第二硬化劑。由此,金屬填料彼此的結合變得牢固,剝離力提高,載體衝壓適應性變好。 When a thermoplastic resin is used as the resin of the adhesive, the contained thermoplastic resin exists in a solid state. When hot-pressing with an adherend such as a flexible printed circuit (FPC), the thermoplastic resin melts and solidifies again after cooling, thereby obtaining the required bonding strength. In addition, when a thermosetting resin is used as the resin of the adhesive, the contained thermosetting resin and the curing agent exist in an uncured or semi-cured state (B stage), and harden by hot-pressing with an adherend such as an FPC (C stage), thereby obtaining the required bonding strength. Among them, as adhesive components, it is preferred to use a thermosetting resin and a hardener, and it is more preferred to semi-harden them after using the thermosetting resin and the hardener. The semi-hardening method is not particularly limited, and examples include: a method of applying heat to the extent that the hardener does not react completely, a method of using multiple hardeners with different reaction temperatures, and a method of using multiple hardeners with different reaction times. Among them, the method of using multiple hardeners with different reaction temperatures is preferred. That is, it is preferred to include a second hardener that promotes the hardening reaction when reaching the B stage in addition to a first hardener that promotes the hardening reaction when reaching the C stage. As a result, the bonding between the metal fillers becomes stronger, the peeling force is improved, and the carrier impact pressure adaptability becomes better.
作為熱塑性樹脂,可列舉:聚烯烴系樹脂、乙烯基系樹脂、苯乙烯-丙烯酸系樹脂、二烯系樹脂、萜烯樹脂、石油樹脂、纖維素系樹脂、聚醯胺樹脂、聚氨基甲酸酯樹脂、聚酯樹脂、聚碳酸酯樹脂、聚醯亞胺系樹脂、液晶聚合物、氟樹脂等。Examples of the thermoplastic resin include polyolefin resins, vinyl resins, styrene-acrylic resins, diene resins, terpene resins, petroleum resins, cellulose resins, polyamide resins, polyurethane resins, polyester resins, polycarbonate resins, polyimide resins, liquid crystal polymers, and fluororesins.
熱硬化性樹脂只要是在一分子中具有一個以上的可用於藉由加熱進行的交聯反應的官能基、例如羥基、酚性羥基、甲氧基甲基、羧基、氨基、環氧基、氧雜環丁基、噁唑啉基、噁嗪基、氮丙啶基、硫醇基、異氰酸酯基、嵌段化異氰酸酯基、嵌段化羧基、矽醇基等的樹脂即可,優選為包含羧基或酚性羥基。The thermosetting resin may be any resin having one or more functional groups that can be used for cross-linking reaction by heating, such as hydroxyl group, phenolic hydroxyl group, methoxymethyl group, carboxyl group, amino group, epoxy group, oxacyclobutyl group, oxazoline group, oxazine group, aziridine group, thiol group, isocyanate group, blocked isocyanate group, blocked carboxyl group, silanol group, etc. in one molecule, and preferably contains carboxyl group or phenolic hydroxyl group.
熱硬化性樹脂的酸值及酚性羥基值的合計優選為3 mgKOH/g~100 mgKOH/g,更優選為3 mgKOH/g~70 mgKOH/g,進而優選為5 mgKOH/g~40 mgKOH/g。藉由將熱硬化性樹脂的酸值及酚性羥基值的合計設為此範圍,金屬填料彼此的結合變得牢固,剝離力提高,載體衝壓適應性變好。The total of the acid value and the phenolic hydroxyl value of the thermosetting resin is preferably 3 mgKOH/g to 100 mgKOH/g, more preferably 3 mgKOH/g to 70 mgKOH/g, and further preferably 5 mgKOH/g to 40 mgKOH/g. By setting the total of the acid value and the phenolic hydroxyl value of the thermosetting resin to this range, the metal fillers are firmly bonded to each other, the peeling force is increased, and the carrier impact pressure adaptability is improved.
作為熱硬化性樹脂的優選例,可列舉:丙烯酸樹脂、馬來酸樹脂、聚丁二烯系樹脂、聚酯樹脂、聚氨基甲酸酯樹脂、環氧樹脂、氧雜環丁烷樹脂、苯氧基樹脂、聚醯亞胺樹脂、聚醯胺樹脂、酚系樹脂、醇酸樹脂、氨基樹脂、聚乳酸樹脂、噁唑啉樹脂、苯並噁嗪樹脂、矽酮樹脂、氟樹脂等。它們中,就金屬填料的分散穩定性與接著強度的方面而言,優選為聚氨基甲酸酯樹脂、聚氨基甲酸酯脲樹脂、加成型酯樹脂、環氧化合物、苯氧基樹脂、聚醯亞胺樹脂、聚醯胺樹脂、呱嗪聚醯胺樹脂、聚醯胺醯亞胺樹脂。熱硬化性樹脂可單獨使用或並用兩種以上。Preferred examples of the thermosetting resin include acrylic resins, maleic acid resins, polybutadiene resins, polyester resins, polyurethane resins, epoxy resins, cyclohexane resins, phenoxy resins, polyimide resins, polyamide resins, phenolic resins, alkyd resins, amino resins, polylactic acid resins, oxazoline resins, benzoxazine resins, silicone resins, and fluororesins. Among them, polyurethane resins, polyurethane urea resins, addition ester resins, epoxy compounds, phenoxy resins, polyimide resins, polyamide resins, piperazine polyamide resins, and polyamide imide resins are preferred in terms of dispersion stability of metal fillers and bonding strength. Thermosetting resins may be used alone or in combination of two or more.
熱硬化性樹脂的重量平均分子量優選為20,000~300,000,更優選為50,000~300,000,進而優選為100,000~300,000。藉由將熱硬化性樹脂的重量平均分子量設為此範圍,金屬填料彼此的結合變得牢固,剝離力提高,因此載體衝壓適應性變好。The weight average molecular weight of the thermosetting resin is preferably 20,000 to 300,000, more preferably 50,000 to 300,000, and further preferably 100,000 to 300,000. By setting the weight average molecular weight of the thermosetting resin to this range, the metal fillers are firmly bonded to each other, the peeling force is increased, and thus the carrier pressure adaptability is improved.
另外,本發明中的熱硬化性樹脂優選為除了包含所述樹脂之外,根據需要還包含與所述官能基反應而形成化學交聯的樹脂或低分子化合物等所謂“硬化劑”。In addition, the thermosetting resin in the present invention preferably contains, in addition to the above resin, a so-called "hardener" such as a resin or a low molecular compound that reacts with the above functional group to form a chemical crosslink, if necessary.
硬化劑只要為具有兩個以上能夠與熱硬化性樹脂的官能基反應的官能基的物質即可,並無特別限定。作為硬化劑的一例,可例示:環氧化合物、含酸酐基的化合物、異氰酸酯化合物、氮丙啶化合物、胺化合物、酚化合物、有機金屬化合物(金屬螯合化合物)、多元醇化合物、三聚氰胺化合物、矽烷系化合物、碳二醯亞胺系化合物、苯並噁嗪化合物、馬來醯亞胺化合物、含β-羥基烷基醯胺基的化合物。硬化劑可單獨使用或並用兩種以上。此外,硬化劑可為低分子化合物也可為高分子化合物,但為與所述熱硬化性樹脂不同的化合物。The hardener is not particularly limited as long as it has two or more functional groups that can react with the functional groups of the thermosetting resin. Examples of hardeners include epoxy compounds, compounds containing anhydride groups, isocyanate compounds, aziridine compounds, amine compounds, phenol compounds, organic metal compounds (metal chelate compounds), polyol compounds, melamine compounds, silane compounds, carbodiimide compounds, benzoxazine compounds, maleimide compounds, and compounds containing β-hydroxyalkylamide groups. Hardeners can be used alone or in combination of two or more. In addition, the hardener can be a low molecular weight compound or a high molecular weight compound, but it is a compound different from the thermosetting resin.
光硬化性樹脂只要是在一分子中具有一個以上的藉由光而引起交聯反應的不飽和鍵的樹脂即可,例如可列舉:丙烯酸樹脂、馬來酸樹脂、聚丁二烯系樹脂、聚酯樹脂、聚氨基甲酸酯樹脂、環氧樹脂、氧雜環丁烷樹脂、苯氧基樹脂、聚醯亞胺樹脂、聚醯胺樹脂、酚系樹脂、醇酸樹脂、氨基樹脂、聚乳酸樹脂、噁唑啉樹脂、苯並噁嗪樹脂、矽酮樹脂、氟樹脂等。The photocurable resin is any resin having one or more unsaturated bonds in one molecule that undergo crosslinking reaction by light, and examples thereof include acrylic resins, maleic acid resins, polybutadiene resins, polyester resins, polyurethane resins, epoxy resins, cyclohexane resins, phenoxy resins, polyimide resins, polyamide resins, phenolic resins, alkyd resins, amino resins, polylactic acid resins, oxazoline resins, benzoxazine resins, silicone resins, and fluororesins.
導電層的表面電阻率優選為4.0×10 -3[Ω/□]~2.0×10 -1[Ω/□],更優選為4.0×10 -3[Ω/□]~1.0×10 -1[Ω/□]。藉由將導電層的表面電阻率設為此範圍,可使高頻屏蔽性良好。 The surface resistivity of the conductive layer is preferably 4.0×10 -3 [Ω/□] to 2.0×10 -1 [Ω/□], and more preferably 4.0×10 -3 [Ω/□] to 1.0×10 -1 [Ω/□]. By setting the surface resistivity of the conductive layer to be within this range, high-frequency shielding properties can be improved.
本發明中的導電層的表面電阻率是依據日本工業標準(Japanese Industrial Standards,JIS)K7194-1994並使用例如三菱化學製造的“洛雷斯特(Loresta)GP”的四探針探頭而測定的電阻值乘以規定的常數所得。 具體而言,從本發明電磁波屏蔽片(80 mm×50 mm的長方形的試樣片)的接著劑層的中央部,插入以5 mm為間隔呈直線狀設置的四點導電性凸塊,直至到達導電層。所述四點導電性凸塊的位置與所述試樣片的長邊平行。在所述四點導電性凸塊的外側的兩點間流動電流,並測定內側的兩點間的電壓,求出電阻值=電壓/電流。繼而,將測定值乘以常數“4.239”而得的值作為“表面電阻率”。 The surface resistivity of the conductive layer in the present invention is obtained by multiplying the resistance value measured in accordance with Japanese Industrial Standards (JIS) K7194-1994 using a four-probe probe such as "Loresta GP" manufactured by Mitsubishi Chemical by a prescribed constant. Specifically, four conductive bumps arranged in a straight line at intervals of 5 mm are inserted from the center of the adhesive layer of the electromagnetic wave shielding sheet of the present invention (a rectangular sample sheet of 80 mm×50 mm) until the conductive layer is reached. The positions of the four conductive bumps are parallel to the long sides of the sample sheet. A current flows between two points on the outer side of the four conductive bumps, and the voltage between two points on the inner side is measured to obtain the resistance value = voltage/current. Then, multiply the measured value by the constant "4.239" to obtain the value of "surface resistivity".
