TWI889013B - Electronic package and manufacturing method thereof - Google Patents
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Abstract
Description
本發明涉及一種半導體封裝製程,尤指一種可避免銲錫未潤溼的電子封裝件及其製法。 The present invention relates to a semiconductor packaging process, in particular to an electronic packaging component and a manufacturing method thereof that can avoid solder non-wetting.
隨著科技的演進,電子產品需求趨勢朝向高密度線路/高傳輸速度/高疊層數/大尺寸設計之高階產品邁進。該些產品隨著晶片尺寸加大、接點(I/O)數增多,而對熱反應更為敏感,故在封裝作業中的熱製程,如回銲(reflow)製程,極易因各材料之間不同的熱膨脹係數(Coefficient of thermal expansion,簡稱CTE)而使整體結構發生翹曲(warpage),且也會因結構內部之熱應力集中之情況而發生信賴性不良之問題。 With the development of technology, the demand for electronic products is moving towards high-end products with high-density circuits, high transmission speeds, high stacking numbers, and large-size designs. As the chip size and number of contacts (I/O) increase, these products are more sensitive to heat. Therefore, the thermal processes in the packaging operation, such as the reflow process, are very likely to cause the overall structure to warp due to the different coefficients of thermal expansion (CTE) between the materials, and may also cause poor reliability due to the concentration of thermal stress inside the structure.
目前雷射輔助接合(Laser Assisted Bonding,簡稱LAB)製程可選擇性局部加熱,且具備快速升溫的特性,故可大幅縮減熱製程之時間,因而能降低結構內部的熱應力集中之情況,且藉由控制雷射波長及局部加熱的特性,能大幅縮減翹曲之程度。 The current Laser Assisted Bonding (LAB) process can selectively heat locally and has the characteristics of rapid temperature rise, so it can greatly shorten the heating process time, thereby reducing the concentration of thermal stress inside the structure, and by controlling the laser wavelength and the characteristics of local heating, the degree of warping can be greatly reduced.
圖1為習知半導體封裝件1之示意圖。如圖1所示,該半導體封裝件1係於一具有介電層100與佈線層101之基板結構10上以覆晶
方式(藉由銲錫凸塊13)設置半導體晶片11,再以封裝層12包覆該半導體晶片11。之後,藉由LAB製程將該基板結構10下側之導電凸塊14、15透過複數銲錫材料16、17接置於一電路板1a之接點19上。
FIG1 is a schematic diagram of a
然而,於進行LAB製程時,雷射L之熱能只能穿透該半導體晶片11而無法穿透該封裝層12,導致該封裝層12下方之導電凸塊14之熱能不足,因而造成該處之銲錫材料16發生未濕潤(non-wetting)之問題。
However, during the LAB process, the heat energy of the laser L can only penetrate the
因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the above-mentioned problems of knowledge and technology has become an urgent issue to be solved.
鑑於上述習知技術之種種缺失,本發明提供一種電子封裝件,包括:線路結構,具有相對之第一側與第二側;電子元件,配置於該線路結構之該第一側上;導電凸塊,配置於該線路結構之該第二側上;封裝層,具有相對之第一表面及第二表面,並以該第二表面配置於該線路結構之該第一側上以包覆該電子元件;以及凹凸結構,形成於該封裝層之該第一表面,並定義有對應至少一該導電凸塊之至少一高吸熱區域。 In view of the various deficiencies of the above-mentioned prior art, the present invention provides an electronic package, comprising: a circuit structure having a first side and a second side opposite to each other; an electronic component disposed on the first side of the circuit structure; a conductive bump disposed on the second side of the circuit structure; a packaging layer having a first surface and a second surface opposite to each other, and the second surface is disposed on the first side of the circuit structure to cover the electronic component; and a concave-convex structure formed on the first surface of the packaging layer and defining at least one high heat absorption area corresponding to at least one of the conductive bumps.
如前述之電子封裝件中,該高吸熱區域之表面粗糙度的範圍在5至10之間。 As mentioned above, in the electronic package, the surface roughness of the high heat absorption area ranges from 5 to 10.
如前述之電子封裝件中,該凹凸結構具有複數凹部。 As in the aforementioned electronic package, the concave-convex structure has a plurality of concave portions.
