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TWI889459B - Micro light-emitting diode display panel - Google Patents

Micro light-emitting diode display panel Download PDF

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TWI889459B
TWI889459B TW113126829A TW113126829A TWI889459B TW I889459 B TWI889459 B TW I889459B TW 113126829 A TW113126829 A TW 113126829A TW 113126829 A TW113126829 A TW 113126829A TW I889459 B TWI889459 B TW I889459B
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micro
pixel unit
display panel
substrate
filling structure
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TW202606541A (en
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駱那登 穆魯根
孫聖淵
邱柏崴
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錼創顯示科技股份有限公司
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Abstract

A micro light-emitting diode (micro-LED) display panel including a substrate, a first light blocking layer, a second light blocking layer, and a plurality of micro-LEDs is provided. The first light blocking layer is disposed on the substrate. The second light blocking layer is disposed on the first light blocking layer. The second light blocking layer defines a plurality of pixel units arranged in an array. The micro-LEDs are disposed on the first blocking layer. At least one of the micro-LEDs is disposed on each of the pixel units. A gap exists between a part of the second light blocking layer and the first light blocking layer. A filling structure is in the gap. A material of the filling structure is different from a material of the second light blocking layer.

Description

微型發光二極體顯示面板Micro LED Display Panel

本發明是有關於一種顯示面板,且特別是有關於一種微型發光二極體顯示面板。The present invention relates to a display panel, and in particular to a micro-light emitting diode display panel.

隨著顯示技術的進步,微型發光二極體顯示面板被發展出來。除了採用多個紅色微型發光二極體晶片、多個綠色微型發光二極體晶片及多個藍色微型發光二極體晶片交錯排列來形成彩色畫面之外,另一種微型發光二極體顯示面板是採用形成於顯示背板上的平面層與形成於平面上的擋牆來形成多個畫素空間,其中微型發光二極體晶片是設於畫素空間中。然後,在畫素空間中填入波長轉換材料,以將發光二極體晶片所發出的光的顏色轉換成另一種顏色,如此亦能夠形成彩色畫面。With the advancement of display technology, micro-LED display panels have been developed. In addition to using multiple red micro-LED chips, multiple green micro-LED chips, and multiple blue micro-LED chips in an alternating arrangement to form a color screen, another type of micro-LED display panel uses a plane layer formed on the display backplane and a baffle formed on the plane to form multiple pixel spaces, wherein the micro-LED chips are arranged in the pixel space. Then, a wavelength conversion material is filled in the pixel space to convert the color of the light emitted by the LED chip into another color, so that a color screen can also be formed.

在製作用以容置波長轉換材料的結構時,可以微影製程分別成型平面層與擋牆,但因製程的不穩定性,造成平面層與擋牆的底部有縫隙,而縫隙會導致在後續灌注波長轉換材料至畫素空間中時,波長轉換材料經由縫隙溢流至其他畫素。如此一來,容易造成相鄰畫素的色彩串擾,或使微型發光二極體顯示面板產生不純的色彩輸出。When manufacturing a structure for accommodating wavelength conversion materials, the planar layer and the baffle can be formed separately by lithography process. However, due to the instability of the process, there are gaps at the bottom of the planar layer and the baffle. The gaps will cause the wavelength conversion material to overflow to other pixels through the gaps when the wavelength conversion material is subsequently injected into the pixel space. This can easily cause color crosstalk between adjacent pixels or cause the micro-LED display panel to produce impure color output.

本發明提供一種微型發光二極體顯示面板,其可有效改善相鄰畫素色彩串擾的問題。The present invention provides a micro-LED display panel, which can effectively improve the problem of color crosstalk between adjacent pixels.

本發明的一實施例提出一種微型發光二極體顯示面板,包括一基板、一第一遮光層、一第二遮光層及多個微型發光二極體。第一遮光層設置於基板上,第二遮光層設置於第一遮光層上,其中第二遮光層定義出多個排成陣列的畫素單元。這些微型發光二極體配置於第一遮光層上,其中各畫素單元中設有這些微型發光二極體的至少一個。部分的第二遮光層與第一遮光層之間有一縫隙,縫隙中具有填充結構,填充結構的材質與第二遮光層的材質不相同。An embodiment of the present invention provides a micro-LED display panel, comprising a substrate, a first light-shielding layer, a second light-shielding layer and a plurality of micro-LEDs. The first light-shielding layer is disposed on the substrate, and the second light-shielding layer is disposed on the first light-shielding layer, wherein the second light-shielding layer defines a plurality of pixel units arranged in an array. These micro-LEDs are arranged on the first light-shielding layer, wherein at least one of these micro-LEDs is disposed in each pixel unit. There is a gap between a portion of the second light-shielding layer and the first light-shielding layer, and a filling structure is provided in the gap, and the material of the filling structure is different from the material of the second light-shielding layer.

在本發明的實施例的微型發光二極體顯示面板中,由於採用填充結構去填充縫隙,以修補縫隙這樣的缺陷,因此後續灌注波長轉換材料至畫素單元中時,波長轉換材料便不會經由縫隙溢流至相鄰的畫素單元而造成色彩串擾的問題。所以,本發明的實施例的微型發光二極體顯示面板可以達到色純度較高的色彩輸出。In the micro-LED display panel of the embodiment of the present invention, since a filling structure is used to fill the gap to repair the defect of the gap, when the wavelength conversion material is subsequently injected into the pixel unit, the wavelength conversion material will not overflow to the adjacent pixel unit through the gap to cause the problem of color crosstalk. Therefore, the micro-LED display panel of the embodiment of the present invention can achieve color output with higher color purity.

