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TWI882385B - Coating material, coating layer, and light-emitting device - Google Patents

Coating material, coating layer, and light-emitting device Download PDF

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TWI882385B
TWI882385B TW112126660A TW112126660A TWI882385B TW I882385 B TWI882385 B TW I882385B TW 112126660 A TW112126660 A TW 112126660A TW 112126660 A TW112126660 A TW 112126660A TW I882385 B TWI882385 B TW I882385B
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coating
core
silicon
zinc
weight
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TW202426573A (en
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陳相睿
林志浩
黃月娟
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財團法人工業技術研究院
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Priority to US18/497,157 priority Critical patent/US20240228800A1/en
Priority to CN202311419254.2A priority patent/CN118240447A/en
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Abstract

A coating material includes a modified particle and a reactive compound. The modified particle includes a core, and a silane coupling agent including an epoxy group (or a double-bond) grafted onto a surface of the core. When the silane coupling agent including the epoxy group is grafted onto the surface of the core, the reactive compound includes a non-silicon multi epoxy compound and a silicon-containing multi epoxy compound. When the silane coupling agent including the double-bond is grafted onto the surface of the core, the reactive compound includes a multi-double bond compound.

Description

塗料、塗層、與發光裝置Paints, coatings, and light-emitting devices

本揭露關於塗料,更特別關於塗料所形成的塗層與其應用。 This disclosure relates to coatings, and more particularly to coating layers formed by coatings and their applications.

純有機高分子難以達成高折射率。無機鍍膜有高折射率,但其低可撓性與高密度(>2.5cm3)在後續應用上面臨製程上的困難。綜上所述,目前亟需設計新的膜層組成,以兼具有機材料與無機材料的優點,進而應用於高折射率的膜材上。 Pure organic polymers are difficult to achieve high refractive index. Inorganic coatings have high refractive index, but their low flexibility and high density (>2.5cm 3 ) make subsequent applications difficult in terms of manufacturing process. In summary, there is an urgent need to design new film compositions that combine the advantages of organic and inorganic materials and apply them to high refractive index films.

本發明一實施例提供之塗料,包括:改質粒子,包括:核心;以及具有環氧基的矽烷耦合劑或具有雙鍵的矽烷耦合劑,接枝至核心的表面,其中核心包括(1)鋅與鈦的氧化物,且鋅與鈦的重量比為1:0.4至1:0.9,(2)鋯與鈦的氧化物,且鋯與鈦的重量比為1:0.1至1:2,或(3)鋅與鋯的氧化物,且鋅與鋯的重量比為1:0.8至1:2;以及反應性化合物,當具有環氧基的矽烷耦合劑接枝至核 心的表面時,反應性化合物包括不含矽的多環氧化合物與含矽的多環氧化合物,當具有雙鍵的矽烷耦合劑接枝至核心的表面時,反應性化合物包括多雙鍵化合物。 The coating provided by one embodiment of the present invention comprises: a modified particle, comprising: a core; and a silane coupling agent having an epoxy group or a silane coupling agent having a double bond, grafted to the surface of the core, wherein the core comprises (1) an oxide of zinc and titanium, wherein the weight ratio of zinc to titanium is 1:0.4 to 1:0.9, and (2) an oxide of zirconium and titanium, wherein the weight ratio of zirconium to titanium is 1:0.1 to 1:2. , or (3) oxides of zinc and zirconium, wherein the weight ratio of zinc to zirconium is 1:0.8 to 1:2; and a reactive compound, wherein when a silane coupling agent having an epoxy group is grafted onto the surface of the core, the reactive compound comprises a polyepoxy compound containing no silicon and a polyepoxy compound containing silicon, and when a silane coupling agent having a double bond is grafted onto the surface of the core, the reactive compound comprises a poly-double bond compound.

本發明一實施例提供之塗層,係由上述塗料反應而成。 The coating provided in one embodiment of the present invention is formed by the reaction of the above-mentioned coating material.

本發明一實施例提供之發光裝置,包括:基板;發光單元,位於基板上;以及上述塗層,覆蓋基板與發光單元。 The light-emitting device provided in one embodiment of the present invention includes: a substrate; a light-emitting unit located on the substrate; and the above-mentioned coating covering the substrate and the light-emitting unit.

本揭露一實施例提供之塗料,包括改質粒子與反應性化合物。改質粒子包括核心;以及具有環氧基的矽烷耦合劑或具有雙鍵的矽烷耦合劑,接枝至核心的表面。核心包括(1)鋅與鈦的氧化物、(2)鋯與鈦的氧化物、或(3)鋅與鋯的氧化物。當核心包括(1)鋅與鈦的氧化物時,鋅與鈦的重量比為1:0.4至1:0.9。若鋅的比例過高,則易產生沉澱析出,且核心不易保持晶體穩定態。若鈦的比例過高,核心容易在反應過程中快速膠化無法使用。當核心包括(2)鋯與鈦的氧化物時,鋯與鈦的重量比為1:0.1至1:2。若鈦的比例過高,則顏色偏深黃色無法保持可見光波段具高穿透度與低b*值。當 核心包括(3)鋅與鋯的氧化物時,鋅與鋯的重量比為1:0.8至1:2。在一實施例中,鋅與鋯的重量比為1:0.8至1:1.8。若鋅的比例過高,則產生沉澱析出。若鋯的比例過高,則產生過度鏈結而膠化。 The coating provided in one embodiment of the present disclosure includes modified particles and reactive compounds. The modified particles include a core; and a silane coupling agent having an epoxy group or a silane coupling agent having a double bond, which is grafted to the surface of the core. The core includes (1) an oxide of zinc and titanium, (2) an oxide of zirconium and titanium, or (3) an oxide of zinc and zirconium. When the core includes (1) an oxide of zinc and titanium, the weight ratio of zinc to titanium is 1:0.4 to 1:0.9. If the proportion of zinc is too high, precipitation is likely to occur, and the core is not easy to maintain a crystalline stable state. If the proportion of titanium is too high, the core is likely to gel quickly during the reaction process and cannot be used. When the core includes (2) oxides of zirconium and titanium, the weight ratio of zirconium to titanium is 1:0.1 to 1:2. If the ratio of titanium is too high, the color is dark yellow and cannot maintain high transmittance and low b* value in the visible light band. When the core includes (3) oxides of zinc and zirconium, the weight ratio of zinc to zirconium is 1:0.8 to 1:2. In one embodiment, the weight ratio of zinc to zirconium is 1:0.8 to 1:1.8. If the ratio of zinc is too high, precipitation occurs. If the ratio of zirconium is too high, excessive linkage occurs and gelation occurs.

當具有環氧基的矽烷耦合劑接枝至核心的表面時,反應性化合物包括不含矽的多環氧化合物與含矽的多環氧化合物。當具有雙鍵的矽烷耦合劑接枝至核心的表面時,反應性化合物包括多雙鍵化合物。 When a silane coupling agent having an epoxy group is grafted onto the surface of the core, the reactive compound includes a polyepoxy compound that does not contain silicon and a polyepoxy compound that contains silicon. When a silane coupling agent having a double bond is grafted onto the surface of the core, the reactive compound includes a polydouble bond compound.

在一實施例中,核心係由鋅源水解形成氧化鋅後,與鈦源進行縮合反應以形成核心。核心主要含有鈦、鋅、與氧如鈦與鋅的氧化物,其表面具有多個羥基與烷氧基。值得注意的是,核心為鈦與鋅的氧化物,而非氧化鈦與氧化鋅的混合物(比如氧化鈦的鈦與氧化鋅的氧之間沒有鍵結,且氧化鈦的氧與氧化鋅的鋅之間沒有鍵結)。與鈦及鋅的氧化物核心相較,氧化鈦與氧化鋅的混合物核心固體沉澱析出。接著取具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑與核心反應,使矽烷的Si-O-烷基與核心表面的-OR(R=H或烷基)反應形成Zn/Ti-O-Si鍵,即矽烷偶合劑接枝至核心的表面上。值得注意的是,上述反應僅為形成改質粒子的方法之一而非唯一方法。本技術領域中具有通常知識者自可採用適當的試劑形成上述改質粒子。 In one embodiment, the core is formed by hydrolyzing a zinc source to form zinc oxide, which is then condensed with a titanium source to form the core. The core mainly contains titanium, zinc, and oxygen, such as an oxide of titanium and zinc, and has a plurality of hydroxyl and alkoxy groups on its surface. It is worth noting that the core is an oxide of titanium and zinc, rather than a mixture of titanium oxide and zinc oxide (e.g., there is no bond between the titanium of the titanium oxide and the oxygen of the zinc oxide, and there is no bond between the oxygen of the titanium oxide and the zinc of the zinc oxide). Compared with the oxide core of titanium and zinc, the core of the mixture of titanium oxide and zinc oxide is solid precipitated. Then, a silane coupling agent with an epoxy group or a silane coupling agent with a double bond is reacted with the core, so that the Si-O-alkyl group of the silane reacts with the -OR (R=H or alkyl group) on the surface of the core to form a Zn/Ti-O-Si bond, that is, the silane coupling agent is grafted onto the surface of the core. It is worth noting that the above reaction is only one of the methods for forming modified particles, not the only method. Those with general knowledge in this technical field can use appropriate reagents to form the above modified particles.

