[go: up one dir, main page]

TWI884709B - Method for manufacturing mold for molding - Google Patents

Method for manufacturing mold for molding Download PDF

Info

Publication number
TWI884709B
TWI884709B TW113105966A TW113105966A TWI884709B TW I884709 B TWI884709 B TW I884709B TW 113105966 A TW113105966 A TW 113105966A TW 113105966 A TW113105966 A TW 113105966A TW I884709 B TWI884709 B TW I884709B
Authority
TW
Taiwan
Prior art keywords
substrate
sacrificial layer
manufacturing
thickness
molding die
Prior art date
Application number
TW113105966A
Other languages
Chinese (zh)
Other versions
TW202533900A (en
Inventor
劉明達
林宏澤
Original Assignee
中強光電股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 中強光電股份有限公司 filed Critical 中強光電股份有限公司
Priority to TW113105966A priority Critical patent/TWI884709B/en
Application granted granted Critical
Publication of TWI884709B publication Critical patent/TWI884709B/en
Publication of TW202533900A publication Critical patent/TW202533900A/en

Links

Images

Landscapes

  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

A method for manufacturing a mold for molding includes: providing a substrate having a substrate surface; forming a sacrificial layer on the substrate surface; performing laser processing on the substrate with the sacrificial layer formed thereon, to form a plurality of deep recessed holes that penetrate the sacrificial layer and are recessed into the substrate surface, wherein a recast portion remaining from laser processing is accumulated around the opening edge of each deep recessed hole, and the recast portion is located on the side of the sacrificial layer away from the substrate; and then the sacrificial layer and the recast portion are removed.

Description

成型用模具的製造方法Method for manufacturing molding die

本發明是有關一種模具的製造方法,尤其是一種以雷射加工方式製造模具的成型用模具的製造方法。 The present invention relates to a method for manufacturing a mold, and in particular to a method for manufacturing a molding mold by laser processing.

使用雷射加工在導光元件的成型模具上製作網點是常用的方法,成型模具的材質一般為鋼材,雷射光束聚焦在鋼材表面,加熱使鋼材表面熔融與汽化形成微小的凹孔,並有一些熔融的鋼材材料堆積在凹孔周圍,形成火山口形狀的重鑄結構。此火山口形狀的重鑄結構在成型後會轉寫在導光元件上,造成導光元件不理想的光學特性;或是利用此成型模具進行射出成型製程時,重鑄結構可能導致塑料流動阻力增加,或是脫模困難;另外,由於重鑄結構的形成,造成雷射點徑擴大,導致在導光元件上有網點可視的風險。 It is a common method to use laser processing to make dots on the molding mold of light guide components. The molding mold is generally made of steel. The laser beam is focused on the surface of the steel, and the steel surface is heated to melt and vaporize to form tiny concave holes. Some molten steel material accumulates around the concave holes to form a crater-shaped recast structure. This crater-shaped recast structure will be transferred to the light guide component after molding, resulting in undesirable optical properties of the light guide component; or when using this molding mold for injection molding, the recast structure may increase the plastic flow resistance or make demolding difficult; in addition, due to the formation of the recast structure, the laser spot diameter is enlarged, resulting in the risk of visible dots on the light guide component.

目前常見移除重鑄結構的方法為藉由刀具刨除鋼材表面,以切除鋼材表面包含凹孔周緣之突起物;亦或者經由研磨製程移除凹孔周緣之突起物。然而,在經由刀具切削鋼材表面的方法中,刀具需沿平行鋼材表面的方向前進,刀具的基準面調整困難度高;而在以研磨製程移除凹孔周緣之突起物的方法中,凹孔的分布密度較高的區域,研磨時間較久,而導致鋼材上凹孔的尺寸不一。 Currently, the common method of removing heavy casting structures is to use a tool to plane the steel surface to remove the protrusions on the steel surface including the periphery of the concave hole; or to remove the protrusions around the concave hole through a grinding process. However, in the method of cutting the steel surface through a tool, the tool needs to move in a direction parallel to the steel surface, and the tool base plane adjustment is difficult; and in the method of removing the protrusions around the concave hole through a grinding process, the area with a higher density of concave holes requires a longer grinding time, resulting in different sizes of concave holes on the steel.

「先前技術」段落只是用來幫助了解本發明內容,因此在「先前技術」段落所揭露的內容可能包含一些沒有構成所屬技術領域中具有通常知識者所知道的習知技術。在「先前技術」段落所揭露的內容,不代表該內容或者本發明一個或多個實施例所要解決的問題,在本發明申請前已被所屬技術領域中具有通常知識者所知曉或認知。 The "Prior Art" section is only used to help understand the content of the present invention. Therefore, the content disclosed in the "Prior Art" section may contain some knowledge that does not constitute the common knowledge in the relevant technical field. The content disclosed in the "Prior Art" section does not mean that the content or the problems to be solved by one or more embodiments of the present invention have been known or recognized by the common knowledge in the relevant technical field before the application of the present invention.

本發明提供一種成型用模具的製造方法,可有效移除凹孔周緣之突起的重鑄部,且獲得凹孔尺寸一致的成型用模具。 The present invention provides a method for manufacturing a molding die, which can effectively remove the protruding recast portion around the concave hole and obtain a molding die with a consistent concave hole size.

