TWI883704B - A precision electroplating equipment - Google Patents
A precision electroplating equipment Download PDFInfo
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- TWI883704B TWI883704B TW112148534A TW112148534A TWI883704B TW I883704 B TWI883704 B TW I883704B TW 112148534 A TW112148534 A TW 112148534A TW 112148534 A TW112148534 A TW 112148534A TW I883704 B TWI883704 B TW I883704B
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本發明係關於電鍍設備的技術領域,尤指一種具有固定式陽極電鍍模組、活動式陽極電鍍模組,及用於移動活動式陽極電鍍模組的驅動裝置組成的精密電鍍設備。 The present invention relates to the technical field of electroplating equipment, and in particular to a precision electroplating equipment composed of a fixed anodic electroplating module, a movable anodic electroplating module, and a driving device for moving the movable anodic electroplating module.
現今的一種電鍍設備的構造,例如我國專利公告I575117號所示的電鍍設備,在一電鍍槽中設有兩陽極板(電鍍材料),兩陽極板之間置放一陰極板(被電鍍物),再藉由控制電源供應器的電流輸出狀態,使得來自陽極板的電鍍材料的金屬離子能沉積在陰極板(被鍍物)表面。由於電鍍設備要能讓陰極板能置入兩陽極板之間,並基於安全性考量,習知的兩陽極板之間的距離設定為200~400mm。 The structure of a current electroplating device, such as the electroplating device shown in the patent announcement No. I575117 of our country, is provided with two anode plates (electroplating materials) in an electroplating tank, and a cathode plate (electroplated object) is placed between the two anode plates. Then, by controlling the current output state of the power supply, the metal ions of the electroplating material from the anode plate can be deposited on the surface of the cathode plate (electroplated object). Since the electroplating device must allow the cathode plate to be placed between the two anode plates, and based on safety considerations, the distance between the two anode plates is usually set to 200~400mm.
但是,上述習知電鍍設備的兩陽極板的間距過大,造成的陽離子過度輻射擴散而無法有效覆蓋該陰極板表面,因而導致陰極板表面的鍍層厚度不均勻且質量不佳;而且陽極板與陰極板之間較遠的距離會降低電流效率減緩電鍍速率,因而需要耗用更多的電能來完成電鍍,使得電鍍成本增加;而若將兩陽極板的間距縮小,將干涉到陰極板放入兩陽極板之間的路徑,可能發生操作上的安全性問題。 However, the distance between the two anode plates of the above-mentioned conventional electroplating equipment is too large, resulting in excessive radiation diffusion of cations and failure to effectively cover the surface of the cathode plate, resulting in uneven thickness and poor quality of the coating on the surface of the cathode plate; and the longer distance between the anode plate and the cathode plate will reduce the current efficiency and slow down the electroplating rate, so more electricity is required to complete the electroplating, which increases the electroplating cost; and if the distance between the two anode plates is reduced, it will interfere with the path of the cathode plate between the two anode plates, which may cause safety problems in operation.
為此,如何解決習知電鍍設備兩陽極板間距過大,使兩陽極板的間距盡可能的縮小,而且較小的空間還是能讓陰極板能安全的放入,即為本發明所要積極克服的課題。 Therefore, how to solve the problem of the distance between the two anode plates of the conventional electroplating equipment being too large, so that the distance between the two anode plates can be reduced as much as possible, and the cathode plate can still be safely placed in the smaller space, is the problem that the present invention is actively trying to overcome.
有鑑於上述習知技術之缺憾,發明人有感其未臻於完善,遂竭其心智悉心研究克服,憑其從事該項產業多年之累積經驗,進而研發出一種精密電鍍設備,以期改善上述習知電鍍設備的缺點。 In view of the shortcomings of the above-mentioned known technology, the inventor felt that it was not perfect, so he devoted all his energy to research and overcome it. Based on his many years of experience in the industry, he further developed a precision electroplating equipment in order to improve the shortcomings of the above-mentioned known electroplating equipment.
