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TWI881107B - Ni PASTE, LAMINATED CERAMIC CAPACITOR, AND METHOD OF FORMING DIFFUSION REGION IN LAMINATED CERAMIC CAPACITOR - Google Patents

Ni PASTE, LAMINATED CERAMIC CAPACITOR, AND METHOD OF FORMING DIFFUSION REGION IN LAMINATED CERAMIC CAPACITOR Download PDF

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TWI881107B
TWI881107B TW110113028A TW110113028A TWI881107B TW I881107 B TWI881107 B TW I881107B TW 110113028 A TW110113028 A TW 110113028A TW 110113028 A TW110113028 A TW 110113028A TW I881107 B TWI881107 B TW I881107B
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TW202147346A (en
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岡村寛志
立野隼人
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日商昭榮化學工業股份有限公司
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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    • C04B35/465Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
    • C04B35/468Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
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    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors

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Abstract

A Ni paste contains: (A) conductive powder a main component of which is Ni; (B) binder resin; (C) organic solvent; and at least one substance selected from the group consisting of (D1) an additive containing Ta in a range of 0.025 to 2.50 parts by mass in terms of Ta 2O 5per 100.0 parts by mass of (A) the conductive powder a main component of which is Ni, (D2) an additive containing Nb in a range of 0.010 to 1.80 parts by mass in terms of Nb 2O 5per 100.0 parts by mass of (A) the conductive powder a main component of which is Ni, (D3) stabilized zirconia (SZ) with a zirconia crystal structure stabilized by a stabilizer in a range of 0.05 10 -2to 2.20 10 -2moles per 100g of (A) the conductive powder a main component of which is Ni, and (D4) an additive containing Al in the range of 0.10 to 5.50 parts by mass in terms of Al 2O 3per 100.0 parts by mass of (A) the conductive powder a main component of which is Ni. With the present invention, it is possible to provide a Ni paste for an inner electrode that can improve high-temperature load lifetime without decreasing continuity of an electrode film.

Description

Ni糊膏及積層陶瓷電容器、暨積層陶瓷電容器中擴散區域之形成方法Ni paste and multilayer ceramic capacitor, and method for forming diffusion region in multilayer ceramic capacitor

本發明係關於供製造高可靠性積層陶瓷電容器的內部電極形成用等Ni糊膏、以及使用其製造的積層陶瓷電容器。 The present invention relates to a Ni paste for forming internal electrodes for manufacturing high-reliability multilayer ceramic capacitors, and a multilayer ceramic capacitor manufactured using the same.

近年隨電子技術的發展,更加提高對積層陶瓷電容器的小型化與大容量化要求。為滿足該等要求,構成積層陶瓷電容器的介電質層正朝薄層化演進。但是,若將介電質層薄層化,則對每1層施加的電場強度便相對性提高。所以,要求提升電壓施加時的可靠性。 In recent years, with the development of electronic technology, the demand for miniaturization and high capacity of multilayer ceramic capacitors has increased. In order to meet these requirements, the dielectric layers that constitute multilayer ceramic capacitors are evolving towards thinning. However, if the dielectric layers are thinned, the electric field strength applied to each layer will increase relatively. Therefore, it is required to improve the reliability when voltage is applied.

此處,積層陶瓷電容器一般係依如下述製造。首先,使介電質陶瓷原料粉末分散於樹脂黏合劑中,於經薄片化的陶瓷胚片上,將以含有導電性粉末與視所需陶瓷粉末等無機粉末、樹脂黏合劑及溶劑為主成分的內部電極用導電性糊膏印刷成既定圖案,經乾燥除去溶劑,便形成內部電極乾燥膜。接著,將具有所獲得內部電極乾燥膜的陶瓷片重疊複數片,經壓黏形成積層體,再裁剪為既定形狀後,依高溫施行煅燒而獲得陶瓷基體。然後,在陶瓷基體的二端面塗佈外部電極用導電性糊膏後,施行煅燒獲得積層陶瓷電容器。另外,外部電極係在未煅燒的積 層體上塗佈外部電極用糊膏,亦可與陶瓷基體同時施行煅燒。所以,已知有內部電極係使用以Ni為主成分者(例如專利文獻1)。 Here, the laminated ceramic capacitor is generally manufactured as follows. First, the dielectric ceramic raw material powder is dispersed in a resin binder, and the conductive paste for the internal electrode, which mainly contains conductive powder and inorganic powder such as ceramic powder, resin binder and solvent, is printed into a predetermined pattern on the thinned ceramic green sheet, and the solvent is removed by drying to form an internal electrode dry film. Then, a plurality of ceramic sheets with the obtained internal electrode dry film are stacked, pressed and bonded to form a laminate, and then cut into a predetermined shape and calcined at a high temperature to obtain a ceramic matrix. Then, after applying the conductive paste for the external electrode to both end surfaces of the ceramic substrate, the ceramic substrate is calcined to obtain a laminated ceramic capacitor. In addition, the external electrode is applied to the uncalcined laminate, and the external electrode paste can also be calcined at the same time as the ceramic substrate. Therefore, it is known that the internal electrode uses Ni as the main component (for example, Patent Document 1).

當內部電極係使用以Ni為主成分,製造積層陶瓷電容器時,為防止Ni的氧化,必需在還原環境中施行煅燒,此時介電質層會遭導入氧空孔,此情況將成為引發高溫負載壽命降低的問題。 When the internal electrode uses Ni as the main component to manufacture a multilayer ceramic capacitor, in order to prevent Ni oxidation, it must be calcined in a reducing environment. At this time, oxygen vacancies will be introduced into the dielectric layer, which will become a problem that causes a decrease in high-temperature load life.

所以,專利文獻2有記載:藉由使用Sn固溶於Ni中的內部電極,使介電質層與電極層界面的電子屏障高度變化,而欲達成高溫負載壽命的發明。 Therefore, Patent Document 2 states: By using an internal electrode in which Sn is solid-dissolved in Ni, the electron barrier height at the interface between the dielectric layer and the electrode layer is changed, thereby achieving an invention that increases the high-temperature load life.

[先前技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2001-101926 [Patent document 1] Japanese Patent Publication No. 2001-101926

[專利文獻2]WO2012/111592 [Patent Document 2] WO2012/111592

然而,若在Ni中固溶Sn,則Ni的熔點會降低而促進燒結,因而在煅燒時容易在電極層各處引起成球(ball-up),導致電極膜的連續性降低。而,電極膜的連續性降低會導致電容器的容量降低。 However, if Sn is dissolved in Ni, the melting point of Ni will be lowered and sintering will be accelerated. Therefore, ball-up will easily occur throughout the electrode layer during sintering, resulting in a decrease in the continuity of the electrode film. However, the reduced continuity of the electrode film will lead to a reduced capacity of the capacitor.

緣是,本發明目的在於提供:不致使電極膜的連續性降低、能提升高溫負載壽命的內部電極用Ni糊膏。又,本發明目的在於提供:即使施行介電質層更加薄層化及施加高電場強度電壓,仍可呈現優異可靠性的積層陶瓷電容器。 Therefore, the purpose of the present invention is to provide a Ni paste for internal electrodes that can improve the high-temperature load life without reducing the continuity of the electrode film. In addition, the purpose of the present invention is to provide a multilayer ceramic capacitor that can still show excellent reliability even if the dielectric layer is thinner and a high electric field strength voltage is applied.

本發明者等為解決上述課題經深入鑽研,結果發現:藉由在(A)主要含有Ni的導電性粉末之內部電極用Ni糊膏中,相對於(A)主要為Ni的導電性粉末,依既定比例含有從(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑所構成群組中選擇至少1種,可不致使電極膜的連續性降低、能提升高溫負載壽命,遂完成本發明。 The inventors of the present invention have conducted in-depth research to solve the above-mentioned problem and have found that by adding at least one selected from the group consisting of (D1) Ta-containing additives, (D2) Nb-containing additives, (D3) stabilized zirconia (SZ), and (D4) Al-containing additives to the Ni paste for internal electrodes containing (A) conductive powder mainly containing Ni in a predetermined ratio relative to (A) conductive powder mainly containing Ni, the continuity of the electrode film can be prevented from being reduced and the high-temperature load life can be improved, thereby completing the present invention.

即,本發明(1)所提供的Ni糊膏,係含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、及(C)有機溶劑;更進一步含有從下述所構成群組中選擇至少1種:(D1)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Ta2O5換算0.025~2.50質量份範圍內之Ta的添加劑;(D2)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Nb2O5換算0.010~1.80質量份範圍內之Nb的添加劑;(D3)相對於上述(A)主要為Ni的導電性粉末100g,含有依0.05×10-2~2.20×10-2莫耳範圍內、經利用安定化劑使二氧化鋯結晶構造安定化的安定化二氧化鋯(SZ);及(D4)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Al2O3換算0.10~5.50質量份範圍內之Al的添加劑。 That is, the Ni paste provided by the present invention (1) comprises: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent; and further comprises at least one selected from the following group: (D1) an additive containing 0.025 to 2.50 parts by mass of Ta in terms of Ta2O5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni (A); (D2) an additive containing 0.010 to 1.80 parts by mass of Nb in terms of Nb2O5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni (A); (D3) an additive containing 0.05× 10-2 to 2.20×10-4, a Nb in terms of Nb2O5 relative to 100 g of the conductive powder mainly composed of Ni (A ) . -2 mol range, stabilized zirconium dioxide (SZ) whose crystal structure is stabilized by a stabilizer; and (D4) an additive containing 0.10 to 5.50 parts by mass of Al in terms of Al2O3 relative to 100.0 parts by mass of the conductive powder (A ) mainly composed of Ni.

再者,本發明(2)係提供如(1)之Ni糊膏,其中,當含有上述(D1)含Ta添加劑的情況,上述(D1)含Ta添加劑係相對於上述(A)主要為Ni的導電性粉末100.0質量份,依Ta2O5換算含有0.025~0.80質量份範圍內。 Furthermore, the present invention (2) provides a Ni paste as in (1), wherein when the Ta-containing additive (D1) is contained, the Ta-containing additive (D1) is contained in an amount in the range of 0.025 to 0.80 parts by mass in terms of Ta 2 O 5 relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni.

再者,本發明(3)係提供如(1)之Ni糊膏,其中,當含有上述(D2)含Nb添加劑的情況,上述(D2)含Nb添加劑係相對於上述(A)主要為Ni的導電性粉末100.0質量份,依Nb2O5換算含有0.010~0.50質量份範圍內。 Furthermore, the present invention (3) provides a Ni paste as in (1), wherein when the Nb-containing additive (D2) is contained, the Nb-containing additive (D2) is contained in an amount in the range of 0.010 to 0.50 parts by mass in terms of Nb 2 O 5 relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni.

再者,本發明(4)係提供如(1)之Ni糊膏,其中,當含有上述(D3)安定化二氧化鋯(SZ)的情況,上述安定化劑係從Y2O3、CaO、MgO及Sc2O3中選擇1種以上。 Furthermore, the present invention (4) provides the Ni paste as described in (1), wherein when the Ni paste contains the stabilized zirconium dioxide ( SZ ) (D3), the stabilizer is at least one selected from Y2O3 , CaO, MgO and Sc2O3 .

再者,本發明(5)係提供如(4)之Ni糊膏,其中,當含有上述(D3)安定化二氧化鋯(SZ)的情況,上述(D3)安定化二氧化鋯(SZ)係依超過0.0莫耳%且45.0莫耳%以下之範圍含有上述安定化劑。 Furthermore, the present invention (5) provides a Ni paste as in (4), wherein, when containing the above-mentioned (D3) stabilized zirconium dioxide (SZ), the above-mentioned (D3) stabilized zirconium dioxide (SZ) contains the above-mentioned stabilizer in a range of more than 0.0 mol% and less than 45.0 mol%.

再者,本發明(6)係提供如(4)之Ni糊膏,其中,當含有上述(D3)安定化二氧化鋯(SZ)的情況,上述(D3)安定化二氧化鋯(SZ)係依8.0~25.0莫耳%之範圍含有上述安定化劑。 Furthermore, the present invention (6) provides a Ni paste as in (4), wherein, when containing the above-mentioned (D3) stabilized zirconium dioxide (SZ), the above-mentioned (D3) stabilized zirconium dioxide (SZ) contains the above-mentioned stabilizer in the range of 8.0~25.0 mol%.

再者,本發明(7)係提供如(1)、(4)~(6)中任一項之Ni糊膏,其中,當含有上述(D3)安定化二氧化鋯(SZ)的情況,上述(D3)安定化二氧化鋯(SZ)係相對於上述(A)主要為Ni的導電性粉末100g,含有0.05×10-2~1.40×10-2莫耳之範圍。 Furthermore, the present invention (7) provides a Ni paste as described in any one of (1), (4) to (6), wherein when the stabilized zirconium dioxide (SZ) (D3) is contained, the stabilized zirconium dioxide (SZ) (D3) is contained in an amount of 0.05×10 -2 to 1.40×10 -2 mol relative to 100 g of the conductive powder (A) mainly composed of Ni.

再者,本發明(8)係提供如(1)之Ni糊膏,其中,當含有上述(D4)含Al添加劑的情況,上述(D4)含Al添加劑係相對於上述(A)主要為Ni的導電性粉末100.0質量份,依Al2O3換算含有0.10~2.30質量份範圍內。 Furthermore, the present invention (8) provides a Ni paste as in (1), wherein when the Al-containing additive (D4) is contained, the Al-containing additive (D4) is contained in an amount in the range of 0.10 to 2.30 parts by mass in terms of Al 2 O 3 relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni.

再者,本發明(9)係提供如(1)~(8)中任一項之Ni糊膏,其中,上述(A)主要為Ni的導電性粉末含量係30.0~95.0質量%。 Furthermore, the present invention (9) provides a Ni paste as described in any one of (1) to (8), wherein the content of the conductive powder (A) mainly Ni is 30.0 to 95.0 mass %.

再者,本發明(10)所提供的積層陶瓷電容器,係具備有:陶瓷積層體,其係由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層;以及外部電極,其係形成於上述陶瓷積層體的外表面;其中,上述陶瓷積層體係含有從下述所構成群組中選擇至少1種:(D1)相對於上述(A)含Ni之導電性成分100.0質量份,依Ta2O5換算0.025~2.50質量份範圍內之Ta;(D2)相對於上述(A)含Ni之導電性成分100.0質量份,依Nb2O5換算0.010~1.80質量份範圍內之Nb;及(D4)相對於上述(A)含Ni之導電性成分100.0質量份,依Al2O3換算0.10~5.50質量份範圍內之Al。 Furthermore, the multilayer ceramic capacitor provided by the present invention (10) comprises: a ceramic multilayer body, which is formed by alternating a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni; and an external electrode, which is formed on the outer surface of the ceramic multilayer body; wherein the ceramic multilayer body contains at least one selected from the following group: (D1) Ta in the range of 0.025 to 2.50 parts by mass based on Ta2O5 relative to 100.0 parts by mass of the conductive component containing Ni in (A); (D2) Nb2O in the range of 1.0 to 2.5 parts by mass based on Nb2O5 relative to 100.0 parts by mass of the conductive component containing Ni in ( A ); 5 converted to Nb in the range of 0.010-1.80 parts by mass; and (D4) relative to 100.0 parts by mass of the conductive component containing Ni in (A), 0.10-5.50 parts by mass of Al2O3 converted to Al.

再者,本發明(11)所提供的積層陶瓷電容器,係具備有:陶瓷積層體,其係由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層;以及外部電極,其係形成於上述陶瓷積層體的外表面; 於鄰接之上述內部電極層與上述陶瓷介電質層之界面及其附近,具有從Ta、Nb、Zr、安定化劑中的金屬元素及Al所構成群組中選擇至少1種元素的擴散區域。 Furthermore, the multilayer ceramic capacitor provided by the present invention (11) comprises: a ceramic multilayer body, which is a stack of multiple ceramic dielectric layers and multiple internal electrode layers containing Ni in an alternating manner; and an external electrode, which is formed on the outer surface of the ceramic multilayer body; At the interface between the adjacent internal electrode layer and the ceramic dielectric layer and in the vicinity thereof, there is a diffusion region of at least one element selected from the group consisting of Ta, Nb, Zr, metal elements in the stabilizer, and Al.

