TWI886603B - Chip package with heat dissipation function - Google Patents
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Abstract
一種具散熱功效的晶片封裝包含基板、至少一晶片、絕緣層及複合式散熱層,各該晶片是一種水平式晶片或垂直式晶片,該複合式散熱層是由銅層及石墨烯層所構成,且該石墨烯層是設於該銅層的一銅層表面上,其中該石墨烯層具備高導熱功效;其中該複合式散熱層是位於該晶片封裝的上部供用以直接對該晶片封裝產生散熱功效,有效地解決現有晶片封裝容易有散熱不良的現象而不利於產品的市場競爭力的問題,以提昇產品的市場競爭力;其中該複合式散熱層更能以黏貼的方式設置在該絕緣層的一絕緣層表面上,以利於加快製造端大量製造的效率。A chip package with heat dissipation effect comprises a substrate, at least one chip, an insulating layer and a composite heat dissipation layer, each of the chips is a horizontal chip or a vertical chip, the composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is arranged on a copper layer surface of the copper layer, wherein the graphene layer has a high thermal conductivity; wherein the composite heat dissipation layer is located on the surface of the chip The upper part of the chip package is used to directly produce heat dissipation effect for the chip package, effectively solving the problem that the existing chip package is prone to poor heat dissipation and is not conducive to the market competitiveness of the product, so as to enhance the market competitiveness of the product; wherein the composite heat dissipation layer can be set on the surface of an insulating layer of the insulating layer in an adhesive manner, so as to speed up the efficiency of mass production at the manufacturing end.
Description
本發明是一種晶片封裝,尤指一種具散熱功效的晶片封裝。The present invention relates to a chip package, in particular to a chip package with heat dissipation function.
按,由於電子類商品的效能不斷增進,使得商品內部的晶片封裝所產生的廢熱也日益加遽,造成晶片封裝容易有散熱不良的現象,影響電子類商品正常運作甚鉅,不利於產品的市場競爭力。由上可知,習知的晶片封裝的散熱技術應有加以改善的空間。As the performance of electronic products continues to improve, the waste heat generated by the chip packaging inside the product is also increasing, causing the chip packaging to have poor heat dissipation, which greatly affects the normal operation of electronic products and is not conducive to the market competitiveness of products. From the above, it can be seen that the known chip packaging heat dissipation technology should be improved.
因此,一種具散熱功效的晶片封裝,為目前相關產業之迫切期待者。Therefore, a chip package with heat dissipation function is urgently awaited by the relevant industries.
本發明之主要目的在於提供一種具散熱功效的晶片封裝包含基板、至少一晶片、絕緣層及複合式散熱層,各該晶片是一種水平式晶片或垂直式晶片,該複合式散熱層是由銅層及石墨烯層所構成,且該石墨烯層是設於該銅層的一銅層表面上,其中該石墨烯層具備高導熱功效;其中該複合式散熱層是位於該晶片封裝的上部供用以直接對該晶片封裝產生散熱功效,有效地解決現有晶片封裝容易有散熱不良的現象而不利於產品的市場競爭力的問題。The main purpose of the present invention is to provide a chip package with heat dissipation effect, which includes a substrate, at least one chip, an insulating layer and a composite heat dissipation layer. Each chip is a horizontal chip or a vertical chip. The composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is arranged on a copper layer surface of the copper layer, wherein the graphene layer has a high thermal conductivity effect; wherein the composite heat dissipation layer is located on the upper part of the chip package to directly generate a heat dissipation effect for the chip package, effectively solving the problem that the existing chip package is prone to poor heat dissipation and is not conducive to the market competitiveness of the product.
為達成上述目的,本發明提供一種具散熱功效的晶片封裝,該晶片封裝包含一基板、至少一晶片、一絕緣層及一複合式散熱層;其中該基板具一基板電路層;其中各該晶片是一種水平式晶片,各該晶片具有一第一晶片表面及相對的一第二晶片表面,該第二晶片表面是面向該基板,且該第二晶片表面上具有水平地分開的至少二晶墊,各該晶墊是電性連結地設在該基板電路層上;其中該絕緣層是設於該基板上並包覆住各該晶片,該絕緣層具有一絕緣層表面;其中該複合式散熱層是設於該絕緣層的該絕緣層表面上,該複合式散熱層是由一銅(Copper)層及一石墨烯(Graphene)層所構成,且該石墨烯層是設於該銅層的一銅層表面上;其中各該晶片是經由該基板的該基板電路層對外電性連結;其中該複合式散熱層是位於該晶片封裝的上部供用以直接對該晶片封裝產生散熱功效;其中該晶片封裝的製造方法是包含下列步驟:步驟S1:提供一基板,其中該基板具有一基板電路層;步驟S2:在該基板的該基板電路層上設置至少一晶片,其中各該晶片是一種水平式晶片,各該晶片具有一第一晶片表面及相對的一第二晶片表面,該第二晶片表面是面向該基板,且該第二晶片表面上具有水平地分開的至少二晶墊,各該晶墊是電性連結地設在該基板電路層上;步驟S3:在該基板上設置一絕緣層並使該絕緣層包覆住各該晶片;其中該絕緣層具有一絕緣層表面;及步驟S4:在該絕緣層的該絕緣層表面上設置一複合式散熱層,其中該複合式散熱層是由一銅層及一石墨烯層所構成,且該石墨烯層是設於該銅層的一銅層表面上,藉此完成一晶片封裝,以利於提昇產品的市場競爭力。To achieve the above-mentioned object, the present invention provides a chip package with heat dissipation effect, the chip package comprises a substrate, at least one chip, an insulating layer and a composite heat dissipation layer; wherein the substrate has a substrate circuit layer; wherein each of the chips is a horizontal chip, each of the chips has a first chip surface and an opposite second chip surface, the second chip surface faces the substrate, and the second chip surface has at least two horizontally separated crystal pads, each of the crystal pads is electrically connected and arranged on the substrate circuit layer. wherein the insulating layer is disposed on the substrate and covers each of the chips, and the insulating layer has an insulating layer surface; wherein the composite heat dissipation layer is disposed on the insulating layer surface of the insulating layer, and the composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is disposed on a copper layer surface of the copper layer; wherein each of the chips is electrically connected to the outside through the substrate circuit layer of the substrate; wherein the composite heat dissipation layer is located on the chip package The upper part of the chip package is used to directly generate heat dissipation effect for the chip package; wherein the manufacturing method of the chip package includes the following steps: step S1: providing a substrate, wherein the substrate has a substrate circuit layer; step S2: arranging at least one chip on the substrate circuit layer of the substrate, wherein each of the chips is a horizontal chip, each of the chips has a first chip surface and an opposite second chip surface, the second chip surface faces the substrate, and the second chip surface has at least two horizontally separated The invention relates to a method for manufacturing a chip package of a semiconductor device and a semiconductor device. The chip package comprises: a step S3: providing an insulating layer on the substrate and covering each chip with the insulating layer; wherein the insulating layer has an insulating layer surface; and a step S4: providing a composite heat dissipation layer on the insulating layer surface of the insulating layer, wherein the composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is provided on a copper layer surface of the copper layer, thereby completing a chip package to improve the market competitiveness of the product.