圖1A至圖1C為用以繪示本發明的一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。請參照圖1A至圖1C,本實施例的微型發光二極體顯示面板100包括一基板110、一第一遮光層120、一第二遮光層130及多個微型發光二極體140。第一遮光層120設置於基板110上,第二遮光層130設置於第一遮光層120上,且第二遮光層130暴露出部分的第一遮光層120,其中第二遮光層130定義出多個排成陣列的畫素單元U。這些微型發光二極體140配置於第一遮光層120上,其中各畫素單元U中設有這些微型發光二極體140的至少一個(圖1A至圖1C是以一個為例)。1A to 1C are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of an embodiment of the present invention. Referring to FIG. 1A to 1C, the micro-LED display panel 100 of the present embodiment includes a substrate 110, a first light shielding layer 120, a second light shielding layer 130 and a plurality of micro-LEDs 140. The first light shielding layer 120 is disposed on the substrate 110, the second light shielding layer 130 is disposed on the first light shielding layer 120, and the second light shielding layer 130 exposes a portion of the first light shielding layer 120, wherein the second light shielding layer 130 defines a plurality of pixel units U arranged in an array. The micro-LEDs 140 are disposed on the first light shielding layer 120 , wherein each pixel unit U is provided with at least one of the micro-LEDs 140 ( FIGS. 1A to 1C take one as an example).

在本實施例中,基板110例如是一電路背板,其可為玻璃或塑膠基板上設有導電線路,或矽基板上設有導電線路。In this embodiment, the substrate 110 is, for example, a circuit backplane, which may be a glass or plastic substrate with conductive circuits disposed thereon, or a silicon substrate with conductive circuits disposed thereon.

部分的第二遮光層130與第一遮光層120之間有一縫隙G,縫隙G中具有填充結構150,填充結構150的材質與第二遮光層130的材質不相同。在本實施例中,第一遮光層120與第二遮光層130的材質例如為樹脂或高分子材料,其適用於微影製程,在一些實施例中,第一遮光層120與第二遮光層130的材質例如是可吸光的樹脂材料,或者是可將光反射的樹脂材料。填充結構150例如是由透明墨水所固化形成,且填充結構150的材質例如是壓克力聚合物(acrylic polymer),或者填充結構150的材質也可以是壓克力聚合物中摻有二氧化鈦或二氧化鋯的奈米粒子所形成,以使填充結構150亦具有散射光的效果。There is a gap G between a portion of the second light shielding layer 130 and the first light shielding layer 120, and a filling structure 150 is provided in the gap G. The material of the filling structure 150 is different from the material of the second light shielding layer 130. In the present embodiment, the material of the first light shielding layer 120 and the second light shielding layer 130 is, for example, a resin or a polymer material, which is suitable for a lithography process. In some embodiments, the material of the first light shielding layer 120 and the second light shielding layer 130 is, for example, a light-absorbing resin material, or a light-reflecting resin material. The filling structure 150 is, for example, formed by solidifying transparent ink, and the material of the filling structure 150 is, for example, acrylic polymer, or the material of the filling structure 150 can also be formed by mixing titanium dioxide or zirconium dioxide nanoparticles in acrylic polymer, so that the filling structure 150 also has a light scattering effect.

在本實施例的微型發光二極體顯示面板100的製作流程中,當在基板110上設置微型發光二極體140且在基板110上以微影製程製作出第一遮光層120與第二遮光層130之後,部分的第二遮光層130與第一遮光層120之間可能會產生縫隙G這樣的缺陷。因此,如圖1A所繪示,在一個畫素單元U(如圖1A的中間那個畫素單元U)中填入填充結構150的材料。填充結構150的材料會經由縫隙G溢流至相鄰的畫素單元U(如圖1A的左邊與右邊的那兩個畫素單元U)中,且填充結構150的材料填滿了縫隙。由於填充結構150例如是由透明墨水所固化形成,所以即便經由縫隙G溢流至相鄰的畫素單元U,也不會對於相鄰的畫素單元U之色純度造成不良的影響。接著,將填充結構150的材料利用照光固化或加熱固化後,或讓填充結構150的材料自然固化後,填充結構150便能夠修補了縫隙G這樣的缺陷。如此一來,當如圖1B所繪示在一個畫素單元U(如圖1B中左邊的畫素單元U)填充波長轉換材料160時,波長轉換材料160便不會經由縫隙G溢流至鄰近的畫素單元U中。In the manufacturing process of the micro-LED display panel 100 of the present embodiment, after the micro-LED 140 is disposed on the substrate 110 and the first light shielding layer 120 and the second light shielding layer 130 are manufactured on the substrate 110 by a lithography process, a defect such as a gap G may be generated between a portion of the second light shielding layer 130 and the first light shielding layer 120. Therefore, as shown in FIG1A , the material of the filling structure 150 is filled into a pixel unit U (such as the middle pixel unit U in FIG1A ). The material of the filling structure 150 overflows into the adjacent pixel units U (such as the two pixel units U on the left and right of FIG1A ) through the gap G, and the material of the filling structure 150 fills the gap. Since the filling structure 150 is formed by, for example, solidifying transparent ink, even if it overflows to the adjacent pixel unit U through the gap G, it will not cause adverse effects on the color purity of the adjacent pixel unit U. Then, after the material of the filling structure 150 is cured by light or heat, or after the material of the filling structure 150 is naturally cured, the filling structure 150 can repair the defect of the gap G. In this way, when the wavelength conversion material 160 is filled in a pixel unit U (such as the pixel unit U on the left in FIG. 1B ) as shown in FIG. 1B , the wavelength conversion material 160 will not overflow to the adjacent pixel unit U through the gap G.