如前述之電子封裝件中,各該複數凹部之深寬比小於或等於3:1。 In the aforementioned electronic package, the depth-to-width ratio of each of the plurality of recesses is less than or equal to 3:1.
如前述之電子封裝件中,任二相鄰的該複數凹部的邊緣最短距離大於或等於各該複數凹部之寬度。 As in the aforementioned electronic package, the shortest distance between the edges of any two adjacent multiple recesses is greater than or equal to the width of each of the multiple recesses.
如前述之電子封裝件中,各該複數凹部之寬度小於10μm。 In the aforementioned electronic package, the width of each of the plurality of recesses is less than 10μm.
如前述之電子封裝件中,於該封裝層之厚度小於200μm時,各該複數凹部之深度小於該封裝層之厚度的1/3。 In the aforementioned electronic package, when the thickness of the packaging layer is less than 200 μm, the depth of each of the plurality of recesses is less than 1/3 of the thickness of the packaging layer.
如前述之電子封裝件中,單一該高吸熱區域對應單一該導電凸塊,且該高吸熱區域的半徑大於或等於該導電凸塊的半徑的2倍。 In the aforementioned electronic package, a single high heat absorption area corresponds to a single conductive bump, and the radius of the high heat absorption area is greater than or equal to twice the radius of the conductive bump.
如前述之電子封裝件中,複數該高吸熱區域對應單一該導電凸塊。 As in the aforementioned electronic package, a plurality of high heat absorption areas correspond to a single conductive bump.
如前述之電子封裝件中,內切複數該高吸熱區域之圓的半徑大於或等於該導電凸塊的半徑的2倍。 In the aforementioned electronic package, the radius of the circle inscribed in the plurality of high heat absorption regions is greater than or equal to twice the radius of the conductive bump.
如前述之電子封裝件中,單一該高吸熱區域對應複數該導電凸塊。 As in the aforementioned electronic package, a single high heat absorption area corresponds to a plurality of conductive bumps.
如前述之電子封裝件中,該高吸熱區域的半徑大於或等於內切複數該導電凸塊之圓的半徑的2倍。 In the aforementioned electronic package, the radius of the high heat absorption area is greater than or equal to twice the radius of the circle inscribed within the plurality of the conductive bumps.
如前述之電子封裝件中,位於該封裝層之角落處之該高吸熱區域的表面粗糙度大於非位於該封裝層之該角落處之該高吸熱區域的表面粗糙度。 In the aforementioned electronic package, the surface roughness of the high heat absorption area located at the corner of the packaging layer is greater than the surface roughness of the high heat absorption area not located at the corner of the packaging layer.
如前述之電子封裝件中,單一該高吸熱區域之表面粗糙度自其區域中心朝外逐漸變小。 As in the aforementioned electronic package, the surface roughness of a single high heat absorption area gradually decreases from the center of the area toward the outside.
本發明復提供一種電子封裝件之製法,包括:提供具有相對之第一側與第二側之一線路結構;將電子元件配置於該線路結構之該第一 側上;將具有相對之第一表面及第二表面之封裝層以該第二表面配置於該線路結構之該第一側上,以包覆該電子元件;形成凹凸結構於該封裝層之該第一表面;以及將導電凸塊配置於該線路結構之該第二側上,並使該凹凸結構定義有對應至少一該導電凸塊之至少一高吸熱區域。 The present invention further provides a method for manufacturing an electronic package, comprising: providing a circuit structure having a first side and a second side opposite to each other; disposing an electronic component on the first side of the circuit structure; disposing a packaging layer having a first surface and a second surface opposite to each other on the first side of the circuit structure with the second surface to cover the electronic component; forming a concave-convex structure on the first surface of the packaging layer; and disposing a conductive bump on the second side of the circuit structure, and making the concave-convex structure define at least one high heat absorption area corresponding to at least one of the conductive bumps.
如前述之電子封裝件之製法中,以蝕刻方式於該封裝層之該第一表面上形成該凹凸結構。 In the aforementioned method for manufacturing an electronic package, the concave-convex structure is formed on the first surface of the package layer by etching.