在本發明一較佳實施例中,該複合式散熱層是以黏貼的方式設置在該絕緣層的該絕緣層表面上。In a preferred embodiment of the present invention, the composite heat dissipation layer is disposed on the insulating layer surface of the insulating layer in an adhesive manner.
在本發明一較佳實施例中,該石墨烯層進一步是以塗佈的方式成型於該銅層的該銅層表面上。In a preferred embodiment of the present invention, the graphene layer is further formed on the surface of the copper layer of the copper layer in a coating manner.
在本發明一較佳實施例中,該基板進一步包含至少一基板盲孔、一第一基板表面及相對的一第二基板表面,該第二基板表面是面向於各該晶片;其中該基板電路層進一步包含至少一第一電路層、至少一第二電路層及至少一基板導電柱,各該第一電路層是設在該第二基板表面上,各第二電路層是設在該第一基板表面上,各該基板導電柱是設在各該基板盲孔內,各該第一電路層能藉由各該基板導電柱與各第二電路層電性連結;其中各該晶片的各該晶墊進一步是設在該基板電路層的各該第一電路層上。In a preferred embodiment of the present invention, the substrate further includes at least one substrate blind hole, a first substrate surface and an opposite second substrate surface, and the second substrate surface faces each of the chips; wherein the substrate circuit layer further includes at least one first circuit layer, at least one second circuit layer and at least one substrate conductive pillar, each of the first circuit layers is arranged on the second substrate surface, each of the second circuit layers is arranged on the first substrate surface, each of the substrate conductive pillars is arranged in each of the substrate blind holes, and each of the first circuit layers can be electrically connected to each of the second circuit layers through each of the substrate conductive pillars; wherein each of the crystal pads of each of the chips is further arranged on each of the first circuit layers of the substrate circuit layer.
在本發明一較佳實施例中,該晶片封裝進一步包含一外護層,該外護層是設於該基板上,該外護層具有至少一開口供該基板電路層對外露出。In a preferred embodiment of the present invention, the chip package further comprises an outer protective layer, which is disposed on the substrate and has at least one opening for exposing the substrate circuit layer to the outside.
本發明更提供一種具散熱功效的晶片封裝,該晶片封裝包含一基板、至少一晶片、一絕緣層及一複合式散熱層;其中該基板具一基板電路層;其中各該晶片是一種垂直式晶片,各該晶片具有一第一晶片表面及相對的一第二晶片表面,該第二晶片表面是面向該基板,其中該第一晶片表面及該第二晶片表面上分別各有至少二晶墊,該第二晶片表面上的各該晶墊是電性連結地設在該基板電路層上;其中該絕緣層是設於該基板上並包覆住各該晶片,該絕緣層具有一絕緣層表面,該絕緣層表面上具有至少一第一絕緣層盲孔及至少一第二絕緣層盲孔,各該第一絕緣層盲孔供該第一晶片表面上的各該晶墊對外電性連結,各該第二絕緣層盲孔是上下貫穿該絕緣層且各該第二絕緣層盲孔內設有一導電柱,該導電柱靠近該基板的一端是與該基板電路層電性連結;其中該複合式散熱層是設於該絕緣層的該絕緣層表面上,該複合式散熱層是由一銅層及一石墨烯層所構成,且該石墨烯層是設於該銅層的一銅層表面上,其中該銅層進一步是形成至少一圖案化金屬層供分別與位於各該第一絕緣層盲孔內的各該晶墊、及各該第二絕緣層盲孔內的該導電柱電性連結;其中各該晶片是經由該基板的該基板電路層對外電性連結;其中該複合式散熱層是位於該晶片封裝的上部供用以直接對該晶片封裝產生散熱功效;其中該晶片封裝的製造方法是包含下列步驟:步驟S1:提供一基板,其中該基板具有一基板電路層;步驟S2:在該基板的該基板電路層上設置至少一晶片,其中各該晶片是一種垂直式晶片,各該晶片具有一第一晶片表面及相對的一第二晶片表面,該第二晶片表面是面向該基板,其中該第一晶片表面及該第二晶片表面上分別各有至少二晶墊,該第二晶片表面上的各該晶墊是電性連結地設在該基板電路層上;步驟S3:在該基板上設置一絕緣層並使該絕緣層包覆住各該晶片,並利用鑽孔成型技藝在該絕緣層上成型出至少一第一絕緣層盲孔,其中該絕緣層具有一絕緣層表面,其中各該第一絕緣層盲孔供該第一晶片表面上的各該晶墊對外露出;步驟S4:在該絕緣層的該絕緣層表面上設置一複合式散熱層,其中該複合式散熱層是由一銅層及一石墨烯層所構成,且該石墨烯層是設於該銅層的一銅層表面上;步驟S5:利用鑽孔成型技藝在該複合式散熱層成型出至少一第二絕緣層盲孔,並同時使該複合式散熱層的該銅層形成至少一圖案化金屬層,其中各該圖案化金屬層是與位於各該第一絕緣層盲孔內的各該晶墊電性連結;步驟S6:在各該第二絕緣層盲孔成型一導電柱,其中各該導電柱是與各該圖案化金屬層電性連結,藉此完成一晶片封裝,以利於提昇產品的市場競爭力。The present invention further provides a chip package with heat dissipation effect, the chip package comprising a substrate, at least one chip, an insulating layer and a composite heat dissipation layer; wherein the substrate has a substrate circuit layer; wherein each of the chips is a vertical chip, each of the chips has a first chip surface and an opposite second chip surface, the second chip surface faces the substrate, wherein the first chip surface and the second chip surface are The first chip has at least two crystal pads on its surface, and each of the crystal pads on the second chip surface is electrically connected to the substrate circuit layer; wherein the insulating layer is disposed on the substrate and covers each of the chips, and the insulating layer has an insulating layer surface, and the insulating layer surface has at least one first insulating layer blind hole and at least one second insulating layer blind hole, and each of the first insulating layer blind holes is provided for each of the crystal pads on the first chip surface. The pad is electrically connected to the outside, each of the second insulating layer blind holes penetrates the insulating layer up and down, and each of the second insulating layer blind holes is provided with a conductive column, and one end of the conductive column close to the substrate is electrically connected to the substrate circuit layer; wherein the composite heat dissipation layer is provided on the insulating layer surface of the insulating layer, and the composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is provided on one end of the copper layer. The copper layer is formed on the surface of the copper layer, wherein the copper layer further forms at least one patterned metal layer for electrical connection with each of the crystal pads in each of the blind holes of the first insulating layer and the conductive pillars in each of the blind holes of the second insulating layer; wherein each of the chips is electrically connected to the outside through the substrate circuit layer of the substrate; wherein the composite heat dissipation layer is located on the upper part of the chip