本發明的其他目的和優點可以從本發明所揭露的技術特徵中得到進一步的了解。 Other purposes and advantages of the present invention can be further understood from the technical features disclosed in the present invention.

為達上述之一或部分或全部目的或是其他目的,本發明之一實施例成型用模具的製造方法包含:提供基板,基板具有基板表面;形成犧牲層於基板表面;對形成有犧牲層的基板進行雷射加工,以形成有貫穿犧牲層且凹入基板表面的多個深凹孔,其中,每一深凹孔之開口周緣堆積有雷射加工殘留的重鑄部,重鑄部位於犧牲層遠離基板的一側;以及移除犧牲層及重鑄部。 To achieve one or part or all of the above purposes or other purposes, a manufacturing method of a molding mold in an embodiment of the present invention includes: providing a substrate having a substrate surface; forming a sacrificial layer on the substrate surface; performing laser processing on the substrate with the sacrificial layer to form a plurality of deep recessed holes penetrating the sacrificial layer and recessed into the substrate surface, wherein a recast portion remaining from the laser processing is accumulated around the opening of each deep recessed hole, and the recast portion is located on a side of the sacrificial layer away from the substrate; and removing the sacrificial layer and the recast portion.

在本發明的一實施例中,在移除上述之犧牲層及重鑄部後,基板表面在對應深凹孔的位置形成多個淺凹孔,淺凹孔具有相同的尺寸。 In one embodiment of the present invention, after removing the sacrificial layer and the recast portion, a plurality of shallow recesses are formed on the substrate surface at positions corresponding to the deep recesses, and the shallow recesses have the same size.

在本發明的一實施例中,上述之深凹孔的最大內徑為第一內徑,淺凹孔的最大內徑為第二內徑,第二內徑小於第一內徑。 In one embodiment of the present invention, the maximum inner diameter of the deep concave hole is the first inner diameter, and the maximum inner diameter of the shallow concave hole is the second inner diameter, and the second inner diameter is smaller than the first inner diameter.

在本發明的一實施例中,在移除上述之犧牲層及重鑄部之後,更包含對形成有淺凹孔的基板進行拋光製程。 In one embodiment of the present invention, after removing the sacrificial layer and the recast portion, a polishing process is further included for the substrate having the shallow concave hole formed therein.

在本發明的一實施例中,上述之基板的厚度大於或等於犧牲層的厚度,犧牲層的厚度大於0.1微米且小於或等於300微米。 In one embodiment of the present invention, the thickness of the substrate is greater than or equal to the thickness of the sacrificial layer, and the thickness of the sacrificial layer is greater than 0.1 micrometers and less than or equal to 300 micrometers.

在本發明的一實施例中,在形成上述之犧牲層之前,更包含對基板表面進行鈍化處理,以形成鈍化層,鈍化層位於基板及犧牲層之間。 In one embodiment of the present invention, before forming the above-mentioned sacrificial layer, the surface of the substrate is passivated to form a passivation layer, and the passivation layer is located between the substrate and the sacrificial layer.

在本發明的一實施例中,上述之鈍化層與犧牲層具有第一厚度總和,基板的厚度大於或等於第一厚度總和,第一厚度總和大於0.1微米且小於或等於300微米。 In one embodiment of the present invention, the passivation layer and the sacrificial layer have a first total thickness, the thickness of the substrate is greater than or equal to the first total thickness, and the first total thickness is greater than 0.1 micrometers and less than or equal to 300 micrometers.

在本發明的一實施例中,上述之鈍化層與基板具有第二厚度總和,第二厚度總和大於或等於犧牲層的厚度,犧牲層的厚度大於0.1微米且小於或等於300微米。 In one embodiment of the present invention, the above-mentioned passivation layer and the substrate have a second total thickness, the second total thickness is greater than or equal to the thickness of the sacrificial layer, and the thickness of the sacrificial layer is greater than 0.1 microns and less than or equal to 300 microns.

在本發明的一實施例中,經由酸洗步驟移除上述之犧牲層及重鑄部。 In one embodiment of the present invention, the sacrificial layer and the recast portion are removed by a pickling step.

在本發明的一實施例中,上述之基板的材質為鋼材。 In one embodiment of the present invention, the material of the above-mentioned substrate is steel.

在本發明的一實施例中,上述之犧牲層為電鍍鎳層或電鍍銅層。 In one embodiment of the present invention, the sacrificial layer is an electroplated nickel layer or an electroplated copper layer.

在本發明的一實施例中,上述之雷射加工的雷射光束射入基板的方向與基板表面垂直,或與基板表面形成特定角度。 In one embodiment of the present invention, the direction in which the laser beam of the above-mentioned laser processing enters the substrate is perpendicular to the substrate surface, or forms a specific angle with the substrate surface.