如前述之電子封裝件之製法中,該線路結構包含扇出型重佈線路層。 In the aforementioned method for manufacturing an electronic package, the circuit structure includes a fan-out type redistribution circuit layer.
如前述之電子封裝件之製法中,該高吸熱區域之表面粗糙度的範圍在5至10之間。 In the aforementioned method for manufacturing electronic packages, the surface roughness of the high heat absorption area ranges from 5 to 10.
如前述之電子封裝件之製法中,該凹凸結構具有複數凹部。 In the aforementioned method for manufacturing electronic packages, the concave-convex structure has a plurality of concave portions.
如前述之電子封裝件之製法中,各該複數凹部之深寬比小於或等於3:1,且任二相鄰的該複數凹部的邊緣最短距離大於或等於各該複數凹部之寬度。 In the aforementioned method for manufacturing electronic packaging, the depth-to-width ratio of each of the plurality of recesses is less than or equal to 3:1, and the shortest distance between the edges of any two adjacent plurality of recesses is greater than or equal to the width of each of the plurality of recesses.
如前述之電子封裝件之製法中,單一該高吸熱區域對應單一該導電凸塊,且該高吸熱區域的半徑大於或等於該導電凸塊的半徑的2倍。 In the aforementioned method for manufacturing electronic packages, a single high heat absorption region corresponds to a single conductive bump, and the radius of the high heat absorption region is greater than or equal to twice the radius of the conductive bump.
如前述之電子封裝件之製法中,複數該高吸熱區域對應單一該導電凸塊。 In the aforementioned method for manufacturing electronic packages, a plurality of high heat absorption regions correspond to a single conductive bump.
如前述之電子封裝件之製法中,單一該高吸熱區域對應複數該導電凸塊。 In the aforementioned method for manufacturing electronic packages, a single high heat absorption area corresponds to a plurality of conductive bumps.
綜上所述,本發明之電子封裝件及其製法透過於封裝層上形成凹凸結構,可減少雷射光的反射並增加雷射光的吸收,進而增加封裝層 的導熱效率,且高吸能區域的表面粗糙度越高,雷射能量的穿透率就越高,從而能避免封裝層下方導電凸塊與銲錫材料發生未濕潤之問題。本發明之電子封裝件及其製法可令LAB製程應用於易於翹曲之無核心層(coreless)形式之封裝基板時,有著改善熱應力問題之最佳效益。 In summary, the electronic package and its manufacturing method of the present invention can reduce the reflection of laser light and increase the absorption of laser light by forming a concave-convex structure on the packaging layer, thereby increasing the thermal conductivity of the packaging layer. The higher the surface roughness of the high energy absorption area, the higher the penetration rate of the laser energy, thereby avoiding the problem of non-wetting between the conductive bump and the solder material under the packaging layer. The electronic package and its manufacturing method of the present invention can enable the LAB process to be applied to a coreless packaging substrate that is easy to warp, and has the best effect of improving thermal stress problems.
1:半導體封裝件 1:Semiconductor packages
1a,3a:電路板 1a,3a: Circuit board
10:基板結構 10:Substrate structure
100:介電層 100: Dielectric layer
101,201:佈線層 101,201: Wiring layer
11:半導體晶片 11: Semiconductor chip
12,22:封裝層 12,22: Packaging layer
13:銲錫凸塊 13: Solder bumps
14,15,24:導電凸塊 14,15,24: Conductive bumps
16,17,25:銲錫材料 16,17,25: Soldering materials
19,30:接點 19,30: Contact
2:電子封裝件 2: Electronic packaging components
20:線路結構 20:Line structure
20a:第一側 20a: First side
20b:第二側 20b: Second side
200:絕緣層 200: Insulation layer
21:電子元件 21: Electronic components
21a:作用面 21a: Action surface
21b:非作用面 21b: Non-active surface
211:導電體 211: Conductor
212:絕緣材 212: Insulation material
22a:第一表面 22a: First surface
22b:第二表面 22b: Second surface
23:凹凸結構 23: Concave and convex structure
231,231’,231”:凹部 231,231’,231”: concave part
9:支撐板 9: Support plate
A:寬度 A: Width
B:邊緣最短距離 B: Shortest distance to edge
C,C’:圓 C,C’:circle
H,H’,H”:深度 H,H’,H”: Depth
L:雷射 L:Laser
X,X’:高吸熱區域 X, X’: high heat absorption area
圖1為習知半導體封裝件之剖面示意圖。 Figure 1 is a schematic cross-sectional view of a conventional semiconductor package.