本發明之主要目的在於提供一種精密電鍍設備,通過該電鍍槽內設置的固定式陽極電鍍模組、活動式陽極電鍍模組以及驅動裝置機構設計,達到兩陽極板之間狹小的空間也能置入陰極板,電鍍過程中陽離子更精密均勻且有效率的覆蓋到該陰極板表面,具有較高的電流效率增進反應電鍍的速率,以及減少耗用電能並降低電鍍成本等功效。 The main purpose of the present invention is to provide a precision electroplating equipment. Through the fixed anode electroplating module, movable anode electroplating module and driving device mechanism design set in the electroplating tank, the cathode plate can be placed in the narrow space between the two anode plates. During the electroplating process, the cations are more precisely, evenly and efficiently covered on the surface of the cathode plate. It has higher current efficiency, improves the reaction electroplating rate, reduces power consumption and reduces electroplating costs.
為了達到上述目的,本發明一種精密電鍍設備,其較佳的技術方案包括:一電鍍槽內垂直設置一固定式陽極電鍍模組及一活動式陽極電鍍模組,該固定式陽極電鍍模組與該活動式陽極電鍍模組中分別設有一陽極板,該固定式陽極電鍍模組與該活動式陽極電鍍模組彼此以該電鍍槽的長度方向相平行延伸;該固定式陽極電鍍模組與該活動式陽極電鍍模組的陽極板彼此相隔成一縱向空間,該縱向空間提供一陰極掛架的一陰極板從該縱向空間上方置入。該固定式陽極電鍍模組設置在不可移動的一固定式懸吊架下,並固定設置在該陰極板的第一側;該活動式陽極電鍍模組設置在可移動的一活動式懸吊架下,並可被該活動式懸吊架移動地設置在該陰極板的第二側;該固定式懸吊架與該活動式懸吊架以該電鍍槽的長度方向相平行設置在該電鍍槽上。該陰極掛架通過一運送機構放置在該固定式懸吊架與該活動式懸吊架之間,並與該固定式懸吊架及該活動式懸吊架相平行延伸,將該陰極板置入該縱向空間中;反之通過該運送機構將陰極掛架取離,使該陰極板脫離該縱向空間。以及一組驅動裝置,該驅動裝置為氣壓或電動裝置,帶動該活動式懸吊架及該活動式陽極電鍍模組移動到遠離該固定式陽極電鍍模組的一開放位置,使該縱向空間的橫向間距擴大,容許該陰極掛架的陰極板置入該縱向空間;該驅動裝置也能反向帶動該活動式懸吊架及該活動式陽極電鍍模組移動到靠近該固定式陽極電鍍模組的一關閉位置,使該縱向空間的橫向間距縮小,使該活動式陽極電鍍模組的陽極板靠近該陰極板的側面。 In order to achieve the above-mentioned purpose, the present invention provides a precision electroplating device, and its preferred technical solution includes: a fixed anode electroplating module and a movable anode electroplating module are vertically arranged in an electroplating tank, and an anode plate is provided in each of the fixed anode electroplating module and the movable anode electroplating module. The anode plating module and the movable anode plating module extend in parallel with each other in the length direction of the plating tank; the anode plates of the fixed anode plating module and the movable anode plating module are separated from each other to form a longitudinal space, and the longitudinal space provides a cathode plate of a cathode rack to be placed from above the longitudinal space. The fixed anode plating module is arranged under an immovable fixed suspension frame and is fixedly arranged on the first side of the cathode plate; the movable anode plating module is arranged under a movable movable suspension frame and can be movably arranged on the second side of the cathode plate by the movable suspension frame; the fixed suspension frame and the movable suspension frame are arranged on the plating tank in parallel with the length direction of the plating tank. The cathode hanger is placed between the fixed suspension and the movable suspension by a transport mechanism, and extends parallel to the fixed suspension and the movable suspension, so that the cathode plate is placed in the longitudinal space; conversely, the cathode hanger is removed by the transport mechanism, so that the cathode plate is separated from the longitudinal space. and a set of driving devices, which are pneumatic or electric devices, driving the movable suspension frame and the movable anode electroplating module to move to an open position away from the fixed anode electroplating module, so that the lateral spacing of the longitudinal space is expanded, allowing the cathode plate of the cathode hanger to be placed in the longitudinal space. The driving device can also reversely drive the movable suspension frame and the movable anode electroplating module to move to a closed position close to the fixed anode electroplating module, so that the lateral spacing of the longitudinal space is reduced, and the anode plate of the movable anode electroplating module is close to the side of the cathode plate.