本發明藉由在基板表面形成犧牲層(或先在基板表面形成鈍化層再形成犧牲層),並於雷射加工後將犧牲層移除的方法,可將堆積於深凹孔之開口周緣的火山口狀重鑄部隨犧牲層一起移除,而在基板上形成無重鑄部的淺凹孔,且淺凹孔的尺寸一致。其中移除重鑄部的方法,可解決習知以切削方法進行重鑄部的移除所面臨刀具的切削基準面不易控制的困難,亦可改善習知以研磨方法進行重鑄部的移除所導致之淺凹孔尺寸不一致的缺失。 The present invention forms a sacrificial layer on the surface of a substrate (or forms a passivation layer on the surface of a substrate first and then forms a sacrificial layer), and removes the sacrificial layer after laser processing. The crater-shaped recast portion accumulated around the opening of the deep concave hole can be removed together with the sacrificial layer, and a shallow concave hole without a recast portion can be formed on the substrate, and the size of the shallow concave hole is consistent. The method of removing the recast portion can solve the difficulty of controlling the cutting reference surface of the tool in the conventional method of removing the recast portion by cutting, and can also improve the defect of inconsistent size of the shallow concave hole caused by the conventional method of removing the recast portion by grinding.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。 In order to make the above and other purposes, features and advantages of the present invention more clearly understood, the following is a detailed description of the preferred embodiment with the accompanying drawings.

10:基板 10:Substrate

101:基板表面 101:Substrate surface

12:犧牲層 12: Sacrifice layer

14:深凹孔 14: Deep concave hole

16:重鑄部 16: Recasting Department

18:淺凹孔 18: Shallow concave hole

r1:第一內徑 r1: first inner diameter

r2:第二內徑 r2: Second inner diameter

DB、DS:厚度 DB , DS : thickness

D1:第一厚度總和 D1: Total first thickness

D2:第二厚度總和 D2: Second thickness sum

20:雷射光束 20: Laser beam

22、22’:鈍化層 22, 22’: Passivation layer

24:毛邊 24: Rough edges

30:成型用模具 30: Molding mold

圖1A至圖1D所示是本發明一實施例成型用模具的製造方法的剖面示意圖。 Figures 1A to 1D are cross-sectional schematic diagrams of a method for manufacturing a molding die according to an embodiment of the present invention.

圖2所示是本發明一實施例犧牲層及深凹孔的俯視示意圖。 Figure 2 is a schematic top view of the sacrificial layer and deep recessed hole of an embodiment of the present invention.

圖3所示是本發明一實施例基板及淺凹孔的俯視示意圖。 FIG3 is a schematic top view of a substrate and a shallow concave hole according to an embodiment of the present invention.

圖4A至圖4E所示是本發明又一實施例成型用模具的製造方法的剖面示意圖。 Figures 4A to 4E are cross-sectional schematic diagrams of a method for manufacturing a molding die according to another embodiment of the present invention.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之一較佳實施例的詳細說明中,將可清楚的呈現。以下實施例中所提到的方向用語,例如:上、下、左、右、前或後等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明並非用來限制本發明。 The other technical contents, features and effects of the present invention mentioned above will be clearly presented in the detailed description of the preferred embodiment with reference to the following drawings. The directional terms mentioned in the following embodiments, such as up, down, left, right, front or back, etc., are only referenced to the directions of the attached drawings. Therefore, the directional terms used are used to illustrate and are not used to limit the present invention.

圖1A至圖1D所示是本發明一實施例成型用模具的製造方法的剖面示意圖。如圖1A所示,提供基板10,基板10具有基板表面101。如圖1B所示,形成犧牲層12於基板表面101。接著,如圖1C所示,對形成有犧牲層12的基板10進行雷射加工,以形成有貫穿犧牲層12且凹入基板表面101的多個深凹孔14,請同時參閱圖2所示是本發明一實施例犧牲層12及深凹孔14的俯視示意圖,其中,每一深凹孔14之開口周緣堆積有雷射加工殘留的重鑄部(recast portion)16,重鑄部16位於犧牲層12遠離基板10的一側。之後,移除犧牲層12及重鑄部16,如圖1D所示,則基板表面101在對應深凹孔14(標示 於圖1C)的位置形成多個淺凹孔18,請同時參閱圖3所示是本發明一實施例基板10及淺凹孔18的俯視示意圖,其中,淺凹孔18分布於基板表面101,且淺凹孔18可具有相同的尺寸。於一實施例中,深凹孔14的最大內徑例如為第一內徑r1(標示於圖1C),淺凹孔18的最大內徑例如為第二內徑r2(標示於圖1D),則第二內徑r2小於第一內徑r1。 1A to 1D are cross-sectional schematic diagrams of a method for manufacturing a molding die according to an embodiment of the present invention. As shown in FIG1A , a substrate 10 is provided, and the substrate 10 has a substrate surface 101 . As shown in FIG1B , a sacrificial layer 12 is formed on the substrate surface 101 . Next, as shown in FIG1C , the substrate 10 formed with the sacrificial layer 12 is laser processed to form a plurality of deep recessed holes 14 penetrating the sacrificial layer 12 and recessed into the substrate surface 101. Please also refer to FIG2 , which is a schematic top view of the sacrificial layer 12 and the deep recessed holes 14 of an embodiment of the present invention, wherein a recast portion 16 remaining from the laser processing is accumulated around the opening of each deep recessed hole 14, and the recast portion 16 is located on a side of the sacrificial layer 12 away from the substrate 10. After that, the sacrificial layer 12 and the recast portion 16 are removed, as shown in FIG1D , and a plurality of shallow recesses 18 are formed on the substrate surface 101 at positions corresponding to the deep recesses 14 (marked in FIG1C ). Please also refer to FIG3 , which is a schematic top view of a substrate 10 and shallow recesses 18 according to an embodiment of the present invention, wherein the shallow recesses 18 are distributed on the substrate surface 101 and the shallow recesses 18 may have the same size. In one embodiment, the maximum inner diameter of the deep recess 14 is, for example, the first inner diameter r1 (marked in FIG1C ), and the maximum inner diameter of the shallow recess 18 is, for example, the second inner diameter r2 (marked in FIG1D ), and the second inner diameter r2 is smaller than the first inner diameter r1.

