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TWI882987B - Resin composition, prepreg, metal-clad laminate, resin composite sheet, and printed wiring board - Google Patents

Resin composition, prepreg, metal-clad laminate, resin composite sheet, and printed wiring board Download PDF

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TWI882987B
TWI882987B TW109106260A TW109106260A TWI882987B TW I882987 B TWI882987 B TW I882987B TW 109106260 A TW109106260 A TW 109106260A TW 109106260 A TW109106260 A TW 109106260A TW I882987 B TWI882987 B TW I882987B
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resin composition
group
mass
parts
resin
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TW202039595A (en
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鈴木美香
小林宇志
長谷部惠一
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日商三菱瓦斯化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02Homopolymers or copolymers of hydrocarbons
    • C08L25/04Homopolymers or copolymers of styrene
    • C08L25/08Copolymers of styrene
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/082Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising vinyl resins; comprising acrylic resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/302Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36Divinylbenzene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2305/00Condition, form or state of the layers or laminate
    • B32B2305/07Parts immersed or impregnated in a matrix
    • B32B2305/076Prepregs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/08Copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2479/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
    • C08J2479/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2479/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

本發明提供介電常數及介電損耗正切低、耐熱性高的樹脂組成物、及使用該樹脂組成物的預浸體、覆金屬箔疊層板、樹脂複合片、印刷配線板。一種樹脂組成物,含有多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B),且不含自由基聚合引發劑。The present invention provides a resin composition having low dielectric constant and dielectric loss tangent and high heat resistance, and a prepreg, a metal-clad laminate, a resin composite sheet, and a printed wiring board using the resin composition. A resin composition contains a multifunctional vinyl aromatic polymer (A) and a thermosetting compound (B), and does not contain a free radical polymerization initiator.

Description

樹脂組成物、預浸體、覆金屬箔疊層板、樹脂複合片、及印刷配線板Resin composition, prepreg, metal-clad laminate, resin composite sheet, and printed wiring board

本發明關於樹脂組成物、以及使用該樹脂組成物的預浸體、覆金屬箔疊層板、樹脂複合片、及印刷配線板。The present invention relates to a resin composition, and a prepreg, a metal-clad laminate, a resin composite sheet, and a printed wiring board using the resin composition.

近年,以行動終端為首的電子設備、通訊設備等所使用之半導體元件的高積體化及微細化正在加速。與此相伴,尋求可進行半導體元件之高密度安裝的技術,也尋求針對其中佔重要位置之印刷配線板的改良。 另一方面,電子設備等用途正多樣化並持續擴大中。受其影響,對於印刷配線板、其所使用之覆金屬箔疊層板、預浸體等所要求之各特性亦多樣化且越發嚴苛。考慮如此之要求特性,同時為了獲得經改善之印刷配線板,人們提出各種材料、加工法。作為其一可列舉構成預浸體之樹脂材料的改良開發。In recent years, the high integration and miniaturization of semiconductor components used in electronic equipment, communication equipment, etc., led by mobile terminals, has been accelerating. Along with this, the search for technology that can perform high-density mounting of semiconductor components is also seeking improvements to printed wiring boards, which occupy an important position among them. On the other hand, the uses of electronic equipment are diversifying and continuing to expand. Under its influence, the various properties required of printed wiring boards, metal-clad laminates, prepregs, etc. used therein are also diversifying and becoming more stringent. Considering such required properties, in order to obtain improved printed wiring boards at the same time, various materials and processing methods have been proposed. As one of them, the improvement and development of the resin material constituting the prepreg can be cited.

例如,專利文獻1中揭示一種樹脂組成物,含有:具有聚苯醚骨架之2官能性伸苯醚寡聚物之末端乙烯基化合物(a)、特定馬來醯亞胺化合物(b)、萘酚芳烷基型氰酸酯樹脂(c)及經萘骨架改性之酚醛清漆型環氧樹脂(d)。For example, Patent Document 1 discloses a resin composition comprising: a terminal vinyl compound (a) of a bifunctional phenylene ether oligomer having a polyphenylene ether skeleton, a specific maleimide compound (b), a naphthol aralkyl type cyanate resin (c), and a novolac type epoxy resin modified with a naphthalene skeleton (d).

專利文獻2中揭示一種阻燃性樹脂組成物,係由至少一端具有馬來醯亞胺基之樹脂(以N,N’-4,4’-二苯基甲烷雙馬來醯亞胺與二胺作為原料之胺基雙馬來醯亞胺系樹脂)、及式(c1)表示之溴化苯乙烯與式(c2)表示之二乙烯基苯之共聚物構成。 [化1] [先前技術文獻] [專利文獻]Patent document 2 discloses a flame retardant resin composition, which is composed of a resin having a maleimide group at at least one end (an aminobismaleimide resin using N,N'-4,4'-diphenylmethane bismaleimide and a diamine as raw materials), and a copolymer of brominated styrene represented by formula (c1) and divinylbenzene represented by formula (c2). [Chemistry 1] [Prior art literature] [Patent literature]

[專利文獻1]日本特開2010-138364號公報 [專利文獻2]日本特開平03-006293號公報[Patent document 1] Japanese Patent Publication No. 2010-138364 [Patent document 2] Japanese Patent Publication No. 03-006293

[發明所欲解決之課題][Identify the problem you want to solve]

包括上述示例,利用其材料開發,已進行印刷配線板中之各特性的改良,但鑒於技術的進展、應用的擴大,要求性能的進一步改善。特別是近年尋求具有高耐熱性,且低介電常數、低介電損耗正切的材料。 本發明係為了解決該課題,旨在提供介電常數及介電損耗正切低、耐熱性高的樹脂組成物、及使用該樹脂組成物的預浸體、覆金屬箔疊層板、樹脂複合片、印刷配線板。 [解決課題之手段]Including the above examples, various properties of printed wiring boards have been improved by using their material development, but in view of the progress of technology and the expansion of applications, further improvement of performance is required. In particular, in recent years, materials with high heat resistance, low dielectric constant, and low dielectric loss tangent have been sought. The present invention is to solve this problem and aims to provide a resin composition with low dielectric constant and dielectric loss tangent and high heat resistance, and a prepreg, metal foil laminate, resin composite sheet, and printed wiring board using the resin composition. [Means for solving the problem]

基於上述課題,本案發明人等針對尤其適合於預浸體等印刷配線板用途之樹脂組成物的成分組成進行研究,結果發現將多官能乙烯基芳香族聚合物與熱硬化性化合物組合而得的樹脂組成物展現出低介電常數、低介電損耗正切,且耐熱性高。但是,發現添加自由基聚合引發劑的話,該等性能會變差。本發明係利用該等發現而完成,具體而言,利用下列手段>1>,較佳為利用>2>~>11>解決了上述課題。Based on the above-mentioned problems, the inventors of this case studied the composition of resin compositions particularly suitable for printed wiring boards such as prepregs, and found that the resin composition obtained by combining a multifunctional vinyl aromatic polymer with a thermosetting compound exhibits a low dielectric constant, a low dielectric loss tangent, and high heat resistance. However, it was found that these properties would deteriorate if a free radical polymerization initiator was added. The present invention was completed by utilizing these findings, and specifically, the above-mentioned problems were solved by utilizing the following means>1>, preferably>2> to>11>.

>1>一種樹脂組成物,含有多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B),且不含自由基聚合引發劑。 >2>如>1>之樹脂組成物,其中,前述多官能乙烯基芳香族聚合物(A)係具有式(V)表示之構成單元的聚合物。 [化2] 式中,Ar表示芳香族烴連接基。*表示鍵結位置。 >3>如>1>或>2>之樹脂組成物,其中,前述熱硬化性化合物(B)具有選自由氰氧基、乙烯基、馬來醯亞胺基、及納迪克醯亞胺(nadiimide)基構成之群組中之1個以上之官能基。 >4>如>1>~>3>中任一項之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,前述熱硬化性化合物(B)之含量為5~95質量份。 >5>如>1>~>4>中任一項之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,前述多官能乙烯基芳香族聚合物(A)之含量為5~95質量份。 >6>如>1>~>5>中任一項之樹脂組成物,更含有填充材(C)。 >7>如>6>之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,前述填充材(C)之含量為10~500質量份。 >8>一種預浸體,由基材、與如>1>~>7>中任一項之樹脂組成物形成。 >9>一種覆金屬箔疊層板,包含: 由如>8>之預浸體形成之至少1層;及 配置於前述由預浸體形成之層之單面或兩面的金屬箔。 >10>一種樹脂複合片,包含: 支持體;及 配置於前述支持體之表面的由如>1>~>7>中任一項之樹脂組成物形成之層。 >11>一種印刷配線板,包含: 絕緣層;及 配置於前述絕緣層之表面的導體層; 前述絕緣層包含由如>1>~>7>中任一項之樹脂組成物形成之層及由如>8>之預浸體形成之層中之至少一者。 [發明之效果]>1> A resin composition comprising a polyfunctional vinyl aromatic polymer (A) and a thermosetting compound (B), and does not contain a free radical polymerization initiator. >2> The resin composition of >1>, wherein the polyfunctional vinyl aromatic polymer (A) is a polymer having a constituent unit represented by formula (V). [Chemistry 2] In the formula, Ar represents an aromatic hydrocarbon linking group. * represents a bonding position. >3> A resin composition as described in >1> or >2>, wherein the aforementioned thermosetting compound (B) has one or more functional groups selected from the group consisting of a cyano group, a vinyl group, a maleimide group, and a nadiimide group. >4> A resin composition as described in any one of >1> to >3>, wherein the content of the aforementioned thermosetting compound (B) is 5 to 95 parts by mass relative to 100 parts by mass of the total amount of the resin components in the resin composition. >5> A resin composition as described in any one of >1> to >4>, wherein the content of the aforementioned multifunctional vinyl aromatic polymer (A) is 5 to 95 parts by mass relative to 100 parts by mass of the total amount of the resin components in the resin composition. >6> A resin composition as described in any one of >1> to >5>, further comprising a filler (C). >7> A resin composition as described in >6>, wherein the content of the filler (C) is 10 to 500 parts by mass relative to 100 parts by mass of the total amount of the resin components in the resin composition. >8> A prepreg formed by a substrate and a resin composition as described in any one of >1> to >7>. >9> A metal foil-clad laminate comprising: at least one layer formed by a prepreg as described in >8>; and a metal foil disposed on one or both sides of the layer formed by the prepreg. >10> A resin composite sheet comprising: a support; and a layer formed by a resin composition as described in any one of >1> to >7> disposed on the surface of the support. >11> A printed wiring board comprising: an insulating layer; and a conductive layer disposed on a surface of the insulating layer; the insulating layer comprises at least one of a layer formed of a resin composition as described in any one of >1> to >7> and a layer formed of a prepreg as described in >8>. [Effect of the invention]

根據本發明,可提供介電常數及介電損耗正切低、耐熱性高的樹脂組成物、及使用該樹脂組成物的預浸體、覆金屬箔疊層板、樹脂複合片、印刷配線板。According to the present invention, a resin composition having low dielectric constant and dielectric loss tangent and high heat resistance, and a prepreg, a metal-clad laminate, a resin composite sheet, and a printed wiring board using the resin composition can be provided.

以下,針對本發明之內容就其較佳實施形態進行詳細地說明。此外,本說明書中,「~」係以包含其前後記載之數值作為下限值及上限值的含義使用。In the following, the content of the present invention is described in detail with respect to its preferred embodiment. In addition, in this specification, "to" is used to mean that the numerical values described before and after it are included as the lower limit and the upper limit.

本實施形態之樹脂組成物之特徵為:含有多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B),且不含自由基聚合引發劑。 藉由為如此之構成,可提供介電常數及介電損耗正切低、耐熱性高的樹脂組成物。另外,亦可使剝離強度提高。又,也可改善其他各種性能。特別是近年通訊、動作信號有高頻化的傾向,而本實施形態之樹脂組成物即使在高頻區域仍可達成低介電常數、低介電損耗正切,並提高耐熱性。 其理由據認為係如下,但不限於以下。亦即,本實施形態之樹脂組成物係多官能乙烯基芳香族聚合物(A)或熱硬化性化合物(B)所具有之熱硬化性基會因熱而硬化的熱硬化性樹脂組成物。據認為如此之樹脂組成物不含熱自由基聚合引發劑時,多官能乙烯基芳香族聚合物(A)之聚合開始溫度與熱硬化性化合物(B)之聚合開始溫度相近,多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B)均可充分硬化,其結果可達成低介電常數、低介電損耗正切、高耐熱性。又,藉由不含光自由基聚合引發劑,即使保存時不遮光,亦可有效地抑制多官能乙烯基芳香族聚合物(A)、熱硬化性化合物(B)之光硬化。 此外,本實施形態之樹脂組成物宜為主要藉由熱進行硬化而非藉由光進行硬化的非感光性熱硬化性樹脂組成物。The resin composition of this embodiment is characterized by containing a multifunctional vinyl aromatic polymer (A) and a thermosetting compound (B), and does not contain a free radical polymerization initiator. By such a structure, a resin composition with low dielectric constant and dielectric loss tangent and high heat resistance can be provided. In addition, the peeling strength can also be improved. In addition, various other properties can also be improved. In particular, in recent years, communication and motion signals have a tendency to be high-frequency, and the resin composition of this embodiment can still achieve a low dielectric constant, a low dielectric loss tangent, and improved heat resistance even in the high-frequency region. The reasons are believed to be as follows, but not limited to the following. That is, the resin composition of the present embodiment is a thermosetting resin composition in which the thermosetting groups of the multifunctional vinyl aromatic polymer (A) or the thermosetting compound (B) are cured by heat. It is believed that when such a resin composition does not contain a thermal free radical polymerization initiator, the polymerization start temperature of the multifunctional vinyl aromatic polymer (A) is close to the polymerization start temperature of the thermosetting compound (B), and both the multifunctional vinyl aromatic polymer (A) and the thermosetting compound (B) can be fully cured, resulting in a low dielectric constant, a low dielectric loss tangent, and high heat resistance. In addition, by not containing a photo-radical polymerization initiator, the photocuring of the multifunctional vinyl aromatic polymer (A) and the thermosetting compound (B) can be effectively inhibited even if it is not shielded from light during storage. In addition, the resin composition of the present embodiment is preferably a non-photosensitive thermosetting resin composition that is hardened mainly by heat rather than by light.

>多官能乙烯基芳香族聚合物(A)> 本實施形態之樹脂組成物含有多官能乙烯基芳香族聚合物(A)。 多官能乙烯基芳香族聚合物(A)宜為使分子內具有2個以上之乙烯基之芳香族化合物聚合而得的聚合物。分子內具有2個以上之乙烯基之芳香族化合物,例如可為乙烯基的各位置異構體中之任意者,又,亦可為如此之位置異構體之混合物。更具體而言,多官能乙烯基芳香族聚合物(A)為分子內具有2個乙烯基之芳香族化合物時,可為間位體、對位體、鄰位體或該等位置異構體混合物中之任意者,宜為間位體、對位體或該等位置異構體混合物中之任意者。 作為構成多官能乙烯基芳香族聚合物(A)之單體,可列舉具有1個或2個以上之乙烯基之芳香族化合物(以下,亦將具有2個以上之乙烯基之芳香族化合物稱為多官能乙烯基芳香族化合物),宜為具有1個或2個乙烯基之芳香族化合物。例如,就多官能乙烯基芳香族聚合物(A)而言,可例示含有來自具有2個乙烯基之芳香族化合物(亦稱為二乙烯基芳香族化合物)之構成單元(a)、與來自具有1個乙烯基之芳香族化合物之構成單元(b)的聚合物。>Multifunctional vinyl aromatic polymer (A)> The resin composition of this embodiment contains a multifunctional vinyl aromatic polymer (A). The multifunctional vinyl aromatic polymer (A) is preferably a polymer obtained by polymerizing an aromatic compound having two or more vinyl groups in the molecule. The aromatic compound having two or more vinyl groups in the molecule may be, for example, any of the positional isomers of the vinyl group, or a mixture of such positional isomers. More specifically, when the multifunctional vinyl aromatic polymer (A) is an aromatic compound having two vinyl groups in the molecule, it may be any of the meta-isomer, para-isomer, ortho-isomer, or a mixture of such positional isomers, and is preferably any of the meta-isomer, para-isomer, or a mixture of such positional isomers. As monomers constituting the polyfunctional vinyl aromatic polymer (A), there can be mentioned aromatic compounds having one or more vinyl groups (hereinafter, aromatic compounds having two or more vinyl groups are also referred to as polyfunctional vinyl aromatic compounds), preferably aromatic compounds having one or two vinyl groups. For example, as the polyfunctional vinyl aromatic polymer (A), there can be exemplified a polymer containing a constituent unit (a) derived from an aromatic compound having two vinyl groups (also referred to as a divinyl aromatic compound) and a constituent unit (b) derived from an aromatic compound having one vinyl group.

