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TWI880689B - Adhesion device and inspection method - Google Patents

Adhesion device and inspection method Download PDF

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Publication number
TWI880689B
TWI880689B TW113111405A TW113111405A TWI880689B TW I880689 B TWI880689 B TW I880689B TW 113111405 A TW113111405 A TW 113111405A TW 113111405 A TW113111405 A TW 113111405A TW I880689 B TWI880689 B TW I880689B
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substrate
acf
image
section
conductive film
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TW113111405A
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TW202438991A (en
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菊池一哉
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日商芝浦機械電子裝置股份有限公司
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Abstract

發明提供一種可進行ACF相對於基板的黏附狀態的檢查並且提高生產效率的黏附裝置及黏附方法。實施形態的黏附裝置具有:工作臺,對多個基板進行保持;壓接部,將ACF壓接於多個基板;供給部,供給ACF;驅動機構,使基板與壓接部對位;拍攝部,對黏附於基板的ACF進行拍攝;判定部,在壓接部將ACF壓接於基板的期間,對拍攝部所拍攝的另一基板的圖像中的基板的傾斜度進行判定;修正部,基於所述傾斜度對基板在圖像中的傾斜度進行修正;以及檢查部,基於由修正部修正後的圖像對ACF的黏附狀態進行檢查。The invention provides a bonding device and bonding method that can inspect the adhesion state of ACF relative to a substrate and improve production efficiency. The bonding device in an implementation form has: a workbench that holds multiple substrates; a pressing part that presses ACF to the multiple substrates; a supply part that supplies ACF; a driving mechanism that aligns the substrate with the pressing part; a photographing part that photographs the ACF adhered to the substrate; a determination part that determines the inclination of the substrate in an image of another substrate photographed by the photographing part while the pressing part presses the ACF to the substrate; a correction part that corrects the inclination of the substrate in the image based on the inclination; and an inspection part that inspects the adhesion state of the ACF based on the image corrected by the correction part.

Description

黏附裝置及檢查方法Adhesion device and inspection method

本發明涉及一種黏附裝置及檢查方法。The present invention relates to an adhesion device and an inspection method.

在顯示面板等基板上經由各向異性導電膜(Anisotropic Conducting Film,ACF)接合積體電路(Integrated Circuit,IC)或搭載有IC的覆晶薄膜(Chip on Film,CОF)、柔性印刷電路(Flexible printed circuit,FPC)等電子零件的情況下,事先通過ACF的黏附裝置將ACF黏附於基板上後對電子零件進行壓接(接合)。黏附於面板上的ACF必須正常地黏附於規定的位置。因此,一直以來,在黏附ACF之後,基於對ACF進行拍攝而得的圖像對黏附狀態進行檢查。 [現有技術文獻] [專利文獻] When electronic components such as an integrated circuit (IC) or a chip on film (CFO) or a flexible printed circuit (FPC) with an IC are bonded to a substrate such as a display panel via an anisotropic conductive film (ACF), the electronic components are pressed (bonded) after the ACF is bonded to the substrate by an ACF bonding device. The ACF bonded to the panel must be bonded normally to a predetermined position. Therefore, after bonding the ACF, the bonding state has been checked based on an image taken of the ACF. [Prior art literature] [Patent literature]

[專利文獻1]日本專利特開平9-34372號公報[Patent Document 1] Japanese Patent Publication No. 9-34372

[發明所要解決的問題][Problem to be solved by the invention]

在此種黏附裝置中,就檢查效率及檢查結果向黏附工序的反映的觀點而言,可考慮在黏附裝置上進行黏附狀態的檢查。另外,就黏附效率的觀點而言,可考慮投入多張基板來進行處理。例如,可考慮通過在一個工作臺上保持兩張基板並在兩張基板上黏附ACF,從而可提高生產效率。但是,在此情況下,由於保持於工作臺上的兩張基板的姿勢會產生偏差,因此會對檢查造成影響,有時也對檢查產生障礙。因此,若對基板的姿勢進行修正後進行拍攝而對黏附狀態進行檢查,則節拍時間不會提高,生產效率受到抑制。In such a bonding device, from the perspective of inspection efficiency and reflection of inspection results on the bonding process, it is conceivable to inspect the adhesion state on the bonding device. In addition, from the perspective of adhesion efficiency, it is conceivable to process multiple substrates. For example, it is conceivable to improve production efficiency by holding two substrates on one workbench and adhering ACF to the two substrates. However, in this case, since the posture of the two substrates held on the workbench will deviate, it will affect the inspection and sometimes hinder the inspection. Therefore, if the posture of the substrate is corrected and then photographed to inspect the adhesion state, the cycle time will not be improved and production efficiency will be suppressed.

本發明的實施形態是為了解決所述那樣的課題而成,其目的在於提供一種可進行ACF相對於基板的黏附狀態的檢查並且提高生產效率的黏附裝置及黏附方法。 [解決問題的技術手段] The embodiment of the present invention is designed to solve the above-mentioned problem, and its purpose is to provide a bonding device and bonding method that can inspect the bonding state of ACF relative to the substrate and improve production efficiency. [Technical means for solving the problem]

本發明的實施形態是一種在基板上黏附ACF的黏附裝置,且具有:工作臺,對多個所述基板進行保持;壓接部,將ACF壓接於多個所述基板的各者上;供給部,向所述壓接部供給所述ACF;驅動機構,通過改變所述工作臺相對於所述壓接部的相對位置而使所述基板與所述壓接部對位;拍攝部,對黏附於所述基板上的所述ACF進行拍攝;判定部,在所述壓接部將所述ACF壓接於所述基板上的期間,對所述拍攝部所拍攝的另一所述基板的圖像中的所述基板的傾斜度進行判定;修正部,基於通過所述判定部的判定求出的傾斜度,對所述基板在所述圖像中的傾斜度進行修正;以及檢查部,基於由所述修正部對傾斜度進行修正後的圖像,對所述ACF的黏附狀態進行檢查。The embodiment of the present invention is a bonding device for bonding ACF to a substrate, and comprises: a workbench for holding a plurality of the substrates; a crimping section for crimping the ACF to each of the plurality of the substrates; a supply section for supplying the ACF to the crimping section; a driving mechanism for aligning the substrate with the crimping section by changing the relative position of the workbench with respect to the crimping section; and a photographing section for photographing the ACF bonded to the substrate. a judging section, which judges the inclination of the substrate in the image of another substrate photographed by the photographing section while the pressing section is pressing the ACF onto the substrate; a correcting section, which corrects the inclination of the substrate in the image based on the inclination determined by the judging section; and an inspecting section, which inspects the adhesion state of the ACF based on the image after the inclination is corrected by the correcting section.

實施形態的檢查方法包括:保持工序,工作臺對多個基板進行保持;第一壓接工序,壓接部將ACF壓接於所述基板上;以及第二壓接工序,壓接部將ACF壓接於另一所述基板上;在所述第二壓接工序的期間,進行:傾斜度判定工序,判定部判定拍攝部對黏附於所述基板上的ACF進行拍攝而得的圖像中的所述基板的傾斜度;修正工序,修正部基於通過所述判定部的判定求出的傾斜度,對所述基板在所述圖像中的傾斜度進行修正;以及檢查工序,基於由所述修正部對傾斜度進行修正後的圖像,對所述ACF的黏附狀態進行檢查。 [發明的效果] The inspection method of the embodiment includes: a holding process, in which a workbench holds a plurality of substrates; a first pressing process, in which a pressing unit presses an ACF onto the substrate; and a second pressing process, in which a pressing unit presses an ACF onto another substrate; during the second pressing process, performing: a tilt determination process, in which a determination unit determines the tilt of the substrate in an image obtained by a photographing unit photographing the ACF adhered to the substrate; a correction process, in which a correction unit corrects the tilt of the substrate in the image based on the tilt determined by the determination unit; and an inspection process, in which the adhesion state of the ACF is inspected based on the image after the tilt is corrected by the correction unit. [Effect of the invention]

通過本發明的黏附裝置,可進行ACF相對於基板的黏附狀態的檢查並且提高生產效率。By using the bonding device of the present invention, the bonding state of the ACF relative to the substrate can be inspected and the production efficiency can be improved.

參照附圖對本發明的實施形態(以下稱為本實施形態)進行具體的說明。此外,附圖是示意圖,且各部的尺寸、比例等包括為了便於理解而誇張的部分。 [黏附對象] The embodiment of the present invention (hereinafter referred to as the present embodiment) is specifically described with reference to the attached drawings. In addition, the attached drawings are schematic diagrams, and the dimensions and proportions of each part include exaggerated parts for the sake of ease of understanding. [Attachment Object]

參照圖1對基於本實施形態的作為黏附對象的基板1及ACF 2進行說明。基板1是具有有機電致發光(Electroluminescence,EL)顯示器等顯示區域的顯示面板。本實施形態的基板1黏附有多個ACF 2。但是,也有黏附單一的ACF 2的情況。在基板1的其中一個面上,沿著一邊設置有具有導電性的部分即電極。設置有所述電極的區域是供黏附ACF 2的黏附區域AR。本實施形態的基板1上,在沿著基板1的端邊的方向上設定有多個黏附區域AR。例如,在圖1中,在後述的工作臺20上,從正面觀察,基板1A被保持於左側的L側,基板1B被保持於右側的R側,在各個基板1上設定有AR1~AR4此四個黏附區域。另外,在基板1上標記有對準標記(參照圖9的(A)~圖9的(C)),以所述對準標記的位置為基準,設定有多個黏附區域AR的位置。The substrate 1 and ACF 2 as the adhesion objects based on the present embodiment are explained with reference to FIG1. The substrate 1 is a display panel having a display area such as an organic electroluminescence (EL) display. A plurality of ACFs 2 are adhered to the substrate 1 of the present embodiment. However, there is also a case where a single ACF 2 is adhered. On one of the surfaces of the substrate 1, a portion having conductivity, i.e., an electrode, is provided along one side. The area where the electrode is provided is an adhesion area AR for adhering the ACF 2. On the substrate 1 of the present embodiment, a plurality of adhesion areas AR are provided in the direction along the end edge of the substrate 1. For example, in FIG1 , on a workbench 20 described later, when viewed from the front, a substrate 1A is held on the left side L, and a substrate 1B is held on the right side R, and four adhesion areas AR1 to AR4 are set on each substrate 1. In addition, alignment marks are marked on the substrate 1 (see FIG9 (A) to FIG9 (C)), and the positions of the plurality of adhesion areas AR are set based on the positions of the alignment marks.

ACF 2是各向異性導電構件,是使導電粒子分散於基材上而形成膜狀的膜。作為基材,可使用通過加熱而硬化的熱硬化性樹脂。ACF 2通過夾持於與電子零件之間進行加熱壓接,而可實現電子零件與基板1的電連接以及機械連接。ACF 2是細長的帶狀,在其中一面黏貼有脫模帶,另一面為黏著面,被切斷成適當的長度且黏著面被黏附於基板1上。ACF 2 is an anisotropic conductive member, which is a film formed by dispersing conductive particles on a substrate. As a substrate, a thermosetting resin that cures by heating can be used. ACF 2 can be clamped between electronic components and heated and pressed to achieve electrical and mechanical connection between the electronic components and the substrate 1. ACF 2 is a long and thin strip, with a release tape attached to one side and an adhesive surface on the other side. It is cut into appropriate lengths and the adhesive surface is adhered to the substrate 1.

[結構] 參照圖2及圖3對本實施形態的黏附裝置10的結構進行說明。黏附裝置10是用於將ACF 2壓接於基板1上的裝置。此外,在圖2及圖3中,將黏附裝置10進行壓接的方向設為Z方向,將在與Z方向正交的平面中相互正交的方向設為X方向、Y方向。Y方向是圖2中近前與裡側之間的方向。在以Z方向成為鉛垂方向的方式設置黏附裝置10的情況下,XY平面成為水平面。在此情況下,Z方向為高度方向,將設置面側稱為下,將相反側稱為上。另外,將與XY平面平行的旋轉方向設為θ方向。進而,圖中,將塗白的箭頭所示的一側設為正面,從正面觀察,將左側設為L側,將右側設為R側。黏附裝置10具有工作臺20、壓接部30、供給部40、驅動機構50、拍攝部60、控制裝置100。在本實施形態中,以向黏附裝置10投入兩張(一對)基板的例子進行以下的說明。 [Structure] The structure of the adhesive device 10 of this embodiment is described with reference to FIG. 2 and FIG. 3. The adhesive device 10 is a device for pressing the ACF 2 onto the substrate 1. In addition, in FIG. 2 and FIG. 3, the direction in which the adhesive device 10 is pressed is set as the Z direction, and the directions orthogonal to each other in the plane orthogonal to the Z direction are set as the X direction and the Y direction. The Y direction is the direction between the front and the back in FIG. 2. When the adhesive device 10 is set in such a manner that the Z direction becomes a vertical direction, the XY plane becomes a horizontal plane. In this case, the Z direction is a height direction, the side of the setting surface is called the bottom, and the opposite side is called the top. In addition, the rotation direction parallel to the XY plane is set as the θ direction. Furthermore, in the figure, the side indicated by the white arrow is set as the front side, and the left side is set as the L side and the right side is set as the R side when viewed from the front. The bonding device 10 has a workbench 20, a crimping part 30, a supply part 40, a driving mechanism 50, a photographing part 60, and a control device 100. In this embodiment, the following description is made by taking an example of putting two (a pair) substrates into the bonding device 10.

