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TWI881536B - Low-particle gas enclosure systems and methods - Google Patents

Low-particle gas enclosure systems and methods Download PDF

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TWI881536B
TWI881536B TW112143522A TW112143522A TWI881536B TW I881536 B TWI881536 B TW I881536B TW 112143522 A TW112143522 A TW 112143522A TW 112143522 A TW112143522 A TW 112143522A TW I881536 B TWI881536 B TW I881536B
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gas
assembly
substrate
various
particle
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TW202410511A (en
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賈斯汀 默克
亞歷山大 守康 高
伊莉亞 沃斯凱
珊登 歐德森
阿列西 史戴潘諾夫
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美商凱特伊夫公司
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Priority claimed from US14/205,340 external-priority patent/US9604245B2/en
Priority claimed from PCT/US2014/037722 external-priority patent/WO2014200642A1/en
Priority claimed from US14/275,637 external-priority patent/US10434804B2/en
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Abstract

The present teachings relate to various embodiments of a gas enclosure system that can have various components comprising a particle control system that can provide a low-particle zone proximal to a substrate. Various components of a particle control system can include a gas circulation and filtration system, a low-particle-generating motion system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. In addition to maintaining substantially low levels for each species of various reactive species, including various reactive atmospheric gases, such as water vapor and oxygen, for various embodiments of a gas enclosure system that have a particle control system, an on-substrate particle specification can be readily met. Accordingly, processing of various substrates in an inert, low-particle gas environment according to systems and methods of the present teachings can have substantially lower manufacturing defects.

Description

低粒氣體封裝系統與方法Low particle gas packaging system and method

本申請案主張2013年6月10日申請之美國臨時申請案第61/833,398號之權利。本申請案主張2013年12月4日申請之美國臨時申請案第61/911,934號之權利。本申請案主張2014年1月9日申請之美國臨時申請案第61/925,578號之權利。本申請案主張2014年4月23日申請之美國臨時申請案第61/983,417號之權利。本申請案為2014年3月11日申請之美國申請案第14/205,340號之部分接續申請案。2014年3月11日申請之美國申請案第14/205,340號為2013年3月13日申請且在2013年8月15日作為US 2013/0206058公開之美國申請案第13/802,304號之部分接續申請案。美國申請案第13/802,304號為2012年12月19日申請且在2013年9月26日作為US 2013/0252533公開之美國申請案第13/720,830號之部分接續申請案。美國申請案第13/720,830號主張2011年12月22日申請之美國臨時申請案第61/579,233號之權利。2012年12月19日申請之美國申請案第13/720,830號為2010年1月5日申請且在2013年2月26日作為US 8,383,202頒予之美國申請案第12/652,040號之部分接續申請案,美國申請案第12/652,040號為2008年6月13日申請且在2008年12月18日作為US 2008/0311307公開之美國申請案第12/139.391號之部分接續申請案。美國申請案第12/652,040號亦主張2009年1月5日申請之美國臨時申請案第61/142,575號之權利。本文中列出之所有交叉參考之申請案全部被以引用的方式併入。 This application claims the rights of U.S. Provisional Application No. 61/833,398 filed on June 10, 2013. This application claims the rights of U.S. Provisional Application No. 61/911,934 filed on December 4, 2013. This application claims the rights of U.S. Provisional Application No. 61/925,578 filed on January 9, 2014. This application claims the rights of U.S. Provisional Application No. 61/983,417 filed on April 23, 2014. This application is a continuation-in-part of U.S. Application No. 14/205,340 filed on March 11, 2014. U.S. Application No. 14/205,340, filed on March 11, 2014, is a continuation-in-part of U.S. Application No. 13/802,304, filed on March 13, 2013, and published on August 15, 2013 as US 2013/0206058. U.S. Application No. 13/802,304 is a continuation-in-part of U.S. Application No. 13/720,830, filed on December 19, 2012, and published on September 26, 2013 as US 2013/0252533. U.S. Application No. 13/720,830 claims the benefit of U.S. Provisional Application No. 61/579,233 filed on December 22, 2011. U.S. Application No. 13/720,830, filed December 19, 2012, is a continuation-in-part of U.S. Application No. 12/652,040, filed January 5, 2010, and issued on February 26, 2013 as US 8,383,202, which is a continuation-in-part of U.S. Application No. 12/139.391, filed June 13, 2008, and published on December 18, 2008 as US 2008/0311307. U.S. Application No. 12/652,040 also claims the rights of U.S. Provisional Application No. 61/142,575 filed on January 5, 2009. All cross-referenced applications listed herein are hereby incorporated by reference in their entirety.

本教示係關於一種氣體封裝系統之各種具體實例,該氣體封裝系統具有一惰性、實質上低粒環境,用於在多種基板大小及基板材料上製造OLED面板。 The present teachings relate to various specific embodiments of a gas packaging system having an inert, substantially low-particle environment for manufacturing OLED panels on a variety of substrate sizes and substrate materials.

對有機發光二極體(OLED)顯示器技術之潛力的興趣已受到OLED顯示器技術屬性驅動,該等屬性包括展現具有高飽和色彩、為高對比度、超薄、快速回應且具有能量效率之顯示面板。另外,包括可撓性聚合材料之多種基板材料可用於OLED顯示器技術之製造中。雖然用於小螢幕應用(主要用於蜂巢式電話)的顯示器之展現已足以強調該技術之潛力,但在按高良率按比例調整一系列基板格式的大量製造方面仍存在挑戰。Interest in the potential of organic light emitting diode (OLED) display technology has been driven by the properties of OLED display technology, including display panels that exhibit highly saturated colors, are high contrast, are ultra-thin, have fast response times, and are energy efficient. In addition, a wide variety of substrate materials, including flexible polymeric materials, can be used in the manufacture of OLED display technology. While the demonstration of displays for small screen applications (primarily for cellular phones) has been sufficient to highlight the potential of the technology, challenges remain in scaling high volume manufacturing across a range of substrate formats at high yields.

關於格式之按比例調整,Gen 5.5基板具有約130 cm×150 cm之尺寸,且可產生約八個26''平板顯示器。比較之下,較大格式基板可包括使用Gen 7.5及Gen 8.5母玻璃基板大小。Gen 7.5母玻璃具有約195 cm×225 cm之尺寸,且可每基板切割成八個42''或六個47''平板顯示器。在Gen 8.5中使用之母玻璃大致為220 cm×250 cm,且可每基板切割至六個55''或八個46''平板顯示器。在將OLED顯示器製造按比例調整至較大格式中仍存在的挑戰之一指示為,在大於Gen 5.5基板之基板上按高良率大量製造OLED顯示器已證明非常有挑戰性。With respect to scaling of formats, a Gen 5.5 substrate has dimensions of approximately 130 cm x 150 cm and can produce approximately eight 26" flat panel displays. In comparison, larger format substrates may include the use of Gen 7.5 and Gen 8.5 mother glass substrate sizes. Gen 7.5 mother glass has dimensions of approximately 195 cm x 225 cm and can be cut into eight 42" or six 47" flat panel displays per substrate. The mother glass used in Gen 8.5 is approximately 220 cm x 250 cm and can be cut into six 55" or eight 46" flat panel displays per substrate. One of the challenges that remain in scaling OLED display manufacturing to larger formats is that manufacturing OLED displays in large quantities at high yields on substrates larger than Gen 5.5 substrates has proven to be very challenging.

原則上,可藉由使用OLED印刷系統在基板上印刷各種有機薄膜以及其他材料來製造OLED器件。此等有機材料可易受氧化及其他化學製程損壞。按可針對各種基板大小按比例調整且可在惰性、實質上低粒印刷環境中進行之方式容納OLED印刷系統可呈現多種工程設計挑戰。用於高輸送量大格式基板印刷(例如,Gen 7.5及Gen 8.5基板之印刷)之製造工具需要實質上大的設施。因此,將大設施維持於惰性氣氛下、需要氣體淨化以移除反應性大氣物質(諸如,水蒸氣及氧)以及有機溶劑蒸氣,以及維持實質上低粒印刷環境已證明為顯著挑戰性的。In principle, OLED devices can be manufactured by printing various organic thin films and other materials on substrates using an OLED printing system. These organic materials can be susceptible to oxidation and other chemical process damage. Accommodating an OLED printing system in a manner that can be scaled for various substrate sizes and can be performed in an inert, substantially low-particle printing environment can present a variety of engineering design challenges. Manufacturing tools for high-throughput large-format substrate printing (e.g., printing of Gen 7.5 and Gen 8.5 substrates) require substantially large facilities. Therefore, maintaining large facilities under an inert atmosphere, requiring gas purification to remove reactive atmospheric species (e.g., water vapor and oxygen) and organic solvent vapors, and maintaining a substantially low-particle printing environment have proven to be significantly challenging.

因而,在按高良率按比例調整一系列基板格式的OLED顯示器技術之大量製造過程中仍存在挑戰。因此,存在對本教示之氣體封裝系統之各種具體實例的需求,該氣體封裝系統可容納在惰性、實質上低粒環境中之OLED印刷系統,且可易於按比例調整以提供在多種基板大小及基板材料上的OLED面板之製造。另外,本教示之各種氣體封裝系統可提供容易在處理期間自外部接取OLED印刷系統,且容易接取內部以進行維護同時停機時間最小。Thus, challenges remain in the high volume manufacturing of OLED display technology that scales across a range of substrate formats at high yields. Therefore, there exists a need for various specific embodiments of the present teachings of gas packaging systems that can house an OLED printing system in an inert, substantially low particle environment, and that can be easily scaled to provide for the manufacture of OLED panels on a variety of substrate sizes and substrate materials. Additionally, various gas packaging systems of the present teachings can provide easy external access to the OLED printing system during processing, and easy internal access for maintenance with minimal downtime.

本教示揭示可容納OLED印刷系統之氣體封裝組裝件之各種具體實例。氣體封裝組裝件之各種具體實例可被可密封地建構且與提供粒子控制系統、氣體循環及過濾系統、氣體淨化系統及類似者之各種組件整合,以形成氣體封裝系統之各種具體實例,該氣體封裝系統可為了需要實質上低粒惰性氣體環境的製程維持此環境。The present teachings disclose various embodiments of gas encapsulation assemblies that can house OLED printing systems. Various embodiments of gas encapsulation assemblies can be sealably constructed and integrated with various components that provide particle control systems, gas circulation and filtration systems, gas purification systems, and the like to form various embodiments of gas encapsulation systems that can maintain a substantially low-particle inert gas environment for processes that require such an environment.

原則上可允許印刷包括大格式基板大小的多種基板大小之製造工具可需要實質上大的設施,以用於容納此等OLED製造工具。因此,將整個大設施維持在惰性氣氛下呈現工程設計挑戰,諸如,大量惰性氣體之持續淨化。根據本教示,惰性氣體可為在一組定義之條件下不經歷化學反應之任何氣體。惰性氣體之一些通用非限制性實例可包括氮、稀有氣體中之任何者及其任何組合。另外,提供經基本上氣密封以防止各種反應性大氣源氣體(諸如,水蒸氣及氧)以及自各種印刷製程產生之有機溶劑蒸氣的污染之大設施造成工程設計挑戰。根據本教示,OLED印刷設施可將各種反應性物質(包括諸如水蒸氣及氧之各種反應性大氣源氣體以及有機溶劑蒸氣)中之每一物質之含量維持於100 ppm或更低,例如,處於10 ppm或更低、處於1.0 ppm或更低或處於0.1 ppm或更低。Manufacturing tools that in principle can allow printing of a variety of substrate sizes including large format substrate sizes can require substantially large facilities for housing such OLED manufacturing tools. Therefore, maintaining the entire large facility under an inert atmosphere presents engineering design challenges, such as the continuous purification of large amounts of inert gas. According to the present teachings, an inert gas can be any gas that does not undergo a chemical reaction under a set of defined conditions. Some common non-limiting examples of inert gases can include any of nitrogen, noble gases, and any combination thereof. In addition, providing a large facility that is substantially hermetically sealed to prevent contamination by various reactive atmospheric source gases (such as water vapor and oxygen) and organic solvent vapors generated from various printing processes creates engineering design challenges. According to the present teachings, an OLED printing facility can maintain the content of each of various reactive species (including various reactive atmospheric source gases such as water vapor and oxygen, and organic solvent vapor) at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

持續維持需要惰性環境的大設施還造成額外挑戰。舉例而言,製造設施可能需要各種服務束之實質長度,該等服務束可操作性地自各種系統及組裝件連接以提供操作(例如但不限於)印刷系統所需之光學、電、機械及流體連接。根據本教示,服務束可包括(藉由非限制性實例)光纜、電纜、電線及管系及類似者。作為藉由使各種纜線、電線及管系及類似者一起捆紮於服務束中創造的大量空隙空間之結果,根據本教示的服務束之各種具體實例可具有顯著的總死體積。自服務束中之大量空隙空間產生的總死體積可導致堵塞於其中的大量反應性氣態物質之滯留。此大量堵塞之反應性氣態物質可對於有效使氣體封裝符合關於反應性大氣構成物(諸如,氧及水蒸氣)以及有機蒸氣之含量的規範造成挑戰。此外,在印刷系統之操作中使用的此等服務束可為持續存在的顆粒物來源。Additional challenges are also created by continually maintaining large facilities that require an inert environment. For example, a manufacturing facility may require substantial lengths of various service bundles that are operably connected from various systems and assemblies to provide the optical, electrical, mechanical, and fluid connections required to operate (for example, but not limited to) a printing system. In accordance with the present teachings, a service bundle may include, by way of non-limiting example, optical cables, electrical cables, wires, and tubing, and the like. As a result of the large amount of void space created by bundling the various cables, wires, and tubing, and the like together in a service bundle, various specific examples of service bundles in accordance with the present teachings may have a significant total dead volume. The total dead volume resulting from the large void spaces in the service bundles can result in the entrapment of large amounts of reactive gaseous species that become trapped therein. This large amount of trapped reactive gaseous species can create challenges for effectively meeting gas packaging regulations for the content of reactive atmosphere constituents (e.g., oxygen and water vapor) as well as organic vapors. Additionally, such service bundles used in the operation of the printing system can be a source of ongoing particulate matter.

在此點上,提供且維持OLED製造設施中之實質上惰性且低粒環境提供了在(例如)戶外高流量層流過濾罩下在大氣條件中進行之製程中不存在的額外挑戰。因而,本教示之系統及方法之各種具體實例解決了在惰性、實質上低粒環境中多種大小及材料之OLED基板之OLED印刷中存在的挑戰。In this regard, providing and maintaining a substantially inert and low-particle environment in an OLED manufacturing facility presents additional challenges not present in processes conducted in atmospheric conditions, for example, outdoors under a high-flow laminar flow filter hood. Thus, various embodiments of the systems and methods of the present teachings address challenges present in OLED printing of OLED substrates of a variety of sizes and materials in an inert, substantially low-particle environment.

關於維持實質上低粒環境,氣體循環及過濾系統之各種具體實例可經設計以提供符合國際標準組織標準(ISO) 14644-1:1999「潔淨室及相關聯之受控制之環境——第1部分:空氣清潔度之分類(Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness)」(如由第1類別至第5類別指定)之標準的針對空中顆粒之低粒惰性氣體環境。然而,單獨控制空中顆粒物並不足夠用於在(例如但不限於)印刷製程期間提供最接近基板處之低粒環境,因為在此製程期間最接近基板而產生之粒子可在其可經由氣體循環及過濾系統吹掃前累積於基板表面上。With respect to maintaining a substantially low-particle environment, various embodiments of the gas circulation and filtration systems may be designed to provide a low-particle inert gas environment with respect to airborne particles in accordance with the International Organization for Standardization (ISO) 14644-1:1999, “Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness” (as designated by Class 1 to Class 5). However, controlling airborne particulate matter alone is not sufficient for providing a low particle environment proximate to a substrate during, for example but not limited to, a printing process, because particles generated proximate to the substrate during such a process may accumulate on the substrate surface before they can be swept by the gas circulation and filtration system.

因此,本教示之氣體封裝系統之各種具體實例可具有一粒子控制系統,除了氣體循環及過濾系統之外,粒子控制系統亦可包括可在印刷步驟中之處理期間提供最接近基板之低粒地帶之組件。根據本教示之氣體封裝系統之各種具體實例,用於本教示之氣體封裝系統之各種具體實例的粒子控制系統可包括一氣體循環及過濾系統、用於相對於基板移動印刷頭組裝件之一低粒產生X軸線性軸承系統、一服務束外殼排氣系統及一印刷頭組裝件排氣系統。在此點上,除了用於維持針對空中顆粒物之實質上低粒規格的循環及過濾系統之外,本教示之氣體封裝系統之各種具體實例亦可具有一粒子控制系統,其可包括用於維持沈積於基板上之顆粒物的實質上低粒規格之額外組件。Thus, various embodiments of the gas packaging system of the present teachings may have a particle control system that, in addition to the gas circulation and filtration system, may also include components that may provide a low particle zone proximate to the substrate during processing in the printing step. According to various embodiments of the gas packaging system of the present teachings, a particle control system for various embodiments of the gas packaging system of the present teachings may include a gas circulation and filtration system, a low particle generation X-axis linear bearing system for moving the print head assembly relative to the substrate, a service bundle enclosure exhaust system, and a print head assembly exhaust system. In this regard, in addition to a circulation and filtration system for maintaining substantially low particle specifications for airborne particulate matter, various embodiments of the gas packaging system of the present teachings may also have a particle control system that may include additional components for maintaining substantially low particle specifications for particulate matter deposited on a substrate.

本教示之系統及方法之各種具體實例可維持實質上低粒環境,從而提供感興趣之特定大小範圍之粒子之不超過基板上沈積速率規範的平均基板上分佈。可針對在約0.1 μm及更大至約10 μm及更大之間的感興趣之粒徑範圍中之每一者設定基板上沈積速率規範。在本教示之系統及方法之各種具體實例中,可將基板上粒子沈積速率規範表達為針對目標粒徑範圍中之每一者的每分鐘每平方公尺基板沈積的粒子之數目之極限。Various embodiments of the systems and methods of the present teachings can maintain a substantially low particle environment to provide an average on-substrate distribution of particles of a particular size range of interest that does not exceed an on-substrate deposition rate specification. The on-substrate deposition rate specification can be set for each of the particle size ranges of interest between about 0.1 μm and greater to about 10 μm and greater. In various embodiments of the systems and methods of the present teachings, the on-substrate particle deposition rate specification can be expressed as a limit on the number of particles deposited per square meter of substrate per minute for each of the target particle size ranges.

基板上粒子沈積速率規範之各種具體實例可易於自每分鐘每平方公尺基板沈積的粒子之數目之極限轉換至針對目標粒徑範圍中之每一者的每分鐘每基板沈積的粒子之數目之極限。可易於經由基板(例如,具體一代大小之基板)與彼基板代之對應的面積之間的已知關係進行此轉換。舉例而言,下表1總結一些具有已知代大小之基板的縱橫比及面積。應理解,可看出製造者之間的縱橫比及因此大小之輕微變化。然而,與此變化無關,對於多種代大小之基板中的任何者,可獲得針對具體代大小之基板的轉換因數及以平方公尺計之面積。 代ID X (mm) Y (mm) 面積(m 2 Gen 3.0 550 650 0.36 Gen 3.5 610 720 0.44 Gen 3.5 620 750 0.47 Gen 4 680 880 0.60 Gen 4 730 920 0.67 Gen 5 1100 1250 1.38 Gen 5 1100 1300 1.43 Gen 5.5 1300 1500 1.95 Gen 6 1500 1850 2.78 Gen 7.5 1950 2250 4.39 Gen 8 2160 2400 5.18 Gen 8 2160 2460 5.31 Gen 8.5 2200 2500 5.50 Gen 9 2400 2800 6.72 Gen 10 2850 3050 8.69 表1:面積與基板大小之間的相關性 Various specific examples of particle deposition rate specifications on substrates can be easily converted from limits on the number of particles deposited per minute per square meter of substrate to limits on the number of particles deposited per minute per substrate for each of the target particle size range. This conversion can be easily performed via a known relationship between a substrate (e.g., a substrate of a specific generation size) and the area corresponding to that substrate generation. For example, Table 1 below summarizes the aspect ratio and area for some substrates of known generation sizes. It should be understood that slight variations in aspect ratios and therefore sizes can be seen between manufacturers. However, regardless of this variation, a conversion factor for a substrate of a specific generation size and the area in square meters can be obtained for any of a variety of generation sizes of substrates. Generation ID X (mm) Y (mm) Area (m 2 ) Gen 3.0 550 650 0.36 Gen 3.5 610 720 0.44 Gen 3.5 620 750 0.47 Gen 4 680 880 0.60 Gen 4 730 920 0.67 Gen 5 1100 1250 1.38 Gen 5 1100 1300 1.43 Gen 5.5 1300 1500 1.95 Gen 6 1500 1850 2.78 Gen 7.5 1950 2250 4.39 Gen 8 2160 2400 5.18 Gen 8 2160 2460 5.31 Gen 8.5 2200 2500 5.50 Gen 9 2400 2800 6.72 Gen 10 2850 3050 8.69 Table 1: Correlation between area and substrate size

另外,可易於將表達為每分鐘每平方公尺基板沈積的粒子之數目之極限的基板上粒子沈積速率規範轉換至多種單位時間表達中之任何者。將易於理解,可易於經由已知時間關係將正規化至分鐘之基板上粒子沈積速率規範轉換至任一其他時間表達,例如(但不限於),秒、小時、天等。另外,可使用與處理具體有關的時間單位。舉例而言,印刷循環可與時間單位相關聯。對於根據本教示的氣體封裝系統之各種具體實例,印刷循環可為將基板移動至氣體封裝系統內用於印刷且接著在印刷完成後自氣體封裝系統移除所用之時間週期。對於根據本教示的氣體封裝系統之各種具體實例,印刷循環可為自基板與印刷頭組裝件之對準之起始至最後一滴噴出之墨水傳遞至基板上的時間週期。在處理之技術領域中,總平均循環時間或TACT可為針對特定製程循環的時間單位之表達。根據本教示之系統及方法之各種具體實例,針對印刷循環之TACT可為約30秒。對於本教示之系統及方法之各種具體實例,針對印刷循環之TACT可為約60秒。在本教示之系統及方法之各種具體實例中,針對印刷循環之TACT可為約90秒。對於本教示之系統及方法之各種具體實例,針對印刷循環之TACT可為約120秒。在本教示之系統及方法之各種具體實例中,針對印刷循環之TACT可為約300秒。In addition, the particle deposition rate specification on the substrate expressed as a limit of the number of particles deposited per square meter of substrate per minute can be easily converted to any of a variety of unit time expressions. It will be readily understood that the particle deposition rate specification on the substrate normalized to minutes can be easily converted to any other time expression, such as (but not limited to), seconds, hours, days, etc., via a known time relationship. In addition, time units specifically related to the process can be used. For example, a printing cycle can be associated with a time unit. For various specific examples of a gas packaging system according to the present teachings, a printing cycle can be the time period used to move a substrate into a gas packaging system for printing and then remove it from the gas packaging system after printing is completed. For various specific embodiments of the gas packaging system according to the present teachings, a print cycle can be the time period from the start of alignment of the substrate and the print head assembly to the time when the last drop of ejected ink is delivered to the substrate. In the technical field of processing, the total average cycle time or TACT can be an expression of the time unit for a specific process cycle. According to various specific embodiments of the system and method of the present teachings, the TACT for a print cycle can be about 30 seconds. For various specific embodiments of the system and method of the present teachings, the TACT for a print cycle can be about 60 seconds. In various specific embodiments of the system and method of the present teachings, the TACT for a print cycle can be about 90 seconds. For various specific examples of the systems and methods of the present teachings, the TACT for a printing cycle can be about 120 seconds. In various specific examples of the systems and methods of the present teachings, the TACT for a printing cycle can be about 300 seconds.

關於空中顆粒物及在系統內之粒子沈積,大量變數可影響可充分計算(例如)針對任一特定製造系統的在表面(諸如,基板)上之粒子散落速率的近似值之一般模型的開發。諸如粒子之大小、特定大小之粒子的分佈、基板之表面積及系統內的基板之暴露時間的變數可取決於各種製造系統而變化。舉例而言,粒子之大小及特定大小之粒子的分佈可實質上受到各種製造系統中的粒子產生組件之源及位置影響。基於本教示之氣體封裝系統之各種具體實例的計算表明,在無本教示之各種粒子控制系統之情況下,對於在0.1 μm及更大之大小範圍中的粒子,顆粒物之每平方公尺基板每印刷循環的基板上沈積可在大於約1百萬至大於約1千萬個粒子之間。此等計算表明,在無本教示之各種粒子控制系統之情況下,對於在約2 μm及更大之大小範圍中的粒子,顆粒物之每平方公尺基板每印刷循環的基板上沈積可在大於約1000至大於約10,000個粒子之間。With respect to airborne particulate matter and particle deposition within a system, a large number of variables may affect the development of a general model that can adequately calculate, for example, an approximation of the particle shedding rate on a surface (e.g., a substrate) for any particular manufacturing system. Variables such as particle size, distribution of particles of a particular size, surface area of the substrate, and exposure time of the substrate within the system may vary depending on the various manufacturing systems. For example, particle size and distribution of particles of a particular size may be substantially affected by the source and location of the particle generating components in the various manufacturing systems. Calculations based on various specific examples of gas packaging systems of the present teachings indicate that, without various particle control systems of the present teachings, for particles in the size range of 0.1 μm and larger, the deposition of particles on the substrate per printing cycle may be between greater than about 1 million and greater than about 10 million particles per square meter of substrate. Such calculations indicate that, without various particle control systems of the present teachings, for particles in the size range of about 2 μm and larger, the deposition of particles on the substrate per printing cycle may be between greater than about 1000 and greater than about 10,000 particles per square meter of substrate.

本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於10 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之低粒氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於2 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。對於本教示之氣體封裝系統之各種具體實例,可維持低粒環境,從而對於大小大於或等於0.3 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 10 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 5 μm. In various specific embodiments of the low-particle gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 2 μm. In various specific embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 1 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.5 μm. For various embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.3 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per minute per square meter of substrate for particles greater than or equal to 0.1 μm in size.

如本文中先前所論述,在大於Gen 5.5基板之基板上按高良率大量製造OLED顯示器已證明為實質上有挑戰性。為了更清晰瞭解可在各種OLED器件之製造中使用的基板大小,自從約20世紀90年代早期,已針對使用OLED印刷以外的方法製造的平板顯示器演進了數代母玻璃基板大小。標明為Gen 1之第一代母玻璃基板大致為30 cm×40 cm,且因此可生產15"面板。大約在20世紀90年代中期,用於生產平板顯示器之現有技術已演進至Gen 3.5之母玻璃基板大小,其具有約60 cm×72 cm之尺寸。比較之下,Gen 5.5基板具有約130 cm×150 cm之尺寸。As discussed previously herein, manufacturing OLED displays in large quantities at high yield on substrates larger than Gen 5.5 substrates has proven to be substantially challenging. To provide a clearer understanding of the substrate sizes that may be used in the manufacture of various OLED devices, several generations of mother glass substrate sizes have evolved since approximately the early 1990s for flat panel displays manufactured using methods other than OLED printing. The first generation of mother glass substrates, designated Gen 1, was approximately 30 cm x 40 cm, and thus could produce 15" panels. Around the mid-1990s, the existing technology for producing flat panel displays had evolved to a Gen 3.5 mother glass substrate size, which had dimensions of approximately 60 cm x 72 cm. In comparison, the Gen 5.5 substrate had dimensions of approximately 130 cm x 150 cm.

隨著一代代地進展,對於不同於OLED印刷之製造製程,正在生產Gen 7.5及Gen 8.5之母玻璃大小。Gen 7.5母玻璃具有約195cm×225 cm之尺寸,且可每基板切割成八個42''或六個47''平板。在Gen 8.5中使用之母玻璃大致為220 cm×250 cm,且可每基板切割至六個55''或八個46''平板。已認識到OLED平板顯示器在諸如更真實色彩、更高對比度、薄度、可撓性、透明度及能量效率之品質方面的前景,同時,OLED製造實際上限於G 3.5及更小。當前,OLED印刷咸信為打破此限制且允許實現不僅Gen 3.5及更小母玻璃大小且亦在最大母玻璃大小(諸如,Gen 5.5、Gen 7.5及Gen 8.5)下的OLED面板製造之最佳製造技術。OLED面板顯示器技術的特徵中之一者包括可使用多種基板材料,例如(但不限於)多種玻璃基板材料,以及多種聚合基板材料。在此點上,根據由使用基於玻璃之基板而引起的術語敍述之大小可應用於適合於在OLED印刷中使用的任何材料之基板。As the generations progress, for manufacturing processes other than OLED printing, Gen 7.5 and Gen 8.5 mother glass sizes are being produced. Gen 7.5 mother glass has dimensions of approximately 195 cm x 225 cm and can be cut into eight 42'' or six 47'' panels per substrate. The mother glass used in Gen 8.5 is approximately 220 cm x 250 cm and can be cut into six 55'' or eight 46'' panels per substrate. While the promise of OLED flat panel displays in terms of qualities such as truer colors, higher contrast, thinness, flexibility, transparency, and energy efficiency has been recognized, OLED manufacturing has been practically limited to G 3.5 and smaller. Currently, OLED printing is believed to be the best manufacturing technology that breaks this limitation and allows for OLED panel manufacturing not only at Gen 3.5 and smaller mother glass sizes, but also at the largest mother glass sizes (e.g., Gen 5.5, Gen 7.5, and Gen 8.5). One of the characteristics of OLED panel display technology includes the ability to use a variety of substrate materials, such as (but not limited to) a variety of glass substrate materials, as well as a variety of polymeric substrate materials. In this regard, the size described in terms arising from the use of glass-based substrates can be applied to substrates of any material suitable for use in OLED printing.

預期可在本教示之氣體封裝系統之各種具體實例之惰性、實質上低粒環境內印刷廣泛多種墨水調配物。在OLED顯示器之製造期間,可形成OLED像素以包括OLED膜堆疊,當施加電壓時,OLED膜堆疊可發射具體峰值波長之光。在陽極與陰極之間的OLED膜堆疊結構可包括電洞注入層(HIL)、電洞輸送層(HTL)、發射層(EL)、電子輸送層(ETL)及電子注入層(EIL)。在OLED膜堆疊結構之一些具體實例中,可將電子輸送層(ETL)與電子注入層(EIL)組合以形成ETL/EIL層。根據本教示,可使用噴墨印刷來印刷用於OLED膜堆疊之各種色彩像素EL膜的針對EL之各種墨水調配物。另外,例如(但不限於)HIL、HTL、EML及ETL/EIL層可具有可使用噴墨印刷來印刷之墨水調配物。It is contemplated that a wide variety of ink formulations may be printed within the inert, substantially low-particle environment of various specific embodiments of the gas packaging system of the present teachings. During the manufacture of an OLED display, an OLED pixel may be formed to include an OLED film stack that may emit light of a specific peak wavelength when a voltage is applied. The OLED film stack structure between the anode and the cathode may include a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EL), an electron transport layer (ETL), and an electron injection layer (EIL). In some specific embodiments of the OLED film stack structure, an electron transport layer (ETL) may be combined with an electron injection layer (EIL) to form an ETL/EIL layer. According to the present teachings, various ink formulations for EL can be printed using inkjet printing for various color pixel EL films of an OLED film stack. In addition, for example (but not limited to) HIL, HTL, EML, and ETL/EIL layers can have ink formulations that can be printed using inkjet printing.

進一步預期,可使用噴墨印刷將有機囊封層印刷於OLED面板上。預期,可使用噴墨印刷來印刷有機囊封層,因為噴墨印刷可提供若干優勢。首先,可消除一系列真空處理操作,此係因為可在大氣壓力下執行此基於噴墨之製造。另外,在噴墨印刷製程期間,有機囊封層可被局部化於在作用區上及最接近作用區的OLED基板之蓋部分,以有效囊封作用區(包括作用區之橫向邊緣)。使用噴墨印刷之目標圖案化導致消除材料浪費,以及消除達成有機層之圖案化通常所需之額外處理。囊封墨水可包含聚合物(包括例如(但不限於)丙烯酸酯、甲基丙烯酸酯、胺基甲酸酯或其他材料)以及共聚物及其混合物,可使用熱處理(例如,烘焙)、UV曝露及其組合來使其固化。It is further contemplated that the organic encapsulation layer may be printed on the OLED panel using inkjet printing. It is contemplated that the organic encapsulation layer may be printed using inkjet printing because inkjet printing may offer several advantages. First, a series of vacuum processing operations may be eliminated because such inkjet-based manufacturing may be performed under atmospheric pressure. Additionally, during the inkjet printing process, the organic encapsulation layer may be localized to the capping portion of the OLED substrate over and proximate the active area to effectively encapsulate the active area, including the lateral edges of the active area. Targeted patterning using inkjet printing results in the elimination of material waste, as well as the elimination of additional processing typically required to achieve patterning of the organic layer. The encapsulating ink may include polymers including, for example, but not limited to, acrylates, methacrylates, urethanes, or other materials, as well as copolymers and mixtures thereof, which may be cured using thermal treatment (eg, baking), UV exposure, and combinations thereof.

關於OLED印刷,根據本教示,已發現維持實質上低含量的反應性物質(例如但不限於諸如氧及水蒸氣之大氣構成物以及在OLED墨水中使用之各種有機溶劑蒸氣)與提供符合必需的使用期限規範之OLED平板顯示器相關。使用期限規範對於OLED面板技術而言具有特別重要性,因為此直接與顯示器產品壽命相關,顯示器產品壽命為對於所有面板技術之產品規範,OLED面板技術一直難以符合該規範。為了提供符合必需的使用期限規範之面板,藉由本教示之氣體封裝系統之各種具體實例,諸如水蒸氣、氧以及有機溶劑蒸氣的反應性物質中之每一者之含量可維持在100 ppm或更低,例如,在10 ppm或更低,在1.0 ppm或更低,或在0.1 ppm或更低。With respect to OLED printing, in accordance with the present teachings, it has been discovered that maintaining substantially low levels of reactive species, such as, but not limited to, atmospheric constituents such as oxygen and water vapor, and the vapors of various organic solvents used in OLED inks, is relevant to providing OLED flat panel displays that meet the necessary lifetime specifications. The lifetime specification is of particular importance for OLED panel technology as it is directly related to display product life, which is a product specification for all panel technologies that OLED panel technology has historically struggled to meet. In order to provide a panel that meets the necessary service life specifications, through various specific embodiments of the gas packaging system taught herein, the content of each of reactive species such as water vapor, oxygen, and organic solvent vapor can be maintained at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

在審視表2中總結之資訊的過程中可說明對於在可將諸如水蒸氣、氧以及有機溶劑蒸氣的反應性物質中之每一者之含量維持在100 ppm或更低(例如,在10 ppm或更低,在1.0 ppm或更低,或在0.1 ppm或更低)的設施中印刷OLED面板之需求。表2上總結之資料係自包含按大像素、旋塗器件格式製造的針對紅、綠及藍中之每一者之有機薄膜組成物的附體試片中之每一者之測試產生。為了各種調配物及製程之快速評估之目的,此等附體試片實質上較易於製造及測試。雖然不應將附體試片測試與印刷面板的使用期限測試混淆,但其可指示各種調配物及製程對使用期限之影響。在下表中展示之結果表示在附體試片之製造中的製程步驟之變化,其中與在空氣中而不是在氮環境中類似地製造之附體試片相比,對於在反應性物質小於1 ppm之氮環境中製造之附體試片,僅旋塗環境變化。The need for printing OLED panels in facilities that can maintain levels of each of reactive species such as water vapor, oxygen, and organic solvent vapor at 100 ppm or less (e.g., at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less) can be illustrated in reviewing the information summarized in Table 2. The data summarized in Table 2 is generated from testing of each of the attached coupons containing organic thin film compositions for each of red, green, and blue fabricated in a large pixel, spin-on device format. These attached coupons are physically easier to manufacture and test for the purpose of rapid evaluation of various formulations and processes. Although attached coupon testing should not be confused with lifetime testing of printed panels, it can indicate the effects of various formulations and processes on lifetime. The results presented in the table below represent the changes in process steps in the fabrication of the attached coupons, where only the spin coating environment was changed for attached coupons fabricated in a nitrogen environment with less than 1 ppm of reactive species, compared to attached coupons similarly fabricated in air rather than a nitrogen environment.

經由檢驗在不同處理環境下製造之附體試片的在表2中之資料(特別在紅及藍之情況下),顯然,在有效地減少有機薄膜組成物向反應性物質之暴露之環境中的印刷可對各種EL之穩定性且因此對使用期限具有實質影響。 色彩 製程環境 V Cd/A CIE (x, y) T95 T80 T50       @ 10 mA/cm 2 @ 1000 Cd/m 2 6 9 (0.61, 0.38) 200 1750 10400 空氣 6 8 (0.60, 0.39) 30 700 5600 7 66 (0.32, 0.63) 250 3700 32000 空氣 7 61 (0.32, 0.62) 250 2450 19700 4 5 (0.14, 0.10) 150 750 3200 空氣 4 5 (0.14, 0.10) 15 250 1800 表2:惰性氣體處理對OLED面板之使用限制之影響 By examining the data in Table 2 (particularly in the case of red and blue) of coated coupons produced under different processing environments, it is apparent that printing in an environment that effectively reduces exposure of the organic thin film composition to reactive species can have a substantial impact on the stability, and therefore the shelf life, of the various ELs. color Process environment V Cd/A CIE (x, y) T95 T80 T50 @ 10 mA/ cm2 @ 1000 Cd/ m2 red nitrogen 6 9 (0.61, 0.38) 200 1750 10400 Air 6 8 (0.60, 0.39) 30 700 5600 Green nitrogen 7 66 (0.32, 0.63) 250 3700 32000 Air 7 61 (0.32, 0.62) 250 2450 19700 Blue nitrogen 4 5 (0.14, 0.10) 150 750 3200 Air 4 5 (0.14, 0.10) 15 250 1800 Table 2: Impact of inert gas treatment on the usage restrictions of OLED panels

另外,維持用於OLED印刷之實質上低粒環境具有特別重要性,因為甚至非常小的粒子亦可導致OLED面板上之可見缺陷。在此點上,本教示之系統及方法提供維持諸如水蒸氣、氧以及有機溶劑蒸氣的反應性物質中之每一者之低含量,且另外提供維持用於高品質OLED面板製造之足夠低粒環境。氣體封裝系統之各種具體實例可具有一粒子控制系統,粒子控制系統除了氣體循環及過濾系統之外亦可包括組件以在印刷步驟中之處理期間提供最接近基板之低粒地帶。Additionally, maintaining a substantially low particle environment for OLED printing is of particular importance, as even very small particles can cause visible defects on an OLED panel. In this regard, the systems and methods of the present teachings provide for maintaining low levels of each of reactive species such as water vapor, oxygen, and organic solvent vapor, and additionally provide for maintaining a sufficiently low particle environment for high quality OLED panel manufacturing. Various specific examples of gas encapsulation systems may have a particle control system that may include components in addition to gas circulation and filtration systems to provide a low particle zone proximate to the substrate during processing in the printing step.

本教示之氣體封裝系統之各種具體實例可具有一提供最接近基板之低粒地帶的粒子控制系統,藉此可圍阻最接近基板之各種粒子產生組件及使其排氣以防止粒子在印刷製程期間累積於基板上。在氣體封裝系統之各種具體實例中,粒子控制系統可包括用於維持符合國際標準組織標準(ISO)14644-1:1999(如由第1類別至第5類別指定)之標準的空中顆粒含量之一氣體循環及過濾系統,兩者皆在氣體封裝系統內,以及最接近基板。粒子控制系統之各種具體實例可包括與已圍阻之粒子產生組件流體連通的氣體循環及過濾系統,使得可將此等圍阻粒子之組件排氣至氣體循環及過濾系統內。對於粒子控制系統之各種具體實例,已圍阻之粒子產生組件可被排氣至死空間內,從而致使此顆粒物不可在氣體封裝系統內再循環。本教示之氣體封裝系統之各種具體實例可具有一粒子控制系統,因此各種組件可固有地為低粒產生的,藉此防止粒子在印刷製程期間累積於基板上。本教示之粒子控制系統之各種組件可利用粒子產生組件之圍阻及排氣,以及選擇固有地低粒產生的組件來提供最接近基板之低粒地帶。Various embodiments of the gas encapsulation system of the present teachings may have a particle control system that provides a low particle zone proximate to the substrate, whereby various particle generating components proximate to the substrate may be contained and vented to prevent particle accumulation on the substrate during the printing process. In various embodiments of the gas encapsulation system, the particle control system may include a gas circulation and filtration system for maintaining airborne particle levels that meet the standards of the International Organization for Standardization Standards (ISO) 14644-1:1999 (as specified by Class 1 to Class 5), both within the gas encapsulation system and proximate to the substrate. Various embodiments of the particle control system may include a gas circulation and filtration system in fluid communication with the confined particle generating components, so that such confined particle generating components can be exhausted into the gas circulation and filtration system. For various embodiments of the particle control system, the confined particle generating components can be exhausted into a dead space, thereby preventing such particulate matter from being recirculated within the gas packaging system. Various embodiments of the gas packaging system of the present teachings may have a particle control system so that various components can be inherently low in particle generation, thereby preventing particles from accumulating on the substrate during the printing process. Various components of the particle control system of the present teachings can utilize the containment and exhaust of the particle generating components, as well as selecting components that are inherently low in particle generation to provide a low-particle zone closest to the substrate.

對於本教示之低粒氣體封裝系統之各種具體實例,維持經封裝系統(例如,經封裝OLED印刷系統)中的實質上低粒環境提供了未由可在大氣條件中(諸如,在戶外高流量層流過濾罩下)進行之製程的粒子減少呈現之額外挑戰。氣體封裝系統之各種具體實例可藉由例如(但不限於)以下操作提供實質上低粒環境:1)經由消除最接近基板的顆粒物可收集於之區域,2)藉由在本教示之粒子控制系統之各種具體實例內圍阻及排氣粒子產生組件,諸如,可包括捆紮之纜線、電線及管系及類似者之服務束,以及(例如)利用諸如使用摩擦軸承之風扇或線性運動系統之組件的各種裝置、組裝件及系統,及3)藉由使用多種固有地低粒產生的氣動操作式組件,諸如(但不限於)基板浮動台、空氣軸承及氣動操作式機器人及類似者。根據本教示之氣體封裝系統之各種具體實例,實質上低粒子環境可包括一粒子控制系統,其包括用於在印刷期間提供最接近基板之低粒地帶之組件。For various specific embodiments of low-particle gas packaging systems of the present teachings, maintaining a substantially low-particle environment in a packaged system (e.g., a packaged OLED printing system) provides additional challenges not presented by particle reduction for processes that may be conducted in atmospheric conditions (e.g., outdoors under a high-flow laminar flow filter hood). Various embodiments of gas containment systems can provide a substantially low particle environment by, for example, but not limited to, the following operations: 1) by eliminating the area closest to the substrate in which particles can collect, 2) by enclosing and exhausting particle generating components within various embodiments of the particle control system of the present teachings, such as, for example, service bundles that can include bundled cables, wires and tubing, and the like, and various devices, assemblies and systems that, for example, utilize components such as fans or linear motion systems using friction bearings, and 3) by using a variety of pneumatically operated components that are inherently low particle generating, such as, but not limited to, substrate floatation tables, air bearings, and pneumatically operated robots and the like. According to various specific embodiments of a gas encapsulation system according to the present teachings, a substantially low particle environment can include a particle control system including components for providing a low particle zone proximate to a substrate during printing.

如本文中隨後將更詳細地論述,對最接近基板的粒子產生進行直接控制以提供最接近基板之低粒地帶可藉由圍阻粒子產生元件、藉由使用低粒產生組件及藉由圍阻粒子產生與使用低粒產生組件之組合來實施。因此,氣體封裝系統之各種具體實例可具有一粒子控制系統,其可包括與用於相對於基板移動印刷頭組裝件之低粒產生X軸線性軸承系統流體連通之一氣體循環及過濾系統、一服務束外殼排氣系統及一印刷頭組裝件排氣系統。對於服務束外殼排氣系統及印刷頭組裝件排氣系統之各種具體實例,此等系統中圍阻之粒子可排出至氣體循環及過濾系統內。在服務束外殼排氣系統及印刷頭組裝件排氣系統之各種具體實例中,此等系統中圍阻之粒子可排氣至死空間內,藉此致使此顆粒物如此排出至不可用於在氣體封裝系統內循環之死空間內。As will be discussed in greater detail later herein, direct control of particle generation proximate to the substrate to provide a low particle zone proximate to the substrate can be implemented by containing particle generation elements, by using low particle generation components, and by a combination of containing particle generation and using low particle generation components. Thus, various embodiments of a gas encapsulation system can have a particle control system that can include a gas circulation and filtration system in fluid communication with a low particle generation X-axis linear bearing system for moving a print head assembly relative to a substrate, a service bundle enclosure exhaust system, and a print head assembly exhaust system. For various embodiments of the service bundle enclosure exhaust system and the print head assembly exhaust system, particles trapped in these systems can be exhausted into the gas circulation and filtration system. In various specific examples of service bundle enclosure exhaust systems and print head assembly exhaust systems, particles contained in such systems may be exhausted into dead space, thereby causing such particulate matter to be exhausted into the dead space and not be available for circulation within the gas enclosure system.

另外,可針對空中及基板上粒子監視執行系統驗證以及持續進行中之系統監視。可使用(例如)攜帶型粒子計數器件在印刷製程前針對氣體封裝系統之各種具體實例執行空中顆粒物之判定,作為品質檢查。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行空中顆粒物之判定,作為持續進行中之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行空中顆粒物之判定,作為品質檢查。可使用(例如)測試基板在印刷基板前針對氣體封裝系統之各種具體實例執行在基板上的顆粒物的基板上分佈之判定,用於系統驗證。在氣體封裝系統之各種具體實例中,可(例如)使用安裝於X軸托架組裝件上之相機組裝件當印刷基板時在原地執行顆粒物之基板上分佈之判定,作為持續進行中之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行顆粒物之基板上分佈之判定,用於系統驗證。Additionally, system validation and ongoing system monitoring can be performed for both airborne and on-substrate particle monitoring. Airborne particle determination can be performed for various instances of gas packaging systems as a quality check prior to the printing process using, for example, a portable particle counting device. In various instances of gas packaging systems, airborne particle determination can be performed in situ while the substrate is being printed as an ongoing quality check. For various instances of gas packaging systems, airborne particle determination can be performed prior to printing the substrate and additionally in situ while the substrate is being printed as a quality check. Determination of the on-substrate distribution of particles on a substrate can be performed for various embodiments of a gas packaging system, for example, using a test substrate prior to printing the substrate for system validation. In various embodiments of a gas packaging system, determination of the on-substrate distribution of particles can be performed in situ while printing the substrate, for example, using a camera assembly mounted on an X-axis carriage assembly, as an ongoing quality check. Determination of the on-substrate distribution of particles can be performed for various embodiments of a gas packaging system, for system validation, prior to printing the substrate and additionally in situ while printing the substrate.

氣體封裝系統之各種具體實例可具有可維持實質上低粒環境之一粒子控制系統,從而提供用於在約0.1 μm或更大至約10 μm或更大之間的粒子之基板上粒子規範。對於目標粒徑範圍中之每一者,基板上粒子規範之各種具體實例可易於自每分鐘每平方公尺基板之平均基板上粒子分佈轉換至每分鐘每基板之平均基板上粒子分佈。如本文中先前所論述,可易於經由基板(例如,具體代大小之基板)與彼基板代之對應面積之間的已知關係進行此轉換。另外,可易於將每分鐘每平方公尺基板之平均基板上粒子分佈轉換至多種單位時間表達中之任何者。舉例而言,除了在標準時間單位(例如,秒、分鐘及天)之間的轉換外,亦可使用與處理具體有關之時間單位。舉例而言,如本文中先前所論述,印刷循環可與時間單位相關聯。Various embodiments of the gas packaging system can have a particle control system that can maintain a substantially low particle environment, thereby providing an on-substrate particle specification for particles between about 0.1 μm or greater to about 10 μm or greater. For each of the target particle size ranges, various embodiments of the on-substrate particle specification can be easily converted from an average on-substrate particle distribution per square meter of substrate per minute to an average on-substrate particle distribution per substrate per minute. As previously discussed herein, this conversion can be easily performed via a known relationship between a substrate (e.g., a substrate of a particular generation size) and the corresponding area of that substrate generation. In addition, the average on-substrate particle distribution per square meter of substrate per minute can be easily converted to any of a variety of unit time expressions. For example, in addition to conversions between standard time units (e.g., seconds, minutes, and days), process-specific time units may also be used. For example, as discussed previously herein, a print cycle may be associated with a time unit.

本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於10 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於2 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。對於本教示之氣體封裝系統之各種具體實例,可維持低粒環境,從而對於大小大於或等於0.3 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 10 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 5 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 2 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 1 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.5 μm. For various embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.3 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per minute per square meter of substrate for particles greater than or equal to 0.1 μm in size.

另外,預期氣體封裝系統將具有包括(例如但不限於)氣體封裝組裝件之屬性,該氣體封裝組裝件可易於按比例調整以提供用於OLED印刷系統之最佳化工作空間,同時提供最小化之惰性氣體容積,且另外提供易於在處理期間自外部接取OLED印刷系統,同時提供對內部之接取以進行維護同時停機時間最小。在此點上,可用於需要惰性環境之各種空氣敏感製程的氣體封裝組裝件之各種具體實例可包括可密封在一起之複數個壁框及頂板框構件。在一些具體實例中,可使用可重新使用之扣件(例如,螺釘及螺紋孔)將複數個壁框及頂板框構件緊固在一起。對於根據本教示的氣體封裝組裝件之各種具體實例,可建構複數個框構件(每一框構件包含複數個面板框區段)以界定氣體封裝框組裝件。氣體封裝組裝件之各種具體實例可包括建構為氣體封裝組裝件之一區段的一輔助封裝,其可與氣體封裝系統(諸如,印刷系統封裝)之工作容積可密封地隔離。輔助封裝與(例如)印刷系統封裝之此實體隔離可使得能夠進行各種程序(例如但不限於對印刷頭組裝件之各種維護程序)而極少打斷或不打斷印刷製程,藉此最小化或消除氣體封裝系統停機時間。In addition, it is contemplated that the gas packaging system will have properties including, for example but not limited to, a gas packaging assembly that can be easily scaled to provide an optimized workspace for an OLED printing system while providing a minimized inert gas volume, and additionally provide easy access to the OLED printing system from the outside during processing while providing access to the inside for maintenance with minimal downtime. In this regard, various specific examples of gas packaging assemblies that can be used for various air-sensitive processes requiring an inert environment can include a plurality of wall frames and ceiling frame components that can be sealed together. In some specific examples, the plurality of wall frames and ceiling frame components can be fastened together using reusable fasteners (e.g., screws and threaded holes). For various specific embodiments of a gas packaging assembly according to the present teachings, a plurality of frame members (each frame member including a plurality of panel frame sections) may be constructed to define a gas packaging frame assembly. Various specific embodiments of the gas packaging assembly may include an auxiliary package constructed as a section of the gas packaging assembly, which may be sealably isolated from the working volume of the gas packaging system (e.g., printing system package). This physical isolation of the auxiliary package from (e.g.) the printing system package may enable various procedures (e.g., but not limited to, various maintenance procedures for the print head assembly) to be performed with little or no interruption to the printing process, thereby minimizing or eliminating gas packaging system downtime.

本教示之氣體封裝組裝件可經設計以按可使系統周圍之封裝之容積最小化的方式容納一印刷系統(諸如,OLED印刷系統)。可按使氣體封裝組裝件之內部容積最小化且同時最佳化工作空間以容納各種OLED印刷系統之各種佔據面積的方式建構氣體封裝組裝件之各種具體實例。根據本教示之氣體封裝系統之各種具體實例的OLED印刷系統可包含(例如)花崗岩基底、可支撐OLED印刷器件之可移動橋、自加壓之惰性氣體再循環系統之各種具體實例運作之一或多個器件及裝置,諸如,基板浮動台、空氣軸承、軌道、軌、用於將OLED膜形成材料沈積至基板上之噴墨印刷機系統(包括OLED墨水供應子系統及噴墨印刷頭)、一或多個機器人及類似者。考慮到可組成OLED印刷系統的多種組件,OLED印刷系統之各種具體實例可具有多種佔據面積及外觀尺寸。如此建構的氣體封裝組裝件之各種具體實例另外使得易於在處理期間自外部接取氣體封裝組裝件之內部及易於接取內部以進行維護,同時使停機時間最小化。在此點上,根據本教示的氣體封裝組裝件之各種具體實例可具有關於各種OLED印刷系統之各種佔據面積的輪廓。根據各種具體實例,一旦輪廓化框構件經建構以形成氣體封裝框組裝件,則各種類型之面板可被可密封地裝設於組成框構件之複數個面板區段中以完成氣體封裝組裝件之裝設。在氣體封裝組裝件之各種具體實例中,包括(例如但不限於)複數個壁框構件及至少一頂板框構件之複數個框構件以及用於裝設於面板框區段中之複數個面板可在一或多個位置處加以製造,且接著在另一位置處加以建構。此外,考慮到用以建構本教示之氣體封裝組裝件的組件之可輸送本質,可經由建構及解構之循環重複地裝設及移除氣體封裝組裝件之各種具體實例。The gas encapsulation assembly of the present teachings can be designed to house a printing system (e.g., an OLED printing system) in a manner that minimizes the volume of the package surrounding the system. Various specific embodiments of the gas encapsulation assembly can be constructed in a manner that minimizes the internal volume of the gas encapsulation assembly while optimizing the working space to accommodate various footprints of various OLED printing systems. OLED printing systems according to various embodiments of the gas encapsulation system of the present teachings may include, for example, a granite substrate, a movable bridge that can support OLED printing devices, one or more devices and apparatuses that operate in various embodiments of a self-pressurized inert gas recirculation system, such as a substrate floating stage, air bearings, rails, rails, an inkjet printer system (including an OLED ink supply subsystem and an inkjet printing head) for depositing OLED film-forming materials onto a substrate, one or more robots, and the like. Considering the various components that can make up an OLED printing system, various embodiments of an OLED printing system may have a variety of footprints and external dimensions. Various embodiments of the gas packaging assembly so constructed additionally provide for easy external access to the interior of the gas packaging assembly during processing and easy access to the interior for maintenance while minimizing downtime. In this regard, various embodiments of the gas packaging assembly according to the present teachings may have various footprint profiles for various OLED printing systems. According to various embodiments, once the contoured frame member is constructed to form the gas packaging frame assembly, various types of panels may be sealably installed in the plurality of panel sections that make up the frame member to complete the installation of the gas packaging assembly. In various embodiments of the gas packaging assembly, a plurality of frame members including, for example but not limited to, a plurality of wall frame members and at least one ceiling frame member and a plurality of panels for installation in the panel frame section can be manufactured at one or more locations and then constructed at another location. In addition, considering the transportable nature of the components used to construct the gas packaging assembly of the present teachings, various embodiments of the gas packaging assembly can be repeatedly installed and removed through cycles of construction and deconstruction.

為了確保氣體封裝被氣密封,本教示之氣體封裝組裝件之各種具體實例提供接合每一框構件以提供框密封。可藉由各種框構件(其可包括墊片或其他密封件)之間的緊密配合相交來充分密封(例如,氣密封)內部。一旦經完全建構,密封之氣體封裝組裝件可包含一內部及複數個內部拐角邊緣,至少一內部拐角邊緣設在每一框構件與鄰近框構件之相交處。框構件中之一或多者(例如,框構件之至少一半)可包含沿著其一或多個各別邊緣固定之一或多個可壓縮墊片。該一或多個可壓縮墊片可經組態以一旦將複數個框構件接合在一起且裝設了氣密性面板,則創造氣密封之氣體封裝組裝件。可形成具有由複數個可壓縮墊片密封的框構件之拐角邊緣之經密封氣體封裝組裝件。對於每一框構件,例如(但不限於),內部壁框表面、頂部壁框表面、垂直側壁框表面、底部壁框表面及其組合可具備一或多個可壓縮墊片。In order to ensure that the gas package is hermetically sealed, various specific examples of the gas package assembly of the present teaching provide for joining each frame member to provide a frame seal. The interior can be fully sealed (e.g., hermetically sealed) by a close fit intersection between various frame members (which may include gaskets or other seals). Once fully constructed, the sealed gas package assembly may include an interior and a plurality of interior corner edges, at least one interior corner edge being located at the intersection of each frame member and an adjacent frame member. One or more of the frame members (e.g., at least half of the frame members) may include one or more compressible gaskets fixed along one or more of their respective edges. The one or more compressible gaskets may be configured to create an airtight gas-enclosed assembly once the plurality of frame members are joined together and the airtight panels are installed. A sealed gas-enclosed assembly having corner edges of frame members sealed by the plurality of compressible gaskets may be formed. For each frame member, for example (but not limited to), the interior wall frame surface, the top wall frame surface, the vertical side wall frame surface, the bottom wall frame surface, and combinations thereof may be provided with one or more compressible gaskets.

對於氣體封裝組裝件之各種具體實例,每一框構件可包含複數個區段,其經成框及製造以收納可被可密封地裝設於每一區段中的多種面板類型中之任何者以針對每一面板提供氣密性面板密封。在本教示之氣體封裝組裝件之各種具體實例中,每一區段框可具有一區段框墊片,其與選定扣件一起確保裝設於每一區段框中之每一面板可為每一面板且因此為完全建構之氣體封裝提供氣密性密封。在各種具體實例中,氣體封裝組裝件可在壁面板中之每一者中具有窗面板或保養窗中之一或多者;其中每一窗面板或保養窗可具有至少一手套端口。在氣體封裝組裝件之組裝期間,每一手套端口可具有附接之手套,使得手套可延伸至內部。根據各種具體實例,每一手套端口可具有用於安裝手套之硬體,其中此硬體利用在每一手套端口周圍之墊片密封,其提供氣密性密封以使經由手套端口的洩漏或分子擴散最小化。對於本教示之氣體封裝組裝件之各種具體實例,進一步設計了硬體以為終端使用者提供將手套端口蓋住及開蓋之容易性。For various specific examples of gas encapsulation assemblies, each frame member may include a plurality of sections that are framed and manufactured to accommodate any of a variety of panel types that can be sealably installed in each section to provide an airtight panel seal for each panel. In various specific examples of gas encapsulation assemblies of the present teachings, each section frame may have a section frame gasket that, together with selected fasteners, ensures that each panel installed in each section frame can provide an airtight seal for each panel and therefore for the fully constructed gas encapsulation. In various specific examples, the gas encapsulation assembly may have one or more of a window panel or a maintenance window in each of the wall panels; wherein each window panel or maintenance window may have at least one glove port. During assembly of the gas encapsulation assembly, each glove port may have an attached glove so that the glove can extend to the interior. According to various embodiments, each glove port may have hardware for mounting a glove, wherein the hardware utilizes a gasket seal around each glove port that provides an airtight seal to minimize leakage or molecular diffusion through the glove port. For various embodiments of the gas containment assembly of the present teachings, the hardware is further designed to provide ease of capping and uncapping of the glove ports for the end user.

根據本教示的氣體封裝系統之各種具體實例可包括自複數個框構件及面板區段形成之氣體封裝組裝件以及氣體循環、過濾及淨化組件。對於氣體封裝系統之各種具體實例,可在組裝過程期間裝設管道系統。根據本教示之各種具體實例,管道系統可裝設於已自複數個框構件建構之氣體封裝框組裝件內。在各種具體實例中,在將複數個框構件接合以形成氣體封裝框組裝件前,可將管道系統裝設於框構件上。用於氣體封裝系統之各種具體實例的管道系統可經組態,使得自一或多個管道系統入口吸入至管道系統內之實質上所有氣體被移動經過用於移除在氣體封裝系統內部之顆粒物的氣體過濾迴路之各種具體實例。另外,氣體封裝系統之各種具體實例之管道系統可經組態以將在氣體封裝組裝件外部的氣體淨化迴路之入口及出口與在氣體封裝組裝件內部的氣體過濾迴路分開。根據本教示之氣體封裝系統之各種具體實例,氣體循環及過濾系統可與(例如但不限於)粒子控制系統之組件流體連通。對於氣體封裝組裝件之各種具體實例,氣體循環及過濾系統可與服務束外殼排氣系統流體連通。對於氣體封裝組裝件之各種具體實例,氣體循環及過濾系統可與印刷頭組裝件排氣系統流體連通。在氣體封裝系統之各種具體實例中,與氣體循環及過濾系統流體連通的粒子控制系統之各種組件可提供最接近定位於印刷系統中之基板的低粒地帶。Various embodiments of a gas packaging system according to the present teachings may include a gas packaging assembly formed from a plurality of frame members and panel sections and a gas circulation, filtering and purification assembly. For various embodiments of a gas packaging system, a duct system may be installed during the assembly process. According to various embodiments of the present teachings, a duct system may be installed in a gas packaging frame assembly that has been constructed from a plurality of frame members. In various embodiments, the duct system may be installed on the frame members before the plurality of frame members are joined to form the gas packaging frame assembly. The piping system for various embodiments of the gas packaging system can be configured so that substantially all gas drawn into the piping system from one or more piping system inlets is moved through various embodiments of a gas filtration loop for removing particulate matter within the gas packaging system. In addition, the piping system for various embodiments of the gas packaging system can be configured to separate the inlet and outlet of the gas purification loop outside the gas packaging assembly from the gas filtration loop inside the gas packaging assembly. According to various embodiments of the gas packaging system of the present teachings, the gas circulation and filtration system can be fluidly connected to components of (for example, but not limited to) a particle control system. For various embodiments of the gas packaging assembly, the gas circulation and filtration system can be in fluid communication with a service bundle enclosure exhaust system. For various embodiments of the gas packaging assembly, the gas circulation and filtration system can be in fluid communication with a print head assembly exhaust system. In various embodiments of the gas packaging system, various components of the particle control system in fluid communication with the gas circulation and filtration system can provide a low particle zone proximate to a substrate positioned in a printing system.