導電層的導電率優選為2.4×10 6[S/m]~3.0×10 7[S/m],更優選為5.0×10 6[S/m]~3.0×10 7[S/m]。藉由將導電層的導電率設為所述範圍,可抑制高速傳輸時的傳輸損耗。 The conductivity of the conductive layer is preferably 2.4×10 6 [S/m] to 3.0×10 7 [S/m], and more preferably 5.0×10 6 [S/m] to 3.0×10 7 [S/m]. By setting the conductivity of the conductive layer to be within the above range, transmission loss during high-speed transmission can be suppressed.
本發明中的導電層的導電率可根據導電層的厚度t(μm)以及所述表面電阻率而求出。詳細情況記載在實施例中。The conductivity of the conductive layer in the present invention can be obtained from the thickness t (μm) of the conductive layer and the surface resistivity. The details are described in the embodiments.
作為使導電率成為所需的範圍的方法,例如可列舉以後述優選的量含有後述優選的金屬填料而形成良好的導電路徑的方法。作為使表面電阻率成為所需的範圍的方法,除了可列舉與導電率相同的方法之外,還可列舉使導電層的厚度變厚的方法。As a method for making the conductivity within the desired range, for example, a method of forming a good conductive path by containing the preferred metal filler described below in the preferred amount described below. As a method for making the surface resistivity within the desired range, in addition to the same method as for the conductivity, a method of increasing the thickness of the conductive layer can also be cited.
作為金屬填料,可列舉:金、銀、銅、鎳等的金屬粉;焊料等的合金粉;進行了銀塗布的銅粉(銀塗層銅粉);進行了金屬鍍敷的玻璃纖維或碳填料等。其中,優選為導電率高的銀粉、銀塗層銅粉。導電層中的銅或銀的元素量可藉由觀察電磁波屏蔽片的切斷面來進行評價。在切斷面中,藉由能量分散型X射線分析而得的將銅及銀元素的總質量設為100%時的銀元素的質量的比例優選為3%~25%,更優選為6%~15%。藉由設為所述範圍,可在使高速傳輸時的傳輸損耗的抑制效果與高頻屏蔽性良好的同時提高比銀更廉價的銅的比例,由此可削減成本。作為將所述銀元素量控制在所需的範圍的方法,例如在製作銀塗層銅粉時對銀塗層的量進行控制。As metal fillers, there can be listed: metal powders of gold, silver, copper, nickel, etc.; alloy powders of solder, etc.; copper powder coated with silver (silver-coated copper powder); glass fiber or carbon filler that has been metal-plated, etc. Among them, silver powder and silver-coated copper powder with high conductivity are preferred. The amount of copper or silver in the conductive layer can be evaluated by observing the cross-section of the electromagnetic wave shielding sheet. In the cross-section, the mass ratio of the silver element when the total mass of copper and silver elements is set to 100% obtained by energy dispersive X-ray analysis is preferably 3% to 25%, and more preferably 6% to 15%. By setting the above range, the transmission loss suppression effect during high-speed transmission and high-frequency shielding properties can be improved while increasing the proportion of copper, which is cheaper than silver, thereby reducing costs. As a method for controlling the amount of silver element within the required range, for example, the amount of silver coating is controlled when preparing silver-coated copper powder.
關於金屬填料的形狀,只要在導電層中可獲得所需的導電性即可,形狀並無限定,也可將不同形狀的兩種以上金屬填料混合。例如可列舉球狀、薄片狀(也包含後述的葉狀粒子)、枝晶狀、板狀、針狀、棒狀、葡萄狀,就使導電性良好的觀點、以及提高內聚破壞率的觀點而言,優選為薄片狀。設為在薄片狀粒子中還包含在外緣部具有多個切口的葉狀粒子(例如,使枝晶狀粒子扁平化後的粒子)。The shape of the metal filler is not limited as long as the desired conductivity can be obtained in the conductive layer, and two or more metal fillers of different shapes may be mixed. For example, spherical, flaky (including leaf-shaped particles described later), dendrite, plate, needle, rod, and grape shapes may be listed. From the perspective of improving conductivity and increasing the cohesive failure rate, flaky particles are preferred. The flaky particles may also include leaf-shaped particles having a plurality of cuts on the outer edge (for example, particles obtained by flattening dendrite particles).
對電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的、導電層的切斷面中的薄片狀金屬填料的平均縱橫比([長徑(μm)]/[厚度(μm)])優選為處於10~70的範圍,更優選為處於15~60的範圍。藉由將薄片狀粒子的縱橫比設為所述範圍,可以高的維度兼顧高速傳輸時的傳輸損耗的抑制效果與高頻屏蔽性、及載體衝壓適應性。The average aspect ratio ([length (μm)]/[thickness (μm)]) of the flaky metal filler in the cross section of the conductive layer after the electromagnetic shielding sheet is heat-pressed at 170°C and 2 MPa for 30 minutes is preferably in the range of 10 to 70, more preferably in the range of 15 to 60. By setting the aspect ratio of the flaky particles in the above range, the transmission loss suppression effect during high-speed transmission, high-frequency shielding properties, and carrier pressure adaptability can be achieved with high dimensionality.
金屬填料的平均粒徑D50優選為1 μm~100 μm,更優選為3 μm~50 μm,進而優選為5 μm~20 μm。藉由設為所述範圍,可在使高速傳輸時的傳輸損耗的抑制效果與高頻屏蔽性良好的同時,使具有電磁波屏蔽片的印刷電路板的彎曲性良好。The average particle size D50 of the metal filler is preferably 1 μm to 100 μm, more preferably 3 μm to 50 μm, and further preferably 5 μm to 20 μm. By setting it within the above range, the transmission loss suppression effect during high-speed transmission and the high-frequency shielding property can be improved, and the bendability of the printed circuit board having the electromagnetic wave shielding sheet can be improved.
金屬填料的含量在導電層的固體成分100質量%中優選為75質量%以上,更優選為80質量%以上,進而優選為90質量%以上。另外,優選為95質量%以下。藉由將金屬填料的含量設為75質量%以上,內聚破壞率提高,藉由將金屬填料的含量設為95質量%以下,剝離力提高。The content of the metal filler is preferably 75% by mass or more, more preferably 80% by mass or more, and further preferably 90% by mass or more, in the solid content of 100% by mass of the conductive layer. In addition, it is preferably 95% by mass or less. By setting the content of the metal filler to 75% by mass or more, the cohesive failure rate is improved, and by setting the content of the metal filler to 95% by mass or less, the peeling force is improved.
對電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的、導電層的切斷面中的將導電層的面積設為100%時的金屬填料所占的面積優選為23%~95%,更優選為30%~95%,進而優選為45%~95%。藉由設為這些範圍,可使高速傳輸時的傳輸損耗的抑制效果與高頻屏蔽性良好。The area of the metal filler in the cross section of the conductive layer after the electromagnetic wave shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes is preferably 23% to 95%, more preferably 30% to 95%, and further preferably 45% to 95%, when the area of the conductive layer is 100%. By setting it within these ranges, the transmission loss suppression effect during high-speed transmission and high-frequency shielding properties can be improved.
對電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的、切斷面中的導電層的厚度優選為1 μm~12 μm,更優選為1 μm~8 μm。藉由將所述厚度設為1 μm以上,可獲得屏蔽性高的導電層。另外,藉由將厚度設為12 μm以下,具有電磁波屏蔽片的印刷電路板的彎曲性變得良好。 <保護層> 保護層優選為至少包含樹脂。樹脂可使用與所述導電層相同的樹脂,優選為並用熱硬化性樹脂與硬化劑。另外,保護層也可設為兩層以上的層疊結構。 藉由將保護層中的樹脂及硬化劑的合計的比例設為50%以上,保護層的剝離力、及內聚破壞率提高,載體衝壓適應性提高。 The thickness of the conductive layer in the cross section after the electromagnetic wave shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes is preferably 1 μm to 12 μm, and more preferably 1 μm to 8 μm. By setting the thickness to 1 μm or more, a conductive layer with high shielding properties can be obtained. In addition, by setting the thickness to 12 μm or less, the bendability of the printed circuit board with the electromagnetic wave shielding sheet becomes good. <Protective layer> The protective layer preferably contains at least a resin. The resin can use the same resin as the conductive layer, and preferably uses a thermosetting resin and a hardener. In addition, the protective layer can also be a laminated structure of two or more layers. By setting the combined ratio of the resin and the hardener in the protective layer to more than 50%, the peeling force and cohesive failure rate of the protective layer are improved, and the impact pressure adaptability of the carrier is improved.
對電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的、切斷面中的保護層的厚度能夠根據用途適宜地設計,但優選為0.5 μm~25 μm的範圍,更優選為2 μm~10 μm。藉由將保護層的厚度設為0.5 μm以上,保護性變得充分。另外,藉由將保護層的厚度設為25 μm以下,具有電磁波屏蔽片的印刷電路板的彎曲性變得良好。The thickness of the protective layer in the cross section after the electromagnetic wave shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes can be appropriately designed according to the application, but is preferably in the range of 0.5 μm to 25 μm, and more preferably 2 μm to 10 μm. By setting the thickness of the protective layer to 0.5 μm or more, the protective property becomes sufficient. In addition, by setting the thickness of the protective layer to 25 μm or less, the bendability of the printed circuit board having the electromagnetic wave shielding sheet becomes good.
在保護層中,根據需要也可添加矽烷偶合劑、抗氧化劑、顏料、染料、黏著賦予樹脂、塑化劑、紫外線吸收劑、消泡劑、流平調整劑、填充劑、阻燃劑等。In the protective layer, silane coupling agents, antioxidants, pigments, dyes, adhesive imparting resins, plasticizers, ultraviolet absorbers, defoamers, leveling agents, fillers, flame retardants, etc. can also be added as needed.
<接著劑層> 接著劑層位於電磁波屏蔽片的其中一個面,承擔與後述印刷電路板的黏貼。接著劑層優選為至少包含樹脂。樹脂可使用與所述導電層相同的樹脂,優選為並用熱硬化性樹脂與硬化劑。就傳輸損耗的觀點而言,樹脂或硬化劑優選為低介電常數、低介電損耗角正切的材料,就特性阻抗的觀點而言,優選為低介電常數的材料,例如優選為包含大量的極化率小的氟原子或烴的結構、將偶極子予以固定的液晶取向或晶體取向材料。 接著劑層也與保護層同樣地將接著劑層中的樹脂及硬化劑的合計的比例設為50%以上,由此,剝離力、及內聚破壞率提高,載體衝壓適應性提高。 <Adhesive layer> The adhesive layer is located on one side of the electromagnetic wave shielding sheet and is responsible for bonding with the printed circuit board described later. The adhesive layer preferably contains at least a resin. The resin can be the same resin as the conductive layer, and preferably a thermosetting resin and a hardener are used together. From the perspective of transmission loss, the resin or hardener is preferably a material with a low dielectric constant and a low dielectric loss tangent. From the perspective of characteristic impedance, a material with a low dielectric constant is preferably used, such as a structure containing a large number of fluorine atoms or hydrocarbons with a small polarizability, and a liquid crystal orientation or crystal orientation material that fixes the dipole. The adhesive layer also has a combined ratio of resin and hardener of 50% or more, similar to the protective layer. This improves the peeling force and cohesive failure rate, and improves the carrier impact pressure adaptability.