本發明通過該電鍍槽內設置的固定式陽極電鍍模組、活動式陽極電鍍模組以及驅動裝置機構,當該陰極掛架要將陰極板(基板)放入該電鍍槽前,先由該驅動裝置帶動該活動式陽極電鍍模組遠離該固定式陽極電鍍模組到達開放位置,使兩者之間的縱向空間的間距拉開,再透過一運送機構將該陰極掛架放在該電鍍槽上,使該陰極板(基板)放入電鍍槽再靠向該固定式陽極電鍍模組。其後,再次透過該驅動裝置帶動該活動式陽極電鍍模組靠近該固定式陽極電鍍模組到達關閉位置,使固定式陽極電鍍模組與活動式陽極電鍍模組之間的縱向空間的間距能縮小到80mm,藉此使該陰極板(基板)能安全且不受干涉地置入如此狹小的空間。 The present invention uses a fixed anode plating module, a movable anode plating module and a driving device mechanism arranged in the plating tank. Before the cathode rack is about to place the cathode plate (substrate) into the plating tank, the driving device first drives the movable anode plating module away from the fixed anode plating module to reach an open position, so that the longitudinal space between the two is widened. Then, the cathode rack is placed on the plating tank through a transport mechanism, so that the cathode plate (substrate) is placed into the plating tank and then moves toward the fixed anode plating module. Afterwards, the driving device is used to drive the movable anodic plating module close to the fixed anodic plating module to reach the closed position, so that the longitudinal distance between the fixed anodic plating module and the movable anodic plating module can be reduced to 80 mm, thereby allowing the cathode plate (substrate) to be safely and undisturbedly placed in such a small space.
由於本發明能使固定式陽極電鍍模組與活動式陽極電鍍模組之間的縱向空間縮小,能避免陽極板與陰極板距離過遠所造成的陽離子輻射擴散無法有效覆蓋該陰極板表面的問題,因此電鍍過程中能使陽離子更精密均勻且有效率的覆蓋到該陰極板表面,達到該陰極板(基板)表面的鍍層更均勻、提升鍍層質量及電鍍效率的效果。且由於間距較小,其間的電阻較小,可用的電流密度得以提高,具有較高的電流效率而能增進反應電鍍的速率,減少耗用電能並降低電鍍成本。 Since the present invention can reduce the longitudinal space between the fixed anodic plating module and the movable anodic plating module, it can avoid the problem that the cation radiation diffusion cannot effectively cover the surface of the cathode plate due to the excessive distance between the anode plate and the cathode plate. Therefore, during the plating process, the cations can be more precisely, uniformly and efficiently covered on the surface of the cathode plate, so that the plating layer on the surface of the cathode plate (substrate) is more uniform, the plating layer quality and the plating efficiency are improved. And because the spacing is smaller, the resistance between them is smaller, the available current density is increased, and the higher current efficiency can increase the reaction plating rate, reduce power consumption and reduce plating costs.
較佳的技術方案之一,上述精密電鍍設備中,該固定式陽極電鍍模組與該活動式陽極電鍍模組分別設有一陽極盒、一陽極板、一陽極膜及一屏蔽板;該陽極盒為三面封閉且一開口面朝向該陰極板的非金屬盒體,該陽極板垂直設置在該陽極盒中,該陽極膜垂直遮蔽在該陽極板朝向該開口面的一面,該屏蔽板垂直遮蔽在該陽極盒的開口面。 One of the better technical solutions, in the above-mentioned precision electroplating equipment, the fixed anode electroplating module and the movable anode electroplating module are respectively provided with an anode box, an anode plate, an anode film and a shielding plate; the anode box is a non-metallic box body with three closed sides and an opening facing the cathode plate, the anode plate is vertically arranged in the anode box, the anode film is vertically shielded on the side of the anode plate facing the opening, and the shielding plate is vertically shielded on the opening surface of the anode box.