形成構成單元(a)之二乙烯基芳香族化合物宜為具有烴芳香族環之化合物,可列舉:二乙烯基苯、二烯丙基苯、雙(乙烯基氧基)苯、雙(1-甲基乙烯基)苯、二乙烯基萘、二乙烯基蒽、二乙烯基聯苯、二乙烯基菲、雙(4-烯丙基氧基苯基)茀等。其中,為二乙烯基苯特佳。來自二乙烯基芳香族化合物之構成單元於聚合物中的形態,可為(a-1)僅1個乙烯基進行聚合反應,另1個乙烯基未反應而殘留的形態;及(a-2)2個乙烯基均進行聚合反應的形態。本實施形態中,宜包含其中一乙烯基未反應而殘留的形態(a-1)。此外,多官能乙烯基芳香族化合物(宜為二乙烯基芳香族化合物)在發揮本發明之效果的範圍內亦可具有任意取代基Z(例如可列舉碳數1~6之烷基、碳數2~6之烯基、碳數2~6之炔基、碳數1~6之烷氧基、羥基、胺基、羧基、鹵素原子等)。The divinyl aromatic compound forming the constituent unit (a) is preferably a compound having a hydrocarbon aromatic ring, and examples thereof include divinylbenzene, diallylbenzene, bis(vinyloxy)benzene, bis(1-methylvinyl)benzene, divinylnaphthalene, divinylanthracene, divinylbiphenyl, divinylphenanthrene, bis(4-allyloxyphenyl)fluorene, and the like. Among them, divinylbenzene is particularly preferred. The form of the constituent unit derived from the divinyl aromatic compound in the polymer may be (a-1) a form in which only one vinyl group undergoes polymerization reaction, while the other vinyl group remains unreacted; and (a-2) a form in which both vinyl groups undergo polymerization reaction. In this embodiment, the form (a-1) in which one vinyl group remains unreacted is preferably included. In addition, the polyfunctional vinyl aromatic compound (preferably a divinyl aromatic compound) may also have any substituent Z (for example, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkynyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a hydroxyl group, an amino group, a carboxyl group, a halogen atom, etc.) within the scope of exerting the effect of the present invention.

上述來自多官能乙烯基芳香族化合物(宜為二乙烯基芳香族化合物)之構成單元(a),宜包含下式(V)表示之構成單元。 [化3] 式(V)中,Ar表示芳香族烴連接基。具體例可列舉下列L1 之例。式中之*表示鍵結位置。 芳香族烴連接基可為僅由亦可具有取代基之芳香族烴構成之基,也可為由亦可具有取代基之芳香族烴與其他連接基之組合構成之基,宜為僅由亦可具有取代基之芳香族烴構成之基。此外,芳香族烴亦可具有之取代基可列舉上述取代基Z。又,上述芳香族烴宜不具有取代基。 芳香族烴連接基通常為2價連接基。The structural unit (a) derived from the polyfunctional vinyl aromatic compound (preferably a divinyl aromatic compound) preferably comprises a structural unit represented by the following formula (V). [Chemistry 3] In formula (V), Ar represents an aromatic hydrocarbon linking group. Specific examples include the following examples of L 1. In the formula, * represents a bonding position. The aromatic hydrocarbon linking group may be a group consisting only of an aromatic hydrocarbon that may also have a substituent, or a group consisting of a combination of an aromatic hydrocarbon that may also have a substituent and other linking groups. It is preferably a group consisting only of an aromatic hydrocarbon that may also have a substituent. In addition, the substituent that the aromatic hydrocarbon may also have may include the above-mentioned substituent Z. In addition, the above-mentioned aromatic hydrocarbon preferably has no substituent. The aromatic hydrocarbon linking group is usually a divalent linking group.

芳香族烴連接基具體而言可列舉亦可具有取代基之伸苯基、萘二基、蒽二基、菲二基、聯苯二基、茀二基,其中,宜為亦可具有取代基之伸苯基。取代基可例示上述取代基Z,上述伸苯基等基宜不具有取代基。Specific examples of the aromatic hydrocarbon linking group include phenylene, which may have a substituent, naphthalene diyl, anthracene diyl, phenanthrene diyl, biphenyl diyl, and fluorene diyl, and among them, phenylene, which may have a substituent, is preferred. The substituent may be exemplified by the substituent Z described above, and the phenylene and other groups described above preferably have no substituent.

來自多官能乙烯基芳香族化合物(宜為二乙烯基芳香族化合物)之構成單元(a)包含下式(V1)表示之構成單元、下式(V2)表示之構成單元、及下式(V3)表示之構成單元中之至少1者更佳。此外,下式中之*表示鍵結位置。The constituent unit (a) derived from a polyfunctional vinyl aromatic compound (preferably a divinyl aromatic compound) preferably comprises at least one of a constituent unit represented by the following formula (V1), a constituent unit represented by the following formula (V2), and a constituent unit represented by the following formula (V3). In addition, * in the following formula represents a bonding position.

[化4] 式(V1)~(V3)中,L1 為芳香族烴連接基(宜為碳數6~22,為6~18更佳,為6~10尤佳)。具體而言,可列舉亦可具有取代基之伸苯基、萘二基、蒽二基、菲二基、聯苯二基、茀二基,其中,宜為亦可具有取代基之伸苯基。取代基可例示上述取代基Z,上述伸苯基等基宜不具有取代基。[Chemistry 4] In formulas (V1) to (V3), L1 is an aromatic hydrocarbon linking group (preferably having 6 to 22 carbon atoms, more preferably 6 to 18 carbon atoms, and particularly preferably 6 to 10 carbon atoms). Specifically, phenylene groups, naphthalene diyl groups, anthracene diyl groups, phenanthrene diyl groups, biphenyl diyl groups, and fluorene diyl groups, which may have a substituent, are exemplified. Among them, phenylene groups, which may have a substituent, are preferred. Examples of the substituent include the substituent Z described above, and the phenylene groups described above preferably have no substituent.

多官能乙烯基芳香族聚合物(A),如上述可為構成單元(a)之均聚物,亦可為與構成單元(b)等之共聚物。多官能乙烯基芳香族聚合物(A)為共聚物時,就其共聚比而言,構成單元(a)宜為5莫耳%以上,為10莫耳%以上更佳,為15莫耳%以上尤佳。上限值實際為90莫耳%以下。The multifunctional vinyl aromatic polymer (A) may be a homopolymer of the constituent unit (a) as described above, or a copolymer with the constituent unit (b). When the multifunctional vinyl aromatic polymer (A) is a copolymer, the copolymerization ratio of the constituent unit (a) is preferably 5 mol% or more, more preferably 10 mol% or more, and even more preferably 15 mol% or more. The upper limit is actually 90 mol% or less.

多官能乙烯基芳香族聚合物(A)為含有來自單乙烯基芳香族化合物之構成單元(b)的共聚物時,單乙烯基芳香族化合物之例可列舉:苯乙烯、乙烯基萘、乙烯基聯苯等乙烯基芳香族化合物;鄰甲基苯乙烯、間甲基苯乙烯、對甲基苯乙烯、鄰、對二甲基苯乙烯、鄰乙基乙烯基苯、間乙基乙烯基苯、對乙基乙烯基苯、甲基乙烯基聯苯、乙基乙烯基聯苯等經烷基取代之乙烯基芳香族化合物等。此處所例示之單乙烯基芳香族化合物亦可適當具有上述取代基Z。又,該等單乙烯基芳香族化合物可使用1種,亦可使用2種以上。When the multifunctional vinyl aromatic polymer (A) is a copolymer containing a constituent unit (b) derived from a monovinyl aromatic compound, examples of the monovinyl aromatic compound include vinyl aromatic compounds such as styrene, vinyl naphthalene, and vinyl biphenyl; vinyl aromatic compounds substituted with an alkyl group such as o-methylstyrene, m-methylstyrene, p-methylstyrene, o-, p-dimethylstyrene, o-ethylvinylbenzene, m-ethylvinylbenzene, p-ethylvinylbenzene, methylvinylbiphenyl, and ethylvinylbiphenyl. The monovinyl aromatic compounds exemplified here may also appropriately have the above-mentioned substituent Z. Moreover, the monovinyl aromatic compounds may be used alone or in combination of two or more.

來自單乙烯基芳香族化合物之構成單元(b)宜為下式(V4)表示之構成單元。The constituent unit (b) derived from a monovinyl aromatic compound is preferably a constituent unit represented by the following formula (V4).

[化5] 式(V4)中,L2 為芳香族烴連接基,較佳者之具體例可列舉上述L1 之例。 RV1 為氫原子或碳數1~12之烴基(宜為烷基)。RV1 為烴基時,其碳數宜為1~6,為1~3更佳。RV1 及L2 亦可具有上述取代基Z。[Chemistry 5] In formula (V4), L2 is an aromatic hydrocarbon linking group, and preferred specific examples include the above examples of L1 . RV1 is a hydrogen atom or a alkyl group having 1 to 12 carbon atoms (preferably an alkyl group). When RV1 is a alkyl group, the carbon number is preferably 1 to 6, more preferably 1 to 3. RV1 and L2 may also have the above-mentioned substituent Z.

多官能乙烯基芳香族聚合物(A)為含有構成單元(b)之共聚物時,構成單元(b)之共聚比宜為10莫耳%以上,為15莫耳%以上尤佳。上限值宜為98莫耳%以下,為90莫耳%以下更佳,為85莫耳%以下尤佳。When the multifunctional vinyl aromatic polymer (A) is a copolymer containing the constituent unit (b), the copolymerization ratio of the constituent unit (b) is preferably 10 mol% or more, preferably 15 mol% or more, and the upper limit is preferably 98 mol% or less, more preferably 90 mol% or less, and even more preferably 85 mol% or less.

多官能乙烯基芳香族聚合物(A)也可具有其他構成單元。作為其他構成單元,例如可列舉來自環烯烴化合物之構成單元(c)等。環烯烴化合物可列舉環結構內具有雙鍵之烴類。具體而言,可列舉環丁烯、環戊烯、環己烯、環辛烯等單環之環狀烯烴,還可列舉降莰烯、二環戊二烯等具有降莰烯環結構之化合物、茚、乙烯合萘等芳香族環縮合而得之環烯烴化合物等。降莰烯化合物之例可列舉日本特開2018-39995號公報之段落0037~0043記載者,該等內容納入本說明書中。此外,此處所例示之環烯烴化合物亦可更具有上述取代基Z。The multifunctional vinyl aromatic polymer (A) may also have other constituent units. As other constituent units, for example, constituent units (c) derived from cycloolefin compounds can be listed. Cycloolefin compounds can be listed as hydrocarbons having a double bond in the ring structure. Specifically, monocyclic cyclic alkenes such as cyclobutene, cyclopentene, cyclohexene, and cyclooctene can be listed, and compounds having a norbornene ring structure such as norbornene and dicyclopentadiene can also be listed, and cycloolefin compounds obtained by aromatic ring condensation such as indene and vinylnaphthalene can also be listed. Examples of norbornene compounds include those described in paragraphs 0037 to 0043 of Japanese Patent Application Publication No. 2018-39995, and the contents are incorporated into this specification. In addition, the cycloolefin compounds exemplified herein may further have the above-mentioned substituent Z.

多官能乙烯基芳香族聚合物(A)為含有構成單元(c)之共聚物時,構成單元(c)之共聚比宜為10莫耳%以上,為20莫耳%以上更佳,為30莫耳%以上尤佳。上限值宜為90莫耳%以下,為80莫耳%以下更佳,為70莫耳%以下尤佳,亦可為50莫耳%以下,也可為30莫耳%以下。When the multifunctional vinyl aromatic polymer (A) is a copolymer containing the constituent unit (c), the copolymerization ratio of the constituent unit (c) is preferably 10 mol% or more, more preferably 20 mol% or more, and particularly preferably 30 mol% or more. The upper limit is preferably 90 mol% or less, more preferably 80 mol% or less, particularly preferably 70 mol% or less, and may be 50 mol% or less, or 30 mol% or less.

多官能乙烯基芳香族聚合物(A)中亦可更納入來自不同的聚合性化合物(以下,亦稱為其他聚合性化合物)之構成單元(d)。作為其他聚合性化合物(單體),例如可列舉含有3個乙烯基之化合物。具體而言,可列舉1,3,5-三乙烯基苯、1,3,5-三乙烯基萘、1,2,4-三乙烯基環己烷。或可列舉乙二醇二丙烯酸酯、丁二烯等。來自其他聚合性化合物之構成單元(d)之共聚比宜為30莫耳%以下,為20莫耳%以下更佳,為10莫耳%以下尤佳。The multifunctional vinyl aromatic polymer (A) may further include constituent units (d) from different polymerizable compounds (hereinafter, also referred to as other polymerizable compounds). As other polymerizable compounds (monomers), for example, compounds containing three vinyl groups may be listed. Specifically, 1,3,5-trivinylbenzene, 1,3,5-trivinylnaphthalene, 1,2,4-trivinylcyclohexane may be listed. Alternatively, ethylene glycol diacrylate, butadiene, etc. may be listed. The copolymerization ratio of the constituent units (d) from other polymerizable compounds is preferably 30 mol% or less, more preferably 20 mol% or less, and even more preferably 10 mol% or less.

作為多官能乙烯基芳香族聚合物(A)之一實施形態,可例示以構成單元(a)作為必要構成單元,並含有構成單元(b)~(d)中之至少1種的聚合物。另外,可例示構成單元(a)~(d)之合計佔全部構成單元之95莫耳%以上,進而佔98莫耳%以上之態樣。 作為多官能乙烯基芳香族聚合物(A)之另一實施形態,宜為以構成單元(a)作為必要構成單元,且在末端除外的全部構成單元中含芳香族環之構成單元為90莫耳%以上者較佳,為95莫耳%以上更佳,也可為100莫耳%。 當計算每全部構成單元之莫耳%時,1個構成單元係來自構成多官能乙烯基芳香族聚合物(A)之單體1分子。As one embodiment of the multifunctional vinyl aromatic polymer (A), a polymer having the constituent unit (a) as an essential constituent unit and containing at least one of the constituent units (b) to (d) can be exemplified. In addition, a state in which the total of the constituent units (a) to (d) accounts for more than 95 mol% of all the constituent units, and further accounts for more than 98 mol%. As another embodiment of the multifunctional vinyl aromatic polymer (A), it is preferable that the constituent unit (a) is used as an essential constituent unit, and the constituent units containing aromatic rings in all the constituent units excluding the terminal are more than 90 mol%, more preferably more than 95 mol%, and can also be 100 mol%. When calculating the mole % per all constituent units, one constituent unit is derived from one molecule of the monomer constituting the multifunctional vinyl aromatic polymer (A).

多官能乙烯基芳香族聚合物(A)之製造方法並無特別限定,為常法即可,例如可列舉將包含二乙烯基芳香族化合物之單體(視需要使單乙烯基芳香族化合物、環烯烴化合物等共存)在路易士酸觸媒的存在下進行聚合。路易士酸觸媒可使用金屬氟化物或其錯合物。The method for producing the multifunctional vinyl aromatic polymer (A) is not particularly limited and may be a conventional method, for example, a method of polymerizing a monomer containing a divinyl aromatic compound (a monovinyl aromatic compound, a cycloolefin compound, etc. may coexist as necessary) in the presence of a Lewis acid catalyst. The Lewis acid catalyst may be a metal fluoride or a complex thereof.