[工作臺] 如圖1~圖3所示,工作臺20對一對基板1進行保持。更具體而言,工作臺20是沿水準方向對基板1進行支撐的平坦的矩形的台。在工作臺20上,雖未圖示,但在上表面形成有與真空源連接的多個孔。由此,工作臺20構成為能夠將一對基板1沿X方向隔開間隔地排列並進行吸附保持。各基板1以用以壓接ACF 2的區域從工作臺20的邊緣部突出的方式受到保持。將L側的保持有基板1的區域設為保持位置P1,將R側的保持有基板1的區域設為保持位置P2。另外,將保持於保持位置P1上的基板1設為基板1A,將保持於保持位置P2上的基板1設為基板1B。 [Workbench] As shown in FIGS. 1 to 3 , the workbench 20 holds a pair of substrates 1. More specifically, the workbench 20 is a flat rectangular table that supports the substrates 1 in a horizontal direction. Although not shown, a plurality of holes connected to a vacuum source are formed on the upper surface of the workbench 20. Thus, the workbench 20 is configured to be able to arrange a pair of substrates 1 at intervals along the X direction and hold them by adsorption. Each substrate 1 is held in a manner that the area for pressing the ACF 2 protrudes from the edge of the workbench 20. The area on the L side where the substrate 1 is held is set as the holding position P1, and the area on the R side where the substrate 1 is held is set as the holding position P2. In addition, the substrate 1 held at the holding position P1 is set as the substrate 1A, and the substrate 1 held at the holding position P2 is set as the substrate 1B.

[壓接部] 壓接部30將ACF 2壓接於基板1。壓接部30具有壓接頭31、頭移動機構32、支承部33。 [Compression-bonding section] The compression-bonding section 30 presses the ACF 2 onto the substrate 1. The compression-bonding section 30 includes a compression head 31, a head moving mechanism 32, and a support section 33.

在本實施形態中,針對一對基板1的各者而設置有一個壓接部30。即,設置有與一對基板1的各者對應的一對即兩個壓接部30。各壓接部30的壓接頭31、頭移動機構32、後述的供給部40、拍攝部60分別支撐於相對於一對基板1的各者而各別地設置的基體35上。基體35在XY軸上設置有線性尺規(線性編碼器)、旋轉尺規(旋轉編碼器)等檢測部,例如通過包括由馬達驅動的滾珠絲杠機構的基體移動機構36分別獨立地沿X方向、Y方向移動,而相對於對應的基板1的黏附區域AR進行定位。以下,將與基板1A對應的基體35設為基體35A,將與基板1B對應的基體35設為基體35B。另外,將與基板1A對應的基體移動機構36設為36A,將與基板1B對應的基體移動機構36設為36B。In the present embodiment, one crimping section 30 is provided for each of a pair of substrates 1. That is, a pair of two crimping sections 30 corresponding to each of a pair of substrates 1 are provided. The crimping head 31, the head moving mechanism 32, the supply section 40 described later, and the photographing section 60 of each crimping section 30 are supported on a base 35 provided for each of a pair of substrates 1. The base 35 is provided with detection sections such as a linear ruler (linear encoder) and a rotary ruler (rotary encoder) on the XY axis, and is positioned relative to the adhesion area AR of the corresponding substrate 1 by independently moving in the X direction and the Y direction, respectively, through a base moving mechanism 36 including a ball screw mechanism driven by a motor. Hereinafter, the base 35 corresponding to the substrate 1A is referred to as a base 35A, and the base 35 corresponding to the substrate 1B is referred to as a base 35B. In addition, the base moving mechanism 36 corresponding to the substrate 1A is referred to as 36A, and the base moving mechanism 36 corresponding to the substrate 1B is referred to as 36B.

(壓接頭) 壓接頭31夾著通過後述的供給部40向與基板1之間供給的ACF 2,而對基板1壓接ACF 2。壓接頭31是長方體形狀的區塊。在壓接頭31的底面水準地設置有平坦的加壓面。壓接頭31沿X方向排列,針對一對基板1的各者而設置。將L側設為壓接頭31A,將R側設為壓接頭31B。 (Compression-bonding head) The compression-bonding head 31 clamps the ACF 2 supplied between the substrate 1 and the compression-bonding head 31 through the supply unit 40 described later, and compresses the ACF 2 to the substrate 1. The compression-bonding head 31 is a rectangular block. A flat pressurizing surface is horizontally provided on the bottom surface of the compression-bonding head 31. The compression-bonding heads 31 are arranged along the X direction and are provided for each of a pair of substrates 1. The L side is set as the compression-bonding head 31A, and the R side is set as the compression-bonding head 31B.

(頭移動機構) 頭移動機構32使壓接頭31向接近或遠離基板1的方向移動。本實施形態的頭移動機構32使壓接頭31沿Z方向移動。頭移動機構32例如是由馬達驅動的滾珠絲杠機構。 (Head moving mechanism) The head moving mechanism 32 moves the crimping head 31 toward or away from the substrate 1. The head moving mechanism 32 of this embodiment moves the crimping head 31 in the Z direction. The head moving mechanism 32 is, for example, a ball screw mechanism driven by a motor.

(支承部) 支承部33在與壓接頭31之間夾持ACF 2及基板1,在對基板1壓接ACF 2時,對基板1進行支撐。支承部33具有與壓接頭31的加壓面相向的面平坦的支撐面。 (Supporting portion) The supporting portion 33 sandwiches the ACF 2 and the substrate 1 between the crimping head 31 and supports the substrate 1 when the ACF 2 is crimped to the substrate 1. The supporting portion 33 has a flat supporting surface facing the pressurizing surface of the crimping head 31.

[供給部] 供給部40向壓接部30與基板1之間供給ACF 2。供給部40與壓接頭31A、壓接頭31B相對應地設置於L側以及R側。供給部40具有供給卷軸41、回收卷軸42、引導輥43、切斷部44。 [Supply section] The supply section 40 supplies the ACF 2 between the crimping section 30 and the substrate 1. The supply section 40 is provided on the L side and the R side corresponding to the crimping head 31A and the crimping head 31B. The supply section 40 has a supply reel 41, a recovery reel 42, a guide roller 43, and a cutting section 44.

(供給卷軸) 供給卷軸41是卷裝ACF 2且利用轉動而送出ACF 2的卷軸。供給卷軸41能夠轉動地支撐於基體35上。 (回收卷軸) 回收卷軸42是捲繞ACF 2的脫模帶而回收的卷軸。回收卷軸42能夠轉動地支撐於基體35上。 (Supply reel) The supply reel 41 is a reel that rolls up the ACF 2 and delivers the ACF 2 by rotating. The supply reel 41 is rotatably supported on the base 35. (Recovery reel) The recovery reel 42 is a reel that winds up the release tape of the ACF 2 and recovers it. The recovery reel 42 is rotatably supported on the base 35.

(引導輥) 引導輥43是以使從供給卷軸41供給的ACF 2穿過壓接部30與基板1之間並被回收至回收卷軸42的方式引導ACF 2的輥。在基體35上安裝有多個引導輥43。此外,雖未圖示,但在ACF 2的穿過路徑上設置有送出ACF 2的送出機構、對ACF 2賦予張力的張力機構、將ACF 2的脫模帶剝離的剝離機構。 (Guide roller) The guide roller 43 is a roller that guides the ACF 2 supplied from the supply reel 41 so that it passes between the crimping section 30 and the substrate 1 and is recovered to the recovery reel 42. A plurality of guide rollers 43 are mounted on the base 35. In addition, although not shown, a feeding mechanism for feeding the ACF 2, a tensioning mechanism for applying tension to the ACF 2, and a stripping mechanism for stripping the release tape of the ACF 2 are provided on the passing path of the ACF 2.

(切斷部) 切斷部44將ACF 2切斷(半切(half cut))為不切斷脫模帶的程度。切斷部44具有切割器44a、支承構件44b。切割器44a是與ACF 2相接而進行切斷的構件。切割器44a利用未圖示的升降機構,使其前端的刀與ACF 2接觸或分離。支承構件44b是長方體形狀的區塊。支承構件44b在區塊的下表面具有平坦面,所述平坦面在與切割器44a之間夾著ACF 2而相接。通過切割器44a,ACF 2以與基板1黏附的長度被切斷。 (Cutting section) The cutting section 44 cuts (half cuts) the ACF 2 to the extent that the release tape is not cut. The cutting section 44 has a cutter 44a and a supporting member 44b. The cutter 44a is a member that is in contact with the ACF 2 and cuts. The cutter 44a uses a lifting mechanism (not shown) to make the knife at the front end contact or separate from the ACF 2. The supporting member 44b is a rectangular block. The supporting member 44b has a flat surface on the lower surface of the block, and the flat surface is in contact with the cutter 44a with the ACF 2 sandwiched therebetween. The ACF 2 is cut by the cutter 44a to a length that allows it to adhere to the substrate 1.

[驅動機構] 驅動機構50通過改變工作臺20相對於壓接部30的相對位置而使壓接部30與基板1對位。驅動機構50是使工作臺20沿X方向、Y方向及θ方向移動的裝置。例如,可將由以伺服馬達為驅動源的滾珠絲杠機構及旋轉機構驅動的XYθ軸工作臺機構用作驅動機構50。此外,在驅動機構50,雖未圖示,但在XYθ軸上設置有線性尺規(線性編碼器)、旋轉尺規(旋轉編碼器)等檢測部,且成為能夠檢測並控制XYθ方向上的移動量的結構。 [Drive mechanism] The drive mechanism 50 aligns the crimping portion 30 with the substrate 1 by changing the relative position of the worktable 20 with respect to the crimping portion 30. The drive mechanism 50 is a device that moves the worktable 20 in the X direction, the Y direction, and the θ direction. For example, an XYθ-axis worktable mechanism driven by a ball screw mechanism and a rotary mechanism with a servo motor as a drive source can be used as the drive mechanism 50. In addition, although not shown in the figure, the drive mechanism 50 has detection parts such as a linear scale (linear encoder) and a rotary scale (rotary encoder) on the XYθ axis, and becomes a structure capable of detecting and controlling the movement amount in the XYθ direction.

[拍攝部] 拍攝部60對基板1進行拍攝。拍攝部60具有照相機61。照相機61配置於基板1的黏附有ACF 2的面的上方,通過利用基體移動機構36進行的基體35的移動而相對於基板1進行定位,朝向下方對基板1進行拍攝。關於所述拍攝,在對基板1進行拍攝的情況下,以基板1的對準標記收斂於視野內的方式進行,在對黏附於基板1的ACF 2進行拍攝的情況下,以同時包含基板1的端線(外形線)以及整個ACF 2的方式進行。以下,將與基板1A相對應的照相機61稱為照相機61A,將與基板1B相對應的照相機61稱為照相機61B。 [Photographing section] The photographing section 60 photographs the substrate 1. The photographing section 60 has a camera 61. The camera 61 is disposed above the surface of the substrate 1 to which the ACF 2 is adhered, and is positioned relative to the substrate 1 by moving the substrate 35 using the substrate moving mechanism 36, and photographs the substrate 1 downward. Regarding the photographing, when photographing the substrate 1, the photographing is performed in a manner that the alignment mark of the substrate 1 is converged within the field of view, and when photographing the ACF 2 adhered to the substrate 1, the photographing is performed in a manner that includes both the end line (outline) of the substrate 1 and the entire ACF 2. Hereinafter, the camera 61 corresponding to the substrate 1A is referred to as the camera 61A, and the camera 61 corresponding to the substrate 1B is referred to as the camera 61B.

[控制裝置] 控制裝置100是對黏附裝置10進行控制的裝置。所述控制裝置100例如包含專用的電子電路或者以規定程式進行動作的電腦等。即,控制裝置100對工作臺20、壓接部30、供給部40、驅動機構50、拍攝部60的動作進行控制。 [Control device] The control device 100 is a device for controlling the bonding device 10. The control device 100 includes, for example, a dedicated electronic circuit or a computer that operates according to a prescribed program. That is, the control device 100 controls the operation of the workbench 20, the crimping unit 30, the supply unit 40, the drive mechanism 50, and the camera unit 60.

在控制裝置100中,存儲有對工作臺20的真空源、壓接部30的頭移動機構32、基體移動機構36、供給部40的切斷部44、送出機構、張力機構、剝離機構、驅動機構50、照相機61的動作時機、動作量等進行控制的程式。控制裝置100通過由可程式設計邏輯控制器(Programmable Logic Controller,PLC)或中央處理器(Central Processing Unit,CPU)等處理裝置讀出程式及資料並執行,來進行各部的控制。通過變更程式或資料,能夠應對作為壓接物件的基板1、ACF 2的各種各樣的規格。The control device 100 stores a program for controlling the operation timing and amount of the vacuum source of the worktable 20, the head moving mechanism 32 of the crimping section 30, the substrate moving mechanism 36, the cutting section 44 of the supply section 40, the delivery mechanism, the tension mechanism, the peeling mechanism, the drive mechanism 50, and the camera 61. The control device 100 controls each part by having a processing device such as a programmable logic controller (PLC) or a central processing unit (CPU) read out the program and data and execute them. By changing the program or data, it is possible to cope with various specifications of the substrate 1 and ACF 2 as the crimping object.

