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TWI883421B - Projection substrate and eyeglass type terminal - Google Patents

Projection substrate and eyeglass type terminal Download PDF

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Publication number
TWI883421B
TWI883421B TW112113191A TW112113191A TWI883421B TW I883421 B TWI883421 B TW I883421B TW 112113191 A TW112113191 A TW 112113191A TW 112113191 A TW112113191 A TW 112113191A TW I883421 B TWI883421 B TW I883421B
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area
segmented
incident
region
projection
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TW112113191A
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TW202343081A (en
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稲畑達雄
舘岡進
生水利明
白神賢
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日商賽利德股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B27/0172Head mounted characterised by optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/02Viewing or reading apparatus
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0013Means for improving the coupling-in of light from the light source into the light guide
    • G02B6/0015Means for improving the coupling-in of light from the light source into the light guide provided on the surface of the light guide or in the bulk of it
    • G02B6/0016Grooves, prisms, gratings, scattering particles or rough surfaces
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B2027/0178Eyeglass type

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

一種投影基板,用於使自第一面入射的光的至少一部分透射至第一面的相反側的第二面,且使圖像光投影至第二面,所述投影基板包括:入射區域,供投影光入射;分支區域,具有對自入射區域入射的投影光進行導波的第一繞射光柵;以及出射區域,具有對自分支區域入射的投影光的一部分進行導波後自第二面出射投影光的一部分的第二繞射光柵,入射區域將投影光導波至分支區域,分支區域使投影光的一部分朝向出射區域繞射,第一繞射光柵具有在對投影光進行導波的第一方向上反復形成的由第一凸部與第一凹部形成的多個第一凹凸部,多個第一分割區域中的一個第一分割區域中第一凸部在第一方向上的寬度相對於第一凹凸部的第一週期的比例即第一填充因數與較一個第一分割區域更靠近入射區域的第一分割區域的第一填充因數相比遠離0.5。A projection substrate is used to transmit at least a portion of light incident from a first surface to a second surface on the opposite side of the first surface, and to project image light onto the second surface. The projection substrate comprises: an incident area for the projection light to be incident; a branch area having a first diffraction grating for guiding the projection light incident from the incident area; and an output area having a second diffraction grating for guiding a portion of the projection light incident from the branch area and then emitting a portion of the projection light from the second surface. The incident area guides the projection light to the branch area. The branch region diverts a portion of the projection light toward the exit region, the first diffraction grating has a plurality of first convex-concave portions formed by first convex portions and first concave portions repeatedly formed in a first direction for guiding the projection light, and a first filling factor, a ratio of a width of the first convex portion in the first direction to a first period of the first convex-concave portion in one of the plurality of first divided regions, is far from 0.5 compared with the first filling factor of a first divided region closer to the incident region than the first divided region.

Description

投影基板以及眼鏡型終端Projection substrate and eyeglass type terminal

本發明是有關於一種投影基板以及眼鏡型終端。The present invention relates to a projection substrate and a glasses-type terminal.

以往,已知有使用包含波導(waveguide)等的光學系統來顯示二維圖像以供用戶觀賞的眼鏡型的器件、頭戴顯示器等(例如參照日本專利特開2017-207686號公報)。Conventionally, there are known eyeglass-type devices, head-mounted displays, and the like that use an optical system including a waveguide to display a two-dimensional image for a user to view (see, for example, Japanese Patent Application Publication No. 2017-207686).

[發明所欲解決之課題] 此種裝置由於要將光學系統裝入有限的空間內,因此有時光學系統變得複雜。而且,若設為簡便的光學系統,則有時會導致投影至顯示區域的圖像的亮度產生不均。 [Problems that the invention aims to solve] In such devices, the optical system needs to be installed in a limited space, so the optical system sometimes becomes complicated. In addition, if a simple optical system is used, the brightness of the image projected onto the display area may be uneven.

因此,本發明是有鑒於該些方面而完成,目的在於,能夠以簡便的結構來降低用戶所觀賞的投影圖像的亮度的不均。 [解決課題之手段] Therefore, the present invention is completed in view of these aspects, and its purpose is to reduce the uneven brightness of the projected image viewed by the user with a simple structure. [Means for solving the problem]

本發明的第一形態中,提供一種投影基板,用於使自第一面入射的光的至少一部分透射至所述第一面的相反側的第二面,且使圖像光投影至所述第二面,所述投影基板包括:入射區域,供用於使所述圖像光投影的投影光入射;分支區域,具有對自所述入射區域入射的所述投影光進行導波的第一繞射光柵;以及出射區域,具有對自所述分支區域入射的所述投影光的一部分進行導波後自所述第二面出射所述投影光的一部分的第二繞射光柵,所述入射區域將入射的所述投影光導波至所述分支區域,所述分支區域使所述投影光的一部分朝向所述出射區域繞射,所述第一繞射光柵具有由第一凸部與第一凹部構成的多個第一凹凸部,所述多個第一凹凸部以在對所述投影光進行導波的第一方向上反復的方式形成,所述分支區域具有多個第一分割區域,一個第一分割區域中所述第一凸部在所述第一方向上的寬度相對於所述第一凹凸部的第一週期的比例即第一填充因數為不包含規定值的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為包含所述規定值的範圍內。In a first form of the present invention, a projection substrate is provided, which is used to transmit at least a portion of light incident from a first surface to a second surface on the opposite side of the first surface, and to project image light onto the second surface. The projection substrate includes: an incident area for incident projection light for projecting the image light; a branch area having a first diffraction grating for guiding the projection light incident from the incident area; and an exit area having a second diffraction grating for guiding a portion of the projection light incident from the branch area and then emitting a portion of the projection light from the second surface. The incident area guides the incident projection light to the branch area. The branch area diverts a portion of the projection light toward the exit area, the first diversion grating has a plurality of first convex-concave portions consisting of a first convex portion and a first concave portion, the plurality of first convex-concave portions are formed in a repetitive manner in a first direction for guiding the projection light, the branch area has a plurality of first segmented areas, a first filling factor, which is a ratio of a width of the first convex portion in the first direction to a first period of the first convex-concave portion in a first segmented area, is within a range not including a specified value, and a first filling factor of a first segmented area that is closer to the incident area than the first segmented area is within a range including the specified value.

亦可為,所述多個第一分割區域各自的所述第一凹凸部的所述第一週期相同。Alternatively, the first periods of the first concave-convex portions of each of the plurality of first divided regions may be the same.

亦可為,所述一個第一分割區域的所述第一凹凸部的深度大於較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度,所述一個第一分割區域的所述第一凹凸部的深度與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度之差的絕對值越大,所述一個第一分割區域的第一填充因數與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數之差的絕對值越小。It may also be that the depth of the first concave-convex portion of the one first division area is greater than the depth of the first concave-convex portion of the first division area closer to the incident area than the one first division area, and the greater the absolute value of the difference between the depth of the first concave-convex portion of the one first division area and the depth of the first concave-convex portion of the first division area closer to the incident area than the one first division area is, the smaller the absolute value of the difference between the first filling factor of the one first division area and the first filling factor of the first division area closer to the incident area than the one first division area is.

亦可為,所述規定值為0.5,所述多個第一分割區域中的距所述入射區域最遠的所述一個第一分割區域的第一填充因數為0.35以下或0.65以上的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為0.3以上且0.7以下的範圍內。Alternatively, the specified value is 0.5, the first filling factor of the first segmented area among the multiple first segmented areas that is farthest from the incident area is in the range of less than 0.35 or greater than 0.65, and the first filling factor of the first segmented area that is closer to the incident area than the first segmented area is in the range of greater than 0.3 and less than 0.7.

亦可為,所述第二繞射光柵具有由第二凸部與第二凹部構成的多個第二凹凸部,所述多個第二凹凸部以在對所述投影光進行導波的第二方向上反復的方式形成,所述出射區域具有多個第二分割區域,所述多個第二分割區域中的較一個第二分割區域更靠近所述分支區域的第二分割區域中所述第二凸部在所述第二方向上的寬度相對於所述第二凹凸部的第二週期的比例即第二填充因數為包含所述規定值的範圍內。Alternatively, the second diffraction grating has a plurality of second convex-concave portions consisting of second convex portions and second concave portions, the plurality of second convex-concave portions are formed in a repetitive manner in a second direction for guiding the projection light, the exit region has a plurality of second divided regions, and in a second divided region among the plurality of second divided regions which is closer to the branch region than a second divided region, a ratio of the width of the second convex portion in the second direction to the second period of the second convex-concave portion, that is, a second filling factor, is within a range including the specified value.

亦可為,所述多個第二分割區域各自的所述第二凹凸部的所述第二週期相同。Alternatively, the second periods of the second concave-convex portions of each of the plurality of second divided regions may be the same.

亦可為,所述一個第二分割區域的所述第二凹凸部的深度大於較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度,所述一個第二分割區域的所述第二凹凸部的深度與較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度之差的絕對值越大,所述一個第二分割區域中所述第二凸部在所述第二方向上的寬度相對於所述第二凹凸部的第二週期的比例即第二填充因數與較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數之差的絕對值越小。It may also be that the depth of the second concave-convex portion of the one second dividing area is greater than the depth of the second concave-convex portion of the second dividing area closer to the branch area than the one second dividing area. The greater the absolute value of the difference between the depth of the second concave-convex portion of the one second dividing area and the depth of the second concave-convex portion of the second dividing area closer to the branch area than the one second dividing area, the smaller the absolute value of the difference between the width of the second convex portion in the one second dividing area in the second direction relative to the second period of the second concave-convex portion, that is, the second filling factor and the second filling factor of the second dividing area closer to the branch area than the one second dividing area.

亦可為,所述規定值為0.5,所述一個第二分割區域的第二填充因數為不包含所述規定值的範圍內,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數為包含所述規定值的範圍內。Alternatively, the prescribed value is 0.5, the second filling factor of the one second partition area is within a range not including the prescribed value, and the second filling factor of the second partition area closer to the branch area than the one second partition area is within a range including the prescribed value.

亦可為,理想的是:所述規定值為0.5,所述多個第一分割區域各自的所述第一週期為50 nm以上且1 μm以下,所述一個第一分割區域的所述第一凹凸部的深度為50 nm以上且800 nm以下,所述一個第一分割區域的第一填充因數為0.35以下或0.65以上,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度為5 nm以上且100 nm以下,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為0.3以上且0.7以下,所述多個第二分割區域各自的所述第二週期為100 nm以上且1 μm以下,所述一個第二分割區域的所述第二凹凸部的深度為50 nm以上且800 nm以下,所述一個第二分割區域的第二填充因數為0.35以下或0.65以上,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度為5 nm以上且100 nm以下,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數為0.3以上且0.7以下。It may also be that, ideally, the prescribed value is 0.5, the first period of each of the plurality of first divided regions is greater than 50 nm and less than 1 μm, the depth of the first concave-convex portion of the one first divided region is greater than 50 nm and less than 800 nm, the first filling factor of the one first divided region is less than 0.35 or greater than 0.65, the depth of the first concave-convex portion of the first divided region closer to the incident region than the one first divided region is greater than 5 nm and less than 100 nm, the first filling factor of the first divided region closer to the incident region than the one first divided region is greater than 0.3 and less than 0.7, the second period of each of the plurality of second divided regions is greater than 100 nm and less than 1 μm, the depth of the second concave-convex portion of the one second divided region is greater than 50 nm and less than 800 nm nm or less, the second filling factor of the second segmentation region is less than 0.35 or greater than 0.65, the depth of the second concave-convex portion of the second segmentation region closer to the branch region than the second segmentation region is greater than 5 nm and less than 100 nm, and the second filling factor of the second segmentation region closer to the branch region than the second segmentation region is greater than 0.3 and less than 0.7.