多官能乙烯基芳香族聚合物(A)之鏈末端的結構並無特別限定,來自上述二乙烯基芳香族化合物之基可列舉採取下列式(E1)之結構。此外,式(E1)中之L1 與上述式(V1)規定者相同。*表示鍵結位置。 *-CH=CH-L1 -CH=CH2 (E1)The structure of the chain end of the multifunctional vinyl aromatic polymer (A) is not particularly limited. The group derived from the above divinyl aromatic compound can be exemplified by the structure of the following formula (E1). In addition, L1 in formula (E1) is the same as that defined in the above formula (V1). * indicates a bonding position. *-CH=CH- L1 -CH= CH2 (E1)

來自單乙烯基芳香族化合物之基為鏈末端時,可列舉採取下式(E2)之結構。式中之L2 及RV1 各自與前述式(V4)中定義者為相同含義。*表示鍵結位置。 *-CH=CH-L2 -RV1 (E2)When the group from the monovinyl aromatic compound is the chain end, the following structure can be adopted. In the formula, L2 and R V1 have the same meanings as those defined in the above formula (V4). * indicates the bonding position. *-CH=CH- L2 -R V1 (E2)

多官能乙烯基芳香族聚合物(A)之分子量,以數量平均分子量Mn計宜為300以上,為500以上更佳,為1,000以上尤佳。上限宜為100,000以下,為10,000以下更佳,為5,000以下尤佳,為4,000以下又更佳。以重量平均分子量Mw與數量平均分子量Mn之比表示之單分散度(Mw/Mn)宜為100以下,為50以下更佳,為20以下尤佳。下限值實際為1.1以上。多官能乙烯基芳香族聚合物(A)宜可溶於甲苯、二甲苯、四氫呋喃、二氯乙烷或氯仿。The molecular weight of the multifunctional vinyl aromatic polymer (A) is preferably 300 or more, more preferably 500 or more, and particularly preferably 1,000 or more in terms of the number average molecular weight Mn. The upper limit is preferably 100,000 or less, more preferably 10,000 or less, particularly preferably 5,000 or less, and even more preferably 4,000 or less. The monodispersity (Mw/Mn) represented by the ratio of the weight average molecular weight Mw to the number average molecular weight Mn is preferably 100 or less, more preferably 50 or less, and particularly preferably 20 or less. The lower limit is actually 1.1 or more. The multifunctional vinyl aromatic polymer (A) is preferably soluble in toluene, xylene, tetrahydrofuran, dichloroethane or chloroform.

本說明書中,關於多官能乙烯基芳香族聚合物(A),可參照國際公開第2017/115813號之段落0029~0058記載之化合物及其合成反應條件等、日本特開2018-039995號公報之段落0013~0058記載之化合物及其合成反應條件等、日本特開2018-168347號公報之段落0008~0043記載之化合物及其合成反應條件等、日本特開2006-070136號公報之段落0014~0042記載之化合物及其合成反應條件等、日本特開2006-089683號公報之段落0014~0061記載之化合物及其合成反應條件等、日本特開2008-248001號公報之段落0008~0036記載之化合物及其合成反應條件等,該等內容納入本說明書中。In this specification, for the multifunctional vinyl aromatic polymer (A), reference may be made to the compounds and their synthesis reaction conditions described in paragraphs 0029 to 0058 of International Publication No. 2017/115813, the compounds and their synthesis reaction conditions described in paragraphs 0013 to 0058 of Japanese Patent Publication No. 2018-039995, and the compounds and their synthesis reaction conditions described in paragraphs 0008 to 0043 of Japanese Patent Publication No. 2018-168347. The compounds and their synthesis reaction conditions, etc. described in paragraphs 0014 to 0042 of Japanese Patent Application Laid-Open No. 2006-070136, the compounds and their synthesis reaction conditions, etc. described in paragraphs 0014 to 0061 of Japanese Patent Application Laid-Open No. 2006-089683, and the compounds and their synthesis reaction conditions, etc. described in paragraphs 0008 to 0036 of Japanese Patent Application Laid-Open No. 2008-248001 are incorporated into the present specification.

就多官能乙烯基芳香族聚合物(A)之含量而言,令樹脂組成物中之樹脂成分之總量為100質量份時,宜為5質量份以上,為10質量份以上更佳,為15質量份以上尤佳,為20質量份以上又更佳,另外,也可為30質量份以上、40質量份以上、50質量份以上、60質量份以上。藉由多官能乙烯基芳香族聚合物(A)之含量為上述下限值以上,尤其可有效地達成低介電常數。另一方面,就多官能乙烯基芳香族聚合物(A)之含量的上限值而言,令樹脂組成物中之樹脂成分之總量為100質量份時,宜為95質量份以下,為90質量份以下更佳,為85質量份以下尤佳,為80質量份以下又更佳。 樹脂組成物中可僅含有1種多官能乙烯基芳香族聚合物(A),亦可含有2種以上。含有2種以上時,合計量宜為上述範圍。 此外,樹脂成分係包含多官能乙烯基芳香族聚合物(A)及熱硬化性化合物(B)以及後述其他樹脂。As for the content of the multifunctional vinyl aromatic polymer (A), when the total amount of the resin components in the resin composition is 100 parts by mass, it is preferably 5 parts by mass or more, preferably 10 parts by mass or more, particularly preferably 15 parts by mass or more, and even more preferably 20 parts by mass or more. In addition, it can also be 30 parts by mass or more, 40 parts by mass or more, 50 parts by mass or more, and 60 parts by mass or more. By having the content of the multifunctional vinyl aromatic polymer (A) be above the above lower limit, a low dielectric constant can be achieved particularly effectively. On the other hand, as for the upper limit of the content of the multifunctional vinyl aromatic polymer (A), when the total amount of the resin components in the resin composition is 100 parts by mass, it is preferably 95 parts by mass or less, preferably 90 parts by mass or less, particularly preferably 85 parts by mass or less, and even more preferably 80 parts by mass or less. The resin composition may contain only one type of polyfunctional vinyl aromatic polymer (A) or two or more types. When containing two or more types, the total amount is preferably within the above range. In addition, the resin component includes a polyfunctional vinyl aromatic polymer (A) and a thermosetting compound (B) and other resins described below.

>熱硬化性化合物(B)> 本實施形態之樹脂組成物含有熱硬化性化合物(B)。本說明書中,熱硬化性化合物(B)意指多官能乙烯基芳香族聚合物(A)以外之熱硬化性化合物。熱硬化性化合物(B)宜為具有選自由氰氧基、乙烯基(惟,不包含會成為多官能乙烯基芳香族聚合物之基、馬來醯亞胺基、納迪克醯亞胺基。宜為乙烯基苯基。)、馬來醯亞胺基、及納迪克醯亞胺基構成之群組中之1個以上之官能基的化合物,為具有氰氧基之氰酸酯化合物(B1)、具有乙烯基(宜為乙烯基苯基)之改性聚苯醚化合物(B2)、具有馬來醯亞胺基之馬來醯亞胺化合物(B3)、具有納迪克醯亞胺基之納迪克醯亞胺化合物(B4)更佳,為具有氰氧基之氰酸酯化合物(B1)、具有乙烯基(宜為乙烯基苯基)之改性聚苯醚化合物(B2)、具有馬來醯亞胺基之馬來醯亞胺化合物(B3)尤佳。>Thermosetting compound (B)> The resin composition of this embodiment contains a thermosetting compound (B). In this specification, the thermosetting compound (B) means a thermosetting compound other than the multifunctional vinyl aromatic polymer (A). The thermosetting compound (B) is preferably a compound having one or more functional groups selected from the group consisting of a cyano group, a vinyl group (but excluding groups that can become multifunctional vinyl aromatic polymers, maleimide groups, and nadicimide groups. Preferably, it is vinylphenyl), maleimide groups, and nadicimide groups. It is more preferably a cyanate compound (B1) having a cyano group, a modified polyphenylene ether compound (B2) having a vinyl group (preferably vinylphenyl), a maleimide compound (B3) having a maleimide group, or a nadicimide compound (B4) having a nadicimide group. It is particularly preferably a cyanate compound (B1) having a cyano group, a modified polyphenylene ether compound (B2) having a vinyl group (preferably vinylphenyl), or a maleimide compound (B3) having a maleimide group.

>>氰酸酯化合物(B1)>> 氰酸酯化合物係具有氰氧基之化合物的總稱。本發明中使用之氰酸酯化合物(B1)宜於1分子中具有1個以上之氰氧基,具有2個以上更佳。又,氰酸酯化合物(B1)1分子中之氰氧基之數目的上限宜為12以下,為10以下更佳。又,上述氰酸酯化合物(B1)之氰氧基宜為直接鍵結於芳香環的氰氧基。 就氰酸酯化合物(B1)而言,例如可列舉選自由萘酚芳烷基型氰酸酯化合物(萘酚芳烷基型氰酸酯)、伸萘基醚型氰酸酯化合物、苯酚酚醛清漆型氰酸酯化合物、聯苯芳烷基型氰酸酯化合物、雙酚A型氰酸酯化合物、二烯丙基雙酚A型氰酸酯化合物、雙酚M型氰酸酯化合物、二甲苯樹脂型氰酸酯化合物、參苯酚甲烷型氰酸酯化合物、及金剛烷骨架型氰酸酯化合物構成之群組中之至少1種。該等之中,宜為選自由萘酚芳烷基型氰酸酯化合物、伸萘基醚型氰酸酯化合物、及二甲苯樹脂型氰酸酯化合物構成之群組中之至少1種,為萘酚芳烷基型氰酸酯化合物更佳。該等氰酸酯化合物可利用公知的方法製備,亦可使用市售品。>>Cyanate compound (B1)>> Cyanate compound is a general term for compounds having a cyano group. The cyanate compound (B1) used in the present invention preferably has one or more cyano groups in one molecule, and preferably has two or more. In addition, the upper limit of the number of cyano groups in one molecule of the cyanate compound (B1) is preferably 12 or less, and preferably 10 or less. In addition, the cyano group of the above-mentioned cyanate compound (B1) is preferably a cyano group directly bonded to an aromatic ring. As for the cyanate compound (B1), for example, at least one selected from the group consisting of naphthol aralkyl type cyanate compounds (naphthol aralkyl type cyanate), naphthyl ether type cyanate compounds, phenol novolac type cyanate compounds, biphenyl aralkyl type cyanate compounds, bisphenol A type cyanate compounds, diallyl bisphenol A type cyanate compounds, bisphenol M type cyanate compounds, xylene resin type cyanate compounds, trisphenol methane type cyanate compounds, and adamantane skeleton type cyanate compounds can be listed. Among them, at least one selected from the group consisting of naphthol aralkyl type cyanate compounds, naphthyl ether type cyanate compounds, and xylene resin type cyanate compounds is preferred, and naphthol aralkyl type cyanate compounds are more preferred. These cyanate compounds can be prepared by known methods, and commercial products can also be used.

氰酸酯化合物(B1)可列舉下式(S1)表示之萘酚芳烷基型氰酸酯化合物。式(S1)表示之萘酚芳烷基型氰酸酯化合物,係將藉由α-萘酚或β-萘酚等萘酚類與對苯二甲醇、α,α’-二甲氧基-對二甲苯、1,4-二(2-羥基-2-丙基)苯等之反應得到的萘酚芳烷基樹脂、和鹵化氰予以縮合而獲得。其製法並無特別限定,可利用就氰酸酯合成所現存的任意方法製造。 [化6] 式(S1)中,RC1 ~RC4 各自獨立地表示氫原子或甲基。nC 為1至10之數。亦可含有2種以上之nC 不同的化合物。 關於氰酸酯化合物(B1),可參照日本特開2010-138364號公報之段落0024及0025,其內容納入本說明書中。The cyanate compound (B1) includes a naphthol aralkyl type cyanate compound represented by the following formula (S1). The naphthol aralkyl type cyanate compound represented by the formula (S1) is obtained by condensing a naphthol aralkyl resin obtained by reacting naphthols such as α-naphthol or β-naphthol with phthalic acid, α,α'-dimethoxy-p-xylene, 1,4-di(2-hydroxy-2-propyl)benzene, etc., and cyanogen halides. The preparation method is not particularly limited, and the compound can be prepared by any existing method for cyanate synthesis. [Chemistry 6] In formula (S1), R C1 to R C4 each independently represent a hydrogen atom or a methyl group. n C is a number from 1 to 10. Two or more compounds having different n C may be contained. For the cyanate compound (B1), reference may be made to paragraphs 0024 and 0025 of JP-A-2010-138364, the contents of which are incorporated herein.

>>改性聚苯醚化合物(B2)>> 熱硬化性化合物(B)宜為經以含有乙烯基(宜為乙烯基苯基)之取代基進行末端改性的改性聚苯醚化合物(B2)。本發明中使用之改性聚苯醚化合物(B2)宜於1分子中具有1個以上之乙烯基,具有2個以上更佳。又,改性聚苯醚化合物(B2)1分子中之乙烯基之數目的上限宜為5以下,為3以下更佳。 就改性聚苯醚化合物(B2)而言,例如為聚苯醚之末端之全部或一部分經以乙烯基或乙烯基苯基進行末端改性的改性物。本說明書中所稱「聚苯醚」,係指具有下式(X1)表示之聚苯醚骨架之化合物。>>Modified polyphenylene ether compound (B2)>> The thermosetting compound (B) is preferably a modified polyphenylene ether compound (B2) whose terminal is modified with a substituent containing a vinyl group (preferably a vinylphenyl group). The modified polyphenylene ether compound (B2) used in the present invention preferably has one or more vinyl groups in one molecule, and preferably has two or more. In addition, the upper limit of the number of vinyl groups in one molecule of the modified polyphenylene ether compound (B2) is preferably 5 or less, and preferably 3 or less. The modified polyphenylene ether compound (B2) is, for example, a polyphenylene ether in which all or part of the terminal is modified with a vinyl group or a vinylphenyl group. The "polyphenylene ether" referred to in this specification refers to a compound having a polyphenylene ether skeleton represented by the following formula (X1).

[化7] 式(X1)中,R24 、R25 、R26 、及R27 可相同也可不同,表示碳數6以下之烷基、芳基、鹵素原子、或氫原子。*表示鍵結位置。[Chemistry 7] In formula (X1), R 24 , R 25 , R 26 , and R 27 may be the same or different, and represent an alkyl group having 6 or less carbon atoms, an aryl group, a halogen atom, or a hydrogen atom. * represents a bonding position.

改性聚苯醚亦可更含有式(X2)或式(X3)表示之重複單元。 [化8] 式(X2)中,R28 、R29 、R30 、R34 、R35 可相同也可不同,為碳數6以下之烷基或苯基。R31 、R32 、R33 可相同也可不同,為氫原子、碳數6以下之烷基或苯基。*表示鍵結位置。 [化9] 式(X3)中,R36 、R37 、R38 、R39 、R40 、R41 、R42 、R43 可相同也可不同,為氫原子、碳數6以下之烷基或苯基。A為碳數1以上20以下之直鏈狀、分支狀或環狀之2價烴。*表示鍵結位置。The modified polyphenylene ether may further contain repeating units represented by formula (X2) or formula (X3). [Chemical 8] In formula (X2), R 28 , R 29 , R 30 , R 34 , and R 35 may be the same or different, and are an alkyl group having 6 or less carbon atoms or a phenyl group. R 31 , R 32 , and R 33 may be the same or different, and are a hydrogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group. * indicates a bonding position. [Chemistry 9] In formula (X3), R 36 , R 37 , R 38 , R 39 , R 40 , R 41 , R 42 , and R 43 may be the same or different and are hydrogen atoms, alkyl groups having 6 or less carbon atoms, or phenyl groups. A is a linear, branched, or cyclic divalent hydrocarbon having 1 to 20 carbon atoms. * indicates a bonding position.

改性聚苯醚化合物(B2)亦可使用將一部分或全部經以乙烯基苄基等乙烯性不飽和基、環氧基、胺基、羥基、巰基、羧基、及矽基等予以官能基化的改性聚苯醚。該等可使用1種或將2種以上組合使用。末端為羥基之聚苯醚,例如可列舉SABIC INNOVATIVE PLASTICS公司製SA90等。The modified polyphenylene ether compound (B2) may be a modified polyphenylene ether partially or entirely functionalized with an ethylenically unsaturated group such as vinylbenzyl, an epoxy group, an amine group, a hydroxyl group, a hydroxyl group, a carboxyl group, a silyl group, or the like. Such a modified polyphenylene ether may be used alone or in combination of two or more. Examples of polyphenylene ethers having a hydroxyl group at the end include SA90 manufactured by SABIC INNOVATIVE PLASTICS.

就改性聚苯醚化合物(B2)之製造方法而言,只要是可獲得本發明之效果,則無特別限定。例如,經以乙烯基苄基予以官能基化者,可藉由將2官能伸苯醚寡聚物與乙烯基苄基氯溶解於溶劑,在加熱攪拌下添加鹼並使其反應後,使樹脂固體化而製造。經以羧基予以官能基化者,例如可藉由在自由基引發劑的存在下或非存在下,將聚苯醚與不飽和羧酸或其官能基化之衍生物熔融混練並使其反應而製造。或將聚苯醚與不飽和羧酸或其官能化衍生物在自由基引發劑存在下或非存在下溶解於有機溶劑,在溶液中使其反應而製造。The method for producing the modified polyphenylene ether compound (B2) is not particularly limited as long as the effect of the present invention can be obtained. For example, those functionalized with vinylbenzyl groups can be produced by dissolving a difunctional phenylene ether oligomer and vinylbenzyl chloride in a solvent, adding a base and reacting them under heating and stirring, and then solidifying the resin. Those functionalized with carboxyl groups can be produced, for example, by melt-kneading and reacting polyphenylene ether with an unsaturated carboxylic acid or its functionalized derivative in the presence or absence of a free radical initiator. Alternatively, polyphenylene ether and an unsaturated carboxylic acid or its functionalized derivative are dissolved in an organic solvent in the presence or absence of a free radical initiator and reacted in the solution.