對電磁波屏蔽片以170℃、2 MPa、30分鐘的條件進行加熱壓接後的、切斷面中的接著劑層的厚度能夠根據用途適宜地設計,但優選為0.5 μm~25 μm的範圍,更優選為2 μm~10 μm。藉由將接著劑層的厚度設為0.5 μm以上,可增大對印刷電路板的接著力。另外,藉由將接著劑層的厚度設為25 μm以下,具有電磁波屏蔽片的印刷電路板的彎曲性變得良好。The thickness of the adhesive layer in the cross section after the electromagnetic wave shielding sheet is heat-pressed at 170°C, 2 MPa, and 30 minutes can be appropriately designed according to the application, but is preferably in the range of 0.5 μm to 25 μm, and more preferably 2 μm to 10 μm. By setting the thickness of the adhesive layer to 0.5 μm or more, the bonding force to the printed circuit board can be increased. In addition, by setting the thickness of the adhesive layer to 25 μm or less, the bendability of the printed circuit board with the electromagnetic wave shielding sheet becomes good.
接著劑層可為絕緣性也可為導電性。在設為導電性的情況下,只要使形成接著劑層的接著劑組合物中進一步含有導電層中所例示的金屬填料即可。另外,也可使用聚苯胺、聚乙炔等導電性聚合物的微粒子。在將接著劑層設為導電性的情況下,可為各向同性導電性,也可為各向異性導電性。此外,所謂各向同性導電性是指接著劑層在其厚度方向及面方向中的任一方向均具有導電性,所謂各向異性導電性是指接著劑層實質上僅在其厚度方向具有導電性。就使高頻範圍的傳輸特性良好的觀點及成本降低的觀點而言,優選為設為各向異性導電性。The adhesive layer may be insulating or conductive. When it is conductive, the adhesive composition forming the adhesive layer may further contain the metal filler exemplified in the conductive layer. In addition, microparticles of conductive polymers such as polyaniline and polyacetylene may also be used. When the adhesive layer is conductive, it may be isotropically conductive or anisotropically conductive. In addition, the so-called isotropic conductivity means that the adhesive layer has conductivity in any direction of its thickness direction and surface direction, and the so-called anisotropic conductivity means that the adhesive layer has conductivity substantially only in its thickness direction. From the perspective of improving the transmission characteristics in the high-frequency range and reducing costs, it is preferred to use anisotropic conductivity.
各向異性導電性接著劑層含有樹脂與金屬填料,可藉由將金屬填料的含量與大小設為後述的範圍內來實現。金屬填料的含量可適宜地設計,相對於接著劑層100質量%而優選為10質量%~45質量%,更優選為15質量%~40質量%,進而優選為20質量%~30質量%。在以要形成的接著劑層的厚度為基準(100)的情況下,金屬填料的平均粒徑D50優選為100~300左右。藉由含有10質量%~45質量%的所述平均粒徑D50的導電性填料,可形成各向異性而非各向同性的導電性接著劑層。 所使用的金屬填料的形狀特別優選為容易獲得各向異性導電性的球狀、樹枝狀。 The anisotropic conductive adhesive layer contains a resin and a metal filler, which can be achieved by setting the content and size of the metal filler within the range described below. The content of the metal filler can be appropriately designed, preferably 10% to 45% by mass relative to 100% by mass of the adhesive layer, more preferably 15% to 40% by mass, and further preferably 20% to 30% by mass. When the thickness of the adhesive layer to be formed is taken as the reference (100), the average particle size D50 of the metal filler is preferably about 100 to 300. By containing 10% to 45% by mass of the conductive filler having the average particle size D50, an anisotropic conductive adhesive layer can be formed instead of an isotropic conductive adhesive layer. The shape of the metal filler used is preferably spherical or branch-like, which can easily obtain anisotropic conductivity.
在接著劑層中,根據需要也可添加矽烷偶合劑、防銹劑、還原劑、抗氧化劑、顏料、染料、黏著賦予樹脂、塑化劑、紫外線吸收劑、消泡劑、流平調整劑、填充劑、阻燃劑等。In the adhesive layer, silane coupling agents, rust inhibitors, reducing agents, antioxidants, pigments, dyes, adhesive imparting resins, plasticizers, ultraviolet absorbers, defoaming agents, leveling agents, fillers, flame retardants, etc. can also be added as needed.
<電磁波屏蔽片的製造方法> 以下,對本片的製造方法的一例進行說明。但是,本發明的製造方法並不限定於以下的製造方法。本片具有:形成導電層的步驟、形成保護層的步驟、以及形成接著劑層的步驟。 <Method for manufacturing electromagnetic wave shielding sheet> Below, an example of the method for manufacturing the present sheet is described. However, the manufacturing method of the present invention is not limited to the following manufacturing method. The present sheet has: a step of forming a conductive layer, a step of forming a protective layer, and a step of forming an adhesive layer.
<導電層的形成步驟> 製備用於導電層的形成中的含金屬填料的組合物。具體而言,可藉由將黏合劑、金屬填料、根據需要的溶劑混合並攪拌來獲得含金屬填料的組合物。攪拌可使用分散機(dispermat)、均質機等公知的攪拌裝置。在製備含金屬填料的組合物後,藉由將含金屬填料的組合物塗敷在剝離性片上並進行乾燥來形成導電層。塗敷方法例如可例示:凹版塗布方式、吻合式塗布方式、模塗方式、唇塗方式、缺角輪塗布方式、刮刀方式、輥塗方式、刀式塗布方式、噴霧塗布方式、棒塗方式、旋塗方式、浸漬塗布方式。乾燥步驟可使用熱風乾燥機、紅外線加熱器等公知的乾燥裝置。另外,也可使用T字模那樣的擠出成形機來形成片狀的導電層。 <Conductive layer formation step> Prepare a composition containing a metal filler for forming a conductive layer. Specifically, the composition containing a metal filler can be obtained by mixing and stirring a binder, a metal filler, and a solvent as required. For stirring, a known stirring device such as a dispermat or a homogenizer can be used. After preparing the composition containing a metal filler, the conductive layer is formed by applying the composition containing a metal filler on a release sheet and drying it. Examples of coating methods include gravure coating, kiss coating, die coating, lip coating, notch wheel coating, scraper coating, roller coating, knife coating, spray coating, rod coating, spin coating, and dip coating. The drying step may use a well-known drying device such as a hot air dryer or an infrared heater. In addition, an extrusion molding machine such as a T-die may be used to form a sheet-shaped conductive layer.
<保護層的形成步驟> 保護層可由包含樹脂的樹脂組合物並藉由與導電層相同的方法來形成。另外,保護層也可使用將聚酯、聚碳酸酯、聚醯亞胺、聚醯胺醯亞胺、聚醯胺、聚苯硫醚、聚醚醚酮等絕緣性樹脂成形而成的膜。 <Protective layer formation step> The protective layer can be formed from a resin composition containing a resin by the same method as the conductive layer. In addition, the protective layer can also use a film formed from an insulating resin such as polyester, polycarbonate, polyimide, polyamide imide, polyamide, polyphenylene sulfide, polyetheretherketone, etc.
<接著劑層的形成步驟> 接著劑層可由包含樹脂以及根據需要的導電性填料的樹脂組合物並藉由與導電層相同的方法來形成。 <Step of forming the adhesive layer> The adhesive layer can be formed by a resin composition including a resin and, if necessary, a conductive filler by the same method as the conductive layer.
本片的層疊順序設為保護層/導電層/接著劑層的順序。關於各層的層疊方法,可利用準備在剝離性片上分別形成了保護層、導電層及接著劑層的材料,將它們按照所述層疊順序層壓而形成。關於層壓,例如可在溫度80℃~130℃左右、壓力0.2 MPa~5.0 MPa左右、層壓速度0.5 m/min~20 m/min左右的條件下進行層壓。藉由設為此範圍,各層間的密接性提高,內聚破壞率提高。另外,剝離力提高,載體衝壓適應性變好。 優選為在保護層及接著劑層的表面層疊有剝離性片的結構。 The lamination sequence of this sheet is set to be the sequence of protective layer/conductive layer/adhesive layer. As for the lamination method of each layer, the protective layer, conductive layer and adhesive layer are prepared on the release sheet, and they are laminated in the above-mentioned lamination sequence. As for lamination, for example, lamination can be performed under the conditions of a temperature of about 80°C to 130°C, a pressure of about 0.2 MPa to 5.0 MPa, and a lamination speed of about 0.5 m/min to 20 m/min. By setting it to this range, the adhesion between the layers is improved, and the cohesive failure rate is improved. In addition, the peeling force is improved and the carrier's impact pressure adaptability is improved. Preferably, a structure in which a peeling sheet is laminated on the surface of the protective layer and the adhesive layer.
<具有電磁波屏蔽片的印刷電路板> 具有電磁波屏蔽片的印刷電路板包括:電磁波屏蔽層,由本發明的電磁波屏蔽片形成;外塗層;以及印刷電路板,包括具有信號配線與接地配線的電路圖案及絕緣性基材。 印刷電路板在絕緣性基材的表面包括具有信號配線與接地配線的電路圖案,且可藉由如下方式製造:在所述印刷電路板上形成對信號配線與接地配線進行絕緣保護、且在接地配線上的至少一部分具有通孔的外塗層,在將電磁波屏蔽片的接著劑層面配置在所述外塗層上之後,對所述電磁波屏蔽片進行熱壓,使接著劑層流入至通孔內部而與接地配線接著。 <Printed circuit board with electromagnetic wave shielding sheet> The printed circuit board with electromagnetic wave shielding sheet includes: an electromagnetic wave shielding layer formed by the electromagnetic wave shielding sheet of the present invention; an outer coating layer; and a printed circuit board including a circuit pattern including signal wiring and ground wiring and an insulating substrate. The printed circuit board includes a circuit pattern including signal wiring and ground wiring on the surface of the insulating substrate, and can be manufactured in the following manner: an outer coating layer is formed on the printed circuit board to insulate and protect the signal wiring and the ground wiring, and a through hole is formed on at least a portion of the ground wiring, and after the adhesive layer surface of the electromagnetic wave shielding sheet is arranged on the outer coating layer, the electromagnetic wave shielding sheet is heat-pressed so that the adhesive layer flows into the through hole and is bonded to the ground wiring.