在一實施例中,核心係由鋯源與鈦源進行縮合反應以形成核心。核心主要含有鈦、鋯、與氧如鈦與鋯的氧化物,其表面 具有多個羥基與烷氧基。值得注意的是,核心為鈦與鋯的氧化物,而非氧化鈦與氧化鋯的混合物(比如氧化鈦的鈦與氧化鋯的氧之間沒有鍵結,且氧化鈦的氧與氧化鋯的鋯之間沒有鍵結)。與鈦及鋯的氧化物核心相較,氧化鈦與氧化鋯的混合物核心固體沉澱析出。接著取具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑與核心反應,使矽烷的Si-O-烷基與核心表面的-OR(R=H或烷基)反應形成Zr/Ti-O-Si鍵,即矽烷偶合劑接枝至核心的表面上。值得注意的是,上述反應僅為形成改質粒子的方法之一而非唯一方法。 In one embodiment, the core is formed by condensation reaction of a zirconium source and a titanium source. The core mainly contains titanium, zirconium, and oxygen, such as an oxide of titanium and zirconium, and has a plurality of hydroxyl and alkoxy groups on its surface. It is worth noting that the core is an oxide of titanium and zirconium, rather than a mixture of titanium oxide and zirconium oxide (e.g., there is no bond between the titanium of titanium oxide and the oxygen of zirconium oxide, and there is no bond between the oxygen of titanium oxide and the zirconium of zirconium oxide). Compared with the oxide core of titanium and zirconium, the core of the mixture of titanium oxide and zirconium oxide is solid precipitated. Then, a silane coupling agent with an epoxy group or a silane coupling agent with a double bond is reacted with the core, so that the Si-O-alkyl group of the silane reacts with the -OR (R=H or alkyl group) on the surface of the core to form a Zr/Ti-O-Si bond, that is, the silane coupling agent is grafted onto the surface of the core. It is worth noting that the above reaction is only one of the methods for forming modified particles, not the only method.

在一實施例中,核心係由鋅源水解形成氧化鋅後,與鋯源進行縮合反應以形成核心。核心主要含有鋅、鋯、與氧如鋅與鋯的氧化物,其表面具有多個羥基與烷氧基。值得注意的是,核心為鋅與鋯的氧化物,而非氧化鋅與氧化鋯的混合物(比如氧化鋅的鋅與氧化鋯的氧之間沒有鍵結,且氧化鋅的氧與氧化鋯的鋯之間沒有鍵結)。與鋅及鋯的氧化物核心相較,氧化鋅與氧化鋯的混合物核心固體沉澱析出。接著取具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑與核心反應,使矽烷的Si-O-烷基與核心表面的-OR(R=H或烷基)反應形成Zn/Zr-O-Si鍵,即矽烷偶合劑接枝至核心的表面上。值得注意的是,上述反應僅為形成改質粒子的方法之一而非唯一方法。本技術領域中具有通常知識者自可採用適當的試劑形成上述改質粒子。 In one embodiment, the core is formed by hydrolyzing a zinc source to form zinc oxide, which is then condensed with a zirconium source to form the core. The core mainly contains zinc, zirconium, and oxygen, such as an oxide of zinc and zirconium, and has a plurality of hydroxyl and alkoxy groups on its surface. It is worth noting that the core is an oxide of zinc and zirconium, rather than a mixture of zinc oxide and zirconium oxide (e.g., there is no bond between the zinc of zinc oxide and the oxygen of zirconium oxide, and there is no bond between the oxygen of zinc oxide and the zirconium of zirconium oxide). Compared with the oxide core of zinc and zirconium, the core of the mixture of zinc oxide and zirconium oxide is solid precipitated. Then, a silane coupling agent with an epoxy group or a silane coupling agent with a double bond is reacted with the core, so that the Si-O-alkyl group of the silane reacts with the -OR (R=H or alkyl group) on the surface of the core to form a Zn/Zr-O-Si bond, that is, the silane coupling agent is grafted onto the surface of the core. It is worth noting that the above reaction is only one of the methods for forming modified particles, not the only method. Those with general knowledge in this technical field can use appropriate reagents to form the above modified particles.

在一些實施例中,鋅源可為醋酸鋅、高氯酸鋅、或溴化鋅。在一些實施例中,鈦源可為異丙醇鈦、四氯化鈦、或丁醇鈦。在一些實施例中,鋯源可為正丙醇鋯、異丙醇鋯、或四氯化鋯。 In some embodiments, the zinc source may be zinc acetate, zinc perchlorate, or zinc bromide. In some embodiments, the titanium source may be titanium isopropoxide, titanium tetrachloride, or titanium butoxide. In some embodiments, the zirconium source may be zirconium n-propoxide, zirconium isopropoxide, or zirconium tetrachloride.

在一些實施例中,核心中鋅與鈦的重量總和與具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑的重量的比例為1:0.1至1:3,或1:0.1至1:1.5。在一些實施例中,核心中鋯與鈦的重量總和與具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑的重量的比例為1:0.1至1:3,或1:0.1至1:1.5。在一些實施例中,核心中鋅與鋯的重量總合與具有環氧基的矽烷偶合劑或具有雙鍵的矽烷偶合劑的重量的比例為1:0.1至1:3,或1:0.1至1:1.5。若矽烷偶合劑的比例過低,則無法成膜。若矽烷耦合劑的比例過高,則形成的塗層之折射率不足(如小於1.7)。 In some embodiments, the ratio of the total weight of zinc and titanium in the core to the weight of the silane coupling agent having an epoxy group or a silane coupling agent having a double bond is 1:0.1 to 1:3, or 1:0.1 to 1:1.5. In some embodiments, the ratio of the total weight of zirconium and titanium in the core to the weight of the silane coupling agent having an epoxy group or a silane coupling agent having a double bond is 1:0.1 to 1:3, or 1:0.1 to 1:1.5. In some embodiments, the ratio of the total weight of zinc and zirconium in the core to the weight of the silane coupling agent having an epoxy group or a silane coupling agent having a double bond is 1:0.1 to 1:3, or 1:0.1 to 1:1.5. If the proportion of silane coupling agent is too low, film formation will fail. If the proportion of silane coupling agent is too high, the refractive index of the formed coating will be insufficient (e.g., less than 1.7).

在一些實施例中,核心的平均粒徑為10nm至120nm,或15nm至55nm。若核心的平均粒徑過小,則塗層較無法產生高折率效果。若核心的平均粒徑過大,則塗層穿透度會低於90%無法提升取光效果。 In some embodiments, the average particle size of the core is 10nm to 120nm, or 15nm to 55nm. If the average particle size of the core is too small, the coating will not be able to produce a high refractive index effect. If the average particle size of the core is too large, the coating penetration will be lower than 90% and the light collection effect cannot be improved.

在一些實施例中,具有環氧基的矽烷耦合劑包括3-縮水甘油醚氧基丙基三甲氧基矽烷、3-縮水甘油醚氧基丙基三乙氧基矽烷、3-縮水甘油醚氧基丙基甲基二甲氧基矽烷、3-縮水甘油醚氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己烷基)乙基三甲氧基矽烷、或2-(3,4-環氧環己烷基)乙基三乙氧基矽烷。 In some embodiments, the silane coupling agent having an epoxy group includes 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, or 2-(3,4-epoxycyclohexyl)ethyltriethoxysilane.

在一些實施例中,具有雙鍵的矽烷耦合劑包括3-三甲氧基矽烷丙烯酸丙酯、3-(三乙氧基矽基)丙基異氰酸、或

Figure 112126660-A0305-12-0006-1
,其中R為甲基或乙基,且n=1-3。 In some embodiments, the silane coupling agent having a double bond includes 3-trimethoxysilane propyl acrylate, 3-(triethoxysilyl)propyl isocyanate, or
Figure 112126660-A0305-12-0006-1
, wherein R is methyl or ethyl, and n=1-3.

在一些實施例中,核心與反應性化合物的重量比例為1:0.2至1:0.8。若反應性化合物的比例過低,則形成的塗層劈裂。若反應性化合物的比例過高,則塗層的折射率不足。 In some embodiments, the weight ratio of the core to the reactive compound is 1:0.2 to 1:0.8. If the ratio of the reactive compound is too low, the formed coating is split. If the ratio of the reactive compound is too high, the refractive index of the coating is insufficient.