在本實施例中,至少一畫素單元U中設有波長轉換材料160,而圖1C是以左邊的那個畫素單元U中設有波長轉換材料160為例,而其他的畫素單元U中可設有平整層170。平整層170的材料可以是透明材料,或者也可以是透明材料中摻有散射粒子所形成的材料,其中散射粒子可散射微型發光二極體140所發出的光而達到較廣的視角。波長轉換材料160例如為量子點(quantum dot)材料,或是螢光粉。在本實施例中,微型發光二極體140為微型發光二極體晶片,其可分為藍光微型發光二極體140b與綠光微型發光二極體140g。此外,波長轉換材料160例如為紅色量子點材料,其可將藍光微型發光二極體140b所發出的藍光轉換為紅光,以形成紅色子畫素(即圖1C左邊的畫素單元)。而在圖1C中間的畫素單元U中,綠光微型發光二極體140g所發出的綠光穿透平整層170,而形成綠色子畫素。在圖1C右邊的畫素單元U中,藍光微型發光二極體140b所發出的藍光穿透平整層170,而形成藍色子畫素。圖1C所繪示的是微型發光二極體顯示面板100的局部剖面圖,實際上微型發光二極體顯示面板100可包含更多交替排列的紅色子畫素、綠色子畫素及藍色子畫素,進而可形成彩色畫面。In the present embodiment, at least one pixel unit U is provided with a wavelength conversion material 160, and FIG. 1C takes the pixel unit U on the left as an example in which the wavelength conversion material 160 is provided, and the other pixel units U may be provided with a flattening layer 170. The material of the flattening layer 170 may be a transparent material, or may be a material formed by mixing scattering particles in a transparent material, wherein the scattering particles may scatter the light emitted by the micro-LED 140 to achieve a wider viewing angle. The wavelength conversion material 160 is, for example, a quantum dot material, or a fluorescent powder. In the present embodiment, the micro-LED 140 is a micro-LED chip, which may be divided into a blue light micro-LED 140b and a green light micro-LED 140g. In addition, the wavelength conversion material 160 is, for example, a red quantum dot material, which can convert the blue light emitted by the blue micro-LED 140b into red light to form a red sub-pixel (i.e., the pixel unit on the left of FIG. 1C ). In the pixel unit U in the middle of FIG. 1C , the green light emitted by the green micro-LED 140g penetrates the planarization layer 170 to form a green sub-pixel. In the pixel unit U on the right of FIG. 1C , the blue light emitted by the blue micro-LED 140b penetrates the planarization layer 170 to form a blue sub-pixel. FIG. 1C shows a partial cross-sectional view of the micro-LED display panel 100. In practice, the micro-LED display panel 100 may include more red sub-pixels, green sub-pixels, and blue sub-pixels that are alternately arranged, thereby forming a color image.

在另一實施例中,在沒有填入波長轉換材料160的畫素單元U的空間中(如圖1C的中間與右邊的兩個畫素單元U),也可以不填入平整層170。也就是說,平整層170可選擇性採用,即不一定要採用平整層170。In another embodiment, in the space of the pixel unit U not filled with the wavelength conversion material 160 (such as the two pixel units U in the middle and on the right of FIG. 1C ), the planarization layer 170 may not be filled. In other words, the planarization layer 170 may be selectively used, that is, the planarization layer 170 is not necessarily used.

在本實施例中,填充結構150延伸到至少一與縫隙G相鄰的畫素單元U,且配置於至少一與縫隙G相鄰的畫素單元U中的微型發光二極體140的一周圍表面142。此外,在本實施例中,填充結構150進一步配置於至少一與縫隙G相鄰的畫素單元U中的微型發光二極體140的一頂面144,以做為微型發光二極體140上方的平坦層或保護層以供後續填入波長轉換材料160於畫素單元U的空間中。In the present embodiment, the filling structure 150 extends to at least one pixel unit U adjacent to the gap G, and is disposed on a peripheral surface 142 of the micro-LED 140 in at least one pixel unit U adjacent to the gap G. In addition, in the present embodiment, the filling structure 150 is further disposed on a top surface 144 of the micro-LED 140 in at least one pixel unit U adjacent to the gap G, so as to serve as a flat layer or a protective layer above the micro-LED 140 for subsequently filling the wavelength conversion material 160 in the space of the pixel unit U.

在本實施例的微型發光二極體顯示面板100中,由於採用填充結構150去填充縫隙G,以修補縫隙G這樣的缺陷,因此後續灌注波長轉換材料160至畫素單元U中時,波長轉換材料160便不會經由縫隙G溢流至相鄰的畫素單元U而造成色彩串擾的問題。所以,本實施例的微型發光二極體顯示面板100可以達到色純度較高的色彩輸出。In the micro-LED display panel 100 of the present embodiment, since the filling structure 150 is used to fill the gap G to repair the defect of the gap G, when the wavelength conversion material 160 is subsequently injected into the pixel unit U, the wavelength conversion material 160 will not overflow to the adjacent pixel unit U through the gap G to cause the problem of color crosstalk. Therefore, the micro-LED display panel 100 of the present embodiment can achieve color output with higher color purity.