舉例而言,氣體封裝系統可具有在氣體封裝組裝件內部之氣體循環及過濾系統。此內部過濾系統可具有在內部之複數個風扇過濾器單元,且可經組態以提供氣體在內部之層流。層流可在自內部之頂部至內部之底部的方向上,或在任一其他方向上。雖然由循環系統產生的氣體之流動不需要為分層的,但氣體之層流可用以確保內部的氣體之澈底且完全更新。氣體之層流亦可用以使亂流最小化,此亂流係不良的,因為其可使環境中之粒子收集於此等亂流區域中,從而防止過濾系統自環境中移除彼等粒子。另外,為了維持內部的所要溫度,可提供利用複數個熱交換器之一熱調節系統,例如,與風扇或另一氣體循環器件一起操作、鄰近風扇或另一氣體循環器件或與風扇或另一氣體循環器件相結合使用。氣體淨化迴路可經組態以使來自氣體封裝組裝件之內部的氣體循環經過在封裝外部之至少一氣體淨化組件。在此點上,與在氣體封裝組裝件外部之氣體淨化迴路相結合的在氣體封裝組裝件內部之循環及過濾系統可提供具有實質上低含量之反應性物質的實質上低粒惰性氣體在整個氣體封裝系統中的連續循環。具有氣體淨化系統的氣體封裝系統之各種具體實例可經組態以維持非常低含量之不當組分,例如,有機溶劑及其蒸氣,以及水、水蒸氣、氧及類似者。For example, a gas packaging system may have a gas circulation and filtering system inside the gas packaging assembly. This internal filtering system may have a plurality of fan filter units inside, and may be configured to provide laminar flow of gas inside. The laminar flow may be in the direction from the top of the inside to the bottom of the inside, or in any other direction. Although the flow of gas produced by the circulation system does not need to be laminar, the laminar flow of gas can be used to ensure thorough and complete renewal of the gas inside. The laminar flow of gas can also be used to minimize turbulence, which is undesirable because it can cause particles in the environment to collect in these turbulent areas, thereby preventing the filtering system from removing those particles from the environment. Additionally, in order to maintain the desired temperature inside, a thermal regulation system utilizing a plurality of heat exchangers may be provided, for example, operating in conjunction with, adjacent to, or in combination with a fan or another gas circulation device. The gas purification loop may be configured to circulate gas from the interior of the gas packaging assembly through at least one gas purification assembly outside the package. In this regard, a circulation and filtration system within the gas packaging assembly combined with a gas purification loop outside the gas packaging assembly may provide continuous circulation of a substantially low-particle inert gas having a substantially low content of reactive species throughout the gas packaging system. Various embodiments of gas containment systems having gas purification systems can be configured to maintain very low levels of undesirable components, such as organic solvents and their vapors, as well as water, water vapor, oxygen, and the like.

除了提供氣體循環、過濾及淨化組件之外,管道系統亦可經定大小及成形以在其中容納至少一服務束。根據本教示,服務束可包括(例如但不限於)光纜、電纜、電線以及各種含有流體之管系及類似者。本教示之服務束之各種具體實例可具有由形成於服務束之各種組件之間的空隙空間創造的相當大之死體積。可在各種光纜、電纜、電線及含有流體之管系之集束中創造的實質死體積可具有截獲於空隙空間中的大量反應性大氣物質(諸如,水、水蒸氣、氧及類似者)。此大量堵塞之反應性大氣物質可難以由淨化系統快速移除。另外,此等服務束為確定之顆粒物源。在一些具體實例中,纜線、電線及電線束及含有流體之管系中之任何者的組合可實質上安置於管道系統內,且可分別操作性地與收容於氣體封裝系統內之光學系統、電系統、機械系統及冷卻系統中之至少一者相關聯。因為氣體循環、過濾及淨化組件可經組態使得基本上所有循環之惰性氣體被抽吸經過管道系統,所以可藉由使此等捆紮之組件實質上圍阻於管道系統內來有效地移除自此等束引起之顆粒物以及截獲於各種捆紮材料之死體積中的大氣構成物。In addition to providing gas circulation, filtering and purification components, the piping system may also be sized and shaped to accommodate at least one service bundle therein. According to the present teachings, the service bundle may include, for example but not limited to, optical cables, electrical cables, wires, and various fluid-containing piping and the like. Various specific examples of the service bundle of the present teachings may have a considerable dead volume created by the void spaces formed between the various components of the service bundle. The substantial dead volume that may be created in the bundles of various optical cables, electrical cables, wires, and fluid-containing piping may have a large amount of reactive atmospheric material (e.g., water, water vapor, oxygen, and the like) trapped in the void spaces. This large amount of clogged reactive atmospheric material may be difficult to remove quickly by the purification system. Additionally, these service bundles are a definite source of particulate matter. In some embodiments, any combination of cables, wires and wire bundles and tubing containing fluids may be substantially disposed within the duct system and may be operatively associated with at least one of the optical system, electrical system, mechanical system, and cooling system contained within the gas enclosure system, respectively. Because the gas circulation, filtering and purification components may be configured so that substantially all of the circulating inert gas is drawn through the duct system, particulate matter arising from such bundles, as well as atmospheric constituents trapped in the dead volume of various bundled materials, may be effectively removed by substantially enclosing such bundled components within the duct system.

根據本教示的氣體封裝系統之各種具體實例可包括自複數個框構件及面板區段形成之氣體封裝組裝件以及粒子控制系統、氣體循環、過濾及淨化組件,以及加壓之惰性氣體再循環系統之各種具體實例。此加壓之惰性氣體再循環系統可用於用於各種氣動驅動式器件及裝置之OLED印刷系統的操作中,如本文中隨後將更詳細地論述。Various embodiments of gas packaging systems according to the present teachings may include gas packaging assemblies formed from a plurality of frame members and panel sections, as well as various embodiments of particle control systems, gas circulation, filtering and purification components, and pressurized inert gas recirculation systems. Such pressurized inert gas recirculation systems may be used in the operation of OLED printing systems for various pneumatically driven devices and apparatuses, as will be discussed in greater detail later herein.

根據本教示,解決了若干工程設計挑戰,以便提供在氣體封裝系統中的加壓之惰性氣體再循環系統之各種具體實例。首先,在無加壓之惰性氣體再循環系統的氣體封裝系統之典型操作中,可將氣體封裝系統維持於相對於外部壓力稍微正之內部壓力下,以便在氣體封裝系統中出現出任何洩漏時防止外部氣體或空氣進入內部。舉例而言,在典型操作下,對於本教示之氣體封裝系統之各種具體實例,可將氣體封裝系統之內部維持在相對於在封裝系統外部之周圍大氣的(例如)至少2 mbarg之壓力下,例如,至少4 mbarg之壓力下、至少6 mbarg之壓力下、至少8 mbarg之壓力下或更高壓力下。維持氣體封裝系統內的加壓之惰性氣體再循環系統可為挑戰性的,因為其呈現關於維持氣體封裝系統之稍微正內部壓力,同時持續地將加壓氣體引入至氣體封裝系統內的動態且進行中之平衡動作。另外,各種器件及裝置之可變需求可對於本教示之各種氣體封裝組裝件及系統創造不規則壓力分佈。在此等條件下維持保持於相對於外部環境之稍微正壓力下的氣體封裝系統之動態壓力平衡可提供正在進行中之OLED印刷製程之完整性。According to the present teachings, several engineering design challenges are solved in order to provide various specific examples of a pressurized inert gas recirculation system in a gas packaging system. First, in typical operation of a gas packaging system without a pressurized inert gas recirculation system, the gas packaging system can be maintained at an internal pressure that is slightly positive relative to the external pressure to prevent external gas or air from entering the interior in the event of any leak in the gas packaging system. For example, under typical operation, for various specific embodiments of the gas packaging system of the present teachings, the interior of the gas packaging system can be maintained at a pressure of, for example, at least 2 mbarg relative to the surrounding atmosphere outside the packaging system, such as at least 4 mbarg, at least 6 mbarg, at least 8 mbarg, or more. Maintaining a pressurized inert gas recirculation system within a gas packaging system can be challenging because it presents a dynamic and ongoing balancing act regarding maintaining a slightly positive internal pressure of the gas packaging system while continuously introducing pressurized gas into the gas packaging system. Additionally, the varying demands of various devices and installations can create irregular pressure distributions for the various gas encapsulation assemblies and systems of the present teachings. Maintaining a dynamic pressure balance of the gas encapsulation system, which is kept at a slightly positive pressure relative to the external environment under these conditions, can improve the integrity of the ongoing OLED printing process.

對於氣體封裝系統之各種具體實例,根據本教示的加壓之惰性氣體再循環系統可包括可利用壓縮機、積貯器及吹風機及其組合中之至少一者的加壓之惰性氣體迴路之各種具體實例。包括加壓之惰性氣體迴路之各種具體實例的加壓之惰性氣體再循環系統之各種具體實例可具有一特殊設計之壓力控制式旁路迴路,其可提供在本教示之氣體封裝系統中的惰性氣體之處於穩定定義值的內部壓力。在氣體封裝系統之各種具體實例中,加壓之惰性氣體再循環系統可經組態以當加壓之惰性氣體迴路之積貯器中的惰性氣體之壓力超過預設定之臨限壓力時經由壓力控制式旁路迴路使加壓之惰性氣體再循環。臨限壓力可(例如)在自約25 psig至約200 psig之間的範圍內,或更具體言之,在約75 psig至約125 psig之間的範圍內,或更具體言之,在約90 psig至約95 psig之間的範圍內。在此點上,具有具特殊設計之壓力控制式旁路迴路之各種具體實例的加壓之惰性氣體再循環系統的本教示之氣體封裝系統可維持在氣密封之氣體封裝中具有加壓之惰性氣體再循環系統的平衡。For various embodiments of the gas packaging system, the pressurized inert gas recirculation system according to the present teachings may include various embodiments of a pressurized inert gas loop that may utilize at least one of a compressor, an accumulator, and a blower, and combinations thereof. Various embodiments of the pressurized inert gas recirculation system including various embodiments of the pressurized inert gas loop may have a specially designed pressure-controlled bypass loop that can provide an internal pressure of the inert gas in the gas packaging system of the present teachings at a stable defined value. In various specific examples of the gas packaging system, the pressurized inert gas recirculation system can be configured to recirculate the pressurized inert gas through a pressure-controlled bypass loop when the pressure of the inert gas in the reservoir of the pressurized inert gas loop exceeds a preset critical pressure. The critical pressure can be, for example, in the range from about 25 psig to about 200 psig, or more specifically, in the range from about 75 psig to about 125 psig, or more specifically, in the range from about 90 psig to about 95 psig. In this regard, the gas enclosure system of the present teachings having a pressurized inert gas recirculation system of various embodiments with a specially designed pressure-controlled bypass loop can maintain a balance of the pressurized inert gas recirculation system in a hermetically sealed gas enclosure.

根據本教示,各種器件及裝置可安置於內部且與具有可利用多種加壓之氣體源(諸如,壓縮機、吹風機及其組合中之至少一者)的各種加壓之惰性氣體迴路的加壓之惰性氣體再循環系統之各種具體實例流體連通。對於本教示之氣體封裝及系統之各種具體實例,各種氣動操作式器件及裝置之使用可提供低粒產生效能,以及為低維護性的。可安置於氣體封裝系統之內部且與各種加壓之惰性氣體迴路流體連通的例示性器件及裝置可包括(例如但不限於)氣動機器人、基板浮動台、空氣軸承、空氣襯套、壓縮氣體工具、氣動致動器及其組合中之一或多者。基板浮動台以及空氣軸承可用於操作根據本教示之氣體封裝系統之各種具體實例的OLED印刷系統之各種態樣。舉例而言,利用空氣軸承技術之基板浮動台可用以將基板輸送至印刷頭腔室中之位置,以及在OLED印刷製程期間支撐基板。According to the present teachings, various devices and apparatus may be disposed within and in fluid communication with various embodiments of a pressurized inert gas recirculation system having various pressurized inert gas loops that may utilize a variety of pressurized gas sources (e.g., at least one of a compressor, a blower, and combinations thereof). For various embodiments of the gas packaging and systems of the present teachings, the use of various pneumatically operated devices and apparatus may provide low particle yield performance, as well as be low maintenance. Exemplary devices and apparatus that may be disposed within the interior of a gas packaging system and in fluid communication with various pressurized inert gas loops may include, for example but not limited to, one or more of a pneumatic robot, a substrate floatation stage, an air bearing, an air bushing, a compressed gas tool, a pneumatic actuator, and combinations thereof. The substrate floatation stage and the air bearings may be used to operate various aspects of an OLED printing system in accordance with various specific embodiments of the gas packaging system of the present teachings. For example, a substrate floatation stage utilizing air bearing technology may be used to transport a substrate to a position in a print head chamber and to support the substrate during an OLED printing process.

圖1A為根據本教示之各種具體實例的氣體封裝組裝件100之右前部透視圖。氣體封裝組裝件100可與各種組件整合以提供本教示之氣體封裝系統之各種具體實例。本教示之氣體封裝系統可含有用於維持氣體封裝組裝件內部中的惰性環境之一或多種氣體,以及用於維持實質上低粒環境之組件。藉由非限制性實例,氣體封裝系統之各種具體實例可具有可包括一氣體循環及過濾系統之一粒子控制系統以及用於自再循環之惰性氣體移除反應性物質的淨化組件,且可具有加壓之惰性氣體再循環系統之各種具體實例。因而本教示之氣體封裝系統之各種具體實例可適用於維持內部中的惰性、實質上低粒氣體氣氛。FIG. 1A is a right front perspective view of a gas packaging assembly 100 according to various embodiments of the present teachings. The gas packaging assembly 100 can be integrated with various components to provide various embodiments of the gas packaging system of the present teachings. The gas packaging system of the present teachings may contain one or more gases for maintaining an inert environment inside the gas packaging assembly, and components for maintaining a substantially low particle environment. By way of non-limiting example, various embodiments of the gas packaging system may have a particle control system that may include a gas circulation and filtration system and a purification component for removing reactive substances from the recycled inert gas, and may have various embodiments of a pressurized inert gas recycling system. Thus, various embodiments of the gas containment system taught herein may be adapted for maintaining an inert, substantially low-particle gas atmosphere within an interior.

舉例而言,圖1B為氣體封裝系統500之各種具體實例之左前部透視圖。圖1B描繪可包括氣體封裝組裝件100之各種具體實例的氣體封裝系統500。氣體封裝系統500可具有負載鎖定之入口腔室1110,其可具有入口閘1112。圖1B之氣體封裝系統500可包括一氣體淨化系統3130,其用於給氣體封裝組裝件100提供具有實質上低含量的反應性大氣物質(諸如,水蒸氣及氧)以及自OLED印刷製程產生之有機溶劑蒸氣之惰性氣體之恆定供應。根據本教示,惰性氣體可為在一組定義之條件下不經歷化學反應之任何氣體。惰性氣體之一些通用非限制性實例可包括氮、稀有氣體中之任何者及其任何組合。根據本教示的氣體淨化系統之各種具體實例(諸如,圖1B之氣體淨化系統3130)可將包括各種反應性大氣源氣體(諸如,水蒸氣及氧)以及有機溶劑蒸氣的各種反應性物質中之每一物質之含量維持處於100 ppm或更低,例如,處於10 ppm或更低,處於1.0 ppm或更低,或處於0.1 ppm或更低。For example, Figure 1B is a left front perspective view of various specific embodiments of the gas packaging system 500. Figure 1B depicts a gas packaging system 500 that may include various specific embodiments of the gas packaging assembly 100. The gas packaging system 500 may have a load-locked inlet chamber 1110, which may have an inlet gate 1112. The gas packaging system 500 of Figure 1B may include a gas purification system 3130, which is used to provide the gas packaging assembly 100 with a constant supply of an inert gas having a substantially low content of reactive atmospheric species (e.g., water vapor and oxygen) and organic solvent vapor generated from the OLED printing process. According to the present teachings, an inert gas can be any gas that does not undergo a chemical reaction under a set of defined conditions. Some general non-limiting examples of inert gases may include any of nitrogen, noble gases, and any combination thereof. Various specific examples of gas purification systems according to the present teachings (e.g., gas purification system 3130 of FIG. 1B ) may maintain the content of each of various reactive substances including various reactive atmospheric source gases (e.g., water vapor and oxygen) and organic solvent vapor at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

圖1B之氣體封裝系統500亦可具有用於系統控制功能之控制器系統1130。舉例而言,系統控制器1130可包括與一或多個記憶體電路(圖中未示)通信之一或多個處理器電路(圖中未示)。系統控制器1130亦可與負載鎖定之入口腔室1110、出口腔室(圖中未示)且最終與OLED印刷系統之印刷噴嘴連通,入口腔室、出口腔室及印刷噴嘴可收容於氣體封裝系統500中。以此方式,系統控制器1130可協調(例如)負載鎖定之入口腔室1110中的閘1112之打開以允許基板進入至氣體封裝系統500內。系統控制器1130可控制多種系統功能,諸如,控制施配至OLED印刷系統之印刷噴嘴的墨水。圖1B之氣體封裝系統500經組態以涵蓋且保護空氣敏感製程,諸如,使用工業印刷系統的適用於創造OLED堆疊的多種墨水之印刷。對於OLED墨水有反應性的大氣源氣體之實例包括水蒸氣及氧,以及來自用作(例如)各種OLED墨水之載劑的有機溶劑之多種有機蒸氣。如本文中先前所論述,氣體封裝組裝件100可經組態以維持密封之氣氛且允許組件或印刷系統有效地操作,同時氣體封裝系統500可提供對於維持惰性環境所必要之所有組件。另外,氣體封裝500可具有一粒子控制系統,其提供最接近基板之低粒地帶,該系統可包括諸如(藉由非限制性實例)以下各者之組件:氣體循環及過濾系統、用於相對於基板移動印刷頭組裝件之低粒產生X軸線性軸承系統、服務束外殼排氣系統及印刷頭組裝件排氣系統。The gas packaging system 500 of FIG. 1B may also have a controller system 1130 for system control functions. For example, the system controller 1130 may include one or more processor circuits (not shown) in communication with one or more memory circuits (not shown). The system controller 1130 may also be in communication with a load-locked entrance chamber 1110, an exit chamber (not shown), and ultimately a print nozzle of an OLED printing system, which may be housed in the gas packaging system 500. In this way, the system controller 1130 may coordinate the opening of a gate 1112 in, for example, a load-locked entrance chamber 1110 to allow a substrate to enter the gas packaging system 500. The system controller 1130 can control a variety of system functions, such as controlling the ink dispensed to the print nozzle of the OLED printing system. The gas encapsulation system 500 of Figure 1B is configured to contain and protect air sensitive processes, such as the printing of a variety of inks suitable for creating OLED stacks using an industrial printing system. Examples of atmospheric source gases that are reactive to OLED inks include water vapor and oxygen, as well as a variety of organic vapors from organic solvents used as, for example, carriers for various OLED inks. As previously discussed herein, the gas encapsulation assembly 100 can be configured to maintain a sealed atmosphere and allow the assembly or printing system to operate efficiently, while the gas encapsulation system 500 can provide all components necessary to maintain an inert environment. In addition, the gas package 500 may have a particle control system that provides a low particle zone closest to the substrate, which system may include components such as (by way of non-limiting example) the following: a gas circulation and filtration system, a low particle generating X-axis linear bearing system for moving the print head assembly relative to the substrate, a service bundle enclosure exhaust system, and a print head assembly exhaust system.

如圖1A中所描繪,氣體封裝組裝件100之各種具體實例可包含包括以下各者之組件零件:前或第一壁面板210'、左或第二壁面板(圖中未示)、右或第三壁面板230'、後或第四壁面板(圖中未示)及頂板面板250',該氣體封裝組裝件可附接至擱置於基底(圖中未示)上之底盤204。如本文中隨後將更詳細地論述,圖1A之氣體封裝組裝件100之各種具體實例可自前或第一壁框210、左或第二壁框(圖中未示)、右或第三壁框230、後或第四壁面板(圖中未示)及頂板框250建構。頂板框250之各種具體實例可包括風扇過濾器單元蓋103,以及第一頂板框管道105及第一頂板框管道107。根據本教示之具體實例,可將各種類型之區段面板裝設於組成框構件之複數個面板區段中的任何者中。在圖1之氣體封裝100之各種具體實例中,可在框之建構期間將金屬薄片面板區段109焊接至框構件。對於氣體封裝組裝件100之各種具體實例,可經由氣體封裝組裝件之建構及解構之循環重複裝設及移除的區段面板之類型可包括插入面板110(如針對壁面板210'所指示)以及窗面板120及可易於移除之保養窗130(如針對壁面板230'所指示)。As depicted in FIG. 1A , various embodiments of the gas encapsulation assembly 100 may include component parts including a front or first wall panel 210 ′, a left or second wall panel (not shown), a right or third wall panel 230 ′, a rear or fourth wall panel (not shown), and a top panel 250 ′, which may be attached to a chassis 204 resting on a substrate (not shown). As will be discussed in more detail later herein, various embodiments of the gas encapsulation assembly 100 of FIG. 1A may be constructed from a front or first wall frame 210, a left or second wall frame (not shown), a right or third wall frame 230, a rear or fourth wall panel (not shown), and a top frame 250. Various specific examples of the top panel frame 250 may include a fan filter unit cover 103, and a first top panel frame duct 105 and a first top panel frame duct 107. According to specific examples of the present teachings, various types of section panels may be installed in any of the plurality of panel sections that make up the frame member. In various specific examples of the gas package 100 of FIG. 1 , the sheet metal panel section 109 may be welded to the frame member during construction of the frame. For various specific embodiments of the gas enclosure assembly 100, the types of segment panels that can be repeatedly installed and removed through the cycle of construction and deconstruction of the gas enclosure assembly may include an insertion panel 110 (as indicated for the wall panel 210') and a window panel 120 and an easily removable maintenance window 130 (as indicated for the wall panel 230').

雖然可易於移除之保養窗130可提供對封裝100之內部的容易接取,但可移除之任何面板可用以為了修理及定期保養之目的而提供對氣體封裝系統之內部的接取。用於保養或修理之此接取與由諸如窗面板120及可易於移除之保養窗130的面板提供之接取有所區別,諸如窗面板120及可易於移除之保養窗130的面板可向終端使用者提供在使用期間自氣體封裝組裝件之外部對氣體封裝組裝件之內部的手套接取。舉例而言,諸如附接至手套端口140之手套142(如在圖1A中針對面板230所展示)的手套中之任一者可向終端使用者提供在氣體封裝系統之使用期間對內部之接取。While the easily removable maintenance window 130 can provide easy access to the interior of the package 100, any removable panel can be used to provide access to the interior of the gas enclosure system for the purpose of repair and periodic maintenance. This access for maintenance or repair is distinguished from the access provided by panels such as the window panel 120 and the easily removable maintenance window 130, which can provide the end user with gloved access to the interior of the gas enclosure assembly from the outside of the gas enclosure assembly during use. For example, any of the gloves such as glove 142 attached to glove port 140 (as shown in FIG. 1A for panel 230) can provide the end user with access to the interior during use of the gas containment system.

圖2描繪如圖1A中描繪的氣體封裝組裝件之各種具體實例之分解圖。氣體封裝組裝件之各種具體實例可具有複數個壁面板,包括前壁面板210'之外部透視圖、左壁面板220'之外部透視圖、右壁面板230'之內部透視圖、後壁面板240'之內部透視圖及頂板面板250'之頂部透視圖,如在圖1A中所示,該等壁面板可附接至擱置於基底202上之底盤204。可將OLED印刷系統安裝於底盤204之上,該印刷製程已知為對大氣條件敏感。根據本教示,可自框構件(例如,壁面板210'之壁框210、壁面板220'之壁框220、壁面板230'之壁框230、壁面板240'之壁框240及頂板面板250'之頂板框250)建構氣體封裝組裝件,複數個區段面板接著可裝設於該等框構件中。在此點上,可能需要使可經由本教示之氣體封裝組裝件之各種具體實例之建構及解構的循環重複裝設及移除之區段面板之設計成流線型。此外,可設定氣體封裝組裝件100之輪廓以容納OLED印刷系統之各種具體實例之佔據面積,以便在氣體封裝組裝件之使用期間以及在維護期間使在氣體封裝組裝件中需要的惰性氣體之體積最小化,以及使終端使用者易於接取。FIG2 depicts an exploded view of various embodiments of the gas package assembly as depicted in FIG1A. Various embodiments of the gas package assembly may have a plurality of wall panels, including an exterior perspective view of a front wall panel 210', an exterior perspective view of a left wall panel 220', an interior perspective view of a right wall panel 230', an interior perspective view of a rear wall panel 240', and a top perspective view of a top panel 250', as shown in FIG1A, which may be attached to a chassis 204 resting on a substrate 202. An OLED printing system may be mounted on the chassis 204, the printing process being known to be sensitive to atmospheric conditions. According to the present teachings, a gas enclosure assembly may be constructed from frame members (e.g., wall frame 210 of wall panel 210', wall frame 220 of wall panel 220', wall frame 230 of wall panel 230', wall frame 240 of wall panel 240', and ceiling frame 250 of ceiling panel 250'), into which a plurality of segment panels may then be installed. In this regard, it may be desirable to streamline the design of segment panels that may be repeatedly installed and removed through a cycle of construction and deconstruction of various specific embodiments of the gas enclosure assembly of the present teachings. Furthermore, the contours of the gas package assembly 100 may be configured to accommodate the footprint of various specific embodiments of OLED printing systems so as to minimize the volume of inert gas required in the gas package assembly during use of the gas package assembly and during maintenance, as well as to provide easy access to the end user.

將前壁面板210'及左壁面板220'用作例示性,框構件之各種具體實例可具有在框構件建構期間焊接至框構件之金屬薄片面板區段109。插入面板110、窗面板120及可易於移除之保養窗130可裝設於壁框構件中之每一者中,且可經由圖2之氣體封裝組裝件100之建構及解構之循環重複地裝設及移除。如可看出,在壁面板210'及壁面板220'之實例中,壁面板可具有最接近可易於移除之保養窗130的窗面板120。類似地,如在實例後壁面板240'中所描繪,壁面板可具有一窗面板(諸如,窗面板125),其具有兩個鄰近手套端口140。對於根據本教示的壁框構件之各種具體實例,且如針對圖1A之氣體封裝組裝件100看出,手套之此配置使得易於自氣體封裝之外部接取所封裝之系統內的組件零件。因此,氣體封裝之各種具體實例可提供兩個或兩個以上手套端口,使得終端使用者可將左手套及右手套延伸至內部且操作內部中之一或多個項目,而不干擾在內部內的氣態大氣之組成。舉例而言,窗面板120及保養窗130中之任一者可經定位以有助於易於自氣體封裝組裝件之外部接取氣體封裝組裝件之內部中的可調整組件。根據窗面板(諸如,窗面板120及保養窗130)之各種具體實例,當未指示終端使用者可經由手套端口手套進行接取時,此等窗可不包括手套端口及手套端口組裝件。Using the front wall panel 210' and the left wall panel 220' as examples, various specific examples of the frame member may have a metal sheet panel section 109 welded to the frame member during the construction of the frame member. Insert panels 110, window panels 120, and easily removable maintenance windows 130 may be installed in each of the wall frame members, and may be repeatedly installed and removed through the cycle of construction and deconstruction of the gas encapsulation assembly 100 of Figure 2. As can be seen, in the examples of the wall panels 210' and the wall panels 220', the wall panels may have the window panels 120 closest to the easily removable maintenance windows 130. Similarly, as depicted in the example rear wall panel 240', the wall panel may have a window panel (e.g., window panel 125) having two adjacent glove ports 140. For various specific examples of wall frame members according to the present teachings, and as seen with respect to the gas enclosure assembly 100 of FIG. 1A , this configuration of gloves allows for easy access to component parts within the enclosed system from the outside of the gas enclosure. Thus, various specific examples of the gas enclosure may provide two or more glove ports so that an end user may extend a left glove and a right glove to the interior and operate one or more items within the interior without interfering with the composition of the gaseous atmosphere within the interior. For example, either of the window panel 120 and the maintenance window 130 may be positioned to facilitate easy access to adjustable components within the interior of the gas enclosure assembly from the outside of the gas enclosure assembly. Depending on the various specific embodiments of the window panels (e.g., window panel 120 and maintenance window 130), these windows may not include glove ports and glove port assemblies when it is not indicated that the end user can access the glove through the glove port.

如圖2中描繪之壁及頂板面板之各種具體實例可具有複數個插入面板110。如可在圖2中看出,插入面板可具有多種形狀及縱橫比。除了插入面板之外,頂板面板250'可具有安裝、螺釘連接、螺紋連接、固定或另外緊固至頂板框250之一風扇過濾器單元蓋103以及第一頂板框管道105及第二頂板框管道107。如本文中隨後將更詳細地論述,與頂板面板250'之管道107流體連通之管道系統可裝設於氣體封裝組裝件之內部。根據本教示,此管道系統可為在氣體封裝組裝件內部之氣體循環系統之部分,以及提供分離退出氣體封裝組裝件之氣流,以用於在氣體封裝組裝件外部之至少一氣體淨化組件中循環。Various specific examples of wall and ceiling panels as depicted in FIG. 2 may have a plurality of insert panels 110. As can be seen in FIG. 2, the insert panels may have a variety of shapes and aspect ratios. In addition to the insert panels, the ceiling panel 250' may have a fan filter unit cover 103 and a first ceiling frame duct 105 and a second ceiling frame duct 107 mounted, screwed, threaded, fixed or otherwise secured to the ceiling frame 250. As will be discussed in more detail later herein, a duct system in fluid communication with the duct 107 of the ceiling panel 250' may be installed inside the gas enclosure assembly. According to the present teachings, this piping system can be part of a gas circulation system inside the gas enclosure assembly and provide separation of the gas flow exiting the gas enclosure assembly for circulation in at least one gas purification assembly outside the gas enclosure assembly.

圖3為框構件組裝件200之分解前部透視圖,在其中可建構壁框220以包括全套面板。雖然不限於所展示之設計,但對於根據本教示之框構件組裝件之各種具體實例,可將使用壁框220的框構件組裝件200用作例示性的。根據本教示,框構件組裝件之各種具體實例可包含各種框構件及裝設於各種框構件之各種框面板區段中的區段面板。Fig. 3 is the exploded front perspective view of the frame member assembly 200, in which a wall frame 220 can be constructed to include a full set of panels. Although not limited to the design shown, for various specific examples of the frame member assembly according to this teaching, the frame member assembly 200 using the wall frame 220 can be used as an exemplary. According to this teaching, the various specific examples of the frame member assembly can include various frame members and section panels installed in various frame panel sections of the various frame members.

根據本教示之各種框構件組裝件之各種具體實例,框構件組裝件200可包含一框構件,諸如,壁框220。對於氣體封裝組裝件(諸如,圖1A之氣體封裝組裝件100)之各種具體實例,可利用收容於此氣體封裝組裝件中之設備的製程可不僅需要提供惰性環境的氣密封之封裝,且亦需要實質上無顆粒物之環境。在此點上,根據本教示之框構件可將各種尺寸之金屬管材料用於框之各種具體實例之建構。此等金屬管材料解決了所要的材料屬性,包括(但不限於)不會降級而產生顆粒物以及產生具有高強度然而最佳重量之框構件的高完整性材料,從而提供包含各種框構件及面板區段的氣體封裝組裝件之自一位點至另一位點的方便的輸送、建構及解構。根據本教示,滿足此等要求之任何材料可用於創造根據本教示之各種框構件。According to various specific examples of various frame member assemblies of the present teachings, the frame member assembly 200 may include a frame member, such as a wall frame 220. For various specific examples of gas packaging assemblies (such as the gas packaging assembly 100 of FIG. 1A ), the process of the equipment contained in the gas packaging assembly may not only require a gas-tight package that provides an inert environment, but also require an environment that is substantially free of particles. In this regard, according to the frame member of the present teachings, metal tube materials of various sizes may be used for the construction of various specific examples of the frame. These metal tube materials address the desired material properties, including, but not limited to, high integrity materials that do not degrade to produce particulate matter and produce frame members with high strength yet optimal weight, thereby providing convenient transportation, construction, and deconstruction of gas enclosure assemblies including various frame members and panel sections from one point to another. According to the present teachings, any material that meets these requirements can be used to create various frame members according to the present teachings.

舉例而言,根據本教示的框構件之各種具體實例(諸如,框構件組裝件200)可自擠壓之金屬管系建構。根據框構件之各種具體實例,可將鋁、鋼及多種金屬複合材料用於建構框構件。在各種具體實例中,具有(例如但不限於)2''w×2''h、4''w×2''h及4''w×4''h之尺寸且具有1/8''至1/4''壁厚度之金屬管系可用以建構根據本教示的框構件之各種具體實例。另外,具有包括(但不限於)以下各者之材料屬性的多種管或其他形式之多種加強纖維聚合複合材料係可用的:不會降級而產生顆粒物以及產生具有高強度然而最佳重量之框構件的高完整性材料,從而提供自一位點至另一位點的方便的輸送、建構及解構。For example, various embodiments of frame members according to the present teachings (e.g., frame member assembly 200) can be constructed from extruded metal tubing. According to various embodiments of frame members, aluminum, steel, and various metal composite materials can be used to construct the frame members. In various embodiments, metal tubing having dimensions of, for example but not limited to, 2''w×2''h, 4''w×2''h, and 4''w×4''h and having a wall thickness of 1/8'' to 1/4'' can be used to construct various embodiments of frame members according to the present teachings. Additionally, a variety of reinforced fiber polymer composite materials in the form of tubes or other forms are available having material properties including, but not limited to, the following: high integrity materials that do not degrade to produce particulates and produce frame members with high strength yet optimal weight, thereby providing convenient transportation, construction, and deconstruction from one point to another.

關於自各種尺寸之金屬管材料建構各種框構件,預期可進行焊接以創造框焊接件之各種具體實例。另外,可使用適當工業黏著劑自各種尺寸之建置材料建構各種框構件。預期,應以將不固有地創造經由框構件之洩漏路徑的方式進行各種框構件之建構。在此點上,對於氣體封裝組裝件之各種具體實例,可使用不固有地創造經由框構件之洩漏路徑的任何方法進行各種框構件之建構。另外,可漆塗或塗佈根據本教示的框構件之各種具體實例(諸如,圖2之壁框220)。對於自易於(例如)氧化之金屬管系材料製造的框構件之各種具體實例,在形成於表面處之材料可創造顆粒物之情況下,可進行漆塗或塗佈或其他表面處理(諸如,陽極化),以防止顆粒物之形成。With respect to the construction of various frame components from metal tube materials of various sizes, it is expected that welding can be performed to create various specific examples of frame welded parts. In addition, various frame components can be constructed from construction materials of various sizes using appropriate industrial adhesives. It is expected that the construction of various frame components should be performed in a manner that will not inherently create leakage paths through the frame components. In this regard, for various specific examples of gas packaging assemblies, any method that does not inherently create leakage paths through the frame components can be used to perform the construction of various frame components. In addition, various specific examples of frame components according to the present teachings (e.g., wall frame 220 of Figure 2) can be painted or coated. For various specific examples of frame members made from metal piping materials that are susceptible to (for example) oxidation, where the material formed at the surface can create particles, painting or coating or other surface treatment (e.g., anodizing) can be performed to prevent the formation of particles.

框構件組裝件(諸如,圖3之框構件組裝件200)可具有一框構件,諸如,壁框220。壁框220可具有頂部壁框間隔板227可固定於其上之頂部226以及底部壁框間隔板229可固定於其上之底部228。如本文中隨後將更詳細地論述,安裝於框構件之表面上的間隔板為墊片密封系統之一部分,其與安裝於框構件區段中的面板之墊片密封一起提供根據本教示的氣體封裝組裝件之各種具體實例之氣密封。框構件(諸如,圖3之框構件組裝件200之壁框220)可具有若干面板框區段,其中每一區段可經製造以收納各種類型之面板,諸如(但不限於)插入面板110、窗面板120及可易於移除之保養窗130。各種類型之面板區段可形成於框構件之建構中。面板區段之類型可包括(例如但不限於)用於收納插入面板110之插入面板區段10、用於收納窗面板120之窗面板區段20及用於收納可易於移除之保養窗130之保養窗面板區段30。A frame member assembly (e.g., frame member assembly 200 of FIG. 3 ) may have a frame member, e.g., a wall frame 220. The wall frame 220 may have a top 226 to which a top wall frame spacer 227 may be fixed and a bottom 228 to which a bottom wall frame spacer 229 may be fixed. As will be discussed in more detail later herein, the spacer mounted on the surface of the frame member is part of a gasket sealing system that, together with the gasket sealing of the panels mounted in the frame member section, provides a gas seal according to various specific embodiments of the gas enclosure assembly of the present teachings. The frame member (e.g., the wall frame 220 of the frame member assembly 200 of FIG. 3 ) may have a plurality of panel frame sections, each of which may be manufactured to receive various types of panels, such as (but not limited to) an insert panel 110, a window panel 120, and an easily removable maintenance window 130. Various types of panel sections may be formed in the construction of the frame member. The types of panel sections may include, for example, but not limited to, an insert panel section 10 for receiving the insert panel 110, a window panel section 20 for receiving the window panel 120, and a maintenance window panel section 30 for receiving the easily removable maintenance window 130.

每一類型之面板區段可具有一面板區段框以收納一面板,且可使得每一面板可被可密封地固定至根據本教示之每一面板區段中,以用於建構氣密封之氣體封裝組裝件。舉例而言,在描繪根據本教示之框組裝件之圖3中,展示插入面板區段10具有框12,展示窗面板區段20具有框22,且展示保養窗面板區段30具有框32。對於本教示之壁框組裝件之各種具體實例,各種面板區段框可為藉由連續焊珠而焊接至面板區段之金屬薄片材料以提供氣密封。對於壁框組裝件之各種具體實例,可自包括選自加強之纖維聚合合成材料之建置材料的多種薄片材料製造各種面板區段框,可使用適當工業黏著劑將面板區段框安裝於面板區段中。如在關於密封之隨後教示中將更詳細地論述,每一面板區段框可具有安置於其上之可壓縮墊片以確保針對裝設且固定於每一面板區段中之每一面板形成氣密性密封。除了面板區段框之外,每一框構件區段亦可具有與定位面板以及與將面板牢固地固定於面板區段中有關之硬體。Each type of panel section may have a panel section frame to receive a panel, and each panel may be sealably fixed to each panel section according to the present teachings for constructing an airtight gas-tight assembly. For example, in FIG. 3 depicting a frame assembly according to the present teachings, the display insert panel section 10 has a frame 12, the display window panel section 20 has a frame 22, and the display maintenance window panel section 30 has a frame 32. For various specific examples of the wall frame assembly of the present teachings, the various panel section frames may be sheet metal materials welded to the panel sections by continuous weld beads to provide an airtight seal. For various specific examples of wall frame assemblies, various panel section frames can be made from a variety of sheet materials including building materials selected from reinforced fiber polymer composite materials, and the panel section frames can be installed in the panel sections using suitable industrial adhesives. As will be discussed in more detail in the subsequent teachings on sealing, each panel section frame can have a compressible gasket disposed thereon to ensure that an airtight seal is formed for each panel installed and fixed in each panel section. In addition to the panel section frame, each frame member section can also have hardware related to positioning the panel and fixing the panel firmly in the panel section.

插入面板110及用於窗面板120之面板框122之各種具體實例可自諸如(但不限於)鋁、鋁之各種合金及不鏽鋼的金屬薄片材料建構。面板材料之屬性可與構成框構件之各種具體實例的結構材料的屬性相同。在此點上,具有用於各種面板構件之屬性的材料包括(但不限於)不會降級而產生顆粒物以及產生具有高強度然而最佳重量之面板的高完整性材料,以便提供自一位點至另一位點的方便的輸送、建構及解構。(例如)蜂房狀核心薄片材料之各種具體實例可具有用作用於建構插入面板110及窗面板120之面板框122之面板材料的必需屬性。蜂房狀核心薄片材料可由多種材料製成——金屬以及金屬複合物及聚合物,以及聚合物複合蜂房狀核心薄片材料。當自金屬材料製造時的可移除面板之各種具體實例可具有包括於面板中之接地連接,以確保當建構氣體封裝組裝件時,整個結構接地。Various specific examples of the insert panel 110 and the panel frame 122 for the window panel 120 can be constructed from metal sheet materials such as (but not limited to) aluminum, various alloys of aluminum, and stainless steel. The properties of the panel material can be the same as the properties of the structural material of the various specific examples of the frame member. In this regard, materials with properties for various panel members include (but not limited to) high integrity materials that do not degrade to produce particles and produce panels with high strength but optimal weight, so as to provide convenient transportation, construction, and deconstruction from one point to another. Various specific examples of (for example) honeycomb core sheet materials can have the necessary properties for the panel material used to construct the insert panel 110 and the panel frame 122 of the window panel 120. The honeycomb core sheet material can be made from a variety of materials - metals and metal composites and polymers, as well as polymer composite honeycomb core sheet materials. Various embodiments of the removable panel when made from metal materials can have a ground connection included in the panel to ensure that the entire structure is grounded when the gas enclosure assembly is constructed.

考慮到用以建構本教示之氣體封裝組裝件的組件之可輸送本質,可在氣體封裝系統之使用期間重複地裝設及移除本教示之區段面板之各種具體實例中之任何者以提供對氣體封裝組裝件之內部的接取。Given the transportable nature of the components used to construct the gas enclosure assembly of the present teachings, any of the various embodiments of the segment panels of the present teachings may be repeatedly installed and removed during use of the gas enclosure system to provide access to the interior of the gas enclosure assembly.

舉例而言,用於收納可易於移除之保養窗面板130之面板區段30可具有四個間隔物之一集合,其中之一者指示為窗導引間隔物34。另外,經建構用於收納可易於移除之保養窗面板130之面板區段30可具有四個夾緊夾板36之一集合,夾緊夾板可用以針對可易於移除之保養窗130中之每一者使用安裝於保養窗框132上之四個反向作用肘節夾136之一集合將保養窗130夾緊至保養窗面板區段30。另外,窗把手138中之每一者中的兩個可安裝於可易於移除之保養窗框132上以使得終端使用者易於移除及裝設保養窗130。可變化可移除保養窗把手之數目、類型及置放。另外,用於收納可易於移除之保養窗面板130之保養窗面板區段30可具有選擇性地裝設於每一保養窗面板區段30中的窗夾35中之至少兩個。雖然被描繪為在保養窗面板區段30中之每一者的頂部及底部中,但可按用以將保養窗130緊固於面板區段框32中之任何方式裝設至少兩個窗夾。可使用工具來移除及裝設窗夾35,以便允許移除及再裝設保養窗130。For example, the panel section 30 for receiving the easily removable maintenance window panel 130 may have a set of four spacers, one of which is indicated as the window guide spacer 34. In addition, the panel section 30 constructed for receiving the easily removable maintenance window panel 130 may have a set of four clamping clips 36, which can be used to clamp the maintenance window 130 to the maintenance window panel section 30 using a set of four reverse-acting toggle clips 136 mounted on the maintenance window frame 132 for each of the easily removable maintenance windows 130. In addition, two of each of the window handles 138 may be mounted on the easily removable maintenance window frame 132 to make it easy for the end user to remove and install the maintenance window 130. The number, type and placement of the removable maintenance window handles can be varied. In addition, the maintenance window panel section 30 for housing the easily removable maintenance window panel 130 can have at least two of the window clips 35 selectively installed in each maintenance window panel section 30. Although depicted as being in the top and bottom of each of the maintenance window panel sections 30, at least two window clips can be installed in any manner to secure the maintenance window 130 in the panel section frame 32. Tools can be used to remove and install the window clips 35 to allow the maintenance window 130 to be removed and reinstalled.

保養窗130之反向作用肘節夾136以及裝設於面板區段30中之硬體(包括夾緊夾板36、窗導引間隔物34及窗夾35)可由任何合適材料以及材料之組合建構成。舉例而言,一或多個此等元件可包含至少一種金屬、至少一種陶瓷、至少一種塑膠及其組合。可移除之保養窗把手138可由任何合適材料以及材料之組合建構成。舉例而言,一或多個此等元件可包含至少一種金屬、至少一種陶瓷、至少一種塑膠、至少一種橡膠及其組合。封裝窗(諸如,窗面板120之窗124或保養窗130之窗134)可包含任何合適材料以及材料之組合。根據本教示之氣體封裝組裝件之各種具體實例,封裝窗可包含透明及半透明材料。在氣體封裝組裝件之各種具體實例中,封裝窗可包含基於矽石之材料(例如但不限於,玻璃及石英)以及各種類型的基於聚合之材料(例如但不限於,各種類別之聚碳酸酯、丙烯酸系物及乙烯基物)。根據本教示之系統及方法,各種複合物及其組合之透明及半透明性質為對於例示性窗材料合乎需要之屬性。The reverse acting toggle clip 136 of the maintenance window 130 and the hardware (including the clamping clip 36, the window guide spacer 34 and the window clip 35) installed in the panel section 30 can be constructed of any suitable material and combination of materials. For example, one or more of these components can include at least one metal, at least one ceramic, at least one plastic and a combination thereof. The removable maintenance window handle 138 can be constructed of any suitable material and a combination of materials. For example, one or more of these components can include at least one metal, at least one ceramic, at least one plastic, at least one rubber and a combination thereof. The encapsulated window (e.g., the window 124 of the window panel 120 or the window 134 of the maintenance window 130) can include any suitable material and a combination of materials. According to various specific examples of gas encapsulation assemblies of the present teachings, the encapsulation window may include transparent and translucent materials. In various specific examples of gas encapsulation assemblies, the encapsulation window may include silica-based materials (such as, but not limited to, glass and quartz) and various types of polymer-based materials (such as, but not limited to, various types of polycarbonates, acrylics, and vinyls). According to the systems and methods of the present teachings, the transparent and translucent properties of various composites and combinations thereof are desirable properties for exemplary window materials.

如在針對圖8A至圖9B之以下教示中將論述,壁及頂板框構件密封件與氣密性區段面板框密封件一起提供用於需要惰性環境之空氣敏感製程的氣密封之氣體封裝組裝件之各種具體實例。對提供反應性物質之實質上低濃度以及實質上低粒環境有影響的氣體封裝系統之組件可包括(但不限於)氣密封之氣體封裝組裝件,以及高度有效的氣體循環及粒子過濾系統(包括管道系統)。提供用於氣體封裝組裝件之有效氣密封件可為挑戰性的,尤其在三個框構件一起形成三側接頭之情況下。因而,三側接頭密封呈現關於提供用於可經由建構及解構之循環組裝及拆卸的氣體封裝組裝件之可易於裝設之氣密封的特別困難挑戰。As will be discussed in the following teachings with respect to FIGS. 8A to 9B , the wall and ceiling frame member seals together with the airtight section panel frame seals provide various specific examples of airtight gas packaging assemblies for air sensitive processes requiring an inert environment. Components of a gas packaging system having an effect of providing substantially low concentrations of reactive materials and a substantially low particle environment may include, but are not limited to, airtight gas packaging assemblies, and highly effective gas circulation and particle filtering systems (including ductwork). Providing effective airtight seals for gas packaging assemblies can be challenging, particularly where three frame members come together to form a three-side joint. Thus, three-side joint seals present a particularly difficult challenge with respect to providing an easily installable gas seal for a gas enclosure assembly that can be assembled and disassembled through a cycle of construction and deconstruction.

在此點上,根據本教示之氣體封裝組裝件之各種具體實例經由接頭之有效墊片密封提供完全建構之氣體封裝系統的氣密封,以及提供在負載支承建置組件周圍之有效墊片密封。與習知接頭密封不同,根據本教示之接頭密封:1)包括來自正交定向之墊片長度的鄰接之墊片段在接合三個框構件之頂部及底部終端框接頭接合點處的均勻平行對準,藉此避免了有角度的縫隙對準及密封,2)提供跨接頭之整個寬度形成鄰接之長度,藉此增大在三側接頭接合點處之密封接觸面積,3)經設計具有間隔板,間隔板提供跨所有垂直及水平以及頂部及底部三側接頭墊片密封件之均勻壓縮力。另外,墊片材料之選擇可影響提供氣密封件之有效性,其將在本文中隨後論述。In this regard, various embodiments of gas packaging assemblies according to the present teachings provide gas sealing of a fully constructed gas packaging system via an effective gasket seal at the joint, as well as providing an effective gasket seal around the load-bearing built assembly. Unlike conventional joint seals, the joint seal according to the present teachings: 1) includes uniform parallel alignment of adjacent gasket segments from orthogonally oriented gasket lengths at the top and bottom terminal frame joint joints joining three frame members, thereby avoiding angled gap alignment and sealing, 2) provides adjacent lengths across the entire width of the joint, thereby increasing the sealing contact area at the three-side joint joint, 3) is designed with a spacer that provides uniform compression across all vertical and horizontal and top and bottom three-side joint gasket seals. In addition, the choice of gasket material can affect the effectiveness of providing an airtight seal, which will be discussed later in this article.

圖4A至圖4C為描繪習知三側接頭密封件與根據本教示之三側接頭密封件的比較之頂部示意圖。根據本教示之氣體封裝組裝件之各種具體實例,可存在(例如但不限於)至少四個壁框構件、一頂板框構件及一底盤(其可接合以形成氣體封裝組裝件),從而創造需要氣密封之複數個垂直、水平及三側接頭。在圖4A中,自第一墊片I(其在X-Y平面中與墊片II正交地定向)形成的習知三側墊片密封之頂部示意圖。如圖4A中所示,在X-Y平面中以正交定向形成之縫隙具有在由墊片之寬度尺寸界定的兩個段之間的接觸長度W 1。另外,墊片III(其為在垂直方向上與墊片I及墊片II兩者正交定向之墊片)之終端部分可鄰接墊片I及墊片II,如由影線所指示。在圖4B中,自第一墊片長度I形成的習知三側接頭墊片密封之頂部示意圖,第一墊片長度I與第二墊片長度II正交,且具有兩個長度之縫隙接合45°面,其中縫隙具有大於墊片材料之寬度的在兩個段之間的接觸長度W 2。類似於圖4A之組態,墊片III(其在垂直方向上與墊片I及墊片II兩者正交)之終端部分可鄰接墊片I及墊片II,如由影線所指示。假定墊片寬度在圖4A與圖4B中相同,圖4B之接觸長度W 2大於圖4A之接觸長度W 1Figures 4A to 4C are top schematic diagrams depicting a comparison of a known three-side joint seal and a three-side joint seal according to the present teaching. According to various specific examples of the gas packaging assembly of the present teaching, there may be (for example but not limited to) at least four wall frame members, a top plate frame member and a chassis (which can be joined to form a gas packaging assembly), thereby creating a plurality of vertical, horizontal and three-side joints that require airtight sealing. In Figure 4A, a top schematic diagram of a known three-side gasket seal formed from a first gasket I (which is oriented orthogonally to gasket II in the XY plane). As shown in Figure 4A, the gap formed in the XY plane with an orthogonal orientation has a contact length W1 between two segments defined by the width dimension of the gasket. In addition, the terminal portion of gasket III (which is a gasket oriented orthogonally to both gasket I and gasket II in the vertical direction) may be adjacent to gasket I and gasket II, as indicated by hatching. In FIG. 4B , a top schematic diagram of a known three-side joint gasket seal formed from a first gasket length I, the first gasket length I is orthogonal to a second gasket length II, and a gap having two lengths joins a 45° face, wherein the gap has a contact length W 2 between the two segments that is greater than the width of the gasket material. Similar to the configuration of Figure 4A, the terminal portion of pad III (which is orthogonal to both pads I and II in the vertical direction) can be adjacent to pads I and II, as indicated by the hatching. Assuming that the pad width is the same in Figures 4A and 4B, the contact length W2 of Figure 4B is greater than the contact length W1 of Figure 4A.

圖4C為根據本教示的三側接頭墊片密封之頂部示意圖。第一墊片長度I可具有與墊片長度I之方向正交地形成之墊片段I',其中墊片段I'具有可大致為正被接合的結構組件(諸如,用以形成本教示之氣體封裝組裝件之各種壁框構件的4''w×2''h或4''w×4''h金屬管)之寬度之尺寸的長度。墊片II在X-Y平面中與墊片I正交,且具有墊片段II',墊片段II'具有大致為正被接合的結構組件之寬度的與墊片段I'之重疊長度。墊片段I'及II'之寬度為經選擇的可壓縮墊片材料之寬度。墊片III在垂直方向上與墊片I及墊片II兩者正交地定向。墊片段III'為墊片III之端部分。墊片段III'自墊片段III'的與墊片III之垂直長度正交之定向形成。墊片段III'可經形成使得其大致具有與墊片段I'及II'相同的長度,及為經選擇的可壓縮墊片材料之厚度的寬度。在此點上,針對圖4C中展示之三個對準之段的接觸長度W 3大於在圖4A或圖4B中展示之習知三拐角接頭密封件(其分別具有接觸長度W 1及W 2)。 FIG4C is a top schematic diagram of a three-sided joint gasket seal according to the present teachings. A first gasket length I may have a gasket segment I' formed orthogonally to the direction of the gasket length I, wherein the gasket segment I' has a length that may be approximately the size of the width of the structural assembly being joined (e.g., a 4''w×2''h or 4''w×4''h metal tube used to form various wall frame components of the gas enclosure assembly of the present teachings). Gasket II is orthogonal to gasket I in the XY plane and has a gasket segment II', which has an overlapping length with gasket segment I' that is approximately the width of the structural assembly being joined. The width of gasket segments I' and II' is the width of the selected compressible gasket material. Gasket III is oriented orthogonally to both gasket I and gasket II in the vertical direction. Gasket segment III' is the end portion of gasket III. Gasket segment III' is formed from the orientation of gasket segment III' orthogonal to the vertical length of gasket III. Gasket segment III' can be formed so that it has approximately the same length as gasket segments I' and II', and a width that is the thickness of the selected compressible gasket material. In this regard, the contact length W3 for the three aligned segments shown in Figure 4C is greater than the known three-corner joint seal shown in Figure 4A or Figure 4B (which have contact lengths W1 and W2 , respectively).

在此點上,根據本教示之三側接頭墊片密封在終端接頭接合點處創造墊片段之均勻平行對準,而非原本的正交對準之墊片(如圖4A及圖4B之情況中所展示)。三側接頭墊片密封段之此均勻平行對準提供在各段上施加均勻橫向密封力,以促進在自壁框構件形成的接頭之頂角及底角處之氣密性三側接頭密封件。另外,將用於每一三側接頭密封件的均勻對準之墊片段之每一段選擇為大致為正接合的結構組件之寬度,從而提供均勻對準之段之最大接觸長度。此外,根據本教示之接頭密封經設計具有間隔板,間隔板提供跨建置接頭之所有垂直、水平及三側墊片密封件之均勻壓縮力。可證明為針對圖6A及圖6B之實例給出的習知三側密封件選擇的墊片材料之寬度可為至少正被接合的結構組件之寬度。In this regard, the three-sided joint gasket seal according to the present teachings creates uniform parallel alignment of the gasket segments at the terminal joint joint point, rather than the original orthogonal alignment of the gasket (as shown in the case of Figures 4A and 4B). This uniform parallel alignment of the three-sided joint gasket seal segments provides for the application of uniform lateral sealing forces on each segment to promote an airtight three-sided joint seal at the top and bottom corners of the joint formed from the wall frame member. In addition, each segment of the uniformly aligned gasket segments used for each three-sided joint seal is selected to be approximately the width of the structural assembly being positively engaged, thereby providing a maximum contact length of the uniformly aligned segments. In addition, the joint seal according to the present teachings is designed with a spacer that provides uniform compression across all vertical, horizontal and three-sided gasket seals of the built joint. It can be demonstrated that the width of the gasket material selected for the known three-sided seal given for the example of Figures 6A and 6B can be at least the width of the structural assembly being joined.

圖5A之分解透視圖描繪在已接合所有框構件前的根據本教示之密封組裝件300,使得描繪處於未壓縮狀態中之墊片。在圖5A中,可在自氣體封裝組裝件之各種組件建構氣體封裝之第一步驟中可密封地接合複數個壁框構件(諸如,壁框310、壁框350以及頂板框370)。根據本教示之框構件密封為使得氣體封裝組裝件一旦經完全建構則可氣密封以及提供可經由氣體封裝組裝件之建構及解構之循環實施的密封之實質部分。雖然針對圖7A至圖7B之以下教示中給出之實例係針對氣體封裝組裝件之一部分之密封,但此等教示亦適用於本教示之氣體封裝組裝件中之任何者之全部。The exploded perspective view of Fig. 5A depicts the sealing assembly 300 according to this teaching before all frame members have been engaged, so that the gasket in the uncompressed state is depicted. In Fig. 5A, a plurality of wall frame members (e.g., wall frame 310, wall frame 350 and top plate frame 370) can be sealably engaged in the first step of constructing a gas package from various assemblies of the gas package assembly. The sealing of the frame member according to this teaching is to make the gas package assembly once fully constructed, and to provide a substantial part of the sealing that can be implemented through the cycle of construction and deconstruction of the gas package assembly. Although the examples given in the following teachings with respect to FIGS. 7A-7B are directed to sealing a portion of a gas enclosure assembly, such teachings are also applicable to the entirety of any of the gas enclosure assemblies of the present teachings.

圖5A中描繪之第一壁框310可具有其上安裝間隔板312之內部側311、垂直側314及其上安裝間隔板316之頂表面315。第一壁框310可具有安置於自間隔板312形成之空間中且貼附至該空間的第一墊片320。在將第一墊片320安置於自間隔板312形成之空間中且貼附至該空間後剩餘的間隙302可沿第一墊片320之垂直長度伸展,如圖5A中所示。如圖5A中所描繪,柔性墊片320可安置於自間隔板312形成之空間中且貼附至該空間,且可具有垂直墊片長度321、曲線墊片長度323及在平面中與內部框構件311上之垂直墊片長度321成90°形成且終止於壁框310之垂直側314的墊片長度325。在圖5A中,第一壁框310可具有其上安裝間隔板316之頂表面315,藉此在最接近壁框310之內邊緣317處形成第二墊片340安置於且貼附至的表面315上的空間。在將第二墊片340安置於自間隔板316形成之空間中且貼附至該空間後剩餘的間隙304可沿第二墊片340之水平長度伸展,如圖5A中所示。另外,如由影線所指示,墊片340之長度345與墊片320之長度325均勻地平行且相鄰地對準。The first wall frame 310 described in Fig. 5A can have an inner side 311, a vertical side 314 and a top surface 315 on which a spacer 312 is installed. The first wall frame 310 can have a first gasket 320 that is placed in the space formed from the spacer 312 and is attached to the space. After the first gasket 320 is placed in the space formed from the spacer 312 and is attached to the space, the remaining gap 302 can stretch along the vertical length of the first gasket 320, as shown in Fig. 5A. As depicted in FIG. 5A , a flexible gasket 320 may be disposed in and attached to the space formed from a spacer 312 and may have a vertical gasket length 321, a curved gasket length 323, and a gasket length 325 formed in a plane at 90° to the vertical gasket length 321 on the interior frame member 311 and terminating at a vertical side 314 of the wall frame 310. In FIG. 5A , a first wall frame 310 may have a top surface 315 on which a spacer 316 is mounted, thereby forming a space on the surface 315 where a second gasket 340 is disposed and attached at an inner edge 317 closest to the wall frame 310. The remaining gap 304 after the second gasket 340 is placed in the space formed by the spacer 316 and attached to the space can extend along the horizontal length of the second gasket 340, as shown in Figure 5A. In addition, as indicated by the hatching, the length 345 of the gasket 340 is evenly parallel and adjacently aligned with the length 325 of the gasket 320.