其中,基板10的材質可選用鋼材,例如SUS304、SUS430或SUS420等;基板10可以是薄板、厚板或者模塊。如圖1A及圖1B所示,基板10的厚度DB大於或等於犧牲層12的厚度DS。於一實施例中,犧牲層12的厚度DS大於0.1微米且小於或等於300微米,即0.1μm<DS

Figure 113105966-A0305-12-0005-1
300μm。犧牲層12例如為電鍍鎳層或電鍍銅層,惟不限於金屬,犧牲層12可以為任何在雷射加工後能自基板10移除的材質。 The material of the substrate 10 can be steel, such as SUS304, SUS430 or SUS420; the substrate 10 can be a thin plate, a thick plate or a module. As shown in FIG. 1A and FIG. 1B , the thickness DB of the substrate 10 is greater than or equal to the thickness DS of the sacrificial layer 12. In one embodiment, the thickness DS of the sacrificial layer 12 is greater than 0.1 micrometers and less than or equal to 300 micrometers, that is, 0.1μm< DS
Figure 113105966-A0305-12-0005-1
The sacrificial layer 12 is, for example, an electroplated nickel layer or an electroplated copper layer, but is not limited to metals. The sacrificial layer 12 can be any material that can be removed from the substrate 10 after laser processing.

其中,雷射加工例如為使用固態釹釔鋁石榴石雷射(Nd:YAG laser)或光纖雷射在已經鍍上犧牲層12的基板10進行加工,以形成深凹孔14。其中,雷射加工的雷射光束20射入基板10的方向與基板表面101可為垂直(如圖1C所示),或與基板表面101形成特定角度。在對工件(即形成有犧牲層12的基板10)進行雷射加工的過程中,雷射光束20聚焦在工件表面,加熱使工件表面熔融與汽化形成微小的深凹孔14,並有一些熔融的工件材料堆積在深凹孔14的周圍,形成如火山口狀的重鑄部16,其中,工作表面例如是犧牲層12的表面,熔融的工件材料例如包含熔融的基板10及熔融的犧牲層12。於一實施例中,深凹孔14的最大內徑(即第一內徑r1)可介於10微米至100微米之間,深凹孔14的深度大於犧牲層12的厚度,例如犧牲層12的厚度為4微米,且雷射加工所形成之深凹孔14的深度為8微米。 The laser processing is, for example, using a solid state Nd:YAG laser or a fiber laser to process the substrate 10 coated with the sacrificial layer 12 to form the deep recessed hole 14. The direction in which the laser beam 20 of the laser processing enters the substrate 10 can be perpendicular to the substrate surface 101 (as shown in FIG. 1C ), or form a specific angle with the substrate surface 101. During the laser processing of the workpiece (i.e., the substrate 10 formed with the sacrificial layer 12), the laser beam 20 is focused on the workpiece surface, and the workpiece surface is heated to melt and vaporize to form a tiny deep concave hole 14, and some molten workpiece material is accumulated around the deep concave hole 14 to form a heavy casting part 16 like a crater, wherein the working surface is, for example, the surface of the sacrificial layer 12, and the molten workpiece material includes, for example, the molten substrate 10 and the molten sacrificial layer 12. In one embodiment, the maximum inner diameter (i.e., the first inner diameter r1) of the deep concave hole 14 can be between 10 microns and 100 microns, and the depth of the deep concave hole 14 is greater than the thickness of the sacrificial layer 12, for example, the thickness of the sacrificial layer 12 is 4 microns, and the depth of the deep concave hole 14 formed by laser processing is 8 microns.

接續上述說明,在本發明的一實施例中,在移除上述犧牲層12及重鑄部16之後,更包含對形成有淺凹孔18的基板10進行拋光製程。具體而 言,於一實施例中,可經由酸洗步驟移除犧牲層12及重鑄部16,其中,酸洗步驟例如為使用稀硝酸將犧牲層12溶解,而重鑄部16雖不易被稀硝酸溶解,但隨著犧牲層12的移除,大部分的重鑄部16可隨著犧牲層12移除,殘留的重鑄部16則可輕易藉由後續之拋光製程移除。 Continuing with the above description, in one embodiment of the present invention, after removing the sacrificial layer 12 and the recast portion 16, a polishing process is further included for the substrate 10 formed with the shallow recessed hole 18. Specifically, in one embodiment, the sacrificial layer 12 and the recast portion 16 can be removed by an acid pickling step, wherein the acid pickling step is, for example, to dissolve the sacrificial layer 12 using dilute nitric acid. Although the recast portion 16 is not easily dissolved by dilute nitric acid, most of the recast portion 16 can be removed along with the removal of the sacrificial layer 12, and the remaining recast portion 16 can be easily removed by a subsequent polishing process.