本實施形態的控制裝置100具有判定部110、修正部120、檢查部130。判定部110對基板1在基板1的圖像中的傾斜度進行判定。在本實施形態中,預先設定作為黏附ACF 2時的基準的假想線VL。假想線VL是黏附裝置中設定的坐標系之一,在本實施形態的黏附裝置10中與X方向平行。基板1的黏附區域AR被設置成與假想線VL平行,ACF 2以與假想線VL平行的方式被供給至壓接部30與基板1之間,並被黏附於黏附區域AR上。The control device 100 of the present embodiment includes a determination unit 110, a correction unit 120, and an inspection unit 130. The determination unit 110 determines the inclination of the substrate 1 in the image of the substrate 1. In the present embodiment, a virtual line VL is set in advance as a reference when adhering the ACF 2. The virtual line VL is one of the coordinate systems set in the adhering device, and is parallel to the X direction in the adhering device 10 of the present embodiment. The adhering area AR of the substrate 1 is set to be parallel to the virtual line VL, and the ACF 2 is supplied between the crimping unit 30 and the substrate 1 in a manner parallel to the virtual line VL, and is adhered to the adhering area AR.

假想線VL設定於黏附ACF 2時的基板1的外形邊的設計上的位置。外形邊設為供黏附ACF 2的邊(參照圖1)。載置並保持於工作臺20上的基板1有時未必載置於設計上的位置,而在水平面內的旋轉方向上傾斜。例如,如圖4的(A)所示,有時將基板1相對於假想線VL傾斜地載置於工作臺20上。判定部110將假想線VL與基板1的端線(基板1的外周邊)的角度θ作為傾斜度進行檢測。另外,判定部110還根據對設置於基板1上的對準標記進行拍攝而得的圖像,將假想線VL與基板1的角度θ作為傾斜度進行檢測。即,所謂利用判定部110的判定,是指求出作為假想線VL的基準線與基板1的相對角度(角度θ)。The imaginary line VL is set at the designed position of the outer edge of the substrate 1 when the ACF 2 is adhered. The outer edge is set as the edge for adhering the ACF 2 (refer to Figure 1). The substrate 1 placed and held on the workbench 20 is sometimes not necessarily placed at the designed position, but is tilted in the rotation direction within the horizontal plane. For example, as shown in (A) of Figure 4, the substrate 1 is sometimes placed on the workbench 20 tilted relative to the imaginary line VL. The determination unit 110 detects the angle θ between the imaginary line VL and the end line of the substrate 1 (the outer periphery of the substrate 1) as the inclination. In addition, the determination unit 110 also detects the angle θ between the imaginary line VL and the substrate 1 as the inclination based on the image obtained by photographing the alignment mark provided on the substrate 1. That is, the determination by the determination unit 110 means to determine the relative angle (angle θ) between the reference line as the virtual line VL and the substrate 1 .

修正部120對圖像中的基板1的傾斜度進行修正。如後所述,將所拍攝的ACF 2的圖像與表示正常狀態的範本相比較來判斷ACF 2是否被正確黏附。在基板1為如圖4的(A)那樣的狀態下拍攝而得的圖像成為相當於雙點劃線所示的視野S的圖像。因為範本基於設計上的位置,因此即使將所述圖像與範本進行比較,由於圖像中拍攝到的ACF 2傾斜,也無法進行正確的比較。因此,如圖4的(B)所示,通過使圖像旋轉與由判定部110求出的傾斜度相應的量(角度θ)而使基板1的端線與假想線VL一致,從而圖像中拍攝到的ACF 2成為可與範本比較的狀態(用虛線表示旋轉後的圖像G)。此外,通過在所拍攝的圖像中包含基板1的作為基準的位置,而可對假想線VL以及XY方向的偏差進行修正。例如,可根據如圖4的(A)所示將基板1載置於工作臺20上時的設計上的角VL0以及所拍攝的圖像的基板1的角P的旋轉後的位置P'(圖4的(B))對XY方向上的偏差進行修正。The correction unit 120 corrects the inclination of the substrate 1 in the image. As described later, the image of the ACF 2 taken is compared with a template showing a normal state to determine whether the ACF 2 is correctly adhered. The image taken when the substrate 1 is in the state shown in (A) of FIG. 4 becomes an image equivalent to the field of view S indicated by the double-point line. Since the template is based on the design position, even if the image is compared with the template, the ACF 2 photographed in the image is tilted, and therefore, a correct comparison cannot be made. Therefore, as shown in FIG. 4 (B), by rotating the image by an amount (angle θ) corresponding to the tilt obtained by the determination unit 110, the end line of the substrate 1 is made consistent with the virtual line VL, so that the ACF 2 captured in the image becomes comparable with the template (the rotated image G is represented by a dotted line). In addition, by including the position of the substrate 1 as a reference in the captured image, the deviation of the virtual line VL and the XY direction can be corrected. For example, the deviation in the XY direction can be corrected based on the angle VL0 designed when the substrate 1 is placed on the workbench 20 as shown in FIG. 4 (A) and the rotated position P' of the angle P of the substrate 1 in the captured image (FIG. 4 (B)).

檢查部130基於由修正部120修正後的圖像,對ACF 2的黏附狀態進行檢查。檢查部130例如設置有基於與拍攝尺寸相同的圖像尺寸的範本。在所述範本上,如圖5的(A)所示,供黏附ACF 2的區域被設定為白色的雙點劃線所示的基準區域RA。即,基準區域RA被設定為與要黏附的ACF 2相似形狀且相同尺寸(為了說明,誇張地進行了描繪)。所述基準區域RA被設定於規定的區域即範本的中心。因此,被正確地黏附的基板1的ACF 2的圖像與所述基準區域RA一致。通過對所拍攝的圖像進行二值化,圖像的黏附有ACF 2的區域被設定為白色,圖像的黏附有ACF 2的區域以外的區域被設定為黑色作為基板1的亮度。The inspection unit 130 inspects the adhesion state of the ACF 2 based on the image corrected by the correction unit 120. The inspection unit 130 is provided with a template based on the same image size as the shooting size, for example. On the template, as shown in (A) of FIG. 5 , the area for adhering the ACF 2 is set to the reference area RA indicated by the white double-dot line. That is, the reference area RA is set to a shape similar to that of the ACF 2 to be adhered and the same size (exaggerated for explanation). The reference area RA is set at the center of the prescribed area, i.e., the template. Therefore, the image of the ACF 2 of the correctly adhered substrate 1 is consistent with the reference area RA. By binarizing the captured image, the area of the image to which the ACF 2 is attached is set to white, and the area other than the area of the image to which the ACF 2 is attached is set to black as the brightness of the substrate 1 .

因此,在如圖5的(B)所示正確地黏附了ACF 2的情況下,圖像中,白色的ACF 2的部分收斂於基準區域RA中。即,基準區域RA內為白色100%。在檢查部130中,根據基準區域RA中的白色或黑色的比例、即面積比對黏附的狀態進行檢查。例如,在如圖5的(C)所示ACF 2的部分並非矩形(ACF 2被卷起)、或者如圖5的(D)所示偏離正確的位置或自正確的位置傾斜的情況下,基準區域RA中的黑色的部分變大。因此,將黑色的部分占整個基準區域RA的比率設定為閾值,在超過所述閾值的情況下,判定為黏附異常。在判定為異常的情況下,作業者可使黏附裝置10停止並除去ACF 2而再次進行黏附(修復作業)。Therefore, when the ACF 2 is correctly adhered as shown in FIG5(B), the white portion of the ACF 2 in the image is integrated into the reference area RA. That is, the reference area RA is 100% white. In the inspection unit 130, the adhesion state is inspected based on the ratio of white or black in the reference area RA, that is, the area ratio. For example, when the portion of the ACF 2 is not rectangular (the ACF 2 is rolled up) as shown in FIG5(C), or when it deviates from the correct position or tilts from the correct position as shown in FIG5(D), the black portion in the reference area RA becomes larger. Therefore, the ratio of the black portion to the entire reference area RA is set as a threshold value, and when it exceeds the threshold value, it is determined as adhesion abnormality. If it is determined to be abnormal, the operator can stop the bonding device 10 and remove the ACF 2 to perform bonding again (repair work).

此外,雖未圖示,但控制裝置100具有存儲本實施形態的控制所需的資訊的存儲部、輸入資訊的輸入部、顯示資訊的顯示部。存儲部對假想線VL、基準區域RA、閾值等進行存儲。顯示部顯示所拍攝的圖像、假想線VL、基準區域RA。另外,顯示部可顯示檢查部130的檢查結果。例如,在檢查結果異常的情況下,將所述意旨顯示於顯示部,看到所述意旨的作業者可使黏附裝置10停止而進行修復作業。Although not shown, the control device 100 has a storage unit for storing information required for the control of the present embodiment, an input unit for inputting information, and a display unit for displaying information. The storage unit stores the virtual line VL, the reference area RA, the threshold, etc. The display unit displays the captured image, the virtual line VL, and the reference area RA. In addition, the display unit can display the inspection result of the inspection unit 130. For example, if the inspection result is abnormal, the meaning is displayed on the display unit, and the operator who sees the meaning can stop the adhesion device 10 and perform repair work.

[動作] 除了參照圖1至圖5的(A)~圖5的(D)以外,還參照圖6的(A)~圖6的(E)至圖8對本實施形態的動作例進行說明。圖6的(A)~圖6的(E)是表示ACF 2的壓接以及檢查的程式的說明圖。圖7是表示黏附裝置10的動作程式的流程圖,圖8是表示檢查的程式的流程圖。 [Action] In addition to referring to (A) to (D) of Figures 1 to 5, the action example of this embodiment is described with reference to (A) to (E) to (8) of Figures 6. (A) to (E) of Figures 6 are explanatory diagrams showing the program of pressing and inspecting ACF 2. Figure 7 is a flow chart showing the action program of the bonding device 10, and Figure 8 is a flow chart showing the program of inspection.

首先,如圖6的(A)所示,一對基板1A、1B通過未圖示的搬送裝置以基板1的黏附區域AR從工作臺20的邊緣部突出的方式被載置於工作臺20上的保持位置P1、保持位置P2,並通過負壓進行吸附保持(保持工序)。此時,基板1A以及基板1B的姿勢(角度、位置)有時也會因相對於保持位置P1、保持位置P2的傾斜或偏移而產生差異。First, as shown in FIG. 6 (A), a pair of substrates 1A and 1B are placed at holding positions P1 and P2 on the workbench 20 by a conveying device (not shown) in such a manner that the adhesion area AR of the substrate 1 protrudes from the edge of the workbench 20, and are held by suction by negative pressure (holding process). At this time, the postures (angles, positions) of the substrates 1A and 1B may differ due to inclination or displacement relative to the holding positions P1 and P2.

在本實施形態中,準備有與一對基板1分別對應的一對壓接部30。將其中一個基板1的供黏附ACF 2的黏附區域AR與假想線VL並行地定位,在其正上方定位其中一個壓接部30而進行ACF 2的黏附。接著,將另一個基板1的供黏附ACF 2的黏附區域AR與假想線VL並行地定位,在其正上方定位另一個壓接部30而進行ACF 2的黏附。在向另一個基板1黏附ACF 2的期間,自供給部40向其中一個壓接部30供給新的ACF 2。In the present embodiment, a pair of press-bonding portions 30 are prepared corresponding to a pair of substrates 1, respectively. The adhesion region AR of one substrate 1 to which the ACF 2 is to be adhered is positioned in parallel with the imaginary line VL, and one of the press-bonding portions 30 is positioned directly above the imaginary line VL to adhere the ACF 2. Next, the adhesion region AR of the other substrate 1 to which the ACF 2 is to be adhered is positioned in parallel with the imaginary line VL, and another press-bonding portion 30 is positioned directly above the imaginary line VL to adhere the ACF 2. While the ACF 2 is being adhered to the other substrate 1, a new ACF 2 is supplied from the supply portion 40 to one of the press-bonding portions 30.

另外,對黏附於其中一個基板1上的ACF 2進行拍攝,根據所拍攝的圖像來檢查是否正確地進行了ACF 2的黏附。當完成ACF 2向另一個基板1的黏附後,將其中一個基板1的供黏附ACF 2的黏附區域AR與假想線VL並行地定位,並在其正上方重新定位其中一個壓接部30,進行下一個ACF 2向其中一個基板1的黏附。此時,向另一個壓接部30供給新的ACF 2。同時,對黏附於另一基板1的ACF 2進行拍攝,根據所述拍攝圖像來檢查是否正確地進行了ACF 2的黏附。In addition, the ACF 2 adhered to one of the substrates 1 is photographed, and the photographed image is used to check whether the ACF 2 is correctly adhered. After the ACF 2 is adhered to the other substrate 1, the adhesion area AR of one of the substrates 1 to which the ACF 2 is adhered is positioned parallel to the imaginary line VL, and one of the crimping parts 30 is repositioned directly above it, and the next ACF 2 is adhered to one of the substrates 1. At this time, a new ACF 2 is supplied to the other crimping part 30. At the same time, the ACF 2 adhered to the other substrate 1 is photographed, and the photographed image is used to check whether the ACF 2 is correctly adhered.

如此,交替地進行ACF 2向其中一個基板1的黏附以及ACF 2向另一個基板的黏附,同時進行ACF 2的供給以及檢查。重複所述動作直至ACF 2向所有ACF 2的黏附區域AR的黏附完成為止。當所有的ACF 2的黏附完成後,一對基板1通過搬送裝置而被搬送,並供給新的一對基板1。以上內容為本實施形態的動作概要。以下詳細地進行說明。In this way, the ACF 2 is alternately attached to one of the substrates 1 and to the other substrate, and the ACF 2 is supplied and inspected at the same time. The above actions are repeated until the ACF 2 is attached to all the ACF 2 attachment areas AR. When all the ACF 2 are attached, a pair of substrates 1 is transported by the transport device, and a new pair of substrates 1 is supplied. The above content is an outline of the actions of this embodiment. The following is a detailed description.