圖2A至圖2E為本發明電子封裝件之製法的剖面示意圖。 Figures 2A to 2E are cross-sectional schematic diagrams of the manufacturing method of the electronic package of the present invention.
圖3A及圖3B為本發明電子封裝件中凹凸結構之不同實施例之剖面示意圖。 Figures 3A and 3B are cross-sectional schematic diagrams of different embodiments of the concave-convex structure in the electronic package of the present invention.
圖3C為圖2E之頂面示意圖。 Figure 3C is a schematic diagram of the top surface of Figure 2E.
圖3D至圖3G為本發明電子封裝件中高吸熱區域與導電凸塊之不同對應情形之示意圖。 Figures 3D to 3G are schematic diagrams of different correspondences between the high heat absorption area and the conductive bump in the electronic package of the present invention.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following is a specific and concrete example to illustrate the implementation of the present invention. People familiar with this technology can easily understand other advantages and effects of the present invention from the content disclosed in this manual.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功 效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. depicted in the drawings attached to this specification are only used to match the contents disclosed in the specification for understanding and reading by people familiar with this technology, and are not used to limit the conditions under which the present invention can be implemented. Therefore, they have no substantial technical significance. Any modification of the structure, change of the proportion relationship or adjustment of the size should still fall within the scope of the technical content disclosed by the present invention without affecting the effect and purpose that can be achieved by the present invention. At the same time, the terms such as "above", "first", "second" and "one" used in this specification are only used to facilitate the clarity of the description, and are not used to limit the scope of implementation of the present invention. Changes or adjustments to their relative relationships, without substantially changing the technical content, should also be regarded as the scope of implementation of the present invention.
圖2A至圖2E為本發明電子封裝件2之製法的剖面示意圖。
Figures 2A to 2E are cross-sectional schematic diagrams of the manufacturing method of the
如圖2A所示,於一支撐板9上配置一線路結構20,再於該線路結構20上設置至少一電子元件21。
As shown in FIG. 2A , a