package for directly generating heat dissipation for the chip package The manufacturing method of the chip package comprises the following steps: step S1: providing a substrate, wherein the substrate has a substrate circuit layer; step S2: arranging at least one chip on the substrate circuit layer of the substrate, wherein each of the chips is a vertical chip, each of the chips has a first chip surface and an opposite second chip surface, the second chip surface faces the substrate, wherein the first chip surface is disposed on the substrate circuit layer of the substrate; The first chip surface and the second chip surface each have at least two crystal pads, and each of the crystal pads on the second chip surface is electrically connected and arranged on the substrate circuit layer; step S3: an insulating layer is arranged on the substrate and the insulating layer covers each of the chips, and at least one first insulating layer blind hole is formed on the insulating layer by a drilling forming technology, wherein the insulating layer has an insulating layer surface, wherein each of the The first insulating layer blind hole is used to expose each of the pads on the surface of the first chip; step S4: a composite heat dissipation layer is arranged on the surface of the insulating layer of the insulating layer, wherein the composite heat dissipation layer is composed of a copper layer and a graphene layer, and the graphene layer is arranged on the surface of a copper layer of the copper layer; step S5: at least one second insulating layer blind hole is formed on the composite heat dissipation layer by using a drilling forming technology holes, and at the same time, the copper layer of the composite heat sink layer forms at least one patterned metal layer, wherein each of the patterned metal layers is electrically connected to each of the wafer pads located in each of the blind holes of the first insulation layer; step S6: forming a conductive column in each of the blind holes of the second insulation layer, wherein each of the conductive columns is electrically connected to each of the patterned metal layers, thereby completing a chip package to help enhance the market competitiveness of the product.
在本發明一較佳實施例中,在該步驟S5中,成型出各該第二絕緣層盲孔的鑽孔成型作業進一步是雷射鑽孔(Laser via)成型作業;其中在該步驟S6中,該導電柱進一步是利用電鍍(Plating)技藝所成型。In a preferred embodiment of the present invention, in the step S5, the drilling operation for forming each blind hole in the second insulating layer is further a laser via forming operation; wherein in the step S6, the conductive column is further formed by electroplating technology.
在本發明一較佳實施例中,該複合式散熱層是以黏貼的方式設置在該絕緣層的該絕緣層表面上。In a preferred embodiment of the present invention, the composite heat dissipation layer is disposed on the insulating layer surface of the insulating layer in an adhesive manner.
在本發明一較佳實施例中,該石墨烯層進一步是以塗佈的方式成型於該銅層的該銅層表面上。In a preferred embodiment of the present invention, the graphene layer is further formed on the surface of the copper layer of the copper layer in a coating manner.
在本發明一較佳實施例中,該基板進一步包含至少一基板盲孔、一第一基板表面及相對的一第二基板表面,該第二基板表面是面向於各該晶片;其中該基板電路層進一步包含至少一第一電路層、至少一第二電路層及至少一基板導電柱,各該第一電路層是設在該第二基板表面上,各第二電路層是設在該第一基板表面上,各該基板導電柱是設在各該基板盲孔內,各該第一電路層能藉由各該基板導電柱與各第二電路層電性連結;其中各該晶片的各該晶墊進一步是設在該基板電路層的各該第一電路層上。In a preferred embodiment of the present invention, the substrate further includes at least one substrate blind hole, a first substrate surface and an opposite second substrate surface, and the second substrate surface faces each of the chips; wherein the substrate circuit layer further includes at least one first circuit layer, at least one second circuit layer and at least one substrate conductive pillar, each of the first circuit layers is arranged on the second substrate surface, each of the second circuit layers is arranged on the first substrate surface, each of the substrate conductive pillars is arranged in each of the substrate blind holes, and each of the first circuit layers can be electrically connected to each of the second circuit layers through each of the substrate conductive pillars; wherein each of the crystal pads of each of the chips is further arranged on each of the first circuit layers of the substrate circuit layer.
在本發明一較佳實施例中,該晶片封裝進一步包含一外護層,該外護層是設於該基板上,該外護層具有至少一開口供該基板電路層對外露出。In a preferred embodiment of the present invention, the chip package further comprises an outer protective layer, which is disposed on the substrate and has at least one opening for exposing the substrate circuit layer to the outside.
以下揭露內容提供許多不同實施例或實例,用於實施提供的標的的不同特徵。當然,此等僅為實例,且並不意欲為限制性。此外,在各種實例中,本揭露內容可重複參考數字及/或字母。此重複是為了簡單且清晰的目的,且自身並不規定論述的各種實施例及/或組態之間的關係。The following disclosure provides many different embodiments or examples for implementing different features of the subject matter provided. Of course, these are merely examples and are not intended to be limiting. In addition, in various examples, the disclosure may repeatedly reference numbers and/or letters. This repetition is for the purpose of simplicity and clarity and does not in itself dictate the relationship between the various embodiments and/or configurations discussed.