在一些實施例中,不含矽的多環氧化合物與含矽的多環氧化合物的重量比為1:0.4至1:1。若不含矽的多環氧化合物的比例過低,則形成的塗層劈裂。若不含矽的多環氧化合物的比例過高,則塗層的穿透度不足。 In some embodiments, the weight ratio of the silicon-free polyepoxide to the silicon-containing polyepoxide is 1:0.4 to 1:1. If the ratio of the silicon-free polyepoxide is too low, the formed coating is split. If the ratio of the silicon-free polyepoxide is too high, the penetration of the coating is insufficient.

在一些實施例中,不含矽的多環氧化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。舉例來說,不含矽的多環氧化合物包括

Figure 112126660-A0305-12-0006-2
Figure 112126660-A0305-12-0006-3
Figure 112126660-A0305-12-0007-4
k=1~6、或上述之組合。 In some embodiments, the silicon-free polyepoxide comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and has a viscosity of <1000 cP at 25°C. For example, the silicon-free polyepoxide comprises
Figure 112126660-A0305-12-0006-2
,
Figure 112126660-A0305-12-0006-3
Figure 112126660-A0305-12-0007-4
k=1~6, or a combination of the above.

在一些實施例中,含矽的多環氧化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。舉例來說,含矽的多環氧化合物包括

Figure 112126660-A0305-12-0007-5
Figure 112126660-A0305-12-0007-6
,其中m=1~6,n=1~6、
Figure 112126660-A0305-12-0007-29
Figure 112126660-A0305-12-0007-8
,其中n=1~6、或上述之組合。 In some embodiments, the silicon-containing polyepoxide comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and has a viscosity of <1000 cP at 25°C. For example, the silicon-containing polyepoxide comprises
Figure 112126660-A0305-12-0007-5
Figure 112126660-A0305-12-0007-6
, where m=1~6, n=1~6,
Figure 112126660-A0305-12-0007-29
Figure 112126660-A0305-12-0007-8
, where n=1~6, or a combination of the above.

在一些實施例中,多雙鍵化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。舉例來說,多雙鍵化合物包括

Figure 112126660-A0305-12-0008-9
Figure 112126660-A0305-12-0008-10
,其中a=2~6且b=2~6、或上述之組合。 In some embodiments, the multi-bibond compound comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and has a viscosity of <1000 cP at 25°C. For example, the multi-bibond compound comprises
Figure 112126660-A0305-12-0008-9
,
Figure 112126660-A0305-12-0008-10
, where a=2~6 and b=2~6, or a combination of the above.

本發明一實施例提供之塗層,係由上述塗料反應而成。舉例來說,若塗料中的改質粒子的核心表面接枝具有環氧基的矽烷耦合劑,且對應的反應性化合物包括不含矽的多環氧化合物與含矽的多環氧化合物,則塗料可進一步包括催化量的交聯劑。交聯劑可使環氧基開環,以達交聯效果。在一些實施例中,塗料與交聯劑的重量比為1:0.09至1:0.13之間。若交聯劑的用量過低,則塗料在反應過程中無法交聯成膜。若交聯劑的用量過高,則會大幅降低折射率。在一些實施例中,交聯劑係C2-C6之胺化合物、C2-C6之醇化合物、或C2-C6之酸化合物。在一些實施例中,交聯劑係HO-(CH2)n-NH2,且n為2到4。舉例來說,若塗料中的改質粒子的核心表面接枝具有雙鍵的矽烷耦合劑,且對應的反應性化合物包括多雙鍵化合物,則塗料可進一步包括催化量的自由基起始劑。舉例來說,塗料與自由基起始劑的重量比可為1:0.09至1:0.13。自由基起始劑可為熱起始劑或光起始劑,其照光或加熱後可產生自由基使矽烷耦合劑與多雙鍵化合物的雙鍵交聯。 The coating provided in one embodiment of the present invention is formed by the reaction of the above-mentioned coating. For example, if the core surface of the modified particles in the coating is grafted with a silane coupling agent having an epoxy group, and the corresponding reactive compounds include a polyepoxy compound without silicon and a polyepoxy compound containing silicon, the coating may further include a catalytic amount of a crosslinking agent. The crosslinking agent can open the epoxy ring to achieve a crosslinking effect. In some embodiments, the weight ratio of the coating to the crosslinking agent is between 1:0.09 and 1:0.13. If the amount of the crosslinking agent is too low, the coating cannot be crosslinked to form a film during the reaction process. If the amount of the crosslinking agent is too high, the refractive index will be greatly reduced. In some embodiments, the crosslinking agent is a C 2 -C 6 amine compound, a C 2 -C 6 alcohol compound, or a C 2 -C 6 acid compound. In some embodiments, the crosslinking agent is HO-(CH 2 ) n -NH 2 , and n is 2 to 4. For example, if the core surface of the modified particles in the coating is grafted with a silane coupling agent having a double bond, and the corresponding reactive compound includes a multi-double bond compound, the coating may further include a catalytic amount of a free radical initiator. For example, the weight ratio of the coating to the free radical initiator may be 1:0.09 to 1:0.13. The free radical initiator can be a thermal initiator or a photoinitiator, which can generate free radicals after being exposed to light or heated to crosslink the double bonds of the silane coupling agent and the multi-double bond compound.

在一些實施例中,可由刮刀塗布或旋轉塗佈等方式將塗料塗佈於基板上,且基板之中與之上可具有任何主動單元或被動單元。接著固化塗料以形成塗層。在一些實施例中,塗層的厚度為20微米至40微米,折射率為1.70至2.4,且穿透度為90%至99.5%。若塗層的厚度過小,則無法有效保護其覆蓋的主動單元或被動單元。若折射率過小,則無法避免在覆蓋高折射率的單元如微發光二極體時,因折射率的差異而造成的光損耗。若塗層的穿透度過低,則不適於作為透光的保護層(如覆蓋發光單元的保護層)。 In some embodiments, the coating can be applied to the substrate by scraper coating or rotation coating, and any active unit or passive unit can be present in and on the substrate. The coating is then cured to form a coating. In some embodiments, the coating has a thickness of 20 microns to 40 microns, a refractive index of 1.70 to 2.4, and a transmittance of 90% to 99.5%. If the thickness of the coating is too small, it cannot effectively protect the active unit or passive unit it covers. If the refractive index is too small, it cannot avoid light loss caused by the difference in refractive index when covering a unit with a high refractive index such as a micro-luminescent diode. If the coating has too low a penetration, it is not suitable as a light-transmitting protective layer (such as a protective layer covering a light-emitting unit).

本揭露一實施例提供之發光裝置,包括:基板;發光單元,位於基板上;以及上述之塗層,覆蓋發光單元與基板。由於本揭露實施例的塗層具有足夠的厚度、折射率、與透光度,因此可有效保護發光單元。在一些實施例中,發光單元可為發光二極體,比如有機發光二極體、無機發光二極體、或其他合適的發光二極體。由於發光單元的材料折射率一般大於2,若覆蓋發光單元的膜材之折射率過小(比如小於1.7),則折射率差異會造成光損耗。值得注意的是,雖然本揭露的塗層主要應用於保護發光裝置中的發光單元,但應理解膜材亦可用保護發光單元以外的其他單元,而不限於發光裝置。 The light-emitting device provided in one embodiment of the present disclosure includes: a substrate; a light-emitting unit located on the substrate; and the above-mentioned coating covering the light-emitting unit and the substrate. Since the coating of the embodiment of the present disclosure has sufficient thickness, refractive index, and transmittance, the light-emitting unit can be effectively protected. In some embodiments, the light-emitting unit can be a light-emitting diode, such as an organic light-emitting diode, an inorganic light-emitting diode, or other suitable light-emitting diodes. Since the refractive index of the material of the light-emitting unit is generally greater than 2, if the refractive index of the film material covering the light-emitting unit is too small (for example, less than 1.7), the difference in refractive index will cause light loss. It is worth noting that although the coating disclosed herein is mainly used to protect the light-emitting unit in the light-emitting device, it should be understood that the film material can also be used to protect other units other than the light-emitting unit, and is not limited to the light-emitting device.

綜上所述,本揭露的有機-無機複合塗料可同時包含有機分子輕量、可撓曲、高耐衝擊性、與製程方便,以及無機材料高折射率、高耐化性、與高耐熱性等優點。透過複合材料設計,可 調控折射率並維持高穿透度,且可進一步增加塗層厚度。簡言之,本揭露提供的塗料可提供高穿透度、高折射率、與高膜厚的塗層以達保護單元(如高折射率的發光二極體)的效果。 In summary, the organic-inorganic composite coating disclosed in the present invention can simultaneously include the advantages of light weight, flexibility, high impact resistance, and convenient process of organic molecules, as well as high refractive index, high chemical resistance, and high heat resistance of inorganic materials. Through the design of composite materials, the refractive index can be adjusted and high transmittance can be maintained, and the coating thickness can be further increased. In short, the coating provided by the present disclosure can provide a coating with high transmittance, high refractive index, and high film thickness to achieve the effect of protecting units (such as high refractive index light-emitting diodes).