圖5A中描繪之第二壁框350可具有外部框側353、垂直側354及其上安裝間隔板356之頂表面355。第二壁框350可具有安置於自間隔板356形成之空間中且貼附至該空間之第一墊片360。在將第一墊片360安置於自間隔板356形成之空間中且貼附至該空間後剩餘的間隙306可沿第一墊片360之水平長度伸展,如圖5A中所示。如圖5A中所描繪,柔性墊片360可具有水平長度361、曲線長度363及在頂表面355上之平面中按90°形成且終止於外部框構件353處之長度365。The second wall frame 350 described in Fig. 5A can have an outer frame side 353, a vertical side 354 and a top surface 355 on which a spacer 356 is installed. The second wall frame 350 can have a first gasket 360 that is placed in the space formed from the spacer 356 and is attached to the space. The remaining gap 306 after the first gasket 360 is placed in the space formed from the spacer 356 and is attached to the space can be stretched along the horizontal length of the first gasket 360, as shown in Fig. 5A. As described in Fig. 5A, the flexible gasket 360 can have a horizontal length 361, a curve length 363 and a length 365 formed by 90 ° and terminated at the outer frame member 353 in the plane on the top surface 355.

如在圖5A之分解透視圖中所指示,壁框310之內部框構件311可接合至壁框350之垂直側354以形成氣體封裝框組裝件之一個建置接頭。關於如此形成的建置接頭之密封,在如在圖5A中所描繪之處於根據本教示的壁框構件之終端接頭接合點處的墊片密封之各種具體實例中,墊片320之長度325、墊片360之長度365及墊片340之長度345皆相鄰且均勻地對準。另外,如本文中隨後將更詳細地論述,本教示之間隔板之各種具體實例可提供用於氣密封本教示之氣體封裝組裝件之各種具體實例的可壓縮墊片材料之具有約20%至約40%之間的偏轉的均勻壓縮。As indicated in the exploded perspective view of Fig. 5A, the inner frame member 311 of the wall frame 310 can be joined to the vertical side 354 of the wall frame 350 to form a building joint of the gas enclosure frame assembly. Regarding the sealing of the building joint thus formed, in various specific examples of the gasket seal at the terminal joint joint of the wall frame member according to the present teaching as described in Fig. 5A, the length 325 of the gasket 320, the length 365 of the gasket 360 and the length 345 of the gasket 340 are all adjacent and evenly aligned. Additionally, as will be discussed in greater detail later herein, various embodiments of the spacer plates of the present teachings can provide uniform compression of the compressible gasket material with a deflection of between about 20% and about 40% for hermetically sealing various embodiments of the gas enclosure assemblies of the present teachings.

圖5B描繪在已接合了所有框構件後的根據本教示之密封組裝件300,使得描繪處於壓縮狀態中之墊片。圖5B為展示形成於第一壁框310、第二壁框350與頂板框370之間的頂部終端接頭接合點處的三側接頭之拐角密封件之細節(其以幻象圖展示)之透視圖。如圖5B中所示,由間隔板界定之墊片空間可經判定為寬度,使得在接合了壁框310、壁框350及頂板框370(以幻象圖展示)後,用於形成垂直、水平及三側墊片密封件的可壓縮墊片材料之具有約20%至約40%之間的偏轉的均勻壓縮確保在密封於壁框構件之接頭處的所有表面處之墊片密封可提供氣密封。另外,墊片間隙302、304及306(圖中未示)經定尺寸,使得在可壓縮墊片材料之具有約20%至約40%之間的偏轉的最佳壓縮後,每一墊片可填充墊片間隙,如針對圖5B中之墊片340及墊片360所展示。因而,除了藉由界定每一墊片可安置於其中且貼附至之空間來提供均勻壓縮外,經設計以提供間隙的間隔板之各種具體實例亦確保每一壓縮之墊片可在由間隔板界定之空間內保形,而不會起皺或膨脹或另外以可形成洩漏路徑之方式按壓縮狀態不規則地形成。Fig. 5 B describes the sealing assembly 300 according to this teaching after all frame members have been engaged, so that the gasket in the compressed state is described. Fig. 5 B is a perspective view showing the details (it shows with a phantom diagram) of the corner seal of the three side joints formed at the top terminal joint joint point between the first wall frame 310, the second wall frame 350 and the top plate frame 370. As shown in FIG. 5B , the gasket space defined by the spacers can be determined to be of a width such that after the wall frame 310, the wall frame 350 and the top plate frame 370 (shown in phantom view) are joined, uniform compression of the compressible gasket material used to form the vertical, horizontal and three-sided gasket seals with a deflection of between about 20% and about 40% ensures that the gasket seals at all surfaces of the joints sealed to the wall frame members can provide an airtight seal. Additionally, the gasket gaps 302, 304, and 306 (not shown) are sized so that after optimal compression of the compressible gasket material with a deflection between about 20% and about 40%, each gasket can fill the gasket gap, as shown for gasket 340 and gasket 360 in Figure 5B. Thus, in addition to providing uniform compression by defining a space in which each gasket can be placed and attached, various embodiments of the spacers designed to provide the gaps also ensure that each compressed gasket can conform within the space defined by the spacers without wrinkling or expanding or otherwise forming irregularly in the compressed state in a manner that can form a leak path.

根據本教示之氣體封裝組裝件之各種具體實例,可使用安置於面板區段框之每一者上的可壓縮墊片材料來密封各種類型之區段面板。與框構件墊片密封一起,用以形成各種區段面板與面板區段框之間的密封件之可壓縮墊片之位置及材料可提供具有極少或無氣體洩漏的氣密封之氣體封裝組裝件。另外,針對所有類型之面板(諸如,圖3之插入面板110、窗面板120及可易於移除之保養窗130)之密封設計可提供在此等面板之重複移除及裝設後的持久面板密封,為了接取氣體封裝組裝件之內部,重複移除及裝設可為需要的,例如,為了維護。According to various specific examples of the gas packaging assembly of the present teachings, various types of segment panels can be sealed using compressible gasket materials disposed on each of the panel segment frames. Together with the frame member gasket seal, the location and material of the compressible gasket used to form the seal between the various segment panels and the panel segment frame can provide a gas packaging assembly with an airtight seal with little or no gas leakage. In addition, the sealing design for all types of panels (e.g., the insert panel 110, the window panel 120, and the easily removable maintenance window 130 of FIG. 3) can provide a durable panel seal after repeated removal and installation of such panels, which may be required to access the interior of the gas packaging assembly, for example, for maintenance.

舉例而言,圖6A為描繪保養窗面板區段30及可易於移除之保養窗130之分解圖。如本文中先前所論述,保養窗面板區段30可經製造,用於收納可易於移除之保養窗130。對於氣體封裝組裝件之各種具體實例,諸如可移除之服務面板區段30之面板區段可具有面板區段框32以及安置於面板區段框32上之可壓縮墊片38。在各種具體實例中,與將可易於移除之保養窗130固定於可移除之保養窗面板區段30中有關的硬體可對終端使用者提供裝設及重新裝設之容易性,且同時確保當可易於移除之保養窗130由需要對氣體封裝組裝件之內部之直接接取的終端使用者按需要裝設及重新裝設於面板區段30中時維持氣密性密封。可易於移除之保養窗130可包括剛性窗框132,其可自(例如但不限於)如針對建構本教示之框構件中之任何者所描述的金屬管材料建構。保養窗130可利用快速起作用固定硬體(例如但不限於,反向作用肘節夾136),以便使得終端使用者易於移除及重新裝設保養窗130。For example, FIG. 6A is an exploded view depicting a maintenance window panel section 30 and an easily removable maintenance window 130. As previously discussed herein, the maintenance window panel section 30 can be manufactured to accommodate an easily removable maintenance window 130. For various specific examples of gas enclosure assemblies, a panel section such as a removable service panel section 30 can have a panel section frame 32 and a compressible gasket 38 disposed on the panel section frame 32. In various specific examples, the hardware associated with securing the easily removable maintenance window 130 in the removable maintenance window panel section 30 can provide ease of installation and reinstallation for the end user, while ensuring that the easily removable maintenance window 130 is installed and reinstalled in the panel section 30 as needed by the end user who needs direct access to the interior of the gas enclosure assembly. The easily removable maintenance window 130 may include a rigid window frame 132, which may be constructed from (for example, but not limited to) metal tube materials as described for constructing any of the frame members of the present teachings. The maintenance window 130 may utilize quick-acting fixing hardware (for example, but not limited to, reverse-acting toggle clamps 136) to make it easy for the end user to remove and reinstall the maintenance window 130.

如在圖6A之可移除之保養窗面板區段30之前視圖中所示,可易於移除之保養窗130可具有緊固於窗框132上的四個肘節夾136之一集合。可按用於確保對墊片38之恰當壓縮力的經定義之距離將保養窗130定位至面板區段框30內。使用如圖6B中展示的四個窗導引間隔物34之集合,其可裝設於面板區段30之每一拐角中用於將保養窗130定位於面板區段30中。可提供夾緊夾板36中之每一者之集合以收納可易於移除之保養窗130之反向作用肘節夾136。根據保養窗130之氣密封之各種具體實例,經由裝設及移除之循環,保養窗框132之機械強度與由窗導引間隔物34之集合相對於可壓縮墊片38提供的保養窗130之經界定位置一起的組合可確保一旦藉由(例如但不限於)使用固定於各別夾緊夾板36中之反向作用肘節夾136將保養窗130緊固於適當位置,則保養窗框132可藉由如由窗導引間隔物34之集合設定的定義之壓縮在面板區段框32上提供均勻力。窗導引間隔物34之集合經定位使得窗130對墊片38的壓縮力使可壓縮墊片38在約20%至約40%之間偏轉。在此點上,保養窗130之建構以及面板區段30之製造提供在面板區段30中的保養窗130之氣密性密封。如本文中先前所論述,可在將保養窗130固定至面板區段30內之後將窗夾35裝設於面板區段30內,且在需要移除保養窗130時而移除窗夾35。As shown in the front view of the removable maintenance window panel section 30 of FIG. 6A , the easily removable maintenance window 130 may have one set of four toggle clips 136 secured to the window frame 132. The maintenance window 130 may be positioned within the panel section frame 30 at a defined distance for ensuring proper compression against the gasket 38. A set of four window guide spacers 34 as shown in FIG. 6B , which may be installed in each corner of the panel section 30, is used to position the maintenance window 130 in the panel section 30. A set of clamping clips 36 may be provided to each of the reverse acting toggle clips 136 of the easily removable maintenance window 130. According to various specific embodiments of the airtight seal of the maintenance window 130, through the cycle of installation and removal, the mechanical strength of the maintenance window frame 132 combined with the defined position of the maintenance window 130 provided by the collection of window guide spacers 34 relative to the compressible gasket 38 can ensure that once the maintenance window 130 is tightened in the appropriate position by (for example but not limited to) using a reverse-acting toggle clamp 136 fixed in a respective clamping clip 36, the maintenance window frame 132 can provide uniform force on the panel section frame 32 by a defined compression as set by the collection of window guide spacers 34. The set of window guide spacers 34 are positioned so that the compressive force of the window 130 on the gasket 38 causes the compressible gasket 38 to deflect between about 20% and about 40%. At this point, the construction of the maintenance window 130 and the manufacture of the panel section 30 provide an airtight seal of the maintenance window 130 in the panel section 30. As previously discussed herein, the window clip 35 can be installed in the panel section 30 after the maintenance window 130 is secured therein, and the window clip 35 can be removed when it is desired to remove the maintenance window 130.

可使用任何合適方式以及方式之組合將反向作用肘節夾136緊固至可易於移除之保養窗框132。可使用的合適的緊固方式之實例包括至少一種黏著劑(例如但不限於,環氧樹脂或黏合劑)、至少一螺釘、至少一螺桿、至少另一扣件、至少一槽、至少一軌道、至少一焊接部及其組合。反向作用肘節夾136可直接連接至可移除之保養窗框132或間接地經由轉接板連接。反向作用肘節夾136、夾緊夾板36、窗導引間隔物34及窗夾35可由任何合適的材料以及材料之組合建構成。舉例而言,一或多個此等元件可包含至少一種金屬、至少一種陶瓷、至少一種塑膠及其組合。The reverse acting toggle clip 136 may be fastened to the easily removable maintenance window frame 132 using any suitable means and combinations of means. Examples of suitable fastening means that may be used include at least one adhesive (such as, but not limited to, epoxy or adhesive), at least one screw, at least one screw, at least one other fastener, at least one groove, at least one track, at least one weld, and combinations thereof. The reverse acting toggle clip 136 may be directly connected to the removable maintenance window frame 132 or indirectly connected via an adapter plate. The reverse acting toggle clip 136, the clamping clip plate 36, the window guide spacer 34, and the window clip 35 may be constructed of any suitable materials and combinations of materials. For example, one or more of these components may include at least one metal, at least one ceramic, at least one plastic, and combinations thereof.

除了密封可易於移除之保養窗之外,亦可針對插入面板及窗面板提供氣密性密封。可在面板區段中重複裝設及移除的其他類型之區段面板包括(例如但不限於)插入面板110及窗面板120,如圖3中所示。如可在圖3中看出,類似於插入面板110建構窗面板120之面板框122。因而,根據氣體封裝組裝件之各種具體實例,用於收納插入面板與窗面板的面板區段之製造可相同。在此點上,可使用相同原理實施插入面板及窗面板之密封。In addition to sealing a maintenance window that can be easily removed, an airtight seal can also be provided for insert panels and window panels. Other types of segment panels that can be repeatedly installed and removed in the panel section include (for example but not limited to) insert panels 110 and window panels 120, as shown in Figure 3. As can be seen in Figure 3, the panel frame 122 of the window panel 120 is constructed similarly to the insert panel 110. Therefore, according to various specific examples of the gas encapsulation assembly, the manufacture of the panel section for accommodating the insert panel and the window panel can be the same. At this point, the same principle can be used to implement the sealing of the insert panel and the window panel.

參看圖7A及圖7B,且根據本教示之各種具體實例,氣體封裝(諸如,圖1之氣體封裝組裝件100)的面板中之任何者可包括一或多個插入面板區段10,其可具有經組態以收納各別插入面板110之框12。圖7A為指示圖9B中展示的擴大部分之透視圖。在圖7A中,描繪關於插入框12定位之插入面板110。如圖7B中可見,插入面板110貼附至框12,其中框12可(例如)由金屬建構成。在一些具體實例中,金屬可包含鋁、鋼、銅、不鏽鋼、鉻、合金及其組合及類似者。可在插入面板區段框12中製造複數個盲螺紋孔14。面板區段框12經建構以便在插入面板110與框12之間包含一墊片16,可壓縮墊片18可安置於其中。盲螺紋孔14可屬於M5種類。螺桿15可由盲螺紋孔14收納,壓縮在插入面板110與框12之間的墊片16。一旦與墊片16相抵固定至適當位置,則插入面板110在插入面板區段10內形成氣密性密封。如本文中先前所論述,可針對多種區段面板(包括但不限於,插入面板110及窗面板120,如圖3中所示)實施此面板密封。Referring to Figures 7A and 7B, and in accordance with various specific examples of the present teachings, any of the panels of a gas package (e.g., the gas package assembly 100 of Figure 1) may include one or more insert panel sections 10, which may have a frame 12 configured to accommodate individual insert panels 110. Figure 7A is a perspective view indicating the expanded portion shown in Figure 9B. In Figure 7A, an insert panel 110 is depicted positioned relative to the insert frame 12. As can be seen in Figure 7B, the insert panel 110 is attached to the frame 12, wherein the frame 12 may be constructed of metal, for example. In some specific examples, the metal may include aluminum, steel, copper, stainless steel, chromium, alloys, combinations thereof, and the like. A plurality of blind threaded holes 14 may be made in the insert panel section frame 12. The panel section frame 12 is constructed so as to include a gasket 16 between the insert panel 110 and the frame 12, in which a compressible gasket 18 can be placed. The blind threaded holes 14 can be of the M5 variety. The screws 15 can be received by the blind threaded holes 14, compressing the gasket 16 between the insert panel 110 and the frame 12. Once secured in place against the gasket 16, the insert panel 110 forms an airtight seal within the insert panel section 10. As previously discussed herein, this panel seal can be implemented for a variety of section panels, including, but not limited to, the insert panel 110 and the window panel 120, as shown in Figure 3.

根據根據本教示的可壓縮墊片之各種具體實例,用於框構件密封及面板密封之可壓縮墊片材料可選自多種可壓縮聚合材料,例如(但不限於),在封閉氣室式聚合材料之類別中的任何者,在此項技術領域中亦被稱作膨脹橡膠材料或膨脹聚合物材料。簡要地,按氣體封裝於離散氣室中之方式製備封閉氣室式聚合物,其中每一離散氣室由聚合材料封裝。對於在框及面板組件之氣密性密封中使用合乎需要的可壓縮封閉氣室式聚合墊片材料之性質包括(但不限於)其對廣泛範圍的化學物質的化學侵蝕穩固,擁有優異的防濕性質,在寬泛的溫度範圍上有回彈性,且其抵抗永久壓縮變形。一般而言,與開放氣室式結構之聚合材料相比,封閉氣室式聚合材料具有較高之尺寸穩定性、較低水分吸收係數及較高強度。可藉以製成封閉氣室式聚合材料的各種類型之聚合材料包括(例如但不限於)聚矽氧、氯丁橡膠、乙烯-聚丙烯-二烯三元共聚物(EPT);使用乙烯-聚丙烯-二烯單體(EPDM)製造之聚合物及複合物、乙烯腈、苯乙烯-丁二烯橡膠(SBR)及其各種共聚物及摻合物。According to various specific examples of compressible gaskets according to the present teachings, the compressible gasket materials used for frame member sealing and panel sealing can be selected from a variety of compressible polymer materials, such as (but not limited to), any of the categories of closed air cell polymer materials, also known as expanded rubber materials or expanded polymer materials in this technical field. Briefly, closed air cell polymers are prepared in a manner of gas encapsulation in discrete air cells, wherein each discrete air cell is encapsulated by a polymer material. The properties of compressible closed-cell polymeric gasket materials that are desirable for use in hermetic sealing of frame and panel assemblies include, but are not limited to, their chemical corrosion resistance to a wide range of chemicals, their excellent moisture barrier properties, their resilience over a wide temperature range, and their resistance to permanent compression deformation. In general, closed-cell polymeric materials have higher dimensional stability, lower moisture absorption coefficients, and higher strength than open-cell polymeric materials. Various types of polymeric materials from which closed cell polymeric materials may be made include, for example but not limited to, silicones, neoprene, ethylene-polypropylene-diene terpolymers (EPT); polymers and compounds made using ethylene-polypropylene-diene monomer (EPDM), vinyl nitrile, styrene-butadiene rubber (SBR), and various copolymers and blends thereof.

僅當包含塊材之氣室在使用期間保持完整時,才能維持封閉氣室式聚合物之合乎需要的材料性質。在此點上,按可超過針對封閉氣室式聚合物設定之材料規範(例如,超過用於在規定溫度或壓縮範圍內使用之規範)的方式使用此材料可造成墊片密封之降級。在用於密封框面板區段中之框構件及區段面板的封閉氣室式聚合物墊片之各種具體實例中,此等材料之壓縮不應超過約50%至約70%之間的偏轉,且為了最佳效能,可為在約20%至約40%之間的偏轉。The desirable material properties of closed cell polymers can only be maintained if the air cells comprising the block remain intact during use. In this regard, use of such materials in a manner that may exceed the material specifications set for the closed cell polymers (e.g., exceeding the specifications for use within a specified temperature or compression range) may result in degradation of the gasket seal. In various specific examples of closed cell polymer gaskets used to seal frame members and segment panels in frame panel segments, compression of such materials should not exceed deflections of between about 50% and about 70%, and for optimal performance, may be between about 20% and about 40%.

除了封閉氣室式可壓縮墊片材料之外,具有用於在建構根據本教示之氣體封裝組裝件之具體實例的過程中使用的所要屬性之可壓縮墊片材料之類別之另一實例包括中空擠壓之可壓縮墊片材料之類別。作為一材料類別的中空擠壓之墊片材料具有合乎需要之屬性,包括(但不限於)其對廣泛範圍的化學物質的化學侵蝕穩固,擁有優異的防濕性質,在寬泛的溫度範圍上有回彈性,且其抵抗永久壓縮變形。此等中空擠壓之可壓縮墊片材料可呈廣泛多種外觀尺寸,諸如(但不限於),U形氣室、D型氣室、正方形氣室、矩形氣室以及多種定製外觀尺寸的中空擠壓之墊片材料中之任何者。各種中空擠壓之墊片材料可自用於封閉氣室式可壓縮墊片製造之聚合材料製造。舉例而言(但不限於),中空擠壓之墊片之各種具體實例可自以下各物製造:聚矽氧、氯丁橡膠、乙烯-聚丙烯-二烯三元共聚物(EPT);使用乙烯-聚丙烯-二烯單體(EPDM)製造之聚合物及複合物、乙烯腈、苯乙烯-丁二烯橡膠(SBR)及其各種共聚物及摻合物。此等中空氣室墊片材料之壓縮不應超過約50%偏轉,以便維持所要的屬性。雖然封閉氣室式可壓縮墊片材料之類別及中空擠壓之可壓縮墊片材料之類別已被給定為實例,但具有所要屬性之任何可壓縮墊片材料可用於密封結構組件(諸如,各種壁及頂板框構件)以及密封面板區段框中之各種面板,如由本教示所提供。In addition to closed-cell compressible gasket materials, another example of a class of compressible gasket materials having desirable properties for use in constructing specific examples of gas enclosure assemblies according to the present teachings includes the class of hollow extruded compressible gasket materials. Hollow extruded gasket materials as a class of materials have desirable properties including, but not limited to, their chemical erosion stability to a wide range of chemicals, their excellent moisture barrier properties, their resilience over a wide temperature range, and their resistance to permanent compression deformation. These hollow extruded compressible gasket materials can be in a wide variety of external dimensions, such as (but not limited to), any of a U-shaped air chamber, a D-shaped air chamber, a square air chamber, a rectangular air chamber, and a variety of custom external dimensions of hollow extruded gasket materials. Various hollow extruded gasket materials can be made from polymeric materials used in the manufacture of closed air chamber compressible gaskets. For example (but not limited to), various specific examples of hollow extruded gaskets can be made from the following: polysilicone, neoprene, ethylene-polypropylene-diene terpolymer (EPT); polymers and composites made using ethylene-polypropylene-diene monomer (EPDM), vinyl nitrile, styrene-butadiene rubber (SBR) and various copolymers and blends thereof. Compression of such hollow cell gasket materials should not exceed about 50% deflection in order to maintain the desired properties. Although the classes of closed cell compressible gasket materials and the classes of hollow extrusion compressible gasket materials have been given as examples, any compressible gasket material having the desired properties may be used to seal structural components (e.g., various wall and ceiling frame members) and to seal various panels in panel section frames as provided by the present teachings.

圖8為本教示的頂板面板(例如,圖1A之氣體封裝組裝件100之頂板面板250')之各種具體實例之仰視圖。根據用於氣體封裝之組裝的本教示之各種具體實例,可在頂板面板(例如,圖1A之氣體封裝組裝件100之頂板面板250')之內部頂表面上裝設照明設備。如圖8中所描繪,具有內部部分251之頂板框250可具有裝設於各種框構件之內部部分上的照明設備。舉例而言,頂板框250可具有兩個頂板框區段40,其共同地具有兩個頂板框樑42及44。每一頂板框區段40可具有朝向頂板框250之內部定位的第一側41及朝向頂板框250之外部定位的第二側43。對於提供氣體封裝之照明的根據本教示之各種具體實例,可裝設數對照明元件46。每一對照明元件46可包括最接近頂板框區段40之第一側41的第一照明元件45,及最接近第二側43的第二照明元件47。圖8中展示的照明元件之數目、定位及分群係例示性的。可按任何所要的或合適方式變化照明元件之數目及分群。在各種具體實例中,可平地安裝照明元件,而在其他具體實例中,其可經安裝使得其可移動至多種位置及角度。照明元件之置放不限於頂部面板頂板433,而可位於(另外或在替代方案中)任一其他內表面、外表面及圖1A中展示的氣體封裝組裝件100之表面之組合上。FIG8 is a top view of various specific examples of the ceiling panel (e.g., ceiling panel 250' of the gas packaging assembly 100 of FIG1A) of the present teaching. According to various specific examples of the present teaching for assembly of gas packaging, lighting equipment can be installed on the inner top surface of the ceiling panel (e.g., ceiling panel 250' of the gas packaging assembly 100 of FIG1A). As depicted in FIG8, a ceiling frame 250 having an inner portion 251 can have lighting equipment installed on the inner portions of various frame members. For example, the ceiling frame 250 can have two ceiling frame sections 40, which together have two ceiling frame beams 42 and 44. Each top frame section 40 may have a first side 41 positioned toward the interior of the top frame 250 and a second side 43 positioned toward the exterior of the top frame 250. For various specific examples according to the present teachings for providing illumination of a gas enclosure, several pairs of lighting elements 46 may be installed. Each pair of lighting elements 46 may include a first lighting element 45 closest to the first side 41 of the top frame section 40, and a second lighting element 47 closest to the second side 43. The number, positioning, and grouping of lighting elements shown in FIG. 8 are exemplary. The number and grouping of lighting elements may be varied in any desired or appropriate manner. In various specific examples, the lighting elements may be mounted flat, and in other specific examples, they may be mounted so that they can be moved to a variety of positions and angles. The placement of the lighting elements is not limited to the top panel 433, but may be located on (in addition or in the alternative) any other interior surface, exterior surface, and combination of surfaces of the gas enclosure assembly 100 shown in Figure 1A.

各種照明元件可包含任何數目個燈、任何類型之燈或燈之任何組合,例如,鹵素燈、白色燈、白熾燈、弧光燈或發光二極體或器件(LED)。舉例而言,每一照明元件可包含1個LED至約100個LED、約10個LED至約50個LED或大於100個LED。LED或其他照明器件可發射在色彩光譜中、在色彩光譜外或其組合的任一色彩或色彩組合。根據用於OLED材料之噴墨印刷的氣體封裝組裝件之各種具體實例,因為一些材料對一些波長之光敏感,所以用於裝設於氣體封裝組裝件中的照明器件之光之波長可被具體選擇以避免在處理期間之材料降級。舉例而言,可將4X冷白LED用作4X黃LED或其任何組合。4X冷白LED之一實例為可購自加利福尼亞州Sunnyvale之IDEC Corporation的LF1B-D4S-2THWW4。可使用的4X黃LED之一實例為亦可購自IDEC Corporation之LF1B-D4S-2SHY6。LED或其他照明元件可經定位於頂板框250之內部部分251上或氣體封裝組裝件之另一表面上或自該內部部分上或該另一表面上之任一位置懸掛。照明元件不限於LED。可使用任一合適的照明元件或照明元件之組合。圖9為IDEC LED光譜之曲線圖且展示對應於當峰值強度為100%時之強度的X軸及對應於波長(以奈米計)之Y軸。展示用於LF1B黃類型、黃螢光燈、LF1B白型LED、LF1B冷白型LED及LF1B紅型LED之光譜。根據本教示之各種具體實例,可使用其他光譜及光譜之組合。The various lighting elements may include any number of lamps, any type of lamp, or any combination of lamps, such as halogen lamps, white lamps, incandescent lamps, arc lamps, or light emitting diodes or devices (LEDs). For example, each lighting element may include 1 LED to about 100 LEDs, about 10 LEDs to about 50 LEDs, or more than 100 LEDs. The LEDs or other lighting devices may emit any color or combination of colors in the color spectrum, outside the color spectrum, or a combination thereof. According to various specific examples of gas encapsulation assemblies for inkjet printing of OLED materials, because some materials are sensitive to light of certain wavelengths, the wavelength of light used for lighting devices installed in the gas encapsulation assembly can be specifically selected to avoid material degradation during processing. For example, a 4X cool white LED may be used as a 4X yellow LED or any combination thereof. An example of a 4X cool white LED is the LF1B-D4S-2THWW4 available from IDEC Corporation of Sunnyvale, California. An example of a 4X yellow LED that may be used is the LF1B-D4S-2SHY6 also available from IDEC Corporation. The LED or other lighting element may be positioned on the inner portion 251 of the top panel frame 250 or on another surface of the gas encapsulated assembly or suspended from any location on the inner portion or on the other surface. The lighting element is not limited to an LED. Any suitable lighting element or combination of lighting elements may be used. FIG. 9 is a graph of the IDEC LED spectrum and shows an X-axis corresponding to the intensity when the peak intensity is 100% and a Y-axis corresponding to the wavelength (in nanometers). Spectra for LF1B yellow type, yellow fluorescent lamp, LF1B white type LED, LF1B cool white type LED and LF1B red type LED are shown. Other spectra and combinations of spectra can be used according to various specific examples of the present teachings.

回想起按使氣體封裝組裝件之內部容積最小化且同時最佳化工作空間以容納各種OLED印刷系統之各種佔據面積的方式建構氣體封裝組裝件之各種具體實例。如此建構的氣體封裝組裝件之各種具體實例另外使得易於在處理期間自外部接取氣體封裝組裝件之內部及易於接取內部以為了維護,同時使停機時間最小化。在此點上,根據本教示的氣體封裝組裝件之各種具體實例可具有關於各種OLED印刷系統之各種佔據面積的輪廓。Recall that various embodiments of gas encapsulation assemblies are constructed in a manner that minimizes the internal volume of the gas encapsulation assembly while optimizing the workspace to accommodate various footprints of various OLED printing systems. Various embodiments of gas encapsulation assemblies so constructed additionally provide easy external access to the interior of the gas encapsulation assembly during processing and easy access to the interior for maintenance while minimizing downtime. In this regard, various embodiments of gas encapsulation assemblies according to the present teachings may have various footprints for various OLED printing systems.

根據本教示之系統及方法,框構件建構、面板建構、框及面板密封以及氣體封裝(諸如,圖1A之氣體封裝100)之建構可應用於多種大小及設計之氣體封裝。氣體封裝組裝件之各種具體實例可具有經建構以提供氣體封裝組裝件之輪廓的各種框構件。本教示之氣體封裝組裝件之各種具體實例可容納一OLED印刷系統,同時最佳化工作空間以使惰性氣體容積最小化,且亦允許易於在處理期間自外部接取OLED印刷系統。在此點上,本教示之各種氣體封裝組裝件可在輪廓拓撲及容積上有變化。作為非限制性實例,根據本教示之輪廓化氣體封裝之各種具體實例可具有用於容納能夠印刷自Gen 3.5至Gen 10之基板大小的印刷系統之各種具體實例的在約6 m 3至約95 m 3之間的氣體封裝容積。藉由再一非限制性實例,根據本教示之輪廓化氣體封裝之各種具體實例可具有用於容納能夠印刷(例如)Gen 5.5至Gen 8.5基板大小的印刷系統之各種具體實例的在約15 m 3至約30 m 3之間的氣體封裝容積。與具有針對寬度、長度及高度之非輪廓化尺寸之非輪廓化封裝相比,輪廓化氣體封裝之此等具體實例可具有在約30%至約70%之間的容積節省。 According to the systems and methods of the present teachings, the construction of frame components, panel construction, frame and panel sealing, and gas packages (e.g., gas package 100 of Figure 1A) can be applied to gas packages of various sizes and designs. Various specific embodiments of the gas package assembly can have various frame components constructed to provide the outline of the gas package assembly. Various specific embodiments of the gas package assembly of the present teachings can accommodate an OLED printing system while optimizing the working space to minimize the inert gas volume, and also allow easy access to the OLED printing system from the outside during processing. In this regard, the various gas package assemblies of the present teachings can vary in outline topology and volume. As a non-limiting example, various embodiments of contoured gas packages according to the present teachings may have a gas package volume between about 6 m 3 and about 95 m 3 for accommodating various embodiments of printing systems capable of printing substrate sizes from Gen 3.5 to Gen 10. By way of yet another non-limiting example, various embodiments of contoured gas packages according to the present teachings may have a gas package volume between about 15 m 3 and about 30 m 3 for accommodating various embodiments of printing systems capable of printing, for example, Gen 5.5 to Gen 8.5 substrate sizes. These embodiments of contoured gas packages may have a volume savings of between about 30% and about 70% compared to a non-contoured package having non-contoured dimensions for width, length, and height.

圖9之氣體封裝組裝件1000可具有在本教示中針對圖1A之例示性氣體封裝組裝件100所敍述之所有特徵。舉例而言(但不限於),氣體封裝組裝件1000可利用在建構及解構之循環中提供氣密性封裝的根據本教示之密封。基於氣體封裝組裝件1000的氣體封裝系統之各種具體實例可具有一氣體淨化系統,該氣體淨化系統可將包括各種反應性大氣源氣體(諸如,水蒸氣及氧)以及有機溶劑蒸氣的各種反應性物質中之每一物質之含量維持處於100 ppm或更低,例如,處於10 ppm或更低,處於1.0 ppm或更低,或處於0.1 ppm或更低。The gas packaging assembly 1000 of FIG. 9 may have all the features described in the present teachings for the exemplary gas packaging assembly 100 of FIG. 1A. For example, but not limited to, the gas packaging assembly 1000 may utilize a seal according to the present teachings that provides an airtight package in a cycle of construction and deconstruction. Various specific examples of gas packaging systems based on the gas packaging assembly 1000 may have a gas purification system that can maintain the content of each of various reactive substances including various reactive atmospheric source gases (e.g., water vapor and oxygen) and organic solvent vapor at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

另外,如本文中隨後將更詳細地論述,基於(例如但不限於)圖1A之氣體封裝組裝件100及圖9之氣體封裝組裝件1000的氣體封裝系統之各種具體實例可具有可提供層流環境之循環及過濾系統,層流環境可使亂流最小化且可藉由維持符合國際標準組織標準(ISO) 14644-1:1999(如由第1類別至第5類別指定)之標準的空中顆粒含量來創造實質上低粒環境。可使用(例如)攜帶型粒子計數器件在印刷製程前針對氣體封裝系統之各種具體實例執行空中顆粒物之判定,用於系統驗證。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行空中顆粒物之判定,作為持續進行之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行空中顆粒物之判定,用於系統驗證。In addition, as will be discussed in greater detail later herein, various embodiments of gas packaging systems based on, for example but not limited to, the gas packaging assembly 100 of FIG. 1A and the gas packaging assembly 1000 of FIG. 9 may have a circulation and filtration system that may provide a laminar flow environment that minimizes turbulence and may create a substantially low-particle environment by maintaining an airborne particle content that complies with the standards of the International Organization for Standardization (ISO) 14644-1:1999, as specified by Class 1 through Class 5. Airborne particulate matter determination may be performed for various embodiments of the gas packaging system prior to a printing process using, for example, a portable particle counting device for system validation. In various embodiments of gas packaging systems, airborne particle determination can be performed in situ while printing substrates as an ongoing quality check. In various embodiments of gas packaging systems, airborne particle determination can be performed in situ before printing substrates and also while printing substrates for system validation.

另外,對於本教示之氣體封裝系統之各種具體實例,實質上低粒環境可提供實質上低粒基板表面。基於本教示之氣體封裝系統之各種具體實例的模型化表明,在無本教示之各種粒子控制系統之情況下,對於在0.1 μm及更大之大小範圍中的粒子,每平方公尺基板每印刷循環的基板上沈積可在大於約1百萬至大於約1千萬個粒子之間。此等計算表明,在無本教示之各種粒子控制系統之情況下,對於在約2 μm及更大之大小範圍中的粒子,每平方公尺基板每印刷循環的基板上沈積可在大於約1000至大於約10,000個粒子之間。可使用(例如)測試基板在印刷基板前針對氣體封裝系統之各種具體實例執行基板上的顆粒物的基板上分佈之判定,用於系統驗證。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行顆粒物之基板上分佈之判定,作為持續進行之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行顆粒物之基板上分佈之判定,用於系統驗證。Additionally, for various specific embodiments of the gas packaging system of the present teachings, a substantially low particle environment can provide a substantially low particle substrate surface. Modeling based on various specific embodiments of the gas packaging system of the present teachings indicates that, without various particle control systems of the present teachings, for particles in the size range of 0.1 μm and larger, the deposition on the substrate per printing cycle can be between greater than about 1 million and greater than about 10 million particles per square meter of substrate. Such calculations indicate that, without various particle control systems of the present teachings, for particles in the size range of about 2 μm and larger, the deposition on the substrate per printing cycle can be between greater than about 1000 and greater than about 10,000 particles per square meter of substrate. Determination of the on-substrate distribution of particles on a substrate can be performed for various embodiments of a gas packaging system using, for example, a test substrate before printing the substrate for system validation. In various embodiments of a gas packaging system, determination of the on-substrate distribution of particles can be performed in situ while printing the substrate as an ongoing quality check. For various embodiments of a gas packaging system, determination of the on-substrate distribution of particles can be performed in situ before printing the substrate and additionally while printing the substrate for system validation.

氣體封裝系統之各種具體實例可具有可維持實質上低粒環境之一粒子控制系統,從而提供在約0.1 μm或更大至約10 μm或更大之間的粒子之基板上粒子規範。對於目標粒徑範圍中之每一者,基板上粒子規範之各種具體實例可易於自每分鐘每平方公尺基板之平均基板上粒子分佈轉換至每分鐘每基板之平均基板上粒子分佈。如本文中先前所論述,可易於經由基板(例如,具體代大小之基板)與彼基板代之對應面積之間的已知關係進行此轉換。另外,可易於將每分鐘每平方公尺基板之平均基板上粒子分佈轉換至多種單位時間表達中之任何者。舉例而言,除了在標準時間單位(例如,秒、分鐘及天)之間的轉換外,亦可使用與處理具體有關之時間單位。舉例而言,如本文中先前所論述,印刷循環可與時間單位相關聯。Various embodiments of the gas packaging system can have a particle control system that can maintain a substantially low particle environment, thereby providing an on-substrate particle specification for particles between about 0.1 μm or greater to about 10 μm or greater. For each of the target particle size ranges, various embodiments of the on-substrate particle specification can be easily converted from an average on-substrate particle distribution per square meter of substrate per minute to an average on-substrate particle distribution per substrate per minute. As previously discussed herein, this conversion can be easily performed via a known relationship between a substrate (e.g., a substrate of a particular generation size) and the corresponding area of that substrate generation. In addition, the average on-substrate particle distribution per square meter of substrate per minute can be easily converted to any of a variety of unit time expressions. For example, in addition to conversions between standard time units (e.g., seconds, minutes, and days), process-specific time units may also be used. For example, as discussed previously herein, a print cycle may be associated with a time unit.

本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於10 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於2 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。對於本教示之氣體封裝系統之各種具體實例,可維持低粒環境,從而對於大小大於或等於0.3 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 10 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 5 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 2 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 1 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.5 μm. For various embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.3 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per minute per square meter of substrate for particles greater than or equal to 0.1 μm in size.

圖9描繪根據本教示之氣體封裝組裝件之各種具體實例的氣體封裝組裝件1000之透視圖。氣體封裝組裝件1000可包括前部面板組裝件1200'、中間面板組裝件1300'及後部面板組裝件1400'。前部面板組裝件1200'可包括前部頂板面板組裝件1260'、可具有用於收納基板之開口1242的前部壁面板組裝件1240'及前部基底面板組裝件1220'。後部面板組裝件1400'可包括後部頂板面板組裝件1460'、後部壁面板組裝件1440'及後部基底面板組裝件1420'。中間面板組裝件1300'可包括第一中間封裝面板組裝件1340'、中間壁及頂板面板組裝件1360'及第二中間封裝面板組裝件1380'以及中間基底面板組裝件1320'。FIG9 depicts a perspective view of a gas package assembly 1000 according to various specific examples of a gas package assembly of the present teachings. The gas package assembly 1000 may include a front panel assembly 1200', a middle panel assembly 1300', and a rear panel assembly 1400'. The front panel assembly 1200' may include a front top panel assembly 1260', a front wall panel assembly 1240' that may have an opening 1242 for receiving a substrate, and a front base panel assembly 1220'. The rear panel assembly 1400' may include a rear top panel assembly 1460', a rear wall panel assembly 1440', and a rear base panel assembly 1420'. The middle panel assembly 1300' may include a first middle package panel assembly 1340', a middle wall and ceiling panel assembly 1360', a second middle package panel assembly 1380' and a middle base panel assembly 1320'.

另外,中間面板組裝件1300'可包括第一印刷頭管理系統輔助面板組裝件1330'以及第二印刷頭管理系統輔助面板組裝件(圖中未示)。如本文中先前所論述,建構為氣體封裝組裝件之一區段的輔助封裝之各種具體實例可被與氣體封裝系統之工作容積可密封地隔離。輔助封裝與(例如)印刷系統封裝之此實體隔離可使得能夠進行各種程序(例如但不限於對印刷頭組裝件之各種維護程序)同時極少打斷或不打斷印刷製程,藉此最小化或消除氣體封裝系統停機時間。Additionally, the middle panel assembly 1300' may include a first printhead management system auxiliary panel assembly 1330' and a second printhead management system auxiliary panel assembly (not shown). As previously discussed herein, various specific instances of an auxiliary package constructed as a section of a gas package assembly may be sealably isolated from a working volume of a gas package system. This physical isolation of the auxiliary package from, for example, a printing system package may enable various procedures (such as, but not limited to, various maintenance procedures on the printhead assembly) to be performed with little or no interruption to the printing process, thereby minimizing or eliminating gas package system downtime.

如圖10A中所描繪,氣體封裝組裝件1000可包括前部基底面板組裝件1220'、中間基底面板組裝件1320'及後部基底面板組裝件1420',該等面板組裝件當經完全建構時形成其上可安裝OLED印刷系統2000之相鄰基底或底盤。按與針對圖1A之氣體封裝組裝件100所描述類似的方式,氣體封裝組裝件1000的包含前部面板組裝件1200'、中間面板組裝件1300'及後部面板組裝件1400'之各種框構件及面板可接合於OLED印刷系統2000周圍以形成印刷系統封裝。因此,完全建構之氣體封裝組裝件(諸如,氣體封裝組裝件1000)當與各種環境控制系統整合時可形成包括OLED印刷系統2000之各種具體實例的氣體封裝系統之各種具體實例。根據如先前所描述的本教示之氣體封裝系統之各種具體實例,由氣體封裝組裝件界定的內部容積之環境控制可包括對照明之控制(例如,藉由特定波長之燈的數目及置放)、使用粒子控制系統之各種具體實例的顆粒物之控制、使用氣體淨化系統之各種具體實例的反應性氣體物質之控制及使用熱控制系統之各種具體實例的氣體封裝組裝件之溫度控制。As depicted in FIG10A , the gas package assembly 1000 may include a front substrate panel assembly 1220′, a middle substrate panel assembly 1320′, and a rear substrate panel assembly 1420′, which when fully constructed form an adjacent substrate or chassis upon which the OLED printing system 2000 may be mounted. In a manner similar to that described for the gas package assembly 100 of FIG1A , the various frame components and panels of the gas package assembly 1000 including the front panel assembly 1200′, the middle panel assembly 1300′, and the rear panel assembly 1400′ may be joined around the OLED printing system 2000 to form a printing system package. Thus, a fully constructed gas packaging assembly (e.g., gas packaging assembly 1000) when integrated with various environmental control systems can form various embodiments of gas packaging systems including various embodiments of OLED printing system 2000. According to various embodiments of the gas packaging system of the present teachings as previously described, environmental control of the internal volume defined by the gas packaging assembly can include control of lighting (e.g., by the number and placement of lamps of a particular wavelength), control of particulate matter using various embodiments of a particle control system, control of reactive gas species using various embodiments of a gas purification system, and temperature control of the gas packaging assembly using various embodiments of a thermal control system.

圖10B中之展開圖中展示的OLED噴墨印刷系統(諸如,圖10A之OLED印刷系統2000)可包含允許將墨滴可靠地置放至基板上之特定位置上之若干個器件及裝置。此等器件及裝置可包括(但不限於)印刷頭組裝件、墨水傳遞系統、用於在印刷頭組裝件與基板之間提供相對移動之運動系統、基板支撐裝置、基板裝載及卸載系統及印刷頭管理系統。The OLED inkjet printing system shown in the expanded view of FIG10B (e.g., OLED printing system 2000 of FIG10A) may include a number of components and devices that allow ink droplets to be reliably placed at specific locations on a substrate. Such components and devices may include, but are not limited to, a printhead assembly, an ink delivery system, a motion system for providing relative movement between the printhead assembly and the substrate, a substrate support device, a substrate loading and unloading system, and a printhead management system.

印刷頭組裝件可包括至少一噴墨頭,其具有能夠按受控速率、速度及大小噴出墨水滴之至少一孔。噴墨頭由將墨水提供至噴墨頭的墨水供應系統饋入。如在圖10B之展開圖中所展示,OLED噴墨印刷系統2000可具有一基板(諸如,基板2050),其可由基板支撐裝置支撐,基板支撐裝置諸如夾盤,例如(但不限於)真空夾盤、具有壓力端口之基板浮動夾盤及具有真空及壓力端口之基板浮動夾盤。在本教示之系統及方法之各種具體實例中,基板支撐裝置可為基板浮動台。如本文中隨後將更詳細地論述,圖10B之基板浮動台2200可用於支撐基板2050,且與Y軸運動系統一起可為提供基板2050之無摩擦傳送的基板傳送系統之部分。本教示之Y軸運動系統可包括第一Y軸軌道2351及第二Y軸軌道2352,其可包括用於固持基板之一夾爪系統(圖中未示)。Y軸運動可由線性空氣軸承或線性機械系統提供。圖10A及圖10B中展示的OLED噴墨印刷系統2000之基板浮動台2200可界定基板2050在印刷製程期間穿過圖9之氣體封裝組裝件1000之行進。The print head assembly may include at least one inkjet head having at least one orifice capable of ejecting ink droplets at a controlled rate, speed, and size. The inkjet head is fed by an ink supply system that provides ink to the inkjet head. As shown in the expanded view of FIG. 10B , the OLED inkjet printing system 2000 may have a substrate (e.g., substrate 2050) that may be supported by a substrate support device, such as a chuck, for example (but not limited to) a vacuum chuck, a substrate floating chuck with a pressure port, and a substrate floating chuck with a vacuum and pressure port. In various specific examples of the systems and methods of the present teachings, the substrate support device may be a substrate floating table. As will be discussed in more detail later herein, the substrate floatation stage 2200 of FIG. 10B can be used to support a substrate 2050 and, together with a Y-axis motion system, can be part of a substrate transport system that provides frictionless transport of the substrate 2050. The Y-axis motion system of the present teachings can include a first Y-axis track 2351 and a second Y-axis track 2352, which can include a clamping system (not shown) for holding the substrate. The Y-axis motion can be provided by a linear air bearing or a linear mechanical system. The substrate floatation stage 2200 of the OLED inkjet printing system 2000 shown in FIGS. 10A and 10B can define the travel of the substrate 2050 through the gas encapsulation assembly 1000 of FIG. 9 during the printing process.

印刷需要在印刷頭組裝件與基板之間的相對運動。此藉由運動系統(典型地,高架或分裂軸線XYZ系統)實現。印刷頭組裝件可在靜止基板上移動(高架式),或在分裂軸線組態之情況下,印刷頭及基板皆可移動。在另一具體實例中,印刷頭組裝件可實質上靜止(例如,在X及Y軸上),且基板可相對於印刷頭在X及Y軸上移動,其中Z軸運動由基板支撐裝置或由與印刷頭組裝件相關聯之Z軸運動系統提供。隨著印刷頭相對於基板移動,在正確的時間噴出待沈積於基板上之所要的位置中之墨水滴。可使用基板裝載及卸載系統插入基板及自印刷機移除基板。取決於印刷機組態,此可藉由機械傳送機、具有傳送組裝件之基板浮動台或具有末端執行器之基板轉移機器人實現。印刷頭管理系統可包含允許此等量測任務(諸如,檢查噴嘴發射以及量測來自印刷頭中之每一噴嘴的滴體積、速度及軌跡)及維護任務(諸如,擦拭或吸乾噴墨噴嘴表面的過多墨水、藉由經由印刷頭自墨水供應器噴出墨水且至廢料盆內來灌注且清洗印刷頭,及替換印刷頭)之若干個子系統。考慮到可組成OLED印刷系統的多種組件,OLED印刷系統之各種具體實例可具有多種佔據面積及外觀尺寸。Printing requires relative motion between the printhead assembly and the substrate. This is accomplished by a motion system, typically an overhead or split-axis XYZ system. The printhead assembly may move over a stationary substrate (overhead), or in the case of a split-axis configuration, both the printhead and substrate may move. In another specific example, the printhead assembly may be substantially stationary (e.g., in the X and Y axes), and the substrate may move in the X and Y axes relative to the printhead, with Z-axis motion provided by a substrate support device or by a Z-axis motion system associated with the printhead assembly. As the printhead moves relative to the substrate, ink drops are ejected at the correct time to be deposited in the desired location on the substrate. Substrates may be inserted and removed from the printer using a substrate loading and unloading system. Depending on the printer configuration, this may be accomplished by a mechanical conveyor, a substrate float table with a conveyor assembly, or a substrate transfer robot with an end effector. The print head management system may include several subsystems that allow such metrology tasks (e.g., checking nozzle firing and measuring drop volume, velocity, and trajectory from each nozzle in the print head) and maintenance tasks (e.g., wiping or blotting excess ink from the inkjet nozzle surface, priming and cleaning the print head by ejecting ink from an ink supply through the print head and into a waste basin, and replacing the print head). Given the variety of components that may make up an OLED printing system, various specific embodiments of an OLED printing system may have a variety of footprints and physical sizes.

關於圖10B,印刷系統基底2100可包括第一升流管(不可見)及第二升流管2122,橋接部2130安裝於其上。對於OLED印刷系統2000之各種具體實例,橋接部2130可支撐第一X軸托架組裝件2301及第二X軸托架組裝件2302,其可分別控制第一印刷頭組裝件2501及第二印刷頭組裝件2502跨橋接部2130之移動。對於印刷系統2000之各種具體實例,第一X軸托架組裝件2301及第二X軸托架組裝件2302可利用為固有地低粒產生之線性空氣軸承運動系統。根據本教示之印刷系統之各種具體實例,X軸托架可具有安裝於其上之Z軸移動板。在圖10B中,描繪第一X軸托架組裝件2301具有第一Z軸移動板2310,而描繪第二X軸托架組裝件2302具有第二Z軸移動板2312。雖然圖10B描繪兩個托架組裝件及兩個印刷頭組裝件,但對於OLED噴墨印刷系統2000之各種具體實例,可存在單一托架組裝件及單一印刷頭組裝件。舉例而言,可將第一印刷頭組裝件2501及第二印刷頭組裝件2502中之任一者安裝於X, Z軸托架組裝件上,而可將用於檢驗基板2050之特徵的相機系統安裝於第二X, Z軸托架組裝件上。OLED噴墨印刷系統2000之各種具體實例可具有一單一印刷頭組裝件,例如,可將第一印刷頭組裝件2501及第二印刷頭組裝件2502中之任一者安裝於X, Z軸托架組裝件上,而可將用於固化印刷於基板2050上之囊封層的UV燈安裝於第二X, Z軸托架組裝件上。對於OLED噴墨印刷系統2000之各種具體實例,可存在一單一印刷頭組裝件,例如,將第一印刷頭組裝件2501及第二印刷頭組裝件2502中之任一者安裝於X, Z軸托架組裝件上,而可將用於固化印刷於基板2050上之囊封層的熱源安裝於第二托架組裝件上。10B, the printing system substrate 2100 may include a first riser (not visible) and a second riser 2122, with a bridge 2130 mounted thereon. For various embodiments of the OLED printing system 2000, the bridge 2130 may support a first X-axis carriage assembly 2301 and a second X-axis carriage assembly 2302, which may control the movement of a first printhead assembly 2501 and a second printhead assembly 2502 across the bridge 2130, respectively. For various embodiments of the printing system 2000, the first X-axis carriage assembly 2301 and the second X-axis carriage assembly 2302 may utilize a linear air bearing motion system that is inherently low in particle generation. According to various embodiments of the printing system of the present teachings, the X-axis carriage may have a Z-axis translation plate mounted thereon. In FIG. 10B , a first X-axis carriage assembly 2301 is depicted having a first Z-axis translation plate 2310, and a second X-axis carriage assembly 2302 is depicted having a second Z-axis translation plate 2312. Although FIG. 10B depicts two carriage assemblies and two printhead assemblies, for various embodiments of the OLED inkjet printing system 2000, there may be a single carriage assembly and a single printhead assembly. For example, any one of the first print head assembly 2501 and the second print head assembly 2502 may be mounted on an X, Z axis bracket assembly, and a camera system for inspecting features of the substrate 2050 may be mounted on the second X, Z axis bracket assembly. Various specific examples of the OLED inkjet printing system 2000 may have a single print head assembly, for example, any one of the first print head assembly 2501 and the second print head assembly 2502 may be mounted on an X, Z axis bracket assembly, and a UV lamp for curing an encapsulation layer printed on the substrate 2050 may be mounted on the second X, Z axis bracket assembly. For various specific examples of the OLED inkjet printing system 2000, there may be a single print head assembly, for example, either the first print head assembly 2501 or the second print head assembly 2502 may be mounted on an X, Z axis bracket assembly, and a heat source for curing the encapsulation layer printed on the substrate 2050 may be mounted on the second bracket assembly.

在圖10B中,第一X, Z軸托架組裝件2301可用以將可安裝於第一Z軸移動板2310上之第一印刷頭組裝件2501定位於基板2050上,該基板被展示為支撐於基板浮動台2200上。具有第二Z軸移動板2312之第二X, Z軸托架組裝件2302可經類似地組態,以用於控制第二印刷頭組裝件2502相對於基板2050之X-Z軸移動。諸如圖10B之第一印刷頭組裝件2501及第二印刷頭組裝件2502之每一印刷頭組裝件可具有安裝於至少一印刷頭器件中之複數個印刷頭,如在針對第一印刷頭組裝件2501之部分視圖中所描繪,該視圖描繪複數個印刷頭2505。印刷頭器件可包括(例如但不限於)通往至少一印刷頭之流體及電子連接;每一印刷頭具有能夠按受控速率、速度及大小噴出墨水之複數個噴嘴或孔。對於印刷系統2000之各種具體實例,印刷頭組裝件可包括在約1個至約60個之間的印刷頭器件,其中每一印刷頭器件可具有在每一印刷頭器件中的約1個至約30個之間的印刷頭。一印刷頭(例如,工業噴墨頭)可具有在約16個至約2048個之間的噴嘴,噴嘴可排出在約0.1 pL至約200 pL之間的小滴體積。10B , a first X, Z axis carriage assembly 2301 may be used to position a first print head assembly 2501, which may be mounted on a first Z axis translation plate 2310, on a substrate 2050, which is shown supported on a substrate float table 2200. A second X, Z axis carriage assembly 2302 having a second Z axis translation plate 2312 may be similarly configured to control X-Z axis translation of the second print head assembly 2502 relative to the substrate 2050. Each of the first printhead assembly 2501 and the second printhead assembly 2502 of FIG. 10B can have a plurality of printheads mounted in at least one printhead device, as depicted in the partial view for the first printhead assembly 2501, which depicts a plurality of printheads 2505. The printhead device can include, for example but not limited to, fluid and electronic connections to at least one printhead; each printhead has a plurality of nozzles or orifices capable of ejecting ink at a controlled rate, speed, and size. For various specific examples of the printing system 2000, the printhead assembly can include between about 1 and about 60 printhead devices, wherein each printhead device can have between about 1 and about 30 printheads in each printhead device. A printhead (e.g., an industrial inkjet head) may have between about 16 and about 2048 nozzles that may discharge droplet volumes between about 0.1 pL and about 200 pL.

根據本教示之氣體封裝系統之各種具體實例,純粹考慮到印刷頭器件及印刷頭的數目,第一印刷頭管理系統2701及第二印刷頭管理系統2702可收容於輔助封裝中,輔助封裝可在印刷製程期間與印刷系統封裝隔離,以用於執行各種量測及維護任務,而極少打斷或不打斷印刷製程。如可在圖10B中看出,可看出第一印刷頭組裝件2501相對於第一印刷頭管理系統2701定位,以易於執行可由第一印刷頭管理系統裝置2707、2709及2711執行之各種量測及維護程序。裝置2707、2709及2011可為用於執行各種印刷頭管理功能的多種子系統或模組中之任何者。舉例而言,裝置2707、2709及2011可為滴量測模組、印刷頭替換模組、清洗盆模組及吸墨器模組中之任何者。According to various specific examples of the gas packaging system of the present teachings, purely considering the number of printhead devices and printheads, the first printhead management system 2701 and the second printhead management system 2702 can be housed in an auxiliary package that can be isolated from the printing system package during the printing process to perform various measurement and maintenance tasks with little or no interruption to the printing process. As can be seen in Figure 10B, it can be seen that the first printhead assembly 2501 is positioned relative to the first printhead management system 2701 to facilitate the execution of various measurement and maintenance procedures that can be performed by the first printhead management system devices 2707, 2709 and 2711. Devices 2707, 2709, and 2011 may be any of a variety of subsystems or modules for performing various print head management functions. For example, devices 2707, 2709, and 2011 may be any of a drop measurement module, a print head replacement module, a cleaning basin module, and an ink absorber module.

圖10C描繪根據本教示之氣體封裝組裝件及系統之各種具體實例的收容於第一印刷頭管理系統輔助面板組裝件1330'內的第一印刷頭管理系統2701之展開圖。如圖10C中所描繪,將輔助面板組裝件1330'展示為剖示圖以更清晰地看出第一印刷頭管理系統2701之細節。根據本教示之印刷頭管理系統(諸如,圖10C之第一印刷頭管理系統2701)之各種具體實例,裝置2707、2709及2011可為用於執行各種功能的多種子系統或模組。舉例而言,裝置2707、2709及2011可為滴量測模組、印刷頭清洗盆模組及吸墨器模組。如圖10C中所描繪,印刷頭替換模組2713可提供用於銜接至少一印刷頭器件2505之位置。在第一印刷頭管理系統2701之各種具體實例中,可按維護氣體封裝組裝件1000(見圖19)之相同環境規範維護第一印刷頭管理系統輔助面板組裝件1330'。第一印刷頭管理系統輔助面板組裝件1330'可具有經定位用於進行與各種印刷頭管理程序相關聯之任務的把手2530。舉例而言,每一子系統可具有本來即可消耗且需要替換之各種零件,諸如,替換吸墨紙、墨水及廢料儲集器。各種可消耗零件可經包裝以便容易使用把手以完全自動化模式插入。作為非限制性實例,可按可易於插入以用於在吸乾模組內使用之濾筒格式包裝吸墨紙。藉由另一非限制性實例,可將墨水包裝於可替換儲集器中,以及按用於在印刷系統中使用之濾筒格式包裝。可按可易於插入以用於在清洗盆模組內使用之濾筒格式包裝廢料儲集器之各種具體實例。另外,持續使用的印刷系統之各種組件之零件可需要週期性替換。在印刷製程期間,對印刷頭組裝件之便利管理(例如但不限於,印刷頭器件或印刷頭之交換)可為合乎需要的。印刷頭替換模組可具有諸如印刷頭器件或印刷頭之零件,其易於為了使用而插入印刷頭組裝件內。用於檢查噴嘴發射之滴量測模組以及基於對來自每一噴嘴之滴容積、速度及軌跡之光學偵測的量測可具有一來源及一偵測器,其可需要在使用之後的週期性替換。各種可消耗及高利用率零件可經包裝以便容易使用把手以例如完全自動化模式插入。把手2530可具有安裝至臂2534之末端執行器2536。可使用末端執行器組態之各種具體實例,例如,刀片型末端執行器、夾具型末端執行器及夾爪型末端執行器。末端執行器之各種具體實例可包括機械抓緊及夾緊以及氣動或真空輔助式組裝件以致動末端執行器之部分或以其他方式保持印刷頭器件或來自印刷頭器件之印刷頭。FIG. 10C depicts an expanded view of the first printhead management system 2701 housed in the first printhead management system auxiliary panel assembly 1330' according to various specific examples of gas packaging assemblies and systems of the present teachings. As depicted in FIG. 10C, the auxiliary panel assembly 1330' is shown as a cutaway view to more clearly see the details of the first printhead management system 2701. According to various specific examples of the printhead management system of the present teachings (e.g., the first printhead management system 2701 of FIG. 10C), devices 2707, 2709, and 2011 can be a variety of subsystems or modules for performing various functions. For example, devices 2707, 2709, and 2011 can be a drop measurement module, a printhead cleaning basin module, and an ink absorber module. As depicted in FIG. 10C , the printhead replacement module 2713 may provide a location for docking at least one printhead device 2505. In various specific embodiments of the first printhead management system 2701, the first printhead management system auxiliary panel assembly 1330' may be maintained in the same environmental specifications as the gas enclosure assembly 1000 (see FIG. 19 ). The first printhead management system auxiliary panel assembly 1330' may have a handle 2530 positioned for performing tasks associated with various printhead management procedures. For example, each subsystem may have various parts that are inherently consumable and need to be replaced, such as replacement blotters, inks, and waste reservoirs. The various consumable parts may be packaged for easy insertion in a fully automated mode using a handle. As a non-limiting example, blotting paper may be packaged in a cartridge format that can be easily inserted for use in a blotting module. By way of another non-limiting example, ink may be packaged in a replaceable reservoir and in a cartridge format for use in a printing system. Various specific examples of waste reservoirs may be packaged in a cartridge format that can be easily inserted for use in a wash basin module. In addition, parts of various components of a continuously used printing system may require periodic replacement. During the printing process, convenient management of the print head assembly (such as, but not limited to, replacement of print head devices or print heads) may be desirable. A print head replacement module may have parts such as print head devices or print heads that are easily inserted into the print head assembly for use. A drop measurement module for checking nozzle emission and measurements based on optical detection of drop volume, velocity and trajectory from each nozzle may have a source and a detector that may require periodic replacement after use. Various consumable and high-utilization parts may be packaged for easy insertion of the handle, such as in a fully automated mode. The handle 2530 may have an end effector 2536 mounted to an arm 2534. Various specific examples of end effector configurations may be used, such as blade-type end effectors, fixture-type end effectors, and claw-type end effectors. Various specific examples of end effectors may include mechanical gripping and clamping as well as pneumatic or vacuum assisted assemblies to actuate portions of the end effector or otherwise retain a printhead device or a printhead from a printhead device.