配合圖示,將本發明的結構及其技術特徵詳述如後,其中各圖示只用以說明本發明的結構關係及相關功能,因此各圖示中各元件的尺寸並非依實際比例畫製且非用以限制本發明。The structure and technical features of the present invention are described in detail below with reference to the drawings, wherein each drawing is only used to illustrate the structural relationship and related functions of the present invention, and therefore the size of each component in each drawing is not drawn according to the actual scale and is not used to limit the present invention.
參考圖1及5,本發明提供一種具散熱功效的晶片封裝1,該晶片封裝1包含一基板10、至少一晶片20、一絕緣層30及一複合式散熱層40。1 and 5 , the present invention provides a chip package 1 with heat dissipation function. The chip package 1 includes a substrate 10 , at least one chip 20 , an insulating layer 30 and a composite heat dissipation layer 40 .
該基板10具一基板電路層11;其中該基板10進一步包含至少一基板盲孔12、一第一基板表面13及相對的一第二基板表面14但不限制如圖2及6所示,該第二基板表面14是面向於各該晶片20如圖3及7所示;其中該基板電路層11進一步包含至少一第一電路層111、至少一第二電路層112及至少一基板導電柱113但不限制如圖2及6所示,各該第一電路層111是設在該第二基板表面14上,各第二電路層112是設在該第一基板表面13上,各該基板導電柱113是設在各該基板盲孔12內,各該第一電路層111能藉由各該基板導電柱113與各第二電路層112電性連結如圖2及6所示。在本發明的該晶片封裝1一較佳實施例中,該基板10的各該基板盲孔12的數量是2個但不限制如圖1所示。The substrate 10 has a substrate circuit layer 11; wherein the substrate 10 further includes at least one substrate blind hole 12, a first substrate surface 13 and an opposite second substrate surface 14, but not limited to those shown in FIGS. 2 and 6, and the second substrate surface 14 faces each of the chips 20, as shown in FIGS. 3 and 7; wherein the substrate circuit layer 11 further includes at least one first circuit layer 111, at least one second circuit layer 112 and at least one substrate conductive pillar 113, but not limited to those shown in FIGS. 2 and 6, each of the first circuit layers 111 is disposed on the second substrate surface 14, each of the second circuit layers 112 is disposed on the first substrate surface 13, each of the substrate conductive pillars 113 is disposed in each of the substrate blind holes 12, and each of the first circuit layers 111 can be electrically connected to each of the second circuit layers 112 via each of the substrate conductive pillars 113, as shown in FIGS. 2 and 6. In a preferred embodiment of the chip package 1 of the present invention, the number of each substrate blind hole 12 of the substrate 10 is 2 but not limited to that shown in FIG. 1 .
參考圖1及5,根據本發明的該晶片封裝1中的各該晶片20的類型選擇為水平式晶片或垂直式晶片,本發明的該晶片封裝1更可分為各該晶片20的類型選擇為水平式晶片的第一實施例(如圖1所示)、及各該晶片20的類型選擇為垂直式晶片的第二實施例(如圖5所示)但不限制,以下分別說明第一實施例與第二實施例的差異之處:Referring to FIGS. 1 and 5 , according to the type of each chip 20 in the chip package 1 of the present invention, a horizontal chip or a vertical chip is selected. The chip package 1 of the present invention can be further divided into a first embodiment in which the type of each chip 20 is selected as a horizontal chip (as shown in FIG. 1 ), and a second embodiment in which the type of each chip 20 is selected as a vertical chip (as shown in FIG. 5 ) but not limited thereto. The differences between the first embodiment and the second embodiment are respectively described below:
在圖1中所示的實施例為本發明的第一實施例,在第一實施例中,各該晶片20是一種水平式晶片,各該晶片20具有一第一晶片表面21及相對的一第二晶片表面22,該第二晶片表面22是面向該基板10,且該第二晶片表面22上具有水平地分開的至少二晶墊23,各該晶墊23是電性連結地設在該基板電路層11上;其中各該晶片20的各該晶墊23進一步是設在該基板電路層11的各該第一電路層111上但不限制如圖1所示。在本發明的該晶片封裝1一較佳實施例中,各該晶片20的各該晶墊23的數量是2個但不限制如圖1所示。The embodiment shown in FIG. 1 is the first embodiment of the present invention. In the first embodiment, each chip 20 is a horizontal chip. Each chip 20 has a first chip surface 21 and an opposite second chip surface 22. The second chip surface 22 faces the substrate 10, and the second chip surface 22 has at least two horizontally separated crystal pads 23. Each crystal pad 23 is electrically connected and arranged on the substrate circuit layer 11; wherein each crystal pad 23 of each chip 20 is further arranged on each first circuit layer 111 of the substrate circuit layer 11 but not limited to that shown in FIG. 1. In a preferred embodiment of the chip package 1 of the present invention, the number of each crystal pad 23 of each chip 20 is 2 but not limited to that shown in FIG. 1.
參考圖1,絕緣層30,其是設於該基板10上並包覆住各該晶片20,該絕緣層30具有一絕緣層表面31。Referring to FIG. 1 , the insulating layer 30 is disposed on the substrate 10 and covers each of the chips 20 . The insulating layer 30 has an insulating layer surface 31 .
參考圖1,該複合式散熱層40是設於該絕緣層30的該絕緣層表面31上,該複合式散熱層40是由一銅(Copper)層41及一石墨烯(Graphene)層42所構成,且該石墨烯層42是設於該銅層41的一銅層表面411上。Referring to FIG. 1 , the composite heat sink 40 is disposed on the insulating layer surface 31 of the insulating layer 30 . The composite heat sink 40 is composed of a copper layer 41 and a graphene layer 42 , and the graphene layer 42 is disposed on a copper layer surface 411 of the copper layer 41 .
參考圖1,各該晶片20是經由該基板10的該基板電路層11對外電性連結。Referring to FIG. 1 , each chip 20 is electrically connected to the outside via the substrate circuit layer 11 of the substrate 10 .