改性聚苯醚化合物(B2)宜包含至少一末端(宜為兩末端)具有乙烯性不飽和基之改性聚苯醚(以下,有時稱為「改性聚苯醚(g)」)。乙烯性不飽和基可列舉:乙烯基、烯丙基、丙烯醯基、甲基丙烯醯基、丙烯基、丁烯基、己烯基及辛烯基等烯基;環戊烯基及環己烯基等環烯基;乙烯基苯基、乙烯基苄基及乙烯基萘基等烯基芳基。兩末端的2個乙烯性不飽和基可為相同的官能基,也可為不同的官能基。The modified polyphenylene ether compound (B2) preferably comprises a modified polyphenylene ether having an ethylenically unsaturated group at at least one terminal (preferably both terminals) (hereinafter, sometimes referred to as "modified polyphenylene ether (g)"). Examples of the ethylenically unsaturated group include alkenyl groups such as vinyl, allyl, acryl, methacryl, propenyl, butenyl, hexenyl and octenyl; cycloalkenyl groups such as cyclopentenyl and cyclohexenyl; and alkenylaryl groups such as vinylphenyl, vinylbenzyl and vinylnaphthyl. The two ethylenically unsaturated groups at both terminals may be the same functional group or different functional groups.

改性聚苯醚(g)可列舉式(1)表示之結構。 [化10] 式(1)中,Xa 表示芳香族基,(Ya -O)m表示聚苯醚部分,R1 、R2 、R3 各自獨立地表示氫原子、烷基、烯基或炔基,m表示1~100之數,n表示1~6之數,q表示1~4之數。R1 、R2 、R3 宜為氫原子。m宜為1以上50以下之數,更佳為1以上30以下之數。n宜為1以上4以下之數,n尤佳為1或2,n又更佳為1。又,q宜為1以上3以下之數,q尤佳為1或2,q又更佳為2。 亦可含有2種以上之m、n、q各自不同的化合物。The modified polyphenylene ether (g) can be exemplified by the structure represented by formula (1). [Chemical 10] In the formula (1), Xa represents an aromatic group, ( Ya -O)m represents a polyphenylene ether moiety, R1 , R2 , and R3 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, or an alkynyl group, m represents a number of 1 to 100, n represents a number of 1 to 6, and q represents a number of 1 to 4. R1 , R2 , and R3 are preferably hydrogen atoms. m is preferably a number of 1 to 50, more preferably a number of 1 to 30. n is preferably a number of 1 to 4, more preferably 1 or 2, and more preferably 1. Moreover, q is preferably a number of 1 to 3, more preferably 1 or 2, and more preferably 2. Two or more compounds in which m, n, and q are different from each other may be contained.

改性聚苯醚(g)宜以式(2)表示。 [化11] 式(2)中之a、b中之至少一者不為0,表示0~100之數。a及b宜為1以上50以下之數,更佳為1以上30以下之數。 此處,-(O-X-O)-宜以式(3)或式(4)表示。亦可含有2種以上之a、b不同的化合物。 [化12] 式(3)中,R4 、R5 、R6 、R10 、R11 可相同也可不同,為碳數6以下之烷基或苯基。R7 、R8 、R9 可相同也可不同,為氫原子、碳數6以下之烷基或苯基。*表示鍵結位置。 [化13] 式(4)中,R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 可相同也可不同,為氫原子、碳數6以下之烷基或苯基。A1 為碳數20以下之直鏈狀、分支狀或環狀之2價烴基。*表示鍵結位置。The modified polyphenylene ether (g) is preferably represented by formula (2). In formula (2), at least one of a and b is not 0 and represents a number from 0 to 100. a and b are preferably numbers from 1 to 50, more preferably numbers from 1 to 30. Here, -(OXO)- is preferably represented by formula (3) or formula (4). Two or more compounds having different a and b may be contained. [Chemical 12] In formula (3), R 4 , R 5 , R 6 , R 10 , and R 11 may be the same or different, and are an alkyl group having 6 or less carbon atoms or a phenyl group. R 7 , R 8 , and R 9 may be the same or different, and are a hydrogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group. * indicates a bonding position. [Chemical 13] In formula (4), R12 , R13 , R14 , R15 , R16 , R17 , R18 , and R19 may be the same or different and are hydrogen atoms, alkyl groups having 6 or less carbon atoms, or phenyl groups. A1 is a linear, branched, or cyclic divalent hydrocarbon group having 20 or less carbon atoms. * indicates a bonding position.

又,式(2)中之-(Y-O)-宜以式(5)表示。 [化14] 式(5)中,R22 、R23 可相同也可不同,為氫原子、碳數6以下之烷基或苯基。R20 、R21 可相同也可不同,為碳數6以下之烷基或苯基。In addition, -(YO)- in formula (2) is preferably represented by formula (5). [Chemical 14] In formula (5), R 22 and R 23 may be the same or different and are a hydrogen atom, an alkyl group having a carbon number of 6 or less, or a phenyl group. R 20 and R 21 may be the same or different and are an alkyl group having a carbon number of 6 or less, or a phenyl group.

就式(4)中之A1 而言,例如可列舉:亞甲基、亞乙基、1-甲基亞乙基、1,1-亞丙基、2,2-亞丙基、1,4-伸苯基雙(1-甲基亞乙基)、1,3-伸苯基雙(1-甲基亞乙基)、環亞己基、苯基亞甲基、萘基亞甲基、1-苯基亞乙基等2價有機基,但不限於該等。As for A1 in formula (4), examples thereof include divalent organic groups such as methylene, ethylene, 1-methylethylene, 1,1-propylene, 2,2-propylene, 1,4-phenylenebis(1-methylethylene), 1,3-phenylenebis(1-methylethylene), cyclohexylene, phenylmethylene, naphthylmethylene, and 1-phenylethylene, but are not limited thereto.

上述改性聚苯醚中,宜為R4 、R5 、R6 、R10 、R11 、R20 、R21 係碳數3以下之烷基,R7 、R8 、R9 、R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 、R22 、R23 係氫原子或碳數3以下之烷基的聚苯醚,尤其式(3)或式(4)表示之-(O-X-O)-係式(9)、式(10)、及/或式(11),式(5)表示之-(Y-O)-係式(12)或式(13),或式(12)與式(13)無規排列而得之結構更佳。In the modified polyphenylene ether, preferably R4 , R5, R6, R10, R11, R20 , and R21 are alkyl groups having 3 or less carbon atoms, and R7 , R8, R9 , R12 , R13 , R14, R15 , R16 , R17 , R18 , R19 , R22 , and R23 are hydrogen atoms or alkyl groups having 3 or less carbon atoms. In particular, -(OXO)- represented by formula (3) or (4) is a polyphenylene ether of formula (9), formula (10), and/or formula (11), and -(YO)- represented by formula (5) is a polyphenylene ether of formula (12) or formula (13), or a structure obtained by randomly arranging formulas (12) and (13).

[化15] 式(10)中,R44 、R45 、R46 、R47 可相同也可不同,為氫原子或甲基。A2 為碳數20以下之直鏈狀、分支狀或環狀之2價烴基。*為鍵結位置。式(10)、式(11)中之A2 之具體例可列舉與式(4)中之A1 之具體例相同者。[Chemistry 15] In formula (10), R 44 , R 45 , R 46 , and R 47 may be the same or different and are hydrogen atoms or methyl groups. A 2 is a linear, branched, or cyclic divalent hydrocarbon group having 20 or less carbon atoms. * is a bonding position. Specific examples of A 2 in formula (10) and formula (11) are the same as those of A 1 in formula (4).

改性聚苯醚化合物(B2)之利用GPC法獲得之聚苯乙烯換算之數量平均分子量,宜為500以上3000以下。藉由數量平均分子量為上述下限值以上,有將本實施形態之樹脂組成物製成塗膜狀時黏附進一步受到抑制的傾向。藉由數量平均分子量為上述上限值以下,有於溶劑之溶解性更為改善的傾向。 又,改性聚苯醚化合物(B2)之利用GPC獲得之聚苯乙烯換算之重量平均分子量,宜為800以上10000以下,為800以上5000以下更佳。藉由為前述下限值以上,有樹脂組成物之介電常數及介電損耗正切變得更低的傾向,藉由為上述上限值以下,有於溶劑之溶解性、低黏度及成形性更為改善的傾向。 另外,改性聚苯醚化合物(B2)之末端之碳-碳不飽和雙鍵當量,宜為每1個碳-碳不飽和雙鍵400~5000g,為400g~2500g更佳。藉由為前述下限值以上,有介電常數及介電損耗正切變得更低的傾向。藉由為上述上限值以下,有於溶劑之溶解性、低黏度及成形性更為改善的傾向。The number average molecular weight of the modified polyphenylene ether compound (B2) obtained by GPC in terms of polystyrene is preferably 500 to 3000. When the number average molecular weight is above the lower limit, the adhesion of the resin composition of the present embodiment when it is made into a film tends to be further suppressed. When the number average molecular weight is below the upper limit, the solubility in the solvent tends to be further improved. In addition, the weight average molecular weight of the modified polyphenylene ether compound (B2) obtained by GPC in terms of polystyrene is preferably 800 to 10000, and more preferably 800 to 5000. By being above the aforementioned lower limit, the dielectric constant and dielectric loss tangent of the resin composition tend to become lower, and by being below the aforementioned upper limit, the solubility in the solvent, low viscosity and formability tend to be further improved. In addition, the carbon-carbon unsaturated double bond equivalent at the end of the modified polyphenylene ether compound (B2) is preferably 400 to 5000 g per carbon-carbon unsaturated double bond, and more preferably 400 g to 2500 g. By being above the aforementioned lower limit, the dielectric constant and dielectric loss tangent tend to become lower. By being below the aforementioned upper limit, the solubility in the solvent, low viscosity and formability tend to be further improved.

改性聚苯醚化合物(B2)之製造方法並無特別限定,例如可藉由將2官能性苯酚化合物與1官能性苯酚化合物進行氧化偶聯而獲得2官能性伸苯醚寡聚物的步驟(氧化偶聯步驟)、及將獲得之2官能性伸苯醚寡聚物之末端苯酚性羥基予以乙烯基苄基醚化的步驟(乙烯基苄基醚化步驟)來製造。又,作為如此之改性聚苯醚化合物(B2),例如可使用三菱瓦斯化學(股)製(OPE-2St1200等)。The method for producing the modified polyphenylene ether compound (B2) is not particularly limited, and it can be produced, for example, by a step of obtaining a difunctional phenylene ether oligomer by oxidative coupling of a difunctional phenol compound and a monofunctional phenol compound (oxidative coupling step), and a step of etherifying the terminal phenolic hydroxyl group of the obtained difunctional phenylene ether oligomer with vinylbenzyl (vinylbenzyl etherification step). As such a modified polyphenylene ether compound (B2), for example, OPE-2St1200 manufactured by Mitsubishi Gas Chemical Co., Ltd. can be used.

>>馬來醯亞胺化合物(B3)>> 馬來醯亞胺化合物(B3)係指分子中具有1個以上之馬來醯亞胺基的化合物。本發明中使用之馬來醯亞胺化合物(B3)宜於1分子中具有1個以上之馬來醯亞胺基,具有2個以上更佳。又,馬來醯亞胺化合物(B3)1分子中之馬來醯亞胺基之數目的上限宜為15以下,為13以下更佳。其中,宜為分子中具有2個以上之馬來醯亞胺基的雙馬來醯亞胺化合物、聚馬來醯亞胺化合物,為4,4’-二苯基甲烷馬來醯亞胺、4,4’-二苯醚雙馬來醯亞胺、間伸苯基雙馬來醯亞胺、1,6-雙馬來醯亞胺-(2,2,4-三甲基)己烷、含有下式(31)~(34)中之任一者表示之構成單元的化合物又更佳。 [化16] 式(31)中,R51 、R52 、R53 及R54 各自獨立地表示氫原子、碳數1~8之烷基或苯基。 式(31)中,R51 、R52 、R53 及R54 宜各自獨立地為甲基、乙基、苯基或氫原子,為氫原子更佳。 n1為1~10之數,為1~4之數更佳。亦可含有2種以上之n1不同的化合物。>>Maleimide compound (B3)>> Maleimide compound (B3) refers to a compound having one or more maleimide groups in a molecule. The maleimide compound (B3) used in the present invention preferably has one or more maleimide groups in one molecule, and more preferably has two or more maleimide groups. In addition, the upper limit of the number of maleimide groups in one molecule of the maleimide compound (B3) is preferably 15 or less, and more preferably 13 or less. Among them, preferably, it is a bismaleimide compound or polymaleimide compound having two or more maleimide groups in the molecule, and more preferably, it is 4,4'-diphenylmethanemaleimide, 4,4'-diphenylether bismaleimide, metaphenylene bismaleimide, 1,6-bismaleimide-(2,2,4-trimethyl)hexane, or a compound containing a constituent unit represented by any one of the following formulae (31) to (34). [Chemistry 16] In formula (31), R 51 , R 52 , R 53 and R 54 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a phenyl group. In formula (31), R 51 , R 52 , R 53 and R 54 each independently represent a methyl group, an ethyl group, a phenyl group or a hydrogen atom, and more preferably a hydrogen atom. n1 is a number of 1 to 10, and more preferably a number of 1 to 4. Compounds having two or more different n1s may be contained.

[化17] 式(32)中,R56 各自獨立地表示甲基或乙基,R57 各自獨立地表示氫原子或甲基。 4個R56 之中1~3個為甲基且剩餘的3~1個為乙基較佳,4個R56 之中2個為甲基且剩餘的2個為乙基更佳。另外,2個芳香族環上各自取代的2個R56 為甲基與乙基更佳。[Chemistry 17] In formula (32), R 56 each independently represents a methyl group or an ethyl group, and R 57 each independently represents a hydrogen atom or a methyl group. It is preferred that 1 to 3 of the 4 R 56 are methyl groups and the remaining 3 to 1 are ethyl groups, and it is more preferred that 2 of the 4 R 56 are methyl groups and the remaining 2 are ethyl groups. It is more preferred that the two R 56 substituted on the two aromatic rings are methyl groups and ethyl groups.

[化18] 式(33)中,R58 各自獨立地表示氫原子、甲基或乙基。 R58 宜為甲基或乙基,為甲基更佳。[Chemistry 18] In formula (33), R 58 each independently represents a hydrogen atom, a methyl group or an ethyl group. R 58 is preferably a methyl group or an ethyl group, and more preferably a methyl group.

[化19] 式(34)中,R59 各自獨立地表示氫原子、甲基或乙基。 R59 宜為甲基或乙基,為甲基更佳。[Chemistry 19] In formula (34), R59 each independently represents a hydrogen atom, a methyl group or an ethyl group. R59 is preferably a methyl group or an ethyl group, and more preferably a methyl group.

馬來醯亞胺化合物(B3)之不飽和醯亞胺基之當量宜為200g/eq以上,又,宜為400g/eq以下。此外,就此處之當量而言,當含有2種以上之馬來醯亞胺化合物時,係考慮了樹脂組成物中含有的各馬來醯亞胺化合物之質量的加重平均之不飽和醯亞胺基之當量。The unsaturated amide group equivalent of the maleimide compound (B3) is preferably 200 g/eq or more and 400 g/eq or less. When two or more maleimide compounds are contained, the equivalent is the weighted average unsaturated amide group equivalent in consideration of the mass of each maleimide compound contained in the resin composition.