在本發明實施例成型用模具的製造方法中,藉由在基板表面101形成犧牲層12,並於雷射加工後將犧牲層12移除的方法,可將堆積於深凹孔14之開口周緣的火山口狀重鑄部16隨犧牲層12一起移除,而在基板10上形成無重鑄部16的淺凹孔18。此具有淺凹孔18的基板10可直接作為成型用模具30,或是翻製為電鑄板或軟模後作為成型用模具,使得經射出成型產出的導光板表面具有淺凹孔轉印的凸點或凹點,以作為控制導光板發光的微結構。 In the manufacturing method of the molding mold of the embodiment of the present invention, by forming a sacrificial layer 12 on the substrate surface 101 and removing the sacrificial layer 12 after laser processing, the crater-shaped recast portion 16 accumulated around the opening of the deep concave hole 14 can be removed together with the sacrificial layer 12, and a shallow concave hole 18 without the recast portion 16 is formed on the substrate 10. The substrate 10 with the shallow concave hole 18 can be directly used as a molding mold 30, or can be reproduced as an electroplating plate or a soft mold and then used as a molding mold, so that the surface of the light guide plate produced by injection molding has convex points or concave points transferred from the shallow concave hole, which serves as a microstructure for controlling the light emission of the light guide plate.

圖4A至圖4E所示是本發明又一實施例成型用模具的製造方法的剖面示意圖。如圖4A所示,提供基板10,基板10具有基板表面101,且對基板表面101進行鈍化處理,以在基板表面101形成鈍化層22。接著,如圖4B所示,形成犧牲層12於鈍化層22遠離基板10的一側,使鈍化層22介於基板10及犧牲層12之間。接著,如圖4C所示,對形成有犧牲層12及鈍化層22的基板10進行雷射加工,以形成有貫穿犧牲層12、鈍化層22且凹入基板表面101的多個深凹孔14,其中,每一深凹孔14之開口周緣堆積有雷射加工殘留的重鑄部16,重鑄部16位於犧牲層12遠離基板10的一側。之後,移除犧牲層12及重鑄部16,如圖4D所示,則基板10在對應深凹孔14(表示於圖4C)的位置形成多個淺凹孔18。 4A to 4E are cross-sectional schematic diagrams of a method for manufacturing a molding die according to another embodiment of the present invention. As shown in FIG4A , a substrate 10 is provided, the substrate 10 has a substrate surface 101, and the substrate surface 101 is passivated to form a passivation layer 22 on the substrate surface 101. Then, as shown in FIG4B , a sacrificial layer 12 is formed on a side of the passivation layer 22 away from the substrate 10, so that the passivation layer 22 is between the substrate 10 and the sacrificial layer 12. Next, as shown in FIG. 4C , the substrate 10 formed with the sacrificial layer 12 and the passivation layer 22 is laser processed to form a plurality of deep recessed holes 14 penetrating the sacrificial layer 12 and the passivation layer 22 and recessed into the substrate surface 101, wherein a recast portion 16 left over from the laser processing is accumulated around the opening of each deep recessed hole 14, and the recast portion 16 is located on the side of the sacrificial layer 12 away from the substrate 10. Afterwards, the sacrificial layer 12 and the recast portion 16 are removed, as shown in FIG. 4D , and a plurality of shallow recessed holes 18 are formed on the substrate 10 at positions corresponding to the deep recessed holes 14 (shown in FIG. 4C ).

接續上述說明,於一實施例中,鈍化層22例如為氧化層,如圖4B及圖4C所示,鈍化層22的設置可便於犧牲層12的移除。具體而言,鈍化層22與基板10之間的鍵結較強,鈍化層22與犧牲層12之間的鍵結較弱;當移 除犧牲層12時,鈍化層22仍會附著於基板10。於一實施例中,在對工件(即形成有犧牲層12及鈍化層22的基板10)進行雷射加工時,部分熔融的工件材料除了堆積在深凹孔14的周圍以構成重鑄部16之外,並會凝固於犧牲層12與鈍化層22之間的區域,因此,於移除犧牲層12後,凝固的熔融工件材料可能會形成毛邊24殘留於鈍化層22上,另,上述熔融的工件材料例如包含熔融的基板10、熔融的鈍化層22及熔融的犧牲層12。 Continuing with the above description, in one embodiment, the passivation layer 22 is, for example, an oxide layer, as shown in FIG. 4B and FIG. 4C . The provision of the passivation layer 22 can facilitate the removal of the sacrificial layer 12. Specifically, the bond between the passivation layer 22 and the substrate 10 is stronger, and the bond between the passivation layer 22 and the sacrificial layer 12 is weaker; when the sacrificial layer 12 is removed, the passivation layer 22 will still be attached to the substrate 10. In one embodiment, when laser processing is performed on a workpiece (i.e., a substrate 10 formed with a sacrificial layer 12 and a passivation layer 22), a portion of the molten workpiece material is not only accumulated around the deep recessed hole 14 to form a recast portion 16, but also solidifies in the area between the sacrificial layer 12 and the passivation layer 22. Therefore, after the sacrificial layer 12 is removed, the solidified molten workpiece material may form burrs 24 remaining on the passivation layer 22. In addition, the above-mentioned molten workpiece material includes, for example, the molten substrate 10, the molten passivation layer 22, and the molten sacrificial layer 12.