再者,本發明(12)係提供如(11)之積層陶瓷電容器,其中,上述安定化劑中的金屬元素係從Y、Ca、Mg及Sc中選擇1種以上。 Furthermore, the present invention (12) provides a multilayer ceramic capacitor as described in (11), wherein the metal element in the stabilizer is selected from at least one of Y, Ca, Mg and Sc.

再者,本發明(13)所提供的積層陶瓷電容器,係具備有:陶瓷積層體,其係由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層;以及外部電極,其係形成於上述陶瓷積層體的外表面;其中,上述內部電極層係由使(1)~(9)中任一項之Ni糊膏依900~1400℃施行煅燒的煅燒物所形成。 Furthermore, the multilayer ceramic capacitor provided by the present invention (13) comprises: a ceramic multilayer body, which is a stack of multiple ceramic dielectric layers and multiple internal electrode layers containing Ni; and an external electrode, which is formed on the outer surface of the ceramic multilayer body; wherein the internal electrode layer is formed by calcining the Ni paste of any one of (1) to (9) at 900 to 1400°C.

根據本發明,可提供不致使電極膜的連續性降低、能提升高溫負載壽命的內部電極用之Ni糊膏。又,根據本發明,可提供即使介電質層更加薄層化及施加高電場強度電壓,仍可呈現優異可靠性的積層陶瓷電容器。 According to the present invention, a Ni paste for internal electrodes can be provided that does not reduce the continuity of the electrode film and can improve the high-temperature load life. In addition, according to the present invention, a multilayer ceramic capacitor can be provided that can still show excellent reliability even if the dielectric layer is thinner and a high electric field strength voltage is applied.

圖1係實施例1中,表1之Ta2O5與MTTF(添加Ta2O5)/MTTF(無添加)的關係圖。 FIG. 1 is a graph showing the relationship between Ta 2 O 5 and MTTF (with Ta 2 O 5 addition)/MTTF (without Ta 2 O 5 addition) in Table 1 in Example 1. FIG.

圖2係實施例1中,表2之Nb2O5與MTTF(添加Nb2O5)/MTTF(無添加)的關係圖。 FIG. 2 is a graph showing the relationship between Nb 2 O 5 and MTTF (with Nb 2 O 5 addition)/MTTF (without Nb 2 O 5 addition) in Table 2 in Example 1. FIG.

圖3係比較例1中,MTTF(添加ZrO2)/MTTF(無添加)、及實施例2的MTTF(YSZ添加)/MTTF(無添加)之關係圖。 FIG. 3 is a graph showing the relationship between MTTF (with ZrO 2 addition)/MTTF (without addition) in Comparative Example 1 and MTTF (with YSZ addition)/MTTF (without addition) in Example 2. FIG.

圖4係實施例2中的MTTF(添加YSZ)/比較例1的MTTF(添加ZrO2)之關係圖。 FIG. 4 is a graph showing the relationship between MTTF (addition of YSZ) in Example 2 and MTTF (addition of ZrO 2 ) in Comparative Example 1. FIG.

圖5係實施例3的MTTF(添加YSZ)/MTTF(無添加)、及實施例3的MTTF(添加YSZ)/MTTF(添加ZrO2)之關係圖。 FIG. 5 is a relationship diagram of MTTF (YSZ addition)/MTTF (no addition) of Example 3 and MTTF (YSZ addition)/MTTF (ZrO 2 addition) of Example 3. FIG.

圖6係實施例5中,表8之Al2O3與MTTF(添加Al2O3)/MTTF(無添加)的關係圖。 FIG. 6 is a graph showing the relationship between Al 2 O 3 and MTTF (with Al 2 O 3 addition)/MTTF (without addition) in Table 8 in Example 5. FIG.

本發明的Ni糊膏,係含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、以及(C)有機溶劑;更含有從:(D1)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Ta2O5換算0.025~2.50質量份範圍內之Ta的添加劑;(D2)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Nb2O5換算0.010~1.80質量份範圍內之Nb的添加劑;(D3)相對於上述(A)主要為Ni的導電性粉末100g,含有依0.05×10-2~2.20×10-2莫耳範圍內,經利用安定化劑使二氧化鋯結晶構造安定化的安定化二氧化鋯(SZ);及 (D4)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Al2O3換算0.10~5.50質量份範圍內之Al的添加劑 The Ni paste of the present invention comprises: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent; and further comprises: (D1) an additive containing 0.025 to 2.50 parts by mass of Ta in terms of Ta 2 O 5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni (A); (D2) an additive containing 0.010 to 1.80 parts by mass of Nb in terms of Nb 2 O 5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni (A); (D3) an additive containing 0.05×10 -2 to 2.20×10 -4 to 3.5 parts by mass of Nb in terms of Nb 2 O 5 relative to 100 g of the conductive powder mainly composed of Ni (A). -2 mol range, wherein the zirconia crystal structure is stabilized by using a stabilizer; and (D4) an additive containing 0.10 to 5.50 parts by mass of Al in terms of Al2O3 relative to 100.0 parts by mass of the conductive powder (A ) mainly Ni.

所構成群組中至少1種。 At least one of the groups formed.

本發明的Ni糊膏係可舉例如含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、及(C)有機溶劑,且更進一步含有:(D1)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Ta2O5換算0.025~2.50質量份範圍內之Ta的添加劑。 The Ni paste of the present invention may, for example, contain: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent, and further contain: ( D1) an additive containing Ta in an amount of 0.025 to 2.50 parts by mass in terms of Ta2O5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni (A).

再者,本發明的Ni糊膏係可舉例如含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、以及(C)有機溶劑,且更進一步含有:(D2)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Nb2O5換算0.010~1.80質量份範圍內之Nb的添加劑。 Furthermore, the Ni paste of the present invention may, for example, contain: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent, and further contain: (D2) an additive containing 0.010 to 1.80 parts by mass of Nb in terms of Nb2O5 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni in (A).

再者,本發明的Ni糊膏係可舉例如含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、以及(C)有機溶劑,且更進一步含有:(D3)相對於上述(A)主要為Ni的導電性粉末100g,含有依0.05×10-2~2.20×10-2莫耳範圍內,經利用安定化劑使二氧化鋯結晶構造安定化的安定化二氧化鋯(SZ)。 Furthermore, the Ni paste of the present invention may, for example, contain: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent, and further contain: (D3) stabilized zirconium dioxide (SZ) in an amount of 0.05×10 -2 ~2.20×10 -2 mol relative to 100 g of the above-mentioned (A) conductive powder mainly composed of Ni, in which the zirconium dioxide crystal structure is stabilized by a stabilizer.

再者,本發明的Ni糊膏係可舉例如含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、及(C)有機溶劑,且更進一步含有:(D4)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Al2O3換算0.10~5.50質量份範圍內之Al的添加劑。 Furthermore, the Ni paste of the present invention may, for example, contain: (A) a conductive powder mainly composed of Ni, (B) a binder resin, and (C) an organic solvent, and further contain: (D4) an additive containing 0.10 to 5.50 parts by mass of Al in terms of Al2O3 relative to 100.0 parts by mass of the conductive powder mainly composed of Ni in (A).

本發明的Ni糊膏係頗適用於積層陶瓷電容器的內部電極形成用途,且適用於積層陶瓷致動器等其他陶瓷電子零件。 The Ni paste of the present invention is suitable for forming internal electrodes of multilayer ceramic capacitors and other ceramic electronic parts such as multilayer ceramic actuators.

本發明的Ni糊膏係至少含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、(C)有機溶劑、以及「從(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑所構成群組中選擇至少1種」。即,本發明的Ni糊膏係至少含有:(A)主要為Ni的導電性粉末、(B)黏結樹脂、(C)有機溶劑、以及從(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)及(D4)含Al添加劑中選擇任1種或2種以上。 The Ni paste of the present invention contains at least: (A) conductive powder mainly composed of Ni, (B) binder resin, (C) organic solvent, and "at least one selected from the group consisting of (D1) Ta-containing additive, (D2) Nb-containing additive, (D3) stabilized zirconia (SZ), and (D4) Al-containing additive." That is, the Ni paste of the present invention contains at least: (A) conductive powder mainly composed of Ni, (B) binder resin, (C) organic solvent, and any one or more selected from (D1) Ta-containing additive, (D2) Nb-containing additive, (D3) stabilized zirconia (SZ), and (D4) Al-containing additive.

本發明Ni糊膏的(A)主要為Ni的導電性粉末,在內部電極形成用Ni糊膏中係作為導電性粉末使用,主要含有Ni的粉末。(A)主要為Ni的導電性粉末係可舉例如:僅由金屬Ni構成的粉末。又,(A)主要為Ni的導電性粉末係在達成本發明作用效果前提下,尚亦可例如:Ni與其他化合物的複合粉末、Ni與其他化合物的混合粉末、Ni與其他金屬的合金粉末等。Ni與其他化合物的複合粉末係可舉例如:Ni粉末表面由玻璃質薄膜被覆的複合粉末、Ni粉末表面由氧化物被覆的複合粉末、以及Ni粉末表面經有機金屬化合物、界面活性劑、脂肪酸類等施行表面處理過的複合粉末。Ni與其他化合物的混合粉末係可舉例如:Ni粉末、與氧化物粉末等的混合粉末。又,合金粉末可利用的其他金屬係在與Ni進行合金化時不易發生熔點降低的金屬,或者假設即使會發生熔點降低的金屬,但只要屬於不會發生成球現象程度的含量便可,作為一例係可舉例如:Cu、Ag、Pd、Pt、Rh、Ir、Re、Ru、Os、In、Ga、Zn、Bi、Pb、Fe、V、Y等。(A)主要為Ni的導電性粉末中的Ni含量,係在能達本發明作用 效果前提下,其餘並無特別的限制,較佳係60.0質量%以上、更佳係80.0質量%以上、特佳係100.0質量%。 (A) of the Ni paste of the present invention is a conductive powder mainly composed of Ni, which is used as a conductive powder in the Ni paste for forming an internal electrode and mainly contains Ni powder. (A) The conductive powder mainly composed of Ni can be, for example, a powder consisting only of metal Ni. Moreover, (A) The conductive powder mainly composed of Ni can also be, for example, a composite powder of Ni and other compounds, a mixed powder of Ni and other compounds, an alloy powder of Ni and other metals, etc., provided that the effects of the present invention are achieved. The composite powder of Ni and other compounds can be, for example, a composite powder whose surface is coated with a glassy film, a composite powder whose surface is coated with an oxide, and a composite powder whose surface is treated with an organic metal compound, a surfactant, a fatty acid, etc. The mixed powder of Ni and other compounds can be, for example, a mixed powder of Ni powder and oxide powder, etc. In addition, other metals that can be used in alloy powders are metals that are not prone to melting point reduction when alloyed with Ni, or even if the melting point of the metal is reduced, as long as the content is within the extent that balling phenomenon does not occur, examples include: Cu, Ag, Pd, Pt, Rh, Ir, Re, Ru, Os, In, Ga, Zn, Bi, Pb, Fe, V, Y, etc. (A) The Ni content in the conductive powder mainly composed of Ni is not particularly limited as long as the effect of the present invention can be achieved. It is preferably 60.0 mass% or more, more preferably 80.0 mass% or more, and particularly preferably 100.0 mass%.

(A)主要為Ni的導電性粉末的平均粒徑並無特別的限定,較佳係0.05~1.0μm。藉由(A)主要為Ni的導電性粉末之平均粒徑在上述範圍內,便可輕易形成緻密、平滑性高、薄的內部電極層。另外,本說明書中表示數值範圍的符號「~」,在無特別聲明前提下,係表示包含符號「~」前後所記載數值在內的範圍。即,例如「0.05~1.0」的表述,在無特別聲明前提下,係與「0.05以上且1.0以下」同義。 The average particle size of the conductive powder (A) mainly Ni is not particularly limited, and is preferably 0.05~1.0μm. By keeping the average particle size of the conductive powder (A) mainly Ni within the above range, a dense, smooth, and thin internal electrode layer can be easily formed. In addition, the symbol "~" in this specification that indicates a numerical range, unless otherwise stated, indicates a range including the numerical values recorded before and after the symbol "~". That is, for example, the expression "0.05~1.0" is synonymous with "0.05 or more and 1.0 or less" unless otherwise stated.

本發明的Ni糊膏中,(A)主要為Ni的導電性粉末含量,並無特別的限制,若考慮Ni糊膏的加工黏度、印刷性、保存安定性等等因素,通常係可在30.0~95.0質量%範圍內適當選擇。 In the Ni paste of the present invention, (A) is mainly the content of Ni conductive powder, and there is no special restriction. If the processing viscosity, printability, storage stability and other factors of the Ni paste are considered, it can usually be appropriately selected within the range of 30.0~95.0 mass%.

本發明Ni糊膏的(B)黏結樹脂係在能使用於內部電極形成用導電性糊膏的前提下,其餘並無特別的限制。(B)黏結樹脂係一般內部電極形成用導電性糊膏所使用者,可例如:乙基纖維素等纖維素系樹脂、丙烯酸樹脂、甲基丙烯酸樹脂、丁醛樹脂、環氧樹脂、酚樹脂、松脂等。 The (B) binder resin of the Ni paste of the present invention is not particularly limited as long as it can be used in the conductive paste for forming the internal electrode. The (B) binder resin is generally used in the conductive paste for forming the internal electrode, and can be, for example, cellulose resins such as ethyl cellulose, acrylic resins, methacrylic resins, butyraldehyde resins, epoxy resins, phenolic resins, rosin, etc.

本發明Ni糊膏中的(B)黏結樹脂含有比例,並無特別的限制,相對於(A)主要為Ni的導電性粉末100.0質量份,通常係成為0.1~30.0質量份、較佳1.0~15.0質量份的比例。 The content ratio of the (B) binder resin in the Ni paste of the present invention is not particularly limited. It is usually 0.1 to 30.0 parts by mass, preferably 1.0 to 15.0 parts by mass, relative to 100.0 parts by mass of the (A) conductive powder mainly composed of Ni.

本發明Ni糊膏的(C)有機溶劑係在能溶解(B)黏結樹脂的前提下,其餘並無特別的限定,可例如:醇系、醚系、酯系、烴系等溶劑、以及該等的混合溶劑。 The (C) organic solvent of the Ni paste of the present invention is not particularly limited as long as it can dissolve the (B) binder resin. Examples include alcohol, ether, ester, hydrocarbon solvents, and mixed solvents thereof.

本發明的Ni糊膏係除(A)主要為Ni的導電性粉末、(B)黏結樹脂及(C)有機溶劑之外,尚含有從:(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑所構成群組中選擇至少1種。 The Ni paste of the present invention contains, in addition to (A) conductive powder mainly composed of Ni, (B) binder resin and (C) organic solvent, at least one selected from the group consisting of: (D1) Ta-containing additive, (D2) Nb-containing additive, (D3) stabilized zirconia (SZ), and (D4) Al-containing additive.

本發明Ni糊膏的(D1)成分係含Ta添加劑。含Ta添加劑係在將Ni糊膏煅燒後能獲得Ta2O5之前提下,其餘並無特別的限定,作為一例係除純金屬(Ta)之外,尚亦可例如:含Ta氧化物(Ta2O5、TaO2)、硫化物(TaS2)、鹵化物(TaF5等)、硼化物(TaB)等無機化合物,此外尚亦可例如:金屬羰基化合物(metal carbonyl)、金屬烷氧化物、金屬樹脂酸鹽(metallic resinate)等有機金屬化合物。本發明中,含Ta添加劑較佳係Ta2O5The component (D1) of the Ni paste of the present invention is a Ta-containing additive. The Ta-containing additive is provided that Ta 2 O 5 can be obtained after calcining the Ni paste. There are no particular limitations on the other aspects. For example, in addition to pure metal (Ta), inorganic compounds such as Ta oxides (Ta 2 O 5 , TaO 2 ), sulfides (TaS 2 ), halides (TaF 5 , etc.), borides (TaB), etc., and organic metal compounds such as metal carbonyl compounds, metal alkoxides, and metal resinates, etc., can also be used. In the present invention, the Ta-containing additive is preferably Ta 2 O 5 .