>>納迪克醯亞胺化合物(B4)>> 納迪克醯亞胺化合物(B4)係分子內具有納迪克醯亞胺基的化合物。本發明中使用之納迪克醯亞胺化合物(B4)宜於1分子中具有1個以上之納迪克醯亞胺基,具有2個以上更佳。又,納迪克醯亞胺化合物(B4)1分子中之納迪克醯亞胺基之數目的上限宜為5以下,為3以下更佳。更具體而言,納迪克醯亞胺化合物(B4)宜具有下式(N1)或(N2)表示之基。*表示鍵結位置。 [化20] 式(N1)及式(N2)中,R1 各自獨立地表示氫原子或碳數1~6之烷基。>>Nadipic imide compound (B4)>> The nadic imide compound (B4) is a compound having a nadic imide group in the molecule. The nadic imide compound (B4) used in the present invention preferably has one or more nadic imide groups in one molecule, and more preferably has two or more. In addition, the upper limit of the number of nadic imide groups in one molecule of the nadic imide compound (B4) is preferably 5 or less, and more preferably 3 or less. More specifically, the nadic imide compound (B4) preferably has a group represented by the following formula (N1) or (N2). * represents a bonding position. [Chemical 20] In formula (N1) and formula (N2), R 1 each independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

納迪克醯亞胺化合物為下式(N3)表示之化合物尤佳。 [化21] 式(N3)中,R1 各自獨立地表示氫原子或碳數1~6之烷基,R2 表示碳數1~6之伸烷基或含芳香環之2價連接基。含芳香環之2價連接基可例示伸苯基、伸聯苯基及伸萘基。 另外,納迪克醯亞胺化合物(B4)可參酌國際公開第2015/105109號之段落0026~0035之記載,該等內容納入本說明書中。The nadic acid imide compound is preferably a compound represented by the following formula (N3). [Chemical 21] In formula (N3), R1 independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R2 represents an alkylene group having 1 to 6 carbon atoms or a divalent linking group containing an aromatic ring. Examples of the divalent linking group containing an aromatic ring include phenylene, biphenylene, and naphthylene. In addition, the description of the nadic acid imide compound (B4) can be referred to in paragraphs 0026 to 0035 of International Publication No. 2015/105109, and the contents are incorporated into this specification.

相對於本實施形態之樹脂組成物中之樹脂成分之總量100質量份,熱硬化性化合物(B)之含量宜為5質量份以上,為10質量份以上更佳,為15質量份以上尤佳,為20質量份以上又更佳。上限值宜為95質量份以下,為80質量份以下更佳,為70質量份以下尤佳。 又,相對於多官能乙烯基芳香族聚合物(A)100質量份,宜為1質量份以上,為10質量份以上更佳,為20質量份以上尤佳。上限值宜為1900質量份以下,為900質量份以下更佳,為400質量份以下尤佳,亦為120質量份以下,也可為80質量份以下,也可為60質量份以下。 樹脂組成物可僅含有1種熱硬化性化合物(B),亦可含有2種以上。含有2種以上時,合計量宜為上述範圍。The content of the thermosetting compound (B) is preferably 5 parts by mass or more, preferably 10 parts by mass or more, particularly preferably 15 parts by mass or more, and particularly preferably 20 parts by mass or more relative to 100 parts by mass of the total resin component in the resin composition of the present embodiment. The upper limit is preferably 95 parts by mass or less, preferably 80 parts by mass or less, and particularly preferably 70 parts by mass or less. In addition, relative to 100 parts by mass of the multifunctional vinyl aromatic polymer (A), it is preferably 1 part by mass or more, preferably 10 parts by mass or more, and particularly preferably 20 parts by mass or more. The upper limit is preferably 1900 parts by mass or less, preferably 900 parts by mass or less, particularly preferably 400 parts by mass or less, and also 120 parts by mass or less, and may also be 80 parts by mass or less, and may also be 60 parts by mass or less. The resin composition may contain only one thermosetting compound (B) or two or more thereof. When containing two or more thereof, the total amount is preferably within the above range.

本實施形態之樹脂組成物不含後述填充材(C)時,樹脂成分宜佔樹脂組成物之90質量%以上,佔95質量%以上更佳,佔98質量%以上尤佳。 本實施形態之樹脂組成物含有填充材(C)時,樹脂成分宜佔樹脂組成物之15質量%以上,佔20質量%以上更佳,佔30質量%以上尤佳。又,就上限值而言,樹脂成分宜佔樹脂組成物之90質量%以下,佔85質量%以下更佳,佔80質量%以下尤佳。When the resin composition of the present embodiment does not contain the filler (C) described later, the resin component preferably accounts for more than 90% by mass of the resin composition, preferably more than 95% by mass, and particularly preferably more than 98% by mass. When the resin composition of the present embodiment contains a filler (C), the resin component preferably accounts for more than 15% by mass of the resin composition, preferably more than 20% by mass, and particularly preferably more than 30% by mass. In addition, as for the upper limit, the resin component preferably accounts for less than 90% by mass of the resin composition, preferably less than 85% by mass, and particularly preferably less than 80% by mass.

>自由基聚合引發劑> 本實施形態之樹脂組成物不含自由基聚合引發劑。此處「不含」意指不積極地摻合,不包括無意間摻合雜質等的情形。無意間摻合雜質等的情形,係指例如以質量基準計為4ppm以下,進而為1ppm以下。本發明中宜為0ppm。 自由基聚合引發劑的種類並無特別限定,可列舉熱自由基聚合引發劑及光自由基聚合引發劑。 作為自由基聚合引發劑,具體而言,可列舉過氧化物(peroxide)、偶氮化合物、苯偶因化合物、苯乙酮化合物、蒽醌化合物、噻噸酮化合物、縮酮化合物、二苯甲酮化合物、氧化膦化合物。 過氧化物可列舉分子內具有過氧基(-O-O-)之化合物,宜為具有第三丁基過氧基之化合物、具有異丙苯基過氧基之化合物、具有苯甲醯基過氧基之化合物。就具體例而言,可列舉:過氧化苯甲醯(BPO)、過氧化對氯苯甲醯、過氧化二異丙苯(dicup)、二第三丁基過氧化物、過氧化碳酸二異丙酯、2,5-二甲基-2,5-二-第三丁基過氧化己炔(DYBP)、2,5-二甲基-2,5-二-第三丁基過氧化己烷。市售品可列舉日油公司製的PERBUTYL H、PERBUTYL P、PERBUTYL PV、PERCUMYL H、PERCUMYL P、PERCUMYL D、PEROCTA H、PERHEXA 25B等。 偶氮化合物係指於分子內具有偶氮基(-N=N-)之化合物,具體而言,可列舉偶氮雙異丁腈(AIBN)。市售品可列舉FUJIFILM Wako Pure Chemical製的AIBN、V-70、V-65等。 又,雖然不是過氧化物,但也可列舉2,3-二甲基-2,3-二苯基丁烷作為自由基聚合引發劑。市售品可列舉NOFMER BC-90等。 另外,亦可例示國際公開第2013/047305號之段落0042記載之自由基聚合引發劑,該等內容納入本說明書中。 另一方面,本實施形態之樹脂組成物亦可為不含陽離子聚合引發劑之構成。另外,本實施形態之樹脂組成物也可為不含光聚合引發劑之構成。>Free radical polymerization initiator> The resin composition of this embodiment does not contain a free radical polymerization initiator. Here, "does not contain" means not actively mixed, and does not include the case where impurities are mixed unintentionally. The case where impurities are mixed unintentionally means, for example, less than 4 ppm on a mass basis, and further less than 1 ppm. In the present invention, it is preferably 0 ppm. The type of free radical polymerization initiator is not particularly limited, and thermal free radical polymerization initiators and photo radical polymerization initiators can be listed. Specifically, as free radical polymerization initiators, peroxides, azo compounds, benzoin compounds, acetophenone compounds, anthraquinone compounds, thioxanone compounds, ketal compounds, benzophenone compounds, and phosphine oxide compounds can be listed. Peroxides include compounds having a peroxy group (-O-O-) in the molecule, preferably compounds having a tert-butyl peroxy group, compounds having a cumyl peroxy group, and compounds having a benzoyl peroxy group. Specific examples include: benzoyl peroxide (BPO), p-chlorobenzoyl peroxide, dicumyl peroxide (dicup), di-tert-butyl peroxide, diisopropyl peroxycarbonate, 2,5-dimethyl-2,5-di-tert-butyl peroxyhexyne (DYBP), and 2,5-dimethyl-2,5-di-tert-butyl peroxyhexane. Commercially available products include PERBUTYL H, PERBUTYL P, PERBUTYL PV, PERCUMYL H, PERCUMYL P, PERCUMYL D, PEROCTA H, PERHEXA 25B, etc. manufactured by NOF Corporation. Azo compounds refer to compounds having an azo group (-N=N-) in the molecule, and specifically, azobisisobutyronitrile (AIBN) can be cited. Commercially available products include AIBN, V-70, and V-65 manufactured by FUJIFILM Wako Pure Chemical. Also, although not a peroxide, 2,3-dimethyl-2,3-diphenylbutane can be cited as a free radical polymerization initiator. Commercially available products include NOFMER BC-90, etc. In addition, free radical polymerization initiators described in paragraph 0042 of International Publication No. 2013/047305 can also be exemplified, and such contents are incorporated into this specification. On the other hand, the resin composition of this embodiment can also be a composition that does not contain a cationic polymerization initiator. In addition, the resin composition of this embodiment may also be a composition without a photopolymerization initiator.

>填充材(C)> 為了改善低介電常數、低介電損耗正切、耐燃性及低熱膨脹性,本實施形態之樹脂組成物宜含有填充材(C),宜為無機填充材。所使用之填充材(C)可適當使用公知者,其種類並無特別限定,可理想地使用該領域中通常使用者。具體而言,可列舉:天然二氧化矽、熔融二氧化矽、合成二氧化矽、非晶二氧化矽、二氧化矽氣溶膠(AEROSIL)、中空二氧化矽等二氧化矽類;白碳黑、鈦白、氧化鋅、氧化鎂、氧化鋯、氮化硼、凝聚氮化硼、氮化矽、氮化鋁、硫酸鋇、氫氧化鋁、氫氧化鋁加熱處理品(將氫氧化鋁進行加熱處理以除去一部分結晶水而得者)、軟水鋁石、氫氧化鎂等金屬水合物;氧化鉬、鉬酸鋅等鉬化合物;硼酸鋅、錫酸鋅、氧化鋁、黏土、高嶺土、滑石、煅燒黏土、煅燒高嶺土、煅燒滑石、雲母、E-玻璃、A-玻璃、NE-玻璃、C-玻璃、L-玻璃、D-玻璃、S-玻璃、M-玻璃G20、玻璃短纖維(包含E玻璃、T玻璃、D玻璃、S玻璃、Q玻璃等之玻璃微粉末類。)、中空玻璃、球狀玻璃等無機系填充材;其他還可列舉苯乙烯型、丁二烯型、丙烯酸型等橡膠粉末、核殼型橡膠粉末、聚矽氧樹脂粉末、聚矽氧橡膠粉末、聚矽氧複合粉末等有機系填充材等。 該等之中,為選自由二氧化矽、氫氧化鋁、軟水鋁石、氧化鎂及氫氧化鎂構成之群組中之1種或2種以上較理想,為二氧化矽更佳。二氧化矽宜為球狀二氧化矽。球狀二氧化矽也可為中空二氧化矽。 藉由使用該等填充材,會改善樹脂組成物之熱膨脹特性、尺寸穩定性、阻燃性等特性。>Filler (C)> In order to improve low dielectric constant, low dielectric loss tangent, flame retardancy and low thermal expansion, the resin composition of this embodiment preferably contains a filler (C), preferably an inorganic filler. The filler (C) used can be a known one, and its type is not particularly limited, and it is ideal to use a filler commonly used in this field. Specifically, they include: natural silica, fused silica, synthetic silica, amorphous silica, aerosol silica (AEROSIL), hollow silica and other silicas; white carbon black, titanium white, zinc oxide, magnesium oxide, zirconium oxide, boron nitride, condensed boron nitride, silicon nitride, aluminum nitride, barium sulfate, aluminum hydroxide, aluminum hydroxide heat-treated product (aluminum hydroxide is heat-treated to remove part of the crystal water), alumina, magnesium hydroxide and other metal hydrates; molybdenum compounds such as molybdenum oxide and zinc molybdate; zinc borate, zinc stannate, aluminum oxide, clay and other metal hydrates. , kaolin, talc, calcined clay, calcined kaolin, calcined talc, mica, E-glass, A-glass, NE-glass, C-glass, L-glass, D-glass, S-glass, M-glass G20, glass staple (including glass micropowders such as E-glass, T-glass, D-glass, S-glass, Q-glass, etc.), hollow glass, spherical glass and other inorganic fillers; others include styrene type, butadiene type, acrylic type and other rubber powders, core-shell type rubber powders, silicone resin powders, silicone rubber powders, silicone composite powders and other organic fillers. Among them, one or more selected from the group consisting of silica, aluminum hydroxide, alumina, magnesium oxide and magnesium hydroxide is preferred, and silica is more preferred. The silica is preferably spherical silica. The spherical silica may also be hollow silica. By using such fillers, the thermal expansion characteristics, dimensional stability, flame retardancy and other characteristics of the resin composition are improved.

本實施形態之樹脂組成物中之填充材(C)之含量,可因應所期望之特性適當設定,並無特別限定,令樹脂組成物中之樹脂成分之總量為100質量份時,宜為10質量份以上,為20質量份以上更佳,為30質量份以上尤佳,也可為50質量份以上。上限值宜為500質量份以下,為400質量份以下更佳,為300質量份以下尤佳,為250質量份以下又更佳,也可為200質量份以下。 填充材(C)可使用1種,亦可使用2種以上。使用2種以上時,其合計量宜為上述範圍。The content of the filler (C) in the resin composition of this embodiment can be appropriately set according to the desired properties, and there is no special limitation. When the total amount of the resin components in the resin composition is 100 parts by mass, it is preferably 10 parts by mass or more, preferably 20 parts by mass or more, preferably 30 parts by mass or more, and can also be 50 parts by mass or more. The upper limit is preferably 500 parts by mass or less, preferably 400 parts by mass or less, preferably 300 parts by mass or less, and even more preferably 250 parts by mass or less, and can also be 200 parts by mass or less. The filler (C) can be one type or two or more types. When two or more types are used, the total amount should be within the above range.

>其他樹脂成分> 本實施形態之樹脂組成物亦可含有上述多官能乙烯基芳香族聚合物(A)及熱硬化性化合物(B)以外的其他樹脂成分。其他樹脂成分可例示選自由環氧樹脂、酚醛樹脂、氧雜環丁烷樹脂、苯并㗁𠯤化合物、具有可聚合之不飽和基的化合物、彈性體及活性酯化合物構成之群組中之1種以上。 本實施形態之樹脂組成物中,樹脂成分中之多官能乙烯基芳香族聚合物(A)及熱硬化性化合物(B)之合計含量宜為50質量%以上,為70質量%以上較佳,為80質量%以上更佳,為90質量%以上尤佳,亦可為95質量%以上,也可為97質量%以上,也可為98質量%以上。>Other resin components> The resin composition of this embodiment may also contain other resin components other than the above-mentioned multifunctional vinyl aromatic polymer (A) and thermosetting compound (B). Examples of other resin components include one or more selected from the group consisting of epoxy resins, phenolic resins, cyclohexane resins, benzophenone compounds, compounds having polymerizable unsaturated groups, elastomers, and active ester compounds. In the resin composition of the present embodiment, the total content of the multifunctional vinyl aromatic polymer (A) and the thermosetting compound (B) in the resin component is preferably 50 mass % or more, preferably 70 mass % or more, more preferably 80 mass % or more, and even more preferably 90 mass % or more, and may be 95 mass % or more, 97 mass % or more, or 98 mass % or more.

>硬化促進劑(觸媒)> 本實施形態之樹脂組成物亦可更含有硬化促進劑。硬化促進劑並無特別限定,例如可列舉:有機金屬鹽類(例如,辛酸鋅、環烷酸鋅、環烷酸鈷、環烷酸銅、乙醯丙酮鐵、辛酸鎳、辛酸錳等)、酚化合物(例如,苯酚、二甲酚、甲酚、間苯二酚、鄰苯二酚、辛酚、壬酚等)、醇類(例如,1-丁醇、2-乙基己醇等)、咪唑類(例如,2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、1-氰基乙基-2-苯基咪唑、1-氰基乙基-2-乙基-4-甲基咪唑、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑等)、及該等咪唑類的羧酸或其酸酐類之加成物等衍生物、胺類(例如,二氰二胺(dicyandiamide)、苄基二甲胺、4-甲基-N,N-二甲基苄胺等)、磷化合物(例如,膦系化合物、氧化膦系化合物、鏻鹽系化合物、二膦系化合物等)、環氧-咪唑加成物系化合物。 硬化促進劑宜為咪唑類及有機金屬鹽,為咪唑類更佳。> Hardening accelerator (catalyst)> The resin composition of the present embodiment may further contain a hardening accelerator. The hardening accelerator is not particularly limited, and examples thereof include: organic metal salts (e.g., zinc octanoate, zinc cycloalkanoate, cobalt cycloalkanoate, copper cycloalkanoate, iron acetylacetonate, nickel octanoate, manganese octanoate, etc.), phenol compounds (e.g., phenol, xylenol, cresol, resorcinol, o-catechin, octylphenol, nonylphenol, etc.), alcohols (e.g., 1-butanol, 2-ethylhexanol, etc.), imidazoles (e.g., 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl- 2-ethyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, etc.), and derivatives of such imidazoles such as carboxylic acids or their anhydrides, amines (e.g., dicyandiamide, benzyldimethylamine, 4-methyl-N,N-dimethylbenzylamine, etc.), phosphorus compounds (e.g., phosphine compounds, phosphine oxide compounds, phosphonium salt compounds, diphosphine compounds, etc.), epoxy-imidazole adduct compounds. The hardening accelerator is preferably an imidazole and an organic metal salt, preferably an imidazole.