本發明的第二形態中,提供一種眼鏡型終端,供用戶佩戴,所述眼鏡型終端包括:第一形態所述的所述投影基板,作為所述用戶的右眼用透鏡以及左眼用透鏡中的至少一者而設,使自所述第一面入射的至少一部分光透射至所述用戶的眼,且使所述圖像光投影至所述第二面;框架,固定所述投影基板;以及投影部,設於所述框架,將用於使所述圖像光投影至所述出射區域的所述投影光照射至所述投影基板的所述入射區域。 [發明的效果] In a second form of the present invention, a spectacle-type terminal is provided for a user to wear, and the spectacle-type terminal comprises: the projection substrate described in the first form, which is provided as at least one of the lens for the right eye and the lens for the left eye of the user, so that at least a part of the light incident from the first surface is transmitted to the eye of the user, and the image light is projected onto the second surface; a frame, which fixes the projection substrate; and a projection unit, which is provided on the frame, and irradiates the projection light used to project the image light onto the emission area onto the incident area of the projection substrate. [Effect of the invention]

根據本發明,起到下述效果:能夠以簡便的結構來降低用戶所觀賞的投影圖像的亮度的不均。According to the present invention, the following effect is achieved: the uneven brightness of the projection image viewed by the user can be reduced with a simple structure.

<眼鏡型終端10的結構例> 圖1表示本實施方式的眼鏡型終端10的結構例。本實施例中,將彼此正交的三個軸設為X軸、Y軸以及Z軸。眼鏡型終端10為用戶所佩戴的、例如可穿戴式器件。眼鏡型終端10使用戶觀賞透過眼鏡的景色,且將圖像光投影至設於投影基板100的顯示區域。眼鏡型終端10包括投影基板100、框架110以及投影部120。 <Structural example of the eyeglass type terminal 10> FIG. 1 shows a structural example of the eyeglass type terminal 10 of the present embodiment. In the present embodiment, three axes orthogonal to each other are set as the X axis, the Y axis, and the Z axis. The eyeglass type terminal 10 is a wearable device worn by a user, for example. The eyeglass type terminal 10 allows the user to view the scenery through the eyeglasses and projects image light onto a display area provided on the projection substrate 100. The eyeglass type terminal 10 includes a projection substrate 100, a frame 110, and a projection unit 120.

投影基板100使自第一面入射的至少一部分光透射至用戶的眼,且使所述圖像光投影至第二面。此處,投影基板100的第一面是在用戶佩戴有眼鏡型終端10的狀態下朝向用戶的相反側的面。而且,投影基板100的第二面是在用戶佩戴有眼鏡型終端10的狀態下朝向用戶的面。圖1表示投影基板100的第一面以及第二面與XY平面大致平行地配置的示例。投影基板100例如是在玻璃基板形成有作為波導發揮功能的繞射光柵的基板。關於投影基板100將後述。The projection substrate 100 transmits at least a portion of light incident from the first surface to the user's eyes, and projects the image light onto the second surface. Here, the first surface of the projection substrate 100 is the surface facing the opposite side of the user when the user wears the eyeglass-type terminal 10. Moreover, the second surface of the projection substrate 100 is the surface facing the user when the user wears the eyeglass-type terminal 10. FIG. 1 shows an example in which the first surface and the second surface of the projection substrate 100 are arranged substantially parallel to the XY plane. The projection substrate 100 is, for example, a substrate in which a diffraction grating functioning as a waveguide is formed on a glass substrate. The projection substrate 100 will be described later.

框架110固定投影基板100。在框架110,設有投影基板100作為用戶的右眼用透鏡以及左眼用透鏡中的至少一者。圖1表示下述示例,即,在框架110設有投影基板100a以作為用戶的右眼用透鏡,且設有投影基板100b以作為左眼用透鏡。The frame 110 fixes the projection substrate 100. The frame 110 is provided with the projection substrate 100 as at least one of the lens for the right eye and the lens for the left eye of the user. FIG. 1 shows an example in which the frame 110 is provided with the projection substrate 100a as the lens for the right eye of the user, and the projection substrate 100b as the lens for the left eye.

框架110亦可取代於此而設有一個投影基板100以作為用戶的右眼用透鏡或左眼用透鏡。而且,框架110亦可設有一個投影基板100以作為用戶的雙眼用透鏡。此時,框架110亦可具有護目鏡的形狀。框架110具有邊撐(temple)、束帶(strap)等的部位,以使得用戶能夠佩戴所述眼鏡型終端10。The frame 110 may also be replaced with a projection substrate 100 to serve as a lens for the right eye or the left eye of the user. In addition, the frame 110 may also be provided with a projection substrate 100 to serve as a lens for both eyes of the user. In this case, the frame 110 may also have the shape of goggles. The frame 110 has a temple, a strap, and other parts so that the user can wear the eyeglass-type terminal 10.

投影部120被設於框架110,朝向投影基板100照射用於使圖像光投影至投影基板100的投影光。在框架110,設有一個或多個此種投影部120。圖1表示下述示例,即,在框架110設有用於將投影光L1照射至投影基板100a的投影部120a與用於將投影光L2照射至投影基板100b的投影部120b。The projection unit 120 is provided on the frame 110, and irradiates projection light for projecting image light onto the projection substrate 100 toward the projection substrate 100. The frame 110 is provided with one or more such projection units 120. FIG. 1 shows an example in which the frame 110 is provided with a projection unit 120a for irradiating the projection light L1 onto the projection substrate 100a, and a projection unit 120b for irradiating the projection light L2 onto the projection substrate 100b.

投影部120既可被設於框架110的固定投影基板100的部位,亦可被設於框架110的邊撐等。理想的是,投影部120是以與框架110成為一體的方式而設。投影部120例如將包含一個波長的投影光照射至投影基板100而使用戶觀賞單色的圖像。而且,投影部120亦可將包含多個波長的投影光照射至投影基板100而使用戶觀賞包含多個顏色的圖像。The projection unit 120 may be provided at a portion of the frame 110 where the projection substrate 100 is fixed, or at a side support of the frame 110. Ideally, the projection unit 120 is provided in a manner that is integrated with the frame 110. The projection unit 120, for example, irradiates the projection substrate 100 with projection light having one wavelength so that the user can view a monochrome image. Furthermore, the projection unit 120 may irradiate the projection substrate 100 with projection light having multiple wavelengths so that the user can view an image having multiple colors.

圖2表示本實施方式的眼鏡型終端10中的投影光的光路的概略。投影部120將投影光照射至設於投影基板100的入射區域210。入射區域210將投影光導波至投影基板100的基板內。並且,投影基板100將在基板內受到導波的投影光自出射區域230作為圖像光而出射。再者,關於入射區域210以及出射區域230將後述。FIG. 2 schematically shows the optical path of the projection light in the eyeglass-type terminal 10 of the present embodiment. The projection unit 120 irradiates the projection light to the incident area 210 provided on the projection substrate 100. The incident area 210 guides the projection light into the substrate of the projection substrate 100. The projection substrate 100 then emits the projection light guided in the substrate from the emission area 230 as image light. The incident area 210 and the emission area 230 will be described later.

圖3表示本實施方式的投影基板100中的投影光的光路的概略。儘管將後述,但投影基板100具有入射區域210、分支區域220以及出射區域230。投影光L入射至入射區域210,並經過分支區域220自出射區域230作為圖像光P而出射。隨著投影光L遠離入射區域210而行進,分支區域220將投影光L逐部分地導波至出射區域230。FIG3 schematically shows the optical path of the projection light in the projection substrate 100 of the present embodiment. Although it will be described later, the projection substrate 100 has an incident area 210, a branch area 220, and an output area 230. The projection light L is incident on the incident area 210, and is output from the output area 230 as image light P via the branch area 220. As the projection light L moves away from the incident area 210, the branch area 220 guides the projection light L to the output area 230 in parts.

同樣地,出射區域230亦隨著投影光L遠離分支區域220而行進,將投影光L的逐部分的光作為圖像光P的一部分而出射。藉此,投影基板100將入射至入射區域210的投影光L自出射區域230作為圖像光P而出射。Similarly, the emission region 230 also emits a portion of the projection light L as a portion of the image light P as the projection light L moves away from the branch region 220 . Thus, the projection substrate 100 emits the projection light L incident on the incident region 210 as the image light P from the emission region 230 .

此處,考慮下述示例:分支區域220在分支區域220的區域整體中以一定的比例將投影光L導波至出射區域230。此時,隨著投影光L遠離入射區域210而行進,投影光L的光量減少,因此自分支區域220入射至出射區域230的投影光L有時會根據距入射區域210的距離而強度不同。Here, the following example is considered: the branch region 220 guides the projection light L to the exit region 230 at a certain ratio in the entire region of the branch region 220. At this time, as the projection light L moves away from the incident region 210, the light amount of the projection light L decreases, so the projection light L incident from the branch region 220 to the exit region 230 may have different intensities depending on the distance from the incident region 210.

同樣,考慮出射區域230在出射區域230的區域整體中以一定的比例將投影光L作為圖像光P而出射的示例。此時,隨著投影光L遠離分支區域220而行進,投影光L的光量減少,因此自出射區域230出射的圖像光P有時會根據距入射區域210的距離以及距出射區域230的距離而強度不同。例如,有時會導致自出射區域230所投影的圖像的左上像素朝向右下像素而亮度逐漸降低。本實施方式的投影基板100降低此種亮度的不均。Similarly, consider an example in which the exit area 230 emits the projection light L as the image light P at a certain ratio in the entire area of the exit area 230. At this time, as the projection light L moves away from the branch area 220, the light amount of the projection light L decreases, so the image light P emitted from the exit area 230 may have different intensities depending on the distance from the incident area 210 and the distance from the exit area 230. For example, the brightness of the upper left pixel of the image projected from the exit area 230 may gradually decrease toward the lower right pixel. The projection substrate 100 of the present embodiment reduces such uneven brightness.

<投影光與圖像光的一例> 圖4表示本實施方式的投影部120照射至投影基板100的投影光L與投影基板100所出射的圖像光P的一例。投影部120例如朝向位於+Z方向的投影基板100的第二面照射投影光L。投影光L對應於用戶所看到的圖像,例如在與XY平面大致平行的面上設置螢幕等來使投影光L投影的情況下,在所述螢幕顯示供用戶觀賞的圖像M1。用戶看到的圖像例如為投影部120所具有的處理器所製作的擴增實境(Augmented Reality,AR)圖像或虛擬實境(Virtual Reality,VR)圖像。如此,投影部120將在與XY平面大致平行的面上形成圖像M1的多個光線作為投影光L而照射。 <An example of projection light and image light> FIG. 4 shows an example of projection light L irradiated to the projection substrate 100 by the projection unit 120 of the present embodiment and image light P emitted by the projection substrate 100. The projection unit 120 irradiates the projection light L toward the second surface of the projection substrate 100 located in the +Z direction, for example. The projection light L corresponds to the image seen by the user. For example, when a screen is provided on a surface substantially parallel to the XY plane to project the projection light L, an image M1 for the user to view is displayed on the screen. The image seen by the user is, for example, an augmented reality (AR) image or a virtual reality (VR) image produced by a processor of the projection unit 120. In this way, the projection unit 120 irradiates a plurality of light rays forming the image M1 on a surface substantially parallel to the XY plane as projection light L.

本實施方式中,說明下述示例,即,投影部120將以X軸方向作為長邊方向的大致長方形的圖像M1投影至與XY平面大致平行的面。而且,圖4中,將投影部120所照射的多個光線中的五個光線表示為輸入光線20。例如,將與圖像的左上像素對應的光線設為第一輸入光線20a,將與圖像的左下像素對應的光線設為第二輸入光線20b,將與圖像的中央像素對應的光線設為第三輸入光線20c,將與圖像的右上像素對應的光線設為第四輸入光線20d,將與圖像的右下像素對應的光線設為第五輸入光線20e。In the present embodiment, the following example is described, that is, the projection unit 120 projects a substantially rectangular image M1 with the X-axis direction as the long side direction onto a surface substantially parallel to the XY plane. Moreover, in FIG4 , five of the multiple light rays irradiated by the projection unit 120 are represented as input light rays 20. For example, the light corresponding to the upper left pixel of the image is set as the first input light 20a, the light corresponding to the lower left pixel of the image is set as the second input light 20b, the light corresponding to the central pixel of the image is set as the third input light 20c, the light corresponding to the upper right pixel of the image is set as the fourth input light 20d, and the light corresponding to the lower right pixel of the image is set as the fifth input light 20e.