於本實施例中,該支撐板9例如為半導體材質(如矽或玻璃)之板體,且該線路結構20例如為具有核心層之封裝基板、無核心層(coreless)形式之封裝基板、具導電矽穿孔(Through-silicon via,簡稱TSV)之矽中介板(Through Silicon interposer,簡稱TSI)或其它板型,其具有相對之第一側20a與第二側20b,以令該線路結構20以其第二側20b結合至該支撐板9上。例如,該線路結構20包含至少一絕緣層200及至少一結合該絕緣層200之佈線層201,如至少一扇出(fan out)型重佈線路層(redistribution layer,簡稱RDL)。應可理解地,該線路結構20亦可為其它承載晶片之基材,如導線架(lead frame)、晶圓(wafer)或其它具有金屬佈線(routing)之板體等,並不限於上述。
In this embodiment, the
於本實施例中,該電子元件21為主動元件、被動元件或其二者組合等,其中,該主動元件例如為半導體晶片,且該被動元件例如為電阻、電容及電感。於本實施例中,該電子元件21為半導體晶片,其具有相對之作用面21a與非作用面21b,該作用面21a具有複數電極墊,以藉由
複數如銲錫材料、金屬柱(pillar)或其組合之導電體211利用覆晶方式設於該線路結構20之第一側20a上並電性連接佈線層201,且以如底膠或非導電底部填充薄膜(NCF)等絕緣材212包覆該些導電體211;或者,該電子元件21可藉由複數銲線(圖未示)以打線方式電性連接該線路結構20之佈線層201;亦或,該電子元件21可直接接觸該線路結構20之佈線層201。因此,有關電子元件21電性連接線路結構20之方式繁多,並不限於上述。
In this embodiment, the
如圖2B所示,於該線路結構20之第一側20a上形成一封裝層22,以令該封裝層22包覆該電子元件21。
As shown in FIG. 2B , a
在本實施例中,該封裝層22具有相對之第一表面22a及第二表面22b,並以該第二表面22b配置於該線路結構20之該第一側20a上。另外,該封裝層22可以為絕緣材,如聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、如環氧樹脂(epoxy)之封裝膠體或封裝材(molding compound)。
In this embodiment, the
於一實施例中,可選擇地藉由整平製程,使該封裝層22之第一表面22a齊平該電子元件21之非作用面21b,以令該電子元件21之非作用面21b外露於該封裝層22之第一表面22a。例如,該整平製程藉由研磨方式,移除該電子元件21之部分材質與該封裝層22之部分材質。應可理解地,該整平製程也可省略,以令該封裝層22包覆該電子元件21之非作用面21b。
In one embodiment, the
如圖2C所示,於該封裝層22之該第一表面22a上形成凹凸結構23。
As shown in FIG. 2C , a concave-
在本實施例中,以電漿(Plasma)蝕刻方式移除該封裝層22之該第一表面22a的部分材質以形成該凹凸結構23。如圖3A所示,凹凸結構23具有複數凹部231,各凹部231分別具有深度H及寬度A,且任二相鄰的凹部231之間具有邊緣最短距離B。
In this embodiment, plasma etching is used to remove part of the material of the
於一實施例中,深度H及寬度A之間的深寬比可小於或等於3:1。 In one embodiment, the aspect ratio between the depth H and the width A may be less than or equal to 3:1.
於一實施例中,任二相鄰的凹部231的邊緣最短距離B大於或等於各凹部231的寬度A。
In one embodiment, the shortest distance B between the edges of any two
於一實施例中,各凹部231之寬度A小於10μm。
In one embodiment, the width A of each
於一實施例中,各凹部231之深度H可由封裝層22之厚度來決定,例如於封裝層22之厚度小於200μm時,各凹部231之深度H小於該封裝層22之厚度的1/3。
In one embodiment, the depth H of each
如圖2D所示,移除該支撐板9,以露出該線路結構20之第二側20b,接著於該線路結構20之第二側20b上配置複數導電凸塊24,並沿如圖2C所示之切割路徑Y進行切單製程,以獲取本發明之電子封裝件2,其中,該些導電凸塊24電性連接該佈線層201,以令該電子元件21電性導通至該些導電凸塊24。
As shown in FIG. 2D , the
在本實施例中,凹凸結構23定義有至少一高吸熱區域X,高吸熱區域X由第一表面22a朝第二表面22b的方向垂直投影而可對應至少一導電凸塊24,且該垂直投影不會經過電子元件21。應可理解地,若封裝層22未經整平製程,此時凹凸結構23也會形成於電子元件21正上方的
封裝層22,使得電子元件21正上方的封裝層22也能定義出高吸熱區域X。
In this embodiment, the concave-
於一實施例中,高吸熱區域X之表面粗糙度Ra的範圍在5至10之間。另外,如圖3A所示,單一高吸熱區域X之表面粗糙度Ra可一致。如圖3B所示,單一高吸熱區域X之表面粗糙度Ra可不一致,高吸熱區域X之表面粗糙度Ra自其區域中心朝外逐漸變小,例如鄰近區域中心的凹部231的深度H大於相鄰的凹部231’的深度H’,且凹部231’的深度H’大於凹部231”的深度H”,以令高吸熱區域X的區域中心的表面粗糙度為最高。又,各高吸熱區域X之間可根據實際溫度表現或銲錫材料發生未濕潤的位置而可具有不同的表面粗糙度Ra,如圖3C所示,位於該封裝層22之角落處之該高吸熱區域X的表面粗糙度Ra可大於非位於該封裝層22之該角落處之該高吸熱區域X’的表面粗糙度Ra。