電磁波屏蔽層為包括接著劑層、導電層、保護層的結構。 外塗層為對印刷電路板的信號配線進行覆蓋以保護其免受外部環境的影響的絕緣材料。外塗層優選為帶熱硬化性接著劑的聚醯亞胺膜、熱硬化型或紫外線硬化型的阻焊劑、或者感光性覆蓋膜,為了進行微細加工,更優選為感光性覆蓋膜。另外,外塗層一般使用聚醯亞胺等具有耐熱性與柔軟性的公知的樹脂。外塗層的厚度通常為10 μm~100 μm左右。 The electromagnetic wave shielding layer is a structure including an adhesive layer, a conductive layer, and a protective layer. The outer coating is an insulating material that covers the signal wiring of the printed circuit board to protect it from the influence of the external environment. The outer coating is preferably a polyimide film with a thermosetting adhesive, a thermosetting or UV-curing solder resist, or a photosensitive cover film. In order to perform fine processing, a photosensitive cover film is more preferably used. In addition, the outer coating generally uses a known resin with heat resistance and flexibility such as polyimide. The thickness of the outer coating is usually about 10 μm to 100 μm.
電路圖案包括接地的接地配線、將電信號發送至電子零件的信號配線。兩者一般藉由對銅箔進行蝕刻處理而形成。電路圖案的厚度通常為1 μm~50 μm左右。The circuit pattern includes ground wiring for grounding and signal wiring for sending electrical signals to electronic components. Both are generally formed by etching copper foil. The thickness of the circuit pattern is usually around 1 μm to 50 μm.
絕緣性基材是電路圖案的支撐體,優選為聚酯、聚碳酸酯、聚醯亞胺、聚苯硫醚、液晶聚合物等能夠彎曲的塑膠,更優選為液晶聚合物及聚醯亞胺。它們中,若考慮傳輸高頻的信號的印刷電路板的用途,則進而優選為相對介電常數及介電損耗角正切低的液晶聚合物。 在印刷電路板為剛性電路板的情況下,絕緣性基材的構成材料優選為玻璃環氧。藉由包括像它們那樣的絕緣性基材,印刷電路板可獲得高的耐熱性。 The insulating substrate is a support for the circuit pattern, and is preferably a bendable plastic such as polyester, polycarbonate, polyimide, polyphenylene sulfide, liquid crystal polymer, and more preferably a liquid crystal polymer and polyimide. Among them, if the use of printed circuit boards for transmitting high-frequency signals is considered, liquid crystal polymers with low relative dielectric constants and dielectric loss tangents are further preferred. In the case where the printed circuit board is a rigid circuit board, the constituent material of the insulating substrate is preferably glass epoxy. By including an insulating substrate such as these, the printed circuit board can obtain high heat resistance.
電磁波屏蔽片與印刷電路板的熱壓一般在溫度150℃~190℃左右、壓力1 MPa~3 MPa左右、時間1分鐘~60分鐘左右的條件下進行。藉由熱壓,接著劑層流動而填埋形成在外塗層的通孔,由此與接地配線之間取得導通。有時也在熱壓後以150℃~190℃進行30分鐘~90分鐘的後固化。The heat pressing of electromagnetic shielding sheets and printed circuit boards is generally performed at a temperature of about 150℃ to 190℃, a pressure of about 1 MPa to 3 MPa, and a time of about 1 minute to 60 minutes. By heat pressing, the agent layer flows and fills the through hole formed in the outer coating, thereby achieving conductivity with the ground wiring. Sometimes, post-curing is performed at 150℃ to 190℃ for 30 minutes to 90 minutes after heat pressing.
所述通孔的開口面積優選為0.8 mm 2以下,且優選為0.008 mm 2以上。藉由設為上述範圍,可縮窄接地配線的區域,從而可實現印刷電路板的小型化。 通孔的形狀並無特別限定,可根據用途使用圓、正方形、長方形、三角形及不定形等中的任一種。 The opening area of the through hole is preferably 0.8 mm2 or less, and preferably 0.008 mm2 or more. By setting it within the above range, the area of the ground wiring can be narrowed, thereby miniaturizing the printed circuit board. The shape of the through hole is not particularly limited, and any of a circle, square, rectangle, triangle, and amorphous shapes can be used according to the application.
就可更有效地抑制電磁波的洩漏的方面而言,優選為電磁波屏蔽層層疊在印刷電路板的兩面。除此之外,本發明的具有電磁波屏蔽片的印刷電路板中的電磁波屏蔽層除了可對電磁波進行遮蔽以外,還可用作接地電路。由此,能夠藉由省略接地電路的一部分且縮小印刷電路板的面積來實現成本降低,進而,可組裝至框體內的狹小區域。In terms of more effectively suppressing the leakage of electromagnetic waves, it is preferred that the electromagnetic wave shielding layers are stacked on both sides of the printed circuit board. In addition, the electromagnetic wave shielding layer in the printed circuit board with the electromagnetic wave shielding sheet of the present invention can not only shield the electromagnetic waves, but also be used as a grounding circuit. Thus, it is possible to reduce costs by omitting part of the grounding circuit and reducing the area of the printed circuit board, and further, it can be assembled in a small area in a frame.
另外,關於信號配線,並無特別限定,能夠使用包括一根信號配線的單端(single end)、包括兩根信號配線的差動電路中的任一電路,但更優選為差動電路。另一方面,當在印刷電路板的電路圖案面積方面存在制約而難以並列地形成接地電路時,也可不在信號電路的旁側設置接地電路,而將電磁波屏蔽層用作接地電路,製成在厚度方向上具有接地的印刷電路板結構。In addition, there is no particular limitation on the signal wiring, and any circuit including a single end circuit including one signal wiring or a differential circuit including two signal wirings can be used, but a differential circuit is more preferred. On the other hand, when there are restrictions on the circuit pattern area of the printed circuit board and it is difficult to form a ground circuit in parallel, the ground circuit may not be provided next to the signal circuit, and the electromagnetic wave shielding layer may be used as the ground circuit to produce a printed circuit board structure having a ground in the thickness direction.
本發明的具有電磁波屏蔽片的印刷電路板優選為配備(搭載)在顯示器、觸控式螢幕等、以及此外的筆記本式PC、行動電話、智慧手機、平板終端等電子設備中。The printed circuit board with the electromagnetic wave shielding sheet of the present invention is preferably equipped (mounted) in electronic devices such as displays, touch screens, etc., as well as notebook PCs, mobile phones, smart phones, tablet terminals, etc.
另外,本發明的電磁波屏蔽片由於屏蔽性能、高速傳輸特性優異,因此優選為應用於需要進行高速傳輸的用途,具體而言,可優選地用於對頻率為1 MHz至20 GHz範圍的信號進行傳輸的電子設備中。 [實施例] In addition, the electromagnetic wave shielding sheet of the present invention is preferably used for applications requiring high-speed transmission due to its excellent shielding performance and high-speed transmission characteristics. Specifically, it can be preferably used in electronic devices that transmit signals in the frequency range of 1 MHz to 20 GHz. [Example]
接下來,示出實施例對本發明進行更詳細說明,但本發明並不受這些實施例限定。在實施例及比較例中,設為“份”及“%”分別是指“質量份”及“質量%”。 另外,樹脂的酸值、酚性羥基值、重量平均分子量(Mw)、及金屬填料的平均粒徑的測定藉由以下方法進行。 Next, the present invention is described in more detail by showing examples, but the present invention is not limited to these examples. In the examples and comparative examples, "parts" and "%" refer to "parts by mass" and "% by mass", respectively. In addition, the acid value, phenolic hydroxyl value, weight average molecular weight (Mw) of the resin, and the average particle size of the metal filler were measured by the following method.
《樹脂的酸值的測定》 酸值是依照JIS K0070進行測定。在共塞三角燒瓶中精密地量取試樣約1 g,加入四氫呋喃/乙醇(容量比:四氫呋喃/乙醇=2/1)混合液100 mL進行溶解。向其中加入酚酞試液作為指示劑,以0.1 N醇性氫氧化鉀溶液進行滴定,將指示劑保持淡紅色30秒鐘的時刻設為終點。根據下式求出酸值(單位:mgKOH/g)。 酸值(mgKOH/g)=(5.611×a×F)/S 其中, S:試樣的採取量(g) a:0.1 N醇性氫氧化鉀溶液的消耗量(mL) F:0.1 N醇性氫氧化鉀溶液的滴定度 《Determination of the acid value of resin》 The acid value is measured in accordance with JIS K0070. Accurately weigh about 1 g of the sample in a stoppered Erlenmeyer flask and add 100 mL of a mixture of tetrahydrofuran/ethanol (volume ratio: tetrahydrofuran/ethanol = 2/1) to dissolve it. Add phenolphthalein test solution as an indicator and titrate with 0.1 N alcoholic potassium hydroxide solution. The end point is when the indicator remains light red for 30 seconds. The acid value (unit: mgKOH/g) is calculated according to the following formula. Acid value (mgKOH/g) = (5.611×a×F)/S Wherein, S: Sample collection amount (g) a: Consumption of 0.1 N alcoholic potassium hydroxide solution (mL) F: Titer of 0.1 N alcoholic potassium hydroxide solution
《樹脂的酚性羥基值的測定》 酚性羥基值是依照JIS K0070進行測定。酚性羥基值是將對含酚性羥基的樹脂1 g中所含的酚性羥基進行乙醯化時與酚性羥基鍵結的乙酸中和所需的氫氧化鉀的量(mg)所表示的值。在要算出含酚性羥基的樹脂的酚性羥基值時,如下述式所示,考慮酸值進行計算。具體而言,在共塞三角燒瓶中精密地量取試樣約1 g,加入四氫呋喃/乙醇(容量比:四氫呋喃/乙醇=2/1)混合液100 mL進行溶解。進而,準確地加入5 mL的乙醯化劑(利用吡啶將乙酸酐25 g溶解並製成容量100 mL而成的溶液),並進行約1小時攪拌。向其中加入酚酞試液作為指示劑並持續30秒。然後,以0.5 N醇性氫氧化鉀溶液進行滴定直至溶液呈淡紅色。根據下式求出酚性羥基值。 酚性羥基值(mgKOH/g)=[{(b-a)×F×28.05}/S]+D 其中, S:試樣的採取量(g) a:0.5 N醇性氫氧化鉀溶液的消耗量(mL) b:空白實驗的0.5 N醇性氫氧化鉀溶液的消耗量(mL) F:0.5 N醇性氫氧化鉀溶液的滴定度 D:酸值(mgKOH/g) 《Determination of phenolic hydroxyl value of resin》 The phenolic hydroxyl value is measured in accordance with JIS K0070. The phenolic hydroxyl value is a value expressed as the amount of potassium hydroxide (mg) required to neutralize the acetic acid bonded to the phenolic hydroxyl groups when acetylation is performed on the phenolic hydroxyl groups contained in 1 g of the phenolic hydroxyl-containing resin. When calculating the phenolic hydroxyl value of the phenolic hydroxyl-containing resin, the acid value is taken into consideration as shown in the following formula. Specifically, about 1 g of the sample is accurately weighed in a co-stoppered Erlenmeyer flask, and 100 mL of a mixed solution of tetrahydrofuran/ethanol (volume ratio: tetrahydrofuran/ethanol = 2/1) is added to dissolve it. Then, accurately add 5 mL of acetylation agent (a solution of 100 mL made by dissolving 25 g of acetic anhydride in pyridine) and stir for about 1 hour. Add phenolphthalein test solution as an indicator and continue stirring for 30 seconds. Then, titrate with 0.5 N alcoholic potassium hydroxide solution until the solution turns light red. Calculate the phenolic hydroxyl value according to the following formula. Phenolic hydroxyl value (mgKOH/g) = [{(b-a)×F×28.05}/S]+D Where, S: Sample collection amount (g) a: Consumption of 0.5 N alcoholic potassium hydroxide solution (mL) b: Consumption of 0.5 N alcoholic potassium hydroxide solution in blank experiment (mL) F: Titer of 0.5 N alcoholic potassium hydroxide solution D: Acid value (mgKOH/g)
《黏合劑成分的樹脂的重量平均分子量(Mw)的測定》 Mw的測定是利用凝膠滲透色譜儀(Gel Permeation Chromatograph,GPC)“HPC-8020”(東曹(Tosoh)公司製造)來進行。GPC是根據溶解在溶媒(THF;四氫呋喃(tetrahydrofuran))中的物質的分子大小的差異而對其進行分離定量的液相色譜儀。本測定是串聯地連接兩根“LF-604”(昭和電工公司製造:迅速分析用GPC管柱:6 mm內徑(inner diameter,ID)×150 mm大小)而用於管柱,並以流量0.6 mL/min、管柱溫度40℃的條件來進行。Mw的確定是藉由聚苯乙烯換算來進行。 《Determination of the weight average molecular weight (Mw) of the resin as an adhesive component》 The Mw was measured using a gel permeation chromatograph (GPC) "HPC-8020" (manufactured by Tosoh Corporation). GPC is a liquid chromatograph that separates and quantifies substances dissolved in a solvent (THF; tetrahydrofuran) based on their molecular size differences. This measurement was performed using two "LF-604" (manufactured by Showa Denko: GPC column for rapid analysis: 6 mm inner diameter (ID) × 150 mm size) connected in series and used as the column, and was performed at a flow rate of 0.6 mL/min and a column temperature of 40°C. Mw was determined by polystyrene conversion.