如上所述,當基板1通過搬送裝置而被載置於工作臺時,從供給卷軸41供給的ACF 2被切斷部44切斷為適當的長度,並通過送出機構依次送出至壓接頭31與基板1之間。As described above, when the substrate 1 is placed on the worktable by the conveying device, the ACF 2 supplied from the supply reel 41 is cut into appropriate lengths by the cutting section 44 and sequentially fed out to between the crimping head 31 and the substrate 1 by the feeding mechanism.

在此狀態下,通過基體移動機構36A使基體35A移動,照相機61A對基板1A進行拍攝。然後,判定部110根據所拍攝的圖像,對基板1A的對準標記進行檢測,並根據對準標記的位置求出基板1A的傾斜度,且以基板1A的傾斜與壓接頭31A平行的方式(與假想線VL平行的方式),通過驅動機構50使工作臺20旋轉。In this state, the substrate 35A is moved by the substrate moving mechanism 36A, and the camera 61A photographs the substrate 1A. Then, the determination unit 110 detects the alignment mark of the substrate 1A based on the photographed image, and obtains the inclination of the substrate 1A based on the position of the alignment mark, and rotates the worktable 20 through the drive mechanism 50 in such a manner that the inclination of the substrate 1A is parallel to the crimping head 31A (parallel to the imaginary line VL).

另外,根據對準標記的位置求出基板1A(L側)的黏附區域AR1的位置,以基板1A(L側)的黏附區域AR1被定位於支承部33的支撐面的方式,通過驅動機構50使工作臺20移動。繼而,通過驅動機構50使工作臺20下降,而將基板1A的底面載置於支承部33的支撐面。In addition, the position of the adhesion area AR1 of the substrate 1A (L side) is obtained based on the position of the alignment mark, and the worktable 20 is moved by the drive mechanism 50 in such a manner that the adhesion area AR1 of the substrate 1A (L side) is positioned on the support surface of the support portion 33. Then, the worktable 20 is lowered by the drive mechanism 50, and the bottom surface of the substrate 1A is placed on the support surface of the support portion 33.

同時,以壓接頭31A來到基板1A(L側)的黏附區域AR1的正上方的方式,通過基體移動機構36A使基體35A移動。其後,如圖7所示,通過壓接頭31A下降而將ACF 2黏附於黏附區域AR1上(第一壓接工序:步驟S101)。黏附後,壓接頭31A上升,通過驅動機構50使工作臺20也上升,而使基板1A從支承部33離開。At the same time, the base 35A is moved by the base moving mechanism 36A so that the crimping head 31A comes to the top of the adhesion area AR1 of the substrate 1A (L side). Then, as shown in FIG. 7 , the ACF 2 is adhered to the adhesion area AR1 by the crimping head 31A descending (first crimping process: step S101). After the adhesion, the crimping head 31A rises, and the worktable 20 is also raised by the driving mechanism 50, so that the substrate 1A is separated from the support portion 33.

接下來,通過基體移動機構36B使基體35B移動,照相機61B對R側的基板1B進行拍攝。然後,根據所拍攝的圖像,對基板1B的對準標記的位置進行檢測,並根據對準標記的位置求出基板1B的傾斜度,且如圖6的(B)所示,以基板1B的傾斜與壓接頭31B平行的方式(與假想線VL平行的方式),通過驅動機構50使工作臺20旋轉。Next, the substrate 35B is moved by the substrate moving mechanism 36B, and the camera 61B takes a picture of the R-side substrate 1B. Then, the position of the alignment mark of the substrate 1B is detected based on the image taken, and the inclination of the substrate 1B is calculated based on the position of the alignment mark. As shown in FIG. 6 (B), the worktable 20 is rotated by the drive mechanism 50 in such a manner that the inclination of the substrate 1B is parallel to the crimping head 31B (parallel to the imaginary line VL).

另外,根據對準標記的位置求出基板1B(R側)的黏附區域AR1的位置,以基板1B(R側)的黏附區域AR1被定位於支承部33的支撐面的方式,通過驅動機構50使工作臺20移動。繼而,通過驅動機構50使工作臺20下降,而將基板1B的底面載置於支承部33的支撐面。In addition, the position of the adhesion area AR1 of the substrate 1B (R side) is obtained based on the position of the alignment mark, and the worktable 20 is moved by the drive mechanism 50 in such a manner that the adhesion area AR1 of the substrate 1B (R side) is positioned on the support surface of the support portion 33. Then, the worktable 20 is lowered by the drive mechanism 50, and the bottom surface of the substrate 1B is placed on the support surface of the support portion 33.

同時,以壓接頭31B來到基板1B(R側)的黏附區域AR1的正上方的方式,通過基體移動機構36B使基體35B移動。其後,如圖7所示,通過壓接頭31B下降而將ACF 2黏附於黏附區域AR1上(第二壓接工序:步驟S102)。黏附後,壓接頭31B上升,通過驅動機構50使工作臺20也上升,而使基板1B從支承部33離開。At the same time, the substrate 35B is moved by the substrate moving mechanism 36B so that the crimping head 31B comes to the top of the adhesion area AR1 of the substrate 1B (R side). Then, as shown in FIG. 7 , the crimping head 31B is lowered to adhere the ACF 2 to the adhesion area AR1 (second crimping process: step S102). After adhesion, the crimping head 31B is raised, and the worktable 20 is also raised by the driving mechanism 50, so that the substrate 1B is separated from the support portion 33.

而且,在所述基板1B(R側)的黏附過程中,如圖6的(C)所示,通過基體移動機構36A使基體35A移動,而照相機61A來到被保持於保持位置P1的基板1A(L側)的黏附區域AR1的正上方,對黏附於基板1A的黏附區域AR1上的ACF 2(第一壓接工序:在步驟S101中黏附的ACF 2)進行拍攝。檢查部130基於所述所拍攝的圖像進行檢查。在圖6的(C)中由點劃線示出照相機61A的拍攝區域。In the process of attaching the substrate 1B (R side), as shown in FIG6 (C), the substrate 35A is moved by the substrate moving mechanism 36A, and the camera 61A comes to the top of the attaching area AR1 of the substrate 1A (L side) held at the holding position P1, and takes a picture of the ACF 2 (first pressing process: ACF 2 attached in step S101) attached to the attaching area AR1 of the substrate 1A. The inspection unit 130 performs inspection based on the image taken. The dotted line in FIG6 (C) shows the shooting area of the camera 61A.

即,如圖8的流程圖所示,判定部110對所拍攝的圖像中的基板1A的端線相對於假想線VL的傾斜的角度θ進行判定(參照圖4的(A))(判定工序:步驟S201),修正部120以對傾斜度進行修正的方式使圖像旋轉(參照圖4的(B)(修正工序:步驟S202)。然後,在相對於範本(參照圖5的(A))而如圖5的(B)所示基準區域RA中的被二值化的圖像的黑色部分的比率為閾值以下的情況下(步驟S203的是(YES)),判定為黏附狀態正常(檢查工序:步驟S204)。如圖5的(C)、圖5的(D)所示,在超過閾值的情況下(步驟S203的否(NO)),判定為黏附狀態異常(檢查工序:步驟S205)。That is, as shown in the flowchart of FIG8 , the determination unit 110 determines the angle θ of the inclination of the end line of the substrate 1A in the captured image relative to the virtual line VL (see FIG4 (A)) (determination process: step S201), and the correction unit 120 rotates the image so as to correct the inclination (see FIG4 (B)) (correction process: step S202). Then, when the image is rotated relative to the template (see FIG5 (A)), the image is rotated relative to the virtual line VL. As shown in FIG5(B), when the ratio of the black portion of the binarized image in the reference area RA is below the threshold value (YES in step S203), it is determined that the adhesion state is normal (inspection process: step S204). As shown in FIG5(C) and FIG5(D), when it exceeds the threshold value (NO in step S203), it is determined that the adhesion state is abnormal (inspection process: step S205).

即,檢查部130將由修正部120修正後的、基板1A的拍攝有ACF 2的圖像與範本重疊,根據其重疊狀態來判定正常還是異常,從而對ACF 2的黏附狀態進行檢查。That is, the inspection unit 130 overlaps the image of the substrate 1A with the ACF 2 corrected by the correction unit 120 with the template, and determines whether it is normal or abnormal based on the overlapping state, thereby inspecting the adhesion state of the ACF 2.

如圖7的流程圖所示,在判定為異常的情況下(步驟S103的是),使黏附裝置10停止(步驟S114),而進行修復作業。在判定為正常的情況下(步驟S103的否),確認是否存在下一個黏附區域AR(步驟S104)。在存在作為下一個黏附區域AR的L側的基板1A中的黏附區域AR2的情況下(步驟S104的是),進行所述黏附。As shown in the flowchart of FIG. 7 , when it is determined to be abnormal (Yes in step S103), the bonding device 10 is stopped (step S114) and the repair operation is performed. When it is determined to be normal (No in step S103), it is confirmed whether the next bonding area AR exists (step S104). When the bonding area AR2 in the substrate 1A on the L side as the next bonding area AR exists (Yes in step S104), the bonding is performed.

在無下一個黏附區域AR的情況下(步驟S104的否),與所述同樣地對最後黏附的R側的黏附區域AR進行檢查(步驟S112),在判定為異常的情況下(步驟S113的是),使黏附裝置10停止(步驟S114),而進行修復作業。在判定為正常的情況下(步驟S113的否),結束處理。If there is no next adhesion area AR (No in step S104), the adhesion area AR on the R side that was last adhered is checked in the same manner as described above (step S112). If it is determined to be abnormal (Yes in step S113), the adhesion device 10 is stopped (step S114) and the repair operation is performed. If it is determined to be normal (No in step S113), the process ends.

繼續對存在下一個黏附區域AR的情況進行說明。為了對作為下一個黏附區域AR的L側的基板1A中的黏附區域AR2進行黏附,如圖6的(D)所示,通過基體移動機構36A使基體35A移動,從而照相機61A對基板1A進行拍攝。然後,根據所拍攝的圖像對基板1A的對準標記的位置進行檢測,根據對準標記的位置求出基板1A的傾斜度,且以基板1A的傾斜與壓接頭31A平行的方式(與假想線VL平行的方式),通過驅動機構50使工作臺20旋轉。The following description will be given of the case where the next adhesion area AR exists. In order to adhere the adhesion area AR2 in the substrate 1A on the L side of the next adhesion area AR, as shown in FIG6(D), the substrate 35A is moved by the substrate moving mechanism 36A, and the camera 61A takes an image of the substrate 1A. Then, the position of the alignment mark of the substrate 1A is detected based on the image taken, and the inclination of the substrate 1A is calculated based on the position of the alignment mark, and the worktable 20 is rotated by the drive mechanism 50 so that the inclination of the substrate 1A is parallel to the crimping head 31A (parallel to the virtual line VL).

另外,根據對準標記的位置求出基板1A(L側)的黏附區域AR2的位置,以基板1A的黏附區域AR2被定位於支承部33的支撐面的方式,通過驅動機構50使工作臺20移動,並且以壓接頭31A來到基板1A的黏附區域AR2的正上方的方式,通過基體移動機構36A使基體35A移動(步驟S105)。In addition, the position of the adhesion area AR2 of the substrate 1A (L side) is determined based on the position of the alignment mark, and the workbench 20 is moved by the driving mechanism 50 in such a manner that the adhesion area AR2 of the substrate 1A is positioned on the supporting surface of the support portion 33, and the substrate 35A is moved by the substrate moving mechanism 36A in such a manner that the crimping head 31A comes directly above the adhesion area AR2 of the substrate 1A (step S105).

此時的工作臺20的旋轉、黏附區域AR2的定位可基於在步驟S101中將ACF 2黏附於黏附區域AR1時所拍攝的圖像來進行,也可存儲此時的基板1A的對準標記的位置、工作臺20的旋轉位置並基於所述位置來進行。The rotation of the workbench 20 and the positioning of the adhesion area AR2 at this time can be performed based on the image taken when the ACF 2 is adhered to the adhesion area AR1 in step S101, or the position of the alignment mark of the substrate 1A and the rotation position of the workbench 20 at this time can be stored and performed based on the said positions.

其後,如圖7所示,通過壓接頭31A下降而將ACF 2黏附於黏附區域AR2上(第一壓接工序:步驟S106)。黏附後,壓接頭31A上升,通過驅動機構50使工作臺20也上升,基板1A從支承部33離開。在所述黏附過程中,如圖6的(E)所示,通過基體移動機構36B使基體35B移動,照相機61B來到被保持於保持位置P2的基板1B(R側)的黏附區域AR1的正上方,對黏附於基板1B的黏附區域AR1的ACF 2(第二壓接工序:在步驟S102中黏附的ACF 2)進行拍攝,檢查部130基於所述圖像進行檢查。在圖6的(E)中由點劃線示出照相機61B的拍攝區域。所述檢查的程式與所述的圖8所示的程式相同。Thereafter, as shown in FIG. 7 , the ACF 2 is bonded to the bonding area AR2 by lowering the crimping head 31A (first crimping process: step S106). After bonding, the crimping head 31A rises, and the worktable 20 is also raised by the drive mechanism 50, and the substrate 1A is separated from the support portion 33. In the bonding process, as shown in FIG. 6 (E), the substrate 35B is moved by the substrate moving mechanism 36B, and the camera 61B comes to the top of the bonding area AR1 of the substrate 1B (R side) held at the holding position P2, and the ACF 2 (second crimping process: ACF 2 bonded in step S102) bonded to the bonding area AR1 of the substrate 1B is photographed, and the inspection unit 130 performs inspection based on the image. The photographing area of the camera 61B is shown by a dotted line in (E) of Fig. 6. The procedure of the inspection is the same as that shown in Fig. 8 described above.