投影部120例如將此種投影光L照射至投影基板100的入射區域210,以在無限遠或規定的位置形成正立虛像。入射至入射區域210的投影光經過分支區域220自出射區域230作為圖像光P而出射。圖像光P自出射區域230出射,並入射至自投影基板100隔開距離d的用戶的眼。並且,圖像光P在用戶的眼的視網膜上成像為圖像M2。如此,圖像光P包含成像為圖像M2的多個光線束。The projection unit 120 irradiates the incident area 210 of the projection substrate 100 with such projection light L, for example, to form an upright virtual image at infinity or at a predetermined position. The projection light incident on the incident area 210 is emitted from the emission area 230 through the branch area 220 as image light P. The image light P is emitted from the emission area 230 and is incident on the user's eye separated by a distance d from the projection substrate 100. In addition, the image light P is imaged as an image M2 on the retina of the user's eye. In this way, the image light P includes a plurality of light beams imaged as the image M2.

圖4中,將自投影基板100的出射區域230的圓形區域C照射並在規定的位置成像的多個光線束中的五個光線束表示為輸出光線束30。例如,將成像為圖像的右下像素的光線束設為第一輸出光線束30a,將成像為圖像的右上像素的光線束設為第二輸出光線束30b,將成像為圖像的中央像素的光線束設為第三輸出光線束30c,將成像為圖像的左下像素的光線束設為第四輸出光線束30d,將成像為圖像的左上像素的光線束設為第五輸出光線束30e。In Fig. 4, five of the plurality of light beams irradiated from the circular area C of the emission area 230 of the projection substrate 100 and imaged at a predetermined position are represented as output light beams 30. For example, the light beam imaged as the lower right pixel of the image is set as the first output light beam 30a, the light beam imaged as the upper right pixel of the image is set as the second output light beam 30b, the light beam imaged as the central pixel of the image is set as the third output light beam 30c, the light beam imaged as the lower left pixel of the image is set as the fourth output light beam 30d, and the light beam imaged as the upper left pixel of the image is set as the fifth output light beam 30e.

各個光線束分別對應於自投影部120入射的多個輸入光線20。例如,第一輸出光線束30a對應於第一輸入光線20a,第一輸入光線20a包含在自投影基板100的入射區域210直至出射區域230為止之間藉由多次的分支以及多次的繞射等而產生的多個光線。同樣,第二輸出光線束30b對應於第二輸入光線20b,第三輸出光線束30c對應於第三輸入光線20c,第四輸出光線束30d對應於第四輸入光線20d,第五輸出光線束30e對應於第五輸入光線20e。Each light beam corresponds to a plurality of input light beams 20 incident from the projection unit 120. For example, the first output light beam 30a corresponds to the first input light beam 20a, and the first input light beam 20a includes a plurality of light beams generated by multiple branches and multiple diffractions between the incident area 210 and the exit area 230 of the projection substrate 100. Similarly, the second output light beam 30b corresponds to the second input light beam 20b, the third output light beam 30c corresponds to the third input light beam 20c, the fourth output light beam 30d corresponds to the fourth input light beam 20d, and the fifth output light beam 30e corresponds to the fifth input light beam 20e.

換言之,自出射區域230出射的圖像光P在用戶的眼的視網膜上所成像的圖像M2對應於投影部120所照射的投影光L所投影的圖像M1。藉此,佩戴著眼鏡型終端10的用戶可感覺圖像M2重疊於透過投影基板100所看到的風景而投影於投影基板100的第二面上。換言之,出射區域230作為顯示與投影光L所投影的圖像M1對應的圖像M2的顯示區域發揮功能。In other words, the image M2 formed on the retina of the user's eye by the image light P emitted from the emission area 230 corresponds to the image M1 projected by the projection light L irradiated by the projection unit 120. Thus, the user wearing the eyeglass type terminal 10 can feel that the image M2 is superimposed on the scenery seen through the projection substrate 100 and projected on the second surface of the projection substrate 100. In other words, the emission area 230 functions as a display area for displaying the image M2 corresponding to the image M1 projected by the projection light L.

圖4中,表示用戶所觀測的圖像M2為將投影光L所投影的圖像M1上下以及左右反轉的圖像的示例。再者,投影光L所投影的圖像M1既可為靜態圖像,亦可取而代之,而為動態圖像。接下來說明如上述般出射與所入射的投影光L對應的圖像光P的投影基板100。FIG4 shows an example in which the image M2 observed by the user is an image in which the image M1 projected by the projection light L is reversed up and down and left and right. Furthermore, the image M1 projected by the projection light L may be a static image or a dynamic image instead. Next, the projection substrate 100 that emits the image light P corresponding to the incident projection light L as described above will be described.

<投影基板100的結構例> 圖5表示本實施方式的投影基板100的結構例。圖5表示投影基板100的第一面以及第二面與XY平面大致平行地配置的示例。投影基板100是用於使自第一面入射的光的至少一部分透射至第一面的相反側的第二面,且使圖像光投影至第二面的基板。作為一例,投影基板100為玻璃基板。投影基板100包括入射區域210、分支區域220以及出射區域230。 <Structural example of projection substrate 100> FIG. 5 shows a structural example of the projection substrate 100 of the present embodiment. FIG. 5 shows an example in which the first surface and the second surface of the projection substrate 100 are arranged substantially parallel to the XY plane. The projection substrate 100 is a substrate for transmitting at least a portion of light incident from the first surface to the second surface on the opposite side of the first surface, and for projecting image light onto the second surface. As an example, the projection substrate 100 is a glass substrate. The projection substrate 100 includes an incident region 210, a branch region 220, and an exit region 230.

<入射區域210的示例> 入射區域210供用於使圖像光投影的投影光入射,將入射的投影光朝向分支區域220導波。圖5表示入射區域210在與XY平面大致平行的面上具有圓形的形狀的示例,但並不限定於此。入射區域210只要可將投影光導波至分支區域220即可,可具有橢圓形、多邊形、梯形等的形狀。 <Example of the incident area 210> The incident area 210 is used for incident projection light for image light projection, and guides the incident projection light toward the branch area 220. FIG. 5 shows an example in which the incident area 210 has a circular shape on a surface substantially parallel to the XY plane, but the invention is not limited thereto. The incident area 210 may have an elliptical, polygonal, trapezoidal, or other shape as long as it can guide the projection light to the branch area 220.

入射區域210具有以輸入瞳孔擴展器(Input Pupil Expander,IPE)週期形成有多個第一槽部212的繞射光柵。換言之,多個第一槽部212以預先規定的槽寬及間隔沿同一方向排列於投影基板100的上表面,藉此,作為繞射光柵發揮功能。入射區域210具有反射型或透射型的繞射光柵,藉由反射型繞射或透射型繞射將投影光導向分支區域220的方向。The incident area 210 has a diversion grating having a plurality of first grooves 212 formed in an input pupil expander (IPE) cycle. In other words, the plurality of first grooves 212 are arranged on the upper surface of the projection substrate 100 in the same direction with a predetermined groove width and interval, thereby functioning as a diversion grating. The incident area 210 has a reflective or transmissive diversion grating, and guides the projection light toward the direction of the branch area 220 by reflective diffraction or transmissive diffraction.

多個第一槽部212的IPE週期例如為10 nm左右至10 μm左右的範圍。IPE週期較佳為100 nm左右至1 μm左右的範圍。IPE週期更佳為200 nm左右至800 nm左右的範圍。多個第一槽部212的深度為1 nm左右至10 μm左右的範圍。多個第一槽部212的深度較佳為50 nm左右至800 nm左右的範圍。The IPE period of the plurality of first grooves 212 is, for example, in the range of about 10 nm to about 10 μm. The IPE period is preferably in the range of about 100 nm to about 1 μm. The IPE period is more preferably in the range of about 200 nm to about 800 nm. The depth of the plurality of first grooves 212 is in the range of about 1 nm to about 10 μm. The depth of the plurality of first grooves 212 is preferably in the range of about 50 nm to about 800 nm.

多個第一槽部212的填充因數為0.05左右至0.95左右的範圍。多個第一槽部212的填充因數較佳為0.3左右至0.7左右的範圍。此處,填充因數是鄰接的兩個第一槽部212之間的距離除以IPE週期所得的值。再者,有時將鄰接的兩個第一槽部212之間的距離稱作線(line),將第一槽部212的寬度稱作空間(space),將IPE週期稱作間距(pitch),此時,間距為線與空間之和,填充因數是線除以間距所得的值。The filling factor of the plurality of first grooves 212 is in the range of about 0.05 to about 0.95. The filling factor of the plurality of first grooves 212 is preferably in the range of about 0.3 to about 0.7. Here, the filling factor is a value obtained by dividing the distance between two adjacent first grooves 212 by the IPE period. Furthermore, sometimes the distance between two adjacent first grooves 212 is referred to as a line, the width of the first groove 212 is referred to as a space, and the IPE period is referred to as a pitch. In this case, the pitch is the sum of the line and the space, and the filling factor is a value obtained by dividing the line by the pitch.

多個第一槽部212例如沿自入射區域210朝向分支區域220的方向排列。此處,將自入射區域210朝向分支區域220的投影光的行進方向設為第一方向。圖5表示下述示例,即,第一方向為與X軸方向大致平行的方向,且沿第一方向排列有沿與Y軸方向大致平行的方向延伸的第一槽部212。投影光收聚且入射至入射區域210,因此入射區域210以在投影基板100的面內將第一方向作為中心而具有擴展角的方式將投影光導波至分支區域220。The plurality of first grooves 212 are arranged, for example, in a direction from the incident region 210 toward the branch region 220. Here, the traveling direction of the projection light from the incident region 210 toward the branch region 220 is set as the first direction. FIG. 5 shows an example in which the first direction is a direction substantially parallel to the X-axis direction, and the first grooves 212 extending in a direction substantially parallel to the Y-axis direction are arranged along the first direction. The projection light is converged and incident on the incident region 210, so the incident region 210 guides the projection light to the branch region 220 in a manner having a spread angle with the first direction as the center within the plane of the projection substrate 100.

<分支區域220的示例> 分支區域220將自入射區域210入射的投影光的一部分朝向出射區域230導波。分支區域220是在與XY平面大致平行的面上設於投影光所通過的區域。分支區域220具有反射型的繞射光柵,藉由反射型繞射將投影光導向出射區域230的方向。分支區域220例如具有將第一方向設為長邊方向的長方形的形狀。 <Example of branch region 220> The branch region 220 guides a portion of the projection light incident from the incident region 210 toward the exit region 230. The branch region 220 is a region provided on a surface substantially parallel to the XY plane where the projection light passes. The branch region 220 has a reflective diffraction grating, and guides the projection light in the direction of the exit region 230 by reflective diffraction. The branch region 220 has, for example, a rectangular shape with the first direction being the long side direction.

再者,投影光一邊以第一方向為中心擴展一邊行進,因此分支區域220較佳為具有以下述方式擴展的形狀,即,隨著遠離入射區域210,通過入射區域210且遠離投影光的行進方向即第一方向。分支區域220例如在與XY平面大致平行的面上具有梯形、扇形等的形狀。圖5表示分支區域220具有梯形形狀的示例。此種形狀的分支區域220可對應於投影光在XY平面上一邊擴展一邊行進的區域而形成,從而可有效率地對投影光進行導波。Furthermore, since the projection light travels while expanding with the first direction as the center, the branch region 220 preferably has a shape that expands in the following manner, that is, as it moves away from the incident region 210, it passes through the incident region 210 and moves away from the first direction, which is the direction in which the projection light travels. The branch region 220 has a shape such as a trapezoid or a fan on a surface that is substantially parallel to the XY plane. FIG. 5 shows an example in which the branch region 220 has a trapezoidal shape. The branch region 220 of this shape can be formed corresponding to the region in which the projection light travels while expanding on the XY plane, thereby efficiently guiding the projection light.