當本發明Ni糊膏係含有(D1)含Ta添加劑的情況,本發明Ni糊膏係依含Ta添加劑中之Ta,換算為Ta2O5時,相對於(A)主要為Ni的導電性粉末100.0質量份,成為較佳0.025~2.50質量份、更佳0.025~0.80質量份的比例含有含Ta添加劑。 When the Ni paste of the present invention contains (D1) a Ta-containing additive, the Ni paste of the present invention contains the Ta-containing additive in a ratio of preferably 0.025 to 2.50 parts by mass, more preferably 0.025 to 0.80 parts by mass, relative to 100.0 parts by mass of the (A) conductive powder mainly composed of Ni, when the Ta in the Ta-containing additive is converted into Ta2O5.

本發明Ni糊膏的(D2)成分係含Nb添加劑。含Nb添加劑係在將Ni糊膏煅燒後能獲得Nb2O5之前提下,其餘並無特別的限定,作為一例係除純金屬(Nb)之外,尚亦可例如:含Nb氧化物(Nb2O5、NbO2)、硫化物(NbS2)、鹵化物(NbF5等)、硼化物(NbB)等無機化合物,又,尚亦可例如:金屬羰基化合物、金屬烷氧化物、金屬樹脂酸鹽等有機金屬化合物。本發明中,含Nb添加劑較佳係Nb2O5The component (D2) of the Ni paste of the present invention is a Nb-containing additive. The Nb-containing additive is not particularly limited, provided that Nb 2 O 5 can be obtained after calcining the Ni paste. For example, in addition to pure metal (Nb), inorganic compounds such as Nb oxides (Nb 2 O 5 , NbO 2 ), sulfides (NbS 2 ), halides (NbF 5 , etc.), borides (NbB), etc., and organic metal compounds such as metal carbonyl compounds, metal alkoxides, and metal resins can also be used. In the present invention, the Nb-containing additive is preferably Nb 2 O 5 .

當本發明Ni糊膏係含有(D2)含Nb添加劑的情況,本發明Ni糊膏係依含Nb添加劑中之Nb,換算為Nb2O5時,相對於(A)主要為Ni的導電性粉末100.0質量份,成為較佳0.010~1.80質量份、更佳0.010~0.50質量份的比例含有含Nb添加劑。 When the Ni paste of the present invention contains (D2) a Nb-containing additive, the Ni paste of the present invention contains the Nb-containing additive in a ratio of preferably 0.010 to 1.80 parts by mass, more preferably 0.010 to 0.50 parts by mass, based on Nb in the Nb-containing additive converted into Nb2O5 , relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni.

本發明Ni糊膏的(D3)成分係利用安定化劑使二氧化鋯結晶構造安定化的安定化二氧化鋯(SZ)。安定化二氧化鋯(SZ)係使安定化劑固溶於二氧化鋯(ZrO2)中,藉由在4價的Zr位上導入2價或3價金屬元素,使二氧化鋯(ZrO2)的結晶構造不會隨溫度變化產生改變,而呈安定化。 The component (D3) of the Ni paste of the present invention is stabilized zirconia (SZ) whose crystal structure is stabilized by a stabilizer. The stabilized zirconia (SZ) is obtained by dissolving the stabilizer in zirconia (ZrO 2 ) and introducing a divalent or trivalent metal element at the tetravalent Zr position, so that the crystal structure of zirconia (ZrO 2 ) does not change with temperature changes and is stabilized.

安定化劑係在能使二氧化鋯(ZrO2)安定化之前提下,其餘並無特別的限制,可舉例如:MgO、CaO、SrO、BaO等鹼土族金屬的氧化物;Sc2O3、Y2O3、La2O3、CeO2、Pr2O3、Nd2O3、Sm2O3、Eu2O3、Gd2O3、Tb2O3、Dy2O3、Er2O3、Tm2O3、Yb2O3等稀土族元素的氧化物;從Bi2O3、In2O3等之中選擇1種或2種以上的氧化物。 The stabilizer is not particularly limited as long as it can stabilize zirconium dioxide (ZrO 2 ), and examples thereof include oxides of alkali earth metals such as MgO, CaO, SrO, and BaO; oxides of rare earth elements such as Sc 2 O 3 , Y 2 O 3 , La 2 O 3 , CeO 2 , Pr 2 O 3 , Nd 2 O 3 , Sm 2 O 3 , Eu 2 O 3 , Gd 2 O 3 , Tb 2 O 3 , Dy 2 O 3 , Er 2 O 3 , Tm 2 O 3 , and Yb 2 O 3 ; and one or more oxides selected from Bi 2 O 3 , In 2 O 3 , and the like.

該等之中,本發明較佳係從氧化釔(Y2O3)、氧化鈣(CaO)、氧化鎂(MgO)及氧化鈧(Sc2O3)中選擇1種以上進行安定化。安定化二氧化鋯(SZ)所使用的安定化劑係可為1種、亦可組合2種以上。 Among them, the present invention preferably uses one or more selected from yttrium oxide (Y 2 O 3 ), calcium oxide (CaO), magnesium oxide (MgO) and sc 2 O 3 for stabilization. The stabilizer used to stabilize zirconium dioxide (SZ) may be one or a combination of two or more.

另外,本說明書中,當沒有特定安定化劑而意指所有安定化二氧化鋯的情況,會有將安定化二氧化鋯記為「SZ」的情況。又,當意指安定化劑係使用氧化釔(Y2O3)、氧化鈣(CaO)、氧化鎂(MgO)及氧化鈧(Sc2O3)的安定化二氧化鋯時,分別記為「YSZ」、「CSZ」、「MSZ」及「ScSZ」。又,將含有X(莫耳%)安定化劑的安定化二氧化鋯(SZ)記為 「X-SZ」。例如「3.0-YSZ」係指經3.0莫耳%氧化釔(Y2O3)施行安定化的安定化二氧化鋯(YSZ)。 In addition, in this specification, when there is no specific stabilizer and it refers to all stabilized zirconia, there are cases where stabilized zirconia is described as "SZ". Also, when it refers to stabilized zirconia using yttrium oxide (Y 2 O 3 ), calcium oxide (CaO), magnesium oxide (MgO) and sulphur oxide (Sc 2 O 3 ) as a stabilizer, they are described as "YSZ", "CSZ", "MSZ" and "ScSZ" respectively. In addition, stabilized zirconia (SZ) containing X (mol%) of stabilizer is described as "X-SZ". For example, "3.0-YSZ" refers to stabilized zirconia (YSZ) stabilized with 3.0 mol% of yttrium oxide (Y 2 O 3 ).

安定化二氧化鋯(SZ)中的安定化劑含量並無特別的限制,較佳係超過0.0莫耳%且45.0莫耳%以下、更佳係超過0.0莫耳%且40.0莫耳%以下、特佳係8.0~25.0莫耳%。藉由安定化二氧化鋯(SZ)中的安定化劑含量在上述範圍內,便可輕易提升高溫負載壽命。另外,安定化二氧化鋯(SZ)中的安定化劑含量(X莫耳%),係將安定化二氧化鋯(SZ)中的Zr及安定化劑中的金屬元素,分別換算為氧化物,依安定化劑中金屬元素之氧化物換算莫耳數,相對於Zr及安定化劑中金屬元素之氧化物換算合計莫耳數的百分比[(安定化劑中金屬元素之氧化物換算莫耳數/(安定化劑中金屬元素之氧化物換算莫耳數+安定化二氧化鋯(SZ)中Zr之氧化物換算莫耳數))×100]之值。在氧化物換算時,例如Zr換算為ZrO2、Y換算為Y2O3、Ca換算為CaO、Mg換算為MgO、Sc換算為Sc2O3,並計算出莫耳數。又,當安定化二氧化鋯(SZ)係含有2種以上安定化劑的情況,便將2種以上安定化劑中的各金屬元素,分別進行氧化物換算,再將該等氧化物換算的合計莫耳數,設為安定化劑中金屬元素的氧化物換算莫耳數。 The content of the stabilizer in the stabilized zirconia (SZ) is not particularly limited, but is preferably more than 0.0 mol% and less than 45.0 mol%, more preferably more than 0.0 mol% and less than 40.0 mol%, and particularly preferably 8.0-25.0 mol%. By keeping the content of the stabilizer in the stabilized zirconia (SZ) within the above range, the high temperature load life can be easily improved. In addition, the stabilizer content (X mol%) in the stabilized zirconia (SZ) is the percentage of the molar number of the oxide of the metal element in the stabilizer relative to the total molar number of the oxide of Zr and the metal element in the stabilizer [(molar number of the oxide of the metal element in the stabilizer/(molar number of the oxide of the metal element in the stabilizer + molar number of the oxide of Zr in the stabilized zirconia (SZ))) × 100] obtained by converting the Zr in the stabilized zirconia (SZ) and the metal element in the stabilizer into oxides. When converting the oxides, for example, Zr is converted into ZrO 2 , Y is converted into Y 2 O 3 , Ca is converted into CaO, Mg is converted into MgO, and Sc is converted into Sc 2 O 3 , and the molar number is calculated. Furthermore, when the stabilized zirconium dioxide (SZ) contains two or more stabilizers, each metal element in the two or more stabilizers is converted into oxides, and the total molar number of the oxide conversions is set as the oxide-converted molar number of the metal element in the stabilizer.

當本發明Ni糊膏係含有(D3)安定化二氧化鋯(SZ)的情況,本發明Ni糊膏中的(D3)安定化二氧化鋯(SZ)含量,在(A)主要為Ni的導電性粉末100.0g中,較佳係0.05×10-2~2.20×10-2莫耳、更佳係0.05×10-2~1.40×10-2莫耳。藉由將(D3)安定化二氧化鋯(SZ)含量設在上述範圍內,便可提升高溫負載壽命。另外,雖是Ni糊膏中的安定化二氧化鋯(SZ)含量,但將安定化二氧化鋯(SZ)中的Zr與安定化劑中的金屬元 素,分別換算為氧化物,求取Zr與安定化劑中金屬元素的氧化物換算合計莫耳,藉由計算在(A)主要為Ni的導電性粉末100.0g中的莫耳數,便可計算出Ni糊膏中的安定化二氧化鋯(SZ)含量。 When the Ni paste of the present invention contains (D3) stabilized zirconia (SZ), the content of (D3) stabilized zirconia (SZ) in the Ni paste of the present invention is preferably 0.05×10 -2 ~2.20×10 -2 mol, more preferably 0.05×10 -2 ~1.40×10 -2 mol, in 100.0 g of (A) conductive powder mainly composed of Ni. By setting the content of (D3) stabilized zirconia (SZ) within the above range, the high temperature load life can be improved. In addition, although it is the content of stabilized zirconia (SZ) in Ni paste, the Zr in the stabilized zirconia (SZ) and the metal elements in the stabilizer are converted into oxides respectively, and the total mole conversion of the oxides of Zr and the metal elements in the stabilizer is obtained. By calculating the mole number in 100.0g of the conductive powder (A) mainly Ni, the content of stabilized zirconia (SZ) in Ni paste can be calculated.

本發明Ni糊膏的(D4)成分係含Al添加劑。含Al添加劑係在將Ni糊膏煅燒後能獲得Al2O3之前提下,其餘並無特別的限定,作為一例係除純金屬(Al)之外,尚亦可例如:含Al氧化物(Al2O3)、硫化物(Al2S3)、鹵化物(AlF3等)、硼化物(AlB2)、氮化物(AlN)、碳化物(Al4C3)、氫氧化物(Al(OH)3)、磷酸鹽(AlPO4)、硫酸鹽(Al2(SO4)3)等無機化合物,又,尚亦可例如:金屬烷氧化物、金屬樹脂酸鹽等有機金屬化合物。本發明中,含Al添加劑特佳係Al2O3The component (D4) of the Ni paste of the present invention is an Al additive. The Al additive is not particularly limited, provided that Al 2 O 3 can be obtained after calcining the Ni paste. For example, in addition to pure metal (Al), it may also be inorganic compounds such as Al oxide (Al 2 O 3 ), sulfide (Al 2 S 3 ), halide (AlF 3 , etc.), boride (AlB 2 ), nitride (AlN), carbide (Al 4 C 3 ), hydroxide (Al(OH) 3 ), phosphate (AlPO 4 ), sulfate (Al 2 (SO 4 ) 3 ), and organic metal compounds such as metal alkoxides and metal resins. In the present invention, the Al-containing additive is particularly preferably Al 2 O 3 .

當本發明Ni糊膏係含有(D4)含Al添加劑的情況,本發明Ni糊膏係將含Al添加劑中的Al,換算為Al2O3時,相對於(A)主要為Ni的導電性粉末100.0質量份,依成為0.10~5.50質量份、較佳0.10~2.30質量份的比例含有含Al添加劑。 When the Ni paste of the present invention contains (D4) an Al-containing additive, the Ni paste of the present invention contains the Al-containing additive in a ratio of 0.10 to 5.50 parts by mass, preferably 0.10 to 2.30 parts by mass, relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni, when Al in the Al - containing additive is converted into Al2O3.

本發明的Ni糊膏亦可組合含有:(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑。 The Ni paste of the present invention may also contain in combination: (D1) Ta-containing additive, (D2) Nb-containing additive, (D3) stabilized zirconia (SZ), and (D4) Al-containing additive.

本發明的Ni糊膏藉由依上述含有比例含有從:(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑所構成群組中選擇至少1種,便可獲得本發明作用效果的機制尚未明確。然而,根據本發明者的測試與研究,觀察到Ni糊膏中所含Ta成分、Nb成分、安定化二氧化鋯(SZ)成分或Al成分,大多會在糊膏煅燒期間朝陶瓷介電質層移動,結果導致在煅燒後的陶瓷介電質層與內部電極層之 界面及其附近,形成高濃度含有Ta、Nb、Zr及安定化劑中的金屬元素、或Al的擴散區域(擴散層)狀態。另外,本發明中所謂「界面及其附近」,係指從陶瓷介電質層與內部電極層的界面,朝介電質層方向距離陶瓷介電質層厚1/16的區域起,至從該界面朝內部電極層方向距離內部電極層厚1/2的區域間之區域。 The mechanism by which the Ni paste of the present invention can achieve the effect of the present invention by containing at least one selected from the group consisting of (D1) Ta-containing additives, (D2) Nb-containing additives, (D3) stabilized zirconia (SZ), and (D4) Al-containing additives in the above-mentioned content ratio has not been clarified. However, according to the tests and studies of the inventors, it was observed that most of the Ta component, Nb component, stabilized zirconia (SZ) component or Al component contained in the Ni paste will move toward the ceramic dielectric layer during the calcination of the paste, resulting in the formation of a diffusion region (diffusion layer) containing a high concentration of Ta, Nb, Zr and metal elements in the stabilizer, or Al at the interface and its vicinity between the calcined ceramic dielectric layer and the internal electrode layer. In addition, the "interface and its vicinity" in the present invention refers to the area from the interface between the ceramic dielectric layer and the internal electrode layer, which is 1/16 of the thickness of the ceramic dielectric layer in the direction of the dielectric layer, to the area from the interface to the internal electrode layer, which is 1/2 of the thickness of the internal electrode layer.

本發明者推測可能因該擴散區域(擴散層)的存在,在高溫負載壽命測試中,於陶瓷介電質層中發生氧空孔朝陰極的移動速度降低,導致無法提升壽命的緣故所致。 The inventors of the present invention speculate that the existence of the diffusion region (diffusion layer) may cause the migration speed of oxygen vacancies in the ceramic dielectric layer toward the cathode to decrease during the high-temperature load life test, resulting in the inability to increase the life.

另外,使用(D3)安定化二氧化鋯(SZ)的Ni糊膏,即使有使用含Zr之共通材料粉末的情況,因為共通材料粉末的組成係與陶瓷介電質層相同組成或近似組成,即使在煅燒中從內部電極層朝陶瓷介電質層擴散,但陶瓷介電質層中的Zr元素濃度分佈仍幾乎不會有變化。所以,在陶瓷介電質層與內部電極層的界面及其附近,所觀察到形成高濃度含有Zr與安定化劑中金屬元素的擴散區域(擴散層),可認為係由共通材料粉末之外,在Ni糊膏中所含有的安定化二氧化鋯(SZ)造成。 In addition, when using Ni paste containing (D3) stabilized zirconia (SZ), even if common material powder containing Zr is used, since the composition of the common material powder is the same as or similar to that of the ceramic dielectric layer, even if the Zr element diffuses from the internal electrode layer to the ceramic dielectric layer during calcination, the concentration distribution of the Zr element in the ceramic dielectric layer will hardly change. Therefore, the formation of a diffusion region (diffusion layer) containing high concentrations of Zr and metal elements in the stabilizer observed at and near the interface between the ceramic dielectric layer and the internal electrode layer can be considered to be caused by stabilized zirconia (SZ) contained in the Ni paste in addition to the common material powder.