含有硬化促進劑時,硬化促進劑之含量之下限值,相對於樹脂組成物中之樹脂成分之總量100質量份,宜為0.005質量份以上,為0.01質量份以上更佳,為0.1質量份以上尤佳。又,前述硬化促進劑之含量的上限,相對於樹脂組成物中之樹脂成分之總量100質量份,宜為10質量份以下,為5質量份以下更佳,為2質量份以下尤佳。 硬化促進劑可單獨使用1種,或將2種以上組合使用。使用2種以上時,合計量為上述範圍。When a hardening accelerator is contained, the lower limit of the content of the hardening accelerator is preferably 0.005 parts by mass or more, preferably 0.01 parts by mass or more, and particularly preferably 0.1 parts by mass or more, relative to 100 parts by mass of the total amount of the resin components in the resin composition. In addition, the upper limit of the content of the aforementioned hardening accelerator is preferably 10 parts by mass or less, preferably 5 parts by mass or less, and particularly preferably 2 parts by mass or less, relative to 100 parts by mass of the total amount of the resin components in the resin composition. One hardening accelerator may be used alone, or two or more may be used in combination. When two or more are used, the total amount is within the above range.

>溶劑> 本實施形態之樹脂組成物也可含有溶劑,宜含有有機溶劑。此時,本實施形態之樹脂組成物為上述各種樹脂成分之至少一部分,較佳為全部溶解於溶劑或與溶劑相溶的形態(溶液或清漆)。就溶劑而言,只要是可溶解上述各種樹脂成分之至少一部分,較佳為全部或與其相溶的極性有機溶劑或無極性有機溶劑,則無特別限定,作為極性有機溶劑,例如可列舉:酮類(例如,丙酮、甲乙酮、甲基異丁基酮等)、賽珞蘇類(例如,丙二醇單甲醚、丙二醇單甲醚乙酸酯等)、酯類(例如,乳酸乙酯、乙酸甲酯、乙酸乙酯、乙酸丁酯、乙酸異戊酯、乳酸乙酯、甲氧基丙酸甲酯、羥基異丁酸甲酯等)、醯胺類(例如,二甲氧基乙醯胺、二甲基甲醯胺類等),作為無極性有機溶劑,可列舉芳香族烴(例如,甲苯、二甲苯等)。 溶劑可單獨使用1種,或將2種以上組合使用。>Solvent> The resin composition of this embodiment may also contain a solvent, preferably an organic solvent. In this case, the resin composition of this embodiment is at least a part of the various resin components mentioned above, preferably in a form that is completely dissolved in the solvent or compatible with the solvent (solution or varnish). The solvent is not particularly limited as long as it is a polar organic solvent or a non-polar organic solvent that can dissolve at least a part of the various resin components mentioned above, preferably all of them, or is compatible with them. Examples of polar organic solvents include ketones (e.g., acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), cellosols (e.g., propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, etc.), esters (e.g., ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, isoamyl acetate, ethyl lactate, methyl methoxypropionate, methyl hydroxyisobutyrate, etc.), and amides (e.g., dimethoxyacetamide, dimethylformamide, etc.). Examples of non-polar organic solvents include aromatic hydrocarbons (e.g., toluene, xylene, etc.). Solvents can be used alone or in combination of two or more.

>其他成分> 本實施形態之樹脂組成物除含有上述成分外,在不妨害本發明之效果的範圍內,也可含有阻燃劑、紫外線吸收劑、抗氧化劑、螢光增白劑、光增感劑、染料、顏料、增黏劑、流動調整劑、潤滑劑、消泡劑、分散劑、調平劑、光澤劑、聚合抑制劑、矽烷偶聯劑等。該等添加劑可單獨使用1種,或將2種以上組合使用。>Other ingredients> In addition to the above ingredients, the resin composition of this embodiment may also contain flame retardants, ultraviolet absorbers, antioxidants, fluorescent whitening agents, photosensitizers, dyes, pigments, thickeners, flow regulators, lubricants, defoamers, dispersants, leveling agents, glossing agents, polymerization inhibitors, silane coupling agents, etc. within the scope that does not hinder the effects of the present invention. These additives can be used alone or in combination of two or more.

>樹脂組成物之物性> 本實施形態之樹脂組成物,當成形為1.6mm厚之板狀硬化物時,可將於10GHz之介電常數(Dk)設定為2.6以下,亦可設定為2.5以下。前述介電常數的下限值為1.0較理想,但實際為2.1以上。 又,本實施形態之樹脂組成物,當成形為1.6mm厚之板狀硬化物時,可將於10GHz之介電損耗正切(Df)設定為0.0030以下,亦可設定為0.0025以下,也可設定為0.0020以下,也可設定為0.0015以下。前述介電損耗正切的下限值為0較理想,但實際為0.0001以上。 介電常數及介電損耗正切係利用後述實施例記載之方法進行測定。> Physical properties of resin composition > The resin composition of this embodiment, when formed into a 1.6 mm thick plate-shaped cured product, can set the dielectric constant (Dk) at 10 GHz to less than 2.6, or less than 2.5. The lower limit of the dielectric constant is preferably 1.0, but is actually greater than 2.1. In addition, the resin composition of this embodiment, when formed into a 1.6 mm thick plate-shaped cured product, can set the dielectric loss tangent (Df) at 10 GHz to less than 0.0030, or less than 0.0025, or less than 0.0020, or less than 0.0015. The lower limit of the dielectric loss tangent is preferably 0, but is actually greater than 0.0001. The dielectric constant and dielectric loss tangent are measured using the method described in the following embodiments.

本發明之較佳實施形態之樹脂組成物可實現低熱膨脹係數(CTE)。例如,JlS C 6481 5.19規定之CTE(ppm/℃)宜為75以下,為72以下更佳,為70以下尤佳。下限值並無特別限制,實際為50以上。The resin composition of the preferred embodiment of the present invention can achieve a low coefficient of thermal expansion (CTE). For example, the CTE (ppm/°C) specified in JIS C 6481 5.19 is preferably 75 or less, more preferably 72 or less, and even more preferably 70 or less. The lower limit is not particularly limited, and is actually 50 or more.

本實施形態之樹脂組成物,當成形為1.6mm厚之板狀硬化物時,可將玻璃轉移溫度設定為230℃以上,亦可設定為235℃以上,也可設定為240℃以上。前述玻璃轉移溫度的上限值並無特別規定,為400℃以下,進一步實際為350℃以下。 又,本實施形態之樹脂組成物,當成形為1.6mm厚之板狀硬化物時,其玻璃轉移溫度宜比起由摻合有相當於該樹脂組成物中含有之樹脂成分之1質量%之量之熱自由基聚合引發劑(例如,日油公司製PERBUTYL P(商品名))的樹脂組成物形成的1.6mm厚之板狀硬化物之玻璃轉移溫度高8℃以上較佳,高10℃以上更佳。上限值例如為25℃以下。 玻璃轉移溫度係利用後述實施例記載之方法進行測定。When the resin composition of this embodiment is formed into a 1.6 mm thick plate-shaped hardened product, the glass transition temperature can be set to above 230°C, above 235°C, or above 240°C. The upper limit of the glass transition temperature is not particularly specified, but is below 400°C, and is further practically below 350°C. Furthermore, when the resin composition of the present embodiment is formed into a 1.6 mm thick plate-shaped cured product, its glass transition temperature is preferably 8°C or higher, and more preferably 10°C or higher than the glass transition temperature of a 1.6 mm thick plate-shaped cured product formed by a resin composition mixed with a thermal free radical polymerization initiator (e.g., PERBUTYL P (trade name) manufactured by NOF Corporation) in an amount equivalent to 1 mass % of the resin component contained in the resin composition. The upper limit is, for example, 25°C or lower. The glass transition temperature is measured by the method described in the embodiment described below.

>樹脂組成物之製造方法> 本實施形態之樹脂組成物可依常法製造。例如可列舉將多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B)予以混合的態樣。此時的理想含量如上所述。又,本實施形態之樹脂組成物中,進一步亦可使填充材(C)、其他樹脂成分、其他添加劑適當共存並進行混練等。亦可藉由摻合其他樹脂成分來改善外觀,或使其他特性變得良好。 本實施形態之樹脂組成物之一例係含有溶劑之清漆。又,本實施形態之樹脂組成物之另一例係板狀硬化物、薄膜。另外,本實施形態之樹脂組成物可理想地用於後述用途。>Manufacturing method of resin composition> The resin composition of this embodiment can be manufactured according to the conventional method. For example, a state in which a multifunctional vinyl aromatic polymer (A) and a thermosetting compound (B) are mixed can be cited. The ideal content at this time is as described above. In addition, in the resin composition of this embodiment, fillers (C), other resin components, and other additives can also be appropriately coexisted and kneaded. It is also possible to improve the appearance or make other properties better by blending other resin components. One example of the resin composition of this embodiment is a varnish containing a solvent. Another example of the resin composition of this embodiment is a plate-like cured product or a film. In addition, the resin composition of this embodiment can be ideally used for the purposes described below.

>用途> 本實施形態之樹脂組成物可作為硬化物使用。具體而言,本實施形態之樹脂組成物,作為低介電常數材料及/或低介電損耗正切材料,可理想地用作印刷配線板之絕緣層、半導體封裝用材料。本實施形態之樹脂組成物可理想地用作構成預浸體、由預浸體形成之覆金屬箔疊層板、樹脂複合片、及印刷配線板之材料。 本實施形態之樹脂組成物,當使用其製成層狀成形品時,其厚度宜為5μm以上,為10μm以上更佳。上限值宜為2mm以下,為1mm以下更佳。此外,就上述層狀成形品之厚度而言,例如為使本實施形態之樹脂組成物含浸於玻璃布等者時,意指包含玻璃布之厚度。 由本實施形態之樹脂組成物形成之薄膜等成形品,可用於進行曝光顯影並形成圖案之用途,也可用於不進行曝光顯影之用途。尤其適合於不進行曝光顯影之用途。>Application> The resin composition of this embodiment can be used as a cured product. Specifically, the resin composition of this embodiment can be ideally used as an insulating layer of a printed wiring board and a semiconductor packaging material as a low dielectric constant material and/or a low dielectric loss tangent material. The resin composition of this embodiment can be ideally used as a material for constituting a prepreg, a metal foil-clad laminate formed from a prepreg, a resin composite sheet, and a printed wiring board. When the resin composition of this embodiment is used to make a layered molded product, its thickness is preferably 5 μm or more, preferably 10 μm or more. The upper limit is preferably 2 mm or less, preferably 1 mm or less. In addition, the thickness of the layered molded product, for example, when the resin composition of the present embodiment is impregnated in glass cloth, means the thickness including the glass cloth. The molded product such as a film formed by the resin composition of the present embodiment can be used for purposes of exposure and development to form a pattern, and can also be used for purposes without exposure and development. It is particularly suitable for purposes without exposure and development.

>>預浸體>> 理想實施形態之預浸體係由基材(預浸體基材)、與本實施形態之樹脂組成物形成。本實施形態之預浸體,例如可藉由將本實施形態之樹脂組成物使用(例如,含浸或塗布)於基材後,利用加熱(例如,於120~220℃乾燥2~15分鐘的方法等)使其半硬化而獲得。此時,樹脂組成物相對於基材之附著量,亦即樹脂組成物量(包括填充材)相對於半硬化後之預浸體之總量,宜為20~99質量%之範圍。>>Prepreg>> The prepreg of the ideal embodiment is formed by a substrate (prepreg substrate) and the resin composition of the present embodiment. The prepreg of the present embodiment can be obtained, for example, by applying (for example, impregnating or coating) the resin composition of the present embodiment to the substrate and then semi-hardening it by heating (for example, drying at 120 to 220°C for 2 to 15 minutes). At this time, the amount of the resin composition attached to the substrate, that is, the amount of the resin composition (including the filler) relative to the total amount of the prepreg after semi-hardening, is preferably in the range of 20 to 99% by mass.

就基材而言,只要是用於各種印刷配線板材料的基材,則無特別限定。作為基材的材質,例如可列舉:玻璃纖維(例如,E玻璃、D玻璃、L玻璃、S玻璃、T玻璃、Q玻璃、UN玻璃、NE玻璃、球狀玻璃等)、玻璃以外之無機纖維(例如,石英等)、有機纖維(例如,聚醯亞胺、聚醯胺、聚酯、液晶聚酯等)。基材的形態並無特別限定,可列舉:織布、不織布、粗紗、切股氈、表面氈等由層狀纖維構成之基材。尤其宜為玻璃布等由長纖維構成之基材。此處,長纖維係指例如數量平均纖維長為6mm以上者。該等基材可單獨使用1種,或將2種以上組合使用。該等基材中,考量尺寸穩定性的觀點,宜為經施以超開纖處理、孔目堵塞處理之織布,考量吸濕耐熱性的觀點,宜為經環氧矽烷處理、胺基矽烷處理等以矽烷偶聯劑等進行表面處理的玻璃織布,考量電特性的觀點,宜為L-玻璃、NE-玻璃、Q-玻璃等由展示低介電常數性、低介電損耗正切性之玻璃纖維構成的低介電玻璃布。基材之厚度並無特別限定,例如可為約0.01~0.19mm。As for the substrate, there is no particular limitation as long as it is a substrate used for various printed wiring board materials. Examples of the material of the substrate include: glass fiber (for example, E glass, D glass, L glass, S glass, T glass, Q glass, UN glass, NE glass, spherical glass, etc.), inorganic fibers other than glass (for example, quartz, etc.), and organic fibers (for example, polyimide, polyamide, polyester, liquid crystal polyester, etc.). The form of the substrate is not particularly limited, and examples include: substrates composed of layered fibers such as woven fabrics, non-woven fabrics, coarse yarns, chopped strands, and surface felt. In particular, substrates composed of long fibers such as glass cloth are preferred. Here, long fibers refer to, for example, those having a number average fiber length of 6 mm or more. These substrates can be used alone or in combination of two or more. Among these substrates, from the perspective of dimensional stability, it is preferable to use a woven fabric that has been subjected to super fiber opening treatment or pore blocking treatment. From the perspective of moisture absorption and heat resistance, it is preferable to use a glass woven fabric that has been surface treated with a silane coupling agent such as epoxysilane treatment or aminosilane treatment. From the perspective of electrical properties, it is preferable to use a low dielectric glass cloth composed of glass fibers exhibiting low dielectric constant and low dielectric loss tangent such as L-glass, NE-glass, and Q-glass. The thickness of the substrate is not particularly limited, and can be, for example, about 0.01 to 0.19 mm.