分支區域220中以在第一方向上反復的方式形成有由第一凸部與第一凹部構成的多個第一凹凸部。以下,將第一凹凸部稱作第二槽部222。即,分支區域220具有以第一週期形成有多個第二槽部222的第一繞射光柵。換言之,多個第二槽部222以預先規定的槽寬及間隔沿同一方向排列於投影基板100的上表面,藉此,作為繞射光柵發揮功能。分支區域220例如作為反射型的繞射光柵發揮功能,將投影光導向出射區域230。In the branch region 220, a plurality of first concave-convex portions consisting of a first convex portion and a first concave portion are repeatedly formed in a first direction. Hereinafter, the first concave-convex portion is referred to as a second groove portion 222. That is, the branch region 220 has a first diffraction grating having a plurality of second groove portions 222 formed in a first period. In other words, the plurality of second groove portions 222 are arranged in the same direction on the upper surface of the projection substrate 100 with a predetermined groove width and interval, thereby functioning as a diffraction grating. The branch region 220 functions as a reflective diffraction grating, for example, to guide the projection light to the exit region 230.

多個第二槽部222的第一週期是與多個第一槽部212的IPE週期不同的週期。理想的是,為了將投影光導向出射區域230,第一週期選擇適當的週期。第一週期例如為10 nm左右至10 μm左右的範圍。第一週期較佳為50 nm左右至1 μm左右的範圍。第一週期更佳為100 nm左右至700 nm左右的範圍。多個第二槽部222的深度為1 nm左右至10 μm左右的範圍。多個第二槽部222的深度較佳為5 nm左右至800 nm左右的範圍。The first period of the plurality of second grooves 222 is a period different from the IPE period of the plurality of first grooves 212. Ideally, in order to guide the projection light to the exit area 230, an appropriate period is selected as the first period. The first period is, for example, in the range of about 10 nm to about 10 μm. The first period is preferably in the range of about 50 nm to about 1 μm. The first period is more preferably in the range of about 100 nm to about 700 nm. The depth of the plurality of second grooves 222 is in the range of about 1 nm to about 10 μm. The depth of the plurality of second grooves 222 is preferably in the range of about 5 nm to about 800 nm.

多個第二槽部222例如沿預先規定的方向排列。例如,將自分支區域220朝向出射區域230的方向設為第二方向,將第一方向與第二方向所成的角設為第一角度。此時,多個第二槽部222是沿相對於第一方向朝第二方向傾斜第一角度的1/2角度的方向而形成。圖5表示下述示例,即,第二方向為與Y軸方向大致平行的方向,第一角度為大致90度,多個第二槽部222沿相對於第一方向朝第二方向傾斜了大致45度的方向排列。The plurality of second grooves 222 are arranged, for example, along a predetermined direction. For example, the direction from the branch region 220 toward the emission region 230 is set as the second direction, and the angle formed by the first direction and the second direction is set as the first angle. At this time, the plurality of second grooves 222 are formed along a direction that is inclined toward the second direction at an angle of 1/2 of the first angle relative to the first direction. FIG. 5 shows the following example, that is, the second direction is a direction substantially parallel to the Y-axis direction, the first angle is substantially 90 degrees, and the plurality of second grooves 222 are arranged along a direction that is inclined toward the second direction at a degree of substantially 45 relative to the first direction.

分支區域220具有沿入射的投影光的行進方向排列的多個第一分割區域224。形成於多個第一分割區域224的第二槽部222的深度各不相同。換言之,在分支區域220中,以所輸入的投影光中的被導波至出射區域230的光的比例對應於每個第一分割區域224而不同的方式,形成有第二槽部222。The branch region 220 has a plurality of first division regions 224 arranged along the traveling direction of the incident projection light. The depths of the second grooves 222 formed in the plurality of first division regions 224 are different. In other words, in the branch region 220, the second grooves 222 are formed in such a manner that the proportion of the light guided to the exit region 230 in the input projection light is different for each first division region 224.

理想的是分支區域220具有三個以上的第一分割區域224。形成於多個第一分割區域224的各者的多個第二槽部222的第一週期例如全部相同。如此,分支區域220被分割為多個第一分割區域224,藉由使導波至出射區域230的投影光的光量對應於每個第一分割區域224而不同,從而將根據距入射區域210的距離而強度不同的投影光導波至出射區域230,且將相對於投影光的行進方向垂直的方向的光量分佈調節為大致固定。It is desirable that the branch region 220 has three or more first division regions 224. The first periods of the plurality of second grooves 222 formed in each of the plurality of first division regions 224 are all the same, for example. In this way, the branch region 220 is divided into the plurality of first division regions 224, and the light amount of the projection light guided to the exit region 230 is made different for each first division region 224, so that the projection light having different intensities depending on the distance from the incident region 210 is guided to the exit region 230, and the light amount distribution in the direction perpendicular to the traveling direction of the projection light is adjusted to be substantially constant.

例如,以下述方式形成有第二槽部222,即,設於一個第一分割區域224的第二槽部222的深度大於設於較一個第一分割區域224更靠近入射區域210的第一分割區域224的第二槽部222的深度。此時,亦可為,越遠離入射區域210,多個第一分割區域224中鄰接的兩個第一分割區域224的第二槽部222的深度的變化率越大。For example, the second groove 222 is formed in such a manner that the depth of the second groove 222 provided in one first segmentation region 224 is greater than the depth of the second groove 222 provided in a first segmentation region 224 closer to the incident region 210 than the first segmentation region 224. In this case, the farther from the incident region 210, the greater the variation rate of the depth of the second groove 222 of two adjacent first segmentation regions 224 among the plurality of first segmentation regions 224.

作為一例,如圖5所示,考慮具有三個第一分割區域224的分支區域220。此處,三個第一分割區域224中的距入射區域210最近的第一分割區域224a是設為:第二槽部222形成為,使所入射的投影光的大致1/4光量的光導波至出射區域230。此時,入射至距入射區域210最近的第一分割區域224a的投影光的剩餘大致3/4的光量入射至鄰接的第一分割區域224b。As an example, as shown in Fig. 5, consider the branch region 220 having three first division regions 224. Here, the first division region 224a closest to the incident region 210 among the three first division regions 224 is configured such that the second groove portion 222 is formed so as to guide approximately 1/4 of the incident projection light to the exit region 230. At this time, the remaining approximately 3/4 of the projection light incident on the first division region 224a closest to the incident region 210 is incident on the adjacent first division region 224b.

距入射區域210第二近的第一分割區域224b是設為:第二槽部222的深度形成為,將所入射的投影光的大致1/3光量的光導波至出射區域230。換言之,距入射區域210第二近的第一分割區域224b的第二槽部222的深度形成為大於第一分割區域224a的第二槽部222的深度,以將與距入射區域210最近的第一分割區域224a相比為4/3倍的光量的光導波至出射區域230。此種第一分割區域224b將入射至距入射區域210最近的第一分割區域224a的投影光的大致1/4光量的光導波至出射區域230。The first segmented area 224b which is the second closest to the incident area 210 is configured such that the depth of the second groove 222 is formed so as to guide light of approximately 1/3 of the incident projection light to the exit area 230. In other words, the depth of the second groove 222 of the first segmented area 224b which is the second closest to the incident area 210 is formed to be greater than the depth of the second groove 222 of the first segmented area 224a so as to guide light of 4/3 times the amount of light as compared with the first segmented area 224a which is the closest to the incident area 210 to the exit area 230. Such first segmented area 224b guides light of approximately 1/4 of the amount of projection light incident on the first segmented area 224a which is the closest to the incident area 210 to the exit area 230.

並且,入射至距入射區域210最近的第一分割區域224a的投影光的剩餘大致1/2的光量入射至鄰接的第一分割區域224c。距入射區域210第三近的第一分割區域224c是設為:第二槽部222的深度形成為,將入射的投影光的大致1/2光量的光導波至出射區域230。換言之,距入射區域210第三近的第一分割區域224c的第二槽部222的深度形成為大於第一分割區域224b的第二槽部222的深度,以將與距入射區域210第二近的第一分割區域224b相比為3/2倍的光量的光導波至出射區域230。Furthermore, the remaining approximately 1/2 of the projection light incident on the first segmented area 224a closest to the incident area 210 is incident on the adjacent first segmented area 224c. The first segmented area 224c, which is the third closest to the incident area 210, is configured such that the depth of the second groove 222 is formed so as to guide approximately 1/2 of the incident projection light to the exit area 230. In other words, the depth of the second groove 222 of the first segmented area 224c, which is the third closest to the incident area 210, is formed to be greater than the depth of the second groove 222 of the first segmented area 224b so as to guide 3/2 times the light of the first segmented area 224b, which is the second closest to the incident area 210, to the exit area 230.

而且,三個第一分割區域224中鄰接的兩個第一分割區域224的第二槽部222的深度的變化率形成為,越遠離入射區域210則越大。並且,距入射區域210第三近的第一分割區域224c將入射至距入射區域210最近的第一分割區域224a的投影光的大致1/4光量的光導波至出射區域230。如以上的示例般可知,分支區域220使導波至出射區域230的投影光的光量對應於每個第一分割區域224而不同地設為規定的值,藉此,可將向與各個第一分割區域224對應的出射區域230導波的投影光的光量設為大致固定的分佈,且將投影光導波至出射區域230。即,分支區域220對於自入射區域210入射的投影光,可將相對於該投影光的行進方向垂直的方向的光量分佈調節為大致固定。因此,眼鏡型終端10可降低用戶所觀賞的投影圖像的亮度的不均。Furthermore, the variation rate of the depth of the second groove portion 222 of two adjacent first divided regions 224 among the three first divided regions 224 is formed to be larger as it is farther from the incident region 210. Furthermore, the first divided region 224c which is the third closest to the incident region 210 guides approximately 1/4 of the light amount of the projection light incident on the first divided region 224a which is closest to the incident region 210 to the exit region 230. As can be seen from the above example, the branch region 220 sets the light amount of the projection light guided to the exit region 230 to a predetermined value differently for each first divided region 224, thereby making it possible to set the light amount of the projection light guided to the exit region 230 corresponding to each first divided region 224 to a substantially fixed distribution and guide the projection light to the exit region 230. That is, the branch area 220 can adjust the light quantity distribution in the direction perpendicular to the traveling direction of the projection light incident from the incident area 210 to be substantially constant. Therefore, the eyeglass-type terminal 10 can reduce the uneven brightness of the projection image viewed by the user.

再者,分支區域220亦可在距入射區域210最遠的位置更具有作為第一分割區域224之一的第一反射區域226。圖5表示分支區域220具有三個第一分割區域224與第一反射區域226的示例。第一反射區域226將通過了多個第一分割區域224的光的至少一部分再次反射向多個第一分割區域224。第一反射區域226具有深度較鄰接的第一分割區域224的第二槽部222的深度大的第二槽部222。Furthermore, the branch region 220 may also have a first reflection region 226 as one of the first segment regions 224 at a position farthest from the incident region 210. FIG5 shows an example in which the branch region 220 has three first segment regions 224 and the first reflection region 226. The first reflection region 226 reflects at least a portion of the light that has passed through the plurality of first segment regions 224 again toward the plurality of first segment regions 224. The first reflection region 226 has a second groove portion 222 having a greater depth than the second groove portion 222 of the adjacent first segment region 224.

例如,理想的是,第一反射區域226的第二槽部222的深度具有多個第一分割區域224的第二槽部222中的最大深度的大致三倍以上的深度。更理想的是,第一反射區域226的第二槽部222的深度具有多個第一分割區域224的第二槽部222中的最大深度的大致十倍以上的深度。再者,第一反射區域226的第二槽部222亦可沿第一方向排列。For example, it is desirable that the depth of the second groove 222 of the first reflection region 226 is approximately three times or more the maximum depth of the second grooves 222 of the plurality of first segmented regions 224. More preferably, the depth of the second groove 222 of the first reflection region 226 is approximately ten times or more the maximum depth of the second grooves 222 of the plurality of first segmented regions 224. Furthermore, the second grooves 222 of the first reflection region 226 may also be arranged along the first direction.