關於印刷頭器件或印刷頭之替換,圖10C之印刷頭管理系統2701之印刷頭替換模組2713可包括用於具有至少一印刷頭之印刷頭器件的銜接台,以及用於印刷頭之儲存容器。因為每一印刷頭組裝件(見圖10B)可包括在約1個至約60個之間的印刷頭器件,且每一印刷頭器件可具有在約1個至約30個之間的印刷頭,於是本教示之印刷系統之各種具體實例可具有在約1個至約1800個之間的印刷頭。在印刷頭替換模組2713之各種具體實例中,當印刷頭器件經銜接時,可在不在印刷系統中使用時將安裝至印刷頭器件之每一印刷頭維持在可操作條件中。舉例而言,當置放於銜接台中時,每一印刷頭器件上之印刷頭可連接至墨水供應器及電連接。可將電力提供至每一印刷頭器件上之每一印刷頭,使得可在銜接時施加至每一印刷頭之每一噴嘴的週期性發射脈衝,以便確保噴嘴保持經灌注且不堵塞。圖10C之把手2530可定位成最接近印刷頭組裝件2500。印刷頭組裝件2500可銜接在第一印刷頭管理系統輔助面板組裝件1330'上,如在圖10C中所描繪。在用於交換印刷頭之程序期間,把手2530可自印刷頭組裝件2500移除一目標零件——印刷頭或具有至少一印刷頭之印刷頭器件。把手2530可自印刷頭替換模組2713擷取一替換零件(諸如,印刷頭器件或印刷頭),且完成替換過程。可將移除之零件置放於印刷頭替換模組2713中以供擷取。With respect to replacement of a printhead device or printhead, a printhead replacement module 2713 of the printhead management system 2701 of FIG. 10C may include a docking station for a printhead device having at least one printhead, and a storage container for the printhead. Because each printhead assembly (see FIG. 10B ) may include between about 1 and about 60 printhead devices, and each printhead device may have between about 1 and about 30 printheads, various embodiments of the printing system of the present teachings may have between about 1 and about 1800 printheads. In various embodiments of the printhead replacement module 2713, when a printhead device is docked, each printhead mounted to the printhead device may be maintained in an operable condition when not in use in the printing system. For example, when placed in a docking station, the printhead on each printhead device can be connected to an ink supply and electrical connections. Power can be provided to each printhead on each printhead device so that periodic firing pulses can be applied to each nozzle of each printhead when docked to ensure that the nozzles remain primed and unobstructed. The handle 2530 of Figure 10C can be positioned proximate to the printhead assembly 2500. The printhead assembly 2500 can be docked on the first printhead management system auxiliary panel assembly 1330', as depicted in Figure 10C. During a procedure for exchanging printheads, the handle 2530 can remove a target part - a printhead or a printhead device having at least one printhead - from the printhead assembly 2500. The handle 2530 can pick up a replacement part (e.g., a print head device or a print head) from the print head replacement module 2713 and complete the replacement process. The removed part can be placed in the print head replacement module 2713 for picking up.

關於具有可對第一工作容積封鎖以及可密封地與第一工作容積(例如,印刷系統封裝)隔離之一輔助封裝的氣體封裝組裝件之各種具體實例,再次參看圖10A。如圖10B中所描繪,在OLED印刷系統2000上可存在四個隔離器;支撐OLED印刷系統2000之基板浮動台2200的第一隔離器組2110(第二者未展示於相對側上)及第二隔離器組2112(第二者未展示於相對側上)。對於圖10A之氣體封裝組裝件1000,可將第一隔離器組2110及第二隔離器組2112安裝於各別隔離器井面板(諸如,中間基底面板組裝件1320'之第一隔離器井面板1325'及第二隔離器井面板1327')中之每一者上。對於圖10A之氣體封裝組裝件1000,中間基底面板組裝件1320'可包括第一印刷頭管理系統輔助面板組裝件1330'以及第二印刷頭管理系統輔助面板組裝件1370'。氣體封裝組裝件1000之圖10A描繪可包括第一後壁面板組裝件1338'之第一印刷頭管理系統輔助面板組裝件1330'。類似地,如此描述的為可包括第二後壁面板組裝件1378'之第二印刷頭管理系統輔助面板組裝件1370'。第一印刷頭管理系統輔助面板組裝件1330'之第一後壁面板組裝件1338'可按類似於針對第二後壁面板組裝件1378'所展示之方式建構。可自具有可密封地安裝至第二後壁框組裝件1378之第二密封件支撐面板1375的第二後壁框組裝件1378建構第二印刷頭管理系統輔助面板組裝件1370'之第二後壁面板組裝件1378'。第二密封件支撐面板1375可具有最接近基底2100之第二端(圖中未示)的第二通路1365。第二密封件1367可在第二通路1365周圍安裝於第二密封件支撐面板1375上。第一密封件可類似地定位及安裝於用於第一印刷頭管理系統輔助面板組裝件1330'之第一通路周圍。輔助面板組裝件1330'及輔助面板組裝件1370'中之每一通路可容納使每一維護系統平台,諸如,圖10B之第一維護系統平台2703及第二維護系統平台2704穿過通路。如本文中隨後將更詳細地論述,為了可密封地隔離輔助面板組裝件1330'及輔助面板組裝件1370',該等通路(諸如,圖10A之第二通路1365)必須可密封。預期各種密封件(諸如,可膨脹密封件、波紋管密封件及唇形密封件)可用於在貼附至印刷系統基底之維護平台周圍密封通路(諸如,圖10A之第二通路1365)。For various specific examples of a gas encapsulation assembly having an auxiliary encapsulation that can seal a first working volume and can be hermetically isolated from the first working volume (e.g., a printing system encapsulation), refer again to Figure 10A. As depicted in Figure 10B, there can be four isolators on the OLED printing system 2000; a first isolator set 2110 (the second is not shown on the opposite side) and a second isolator set 2112 (the second is not shown on the opposite side) supporting the substrate floating stage 2200 of the OLED printing system 2000. For the gas packaging assembly 1000 of FIG. 10A , the first isolator set 2110 and the second isolator set 2112 may be mounted on each of the respective isolator well panels (e.g., the first isolator well panel 1325 ' and the second isolator well panel 1327 ' of the middle base panel assembly 1320 '). For the gas packaging assembly 1000 of FIG. 10A , the middle base panel assembly 1320 ' may include a first printhead management system auxiliary panel assembly 1330 ' and a second printhead management system auxiliary panel assembly 1370 '. FIG. 10A of the gas packaging assembly 1000 depicts the first printhead management system auxiliary panel assembly 1330 ' which may include a first back wall panel assembly 1338 '. Similarly, so described is a second printhead management system auxiliary panel assembly 1370' which may include a second rear wall panel assembly 1378'. The first rear wall panel assembly 1338' of the first printhead management system auxiliary panel assembly 1330' may be constructed in a manner similar to that shown for the second rear wall panel assembly 1378'. The second rear wall panel assembly 1378' of the second printhead management system auxiliary panel assembly 1370' may be constructed from a second rear wall frame assembly 1378 having a second seal support panel 1375 sealably mounted to the second rear wall frame assembly 1378. The second seal support panel 1375 may have a second passage 1365 proximate a second end (not shown) of the substrate 2100. A second seal 1367 may be mounted on a second seal support panel 1375 about the second passage 1365. A first seal may be similarly positioned and mounted about a first passage for the first printhead management system auxiliary panel assembly 1330'. Each passage in the auxiliary panel assembly 1330' and the auxiliary panel assembly 1370' may accommodate each maintenance system platform, such as the first maintenance system platform 2703 and the second maintenance system platform 2704 of FIG. 10B, passing through the passage. As will be discussed in more detail later herein, in order to sealably isolate the auxiliary panel assembly 1330' and the auxiliary panel assembly 1370', the passages (e.g., the second passage 1365 of FIG. 10A) must be sealable. It is contemplated that a variety of seals (e.g., inflatable seals, bellows seals, and lip seals) may be used to seal a passage (e.g., second passage 1365 of FIG. 10A ) around a maintenance platform attached to a printing system substrate.

第一印刷頭管理系統輔助面板組裝件1330'及第二印刷頭管理系統輔助面板組裝件1370'可分別包括第一底面板組裝件1341'之第一印刷頭組裝件開口1342及第二底面板組裝件1381'之第二印刷頭組裝件開口1382。第一底面板組裝件1341'在圖10A中被描繪為中間面板組裝件1300'之第一中間封裝面板組裝件1340'之部分。第一底面板組裝件1341'為與第一中間封裝面板組裝件1340'及第一印刷頭管理系統輔助面板組裝件1330'共同之面板組裝件。第二底面板組裝件1381'在圖10A中被描繪為中間面板組裝件1300'之第二中間封裝面板組裝件1380'之部分。第二底面板組裝件1381'為與第二中間封裝面板組裝件1380'及第二印刷頭管理系統輔助面板組裝件1370'共同之面板組裝件。The first printhead management system auxiliary panel assembly 1330' and the second printhead management system auxiliary panel assembly 1370' may include a first printhead assembly opening 1342 of the first bottom panel assembly 1341' and a second printhead assembly opening 1382 of the second bottom panel assembly 1381', respectively. The first bottom panel assembly 1341' is depicted in FIG. 10A as part of the first middle package panel assembly 1340' of the middle panel assembly 1300'. The first bottom panel assembly 1341' is a panel assembly common to the first middle package panel assembly 1340' and the first printhead management system auxiliary panel assembly 1330'. The second bottom panel assembly 1381' is depicted in Figure 10A as part of the second middle package panel assembly 1380' of the middle panel assembly 1300'. The second bottom panel assembly 1381' is a common panel assembly with the second middle package panel assembly 1380' and the second printhead management system auxiliary panel assembly 1370'.

如本文中先前所論述,第一印刷頭組裝件2501可收容於第一印刷頭組裝件封裝2503中,且第二印刷頭組裝件2502可收容於第二印刷頭組裝件封裝2504中。根據本教示之系統及方法,第一印刷頭組裝件封裝2503及第二印刷頭組裝件封裝2504可具有在底部的可具有一輪緣(圖中未示)之一開口,使得可定位各種印刷頭組裝件以用於在印刷製程期間印刷。另外,可如先前針對各種面板組裝件所描述而建構形成外殼的第一印刷頭組裝件封裝2503及第二印刷頭組裝件封裝2504之部分,使得框組裝件構件及面板能夠提供氣密性封裝。As previously discussed herein, first printhead assembly 2501 may be housed in first printhead assembly package 2503, and second printhead assembly 2502 may be housed in second printhead assembly package 2504. In accordance with the systems and methods of the present teachings, first printhead assembly package 2503 and second printhead assembly package 2504 may have an opening at the bottom that may have a rim (not shown) so that various printhead assemblies may be positioned for printing during a printing process. Additionally, portions of first printhead assembly package 2503 and second printhead assembly package 2504 that form the housing may be constructed as previously described for various panel assemblies so that the frame assembly components and panels can provide an airtight package.

諸如先前針對各種框構件之氣密封所描述的,可壓縮墊片可貼附於第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382中之每一者周圍,或替代地,第一印刷頭組裝件封裝2503及第二印刷頭組裝件封裝2504之輪緣周圍。As previously described with respect to the air seals of the various frame components, a compressible gasket may be affixed around each of the first printhead assembly opening 1342 and the second printhead assembly opening 1382, or alternatively, around the rims of the first printhead assembly package 2503 and the second printhead assembly package 2504.

如圖10A中所描繪,第一印刷頭組裝件銜接墊片1345及第二印刷頭組裝件銜接墊片1385可分別貼附於第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382周圍。在各種印刷頭量測及維護程序期間,第一印刷頭組裝件2501及第二印刷頭組裝件2502可分別由第一X, Z軸托架組裝件2301及第二X, Z軸托架組裝件2302分別定位於第一底面板組裝件1341'之第一印刷頭組裝件開口1342及第二底面板組裝件1381'之第二印刷頭組裝件開口1382上。在此點上,對於各種印刷頭量測及維護程序,可分別將第一印刷頭組裝件2501及第二印刷頭組裝件2502定位於第一底面板組裝件1341'之第一印刷頭組裝件開口1342及第二底面板組裝件1381'之第二印刷頭組裝件開口1382上,而不覆蓋或密封第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382。第一X, Z軸托架組裝件2301及第二X, Z軸托架組裝件2302可分別將第一印刷頭組裝件封裝2503及第二印刷頭組裝件封裝2504分別與第一印刷頭管理系統輔助面板組裝件1330'及第二印刷頭管理系統輔助面板組裝件1370'銜接。在各種印刷頭量測及維護程序中,此銜接可有效地閉合第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382,而不需要密封第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382。對於各種印刷頭量測及維護程序,銜接可包括形成在印刷頭組裝件封裝中之每一者與印刷頭管理系統面板組裝件之間的墊片密封。與可密封地閉合通路(諸如,圖10A之第二通路1365及互補第一通路)一起,當將第一印刷頭組裝件封裝2503及第二印刷頭組裝件封裝2504與第一印刷頭管理系統輔助面板組裝件1330'及第二印刷頭管理系統輔助面板組裝件1370'銜接以可密封地閉合第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382時,如此形成之組合結構經氣密封。As depicted in FIG10A , the first printhead assembly anchor pad 1345 and the second printhead assembly anchor pad 1385 may be attached around the first printhead assembly opening 1342 and the second printhead assembly opening 1382, respectively. During various printhead measurement and maintenance procedures, the first printhead assembly 2501 and the second printhead assembly 2502 may be positioned on the first printhead assembly opening 1342 of the first bottom panel assembly 1341′ and the second printhead assembly opening 1382 of the second bottom panel assembly 1381′, respectively, by the first X, Z axis bracket assembly 2301 and the second X, Z axis bracket assembly 2302, respectively. In this regard, for various printhead measurement and maintenance procedures, the first printhead assembly 2501 and the second printhead assembly 2502 may be positioned on the first printhead assembly opening 1342 of the first bottom panel assembly 1341' and the second printhead assembly opening 1382 of the second bottom panel assembly 1381', respectively, without covering or sealing the first printhead assembly opening 1342 and the second printhead assembly opening 1382. The first X, Z axis bracket assembly 2301 and the second X, Z axis bracket assembly 2302 may respectively couple the first printhead assembly package 2503 and the second printhead assembly package 2504 to the first printhead management system auxiliary panel assembly 1330' and the second printhead management system auxiliary panel assembly 1370', respectively. During various printhead measurement and maintenance procedures, this coupling can effectively close the first printhead assembly opening 1342 and the second printhead assembly opening 1382 without the need to seal the first printhead assembly opening 1342 and the second printhead assembly opening 1382. For various printhead measurement and maintenance procedures, the coupling can include a gasket seal formed between each of the printhead assembly packages and the printhead management system panel assembly. Together with sealably closable passages (e.g., second passage 1365 and complementary first passage in FIG. 10A ), when first printhead assembly package 2503 and second printhead assembly package 2504 are coupled to first printhead management system auxiliary panel assembly 1330' and second printhead management system auxiliary panel assembly 1370' to sealably close first printhead assembly opening 1342 and second printhead assembly opening 1382, the combined structure thus formed is hermetically sealed.

另外,根據本教示,可將輔助封裝與(例如)另一內部封裝容積(諸如,印刷系統封裝)以及氣體封裝組裝件之外部隔離,藉由使用結構閉合物可密封地閉合過道,諸如,圖10A之第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382。根據本教示,結構閉合物可包括針對開口或過道之多種可密封覆蓋物;此開口或過道包括封裝面板開口或過道之非限制性實例。根據本教示之系統及方法,閘可為可用以使用氣動、液壓、電或手動致動來可逆地覆蓋或可逆地可密封式閉合任一開口或過道之任何結構閉合物。因而,可使用閘可逆地覆蓋或可逆地可密封式閉合圖10A之第一印刷頭組裝件開口1342及第二印刷頭組裝件開口1382。In addition, according to the present teachings, the auxiliary package can be isolated from, for example, another internal package volume (e.g., a printing system package) and the exterior of the gas package assembly by using a structural closure to sealably close a passage, such as the first printhead assembly opening 1342 and the second printhead assembly opening 1382 of Figure 10A. According to the present teachings, the structural closure can include a variety of sealable covers for openings or passages; such openings or passages include non-limiting examples of package panel openings or passages. According to the systems and methods of the present teachings, the gate can be any structural closure that can be used to reversibly cover or reversibly sealably close any opening or passage using pneumatic, hydraulic, electrical, or manual actuation. Thus, the gates may be used to reversibly cover or reversibly sealably close the first printhead assembly opening 1342 and the second printhead assembly opening 1382 of FIG. 10A.

在圖10B之OLED印刷系統2000之展開圖中,印刷系統之各種具體實例可包括由基板浮動台基底2220支撐之基板浮動台2200。基板浮動台基底2220可安裝於印刷系統基底2100上。OLED印刷系統之基板浮動台2200可支撐基板2050,以及界定基板2050可在OLED基板之印刷期間穿過氣體封裝組裝件1000移動之行程。本教示之Y軸運動系統可包括第一Y軸軌道2351及第二Y軸軌道2352,其可包括用於固持基板之一夾爪系統(圖中未示)。Y軸運動可由線性空氣軸承或線性機械系統提供。在此點上,與運動系統(如圖10B中所描繪,Y軸運動系統)一起,基板浮動台2200可提供穿過印刷系統的基板2050之無摩擦傳送。In the expanded view of the OLED printing system 2000 of FIG. 10B , various specific examples of the printing system may include a substrate floating stage 2200 supported by a substrate floating stage base 2220. The substrate floating stage base 2220 may be mounted on the printing system base 2100. The substrate floating stage 2200 of the OLED printing system may support the substrate 2050 and define a stroke that the substrate 2050 may move through the gas encapsulation assembly 1000 during the printing of the OLED substrate. The Y-axis motion system of the present teaching may include a first Y-axis track 2351 and a second Y-axis track 2352, which may include a clamping system (not shown) for holding the substrate. The Y-axis motion may be provided by a linear air bearing or a linear mechanical system. In this regard, the substrate float stage 2200, in conjunction with a motion system (as depicted in FIG. 10B , a Y-axis motion system), can provide frictionless transport of the substrate 2050 through the printing system.

圖11描繪根據本教示之各種具體實例的浮動台,其用於無摩擦支撐,及與傳送系統一起,用於負載(諸如,圖10B之基板2050)之穩定傳送。浮動台之各種具體實例可用於本教示之氣體封裝系統之各種具體實例中之任何者中。如本文中先前所論述,本教示之氣體封裝系統之各種具體實例可處理自小於Gen 3.5基板(其具有約61 cm×72 cm之尺寸)起的OLED平板顯示器基板之一系列大小以及逐漸變大的代大小。預期,氣體封裝系統之各種具體實例可處理具有約130 cm×150 cm之尺寸的Gen 5.5之基板大小,以及具有約195 cm×225 cm之尺寸的Gen 7.5基板,且可每基板切割成八個42"或六個47''平板及更大。Gen 8.5基板為大致220 cm×250 cm,且可每基板切割至六個55''或八個46''平板。然而,基板代大小不斷提高,使得具有約285 cm×305 cm的尺寸之當前可用之Gen 10基板遠非基板大小之最終一代。另外,自由使用基於玻璃之基板而引起的術語敍述之大小可應用於適合於在OLED印刷中使用的任何材料之基板。對於OLED噴墨印刷系統之各種具體實例,可將多種基板材料(例如但不限於多種玻璃基板材料,以及多種聚合基板材料)用於基板2050。因此,在本教示之氣體封裝系統之各種具體實例中,存在需要在印刷期間之穩定傳送的多種基板大小及材料。FIG. 11 depicts a floating table according to various embodiments of the present teachings for frictionless support and, together with a transport system, for stable transport of a load (e.g., substrate 2050 of FIG. 10B ). Various embodiments of the floating table may be used in any of the various embodiments of the gas packaging system of the present teachings. As previously discussed herein, various embodiments of the gas packaging system of the present teachings may process a range of sizes of OLED flat panel display substrates starting from less than a Gen 3.5 substrate (which has dimensions of approximately 61 cm×72 cm) and progressively larger generation sizes. It is expected that various embodiments of the gas packaging system can handle substrate sizes of Gen 5.5, which has dimensions of approximately 130 cm×150 cm, and Gen 7.5 substrates, which have dimensions of approximately 195 cm×225 cm, and can be cut into eight 42" or six 47" panels per substrate and larger. Gen 8.5 substrates are approximately 220 cm×250 cm, and can be cut into six 55" or eight 46" panels per substrate. However, substrate generation sizes continue to increase, such that the currently available Gen 8.5 substrates have dimensions of approximately 285 cm×305 cm. 10 substrate is far from the final generation of substrate size. In addition, the size described in the terminology resulting from the liberal use of glass-based substrates can be applied to substrates of any material suitable for use in OLED printing. For various specific embodiments of OLED inkjet printing systems, a variety of substrate materials (such as but not limited to a variety of glass substrate materials, and a variety of polymeric substrate materials) can be used for substrate 2050. Therefore, in various specific embodiments of the gas packaging system of the present teachings, there are a variety of substrate sizes and materials that require stable transport during printing.

如圖11中所描繪,根據本教示之各種具體實例之基板浮動台2200可具有用於支撐複數個浮動台地帶之浮動台基底2220。基板浮動台2200可具有可經由複數個端口施加壓力及真空之地帶2210。具有壓力及真空控制之此地帶可有效地在地帶2210與基板(圖中未示)之間提供流體彈簧。具有壓力及真空控制之地帶2210為具有雙向剛度之流體彈簧。負載與浮動台表面之間存在的間隙被稱作飛行高度。諸如圖11之基板浮動台2200之地帶2210的地帶(使用複數個壓力及真空端口在其中創造具有雙向剛度之流體彈簧)可提供用於負載(諸如,基板)之可控制飛行高度。As depicted in FIG. 11 , a substrate floatation platform 2200 according to various specific examples of the present teachings may have a floatation platform base 2220 for supporting a plurality of floatation platform zones. The substrate floatation platform 2200 may have a zone 2210 to which pressure and vacuum may be applied via a plurality of ports. This zone with pressure and vacuum control may effectively provide a fluid spring between the zone 2210 and a substrate (not shown). The zone 2210 with pressure and vacuum control is a fluid spring with bidirectional stiffness. The gap between the load and the surface of the floatation platform is referred to as the flying height. A zone such as zone 2210 of substrate floatation stage 2200 of FIG. 11 (using a plurality of pressure and vacuum ports to create a fluid spring with bidirectional stiffness therein) can provide a controllable flying height for a load (e.g., a substrate).

最接近地帶2210的分別為第一過渡地帶2211及第二過渡地帶2212,且最接近第一過渡地帶2211及第二過渡地帶2212則分別為僅壓力地帶2213及2214。在過渡地帶中,壓力對真空噴嘴之比率朝向僅壓力地帶逐漸增大以提供自地帶2210至地帶2213及2214之逐漸過渡。對於基板浮動台(例如,如在圖11中所描繪)之各種具體實例,將僅壓力地帶2213、2214描繪為包含軌結構。對於基板浮動台之各種具體實例,僅壓力地帶(諸如,圖11之僅壓力地帶2213、2214)可包含一連續板,諸如,針對圖11之壓力真空地帶2210所描繪之連續板。Proximally to the zone 2210 are the first transition zone 2211 and the second transition zone 2212, respectively, and proximally to the first transition zone 2211 and the second transition zone 2212 are the pressure-only zones 2213 and 2214, respectively. In the transition zones, the ratio of pressure to vacuum nozzles gradually increases toward the pressure-only zones to provide a gradual transition from the zone 2210 to the zones 2213 and 2214. For various specific examples of the substrate floatation stage (e.g., as depicted in FIG. 11 ), the pressure-only zones 2213, 2214 are depicted as including rail structures. For various specific examples of substrate floating platforms, only the pressure zone (e.g., only the pressure zones 2213, 2214 of FIG. 11) may include a continuous plate, such as the continuous plate depicted with respect to the pressure vacuum zone 2210 of FIG. 11.

對於如圖11中描繪之浮動台之各種具體實例,在壓力真空地帶、過渡地帶與僅壓力地帶之間可存在基本上均勻的高度,使得在容差內,三個地帶基本上位於一個平面中且可在長度上有變化。舉例而言(但不限於),為了提供定標及比例之意義,對於本教示之浮動台之各種具體實例,過渡地帶可為約400 mm,而僅壓力地帶可為約2.5 m,且壓力真空地帶可為約800 mm。在圖11中,僅壓力地帶2213及2214不提供具有雙向剛度之流體彈簧,且因此不提供地帶2210可提供之控制。因此,負載之飛行高度可典型地在僅壓力地帶上比在壓力真空地帶上的基板之飛行高度大,以便允許足夠的高度使得負載將不與僅壓力地帶中之浮動台碰撞。舉例而言(但不限於),可能需要處理OLED面板基板以在僅壓力地帶(諸如,地帶2213及2214)上方具有在約150 μ至約300 μ之間的飛行高度,且接著在壓力真空地帶(諸如,地帶2210)上方具有在約30 μ至約50 μ之間的飛行高度。For various specific embodiments of the floating platform as depicted in FIG. 11 , there may be substantially uniform heights between the pressure vacuum zone, the transition zone, and the pressure-only zone, such that within tolerance, the three zones are substantially in one plane and may vary in length. By way of example, but not limitation, to provide a sense of calibration and proportion, for various specific embodiments of the floating platform of the present teachings, the transition zone may be approximately 400 mm, while the pressure-only zone may be approximately 2.5 m, and the pressure vacuum zone may be approximately 800 mm. In FIG. 11 , the pressure-only zones 2213 and 2214 do not provide a fluid spring with bidirectional stiffness, and therefore do not provide the control that the zone 2210 may provide. Thus, the flight altitude of a load may typically be greater over a pressure-only zone than the flight altitude of a substrate over a pressure-vacuum zone, in order to allow sufficient altitude so that the load will not collide with the floatation platform in the pressure-only zone. For example, but not limitation, it may be desirable to process an OLED panel substrate to have a flight altitude of between about 150 μ to about 300 μ over pressure-only zones (e.g., zones 2213 and 2214), and then have a flight altitude of between about 30 μ to about 50 μ over a pressure-vacuum zone (e.g., zone 2210).

除了氣體循環及過濾系統之外,本教示之氣體封裝系統之各種具體實例亦可利用多種器件、裝置及系統以維持受控制之氣體封裝環境。舉例而言,除了用於提供在氣體封裝之內部中的氣體之澈底且完全更新之氣體循環及過濾系統之外,亦可提供利用複數個熱交換器之熱調節系統以維持在氣體封裝之內部中的所要溫度。舉例而言,可提供藉由扇或另一氣體循環器件操作、鄰近扇或另一氣體循環器件或與扇或另一氣體循環器件一起使用之複數個熱交換器。氣體淨化迴路可經組態以使來自氣體封裝組裝件之內部內的氣體循環經過在封裝外部之至少一氣體淨化組件。在此點上,與在氣體封裝組裝件外部之氣體淨化迴路結合的在氣體封裝組裝件內部之循環及過濾系統可提供具有實質上低含量的反應性物質之實質上低粒惰性氣體在整個氣體封裝系統中的連續循環。根據本教示,惰性氣體可為在一組定義之條件下不經歷化學反應之任何氣體。惰性氣體之一些通用非限制性實例可包括氮、稀有氣體中之任何者及其任何組合。具有氣體淨化系統的氣體封裝系統之各種具體實例可經組態以維持非常低含量之不當組分(例如,有機溶劑及其蒸氣,以及水、水蒸氣、氧及類似者)。氣體封裝系統之此等具體實例可將各種反應性物質(包括諸如水蒸氣及氧之各種反應性大氣源氣體以及有機溶劑蒸氣)中之每一物質之含量維持處於100 ppm或更低,例如,處於10 ppm或更低、處於1.0 ppm或更低或處於0.1 ppm或更低。In addition to the gas circulation and filtration system, various specific embodiments of the gas packaging system of the present teachings may also utilize a variety of devices, apparatuses, and systems to maintain a controlled gas packaging environment. For example, in addition to the gas circulation and filtration system for providing thorough and complete renewal of the gas in the interior of the gas package, a thermal regulation system utilizing a plurality of heat exchangers may also be provided to maintain the desired temperature in the interior of the gas package. For example, a plurality of heat exchangers may be provided that are operated by, adjacent to, or used in conjunction with a fan or another gas circulation device. The gas purification loop can be configured to circulate gas from the interior of the gas packaging assembly through at least one gas purification assembly outside the package. In this regard, the circulation and filtration system inside the gas packaging assembly combined with the gas purification loop outside the gas packaging assembly can provide a continuous circulation of a substantially low-particle inert gas with a substantially low content of reactive substances throughout the gas packaging system. According to the present teachings, an inert gas can be any gas that does not undergo a chemical reaction under a set of defined conditions. Some general non-limiting examples of inert gases can include any of nitrogen, rare gases, and any combination thereof. Various embodiments of gas containment systems having gas purification systems can be configured to maintain very low levels of undesirable components (e.g., organic solvents and their vapors, as well as water, water vapor, oxygen, and the like). Such embodiments of gas containment systems can maintain the content of each of various reactive species (including various reactive atmospheric source gases such as water vapor and oxygen, and organic solvent vapors) at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

圖12為展示氣體封裝系統501之示意圖。根據本教示之氣體封裝系統501之各種具體實例可包含用於收容印刷系統之氣體封裝組裝件1101、與氣體封裝組裝件1101流體連通之氣體淨化迴路3130及至少一熱調節系統3140。另外,氣體封裝系統501之各種具體實例可具有加壓之惰性氣體再循環系統3000,其可供應用於操作各種器件(諸如,用於OLED印刷系統之基板浮動台)之惰性氣體。加壓之惰性氣體再循環系統3000之各種具體實例可將一壓縮機、一吹風機及兩者之組合用作加壓之惰性氣體再循環系統3000之各種具體實例的源,如本文中隨後將更詳細地論述。另外,氣體封裝系統501可具有在氣體封裝系統501內部之循環及過濾系統(圖中未示)。FIG12 is a schematic diagram showing a gas packaging system 501. Various specific examples of the gas packaging system 501 according to the present teachings may include a gas packaging assembly 1101 for accommodating a printing system, a gas purification circuit 3130 in fluid communication with the gas packaging assembly 1101, and at least one thermal regulation system 3140. In addition, various specific examples of the gas packaging system 501 may have a pressurized inert gas recycling system 3000, which can be used to operate inert gas for various devices (e.g., a substrate floating stage for an OLED printing system). Various embodiments of the pressurized inert gas recirculation system 3000 may use a compressor, a blower, and a combination of the two as the source of various embodiments of the pressurized inert gas recirculation system 3000, as will be discussed in more detail later herein. In addition, the gas packaging system 501 may have a circulation and filtration system (not shown) inside the gas packaging system 501.

如圖12中所描繪,對於根據本教示之氣體封裝組裝件之各種具體實例,管道系統之設計可將經由氣體淨化迴路3130循環之惰性氣體與氣體封裝組裝件之各種具體實例的在內部連續過濾及循環之惰性氣體分開。氣體淨化迴路3130包括自氣體封裝組裝件1101至溶劑移除組件3132且接著至氣體淨化系統3134之出口線路3131。被淨化掉溶劑及其他反應性氣體物質(諸如,氧及水蒸氣)之惰性氣體接著經由入口線路3133返回至氣體封裝組裝件1101。氣體淨化迴路3130亦可包括適當的管路及連接及感測器(例如,氧、水蒸氣及溶劑蒸氣感測器)。諸如風扇、吹風機或馬達及類似者之氣體循環單元可分開來提供或整合於(例如)氣體淨化系統3134中以使氣體循環經由氣體淨化迴路3130。根據氣體封裝組裝件之各種具體實例,雖然在圖12中展示之示意圖中將溶劑移除系統3132及氣體淨化系統3134展示為分開的單元,但溶劑移除系統3132及氣體淨化系統3134可作為單一淨化單元收容在一起。As depicted in FIG. 12 , for various embodiments of a gas packaging assembly according to the present teachings, the design of the piping system can separate the inert gas circulating through a gas purification loop 3130 from the inert gas continuously filtered and circulated internally of various embodiments of the gas packaging assembly. The gas purification loop 3130 includes an outlet line 3131 from the gas packaging assembly 1101 to a solvent removal assembly 3132 and then to a gas purification system 3134. The inert gas purified of solvents and other reactive gas species (e.g., oxygen and water vapor) is then returned to the gas packaging assembly 1101 via an inlet line 3133. The gas purification loop 3130 may also include appropriate piping and connections and sensors (e.g., oxygen, water vapor, and solvent vapor sensors). A gas circulation unit such as a fan, blower, or motor and the like may be provided separately or integrated into (e.g.) the gas purification system 3134 to circulate gas through the gas purification loop 3130. According to various specific examples of the gas packaging assembly, although the solvent removal system 3132 and the gas purification system 3134 are shown as separate units in the schematic diagram shown in FIG. 12, the solvent removal system 3132 and the gas purification system 3134 may be housed together as a single purification unit.

圖12之氣體淨化迴路3130可具有置放於氣體淨化系統3134之上游的溶劑移除系統3132,使得自氣體封裝組裝件1101循環之惰性氣體經由出口線路3131穿過溶劑移除系統3132。根據各種具體實例,溶劑移除系統3132可為基於吸附來自穿過圖12之溶劑移除系統3132之惰性氣體的溶劑蒸氣之溶劑截獲系統。吸附劑(例如但不限於,活性炭、分子篩及類似者)之一或多個床可有效地移除廣泛多種有機溶劑蒸氣。對於氣體封裝系統之各種具體實例,可使用冷截獲技術來移除溶劑移除系統3132中之溶劑蒸氣。如本文中先前所論述,對於根據本教示之氣體封裝系統之各種具體實例,感測器(諸如,氧、水蒸氣及溶劑蒸氣感測器)可用以監視此等物質自連續循環經過氣體封裝系統(諸如,圖12之氣體封裝系統501)之惰性氣體的有效移除。溶劑移除系統之各種具體實例可指示吸附劑(諸如,活性炭、分子篩及類似者)何時已達到容量,使得可再生或替換吸附劑之該或該等床。分子篩之再生可涉及加熱分子篩,使分子篩與形成氣體接觸、其組合及類似者。經組態以截獲各種物質(包括氧、水蒸氣及溶劑)之分子篩可藉由加熱及暴露至包含氫之形成氣體(例如,包含約96%氮及4%氫之形成氣體,其中該等百分比以體積計或以重量計)來再生。可使用在惰性環境下之加熱的類似程序進行活性炭之物理再生。The gas purification loop 3130 of FIG12 may have a solvent removal system 3132 disposed upstream of the gas purification system 3134 such that the inert gas circulating from the gas packaging assembly 1101 passes through the solvent removal system 3132 via the outlet line 3131. According to various specific examples, the solvent removal system 3132 may be a solvent capture system based on adsorption of solvent vapors from the inert gas passing through the solvent removal system 3132 of FIG12. One or more beds of adsorbents (such as, but not limited to, activated carbon, molecular sieves, and the like) may effectively remove a wide variety of organic solvent vapors. For various embodiments of the gas packaging system, cold capture techniques may be used to remove solvent vapors in the solvent removal system 3132. As previously discussed herein, for various embodiments of the gas packaging system according to the present teachings, sensors (e.g., oxygen, water vapor, and solvent vapor sensors) may be used to monitor the effective removal of these species from the inert gas that is continuously circulated through the gas packaging system (e.g., gas packaging system 501 of FIG. 12 ). Various embodiments of the solvent removal system may indicate when an adsorbent (e.g., activated carbon, molecular sieves, and the like) has reached capacity so that the bed or beds of the adsorbent may be regenerated or replaced. Regeneration of molecular sieves may involve heating the molecular sieve, contacting the molecular sieve with a forming gas, combinations thereof, and the like. Molecular sieves configured to intercept various species, including oxygen, water vapor, and solvents, may be regenerated by heating and exposure to a forming gas comprising hydrogen (e.g., a forming gas comprising about 96% nitrogen and 4% hydrogen, where these percentages are by volume or by weight). Physical regeneration of activated carbon may be performed using a similar procedure of heating in an inert environment.

任何合適氣體淨化系統可用於圖12之氣體淨化迴路3130之氣體淨化系統3134。可購自(例如)新罕布什爾州Statham之MBRAUN Inc.或馬薩諸塞州Amesbury之Innovative Technology的氣體淨化系統可適用於整合至根據本教示之氣體封裝組裝件之各種具體實例內。氣體淨化系統3134可用以淨化氣體封裝系統501中之一或多種惰性氣體,例如,以淨化氣體封裝組裝件內之全部氣體氣氛。如本文中先前所論述,為了使氣體循環經過氣體淨化迴路3130,氣體淨化系統3134可具有一氣體循環單元,諸如,風扇、吹風機或馬達及類似者。在此點上,可取決於封裝之容積選擇氣體淨化系統,封裝之容積可定義將惰性氣體移動穿過氣體淨化系統之體積流率。對於具有容積高達約4 m 3之氣體封裝組裝件的氣體封裝系統之各種具體實例,可使用可每小時移動約84 m 3之氣體淨化系統。對於具有容積高達約10 m 3之氣體封裝組裝件的氣體封裝系統之各種具體實例,可使用可每小時移動約155 m 3之氣體淨化系統。對於具有在約52 m 3至114 m 3之間的容積的氣體封裝組裝件之各種具體實例,可使用一個以上氣體淨化系統。 Any suitable gas purification system may be used for the gas purification system 3134 of the gas purification loop 3130 of FIG. 12 . Gas purification systems available from, for example, MBRAUN Inc. of Statham, New Hampshire, or Innovative Technology of Amesbury, Massachusetts, may be suitable for integration into various specific embodiments of gas packaging assemblies according to the present teachings. The gas purification system 3134 may be used to purify one or more inert gases in the gas packaging system 501, for example, to purify the entire gas atmosphere within the gas packaging assembly. As previously discussed herein, in order to circulate the gas through the gas purification loop 3130, the gas purification system 3134 may have a gas circulation unit, such as a fan, blower or motor and the like. At this point, the gas purification system can be selected depending on the volume of the package, which can define the volume flow rate at which the inert gas is moved through the gas purification system. For various specific examples of gas packaging systems having a gas packaging assembly with a volume of up to about 4 m3 , a gas purification system that can move about 84 m3 per hour can be used. For various embodiments of gas containment systems having a gas containment assembly having a volume of up to about 10 m 3 , a gas purification system that can move about 155 m 3 per hour can be used. For various embodiments of gas containment assemblies having a volume between about 52 m 3 and 114 m 3 , more than one gas purification system can be used.

任何合適的氣體過濾器或淨化器件可包括於本教示之氣體淨化系統3134中。在一些具體實例中,氣體淨化系統可包含兩個並行的淨化器件,使得可使器件中之一者離線用於維護,且另一器件可用以無間斷地繼續系統操作。舉例而言,在一些具體實例中,氣體淨化系統可包含一或多個分子篩。在一些具體實例中,氣體淨化系統可包含至少一第一分子篩及一第二分子篩,使得當分子篩中之一者因雜質而變得飽和或以其他方式被視為不夠有效率地操作時,系統可切換至另一分子篩,同時對飽和或無效率之分子篩進行再生。可提供一控制單元以用於判定每一分子篩之操作效率,用於在不同分子篩之操作之間切換,用於再生一或多個分子篩,或用於其組合。如本文中先前所論述,可再生且重新使用分子篩。Any suitable gas filter or purification device may be included in the gas purification system 3134 of the present teachings. In some embodiments, the gas purification system may include two parallel purification devices, so that one of the devices can be taken offline for maintenance and the other device can be used to continue system operation without interruption. For example, in some embodiments, the gas purification system may include one or more molecular sieves. In some embodiments, the gas purification system may include at least one first molecular sieve and one second molecular sieve, so that when one of the molecular sieves becomes saturated with impurities or is otherwise deemed to be operating inefficiently, the system can switch to another molecular sieve while regenerating the saturated or inefficient molecular sieve. A control unit may be provided for determining the operating efficiency of each molecular sieve, for switching between the operation of different molecular sieves, for regenerating one or more molecular sieves, or for combinations thereof. As previously discussed herein, molecular sieves may be regenerated and reused.

圖12之熱調節系統3140可包括至少一冷卻器3142,其可具有用於使冷卻劑循環至氣體封裝組裝件內之流體出口線路3141,及用於使冷卻劑返回至冷卻器之流體入口線路3143。可提供至少一流體冷卻器3142以用於冷卻氣體封裝系統501內之氣體氣氛。對於本教示之氣體封裝系統之各種具體實例,流體冷卻器3142將經冷卻之流體傳遞至封裝內之熱交換器,其中在封裝內部之過濾系統上遞送惰性氣體。至少一流體冷卻器亦可具備氣體封裝系統501以冷卻自封裝於氣體封裝系統501內之裝置放出的熱量。舉例而言(但不限於),亦可針對氣體封裝系統501提供至少一流體冷卻器以冷卻自OLED印刷系統放出之熱量。熱調節系統3140可包含熱交換或帕耳貼(Peltier)器件且可具有各種冷卻容量。舉例而言,對於氣體封裝系統之各種具體實例,冷卻器可提供在約2 kW至約20 kW之間的冷卻容量。氣體封裝系統之各種具體實例可具有可冷卻一或多種流體之複數個流體冷卻器。在一些具體實例中,流體冷卻器可將許多流體用作冷卻劑(例如但不限於,水、防凍劑、致冷劑及其組合),作為熱交換流體。在連接相關聯之管路與系統組件的過程中可使用適當無洩漏、鎖定連接。The thermal conditioning system 3140 of FIG. 12 may include at least one cooler 3142, which may have a fluid outlet line 3141 for circulating coolant into the gas packaging assembly, and a fluid inlet line 3143 for returning the coolant to the cooler. At least one fluid cooler 3142 may be provided for cooling the gas atmosphere within the gas packaging system 501. For various specific examples of the gas packaging system of the present teachings, the fluid cooler 3142 delivers the cooled fluid to a heat exchanger within the package, wherein an inert gas is delivered over a filter system inside the package. At least one fluid cooler may also be provided with the gas packaging system 501 to cool the heat released from the device encapsulated in the gas packaging system 501. For example (but not limited to), at least one fluid cooler may also be provided for the gas packaging system 501 to cool the heat released from the OLED printing system. The thermal regulation system 3140 may include a heat exchange or Peltier device and may have various cooling capacities. For example, for various specific instances of the gas packaging system, the cooler may provide a cooling capacity between about 2 kW and about 20 kW. Various specific instances of the gas packaging system may have a plurality of fluid coolers that can cool one or more fluids. In some embodiments, the fluid cooler can use a variety of fluids as coolants (such as, but not limited to, water, antifreeze, refrigerant, and combinations thereof) as heat exchange fluids. Appropriate leak-free, locking connections can be used in connecting associated piping and system components.

如本文中所論述,本教示揭露可包括界定第一容積之印刷系統封裝及界定第二容積之輔助封裝的氣體封裝系統之各種具體實例。氣體封裝系統之各種具體實例可具有可被可密封地建構為氣體封裝組裝件之一區段的一輔助封裝。根據本教示之系統及方法,輔助封裝可被可密封地與印刷系統封裝隔離,且可對在氣體封裝組裝件外部之環境開放,而不使印刷系統封裝暴露至外部環境。可進行輔助封裝之此實體隔離以執行(例如但不限於)各種印刷頭管理程序,以消除或最小化印刷系統封裝對污染(諸如,空氣及水蒸氣及各種有機蒸氣以及顆粒污染)之暴露。可進行可包括對印刷頭組裝件之量測及維護程序的各種印刷頭管理程序,而極少打斷或不打斷印刷製程,藉此最小化或消除氣體封裝系統停機時間。As discussed herein, the present teachings disclose various specific instances of a gas packaging system that may include a printing system package defining a first volume and an auxiliary package defining a second volume. Various specific instances of the gas packaging system may have an auxiliary package that may be sealably constructed as a section of a gas packaging assembly. According to the systems and methods of the present teachings, the auxiliary package may be sealably isolated from the printing system package and may be open to the environment outside the gas packaging assembly without exposing the printing system package to the external environment. This physical isolation of the auxiliary package may be performed to perform (for example, but not limited to) various print head management procedures to eliminate or minimize the exposure of the printing system package to contamination (e.g., air and water vapor and various organic vapors and particulate contamination). Various printhead management procedures, which may include metrology and maintenance procedures for the printhead assembly, may be performed with little or no interruption to the printing process, thereby minimizing or eliminating gas packaging system downtime.

對於本教示之系統及方法之各種具體實例,輔助封裝可小於或等於氣體封裝系統之封裝容積的約1%。在本教示之系統及方法之各種具體實例中,輔助封裝可小於或等於氣體封裝系統之封裝容積的約2%。對於本教示之系統及方法之各種具體實例,輔助封裝可小於或等於氣體封裝系統之封裝容積的約5%。在本教示之系統及方法之各種具體實例中,輔助封裝可小於或等於氣體封裝系統之封裝容積的約10%。在本教示之系統及方法之各種具體實例中,輔助封裝可小於或等於氣體封裝系統之封裝容積的約20%。若為了執行(例如)維護程序而指示將輔助封裝對含有反應性氣體之周圍環境開放,則將輔助封裝與氣體封裝之工作容積隔離可防止對氣體封裝之整個容積之污染。另外,考慮到與氣體封裝之印刷系統封裝部分相比相對小的輔助封裝容積,輔助封裝之恢復時間可比整個印刷系統封裝之恢復時間少得多。For various specific examples of the systems and methods of the present teachings, the auxiliary packaging may be less than or equal to about 1% of the packaging volume of the gas packaging system. In various specific examples of the systems and methods of the present teachings, the auxiliary packaging may be less than or equal to about 2% of the packaging volume of the gas packaging system. For various specific examples of the systems and methods of the present teachings, the auxiliary packaging may be less than or equal to about 5% of the packaging volume of the gas packaging system. In various specific examples of the systems and methods of the present teachings, the auxiliary packaging may be less than or equal to about 10% of the packaging volume of the gas packaging system. In various specific examples of the systems and methods of the present teachings, the auxiliary packaging may be less than or equal to about 20% of the packaging volume of the gas packaging system. If, for example, a maintenance procedure dictates that the auxiliary package be opened to an ambient environment containing reactive gases, isolating the auxiliary package from the working volume of the gas package prevents contamination of the entire volume of the gas package. Additionally, given the relatively small volume of the auxiliary package compared to the printing system package portion of the gas package, the recovery time of the auxiliary package can be much less than the recovery time of the entire printing system package.

對於具有界定第一容積之印刷系統封裝及界定第二容積之輔助封裝的氣體封裝系統,可易於將兩個容積與氣體循環、過濾及淨化組件整合以形成可維持惰性、實質上低粒環境之氣體封裝系統(針對需要此環境之製程)而極少打斷或不打斷印刷製程。根據本教示之各種系統及方法,印刷系統封裝可被引入有一定量的污染,該污染量足夠低使得淨化系統可在污染可影響印刷製程前將其移除。輔助封裝之各種具體實例可為氣體封裝組裝件的總容積中之實質上較小容積,且可易於與氣體循環、過濾及淨化組件整合以形成可在暴露至外部環境後迅速恢復惰性低粒環境之輔助封裝系統,藉此極少打斷或不打斷印刷製程。For a gas packaging system having a printing system package defining a first volume and an auxiliary package defining a second volume, the two volumes can be easily integrated with gas circulation, filtering and purification components to form a gas packaging system that can maintain an inert, substantially low-particle environment (for processes requiring such an environment) with little or no interruption to the printing process. According to various systems and methods of the present teachings, a printing system package can be introduced with an amount of contamination that is low enough that a purification system can remove the contamination before it can affect the printing process. Various specific examples of auxiliary packaging can be a substantially small volume of the total volume of the gas packaging assembly, and can be easily integrated with gas circulation, filtering and purification components to form an auxiliary packaging system that can quickly restore an inert, low-particle environment after exposure to the external environment, thereby with little or no interruption to the printing process.

根據本教示之系統及方法,建構為氣體封裝組裝件之區段的印刷系統封裝及輔助封裝之各種具體實例可按提供分開揮發功能的框構件組裝件區段之方式建構。除了具有所有揭示之元件之外,藉由非限制性實例,對於氣體封裝系統500及501,圖13之氣體封裝系統502可具有氣體封裝組裝件1101之界定第一容積的第一氣體封裝組裝件區段1101-S1及氣體封裝組裝件1101之界定第二容積的第二氣體封裝組裝件區段1101-S2。若所有閥V 1、V 2、V 3及V 4皆打開,則氣體淨化迴路3130基本上如先前針對圖12之氣體封裝組裝件及系統1101所描述而操作。在V 3及V 4閉合之情況下,僅第一氣體封裝組裝件區段1101-S1與氣體淨化迴路3130流體連通。例如(但不限於),當在需要第二氣體封裝組裝件區段1101-S2對大氣開放之各種量測及維護程序期間第二氣體封裝組裝件區段1101-S2可密封地閉合且藉此與第一氣體封裝組裝件區段1101-S1隔離時,可使用此閥狀態。在V 1及V 2閉合之情況下,僅第二氣體封裝組裝件區段1101-S2與氣體淨化迴路3130流體連通。例如(但不限於),在已將該區段對大氣開放之後的第二氣體封裝組裝件區段1101-S2之恢復期間,可使用此閥狀態。如本文中先前針對與圖12有關之本教示所論述,關於氣體封裝組裝件1101之總容積指定了對氣體淨化迴路3130之要求。因此,藉由使氣體淨化系統之資源專用於氣體封裝組裝件區段(諸如,第二氣體封裝組裝件區段1101-S2,對於圖13之氣體封裝系統502,其被描繪為在容積上顯著比氣體封裝1101之總容積小)之恢復,可實質上減少恢復時間。 According to the systems and methods of the present teachings, various specific examples of printing system packages and auxiliary packages constructed as sections of gas packaging assemblies can be constructed in a manner that provides separate volatile functions of frame assembly sections. In addition to having all disclosed elements, by way of non-limiting example, for gas packaging systems 500 and 501, the gas packaging system 502 of FIG. 13 can have a first gas packaging assembly section 1101-S1 of the gas packaging assembly 1101 that defines a first volume and a second gas packaging assembly section 1101-S2 of the gas packaging assembly 1101 that defines a second volume. If all valves V1 , V2 , V3 , and V4 are open, the gas purification loop 3130 operates substantially as previously described with respect to the gas package assembly and system 1101 of FIG. 12. With V3 and V4 closed, only the first gas package assembly section 1101-S1 is in fluid communication with the gas purification loop 3130. This valve state may be used, for example, but not limited to, when the second gas package assembly section 1101-S2 may be hermetically closed and thereby isolated from the first gas package assembly section 1101-S1 during various measurement and maintenance procedures that require the second gas package assembly section 1101-S2 to be open to atmosphere. With V1 and V2 closed, only the second gas package assembly section 1101-S2 is in fluid communication with the gas purification loop 3130. This valve state may be used, for example (but not limited to), during the recovery of the second gas package assembly section 1101-S2 after the section has been opened to the atmosphere. As previously discussed herein with respect to the present teachings in connection with FIG. 12, the total volume of the gas package assembly 1101 specifies the requirements for the gas purification loop 3130. Therefore, by dedicating the resources of the gas purification system to the recovery of a gas package assembly segment (e.g., the second gas package assembly segment 1101-S2, which for the gas package system 502 of Figure 13 is depicted as being significantly smaller in volume than the total volume of the gas package 1101), the recovery time can be substantially reduced.

另外,輔助封裝之各種具體實例可易於與一組專用環境調節系統組件(諸如,照明、氣體循環及過濾、氣體淨化及恆溫組件)整合。在此點上,包括可作為氣體封裝組裝件之一區段可密封地隔離之一輔助封裝的氣體封裝系統之各種具體實例可具有一受控制之環境,其經設定為與由收容印刷系統的氣體封裝組裝件界定之第一容積一致。另外,包括可作為氣體封裝組裝件之一區段可密封地隔離之一輔助封裝的氣體封裝系統之各種具體實例可具有一受控制之環境,其經設定為與由收容印刷系統的氣體封裝組裝件界定之第一容積的受控制之環境不同。In addition, various specific instances of the auxiliary package can be easily integrated with a set of dedicated environmental conditioning system components (e.g., lighting, gas circulation and filtration, gas purification and constant temperature components). In this regard, various specific instances of a gas packaging system including an auxiliary package that can be sealably isolated as a section of a gas packaging assembly can have a controlled environment that is configured to be consistent with a first volume defined by a gas packaging assembly that accommodates a printing system. In addition, various specific instances of a gas packaging system including an auxiliary package that can be sealably isolated as a section of a gas packaging assembly can have a controlled environment that is configured to be different from the controlled environment of the first volume defined by a gas packaging assembly that accommodates a printing system.

回想起,可按使氣體封裝組裝件之內部容積最小化且同時使用於容納OLED印刷系統設計之各種佔據面積之工作容積最佳化的輪廓化方式建構在本教示之氣體封裝系統之具體實例中利用的氣體封裝組裝件之各種具體實例。舉例而言,根據本教示之輪廓化氣體封裝組裝件之各種具體實例對於覆蓋(例如)自Gen 3.5至Gen 10之基板大小之本教示的氣體封裝組裝件之各種具體實例可具有在約6 m 3至約95 m 3之間的氣體封裝容積。根據本教示之輪廓化氣體封裝組裝件之各種具體實例可具有(例如但不限於)在約15 m 3至約30 m 3之間的氣體封裝容積,其可能適用於(例如)Gen 5.5至Gen 8.5基板大小之OLED印刷。可將輔助封裝之各種具體實例建構為氣體封裝組裝件之一區段,且易於與氣體循環及過濾以及淨化組件整合以形成可維持惰性、實質上低粒環境(針對需要此環境之製程)之氣體封裝系統。 Recall that various embodiments of the gas encapsulation assembly utilized in embodiments of the gas encapsulation system of the present teachings may be constructed in a contoured manner that minimizes the internal volume of the gas encapsulation assembly while optimizing the working volume for accommodating various footprints of OLED printing system designs. For example, various embodiments of the contoured gas encapsulation assembly according to the present teachings may have a gas encapsulation volume of between about 6 m 3 and about 95 m 3 for various embodiments of the gas encapsulation assembly of the present teachings covering substrate sizes ranging from, for example, Gen 3.5 to Gen 10. Various embodiments of contoured gas packaging assemblies according to the present teachings may have, for example but not limited to, gas packaging volumes between about 15 m 3 and about 30 m 3 , which may be suitable for OLED printing on, for example, Gen 5.5 to Gen 8.5 substrate sizes. Various embodiments of the auxiliary package may be constructed as a section of the gas packaging assembly and readily integrated with gas circulation and filtration and purification components to form a gas packaging system that can maintain an inert, substantially low-particle environment for processes requiring such an environment.

如圖12及圖13中所展示,氣體封裝系統之各種具體實例可包括一加壓之惰性氣體再循環系統3000。加壓之惰性氣體再循環迴路之各種具體實例可利用一壓縮機、一吹風機及其組合。As shown in Figures 12 and 13, various embodiments of the gas packaging system may include a pressurized inert gas recirculation system 3000. Various embodiments of the pressurized inert gas recirculation loop may utilize a compressor, a blower, and combinations thereof.

舉例而言,如圖14及圖15中所展示,氣體封裝系統503及氣體封裝系統504之各種具體實例可具有外部氣體迴路3200,其用於整合及控制用於在氣體封裝系統503及氣體封裝系統504之各種操作態樣中使用的惰性氣體源3201及清潔乾燥空氣(CDA)源3203。氣體封裝系統503及氣體封裝系統504亦可包括內部粒子過濾及氣體循環系統之各種具體實例,以及如先前所描述的外部氣體淨化系統之各種具體實例。氣體封裝系統之此等具體實例可包括用於自惰性氣體淨化各種反應性物質的氣體淨化系統。惰性氣體之一些通用非限制性實例可包括氮、稀有氣體中之任何者及其任何組合。根據本教示之氣體淨化系統之各種具體實例可將各種反應性物質(包括諸如水蒸氣及氧之各種反應性大氣源氣體以及有機溶劑蒸氣)中之每一物質之含量維持處於100 ppm或更低,例如,處於10 ppm或更低、處於1.0 ppm或更低或處於0.1 ppm或更低。除了用於整合及控制惰性氣體源3201及CDA源3203之外部迴路3200之外,氣體封裝系統503及氣體封裝系統504可具有壓縮機迴路3250,其可供應用於操作可安置於氣體封裝系統503及氣體封裝系統504之內部中的各種器件及裝置之惰性氣體。For example, as shown in Figures 14 and 15, various embodiments of gas packaging systems 503 and 504 may have an external gas loop 3200 for integrating and controlling an inert gas source 3201 and a clean dry air (CDA) source 3203 for use in various operating modes of gas packaging systems 503 and 504. Gas packaging systems 503 and 504 may also include various embodiments of internal particle filtration and gas circulation systems, as well as various embodiments of external gas purification systems as previously described. Such embodiments of gas packaging systems may include gas purification systems for purifying various reactive substances from inert gases. Some general non-limiting examples of inert gases may include any of nitrogen, noble gases, and any combination thereof. Various specific embodiments of gas purification systems according to the present teachings may maintain the content of each of various reactive species (including various reactive atmospheric source gases such as water vapor and oxygen, and organic solvent vapors) at 100 ppm or less, for example, at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less. In addition to the external loop 3200 for integrating and controlling the inert gas source 3201 and the CDA source 3203, the gas packaging system 503 and the gas packaging system 504 may have a compressor loop 3250, which can be used to operate the inert gas of various devices and equipment that can be placed inside the gas packaging system 503 and the gas packaging system 504.

圖14之壓縮機迴路3250可包括經組態以流體連通之壓縮機3262、第一積貯器3264及第二積貯器3268。壓縮機3262可經組態以將自氣體封裝組裝件1101抽取之惰性氣體壓縮至所要的壓力。壓縮機迴路3250之入口側可經線路3254(具有閥3256及止回閥3258)經由氣體封裝組裝件出口3252而與氣體封裝組裝件1101流體連通。壓縮機迴路3250可經由外部氣體迴路3200而與壓縮機迴路3250之出口側上的氣體封裝組裝件1101流體連通。積貯器3264可安置於壓縮機3262與壓縮機迴路3250與外部氣體迴路3200之接合點之間,且可經組態以產生5 psig或更高之壓力。第二積貯器3268可處於壓縮機迴路3250中,用於提供歸因於在約60 Hz下之壓縮機活塞循環的衰減波動。對於壓縮機迴路3250之各種具體實例,第一積貯器3264可具有在約80加侖至約160加侖之間的容量,而第二積貯器可具有在約30加侖至約60加侖之間的容量。根據氣體封裝系統503之各種具體實例,壓縮機3262可為零入口(zero ingress)壓縮機。各種類型之零入口壓縮機可在不將大氣源氣體洩漏至本教示之氣體封裝系統之各種具體實例內的情況下操作。零入口壓縮機之各種具體實例可連續地運作,例如,在利用需要壓縮惰性氣體的各種器件及裝置的OLED印刷製程期間。The compressor loop 3250 of FIG. 14 may include a compressor 3262, a first accumulator 3264, and a second accumulator 3268 configured to be fluidly connected. The compressor 3262 may be configured to compress the inert gas extracted from the gas packaging assembly 1101 to a desired pressure. The inlet side of the compressor loop 3250 may be fluidly connected to the gas packaging assembly 1101 via a line 3254 (having a valve 3256 and a check valve 3258) via a gas packaging assembly outlet 3252. The compressor loop 3250 may be in fluid communication with the gas package assembly 1101 on the outlet side of the compressor loop 3250 via the external gas loop 3200. An accumulator 3264 may be disposed between the compressor 3262 and the junction of the compressor loop 3250 and the external gas loop 3200 and may be configured to produce a pressure of 5 psig or more. A second accumulator 3268 may be in the compressor loop 3250 to provide a damping fluctuation due to the compressor piston cycle at about 60 Hz. For various embodiments of the compressor loop 3250, the first accumulator 3264 may have a capacity between about 80 gallons and about 160 gallons, and the second accumulator may have a capacity between about 30 gallons and about 60 gallons. According to various embodiments of the gas packaging system 503, the compressor 3262 may be a zero ingress compressor. Various types of zero ingress compressors may operate without leaking atmospheric source gas into various embodiments of the gas packaging system of the present teachings. Various embodiments of the zero-inlet compressor may be operated continuously, for example, during OLED printing processes utilizing various devices and apparatuses that require compressed inert gases.