In one embodiment, the surface roughness Ra of the high heat absorption region X is in the range of 5 to 10. In addition, as shown in FIG3A , the surface roughness Ra of a single high heat absorption region X may be uniform. As shown in FIG3B , the surface roughness Ra of a single high heat absorption region X may be inconsistent, and the surface roughness Ra of the high heat absorption region X gradually decreases from the center of the region toward the outside, for example, the depth H of the
於一實施例中,如圖3D所示,單一高吸熱區域X可以中心對齊方式對應單一導電凸塊24,且高吸熱區域X的半徑D大於或等於導電凸塊24的半徑d的2倍,但並不以此為限。於另一實施例中,如圖3E所示,單一高吸熱區域X也可以中心不對齊方式對應單一導電凸塊24,只要導電凸塊24落在高吸熱區域X的範圍中即可。
In one embodiment, as shown in FIG. 3D , a single high heat absorption region X may correspond to a single
於一實施例中,如圖3F所示,複數高吸熱區域X對應單一導電凸塊24,此時內切複數高吸熱區域X之圓C的半徑D’大於或等於導電凸塊24的半徑d的2倍,但並不以此為限。於另一實施例中,如圖3G所示,單一高吸熱區域X對應複數導電凸塊24,此時高吸熱區域X的半
徑D大於或等於內切複數導電凸塊24之圓C’的半徑d’的2倍,但並不以此為限。
In one embodiment, as shown in FIG. 3F , a plurality of high heat absorption regions X correspond to a single
應可理解地,有關高吸熱區域X對應導電凸塊24的方式繁多,但本發明只要導電凸塊24有交集於高吸熱區域X,例如高吸熱區域X的區域與導電凸塊24於垂直方向上有實質重疊即可。另外,導電凸塊24之數量與位置均可視需求及熱影響範圍來針對高吸熱區域X的分佈進行調整,並無特別限制。
It should be understood that there are many ways for the high heat absorption area X to correspond to the
於後續製程中,如圖2E所示,該電子封裝件2可以其導電凸塊24藉由銲錫材料25接置於一電路板3a之接點30上,再進行回銲製程,以藉由雷射L輔助加熱(LAB製程)回銲該銲錫材料25,其中,該雷射L由該封裝層22朝向該線路結構20之方向照射,並可藉由凹凸結構23提高雷射L穿透封裝層22的導熱效率,而將熱能傳遞至該線路結構20之第二側20b,以強化加熱回銲該導電凸塊24上之銲錫材料25。
In the subsequent process, as shown in FIG. 2E , the
本發明復提供一種電子封裝件2,包括線路結構20、電子元件21、封裝層22、凹凸結構23及導電凸塊24。
The present invention further provides an
在本實施例中,線路結構20具有相對之第一側20a與第二側20b,且該線路結構20包含至少一絕緣層200及至少一結合該絕緣層200之佈線層201,如至少一扇出(fan out)型重佈線路層(RDL)。
In this embodiment, the
在本實施例中,電子元件21具有相對之作用面21a與非作用面21b,該作用面21a具有複數電極墊,以藉由複數如銲錫材料、金屬柱(pillar)或其組合之導電體211利用覆晶方式設於該線路結構20之第一
側20a上並電性連接佈線層201,且以如底膠或非導電底部填充薄膜(NCF)等絕緣材212包覆該些導電體211。
In this embodiment, the
在本實施例中,封裝層22具有相對之第一表面22a及第二表面22b,並以該第二表面22b配置於該線路結構20之該第一側20a上,以包覆電子元件21,且可選擇地藉由整平製程,使該封裝層22之第一表面22a齊平該電子元件21之非作用面21b,以令該電子元件21之非作用面21b外露於該封裝層22之第一表面22a。
In this embodiment, the
在本實施例中,以電漿蝕刻方式於該封裝層22之該第一表面22a上形成凹凸結構23。凹凸結構23具有複數凹部231,各凹部231分別具有深度H及寬度A,且任二相鄰的凹部231之間具有邊緣最短距離B。
In this embodiment, a concave-
於一實施例中,深度H及寬度A之間的深寬比可小於或等於3:1。 In one embodiment, the aspect ratio between the depth H and the width A may be less than or equal to 3:1.