為讓本揭露之上述內容和其他目的、特徵、和優點能更明顯易懂,下文特舉出較佳實施例,作詳細說明如下: In order to make the above contents and other purposes, features, and advantages of this disclosure more clearly understood, the following is a detailed description of the preferred embodiments as follows:

[實施例] [Implementation example]

在以下實施例中,塗層的穿透度的量測以紫外線/可見光分光光譜儀為量測機台,波段定義450nm為基準點所得之數值,折射率的量測以薄膜分析儀(N & K analyze)為量測機台。核心粒子的粒徑量測:多檢體奈米粒徑量測系統(Otsuka nanoSAQLA),量測範圍:0.6nm~10μm,精確度:±2%以內。在以下實施例中,黏度的量測標準為ASTM D1084,機台型號:Brookfield Viscometer DV-III Ultra。 In the following embodiments, the transmittance of the coating is measured by a UV/visible spectrometer, the band is defined as the value obtained by the reference point of 450nm, and the refractive index is measured by a thin film analyzer (N & K analyze). The particle size of the core particles is measured by a multi-specimen nanoparticle size measurement system (Otsuka nanoSAQLA), the measurement range is 0.6nm~10μm, and the accuracy is within ±2%. In the following embodiments, the viscosity is measured according to ASTM D1084, and the machine model is Brookfield Viscometer DV-III Ultra.

合成例1 Synthesis example 1

取5g的醋酸鋅、20g的異丙醇、與1.9g的乙醇胺,加熱至80℃溶解後反應5分鐘。接著加入10g的異丙醇鈦與0.25g異戊二酮,在80℃下反應8小時以形成核心,其含有鋅與鈦的氧化物,且鋅與鈦的重量比例為1:0.6。之後添加2.2g的3-縮水甘油醚氧基丙基三甲氧基矽烷進行表面改質。核心中鋅與鈦的重量總和與3-縮水甘油醚氧基丙基三甲氧基矽烷之重量比例為1:0.15,使矽烷的Si-O-CH3與核心表面的-OR(R=H或CH(CH3)2)反應形成 Zn/Ti-O-Si鍵,即矽烷接枝至核心表面以形成改質粒子的分散液,且核心粒徑平均為80nm。 Take 5g of zinc acetate, 20g of isopropanol, and 1.9g of ethanolamine, heat to 80℃ to dissolve and react for 5 minutes. Then add 10g of titanium isopropoxide and 0.25g of isopentanedione, react at 80℃ for 8 hours to form a core containing zinc and titanium oxides, and the weight ratio of zinc to titanium is 1:0.6. Then add 2.2g of 3-glycidyloxypropyltrimethoxysilane for surface modification. The weight ratio of the total weight of zinc and titanium in the core to 3-glycidyloxypropyltrimethoxysilane is 1:0.15, so that Si-O-CH 3 of silane reacts with -OR (R=H or CH(CH 3 ) 2 ) on the surface of the core to form Zn/Ti-O-Si bonds, that is, silane is grafted to the core surface to form a dispersion of modified particles, and the average core particle size is 80nm.

合成例2 Synthesis example 2

取5g的酯酸鋅、20g的異丙醇、與1.9g的乙醇胺,加熱至80℃溶解後反應5分鐘。接著加入10g的異丙醇鈦與0.25g異戊二酮,在80℃下反應8小時以形成核心,其含有鋅與鈦的氧化物,且鋅與鈦的重量比例為1:0.6。之後添加2.2g的3-縮水甘油醚氧基丙基三甲氧基矽烷進行表面改質。核心中鋅與鈦的重量總和與3-縮水甘油醚氧基丙基三甲氧基矽烷之重量比例為1:0.15,使矽烷的Si-O-CH3與核心表面的-OR(R=H或CH(CH3)2)反應形成Zn/Ti-O-Si鍵,即矽烷接枝至核心表面以形成改質粒子的分散液,且核心粒徑平均為80nm,最終將異丙醇置換為甲苯。 Take 5g of zinc ester, 20g of isopropanol, and 1.9g of ethanolamine, heat to 80℃ to dissolve and react for 5 minutes. Then add 10g of titanium isopropoxide and 0.25g of isopentanedione, react at 80℃ for 8 hours to form a core containing zinc and titanium oxides, and the weight ratio of zinc to titanium is 1:0.6. Then add 2.2g of 3-glycidyloxypropyltrimethoxysilane for surface modification. The weight ratio of the total weight of zinc and titanium in the core to 3-glycidyloxypropyltrimethoxysilane is 1:0.15, so that the Si-O-CH3 of silane reacts with the -OR (R=H or CH(CH 3 ) 2 ) on the surface of the core to form a Zn/Ti-O-Si bond, that is, silane is grafted to the core surface to form a dispersion of modified particles, and the average core particle size is 80nm. Finally, the isopropyl alcohol is replaced by toluene.

合成例3 Synthesis example 3

取15g的正丙醇鋯、15g的異丙醇鈦、20g的異丙醇、與0.25g異戊二酮,80℃反應8小時以形成核心,其含有鋯與鈦的氧化物,且鋯與鈦的重量比例為1:0.9。之後添加3g的3-縮水甘油醚氧基丙基三甲氧基矽烷進行表面改質。核心中鋯與鈦的重量總和與3-縮水甘油醚氧基丙基三甲氧基矽烷之重量比例為1:0.1,使矽烷的Si-O-CH3與核心表面的-OR(R=H或CH(CH3)2)反應形成Zr/Ti-O-Si鍵,即矽烷接枝至核心表面以形成改質粒子的分散液,且核心粒徑平均為40nm。 15g of zirconium n-propoxide, 15g of titanium isopropoxide, 20g of isopropanol, and 0.25g of isopentanedione were reacted at 80°C for 8 hours to form a core containing zirconium and titanium oxides in a weight ratio of 1:0.9. 3g of 3-glycidyloxypropyltrimethoxysilane was then added for surface modification. The weight ratio of the total weight of zirconium and titanium in the core to 3-glycidyloxypropyltrimethoxysilane is 1:0.1, so that Si-O-CH 3 of silane reacts with -OR (R=H or CH(CH 3 ) 2 ) on the surface of the core to form Zr/Ti-O-Si bonds, that is, silane is grafted to the core surface to form a dispersion of modified particles, and the average core particle size is 40nm.

合成例4 Synthesis example 4

取5g的醋酸鋅、20g的異丙醇、與1.9g的乙醇胺,加熱至80℃溶解後反應5分鐘。接著加入10g的異丙醇鈦與0.25g異戊二酮,在80℃下反應8小時以形成核心,其含有鋅與鈦的氧化物,且鋅與鈦的重量比例為1:0.6。之後添加2.2g的3-三甲氧基矽烷丙烯酸丙酯進行表面改質。核心中鋅與鈦的重量總和與3-三甲氧基矽烷丙烯酸丙酯之重量比例為1:0.15,使矽烷的Si-O-CH3與核心表面的-OR(R=H或CH(CH3)2)反應形成Zn/Ti-O-Si鍵,即矽烷接枝至核心表面以形成改質粒子的分散液,且核心粒徑平均為75nm。 Take 5g of zinc acetate, 20g of isopropyl alcohol, and 1.9g of ethanolamine, heat to 80℃ to dissolve and react for 5 minutes. Then add 10g of titanium isopropyl alcohol and 0.25g of isopentanedione, react at 80℃ for 8 hours to form a core containing zinc and titanium oxides, and the weight ratio of zinc to titanium is 1:0.6. Then add 2.2g of 3-trimethoxysilane propyl acrylate for surface modification. The weight ratio of the total weight of zinc and titanium in the core to 3-trimethoxysilane propyl acrylate is 1:0.15, so that the Si-O-CH 3 of the silane reacts with the -OR (R=H or CH(CH 3 ) 2 ) on the surface of the core to form a Zn/Ti-O-Si bond, that is, the silane is grafted to the surface of the core to form a dispersion of modified particles, and the average core particle size is 75nm.