《金屬填料的平均粒徑測定》 在平均粒徑的測定中使用鐳射衍射-散射法細微性分佈測定裝置LS13320(貝克曼-庫爾特(Beckman-coulter)公司製造)。為藉由旋風乾燥粉體樣品模組對填料進行測定而獲得的D50平均粒徑,且為粒徑累計分佈中的累計值為50%的粒徑。此外,關於折射率的設定,設為1.6。 《Measurement of average particle size of metal fillers》 The average particle size was measured using the laser diffraction-scattering method fine distribution measuring device LS13320 (manufactured by Beckman-Coulter). The D50 average particle size was obtained by measuring the filler using the cyclone drying powder sample module, and is the particle size with a cumulative value of 50% in the cumulative distribution of particle sizes. In addition, the refractive index was set to 1.6.
《原料》 以下示出實施例及比較例中使用的原料。表1~表3中的黏合劑分別對應於以下的黏合劑。其他的硬化劑、金屬填料也同樣如此。 《黏合劑》 A-1:酸值為6 mgKOH/g、酚性羥基值為0 mgKOH/g、Mw為54,000的聚醯亞胺樹脂(東洋化工(TOYO CHEM)公司製造) A-2:酸值為0 mgKOH/g、酚性羥基值為10 mgKOH/g、Mw為120,000的聚氨基甲酸酯聚尿素樹脂(東洋化工(TOYO CHEM)公司製造) A-3:酸值為10 mgKOH/g、酚性羥基值為0 mgKOH/g、Mw為122,000的聚氨基甲酸酯聚尿素樹脂(東洋化工(TOYO CHEM)公司製造) A-4:酸值為8 mgKOH/g、酚性羥基值為0 mgKOH/g、Mw為54,000的聚氨基甲酸酯聚尿素樹脂(東洋化工(TOYO CHEM)公司製造) 《硬化劑》 B-1:雙酚A型環氧樹脂“jER828”(三菱化學公司製造) B-2:多官能型環氧樹脂“泰翠德(TETRAD)-X”(三菱氣體化學公司製造) B-3:氮丙啶化合物“凱米泰特(Chemitite)PZ-33”(日本催化劑公司製造) B-4:多官能型環氧樹脂“jER1031S”(三菱化學公司製造) B-5:雙酚A型環氧樹脂“jER1001”(三菱化學公司製造) 《金屬填料》 C-1:對平均粒徑為13 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-2:對平均粒徑為11 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-3:對平均粒徑為9 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-4:對平均粒徑為16 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-5:對平均粒徑為15 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-6:對平均粒徑為10 μm的薄片狀銅粉實施10質量%的銀包覆而成的銀塗層銅粉 C-7:對平均粒徑為13 μm的薄片狀銅粉實施1質量%的銀包覆而成的銀塗層銅粉 C-8:對平均粒徑為13 μm的薄片狀銅粉實施5質量%的銀包覆而成的銀塗層銅粉 C-9:對平均粒徑為14 μm的薄片狀銅粉實施8質量%的銀包覆而成的銀塗層銅粉 C-10:對平均粒徑為13 μm的薄片狀銅粉實施20質量%的銀包覆而成的銀塗層銅粉 C-11:平均粒徑為12 μm的薄片狀銀粉 C-12:對平均粒徑為8 μm的樹枝狀銅粉實施5質量%的銀包覆而成的銀塗層銅粉 《Raw materials》 The raw materials used in the embodiments and comparative examples are shown below. The adhesives in Tables 1 to 3 correspond to the following adhesives respectively. The same applies to other hardeners and metal fillers. 《Adhesive》 A-1: Acid value 6 mgKOH/g, phenolic hydroxyl value 0 mgKOH/g, Mw 54,000 polyimide resin (manufactured by Toyo Chemical (TOYO CHEM) Co., Ltd.) A-2: Acid value 0 mgKOH/g, phenolic hydroxyl value 10 mgKOH/g, Mw 120,000 polyurethane polyurea resin (manufactured by Toyo Chemical (TOYO CHEM) Co., Ltd.) A-3: Acid value 10 mgKOH/g, phenolic hydroxyl value 0 mgKOH/g, Mw 122,000 polyurethane polyurea resin (manufactured by Toyo Chemical (TOYO CHEM) Co., Ltd.) A-4: Acid value 8 mgKOH/g, phenolic hydroxyl value 0 mgKOH/g, polyurethane polyurea resin with Mw of 54,000 (manufactured by TOYO CHEM) 《Hardener》 B-1: Bisphenol A epoxy resin "jER828" (manufactured by Mitsubishi Chemical Corporation) B-2: Multifunctional epoxy resin "TETRAD-X" (manufactured by Mitsubishi Gas Chemical Corporation) B-3: Aziridine compound "Chemitite PZ-33" (manufactured by Nippon Catalyst Co., Ltd.) B-4: Multifunctional epoxy resin "jER1031S" (manufactured by Mitsubishi Chemical Corporation) B-5: Bisphenol A epoxy resin "jER1001" (manufactured by Mitsubishi Chemical Corporation) 《Metal filler》 C-1: Silver-coated copper powder with an average particle size of 13 μm and coated with 10% silver by mass C-2: Silver-coated copper powder with an average particle size of 11 μm and coated with 10% silver by mass C-3: Silver-coated copper powder with an average particle size of 9 μm and coated with 10% silver by mass C-4: Silver-coated copper powder with an average particle size of 16 μm and coated with 10% silver by mass C-5: Silver-coated copper powder with an average particle size of 15 μm flaky copper powder coated with 10% silver by mass C-6: 10% silver-coated flaky copper powder with an average particle size of 10 μm C-7: 13 μm flaky copper powder coated with 1% silver by mass C-8: 13 μm flaky copper powder coated with 5% silver by mass C-9: 14 μm flaky copper powder coated with 8% silver by mass C-10: Silver-coated copper powder with an average particle size of 13 μm and coated with 20% by mass of silver C-11: Silver-coated copper powder with an average particle size of 12 μm C-12: Silver-coated copper powder with an average particle size of 8 μm and coated with 5% by mass of silver
(實施例1) 《保護層的製作》 按固體成分換算計,將100份的黏合劑A-1、15份的硬化劑B-1裝入至容器中,利用分散機攪拌10分鐘,由此獲得樹脂組合物。利用棒塗機,將所獲得的樹脂組合物塗敷在剝離性片上,利用100℃的電烘箱進行2分鐘乾燥,由此製作包括保護層(I)的膜(1)。 《導電層的製作》 按固體成分換算計,將100份的黏合劑A-2、20份的硬化劑B-2、1份的硬化劑B-3、363份的金屬填料C-1裝入至容器中,利用分散機攪拌10分鐘,從而獲得含金屬填料的組合物。利用棒塗機,將所獲得的含金屬填料的組合物塗敷在剝離性片上,利用100℃的電烘箱進行2分鐘乾燥,製作包括導電層(II)的膜(2)。 《接著劑層的製作》 按固體成分換算計,將100份的黏合劑A-3、40份的硬化劑B-4、1.5份的硬化劑B-3、61份的金屬填料C-12裝入至容器中,利用分散機攪拌10分鐘,從而獲得樹脂組合物。利用棒塗機,將所獲得的樹脂組合物塗敷在剝離性片上,利用100℃的電烘箱進行2分鐘乾燥,由此製作在剝離性片上包括接著劑層(III)的膜(3)。 《電磁波屏蔽片的製作》 使用層壓機(100℃、壓力2 MPa、層壓速度1 m/min)將所製作的所述膜(1)的保護層(I)面與所述膜(2)的導電層(II)面貼合後,在膜(2)的導電層(II)與剝離性片之間剝開,製作包含導電層(II)、保護層(I)、剝離性片的膜(4)。 使用層壓機(100℃、壓力2 MPa、層壓速度1 m/min)將所製作的所述膜(4)的導電層(II)面與膜(3)的接著劑層(III)面貼合,從而獲得兩面被剝離性片覆蓋的電磁波屏蔽片。 (Example 1) 《Preparation of protective layer》 100 parts of adhesive A-1 and 15 parts of curing agent B-1 were placed in a container in terms of solid content and stirred for 10 minutes using a disperser to obtain a resin composition. The obtained resin composition was applied to a release sheet using a rod coater and dried in an electric oven at 100°C for 2 minutes to prepare a film (1) including a protective layer (I). 《Preparation of Conductive Layer》 According to the solid content conversion, 100 parts of adhesive A-2, 20 parts of hardener B-2, 1 part of hardener B-3, and 363 parts of metal filler C-1 were placed in a container and stirred for 10 minutes using a disperser to obtain a composition containing a metal filler. The obtained composition containing a metal filler was applied to a release sheet using a rod coater and dried in an electric oven at 100°C for 2 minutes to prepare a film (2) including a conductive layer (II). 《Preparation of adhesive layer》 Calculated on a solid basis, 100 parts of adhesive A-3, 40 parts of hardener B-4, 1.5 parts of hardener B-3, and 61 parts of metal filler C-12 were placed in a container and stirred for 10 minutes using a disperser to obtain a resin composition. The obtained resin composition was applied to a release sheet using a rod coater and dried in an electric oven at 100°C for 2 minutes to prepare a film (3) including an adhesive layer (III) on the release sheet. 《Production of electromagnetic wave shielding sheet》 The protective layer (I) surface of the produced film (1) and the conductive layer (II) surface of the film (2) are laminated using a laminating press (100°C, pressure 2 MPa, laminating speed 1 m/min), and then peeled between the conductive layer (II) of the film (2) and the peeling sheet to produce a film (4) comprising a conductive layer (II), a protective layer (I), and a peeling sheet. The conductive layer (II) surface of the prepared film (4) is bonded to the adhesive layer (III) surface of the film (3) using a laminating press (100°C, pressure 2 MPa, laminating speed 1 m/min), thereby obtaining an electromagnetic wave shielding sheet covered on both sides with a release sheet.