在本發明一實施例成型用模具的製造方法中,在移除上述犧牲層12及重鑄部16之後,更包含對形成有淺凹孔18的基板10進行拋光製程,如圖4E所示,以移除殘留的毛邊24(標示於圖4D)。於一實施例中,拋光製程例如為絨布拋光,經過絨布拋光,除了可移除殘留的毛邊24之外,鈍化層22的一部分會一併被移除,而殘留於基板表面的部分鈍化層22’並不會影響基板10的表面粗糙度,換言之,不會影響後續射出的導光板的表面粗糙度。 In the manufacturing method of the molding mold of an embodiment of the present invention, after removing the sacrificial layer 12 and the recast portion 16, a polishing process is further included for the substrate 10 formed with the shallow concave hole 18, as shown in FIG. 4E, to remove the remaining burrs 24 (indicated in FIG. 4D). In one embodiment, the polishing process is, for example, velvet polishing. After velvet polishing, in addition to removing the remaining burrs 24, a portion of the passivation layer 22 will be removed together, and the portion of the passivation layer 22' remaining on the surface of the substrate will not affect the surface roughness of the substrate 10, in other words, will not affect the surface roughness of the light guide plate emitted later.

其中,在本發明的一實施例中,如圖4B的左邊所標示,鈍化層22與犧牲層12具有第一厚度總和D1,基板10的厚度DB大於或等於第一厚度總和D1,第一厚度總和D1大於0.1微米且小於或等於300微米。亦或者,如圖4B的右邊所標示,鈍化層22與基板10具有第二厚度總和D2,第二厚度總和D2大於或等於犧牲層12的厚度DS,犧牲層12的厚度DS大於0.1微米且小於或等於300微米。 In one embodiment of the present invention, as indicated on the left side of FIG. 4B , the passivation layer 22 and the sacrificial layer 12 have a first thickness sum D1, the thickness DB of the substrate 10 is greater than or equal to the first thickness sum D1, and the first thickness sum D1 is greater than 0.1 micrometers and less than or equal to 300 micrometers. Alternatively, as indicated on the right side of FIG. 4B , the passivation layer 22 and the substrate 10 have a second thickness sum D2, the second thickness sum D2 is greater than or equal to the thickness DS of the sacrificial layer 12, and the thickness DS of the sacrificial layer 12 is greater than 0.1 micrometers and less than or equal to 300 micrometers.

綜上所述,在本發明實施例成型用模具的製造方法中,藉由在基板表面形成犧牲層(或先在基板表面形成鈍化層再形成犧牲層),並於雷射加工後將犧牲層移除的方法,可將堆積於深凹孔之開口周緣的火山口狀重鑄部隨犧牲層一起移除,而在基板上形成無重鑄部的淺凹孔。其中移除重鑄部的方法可解決習知以切削方法進行重鑄部的移除所面臨刀具的切削基準 面不易控制的困難,亦可改善習知以研磨方法進行重鑄部的移除所導致之淺凹孔尺寸不一致的缺失。 In summary, in the manufacturing method of the molding die of the embodiment of the present invention, by forming a sacrificial layer on the surface of the substrate (or first forming a passivation layer on the surface of the substrate and then forming the sacrificial layer), and removing the sacrificial layer after laser processing, the crater-shaped recast portion accumulated around the opening of the deep concave hole can be removed together with the sacrificial layer, and a shallow concave hole without a recast portion can be formed on the substrate. The method of removing the recast portion can solve the difficulty of controlling the cutting reference surface of the tool in the known removal of the recast portion by cutting method, and can also improve the defect of inconsistent size of the shallow concave hole caused by the known removal of the recast portion by grinding method.

另一方面,由於重鑄部的去除,得到單純的淺凹孔,可降低轉寫之導光板因重鑄部造成的雜散光等不理想的光學特性;並可在將此成型用模具作為射出成型的模具時,降低射出時塑料流動的阻力。此外,隨著犧牲層及重鑄部的去除,基板上之淺凹孔的最大內徑(第二內徑)小於深凹孔的最大內徑(第一內徑),亦即雷射點徑將會縮小,可以使導光板網點直徑縮小,降低網點可視的風險。 On the other hand, due to the removal of the recast part, a simple shallow concave hole is obtained, which can reduce the undesirable optical properties of the transferred light guide plate such as stray light caused by the recast part; and when the molding mold is used as an injection molding mold, the resistance of plastic flow during injection can be reduced. In addition, with the removal of the sacrificial layer and the recast part, the maximum inner diameter (second inner diameter) of the shallow concave hole on the substrate is smaller than the maximum inner diameter (first inner diameter) of the deep concave hole, that is, the laser spot diameter will be reduced, which can reduce the diameter of the light guide plate dots and reduce the risk of dots being visible.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。另外,本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。此外,本說明書或申請專利範圍中提及的「第一」、「第二」等用語僅用以命名元件(element)的名稱或區別不同實施例或範圍,而並非用來限制元件數量上的上限或下限。 However, the above is only the preferred embodiment of the present invention, and it cannot be used to limit the scope of the implementation of the present invention. That is, all simple equivalent changes and modifications made according to the scope of the patent application and the content of the invention description are still within the scope of the present invention. In addition, any embodiment or patent application of the present invention does not need to achieve all the purposes, advantages or features disclosed by the present invention. In addition, the abstract and title are only used to assist in searching patent documents, and are not used to limit the scope of rights of the present invention. In addition, the terms "first" and "second" mentioned in this specification or patent application are only used to name the element or distinguish different embodiments or scopes, and are not used to limit the upper or lower limit of the number of elements.