返回至圖7,在判定為異常的情況下(步驟S107的是),使黏附裝置10停止(步驟S114),而進行修復作業。在判定為正常的情況下(步驟S107的否),通過基體移動機構36B使基體35B移動,照相機61B對基板1B進行拍攝。然後,根據所拍攝的圖像對基板1B的對準標記的位置進行檢測,根據對準標記的位置求出基板1B的傾斜度,以基板1B的傾斜與壓接頭31B平行的方式(與假想線VL平行的方式),通過驅動機構50使工作臺20旋轉。Returning to FIG. 7 , if it is determined to be abnormal (Yes in step S107), the bonding device 10 is stopped (step S114) and the repair operation is performed. If it is determined to be normal (No in step S107), the substrate 35B is moved by the substrate moving mechanism 36B, and the camera 61B takes a picture of the substrate 1B. Then, the position of the alignment mark of the substrate 1B is detected based on the image taken, and the inclination of the substrate 1B is calculated based on the position of the alignment mark. The worktable 20 is rotated by the drive mechanism 50 in such a way that the inclination of the substrate 1B is parallel to the crimping head 31B (parallel to the imaginary line VL).

此外,關於基板1,利用一對基板1進行黏附。因此,只要確認是否存在僅最初開始黏附的其中一個基板1側的下一個黏附區域即可,在黏附於其中一個基板1上之後,另一個基板1必定會殘留黏附區域。因此,在基板1B中,也可不確認是否存在黏附區域。In addition, regarding the substrate 1, the bonding is performed using a pair of substrates 1. Therefore, it is sufficient to confirm whether the next bonding area exists only on the side of one of the substrates 1 that starts bonding first. After bonding to one of the substrates 1, the other substrate 1 will definitely have a residual bonding area. Therefore, in the substrate 1B, it is not necessary to confirm whether the bonding area exists.

另外,根據對準標記的位置求出基板1B(R側)的黏附區域AR2的位置,以基板1B的黏附區域AR2被定位於支承部33的支撐面的方式,通過驅動機構50使工作臺20移動,並且以壓接頭31B來到基板1B的黏附區域AR2的正上方的方式,通過基體移動機構36B使基體35B移動(步驟S108)。In addition, the position of the adhesion area AR2 of the substrate 1B (R side) is calculated based on the position of the alignment mark, and the workbench 20 is moved by the driving mechanism 50 in such a manner that the adhesion area AR2 of the substrate 1B is positioned on the supporting surface of the support portion 33, and the substrate 35B is moved by the substrate moving mechanism 36B in such a manner that the crimping head 31B comes to be directly above the adhesion area AR2 of the substrate 1B (step S108).

此時的工作臺20的旋轉、黏附區域AR2的定位可基於在步驟S102中將ACF 2黏附於黏附區域AR1時所拍攝的圖像來進行,也可存儲此時的基板1A的對準標記的位置、工作臺20的旋轉位置並基於所述位置來進行。The rotation of the workbench 20 and the positioning of the adhesion area AR2 at this time can be performed based on the image taken when the ACF 2 is adhered to the adhesion area AR1 in step S102, or the position of the alignment mark of the substrate 1A and the rotation position of the workbench 20 at this time can be stored and performed based on the said positions.

其後,通過壓接頭31B下降而將ACF 2黏附於黏附區域AR2上(第二壓接工序:步驟S109)。黏附後,壓接頭31B上升,通過驅動機構50使工作臺20也上升,基板1B從支承部33離開。Then, the ACF 2 is bonded to the bonding area AR2 by the lowering of the crimping head 31B (second crimping process: step S109 ). After bonding, the crimping head 31B rises, and the drive mechanism 50 also raises the stage 20 , and the substrate 1B leaves the support portion 33 .

在所述黏附過程中,與所述同樣地,通過基體移動機構36A使基體35A移動,照相機61A來到被保持於保持位置P1的基板1A(L側)的黏附區域AR2的正上方,對黏附於基板1A的黏附區域AR2的ACF 2(第一壓接工序:在步驟S106中黏附的ACF 2)進行拍攝,且檢查部130進行檢查。所述檢查的程式與所述的圖8所示的程式相同。In the bonding process, the substrate 35A is moved by the substrate moving mechanism 36A in the same manner as described above, and the camera 61A comes to the top of the bonding area AR2 of the substrate 1A (L side) held at the holding position P1, and the ACF 2 (first pressure bonding process: ACF 2 bonded in step S106) bonded to the bonding area AR2 of the substrate 1A is photographed, and the inspection unit 130 performs inspection. The inspection procedure is the same as the procedure shown in FIG. 8 described above.

在判定為異常的情況下(步驟S110的是),使黏附裝置10停止(步驟S114),而進行修復作業。在判定為正常的情況下(步驟S110的否),確認是否存在下一個黏附區域AR(步驟S111)。在存在下一個黏附區域AR3(L側的基板1A)的情況下(步驟S111的是),重複進行從步驟S105至步驟S111的處理。If it is determined to be abnormal (Yes in step S110), the bonding device 10 is stopped (step S114) and a repair operation is performed. If it is determined to be normal (No in step S110), it is confirmed whether the next bonding area AR exists (step S111). If the next bonding area AR3 (the substrate 1A on the L side) exists (Yes in step S111), the processing from step S105 to step S111 is repeated.

在無下一個黏附區域AR的情況下(步驟S111的否),與所述同樣地對最後黏附的R側的黏附區域AR4進行檢查(步驟S112),在判定為異常的情況下(步驟S113的是),使黏附裝置10停止(步驟S114),而進行修復作業。在判定為正常的情況下(步驟S113的否),結束處理。If there is no next adhesion area AR (No in step S111), the adhesion area AR4 on the R side that is adhered last is checked in the same manner as described above (step S112). If it is determined to be abnormal (Yes in step S113), the adhesion device 10 is stopped (step S114) and the repair operation is performed. If it is determined to be normal (No in step S113), the process ends.

[效果] (1)本實施形態是在基板1上黏附ACF 2的黏附裝置10,且具有:工作臺20,對多個基板1進行保持;壓接部30,將ACF壓接於多個基板1的各者上;供給部40,向壓接部30供給ACF 2;驅動機構50,通過改變工作臺20相對於壓接部30的相對位置而使基板1與壓接部30對位;拍攝部60,對黏附於基板1上的ACF進行拍攝;判定部110,在壓接部30將ACF 2壓接於基板1上的期間,對拍攝部60所拍攝的另一基板1的圖像中的基板1的傾斜度進行判定;修正部120,基於通過判定部110的判定求出的傾斜度,對基板1在圖像中的傾斜度進行修正;以及檢查部130,基於由修正部120修正後的圖像對ACF 2的黏附狀態進行檢查。 [Effects] (1) This embodiment is a bonding device 10 for bonding ACF 2 to a substrate 1, and comprises: a workbench 20 for holding a plurality of substrates 1; a crimping section 30 for crimping ACF to each of the plurality of substrates 1; a supply section 40 for supplying ACF 2 to the crimping section 30; a drive mechanism 50 for aligning the substrate 1 with the crimping section 30 by changing the relative position of the workbench 20 with respect to the crimping section 30; a photographing section 60 for photographing the ACF bonded to the substrate 1; and a determination section 110 for determining whether the ACF 2 is bonded to the crimping section 30. 2 is pressed onto the substrate 1, the inclination of the substrate 1 in the image of another substrate 1 photographed by the photographing unit 60 is determined; the correction unit 120 corrects the inclination of the substrate 1 in the image based on the inclination determined by the determination unit 110; and the inspection unit 130 inspects the adhesion state of the ACF 2 based on the image corrected by the correction unit 120.

另外,本實施形態的檢查方法包括:保持工序,工作臺20對多個基板1進行保持;第一壓接工序,壓接部30將ACF 2壓接於基板1;第二壓接工序,壓接部30將ACF 2壓接於另一基板1,在第二壓接工序的期間,包括:傾斜度判定工序,判定部110判定拍攝部60對黏附於基板1上的ACF 2進行拍攝而得的圖像中的基板1的傾斜度;修正工序,修正部120基於通過判定部110的判定求出的傾斜度,對基板1在圖像中的傾斜度進行修正;以及檢查工序,基於由修正部120修正後的圖像對ACF 2的黏附狀態進行檢查。In addition, the inspection method of this embodiment includes: a holding process, in which the workbench 20 holds multiple substrates 1; a first pressing process, in which the pressing section 30 presses the ACF 2 onto the substrate 1; a second pressing process, in which the pressing section 30 presses the ACF 2 onto another substrate 1, and during the second pressing process, includes: a tilt determination process, in which the determination section 110 determines the tilt of the substrate 1 in the image obtained by the photographing section 60 photographing the ACF 2 adhered to the substrate 1; a correction process, in which the correction section 120 corrects the tilt of the substrate 1 in the image based on the tilt determined by the determination section 110; and an inspection process, in which the adhesion state of the ACF 2 is inspected based on the image corrected by the correction section 120.

如此,在將ACF 2壓接於基板1上的期間,可對另一基板1上的ACF 2的黏附狀態進行檢查。即,當ACF 2向基板1的壓接工序完成後,可立即進行ACF 2向另一基板1的壓接工序,因此即使由工作臺20保持的多個基板1的姿勢偏移而不對齊,也可正確地進行完成了壓接工序的基板1的檢查,並且提高生產效率。Thus, during the period of pressing ACF 2 onto substrate 1, the adhesion state of ACF 2 on another substrate 1 can be inspected. That is, after the pressing process of ACF 2 onto substrate 1 is completed, the pressing process of ACF 2 onto another substrate 1 can be immediately performed, so even if the postures of the plurality of substrates 1 held by the workbench 20 are offset and misaligned, the substrate 1 that has completed the pressing process can be correctly inspected, thereby improving production efficiency.

如本實施形態那樣,在為了提高生產性而將多個基板1保持於一個工作臺20上並進行ACF 2的黏附以及所黏附的ACF 2的檢查的情況下,由工作臺20保持的多個基板1的姿勢不對齊的情況多。由於需要對基板1的規定區域進行ACF 2的黏附,因此使基板1的姿勢相對於壓接部30對齊。即,為了將基板1的黏附區域AR定位於壓接部30,使黏附區域AR所在的基板1的一邊對準與壓接部30對齊的基準線。在使一個基板1的姿勢與壓接部30對齊的情況下,另一基板1不再與壓接部30對齊。When a plurality of substrates 1 are held on a single workbench 20 and the ACF 2 is adhered and inspected as in the present embodiment in order to improve productivity, the postures of the plurality of substrates 1 held by the workbench 20 are often misaligned. Since the ACF 2 needs to be adhered to a specified area of the substrate 1, the posture of the substrate 1 is aligned with respect to the crimping portion 30. That is, in order to position the adhesion area AR of the substrate 1 at the crimping portion 30, one side of the substrate 1 where the adhesion area AR is located is aligned with a reference line aligned with the crimping portion 30. When the posture of one substrate 1 is aligned with the crimping portion 30, the other substrate 1 is no longer aligned with the crimping portion 30.

在進行所黏附的ACF 2的檢查的情況下,若ACF向基板1的黏附(處理)完成後直接進行ACF檢查,則在ACF檢查結束之前,無法進行工作臺20的移動(基板的位置修正)。因此,無法進行ACF向載置於工作臺20上的另一個基板1的黏附,從而將多張基板1載置於工作臺20上的效果會減弱。When inspecting the attached ACF 2, if the ACF inspection is performed directly after the ACF is attached (processed) to the substrate 1, the worktable 20 cannot be moved (the position of the substrate is corrected) before the ACF inspection is completed. Therefore, the ACF cannot be attached to another substrate 1 placed on the worktable 20, and the effect of placing a plurality of substrates 1 on the worktable 20 is reduced.

在使ACF 2向另一基板1的黏附優先、基板1的ACF黏附完成後,進行工作臺20的移動(另一基板1向壓接部30的對位)而進行ACF黏附的情況下,已黏附ACF的基板1的姿勢不與基準線對齊,黏附位置、黏附方向偏離基準位置,在所述狀態下無法進行正確的檢查,從而導致誤檢查。因此,無法與ACF 2向另一基板1的黏附同時地對已黏附於基板1上的ACF 2進行拍攝而進行正確的檢查。因此,提高生產性的效果會減弱。When the ACF 2 is attached to the other substrate 1 with priority and the ACF 2 is attached to the substrate 1 after completion, and then the workbench 20 is moved (the other substrate 1 is aligned to the crimping portion 30) to attach the ACF, the posture of the substrate 1 to which the ACF is attached is not aligned with the reference line, and the attachment position and the attachment direction deviate from the reference position. In this state, it is impossible to perform a correct inspection, resulting in an erroneous inspection. Therefore, it is impossible to photograph the ACF 2 attached to the substrate 1 at the same time as the ACF 2 is attached to the other substrate 1 and perform a correct inspection. Therefore, the effect of improving productivity is weakened.