積貯器3264可經組態以接收且積貯來自壓縮機3262的經壓縮之惰性氣體。積貯器3264可按需要在氣體封裝組裝件1101中供應經壓縮之惰性氣體。舉例而言,積貯器3264可提供氣體以維持用於氣體封裝組裝件1101之各種組件(諸如但不限於,氣動機器人、基板浮動台、空氣軸承、空氣襯套、壓縮氣體工具、氣動致動器及其組合中之一或多者)的壓力。如圖14中針對氣體封裝系統503所展示,氣體封裝組裝件1101可具有封裝於其中之OLED印刷系統2000。如在圖14中示意性地描繪,噴墨印刷系統2000可由可為花崗岩平台之印刷系統基底2100支撐。印刷系統基底2100可支撐基板支撐裝置,諸如,夾盤,例如(但不限於),真空夾盤、具有壓力端口之基板浮動夾盤及具有真空及壓力端口之基板浮動夾盤。在本教示之各種具體實例中,基板支撐裝置可為基板浮動台,諸如,圖14中指示之基板浮動台2200。基板浮動台2200可用於基板之無摩擦支撐。除了低粒產生浮動台之外,為了進行基板之無摩擦Y軸傳送,印刷系統2000可具有利用空氣襯套之Y軸運動系統。另外,印刷系統2000可具有至少一X, Z軸托架組裝件,其中運動控制由低粒產生X軸空氣軸承組裝件提供。可使用低粒產生運動系統之各種組件(諸如,X軸空氣軸承組裝件)代替(例如)各種粒子產生線性機械軸承系統。對於本教示之氣體封裝及系統之各種具體實例,多種氣動操作式器件及裝置之使用可提供低粒產生效能,以及為低維護性的。壓縮機迴路3250可經組態以連續供應加壓之惰性氣體至氣體封裝系統503之各種器件及裝置。除了加壓之惰性氣體之供應之外,利用空氣軸承技術的噴墨印刷系統2000之基板浮動台2200亦利用真空系統3270,當閥3274在打開位置中時,該真空系統經由線路3272與氣體封裝組裝件1101連通。The accumulator 3264 can be configured to receive and accumulate compressed inert gas from the compressor 3262. The accumulator 3264 can supply compressed inert gas in the gas packaging assembly 1101 as needed. For example, the accumulator 3264 can provide gas to maintain pressure for various components used in the gas packaging assembly 1101 (such as, but not limited to, one or more of a pneumatic robot, a substrate floatation table, an air bearing, an air bushing, a compressed gas tool, a pneumatic actuator, and combinations thereof). As shown in FIG. 14 for the gas packaging system 503, the gas packaging assembly 1101 can have an OLED printing system 2000 packaged therein. As schematically depicted in FIG. 14 , the inkjet printing system 2000 may be supported by a printing system base 2100, which may be a granite platform. The printing system base 2100 may support a substrate support device, such as a chuck, such as, but not limited to, a vacuum chuck, a substrate floating chuck with a pressure port, and a substrate floating chuck with a vacuum and pressure port. In various specific examples of the present teachings, the substrate support device may be a substrate floating table, such as, for example, a substrate floating table 2200 indicated in FIG. 14 . The substrate floating table 2200 may be used for frictionless support of a substrate. In addition to the low particle generation floating stage, the printing system 2000 may have a Y-axis motion system utilizing air bushings for frictionless Y-axis transport of substrates. Additionally, the printing system 2000 may have at least one X, Z axis carriage assembly, wherein motion control is provided by a low particle generation X-axis air bearing assembly. Various components of the low particle generation motion system (e.g., an X-axis air bearing assembly) may be used in place of, for example, various particle generation linear mechanical bearing systems. For various specific embodiments of the gas packaging and systems of the present teachings, the use of a variety of pneumatically operated devices and apparatus may provide low particle generation performance, as well as being low maintenance. The compressor loop 3250 can be configured to continuously supply pressurized inert gas to various components and devices of the gas packaging system 503. In addition to the supply of pressurized inert gas, the substrate floatation stage 2200 of the inkjet printing system 2000 utilizing air bearing technology also utilizes a vacuum system 3270, which is connected to the gas packaging assembly 1101 via line 3272 when valve 3274 is in the open position.

根據本教示的加壓之惰性氣體再循環系統可具有如圖14中針對壓縮機迴路3250所展示之壓力控制式旁路迴路3260,其用以補償在使用期間對加壓氣體之可變需求,藉此提供本教示之氣體封裝系統之各種具體實例的動態平衡。對於根據本教示之氣體封裝系統之各種具體實例,旁路迴路可維持積貯器3264中之恆定壓力,而不破壞或改變封裝1101中之壓力。旁路迴路3260可具有在旁路迴路之入口側上的第一旁路入口閥3261,其係閉合的,除非使用旁路迴路3260。旁路迴路3260亦可具有後壓力調節器3266,當第二閥3263閉合時,可使用該後壓力調節器。旁路迴路3260可具有安置於旁路迴路3260之出口側處的第二積貯器3268。對於利用零入口壓縮機的壓縮機迴路3250之具體實例,旁路迴路3260可補償可在氣體封裝系統之使用期間隨著時間過去而發生的壓力之小漂移。當旁路入口閥3261處在打開位置中時,旁路迴路3260可與旁路迴路3260之入口側上的壓縮機迴路3250流體連通。當旁路入口閥3261打開時,若在氣體封裝組裝件1101之內部不需要來自壓縮機迴路3250之惰性氣體,則經由旁路迴路3260分流之惰性氣體可再循環至壓縮機。壓縮機迴路3250經組態以當積貯器3264中的惰性氣體之壓力超過預設定臨限壓力時經由旁路迴路3260分流惰性氣體。用於積貯器3264之預設定臨限壓力在每分鐘至少約1立方英尺(cfm)之流率下可在自約25 psig至約200 psig之間,或在每分鐘至少約1立方英尺(cfm)之流率下可在自約50 psig至約150 psig之間,或在每分鐘至少約1立方英尺(cfm)之流率下可在自約75 psig至約125 psig之間,或在每分鐘至少約1立方英尺(cfm)之流率下可在自約90 psig至約95 psig之間。A pressurized inert gas recirculation system according to the present teachings may have a pressure controlled bypass loop 3260 as shown in FIG. 14 for the compressor loop 3250 to compensate for the variable demand for pressurized gas during use, thereby providing a dynamic balance for various specific embodiments of the gas packaging system of the present teachings. For various specific embodiments of the gas packaging system according to the present teachings, the bypass loop can maintain a constant pressure in the accumulator 3264 without disrupting or changing the pressure in the package 1101. The bypass loop 3260 may have a first bypass inlet valve 3261 on the inlet side of the bypass loop that is closed unless the bypass loop 3260 is used. The bypass loop 3260 may also have a back pressure regulator 3266 that may be used when the second valve 3263 is closed. The bypass loop 3260 may have a second accumulator 3268 disposed at the outlet side of the bypass loop 3260. For the specific example of the compressor loop 3250 utilizing a zero inlet compressor, the bypass loop 3260 may compensate for small drifts in pressure that may occur over time during use of the gas packaging system. When the bypass inlet valve 3261 is in the open position, the bypass loop 3260 can be in fluid communication with the compressor loop 3250 on the inlet side of the bypass loop 3260. When the bypass inlet valve 3261 is open, if the inert gas from the compressor loop 3250 is not needed inside the gas packaging assembly 1101, the inert gas diverted through the bypass loop 3260 can be recirculated to the compressor. The compressor loop 3250 is configured to divert the inert gas through the bypass loop 3260 when the pressure of the inert gas in the accumulator 3264 exceeds a preset critical pressure. The preset threshold pressure for accumulator 3264 may be between about 25 psig and about 200 psig at a flow rate of at least about 1 cubic foot per minute (cfm), or between about 50 psig and about 150 psig at a flow rate of at least about 1 cubic foot per minute (cfm), or between about 75 psig and about 125 psig at a flow rate of at least about 1 cubic foot per minute (cfm), or between about 90 psig and about 95 psig at a flow rate of at least about 1 cubic foot per minute (cfm).

壓縮機迴路3250之各種具體實例可利用不同於零入口壓縮機之多種壓縮機,諸如,變速壓縮機或可經控制為處於開或關狀態中之壓縮機。如本文中先前所論述,零入口壓縮機確保無大氣反應性物質可被引入至氣體封裝系統內。因而,可將防止大氣反應性物質被引入至氣體封裝系統內之任何壓縮機組態用於壓縮機迴路3250。根據各種具體實例,氣體封裝系統503之壓縮機3262可收容於(例如但不限於)氣密性外殼中。外殼內部可經組態成與惰性氣體(例如,形成用於氣體封裝組裝件1101之惰性氣體氣氛的相同惰性氣體)之源流體連通。對於壓縮機迴路3250之各種具體實例,可按恆定速度控制壓縮機3262以維持恆定壓力。在不利用零入口壓縮機的壓縮機迴路3250之其他具體實例中,當達到最大臨限壓力時,可關閉壓縮機3262,且當達到最小臨限壓力時接通該壓縮機。Various specific embodiments of the compressor loop 3250 may utilize a variety of compressors other than a zero-inlet compressor, such as a variable speed compressor or a compressor that can be controlled to be in an on or off state. As previously discussed herein, a zero-inlet compressor ensures that no atmospheric reactive substances can be introduced into the gas packaging system. Thus, any compressor configuration that prevents atmospheric reactive substances from being introduced into the gas packaging system can be used for the compressor loop 3250. According to various specific embodiments, the compressor 3262 of the gas packaging system 503 can be housed in, for example, but not limited to, an airtight housing. The interior of the housing can be configured to be in fluid communication with a source of an inert gas (e.g., the same inert gas that forms the inert gas atmosphere for the gas enclosure assembly 1101). For various embodiments of the compressor loop 3250, the compressor 3262 can be controlled at a constant speed to maintain a constant pressure. In other embodiments of the compressor loop 3250 that do not utilize a zero inlet compressor, the compressor 3262 can be turned off when the maximum critical pressure is reached and turned on when the minimum critical pressure is reached.

在圖15中,對於氣體封裝系統504,展示了利用真空吹風機3290之吹風機迴路3280,其用於操作收容於氣體封裝組裝件1101中的噴墨印刷系統2000之基板浮動台2200。如本文中先前針對壓縮機迴路3250所論述,吹風機迴路3280可經組態以連續將加壓之惰性氣體供應至印刷系統2000之基板浮動台2200。15 , for the gas packaging system 504, a blower circuit 3280 utilizing a vacuum blower 3290 is shown for operating a substrate floatation stage 2200 of an inkjet printing system 2000 housed in a gas packaging assembly 1101. As previously discussed herein with respect to the compressor circuit 3250, the blower circuit 3280 can be configured to continuously supply pressurized inert gas to the substrate floatation stage 2200 of the printing system 2000.

可利用加壓之惰性氣體再循環系統的氣體封裝系統之各種具體實例可具有利用多種加壓氣體源的各種迴路,諸如,壓縮機、吹風機及其組合中之至少一者。在圖15中,對於氣體封裝系統504,壓縮機迴路3250可與外部氣體迴路3200(其可用於供應用於高消耗歧管3225以及低消耗歧管3215之惰性氣體)流體連通。對於如圖15中針對氣體封裝系統504展示的根據本教示之氣體封裝系統之各種具體實例,高消耗歧管3225可用以將惰性氣體供應至各種器件及裝置,諸如(但不限於),基板浮動台、氣動機器人、空氣軸承、空氣襯套及壓縮氣體工具及其組合中之一或多者。對於根據本教示之氣體封裝系統之各種具體實例,低消耗3215可用以將惰性氣體供應至各種裝置及器件,諸如(但不限於),隔離器及氣動致動器及其組合中之一或多者。Various specific examples of gas packaging systems that can utilize a pressurized inert gas recirculation system can have various loops that utilize a variety of pressurized gas sources, such as at least one of a compressor, a blower, and a combination thereof. In Figure 15, for the gas packaging system 504, the compressor loop 3250 can be fluidly connected to the external gas loop 3200 (which can be used to supply inert gas for use in the high consumption manifold 3225 and the low consumption manifold 3215). For various specific examples of gas packaging systems according to the present teachings, such as shown in Figure 15 for gas packaging system 504, high consumption manifold 3225 can be used to supply inert gas to various devices and equipment, such as (but not limited to), substrate floatation table, pneumatic robot, air bearing, air bushing and compressed gas tool and one or more of the combination thereof. For various specific examples of gas packaging systems according to the present teachings, low consumption 3215 can be used to supply inert gas to various devices and equipment, such as (but not limited to), isolators and pneumatic actuators and one or more of the combination thereof.

對於圖15之氣體封裝系統504之各種具體實例,吹風機迴路3280可用以將加壓之惰性氣體供應至基板浮動台2200之各種具體實例,而與外部氣體迴路3200流體連通之壓縮機迴路3250可用以將加壓之惰性氣體供應至(例如但不限於)氣動機器人、空氣軸承、空氣襯套及壓縮氣體工具及其組合中之一或多者。除了加壓之惰性氣體之供應之外,利用空氣軸承技術的OLED噴墨印刷系統2000之基板浮動台2200亦利用吹風機真空3290,當閥3294在打開位置中時,該吹風機真空經由線路3292而與氣體封裝組裝件1101連通。吹風機迴路3280之外殼3282可維護用於將加壓之惰性氣體源供應至基板浮動台2200的第一吹風機3284,及充當用於基板浮動台2200之真空源的第二吹風機3290(其收容於氣體封裝組裝件1101中之惰性氣體環境中)。可使吹風機適合於用作基板浮動台之各種具體實例的加壓惰性氣體或真空之源的屬性包括(例如,但不限於)其具有高度可靠性;使其具有低維護性,具有變速控制,及具有廣泛的一系列流量;各種具體實例能夠提供在約100 m³/h至約2,500 m³/h之間的容積流量。吹風機迴路3280之各種具體實例另外可具有在吹風機迴路3280之入口端處的第一隔離閥3283以及止回閥3285及在吹風機迴路3280之出口端處的第二隔離閥3287。吹風機迴路3280之各種具體實例可具有可調整閥3286(其可為(例如,但不限於)閘閥、蝶形閥、針閥或球閥)以及熱交換器3288(用於將自吹風機迴路3280至基板浮動台2200之惰性氣體維持在定義之溫度)。For various specific instances of the gas packaging system 504 of Figure 15, the blower loop 3280 can be used to supply pressurized inert gas to various specific instances of the substrate floating platform 2200, and the compressor loop 3250 fluidly connected to the external gas loop 3200 can be used to supply pressurized inert gas to (for example but not limited to) one or more of a pneumatic robot, an air bearing, an air bushing, and a compressed gas tool and a combination thereof. In addition to the supply of pressurized inert gas, the substrate floatation stage 2200 of the OLED inkjet printing system 2000 utilizing air bearing technology also utilizes a blower vacuum 3290, which communicates with the gas packaging assembly 1101 via line 3292 when valve 3294 is in the open position. The housing 3282 of the blower loop 3280 can maintain a first blower 3284 for supplying a pressurized inert gas source to the substrate floatation stage 2200, and a second blower 3290 (which is housed in the inert gas environment in the gas packaging assembly 1101) serving as a vacuum source for the substrate floatation stage 2200. Attributes that make the blower suitable for use as a source of pressurized inert gas or vacuum for various embodiments of the substrate floatation table include, for example, but not limited to, making it highly reliable; making it low maintenance, having variable speed control, and having a wide range of flow rates; various embodiments are capable of providing volumetric flow rates between about 100 m³/h and about 2,500 m³/h. Various embodiments of the blower loop 3280 may additionally have a first isolation valve 3283 at the inlet end of the blower loop 3280 and a check valve 3285 and a second isolation valve 3287 at the outlet end of the blower loop 3280. Various specific examples of the blower loop 3280 may have an adjustable valve 3286 (which may be, for example, but not limited to, a gate valve, a butterfly valve, a needle valve, or a ball valve) and a heat exchanger 3288 (for maintaining the inert gas from the blower loop 3280 to the substrate floating table 2200 at a defined temperature).

圖15描繪外部氣體迴路3200(亦在圖14中所展示),其用於整合及控制用於在圖14之氣體封裝系統503及在圖15之氣體封裝系統504之各種操作態樣中使用的惰性氣體源3201及清潔乾燥空氣(CDA)源3203。圖14及圖15之外部氣體迴路3200可包括至少四個機械閥。此等閥包含第一機械閥3202、第二機械閥3204、第三機械閥3206及第四機械閥3208。此等各種閥位於各種流動線路中之允許控制惰性氣體及諸如清潔乾燥空氣(CDA)之空氣源的位置處。根據本教示,惰性氣體可為在一組定義之條件下不經歷化學反應之任何氣體。惰性氣體之一些通用非限制性實例可包括氮、稀有氣體中之任何者及其任何組合。室內惰性氣體線路3210自室內惰性氣體源3201延伸。室內惰性氣體線路3210繼續線性延伸,作為與低消耗歧管3215流體連通之低消耗歧管線路3212。交叉線路第一區段3214自位於室內惰性氣體線路3210、低消耗歧管線路3212與交叉線路第一區段3214之相交處的第一流動接合點3216延伸。交叉線路第一區段3214延伸至第二流動接合點3218。壓縮機惰性氣體線路3220自壓縮機迴路3250之積貯器3264延伸且終止於第二流動接合點3218。CDA線路3222自CDA源3203延伸,且作為與高消耗歧管3225流體連通之高消耗歧管線路3224繼續。第三流動接合點3226定位於交叉線路第二區段3228、清潔乾燥空氣線路3222與高消耗歧管線路3224之相交處。交叉線路第二區段3228自第二流動接合點3218延伸至第三流動接合點3226。在維護期間,可藉由高消耗歧管3225對高消耗之各種組件供應CDA。使用閥3204、3208及3230隔離壓縮機可防止諸如氧及水蒸氣之反應性物質污染壓縮機及積貯器內之惰性氣體。FIG. 15 depicts an external gas loop 3200 (also shown in FIG. 14 ) for integrating and controlling an inert gas source 3201 and a clean dry air (CDA) source 3203 for use in various operating modes of the gas packaging system 503 of FIG. 14 and the gas packaging system 504 of FIG. 15 . The external gas loop 3200 of FIGS. 14 and 15 may include at least four mechanical valves. These valves include a first mechanical valve 3202, a second mechanical valve 3204, a third mechanical valve 3206, and a fourth mechanical valve 3208. These various valves are located at locations in various flow lines that allow control of inert gas and air sources such as clean dry air (CDA). According to the present teachings, an inert gas can be any gas that does not undergo a chemical reaction under a set of defined conditions. Some general non-limiting examples of inert gases can include any of nitrogen, noble gases, and any combination thereof. An indoor inert gas line 3210 extends from an indoor inert gas source 3201. The indoor inert gas line 3210 continues to extend linearly as a low-consumption manifold line 3212 that is fluidly connected to a low-consumption manifold 3215. A cross-line first section 3214 extends from a first flow junction 3216 located at the intersection of the indoor inert gas line 3210, the low-consumption manifold line 3212, and the cross-line first section 3214. The cross-line first section 3214 extends to a second flow junction 3218. The compressor inert gas line 3220 extends from the accumulator 3264 of the compressor loop 3250 and terminates at the second flow junction 3218. The CDA line 3222 extends from the CDA source 3203 and continues as a high consumption manifold line 3224 in fluid communication with the high consumption manifold 3225. The third flow junction 3226 is located at the intersection of the crossover line second section 3228, the clean dry air line 3222, and the high consumption manifold line 3224. The crossover line second section 3228 extends from the second flow junction 3218 to the third flow junction 3226. During maintenance, CDA can be supplied to various components of high consumption via the high consumption manifold 3225. Isolating compressors with valves 3204, 3208 and 3230 prevents reactive materials such as oxygen and water vapor from contaminating the inert gas in the compressor and accumulator.

氣體封裝組裝件之各種具體實例的惰性氣體之不斷循環及過濾為粒子控制系統之一部分,該粒子控制系統可提供維持氣體封裝系統之各種具體實例內的實質上低粒環境。氣體循環及過濾系統之各種具體實例可經設計以提供符合國際標準組織標準(ISO) 14644-1:1999「潔淨室及相關聯之受控制之環境——第1部分:空氣清潔度之分類(Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness)」(如由第1類別至第5類別指定)之標準的針對空中顆粒之低粒環境。另外,粒子控制系統之各種組件可將顆粒物排出至氣體循環及過濾系統以便維持最接近基板之低粒地帶。可使用(例如)攜帶型粒子計數器件在印刷製程前針對氣體封裝系統之各種具體實例執行空中顆粒物之判定,用於系統驗證。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行空中顆粒物之判定,作為持續進行之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行空中顆粒物之判定,用於系統驗證。Continuous circulation and filtration of an inert gas in various embodiments of a gas containment assembly is part of a particle control system that provides for maintaining a substantially low particle environment within various embodiments of a gas containment system. Various embodiments of the gas circulation and filtration system may be designed to provide a low particle environment for airborne particles in accordance with the standards of the International Organization for Standardization Standards (ISO) 14644-1:1999, "Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness" (as designated by Class 1 through Class 5). Additionally, various components of the particle control system may exhaust particulates to the gas circulation and filtration system in order to maintain a low particle zone proximal to the substrate. Airborne particle determination may be performed for various embodiments of the gas packaging system prior to the printing process using, for example, a portable particle counting device for system validation. In various embodiments of the gas packaging system, airborne particle determination may be performed in situ while the substrate is being printed as an ongoing quality check. For various embodiments of the gas packaging system, airborne particle determination may be performed prior to printing the substrate and additionally in situ while the substrate is being printed for system validation.

氣體循環及過濾系統之各種具體實例描繪於圖16至圖18中。根據本教示之氣體循環及過濾系統之各種具體實例,可將管道系統裝設於藉由接合壁框與頂板框構件而形成的內部部分中。對於氣體封裝組裝件之各種具體實例,可在建構過程期間裝設管道系統。根據本教示之各種具體實例,管道系統可裝設於已自複數個框構件建構之氣體封裝框組裝件內。在各種具體實例中,在將複數個框構件接合以形成氣體封裝框組裝件前,可將管道系統裝設於框構件上。用於氣體封裝系統之各種具體實例的管道系統可經組態使得自一或多個管道系統入口吸入至管道系統內之實質上所有氣體被移動經過在氣體封裝組裝件內部之用於移除顆粒物的氣體過濾迴路之各種具體實例。另外,氣體封裝系統之各種具體實例之管道系統可經組態以將在氣體封裝組裝件外部的氣體淨化迴路之入口及出口與用於移除在氣體封裝組裝件內部之顆粒物的氣體過濾迴路分開。根據本教示之管道系統之各種具體實例可自金屬薄片(例如但不限於,具有約80密耳之厚度的鋁薄片)製造。Various specific examples of the gas circulation and filtration system are depicted in Figures 16 to 18. According to various specific examples of the gas circulation and filtration system of the present teachings, the duct system can be installed in the inner part formed by joining the wall frame and the top frame member. For various specific examples of the gas packaging assembly, the duct system can be installed during the construction process. According to various specific examples of the present teachings, the duct system can be installed in the gas packaging frame assembly that has been constructed from a plurality of frame members. In various specific examples, the duct system can be installed on the frame member before joining a plurality of frame members to form the gas packaging frame assembly. The piping system for various embodiments of the gas packaging system can be configured so that substantially all gas drawn into the piping system from one or more piping system inlets is moved through various embodiments of the gas filtration circuit inside the gas packaging assembly for removing particulate matter. In addition, the piping system for various embodiments of the gas packaging system can be configured to separate the inlet and outlet of the gas purification circuit outside the gas packaging assembly from the gas filtration circuit for removing particulate matter inside the gas packaging assembly. Various embodiments of the piping system according to the present teachings can be manufactured from metal sheets (for example, but not limited to, aluminum sheets having a thickness of approximately 80 mils).

圖16描繪可包括氣體封裝組裝件100之管道系統組裝件1501及風扇過濾器單元組裝件1502的循環及過濾系統1500之右前部幻象透視圖。封裝管道系統組裝件1501可具有前壁面板管道系統組裝件1510。如展示,前壁面板管道系統組裝件1510可具有前壁面板入口管道1512、第一前壁面板升流管1514及第二前壁面板升流管1516,兩個升流管皆與前壁面板入口管道1512流體連通。展示第一前壁面板升流管1514具有出口1515,其與風扇過濾器單元蓋103之頂板管道1505可密封地嚙合。以類似方式,展示第二前壁面板升流管1516具有出口1517,其與風扇過濾器單元蓋103之頂板管道1507可密封地嚙合。在此點上,前壁面板管道系統組裝件1510提供利用前壁面板入口管道1512在氣體封裝系統內自底部經由每一前壁面板升流管1514及1516循環惰性氣體及分別經由出口1505及1507傳遞空氣,使得空氣可由(例如)風扇過濾器單元組裝件1502之風扇過濾器單元1552過濾。最接近風扇過濾器單元1552的為熱交換器1562,其作為熱調節系統之部分,可將循環經過氣體封裝組裝件100之惰性氣體維持在所要的溫度。FIG. 16 depicts a right front phantom perspective view of a circulation and filtration system 1500 that may include a ductwork assembly 1501 and a fan filter unit assembly 1502 of a gas enclosure assembly 100. The enclosure ductwork assembly 1501 may have a front wall panel ductwork assembly 1510. As shown, the front wall panel ductwork assembly 1510 may have a front wall panel inlet duct 1512, a first front wall panel riser 1514, and a second front wall panel riser 1516, both of which are in fluid communication with the front wall panel inlet duct 1512. The first front wall panel riser 1514 is shown having an outlet 1515 that sealably engages with the ceiling duct 1505 of the fan filter unit cover 103. In a similar manner, a second front wall panel riser 1516 is shown having an outlet 1517 that sealably engages with the ceiling duct 1507 of the fan filter unit cover 103. In this regard, the front wall panel duct system assembly 1510 provides for circulating an inert gas from the bottom through each front wall panel riser 1514 and 1516 within the gas enclosure using the front wall panel inlet duct 1512 and delivering air through outlets 1505 and 1507, respectively, so that the air can be filtered by, for example, the fan filter unit 1552 of the fan filter unit assembly 1502. Proximally located to the fan filter unit 1552 is a heat exchanger 1562 which serves as part of a thermal regulation system to maintain the inert gas circulating through the gas enclosure assembly 100 at a desired temperature.

右壁面板管道系統組裝件1530可具有右壁面板入口管道1532,其經由右壁面板第一升流管1534及右壁面板第二升流管1536而與右壁面板上部管道1538流體連通。右壁面板上部管道1538可具有第一管道入口端1535及第二管道出口端1537,該第二管道出口端1537與後壁管道系統組裝件1540之後壁面板上部管道1546流體連通。左壁面板管道系統組裝件1520可具有與針對右壁面板組裝件1530所描述相同的組件,在圖16中可顯而易見其中的經由第一左壁面板升流管1524與左壁面板上部管道(圖中未示)流體連通之左壁面板入口管道1522及第一左壁面板升流管1524。後壁面板管道系統組裝件1540可具有後壁面板入口管道1542,其與左壁面板組裝件1520及右壁面板組裝件1530流體連通。另外,後壁面板管道系統組裝件1540可具有後壁面板底部管道1544,其可具有後壁面板第一入口1541及後壁面板第二入口1543。後壁面板底部管道1544可經由第一隔壁1547及第二隔壁1549而與後壁面板上部管道1546流體連通,該等隔壁結構可用以將(例如但不限於)服務自氣體封裝組裝件100之外部饋入至內部。根據本教示,服務束可包括(例如但不限於)光纜、電纜、電線及管系及類似者。回想起,製造設施可能需要實質長度之各種服務束,該等服務束可操作性地自各種系統及組裝件連接以提供操作印刷系統所需之光學、電、機械及流體連接。管道開口1533提供將至少一服務束移出後壁面板上部管道1546,可使該至少一服務束經由隔壁1549穿過後壁面板上部管道1546。可使用可移除之插入面板在外部氣密性地密封隔壁1547及隔壁1549,如先前所描述。後壁面板上部管道經由通風孔1545與(例如但不限於)風扇過濾器單元1554流體連通,通風孔之一拐角展示於圖16中。在此點上,左壁面板管道系統組裝件1520、右壁面板管道系統組裝件1530及後壁面板管道系統組裝件1540提供分別利用壁面板入口管道1522、1532及1542以及後部面板下部管道1544(其經由如先前所描述之各種升流管、管道、隔壁通路及類似者而與通風孔1545流體連通)在氣體封裝組裝件內自底部循環惰性氣體。因此,空氣可由(例如)循環及過濾系統1500之風扇過濾器單元組裝件1502之風扇過濾器單元1554過濾。最接近風扇過濾器單元1554的為熱交換器1564,其作為熱調節系統之部分,可將經由氣體封裝組裝件100循環之惰性氣體維持在所要的溫度。如本文中隨後將更詳細地論述,可根據在處理期間在印刷系統中的基板之實體位置來選擇風扇過濾器單元組裝件(諸如循環及過濾系統1500之包括風扇過濾器單元1552及1554的風扇過濾器單元組裝件1502)之風扇過濾器單元的數目、大小及形狀。關於基板之實體行程選擇的風扇過濾器單元組裝件的風扇過濾器單元之數目、大小及形狀可為可在基板製造製程期間提供最接近基板之低粒地帶的低粒氣體封裝系統之要素。The right wall panel duct system assembly 1530 may have a right wall panel inlet duct 1532 in fluid communication with a right wall panel upper duct 1538 via a right wall panel first riser 1534 and a right wall panel second riser 1536. The right wall panel upper duct 1538 may have a first duct inlet end 1535 and a second duct outlet end 1537 in fluid communication with a rear wall panel upper duct 1546 of the rear wall duct system assembly 1540. The left wall panel duct system assembly 1520 may have the same components as described for the right wall panel assembly 1530, with the left wall panel inlet duct 1522 and the first left wall panel riser 1524 in fluid communication with the left wall panel upper duct (not shown) via the first left wall panel riser 1524 being apparent in FIG. 16 . The rear wall panel duct system assembly 1540 may have a rear wall panel inlet duct 1542, which is in fluid communication with the left wall panel assembly 1520 and the right wall panel assembly 1530. In addition, the rear wall panel duct system assembly 1540 may have a rear wall panel bottom duct 1544, which may have a rear wall panel first inlet 1541 and a rear wall panel second inlet 1543. The rear wall panel bottom duct 1544 may be in fluid communication with the rear wall panel upper duct 1546 via a first bulkhead 1547 and a second bulkhead 1549, which bulkhead structures may be used to feed (for example, but not limited to) services from the outside of the gas enclosure assembly 100 to the inside. According to the present teachings, the service bundle may include (for example, but not limited to) optical cables, electrical cables, wires and piping and the like. Recall that a manufacturing facility may require substantial lengths of various service bundles that are operably connected from various systems and assemblies to provide the optical, electrical, mechanical, and fluid connections required to operate the printing system. Duct opening 1533 provides for removal of at least one service bundle out of the rear wall panel upper duct 1546, allowing the at least one service bundle to pass through the rear wall panel upper duct 1546 via bulkhead 1549. Bulkhead 1547 and bulkhead 1549 may be hermetically sealed externally using a removable insert panel, as previously described. The rear wall panel upper duct is in fluid communication with, for example but not limited to, a fan filter unit 1554 via vent 1545, one corner of which is shown in FIG. 16 . In this regard, the left wall panel duct system assembly 1520, the right wall panel duct system assembly 1530, and the rear wall panel duct system assembly 1540 provide for circulating inert gas from the bottom within the gas enclosure assembly using wall panel inlet ducts 1522, 1532, and 1542, respectively, and the rear panel lower duct 1544, which are in fluid communication with the vent 1545 via various risers, ducts, bulkhead passages, and the like as previously described. Thus, air can be filtered by, for example, the fan filter unit 1554 of the fan filter unit assembly 1502 of the circulation and filtration system 1500. Proximally located to the fan filter unit 1554 is a heat exchanger 1564 which, as part of a thermal regulation system, maintains at a desired temperature the inert gas circulating through the gas enclosure assembly 100. As will be discussed in greater detail later herein, the number, size, and shape of the fan filter units of a fan filter unit assembly (e.g., fan filter unit assembly 1502 of the circulation and filtering system 1500 including fan filter units 1552 and 1554) may be selected based on the physical location of the substrate in the printing system during processing. The number, size and shape of the fan filter units of the fan filter unit assembly selected with respect to the physical path of the substrate can be elements of a low particle gas packaging system that can provide a low particle zone closest to the substrate during the substrate manufacturing process.

在圖16中,展示經由開口1533之纜線饋入。如本文中隨後將更詳細地論述,本教示之氣體封裝組裝件之各種具體實例提供使服務束經過管道系統。為了消除在此等服務束周圍形成之洩漏路徑,可使用用於使用保形材料密封服務束中的不同大小之纜線、電線及管系之各種方法。亦在圖16中針對封裝管道系統組裝件1501展示了管路I及管道II,其被展示為風扇過濾器單元蓋103之部分。管路I提供惰性氣體至外部氣體淨化系統之出口,而管路II使經淨化之惰性氣體返回至在氣體封裝組裝件100內部之循環及過濾迴路。In Figure 16, a cable feed is shown through opening 1533. As will be discussed in more detail later herein, various specific embodiments of the gas packaging assembly of the present teachings provide for passing a service bundle through a duct system. In order to eliminate leak paths formed around such service bundles, various methods for sealing cables, wires, and ducts of different sizes in the service bundle using conformal materials can be used. Also shown in Figure 16 for the packaged duct system assembly 1501 are duct I and duct II, which are shown as part of the fan filter unit cover 103. duct I provides an outlet for inert gas to an external gas purification system, while duct II returns the purified inert gas to the circulation and filtering loop inside the gas packaging assembly 100.

在圖17中,展示封裝管道系統組裝件1501之頂部幻象透視圖。可看出左壁面板管道系統組裝件1520與右壁面板管道系統組裝件1530之對稱本質。對於右壁面板管道系統組裝件1530,右壁面板入口管道1532經由右壁面板第一升流管1534及右壁面板第二升流管1536而與右壁面板上部管道1538流體連通。右壁面板上部管道1538可具有第一管道入口端1535及第二管道出口端1537,該第二管道出口端1537與後壁管道系統組裝件1540之後壁面板上部管道1546流體連通。類似地,左壁面板管道系統組裝件1520可具有左壁面板入口管道1522,其經由左壁面板第一升流管1524及左壁面板第二升流管1526而與左壁面板上部管道1528流體連通。左壁面板上部管道1528可具有第一管道入口端1525及第二管道出口端1527,該第二管道出口端1527與後壁管道系統組裝件1540之後壁面板上部管道1546流體連通。另外,後壁面板管道系統組裝件可具有後壁面板入口管道1542,其與左壁面板組裝件1520及右壁面板組裝件1530流體連通。另外,後壁面板管道系統組裝件1540可具有後壁面板底部管道1544,其可具有後壁面板第一入口1541及後壁面板第二入口1543。後壁面板底部管道1544可經由第一隔壁1547及第二隔壁1549而與後壁面板上部管道1546流體連通。如圖16及圖17中展示之管道系統組裝件1501可提供惰性氣體自前壁面板管道系統組裝件1510之有效循環,此將惰性氣體自前壁面板入口管道1512分別經由前臂面板出口1515及1517循環至頂板面板管道1505及1507,以及將惰性氣體自分別自入口管道1522、1532及1542循環空氣之左壁面板組裝件1520、右壁面板組裝件1530及後壁面板管道系統組裝件1540循環至通風孔1545。一旦經由頂板面板管道1505及1507及通風孔1545將惰性氣體排出至在封裝100之風扇過濾器單元蓋103下之封裝區域內,如此排出之惰性氣體就可經由風扇過濾器單元組裝件1502之風扇過濾器單元1552及1554過濾。另外,循環之惰性氣體可由為熱調節系統之部分的熱交換器1562及1564維持在所要的溫度。In FIG. 17 , a top phantom perspective view of the packaged ductwork assembly 1501 is shown. The symmetrical nature of the left wall panel ductwork assembly 1520 and the right wall panel ductwork assembly 1530 can be seen. For the right wall panel ductwork assembly 1530, the right wall panel inlet duct 1532 is in fluid communication with the right wall panel upper duct 1538 via the right wall panel first riser 1534 and the right wall panel second riser 1536. The right wall panel upper duct 1538 may have a first duct inlet end 1535 and a second duct outlet end 1537, which is in fluid communication with the rear wall panel upper duct 1546 of the rear wall ductwork assembly 1540. Similarly, the left wall panel duct system assembly 1520 may have a left wall panel inlet duct 1522, which is in fluid communication with the left wall panel upper duct 1528 via the left wall panel first riser 1524 and the left wall panel second riser 1526. The left wall panel upper duct 1528 may have a first duct inlet end 1525 and a second duct outlet end 1527, which is in fluid communication with the rear wall panel upper duct 1546 of the rear wall duct system assembly 1540. In addition, the rear wall panel duct system assembly may have a rear wall panel inlet duct 1542, which is in fluid communication with the left wall panel assembly 1520 and the right wall panel assembly 1530. In addition, the rear wall panel duct system assembly 1540 may have a rear wall panel bottom duct 1544, which may have a rear wall panel first inlet 1541 and a rear wall panel second inlet 1543. The rear wall panel bottom duct 1544 can be in fluid communication with the rear wall panel upper duct 1546 via the first bulkhead 1547 and the second bulkhead 1549. The duct system assembly 1501 as shown in Figures 16 and 17 can provide effective circulation of inert gas from the front wall panel duct system assembly 1510, which circulates inert gas from the front wall panel inlet duct 1512 to the ceiling panel ducts 1505 and 1507 via the forearm panel outlets 1515 and 1517, respectively, and circulates inert gas from the left wall panel assembly 1520, the right wall panel assembly 1530 and the rear wall panel duct system assembly 1540 which circulate air from the inlet ducts 1522, 1532 and 1542, respectively, to the vent 1545. Once the inert gas is exhausted into the enclosure area beneath the fan filter unit cover 103 of the enclosure 100 via the ceiling panel ducts 1505 and 1507 and the vents 1545, the inert gas so exhausted may be filtered by the fan filter units 1552 and 1554 of the fan filter unit assembly 1502. Additionally, the circulating inert gas may be maintained at a desired temperature by heat exchangers 1562 and 1564 which are part of a thermal conditioning system.

圖18為封裝管道系統組裝件1501之底部幻象圖。入口管道系統組裝件1509包括相互流體連通之前壁面板入口管道1512、左壁面板入口管道1522、右壁面板入口管道1532及後壁面板入口管道1542。如本文中先前所論述,管路I提供惰性氣體至外部氣體淨化系統之出口,而管路II使經淨化之惰性氣體返回至在氣體封裝組裝件100內部之循環及過濾迴路。FIG. 18 is a bottom phantom view of the package duct system assembly 1501. The inlet duct system assembly 1509 includes the front wall panel inlet duct 1512, the left wall panel inlet duct 1522, the right wall panel inlet duct 1532, and the rear wall panel inlet duct 1542 that are in fluid communication with each other. As previously discussed herein, the duct I provides inert gas to the outlet of the external gas purification system, and the duct II returns the purified inert gas to the circulation and filtering loop inside the gas package assembly 100.

對於入口管道系統組裝件1509中包括之每一入口管道,存在跨每一管道之底部均勻分佈之明顯開口,為了本教示之目的,將開口之集合具體地突出表示為前壁面板入口管道1512之開口1511、左壁面板入口管道1522之開口1521、右壁面板入口管道1532之開口1531及後壁面板入口管道1542之開口1541。如跨每一入口管道之底部顯而易見的,此等開口提供對封裝100內的惰性氣體之有效吸取,以用於不斷的循環及過濾。氣體封裝組裝件之各種具體實例之惰性氣體的不斷循環及過濾為可提供維持氣體封裝系統之各種具體實例內的實質上低粒環境的粒子控制系統之一部分。氣體循環及過濾系統之各種具體實例可經設計以提供用於維持符合國際標準組織標準(ISO) 14644-1:1999(如由第1類別至第5類別指定)之標準的空中顆粒含量之低粒環境。另外,可包括捆紮在一起之纜線、電線及管系及類似者之服務束可充當顆粒物之來源。因此,使服務束經由管道系統饋入可將經識別之粒子源圍阻於管道系統內,且經由循環及過濾系統排出顆粒物。For each inlet duct included in the inlet duct system assembly 1509, there are distinct openings evenly distributed across the bottom of each duct, and for purposes of the present teachings, the collection of openings are specifically highlighted as opening 1511 of the front wall panel inlet duct 1512, opening 1521 of the left wall panel inlet duct 1522, opening 1531 of the right wall panel inlet duct 1532, and opening 1541 of the back wall panel inlet duct 1542. As evident across the bottom of each inlet duct, these openings provide for effective draw of inert gas within the package 100 for ongoing circulation and filtering. Continuous circulation and filtration of an inert gas of various embodiments of a gas containment assembly is part of a particle control system that can provide a substantially low particle environment maintained within various embodiments of a gas containment system. Various embodiments of the gas circulation and filtration system can be designed to provide a low particle environment for maintaining airborne particle levels that meet standards of International Standards Organization Standard (ISO) 14644-1:1999 (as designated by Class 1 through Class 5). In addition, service bundles that can include bundles of cables, wires, and tubing and the like can serve as a source of particulate matter. Therefore, feeding the service bundle through the piping system can contain the identified particle source within the piping system and discharge the particulate matter through the circulation and filtration system.

氣體封裝系統之各種具體實例可具有可維持實質上低粒環境之一粒子控制系統,從而提供在約0.1 μm或更大至約10 μm或更大之間的粒子之基板上粒子規範。對於目標粒徑範圍中之每一者,基板上粒子規範之各種具體實例可易於自每分鐘每平方公尺基板之平均基板上粒子分佈轉換至每分鐘每基板之平均基板上粒子分佈。如本文中先前所論述,可易於經由基板(例如,具體代大小之基板)與彼基板代之對應面積之間的已知關係進行此轉換。另外,可易於將每分鐘每平方公尺基板之平均基板上粒子分佈轉換至多種單位時間表達中之任何者。舉例而言,除了在標準時間單位(例如,秒、分鐘及天)之間的轉換外,亦可使用與處理特定有關之時間單位。舉例而言,如本文中先前所論述,印刷循環可與時間單位相關聯。Various embodiments of the gas packaging system can have a particle control system that can maintain a substantially low particle environment, thereby providing an on-substrate particle specification for particles between about 0.1 μm or greater to about 10 μm or greater. For each of the target particle size ranges, various embodiments of the on-substrate particle specification can be easily converted from an average on-substrate particle distribution per square meter of substrate per minute to an average on-substrate particle distribution per substrate per minute. As previously discussed herein, this conversion can be easily performed via a known relationship between a substrate (e.g., a substrate of a particular generation size) and the corresponding area of that substrate generation. In addition, the average on-substrate particle distribution per square meter of substrate per minute can be easily converted to any of a variety of unit time expressions. For example, in addition to conversions between standard time units (e.g., seconds, minutes, and days), process-specific time units may also be used. For example, as discussed previously herein, a print cycle may be associated with a time unit.

本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於10 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於2 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。對於本教示之氣體封裝系統之各種具體實例,可維持低粒環境,從而對於大小大於或等於0.3 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 10 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets a substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 5 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 2 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 1 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.5 μm. For various embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.3 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per minute per square meter of substrate for particles greater than or equal to 0.1 μm in size.

製造設施可能需要實質長度之各種服務束,該等服務束可操作性地自各種裝置及系統連接以提供(例如)操作印刷系統所需之光學、電、機械及流體連接。根據本教示,服務束可包括(例如但不限於)光纜、電纜、電線及管系及類似者。作為藉由使各種纜線、電線及管系及類似者一起捆紮於服務束中而創造的大量空隙空間之結果,根據本教示的服務束之各種具體實例可具有顯著的總死體積。自服務束中之大量空隙空間產生的總死體積可導致堵塞於其中的大量反應性氣態物質之滯留。反應性大氣源氣體之此實質來源可顯著增加氣體封裝組裝件之恢復時間,例如,在維護後。A manufacturing facility may require substantial lengths of various service bundles that are operably connected from various devices and systems to provide, for example, the optical, electrical, mechanical, and fluid connections required to operate a printing system. In accordance with the present teachings, a service bundle may include, for example but not limited to, optical cables, electrical cables, wires, and tubing, and the like. Various specific examples of service bundles in accordance with the present teachings may have a significant total dead volume as a result of the large amounts of void space created by bundling the various cables, wires, and tubing, and the like together in the service bundle. The total dead volume resulting from the large amounts of void space in the service bundle may result in the stagnation of large amounts of reactive gaseous materials that become stuck therein. This substantial source of reactive atmospheric source gas can significantly increase the recovery time of a gas package assembly, for example, after maintenance.

因此,除了提供粒子控制系統之組件之外,經由管道系統饋入服務束可減少氣體封裝組裝件的關於反應性物質之恢復時間;藉此更迅速地使氣體封裝組裝件重新達到用於執行空氣敏感性製程的規範。對於適用於印刷OLED器件的本教示之氣體封裝系統之各種具體實例,可將各種反應性物質(包括諸如水蒸氣及氧之各種反應性大氣源氣體以及有機溶劑蒸氣)中之每一物質維持處於100 ppm或更低,例如,處於10 ppm或更低、處於1.0 ppm或更低或處於0.1 ppm或更低。Thus, in addition to providing a component of a particle control system, feeding the service bundle through the ductwork can reduce the recovery time of a gas package assembly with respect to reactive species; thereby more quickly bringing the gas package assembly back into specification for use in performing air sensitive processes. For various specific embodiments of the presently taught gas package system for printed OLED devices, each of the various reactive species, including various reactive atmospheric source gases such as water vapor and oxygen, and organic solvent vapors, can be maintained at 100 ppm or less, e.g., at 10 ppm or less, at 1.0 ppm or less, or at 0.1 ppm or less.

為了理解經由管道系統饋入之纜線敷設可如何導致減少淨化來自由服務束中之空隙空間(其作為捆紮各種光纜、電纜、電線及流體管系及類似者之結果而創造)創造之死體積的堵塞之反應性大氣源氣體所花費之時間,對圖19A、圖19B及圖20進行參看。圖19A描繪服務束I之展開圖,服務束I可為可包括諸如管系A之管系的束,該管系可(例如)用於將各種墨水、溶劑及類似者傳遞至印刷系統(諸如,圖13A之印刷系統1050)。圖19A之服務束I可另外包括電佈線(諸如,電線B)或纜線(諸如,纜線C),其可為同軸纜線或光纜。包括於服務束中之此等管系、電線及纜線可自外部排線至內部以連接至組成OLED印刷系統的各種器件及裝置。如在圖19A之影線區域中看出,服務束中之空隙空間可創造明顯的死體積D。在圖19B之示意性透視圖中,當經由管道II饋入服務束I時,惰性氣體III可連續掃過該束。圖20之展開剖視圖描繪連續掃過捆紮之管系、電線及纜線的惰性氣體可如何有效地增大堵塞之反應性物質自形成於服務束中之死體積的移除速率。反應性物質A向如在圖20中由物質A佔據之聚集區域所指示的死體積外之擴散速率與在如在圖20中由惰性氣體物質B佔據之聚集區域所指示的死體積外部之反應性物質之濃度成反比。亦即,若在恰好處於死體積外部之容積中的反應性物質之濃度高,則擴散速率減小。若在此區域中的反應性物質濃度因惰性氣體之氣流而連續地自恰好處於死體積空間外部之容積減小,則藉由質量作用,反應性物質自死體積擴散之速率增大。另外,藉由相同原理,當堵塞之反應性物質被有效地自彼等空間移除時,惰性氣體可擴散至死體積內。To understand how cabling fed through ductwork can result in reduced time spent purging reactive bulk gas from dead volume created by void space in a service bundle (created as a result of bundling various optical cables, electrical cables, wires, fluid tubing, and the like), reference is made to Figures 19A, 19B, and 20. Figure 19A depicts an expanded view of a service bundle I, which can be a bundle that can include tubing such as tubing A, which can be used, for example, to deliver various inks, solvents, and the like to a printing system (e.g., printing system 1050 of Figure 13A). The service bundle I of FIG. 19A may additionally include electrical wiring (e.g., wire B) or cables (e.g., cable C), which may be coaxial cables or optical cables. Such tubing, wires, and cables included in the service bundle may be routed from the outside to the inside to connect to the various devices and apparatus that make up the OLED printing system. As seen in the hatched area of FIG. 19A , the void space in the service bundle may create a significant dead volume D. In the schematic perspective view of FIG. 19B , an inert gas III may be continuously swept through the bundle as it is fed into the service bundle I via conduit II. The expanded cross-sectional view of Figure 20 depicts how an inert gas continuously sweeping through bundled tubing, wires, and cables can effectively increase the removal rate of plugged reactive species from a dead volume formed in a service bundle. The diffusion rate of reactive species A out of the dead volume as indicated by the aggregated area occupied by species A in Figure 20 is inversely proportional to the concentration of reactive species outside the dead volume as indicated by the aggregated area occupied by inert gas species B in Figure 20. That is, if the concentration of reactive species is high in the volume just outside the dead volume, the diffusion rate decreases. If the concentration of the reactive substance in this area is continuously reduced from the volume just outside the dead volume space due to the flow of the inert gas, the diffusion rate of the reactive substance from the dead volume increases by mass effect. In addition, by the same principle, when the blocked reactive substance is effectively removed from those spaces, the inert gas can diffuse into the dead volume.

圖21A為氣體封裝組裝件101之各種具體實例之後部拐角之透視圖,還具有穿過返回管道1605至氣體封裝組裝件101之內部的幻象圖。對於氣體封裝組裝件101之各種具體實例,後壁面板1640可具有插入面板1610,該插入面板經組態以提供對(例如)電隔壁之接取。可經由隔壁將服務束饋入至纜線排線管道(諸如,在右壁面板1630中展示之管道1632),針對該管道,已移除可移除之插入面板以顯露排線至第一服務束管道進入口636之服務束。自其處,服務束可饋入至氣體封裝組裝件101之內部,且在穿過返回管道1605之幻象圖中展示為處於氣體封裝組裝件101之內部。氣體封裝組裝件之用於服務束排線的各種具體實例可具有一個以上服務束進入口,諸如圖21A中所展示,該圖描繪第一服務束管道進入口1634及用於另一服務束的第二服務束管道進入口1636。圖21B描繪用於纜線、電線及管系束的第一服務束管道進入口1634之展開圖。第一服務束管道進入口1634可具有開口1631,其經設計以形成具有滑動蓋1633之密封件。在各種具體實例中,開口1631可容納可撓性密封模組(諸如,由Roxtec Company針對纜線進入口密封件提供之可撓性密封模組),其可容納服務束中的各種直徑之纜線、電線及管系及類似者。替代地,滑動蓋1633之頂部1635及開口1631之上部部分1637可具有安置於每一表面上的保形材料,使得保形材料可在經由進入口(諸如,第一服務束管道進入口1634)饋入之服務束中的各種大小之直徑之纜線、電線及管系及類似者周圍形成密封件。FIG. 21A is a perspective view of the rear corner of various embodiments of the gas encapsulation assembly 101, and also has a phantom view of the interior of the gas encapsulation assembly 101 through the return duct 1605. For various embodiments of the gas encapsulation assembly 101, the rear wall panel 1640 may have an insert panel 1610 configured to provide access to, for example, an electrical bulkhead. The service bundle may be fed through the bulkhead to a cable routing duct (e.g., duct 1632 shown in the right wall panel 1630), for which the removable insert panel has been removed to reveal the service bundle routed to the first service bundle duct entry 636. From there, the service bundle can be fed into the interior of the gas package assembly 101 and is shown as being inside the gas package assembly 101 in the phantom view through the return duct 1605. Various specific embodiments of the gas package assembly for service bundle cabling can have more than one service bundle inlet, such as shown in Figure 21A, which depicts a first service bundle duct inlet 1634 and a second service bundle duct inlet 1636 for another service bundle. Figure 21B depicts an expanded view of the first service bundle duct inlet 1634 for a cable, wire and tubing bundle. The first service bundle duct inlet 1634 can have an opening 1631 designed to form a seal with a sliding cover 1633. In various specific examples, the opening 1631 can accommodate a flexible sealing module (e.g., a flexible sealing module provided by Roxtec Company for cable entry seals) that can accommodate cables, wires, pipes, and the like of various diameters in a service bundle. Alternatively, the top 1635 of the sliding cover 1633 and the upper portion 1637 of the opening 1631 can have a conformal material disposed on each surface so that the conformal material can form a seal around cables, wires, pipes, and the like of various sizes of diameters in a service bundle fed through an entry (e.g., the first service bundle duct entry 1634).

如在圖22及圖23中所描繪,一或多個風扇過濾器單元可經組態以提供經由氣體封裝組裝件之內部的氣體之實質上層流。根據用於本教示之氣體封裝組裝件的循環及過濾系統之各種具體實例,鄰近氣體封裝組裝件之第一內表面安置一或多個風扇單元,且鄰近氣體封裝組裝件之第二相對內表面安置一或多個管道系統入口。舉例而言,氣體封裝組裝件可包含一內部頂板及一底部內部周邊,該一或多個風扇單元可鄰近內部頂板安置,且該一或多個管道系統入口可包含鄰近底部內部周邊安置之複數個入口開口,該等入口開口為管道系統之部分,如在圖16至圖18中所展示。As depicted in Figures 22 and 23, one or more fan filter units may be configured to provide a substantial upper flow of gas through the interior of the gas encapsulation assembly. According to various specific embodiments of the circulation and filtration system for the gas encapsulation assembly of the present teachings, one or more fan units are disposed adjacent to a first interior surface of the gas encapsulation assembly, and one or more duct system inlets are disposed adjacent to a second opposing interior surface of the gas encapsulation assembly. For example, the gas enclosure assembly may include an inner top plate and a bottom inner periphery, the one or more fan units may be positioned adjacent to the inner top plate, and the one or more duct system inlets may include a plurality of inlet openings positioned adjacent to the bottom inner periphery, the inlet openings being part of the duct system, as shown in Figures 16 to 18.

圖22為根據本教示之各種具體實例的沿著氣體封裝系統505之長度截取之橫截面圖。圖22之氣體封裝系統505可包括一氣體封裝組裝件1100,其可容納一OLED噴墨印刷系統2001以及循環及過濾系統1500、氣體淨化系統3130(圖12及圖13)及熱調節系統3140。循環及過濾系統1500可包括管道系統組裝件1501及風扇過濾器單元組裝件1502。熱調節系統3140可包括流體冷卻器3142,其與冷卻器出口線路3141且與冷卻器入口線路3143流體連通。經冷卻之流體可退出流體冷卻器3142,流過冷卻器出口線路3141,且經傳遞至熱交換器,對於氣體封裝系統之各種具體實例,如在圖22中所展示,熱交換器的位置可最接近複數個風扇過濾器單元中之每一者。流體可經由冷卻器入口線路3143而自最接近風扇過濾器單元之熱交換器返回至冷卻器3142以維持在恆定所要的溫度下。如本文中先前所論述,冷卻器出口線路3141及冷卻器入口線路3143與包括第一熱交換器1562、第二熱交換器1564及第三熱交換器1566之複數個熱交換器流體連通。根據如圖22中展示的氣體封裝系統505之各種具體實例,第一熱交換器1562、第二熱交換器1564及第三熱交換器1566分別與循環及過濾系統1500之風扇過濾器單元組裝件1502之第一風扇過濾器單元1552、第二風扇過濾器單元1554及第三風扇過濾器單元1556熱連通。FIG22 is a cross-sectional view taken along the length of a gas packaging system 505 according to various specific examples of the present teachings. The gas packaging system 505 of FIG22 may include a gas packaging assembly 1100 that may house an OLED inkjet printing system 2001 as well as a circulation and filtration system 1500, a gas purification system 3130 (FIGS. 12 and 13), and a thermal conditioning system 3140. The circulation and filtration system 1500 may include a duct system assembly 1501 and a fan filter unit assembly 1502. The thermal conditioning system 3140 may include a fluid cooler 3142 that is in fluid communication with a cooler outlet line 3141 and with a cooler inlet line 3143. The cooled fluid can exit the fluid cooler 3142, flow through the cooler outlet line 3141, and be passed to the heat exchanger, which can be located closest to each of the plurality of fan filter units for various specific examples of the gas packaging system, as shown in Figure 22. The fluid can be returned to the cooler 3142 from the heat exchanger closest to the fan filter unit via the cooler inlet line 3143 to maintain a constant desired temperature. As previously discussed herein, the cooler outlet line 3141 and the cooler inlet line 3143 are in fluid communication with a plurality of heat exchangers including the first heat exchanger 1562, the second heat exchanger 1564, and the third heat exchanger 1566. According to various specific examples of the gas packaging system 505 as shown in Figure 22, the first heat exchanger 1562, the second heat exchanger 1564 and the third heat exchanger 1566 are thermally connected to the first fan filter unit 1552, the second fan filter unit 1554 and the third fan filter unit 1556 of the fan filter unit assembly 1502 of the circulation and filtering system 1500, respectively.

在圖22中,許多箭頭描繪循環及過濾系統1500中之空氣流提供在氣體封裝組裝件1100內的低粒過濾空氣。在圖22中,管道系統組裝件1501可包括第一管道系統管路1573及第二管道系統管路1574,如在圖22之簡化示意圖中所描繪。第一管道系統管路1573可經由第一管道系統入口1571接收氣體,且可經由第一管道系統出口1575排出。類似地,第二管道系統管路1574可經由第二管道系統入口1572接收氣體,且經由第二管道系統出口1576排出。另外,如在圖22中所示,管道系統組裝件1501藉由有效界定可經由氣體淨化出口線路3131及氣體淨化入口線路3133而與氣體淨化系統3130流體連通之空間1580來分開經由風扇過濾器單元組裝件1502在內部再循環之惰性氣體。包括如針對圖16至圖18所描述之管道系統之各種具體實例的此循環系統提供實質上層流,使亂流最小化,促進封裝之內部中的氣體氣氛之顆粒物之循環、更新及過濾,且提供經由在氣體封裝組裝件外部之氣體淨化系統之循環。In FIG22 , a number of arrows depict air flow in the circulation and filtration system 1500 to provide low-particle filtered air within the gas packaging assembly 1100. In FIG22 , the duct system assembly 1501 may include a first duct system line 1573 and a second duct system line 1574, as depicted in the simplified schematic diagram of FIG22 . The first duct system line 1573 may receive gas via a first duct system inlet 1571 and may discharge via a first duct system outlet 1575. Similarly, the second duct system line 1574 may receive gas via a second duct system inlet 1572 and discharge via a second duct system outlet 1576. In addition, as shown in Figure 22, the duct system assembly 1501 separates the inert gas that is recirculated internally through the fan filter unit assembly 1502 by effectively defining a space 1580 that can be fluidly connected to the gas purification system 3130 through the gas purification outlet line 3131 and the gas purification inlet line 3133. This circulation system, including various specific examples of the duct system as described for Figures 16 to 18, provides substantial top flow, minimizes turbulence, promotes circulation, renewal and filtering of particulate matter in the gas atmosphere inside the package, and provides circulation through the gas purification system outside the gas package assembly.