10:基板 10:Substrate

101:基板表面 101:Substrate surface

12:犧牲層 12: Sacrifice layer

14:深凹孔 14: Deep concave hole

16:重鑄部 16: Recasting Department

r1:第一內徑 r1: first inner diameter

20:雷射光束 20: Laser beam

Claims (11)

一種成型用模具的製造方法,包含:提供一基板,該基板具有一基板表面;形成一犧牲層於該基板表面;對形成有該犧牲層的該基板進行一雷射加工,以形成有貫穿該犧牲層且凹入該基板表面的多個深凹孔,其中,每一該些深凹孔之開口周緣堆積有該雷射加工殘留的重鑄部,該重鑄部位於該犧牲層遠離該基板的一側;以及移除該犧牲層及該重鑄部,其中,在形成該犧牲層之前,更包含對該基板表面進行一鈍化處理,以形成至少一鈍化層,該至少一鈍化層位於該基板及該犧牲層之間。 A method for manufacturing a molding die includes: providing a substrate having a substrate surface; forming a sacrificial layer on the substrate surface; performing a laser process on the substrate with the sacrificial layer formed thereon to form a plurality of deep recessed holes penetrating the sacrificial layer and recessed into the substrate surface, wherein a recast portion remaining from the laser process is accumulated around the opening of each of the deep recessed holes, and the recast portion is located on a side of the sacrificial layer away from the substrate; and removing the sacrificial layer and the recast portion, wherein before forming the sacrificial layer, the method further includes performing a passivation process on the substrate surface to form at least one passivation layer, and the at least one passivation layer is located between the substrate and the sacrificial layer. 如請求項1所述的成型用模具的製造方法,其中,在移除該犧牲層及該重鑄部後,該基板表面在對應該些深凹孔的位置形成多個淺凹孔,該些淺凹孔具有相同的尺寸。 A method for manufacturing a molding die as described in claim 1, wherein after removing the sacrificial layer and the recast portion, a plurality of shallow recessed holes are formed on the substrate surface at positions corresponding to the deep recessed holes, and the shallow recessed holes have the same size. 如請求項2所述的成型用模具的製造方法,其中,每一該些深凹孔之最大內徑為一第一內徑,每一該些淺凹孔之最大內徑為一第二內徑,該第二內徑小於該第一內徑。 A method for manufacturing a molding die as described in claim 2, wherein the maximum inner diameter of each of the deep recesses is a first inner diameter, and the maximum inner diameter of each of the shallow recesses is a second inner diameter, and the second inner diameter is smaller than the first inner diameter. 如請求項2所述的成型用模具的製造方法,在移除該犧牲層及該重鑄部之後,更包含對形成有該些淺凹孔的該基板進行一拋光製程。 The manufacturing method of the molding die as described in claim 2 further includes a polishing process for the substrate having the shallow recessed holes formed therein after removing the sacrificial layer and the recast portion. 如請求項1所述的成型用模具的製造方法,其中,該基板的厚度大於或等於該犧牲層的厚度,該犧牲層的厚度大於0.1微米且小於或等於300微米。 A method for manufacturing a molding die as described in claim 1, wherein the thickness of the substrate is greater than or equal to the thickness of the sacrificial layer, and the thickness of the sacrificial layer is greater than 0.1 micrometers and less than or equal to 300 micrometers. 如請求項1所述的成型用模具的製造方法,其中,該至少一鈍化層與該犧牲層具有一第一厚度總和,該基板的厚度大於或等於該第一厚度總和,該第一厚度總和大於0.1微米且小於或等於300微米。 The manufacturing method of the molding die as described in claim 1, wherein the at least one passivation layer and the sacrificial layer have a first thickness sum, the thickness of the substrate is greater than or equal to the first thickness sum, and the first thickness sum is greater than 0.1 micrometers and less than or equal to 300 micrometers. 如請求項1所述的成型用模具的製造方法,其中,該至少一鈍化層與該基板具有一第二厚度總和,該第二厚度總和大於或等於該犧牲層的厚度,該犧牲層的厚度大於0.1微米且小於或等於300微米。 The manufacturing method of the molding die as described in claim 1, wherein the at least one passivation layer and the substrate have a second thickness sum, the second thickness sum is greater than or equal to the thickness of the sacrificial layer, and the thickness of the sacrificial layer is greater than 0.1 micrometers and less than or equal to 300 micrometers. 如請求項1所述的成型用模具的製造方法,其中,經由一酸洗步驟移除該犧牲層及該重鑄部。 A method for manufacturing a molding die as described in claim 1, wherein the sacrificial layer and the recast portion are removed by a pickling step. 如請求項1所述的成型用模具的製造方法,其中,該基板的材質為鋼材。 A method for manufacturing a molding die as described in claim 1, wherein the substrate is made of steel. 如請求項1所述的成型用模具的製造方法,其中,該犧牲層為一電鍍鎳層或一電鍍銅層。 The method for manufacturing a molding die as described in claim 1, wherein the sacrificial layer is an electroplated nickel layer or an electroplated copper layer. 如請求項1所述的成型用模具的製造方法,其中,該雷射加工的雷射光束射入該基板的方向與該基板表面垂直,或與該基板表面形成特定角度。 A method for manufacturing a molding die as described in claim 1, wherein the direction in which the laser beam of the laser processing enters the substrate is perpendicular to the surface of the substrate, or forms a specific angle with the surface of the substrate.
TW113105966A 2024-02-20 2024-02-20 Method for manufacturing mold for molding TWI884709B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW113105966A TWI884709B (en) 2024-02-20 2024-02-20 Method for manufacturing mold for molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW113105966A TWI884709B (en) 2024-02-20 2024-02-20 Method for manufacturing mold for molding