藉由分支區域220具有此種第一反射區域226,多個第一分割區域224將第一反射區域226所反射的光的至少一部分導波向出射區域230。藉此,分支區域220可將更多的投影光導波向出射區域230。再者,多個第一分割區域224的第二槽部222的深度亦可被決定為,各個第一分割區域224將第一反射區域226所形成的反射光包含在內而使導波向出射區域230的投影光的光量大致固定。Since the branch region 220 has such a first reflection region 226, the plurality of first division regions 224 guide at least a portion of the light reflected by the first reflection region 226 to the output region 230. Thus, the branch region 220 can guide more projection light to the output region 230. Furthermore, the depth of the second groove portion 222 of the plurality of first division regions 224 can also be determined so that each first division region 224 includes the reflected light formed by the first reflection region 226 and the light amount of the projection light guided to the output region 230 is substantially constant.

多個第一分割區域224各自的凸部及凹部的寬度形成為,使第一填充因數成為規定的值。第一填充因數是一個第一分割區域224的第一凸部在第一方向上的寬度相對於第二槽部222的第一週期的比例。The widths of the convex and concave portions of the plurality of first division regions 224 are formed so that the first filling factor becomes a predetermined value. The first filling factor is the ratio of the width of the first convex portion of one first division region 224 in the first direction to the first period of the second groove portion 222 .

圖6是用於說明第一填充因數的圖。多個第二槽部222形成於玻璃基板112上。線240為第二槽部222的第一凸部222a的寬度。空間242為第二槽部222的第一凹部222b的寬度。間距244為線240與空間242的和,且為第一週期的長度。第一填充因數是線240除以間距244而得的值。再者,自第一凹部222b至玻璃基板112的長度248為10 nm以上且500 nm以下的範圍。長度248較佳為30 nm以上且200 nm以下的範圍。深度246為第二槽部222的深度。FIG6 is a diagram for explaining the first filling factor. A plurality of second grooves 222 are formed on the glass substrate 112. Line 240 is the width of the first convex portion 222a of the second groove 222. Space 242 is the width of the first concave portion 222b of the second groove 222. Spacing 244 is the sum of line 240 and space 242, and is the length of the first period. The first filling factor is the value obtained by dividing line 240 by spacing 244. Furthermore, a length 248 from the first concave portion 222b to the glass substrate 112 is in the range of greater than 10 nm and less than 500 nm. The length 248 is preferably in the range of greater than 30 nm and less than 200 nm. Depth 246 is the depth of the second groove 222.

作為第一分割區域224之一的第一反射區域226的第一填充因數為不包含規定值的範圍內。預定值例如為0.5。若列舉具體例,則第一反射區域226的第一填充因數為不包含規定值0.5的0.35以下或0.65以上的範圍內。較第一反射區域226更靠近入射區域210的第一分割區域224的第一填充因數為包含規定值0.5的範圍內。若列舉具體例,則第一分割區域224a、第一分割區域224b以及第一分割區域224c的第一填充因數為0.3以上且0.7以下的範圍內。The first filling factor of the first reflection area 226, which is one of the first segmented areas 224, is within a range that does not include a specified value. The predetermined value is, for example, 0.5. To give a specific example, the first filling factor of the first reflection area 226 is within a range that does not include the specified value 0.5 and is less than 0.35 or greater than 0.65. The first filling factor of the first segmented area 224 that is closer to the incident area 210 than the first reflection area 226 is within a range that includes the specified value 0.5. To give a specific example, the first filling factors of the first segmented area 224a, the first segmented area 224b, and the first segmented area 224c are within a range that is greater than 0.3 and less than 0.7.

關於第一反射區域226的第一填充因數與較第一反射區域226更靠近入射區域210的第一分割區域224c的第一填充因數之差,若第一反射區域226的第二槽部222的深度與第一分割區域224c的第二槽部222的深度之差的絕對值越大,則其越小。若列舉具體例,則在第一反射區域226的第二槽部222的深度與第一分割區域224c的第二槽部222的深度之差為180 nm的情況下,第一反射區域226的第一填充因數與較第一反射區域226更靠近入射區域210的第一分割區域224c的第一填充因數之差為0.35。另一方面,在第一反射區域226的第二槽部222的深度與第一分割區域224c的第二槽部222的深度之差為680 nm的情況下,第一反射區域226的第一填充因數與較第一反射區域226更靠近入射區域210的第一分割區域224c的第一填充因數之差為0.30。Regarding the difference between the first filling factor of the first reflection region 226 and the first segment region 224c closer to the incident region 210 than the first reflection region 226, the greater the absolute value of the difference between the depth of the second groove portion 222 of the first reflection region 226 and the depth of the second groove portion 222 of the first segment region 224c, the smaller it is. To give a specific example, when the difference between the depth of the second groove portion 222 of the first reflection region 226 and the depth of the second groove portion 222 of the first segment region 224c is 180 nm, the difference between the first filling factor of the first reflection region 226 and the first segment region 224c closer to the incident region 210 than the first reflection region 226 is 0.35. On the other hand, when the difference between the depth of the second groove 222 of the first reflection area 226 and the depth of the second groove 222 of the first segmentation area 224c is 680 nm, the difference between the first filling factor of the first reflection area 226 and the first segmentation area 224c closer to the incident area 210 than the first reflection area 226 is 0.30.

<出射區域230的示例> 出射區域230對自分支區域220入射的投影光的至少一部分進行導波並自投影基板100的第二面作為圖像光而出射。圖5表示下述示例,即,出射區域230在與XY平面大致平行的面上具有將X軸方向設為長邊方向的長方形的形狀,但並不限定於此。出射區域230只要可對投影光進行導波並作為圖像光而出射即可,例如可具有將Y軸方向設為長邊方向的長方形、正方形、梯形等的形狀。 <Example of the emission area 230> The emission area 230 guides at least a portion of the projection light incident from the branch area 220 and emits it from the second surface of the projection substrate 100 as image light. FIG5 shows an example in which the emission area 230 has a rectangular shape with the X-axis direction as the long side direction on a surface substantially parallel to the XY plane, but is not limited thereto. The emission area 230 may have any shape as long as it can guide the projection light and emit it as image light, for example, it may have a rectangular shape, a square shape, a trapezoid shape, etc. with the Y-axis direction as the long side direction.

出射區域230中形成有多個第三槽部232,所述多個第三槽部232是以在第二方向上反復的方式形成的由第二凸部與第二凹部構成的多個第二凹凸部。即,出射區域230具有以第二週期形成有多個第三槽部232的第二繞射光柵。換言之,多個第三槽部232以預先規定的槽寬以及間隔沿同一方向排列於投影基板100的上表面,藉此,作為繞射光柵發揮功能。出射區域230具有反射型或透射型的繞射光柵,藉由反射型繞射或透射型繞射而將圖像光導向用戶的眼的方向。A plurality of third grooves 232 are formed in the emission area 230, and the plurality of third grooves 232 are a plurality of second concave-convex portions composed of second convex portions and second concave portions formed in a repeated manner in the second direction. That is, the emission area 230 has a second diffraction grating having a plurality of third grooves 232 formed in a second period. In other words, the plurality of third grooves 232 are arranged on the upper surface of the projection substrate 100 in the same direction with a predetermined groove width and interval, thereby functioning as a diffraction grating. The emission area 230 has a reflective or transmissive diffraction grating, and guides the image light toward the user's eyes by reflective diffraction or transmissive diffraction.

設於出射區域230的多個第三槽部232的第二週期是與分支區域220的多個第二槽部222的第一週期不同的週期。出射區域230的多個第三槽部232的第二週期亦可為與入射區域210的多個第一槽部212的IPE週期相同的週期。如此,藉由使設於投影光所入射的入射區域210與出射圖像光的出射區域230的繞射光柵的週期一致,從而可降低用戶所觀賞的圖像產生的變形等。The second period of the plurality of third grooves 232 provided in the exit area 230 is a period different from the first period of the plurality of second grooves 222 in the branch area 220. The second period of the plurality of third grooves 232 in the exit area 230 may also be the same period as the IPE period of the plurality of first grooves 212 in the incident area 210. In this way, by making the periods of the diffraction grating provided in the incident area 210 where the projection light is incident and the exit area 230 where the image light is emitted consistent, the distortion of the image viewed by the user can be reduced.

第二週期例如在10 nm左右至10 μm左右的範圍內形成。第二週期較佳為在100 nm左右至1 μm左右的範圍內形成。第二週期更佳為在200 nm左右至800 nm左右的範圍內形成。多個第三槽部232的深度在1 nm左右至10 μm左右的範圍內形成。多個第三槽部232的深度較佳為在5 nm左右至800 nm左右的範圍內形成。The second period is formed, for example, in a range of about 10 nm to about 10 μm. The second period is preferably formed in a range of about 100 nm to about 1 μm. The second period is more preferably formed in a range of about 200 nm to about 800 nm. The depth of the plurality of third grooves 232 is formed in a range of about 1 nm to about 10 μm. The depth of the plurality of third grooves 232 is preferably formed in a range of about 5 nm to about 800 nm.

多個第三槽部232例如沿自分支區域220朝向出射區域230的第二方向排列。圖5表示沿第一方向延伸的第三槽部232沿第二方向排列的示例。The plurality of third grooves 232 are arranged, for example, along the second direction from the branch region 220 toward the emission region 230. Fig. 5 shows an example in which the third grooves 232 extending along the first direction are arranged along the second direction.

出射區域230與分支區域220同樣地,具有沿自分支區域220入射的投影光的行進方向排列的多個第二分割區域234。形成於多個第二分割區域234的第三槽部232的深度各不相同。換言之,在出射區域230中,第三槽部232形成為,所輸入的投影光中的作為圖像光而出射的光的比例對應於每個第二分割區域234而不同。The exit region 230 has a plurality of second divided regions 234 arranged along the traveling direction of the projection light incident from the branch region 220, similarly to the branch region 220. The depths of the third grooves 232 formed in the plurality of second divided regions 234 are different. In other words, in the exit region 230, the third grooves 232 are formed so that the proportion of light emitted as image light in the input projection light is different for each second divided region 234.

理想的是,出射區域230具有兩個以上的第二分割區域234。例如,設於一個第二分割區域234的第三槽部232的深度形成為大於設於較一個第二分割區域234更靠近分支區域220的第二分割區域234的第三槽部232的深度。而且,在出射區域230具有三個以上的第二分割區域234的情況下,亦可為,越遠離分支區域220,鄰接的兩個第二分割區域234的第三槽部232的深度的變化率越大。再者,多個第三槽部232的各個第二週期例如全部相同。It is desirable that the emission region 230 has two or more second segment regions 234. For example, the depth of the third groove 232 provided in one second segment region 234 is formed to be greater than the depth of the third groove 232 provided in the second segment region 234 closer to the branch region 220 than the one second segment region 234. Moreover, in the case where the emission region 230 has three or more second segment regions 234, the variation rate of the depth of the third groove 232 of two adjacent second segment regions 234 may be greater as the distance from the branch region 220 increases. Furthermore, the second periods of the plurality of third grooves 232 are all the same, for example.

如上所述,出射區域230被分割為多個第二分割區域234,使作為圖像光而出射的光的光量對應於每個第二分割區域234而不同。藉此,出射區域230與分支區域220的多個第一分割區域224同樣地,可將投影光作為圖像光進行導波,且在觀測者將圖像光觀測為圖像時可將圖像整體的光量分佈調節為大致固定。As described above, the emission area 230 is divided into a plurality of second divided areas 234, so that the light amount of light emitted as image light is different for each second divided area 234. Thus, the emission area 230 can guide the projection light as image light, similarly to the plurality of first divided areas 224 of the branch area 220, and when an observer observes the image light as an image, the light amount distribution of the entire image can be adjusted to be substantially constant.