合成例5 Synthesis example 5

取5g的醋酸鋅、20g的異丙醇、與3mL的KOH(0.48M),加熱至80℃溶解後反應5分鐘。接著加入10g的正丙醇鋯,在80℃下反應8小時以形成核心,其含有鋅與鋯的氧化物,且鋅與鋯的重量比例為1:1.8。之後添加2.2g的3-三甲氧基矽烷丙烯酸丙酯進行表面改質。核心中鋅與鋯的重量總和與3-三甲氧基矽烷丙烯酸丙酯之重量比例為1:0.15,使矽烷的Si-O-CH3與核心表面的-OR(R=H或CH(CH3)2)反應形成Zn/Zr-O-Si鍵,即矽烷接枝至核心表面以形成改質粒子的分散液,且核心粒徑平均為79nm。 Take 5g of zinc acetate, 20g of isopropanol, and 3mL of KOH (0.48M), heat to 80℃ to dissolve and react for 5 minutes. Then add 10g of zirconium n-propoxide and react at 80℃ for 8 hours to form a core containing zinc and zirconium oxides, and the weight ratio of zinc to zirconium is 1:1.8. Then add 2.2g of 3-trimethoxysilane propyl acrylate for surface modification. The weight ratio of the total weight of zinc and zirconium in the core to 3-trimethoxysilane propyl acrylate is 1:0.15, so that the Si-O-CH 3 of the silane reacts with the -OR (R=H or CH(CH 3 ) 2 ) on the surface of the core to form a Zn/Zr-O-Si bond, that is, the silane is grafted to the core surface to form a dispersion of modified particles, and the average core particle size is 79nm.

驗證例 Verification example

取0.25g的含矽的多環氧化合物GT1250(購自廣科工業,其結構為

Figure 112126660-A0305-12-0013-11
,其中m=1~6且n=1~6)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述含矽的環氧化合物GT1250可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,GT1250可作為反應性化合物的選擇之一。 Take 0.25g of silicon-containing polyepoxide GT1250 (purchased from Guangke Industrial, its structure is
Figure 112126660-A0305-12-0013-11
, wherein m=1~6 and n=1~6) is mixed with a dispersion containing 1g of the modified particles of Synthesis Example 1 and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the silicon-containing epoxy compound GT1250 is compatible with the modified particles. The above solution can be coated and cured by heat baking (baking at 80℃ for 10 minutes and baking at 120℃ for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, GT1250 can be selected as one of the reactive compounds.

取0.25g的含矽的多環氧化合物ESP-EDTP0204(自行合成,其結構為

Figure 112126660-A0305-12-0013-12
)與含有1g的合成例1的改質粒子的分散液混摻後產生分相或析出,取0.25g的含矽的多環氧化合物ESP-EDTP0204與合成例2的改質粒子1g混摻後產生分相或析出。由上述可知,上述含矽的環氧化合物ESP-EDTP0204與改質粒子不相容。綜上所述,ESP-EDTP0204不可作為反應性化合物。 Take 0.25g of silicon-containing polyepoxide ESP-EDTP0204 (self-synthesized, with the structure
Figure 112126660-A0305-12-0013-12
) was mixed with a dispersion containing 1 g of the modified particles of Synthesis Example 1, and phase separation or precipitation occurred. 0.25 g of the silicon-containing polyepoxide ESP-EDTP0204 was mixed with 1 g of the modified particles of Synthesis Example 2, and phase separation or precipitation occurred. As can be seen from the above, the silicon-containing epoxy compound ESP-EDTP0204 is incompatible with the modified particles. In summary, ESP-EDTP0204 cannot be used as a reactive compound.

取0.25g的含矽的多環氧化合物SIT8715.6(購自Gelest,其結構為

Figure 112126660-A0305-12-0014-13
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述含矽的環氧化合物SIT8715.6可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,SIT8715.6可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-containing polyepoxide SIT8715.6 (purchased from Gelest, its structure is
Figure 112126660-A0305-12-0014-13
) is mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1, and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the silicon-containing epoxy compound SIT8715.6 is compatible with the modified particles. The above solution can be coated and cured by heat baking (baking at 80°C for 10 minutes and baking at 120°C for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, SIT8715.6 can be selected as one of the reactive compounds.

取0.25g的含矽的多環氧化合物SIT7281.5(購自Gelest,其結構為

Figure 112126660-A0305-12-0014-16
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出,取0.25g的含矽的多環氧化合物SIT7281.5與含有1g的合成例2的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,含矽的環氧化合物SIT7281.5可與改質粒子相容。但兩種溶液不可塗佈 熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,SIT7281.5不可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-containing polyepoxide SIT7281.5 (purchased from Gelest, its structure is
Figure 112126660-A0305-12-0014-16
) was mixed with a dispersion containing 1g of the modified particles of Synthesis Example 1, and it still maintained a liquid state without phase separation and no precipitation. After taking 0.25g of the silicon-containing polyepoxy compound SIT7281.5 and mixing it with a dispersion containing 1g of the modified particles of Synthesis Example 2, it still maintained a liquid state without phase separation and no precipitation. From the above, it can be seen that the silicon-containing epoxy compound SIT7281.5 is compatible with the modified particles. However, the two solutions cannot be applied and cured by heat baking (baking at 80°C for 10 minutes and baking at 120°C for 10 minutes) to form a 5-micron thick dry film. In summary, SIT7281.5 cannot be selected as one of the reactive compounds.

取0.25g的不含矽的多環氧化合物YX7400(三菱化學,其結構為

Figure 112126660-A0305-12-0015-17
k=1~6)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述不含矽的環氧化合物YX7400可與改質粒子相容。上述合成例1溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,YX7400可作為反應性化合物的選擇之一。 Take 0.25g of silicon-free polyepoxide YX7400 (Mitsubishi Chemical, the structure of which is
Figure 112126660-A0305-12-0015-17
k=1~6) is mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1 and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the above silicon-free epoxy compound YX7400 is compatible with the modified particles. The above Synthesis Example 1 solution can be coated and cured by heat baking (baking at 80℃ for 10 minutes and baking at 120℃ for 10 minutes) to form a 5 micron thick dry film. In summary, YX7400 can be selected as one of the reactive compounds.

取0.25g的不含矽的多環氧化合物412P(購自雙鍵化工,其結構為

Figure 112126660-A0305-12-0015-18
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述不含矽的環氧化合物412P可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,412P可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-free polyepoxide 412P (purchased from Double Key Chemicals, with the structure
Figure 112126660-A0305-12-0015-18
) is mixed with a dispersion containing 1 g of the modified particles of Synthesis Example 1, and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the above silicon-free epoxy compound 412P is compatible with the modified particles. The above solution can be coated and heat-cured (baked at 80°C for 10 minutes and baked at 120°C for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, 412P can be selected as one of the reactive compounds.

取0.25g的含矽的多環氧化合物DMS-EC13(購自Gelest,其結構為

Figure 112126660-A0305-12-0015-20
,其中n=1~6)與含 有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出、取0.25g的含矽的多環氧化合物DMS-EC13與含有1g的合成例2的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述含矽的環氧化合物DMS-EC13可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,DMS-EC13可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-containing polyepoxide DMS-EC13 (purchased from Gelest, its structure is
Figure 112126660-A0305-12-0015-20
, wherein n=1~6) is mixed with a dispersion containing 1g of the modified particles of Synthesis Example 1 and still maintains a liquid state without phase separation and no precipitation. 0.25g of the silicon-containing polyepoxy compound DMS-EC13 is mixed with a dispersion containing 1g of the modified particles of Synthesis Example 2 and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the silicon-containing epoxy compound DMS-EC13 is compatible with the modified particles. The above solution can be applied and hot-baked (baked at 80°C for 10 minutes, and baked at 120°C for 10 minutes) to form a 5-micron thick dry film. In summary, DMS-EC13 can be selected as one of the reactive compounds.

取0.25g的含矽的多環氧化合物ECMS-924(購自Gelest,其結構為

Figure 112126660-A0305-12-0016-21
,其中m=1~6,n=1~6)與含有1g的合成例1的改質粒子的分散液混摻後產生分相或析出。由上述可知,上述含矽的環氧化合物ECMS-924與改質粒子不相容。綜上所述,ECMS-924不可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-containing polyepoxide ECMS-924 (purchased from Gelest, its structure is
Figure 112126660-A0305-12-0016-21
, wherein m=1~6, n=1~6) was mixed with a dispersion containing 1g of the modified particles of Synthesis Example 1, resulting in phase separation or precipitation. As can be seen from the above, the silicon-containing epoxy compound ECMS-924 is incompatible with the modified particles. In summary, ECMS-924 cannot be selected as one of the reactive compounds.

取0.25g的含矽的多環氧化合物SIB-1110(購自Gelest,其結構為

Figure 112126660-A0305-12-0016-22
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述含矽的環氧化合物SIB-1110可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘) 成5微米厚的乾膜。綜上所述,SIB-1110可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-containing polyepoxide SIB-1110 (purchased from Gelest, its structure is
Figure 112126660-A0305-12-0016-22
) was mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1, and still maintained a liquid state without phase separation and no precipitation. From the above, it can be seen that the silicon-containing epoxy compound SIB-1110 is compatible with the modified particles. The above solution can be coated and cured by heat baking (baking at 80°C for 10 minutes and baking at 120°C for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, SIB-1110 can be selected as one of the reactive compounds.