於一實施例中,任二相鄰的凹部231的邊緣最短距離B大於或等於各凹部231的寬度A。
In one embodiment, the shortest distance B between the edges of any two
於一實施例中,各凹部231之寬度A小於10μm。
In one embodiment, the width A of each
於一實施例中,各凹部231之深度H可由封裝層22之厚度來決定,例如於封裝層22之厚度小於200μm時,各凹部231之深度H小於該封裝層22之厚度的1/3。
In one embodiment, the depth H of each
在本實施例中,導電凸塊24配置於該線路結構20之第二側20b上,其中,該些導電凸塊24電性連接該佈線層201,以令該電子元件21電性導通至該些導電凸塊24。
In this embodiment, the
在本實施例中,凹凸結構23定義有至少一高吸熱區域X,高吸熱區域X由第一表面22a朝第二表面22b的方向垂直投影而可對應至少一導電凸塊24,且該垂直投影不會經過電子元件21。
In this embodiment, the concave-
於一實施例中,高吸熱區域X之表面粗糙度Ra的範圍在5至10之間。 In one embodiment, the surface roughness Ra of the high heat absorption area X ranges from 5 to 10.
於一實施例中,單一高吸熱區域X之表面粗糙度Ra可一致。於另一實施例中,單一高吸熱區域X之表面粗糙度Ra可不一致,例如高吸熱區域X之表面粗糙度Ra自其區域中心朝外逐漸變小。 In one embodiment, the surface roughness Ra of a single high heat absorption region X may be consistent. In another embodiment, the surface roughness Ra of a single high heat absorption region X may be inconsistent, for example, the surface roughness Ra of the high heat absorption region X gradually decreases from the center of the region toward the outside.
於一實施例中,位於該封裝層22之角落處之該高吸熱區域X的表面粗糙度Ra可大於非位於該封裝層22之該角落處之該高吸熱區域X’的表面粗糙度Ra。
In one embodiment, the surface roughness Ra of the high heat absorption area X located at the corner of the
於一實施例中,單一高吸熱區域X以中心對齊或中心不對齊方式對應單一導電凸塊24,只要高吸熱區域X的半徑D大於或等於導電凸塊24的半徑d的2倍。
In one embodiment, a single high heat absorption area X corresponds to a single
於一實施例中,複數高吸熱區域X對應單一導電凸塊24,此時內切複數高吸熱區域X之圓C的半徑D’大於或等於導電凸塊24的半徑d的2倍。於另一實施例中,單一高吸熱區域X對應複數導電凸塊24,此時高吸熱區域X的半徑D大於或等於內切複數導電凸塊24之圓C’的半徑d’的2倍。
In one embodiment, a plurality of high heat absorption regions X correspond to a single
綜上所述,本發明之電子封裝件及其製法透過於封裝層上形成凹凸結構,可減少雷射光的反射並增加雷射光的吸收,進而增加封裝層的導熱效率,且高吸能區域的表面粗糙度越高,雷射能量的穿透率就越高, 從而能避免封裝層下方導電凸塊與銲錫材料發生未濕潤之問題。本發明之電子封裝件及其製法可令LAB製程應用於易於翹曲之無核心層(coreless)形式之封裝基板時,有著改善熱應力問題之最佳效益。 In summary, the electronic package and its manufacturing method of the present invention can reduce the reflection of laser light and increase the absorption of laser light by forming a concave-convex structure on the packaging layer, thereby increasing the thermal conductivity of the packaging layer. The higher the surface roughness of the high energy absorption area, the higher the penetration rate of the laser energy, thereby avoiding the problem of non-wetting between the conductive bump and the solder material under the packaging layer. The electronic package and its manufacturing method of the present invention can enable the LAB process to be applied to a coreless packaging substrate that is easy to warp, and has the best effect of improving thermal stress problems.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to illustrate the principles and effects of the present invention, but are not used to limit the present invention. Anyone familiar with this technology can modify the above embodiments without violating the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be as listed in the scope of the patent application described below.
2:電子封裝件 2: Electronic packaging
20:線路結構 20:Line structure
20a:第一側 20a: First side
20b:第二側 20b: Second side
200:絕緣層 200: Insulation layer
201:佈線層 201: Wiring layer
21:電子元件 21: Electronic components
21a:作用面 21a: Action surface
21b:非作用面 21b: Non-active surface
211:導電體 211: Conductor
212:絕緣材 212: Insulation material
22:封裝層 22: Packaging layer
22a:第一表面 22a: First surface
22b:第二表面 22b: Second surface
23:凹凸結構 23: Concave and convex structure
24:導電凸塊 24: Conductive bumps
X:高吸熱區域 X: High heat absorption area
Claims (23)
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