出射區域230亦可在距分支區域220最遠的位置更具有作為第二分割區域234之一的第二反射區域236。圖5表示出射區域230具有兩個第二分割區域234與第二反射區域236的示例。第二反射區域236將通過了多個第二分割區域234的光的至少一部分再次反射向多個第二分割區域234。第二反射區域236具有深度較鄰接的第二分割區域234的第三槽部232的深度大的第三槽部232。The emission region 230 may further include a second reflection region 236 as one of the second segment regions 234 at a position farthest from the branch region 220. FIG5 shows an example in which the emission region 230 includes two second segment regions 234 and a second reflection region 236. The second reflection region 236 reflects at least a portion of light that has passed through the plurality of second segment regions 234 back toward the plurality of second segment regions 234. The second reflection region 236 includes a third groove portion 232 having a greater depth than the third groove portion 232 of the adjacent second segment region 234.

例如,理想的是,第二反射區域236的第三槽部232的深度具有多個第二分割區域234的第三槽部232中的最大深度的大致三倍以上的深度。更理想的是,第二反射區域236的第三槽部232的深度具有多個第二分割區域234的第三槽部232中的最大深度的大致十倍以上的深度。For example, it is desirable that the depth of the third groove 232 of the second reflection region 236 is approximately three times greater than the maximum depth of the third grooves 232 of the plurality of second segmented regions 234. More desirably, the depth of the third groove 232 of the second reflection region 236 is approximately ten times greater than the maximum depth of the third grooves 232 of the plurality of second segmented regions 234.

藉由出射區域230具有此種第二反射區域236,從而多個第二分割區域234將第二反射區域236所反射的光的至少一部分自投影基板100的第二面作為圖像光而出射。藉此,出射區域230與分支區域220同樣地,可將更多的投影光出射為圖像光。再者,多個第二分割區域234的第三槽部232的深度亦可被決定為,各個第二分割區域234將第二反射區域236所形成的反射光包含在內而使作為圖像光所出射的光的光量大致固定。Since the emission region 230 has such a second reflection region 236, the plurality of second divided regions 234 emit at least a portion of the light reflected by the second reflection region 236 from the second surface of the projection substrate 100 as image light. Thus, the emission region 230 can emit more projection light as image light, similarly to the branch region 220. Furthermore, the depth of the third groove portion 232 of the plurality of second divided regions 234 can also be determined so that each second divided region 234 includes the reflected light formed by the second reflection region 236, and the light amount of the light emitted as image light is substantially constant.

多個第二分割區域234各自的凸部及凹部的寬度形成為,使第二填充因數成為規定的值。第二填充因數是第二凸部在第二方向上的寬度相對於第三槽部232的第二週期的比例。The widths of the convex and concave portions of each of the plurality of second divided regions 234 are formed so that the second filling factor becomes a predetermined value. The second filling factor is the ratio of the width of the second convex portion in the second direction to the second period of the third groove portion 232 .

第二分割區域234a、第二分割區域234b以及第二分割區域234c的第二填充因數為包含規定值的範圍內。規定值例如為0.5。若列舉具體例,則第二分割區域234a、第二分割區域234b以及第二分割區域234c的第二填充因數為包含規定值0.5的0.3以上且0.7以下的範圍內。The second filling factors of the second partition area 234a, the second partition area 234b, and the second partition area 234c are within a range including a specified value. The specified value is, for example, 0.5. To give a specific example, the second filling factors of the second partition area 234a, the second partition area 234b, and the second partition area 234c are within a range of 0.3 or more and 0.7 or less including the specified value 0.5.

第二反射區域236的第二填充因數為不包含規定值0.5的範圍內。例如,第二反射區域236的第二填充因數為0.35以下或0.65以上,但並不限定於此。The second filling factor of the second reflection area 236 is within a range that does not include the specified value 0.5. For example, the second filling factor of the second reflection area 236 is less than 0.35 or greater than 0.65, but is not limited thereto.

而且,第二反射區域236的第三槽部232的深度與第二分割區域234的第三槽部232的深度之差的絕對值越大,第二反射區域236的第二填充因數與第二分割區域234的第二填充因數之差的絕對值越小。若列舉具體例,則在第二反射區域236的第三槽部232的深度與第二分割區域234的第三槽部232的深度之差為70 nm的情況下,第二反射區域236的第二填充因數與較第二反射區域236更靠近分支區域220的第二分割區域234的第二填充因數之差為0.1。另一方面,在第二反射區域236的第三槽部232的深度與第二分割區域234的第三槽部232的深度之差為470 nm的情況下,第二反射區域236的第二填充因數與較第二反射區域236更靠近分支區域220的第二分割區域234的第二填充因數之差為0.00。Moreover, the greater the absolute value of the difference between the depth of the third groove portion 232 of the second reflection region 236 and the depth of the third groove portion 232 of the second segment region 234, the smaller the absolute value of the difference between the second filling factor of the second reflection region 236 and the second segment region 234. To give a specific example, when the difference between the depth of the third groove portion 232 of the second reflection region 236 and the depth of the third groove portion 232 of the second segment region 234 is 70 nm, the difference between the second filling factor of the second reflection region 236 and the second filling factor of the second segment region 234 closer to the branch region 220 than the second reflection region 236 is 0.1. On the other hand, when the difference between the depth of the third groove 232 of the second reflection region 236 and the depth of the third groove 232 of the second segmentation region 234 is 470 nm, the difference between the second filling factor of the second reflection region 236 and the second filling factor of the second segmentation region 234 closer to the branch region 220 than the second reflection region 236 is 0.00.

圖7的(a)~圖7的(d)是表示在瞳孔上成像的圖像的亮度模擬結果的圖。圖7的(a)~圖7的(d)的縱軸以及橫軸表示像素的位置。圖7的(a)~圖7的(d)示出了在第一反射區域226的第一填充因數不同的多個條件下對圖像的亮度進行模擬的結果。FIG7 (a) to FIG7 (d) are diagrams showing the brightness simulation results of an image formed on the pupil. The vertical axis and horizontal axis of FIG7 (a) to FIG7 (d) represent the positions of pixels. FIG7 (a) to FIG7 (d) show the results of simulating the brightness of the image under multiple conditions with different first fill factors in the first reflective area 226.

對第一反射區域226的第一填充因數以外的條件進行說明。 入射區域210的第一槽部212的深度為100 nm以上且200 nm以下。IPE週期的長度為350 nm以上且450 nm以下。 Conditions other than the first filling factor of the first reflection region 226 are described. The depth of the first groove portion 212 of the incident region 210 is greater than 100 nm and less than 200 nm. The length of the IPE period is greater than 350 nm and less than 450 nm.

第一分割區域224a、第一分割區域224b以及第一分割區域224c的第二槽部222的深度為5 nm以上且100 nm以下。第一分割區域224a、第一分割區域224b以及第一分割區域224c的第一週期為200 nm以上且300 nm以下。第一反射區域226的第二槽部222的深度為100 nm以上且700 nm以下。第一反射區域226的第二槽部222的第一週期為200 nm以上且300 nm以下。The depth of the second groove 222 of the first segmented area 224a, the first segmented area 224b, and the first segmented area 224c is greater than 5 nm and less than 100 nm. The first period of the first segmented area 224a, the first segmented area 224b, and the first segmented area 224c is greater than 200 nm and less than 300 nm. The depth of the second groove 222 of the first reflective area 226 is greater than 100 nm and less than 700 nm. The first period of the second groove 222 of the first reflective area 226 is greater than 200 nm and less than 300 nm.

第二分割區域234的第三槽部232的深度為5 nm以上且100 nm以下。第二分割區域234的第三槽部232的第一週期為350 nm以上且450 nm以下。The depth of the third groove portion 232 of the second divided region 234 is greater than or equal to 5 nm and less than or equal to 100 nm. The first period of the third groove portion 232 of the second divided region 234 is greater than or equal to 350 nm and less than or equal to 450 nm.

第二反射區域236的第三槽部232的深度為100 nm以上且700 nm以下。第二反射區域236的第三槽部232的第一週期為350 nm以上且450 nm以下。 玻璃基板112的厚度為0.4 mm。自第一凹部222b至玻璃基板112的長度248為100 nm。 The depth of the third groove portion 232 of the second reflection region 236 is greater than 100 nm and less than 700 nm. The first period of the third groove portion 232 of the second reflection region 236 is greater than 350 nm and less than 450 nm. The thickness of the glass substrate 112 is 0.4 mm. The length 248 from the first recess 222b to the glass substrate 112 is 100 nm.

圖7的(a)是第一反射區域226的第一填充因數為0.4的情況下的模擬結果。圖7的(b)是第一反射區域226的第一填充因數為0.5的情況下的模擬結果。圖7的(c)是第一反射區域226的第一填充因數為0.6的情況下的模擬結果。圖7的(d)是第一反射區域226的第一填充因數為0.85的情況下的模擬結果。FIG7 (a) is a simulation result when the first filling factor of the first reflection area 226 is 0.4. FIG7 (b) is a simulation result when the first filling factor of the first reflection area 226 is 0.5. FIG7 (c) is a simulation result when the first filling factor of the first reflection area 226 is 0.6. FIG7 (d) is a simulation result when the first filling factor of the first reflection area 226 is 0.85.

圖7的(a)~圖7的(d)的暗部表示亮度低。如圖7的(a)~圖7的(d)所示,第一反射區域226的第一填充因數越遠離0.5,圖像整體的亮度的不均越低,亮度越固定。如此,藉由形成第二槽部222以及第三槽部232,以使分支區域220以及出射區域230的繞射光柵的填充因數成為適當的值,能夠降低亮度偏差。The dark areas in FIG. 7 (a) to FIG. 7 (d) indicate low brightness. As shown in FIG. 7 (a) to FIG. 7 (d), the further the first filling factor of the first reflection area 226 is from 0.5, the lower the unevenness of the brightness of the entire image and the more constant the brightness. In this way, by forming the second groove 222 and the third groove 232, the filling factor of the diffraction grating of the branch area 220 and the output area 230 becomes an appropriate value, which can reduce brightness deviation.

如上所述,本實施方式的投影基板100對於入射至入射區域210的投影光,對應於分支區域220的多個第一分割區域224的每一個而以不同的比例來使投影光分支,並自出射區域230作為圖像光而出射。藉此,投影基板100可降低用戶所觀賞的投影圖像的亮度的不均。而且,投影基板100在出射區域230中,亦對應於多個第二分割區域234的每一個而以不同的比例來出射圖像光,藉此,可進一步降低圖像的亮度的不均。As described above, the projection substrate 100 of the present embodiment branches the projection light incident on the incident area 210 at different ratios corresponding to each of the plurality of first divided areas 224 of the branch area 220, and emits the projection light as image light from the emission area 230. Thus, the projection substrate 100 can reduce the unevenness of the brightness of the projection image viewed by the user. Furthermore, the projection substrate 100 also emits the image light at different ratios corresponding to each of the plurality of second divided areas 234 in the emission area 230, thereby further reducing the unevenness of the brightness of the image.

此種投影基板100可藉由在玻璃基板等的第一面或第二面形成與入射區域210、分支區域220以及出射區域230對應的繞射光柵而實現。再者,形成繞射光柵的槽部例如為抗蝕劑、樹脂等。因此,本實施方式的投影基板100是如下所述的基板,即,無須裝入複雜的光學系統,藉由在每個區域形成預先規定的週期、深度的槽部便可簡便地生產。Such a projection substrate 100 can be realized by forming a diffraction grating corresponding to the incident area 210, the branch area 220, and the exit area 230 on the first surface or the second surface of a glass substrate. Furthermore, the groove portion forming the diffraction grating is, for example, an anti-etching agent, a resin, etc. Therefore, the projection substrate 100 of the present embodiment is a substrate as described below, that is, it does not need to be installed in a complex optical system, and can be simply produced by forming a groove portion with a predetermined period and depth in each area.