較佳的技術方案之一,上述精密電鍍設備中,該陽極板包括一或多數個在同一縱向平面的區域,以及一或多數個電源供應器,該些電源供應器分別連接於該些區域分別供電。 One of the better technical solutions is that in the above-mentioned precision electroplating equipment, the anode plate includes one or more regions in the same longitudinal plane, and one or more power supplies, and the power supplies are respectively connected to the regions to supply power.
較佳的技術方案之一,上述精密電鍍設備中,該活動式懸吊架具有一曲線軌道,該驅動裝置為氣壓缸或電動缸,該氣壓缸或電動缸帶動該活動 式懸吊架及該活動式陽極電鍍模組沿著該曲線軌道移動到該開放位置與該關閉位置。 One of the better technical solutions is that in the above-mentioned precision electroplating equipment, the movable suspension has a curved track, and the driving device is a pneumatic cylinder or an electric cylinder, and the pneumatic cylinder or the electric cylinder drives the movable suspension and the movable anode electroplating module to move along the curved track to the open position and the closed position.
較佳的技術方案之一,上述精密電鍍設備中,該陰極掛架具多數導電構件組成的一懸掛架及一框架,該懸掛架的二側設有陰極導電元件;該框架設有夾持該陰極板上端的上固定器,及夾持該陰極板下端的下固定器。 One of the better technical solutions, in the above-mentioned precision electroplating equipment, the cathode hanger has a hanger and a frame composed of a plurality of conductive components, and cathode conductive elements are provided on both sides of the hanger; the frame is provided with an upper fixture for clamping the upper end of the cathode plate, and a lower fixture for clamping the lower end of the cathode plate.
較佳的技術方案之一,上述精密電鍍設備中,該電鍍槽上設有鞍座,該陰極導電元件可分離地設置在該鞍座上。 One of the better technical solutions is that in the above-mentioned precision electroplating equipment, a saddle is provided on the electroplating tank, and the cathode conductive element can be detachably arranged on the saddle.
較佳的技術方案之一,上述精密電鍍設備中,更包括兩組電鍍液及離子交換裝置,其分別具有一驅動馬達及一離子交換板,該兩組電鍍液及離子交換裝置分別設置在該固定式陽極電鍍模組、該活動式陽極電鍍模組與該陰極掛架之間,使該離子交換板浸入該電鍍槽中,該驅動馬達帶動該離子交換板沿著與該陰極板平行的方向往返移動。 One of the better technical solutions is that the above-mentioned precision electroplating equipment further includes two sets of electroplating solution and ion exchange device, each of which has a driving motor and an ion exchange plate. The two sets of electroplating solution and ion exchange device are respectively arranged between the fixed anode electroplating module, the movable anode electroplating module and the cathode rack, so that the ion exchange plate is immersed in the electroplating tank, and the driving motor drives the ion exchange plate to move back and forth in a direction parallel to the cathode plate.
較佳的技術方案之一,上述精密電鍍設備中,該運送機構用於將該陰極掛架放在該電鍍槽上,使該陰極板(基板)放入電鍍槽再靠向該固定式陽極電鍍模組。 One of the better technical solutions is that in the above-mentioned precision electroplating equipment, the transport mechanism is used to place the cathode rack on the electroplating tank, so that the cathode plate (substrate) is placed in the electroplating tank and then close to the fixed anode electroplating module.
10:電鍍槽 10: Electroplating tank
11:鞍座 11: Saddle
20A:固定式陽極電鍍模組 20A: Fixed anode plating module
20B:活動式陽極電鍍模組 20B: Active anodic plating module
21B:活動式懸吊架 21B: Movable hanging bracket
22:陽極板 22: Anode plate
221:區域 221: Area
23:陽極盒 23: Anode box
231:開口面 231:Open face
24:陽極膜 24: Anode film
25:屏蔽板 25: Shielding plate
26:曲線軌道 26: Curved track
30:陰極掛架 30:Cathode rack
31:懸掛架 31: Hanging rack
32:框架 32:Framework
33:陰極導電元件 33: Cathode conductive element
34:上固定器 34: Upper fixator
35:下固定器 35: Lower retainer
40:陰極板 40:Cathode plate
50:驅動裝置 50: Driving device
60:電源供應器 60: Power supply
70:電鍍液及離子交換裝置 70: Plating solution and ion exchange device
71:驅動馬達 71: Driving motor
72:離子交換板 72: Ion exchange plate
80:運送機構 80:Transportation agency
L1:開放位置 L1: Open position
L2:關閉位置 L2: Closed position
W1:縱向空間 W1: Longitudinal space
圖1為本發明精密電鍍設備之俯視結構示意圖。 Figure 1 is a top view of the structure of the precision electroplating equipment of the present invention.