當ACF 2向另一基板1的黏附結束後,為了進行向基板1的下一次黏附而使基板1的姿勢對準基準線,因此此時通過對已黏附的ACF 2進行拍攝,而可進行正確的檢查。但是,在向基板1黏附ACF後,針對每個基板而移動工作臺,從而進行檢查,由於無法同時進行ACF 2的黏附以及檢查,因此提高生產性的效果受到抑制。When the ACF 2 is attached to another substrate 1, the substrate 1 is aligned with the reference line in order to attach it to the substrate 1 for the next time. Therefore, the attached ACF 2 can be accurately inspected by photographing it. However, after attaching the ACF to the substrate 1, the workbench is moved for each substrate to perform the inspection. Since the ACF 2 cannot be attached and inspected at the same time, the effect of improving productivity is suppressed.

即,若要同時進行ACF 2的黏附以及檢查,則無法進行正確的檢查,而為了進行正確的檢查,無法同時進行ACF 2的黏附以及檢查。無論如何,提高生產性的效果均會受到抑制。That is, if the ACF 2 is to be attached and inspected at the same time, a correct inspection cannot be performed, and in order to perform a correct inspection, the ACF 2 cannot be attached and inspected at the same time. In any case, the effect of improving productivity is suppressed.

在本實施形態中,在將另一基板1定位於另一個壓接部30並對另一個基板1進行ACF 2的黏附的期間,對黏附於其中一個基板1上的ACF 2進行拍攝,根據所述圖像進行檢查。由此,通過供給多個基板1並進行處理,而可提高生產性。此時,針對所拍攝的圖像,對黏附有ACF 2的基板1的拍攝時的姿勢進行檢測,以與基準位置對準的方式對姿勢進行修正。由此,可進行正確的檢查。即,可同時進行ACF 2向基板1的黏附以及檢查,並且可進行正確的檢查。In this embodiment, while positioning another substrate 1 at another crimping portion 30 and attaching ACF 2 to another substrate 1, the ACF 2 attached to one of the substrates 1 is photographed and inspected based on the image. Thus, by supplying and processing a plurality of substrates 1, productivity can be improved. At this time, the posture of the substrate 1 to which the ACF 2 is attached when photographed is detected based on the photographed image, and the posture is corrected in alignment with the reference position. Thus, a correct inspection can be performed. That is, the ACF 2 can be attached to the substrate 1 and inspected at the same time, and a correct inspection can be performed.

(2)判定部110基於圖像中的基板1的端線對基板1的傾斜度進行判定。因此,與通過運算算出基板1的傾斜度的情況相比,可減少運算量而提高處理速度。(2) The determination unit 110 determines the inclination of the substrate 1 based on the edge line of the substrate 1 in the image. Therefore, compared with the case where the inclination of the substrate 1 is calculated by calculation, the amount of calculation can be reduced and the processing speed can be increased.

(3)檢查部130在每當將ACF 2黏附於基板1的一個部位時,對黏附於另一基板1的一個部位的ACF 2進行檢查。由此,在存在黏附異常的情況下,可立即進行修復作業。(3) The inspection unit 130 inspects the ACF 2 adhered to one location of the other substrate 1 each time the ACF 2 is adhered to one location of the substrate 1. Thus, if there is an adhesion abnormality, repair work can be performed immediately.

[變形例] (1)判定部110也可基於拍攝部60所拍攝的基板1的對準標記對基板1的傾斜度進行判定。例如,也可求出將基板1的多個對準標記連結的線段,並以所述線段與假想線VL一致的方式對圖像的傾斜度進行修正。 [Variation] (1) The determination unit 110 may determine the inclination of the substrate 1 based on the alignment mark of the substrate 1 captured by the imaging unit 60. For example, a line segment connecting a plurality of alignment marks of the substrate 1 may be obtained, and the inclination of the image may be corrected in such a way that the line segment coincides with the virtual line VL.

如圖9的(A)所示,在基板1上設置有多個對準用的標記。在本實施形態中,設置有兩個對準標記。多個基板1中的L側的基板1A設置有對準標記M1,在R側的基板1B上設置有對準標記M2。 對載置於工作臺20上的基板1A的多個對準標記M1進行檢測,求出基板1A的傾斜度θa,存儲此時的工作臺20的旋轉位置θ1。然後,如圖9的(B)所示,在使基板1A與假想線VL平行時,使工作臺20旋轉與基板1A的傾斜度θa相應的量。此時的工作臺20的旋轉位置θ2作為在基板1A上黏附ACF 2時的工作臺20的旋轉位置而被存儲。 As shown in FIG. 9 (A), a plurality of alignment marks are provided on the substrate 1. In the present embodiment, two alignment marks are provided. An alignment mark M1 is provided on the substrate 1A on the L side of the plurality of substrates 1, and an alignment mark M2 is provided on the substrate 1B on the R side. The plurality of alignment marks M1 of the substrate 1A placed on the workbench 20 are detected, the inclination θa of the substrate 1A is obtained, and the rotation position θ1 of the workbench 20 at this time is stored. Then, as shown in FIG. 9 (B), when the substrate 1A is made parallel to the imaginary line VL, the workbench 20 is rotated by an amount corresponding to the inclination θa of the substrate 1A. The rotation position θ2 of the workbench 20 at this time is stored as the rotation position of the workbench 20 when the ACF 2 is adhered to the substrate 1A.

另外,對於基板1B的傾斜度,在圖9的(B)的狀態下,對載置於工作臺20上的基板1B的多個對準標記M2進行檢測而求出。然後,如圖9的(C)所示,在使基板1B與假想線VL平行時,使工作臺20旋轉與基板1B的傾斜度θb相應的量。此時的工作臺20的旋轉位置θ3變為θ2-θb,作為在基板1B上黏附ACF 2時的工作臺20的旋轉位置而被存儲。In addition, the inclination of the substrate 1B is obtained by detecting a plurality of alignment marks M2 of the substrate 1B placed on the worktable 20 in the state of FIG. 9 (B). Then, as shown in FIG. 9 (C), when the substrate 1B is parallel to the imaginary line VL, the worktable 20 is rotated by an amount corresponding to the inclination θb of the substrate 1B. At this time, the rotation position θ3 of the worktable 20 becomes θ2-θb, and is stored as the rotation position of the worktable 20 when the ACF 2 is attached to the substrate 1B.

基於以所述方式求出的基板1的傾斜度,對拍攝ACF 2而得的圖像進行旋轉修正後進行檢查。另外,根據所述內容,基板1A與基板1B的相對角度為θb(使其中一個基板1與假想線VL平行時的另一個基板的傾斜度),其用於基板1的拍攝有ACF 2的圖像的修正角度、或工作臺20的定位的旋轉量。所述形態也可應用於即使對基板1的端線進行拍攝也不包含角等難以判斷XY方向上的偏差的情況。Based on the inclination of the substrate 1 obtained in the above manner, the image obtained by photographing the ACF 2 is inspected after rotation correction. In addition, according to the above content, the relative angle between the substrate 1A and the substrate 1B is θb (the inclination of the other substrate when one substrate 1 is parallel to the virtual line VL), which is used for the correction angle of the image of the substrate 1 photographed with the ACF 2, or the rotation amount for positioning the worktable 20. The above form can also be applied to the case where it is difficult to judge the deviation in the XY direction, such as not including the angle even if the end line of the substrate 1 is photographed.

在所述形態中,使用設置於基板1上的對準標記而求出基板1的傾斜度,但在各個黏附區域AR也存在對準標記的情況下,不使用圖9的(A)~圖9的(C)中使用的那樣的廣視野範圍的拍攝部60,而使用將黏附區域AR作為視野範圍的窄視野範圍的拍攝部60,因此可成為抑制了成本的裝置。In the above-described embodiment, the inclination of the substrate 1 is determined using alignment marks provided on the substrate 1. However, when alignment marks are also present in each adhesion area AR, a shooting unit 60 with a wide field of view as used in (A) to (C) of FIG. 9 is not used, but a shooting unit 60 with a narrow field of view that uses the adhesion area AR as a field of view is used, thereby achieving a device that suppresses costs.

(2)另外,如圖9的(A)~圖9的(C)中所說明那樣,也可基於黏附於基板1時的工作臺20的旋轉位置θ2以及其後對另一基板1的對準標記進行拍攝並將工作臺20定位於另一基板1的黏附區域AR時的工作臺20的旋轉位置θ3而求出傾斜度。根據所述形態,無需根據黏附ACF 2後所拍攝的圖像求出傾斜度,便可求出傾斜度。(2) In addition, as described in FIG. 9 (A) to FIG. 9 (C), the tilt can also be obtained based on the rotation position θ2 of the stage 20 when the substrate 1 is attached and the rotation position θ3 of the stage 20 when the alignment mark of the other substrate 1 is photographed and the stage 20 is positioned at the attachment area AR of the other substrate 1. According to the above form, the tilt can be obtained without having to obtain the tilt based on the image photographed after the ACF 2 is attached.

(3)檢查部130也可在每當在基板1的多個部位黏附ACF 2時,對黏附於另一基板1的多個部位的ACF 2進行檢查。(3) The inspection unit 130 may inspect the ACF 2 adhered to a plurality of locations on another substrate 1 whenever the ACF 2 is adhered to a plurality of locations on the substrate 1 .

利用圖10的(A)~圖10的(D)進行說明。所述形態與所述的實施例為相同的結構,但一對基板1A、1B的黏附區域AR設定有AR1~AR5此5個部位。在圖10的(A)~圖10的(D)中,用虛線表示未黏附ACF 2的黏附區域AR,用實線表示黏附有ACF 2的黏附區域AR。The above-described embodiment is described using (A) to (D) of FIG. 10 . The above-described embodiment has the same structure as that of the above-described embodiment, but the adhesion regions AR of the pair of substrates 1A and 1B are provided with five locations AR1 to AR5. In (A) to (D) of FIG. 10 , the adhesion regions AR to which the ACF 2 is not adhered are indicated by dotted lines, and the adhesion regions AR to which the ACF 2 is adhered are indicated by solid lines.

如圖10的(A)所示,與所述實施例同樣地,基體35A移動而對基板1A進行拍攝後,使工作臺20移動來對基板1A進行定位,將ACF 2黏附於基板1A的多個黏附區域AR1~AR5上。As shown in FIG. 10A , similarly to the above-described embodiment, after the base 35A moves to image the substrate 1A, the stage 20 moves to position the substrate 1A, and the ACF 2 is adhered to the plurality of adhesion areas AR1 to AR5 of the substrate 1A.

繼而,如圖10的(B)所示,基體35B移動而對基板1B進行拍攝後,使工作臺20移動來對基板1B進行定位,將ACF 2黏附於基板1B的多個黏附區域AR1~AR5。Next, as shown in FIG. 10B , after the base 35B moves to capture an image of the substrate 1B, the stage 20 is moved to position the substrate 1B, and the ACF 2 is adhered to the plurality of adhesion regions AR1 to AR5 of the substrate 1B.

然後,如圖10的(C)所示,在基板1B的黏附區域AR1~黏附區域AR5黏附有ACF 2的期間,設置於基體35A的照相機61A對基板1A的端線以及黏附於黏附區域AR1~黏附區域AR5的ACF 2進行拍攝,檢查部130基於所述圖像對黏附於黏附區域AR1~黏附區域AR5的ACF 2的狀態進行檢查。Then, as shown in (C) of Figure 10, during the period when ACF 2 is adhered to the adhesion area AR1 to the adhesion area AR5 of the substrate 1B, the camera 61A arranged on the base 35A photographs the end line of the substrate 1A and the ACF 2 adhered to the adhesion area AR1 to the adhesion area AR5, and the inspection unit 130 inspects the status of the ACF 2 adhered to the adhesion area AR1 to the adhesion area AR5 based on the image.

繼而,如圖10的(D)所示,在基板1B的多個黏附區域AR1~AR5上黏附ACF 2之後,利用設置於基體35B的照相機61B對黏附於黏附區域AR1~黏附區域AR5上的ACF 2進行拍攝,作為傾斜度0檢查部130基於所述圖像對黏附於黏附區域AR1~黏附區域AR5的ACF 2的狀態進行檢查。拍攝後,進行基板1的搬送。當然,在基板1為三張以上的情況下也可同樣地進行。由此,與在每當黏附時將拍攝部60定位並逐個檢查黏附狀態的情況相比,也可提高生產效率。Next, as shown in (D) of FIG. 10 , after ACF 2 is adhered to a plurality of adhesion areas AR1 to AR5 of the substrate 1B, the ACF 2 adhered to the adhesion areas AR1 to AR5 is photographed by the camera 61B provided on the base 35B, and the tilt inspection unit 130 inspects the state of the ACF 2 adhered to the adhesion areas AR1 to AR5 based on the image. After the photographing, the substrate 1 is conveyed. Of course, the same operation can be performed even when there are three or more substrates 1. Thus, compared with the case where the photographing unit 60 is positioned and the adhesion state is inspected one by one each time the substrates 1 are adhered, the production efficiency can be improved.

此外,也可並非可拍攝多個黏附區域AR的視野範圍的拍攝部60,而是可拍攝一個黏附區域AR的視野範圍的拍攝部60。與以上所說明的實施形態同樣,可提高生產效率。Furthermore, the imaging unit 60 may be capable of imaging the field of view of one adhesion area AR instead of the imaging unit 60 capable of imaging the field of view of a plurality of adhesion areas AR. As in the above-described embodiment, the production efficiency can be improved.