且,安定化二氧化鋯(SZ)係在二氧化鋯(ZrO2)中導入氧空孔,因為安定化劑越多,則氧空孔量越多,藉由使Ni糊膏含有安定化二氧化鋯(SZ),相較於含有未安定化二氧化鋯(ZrO2)的情況下,較能提高界面附近的氧空孔濃度。結果,在高溫負載壽命測試中,介電質層內部的氧空孔不易朝電極界面(陰極)移動,便可更加提升高溫負載壽命,另一方面,當安定化劑量過量的情況,氧空孔濃度過高,可認為會因而導致高溫負載壽命特性急遽降低。 Moreover, stabilized zirconia (SZ) introduces oxygen vacancies into zirconia (ZrO 2 ). The more stabilizers there are, the more oxygen vacancies there are. By making the Ni paste contain stabilized zirconia (SZ), the concentration of oxygen vacancies near the interface can be increased compared to the case of containing unstabilized zirconia (ZrO 2 ). As a result, in the high-temperature load life test, the oxygen vacancies inside the dielectric layer are not easy to move toward the electrode interface (cathode), which can further improve the high-temperature load life. On the other hand, when the stabilizer is excessive, the oxygen vacancy concentration is too high, which can be considered to cause a sharp decrease in the high-temperature load life characteristics.

再者,煅燒後的內部電極層中之Ta成分、Nb成分、安定化二氧化鋯(SZ)成分、或Al成分含有,並不會導致Ni的熔點降低,因而亦不會對電極膜的連續性造成不良影響。但,在陶瓷介電質層中,若上述擴散層的Ta成分、Nb成分、安定化二氧化鋯(SZ)成分、或Al成分濃度變為過大,便會導致與Ni間之潤濕性降低、對電極膜的連續性造成不良影響。 Furthermore, the inclusion of Ta, Nb, SZ, or Al in the internal electrode layer after calcination does not lower the melting point of Ni, and therefore does not adversely affect the continuity of the electrode film. However, in the ceramic dielectric layer, if the concentration of Ta, Nb, SZ, or Al in the diffusion layer becomes too high, the wettability with Ni will decrease, which will adversely affect the continuity of the electrode film.

Ni糊膏中的(D1)含Ta添加劑含量、(D2)含Nb添加劑含量、(D3)安定化二氧化鋯(SZ)含量、或(D4)含Al添加劑含量,若未滿上述範圍,便無法獲得提升上述高溫負載壽命的效果,又,若超過上述範圍,會因擴散於陶瓷介電質層中的Ta成分、Nb成分、安定化二氧化鋯(SZ)成分、或Al成分而生成結晶粒成長,導致高溫負載壽命降低。 If the content of (D1) Ta additive, (D2) Nb additive, (D3) stabilized zirconia (SZ), or (D4) Al additive in the Ni paste is less than the above range, the effect of improving the high temperature load life cannot be achieved. If it exceeds the above range, the Ta component, Nb component, stabilized zirconia (SZ) component, or Al component diffused in the ceramic dielectric layer will generate crystal grain growth, resulting in a decrease in the high temperature load life.

本發明的Ni糊膏係可更進一步含有通常在內部電極形成用Ni糊膏中所添加的共通材料粉末。任意含有的共通材料粉末,目地在於使內部電極的燒結收縮行為能近似於介電質層,該共通材料粉末的種類並無特別的限定,最好依由與陶瓷介電質的反應所造成電容器特性變化成為最小之方式進行選擇。共通材料粉末較佳係通常內部電極形成用Ni糊膏所使用的一般式:ABO3(其中,A係Ba、Ca及Sr中之至少1種,B係Ti、Zr及Hf中之至少1種)所示陶瓷粉末,例如:鈦酸鋇、鋯酸鍶、鋯酸鈣等鈣鈦礦型氧化物粉末、以及在該等中添加各種添加劑者。又,共通材料粉末較佳係與使用為介電質層主成分的介電質陶瓷原料粉末具有相同組成、或近似組成者。另外,亦可預先在(A)主要為Ni的導電性粉末表面上附著共通材料粉末之後,再與Ni糊膏中的其他成分混合。 The Ni paste of the present invention may further contain common material powders that are usually added to Ni pastes for forming internal electrodes. The common material powders may be arbitrarily contained in order to make the sintering shrinkage behavior of the internal electrode similar to that of the dielectric layer. The type of the common material powder is not particularly limited, and it is best to select the common material powder in such a way that the change in capacitor characteristics caused by the reaction with the ceramic dielectric is minimized. The common material powder is preferably a ceramic powder represented by the general formula ABO 3 (wherein A is at least one of Ba, Ca and Sr, and B is at least one of Ti, Zr and Hf) used in Ni pastes for forming internal electrodes, such as barium titanate, strontium zirconate, calcium zirconate and other calcium titanate-type oxide powders, and various additives added thereto. The common material powder is preferably the same composition as the dielectric ceramic raw material powder used as the main component of the dielectric layer, or a similar composition. In addition, the common material powder can be attached to the surface of the conductive powder (A) mainly Ni in advance and then mixed with other components in the Ni paste.

當本發明的Ni糊膏係含有共通材料粉末的情況,本發明Ni糊膏中,共通材料粉末的含有比例係相對於(A)主要為Ni的導電性粉末100.0質量份,共通材料粉末合計成為30.0質量份以下的比例。Ni糊膏中的共通材料粉末含有比例係若超過上述範圍,則除電極層變厚、容易發生構造缺陷之外,尚會使電極層成為不連續膜。 When the Ni paste of the present invention contains common material powder, the content ratio of the common material powder in the Ni paste of the present invention is a ratio of 30.0 mass parts or less relative to 100.0 mass parts of (A) conductive powder mainly composed of Ni. If the content ratio of the common material powder in the Ni paste exceeds the above range, the electrode layer will not only become thicker and structural defects will occur easily, but also make the electrode layer a discontinuous film.

共通材料粉末的平均粒徑並無特別的限定,就從呈現更優異燒結抑制效果與緻密性提升效果的觀點,較佳係(A)主要為Ni的導電性粉末平均粒徑之30%以下。又,糊膏中的共通材料粉末總比表面積,就從提升高溫負載壽命效果的觀點,較佳係大於(A)主要為Ni的導電性粉末的總比表面積。另外,藉由選擇共通材料粉末的平均粒徑及含量,便可使糊膏中的共通材料粉末總比表面積,大於(A)主要為Ni的導電性粉末總比表面積。但,若共通材料粉末的平均粒徑過小,則隨表面積增加,導致粉末自身的燒結過快,因而造成抑制主要為Ni的導電性粉末之燒結的效果降低,故,共通材料粉末的平均粒徑較佳係0.01μm以上。 The average particle size of the common material powder is not particularly limited. From the perspective of exhibiting a better sintering inhibition effect and a density improvement effect, it is preferably less than 30% of the average particle size of the conductive powder (A) mainly composed of Ni. In addition, from the perspective of improving the high-temperature load life effect, the total specific surface area of the common material powder in the paste is preferably greater than the total specific surface area of the conductive powder (A) mainly composed of Ni. In addition, by selecting the average particle size and content of the common material powder, the total specific surface area of the common material powder in the paste can be greater than the total specific surface area of the conductive powder (A) mainly composed of Ni. However, if the average particle size of the common material powder is too small, the powder itself will sinter too quickly as the surface area increases, thereby reducing the effect of suppressing the sintering of the conductive powder mainly composed of Ni. Therefore, the average particle size of the common material powder is preferably greater than 0.01μm.

本發明的Ni糊膏係在不致阻礙本發明效果之前提下,亦可含有上述以外的金屬元素之公知化合物,在各種目的下,亦可添加例如:CaO、ZrO2、Y2O3、Ti4O7、TiO2、Co3O4、Fe2O3、La2O3、Li2O、MgO、MoO3、SrO、V2O5、WO3、CuO等各種化合物。又,本發明並未排除含有Sn成分。因為Sn在煅燒中會與Ni形成合金化導致熔點降低,而促進燒結,因而判斷會發生前述成球現象。所以,若Sn化合物係使用不會與Ni進行合金化者、或即使合金化但仍不會發生成球現象程度的含 量,亦可與(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、或(D4)含Al添加劑併用。 The Ni paste of the present invention may contain known compounds of metal elements other than the above mentioned without hindering the effect of the present invention. For various purposes, various compounds such as CaO, ZrO 2 , Y 2 O 3 , Ti 4 O 7 , TiO 2 , Co 3 O 4 , Fe 2 O 3 , La 2 O 3 , Li 2 O , MgO, MoO 3 , SrO, V 2 O 5 , WO 3 , CuO, etc. may also be added. In addition, the present invention does not exclude the inclusion of Sn components. This is because Sn will form an alloy with Ni during calcination, resulting in a decrease in the melting point and promoting sintering, so it is judged that the above-mentioned balling phenomenon will occur. Therefore, if the Sn compound is one that does not alloy with Ni, or if the content is such that balling does not occur even if alloyed, it can be used together with (D1) Ta-containing additives, (D2) Nb-containing additives, (D3) stabilized zirconia (SZ), or (D4) Al-containing additives.

本發明的Ni糊膏係除上述之外,視需要尚可含有在內部電極形成用Ni糊膏中通常添加之例如:可塑劑、分散劑、界面活性劑等添加劑。 In addition to the above, the Ni paste of the present invention may contain additives such as plasticizers, dispersants, surfactants, etc. that are usually added to Ni paste for forming internal electrodes as needed.

本發明的Ni糊膏係將上述(A)主要為Ni的導電性粉末、(B)黏結樹脂、(C)有機溶劑、「從(D1)含Ta添加劑、(D2)含Nb添加劑、(D3)安定化二氧化鋯(SZ)、及(D4)含Al添加劑所構成群組中選擇至少1種」、及其他視需要添加的共通材料粉末與各種添加劑,依照常法均勻混合分散便可調製。 The Ni paste of the present invention is prepared by uniformly mixing and dispersing the above-mentioned (A) conductive powder mainly composed of Ni, (B) binder resin, (C) organic solvent, "at least one selected from the group consisting of (D1) Ta-containing additive, (D2) Nb-containing additive, (D3) stabilized zirconia (SZ), and (D4) Al-containing additive", and other common material powders and various additives added as needed according to conventional methods.

本發明的積層陶瓷電容器係使用本發明的Ni糊膏,依照如下方法製造。 The multilayer ceramic capacitor of the present invention is manufactured using the Ni paste of the present invention according to the following method.

首先,使介電質陶瓷原料粉末分散於樹脂黏合劑中,利用刮漿刀法、模具式塗佈法等施行薄片成形,而製作含有介電質陶瓷原料粉末的陶瓷胚片。供形成介電質層的介電質陶瓷原料粉末,係使用例如:鈦酸鋇系、鋯酸鍶系、鋯酸鈣鍶系等鈣鈦礦型氧化物,或將構成該等的金屬元素其中一部分利用其他金屬元素置換者等,通常以鈣鈦礦型氧化物為主成分的粉末。視需要在該等原料粉末中摻合為調整電容器特性的各種添加劑。當原料粉末的粒徑係例如介電質陶瓷層厚度設在5.0μm以下的情況,平均粒徑較佳係0.05~0.4μm左右。其次,在所獲得陶瓷胚片上,利用網版印刷等普通方法塗佈本發明的Ni糊膏,經乾燥除去溶劑,形成既定圖案的內部電極糊膏乾燥膜。接著,將已形成內部電極糊膏膜 的陶瓷胚片重疊既定片數,施行加熱壓黏,而製作未煅燒的積層體。接著,將所獲得積層體裁剪為既定形狀後,依高溫煅燒,同時將介電質層與電極層施行燒結,獲得積層陶瓷電容器基體。然後,在基體的二端面燒烙形成端子電極,獲得本發明的積層陶瓷電容器。另外,端子電極亦可在上述積層體煅燒前便安裝,同時與積層體進行煅燒。 First, the dielectric ceramic raw material powder is dispersed in a resin binder, and thin sheets are formed by a doctor blade method, a mold coating method, etc., to produce a ceramic green sheet containing the dielectric ceramic raw material powder. The dielectric ceramic raw material powder for forming the dielectric layer is a powder of calcite-titanic oxides such as barium titanate, strontium zirconate, and calcium strontium zirconate, or a part of the metal elements constituting the same is replaced by other metal elements, usually with calcite-titanic oxides as the main component. Various additives for adjusting the characteristics of the capacitor are mixed into the raw material powder as needed. When the particle size of the raw material powder is, for example, when the thickness of the dielectric ceramic layer is set to be less than 5.0μm, the average particle size is preferably about 0.05~0.4μm. Next, the Ni paste of the present invention is applied to the obtained ceramic green sheet by a common method such as screen printing, and the solvent is removed by drying to form a dried film of the internal electrode paste of a predetermined pattern. Next, the ceramic green sheets with the internal electrode paste film formed are overlapped by a predetermined number of sheets, and are subjected to heat pressing to produce an unfired laminate. Next, the obtained laminate is cut into a predetermined shape, and then calcined at a high temperature, and the dielectric layer and the electrode layer are sintered at the same time to obtain a laminated ceramic capacitor substrate. Then, the terminal electrodes are sintered on the two end faces of the substrate to obtain the laminated ceramic capacitor of the present invention. In addition, the terminal electrode can also be installed before the above-mentioned laminate is calcined and calcined simultaneously with the laminate.

依此獲得的本發明積層陶瓷電容器,係具備有:由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層的陶瓷積層體;以及形成於上述陶瓷積層體外表面的外部電極;而,上述陶瓷積層體係含有從下述所構成群組中選擇至少1種:(D1)相對於上述(A)含Ni之導電性成分100.0質量份,依Ta2O5換算0.025~2.50質量份範圍內之Ta;(D2)相對於上述(A)含Ni之導電性成分100.0質量份,依Nb2O5換算0.010~1.80質量份範圍內之Nb;以及(D4)相對於上述(A)含Ni之導電性成分100.0質量份,依Al2O3換算0.10~5.50質量份範圍內之Al。 The multilayer ceramic capacitor of the present invention thus obtained comprises: a ceramic laminate composed of a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni in an alternating manner; and an external electrode formed on the outer surface of the ceramic laminate; and the ceramic laminate contains at least one selected from the following group: (D1) Ta in the range of 0.025 to 2.50 parts by mass as calculated as Ta2O5 relative to 100.0 parts by mass of the conductive component containing Ni (A); (D2) Nb2O in the range of 1.0 to 2.5 parts by mass as calculated as Nb2O5 relative to 100.0 parts by mass of the conductive component containing Ni (A); 5 converted to Nb in the range of 0.010-1.80 parts by mass; and (D4) relative to 100.0 parts by mass of the conductive component containing Ni in (A), 0.10-5.50 parts by mass of Al converted to Al 2 O 3 .

再者,本發明的積層陶瓷電容器,係具備有:由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層的陶瓷積層體;以及形成於上述陶瓷積層體外表面的外部電極;其中,在鄰接上述內部電極層與上述陶瓷介電質層的界面及其附近(即,從陶瓷介電質層與內部電極層的界面,朝介電質層方向距離陶瓷介 電質層厚1/16的區域起,至從該界面朝內部電極層方向距離內部電極層厚1/2的區域間之區域範圍中任一部分處),設有具從Ta、Nb、Zr、安定化劑中之金屬元素、及Al所構成群組中選擇至少1種元素的濃度高峰之擴散區域(擴散層)。 Furthermore, the multilayer ceramic capacitor of the present invention comprises: a ceramic multilayer body formed by alternating a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni; and an external electrode formed on the outer surface of the ceramic multilayer body; wherein the external electrode is formed at and near the interface between the internal electrode layer and the ceramic dielectric layer (i.e., from the interface between the ceramic dielectric layer and the internal electrode layer to the outer electrode layer). A diffusion region (diffusion layer) having a peak concentration of at least one element selected from the group consisting of Ta, Nb, Zr, metal elements in the stabilizer, and Al is provided in any part of the region from a region 1/16 of the thickness of the ceramic dielectric layer in the direction of the dielectric layer to a region 1/2 of the thickness of the internal electrode layer in the direction of the internal electrode layer from the interface.