(實施例2~實施例19、比較例1~比較例2) 除了將實施例1中使用的原料變更為表1~表3中記載的原料、厚度以外,與實施例1同樣地進行,獲得兩面被剝離性片覆蓋的電磁波屏蔽片。 (Example 2 to Example 19, Comparative Example 1 to Comparative Example 2) Except that the raw materials used in Example 1 were changed to the raw materials and thicknesses described in Tables 1 to 3, the same procedure as in Example 1 was followed to obtain an electromagnetic wave shielding sheet covered on both sides with a releasable sheet.
(比較例4) 除了在導電層中使用銅箔以外,與實施例1同樣地進行,獲得兩面被剝離性片覆蓋的電磁波屏蔽片。 (Comparative Example 4) Except for using copper foil in the conductive layer, the same procedure as in Example 1 was performed to obtain an electromagnetic wave shielding sheet covered with release sheets on both sides.
(比較例5) 除了在所述膜(1)的保護層(I)面實施真空銅蒸鍍而形成有導電層以外,與實施例1同樣地進行,獲得兩面被剝離性片覆蓋的電磁波屏蔽片。 (Comparative Example 5) Except that a conductive layer is formed by vacuum copper deposition on the protective layer (I) of the film (1), the same procedure as in Example 1 is performed to obtain an electromagnetic wave shielding sheet covered on both sides with a release sheet.
《剝離試驗》 準備寬度60 mm、長度80 mm的電磁波屏蔽片,將接著劑層側的剝離性片剝下,使接著劑層露出,並在露出面貼附寬度70 mm、長度140 mm的黏著帶(東洋化工(TOYO CHEM)公司製造的DF715)。將黏著帶(東洋化工(TOYO CHEM)公司製造的DF715)貼附在保護層上所層疊的剝離性片後,將在兩面層疊有黏著帶的電磁波屏蔽片切斷為25 mm寬度,從而製作兩片試驗片。對於所獲得的試驗片,使用2 kg的輥進行一個來回量的加壓,使電磁波屏蔽片與黏著帶密接。使用依據JIS Z0237的拉伸試驗機,在剝離角度:180°、剝離速度:300 mm/min的條件下測定剝離力,將兩片試驗片的平均值作為剝離力。 進而,利用目視觀察剝離試驗後的剝離面,測定發生了內聚破壞而轉移至保護層及接著劑層的導電層的面積。在未發生內聚破壞而導電層與保護層或接著劑層一起剝離的情況下,將內聚破壞率設為0%。 《Peeling test》 Prepare an electromagnetic wave shielding sheet with a width of 60 mm and a length of 80 mm, peel off the peeling sheet on the adhesive layer side to expose the adhesive layer, and stick an adhesive tape (DF715 manufactured by Toyo Chemical Co., Ltd.) with a width of 70 mm and a length of 140 mm on the exposed surface. After sticking the adhesive tape (DF715 manufactured by Toyo Chemical Co., Ltd.) on the peeling sheet stacked on the protective layer, cut the electromagnetic wave shielding sheet with the adhesive tape stacked on both sides into 25 mm widths to prepare two test pieces. The obtained test piece was pressed back and forth using a 2 kg roller to make the electromagnetic wave shielding sheet and the adhesive tape close to each other. The peeling force was measured using a tensile testing machine in accordance with JIS Z0237 at a peeling angle of 180° and a peeling speed of 300 mm/min, and the average value of the two test pieces was taken as the peeling force. Furthermore, the peeling surface after the peeling test was visually observed to measure the area of the conductive layer that had undergone cohesive failure and transferred to the protective layer and adhesive layer. In the case where the conductive layer is peeled off together with the protective layer or adhesive layer without cohesive failure, the cohesive failure rate is set to 0%.
《剖面評價》 將電磁波屏蔽片的接著劑層側的剝離性片剝下,將露出的接著劑層與聚醯亞胺膜(東麗杜邦(Toray-Dupont)公司製造的“卡普頓(Kapton)200EN”)貼合,在2 MPa、170℃的條件下熱壓30分鐘。將其切斷為寬度5 mm、長度5 mm左右的大小後,將環氧樹脂(派特牢包克斯(Petropoxy)154,丸東(maruto)公司製造)0.05 g滴加至載玻片上,並與電磁波屏蔽片接著,從而獲得載玻片/電磁波屏蔽片/聚醯亞胺膜的結構的層疊體。針對所獲得的層疊體,使用剖面拋光機(Cross section polisher)(日本電子公司製造,SM-09010)從聚醯亞胺膜側藉由離子束照射進行切斷加工,並對剖面進行鉑蒸鍍,獲得熱壓後的電磁波屏蔽片的剖面(以下,稱為“測定試樣的剖面”)。 《Cross-sectional evaluation》 The release sheet on the adhesive layer side of the electromagnetic wave shielding sheet was peeled off, and the exposed adhesive layer was bonded to a polyimide film ("Kapton 200EN" manufactured by Toray-Dupont) and hot-pressed at 2 MPa and 170°C for 30 minutes. After cutting it into pieces of about 5 mm in width and 5 mm in length, 0.05 g of epoxy resin (Petropoxy 154, manufactured by Maruto) was dropped onto a glass slide and bonded to the electromagnetic wave shielding sheet, thereby obtaining a laminate with a structure of glass slide/electromagnetic wave shielding sheet/polyimide film. The obtained laminate was cut from the polyimide film side by ion beam irradiation using a cross section polisher (manufactured by NEC Corporation, SM-09010), and the cross section was platinum evaporated to obtain the cross section of the electromagnetic wave shielding sheet after heat pressing (hereinafter referred to as the "cross section of the test sample").
《厚度的測定》 利用掃描型電子顯微鏡(日本電子公司製造,JSM-6010Plus)觀察測定試樣的剖面,測定各層的厚度。倍率設為500倍~5000倍,將10處的平均值作為各層的厚度。 《Thickness measurement》 The cross section of the sample was observed using a scanning electron microscope (manufactured by JEOL Ltd., JSM-6010Plus) to measure the thickness of each layer. The magnification was set to 500x to 5000x, and the average value of 10 points was taken as the thickness of each layer.
《金屬填料的縱橫比的測定》 利用掃描型電子顯微鏡(日本電子公司製造,JSM-6010Plus)觀察測定試樣的剖面,測定金屬填料的縱橫比。倍率設為3000倍~5000倍,將30個金屬填料的平均值作為縱橫比。此外,所謂縱橫比是指[長徑(μm)]/[厚度(μm)]。 《Measurement of the aspect ratio of metal fillers》 The cross section of the sample was observed using a scanning electron microscope (manufactured by JEOL Ltd., JSM-6010Plus) to measure the aspect ratio of the metal filler. The magnification was set to 3000 to 5000 times, and the average value of 30 metal fillers was taken as the aspect ratio. In addition, the so-called aspect ratio refers to [length (μm)] / [thickness (μm)].
《金屬填料所占的面積的測定》 使用掃描型電子顯微鏡(日本電子公司製造,JSM-6010Plus),在倍率500倍~5000倍下觀察測定試樣的剖面,測定導電層中的填料的面積。在利用電子顯微鏡的觀察中,因原子序數效應,在樹脂層與金屬層中產生對比度差,從而可識別金屬的形狀。具體而言,由於金屬被分為白色的顏色,樹脂層被分為灰色至黑色的顏色,因此可區分辨別樹脂的部分與金屬的部分。 利用圖像分析免費軟體(free soft)“GIMP2.6.11”將電子顯微鏡的圖像二值化為黑色與白色,對黑色與白色的圖元數進行計數,由此算出導電層的金屬填料的面積與金屬填料以外的成分的面積比。將導電層的面積(黑色與白色的圖元數)設為100時的填料的面積(白色的圖元數)作為填料所占的面積。 《Measurement of the area occupied by metal fillers》 Using a scanning electron microscope (manufactured by JEOL Ltd., JSM-6010Plus), the cross section of the sample was observed at a magnification of 500x to 5000x to measure the area of the fillers in the conductive layer. In observation using an electron microscope, due to the atomic number effect, a contrast difference occurs between the resin layer and the metal layer, allowing the shape of the metal to be identified. Specifically, since the metal is classified as white and the resin layer is classified as gray to black, the resin part and the metal part can be distinguished. The electron microscope image was binarized into black and white using the free image analysis software "GIMP2.6.11", and the number of black and white pixels was counted to calculate the area ratio of the metal filler of the conductive layer to the area ratio of the components other than the metal filler. The area of the filler (the number of white pixels) when the area of the conductive layer (the number of black and white pixels) was set to 100 was taken as the area occupied by the filler.
《銀元素的質量的比例的測定》 使用掃描型電子顯微鏡(日本電子公司製造,JSM-6010Plus)、與能量分散型X射線分析裝置(日本電子公司製造,JED-2300),在加速電壓20 kV、倍率3000倍~10000倍下獲取測定試樣的剖面中的各元素的定性分析圖表。對於導電層,基於定性分析圖表來算出各元素的質量濃度。銀的元素量是將“銅及銀元素的總質量”設為100%時的銀元素的相對質量(%),當未檢測出銅元素或銀的元素量為98%以上時,將銀的元素量設為100%。 此外,在能量分散型X射線分析中,有時也檢測出位於距表面為數微米左右深度的元素,剖面分析難以完全從垂直進行測定,因此,僅將導電層的厚度方向中央的50%部分作為分析物件,以免受到保護層或接著劑層的影響。 《Measurement of the mass ratio of silver element》 Using a scanning electron microscope (JSM-6010Plus, manufactured by NEC Corporation) and an energy dispersive X-ray analyzer (JED-2300, manufactured by NEC Corporation), a qualitative analysis chart of each element in the cross section of the measured sample was obtained at an accelerating voltage of 20 kV and a magnification of 3000 to 10000 times. For the conductive layer, the mass concentration of each element was calculated based on the qualitative analysis chart. The element amount of silver is the relative mass (%) of the silver element when the "total mass of copper and silver elements" is set to 100%. When the copper element is not detected or the element amount of silver is 98% or more, the element amount of silver is set to 100%. In addition, in energy dispersive X-ray analysis, elements located at a depth of about several microns from the surface are sometimes detected. It is difficult to measure completely vertically in cross-section analysis. Therefore, only the central 50% of the thickness direction of the conductive layer is used as the analysis object to avoid being affected by the protective layer or adhesive layer.