圖2為本發明電鍍槽、活動式陽極電鍍模組與驅動裝置之示意圖。 Figure 2 is a schematic diagram of the electroplating tank, movable anode electroplating module and driving device of the present invention.
圖3為本發明陽極板與電源供應器之示意圖。 Figure 3 is a schematic diagram of the anode plate and power supply of the present invention.
圖4為本發明陰極掛架與陰極板之示意圖。 Figure 4 is a schematic diagram of the cathode rack and cathode plate of the present invention.
圖5為本發明電鍍液及離子交換裝置與離子交換板之示意圖。 Figure 5 is a schematic diagram of the plating solution, ion exchange device and ion exchange plate of the present invention.
圖6為本發明陰極掛架之搬運機構示意圖。 Figure 6 is a schematic diagram of the transport mechanism of the cathode rack of the present invention.
圖7為本發明活動式陽極電鍍模組之關閉位置與開放位置之示意圖。 Figure 7 is a schematic diagram of the closed position and open position of the movable anode electroplating module of the present invention.
圖8為本發明活動式陽極電鍍模組與陰極掛架之連續動作示意圖。 Figure 8 is a schematic diagram of the continuous operation of the movable anode electroplating module and cathode rack of the present invention.
參閱圖1及圖2所示,本發明一種精密電鍍設備,其較佳的具體實施例包括:一電鍍槽10,該電鍍槽10為二長邊牆、兩短邊牆及一底壁圍繞而成的長方體電鍍槽,在該電鍍槽10上端形成一開口。該電鍍槽10內垂直設置一固定式陽極電鍍模組20A及一活動式陽極電鍍模組20B,該固定式陽極電鍍模組20A與該活動式陽極電鍍模組20B分別設有一陽極板22。該固定式陽極電鍍模組20A及該活動式陽極電鍍模組20B係與該電鍍槽10的長度方向相平行設置在該電鍍槽10中,同時也使兩陽極板22相平行置於該電鍍槽10中。該固定式陽極電鍍模組20A的陽極板22與活動式陽極電鍍模組20B的陽極板22在該電鍍槽10中彼此相隔成一縱向空間W1。該電鍍槽10提供設置一陰極掛架30(如圖4所示),該陰極掛架30通過一運送機構80輸送,使其下方所固定的一陰極板40置入該縱向空間W1中,使該陰極板40位於兩陽極板22之間,並與兩陽極板22相平行延伸。具體的,上述該固定式陽極電鍍模組20A設置在不可移動的一固定式懸吊架下(參考圖2所示,固定式懸吊架結構與活動式懸吊架21B結構相同),並固定設置在該陰極板40的第一側。而該活動式陽極電鍍模組20B設置在可移動的一活動式懸吊架21B下(圖2所示),因此可被該活動式懸吊架21B移動地設置在該陰極板40的第二側。該固定式懸吊架及該活動式懸吊架21B與該電鍍槽10的長度方向相平行設置在該電鍍槽10上方,該陰極掛架30平行地設置在該固定式懸吊架(未圖示)與該活動式懸吊架21B之間,且該陰極掛架30能夠被運送機構80升降,使其下方的該陰極板40置入該縱向空間W1中,反之可從該縱向空間W1中垂直上升取出。
Referring to FIG. 1 and FIG. 2 , the present invention is a precision electroplating device, and a preferred specific embodiment thereof includes: an
參閱圖2所示,上述該活動式陽極電鍍模組20B設有一組驅動裝置50,該驅動裝置50可為氣壓缸或電動缸等,該驅動裝置50用於帶動該活動式懸吊架21B及該活動式陽極電鍍模組20B移動到遠離該固定式陽極電鍍模組20A的一開放位置L1(如圖7及圖8所示),使該固定式陽極電鍍模組20A與活動式陽極電鍍模組20B的陽極板22之間的縱向空間W1的橫向間距擴大,容許該陰極掛架30的陰極板40安全地垂直置入該縱向空間W1。該驅動裝置50也能反向帶動該活動式懸吊架21B及該活動式陽極電鍍模組20B移動到靠近該固定式陽極電鍍模組20A的一關閉位置L2,使該固定式陽極電鍍模組20A與活動式陽極電鍍模