圖2為本發明的另一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖2,本實施例的微型發光二極體顯示面板100a與圖1C的微型發光二極體顯示面板100類似,而兩者的主要差異在於,在圖1C的三個畫素單元U中,綠光微型發光二極體140g是配置在中央,而兩個藍光微型發光二極體140b是配置在兩側;然而,在本實施例中,如圖2所繪示,綠光微型發光二極體140g是配置在一側,而兩個藍光微型發光二極體140b是分別配置在中央與另一側。FIG2 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Referring to FIG2 , the micro-LED display panel 100a of the present embodiment is similar to the micro-LED display panel 100 of FIG1C , and the main difference between the two is that, in the three pixel units U of FIG1C , the green micro-LED 140g is arranged in the center, and the two blue micro-LEDs 140b are arranged on both sides; however, in the present embodiment, as shown in FIG2 , the green micro-LED 140g is arranged on one side, and the two blue micro-LEDs 140b are arranged in the center and the other side, respectively.

圖3為本發明的又一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖3,本實施例的微型發光二極體顯示面板100b與圖2的微型發光二極體顯示面板100a類似,而兩者的主要差異如下所述。在本實施例的微型發光二極體顯示面板100b中,綠色子畫素(如圖3右邊的畫素單元U)是採用藍光微型發光二極體140b搭配填充於畫素單元U中的波長轉換材料160g來形成,其中波長轉換材料160g例如為綠色量子點材料,其可將藍光微型發光二極體140b所發出的藍光轉換為綠光。也就是說,本實施例所採用的波長轉換材料160包含了波長轉換材料160r與波長轉換材料160g這兩種,其中波長轉換材料160r為紅色量子點材料,而波長轉換材料160g為綠色量子點材料。如此一來,圖3的結構亦可形成紅色子畫素、綠色子畫素及藍色子畫素,其中平整層170位於中央的畫素單元U,因此藍色子畫素例如是位於中央。FIG3 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Referring to FIG3 , the micro-LED display panel 100b of the present embodiment is similar to the micro-LED display panel 100a of FIG2 , and the main differences between the two are as follows. In the micro-LED display panel 100b of the present embodiment, the green sub-pixel (such as the pixel unit U on the right side of FIG3 ) is formed by using a blue micro-LED 140b and a wavelength conversion material 160g filled in the pixel unit U, wherein the wavelength conversion material 160g is, for example, a green quantum dot material, which can convert the blue light emitted by the blue micro-LED 140b into green light. That is, the wavelength conversion material 160 used in this embodiment includes two types of wavelength conversion material 160r and wavelength conversion material 160g, wherein the wavelength conversion material 160r is a red quantum dot material, and the wavelength conversion material 160g is a green quantum dot material. In this way, the structure of FIG. 3 can also form a red sub-pixel, a green sub-pixel, and a blue sub-pixel, wherein the planarization layer 170 is located in the central pixel unit U, so the blue sub-pixel is located in the center, for example.

圖4為本發明的再一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖4,本實施例的微型發光二極體顯示面板100c與圖3的微型發光二極體顯示面板100b類似,而兩者的主要差異如下所述。在本實施例的微型發光二極體顯示面板100c中,採用綠色量子點的波長轉換材料160g是位於圖4中央的畫素單元U中,而平整層170則是位於圖4中一側的畫素單元U中。FIG4 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Referring to FIG4 , the micro-LED display panel 100c of this embodiment is similar to the micro-LED display panel 100b of FIG3 , and the main differences between the two are as follows. In the micro-LED display panel 100c of this embodiment, the wavelength conversion material 160g using green quantum dots is located in the pixel unit U in the center of FIG4 , and the flattening layer 170 is located in the pixel unit U on one side of FIG4 .

此外,在本實施例中,至少一畫素單元U周圍的縫隙G相對於基板110的最大高度J小於此至少一畫素單元U中的微型發光二極體140相對於基板110的高度C1,且在此至少一畫素單元U中,微型發光二極體140的頂面144暴露於填充結構150之外。另外,在本實施例中,在此至少一畫素單元U中,填充結構150的上表面152齊平於微型發光二極體140的頂面144。In addition, in the present embodiment, the maximum height J of the gap G around the at least one pixel unit U relative to the substrate 110 is smaller than the height C1 of the micro-LED 140 in the at least one pixel unit U relative to the substrate 110, and in the at least one pixel unit U, the top surface 144 of the micro-LED 140 is exposed outside the filling structure 150. In addition, in the present embodiment, in the at least one pixel unit U, the upper surface 152 of the filling structure 150 is flush with the top surface 144 of the micro-LED 140.