<眼鏡型終端10的另一例> 已對下述眼鏡型終端10的示例進行了說明,即,將以上的投影基板100設於框架110,投影部120將投影光照射至投影基板100的入射區域210,但並不限定於此。例如,亦可在眼鏡型終端10的框架110固定有多個投影基板100。接下來,對此種眼鏡型終端10進行說明。 <Another example of the eyeglass type terminal 10> The example of the eyeglass type terminal 10 described below has been described, that is, the above-mentioned projection substrate 100 is set on the frame 110, and the projection unit 120 irradiates the projection light to the incident area 210 of the projection substrate 100, but it is not limited to this. For example, a plurality of projection substrates 100 may be fixed to the frame 110 of the eyeglass type terminal 10. Next, this eyeglass type terminal 10 is described.

圖8表示本實施方式的眼鏡型終端10的變形例。變形例的眼鏡型終端10中,對於與圖1所示的本實施方式的眼鏡型終端10的動作大致相同者標註相同的符號,並省略說明。變形例的眼鏡型終端10的外觀可為與圖1所示的眼鏡型終端10相比幾乎無變化的外觀。FIG8 shows a modification of the spectacles type terminal 10 of the present embodiment. In the spectacles type terminal 10 of the modification, the same symbols are used for the operations that are substantially the same as those of the spectacles type terminal 10 of the present embodiment shown in FIG1, and the description thereof is omitted. The appearance of the spectacles type terminal 10 of the modification may be almost unchanged from that of the spectacles type terminal 10 shown in FIG1.

在變形例的眼鏡型終端10的框架110固定有多個投影基板100。此時,以分別設於多個投影基板100的出射區域230在與XY平面大致平行的俯視時至少一部分重疊的方式,將多個投影基板100固定於框架110。圖8表示下述示例,即,在眼鏡型終端10的框架110固定有三個投影基板100R、投影基板100G以及投影基板100B,三個投影基板100的出射區域230R、出射區域230G以及出射區域230B在XY平面上的俯視時重疊。A plurality of projection substrates 100 are fixed to the frame 110 of the eyeglass type terminal 10 of the modification. At this time, the plurality of projection substrates 100 are fixed to the frame 110 in such a manner that the emission areas 230 provided on the plurality of projection substrates 100 at least partially overlap when viewed from above in a direction substantially parallel to the XY plane. FIG8 shows an example in which three projection substrates 100R, 100G, and 100B are fixed to the frame 110 of the eyeglass type terminal 10, and the emission areas 230R, 230G, and 230B of the three projection substrates 100 overlap when viewed from above on the XY plane.

投影部120將不同波長的投影光分別照射至分別設於多個投影基板100的入射區域210。藉此,分別設於多個投影基板100的出射區域230將與自投影部120分別照射至多個入射區域210的投影光對應的圖像光自多個投影基板100的第二面分別出射至用戶的眼。The projection unit 120 irradiates projection lights of different wavelengths to the incident areas 210 respectively disposed on the plurality of projection substrates 100. Thus, the emission areas 230 respectively disposed on the plurality of projection substrates 100 emit image lights corresponding to the projection lights irradiated from the projection unit 120 to the plurality of incident areas 210 respectively from the second surfaces of the plurality of projection substrates 100 to the eyes of the user.

佩戴著此種眼鏡型終端10的用戶將觀賞到不同波長的圖像光重疊而成的圖像,因此可觀賞具有混色的顏色的圖像。圖8表示下述示例,即,投影部120將與形成圖像的紅、綠及藍這RGB三原色對應的三個投影光分別照射至三個投影基板100的入射區域210。並且,三個投影基板100將與RGB三原色對應的三個圖像光重疊出射至用戶的眼。藉此,用戶例如可觀賞具有2 n的多種顏色的圖像。此處,n為4、8、16、24等的正整數。 A user wearing such a glasses-type terminal 10 will see an image formed by overlapping image lights of different wavelengths, and thus can see an image with mixed colors. FIG8 shows an example in which the projection unit 120 irradiates three projection lights corresponding to the three primary colors of RGB, namely red, green and blue, which form an image, to the incident areas 210 of the three projection substrates 100, respectively. Furthermore, the three projection substrates 100 overlap the three image lights corresponding to the three primary colors of RGB and emit them to the user's eyes. Thus, the user can see images with 2n multiple colors, for example. Here, n is a positive integer such as 4, 8, 16, 24, etc.

以上,使用實施方式說明了本發明,但本發明的技術範圍並不限定於所述實施方式記載的範圍,可在其主旨的範圍內進行各種變形以及變更。例如,裝置的全部或一部分能夠以任意的單位來功能性或物理性地分散/統合而構成。而且,藉由多個實施方式的任意組合而產生的新的實施方式亦包含於本發明的實施方式。藉由組合而產生的新的實施方式的效果兼具原實施方式的效果。The present invention has been described above using the embodiments, but the technical scope of the present invention is not limited to the scope described in the embodiments, and various modifications and changes can be made within the scope of its main purpose. For example, all or part of the device can be functionally or physically dispersed/integrated and constructed in any unit. Moreover, a new embodiment generated by any combination of multiple embodiments is also included in the embodiment of the present invention. The effect of the new embodiment generated by the combination has the effect of the original embodiment.

10:眼鏡型終端 20a:第一輸入光線 20b:第二輸入光線 20c:第三輸入光線 20d:第四輸入光線 20e:第五輸入光線 30a:第一輸出光線束 30b:第二輸出光線束 30c:第三輸出光線束 30d:第四輸出光線束 30e:第五輸出光線束 100、100a、100b、100B、100G、100R:投影基板 110:框架 112:玻璃基板 120、120a、120b:投影部 210:入射區域 212:第一槽部 220:分支區域 222:第二槽部 222a:第一凸部 222b:第一凹部 224a、224b、224c:第一分割區域 226:第一反射區域 230、230B、230G、230R:出射區域 232:第三槽部 234:第二分割區域 236:第二反射區域 240:線 242:空間 244:間距 246:深度 248:長度 C:圓形區域 d:距離 L、L1、L2:投影光 M1、M2:圖像 P:圖像光 10: Eyeglass type terminal 20a: First input light 20b: Second input light 20c: Third input light 20d: Fourth input light 20e: Fifth input light 30a: First output light beam 30b: Second output light beam 30c: Third output light beam 30d: Fourth output light beam 30e: Fifth output light beam 100, 100a, 100b, 100B, 100G, 100R: Projection substrate 110: Frame 112: Glass substrate 120, 120a, 120b: Projection section 210: Incident region 212: First groove section 220: Branch region 222: Second groove section 222a: First convex section 222b: first concave portion 224a, 224b, 224c: first segmented area 226: first reflection area 230, 230B, 230G, 230R: emission area 232: third groove 234: second segmented area 236: second reflection area 240: line 242: space 244: spacing 246: depth 248: length C: circular area d: distance L, L1, L2: projection light M1, M2: image P: image light

圖1表示本實施方式的眼鏡型終端10的結構例。 圖2表示本實施方式的眼鏡型終端10中的投影光的光路的概略。 圖3表示本實施方式的投影基板100中的投影光的光路的概略。 圖4表示本實施方式的投影部120照射至投影基板100的投影光與投影基板100所出射的圖像光的一例。 圖5表示本實施方式的投影基板100的結構例。 圖6是用於說明第一填充因數的圖。 圖7的(a)~圖7的(d)是表示在瞳孔上成像的圖像的亮度模擬結果的圖。 圖8表示本實施方式的眼鏡型終端10的變形例。 FIG. 1 shows a structural example of the eyeglass type terminal 10 of the present embodiment. FIG. 2 shows a schematic diagram of the optical path of the projection light in the eyeglass type terminal 10 of the present embodiment. FIG. 3 shows a schematic diagram of the optical path of the projection light in the projection substrate 100 of the present embodiment. FIG. 4 shows an example of the projection light irradiated to the projection substrate 100 by the projection unit 120 of the present embodiment and the image light emitted by the projection substrate 100. FIG. 5 shows a structural example of the projection substrate 100 of the present embodiment. FIG. 6 is a diagram for explaining the first filling factor. FIG. 7 (a) to FIG. 7 (d) are diagrams showing the brightness simulation results of the image formed on the pupil. FIG. 8 shows a modified example of the eyeglass type terminal 10 of the present embodiment.

112:玻璃基板 112: Glass substrate

220:分支區域 220: Branch area

222:第二槽部 222: Second groove

222a:第一凸部 222a: first convex part

222b:第一凹部 222b: first recess

240:線 240: Line

242:空間 242: Space

244:間距 244: Spacing

246:深度 246: Depth

248:長度 248: Length

Claims (7)