組20B的陽極板22之間的縱向空間W1的橫向間距再縮小,藉此使得該固定式陽極電鍍模組20A與該活動式陽極電鍍模組20B的陽極板22相距約80mm,因此非常靠近該陰極板40的二側面。
Referring to FIG. 2 , the movable
再參閱圖1及圖2所示,上述該固定式陽極電鍍模組20A與活動式陽極電鍍模組20B較佳的實施例分別設有一陽極盒23,該陽極盒23為三面封閉且一開口面231朝向該陰極板40的非金屬盒體。各該陽極盒23內設置上述該陽極板22,使陽極板22垂直設置在陽極盒23中。各該陽極盒23還設有一陽極膜24及一屏蔽板25,其中該陽極膜24作為與電鍍液隔離的濾材,垂直遮蔽在該陽極板22朝向該開口面231的一面,只允許電離子及金屬離子通過陽極膜24,避免反應過程中可能產生的其他物質或氣泡移動到該陰極板40(基板),確保電鍍過程的穩定性及品質。該屏蔽板25垂直遮蔽在該陽極盒23的開口面231,用於防止不需要的電鍍部位形成在陰極板40(基板)表面,確保陰極板40只有特定區域接觸到陽離子(金屬離子),有助於精密控制鍍層的位置及厚度,減少不必要的鍍料使用而能降低成本。更具體的,該屏蔽板25可屏蔽在對應該陰極板40周邊的位置,該屏蔽板25也可以設有鏤空的圖案,只對陰極板40表面產生電鍍圖形,特別適合應用在電路板的電鍍。
Referring to FIG. 1 and FIG. 2 , the preferred embodiments of the fixed
再參閱圖3所示,上述該陽極板22較佳的實施例之一包括多數個在同一縱向平面的區域221,該區域221可以因應不同圖形的陰極板40(基板)、高低電流區域或孔疏孔密區,而通過多數個電源供應器60分別連接該些區域221分別供電,達到透過各別電源供應器作不同的電流密度控制,進而使該陰極板40(基板)完成精密電鍍的效果。
Referring to FIG. 3 again, one of the preferred embodiments of the
參閱圖8所示,上述該活動式懸吊架20B可實施有一曲線軌道26,作為該驅動裝置50的氣壓缸或電動缸帶動該活動式懸吊架21B及該活動式陽極電鍍模組20B沿著該曲線軌道26移動到上述該開放位置L1與該關閉位置L2,確保該活動式陽極電鍍模組20B能精密移動。
As shown in FIG8 , the
參閱圖4所示,上述該陰極掛架30較佳的實施例具多數導電構件(金屬桿等)組成的一懸掛架31及一框架32,其中該懸掛架31的二側設有一陰極導電元件33,該陰極導電元件33用於連接到電源電路的負極,例如圖1所示,上述該電鍍槽10上設有鞍座11,使該陰極導電元件33可分離地設置在該鞍座11上。該框架32為導電的矩形框架,該框架32設有用於夾持該陰極板40上端並能導電的上固定器34,以及用於夾持該陰極板40下端並能導電的下固定器35,藉此將該陰極板40垂直固定在該框架32中。
Referring to FIG. 4 , a preferred embodiment of the
一併參閱圖1及圖5所示,本發明較佳的實施例更包括兩組電鍍液及離子交換裝置70,各該電鍍液及離子交換裝置70分別具有一驅動馬達71及一離子交換板72,該驅動馬達71用於帶動該離子交換板72沿著與該陰極板40平行的方向往返移動。該兩組電鍍液及離子交換裝置70分別設置在該固定式陽極電鍍模組20A、該活動式陽極電鍍模組20B與該陰極掛架30之間,將該離子交換板72浸入該電鍍槽10中,使該離子交換板72阻隔在該陰極板40與該屏蔽板25之間的位置;而且其中一組電鍍液及離子交換裝置70與該活動式陽極電鍍模組20B一起連動,使其離子交換板72能夠移動到開放位置L1與關閉位置L2(如圖7所示)。藉此,本發明通過該離子交換板72在陰極板40兩面往復移動的作用,將帶有離子的藥液透過該離子交換板72在該陰極板40表面作充分均勻的藥液交換,達到提升鍍層均勻的功效。更具體的,該離子交換板72可為一格柵板體,亦可因應客戶不同的需求實施成客製化的交換板。
1 and 5 , a preferred embodiment of the present invention further comprises two sets of plating solution and
本發明通過該電鍍槽10內設置的固定式陽極電鍍模組20A、活動式陽極電鍍模組20B以及驅動裝置50的機構設計,其使用時參閱圖8所示,上述該陰極掛架30要將陰極板40(基板)放入該電鍍槽10之前,先透過該驅動裝置50帶動該活動式陽極電鍍模組20B遠離該固定式陽極電鍍模組20A到達該開放位置L1,使兩者之間的縱向空間W1的間距拉開(如圖7所示)。然後,再透過一運送機構80(如圖6所示,該運送機構80為現有的已知機構,通常為電動線性導螺桿組或