圖5A與圖5B為用以繪示本發明的另一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。請參照圖5A與圖5B,本實施例的微型發光二極體顯示面板100d與圖1C的微型發光二極體顯示面板100c類似,而兩者的主要差異如下所述。在本實施例中,填充結構150在一畫素單元U中相對於基板110的一第一高度H1相異於填充結構150在另一畫素單元U相對於基板110的一第二高度H2。具體而言,當填入中央的畫素單元U的填充結構150的材料的流動性較差(或黏滯係數較高)時,在中央的畫素單元U中的填充結構150的材料要經由縫隙G流到兩側的畫素單元U時,會受到一些阻力,而導致填充結構150在中央的畫素單元U中相對於基板110的第一高度H1高於填充結構150在兩側的畫素單元U中相對於基板110的第二高度H2及第三高度H3的任一者。FIG. 5A and FIG. 5B are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of another embodiment of the present invention. Referring to FIG. 5A and FIG. 5B , the micro-LED display panel 100d of the present embodiment is similar to the micro-LED display panel 100c of FIG. 1C , and the main differences between the two are as follows. In the present embodiment, a first height H1 of the filling structure 150 relative to the substrate 110 in one pixel unit U is different from a second height H2 of the filling structure 150 relative to the substrate 110 in another pixel unit U. Specifically, when the fluidity of the material of the filling structure 150 filled in the central pixel unit U is poor (or the viscosity coefficient is high), the material of the filling structure 150 in the central pixel unit U will encounter some resistance when flowing to the pixel units U on both sides through the gap G, causing the first height H1 of the filling structure 150 in the central pixel unit U relative to the substrate 110 to be higher than any one of the second height H2 and the third height H3 of the filling structure 150 in the pixel units U on both sides relative to the substrate 110.

此外,在本實施例中,設有波長轉換材料160的畫素單元U(如圖5B左邊的畫素單元U)中的填充結構150相對於基板110的高度(即第二高度H2)小於未設有波長轉換材料160的畫素單元U(如圖5B中央的畫素單元U)中的填充結構150相對於基板110的高度(即第一高度H1),如此一來,可使波長轉換材料160具有較厚的厚度,而達到更佳的波長轉換效果。In addition, in the present embodiment, the height of the filling structure 150 in the pixel unit U having the wavelength conversion material 160 (such as the pixel unit U on the left side of FIG. 5B ) relative to the substrate 110 (i.e., the second height H2) is smaller than the height of the filling structure 150 in the pixel unit U not having the wavelength conversion material 160 (such as the pixel unit U in the center of FIG. 5B ) relative to the substrate 110 (i.e., the first height H1). In this way, the wavelength conversion material 160 can have a thicker thickness, thereby achieving a better wavelength conversion effect.

圖6A與圖6B為用以繪示本發明的又一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。請參照圖6A與圖6B,本實施例的微型發光二極體顯示面板100e與圖5B的微型發光二極體顯示面板100d類似,而兩者的主要差異如下所述。在圖6A的步驟中,填充結構150的材料是填充於圖6A的一側(例如左側)的畫素單元U,由於在本實施例中填充結構150的材料的流動性較差(或黏滯係數較高),因此其依序經由兩個縫隙G溢流到圖6A右邊的畫素單元U時會受到一些阻力,而使得填充結構150在右邊的畫素單元U中相對於基板110的第三高度H3’最低。另一方面,填充結構150的材料經由縫隙G溢流到圖6A中央的畫素單元U時也會受到一些阻力,而使得填充結構150在中央的畫素單元U中相對於基板110的第一高度H1’居中,而填充結構150在左邊的畫素單元U中相對於基板110的第二高度H2’最高。簡言之,第二高度H2’大於第一高度H1’,且第一高度H1’大於第三高度H3’。也就是說,連續分布的多個填充結構150的高度由左而右呈階梯式地下降。然而,在其他實施例中,連續分布的多個填充結構150的高度由左而右也可以是呈階梯式地上升。6A and 6B are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of another embodiment of the present invention. Referring to FIG. 6A and FIG. 6B , the micro-LED display panel 100e of this embodiment is similar to the micro-LED display panel 100d of FIG. 5B , and the main differences between the two are as follows. In the step of FIG. 6A , the material of the filling structure 150 is filled in the pixel unit U on one side (e.g., the left side) of FIG. 6A . Since the material of the filling structure 150 has poor fluidity (or high viscosity coefficient) in this embodiment, it will encounter some resistance when it overflows through the two gaps G to the pixel unit U on the right side of FIG. 6A , so that the third height H3′ of the filling structure 150 relative to the substrate 110 in the pixel unit U on the right side is the lowest. On the other hand, the material of the filling structure 150 will also encounter some resistance when it overflows through the gap G to the pixel unit U in the center of FIG. 6A , so that the first height H1′ of the filling structure 150 relative to the substrate 110 in the center pixel unit U is centered, and the second height H2′ of the filling structure 150 relative to the substrate 110 in the pixel unit U on the left side is the highest. In short, the second height H2' is greater than the first height H1', and the first height H1' is greater than the third height H3'. In other words, the heights of the plurality of continuously distributed filling structures 150 decrease from left to right in a step-like manner. However, in other embodiments, the heights of the plurality of continuously distributed filling structures 150 may also increase from left to right in a step-like manner.

在圖5A至圖6B的兩個實施例中,於各畫素單元U中的填充結構150的高度不同,取決於從哪個畫素單元U作填充結構150的材料的填充,而距離填充位置越遠的畫素單元U,填充結構150的高度越低。In the two embodiments of FIG. 5A to FIG. 6B , the height of the filling structure 150 in each pixel unit U is different, depending on which pixel unit U the material of the filling structure 150 is filled from, and the farther the pixel unit U is from the filling position, the lower the height of the filling structure 150 .