《導電層的表面電阻率的測定》 對於耐熱性聚酯膜的剝離處理面,使用包含環氧樹脂以及銀粉末的導電膏,在一條直線上以5 mm間隔進行四點圖案的絲網印刷,使其乾燥後,在180℃的烘箱中使導電膏加熱硬化,形成直徑500 μm、高度100 μm的導電性凸塊。 將兩面被剝離性片覆蓋的電磁波屏蔽片切出長邊80 mm、短邊50 mm,將接著劑層(III)側的剝離性片剝下,將露出的接著劑層(III)與形成有導電性凸塊的所述耐熱性聚酯膜重疊,在170℃、2 MPa、30分鐘的條件下進行壓接。此外,所述四點導電性凸塊以與所述試樣片的長邊平行地存在的方式進行壓接。藉由壓接,高度為100 μm的導電性凸塊貫通接著劑層(III)並到達導電層(II)。 壓接後,將經剝離處理的耐熱性聚酯膜除去,使接著劑層(III)及導電性凸塊露出。 將所述導電性凸塊作為測定用電極,依據JIS K7194-1994並使用三菱化學製造的“洛雷斯特(Loresta)GP”的四探針探頭測定電阻值。將測定值乘以常數“4.239”而得的值作為表面電阻率。 此外,由於接著劑層(III)是僅在厚度方向上表現出導電性的各向異性導電性接著劑層或不具有導電性的接著劑層,因此即便導電性凸塊貫通接著劑層(III),所測定的電阻值也是導電層(II)的電阻值。 《Measurement of the surface resistivity of the conductive layer》 On the peeling-treated surface of the heat-resistant polyester film, a conductive paste containing epoxy resin and silver powder was screen-printed in a straight line with a 5 mm interval. After drying, the conductive paste was heated and hardened in an oven at 180°C to form conductive bumps with a diameter of 500 μm and a height of 100 μm. The electromagnetic wave shielding sheet covered with a release sheet on both sides was cut into 80 mm long sides and 50 mm short sides, the release sheet on the adhesive layer (III) side was peeled off, and the exposed adhesive layer (III) was overlapped with the heat-resistant polyester film formed with conductive bumps, and pressure-bonded at 170°C, 2 MPa, and 30 minutes. In addition, the four-point conductive bumps were pressure-bonded in a manner parallel to the long sides of the sample sheet. By pressure bonding, the conductive bumps with a height of 100 μm penetrated the adhesive layer (III) and reached the conductive layer (II). After crimping, the heat-resistant polyester film that has been subjected to a peeling treatment is removed to expose the adhesive layer (III) and the conductive bump. The conductive bump is used as a measurement electrode, and the resistance value is measured in accordance with JIS K7194-1994 using a four-probe probe of "Loresta GP" manufactured by Mitsubishi Chemical. The value obtained by multiplying the measured value by the constant "4.239" is used as the surface resistivity. In addition, since the adhesive layer (III) is an anisotropic conductive adhesive layer that exhibits conductivity only in the thickness direction or a non-conductive adhesive layer, even if the conductive bump passes through the adhesive layer (III), the measured resistance value is the resistance value of the conductive layer (II).
《導電層的導電率的求法》 根據上述所測定的導電層的厚度t(μm)以及表面電阻率R(Ω/□),依照下述式求出導電層的導電率σ(S/m)。 σ=10 6/R/t 《How to calculate the conductivity of the conductive layer》 Based on the thickness t (μm) and surface resistivity R (Ω/□) of the conductive layer measured above, calculate the conductivity σ (S/m) of the conductive layer according to the following formula. σ = 10 6 /R/t
《載體衝壓適應性的評價》 準備寬度50 mm、長度250 mm的電磁波屏蔽片,在保護層側的剝離性片貼附微黏著帶(東洋化工(TOYO CHEM)公司製造的LE951),並使用2 kg的輥進行一個來回量的加壓,使電磁波屏蔽片與微黏著帶密接。利用衝壓加工機以10 mm×30 mm進行總件(piece)數20個的起模。將起模後的電磁波屏蔽片的接著劑層側的剝離性片剝下,將露出的接著劑層與聚醯亞胺膜(東麗杜邦(Toray-Dupont)公司製造的“卡普頓(Kapton)200EN”)貼合,並進行層壓(90℃、壓力0.3 MPa、層壓速度2 m/min)。然後,將微黏著帶剝離,觀察剝離介面,並計數相當於不良品的件的個數。使用以下所示的數式算出不良率,並對衝壓加工性進行評價。 (不良率)=(相當於不良品的件數)/(起模後的總件數)×100 此外,所謂不良品是指在將微黏著帶剝離時,剝離介面不是在微黏著帶與電磁波屏蔽片的介面,而是在電磁波屏蔽片內產生了剝離的製品。 評價基準如以下那樣。 ++:不良率為0%。極其良好。 +:不良率為10%以下。良好。 NG:不良率大於10%。無法實用。 《Evaluation of carrier pressure adaptability》 An electromagnetic wave shielding sheet with a width of 50 mm and a length of 250 mm was prepared. A micro-adhesive tape (LE951 manufactured by Toyo Chemical Co., Ltd.) was attached to the release sheet on the protective layer side, and a 2 kg roller was used to apply pressure in a reciprocating manner to make the electromagnetic wave shielding sheet and the micro-adhesive tape closely adhere to each other. A total of 20 pieces of 10 mm × 30 mm were molded using a press machine. The release sheet on the adhesive layer side of the electromagnetic wave shielding sheet after demolding was peeled off, and the exposed adhesive layer was bonded to a polyimide film ("Kapton 200EN" manufactured by Toray-Dupont) and laminated (90°C, pressure 0.3 MPa, lamination speed 2 m/min). Then, the micro-adhesive tape was peeled off, the peeling interface was observed, and the number of pieces equivalent to defective products was counted. The defective rate was calculated using the formula shown below, and the punching processability was evaluated. (Defective rate) = (Number of pieces equivalent to defective products) / (Total number of pieces after demolding) × 100 In addition, the so-called defective products refer to products in which the peeling interface is not between the micro-adhesive tape and the electromagnetic wave shielding sheet, but peeling occurs inside the electromagnetic wave shielding sheet when the micro-adhesive tape is peeled off. The evaluation criteria are as follows. ++: Defective rate is 0%. Extremely good. +: Defective rate is less than 10%. Good. NG: Defective rate is greater than 10%. Not practical.
《傳輸特性的評價》 傳輸特性是使用具有共面電路的具有電磁波屏蔽片的印刷電路板來評價。將測定中使用的具有共面電路的柔性印刷電路板1(以下,也稱為具有共面電路的印刷電路基板)的主表面側的示意性平面圖示於圖1,將背面側的示意性平面圖示於圖2。首先,準備在厚度50 μm的聚醯亞胺膜20的兩面層疊有厚度12 μm的壓延銅箔而成的兩面CCL“R-F775”(松下(Panasonic)公司製造)。然後,在矩形形狀的四個角部附近分別設置六處通孔22(直徑0.1 mm)。此外,圖中為了便於圖示,在各角部僅示出兩個通孔22。繼而,在進行無電解鍍敷處理後,進行電解鍍敷處理而形成10 μm的鍍銅膜21,經由通孔22內所形成的鍍銅膜而確保主表面-背面間的導通。之後,如圖1所示,在聚醯亞胺膜20的主表面形成長度為10 cm的兩根信號配線23,並在其外側形成與信號配線23並行的接地配線24,並在自接地配線24延伸、聚醯亞胺膜20的短邊方向的包含通孔22的區域形成接地圖案25。 《Evaluation of transmission characteristics》 The transmission characteristics are evaluated using a printed circuit board with an electromagnetic wave shielding sheet having a coplanar circuit. A schematic plan view of the main surface side of the flexible printed circuit board 1 with a coplanar circuit (hereinafter, also referred to as a printed circuit substrate with a coplanar circuit) used in the measurement is shown in FIG1, and a schematic plan view of the back side is shown in FIG2. First, a double-sided CCL "R-F775" (manufactured by Panasonic) is prepared in which a 12 μm thick rolled copper foil is laminated on both sides of a 50 μm thick polyimide film 20. Then, six through holes 22 (diameter 0.1 mm) are provided near the four corners of the rectangular shape. In addition, for the convenience of illustration, only two through holes 22 are shown at each corner. Then, after the electroless plating treatment, the electrolytic plating treatment is performed to form a 10 μm copper-plated film 21, and the copper-plated film formed in the through hole 22 ensures the conduction between the main surface and the back surface. After that, as shown in FIG1, two signal wirings 23 with a length of 10 cm are formed on the main surface of the polyimide film 20, and a ground wiring 24 parallel to the signal wiring 23 is formed on the outer side thereof, and a ground pattern 25 is formed in the area extending from the ground wiring 24 and including the through hole 22 in the short side direction of the polyimide film 20.
之後,對形成在聚醯亞胺膜20的背面的銅箔進行蝕刻,而在與接地圖案25對應的位置獲得圖2所示那樣的背面側接地圖案26。電路的外觀、公差的檢查規格設為日本電子封裝和電路協會(Japan Electronics Packaging and Circuits Association,JPCA)標準(JPCA-DG02)。接下來,在聚醯亞胺膜20的主表面側貼附包括聚醯亞胺膜(厚度12.5 μm)與絕緣性接著劑層(厚度15 μm)的外塗層3“CISV1215(尼關工業公司(Nikkan Industries Co.ltd.)製造)”。此外,在圖1中,利用透視圖來示出外塗層3,以便知曉信號配線23等的結構。之後,對從外塗層3中露出的銅箔圖案進行鍍鎳(未圖示),繼而進行鍍金(未圖示)處理。After that, the copper foil formed on the back side of the polyimide film 20 is etched to obtain the back side ground pattern 26 shown in FIG. 2 at a position corresponding to the ground pattern 25. The inspection specifications for the appearance and tolerance of the circuit are set to the Japan Electronics Packaging and Circuits Association (JPCA) standard (JPCA-DG02). Next, an outer coating 3 "CISV1215 (manufactured by Nikkan Industries Co., Ltd.)" including a polyimide film (thickness 12.5 μm) and an insulating adhesive layer (thickness 15 μm) is attached to the main surface side of the polyimide film 20. 1, the outer coating layer 3 is shown in a perspective view so as to understand the structure of the signal wiring 23, etc. Thereafter, the copper foil pattern exposed from the outer coating layer 3 is plated with nickel (not shown) and then gold (not shown) is plated.