Publications (2)

Publication Number Publication Date
TWI884709B true TWI884709B (en) 2025-05-21
TW202533900A TW202533900A (en) 2025-09-01

Family

ID=96582148

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113105966A TWI884709B (en) 2024-02-20 2024-02-20 Method for manufacturing mold for molding

Country Status (1)

Country Link
TW (1) TWI884709B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1758983A (en) * 2003-09-30 2006-04-12 松下电器产业株式会社 Mold for optical components
US20080070129A1 (en) * 2006-09-20 2008-03-20 Liu Ming-Dah Method for manufacturing a mold of a light guide plate
CN101161400A (en) * 2007-11-13 2008-04-16 苏州维旺科技有限公司 Method for manufacturing mould core of light conducting plate
TW201321175A (en) * 2011-11-30 2013-06-01 Forhouse Corp Processing method for templates
CN107717216A (en) * 2017-11-06 2018-02-23 武汉光谷航天三江激光产业技术研究院有限公司 A kind of femtosecond laser parallel micromachining method and device
CN113564321A (en) * 2021-07-09 2021-10-29 首钢智新迁安电磁材料有限公司 Magnetic domain refining method and application of oriented silicon steel
CN116609875A (en) * 2023-05-03 2023-08-18 达运精密工业股份有限公司 Light guide plate and backlight module

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1758983A (en) * 2003-09-30 2006-04-12 松下电器产业株式会社 Mold for optical components
US20080070129A1 (en) * 2006-09-20 2008-03-20 Liu Ming-Dah Method for manufacturing a mold of a light guide plate
CN101161400A (en) * 2007-11-13 2008-04-16 苏州维旺科技有限公司 Method for manufacturing mould core of light conducting plate
TW201321175A (en) * 2011-11-30 2013-06-01 Forhouse Corp Processing method for templates
CN107717216A (en) * 2017-11-06 2018-02-23 武汉光谷航天三江激光产业技术研究院有限公司 A kind of femtosecond laser parallel micromachining method and device
CN113564321A (en) * 2021-07-09 2021-10-29 首钢智新迁安电磁材料有限公司 Magnetic domain refining method and application of oriented silicon steel
CN116609875A (en) * 2023-05-03 2023-08-18 达运精密工业股份有限公司 Light guide plate and backlight module

Also Published As

Publication number Publication date
TW202533900A (en) 2025-09-01

Similar Documents

Publication Publication Date Title
US7906437B2 (en) System and method for the manufacture of surgical blades
DE102006000719B4 (en) Wafer dividing method
TWI842874B (en) Glass plate manufacturing method, glass plate and glass plate assembly
TWI884709B (en) Method for manufacturing mold for molding
JP2003100666A (en) Method for manufacturing semiconductor device
CN120516368A (en) Method for manufacturing molding die
US6711802B2 (en) Method of manufacturing multi-core ferrule
CN114932258A (en) Micro milling cutter and picosecond laser preparation method thereof
US20010046105A1 (en) Method for correcting surface shape of magnetic head slider and magnetic head slider
JP2002361468A (en) Removal method of material deposits generated during laser processing
JP4843755B2 (en) Method for manufacturing circuit board material
JP4466956B2 (en) Diamond tool manufacturing method
JP2000030990A (en) Manufacturing method of chip component holding plate
JP2001230165A (en) Semiconductor device and manufacturing method thereof
JP5120839B2 (en) Fine hole machining method
JP5798534B2 (en) Method for producing composite molded body
JP2002200519A (en) Cross groove processing method, mold and optical element
JP2843645B2 (en) Metal plate processing method
JP2619274B2 (en) Plasma cutting method
JP2005093782A (en) Circuit board material, power module, and method of manufacturing circuit board material
JP2008068317A (en) Anti-fogging device for press punching
JPH04309480A (en) Laser processing method
TWI281712B (en) System and method for the manufacture of surgical blades
JPH0453952B2 (en)
JP7580188B2 (en) Manufacturing method of silicon nitride ceramic sintered substrate and manufacturing method of circuit board