圖7是本發明的再一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖7,本實施例的微型發光二極體顯示面板100f類似於圖1C的微型發光二極體顯示面板100,而兩者的主要差異如下所述。在本實施例的微型發光二極體顯示面板100f中,至少一畫素單元U周圍的縫隙相對於基板110的最大高度(例如為較大的縫隙G1相對於基板110的高度J1)大於此至少一畫素單元U中的微型發光二極體(如左邊的微型發光二極體140)相對於基板110的高度C1,且此至少一畫素單元U中的填充結構150覆蓋此至少一畫素單元U中的微型發光二極體140的頂面144。在本實施例中,此至少一畫素單元U中的微型發光二極體140相對於基板110的高度C1與此至少一畫素單元U中的填充結構150相對於基板110的高度(在本實施例中例如等於第一高度H1)的比值大於0.8且小於1,例如是0.85或0.9。另一方面,較小的縫隙G2相對於基板110的高度J2小於高度J1。Fig. 7 is a partial cross-sectional schematic diagram of a micro-LED display panel according to another embodiment of the present invention. Referring to Fig. 7, the micro-LED display panel 100f of this embodiment is similar to the micro-LED display panel 100 of Fig. 1C, and the main differences between the two are as follows. In the micro-LED display panel 100f of the present embodiment, the maximum height of the gap around at least one pixel unit U relative to the substrate 110 (for example, the height J1 of the larger gap G1 relative to the substrate 110) is greater than the height C1 of the micro-LED in the at least one pixel unit U (such as the micro-LED 140 on the left) relative to the substrate 110, and the filling structure 150 in the at least one pixel unit U covers the top surface 144 of the micro-LED 140 in the at least one pixel unit U. In the present embodiment, the ratio of the height C1 of the micro-LED 140 in the at least one pixel unit U relative to the substrate 110 to the height (equal to the first height H1 in the present embodiment, for example) of the filling structure 150 in the at least one pixel unit U relative to the substrate 110 is greater than 0.8 and less than 1, for example, 0.85 or 0.9. On the other hand, the height J2 of the smaller gap G2 relative to the substrate 110 is smaller than the height J1.

此外,在本實施例中,部分的第二遮光層130與第一遮光層120之間的縫隙G為多個不同高度的縫隙(如縫隙G1與G2),且延伸至相鄰畫素單元U中的填充結構150相對於基板110的高度(在本實施例中例如等於第一高度H1)大於最大高度的縫隙G1相對於基板110的高度J1。In addition, in the present embodiment, the gap G between a portion of the second light shielding layer 130 and the first light shielding layer 120 is a plurality of gaps of different heights (such as gaps G1 and G2), and the height of the filling structure 150 extending to the adjacent pixel unit U relative to the substrate 110 (in the present embodiment, for example, equal to the first height H1) is greater than the height J1 of the maximum height of the gap G1 relative to the substrate 110.

圖8是本發明的另一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖8,本實施例的微型發光二極體顯示面板100g類似於圖7的微型發光二極體顯示面板100f,而兩者的主要差異如下所述。相較於圖7所採用的填充結構150的材料,本實施例的填充結構150的材料在填充時的流動性較差(或黏滯係數較高),因此填充結構150在中間的畫素單元U中相對於基板110的第一高度H1最高,而延伸至相鄰的其他畫素單元U中的填充結構150相對於基板110的高度(如第二高度H2與第三高度H3)與其與中間的畫素單元U之間的縫隙G的大小呈正相關。舉例而言,縫隙G1相對於基板110的高度J1較大,則縫隙G1旁的相鄰畫素單元U中的填充結構150相對於基板110的高度(即第二高度H2)就會較大,相較之下,縫隙G2相對於基板110的高度J2較小,則縫隙G2旁的相鄰畫素單元U中的填充結構150相對於基板110的高度(即第三高度H3)就會較小。FIG8 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Referring to FIG8 , the micro-LED display panel 100g of the present embodiment is similar to the micro-LED display panel 100f of FIG7 , and the main differences between the two are as follows. Compared with the material of the filling structure 150 used in FIG7 , the material of the filling structure 150 of the present embodiment has poor fluidity (or a higher viscosity coefficient) during filling, so the first height H1 of the filling structure 150 relative to the substrate 110 in the middle pixel unit U is the highest, and the height of the filling structure 150 extending to other adjacent pixel units U relative to the substrate 110 (such as the second height H2 and the third height H3) is positively correlated with the size of the gap G between the filling structure 150 and the middle pixel unit U. For example, if the height J1 of the gap G1 relative to the substrate 110 is larger, then the height of the filling structure 150 in the adjacent pixel unit U next to the gap G1 relative to the substrate 110 (i.e., the second height H2) will be larger. In contrast, if the height J2 of the gap G2 relative to the substrate 110 is smaller, then the height of the filling structure 150 in the adjacent pixel unit U next to the gap G2 relative to the substrate 110 (i.e., the third height H3) will be smaller.