取0.25g的不含矽的多環氧化合物HDGE(1,6-己二醇二縮水甘油醚)(購自Aldrich,其結構為

Figure 112126660-A0305-12-0017-23
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述不含矽的環氧化合物HDGE可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,HDGE可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-free polyepoxide HDGE (1,6-hexanediol diglycidyl ether) (purchased from Aldrich, its structure is
Figure 112126660-A0305-12-0017-23
) is mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1, and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the above silicon-free epoxy compound HDGE is compatible with the modified particles. The above solution can be coated and heat-cured (baked at 80°C for 10 minutes and baked at 120°C for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, HDGE can be selected as one of the reactive compounds.

取0.25g的不含矽的多環氧化合物YL983U(購自三菱化學,其結構為

Figure 112126660-A0305-12-0017-25
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述不含矽的環氧化合物YL983U可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,YL983U可作為反應性化合物的選擇之一。 Take 0.25g of silicon-free polyepoxide YL983U (purchased from Mitsubishi Chemical, its structure is
Figure 112126660-A0305-12-0017-25
) is mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1 and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the above silicon-free epoxy compound YL983U is compatible with the modified particles. The above solution can be coated and heat-cured (baked at 80℃ for 10 minutes and 120℃ for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, YL983U can be selected as one of the reactive compounds.

取0.25g的不含矽的多環氧化合物YL 980(購自三菱化學,其結構為

Figure 112126660-A0305-12-0017-26
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由 上述可知,上述不含矽的環氧化合物YL980可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,YL 980可作為反應性化合物的選擇之一。 Take 0.25 g of silicon-free polyepoxide YL 980 (purchased from Mitsubishi Chemical, its structure is
Figure 112126660-A0305-12-0017-26
) is mixed with the dispersion containing 1g of the modified particles of Synthesis Example 1, and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the above silicon-free epoxy compound YL980 is compatible with the modified particles. The above solution can be coated and heat-cured (baked at 80℃ for 10 minutes and 120℃ for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, YL 980 can be selected as one of the reactive compounds.

取0.25g的多雙鍵化合物SR238(購自Sartomer AMERICAS,其結構為

Figure 112126660-A0305-12-0018-27
)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述多雙鍵化合物SR238可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,SR238可作為反應性化合物的選擇之一。 Take 0.25g of the multi-double bond compound SR238 (purchased from Sartomer AMERICAS, its structure is
Figure 112126660-A0305-12-0018-27
) was mixed with the dispersion containing 1 g of the modified particles of Synthesis Example 1, and still maintained a liquid state without phase separation and no precipitation. From the above, it can be seen that the multi-double bond compound SR238 is compatible with the modified particles. The above solution can be coated and cured by heat baking (baking at 80°C for 10 minutes and baking at 120°C for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, SR238 can be selected as one of the reactive compounds.

取0.25g的多雙鍵化合物SR601(購自Sartomer AMERICAS,其結構為

Figure 112126660-A0305-12-0018-28
,其中a=2~6且b=2~6)與含有1g的合成例1的改質粒子的分散液混摻後仍維持無分相之液態以及無析出。由上述可知,上述多雙鍵化合物SR601可與改質粒子相容。上述溶液可塗佈熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成5微米厚的乾膜。綜上所述,SR601可作為反應性化合物的選擇之一。 Take 0.25g of the multi-double bond compound SR601 (purchased from Sartomer AMERICAS, its structure is
Figure 112126660-A0305-12-0018-28
, wherein a=2~6 and b=2~6) is mixed with a dispersion containing 1g of the modified particles of Synthesis Example 1 and still maintains a liquid state without phase separation and no precipitation. From the above, it can be seen that the multi-double bond compound SR601 is compatible with the modified particles. The above solution can be coated and cured by heat baking (baking at 80℃ for 10 minutes and baking at 120℃ for 10 minutes) to form a dry film with a thickness of 5 microns. In summary, SR601 can be selected as one of the reactive compounds.

實施例1 Example 1

取含有8重量分的合成例1的改質粒子的分散液、1重量分的不含矽的多環氧化合物HDGE、與1重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為30.3cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成20微米厚的塗層。塗層的穿透度為96.1%,Haze為1.91(霧度-光散射值),且對波長為550nm的光線的折射率為2.01。 Take 8 parts by weight of the dispersion of modified particles of Synthesis Example 1, 1 part by weight of silicon-free polyepoxy HDGE, and 1 part by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 30.3 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 20-micron-thick coating. The coating has a transmittance of 96.1%, a Haze of 1.91 (fog-light scattering value), and a refractive index of 2.01 for light with a wavelength of 550nm.

實施例2 Example 2

取含有7重量分的合成例1的改質粒子的分散液、1.8重量分的不含矽的多環氧化合物HDGE、與1.2重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為35.6cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成22微米厚的塗層。塗層的穿透度為97.0%,Haze為1.03(霧度-光散射值),且對波長為550nm的光線的折射率為1.85。後續再於110℃下,經500小時測試穿透度,其變化率≦1.61%。 After mixing 7 parts by weight of the dispersion of modified particles of Synthesis Example 1, 1.8 parts by weight of the silicon-free polyepoxy compound HDGE, and 1.2 parts by weight of the silicon-containing polyepoxy compound SIB-1110, 3 parts by weight of the solvent was removed to form a solution with a viscosity of 35.6 cP at 25°C as a coating, which was coated with a scraper to form a 50 micron thick wet film on a glass substrate, and then cured by heat baking (baking at 80°C for 10 minutes and 120°C for 10 minutes) to form a 22 micron thick coating. The coating had a transmittance of 97.0%, a Haze of 1.03 (fog-light scattering value), and a refractive index of 1.85 for light with a wavelength of 550 nm. The penetration was then tested at 110°C for 500 hours, and the change rate was ≤1.61%.

實施例3 Implementation Example 3

取含有7重量分的合成例1的改質粒子的分散液、1.5重量分的不含矽的多環氧化合物HDGE、與1.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為32.3cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上, 熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成21微米厚的塗層。塗層的穿透度為96.7%,Haze為1.33(霧度-光散射值),且對波長為550nm的光線的折射率為1.88。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 1, 1.5 parts by weight of silicon-free polyepoxy HDGE, and 1.5 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 32.3 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake and cure (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 21-micron-thick coating. The coating has a transmittance of 96.7%, a Haze of 1.33 (fog-light scattering value), and a refractive index of 1.88 for light with a wavelength of 550nm.

實施例4 Example 4

取含有6重量分的合成例1的改質粒子的分散液、2重量分的不含矽的多環氧化合物HDGE、與2重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為41.0cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成30微米厚的塗層。塗層的穿透度為95.6%,Haze為1.10(霧度-光散射值),且對波長為550nm的光線的折射率為1.80。 Take 6 parts by weight of the dispersion of modified particles of Synthesis Example 1, 2 parts by weight of silicon-free polyepoxy HDGE, and 2 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 41.0 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 30-micron-thick coating. The coating has a transmittance of 95.6%, a Haze of 1.10 (fog-light scattering value), and a refractive index of 1.80 for light with a wavelength of 550nm.

實施例5 Example 5

取含有7重量分的合成例3的改質粒子的分散液、1.5重量分的不含矽的多環氧化合物HDGE、與1.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為5.1cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成23微米厚的塗層。塗層的穿透度為96.3%,Haze為0.71(霧度-光散射值),且對波長為550nm的光線的折射率為1.87。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 3, 1.5 parts by weight of silicon-free polyepoxy HDGE, and 1.5 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 5.1 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 23-micron-thick coating. The coating has a transmittance of 96.3%, a Haze of 0.71 (fog-light scattering value), and a refractive index of 1.87 for light with a wavelength of 550nm.

實施例6 Example 6

取含有5重量分的合成例1的改質粒子的分散液、2.5重量分的不含矽的多環氧化合物HDGE、與2.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為48cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成36微米厚的塗層。塗層的穿透度為98.9%,Haze為1.54(霧度-光散射值),且對波長為550nm的光線的折射率為1.77。 Take 5 parts by weight of the dispersion of modified particles of Synthesis Example 1, 2.5 parts by weight of silicon-free polyepoxy HDGE, and 2.5 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 48 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 36-micron-thick coating. The coating has a transmittance of 98.9%, a Haze of 1.54 (fog-light scattering value), and a refractive index of 1.77 for light with a wavelength of 550nm.