>>覆金屬箔疊層板>> 理想實施形態之覆金屬箔疊層板包括:由本實施形態之預浸體形成之至少1層、及配置於前述由預浸體形成之層之單面或兩面的金屬箔。本實施形態之覆金屬箔疊層板,例如可利用配置至少1片(較佳為重疊2片以上)之本實施形態之預浸體,在其單面或兩面配置金屬箔並進行疊層成形的方法製作。更詳細而言,可藉由在預浸體之單面或兩面配置銅、鋁等金屬箔並進行疊層成形而製作。預浸體的片數宜為1~10片,為2~10片更佳,為2~7片尤佳。金屬箔只要是用於印刷配線板用材料者,則無特別限定,例如可列舉壓延銅箔、電解銅箔等銅箔。銅箔的厚度並無特別限定,可為約1.5~70μm。成形方法可列舉將印刷配線板用疊層板及多層板予以成形時通常使用的方法,更詳細而言,可列舉使用多段壓製機、多段真空壓製機、連續成形機、高壓釜成形機等,以溫度約180~350℃、加熱時間約100~300分鐘、面壓約20~100kg/cm2 進行疊層成形的方法。又,亦可藉由將本實施形態之預浸體、與另外製作的內層用配線板(亦稱為內層電路板)組合並疊層成形,而製成多層板。就多層板之製造方法而言,例如,可在1片本實施形態之預浸體之兩面配置約35μm之銅箔,以上述成形方法進行疊層形成後,形成內層電路,對該電路實施黑化處理而形成內層電路板,之後,將該內層電路板與本實施形態之預浸體交替地各1片逐一配置,進一步於最外層配置銅箔,依上述條件,較佳為於真空下進行疊層成形,而製作多層板。本實施形態之覆金屬箔疊層板可理想地用作印刷配線板。>>Metal foil-clad laminated plate>> The metal foil-clad laminated plate of an ideal embodiment includes: at least one layer formed by the prepreg of this embodiment, and metal foil arranged on one or both sides of the layer formed by the prepreg. The metal foil-clad laminated plate of this embodiment can be produced, for example, by a method of arranging at least one sheet (preferably stacking two or more sheets) of the prepreg of this embodiment, arranging metal foil on one or both sides thereof, and performing lamination forming. In more detail, it can be produced by arranging metal foil such as copper and aluminum on one or both sides of the prepreg and performing lamination forming. The number of prepreg sheets is preferably 1 to 10 sheets, more preferably 2 to 10 sheets, and even more preferably 2 to 7 sheets. There is no particular limitation on the metal foil as long as it is used as a material for printed wiring boards. For example, rolled copper foil, electrolytic copper foil and other copper foils can be listed. The thickness of the copper foil is not particularly limited and can be about 1.5 to 70 μm. The forming method can be the method commonly used when forming laminated boards and multi-layer boards for printed wiring boards. More specifically, there can be a method of using a multi-stage press, a multi-stage vacuum press, a continuous forming machine, an autoclave forming machine, etc., at a temperature of about 180 to 350°C, a heating time of about 100 to 300 minutes, and a surface pressure of about 20 to 100 kg/ cm2 for laminate forming. Furthermore, a multi-layer board can be produced by combining the prepreg of the present embodiment with a separately produced inner layer wiring board (also referred to as an inner layer circuit board) and laminating them. As for the method for producing the multi-layer board, for example, copper foil of about 35 μm can be arranged on both sides of a sheet of the prepreg of the present embodiment, and after laminating them by the above-mentioned forming method, an inner layer circuit is formed, and the circuit is subjected to blackening treatment to form an inner layer circuit board. Thereafter, the inner layer circuit board and the prepreg of the present embodiment are alternately arranged one by one, and copper foil is further arranged on the outermost layer. Under the above-mentioned conditions, it is preferred to perform laminating and forming under vacuum to produce the multi-layer board. The metal-clad laminate of this embodiment can be preferably used as a printed wiring board.

>>印刷配線板>> 理想實施形態之印刷配線板係包含絕緣層、及配置於前述絕緣層之表面的導體層的印刷配線板,前述絕緣層含有由本實施形態之樹脂組成物形成之層及由上述實施形態之預浸體形成之層中之至少一者。如此之印刷配線板可依常法製造,其製造方法並無特別限定。以下顯示印刷配線板之製造方法之一例。首先準備上述覆銅箔疊層板等覆金屬箔疊層板。然後,對覆金屬箔疊層板之表面實施蝕刻處理而形成內層電路,製作內層基板。視需要對於該內層基板之內層電路表面實施用以提高黏接強度之表面處理,然後在該內層電路表面重疊所需片數的上述預浸體,進一步於其外側疊層外層電路用之金屬箔,加熱加壓並成形為一體。以此方式製成在內層電路與外層電路用之金屬箔之間形成有基材及由熱硬化性樹脂組成物之硬化物構成之絕緣層的多層疊層板。然後,對該多層的疊層板施以通孔(through hole)、介層孔(via hole)用之開孔加工後,在該孔之壁面形成用以使內層電路與外層電路用之金屬箔導通的鍍敷金屬皮膜,進一步對外層電路用之金屬箔實施蝕刻處理而形成外層電路,藉此製成印刷配線板。>>Printed wiring board>> The printed wiring board of an ideal embodiment is a printed wiring board including an insulating layer and a conductive layer arranged on the surface of the insulating layer, wherein the insulating layer contains at least one of a layer formed by the resin composition of the present embodiment and a layer formed by the prepreg of the above-mentioned embodiment. Such a printed wiring board can be manufactured according to the conventional method, and its manufacturing method is not particularly limited. An example of a method for manufacturing a printed wiring board is shown below. First, a metal foil laminate such as the above-mentioned copper foil laminate is prepared. Then, the surface of the metal foil laminate is etched to form an inner layer circuit to produce an inner layer substrate. The inner circuit surface of the inner substrate is subjected to surface treatment to improve the bonding strength as required, and then the required number of prepregs are stacked on the inner circuit surface, and a metal foil for the outer circuit is stacked on the outer side thereof, and the prepreg is heated and pressed to form an integral body. In this way, a multi-layer laminate is manufactured with a base material and an insulating layer composed of a cured product of a thermosetting resin composition formed between the inner circuit and the metal foil for the outer circuit. Then, after the multi-layer laminate is subjected to hole opening processing for through holes and via holes, a plated metal film is formed on the wall surface of the hole to conduct the metal foil for the inner layer circuit and the outer layer circuit. The metal foil for the outer layer circuit is further etched to form the outer layer circuit, thereby manufacturing a printed wiring board.

上述製造例獲得之印刷配線板係具備絕緣層、及形成於該絕緣層之表面之導體層,且絕緣層含有上述本實施形態之樹脂組成物的構成。亦即,上述本實施形態之預浸體(例如,由基材及含浸或塗布於基材之本實施形態之樹脂組成物形成的預浸體)、上述本實施形態之覆金屬箔疊層板之由樹脂組成物形成之層,係本實施形態之絕緣層。The printed wiring board obtained in the above manufacturing example has an insulating layer and a conductive layer formed on the surface of the insulating layer, and the insulating layer contains the resin composition of the above embodiment. That is, the prepreg of the above embodiment (for example, a prepreg formed by a substrate and the resin composition of the present embodiment impregnated or coated on the substrate) and the layer formed by the resin composition of the metal foil-clad laminate of the above embodiment are the insulating layer of the present embodiment.

>>樹脂複合片>> 理想實施形態之樹脂複合片包含支持體、及配置於前述支持體之表面的由本實施形態之樹脂組成物形成之層。樹脂複合片可用作堆疊(build-up)用薄膜或乾膜防焊劑。樹脂複合片之製造方法並無特別限定,例如可列舉藉由將上述本實施形態之樹脂組成物溶解於溶劑而得之溶液塗布(塗覆)於支持體並進行乾燥,而獲得樹脂複合片的方法。>>Resin composite sheet>> The resin composite sheet of an ideal embodiment includes a support, and a layer formed of the resin composition of the present embodiment disposed on the surface of the aforementioned support. The resin composite sheet can be used as a thin film for build-up or a dry film solder resist. The method for manufacturing the resin composite sheet is not particularly limited, and for example, a method of obtaining the resin composite sheet by applying (coating) a solution obtained by dissolving the resin composition of the present embodiment in a solvent on a support and drying the solution can be cited.

作為此處所使用之支持體,例如可列舉:聚乙烯薄膜、聚丙烯薄膜、聚碳酸酯薄膜、聚對苯二甲酸乙二醇酯薄膜、乙烯四氟乙烯共聚物薄膜、以及於該等薄膜之表面塗布脫模劑而得之脫模薄膜、聚醯亞胺薄膜等有機系薄膜基材;銅箔、鋁箔等導體箔、玻璃板、SUS板、FRP等板狀者,並無特別限定。Examples of the support used herein include polyethylene film, polypropylene film, polycarbonate film, polyethylene terephthalate film, ethylene tetrafluoroethylene copolymer film, and organic film substrates such as release films obtained by coating a release agent on the surface of these films, polyimide films, etc.; conductive foils such as copper foil and aluminum foil, glass plates, SUS plates, FRP and the like, but there are no particular limitations.

就塗布方法(塗覆方法)而言,例如可列舉利用塗布棒、模塗機、刮刀塗佈機、貝克塗抹機等將樹脂組成物溶解於溶劑而得之溶液塗布在支持體上的方法。又,乾燥後將支持體從由支持體與樹脂組成物疊層而成之樹脂複合片予以剝離或蝕刻,藉此亦可製成單層片。此外,藉由將上述本實施形態之樹脂組成物溶解於溶劑而得之溶液供給至具片狀模槽之模具內,並進行乾燥等而成形為片狀,也可獲得不使用支持體之單層片。As for the coating method (coating method), for example, there can be cited a method of coating a solution obtained by dissolving a resin composition in a solvent on a support using a coating rod, a die coater, a doctor blade coater, a Baker coater, etc. In addition, after drying, the support is peeled off or etched from a resin composite sheet formed by laminating the support and the resin composition, thereby making a single-layer sheet. In addition, by supplying a solution obtained by dissolving the resin composition of the present embodiment in a solvent into a mold having a sheet-shaped mold groove, and drying it to form a sheet, a single-layer sheet without using a support can also be obtained.

製作本實施形態之樹脂複合片時,除去溶劑時的乾燥條件並無特別限定,考量為低溫的話樹脂組成物中容易有溶劑殘留,為高溫的話樹脂組成物會硬化的方面,宜於20℃~200℃之溫度進行1~90分鐘。又,樹脂複合片中,樹脂組成物能以剛使溶劑乾燥之未硬化狀態使用,也可視需要使其成為半硬化(B階段化)之狀態而使用。另外,本實施形態之樹脂複合片之樹脂層的厚度,可藉由本實施形態之樹脂組成物的溶液濃度與塗布厚度來調整,並無特別限定,一般而言,考量塗布厚度變厚的話乾燥時溶劑容易殘留的方面,宜為0.1~500μm。 [實施例]When preparing the resin composite sheet of the present embodiment, the drying conditions for removing the solvent are not particularly limited. Considering that the solvent is likely to remain in the resin composition at a low temperature and the resin composition is hardened at a high temperature, it is preferably carried out at a temperature of 20°C to 200°C for 1 to 90 minutes. In addition, in the resin composite sheet, the resin composition can be used in an unhardened state where the solvent has just been dried, or can be used in a semi-hardened (B-stage) state as needed. In addition, the thickness of the resin layer of the resin composite sheet of the present embodiment can be adjusted by the solution concentration of the resin composition of the present embodiment and the coating thickness, and is not particularly limited. Generally speaking, considering that the solvent is likely to remain when drying if the coating thickness becomes thicker, it is preferably 0.1 to 500 μm. [Example]

以下舉實施例進一步具體地說明本發明。下列實施例所示之材料、使用量、比例、處理內容、處理順序等,只要不脫離本發明之主旨,可進行適當變更。故,本發明之範圍不限於下列所示之具體例。 本實施例中,若無特別說明,測定係於23℃進行。The following examples are given to further illustrate the present invention. The materials, usage amounts, proportions, processing contents, processing sequence, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the main purpose of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In this example, unless otherwise specified, the measurement is performed at 23°C.

>實施例1> 將下列合成之多官能乙烯基苯聚合物(ap)75質量份、聯苯芳烷基型馬來醯亞胺(日本化藥公司製,MIR-3000(商品名))25質量份、咪唑觸媒(四國化成公司製,2E4MZ(商品名))0.5質量份以甲乙酮溶解並混合,得到清漆。>Example 1> 75 parts by mass of the following synthesized multifunctional vinylbenzene polymer (ap), 25 parts by mass of biphenyl aralkyl maleimide (MIR-3000 (trade name) manufactured by Nippon Kayaku Co., Ltd.), and 0.5 parts by mass of imidazole catalyst (2E4MZ (trade name) manufactured by Shikoku Chemical Co., Ltd.) were dissolved and mixed in methyl ethyl ketone to obtain a varnish.

(多官能乙烯基苯聚合物(ap)之合成) 將二乙烯基苯2.25莫耳(292.9g)、乙基乙烯基苯1.32莫耳(172.0g)、苯乙烯11.43莫耳(1190.3g)、乙酸正丙酯15.0莫耳(1532.0g)投入到反應器內,於70℃添加600毫莫耳之三氟化硼之二乙醚錯合物,使其反應4小時。利用碳酸氫鈉水溶液使聚合溶液停止後,以純水將油層洗淨3次,於60℃進行減壓脫揮,回收多官能乙烯基苯聚合物(ap)。稱量獲得之多官能乙烯基苯聚合物(ap),確認獲得多官能乙烯基苯聚合物(ap)860.8g。(Synthesis of multifunctional vinylbenzene polymer (ap)) 2.25 mol (292.9 g) of divinylbenzene, 1.32 mol (172.0 g) of ethylvinylbenzene, 11.43 mol (1190.3 g) of styrene, and 15.0 mol (1532.0 g) of n-propyl acetate were placed in a reactor, and 600 mmol of diethyl ether complex of boron trifluoride was added at 70°C, and the reaction was allowed to proceed for 4 hours. After the polymerization solution was stopped with an aqueous sodium bicarbonate solution, the oil layer was washed three times with pure water, and decompressed and devolatiled at 60°C to recover the multifunctional vinylbenzene polymer (ap). The obtained multifunctional vinylbenzene polymer (ap) was weighed, and 860.8 g of the multifunctional vinylbenzene polymer (ap) was confirmed.

獲得之多官能乙烯基苯聚合物(ap)之Mn為2060,Mw為30700,Mw/Mn為14.9。藉由實施13 C‐NMR及1 H‐NMR分析,於多官能乙烯基苯聚合物(ap)觀察到源自各單體單元的共振線。根據NMR測定結果、及GC分析結果,如下述般算出多官能乙烯基苯聚合物(ap)之構成單元之比例。 來自二乙烯基苯之構成單位:20.9莫耳%(24.3質量%) 來自乙基乙烯基苯之構成單位:9.1莫耳%(10.7質量%) 來自苯乙烯之構成單位:70.0莫耳%(65.0質量%) 又,具有來自二乙烯基苯之殘存乙烯基的構成單元為16.7莫耳%(18.5質量%)。The Mn of the obtained multifunctional vinylbenzene polymer (ap) was 2060, the Mw was 30700, and the Mw/Mn was 14.9. By performing 13 C-NMR and 1 H-NMR analysis, resonance lines derived from each monomer unit were observed in the multifunctional vinylbenzene polymer (ap). Based on the NMR measurement results and the GC analysis results, the ratio of the constituent units of the multifunctional vinylbenzene polymer (ap) was calculated as follows. Constituent units derived from divinylbenzene: 20.9 mol% (24.3 mass%) Constituent units derived from ethylvinylbenzene: 9.1 mol% (10.7 mass%) Constituent units derived from styrene: 70.0 mol% (65.0 mass%) In addition, the constituent units having residual vinyl groups derived from divinylbenzene were 16.7 mol% (18.5 mass%).

>>厚度1.6mm之硬化板之試驗片之製造>> 將溶劑從獲得之清漆蒸發餾去,藉此獲得混合樹脂粉末。將混合樹脂粉末填充至1邊100mm、厚度1.6mm之模具,於兩面配置12μm銅箔(3EC-M3-VLP,三井金屬礦業(股)製),以壓力30kg/cm2 、溫度220℃之條件實施120分鐘真空壓製,得到1邊100mm、厚度1.6mm之硬化板。>>Production of 1.6mm thick hardened plate test piece>> The solvent was evaporated from the obtained varnish to obtain a mixed resin powder. The mixed resin powder was filled into a mold with a side of 100mm and a thickness of 1.6mm, and 12μm copper foil (3EC-M3-VLP, Mitsui Metals & Mining Co., Ltd.) was placed on both sides. Vacuum pressing was performed for 120 minutes at a pressure of 30kg/ cm2 and a temperature of 220℃ to obtain a hardened plate with a side of 100mm and a thickness of 1.6mm.

針對獲得之1.6mm厚之硬化板,依後述方法進行物性等(介電特性(Dk、Df)、剝離強度、玻璃轉移溫度、熱膨脹係數(CTE))的評價。The physical properties of the obtained 1.6 mm thick hardened plate (dielectric properties (Dk, Df), peel strength, glass transition temperature, coefficient of thermal expansion (CTE)) were evaluated according to the following method.