圖9為本發明的又一實施例的微型發光二極體顯示面板的局部剖面示意圖。請參照圖9,本實施例的微型發光二極體顯示面板100h與圖5B的微型發光二極體顯示面板100d類似,兩者設有波長轉換材料160的畫素單元U中的填充結構150相對於基板110的高度(如第二高度H2”)都是小於未設有波長轉換材料的畫素單元U中的填充結構150相對於基板110的高度(例如第一高度H1”或第三高度H3”的任一者)。此外,更進一步的是,在設有波長轉換材料160(例如為紅色量子點材料)的畫素單元U中的填充結構150沒有覆蓋微型發光二極體140的頂面144,如此可以使波長轉換材料160更厚,而更進一步提升波長轉換效率與色純度。在本實施例中,此畫素單元U周圍的縫隙G1相對於基板110的高度J1小於微型發光二極體140相對於基板110的高度C1,則填充結構150在此畫素單元U中不會覆蓋微型發光二極體140的頂面144。然而,在其他實施例中,當高度J1大於高度C1,則在此畫素單元U中的填充結構150會覆蓋微型發光二極體140的頂面144。FIG9 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Referring to FIG9 , the micro-LED display panel 100h of the present embodiment is similar to the micro-LED display panel 100d of FIG5B , and the height of the filling structure 150 in the pixel unit U provided with the wavelength conversion material 160 relative to the substrate 110 (such as the second height H2”) is smaller than the height of the filling structure 150 in the pixel unit U not provided with the wavelength conversion material relative to the substrate 110 (such as the first height H1” or the third height H3”). Furthermore, in the pixel unit U provided with the wavelength conversion material 160 (such as the red quantum dot material), the filling structure 150 is not The top surface 144 of the micro-LED 140 is covered by the filling structure 150, so that the wavelength conversion material 160 can be thicker, thereby further improving the wavelength conversion efficiency and color purity. In this embodiment, the height J1 of the gap G1 around the pixel unit U relative to the substrate 110 is less than the height C1 of the micro-LED 140 relative to the substrate 110, and the filling structure 150 in the pixel unit U will not cover the top surface 144 of the micro-LED 140. However, in other embodiments, when the height J1 is greater than the height C1, the filling structure 150 in the pixel unit U will cover the top surface 144 of the micro-LED 140.

綜上所述,在本發明的實施例的微型發光二極體顯示面板中,由於採用填充結構去填充縫隙,以修補縫隙這樣的缺陷,因此後續灌注波長轉換材料至畫素單元中時,波長轉換材料便不會經由縫隙溢流至相鄰的畫素單元而造成色彩串擾的問題。所以,本發明的實施例的微型發光二極體顯示面板可以達到色純度較高的色彩輸出。In summary, in the micro-LED display panel of the embodiment of the present invention, since the filling structure is used to fill the gap to repair the defect of the gap, when the wavelength conversion material is subsequently injected into the pixel unit, the wavelength conversion material will not overflow to the adjacent pixel unit through the gap to cause the problem of color crosstalk. Therefore, the micro-LED display panel of the embodiment of the present invention can achieve color output with higher color purity.

100、100a、100b、100c、100d、100e、100f、100g、100h:微型發光二極體顯示面板 110:基板 120:第一遮光層 130:第二遮光層 140:微型發光二極體 140b:藍光微型發光二極體 140g:綠光微型發光二極體 142:周圍表面 144:頂面 150:填充結構 152:上表面 160、160g、160r:波長轉換材料 170:平整層 C1、J1、J2:高度 G、G1、G2:縫隙 H1、H1’、H1”:第一高度 H2、H2’、H2”:第二高度 H3、H3’、H3”:第三高度 J:最大高度 U:畫素單元100, 100a, 100b, 100c, 100d, 100e, 100f, 100g, 100h: micro-LED display panel 110: substrate 120: first light shielding layer 130: second light shielding layer 140: micro-LED 140b: blue light micro-LED 140g: green light micro-LED 142: surrounding surface 144: top surface 150: filling structure 152: upper surface 160, 160g, 160r: wavelength conversion material 170: flat layer C1, J1, J2: height G, G1, G2: gap H1, H1', H1": first height H2, H2’, H2”: Second height H3, H3’, H3”: Third height J: Maximum height U: Pixel unit

圖1A至圖1C為用以繪示本發明的一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。 圖2為本發明的另一實施例的微型發光二極體顯示面板的局部剖面示意圖。 圖3為本發明的又一實施例的微型發光二極體顯示面板的局部剖面示意圖。 圖4為本發明的再一實施例的微型發光二極體顯示面板的局部剖面示意圖。 圖5A與圖5B為用以繪示本發明的另一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。 圖6A與圖6B為用以繪示本發明的又一實施例的微型發光二極體顯示面板的製作流程的局部剖面示意圖。 圖7是本發明的再一實施例的微型發光二極體顯示面板的局部剖面示意圖。 圖8是本發明的另一實施例的微型發光二極體顯示面板的局部剖面示意圖。 圖9為本發明的又一實施例的微型發光二極體顯示面板的局部剖面示意圖。 Figures 1A to 1C are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of an embodiment of the present invention. Figure 2 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Figure 3 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Figure 4 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. Figures 5A and 5B are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of another embodiment of the present invention. Figures 6A and 6B are partial cross-sectional schematic diagrams for illustrating the manufacturing process of a micro-LED display panel of another embodiment of the present invention. FIG. 7 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. FIG. 8 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention. FIG. 9 is a partial cross-sectional schematic diagram of a micro-LED display panel of another embodiment of the present invention.