參考圖1,該複合式散熱層40是位於該晶片封裝1的上部供用以直接對該晶片封裝1產生散熱功效。Referring to FIG. 1 , the composite heat sink 40 is located on the upper portion of the chip package 1 to directly generate heat dissipation for the chip package 1 .
本發明的第一實施例的該晶片封裝1(如圖1所示)的製造方法是包含下列步驟:The manufacturing method of the chip package 1 (as shown in FIG. 1 ) of the first embodiment of the present invention comprises the following steps:
步驟S1:提供一基板10如圖2所示;其中該基板10具有一基板電路層11如圖2所示。Step S1: providing a substrate 10 as shown in FIG. 2 ; wherein the substrate 10 has a substrate circuit layer 11 as shown in FIG. 2 .
步驟S2:在該基板10的該基板電路層11上設置至少一晶片20如圖3所示;其中各該晶片20是一種水平式晶片,各該晶片20具有一第一晶片表面21及相對的一第二晶片表面22,該第二晶片表面22是面向該基板10,且該第二晶片表面22上具有水平地分開的至少二晶墊23,各該晶墊23是電性連結地設在該基板電路層11上如圖3所示。Step S2: at least one chip 20 is arranged on the substrate circuit layer 11 of the substrate 10 as shown in FIG. 3 ; wherein each chip 20 is a horizontal chip, each chip 20 has a first chip surface 21 and an opposite second chip surface 22, the second chip surface 22 faces the substrate 10, and the second chip surface 22 has at least two horizontally separated crystal pads 23, each of which is electrically connected and arranged on the substrate circuit layer 11 as shown in FIG. 3 .
步驟S3:在該基板10上設置一絕緣層30並使該絕緣層30包覆住各該晶片20如圖4所示;其中該絕緣層30具有一絕緣層表面31如圖4所示。Step S3: an insulating layer 30 is disposed on the substrate 10 and the insulating layer 30 covers each of the chips 20 as shown in FIG. 4 ; wherein the insulating layer 30 has an insulating layer surface 31 as shown in FIG. 4 .
步驟S4:在該絕緣層30的該絕緣層表面31上設置一複合式散熱層40,藉此完成一晶片封裝1如圖1所示;其中該複合式散熱層40是由一銅層41及一石墨烯層42所構成,且該石墨烯層42是設於該銅層41的一銅層表面411上如圖1所示。Step S4: a composite heat dissipation layer 40 is disposed on the insulating layer surface 31 of the insulating layer 30, thereby completing a chip package 1 as shown in FIG. 1; wherein the composite heat dissipation layer 40 is composed of a copper layer 41 and a graphene layer 42, and the graphene layer 42 is disposed on a copper layer surface 411 of the copper layer 41 as shown in FIG. 1.
參考圖1,該複合式散熱層40是以黏貼的方式設置在該絕緣層30的該絕緣層表面31上但不限制,使得製造端得以事先將該複合式散熱層40製作成型並庫存,當製造端需要使用時便可從倉庫中直接提取使用,有助於製造端加快大量製造的效率。Referring to FIG. 1 , the composite heat dissipation layer 40 is attached to the insulating layer surface 31 of the insulating layer 30 by gluing but without limitation, so that the manufacturing end can manufacture and store the composite heat dissipation layer 40 in advance, and can be directly extracted from the warehouse when the manufacturing end needs to use it, which helps the manufacturing end to speed up the efficiency of mass production.
參考圖1,該石墨烯層42進一步是以塗佈的方式成型於該銅層41的該銅層表面411上但不限制,有助於製造端執行更多元化製造項目。Referring to FIG. 1 , the graphene layer 42 is further formed on the copper layer surface 411 of the copper layer 41 by coating but not limited thereto, which helps the manufacturing end to execute more diversified manufacturing projects.
參考圖1,該晶片封裝1進一步包含一外護層50但不限制,該外護層50是設於該基板10上,該外護層50具有至少一開口51供該基板電路層11對外露出,有助於加強該晶片封裝1的結構強度。在本發明的該晶片封裝1一較佳實施例中,各該外護層50的各該開口51的數量是2個但不限制如圖1所示。Referring to FIG. 1 , the chip package 1 further includes an outer protective layer 50 but is not limited thereto. The outer protective layer 50 is disposed on the substrate 10 and has at least one opening 51 for exposing the substrate circuit layer 11 to the outside, which helps to enhance the structural strength of the chip package 1. In a preferred embodiment of the chip package 1 of the present invention, the number of each opening 51 of each outer protective layer 50 is 2 but is not limited thereto as shown in FIG. 1 .
在圖5中所示的實施例為本發明的第二實施例,在第二實施例中,各該晶片20是一種垂直式晶片,各該晶片20具有一第一晶片表面21及相對的一第二晶片表面22,該第二晶片表面22是面向該基板10;其中該第一晶片表面21及該第二晶片表面22上分別各有至少二晶墊23,該第二晶片表面22上的各該晶墊23是電性連結地設在該基板電路層11上如圖5所示。在本發明的該晶片封裝1一較佳實施例中,各該晶片20的該第一晶片表面21上各該晶墊23的數量是2個但不限制如圖5所示,各該晶片20的該第二晶片表面22上各該晶墊23的數量是2個但不限制如圖5所示。The embodiment shown in FIG. 5 is the second embodiment of the present invention. In the second embodiment, each chip 20 is a vertical chip. Each chip 20 has a first chip surface 21 and an opposite second chip surface 22. The second chip surface 22 faces the substrate 10. The first chip surface 21 and the second chip surface 22 each have at least two pads 23. Each pad 23 on the second chip surface 22 is electrically connected and arranged on the substrate circuit layer 11 as shown in FIG. 5. In a preferred embodiment of the chip package 1 of the present invention, the number of each pad 23 on the first chip surface 21 of each chip 20 is 2 but not limited as shown in FIG. 5, and the number of each pad 23 on the second chip surface 22 of each chip 20 is 2 but not limited as shown in FIG. 5.