(4)在所述形態中,設為如下結構:針對基板1而分別設置基體35,使各個基體35支撐壓接部30、供給部40、拍攝部60,並分別獨立地移動,但也可為如下結構:將與多個基板1對應的壓接部30、供給部40、拍攝部60支撐於一個基體35上。在此情況下,由於並未針對每個基體35而設置基體移動機構36,因此可實現成本削減。(4) In the above embodiment, the base 35 is provided for each substrate 1, and each base 35 supports the pressing section 30, the supply section 40, and the camera section 60, and moves independently. However, the pressing section 30, the supply section 40, and the camera section 60 corresponding to a plurality of substrates 1 may be supported on one base 35. In this case, since the base moving mechanism 36 is not provided for each base 35, cost reduction can be achieved.

(5)在所述形態中,支撐於工作臺20的基板1為兩張,但也可為三張或其以上的多張。此時,壓接部30或壓接部30的壓接頭31也可為與基板1的張數相對應的台數。由此,與所述形態同樣,也可對多個基板1中要檢查的基板1的圖像的傾斜度進行修正後進行檢查。(5) In the above embodiment, the number of substrates 1 supported on the worktable 20 is two, but it may be three or more. In this case, the number of the crimping section 30 or the crimping head 31 of the crimping section 30 may correspond to the number of substrates 1. Thus, similar to the above embodiment, the tilt of the image of the substrate 1 to be inspected among the plurality of substrates 1 may be corrected before inspection.

在圖11中,示出了將ACF 2黏附於由工作臺20保持的三張基板1A、1B、1C上的形態。在所述圖中,在黏附區域AR中,塗滿黑色的區域表示已黏附有ACF 2的黏附區域AR,描有陰影線的區域表示利用壓接頭黏附有ACF 2的黏附區域AR,虛線的區域表示接下來要黏附ACF 2的黏附區域AR。即,三張基板中的各基板的黏附區域AR1被塗滿黑色,表示均已黏附有ACF 2的狀態,基板1A的黏附區域AR2也被塗滿黑色,因此表示已黏附有ACF 2的狀態。基板1B的黏附區域AR2描有陰影線,表示黏附有ACF 2的狀態。另外,基板1C的黏附區域AR2用虛線表示,表示接下來要黏附ACF 2的預定區域。FIG. 11 shows a state where ACF 2 is adhered to three substrates 1A, 1B, and 1C held by a work table 20. In the figure, in the adhesion area AR, the area filled with black indicates the adhesion area AR to which ACF 2 has already been adhered, the area filled with hatching indicates the adhesion area AR to which ACF 2 has been adhered by a crimping head, and the area filled with dotted lines indicates the adhesion area AR to which ACF 2 is to be adhered next. That is, the adhesion area AR1 of each of the three substrates is filled with black, indicating that ACF 2 has already been adhered, and the adhesion area AR2 of the substrate 1A is also filled with black, indicating that ACF 2 has already been adhered. The adhesion area AR2 of the substrate 1B is hatched, indicating that ACF 2 has been adhered. In addition, the adhesion area AR2 of the substrate 1C is indicated by a dotted line, indicating a planned area to which the ACF 2 is to be adhered next.

雖在圖11中未圖示,但與所述形態同樣,為如下形態:壓接頭31、頭移動機構32、供給部40、拍攝部60分別支撐於針對三張基板1的各者而各別地設置的基體35A、基體35B、基體35C上,通過基體移動機構36分別獨立地沿X方向、Y方向移動,相對於對應的基板1的黏附區域AR進行定位。Although not shown in FIG. 11 , the configuration is the same as that described above: the crimping head 31, the head moving mechanism 32, the supply unit 40, and the photographing unit 60 are respectively supported on a base 35A, a base 35B, and a base 35C respectively provided for each of the three substrates 1, and are independently moved in the X direction and the Y direction by a base moving mechanism 36 to be positioned relative to the adhesion area AR of the corresponding substrate 1.

而且,在所述黏附過程中,在基板1A中,通過基體移動機構36A使基體35A移動,設置於基體35A上的照相機61A來到基板1A的黏附區域AR2的正上方,對黏附於基板1A的黏附區域AR2上的ACF 2進行拍攝(用點劃線表示拍攝視野),檢查部130對基板1的圖像的傾斜度進行修正後進行檢查。Moreover, during the bonding process, in the substrate 1A, the substrate 35A is moved by the substrate moving mechanism 36A, and the camera 61A arranged on the substrate 35A comes to the top of the bonding area AR2 of the substrate 1A, and the ACF 2 adhered to the bonding area AR2 of the substrate 1A is photographed (the photographing field of view is indicated by a dotted line), and the inspection unit 130 corrects the inclination of the image of the substrate 1 and then performs inspection.

另外,在基板1C中,為了接下來將ACF 2黏附於黏附區域AR2上,通過基體移動機構36C使基體35C移動,設置於基體35C上的照相機61C對基板1C進行拍攝(用點劃線表示拍攝視野)。然後,根據所拍攝的圖像對基板1C的對準標記進行檢測,根據對準標記的位置求出基板1C的傾斜度。In addition, in the substrate 1C, in order to adhere the ACF 2 to the adhesion area AR2, the substrate 35C is moved by the substrate moving mechanism 36C, and the camera 61C provided on the substrate 35C takes an image of the substrate 1C (the photographing field is indicated by a dotted line). Then, the alignment mark of the substrate 1C is detected based on the photographed image, and the inclination of the substrate 1C is obtained based on the position of the alignment mark.

然後,在黏附於基板1A的黏附區域AR2的ACF 2的檢查以及ACF 2向基板1B的黏附區域AR2的黏附完成之後,以基板1C的傾斜與假想線VL平行的方式,通過驅動機構50使工作臺20旋轉。另外,基於基板1C的黏附區域AR2的位置,通過基體移動機構36C使基體35C移動,將壓接頭31C定位於基板1C的黏附區域AR2的正上方。Then, after the inspection of the ACF 2 adhered to the adhesion area AR2 of the substrate 1A and the completion of the adhesion of the ACF 2 to the adhesion area AR2 of the substrate 1B, the worktable 20 is rotated by the driving mechanism 50 in such a manner that the inclination of the substrate 1C is parallel to the virtual line VL. In addition, based on the position of the adhesion area AR2 of the substrate 1C, the substrate 35C is moved by the substrate moving mechanism 36C to position the crimping head 31C just above the adhesion area AR2 of the substrate 1C.

在所述實施形態中,在所述時間點,利用照相機61C對基板1C進行拍攝,求出工作臺20的旋轉角度、基體35C的移動量,但也可使用在基板1C的黏附區域AR1黏附ACF 2時所拍攝的圖像,求出工作臺20的旋轉角度、基體35C的移動量,也可存儲此時的基板1C的對準標記的位置,並基於所述位置求出工作臺20的旋轉角度、基體35C的移動量。In the embodiment, at the time point, the camera 61C is used to photograph the substrate 1C to calculate the rotation angle of the workbench 20 and the movement amount of the substrate 35C. However, the image taken when the ACF 2 is adhered to the adhesion area AR1 of the substrate 1C can also be used to calculate the rotation angle of the workbench 20 and the movement amount of the substrate 35C. The position of the alignment mark of the substrate 1C at this time can also be stored, and the rotation angle of the workbench 20 and the movement amount of the substrate 35C can be calculated based on the position.

即使如此多個基板1被載置於工作臺20上,也與兩張基板1同樣,在將ACF 2壓接於基板1的期間,可對另一基板1的ACF 2的黏附狀態進行檢查,因此即使由工作臺20保持的多個基板1的姿勢偏移而不對齊,也可對完成了壓接工序的基板1進行修正後進行檢查,因此可進行正確的檢查,並且提高生產效率。Even if a plurality of substrates 1 are placed on the workbench 20, the adhesion state of the ACF 2 of another substrate 1 can be inspected while the ACF 2 is being pressed onto the substrate 1, just like two substrates 1. Therefore, even if the postures of the plurality of substrates 1 held by the workbench 20 are offset and misaligned, the substrate 1 that has completed the pressing process can be corrected and then inspected, thereby enabling accurate inspection and improving production efficiency.

(6)在本實施形態中,設置有與載置於工作臺的基板1一一對應的基體35,但也可設置與多個基板1對應的基體35。例如,於在工作臺20上載置有四張基板1的情況下,兩台基體35也可分別對兩張基板1黏附ACF 2。(6) In the present embodiment, the bases 35 are provided corresponding to the substrates 1 placed on the workbench one by one, but the bases 35 may be provided corresponding to a plurality of substrates 1. For example, when four substrates 1 are placed on the workbench 20, two bases 35 may adhere ACF 2 to two substrates 1 respectively.

在圖12示出如下形態:在工作臺20上載置有四張基板1A~1D,並設置有將ACF 2黏附於基板1A以及基板1B上的設置有壓接頭、照相機等的基體35A、以及同樣地將ACF 2黏附於基板1C以及基板1D上的基體35C。FIG. 12 shows a state where four substrates 1A to 1D are placed on a worktable 20, and a base 35A provided with a crimping head, a camera, etc., for attaching ACF 2 to substrates 1A and 1B, and a base 35C for attaching ACF 2 to substrates 1C and 1D are provided.

在所述圖中,在四張基板1上分別設定有兩處黏附區域AR,塗滿黑色的區域表示已黏附有ACF 2的黏附區域AR,描有陰影線的區域表示利用壓接頭黏附有ACF 2的黏附區域AR,虛線的區域表示接下來要黏附ACF 2的黏附區域AR。In the figure, two adhesion areas AR are set on each of the four substrates 1. The area filled with black indicates the adhesion area AR to which ACF 2 has been adhered, the area with shaded lines indicates the adhesion area AR to which ACF 2 is adhered using a crimping head, and the area with dotted lines indicates the adhesion area AR to which ACF 2 will be adhered next.

即,基板1A的黏附區域AR1、黏附區域AR2被塗滿黑色,表示利用基體35A將ACF 2黏附於基板1A上的狀態。另外,基板1C的黏附區域AR1、黏附區域AR2描有陰影線,表示利用基體35C黏附有ACF 2的狀態。另外,基板1B、基板1D的黏附區域AR1、黏附區域AR2用虛線表示,表示接下來要利用基體35A在基板1B上黏附ACF 2的預定區域、利用基體35C在基板1D上黏附ACF 2的預定區域。That is, the adhesion area AR1 and the adhesion area AR2 of the substrate 1A are filled with black, indicating that the ACF 2 is adhered to the substrate 1A by the substrate 35A. In addition, the adhesion area AR1 and the adhesion area AR2 of the substrate 1C are shaded, indicating that the ACF 2 is adhered by the substrate 35C. In addition, the adhesion area AR1 and the adhesion area AR2 of the substrate 1B and the substrate 1D are indicated by dotted lines, indicating that the predetermined area where the ACF 2 is to be adhered to the substrate 1B by the substrate 35A and the predetermined area where the ACF 2 is to be adhered to the substrate 1D by the substrate 35C.

另外,在所述形態中,在設定於基板1上的兩處黏附區域AR上黏附ACF 2後,對黏附於另一基板1上的ACF 2的黏附狀態進行檢查。In addition, in the above-described embodiment, after the ACF 2 is adhered to the two adhesion regions AR provided on the substrate 1, the adhesion state of the ACF 2 adhered to the other substrate 1 is inspected.

在所述狀態下,在利用基體35C將ACF 2黏附於基板1C的黏附區域AR1、黏附區域AR2的期間,設置於基體35A的未圖示的照相機來到基板1A的正上方,對基板1A的端線以及黏附的ACF 2進行拍攝(用點劃線表示拍攝視野),檢查部130對基板1A的ACF 2的黏附狀態進行檢查。In the described state, while the ACF 2 is being adhered to the adhesion area AR1 and the adhesion area AR2 of the substrate 1C using the base 35C, an unillustrated camera arranged on the base 35A comes directly above the substrate 1A to photograph the end line of the substrate 1A and the adhered ACF 2 (the photographing field of view is indicated by a dotted line), and the inspection unit 130 inspects the adhesion state of the ACF 2 of the substrate 1A.

繼而,由於接下來要黏附ACF 2的基板1是基板1B,因此基體35A對基板1A進行拍攝後,以設置於基體35A上的未圖示的照相機來到基板1B的正上方的方式進行移動,並對基板1B進行拍攝(用虛線表示移動後的基體35A,用雙點劃線表示照相機的拍攝視野)。Next, since the next substrate 1 to which the ACF 2 is to be adhered is the substrate 1B, after the substrate 35A photographs the substrate 1A, the unillustrated camera disposed on the substrate 35A moves to the top of the substrate 1B and photographs the substrate 1B (the substrate 35A after movement is represented by a dotted line, and the photographing field of the camera is represented by a double-dotted line).

然後,根據所拍攝的圖像對基板1B的對準標記進行檢測,根據對準標記的位置求出基板1B的傾斜度。Then, the alignment mark of the substrate 1B is detected based on the captured image, and the inclination of the substrate 1B is calculated based on the position of the alignment mark.

當利用基體35C的ACF 2向基板1C的黏附、以及基板1A的拍攝、基板1B的傾斜度的檢測完成後,以基於基板1B的傾斜度使基板1B的傾斜與假想線VL平行的方式使工作臺20旋轉,並且將基體35A的未圖示的壓接頭定位於基板1B的黏附區域AR1。When the ACF 2 of the base 35C is adhered to the substrate 1C, the substrate 1A is photographed, and the inclination of the substrate 1B is detected, the workbench 20 is rotated in a manner such that the inclination of the substrate 1B is parallel to the imaginary line VL based on the inclination of the substrate 1B, and the unillustrated crimping head of the base 35A is positioned at the adhesion area AR1 of the substrate 1B.