圖23為根據根據本教示之氣體封裝系統之各種具體實例的沿著氣體封裝系統506之長度截取之橫截面圖。如圖22之氣體封裝系統505,圖23之氣體封裝系統506可包括一氣體封裝組裝件1100,其可收容一OLED噴墨印刷系統2001以及循環及過濾系統1500、氣體淨化系統3130(圖15)及熱調節系統3140。循環及過濾系統1500可包括管道系統組裝件1501及風扇過濾器單元組裝件1502。對於氣體封裝系統506之各種具體實例,可包括與冷卻器出口線路3141且與冷卻器入口線路3143流體連通之流體冷卻器3142的熱調節系統3140可與複數個熱交換器(例如,如在圖23中所描繪之第一熱交換器1562及第二熱交換器1564)流體連通。根據如圖22中展示的氣體封裝系統506之各種具體實例,諸如第一熱交換器1562及第二熱交換器1564之各種熱交換器可藉由最接近管道出口(諸如,管道系統組裝件1501之第一管道系統出口1575及第二管道系統出口1576)定位而與循環惰性氣體熱連通。在此點上,自管道入口(諸如,管道入口,諸如,管道系統組裝件1501之第一管道系統入口1571及第二管道系統入口1572)返回用於過濾之惰性氣體可在分別經由(例如)圖23之風扇過濾器單元組裝件1502之第一風扇過濾器單元1552、第二風扇過濾器單元1554及第三風扇過濾器單元1556循環前經熱調節。FIG23 is a cross-sectional view taken along the length of a gas packaging system 506 according to various specific examples of the gas packaging system according to the present teachings. Like the gas packaging system 505 of FIG22 , the gas packaging system 506 of FIG23 may include a gas packaging assembly 1100 that may house an OLED inkjet printing system 2001 as well as a circulation and filtration system 1500, a gas purification system 3130 ( FIG15 ), and a thermal conditioning system 3140. The circulation and filtration system 1500 may include a duct system assembly 1501 and a fan filter unit assembly 1502. For various specific examples of the gas packaging system 506, a thermal conditioning system 3140, which may include a fluid cooler 3142 in fluid communication with the cooler outlet line 3141 and with the cooler inlet line 3143, may be in fluid communication with a plurality of heat exchangers (e.g., the first heat exchanger 1562 and the second heat exchanger 1564 as depicted in FIG23). According to various specific examples of the gas packaging system 506 as shown in FIG22, various heat exchangers such as the first heat exchanger 1562 and the second heat exchanger 1564 may be in thermal communication with the circulating inert gas by being positioned proximate to a duct outlet (e.g., the first duct outlet 1575 and the second duct outlet 1576 of the duct assembly 1501). At this point, the inert gas returned for filtering from the duct inlet (e.g., duct inlet, e.g., first duct system inlet 1571 and second duct system inlet 1572 of duct system assembly 1501) can be thermally conditioned before circulating through, for example, the first fan filter unit 1552, the second fan filter unit 1554 and the third fan filter unit 1556 of the fan filter unit assembly 1502 of FIG. 23, respectively.

如可自展示經由圖22及圖23中之封裝的惰性氣體循環之方向之箭頭看出,風扇過濾器單元可經組態以提供自封裝之頂部向下朝向底部之實質上層流。可購自(例如)北卡羅來納州Washington之Flanders Corporation或北卡羅來納州Sanford之Envirco Corporation的風扇過濾器單元可適用於整合至根據本教示之氣體封裝組裝件之各種具體實例內。風扇過濾器單元之各種具體實例可經由每一單元交換在每分鐘約350立方英尺 (CFM)至約700 CFM之間之惰性氣體。如圖22及圖23中所展示,當風扇過濾器單元並聯且非串聯配置時,可在包含複數個風扇過濾器單元之系統中交換的惰性氣體之量與使用的單元之數目成比例。As can be seen from the arrows showing the direction of inert gas circulation through the package in Figures 22 and 23, the fan filter unit can be configured to provide a substantial upper flow from the top of the package downward toward the bottom. Fan filter units available from, for example, Flanders Corporation of Washington, North Carolina or Envirco Corporation of Sanford, North Carolina may be suitable for integration into various embodiments of gas package assemblies according to the present teachings. Various embodiments of fan filter units may exchange between about 350 cubic feet per minute (CFM) and about 700 CFM of inert gas through each unit. As shown in Figures 22 and 23, when fan-filter units are configured in parallel and not in series, the amount of inert gas that can be exchanged in a system containing multiple fan-filter units is proportional to the number of units used.

在封裝之底部附近,朝向複數個管道系統入口(在圖22及圖23中示意性地指示為管道系統組裝件1501之第一管道系統入口1571及第二管道系統入口1572)引導氣體流。如本文中先前針對圖16至圖18所論述,將管道入口實質上定位於封裝之底部且造成來自上部風扇過濾器單元的向下氣體流有助於封裝內的氣體氣氛之良好更新,且促進整個氣體氣氛經由結合封裝使用之氣體淨化系統之澈底更新及移動。藉由經由管道系統循環氣體氣氛且使用循環及過濾系統1500(該管道系統組裝件1501分開惰性氣體流以用於經由氣體淨化迴路3130循環)促進封裝中的氣體氣氛之層流及澈底更新,在氣體封裝組裝件之各種具體實例中,可將諸如水及氧以及溶劑中之每一者的反應性物質中之每一者之含量維持在100 ppm或更低,例如,1 ppm或更低,例如,在0.1 ppm或更低。Near the bottom of the package, the gas flow is directed toward a plurality of duct system inlets (schematically indicated in Figures 22 and 23 as first duct system inlet 1571 and second duct system inlet 1572 of duct system assembly 1501). As previously discussed herein with respect to Figures 16-18, positioning the duct inlets substantially at the bottom of the package and causing a downward gas flow from the upper fan filter unit facilitates good renewal of the gas atmosphere within the package and promotes thorough renewal and movement of the entire gas atmosphere through the gas purification system used in conjunction with the package. By circulating the gas atmosphere through a piping system and using a circulation and filtering system 1500 (the piping system assembly 1501 separates the inert gas flow for circulation through the gas purification loop 3130) to promote laminar flow and thorough renewal of the gas atmosphere in the package, in various specific embodiments of the gas package assembly, the content of each of the reactive substances such as water and oxygen and each of the solvents can be maintained at 100 ppm or less, for example, 1 ppm or less, for example, at 0.1 ppm or less.

圖24為氣體封裝系統507之前部示意圖,其可為圖22之氣體封裝系統505之前部示意圖。在圖24中,可看出被描繪為封裝於氣體封裝系統507中的印刷系統2001之更多細節。具有粒子控制系統的本教示之氣體封裝系統之各種具體實例可提供最接近基板(諸如,圖24之基板2050)的低粒地帶,該基板可由基板支撐裝置2200支撐。印刷系統之各種具體實例的印刷系統2001之基板支撐裝置2200可為夾盤或浮動台。如本文中先前所論述,根據本教示之氣體循環及過濾系統之各種具體實例可包括一管道系統組裝件(諸如,圖24之管道系統組裝件1501)以及可具有複數個風扇過濾器單元之風扇過濾器單元組裝件(諸如,風扇過濾器單元組裝件1502,其中在圖24之前部示意圖中展示風扇過濾器單元1552)。由箭頭指示之氣體流描繪最接近基板2050的經過濾之氣體之層流。回想起,層流環境可使亂流最小化,且可創造可維持符合國際標準組織標準(ISO) 14644-1:1999(如由第1類別至第5類別指定)之標準的空中顆粒含量之實質上低粒環境。FIG. 24 is a schematic diagram of the front portion of a gas encapsulation system 507, which may be a schematic diagram of the front portion of the gas encapsulation system 505 of FIG. 22. In FIG. 24, more details of the printing system 2001 depicted as encapsulated in the gas encapsulation system 507 can be seen. Various specific embodiments of the gas encapsulation system of the present teachings with a particle control system can provide a low particle zone proximate to a substrate (e.g., substrate 2050 of FIG. 24), which can be supported by a substrate support device 2200. The substrate support device 2200 of the printing system 2001 of various specific embodiments of the printing system can be a chuck or a floating table. As discussed previously herein, various specific examples of gas circulation and filtering systems according to the present teachings may include a duct system assembly (e.g., duct system assembly 1501 of FIG. 24 ) and a fan filter unit assembly (e.g., fan filter unit assembly 1502 , wherein fan filter unit 1552 is shown in the front schematic of FIG. 24 ) that may have a plurality of fan filter units. The gas flow indicated by the arrows depicts the laminar flow of the filtered gas proximate to the substrate 2050 . Recall that a laminar flow environment minimizes turbulence and creates a substantially low-particle environment that maintains airborne particle levels consistent with International Organization for Standardization (ISO) 14644-1:1999 (as designated by Class 1 through Class 5).

如本文中隨後將更詳細地論述,對於本教示之氣體封裝系統之各種具體實例,一有效氣體循環及過濾系統可為粒子控制系統之一部分。然而,本教示之各種粒子控制系統亦預防在印刷製程期間最接近基板之粒子產生。如圖24中針對氣體封裝系統507之氣體封裝組裝件1100所描繪,基板2050可最接近印刷系統2001之可產生粒子的各種組件。舉例而言,X, Z托架組裝件2300可包括諸如可產生粒子之線性軸承系統之組件。服務束外殼2410可含有操作性地自各種裝置及系統連接至包括印刷系統之氣體封裝系統的粒子產生服務束。服務束之各種具體實例可包括捆紮之光纜、電纜、電線及管系及類似者,用於提供用於安置於氣體封裝系統之內部內的各種組裝件及系統之光學、電、機械及流體功能。As will be discussed in more detail later herein, for various specific embodiments of the gas packaging system of the present teachings, an effective gas circulation and filtration system may be part of the particle control system. However, the various particle control systems of the present teachings also prevent particle generation proximate to the substrate during the printing process. As depicted in FIG. 24 for the gas packaging assembly 1100 of the gas packaging system 507, the substrate 2050 may be proximate to the various components of the printing system 2001 that may generate particles. For example, the X, Z carriage assembly 2300 may include components such as a linear bearing system that may generate particles. The service bundle housing 2410 may contain a particle generation service bundle that is operably connected from various devices and systems to the gas packaging system including the printing system. Various specific examples of service bundles may include bundles of optical fibers, electrical cables, wires, tubing, and the like used to provide optical, electrical, mechanical, and fluidic functions for various components and systems housed within the interior of a gas enclosure system.

本教示之氣體封裝系統可具有提供一粒子控制系統之各種組件。粒子控制系統之各種具體實例可包括與已被圍阻之粒子產生組件流體連通的氣體循環及過濾系統,使得可將此等圍阻粒子之組件排氣至氣體循環及過濾系統內。對於粒子控制系統之各種具體實例,已圍阻之粒子產生組件可被排氣至死空間內,從而致使此顆粒物不可用於在氣體封裝系統內再循環。本教示之氣體封裝系統之各種具體實例可具有一粒子控制系統,用於該粒子控制系統之各種組件可固有地為低粒產生的,藉此防止粒子在印刷製程期間累積於基板上。本教示之粒子控制系統之各種組件可利用粒子產生組件之圍阻及排氣,以及對固有地低粒產生的組件之選擇來提供最接近基板之低粒地帶。The gas packaging system of the present teachings may have various components that provide a particle control system. Various specific examples of the particle control system may include a gas circulation and filtration system that is fluidly connected to the trapped particle generation components, so that such trapped particle components can be exhausted into the gas circulation and filtration system. For various specific examples of the particle control system, the trapped particle generation components can be exhausted into the dead space, thereby rendering such particulate matter unavailable for recirculation within the gas packaging system. Various specific examples of the gas packaging system of the present teachings may have a particle control system, and various components used in the particle control system may be inherently low-particle generating, thereby preventing particles from accumulating on the substrate during the printing process. Various components of the particle control system of the present teachings may utilize containment and exhaust of particle generating components, as well as selection of components that are inherently low in particle generation, to provide a low particle zone proximate to the substrate.

根據用於OLED印刷系統的氣體封裝系統之各種具體實例,在處理期間可根據印刷系統中的基板之實體位置選擇風扇過濾器單元之數目。因而,風扇過濾器單元之數目可根據經由氣體封裝系統的基板之行程來變化。舉例而言,圖25為沿著氣體封裝系統508(其為類似於圖9中描繪之氣體封裝系統的氣體封裝系統)之長度截取之橫截面圖。氣體封裝系統508可包括氣體封裝組裝件1100,其收容支撐於氣體封裝組裝件基底1320上之OLED噴墨印刷系統2001。OLED印刷系統之基板浮動台2200界定在基板之處理期間基板可在氣體封裝系統508中移動經過之行程。因而,氣體封裝系統508之風扇過濾器單元組裝件1502具有對應於在處理期間基板在噴墨印刷系統2001中之實體行程的適當數目個風扇過濾器單元(展示為1551-1555)。另外,圖25之示意性剖視圖描繪氣體封裝之各種具體實例之輪廓,其可有效減小在OLED印刷製程期間需要的惰性氣體之體積,且同時使得易於在處理期間遠端地(例如)使用裝設於各種手套端口中之手套或在維護操作之情況下直接藉由各種可移除之面板來接取氣體封裝組裝件1100之內部。According to various specific embodiments of a gas packaging system for an OLED printing system, the number of fan filter units may be selected according to the physical location of the substrate in the printing system during processing. Thus, the number of fan filter units may vary according to the travel of the substrate through the gas packaging system. For example, FIG. 25 is a cross-sectional view taken along the length of a gas packaging system 508 (which is a gas packaging system similar to the gas packaging system depicted in FIG. 9 ). The gas packaging system 508 may include a gas packaging assembly 1100 that houses an OLED inkjet printing system 2001 supported on a gas packaging assembly base 1320. The substrate float stage 2200 of the OLED printing system defines the path through which a substrate may move in the gas packaging system 508 during processing of the substrate. Thus, the fan filter unit assembly 1502 of the gas packaging system 508 has an appropriate number of fan filter units (shown as 1551-1555) corresponding to the physical path through which a substrate may move in the inkjet printing system 2001 during processing. In addition, the schematic cross-sectional view of Figure 25 depicts the outlines of various specific examples of gas packaging, which can effectively reduce the volume of inert gas required during the OLED printing process, while also making it easy to access the interior of the gas packaging assembly 1100 remotely (for example) during processing using gloves installed in various glove ports or directly through various removable panels during maintenance operations.

圖26描繪根據本教示之印刷系統之各種具體實例的印刷系統2002。印刷系統2002可具有如先前針對圖10B之印刷系統2000所描述的特徵中之許多者。印刷系統2002可由印刷系統基底2101支撐。與印刷系統基底2101正交且安裝於印刷系統基底2101上的可為第一升流管2120及第二升流管2122,橋接部2130可安裝於該等升流管上。對於噴墨印刷系統2002之各種具體實例,橋接部2130可支撐可在X軸方向上相對於基板支撐裝置2250移動穿過服務束載體伸展部2401之至少一X軸托架組裝件2300。如本文中隨後將更詳細地論述,對於印刷系統2002之各種具體實例,X軸托架組裝件2300可利用固有地為低粒產生之一線性空氣軸承運動系統。根據本教示之印刷系統之各種具體實例,X軸托架可具有安裝於其上之Z軸移動板。在圖26中,描繪X軸托架組裝件2300具有第一Z軸移動板2315。在印刷系統2002之各種具體實例中,第二X軸托架組裝件可安裝於橋接部2130上,該橋接部亦可具有安裝於其上之Z軸移動板。在此點上,類似於圖10B之印刷系統2000,對於OLED噴墨印刷系統2002之各種具體實例,可存在兩個托架組裝件,每一者具有一印刷頭組裝件,例如,圖26之印刷頭組裝件2500,以及安裝於第二X, Z軸托架組裝件(圖中未示)上之第二印刷頭組裝件。在印刷系統2002之各種具體實例中,第一印刷頭組裝件(諸如,圖26之印刷頭組裝件2500)可安裝於第一X, Z軸托架組裝件上,而用於檢驗基板2050之特徵的相機系統可安裝於第二X, Z軸托架組裝件(圖中未示)上。在圖26之印刷系統2002之各種具體實例中,印刷頭組裝件(諸如,圖26之印刷頭組裝件2500)可安裝於X, Z軸托架組裝件上,而用於固化印刷於基板2050上之囊封層的UV燈或熱源可安裝於第二X, Z軸托架組裝件(圖中未示)上。FIG. 26 depicts a printing system 2002 according to various embodiments of printing systems of the present teachings. The printing system 2002 can have many of the features previously described with respect to the printing system 2000 of FIG. 10B . The printing system 2002 can be supported by a printing system base 2101 . Orthogonal to and mounted on the printing system base 2101 can be a first riser 2120 and a second riser 2122 to which a bridge 2130 can be mounted. For various embodiments of the inkjet printing system 2002 , the bridge 2130 can support at least one X-axis carriage assembly 2300 that can move in the X-axis direction relative to the substrate support 2250 through the service bundle carrier extension 2401 . As will be discussed in greater detail later herein, for various embodiments of the printing system 2002, the X-axis carriage assembly 2300 can utilize a linear air bearing motion system that is inherently low in particle generation. In accordance with various embodiments of the printing system of the present teachings, the X-axis carriage can have a Z-axis translation plate mounted thereon. In FIG. 26 , the X-axis carriage assembly 2300 is depicted having a first Z-axis translation plate 2315. In various embodiments of the printing system 2002, a second X-axis carriage assembly can be mounted on the bridge 2130, which can also have a Z-axis translation plate mounted thereon. At this point, similar to the printing system 2000 of FIG. 10B , for various specific examples of the OLED inkjet printing system 2002, there may be two carriage assemblies, each having a print head assembly, such as the print head assembly 2500 of FIG. 26 , and a second print head assembly mounted on a second X, Z axis carriage assembly (not shown). In various specific examples of the printing system 2002, the first print head assembly (such as the print head assembly 2500 of FIG. 26 ) may be mounted on the first X, Z axis carriage assembly, and a camera system for inspecting features of the substrate 2050 may be mounted on the second X, Z axis carriage assembly (not shown). In various specific examples of the printing system 2002 of Figure 26, a print head assembly (e.g., print head assembly 2500 of Figure 26) can be mounted on an X, Z axis bracket assembly, and a UV lamp or heat source for curing the encapsulation layer printed on the substrate 2050 can be mounted on a second X, Z axis bracket assembly (not shown).

根據印刷系統2002之各種具體實例,基板支撐裝置2250可為浮動台,其類似於圖10B之印刷系統2000之浮動台2200,其中在X, Y平面中可含有一基板,且浮動台可用以固定穩定的Z軸飛行高度。在印刷系統2002之各種具體實例中,基板支撐裝置2250可為夾盤。在印刷系統2002之各種具體實例中,夾盤可具有用於安裝基板之頂表面2252。在印刷系統2002之各種具體實例中,頂表面2252可支撐可替換之頂部板,從而實現容易的不同基板大小及類型之間的可交換性。在印刷系統2002之各種具體實例中,頂部板可容納不同大小及類型之多個基板。在可利用夾盤作為基板支撐裝置的印刷系統2002之各種具體實例中,在印刷製程期間,可使用此項技術中已知之真空、磁性或機械方式將基板牢固地固持於夾盤上。精確XYZ運動系統可具有用於使安裝於基板支撐裝置2250上之基板相對於印刷頭組裝件2500定位的各種組件,其可包括Y軸運動組裝件2355,以及X, Z托架組裝件2300。基板支撐裝置2250可安裝於Y軸運動組裝件2355上,且可使用(例如但不限於)線性軸承系統(利用機械軸承或空氣軸承)在軌系統2360上移動。對於氣體封裝系統之各種具體實例,空氣軸承運動系統有助於置放於基板支撐裝置2250上之基板在Y軸方向上的無摩擦傳送。Y軸運動系統2355亦可視情況使用雙軌運動,再次,由線性空氣軸承運動系統或線性機械軸承運動系統提供。根據本教示,可使用其他精確XYZ運動系統,諸如(但不限於),3軸線高架系統之各種具體實例。舉例而言,3軸線高架系統之各種具體實例可具有安裝於高架橋接部上的用於精確X, Z軸移動之X, Z托架組裝件,其中可精確地在Y軸方向上移動高架。According to various embodiments of the printing system 2002, the substrate support device 2250 can be a floating table, which is similar to the floating table 2200 of the printing system 2000 of Figure 10B, wherein a substrate can be contained in the X, Y plane, and the floating table can be used to fix a stable Z-axis flying height. In various embodiments of the printing system 2002, the substrate support device 2250 can be a chuck. In various embodiments of the printing system 2002, the chuck can have a top surface 2252 for mounting the substrate. In various embodiments of the printing system 2002, the top surface 2252 can support a replaceable top plate, thereby achieving easy interchangeability between different substrate sizes and types. In various embodiments of the printing system 2002, the top plate can accommodate multiple substrates of different sizes and types. In various embodiments of the printing system 2002 that can utilize a chuck as a substrate support device, the substrate can be securely held on the chuck during the printing process using vacuum, magnetic, or mechanical means known in the art. The precision XYZ motion system can have various components for positioning a substrate mounted on the substrate support device 2250 relative to the printhead assembly 2500, which can include a Y-axis motion assembly 2355, and an X, Z carriage assembly 2300. The substrate support device 2250 can be mounted on a Y-axis motion assembly 2355 and can move on a rail system 2360 using, for example but not limited to, a linear bearing system (using mechanical bearings or air bearings). For various specific embodiments of the gas packaging system, the air bearing motion system facilitates frictionless transport of the substrate placed on the substrate support device 2250 in the Y-axis direction. The Y-axis motion system 2355 can also use dual rail motion, again, provided by a linear air bearing motion system or a linear mechanical bearing motion system, as appropriate. Other precision XYZ motion systems can be used in accordance with the present teachings, such as, but not limited to, various specific embodiments of a 3-axis overhead system. For example, various embodiments of a 3-axis overhead system may have an X, Z carriage assembly mounted on an overhead bridge for precise X, Z axis movement, wherein the overhead may be precisely moved in the Y axis direction.

除了用於維持氣體封裝系統內之低粒環境之氣體循環及過濾系統之外,印刷系統(諸如,圖10B之印刷系統2000及圖26之印刷系統2002)之各種具體實例亦可具有整合至氣體封裝系統內的額外組件,其預防在印刷製程期間最接近基板之粒子產生。舉例而言,圖10B之印刷系統2000及圖26之印刷系統2002可具有一固有地低粒產生的X軸運動系統,其中可使用線性空氣軸承系統2320在橋接部2130上安裝及定位X, Z托架組裝件2300。另外,圖10B之印刷系統2000及圖26之印刷系統2002可具有服務束外殼排氣系統2400,以用於圍阻及排出自服務束產生之粒子。In addition to the gas circulation and filtration systems for maintaining a low particle environment within the gas encapsulation system, various embodiments of the printing system (e.g., the printing system 2000 of FIG. 10B and the printing system 2002 of FIG. 26 ) may also have additional components integrated into the gas encapsulation system that prevent particle generation proximate to the substrate during the printing process. For example, the printing system 2000 of FIG. 10B and the printing system 2002 of FIG. 26 may have an inherently low particle generation X-axis motion system in which a linear air bearing system 2320 may be used to mount and position the X, Z carriage assembly 2300 on the bridge 2130. In addition, the printing system 2000 of FIG. 10B and the printing system 2002 of FIG. 26 may have a service bundle enclosure exhaust system 2400 for confining and exhausting particles generated from the service bundle.

根據本教示,服務束可包括(藉由非限制性實例)光纜、電纜、電線及管系及類似者。本教示之服務束之各種具體實例可操作性地連接至氣體封裝系統中之各種器件及裝置以提供在(例如但不限於)與印刷系統相關聯之各種器件及裝置之操作中所需的光學、電、機械及流體連接。考慮到各種服務束之大小及複雜性,各種運動系統常需要當將服務束與運動系統一起移動時服務束載體能對服務束進行管理。對於本教示之氣體封裝系統之各種具體實例,服務束載體可為可撓性帶,以用於將纜線、電線及管系及類似者之束按規則間隔系在一起。對於本教示之氣體封裝系統之各種具體實例,服務束載體可為服務束之護套或外套,其可覆蓋纜線、電線及管系及類似者之束。在本教示之氣體封裝系統之各種具體實例中,服務束載體可與服務束之纜線、電線及管系及類似者之束模製在一起。在各種具體實例中,服務束載體可為分段或可撓性鏈,其可支撐及載運纜線、電線及管系及類似者之束。In accordance with the present teachings, a service bundle may include (by way of non-limiting example) optical cables, electrical cables, wires, tubing, and the like. Various specific embodiments of the service bundle of the present teachings may be operably connected to various components and devices in a gas packaging system to provide the optical, electrical, mechanical, and fluid connections required in the operation of various components and devices associated with (for example, but not limited to) a printing system. In view of the size and complexity of various service bundles, various motion systems often require a service bundle carrier to manage the service bundle as the service bundle is moved with the motion system. For various specific embodiments of the gas packaging system of the present teachings, the service bundle carrier may be a flexible band for tying bundles of cables, wires, tubing, and the like together at regular intervals. For various embodiments of the gas encapsulation system of the present teachings, the service bundle carrier can be a sheath or jacket of the service bundle that can cover a bundle of cables, wires, tubing, and the like. In various embodiments of the gas encapsulation system of the present teachings, the service bundle carrier can be molded together with the bundle of cables, wires, tubing, and the like of the service bundle. In various embodiments, the service bundle carrier can be a segmented or flexible chain that can support and carry the bundle of cables, wires, tubing, and the like.

根據本教示之氣體封裝系統之各種具體實例,可包括使用服務束載體管理之服務束的服務束外殼可圍阻自服務束外殼內之服務束及服務束載體產生之顆粒物。另外,如本文中隨後將更詳細地論述,服務束載體之移動可當其在服務束外殼內移動時按活塞狀方式壓縮空氣容積,從而創造內部服務束外殼與在服務束外殼外部之周圍環境之間的正壓力差,其可允許自與服務束載體相關聯之粒子產生組件形成的顆粒物經由(例如)由載體伸展部形成之開口逸散。十分接近基板之此顆粒物在被掃走至循環及過濾系統內之前具有污染基板表面之大機率。因此,服務束外殼排氣系統可為可圍阻且排氣服務束外殼的氣體封裝系統之粒子控制系統之各種具體實例之組件,以便確保實質上低粒印刷環境。Various specific examples of gas encapsulation systems according to the present teachings may include a service bundle managed using a service bundle carrier, wherein a service bundle enclosure may contain particulate matter generated from the service bundle and the service bundle carrier within the service bundle enclosure. Additionally, as will be discussed in greater detail later herein, the movement of the service bundle carrier may compress the volume of air in a piston-like manner as it moves within the service bundle enclosure, thereby creating a positive pressure differential between the interior service bundle enclosure and the surrounding environment outside the service bundle enclosure, which may allow particulate matter generated from a particle generating component associated with the service bundle carrier to escape through an opening formed, for example, by an extension of the carrier. Such particles in close proximity to the substrate have a high probability of contaminating the substrate surface before being swept away into the circulation and filtration system. Therefore, the service bundle enclosure exhaust system can be a component of various embodiments of a particle control system that can contain and exhaust the gas packaging system of the service bundle enclosure to ensure a substantially low particle printing environment.

如圖26中所示且由虛線所指示,對於服務束外殼排氣系統2400之各種具體實例,服務束外殼2410及服務束外殼排氣空間2420可為整體組裝件。對於此等具體實例,服務束外殼排氣系統2400可確保可維持服務束外殼之入口部分與出口部分之間的正壓力差,以用於經由服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424將在服務束外殼2410中產生之粒子排出至氣體循環及過濾系統內。替代地,對於各種具體實例,服務束外殼排氣系統2400可包括服務束外殼排氣空間2420,其可安裝至服務束外殼2410且與該服務束外殼流體連通。服務束外殼2410可圍阻由可包括捆紮之光纜、電纜、電線及管系及類似者之服務束產生的粒子。本教示之服務束之各種具體實例可提供一氣體封裝系統,其可包括一印刷系統,其中用於各種組裝件及系統的光學、電、機械及流體功能中之至少一者安置於氣體封裝之內部內。對於印刷系統2002之各種具體實例,服務束外殼排氣系統2400可確保可維持在服務束外殼之入口部分與出口部分之間的正壓力差,以用於將服務束外殼2410中所圍阻之粒子排出至服務束外殼排氣空間2420內。服務束外殼排氣空間2420可經由服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424而與氣體循環及過濾系統流體連通。替代地,服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424可配有可撓性排氣軟管,使得由服務束外殼圍阻之粒子可經由服務束外殼排氣空間排出且經由可撓性排氣軟管引導至目標死空間內。As shown in FIG26 and indicated by the dotted line, for various specific examples of the service bundle enclosure exhaust system 2400, the service bundle enclosure 2410 and the service bundle enclosure exhaust space 2420 can be an integral assembly. For these specific examples, the service bundle enclosure exhaust system 2400 can ensure that a positive pressure difference between the inlet portion and the outlet portion of the service bundle enclosure can be maintained for exhausting particles generated in the service bundle enclosure 2410 into the gas circulation and filtering system via the service bundle enclosure exhaust space first duct 2422 and the service bundle enclosure exhaust space second duct 2424. Alternatively, for various specific examples, the service bundle enclosure exhaust system 2400 may include a service bundle enclosure exhaust space 2420 that may be mounted to the service bundle enclosure 2410 and in fluid communication with the service bundle enclosure. The service bundle enclosure 2410 may contain particles generated by the service bundle, which may include bundled optical cables, electrical cables, wires, and tubing, and the like. Various specific examples of the service bundle of the present teachings may provide a gas packaging system, which may include a printing system, wherein at least one of the optical, electrical, mechanical, and fluid functions for various assemblies and systems is disposed within the interior of the gas packaging. For various specific examples of the printing system 2002, the service bundle enclosure exhaust system 2400 can ensure that a positive pressure difference can be maintained between the inlet and outlet portions of the service bundle enclosure, so as to discharge particles trapped in the service bundle enclosure 2410 into the service bundle enclosure exhaust space 2420. The service bundle enclosure exhaust space 2420 can be fluidly connected to the gas circulation and filtering system via the service bundle enclosure exhaust space first pipe 2422 and the service bundle enclosure exhaust space second pipe 2424. Alternatively, the service bundle enclosure exhaust space first pipe 2422 and the service bundle enclosure exhaust space second pipe 2424 may be equipped with flexible exhaust hoses so that particles enclosed by the service bundle enclosure may be discharged through the service bundle enclosure exhaust space and guided into the target dead space through the flexible exhaust hoses.

此外,除了維持在服務束外殼排氣系統之入口部分與出口部分之間的正壓力差之外,對於服務束外殼排氣系統之各種具體實例,亦可進一步維持服務束外殼排氣系統之內部與周圍環境之間的相對中性或負壓力差。可在服務束外殼排氣系統之內部與周圍環境之間維持的此相對中性或負壓力差可防止粒子經由裂縫、縫隙及類似者自服務束外殼排氣系統洩漏。在十分接近基板處經由裂縫、縫隙及類似者洩漏的粒子在被掃走至循環及過濾系統內之前具有污染基板表面之大機率。Furthermore, in addition to maintaining a positive pressure differential between an inlet portion and an outlet portion of a service beam enclosure exhaust system, for various specific embodiments of the service beam enclosure exhaust system, a relatively neutral or negative pressure differential between the interior of the service beam enclosure exhaust system and the surrounding environment may be further maintained. This relatively neutral or negative pressure differential that may be maintained between the interior of the service beam enclosure exhaust system and the surrounding environment may prevent particles from leaking from the service beam enclosure exhaust system through cracks, gaps, and the like. Particles that leak through cracks, gaps, and the like in close proximity to a substrate have a high probability of contaminating the surface of the substrate before being swept away into the circulation and filtration system.

圖27A描繪根據本教示之各種具體實例的低粒產生X軸運動系統2320之側剖視圖。在圖27A中,按與服務束外殼排氣系統2400之關係描繪低粒產生X軸運動系統2320,如圖27A中展示,服務束外殼排氣系統2400可具有服務束外殼2410及與服務束外殼排氣空間第一管道2422流體連通之服務束外殼排氣空間2420。印刷系統2002可包括基底2101,可將基板支撐裝置2250安裝於該基底上。X, Z托架組裝件2300可安裝至橋接部2130。如可在圖27A中呈現之剖視圖中看出,X軸運動系統2320可為線性空氣軸承運動系統,其為固有地低粒產生的。X軸運動系統2320可包括複數個空氣軸承圓盤2330及無刷線性馬達2340。服務束載體2430可安裝至X, Z托架組裝件2300,且可收容於服務束外殼2410中。如圖27A中所描繪,服務束外殼排氣空間2420可與服務束外殼2410流體連通,以及經由管道系統(諸如,服務束外殼排氣空間第一管道2422)而與氣體循環及過濾系統流體連通。在此點上,服務束外殼2410可排出自服務束之各種具體實例產生的粒子。根據本教示之服務束可為可包括(例如但不限於)光纜、電纜、電線及管系及類似者之束,可使用服務束載體2430之各種具體實例來管理該束。本教示之服務束之各種具體實例可操作性地連接至印刷系統以提供操作(例如但不限於)印刷系統所需之各種光學、電、機械及流體連接。對於本教示之氣體封裝之各種具體實例,服務束載體(諸如,服務束載體2430)可由服務束外殼底部側2404支撐。對於本教示之氣體封裝之各種具體實例,服務束載體(諸如,服務束載體2430)可由托盤或架子支撐。FIG. 27A depicts a side cross-sectional view of a low particle generation X-axis motion system 2320 according to various specific examples of the present teachings. In FIG. 27A , the low particle generation X-axis motion system 2320 is depicted in relation to a service bundle enclosure exhaust system 2400, which, as shown in FIG. 27A , can have a service bundle enclosure 2410 and a service bundle enclosure exhaust space 2420 in fluid communication with a service bundle enclosure exhaust space first conduit 2422. The printing system 2002 can include a base 2101 on which a substrate support device 2250 can be mounted. The X, Z bracket assembly 2300 can be mounted to the bridge 2130. As can be seen in the cross-sectional view presented in FIG27A, the X-axis motion system 2320 can be a linear air bearing motion system that is inherently low in particle generation. The X-axis motion system 2320 can include a plurality of air bearing discs 2330 and a brushless linear motor 2340. The service bundle carrier 2430 can be mounted to the X, Z bracket assembly 2300 and can be housed in the service bundle enclosure 2410. As depicted in FIG27A, the service bundle enclosure exhaust space 2420 can be in fluid communication with the service bundle enclosure 2410, and in fluid communication with a gas circulation and filtration system via a duct system (e.g., a service bundle enclosure exhaust space first duct 2422). In this regard, the service bundle housing 2410 can exhaust particles generated by various embodiments of the service bundle. A service bundle according to the present teachings can be a bundle that can include, for example, but not limited to, optical cables, electrical cables, wires, and tubing, and the like, and various embodiments of the service bundle carrier 2430 can be used to manage the bundle. Various embodiments of the service bundle of the present teachings can be operably connected to a printing system to provide various optical, electrical, mechanical, and fluid connections required to operate, for example, but not limited to, the printing system. For various embodiments of the gas package of the present teachings, the service bundle carrier (e.g., service bundle carrier 2430) can be supported by the bottom side 2404 of the service bundle housing. For various specific embodiments of gas packaging of the present teachings, a service bundle carrier (e.g., service bundle carrier 2430) can be supported by a tray or a rack.

圖27B為圖27A之展開圖,其更詳細地描繪印刷系統2002之低粒產生X軸運動系統2320。可將複數個空氣軸承圓盤2330安裝至X, Z軸托架組裝件2300之內表面。在此點上,低粒產生X軸運動系統2320之各種具體實例可提供X, Z軸托架組裝件2300在橋接部2130上之無摩擦行進。在圖27A中,展示最接近橋接部2130之第一側2132的第一圓盤2332及第二圓盤2334。圖27B之第三圓盤2336可最接近橋接部2130之頂表面2133,而第四圓盤2338可最接近橋接部2130之第二側2134。無刷線性馬達可包括可安裝於橋接部2130上之X, Z軸托架組裝件磁體軌道2342及可安裝至X, Z軸托架組裝件2300之線性馬達繞組2344。編碼器讀取頭2346可與線性馬達繞組2344相關聯以用於定位線性馬達2340。在無刷線性馬達2340之各種具體實例中,編碼器讀取頭2346可為光學編碼器。如本文中隨後將更詳細地論述,利用無摩擦空氣軸承圓盤的低粒X軸運動系統2320之各種具體實例可與壓縮機迴路之各種具體實例整合,如針對圖33及圖34展示及描述。最後,如圖27B中所展示,服務束外殼排氣系統2400可包括可收容服務束載體2430之服務束外殼2410。服務束外殼排氣系統2400可圍阻及排出來自服務束外殼2410之粒子,粒子可在服務束中產生,可使用服務束載體(諸如,服務束載體2430)來管理服務束。FIG. 27B is an expanded view of FIG. 27A, which depicts in more detail the low particle generation X-axis motion system 2320 of the printing system 2002. A plurality of air bearing discs 2330 may be mounted to the inner surface of the X, Z axis carriage assembly 2300. In this regard, various specific embodiments of the low particle generation X-axis motion system 2320 may provide frictionless travel of the X, Z axis carriage assembly 2300 on the bridge 2130. In FIG. 27A, a first disc 2332 and a second disc 2334 are shown closest to the first side 2132 of the bridge 2130. The third disk 2336 of FIG. 27B may be closest to the top surface 2133 of the bridge 2130, and the fourth disk 2338 may be closest to the second side 2134 of the bridge 2130. The brushless linear motor may include an X, Z axis bracket assembly magnet track 2342 that may be mounted on the bridge 2130 and a linear motor winding 2344 that may be mounted to the X, Z axis bracket assembly 2300. An encoder reading head 2346 may be associated with the linear motor winding 2344 for positioning the linear motor 2340. In various specific examples of the brushless linear motor 2340, the encoder reading head 2346 may be an optical encoder. As will be discussed in greater detail later herein, various embodiments of the low particle X-axis motion system 2320 utilizing a frictionless air bearing disc may be integrated with various embodiments of the compressor loop, as shown and described with respect to FIGS. 33 and 34. Finally, as shown in FIG. 27B, a service bundle enclosure exhaust system 2400 may include a service bundle enclosure 2410 that may house a service bundle carrier 2430. The service bundle enclosure exhaust system 2400 may contain and exhaust particles from the service bundle enclosure 2410 that may be generated in the service bundle, and a service bundle carrier (e.g., service bundle carrier 2430) may be used to manage the service bundle.

圖28A為印刷系統2003之前部透視圖,該印刷系統被展示為具有安裝於橋接部2130之上的服務束外殼排氣系統2400。印刷系統2003之各種具體實例可具有如先前針對圖10B之印刷系統2000及圖26之印刷系統2002所描述之許多特徵。舉例而言,印刷系統2003可由印刷系統基底2101支撐。與印刷系統基底2101正交且安裝於其上的可為第一升流管2120及第二升流管2122,橋接部2130可安裝於該等升流管上。對於噴墨印刷系統2003之各種具體實例,橋接部2130可支撐至少一X軸托架組裝件2300,其可在X軸方向上相對於基板支撐裝置2250移動穿過服務束載體伸展部2401。根據本教示之印刷系統之各種具體實例,X軸托架2300可具有安裝於其上之Z軸移動板2310。在此點上,托架組裝件2300之各種具體實例可提供印刷頭組裝件2500關於基板支撐裝置2250之精確X, Z定位。在印刷系統2003之各種具體實例中,可將第二X軸托架組裝件安裝於橋接部2130上,該第二X軸托架可具有安裝於其上之一Z軸移動板。對於具有兩個X軸托架組裝件之印刷系統2003之具體實例,印刷頭組裝件可安裝於每一X, Z軸托架上,或各種其他器件(例如,如相機、UV燈及熱源,如針對圖10B之印刷系統2000及圖26之印刷系統2002所描述)可安裝於兩個X, Z軸托架組裝件上。根據印刷系統2003之各種具體實例,用於支撐基板之基板支撐裝置2250可為浮動台(類似於圖10B之印刷系統2000之浮動台2200),或其可為夾盤,如先前針對圖26之印刷系統2002所描述。圖28A之印刷系統2003可具有固有地低粒產生的X軸運動系統,其中可使用空氣軸承線性滑塊組裝件將X, Z托架組裝件2300安裝且定位於橋接部2130上。對於本教示之各種印刷系統,空氣軸承線性滑塊組裝件可環繞整個橋接部2130,從而允許X, Z托架組裝件2300在橋接部2130上之無摩擦移動,以及提供可維持X, Z托架組裝件2300的行程之準確性之三點安裝,以及抵抗偏斜。FIG. 28A is a front perspective view of a printing system 2003 shown with a service bundle enclosure exhaust system 2400 mounted on a bridge 2130. Various specific examples of the printing system 2003 can have many of the features previously described with respect to the printing system 2000 of FIG. 10B and the printing system 2002 of FIG. 26. For example, the printing system 2003 can be supported by a printing system base 2101. Orthogonal to and mounted on the printing system base 2101 can be a first riser 2120 and a second riser 2122, to which the bridge 2130 can be mounted. For various embodiments of the inkjet printing system 2003, the bridge 2130 can support at least one X-axis carriage assembly 2300 that can move in the X-axis direction relative to the substrate support device 2250 through the service bundle carrier extension 2401. According to various embodiments of the printing system of the present teachings, the X-axis carriage 2300 can have a Z-axis translation plate 2310 mounted thereon. In this regard, various embodiments of the carriage assembly 2300 can provide accurate X, Z positioning of the printhead assembly 2500 with respect to the substrate support device 2250. In various specific examples of the printing system 2003, a second X-axis carriage assembly can be mounted on the bridge portion 2130, and the second X-axis carriage can have a Z-axis moving plate mounted thereon. For specific examples of the printing system 2003 having two X-axis carriage assemblies, a print head assembly can be mounted on each X, Z-axis carriage, or various other devices (e.g., such as cameras, UV lamps, and heat sources, as described for the printing system 2000 of FIG. 10B and the printing system 2002 of FIG. 26) can be mounted on the two X, Z-axis carriage assemblies. According to various specific examples of the printing system 2003, the substrate support device 2250 for supporting the substrate may be a floating table (similar to the floating table 2200 of the printing system 2000 of FIG. 10B), or it may be a chuck, as previously described for the printing system 2002 of FIG. 26. The printing system 2003 of FIG. 28A may have an inherently low particle generation X-axis motion system, in which the X, Z carriage assembly 2300 may be mounted and positioned on the bridge 2130 using an air bearing linear slider assembly. For various printing systems of the present teachings, an air bearing linear slider assembly may surround the entire bridge portion 2130, thereby allowing frictionless movement of the X, Z carriage assembly 2300 on the bridge portion 2130, and providing a three-point mount that maintains the accuracy of the travel of the X, Z carriage assembly 2300, and resists deflection.

關於基板相對於印刷頭組裝件之精確移動,圖28A之印刷系統2003之各種具體實例可具有精確XYZ運動系統,除了X, Z托架組裝件2300之外,其亦可包括Y軸運動組裝件2355。基板支撐裝置2250可安裝於Y軸運動組裝件2355上,且可使用(例如但不限於)線性軸承系統(利用機械軸承或空氣軸承)在軌系統2360上移動。對於氣體封裝系統之各種具體實例,空氣軸承運動系統有助於置放於基板支撐裝置2250上之基板在Y軸方向上的無摩擦傳送。Y軸運動系統2355亦可視情況使用雙軌運動,再次,由線性空氣軸承運動系統或線性機械軸承運動系統提供。根據本教示,可使用其他精確XYZ運動系統,諸如(但不限於),3軸線高架系統之各種具體實例。舉例而言,3軸線高架系統之各種具體實例可具有安裝於高架橋接部上的用於精確X, Z軸移動之X, Z托架組裝件,其中可精確地在Y軸方向移動高架。With respect to precise movement of the substrate relative to the printhead assembly, various embodiments of the printing system 2003 of FIG. 28A may have a precise XYZ motion system that may include a Y-axis motion assembly 2355 in addition to the X, Z carriage assembly 2300. The substrate support 2250 may be mounted on the Y-axis motion assembly 2355 and may be moved on a rail system 2360 using, for example but not limited to, a linear bearing system (using mechanical bearings or air bearings). For various embodiments of the gas packaging system, the air bearing motion system facilitates frictionless transport of the substrate placed on the substrate support 2250 in the Y-axis direction. The Y-axis motion system 2355 may also use dual rail motion, again, provided by a linear air bearing motion system or a linear mechanical bearing motion system, as appropriate. Other precision XYZ motion systems may be used in accordance with the present teachings, such as, but not limited to, various embodiments of a 3-axis overhead system. For example, various embodiments of a 3-axis overhead system may have an X, Z carriage assembly mounted on an overhead bridge for precise X, Z axis movement, wherein the overhead may be precisely moved in the Y axis direction.

如圖28A中所描繪,對於印刷系統2003之各種具體實例,可將服務束外殼排氣系統2400安裝於橋接部2130上。服務束外殼排氣系統2400可包括服務束外殼排氣空間2420,其可安裝至服務束外殼2410且與該服務束外殼流體連通。服務束外殼2410可圍阻由可包括捆紮之光纜、電纜、電線及管系之服務束產生的粒子。本教示之服務束之各種具體實例可為包括印刷系統的氣體封裝系統提供用於安置於內部的各種組裝件及系統的光學、電、機械及流體功能中之至少一者。對於印刷系統2003之各種具體實例,服務束外殼排氣系統2400可確保可維持在服務束外殼排氣系統之入口部分與出口部分之間的正壓力差,以用於將服務束外殼2410中所圍阻之粒子排出至服務束外殼排氣空間2420內。服務束外殼排氣空間2420可經由服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424而與氣體循環及過濾系統流體連通。替代地,服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424可配有可撓性排氣軟管,使得由服務束外殼圍阻之粒子可經由服務束外殼排氣空間排出且經由可撓性排氣軟管引導至目標死空間內。As depicted in FIG. 28A , for various embodiments of the printing system 2003, a service bundle enclosure exhaust system 2400 may be mounted on the bridge 2130. The service bundle enclosure exhaust system 2400 may include a service bundle enclosure exhaust space 2420 that may be mounted to and in fluid communication with a service bundle enclosure 2410. The service bundle enclosure 2410 may contain particles generated by a service bundle that may include bundled optical cables, electrical cables, wires, and tubing. Various embodiments of the service bundle of the present teachings may provide at least one of optical, electrical, mechanical, and fluidic functions for various components and systems disposed therein for a gas packaging system including a printing system. For various specific examples of the printing system 2003, the service bundle enclosure exhaust system 2400 can ensure that a positive pressure difference can be maintained between the inlet and outlet parts of the service bundle enclosure exhaust system, so as to discharge the particles trapped in the service bundle enclosure 2410 into the service bundle enclosure exhaust space 2420. The service bundle enclosure exhaust space 2420 can be fluidly connected to the gas circulation and filtering system through the service bundle enclosure exhaust space first pipe 2422 and the service bundle enclosure exhaust space second pipe 2424. Alternatively, the service bundle enclosure exhaust space first pipe 2422 and the service bundle enclosure exhaust space second pipe 2424 may be equipped with flexible exhaust hoses so that particles enclosed by the service bundle enclosure may be discharged through the service bundle enclosure exhaust space and guided into the target dead space through the flexible exhaust hoses.

對於服務束外殼排氣系統之各種具體實例,除了維持在服務束外殼排氣系統之入口部分與出口部分之間的正壓力差之外,亦可進一步維持服務束外殼排氣系統之內部與周圍環境之間的相對中性或負壓力差。可在服務束外殼排氣系統之內部與周圍環境之間維持的此相對中性或負壓力差可防止粒子經由裂縫、縫隙及類似者自服務束外殼排氣系統洩漏。在十分接近基板處經由裂縫、縫隙及類似者洩漏之粒子在被掃走至循環及過濾系統內之前具有污染基板表面之大機率。For various specific examples of the service beam enclosure exhaust system, in addition to maintaining a positive pressure differential between an inlet portion and an outlet portion of the service beam enclosure exhaust system, a relatively neutral or negative pressure differential between the interior of the service beam enclosure exhaust system and the surrounding environment may be further maintained. This relatively neutral or negative pressure differential that may be maintained between the interior of the service beam enclosure exhaust system and the surrounding environment may prevent particles from leaking from the service beam enclosure exhaust system through cracks, gaps, and the like. Particles that leak through cracks, gaps, and the like in close proximity to the substrate have a high probability of contaminating the substrate surface before being swept away into the circulation and filtration system.

圖28B描繪印刷系統2003之展開部分剖示前部透視圖。在圖28B中,X, Z托架組裝件2300可利用一空氣軸承線性滑塊組裝件以用於將X, Z托架組裝件2300定位於橋接部2130上。X, Z托架組裝件2300之移動在由服務束載體伸展部2401界定之距離上在X軸方向上移動。服務束載體伸展部2401為一開口,其允許捆紮至一服務束內的光纜、電纜、電線及管系及類似者之移動,該服務束收容於服務束外殼2410中且可連接(例如但不限於)至印刷頭組裝件2500。考慮到各種服務束之大小及複雜性,各種運動系統常需要當將服務束與運動系統一起移動時服務束載體能對服務束進行管理。在此點上,服務束載體2430被展示為收容於圖28B之服務束外殼2410中。在印刷期間,當托架組裝件移動以相對於定位於其下方之基板在X軸方向上精確定位印刷頭組裝件時,可包括纜線、電線及管系及類似者的服務束之移動以及服務束載體自身之移動可創造十分接近定位於服務束外殼下方之基板的顆粒物。此外,服務束載體之移動可當其在服務束外殼內移動時按活塞狀方式壓縮空氣容積,從而創造正壓力,正壓力可允許自與服務束載體相關聯之粒子產生組件形成的顆粒物經由(例如)載體伸展部2401逸散。十分接近基板之此顆粒物在被掃走至循環及過濾系統內之前具有污染基板表面之大機率。因此,服務束外殼排氣系統可為氣體封裝系統之粒子控制系統之各種具體實例之組件,其可確保實質上低粒印刷環境。FIG28B depicts an expanded, partially cut-away, front perspective view of the printing system 2003. In FIG28B, the X, Z carriage assembly 2300 may utilize an air bearing linear slider assembly for positioning the X, Z carriage assembly 2300 on the bridge 2130. Movement of the X, Z carriage assembly 2300 is in the X-axis direction over a distance defined by the service bundle carrier extension 2401. The service bundle carrier extension 2401 is an opening that allows movement of optical cables, electrical cables, wires, tubing, and the like bundled into a service bundle that is housed in the service bundle housing 2410 and that may be connected, for example but not limited to, to the printhead assembly 2500. Given the size and complexity of various service bundles, various motion systems often require a service bundle carrier to manage the service bundle as it is moved with the motion system. In this regard, a service bundle carrier 2430 is shown housed in a service bundle housing 2410 of FIG. 28B. During printing, the movement of the service bundle, which may include cables, wires, tubing, and the like, as well as the movement of the service bundle carrier itself, can create particles in close proximity to a substrate positioned beneath the service bundle housing as the carriage assembly moves to accurately position the printhead assembly in the X-axis direction relative to a substrate positioned beneath it. Additionally, the movement of the service beam carrier can compress the air volume in a piston-like manner as it moves within the service beam enclosure, thereby creating a positive pressure that can allow particulate matter formed from particle generation components associated with the service beam carrier to escape through, for example, the carrier extension 2401. Such particulate matter in close proximity to the substrate has a high probability of contaminating the substrate surface before being swept away into the circulation and filtration system. Thus, the service beam enclosure exhaust system can be a component of various embodiments of a particle control system of a gas packaging system that can ensure a substantially low-particle printing environment.

在圖28B中,展示服務束外殼頂表面2402具有一組槽2414,從而形成有槽之頂表面。對於圖28B之服務束外殼排氣系統2400之各種具體實例,存在為了確保自與服務束載體相關聯之粒子產生組件形成的顆粒物被吹掃至循環及過濾系統內的對此系統之兩個要求:1)當服務束載體在服務束外殼中移動時,經由服務束外殼排氣系統之排氣流量應大於在服務束載體之氣體壓縮側上的容積改變;及2)應存在恆定排氣流之均勻分佈以有效地吹掃服務束外殼容積。本教示之服務束外殼排氣系統之各種具體實例確保符合此等兩個要求。In Figure 28B, the service bundle enclosure top surface 2402 is shown with a set of grooves 2414, thereby forming a grooved top surface. For various specific examples of the service bundle enclosure exhaust system 2400 of Figure 28B, there are two requirements for this system in order to ensure that particulate matter generated from the particle generation components associated with the service bundle carrier is blown into the circulation and filtration system: 1) the exhaust flow through the service bundle enclosure exhaust system should be greater than the volume change on the gas compression side of the service bundle carrier as the service bundle carrier moves in the service bundle enclosure; and 2) there should be a uniform distribution of constant exhaust flow to effectively blow the service bundle enclosure volume. Various specific embodiments of the service bundle enclosure exhaust system of the present teachings ensure that these two requirements are met.

舉例而言,如圖29A中所描繪,服務束外殼排氣系統之各種具體實例可包括服務束外殼2410,其可用以收容服務束載體2430。在圖29A中,將服務束載體2430描繪為分段可撓性鏈類型之服務束載體,可使用的各種其他類型之服務束載體可具有類似表現,藉此需要使用本教示之服務束外殼排氣系統之各種具體實例。服務束載體伸展部2401為一開口,其可允許自與服務束載體相關聯之粒子產生組件形成的顆粒物作為由服務束載體之移動創造之正壓力的結果而逸散出服務束外殼。可將服務束外殼排氣空間2420維持在正壓力下,正壓力可確保與服務束載體相關聯之粒子產生組件可經由服務束外殼排氣空間第一管道2422及服務束外殼排氣空間第二管道2424排氣且至循環及過濾系統內。在服務束外殼頂表面2402中形成之一組服務束外殼槽2412(如圖29A中所展示)可確保恆定排氣流之均勻分佈以有效地吹掃服務束外殼2410之容積。For example, as depicted in FIG29A, various embodiments of a service bundle enclosure exhaust system may include a service bundle enclosure 2410 that may be used to house a service bundle carrier 2430. In FIG29A, the service bundle carrier 2430 is depicted as a segmented flexible chain type service bundle carrier, and various other types of service bundle carriers that may be used may have similar performances, thereby requiring the use of various embodiments of the service bundle enclosure exhaust system of the present teachings. The service bundle carrier extension 2401 is an opening that may allow particulate matter formed from a particle generation component associated with the service bundle carrier to escape from the service bundle enclosure as a result of the positive pressure created by the movement of the service bundle carrier. The service bundle enclosure exhaust space 2420 can be maintained at a positive pressure, which ensures that the particle generation components associated with the service bundle carrier can be exhausted through the service bundle enclosure exhaust space first duct 2422 and the service bundle enclosure exhaust space second duct 2424 and into the circulation and filtration system. A set of service bundle enclosure slots 2412 formed in the service bundle enclosure top surface 2402 (as shown in FIG. 29A ) can ensure uniform distribution of a constant exhaust flow to effectively sweep the volume of the service bundle enclosure 2410.

雖然服務束外殼槽2412在圖29A中被展示為跨服務束外殼頂側2402形成,但可瞭解,一組槽可位於服務束外殼之各種表面上,如在圖29B中所描繪。如圖29B中所描繪,一組槽可位於服務束外殼底部側2404(組I)、服務束外殼第一側2406(組II)以及服務束外殼第二側2408(組III)上。此外,如圖29C中所描繪,雖然槽可為用於促進恆定排氣流之均勻分佈以有效地吹掃服務束外殼容積的一類型之開口,但可使用具有各種形狀、縱橫比及位置之開口。如圖29C中所展示,可使用諸如描繪為形成於服務束外殼頂側2402中之第一服務束外殼開口2411及第二服務束外殼開口2413的實質上圓形開口來促進恆定排氣流之均勻分佈以有效地吹掃服務束外殼容積。如圖29C中所描繪,實質上圓形開口之一替代置放可為在服務束外殼之端部上。在圖29C中,描繪為分別形成於服務束外殼第一端2415及服務束外殼第二端2417中之第一服務束外殼開口2411及第二服務束外殼開口2413可用以促進恆定排氣流之均勻分佈以有效地吹掃服務束外殼容積。另外,服務束外殼之各種具體實例可具有第一服務束載體伸展部2401及第二服務束載體伸展部2407。服務束外殼頂表面2402可具有分別最接近第一服務束載體伸展部2401及第二服務束載體伸展部2407之第一組槽2412及第二組槽2414,可用以促進恆定排氣流之均勻分佈以有效地吹掃服務束外殼容積。最後,如圖27B中所展示,當服務束外殼排氣系統包括為單一件之外殼時,可藉由考慮有效排氣氣體流量來促進恆定排氣流之均勻分佈。Although the service bundle enclosure slots 2412 are shown in FIG. 29A as being formed across the service bundle enclosure top side 2402, it is understood that a set of slots may be located on various surfaces of the service bundle enclosure, as depicted in FIG. 29B. As depicted in FIG. 29B, a set of slots may be located on the service bundle enclosure bottom side 2404 (Group I), the service bundle enclosure first side 2406 (Group II), and the service bundle enclosure second side 2408 (Group III). Further, as depicted in FIG. 29C, although the slots may be a type of opening used to promote uniform distribution of a constant exhaust flow to effectively sweep the service bundle enclosure volume, openings having a variety of shapes, aspect ratios, and locations may be used. As shown in Figure 29C, substantially circular openings such as the first service bundle enclosure opening 2411 and the second service bundle enclosure opening 2413 depicted as formed in the service bundle enclosure top side 2402 may be used to promote uniform distribution of the constant exhaust flow to effectively sweep the service bundle enclosure volume. As depicted in Figure 29C, an alternative placement of the substantially circular openings may be on the ends of the service bundle enclosure. In FIG29C, the first service bundle housing opening 2411 and the second service bundle housing opening 2413, which are respectively formed in the first end 2415 and the second end 2417 of the service bundle housing, can be used to promote the uniform distribution of the constant exhaust flow to effectively sweep the service bundle housing volume. In addition, various specific examples of the service bundle housing can have a first service bundle carrier extension 2401 and a second service bundle carrier extension 2407. The service bundle housing top surface 2402 may have a first set of grooves 2412 and a second set of grooves 2414, respectively, proximate the first service bundle carrier extension 2401 and the second service bundle carrier extension 2407, which may be used to promote uniform distribution of a constant exhaust flow to effectively sweep the service bundle housing volume. Finally, as shown in FIG. 27B , when the service bundle housing exhaust system is included as a single housing, uniform distribution of a constant exhaust flow may be promoted by considering the effective exhaust gas flow rate.

如在圖30A/30B至圖32A/32B中所描繪的本教示之氣體封裝系統之各種具體實例可具有如本文中先前關於圖22、圖23及圖24所論述的關於可促進層流及封裝中的氣體氣氛之澈底更新藉此確保可維持用於空中顆粒物之實質上低粒環境的氣體循環及過濾系統之特徵。如本文中先前所論述,用於維持低空中顆粒規範之循環及過濾系統為用於本教示之氣體封裝系統之各種具體實例的顆粒控制系統之一部分。本教示之粒子控制系統亦可包括利用空氣軸承以及利用服務束外殼排氣系統之一低粒產生X軸運動系統。利用空氣軸承的低粒產生X軸運動系統之各種具體實例可實質上消除顆粒物之產生。另外,可利用服務束外殼排氣系統之各種具體實例以確保可圍阻在印刷製程期間在十分接近基板處產生之顆粒物,且接著將顆粒物吹掃至循環及過濾系統內用於移除。另外,如在圖30A/30B至圖32A/32B中所描繪,為了控制在印刷製程期間由可最接近基板定位的各種器件、裝置、服務束及類似者形成之顆粒物,本教示之粒子控制系統之各種具體實例可具有印刷頭組裝件排氣系統。Various specific examples of the gas encapsulation system of the present teaching as described in Figures 30A/30B to 32A/32B may have the features of a gas circulation and filtration system that promotes laminar flow and a thorough renewal of the gas atmosphere in the encapsulation to ensure that a substantially low-particle environment for airborne particulate matter can be maintained as previously discussed herein with respect to Figures 22, 23, and 24. As previously discussed herein, a circulation and filtration system for maintaining low-air particle specifications is a part of a particle control system for various specific examples of the gas encapsulation system of the present teaching. The particle control system of the present teaching may also include a low-particle generation X-axis motion system utilizing air bearings and utilizing a service beam outer shell exhaust system. Various embodiments of low particle generation X-axis motion systems utilizing air bearings can substantially eliminate particle generation. Additionally, various embodiments of a service bundle enclosure exhaust system can be utilized to ensure that particles generated in close proximity to the substrate during the printing process can be contained and then swept into a circulation and filtration system for removal. Additionally, various embodiments of the particle control system of the present teachings can have a print head assembly exhaust system in order to control particles generated by various devices, apparatus, service bundles, and the like that can be positioned proximate to the substrate during the printing process, as depicted in FIGS. 30A/30B to 32A/32B.