上述擴散區域係從Ta、Nb、Zr、安定化劑中的金屬元素、及Al所構成群組中選擇至少1種元素的濃度,係具有從上述內部電極層朝向上述陶瓷介電質層的方向提高,在碰到濃度高峰後便降低之濃度分佈的區域。 The above diffusion region is a region where the concentration of at least one element selected from the group consisting of Ta, Nb, Zr, metal elements in the stabilizer, and Al increases from the above internal electrode layer toward the above ceramic dielectric layer and decreases after reaching a concentration peak.

再者,上述安定化劑中的金屬元素較佳係從Y、Ca、Mg及Sc中選擇1種以上。 Furthermore, the metal element in the above stabilizer is preferably selected from at least one of Y, Ca, Mg and Sc.

本發明積層陶瓷電容器的陶瓷介電質層,係介電質陶瓷原料粉末使用例如:鈦酸鋇系、鋯酸鍶系、鋯酸鈣鍶系等鈣鈦礦型氧化物、或構成該等的金屬元素其中一部分利用其他金屬元素置換者等,通常以鈣鈦礦型氧化物為主成分的粉末,將該等介電質陶瓷原料粉末施行薄片成形,於還原性環境下,依900~1400℃、較佳1100~1300℃施行煅燒而形成者。 The ceramic dielectric layer of the multilayer ceramic capacitor of the present invention is formed by using dielectric ceramic raw material powders such as barium titanate, strontium zirconate, calcium strontium zirconate, etc., or metal elements constituting the above are partially replaced by other metal elements, etc., usually with strontium titanate oxide as the main component, and the dielectric ceramic raw material powders are formed into sheets and calcined at 900~1400℃, preferably 1100~1300℃ in a reducing environment.

本發明的積層陶瓷電容器中,含Ni的內部電極層係使用本發明Ni糊膏施行形成者,即,將本發明Ni糊膏利用網版印刷等,成形於介電質層形成用陶瓷胚片上,經乾燥,再利用煅燒而形成。Ni糊膏中中所含的Ta成分、Nb成分、安定二氧化鋯(SZ)成分、或Al成分,大部分如前述,在煅燒中會從內部電極層朝陶瓷介電質層移動,而在內部電極層與陶瓷介電質層的界面及其附近處,形成高濃度含有Ta、Nb、Zr及安定化劑中之金屬元素、或Al的擴散區域(擴散層)。另外,擴散區域(擴散 層)中,Ta、Nb、Zr及安定化劑中之金屬元素、或Al的濃度分佈並非均勻,而是Ta、Nb、Zr及安定化劑中之金屬元素、或Al之濃度,從內部電極層朝介電質層的方向提高,在碰到濃度高峰後呈降低的濃度分佈。截至現階段為止的研究結果,該濃度高峰推測在界面附近,但位置尚未正確特定。即,擴散層的厚度、濃度斜率的形狀、濃度高峰的位置係依照煅燒溫度、煅燒時間、升溫速度等煅燒分佈而有所不同。例如在使用含Ta添加劑的實驗例中,當急速升溫施行短時間煅燒的情況,形成具備有Ta成分從內部電極層朝介電質層擴散,且在該介電質層中,Ta僅偏存於極接近與內部電極層界面位置處之急遽濃度斜率(濃度高峰)的擴散層。又,另一實驗例,當長時間施行煅燒的情況,在內部電極層中幾乎沒有觀察到Ta,在介電質層中形成具較寬的Ta濃度斜率(濃度高峰)之擴散層。 In the multilayer ceramic capacitor of the present invention, the internal electrode layer containing Ni is formed using the Ni paste of the present invention, that is, the Ni paste of the present invention is formed on a ceramic green sheet for dielectric layer formation by screen printing, etc., dried, and then calcined. As mentioned above, most of the Ta component, Nb component, stabilized zirconia (SZ) component, or Al component contained in the Ni paste will move from the internal electrode layer to the ceramic dielectric layer during calcination, and a diffusion region (diffusion layer) containing Ta, Nb, Zr, metal elements in the stabilizer, or Al at a high concentration is formed at the interface between the internal electrode layer and the ceramic dielectric layer and in the vicinity thereof. In addition, in the diffusion region (diffusion layer), the concentration distribution of Ta, Nb, Zr, metal elements in the stabilizer, or Al is not uniform, but the concentration of Ta, Nb, Zr, metal elements in the stabilizer, or Al increases from the inner electrode layer toward the dielectric layer, and after reaching the concentration peak, the concentration distribution decreases. According to the research results so far, the concentration peak is estimated to be near the interface, but the position has not been accurately determined. That is, the thickness of the diffusion layer, the shape of the concentration slope, and the position of the concentration peak vary according to the calcination distribution such as calcination temperature, calcination time, and heating rate. For example, in the experimental example using a Ta-containing additive, when the temperature is rapidly raised and calcined for a short time, a diffusion layer is formed in which the Ta component diffuses from the inner electrode layer to the dielectric layer, and in the dielectric layer, Ta is only concentrated at a position very close to the interface with the inner electrode layer. In another experimental example, when calcination is performed for a long time, Ta is hardly observed in the inner electrode layer, and a diffusion layer with a wider Ta concentration slope (concentration peak) is formed in the dielectric layer.

所以,本發明積層陶瓷電容器的特徵,係使介電質與內部電極層重疊的陶瓷積層體中,含有從:(D1)相對於(A)含Ni之導電性成分100.0質量份中,依Ta2O5換算0.025~2.50質量份、較佳0.025~0.80質量份範圍內的Ta;(D2)相對於(A)含Ni之導電性成分100.0質量份當中,依Nb2O5換算0.010~1.80質量份、較佳0.010~0.50質量份範圍內的Nb;以及(D4)相對於(A)含Ni之導電性成分100.0質量份中,依Al2O3換算0.10~5.50質量份、較佳0.10~2.30質量份範圍內的Al所構成群組中選擇至少1種。 Therefore, the characteristic of the multilayer ceramic capacitor of the present invention is that the ceramic laminate with the dielectric and the internal electrode layer stacked contains: (D1) Ta in the range of 0.025-2.50 mass parts, preferably 0.025-0.80 mass parts, calculated as Ta2O5 , relative to 100.0 mass parts of the conductive component (A) containing Ni; (D2) Nb in the range of 0.010-1.80 mass parts, preferably 0.010-0.50 mass parts, calculated as Nb2O5 , relative to 100.0 mass parts of the conductive component (A) containing Ni; and ( D4) Al2O5 in the range of 100.0 mass parts of the conductive component (A) containing Ni. 3. Select at least one of the group consisting of Al in the range of 0.10 to 5.50 parts by mass, preferably 0.10 to 2.30 parts by mass.

再者,本發明積層陶瓷電容器的特徵,係具備有:由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層的陶瓷積層體;以及 形成於上述陶瓷積層體外表面的外部電極;而,在鄰接上述內部電極層與上述陶瓷介電質層的界面及其附近,設有從Ta、Nb、Zr、安定化劑中之金屬元素、及Al所構成群組中選擇至少1種元素的擴散區域(擴散層)。上述安定化劑中的金屬元素較佳係從Y、Ca、Mg及Sc中選擇1種以上。 Furthermore, the multilayer ceramic capacitor of the present invention is characterized by having: a ceramic multilayer body composed of a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni in alternating layers; and an external electrode formed on the outer surface of the ceramic multilayer body; and a diffusion region (diffusion layer) of at least one element selected from the group consisting of Ta, Nb, Zr, metal elements in the stabilizer, and Al is provided at and near the interface between the internal electrode layer and the ceramic dielectric layer. The metal element in the stabilizer is preferably selected from at least one of Y, Ca, Mg and Sc.

再者,本發明的積層陶瓷電容器係利用上述特徵,而提升高溫負載壽命,所以即使介電質層更薄層化及施加高電場強度電壓,仍可呈現優異可靠性。 Furthermore, the multilayer ceramic capacitor of the present invention utilizes the above characteristics to improve the high temperature load life, so even if the dielectric layer is thinner and a high electric field strength voltage is applied, it can still show excellent reliability.

另外,介電質層及內部電極層係含有Ta成分、Nb成分、安定化二氧化鋯(SZ)成分、或Al成分,以及具有該等從內部電極層朝陶瓷介電質層的方向提高,在碰到濃度高峰後便降低之濃度分佈的擴散區域(擴散層),係藉由例如:SEM(掃描式電子顯微鏡)、TEM(穿透式電子顯微鏡)、或STEM(掃描穿透式電子顯微鏡),與例如:EDS(能量分散式X射線光譜法)、WDS(波長色散X射線光譜法)、或EELS(電子能量損失光譜法)等元素分析手法的組合便可確認。 In addition, the dielectric layer and the internal electrode layer contain Ta components, Nb components, stabilized zirconia (SZ) components, or Al components, and have a diffusion region (diffusion layer) with a concentration distribution that increases from the internal electrode layer toward the ceramic dielectric layer and decreases after reaching a concentration peak. This can be confirmed by combining elemental analysis techniques such as SEM (scanning electron microscope), TEM (transmission electron microscope), or STEM (scanning transmission electron microscope) with EDS (energy dispersive X-ray spectroscopy), WDS (wavelength dispersive X-ray spectroscopy), or EELS (electron energy loss spectroscopy).

本發明積層陶瓷電容器中,含Ni的內部電極層係將本發明的Ni糊膏在還原性環境下,依900~1400℃、較佳1100~1300℃施行煅燒而形成者。 In the multilayer ceramic capacitor of the present invention, the internal electrode layer containing Ni is formed by calcining the Ni paste of the present invention at 900~1400℃, preferably 1100~1300℃ in a reducing environment.

本發明積層陶瓷電容器的外部電極,係在能使用為積層陶瓷電容器的外部電極之前提下,其餘並無特別的限制。 The external electrode of the multilayer ceramic capacitor of the present invention is based on the premise that it can be used as the external electrode of the multilayer ceramic capacitor, and there are no special restrictions on other aspects.

再者,本發明的積層陶瓷電容器,係具備有: 由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層的陶瓷積層體;以及形成於上述陶瓷積層體外表面的外部電極;其中,上述內部電極層係將本發明的Ni糊膏依900~1400℃施行煅燒的煅燒物形成。 Furthermore, the multilayer ceramic capacitor of the present invention comprises: a ceramic multilayer body composed of a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni alternately stacked; and an external electrode formed on the outer surface of the ceramic multilayer body; wherein the internal electrode layer is formed by calcining the Ni paste of the present invention at 900-1400°C.

本發明的積層陶瓷電容器中,內部電極層係將本發明的Ni糊膏利用網版印刷等,成形於積層層形成用陶瓷胚片上,經乾燥、煅燒而形成。本發明Ni糊膏的煅燒溫度係900~1400℃、較佳係1100~1300℃,煅燒環境係還原性環境。即,內部電極層係由本發明Ni糊膏的900~1400℃、較佳1100~1300℃之煅燒物形成。 In the multilayer ceramic capacitor of the present invention, the internal electrode layer is formed by forming the Ni paste of the present invention on a ceramic green sheet for multilayer formation by screen printing, etc., and then drying and calcining. The calcination temperature of the Ni paste of the present invention is 900~1400℃, preferably 1100~1300℃, and the calcination environment is a reducing environment. That is, the internal electrode layer is formed by the calcined product of the Ni paste of the present invention at 900~1400℃, preferably 1100~1300℃.

以下,針對本發明根據具體實驗例進行說明,惟,本發明並不僅侷限於該等。 The present invention is described below based on specific experimental examples, but the present invention is not limited to them.

[實施例] [Implementation example] <<(D1)含Ta添加劑及(D2)含Nb添加劑>> <<(D1) contains Ta additive and (D2) contains Nb additive>> (實施例1) (Implementation Example 1) <Ni糊膏及積層陶瓷電容器之製造> <Manufacturing of Ni paste and multilayer ceramic capacitors>

相對於平均粒徑0.3μm的球狀鎳粉末100.0g,將成為表1或表2所示質量份比例的Ta2O5或Nb2O5、共通材料粉末的平均粒徑0.05μm之BaTiO3粉末10.0g、乙基纖維素(黏結樹脂)6.0g、界面活性劑2.0g、可塑劑1.0g、及二氫萜品醇醋酸酯(有機溶劑)100.0g的比例進行混合,使用三輥研磨機施行混練而製作Ni糊膏。 With respect to 100.0 g of spherical nickel powder with an average particle size of 0.3 μm, Ta 2 O 5 or Nb 2 O 5 in the mass proportions shown in Table 1 or Table 2, 10.0 g of BaTiO 3 powder with an average particle size of 0.05 μm of common material powder, 6.0 g of ethyl cellulose (binder resin), 2.0 g of surfactant, 1.0 g of plasticizer, and 100.0 g of dihydroterpineol acetate (organic solvent) were mixed and kneaded using a three-roll mill to prepare a Ni paste.

其次,在陶瓷胚片主成分的平均粒徑0.2μm之BaTiO3粉末中,添加聚乙烯丁醛系黏合劑、乙醇、以及調整電容器特性的添加劑,利用研磨介質分散機施行濕式混合,調製得陶瓷漿料。 Next, polyvinyl butyraldehyde-based binder, ethanol, and additives for adjusting capacitor properties are added to BaTiO 3 powder with an average particle size of 0.2 μm, which is the main component of the ceramic green sheet, and wet mixing is performed using a grinding medium disperser to prepare a ceramic slurry.

將該陶瓷漿料利用模具式塗佈法施行薄片成形,而準備厚度5.5μm的陶瓷胚片。 The ceramic slurry is formed into a thin sheet using a mold coating method to prepare a ceramic green sheet with a thickness of 5.5μm.

接著,在該陶瓷胚片上,將Ni糊膏印刷1.5mm×3.0mm矩形圖案後,經乾燥而形成內部電極乾燥膜。內部電極乾燥膜的厚度係1.5μm。將具內部電極乾燥膜的陶瓷胚片依介電質有效層成為50層方式重疊,在90℃下施加1250kg/cm2壓力而施行壓黏與成形,獲得未煅燒的陶瓷積層體。 Next, Ni paste was printed on the ceramic green sheet in a 1.5 mm × 3.0 mm rectangular pattern, and dried to form an internal electrode dry film. The thickness of the internal electrode dry film was 1.5 μm. The ceramic green sheets with the internal electrode dry film were stacked in a manner such that the dielectric effective layer formed 50 layers, and pressed and formed at 90° C with a pressure of 1250 kg/cm2 to obtain an unfired ceramic laminate.

將該陶瓷積層體在由N2-0.1%H2-H2O氣體構成的環境中,依700℃加熱,使黏合劑燃燒後,在1220℃下由氧分壓1×10-8atm的N2-0.1%H2-H2O氣體所構成還原環境中,依5℃/min升溫速度升溫,於1220℃中保持2小時而使燒結緻密化,然後在冷卻階段於N2-H2O氣體環境中,依1000℃施行3小時的再氧化處理,獲得積層陶瓷基體。 The ceramic laminate was heated at 700°C in an environment consisting of N2-0.1 % H2 - H2O gas to burn the binder, and then heated at 1220°C in a reducing environment consisting of N2-0.1 % H2 - H2O gas with an oxygen partial pressure of 1× 10-8 atm at a heating rate of 5°C/min, and maintained at 1220°C for 2 hours to achieve sintering densification. Then, in the cooling stage, it was reoxidized at 1000°C for 3 hours in an N2 - H2O gas environment to obtain a laminated ceramic substrate.

接著,在積層陶瓷基體的二端面,塗佈含有Cu粉末與BaO系玻璃料的外部電極形成用Cu糊膏,於N2環境中,依780℃溫度施行燒烙而形成外部電極,藉此製得積層陶瓷電容器。 Next, a Cu paste for forming external electrodes containing Cu powder and BaO-based glass frit is applied to both end surfaces of the multilayer ceramic substrate, and fired at 780°C in an N2 environment to form external electrodes, thereby manufacturing a multilayer ceramic capacitor.