接下來,如圖3所示,準備電磁波屏蔽片,將設置在接著劑層上的剝離性片(未圖示)剝下。然後,以電磁波屏蔽片的接著劑層為內側,在具有共面電路的印刷電路基板1的整個背面側,在170℃、2.0 MPa、30分鐘的條件下對電磁波屏蔽片進行壓接,並將保護層面的剝離性片剝下,由此獲得具有各實施例及比較例的電磁波屏蔽片4的、具有共面電路的具有電磁波屏蔽片的印刷電路板5。圖3中,利用透視圖來示出背面側接地圖案26。Next, as shown in FIG3, an electromagnetic wave shielding sheet is prepared, and a release sheet (not shown) disposed on the adhesive layer is peeled off. Then, the electromagnetic wave shielding sheet is pressed on the entire back side of the printed circuit substrate 1 having a coplanar circuit, with the adhesive layer of the electromagnetic wave shielding sheet as the inner side, under the conditions of 170°C, 2.0 MPa, and 30 minutes, and the release sheet of the protective layer is peeled off, thereby obtaining a printed circuit board 5 having a coplanar circuit and an electromagnetic wave shielding sheet having the electromagnetic wave shielding sheet 4 of each embodiment and comparative example. In FIG3, a back side grounding pattern 26 is shown in perspective.
此外,以使特性阻抗處於±10 Ω的方式適宜調整信號配線23的L/S(線/間距)。接地配線24的寬度為100 μm,接地配線24與信號配線23之間的距離設為1 mm。Furthermore, the L/S (line/space) of the signal wiring 23 is appropriately adjusted so that the characteristic impedance is ±10 Ω. The width of the ground wiring 24 is 100 μm, and the distance between the ground wiring 24 and the signal wiring 23 is set to 1 mm.
將網路分析儀E5071C(是德科技(Keysight Technologies)公司製造)連接於具有共面電路的具有電磁波屏蔽片的印刷電路板5的露出的信號配線23,輸入15 GHz的正弦波,並對傳輸損耗進行測定,由此評價傳輸特性。按照下述的基準對所測定的傳輸特性進行評價。 +++:15 GHz下的傳輸損耗未滿7.0 dB。極其良好。 ++:15 GHz下的傳輸損耗為7.0 dB以上且未滿8.0 dB。良好。 +:15 GHz下的傳輸損耗為8.0 dB以上且未滿9.0 dB。可實用。 NG:15 GHz下的傳輸損耗為9.0 dB以上。無法實用。 The network analyzer E5071C (manufactured by Keysight Technologies) was connected to the exposed signal wiring 23 of the printed circuit board 5 with an electromagnetic wave shielding sheet having a coplanar circuit, and a 15 GHz sine wave was input to measure the transmission loss to evaluate the transmission characteristics. The measured transmission characteristics were evaluated according to the following criteria. +++: The transmission loss at 15 GHz is less than 7.0 dB. Very good. ++: The transmission loss at 15 GHz is 7.0 dB or more and less than 8.0 dB. Good. +: The transmission loss at 15 GHz is 8.0 dB or more and less than 9.0 dB. Practical. NG: The transmission loss at 15 GHz is 9.0 dB or more. Not practical.
《屏蔽性的評價》 將電磁波屏蔽片夾持在剝離性膜間,進行170℃、2 MPa、30分鐘熱壓,並將剝離性膜除去,將此狀態下的製品作為測定樣品。屏蔽性是依據美國材料與試驗協會(American Society for Testing and Materials,ASTM)D4935,使用肯考姆(keycom)公司製造的同軸管型的屏蔽效果測定系統,在300 MHz~20 GHz條件下進行電磁波的照射。對電磁波在電磁波屏蔽片中衰減的衰減量進行測定,並依照以下的基準進行評價。 此外,衰減量的測定值為分貝(單位;dB)。 +++:照射15 GHz的電磁波時的衰減量未滿-60 dB。極其良好。 ++:照射15 GHz的電磁波時的衰減量為-60 dB以上且未滿-55 dB。良好。 +:照射15 GHz的電磁波時的衰減量為-55 dB以上且未滿-50 dB。可實用。 NG:照射15 GHz的電磁波時的衰減量為-50 dB以上。無法實用。 《Evaluation of shielding properties》 The electromagnetic wave shielding sheet was sandwiched between release films and hot-pressed at 170℃, 2 MPa, for 30 minutes. The release film was removed and the product in this state was used as a test sample. The shielding properties were evaluated in accordance with American Society for Testing and Materials (ASTM) D4935, using a coaxial tube type shielding effect measurement system manufactured by Keycom, and electromagnetic waves were irradiated under conditions of 300 MHz to 20 GHz. The attenuation of electromagnetic waves in the electromagnetic wave shielding sheet was measured and evaluated according to the following standards. In addition, the measured value of the attenuation is decibel (unit; dB). +++: The attenuation when irradiated with 15 GHz electromagnetic waves is less than -60 dB. Very good. ++: Attenuation when irradiated with 15 GHz electromagnetic waves is -60 dB or more and less than -55 dB. Good. +: Attenuation when irradiated with 15 GHz electromagnetic waves is -55 dB or more and less than -50 dB. Practical. NG: Attenuation when irradiated with 15 GHz electromagnetic waves is -50 dB or more. Not practical.
《脫氣性的評價》 使在模仿印刷電路基板的覆銅層疊板上層疊了電磁波屏蔽片的試驗片與熔融焊料接觸,並根據其樣品的外觀有無變化來評價脫氣性。脫氣性高的電磁波屏蔽片可使從印刷電路基板產生的水蒸氣等逸氣效率良好地向印刷電路基板外逃逸,因此外觀不會變化,但在脫氣性低的電磁波屏蔽片中逸氣無法效率良好地逃逸,會產生發泡或剝落。 首先,將寬度25 mm、長度70 mm的電磁波屏蔽片的接著劑層側的剝離性片剝下,將露出的接著劑層與總厚64 μm的經鍍金處理的覆銅層疊板(鍍金0.3 μm/鍍鎳1 μm/銅箔18 μm/接著劑20 μm/聚醯亞胺膜25 μm)的鍍金面在170℃、2 MPa、30分鐘的條件下進行壓接,使其熱硬化而獲得層疊體。將所獲得的層疊體切成寬度10 mm、長度65 mm的大小而製作試樣。將所獲得的試樣在40℃、90%RH的環境下放置72小時。之後,使試樣的聚醯亞胺膜面朝下在250℃的熔融焊料上漂浮1分鐘。然後以目視觀察取出後的試樣的外觀,並按照以下的基準進行評價。 ++:目視時未發現外觀變化不良。極其良好。 +:外觀不良的範圍為試樣中的保護層面積的10%以下。良好。 NG:外觀不良的範圍大於試樣中的保護層面積的10%。 "Evaluation of degassing properties" A test piece with an electromagnetic shielding sheet stacked on a copper-clad laminate that simulates a printed circuit board is brought into contact with molten solder, and the degassing properties of the sample are evaluated based on whether there is a change in the appearance of the sample. An electromagnetic shielding sheet with high degassing properties allows outgassing such as water vapor generated from the printed circuit board to escape to the outside of the printed circuit board efficiently, so the appearance does not change. However, in an electromagnetic shielding sheet with low degassing properties, outgassing cannot escape efficiently, and bubbles or peeling may occur. First, the release sheet on the adhesive layer side of the electromagnetic shielding sheet with a width of 25 mm and a length of 70 mm was peeled off, and the exposed adhesive layer was pressed and bonded to the gold-plated surface of a 64 μm-thick gold-plated copper-clad laminate (gold-plated 0.3 μm/nickel-plated 1 μm/copper foil 18 μm/adhesive 20 μm/polyimide film 25 μm) at 170°C and 2 MPa for 30 minutes, and the laminate was thermally cured to obtain a laminate. The obtained laminate was cut into pieces with a width of 10 mm and a length of 65 mm to prepare a sample. The obtained sample was placed in an environment of 40°C and 90% RH for 72 hours. After that, the polyimide film of the sample was floated on molten solder at 250°C for 1 minute with the surface facing downward. The appearance of the sample after removal was then visually observed and evaluated according to the following criteria. ++: No appearance changes were found during visual inspection. Very good. +: The range of poor appearance is less than 10% of the protective layer area in the sample. Good. NG: The range of poor appearance is greater than 10% of the protective layer area in the sample.
[表1] [Table 1]
[表2] [Table 2]
[表3] [Table 3]
如表1~表3所示,相對於比較例1~比較例4,本發明的實施例1~實施例19的電磁波屏蔽片的剝離力高,體積電阻率或表面電阻率低,載體衝壓適應性、屏蔽性、脫氣性優異。As shown in Tables 1 to 3, compared with Comparative Examples 1 to 4, the electromagnetic shielding sheets of Examples 1 to 19 of the present invention have high peeling force, low volume resistivity or surface resistivity, and excellent carrier impact pressure adaptability, shielding properties, and degassing properties.
100:電子裝置 1:印刷電路基板(柔性印刷電路板) 20:聚醯亞胺膜 21:鍍銅膜 22:通孔 23:信號配線 24:接地配線 25:接地圖案 26:背面側接地圖案 3:外塗層 4:電磁波屏蔽片 5:具有電磁波屏蔽片的印刷電路板 100: Electronic device 1: Printed circuit board (flexible printed circuit board) 20: Polyimide film 21: Copper-plated film 22: Through hole 23: Signal wiring 24: Ground wiring 25: Ground pattern 26: Back side ground pattern 3: External coating 4: Electromagnetic wave shielding sheet 5: Printed circuit board with electromagnetic wave shielding sheet
圖1是實施例的印刷電路基板的主表面側的示意性平面圖。 圖2是實施例的印刷電路基板的背面側的示意性平面圖。 圖3是實施例的屏蔽性印刷基板的背面側的示意性平面圖。 FIG. 1 is a schematic plan view of the main surface side of the printed circuit substrate of the embodiment. FIG. 2 is a schematic plan view of the back side of the printed circuit substrate of the embodiment. FIG. 3 is a schematic plan view of the back side of the shielding printed circuit substrate of the embodiment.
1:印刷電路基板(柔性印刷電路板) 3:外塗層 20:聚醯亞胺膜 21:鍍銅膜 22:通孔 23:信號配線 24:接地配線 25:接地圖案 1: Printed circuit board (flexible printed circuit board) 3: External coating 20: Polyimide film 21: Copper-plated film 22: Through hole 23: Signal wiring 24: Ground wiring 25: Ground pattern
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| JP2019016782A (en) * | 2017-07-03 | 2019-01-31 | 信越ポリマー株式会社 | Electromagnetic wave shielding film and method of producing the same, and printed wiring board with electromagnetic wave shielding film and method of manufacturing the same |
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| TW201643039A (en) * | 2015-06-15 | 2016-12-16 | Jx Nippon Mining & Metals Corp | Electromagnetic wave shielding material |
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