圖30A/30B描繪氣體封裝系統509,而圖31A/31B描繪氣體封裝系統510,且圖32A/32B描繪氣體封裝系統511,其皆可具有如先前針對如展示的圖22及圖23描述之特徵。氣體封裝系統509至511可具有循環及過濾系統1500、氣體淨化系統3130及熱調節系統3140。循環及過濾系統1500可包括管道系統組裝件1501及風扇過濾器單元組裝件1502。管道系統組裝件1501可藉由有效界定實際上為與氣體淨化系統3130流體連通之管路的空間1580而分開在內部經由風扇過濾器單元組裝件1502再循環之惰性氣體及在外部再循環至氣體淨化系統3130之惰性氣體。空間1580可經由氣體淨化出口線路3131及氣體淨化入口線路3133而與氣體淨化系統3130(圖12及圖13)流體連通。包括如針對圖16至圖18描述之管道系統之各種具體實例的此循環系統提供實質上層流,使亂流最小化,促進氣體封裝之內部中的氣體氣氛之顆粒物之循環、更新及過濾,且提供經由在氣體封裝組裝件外部之氣體淨化系統的循環。30A/30B depicts a gas encapsulation system 509, while FIG. 31A/31B depicts a gas encapsulation system 510, and FIG. 32A/32B depicts a gas encapsulation system 511, all of which may have features as previously described with respect to FIG. 22 and FIG. 23 as shown. The gas encapsulation systems 509-511 may have a circulation and filtration system 1500, a gas purification system 3130, and a thermal conditioning system 3140. The circulation and filtration system 1500 may include a ductwork assembly 1501 and a fan filter unit assembly 1502. The ductwork assembly 1501 can separate the inert gas recirculated internally through the fan filter unit assembly 1502 and the inert gas recirculated externally to the gas purification system 3130 by effectively defining a space 1580 that is actually a pipe in fluid communication with the gas purification system 3130. The space 1580 can be in fluid communication with the gas purification system 3130 (FIGS. 12 and 13) via a gas purification outlet line 3131 and a gas purification inlet line 3133. This circulation system, including various specific embodiments of the piping system as described with respect to Figures 16 to 18, provides substantial overlying flow, minimizes turbulence, promotes circulation, renewal and filtration of particulate matter in the gas atmosphere within the gas package, and provides circulation through a gas purification system external to the gas package assembly.

另外,如分別在圖30A/30B至圖32A/32B中描繪之氣體封裝系統509至511可具有印刷頭組裝件排氣系統2600,其可用以圍阻及排出由與印刷系統2003相關聯之各種組裝件形成的顆粒。對於氣體封裝系統509、510及511之各種具體實例,印刷頭組裝件排氣系統2600可收容(例如但不限於)托架組裝件2300,可將印刷頭組裝件2500貼附至該托架組裝件上,如分別在圖30A/30B、圖31A/31B及圖32A/32B中所描繪。此移動板可利用摩擦軸承,如本文中先前所論述,摩擦軸承可在OLED印刷系統之操作期間產生粒子。另外,如本文中先前所論述,托架組裝件可用以安裝諸如UV燈組裝件或熱源組裝件之裝置,以用於固化囊封層。UV燈或熱源可需要使用風扇來冷卻。Additionally, the gas encapsulation systems 509-511 as depicted in FIGS. 30A/30B to 32A/32B, respectively, may have a printhead assembly exhaust system 2600 that may be used to contain and exhaust particles generated by various components associated with the printing system 2003. For various specific examples of gas encapsulation systems 509, 510, and 511, the printhead assembly exhaust system 2600 may house, for example but not limited to, a carriage assembly 2300 to which the printhead assembly 2500 may be attached, as depicted in FIGS. 30A/30B, 31A/31B, and 32A/32B, respectively. This moving plate may utilize friction bearings, which, as previously discussed herein, may generate particles during operation of the OLED printing system. Additionally, as discussed previously herein, the bracket assembly can be used to mount a device such as a UV light assembly or a heat source assembly for curing the encapsulation layer. The UV light or heat source may require the use of a fan for cooling.

因此,氣體封裝系統509、510及511之印刷頭組裝件排氣系統2600可為用於圍阻及排出在印刷製程期間由可最接近基板定位的各種器件、裝置、服務束及類似者形成之顆粒物的顆粒控制系統之部分。印刷頭組裝件排氣系統之各種具體實例(諸如,氣體封裝系統509、510及511之印刷頭組裝件排氣系統2600)可確保可維持在印刷頭組裝件排出外殼之入口部分與出口部分之間的正壓力差,以用於將由印刷頭組裝件之各種組件產生的粒子排出至氣體循環及過濾系統內。對於印刷頭組裝件排氣系統之各種具體實例,可維持在印刷頭組裝件排出外殼之入口部分與出口部分之間的正壓力差,以用於將由印刷頭組裝件之各種組件產生的粒子排出至死空間內。如本文中隨後將更詳細地論述,用於排出由印刷頭組裝件之各種組件產生的粒子之正壓力差可藉由使用風扇以及(諸如但不限於)提供印刷頭組裝件排氣外殼與循環及過濾系統之間的流體連通的其他系統組件創造。Thus, the printhead assembly exhaust system 2600 of the gas packaging systems 509, 510, and 511 can be part of a particle control system for containing and exhausting particulate matter generated by various devices, equipment, service bundles, and the like that can be positioned proximate to a substrate during a printing process. Various specific examples of the printhead assembly exhaust system (e.g., the printhead assembly exhaust system 2600 of the gas packaging systems 509, 510, and 511) can ensure that a positive pressure differential can be maintained between an inlet portion and an outlet portion of a printhead assembly exhaust housing for exhausting particles generated by various components of the printhead assembly into a gas circulation and filtration system. For various specific examples of printhead assembly exhaust systems, a positive pressure differential between an inlet portion and an outlet portion of a printhead assembly exhaust housing may be maintained for exhausting particles generated by various components of the printhead assembly into the dead space. As will be discussed in more detail later herein, the positive pressure differential for exhausting particles generated by various components of the printhead assembly may be created by using a fan and other system components such as, but not limited to, providing fluid communication between the printhead assembly exhaust housing and a circulation and filtration system.

對於印刷頭組裝件排氣系統之各種具體實例,除了維持在印刷頭排氣組裝件之入口部分與出口部分之間的正壓力差之外,亦可進一步維持印刷頭排氣組裝件之內部與周圍環境之間的相對中性或負壓力差。可在印刷頭排氣組裝件之內部與周圍環境之間維持的此相對中性或負壓力差可防止粒子經由裂縫、縫隙及類似者自印刷頭排氣組裝件洩漏。在十分接近基板處經由裂縫、縫隙及類似者洩漏之粒子在被掃走至循環及過濾系統內之前具有污染基板表面之大機率。For various specific examples of print head assembly exhaust systems, in addition to maintaining a positive pressure differential between the inlet and outlet portions of the print head exhaust assembly, a relatively neutral or negative pressure differential between the interior of the print head exhaust assembly and the surrounding environment may be further maintained. This relatively neutral or negative pressure differential that may be maintained between the interior of the print head exhaust assembly and the surrounding environment may prevent particles from leaking from the print head exhaust assembly through cracks, gaps, and the like. Particles that leak through cracks, gaps, and the like in close proximity to the substrate have a high probability of contaminating the substrate surface before being swept away into the circulation and filtration system.

如圖30A及圖30B中所描繪,服務束外殼2410可支撐於印刷系統2003之橋接部2130上。如本文中先前關於圖10B之印刷系統2000所論述,托架組裝件2300可具有用於控制X-Z軸移動之組件,包括印刷頭組裝件2500可貼附於其上之Z軸移動板。印刷頭組裝件排氣系統外殼2610可與服務束外殼2410(例如但不限於,印刷頭組裝件排氣系統第一管路2612)流體連通。服務束外殼2410可經由(例如但不限於)印刷頭組裝件排氣系統第二管路2614(其可與第二管道系統管路1574流體連通)而與管道系統組裝件1501流體連通。可含有具有產生粒子之危險的組件(諸如,移動板)的圖30A及圖30B之印刷頭組裝件排氣系統2600可具有至少一風扇(諸如,風扇2620),用於促進氣體移動穿過印刷頭組裝件排氣系統2600且至服務束外殼2410內。在此點上,印刷頭組裝件排氣系統2600及服務束外殼2410中所圍阻之全部空氣可有效地由循環及過濾系統1500過濾,如圖30A中所描繪。As depicted in Figures 30A and 30B, the service bundle housing 2410 can be supported on the bridge portion 2130 of the printing system 2003. As previously discussed herein with respect to the printing system 2000 of Figure 10B, the carriage assembly 2300 can have components for controlling X-Z axis movement, including a Z axis movement plate to which the printhead assembly 2500 can be attached. The printhead assembly exhaust system housing 2610 can be in fluid communication with the service bundle housing 2410 (e.g., but not limited to, the printhead assembly exhaust system first conduit 2612). The service bundle enclosure 2410 may be in fluid communication with the ductwork assembly 1501 via, for example but not limited to, a printhead assembly exhaust system second line 2614, which may be in fluid communication with the second ductwork line 1574. The printhead assembly exhaust system 2600 of FIGS. 30A and 30B, which may contain components that are at risk of generating particles (e.g., a moving plate), may have at least one fan (e.g., fan 2620) for facilitating movement of gas through the printhead assembly exhaust system 2600 and into the service bundle enclosure 2410. At this point, all of the air trapped within the printhead assembly exhaust system 2600 and the service bundle enclosure 2410 may be effectively filtered by the circulation and filtration system 1500, as depicted in FIG. 30A.

根據本教示,收集於遠離安裝於基板支撐裝置上之基板的死空間區域中之顆粒物不能在氣體封裝系統內再循環。在此點上,圖31A/31B及圖32A/32B中描繪的氣體封裝系統之各種具體實例可利用將顆粒物引導至管道系統內,以及至死空間內。在定期的氣體封裝系統維護期間,可自死空間移除此顆粒物。According to the present teachings, particulate matter collected in a dead space region remote from a substrate mounted on a substrate support device cannot be recirculated within a gas packaging system. In this regard, various specific embodiments of the gas packaging system depicted in FIG. 31A/31B and FIG. 32A/32B may utilize directing particulate matter into a duct system and into the dead space. During regular gas packaging system maintenance, such particulate matter may be removed from the dead space.

在此點上,對於氣體封裝系統之各種具體實例(諸如,圖31A及圖31B之氣體封裝系統510),服務束外殼2410可與循環及過濾系統1500流體連通。如圖31B中所描繪,印刷頭組裝件排氣系統外殼2610可與服務束外殼2410(例如但不限於,印刷頭組裝件排氣系統第一管路2612)流體連通。服務束外殼2410可與可具有最接近管道系統組裝件1501之第二管道系統入口1572之出口端的印刷頭組裝件排氣系統第二管路2614流體連通。在此點上,印刷頭組裝件排氣系統第二管路2614可經由第二管道系統管路1574而與管道系統組裝件流體連通。印刷頭組裝件排氣系統第一管路2612可具有一風扇(諸如,風扇2620),以用於促進經由印刷頭組裝件排氣系統第一管路2612之氣體移動。另外,印刷頭組裝件排氣系統第二管路2614可具有用於促進經由印刷頭組裝件排氣系統2614之氣體移動的風扇2622,使得由印刷頭組裝件排氣系統2600及服務束外殼2410圍阻之粒子可有效地由循環及過濾系統1500過濾,如圖31A中所描繪。對於氣體封裝系統之各種具體實例(諸如,圖31A及圖31B之氣體封裝系統510),未流入第二管道系統入口1572內之任何顆粒物將具有朝向死空間1590之軌跡。In this regard, for various specific examples of gas packaging systems (e.g., gas packaging system 510 of FIGS. 31A and 31B ), service bundle housing 2410 may be in fluid communication with circulation and filtration system 1500. As depicted in FIG. 31B , printhead assembly exhaust system housing 2610 may be in fluid communication with service bundle housing 2410 (e.g., but not limited to, printhead assembly exhaust system first conduit 2612). Service bundle housing 2410 may be in fluid communication with printhead assembly exhaust system second conduit 2614 which may have an outlet end proximate to second duct system inlet 1572 of duct system assembly 1501. In this regard, the printhead assembly exhaust system second line 2614 may be in fluid communication with the ductwork assembly via the second ductwork line 1574. The printhead assembly exhaust system first line 2612 may have a fan (e.g., fan 2620) for facilitating the movement of gas through the printhead assembly exhaust system first line 2612. Additionally, the printhead assembly exhaust system second line 2614 may have a fan 2622 for facilitating the movement of gas through the printhead assembly exhaust system 2614 so that particles enclosed by the printhead assembly exhaust system 2600 and the service bundle enclosure 2410 may be effectively filtered by the circulation and filtration system 1500, as depicted in FIG. 31A . For various specific embodiments of gas encapsulation systems (e.g., gas encapsulation system 510 of Figures 31A and 31B), any particles that do not flow into the second conduit system inlet 1572 will have a trajectory toward the dead space 1590.

如針對圖32A及圖32B之氣體封裝系統511所描繪,服務束外殼2410可與循環及過濾系統1500流體連通。如在圖32B中所描繪,印刷頭組裝件排氣系統外殼2610可與服務束外殼2410(例如但不限於,印刷頭組裝件排氣系統第一管路2612)流體連通,該印刷頭組裝件排氣系統第一管路可具有一風扇(諸如,風扇2620),以用於促進經由印刷頭組裝件排氣系統第一管路2612之氣體移動。服務束外殼2410可與可具有過濾頭2616之印刷頭組裝件排氣系統第二管路2614流體連通。過濾頭2616可過濾自印刷頭組裝件排氣系統2600發出且至服務束外殼2410內之顆粒物,且將自過濾頭2616流動之低粒氣流直接引導至氣體封裝系統511內。在此點上,印刷頭組裝件排氣系統第二管路2614可將低粒氣體排出至氣體封裝系統511內,接著可使低粒氣體循環經過氣體封裝系統511之循環及過濾系統1500,如圖32A中所描繪。As depicted for the gas encapsulation system 511 of Figures 32A and 32B, the service bundle housing 2410 can be in fluid communication with the circulation and filtration system 1500. As depicted in Figure 32B, the printhead assembly exhaust system housing 2610 can be in fluid communication with the service bundle housing 2410 (for example, but not limited to, the printhead assembly exhaust system first line 2612), which can have a fan (e.g., fan 2620) for facilitating the movement of gas through the printhead assembly exhaust system first line 2612. The service bundle housing 2410 can be in fluid communication with the printhead assembly exhaust system second line 2614, which can have a filter head 2616. The filter head 2616 can filter particulate matter emitted from the print head assembly exhaust system 2600 and into the service bundle housing 2410, and direct the low-particle gas flow flowing from the filter head 2616 directly into the gas packaging system 511. At this point, the print head assembly exhaust system second line 2614 can exhaust the low-particle gas into the gas packaging system 511, and then the low-particle gas can be circulated through the circulation and filtering system 1500 of the gas packaging system 511, as depicted in Figure 32A.

本教示之各種氣體封裝系統(諸如,圖12之氣體封裝系統501及圖13之氣體封裝系統502)可利用各種氣體封裝,例如(但不限於),圖1A之氣體封裝100及圖9之氣體封裝1000。另外,各種氣體封裝(諸如,圖1A之氣體封裝100及圖9之氣體封裝1000)可收容各種印刷系統,諸如,圖10B之印刷系統2000、圖26之印刷系統2002及圖28A之印刷系統2003。對於本教示之氣體封裝系統及方法,監視氣體封裝之受控制環境為維持氣體封裝之受控制環境的重要態樣。The various gas packaging systems (e.g., gas packaging system 501 of FIG. 12 and gas packaging system 502 of FIG. 13 ) of the present teachings may utilize various gas packages, such as (but not limited to), gas package 100 of FIG. 1A and gas package 1000 of FIG. 9 . In addition, the various gas packages (e.g., gas package 100 of FIG. 1A and gas package 1000 of FIG. 9 ) may house various printing systems, such as, printing system 2000 of FIG. 10B , printing system 2002 of FIG. 26 , and printing system 2003 of FIG. 28A . For the gas packaging systems and methods of the present teachings, monitoring the controlled environment of the gas package is an important aspect of maintaining the controlled environment of the gas package.

可監視的受控制環境之一參數為顆粒物之控制之有效性。可針對空中及基板上粒子監視兩者執行系統驗證以及持續進行之原地系統監視。One parameter of the controlled environment that can be monitored is the effectiveness of particulate control. System validation can be performed for both airborne and on-substrate particle monitoring as well as ongoing in-situ system monitoring.

可使用(例如)攜帶型粒子計數器件在印刷製程前針對氣體封裝系統之各種具體實例執行空中顆粒物之判定,以用於系統驗證。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行空中顆粒物之判定,作為持續進行之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行空中顆粒物之判定,以用於系統驗證。Airborne particle determination can be performed for various embodiments of gas packaging systems prior to the printing process using, for example, a portable particle counting device for system validation. In various embodiments of gas packaging systems, airborne particle determination can be performed in situ while the substrate is being printed as an ongoing quality check. For various embodiments of gas packaging systems, airborne particle determination can be performed prior to printing the substrate and additionally in situ while the substrate is being printed for system validation.

圖33描繪用於量測空中顆粒物之器件。根據本教示,圖33之粒子計數器800之各種具體實例可為手持型或以其他方式為攜帶型的。如圖33中所描繪,粒子計數器800可具有電源按鈕810,以及顯示器812以用於對各種參數(諸如,正監視之粒徑,以及彼大小之顆粒物之當前計數)之即時視覺監視。本教示之攜帶型粒子計數器可具有用於在分析期間監視若干粒徑範圍之多個通道。藉由非限制性實例,描繪了監視三個截然不同粒徑範圍的粒子計數器800之顯示器812。對於本教示之系統及方法之各種具體實例,監視在約≥ 0.3 μm之大小範圍中的粒子可適用於監視系統品質,因為在彼大小範圍中的粒子之突增可為(例如)氣體封裝系統之過濾系統發生故障之早期指示。根據本教示之粒子計數器之各種具體實例可具有自粒子計數器至(藉由非限制性實例)電腦(其可提供來自粒子計數器的資料之持續進行之收集及儲存)之纜線或無線連接(圖中未示)。粒子計數器800可具有入口噴嘴814,以用於將空氣樣本吸入至粒子計數器800內。用於量測空中顆粒物的粒子計數器之各種具體實例可具有一等動力取樣探針(諸如,圖33之取樣探針816),其可減少與樣本流動速度及粒子(尤其小粒子)之空氣動力學有關的計數誤差。為了獲得關於氣流中之顆粒物的準確結果,樣本經由取樣系統的流動應使得在取樣點入口處之速度與在彼點處的氣流之速度相同。等動力取樣探針可具有入口探針815,其可使用取樣探針連接器817附接至入口噴嘴814。對於取樣探針816之各種具體實例,取樣探針連接器817可為可撓性管系之一區段。為了在本教示之氣體封裝系統之各種具體實例中取樣,取樣探針816之入口探針815可直接面向空氣流。FIG. 33 depicts a device for measuring airborne particulate matter. Various specific embodiments of the particle counter 800 of FIG. 33 may be handheld or otherwise portable in accordance with the present teachings. As depicted in FIG. 33 , the particle counter 800 may have a power button 810, and a display 812 for real-time visual monitoring of various parameters, such as the particle size being monitored, and the current count of particles of that size. The portable particle counter of the present teachings may have multiple channels for monitoring several particle size ranges during analysis. By way of non-limiting example, a display 812 of a particle counter 800 monitoring three distinct particle size ranges is depicted. For various embodiments of the systems and methods of the present teachings, monitoring particles in a size range of approximately ≥ 0.3 μm can be useful for monitoring system quality, as a sudden increase in particles in that size range can be an early indication of a malfunction in the filtration system of, for example, a gas containment system. Various embodiments of a particle counter according to the present teachings can have a cable or wireless connection (not shown) from the particle counter to (by way of non-limiting example) a computer (which can provide ongoing collection and storage of data from the particle counter). The particle counter 800 can have an inlet nozzle 814 for drawing an air sample into the particle counter 800. Various embodiments of a particle counter for measuring airborne particulate matter may have an isokinetic sampling probe (e.g., sampling probe 816 of FIG. 33 ) that reduces counting errors associated with sample flow velocity and the aerodynamics of particles, particularly small particles. In order to obtain accurate results regarding particulate matter in an airflow, the flow of the sample through the sampling system should be such that the velocity at the inlet of the sampling point is the same as the velocity of the airflow at that point. The isokinetic sampling probe may have an inlet probe 815 that may be attached to an inlet nozzle 814 using a sampling probe connector 817. For various embodiments of sampling probe 816, sampling probe connector 817 may be a section of a flexible tubing system. For sampling in various specific embodiments of the gas containment system of the present teachings, the inlet probe 815 of the sampling probe 816 can be directly facing the air flow.

雖然各種商業粒子計數器可基於可包括光阻擋、直接成像及光散射之各種量測原理,但基於自粒子之光散射之量測十分適合於產生包括粒徑的感興趣之資訊。原則上,可使用光散射判定低至約1 nm之粒徑。Although various commercial particle counters can be based on a variety of measurement principles that may include light obstruction, direct imaging, and light scattering, measurements based on light scattering from particles are well suited to yield information of interest including particle size. In principle, particle sizes down to about 1 nm can be determined using light scattering.

圖34為基於光散射的粒子計數器偵測器830之示意性描繪。基於光散射的粒子計數器偵測器可具有已知波長之已知波長範圍之電磁輻射源,諸如,光源820。對於粒子計數器偵測器830之各種具體實例,光源820可為發射已知波長之光的雷射源。對於粒子計數器之各種具體實例,尤其(但不排他性地)對於手持型及攜帶型粒子計數器件,光源820可為發射在約600 nm至約850 nm之間的已知波長之光的發光二極體(LED)。發射之源光821可聚焦在流動路徑824之偵測區域822處(其在圖34中描繪為頂部剖視圖)。在偵測區域822中之任何粒子可散射光,從而創造向前散射之光823或在許多有角度之方向(包括與發射之源光821之方向正交)上散射之光,如針對光路徑825所描繪。由在偵測區域822中之粒子正交地散射之光可使用聚焦透鏡826來聚焦,且可在由偵測器828偵測前使用至少一光學濾光片(例如,空間或光學帶通濾光片或其組合)來濾光,偵測器可為各種類型之光度計偵測器,例如,基於光電二極體技術。可使用校準標準來校準粒子計數器之各種具體實例,該校準標準諸如在各種大小範圍中的粒子具有經定義之分佈的顆粒物氣溶膠,其中每一大小範圍具有定義之濃度。FIG34 is a schematic depiction of a light scattering based particle counter detector 830. The light scattering based particle counter detector may have a source of electromagnetic radiation of a known wavelength and a known wavelength range, such as a light source 820. For various specific embodiments of the particle counter detector 830, the light source 820 may be a laser source that emits light of a known wavelength. For various specific embodiments of the particle counter, particularly (but not exclusively) for handheld and portable particle counting devices, the light source 820 may be a light emitting diode (LED) that emits light of a known wavelength between about 600 nm and about 850 nm. The emitted source light 821 may be focused at a detection region 822 of a flow path 824 (which is depicted as a top cross-sectional view in FIG34). Any particle in the detection region 822 may scatter light, creating forward scattered light 823 or light scattered in many angular directions, including orthogonal to the direction of emitted source light 821, as depicted for light path 825. Light scattered orthogonally by particles in the detection region 822 may be focused using a focusing lens 826, and may be filtered using at least one optical filter (e.g., a spatial or optical bandpass filter or a combination thereof) before being detected by a detector 828, which may be various types of photometric detectors, for example based on photodiode technology. Various specific examples of particle counters can be calibrated using calibration standards, such as particulate aerosols having a defined distribution of particles in various size ranges, with each size range having a defined concentration.

舉例而言,基於光散射的各種商業粒子計數器可偵測在約≥ 0.3 μm至約≥ 10 μm之範圍中的空中粒子大小,且報告每體積空氣(通常為立方英尺或立方公尺)中指定大小的粒子之數目。各種商業粒子計數器可計數高達約1百萬個至約3百萬個之間的指定大小的粒子。在此點上,各種商業校準標準可具有涵蓋約≥ 0.3 μm至約≥ 10 μm的粒子分佈,例如,涵蓋彼範圍的物質之雙峰或三峰分佈,其中每一群粒子具有可高達約1百萬個至約3百萬個粒子之偵測極限的經定義濃度。如本文中先前所論述,用於判定空中顆粒物之各種粒子計數器可具有用於監視許多粒徑範圍之多個通道。雖然被展示為具有一光源及一偵測器,但用於判定空中顆粒物的粒子計數器之各種具體實例可具有一個以上光源及用於監視按各種角度散射之光的在各種位置處之多個偵測器。此空中粒子計數器可在空中顆粒物的約≥ 0.1 μm至約≥ 10.0 μm之大動態粒徑範圍上進行監視及報告。For example, various commercial particle counters based on light scattering can detect airborne particle sizes in the range of about ≥ 0.3 μm to about ≥ 10 μm and report the number of particles of a specified size per volume of air (usually cubic feet or cubic meters). Various commercial particle counters can count up to about 1 million to about 3 million particles of a specified size. In this regard, various commercial calibration standards can have a particle distribution covering about ≥ 0.3 μm to about ≥ 10 μm, for example, a bimodal or trimodal distribution of materials covering that range, wherein each population of particles has a defined concentration that can be up to a detection limit of about 1 million to about 3 million particles. As discussed previously herein, various particle counters for determining airborne particulate matter may have multiple channels for monitoring a wide range of particle sizes. Although shown as having one light source and one detector, various specific embodiments of a particle counter for determining airborne particulate matter may have more than one light source and multiple detectors at various locations for monitoring light scattered at various angles. Such an airborne particle counter may monitor and report over a large dynamic particle size range of about ≥ 0.1 μm to about ≥ 10.0 μm for airborne particulate matter.

圖35為使用粒子計數器圖示800A至800D之示意性表示,且意在傳達粒子計數器件之各種具體實例可相對於最接近基板的印刷系統之低粒地帶位於何位置。圖35之氣體封裝系統512可具有如本文中先前針對氣體封裝系統500-511所描述之組件,包括(但不限於)氣體封裝組裝件1100、可與循環及過濾系統(如由最接近熱交換器1562之風扇過濾器單元1552指示)整合之熱調節系統3140。圖35之氣體封裝系統512可具有出口線路3131及至氣體淨化系統(圖中未示)之入口線路3133,以及外殼印刷系統2004。印刷系統2004可具有基底2101,可將基板支撐裝置2200安裝於該基底上。印刷系統2004可另外具有橋接部2130,其可具有安裝於其上之第一托架組裝件2300A及第二托架組裝件2300B。印刷系統2004亦可具有用於收容服務纜線(圖中未示)之服務纜線外殼2410。FIG. 35 is a schematic representation of using particle counter diagrams 800A to 800D and is intended to convey where various specific examples of particle counting devices may be located relative to the low particle zone of the printing system closest to the substrate. The gas packaging system 512 of FIG. 35 may have components as previously described herein for gas packaging systems 500-511, including (but not limited to) gas packaging assembly 1100, thermal regulation system 3140 that may be integrated with a circulation and filtering system (as indicated by fan filter unit 1552 closest to heat exchanger 1562). The gas packaging system 512 of FIG. 35 may have an outlet line 3131 and an inlet line 3133 to a gas purification system (not shown), and an enclosure printing system 2004. The printing system 2004 may have a base 2101 on which the substrate support device 2200 may be mounted. The printing system 2004 may further have a bridge portion 2130, which may have a first bracket assembly 2300A and a second bracket assembly 2300B mounted thereon. The printing system 2004 may also have a service cable housing 2410 for housing a service cable (not shown).

關於圖35,至少一粒子計數器可定位或安裝於(例如)服務束外殼2410上,如由在風扇過濾器單元1552之層流氣流中描繪的粒子計數器圖示800A指示。如此定位於來自風扇過濾器單元的層流氣流中之粒子計數器可允許監視氣體封裝系統之過濾系統的有效性。另外,印刷系統2004之橋接部2130可支撐印刷頭組裝件2500可安裝至之第一X, Z軸托架組裝件2300A。第二X, Z軸托架組裝件2300B可具有安裝於其上之至少一粒子計數器,如由粒子計數器圖示800B指示。在最接近諸如托架組裝件之各種印刷器件及裝置的位置處之監視可適用於監視粒子產生之各種來源,諸如,服務束。如由粒子計數器圖示800C所描繪的所安裝之粒子計數器可適用於程序開發及氣體封裝系統驗證運作。如由粒子計數器圖示800D描繪的所安裝之粒子計數器可適用於程序開發,及氣體封裝系統驗證運作以及在印刷製程期間對空中顆粒物之原地監視。35, at least one particle counter may be positioned or mounted, for example, on the service bundle housing 2410, as indicated by the particle counter diagram 800A depicted in the laminar airflow of the fan filter unit 1552. A particle counter so positioned in the laminar airflow from the fan filter unit may allow monitoring of the effectiveness of the filtration system of the gas enclosure system. Additionally, the bridge 2130 of the printing system 2004 may support a first X, Z axis carriage assembly 2300A to which the print head assembly 2500 may be mounted. The second X, Z axis carriage assembly 2300B may have at least one particle counter mounted thereon, as indicated by the particle counter diagram 800B. Monitoring at locations proximate to various printing devices and apparatus such as carriage assemblies may be useful for monitoring various sources of particle generation, such as service bundles. An installed particle counter as depicted by particle counter diagram 800C may be useful for process development and gas packaging system validation operations. An installed particle counter as depicted by particle counter diagram 800D may be useful for process development, and gas packaging system validation operations and in situ monitoring of airborne particulates during the printing process.

根據本教示之各種系統及方法,可將粒子計數器件安裝或置放於基板支撐裝置上以量測在於印刷期間基板可位於之緊鄰區域中的在定義之條件下之粒子。舉例而言,如圖35中所描繪,可將粒子計數器置放或安裝於基板支撐裝置2200之上,如由粒子計數器圖示800C之位置指示。在本教示之系統及方法之各種具體實例中,可針對各種類型之程序開發或氣體封裝系統驗證運作研究進行使用置放或安裝於基板支撐裝置之上的粒子計數器的顆粒物監視。藉由另一非限制性實例,可將粒子計數器安裝於基板支撐裝置2200之一側上,如由粒子計數器圖示800D之位置指示。藉由使用具有取樣探針(具有可撓性連接器)之粒子計數器(諸如,具有取樣探針816的圖33之粒子計數器800),安裝至基板支撐裝置之側的粒子計數器可具有剛好置放於基板之高度處的取樣探針。According to various systems and methods of the present teachings, a particle counting device may be mounted or placed on a substrate support to measure particles under defined conditions in an immediate area where a substrate may be located during printing. For example, as depicted in FIG. 35 , a particle counter may be placed or mounted on a substrate support 2200 as indicated by the location of particle counter icon 800C. In various specific embodiments of the systems and methods of the present teachings, particle monitoring using a particle counter placed or mounted on a substrate support may be performed for various types of process development or gas packaging system validation operation studies. By way of another non-limiting example, the particle counter may be mounted on a side of the substrate support device 2200, as indicated by the location of the particle counter diagram 800D. By using a particle counter with a sampling probe having a flexible connector (e.g., particle counter 800 of FIG. 33 with sampling probe 816), a particle counter mounted to the side of the substrate support device may have the sampling probe placed exactly at the height of the substrate.

安裝於基板支撐裝置之一側上的粒子計數器(如由粒子計數器圖示800D指示)可適用於程序開發,及氣體封裝系統驗證運作以及在印刷製程期間對空中顆粒物之原地監視。舉例而言,在圖36中,如先前針對圖26及圖28A描述之印刷系統2003可具有安裝於橋接部2130上之X軸托架組裝件2300,其亦可包括用於印刷頭組裝件2500之Z軸定位的Z軸移動板2310。在此點上,托架組裝件2300之各種具體實例可提供印刷頭組裝件2500相對於基板2050之精確X, Z定位。對於印刷系統2003之各種具體實例,X軸托架組裝件2300可利用為固有地低粒產生之一線性空氣軸承運動系統。圖36之印刷系統2003可具有用於圍阻及排出自服務束產生之粒子的服務束外殼排氣系統2400,其可包括用於收容服務束之服務束外殼2410。根據本教示,服務束可操作性地連接至印刷系統以提供操作氣體封裝系統中之各種器件及裝置(例如但不限於,與印刷系統相關聯之各種器件及裝置)所需的各種光學、電、機械及流體連接。圖36之印刷系統2003可具有用於支撐基板2050之基板支撐裝置2250,可使用Y軸定位系統2355在Y軸方向上精確地定位該基板。基板支撐裝置2250及Y軸定位系統2355皆由印刷系統基底2101支撐。A particle counter mounted on one side of the substrate support device (as indicated by particle counter diagram 800D) can be used for process development, and gas packaging system verification operation and in-situ monitoring of airborne particles during the printing process. For example, in FIG. 36, the printing system 2003 as previously described with respect to FIG. 26 and FIG. 28A can have an X-axis carriage assembly 2300 mounted on a bridge 2130, which can also include a Z-axis translation plate 2310 for Z-axis positioning of a print head assembly 2500. In this regard, various specific embodiments of the carriage assembly 2300 can provide accurate X, Z positioning of the print head assembly 2500 relative to the substrate 2050. For various specific examples of the printing system 2003, the X-axis carriage assembly 2300 may utilize a linear air bearing motion system that is inherently low in particle generation. The printing system 2003 of FIG. 36 may have a service bundle enclosure exhaust system 2400 for containing and exhausting particles generated from the service bundle, which may include a service bundle enclosure 2410 for housing the service bundle. According to the present teachings, the service bundle may be operably connected to the printing system to provide various optical, electrical, mechanical, and fluid connections required to operate various devices and apparatuses in the gas enclosure system (such as, but not limited to, various devices and apparatuses associated with the printing system). The printing system 2003 of Figure 36 may have a substrate support device 2250 for supporting a substrate 2050, and the substrate may be accurately positioned in the Y-axis direction using a Y-axis positioning system 2355. Both the substrate support device 2250 and the Y-axis positioning system 2355 are supported by the printing system base 2101.

對於圖36之印刷系統2003,精確XYZ運動系統可具有用於將安裝於基板支撐裝置2250上之基板相對於印刷頭組裝件2500定位的各種組件,其可包括Y軸運動組裝件2355,以及X軸托架組裝件2300。基板支撐裝置2250可安裝於Y軸運動組裝件2355上,且可使用(例如但不限於)線性軸承系統(利用機械軸承或空氣軸承)在軌系統2360上移動。對於氣體封裝系統之各種具體實例,空氣軸承運動系統有助於置放於基板支撐裝置2250上之基板在Y軸方向上的無摩擦傳送。Y軸運動系統2355亦可視情況使用雙軌運動,其再次由線性空氣軸承運動系統或線性機械軸承運動系統提供。根據本教示,可使用其他精確XYZ運動系統,諸如(但不限於),3軸線高架系統之各種具體實例。舉例而言,3軸線高架系統之各種具體實例可具有安裝於高架橋接部上用於精確X, Z軸移動之一X, Z托架組裝件,其中可精確地在Y軸方向移動高架。For the printing system 2003 of FIG. 36 , the precision XYZ motion system may have various components for positioning a substrate mounted on the substrate support device 2250 relative to the print head assembly 2500, which may include a Y-axis motion assembly 2355, and an X-axis carriage assembly 2300. The substrate support device 2250 may be mounted on the Y-axis motion assembly 2355, and may be moved on a rail system 2360 using, for example but not limited to, a linear bearing system (using mechanical bearings or air bearings). For various specific examples of the gas packaging system, the air bearing motion system facilitates frictionless transport of the substrate placed on the substrate support device 2250 in the Y-axis direction. The Y-axis motion system 2355 may also use dual rail motion, as appropriate, again provided by a linear air bearing motion system or a linear mechanical bearing motion system. Other precision XYZ motion systems may be used in accordance with the present teachings, such as, but not limited to, various embodiments of a 3-axis overhead system. For example, various embodiments of a 3-axis overhead system may have an X, Z carriage assembly mounted on an overhead bridge for precise X, Z axis movement, wherein the overhead can be precisely moved in the Y axis direction.

根據本教示之各種系統及方法,圖36之印刷系統2003可具有安裝至基板支撐裝置2250之一側的一粒子計數器800,使得等動力取樣探針816在大約與基板2050相同的高度處。雖然圖36描繪在基板支撐裝置之前側上的粒子計數器800,但可將一或多個粒子計數器安裝於基板支撐裝置之各種位置處,以有效地監視最接近基板之空中顆粒物。另外,對於系統及方法之各種具體實例,可將額外粒子計數器安裝或置放於其他位置中,如針對圖35所描述。According to various systems and methods of the present teachings, the printing system 2003 of FIG. 36 can have a particle counter 800 mounted to one side of the substrate support device 2250 so that the isokinetic sampling probe 816 is at approximately the same height as the substrate 2050. Although FIG. 36 depicts the particle counter 800 on the front side of the substrate support device, one or more particle counters can be mounted at various locations of the substrate support device to effectively monitor airborne particulate matter proximate to the substrate. In addition, for various specific examples of the systems and methods, additional particle counters can be mounted or placed in other locations, as described with respect to FIG. 35.

根據在本教示之氣體封裝系統之各種具體實例中含有的氣體循環及過濾系統之各種具體實例,可在氣體封裝系統中進行空中粒子之連續量測。在本教示之氣體封裝系統之各種具體實例中,此等量測可在完全自動化之模式中執行且連續地對終端使用者報告,例如,經由圖形使用者介面(GUI)。在本教示之氣體封裝系統之各種具體實例中,可在感興趣之目標位置中進行空中顆粒物之量測,如在圖35中所描繪。可將自位於氣體封裝中的粒子計數器中之每一者之輸出對終端使用者報告,例如,經由GUI。舉例而言,感興趣之目標區域可為十分接近在基板支撐裝置(諸如,夾盤或浮動台,如圖36中所描繪)上之基板的空中顆粒物。According to various embodiments of the gas circulation and filtration systems contained in various embodiments of the gas packaging system of the present teachings, continuous measurement of airborne particles can be performed in the gas packaging system. In various embodiments of the gas packaging system of the present teachings, these measurements can be performed in a fully automated mode and continuously reported to the end user, for example, via a graphical user interface (GUI). In various embodiments of the gas packaging system of the present teachings, measurements of airborne particulate matter can be performed in a target location of interest, as depicted in Figure 35. The output from each of the particle counters located in the gas package can be reported to the end user, for example, via a GUI. For example, the target region of interest may be airborne particles in close proximity to a substrate on a substrate support device (e.g., a chuck or a float table, as depicted in FIG. 36 ).

在此點上,本教示之氣體封裝系統之各種具體實例之不斷監視已確認可在印刷循環上將約≥ 2 μm之大小的粒子維持在少於約1個彼大小範圍之粒子。對於本教示之氣體封裝系統之各種具體實例,可在至少約24小時週期上將約≥ 2 μm之大小的粒子維持在少於約1個彼大小範圍之粒子。對於本教示之氣體封裝系統之各種具體實例,可在印刷循環上將約≥ 0.3 μm之大小的粒子維持在少於約3個彼大小範圍之粒子。對於本教示之氣體封裝系統之各種具體實例,可在至少約24小時週期上將約≥ 0.3 μm之大小的粒子維持在少於約3個彼大小範圍之粒子。根據本教示,已將在至少約24小時週期之持續時間中自本教示之氣體封裝系統之各種具體實例中的不同位置取得的顆粒物之量測報告為平均0.001個≥ 2 μm之粒子與0.02個≥ 0.5 μm之粒子。In this regard, constant monitoring of various embodiments of the gas encapsulation systems of the present teachings has confirmed that particles of approximately ≥ 2 μm in size can be maintained at less than approximately 1 particle of that size range over a printing cycle. For various embodiments of the gas encapsulation systems of the present teachings, particles of approximately ≥ 2 μm in size can be maintained at less than approximately 1 particle of that size range over a period of at least approximately 24 hours. For various embodiments of the gas encapsulation systems of the present teachings, particles of approximately ≥ 0.3 μm in size can be maintained at less than approximately 3 particles of that size range over a printing cycle. For various embodiments of the gas encapsulation systems of the present teachings, particles of approximately ≥ 0.3 μm in size can be maintained at less than approximately 3 particles of that size range over a period of at least approximately 24 hours. According to the present teachings, measurements of particulate matter taken from various locations in various embodiments of the gas containment system of the present teachings over a duration of at least about a 24 hour period have been reported as an average of 0.001 particles ≥ 2 μm and 0.02 particles ≥ 0.5 μm.

舉例而言,圖37A及圖37B描繪在本教示之氣體封裝系統之各種具體實例中進行的長期量測之結果。在圖37A中,描繪在不同天進行之兩個測試。在維持於惰性氮環境中之氣體封裝系統(諸如,圖12及圖13中展示之氣體封裝系統)中執行此等測試。最接近基板支撐裝置(諸如,夾盤或浮動台,如圖36中所描繪)地執行量測。在測試週期期間,氣體封裝系統連續用於包括印刷、維護及閒置之序列。在測試1中,即時量測之持續時間為約16個小時。在彼週期期間,量測到一共2個約≥ 2 μm之大小的粒子,1個在約5小時時被量測到,1個在測試週期快結束時被量測到。對於測試2(其具有約10小時之持續時間),未量測到此大小範圍之粒子。在圖37B中,描繪對於約≥ 0.5 μm之大小之粒子的在另一天在大於8小時週期上對系統執行的測試3之量測。在此測試週期期間,在約2小時時(參考數字I.)、在約6.5小時時(參考數字II.)及在約7小時時(參考數字III.)週期性地打開氣體封裝組裝件窗(諸如,圖1A之窗130)。在氣體封裝系統瞬間暴露至周圍環境之此等週期期間,可觀測到顆粒物之量測值增大,且接著迅速重新確立至約≤ 1個在彼大小範圍中的粒子之基線值。For example, Figures 37A and 37B depict the results of long-term measurements performed in various specific examples of the gas packaging system of the present teachings. In Figure 37A, two tests performed on different days are depicted. These tests are performed in a gas packaging system maintained in an inert nitrogen environment (e.g., the gas packaging system shown in Figures 12 and 13). The measurements are performed closest to the substrate support device (e.g., a chuck or a floating table, as depicted in Figure 36). During the test cycle, the gas packaging system is continuously used in a sequence including printing, maintenance, and idleness. In Test 1, the duration of the real-time measurement was approximately 16 hours. During that cycle, a total of 2 particles of about ≥ 2 μm in size were measured, 1 measured at about 5 hours and 1 measured near the end of the test cycle. For Test 2 (which had a duration of about 10 hours), no particles of this size range were measured. In FIG. 37B , measurements of Test 3 performed on the system on another day over a cycle of more than 8 hours are depicted for particles of about ≥ 0.5 μm in size. During this test cycle, the gas enclosure assembly window (e.g., window 130 of FIG. 1A ) was periodically opened at about 2 hours (reference number I.), at about 6.5 hours (reference number II.), and at about 7 hours (reference number III.). During these periods of transient exposure of the gas containment system to the ambient environment, an increase in particle counts can be observed and then quickly reestablished to a baseline value of approximately ≤ 1 particle in that size range.

對於本教示之系統及方法之各種具體實例,在氣體封裝系統中量測的空中顆粒物對於約≥ 0.3 μm之粒子可小於約3個粒子/ft 3,對於約≥ 0.5 μm之粒子可小於約1個粒子/ft 3,且對於約≥ 1.0 μm之粒子可小於約0個粒子/ft 3。在此點上,氣體循環及過濾系統之各種具體實例可經設計以提供符合國際標準組織標準(ISO) 14644-1:1999「潔淨室及相關聯之受控制之環境——第1部分:空氣清潔度之分類(Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness)」(如由第1類別至第5類別指定)之標準的針對空中顆粒之低粒惰性氣體環境,且可甚至符合或超過由第1類別設定之標準。 For various embodiments of the systems and methods of the present teachings, airborne particulate matter measured in a gas containment system may be less than about 3 particles/ft 3 for particles about ≥ 0.3 μm, less than about 1 particle/ft 3 for particles about ≥ 0.5 μm, and less than about 0 particles/ft 3 for particles about ≥ 1.0 μm. In this regard, various embodiments of the gas circulation and filtration systems may be designed to provide a low-particle inert gas environment with respect to airborne particles that meets the standards of the International Organization for Standardization (ISO) 14644-1:1999 “Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness” as designated by Classes 1 through 5, and may even meet or exceed the standards set by Class 1.

如在針對圖37B呈現之資料中所論證,本教示之循環及過濾系統之各種具體實例的此迅速系統恢復另外描繪於圖38之曲線圖中。在圖38中,監視最接近基板支撐裝置(諸如,夾盤或浮動台)的約≥ 2 μm之大小之粒子。如可在圖38之曲線圖中看出,在少於3分鐘內恢復回至約≤1個在彼大小範圍中的粒子之基線等級。As demonstrated in the data presented with respect to FIG. 37B , this rapid system recovery of various specific embodiments of the circulation and filtering system of the present teachings is further depicted in the graph of FIG. 38 . In FIG. 38 , particles of a size of approximately ≥ 2 μm are monitored closest to the substrate support device (e.g., a chuck or a floating table). As can be seen in the graph of FIG. 38 , recovery back to a baseline level of approximately ≤ 1 particle in that size range occurs in less than 3 minutes.

可使用(例如)測試基板在印刷基板前針對氣體封裝系統之各種具體實例執行基板上的顆粒物的基板上分佈之判定,用於系統驗證。在氣體封裝系統之各種具體實例中,可當印刷基板時在原地執行顆粒物之基板上分佈之判定,作為持續進行之品質檢查。對於氣體封裝系統之各種具體實例,可在印刷基板前及另外當印刷基板時在原地執行顆粒物之基板上分佈之判定,用於系統驗證。Determination of the on-substrate distribution of particles on a substrate can be performed for various embodiments of a gas packaging system using, for example, a test substrate before printing the substrate for system validation. In various embodiments of a gas packaging system, determination of the on-substrate distribution of particles can be performed in situ while printing the substrate as an ongoing quality check. For various embodiments of a gas packaging system, determination of the on-substrate distribution of particles can be performed in situ before printing the substrate and additionally while printing the substrate for system validation.

圖39描繪基於光散射之基板上偵測方案,其可具有與先前關於用於空中顆粒物之偵測系統針對圖34之粒子計數器偵測器830所描述的組件基本上相同的組件。FIG. 39 depicts an on-substrate detection scheme based on light scattering that may have substantially the same components as previously described with respect to the particle counter detector 830 of FIG. 34 in connection with a detection system for airborne particulate matter.

在圖39中,基於光散射的基板上粒子計數器偵測系統860可具有已知波長之已知波長範圍之電磁輻射源,諸如,光源850。對於基板上粒子計數器偵測系統860之各種具體實例,光源850可為發射具有在約600 nm至約850 nm之間的已知波長之光的雷射源。藉由射線追蹤來描繪發射之源光851以與基板854上之粒子852相互作用。對於本教示之系統及方法之各種具體實例,基板可為測試基板,諸如,矽晶圓。考慮到半導體行業內已演進的基板上粒子判定之歷史,矽晶圓上之粒子判定為廣為接受之測試方法。另外,矽晶圓可具有諸如具有反射性表面(其對於基於光散射之基板上偵測系統為較佳的)之屬性。另外,矽晶圓為實質上傳導性材料,使得其可接地。具有電中性之基板表面對於進行基板上粒子沈積之無偏差取樣係重要的。因為顆粒物攜載電荷並非不同尋常,所以帶電表面可藉此取決於帶電粒子與帶電表面之間的相互作用為吸引或是排斥而導致虛假的肯定結果或虛假的否定結果。In FIG. 39 , a light scattering based on-substrate particle counter detection system 860 may have a source of electromagnetic radiation of a known wavelength and a known range of wavelengths, such as a light source 850. For various specific embodiments of the on-substrate particle counter detection system 860, the light source 850 may be a laser source that emits light having a known wavelength between about 600 nm and about 850 nm. The emitted source light 851 is profiled by ray tracing to interact with particles 852 on a substrate 854. For various specific embodiments of the systems and methods of the present teachings, the substrate may be a test substrate, such as a silicon wafer. Given the history of on-substrate particle determination that has evolved within the semiconductor industry, particle determination on silicon wafers is a widely accepted testing method. Additionally, silicon wafers may have properties such as having a reflective surface which is preferred for on-substrate detection systems based on light scattering. Additionally, silicon wafers are substantially conductive materials, allowing them to be grounded. Having a neutrally charged substrate surface is important for unbiased sampling of particle deposition on substrates. Because particles carry a non-unusual charge, a charged surface may thereby result in a false positive or false negative result depending on whether the interaction between the charged particle and the charged surface is attractive or repulsive.

關於具有反射性表面之基板(諸如,矽晶圓測試基板),可反射發射之源光851(如由反射之光線853展示),且其亦可與基板表面854上之粒子852相互作用以產生散射光,如由散射光855所描繪。如本文中先前針對基於光散射的空中粒子偵測(諸如,圖34之粒子計數器偵測器830)之情況所論述,可在許多有角度之方向上散射光,包括與發射之源光851之方向正交,如針對落在光路徑I內的散射光855所描繪。聚焦透鏡856可聚焦由粒子852與發射之源光851之方向正交地散射的光,如朝向諸如濾光片857之至少一光學濾光片的光路徑II所描繪。光學濾光片857可為(例如)空間或光學帶通濾光片,或可添加額外濾光片以提供其組合。最後,與發射之源光851之方向正交地散射的光可由偵測器858偵測,該偵測器可為各種類型之光度計偵測器,例如,基於光電二極體技術。根據本教示之系統及方法之各種具體實例,使用基板上粒子計數器偵測系統(諸如,圖39之基板上粒子計數器偵測系統860),可將包括具有一粒徑之粒子之數目以及在表面上偵測到的每一粒子之位置之報告提供給終端使用者。With respect to substrates having reflective surfaces (e.g., silicon wafer test substrates), emitted source light 851 can be reflected (as shown by reflected light 853), and it can also interact with particles 852 on substrate surface 854 to produce scattered light, as depicted by scattered light 855. As discussed previously herein for the case of airborne particle detection based on light scattering (e.g., particle counter detector 830 of FIG. 34 ), light can be scattered in many angled directions, including orthogonal to the direction of emitted source light 851, as depicted for scattered light 855 falling within optical path I. Focusing lens 856 can focus light scattered by particles 852 orthogonal to the direction of emitted source light 851, as depicted in optical path II toward at least one optical filter, such as filter 857. The optical filter 857 can be, for example, a spatial or optical bandpass filter, or additional filters can be added to provide a combination thereof. Finally, light scattered orthogonally to the direction of the emitted source light 851 can be detected by a detector 858, which can be various types of photometric detectors, for example, based on photodiode technology. According to various specific examples of the systems and methods of the present teachings, using an on-substrate particle counter detection system (e.g., on-substrate particle counter detection system 860 of FIG. 39 ), a report including the number of particles having a particle size and the position of each particle detected on a surface can be provided to an end user.

關於用於基板上粒子判定(例如但不限於,用於系統驗證)之測試協定,可獲得已經分析且接著密封之矽測試晶圓以及針對每一測試晶圓判定的粒子之大小及位置之報告。可按個別密封地或在盒子中的方式獲得測試晶圓。根據本教示之各種系統及方法,可將一盒佐證晶圓密封於盒外殼內,且接著可藉由可移除之密封材料(諸如,密封之聚合小袋)密封盒外殼。對於用於為了氣體封裝系統驗證之基板上粒子判定的各種測試協定,一盒佐證晶圓可由終端使用者或由機器人置放至氣體封裝系統內。舉例而言,盒可由終端使用者或機器人置放於輔助封裝中,如本文中先前所描述,且可使輔助封裝經過恢復過程,直至使氣體環境達到關於反應性氣體之規範。盒可由終端使用者或機器人轉移至印刷系統封裝內。一旦密封之盒在氣體封裝系統內,就可將佐證晶圓之盒拆封,且可打開盒外殼以易於接取晶圓。For test protocols used for particle determination on a substrate (for example, but not limited to, for system validation), silicon test wafers that have been analyzed and then sealed are available, along with a report of the size and location of the particles determined for each test wafer. The test wafers may be obtained individually sealed or in a box. In accordance with various systems and methods of the present teachings, a box of witness wafers may be sealed within a box housing, and the box housing may then be sealed with a removable sealing material (e.g., a sealed polymeric pouch). For various test protocols used for particle determination on a substrate for gas packaging system validation, a box of witness wafers may be placed into a gas packaging system by an end user or by a robot. For example, the cassette may be placed in a secondary package by an end user or a robot, as previously described herein, and the secondary package may be subjected to a recovery process until the gas environment is brought to specifications for reactive gases. The cassette may be transferred by the end user or a robot into a printing system package. Once the sealed cassette is in the gas packaging system, the cassette of witness wafers may be unsealed and the cassette housing may be opened for easy access to the wafers.

參看圖40,具有測試晶圓854之所描繪印刷系統2003可具有先前針對圖26之印刷系統2002以及圖28A及圖36之印刷系統2003所描述的所有元件。舉例而言(但不限於),在圖40中,如先前針對圖26、圖28A及圖36描述之印刷系統2003可具有安裝於橋接部2130上之X軸托架組裝件2300,其亦可包括用於印刷頭組裝件2500之Z軸定位的Z軸移動板2310。在此點上,托架組裝件2300之各種具體實例可提供印刷頭組裝件2500相對於定位於基板支撐件2250上之基板的精確X, Z定位。對於印刷系統2003之各種具體實例,X軸托架組裝件2300可利用為固有地低粒產生之一線性空氣軸承運動系統。圖40之印刷系統2003可具有用於圍阻及排出自服務束產生之粒子的服務束外殼排氣系統2400,其可包括用於收容服務束之服務束外殼2410。圖40之印刷系統2003可具有用於支撐基板之基板支撐裝置2250,可使用Y軸定位系統2355在Y軸方向上精確地定位該基板。基板支撐裝置2250及Y軸定位系統2355由印刷系統基底2101支撐。基板支撐裝置2250可安裝於Y軸運動組裝件2355上,且可使用(例如但不限於)線性軸承系統(利用機械軸承或空氣軸承)在軌系統2360上移動。對於氣體封裝系統之各種具體實例,空氣軸承運動系統有助於置放於基板支撐裝置2250上之基板在Y軸方向上的無摩擦傳送。Y軸運動系統2355亦可視情況使用再次由線性空氣軸承運動系統或線性機械軸承運動系統提供的雙軌運動。40, the depicted printing system 2003 with the test wafer 854 may have all of the elements previously described with respect to the printing system 2002 of FIG. 26 and the printing system 2003 of FIG. 28A and FIG. 36. By way of example (but not limitation), in FIG. 40, the printing system 2003 as previously described with respect to FIG. 26, FIG. 28A and FIG. 36 may have an X-axis carriage assembly 2300 mounted on a bridge 2130, which may also include a Z-axis translation plate 2310 for Z-axis positioning of a printhead assembly 2500. In this regard, various specific embodiments of the carriage assembly 2300 may provide for precise X, Z positioning of the printhead assembly 2500 relative to a substrate positioned on a substrate support 2250. For various specific examples of the printing system 2003, the X-axis carriage assembly 2300 may utilize a linear air bearing motion system that is inherently low in particle generation. The printing system 2003 of FIG. 40 may have a service bundle enclosure exhaust system 2400 for containing and exhausting particles generated from the service bundle, which may include a service bundle enclosure 2410 for housing the service bundle. The printing system 2003 of FIG. 40 may have a substrate support device 2250 for supporting a substrate, which may be precisely positioned in the Y-axis direction using a Y-axis positioning system 2355. The substrate support device 2250 and the Y-axis positioning system 2355 are supported by the printing system base 2101. The substrate support device 2250 can be mounted on a Y-axis motion assembly 2355 and can move on a rail system 2360 using, for example but not limited to, a linear bearing system (using mechanical bearings or air bearings). For various specific examples of gas packaging systems, the air bearing motion system facilitates frictionless transport of substrates placed on the substrate support device 2250 in the Y-axis direction. The Y-axis motion system 2355 can also use dual rail motion, again provided by a linear air bearing motion system or a linear mechanical bearing motion system, as appropriate.

圖40之測試晶圓854可置放於印刷系統2003之基板支撐裝置2250上。基板支撐裝置2250可最接近橋接部2130定位,處於可模擬在印刷製程期間基板可定位於的位置的多種位置中。測試晶圓可具有邊緣排除地帶,在該地帶中在測試後不執行粒子判定,因為邊緣排除地帶為執行處置(其可在晶圓邊緣處引入污染)之地帶。根據用於為了氣體封裝系統驗證之基板上粒子判定之各種測試協定,邊緣排除地帶在晶圓之周邊周圍且自晶圓邊緣量測的寬度可在約1 cm至約2 cm之間。對於用於為了氣體封裝系統驗證之基板上粒子判定的各種測試協定,可進行一系列基板上粒子判定以評價收容印刷系統的氣體封裝系統之狀態。首先,可執行背景測試,其中可藉由恰好在邊緣排除地帶處處置測試基板來取出統計數目個測試晶圓,且接著將測試晶圓置放回至盒內。在下一個靜態測試中,可藉由恰好在邊緣排除地帶處處置測試基板來取出統計數目個測試晶圓,且接著在設定之持續時間內(諸如,在印刷製程之持續時間內)使測試晶圓暴露至工具環境,而無氣體封裝系統內的任何裝置或器件之任何致動。在此點上,處於測試晶圓之靜態集合中之測試晶圓處於靜態印刷環境中。接著可將用於靜態測試之一組測試晶圓移動回至盒外殼內。在印刷測試中,可藉由恰好在邊緣排除地帶處處置測試基板來取出統計數目個測試晶圓,且接著在印刷製程之持續時間內使測試晶圓暴露至工具環境,而無墨水噴出之任何致動,但伴有氣體封裝系統內的裝置或器件之完全致動。舉例而言,安裝於托架組裝件2300上之印刷頭組裝件2500可相對於安裝於在圖40中描繪之印刷系統2003之基板支撐裝置上的測試晶圓854移動,從而模擬真實印刷循環。在此點上,處於測試晶圓之印刷集合中之測試晶圓處於靜態印刷環境中。接著可將用於印刷測試之該組測試晶圓移動回至盒外殼內。The test wafer 854 of FIG. 40 may be placed on a substrate support device 2250 of the printing system 2003. The substrate support device 2250 may be positioned proximate the bridge 2130 in a variety of positions that may simulate the position in which the substrate may be positioned during the printing process. The test wafer may have an edge exclusion zone in which particle determination is not performed after testing because the edge exclusion zone is a zone in which treatments are performed that may introduce contamination at the edge of the wafer. The edge exclusion zone may be between about 1 cm and about 2 cm wide around the perimeter of the wafer and measured from the edge of the wafer according to various test protocols used for on-substrate particle determination for gas packaging system validation. For various test protocols used for on-substrate particle determination for gas packaging system validation, a series of on-substrate particle determinations can be performed to evaluate the status of the gas packaging system that houses the printing system. First, a background test can be performed, in which a statistical number of test wafers can be removed by treating the test substrate just at the edge exclusion zone, and then the test wafers are placed back into the box. In the next static test, a statistical number of test wafers can be removed by treating the test substrate just at the edge exclusion zone, and then the test wafers are exposed to the tool environment for a set duration (e.g., for the duration of the printing process) without any actuation of any device or component within the gas packaging system. At this point, the test wafers in the static set of test wafers are in the static printing environment. A set of test wafers used for static testing can then be moved back into the box housing. In a print test, a statistical number of test wafers can be removed by positioning the test substrate just at the edge exclusion zone, and then exposed to the tool environment for the duration of the printing process without any actuation of ink ejection, but with full actuation of the devices or components within the gas packaging system. For example, a print head assembly 2500 mounted on a bracket assembly 2300 can be moved relative to a test wafer 854 mounted on a substrate support device of the printing system 2003 depicted in Figure 40, thereby simulating a real printing cycle. At this point, the test wafers in the print set of test wafers are in a static print environment. The set of test wafers for print testing can then be moved back into the cassette housing.

一旦已完成包括背景測試、靜態測試及印刷測試之測試協定,則可重新密封盒外殼,且可自印刷系統封裝移除盒以用於測試。舉例而言,可將具有該一系列測試晶圓的密封之盒置放於輔助封裝中。當印刷系統封裝可密封地與輔助封裝隔離(如本文中先前所描述)時,可將輔助封裝對周圍環境開放,且具有測試晶圓的經密封之盒可被擷取且發送以供分析。用於本教示之基板上粒子判定測試協定之各種具體實例的所有過程步驟可由終端使用者或機器人或其組合執行。最後,可閉合輔助封裝且使其經過恢復過程,直至使氣體環境達到關於反應性氣體之規範。Once the test protocol including background testing, static testing, and printing testing has been completed, the box housing can be resealed and the box can be removed from the printing system package for testing. For example, the sealed box with the series of test wafers can be placed in a secondary package. When the printing system package can be sealably isolated from the secondary package (as previously described herein), the secondary package can be opened to the surrounding environment and the sealed box with the test wafers can be captured and sent for analysis. All process steps for various specific examples of the particle on substrate determination test protocol of the present teachings can be performed by an end user or a robot or a combination thereof. Finally, the secondary package can be closed and allowed to go through a recovery process until the gas environment meets the specifications for reactive gases.