參考圖5,該絕緣層30是設於該基板10上並包覆住各該晶片20,該絕緣層30具有一絕緣層表面31,該絕緣層表面31上具有至少一第一絕緣層盲孔32及至少一第二絕緣層盲孔33,各該第一絕緣層盲孔32供該第一晶片表面21上的各該晶墊23對外電性連結,各該第二絕緣層盲孔33是上下貫穿該絕緣層30且各該第二絕緣層盲孔33內設有一導電柱60,該導電柱60靠近該基板10的一端是與該基板電路層11電性連結。在本發明的該晶片封裝1一較佳實施例中,該絕緣層30的各該第一絕緣層盲孔32的數量是2個但不限制如圖5所示,該絕緣層30的各該第二絕緣層盲孔33的數量是1個但不限制如圖5所示。Referring to FIG. 5 , the insulating layer 30 is disposed on the substrate 10 and covers each of the chips 20. The insulating layer 30 has an insulating layer surface 31. The insulating layer surface 31 has at least one first insulating layer blind hole 32 and at least one second insulating layer blind hole 33. Each of the first insulating layer blind holes 32 is used to electrically connect each of the wafer pads 23 on the first chip surface 21 to the outside. Each of the second insulating layer blind holes 33 penetrates the insulating layer 30 up and down and a conductive column 60 is disposed in each of the second insulating layer blind holes 33. One end of the conductive column 60 close to the substrate 10 is electrically connected to the substrate circuit layer 11. In a preferred embodiment of the chip package 1 of the present invention, the number of each first insulating layer blind hole 32 of the insulating layer 30 is 2 but not limited as shown in FIG. 5 , and the number of each second insulating layer blind hole 33 of the insulating layer 30 is 1 but not limited as shown in FIG. 5 .
參考圖5,該複合式散熱層40是設於該絕緣層30的該絕緣層表面31上,該複合式散熱層40是由一銅層41及一石墨烯層42所構成,且該石墨烯層42是設於該銅層41的一銅層表面411上;其中該銅層41進一步是形成至少一圖案化金屬層41a供分別與位於各該第一絕緣層盲孔32內的各該晶墊23、及各該第二絕緣層盲孔33內的該導電柱60電性連結如圖5所示。Referring to FIG. 5 , the composite heat sink 40 is disposed on the insulating layer surface 31 of the insulating layer 30. The composite heat sink 40 is composed of a copper layer 41 and a graphene layer 42, and the graphene layer 42 is disposed on a copper layer surface 411 of the copper layer 41; wherein the copper layer 41 further forms at least one patterned metal layer 41a for electrical connection with each of the crystal pads 23 in each of the first insulating layer blind holes 32 and the conductive pillars 60 in each of the second insulating layer blind holes 33, as shown in FIG. 5 .
參考圖5,各該晶片20是經由該基板10的該基板電路層11對外電性連結。5 , each chip 20 is electrically connected to the outside via the substrate circuit layer 11 of the substrate 10 .
參考圖5,複合式散熱層40是位於該晶片封裝1的上部供用以直接對該晶片封裝1產生散熱功效。5 , the composite heat sink 40 is located on the upper portion of the chip package 1 to directly generate heat dissipation for the chip package 1 .
本發明的第二實施例的該晶片封裝1(如圖5所示)的該晶片封裝1的製造方法是包含下列步驟:The manufacturing method of the chip package 1 of the second embodiment of the present invention (as shown in FIG. 5 ) comprises the following steps:
步驟S1:提供一基板10如圖6所示;其中該基板10具有一基板電路層11如圖6所示。Step S1: providing a substrate 10 as shown in FIG6 ; wherein the substrate 10 has a substrate circuit layer 11 as shown in FIG6 .
步驟S2:在該基板10的該基板電路層11上設置至少一晶片20如圖7所示;其中各該晶片20是一種垂直式晶片,各該晶片20具有一第一晶片表面21及相對的一第二晶片表面22,該第二晶片表面22是面向該基板10,其中該第一晶片表面21及該第二晶片表面22上分別各有至少二晶墊23,該第二晶片表面22上的各該晶墊23是電性連結地設在該基板電路層11上如圖7所示。Step S2: at least one chip 20 is arranged on the substrate circuit layer 11 of the substrate 10 as shown in FIG. 7 ; wherein each chip 20 is a vertical chip, each chip 20 has a first chip surface 21 and an opposite second chip surface 22, the second chip surface 22 faces the substrate 10, wherein the first chip surface 21 and the second chip surface 22 each have at least two crystal pads 23, and each crystal pad 23 on the second chip surface 22 is electrically connected and arranged on the substrate circuit layer 11 as shown in FIG. 7 .
步驟S3:在該基板10上設置一絕緣層30並使該絕緣層30包覆住各該晶片20如圖8所示,並利用鑽孔成型技藝在該絕緣層30上成型出至少一第一絕緣層盲孔32如圖9所示;其中該絕緣層30具有一絕緣層表面31如圖8及9所示;其中各該第一絕緣層盲孔32供該第一晶片表面21上的各該晶墊23對外露出如圖9所示。Step S3: an insulating layer 30 is disposed on the substrate 10 and the insulating layer 30 covers each of the chips 20 as shown in FIG8 , and at least one first insulating layer blind hole 32 is formed on the insulating layer 30 by a drilling forming process as shown in FIG9 ; wherein the insulating layer 30 has an insulating layer surface 31 as shown in FIGS. 8 and 9 ; wherein each of the first insulating layer blind holes 32 allows each of the wafer pads 23 on the first chip surface 21 to be exposed to the outside as shown in FIG9 .
步驟S4:在該絕緣層30的該絕緣層表面31上設置一複合式散熱層40如圖10所示;其中該複合式散熱層40是由一銅層41及一石墨烯層42所構成,且該石墨烯層42是設於該銅層41的一銅層表面411上如圖10所示。Step S4: a composite heat dissipation layer 40 is disposed on the insulating layer surface 31 of the insulating layer 30 as shown in FIG. 10 ; wherein the composite heat dissipation layer 40 is composed of a copper layer 41 and a graphene layer 42 , and the graphene layer 42 is disposed on a copper layer surface 411 of the copper layer 41 as shown in FIG. 10 .