依此步驟對上述所有Ni糊膏均實施,而獲得表1或表2的試料。另外,表1或表2中,試料編號有標註「*」的試料係不符合本發明要件的比較例。 This step is applied to all the above Ni pastes to obtain the samples in Table 1 or Table 2. In addition, in Table 1 or Table 2, the samples with sample numbers marked with "*" are comparative examples that do not meet the requirements of the present invention.

所獲得積層陶瓷電容器的外形尺寸係寬(W):1.6mm、長(L):3.2mm、厚度(T):0.7mm,內部電極層的厚度係1.2μm,介存於內部電 極間的陶瓷介電質層厚度係4.0μm。又,介電質層每1層的對向電極面積係3.25mm2The dimensions of the obtained multilayer ceramic capacitor are width (W): 1.6mm, length (L): 3.2mm, thickness (T): 0.7mm, the thickness of the internal electrode layer is 1.2μm, the thickness of the ceramic dielectric layer between the internal electrodes is 4.0μm. In addition, the area of the opposing electrode per dielectric layer is 3.25mm2 .

<特性之評價> <Evaluation of characteristics>

針對依如上述製作的各積層陶瓷電容器(表1及表2的試料),依照以下所說明方法施行高溫負載測試,且施行內部電極層的連續性評價,以及觀察陶瓷介電質層與內部電極層的界面附近,確認到有形成Ta或Nb的濃度係從內部電極層朝陶瓷介電質層的方向提高,在碰到濃度高峰後便降低的擴散區域(擴散層)。 For each multilayer ceramic capacitor (samples in Table 1 and Table 2) manufactured as described above, a high temperature load test was performed according to the method described below, and the continuity of the internal electrode layer was evaluated. In addition, the interface between the ceramic dielectric layer and the internal electrode layer was observed, and it was confirmed that a diffusion region (diffusion layer) was formed in which the concentration of Ta or Nb increased from the internal electrode layer toward the ceramic dielectric layer and decreased after reaching a peak concentration.

(1)高溫負載測試 (1) High temperature load test

從各試料分別取樣15個,依180℃、60V的條件施行高溫負載測試,將絕緣電阻直到降低一個數量級為止所需要的時間,設為各積層陶瓷電容器的失效時間。然後,將該失效時間施行韋伯描點,求取MTTF(平均失效時間)。MTTF的評價結果合併記於表1或表2中,且分別整理如圖1、圖2所示。 15 samples were taken from each sample and subjected to high temperature load test at 180℃ and 60V. The time required for the insulation resistance to drop by one order of magnitude was set as the failure time of each multilayer ceramic capacitor. Then, the failure time was subjected to Weber plotting to obtain MTTF (mean time to failure). The evaluation results of MTTF are combined and recorded in Table 1 or Table 2, and are organized as shown in Figure 1 and Figure 2 respectively.

(2)內部電極層之連續性評價 (2) Evaluation of the continuity of the internal electrode layer

將各試料的各積層陶瓷電容器從內部電極層的正交面切斷,使用SEM(掃描式電子顯微鏡)進行觀察。觀察倍率係1000倍,從觀察視野中隨機挑選10條內部電極,計測電極所存在部分相對於全體長度的比例,並以此評價連續性。此處,連續性係達90%以上評為「◎」,80~90%評為「○」,未滿80%評為「×」,合併記於表1或表2中。 Each multilayer ceramic capacitor of each sample was cut from the orthogonal plane of the internal electrode layer and observed using a SEM (scanning electron microscope). The observation magnification was 1000 times, and 10 internal electrodes were randomly selected from the observation field of view. The ratio of the electrode portion to the total length was measured, and the continuity was evaluated based on this. Here, the continuity was rated as "◎" for more than 90%, "○" for 80-90%, and "×" for less than 80%, and the results were recorded in Table 1 or Table 2.

[表1]

Figure 110113028-A0305-12-0026-1
[Table 1]
Figure 110113028-A0305-12-0026-1

1)相對於球狀鎳粉末100質量份的質量份 1) Mass fraction relative to 100 mass fraction of spherical nickel powder

2)各試料之MTFF相對於試料1A(無添加Ta2O5)之MTFF的比(各試料之MTFF/試料1A之MTTF) 2) Ratio of MTFF of each sample to MTFF of sample 1A (without Ta 2 O 5 addition) (MTFF of each sample/MTTF of sample 1A)

Figure 110113028-A0305-12-0026-2
Figure 110113028-A0305-12-0026-2

1)相對於球狀鎳粉末100質量份的質量份 1) Mass fraction relative to 100 mass fraction of spherical nickel powder

2)各試料之MTFF相對於試料1A(無添加Nb2O5)之MTFF的比(各試料之MTFF/試料1A之MTTF) 2) Ratio of MTFF of each sample to MTFF of sample 1A (without Nb 2 O 5 addition) (MTFF of each sample/MTTF of sample 1A)

如表1與表2所示,相對於未混合Ta2O5或Nb2O5的試料(試料編號1A),在本發明所規定範圍內混合Ta2O5或Nb2O5的所有試料(試料編號2A~10A及12A~20A),出現MTTF增加。 As shown in Tables 1 and 2, compared with the sample without Ta 2 O 5 or Nb 2 O 5 (sample number 1A), all samples (sample numbers 2A to 10A and 12A to 20A) mixed with Ta 2 O 5 or Nb 2 O 5 within the range specified in the present invention showed an increase in MTTF.

再者,針對內部電極的連續性,試料編號2A~7A及12A~16A呈現90%以上,試料編號8A~10A及17A~20A呈現80~90%。 Furthermore, regarding the continuity of the internal electrodes, sample numbers 2A~7A and 12A~16A showed over 90%, and sample numbers 8A~10A and 17A~20A showed 80~90%.

另一方面,Ta2O5或Nb2O5的混合超過本發明所規定範圍的試料(試料編號11A及21A),MTTF較低於沒有混合Ta2O5或Nb2O5的試料(試料編號1A),且內部電極的連續性未滿80%。 On the other hand, the samples in which Ta2O5 or Nb2O5 was mixed beyond the range specified in the present invention (sample numbers 11A and 21A) had lower MTTF than the sample without Ta2O5 or Nb2O5 (sample number 1A ), and the continuity of the internal electrode was less than 80%.

由以上得知,為提升高溫負載壽命,相對於球狀鎳粉末100質量份,當Ta2O5的情況最好混合0.025~2.50質量份,當Nb2O5的情況最好混合0.01~1.80質量份,又若當Ta2O5的情況混合0.025~0.80質量份、當Nb2O5的情況混合0.01~0.50質量份範圍內,便可在不致損及內部電極的連續性情況下,更加提升高負載壽命。 From the above, it can be seen that in order to improve the high-temperature load life, relative to 100 mass parts of spherical nickel powder , it is best to mix 0.025~2.50 mass parts of Ta2O5 and 0.01~ 1.80 mass parts of Nb2O5 . If the mixing range is 0.025~0.80 mass parts of Ta2O5 and 0.01 ~ 0.50 mass parts of Nb2O5 , the high-load life can be further improved without damaging the continuity of the internal electrode.

<<(D3)安定化二氧化鋯(SZ)>> <<(D3) Stabilized zirconium dioxide (SZ)>> (實施例2及比較例1) (Implementation Example 2 and Comparative Example 1) <Ni糊膏及積層陶瓷電容器之製造> <Manufacturing of Ni paste and multilayer ceramic capacitors> (Ni糊膏之製作) (Preparation of Ni paste)

比較例1係依相對於平均粒徑0.3μm的球狀鎳粉末100.0g,成為表3所示莫耳數比例準備ZrO2,更依共通材料粉末的平均粒徑0.05μm之BaTiO3粉末10.0g、乙基纖維素(黏結樹脂)6.0g、界面活性劑2.0g、可塑 劑1.0g、及二氫萜品醇醋酸酯(有機溶劑)100.0g的比例進行混合,使用三輥研磨機施行混練而製作Ni糊膏。 Comparative Example 1 is to prepare ZrO 2 in the molar ratio shown in Table 3 relative to 100.0 g of spherical nickel powder with an average particle size of 0.3 μm, and further mix 10.0 g of BaTiO 3 powder with an average particle size of 0.05 μm of common material powder, 6.0 g of ethyl cellulose (binder resin), 2.0 g of surfactant, 1.0 g of plasticizer, and 100.0 g of dihydroterpineol acetate (organic solvent), and use a three-roll mill to knead and prepare Ni paste.

再者,實施例2係除取代ZrO2,改為依成為表4所示莫耳數的比例使用3.0莫耳%氧化釔安定化二氧化鋯(3.0-YSZ)之外,其餘均依照與比較例1同樣地製作Ni糊膏。 In Example 2, the Ni paste was prepared in the same manner as in Comparative Example 1 except that 3.0 mol% yttrium oxide-stabilized zirconia (3.0-YSZ) was used in place of ZrO 2 in the molar ratio shown in Table 4.

(積層陶瓷電容器之製造) (Manufacturing of multilayer ceramic capacitors)

其次,在陶瓷胚片主成分的平均粒徑0.2μm之BaTiO3粉末中,添加聚乙烯丁醛系黏合劑、乙醇、以及調整電容器特性的添加劑,利用研磨介質分散機施行濕式混合,調製得陶瓷漿料。 Next, polyvinyl butyraldehyde-based binder, ethanol, and additives for adjusting capacitor properties are added to BaTiO 3 powder with an average particle size of 0.2 μm, which is the main component of the ceramic green sheet, and wet mixing is performed using a grinding medium disperser to prepare a ceramic slurry.

將該陶瓷漿料利用模具式塗佈法施行薄片成形,而準備厚度5.5μm的陶瓷胚片。 The ceramic slurry was formed into a thin sheet using a mold coating method to prepare a ceramic green sheet with a thickness of 5.5 μm .

接著,在該陶瓷胚片上,將實施例2與比較例1的Ni糊膏印刷1.5mm×3.0mm矩形圖案後,經乾燥而形成內部電極乾燥膜。內部電極乾燥膜的厚度係1.5μm。將具內部電極乾燥膜的陶瓷胚片依介電質有效層成為50層方式重疊,在90℃下施加1250kg/cm2壓力而施行壓黏與成形,獲得未煅燒的陶瓷積層體。 Next, the Ni paste of Example 2 and Comparative Example 1 was printed on the ceramic green sheet in a 1.5 mm × 3.0 mm rectangular pattern, and then dried to form an inner electrode dry film. The thickness of the inner electrode dry film was 1.5 μm. The ceramic green sheets with the inner electrode dry film were stacked in a manner such that the dielectric effective layer formed 50 layers, and were pressed and formed at 90°C with a pressure of 1250 kg/ cm2 to obtain an unfired ceramic laminate.

將該陶瓷積層體在由N2-0.1%H2-H2O氣體構成的環境中,依700℃加熱,使黏合劑燃燒後,在1220℃下由氧分壓1×10-8atm的N2-0.1%H2-H2O氣體所構成還原環境中,依5℃/min升溫速度升溫,於1220℃中保持2小時而使燒結緻密化,然後在冷卻階段於N2-H2O氣體環境中,依1000℃施行3小時的再氧化處理,獲得積層陶瓷基體。 The ceramic laminate was heated at 700°C in an environment consisting of N2-0.1 % H2 - H2O gas to burn the binder, and then heated at 1220°C in a reducing environment consisting of N2-0.1 % H2 - H2O gas with an oxygen partial pressure of 1× 10-8 atm at a heating rate of 5°C/min, and maintained at 1220°C for 2 hours to achieve sintering densification. Then, in the cooling stage, it was reoxidized at 1000°C for 3 hours in an N2 - H2O gas environment to obtain a laminated ceramic substrate.

接著,在積層陶瓷基體的二端面,塗佈含有Cu粉末與BaO系玻璃料的外部電極形成用Cu糊膏,於N2環境中,依780℃溫度施行燒烙而形成外部電極,藉此製得積層陶瓷電容器。 Next, a Cu paste for forming external electrodes containing Cu powder and BaO-based glass frit is applied to both end surfaces of the multilayer ceramic substrate, and fired at 780°C in an N2 environment to form external electrodes, thereby manufacturing a multilayer ceramic capacitor.

依此步驟對上述所有Ni糊膏均實施,而獲得表3或表4的試料1B~21B。另外,表3或表4中,試料編號有標註「*」的試料係未符合本發明要件的比較例。 This step was applied to all the above Ni pastes to obtain samples 1B to 21B in Table 3 or Table 4. In addition, in Table 3 or Table 4, the samples with sample numbers marked with "*" are comparative examples that do not meet the requirements of the present invention.

所獲得積層陶瓷電容器的外形尺寸係寬(W):1.6mm、長(L):3.2mm、厚度(T):0.7mm,內部電極層的厚度係1.2μm,介存於內部電極間的陶瓷介電質層厚度係4.0μm。又,介電質層每1層的對向電極面積係3.25mm2The dimensions of the obtained multilayer ceramic capacitor are width (W): 1.6mm, length (L): 3.2mm, thickness (T): 0.7mm, the thickness of the internal electrode layer is 1.2μm, the thickness of the ceramic dielectric layer between the internal electrodes is 4.0μm. In addition, the area of the opposing electrode per dielectric layer is 3.25mm2 .

<特性之評價> <Evaluation of characteristics>

針對依如上述製作的各積層陶瓷電容器(表3及表4的試料),依照以下所說明方法施行高溫負載測試,且施行內部電極層的連續性評價,以及觀察陶瓷介電質層與內部電極層的界面附近,確認到有形成Zr及/或安定化劑中的金屬元素Y之濃度係從內部電極層朝陶瓷介電質層的方向提高,在碰到濃度高峰後便降低的擴散區域(擴散層)。 For each of the multilayer ceramic capacitors (samples in Table 3 and Table 4) manufactured as described above, a high temperature load test was performed according to the method described below, and the continuity of the internal electrode layer was evaluated. In addition, the interface between the ceramic dielectric layer and the internal electrode layer was observed, and it was confirmed that a diffusion region (diffusion layer) was formed in which the concentration of Zr and/or the metal element Y in the stabilizer increased from the internal electrode layer toward the ceramic dielectric layer, and then decreased after reaching a peak concentration.

(1)高溫負載測試 (1) High temperature load test

從各試料分別取樣15個,依180℃、60V的條件施行高溫負載測試,將絕緣電阻直到降低一個數量級為止所需要的時間,設為各積層陶瓷電 容器的失效時間。然後,將該失效時間施行韋伯描點,求取MTTF(平均失效時間)。MTTF的評價結果合併記於表3或表4中。 15 samples were taken from each sample and subjected to high temperature load test at 180℃ and 60V. The time required for the insulation resistance to drop by one order of magnitude was set as the failure time of each multilayer ceramic capacitor. Then, the failure time was subjected to Weber plotting to obtain MTTF (mean time to failure). The evaluation results of MTTF are combined and recorded in Table 3 or Table 4.

再者,為比對比較例1與實施例2,便將各自的MTTF整理如圖3所示。 Furthermore, to compare Example 1 and Example 2, their respective MTTFs are organized as shown in Figure 3.

再者,求取添加安定化二氧化鋯(3.0-YSZ)的MTTF,相對於比較例1之添加二氧化鋯(ZrO2)的MTTF,結果整理如表5與圖4所示。 Furthermore, the MTTF of adding stabilized zirconium dioxide (3.0-YSZ) was calculated, and compared with the MTTF of adding zirconium dioxide (ZrO 2 ) in Comparative Example 1, the results are summarized in Table 5 and FIG. 4 .

(2)內部電極層之連續性評價 (2) Evaluation of the continuity of the internal electrode layer

將各試料的各積層陶瓷電容器從內部電極層的正交面切斷,使用SEM(掃描式電子顯微鏡)進行觀察。觀察倍率係1000倍,從觀察視野中隨機挑選10條內部電極,計測電極所存在部分相對於全體長度的比例,並以此評價連續性。此處,連續性係達90%以上評為「◎」,80~90%評為「○」,未滿80%評為「×」,合併記於表3或表4中。 Each multilayer ceramic capacitor of each sample was cut from the orthogonal plane of the internal electrode layer and observed using a SEM (scanning electron microscope). The observation magnification was 1000 times, and 10 internal electrodes were randomly selected from the observation field of view. The ratio of the electrode portion to the total length was measured, and the continuity was evaluated based on this. Here, the continuity was rated as "◎" for more than 90%, "○" for 80-90%, and "×" for less than 80%, and the results were recorded in Table 3 or Table 4.