可將本教示之各種成像系統及方法用於原地基板上顆粒物判定,以及用於執行系統驗證程序。參看圖41,印刷系統2004可具有先前針對圖26之印刷系統2002以及圖28A、圖36及圖40之印刷系統2003所描述的所有元件。舉例而言(但不限於),圖41之印刷系統2004可具有用於圍阻及排出自服務束產生之粒子的服務束外殼排氣系統2400。印刷系統2004之服務束外殼排氣系統2400可包括服務束外殼2410,其可收容一服務束。根據本教示,服務束可操作性地連接至印刷系統以提供操作氣體封裝系統中之各種器件及裝置(例如但不限於,與印刷系統相關聯之各種器件及裝置)所需的各種光學、電、機械及流體連接。圖41之印刷系統2004可具有用於支撐基板2050之基板支撐裝置2250,可使用Y軸定位系統2355在Y軸方向上精確地定位該基板。基板支撐裝置2250及Y軸定位系統2355由印刷系統基底2101支撐。基板支撐裝置2250可安裝於Y軸運動組裝件2355上,且可使用(例如但不限於)線性軸承系統(利用機械軸承或空氣軸承)在軌系統2360上移動。對於氣體封裝系統之各種具體實例,空氣軸承運動系統有助於置放於基板支撐裝置2250上之基板在Y軸方向上的無摩擦傳送。Y軸運動系統2355亦可視情況使用再次由線性空氣軸承運動系統或線性機械軸承運動系統提供的雙軌運動。Various imaging systems and methods of the present teachings may be used for in situ on-substrate particle determination, and for performing system validation procedures. Referring to FIG. 41 , a printing system 2004 may have all of the elements previously described for the printing system 2002 of FIG. 26 and the printing system 2003 of FIG. 28A , FIG. 36 , and FIG. 40 . By way of example, but not limitation, the printing system 2004 of FIG. 41 may have a service bundle enclosure exhaust system 2400 for containing and exhausting particles generated from a service bundle. The service bundle enclosure exhaust system 2400 of the printing system 2004 may include a service bundle enclosure 2410 that may house a service bundle. According to the present teachings, a service bundle can be operably connected to a printing system to provide various optical, electrical, mechanical, and fluid connections required to operate various devices and apparatuses in a gas packaging system (such as, but not limited to, various devices and apparatuses associated with the printing system). The printing system 2004 of FIG. 41 can have a substrate support device 2250 for supporting a substrate 2050, which can be precisely positioned in the Y-axis direction using a Y-axis positioning system 2355. The substrate support device 2250 and the Y-axis positioning system 2355 are supported by the printing system base 2101. The substrate support device 2250 can be mounted on a Y-axis motion assembly 2355 and can move on a rail system 2360 using, for example but not limited to, a linear bearing system (using mechanical bearings or air bearings). For various specific examples of gas packaging systems, the air bearing motion system facilitates frictionless transport of substrates placed on the substrate support device 2250 in the Y-axis direction. The Y-axis motion system 2355 can also use dual rail motion, again provided by a linear air bearing motion system or a linear mechanical bearing motion system, as appropriate.

關於支撐各種托架組裝件之運動系統,圖41之印刷系統2004可具有第一X軸托架組裝件2300A(其被描繪為具有安裝於其上之印刷頭組裝件2500)及第二X軸托架組裝件2300B(其被描繪為具有安裝於其上之相機組裝件2550)。處於基板支撐裝置2250上之基板2050(例如,在印刷製程期間)可位於最接近橋接部2130之各種位置中。可將基板支撐裝置2250安裝於印刷系統基底2101上。在圖41中,印刷系統2004可具有安裝於橋接部2130上之第一X軸托架組裝件2300A及第二X軸托架組裝件2300B。第一X軸托架組裝件2300A亦可包括用於印刷頭組裝件2500之Z軸定位的第一Z軸移動板2310A,而第二X軸托架組裝件2300B可具有用於相機組裝件2550之Z軸定位的第二Z軸移動板2310B。在此點上,托架組裝件2300A及2300B之各種具體實例可分別為印刷頭組裝件2500及相機組裝件2550提供相對於定位於基板支撐件2250上之基板的精確X, Z定位。對於印刷系統2004之各種具體實例,第一X軸托架組裝件2300A及第二X軸托架組裝件2300B可利用為固有地低粒產生之線性空氣軸承運動系統。With respect to the motion system supporting various carriage assemblies, the printing system 2004 of FIG. 41 may have a first X-axis carriage assembly 2300A (depicted as having a print head assembly 2500 mounted thereon) and a second X-axis carriage assembly 2300B (depicted as having a camera assembly 2550 mounted thereon). The substrate 2050 on the substrate support device 2250 (e.g., during a printing process) may be in various positions proximate to the bridge 2130. The substrate support device 2250 may be mounted on the printing system base 2101. In FIG41 , the printing system 2004 may have a first X-axis carriage assembly 2300A and a second X-axis carriage assembly 2300B mounted on the bridge 2130. The first X-axis carriage assembly 2300A may also include a first Z-axis moving plate 2310A for Z-axis positioning of the print head assembly 2500, and the second X-axis carriage assembly 2300B may have a second Z-axis moving plate 2310B for Z-axis positioning of the camera assembly 2550. In this regard, various specific examples of the carriage assemblies 2300A and 2300B may provide accurate X, Z positioning of the print head assembly 2500 and the camera assembly 2550, respectively, relative to a substrate positioned on the substrate support 2250. For various specific embodiments of the printing system 2004, the first X-axis carriage assembly 2300A and the second X-axis carriage assembly 2300B may utilize a linear air bearing motion system that is inherently low in particle generation.

圖41之相機組裝件2550可為高速、高解析度相機。相機組裝件2550可包括相機2552、相機支架組裝件2554及透鏡組裝件2556。相機組裝件2550可經由相機支架組裝件2556安裝至運動系統2300B的Z軸移動板2310B上。相機2552可為將光學影像轉換成電子信號之任何影像感測器器件,諸如(藉由非限制性實例),電荷耦合器件(CCD)、互補金屬氧化物半導體(CMOS)器件或N型金屬氧化物半導體(NMOS)器件。可將各種影像感測器器件組態為用於區域掃描相機之感測器陣列或用於線掃描相機之單一感測器列。相機組裝件2550可連接至影像處理系統,影像處理系統可包括(例如)用於儲存、處理及提供結果之電腦。如本文中先前針對圖41之印刷系統2004所論述,Z軸移動板2310B可可控制地調整相機組裝件2550相對於基板2050之Z軸位置。在各種製程(諸如,印刷及資料收集)期間,可使用X軸運動系統2300B及Y軸運動系統2355相對於相機組裝件2550可控制地定位基板2050。The camera assembly 2550 of FIG. 41 may be a high-speed, high-resolution camera. The camera assembly 2550 may include a camera 2552, a camera bracket assembly 2554, and a lens assembly 2556. The camera assembly 2550 may be mounted on the Z-axis moving plate 2310B of the motion system 2300B via the camera bracket assembly 2556. The camera 2552 may be any image sensor device that converts an optical image into an electronic signal, such as (by way of non-limiting example), a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS) device, or an N-type metal oxide semiconductor (NMOS) device. The various image sensor devices may be configured as a sensor array for an area scan camera or a single sensor row for a line scan camera. The camera assembly 2550 can be connected to an image processing system, which can include, for example, a computer for storing, processing, and presenting results. As previously discussed herein with respect to the printing system 2004 of FIG. 41 , the Z-axis translation plate 2310B can controllably adjust the Z-axis position of the camera assembly 2550 relative to the substrate 2050. The X-axis motion system 2300B and the Y-axis motion system 2355 can be used to controllably position the substrate 2050 relative to the camera assembly 2550 during various processes (e.g., printing and data collection).

因此,圖41之分裂軸線運動系統可提供相機組裝件2550及基板2050在三維中相對於彼此之精確定位,以便在任何所要的焦點及/或高度處捕獲關於基板2050之任何部分的影像資料。此外,可針對區域掃描或線掃描過程進行相機相對於基板之精確XYZ運動。如本文中先前所論述,諸如高架運動系統之其他運動系統亦可用以提供(例如)印刷頭組裝件及/或相機組裝件相對於基板的在三維中之精確移動。另外,可將照明裝置安裝於各種位置中,在X軸運動系統上或在最接近基板之基板支撐裝置上,及其組合。在彼點上,可根據執行各種明視野及暗視野分析及其組合來定位照明裝置。運動系統之各種具體實例可使用連續或步進式運動或其組合相對於基板2050定位相機組裝件2550以捕獲基板2050之表面的一系列一或多個影像。每一影像可涵蓋OLED基板之與一或多個像素井相關聯之區域、相關聯之電子電路組件、路徑及連接器。藉由使用影像處理,可獲得粒子之影像,且可判定大小及特定大小之粒子的數目。在本教示之系統及方法之各種具體實例中,可使用具有約8192個像素之線掃描相機,其具有約190 mm之工作高度,且能夠按約34 kHz掃描。另外,對於印刷系統基板相機組裝件之各種具體實例,可將一個以上相機安裝於X軸托架組裝件上,其中每一相機可具有關於視野及解析度之不同規格。舉例而言,一相機可為線掃描相機以用於原地粒子檢驗,而第二相機可用於氣體封裝系統中的基板之常規操縱。適用於常規操縱之此相機可為具有在當放大率為約0.9X時之約5.4 mm×4 mm至當放大率為約0.45X時之約10.6 mm×8 mm之範圍中的視野之區域掃描相機。在再其他具體實例中,一相機可為線掃描相機以用於原地粒子檢驗,而第二相機可用於氣體封裝系統中的基板之精確操縱,例如,用於基板對準。適用於精確操縱之此相機可為當放大率為約7.2X時具有約0.7 mm×0.5 mm的視野之區域掃描相機。Thus, the split axis motion system of FIG. 41 can provide for precise positioning of the camera assembly 2550 and the substrate 2050 relative to each other in three dimensions so as to capture image data about any portion of the substrate 2050 at any desired focal point and/or height. In addition, precise XYZ motion of the camera relative to the substrate can be performed for area scanning or line scanning processes. As previously discussed herein, other motion systems such as overhead motion systems can also be used to provide, for example, precise movement of the print head assembly and/or camera assembly relative to the substrate in three dimensions. In addition, the lighting device can be mounted in various positions, either on the X-axis motion system or on the substrate support device closest to the substrate, and combinations thereof. At that point, the lighting device can be positioned based on performing various bright field and dark field analyses and combinations thereof. Various embodiments of the motion system may use continuous or step-wise motion or a combination thereof to position the camera assembly 2550 relative to the substrate 2050 to capture a series of one or more images of the surface of the substrate 2050. Each image may cover an area of the OLED substrate associated with one or more pixel wells, associated electronic circuit components, paths, and connectors. By using image processing, images of the particles may be obtained, and the size and number of particles of a particular size may be determined. In various embodiments of the systems and methods of the present teachings, a line scan camera having approximately 8192 pixels may be used, having a working height of approximately 190 mm, and capable of scanning at approximately 34 kHz. In addition, for various specific embodiments of a printing system substrate camera assembly, more than one camera may be mounted on an X-axis carriage assembly, wherein each camera may have different specifications regarding field of view and resolution. For example, one camera may be a line scan camera for in situ particle inspection, while a second camera may be used for routine manipulation of substrates in a gas packaging system. Such a camera suitable for routine manipulation may be an area scan camera having a field of view ranging from approximately 5.4 mm×4 mm when the magnification is approximately 0.9X to approximately 10.6 mm×8 mm when the magnification is approximately 0.45X. In yet other specific embodiments, one camera may be a line scan camera for in situ particle inspection, while a second camera may be used for precise manipulation of substrates in a gas packaging system, for example, for substrate alignment. Such a camera suitable for precise manipulation may be an area scanning camera having a field of view of approximately 0.7 mm x 0.5 mm at a magnification of approximately 7.2X.

關於OLED基板之原地檢驗,可使用印刷系統基板相機組裝件之各種具體實例(諸如,圖41中描繪的印刷系統2004之相機組裝件2550)來檢驗面板,而無對總平均循環時間(TACT)之顯著影響。舉例而言,可在少於70秒中掃描Gen 8.5基板以找到基板上顆粒物。除了OLED基板之原地檢驗之外,藉由使用測試基板來判定是否可在將氣體封裝系統用於印刷製程前驗證氣體封裝系統之充分低粒環境,印刷系統基板相機組裝件亦可用於系統驗證研究。With respect to in-situ inspection of OLED substrates, various specific instances of the printing system substrate camera assembly (e.g., camera assembly 2550 of printing system 2004 depicted in FIG. 41 ) may be used to inspect panels without significant impact on the total average cycle time (TACT). For example, a Gen 8.5 substrate may be scanned in less than 70 seconds to find particles on the substrate. In addition to in-situ inspection of OLED substrates, the printing system substrate camera assembly may also be used for system validation studies by using test substrates to determine whether a sufficiently low particle environment of a gas packaging system may be validated before the gas packaging system is used in a printing process.

關於空中顆粒物及在系統內之粒子沈積,大量變數可影響開發可充分計算(例如)任一特定製造系統的在表面(諸如,基板)上之粒子散落速率的值之近似值之一般模型。諸如粒子之大小、特定大小之粒子的分佈、基板之表面積及系統內的基板之暴露時間的變數可取決於各種製造系統而變化。舉例而言,粒子之大小及特定大小之粒子的分佈可實質上受到各種製造系統中的粒子產生組件之源及位置影響。基於本教示之氣體封裝系統之各種具體實例的計算表明,在無本教示之各種粒子控制系統之情況下,對於在0.1 μm及更大之大小範圍中的粒子,每平方公尺基板每印刷循環的基板上沈積可在大於約1百萬至大於約1千萬個粒子之間。此等計算表明,在無本教示之各種粒子控制系統之情況下,對於在約2 μm及更大之大小範圍中的粒子,每平方公尺基板每印刷循環的基板上沈積可在大於約1000至大於約10,000個粒子之間。With respect to airborne particulate matter and particle deposition within a system, a large number of variables may affect the development of a general model that can adequately approximate the value of the particle shedding rate on a surface (e.g., a substrate) for, for example, any particular manufacturing system. Variables such as the size of the particles, the distribution of particles of a particular size, the surface area of the substrate, and the exposure time of the substrate within the system may vary depending on the various manufacturing systems. For example, the size of the particles and the distribution of particles of a particular size may be substantially affected by the source and location of the particle generating components in the various manufacturing systems. Calculations based on various specific examples of gas packaging systems of the present teachings indicate that, without various particle control systems of the present teachings, for particles in the size range of 0.1 μm and larger, the deposition on the substrate per printing cycle may be between greater than about 1 million and greater than about 10 million particles per square meter of substrate. Such calculations indicate that, without various particle control systems of the present teachings, for particles in the size range of about 2 μm and larger, the deposition on the substrate per printing cycle may be between greater than about 1000 and greater than about 10,000 particles per square meter of substrate.

藉由使用如針對本教示之基板上粒子判定測試協定之各種具體實例所描述的測試協定,本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於10 μm之粒子,提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於2 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。在本教示之氣體封裝系統之各種具體實例中,可維持低粒環境,從而對於大小大於或等於1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約100個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.5 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。對於本教示之氣體封裝系統之各種具體實例,可維持低粒環境,從而對於大小大於或等於0.3 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。本教示之低粒氣體封裝系統之各種具體實例可維持低粒環境,從而對於大小大於或等於0.1 μm之粒子提供符合小於或等於每分鐘每平方公尺基板約1000個粒子之基板上沈積速率規範的平均基板上粒子分佈。By using the test protocol as described for various embodiments of the on-substrate particle determination test protocol of the present teachings, various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 10 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 5 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 2 μm. In various embodiments of the gas packaging system of the present teachings, a low particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 100 particles per square meter of substrate per minute for particles with a size greater than or equal to 1 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.5 μm. For various embodiments of the gas packaging system of the present teachings, a low-particle environment can be maintained to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per square meter of substrate per minute for particles with a size greater than or equal to 0.3 μm. Various embodiments of the low-particle gas packaging system of the present teachings can maintain a low-particle environment to provide an average on-substrate particle distribution that meets an on-substrate deposition rate specification of less than or equal to about 1000 particles per minute per square meter of substrate for particles greater than or equal to 0.1 μm in size.

在本說明書中提到之所有公開案、專利及專利申請案被以引用的方式併入本文,就如同每一個別公開案、專利或專利申請案被具體且個別地指示為以引用的方式併入一樣。All publications, patents, and patent applications mentioned in this specification are herein incorporated by reference to the same extent as if each individual publication, patent, or patent application was specifically and individually indicated to be incorporated by reference.

雖然本文中已展示及描繪本發明之具體實例,但對熟習此項技術者而言顯然,此等具體實例係僅藉由實例提供。在不脫離本發明之情況下,熟習此項技術者現在將想到眾多變化、改變及取代。Although specific examples of the present invention have been shown and described herein, it will be apparent to those skilled in the art that these specific examples are provided by way of example only. Numerous variations, changes, and substitutions will now occur to those skilled in the art without departing from the present invention.

應理解,在實踐本發明過程中可使用對本文中描述之本發明之具體實例的各種替代方案。舉例而言,諸如化學、生物技術、高技術及藥物技術領域之大量不同技術領域可受益於本教示。將OLED印刷用以舉例說明根據本教示的氣體封裝系統之各種具體實例之效用。可收容一OLED印刷系統的氣體封裝系統之各種具體實例可提供諸如(但不限於)以下特徵:密封(從而提供建構及解構循環中之氣密性封裝)、封裝容積之最小化,及在處理期間以及在維護期間易於自外部接取內部。氣體封裝系統之各種具體實例之此等特徵可具有對功能性之影響,諸如(但不限於),結構完整性(從而易於在處理期間維持低含量之反應性物質),以及使維護循環期間的停機時間最小化之迅速封裝容積更新。因而,提供用於OLED面板印刷之效用的各種特徵及規範亦可對多種技術領域提供益處。希望以下申請專利範圍定義本發明之範疇,且由其涵蓋在此等申請專利範圍及其等效物之範疇內的方法及結構。It should be understood that various alternatives to the specific embodiments of the invention described herein may be used in practicing the invention. For example, a large number of different technical fields such as chemistry, biotechnology, high technology and pharmaceutical technology can benefit from the present teachings. OLED printing is used to illustrate the utility of various specific embodiments of gas packaging systems according to the present teachings. Various specific embodiments of gas packaging systems that can accommodate an OLED printing system can provide features such as (but not limited to): sealing (thereby providing airtight packaging during construction and deconstruction cycles), minimization of packaging volume, and easy access to the interior from the outside during processing and during maintenance. Such features of various specific embodiments of gas packaging systems can have an impact on functionality such as, but not limited to, structural integrity (thus facilitating low levels of reactive species during processing), and rapid package volume renewal to minimize downtime during maintenance cycles. Thus, the various features and specifications that provide utility for OLED panel printing can also provide benefits to a variety of technical fields. It is intended that the following claims define the scope of the present invention and that the methods and structures within the scope of these claims and their equivalents be covered thereby.

10:插入面板區段 12:框 14:盲螺紋孔 15:螺桿 16:墊片 18:可壓縮墊片 20:窗面板區段 22:框 30:面板區段 32:面板區段框 34:窗導引間隔物 35:窗夾 36:夾緊夾板 38:可壓縮墊片 40:頂板框區段 41:第一側 42:頂板框樑 43:第二側 44:頂板框樑 45:第一照明元件 46:照明元件對 47:第二照明元件 100:氣體封裝組裝件 101:氣體封裝組裝件 103:風扇過濾器單元蓋 105:第一頂板框管道 107:第二頂板框管道 109:金屬薄片面板區段 110:插入面板 120:窗面板 122:面板框 124:窗 125:窗面板 130:可易於移除之保養窗 132:保養窗框 134:窗 136:肘節夾 138:窗把手 140:手套端口 142:手套 200:框構件組裝件 202:基底 204:底盤 210:第一壁框 210':第一壁面板 220:壁框 220':左壁面板 226:頂部 227:頂部壁框間隔板 228:底部 229:底部壁框間隔板 230:第三壁框 230':第三壁面板 240:壁框 240':後壁面板 250:頂板框 250':頂板面板 251:內部部分 300:密封組裝件 302:間隙 304:間隙 306:間隙 310:壁框 311:內部側 312:間隔板 314:垂直側 315:頂表面 316:間隔板 317:內邊緣 320:第一墊片 321:垂直墊片長度 323:曲線墊片長度 325:墊片長度 340:第二墊片 345:墊片之長度 350:壁框 353:框側 354:垂直側 355:頂表面 356:間隔板 360:第一墊片 361:水平長度 363:曲線長度 365:長度 370:頂板框 500:氣體封裝系統 501:氣體封裝系統 502:氣體封裝系統 503:氣體封裝系統 504:氣體封裝系統 505:氣體封裝系統 506:氣體封裝系統 507:氣體封裝系統 508:氣體封裝系統 509:氣體封裝系統 510:氣體封裝系統 511:氣體封裝系統 512:氣體封裝系統 800:粒子計數器 800A:粒子計數器圖示 800B:粒子計數器圖示 800C:粒子計數器圖示 800D:粒子計數器圖示 810:電源按鈕 812:顯示器 814:入口噴嘴 815:入口探針 816:取樣探針 817:取樣探針連接器 820:光源 821:發射之源光 822:偵測區域 823:向前散射之光 824:流動路徑 825:光路徑 826:聚焦透鏡 828:偵測器 830:粒子計數器偵測器 850:光源 851:發射之源光 852:粒子 853:反射之光線 854:基板 855:散射之光 856:聚焦透鏡 857:光學濾光片 858:偵測器 860:基板上粒子計數器偵測系統 1000:氣體封裝組裝件 1100:氣體封裝組裝件 1101:氣體封裝組裝件 1101-S1:第一氣體封裝組裝件區段 1101-S2:第二氣體封裝組裝件區段 1110:負載鎖定之入口腔室 1112:入口閘 1130:系統控制器 1200':前部面板組裝件 1220':前部基底面板組裝件 1240':前部壁面板組裝件 1242:開口 1260':前部頂板面板組裝件 1300':中間面板組裝件 1320:氣體封裝組裝件基底 1320':中間基底面板組裝件 1325':第一隔離器井面板 1327':第二隔離器井面板 1330':第一印刷頭管理系統輔助面板組裝件 1338':第一後壁面板組裝件 1340':第一中間封裝面板組裝件 1341':第一底面板組裝件 1342:第一印刷頭組裝件開口 1345:第一印刷頭組裝件銜接墊片 1360':中間壁及頂板面板組裝件 1365:第二通路 1367:第二密封件 1370':第二印刷頭管理系統輔助面板組裝件 1375:第二密封件支撐面板 1378:第二後壁框組裝件 1378':第二後壁面板組裝件 1380':第二中間封裝面板組裝件 1381':第二底面板組裝件 1382:第二印刷頭組裝件開口 1385:第二印刷頭組裝件銜接墊片 1400':後部面板組裝件 1420':後部基底面板組裝件 1440':後部壁面板組裝件 1460':後部頂板面板組裝件 1500:循環及過濾系統 1501:管道系統組裝件 1502:風扇過濾器單元組裝件 1505:頂板管道 1507:頂板管道 1509:入口管道系統組裝件 1510:前壁面板管道系統組裝件 1511:開口 1512:前壁面板入口管道 1514:第一前壁面板升流管 1515:出口 1516:第二前壁面板升流管 1517:出口 1520:左壁面板組裝件 1521:開口 1522:左壁面板入口管道 1524:左壁面板第一升流管 1525:第一管道入口端 1526:左壁面板第二升流管 1527:第二管道出口端 1528:左壁面板上部管道 1530:右壁面板組裝件 1531:開口 1532:右壁面板入口管道 1533:管道開口 1534:右壁面板第一升流管 1535:第一管道入口端 1536:右壁面板第二升流管 1537:第二管道出口端 1538:右壁面板上部管道 1540:後壁面板管道系統組裝件 1541:後壁面板第一入口 1542:後壁面板入口管道 1543:後壁面板第二入口 1544:後壁面板底部管道 1545:通風孔 1546:後壁面板上部管道 1547:第一隔壁 1549:第二隔壁 1551:風扇過濾器單元 1552:風扇過濾器單元 1553:風扇過濾器單元 1554:風扇過濾器單元 1555:風扇過濾器單元 1556:風扇過濾器單元 1562:第一熱交換器 1564:第二熱交換器 1566:第三熱交換器 1571:第一管道系統入口 1572:第二管道系統入口 1573:第一管道系統管路 1574:第二管道系統管路 1575:第一管道系統出口 1576:第二管道系統出口 1580:空間 1590:死空間 1605:返回管道 1610:插入面板 1630:右壁面板 1631:開口 1632:管道 1633:滑動蓋 1634:第一服務束管道進入口 1635:頂部 1636:第二服務束管道進入口 1637:上部部分 1640:後壁面板 2000:OLED印刷系統 2001:OLED噴墨印刷系統 2002:印刷系統 2003:印刷系統 2004:印刷系統 2050:基板 2100:印刷系統基底 2101:印刷系統基底 2110:第一隔離器組 2112:第二隔離器組 2120:第一升流管 2122:第二升流管 2130:橋接部 2132:第一側 2133:頂表面 2134:第二側 2200:基板浮動台 2210:地帶 2211:第一過渡地帶 2212:第二過渡地帶 2213:僅壓力地帶 2214:僅壓力地帶 2220:基板浮動台基底 2250:基板支撐裝置 2252:頂表面 2300:X,Z托架組裝件 2300A:第一托架組裝件 2300B:第二托架組裝件 2301:第一X軸托架組裝件 2302:第二X軸托架組裝件 2310:第一Z軸移動板 2310A:第一Z軸移動板 2310B:第二Z軸移動板 2312:第二Z軸移動板 2315:第一Z軸移動板 2320:線性空氣軸承系統 2330:空氣軸承圓盤 2332:第一圓盤 2334:第二圓盤 2336:第三圓盤 2338:第四圓盤 2340:線性馬達 2342:X, Z軸托架組裝件磁體軌道 2344:線性馬達繞組 2346:編碼器讀取頭 2351:第一Y軸軌道 2352:第二Y軸軌道 2355:Y軸運動組裝件 2360:軌系統 2400:服務束外殼排氣系統 2401:第一服務束載體伸展部 2402:服務束外殼頂表面 2404:服務束外殼底部側 2406:服務束外殼第一側 2407:第二服務束載體伸展部 2408:服務束外殼第二側 2410:服務束外殼 2411:第一服務束外殼開口 2412:第一組槽 2413:第二服務束外殼開口 2414:第二組槽 2415:服務束外殼第一端 2417:服務束外殼第二端 2420:服務束外殼排氣空間 2422:服務束外殼排氣空間第一管道 2424:服務束外殼排氣空間第二管道 2430:服務束載體 2500:印刷頭組裝件 2501:第一印刷頭組裝件 2502:第二印刷頭組裝件 2503:第一印刷頭組裝件封裝 2504:第二印刷頭組裝件封裝 2505:印刷頭 2530:把手 2536:末端執行器 2550:相機組裝件 2552:相機 2554:相機支架組裝件 2556:透鏡組裝件 2600:印刷頭組裝件排氣系統 2610:印刷頭組裝件排氣系統外殼 2612:印刷頭組裝件排氣系統第一管路 2614:印刷頭組裝件排氣系統第二管路 2616:過濾頭 2620:風扇 2622:風扇 2701:第一印刷頭管理系統 2702:第二印刷頭管理系統 2703:第一維護系統平台 2704:第二維護系統平台 2707:第一印刷頭管理系統裝置 2709:第一印刷頭管理系統裝置 2711:第一印刷頭管理系統裝置 2713:印刷頭替換模組 3000:加壓之惰性氣體再循環系統 3130:氣體淨化系統 3131:氣體淨化出口線路 3132:溶劑移除組件 3133:氣體淨化入口線路 3134:氣體淨化系統 3140:熱調節系統 3141:流體出口線路 3142:流體冷卻器 3143:冷卻器入口線路 3200:外部氣體迴路 3201:惰性氣體源 3202:第一機械閥 3203:清潔乾燥空氣(CDA)源 3204:第二機械閥 3206:第三機械閥 3208:第四機械閥 3210:室內惰性氣體線路 3212:低消耗歧管線路 3214:交叉線路第一區段 3215:低消耗歧管 3216:第一流動接合點 3218:第二流動接合點 3220:壓縮機惰性氣體線路 3222:CDA線路 3225:高消耗歧管 3226:第三流動接合點 3228:交叉線路第二區段 3230:閥 3250:壓縮機迴路 3252:氣體封裝組裝件出口 3254:線路 3256:閥 3258:止回閥 3260:壓力控制式旁路迴路 3261:第一旁路入口閥 3262:壓縮機 3263:第二閥 3264:第一積貯器 3266:後壓力調節器 3268:第二積貯器 3270:真空系統 3272:線路 3274:閥 3280:吹風機迴路 3282:外殼 3283:第一隔離閥 3284:第一吹風機 3285:止回閥 3286:可調整閥 3287:第二隔離閥 3288:熱交換器 3290:真空吹風機 3292:線路 3294:閥 V 1:閥 V 2:閥 V 3:閥 V 4:閥 10: Insert panel section 12: Frame 14: Blind threaded hole 15: Screw 16: Gasket 18: Compressible gasket 20: Window panel section 22: Frame 30: Panel section 32: Panel section frame 34: Window guide spacer 35: Window clip 36: Clamping clip 38: Compressible gasket 40: Top panel frame section 41: First side 42: Top panel frame beam 43: Second side 44: Top panel frame beam 45: First lighting element 46: Lighting element pair 47: Second lighting element 100: Gas encapsulated assembly 101: Gas encapsulated assembly 103: fan filter unit cover 105: first top plate frame duct 107: second top plate frame duct 109: metal sheet panel section 110: insert panel 120: window panel 122: panel frame 124: window 125: window panel 130: easily removable maintenance window 132: maintenance window frame 134: window 136: elbow clip 138: window handle 140: glove port 142: glove 200: frame component assembly 202: base 204: chassis 210: first wall frame 210': first wall panel 220 : Wall frame 220': Left wall panel 226: Top 227: Top wall frame partition 228: Bottom 229: Bottom wall frame partition 230: Third wall frame 230': Third wall panel 240: Wall frame 240': Rear wall panel 250: Top panel frame 250': Top panel panel 251: Inner portion 300: Sealing assembly 302: Gap 304: Gap 306: Gap 310: Wall frame 311: Inner side 312: Partition 314: Vertical side 315: Top surface 316: Partition 317: Inner Edge 320: First gasket 321: Vertical gasket length 323: Curved gasket length 325: Gasket length 340: Second gasket 345: Gasket length 350: Wall frame 353: Frame side 354: Vertical side 355: Top surface 356: Spacer 360: First gasket 361: Horizontal length 363: Curved length 365: Length 370: Top frame 500: Gas encapsulation system 501: Gas encapsulation system 502: Gas encapsulation system 503: Gas encapsulation system 504: Gas encapsulation system 50 5: Gas packaging system 506: Gas packaging system 507: Gas packaging system 508: Gas packaging system 509: Gas packaging system 510: Gas packaging system 511: Gas packaging system 512: Gas packaging system 800: Particle counter 800A: Particle counter icon 800B: Particle counter icon 800C: Particle counter icon 800D: Particle counter icon 810: Power button 812: Display 814: Inlet nozzle 815: Inlet probe 816: Sampling probe 81 7: Sampling probe connector 820: Light source 821: Emitted source light 822: Detection area 823: Forward scattered light 824: Flow path 825: Light path 826: Focusing lens 828: Detector 830: Particle counter detector 850: Light source 851: Emitted source light 852: Particle 853: Reflected light 854: Substrate 855: Scattered light 856: Focusing lens 857: Optical filter 858: Detector 860: Particle counter detection system on substrate 1000: Gas packaging Assembly 1100: Gas Encapsulation Assembly 1101: Gas Encapsulation Assembly 1101-S1: First Gas Encapsulation Assembly Section 1101-S2: Second Gas Encapsulation Assembly Section 1110: Load Locked Inlet Chamber 1112: Inlet Gate 1130: System Controller 1200': Front Panel Assembly 1220': Front Base Panel Assembly 1240': Front Wall Panel Assembly 1242: Opening 1260': Front Top Panel Assembly 1300': Middle Panel Assembly 13 20: Gas packaging assembly base 1320': Intermediate base panel assembly 1325': First isolator well panel 1327': Second isolator well panel 1330': First printhead management system auxiliary panel assembly 1338': First rear wall panel assembly 1340': First intermediate packaging panel assembly 1341': First bottom panel assembly 1342: First printhead assembly opening 1345: First printhead assembly joint pad 1360': Intermediate wall and top panel assembly 1365: Second passage 1367: second seal 1370': second printhead management system auxiliary panel assembly 1375: second seal support panel 1378: second rear wall frame assembly 1378': second rear wall panel assembly 1380': second intermediate packaging panel assembly 1381': second bottom panel assembly 1382: second printhead assembly opening 1385: second printhead assembly joint pad 1400': rear panel assembly 1420': rear base panel assembly 1440': rear 1460': Rear top panel assembly 1500: Circulation and filter system 1501: Duct system assembly 1502: Fan filter unit assembly 1505: Top duct 1507: Top duct 1509: Inlet duct system assembly 1510: Front panel duct system assembly 1511: Opening 1512: Front panel inlet duct 1514: First front panel riser 1515: Outlet 1516: Second front panel riser 1517: Outlet 1520: Left Wall panel assembly 1521: opening 1522: left wall panel inlet pipe 1524: left wall panel first riser pipe 1525: first pipe inlet end 1526: left wall panel second riser pipe 1527: second pipe outlet end 1528: left wall panel upper pipe 1530: right wall panel assembly 1531: opening 1532: right wall panel inlet pipe 1533: pipe opening 1534: right wall panel first riser pipe 1535: first pipe inlet end 1536: right wall panel second riser pipe 1537 : Second duct outlet 1538: Right wall panel upper duct 1540: Rear wall panel duct system assembly 1541: Rear wall panel first inlet 1542: Rear wall panel inlet duct 1543: Rear wall panel second inlet 1544: Rear wall panel bottom duct 1545: Ventilation hole 1546: Rear wall panel upper duct 1547: First partition wall 1549: Second partition wall 1551: Fan filter unit 1552: Fan filter unit 1553: Fan filter unit 1554: Fan filter unit 1 555: fan filter unit 1556: fan filter unit 1562: first heat exchanger 1564: second heat exchanger 1566: third heat exchanger 1571: first duct system inlet 1572: second duct system inlet 1573: first duct system pipeline 1574: second duct system pipeline 1575: first duct system outlet 1576: second duct system outlet 1580: space 1590: dead space 1605: return duct 1610: insert panel 1630: right wall panel 1631: opening 1632: duct 1633: sliding cover 1634: first service bundle duct inlet 1635: top 1636: second service bundle duct inlet 1637: upper portion 1640: rear wall panel 2000: OLED printing system 2001: OLED inkjet printing system 2002: printing system 2003: printing system 2004: printing system 2050: substrate 2100: printing system substrate 2101: printing system substrate 2110: first isolator set 2112: Second isolator set 2120: first riser 2122: second riser 2130: bridge 2132: first side 2133: top surface 2134: second side 2200: substrate floating platform 2210: zone 2211: first transition zone 2212: second transition zone 2213: pressure-only zone 2214: pressure-only zone 2220: substrate floating platform base 2250: substrate support device 2252: top surface 2300: X, Z bracket assembly 2300A: first bracket assembly 23 00B: second bracket assembly 2301: first X-axis bracket assembly 2302: second X-axis bracket assembly 2310: first Z-axis moving plate 2310A: first Z-axis moving plate 2310B: second Z-axis moving plate 2312: second Z-axis moving plate 2315: first Z-axis moving plate 2320: linear air bearing system 2330: air bearing disc 2332: first disc 2334: second disc 2336: third disc 2338: fourth disc 2340: linear motor 2342: X, Z-axis bracket assembly magnet track 2344: linear motor winding 2346: encoder reading head 2351: first Y-axis track 2352: second Y-axis track 2355: Y-axis motion assembly 2360: track system 2400: service beam housing exhaust system 2401: first service beam carrier extension 2402: service beam housing top surface 2404: service beam housing bottom side 2406: service beam housing first side 2407: second service beam Bundle carrier extension 2408: second side of service bundle housing 2410: service bundle housing 2411: first service bundle housing opening 2412: first set of slots 2413: second service bundle housing opening 2414: second set of slots 2415: first end of service bundle housing 2417: second end of service bundle housing 2420: exhaust space of service bundle housing 2422: first duct of exhaust space of service bundle housing 2424: second duct of exhaust space of service bundle housing 24 30: Service bundle carrier 2500: Print head assembly 2501: First print head assembly 2502: Second print head assembly 2503: First print head assembly package 2504: Second print head assembly package 2505: Print head 2530: Handle 2536: End effector 2550: Camera assembly 2552: Camera 2554: Camera bracket assembly 2556: Lens assembly 2600: Print head assembly exhaust System 2610: Print head assembly exhaust system housing 2612: Print head assembly exhaust system first pipeline 2614: Print head assembly exhaust system second pipeline 2616: Filter head 2620: Fan 2622: Fan 2701: First print head management system 2702: Second print head management system 2703: First maintenance system platform 2704: Second maintenance system platform 2707: First print head management system device 2709 :First print head management system device 2711:First print head management system device 2713:Print head replacement module 3000:Pressurized inert gas recirculation system 3130:Gas purification system 3131:Gas purification outlet line 3132:Solvent removal assembly 3133:Gas purification inlet line 3134:Gas purification system 3140:Heat regulation system 3141:Fluid outlet line 3142:Fluid cooler 3143: Cooler inlet line 3200: External gas loop 3201: Inert gas source 3202: First mechanical valve 3203: Clean dry air (CDA) source 3204: Second mechanical valve 3206: Third mechanical valve 3208: Fourth mechanical valve 3210: Indoor inert gas line 3212: Low consumption manifold line 3214: Crossover line first section 3215: Low consumption manifold 3216: First flow junction 3218: Second flow Dynamic junction 3220: Compressor inert gas line 3222: CDA line 3225: High consumption manifold 3226: Third flow junction 3228: Crossover line second section 3230: Valve 3250: Compressor loop 3252: Gas packaging assembly outlet 3254: Line 3256: Valve 3258: Check valve 3260: Pressure controlled bypass loop 3261: First bypass inlet valve 3262: Compressor 3263: Second valve 3264: First accumulator 3266: Rear pressure regulator 3268: Second accumulator 3270: Vacuum system 3272: Line 3274: Valve 3280: Blower circuit 3282: Housing 3283: First isolation valve 3284: First blower 3285: Check valve 3286: Adjustable valve 3287: Second isolation valve 3288: Heat exchanger 3290: Vacuum blower 3292: Line 3294: Valve V 1 : Valve V 2 : Valve V 3 : Valve V 4 : Valve

將藉由參看隨附圖式獲得本發明之特徵及優勢之更好理解,隨附圖式意欲說明(不限制)本教示。 [圖1]為根據本教示之各種具體實例的氣體封裝組裝件之右前部透視圖。 [圖2]描繪根據本教示之各種具體實例的氣體封裝組裝件之分解圖。 [圖3]為根據本教示之各種具體實例的描繪各種面板框區段及區段面板之框構件組裝件之分解前部透視圖。 [圖4]A至圖4C為用於形成接頭的墊片密封之各種具體實例之頂部示意圖。 [圖5]A及圖5B為描繪根據本教示之氣體封裝組裝件之各種具體實例的框構件之密封之各種透視圖。 [圖6]A及圖6B為係關於根據本教示之氣體封裝組裝件之各種具體實例的用於收納可易於移除之保養窗的區段面板之密封之各種視圖。 [圖7]A及圖7B為係關於根據本教示之各種具體實例的用於收納插入面板或窗面板之區段面板之密封之擴大透視剖視圖。 [圖8]為包括用於根據本教示之氣體封裝系統之各種具體實例的照明系統之頂板之視圖。 [圖9]為根據本教示之各種具體實例的氣體封裝組裝件之前部透視圖。 [圖10]A描繪根據本教示之各種具體實例的如在圖9中所描繪之氣體封裝組裝件及有關印刷之各種具體實例之分解圖。圖10B描繪圖10A中描繪的印刷系統之擴大等角透視圖。圖10C展示圖10A中描繪的輔助封裝之擴大等角透視圖。 [圖11]描繪根據本教示之各種具體實例的浮動台之透視圖。 [圖12]為本教示之氣體封裝組裝件及有關系統組件之各種具體實例之示意圖。 [圖13]為本教示之氣體封裝組裝件及有關系統組件之各種具體實例之示意圖。 [圖14]為根據本教示之各種具體實例的氣體封裝系統之示意圖。 [圖15]為根據本教示之各種具體實例的氣體封裝系統之示意圖。 [圖16]為根據本教示之各種具體實例的氣體封裝組裝件之幻象前部透視圖,其描繪裝設於氣體封裝組裝件之內部中的管道系統。 [圖17]為根據本教示之各種具體實例的氣體封裝組裝件之幻象頂部透視圖,其描繪裝設於氣體封裝組裝件之內部中的管道系統。 [圖18]為根據本教示之各種具體實例的氣體封裝組裝件之幻象底部透視圖,其描繪裝設於氣體封裝組裝件之內部中的管道系統。 [圖19]A為展示根據本教示之各種具體實例的服務束之示意性表示。圖19B描繪氣體掃過經由根據本教示的管道系統之各種具體實例饋入的服務束。 [圖20]為示意性表示,其展示如何由於惰性氣體(B)掃過束被排線穿過之管道而有效地淨化堵塞於服務束之死空間中的反應性物質(A)。 [圖21]A為根據本教示之氣體封裝系統之各種具體實例的經排線穿過管道系統之纜線及管系之幻象透視圖。圖21B為根據本教示之氣體封裝系統之各種具體實例的在圖21A中展示的開口之展開圖,其展示用於在開口上閉合的蓋之細節。 [圖22]為根據本教示之各種具體實例的描繪經由氣體封裝組裝件之氣體循環之一具體實例的氣體封裝系統之示意性側剖視圖。 [圖23]為根據本教示之各種具體實例的描繪經由氣體封裝組裝件之氣體循環之一具體實例的氣體封裝系統之示意性側剖視圖。 [圖24]為根據本教示之各種具體實例的描繪經由氣體封裝組裝件之氣體循環之一具體實例的氣體封裝之示意性前剖視圖。 [圖25]為根據本教示之各種具體實例的具有系統組件之氣體封裝組裝件之橫截面示意圖。 [圖26]為描繪本教示之粒子控制系統之各種具體實例的印刷系統之透視圖,該印刷系統可包括低粒X軸運動系統及服務束外殼排氣系統。 [圖27]A及圖27B為根據本教示之各種具體實例的低粒X軸運動系統之剖視圖。 [圖28]A及圖28B為根據本教示之各種具體實例的用於印刷系統之服務束外殼排氣系統之各種透視圖。 [圖29]A為根據本教示之各種具體實例的服務束外殼排氣系統之示意圖。圖29B、圖29C及圖29D為根據本教示之各種具體實例的使服務束外殼通風之各種具體實例之示意圖。 [圖30]A及圖30B為根據本教示之各種具體實例的描繪在氣體封裝組裝件中之印刷頭組裝件周圍的氣體循環及粒子收集之一具體實例的氣體封裝系統之示意圖。 [圖31]A及圖31B為根據本教示之各種具體實例的描繪在氣體封裝組裝件中之印刷頭組裝件周圍的氣體循環及粒子收集之一具體實例的氣體封裝系統之示意圖。 [圖32]A及圖32B為根據本教示之各種具體實例的描繪在氣體封裝組裝件中之印刷頭組裝件周圍的氣體循環及粒子收集之一具體實例的氣體封裝系統之示意圖。 [圖33]為根據本教示的攜帶型空中粒子計數器件之一具體實例。 [圖34]為基於電磁輻射之散射的各種攜帶型空中粒子計數器件之操作原理之示意性表示。 [圖35]為描繪攜帶型空中粒子計數器件可在本教示之各種印刷系統中位於的各種區域之示意性表示。 [圖36]為根據本教示之各種具體實例的位置最接近基板支撐裝置的攜帶型空中粒子計數器件之等角透視圖。 [圖37]A及圖37B為描繪在本教示之氣體封裝系統之各種具體實例中的粒子計數之長期測試結果之曲線圖。 [圖38]為描繪在氣體封裝系統窗打開前及後的粒子計數之回收測試結果之曲線圖。 [圖39]為用於基於電磁輻射之散射的基板上粒子偵測的各種粒子偵測器件之操作原理之示意性表示。 [圖40]為根據本教示之各種具體實例的最接近印刷區域之測試基板之置放之等角透視圖。 [圖41]為根據本教示之各種具體實例的最接近裝備有相機之印刷系統中的印刷區域之基板之置放之等角透視圖。 A better understanding of the features and advantages of the present invention will be obtained by referring to the accompanying drawings, which are intended to illustrate (not limit) the present teachings. [FIG. 1] is a right front perspective view of a gas encapsulation assembly according to various specific examples of the present teachings. [FIG. 2] depicts an exploded view of a gas encapsulation assembly according to various specific examples of the present teachings. [FIG. 3] is an exploded front perspective view of a frame member assembly depicting various panel frame sections and section panels according to various specific examples of the present teachings. [FIG. 4] A to 4C are top schematic views of various specific examples of gasket seals for forming joints. [FIG. 5] A and 5B are various perspective views depicting the sealing of frame members according to various specific examples of gas encapsulation assemblies according to the present teachings. [FIG. 6] A and 6B are various views of the sealing of segment panels for receiving easily removable maintenance windows according to various specific examples of gas encapsulation assemblies according to the present teachings. [FIG. 7] A and 7B are enlarged perspective cross-sectional views of the sealing of segment panels for receiving insert panels or window panels according to various specific examples of the present teachings. [FIG. 8] is a view of a top panel of a lighting system including various specific examples of gas encapsulation systems according to the present teachings. [FIG. 9] is a front perspective view of a gas encapsulation assembly according to various specific examples of the present teachings. [FIG. 10]A depicts an exploded view of a gas packaging assembly as depicted in FIG. 9 and various specific examples of related printing according to various specific examples of the present teachings. FIG. 10B depicts an enlarged isometric perspective view of the printing system depicted in FIG. 10A. FIG. 10C shows an enlarged isometric perspective view of the auxiliary package depicted in FIG. 10A. [FIG. 11] Describes a perspective view of a floating table according to various specific examples of the present teachings. [FIG. 12] is a schematic diagram of various specific examples of the gas packaging assembly and related system components of the present teachings. [FIG. 13] is a schematic diagram of various specific examples of the gas packaging assembly and related system components of the present teachings. [FIG. 14] is a schematic diagram of a gas packaging system according to various specific examples of the present teachings. [Figure 15] is a schematic diagram of a gas packaging system according to various specific examples of the present teachings. [Figure 16] is a phantom front perspective view of a gas packaging assembly according to various specific examples of the present teachings, which depicts a piping system installed in the interior of the gas packaging assembly. [Figure 17] is a phantom top perspective view of a gas packaging assembly according to various specific examples of the present teachings, which depicts a piping system installed in the interior of the gas packaging assembly. [Figure 18] is a phantom bottom perspective view of a gas packaging assembly according to various specific examples of the present teachings, which depicts a piping system installed in the interior of the gas packaging assembly. [Figure 19] A is a schematic representation showing a service bundle according to various specific examples of the present teachings. FIG. 19B depicts a gas sweep through a service bundle fed through various embodiments of a conduit system according to the present teachings. [FIG. 20] is a schematic representation showing how reactive material (A) clogged in the dead space of a service bundle is effectively purged as an inert gas (B) sweeps through the conduit through which the bundle is wired. [FIG. 21] A is a phantom perspective view of cables and tubing wired through a conduit system according to various embodiments of a gas packaging system according to the present teachings. FIG. 21B is an expanded view of the opening shown in FIG. 21A of various embodiments of a gas packaging system according to the present teachings showing details of a cover for closing over the opening. [FIG. 22] is a schematic side sectional view of a gas packaging system according to various specific examples of the present teachings, depicting a specific example of gas circulation through a gas packaging assembly. [FIG. 23] is a schematic side sectional view of a gas packaging system according to various specific examples of the present teachings, depicting a specific example of gas circulation through a gas packaging assembly. [FIG. 24] is a schematic front sectional view of a gas packaging according to various specific examples of the present teachings, depicting a specific example of gas circulation through a gas packaging assembly. [FIG. 25] is a schematic cross-sectional view of a gas packaging assembly with system components according to various specific examples of the present teachings. [FIG. 26] is a perspective view of a printing system depicting various specific examples of the particle control system of the present teaching, which printing system may include a low-particle X-axis motion system and a service bundle housing exhaust system. [FIG. 27] A and FIG. 27B are cross-sectional views of a low-particle X-axis motion system according to various specific examples of the present teaching. [FIG. 28] A and FIG. 28B are various perspective views of a service bundle housing exhaust system for a printing system according to various specific examples of the present teaching. [FIG. 29] A is a schematic view of a service bundle housing exhaust system according to various specific examples of the present teaching. FIG. 29B, FIG. 29C, and FIG. 29D are schematic views of various specific examples of ventilating a service bundle housing according to various specific examples of the present teaching. [Figure 30] A and Figure 30B are schematic diagrams of a gas packaging system according to various specific examples of the present teachings, which is a specific example of gas circulation and particle collection around a print head assembly in a gas packaging assembly. [Figure 31] A and Figure 31B are schematic diagrams of a gas packaging system according to various specific examples of the present teachings, which is a specific example of gas circulation and particle collection around a print head assembly in a gas packaging assembly. [Figure 32] A and Figure 32B are schematic diagrams of a gas packaging system according to various specific examples of the present teachings, which is a specific example of gas circulation and particle collection around a print head assembly in a gas packaging assembly. [Figure 33] is a specific example of a portable airborne particle counting device according to the present teachings. [FIG. 34] is a schematic representation of the operating principle of various portable airborne particle counting devices based on the scattering of electromagnetic radiation. [FIG. 35] is a schematic representation depicting various areas where portable airborne particle counting devices may be located in various printing systems of the present teachings. [FIG. 36] is an isometric perspective view of a portable airborne particle counting device located closest to a substrate support device according to various specific examples of the present teachings. [FIG. 37]A and FIG. 37B are graphs depicting long-term test results of particle counts in various specific examples of gas packaging systems of the present teachings. [FIG. 38] is a graph depicting recovery test results of particle counts before and after the gas packaging system window is opened. [FIG. 39] is a schematic representation of the operating principle of various particle detection devices for particle detection on a substrate based on scattering of electromagnetic radiation. [FIG. 40] is an isometric perspective view of the placement of a test substrate closest to a printing area according to various specific examples of the present teachings. [FIG. 41] is an isometric perspective view of the placement of a substrate closest to a printing area in a printing system equipped with a camera according to various specific examples of the present teachings.

100:氣體封裝組裝件 100: Gas packaging assembly

103:風扇過濾器單元蓋 103: Fan filter unit cover

105:第一頂板框管道 105: First top plate frame pipeline

107:第二頂板框管道 107: Second top plate frame pipe

109:金屬薄片面板區段 109: Metal sheet panel section

110:插入面板 110: Insert panel

120:窗面板 120: Window panel

130:可易於移除之保養窗 130: Easily removable maintenance window

140:手套端口 140: Glove port

142:手套 142: Gloves

204:底盤 204: Chassis

210:第一壁框 210: First wall frame

210':第一壁面板 210': First wall panel

230:第三壁框 230: Third wall frame

230':第三壁面板 230': Third wall panel

250:頂板框 250: Top frame

250':頂板面板 250': Roof panel

Claims (20)

一種氣體封裝系統,其包含:一氣體封裝,其界定一內部,該氣體封裝經組態以在該內部中維持一受控制氣體環境;一印刷系統,其安置於該氣體封裝之該內部中;一基板支撐裝置,其安置於該氣體封裝之該內部內;及一氣體循環系統,其可操作地耦接至該氣體封裝,該氣體循環系統包含:一氣體移動器件,其經安置以使氣體在該氣體封裝之該內部內沿著從該印刷系統上方往下朝向該基板支撐裝置之一路徑流動;及複數個管道系統組裝件,其安置於該氣體封裝之該內部內且與該氣體移動器件流動連通,各管道系統組裝件包含流體耦接至至少一升流管的一入口管道,以於該氣體封裝之該內部內沿著其一周邊使來自最接近該基板支撐裝置的氣體再循環,且返回至該氣體移動器件。 A gas packaging system, comprising: a gas package defining an interior, the gas package being configured to maintain a controlled gas environment in the interior; a printing system disposed in the interior of the gas package; a substrate support device disposed in the interior of the gas package; and a gas circulation system operably coupled to the gas package, the gas circulation system comprising: a gas moving device disposed to move gas in the gas package. The gas moves along a path from the top of the printing system downward toward the substrate support device within the interior of the gas package; and a plurality of pipeline system assemblies disposed within the interior of the gas package and in fluid communication with the gas moving device, each pipeline system assembly comprising an inlet pipe coupled to at least one riser pipe to recirculate the gas from the closest substrate support device along its periphery within the interior of the gas package and return it to the gas moving device. 如請求項1之氣體封裝系統,其進一步包含該氣體移動器件下游之一顆粒過濾器器件。 A gas packaging system as claimed in claim 1, further comprising a particle filter device downstream of the gas moving device. 如請求項1之氣體封裝系統,其進一步包含與該氣體封裝流動連通之一氣體淨化系統,以提供經淨化氣體至該氣體封裝之該內部。 The gas packaging system of claim 1 further comprises a gas purification system fluidly connected to the gas packaging to provide purified gas to the interior of the gas packaging. 如請求項1之氣體封裝系統,其進一步包含與該氣體循環系統熱連通之一熱調節系統。 The gas packaging system of claim 1 further comprises a thermal regulation system thermally connected to the gas circulation system. 如請求項4之氣體封裝系統,其中該熱調節系統包含一熱交換器與一流體冷卻器中之至少一者。 A gas packaging system as claimed in claim 4, wherein the thermal regulation system includes at least one of a heat exchanger and a fluid cooler. 如請求項1之氣體封裝系統,其中該氣體循環系統經組態以提供該氣體封裝中之該氣體之一層流。 A gas packaging system as claimed in claim 1, wherein the gas circulation system is configured to provide a laminar flow of the gas in the gas packaging. 如請求項1之氣體封裝系統,其中該氣體移動器件為一風扇。 A gas packaging system as claimed in claim 1, wherein the gas moving device is a fan. 如請求項1之氣體封裝系統,其中該印刷系統包含:一橋接部,其延伸跨越該基板支撐裝置;一托架組裝件,其可移動地安裝至該橋接部,該托架組裝件可在一X軸方向上沿著該橋接部移動;複數個空氣軸承,其提供該托架組裝件與該橋接部之間的一軸承表面;及一印刷頭,其耦接至該托架組裝件。 A gas packaging system as claimed in claim 1, wherein the printing system comprises: a bridge portion extending across the substrate support device; a bracket assembly movably mounted to the bridge portion, the bracket assembly being movable along the bridge portion in an X-axis direction; a plurality of air bearings providing a bearing surface between the bracket assembly and the bridge portion; and a printing head coupled to the bracket assembly. 如請求項8之氣體封裝系統,其進一步包含耦接至該托架組裝件之一Z軸運動板,該印刷頭安裝至該Z軸運動板。 The gas packaging system of claim 8 further comprises a Z-axis motion plate coupled to the bracket assembly, and the print head is mounted on the Z-axis motion plate. 如請求項8之氣體封裝系統,其進一步包含可操作地耦接至該托架組裝件之一無刷線性馬達,以沿著該橋接部移動該托架組裝件。 The gas packaging system of claim 8, further comprising a brushless linear motor operably coupled to the bracket assembly to move the bracket assembly along the bridge portion. 如請求項8之氣體封裝系統,其進一步包含經組態以在一Y軸方向上移動該基板支撐裝置之一Y軸運動系統。 The gas packaging system of claim 8 further comprises a Y-axis motion system configured to move the substrate support device in a Y-axis direction. 如請求項1之氣體封裝系統,其進一步包含:一排氣外殼,其封裝該印刷系統之一印刷頭組裝件;及一過濾器,其與該排氣外殼流動連通。 The gas packaging system of claim 1 further comprises: an exhaust housing that encapsulates a print head assembly of the printing system; and a filter that is fluidly connected to the exhaust housing. 如請求項12之氣體封裝系統,其進一步包含另一氣體移動器件,其經定位以使該氣體從該排氣外殼移動通過一服務束管道系統,該服務束管道系統排線該印刷頭組裝件之一服務束。 The gas packaging system of claim 12, further comprising another gas moving device positioned to move the gas from the exhaust housing through a service bundle duct system, the service bundle duct system wiring a service bundle of the print head assembly. 如請求項1之氣體封裝系統,其中該印刷系統包含一噴墨印刷組裝件。 A gas packaging system as claimed in claim 1, wherein the printing system comprises an inkjet printing assembly. 如請求項1之氣體封裝系統,其中該印刷系統經組態以在由該基板支撐裝置支撐之一基板的一表面上沉積有機材料。 A gas packaging system as claimed in claim 1, wherein the printing system is configured to deposit an organic material on a surface of a substrate supported by the substrate support device. 一種氣體封裝系統,其包含:一氣體封裝,其界定一內部,該氣體封裝經組態以在該內部中維持一受控 制氣體環境;一印刷系統,其安置於該氣體封裝之該內部中;一基板支撐裝置,其安置於該氣體封裝之該內部內;及一氣體循環系統,其可操作地耦接至該氣體封裝,該氣體循環系統包含:一氣體移動器件,其經安置以使氣體在該氣體封裝之該內部內沿著從該印刷系統上方往下朝向該基板支撐裝置之一路徑流動;及複數個管道系統組裝件,其安置於該氣體封裝之該內部內且與該氣體移動器件流動連通,各管道系統組裝件包含位於該氣體封裝之該內部之一周邊處且流體耦接至至少一升流管的一入口管道,以於該氣體封裝之該內部內沿著其該周邊使來自最接近該基板支撐裝置的氣體再循環,且返回至該氣體移動器件。 A gas packaging system, comprising: a gas package defining an interior, the gas package being configured to maintain a controlled gas environment in the interior; a printing system disposed in the interior of the gas package; a substrate support device disposed in the interior of the gas package; and a gas circulation system operably coupled to the gas package, the gas circulation system comprising: a gas moving device disposed to move gas in the interior of the gas package along a path from The printing system flows in a path from top to bottom toward the substrate support device; and a plurality of pipeline system assemblies disposed in the interior of the gas package and in fluid communication with the gas moving device, each pipeline system assembly comprising an inlet pipe located at a periphery of the interior of the gas package and fluidly coupled to at least one riser pipe, so as to recirculate the gas from the closest substrate support device along the periphery in the interior of the gas package and return it to the gas moving device. 如請求項16之氣體封裝系統,其進一步包含用於該氣體移動器件之一蓋,該蓋包含一氣體入口及一氣體出口,用於使惰性氣體循環至一氣體淨化系統。 The gas packaging system of claim 16 further comprises a cover for the gas moving device, the cover comprising a gas inlet and a gas outlet for circulating the inert gas to a gas purification system. 如請求項16之氣體封裝系統,其中該複數個管道系統組裝件中之各管道系統組裝件附接至該氣體封裝之一內部壁。 A gas enclosure system as claimed in claim 16, wherein each of the plurality of duct system assemblies is attached to an inner wall of the gas enclosure. 如請求項18之氣體封裝系統,其中複數個管道系統組裝件之至少一管道系統組裝件收容一服務束於該至少一管道系統組裝件之一內部中。 A gas packaging system as claimed in claim 18, wherein at least one of the plurality of piping system assemblies houses a service bundle within an interior of the at least one piping system assembly. 如請求項16之氣體封裝系統,其中各入口管道具有沿著其一底部表面之複數個開口。A gas packaging system as in claim 16, wherein each inlet conduit has a plurality of openings along a bottom surface thereof.
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US14/205,340 2014-03-11
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US14/205,340 US9604245B2 (en) 2008-06-13 2014-03-11 Gas enclosure systems and methods utilizing an auxiliary enclosure
US201461983417P 2014-04-23 2014-04-23
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