100:微型發光二極體顯示面板 100: Micro-LED display panel

110:基板 110:Substrate

120:第一遮光層 120: First light shielding layer

130:第二遮光層 130: Second light shielding layer

140:微型發光二極體 140: Micro LED

140b:藍光微型發光二極體 140b: Blue light micro diode

140g:綠光微型發光二極體 140g: Green light micro diode

142:周圍表面 142:Surrounding surface

144:頂面 144: Top

150:填充結構 150: Filling structure

160:波長轉換材料 160: Wavelength conversion material

170:平整層 170: Leveling layer

G:縫隙 G: Gap

U:畫素單元 U: Pixel unit

Claims (11)

一種微型發光二極體顯示面板,包括: 一基板; 一第一遮光層,設置於該基板上; 一第二遮光層,設置於該第一遮光層上,其中該第二遮光層定義出多個排成陣列的畫素單元;以及 多個微型發光二極體,配置於該第一遮光層上,其中各該畫素單元中設有該些微型發光二極體的至少一個, 其中,部分的該第二遮光層與該第一遮光層之間有一縫隙,該縫隙中具有填充結構,該填充結構的材質與該第二遮光層的材質不相同。 A micro-LED display panel comprises: a substrate; a first light shielding layer disposed on the substrate; a second light shielding layer disposed on the first light shielding layer, wherein the second light shielding layer defines a plurality of pixel units arranged in an array; and a plurality of micro-LEDs disposed on the first light shielding layer, wherein each pixel unit is provided with at least one of the micro-LEDs, wherein a gap is provided between a portion of the second light shielding layer and the first light shielding layer, and the gap has a filling structure, and the material of the filling structure is different from the material of the second light shielding layer. 如請求項1所述的微型發光二極體顯示面板,其中該填充結構延伸到至少一與該縫隙相鄰的畫素單元,且配置於該至少一與該縫隙相鄰的畫素單元中的該微型發光二極體的一周圍表面。A micro-luminescent diode display panel as described in claim 1, wherein the filling structure extends to at least one pixel unit adjacent to the gap, and is arranged on a peripheral surface of the micro-luminescent diode in the at least one pixel unit adjacent to the gap. 如請求項2所述的微型發光二極體顯示面板,其中該填充結構進一步配置於該至少一與該縫隙相鄰的畫素單元中的該微型發光二極體的一頂面。The micro-luminescent diode display panel as described in claim 2, wherein the filling structure is further configured on a top surface of the micro-luminescent diode in at least one pixel unit adjacent to the gap. 如請求項2所述的微型發光二極體顯示面板,其中該填充結構在一該畫素單元中相對於該基板的一第一高度相異於該填充結構在另一該畫素單元中相對於該基板的的一第二高度。A micro-LED display panel as described in claim 2, wherein a first height of the filling structure relative to the substrate in one pixel unit is different from a second height of the filling structure relative to the substrate in another pixel unit. 如請求項1所述的微型發光二極體顯示面板,其中該至少一畫素單元中設有一波長轉換材料。A micro-LED display panel as described in claim 1, wherein a wavelength conversion material is provided in at least one pixel unit. 如請求項5所述的微型發光二極體顯示面板,其中設有該波長轉換材料的該畫素單元中的該填充結構相對於該基板的高度小於未設有該波長轉換材料的該畫素單元中的該填充結構相對於該基板的高度。In the micro-LED display panel as described in claim 5, a height of the filling structure in the pixel unit provided with the wavelength conversion material relative to the substrate is smaller than a height of the filling structure in the pixel unit not provided with the wavelength conversion material relative to the substrate. 如請求項1所述的微型發光二極體顯示面板,其中部分的該第二遮光層與該第一遮光層之間的該縫隙為多個不同高度的縫隙,且延伸至相鄰畫素單元中的該填充結構相對於該基板的高度大於最大高度的縫隙相對於該基板的高度。The micro-LED display panel as described in claim 1, wherein the gap between part of the second light-shielding layer and the first light-shielding layer is a plurality of gaps of different heights, and the height of the filling structure extending to the adjacent pixel unit relative to the substrate is greater than the height of the maximum gap relative to the substrate. 如請求項1所述的微型發光二極體顯示面板,其中該至少一畫素單元周圍的縫隙相對於該基板的最大高度大於該至少一畫素單元中的該微型發光二極體相對於該基板的高度,且該至少一畫素單元中的該填充結構覆蓋該至少一畫素單元中的該微型發光二極體的一頂面。A micro-LED display panel as described in claim 1, wherein the maximum height of the gap around the at least one pixel unit relative to the substrate is greater than the height of the micro-LED in the at least one pixel unit relative to the substrate, and the filling structure in the at least one pixel unit covers a top surface of the micro-LED in the at least one pixel unit. 如請求項8所述的微型發光二極體顯示面板,其中該至少一畫素單元中的該微型發光二極體相對於該基板的高度與該至少一畫素單元中的該填充結構相對於該基板的高度的比值大於0.8且小於1。A micro-LED display panel as described in claim 8, wherein a ratio of a height of the micro-LED in at least one pixel unit relative to the substrate to a height of the filling structure in at least one pixel unit relative to the substrate is greater than 0.8 and less than 1. 如請求項1所述的微型發光二極體顯示面板,其中該至少一畫素單元周圍的縫隙相對於該基板的最大高度小於該至少一畫素單元中的該微型發光二極體相對於該基板的高度,且在該至少一畫素單元中,該微型發光二極體的一頂面暴露於該填充結構之外。A micro-LED display panel as described in claim 1, wherein the maximum height of the gap around the at least one pixel unit relative to the substrate is smaller than the height of the micro-LED in the at least one pixel unit relative to the substrate, and in the at least one pixel unit, a top surface of the micro-LED is exposed outside the filling structure. 如請求項10所述的微型發光二極體顯示面板,其中在該至少一畫素單元中,該填充結構的二上表面齊平於該微型發光二極體的一頂面。A micro-luminescent diode display panel as described in claim 10, wherein in the at least one pixel unit, the two upper surfaces of the filling structure are flush with a top surface of the micro-luminescent diode.
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