比較例1 Comparative example 1

取含有9重量分的合成例1的改質粒子的分散液、0.5重量分的不含矽的多環氧化合物HDGE、與0.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)時塗層劈裂。 After mixing 9 weight parts of the dispersion of modified particles of Synthesis Example 1, 0.5 weight parts of the silicon-free polyepoxy compound HDGE, and 0.5 weight parts of the silicon-containing polyepoxy compound SIB-1110, 3 weight parts of the solvent were removed to form a coating, which was applied with a scraper to form a 50 micron thick wet film on a glass substrate. The coating was cracked during heat curing (baking at 80°C for 10 minutes and 120°C for 10 minutes).

比較例2 Comparative example 2

取含有7重量分的合成例1的改質粒子的分散液與3重量分的不含矽的多環氧化合物HDGE混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成塗層。塗層的穿透度<80%。 After mixing 7 parts by weight of the modified particle dispersion of Synthesis Example 1 with 3 parts by weight of the silicon-free polyepoxy compound HDGE, 3 parts by weight of the solvent was removed to form a coating, which was then applied with a scraper to form a 50 micron thick wet film on a glass substrate, and then cured by heat baking (baking at 80°C for 10 minutes and 120°C for 10 minutes) to form a coating. The penetration of the coating is <80%.

比較例3 Comparative example 3

取含有7重量分的合成例1的改質粒子的分散液、2.4重量分的不含矽的多環氧化合物HDGE、與0.6重量分的含矽的多環氧化合物 SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成塗層。塗層的穿透度<80%。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 1, 2.4 parts by weight of silicon-free polyepoxy HDGE, and 0.6 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a coating. The penetration of the coating is <80%.

比較例4 Comparative example 4

取含有7重量分的合成例1的改質粒子的分散液、1.2重量分的不含矽的多環氧化合物HDGE、與1.8重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成塗層。塗層擺放於室溫一段時間後產生劈裂。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 1, 1.2 parts by weight of silicon-free polyepoxy HDGE, and 1.8 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a coating. Use a scraper to apply a 50 micron thick wet film on a glass substrate, and heat-bake and cure (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a coating. The coating will crack after being placed at room temperature for a period of time.

比較例5 Comparative example 5

取含有7重量分的合成例1的改質粒子的分散液、0.6重量分的不含矽的多環氧化合物HDGE、與2.4重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成塗層。塗層擺放於室溫一段時間後產生劈裂。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 1, 0.6 parts by weight of silicon-free polyepoxy HDGE, and 2.4 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a coating. Use a scraper to apply a 50 micron thick wet film on a glass substrate, and heat-bake and cure (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a coating. The coating will crack after being placed at room temperature for a period of time.

比較例6 Comparative example 6

取含有7重量分的合成例1的改質粒子的分散液、3重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成塗層。塗層擺放於室溫一段時間後產生劈裂。 Take 7 parts by weight of the dispersion of modified particles of Synthesis Example 1 and 3 parts by weight of the silicon-containing polyepoxy compound SIB-1110, and then remove 3 parts by weight of the solvent to form a coating. Use a scraper to apply a 50 micron thick wet film on a glass substrate, and heat-bake and cure (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a coating. The coating will crack after being placed at room temperature for a period of time.

比較例7 Comparative example 7

取含有7重量分的合成例1的核心(未改質)的分散液、1.5重量分的不含矽的多環氧化合物HDGE、與1.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)時塗層劈裂。 Take a dispersion containing 7 parts by weight of the core (unmodified) of Synthesis Example 1, 1.5 parts by weight of the silicon-free polyepoxy compound HDGE, and 1.5 parts by weight of the silicon-containing polyepoxy compound SIB-1110, and then remove 3 parts by weight of the solvent to form a coating. Use a scraper to apply a 50-micron-thick wet film on a glass substrate. The coating cracks during thermal curing (baking at 80°C for 10 minutes and 120°C for 10 minutes).

實施例7 Example 7

取含有8重量分的合成例4的改質粒子的分散液、2重量分的多雙鍵化合物SR238、與0.01重量分的起始劑偶氮二異丁腈(AIBN)混合後,抽除3重量分的溶劑以形成25℃下的黏度為6.8cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,80℃烘烤10分鐘後,UV固化(1500J/cm2)1分鐘,形成21微米厚的塗層。塗層的穿透度為95.8%,Haze為1.91(霧度-光散射值),且對波長為550nm的光線的折射率為1.88。 After mixing 8 parts by weight of the dispersion of modified particles of Synthesis Example 4, 2 parts by weight of the multi-double bond compound SR238, and 0.01 parts by weight of the initiator azobisisobutyronitrile (AIBN), 3 parts by weight of the solvent was removed to form a solution with a viscosity of 6.8 cP at 25°C as a coating, which was coated with a doctor blade to form a 50 micron thick wet film on a glass substrate, baked at 80°C for 10 minutes, and UV cured (1500 J/cm 2 ) for 1 minute to form a 21 micron thick coating. The coating had a transmittance of 95.8%, a Haze of 1.91 (fog-light scattering value), and a refractive index of 1.88 for light with a wavelength of 550 nm.

實施例8 Example 8

取含有7重量分的合成例4的改質粒子的分散液、3重量分的多雙鍵化合物SR238、與0.01重量分的起始劑偶氮二異丁腈(AIBN)混合後,抽除3重量分的溶劑以形成25℃下的黏度為5.9cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,80℃烘烤10分鐘後,UV固化(1500J/cm2)1分鐘,形成22微米厚的塗層。 塗層的穿透度為96.3%,Haze為1.82(霧度-光散射值),且對波長為550nm的光線的折射率為1.82。 After mixing 7 parts by weight of the dispersion of modified particles of Synthesis Example 4, 3 parts by weight of the multi-double bond compound SR238, and 0.01 parts by weight of the initiator azobisisobutyronitrile (AIBN), 3 parts by weight of the solvent was removed to form a solution with a viscosity of 5.9 cP at 25°C as a coating, which was coated with a doctor blade to form a 50 micron thick wet film on a glass substrate, baked at 80°C for 10 minutes, and UV cured (1500 J/cm 2 ) for 1 minute to form a 22 micron thick coating. The coating had a transmittance of 96.3%, a Haze of 1.82 (fog-light scattering value), and a refractive index of 1.82 for light with a wavelength of 550 nm.

實施例9 Example 9

取含有6重量分的合成例4的改質粒子的分散液、4重量分的多雙鍵化合物SR238、與0.01重量分的起始劑偶氮二異丁腈(AIBN)、並抽除3重量分的溶劑以形成25℃下的黏度為6.5cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,80℃烘烤10分鐘後,UV固化(1500J/cm2)1分鐘,形成23微米厚的塗層。塗層的穿透度為96.9%,Hz為1.72(霧度-光散射值),且對波長為550nm的光線的折射率為1.80。 Take 6 parts by weight of the dispersion of modified particles of Synthesis Example 4, 4 parts by weight of the multi-double bond compound SR238, and 0.01 parts by weight of the initiator azobisisobutyronitrile (AIBN), and remove 3 parts by weight of the solvent to form a solution with a viscosity of 6.5 cP at 25°C as a coating, apply it to a glass substrate with a doctor blade to form a 50 micron thick wet film, bake it at 80°C for 10 minutes, and UV cure (1500 J/cm 2 ) for 1 minute to form a 23 micron thick coating. The coating has a transmittance of 96.9%, a Hz of 1.72 (haze-light scattering value), and a refractive index of 1.80 for light with a wavelength of 550 nm.

實施例10 Example 10

取含有5重量分的合成例4的改質粒子的分散液、5重量分的多雙鍵化合物SR238、與0.01重量分的起始劑偶氮二異丁腈(AIBN)混合後,抽除3重量分的溶劑以形成25℃下的黏度為6.1cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,80℃烘烤10分鐘後,UV固化(1500J/cm2)1分鐘,形成23微米厚的塗層。塗層的穿透度為98.2%,Hz為1.4(霧度-光散射值),且對波長為550nm的光線的折射率為1.75。 After mixing 5 parts by weight of the dispersion of modified particles of Synthesis Example 4, 5 parts by weight of the multi-double bond compound SR238, and 0.01 parts by weight of the initiator azobisisobutyronitrile (AIBN), 3 parts by weight of the solvent was removed to form a solution with a viscosity of 6.1 cP at 25°C as a coating, which was coated with a doctor blade to form a 50 micron thick wet film on a glass substrate, baked at 80°C for 10 minutes, and UV cured (1500 J/cm 2 ) for 1 minute to form a 23 micron thick coating. The coating had a transmittance of 98.2%, a Hz of 1.4 (haze-light scattering value), and a refractive index of 1.75 for light with a wavelength of 550 nm.