Figure 110113028-A0305-12-0030-3
Figure 110113028-A0305-12-0030-3

1)相對於球狀鎳粉末100g的莫耳數 1) Molar number relative to 100g of spherical nickel powder

2)各試料的MTTF相對於試料1B(無添加)的MTTF之比(各試料之MTTF/試料1B之MTTF) 2) The ratio of the MTTF of each sample to the MTTF of sample 1B (no additive) (MTTF of each sample/MTTF of sample 1B)

Figure 110113028-A0305-12-0031-4
Figure 110113028-A0305-12-0031-4

1)相對於球狀鎳粉末100g的莫耳數 1) Molar number relative to 100g of spherical nickel powder

2)各試料的MTTF相對於試料1B(無添加)的MTTF之比(各試料的MTTF/試料1B的MTTF) 2) The ratio of the MTTF of each sample to the MTTF of sample 1B (no additive) (MTTF of each sample/MTTF of sample 1B)

Figure 110113028-A0305-12-0031-5
Figure 110113028-A0305-12-0031-5

1)添加3.0-YSZ試料的MTTF相對於添加同莫耳量ZrO2的試料之比(添加3.0-YSZ試料的MTTF/添加同莫耳ZrO2試料的MTTF) 1) Ratio of MTTF of the sample with 3.0-YSZ added to the sample with the same molar amount of ZrO 2 added (MTTF of the sample with 3.0-YSZ added/MTTF of the sample with the same molar amount of ZrO 2 added)

如表3~表5、及圖3~圖4所示,相對於沒有混合ZrO2與安定化二氧化鋯(3.0-YSZ)的無添加試料(試料1B),在本發明所規定範圍內混合安定化二氧化鋯(3.0-YSZ)的所有試料(試料12B~20B)均係MTTF有增加。又,相對於添加同莫耳二氧化鋯(ZrO2)的試料(試料2B~10B),亦是在本發明所規定範圍內混合安定化二氧化鋯(3.0-YSZ)的所有試料(試料12B~20B)均係MTTF獲提高。 As shown in Tables 3 to 5 and Figures 3 to 4, all samples (Samples 12B to 20B) mixed with stabilized zirconia (3.0-YSZ) within the range specified in the present invention have increased MTTF compared to the sample without addition (Sample 1B) in which ZrO 2 and stabilized zirconia (3.0-YSZ) are not mixed. In addition, all samples (Samples 12B to 20B) mixed with stabilized zirconia (3.0-YSZ) within the range specified in the present invention have improved MTTF compared to the samples (Samples 2B to 10B) added with the same mole of zirconia (ZrO 2).

再者,內部電極的連續性係試料12B~18B呈90%以上,試料19B~20B呈80~90%。 Furthermore, the continuity of the internal electrode is more than 90% for samples 12B~18B and 80~90% for samples 19B~20B.

另一方面,安定化二氧化鋯(3.0-YSZ)的混合超過本發明所規定範圍之試料(試料21B),MTTF較低於有混合二氧化鋯(ZrO2)的試料(試料11B),且內部電極的連續性未滿80%。 On the other hand, the sample (sample 21B) in which the stabilized zirconium dioxide (3.0-YSZ) was mixed beyond the range specified in the present invention had a lower MTTF than the sample (sample 11B) in which zirconium dioxide (ZrO 2 ) was mixed, and the continuity of the internal electrode was less than 80%.

由上述得知,相對於球狀鎳粉末100g,藉由混合安定化二氧化鋯(3.0-YSZ)0.05×10-2~2.20×10-2莫耳,相較於無添加、以及添加二氧化鋯(ZrO2)的情況下,可提升高溫負載壽命,又若在0.05×10-2~1.40×10-2莫耳範圍內,便可在不致損及內部電極的連續性情況下,更加提升高負載壽命。 From the above, it can be seen that, relative to 100g of spherical nickel powder, by mixing 0.05×10 -2 ~2.20×10 -2 mol of stabilized zirconium dioxide (3.0-YSZ), the high-temperature load life can be improved compared to the case of no addition and the case of adding zirconium dioxide (ZrO 2 ). If it is within the range of 0.05×10 -2 ~1.40×10 -2 mol, the high-load life can be further improved without damaging the continuity of the internal electrode.

(實施例3) (Implementation Example 3) <Ni糊膏及積層陶瓷電容器之製造> <Manufacturing of Ni paste and multilayer ceramic capacitors> (Ni糊膏脂之調製) (Preparation of Ni paste and grease)

依相對於平均粒徑0.3μm的球狀鎳粉末100.0g成為0.80×10-2莫耳比例,準備經依表6所示含量(X莫耳%)的氧化釔(Y2O3)安定化之安定化 二氧化鋯(X-YSZ)粉末,更依成為共通材料粉末的平均粒徑0.05μm之BaTiO3粉末10.0g、乙基纖維素(黏結樹脂)6.0g、界面活性劑2.0g、可塑劑1.0g、及二氫萜品醇醋酸酯(有機溶劑)100.0g的比例進行混合,使用三輥研磨機施行混練而製作Ni糊膏。 Stabilized zirconia (X-YSZ) powder stabilized with yttrium oxide (Y 2 O 3 ) at a content (X mol %) as shown in Table 6 was prepared at a molar ratio of 0.80×10 -2 relative to 100.0 g of spherical nickel powder having an average particle size of 0.3 μm. 10.0 g of BaTiO 3 powder having an average particle size of 0.05 μm, which was a common material powder, 6.0 g of ethyl cellulose (binder resin), 2.0 g of a surfactant, 1.0 g of a plasticizer, and 100.0 g of dihydroterpineol acetate (organic solvent) were mixed and kneaded using a three-roll mill to prepare a Ni paste.

(積層陶瓷電容器之製造) (Manufacturing of multilayer ceramic capacitors)

除使用上述Ni糊膏之外,其餘均與實施例2同樣。 Except for using the above-mentioned Ni paste, the rest is the same as Example 2.

依此步驟對上述所有Ni糊膏均實施,而獲得表6的試料22B~28B。 This step was applied to all the above Ni pastes to obtain samples 22B~28B in Table 6.

<特性評價> <Characteristics evaluation>

除使用上述所獲得試料之外,其餘均依照與實施例2同樣地實施。結果合併記於表6。 Except for using the samples obtained above, the rest is implemented in the same way as Example 2. The results are summarized in Table 6.

不改變安定化二氧化鋯(X-YSZ)含量、僅改變安定化劑含量情況的MTTF(試料16B、22B~28B),相對於二氧化鋯(ZrO2)與安定化二氧化鋯(YSZ)均無添加情況的MTTF(試料1B)之比[即,MTTF(X-YSZ)/MTTF(無添加)],如圖5中的黑點(縱軸左側)所示。 The ratio of the MTTF (Samples 16B, 22B~28B) when only the stabilizer content is changed without changing the stabilizer content to the MTTF (Sample 1B) when neither ZrO 2 nor stabilizer YSZ is added is shown as the black dots (left side of the vertical axis) in Figure 5.

再者,相對於經添加同量二氧化鋯(ZrO2)的MTTF(試料6B),同樣添加安定化二氧化鋯(X-YSZ)的MTTF(試料16B、22B~28B)之比[即,MTTF(X-YSZ)/MTTF(ZrO2)],如圖5中的方形點(縱軸右側)所示。 Furthermore, the ratio of the MTTF (samples 16B, 22B to 28B) with the same addition of stabilized zirconia (X-YSZ) to the MTTF (sample 6B) with the same addition of zirconia (ZrO 2 ) [i.e., MTTF (X-YSZ) / MTTF (ZrO 2 )] is shown as the square points (right side of the vertical axis) in FIG5 .

Figure 110113028-A0305-12-0034-6
Figure 110113028-A0305-12-0034-6

1)X係指安定化二氧化鋯(YSZ)中的Y2O3含有莫耳%。 1) X refers to the mole % of Y2O3 in stabilized zirconium dioxide (YSZ).

2)各試料的MTTF相對於試料1B(無添加)的MTTF之比(各試料的MTTF/試料1B的MTTF) 2) The ratio of the MTTF of each sample to the MTTF of sample 1B (no additive) (MTTF of each sample/MTTF of sample 1B)

3)各試料的MTTF相對於經添加同莫耳ZrO2的試料6B之比(各試料的MTTF/試料6B的MTTF) 3) Ratio of MTTF of each sample to sample 6B with the same molar amount of ZrO2 added (MTTF of each sample/MTTF of sample 6B)

如表6與圖5所示,安定化二氧化鋯(YSZ)中的安定化劑(Y2O3)含量與電極膜連續性之間並沒有發現關聯性。但,若安定化劑(Y2O3)含量達50.0莫耳%以上,相對於添加二氧化鋯(ZrO2)的比較例(試料6B)以及無添加的比較例(試料1B)之下,MTTF較低。所以,本發明的安定化二氧化鋯(YSZ)中,若安定化劑(Y2O3)含量在超過0.0莫耳%且45.0莫耳%以下的範圍內,便可獲得良好的結果,較佳係超過0.0莫耳%且40.0莫耳%以下的範圍內,更佳係8.0~25.0莫耳%的範圍。 As shown in Table 6 and Figure 5, there is no correlation between the stabilizer (Y 2 O 3 ) content in stabilized zirconium dioxide (YSZ) and the continuity of the electrode film. However, when the stabilizer (Y 2 O 3 ) content is above 50.0 mol%, the MTTF is lower than that of the comparative example with zirconium dioxide (ZrO 2 ) added (Sample 6B) and the comparative example without addition (Sample 1B). Therefore, in the stabilized zirconium dioxide (YSZ) of the present invention, if the content of the stabilizer (Y 2 O 3 ) is in the range of more than 0.0 mol % and less than 45.0 mol %, good results can be obtained, preferably in the range of more than 0.0 mol % and less than 40.0 mol %, and more preferably in the range of 8.0-25.0 mol %.

(實施例4) (Implementation Example 4) <Ni糊膏及積層陶瓷電容器之製造> <Manufacturing of Ni paste and multilayer ceramic capacitors> (Ni糊膏之調製) (Preparation of Ni paste)

依相對於平均粒徑0.3μm的球狀鎳粉末100.0g,成為0.80×10-2莫耳的比例,準備含有表7所示種類安定化劑10.0莫耳%的安定化二氧化鋯(10.0-SZ)粉末,更依成為共通材料粉末的平均粒徑0.05μm之BaTiO3粉末10.0g、乙基纖維素(黏結樹脂)6.0g、界面活性劑2.0g、可塑劑1.0g、及二氫萜品醇醋酸酯(有機溶劑)100.0g的比例進行混合,使用三輥研磨機施行混練而製作Ni糊膏。 A stabilized zirconium dioxide (10.0-SZ) powder containing 10.0 mol% of the stabilizer shown in Table 7 was prepared in a ratio of 0.80×10 -2 mol to 100.0 g of spherical nickel powder having an average particle size of 0.3 μm. 10.0 g of BaTiO 3 powder having an average particle size of 0.05 μm, 6.0 g of ethyl cellulose (binder resin), 2.0 g of a surfactant, 1.0 g of a plasticizer, and 100.0 g of dihydroterpineol acetate (organic solvent) were mixed in a ratio of 0.80×10 -2 mol to 100.0 g of a spherical nickel powder having an average particle size of 0.3 μm. A three-roll mill was used to knead the mixture to prepare a Ni paste.

(積層陶瓷電容器之製造) (Manufacturing of multilayer ceramic capacitors)

除使用上述Ni糊膏之外,其餘均依照與實施例2同樣。 Except for using the above-mentioned Ni paste, the rest is the same as Example 2.

依此步驟對上述所有Ni糊膏均實施,而獲得表7的試料29B~31B。 This step was applied to all the above Ni pastes to obtain samples 29B~31B in Table 7.

<特性評價> <Characteristics evaluation>

除使用上述所獲得試料之外,其餘均依照實施例2同樣地實施。結果合併記於表7中。 Except for using the samples obtained above, the rest are implemented in the same way as Example 2. The results are summarized in Table 7.

Figure 110113028-A0305-12-0035-7
Figure 110113028-A0305-12-0035-7

1)各試料的MTTF相對於試料1B(無添加)的MTTF之比(各試料的MTTF/試料1B的MTTF) 1) The ratio of the MTTF of each sample to the MTTF of sample 1B (no additive) (MTTF of each sample/MTTF of sample 1B)

2)各試料的MTTF相對於經添加同莫耳ZrO2的試料6B之比(各試料的MTTF/試料6B的MTTF) 2) Ratio of MTTF of each sample to sample 6B with the same molar amount of ZrO2 added (MTTF of each sample/MTTF of sample 6B)

由表7的結果得知,即使安定化劑係使用氧化鈣(CaO)、氧化鎂(MgO)、氧化鈧(Sc2O3),仍可與氧化釔(Y2O3)同樣,在不致使內部電極膜連續性降低情況下,提升高溫負載壽命。 From the results in Table 7, it can be seen that even if the stabilizer is calcium oxide (CaO), magnesium oxide (MgO), or Sc 2 O 3 , it can still improve the high temperature load life without reducing the continuity of the internal electrode film, just like yttrium oxide (Y 2 O 3 ).

<<(D4)含Al添加劑>> <<(D4) Contains Al additives>> (實施例5) (Example 5) <Ni糊膏及積層陶瓷電容器之製造> <Manufacturing of Ni paste and multilayer ceramic capacitors>

依相對於平均粒徑0.3μm的球狀鎳粉末100.0g,成為表8所示質量份比例的Al2O3,與依成為共通材料粉末的平均粒徑0.05μm之BaTiO3粉末10.0g、乙基纖維素(黏結樹脂)6.0g、界面活性劑2.0g、可塑劑1.0g、及二氫萜品醇醋酸酯(有機溶劑)100.0g的比例進行混合,使用三輥研磨機施行混練而製作Ni糊膏。 Al 2 O 3 in the mass proportions shown in Table 8 was mixed with 100.0 g of spherical nickel powder with an average particle size of 0.3 μm, 10.0 g of BaTiO 3 powder with an average particle size of 0.05 μm as a common material powder, 6.0 g of ethyl cellulose (binder resin), 2.0 g of surfactant, 1.0 g of plasticizer, and 100.0 g of dihydroterpineol acetate (organic solvent) and kneaded using a three-roll mill to prepare a Ni paste.

其次,在陶瓷胚片主成分的平均粒徑0.2μm之BaTiO3粉末中,添加聚乙烯丁醛系黏合劑、乙醇、以及調整電容器特性的添加劑,利用研磨介質分散機施行濕式混合,調製得陶瓷漿料。 Next, polyvinyl butyraldehyde-based binder, ethanol, and additives for adjusting capacitor properties are added to BaTiO 3 powder with an average particle size of 0.2 μm, which is the main component of the ceramic green sheet, and wet mixing is performed using a grinding medium disperser to prepare a ceramic slurry.

將該陶瓷漿料利用模具式塗佈法施行薄片成形,而準備厚度5.5μm的陶瓷胚片。 The ceramic slurry was formed into a thin sheet using a mold coating method to prepare a ceramic green sheet with a thickness of 5.5 μm .

接著,在該陶瓷胚片上,將Ni糊膏印刷1.5mm×3.0mm矩形圖案後,經乾燥而形成內部電極乾燥膜。內部電極乾燥膜的厚度係1.5μm。將具內 部電極乾燥膜的陶瓷胚片依介電質有效層成為50層方式重疊,在90℃下施加1250kg/cm2壓力而施行壓黏與成形,獲得未煅燒的陶瓷積層體。 Next, Ni paste was printed on the ceramic green sheet in a 1.5 mm × 3.0 mm rectangular pattern, and dried to form an internal electrode dry film. The thickness of the internal electrode dry film was 1.5 μm. The ceramic green sheets with the internal electrode dry film were stacked in a manner such that the dielectric effective layer formed 50 layers, and pressed and formed at 90° C with a pressure of 1250 kg/cm2 to obtain an unfired ceramic laminate.