步驟S5:利用鑽孔成型技藝在該複合式散熱層40成型出至少一第二絕緣層盲孔33,並同時使該複合式散熱層40的該銅層形成至少一圖案化金屬層41a如圖11所示;其中各該圖案化金屬層41a是與位於各該第一絕緣層盲孔32內的各該晶墊23電性連結如圖5及11所示;其中成型出各該第二絕緣層盲孔33的鑽孔成型作業進一步是雷射鑽孔(Laser via)成型作業但不限制。Step S5: using a drilling forming process to form at least one second insulating layer blind hole 33 in the composite heat sink layer 40, and at the same time forming at least one patterned metal layer 41a on the copper layer of the composite heat sink layer 40 as shown in FIG. 11; wherein each of the patterned metal layers 41a is electrically connected to each of the wafer pads 23 located in each of the first insulating layer blind holes 32 as shown in FIGS. 5 and 11; wherein the drilling forming operation for forming each of the second insulating layer blind holes 33 is further a laser via forming operation but is not limited thereto.
步驟S6:在各該第二絕緣層盲孔33成型一導電柱60如圖5所示,其中各該導電柱60是與各該圖案化金屬層41a電性連結,藉此完成一晶片封裝1如圖5所示;其中該導電柱60進一步是利用電鍍(Plating)技藝所成型但不限制。Step S6: forming a conductive pillar 60 in each of the second insulating layer blind holes 33 as shown in FIG. 5 , wherein each of the conductive pillars 60 is electrically connected to each of the patterned metal layers 41 a, thereby completing a chip package 1 as shown in FIG. 5 ; wherein the conductive pillar 60 is further formed by electroplating technology but is not limited thereto.
參考圖5,該複合式散熱層40是以黏貼的方式設置在該絕緣層30的該絕緣層表面31上但不限制,使得製造端得以事先將該複合式散熱層40製作成型並庫存,當製造端需要使用時便可從倉庫中直接提取使用,有助於製造端加快大量製造的效率。Referring to FIG. 5 , the composite heat dissipation layer 40 is attached to the insulating layer surface 31 of the insulating layer 30 by gluing but without limitation, so that the manufacturing end can manufacture and store the composite heat dissipation layer 40 in advance, and can be directly extracted from the warehouse when the manufacturing end needs to use it, which helps the manufacturing end to speed up the efficiency of mass production.
參考圖5,該石墨烯層42進一步是以塗佈的方式成型於該銅層41的該銅層表面411上但不限制,有助於製造端執行更多元化製造項目。Referring to FIG. 5 , the graphene layer 42 is further formed on the copper layer surface 411 of the copper layer 41 by coating but not limited thereto, which helps the manufacturing end to execute more diversified manufacturing projects.
參考圖5,該晶片封裝1進一步包含一外護層50但不限制,該外護層50是設於該基板10上,該外護層50具有至少一開口51供該基板電路層11對外露出,有助於加強該晶片封裝1的結構強度。在本發明的該晶片封裝1一較佳實施例中,各該外護層50的各該開口51的數量是2個但不限制如圖5所示。Referring to FIG. 5 , the chip package 1 further includes an outer protective layer 50 but is not limited thereto. The outer protective layer 50 is disposed on the substrate 10 and has at least one opening 51 for exposing the substrate circuit layer 11 to the outside, which helps to enhance the structural strength of the chip package 1. In a preferred embodiment of the chip package 1 of the present invention, the number of each opening 51 of each outer protective layer 50 is 2 but is not limited thereto as shown in FIG. 5 .
本發明的該晶片封裝1與現有的晶片封裝相較,具有以下優點:Compared with the existing chip packages, the chip package 1 of the present invention has the following advantages:
(1)本發明的該複合式散熱層40是位於該晶片封裝1的上部供用以直接對該晶片封裝1產生散熱功效如圖1及5所示,其中該複合式散熱層40是由該銅層41及該石墨烯層42所構成,已知石墨烯材料本身具有高導熱的特性,使該複合式散熱層40因具有該石墨烯層42而具備高導熱性能,即該複合式散熱層40得以透過該石墨烯層42改善該晶片封裝1的散熱作用,有效地解決現有晶片封裝容易有散熱不良的現象而不利於產品的市場競爭力的問題,以提昇產品的市場競爭力。(1) The composite heat sink 40 of the present invention is located on the upper part of the chip package 1 and is used to directly generate heat dissipation effect for the chip package 1 as shown in FIGS. 1 and 5 , wherein the composite heat sink 40 is composed of the copper layer 41 and the graphene layer 42. It is known that the graphene material itself has the property of high thermal conductivity, so that the composite heat sink 40 has high thermal conductivity due to the graphene layer 42, that is, the composite heat sink 40 can improve the heat dissipation effect of the chip package 1 through the graphene layer 42, effectively solving the problem that the existing chip package is prone to poor heat dissipation and is not conducive to the market competitiveness of the product, thereby improving the market competitiveness of the product.
(2)在本發明的該晶片封裝1的第二實施例(如圖5所示)中,該銅層41進一步是形成至少一圖案化金屬層41a供分別與位於各該第一絕緣層盲孔32內的各該晶墊23、及各該第二絕緣層盲孔33內的該導電柱60電性連結如圖5所示,即本案的該複合式散熱層40中的該銅層41可進一步形成為導電用的線路層直接提供與該第一晶片表面21上的各該晶墊23、及該導電柱60電性連結,使得製造端得以免除製造導電用線路層的步驟,有助於製造端節省成本。(2) In the second embodiment of the chip package 1 of the present invention (as shown in FIG. 5 ), the copper layer 41 is further formed into at least one patterned metal layer 41 a for electrical connection with each of the crystal pads 23 in each of the first insulating layer blind holes 32 and the conductive pillars 60 in each of the second insulating layer blind holes 33 as shown in FIG. 5 . That is, the copper layer 41 in the composite heat sink 40 of the present invention can be further formed into a conductive wiring layer to directly provide electrical connection with each of the crystal pads 23 on the first chip surface 21 and the conductive pillars 60, so that the manufacturing end can avoid the step of manufacturing the conductive wiring layer, which helps to save costs on the manufacturing end.
以上該僅為本發明的優選實施例,對本發明而言僅是說明性的,而非限制性的;本領域普通技術人員理解,在本發明權利要求所限定的精神和範圍內可對其進行許多改變,修改,甚至等效變更,但都將落入本發明的保護範圍內。The above are only preferred embodiments of the present invention, which are only illustrative and not restrictive of the present invention. A person skilled in the art will understand that many changes, modifications, and even equivalent changes may be made within the spirit and scope defined by the claims of the present invention, but all of them will fall within the scope of protection of the present invention.