一種投影基板,用於使自第一面入射的光的至少一部分透射至所述第一面的相反側的第二面,且使圖像光投影至所述第二面,所述投影基板包括:入射區域,供用於使所述圖像光投影的投影光入射;分支區域,具有對自所述入射區域入射的所述投影光進行導波的第一繞射光柵;以及出射區域,具有對自所述分支區域入射的所述投影光的一部分進行導波後自所述第二面出射所述投影光的一部分的第二繞射光柵,所述入射區域將入射的所述投影光導波至所述分支區域,所述分支區域使所述投影光的一部分朝向所述出射區域繞射,所述第一繞射光柵具有由第一凸部與第一凹部構成的多個第一凹凸部,所述多個第一凹凸部以在對所述投影光進行導波的第一方向上反復的方式形成,所述分支區域具有多個第一分割區域,一個第一分割區域中所述第一凸部在所述第一方向上的寬度相對於所述第一凹凸部的第一週期的比例即第一填充因數為不包含規定值的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為包含所述規定值的範圍內, 所述一個第一分割區域的所述第一凹凸部的深度大於較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度,所述一個第一分割區域的所述第一凹凸部的深度與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度之差的絕對值越大,所述一個第一分割區域的第一填充因數與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數之差的絕對值越小,其中,所述規定值為0.5,所述多個第一分割區域中的距所述入射區域最遠的所述一個第一分割區域的第一填充因數為0.35以下或0.65以上的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為0.3以上且0.7以下的範圍內。 A projection substrate is used to transmit at least a portion of light incident from a first surface to a second surface on the opposite side of the first surface, and to project image light onto the second surface, the projection substrate comprising: an incident area for incident projection light for projecting the image light; a branch area having a first diffraction grating for guiding the projection light incident from the incident area; and an exit area having a second diffraction grating for guiding a portion of the projection light incident from the branch area and then emitting a portion of the projection light from the second surface, the incident area The first diffraction grating has a plurality of first concave-convex portions formed by first convex portions and first concave portions, and the plurality of first concave-convex portions are formed in a manner of repeatedly guiding the projection light in a first direction, and the branch region has a plurality of first segmented regions, and a ratio of a width of the first convex portion in the first direction to a first period of the first concave-convex portion in one first segmented region, that is, a first filling factor, is not included. The first filling factor of the first segmented area closer to the incident area than the first segmented area is within a range including the specified value, the depth of the first concave-convex portion of the first segmented area is greater than the depth of the first concave-convex portion of the first segmented area closer to the incident area than the first segmented area, and the absolute value of the difference between the depth of the first concave-convex portion of the first segmented area and the depth of the first concave-convex portion of the first segmented area closer to the incident area than the first segmented area is The larger the value is, the smaller the absolute value of the difference between the first filling factor of the first segmented area and the first filling factor of the first segmented area closer to the incident area than the first segmented area is, wherein the specified value is 0.5, the first filling factor of the first segmented area farthest from the incident area among the multiple first segmented areas is within the range of 0.35 or less or 0.65 or more, and the first filling factor of the first segmented area closer to the incident area than the first segmented area is within the range of 0.3 or more and 0.7 or less. 如請求項1所述的投影基板,其中,所述多個第一分割區域各自的所述第一凹凸部的所述第一週期相同。 A projection substrate as described in claim 1, wherein the first period of the first concave-convex portion of each of the plurality of first divided regions is the same. 一種投影基板,用於使自第一面入射的光的至少一部分透射至所述第一面的相反側的第二面,且使圖像光投影至所述第二面,所述投影基板包括:入射區域,供用於使所述圖像光投影的投影光入射; 分支區域,具有對自所述入射區域入射的所述投影光進行導波的第一繞射光柵;以及出射區域,具有對自所述分支區域入射的所述投影光的一部分進行導波後自所述第二面出射所述投影光的一部分的第二繞射光柵,所述入射區域將入射的所述投影光導波至所述分支區域,所述分支區域使所述投影光的一部分朝向所述出射區域繞射,所述第一繞射光柵具有由第一凸部與第一凹部構成的多個第一凹凸部,所述多個第一凹凸部以在對所述投影光進行導波的第一方向上反復的方式形成,所述分支區域具有多個第一分割區域,一個第一分割區域中所述第一凸部在所述第一方向上的寬度相對於所述第一凹凸部的第一週期的比例即第一填充因數為不包含規定值的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為包含所述規定值的範圍內,所述一個第一分割區域的所述第一凹凸部的深度大於較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度,所述一個第一分割區域的所述第一凹凸部的深度與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度之差的絕對值越大,所述一個第一分割區域的第一 填充因數與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數之差的絕對值越小,其中,所述第二繞射光柵具有由第二凸部與第二凹部構成的多個第二凹凸部,所述多個第二凹凸部以在對所述投影光進行導波的第二方向上反復的方式形成,所述出射區域具有多個第二分割區域,所述多個第二分割區域中的較一個第二分割區域更靠近所述分支區域的第二分割區域中所述第二凸部在所述第二方向上的寬度相對於所述第二凹凸部的第二週期的比例即第二填充因數為包含所述規定值的範圍內,其中,所述規定值為0.5,所述一個第二分割區域的第二填充因數為不包含所述規定值的範圍內,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數為包含所述規定值的範圍內。 A projection substrate is used to transmit at least a portion of light incident from a first surface to a second surface on the opposite side of the first surface, and to project image light onto the second surface. The projection substrate includes: an incident area for incident projection light for projecting the image light; a branch area having a first diffraction grating for guiding the projection light incident from the incident area; and an exit area having a second diffraction grating for guiding a portion of the projection light incident from the branch area and then emitting a portion of the projection light from the second surface. The incident area guides the incident projection light to the branch area, and the branch area guides a portion of the projection light. The first diffraction grating has a plurality of first concave-convex portions composed of a first convex portion and a first concave portion, and the plurality of first concave-convex portions are formed in a repetitive manner in a first direction for guiding the projection light. The branch region has a plurality of first segmented regions, and a ratio of a width of the first convex portion in the first direction to a first period of the first concave-convex portion in a first segmented region, i.e., a first filling factor, is within a range not including a specified value, and a first filling factor of a first segmented region closer to the incident region than the first segmented region is within a range including the specified value, and the first concave-convex portion of the first segmented region is within a range including the specified value. The depth of the first concave-convex portion of the first segmented area closer to the incident area than the first segmented area is greater, and the absolute value of the difference between the depth of the first concave-convex portion of the first segmented area and the depth of the first concave-convex portion of the first segmented area closer to the incident area than the first segmented area is greater, and the absolute value of the difference between the first filling factor of the first segmented area and the first filling factor of the first segmented area closer to the incident area than the first segmented area is smaller, wherein the second diffraction grating has a plurality of second concave-convex portions composed of second convex portions and second concave portions, and the plurality of second concave-convex portions are arranged in a manner that the first convex portion of the first segmented area is closer to the incident area than the first segmented area. The projection light is repeatedly formed in the second direction of the waveguide, the emission area has a plurality of second segmented areas, and the ratio of the width of the second convex portion in the second direction to the second period of the second concave-convex portion in the second segmented area closer to the branch area than the second segmented area among the plurality of second segmented areas, i.e., the second filling factor, is within the range including the specified value, wherein the specified value is 0.5, the second filling factor of the second segmented area is within the range not including the specified value, and the second filling factor of the second segmented area closer to the branch area than the second segmented area is within the range including the specified value. 一種投影基板,用於使自第一面入射的光的至少一部分透射至所述第一面的相反側的第二面,且使圖像光投影至所述第二面,所述投影基板包括:入射區域,供用於使所述圖像光投影的投影光入射;分支區域,具有對自所述入射區域入射的所述投影光進行導 波的第一繞射光柵;以及出射區域,具有對自所述分支區域入射的所述投影光的一部分進行導波後自所述第二面出射所述投影光的一部分的第二繞射光柵,所述入射區域將入射的所述投影光導波至所述分支區域,所述分支區域使所述投影光的一部分朝向所述出射區域繞射,所述第一繞射光柵具有由第一凸部與第一凹部構成的多個第一凹凸部,所述多個第一凹凸部以在對所述投影光進行導波的第一方向上反復的方式形成,所述分支區域具有多個第一分割區域,一個第一分割區域中所述第一凸部在所述第一方向上的寬度相對於所述第一凹凸部的第一週期的比例即第一填充因數為不包含規定值的範圍內,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為包含所述規定值的範圍內,所述一個第一分割區域的所述第一凹凸部的深度大於較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度,所述一個第一分割區域的所述第一凹凸部的深度與較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度之差的絕對值越大,所述一個第一分割區域的第一填充因數與較所述一個第一分割區域更靠近所述入射區域的第一 分割區域的第一填充因數之差的絕對值越小,其中,所述第二繞射光柵具有由第二凸部與第二凹部構成的多個第二凹凸部,所述多個第二凹凸部以在對所述投影光進行導波的第二方向上反復的方式形成,所述出射區域具有多個第二分割區域,所述多個第二分割區域中的較一個第二分割區域更靠近所述分支區域的第二分割區域中所述第二凸部在所述第二方向上的寬度相對於所述第二凹凸部的第二週期的比例即第二填充因數為包含所述規定值的範圍內,其中,所述規定值為0.5,所述多個第一分割區域各自的所述第一週期為50nm以上且1μm以下,所述一個第一分割區域的所述第一凹凸部的深度為50nm以上且800nm以下,所述一個第一分割區域的第一填充因數為0.35以下或0.65以上,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的所述第一凹凸部的深度為5nm以上且100nm以下,較所述一個第一分割區域更靠近所述入射區域的第一分割區域的第一填充因數為0.3以上且0.7以下,所述多個第二分割區域各自的所述第二週期為100nm以上 且1μm以下,所述一個第二分割區域的所述第二凹凸部的深度為50nm以上且800nm以下,所述一個第二分割區域的第二填充因數為0.35以下或0.65以上,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度為5nm以上且100nm以下,較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數為0.3以上且0.7以下。 A projection substrate is used to transmit at least a portion of light incident from a first surface to a second surface on the opposite side of the first surface, and to project image light onto the second surface. The projection substrate includes: an incident area for incident projection light for projecting the image light; a branch area having a first diffraction grating for guiding the projection light incident from the incident area; and an exit area having a second diffraction grating for guiding a portion of the projection light incident from the branch area and then emitting a portion of the projection light from the second surface. The incident area guides the incident projection light to the branch area, and the branch area diverts a portion of the projection light toward the exit area. The first diffraction grating has a plurality of first concave-convex portions composed of a first convex portion and a first concave portion, and the plurality of first concave-convex portions are formed in a repeated manner in a first direction for guiding the projection light. The region has a plurality of first segmented regions, the ratio of the width of the first convex portion in the first direction to the first period of the first concave-convex portion in one of the first segmented regions, i.e., the first filling factor, is within a range that does not include a specified value, the first filling factor of the first segmented region closer to the incident region than the one of the first segmented regions is within a range that includes the specified value, the depth of the first concave-convex portion of the one of the first segmented regions is greater than the depth of the first concave-convex portion of the first segmented region closer to the incident region than the one of the first segmented regions, and the greater the absolute value of the difference between the depth of the first concave-convex portion of the one of the first segmented regions and the depth of the first concave-convex portion of the first segmented region closer to the incident region than the one of the first segmented regions, the greater the first filling factor of the one of the first segmented regions and the first filling factor of the first segmented region closer to the incident region than the one of the first segmented regions. The smaller the absolute value of the difference in factors, wherein the second diffraction grating has a plurality of second convex-concave portions consisting of second convex portions and second concave portions, and the plurality of second convex-concave portions are formed in a repetitive manner in a second direction for guiding the projection light, and the emission region has a plurality of second segmented regions, and the ratio of the width of the second convex portion in the second direction to the second period of the second convex portion in a second segmented region that is closer to the branch region than one of the second segmented regions, that is, the second filling factor is within the range including the specified value, wherein the specified value is 0.5, the first period of each of the plurality of first segmented regions is greater than 50nm and less than 1μm, the depth of the first convex-concave portion of the first segmented region is greater than 50nm and less than 800nm, and the first filling factor of the first segmented region is less than 0.35 or greater than 0.65 , the depth of the first concavoconvex portion of the first segmented area closer to the incident area than the first segmented area is greater than 5nm and less than 100nm, the first filling factor of the first segmented area closer to the incident area than the first segmented area is greater than 0.3 and less than 0.7, the second period of each of the plurality of second segmented areas is greater than 100nm and less than 1μm, the depth of the second concavoconvex portion of the second segmented area is greater than 50nm and less than 800nm, the second filling factor of the second segmented area is less than 0.35 or greater than 0.65, the depth of the second concavoconvex portion of the second segmented area closer to the branch area than the second segmented area is greater than 5nm and less than 100nm, and the second filling factor of the second segmented area closer to the branch area than the second segmented area is greater than 0.3 and less than 0.7. 如請求項3或請求項4所述的投影基板,其中,所述多個第二分割區域各自的所述第二凹凸部的所述第二週期相同。 A projection substrate as described in claim 3 or claim 4, wherein the second period of the second concave-convex portion of each of the plurality of second divided regions is the same. 如請求項3或請求項4所述的投影基板,其中,所述一個第二分割區域的所述第二凹凸部的深度大於較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度,所述一個第二分割區域的所述第二凹凸部的深度與較所述一個第二分割區域更靠近所述分支區域的第二分割區域的所述第二凹凸部的深度之差的絕對值越大,所述一個第二分割區域中所述第二凸部在所述第二方向上的寬度相對於所述第二凹凸部的第二週期的比例即第二填充因數與較所述一個第二分割區域更靠近所述分支區域的第二分割區域的第二填充因數之差的絕對值越小。 The projection substrate as described in claim 3 or claim 4, wherein the depth of the second concavo-convex portion of the one second segmented area is greater than the depth of the second concavo-convex portion of the second segmented area closer to the branch area than the one second segmented area, and the greater the absolute value of the difference between the depth of the second concavo-convex portion of the one second segmented area and the depth of the second concavo-convex portion of the second segmented area closer to the branch area than the one second segmented area, the smaller the absolute value of the difference between the ratio of the width of the second convex portion in the one second segmented area in the second direction to the second period of the second concavo-convex portion, i.e., the second filling factor and the second filling factor of the second segmented area closer to the branch area than the one second segmented area. 一種眼鏡型終端,供用戶佩戴,所述眼鏡型終端包括:如請求項1、請求項3或請求項4中任一項所述的所述投影基板,作為所述用戶的右眼用透鏡以及左眼用透鏡中的至少一者而設,使自所述第一面入射的至少一部分光透射至所述用戶的眼,且使所述圖像光投影至所述第二面;框架,固定所述投影基板;以及投影部,設於所述框架,將用於使所述圖像光投影至所述出射區域的所述投影光照射至所述投影基板的所述入射區域。 A glasses-type terminal for a user to wear, the glasses-type terminal comprising: the projection substrate as described in any one of claim 1, claim 3 or claim 4, provided as at least one of a lens for the right eye and a lens for the left eye of the user, allowing at least a portion of the light incident from the first surface to be transmitted to the eye of the user, and allowing the image light to be projected onto the second surface; a frame, fixing the projection substrate; and a projection unit, provided on the frame, irradiating the projection light for projecting the image light onto the emission area onto the incident area of the projection substrate.
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