將該陶瓷積層體在由N2-0.1%H2-H2O氣體構成的環境中,依700℃加熱,使黏合劑燃燒後,在1220℃下由氧分壓1×10-8atm的N2-0.1%H2-H2O氣體所構成還原環境中,依5℃/min升溫速度升溫,於1220℃中保持2小時而使燒結緻密化,然後在冷卻階段於N2-H2O氣體環境中,依1000℃施行3小時的再氧化處理,獲得積層陶瓷基體。 The ceramic laminate was heated at 700°C in an environment consisting of N2-0.1 % H2 - H2O gas to burn the binder, and then heated at 1220°C in a reducing environment consisting of N2-0.1 % H2 - H2O gas with an oxygen partial pressure of 1× 10-8 atm at a heating rate of 5°C/min, and maintained at 1220°C for 2 hours to achieve sintering densification. Then, in the cooling stage, it was reoxidized at 1000°C for 3 hours in an N2 - H2O gas environment to obtain a laminated ceramic substrate.

接著,在積層陶瓷基體的二端面,塗佈含有Cu粉末與BaO系玻璃料的外部電極形成用Cu糊膏,於N2環境中,依780℃溫度施行燒烙而形成外部電極,藉此製得積層陶瓷電容器。 Next, a Cu paste for forming external electrodes containing Cu powder and BaO-based glass frit is applied to both end surfaces of the multilayer ceramic substrate, and fired at 780°C in an N2 environment to form external electrodes, thereby manufacturing a multilayer ceramic capacitor.

依此步驟對上述所有Ni糊膏均實施,而獲得表8的試料。另外,表8中,試料編號有標註「*」的試料係不符合本發明要件的比較例。 This step was applied to all the above Ni pastes to obtain the samples in Table 8. In addition, in Table 8, the samples with sample numbers marked with "*" are comparative examples that do not meet the requirements of the present invention.

所獲得積層陶瓷電容器的外形尺寸係寬(W):1.6mm、長(L):3.2mm、厚度(T):0.7mm,內部電極層的厚度係1.2μm,介存於內部電極間的陶瓷介電質層厚度係4.0μm。又,介電質層每1層的對向電極面積係3.25mm2The dimensions of the obtained multilayer ceramic capacitor are width (W): 1.6mm, length (L): 3.2mm, thickness (T): 0.7mm, the thickness of the internal electrode layer is 1.2μm, the thickness of the ceramic dielectric layer between the internal electrodes is 4.0μm. In addition, the area of the opposing electrode per dielectric layer is 3.25mm2 .

<特性之評價> <Evaluation of characteristics>

針對依如上述製作的各積層陶瓷電容器(表8的試料),依照以下所說明方法施行高溫負載測試,且施行內部電極層的連續性評價,以及觀察陶瓷介電質層與內部電極層的界面附近,確認到有形成Al濃度係從內部電極層朝陶瓷介電質層的方向提高,在碰到濃度高峰後便降低的擴散區域(擴散層)。 For each multilayer ceramic capacitor (sample in Table 8) manufactured as described above, a high temperature load test was performed according to the method described below, and the continuity of the internal electrode layer was evaluated. In addition, the interface between the ceramic dielectric layer and the internal electrode layer was observed, and it was confirmed that a diffusion region (diffusion layer) was formed in which the Al concentration increased from the internal electrode layer toward the ceramic dielectric layer and decreased after reaching the concentration peak.

(1)高溫負載測試 (1) High temperature load test

從各試料分別取樣15個,依180℃、60V的條件施行高溫負載測試,將絕緣電阻直到降低一個數量級為止所需要的時間,設為各積層陶瓷電容器的失效時間。然後,將該失效時間施行韋伯描點,求取MTTF(平均失效時間)。MTTF的評價結果合併記於表8中,且分別整理如圖6所示。 15 samples were taken from each sample and subjected to high temperature load test at 180℃ and 60V. The time required for the insulation resistance to drop by one order of magnitude was set as the failure time of each multilayer ceramic capacitor. Then, the failure time was subjected to Weber plotting to obtain MTTF (mean time to failure). The evaluation results of MTTF are combined in Table 8 and are organized as shown in Figure 6.

(2)內部電極層之連續性評價 (2) Evaluation of the continuity of the internal electrode layer

將各試料的各積層陶瓷電容器從內部電極層的正交面切斷,使用SEM(掃描式電子顯微鏡)進行觀察。觀察倍率係1000倍,從觀察視野中隨機挑選10條內部電極,計測電極所存在部分相對於全體長度的比例,並以此評價連續性。此處,連續性係達90%以上評為「◎」,80~90%評為「○」,未滿80%評為「×」,合併記於表8中。 Each multilayer ceramic capacitor of each sample was cut from the orthogonal plane of the internal electrode layer and observed using a SEM (scanning electron microscope). The observation magnification was 1000 times, and 10 internal electrodes were randomly selected from the observation field of view. The ratio of the electrode portion to the total length was measured, and the continuity was evaluated based on this. Here, the continuity was rated as "◎" for more than 90%, "○" for 80-90%, and "×" for less than 80%, and the results are recorded in Table 8.

Figure 110113028-A0305-12-0038-8
Figure 110113028-A0305-12-0038-8

1)相對於球狀鎳粉末100質量份的質量份 1) Mass fraction relative to 100 mass fraction of spherical nickel powder

2)各試料之MTFF相對於試料1C(無添加Al2O3)之MTFF的比(各試料之MTFF/試料1C之MTTF) 2) Ratio of MTFF of each sample to MTFF of sample 1C (without Al 2 O 3 addition) (MTFF of each sample/MTTF of sample 1C)

如表8所示,相對於沒有混合Al2O2的試料(試料編號1C),依本發明所規定範圍混合Al2O3的所有試料(試料編號2C~15C)均呈MTTF增加。 As shown in Table 8, compared with the sample without Al 2 O 2 (sample number 1C), all samples mixed with Al 2 O 3 within the range specified in the present invention (sample numbers 2C to 15C) showed an increase in MTTF.

再者,內部電極的連續性係試料編號2C~11C呈90%以上,試料編號12C~15C呈80~90%。 Furthermore, the continuity of the internal electrode is more than 90% for sample numbers 2C~11C and 80~90% for sample numbers 12C~15C.

另一方面,Al2O3混合超越本發明所規定範圍的試料(試料編號16C),MTTF較低於沒有混合Al2O3的試料(試料編號1C),且內部電極的連續性未滿80%。 On the other hand, the sample in which Al 2 O 3 was mixed beyond the range specified in the present invention (sample number 16C) had a lower MTTF than the sample without Al 2 O 3 (sample number 1C), and the continuity of the internal electrode was less than 80%.

由以上得知,為提升高溫負載壽命,相對於球狀鎳粉末100質量份,Al2O3最好混合0.10~5.50質量份,若在0.10~2.30質量份範圍內,便可在不致損及內部電極的連續性情況下,更加提升高負載壽命。 From the above, it can be seen that in order to improve the high-temperature load life, relative to 100 mass parts of spherical nickel powder , Al2O3 is preferably mixed in an amount of 0.10~5.50 mass parts. If it is within the range of 0.10~2.30 mass parts, the high-load life can be further improved without damaging the continuity of the internal electrode.

Claims (7)

一種積層陶瓷電容器中擴散區域之形成方法,其係在具備有:由複數陶瓷介電質層與含Ni之複數內部電極層交錯積層之陶瓷積層體;以及形成於上述陶瓷積層體的外表面之外部電極的積層陶瓷電容器之中, 於鄰接之上述內部電極層與上述陶瓷介電質層之界面及其附近,形成從Ta、Nb、Zr、及安定化劑中的金屬元素所構成群組中選擇之至少1種元素的擴散區域之方法, 至少具有製作形成上述陶瓷介電質層之陶瓷胚片、與形成上述內部電極層之內部電極糊膏膜交互重疊既定片數之積層體,並於還原性環境下依900~1400℃施行煅燒之步驟; 上述內部電極糊膏膜係使用含有(A)主要為Ni的導電性粉末、(B)黏結樹脂、(C)有機溶劑、及(D)添加劑之Ni糊膏而形成, 且,上述(D)添加劑為從下述所構成群組中選擇之至少1種: (D1)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Ta 2O 5換算0.025~0.80質量份範圍內之Ta的添加劑; (D2)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Nb 2O 5換算0.010~0.50質量份範圍內之Nb的添加劑;及 (D3)相對於上述(A)主要為Ni的導電性粉末100g為0.05×10 -2~1.40×10 -2莫耳範圍內之經利用依8.0~25.0莫耳%範圍含有的安定化劑使二氧化鋯結晶構造安定化的安定化二氧化鋯(SZ)。 A method for forming a diffusion region in a multilayer ceramic capacitor, wherein in the multilayer ceramic capacitor having: a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni alternately stacked; and an external electrode formed on the outer surface of the ceramic multilayer, a diffusion region of at least one element selected from the group consisting of Ta, Nb, Zr, and metal elements in a stabilizer is formed at and near the interface between the adjacent internal electrode layer and the ceramic dielectric layer. The invention comprises at least a step of manufacturing a laminated body of a predetermined number of ceramic green sheets forming the ceramic dielectric layer and an internal electrode paste film forming the internal electrode layer, and performing calcination at 900-1400° C. in a reducing environment; the internal electrode paste film is formed using a Ni paste containing (A) a conductive powder mainly composed of Ni, (B) a binder resin, (C) an organic solvent, and (D) an additive, and the additive (D) is at least one selected from the following group: (D1) an additive containing 0.025-0.80 parts by mass of Ta in terms of Ta 2 O 5 relative to 100.0 parts by mass of the conductive powder (A) mainly composed of Ni; (D2) an additive containing 0.010 to 0.50 parts by mass of Nb in terms of Nb2O5 relative to 100.0 parts by mass of the conductive powder (A) mainly comprising Ni; and (D3) stabilized zirconia (SZ) containing a stabilizer in the range of 8.0 to 25.0 mol% relative to 100 g of the conductive powder (A) mainly comprising Ni, wherein the zirconia crystal structure is stabilized in the range of 0.05× 10-2 to 1.40× 10-2 mol. 如請求項1之積層陶瓷電容器中擴散區域之形成方法,其中, 上述界面及其附近,係從鄰接之上述內部電極層與上述陶瓷介電質層之界面,朝介電質層側距離陶瓷介電質層厚1/16的區域起,至從該界面朝內部電極層側距離內部電極層厚1/2的區域間之區域, 上述擴散區域中,上述Ta、Nb、Zr、及安定化劑中的金屬元素所構成群組中選擇之至少1種元素的濃度,係具有從上述內部電極層側朝向上述陶瓷介電質層側的方向提高,在碰到濃度高峰後便降低之濃度分佈。 A method for forming a diffusion region in a multilayer ceramic capacitor as claimed in claim 1, wherein the interface and its vicinity are a region from the interface between the adjacent internal electrode layer and the ceramic dielectric layer, from a region 1/16 of the thickness of the ceramic dielectric layer toward the dielectric layer side, to a region 1/2 of the thickness of the internal electrode layer from the interface toward the internal electrode layer side, and the concentration of at least one element selected from the group consisting of Ta, Nb, Zr, and metal elements in the stabilizer in the diffusion region has a concentration distribution that increases in a direction from the internal electrode layer side toward the ceramic dielectric layer side and decreases after reaching a concentration peak. 如請求項1或2之積層陶瓷電容器中擴散區域之形成方法,其中,上述安定化劑中的金屬元素係從Y、Ca、Mg及Sc中選擇之1種以上。A method for forming a diffusion region in a multilayer ceramic capacitor as claimed in claim 1 or 2, wherein the metal element in the stabilizer is one or more selected from Y, Ca, Mg and Sc. 一種積層陶瓷電容器,其具備: 陶瓷積層體,其係由複數陶瓷介電質層、與含Ni之複數內部電極層交錯積層;以及 外部電極,其係形成於上述陶瓷積層體的外表面; 且具有:於鄰接之上述內部電極層與上述陶瓷介電質層之界面及其附近,具有從Ta、Nb、Zr、及安定化劑中的金屬元素所構成群組中選擇之至少1種元素的擴散區域,該擴散區域係藉由請求項1之積層陶瓷電容器中擴散區域之形成方法所形成之擴散區域, 上述界面及其附近,係從鄰接之上述內部電極層與上述陶瓷介電質層之界面,朝介電質層側距離陶瓷介電質層厚1/16的區域起,至從該界面朝內部電極層側距離內部電極層厚1/2的區域間之區域, 上述擴散區域中,上述Ta、Nb、Zr、及安定化劑中的金屬元素所構成群組中選擇之至少1種元素的濃度,係具有從上述內部電極層側朝向上述陶瓷介電質層側的方向提高,在碰到濃度高峰後便降低之濃度分佈。 A multilayer ceramic capacitor, comprising: a ceramic multilayer body, which is a plurality of ceramic dielectric layers and a plurality of internal electrode layers containing Ni interlaced; and an external electrode, which is formed on the outer surface of the ceramic multilayer body; and having: at the interface between the adjacent internal electrode layer and the ceramic dielectric layer and in the vicinity thereof, a diffusion region having at least one element selected from the group consisting of Ta, Nb, Zr, and metal elements in a stabilizer, the diffusion region being a diffusion region formed by the method for forming a diffusion region in a multilayer ceramic capacitor of claim 1, The interface and its vicinity are the region from the interface between the adjacent internal electrode layer and the ceramic dielectric layer, from the region at a distance of 1/16 of the thickness of the ceramic dielectric layer toward the dielectric layer side, to the region at a distance of 1/2 of the thickness of the internal electrode layer from the interface toward the internal electrode layer side. In the diffusion region, the concentration of at least one element selected from the group consisting of the metal elements in the Ta, Nb, Zr, and stabilizer increases in the direction from the internal electrode layer side toward the ceramic dielectric layer side, and decreases after reaching a concentration peak. 如請求項4之積層陶瓷電容器,其中,上述安定化劑中的金屬元素係從Y、Ca、Mg及Sc中選擇之1種以上。As in claim 4, the multilayer ceramic capacitor, wherein the metal element in the stabilizer is one or more selected from Y, Ca, Mg and Sc. 一種Ni糊膏,係含有: (A)主要為Ni的導電性粉末、 (B)黏結樹脂、 (C)有機溶劑、及 (D)添加劑; 上述(D)添加劑為從下述所構成群組中選擇之至少1種: (D1)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Ta 2O 5換算0.025~0.80質量份範圍內之Ta的添加劑; (D2)相對於上述(A)主要為Ni的導電性粉末100.0質量份,含有依Nb 2O 5換算0.010~0.50質量份範圍內之Nb的添加劑;及 (D3)二氧化鋯的結晶構造經利用8.0~25.0莫耳%之範圍內的安定化劑安定化,且相對於上述(A)主要為Ni的導電性粉末100g為0.05×10 -2~1.40×10 -2莫耳範圍內的安定化二氧化鋯(SZ)。 A Ni paste comprises: (A) a conductive powder mainly composed of Ni, (B) a binder resin, (C) an organic solvent, and (D) an additive; wherein the additive (D) is at least one selected from the following group: (D1) an additive containing 0.025 to 0.80 parts by weight of Ta in terms of Ta2O5 relative to 100.0 parts by weight of the conductive powder (A) mainly composed of Ni ; (D2) an additive containing 0.025 to 0.80 parts by weight of Nb2O5 relative to 100.0 parts by weight of the conductive powder ( A ) mainly composed of Ni; 5 converted to an additive of Nb in the range of 0.010 to 0.50 parts by mass; and (D3) the crystal structure of the zirconium dioxide is stabilized by using a stabilizer in the range of 8.0 to 25.0 mol %, and the stabilized zirconium dioxide (SZ) is in the range of 0.05×10 -2 to 1.40×10 -2 mol relative to 100 g of the conductive powder (A) mainly comprising Ni. 如請求項6之Ni糊膏,其中,當含有上述(D3)安定化二氧化鋯(SZ)的情況,上述安定化劑係從Y 2O 3、CaO、MgO及Sc 2O 3中選擇之1種以上。 The Ni paste of claim 6, wherein when the (D3) stabilized zirconium dioxide (SZ) is contained, the stabilizer is at least one selected from Y 2 O 3 , CaO, MgO and Sc 2 O 3 .
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