>實施例2> 將聯苯芳烷基型馬來醯亞胺25質量份變更為12.5質量份,並追加苯醚型馬來醯亞胺(K・I Chemical公司製,BMI-80(商品名))12.5質量份,除此以外,與實施例1同樣進行,得到清漆。由獲得之清漆以與實施例1同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Example 2> The same method as in Example 1 was used to obtain a varnish except that 25 parts by mass of biphenyl aralkyl maleimide was changed to 12.5 parts by mass and 12.5 parts by mass of phenyl ether maleimide (BMI-80 (trade name) manufactured by K・I Chemical Co., Ltd.) was added. A 1.6 mm thick cured plate was obtained from the obtained varnish in the same manner as in Example 1. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>實施例3> 使用BisM型馬來醯亞胺(K・I Chemical公司製,BMI-BisM(商品名))25質量份替代聯苯芳烷基型馬來醯亞胺25質量份,除此以外,與實施例1同樣進行,得到清漆。由獲得之清漆以與實施例1同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Example 3> The same procedure as in Example 1 was followed except that 25 parts by mass of BisM maleimide (manufactured by K.I Chemical Co., Ltd., BMI-BisM (trade name)) was used instead of 25 parts by mass of biphenyl aralkyl maleimide to obtain a varnish. A 1.6 mm thick cured plate was obtained from the obtained varnish in the same manner as in Example 1. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>實施例4> 使用末端改性聚苯醚(三菱瓦斯化學公司製,OPE-2St 1200(商品名))25質量份替代聯苯芳烷基型馬來醯亞胺25質量份,且不使用咪唑觸媒,除此以外,與實施例1同樣進行,得到清漆。由獲得之清漆以與實施例1同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Example 4> The same method as in Example 1 was used to obtain a varnish except that 25 parts by mass of terminal-modified polyphenylene ether (OPE-2St 1200 (trade name) manufactured by Mitsubishi Gas Chemical Co., Ltd.) was used instead of 25 parts by mass of biphenyl aralkyl maleimide and no imidazole catalyst was used. A 1.6 mm thick cured plate was obtained from the obtained varnish in the same manner as in Example 1. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>實施例5> 使用下列萘酚芳烷基型氰酸酯樹脂25質量份替代聯苯芳烷基型馬來醯亞胺25質量份,並使用有機金屬觸媒(日本化學產業公司製,Oct-Mn(商品名))0.1質量份替代咪唑觸媒0.5質量份,除此以外,與實施例1同樣進行,得到清漆。由獲得之清漆以與實施例1同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Example 5> The same process as in Example 1 was performed except that 25 parts by mass of the following naphthol aralkyl cyanate resin was used to replace 25 parts by mass of biphenyl aralkyl maleimide, and 0.1 parts by mass of an organic metal catalyst (Oct-Mn (trade name) manufactured by Nippon Chemical Industry Co., Ltd.) was used to replace 0.5 parts by mass of an imidazole catalyst. A varnish having a thickness of 1.6 mm was obtained from the obtained varnish in the same manner as in Example 1. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

(α-萘酚芳烷基型氰酸酯樹脂之合成) 將α-萘酚芳烷基樹脂(SN495V,OH基當量:236g/eq.,新日鐵化學(股)製:包含萘酚芳烷基之重複單元數為1~5者。)0.47莫耳(OH基換算)溶解於氯仿500mL,於該溶液中添加三乙胺0.7莫耳,製作溶液1。於將溫度保持在-10℃之狀態,歷時1.5小時將溶液1滴加至已裝入反應器內之0.93莫耳之氯化氰之氯仿溶液300g中,滴加結束後,攪拌30分鐘。之後,進一步將0.1莫耳之三乙胺與氯仿30g之混合溶液滴加至反應器內,攪拌30分鐘使反應完成。將副產物之三乙胺之鹽酸鹽從反應液分濾後,將獲得之濾液以0.1N鹽酸500mL洗淨,然後重複4次利用水500ml的洗淨。利用硫酸鈉使其乾燥後,藉由於75℃蒸發,進一步於90℃進行減壓脫氣,得到褐色固體的式(S1)表示之α-萘酚芳烷基型氰酸酯化合物(式中之RC1 ~RC4 全部為氫原子,且nc 為1~5之混合物。)。利用紅外吸收光譜分析獲得之α-萘酚芳烷基型氰酸酯化合物,結果在2264cm-1 附近確認到氰酸酯基的吸收。 [化22] (Synthesis of α-naphthol aralkyl type cyanate resin) 0.47 mol (OH group conversion) of α-naphthol aralkyl resin (SN495V, OH group equivalent: 236 g/eq., manufactured by Nippon Steel Chemical Co., Ltd.: containing 1 to 5 repeating units of naphthol aralkyl) was dissolved in 500 mL of chloroform, and 0.7 mol of triethylamine was added to the solution to prepare solution 1. While maintaining the temperature at -10°C, solution 1 was added dropwise to 300 g of 0.93 mol of cyanogen chloride chloroform solution already charged in a reactor over 1.5 hours. After the addition was completed, the mixture was stirred for 30 minutes. Thereafter, a mixed solution of 0.1 mol of triethylamine and 30 g of chloroform was further added dropwise to the reactor, and stirred for 30 minutes to complete the reaction. After filtering the by-product triethylamine hydrochloride from the reaction solution, the obtained filtrate was washed with 500 mL of 0.1N hydrochloric acid, and then washed with 500 mL of water for 4 times. After drying with sodium sulfate, it was evaporated at 75°C and further degassed under reduced pressure at 90°C to obtain a brown solid α-naphthol aralkyl type cyanate compound represented by formula (S1) (wherein R C1 to R C4 are all hydrogen atoms and n c is a mixture of 1 to 5.). The obtained α-naphthol aralkyl type cyanate compound was analyzed by infrared absorption spectroscopy, and the absorption of the cyanate group was confirmed near 2264 cm -1 . [Chemistry 22]

>參考例1> 追加熱自由基聚合引發劑(日油公司製,PERBUTYL P (商品名))1質量份,除此以外,與實施例1同樣進行,得到清漆。由獲得之清漆以與實施例1同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Reference Example 1> Other than adding 1 part by mass of a thermal radical polymerization initiator (PERBUTYL P (trade name) manufactured by NOF Corporation), the same procedure as in Example 1 was followed to obtain a varnish. From the obtained varnish, a 1.6 mm thick cured plate was obtained in the same manner as in Example 1. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>參考例2> 追加熱自由基聚合引發劑(日油公司製,PERBUTYL P (商品名))1質量份,除此以外,與實施例4同樣進行,得到清漆。由獲得之清漆以與實施例4同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Reference Example 2> Other than adding 1 part by mass of a thermal free radical polymerization initiator (PERBUTYL P (trade name) manufactured by NOF Corporation), the same procedure as in Example 4 was followed to obtain a varnish. From the obtained varnish, a 1.6 mm thick cured plate was obtained in the same manner as in Example 4. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>參考例3> 追加熱自由基聚合引發劑(日油公司製,PERBUTYL P (商品名))1質量份,除此以外,與實施例5同樣進行,得到清漆。由獲得之清漆以與實施例5同樣的方式獲得1.6mm厚之硬化板。針對獲得之1.6mm厚之硬化板,依後述方法進行物性等的評價。>Reference Example 3> Other than adding 1 part by mass of a thermal free radical polymerization initiator (PERBUTYL P (trade name) manufactured by NOF Corporation), the same procedure as in Example 5 was followed to obtain a varnish. From the obtained varnish, a 1.6 mm thick cured plate was obtained in the same manner as in Example 5. The physical properties of the obtained 1.6 mm thick cured plate were evaluated according to the method described below.

>介電特性(Dk及Df)> 針對將獲得之1.6mm厚之硬化板之銅箔藉由蝕刻除去而得的試驗片,使用擾動法空洞共振器測定於10GHz之相對介電常數(Dk)及介電損耗正切(Df)。測定溫度為23℃。 擾動法空洞共振器使用Agilent公司製品Agilent8722ES。> Dielectric properties (Dk and Df)> For the test piece obtained by etching away the copper foil of the obtained 1.6mm thick hardened plate, the relative dielectric constant (Dk) and dielectric loss tangent (Df) at 10GHz were measured using a perturbation method cavity resonator. The measurement temperature was 23℃. The perturbation method cavity resonator used was Agilent8722ES, a product of Agilent.

>剝離強度> 使用以上述方式獲得之硬化板,依據JIS C6481之5.7「剝離強度」之規定,測定銅箔剝離強度(黏接力)2次,求取平均值。測定溫度為23℃。>Peel strength> Using the hardened plate obtained in the above manner, the copper foil peel strength (adhesion) was measured twice according to the provisions of 5.7 "Peel strength" of JIS C6481, and the average value was calculated. The measurement temperature was 23℃.

>玻璃轉移溫度> 就玻璃轉移溫度(Tg)而言,針對將獲得之1.6mm厚之硬化板之銅箔藉由蝕刻除去而得的試驗片,依據JIS C6481 5.17.2,利用動態黏彈性分析裝置以DMA(動態機械分析:Dynamic Mechanical Analysis)彎曲法進行測定。由獲得之tanδ之圖表估算玻璃轉移溫度。 動態黏彈性分析裝置使用TA Instrument製的裝置。>Glass transition temperature> The glass transition temperature (Tg) was measured by a dynamic viscoelasticity analyzer using the DMA (Dynamic Mechanical Analysis) bending method in accordance with JIS C6481 5.17.2 for a test piece obtained by removing the copper foil of the obtained hardened plate with a thickness of 1.6 mm by etching. The glass transition temperature was estimated from the obtained tanδ graph. The dynamic viscoelasticity analyzer used was a device manufactured by TA Instruments.

>熱膨脹係數(CTE)> (CTE:Coefficient of linear Thermal Expansion) 針對將1.6mm厚之硬化板之銅箔藉由蝕刻除去而得的試驗片,利用JlS C 6481 5.19規定之TMA法(熱機械分析:Thermo-Mechanical Analysis)測定硬化板之熱膨脹係數,求出其值。具體而言,將上述獲得之硬化板之兩面之銅箔藉由蝕刻除去後,利用熱機械分析裝置(TA Instrument製)以每分鐘10℃從40℃升溫至340℃,測定線熱膨脹係數(ppm/℃)。ppm係體積比。其他詳細內容依據上述JIS C 6481 5.19。>Coefficient of linear thermal expansion (CTE)> (CTE: Coefficient of linear thermal expansion) For a test piece obtained by removing the copper foil of a 1.6 mm thick hardened plate by etching, the coefficient of thermal expansion of the hardened plate was measured using the TMA method (Thermo-Mechanical Analysis) specified in JIS C 6481 5.19 to obtain its value. Specifically, after removing the copper foil on both sides of the hardened plate obtained above by etching, the temperature was raised from 40°C to 340°C at 10°C per minute using a thermomechanical analyzer (manufactured by TA Instrument) to measure the linear thermal expansion coefficient (ppm/°C). ppm is a volume ratio. Other details are based on the above JIS C 6481 5.19.

[表1] (表中的標記) Dk:於10GHz之相對介電常數 Df:於10GHz之介電損耗正切 剝離強度:銅箔之剝離試驗的結果 玻璃轉移溫度:由利用DMA法測得之tanδ評估的玻璃轉移溫度 CTE:利用TMA法測得之熱膨脹係數[Table 1] (Marks in the table) Dk: Relative dielectric constant at 10 GHz Df: Dielectric loss tangent at 10 GHz Peel strength: Result of copper foil peeling test Glass transition temperature: Glass transition temperature estimated from tanδ measured by DMA method CTE: Coefficient of thermal expansion measured by TMA method

由上述表1的結果可知,本實施形態之組合了多官能乙烯基芳香族聚合物(A)(多官能乙烯基苯聚合物(ap))與熱硬化性化合物(B)的樹脂組成物,其介電特性(低介電常數、低介電損耗正切)優異,且具有高玻璃轉移溫度及低熱膨脹係數。另外,剝離強度也高。 另一方面,含有自由基聚合引發劑的話,由參考例1與實施例1、參考例2與實施例4、參考例3與實施例5之對比可知,介電損耗正切變高,玻璃轉移溫度降低,熱膨脹係數亦變高。另外,剝離強度也低。From the results in Table 1 above, it can be seen that the resin composition of the present embodiment, which is a combination of a multifunctional vinyl aromatic polymer (A) (multifunctional vinyl benzene polymer (ap)) and a thermosetting compound (B), has excellent dielectric properties (low dielectric constant, low dielectric loss tangent), and has a high glass transition temperature and a low thermal expansion coefficient. In addition, the peeling strength is also high. On the other hand, if a free radical polymerization initiator is contained, it can be seen from the comparison between Reference Example 1 and Example 1, Reference Example 2 and Example 4, and Reference Example 3 and Example 5 that the dielectric loss tangent becomes higher, the glass transition temperature decreases, and the thermal expansion coefficient also becomes higher. In addition, the peeling strength is also low.

Claims (10)

一種樹脂組成物,含有多官能乙烯基芳香族聚合物(A)與熱硬化性化合物(B),且不含自由基聚合引發劑;該多官能乙烯基芳香族聚合物(A)係含有構成單元(a)及構成單元(b)之共聚物,該多官能乙烯基芳香族聚合物(A)之分子量,以數量平均分子量Mn計為300以上,該構成單元(a)包含下式(V)表示之構成單元,該構成單元(b)包含下式(V4)表示之構成單元,該熱硬化性化合物(B)具有選自由氰氧基、乙烯基、馬來醯亞胺基、及納迪克醯亞胺(nadiimide)基構成之群組中之1個以上之官能基;
Figure 109106260-A0305-13-0001-1
式(V)中,Ar表示芳香族烴連接基;*表示鍵結位置;
Figure 109106260-A0305-13-0001-2
式(V4)中,L2為芳香族烴連接基,RV1為氫原子或碳數1~12之烷基,*表示鍵結位置。
A resin composition comprising a multifunctional vinyl aromatic polymer (A) and a thermosetting compound (B), and containing no free radical polymerization initiator; the multifunctional vinyl aromatic polymer (A) is a copolymer comprising a constituent unit (a) and a constituent unit (b); the molecular weight of the multifunctional vinyl aromatic polymer (A) is 300 or more in terms of number average molecular weight Mn; the constituent unit (a) comprises a constituent unit represented by the following formula (V); the constituent unit (b) comprises a constituent unit represented by the following formula (V4); and the thermosetting compound (B) has one or more functional groups selected from the group consisting of a cyano group, a vinyl group, a maleimide group, and a nadiimide group;
Figure 109106260-A0305-13-0001-1
In formula (V), Ar represents an aromatic hydrocarbon linking group; * represents a bonding position;
Figure 109106260-A0305-13-0001-2
In formula (V4), L2 is an aromatic hydrocarbon linking group, R V1 is a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and * represents a bonding position.
如請求項1之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,該熱硬化性化合物(B)之含量為5~95質量份。 The resin composition of claim 1, wherein the content of the thermosetting compound (B) is 5 to 95 parts by mass relative to 100 parts by mass of the total resin component in the resin composition. 如請求項1或2之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,該多官能乙烯基芳香族聚合物(A)之含量為5~95質量份。 The resin composition of claim 1 or 2, wherein the content of the multifunctional vinyl aromatic polymer (A) is 5 to 95 parts by weight relative to 100 parts by weight of the total resin component in the resin composition. 如請求項1或2之樹脂組成物,更含有填充材(C)。 The resin composition of claim 1 or 2 further contains a filler (C). 如請求項4之樹脂組成物,其中,相對於樹脂組成物中之樹脂成分之總量100質量份,該填充材(C)之含量為10~500質量份。 The resin composition of claim 4, wherein the content of the filler (C) is 10 to 500 parts by mass relative to 100 parts by mass of the total resin component in the resin composition. 如請求項1或2之樹脂組成物,其中,該多官能乙烯基芳香族聚合物(A)之分子量,以數量平均分子量Mn計為1000以上。 The resin composition of claim 1 or 2, wherein the molecular weight of the multifunctional vinyl aromatic polymer (A) is greater than 1000 in terms of number average molecular weight Mn. 一種預浸體,由基材、與如請求項1至6中任一項之樹脂組成物形成。 A prepreg formed by a substrate and a resin composition as described in any one of claims 1 to 6. 一種覆金屬箔疊層板,包含:由如請求項7之預浸體形成之至少1層;及配置於該由預浸體形成之層之單面或兩面的金屬箔。 A metal foil-clad laminate comprising: at least one layer formed by the prepreg as claimed in claim 7; and metal foil disposed on one or both sides of the layer formed by the prepreg. 一種樹脂複合片,包含:支持體;及配置於該支持體之表面的由如請求項1至6中任一項之樹脂組成物形成之層。 A resin composite sheet comprising: a support; and a layer formed of a resin composition as described in any one of claims 1 to 6 and disposed on the surface of the support. 一種印刷配線板,包含:絕緣層;及 配置於該絕緣層之表面的導體層;該絕緣層包含由如請求項1至6中任一項之樹脂組成物形成之層及由如請求項7之預浸體形成之層中之至少一者。A printed wiring board comprising: an insulating layer; and a conductive layer disposed on a surface of the insulating layer; the insulating layer comprises at least one of a layer formed of a resin composition as in any one of claims 1 to 6 and a layer formed of a prepreg as in claim 7.
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