比較例8 Comparative example 8

取含有9重量分的合成例4的改質粒子的分散液、1重量分的多雙鍵化合物SR238、與0.01重量分的起始劑偶氮二異丁腈 (AIBN),抽除3重量分的溶劑以形成塗料,80℃烘烤10分鐘後,UV固化(1500J/cm2)1分鐘後塗層劈裂。 A dispersion containing 9 parts by weight of the modified particles of Synthesis Example 4, 1 part by weight of the multi-double bond compound SR238, and 0.01 parts by weight of the initiator azobisisobutyronitrile (AIBN) was taken, and 3 parts by weight of the solvent was removed to form a coating. After baking at 80°C for 10 minutes, the coating was UV cured (1500 J/ cm2 ) for 1 minute to cleave.

實施例11 Example 11

取含有8重量分的合成例5的改質粒子的分散液、1.5重量分的不含矽的多環氧化合物HDGE、與1.5重量分的含矽的多環氧化合物SIB-1110混合後,抽除3重量分的溶劑以形成25℃下的黏度為46.7cP的溶液作為塗料,以刮刀塗佈成50微米厚的濕膜於玻璃基板上,熱烤固化(80℃烘烤10分鐘,以及120℃烘烤10分鐘)成25微米厚的塗層。塗層的穿透度為97.1%,Haze為0.47(霧度-光散射值),且對波長為550nm的光線的折射率為1.82。 Take 8 parts by weight of the dispersion of modified particles of Synthesis Example 5, 1.5 parts by weight of silicon-free polyepoxy HDGE, and 1.5 parts by weight of silicon-containing polyepoxy SIB-1110, and then remove 3 parts by weight of the solvent to form a solution with a viscosity of 46.7 cP at 25°C as a coating. Apply a 50-micron-thick wet film on a glass substrate with a scraper, and heat-bake (bake at 80°C for 10 minutes and 120°C for 10 minutes) to form a 25-micron-thick coating. The coating has a transmittance of 97.1%, a Haze of 0.47 (fog-light scattering value), and a refractive index of 1.82 for light with a wavelength of 550nm.

雖然本揭露已以數個較佳實施例揭露如上,然其並非用以限定本揭露,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present disclosure has been disclosed as above with several preferred embodiments, they are not intended to limit the present disclosure. Anyone with ordinary knowledge in the relevant technical field can make any changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the scope defined by the attached patent application.

無。without.

Claims (17)

一種塗料,包括: 一改質粒子,包括: 一核心;以及 一具有環氧基的矽烷耦合劑或一具有雙鍵的矽烷耦合劑,接枝至該核心的表面; 其中該核心包括(1)鋅與鈦的氧化物,且鋅與鈦的重量比為1:0.4至1:0.9;(2) 鋯與鈦的氧化物,且鋯與鈦的重量比為1:0.1至1:2;或(3)鋅與鋯的氧化物,且鋅與鋯的重量比為1:0.8至1:2;以及 一反應性化合物; 當該具有環氧基的矽烷耦合劑接枝至該核心的表面時,該反應性化合物包括一不含矽的多環氧化合物與一含矽的多環氧化合物, 當該具有雙鍵的矽烷耦合劑接枝至該核心的表面時,該反應性化合物包括一多雙鍵化合物。 A coating comprises: a modified particle comprising: a core; and a silane coupling agent having an epoxy group or a silane coupling agent having a double bond, grafted to the surface of the core; wherein the core comprises (1) an oxide of zinc and titanium, wherein the weight ratio of zinc to titanium is 1:0.4 to 1:0.9; (2) an oxide of zirconium and titanium, wherein the weight ratio of zirconium to titanium is 1:0.1 to 1:2; or (3) an oxide of zinc and zirconium, wherein the weight ratio of zinc to zirconium is 1:0.8 to 1:2; and a reactive compound; When the silane coupling agent having an epoxy group is grafted onto the surface of the core, the reactive compound includes a silicon-free polyepoxy compound and a silicon-containing polyepoxy compound. When the silane coupling agent having a double bond is grafted onto the surface of the core, the reactive compound includes a polydouble bond compound. 如請求項1之塗料,其中該核心中鋅與鈦的重量總和、鋯與鈦的重量總和、或鋅與鋯的重量總和,與該具有環氧基的矽烷耦合劑或該具有雙鍵的矽烷耦合劑的重量比為1:0.1至1:3。A coating as claimed in claim 1, wherein the weight ratio of the total weight of zinc and titanium, the total weight of zirconium and titanium, or the total weight of zinc and zirconium in the core to the silane coupling agent having an epoxy group or the silane coupling agent having a double bond is 1:0.1 to 1:3. 如請求項1之塗料,其中該核心的平均粒徑為10 nm至120 nm。A coating as claimed in claim 1, wherein the average particle size of the core is 10 nm to 120 nm. 如請求項1之塗料,其中該具有環氧基的矽烷耦合劑包括3-縮水甘油醚氧基丙基三甲氧基矽烷、3-縮水甘油醚氧基丙基三乙氧基矽烷、3-縮水甘油醚氧基丙基甲基二甲氧基矽烷、3-縮水甘油醚氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己烷基)乙基三甲氧基矽烷、或2-(3,4-環氧環己烷基)乙基三乙氧基矽烷。The coating of claim 1, wherein the silane coupling agent having an epoxy group includes 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropylmethyldimethoxysilane, 3-glycidyloxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, or 2-(3,4-epoxycyclohexyl)ethyltriethoxysilane. 如請求項1之塗料,其中該具有雙鍵的矽烷耦合劑包括3-三甲氧基矽烷丙烯酸丙酯、3-(三乙氧基矽基)丙基異氰酸、或 ,其中R為甲基或乙基,且n=1-3。 The coating of claim 1, wherein the silane coupling agent having a double bond comprises 3-trimethoxysilane propyl acrylate, 3-(triethoxysilyl)propyl isocyanate, or , wherein R is methyl or ethyl, and n=1-3. 如請求項1之塗料,其中該核心與該反應性化合物的重量比例為1:0.2至1:0.8。The coating of claim 1, wherein the weight ratio of the core to the reactive compound is 1:0.2 to 1:0.8. 如請求項1之塗料,其中該不含矽的多環氧化合物與該含矽的多環氧化合物的重量比為1:0.4至1:1。The coating of claim 1, wherein the weight ratio of the silicon-free polyepoxide to the silicon-containing polyepoxide is 1:0.4 to 1:1. 如請求項1之塗料,其中該不含矽的多環氧化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。The coating of claim 1, wherein the silicon-free polyepoxide comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and has a viscosity of less than 1000 cP at 25°C. 如請求項1之塗料,其中該不含矽的多環氧化合物包括 ,k=1~6、或上述之組合。 The coating of claim 1, wherein the silicon-free polyepoxide comprises , , , , , k=1~6, or a combination of the above. 如請求項1之塗料,其中該含矽的多環氧化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。The coating of claim 1, wherein the silicon-containing polyepoxide comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and has a viscosity of less than 1000 cP at 25°C. 如請求項1之塗料,其中該含矽的多環氧化合物包括 ,其中m=1~6且n=1~6、 ,其中n=1~6、或上述之組合。 The coating of claim 1, wherein the silicon-containing polyepoxide comprises , , where m=1~6 and n=1~6, , , where n=1~6, or a combination of the above. 如請求項1之塗料,其中該多雙鍵化合物包括長碳鏈、苯環、或環己烷結構,且25℃下的黏度<1000cP。A coating as claimed in claim 1, wherein the multi-double bond compound comprises a long carbon chain, a benzene ring, or a cyclohexane structure, and the viscosity at 25° C. is less than 1000 cP. 如請求項1之塗料,其中該多雙鍵化合物包括 ,其中a=2~6且b=2~6、或上述之組合。 The coating of claim 1, wherein the multi-double bond compound comprises , , where a=2~6 and b=2~6, or a combination of the above. 一種塗層,係由請求項1之塗料反應而成。A coating is formed by reacting the coating material of claim 1. 如請求項14之塗層,其中該塗層的厚度為20微米至40微米,折射率為1.7至2.4,且穿透度為90%至99.5%。A coating as claimed in claim 14, wherein the coating has a thickness of 20 microns to 40 microns, a refractive index of 1.7 to 2.4, and a transmittance of 90% to 99.5%. 一種發光裝置,包括: 一基板; 一發光單元,位於該基板上;以及 如請求項14之塗層,覆蓋該基板與該發光單元。 A light-emitting device, comprising: a substrate; a light-emitting unit located on the substrate; and a coating as claimed in claim 14, covering the substrate and the light-emitting unit. 如請求項16之發光裝置,其中該塗層的厚度為20微米至40微米,折射率為1.7至2.4,且穿透度為90%至99.5%。A light-emitting device as claimed in claim 16, wherein the coating has a thickness of 20 microns to 40 microns, a refractive index of 1.7 to 2.4, and a transmittance of 90% to 99.5%.
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