油/氣壓缸等)將該陰極掛架30放在該電鍍槽10上,使該陰極板40放入電鍍槽10,再移動靠向該固定式陽極電鍍模組20A。其後如圖8所示,再次透過該驅動裝置50帶動該活動式陽極電鍍模組20B靠近該固定式陽極電鍍模組20A到達關閉位置L2,使固定式陽極電鍍模組20A與活動式陽極電鍍模組20B之間的縱向空間W1的間距能縮小到80mm,藉此使該陰極板40能安全的置入狹小的空間中。
The present invention is designed through the mechanism of the fixed
本發明在上文中已以較佳實施例揭露,然熟習本項技術者應理解的是,該實施例僅用於描繪本發明,而不應解讀為限制本發明之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本發明之範疇內。因此,本發明之保護範圍當以申請專利範圍所界定者為準。 The present invention has been disclosed in the above text with a preferred embodiment, but those familiar with the present technology should understand that the embodiment is only used to describe the present invention and should not be interpreted as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to the embodiment should be included in the scope of the present invention. Therefore, the scope of protection of the present invention shall be based on the scope defined by the patent application.
10:電鍍槽 10: Electroplating tank
11:鞍座 11: Saddle
20A:固定式陽極電鍍模組 20A: Fixed anode plating module
20B:活動式陽極電鍍模組 20B: Active anodic plating module
22:陽極板 22: Anode plate
23:陽極盒 23: Anode box
231:開口面 231:Open face
24:陽極膜 24: Anode film
25:屏蔽板 25: Shielding plate
40:陰極板 40:Cathode plate
70:電鍍液及離子交換裝置 70: Plating solution and ion exchange device
71:驅動馬達 71: Driving motor
72:離子交換板 72: Ion exchange plate
Claims (9)
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| CN201753369U (en) * | 2010-03-29 | 2011-03-02 | 富葵精密组件(深圳)有限公司 | Electroplating device |
| TWM495446U (en) * | 2014-11-13 | 2015-02-11 | Manz Taiwan Ltd | Horizontal plating machine and its quick release magnetic coupling |
| TW201634759A (en) * | 2015-03-30 | 2016-10-01 | Applied Equipment Ltd | Electroplating equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201753369U (en) * | 2010-03-29 | 2011-03-02 | 富葵精密组件(深圳)有限公司 | Electroplating device |
| TWM495446U (en) * | 2014-11-13 | 2015-02-11 | Manz Taiwan Ltd | Horizontal plating machine and its quick release magnetic coupling |
| TW201634759A (en) * | 2015-03-30 | 2016-10-01 | Applied Equipment Ltd | Electroplating equipment |
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