1:晶片封裝 10:基板 11:基板電路層 111:第一電路層 112:第二電路層 113:基板導電柱 12:基板盲孔 13:第一基板表面 14:第二基板表面 20:晶片 21:第一晶片表面 22:第二晶片表面 23:晶墊 30:絕緣層 31:絕緣層表面 32:第一絕緣層盲孔 33:第二絕緣層盲孔 40:複合式散熱層 41:銅層 41a:圖案化金屬層 42:石墨烯層 411:銅層表面 50:外護層 51:開口 60:導電柱 1: Chip package 10: Substrate 11: Substrate circuit layer 111: First circuit layer 112: Second circuit layer 113: Substrate conductive pillar 12: Substrate blind hole 13: First substrate surface 14: Second substrate surface 20: Chip 21: First chip surface 22: Second chip surface 23: Chip pad 30: Insulation layer 31: Insulation layer surface 32: First insulation layer blind hole 33: Second insulation layer blind hole 40: Composite heat dissipation layer 41: Copper layer 41a: Patterned metal layer 42: Graphene layer 411: Copper layer surface 50: Outer sheath 51:Open your mouth 60:Conductive pillar
圖1為本案第一實施例(晶片為水平式晶片)的側面剖視的平面示意圖。 圖2為本案第一實施例的基板的側面剖視的平面示意圖。 圖3為在圖2中的基板上設置晶片(水平式晶片)的示意圖。 圖4為在圖3中的基板上設置絕緣層的示意圖。 圖5為本案第一實施例(晶片為垂直式晶片)的側面剖視的平面示意圖。 圖6為本案第二實施例的基板的側面剖視的平面示意圖。 圖7為在圖6中的基板上設置晶片(垂直式晶片)的示意圖。 圖8為在圖7中的基板上設置絕緣層的示意圖。 圖9為利用鑽孔成型技藝在圖8中的絕緣層上成型出第一絕緣層盲孔的示意圖。 圖10為在圖9中的絕緣層上設置複合式散熱層的示意圖。 圖11為利用鑽孔成型技藝在圖10中的複合式散熱層成型出第二絕緣層盲孔的示意圖。 FIG. 1 is a schematic plan view of a side section of the first embodiment of the present invention (the chip is a horizontal chip). FIG. 2 is a schematic plan view of a side section of the substrate of the first embodiment of the present invention. FIG. 3 is a schematic view of a chip (horizontal chip) being arranged on the substrate in FIG. 2. FIG. 4 is a schematic view of an insulating layer being arranged on the substrate in FIG. 3. FIG. 5 is a schematic plan view of a side section of the first embodiment of the present invention (the chip is a vertical chip). FIG. 6 is a schematic plan view of a side section of the substrate of the second embodiment of the present invention. FIG. 7 is a schematic view of a chip (vertical chip) being arranged on the substrate in FIG. 6. FIG. 8 is a schematic view of an insulating layer being arranged on the substrate in FIG. 7. FIG9 is a schematic diagram of forming a blind hole of the first insulating layer on the insulating layer in FIG8 by using a drilling forming technique. FIG10 is a schematic diagram of providing a composite heat dissipation layer on the insulating layer in FIG9. FIG11 is a schematic diagram of forming a blind hole of the second insulating layer on the composite heat dissipation layer in FIG10 by using a drilling forming technique.
無without
1:晶片封裝 1: Chip packaging
10:基板 10:Substrate
11:基板電路層 11: Substrate circuit layer
111:第一電路層 111: First circuit layer
112:第二電路層 112: Second circuit layer
113:基板導電柱 113:Substrate conductive pillar
12:基板盲孔 12:Substrate blind hole
13:第一基板表面 13: Surface of first substrate
14:第二基板表面 14: Surface of the second substrate
20:晶片 20: Chip
21:第一晶片表面 21: First chip surface
22:第二晶片表面 22: Second chip surface
23:晶墊 23: Crystal pad
30:絕緣層 30: Insulation layer
31:絕緣層表面 31: Insulation layer surface
40:複合式散熱層 40: Composite heat dissipation layer
41:銅層 41: Copper layer
42:石墨烯層 42: Graphene layer
411:銅層表面 411: Copper layer surface
50:外護層 50: Outer protective layer
51:開口 51: Open mouth
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112140212A TWI886603B (en) | 2023-10-20 | 2023-10-20 | Chip package with heat dissipation function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112140212A TWI886603B (en) | 2023-10-20 | 2023-10-20 | Chip package with heat dissipation function |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202518707A TW202518707A (en) | 2025-05-01 |
| TWI886603B true TWI886603B (en) | 2025-06-11 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112140212A TWI886603B (en) | 2023-10-20 | 2023-10-20 | Chip package with heat dissipation function |
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| Country | Link |
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| TW (1) | TWI886603B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200725950A (en) * | 2005-10-19 | 2007-07-01 | Luminus Devices Inc | Light-emitting devices and related systems |
| TW200847351A (en) * | 2007-05-25 | 2008-12-01 | Nepes Corp | Wafer level system in package and fabrication method thereof |
| TW202011545A (en) * | 2018-09-06 | 2020-03-16 | 南韓商三星電子股份有限公司 | Fan-out semiconductor package |
| TW202238877A (en) * | 2021-03-19 | 2022-10-01 | 台灣積體電路製造股份有限公司 | Semiconductor package and method of manufacturing semiconductor package |
-
2023
- 2023-10-20 TW TW112140212A patent/TWI886603B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200725950A (en) * | 2005-10-19 | 2007-07-01 | Luminus Devices Inc | Light-emitting devices and related systems |
| TW200847351A (en) * | 2007-05-25 | 2008-12-01 | Nepes Corp | Wafer level system in package and fabrication method thereof |
| TW202011545A (en) * | 2018-09-06 | 2020-03-16 | 南韓商三星電子股份有限公司 | Fan-out semiconductor package |
| TW202238877A (en) * | 2021-03-19 | 2022-10-01 | 台灣積體電路製造股份有限公司 | Semiconductor package and method of manufacturing semiconductor package |
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| TW202518707A (en) | 2025-05-01 |
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