繼而,利用基體35A將ACF 2黏附於基板1B的黏附區域AR1、黏附區域AR2上。而且,在黏附的期間,設置於基體35C的未圖示的照相機來到基板1C的正上方,對基板1C的端線以及黏附的ACF 2進行拍攝,檢查部130對基板1C的ACF 2的黏附狀態進行檢查。此時,在利用檢查部130的檢查中,使用使圖像旋轉與上述所求出的基板1B的角度相應的量的構件。Then, the ACF 2 is adhered to the adhesion area AR1 and the adhesion area AR2 of the substrate 1B by the base 35A. During the adhesion, a camera (not shown) provided on the base 35C comes right above the substrate 1C to take pictures of the edge line of the substrate 1C and the adhered ACF 2, and the inspection unit 130 inspects the adhesion state of the ACF 2 on the substrate 1C. At this time, in the inspection by the inspection unit 130, a member is used to rotate the image by an amount corresponding to the angle of the substrate 1B obtained as described above.

如此,即使設置與多個基板1對應的基體35,在將ACF 2壓接於基板1的期間,也可對另一基板1的ACF 2的黏附狀態進行檢查,因此即使由工作臺20保持的多個基板1的姿勢偏移而不對齊,也可進行正確的檢查,並且提高生產效率。In this way, even if a base 35 corresponding to a plurality of substrates 1 is provided, the adhesion state of the ACF 2 of another substrate 1 can be inspected while the ACF 2 is pressed against the substrate 1. Therefore, even if the postures of the plurality of substrates 1 held by the workbench 20 are offset and misaligned, correct inspection can be performed, thereby improving production efficiency.

[其他實施形態] 以上對本發明的實施形態及各部的變形例進行了說明,但所述實施方形態或各部的變形例是作為一例而進行提示,並不意圖限定發明的範圍。所述這些新穎的方面能夠以其他各種形態來實施,在不脫離發明的主旨的範圍內,可進行各種省略、置換、變更、組合。這些實施形態或其變形包含於發明的範圍或主旨中,並且包含於權利要求書所記載的發明中。 [Other embodiments] The embodiments and variations of each part of the present invention are described above, but the embodiments or variations of each part are provided as examples and are not intended to limit the scope of the invention. These novel aspects can be implemented in various other forms, and various omissions, substitutions, changes, and combinations can be made without departing from the scope of the invention. These embodiments or variations thereof are included in the scope or the subject matter of the invention and are included in the invention described in the claims.

1、1A、1B、1C、1D:基板 2:ACF 10:黏附裝置 20:工作臺 30:壓接部 31、31A、31B:壓接頭 32:頭移動機構 33:支承部 35、35A、35B、35C:基體 36、36A、36B:基體移動機構 40:供給部 41:供給卷軸 42:回收卷軸 43:引導輥 44:切斷部 44a:切割器 44b:支承構件 50:驅動機構 60:拍攝部 61、61A、61B:照相機 100:控制裝置 110:判定部 120:修正部 130:檢查部 AR、AR1~AR5:黏附區域 G:旋轉後的圖像 L:左側 M1、M2:對準標記 P、VL0:角 P':位置 P1、P2:保持位置 R:右側 RA:基準區域 S:視野 S101~S114、S201~S205:步驟 VL:假想線 θ:角度 θa、θb:傾斜度 θ1、θ2、θ3:旋轉位置 X、Y、Z:方向 1, 1A, 1B, 1C, 1D: substrate 2: ACF 10: bonding device 20: workbench 30: crimping section 31, 31A, 31B: crimping head 32: head moving mechanism 33: support section 35, 35A, 35B, 35C: substrate 36, 36A, 36B: substrate moving mechanism 40: supply section 41: supply reel 42: recovery reel 43: guide roller 44: cutting section 44a: cutter 44b: support member 50: drive mechanism 60: shooting section 61, 61A, 61B: camera 100: control device 110: determination section 120: Correction section 130: Inspection section AR, AR1~AR5: Adhesion area G: Rotated image L: Left side M1, M2: Alignment mark P, VL0: Angle P': Position P1, P2: Hold position R: Right side RA: Reference area S: Field of view S101~S114, S201~S205: Steps VL: Imaginary line θ: Angle θa, θb: Tilt θ1, θ2, θ3: Rotation position X, Y, Z: Direction

圖1是表示實施形態的作為壓接對象的基板及ACF的平面圖。 圖2是表示實施形態的壓接裝置的正面圖。 圖3是表示實施形態的壓接裝置的側面圖。 圖4的(A)及圖4的(B)是表示檢查中的影像處理的說明圖,圖4的(A)是修正前的畫面例,圖4的(B)是修正後的畫面例。 圖5的(A)~圖5的(D)是表示檢查中的判定處理的說明圖,圖5的(A)是正常情況下的畫面例,圖5的(B)是存在翻卷的情況下的畫面例,圖5的(C)是存在偏差的情況下的畫面例。 圖6的(A)~圖6的(E)是表示ACF的壓接以及檢查的程式的說明圖。 圖7是表示利用壓接裝置進行的壓接的程式的流程圖。 圖8是表示利用壓接裝置進行的檢查的程式的流程圖。 圖9的(A)~圖9的(C)是根據對準標記求出基板的傾斜度的說明圖。 圖10的(A)~圖10的(D)是在基板上黏附多個ACF之後進行檢查的形態的說明圖。 圖11是在三張基板上黏附ACF的形態的說明圖。 圖12是一個壓接部在多個基板上黏附ACF的形態的說明圖。 FIG. 1 is a plan view of a substrate and an ACF to be pressed in an embodiment. FIG. 2 is a front view of a pressing device in an embodiment. FIG. 3 is a side view of a pressing device in an embodiment. FIG. 4 (A) and FIG. 4 (B) are explanatory diagrams showing image processing during inspection, FIG. 4 (A) is an example of a screen before correction, and FIG. 4 (B) is an example of a screen after correction. FIG. 5 (A) to FIG. 5 (D) are explanatory diagrams showing judgment processing during inspection, FIG. 5 (A) is an example of a screen under normal conditions, FIG. 5 (B) is an example of a screen when there is a rollover, and FIG. 5 (C) is an example of a screen when there is a deviation. Figures 6 (A) to 6 (E) are explanatory diagrams showing a procedure for crimping and inspecting ACF. Figure 7 is a flow chart showing a procedure for crimping using a crimping device. Figure 8 is a flow chart showing a procedure for inspecting using a crimping device. Figures 9 (A) to 9 (C) are explanatory diagrams for finding the inclination of a substrate based on alignment marks. Figures 10 (A) to 10 (D) are explanatory diagrams showing a form of inspecting after attaching multiple ACFs to a substrate. Figure 11 is an explanatory diagram showing a form of attaching ACFs to three substrates. Figure 12 is an explanatory diagram showing a form of attaching ACFs to multiple substrates by one crimping unit.

1、1A、1B:基板 1. 1A, 1B: Substrate

2:ACF 2:ACF

10:黏附裝置 10: Adhesion device

20:工作臺 20: Workbench

30:壓接部 30: Press-fitting part

31、31A、31B:壓接頭 31, 31A, 31B: compression fittings

32:頭移動機構 32: Head moving mechanism

33:支承部 33: Supporting part

35A、35B:基體 35A, 35B: Matrix

40:供給部 40: Supply Department

41:供給卷軸 41: Supply reel

42:回收卷軸 42: Recycling Scroll

43:引導輥 43:Guide roller

44:切斷部 44: Cutting section

44a:切割器 44a: Cutter

44b:支承構件 44b: Supporting member

50:驅動機構 50: Driving mechanism

60:拍攝部 60: Photography Department

61A、61B:照相機 61A, 61B: Camera

100:控制裝置 100: Control device

110:判定部 110: Judgment Department

120:修正部 120: Correction Department

130:檢查部 130: Inspection Department

L:左側 L: Left side

R:右側 R: Right side

θ:角度 θ: angle

X、Y、Z:方向 X, Y, Z: direction

Claims (6)

一種黏附裝置,在基板上黏附各向異性導電膜,所述黏附裝置包括: 工作臺,對多個所述基板進行保持; 壓接部,將各向異性導電膜壓接於多個所述基板的各者上; 供給部,向所述壓接部供給所述各向異性導電膜; 驅動機構,通過改變所述工作臺相對於所述壓接部的相對位置而使所述基板與所述壓接部對位; 拍攝部,對黏附於所述基板上的所述各向異性導電膜進行拍攝; 判定部,在所述壓接部將所述各向異性導電膜壓接於所述基板上的期間,對所述拍攝部所拍攝的另一所述基板的圖像中的所述基板的傾斜度進行判定; 修正部,基於通過所述判定部的判定求出的傾斜度,對所述基板在所述圖像中的傾斜度進行修正;以及 檢查部,基於由所述修正部對傾斜度進行修正後的圖像,對所述各向異性導電膜的黏附狀態進行檢查。 A bonding device for bonding an anisotropic conductive film on a substrate, the bonding device comprising: a workbench for holding a plurality of the substrates; a crimping section for crimping the anisotropic conductive film onto each of the plurality of substrates; a supply section for supplying the anisotropic conductive film to the crimping section; a driving mechanism for aligning the substrate with the crimping section by changing the relative position of the workbench relative to the crimping section; a photographing section for photographing the anisotropic conductive film bonded to the substrate; a determination section for determining the inclination of the substrate in an image of another substrate photographed by the photographing section while the crimping section is crimping the anisotropic conductive film onto the substrate; A correction unit that corrects the inclination of the substrate in the image based on the inclination determined by the determination unit; and an inspection unit that inspects the adhesion state of the anisotropic conductive film based on the image after the inclination is corrected by the correction unit. 如請求項1所述的黏附裝置,其中所述判定部基於所述圖像中的所述基板的端線對所述基板的傾斜度進行判定。The adhesion device as described in claim 1, wherein the determination unit determines the inclination of the substrate based on an end line of the substrate in the image. 如請求項1所述的黏附裝置,其中所述判定部基於所述拍攝部所拍攝的所述基板的對準標記,對所述基板的傾斜度進行判定。An adhesion device as described in claim 1, wherein the determination unit determines the inclination of the substrate based on an alignment mark of the substrate photographed by the photographing unit. 如請求項1所述的黏附裝置,其中每當在所述基板的一個部位黏附所述各向異性導電膜時,所述檢查部對黏附於另一所述基板的一個部位的所述各向異性導電膜進行檢查。The bonding device as described in claim 1, wherein each time the anisotropic conductive film is bonded to one portion of the substrate, the inspection section inspects the anisotropic conductive film bonded to one portion of another substrate. 如請求項1所述的黏附裝置,其中每當在所述基板的多個部位黏附所述各向異性導電膜時,所述檢查部對黏附於另一所述基板的多個部位的所述各向異性導電膜進行檢查。The bonding device as described in claim 1, wherein each time the anisotropic conductive film is bonded to a plurality of locations on the substrate, the inspection section inspects the anisotropic conductive film bonded to a plurality of locations on another substrate. 一種檢查方法,包括: 保持工序,工作臺對多個基板進行保持; 第一壓接工序,壓接部將各向異性導電膜壓接於所述基板上;以及 第二壓接工序,所述壓接部將各向異性導電膜壓接於另一所述基板上, 在所述第二壓接工序的期間,進行: 傾斜度判定工序,判定部判定拍攝部對黏附於所述基板上的各向異性導電膜進行拍攝而得的圖像中的所述基板的傾斜度; 修正工序,修正部基於通過所述判定部的判定求出的傾斜度,對所述基板在所述圖像中的傾斜度進行修正;以及 檢查工序,基於由所述修正部對傾斜度進行修正後的圖像,對所述各向異性導電膜的黏附狀態進行檢查。 An inspection method includes: A holding process, in which a workbench holds a plurality of substrates; A first pressing process, in which a pressing unit presses an anisotropic conductive film onto the substrate; and A second pressing process, in which the pressing unit presses the anisotropic conductive film onto another substrate. During the second pressing process, the following are performed: A tilt determination process, in which a determination unit determines the tilt of the substrate in an image obtained by a photographing unit photographing the anisotropic conductive film attached to the substrate; A correction process, in which a correction unit corrects the tilt of the substrate in the image based on the tilt determined by the determination unit; and The inspection step is to inspect the adhesion state of the anisotropic conductive film based on the image after the correction of the tilt by the correction unit.
TW113111405A 2023-03-29 2024-03-27 Adhesion device and inspection method TWI880689B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201222072A (en) * 2010-10-12 2012-06-01 Sharp Kk Liquid crystal module and liquid crystal display device provided with the module
TW201606382A (en) * 2014-08-07 2016-02-16 日東電工股份有限公司 Apparatus for measuring the position for applying optical film
TW202223452A (en) * 2020-12-07 2022-06-16 日商日東電工股份有限公司 Optical film edge detection method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201222072A (en) * 2010-10-12 2012-06-01 Sharp Kk Liquid crystal module and liquid crystal display device provided with the module
TW201606382A (en) * 2014-08-07 2016-02-16 日東電工股份有限公司 Apparatus for measuring the position for applying optical film
TWI592715B (en) * 2014-08-07 2017-07-21 日東電工股份有限公司 Apparatus for measuring the position for applying optical film
TW202223452A (en) * 2020-12-07 2022-06-16 日商日東電工股份有限公司 Optical film edge detection method

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